WO2020153046A1 - 光学部品およびレーザ加工機 - Google Patents

光学部品およびレーザ加工機 Download PDF

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Publication number
WO2020153046A1
WO2020153046A1 PCT/JP2019/049209 JP2019049209W WO2020153046A1 WO 2020153046 A1 WO2020153046 A1 WO 2020153046A1 JP 2019049209 W JP2019049209 W JP 2019049209W WO 2020153046 A1 WO2020153046 A1 WO 2020153046A1
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Prior art keywords
film
optical component
thickness
substrate
processing machine
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Application number
PCT/JP2019/049209
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English (en)
French (fr)
Japanese (ja)
Inventor
圭佑 福永
増田　暁雄
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三菱電機株式会社
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Priority to JP2020567424A priority Critical patent/JPWO2020153046A1/ja
Priority to TW109101700A priority patent/TWI732427B/zh
Publication of WO2020153046A1 publication Critical patent/WO2020153046A1/ja

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

Definitions

  • the present invention relates to an optical component and a laser processing machine having the optical component.
  • a laser processing machine that processes a workpiece by irradiating a laser beam is provided with a protective window that is an optical component for protecting a lens system including a condenser lens.
  • the protective window protects the lens system from dust or spatter generated during processing.
  • CO 2 carbon dioxide
  • the protective window is required to have a high transmittance for CO 2 laser light that is infrared light.
  • the protective window has environmental resistance such as abrasion resistance that can prevent scratches when foreign matter attached to the protective window is wiped off, and corrosion resistance that does not cause corrosion due to gas filling during laser processing. Required to have.
  • Patent Document 1 has a substrate made of zinc sulfide (ZnS), and in order from the substrate surface, a first yttrium oxide (Y 2 O 3 ) film, a yttrium fluoride (YF 3 ) film, and a second Y 2 film.
  • ZnS zinc sulfide
  • Y 2 O 3 first yttrium oxide
  • YF 3 yttrium fluoride
  • second Y 2 film a second Y 2 film.
  • An optical component in which an O 3 film, a germanium (Ge) film, and a diamond-like carbon (DLC) film are laminated is disclosed.
  • the optical component of Patent Document 1 has high environmental resistance by providing the DLC film on the surface layer of the optical component.
  • Patent Document 1 has a problem that the infrared light transmittance is lowered due to the absorption of infrared light by the two Y 2 O 3 films that are oxides.
  • the present invention has been made in view of the above, and an object thereof is to obtain an optical component that does not use an oxide and can transmit infrared light with high transmittance.
  • the optical component according to the present invention includes a substrate made of germanium and a multilayer film.
  • the multilayer film is composed of at least three layers in which a zinc compound film, a germanium film, and a diamond-like carbon film are stacked in this order from the substrate side.
  • the optical component does not use an oxide, and has an effect that infrared light can be transmitted with high transmittance.
  • FIG. 3 is a diagram showing an example of wavelength dependence of transmittance in the optical component according to the first embodiment.
  • FIG. 3 is a diagram showing wavelength dependence of transmittance in the optical component of the comparative example of the first embodiment.
  • FIG. 6 is a diagram showing an example of wavelength dependence of transmittance in the optical component according to the second embodiment.
  • FIG. 1 is a sectional view showing a configuration of an optical component according to the first exemplary embodiment of the present invention.
  • An optical component 10 shown in FIG. 1 includes a substrate 1 made of germanium, a multilayer film 7 provided on a first surface 2 which is a main surface of the substrate 1, and a first substrate 2 on the opposite side of the first surface 2. It has a multilayer film 7 provided on the two surfaces 3.
  • the substrate 1 made of germanium includes a germanium substrate containing a small amount of impurities.
  • the main surface is the surface of the substrate 1 on the side where light is emitted.
  • Each multilayer film 7 has three films of a ZnS film 4, which is a zinc compound film, a Ge film 5, and a DLC film 6.
  • the Ge film 5 is provided between the ZnS film 4 and the DLC film 6.
