WO2020141642A1 - Système de traitement de gaz dangereux basé sur un plasma et un catalyseur de chauffage diélectrique - Google Patents

Système de traitement de gaz dangereux basé sur un plasma et un catalyseur de chauffage diélectrique Download PDF

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Publication number
WO2020141642A1
WO2020141642A1 PCT/KR2019/000117 KR2019000117W WO2020141642A1 WO 2020141642 A1 WO2020141642 A1 WO 2020141642A1 KR 2019000117 W KR2019000117 W KR 2019000117W WO 2020141642 A1 WO2020141642 A1 WO 2020141642A1
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Prior art keywords
dielectric
gas
plasma
treatment system
decomposition reaction
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PCT/KR2019/000117
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English (en)
Korean (ko)
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정종국
김영민
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주식회사 글로벌스탠다드테크놀로지
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Publication of WO2020141642A1 publication Critical patent/WO2020141642A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/75—Multi-step processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
    • B01D39/2068—Other inorganic materials, e.g. ceramics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Definitions

  • the present invention relates to a system for treating harmful gases based on plasma and dielectric heating catalysts, and more specifically, after first dissolving harmful gases using plasma and removing the generated powder with a dielectric heating filter device after reaction, the dielectric heating catalyst It relates to a system for treating harmful gas using a device and a method for treating harmful gas using the same.
  • PFCs gas commonly used in semiconductor and display fabrication process is the warming potential as a greenhouse gas causing global warming be released into the atmosphere through a suitable treatment plant reaches to several thousands to tens of thousands-fold compared to CO 2.
  • a scrubber which is a gas purification device for safely dissolving and removing the non-decomposable harmful gas and discharging it into the atmosphere, is installed in the exhaust line of the semiconductor facility.
  • These non-decomposable harmful gases are diluted with nitrogen (N 2 ), which is the working fluid of the vacuum pump used to maintain the negative pressure in the process, and then diluted to a concentration of hundreds to thousands of ppm or less, and then introduced into the scrubber.
  • N 2 nitrogen
  • PFCs, SF 6 and NF 3 are decomposed in the form of fluorine and then decomposed, and then discharged in the form of fluorine (F 2 ) and hydrofluoric acid (HF). It is discharged after the washing reaction.
  • F 2 decomposed through an oxidation reaction mainly reacts with surrounding water or H 2 O, a product after combustion, and is discharged in the form of HF (g) or HF (l).
  • an existing scrubber system for removing semiconductor waste gas during a semiconductor manufacturing process includes a plurality of waste gas inlets connected to a semiconductor manufacturing process line, a burner connected to the waste gas inlet, a combustion device coupled to the burner, and a lower end of the combustion device. It includes a wet water tank that is combined with the tank and the water tank to allow the powder generated in the combustion device to be collected and precipitated in the water, and combined with the combustion device and the water tank, to treat the fine powder and water-soluble gas that has passed through the combustion device with water.
  • the combustion device and the wet tower may be connected to each other by separate connecting pipes, and an exhaust pipe is formed on the upper portion of the wet tower.
  • the waste gas in order to incinerate the waste gas, it must be oxidized at a high temperature of up to 1,600°C (for CF 4 ), and as mentioned above, the waste gas is diluted with more than 99% of inert gas (mostly N 2 ), which is hardly decomposable, and injected into the scrubber.
  • inert gas mostly N 2
  • Korean Patent Publication No. 10-1494623 the combustor body having an outlet; And a ceramic porous body combustor provided inside the combustor body, composed of a porous ceramic body, and having a flame formed therein to incinerate the waste gas.
  • a pre-mixer in which fuel flowing through the fuel inlet, waste gas flowing through the waste gas inlet, and oxidant flowing through the oxidant inlet are mixed;
  • a distributor provided between the pre-mixer and the ceramic porous body combustor to uniformly flow the gas mixed in the pre-mixer into the ceramic porous body combustor, and the gas mixed by the pre-mixer is the ceramic porous body combustor.
