WO2020135622A1 - 一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机 - Google Patents

一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机 Download PDF

Info

Publication number
WO2020135622A1
WO2020135622A1 PCT/CN2019/128825 CN2019128825W WO2020135622A1 WO 2020135622 A1 WO2020135622 A1 WO 2020135622A1 CN 2019128825 W CN2019128825 W CN 2019128825W WO 2020135622 A1 WO2020135622 A1 WO 2020135622A1
Authority
WO
WIPO (PCT)
Prior art keywords
damper
mounting base
stiffness
base plate
vibration
Prior art date
Application number
PCT/CN2019/128825
Other languages
English (en)
French (fr)
Inventor
李思平
宋兴龙
杨辅强
仲凯
Original Assignee
上海微电子装备（集团）股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 上海微电子装备（集团）股份有限公司 filed Critical 上海微电子装备（集团）股份有限公司
Publication of WO2020135622A1 publication Critical patent/WO2020135622A1/zh

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • the invention belongs to the field of lithography equipment, and relates to a grating ruler installation device, installation method, grating measurement system and lithography machine.
  • a lithography apparatus is a semiconductor device that applies a desired pattern to a substrate.
  • the lithographic apparatus in the prior art includes a measurement system for determining the position of the workpiece table with high accuracy. Due to the continuous demand for higher production capacity and measurement accuracy, there is a need to improve the measurement accuracy of the measurement system in the lithography equipment, especially for the measurement system for measuring the position of the workpiece table with six degrees of freedom.
  • the measuring system in the prior art includes a grating or grid, a main substrate and a mounting device for mounting the grating or grid on the main substrate with a certain number of mounting points, the temperature of the main substrate changes and/or the temperature The difference may cause the shape of the main substrate to change. Other factors may also cause the shape of the main substrate to change. As a result, the position of the mounting point on the mounting device changes, resulting in deformation of the grating or grid, which reduces the measurement accuracy of the measurement system.
  • the lithographic apparatus in the prior art discloses a measurement system using an encoder type.
  • the encoder-type measurement system includes: a sensor target object, a mounting device, a compensation device, and at least one sensor, the sensor is mounted on a movable object, and the sensor target object includes a frame (e.g., main substrate) mounted on a substantially stationary frame A grating or a grid, the mounting device is used to mount the sensor target object to the substantially stationary frame, and the compensation device is used to compensate the sensor target object relative to the substantially stationary frame Movement and/or deformation.
  • the mounting device includes a plurality of flexible elements and a passive magnet compensation module, the flexible element is used to compensate for possible changes in the relative position of the mounting point, and the passive magnet compensation module is used to adjust the grating or grating
  • the aluminum and other components on the grid provide the force opposite to the direction of displacement to reduce the influence of deformation or movement on the measurement accuracy of the measurement system.
  • the measurement system in the prior art cannot cope with the influence of heat transfer from the outside, vibration from the main substrate, thermal deformation of the main substrate, and air pressure fluctuations generated during the high-speed movement of the workpiece table on the measurement stability of the grating ruler of the workpiece table.
  • the purpose of the present invention is to provide a grating ruler installation device, installation method, grating measurement system and lithography machine to reduce external heat transfer, vibration of the main substrate, thermal deformation of the main substrate, and production of the workpiece table during high-speed movement The influence of the fluctuation of the air pressure on the measurement stability of the workpiece scale.
  • the present invention provides a mounting device for a lithography machine, which includes a mounting base plate and an adaptive structure.
  • a through hole is opened on the first end surface of the mounting base plate, and the through hole is used to provide An optical path channel of the projection exposure optical system of the lithography machine, and the first end surface of the mounting base plate is used to connect a grating ruler;
  • the adaptive structure includes a flexible block, a stiffness damper, and a vibration absorption damper, and the flexible block, the stiffness damper, and the vibration absorption damper are connected to a second end surface of the mounting base plate, and the second The end face is opposite to the first end face.
  • the material of the mounting base plate is glass-ceramic or aluminum alloy.
  • the flexible block, the stiffness damper and the vibration absorption damper are fixedly connected to the second end surface of the mounting base plate by screw connection, respectively.
  • the shape and size of the cross section of the mounting base plate parallel to the first end surface direction are the same as the shape and size of the cross section of the grating scale parallel to the first end surface direction of the mounting base plate.
  • the cross-sectional shape of the through hole in the direction parallel to the first end surface of the mounting base plate is circular or square.
  • the axis of the through hole passes through the geometric center of the mounting base.
  • a plurality of the flexible blocks are included, and the plurality of the flexible blocks are evenly distributed on a circumference centered on the intersection of the axis of the through hole and the second end surface of the mounting base.
  • a plurality of the rigidity dampers are included, a plurality of the flexible blocks and a plurality of the rigidity dampers are alternately distributed on the circumference.
  • the first ends of the stiffness damper and the vibration absorbing damper are fixed ends, and the second ends of the stiffness damper and the vibration absorbing damper are ends for detachable connection;
  • the first end of the stiffness damper and the vibration absorption damper is an end for detachable connection, and the second end of the stiffness damper and the vibration absorption damper is a fixed end;
  • the stiffness damper and the vibration absorption damper are connected to the mounting base plate through the first end.
  • it also includes a flexible block mounting base, a stiffness damper adapter block and a vibration absorption damper adapter block;
  • One end of the flexible block mounting base is fixedly connected to the second end surface of the mounting base plate, and the flexible block is fixedly connected to the other end of the flexible block mounting base;
  • stiffness damper adapter block One end of the stiffness damper adapter block is fixedly connected to the second end surface of the mounting base plate, and the first end of the stiffness damper adapter block is fixedly connected to the other end of the stiffness damper adapter block on;
  • One end of the vibration absorbing damper adapter block is fixedly connected to the second end surface of the mounting base plate, and the first end of the vibration absorbing damper is fixedly connected to the other end of the vibration absorbing damper adapter block on;
  • One end of the flexible block mounting base is used to be fixedly connected to the lower end surface of the main substrate of the lithography machine, and the flexible block is fixedly connected to the other end of the flexible block mounting base;
  • stiffness damper adapter block One end of the stiffness damper adapter block is used to be fixedly connected to the lower end surface of the main base plate, and the second end of the stiffness damper adapter is fixedly connected to the other end of the stiffness damper adapter block ;
  • One end of the vibration absorbing damper adapter block is used to be fixedly connected to the lower end surface of the main substrate, and the second end of the vibration absorbing damper is fixedly connected to the other end of the vibration absorbing damper adapter block .
  • the end surface of the detachably connected end of the stiffness damper and the vibration absorption damper is coplanar with the end surface of the end of the flexible block away from the mounting base of the flexible block.
  • the stiffness damper is a speed lock or a magnetorheological damper
  • the vibration absorption damper is an oil damper, a viscous damper, a viscoelastic damper, a metal damper or a friction damper.
  • the invention also provides a grating measurement system, including the above-mentioned installation device.
  • the invention also provides a lithography machine, including the grating measurement system described above.
  • an end of the flexible block, the stiffness damper and the vibration absorption damper away from the mounting base plate is connected to the lower end surface of the main substrate of the lithography machine.
  • a plurality of the mounting devices are included, and the plurality of the mounting devices are distributed in groups on the lower end surface of the main substrate of the lithography machine.
  • the invention also provides a method for installing a grating ruler, which is used in a lithography machine.
  • the grating ruler and the main substrate of the lithography machine are connected by using the above-mentioned installation device, which includes the following steps:
  • S3 Perform modal simulation on the mounting base plate processed by the S2, and install the vibration absorption damper at a position on the mounting base plate where the vibration intensity is the largest.
  • step S1 includes:
  • a plurality of the flexible blocks are evenly distributed on a circle centered on the intersection of the axis of the through hole and the second end surface of the mounting base.
  • step S2 includes:
  • Each of the stiffness dampers is fixed between two adjacent flexible blocks on the mounting base plate.
  • the present invention provides a grating ruler installation device, installation method, grating measurement system and lithography machine.
  • the grating ruler installation device includes an installation base plate and an adaptive structure. A through hole is opened on one end surface, the through hole is used to provide an optical path channel of the projection exposure optical system of the lithography machine, the grating scale is connected to the end surface of the mounting base plate, and the adaptive structure It includes a flexible block, a stiffness damper and a vibration absorption damper, and the flexible block, the stiffness damper and the vibration absorption damper are fixedly connected to the other end surface of the mounting base plate.
