WO2020141775A1 - Semiconductor chip laser bonding device - Google Patents

Semiconductor chip laser bonding device Download PDF

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Publication number
WO2020141775A1
WO2020141775A1 PCT/KR2019/018261 KR2019018261W WO2020141775A1 WO 2020141775 A1 WO2020141775 A1 WO 2020141775A1 KR 2019018261 W KR2019018261 W KR 2019018261W WO 2020141775 A1 WO2020141775 A1 WO 2020141775A1
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WO
WIPO (PCT)
Prior art keywords
semiconductor chip
unit
target
pressing
bonding apparatus
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PCT/KR2019/018261
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French (fr)
Korean (ko)
Inventor
안근식
심무섭
Original Assignee
주식회사 프로텍
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Publication of WO2020141775A1 publication Critical patent/WO2020141775A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20Bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices

Definitions

  • the present invention relates to a semiconductor chip laser bonding apparatus, and more particularly, to a semiconductor chip laser bonding apparatus for picking up a semiconductor chip supplied through a chip carrier and pressing it against a substrate, etc., and then irradiating and bonding the laser light to the chip. .
  • the semiconductor chip bonding apparatus picks up a semiconductor chip formed on a wafer or a semiconductor chip cut on a wafer and attached to an adhesive film called a blue sheet to a target such as a lead frame or substrate for use in the next process. It is a device to be attached.
  • a thermal compression bonding apparatus is generally bonded by heating a semiconductor chip while the semiconductor chip is pressed against the target to fuse a solder ball of the semiconductor chip to the target.
  • the conventional TC bonder has a problem in that the semiconductor chip may be damaged in the process of heating the semiconductor chip.
  • the conventional thermal compression type semiconductor chip bonder has a problem in that the overall process efficiency is lowered because it takes time to heat or cool the heating block that adsorbs the semiconductor chip and presses the target.
  • a semiconductor chip bonding apparatus capable of bonding to a target by rapidly increasing a temperature of a solder pump or a solder ball of a semiconductor chip without increasing the temperature of the semiconductor chip itself is required.
  • the present invention has been devised to solve the need as described above, a semiconductor capable of bonding a semiconductor chip to a target by rapidly heating a solder bump or a solder ball of the semiconductor chip without significantly increasing the temperature of the semiconductor chip itself. It is an object to provide a chip laser bonding apparatus.
  • the semiconductor chip laser bonding apparatus does not significantly increase the temperature of the semiconductor chip itself during the semiconductor chip bonding process, there is an effect of solving a problem that may occur due to damage or thermal expansion of the semiconductor chip.
  • FIG. 1 is a block diagram of a semiconductor chip laser bonding apparatus according to an embodiment of the present invention.
  • FIG. 2 is a perspective view of a head unit of the semiconductor chip laser bonding apparatus shown in FIG. 1.
  • FIG. 3 is a perspective view of a portion of the head unit shown in FIG. 2.
  • FIG. 4 and 5 are cross-sectional views taken along line III-III of the head unit shown in FIG. 3.
  • FIG. 6 is a perspective view of the laser head of the semiconductor chip laser bonding apparatus shown in FIG. 2.
  • FIG. 7 is a front view of the laser chip and the semiconductor chip and the target bonded by the laser head shown in FIG.
  • FIG. 1 is a block diagram of a semiconductor chip laser bonding apparatus according to an embodiment of the present invention.
  • the semiconductor chip laser bonding device of the present invention is a device that picks up a semiconductor chip and bonds it to a target.
  • the target of this embodiment may be a substrate to which a semiconductor chip is bonded, or another semiconductor chip in a state bonded on a substrate.
  • another semiconductor chip is a target, for example, when a semiconductor chip manufactured with a technology such as through silicon via (TSV) is stacked on a substrate.
  • TSV through silicon via
  • a semiconductor chip laser bonding apparatus includes a head unit 1000 for picking up a semiconductor chip and prebonding it to a target, and a laser head 2000 for bonding a semiconductor chip prebonded to a target to a target.
  • the pre-bonding refers to a bonding process in which the position of the semiconductor chip and the target is fixed using an adhesive material before completely bonding the connection portion such as a solder bump formed on the semiconductor chip and the target.
  • FIG. 3 is a perspective view of a portion of the semiconductor chip laser bonding apparatus shown in FIG. 2, and FIGS. 4 and 5 are cross-sectional views taken along line III-III of the semiconductor chip laser bonding apparatus shown in FIG. 2.
  • the head unit 1000 of the semiconductor chip laser bonding apparatus includes a housing 100, a stretching member 200, and a clamping member 300.
  • the housing 100 includes a first accommodation space 110 and a second accommodation space 120.
  • the first accommodating space 110 and the second accommodating space 120 are each formed in a cavity shape extending upward and downward.
  • the first accommodation space 110 is disposed above the housing 100, and the second accommodation space 120 is disposed below the housing 100.
  • the stretching member 200 is disposed in the first receiving space 110 of the housing 100.
  • the stretching member 200 includes a pneumatic chamber 210 filled with air therein. According to the pressure and external force of the pneumatic chamber 210, the elastic member 200 is elastically deformed to increase or decrease in length.
  • the elastic member 200 is configured in the form of metal bellows. That is, the elastic member 200 is formed in the form of a corrugated pipe made of metal.
  • a pneumatic regulator 600 is connected to the pneumatic chamber 210 to adjust the pressure of the pneumatic chamber 210.
  • the control unit 700 controls the operation of the pneumatic regulator 600.
  • the pressure inside the pneumatic chamber 210 increases by the pneumatic regulator 600, the length of the stretching member 200 increases, and when the pressure inside the pneumatic chamber 210 decreases, the length of the stretching member 200 decreases.
  • the pressure inside the pneumatic chamber 210 is constant and an external force is applied to the elastic member 200 in the vertical direction, the length of the elastic member 200 is reduced.
  • a stopper 121 is formed in the first accommodation space 110 of the housing 100.
  • the stopper 121 serves to limit the length of the stretchable member 200 so that the length of the stretchable member 200 does not extend beyond a predetermined length. That is, as illustrated in FIG. 4, when the pressure inside the pneumatic chamber 210 is increased by the pneumatic regulator 600 to increase the length of the expansion and contraction member 200, the expansion and contraction member 200 is caught by the stopper 121. .
  • the stopper 121 serves to prevent the stretchable member 200 from extending beyond a predetermined length.
  • the clamping member 300 is configured to clamp the semiconductor chip.
  • the clamping member 300 clamps the semiconductor chip by a vacuum adsorption method.
  • the clamping member 300 is installed to be elevated in the second receiving space 120 of the housing 100, and is coupled to the lower portion of the expansion and contraction member 200. When the length of the stretching member 200 increases or decreases, the clamping member 300 descends or rises along the stretching member 200.
  • the rotating member 510 is installed in the housing 100.
  • the rotating member 510 rotates the clamping member 300 relative to the housing 100 to adjust the direction of the semiconductor chip clamped to the clamping member 300.
  • the rotating member 510 is combined with the elastic member 200.
  • the rotating member 510 rotates the clamping member 300 coupled with the elastic member 200 by rotating the elastic member 200.
  • the elastic member 200 is configured in the form of a metal bellows, the elastic member 200 is elastically deformed in the longitudinal direction, but is not torsionally deformed around the vertical central axis. Therefore, when the rotating member 510 rotates the elastic member 200, the clamping member 300 together with the elastic member 200 also rotates in the same angular displacement.
  • the displacement sensor 400 is installed in the first accommodation space 110 of the housing 100.
  • the displacement sensor 400 measures the vertical displacement of the clamping member 300 relative to the housing 100 and transmits it to the control unit 700.
  • the displacement sensor 400 indirectly measures the vertical displacement of the clamping member 300 by measuring the displacement of the lower end of the elastic member 200.
  • the displacement sensor 400 of this embodiment includes an encoder scale 410 and a lead head 420 as shown in FIG. 4.
  • the encoder scale 410 is installed at the lower end of the expansion and contraction member 200.
  • the encoder scale 410 moves up and down according to a change in the length of the elastic member 200.
  • the lead head 420 is installed on the inner wall of the first accommodation space 110 of the housing 100.
  • the read head 420 detects a change in the vertical displacement of the encoder scale 410 and transmits it to the control unit 700.
  • the first transfer unit 520 is coupled to the housing 100 of the head unit 1000.
  • the first transfer unit 520 transfers the head unit 1000 in the horizontal direction and moves up and down.
  • the first transfer unit 520 lowers the housing 100 of the head unit 1000 to pick up the semiconductor chip.
  • the first transfer unit 520 lowers the housing 100 of the head unit 1000 to press the semiconductor chip to the target and prebond it. .
  • FIG. 6 is a perspective view of the laser head 2000 of the semiconductor chip laser bonding apparatus shown in FIG. 2
  • FIG. 7 is a cross-sectional view of the laser head 2000 shown in FIG. 6.
  • the laser head 2000 bonds the semiconductor chip pre-bonded to the target by the head unit 1000 described above to the target.
  • the laser head 2000 includes a light source that generates laser light.
  • the laser head 2000 includes a pressure unit 2100 and a second transfer unit 2200.
  • the pressing unit 2100 is disposed under the laser head 2000.
  • the pressing unit 2100 includes a transmission portion 2140, a pressing member 2110, a supporting member 2120, and a tilt member 2130.
  • the transmitting portion 2140 transmits laser light generated from the light source of the laser head 2000.
  • the transmissive portion 2140 is made of quartz and has high transmittance. Referring to FIG. 6, the transmission part 2140 is coupled to the pressing member 2110.
  • the pressing member 2110 is disposed to be positioned above the semiconductor chip pre-bonded to the target.
  • the support member 2120 is disposed above the pressing member 2110.
  • the tilt member 2130 is installed between the support member 2120 and the pressure member 2110 to connect the pressure member 2110 and the support member 2120.
  • the tilt member 2130 adjusts the angle of the pressing member 2110 with respect to the support member 2120.
  • the tilt member 2130 again includes three tilt rods 2131 and three force sensors 2132.
  • the tilt rod 2131 connects the support member 2120 and the pressing member 2110 at three points. That is, the support member 2120 and the pressing member 2110 are connected to each other by three tilt rods 2131.
  • the tilt rod 2131 is composed of a piezoelectric actuator.
  • the piezoelectric actuator is composed of a piezoelectric element whose length is changed by an applied voltage.
  • the length of the tilt rod 2131 composed of a piezoelectric actuator is varied by the applied voltage.
  • the inclination angle of the pressing member 2110 is adjusted by changing the lengths of the three tilt rods 2131 according to the applied voltage of the control unit 700.
  • the force sensor 2132 is installed on the pressing member 2110 and measures the force applied to the pressing member 2110.
  • the force sensor 2132 is composed of a piezoelectric element.
  • the piezoelectric element generates a voltage according to a change in external force applied to the piezoelectric element.
  • the force sensor 2132 generates a voltage through a change in the force applied to the pressing member 2110, detects the amount of change in the force, and transmits the result to the control unit 700.
  • the second transfer unit 2200 transfers the pressing unit 2100 in the vertical direction.
  • the transmission unit 2140 of the pressing unit 2100 can press the semiconductor chip pre-bonded to the target.
  • the target transfer unit 3000 transfers the target to which the semiconductor chip is pre-bonded by the head unit 1000 described above in the horizontal direction.
  • the target transfer unit 3000 transfers the target in which the pre-bonding process is completed in the head unit 1000 in the horizontal direction to transfer the target to the working space of the laser head 2000.
  • the control unit 700 controls both the operation of the head unit, the second transfer unit 2200, the target transfer unit 3000, and the laser head 2000.
  • the detailed description of the control of the control unit 700 will be made in the description of the operation of the semiconductor chip laser bonding apparatus according to the present embodiment.
  • an adhesive material is previously attached to the target to which the semiconductor chip is prebonded.
  • a non-conductive film is used.
  • the non-conductive film is an insulating film having tackiness.
  • a semiconductor chip is bonded by receiving a target having a non-conductive film attached to the substrate or a non-conductive film attached to the semiconductor chip bonded onto the substrate. When the semiconductor chip is pressed against the non-conductive film of the target, the semiconductor chip may be pre-bonded to the target by the adhesiveness of the non-conductive film.
  • the control unit 700 operates the pneumatic regulator 600 to maintain a constant air pressure in the pneumatic chamber 210 of the expansion and contraction member 200.
  • the expansion and contraction member 200 increases to a length in contact with the stopper 121 as shown in FIG. 4.
  • the control unit 700 operates the head unit 1000 and the first transfer unit 520 so that the head unit 1000 picks up the semiconductor chip.
  • the control unit 700 operates the first transfer unit 520.
