WO2020129807A1 - Photosensitive coloring composition, cured product, coloring spacer, and image display apparatus - Google Patents

Photosensitive coloring composition, cured product, coloring spacer, and image display apparatus Download PDF

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Publication number
WO2020129807A1
WO2020129807A1 PCT/JP2019/048708 JP2019048708W WO2020129807A1 WO 2020129807 A1 WO2020129807 A1 WO 2020129807A1 JP 2019048708 W JP2019048708 W JP 2019048708W WO 2020129807 A1 WO2020129807 A1 WO 2020129807A1
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PCT/JP2019/048708
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French (fr)
Japanese (ja)
Inventor
和裕 中谷
善秀 小川
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三菱ケミカル株式会社
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Application filed by 三菱ケミカル株式会社 filed Critical 三菱ケミカル株式会社
Priority to KR1020217008178A priority Critical patent/KR20210105876A/en
Priority to JP2020561357A priority patent/JP7375773B2/en
Priority to CN201980080987.3A priority patent/CN113168094A/en
Publication of WO2020129807A1 publication Critical patent/WO2020129807A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present invention relates to a photosensitive coloring composition and the like.
  • a photosensitive coloring composition that is preferably used for forming a colored spacer or the like in a color filter such as a liquid crystal display, a cured product and a colored spacer obtained by curing the photosensitive coloring composition, and an image including the colored spacer.
  • display device Japanese Patent Application No. 2018-236121 filed with the Japan Patent Office on December 18, 2018, the description, claims, drawings and abstract of the entire contents, and references cited in this specification All or part of the content disclosed in the above is incorporated herein by reference as the disclosure content of the present specification.
  • Liquid crystal display uses the property that the arrangement of liquid crystal molecules is switched by turning on and off the voltage to the liquid crystal.
  • Many members forming the liquid crystal panel are formed by a method using a photosensitive composition, which is represented by photolithography.
  • a so-called spacer which is used to keep the distance between two substrates in a liquid crystal panel constant, can be mentioned.
  • Patent Document 1 describes a method using a spacer having a light shielding property (colored spacer). Further, in Patent Document 2, a specific combination is required in order to obtain a colored spacer that can control a shape and a level difference while securing a light-shielding property and a voltage holding ratio of a liquid crystal and has excellent adhesion to a substrate. It has been proposed to use colored photosensitive compositions containing pigments.
  • Patent Document 3 describes that the mechanical properties at high film thickness can be enhanced by using a specific photopolymerization initiator, and Patent Document 4 uses a specific unsaturated group-containing compound. It is described that the mechanical properties are enhanced.
  • Patent Document 5 describes that by using a coloring composition containing a purple colorant and/or a brown colorant and a specific blue colorant, contamination of the liquid crystal layer by the colorant is reduced. There is.
  • the colored spacers In order to suppress display defects of the liquid crystal display, it is necessary that the colored spacers have low surface roughness and excellent smoothness. As a result of studies by the present inventors, it has been found that it is difficult to obtain a colored spacer having both surface roughness and mechanical properties with the photosensitive colored composition described in Patent Documents 2 and 5.
  • Patent Documents 3 and 4 have no description about colored spacers, and the effect of including a colorant in the spacers was unclear.
  • the present invention has been made in view of the above circumstances, and an object of the present invention is to provide a photosensitive coloring composition capable of forming a colored spacer having excellent surface roughness and mechanical properties.
  • the present inventors as a result of intensive studies to solve the above problems, the total solid content, the content ratio of the colorant within a specific range, also using a specific pigment as a colorant, the content ratio It was found that the above-mentioned problems can be solved by setting the above-mentioned range to a specific range, and the present invention has been completed. That is, the present invention has the following configurations [1] to [9].
  • a photosensitive coloring composition containing (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, and (d) an ethylenically unsaturated compound,
  • the content of the (a) colorant is 2 to 20% by mass based on the total solid content of the photosensitive coloring composition
  • the (a) colorant contains a purple pigment
  • the photosensitive coloring composition wherein the content of the purple pigment in the colorant (a) is 50% by mass or more.
  • the purple pigment is C.I. I. Pigment Violet 29 and C.I. I. Pigment Violet 23.
  • the photosensitive coloring composition according to [1] containing at least one selected from the group consisting of Pigment Violet 23.
  • a photosensitive coloring composition capable of forming a colored spacer having excellent surface roughness and mechanical properties, a cured product, a colored spacer composed of the same, and an image display device including such a colored spacer are provided. Can be provided.
  • (meth)acryl means “acryl and/or methacryl”, and the same applies to “(meth)acrylate” and “(meth)acryloyl”.
  • the "(co)polymer” is meant to include both a homopolymer (copolymer) and a copolymer (copolymer), and "acid (anhydride)", “(anhydrous)... acid” , Both acid and its anhydride are meant to be included.
  • the “acrylic resin” means a (co)polymer containing (meth)acrylic acid and a (co)polymer containing a (meth)acrylic acid ester having a carboxyl group.
  • the term “monomer” is a term corresponding to a so-called high-molecular substance (polymer), and includes not only a narrowly defined monomer (monomer) but also a dimer, a trimer, an oligomer and the like. Is.
  • the “total solid content” means all components other than the solvent contained in the photosensitive coloring composition or the ink described below.
  • the “weight average molecular weight” refers to a polystyrene equivalent weight average molecular weight (Mw) by GPC (gel permeation chromatography).
  • the “amine value” represents an amine value in terms of effective solid content, and is a value represented by the amount of base and the equivalent amount of KOH per 1 g of solid content of the dispersant. Is. The measuring method will be described later.
  • the “acid value” represents an acid value in terms of effective solid content, and is calculated by neutralization titration unless otherwise specified.
  • the photosensitive coloring composition of the present invention is (A) Colorant (b) Alkali-soluble resin (c) Photopolymerization initiator (d) Ethylenically unsaturated compound is contained as an essential component, and if necessary, an adhesion improver such as a silane coupling agent and an interface.
  • each compounding ingredient is used in a state of being dissolved or dispersed in a solvent.
  • the photosensitive coloring composition of the present invention contains (a) a colorant.
  • the (a) colorant By containing the (a) colorant, it is possible to obtain a suitable light-absorbing property, particularly a suitable light-shielding property when used for forming a light-shielding member such as a colored spacer.
  • the content ratio of the (a) colorant is 2 to 20% by mass based on the total solid content.
  • the content ratio of the (a) colorant is not particularly limited as long as it is 2 to 20 mass% in the total solid content, but from the viewpoint of light-shielding property, 3 mass% or more is preferable, and 4 mass% or more is more preferable. It is more preferably 5% by mass or more.
  • it is preferably 18% by mass or less, more preferably 15% by mass or less, further preferably 12% by mass or less, further preferably 10% by mass or less, and particularly preferably 8% by mass or less. ..
  • 3 to 18% by mass is preferable, 3 to 15% by mass is more preferable, 4 to 12% by mass is further preferable, 4 to 10% by mass is further preferable, and 5 to 8% by mass is particularly preferable.
  • a pigment or a dye may be used. Among these, it is preferable to use a pigment from the viewpoint of durability.
  • the (a) colorant contains a purple pigment
  • the content ratio of the purple pigment in the (a) colorant is 50% by mass or more.
  • the dispersion of the pigment in the coating film becomes uniform, so that the solubility in the developing solution during development becomes uniform and the surface roughness becomes good. It is considered to be.
  • the violet pigment has the maximum absorption wavelength of the absorption peak in the vicinity of the wavelength of 500 to 600 nm in the absorption spectrum, it is effective in that the optical density (OD) can be easily increased by including the violet pigment.
  • C.I. I. Pigment Violet 1 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50 can be mentioned.
  • C.I. I. Pigment Violet 19, 23, 29, more preferably C.I. I. Pigment Violet 23, 29 can be mentioned.
  • C.I. I. Pigment Violet 29 is preferably used.
  • the content of the purple pigment in the colorant (a) is not particularly limited as long as it is 50% by mass or more, but from the viewpoint of improving the surface roughness, 55% by mass or more is preferable, 58% by mass or more is more preferable, and 60% by mass or more. Mass% or more is more preferable, 62 mass% or more is still more preferable, and 65 mass% or more is especially preferable. On the other hand, 90% by mass or less is preferable, 80% by mass or less is more preferable, and 75% by mass or less is still more preferable, from the viewpoint of widening the absorption wavelength band by utilizing the optical characteristics of the colorant other than the purple pigment.
  • it is preferably 50 to 90% by mass, more preferably 55 to 90% by mass, further preferably 58 to 80% by mass, further preferably 60 to 80% by mass, particularly preferably 62 to 75% by mass, and 65 to 75%. Mass% is especially preferred.
  • the content ratio of Pigment Violet 29 is not particularly limited, but from the viewpoint of surface roughness and light resistance factory, it is preferably 50% by mass or more, more preferably 55% by mass or more, further preferably 60% by mass or more, and 62% by mass. The above is more preferable, and 65% by mass or more is particularly preferable.
  • it is preferably 50 to 90% by mass, more preferably 55 to 90% by mass, further preferably 58 to 80% by mass, further preferably 60 to 80% by mass, particularly preferably 62 to 75% by mass, and 65 to 75%. Mass% is especially preferred.
  • the colorant may include a colorant other than the purple pigment (hereinafter abbreviated as “other colorant”).
  • other colorants include pigments and dyes. From the viewpoint of heat resistance, pigments are preferable, and from the viewpoints of color tone, photocurability and sensitivity, organic pigments are preferable.
  • the pigment examples include organic coloring pigments such as yellow pigments, orange pigments, red pigments, blue pigments, green pigments and brown pigments.
  • Examples of the yellow pigment include C.I. I. Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35:1, 36, 36: 1, 37, 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62:1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166
  • C.I. I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185, and C.I. I. Pigment Yellow 138, 139, and 150 are more preferable, and C.I. I. Pigment Yellow 139 is particularly preferable.
  • C.I. I. Pigment Orange 1 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79.
  • C.I. I. Pigment Orange 13, 43, 64, 72 is preferable, and when the photosensitive coloring composition is cured by ultraviolet rays, it is preferable to use an orange pigment having a low ultraviolet absorption rate.
  • C. I. Pigment Orange 64, 72 is more preferable, and C.I. I. Pigment Orange 64 is particularly preferable.
  • C.I. I. Pigment Red 177, 254, 272 is preferable, and when the photosensitive coloring composition is cured with ultraviolet rays, it is preferable to use a red pigment having a low ultraviolet absorption rate.
  • I. Pigment Red 254 and 272 are more preferably used.
  • blue pigments examples include C.I. I. Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56:1, 60, 61, 61:1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, 79.
  • C.I. I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 60 and more preferably C.I. I. Pigment Blue 15:6, 16 can be mentioned. From the viewpoint of dispersibility and light shielding property, C.I. I.
  • Pigment Blue 15:6, 16, 60 when curing the photosensitive coloring composition with ultraviolet rays, it is preferable to use a blue pigment having a low ultraviolet absorption rate.
  • C. I. It is more preferable to use Pigment Blue 60.
  • C.I. I. Pigment Blue 16 is preferably used.
  • C.I. I. Pigment Green 1 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55, 58.
  • C.I. I. Pigment Green 7, 36 can be mentioned.
  • C.I. I. Pigment Brown 23, 25, 26, 28, 38, 41, 83, 93 As the brown pigment (brown pigment), C.I. I. Pigment Brown 23, 25, 26, 28, 38, 41, 83, 93.
  • C.I. I. Pigment Brown 26, 28, 83, 93 From the viewpoint of achieving both near-infrared transparency and light-shielding properties, C.I. I. Pigment Brown 26, 28, 83, 93.
  • the orange pigment is preferable because it has an absorption band near a wavelength of 400 to 500 nm, which is different from the absorption band of the purple pigment.
  • the content of the orange pigment in the (a) colorant is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 20% by mass or more, and 30% by mass. The above is particularly preferable, 50% by mass or less is preferable, 45% by mass or less is more preferable, 40% by mass or less is further preferable, and 35% by mass or less is particularly preferable.
  • the optical density (OD) tends to be high, and when it is at most the upper limit, the surface roughness tends to be good.
  • the content ratio of the orange pigment in the (a) colorant is preferably 50% by mass or less, and 40% by mass. The following is more preferable, 30% by mass or less is further preferable, 20% by mass or less is further preferable, 10% by mass or less is particularly preferable, and 0% by mass is most preferable.
  • the content ratio of the blue pigment in the (a) colorant is preferably 50% by mass or less, more preferably 40% by mass or less, and 30% by mass. % Or less is more preferable, 20% by mass or less is still more preferable, 10% by mass or less is particularly preferable, and 0% by mass is most preferable.
  • C.I. I When CI Pigment Blue 60 is contained, the surface roughness tends to deteriorate, so that C.I. I.
  • the content ratio of Pigment Blue 60 is preferably 50% by mass or less, more preferably 40% by mass or less, further preferably 30% by mass or less, further preferably 20% by mass or less, particularly preferably 10% by mass or less, and 0% by mass. Is most preferred.
  • a black pigment may be included as another colorant.
  • black pigments include organic black pigments and inorganic black pigments.
  • organic black pigment for example, an organic compound containing at least one selected from the group consisting of a compound represented by the following formula (1), a geometrical isomer of the compound, a salt of the compound, and a salt of the geometrical isomer of the compound. Black pigments may be mentioned.
  • R 1 and R 6 are each independently a hydrogen atom, CH 3 , CF 3 , a fluorine atom or a chlorine atom;
  • the geometric isomer of the compound represented by the general formula (1) has the following core structure (however, the substituents in the structural formula are omitted), and the trans-trans isomer is probably the most stable. ..
  • the compound represented by the general formula (1) is anionic
  • its charge is any known suitable cation, for example, a metal, organic, inorganic or metal organic cation, specifically, an alkali metal or an alkaline earth metal.
  • the salt is compensated by a transition metal, a primary ammonium, a secondary ammonium, a tertiary ammonium such as trialkylammonium, a quaternary ammonium such as tetraalkylammonium, or an organometallic complex.
  • the geometric isomer of the compound represented by the general formula (1) is anionic, it is preferably the same salt.
  • R 2 , R 4 , R 5 , R 7 , R 9 and R 10 are each independently preferably a hydrogen atom, a fluorine atom or a chlorine atom, and more preferably a hydrogen atom.
  • R 3 and R 8 are preferably each independently a hydrogen atom, NO 2 , OCH 3 , OC 2 H 5 , a bromine atom, a chlorine atom, CH 3 , C 2 H 5 , N(CH 3 ) 2 , N(CH 3 )(C 2 H 5 ), N(C 2 H 5 ) 2 , ⁇ -naphthyl, ⁇ -naphthyl, SO 3 H or SO 3 ⁇ , and more preferably a hydrogen atom or SO 3 H.
  • R 1 and R 6 are each independently preferably a hydrogen atom, CH 3 or CF 3 , and more preferably a hydrogen atom.
  • at least one combination selected from the group consisting of R 1 and R 6 , R 2 and R 7 , R 3 and R 8 , R 4 and R 9 , and R 5 and R 10 is the same, and more preferably R 1 is the same as R 6 , R 2 is the same as R 7 , R 3 is the same as R 8 , R 4 is the same as R 9 , and R 5 is the same as R 10 . It is the same.
  • alkyl group having 1 to 12 carbon atoms examples include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, isobutyl group, tert-butyl group, 2-methylbutyl group, n- Pentyl group, 2-pentyl group, 3-pentyl group, 2,2-dimethylpropyl group, n-hexyl group, heptyl group, n-octyl group, 1,1,3,3-tetramethylbutyl group, 2-ethylhexyl group Group, nonyl group, decyl group, undecyl group or dodecyl group.
  • Examples of the cycloalkyl group having 3 to 12 carbon atoms include cyclopropyl group, cyclopropylmethyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cyclohexylmethyl group, trimethylcyclohexyl group, tsudyl group, norbornyl group, bornyl group and norcalyl group.
  • alkenyl group having 2 to 12 carbon atoms examples include vinyl group, allyl group, 2-propen-2-yl group, 2-buten-1-yl group, 3-buten-1-yl group and 1,3-butadiene.
  • the cycloalkenyl group having 3 to 12 carbon atoms includes, for example, 2-cyclobuten-1-yl group, 2-cyclopenten-1-yl group, 2-cyclohexen-1-yl group, 3-cyclohexen-1-yl group, 2 ,4-cyclohexadiene-1-yl group, 1-p-menthen-8-yl group, 4(10)-tugen-10-yl group, 2-norbornen-1-yl group, 2,5-norbornadiene-1 An -yl group, a 7,7-dimethyl-2,4-norcaradien-3-yl group or a camphenyl group.
  • the alkynyl group having 2 to 12 carbon atoms is, for example, 1-propyn-3-yl group, 1-butyn-4-yl group, 1-pentyn-5-yl group, 2-methyl-3-butyn-2-yl group.
  • the halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • the organic black pigment represented by the general formula (1) is preferably a compound represented by the following general formula (2) and/or a geometrical isomer of the compound.
  • organic black pigment examples include Irgaphor (registered trademark) Black S 0100 CF (manufactured by BASF) under the trade name.
  • This organic black pigment is preferably used after being dispersed by a dispersant, a solvent and a method described later. Further, the presence of the compound represented by the general formula (2) or the sulfonic acid derivative of the geometrical isomer of the compound at the time of dispersion may improve the dispersibility and the storage stability.
  • the organic black pigment from the viewpoint of optical characteristics and reliability, the organic black pigment described in Korean Published Patent No. 10-2018-0052502 and Korean Published Patent No. 10-2018-0052864 are described. It is preferable to use the known organic black pigment.
  • organic black pigments include aniline black, cyanine black, perylene black and the like. Further, carbon black which is an inorganic black pigment may be used. Examples of carbon black include the following carbon blacks.
  • Printex registered trademark; the same applies hereinafter
  • Printex3OP Printex30, Printex30OP, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Printex90, PrintexPrintG, PrintexL, PrintexA, Printex90.
  • RAVEN14 RAVEN15, RAVEN16, RAVEN22, RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN780, RAVEN850, RAVEN890H, RAVEN1000, RAVEN1020, RAVEN1040, RAVEN1060U , RAVEN1080U, RAVEN1170, RAVEN1190U, RAVEN1250, RAVEN1500, RAVEN2000, RAVEN2500U, RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750, RAVEN7000.
  • Carbon black coated with resin may be used.
  • the use of resin-coated carbon black has the effect of improving the adhesion to the glass substrate and the volume resistance value.
  • carbon black coated with a resin for example, carbon black described in Japanese Patent Laid-Open No. 09-71733 can be preferably used.
  • Resin-coated carbon black is preferably used in terms of volume resistance and dielectric constant.
  • the average particle diameter of the pigment is usually 1 ⁇ m or less, preferably 0.5 ⁇ m or less, and more preferably 0.25 ⁇ m or less.
  • the standard of the average particle diameter is the number of pigment particles.
  • the average particle diameter of the pigment is a value obtained from the pigment particle diameter measured by dynamic light scattering (DLS). The particle size is measured by sufficiently diluting the photosensitive coloring composition (usually diluted to prepare a pigment concentration of about 0.005 to 0.2% by mass. However, if there is a concentration recommended by the measuring device, (According to concentration) and measured at 25°C.
  • a dye may be used.
  • the dyes include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes, quinoline dyes, nitro dyes, carbonyl dyes and methine dyes.
  • azo dyes include C.I. I. Acid Yellow 11, C.I. I. Acid Orange 7, C.I. I. Acid Red 37, C.I. I. Acid Red 180, C.I. I. Acid Blue 29, C.I. I. Direct Red 28, C.I. I. Direct Red 83, C.I. I. Direct Yellow 12, C.I. I. Direct Orange 26, C.I. I. Direct Green 28, C.I. I.
  • Direct Green 59 C.I. I. Reactive Yellow 2, C.I. I. Reactive Red 17, C.I. I. Reactive Red 120, C.I. I. Reactive Black 5, C.I. I. Disperse Orange 5, C.I. I. Disperse Red 58, C.I. I. Disperse Blue 165, C.I. I. Basic Blue 41, C.I. I. Basic Red 18, C.I. I. Mordant Red 7, C.I. I. Moldant Yellow 5, C.I. I. Moldant Black 7 and the like can be mentioned.
  • anthraquinone dyes examples include C.I. I. Bat Blue 4, C.I. I. Acid Blue 40, C.I. I. Acid Green 25, C.I. I. Reactive Blue 19, C.I. I. Reactive Blue 49, C.I. I. Disperse Red 60, C.I. I. Disperse Blue 56, C.I. I. Examples include Disperse Blue 60 and the like.
  • phthalocyanine dyes such as C.I. I. Pad Blue 5 and the like are quinone imine dyes such as C.I. I. Basic Blue 3, C.I. I. Basic Blue 9 and the like are quinoline dyes such as C.I. I. Solvent Yellow 33, C.I. I. Acid Yellow 3, C.I. I. Disperse Yellow 64 and the like are nitro dyes such as C.I. I. Acid Yellow 1, C.I. I. Acid Orange 3, C.I. I. Examples include Disperse Yellow 42 and the like.
  • the (b) alkali-soluble resin used in the present invention is not particularly limited as long as it is a resin containing a carboxyl group or a hydroxyl group, and examples thereof include epoxy (meth)acrylate resin, acrylic resin, carboxyl group-containing epoxy resin, and carboxyl group-containing resin. Examples thereof include urethane resins, novolac resins, polyvinylphenol resins, and the like. Among them, (b1) epoxy (meth)acrylate resin (b2) acrylic copolymer resin is preferably used from the viewpoint of excellent plate-making property. These may be used alone or in combination of two or more.
  • the (b1) epoxy (meth)acrylate resin is a reaction product of an epoxy resin (epoxy compound) and an ⁇ , ⁇ -unsaturated monocarboxylic acid and/or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group.
  • the polybasic acid and/or its anhydride before reacting the polybasic acid and/or its anhydride with a hydroxyl group, after reacting a compound having two or more substituents capable of reacting with the hydroxyl group, the polybasic acid and/or its anhydride
  • the resin obtained by reacting with is also included in the above (b1) epoxy (meth)acrylate resin.
  • a resin obtained by reacting a compound having a functional group capable of further reacting with a carboxyl group of the resin obtained by the above reaction is also included in the above (b1) epoxy (meth)acrylate resin.
  • the epoxy (meth)acrylate resin does not substantially have an epoxy group in the chemical structure and is not limited to “(meth)acrylate”, but an epoxy compound (epoxy resin) is used as a raw material.
  • (meth)acrylate" is a typical example, and thus is so named in a conventional manner.
  • (b1) epoxy (meth)acrylate-based resin used in the present invention include the following epoxy (meth)acrylate-based resin (b1-1) and/or epoxy (meth)acrylate-based resin (b1-2). (Hereinafter, it may be referred to as a “carboxyl group-containing epoxy (meth)acrylate-based resin”.) is preferably used from the viewpoint of developability and reliability.
  • the epoxy resin includes the raw material compound before forming the resin by thermosetting, and the epoxy resin can be appropriately selected and used from known epoxy resins.
  • the epoxy resin may be a compound obtained by reacting a phenolic compound with epihalohydrin.
  • the phenolic compound is preferably a compound having a divalent or higher valent phenolic hydroxyl group, and may be a monomer or a polymer.
  • the type of epoxy resin used as a raw material includes cresol novolac type epoxy resin, phenol novolac type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, trisphenolmethane type epoxy resin, biphenyl novolac type epoxy resin, naphthalene novolac type.
  • Epoxy resin epoxy resin which is a reaction product of polyaddition reaction product of dicyclopentadiene and phenol or cresol and epihalohydrin, adamantyl group-containing epoxy resin, fluorene type epoxy resin and the like can be preferably used. Those having an aromatic ring in the main chain can be preferably used.
  • the epoxy resin include, for example, bisphenol A type epoxy resin (for example, "jER (registered trademark, the same applies hereinafter)-828", “jER-1001", and “jER-1002” manufactured by Mitsubishi Chemical Corporation. , “JER-1004”, “NER-1302” (epoxy equivalent 323, softening point 76° C.) manufactured by Nippon Kayaku Co., Ltd., bisphenol F type resin (for example, “jER-807” manufactured by Mitsubishi Chemical Corporation, “ jER-4004P”, “jER-4005P”, “jER-4007P”, “NER-7406” (epoxy equivalent 350, softening point 66°C), etc.
  • Cyloxide EHPE an epoxy resin obtained by glycidylating a phenol resin by the reaction of dicyclopentadiene and phenol
  • Epoxy resins represented by (B1) to (B4) and the like can be preferably used.
  • "XD-1000” manufactured by Nippon Kayaku Co., Ltd. as an epoxy resin represented by the following general formula (B2)
  • NC-3000” and epoxy resin represented by the following general formula (B4) include “ESF-300” manufactured by Nippon Steel & Sumitomo Metal Corporation.
  • a is an average value and represents a number from 0 to 10.
  • R 111 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group.
  • a plurality of R 111 existing in one molecule may be the same or different.
  • R 121 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group.
  • a plurality of R 121 present in one molecule may be the same or different.
  • X represents a linking group represented by the following general formula (B3-1) or (B3-2). However, one or more adamantane structures are included in the molecular structure.
  • c represents 2 or 3.
  • R 131 to R 134 and R 135 to R 137 each independently represent an adamantyl group which may have a substituent, a hydrogen atom or a substituent. It represents an alkyl group having 1 to 12 carbon atoms which may have or a phenyl group which may have a substituent. * Represents a bond.
  • p and q each independently represent an integer of 0 to 4
  • R 141 and R 142 each independently represent an alkyl group having 1 to 4 carbon atoms or a halogen atom
  • R 143 and R 144 each independently represent an alkylene group having 1 to 4 carbon atoms
  • x and y each independently represent an integer of 0 or more.
  • Examples of the ⁇ , ⁇ -unsaturated monocarboxylic acid or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group include (meth)acrylic acid, crotonic acid, o-, m- or p-vinylbenzoic acid, (meth ) Acrylic acid ⁇ -position haloalkyl, alkoxyl, halogen, nitro, cyano-substituted monocarboxylic acids, 2-(meth)acryloyloxyethylsuccinic acid, 2-(meth)acryloyloxyethyladipic acid, 2-( (Meth)acryloyloxyethyl phthalic acid, 2-(meth)acryloyloxyethyl hexahydrophthalic acid, 2-(meth)acryloyloxyethyl maleic acid, 2-(meth)acryloyloxypropyl succinic acid, 2-( (Meth)acryloyloxyprop
  • an ⁇ , ⁇ -unsaturated monocarboxylic acid and/or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group As a method for adding an ⁇ , ⁇ -unsaturated monocarboxylic acid and/or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, a known method can be used. For example, in the presence of an esterification catalyst, an ⁇ , ⁇ -unsaturated monocarboxylic acid and/or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group are reacted with an epoxy resin at a temperature of 50 to 150° C. be able to.
  • esterification catalyst used here tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine and benzyldiethylamine, and quaternary ammonium salts such as tetramethylammonium chloride, tetraethylammonium chloride and dodecyltrimethylammonium chloride can be used. ..
  • the epoxy resin, the ⁇ , ⁇ -unsaturated monocarboxylic acid and/or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group, and the esterification catalyst may each be used alone. You may use 2 or more types together.
  • the amount of the ⁇ , ⁇ -unsaturated monocarboxylic acid and/or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group used is in the range of 0.5 to 1.2 equivalents per 1 equivalent of the epoxy group of the epoxy resin. Is preferable, and more preferably in the range of 0.7 to 1.1 equivalents.
  • the amount of the ⁇ , ⁇ -unsaturated monocarboxylic acid and/or ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group is the above lower limit or more, it is possible to suppress insufficient introduction of the unsaturated group, Subsequent reaction with the polybasic acid and/or its anhydride also tends to be satisfactory.
  • the content is not more than the above upper limit, it is possible to suppress the unreacted product of the ⁇ , ⁇ -unsaturated monocarboxylic acid and/or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group, and to improve the curing property. There is a tendency that it is easy to assume.
  • polybasic acid and/or its anhydride examples include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid.
  • examples thereof include one or more selected from acids, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid, and their anhydrides.
  • Particularly preferred is tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic anhydride, or biphenyltetracarboxylic dianhydride.
  • a known method can be used for the addition reaction of the polybasic acid and/or its anhydride.
  • the ⁇ , ⁇ -unsaturated monocarboxylic acid having an ⁇ , ⁇ -unsaturated monocarboxylic acid and/or a carboxyl group on the epoxy resin can be used.
  • the desired product can be obtained by continuing the reaction under the same conditions as the addition reaction of the carboxylic acid ester.
  • the amount of the polybasic acid and/or its anhydride component added is preferably such that the acid value of the resulting carboxyl group-containing epoxy (meth)acrylate resin is in the range of 10 to 150 mgKOH/g. More preferably, it is in the range of about 140 mgKOH/g. When it is at least the lower limit, the alkali developability tends to be good, and when it is at most the upper limit, the curing performance tends to be good.
  • a polyhydric alcohol such as trimethylolpropane, pentaerythritol, or dipentaerythritol may be added during the addition reaction of the polybasic acid and/or its anhydride to introduce a multibranched structure.
  • the carboxyl group-containing epoxy (meth)acrylate-based resin is usually added to the reaction product of the epoxy resin with the ⁇ , ⁇ -unsaturated monocarboxylic acid and/or the ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group.
  • a basic acid and/or an anhydride thereof or in a reaction product of the epoxy resin with an ⁇ , ⁇ -unsaturated monocarboxylic acid and/or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group, It is obtained by mixing the polybasic acid and/or its anhydride and the polyhydric alcohol and then heating.
  • the mixing order of the polybasic acid and/or its anhydride and the polyhydric alcohol is not particularly limited. Any existing in a mixture of a reaction product of an epoxy resin with an ⁇ , ⁇ -unsaturated monocarboxylic acid and/or an ⁇ , ⁇ -unsaturated monocarboxylic acid ester having a carboxyl group and a polyhydric alcohol by heating.
  • the polybasic acid and/or its anhydride reacts with the hydroxyl group of.
  • the polystyrene-equivalent weight average molecular weight (Mw) of the epoxy (meth)acrylate resin measured by gel permeation chromatography (GPC) is usually 1000 or more, preferably 1500 or more, more preferably 2000 or more, more preferably 2500 or more. And usually 10,000 or less, preferably 8000 or less, more preferably 6000 or less, further preferably 5000 or less, and particularly preferably 4000 or less.
  • 1000 to 10000 is preferable
  • 1000 to 8000 is more preferable
  • 1500 to 6000 is further preferable
  • the acid value of the epoxy (meth)acrylate-based resin is not particularly limited, but is preferably 10 mgKOH/g or more, more preferably 20 mgKOH/g or more, and preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, 100 mgKOH/g. g or less is more preferable, and 50 mg KOH/g or less is particularly preferable.
  • 10 to 200 mgKOH/g is preferable
  • 10 to 150 mgKOH/g is more preferable
  • 20 to 100 mgKOH/g is further preferable
  • 20 to 50 mgKOH/g is particularly preferable.
  • the double bond equivalent of the epoxy (meth)acrylate resin is not particularly limited, but is preferably 800 or less, more preferably 700 or less, further preferably 600 or less, further preferably 500 or less, particularly preferably 400 or less, and 300 or less. Is most preferable, 100 or more is preferable, 150 or more is more preferable, 200 or more is further preferable, and 250 or more is particularly preferable. For example, 100 to 800 is preferable, 100 to 700 is more preferable, 150 to 600 is further preferable, 150 to 500 is further preferable, 200 to 400 is particularly preferable, and 250 to 300 is particularly preferable. When it is at most the upper limit, mechanical properties and surface roughness will tend to improve, and when it is at least the lower limit, storage stability will tend to improve.
  • the double bond equivalent of the resin can be calculated from the following formula (x).
  • the chemical structure of the (b1) epoxy (meth)acrylate resin is not particularly limited, but from the viewpoint of curability, an epoxy (meth)acrylate resin (b1-A) having a partial structure represented by the following general formula (i) is used. ) (Hereinafter sometimes abbreviated as “epoxy (meth)acrylate-based resin (b1-A)”) and epoxy (meth)acrylate-based resin (partial structure represented by the following general formula (ii) ( b1-B) (hereinafter sometimes abbreviated as “epoxy (meth)acrylate-based resin (b1-B)”) is preferable. Further, from the viewpoint of reliability, the epoxy (meth)acrylate resin (b1-B) is more preferable.
  • R a represents a hydrogen atom or a methyl group
  • R b represents a divalent hydrocarbon group which may have a substituent.
  • the benzene ring in formula (i) may be further substituted with any substituent. * Represents a bond.
  • each R c independently represents a hydrogen atom or a methyl group.
  • R d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. * Represents a bond.
  • R b represents a divalent hydrocarbon group which may have a substituent.
  • the divalent hydrocarbon group include a divalent aliphatic group, a divalent aromatic ring group, a group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked. Can be mentioned.
  • the divalent aliphatic group may be linear, branched, cyclic, or a combination thereof. Of these, linear ones are preferable from the viewpoint of developing solubility, while cyclic ones are preferable from the viewpoint of developing adhesion.
  • the carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, 1 to 20 is preferable, 3 to 15 is more preferable, and 6 to 10 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
  • divalent linear aliphatic group examples include methylene group, ethylene group, n-propylene group, n-butylene group, n-hexylene group, n-heptylene group and the like. Of these, a methylene group is preferable from the viewpoint of curability.
  • divalent branched chain aliphatic group examples include a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, and an n-butyl group as side chains in addition to the above divalent linear aliphatic group.
  • Examples thereof include a structure having a group, an iso-butyl group, a sec-butyl group, a tert-butyl group and the like.
  • the number of rings contained in the divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more and 2 or more, and usually 10 or less and 5 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, and 2 to 5 is further preferable.
  • divalent cyclic aliphatic group examples include a group obtained by removing two hydrogen atoms from a ring such as a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring and an adamantane ring.
  • a group obtained by removing two hydrogen atoms from an adamantane ring is preferable from the viewpoint of rigidity of the skeleton.
  • Examples of the substituent that the divalent aliphatic group may have include a hydroxyl group; an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a nitro group; a cyano group; a carboxyl group and the like. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
  • examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group.
  • the carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less.
  • 4 to 20 is preferable, 5 to 15 is more preferable, and 6 to 10 is further preferable.
  • the aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring.
  • the divalent aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, which has two free valences.
  • Examples include groups such as a triphenylene ring, an acenaphthene ring, a fluoranthene ring, and a fluorene ring.