  • a combustion device for incineration treatment of non-decomposable harmful gas characterized in that it is introduced into the furnace.
  • a pre-treatment dust collecting device for separating and discharging impurities having a specific particle size or more contained in waste gas;
  • a fuel inlet, a waste gas inlet, and an oxidizer inlet are formed at one end, and a combustor body having an outlet through which the exhaust gas in which the waste gas is incinerated is formed at the other end, is provided inside the combustor body, is made of a ceramic porous body and is internal
  • the combustion device includes a pre-mixer in which fuel introduced through the fuel inlet, waste gas introduced through the waste gas inlet, and oxidant introduced through the oxidant inlet are mixed; And the combustion device is provided between the pre-mixer and the ceramic porous body combustor, a distributor for uniformly introducing the gas mixed in the pre-mixer into the ceramic porous body combustor; including, the gas mixed by the
  • a scrubber system for decomposing waste gas includes: a concentrating device for concentrating the waste gas to separate and remove some of the inert gas contained in the waste gas; And a combustor body having a fuel inlet at one end, a waste gas inlet through which concentrated waste gas is introduced, an oxidizing agent inlet, and an outlet through which exhaust gas in which waste gas is incinerated is discharged at the other end, and inside the combustor body.
  • a scrubber system having a device for concentrating non-decomposable harmful gases comprising: a combustion device comprising a ceramic porous body and having a flame formed therein to incinerate concentrated waste gas. .
  • a chemical cleaning unit that controls the load of the harmful gas concentration introduced through the gas inlet, a wet cleaning unit that sprays washing water to the harmful gas, corona discharge to cause harmfulness in the harmful gas It comprises a corona decomposition unit for removing components and a catalyst purification unit for removing residual harmful components in the harmful gas through a catalyst for removing odors and volatile organic compounds, wherein the chemical cleaning unit has a concentration of harmful gas through an absorption liquid.
  • the load is controlled, and the absorbent liquid is benzene, toluene or xylene to which water or surfactant is added, and the surfactant is any one of anionic surfactant, cationic surfactant, amphoteric surfactant and nonionic surfactant.
  • the absorbent liquid is benzene, toluene or xylene to which water or surfactant is added, and the surfactant is any one of anionic surfactant, cationic surfactant, amphoteric surfactant and nonionic surfactant.
  • Korean Patent Publication No. 2003-0031883 includes the step of injecting a fluorine compound-reducing medium into a fluorine-containing gas, wherein the fluorine-compound reducing medium is a combination of steam, methane and hydrogen, and optionally a catalyst having an effect of increasing the reduction.
  • a method for reducing fluorine compounds wherein the injection step of the fluorine compound-reducing medium is performed in a non-combustion state when the fluorine-reducing medium contains methane and/or hydrogen.
  • the above prior arts have a problem of heating a catalyst by a separate heat source device having a high energy consumption rate due to high temperature decomposition even when using a catalyst or a high energy consumption type technology such as thermal decomposition. Therefore, a low-energy consumption-type harmful gas treatment system capable of satisfying a processing flow of 150 LPM or more in semiconductor and display processes while aiming at the treatment of harmful gases containing compounds that are difficult to decompose, such as perfluorinated compounds, has not been proposed.
  • the present invention has been devised to solve the above problems, and a problem to be solved by the present invention is to improve the decomposition efficiency of harmful gases containing perfluorinated compounds that are difficult to decompose while at the same time being a low energy consumption type harmful gas treatment system. And to provide a method for treating harmful gases using the same.
  • Another problem to be solved of the present invention is a harmful gas treatment system and a method for treating harmful gases using the same and a low-cost environmentally friendly reaction by-product generated during the treatment of the harmful gas containing the perfluorinated compound Is to provide
  • Another problem to be solved of the present invention is to provide a harmful gas treatment system and a method for treating harmful gases using the same, which can increase the treatment capacity of the harmful gas containing the perfluorinated compound.
  • the present invention first decomposes harmful gas using plasma and removes the powder generated after the reaction using a dielectric heating filter device, and then treats the harmful gas using a dielectric heating catalyst device.