  • the clamping member 300 adsorbs and clamps the semiconductor chip.
  • the clamping member 300 separates and lifts the semiconductor chip from the chip carrier.
  • the first transfer unit 520 transfers the head unit 1000 of the present embodiment onto the target.
  • the control unit 700 controls the direction of the semiconductor chip clamped to the clamping member 300 by rotating the elastic member 200 by operating the rotating member 510.
  • a semiconductor chip and a target are photographed using a camera in advance. Based on the image taken by the camera, the controller 700 aligns the position and direction between the target and the semiconductor chip.
  • the control unit 700 operates the first transfer unit 520 to lower the clamping member 300.
  • the clamping member 300 descends and the semiconductor chip contacts the target, the stretching member 200 begins to contract.
  • the force pressing the semiconductor chip by the contraction displacement of the expansion and contraction member 200 is determined in a state in which a constant pressure is maintained in the pneumatic chamber 210 by the pneumatic regulator 600.
  • the pressure for pressing the semiconductor chip against the target is determined in advance as a process specification.
  • the control unit 700 adjusts the pressing force of the semiconductor chip against the target by adjusting the contraction displacement value of the elastic member 200 (that is, the displacement that lowers the housing 100 by the first transfer unit 520). .
  • the control unit 700 receives the degree of contraction of the elastic member 200 in real time using the displacement sensor 400.
  • the controller 700 lowers the housing 100 through the first transfer unit 520 to a predetermined displacement while sensing the measured value of the displacement sensor 400 in real time.
  • the non-conductive film as an adhesive material is mounted on the semiconductor chip or target as described above, when the semiconductor chip is pressed against the target, the semiconductor chip is prebonded to the target.
  • the control unit 700 releases the vacuum of the clamping member 300 to place the semiconductor chip on the target, and raises the housing 100 through the first transfer unit 520.
  • the clamping member 300 is raised by the operation of the first transfer unit 520, the semiconductor chip pre-bonding process is completed.
  • the head unit 1000 of the present embodiment adjusts the operation of the first transfer unit 520 while real-time detecting the change in the length of the expansion and contraction member 200, so that the pressing force of the semiconductor chip against the target is accurate and It has the advantage of being elaborately adjustable.
  • the pressing force for pressing the semiconductor chip is determined as a microload.
  • the head unit 1000 of this embodiment can accurately and precisely adjust the pressing force for such a microload.
  • the pressure generated by the pneumatic regulator 600 and the elastic modulus of the expansion and contraction member 200 may vary depending on the temperature and ambient environmental conditions. In this case, after considering the variables affecting the pressing force, Since the change can be compensated or corrected by a change in the descending displacement of the first transfer unit 520 (ie, the contraction displacement of the elastic member 200), it is possible to greatly improve the quality of the pre-bonding process.
  • the control unit 700 operates the target transfer unit 3000.
  • the target transfer unit 3000 transfers the pre-bonded target in a horizontal direction to the semiconductor chip so that the target is transported to the working area of the laser head 2000.
  • the semiconductor chip is adhered to the target by a non-conductive film.
  • the control unit 700 operates the second transfer unit 2200.
  • the pre-bonded semiconductor chip is bonded to the target on which the non-conductive film is placed.
  • a connection portion such as a solder bump of the semiconductor chip must pass through the non-conductive film to contact the connection portion of the target. For this reason, it is necessary to press the semiconductor chip with a relatively large force against the target.
  • the pressing unit 2100 of the laser head 2000 descends toward the target.
  • the transmissive portion 2140 coupled to the pressing member 2110 and the semiconductor chip pre-bonded to the target begin to contact.
  • the semiconductor chip and the target may be pre-bonded in a state that is not aligned with each other.
  • a connection failure problem may occur.
  • This connection failure is a problem that occurs when the connection portion of the semiconductor chip does not contact the connection portion of the target in the portion pressed with a relatively weak force.
  • misalignment of the semiconductor chip and the target may also occur.
  • the tilt member 2130 adjusts the angle of the pressing member 2110 so that the semiconductor chip and the target are parallel to each other. Further, the tilt member 2130 allows the force applied by the pressing member 2110 to the semiconductor chip to be constant.
  • the semiconductor chip laser bonding apparatus includes a tilt member 2130 installed between the support member 2120 and the pressing member 2110.
  • the force sensor 2132 of the tilt member 2130 measures the change in contact force between the semiconductor chip and the pressing member 2110.
  • the force sensor 2132 is composed of three, and the three force sensors 2132 measure a change in contact force.
  • the control unit 700 applies a voltage to the tilt rod 2131 of the tilt member 2130 based on the contact force measured by the force sensor 2132. That is, the control unit 700 applies a voltage to the tilt rod 2131 so that the contact forces measured by the force sensors 2132 are equal to each other.
  • the control unit 700 applies a voltage to the tilt rod 2131 disposed at a portion where two force sensors 2132 having a small contact force are located.
  • the voltage-applied tilt rod 2131 increases in length.
  • the angle of the pressing member 2110 relative to the supporting member 2120 is changed by the tilt rod 2131 whose length is increased.
  • the pressing member 2110 presses the semiconductor chip with a stronger force than before in the portion where the tilt rod 2131 having an increased length is installed.
  • the pressing member 2110 can press the semiconductor chip in a tilted state so that the semiconductor chip is pressed in a state parallel to the target.
  • the force exerted by the pressing member 2110 on the semiconductor chip becomes constant at all portions.
  • the control unit 700 applies a voltage to the tilt rod 2131 so that the values measured by the force sensor 2132 are all the same. Due to this, the transmissive portion 2140 is maintained in parallel with the semiconductor chip, and the pressing member 2110 can press the semiconductor chip against the target with a uniform force. For this reason, it is possible to completely solve the above-described connection problem between the semiconductor chip and the target.
  • the force sensor 2132 is composed of a piezoelectric element.
  • the piezoelectric element has a very fast reaction speed compared to a general load cell capable of detecting a change in contact force, and thus it is possible to quickly detect the inclined state of the pressing member 2110.
  • the tilt rod 2131 for correcting the inclination of the pressing member 2110 according to the applied voltage of the control unit 700 through the measured value of the force sensor 2132 is composed of a piezoelectric actuator.
  • the piezoelectric actuator has a very fast response speed and generates a strong force. As described above, in order to bond the semiconductor chip and the target using a non-conductive film, it is necessary to press the semiconductor chip with a relatively strong force against the target.
  • the tilt rod 2131 can solve the misalignment problem by correcting the angle of the pressing member 2110 very quickly and accurately. That is, the semiconductor chip laser bonding apparatus according to the present embodiment has the effect of quickly measuring the inclination of the pressing member 2110 using a piezoelectric element and a piezoelectric actuator, and quickly correcting it, thereby blocking the problem of misalignment.
  • Alignment of the pressing member 2110 of the tilt member 2130 may be performed each time the semiconductor chip is pressed, or the rest of the semiconductor chip pressing may be performed while fixing the pressing member 2110 aligned during the pressing process of the first semiconductor chip. It might be.
  • the angle formed between the semiconductor chips pre-bonded to the target and the pressing member 2110 is generally the same. Once the pressing member 2110 and the semiconductor chip are aligned in parallel, the rest of the semiconductor chip and the pressing member 2110 are also in parallel. In this case, since the alignment of the tilt member 2130 does not need to be performed individually, the process time can be slightly shortened.
  • the light source of the laser head 2000 irradiates laser light while the transmissive portion 2140 coupled to the pressing member 2110 presses the semiconductor chip.
  • the laser light transmitted through the transmissive portion 2140 is transmitted to the semiconductor chip to rapidly and rapidly increase the temperature of the connecting portion. Due to this, the connection portion of the semiconductor chip is instantaneously melted and the semiconductor chip and the target are bonded. This is called laser bonding.
  • laser bonding rapidly raises the temperature of a semiconductor chip without a heating block, which significantly reduces the problem of semiconductor chip and target misalignment due to thermal expansion of the semiconductor chip. Can be reduced.
  • the semiconductor chip laser bonding apparatus has an effect of solving the problem of misalignment of the semiconductor chip and the target through laser bonding and shortening the process time.
  • the non-conductive film is also cured as described above. The cured non-conductive film fills the empty space between the semiconductor chip and the target, thereby increasing the physical and chemical stability of the semiconductor packaging.
  • the transmissive portion 2140 it is also possible to perform laser bonding by controlling the size of the transmissive portion 2140 to press a plurality of semiconductor chips at once.
  • the large-sized transmission unit 2140 presses the plurality of semiconductor chips at once and laser bonding is performed in this state, the plurality of semiconductor chips are bonded to the target at once. This can shorten the process time for bonding the semiconductor chip and the target.
  • control unit 700 When the semiconductor chip is completely bonded to the target by laser bonding, the control unit 700 operates the second transfer unit 2200 again.
  • the second transfer unit 2200 raises the pressure unit 2100.
  • control unit 700 operates the target transfer unit 3000 so that the target transfer unit 3000 transfers the semiconductor chip-bonded target to the next process.
  • the head unit 1000 provided with the elastic member 200 has been described as an example, but various head units capable of prebonding a semiconductor chip to a target may be used. That is, the semiconductor chip laser bonding apparatus may be configured as a head unit having a simple structure that simply picks up a semiconductor chip and transports it to a target to pre-bond the target.
  • the head unit 1000 having the rotating member 510 has been described as an example, but in some cases, a semiconductor chip laser bonding device without the rotating member 510 may be configured.
  • the stretching member 200 was previously described as being composed of a metal bellows, it is also possible to configure a stretching member having a configuration other than the metal bellows.
  • Various other configurations in which the length is stretched by the pressure of the pneumatic chamber can be used as the stretching member.
  • the spline shaft and the boss may be coupled to each other to construct a stretchable member using a structure constituting a pneumatic chamber between them.
  • clamping member 300 may also be used in a structure capable of clamping the semiconductor chip by a method other than the vacuum adsorption method.
  • the displacement sensor 400 may be used in addition to the displacement sensor 400 composed of the encoder scale 410 and the lead head 420 described above, a displacement sensor of various other structures, such as a laser sensor.
  • tilt member 2130 has been described as having three tilt rods 2131 and three force sensors 2132, the number of tilt rods and force sensors may be variously changed.
  • the tilt rod 2131 was previously described as being composed of a piezoelectric actuator, and the force sensor 2132 was composed of a piezoelectric element, the tilt rod may be composed of various actuators capable of length deformation, and the force sensor is also capable of contact force. It can be composed of various sensors that can be calculated.
  • the installation position of the force sensor can be variously changed.
  • the force sensor may be installed at a position capable of measuring the force applied to the pressing member.
  • the force sensor can be installed between the tilt rod and the pressing member.
  • the laser head 2000 described above includes the tilt member 2130
  • the laser chip with the tilt member 2130 omitted may constitute the semiconductor chip laser bonding apparatus according to the present invention.
  • the semiconductor chip laser bonding apparatus of the present invention may be manufactured in the form of parts that can be used in a die bonding apparatus, and may be produced, distributed, etc., or may be implemented in the form of a die bonding apparatus in which the semiconductor chip laser bonding apparatus of the present invention is installed. have.

Abstract

The present invention relates to a semiconductor chip laser bonding device and, more specifically, to a semiconductor chip laser bonding device which picks up a semiconductor chip supplied by means of a chip carrier, presses the semiconductor chip against a substrate, etc., and then irradiates laser light to the chip for bonding. The semiconductor chip laser bonding device, according to the present invention, does not heavily raise the temperature of a semiconductor chip during a semiconductor chip bonding process, and thus has the effect of solving any problem which may occur due to damage or thermal expansion of the semiconductor chip. In addition, by using laser light, the method rapidly reaches a temperature required for bonding and significantly reduces the time for lowering the temperature of the semiconductor chip, thereby having the effect of shortening the entire processing time.

Description

반도체 칩 레이저 본딩 장치Semiconductor chip laser bonding device
본 발명은 반도체 칩 레이저 본딩 장치에 관한 것으로서, 더욱 상세하게는 칩 운반체를 통해 공급되는 반도체 칩을 픽업 후 기판 등에 대해 가압한 뒤 레이저 광을 칩에 조사하여 본딩하는 반도체 칩 레이저 본딩 장치에 관한 것이다.The present invention relates to a semiconductor chip laser bonding apparatus, and more particularly, to a semiconductor chip laser bonding apparatus for picking up a semiconductor chip supplied through a chip carrier and pressing it against a substrate, etc., and then irradiating and bonding the laser light to the chip. .