  • the flexible block decouples the deformation of the grating ruler caused by an external heat source through its own deformation, and the stiffness damper is used to decouple the thermal deformation of the main substrate of the lithography machine at a low frequency band and increase it at a high frequency band
  • the connection strength between the mounting base plate and the grating ruler, the vibration absorption damper is used to provide a damping vibration reduction effect, reduce the vibration effect from the main substrate, and reduce the interference of the air pressure fluctuation generated by the high-speed movement of the workpiece table.
  • the invention also provides a grating measuring system, including the above grating scale mounting device.
  • the influence of the external heat transfer, the vibration of the main substrate, the thermal deformation of the main substrate, and the air pressure fluctuation generated during the high-speed movement of the workpiece table on the measurement stability of the workpiece table grating ruler are reduced, thereby improving the measurement accuracy of the workpiece table grating ruler.
  • the invention also provides a method for installing the grating ruler, and the method can be used to improve the vibration reduction effect of the grating ruler.
  • FIG. 1 is an assembly schematic diagram of a grating scale mounting device provided in Embodiment 1 of the present invention
  • FIG. 2 is a schematic structural diagram of a grating scale mounting device provided in Embodiment 1 of the present invention.
  • FIG. 3 is a partial structural schematic view of a grating scale mounting device provided in Embodiment 1 of the present invention.
  • FIG. 4 is a schematic diagram of a first-order mode of a simulation model of a mounting base plate without a stiffness damper and a vibration-absorbing damper of a grating scale mounting device according to Embodiment 1 of the present invention
  • FIG. 5 is a schematic diagram of a first-order mode of a simulation model of a mounting base for a stiffness damper and a vibration-absorbing damper of a grating scale mounting device provided in Embodiment 1 of the present invention
  • FIG. 6 is the amplitude of a frequency response function of a corner of a mounting base of a grating ruler installation device provided with a first embodiment of the present invention with a stiffness damper and a vibration absorbing damper and an installation base plate without a stiffness damper and a vibration absorbing damper Comparison chart
  • FIG. 7 is a phase comparison of a frequency response function of a corner of a mounting base provided with a grating ruler mounting apparatus according to Embodiment 1 of the present invention and a mounting base plate without a rigidity damper and a vibration absorbing damper Figure;
  • FIG. 1 is an assembly diagram of a mounting device for a grating ruler 16 provided in Embodiment 1 of the present invention
  • FIG. 2 is a schematic structural diagram of a mounting device for a grating ruler 16 provided in Embodiment 1 of the present invention
  • FIG. 3 is an implementation of the present invention
  • Example 1 provides a partial structural diagram of a mounting device for a grating ruler 16.
  • a mounting device for a lithography machine including a mounting base 10 and an adaptive structure, an end surface of the mounting base 10 is provided with a through hole 15, the through hole 15 is used to provide an optical path channel of the projection exposure optical system of the lithography machine, the grating ruler 16 is connected to the end surface of the mounting base 10;
  • the adaptive structure includes a flexible block 11, a stiffness damper 12, and a vibration absorbing damper 13, and the flexible block 11, the stiffness damper 12, and the vibration absorbing damper 13 are fixedly connected to the other of the mounting base 10 One end face.
  • the flexible block 11 decouples the deformation of the grating ruler 16 caused by an external heat source through its own deformation to avoid the influence of the external heat source, and the stiffness damper 12 is used for the main function of the lithography machine at a low frequency band
  • the thermal deformation of the base plate 14 is decoupled, and the connection strength between the mounting base 10 and the grating scale 16 is increased in a high frequency band, the modal of the installation device of the grating scale 16 is increased, and the vibration absorption damper 13 It is used to provide a damping and vibration reduction effect and reduce the vibration effect from the main substrate 14 to reduce the interference of the air pressure fluctuation generated by the high-speed movement of the workpiece table 20.
  • the material of the mounting base plate 10 is selected from glass-ceramics or aluminum alloys.
  • the glass-ceramics and aluminum alloys have a small thermal expansion coefficient and good thermal stability, which can reduce the vibration effect from the main substrate 14 and further improve the scale of the workpiece table. measurement accuracy. It should be appreciated that this limitation is only used to illustrate the material of the mounting base plate 10, and the material of the mounting base plate 10 may also be a material similar to the mechanical properties of the crystallized glass, such as K9 glass, and the mounting base plate 10 The material has the characteristics of small thermal expansion coefficient and good thermal stability.
  • the flexible block 11, the stiffness damper 12 and the vibration absorption damper 13 are fixedly connected to the other end surface of the mounting base plate 10 by screw connection. It should be appreciated that such a limitation is only used to illustrate how the grating ruler 16, the flexible block 11, the stiffness damper 12 and the vibration absorbing damper 13 are respectively connected to the mounting base 10, the grating
  • the ruler 16 may also use a plug-in connection, and the flexible block 11, the stiffness damper 12, and the vibration-absorbing damper 13 may also use a welded connection.
  • the shape and size of the cross section of the mounting base plate 10 parallel to the end surface direction are the same as the shape and size of the cross section of the grating scale 16 parallel to the end surface direction of the mounting base plate 10. It should be appreciated that such a limitation is only used to illustrate the shape and size of the cross section of the mounting base plate 10 parallel to the end surface direction and the cross section of the grating scale 16 parallel to the end surface direction of the mounting base plate 10 Relationship, their shape and size can also be different.
  • the cross-sectional shape of the through hole 15 in a direction parallel to one end surface of the mounting base 10 is circular or square. It should be appreciated that such a limitation is only used to illustrate the cross-sectional shape of the through-hole 15 in a direction parallel to the end surface of the mounting base 10, and the through-hole 15 ensures that the projection exposure optical system of the lithography machine is provided. In the case of an optical path, the cross-sectional shape may also be a triangle, a rhombus, or a parallelogram.
  • the axis of the through hole 15 passes through the geometric center of the mounting base 10. It should be appreciated that such a limitation is only used to illustrate the opening position of the through hole 15 on the mounting base 10, and the through hole 15 may also be opened in other positions of the mounting base 10.
  • the number of the flexible blocks 11 is plural, and the plurality of flexible blocks 11 are evenly distributed on a circle with the intersection of the axis of the through hole 15 and one end surface of the mounting base 10 as the center of the circle. It should be appreciated that such a limitation is only used to illustrate the distribution manner of the plurality of flexible blocks 11, and the plurality of flexible blocks 11 may not be distributed on the same circumference.
  • the number of the stiffness dampers 12 is plural, and the flexible blocks 11 and the stiffness dampers 12 are alternately distributed on the circumference. It is possible to improve the connection effect and make full use of the performance of the flexible block 11, but it should be realized that such a limitation is only used to illustrate the distribution position of the stiffness damper 12 on the mounting base 10, the stiffness damper 12 may be provided at a position approximately the same as the circumference or at another position.
  • first ends of the stiffness damper 12 and the vibration absorption damper 13 are fixed ends, and the second ends of the stiffness damper 12 and the vibration absorption damper 13 are detachably connected ends;
  • the first end of the stiffness damper 12 and the vibration absorption damper 13 is a detachably connected end, and the second end of the stiffness damper 12 and the vibration absorption damper 13 is a fixed end ;
  • the first end is an end of the stiffness damper 12 and the vibration absorbing damper 13 connected to the mounting base 10, and the second end is the stiffness damper 12 and the vibration absorbing damper 13 The other end.
  • a flexible block mounting base 17 a stiffness damper adapter block 18 and a vibration absorption damper adapter block 19;
  • One end of the flexible block mounting base 17 is fixedly connected to the other end surface of the mounting base plate 10, and the flexible block 11 is fixedly connected to the other end of the flexible block mounting base 17;
  • stiffness damper adapter block 18 is fixedly connected to the other end surface of the mounting base 10, and the first end of the stiffness damper 12 is fixedly connected to the stiffness damper adapter block 18 On the other end
  • vibration-absorbing damper adapter block 19 is fixedly connected to the other end surface of the mounting base 10, and the first end of the vibration-absorbing damper 13 is fixedly connected to the vibration-absorbing damper adapter block 19 On the other end
  • One end of the flexible block mounting base 17 is fixedly connected to the lower end surface of the main substrate 14, and the flexible block 11 is fixedly connected to the other end of the flexible block mounting base 17;
  • stiffness damper adapter block 18 is fixedly connected to the lower end surface of the main base plate 14, and the second end of the stiffness damper 12 is fixedly connected to the other end of the stiffness damper adapter block 18 On one end