  • the aromatic heterocycle in the divalent aromatic heterocyclic group may be a single ring or a condensed ring.
  • the divalent aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, and an indole having two free valences.
  • a pyrazine ring a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cynoline ring, a quinoxaline ring, a phenanthridine ring, a perimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring.
  • a pyrazine ring a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cynoline ring, a quinoxaline ring, a phenanthridine ring, a perimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring.
  • Examples of the substituent that the divalent aromatic ring group may have include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group. From the viewpoint of curability, it is preferably unsubstituted.
  • one or more of the above divalent aliphatic groups and the above divalent aromatic ring groups include groups in which one or more ring groups are linked.
  • the number of divalent aliphatic groups is not particularly limited, but is usually 1 or more and 2 or more, usually 10 or less and 5 or less, and more preferably 3 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable.
  • the number of divalent aromatic ring groups is not particularly limited, but is usually 1 or more and 2 or more, usually 10 or less and 5 or less, and more preferably 3 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable.
  • the curability tends to be good, and when it is at most the upper limit, the curability tends to be good.
  • the benzene ring in formula (i) may be further substituted with any substituent.
  • substituents include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group.
  • the number of substituents is not particularly limited and may be one or two or more. From the viewpoint of curability, it is preferably unsubstituted.
  • the partial structure represented by the general formula (i) is preferably a partial structure represented by the following general formula (i-1) from the viewpoint of curability.
  • R a and R b have the same meaning as in the formula (i).
  • R X represents a hydrogen atom or a polybasic acid residue. * Represents a bond.
  • the benzene ring in formula (i-1) may be further substituted with any substituent.
  • the polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride.
  • polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid.
  • examples thereof include one or more selected from acids, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.
  • the polybasic acid is preferably maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid. Acids, and more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.
  • the partial structure represented by the formula (i-1) contained in one molecule of the epoxy (meth)acrylate resin (b1-A) may be one kind or two or more kinds.
  • R X is a hydrogen atom.
  • R X may be a mixture of polybasic acid residues.
  • the number of partial structures represented by the formula (i) contained in one molecule of the epoxy (meth)acrylate resin (b1-A) is not particularly limited, but is preferably 1 or more, more preferably 3 or more. Moreover, 20 or less is preferable and 15 or less is more preferable. For example, 1 to 20 is preferable, and 3 to 15 is more preferable. When it is at least the lower limit, the curability tends to be good, and when it is at most the upper limit, the developing solubility tends to be good.
  • epoxy (meth)acrylate resin (b1-A) Specific examples of epoxy (meth)acrylate resin (b1-A) are given below.
  • R d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain.
  • the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.
  • the number of rings contained in the aliphatic ring group is not particularly limited, but is usually preferably 1 or more and 2 or more, and is usually 10 or less, 5 or less, and more preferably 3 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable.
  • the carbon number of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 30 or less, further preferably 20 or less, particularly 15 or less. preferable.
  • the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring and an adamantane ring.
  • the adamantane ring is preferable from the viewpoint of reliability.
  • the number of rings that the aromatic ring group has is not particularly limited, but is usually 1 or more, 2 or more, preferably 3 or more, and usually 10 or less, 5 or less, and more preferably 4 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 4 is further preferable, 2 to 4 is further preferable, and 3 to 4 is particularly preferable.
  • the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group.
  • the carbon number of the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, even more preferably 10 or more, particularly preferably 12 or more, and preferably 40 or less, 30 or less. More preferably, 20 or less is further preferable, and 15 or less is particularly preferable. For example, 4 to 40 is preferable, 6 to 30 is more preferable, 8 to 20 is further preferable, 10 to 15 is further preferable, and 12 to 15 is particularly preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
  • aromatic ring in the aromatic ring group benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, tetracene ring, pyrene ring, benzpyrene ring, chrysene ring, triphenylene ring, acenaphthene ring, fluoranthene ring, Examples thereof include a fluorene ring. Among these, a fluorene ring is preferable from the viewpoint of patterning characteristics.
  • the divalent hydrocarbon group in the divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is not particularly limited, but for example, a divalent aliphatic group, a divalent aromatic ring group, or 1 or more. And a group in which one or more divalent aromatic ring groups are linked.
  • the divalent aliphatic group may be linear, branched, cyclic, or a combination thereof. Of these, linear ones are preferable from the viewpoint of compatibility, and cyclic ones are preferable from the viewpoint of reliability.
  • the carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, preferably 25 or less, more preferably 20 or less, and further preferably 15 or less. For example, 1 to 25 is preferable, 3 to 20 is more preferable, and 6 to 15 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
  • divalent linear aliphatic group examples include methylene group, ethylene group, n-propylene group, n-butylene group, n-hexylene group, n-heptylene group and the like. Of these, a methylene group is preferable from the viewpoint of curability.
  • divalent branched chain aliphatic group examples include a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, and an n-butyl group as side chains in addition to the above divalent linear aliphatic group.
  • Examples thereof include a structure having a group, an iso-butyl group, a sec-butyl group, a tert-butyl group and the like.
  • the number of rings contained in the divalent cyclic aliphatic group is not particularly limited, but is usually preferably 1 or more and 2 or more, and is usually 10 or less, 5 or less, and more preferably 3 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable.
  • divalent cyclic aliphatic group examples include a group obtained by removing two hydrogen atoms from a ring such as a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring and an adamantane ring.
  • a group obtained by removing two hydrogen atoms from an adamantane ring is preferable from the viewpoint of reliability.
  • Examples of the substituent that the divalent aliphatic group may have include a hydroxyl group; an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a nitro group; a cyano group; a carboxyl group and the like. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
  • examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group.
  • the carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, preferably 30 or less, more preferably 20 or less, and further preferably 15 or less.
  • 4 to 30 is preferable, 5 to 20 is more preferable, and 6 to 15 is further preferable.
  • the aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring.
  • the divalent aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, each having two free valences.
  • Examples include groups such as a triphenylene ring, an acenaphthene ring, a fluoranthene ring, and a fluorene ring.
  • the aromatic heterocycle in the aromatic heterocyclic group may be a single ring or a condensed ring.
  • the divalent aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, and an indole having two free valences.
  • Examples include groups such as a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cynoline ring, a quinoxaline ring, a phenanthridine ring, a perimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring.
  • a benzene ring, a naphthalene ring or a fluorene ring having two free valences is preferable, and a fluorene ring having two free valences is more preferable.
  • Examples of the substituent that the divalent aromatic ring group may have include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group. From the viewpoint of developing solubility and moisture absorption resistance, no substitution is preferable.
  • one or more of the above divalent aliphatic groups and the above divalent aromatic ring groups include groups in which one or more ring groups are linked.
  • the number of divalent aliphatic groups is not particularly limited, but is usually 1 or more and 2 or more, usually 10 or less and 5 or less, and more preferably 3 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable.
  • the number of divalent aromatic ring groups is not particularly limited, but is usually 1 or more and 2 or more, usually 10 or less and 5 or less, and more preferably 3 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable.
  • the group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked include groups represented by the above formulas (iA) to (ie) Are listed. Among these, the group represented by the above formula (iC) is preferable from the viewpoint of reliability.
  • the bonding mode of the cyclic hydrocarbon group which is a side chain with respect to these divalent hydrocarbon groups is not particularly limited, but for example, one hydrogen atom of an aliphatic group or an aromatic ring group is substituted with the side chain. And a mode in which a cyclic hydrocarbon group that is a side chain is configured to include one of the carbon atoms of the aliphatic group.
  • the partial structure represented by the formula (ii) is preferably a partial structure represented by the following formula (ii-1) from the viewpoint of compatibility.
  • R c has the same meaning as the above formula (ii).
  • R ⁇ represents a monovalent cyclic hydrocarbon group which may have a substituent.
  • n is an integer of 1 or more. * Represents a bond.
  • the benzene ring in formula (ii-1) may be further substituted with any substituent.
  • R ⁇ represents a monovalent cyclic hydrocarbon group which may have a substituent.
  • the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.
  • the number of rings contained in the aliphatic ring group is not particularly limited, but is usually 1 or more and 2 or more, and usually 6 or less, 4 or less, and more preferably 3 or less.
  • 1 to 6 is preferable, 1 to 4 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable.
  • the number of carbon atoms of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 30 or less, further preferably 20 or less, particularly 15 or less. preferable.
  • the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring and an adamantane ring.
  • the adamantane ring is preferable from the viewpoint of compatibility.
  • the number of rings contained in the aromatic ring group is not particularly limited, but is usually 1 or more, 2 or more, preferably 3 or more, and usually 10 or less, 5 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 2 to 5 is further preferable, and 3 to 5 is even more preferable.
  • the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group.
  • the carbon number of the aromatic ring group is usually 4 or more, preferably 5 or more, more preferably 6 or more, and , 30 or less are preferred, 20 or less are more preferred, and 15 or less are even more preferred.
  • 4 to 30 is preferable, 5 to 20 is more preferable, and 6 to 15 is further preferable.
  • the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring and the like. Among these, a fluorene ring is preferable from the viewpoint of reliability.
  • Examples of the substituent that the cyclic hydrocarbon group may have include a hydroxyl group, a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, Examples thereof include an alkyl group having 1 to 5 carbon atoms such as amyl group and iso-amyl group; an alkoxy group having 1 to 5 carbon atoms such as methoxy group and ethoxy group; nitro group; cyano group; and carboxyl group. From the viewpoint of ease of synthesis, unsubstituted is preferable.
  • N represents an integer of 1 or more, preferably 2 or more, and preferably 3 or less. For example, 1 to 1 is preferable, and 2 to 3 is more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
  • R ⁇ is preferably a monovalent aliphatic ring group, and more preferably an adamantyl group.
  • the benzene ring in formula (ii-1) may be further substituted with any substituent.
  • substituents include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group.
  • the number of substituents is not particularly limited and may be one or two or more. From the viewpoint of patterning characteristics, it is preferably unsubstituted.
  • partial structure represented by the formula (ii) is preferably a partial structure represented by the following formula (ii-2) from the viewpoint of reliability.
  • R c has the same meaning as the above formula (ii).
  • R ⁇ represents a divalent cyclic hydrocarbon group which may have a substituent. * Represents a bond.
  • the benzene ring in formula (ii-2) may be further substituted with any substituent.
  • R ⁇ represents a divalent cyclic hydrocarbon group which may have a substituent.
  • the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.
  • the number of rings contained in the aliphatic ring group is not particularly limited, but is usually preferably 1 or more and 2 or more, and is usually 10 or less and 5 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, and 2 to 5 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
  • the carbon number of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 35 or less, and further preferably 30 or less. For example, 4 to 40 is preferable, 6 to 35 is more preferable, and 8 to 30 is further preferable.
  • the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring and the like.
  • the adamantane ring is preferable from the viewpoint of compatibility.
  • the number of rings contained in the aromatic ring group is not particularly limited, but is usually 1 or more, 2 or more, preferably 3 or more, and usually 10 or less, 5 or less.
  • 1 to 10 is preferable, 1 to 5 is more preferable, 2 to 5 is further preferable, and 3 to 5 is even more preferable.
  • the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group.
  • the aromatic ring group usually has 4 or more carbon atoms, preferably 6 or more carbon atoms, more preferably 8 or more carbon atoms.
  • the above is more preferable, 40 or less is preferable, 30 or less is more preferable, 20 or less is further preferable, and 15 or less is particularly preferable.
  • 4 to 40 is preferable, 6 to 30 is more preferable, 8 to 20 is further preferable, and 10 to 15 is particularly preferable.
  • the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring and the like.
  • a fluorene ring is preferable from the viewpoint of reliability.
  • Examples of the substituent that the cyclic hydrocarbon group may have include a hydroxyl group, a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, Examples thereof include an alkyl group having 1 to 5 carbon atoms such as amyl group and iso-amyl group; an alkoxy group having 1 to 5 carbon atoms such as methoxy group and ethoxy group; nitro group; cyano group; and carboxyl group. From the viewpoint of ease of synthesis, unsubstituted is preferable.
  • R ⁇ is preferably a divalent aliphatic ring group, and more preferably a divalent adamantane ring group.
  • R ⁇ is preferably a divalent aromatic ring group, and more preferably a divalent fluorene ring group.
  • the benzene ring in formula (ii-2) may be further substituted with any substituent.
  • substituents include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group.
  • the number of substituents is not particularly limited and may be one or two or more.
  • the two benzene rings in formula (ii-2) may be linked via these substituents. From the viewpoint of patterning characteristics, it is preferably unsubstituted.
  • the partial structure represented by the formula (ii) is preferably a partial structure represented by the following formula (ii-3) from the viewpoint of compatibility.
  • R c and R d have the same meaning as in the formula (ii).
  • R Z represents a hydrogen atom or a polybasic acid residue.
  • the polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Further, another OH group may be removed and shared with R Z in another molecule represented by the formula (ii-3), that is, a plurality of formula (ii-3 may be introduced via R Z. ) May be linked.
  • polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid.
  • Examples thereof include one or more selected from acids, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.
  • the polybasic acid is preferably maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid. Acids, and more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.
  • the partial structure represented by the formula (ii-3) contained in one molecule of the epoxy (meth)acrylate resin (b1-B) may be one kind or two or more kinds, for example, R X is a hydrogen atom. And those having R Z as a polybasic acid residue may be mixed.
  • the number of partial structures represented by the formula (ii) contained in one molecule of the epoxy (meth)acrylate resin (b1-B) is not particularly limited, but is preferably 1 or more, more preferably 3 or more. Further, 20 or less is preferable, 15 or less is more preferable, and 10 or less is further preferable. For example, 1 to 20 is preferable, 1 to 15 is more preferable, 3 to 15 is more preferable, 3 to 10 is even more preferable. When it is at least the lower limit, the curability tends to be good, and when it is at most the upper limit, the developing solubility tends to be good.
  • (b) alkali-soluble resin it is preferable to use (b2) an acrylic copolymer resin from the viewpoint of compatibility with a colorant, a dispersant and the like.
  • the (b2) acrylic copolymer resin is not particularly limited as long as it is an acrylic copolymer resin containing a carboxyl group or a hydroxyl group, but it is preferable that the side chain has an ethylenically unsaturated group. By having an ethylenically unsaturated group, it is less likely that film loss due to an alkali developer will occur during development due to photocuring by exposure, and the surface roughness tends to be good.
  • the partial structure containing the side chain having an ethylenically unsaturated group is not particularly limited, but the emission of radicals accompanying the flexibility of the film From the viewpoint of ease, for example, it is preferable to have a partial structure represented by the following general formula (I).
  • R 1 and R 2 each independently represent a hydrogen atom or a methyl group. * Represents a bond. )
  • the partial structure represented by the above formula (I) is preferable from the viewpoint of sensitivity and alkali developability.
  • R 1 and R 2 each independently represent a hydrogen atom or a methyl group.
  • R X represents a hydrogen atom or a polybasic acid residue.
  • the polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride.
  • polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid.
  • examples thereof include one or more selected from acids, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.
  • maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid are preferable from the viewpoint of patterning characteristics, and more preferable.
  • tetrahydrophthalic acid and biphenyltetracarboxylic acid are preferable from the viewpoint of patterning characteristics, and more preferable.
  • the content ratio is not particularly limited, but is preferably 10 mol% or more, more preferably 30 mol% or more, and 50 mol%.
  • the above is more preferable, 70 mol% or more is still more preferable, 80 mol% or more is particularly preferable, 98 mol% or less is preferable, and 95 mol% or less is more preferable.
  • 10 to 98 mol% is preferable, 30 to 98 mol% is more preferable, 50 to 98 mol% is further preferable, 70 to 98 mol% is further preferable, and 80 to 95 mol% is particularly preferable.
  • it is at least the lower limit mechanical properties tend to be improved, and when it is at most the upper limit, residues tend to be reduced.
  • the content ratio thereof is not particularly limited, but is preferably 10 mol% or more, more preferably 30 mol% or more, and 50 It is more preferably at least mol%, further preferably at least 70 mol%, particularly preferably at least 80 mol%, preferably at most 98 mol%, more preferably at most 95 mol%.
  • 10 to 98 mol% is preferable, 30 to 98 mol% is more preferable, 50 to 98 mol% is further preferable, 70 to 98 mol% is further preferable, and 80 to 95 mol% is particularly preferable.
  • the alkali developability and mechanical properties tend to be good, and when it is at most the upper limit, the surface roughness is improved and the residue tends to be reduced.
  • R 3 represents a hydrogen atom or a methyl group
  • R 4 represents an alkyl group which may have a substituent, an aromatic ring group which may have a substituent, or a substituent.
  • R 4 represents an alkyl group which may have a substituent, an aromatic ring group which may have a substituent, or an alkenyl group which may have a substituent. ..
  • alkyl group for R 4 include linear, branched or cyclic alkyl groups.
  • the carbon number is preferably 1 or more, more preferably 3 or more, further preferably 5 or more, particularly preferably 8 or more, and preferably 20 or less, more preferably 18 or less, further preferably 16 or less, and 14 or less. Even more preferable, and 12 or less are particularly preferable.
  • 1 to 20 is preferable, 1 to 18 is more preferable, 3 to 16 is further preferable, 5 to 14 is further preferable, and 8 to 12 is particularly preferable.
  • the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • the alkyl group examples include a methyl group, an ethyl group, a cyclohexyl group, a dicyclopentanyl group, a dodecanyl group and the like.
  • a dicyclopentanyl group or a dodecanyl group is preferable, and a dicyclopentanyl group is more preferable, from the viewpoint of developability.
  • the substituent that the alkyl group may have is a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, an oligoethylene glycol group, a phenyl group, a carboxyl group.
  • An acryloyl group, a methacryloyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
  • Examples of the aromatic ring group for R 4 include a monovalent aromatic hydrocarbon ring group and a monovalent aromatic heterocyclic group.
  • the carbon number is preferably 6 or more, more preferably 24 or less, more preferably 22 or less, further preferably 20 or less, particularly preferably 18 or less.
  • 6 to 24 is preferable, 6 to 22 is more preferable, 6 to 20 is further preferable, and 6 to 18 is particularly preferable.
  • the aromatic hydrocarbon ring in the aromatic hydrocarbon ring group may be a single ring or a condensed ring, and examples thereof include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, and a pyrene. Examples thereof include a ring, a benzpyrene ring, a chrysene ring, a triphenylene ring, an acenaphthene ring, a fluoranthene ring and a fluorene ring.
  • the aromatic heterocyclic group in the aromatic heterocyclic group may be a single ring or a condensed ring, and examples thereof include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring and a pyrazole ring.
  • a benzene ring or a naphthalene ring is preferable, and a benzene ring is more preferable, from the viewpoint of developability.
  • the substituent which the aromatic ring group may have, a methyl group, an ethyl group, a propyl group, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group , An oligoethylene glycol group, a phenyl group, a carboxyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
  • the alkenyl group for R 4 includes a linear, branched or cyclic alkenyl group.
  • the carbon number is preferably 2 or more, more preferably 22 or less, more preferably 20 or less, further preferably 18 or less, even more preferably 16 or less, and particularly preferably 14 or less.
  • 2 to 22 is preferable, 2 to 20 is more preferable, 2 to 18 is further preferable, 2 to 16 is even more preferable, and 2 to 14 is particularly preferable.
  • the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • the substituent which the alkenyl group may have includes a methyl group, an ethyl group, a propyl group, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, and an oligo group.
  • Examples thereof include an ethylene glycol group, a phenyl group and a carboxyl group. From the viewpoint of developability, a hydroxy group and an oligoethylene glycol group are preferable.
  • R 4 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkenyl group which may have a substituent. From the viewpoint of developability and film strength, an alkyl group or alkenyl is preferable, and an alkyl group is more preferable.
  • the content ratio thereof is not particularly limited, but is preferably 0.1 mol% or more, and more preferably 0.5 mol% or more. 1 mol% or more is more preferable, 70 mol% or less is preferable, 50 mol% or less is more preferable, 30 mol% or less is further preferable, and 10 mol% or less is particularly preferable. For example, 0.1 to 70 mol% is preferable, 0.1 to 50 mol% is more preferable, 0.5 to 30 mol% is further preferable, and 1 to 10 mol% is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • R 5 represents a hydrogen atom or a methyl group
  • R 6 has an alkyl group which may have a substituent, an alkenyl group which may have a substituent, and a substituent.
  • Optionally represents an alkynyl group, a hydroxyl group, a carboxyl group, a halogen atom, an alkoxy group which may have a substituent, a thiol group, or an alkylsulfide group which may have a substituent.
  • t represents an integer of 0 to 5.
  • R 6 is an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, a hydroxyl group, a carboxyl group. Represents a halogen atom, an alkoxy group which may have a substituent, a thiol group, or an alkylsulfide group which may have a substituent.
  • alkyl group for R 6 include linear, branched or cyclic alkyl groups.
  • the number of carbon atoms is preferably 1 or more, more preferably 3 or more, further preferably 5 or more, preferably 20 or less, more preferably 18 or less, further preferably 16 or less, still more preferably 14 or less, and 12 or less. Is particularly preferable. For example, 1 to 20 is preferable, 3 to 18 is more preferable, 3 to 16 is further preferable, 5 to 14 is further preferable, and 5 to 12 is particularly preferable.
  • the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • alkyl group examples include a methyl group, an ethyl group, a cyclohexyl group, a dicyclopentanyl group, a dodecanyl group and the like.
  • a dicyclopentanyl group or a dodecanyl group is preferable, and a dicyclopentanyl group is more preferable, from the viewpoints of developability and surface roughness.
  • the substituent which the alkyl group may have, methoxy group, ethoxy group, chloro group, bromo group, fluoro group, hydroxy group, amino group, epoxy group, oligoethylene glycol group, phenyl group, carboxyl group , An acryloyl group, a methacryloyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
  • the alkenyl group for R 6 includes a linear, branched or cyclic alkenyl group.
  • the carbon number is preferably 2 or more, more preferably 22 or less, more preferably 20 or less, further preferably 18 or less, even more preferably 16 or less, and particularly preferably 14 or less.
  • 2 to 22 is preferable, 2 to 20 is more preferable, 2 to 18 is further preferable, 2 to 16 is even more preferable, and 2 to 14 is particularly preferable.
  • the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • the substituent which the alkenyl group may have includes a methyl group, an ethyl group, a propyl group, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, and an oligo group.
  • Examples thereof include an ethylene glycol group, a phenyl group and a carboxyl group. From the viewpoint of developability, a hydroxy group and an oligoethylene glycol group are preferable.
  • Examples of the alkynyl group for R 6 include a linear, branched or cyclic alkynyl group.
  • the carbon number is preferably 2 or more, more preferably 22 or less, more preferably 20 or less, further preferably 18 or less, even more preferably 16 or less, and particularly preferably 14 or less.
  • 2 to 22 is preferable, 2 to 20 is more preferable, 2 to 18 is further preferable, 2 to 16 is even more preferable, and 2 to 14 is particularly preferable.
  • the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • the substituent which the alkynyl group may have, a methyl group, an ethyl group, a propyl group, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, an oligo group.
  • substituents which the alkynyl group include an ethylene glycol group, a phenyl group and a carboxyl group. From the viewpoint of developability, a hydroxy group and an oligoethylene glycol group are preferable.
  • halogen atom in R 6 examples include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and among these, a fluorine atom is preferable from the viewpoint of ink repellency.
  • alkoxy group for R 6 examples include linear, branched or cyclic alkoxy groups.
  • the carbon number is preferably 1 or more, preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, even more preferably 14 or less, and particularly preferably 12 or less.
  • 1 to 20 is preferable, 1 to 18 is more preferable, 1 to 16 is further preferable, 1 to 14 is further preferable, and 1 to 12 is particularly preferable.
  • the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • the substituent which the alkoxy group may have, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, an oligoethylene glycol group, a phenyl group, a carboxyl group.
  • An acryloyl group, a methacryloyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
  • alkyl sulfide group for R 6 examples include linear, branched or cyclic alkyl sulfide groups.
  • the carbon number is preferably 1 or more, preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, even more preferably 14 or less, and particularly preferably 12 or less.
  • 1 to 20 is preferable, 1 to 18 is more preferable, 1 to 16 is further preferable, 1 to 14 is further preferable, and 1 to 12 is particularly preferable.
  • the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • the substituent which the alkyl group in the alkyl sulfide group may have is a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, an oligoethylene glycol group, phenyl.
  • a carboxyl group, an acryloyl group, a methacryloyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
  • R 6 is an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, a hydroxyl group, a carboxyl group, a halogen group.
  • An atom, an alkoxy group, a hydroxyalkyl group, a thiol group, or an alkylsulfide group which may have a substituent is represented, and among these, from the viewpoint of developability, a hydroxyl group or a carboxyl group is preferable, and a carboxyl group is more preferable. preferable.
  • t represents an integer of 0 to 5, but t is preferably 0 from the viewpoint of easiness of synthesis.
  • the content ratio thereof is not particularly limited, but is preferably 0.5 mol% or more, more preferably 1 mol% or more, It is more preferably 2 mol% or more. Moreover, 50 mol% or less is preferable, 30 mol% or less is more preferable, 20 mol% or less is further preferable, and 10 mol% or less is more preferable. For example, 0.5 to 50 mol% is preferable, 1 to 30 mol% is more preferable, 1 to 20 mol% is further preferable, and 2 to 10 mol% is more preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
  • R 7 represents a hydrogen atom or a methyl group.
  • the content ratio thereof is not particularly limited, but is preferably 5 mol% or more, more preferably 10 mol% or more, and 20 mol%. % Or more, more preferably 80 mol% or less, further preferably 70 mol% or less, and further preferably 60% mol or less.
  • 5 to 80 mol% is preferable, 10 to 70 mol% is more preferable, and 20 to 60% mol is further preferable.
  • the developability tends to be improved, and when it is at most the upper limit, the surface roughness tends to be improved.
  • the acid value of the (b2) acrylic copolymer resin is not particularly limited, but 10 mgKOH/g or more is preferable, 15 mgKOH/g or more is more preferable, 20 mgKOH/g or more is further preferable, and 150 mgKOH/g or less is preferable. , 120 mgKOH/g or less is more preferable, 100 mgKOH/g or less is still more preferable, and 50 mgKOH/g or less is still more preferable. For example, 10 to 150 mgKOH/g is preferable, 10 to 120 mgKOH/g is more preferable, 15 to 100 mgKOH/g is further preferable, and 20 to 50 mgKOH/g is even more preferable. When it is at least the lower limit, the developability tends to be improved, and when it is at most the upper limit, the surface roughness tends to be improved.
  • the weight average molecular weight (Mw) of the (b2) acrylic copolymer resin is not particularly limited, but is usually 1000 or more, preferably 2000 or more, more preferably 4000 or more, still more preferably 6000 or more, still more preferably 7,000 or more, and particularly preferably. Is 8,000 or more, and is usually 30,000 or less, preferably 20,000 or less, more preferably 15,000 or less, still more preferably 10,000 or less.
  • 1000 to 20000 is preferable, 2000 to 20000 is more preferable, 4000 to 15000 is further preferable, 6000 to 15000 is still more preferable, 7000 to 10000 is particularly preferable, and 8000 to 10000 is particularly preferable.
  • the surface roughness tends to be improved, and when it is at most the upper limit, the developability tends to be good.
  • the double bond equivalent of the acrylic copolymer resin is not particularly limited, but is preferably 500 or less, more preferably 400 or less, further preferably 350 or less, particularly preferably 300 or less, and preferably 100 or more, 150 or more. Is more preferable, 180 or more is further preferable, and 200 or more is particularly preferable. For example, 100 to 500 is preferable, 150 to 400 is more preferable, 180 to 350 is further preferable, and 200 to 300 is particularly preferable. When it is at most the upper limit, mechanical properties and surface roughness will tend to improve, and when it is at least the lower limit, storage stability will tend to improve.
  • (b2) acrylic copolymer resin examples include resins described in JP-A-8-297366 and JP-A-2001-89533.
  • the (c) photopolymerization initiator is a component having a function of directly absorbing light, causing a decomposition reaction or a hydrogen abstraction reaction, and generating a polymerization active radical. If necessary, an addition agent such as a polymerization accelerator (chain transfer agent) or a sensitizing dye may be added and used. Examples of the photopolymerization initiator include metallocene compounds containing a titanocene compound described in JP-A-59-152396 and JP-A-61-151197; JP-A-2000-56118.
  • N-aryl- ⁇ -amino acids such as halomethylated oxadiazole derivatives, halomethyl-s-triazine derivatives, N-phenylglycine and the like described in JP-A-10-39503, N- Radical activators such as aryl- ⁇ -amino acid salts and N-aryl- ⁇ -amino acid esters, ⁇ -aminoalkylphenone derivatives; JP-A 2000-80068, JP-A 2006-36750, etc.
  • the oxime ester compounds described and the like can be mentioned.
  • a hexaarylbiimidazole compound is particularly preferable from the viewpoint of improving mechanical properties and surface roughness.
  • hexaarylbiimidazole compound a hexaarylbiimidazole-based photoradical initiator represented by the following general formula (1-1) and/or the following general formula (1-2) is preferable from the viewpoint of mechanical properties.
  • R 1 to R 3 are each independently an alkyl group having 1 to 4 carbon atoms which may have a substituent, an alkoxy group having 1 to 4 carbon atoms which may have a substituent, or halogen.
  • l, m and n each independently represent an integer of 0-5.
  • the carbon number of the alkyl group of R 1 to R 3 is not particularly limited as long as it is within the range of 1 to 4, but from the viewpoint of mechanical properties, it is preferably 3 or less, more preferably 2 or less.
  • the alkyl group may be chain-shaped or cyclic. Specific examples of the alkyl group include, for example, a methyl group, an ethyl group, a propyl group and an isopropyl group, and among them, a methyl group and an ethyl group are preferable.
  • the alkyl group having 1 to 4 carbon atoms of R 1 to R 3 may have, a monovalent non-metal atomic group group other than hydrogen is used, and a preferable example thereof is a halogen atom (- F, —Br, —Cl, —I), a hydroxyl group and an alkoxy group.
  • a monovalent non-metal atomic group group other than hydrogen is used, and a preferable example thereof is a halogen atom (- F, —Br, —Cl, —I), a hydroxyl group and an alkoxy group.
  • the number of carbon atoms of the alkoxy group of R 1 to R 3 is not particularly limited as long as it is within the range of 1 to 4, but from the viewpoint of increasing the taper angle, it is preferably 3 or less, more preferably 2 or less.
  • the alkyl group portion of the alkoxy group may be linear or cyclic. Specific examples of the alkoxy group include, for example, a methoxy group, an ethoxy group, a propoxy group, an isopropyloxy group and a butoxy group, and among them, a methoxy group and an ethoxy group are preferable.
  • Examples of the substituent which the alkoxy group having 1 to 4 carbon atoms represented by R 1 to R 3 may have include an alkyl group and an alkoxy group, and an alkyl group is preferable.
  • the halogen atom represented by R 1 to R 3 includes, for example, a chlorine atom, an iodine atom, a bromine atom, and a fluorine atom. Among them, a chlorine atom or a fluorine atom is preferable, and a chlorine atom is more preferable, from the viewpoint of easy synthesis. preferable. Among these, from the viewpoint of sensitivity and ease of synthesis, R 1 to R 3 are preferably each independently a halogen atom, and more preferably a chlorine atom.
  • n, n and l each independently represent an integer of 0 to 5, but from the viewpoint of ease of synthesis, at least two of m, n and l are preferably integers of 1 or more, and m, n and l It is more preferable that any two of them are 1 and the other one is 0.
  • Examples of the hexaarylbiimidazole compound represented by the general formula (1-1) and/or the general formula (1-2) include 2,2′-bis(o-chlorophenyl)-4,5,4′, 5'-tetraphenylbiimidazole, 2,2'-bis(o-methylphenyl)-4,5,4',5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl)-4, 4',5,5'-tetra(o,p-dichlorophenyl)biimidazole, 2,2'-bis(o,p-dichlorophenyl)-4,4',5,5'-tetra(o,p-dichlorophenyl) ) Biimidazole, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetra(p-fluorophenyl)biimidazole, 2,2'-bis(
  • a hexaphenylbiimidazole compound is preferable, and a compound in which the o-position of the benzene ring bonded to the 2,2′-position on the imidazole ring is substituted with a methyl group, a methoxy group, or a halogen atom is more preferable. It is preferable that the benzene ring bonded to the 4,4',5,5'-position on the imidazole ring is unsubstituted or substituted with a halogen atom or a methoxy group.
  • the photopolymerization initiator (c) either a hexaarylbiimidazole compound represented by the general formula (1-1) or a hexaarylbiimidazole compound represented by the general formula (1-2) may be used. , And both may be used together. When used in combination, the ratio is not particularly limited.
  • titanocene derivatives include dicyclopentadienyl titanium dichloride, dicyclopentadienyl titanium bisphenyl, dicyclopentadienyl titanium bis(2,3,4,5,6-pentafluorophenyl), and dicyclopentadiene.
  • halomethylated oxadiazole derivatives include 2-trichloromethyl-5-(2'-benzofuryl)-1,3,4-oxadiazole and 2-trichloromethyl-5-[ ⁇ -(2'- Benzofuryl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[ ⁇ -(2′-(6′′-benzofuryl)vinyl)]-1,3,4-oxadiazole, 2-trichloromethyl-5-furyl-1,3,4-oxadiazole and the like can be mentioned.
  • halomethyl-s-triazine derivatives include 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine and 2-(4-methoxynaphthyl)-4,6-bis( Trichloromethyl)-s-triazine, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl) -S-triazine and the like can be mentioned.
  • examples of ⁇ -aminoalkylphenone derivatives include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one and 2-benzyl-2-dimethylamino-1-(4 -Morpholinophenyl)butan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 4-dimethylaminoethylbenzoate, 4-dimethylaminoisoamyl Benzoate, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, 2-ethylhexyl-1,4-dimethylaminobenzoate, 2,5-bis(4-diethylaminobenzal)cyclohexanone, 7-diethylamino-3- Examples include (4-diethylaminobenzoyl)coumarin and 4-(diethylamino)chalcone.
  • Examples of the oxime ester compound include compounds represented by the following general formula (IV).
  • R 21a represents a hydrogen atom, an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent.
  • R 21b represents an arbitrary substituent containing an aromatic ring.
  • R 22a represents an alkanoyl group which may have a substituent or an aryloyl group which may have a substituent.
  • n represents an integer of 0 or 1.