  • the aim is to provide a system and a method for treating harmful gases using the same.
  • the present invention has a cylindrical shape (1) and the cylindrical shape (1) having a conical shape (3) extending downward, the inside of the hollow by a cover (5) covering the cylindrical shape (1) It is made of an executive part, and the cylindrical part 1 is provided with an inlet part 1 130 through which harmful gas is introduced into one side, and an inlet part 2 100 into which the plasma-forming gas is introduced into the other side for primary decomposition reaction.
  • Plasma reaction chamber 10 An anode member 110 located on the cylindrical portion 1 side of the plasma reaction chamber 10; A cathode member 120 located on the cover side 3 of the plasma reaction chamber 10; Dielectric filter device 140 for processing particles in the plasma-reacted gas located at the lower end of the cone-shaped portion 3 of the plasma reaction chamber 10: provided in the dielectric filter device 140 to react with the plasma Microwave generator 1 (200) for heating the gas; A dielectric heating catalyst device 150 for a secondary decomposition reaction of the plasma reaction gas which is located at the rear end of the dielectric filter device 140 and processes the particles; A microwave generator 2 (250) provided in the dielectric heating catalyst device 150 to heat the dielectric heating catalyst device 150; And a heat exchanger located at a rear end of the dielectric heating catalyst device 150 to cool the gas that has undergone secondary decomposition through the dielectric heating catalyst device 150 and heat the gas flowing into the inlet part 1 130. It provides a hazardous gas treatment system characterized in that it comprises a 1 (180).
  • the pre-heated harmful gas and plasma forming gas is introduced into the plasma reaction chamber to perform a primary decomposition reaction;
  • the gas formed by the primary decomposition reaction passes through a heated dielectric filter device to remove particles in the gas formed by the primary decomposition reaction;
  • the gas formed by the primary decomposition reaction in which the particles are removed is passed through a dielectric heating catalyst device to perform a secondary decomposition reaction;
  • the gas formed by the second decomposition reaction provides a method for treating harmful gases, characterized in that it comprises a step of discharging by heat exchange.
  • the hazardous gas treatment system removes the decomposition reaction using a plasma and a catalyst for the harmful gas containing a perfluorinated compound, which is difficult to decompose, so that the reaction efficiency is high and the harmful gas is processed at a low energy of 25 kW or less compared to the prior art. There is an advantage.
  • the harmful gas treatment system removes by-products generated by the decomposition reaction of harmful gases containing perfluorinated compounds using a high-temperature filter, it is more environmentally friendly than conventional water-using systems and reduces the cost of treating by-products. It has the advantage that it can be drastically reduced.
  • the harmful gas treatment system according to the present invention can operate the system only with electricity without the use of water or combustion fuel, there is an advantage of reducing the initial plant installation cost and the cost for managing flammable materials.
  • the harmful gas treatment system according to the present invention has an advantage in that the treatment capacity is increased to 500 LPM or more compared to the prior art, thereby reducing the number of system operations and the cost for system operation.
  • FIG. 1 is a side view of a hazardous gas treatment system according to an embodiment of the present invention
  • FIG 2 is a top side view of a dielectric heating catalyst device according to an embodiment of the present invention.
  • FIG 3 is a top side view of a dielectric heating catalyst device according to another embodiment of the present invention.
  • first and second are for distinguishing one component from other components, and the scope of rights should not be limited by these terms.
  • the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.
  • first component When a component is said to be “connected” to another component, it may be understood that other components may exist in the middle, although they may be directly connected to the other component.
  • second component when a component is said to be “directly connected” to another component, it should be understood that no other component exists in the middle.
  • other expressions describing the relationship between the components that is, "between” and “immediately between” or “adjacent to” and “directly neighboring to” should be interpreted similarly.
  • the harmful gas treatment system according to the present invention has a cylindrical shape 1 and a cylindrical shape 3 extending downwardly from the cylindrical shape 1.