  • One end of the vibration absorbing damper adapter block 19 is fixedly connected to the lower end surface of the main substrate 14, and the second end of the vibration absorbing damper 13 is fixedly connected to the other end of the vibration absorbing damper adapter block 19 On one end.
  • end surface of the detachably connected end of the stiffness damper 12 and the vibration absorption damper 13 is coplanar with the end surface of the flexible block 11 away from the flexible block mounting base 17.
  • the stiffness damper 12 is a speed locker or a magnetorheological damper
  • the vibration absorption damper 13 is an oil damper, a viscous damper, a viscoelastic damper, a metal damper, or a friction damper. It should be appreciated that such a limitation is only used to exemplify the type of the stiffness damper 12, and the type is not limited thereto.
  • the stiffness damper 12 may also be a variable stiffness tuned mass damper.
  • a mounting device for a grating ruler 16 includes three flexible blocks 11, the flexible blocks 11 are evenly distributed between the axis of the through hole 15 and the mounting base 10 The intersection of the end faces is a circle at the center of the circle, and the starting angle of the arrangement is subject to the remaining devices in the space.
  • the flexible block 11 decouples the deformation of the grating ruler 16 caused by the external heat source through its own deformation, avoiding the outside world The influence of heat source, but also brought the problem of poor radial rigidity.
  • Three stiffness dampers 12 are alternately arranged on the same circumference as the flexible block 11, and the specific arrangement position thereof can be fine-tuned according to the overall simulation result of the installation device of the grating ruler 16.
  • a modal simulation is carried out on the installation device of the grating ruler 16 obtained above, and the obvious part of the vibration can be confirmed from the vibration type cloud image.
  • six vibration absorption dampers 13 are arranged at corresponding positions.
  • FIG. 4 is a schematic diagram of a first-order mode of a simulation model of a mounting base 10 of a mounting device for a grating ruler 16 provided with a grating ruler 16 according to Embodiment 1 of the present invention
  • FIG. 5 is the present invention
  • Embodiment 1 provides a schematic diagram of a first-order mode of a simulation model of a stiffness damper 12 and a vibration-absorbing damper 13 mounting base plate 10 provided in a mounting device for a grating ruler 16, Table 1 shows the increased rigidity damping on the mounting base plate 10 Please refer to Fig. 4, Fig. 5 and Table 1 for the modal data tables of order 1 to 6 obtained by the simulation before and after the damper 12 and the vibration absorption damper 13;
  • Table 1 Modal data table of 1st to 6th order before and after adding stiffness damper 12 and vibration absorption damper 13 to the mounting base 10
  • the frequency of the first-order mode in which the stiffness damper 12 and the vibration absorption damper 13 are not provided on the mounting base 10 in FIG. 4 is 1.609e+2 Hz.
  • the frequency of the first-order mode in which the stiffness damper 12 and the vibration absorption damper 13 are provided on the mounting base 10 in FIG. 5 is 2.074e+2Hz.
  • FIG. 6 is a grating provided in Embodiment 1 of the present invention.
  • the amplitude comparison of the frequency response function of one corner of the installation device of the ruler 16 with the stiffness damper 12 and the vibration absorption damper 13 and the installation base plate 10 without the stiffness damper 12 and vibration absorption damper 13 is shown in FIG. 7.
  • Embodiment 1 of the invention provides a frequency response function of a corner of a mounting device for a grating ruler 16 provided with a stiffness damper 12 and a vibration absorbing damper 13 and a mounting base plate 10 without a stiffness damper 12 and a vibration absorbing damper 13 Phase comparison diagram.
  • “with damper” means that the mounting base 10 is provided with the stiffness damper 12 and the vibration-absorbing damper 13
  • “without damper” means that the mounting base 10 is not provided with the stiffness damper 12 and
  • Table 2 is the first order and 4-6 before and after adding the rigidity damper 12 and the vibration absorbing damper 13 to the mounting base plate 10 Order modal frequency and damping ratio data sheet.
  • Table 2 Data sheets of the 1st and 4th-6th order modal frequencies and damping ratios before and after adding stiffness damper 12 and vibration absorption damper 13 to the mounting base plate 10
  • the installation device of the grating ruler 16 has good damping characteristics, which can effectively suppress the modal peak value in the range of 1-1000 Hz, so that the structural stability of the installation base plate 10 is greatly improved,
  • the measurement accuracy of the ruler has a significant beneficial effect.
  • the present invention also provides a grating measuring system, which includes a grating scale 16 mounting device as described in the first embodiment. Reduces the influence of external heat transfer, vibration of the main substrate 14, thermal deformation of the main substrate 14, and air pressure fluctuations generated by the workpiece table 20 during high-speed movement on the measurement stability of the workpiece table scale, thereby improving the workpiece table scale measurement accuracy.
  • the grating measuring system further includes a grating ruler reading head 21, the grating ruler reading head 21 is fixedly connected to the workpiece table 20, and through the relative relation between the grating ruler 16 and the grating ruler reading head 21 The movement reflects the relative displacement of the main substrate 14 and the workpiece table 20, and then the position of the workpiece table 20 is measured.
  • the invention also provides a lithography machine, including a grating measurement system as described in the second embodiment. Reduces the influence of external heat transfer, vibration of the main substrate 14, thermal deformation of the main substrate 14, and air pressure fluctuations generated by the workpiece table 20 during high-speed movement on the measurement stability of the workpiece table scale, thereby improving the workpiece table scale Measurement accuracy, thereby improving the measurement accuracy of the lithography machine.
  • the ends of the flexible block 11, the stiffness damper 12 and the vibration absorption damper 13 that are away from the mounting base 10 are fixedly connected to the lower end surface of the main substrate 14 of the lithography machine.
  • a plurality of installation devices of the grating scale 16 are included, and the installation devices of the plurality of grating scales 16 are distributed in groups on the lower end surface of the main substrate 14, that is, the plurality of installation devices are divided into a plurality of Groups are distributed on the lower end surface of the main substrate 14. The measurement accuracy of the lithography machine can be further improved.
  • This embodiment provides a method for installing a grating ruler 16 for use on a lithography machine.
  • a grating ruler 16 as described in Embodiment 1 is used between the grating ruler 16 and the main substrate 14 of the lithography machine To connect the installation device, including the following steps:
  • the number of the flexible blocks 11 is multiple, and the S1 specifically includes:
  • a plurality of the flexible blocks 11 are evenly distributed on a circumference centered on the intersection point of the axial direction of the through hole 15 and one end surface of the mounting base 10.
  • the flexible block 11 may also be disposed at other positions.
  • the number of the stiffness dampers 12 is multiple, and the S2 specifically includes:
  • the rigidity damper 12 is fixed between two adjacent flexible blocks 11 on the mounting base 10.
  • the stiffness dampers 12 and the flexible blocks 11 are alternately distributed on the circumference. In order to improve the connection effect and make full use of the performance of the flexible block 11.
  • the stiffness damper 12 may also be disposed at a position approximately the same as the circumference or other position.
  • the present invention provides a grating scale installation device, installation method, grating measurement system, and lithography machine.
  • the grating scale installation device includes an installation base plate and an adaptive structure, and one end surface of the installation base plate A through hole is formed on the through hole, the through hole is used to provide an optical path of the projection exposure optical system of the lithography machine, the grating scale is connected to the end surface of the mounting base plate, and the adaptive structure includes flexibility A block, a stiffness damper and a vibration absorption damper, and the flexible block, the stiffness damper and the vibration absorption damper are fixedly connected to the other end surface of the mounting base plate.
  • the flexible block decouples the deformation of the grating ruler caused by an external heat source through its own deformation, and the stiffness damper is used to decouple the thermal deformation of the main substrate of the lithography machine at a low frequency band and increase it at a high frequency band
  • the connection strength between the mounting base plate and the grating ruler, the vibration absorption damper is used to provide a damping vibration reduction effect, reduce the vibration effect from the main substrate, and reduce the interference of the air pressure fluctuation generated by the high-speed movement of the workpiece table.
  • the invention also provides a grating measuring system, including the above grating scale mounting device. It reduces the influence of external heat transfer, vibration of the main substrate, thermal deformation of the main substrate, and air pressure fluctuations generated by the workpiece table during high-speed movement on the measurement stability of the workpiece table scale, thereby improving the measurement accuracy of the workpiece table scale.
  • the invention also provides a method for installing the grating ruler, and the method can be used to improve the vibration reduction effect of the grating ruler.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机，光栅尺(16)的安装装置包括安装底板(10)和自适应结构，安装底板(10)的一端面上开设有一通孔(15)，通孔(15)用于提供光刻机的投影曝光光学系统的光路通道，光栅尺(16)连接于安装底板(10)的一端面上，自适应结构包括柔性块(11)、刚度阻尼器(12)及吸振阻尼器(13)，且柔性块(11)、刚度阻尼器(12)及吸振阻尼器(13)固定连接于安装底板(10)的另一端面上。从而减少了外界的热传递、主基板(14)的振动、主基板(14)热变形以及工件台(20)在高速运动过程中产生的气压波动对工件台(20)光栅尺(16)测量稳定性的影响，进而提高了工件台(20)光栅尺(16)的测量精度。