  • the carbon number of the alkyl group in R 21a is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 20 or less, preferably 15 or less, more preferably 10 or less from the viewpoint of solubility in a solvent and sensitivity. Is. For example, 1 to 20 is preferable, 1 to 15 is more preferable, 1 to 10 is further preferable, and 2 to 10 is even more preferable.
  • Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a cyclopentylethyl group, a propyl group and the like.
  • the substituent which the alkyl group may have is an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, 4-(2-methoxy-1-methyl)ethoxy-2-methylphenyl.
  • Examples of the aromatic ring group for R 21a include an aromatic hydrocarbon ring group and an aromatic heterocyclic group.
  • the carbon number of the aromatic ring group is not particularly limited, but is preferably 5 or more from the viewpoint of solubility in the photosensitive coloring composition. Further, from the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, still more preferably 12 or less. For example, 5 to 30 is preferable, 5 to 20 is more preferable, and 5 to 12 is further preferable.
  • aromatic ring group examples include a phenyl group, a naphthyl group, a pyridyl group, a furyl group and the like. Among these, from the viewpoint of developability, a phenyl group or a naphthyl group is preferable, and a phenyl group is more preferable.
  • substituent that the aromatic ring group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, an alkyl group, an alkoxy group, a group in which these substituents are linked, and the like.
  • R 21a is preferably an aromatic ring group which may have a substituent, and more preferably an aromatic ring group having a linked alkoxy group as a substituent. preferable.
  • R 21b is preferably an optionally substituted carbazolyl group, an optionally substituted thioxanthonyl group or an optionally substituted diphenyl sulfide group.
  • an optionally substituted carbazolyl group is preferable from the viewpoint of sensitivity.
  • the carbon number of the alkanoyl group in R 22a is not particularly limited, but is usually 2 or more, preferably 3 or more, and usually 20 or less, preferably 15 or less, more preferably from the viewpoint of solubility in a solvent and sensitivity. It is 10 or less, more preferably 5 or less.
  • 2 to 20 is preferable, 2 to 15 is more preferable, 2 to 10 is further preferable, 2 to 5 is further preferable, and 3 to 5 is particularly preferable.
  • Specific examples of the alkanoyl group include an acetyl group, a propanoyl group and a butanoyl group.
  • Examples of the substituent which the alkanoyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group and an amide group, and from the viewpoint of ease of synthesis, it is unsubstituted. Is preferred.
  • the carbon number of the aryloyl group in R 22a is not particularly limited, but is usually 7 or more, preferably 8 or more, and usually 20 or less, preferably 15 or less, more preferably from the viewpoint of solubility in a solvent and sensitivity. It is 12 or less, more preferably 10 or less. For example, 7 to 20 is preferable, 7 to 15 is more preferable, 7 to 12 is further preferable, and 8 to 12 is even more preferable.
  • Specific examples of the aryloyl group include a benzoyl group and a naphthoyl group.
  • R 22a is preferably an alkanoyl group which may have a substituent, more preferably an unsubstituted alkanoyl group, and further preferably an acetyl group.
  • the initiator described in Japanese Patent Laid-Open No. 2016-133574 is also preferably used from the viewpoint that the contamination of the liquid crystal layer by the colorant is reduced.
  • the photopolymerization initiator may be used alone or in combination of two or more kinds. If necessary, the photopolymerization initiator may be blended with a sensitizing dye or a polymerization accelerator depending on the wavelength of the image exposure light source for the purpose of increasing the sensitivity.
  • the sensitizing dyes include xanthene dyes described in JP-A-4-221958 and JP-A-4-219756, JP-A-3-239703, and JP-A-5-289335.
  • sensitizing dyes containing an amino group
  • compounds having an amino group and a phenyl group in the same molecule Particularly preferred are, for example, 4,4′-dimethylaminobenzophenone, 4,4′-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobenzophenone, 4,4′-diaminobenzophenone, 3,3′-diaminobenzophenone.
  • Benzophenone compounds such as 3,4-diaminobenzophenone; 2-(p-dimethylaminophenyl)benzoxazole, 2-(p-diethylaminophenyl)benzoxazole, 2-(p-dimethylaminophenyl)benzo[4,5 ] Benzoxazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzoxazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-oxazole, 2-(p-dimethylaminophenyl) ) Benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2-(p-diethylaminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)- 1,3,4-thiadiazole, (p-
  • polymerization accelerator examples include aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate, aliphatic amines such as n-butylamine and N-methyldiethanolamine, and mercapto compounds described below.
  • aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate
  • aliphatic amines such as n-butylamine and N-methyldiethanolamine
  • mercapto compounds described below.
  • the polymerization accelerators may be used alone or in combination of two or more.
  • the photosensitive coloring composition of the present invention contains (d) an ethylenically unsaturated compound.
  • the ethylenically unsaturated compound used in the present invention is a compound having at least one ethylenically unsaturated group in the molecule. Specifically, for example, (meth)acrylic acid, (meth)acrylic acid alkyl ester, acrylonitrile, styrene, and a carboxylic acid having one ethylenically unsaturated bond, and a monoester of polyhydric or monohydric alcohol, etc. Can be mentioned.
  • a polyfunctional ethylenic monomer having two or more ethylenically unsaturated groups in one molecule is particularly preferable to use.
  • the number of ethylenically unsaturated groups contained in the polyfunctional ethylenic monomer is not particularly limited, but is usually 2 or more, preferably 4 or more, more preferably 5 or more, and preferably It is 8 or less, more preferably 7 or less.
  • 2 to 8 are preferred
  • 4 to 8 are more preferred
  • 4 to 7 are still more preferred
  • 5 to 7 are even more preferred.
  • polyfunctional ethylenic monomer examples include, for example, an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid; an ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid; an aliphatic polyhydroxy compound, an aromatic polyhydroxy compound.
  • esters obtained by the esterification reaction of a polyvalent hydroxy compound such as a hydroxy compound with an unsaturated carboxylic acid and a polybasic carboxylic acid.
  • ester of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, Acrylic acid esters of aliphatic polyhydroxy compounds such as pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate and glycerol acrylate, and methacrylic acid esters obtained by replacing the acrylates of these exemplified compounds with methacrylates. Similarly, itaconic acid ester replaced with itaconate, crotonic acid ester replaced with clonate, maleic acid ester replaced with maleate, and the like can be mentioned.
  • ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid examples include an acrylic ester and a methacrylic ester of an aromatic polyhydroxy compound such as hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate, and pyrogallol triacrylate. Etc.
  • the ester obtained by the esterification reaction of a polybasic carboxylic acid and an unsaturated carboxylic acid, and a polyvalent hydroxy compound is not necessarily a single substance, but typical representative examples include acrylic acid, phthalic acid, and Examples thereof include condensates of ethylene glycol, acrylic acid, maleic acid, and condensates of diethylene glycol, condensates of methacrylic acid, terephthalic acid and pentaerythritol, condensates of acrylic acid, adipic acid, butanediol and glycerin.
  • polyfunctional ethylenic monomer used in the present invention include reacting a polyisocyanate compound with a hydroxyl group-containing (meth)acrylic acid ester or a polyisocyanate compound with a polyol and a hydroxyl group-containing (meth)acrylic acid ester.
  • urethane (meth)acrylates examples include DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, U-6LPA, U.
  • (meth)acrylic acid alkyl ester as the (d) ethylenically unsaturated compound, and it is more preferable to use dipentaerythritol hexaacrylate. These may be used alone or in combination of two or more.
  • the photosensitive coloring composition of the present invention may contain (e) a solvent.
  • the photosensitive coloring composition of the present invention is usually used (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, and (d) an ethylenically unsaturated compound, and if necessary.
  • Other compounding ingredients are used in a state of being dissolved or dispersed in a solvent.
  • organic solvents are preferable from the viewpoint of dispersibility and coatability.
  • an organic solvent having a boiling point in the range of 100 to 300° C. is preferable, and an organic solvent having a boiling point in the range of 120 to 280° C. is more preferable from the viewpoint of coatability.
  • the boiling point mentioned here means the boiling point at a pressure of 1013.25 hPa, and the same applies to the following boiling points.
  • Examples of such an organic solvent include the following. Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol-t-butyl ether, diethylene glycol monomethyl ether Ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethyl pentanol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoxybutanol, 3-methyl-3-methoxybutanol, triethylene glycol monomethyl Glycol monoalkyl ethers such as ether, triethylene glycol monoethyl ether, tripropylene glycol methyl ether; Glycol dialkyl ethers such
  • acetone Like acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone, methoxymethyl pentanone Ketones; Monohydric or polyhydric alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butanediol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerin, benzyl alcohol; Aliphatic hydrocarbons such as n-pentan
  • Aromatic hydrocarbons such as benzene, toluene, xylene, cumene; Amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl Caprylate, butyl stearate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, 3-methoxypropionic acid Chain or cyclic esters such as butyl and ⁇ -butyrolactone; Alkoxycarboxylic acids such as 3-methoxyprop
  • organic solvents corresponding to the above include mineral spirits, balsol #2, Apco #18 solvent, Apco thinner, socal solvent No. 1 and No. 1 2, Solvesso #150, Shell TS28 solvent, carbitol, ethyl carbitol, butyl carbitol, methyl cellosolve (“cellosolve” is a registered trademark; the same applies hereinafter), ethyl cellosolve, ethyl cellosolve acetate, methyl cellosolve acetate, diglyme (any of them). Product name) etc. These organic solvents may be used alone or in combination of two or more.
  • the organic solvent is preferably an organic solvent having a boiling point of 100 to 200°C, more preferably 120 to 170°C.
  • glycol alkyl ether acetates are preferable because they have a good balance of coating properties, surface tension and the like, and have relatively high solubility of the constituent components in the composition.
  • the glycol alkyl ether acetates may be used alone or in combination with other organic solvents.
  • glycol monoalkyl ethers are particularly preferable.
  • propylene glycol monomethyl ether is particularly preferred because of the solubility of the constituents in the composition.
  • glycol monoalkyl ethers have high polarity, and if the addition amount is too large, the pigment tends to aggregate, and the storage stability such as the viscosity of the photosensitive coloring composition obtained later tends to decrease.
  • the proportion of glycol monoalkyl ethers in the solvent is preferably 5% by mass to 30% by mass, more preferably 5% by mass to 20% by mass.
  • an organic solvent having a boiling point of 150° C. or higher hereinafter sometimes referred to as “high boiling point solvent”
  • high boiling point solvent an organic solvent having a boiling point of 150° C. or higher
  • diethylene glycol mono-n-butyl ether diethylene glycol mono-n-butyl ether acetate
  • diethylene glycol monoethyl ether acetate diethylene glycol monoethyl ether acetate are particularly preferable because of the high effect.
  • the content ratio of the high boiling point solvent in the organic solvent is preferably 3% by mass to 50% by mass, more preferably 5% by mass to 40% by mass, and particularly preferably 5% by mass to 30% by mass.
  • the lower limit value or more for example, there is a tendency that it is possible to prevent the colorant or the like from depositing and solidifying at the tip of the slit nozzle to cause foreign matter defects, and by setting the upper limit value or less, the drying temperature of the composition. It tends to be able to suppress the delay of the cycle time, and to suppress problems such as tact failure in the vacuum drying process and pin marks of prebaking.
  • the high-boiling point solvent having a boiling point of 150° C. or higher may be glycol alkyl ether acetates or glycol alkyl ethers. In this case, a high-boiling point solvent having a boiling point of 150° C. or higher may be contained separately. It doesn't matter.
  • Preferred high boiling point solvents include, for example, among the above-mentioned various solvents, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,6-hexanol diacetate. Examples thereof include acetate and triacetin.
  • the photosensitive coloring composition of the present invention may contain (f) a dispersant for the purpose of finely dispersing (a) the colorant and stabilizing the dispersed state.
  • a dispersant for the purpose of finely dispersing (a) the colorant and stabilizing the dispersed state.
  • a polymer dispersant having a functional group is preferable, and from the viewpoint of dispersion stability, a carboxyl group; a phosphoric acid group; a sulfonic acid group; or their bases; primary, secondary or tertiary.
  • a polymer dispersant having a functional group such as an amino group; a quaternary ammonium salt group; a group derived from a nitrogen-containing heterocycle such as pyridine, pyrimidine, or pyrazine is preferable.
  • a polymeric dispersant having a basic functional group such as a primary, secondary, or tertiary amino group; a quaternary ammonium salt group; a group derived from a nitrogen-containing heterocycle such as pyridine, pyrimidine, or pyrazine disperses the pigment.
  • a basic functional group such as a primary, secondary, or tertiary amino group
  • a quaternary ammonium salt group a group derived from a nitrogen-containing heterocycle such as pyridine, pyrimidine, or pyrazine.
  • polymer dispersant for example, a urethane dispersant, an acrylic dispersant, a polyethyleneimine dispersant, a polyallylamine dispersant, a dispersant comprising a monomer having an amino group and a macromonomer, polyoxyethylene alkyl ether.
  • examples thereof include a system dispersant, a polyoxyethylene diester dispersant, a polyether phosphoric acid dispersant, a polyester phosphoric acid dispersant, a sorbitan aliphatic ester dispersant, and an aliphatic modified polyester dispersant.
  • dispersants include EFKA (registered trademark; manufactured by BASF Corporation), DISPERBYK (registered trademark, manufactured by Big Chemie), DISPARON (registered trademark, manufactured by Kusumoto Kasei Co., Ltd.), and SOLSPERSE under trade names.
  • EFKA registered trademark; manufactured by BASF Corporation
  • DISPERBYK registered trademark, manufactured by Big Chemie
  • DISPARON registered trademark, manufactured by Kusumoto Kasei Co., Ltd.
  • SOLSPERSE SOLSPERSE under trade names.
  • KP manufactured by Shin-Etsu Chemical Co., Ltd.
  • Polyflow manufactured by Kyoeisha Chemical Co., Ltd.
  • Azisper registered trademark, manufactured by Ajinomoto Co., Inc.
  • the weight average molecular weight (Mw) of the polymer dispersant is usually 700 or more, preferably 1000 or more, and usually 100,000 or less, preferably 50,000 or less.
  • Mw weight average molecular weight
  • the (f) dispersant preferably contains a urethane polymer dispersant and/or an acrylic polymer dispersant having a functional group. It is particularly preferable to include.
  • a polymer dispersant having a basic functional group and a polyester bond and/or a polyether bond is preferable.
  • urethane-based and acrylic-based polymer dispersants examples include DISPERBYK160 to 166, 182 series (all are urethane-based), DISPERBYK2000, 2001, BYK-LPN21116 and the like (all are acrylic-based) (all of which are manufactured by Big Chemie). ..
  • a preferable chemical structure as the urethane polymer dispersant for example, a polyisocyanate compound, a compound having one or two hydroxyl groups in the molecule and a number average molecular weight of 300 to 10,000, and the same molecule
  • examples thereof include a dispersion resin having a weight average molecular weight of 1,000 to 200,000 obtained by reacting active hydrogen with a compound having a tertiary amino group.
  • a quaternizing agent such as benzyl chloride, all or part of the tertiary amino group can be converted to a quaternary ammonium base.
  • Examples of the above polyisocyanate compound include paraphenylene diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 4,4′-diphenylmethane diisocyanate, naphthalene-1,5-diisocyanate and tolidine diisocyanate.
  • Aromatic diisocyanates hexamethylene diisocyanates, lysine methyl ester diisocyanates, 2,4,4-trimethylhexamethylene diisocyanates, aliphatic diisocyanates such as dimer acid diisocyanates, isophorone diisocyanates, 4,4′-methylenebis(cyclohexyl isocyanate), ⁇ , ⁇ Aliphatic diisocyanates such as'-diisocyanate dimethylcyclohexane, xylylene diisocyanate, ⁇ , ⁇ , ⁇ ', ⁇ '-tetramethyl xylylene diisocyanate, etc., aliphatic diisocyanates having aromatic rings, lysine ester triisocyanate, 1,6, 11-undecane triisocyanate, 1,8-diisocyanate-4-isocyanatomethyl octane, 1,3,6-hexamethylene triisocyanate, bicycloheptane triis
  • Examples thereof include triisocyanates, trimers thereof, water adducts, and polyol adducts thereof.
  • Preferred as the polyisocyanate are trimers of organic diisocyanates, and most preferred are trimers of tolylene diisocyanate and trimers of isophorone diisocyanate. These may be used alone or in combination of two or more.
  • the above-mentioned polyisocyanates are prepared by using a suitable trimerization catalyst such as tertiary amines, phosphines, alkoxides, metal oxides, carboxylates, etc.
  • a suitable trimerization catalyst such as tertiary amines, phosphines, alkoxides, metal oxides, carboxylates, etc.
  • polyether glycol As the compound having one or two hydroxyl groups in the same molecule and having a number average molecular weight of 300 to 10,000, polyether glycol, polyester glycol, polycarbonate glycol, polyolefin glycol and the like, and one terminal hydroxyl group of these compounds has a carbon number of 1 to 10 Examples thereof include those alkoxylated with 25 alkyl groups and mixtures of two or more of these.
  • polyether glycols include polyether diols, polyether ester diols, and mixtures of two or more thereof.
  • polyether diol those obtained by homopolymerizing or copolymerizing alkylene oxide, for example, polyethylene glycol, polypropylene glycol, polyethylene-propylene glycol, polyoxytetramethylene glycol, polyoxyhexamethylene glycol, polyoxyoctamethylene glycol and those And a mixture of two or more thereof.
  • polyether ester diol examples include those obtained by reacting a mixture with an ether group-containing diol or another glycol with a dicarboxylic acid or an anhydride thereof, or by reacting a polyester glycol with an alkylene oxide, for example, a poly(polyether Oxytetramethylene) adipate and the like.
  • the most preferable polyether glycol is polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol, or a compound in which one end hydroxyl group of these compounds is alkoxylated with an alkyl group having 1 to 25 carbon atoms.
  • polyester glycol dicarboxylic acids (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, phthalic acid, etc.) or their anhydrides and glycols (ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, Dipropylene glycol, tripropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 3-methyl-1,5-pentanediol, neopentyl glycol , 2-methyl-1,3-propanediol, 2-methyl-2-propyl-1,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,5-pentanediol, 1 ,6-hexanediol, 2-methyl-2,4-pentane
  • polylactone diols or polylactone monools obtained by using the above diols or monohydric alcohols having 1 to 25 carbon atoms as an initiator, for example, polycaprolactone glycol, polymethylvalerolactone and the like. Mixtures of two or more may be mentioned.
  • the most preferable polyester glycol is polycaprolactone glycol or polycaprolactone having an alcohol having 1 to 25 carbon atoms as an initiator.
  • Polycarbonate glycols include poly(1,6-hexylene)carbonate and poly(3-methyl-1,5-pentylene)carbonate.
  • Polyolefin glycols include polybutadiene glycol, hydrogenated polybutadiene glycol and hydrogenated polyisoprene glycol. Are listed. These may be used alone or in combination of two or more.
  • the number average molecular weight of the compound having one or two hydroxyl groups in the same molecule is usually 300 to 10000, preferably 500 to 6000, and more preferably 1000 to 4000.
  • active hydrogen that is, a hydrogen atom directly bonded to an oxygen atom, a nitrogen atom or a sulfur atom
  • active hydrogen include a hydrogen atom in a functional group such as a hydroxyl group, an amino group and a thiol group, and among them, an amino group, particularly a primary group.
  • the hydrogen atom of the amino group of is preferred.
  • the tertiary amino group is not particularly limited, and examples thereof include an amino group having an alkyl group having 1 to 4 carbon atoms, or a heterocyclic structure, more specifically, an imidazole ring or a triazole ring.
  • Examples of such compounds having active hydrogen and a tertiary amino group in the same molecule include N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3-propanediamine, N , N-dipropyl-1,3-propanediamine, N,N-dibutyl-1,3-propanediamine, N,N-dimethylethylenediamine, N,N-diethylethylenediamine, N,N-dipropylethylenediamine, N,N -Dibutylethylenediamine, N,N-dimethyl-1,4-butanediamine, N,N-diethyl-1,4-butanediamine, N,N-dipropyl-1
  • examples of the nitrogen-containing heterocycle include a pyrazole ring, an imidazole ring, a triazole ring, a tetrazole ring, an indole ring, a carbazole ring, an indazole ring, a benzimidazole ring and benzo.
  • 5-membered nitrogen-containing hetero ring such as triazole ring, benzoxazole ring, benzothiazole ring and benzothiadiazole ring
  • 6-membered nitrogen-containing hetero ring such as pyridine ring, pyridazine ring, pyrimidine ring, triazine ring, quinoline ring, acridine ring and isoquinoline ring
  • Preferred among these nitrogen-containing heterocycles are imidazole rings and triazole rings.
  • these compounds having an imidazole ring and an amino group include 1-(3-aminopropyl)imidazole, histidine, 2-aminoimidazole, 1-(2-aminoethyl)imidazole and the like.
  • Specific examples of the compound having a triazole ring and an amino group include 3-amino-1,2,4-triazole and 5-(2-amino-5-chlorophenyl)-3-phenyl-1H-1.
  • a preferable mixing ratio of raw materials for producing the urethane-based polymer dispersant is 10-200 with respect to 100 parts by mass of the polyisocyanate compound, a compound having one or two hydroxyl groups in the same molecule and having a number average molecular weight of 300 to 10,000. Parts by mass, preferably 20 to 190 parts by mass, more preferably 30 to 180 parts by mass, 0.2 to 25 parts by mass, preferably 0.3 to 24 parts by mass of a compound having active hydrogen and a tertiary amino group in the same molecule. It is a mass part.
  • the production of the urethane-based polymer dispersant is performed according to a known method for producing a polyurethane resin.
  • the solvent during the production usually, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, ketones such as isophorone, ethyl acetate, butyl acetate, esters such as cellosolve acetate, benzene, toluene, xylene, hexane.
  • Hydrocarbons such as diacetone alcohol, some alcohols such as diacetone alcohol, isopropanol, secondary butanol and tertiary butanol, chlorides such as methylene chloride and chloroform, ethers such as tetrahydrofuran and diethyl ether, dimethylformamide, N-methyl
  • An aprotic polar solvent such as pyrrolidone or dimethyl sulfoxide is used. These may be used alone or in combination of two or more.
  • -Urethanization reaction catalyst is usually used in the above production.
  • the catalyst include tin-based compounds such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin dioctoate and stannas octoate; iron-based compounds such as iron acetylacetonate and ferric chloride; and triethylamine and triethylenediamine. Examples include primary amines. These may be used alone or in combination of two or more.
  • the amount of the compound having active hydrogen and a tertiary amino group introduced in the same molecule is preferably controlled within the range of 1 to 100 mgKOH/g based on the amine value after the reaction. More preferably, it is in the range of 5 to 95 mgKOH/g.
  • the amine value is a value obtained by neutralizing and titrating a basic amino group with an acid and expressing it in mg of KOH corresponding to the acid value. When it is at least the above lower limit, the dispersibility tends to be good, and when it is at most the above upper limit, deterioration of the developability tends to be easily suppressed.
  • the weight average molecular weight (Mw) of the urethane polymer dispersant is usually 1,000 to 200,000, preferably 2,000 to 100,000, and more preferably 3,000 to 50,000.
  • Mw weight average molecular weight
  • an unsaturated group-containing monomer having a functional group (the functional group here is the functional group described above as the functional group contained in the polymer dispersant), It is preferable to use a random copolymer, a graft copolymer, or a block copolymer with an unsaturated group-containing monomer having no functional group. These copolymers can be produced by a known method.
  • Examples of the unsaturated group-containing monomer having a functional group include (meth)acrylic acid, 2-(meth)acryloyloxyethylsuccinic acid, 2-(meth)acryloyloxyethylphthalic acid, and 2-(meth)acryloyl Unsaturated monomers having a carboxyl group such as loyloxyethyl hexahydrophthalic acid and acrylic acid dimer, dimethylaminoethyl (meth)acrylate, diethylaminoethyl (meth)acrylate and tertiary amino groups such as quaternary compounds thereof, Specific examples include unsaturated monomers having a quaternary ammonium salt group. These may be used alone or in combination of two or more.
  • Examples of the unsaturated group-containing monomer having no functional group include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl ( (Meth)acrylate, t-butyl(meth)acrylate, benzyl(meth)acrylate, phenyl(meth)acrylate, cyclohexyl(meth)acrylate, phenoxyethyl(meth)acrylate, phenoxymethyl(meth)acrylate, 2-ethylhexyl(meth) Acrylate, isobornyl (meth)acrylate, tricyclodecane (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, N-vinylpyrrolidone, styrene and its derivatives, ⁇ -methylstyrene, N-cyclo
  • the acrylic polymer dispersant is particularly preferably an AB or BABB block copolymer consisting of an A block having a functional group and a B block having no functional group.
  • a in the block in addition to the partial structure derived from the unsaturated group-containing monomer containing the functional group, a partial structure derived from the unsaturated group-containing monomer containing no functional group may be contained. May be contained in the A block in any form of random copolymerization or block copolymerization.
  • the content of the partial structure containing no functional group in the A block is usually 80% by mass or less, preferably 50% by mass or less, and more preferably 30% by mass or less.
  • the B block is composed of a partial structure derived from an unsaturated group-containing monomer which does not contain the above functional group, but one B block contains partial structures derived from two or more kinds of monomers. Alternatively, these may be contained in the B block in any mode of random copolymerization or block copolymerization.
  • the AB or BAB block copolymer is prepared, for example, by the following living polymerization method.
  • the living polymerization method includes an anionic living polymerization method, a cationic living polymerization method, and a radical living polymerization method. Among them, the anionic living polymerization method has an anion as a polymerization active species, and is represented by the following scheme, for example.
  • Ar 1 is a monovalent organic group
  • Ar 2 is a monovalent organic group different from Ar 1
  • M is a metal atom
  • s and t are each an integer of 1 or more.
  • the polymerization active species is a radical, which is shown in the following scheme, for example.
  • Ar 1 is a monovalent organic group
  • Ar 2 is a monovalent organic group different from Ar 1
  • j and k are each an integer of 1 or more
  • R a is a hydrogen atom or 1 the valence of the organic radical
  • the R b are different hydrogen atom or a monovalent organic group and R a.
  • the acrylic polymer dispersant that can be used in the present invention may be an AB block copolymer or a BAB block copolymer, and the A block constituting the copolymer may be used.
  • the /B block ratio is preferably 1/99 to 80/20, and particularly preferably 5/95 to 60/40 (mass ratio). By setting it within this range, the balance between dispersibility and storage stability can be secured. Tend. Further, the amount of the quaternary ammonium salt group in 1 g of the AB block copolymer or BAB block copolymer that can be used in the present invention is usually preferably 0.1 to 10 mmol. Within the range, good dispersibility tends to be ensured.
  • such a block copolymer may usually contain an amino group generated in the production process, but its amine value is about 1 to 100 mgKOH/g, and from the viewpoint of dispersibility, It is preferably 10 mgKOH/g or more, more preferably 30 mgKOH/g or more, further preferably 50 mgKOH/g or more, preferably 90 mgKOH/g or less, more preferably 80 mgKOH/g or less, and further preferably 75 mgKOH/g or less.
  • 10 to 90 mgKOH/g is preferable, 30 to 80 mgKOH/g is more preferable, and 50 to 75 mgKOH/g is further preferable.
  • the amine value of the dispersant such as the block copolymer is represented by the mass of KOH equivalent to the amount of the base per 1 g of the solid content excluding the solvent in the sample of the dispersant, and is measured by the following method. Precisely weigh 0.5-1.5 g of the dispersant sample in a 100 mL beaker and dissolve with 50 mL acetic acid. Using an automatic titrator equipped with a pH electrode, this solution is subjected to neutralization titration with 0.1 mol/L HClO 4 acetic acid solution. Using the inflection point of the titration pH curve as the end point of titration, the amine value is calculated by the following formula.
  • Amine value [mgKOH/g] (561 ⁇ V)/(W ⁇ S) [However, W: Dispersant sample weight [g], V: Titration amount [mL] at the end point of titration, S: Solid content concentration [mass%] of the dispersant sample. ]
  • the acid value of this block copolymer depends on the presence and type of the acidic group which is the source of the acid value, it is generally preferable that the acid value is low, usually 10 mgKOH/g or less, and its weight average molecular weight (Mw). ) Is preferably in the range of 1000 to 100,000. Within the above range, good dispersibility tends to be ensured.
  • the specific structure of the acrylic polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is represented by the following formula (i). It is preferable to have a repeating unit (hereinafter, may be referred to as “repeating unit (i)”).
  • R 31 to R 33 each independently have a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. It is an optionally substituted aralkyl group, and two or more of R 31 to R 33 may be bonded to each other to form a cyclic structure.
  • R 34 is a hydrogen atom or a methyl group.
  • X is a divalent linking group, and Y ⁇ is a counter anion.
  • the number of carbon atoms of the alkyl group which may have a substituent in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 1 or more, and preferably 10 or less, 6 The following is more preferable. For example, 1 to 10 is preferable, and 1 to 6 is more preferable.
  • Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and the like. Among these, a methyl group, an ethyl group, a propyl group, and a butyl group.
  • a group, a pentyl group, or a hexyl group is preferable, and a methyl group, an ethyl group, a propyl group, or a butyl group is more preferable. Further, it may be linear or branched. It may also contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group.
  • the number of carbon atoms of the optionally substituted aryl group in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 6 or more, and preferably 16 or less, 12 The following is more preferable. For example, 6 to 16 are preferable, and 6 to 12 are more preferable.
  • Specific examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, an anthracenyl group, and the like.
  • a phenyl group a methylphenyl group, an ethylphenyl group , A dimethylphenyl group, or a diethylphenyl group, and more preferably a phenyl group, a methylphenyl group, or an ethylphenyl group.
  • the number of carbon atoms of the aralkyl group which may have a substituent in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 7 or more, and preferably 16 or less, 12 The following is more preferable. For example, 7 to 16 are preferable, and 7 to 12 are more preferable.
  • Specific examples of the aralkyl group include a phenylmethyl group (benzyl group), a phenylethyl group (phenethyl group), a phenylpropyl group, a phenylbutyl group, a phenylisopropyl group and the like.
  • R 31 to R 33 are preferably each independently an alkyl group or an aralkyl group, and specifically, R 31 and R 33 are each independently a methyl group or an ethyl group. It is preferable that R 32 is a group and R 32 is a phenylmethyl group or a phenylethyl group, and it is further preferable that R 31 and R 33 are a methyl group and R 32 is a phenylmethyl group.
  • repeating unit (ii) a repeating unit represented by the following formula (ii) (hereinafter referred to as “repeating unit (ii)”) There is a).
  • R 35 and R 36 each independently have a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. And R 35 and R 36 may be bonded to each other to form a cyclic structure.
  • R 37 is a hydrogen atom or a methyl group.
  • Z is a divalent linking group.
  • alkyl group which may have a substituent in R 35 and R 36 of the above formula (ii) those exemplified as R 31 to R 33 of the above formula (i) are preferably adopted. it can.
  • aryl group which may have a substituent in R 35 and R 36 of the above formula (ii) those exemplified as R 31 to R 33 of the above formula (i) are preferably adopted.
  • aralkyl group which may have a substituent in R 35 and R 36 of the above formula (ii) those exemplified as R 31 to R 33 of the above formula (i) are preferably adopted. it can.
  • R 35 and R 36 are each independently preferably an alkyl group which may have a substituent, and more preferably a methyl group or an ethyl group.
  • the substituent which the alkyl group, aralkyl group or aryl group in R 31 to R 33 of the above formula (i) and R 35 and R 36 of the above formula (ii) may have is a halogen atom, an alkoxy group, Examples thereof include benzoyl group and hydroxyl group.
  • the divalent linking groups X and Z are, for example, an alkylene group having 1 to 10 carbon atoms, an arylene group having 6 to 12 carbon atoms, a —CONH—R 43 — group, —COOR 44 — group (provided that R 43 and R 44 are a single bond, an alkylene group having 1 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms) and the like are preferable. Is a —COO—R 44 — group.
  • examples of Y ⁇ as a counter anion include Cl ⁇ , Br ⁇ , I ⁇ , ClO 4 ⁇ , BF 4 ⁇ , CH 3 COO ⁇ , PF 6 ⁇ and the like.
  • the content ratio of the repeating unit represented by the formula (i) is not particularly limited, but from the viewpoint of dispersibility, it is represented by the content ratio of the repeating unit represented by the formula (i) and the formula (ii). It is preferably 60 mol% or less, more preferably 50 mol% or less, still more preferably 40 mol% or less, and particularly preferably 35 mol% or less, based on the total content of repeating units. , Preferably 5 mol% or more, more preferably 10 mol% or more, further preferably 20 mol% or more, particularly preferably 30 mol% or more.
  • the content ratio of the repeating unit represented by the formula (i) in all the repeating units of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 1 mol% or more, and 5 mol% or more. More preferably, 10 mol% or more is further preferable, 50 mol% or less is preferable, 30 mol% or less is more preferable, 20 mol% or less is further preferable, and 15 mol% or less is particularly preferable. For example, 1 to 50 mol% is preferable, 5 to 30 mol% is more preferable, 5 to 20 mol% is further preferable, and 10 to 15 mol% is particularly preferable.
  • the content ratio of the repeating unit represented by the formula (ii) in all repeating units of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 5 mol% or more, and 10 mol% or more. More preferably, 15 mol% or more is further preferable, 20 mol% or more is particularly preferable, 60 mol% or less is preferable, 40 mol% or less is more preferable, 30 mol% or less is further preferable, and 25 mol% or less is particularly preferable. preferable. For example, 5 to 60 mol% is preferable, 10 to 40 mol% is more preferable, 15 to 30 mol% is further preferable, and 20 to 25 mol% is particularly preferable.
  • the polymer dispersant is a repeating unit represented by the following formula (iii) (hereinafter, “repeating unit (iii)” from the viewpoint of increasing compatibility with a binder component such as a solvent and improving dispersion stability. It may be said that it has ".
  • R 40 is an ethylene group or a propylene group
  • R 41 is an alkyl group which may have a substituent
  • R 42 is a hydrogen atom or a methyl group.
  • n is an integer of 1 to 20.
  • the number of carbon atoms of the alkyl group which may have a substituent in R 41 of the above formula (iii) is not particularly limited, but is usually 1 or more, preferably 2 or more, and preferably 10 or less, and 6 or less. Is more preferable. For example, 1 to 10 is preferable, 1 to 6 is more preferable, and 2 to 6 is further preferable.
  • Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and the like.