  • the multilayer film 7 provided on the first surface 2 is composed of three layers in which the ZnS film 4, the Ge film 5, and the DLC film 6 are stacked in this order from the first surface 2 side.
  • the DLC film 6 constitutes the outer surface of the optical component 10 on the side of the substrate 1 on which the first surface 2 is directed.
  • the multilayer film 7 provided on the second surface 3 is composed of three layers in which the ZnS film 4, the Ge film 5, and the DLC film 6 are stacked in this order from the second surface 3 side.
  • the DLC film 6 constitutes the outer surface of the optical component 10 on the side of the substrate 1 on which the second surface 3 is directed.
  • the DLC film 6 is a substance having high hardness, the DLC film 6 can exhibit high wear resistance. Further, since the DLC film 6 is a substance having high stability of DLC and low reactivity with other substances, it can exhibit high corrosion resistance. Since the DLC film 6 has low reactivity with other substances, it can weaken the adhesion of foreign matter such as dust.
  • the optical component 10 can easily remove foreign matter attached to the outer surface. Since the DLC film 6 having excellent environmental resistance is provided on the outer surface of the optical component 10, high environmental resistance can be obtained. The optical component 10 can be used for a long period of time by suppressing deterioration.
  • the optical component 10 can secure the adhesiveness between the substrate 1 and the multilayer film 7 by bringing the Ge film 5 having excellent adhesiveness with the DLC film 6 into contact with the DLC film 6.
  • the optical component 10 can suppress peeling of the DLC film 6 due to the compressive stress of the DLC film 6.
  • the Ge film 5 is also excellent in adhesion to the ZnS film 4.
  • the optical component 10 can secure the adhesiveness between the substrate 1 and the multilayer film 7 by bringing the Ge film 5 into contact with the ZnS film 4.
  • the optical component 10 may have a zinc compound film other than the ZnS film 4 instead of the ZnS film 4.
  • the optical component 10 may have a zinc selenide (ZnSe) film which is a zinc compound film other than the ZnS film 4. Even when the ZnSe film is provided, the optical component 10 can secure the adhesiveness between the substrate 1 and the multilayer film 7 due to the excellent adhesiveness between the Ge film 5 and the ZnSe film.
  • the zinc compound film may be doped with an element other than Zn, S, and Se as long as it does not affect the optical performance of the optical component 10.
  • Ge has a high transmittance for light in the infrared region. Since the optical component 10 includes the Ge substrate 1, the optical component 10 can transmit infrared light with high transmittance. In addition, the Ge substrate 1 has a higher thermal conductivity than the ZnS substrate.
  • the optical component 10 is used as a protective window of a laser processing machine
  • the thermal lens effect due to the temperature distribution is more likely to occur. Since the refractive index distribution due to the thermal lens effect is generated in the optical component 10, it becomes difficult for the laser processing machine to perform highly accurate processing.
  • the optical component 10 has the Ge substrate 1 having high thermal conductivity, the thermal lens effect can be suppressed. As a result, the laser processing machine having the optical component 10 can suppress the generation of the refractive index distribution in the optical component 10 and can perform processing with high processing accuracy.
  • the substrate 1 may be doped with an element other than Ge as long as it does not affect the optical performance of the optical component 10 or the mechanical characteristics of the laser processing machine.
  • Each layer constituting the multilayer film 7 may be doped with an element other than the element that is the crystal forming the layer, as long as the optical performance of the optical component 10 or the mechanical characteristics of the laser processing machine is not affected. good.
  • the shape of the substrate 1 can be any shape.
  • the shape of the substrate 1 is preferably a disk shape having a diameter of 80 mm to 120 mm from the viewpoint of the processing area of the laser processing machine.
  • the thickness of the substrate 1 is preferably 2 mm to 10 mm from the viewpoint of film stress.
  • the method of forming the multilayer film 7 may be any type as long as the ZnS film 4, the Ge film 5 and the DLC film 6 can be formed on the substrate 1, and any type may be used.