Description

一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机 技术领域
本发明属于光刻设备领域，涉及一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机。
背景技术
光刻设备是一种将所需图案应用到衬底上的半导体设备。现有技术中的光刻设备包括测量系统，测量系统用于以高精度确定工件台的位置。由于对更高的生产产能和测量精度的持续需求，需要提高光刻设备中的测量系统的测量精度，尤其是对用于以六个自由度测量工件台的位置的测量系统。
现有技术中的测量系统包括光栅或栅格、主基板以及用于以一定数量安装点将所述光栅或栅格安装在所述主基板上的安装装置，主基板的温度改变和/或温度差异可能造成所述主基板的形状的改变。其他因素也可以造成所述主基板的形状改变。导致所述安装装置上的安装点的位置发生变化，从而导致光栅或栅格发生形变，降低了测量系统的测量精度。
现有技术中的光刻设备公开了一种采用编码器类型的测量系统。该编码器类型的测量系统包括：传感器目标对象、安装装置、补偿装置及至少一个传感器，所述传感器安装在可移动对象上，所述传感器目标对象包括安装在基本静止的框架(例如主基板)上的光栅或栅格，所述安装装置用于将所述传感器目标对象安装到所述基本静止的框架上，所述补偿装置用于补偿所述传感器目标对象相对于所述基本静止的框架的运动和/或变形。所述安装装置包括多个挠性元件及无源磁铁补偿模块，所述挠性元件用于补偿安装点的相对位置的可能的改变，所述无源磁铁补偿模块用于对所述光栅或栅格上的铝等元件提供与其位移方向相反的作用力，以此来减少变形或运动对测量系统的测量精度的影响。
但是现有技术中的测量系统无法应对来自外界的热传递、来自主基板的振动、主基板热变形以及工件台在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响。
发明内容
本发明的目的在于提供一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机，以减少外界的热传递、主基板的振动、主基板热变形以及工件台在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响。
为解决上述技术问题，本发明提供了一种安装装置，用于光刻机上，包括安装底板和自适应结构，所述安装底板的第一端面上开设有一通孔，所述通孔用于提供所述光刻机的投影曝光光学系统的光路通道，所述安装底板的所述第一端面用于连接光栅尺；
所述自适应结构包括柔性块、刚度阻尼器及吸振阻尼器，且所述柔性块、所述刚度阻尼器及所述吸振阻尼器连接于所述安装底板的第二端面上，所述第二端面和所述第一端面相对。
优选地，所述安装底板的材质选用微晶玻璃或铝合金。
优选地，所述柔性块、所述刚度阻尼器及所述吸振阻尼器分别采用螺钉连接的方式固定连接于所述安装底板的所述第二端面上。
优选地，所述安装底板在平行于所述第一端面方向的截面的形状和尺寸与所述光栅尺在平行于所述安装底板的所述第一端面方向的截面的形状和尺寸相同。
优选地，所述通孔在平行于所述安装底板的所述第一端面方向的截面形状为圆形或正方形。
优选地，所述通孔的轴线经过所述安装底板的几何中心。
优选地，包括多个所述柔性块，多个所述柔性块均匀分布在以所述通孔的轴线与所述安装底板的所述第二端面的交点为圆心的一圆周上。
优选地，包括多个所述刚度阻尼器，多个所述柔性块和多个所述刚度阻尼器在所述圆周上交替分布。
优选地，所述刚度阻尼器和所述吸振阻尼器的第一端为固定端，所述刚度阻尼器和所述吸振阻尼器的第二端为用于可拆卸连接的一端；
或者，所述刚度阻尼器和所述吸振阻尼器的所述第一端为用于可拆卸连 接的一端，所述刚度阻尼器和所述吸振阻尼器的所述第二端为固定端；
所述刚度阻尼器和所述吸振阻尼器通过所述第一端与所述安装底板相连接。
优选地，还包括柔性块安装底座、刚度阻尼器转接块及吸振阻尼器转接块；
所述刚度阻尼器和所述吸振阻尼器的所述第一端为固定端，所述刚度阻尼器和所述吸振阻尼器的所述第二端为可拆卸连接的一端时：
所述柔性块安装底座的一端固定连接于所述安装底板的所述第二端面上，所述柔性块固定连接于所述柔性块安装底座的另一端上；
所述刚度阻尼器转接块的一端固定连接于所述安装底板的所述第二端面上，所述刚度阻尼器的所述第一端固定连接于所述刚度阻尼器转接块的另一端上；
所述吸振阻尼器转接块的一端固定连接于所述安装底板的所述第二端面上，所述吸振阻尼器的所述第一端固定连接于所述吸振阻尼器转接块的另一端上；
所述刚度阻尼器和所述吸振阻尼器的所述第一端为可拆卸连接的一端，所述刚度阻尼器和所述吸振阻尼器的所述第二端为固定端时：
所述柔性块安装底座的一端用于固定连接于所述光刻机的主基板的下端面上，所述柔性块固定连接于所述柔性块安装底座的另一端上；
所述刚度阻尼器转接块的一端用于固定连接于所述主基板的下端面上，所述刚度阻尼器的所述第二端固定连接于所述刚度阻尼器转接块的另一端上；
所述吸振阻尼器转接块的一端用于固定连接于所述主基板的下端面上，所述吸振阻尼器的所述第二端固定连接于所述吸振阻尼器转接块的另一端上。
优选地，所述刚度阻尼器和所述吸振阻尼器的可拆卸连接的一端的端面与所述柔性块上远离所述柔性块安装底座的一端的端面共面。
优选地，所述刚度阻尼器为速度锁定器或磁流变阻尼器，所述吸振阻尼 器为油阻尼器、粘滞阻尼器、粘弹性阻尼器、金属阻尼器或摩擦阻尼器。
本发明还提供了一种光栅测量系统，包括上述的安装装置。
本发明还提供了一种光刻机，包括上述的光栅测量系统。
优选地，所述柔性块、所述刚度阻尼器及所述吸振阻尼器的远离所述安装底板的一端连接于所述光刻机的主基板的下端面上。
优选地，包括多个所述安装装置，且多个所述安装装置在所述光刻机的主基板的下端面上以分组形式分布。
本发明还提供了一种光栅尺的安装方法，用于光刻机上，所述光栅尺与所述光刻机的主基板之间采用上述的安装装置进行连接，包括以下步骤：
S1：将所述柔性块固定在所述安装底板上；
S2：将所述刚度阻尼器固定在所述安装底板上；
S3：对所述S2处理后的所述的安装底板进行模态仿真，并在所述安装底板上振动强度最大的位置设置所述吸振阻尼器。
优选地，包括多个所述柔性块，所述步骤S1包括：
将多个所述柔性块均匀分布在以所述通孔的轴线与所述安装底板的第二端面的交点为圆心的一圆周上。
优选地，包括多个所述刚度阻尼器，所述步骤S2包括：
将每个所述刚度阻尼器固定在所述安装底板上相邻两个所述柔性块之间。
与现有技术相比，本发明提供了一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机，所述光栅尺的安装装置包括安装底板和自适应结构，所述安装底板的一端面上开设有一通孔，所述通孔用于提供所述光刻机的投影曝光光学系统的光路通道，所述光栅尺连接于所述安装底板的所述端面上，所述自适应结构包括柔性块、刚度阻尼器及吸振阻尼器，且所述柔性块、所述刚度阻尼器及所述吸振阻尼器固定连接于所述安装底板的另一端面上。所述柔性块通过自身形变对外界热源引起的光栅尺的形变进行解耦，所述刚度阻尼器用于在低频段对所述光刻机的主基板的热变形进行解耦，并在高频段提高所述安装底板与所述光栅尺之间的连接强度，所述吸振阻尼器用于提供 阻尼减振效果，减轻来自主基板的振动影响，以减少工件台高速运动产生的气压波动干扰。从而减少了外界的热传递、主基板的振动、主基板热变形以及工件台在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响，进而提高了工件台光栅尺的测量精度。
本发明还提供了一种光栅测量系统，包括上述的光栅尺的安装装置。减少了外界的热传递、主基板的振动、主基板热变形以及工件台在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响，进而提高了工件台光栅尺的测量精度。
本发明还提供了一种光栅尺的安装方法，采用该方法进行安装可以提高光栅尺的减振效果。