  • a methyl group, an ethyl group, a propyl group, and a butyl group a group, a pentyl group, or a hexyl group is preferable, and a methyl group, an ethyl group, a propyl group, or a butyl group is more preferable. Further, it may be linear or branched. It may also contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group.
  • n in the above formula (iii) is preferably 1 or more, more preferably 2 or more, more preferably 10 or less, and more preferably 5 or less, from the viewpoint of compatibility and dispersibility with a binder component such as a solvent.
  • a binder component such as a solvent.
  • 1 to 10 is preferable, 1 to 5 is more preferable, and 2 to 5 is further preferable.
  • the content of the repeating unit represented by the formula (iii) in all repeating units of the polymer dispersant is not particularly limited, but is preferably 1 mol% or more, more preferably 2 mol% or more, and 4 mol%.
  • the above is more preferable, 30 mol% or less is preferable, 20 mol% or less is more preferable, and 10 mol% or less is further preferable.
  • 1 to 30 mol% is preferable, 2 to 20 mol% is more preferable, and 4 to 10 mol% is further preferable.
  • compatibility with a binder component such as a solvent and dispersion stability tend to be compatible.
  • the polymer dispersant is a repeating unit represented by the following formula (iv) (hereinafter, referred to as "repeating unit (iv)" from the viewpoint of increasing the compatibility of the dispersant with a binder component such as a solvent and improving the dispersion stability. )” in some cases.).
  • R 38 is an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent.
  • R 39 is a hydrogen atom or a methyl group.
  • the number of carbon atoms of the alkyl group which may have a substituent in R 38 of the above formula (iv) is not particularly limited, but is usually 1 or more, preferably 2 or more, and preferably 4 or more. More preferably, it is preferably 10 or less, and more preferably 8 or less. For example, 1 to 10 is preferable, 1 to 8 is more preferable, 2 to 8 is further preferable, and 4 to 8 is even more preferable.
  • Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and the like.
  • a methyl group, an ethyl group, a propyl group, and a butyl group a group, a pentyl group, or a hexyl group is preferable, and a methyl group, an ethyl group, a propyl group, or a butyl group is more preferable. Further, it may be linear or branched. It may also contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group.
  • the number of carbon atoms of the aryl group which may have a substituent in R 38 of the above formula (iv) is not particularly limited, but is usually 6 or more, and is preferably 16 or less, more preferably 12 or less, and 8 The following are more preferable. For example, 6 to 16 is preferable, 6 to 12 is more preferable, and 6 to 8 is further preferable.
  • Specific examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, an anthracenyl group, and the like.
  • a phenyl group a methylphenyl group, an ethylphenyl group , A dimethylphenyl group, or a diethylphenyl group, and more preferably a phenyl group, a methylphenyl group, or an ethylphenyl group.
  • the number of carbon atoms of the aralkyl group which may have a substituent in R 38 of the above formula (iv) is not particularly limited, but is usually 7 or more, and preferably 16 or less, and 12 or less. More preferably, it is more preferably 10 or less. For example, 7 to 16 are preferable, 7 to 12 are more preferable, and 7 to 10 are further preferable.
  • Specific examples of the aralkyl group include a phenylmethyl group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, a phenylisopropyl group, and the like.
  • a phenylmethyl group a phenylethyl group, a phenylpropyl group, or a phenyl group. It is preferably a butyl group, and more preferably a phenylmethyl group or a phenylethyl group.
  • R 38 is preferably an alkyl group or an aralkyl group, and more preferably a methyl group, an ethyl group or a phenylmethyl group.
  • substituent which the alkyl group may have in R 38 include a halogen atom and an alkoxy group.
  • the substituent that the aryl group or aralkyl group may have include a chain alkyl group, a halogen atom and an alkoxy group.
  • the chain alkyl group represented by R 38 includes both straight chain and branched chain groups.
  • the content of the repeating unit represented by the formula (iv) in all repeating units of the polymer dispersant is preferably 30 mol% or more, more preferably 40 mol% or more, and 50 It is more preferably at least mol%, preferably at most 80 mol%, more preferably at most 70 mol%.
  • 30 to 80 mol% is preferable, 40 to 80 mol% is more preferable, and 50 to 70 mol% or more is further preferable.
  • the polymer dispersant may have a repeating unit other than the repeating unit (i), the repeating unit (ii), the repeating unit (iii) and the repeating unit (iv).
  • repeating units include styrene-based monomers such as styrene and ⁇ -methylstyrene; (meth)acrylate-based monomers such as (meth)acrylic acid chloride; (meth)acrylamide, N- (Meth)acrylamide-based monomers such as methylol acrylamide; vinyl acetate; acrylonitrile; allyl glycidyl ether, crotonic acid glycidyl ether; and N-methacryloylmorpholine.
  • the polymer dispersant is an A block having a repeating unit (i) and a repeating unit (ii) and a B block having no repeating unit (i) and a repeating unit (ii). It is preferable that the block copolymer has The block copolymer is preferably an AB block copolymer or a BAB block copolymer. Surprisingly, the dispersibility of the dispersant tends to be significantly improved by introducing not only a quaternary ammonium salt group but also a tertiary amino group into the A block. Further, the B block preferably has a repeating unit (iii), and more preferably has a repeating unit (iv).
  • the repeating unit (i) and the repeating unit (ii) may be contained in any form of random copolymerization and block copolymerization. Further, the repeating unit (i) and the repeating unit (ii) may each be contained in one A block in an amount of two or more, and in that case, each repeating unit is randomly copolymerized in the A block, It may be contained in any form of block copolymerization.
  • repeating unit (i) and a repeating unit other than the repeating unit (ii) may be contained in the A block, and examples of such a repeating unit include the above-mentioned (meth)acrylic acid ester-based monomer. Examples include repeating units derived from a monomer.
  • the content ratio of the repeating unit (i) and the repeating unit other than the repeating unit (ii) in the A block is preferably 0 to 50 mol %, more preferably 0 to 20 mol %. Most preferably, it is not contained in the block.
  • Repeating units other than the repeating units (iii) and (iv) may be contained in the B block, and examples of such repeating units include styrene-based monomers such as styrene and ⁇ -methylstyrene; (Meth)acrylic acid chloride-based monomers such as (meth)acrylic acid chloride; (meth)acrylamide-based monomers such as (meth)acrylamide and N-methylolacrylamide; vinyl acetate; acrylonitrile; allyl glycidyl ether, glycidyl crotonic acid Ether; a repeating unit derived from a monomer such as N-methacryloylmorpholine.
  • styrene-based monomers such as styrene and ⁇ -methylstyrene
  • (Meth)acrylic acid chloride-based monomers such as (meth)acrylic acid chloride
  • (meth)acrylamide-based monomers such as (meth)acryl
  • the content of the repeating unit other than the repeating unit (iii) and the repeating unit (iv) in the B block is preferably 0 to 50 mol %, more preferably 0 to 20 mol %. Most preferably, it is not contained in the block.
  • the (f) dispersant in combination with a pigment derivative described later.
  • an adhesion improver such as a silane coupling agent, a surfactant (coating improver), a pigment derivative, a photoacid generator, a crosslinking agent, a mercapto compound.
  • Additives such as a polymerization inhibitor, a development improver, an ultraviolet absorber and an antioxidant can be appropriately added.
  • the photosensitive coloring composition of the present invention may contain an adhesion improver in order to improve the adhesion to the substrate.
  • an adhesion improver a silane coupling agent, a phosphoric acid group-containing compound and the like are preferable.
  • the type of the silane coupling agent various types such as epoxy type, (meth)acrylic type and amino type can be used alone or in combination of two or more.
  • silane coupling agents examples include (meth)acryloxysilanes such as 3-methacryloxypropylmethyldimethoxysilane and 3-methacryloxypropyltrimethoxysilane, and 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane.
  • Epoxy silanes such as 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane and 3-glycidoxypropyltriethoxysilane, ureidosilanes such as 3-ureidopropyltriethoxysilane, Isocyanate silanes such as 3-isocyanate propyl triethoxy silane may be mentioned, but silane coupling agents of epoxy silanes are particularly preferable.
  • the phosphoric acid group-containing compound (meth)acryloyl group-containing phosphates are preferable, and compounds represented by the following general formula (g1), (g2) or (g3) are preferable.
  • R 51 represents a hydrogen atom or a methyl group
  • l and l′ are integers of 1 to 10
  • m is 1, 2 or 3.
  • These phosphoric acid group-containing compounds may be used alone or in combination of two or more.
  • the photosensitive coloring composition of the present invention may contain a surfactant to improve coatability.
  • the surfactant various ones such as anionic, cationic, nonionic and amphoteric surfactants can be used. Among them, it is preferable to use a nonionic surfactant because it is unlikely to adversely affect various properties, and among them, a fluorine-based surfactant or a silicon-based surfactant is effective in terms of coating properties.
  • a fluorine-based surfactant or a silicon-based surfactant is effective in terms of coating properties.
  • examples of such a surfactant include TSF4460 (manufactured by Momentive Performance Materials), DFX-18 (manufactured by Neos), BYK-300, BYK-325, BYK-330 (manufactured by Big Chemie), KP340.
  • F-470, Megafac F-475, Megafac F-478, Megafac F-554, Megafac F-559 (manufactured by DIC)
  • Examples include SH7PA (manufactured by Toray Dow Corning), DS-401 (manufactured by Daikin), L-77 (manufactured by Nippon Unicar), FC4430 (manufactured by 3M), and the like.
  • 1 type may be used for a surfactant and 2 or more types may be used together by arbitrary combinations and ratios.
  • the photosensitive coloring composition of the present invention may contain a pigment derivative as a dispersion aid in order to improve dispersibility and storability.
  • pigment derivatives include azo, phthalocyanine, quinacridone, benzimidazolone, quinophthalone, isoindolinone, dioxazine, anthraquinone, indanthrene, perylene, perinone, diketopyrrolopyrrole, dioxazine.
  • examples thereof include derivatives such as phthalocyanine compounds and quinophthalone compounds.
  • a sulfonic acid group, a sulfonamide group and a quaternary salt thereof, a phthalimidomethyl group, a dialkylaminoalkyl group, a hydroxyl group, a carboxyl group, an amide group, etc. may be directly attached to the pigment skeleton or may be an alkyl group, an aryl group, a hetero group. Examples thereof include those bonded via a ring group and the like, and a sulfonic acid group is preferable. Further, a plurality of these substituents may be substituted on one pigment skeleton.
  • pigment derivatives include phthalocyanine sulfonic acid derivatives, quinophthalone sulfonic acid derivatives, anthraquinone sulfonic acid derivatives, quinacridone sulfonic acid derivatives, diketopyrrolopyrrole sulfonic acid derivatives, and dioxazine sulfonic acid derivatives. These may be used alone or in combination of two or more.
  • the photo-acid generator is a compound capable of generating an acid by ultraviolet rays, and has a cross-linking agent such as a melamine compound due to the action of the acid generated upon exposure.
  • the crosslinking reaction proceeds.
  • photo-acid generators those having a large solubility in a solvent, especially a solvent used in the photosensitive coloring composition are preferable, and examples thereof include diphenyliodonium, ditolyliodonium, and phenyl(p-anisyl).
  • Iodonium bis(m-nitrophenyl)iodonium, bis(p-tert-butylphenyl)iodonium, bis(p-chlorophenyl)iodonium, bis(n-dodecyl)iodonium, p-isobutylphenyl(p-tolyl)iodonium, p -Diaryl iodonium such as isopropylphenyl (p-tolyl) iodonium, or chloride, bromide, or borofluoride salt, hexafluorophosphate salt, hexafluoroarsenate salt, aromatic sulfonate of triarylsulfonium such as triphenylsulfonium , Tetrakis(pentafluorophenyl)borate salt, etc., sulfonium organoboron complexes such as diphenylphenacylsulfonium(n-butyl)triphenyl
  • crosslinking Agent can be further added to the photosensitive coloring composition of the present invention, and for example, a melamine- or guanamine-based compound can be used.
  • cross-linking agents include melamine- or guanamine-based compounds represented by the following general formula (6).
  • R 61 represents a —NR 66 R 67 group or an aryl group having 6 to 12 carbon atoms
  • R 62 , R 63 , R 64 , R 65 , R 66 and R 67 each represent a CH 2 OR 68 group
  • R 61 is an aryl group having 6 to 12 carbon atoms
  • one of R 62 , R 63 , R 64 and R 65 is —CH 2 OR 68.
  • R 62 , R 63 , R 64 , R 65 , R 66 and the remaining of R 67 each independently represent hydrogen or a —CH 2 OR 68 group
  • R 68 represents a hydrogen atom or a carbon number of 1 to 4
  • the aryl group having 6 to 12 carbon atoms is typically a phenyl group, a 1-naphthyl group or a 2-naphthyl group, and these phenyl groups and naphthyl groups include an alkyl group, an alkoxy group, a halogen atom, etc.
  • the substituent of may be bonded.
  • the alkyl group and the alkoxy group may each have about 1 to 6 carbon atoms.
  • the alkyl group represented by R 68 is preferably a methyl group or an ethyl group, and particularly preferably a methyl group.
  • Melamine compounds corresponding to the general formula (6) that is, compounds of the following general formula (6-1) include hexamethylolmelamine, pentamethylolmelamine, tetramethylolmelamine, hexamethoxymethylmelamine, pentamethoxymethylmelamine, tetramethoxy. Methyl melamine, hexaethoxymethyl melamine and the like are included.
  • R 62 , R 63 , R 64 , R 65 , R 66 and R 67 when one of R 62 , R 63 , R 64 , R 65 , R 66 and R 67 is an aryl group, one of R 62 , R 63 , R 64 and R 65 is —CH 2 Represents an OR 68 group, the rest of R 62 , R 63 , R 64 , R 65 , R 66 and R 67 independently of each other represents a hydrogen atom or a —CH 2 OR 68 group, wherein R 68 represents a hydrogen atom or Represents an alkyl group.
  • the guanamine-based compound corresponding to the general formula (6) that is, the compound in which R 61 in the general formula (6) is aryl, includes tetramethylolbenzoguanamine, tetramethoxymethylbenzoguanamine, trimethoxymethylbenzoguanamine, and tetraethoxymethylbenzoguanamine. Are included.
  • a cross-linking agent having a methylol group or a methylol alkyl ether group can be used.
  • An example is given below. 2,6-bis(hydroxymethyl)-4-methylphenol, 4-tert-butyl-2,6-bis(hydroxymethyl)phenol, 5-ethyl-1,3-bis(hydroxymethyl)perhydro-1,3 ,5-Triazin-2-one (commonly called N-ethyldimethyloltriazone) or its dimethyl ether compound, dimethyloltrimethylene urea or its dimethyl ether compound, 3,5-bis(hydroxymethyl)perhydro-1,3,5- Oxadiazin-4-one (commonly called dimethylolurone) or its dimethyl ether body, tetramethylol glyoxaldiurene or its tetramethyl ether body.
  • crosslinking agents may be used alone or in combination of two or more.
  • the amount of the crosslinking agent used is preferably 0.1 to 15% by mass, and particularly preferably 0.5 to 10% by mass, based on the total solid content of the photosensitive coloring composition.
  • mercapto compound As a polymerization accelerator, and for improving the curability and surface roughness of the surface of the cured product.
  • mercapto compound include a mercapto group-containing compound having an aromatic ring and an aliphatic mercapto group-containing compound.
  • a compound represented by the following general formula (1-3) is preferably used from the viewpoint of photocurability.
  • Z represents —O—, —S— or —NH—
  • R 61 , R 62 , R 63 , and R 64 each independently represent a hydrogen atom or a monovalent substituent.
  • Z is preferably —S— or —NH—, more preferably —NH—.
  • R 61 , R 62 , R 63 , and R 64 are each independently preferably a hydrogen atom, a C 1-4 alkyl group or a C 1-4 alkoxy group, and a hydrogen atom. Is more preferable.
  • 2-mercapto group-containing compounds having an aromatic ring such as 1,4-dimethylmercaptobenzene
  • 2-mercaptobenzothiazole and 2-mercaptobenzimidazole are preferable from the viewpoint of taper angle.
  • aliphatic mercapto group-containing compound hexanedithiol, decanedithiol, or the compound represented by the following general formula (1-4) is preferably used from the viewpoint of photocurability.
  • m represents an integer of 0 to 4 and n represents an integer of 2 to 4.
  • R 71 and R 72 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  • X represents an n-valent group.
  • m is preferably 1 or 2 from the viewpoint of photocurability.
  • n is preferably 3 or 4, and more preferably 4.
  • the alkyl group for R 71 and R 72 is preferably one having 1 to 3 carbon atoms from the viewpoint of photocurability.
  • at least one of R 71 and R 72 is preferably a hydrogen atom, and in this case, R 71 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. It is preferable to have.
  • X is preferably an alkylene group having 1 to 6 carbon atoms, which may have an ether bond and/or a branched portion, from the viewpoint of photocurability. From the viewpoint of photocurability, an alkylene group having 1 to 6 carbon atoms is more preferable, and an alkylene group having 4 carbon atoms is further preferable.
  • X is preferably a structure represented by the following general formula (1-5) or (1-6) from the viewpoint of photocurability.
  • R 73 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a methylol group.
  • R 73 an ethyl group is preferable from the viewpoint of photocurability.
  • R 74 represents an alkylene group having 1 to 4 carbon atoms.
  • R 74 an ethylene group is preferable from the viewpoint of photocurability.
  • X preferably has a structure represented by the following general formula (1-7).
  • trimethylolpropane tris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tris (3-mercaptopropionate), trimethylolpropane tris (3-mercaptobutyrate) ), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), 1,3,5-tris(3-mercaptobutyloxyethyl)-1,3,5-triazine-2, 4,6(1H,3H,5H)-trione is preferable, and pentaerythritol tetrakis(3-mercaptopropionate) and pentaerythritol tetrakis(3-mercaptobutyrate) are more preferable.
  • one or more selected from the group consisting of 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, and 2-mercaptobenzoxazole is combined with a photopolymerization initiator to form a photopolymerization initiator. It is preferably used as a polymerization initiator system.
  • 2-mercaptobenzothiazole may be used, 2-mercaptobenzimidazole may be used, or 2-mercaptobenzothiazole and 2-mercaptobenzimidazole may be used in combination.
  • a mercapto group-containing compound having an aromatic ring and an aliphatic mercapto group-containing compound in combination. This is because when a mask with a narrow opening is used, the illuminance per unit area becomes low due to diffraction during exposure, and it is more susceptible to oxygen inhibition than when the line width is thick, and the surface curability becomes low. Because there is a tendency.
  • a hexaarylbiimidazole-based photopolymerization initiator is used as the (c) photopolymerization initiator
  • a mercapto group-containing compound having an aromatic ring and an aliphatic mercapto group-containing compound are used in combination. Is preferred.
  • the acetophenone-based photopolymerization initiator is used, the effect tends to be sufficiently obtained even when the aliphatic mercapto group-containing compound is used alone.
  • a polymerization inhibitor may be contained.
  • the polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, methylhydroquinone, methoxyphenol, 2,6-di-tert-butyl-4-cresol (BHT) and the like. Among these, 2,6-di-tert-butyl-4-cresol is preferable from the viewpoint of shape control. Further, from the viewpoint of safety to human body, hydroquinone monomethyl ether and methylhydroquinone are preferable.
  • the polymerization inhibitor may contain one kind or two or more kinds.
  • the resin may contain a polymerization inhibitor, which may be used as the polymerization inhibitor of the present invention. The same or different polymerization inhibitor may be added during the production of the photosensitive coloring composition.
  • the content ratio of the (b) alkali-soluble resin is not particularly limited, but is usually 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more based on the total solid content. , More preferably 20 mass% or more, particularly preferably 25 mass% or more, usually 80 mass% or less, preferably 70 mass% or less, more preferably 60 mass% or less, more preferably 50 mass% or less, even more It is preferably 40% by mass or less, and particularly preferably 35% by mass or less.
  • the content ratio of the alkali-soluble resin (b) is not less than the above lower limit, the developing solubility tends to be improved. Further, when the content is not more than the upper limit, the mechanical properties tend to be improved.
  • the content ratio of (c) the photopolymerization initiator is not particularly limited, but is usually 0.1% by mass or more, preferably 0.5% by mass or more, more preferably 1% by mass or more, further preferably 1% by mass based on the total solid content.
  • the amount is 0.5% by mass or more, usually 15% by mass or less, preferably 10% by mass or less, more preferably 8% by mass or less, further preferably 6% by mass or less, and particularly preferably 4% by mass or less.
  • 0.1 to 15% by mass is preferable, 0.1 to 10% by mass is more preferable, 0.5 to 8% by mass is further preferable, 1 to 6% by mass is particularly preferable, 1.5 to 4% by mass.
  • 0.1 to 15% by mass is preferable
  • 0.1 to 10% by mass is more preferable
  • 0.5 to 8% by mass is further preferable
  • 1 to 6% by mass is particularly preferable, 1.5 to 4% by mass.
  • the content ratio of the polymerization accelerator is preferably 0.05% by mass or more, and usually 10% by mass in the total solid content of the photosensitive coloring composition of the present invention. % Or less, preferably 5% by mass or less, for example, 0.05 to 10% by mass, preferably 0.05 to 5% by mass.
  • the polymerization accelerator is usually used in a proportion of 0.1 to 50 parts by mass, preferably 0.1 to 20 parts by mass, relative to 100 parts by mass of the (c) photopolymerization initiator.
  • the content ratio of the sensitizing dye is preferably 0.1% by mass or more, based on the total solid content of the photosensitive coloring composition of the present invention. It is preferably 0.2% by mass or more, more preferably 0.3% by mass or more, preferably 5% by mass or less, more preferably 4% by mass or less, still more preferably 3% by mass or less. For example, 0.1 to 5 mass% is preferable, 0.2 to 4 mass% is more preferable, and 0.3 to 3 mass% is further preferable. When it is at least the above lower limit, photocurability will be enhanced and surface roughness will tend to be improved, and when it is at most the above upper limit, development solubility will tend to be improved.
  • the content ratio of the (d) ethylenically unsaturated compound is usually 1% by mass or more, preferably 5% by mass or more, more preferably 10% by mass or more, based on the total solid content of the photosensitive coloring composition of the present invention. It is preferably 20% by mass or more, more preferably 30% by mass or more, particularly preferably 40% by mass or more, most preferably 50% by mass or more, and usually 80% by mass or less, preferably 70% by mass or less, It is preferably 65 mass% or less. For example, 1 to 80% by weight is preferable, 5 to 80% by weight is more preferable, 10 to 70% by weight is further preferable, 20 to 70% by weight is further preferable, 30 to 70% by weight is particularly preferable, and 40 to 65%.
  • Mass% is particularly preferable, and 50 to 65 mass% or more is the most preferable.
  • D When the content ratio of the ethylenically unsaturated compound is not less than the lower limit value, mechanical properties tend to be improved, and when it is not more than the upper limit value, the developing solubility tends to be improved. ..
  • the content ratio of the (b) alkali-soluble resin to 100 parts by mass of the (d) ethylenically unsaturated compound is not particularly limited, but is preferably 10 parts by mass or more, more preferably 20 parts by mass or more, and 30 parts by mass or more. It is more preferably 40 parts by mass or more, particularly preferably 150 parts by mass or less, 120 parts by mass or less, more preferably 100 parts by mass or less, and further preferably 70 parts by mass or less. For example, it is preferably 10 to 150 parts by mass, more preferably 20 to 120 parts by mass, further preferably 30 to 100 parts by mass, particularly preferably 40 to 70 parts by mass. When it is at least the lower limit, the developing solubility tends to be improved, and when it is at most the upper limit, the mechanical properties tend to be good.
  • the content ratio of the total solid content is usually 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more. Further, the solution is usually adjusted to 50% by mass or less, preferably 30% by mass or less, and more preferably 25% by mass or less. For example, 5 to 50 mass% is preferable, 10 to 30 mass% is more preferable, and 15 to 25 mass% is further preferable.
  • the content ratio of the (f) dispersing agent is usually 0.5% by mass or more based on the total solid content of the photosensitive coloring composition, and 1% by mass. % Or more, more preferably 1.5% by mass or more, usually 30% by mass or less, preferably 20% by mass or less, more preferably 15% by mass or less, further preferably 10% by mass or less, and 5% by mass or less. Particularly preferred. For example, 0.5 to 30% by mass is preferable, 0.5 to 20% by mass is more preferable, 1 to 15% by mass is further preferable, 1 to 10% by mass is further more preferable, 1.5 to 5% by mass is Particularly preferred. (F) When the content ratio of the dispersant is not less than the lower limit value, storage stability tends to be improved, and when it is not more than the upper limit value, display reliability tends to be improved.
  • the content ratio of the (f) dispersant to 100 parts by mass of the (a) colorant is usually 5 parts by mass or more, more preferably 10 parts by mass or more, further preferably 20 parts by mass or more, and usually 50 parts by mass or less, particularly It is preferably 40 parts by mass or less.
  • 5 to 50 parts by mass is preferable, 10 to 50 parts by mass is more preferable, and 20 to 40 parts by mass is further preferable.
  • the content ratio of the dispersant is not less than the lower limit value, storage stability tends to be improved, and when it is not more than the upper limit value, display reliability tends to be improved.
  • an adhesion improver When an adhesion improver is used, its content is usually 0.1% by mass or more, preferably 0.2% by mass or more, more preferably 0.5% by mass or more, based on the total solid content of the photosensitive coloring composition. It is preferably, usually 30% by mass or less, 20% by mass or less, more preferably 10% by mass or less, further preferably 5% by mass or less, particularly preferably 3% by mass or less. For example, 0.1 to 30% by mass is preferable, 0.2 to 20% by mass is more preferable, 0.2 to 10% by mass is further preferable, 0.5 to 5% by mass is still more preferable, 0.5 to 5% by mass. 3% by weight is particularly preferred. When the content ratio of the adhesion improver is not less than the lower limit, the adhesion tends to be improved, and when it is not more than the upper limit, the residue tends to be reduced.
  • a surfactant When a surfactant is used, its content is usually 0.001 to 10% by mass, preferably 0.005 to 1% by mass, and more preferably 0.01% by mass based on the total solid content of the photosensitive coloring composition. To 0.5 mass %, and most preferably 0.03 to 0.3 mass %.
  • the content ratio of the surfactant By setting the content ratio of the surfactant to the lower limit or more, the smoothness and uniformity of the coating film tend to be easily expressed, and by setting the content ratio of the surfactant or less to the smoothness and uniformity of the coating film. It tends to be easy and can suppress deterioration of other characteristics.
  • a mercapto compound When a mercapto compound is used, its content is usually 0.1% by mass or more, preferably 0.2% by mass or more, more preferably 0.5% by mass or more, based on the total solid content of the photosensitive coloring composition. It is preferably, usually 30% by mass or less, 20% by mass or less, more preferably 10% by mass or less, further preferably 5% by mass or less, particularly preferably 3% by mass or less. For example, 0.1 to 30% by mass is preferable, 0.2 to 20% by mass is more preferable, 0.2 to 10% by mass is further preferable, 0.5 to 5% by mass is still more preferable, 0.5 to 5% by mass. 3% by weight is particularly preferred.
  • the content ratio of the mercapto compound is at least the lower limit value, photocurability is increased, and the surface roughness tends to be improved, and when it is at most the upper limit value, storage stability tends to be improved.
  • a polymerization inhibitor When a polymerization inhibitor is used, its content is usually 0.05% by mass or more, preferably 0.1% by mass or more, and 0.2% by mass or more, based on the total solid content of the photosensitive coloring composition. It is more preferably, usually 2% by mass or less, 1% by mass or less, more preferably 0.8% by mass or less, further preferably 0.7% by mass or less, particularly preferably 0.5% by mass or less. For example, 0.05 to 2 mass% is preferable, 0.05 to 1 mass% is more preferable, 0.1 to 0.8 mass% is further preferable, 0.1 to 0.7 mass% is further preferable, 0.2 to 0.5 mass% is particularly preferable.
  • the content ratio of the polymerization inhibitor is not less than the lower limit value, the resolution tends to be high, and when it is not more than the upper limit value, the curability tends to be high.
  • the photosensitive coloring composition of the present invention can be suitably used for forming a colored spacer, and from the viewpoint of being used as a colored spacer, one having a higher optical density (OD) per 1 ⁇ m of film thickness of the coating film Is preferred.
  • the color spacer alone obtained by curing the photosensitive coloring composition of the present invention is preferably 0.1 or more, more preferably 0.15 or more, and further preferably 0.2 or more. , 0.25 or more is more preferable.
  • the optical density (OD) is a value measured by the method described later.
  • the photosensitive coloring composition of the present invention is produced according to a conventional method. Usually, it is preferable that the colorant (a) is previously subjected to a dispersion treatment using a paint conditioner, a sand grinder, a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer or the like. Since the colorant (a) is made into fine particles by the dispersion treatment, the coating properties of the photosensitive coloring composition are improved.
  • the dispersion treatment is preferably performed in a system in which (a) a colorant, (e) a solvent, (f) a dispersant, and optionally (b) an alkali-soluble resin are used in combination or in part (
  • the mixture to be subjected to the dispersion treatment and the composition obtained by the treatment may be referred to as "ink” or "pigment dispersion”.
  • a polymer dispersant as the (f) dispersant, because the obtained ink and the photosensitive coloring composition are prevented from increasing in viscosity over time (excellent in dispersion stability).
  • a pigment dispersion liquid containing at least (a) a colorant, (e) a solvent, and (f) a dispersant.
  • a colorant, (e) solvent, and (f) dispersant that can be used in the pigment dispersion those described as those that can be used in the photosensitive coloring composition are preferably adopted. it can.
  • the highly reactive component may be modified due to the heat generated during the dispersion treatment. Therefore, it is preferable to perform the dispersion treatment in a system that does not contain (c) a photopolymerization initiator or (d) an ethylenically unsaturated compound.
  • a photopolymerization initiator or an ethylenically unsaturated compound.
  • the (a) colorant is dispersed with a sand grinder, glass beads or zirconia beads having a particle diameter of about 0.1 to 8 mm are preferably used.
  • the temperature is usually 0° C. to 100° C., preferably room temperature to 80° C.
  • the dispersion time tends to vary depending on the composition of the liquid, the size of the dispersion treatment device, etc., and may be adjusted appropriately.
  • the standard of dispersion is to control the gloss of the ink so that the 20-degree specular gloss (JIS Z8741) when the pigment dispersion or the photosensitive coloring composition is applied to the substrate is in the range of 50 to 300.
  • the content is at least the lower limit value, the dispersion treatment is not sufficient, and it is possible to suppress the residual of the coarse pigment ((a) colorant) particles, and it is easy to make the developability, adhesion, resolution, etc. sufficient. ..
  • the content is not more than the upper limit, it is possible to prevent the pigment from crushing and to generate a large number of ultrafine particles, which tends to improve the dispersion stability.
  • the dispersed particle size of the pigment dispersed in the ink is usually 0.03 to 0.3 ⁇ m, which is measured by a dynamic light scattering method or the like.
  • the ink obtained by the above dispersion treatment is mixed with the other components contained in the photosensitive coloring composition to form a uniform solution.
  • fine dust is often mixed in the liquid, and thus the obtained photosensitive coloring composition is preferably filtered by a filter or the like.
  • the cured product of the present invention is obtained by curing the photosensitive coloring composition of the present invention.
  • a cured product obtained by curing the photosensitive coloring composition can be suitably used as a colored spacer.
  • the support for forming the colored spacer is not particularly limited in its material as long as it has appropriate strength.
  • transparent substrates are mainly used, examples of the material include polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, thermoplastic resin sheets such as polycarbonate, polymethylmethacrylate and polysulfone, and epoxy. Examples thereof include resins, unsaturated polyester resins, thermosetting resin sheets such as poly(meth)acrylic resins, and various glasses. Among these, glass and heat resistant resin are preferable from the viewpoint of heat resistance.
  • a transparent electrode such as ITO or IZO may be formed on the surface of the substrate. Other than the transparent substrate, it can be formed on the TFT array.
  • the support may be subjected to corona discharge treatment, ozone treatment, silane coupling agent, thin film forming treatment of various resins such as urethane resin, etc., if necessary. ..
  • the thickness of the transparent substrate is usually 0.05 to 10 mm, preferably 0.1 to 7 mm.
  • the film thickness is usually 0.01 to 10 ⁇ m, preferably 0.05 to 5 ⁇ m.
  • the photosensitive colored composition of the present invention can be used in the same applications as known photosensitive colored compositions for color filters, but in the following, when it is used as a colored spacer, its formation The method will be described.
  • a photosensitive coloring composition is supplied in a film form or a pattern form by a method such as coating on a support on which a coloring spacer is to be provided, and the solvent is dried. Subsequently, pattern formation is performed by a method such as a photolithography method of exposing and developing. Then, if necessary, additional exposure or heat curing treatment is performed to form a colored spacer on the support.
  • the photosensitive coloring composition of the present invention is usually supplied onto a support in a state of being dissolved or dispersed in a solvent.
  • a conventionally known method such as a spinner method, a wire bar method, a flow coating method, a die coating method, a roll coating method, or a spray coating method can be used. Further, it may be supplied in a pattern by an inkjet method or a printing method.
  • the die coating method the usage amount of the coating liquid is significantly reduced, there is no influence of mist attached when the spin coating method is used, and the generation of foreign matter is suppressed. Is preferred.
  • the coating amount varies depending on the use, but in the case of a colored spacer, for example, the dry film thickness is usually 0.5 ⁇ m to 10 ⁇ m, preferably 1 ⁇ m to 9 ⁇ m, and particularly preferably 1 ⁇ m to 7 ⁇ m. Further, it is important that the dry film thickness or the height of the finally formed spacer is uniform over the entire area of the substrate. If the variation is large, defects such as display spots may occur on the liquid crystal panel.
  • the heights of the finally formed colored spacers are different.
  • a known substrate such as a glass substrate can be used as the substrate. Further, it is preferable that the surface of the substrate is flat.
  • Drying after supplying the photosensitive coloring composition onto the substrate is preferably performed by a drying method using a hot plate, an IR oven, or a convection oven. Further, it is also possible to combine a reduced pressure drying method in which drying is performed in a reduced pressure chamber without raising the temperature.
  • the drying conditions such as the drying temperature and the drying time can be appropriately selected according to the type of solvent component, the performance of the dryer used, and the like. Usually, it is selected at a temperature of 40° C. to 130° C. for 15 seconds to 5 minutes, preferably at a temperature of 50° C. to 110° C. for 30 seconds to 3 minutes.