  • the inside of the empty space part is made by the cover 5 covering the cover, and the inlet part 1 130 through which harmful gas flows into one side of the cylindrical part 1 is provided, and the inlet part 2 through which plasma-forming gas flows into the other side Plasma reaction chamber 10 for primary decomposition reaction provided with 100;
  • An anode member 110 located on the cylindrical portion 1 side of the plasma reaction chamber 10;
  • a cathode member 120 located on the cover side 3 of the plasma reaction chamber 10;
  • Dielectric filter device 140 for processing particles in the plasma-reacted gas located at the lower end of the cone-shaped portion 3 of the plasma reaction chamber 10: provided in the dielectric filter device 140 to react with the plasma Microwave generator 1 (200) for heating the gas;
  • a dielectric heating catalyst device 150 for a secondary decomposition reaction of the plasma reaction gas which is located at the rear
  • the harmful gas processed by the system according to the present invention may be a gas of PFC (Per Fluoro Compound) series among harmful gases used in the semiconductor manufacturing process.
  • PFC-based gases are used in the process of etching or deposition, and the harmful gases of the PFC-based are CF 4 , C 2 F 6 , C 3 F 8 , CHF 3 , NF 3 , SF 6, etc. This can be.
  • the compound may be any one or two or more of oxygen, hydrogen, air, carbon monoxide, carbon dioxide, steam, and hydrocarbon compounds having 1 to 4 carbon atoms. It may preferably be oxygen and/or hydrogen.
  • the hydrogen can be produced through electrolysis of water.
  • the plasma reaction chamber may be a DC arc plasma reaction or a microwave-induced plasma reaction, and considering the configuration of the device, a DC arc plasma reaction is preferable as shown in FIG. 1.
  • the microwave-induced plasma reaction is, for example, a magnetron that generates microwaves having an energy of 1 to 6 electron volts, among which microwaves output from the magnetron are not fully used, and prevents residual microwaves from returning to enter the magnetron as well as residual microwaves.
  • Plasma reaction may be performed using a device configured to include a tuner that matches impedance in order to transfer microwave energy output from the magnetron to the plasma reactor to the maximum.
  • the positive electrode member 110 located on the cylindrical portion 1 side of the plasma reaction chamber 10 of FIG. 1 and the negative electrode member 120 located on the cover side 3 are provided with cooling water 160 for cooling each member. 170) is located.
  • Each of the cooling waters 160 and 170 may be provided to penetrate a part of the inside of each member by a cooling induction pipe.
  • the cooling water (160, 170) is exchanged in the heat exchanger 2 (190).
  • the positive electrode member 110 and the negative electrode member 120 may be provided with a temperature sensor (not shown) for measuring the temperature, respectively.
  • An important feature of the harmful gas treatment system according to the present invention is to increase the decomposition efficiency of harmful gases containing perfluorinated compounds while minimizing temperature drop by using a two-step decomposition process that performs a plasma reaction and a catalytic reaction in a series of processes. It is to reduce energy consumption.
  • the reaction temperature of the plasma reactor must be maintained at a level of 1000°C, so the temperature of the process gas passing through the plasma reactor is maintained at a level of 800°C.
  • a catalyst device is provided at the rear end of the plasma reaction chamber to further treat harmful gases such as unreacted perfluorinated compounds that have passed through the plasma reaction chamber.
  • particulate matter is generated as a by-product of the decomposition reaction of the perfluorinated compound performed in the plasma reaction chamber, and the particulate matter may cause catalyst poisoning and pore clogging during the operation of the catalytic apparatus in the rear stage, so it is essential at the front end of the catalyst apparatus. Should be removed.
  • a filtration device through a filter is usually used, but the filter filtration device causes a decrease in the temperature of the processing gas, and a separate heating device is required to operate the catalyst.
  • the temperature of the gas containing the decomposition reaction by-products (particulates) and undegraded perfluorinated compounds of the perfluorinated compounds that have passed through the plasma reaction chamber is lowered.
  • a filter device is required to remove by-products of the decomposition reaction of chemical compounds.
  • the filter device minimizes the temperature drop
  • the filter is made of a dielectric material to ensure the temperature for catalytic decomposition, the dielectric agent is configured to be heated.