  • film forming methods such as physical vapor deposition (Physical Vapor Deposition: PVD) such as a vacuum vapor deposition method and a sputtering method, and chemical vapor deposition such as a plasma CVD (Chemical Vapor Deposition) method are used. Can be used.
  • the thickness of the ZnS film 4 is in the range of 600 nm to 1000 nm
  • the thickness of the Ge film 5 is in the range of 10 nm to 70 nm
  • the thickness of the DLC film 6 is in the range of 50 nm to 300 nm.
  • the optical component 10 can transmit infrared light with high transmittance by utilizing the effect of light interference.
  • the optical component 10 includes the Ge substrate 1 and the multilayer film 7 in which the thickness of each layer is set within the above range, so that 97% or more of CO 2 laser light having a wavelength of 9 ⁇ m to 11 ⁇ m can be obtained.
  • the transmittance can be realized. Thereby, the optical component 10 can satisfy the optical characteristics required for the protective window of the laser processing machine.
  • the optical component 10 may be provided with layers other than the layers shown in FIG. 1 as long as the optical performance of the optical component 10 or the mechanical characteristics of the laser processing machine is not affected. Further, in the optical component 10, the multilayer film 7 may be provided on the first surface 2 of the first surface 2 and the second surface 3, and instead of the multilayer film 7, the multilayer film 7 may be provided on the second surface 3. A film other than the above may be provided.
  • FIG. 2 is a cross-sectional view showing another configuration of the optical component according to the first embodiment.
  • the optical component 11 shown in FIG. 2 includes the antireflection film 8 provided on the second surface 3 of the substrate 1.
  • the antireflection film 8 is formed by stacking a YF 3 film, a Ge film, and a magnesium fluoride (MgF 2 ) film in order from the second surface 3.
  • MgF 2 magnesium fluoride
  • illustration of each layer forming the antireflection film 8 is omitted.
  • the structure of the antireflection film 8 is not limited to this modification, and any structure having an antireflection function may be used.
  • the optical component 11 can suppress reflection of light incident on the optical component 11 by providing the antireflection film 8 on the second surface 3 of the substrate 1 on the light incident side.
  • the DLC film 6 is provided on the outer surface of the optical component 11 facing the workpiece, so that the optical component 11 is used during laser processing. High environmental resistance that can withstand the environment of
  • the method of forming the antireflection film 8 may be of any type as long as each layer of the antireflection film 8 can be formed on the substrate 1.
  • a generally known film forming method such as physical vapor deposition such as a vacuum vapor deposition method and a sputtering method, and chemical vapor deposition such as a plasma CVD method can be used.
  • Example 1 which is a specific example of Embodiment 1 will be described.
  • the optical component of Example 1 is an optical component 11 having a multilayer film 7 provided on the first surface 2 and an antireflection film 8 provided on the second surface 3.
  • the antireflection film 8 has a transmittance of 99.5% or more for CO 2 laser light having a wavelength of 9.3 ⁇ m.
  • the MgF 2 film has a thickness of 200 nm
  • the Ge film has a thickness of 130 nm
  • the YF 3 film has a thickness of 650 nm.
  • the ZnS film 4 has a thickness of 800 nm
  • the Ge film 5 has a thickness of 30 nm
  • the DLC film 6 has a thickness of 200 nm.
  • the ZnS film 4, the Ge film 5, and the antireflection film 8 are formed by using the vacuum evaporation method.
  • the DLC film 6 shall be formed using the sputtering method.
  • the substrate 1 has a disk shape with a diameter of 90 mm and a thickness of 5 mm. The transmittance was evaluated using a Fourier transform infrared spectrophotometer.
  • FIG. 3 is a diagram showing an example of wavelength dependence of transmittance in the optical component according to the first embodiment.
  • FIG. 3 shows the wavelength dependence of the optical component 11 of Example 1.
  • the vertical axis of the graph shown in FIG. 3 represents the transmittance, and the horizontal axis represents the wavelength of light.