  • Exposure Method The exposure is performed by superimposing a negative mask pattern on the coating film of the photosensitive coloring composition and irradiating a light source of ultraviolet rays or visible light through the mask pattern.
  • a method of bringing the exposure mask close to the coating film of the photosensitive coloring composition or disposing the exposure mask at a position distant from the coating film of the photosensitive coloring composition A method of projecting exposure light through a mask may be used.
  • a scanning exposure method using a laser beam that does not use a mask pattern may be used.
  • the treatment is performed in a deoxygenated atmosphere, or the exposure is performed after forming an oxygen barrier layer such as a polyvinyl alcohol layer on the photopolymerizable layer.
  • a light-shielding portion (light transmittance 0%) and a plurality of openings have the highest average light transmittance.
  • An exposure mask having an opening (completely transmissive opening) and an opening having a low average light transmittance (intermediate transmissive opening) is used.
  • a difference in average film transmittance between the intermediate transmission opening and the complete transmission opening that is, a difference in exposure amount causes a difference in residual film rate.
  • a method is known in which the intermediate transmission opening is formed by a matrix light-shielding pattern having minute polygonal light-shielding units.
  • a method of controlling the light transmittance by using a film of a material such as a chromium-based material, a molybdenum-based material, a tungsten-based material, or a silicon-based material as the absorber is known.
  • the light source used for the above exposure is not particularly limited.
  • a lamp light source such as a xenon lamp, a halogen lamp, a tungsten lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a fluorescent lamp, an argon ion laser, a YAG laser, Laser light sources such as excimer lasers, nitrogen lasers, helium cadmium lasers, blue-violet semiconductor lasers, and near infrared semiconductor lasers can be used.
  • An optical filter can also be used when irradiating and using the light of a specific wavelength.
  • the optical filter may be, for example, a type that can control the light transmittance at an exposure wavelength with a thin film, and in that case, as a material thereof, for example, a Cr compound (Cr oxide, nitride, oxynitride, fluoride, etc.), MoSi, Si, W, Al etc. are mentioned.
  • a Cr compound Cr oxide, nitride, oxynitride, fluoride, etc.
  • MoSi Si, W, Al etc.
  • Energy of exposure generally, 1 mJ / cm 2 or more, preferably 5 mJ / cm 2 or more, more preferably 10 mJ / cm 2 or more, usually 300 mJ / cm 2 or less, preferably 200 mJ / cm 2 or less, more preferably It is 150 mJ/cm 2 or less.
  • the distance between the exposure target and the mask pattern is usually 10 ⁇ m or more, preferably 50 ⁇ m or more, more preferably 75 ⁇ m or more, and usually 500 ⁇ m or less, preferably 400 ⁇ m or less, more preferably It is 300 ⁇ m or less.
  • an image pattern can be formed on the substrate by development using an aqueous solution of an alkaline compound or an organic solvent.
  • the aqueous solution may further contain a surfactant, an organic solvent, a buffer, a complexing agent, a dye or a pigment.
  • Inorganic alkaline compounds such as sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate and ammonium hydroxide, and mono-, di- or triethanolamine, mono-, di- or trimethylamine
  • Organic alkalinity such as mono-, di- or triethylamine, mono- or diisopropylamine, n-butylamine, mono-, di- or triisopropanolamine, ethyleneimine, ethylenediimine, tetramethylammonium hydroxide (TMAH), choline Compounds.
  • These alkaline compounds may be a mixture of two or more kinds.
  • surfactant examples include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, monoglyceride alkyl esters; alkylbenzene sulfone.
  • nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, monoglyceride alkyl esters; alkylbenzene sulfone.
  • anionic surfactants such as acid salts, alkylnaphthalene sulfonates, alkyl sulfates, alkyl sulfonates, and sulfosuccinate salts
  • amphoteric surfactants such as alkyl betaines and amino acids.
  • organic solvent examples include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, diacetone alcohol and the like.
  • the organic solvent may be used alone or in combination with the aqueous solution.
  • the conditions of the developing treatment are not particularly limited, and the developing temperature is usually in the range of 10 to 50° C., in particular 15 to 45° C., and particularly preferably 20 to 40° C.
  • the developing method is an immersion developing method, a spray developing method or a brush. Any method such as a developing method and an ultrasonic developing method can be used.
  • the substrate after development may be subjected to additional exposure by a method similar to the above-mentioned exposure method, if necessary, or may be subjected to heat curing treatment.
  • the heat curing treatment conditions at this time are selected such that the temperature is in the range of 100° C. to 280° C., preferably in the range of 150° C. to 250° C., and the time is selected in the range of 5 minutes to 60 minutes.
  • the size, shape, etc. of the colored spacer of the present invention are appropriately adjusted depending on the specifications of the color filter to which the colored spacer is applied, and the photosensitive colored composition of the present invention is particularly high in height of the spacer and the sub spacer by a photolithography method. It is useful for simultaneously forming colored spacers having different heights, in which case the height of the spacer is usually about 1 to 7 ⁇ m, and the height of the sub spacer is usually about 0.2 to 1.5 ⁇ m lower than that of the spacer. Have.
  • the image display device of the present invention includes the colored spacer of the present invention.
  • a color filter having the above-described colored spacer of the present invention and a liquid crystal driving side substrate are bonded together to form a liquid crystal cell, and liquid crystal is injected into the formed liquid crystal cell to provide the colored spacer of the present invention.
  • the image display device of the present invention such as a liquid crystal display device can be manufactured.
  • the inside of the reaction vessel was changed to air, 0.7 parts by mass of trisdimethylaminomethylphenol and 0.12 parts by mass of hydroquinone were added to 43 parts by mass of acrylic acid, and the reaction was continued at 100° C. for 12 hours. Then, 56 parts by mass of tetrahydrophthalic anhydride (THPA) and 0.7 parts by mass of triethylamine were added, and the mixture was reacted at 100° C. for 3.5 hours.
  • the weight average molecular weight Mw in terms of polystyrene measured by GPC of the thus obtained alkali-soluble resin-I was 8400, and the acid value was 80 mgKOH/g.
  • ⁇ Alkali-soluble resin-II> 124 parts by mass of propylene glycol monomethyl ether acetate was stirred while substituting with nitrogen, and the temperature was raised to 120°C. 4 parts by mass of styrene, 132 parts by mass of glycidyl methacrylate, and 4 parts by mass of monomethacrylate (FA-513M manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton were added dropwise to 2,2′-azobis-2-methylbutyronitrile. 7.2 parts by mass was added dropwise over 3 hours, and stirring was continued at 90° C. for 2 hours.
  • the inside of the reaction vessel was changed to air, 0.6 parts by mass of trisdimethylaminomethylphenol and 0.12 parts by mass of hydroquinone were added to 67 parts by mass of acrylic acid, and the reaction was continued at 100° C. for 12 hours. Then, 15 parts by mass of tetrahydrophthalic anhydride (THPA) and 0.6 parts by mass of triethylamine were added, and the reaction was carried out at 100° C. for 3.5 hours.
  • THPA tetrahydrophthalic anhydride
  • the thus obtained alkali-soluble resin-II had a polystyrene-equivalent weight average molecular weight Mw measured by GPC of 9000, an acid value of 24 mgKOH/g, and a double bond equivalent of 260 g/mol.
  • Dispersant-I> "BYK-LPN21116" manufactured by BYK-Chemie (Acrylic AB consisting of an A block having a quaternary ammonium salt group and a tertiary amino group in the side chain and a B block having no quaternary ammonium salt group and a tertiary amino group) Block copolymer having an amine value of 70 mgKOH/g and an acid value of 1 mgKOH/g or less.)
  • the A block of Dispersant-I contains repeating units of the following formulas (1a) and (2a), and the B block contains repeating units of the following formula (3a).
  • the content ratio of the repeating units of the following formulas (1a), (2a) and (3a) in all the repeating units of the dispersant-I was 11.1 mol%, 22.2 mol% and 6.7 mol% respectively. is there.
  • Pigment Dispersions 1 to 7 The pigment, the dispersant, the alkali-soluble resin, and the solvent described in Table 1 were mixed in a mass ratio shown in Table 1 to obtain a mixed solution.
  • the blending ratio of the solvent in Table 1 includes the amounts of the dispersant and the solvent derived from the alkali-soluble resin.
  • This mixed solution was subjected to a dispersion treatment in the range of 25 to 45° C. for 3 hours with a paint shaker.
  • zirconia beads having a diameter of 0.5 mm were used, and a mass 2.5 times that of the dispersion liquid was added. After the dispersion was completed, the beads and the dispersion were separated by a filter to prepare pigment dispersions 1 to 7.
  • the photosensitive coloring composition was applied onto a glass substrate with a spin coater so that the film thickness after heat curing would be 1.5 ⁇ m, dried under reduced pressure for 1 minute, and then dried on a hot plate at 90° C. for 100 seconds.
  • the obtained coating film was subjected to the whole surface exposure treatment using an ultraviolet ray having an intensity at 365 nm of 40 mW/cm 2 without using a mask so that the exposure amount was 60 mJ/cm 2 .
  • the optical density (OD) of the obtained resist-cured film substrate was measured by a transmission densitometer X-Rite 361T (V), and the film thickness was measured by Hitachi High-Technology scanning white light interference microscope VS1530.
  • the optical density (unit OD value, OD/ ⁇ m) per unit film thickness was calculated from the optical density (OD) and film thickness, and shown in Table 4.
  • the OD value is a numerical value indicating the light-shielding ability, and the larger the numerical value, the higher the light-shielding property.
  • ⁇ Roughness evaluation> A substrate for roughness evaluation was obtained in the same manner as the resist cured film substrate, except that the exposure amount was 10 mJ/cm 2 .
  • the arithmetic average surface roughness (Sa) of the surface of the obtained substrate in the range of 10 ⁇ m ⁇ 10 ⁇ m was measured with a scanning white interference microscope VS1530 manufactured by Hitachi High Technology Co., Ltd., and the roughness was evaluated according to the following criteria.
  • the measurement results and evaluation results are shown in Table 4.
  • the measurement mode was Focus mode, the magnification of the objective lens was 50 times, and the center wavelength of the measurement light was 520 nm.
  • Sa is the volume of the portion surrounded by the surface shape curved surface and the average surface divided by the measurement area, and the smaller the value, the higher the smoothness.
  • a colored spacer was used in the same manner as the resist-cured film substrate except that a glass substrate having an ITO film formed on the surface was used as a substrate, a mask having a 20 ⁇ m opening (circular opening having a diameter of 20 ⁇ m) was used during exposure, and the exposure gap was 150 ⁇ m.
  • Got The elastic recovery rate of the obtained colored spacer was measured by the following procedure. Using Fisher Scope H-100 (manufactured by Fisher Instruments), using a flat indenter with a measurement temperature of 23° C. and a diameter of 50 ⁇ m, a load is applied to the colored spacer at a constant speed (5 mN/sec), and the load reaches 300 mN.
  • a light resistance evaluation substrate was obtained in the same manner as the resist cured film substrate.
  • the absorbance of the obtained substrate at a wavelength of 450 nm was measured using a spectrophotometer U-3500 manufactured by Hitachi High Technology Co., Ltd.
  • the substrate was irradiated with light having an intensity of 19 mW/cm 2 at a wavelength of 450 nm for 500 hours in an environment of a temperature of 25° C. and a relative humidity of 50% RH.
  • the absorbance of the substrate at a wavelength of 450 nm was similarly measured.
  • the rate of change in absorbance at a wavelength of 450 nm was calculated by the following formula, evaluated according to the following criteria, and the results are shown in Table 5.
  • the content ratio of the colorant is 2 to 20% by mass in the total solid content
  • the content of the purple pigment is contained in the colorant
  • the content ratio of the purple pigment in the colorant is It can be seen that it is possible to form a colored spacer having excellent surface roughness and mechanical properties by using the photosensitive coloring composition of 50% by mass or more.
  • Example 1 From the comparison between Example 1 and Comparative Example 1, it can be seen that the surface roughness is excellent when the content ratio of the purple pigment in the colorant is 50% by mass or more. It is considered that since the purple pigment has high dispersibility and is uniformly dispersed in the cured film, the solubility at the time of development becomes uniform by containing a large amount of the purple pigment.
  • Example 1 Comparative Example 2
  • the mechanical properties are good. This is because it is possible to set the content ratio of the alkali-soluble resin or the ethylenically unsaturated compound relatively high by preventing the content ratio of the colorant from becoming too high, and the crosslinking density of the obtained colored spacer becomes high. It is thought that it is because of it.
  • the light resistance is excellent when the content ratio of the purple pigment in the colorant is 50% by mass or more. It is considered that the violet pigment has a low absorbance around a wavelength of 450 nm, and contains a large amount of the violet pigment, so that it is less susceptible to the irradiation light having a wavelength of 450 nm.

Abstract

Provided is a photosensitive coloring composition capable of forming a coloring spacer having excellent mechanical properties and surface roughness. The photosensitive coloring composition according to the present invention contains a coloring agent (a), an alkali-soluble resin (b), a photoinitiator (c), and an ethylenically unsaturated compound (d), wherein the contained proportion of the coloring agent (a) is 2-20 mass% with respect to the total solid content of the photosensitive coloring composition, the coloring agent (a) contains a purple pigment, and the contained proportion of the purple pigment in the coloring agent (a) is 50 mass% or more.

Description

感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置Photosensitive colored composition, cured product, colored spacer, and image display device
 本発明は、感光性着色組成物等に関する。詳しくは、例えば液晶ディスプレイ等のカラーフィルターにおいて着色スペーサー等の形成に好ましく用いられる感光性着色組成物、この感光性着色組成物を硬化して得られる硬化物及び着色スペーサー、この着色スペーサーを備える画像表示装置に関する。
 2018年12月18日に日本国特許庁に出願された日本国特願2018-236121の明細書、特許請求の範囲、図面及び要約書の全内容、並びに、本明細書で引用された文献等に開示された内容の一部又は全部をここに引用し、本明細書の開示内容として取り入れる。
The present invention relates to a photosensitive coloring composition and the like. Specifically, for example, a photosensitive coloring composition that is preferably used for forming a colored spacer or the like in a color filter such as a liquid crystal display, a cured product and a colored spacer obtained by curing the photosensitive coloring composition, and an image including the colored spacer. Regarding display device.
Japanese Patent Application No. 2018-236121 filed with the Japan Patent Office on December 18, 2018, the description, claims, drawings and abstract of the entire contents, and references cited in this specification All or part of the content disclosed in the above is incorporated herein by reference as the disclosure content of the present specification.
 液晶ディスプレイ(LCD)は液晶への電圧のオン・オフにより液晶分子の並び方が切り替わる性質を利用している。液晶パネルを構成する各部材は、フォトリソグラフィーに代表される、感光性組成物を利用した方法によって形成されるものが多い。一例として、液晶パネルにおける2枚の基板の間隔を一定に保つために使用されているもの、所謂、スペーサーが挙げられる。 Liquid crystal display (LCD) uses the property that the arrangement of liquid crystal molecules is switched by turning on and off the voltage to the liquid crystal. Many members forming the liquid crystal panel are formed by a method using a photosensitive composition, which is represented by photolithography. As an example, a so-called spacer, which is used to keep the distance between two substrates in a liquid crystal panel constant, can be mentioned.
 従来、透明スペーサーをTFT型LCDに使用する場合、スペーサーを透過してくる光によりスイッチング素子としてのTFTが誤作動を起こすことがあった。これを防止するため、例えば、特許文献1には、遮光性を有するスペーサー(着色スペーサー)を用いる方法が記載されている。また、特許文献2には、遮光性と液晶の電圧保持率を確保した上で、形状や段差のコントロールが可能で、基板との密着性に優れた着色スペーサーを得るために、特定の組み合わせの顔料を含む着色感光性組成物を使用することが提案されている。 Conventionally, when a transparent spacer is used in a TFT type LCD, the light passing through the spacer sometimes causes the TFT as a switching element to malfunction. In order to prevent this, for example, Patent Document 1 describes a method using a spacer having a light shielding property (colored spacer). Further, in Patent Document 2, a specific combination is required in order to obtain a colored spacer that can control a shape and a level difference while securing a light-shielding property and a voltage holding ratio of a liquid crystal and has excellent adhesion to a substrate. It has been proposed to use colored photosensitive compositions containing pigments.
 また、液晶パネル製造時には、2枚の基板間を高温高圧下で圧着する工程を経るため、スペーサーにはこの圧着時の高温高圧条件によっても変形せず、スペーサー機能が維持されることが要求される。即ち、外部圧力により変形しても、外部圧力が除かれた場合に元の形状に戻るための、回復率や弾性復元率等の機械的特性が必要とされる。例えば特許文献3には、特定の光重合開始剤を用いることで高膜厚における機械的特性が高められることが記載されており、また特許文献4には、特定の不飽和基含有化合物を用いることで機械的特性が高められることが記載されている。 Further, when manufacturing a liquid crystal panel, a process of press-bonding two substrates under high temperature and high pressure is performed. Therefore, the spacer is required to maintain the spacer function without being deformed by the high temperature and high pressure condition during the press bonding. It That is, mechanical properties such as a recovery rate and an elastic recovery rate are required to return to the original shape when the external pressure is removed even if the external pressure deforms. For example, Patent Document 3 describes that the mechanical properties at high film thickness can be enhanced by using a specific photopolymerization initiator, and Patent Document 4 uses a specific unsaturated group-containing compound. It is described that the mechanical properties are enhanced.
 一方で特許文献5には、紫色着色剤及び/又は茶色着色剤と、特定の青色着色剤を含む着色組成物を用いることで、着色剤による液晶層の汚染が低減されることが記載されている。 On the other hand, Patent Document 5 describes that by using a coloring composition containing a purple colorant and/or a brown colorant and a specific blue colorant, contamination of the liquid crystal layer by the colorant is reduced. There is.
日本国特開平8-234212号公報Japanese Patent Laid-Open No. 8-234212 国際公開第2013/115268号International Publication No. 2013/115268 日本国特開2015-38607号公報Japanese Patent Laid-Open No. 2015-38607 日本国特開2005-165294号公報Japanese Patent Laid-Open No. 2005-165294 日本国特開2018-9132号公報Japanese Patent Laid-Open No. 2018-9132
 液晶ディスプレイの表示不良を抑制するために、着色スペーサーの表面粗度が低く、平滑性が優れている必要がある。
 本発明者らが検討したところ、特許文献2や5に記載の感光性着色組成物では、表面粗度と機械的特性を両立した着色スペーサーを得ることが困難であることが判明した。
In order to suppress display defects of the liquid crystal display, it is necessary that the colored spacers have low surface roughness and excellent smoothness.
As a result of studies by the present inventors, it has been found that it is difficult to obtain a colored spacer having both surface roughness and mechanical properties with the photosensitive colored composition described in Patent Documents 2 and 5.
 特許文献3及び4には、着色スペーサーに関する記載がなく、スペーサーに着色剤を含有させた際の影響が不明であった。 Patent Documents 3 and 4 have no description about colored spacers, and the effect of including a colorant in the spacers was unclear.
 本発明は、上記事情に鑑みてなされたものであり、表面粗度及び機械的特性に優れた着色スペーサーを形成可能な感光性着色組成物を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a photosensitive coloring composition capable of forming a colored spacer having excellent surface roughness and mechanical properties.
 本発明者らが、上記課題を解決すべく鋭意検討を行った結果、全固形分中の、着色剤の含有割合を特定の範囲内とし、また着色剤として特定の顔料を用い、その含有割合を特定範囲とすることで、上記課題を解決することができることを見出し、本発明に至った。
 すなわち、本発明は以下の[1]~[9]の構成を有する。
The present inventors, as a result of intensive studies to solve the above problems, the total solid content, the content ratio of the colorant within a specific range, also using a specific pigment as a colorant, the content ratio It was found that the above-mentioned problems can be solved by setting the above-mentioned range to a specific range, and the present invention has been completed.
That is, the present invention has the following configurations [1] to [9].
[1] (a)着色剤、(b)アルカリ可溶性樹脂、(c)光重合開始剤、及び(d)エチレン性不飽和化合物を含有する感光性着色組成物であって、
 前記(a)着色剤の含有割合が、感光性着色組成物の全固形分中に2~20質量%であり、
 前記(a)着色剤が紫色顔料を含み、かつ、
 前記(a)着色剤中の前記紫色顔料の含有割合が50質量%以上であることを特徴とする感光性着色組成物。
[2] 前記紫色顔料が、C.I.ピグメントバイオレット29及びC.I.ピグメントバイオレット23からなる群から選ばれる少なくとも1種を含む、[1]に記載の感光性着色組成物。
[3] 前記(a)着色剤が、さらに橙色顔料を含む、[1]又は[2]に記載の感光性着色組成物。
[4] 前記(d)エチレン性不飽和化合物100質量部に対する前記(b)アルカリ可溶性樹脂の含有割合が150質量部以下である、[1]~[3]のいずれかに記載の感光性着色組成物。
[5] 前記(c)光重合開始剤が、ヘキサアリールビイミダゾール化合物を含有する、[1]~[4]のいずれかに記載の感光性着色組成物。
[6] 着色スペーサー形成用である、[1]~[5]のいずれかに記載の感光性着色組成物。
[1] A photosensitive coloring composition containing (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, and (d) an ethylenically unsaturated compound,
The content of the (a) colorant is 2 to 20% by mass based on the total solid content of the photosensitive coloring composition,
The (a) colorant contains a purple pigment, and
The photosensitive coloring composition, wherein the content of the purple pigment in the colorant (a) is 50% by mass or more.
[2] The purple pigment is C.I. I. Pigment Violet 29 and C.I. I. Pigment Violet 23. The photosensitive coloring composition according to [1], containing at least one selected from the group consisting of Pigment Violet 23.
[3] The photosensitive coloring composition according to [1] or [2], wherein the (a) colorant further contains an orange pigment.
[4] The photosensitive coloring according to any one of [1] to [3], wherein the content ratio of the (b) alkali-soluble resin is 150 parts by mass or less based on 100 parts by mass of the (d) ethylenically unsaturated compound. Composition.
[5] The photosensitive coloring composition according to any one of [1] to [4], wherein the (c) photopolymerization initiator contains a hexaarylbiimidazole compound.
[6] The photosensitive coloring composition according to any one of [1] to [5], which is for forming a colored spacer.
[7] [1]~[6]のいずれかに記載の感光性着色組成物を硬化して得られる硬化物。
[8] [7]に記載の硬化物から構成される着色スペーサー。
[9] [8]に記載の着色スペーサーを備える画像表示装置。
[7] A cured product obtained by curing the photosensitive coloring composition according to any one of [1] to [6].
[8] A colored spacer composed of the cured product according to [7].
[9] An image display device including the colored spacer according to [8].
 本発明によれば、表面粗度及び機械的特性に優れた着色スペーサーを形成可能な感光性着色組成物、硬化物、それから構成される着色スペーサー、さらにこのような着色スペーサーを備える画像表示装置を提供することができる。 According to the present invention, a photosensitive coloring composition capable of forming a colored spacer having excellent surface roughness and mechanical properties, a cured product, a colored spacer composed of the same, and an image display device including such a colored spacer are provided. Can be provided.
 以下、本発明の実施の形態を具体的に説明するが、本発明は、以下の実施の形態に限定されるものではなく、その要旨の範囲内で種々に変更して実施することができる。
 なお、本発明において、「(メタ)アクリル」とは「アクリル及び/又はメタクリル」を意味し、「(メタ)アクリレート」、「(メタ)アクリロイル」についても同様である。
Hereinafter, embodiments of the present invention will be specifically described, but the present invention is not limited to the following embodiments and can be variously modified and implemented within the scope of the gist.
In the present invention, “(meth)acryl” means “acryl and/or methacryl”, and the same applies to “(meth)acrylate” and “(meth)acryloyl”.
 「(共)重合体」とは、単一重合体(ホモポリマー)と共重合体(コポリマー)の双方を含むことを意味し、「酸(無水物)」、「(無水)…酸」とは、酸とその無水物の双方を含むことを意味する。また、本発明において「アクリル系樹脂」とは、(メタ)アクリル酸を含む(共)重合体、カルボキシル基を有する(メタ)アクリル酸エステルを含む(共)重合体を意味する。 The "(co)polymer" is meant to include both a homopolymer (copolymer) and a copolymer (copolymer), and "acid (anhydride)", "(anhydrous)... acid" , Both acid and its anhydride are meant to be included. Further, in the present invention, the “acrylic resin” means a (co)polymer containing (meth)acrylic acid and a (co)polymer containing a (meth)acrylic acid ester having a carboxyl group.
 また、本発明において「モノマー」とは、いわゆる高分子物質(ポリマー)に相対する用語であり、狭義の単量体(モノマー)の外に、二量体、三量体、オリゴマー等も含む意味である。
 本発明において「全固形分」とは、感光性着色組成物中又は後述するインク中に含まれる、溶剤以外の全成分を意味するものとする。
 本発明において、「重量平均分子量」とは、GPC(ゲルパーミエーションクロマトグラフィー)によるポリスチレン換算の重量平均分子量(Mw)をさす。
 また、本発明において、「アミン価」とは、特に断りのない限り、有効固形分換算のアミン価を表し、分散剤の固形分1gあたりの塩基量と当量のKOHの質量で表される値である。なお、測定方法については後述する。一方、「酸価」とは、特に断りのない限り有効固形分換算の酸価を表し、中和滴定により算出される。
Further, in the present invention, the term “monomer” is a term corresponding to a so-called high-molecular substance (polymer), and includes not only a narrowly defined monomer (monomer) but also a dimer, a trimer, an oligomer and the like. Is.
In the present invention, the “total solid content” means all components other than the solvent contained in the photosensitive coloring composition or the ink described below.
In the present invention, the “weight average molecular weight” refers to a polystyrene equivalent weight average molecular weight (Mw) by GPC (gel permeation chromatography).
Further, in the present invention, unless otherwise specified, the “amine value” represents an amine value in terms of effective solid content, and is a value represented by the amount of base and the equivalent amount of KOH per 1 g of solid content of the dispersant. Is. The measuring method will be described later. On the other hand, the “acid value” represents an acid value in terms of effective solid content, and is calculated by neutralization titration unless otherwise specified.
 また、本明細書において、「質量」で表される百分率や部は「重量」で表される百分率や部と同義である。
 また、本明細書において、顔料の具体例をピグメントナンバーで示すことがあるが、「C.I.ピグメントレッド2」等の用語は、カラーインデックス(C.I.)を意味する。
Further, in the present specification, the percentages and parts represented by “mass” have the same meanings as the percentages and parts represented by “weight”.
In the present specification, specific examples of pigments may be indicated by pigment numbers, but terms such as "CI Pigment Red 2" mean a color index (CI).
[感光性着色組成物]
 本発明の感光性着色組成物は、
(a)着色剤
(b)アルカリ可溶性樹脂
(c)光重合開始剤
(d)エチレン性不飽和化合物
を必須成分として含有し、必要に応じて、さらにシランカップリング剤等の密着向上剤、界面活性剤(塗布性向上剤)、顔料誘導体、光酸発生剤、架橋剤、メルカプト化合物、重合禁止剤、現像改良剤、紫外線吸収剤、酸化防止剤等のその他の配合成分を含むものであり、通常、各配合成分が、溶剤に溶解又は分散した状態で使用される。
[Photosensitive coloring composition]
The photosensitive coloring composition of the present invention is
(A) Colorant (b) Alkali-soluble resin (c) Photopolymerization initiator (d) Ethylenically unsaturated compound is contained as an essential component, and if necessary, an adhesion improver such as a silane coupling agent and an interface. An activator (coating property improver), a pigment derivative, a photo-acid generator, a cross-linking agent, a mercapto compound, a polymerization inhibitor, a development improver, an ultraviolet absorber, an antioxidant, and other compounding ingredients, and the like. Usually, each compounding ingredient is used in a state of being dissolved or dispersed in a solvent.
<(a)着色剤>
 本発明の感光性着色組成物は、(a)着色剤を含有する。(a)着色剤を含有することで、適度な光吸収性、特に着色スペーサーなどの遮光部材を形成する用途に用いる場合には適度な遮光性を得ることができる。
 また、本発明の感光性着色組成物は、(a)着色剤の含有割合が、全固形分中2~20質量%である。このように(a)着色剤を特定量含有することにより、得られる硬化物、特に着色スペーサーにおいて、遮光性と高い機械的特性とを両立することが可能となる。
<(a) Colorant>
The photosensitive coloring composition of the present invention contains (a) a colorant. By containing the (a) colorant, it is possible to obtain a suitable light-absorbing property, particularly a suitable light-shielding property when used for forming a light-shielding member such as a colored spacer.
In the photosensitive coloring composition of the present invention, the content ratio of the (a) colorant is 2 to 20% by mass based on the total solid content. By containing a specific amount of the (a) colorant in this way, it becomes possible to achieve both a light-shielding property and high mechanical properties in the obtained cured product, especially in the colored spacer.
 (a)着色剤の含有割合は、全固形分中に2~20質量%であれば特に限定されないが、遮光性の観点からは、3質量%以上が好ましく、4質量%以上がより好ましく、5質量%以上がさらに好ましい。一方で、機械的特性の観点からは、18質量%以下が好ましく、15質量%以下がより好ましく、12質量%以下がさらに好ましく、10質量%以下がよりさらに好ましく、8質量%以下が特に好ましい。例えば、3~18質量%が好ましく、3~15質量%がより好ましく、4~12質量%がさらに好ましく、4~10質量%がよりさらに好ましく、5~8質量%が特に好ましい。 The content ratio of the (a) colorant is not particularly limited as long as it is 2 to 20 mass% in the total solid content, but from the viewpoint of light-shielding property, 3 mass% or more is preferable, and 4 mass% or more is more preferable. It is more preferably 5% by mass or more. On the other hand, from the viewpoint of mechanical properties, it is preferably 18% by mass or less, more preferably 15% by mass or less, further preferably 12% by mass or less, further preferably 10% by mass or less, and particularly preferably 8% by mass or less. .. For example, 3 to 18% by mass is preferable, 3 to 15% by mass is more preferable, 4 to 12% by mass is further preferable, 4 to 10% by mass is further preferable, and 5 to 8% by mass is particularly preferable.
 (a)着色剤としては、顔料を用いてもよいし、染料を用いてもよい。これらの中でも、耐久性の観点から、顔料を用いることが好ましい。 (A) As the colorant, a pigment or a dye may be used. Among these, it is preferable to use a pigment from the viewpoint of durability.
 本発明の感光性着色組成物において、(a)着色剤は紫色顔料を含み、かつ、(a)着色剤中の前記紫色顔料の含有割合が50質量%以上である。紫色顔料を(a)着色剤中に50質量%以上含むことで塗膜中の顔料の分散が均一になることにより、現像時の現像液への溶解性が均一となり、表面粗度が良好になると考えられる。また、紫色顔料は吸収スペクトルにおいて波長500~600nm付近に吸収ピークの極大吸収波長を有することから、紫色顔料を含むことで光学濃度(OD)を高くしやすい点からも有効である。一方で、波長400nm未満の吸収が少ないことから、(c)光重合開始剤の吸収波長との重なりが少なく、光硬化性、感度の観点からも有効である。また、波長450nmの吸収が少ないことから、液晶ディスプレイのバックライトから強く照射される青色光に対する耐光性の観点からも有効である。 In the photosensitive coloring composition of the present invention, the (a) colorant contains a purple pigment, and the content ratio of the purple pigment in the (a) colorant is 50% by mass or more. By including 50% by mass or more of the purple pigment in the colorant (a), the dispersion of the pigment in the coating film becomes uniform, so that the solubility in the developing solution during development becomes uniform and the surface roughness becomes good. It is considered to be. Further, since the violet pigment has the maximum absorption wavelength of the absorption peak in the vicinity of the wavelength of 500 to 600 nm in the absorption spectrum, it is effective in that the optical density (OD) can be easily increased by including the violet pigment. On the other hand, since absorption at a wavelength of less than 400 nm is small, there is little overlap with the absorption wavelength of the photopolymerization initiator (c), and it is effective from the viewpoint of photocurability and sensitivity. Further, since the absorption at the wavelength of 450 nm is small, it is effective from the viewpoint of light resistance to blue light strongly irradiated from the backlight of the liquid crystal display.
 紫色顔料としては、C.I.ピグメントバイオレット1、1:1、2、2:2、3、3:1、3:3、5、5:1、14、15、16、19、23、25、27、29、31、32、37、39、42、44、47、49、50を挙げることができる。この中でも、遮光性の観点から、好ましくはC.I.ピグメントバイオレット19、23、29、より好ましくはC.I.ピグメントバイオレット23、29を挙げることができる。一方で分散性や耐光性の点から、C.I.ピグメントバイオレット29を用いることが好ましい。 As a purple pigment, C.I. I. Pigment Violet 1, 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50 can be mentioned. Of these, C.I. I. Pigment Violet 19, 23, 29, more preferably C.I. I. Pigment Violet 23, 29 can be mentioned. On the other hand, from the viewpoint of dispersibility and light resistance, C.I. I. Pigment Violet 29 is preferably used.
 (a)着色剤中の紫色顔料の含有割合は50質量%以上であれば特に限定されないが、表面粗度向上の観点からは、55質量%以上が好ましく、58質量%以上がより好ましく、60質量%以上がさらに好ましく、62質量%以上がよりさらに好ましく、65質量%以上が特に好ましい。一方で、紫色顔料以外の着色剤の光学特性を利用し、吸収波長帯を幅広くするとの観点からは、90質量%以下が好ましく、80質量%以下がより好ましく、75質量%以下がさらに好ましい。例えば、50~90質量%が好ましく、55~90質量%がより好ましく、58~80質量%がさらに好ましく、60~80質量%がよりさらに好ましく、62~75質量%が特に好ましく、65~75質量%がとりわけ好ましい。 The content of the purple pigment in the colorant (a) is not particularly limited as long as it is 50% by mass or more, but from the viewpoint of improving the surface roughness, 55% by mass or more is preferable, 58% by mass or more is more preferable, and 60% by mass or more. Mass% or more is more preferable, 62 mass% or more is still more preferable, and 65 mass% or more is especially preferable. On the other hand, 90% by mass or less is preferable, 80% by mass or less is more preferable, and 75% by mass or less is still more preferable, from the viewpoint of widening the absorption wavelength band by utilizing the optical characteristics of the colorant other than the purple pigment. For example, it is preferably 50 to 90% by mass, more preferably 55 to 90% by mass, further preferably 58 to 80% by mass, further preferably 60 to 80% by mass, particularly preferably 62 to 75% by mass, and 65 to 75%. Mass% is especially preferred.