  • the filter may be made of one or more dielectric materials selected from the group consisting of SiC, ZrO 2 and HfO 2 . All of the above materials are dielectric materials defined as ceramics, and are heated to 500°C to 2000°C due to polarization and vibration inside molecules generated by microwaves.
  • the present invention may be provided with a microwave generator 1 in the dielectric filter 145 to heat the filter made of the dielectric.
  • the dielectric filter 145 may be formed in a dielectric filter frame (not shown), and the microwave generator 1 may be located in the dielectric filter frame.
  • the dielectric filter 145 is preferably heated to 200°C to 1000°C by the microwave generator 1.
  • the temperature is less than 200°C, thermal decomposition for contaminants is insufficient, and when it exceeds 1000°C, problems may arise in terms of economic efficiency.
  • the dielectric filter 145 may have a pore size of 1 to 500 ⁇ m. Preferably it may be 5 to 250 ⁇ m. More preferably, it may be 10 to 100 ⁇ m. If the size exceeds the pore size, the powder removal efficiency may be lowered or the clogging phenomenon of the pores may be increased, thereby limiting the process operation according to the differential pressure of the process.
  • the dielectric filter 145 may be provided with a dusting means 210 for removing the by-products of the decomposition reaction of particulate perfluorinated compounds attached to the filter, and the dusting means 210 may also be located in the dielectric frame Can be.
  • the dust removal means 210 is generally used in the art, and is not particularly limited, and may be, for example, a pulse generator or an ultrasonic generator.
  • the by-product of the decomposition reaction of the particulate perfluorinated compound desorbed by the dedusting means 210 is settled and stored in the dust collecting container 20 provided under the dielectric filter 145.
  • the dielectric filter 145 according to the present invention is preferably spaced apart from the dielectric heating catalyst device 150 for performing the decomposition reaction since the process of removing the particulate matter is required by the dedusting means 210.
  • FIGS. 2 and 3 are top side views of a dielectric heating catalyst device 140 according to an embodiment of the present invention, respectively.
  • the dielectric heating catalyst device 140 according to the present invention includes a dielectric frame 220 and a catalyst 230 inside the dielectric frame 220.
  • the dielectric frame 220 may be made of one or more dielectric materials selected from the group consisting of SiC, ZrO 2 and HfO 2 .
  • the dielectric heating catalyst device 150 is provided with a microwave generator 2 250 to maintain a temperature (600°C to 800°C) for performing the catalytic decomposition reaction of the perfluorinated compound.
  • the catalyst 230 is contained in the dielectric frame 220 as shown in FIG. 2, or the dielectric frame 220 and the dielectric fiber 240 are bundled inside the dielectric frame 220 as shown in FIG. And a catalyst 230 between the dielectric fibers 240 of the fibrous dielectric bundle.
  • the dielectric fiber 240 is the same as the material of the dielectric frame 220, but the shape is fibrous. At this time, the catalyst contained in the dielectric fiber 240 may be fixed by a binder, and the organic or inorganic binder generally used in the art may be used as the binder.
  • the catalyst 230 is generally capable of performing a decomposition reaction of a perfluorinated compound in the art, and is not particularly limited.
  • a perfluorinated compound in the art, and is not particularly limited.
  • Pt platinum
  • Pd palladium
  • Rd rhodium
  • the types of anion moieties combined with transition metal compounds are hydroxide, carbonate, bicarbonate, nitrite, nitrite, formate, acetate, and acetate ( It may be any one or more of oxalate, citrate, lactate, oxide, halide, and sulfate.
  • the palladium and platinum ions may be derived from nitrate, halide, acetate, ammonium salt, cancer complex, and precursor compound in hydroxide form.
  • the catalyst may be used alone or supported on a carrier.
  • the carrier may be the dry filter.
  • the catalyst may be supported on any one or more of the inside, outside, pores, and links of the carrier.