반도체 칩 본딩 장치는 웨이퍼 상에 형성된 반도체 칩이나, 웨이퍼 상에서 절단되어 블루 시트(blue sheet)라고 불리는 점착성 필름에 부착되어 있는 반도체 칩을 픽업하여 다음 공정에 사용하기 위한 리드 프레임이나 기판 등의 타겟에 옮겨 부착하는 장치이다.The semiconductor chip bonding apparatus picks up a semiconductor chip formed on a wafer or a semiconductor chip cut on a wafer and attached to an adhesive film called a blue sheet to a target such as a lead frame or substrate for use in the next process. It is a device to be attached.
이와 같은 반도체 칩 본딩 장치 중 열압착 본딩 장치(Thermal Compression Bonder)는 반도체 칩을 타겟에 가압한 상태에서 반도체 칩을 가열하여 반도체 칩의 솔더 볼을 타겟에 융착시키는 방법으로 본딩하는 것이 일반적이다. 이와 같은 종래의 TC 본더는 반도체 칩을 가열하는 과정에서 반도체 칩이 손상될 수 있는 문제점이 있다. 또한, 종래의 열압착 방식 반도체 칩 본더는 반도체 칩을 흡착하여 타겟에 가압하는 히팅 블록을 가열하거나 냉각하는 데에 시간이 소요되어 전체적인 공정 효율이 떨어지는 문제점이 있다.Among these semiconductor chip bonding apparatuses, a thermal compression bonding apparatus is generally bonded by heating a semiconductor chip while the semiconductor chip is pressed against the target to fuse a solder ball of the semiconductor chip to the target. The conventional TC bonder has a problem in that the semiconductor chip may be damaged in the process of heating the semiconductor chip. In addition, the conventional thermal compression type semiconductor chip bonder has a problem in that the overall process efficiency is lowered because it takes time to heat or cool the heating block that adsorbs the semiconductor chip and presses the target.
이와 같은 문제점을 해결하기 위하여 반도체 칩 자체의 온도는 크게 높이지 않으면서 반도체 칩의 솔더 펌프 또는 솔더 볼의 온도를 빠르게 높여서 타겟에 본딩할 수 있는 반도체 칩 본딩 장치가 필요하다.In order to solve this problem, a semiconductor chip bonding apparatus capable of bonding to a target by rapidly increasing a temperature of a solder pump or a solder ball of a semiconductor chip without increasing the temperature of the semiconductor chip itself is required.
본 발명은 상술한 바와 같은 필요성을 해결하기 위해 위하여 안출된 것으로, 반도체 칩 자체의 온도는 크게 높이지 않으면서 반도체 칩의 솔더 범프 또는 솔더 볼을 빠르게 가열하여 반도체 칩을 타겟에 본딩할 수 있는 반도체 칩 레이저 본딩 장치를 제공하는 것을 목적으로 한다.The present invention has been devised to solve the need as described above, a semiconductor capable of bonding a semiconductor chip to a target by rapidly heating a solder bump or a solder ball of the semiconductor chip without significantly increasing the temperature of the semiconductor chip itself. It is an object to provide a chip laser bonding apparatus.
상기 목적을 달성하기 위한 본 발명에 따른 반도체 칩 레이저 본딩 장치는, 칩 운반체로부터 반도체 칩을 전달받아 타겟에 대해 프리 본딩할 수 있도록 클램핑하는 헤드 유닛; 상기 헤드 유닛에 클램핑된 반도체 칩을 상기 타겟에 대해 정렬하고 가압할 수 있도록 상기 헤드 유닛을 수평 방향과 상하 방향으로 이송하는 제1이송유닛; 상기 헤드 유닛에 의해 반도체 칩이 프리 본딩된 타겟을 수평 방향으로 이송하는 타겟 이송 유닛; 상기 타겟에 프리 본딩된 반도체 칩의 솔더 범프에 열을 가하여 상기 타겟과 반도체 칩을 서로 접착시킬 수 있도록 상기 반도체 칩에 레이저 광을 조사하는 레이저 헤드; 및 상기 헤드 유닛과 제1이송유닛과 타겟 이송 유닛과 레이저 헤드의 작동을 제어하는 제어부;를 포함하는 점에 특징이 있다.A semiconductor chip laser bonding apparatus according to the present invention for achieving the above object comprises: a head unit for receiving a semiconductor chip from a chip carrier and clamping to pre-bond to a target; A first transfer unit for transferring the head unit in the horizontal and vertical directions so that the semiconductor chip clamped to the head unit is aligned and pressed against the target; A target transfer unit for transferring the target pre-bonded by the semiconductor chip in the horizontal direction by the head unit; A laser head that irradiates laser light to the semiconductor chip so as to adhere the target and the semiconductor chip to each other by applying heat to the solder bumps of the semiconductor chip prebonded to the target; And a control unit that controls the operation of the head unit, the first transfer unit, the target transfer unit, and the laser head.
본 발명에 의한 반도체 칩 레이저 본딩 장치는, 반도체 칩 본딩 과정에서 반도체 칩 자체의 온도를 크게 상승시키지 않으므로 반도체 칩의 손상이나 열팽창에 의해 발생할 수 있는 문제를 해결하는 효과가 있다. Since the semiconductor chip laser bonding apparatus according to the present invention does not significantly increase the temperature of the semiconductor chip itself during the semiconductor chip bonding process, there is an effect of solving a problem that may occur due to damage or thermal expansion of the semiconductor chip.
도 1은 본 발명의 일실시예에 따른 반도체 칩 레이저 본딩 장치의 구성도이다.1 is a block diagram of a semiconductor chip laser bonding apparatus according to an embodiment of the present invention.
도 2는 도 1에 도시된 반도체 칩 레이저 본딩 장치의 헤드 유닛의 사시도이다.FIG. 2 is a perspective view of a head unit of the semiconductor chip laser bonding apparatus shown in FIG. 1.
도 3은 도 2에 도시된 헤드 유닛의 일부분에 대한 사시도이다.3 is a perspective view of a portion of the head unit shown in FIG. 2.
도 4 및 도 5는 3에 도시된 헤드 유닛의 Ⅲ-Ⅲ선 단면도이다.4 and 5 are cross-sectional views taken along line III-III of the head unit shown in FIG. 3.
도 6은 도 2에 도시된 반도체 칩 레이저 본딩 장치의 레이저 헤드의 사시도이다.FIG. 6 is a perspective view of the laser head of the semiconductor chip laser bonding apparatus shown in FIG. 2.
도 7은 도 6에 도시된 레이저 헤드와 레이저 헤드에 의해 본딩되는 반도체 칩과 타겟의 정면도이다.7 is a front view of the laser chip and the semiconductor chip and the target bonded by the laser head shown in FIG.
이하에서는 첨부된 도면을 참조하여, 본 발명의 일실시예에 따른 반도체 칩 레이저 본딩 장치에 대해 설명한다.Hereinafter, a semiconductor chip laser bonding apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings.
도 1은 본 발명의 일실시예에 따른 반도체 칩 레이저 본딩 장치의 구성도이다.1 is a block diagram of a semiconductor chip laser bonding apparatus according to an embodiment of the present invention.
본 발명의 반도체 칩 레이저 본딩 장치는 반도체 칩을 픽업하여 타겟에 본딩하는 장치이다. 본 실시예의 타겟은 반도체 칩이 본딩되는 기판일 수 있고, 기판 위에 본딩된 상태의 다른 반도체 칩일 수 있다. 여기서 다른 반도체 칩이 타겟인 경우는 TSV(Through Silicon Via)와 같은 기술로 제작된 반도체 칩을 기판 위에 적층하는 경우를 예로 들 수 있다. 도 1을 참조하면, 본 실시예에 따른 반도체 칩 레이저 본딩 장치는 크게 반도체 칩을 픽업하여 타겟에 프리 본딩시키는 헤드 유닛(1000)과 타겟에 프리 본딩된 반도체 칩을 타겟에 본딩시키는 레이저 헤드(2000)로 구성된다. 여기서 프리 본딩이란, 반도체 칩에 형성된 솔더 범프와 같은 접속부와 타겟의 접속부를 완전히 본딩하기 전에 점착성 물질을 이용하여 반도체 칩과 타겟의 위치를 고정하는 본딩 과정을 말한다. The semiconductor chip laser bonding device of the present invention is a device that picks up a semiconductor chip and bonds it to a target. The target of this embodiment may be a substrate to which a semiconductor chip is bonded, or another semiconductor chip in a state bonded on a substrate. Here, when another semiconductor chip is a target, for example, when a semiconductor chip manufactured with a technology such as through silicon via (TSV) is stacked on a substrate. Referring to FIG. 1, a semiconductor chip laser bonding apparatus according to the present exemplary embodiment includes a head unit 1000 for picking up a semiconductor chip and prebonding it to a target, and a laser head 2000 for bonding a semiconductor chip prebonded to a target to a target. ). Here, the pre-bonding refers to a bonding process in which the position of the semiconductor chip and the target is fixed using an adhesive material before completely bonding the connection portion such as a solder bump formed on the semiconductor chip and the target.
먼저, 도 3 내지 도 5를 참조하여 헤드 유닛(1000)과 헤드 유닛(1000)을 이송하는 제1이송유닛(520)에 대해 자세히 설명한다. 도 3는 도 2에 도시된 반도체 칩 레이저 본딩 장치의 일부분에 대한 사시도이고, 도 4 및 도 5는 2에 도시된 반도체 칩 레이저 본딩 장치의 Ⅲ-Ⅲ선 단면도이다.First, the head unit 1000 and the first transfer unit 520 for transferring the head unit 1000 will be described in detail with reference to FIGS. 3 to 5. FIG. 3 is a perspective view of a portion of the semiconductor chip laser bonding apparatus shown in FIG. 2, and FIGS. 4 and 5 are cross-sectional views taken along line III-III of the semiconductor chip laser bonding apparatus shown in FIG. 2.
도 3 내지 도 4을 참조하면, 본 실시예에 따른 반도체 칩 레이저 본딩 장치의 헤드 유닛(1000)은 하우징(100)과 신축 부재(200)와 클램핑 부재(300)를 포함하여 이루어진다.3 to 4, the head unit 1000 of the semiconductor chip laser bonding apparatus according to the present embodiment includes a housing 100, a stretching member 200, and a clamping member 300.
하우징(100)은 제1수용공간(110)과 제2수용공간(120)을 구비한다. 제1수용공간(110)과 제2수용공간(120)은 각각 상하로 연장되는 캐비티 형태로 형성된다. 제1수용공간(110)은 하우징(100)의 상부에 배치되고, 제2수용공간(120)은 하우징(100)의 하부에 배치된다. The housing 100 includes a first accommodation space 110 and a second accommodation space 120. The first accommodating space 110 and the second accommodating space 120 are each formed in a cavity shape extending upward and downward. The first accommodation space 110 is disposed above the housing 100, and the second accommodation space 120 is disposed below the housing 100.
신축 부재(200)는 하우징(100)의 제1수용공간(110) 내에 배치된다 신축 부재(200)는 내부에 공기가 채워지는 공압 챔버(210)를 구비한다. 공압 챔버(210)의 압력과 외력에 따라 신축 부재(200)는 탄성 변형하여 길이가 늘어나거나 줄어든다. 본 실시예의 경우 신축 부재(200)는 메탈 벨로즈(metal bellows) 형태로 구성된다. 즉, 신축 부재(200)는 금속 재질의 주름관 형태로 형성된다. The stretching member 200 is disposed in the first receiving space 110 of the housing 100. The stretching member 200 includes a pneumatic chamber 210 filled with air therein. According to the pressure and external force of the pneumatic chamber 210, the elastic member 200 is elastically deformed to increase or decrease in length. In the present embodiment, the elastic member 200 is configured in the form of metal bellows. That is, the elastic member 200 is formed in the form of a corrugated pipe made of metal.
공압 챔버(210)에는 공압 레귤레이터(600)가 연결되어 공압 챔버(210)의 압력을 조절한다. 제어부(700)는 공압 레귤레이터(600)의 작동을 제어한다. 공압 레귤레이터(600)에 의해 공압 챔버(210) 내부의 압력이 증가하면 신축 부재(200)는 길이가 늘어나고, 공압 챔버(210) 내부의 압력이 감소하면 신축 부재(200)는 길이가 줄어든다. 공압 챔버(210) 내부의 압력이 일정한 상태에서 신축 부재(200)에 대해 상하 방향으로 외력이 가해지면 신축 부재(200)의 길이는 줄어들게 된다. A pneumatic regulator 600 is connected to the pneumatic chamber 210 to adjust the pressure of the pneumatic chamber 210. The control unit 700 controls the operation of the pneumatic regulator 600. When the pressure inside the pneumatic chamber 210 increases by the pneumatic regulator 600, the length of the stretching member 200 increases, and when the pressure inside the pneumatic chamber 210 decreases, the length of the stretching member 200 decreases. When the pressure inside the pneumatic chamber 210 is constant and an external force is applied to the elastic member 200 in the vertical direction, the length of the elastic member 200 is reduced.