附图说明
图1是本发明实施例一提供的一种光栅尺的安装装置的装配示意图；
图2是本发明实施例一提供的一种光栅尺的安装装置的结构示意图；
图3是本发明实施例一提供的一种光栅尺的安装装置的局部结构示意图；
图4是本发明实施例一提供的一种光栅尺的安装装置的未设置刚度阻尼器和吸振阻尼器的安装底板的仿真模型的一阶模态的示意图；
图5是本发明实施例一提供的一种光栅尺的安装装置的设置刚度阻尼器和吸振阻尼器的安装底板的仿真模型的一阶模态的示意图；
图6是本发明实施例一提供的一种光栅尺的安装装置的设置刚度阻尼器和吸振阻尼器与未设置刚度阻尼器和吸振阻尼器的安装底板的一个边角的频率响应函数的幅值对比图；
图7是本发明实施例一提供的一种光栅尺的安装装置的设置刚度阻尼器和吸振阻尼器与未设置刚度阻尼器和吸振阻尼器的安装底板的一个边角的频率响应函数的相位对比图；
其中，10-安装底板；11-柔性块；12-刚度阻尼器；13-吸振阻尼器；14-主基板；15-通孔；16-光栅尺；17-柔性块安装底座；18-刚度阻尼器转接块；19-吸振阻尼器转接块；20-工件台；21-光栅尺读头。
具体实施方式
以下结合附图和具体实施例对本发明提出的一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机作进一步详细说明。根据权利要求书和下面说明，本发明的优点和特征将更清楚。需说明的是，附图均采用非常简化的形式且均使用非精准的比例，仅用以方便、明晰地辅助说明本发明实施例的目的。附图中相同或相似的附图标记代表相同或相似的部件。
实施例一
图1是本发明实施例一提供的一种光栅尺16的安装装置的装配示意图，图2是本发明实施例一提供的一种光栅尺16的安装装置的结构示意图，图3是本发明实施例一提供的一种光栅尺16的安装装置的局部结构示意图。请参考图1、图2及图3，一种安装装置，用于光刻机上，包括安装底板10和自适应结构，所述安装底板10的一端面上开设有一通孔15，所述通孔15用于提供所述光刻机的投影曝光光学系统的光路通道，所述光栅尺16连接于所述安装底板10的所述端面上；
所述自适应结构包括柔性块11、刚度阻尼器12及吸振阻尼器13，且所述柔性块11、所述刚度阻尼器12及所述吸振阻尼器13固定连接于所述安装底板10的另一端面上。所述柔性块11通过自身形变对外界热源引起的光栅尺16的形变进行解耦，避免了外界热源带来的影响，所述刚度阻尼器12用于在低频段对所述光刻机的主基板14的热变形进行解耦，并在高频段提高所述安装底板10与所述光栅尺16之间的连接强度，增加所述光栅尺16的安装装置的模态，所述吸振阻尼器13用于提供阻尼减振效果，减轻来自主基板14的振动影响，以减少工件台20高速运动产生的气压波动干扰。从而减少了外界的热传递、主基板14的振动、主基板14热变形以及工件台20在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响，进而提高了工件台光栅尺的测量精度。
进一步，所述安装底板10的材质选用微晶玻璃或铝合金，微晶玻璃和铝合金的热膨胀系数小、热稳定性能好，可以减轻来自主基板14的振动影响， 进一步提高工件台光栅尺的测量精度。应该意识到这样的限定仅用于举例说明所述安装底板10的材质，所述安装底板10的材质也可以选用与所述微晶玻璃的力学性能相近的材料比如K9玻璃，所述安装底板10的材质具有热膨胀系数小、热稳定性能好的特点。
进一步，所述柔性块11、所述刚度阻尼器12及所述吸振阻尼器13采用螺钉连接的方式固定连接于所述安装底板10的另一端面上。应该意识到这样的限定仅用于举例说明所述光栅尺16、所述柔性块11、所述刚度阻尼器12以及所述吸振阻尼器13分别与所述安装底板10的连接方式，所述光栅尺16也可以采用插接的连接方式，所述柔性块11、所述刚度阻尼器12以及所述吸振阻尼器13也可以采用焊接的连接方式。
进一步，所述安装底板10在平行于其一端面方向的截面的形状和尺寸与所述光栅尺16在平行于所述安装底板10的一端面方向的截面的形状和尺寸相同。应该意识到这样的限定仅用于举例说明所述安装底板10在平行于其一端面方向的截面与所述光栅尺16在平行于所述安装底板10的一端面方向的截面的形状和尺寸的关系，它们的形状和尺寸也可以不相同。
进一步，所述通孔15在平行于所述安装底板10的一端面方向的截面形状为圆形或正方形。应该意识到这样的限定仅用于举例说明所述通孔15在平行于所述安装底板10的一端面方向的截面形状，所述通孔15在保证提供所述光刻机的投影曝光光学系统的光路通道的情况下，其截面形状也可以为三角形、菱形或平行四边形等形状。
进一步，所述通孔15的轴线经过所述安装底板10的几何中心。应该意识到这样的限定仅用于举例说明所述通孔15在所述安装底板10上的开设位置，所述通孔15也可以开设在所述安装底板10的其他位置。
进一步，所述柔性块11的数量为多个，多个所述柔性块11均匀分布在以所述通孔15的轴线与所述安装底板10的一端面的交点为圆心的一圆周上。应该意识到这样的限定仅用于举例说明多个所述柔性块11的分布方式，多个所述柔性块11也可以不分布在同一圆周上。
进一步，所述刚度阻尼器12的数量为多个，所述柔性块11和所述刚度 阻尼器12在所述圆周上交替分布。可以提高连接效果并充分利用所述柔性块11的自身性能，但应该意识到这样的限定仅用于举例说明所述刚度阻尼器12在所述安装底板10上的分布位置，所述刚度阻尼器12也可以设置在与所述圆周近似同一圆周的位置或其他位置。
进一步，所述刚度阻尼器12和所述吸振阻尼器13的第一端为固定端，所述刚度阻尼器12和所述吸振阻尼器13的第二端为可拆卸连接的一端；
或者，所述刚度阻尼器12和所述吸振阻尼器13的所述第一端为可拆卸连接的一端，所述刚度阻尼器12和所述吸振阻尼器13的所述第二端为固定端；
所述第一端为所述刚度阻尼器12和所述吸振阻尼器13上与所述安装底板10相连接的一端，所述第二端为所述刚度阻尼器12和所述吸振阻尼器13的另一端。
进一步，还包括柔性块安装底座17、刚度阻尼器转接块18及吸振阻尼器转接块19；
所述刚度阻尼器12和所述吸振阻尼器13的所述第一端为固定端，所述刚度阻尼器12和所述吸振阻尼器13的所述第二端为可拆卸连接的一端时：
所述柔性块安装底座17的一端固定连接于所述安装底板10的另一端面上，所述柔性块11固定连接于所述柔性块安装底座17的另一端上；
所述刚度阻尼器转接块18的一端固定连接于所述安装底板10的另一端面上，所述刚度阻尼器12的所述第一端固定连接于所述刚度阻尼器转接块18的另一端上；
所述吸振阻尼器转接块19的一端固定连接于所述安装底板10的另一端面上，所述吸振阻尼器13的所述第一端固定连接于所述吸振阻尼器转接块19的另一端上；
所述刚度阻尼器12和所述吸振阻尼器13的所述第一端为可拆卸连接的一端，所述刚度阻尼器12和所述吸振阻尼器13的所述第二端为固定端时：
所述柔性块安装底座17的一端固定连接于所述主基板14的下端面上，所述柔性块11固定连接于所述柔性块安装底座17的另一端上；
所述刚度阻尼器转接块18的一端固定连接于所述主基板14的下端面上，所述刚度阻尼器12的所述第二端固定连接于所述刚度阻尼器转接块18的另一端上；
所述吸振阻尼器转接块19的一端固定连接于所述主基板14的下端面上，所述吸振阻尼器13的所述第二端固定连接于所述吸振阻尼器转接块19的另一端上。
进一步，所述刚度阻尼器12和所述吸振阻尼器13的可拆卸连接的一端的端面与所述柔性块11上远离所述柔性块安装底座17的一端面共面。
进一步，所述刚度阻尼器12为速度锁定器或磁流变阻尼器，所述吸振阻尼器13为油阻尼器、粘滞阻尼器、粘弹性阻尼器、金属阻尼器或摩擦阻尼器。应该意识到这样的限定仅用于举例说明所述刚度阻尼器12的种类，其种类并不限于此，所述刚度阻尼器12还可以为变刚度调谐质量阻尼器。