  • the transmittance of 97.6% is realized for the wavelength of 9.3 ⁇ m. Since it is said that the protective window of the laser processing machine preferably has a transmittance of 97% or more, the optical component 11 satisfies the optical characteristics required for the protective window of the laser processing machine.
  • the optical component of the comparative example is an optical component having a ZnS substrate and two Y 2 O 3 films.
  • a first Y 2 O 3 film, a YF 3 film, a second Y 2 O 3 film, a Ge film, and a DLC film are laminated on the main surface of a ZnS substrate in order from the main surface.
  • the thickness of the first Y 2 O 3 film is 30 nm
  • the thickness of the YF 3 film is 600 nm
  • the thickness of the second Y 2 O 3 film is 30 nm
  • the thickness of the Ge film is 30 nm
  • the thickness of the DLC film is 200 nm.
  • the thickness of the ZnS substrate is 5 mm.
  • a Y 2 O 3 film, a YF 3 film, and a MgF 2 film are stacked in this order from the surface.
  • the Y 2 O 3 film has a thickness of 80 nm
  • the YF 3 film has a thickness of 1300 nm
  • the MgF 2 film has a thickness of 400 nm.
  • the illustration of the configuration of the optical component of the comparative example is omitted.
  • FIG. 4 is a diagram showing the wavelength dependence of the transmittance of the optical component of the comparative example of the first embodiment.
  • the vertical axis represents the transmittance and the horizontal axis represents the wavelength of light.
  • the wavelength dependence shown in FIG. 4 is the result of the optical analysis of the optical component using the thin film calculation software. According to the wavelength dependence shown in FIG. 3, the transmittance at a wavelength of 9.3 ⁇ m is less than 95%.
  • the optical component of the comparative example does not satisfy the optical characteristics required for the protective window of the laser processing machine.
  • the optical component 11 of Example 1 can transmit infrared light with a higher transmittance than the optical component of Comparative Example, it is possible to reduce a local temperature rise due to absorption of light.
  • the optical component 11 of Example 1 can prevent the thermal lens effect from occurring easily.
  • the laser processing machine enables high-precision processing by using the optical component 11 of the first embodiment for the protective window.
  • the optical components 10 and 11 have the multilayer film 7 composed of three layers in which the ZnS film 4, the Ge film 5, and the DLC film 6 are stacked in this order from the substrate 1 side.
  • the transmittance of infrared light can be increased as compared with the case where two Y 2 O 3 films are stacked on the first surface 2.
  • the optical components 10 and 11 have an effect of not using an oxide and capable of transmitting infrared light with a high transmittance.
  • FIG. 5 is a sectional view showing the structure of the optical component according to the second embodiment of the present invention.
  • two ZnS films, a first ZnS film 4a and a second ZnS film 4b, and two Ge films, a first Ge film 5a and a second GeS film are formed on the first surface 2 of the optical component 12 shown in FIG. 5.
  • a multilayer film 9 having five films, that is, a second Ge film 5b and one DLC film 6 is provided.
  • the same components as those in the above-described first embodiment are designated by the same reference numerals, and configurations different from the first embodiment will be mainly described.
  • the multilayer film 9 includes, from the first surface 2 side, a first ZnS film 4a that is a first zinc processed film, a first Ge film 5a, and a second ZnS film that is a second zinc processed film.
  • the film 4b, the second Ge film 5b, and the DLC film 6 are laminated in this order in five layers.
  • An antireflection film 8 is provided on the second surface 3.
  • the thickness of the first ZnS film 4a is in the range of 80 nm to 700 nm
  • the thickness of the first Ge film 5a is in the range of 400 nm to 1100 nm
  • the thickness of the second ZnS film 4b is in the range of 600 nm to 1000 nm.
  • the thickness of the second Ge film 5b is within the range of 10 nm to 70 nm
  • the thickness of the DLC film 6 is within the range of 50 nm to 300 nm.
  • the optical component 12 includes the Ge substrate 1 and the multilayer film 9 in which the thickness of each layer is set within the above range, so that 98% or more of CO 2 laser light having a wavelength of 9 ⁇ m to 11 ⁇ m can be obtained.