하우징(100)의 제1수용공간(110)에는 스토퍼(121)가 형성된다. 스토퍼(121)는 신축 부재(200)의 길이가 정해진 길이 이상 늘어나지 않도록 신축 부재(200)의 길이를 제한하는 역할을 한다. 즉, 도 4에 도시한 것과 같이 공압 레귤레이터(600)에 의해 공압 챔버(210) 내부 압력이 증가하여 신축 부재(200)의 길이가 늘어나면, 신축 부재(200)가 스토퍼(121)에 걸리게 된다. 스토퍼(121)는 신축 부재(200)가 정해진 길이 이상 늘어나지 않게 하는 역할을 한다. A stopper 121 is formed in the first accommodation space 110 of the housing 100. The stopper 121 serves to limit the length of the stretchable member 200 so that the length of the stretchable member 200 does not extend beyond a predetermined length. That is, as illustrated in FIG. 4, when the pressure inside the pneumatic chamber 210 is increased by the pneumatic regulator 600 to increase the length of the expansion and contraction member 200, the expansion and contraction member 200 is caught by the stopper 121. . The stopper 121 serves to prevent the stretchable member 200 from extending beyond a predetermined length.
클램핑 부재(300)는 반도체 칩을 클램핑하는 구성이다. 본 실시예의 경우 클램핑 부재(300)는 진공 흡착하는 방법으로 반도체 칩을 클램핑한다. 도 4에 도시한 것과 같이 클램핑 부재(300)는 하우징(100)의 제2수용공간(120) 내에 승강 가능하게 설치되어, 신축 부재(200)의 하부에 결합된다. 신축 부재(200)의 길이가 늘어나거나 줄어들면, 클램핑 부재(300)는 신축 부재(200)를 따라 하강하거나 상승하게 된다.The clamping member 300 is configured to clamp the semiconductor chip. In this embodiment, the clamping member 300 clamps the semiconductor chip by a vacuum adsorption method. As shown in Figure 4, the clamping member 300 is installed to be elevated in the second receiving space 120 of the housing 100, and is coupled to the lower portion of the expansion and contraction member 200. When the length of the stretching member 200 increases or decreases, the clamping member 300 descends or rises along the stretching member 200.
도 4을 참조하면, 회전 부재(510)는 하우징(100)에 설치된다. 회전 부재(510)는 하우징(100)에 대해 클램핑 부재(300)를 회전시켜 클램핑 부재(300)에 클램핑된 반도체 칩의 방향을 조절한다. 본 실시예의 경우 회전 부재(510)는 신축 부재(200)와 결합된다. 회전 부재(510)는 신축 부재(200)를 회전시킴으로써 신축 부재(200)와 결합된 클램핑 부재(300)를 회전시킨다. 상술한 바와 같이 신축 부재(200)는 메탈 벨로즈 형태로 구성되므로, 신축 부재(200)는 길이 방향으로 탄성 변형되나 수직방향 중심축을 중심으로 하는 비틀림 변형되지는 않는다. 따라서, 회전 부재(510)가 신축 부재(200)를 회전시키면 신축 부재(200)와 함께 클램핑 부재(300)도 동일한 각변위로 회전하게 된다.4, the rotating member 510 is installed in the housing 100. The rotating member 510 rotates the clamping member 300 relative to the housing 100 to adjust the direction of the semiconductor chip clamped to the clamping member 300. In the case of this embodiment, the rotating member 510 is combined with the elastic member 200. The rotating member 510 rotates the clamping member 300 coupled with the elastic member 200 by rotating the elastic member 200. As described above, since the elastic member 200 is configured in the form of a metal bellows, the elastic member 200 is elastically deformed in the longitudinal direction, but is not torsionally deformed around the vertical central axis. Therefore, when the rotating member 510 rotates the elastic member 200, the clamping member 300 together with the elastic member 200 also rotates in the same angular displacement.
하우징(100)의 제1수용공간(110)에는 변위 센서(400)가 설치된다. 변위 센서(400)는 하우징(100)에 대한 클램핑 부재(300)의 상하 방향 변위를 측정하여 제어부(700)에 전달한다. 본 실시예의 경우 변위 센서(400)는 신축 부재(200)의 하단부의 변위를 측정하는 방법으로 클램핑 부재(300)의 상하 방향 변위를 간접적으로 측정한다. 본 실시예의 변위 센서(400)는 도 4에 도시한 것과 같이 엔코더 스케일(410)과 리드 헤드(420)를 구비한다. 엔코더 스케일(410)은 신축 부재(200)의 하단부에 설치된다. 신축 부재(200)의 길이변화에 따라 엔코더 스케일(410)은 상하로 움직이게 된다. 리드 헤드(420)는 하우징(100)의 제1수용공간(110) 내벽에 설치된다. 리드 헤드(420)는 엔코더 스케일(410)의 상하방향 변위 변화를 감지하여 제어부(700)에 전달한다. The displacement sensor 400 is installed in the first accommodation space 110 of the housing 100. The displacement sensor 400 measures the vertical displacement of the clamping member 300 relative to the housing 100 and transmits it to the control unit 700. In the present embodiment, the displacement sensor 400 indirectly measures the vertical displacement of the clamping member 300 by measuring the displacement of the lower end of the elastic member 200. The displacement sensor 400 of this embodiment includes an encoder scale 410 and a lead head 420 as shown in FIG. 4. The encoder scale 410 is installed at the lower end of the expansion and contraction member 200. The encoder scale 410 moves up and down according to a change in the length of the elastic member 200. The lead head 420 is installed on the inner wall of the first accommodation space 110 of the housing 100. The read head 420 detects a change in the vertical displacement of the encoder scale 410 and transmits it to the control unit 700.
도 2을 참조하면, 제1이송유닛(520)은 헤드 유닛(1000)의 하우징(100)에 결합된다. 제1이송유닛(520)은 헤드 유닛(1000)을 수평 방향으로 이송하고 상하로 승강시킨다. 제1이송유닛(520)에 의해 결정된 위치에서 제1이송유닛(520)은 헤드 유닛(1000)의 하우징(100)을 하강시켜 반도체 칩을 픽업한다. 제1이송유닛(520)이 헤드 유닛(1000)을 타겟 위로 이송하면, 제1이송유닛(520)은 헤드 유닛(1000)의 하우징(100)을 하강시켜 반도체 칩을 타겟에 가압하고 프리 본딩한다. Referring to FIG. 2, the first transfer unit 520 is coupled to the housing 100 of the head unit 1000. The first transfer unit 520 transfers the head unit 1000 in the horizontal direction and moves up and down. At the position determined by the first transfer unit 520, the first transfer unit 520 lowers the housing 100 of the head unit 1000 to pick up the semiconductor chip. When the first transfer unit 520 transfers the head unit 1000 over the target, the first transfer unit 520 lowers the housing 100 of the head unit 1000 to press the semiconductor chip to the target and prebond it. .
다음으로, 도 6 및 도 7을 참조하여 레이저 헤드(2000)와 나머지 구성에 대해 자세히 설명한다. 도 6은 도 2에 도시된 반도체 칩 레이저 본딩 장치의 레이저 헤드(2000)의 사시도이고, 도 7은 도 6에 도시된 레이저 헤드(2000)의 단면도이다.Next, the laser head 2000 and the rest of the configuration will be described in detail with reference to FIGS. 6 and 7. 6 is a perspective view of the laser head 2000 of the semiconductor chip laser bonding apparatus shown in FIG. 2, and FIG. 7 is a cross-sectional view of the laser head 2000 shown in FIG. 6.
레이저 헤드(2000)는 상술한 헤드 유닛(1000)에 의해 타겟에 프리 본딩된 반도체 칩을 타겟에 접착시킨다. 레이저 헤드(2000)는 레이저 광을 생성하는 광원을 포함한다. 레이저 헤드(2000)는 가압 유닛(2100)과 제2이송유닛(2200)을 포함한다. The laser head 2000 bonds the semiconductor chip pre-bonded to the target by the head unit 1000 described above to the target. The laser head 2000 includes a light source that generates laser light. The laser head 2000 includes a pressure unit 2100 and a second transfer unit 2200.
도 6 및 도 7에 도시된 것과 같이, 가압 유닛(2100)은 레이저 헤드(2000)의 하측에 배치된다. 가압 유닛(2100)은 투과부(2140)와 가압 부재(2110)와 지지 부재(2120)와 틸트 부재(2130)를 포함한다. 투과부(2140)는 레이저 헤드(2000)의 광원에서 생성되는 레이저 광을 투과시킨다. 투과부(2140)는 쿼츠(Quartz)로 제작되어 투과도가 높다. 도 6을 참조하면, 투과부(2140)는 가압 부재(2110)에 결합된다. 가압 부재(2110)는 타겟에 프리 본딩된 반도체 칩의 상측에 위치하도록 배치된다. 지지 부재(2120)는 가압 부재(2110)의 상측에 배치된다. 6 and 7, the pressing unit 2100 is disposed under the laser head 2000. The pressing unit 2100 includes a transmission portion 2140, a pressing member 2110, a supporting member 2120, and a tilt member 2130. The transmitting portion 2140 transmits laser light generated from the light source of the laser head 2000. The transmissive portion 2140 is made of quartz and has high transmittance. Referring to FIG. 6, the transmission part 2140 is coupled to the pressing member 2110. The pressing member 2110 is disposed to be positioned above the semiconductor chip pre-bonded to the target. The support member 2120 is disposed above the pressing member 2110.
도 6 및 도 7을 참조하면, 틸트 부재(2130)는 지지 부재(2120)와 가압 부재(2110) 사이에 설치되어 가압 부재(2110)와 지지 부재(2120)를 연결한다. 틸트 부재(2130)는 지지 부재(2120)에 대한 가압 부재(2110)의 각도를 조절한다. 틸트 부재(2130)는 다시 3개의 틸트 로드(2131)와 3개의 포스 센서(2132; force sensor)를 포함한다. 틸트 로드(2131)는 지지 부재(2120)와 가압 부재(2110)를 3지점에서 연결시킨다. 즉, 지지 부재(2120)와 가압 부재(2110)는 3개의 틸트 로드(2131)에 의해 서로 연결된다. 본 실시예의 경우, 틸트 로드(2131)는 압전 액츄에이터로 구성된다. 압전 엑츄에이터는 인가 전압에 의해 길이가 변하는 압전 소자로 구성된다. 압전 액츄에이터로 구성된 틸트 로드(2131)는 인가된 전압에 의해 길이가 가변된다. 제어부(700)의 인가 전압에 따라 3개의 틸트 로드(2131)의 길이가 변함으로써 가압 부재(2110)의 경사 각도가 조절된다. 6 and 7, the tilt member 2130 is installed between the support member 2120 and the pressure member 2110 to connect the pressure member 2110 and the support member 2120. The tilt member 2130 adjusts the angle of the pressing member 2110 with respect to the support member 2120. The tilt member 2130 again includes three tilt rods 2131 and three force sensors 2132. The tilt rod 2131 connects the support member 2120 and the pressing member 2110 at three points. That is, the support member 2120 and the pressing member 2110 are connected to each other by three tilt rods 2131. In this embodiment, the tilt rod 2131 is composed of a piezoelectric actuator. The piezoelectric actuator is composed of a piezoelectric element whose length is changed by an applied voltage. The length of the tilt rod 2131 composed of a piezoelectric actuator is varied by the applied voltage. The inclination angle of the pressing member 2110 is adjusted by changing the lengths of the three tilt rods 2131 according to the applied voltage of the control unit 700.
포스 센서(2132)는 가압 부재(2110)에 설치되어 가압 부재(2110)에 가해지는 힘을 측정한다. 본 실시예의 경우, 포스 센서(2132)는 압전 소자로 구성된다. 압전 소자는 압전 소자에 가해지는 외력의 변화에 따라 전압을 발생시킨다. 포스 센서(2132)는 가압 부재(2110)에 가해지는 힘의 변화를 통해 전압을 발생시켜 그 힘의 변화량을 감지하고 그 결과를 제어부(700)로 전달한다. The force sensor 2132 is installed on the pressing member 2110 and measures the force applied to the pressing member 2110. In the case of this embodiment, the force sensor 2132 is composed of a piezoelectric element. The piezoelectric element generates a voltage according to a change in external force applied to the piezoelectric element. The force sensor 2132 generates a voltage through a change in the force applied to the pressing member 2110, detects the amount of change in the force, and transmits the result to the control unit 700.