本实施例的一个实际应用中的一种光栅尺16的安装装置包括3个所述柔性块11，所述柔性块11均匀分布在以所述通孔15的轴线与所述安装底板10的一端面的交点为圆心的一圆周上，其布置起始角度以不影响该空间其余装置为准，所述柔性块11通过自身形变对外界热源引起的光栅尺16的形变进行解耦，避免了外界热源带来的影响，但也同时带来了径向刚度较差的问题。
在与所述柔性块11同一圆周处交替布置有3个所述刚度阻尼器12，其具体布置位置可依据所述光栅尺16的安装装置的整体仿真结果进行微调。
对上面所得光栅尺16的安装装置进行模态仿真，由振型云图可确认振动明显部位。为抑制安装底板10的自身结构的模态峰值，减少其边角处的振动幅度，在相应位置布置6个吸振阻尼器13。
图4是本发明实施例一提供的一种光栅尺16的安装装置的未设置刚度阻尼器12和吸振阻尼器13的安装底板10的仿真模型的一阶模态的示意图，图5是本发明实施例一提供的一种光栅尺16的安装装置的设置刚度阻尼器12和吸振阻尼器13的安装底板10的仿真模型的一阶模态的示意图，表1，是安装底板10上增加刚度阻尼器12和吸振阻尼器13前后的仿真得到的1～6阶模态数据表，请参考图4、图5以及表1；
表1安装底板10上增加刚度阻尼器12和吸振阻尼器13前后的1～6阶模态数据表
频率(Hz) 一阶 二阶 三阶 四阶 五阶 六阶
未加阻尼器 160.9 162.3 309.6 330.0 359.0 443.4
加阻尼器 207.4 214.7 315.3 430.6 477.5 552.0
图4中安装底板10上未设置刚度阻尼器12和吸振阻尼器13的1阶模态的频率为1.609e+2Hz。
图5中安装底板10上设置刚度阻尼器12和吸振阻尼器13的1阶模态的频率为2.074e+2Hz。
以频率为1-1000Hz、大小为1N的冲击力作安装底板10的四个边角处的频率响应函数分析，取其中一个边角进行分析对比，图6是本发明实施例一提供的一种光栅尺16的安装装置的设置刚度阻尼器12和吸振阻尼器13与未设置刚度阻尼器12和吸振阻尼器13的安装底板10的一个边角的频率响应函数的幅值对比图，图7是本发明实施例一提供的一种光栅尺16的安装装置的设置刚度阻尼器12和吸振阻尼器13与未设置刚度阻尼器12和吸振阻尼器13的安装底板10的一个边角的频率响应函数的相位对比图，在图6和图7中“有阻尼器”表示安装底板10上设置有刚度阻尼器12和吸振阻尼器13，“无阻尼器”表示安装底板10上未设置刚度阻尼器12和吸振阻尼器13，请参考图6和图7，通过图6和图7可以计算得到表2，表2为安装底板10上增加刚度阻尼器12和吸振阻尼器13前后的1阶及4-6阶模态频率和阻尼比数据表。
表2安装底板10上增加刚度阻尼器12和吸振阻尼器13前后的1阶及4-6阶模态频率和阻尼比数据表
Figure PCTCN2019128825-appb-000001
可以看出，所述光栅尺16的安装装置具有良好的阻尼特性，能有效抑制1-1000Hz范围内模态峰值，使得安装底板10的结构稳定性得到了极大的提高，对提升工件台光栅尺的测量精度带来了显著的有益影响。
实施例二
本发明还提供了一种光栅测量系统，包括如实施例一所述的一种光栅尺16的安装装置。减少了外界的热传递、主基板14的振动、主基板14热变形以及工件台20在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响，进而提高了工件台光栅尺的测量精度。
进一步，所述光栅测量系统还包括光栅尺读头21，所述光栅尺读头21固定连接于所述工件台20上，通过所述光栅尺16和所述光栅尺读头21之间的相对运动来反映所述主基板14和所述工件台20的相对位移，进而测量所述工件台20的位置。
实施例三
本发明还提供了一种光刻机，包括如实施例二所述的一种光栅测量系统。减少了外界的热传递、主基板14的振动、主基板14热变形以及工件台20在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响，进而提高了工件台光栅尺的测量精度，从而提高了所述光刻机的测量精度。
进一步，所述柔性块11、所述刚度阻尼器12及所述吸振阻尼器13的远离所述安装底板10的一端固定连接于所述光刻机的主基板14的下端面上。
进一步，包括多个所述光栅尺16的安装装置，且多个所述光栅尺16的安装装置在所述主基板14的下端面上以成组形式分布，即多个所述安装装置分成多组分布于所述主基板14的下端面上。可以进一步提高所述光刻机的测量精度。
实施例四
本实施例提供了一种光栅尺16的安装方法，用于光刻机上，所述光栅尺16与所述光刻机的主基板14之间采用如实施例一所述的一种光栅尺16的安装装置进行连接，包括以下步骤：
S1：将所述柔性块11固定在所述安装底板10上；
S2：将所述刚度阻尼器12固定在所述安装底板10上；
S3：对所述S2处理后的所述的光栅尺16的安装装置进行模态仿真，并在所述安装底板10上振动强度最大的位置设置所述吸振阻尼器13。
从而减少了外界的热传递、主基板14的振动、主基板14热变形以及工 件台20在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响，进而提高了工件台光栅尺的测量精度，从而提高了所述光刻机的测量精度。
进一步，所述柔性块11的数量为多个，所述S1具体包括：
多个所述柔性块11均匀分布在以所述通孔15的轴线方向与所述安装底板10的一端面的交点为圆心的一圆周上。但应该意识到这样的限定仅用于举例说明所述柔性块11在所述安装底板10上的分布位置，所述柔性块11也可以设置在其他位置。
进一步，所述刚度阻尼器12的数量为多个，所述S2具体包括：
将所述刚度阻尼器12固定在所述安装底板10上相邻两个所述柔性块11之间。使得所述刚度阻尼器12和所述柔性块11在所述圆周上交替分布。以提高连接效果并充分利用所述柔性块11的自身性能。但应该意识到这样的限定仅用于举例说明所述刚度阻尼器12在所述安装底板10上的分布位置，所述刚度阻尼器12也可以设置在与所述圆周近似同一圆周的位置或其他位置。
综上所述，本发明提供了一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机，所述光栅尺的安装装置包括安装底板和自适应结构，所述安装底板的一端面上开设有一通孔，所述通孔用于提供所述光刻机的投影曝光光学系统的光路通道，所述光栅尺连接于所述安装底板的所述端面上，所述自适应结构包括柔性块、刚度阻尼器及吸振阻尼器，且所述柔性块、所述刚度阻尼器及所述吸振阻尼器固定连接于所述安装底板的另一端面上。所述柔性块通过自身形变对外界热源引起的光栅尺的形变进行解耦，所述刚度阻尼器用于在低频段对所述光刻机的主基板的热变形进行解耦，并在高频段提高所述安装底板与所述光栅尺之间的连接强度，所述吸振阻尼器用于提供阻尼减振效果，减轻来自主基板的振动影响，以减少工件台高速运动产生的气压波动干扰。从而减少了外界的热传递、主基板的振动、主基板热变形以及工件台在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响，进而提高了工件台光栅尺的测量精度。
本发明还提供了一种光栅测量系统，包括上述的光栅尺的安装装置。减 少了外界的热传递、主基板的振动、主基板热变形以及工件台在高速运动过程中产生的气压波动对工件台光栅尺测量稳定性的影响，进而提高了工件台光栅尺的测量精度。
本发明还提供了一种光栅尺的安装方法，采用该方法进行安装可以提高光栅尺的减振效果。
需要说明的是，本说明书中各个实施例采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似部分互相参见即可。对于实施例公开的光栅尺的安装方法而言，由于其采用的光栅尺的安装装置与实施例公开的光栅尺的安装装置部分相对应，所以对其中涉及的光栅尺的安装装置描述的比较简单，相关之处参见光栅尺的安装装置部分说明即可。
上述描述仅是对本发明较佳实施例的描述，并非对本发明范围的任何限定，本发明领域的普通技术人员根据上述揭示内容做的任何变更、修饰，均属于权利要求书的保护范围。