 (a)着色剤中のC.I.ピグメントバイオレット29の含有割合は特に限定されないが、表面粗度及び耐光性工場の観点からは、50質量%以上が好ましく、55質量%以上がより好ましく、60質量%以上がさらに好ましく、62質量%以上がよりさらに好ましく、65質量%以上が特に好ましい。一方で、C.I.ピグメントバイオレット29以外の着色剤の光学特性を利用し、吸収波長帯を幅広くするとの観点からは、90質量%以下が好ましく、80質量%以下がより好ましく、75質量%以下がさらに好ましい。例えば、50~90質量%が好ましく、55~90質量%がより好ましく、58~80質量%がさらに好ましく、60~80質量%がよりさらに好ましく、62~75質量%が特に好ましく、65~75質量%がとりわけ好ましい。 (A) C. in the colorant. I. The content ratio of Pigment Violet 29 is not particularly limited, but from the viewpoint of surface roughness and light resistance factory, it is preferably 50% by mass or more, more preferably 55% by mass or more, further preferably 60% by mass or more, and 62% by mass. The above is more preferable, and 65% by mass or more is particularly preferable. On the other hand, C.I. I. From the viewpoint of widening the absorption wavelength band by utilizing the optical characteristics of colorants other than Pigment Violet 29, it is preferably 90% by mass or less, more preferably 80% by mass or less, and further preferably 75% by mass or less. For example, it is preferably 50 to 90% by mass, more preferably 55 to 90% by mass, further preferably 58 to 80% by mass, further preferably 60 to 80% by mass, particularly preferably 62 to 75% by mass, and 65 to 75%. Mass% is especially preferred.
 (a)着色剤は紫色顔料以外の着色剤(以下、「その他の着色剤」と略記する。)を含んでいてもよい。その他の着色剤としては、顔料や染料が挙げられ、耐熱性の観点から顔料が好ましく、色調、光硬化性、感度の観点から有機顔料が好ましい。 (A) The colorant may include a colorant other than the purple pigment (hereinafter abbreviated as “other colorant”). Examples of other colorants include pigments and dyes. From the viewpoint of heat resistance, pigments are preferable, and from the viewpoints of color tone, photocurability and sensitivity, organic pigments are preferable.
 顔料としては、黄色顔料、橙色顔料、赤色顔料、青色顔料、緑色顔料、茶色顔料などの有機着色顔料が挙げられる。
 黄色顔料としては、C.I.ピグメントイエロー1、1:1、2、3、4、5、6、9、10、12、13、14、16、17、24、31、32、34、35、35:1、36、36:1、37、37:1、40、41、42、43、48、53、55、61、62、62:1、63、65、73、74、75、81、83、87、93、94、95、97、100、101、104、105、108、109、110、111、116、117、119、120、126、127、127:1、128、129、133、134、136、138、139、142、147、148、150、151、153、154、155、157、158、159、160、161、162、163、164、165、166、167、168、169、170、172、173、174、175、176、180、181、182、183、184、185、188、189、190、191、191:1、192、193、194、195、196、197、198、199、200、202、203、204、205、206、207、208を挙げることができる。この中でも、分散性、信頼性の観点からC.I.ピグメントイエロー83、117、129、138、139、150、154、155、180、185が好ましく、C.I.ピグメントイエロー138、139、150がさらに好ましく、遮光性の観点からC.I.ピグメントイエロー139が特に好ましい。
Examples of the pigment include organic coloring pigments such as yellow pigments, orange pigments, red pigments, blue pigments, green pigments and brown pigments.
Examples of the yellow pigment include C.I. I. Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35:1, 36, 36: 1, 37, 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62:1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206, 207, 208 can be mentioned. Among these, from the viewpoint of dispersibility and reliability, C.I. I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185, and C.I. I. Pigment Yellow 138, 139, and 150 are more preferable, and C.I. I. Pigment Yellow 139 is particularly preferable.
 橙色顔料(オレンジ顔料)としては、C.I.ピグメントオレンジ1、2、5、13、16、17、19、20、21、22、23、24、34、36、38、39、43、46、48、49、61、62、64、65、67、68、69、70、71、72、73、74、75、77、78、79を挙げることができる。この中でも、分散性や遮光性の点で、C.I.ピグメントオレンジ13、43、64、72を用いることが好ましく、感光性着色組成物を紫外線で硬化させる場合には、橙色顔料としては紫外線吸収率の低いものを使用することが好ましく、係る観点からはC.I.ピグメントオレンジ64、72を用いることがより好ましく、C.I.ピグメントオレンジ64が特に好ましい。 As an orange pigment (orange pigment), C.I. I. Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79. Among these, C.I. I. Pigment Orange 13, 43, 64, 72 is preferable, and when the photosensitive coloring composition is cured by ultraviolet rays, it is preferable to use an orange pigment having a low ultraviolet absorption rate. C. I. Pigment Orange 64, 72 is more preferable, and C.I. I. Pigment Orange 64 is particularly preferable.
 赤色顔料としては、C.I.ピグメントレッド1、2、3、4、5、6、7、8、9、12、14、15、16、17、21、22、23、31、32、37、38、41、47、48、48:1、48:2、48:3、48:4、49、49:1、49:2、50:1、52:1、52:2、53、53:1、53:2、53:3、57、57:1、57:2、58:4、60、63、63:1、63:2、64、64:1、68、69、81、81:1、81:2、81:3、81:4、83、88、90:1、101、101:1、104、108、108:1、109、112、113、114、122、123、144、146、147、149、151、166、168、169、170、172、173、174、175、176、177、178、179、181、184、185、187、188、190、193、194、200、202、206、207、208、209、210、214、216、220、221、224、230、231、232、233、235、236、237、238、239、242、243、245、247、249、250、251、253、254、255、256、257、258、259、260、262、263、264、265、266、267、268、269、270、271、272、273、274、275、276を挙げることができる。この中でも、遮光性、分散性の観点から好ましくはC.I.ピグメントレッド48:1、122、149、168、177、179、194、202、206、207、209、224、242、254、さらに好ましくはC.I.ピグメントレッド177、209、224、254を挙げることができる。なお、分散性や遮光性の点で、C.I.ピグメントレッド177、254、272を用いることが好ましく、感光性着色組成物を紫外線で硬化させる場合には、赤色顔料としては紫外線吸収率の低いものを使用することが好ましく、係る観点からはC.I.ピグメントレッド254、272を用いることがより好ましい。 As a red pigment, C.I. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1, 53:2, 53: 3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81:1, 81:2, 81: 3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276. Among these, C.I. I. Pigment Red 48:1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, 254, and more preferably C.I. I. Pigment Red 177, 209, 224, and 254. From the viewpoint of dispersibility and light shielding property, C.I. I. Pigment Red 177, 254, 272 is preferable, and when the photosensitive coloring composition is cured with ultraviolet rays, it is preferable to use a red pigment having a low ultraviolet absorption rate. I. Pigment Red 254 and 272 are more preferably used.
 青色顔料としては、C.I.ピグメントブルー1、1:2、9、14、15、15:1、15:2、15:3、15:4、15:6、16、17、19、25、27、28、29、33、35、36、56、56:1、60、61、61:1、62、63、66、67、68、71、72、73、74、75、76、78、79を挙げることができる。この中でも、遮光性の観点から好ましくはC.I.ピグメントブルー15、15:1、15:2、15:3、15:4、15:6、16、60、さらに好ましくはC.I.ピグメントブルー15:6、16を挙げることができる。
 なお、分散性や遮光性の点で、C.I.ピグメントブルー15:6、16、60を用いることが好ましく、感光性着色組成物を紫外線で硬化させる場合には、青色顔料としては紫外線吸収率の低いものを使用することが好ましく、かかる観点からはC.I.ピグメントブルー60を用いることがより好ましい。一方で、韓国登録特許第10-1840984号公報に記載のように、信頼性、遮光性、弾性復元率の観点からは、C.I.ピグメントブルー16を用いることが好ましい。
Examples of blue pigments include C.I. I. Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56:1, 60, 61, 61:1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, 79. Among these, C.I. I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 60, and more preferably C.I. I. Pigment Blue 15:6, 16 can be mentioned.
From the viewpoint of dispersibility and light shielding property, C.I. I. Pigment Blue 15:6, 16, 60, and when curing the photosensitive coloring composition with ultraviolet rays, it is preferable to use a blue pigment having a low ultraviolet absorption rate. C. I. It is more preferable to use Pigment Blue 60. On the other hand, as described in Korean Registered Patent No. 10-1840984, from the viewpoint of reliability, light-shielding property, and elastic recovery rate, C.I. I. Pigment Blue 16 is preferably used.
 緑色顔料としては、C.I.ピグメントグリーン1、2、4、7、8、10、13、14、15、17、18、19、26、36、45、48、50、51、54、55、58を挙げることができる。この中でも、分散性の観点から好ましくはC.I.ピグメントグリーン7、36を挙げることができる。 As a green pigment, C.I. I. Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55, 58. Among these, from the viewpoint of dispersibility, C.I. I. Pigment Green 7, 36 can be mentioned.
 茶色顔料(ブラウン顔料)としては、C.I.ピグメントブラウン23、25、26、28、38、41、83、93を挙げることができる。この中でも、近赤外線透過性と遮光性とを両立するとの観点から好ましくはC.I.ピグメントブラウン26、28、83、93を挙げることができる。 As the brown pigment (brown pigment), C.I. I. Pigment Brown 23, 25, 26, 28, 38, 41, 83, 93. Among these, from the viewpoint of achieving both near-infrared transparency and light-shielding properties, C.I. I. Pigment Brown 26, 28, 83, 93.
 これらの有機着色顔料の中でも、紫色顔料の吸収帯とは異なる波長400~500nm付近に吸収帯を有することから、橙色顔料が好ましい。
 橙色顔料を含む場合、(a)着色剤中の橙色顔料の含有割合は特に限定されないが、5質量%以上が好ましく、10質量%以上がより好ましく、20質量%以上がさらに好ましく、30質量%以上が特に好ましく、また、50質量%以下が好ましく、45質量%以下がより好ましく、40質量%以下がさらに好ましく、35質量%以下が特に好ましい。例えば、5~50質量%が好ましく、10~45質量%がより好ましく、20~40質量%がさらに好ましく、30~35質量%が特に好ましい。前記下限値以上とすることで光学濃度(OD)が高くなる傾向があり、また、前記上限値以下とすることで表面粗度が良好となる傾向がある。
Among these organic color pigments, the orange pigment is preferable because it has an absorption band near a wavelength of 400 to 500 nm, which is different from the absorption band of the purple pigment.
When an orange pigment is included, the content of the orange pigment in the (a) colorant is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 20% by mass or more, and 30% by mass. The above is particularly preferable, 50% by mass or less is preferable, 45% by mass or less is more preferable, 40% by mass or less is further preferable, and 35% by mass or less is particularly preferable. For example, 5 to 50 mass% is preferable, 10 to 45 mass% is more preferable, 20 to 40 mass% is further preferable, and 30 to 35 mass% is particularly preferable. When it is at least the lower limit, the optical density (OD) tends to be high, and when it is at most the upper limit, the surface roughness tends to be good.
 一方で、橙色顔料を含む場合には耐光性が悪化する傾向があるため、耐光性向上の観点からは(a)着色剤中の橙色顔料の含有割合は50質量%以下が好ましく、40質量%以下がより好ましく、30質量%以下がさらに好ましく、20質量%以下がよりさらに好ましく、10質量%以下が特に好ましく、0質量%が最も好ましい。 On the other hand, when an orange pigment is included, the light resistance tends to deteriorate. Therefore, from the viewpoint of improving the light resistance, the content ratio of the orange pigment in the (a) colorant is preferably 50% by mass or less, and 40% by mass. The following is more preferable, 30% by mass or less is further preferable, 20% by mass or less is further preferable, 10% by mass or less is particularly preferable, and 0% by mass is most preferable.
 また、青色顔料を含む場合には表面粗度が悪化する傾向があるため、(a)着色剤中の青色顔料の含有割合は50質量%以下が好ましく、40質量%以下がより好ましく、30質量%以下がさらに好ましく、20質量%以下がよりさらに好ましく、10質量%以下が特に好ましく、0質量%が最も好ましい。 Further, since the surface roughness tends to deteriorate when a blue pigment is contained, the content ratio of the blue pigment in the (a) colorant is preferably 50% by mass or less, more preferably 40% by mass or less, and 30% by mass. % Or less is more preferable, 20% by mass or less is still more preferable, 10% by mass or less is particularly preferable, and 0% by mass is most preferable.
 青色顔料の中でもC.I.ピグメントブルー60を含む場合には表面粗度が悪化する傾向があるため、(a)着色剤中のC.I.ピグメントブルー60の含有割合は50質量%以下が好ましく、40質量%以下がより好ましく、30質量%以下がさらに好ましく、20質量%以下がよりさらに好ましく、10質量%以下が特に好ましく、0質量%が最も好ましい。 Among the blue pigments, C.I. I. When CI Pigment Blue 60 is contained, the surface roughness tends to deteriorate, so that C.I. I. The content ratio of Pigment Blue 60 is preferably 50% by mass or less, more preferably 40% by mass or less, further preferably 30% by mass or less, further preferably 20% by mass or less, particularly preferably 10% by mass or less, and 0% by mass. Is most preferred.
 また、その他の着色剤として黒色顔料を含んでいてもよい。黒色顔料としては、有機黒色顔料や無機黒色顔料が挙げられる。
 有機黒色顔料として例えば、下記式(1)で表される化合物、該化合物の幾何異性体、該化合物の塩、及び該化合物の幾何異性体の塩からなる群から選ばれる少なくとも1種を含む有機黒色顔料が挙げられる。
Further, a black pigment may be included as another colorant. Examples of black pigments include organic black pigments and inorganic black pigments.
As the organic black pigment, for example, an organic compound containing at least one selected from the group consisting of a compound represented by the following formula (1), a geometrical isomer of the compound, a salt of the compound, and a salt of the geometrical isomer of the compound. Black pigments may be mentioned.
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
 式(1)中、R1及びR6は各々独立に水素原子、CH3、CF3、フッ素原子又は塩素原子である;
2、R3、R4、R5、R7、R8、R9及びR10は各々独立に水素原子、ハロゲン原子、R11、COOH、COOR11、COO-、CONH2、CONHR11、CONR1112、CN、OH、OR11、COCR11、OOCNH2、OOCNHR11、OOCNR1112、NO2、NH2、NHR11、NR1112、NHCOR12、NR11COR12、N=CH2、N=CHR11、N=CR1112、SH、SR11、SOR11、SO211、SO311、SO3H、SO3 -、SO2NH2、SO2NHR11又はSO2NR1112である;
且つ、R2とR3、R3とR4、R4とR5、R7とR8、R8とR9、及びR9とR10からなる群から選ばれる少なくとも1つの組み合わせは、互いに直接結合することもでき、又は酸素原子、硫黄原子、NH若しくはNR11ブリッジによって互いに結合することもできる;
11及びR12は各々独立に、炭素数1~12のアルキル基、炭素数3~12のシクロアルキル基、炭素数2~12のアルケニル基、炭素数3~12のシクロアルケニル基又は炭素数2~12のアルキニル基である。
In formula (1), R 1 and R 6 are each independently a hydrogen atom, CH 3 , CF 3 , a fluorine atom or a chlorine atom;
R 2 , R 3 , R 4 , R 5 , R 7 , R 8 , R 9 and R 10 are each independently a hydrogen atom, a halogen atom, R 11 , COOH, COOR 11 , COO , CONH 2 , CONHR 11 , CONR 11 R 12 , CN, OH, OR 11 , COCR 11 , OOCNH 2 , OOCNHR 11 , OOCNR 11 R 12 , NO 2 , NH 2 , NHR 11 , NR 11 R 12 , NHCOR 12 , NR 11 COR 12 , N= CH 2 , N=CHR 11 , N=CR 11 R 12 , SH, SR 11 , SOR 11 , SO 2 R 11 , SO 3 R 11 , SO 3 H, SO 3 , SO 2 NH 2 , SO 2 NHR 11 Or SO 2 NR 11 R 12 ;
At least one combination selected from the group consisting of R 2 and R 3 , R 3 and R 4 , R 4 and R 5 , R 7 and R 8 , R 8 and R 9 , and R 9 and R 10 , They can be bonded directly to each other or by oxygen, sulfur, NH or NR 11 bridges;
R 11 and R 12 are each independently an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or a carbon number. 2 to 12 alkynyl groups.
 一般式(1)で表される化合物の幾何異性体は、以下のコア構造を有し(ただし、構造式中の置換基は省略している)、トランス-トランス異性体が恐らく最も安定である。 The geometric isomer of the compound represented by the general formula (1) has the following core structure (however, the substituents in the structural formula are omitted), and the trans-trans isomer is probably the most stable. ..
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
 一般式(1)で表される化合物がアニオン性である場合、その電荷を任意の公知の適したカチオン、例えば金属、有機、無機又は金属有機カチオン、具体的にはアルカリ金属、アルカリ土類金属、遷移金属、一級アンモニウム、二級アンモニウム、トリアルキルアンモニウムなどの三級アンモニウム、テトラアルキルアンモニウムなどの四級アンモニウム又は有機金属錯体によって補償した塩であることが好ましい。また、一般式(1)で表される化合物の幾何異性体がアニオン性である場合、同様の塩であることが好ましい。 When the compound represented by the general formula (1) is anionic, its charge is any known suitable cation, for example, a metal, organic, inorganic or metal organic cation, specifically, an alkali metal or an alkaline earth metal. It is preferable that the salt is compensated by a transition metal, a primary ammonium, a secondary ammonium, a tertiary ammonium such as trialkylammonium, a quaternary ammonium such as tetraalkylammonium, or an organometallic complex. Further, when the geometric isomer of the compound represented by the general formula (1) is anionic, it is preferably the same salt.
 一般式(1)の置換基及びそれらの定義においては、遮蔽率が高くなる傾向があることから、以下が好ましい。これは、以下の置換基は吸収がなく、顔料の色相に影響しないと考えられるからである。
 R2、R4、R5、R7、R9及びR10は各々独立に好ましくは水素原子、フッ素原子、又は塩素原子であり、さらに好ましくは水素原子である。
 R3及びR8は各々独立に好ましくは水素原子、NO2、OCH3、OC25、臭素原子、塩素原子、CH3、C25、N(CH32、N(CH3)(C25)、N(C252、α-ナフチル、β-ナフチル、SO3H又はSO3 -であり、さらに好ましくは水素原子又はSO3Hである。
In the substituents of the general formula (1) and their definitions, the following is preferable because the shielding rate tends to be high. This is because the following substituents have no absorption and are considered not to affect the hue of the pigment.
R 2 , R 4 , R 5 , R 7 , R 9 and R 10 are each independently preferably a hydrogen atom, a fluorine atom or a chlorine atom, and more preferably a hydrogen atom.
R 3 and R 8 are preferably each independently a hydrogen atom, NO 2 , OCH 3 , OC 2 H 5 , a bromine atom, a chlorine atom, CH 3 , C 2 H 5 , N(CH 3 ) 2 , N(CH 3 )(C 2 H 5 ), N(C 2 H 5 ) 2 , α-naphthyl, β-naphthyl, SO 3 H or SO 3 , and more preferably a hydrogen atom or SO 3 H.
 R1及びR6は各々独立に好ましくは水素原子、CH3又はCF3であり、さらに好ましくは水素原子である。
 好ましくは、R1とR6、R2とR7、R3とR8、R4とR9、およびR5とR10からなる群から選ばれる少なくとも1つの組み合わせが同一であり、より好ましくは、R1はR6と同一であり、R2はR7と同一であり、R3はR8と同一であり、R4はR9と同一であり、かつ、R5はR10と同一である。
R 1 and R 6 are each independently preferably a hydrogen atom, CH 3 or CF 3 , and more preferably a hydrogen atom.
Preferably, at least one combination selected from the group consisting of R 1 and R 6 , R 2 and R 7 , R 3 and R 8 , R 4 and R 9 , and R 5 and R 10 is the same, and more preferably R 1 is the same as R 6 , R 2 is the same as R 7 , R 3 is the same as R 8 , R 4 is the same as R 9 , and R 5 is the same as R 10 . It is the same.
 炭素数1~12のアルキル基は、例えばメチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、イソブチル基、tert-ブチル基、2-メチルブチル基、n-ペンチル基、2-ペンチル基、3-ペンチル基、2,2-ジメチルプロピル基、n-ヘキシル基、ヘプチル基、n-オクチル基、1,1,3,3-テトラメチルブチル基、2-エチルヘキシル基、ノニル基、デシル基、ウンデシル基又はドデシル基である。 Examples of the alkyl group having 1 to 12 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, isobutyl group, tert-butyl group, 2-methylbutyl group, n- Pentyl group, 2-pentyl group, 3-pentyl group, 2,2-dimethylpropyl group, n-hexyl group, heptyl group, n-octyl group, 1,1,3,3-tetramethylbutyl group, 2-ethylhexyl group Group, nonyl group, decyl group, undecyl group or dodecyl group.
 炭素数3~12のシクロアルキル基は、例えば、シクロプロピル基、シクロプロピルメチル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘキシルメチル基、トリメチルシクロヘキシル基、ツジル基、ノルボルニル基、ボルニル基、ノルカリル基、カリル基、メンチル基、ノルピニル基、ピニル基、1-アダマンチル基又は2-アダマンチル基である。 Examples of the cycloalkyl group having 3 to 12 carbon atoms include cyclopropyl group, cyclopropylmethyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cyclohexylmethyl group, trimethylcyclohexyl group, tsudyl group, norbornyl group, bornyl group and norcalyl group. A caryl group, a menthyl group, a norpinyl group, a pinyl group, a 1-adamantyl group or a 2-adamantyl group.
 炭素数2~12のアルケニル基は、例えば、ビニル基、アリル基、2-プロペン-2-イル基、2-ブテン-1-イル基、3-ブテン-1-イル基、1,3-ブタジエン-2-イル基、2-ペンテン-1-イル基、3-ペンテン-2-イル基、2-メンチル-1-ブテン-3-イル基、2-メチル-3-ブテン-2-イル基、3-メチル-2-ブテン-1-イル基、1,4-ペンタジエン-3-イル基、ヘキセニル基、オクテニル基、ノネニル基、デセニル基又はドデセニル基である。 Examples of the alkenyl group having 2 to 12 carbon atoms include vinyl group, allyl group, 2-propen-2-yl group, 2-buten-1-yl group, 3-buten-1-yl group and 1,3-butadiene. -2-yl group, 2-penten-1-yl group, 3-penten-2-yl group, 2-menthyl-1-buten-3-yl group, 2-methyl-3-buten-2-yl group, It is a 3-methyl-2-buten-1-yl group, a 1,4-pentadien-3-yl group, a hexenyl group, an octenyl group, a nonenyl group, a decenyl group or a dodecenyl group.
 炭素数3~12のシクロアルケニル基は、例えば、2-シクロブテン-1-イル基、2-シクロペンテン-1-イル基、2-シクロヘキセン-1-イル基、3-シクロヘキセン-1-イル基、2,4-シクロヘキサジエン-1-イル基、1-p-メンテン-8-イル基、4(10)-ツジェン-10-イル基、2-ノルボルネン-1-イル基、2,5-ノルボルナジエン-1-イル基、7,7-ジメチル-2,4-ノルカラジエン-3-イル基又はカンフェニル基である。 The cycloalkenyl group having 3 to 12 carbon atoms includes, for example, 2-cyclobuten-1-yl group, 2-cyclopenten-1-yl group, 2-cyclohexen-1-yl group, 3-cyclohexen-1-yl group, 2 ,4-cyclohexadiene-1-yl group, 1-p-menthen-8-yl group, 4(10)-tugen-10-yl group, 2-norbornen-1-yl group, 2,5-norbornadiene-1 An -yl group, a 7,7-dimethyl-2,4-norcaradien-3-yl group or a camphenyl group.
 炭素数2~12のアルキニル基は、例えば、1-プロピン-3-イル基、1-ブチン-4-イル基、1-ペンチン-5-イル基、2-メチル-3-ブチン-2-イル基、1,4-ペンタジイン-3-イル基、1,3-ペンタジイン-5-イル基、1-ヘキシン-6-イル基、シス-3-メチル-2-ペンテン-4-イン-1-イル基、トランス-3-メチル-2-ペンテン-4-イン-1-イル基、1,3-ヘキサジイン-5-イル基、1-オクチン-8-イル基、1-ノニン-9-イル基、1-デシン-10-イル基又は1-ドデシン-12-イル基である。 The alkynyl group having 2 to 12 carbon atoms is, for example, 1-propyn-3-yl group, 1-butyn-4-yl group, 1-pentyn-5-yl group, 2-methyl-3-butyn-2-yl group. Group, 1,4-pentadiyn-3-yl group, 1,3-pentadiyn-5-yl group, 1-hexyn-6-yl group, cis-3-methyl-2-penten-4-yn-1-yl group Group, trans-3-methyl-2-penten-4-yn-1-yl group, 1,3-hexadiyn-5-yl group, 1-octin-8-yl group, 1-nonin-9-yl group, It is a 1-decyn-10-yl group or a 1-dodecin-12-yl group.
 ハロゲン原子は、例えば、フッ素原子、塩素原子、臭素原子又はヨウ素原子である。 The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
 前記一般式(1)で表される有機黒色顔料は、好ましくは下記一般式(2)で表される化合物及び/又は該化合物の幾何異性体である。 The organic black pigment represented by the general formula (1) is preferably a compound represented by the following general formula (2) and/or a geometrical isomer of the compound.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 このような有機黒色顔料の具体例としては、商品名で、Irgaphor(登録商標) Black S 0100 CF(BASF社製)が挙げられる。
 この有機黒色顔料は、好ましくは後述される分散剤、溶剤、方法によって分散して使用される。また、分散の際に前記一般式(2)で表される化合物又は該化合物の幾何異性体のスルホン酸誘導体が存在すると、分散性や保存性が向上する場合がある。
 また、有機黒色顔料として、光学特性と信頼性の観点から、韓国公開特許第10-2018-0052502号公報に記載されている有機黒色顔料や、韓国公開特許第10-2018-0052864号公報に記載されている有機黒色顔料を用いることが好ましい。
Specific examples of such an organic black pigment include Irgaphor (registered trademark) Black S 0100 CF (manufactured by BASF) under the trade name.
This organic black pigment is preferably used after being dispersed by a dispersant, a solvent and a method described later. Further, the presence of the compound represented by the general formula (2) or the sulfonic acid derivative of the geometrical isomer of the compound at the time of dispersion may improve the dispersibility and the storage stability.
In addition, as the organic black pigment, from the viewpoint of optical characteristics and reliability, the organic black pigment described in Korean Published Patent No. 10-2018-0052502 and Korean Published Patent No. 10-2018-0052864 are described. It is preferable to use the known organic black pigment.
 また、その他の有機黒色顔料として、アニリンブラック、シアニンブラック、ペリレンブラック等も挙げられる。
 また、無機黒色顔料であるカーボンブラックを用いてもよい。カーボンブラックの例としては、以下のようなカーボンブラックが挙げられる。
Other organic black pigments include aniline black, cyanine black, perylene black and the like.
Further, carbon black which is an inorganic black pigment may be used. Examples of carbon black include the following carbon blacks.
 三菱ケミカル社製:MA7、MA8、MA11、MA77、MA100、MA100R、MA100S、MA220、MA230、MA600、MCF88、#5、#10、#20、#25、#30、#32、#33、#40、#44、#45、#47、#50、#52、#55、#650、#750、#850、#900、#950、#960、#970、#980、#990、#1000、#2200、#2300、#2350、#2400、#2600、#2650、#3030、#3050、#3150、#3250、#3400、#3600、#3750、#3950、#4000、#4010、OIL7B、OIL9B、OIL11B、OIL30B、OIL31B
 デグサ社製:Printex(登録商標、以下同じ。)3、Printex3OP、Printex30、Printex30OP、Printex40、Printex45、Printex55、Printex60、Printex75、Printex80、Printex85、Printex90、Printex A、Printex L、Printex G、Printex P、Printex U、Printex V、SpecialBlack550、SpecialBlack350、SpecialBlack250、SpecialBlack100、SpecialBlack6、SpecialBlack5、SpecialBlack4、Color Black FW1、Color Black FW2、Color Black FW2V、Color Black FW18、Color Black FW200、Color Black S160、Color Black S170
 キャボット社製:Monarch(登録商標、以下同じ。)120、Monarch280、Monarch460、Monarch800、Monarch880、Monarch900、Monarch1000、Monarch1100、Monarch1300、Monarch1400、Monarch4630、REGAL(登録商標、以下同じ。)99、REGAL99R、REGAL415、REGAL415R、REGAL250、REGAL250R、REGAL330、REGAL400R、REGAL55R0、REGAL660R、BLACK PEARLS480、PEARLS130、VULCAN(登録商標) XC72R、ELFTEX(登録商標)-8
 ビルラー社製:RAVEN(登録商標、以下同じ。)11、RAVEN14、RAVEN15、RAVEN16、RAVEN22、RAVEN30、RAVEN35、RAVEN40、RAVEN410、RAVEN420、RAVEN450、RAVEN500、RAVEN780、RAVEN850、RAVEN890H、RAVEN1000、RAVEN1020、RAVEN1040、RAVEN1060U、RAVEN1080U、RAVEN1170、RAVEN1190U、RAVEN1250、RAVEN1500、RAVEN2000、RAVEN2500U、RAVEN3500、RAVEN5000、RAVEN5250、RAVEN5750、RAVEN7000
Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA77, MA100, MA100R, MA100S, MA220, MA230, MA600, MCF88, #5, #10, #20, #25, #30, #32, #33, #40. , #44, #45, #47, #50, #52, #55, #650, #750, #850, #900, #950, #960, #970, #980, #990, #1000, #. 2200, #2300, #2350, #2400, #2600, #2650, #3030, #3050, #3150, #3250, #3400, #3600, #3750, #3950, #4000, #4010, OIL7B, OIL9B. , OIL11B, OIL30B, OIL31B
Degussa: Printex (registered trademark; the same applies hereinafter) 3, Printex3OP, Printex30, Printex30OP, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Printex90, PrintexPrintG, PrintexL, PrintexA, Printex90. U, Printex V, SpecialBlack550, SpecialBlack350, SpecialBlack250, SpecialBlack100, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW200, Color Black S160, Color Black S170
Made by Cabot: Monarch (registered trademark, the same applies hereinafter) 120, Monarch 280, Monarch 460, Monarch 800, Monarch 880, Monarch 900, Monarch 1000, Monarch 1100, Monarch 1300, Monarch 1400, Monarch 4630, REGAL (registered trademark, REGAL, REGAL, REGAL 15R, REGAL, REGAL (registered trademark, REGA 4; REGAL415R, REGAL250, REGAL250R, REGAL330, REGAL400R, REGAL55R0, REGAL660R, BLACK PEARLS480, PEARLS130, VULCAN (registered trademark) XC72R, ELFTEX (registered trademark)-8
Birla Corporation: RAVEN (. Registered trademark, hereinafter the same) 11, RAVEN14, RAVEN15, RAVEN16, RAVEN22, RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN780, RAVEN850, RAVEN890H, RAVEN1000, RAVEN1020, RAVEN1040, RAVEN1060U , RAVEN1080U, RAVEN1170, RAVEN1190U, RAVEN1250, RAVEN1500, RAVEN2000, RAVEN2500U, RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750, RAVEN7000.
 カーボンブラックは、樹脂で被覆されたものを使用しても構わない。樹脂で被覆されたカーボンブラックを使用すると、ガラス基板への密着性や体積抵抗値を向上させる効果がある。樹脂で被覆されたカーボンブラックとしては、例えば日本国特開平09-71733号公報に記載されているカーボンブラック等が好適に使用できる。体積抵抗や誘電率の点で、樹脂被覆カーボンブラックが好適に用いられる。 Carbon black coated with resin may be used. The use of resin-coated carbon black has the effect of improving the adhesion to the glass substrate and the volume resistance value. As the carbon black coated with a resin, for example, carbon black described in Japanese Patent Laid-Open No. 09-71733 can be preferably used. Resin-coated carbon black is preferably used in terms of volume resistance and dielectric constant.
 これらの顔料は、平均粒子径が通常1μm以下、好ましくは0.5μm以下、さらに好ましくは0.25μm以下となるよう、分散して用いることが好ましい。ここで平均粒子径の基準は顔料粒子の数である。
 なお、感光性着色組成物において、顔料の平均粒子径は、動的光散乱(DLS)により測定された顔料粒子径から求めた値である。粒子径測定は、十分に希釈された感光性着色組成物(通常は希釈して、顔料濃度0.005~0.2質量%程度に調製。但し測定機器により推奨された濃度があれば、その濃度に従う)に対して行い、25℃にて測定する。
It is preferable that these pigments are dispersed and used so that the average particle diameter is usually 1 μm or less, preferably 0.5 μm or less, and more preferably 0.25 μm or less. Here, the standard of the average particle diameter is the number of pigment particles.
In the photosensitive coloring composition, the average particle diameter of the pigment is a value obtained from the pigment particle diameter measured by dynamic light scattering (DLS). The particle size is measured by sufficiently diluting the photosensitive coloring composition (usually diluted to prepare a pigment concentration of about 0.005 to 0.2% by mass. However, if there is a concentration recommended by the measuring device, (According to concentration) and measured at 25°C.
 また、上述の顔料の他に、染料を使用してもよい。染料としては、アゾ系染料、アントラキノン系染料、フタロシアニン系染料、キノンイミン系染料、キノリン系染料、ニトロ系染料、カルボニル系染料、メチン系染料等が挙げられる。
 アゾ系染料としては、例えば、C.I.アシッドイエロー11、C.I.アシッドオレンジ7、C.I.アシッドレッド37、C.I.アシッドレッド180、C.I.アシッドブルー29、C.I.ダイレクトレッド28、C.I.ダイレクトレッド83、C.I.ダイレクトイエロー12、C.I.ダイレクトオレンジ26、C.I.ダイレクトグリーン28、C.I.ダイレクトグリーン59、C.I.リアクティブイエロー2、C.I.リアクティブレッド17、C.I.リアクティブレッド120、C.I.リアクティブブラック5、C.I.ディスパースオレンジ5、C.I.ディスパースレッド58、C.I.ディスパースブルー165、C.I.ベーシックブルー41、C.I.ベーシックレッド18、C.I.モルダントレッド7、C.I.モルダントイエロー5、C.I.モルダントブラック7等が挙げられる。
In addition to the above-mentioned pigment, a dye may be used. Examples of the dyes include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes, quinoline dyes, nitro dyes, carbonyl dyes and methine dyes.