제2이송유닛(2200)은 가압 유닛(2100)을 상하 방향으로 이송한다. 제2이송유닛(2200)이 가압 유닛(2100)을 하강시키면, 가압 유닛(2100)의 투과부(2140)가 타겟에 프리 본딩된 반도체 칩을 가압할 수 있다.The second transfer unit 2200 transfers the pressing unit 2100 in the vertical direction. When the second transfer unit 2200 descends the pressing unit 2100, the transmission unit 2140 of the pressing unit 2100 can press the semiconductor chip pre-bonded to the target.
다음으로, 타겟 이송 유닛(3000)과 제어부(700)에 대해 설명한다.Next, the target transfer unit 3000 and the control unit 700 will be described.
타겟 이송 유닛(3000)은 상술한 헤드 유닛(1000)에 의해 반도체 칩이 프리 본딩된 타겟을 수평 방향으로 이송한다. 타겟 이송 유닛(3000)은 헤드 유닛(1000)에서 프리 본딩 공정이 완료된 타겟을 수평방향으로 이송하여 타겟을 레이저 헤드(2000)의 작업 공간으로 이송시킨다. The target transfer unit 3000 transfers the target to which the semiconductor chip is pre-bonded by the head unit 1000 described above in the horizontal direction. The target transfer unit 3000 transfers the target in which the pre-bonding process is completed in the head unit 1000 in the horizontal direction to transfer the target to the working space of the laser head 2000.
제어부(700)는 헤드 유닛과 제2이송유닛(2200)과 타겟 이송 유닛(3000)과 레이저 헤드(2000)의 작동을 모두 제어한다. 제어부(700)의 제어에 대한 자세한 설명은 본 실시예에 따른 반도체 칩 레이저 본딩 장치의 작동에 대한 설명에서 하도록 한다. The control unit 700 controls both the operation of the head unit, the second transfer unit 2200, the target transfer unit 3000, and the laser head 2000. The detailed description of the control of the control unit 700 will be made in the description of the operation of the semiconductor chip laser bonding apparatus according to the present embodiment.
이하 상술한 바와 같이 구성된 헤드 유닛(1000)의 작동에 대해 설명한다. Hereinafter, the operation of the head unit 1000 configured as described above will be described.
먼저, 헤드 유닛(1000)의 작동을 통해 타겟에 반도체 칩을 프리 본딩하는 작동에 대해 설명한다.First, an operation of prebonding the semiconductor chip to the target through the operation of the head unit 1000 will be described.
타겟에 반도체 칩을 프리 본딩하기 위해, 반도체 칩이 프리 본딩되는 타겟에는 점착 물질이 미리 부착되어 있다. 반도체 칩 프리 본딩을 위해 다양한 점착 물질을 사용할 수 있으나, 본 실시예의 경우 비전도성 필름(NCF; Non Conductive Film)을 사용한다. 비전도성 필름은 점착성을 갖는 절연 필름이다. 본 실시예의 경우 기판 위에 비전도성 필름이 부착되거나 기판 위에 본딩된 반도체 칩 위에 비전도성 필름이 부착된 상태의 타겟을 공급 받아 반도체 칩을 본딩한다. 반도체 칩을 타겟의 비전도성 필름에 가압하면, 비전도성 필름의 점착성에 의해 반도체 칩이 타겟에 프리 본딩될 수 있다. In order to prebond the semiconductor chip to the target, an adhesive material is previously attached to the target to which the semiconductor chip is prebonded. Various adhesive materials can be used for semiconductor chip pre-bonding, but in the present embodiment, a non-conductive film (NCF) is used. The non-conductive film is an insulating film having tackiness. In the present embodiment, a semiconductor chip is bonded by receiving a target having a non-conductive film attached to the substrate or a non-conductive film attached to the semiconductor chip bonded onto the substrate. When the semiconductor chip is pressed against the non-conductive film of the target, the semiconductor chip may be pre-bonded to the target by the adhesiveness of the non-conductive film.
제어부(700)는 공압 레귤레이터(600)를 작동시켜 신축 부재(200)의 공압 챔버(210) 내에 일정한 공기 압력이 유지되도록 한다. 공압 챔버(210) 내부의 압력이 증가하면 신축 부재(200)는 도 4에 도시한 것과 같이 스토퍼(121)에 접촉하는 길이까지 늘어난다. The control unit 700 operates the pneumatic regulator 600 to maintain a constant air pressure in the pneumatic chamber 210 of the expansion and contraction member 200. When the pressure inside the pneumatic chamber 210 increases, the expansion and contraction member 200 increases to a length in contact with the stopper 121 as shown in FIG. 4.
이와 같은 상태에서 제어부(700)는 헤드 유닛(1000)이 반도체 칩을 픽업하도록 헤드 유닛(1000)과 제1이송유닛(520)을 작동시킨다. 앞에서 설명한 바와 같이 제1이송유닛(520)이 반도체 칩을 픽업하고자 하는 위치로 본 실시예의 헤드 유닛(1000)를 수평 이송하면, 제어부(700)는 제1이송유닛(520)을 작동시킨다. 제1이송유닛(520)이 하우징(100)을 하강시켜 클램핑 부재(300)를 반도체 칩에 접촉시키면, 클램핑 부재(300)는 반도체 칩을 흡착하여 클램핑한다. 이와 같은 상태에서 제1이송유닛(520)이 하우징(100)을 상승시키면, 클램핑 부재(300)는 반도체 칩을 칩 운반체로부터 분리하여 들어올리게 된다.In this state, the control unit 700 operates the head unit 1000 and the first transfer unit 520 so that the head unit 1000 picks up the semiconductor chip. As described above, when the first transfer unit 520 horizontally transfers the head unit 1000 of the present embodiment to a location where the semiconductor chip is to be picked up, the control unit 700 operates the first transfer unit 520. When the first transfer unit 520 lowers the housing 100 to contact the clamping member 300 with the semiconductor chip, the clamping member 300 adsorbs and clamps the semiconductor chip. In this state, when the first transfer unit 520 raises the housing 100, the clamping member 300 separates and lifts the semiconductor chip from the chip carrier.
제어부(700)의 명령에 따라 제1이송유닛(520)은 본 실시예의 헤드 유닛(1000)을 타겟 위로 이송한다. 이와 같은 상태에서 제어부(700)는 회전 부재(510)를 작동시켜 신축 부재(200)를 회전시킴으로써 클램핑 부재(300)에 클램핑된 반도체 칩의 방향을 조절한다. 이를 위해 미리 카메라를 이용하여 반도체 칩과 타겟을 촬영한다. 카메라에 의해 촬영된 영상을 바탕으로 제어부(700)는 타겟과 반도체 칩 사이의 위치와 방향을 정렬한다.According to the command of the control unit 700, the first transfer unit 520 transfers the head unit 1000 of the present embodiment onto the target. In this state, the control unit 700 controls the direction of the semiconductor chip clamped to the clamping member 300 by rotating the elastic member 200 by operating the rotating member 510. To this end, a semiconductor chip and a target are photographed using a camera in advance. Based on the image taken by the camera, the controller 700 aligns the position and direction between the target and the semiconductor chip.
다음으로 제어부(700)는 제1이송유닛(520)을 작동시켜서 클램핑 부재(300)를 하강시킨다. 클램핑 부재(300)가 하강하여 반도체 칩이 타겟에 접촉하면 신축 부재(200)가 수축하기 시작한다. 공압 레귤레이터(600)에 의해 공압 챔버(210)에 일정한 압력이 유지되고 있는 상태에서 신축 부재(200)의 수축 변위에 의해 반도체 칩을 가압하는 힘이 결정된다. 통상적으로 타겟에 대해 반도체 칩을 가압하는 압력은 미리 공정 사양으로 정해져 있다. 제어부(700)는 신축 부재(200)의 수축 변위값(즉, 제1이송유닛(520)에 의해 하우징(100)을 하강시키는 변위)을 조절하는 방법으로 타겟에 대한 반도체 칩의 가압력을 조절한다. 제어부(700)는 변위 센서(400)를 이용하여 신축 부재(200)가 수축한 정도를 실시간으로 피드백 받는다. 제어부(700)는 변위 센서(400)의 측정값을 실시간으로 감지하면서, 정해진 변위까지 제1이송유닛(520)을 통해 하우징(100)을 하강시킨다.Next, the control unit 700 operates the first transfer unit 520 to lower the clamping member 300. When the clamping member 300 descends and the semiconductor chip contacts the target, the stretching member 200 begins to contract. The force pressing the semiconductor chip by the contraction displacement of the expansion and contraction member 200 is determined in a state in which a constant pressure is maintained in the pneumatic chamber 210 by the pneumatic regulator 600. Typically, the pressure for pressing the semiconductor chip against the target is determined in advance as a process specification. The control unit 700 adjusts the pressing force of the semiconductor chip against the target by adjusting the contraction displacement value of the elastic member 200 (that is, the displacement that lowers the housing 100 by the first transfer unit 520). . The control unit 700 receives the degree of contraction of the elastic member 200 in real time using the displacement sensor 400. The controller 700 lowers the housing 100 through the first transfer unit 520 to a predetermined displacement while sensing the measured value of the displacement sensor 400 in real time.
상술한 바와 같이 반도체 칩 또는 타겟에는 접착 물질인 비전도성 필름이 올라가 있으므로, 반도체 칩을 타겟에 가압하면 반도체 칩은 타겟에 프리 본딩된다.Since the non-conductive film as an adhesive material is mounted on the semiconductor chip or target as described above, when the semiconductor chip is pressed against the target, the semiconductor chip is prebonded to the target.
제어부(700)는 클램핑 부재(300)의 진공을 해제하여 반도체 칩을 타겟 위에 놓고, 제1이송유닛(520)을 통해 하우징(100)을 상승시킨다. 제1이송유닛(520)의 작동에 의해 클램핑 부재(300)가 상승하면, 반도체 칩 프리 본딩 공정이 완료된다.The control unit 700 releases the vacuum of the clamping member 300 to place the semiconductor chip on the target, and raises the housing 100 through the first transfer unit 520. When the clamping member 300 is raised by the operation of the first transfer unit 520, the semiconductor chip pre-bonding process is completed.
상술한 바와 같이 본 실시예의 헤드 유닛(1000)은 신축 부재(200)의 길이의 변화를 실시간으로 감지하면서 제1이송유닛(520)의 작동을 조절하므로, 타겟에 대한 반도체 칩의 가압력을 정확하고 정교하게 조절할 수 있는 장점이 있다. As described above, the head unit 1000 of the present embodiment adjusts the operation of the first transfer unit 520 while real-time detecting the change in the length of the expansion and contraction member 200, so that the pressing force of the semiconductor chip against the target is accurate and It has the advantage of being elaborately adjustable.
특히, 매우 얇은 반도체 칩을 타겟에 프리 본딩하는 경우, 클램핑 부재(300)의 가압력에 의해 반도체 칩이 파손되는 불량을 효과적으로 방지할 수 있는 장점이 있다. In particular, when pre-bonding a very thin semiconductor chip to a target, there is an advantage of effectively preventing a defect in which the semiconductor chip is broken by the pressing force of the clamping member 300.
반도체 칩의 두께가 얇아질수록 반도체 칩을 가압하는 가압력은 미소하중으로 결정되는데, 본 실시예의 헤드 유닛(1000)은 이와 같은 미소하중에 대해서는 정확하고 정교하게 가압력을 조절하는 것이 가능하다. As the thickness of the semiconductor chip becomes thinner, the pressing force for pressing the semiconductor chip is determined as a microload. The head unit 1000 of this embodiment can accurately and precisely adjust the pressing force for such a microload.
공압 레귤레이터(600)에 의해 발생하는 압력과 신축 부재(200)의 탄성 계수는 온도와 주위 환경 조건에 따라 달라질 수 있는데, 이와 같은 경우에도 가압력에 영향을 주는 변수를 고려한 후에 그와 같은 영향 인자의 변화를 제1이송유닛(520)의 하강 변위(즉, 신축 부재(200)의 수축 변위)의 변화로 보상하거나 보정할 수 있으므로, 프리 본딩 공정의 품질을 크게 향상시키는 것이 가능하다.The pressure generated by the pneumatic regulator 600 and the elastic modulus of the expansion and contraction member 200 may vary depending on the temperature and ambient environmental conditions. In this case, after considering the variables affecting the pressing force, Since the change can be compensated or corrected by a change in the descending displacement of the first transfer unit 520 (ie, the contraction displacement of the elastic member 200), it is possible to greatly improve the quality of the pre-bonding process.