Claims (19)

  1. 一种安装装置，用于光刻机上，其特征在于，包括安装底板和自适应结构，所述安装底板的第一端面上开设有一通孔，所述通孔用于提供所述光刻机的投影曝光光学系统的光路通道，所述安装底板的所述第一端面用于连接光栅尺；
    所述自适应结构包括柔性块、刚度阻尼器及吸振阻尼器，且所述柔性块、所述刚度阻尼器及所述吸振阻尼器连接于所述安装底板的第二端面上，所述第二端面和所述第一端面相对。
  2. 如权利要求1所述的安装装置，其特征在于，所述安装底板的材质选用微晶玻璃或铝合金。
  3. 如权利要求1所述的安装装置，其特征在于，所述柔性块、所述刚度阻尼器及所述吸振阻尼器分别采用螺钉连接的方式固定连接于所述安装底板的所述第二端面上。
  4. 如权利要求1所述的安装装置，其特征在于，所述安装底板在平行于所述第一端面方向的截面的形状和尺寸与所述光栅尺在平行于所述安装底板的所述第一端面方向的截面的形状和尺寸相同。
  5. 如权利要求1所述的安装装置，其特征在于，所述通孔在平行于所述安装底板的所述第一端面方向的截面形状为圆形或正方形。
  6. 如权利要求5所述的安装装置，其特征在于，所述通孔的轴线经过所述安装底板的几何中心。
  7. 如权利要求1所述的安装装置，其特征在于，包括多个所述柔性块，多个所述柔性块均匀分布在以所述通孔的轴线与所述安装底板的所述第二端面的交点为圆心的一圆周上。
  8. 如权利要求7所述的安装装置，其特征在于，包括多个所述刚度阻尼器，多个所述柔性块和多个所述刚度阻尼器在所述圆周上交替分布。
  9. 如权利要求1所述的安装装置，其特征在于，所述刚度阻尼器和所述吸振阻尼器的第一端为固定端，所述刚度阻尼器和所述吸振阻尼器的第二端 为用于可拆卸连接的一端；
    或者，所述刚度阻尼器和所述吸振阻尼器的所述第一端为用于可拆卸连接的一端，所述刚度阻尼器和所述吸振阻尼器的所述第二端为固定端；
    所述刚度阻尼器和所述吸振阻尼器通过所述第一端与所述安装底板相连接。
  10. 如权利要求9所述的安装装置，其特征在于，还包括柔性块安装底座、刚度阻尼器转接块及吸振阻尼器转接块；
    所述刚度阻尼器和所述吸振阻尼器的所述第一端为固定端，所述刚度阻尼器和所述吸振阻尼器的所述第二端为可拆卸连接的一端时：
    所述柔性块安装底座的一端固定连接于所述安装底板的所述第二端面上，所述柔性块固定连接于所述柔性块安装底座的另一端上；
    所述刚度阻尼器转接块的一端固定连接于所述安装底板的所述第二端面上，所述刚度阻尼器的所述第一端固定连接于所述刚度阻尼器转接块的另一端上；
    所述吸振阻尼器转接块的一端固定连接于所述安装底板的所述第二端面上，所述吸振阻尼器的所述第一端固定连接于所述吸振阻尼器转接块的另一端上；
    所述刚度阻尼器和所述吸振阻尼器的所述第一端为可拆卸连接的一端，所述刚度阻尼器和所述吸振阻尼器的所述第二端为固定端时：
    所述柔性块安装底座的一端用于固定连接于所述光刻机的主基板的下端面上，所述柔性块固定连接于所述柔性块安装底座的另一端上；
    所述刚度阻尼器转接块的一端用于固定连接于所述主基板的下端面上，所述刚度阻尼器的所述第二端固定连接于所述刚度阻尼器转接块的另一端上；
    所述吸振阻尼器转接块的一端用于固定连接于所述主基板的下端面上，所述吸振阻尼器的所述第二端固定连接于所述吸振阻尼器转接块的另一端上。
  11. 如权利要求10所述的安装装置，其特征在于，所述刚度阻尼器和所 述吸振阻尼器的可拆卸连接的一端的端面与所述柔性块上远离所述柔性块安装底座的一端的端面共面。
  12. 如权利要求1所述的安装装置，其特征在于，所述刚度阻尼器为速度锁定器或磁流变阻尼器，所述吸振阻尼器为油阻尼器、粘滞阻尼器、粘弹性阻尼器、金属阻尼器或摩擦阻尼器。
  13. 一种光栅测量系统，其特征在于，包括如权利要求1-12中任一项所述的安装装置。
  14. 一种光刻机，其特征在于，包括如权利要求13所述的光栅测量系统。
  15. 如权利要求14所述的光刻机，其特征在于，所述柔性块、所述刚度阻尼器及所述吸振阻尼器的远离所述安装底板的一端连接于所述光刻机的主基板的下端面上。
  16. 如权利要求14所述的光刻机，其特征在于，包括多个所述安装装置，且多个所述安装装置在所述光刻机的主基板的下端面上以分组形式分布。
  17. 一种光栅尺的安装方法，用于光刻机上，其特征在于，所述光栅尺与所述光刻机的主基板之间采用如权利要求1-12中任一项所述的安装装置进行连接，包括以下步骤：
    S1：将所述柔性块固定在所述安装底板上；
    S2：将所述刚度阻尼器固定在所述安装底板上；
    S3：对所述S2处理后的所述的安装底板进行模态仿真，并在所述安装底板上振动强度最大的位置设置所述吸振阻尼器。
  18. 如权利要求17所述的光栅尺的安装方法，其特征在于，包括多个所述柔性块，所述步骤S1包括：
    将多个所述柔性块均匀分布在以所述通孔的轴线与所述安装底板的第二端面的交点为圆心的一圆周上。
  19. 如权利要求18所述的光栅尺的安装方法，其特征在于，包括多个所述刚度阻尼器，所述步骤S2包括：
    将每个所述刚度阻尼器固定在所述安装底板上相邻两个所述柔性块之间。
PCT/CN2019/128825 2018-12-28 2019-12-26 一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机 WO2020135622A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201811629401.8A CN111380464B (zh) 2018-12-28 2018-12-28 一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机
CN201811629401.8 2018-12-28