  • the transmittance can be realized. Thereby, the optical component 12 can satisfy the optical characteristics required for the protective window of the laser processing machine.
  • the optical component 12 has a specific wavelength because the combination of the second ZnS film 4b and the second Ge film 5b is laminated on the combination of the first ZnS film 4a and the first Ge film 5a.
  • the transmittance of light can be improved. Since the wavelength of the laser light used for processing is fixed in the laser processing machine, the optical component 12 has a high transmittance for the laser light used for processing when applied to the protective window of the laser processing machine. Can be realized.
  • the second surface 3 may be provided with the multilayer film 7 of the first embodiment or the multilayer film 9 of the second embodiment instead of the antireflection film 8.
  • the optical component 12 of Example 2 has the multilayer film 9 provided on the first surface 2 and the antireflection film 8 provided on the second surface 3.
  • the thickness of the first ZnS film 4a is 115 nm
  • the thickness of the first Ge film 5a is 830 nm
  • the thickness of the second ZnS film 4b is 875 nm
  • the thickness of the second Ge film 5b Is 30 nm and the thickness of the DLC film 6 is 100 nm.
  • the first ZnS film 4a, the second ZnS film 4b, the first Ge film 5a, the second Ge film 5b and the antireflection film 8 are supposed to be formed by using a vacuum evaporation method.
  • the DLC film 6 shall be formed using the sputtering method.
  • the substrate 1 has a disk shape with a diameter of 90 mm and a thickness of 5 mm.
  • the transmittance was evaluated using a Fourier transform infrared spectrophotometer.
  • FIG. 6 is a diagram showing an example of wavelength dependence of transmittance in the optical component according to the second embodiment.
  • FIG. 6 shows the wavelength dependence of the optical component 12 of Example 2.
  • the vertical axis represents the transmittance and the horizontal axis represents the wavelength of light.
  • a transmittance of 98% or more is realized for a wavelength of 9.3 ⁇ m.
  • the optical component 12 satisfies the optical characteristics required for the protective window of the laser beam machine.
  • the optical component 12 includes the first ZnS film 4a, the first Ge film 5a, the second ZnS film 4b, the second Ge film 5b, and the DLC from the substrate 1 side.
  • the multilayer film 9 composed of five layers stacked in the order of the film 6, compared with the case where two Y 2 O 3 films are stacked on the first surface 2, transmission of infrared light is performed. The rate can be increased.
  • the optical component 12 can improve the transmittance for light having a specific wavelength. As a result, the optical component 12 has an effect of not using an oxide and capable of transmitting infrared light with high transmittance.
  • FIG. 7 is a diagram showing a schematic configuration of a laser processing machine according to the third embodiment of the present invention.
  • the laser processing machine 20 irradiates the workpiece 25 with the laser light 22 to process the workpiece 25.
  • the laser processing machine 20 shown in FIG. 7 has a laser oscillator 21 which is a laser light source for generating a laser beam 22, a lens system for propagating the laser beam 22, and a protective window 24 for transmitting the laser beam 22.
  • the lens system includes a condenser lens 23 that condenses the laser light 22. In FIG. 7, the lenses of the lens system other than the condenser lens 23 are not shown.
  • the protective window 24 is the optical component 10 or 11 according to the first embodiment or the optical component 12 according to the second embodiment.
  • the laser oscillator 21 is a CO 2 laser.
  • the laser processing machine 20 performs laser processing such as punching or cutting. Since the CO 2 laser is capable of high-power oscillation and is capable of oscillating laser light having a high absorptivity in resin, the laser processing machine 20 is suitable for punching a printed wiring board.
  • the protective window 24 is provided at the emission end from which the laser light 22 is emitted to the outside of the laser processing machine 20.
  • the protective window 24 is located between the condenser lens 23 and the workpiece 25.
  • the protective window 24 may be brought close to a position approximately 100 mm from the workpiece 25 during processing. Therefore, the protective window 24 is exposed to an environment in which dust or spatter generated during processing is scattered.