Examples of azo dyes include C.I. I. Acid Yellow 11, C.I. I. Acid Orange 7, C.I. I. Acid Red 37, C.I. I. Acid Red 180, C.I. I. Acid Blue 29, C.I. I. Direct Red 28, C.I. I. Direct Red 83, C.I. I. Direct Yellow 12, C.I. I. Direct Orange 26, C.I. I. Direct Green 28, C.I. I. Direct Green 59, C.I. I. Reactive Yellow 2, C.I. I. Reactive Red 17, C.I. I. Reactive Red 120, C.I. I. Reactive Black 5, C.I. I. Disperse Orange 5, C.I. I. Disperse Red 58, C.I. I. Disperse Blue 165, C.I. I. Basic Blue 41, C.I. I. Basic Red 18, C.I. I. Mordant Red 7, C.I. I. Moldant Yellow 5, C.I. I. Moldant Black 7 and the like can be mentioned.
 アントラキノン系染料としては、例えば、C.I.バットブルー4、C.I.アシッドブルー40、C.I.アシッドグリーン25、C.I.リアクティブブルー19、C.I.リアクティブブルー49、C.I.ディスパースレッド60、C.I.ディスパースブルー56、C.I.ディスパースブルー60等が挙げられる。
 この他、フタロシアニン系染料として、例えば、C.I.パッドブルー5等が、キノンイミン系染料として、例えば、C.I.ベーシックブルー3、C.I.ベーシックブルー9等が、キノリン系染料として、例えば、C.I.ソルベントイエロー33、C.I.アシッドイエロー3、C.I.ディスパースイエロー64等が、ニトロ系染料として、例えば、C.I.アシッドイエロー1、C.I.アシッドオレンジ3、C.I.ディスパースイエロー42等が挙げられる。
Examples of anthraquinone dyes include C.I. I. Bat Blue 4, C.I. I. Acid Blue 40, C.I. I. Acid Green 25, C.I. I. Reactive Blue 19, C.I. I. Reactive Blue 49, C.I. I. Disperse Red 60, C.I. I. Disperse Blue 56, C.I. I. Examples include Disperse Blue 60 and the like.
In addition, phthalocyanine dyes such as C.I. I. Pad Blue 5 and the like are quinone imine dyes such as C.I. I. Basic Blue 3, C.I. I. Basic Blue 9 and the like are quinoline dyes such as C.I. I. Solvent Yellow 33, C.I. I. Acid Yellow 3, C.I. I. Disperse Yellow 64 and the like are nitro dyes such as C.I. I. Acid Yellow 1, C.I. I. Acid Orange 3, C.I. I. Examples include Disperse Yellow 42 and the like.
<(b)アルカリ可溶性樹脂>
 本発明で用いる(b)アルカリ可溶性樹脂としては、カルボキシル基又は水酸基を含む樹脂であれば特に限定はなく、例えばエポキシ(メタ)アクリレート系樹脂、アクリル系樹脂、カルボキシル基含有エポキシ樹脂、カルボキシル基含有ウレタン樹脂、ノボラック系樹脂、ポリビニルフェノール系樹脂等が挙げられるが、中でも
 (b1)エポキシ(メタ)アクリレート系樹脂
 (b2)アクリル共重合樹脂
が優れた製版性の観点から好適に用いられる。これらは1種を単独で、或いは複数種を混合して使用することができる。
<(b) Alkali-soluble resin>
The (b) alkali-soluble resin used in the present invention is not particularly limited as long as it is a resin containing a carboxyl group or a hydroxyl group, and examples thereof include epoxy (meth)acrylate resin, acrylic resin, carboxyl group-containing epoxy resin, and carboxyl group-containing resin. Examples thereof include urethane resins, novolac resins, polyvinylphenol resins, and the like. Among them, (b1) epoxy (meth)acrylate resin (b2) acrylic copolymer resin is preferably used from the viewpoint of excellent plate-making property. These may be used alone or in combination of two or more.
 <(b1)エポキシ(メタ)アクリレート系樹脂>
 (b1)エポキシ(メタ)アクリレート系樹脂は、エポキシ樹脂(エポキシ化合物)とα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルとの反応物の、反応で生成した水酸基にさらに多塩基酸、及び/又はその無水物を反応させて得られる樹脂である。
 また上記、多塩基酸及び/又はその無水物を水酸基と反応させる前に、該水酸基と反応し得る置換基を2個以上有する化合物を反応させた後、多塩基酸、及び/又はその無水物を反応させて得られる樹脂も、上記(b1)エポキシ(メタ)アクリレート系樹脂に含まれる。
<(b1) Epoxy (meth)acrylate resin>
The (b1) epoxy (meth)acrylate resin is a reaction product of an epoxy resin (epoxy compound) and an α,β-unsaturated monocarboxylic acid and/or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group. , A resin obtained by further reacting a polybasic acid and/or its anhydride with the hydroxyl group generated by the reaction.
In addition, before reacting the polybasic acid and/or its anhydride with a hydroxyl group, after reacting a compound having two or more substituents capable of reacting with the hydroxyl group, the polybasic acid and/or its anhydride The resin obtained by reacting with is also included in the above (b1) epoxy (meth)acrylate resin.
 また上記反応で得られた樹脂のカルボキシル基に、さらに反応し得る官能基を有する化合物を反応させて得られる樹脂も、上記(b1)エポキシ(メタ)アクリレート系樹脂に含まれる。
 このように、エポキシ(メタ)アクリレート系樹脂は化学構造上、実質的にエポキシ基を有さず、かつ「(メタ)アクリレート」に限定されるものではないが、エポキシ化合物(エポキシ樹脂)が原料であり、かつ、「(メタ)アクリレート」が代表例であるので慣用に従いこのように命名されている。
A resin obtained by reacting a compound having a functional group capable of further reacting with a carboxyl group of the resin obtained by the above reaction is also included in the above (b1) epoxy (meth)acrylate resin.
As described above, the epoxy (meth)acrylate resin does not substantially have an epoxy group in the chemical structure and is not limited to “(meth)acrylate”, but an epoxy compound (epoxy resin) is used as a raw material. , And "(meth)acrylate" is a typical example, and thus is so named in a conventional manner.
 本発明で用いる(b1)エポキシ(メタ)アクリレート系樹脂としては、具体的には、下記エポキシ(メタ)アクリレート系樹脂(b1-1)及び/又はエポキシ(メタ)アクリレート系樹脂(b1-2)(以下「カルボキシル基含有エポキシ(メタ)アクリレート系樹脂」と称す場合がある。)が現像性、信頼性の観点から好適に用いられる。 Specific examples of the (b1) epoxy (meth)acrylate-based resin used in the present invention include the following epoxy (meth)acrylate-based resin (b1-1) and/or epoxy (meth)acrylate-based resin (b1-2). (Hereinafter, it may be referred to as a “carboxyl group-containing epoxy (meth)acrylate-based resin”.) is preferably used from the viewpoint of developability and reliability.
 <エポキシ(メタ)アクリレート系樹脂(b1-1)>
 エポキシ樹脂にα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルを付加させ、さらに、多塩基酸及び/又はその無水物を反応させることによって得られたアルカリ可溶性樹脂。
 <エポキシ(メタ)アクリレート系樹脂(b1-2)>
 エポキシ樹脂にα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルを付加させ、さらに、多価アルコール、並びに多塩基酸及び/又はその無水物と反応させることによって得られたアルカリ可溶性樹脂。
<Epoxy (meth)acrylate resin (b1-1)>
Obtained by adding an α,β-unsaturated monocarboxylic acid and/or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, and further reacting a polybasic acid and/or its anhydride Alkali-soluble resin.
<Epoxy (meth)acrylate resin (b1-2)>
An α,β-unsaturated monocarboxylic acid and/or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group is added to an epoxy resin, and a polyhydric alcohol and a polybasic acid and/or an anhydride thereof are further added. An alkali-soluble resin obtained by reacting.
 ここで、エポキシ樹脂とは、熱硬化により樹脂を形成する以前の原料化合物をも含めて言うこととし、そのエポキシ樹脂としては、公知のエポキシ樹脂の中から適宜選択して用いることができる。また、エポキシ樹脂は、フェノール性化合物とエピハロヒドリンとを反応させて得られる化合物を用いることができる。フェノール性化合物としては、2価以上のフェノール性水酸基を有する化合物が好ましく、単量体でも重合体でもよい。
 原料となるエポキシ樹脂の種類としては、クレゾールノボラック型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、トリスフェノールメタン型エポキシ樹脂、ビフェニルノボラック型エポキシ樹脂、ナフタレンノボラック型エポキシ樹脂、ジシクロペンタジエンとフェノール又はクレゾールとの重付加反応物とエピハロヒドリンとの反応生成物であるエポキシ樹脂、アダマンチル基含有エポキシ樹脂、フルオレン型エポキシ樹脂等を好適に用いることができ、このように主鎖に芳香族環を有するものを好適に用いることができる。
Here, the epoxy resin includes the raw material compound before forming the resin by thermosetting, and the epoxy resin can be appropriately selected and used from known epoxy resins. The epoxy resin may be a compound obtained by reacting a phenolic compound with epihalohydrin. The phenolic compound is preferably a compound having a divalent or higher valent phenolic hydroxyl group, and may be a monomer or a polymer.
The type of epoxy resin used as a raw material includes cresol novolac type epoxy resin, phenol novolac type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, trisphenolmethane type epoxy resin, biphenyl novolac type epoxy resin, naphthalene novolac type. Epoxy resin, epoxy resin which is a reaction product of polyaddition reaction product of dicyclopentadiene and phenol or cresol and epihalohydrin, adamantyl group-containing epoxy resin, fluorene type epoxy resin and the like can be preferably used. Those having an aromatic ring in the main chain can be preferably used.
 また、エポキシ樹脂の具体例としては、例えば、ビスフェノールA型エポキシ樹脂(例えば、三菱ケミカル社製の「jER(登録商標、以下同じ。)-828」、「jER-1001」、「jER-1002」、「jER-1004」、日本化薬社製の「NER-1302」(エポキシ当量323,軟化点76℃)等)、ビスフェノールF型樹脂(例えば、三菱ケミカル社製の「jER-807」、「jER-4004P」、「jER-4005P」、「jER-4007P」、日本化薬社製の「NER-7406」(エポキシ当量350,軟化点66℃)等)、ビスフェノールS型エポキシ樹脂、ビフェニルグリシジルエーテル(例えば、三菱ケミカル社製の「jER-YX4000」)、フェノールノボラック型エポキシ樹脂(例えば、日本化薬社製の「EPPN-201」、三菱ケミカル社製の「jER-152」、「jER-154」、ダウケミカル社製の「DEN-438」)、(o,m,p-)クレゾールノボラック型エポキシ樹脂(例えば、日本化薬社製の「EOCN(登録商標、以下同じ。)-102S」、「EOCN-1020」、「EOCN-104S」)、トリグリシジルイソシアヌレート(例えば、日産化学社製の「TEPIC(登録商標)」)、トリスフェノールメタン型エポキシ樹脂(例えば、日本化薬社製の「EPPN(登録商標、以下同じ。)-501」、「EPPN-502」、「EPPN-503」)、脂環式エポキシ樹脂(ダイセル社製の「セロキサイド(登録商標、以下同じ。)2021P」、「セロキサイドEHPE」)、ジシクロペンタジエンとフェノールの反応によるフェノール樹脂をグリシジル化したエポキシ樹脂(例えば、DIC社製の「EXA-7200」、日本化薬社製の「NC-7300」)、下記一般式(B1)~(B4)で表されるエポキシ樹脂、等を好適に用いることができる。具体的には、下記一般式(B1)で表されるエポキシ樹脂として日本化薬社製の「XD-1000」、下記一般式(B2)で表されるエポキシ樹脂として日本化薬社製の「NC-3000」、下記一般式(B4)で表されるエポキシ樹脂として新日鉄住金化学社製の「ESF-300」等が挙げられる。 Specific examples of the epoxy resin include, for example, bisphenol A type epoxy resin (for example, "jER (registered trademark, the same applies hereinafter)-828", "jER-1001", and "jER-1002" manufactured by Mitsubishi Chemical Corporation. , “JER-1004”, “NER-1302” (epoxy equivalent 323, softening point 76° C.) manufactured by Nippon Kayaku Co., Ltd., bisphenol F type resin (for example, “jER-807” manufactured by Mitsubishi Chemical Corporation, “ jER-4004P", "jER-4005P", "jER-4007P", "NER-7406" (epoxy equivalent 350, softening point 66°C), etc. made by Nippon Kayaku Co., Ltd.), bisphenol S type epoxy resin, biphenylglycidyl ether (For example, "jER-YX4000" manufactured by Mitsubishi Chemical Co., Ltd.), phenol novolac type epoxy resin (for example, "EPPN-201" manufactured by Nippon Kayaku Co., Ltd., "jER-152", "jER-154 manufactured by Mitsubishi Chemical Co., Ltd." , "DEN-438" manufactured by Dow Chemical Co., Ltd., (o, m, p-)cresol novolac type epoxy resin (for example, "EOCN (registered trademark, the same applies hereinafter)-102S manufactured by Nippon Kayaku Co., Ltd.", "EOCN-1020", "EOCN-104S"), triglycidyl isocyanurate (for example, "TEPIC (registered trademark)" manufactured by Nissan Chemical Co., Ltd.), trisphenolmethane type epoxy resin (for example, "Nippon Kayaku Co., Ltd." EPPN (registered trademark; hereinafter the same)-501", "EPPN-502", "EPPN-503"), alicyclic epoxy resin ("Celoxide (registered trademark, hereinafter the same) 2021P" manufactured by Daicel). "Celoxide EHPE"), an epoxy resin obtained by glycidylating a phenol resin by the reaction of dicyclopentadiene and phenol (for example, "EXA-7200" manufactured by DIC, "NC-7300" manufactured by Nippon Kayaku Co., Ltd.), the following general formula Epoxy resins represented by (B1) to (B4) and the like can be preferably used. Specifically, "XD-1000" manufactured by Nippon Kayaku Co., Ltd. as an epoxy resin represented by the following general formula (B1), and "XD-1000" manufactured by Nippon Kayaku Co., Ltd. as an epoxy resin represented by the following general formula (B2). NC-3000” and epoxy resin represented by the following general formula (B4) include “ESF-300” manufactured by Nippon Steel & Sumitomo Metal Corporation.
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
 上記一般式(B1)において、aは平均値であって0~10の数を表す。R111は水素原子、ハロゲン原子、炭素数1~8のアルキル基、炭素数3~10のシクロアルキル基、フェニル基、ナフチル基、又はビフェニル基を表す。なお、1分子中に存在する複数のR111は、それぞれ同じであっても異なっていてもよい。 In the general formula (B1), a is an average value and represents a number from 0 to 10. R 111 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. In addition, a plurality of R 111 existing in one molecule may be the same or different.
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 上記一般式(B2)において、bは平均値であって0~10の数を表す。R121は水素原子、ハロゲン原子、炭素数1~8のアルキル基、炭素数3~10のシクロアルキル基、フェニル基、ナフチル基、又はビフェニル基のいずれかを表す。なお、1分子中に存在する複数のR121は、それぞれ同じであっても異なっていてもよい。 In the general formula (B2), b is an average value and represents a number from 0 to 10. R 121 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. In addition, a plurality of R 121 present in one molecule may be the same or different.
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 上記一般式(B3)において、Xは下記一般式(B3-1)又は(B3-2)で示される連結基を表す。但し、分子構造中に1つ以上のアダマンタン構造を含む。cは2又は3を表す。 In the above general formula (B3), X represents a linking group represented by the following general formula (B3-1) or (B3-2). However, one or more adamantane structures are included in the molecular structure. c represents 2 or 3.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 上記一般式(B3-1)及び(B3-2)において、R131~R134及びR135~R137は各々独立に、置換基を有していてもよいアダマンチル基、水素原子、置換基を有していてもよい炭素数1~12のアルキル基、又は置換基を有していてもよいフェニル基を表す。*は結合手を表す。 In the general formulas (B3-1) and (B3-2), R 131 to R 134 and R 135 to R 137 each independently represent an adamantyl group which may have a substituent, a hydrogen atom or a substituent. It represents an alkyl group having 1 to 12 carbon atoms which may have or a phenyl group which may have a substituent. * Represents a bond.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 上記一般式(B4)において、p及びqは各々独立に0~4の整数を表し、R141及びR142は各々独立に炭素数1~4のアルキル基又はハロゲン原子を表す。R143及びR144は各々独立に炭素数1~4のアルキレン基を表す。x及びyは各々独立に0以上の整数を表す。 In the general formula (B4), p and q each independently represent an integer of 0 to 4, and R 141 and R 142 each independently represent an alkyl group having 1 to 4 carbon atoms or a halogen atom. R 143 and R 144 each independently represent an alkylene group having 1 to 4 carbon atoms. x and y each independently represent an integer of 0 or more.
 これらの中で、一般式(B1)~(B4)のいずれかで表されるエポキシ樹脂を用いることが好ましい。 Among these, it is preferable to use the epoxy resin represented by any of the general formulas (B1) to (B4).
 α,β-不飽和モノカルボン酸又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルとしては、(メタ)アクリル酸、クロトン酸、o-、m-又はp-ビニル安息香酸、(メタ)アクリル酸のα位ハロアルキル、アルコキシル、ハロゲン、ニトロ、シアノ置換体などのモノカルボン酸、2-(メタ)アクリロイロキシエチルコハク酸、2-(メタ)アクリロイロキシエチルアジピン酸、2-(メタ)アクリロイロキシエチルフタル酸、2-(メタ)アクリロイロキシエチルヘキサヒドロフタル酸、2-(メタ)アクリロイロキシエチルマレイン酸、2-(メタ)アクリロイロキシプロピルコハク酸、2-(メタ)アクリロイロキシプロピルアジピン酸、2-(メタ)アクリロイロキシプロピルテトラヒドロフタル酸、2-(メタ)アクリロイロキシプロピルフタル酸、2-(メタ)アクリロイロキシプロピルマレイン酸、2-(メタ)アクリロイロキシブチルコハク酸、2-(メタ)アクリロイロキシブチルアジピン酸、2-(メタ)アクリロイロキシブチルヒドロフタル酸、2-(メタ)アクリロイロキシブチルフタル酸、2-(メタ)アクリロイロキシブチルマレイン酸、(メタ)アクリル酸にε-カプロラクトン、β-プロピオラクトン、γ-ブチロラクトン、δ-バレロラクトン等のラクトン類を付加させたものである単量体、或いはヒドロキシアルキル(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレートに(無水)コハク酸、(無水)フタル酸、(無水)マレイン酸などの酸(無水物)を付加させた単量体、(メタ)アクリル酸ダイマーなどが挙げられる。
 これらのうち、表面粗度の点から、特に好ましいものは(メタ)アクリル酸である。
Examples of the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group include (meth)acrylic acid, crotonic acid, o-, m- or p-vinylbenzoic acid, (meth ) Acrylic acid α-position haloalkyl, alkoxyl, halogen, nitro, cyano-substituted monocarboxylic acids, 2-(meth)acryloyloxyethylsuccinic acid, 2-(meth)acryloyloxyethyladipic acid, 2-( (Meth)acryloyloxyethyl phthalic acid, 2-(meth)acryloyloxyethyl hexahydrophthalic acid, 2-(meth)acryloyloxyethyl maleic acid, 2-(meth)acryloyloxypropyl succinic acid, 2-( (Meth)acryloyloxypropyl adipic acid, 2-(meth)acryloyloxypropyl tetrahydrophthalic acid, 2-(meth)acryloyloxypropyl phthalic acid, 2-(meth)acryloyloxypropyl maleic acid, 2-(meth ) Acryloyloxybutylsuccinic acid, 2-(meth)acryloyloxybutyladipic acid, 2-(meth)acryloyloxybutylhydrophthalic acid, 2-(meth)acryloyloxybutylphthalic acid, 2-(meth) Acryloyloxybutyl maleic acid, (meth)acrylic acid, a monomer obtained by adding lactones such as ε-caprolactone, β-propiolactone, γ-butyrolactone and δ-valerolactone, or hydroxyalkyl( (Meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate added with acid (anhydride) such as (anhydrous) succinic acid, (anhydrous) phthalic acid and (anhydrous) maleic acid Examples thereof include a monomer and a (meth)acrylic acid dimer.
Of these, (meth)acrylic acid is particularly preferable in terms of surface roughness.
 エポキシ樹脂にα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルを付加させる方法としては、公知の手法を用いることができる。例えば、エステル化触媒の存在下、50~150℃の温度で、α,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルとエポキシ樹脂とを反応させることができる。ここで用いるエステル化触媒としては、トリエチルアミン、トリメチルアミン、ベンジルジメチルアミン、ベンジルジエチルアミン等の3級アミン、テトラメチルアンモニウムクロリド、テトラエチルアンモニウムクロリド、ドデシルトリメチルアンモニウムクロリド等の4級アンモニウム塩等を用いることができる。 As a method for adding an α,β-unsaturated monocarboxylic acid and/or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, a known method can be used. For example, in the presence of an esterification catalyst, an α,β-unsaturated monocarboxylic acid and/or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group are reacted with an epoxy resin at a temperature of 50 to 150° C. be able to. As the esterification catalyst used here, tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine and benzyldiethylamine, and quaternary ammonium salts such as tetramethylammonium chloride, tetraethylammonium chloride and dodecyltrimethylammonium chloride can be used. ..
 なお、エポキシ樹脂、α,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステル、及びエステル化触媒は、いずれも1種を単独で用いてもよく、2種以上を併用してもよい。
 α,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルの使用量は、エポキシ樹脂のエポキシ基1当量に対し0.5~1.2当量の範囲が好ましく、さらに好ましくは0.7~1.1当量の範囲である。α,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルの使用量を前記下限値以上とすることで不飽和基の導入量の不足が抑制でき、引き続く多塩基酸及び/又はその無水物との反応も十分なものとしやすい傾向がある。一方、前記上限値以下とすることでα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルの未反応物の残存を抑制でき、硬化特性を良好なものとしやすい傾向が認められる。
The epoxy resin, the α,β-unsaturated monocarboxylic acid and/or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and the esterification catalyst may each be used alone. You may use 2 or more types together.
The amount of the α,β-unsaturated monocarboxylic acid and/or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group used is in the range of 0.5 to 1.2 equivalents per 1 equivalent of the epoxy group of the epoxy resin. Is preferable, and more preferably in the range of 0.7 to 1.1 equivalents. By setting the amount of the α,β-unsaturated monocarboxylic acid and/or α,β-unsaturated monocarboxylic acid ester having a carboxyl group to be the above lower limit or more, it is possible to suppress insufficient introduction of the unsaturated group, Subsequent reaction with the polybasic acid and/or its anhydride also tends to be satisfactory. On the other hand, when the content is not more than the above upper limit, it is possible to suppress the unreacted product of the α,β-unsaturated monocarboxylic acid and/or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and to improve the curing property. There is a tendency that it is easy to assume.
 多塩基酸及び/又はその無水物としては、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ベンゾフェノンテトラカルボン酸、メチルヘキサヒドロフタル酸、エンドメチレンテトラヒドロフタル酸、クロレンド酸、メチルテトラヒドロフタル酸、ビフェニルテトラカルボン酸、及びこれらの無水物等から選ばれる、1種以上が挙げられる。 Examples of the polybasic acid and/or its anhydride include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid. Examples thereof include one or more selected from acids, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid, and their anhydrides.
 好ましくは、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ビフェニルテトラカルボン酸、又はこれらの無水物である。特に好ましくは、テトラヒドロフタル酸、ビフェニルテトラカルボン酸、無水テトラヒドロフタル酸、又はビフェニルテトラカルボン酸二無水物である。 Preferably, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, or their anhydrides. Particularly preferred is tetrahydrophthalic acid, biphenyltetracarboxylic acid, tetrahydrophthalic anhydride, or biphenyltetracarboxylic dianhydride.
 多塩基酸及び/又はその無水物の付加反応に関しても公知の方法を用いることができ、エポキシ樹脂へのα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルの付加反応と同様な条件下で、継続反応させて目的物を得ることができる。多塩基酸及び/又はその無水物成分の付加量は、生成するカルボキシル基含有エポキシ(メタ)アクリレート系樹脂の酸価が10~150mgKOH/gの範囲となるような程度であることが好ましく、20~140mgKOH/gの範囲となるような程度であることがより好ましい。前記下限値以上とすることでアルカリ現像性が良好となる傾向があり、また、前記上限値以下とすることで硬化性能が良好となる傾向がある。 A known method can be used for the addition reaction of the polybasic acid and/or its anhydride. The α,β-unsaturated monocarboxylic acid having an α,β-unsaturated monocarboxylic acid and/or a carboxyl group on the epoxy resin can be used. The desired product can be obtained by continuing the reaction under the same conditions as the addition reaction of the carboxylic acid ester. The amount of the polybasic acid and/or its anhydride component added is preferably such that the acid value of the resulting carboxyl group-containing epoxy (meth)acrylate resin is in the range of 10 to 150 mgKOH/g. More preferably, it is in the range of about 140 mgKOH/g. When it is at least the lower limit, the alkali developability tends to be good, and when it is at most the upper limit, the curing performance tends to be good.
 なお、この多塩基酸及び/又はその無水物の付加反応時に、トリメチロールプロパン、ペンタエリスリトール、ジペンタエリスリトールなどの多価アルコールを添加し、多分岐構造を導入したものとしてもよい。 Note that a polyhydric alcohol such as trimethylolpropane, pentaerythritol, or dipentaerythritol may be added during the addition reaction of the polybasic acid and/or its anhydride to introduce a multibranched structure.
 カルボキシル基含有エポキシ(メタ)アクリレート系樹脂は、通常、エポキシ樹脂とα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルとの反応物に、多塩基酸及び/又はその無水物を混合した後、もしくは、エポキシ樹脂とα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルとの反応物に、多塩基酸及び/又はその無水物及び多価アルコールを混合した後に、加温することにより得られる。この場合、多塩基酸及び/又はその無水物と多価アルコールの混合順序に、特に制限はない。加温により、エポキシ樹脂とα,β-不飽和モノカルボン酸及び/又はカルボキシル基を有するα,β-不飽和モノカルボン酸エステルとの反応物と多価アルコールとの混合物中に存在するいずれかの水酸基に対して多塩基酸及び/又はその無水物が付加反応する。 The carboxyl group-containing epoxy (meth)acrylate-based resin is usually added to the reaction product of the epoxy resin with the α,β-unsaturated monocarboxylic acid and/or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group. After mixing with a basic acid and/or an anhydride thereof, or in a reaction product of the epoxy resin with an α,β-unsaturated monocarboxylic acid and/or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group, It is obtained by mixing the polybasic acid and/or its anhydride and the polyhydric alcohol and then heating. In this case, the mixing order of the polybasic acid and/or its anhydride and the polyhydric alcohol is not particularly limited. Any existing in a mixture of a reaction product of an epoxy resin with an α,β-unsaturated monocarboxylic acid and/or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group and a polyhydric alcohol by heating. The polybasic acid and/or its anhydride reacts with the hydroxyl group of.
 カルボキシル基含有エポキシ(メタ)アクリレート系樹脂としては、前述のもの以外に、韓国公開特許第10-2013-0022955号公報、韓国登録特許第10-0965189号公報、日本国特開2005-165294号公報、日本国特開2006-312704号公報に記載のもの等が挙げられる。 As the carboxyl group-containing epoxy (meth)acrylate resin, in addition to the above-mentioned ones, Korean Published Patent No. 10-2013-0022955, Korean Registered Patent No. 10-0965189, and Japanese Patent Laid-Open No. 2005-165294 are disclosed. And those described in JP-A 2006-312704.
 エポキシ(メタ)アクリレート系樹脂の、ゲルパーミエーションクロマトグラフィー(GPC)で測定したポリスチレン換算の重量平均分子量(Mw)は通常1000以上、好ましくは1500以上、より好ましくは2000以上、より好ましくは2500以上であり、通常10000以下、好ましくは8000以下、より好ましくは6000以下、さらに好ましくは5000以下、特に好ましくは4000以下である。例えば、1000~10000が好ましく、1000~8000がより好ましく、1500~6000がさらに好ましく、2000~5000がよりさらに好ましく、2500~4000が特に好ましい。前記下限値以上とすることで現像液に対する溶解性が高くなりすぎるのを抑制できる傾向があり、前記上限値以下とすることで現像液に対する溶解性が良好なものとしやすい傾向がある。 The polystyrene-equivalent weight average molecular weight (Mw) of the epoxy (meth)acrylate resin measured by gel permeation chromatography (GPC) is usually 1000 or more, preferably 1500 or more, more preferably 2000 or more, more preferably 2500 or more. And usually 10,000 or less, preferably 8000 or less, more preferably 6000 or less, further preferably 5000 or less, and particularly preferably 4000 or less. For example, 1000 to 10000 is preferable, 1000 to 8000 is more preferable, 1500 to 6000 is further preferable, 2000 to 5000 is further more preferable, and 2500 to 4000 is particularly preferable. When it is at least the above lower limit, it tends to be possible to prevent the solubility in the developing solution from becoming too high, and when it is at most the above upper limit, the solubility in the developing solution tends to be good.
 エポキシ(メタ)アクリレート系樹脂の酸価は特に限定されないが、10mgKOH/g以上が好ましく、20mgKOH/g以上がより好ましく、また、200mgKOH/g以下が好ましく、150mgKOH/g以下がより好ましく、100mgKOH/g以下がさらに好ましく、50mgKOH/g以下が特に好ましい。例えば、10~200mgKOH/gが好ましく、10~150mgKOH/gがより好ましく、20~100mgKOH/gがさらに好ましく、20~50mgKOH/gが特に好ましい。前記下限値以上とすることで適度な現像溶解性が得られる傾向があり、また、前記上限値以下とすることで現像が進みすぎ膜溶解するのを抑制できる傾向がある。 The acid value of the epoxy (meth)acrylate-based resin is not particularly limited, but is preferably 10 mgKOH/g or more, more preferably 20 mgKOH/g or more, and preferably 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, 100 mgKOH/g. g or less is more preferable, and 50 mg KOH/g or less is particularly preferable. For example, 10 to 200 mgKOH/g is preferable, 10 to 150 mgKOH/g is more preferable, 20 to 100 mgKOH/g is further preferable, and 20 to 50 mgKOH/g is particularly preferable. When it is at least the above lower limit, moderate development solubility tends to be obtained, and when it is at most the above upper limit, development tends to proceed too much to prevent film dissolution.
 エポキシ(メタ)アクリレート系樹脂の二重結合当量は特に限定されないが、800以下が好ましく、700以下がより好ましく、600以下がさらに好ましく、500以下がよりさらに好ましく、400以下が特に好ましく、300以下が最も好ましく、また、100以上が好ましく、150以上がより好ましく、200以上がさらに好ましく、250以上が特に好ましい。例えば、100~800が好ましく、100~700がより好ましく、150~600がさらに好ましく、150~500がよりさらに好ましく、200~400が特に好ましく、250~300がとりわけ好ましい。前記上限値以下とすることで機械的特性と表面粗度が向上する傾向があり、また、前記下限値以上とすることで保存安定性が向上する傾向がある。
 なお、樹脂の二重結合当量は下記式(x)から算出することができる。
The double bond equivalent of the epoxy (meth)acrylate resin is not particularly limited, but is preferably 800 or less, more preferably 700 or less, further preferably 600 or less, further preferably 500 or less, particularly preferably 400 or less, and 300 or less. Is most preferable, 100 or more is preferable, 150 or more is more preferable, 200 or more is further preferable, and 250 or more is particularly preferable. For example, 100 to 800 is preferable, 100 to 700 is more preferable, 150 to 600 is further preferable, 150 to 500 is further preferable, 200 to 400 is particularly preferable, and 250 to 300 is particularly preferable. When it is at most the upper limit, mechanical properties and surface roughness will tend to improve, and when it is at least the lower limit, storage stability will tend to improve.
The double bond equivalent of the resin can be calculated from the following formula (x).
 (樹脂の二重結合当量) = 
   (樹脂の分子量)/(樹脂1分子あたりのエチレン性不飽和二重結合の数)・・・(x)
(Double bond equivalent of resin) =
(Molecular weight of resin)/(Number of ethylenically unsaturated double bonds per molecule of resin) (x)
 (b1)エポキシ(メタ)アクリレート系樹脂の化学構造は特に限定されないが、硬化性の観点から、下記一般式(i)で表される部分構造を有するエポキシ(メタ)アクリレート系樹脂(b1-A)(以下、「エポキシ(メタ)アクリレート系樹脂(b1-A)」と略記する場合がある。)や、下記一般式(ii)で表される部分構造を有するエポキシ(メタ)アクリレート系樹脂(b1-B)(以下、「エポキシ(メタ)アクリレート系樹脂(b1-B)」と略記する場合がある。)が好ましい。また、信頼性の観点からは、エポキシ(メタ)アクリレート系樹脂(b1-B)がより好ましい。 The chemical structure of the (b1) epoxy (meth)acrylate resin is not particularly limited, but from the viewpoint of curability, an epoxy (meth)acrylate resin (b1-A) having a partial structure represented by the following general formula (i) is used. ) (Hereinafter sometimes abbreviated as “epoxy (meth)acrylate-based resin (b1-A)”) and epoxy (meth)acrylate-based resin (partial structure represented by the following general formula (ii) ( b1-B) (hereinafter sometimes abbreviated as “epoxy (meth)acrylate-based resin (b1-B)”) is preferable. Further, from the viewpoint of reliability, the epoxy (meth)acrylate resin (b1-B) is more preferable.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 式(i)中、Raは水素原子又はメチル基を表し、Rbは置換基を有していてもよい2価の炭化水素基を表す。式(i)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。*は結合手を表す。 In formula (i), R a represents a hydrogen atom or a methyl group, and R b represents a divalent hydrocarbon group which may have a substituent. The benzene ring in formula (i) may be further substituted with any substituent. * Represents a bond.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 式(ii)中、Rcは各々独立に、水素原子又はメチル基を表す。Rdは、環状炭化水素基を側鎖として有する2価の炭化水素基を表す。*は結合手を表す。 In formula (ii), each R c independently represents a hydrogen atom or a methyl group. R d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. * Represents a bond.