상술한 바와 같이, 헤드 유닛(1000)이 반도체 칩을 타겟에 프리 본딩시키면, 제어부(700)는 타겟 이송 유닛(3000)을 작동시킨다. 타겟 이송 유닛(3000)은 반도체 칩이 프리 본딩된 타겟을 수평방향으로 이송시켜 타겟이 레이저 헤드(2000)의 작업 영역으로 운송되도록 한다. As described above, when the head unit 1000 pre-bonds the semiconductor chip to the target, the control unit 700 operates the target transfer unit 3000. The target transfer unit 3000 transfers the pre-bonded target in a horizontal direction to the semiconductor chip so that the target is transported to the working area of the laser head 2000.
이와 같이, 타겟이 레이저 헤드(2000)의 작업 영역으로 운송되면, 도 7에 도시된 것과 같은 상태가 된다. 도 7에 도시된 바와 같이, 반도체 칩은 비전도성 필름에 의해 타겟 상에 점착된 상태이다. 제어부(700)는 제2이송유닛(2200)을 작동시킨다. 본 실시예에 따른 반도체 칩 레이저 본딩 장치의 경우, 비전도성 필름이 올려진 타겟에 프리 본딩된 반도체 칩을 본딩한다. 반도체 칩의 본딩을 위해서는 반도체 칩의 솔더 범프와 같은 접속부가 비전도성 필름을 통과하여 타겟의 접속부와 접촉되어야 한다. 이 때문에 반도체 칩을 타겟에 대하여 비교적 큰 힘으로 가압할 필요가 있다. 제2이송유닛(2200)의 작동에 의해 레이저 헤드(2000)의 가압 유닛(2100)이 타겟을 향하여 하강한다. 가압 유닛(2100)의 하강에 의해, 가압 부재(2110)에 결합된 투과부(2140)와 타겟에 프리 본딩된 반도체 칩이 접촉되기 시작한다. As described above, when the target is transported to the working area of the laser head 2000, the state is as shown in FIG. 7. As shown in Fig. 7, the semiconductor chip is adhered to the target by a non-conductive film. The control unit 700 operates the second transfer unit 2200. In the case of the semiconductor chip laser bonding apparatus according to the present embodiment, the pre-bonded semiconductor chip is bonded to the target on which the non-conductive film is placed. In order to bond the semiconductor chip, a connection portion such as a solder bump of the semiconductor chip must pass through the non-conductive film to contact the connection portion of the target. For this reason, it is necessary to press the semiconductor chip with a relatively large force against the target. By the operation of the second transfer unit 2200, the pressing unit 2100 of the laser head 2000 descends toward the target. By the descending of the pressing unit 2100, the transmissive portion 2140 coupled to the pressing member 2110 and the semiconductor chip pre-bonded to the target begin to contact.
경우에 따라서는, 반도체 칩과 타겟이 서로 나란하지 않은 상태로 프리 본딩되어 있을 수 있다. 이와 같은 상태에서 가압 부재(2110)이 반도체 칩을 가압하게 되면 접속 불량 문제가 발생할 수 있다. 이러한 접속 불량은 상대적으로 약한 힘으로 가압된 부분에서 반도체 칩의 접속부가 타겟의 접속부와 접촉되지 않아 발생하는 문제이다. 경우에 따라서는 반도체 칩과 타겟의 정렬 불량(misalign) 문제도 발생할 수 있다. 본 실시예에 따른 반도체 칩 레이저 본딩 장치는 반도체 칩의 가압 과정에서 틸트 부재(2130)는 반도체 칩과 타겟이 서로 평행을 유지하도록 가압 부재(2110)의 각도를 조절한다. 또한, 틸트 부재(2130)는 가압 부재(2110)가 반도체 칩에 가하는 힘이 일정하게 되도록 한다.In some cases, the semiconductor chip and the target may be pre-bonded in a state that is not aligned with each other. In this state, when the pressing member 2110 presses the semiconductor chip, a connection failure problem may occur. This connection failure is a problem that occurs when the connection portion of the semiconductor chip does not contact the connection portion of the target in the portion pressed with a relatively weak force. In some cases, misalignment of the semiconductor chip and the target may also occur. In the semiconductor chip laser bonding apparatus according to the present embodiment, in the pressing process of the semiconductor chip, the tilt member 2130 adjusts the angle of the pressing member 2110 so that the semiconductor chip and the target are parallel to each other. Further, the tilt member 2130 allows the force applied by the pressing member 2110 to the semiconductor chip to be constant.
상술한 바와 같이, 본 실시예에 따른 반도체 칩 레이저 본딩 장치는 지지 부재(2120)와 가압 부재(2110) 사이에 설치된 틸트 부재(2130)를 구비한다. 가압 부재(2110)에 결합된 투과부(2140)가 반도체 칩과 접촉을 시작하면, 틸트 부재(2130)의 포스 센서(2132)가 반도체 칩과 가압 부재(2110)의 접촉력 변화를 측정한다. 상술한 바와 같이, 포스 센서(2132)는 3개로 구성되어 3개의 포스 센서(2132)가 접촉력 변화를 측정한다. 제어부(700)는 포스 센서(2132)가 측정한 접촉력을 바탕으로 틸트 부재(2130)의 틸트 로드(2131)에 전압을 인가한다. 즉, 제어부(700)는 포스 센서(2132)들이 측정한 접촉력이 서로 같아지도록 틸트 로드(2131)에 전압을 인가한다.As described above, the semiconductor chip laser bonding apparatus according to the present embodiment includes a tilt member 2130 installed between the support member 2120 and the pressing member 2110. When the transmission part 2140 coupled to the pressing member 2110 starts to contact the semiconductor chip, the force sensor 2132 of the tilt member 2130 measures the change in contact force between the semiconductor chip and the pressing member 2110. As described above, the force sensor 2132 is composed of three, and the three force sensors 2132 measure a change in contact force. The control unit 700 applies a voltage to the tilt rod 2131 of the tilt member 2130 based on the contact force measured by the force sensor 2132. That is, the control unit 700 applies a voltage to the tilt rod 2131 so that the contact forces measured by the force sensors 2132 are equal to each other.
예를 들어, 3개의 포스 센서(2132) 중 하나의 포스 센서(2132)가 측정한 접촉력이 나머지 두 개의 접촉력보다 크다면 현재 반도체 칩과 타겟이 서로 기울어진 상태이거나, 가압 부재(2110)가 불균형한 힘으로 반도체 칩을 가압하고 있음을 의미한다. 제어부(700)는 접촉력의 크기가 작은 두 개의 포스 센서(2132)가 위치한 부분에 배치된 틸트 로드(2131)에 전압을 인가한다. 전압이 인가된 틸트 로드(2131)는 길이가 증가한다. 길이가 증가된 틸트 로드(2131)에 의해 지지 부재(2120)에 대한 가압 부재(2110)의 각도가 변경된다. 또한, 길이가 증가된 틸트 로드(2131)가 설치된 부분에서 가압 부재(2110)는 이전 보다 강한 힘으로 반도체 칩을 가압한다. 이로 인해, 가압 부재(2110)는 반도체 칩이 타겟과 평행인 상태로 가압되도록 기울어진 상태에서 반도체 칩을 가압할 수 있다. 또한, 가압 부재(2110)가 반도체 칩에 가하는 힘이 모든 부위에서 일정하게 된다. 이와 같은 방법으로, 제어부(700)는 포스 센서(2132)가 측정하는 값이 모두 같아지도록 틸트 로드(2131)에 전압을 인가한다. 이로 인해, 투과부(2140)는 반도체 칩과 평행인 상태로 유지되며 가압 부재(2110)는 균일한 힘으로 반도체 칩을 타겟에 대해 가압시킬 수 있다. 이로 인해, 상술한 반도체 칩과 타겟의 접속 불량 문제를 완전히 해결할 수 있다.For example, if the contact force measured by one of the three force sensors 2132 is greater than the other two contact forces, the semiconductor chip and the target are inclined with each other, or the pressing member 2110 is unbalanced. It means that the semiconductor chip is being pressed with one force. The control unit 700 applies a voltage to the tilt rod 2131 disposed at a portion where two force sensors 2132 having a small contact force are located. The voltage-applied tilt rod 2131 increases in length. The angle of the pressing member 2110 relative to the supporting member 2120 is changed by the tilt rod 2131 whose length is increased. In addition, the pressing member 2110 presses the semiconductor chip with a stronger force than before in the portion where the tilt rod 2131 having an increased length is installed. Due to this, the pressing member 2110 can press the semiconductor chip in a tilted state so that the semiconductor chip is pressed in a state parallel to the target. In addition, the force exerted by the pressing member 2110 on the semiconductor chip becomes constant at all portions. In this way, the control unit 700 applies a voltage to the tilt rod 2131 so that the values measured by the force sensor 2132 are all the same. Due to this, the transmissive portion 2140 is maintained in parallel with the semiconductor chip, and the pressing member 2110 can press the semiconductor chip against the target with a uniform force. For this reason, it is possible to completely solve the above-described connection problem between the semiconductor chip and the target.
한편, 포스 센서(2132)는 압전 소자로 구성된다. 압전 소자는 접촉력 변화를 감지할 수 있는 일반적인 로드셀에 비해 반응속도가 매우 빠르므로 가압 부재(2110)의 기울어진 상태를 빠르게 감지할 수 있다. 또한, 포스 센서(2132)의 측정값을 통해 제어부(700)의 인가 전압에 따라 가압 부재(2110)의 기울어짐을 보정하는 틸트 로드(2131)는 압전 액츄에이터로 구성된다. 압전 액츄에이터는 응답속도가 매우 빠르고 강한 힘을 발생시킨다. 앞서 설명한 바와 같이, 비전도성 필름을 이용하여 반도체 칩과 타겟을 본딩하려면 반도체 칩을 타겟에 대하여 비교적 강한 힘으로 가압할 필요가 있다. 압전 액츄에이터는 강한 힘을 발생시키기 때문에 비전도성 필름과 같은 접착 물질을 사용하여 반도체 칩을 본딩하는데 사용하기 적절하다. 따라서, 틸트 로드(2131)는 매우 빠르고 정확하게 가압 부재(2110)의 각도를 보정하여 정렬 불량 문제를 해소시킬 수 있다. 즉, 본 실시예에 따른 반도체 칩 레이저 본딩 장치는 압전 소자 및 압전 액츄에이터를 사용하여 가압 부재(2110)의 기울어짐을 빠르게 측정하고, 이를 빠르게 보정함으로써 정렬 불량 문제를 원천 차단하는 효과가 있다. Meanwhile, the force sensor 2132 is composed of a piezoelectric element. The piezoelectric element has a very fast reaction speed compared to a general load cell capable of detecting a change in contact force, and thus it is possible to quickly detect the inclined state of the pressing member 2110. In addition, the tilt rod 2131 for correcting the inclination of the pressing member 2110 according to the applied voltage of the control unit 700 through the measured value of the force sensor 2132 is composed of a piezoelectric actuator. The piezoelectric actuator has a very fast response speed and generates a strong force. As described above, in order to bond the semiconductor chip and the target using a non-conductive film, it is necessary to press the semiconductor chip with a relatively strong force against the target. Since piezoelectric actuators generate strong forces, they are suitable for bonding semiconductor chips using adhesive materials such as non-conductive films. Thus, the tilt rod 2131 can solve the misalignment problem by correcting the angle of the pressing member 2110 very quickly and accurately. That is, the semiconductor chip laser bonding apparatus according to the present embodiment has the effect of quickly measuring the inclination of the pressing member 2110 using a piezoelectric element and a piezoelectric actuator, and quickly correcting it, thereby blocking the problem of misalignment.
틸트 부재(2130)의 가압 부재(2110) 정렬은 반도체 칩을 가압할 때마다 개별적으로 수행될 수도 있고 최초 반도체 칩의 가압 과정에서 정렬된 가압 부재(2110)를 고정시킨 채 나머지 반도체 칩 가압이 이루어질 수도 있다. 타겟에 프리 본딩된 반도체 칩들과 가압 부재(2110)가 이루는 각도는 일반적으로 동일하다. 일단 가압 부재(2110)와 반도체 칩이 평행으로 정렬되면 나머지 반도체 칩과 가압 부재(2110)도 팽행을 이루게 된다. 이 경우 틸트 부재(2130)의 정렬이 개별적으로 수행될 필요가 없으므로 공정 시간을 조금 더 단축할 수 있다.Alignment of the pressing member 2110 of the tilt member 2130 may be performed each time the semiconductor chip is pressed, or the rest of the semiconductor chip pressing may be performed while fixing the pressing member 2110 aligned during the pressing process of the first semiconductor chip. It might be. The angle formed between the semiconductor chips pre-bonded to the target and the pressing member 2110 is generally the same. Once the pressing member 2110 and the semiconductor chip are aligned in parallel, the rest of the semiconductor chip and the pressing member 2110 are also in parallel. In this case, since the alignment of the tilt member 2130 does not need to be performed individually, the process time can be slightly shortened.