  • the protective window 24 is disposed with the first surface 2 side of the substrate 1 facing the workpiece 25, and is provided on the outer surface of the protective window 24 on the side facing the workpiece 25. Is provided with a DLC film 6. Since the DLC film 6 is provided on the outer surface of the protective window 24 facing the workpiece 25, the protective window 24 can exhibit high environmental resistance capable of withstanding the environment during laser processing.
  • the protective window 24 is arranged at the position closest to the workpiece 25 among all the optical components that make up the laser processing machine 20. That is, there is no optical component between the workpiece 25 and the protective window 24. Therefore, the protective window 24 can correct the refractive index distribution by introducing a new optical component or a mechanism for feeding back the output of the laser light when the refractive index distribution due to the thermal lens effect occurs. Have difficulty.
  • the protective window 24 uses the optical components 10, 11 and 12 of the first or second embodiment, so that the optical characteristics required for the protective window 24 can be obtained without adding an element for correcting the refractive index distribution. Can be realized.
  • the laser processing machine 20 uses the optical components 10, 11 and 12 of the first or second embodiment for the protective window 24, so that the laser processing machine 20 is highly accurate without limiting the processing speed for improving the processing accuracy. Processing is possible. As a result, the laser processing machine 20 can realize high productivity by eliminating the restriction on the processing speed and highly accurate processing.
  • the laser beam machine 20 can obtain high environmental resistance and high optical characteristics by including the optical components 10, 11, and 12 of the first or second embodiment. As a result, the laser processing machine 20 can maintain a proper life of the protective window 24 and realize highly accurate laser processing.
  • FIG. 8 is a diagram showing a schematic configuration of a laser processing machine according to the fourth embodiment of the present invention.
  • the laser processing machine 30 irradiates the workpiece 25 with the laser light 22 to process the workpiece 25.
  • the same components as those in the above-mentioned third embodiment are designated by the same reference numerals, and a configuration different from the third embodiment will be mainly described.
  • the laser beam machine 30 has a lens barrel 31 which is a covering component.
  • the lens barrel 31 covers the outer peripheral portion of the condenser lens 23 and the outer peripheral portion of the protective window 24.
  • the protective window 24 is provided at the end of the lens barrel 31 on the side where the laser light 22 is emitted.
  • the condenser lens 23 is arranged inside the lens barrel 31.
  • the covering component is not limited to the lens barrel 31 as long as it can prevent dust or spatter from adhering to the condenser lens 23.
  • the material and shape of the covering component may be any as long as it can prevent dust or spatter from adhering to the condenser lens 23.
  • the laser beam machine 30 is provided with the optical components 10, 11, 12 and the lens barrel 31 of the first or second embodiment, so that it is possible to obtain higher environmental resistance and high laser resistance. Optical characteristics can be obtained.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laser Beam Processing (AREA)
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PCT/JP2019/049209 2019-01-22 2019-12-16 光学部品およびレーザ加工機 WO2020153046A1 (ja)

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TW109101700A TWI732427B (zh) 2019-01-22 2020-01-17 光學構件及雷射加工機

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WO2022190661A1 (ja) * 2021-03-09 2022-09-15 パナソニックＩｐマネジメント株式会社 レーザ加工装置
WO2023162616A1 (ja) * 2022-02-24 2023-08-31 三菱電機株式会社 光学部品およびレーザ加工機

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CN115201941B (zh) * 2021-04-13 2023-09-12 中国科学院上海技术物理研究所 一种适用于空间环境的高效红外宽光谱减反射膜
CN114019591B (zh) * 2021-09-23 2023-08-01 有研国晶辉新材料有限公司 一种包括增透保护膜的光学元件及其制备方法

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Publication number Priority date Publication date Assignee Title
WO2022190661A1 (ja) * 2021-03-09 2022-09-15 パナソニックＩｐマネジメント株式会社 レーザ加工装置
WO2023162616A1 (ja) * 2022-02-24 2023-08-31 三菱電機株式会社 光学部品およびレーザ加工機

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