  • the reaction temperature of the catalyst may be 100 to 900 °C. Preferably it may be 400 to 800 °C. More preferably, it may be 550 to 750°C. If the temperature exceeds the above conditions, the oxidation reaction does not proceed, and additional energy may be required.
  • the harmful gas treatment system according to the present invention is located at the rear end of the dielectric heating catalyst device 150, passes through the dielectric heating catalyst device 150 to cool the second decomposition reaction gas, and flows into the inlet part 1 130 Heat exchanger 1 (180) for heating the gas to be provided. That is, the second decomposition reaction gas and the harmful gas flowing into the inlet 1 130 are exchanged.
  • the heat exchanger 1 (180) may also heat the plasma forming gas flowing into the inlet 2 (100).
  • the negative electrode member 120 of the present invention and the cooling water (160, 170) heated in the positive electrode member 110, the harmful gas and the inlet from the heat exchanger 2 (190), the inlet 1 (130) Heat exchange with the plasma forming gas flowing into the 2 (100) can be introduced by heating them.
  • the treatment method includes performing a primary decomposition reaction by introducing pre-heated harmful gas and plasma-forming gas into the plasma reaction chamber;
  • the gas formed by the primary decomposition reaction passes through a heated dielectric filter device to remove particles in the gas formed by the primary decomposition reaction;
  • the gas formed by the primary decomposition reaction in which the particles are removed is passed through a dielectric heating catalyst device to perform a secondary decomposition reaction;
  • the gas formed by the second decomposition reaction comprises a step of discharging by heat exchange.

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  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

La présente invention concerne un système de traitement de gaz dangereux et, plus spécifiquement, un système de traitement de gaz dangereux utilisant un plasma et un catalyseur de chauffage diélectrique. A cet effet, l'invention concerne un système de traitement de gaz dangereux comprenant : une chambre de réaction au plasma (10) pour une réaction de décomposition primaire, la chambre de réaction au plasma ayant une partie cylindrique (1) et une partie conique (3), qui s'étend vers le bas à partir de la partie cylindrique (1), formant un espace vide à l'intérieur de celle-ci au moyen d'un couvercle (5) recouvrant la partie cylindrique (1), ayant, d'un côté de la partie cylindrique (1), une première partie d'entrée (130) à travers lequel un gaz dangereux est introduit, et ayant, de l'autre côté de la partie cylindrique (1), une seconde partie d'entrée (100) à travers laquelle un gaz de formation de plasma est introduit; un élément d'anode (110) situé sur le côté de la partie cylindrique (1) dans la chambre de réaction de plasma (10); un élément de cathode (120) situé sur le côté du couvercle (5) dans la chambre de réaction de plasma (10); un dispositif de filtre diélectrique (140) situé à l'extrémité inférieure de la partie conique (3) dans la chambre de réaction au plasma (10) afin de traiter des particules dans un gaz ayant réagi au plasma; un premier dispositif de génération de micro-ondes (200) disposé au niveau du dispositif de filtre diélectrique (140) afin de chauffer le gaz ayant réagi au plasma; un dispositif de catalyseur de chauffage diélectrique (150) qui est située à l'extrémité arrière du dispositif de filtre diélectrique (140) et qui effectue une réaction de décomposition secondaire du gaz ayant réagi au plasma dont les particules ont été traitées; un second dispositif de génération de micro-ondes (250) disposé au niveau du dispositif catalyseur de chauffage diélectrique (150) afin de chauffer le dispositif catalyseur de chauffage diélectrique (150); et un premier échangeur de chaleur (180), qui est situé à l'extrémité arrière du dispositif catalyseur de chauffage diélectrique (150), refroidit le gaz sur lequel la réaction de décomposition secondaire a été effectuée en passant à travers le dispositif catalyseur de chauffage diélectrique (150), et est destiné à chauffer le gaz introduit à travers la première partie d'entrée (130).
PCT/KR2019/000117 2019-01-03 2019-01-03 Système de traitement de gaz dangereux basé sur un plasma et un catalyseur de chauffage diélectrique WO2020141642A1 (fr)

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KR10-2019-0000653 2019-01-03

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