이와 같이, 가압 부재(2110)에 결합된 투과부(2140)가 반도체 칩을 가압한 상태에서 레이저 헤드(2000)의 광원이 레이저 광을 조사한다. 투과부(2140)를 투과한 레이저 광은 반도체 칩에 전달되어 접속부의 온도를 순간적으로 빠르게 증가시킨다. 이로 인해, 반도체 칩의 접속부가 순간적으로 융해되며 반도체 칩과 타겟이 본딩된다. 이를 레이저 본딩이라 한다. 일반적으로 널리 사용되는 열 가압 본딩(TC Bonding; Thermo Compression Bonding)공정과 다르게 레이저 본딩은 히팅 블록 없이 반도체 칩의 온도를 빠르게 상승시켜 반도체 칩의 열 팽창으로 인한 반도체 칩과 타겟의 정렬 불량 문제를 현저히 줄일 수 있다. 또한, 레이저 본딩은 열 가압 본딩 공정과 다르게 히팅 블록의 온도를 낮추는 과정을 생략할 수 있기 때문에 더욱 빠른 본딩 수행이 가능하다. 즉, 본 실시예에 따른 반도체 칩 레이저 본딩 장치는 레이저 본딩을 통해 반도체 칩과 타겟의 정렬 불량 문제를 해소하고 공정 시간을 단축하는 효과를 갖는다. 레이저 본딩이 수행되는 과정에서 상술한 바와 같이 비전도성 필름도 경화된다. 경화된 비전도성 필름은 반도체 칩과 타겟 사이의 빈 공간을 채워 반도체 패키징의 물리적, 화학적 안정성을 증가시킨다. In this way, the light source of the laser head 2000 irradiates laser light while the transmissive portion 2140 coupled to the pressing member 2110 presses the semiconductor chip. The laser light transmitted through the transmissive portion 2140 is transmitted to the semiconductor chip to rapidly and rapidly increase the temperature of the connecting portion. Due to this, the connection portion of the semiconductor chip is instantaneously melted and the semiconductor chip and the target are bonded. This is called laser bonding. Unlike the commonly used thermo-bonding (TC Bonding) process, laser bonding rapidly raises the temperature of a semiconductor chip without a heating block, which significantly reduces the problem of semiconductor chip and target misalignment due to thermal expansion of the semiconductor chip. Can be reduced. In addition, laser bonding can perform a faster bonding because the process of lowering the temperature of the heating block can be omitted, unlike the heat press bonding process. That is, the semiconductor chip laser bonding apparatus according to the present embodiment has an effect of solving the problem of misalignment of the semiconductor chip and the target through laser bonding and shortening the process time. In the process of laser bonding, the non-conductive film is also cured as described above. The cured non-conductive film fills the empty space between the semiconductor chip and the target, thereby increasing the physical and chemical stability of the semiconductor packaging.
한편, 투과부(2140)의 크기를 조절하여 복수의 반도체 칩을 한꺼번에 가압시켜 레이저 본딩을 수행하는 것도 가능하다. 크기가 큰 투과부(2140)가 복수의 반도체 칩을 한꺼번에 가압하고 이 상태에서 레이저 본딩이 수행되면 복수의 반도체 칩이 한꺼번에 타겟에 본딩된다. 이로써 반도체 칩과 타겟을 본딩하는 공정 시간을 단축시킬 수 있다. On the other hand, it is also possible to perform laser bonding by controlling the size of the transmissive portion 2140 to press a plurality of semiconductor chips at once. When the large-sized transmission unit 2140 presses the plurality of semiconductor chips at once and laser bonding is performed in this state, the plurality of semiconductor chips are bonded to the target at once. This can shorten the process time for bonding the semiconductor chip and the target.
레이저 본딩으로 반도체 칩이 타겟에 완전히 본딩되면, 제어부(700)는 다시 제2이송유닛(2200)을 작동시킨다. 제2이송유닛(2200)은 가압 유닛(2100)을 상승시킨다. 다음으로, 제어부(700)는 타겟 이송 유닛(3000)을 작동시켜 타겟 이송 유닛(3000)이 반도체 칩이 본딩된 타겟을 다음 공정으로 이송하도록 한다. When the semiconductor chip is completely bonded to the target by laser bonding, the control unit 700 operates the second transfer unit 2200 again. The second transfer unit 2200 raises the pressure unit 2100. Next, the control unit 700 operates the target transfer unit 3000 so that the target transfer unit 3000 transfers the semiconductor chip-bonded target to the next process.
이상 본 발명에 대해 바람직한 예를 들어 설명하였으나 본 발명의 범위가 앞에서 설명하고 도시한 형태로 한정되는 것은 아니다. The preferred embodiment of the present invention has been described above, but the scope of the present invention is not limited to the above-described and illustrated forms.
예를 들어, 앞에서는 신축 부재(200)를 구비한 헤드 유닛(1000)을 예로 들어 설명하였으나, 반도체 칩을 타겟에 프리 본딩시킬 수 있는 다양한 헤드 유닛이 사용될 수 있다. 즉, 단순히 반도체 칩을 집어 타겟으로 운송하여 타겟에 프리 본딩시키는 간단한 구조의 헤드 유닛으로 반도체 칩 레이저 본딩 장치를 구성할 수 있다.For example, the head unit 1000 provided with the elastic member 200 has been described as an example, but various head units capable of prebonding a semiconductor chip to a target may be used. That is, the semiconductor chip laser bonding apparatus may be configured as a head unit having a simple structure that simply picks up a semiconductor chip and transports it to a target to pre-bond the target.
또한, 앞에서 회전 부재(510)를 구비하는 헤드 유닛(1000)를 예로 들어 설명하였으나 경우에 따라서는 회전 부재(510)를 구비하지 않는 반도체 칩 레이저 본딩 장치를 구성하는 것도 가능하다.In addition, the head unit 1000 having the rotating member 510 has been described as an example, but in some cases, a semiconductor chip laser bonding device without the rotating member 510 may be configured.
또한, 앞에서 신축 부재(200)는 메탈 벨로즈로 구성된다고 설명하였나, 메탈 벨로즈 이외에 다른 구성을 가진 신축 부재를 구성하는 것도 가능하다. 공압 챔버의 압력에 의해 길이가 신축되는 다른 다양한 구성이 신축 부재로서 사용될 수 있다. 예컨대, 스플라인 축과 보스가 서로 결합되어 사이에 공압 챔버를 구성하는 구조를 이용하여 신축 부재를 구성하는 것도 가능하다. In addition, although the stretching member 200 was previously described as being composed of a metal bellows, it is also possible to configure a stretching member having a configuration other than the metal bellows. Various other configurations in which the length is stretched by the pressure of the pneumatic chamber can be used as the stretching member. For example, the spline shaft and the boss may be coupled to each other to construct a stretchable member using a structure constituting a pneumatic chamber between them.
또한, 클램핑 부재(300) 역시 진공 흡착 방법 이외에 다른 방법으로 반도체 칩을 클램핑할 수 있는 구조가 사용될 수 있다.In addition, the clamping member 300 may also be used in a structure capable of clamping the semiconductor chip by a method other than the vacuum adsorption method.
또한, 변위 센서(400)도 앞에서 설명한 엔코더 스케일(410) 및 리드 헤드(420)로 구성된 변위 센서(400) 이외에 레이저 센서 등 다른 다양한 구조의 변위 센서가 사용될 수 있다.In addition, the displacement sensor 400 may be used in addition to the displacement sensor 400 composed of the encoder scale 410 and the lead head 420 described above, a displacement sensor of various other structures, such as a laser sensor.
또한, 앞에서 틸트 부재(2130)는 3개의 틸트 로드(2131)와 3개의 포스 센서(2132)를 구비하는 것으로 설명하였으나, 틸트 로드와 포스 센서의 개수는 다양하게 변경될 수 있다.In addition, although the tilt member 2130 has been described as having three tilt rods 2131 and three force sensors 2132, the number of tilt rods and force sensors may be variously changed.
또한, 앞에서 틸트 로드(2131)는 압전 액츄에이터로 구성되고, 포스 센서(2132)는 압전 소자로 구성되는 것으로 설명하였으나, 틸트 로드는 길이 변형이 가능한 다양한 액츄에이터로 구성될 수 있고, 포스 센서 역시 접촉력을 계산할 수 있는 다양한 센서로 구성될 수 있다.In addition, although the tilt rod 2131 was previously described as being composed of a piezoelectric actuator, and the force sensor 2132 was composed of a piezoelectric element, the tilt rod may be composed of various actuators capable of length deformation, and the force sensor is also capable of contact force. It can be composed of various sensors that can be calculated.
또한, 앞에서 포스 센서(2132)는 가압 부재(2110)에 설치되는 것으로 설명하였으나, 포스 센서의 설치 위치는 다양하게 변경가능하다. 포스 센서는 가압 부재에 가해지는 힘을 측정할 수 있는 위치에 설치될 수 있다. 예를 들어, 포스 센서는 틸트 로드와 가압 부재 사이에 설치될 수 있다.In addition, although the force sensor 2132 was previously described as being installed on the pressing member 2110, the installation position of the force sensor can be variously changed. The force sensor may be installed at a position capable of measuring the force applied to the pressing member. For example, the force sensor can be installed between the tilt rod and the pressing member.
또한, 앞에서 설명한 레이저 헤드(2000)는 틸트 부재(2130)를 포함하는 것으로 설명하였으나, 틸트 부재(2130)가 생략된 레이저 헤드로 본 발명에 따른 반도체 칩 레이저 본딩 장치를 구성할 수도 있다.In addition, although the laser head 2000 described above includes the tilt member 2130, the laser chip with the tilt member 2130 omitted may constitute the semiconductor chip laser bonding apparatus according to the present invention.
본 발명의 반도체 칩 레이저 본딩 장치는 다이 본딩 장치에 사용될 수 있는 부품의 형태로 제작되어 생산, 유통 등 실시될 수도 있고, 본 발명의 반도체 칩 레이저 본딩 장치가 설치된 다이 본딩 장치의 형태로 실시될 수도 있다.The semiconductor chip laser bonding apparatus of the present invention may be manufactured in the form of parts that can be used in a die bonding apparatus, and may be produced, distributed, etc., or may be implemented in the form of a die bonding apparatus in which the semiconductor chip laser bonding apparatus of the present invention is installed. have.

Claims (15)

  1. 칩 운반체로부터 반도체 칩을 전달받아 타겟에 대해 프리 본딩할 수 있도록 클램핑하는 헤드 유닛;A head unit for receiving a semiconductor chip from the chip carrier and clamping to pre-bond the target;
    상기 헤드 유닛에 클램핑된 반도체 칩을 상기 타겟에 대해 정렬하고 가압할 수 있도록 상기 헤드 유닛을 수평 방향과 상하 방향으로 이송하는 제1이송유닛;A first transfer unit for transferring the head unit in the horizontal and vertical directions so that the semiconductor chip clamped to the head unit is aligned and pressed against the target;
    상기 헤드 유닛에 의해 반도체 칩이 프리 본딩된 타겟을 수평 방향으로 이송하는 타겟 이송 유닛;A target transfer unit for transferring the target pre-bonded by the semiconductor chip in the horizontal direction by the head unit;
    상기 타겟에 프리 본딩된 반도체 칩의 솔더 범프에 열을 가하여 상기 타겟과 반도체 칩을 서로 접착시킬 수 있도록 상기 반도체 칩에 레이저 광을 조사하는 레이저 헤드; 및A laser head that irradiates laser light to the semiconductor chip so as to adhere the target and the semiconductor chip to each other by applying heat to the solder bumps of the semiconductor chip prebonded to the target; And
    상기 헤드 유닛과 제1이송유닛과 타겟 이송 유닛과 레이저 헤드의 작동을 제어하는 제어부;를 포함하는 반도체 칩 레이저 본딩 장치.And a control unit for controlling the operation of the head unit, the first transfer unit, the target transfer unit, and the laser head.
  2. 제1항에 있어서,According to claim 1,
    상기 레이저 헤드에서 조사되는 레이저 광을 투과시킬 수 있는 투과부를 구비하고 상기 레이저 헤드의 하측에 배치되는 가압 유닛; 및A pressing unit having a transmission portion capable of transmitting laser light irradiated from the laser head and disposed under the laser head; And
    상기 가압 유닛의 투과부에 의하여 상기 타겟에 프리 본딩된 반도체 칩을 가압할 수 있도록 상기 가압 유닛을 상하 방향으로 이송하는 제2이송유닛;을 더 포함하고,Further comprising; a second transfer unit for transferring the pressing unit in the vertical direction so as to press the semiconductor chip pre-bonded to the target by the transmission unit of the pressing unit;
    상기 제어부는, 상기 가압 유닛과 제2이송유닛의 작동을 제어하는 반도체 칩 레이저 본딩 장치.The control unit, the semiconductor chip laser bonding apparatus for controlling the operation of the pressing unit and the second transfer unit.