Publications (1)

Publication Number Publication Date
WO2020135622A1 true WO2020135622A1 (zh) 2020-07-02

Family

ID=71125700

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/128825 WO2020135622A1 (zh) 2018-12-28 2019-12-26 一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机

Country Status (3)

Country Link
CN (1) CN111380464B (zh)
TW (1) TWI730566B (zh)
WO (1) WO2020135622A1 (zh)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5283434A (en) * 1991-12-20 1994-02-01 Canon Kabushiki Kaisha Displacement detecting device with integral optics
CN101276155A (zh) * 2007-03-29 2008-10-01 Asml荷兰有限公司 测量系统、光刻设备和测量方法
CN101581347A (zh) * 2009-06-23 2009-11-18 上海微电子装备有限公司 减振支撑装置及采用该减振支撑装置的光刻机
CN101989050A (zh) * 2009-07-31 2011-03-23 Asml荷兰有限公司 定位系统、光刻设备和方法
CN104749904A (zh) * 2013-12-31 2015-07-01 上海微电子装备有限公司 物镜支撑装置及光刻机
CN108801158A (zh) * 2018-08-17 2018-11-13 桂林电子科技大学 一种光栅尺标定装置及标定方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2003680B1 (en) * 2006-02-21 2013-05-29 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
CN104111587B (zh) * 2007-07-18 2017-01-11 株式会社尼康 测量方法、载台装置、及曝光装置
US7826065B1 (en) * 2008-07-15 2010-11-02 Sandia Corporation Tuned optical cavity magnetometer
WO2011016254A1 (ja) * 2009-08-07 2011-02-10 株式会社ニコン 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
CN201517920U (zh) * 2009-10-12 2010-06-30 中国水电顾问集团华东勘测设计研究院 光纤布拉格光栅串式多点位移传感器
US9360772B2 (en) * 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
TWI529284B (zh) * 2012-06-29 2016-04-11 Univ Nat Cheng Kung Composite damping connector
CN103047355B (zh) * 2012-12-19 2015-02-11 哈尔滨工业大学 共面气浮正交解耦与柔性膜角度解耦的电磁阻尼隔振器
CN103062310B (zh) * 2012-12-19 2015-04-01 哈尔滨工业大学 气浮球轴承角度解耦的电磁阻尼零刚度隔振器
CN103514380B (zh) * 2013-10-23 2017-02-22 合肥工业大学 磁流变阻尼器等效线性阻尼系数解析模型建模方法
NL2012548B1 (nl) * 2014-04-02 2016-02-15 Level Holding Bv Recuperator, waarvan de warmtewisselkanalen zich dwars op de lengterichting van het huis uitstrekken.
US10458912B2 (en) * 2016-08-31 2019-10-29 Kla-Tencor Corporation Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity
CN108194777A (zh) * 2017-12-28 2018-06-22 长春禹衡光学有限公司 一种光栅尺的安装装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5283434A (en) * 1991-12-20 1994-02-01 Canon Kabushiki Kaisha Displacement detecting device with integral optics
CN101276155A (zh) * 2007-03-29 2008-10-01 Asml荷兰有限公司 测量系统、光刻设备和测量方法
CN101581347A (zh) * 2009-06-23 2009-11-18 上海微电子装备有限公司 减振支撑装置及采用该减振支撑装置的光刻机
CN101989050A (zh) * 2009-07-31 2011-03-23 Asml荷兰有限公司 定位系统、光刻设备和方法
CN104749904A (zh) * 2013-12-31 2015-07-01 上海微电子装备有限公司 物镜支撑装置及光刻机
CN108801158A (zh) * 2018-08-17 2018-11-13 桂林电子科技大学 一种光栅尺标定装置及标定方法

Also Published As

Publication number Publication date
TW202041831A (zh) 2020-11-16
TWI730566B (zh) 2021-06-11
CN111380464A (zh) 2020-07-07
CN111380464B (zh) 2021-05-07

Similar Documents

Publication Publication Date Title
CN103765315B (zh) 具有各个主动支撑组件的光学成像布置
CN104614137A (zh) 基于静压气浮解耦装置的三分量标准振动台
JP6121524B2 (ja) 複数の計測支持ユニットを有する光学結像装置
KR101860406B1 (ko) 대물 렌즈 지지 장치 및 포토 에칭 기기
WO2020135622A1 (zh) 一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机
CN112228488A (zh) 一种用于国产捷联惯导式航空重力仪的两级减振装置
CN103512493B (zh) 位置测量装置
US8902405B2 (en) Stage apparatus, exposure apparatus and device fabrication method
JP2018109632A (ja) 熱負荷に曝されるスピンドル、ステージ、または部品の受動的位置補償
JP5859156B2 (ja) ステージ制御装置、加工装置、計測装置および露光装置
JP2004165582A (ja) 基板ホルダ、基板トレイ、ステージ装置、及び基板ホルダの製造方法
WO2015080793A1 (en) High bandwidth linear flexure bearing
US10480608B2 (en) Machine vibration isolation
CN204556208U (zh) 基于静压气浮解耦装置的三分量标准振动台
JPS62233537A (ja) 構造物の制振方法
CN111650816B (zh) 柔性连接装置、测量系统及光刻机
CN105372939A (zh) 主基板及其制造方法和光刻机
JP2009079728A (ja) 粘弾性材を用いた動吸振器及び動吸振器を用いた荷電粒子線装置
CN109212706B (zh) 一种物镜主动阻尼器控制方法及物镜主动阻尼器装置
CN116819915B (zh) 一种能够调节轴向参数的投影物镜及曝光设备
CN103817492B (zh) 龙门式可调节测量机加工方法
JP5956921B2 (ja) 動吸振器
KR101523366B1 (ko) 광학거울의 공압시스템에 적용되는 중력보상장치, 중력보상방법 및 그 중력보상장치가 구비된 광학거울의 공압시스템
CN110887861B (zh) 一种多孔柔性泡沫板热膨胀系数测量装置和方法
JP2008146084A (ja) 位置測定および配置方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19906000

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19906000

Country of ref document: EP

Kind code of ref document: A1