  3. 제2항에 있어서,According to claim 2,
    상기 가압 유닛은, 상기 투과부가 결합되는 가압 부재와, 상기 가압 부재의 상측에 배치되는 지지 부재와, 상기 지지 부재와 가압 부재의 사이에 설치되어 상기 지지 부재에 대한 상기 가압 부재의 각도를 조절하는 틸트 부재를 더 포함하는 반도체 칩 레이저 본딩 장치.The pressing unit is provided between the pressing member to which the transmission portion is coupled, the supporting member disposed above the pressing member, and the supporting member and the pressing member to adjust the angle of the pressing member with respect to the supporting member A semiconductor chip laser bonding device further comprising a tilt member.
  4. 제3항에 있어서,According to claim 3,
    상기 가압 유닛의 틸트 부재는, 상기 가압 부재와 지지 부재를 서로 연결하도록 3지점에 설치되어 상기 제어부의 명령에 따라 길이가 늘어나거나 줄어들도록 구성된 3개의 틸트 로드를 구비하는 반도체 칩 레이저 본딩 장치.The tilt member of the pressing unit, the semiconductor chip laser bonding apparatus is provided at three points to connect the pressing member and the support member to each other and has three tilt rods configured to increase or decrease in length according to the command of the control unit.
  5. 제4항에 있어서,According to claim 4,
    상기 가압 유닛의 틸트 부재는, 상기 3개의 틸트 로드에 의해 상기 가압 부재에 가해지는 힘을 측정할 수 있도록 상기 3개의 틸트 로드와 가압 부재 중 어느 하나에 각각 설치되는 포스 센서(force sensor)를 더 포함하고,The tilt member of the pressing unit further includes a force sensor installed on any one of the three tilt rods and the pressing member to measure the force applied to the pressing member by the three tilt rods. Including,
    상기 제어부는, 상기 포스 센서의 측정값을 이용하여 상기 틸트 로드의 작동을 제어하는 반도체 칩 레이저 본딩 장치.The control unit, a semiconductor chip laser bonding apparatus for controlling the operation of the tilt rod using the measured value of the force sensor.
  6. 제5항에 있어서,The method of claim 5,
    상기 틸트 부재의 3개의 틸트 로드는 각각 인가 전압에 의해 길이가 변하는 압전 액츄에이터로 구성되고,Each of the three tilt rods of the tilt member is composed of a piezoelectric actuator whose length is changed by an applied voltage,
    상기 틸트 부재의 3개의 포스 센서는 외력의 변화에 따라 전압을 발생시키는 압전 소자로 구성되며,The three force sensors of the tilt member are composed of a piezoelectric element that generates a voltage according to a change in external force,
    상기 제어부는 상기 포스 센서들이 측정한 측정값 사이의 편차가 감소하도록 상기 틸트 부재의 작동을 제어하는 반도체 칩 레이저 본딩 장치.The controller is a semiconductor chip laser bonding apparatus for controlling the operation of the tilt member so that the deviation between the measured values measured by the force sensors is reduced.
  7. 제1항에 있어서,According to claim 1,
    상기 헤드 유닛은,The head unit,
    상하로 연장되도록 형성되는 제1수용공간과, 상기 제1수용공간의 하측에 배치되어 상하로 연장되도록 형성되는 제2수용공간을 구비하는 하우징과,A housing having a first accommodation space formed to extend vertically and a second accommodation space disposed below the first accommodation space and formed to extend vertically;
    공기가 채워지는 공압 챔버를 구비하고 상하 방향으로 탄성 변형이 가능한 재질로 형성되며, 상기 공압 챔버의 압력과 외력에 의해 상하 방향으로 방향 탄성 변형이 가능하도록 상기 하우징의 제1수용공간 내에 배치되는 신축 부재와,It is provided with a pneumatic chamber filled with air and is formed of a material that is elastically deformable in the vertical direction, and is arranged in a first accommodation space of the housing to be elastically deformable in the vertical direction by pressure and external force of the pneumatic chamber. Absence,
    상기 신축 부재와 결합되어 상기 신축 부재의 움직임에 따라 상하로 슬라이딩 가능하도록 상기 하우징의 제2수용공간 내에 설치되고, 상기 반도체 칩을 클램핑하는 클램핑 부재와,A clamping member coupled to the elastic member and installed in the second receiving space of the housing to slide up and down according to the movement of the elastic member, and clamping the semiconductor chip;
    상기 신축 부재에 연결되어 상기 신축 부재의 공압 챔버의 압력을 조절하는 공압 레귤레이터를 포함하고,And a pneumatic regulator connected to the elastic member to adjust the pressure of the pneumatic chamber of the elastic member,
    상기 제어부는, 상기 클램핑 부재와 상기 공압 레귤레이터와 상기 제1이송유닛의 작동을 제어하는 반도체 칩 레이저 본딩 장치.The control unit, the semiconductor chip laser bonding apparatus for controlling the operation of the clamping member and the pneumatic regulator and the first transfer unit.
  8. 제7항에 있어서,The method of claim 7,
    상기 헤드 유닛은, 상기 클램핑 부재에 클램핑된 반도체 칩의 방향을 조절하도록 상기 하우징에 설치되어 상기 클램핑 부재를 회전시키는 회전 부재를 더 포함하는 반도체 칩 레이저 본딩 장치.The head unit, the semiconductor chip laser bonding apparatus further comprises a rotating member that is installed in the housing to rotate the clamping member to adjust the direction of the semiconductor chip clamped to the clamping member.
  9. 제8항에 있어서,The method of claim 8,
    상기 헤드 유닛의 신축 부재는, 메탈 벨로즈 형태로 형성되고,The expansion and contraction member of the head unit is formed in a metal bellows shape,
    상기 헤드 유닛의 회전 부재는, 상기 신축 부재를 회전시킴으로써 상기 클램핑 부재의 각도를 조절하는 반도체 칩 레이저 본딩 장치.The rotating member of the head unit, the semiconductor chip laser bonding apparatus for adjusting the angle of the clamping member by rotating the stretching member.
  10. 제7항에 있어서,The method of claim 7,
    상기 헤드 유닛의 하우징은, 상기 신축 부재가 정해진 길이 이상 늘어나지 않도록 상기 제1수용공간에 형성되어 상기 신축 부재의 길이를 제한하는 스토퍼를 더 포함하는 반도체 칩 레이저 본딩 장치.The housing of the head unit, the semiconductor chip laser bonding apparatus further comprises a stopper that is formed in the first receiving space so that the stretching member does not extend over a predetermined length to limit the length of the stretching member.
  11. 제10항에 있어서,The method of claim 10,
    상기 헤드 유닛은, The head unit,
    상기 하우징에 대한 상기 클램핑 부재의 상하 방향 변위를 측정하도록 상기 하우징에 설치되는 변위 센서를 더 포함하고,And further comprising a displacement sensor installed in the housing to measure the vertical displacement of the clamping member relative to the housing,
    상기 제어부는, 상기 변위 센서의 측정값을 이용하여 상기 클램핑 부재와 상기 공압 레귤레이터와 상기 제1이송유닛의 작동을 제어하는 반도체 칩 레이저 본딩 장치.The control unit, the semiconductor chip laser bonding apparatus for controlling the operation of the clamping member, the pneumatic regulator and the first transfer unit using the measured value of the displacement sensor.
  12. 제11항에 있어서,The method of claim 11,
    상기 헤드 유닛의 상기 변위 센서는,The displacement sensor of the head unit,
    상기 신축 부재 하부에 결합되는 엔코더 스케일과, 상기 엔코더 스케일의 상하 변위 변화를 감지하는 리드 헤드를 포함하는 반도체 칩 레이저 본딩 장치.A semiconductor chip laser bonding apparatus comprising an encoder scale coupled to a lower portion of the elastic member and a lead head that detects a change in the vertical displacement of the encoder scale.
  13. 제12항에 있어서, The method of claim 12,
    상기 제어부는, 상기 헤드 유닛의 변위 센서에서 감지한 상기 클램핑 부재의 상기 하우징에 대한 변위를 이용하여 상기 제1이송유닛에 의해 상기 하우징을 승강시킬 상하 변위 범위를 결정하는 반도체 칩 레이저 본딩 장치.The control unit, the semiconductor chip laser bonding apparatus for determining the vertical displacement range to elevate the housing by the first transfer unit using the displacement of the clamping member detected by the displacement sensor of the head unit to the housing.
  14. 제12항에 있어서,The method of claim 12,
    상기 제어부는, 상기 신축 부재가 상기 하우징의 스토퍼에 접촉할 때의 상기 클램핑 부재의 변위를 기준 변위로 하여, 상기 신축 부재의 하단과 상기 하우징의 스토퍼 사이의 변위차만큼 상기 하우징을 더 하강시켜 반도체 칩을 상기 타겟에 대해 가압하도록 상기 제1이송유닛을 작동시키는 반도체 칩 레이저 본딩 장치.The control unit further lowers the housing by a displacement difference between a lower end of the elastic member and a stopper of the housing, using the displacement of the clamping member as a reference displacement when the elastic member contacts the stopper of the housing A semiconductor chip laser bonding apparatus that operates the first transfer unit to press a chip against the target.
  15. 제10항에 있어서,The method of claim 10,
    상기 제어부는, 상기 신축 부재가 상기 하우징의 스토퍼에 접촉한 상태에서 상기 공압 레귤레이터에 의해 상기 공압 챔버에 가해지는 압력으로 상기 반도체 칩을 타겟에 대해 가압하는 가압력을 결정하는 반도체 칩 레이저 본딩 장치.The control unit, the semiconductor chip laser bonding apparatus for determining the pressing force for pressing the semiconductor chip against the target with the pressure applied to the pneumatic chamber by the pneumatic regulator in the state that the elastic member is in contact with the stopper of the housing.
PCT/KR2019/018261 2019-01-02 2019-12-20 Semiconductor chip laser bonding device WO2020141775A1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114799579A (en) * 2022-04-22 2022-07-29 常州戴芮珂机电科技有限公司 Pneumatic preposed chuck
CN116833713A (en) * 2023-09-01 2023-10-03 苏州赛腾精密电子股份有限公司 Assembling method of assembling device
CN116852068A (en) * 2023-09-01 2023-10-10 苏州赛腾精密电子股份有限公司 Assembling device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102527552B1 (en) * 2020-09-01 2023-05-03 정라파엘 Method of manufacturing an X-ray tube

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080079885A (en) * 2007-02-28 2008-09-02 삼성테크윈 주식회사 Bonding tool, bonding apparatus with the same and method thereof
KR20090028160A (en) * 2007-09-14 2009-03-18 삼성테크윈 주식회사 Chip bonder
KR20150010074A (en) * 2013-07-18 2015-01-28 (주)정원기술 Head for mounting a semiconductor chip
KR20170070349A (en) * 2015-12-11 2017-06-22 주식회사 파인텍 In-line Auto OLB/COG Common Bonding Apparatus
WO2018062467A1 (en) * 2016-09-30 2018-04-05 ボンドテック株式会社 Substrate bonding method and substrate bonding device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080079885A (en) * 2007-02-28 2008-09-02 삼성테크윈 주식회사 Bonding tool, bonding apparatus with the same and method thereof
KR20090028160A (en) * 2007-09-14 2009-03-18 삼성테크윈 주식회사 Chip bonder
KR20150010074A (en) * 2013-07-18 2015-01-28 (주)정원기술 Head for mounting a semiconductor chip
KR20170070349A (en) * 2015-12-11 2017-06-22 주식회사 파인텍 In-line Auto OLB/COG Common Bonding Apparatus
WO2018062467A1 (en) * 2016-09-30 2018-04-05 ボンドテック株式会社 Substrate bonding method and substrate bonding device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114799579A (en) * 2022-04-22 2022-07-29 常州戴芮珂机电科技有限公司 Pneumatic preposed chuck
CN116833713A (en) * 2023-09-01 2023-10-03 苏州赛腾精密电子股份有限公司 Assembling method of assembling device
CN116852068A (en) * 2023-09-01 2023-10-10 苏州赛腾精密电子股份有限公司 Assembling device
CN116852068B (en) * 2023-09-01 2023-11-10 苏州赛腾精密电子股份有限公司 Assembling device
CN116833713B (en) * 2023-09-01 2023-11-14 苏州赛腾精密电子股份有限公司 Assembling method of assembling device

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