(Rb
 前記式(i)において、Rbは置換基を有していてもよい2価の炭化水素基を表す。
 2価の炭化水素基としては、2価の脂肪族基、2価の芳香族環基、1以上の2価の脂肪族基と1以上の2価の芳香族環基とを連結した基が挙げられる。
(R b )
In the above formula (i), R b represents a divalent hydrocarbon group which may have a substituent.
Examples of the divalent hydrocarbon group include a divalent aliphatic group, a divalent aromatic ring group, a group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked. Can be mentioned.
 2価の脂肪族基は、直鎖状、分岐鎖状、環状、これらを組み合わせたものが挙げられる。これらの中でも現像溶解性の観点からは直鎖状のものが好ましく、一方で現像密着性の観点からは環状のものが好ましい。その炭素数は通常1以上であり、3以上が好ましく、6以上がより好ましく、また、20以下が好ましく、15以下がより好ましく、10以下がさらに好ましい。例えば、1~20が好ましく、3~15がより好ましく、6~10がさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。 The divalent aliphatic group may be linear, branched, cyclic, or a combination thereof. Of these, linear ones are preferable from the viewpoint of developing solubility, while cyclic ones are preferable from the viewpoint of developing adhesion. The carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, 1 to 20 is preferable, 3 to 15 is more preferable, and 6 to 10 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
 2価の直鎖状脂肪族基の具体例としては、メチレン基、エチレン基、n-プロピレン基、n-ブチレン基、n-ヘキシレン基、n-ヘプチレン基等が挙げられる。これらの中でも硬化性の観点から、メチレン基が好ましい。
 2価の分岐鎖状脂肪族基の具体例としては、前述の2価の直鎖状脂肪族基に、側鎖としてメチル基、エチル基、n-プロピル基、iso-プロピル基、n-ブチル基、iso-ブチル基、sec-ブチル基、tert-ブチル基等を有する構造が挙げられる。
 2価の環状の脂肪族基が有する環の数は特に限定されないが、通常1以上、2以上が好ましく、また、通常10以下、5以下が好ましい。例えば、1~10が好ましく、1~5がより好ましく、2~5がさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。2価の環状の脂肪族基の具体例としては、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環等の環から水素原子を2つ除した基が挙げられる。これらの中でも骨格の剛直性の観点から、アダマンタン環から水素原子を2つ除した基が好ましい。
Specific examples of the divalent linear aliphatic group include methylene group, ethylene group, n-propylene group, n-butylene group, n-hexylene group, n-heptylene group and the like. Of these, a methylene group is preferable from the viewpoint of curability.
Specific examples of the divalent branched chain aliphatic group include a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, and an n-butyl group as side chains in addition to the above divalent linear aliphatic group. Examples thereof include a structure having a group, an iso-butyl group, a sec-butyl group, a tert-butyl group and the like.
The number of rings contained in the divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more and 2 or more, and usually 10 or less and 5 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, and 2 to 5 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good. Specific examples of the divalent cyclic aliphatic group include a group obtained by removing two hydrogen atoms from a ring such as a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring and an adamantane ring. To be Of these, a group obtained by removing two hydrogen atoms from an adamantane ring is preferable from the viewpoint of rigidity of the skeleton.
 2価の脂肪族基が有していてもよい置換基としては、ヒドロキシル基;メトキシ基、エトキシ基等の炭素数1~5のアルコキシ基;ニトロ基;シアノ基;カルボキシル基等が挙げられる。合成容易性の観点からは、無置換であることが好ましい。 Examples of the substituent that the divalent aliphatic group may have include a hydroxyl group; an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a nitro group; a cyano group; a carboxyl group and the like. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
 また、2価の芳香族環基としては、2価の芳香族炭化水素環基及び2価の芳香族複素環基が挙げられる。その炭素数は通常4以上であり、5以上が好ましく、6以上がより好ましく、また、20以下が好ましく、15以下がより好ましく、10以下がさらに好ましい。例えば、4~20が好ましく、5~15がより好ましく、6~10がさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。 Further, examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group. The carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, 4 to 20 is preferable, 5 to 15 is more preferable, and 6 to 10 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
 2価の芳香族炭化水素環基における芳香族炭化水素環としては、単環であっても縮合環であってもよい。2価の芳香族炭化水素環基としては、例えば、2個の遊離原子価を有する、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ペリレン環、テトラセン環、ピレン環、ベンズピレン環、クリセン環、トリフェニレン環、アセナフテン環、フルオランテン環、フルオレン環などの基が挙げられる。
 また、2価の芳香族複素環基における芳香族複素環としては、単環であっても縮合環であってもよい。2価の芳香族複素環基としては、例えば、2個の遊離原子価を有する、フラン環、ベンゾフラン環、チオフェン環、ベンゾチオフェン環、ピロール環、ピラゾール環、イミダゾール環、オキサジアゾール環、インドール環、カルバゾール環、ピロロイミダゾール環、ピロロピラゾール環、ピロロピロール環、チエノピロール環、チエノチオフェン環、フロピロール環、フロフラン環、チエノフラン環、ベンゾイソオキサゾール環、ベンゾイソチアゾール環、ベンゾイミダゾール環、ピリジン環、ピラジン環、ピリダジン環、ピリミジン環、トリアジン環、キノリン環、イソキノリン環、シノリン環、キノキサリン環、フェナントリジン環、ペリミジン環、キナゾリン環、キナゾリノン環、アズレン環などの基が挙げられる。これらの中でも光硬化性の観点から、2個の遊離原子価を有するベンゼン環又はナフタレン環が好ましく、2個の遊離原子価を有するベンゼン環がより好ましい。
The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring. Examples of the divalent aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, which has two free valences. Examples include groups such as a triphenylene ring, an acenaphthene ring, a fluoranthene ring, and a fluorene ring.
Further, the aromatic heterocycle in the divalent aromatic heterocyclic group may be a single ring or a condensed ring. Examples of the divalent aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, and an indole having two free valences. Ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furofuran ring, thienofuran ring, benzisoxazole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, Examples include groups such as a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cynoline ring, a quinoxaline ring, a phenanthridine ring, a perimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring. Among these, a benzene ring or naphthalene ring having two free valences is preferable, and a benzene ring having two free valences is more preferable, from the viewpoint of photocurability.
 2価の芳香族環基が有していてもよい置換基としては、ヒドロキシル基、メチル基、メトキシ基、エチル基、エトキシ基、プロピル基、プロポキシ基等が挙げられる。硬化性の観点からは、無置換が好ましい。 Examples of the substituent that the divalent aromatic ring group may have include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group. From the viewpoint of curability, it is preferably unsubstituted.
 また、1以上の2価の脂肪族基と1以上の2価の芳香族環基とを連結した基としては、前述の2価の脂肪族基を1以上と、前述の2価の芳香族環基を1以上とを連結した基が挙げられる。
 2価の脂肪族基の数は特に限定されないが、通常1以上、2以上が好ましく、通常10以下、5以下が好ましく、3以下がより好ましい。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 2価の芳香族環基の数は特に限定されないが、通常1以上、2以上が好ましく、通常10以下、5以下が好ましく、3以下がより好ましい。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3がよりさらに好ましい。前記下限値以上とすることで硬化性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
Further, as the group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked, one or more of the above divalent aliphatic groups and the above divalent aromatic Examples thereof include groups in which one or more ring groups are linked.
The number of divalent aliphatic groups is not particularly limited, but is usually 1 or more and 2 or more, usually 10 or less and 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
The number of divalent aromatic ring groups is not particularly limited, but is usually 1 or more and 2 or more, usually 10 or less and 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable. When it is at least the lower limit, the curability tends to be good, and when it is at most the upper limit, the curability tends to be good.
 1以上の2価の脂肪族基と1以上の2価の芳香族環基とを連結した基の具体例としては、下記式(i-A)~(i-E)で表される基等が挙げられる。これらの中でも現像溶解性の観点から、下記式(i-A)で表される基が好ましい。化学式中の*は結合手を表す。 Specific examples of the group in which one or more divalent aliphatic groups are linked to one or more divalent aromatic ring groups include groups represented by the following formulas (iA) to (ie) Are listed. Among these, the group represented by the following formula (iA) is preferable from the viewpoint of developing solubility. * In the chemical formula represents a bond.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 前記のとおり、式(i)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。該置換基としては、例えば、ヒドロキシル基、メチル基、メトキシ基、エチル基、エトキシ基、プロピル基、プロポキシ基等が挙げられる。置換基の数も特に限定されず、1つでもよいし、2つ以上でもよい。
 硬化性の観点からは、無置換であることが好ましい。
As described above, the benzene ring in formula (i) may be further substituted with any substituent. Examples of the substituent include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group. The number of substituents is not particularly limited and may be one or two or more.
From the viewpoint of curability, it is preferably unsubstituted.
 また、前記一般式(i)で表される部分構造は、硬化性の観点から、下記式一般(i-1)で表される部分構造であることが好ましい。 The partial structure represented by the general formula (i) is preferably a partial structure represented by the following general formula (i-1) from the viewpoint of curability.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 式(i-1)中、Ra及びRbは、前記式(i)のものと同義である。RXは水素原子又は多塩基酸残基を表す。*は結合手を表す。式(i-1)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。 In the formula (i-1), R a and R b have the same meaning as in the formula (i). R X represents a hydrogen atom or a polybasic acid residue. * Represents a bond. The benzene ring in formula (i-1) may be further substituted with any substituent.
 多塩基酸残基とは、多塩基酸又はその無水物からOH基を1つ除した1価の基を意味する。多塩基酸としては、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ベンゾフェノンテトラカルボン酸、メチルヘキサヒドロフタル酸、エンドメチレンテトラヒドロフタル酸、クロレンド酸、メチルテトラヒドロフタル酸、ビフェニルテトラカルボン酸から選ばれた1種又は2種以上が挙げられる。
 これらの中でもパターニング特性の観点から、多塩基酸としては、好ましくは、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ビフェニルテトラカルボン酸であり、より好ましくは、テトラヒドロフタル酸、ビフェニルテトラカルボン酸である。
The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Examples of polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid. Examples thereof include one or more selected from acids, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.
Of these, from the viewpoint of patterning properties, the polybasic acid is preferably maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid. Acids, and more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.
 エポキシ(メタ)アクリレート系樹脂(b1-A)1分子中に含まれる、前記式(i-1)で表される部分構造は、1種でも2種以上でもよく、例えば、RXが水素原子のものと、RXが多塩基酸残基のものが混在していてもよい。 The partial structure represented by the formula (i-1) contained in one molecule of the epoxy (meth)acrylate resin (b1-A) may be one kind or two or more kinds. For example, R X is a hydrogen atom. And R X may be a mixture of polybasic acid residues.
 また、エポキシ(メタ)アクリレート系樹脂(b1-A)1分子中に含まれる、前記式(i)で表される部分構造の数は特に限定されないが、1以上が好ましく、3以上がより好ましく、また、20以下が好ましく、15以下がより好ましい。例えば、1~20が好ましく、3~15がより好ましい。前記下限値以上とすることで硬化性が良好となる傾向があり、また、前記上限値以下とすることで現像溶解性が良好となる傾向がある。 The number of partial structures represented by the formula (i) contained in one molecule of the epoxy (meth)acrylate resin (b1-A) is not particularly limited, but is preferably 1 or more, more preferably 3 or more. Moreover, 20 or less is preferable and 15 or less is more preferable. For example, 1 to 20 is preferable, and 3 to 15 is more preferable. When it is at least the lower limit, the curability tends to be good, and when it is at most the upper limit, the developing solubility tends to be good.
 以下にエポキシ(メタ)アクリレート系樹脂(b1-A)の具体例を挙げる。 Specific examples of epoxy (meth)acrylate resin (b1-A) are given below.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
(Rd
 前記式(ii)において、Rdは、環状炭化水素基を側鎖として有する2価の炭化水素基を表す。
 環状炭化水素基としては、脂肪族環基又は芳香族環基が挙げられる。
(R d )
In the formula (ii), R d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain.
Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.
 脂肪族環基が有する環の数は特に限定されないが、通常1以上、2以上が好ましく、また、通常10以下、5以下が好ましく、3以下がより好ましい。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 また、脂肪族環基の炭素数は通常4以上であり、6以上が好ましく、8以上がより好ましく、また、40以下が好ましく、30以下がより好ましく、20以下がさらに好ましく、15以下が特に好ましい。例えば、4~40が好ましく、4~30がより好ましく、6~20がより好ましく、6~15がさらに好ましく、8~15がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 脂肪族環基における脂肪族環の具体例としてはシクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環等が挙げられる。これらの中でも信頼性の観点から、アダマンタン環が好ましい。
The number of rings contained in the aliphatic ring group is not particularly limited, but is usually preferably 1 or more and 2 or more, and is usually 10 or less, 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
The carbon number of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 30 or less, further preferably 20 or less, particularly 15 or less. preferable. For example, 4 to 40 is preferable, 4 to 30 is more preferable, 6 to 20 is more preferable, 6 to 15 is further preferable, 8 to 15 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring and an adamantane ring. Of these, the adamantane ring is preferable from the viewpoint of reliability.
 一方で、芳香族環基が有する環の数は特に限定されないが、通常1以上、2以上が好ましく、3以上がより好ましく、また、通常10以下、5以下が好ましく、4以下がより好ましい。例えば、1~10が好ましく、1~5がより好ましく、1~4がさらに好ましく、2~4がよりさらに好ましく、3~4が特に好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 芳香族環基としては、芳香族炭化水素環基、芳香族複素環基が挙げられる。また、芳香族環基の炭素数は通常4以上であり、6以上が好ましく、8以上がより好ましく、10以上がよりさらに好ましく、12以上が特に好ましく、また、40以下が好ましく、30以下がより好ましく、20以下がさらに好ましく、15以下が特に好ましい。例えば、4~40が好ましく、6~30がより好ましく、8~20がさらに好ましく、10~15がよりさらに好ましく、12~15が特に好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 芳香族環基における芳香族環の具体例としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ペリレン環、テトラセン環、ピレン環、ベンズピレン環、クリセン環、トリフェニレン環、アセナフテン環、フルオランテン環、フルオレン環等が挙げられる。これらの中でもパターニング特性の観点から、フルオレン環が好ましい。
On the other hand, the number of rings that the aromatic ring group has is not particularly limited, but is usually 1 or more, 2 or more, preferably 3 or more, and usually 10 or less, 5 or less, and more preferably 4 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 4 is further preferable, 2 to 4 is further preferable, and 3 to 4 is particularly preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The carbon number of the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, even more preferably 10 or more, particularly preferably 12 or more, and preferably 40 or less, 30 or less. More preferably, 20 or less is further preferable, and 15 or less is particularly preferable. For example, 4 to 40 is preferable, 6 to 30 is more preferable, 8 to 20 is further preferable, 10 to 15 is further preferable, and 12 to 15 is particularly preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Specific examples of the aromatic ring in the aromatic ring group, benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, tetracene ring, pyrene ring, benzpyrene ring, chrysene ring, triphenylene ring, acenaphthene ring, fluoranthene ring, Examples thereof include a fluorene ring. Among these, a fluorene ring is preferable from the viewpoint of patterning characteristics.
 また、環状炭化水素基を側鎖として有する2価の炭化水素基における、2価の炭化水素基は特に限定されないが、例えば、2価の脂肪族基、2価の芳香族環基、1以上の2価の脂肪族基と1以上の2価の芳香族環基とを連結した基が挙げられる。 Further, the divalent hydrocarbon group in the divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is not particularly limited, but for example, a divalent aliphatic group, a divalent aromatic ring group, or 1 or more. And a group in which one or more divalent aromatic ring groups are linked.
 2価の脂肪族基は、直鎖状、分岐鎖状、環状、これらを組み合わせたものが挙げられる。これらの中でも相溶性の観点からは直鎖状のものが好ましく、一方で信頼性の観点からは環状のものが好ましい。その炭素数は通常1以上であり、3以上が好ましく、6以上がより好ましく、また、25以下が好ましく、20以下がより好ましく、15以下がさらに好ましい。例えば、1~25が好ましく、3~20がより好ましく、6~15がさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。 The divalent aliphatic group may be linear, branched, cyclic, or a combination thereof. Of these, linear ones are preferable from the viewpoint of compatibility, and cyclic ones are preferable from the viewpoint of reliability. The carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, preferably 25 or less, more preferably 20 or less, and further preferably 15 or less. For example, 1 to 25 is preferable, 3 to 20 is more preferable, and 6 to 15 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
 2価の直鎖状脂肪族基の具体例としては、メチレン基、エチレン基、n-プロピレン基、n-ブチレン基、n-ヘキシレン基、n-ヘプチレン基等が挙げられる。これらの中でも硬化性の観点から、メチレン基が好ましい。
 2価の分岐鎖状脂肪族基の具体例としては、前述の2価の直鎖状脂肪族基に、側鎖としてメチル基、エチル基、n-プロピル基、iso-プロピル基、n-ブチル基、iso-ブチル基、sec-ブチル基、tert-ブチル基等を有する構造が挙げられる。
 2価の環状の脂肪族基が有する環の数は特に限定されないが、通常1以上、2以上が好ましく、また、通常10以下、5以下、さらに好ましくは3以下が好ましい。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。2価の環状の脂肪族基の具体例としては、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環等の環から水素原子を2つ除した基が挙げられる。これらの中でも信頼性の観点から、アダマンタン環から水素原子を2つ除した基が好ましい。
Specific examples of the divalent linear aliphatic group include methylene group, ethylene group, n-propylene group, n-butylene group, n-hexylene group, n-heptylene group and the like. Of these, a methylene group is preferable from the viewpoint of curability.
Specific examples of the divalent branched chain aliphatic group include a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, and an n-butyl group as side chains in addition to the above divalent linear aliphatic group. Examples thereof include a structure having a group, an iso-butyl group, a sec-butyl group, a tert-butyl group and the like.
The number of rings contained in the divalent cyclic aliphatic group is not particularly limited, but is usually preferably 1 or more and 2 or more, and is usually 10 or less, 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good. Specific examples of the divalent cyclic aliphatic group include a group obtained by removing two hydrogen atoms from a ring such as a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring and an adamantane ring. To be Of these, a group obtained by removing two hydrogen atoms from an adamantane ring is preferable from the viewpoint of reliability.
 2価の脂肪族基が有していてもよい置換基としては、ヒドロキシル基;メトキシ基、エトキシ基等の炭素数1~5のアルコキシ基;ニトロ基;シアノ基;カルボキシル基等が挙げられる。合成容易性の観点からは、無置換であることが好ましい。 Examples of the substituent that the divalent aliphatic group may have include a hydroxyl group; an alkoxy group having 1 to 5 carbon atoms such as a methoxy group and an ethoxy group; a nitro group; a cyano group; a carboxyl group and the like. From the viewpoint of ease of synthesis, it is preferably unsubstituted.
 また、2価の芳香族環基としては、2価の芳香族炭化水素環基及び2価の芳香族複素環基が挙げられる。その炭素数は通常4以上であり、5以上が好ましく、6以上がより好ましく、また、30以下が好ましく、20以下がより好ましく、15以下がさらに好ましい。例えば、4~30が好ましく、5~20がより好ましく、6~15がさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。 Further, examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group. The carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, preferably 30 or less, more preferably 20 or less, and further preferably 15 or less. For example, 4 to 30 is preferable, 5 to 20 is more preferable, and 6 to 15 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
 2価の芳香族炭化水素環基における芳香族炭化水素環としては、単環であっても縮合環であってもよい。2価の芳香族炭化水素環基としては、例えば、2個の遊離原子価を有する、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ペリレン環、テトラセン環、ピレン環、ベンズピレン環、クリセン環、トリフェニレン環、アセナフテン環、フルオランテン環、フルオレン環などの基が挙げられる。
 また、芳香族複素環基における芳香族複素環としては、単環であっても縮合環であってもよい。2価の芳香族複素環基としては、例えば、2個の遊離原子価を有する、フラン環、ベンゾフラン環、チオフェン環、ベンゾチオフェン環、ピロール環、ピラゾール環、イミダゾール環、オキサジアゾール環、インドール環、カルバゾール環、ピロロイミダゾール環、ピロロピラゾール環、ピロロピロール環、チエノピロール環、チエノチオフェン環、フロピロール環、フロフラン環、チエノフラン環、ベンゾイソオキサゾール環、ベンゾイソチアゾール環、ベンゾイミダゾール環、ピリジン環、ピラジン環、ピリダジン環、ピリミジン環、トリアジン環、キノリン環、イソキノリン環、シノリン環、キノキサリン環、フェナントリジン環、ペリミジン環、キナゾリン環、キナゾリノン環、アズレン環などの基が挙げられる。2価の芳香族環基の中でもパターニング特性の観点から、2個の遊離原子価を有する、ベンゼン環、ナフタレン環又はフルオレン環が好ましく、2個の遊離原子価を有するフルオレン環がより好ましい。
The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring. Examples of the divalent aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, each having two free valences. Examples include groups such as a triphenylene ring, an acenaphthene ring, a fluoranthene ring, and a fluorene ring.
Further, the aromatic heterocycle in the aromatic heterocyclic group may be a single ring or a condensed ring. Examples of the divalent aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, and an indole having two free valences. Ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furofuran ring, thienofuran ring, benzisoxazole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, Examples include groups such as a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cynoline ring, a quinoxaline ring, a phenanthridine ring, a perimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring. Among the divalent aromatic ring groups, from the viewpoint of patterning characteristics, a benzene ring, a naphthalene ring or a fluorene ring having two free valences is preferable, and a fluorene ring having two free valences is more preferable.
 2価の芳香族環基が有していてもよい置換基としては、ヒドロキシル基、メチル基、メトキシ基、エチル基、エトキシ基、プロピル基、プロポキシ基等が挙げられる。現像溶解性、耐吸湿性の観点からは、無置換が好ましい。 Examples of the substituent that the divalent aromatic ring group may have include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group. From the viewpoint of developing solubility and moisture absorption resistance, no substitution is preferable.
 また、1以上の2価の脂肪族基と1以上の2価の芳香族環基とを連結した基としては、前述の2価の脂肪族基を1以上と、前述の2価の芳香族環基を1以上とを連結した基が挙げられる。
 2価の脂肪族基の数は特に限定されないが、通常1以上、2以上が好ましく、通常10以下、5以下が好ましく、3以下がより好ましい。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 2価の芳香族環基の数は特に限定されないが、通常1以上、2以上が好ましく、通常10以下、5以下が好ましく、3以下がより好ましい。例えば、1~10が好ましく、1~5がより好ましく、1~3がさらに好ましく、2~3がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
Further, as the group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked, one or more of the above divalent aliphatic groups and the above divalent aromatic Examples thereof include groups in which one or more ring groups are linked.
The number of divalent aliphatic groups is not particularly limited, but is usually 1 or more and 2 or more, usually 10 or less and 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
The number of divalent aromatic ring groups is not particularly limited, but is usually 1 or more and 2 or more, usually 10 or less and 5 or less, and more preferably 3 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
 1以上の2価の脂肪族基と1以上の2価の芳香族環基とを連結した基の具体例としては、前記式(i-A)~(i-E)で表される基等が挙げられる。これらの中でも信頼性の観点から、前記式(i-C)で表される基が好ましい。 Specific examples of the group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked include groups represented by the above formulas (iA) to (ie) Are listed. Among these, the group represented by the above formula (iC) is preferable from the viewpoint of reliability.
 これらの2価の炭化水素基に対して、側鎖である環状炭化水素基の結合態様は特に限定されないが、例えば、脂肪族基や芳香族環基の水素原子1つを該側鎖で置換した態様や、脂肪族基の炭素原子の1つを含めて側鎖である環状炭化水素基を構成した態様が挙げられる。 The bonding mode of the cyclic hydrocarbon group which is a side chain with respect to these divalent hydrocarbon groups is not particularly limited, but for example, one hydrogen atom of an aliphatic group or an aromatic ring group is substituted with the side chain. And a mode in which a cyclic hydrocarbon group that is a side chain is configured to include one of the carbon atoms of the aliphatic group.
 また、前記式(ii)で表される部分構造は、相溶性の観点から、下記式(ii-1)で表される部分構造であることが好ましい。 The partial structure represented by the formula (ii) is preferably a partial structure represented by the following formula (ii-1) from the viewpoint of compatibility.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 式(ii-1)中、Rcは前記式(ii)と同義である。Rαは、置換基を有していてもよい1価の環状炭化水素基を表す。nは1以上の整数である。*は結合手を表す。式(ii-1)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。 In the formula (ii-1), R c has the same meaning as the above formula (ii). R α represents a monovalent cyclic hydrocarbon group which may have a substituent. n is an integer of 1 or more. * Represents a bond. The benzene ring in formula (ii-1) may be further substituted with any substituent.
(Rα
 前記式(ii-1)において、Rαは、置換基を有していてもよい1価の環状炭化水素基を表す。
 環状炭化水素基としては、脂肪族環基又は芳香族環基が挙げられる。
(R α )
In the formula (ii-1), R α represents a monovalent cyclic hydrocarbon group which may have a substituent.
Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.
 脂肪族環基が有する環の数は特に限定されないが、通常1以上、2以上が好ましく、また、通常6以下、4以下が好ましく、3以下がより好ましい。例えば、1~6が好ましく、1~4がより好ましく、1~3がさらに好ましく、2~3がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 また、脂肪族環基の炭素数は通常4以上であり、6以上が好ましく、8以上がより好ましく、また、40以下が好ましく、30以下がより好ましく、20以下がさらに好ましく、15以下が特に好ましい。例えば、4~40が好ましく、4~30がより好ましく、6~20がさらに好ましく、8~15が特に好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 脂肪族環基における脂肪族環の具体例としてはシクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環等が挙げられる。これらの中でも相溶性の観点から、アダマンタン環が好ましい。
The number of rings contained in the aliphatic ring group is not particularly limited, but is usually 1 or more and 2 or more, and usually 6 or less, 4 or less, and more preferably 3 or less. For example, 1 to 6 is preferable, 1 to 4 is more preferable, 1 to 3 is further preferable, and 2 to 3 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
The number of carbon atoms of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 30 or less, further preferably 20 or less, particularly 15 or less. preferable. For example, 4 to 40 is preferable, 4 to 30 is more preferable, 6 to 20 is further preferable, and 8 to 15 is particularly preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring and an adamantane ring. Among these, the adamantane ring is preferable from the viewpoint of compatibility.
 一方で、芳香族環基が有する環の数は特に限定されないが、通常1以上、2以上が好ましく、3以上がより好ましく、また、通常10以下、5以下が好ましい。例えば、1~10が好ましく、1~5がより好ましく、2~5がさらに好ましく、3~5がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 芳香族環基としては、芳香族炭化水素環基、芳香族複素環基が挙げられるまた、芳香族環基の炭素数は通常4以上であり、5以上が好ましく、6以上がより好ましく、また、30以下が好ましく、20以下がより好ましく、15以下がさらに好ましい。例えば、4~30が好ましく、5~20がより好ましく、6~15がさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 芳香族環基における芳香族環の具体例としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、フルオレン環等が挙げられる。これらの中でも信頼性の観点から、フルオレン環が好ましい。
On the other hand, the number of rings contained in the aromatic ring group is not particularly limited, but is usually 1 or more, 2 or more, preferably 3 or more, and usually 10 or less, 5 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 2 to 5 is further preferable, and 3 to 5 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. Also, the carbon number of the aromatic ring group is usually 4 or more, preferably 5 or more, more preferably 6 or more, and , 30 or less are preferred, 20 or less are more preferred, and 15 or less are even more preferred. For example, 4 to 30 is preferable, 5 to 20 is more preferable, and 6 to 15 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring and the like. Among these, a fluorene ring is preferable from the viewpoint of reliability.
 環状炭化水素基が有していてもよい置換基としては、ヒドロキシル基、メチル基、エチル基、n-プロピル基、iso-プロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基、アミル基、iso-アミル基等の炭素数1~5のアルキル基;メトキシ基、エトキシ基等の炭素数1~5のアルコキシ基;ニトロ基;シアノ基;カルボキシル基等が挙げられる。合成容易性の観点からは、無置換が好ましい。 Examples of the substituent that the cyclic hydrocarbon group may have include a hydroxyl group, a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, Examples thereof include an alkyl group having 1 to 5 carbon atoms such as amyl group and iso-amyl group; an alkoxy group having 1 to 5 carbon atoms such as methoxy group and ethoxy group; nitro group; cyano group; and carboxyl group. From the viewpoint of ease of synthesis, unsubstituted is preferable.
 nは1以上の整数を表すが、2以上が好ましく、また、3以下が好ましい。例えば、1~が好ましく、2~3がより好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。 N represents an integer of 1 or more, preferably 2 or more, and preferably 3 or less. For example, 1 to 1 is preferable, and 2 to 3 is more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
 これらの中でも、相溶性の観点から、Rαが1価の脂肪族環基であることが好ましく、アダマンチル基であることがより好ましい。 Among these, from the viewpoint of compatibility, R α is preferably a monovalent aliphatic ring group, and more preferably an adamantyl group.
 前記のとおり、式(ii-1)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。該置換基としては、例えば、ヒドロキシル基、メチル基、メトキシ基、エチル基、エトキシ基、プロピル基、プロポキシ基等が挙げられる。置換基の数も特に限定されず、1つでもよいし、2つ以上でもよい。
 パターニング特性の観点からは、無置換であることが好ましい。
As described above, the benzene ring in formula (ii-1) may be further substituted with any substituent. Examples of the substituent include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group. The number of substituents is not particularly limited and may be one or two or more.
From the viewpoint of patterning characteristics, it is preferably unsubstituted.
 以下に前記式(ii-1)で表される部分構造の具体例を挙げる。 Specific examples of the partial structure represented by the formula (ii-1) will be given below.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
 また、前記式(ii)で表される部分構造は、信頼性の観点から、下記式(ii-2)で表される部分構造であることが好ましい。 Further, the partial structure represented by the formula (ii) is preferably a partial structure represented by the following formula (ii-2) from the viewpoint of reliability.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 式(ii-2)中、Rcは前記式(ii)と同義である。Rβは、置換基を有していてもよい2価の環状炭化水素基を表す。*は結合手を表す。式(ii-2)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。 In the formula (ii-2), R c has the same meaning as the above formula (ii). R β represents a divalent cyclic hydrocarbon group which may have a substituent. * Represents a bond. The benzene ring in formula (ii-2) may be further substituted with any substituent.
(Rβ
 前記式(ii-2)において、Rβは、置換基を有していてもよい2価の環状炭化水素基を表す。
 環状炭化水素基としては、脂肪族環基又は芳香族環基が挙げられる。
(R β )
In the formula (ii-2), R β represents a divalent cyclic hydrocarbon group which may have a substituent.
Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.
 脂肪族環基が有する環の数は特に限定されないが、通常1以上、2以上が好ましく、また、通常10以下、5以下が好ましい。例えば、1~10が好ましく、1~5がより好ましく、2~5がさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 また、脂肪族環基の炭素数は通常4以上であり、6以上が好ましく、8以上がより好ましく、また、40以下が好ましく、35以下がより好ましく、30以下がさらに好ましい。例えば、4~40が好ましく、6~35がより好ましく、8~30がさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 脂肪族環基における脂肪族環の具体例としては、シクロヘキサン環、シクロヘプタン環、シクロデカン環、シクロドデカン環、ノルボルナン環、イソボルナン環、アダマンタン環等が挙げられる。これらの中でも相溶性の観点から、アダマンタン環が好ましい。
The number of rings contained in the aliphatic ring group is not particularly limited, but is usually preferably 1 or more and 2 or more, and is usually 10 or less and 5 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, and 2 to 5 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
The carbon number of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 35 or less, and further preferably 30 or less. For example, 4 to 40 is preferable, 6 to 35 is more preferable, and 8 to 30 is further preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring and the like. Among these, the adamantane ring is preferable from the viewpoint of compatibility.
 一方で、芳香族環基が有する環の数は特に限定されないが、通常1以上、2以上が好ましく、3以上がより好ましく、また、通常10以下、5以下が好ましい。例えば、1~10が好ましく、1~5がより好ましく、2~5がさらに好ましく、3~5がよりさらに好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 芳香族環基としては、芳香族炭化水素環基、芳香族複素環基が挙げられるまた、芳香族環基の炭素数は通常4以上であり、6以上が好ましく、8以上がより好ましく、10以上がさらに好ましく、また、40以下が好ましく、30以下がより好ましく、20以下がさらに好ましく、15以下が特に好ましい。例えば、4~40が好ましく、6~30がより好ましく、8~20がさらに好ましく、10~15が特に好ましい。前記下限値以上とすることで現像密着性が良好となる傾向があり、また、前記上限値以下とすることで硬化性が良好となる傾向がある。
 芳香族環基における芳香族環の具体例としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、フルオレン環等が挙げられる。これらの中でも信頼性の観点から、フルオレン環が好ましい。
On the other hand, the number of rings contained in the aromatic ring group is not particularly limited, but is usually 1 or more, 2 or more, preferably 3 or more, and usually 10 or less, 5 or less. For example, 1 to 10 is preferable, 1 to 5 is more preferable, 2 to 5 is further preferable, and 3 to 5 is even more preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The aromatic ring group usually has 4 or more carbon atoms, preferably 6 or more carbon atoms, more preferably 8 or more carbon atoms. The above is more preferable, 40 or less is preferable, 30 or less is more preferable, 20 or less is further preferable, and 15 or less is particularly preferable. For example, 4 to 40 is preferable, 6 to 30 is more preferable, 8 to 20 is further preferable, and 10 to 15 is particularly preferable. When it is at least the above lower limit, development adhesion tends to be good, and when it is at most the above upper limit, curability tends to be good.
Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring and the like. Among these, a fluorene ring is preferable from the viewpoint of reliability.
 環状炭化水素基が有していてもよい置換基としては、ヒドロキシル基、メチル基、エチル基、n-プロピル基、iso-プロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基、アミル基、iso-アミル基等の炭素数1~5のアルキル基;メトキシ基、エトキシ基等の炭素数1~5のアルコキシ基;ニトロ基;シアノ基;カルボキシル基等が挙げられる。合成容易性の観点からは、無置換が好ましい。 Examples of the substituent that the cyclic hydrocarbon group may have include a hydroxyl group, a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, Examples thereof include an alkyl group having 1 to 5 carbon atoms such as amyl group and iso-amyl group; an alkoxy group having 1 to 5 carbon atoms such as methoxy group and ethoxy group; nitro group; cyano group; and carboxyl group. From the viewpoint of ease of synthesis, unsubstituted is preferable.
 これらの中でも、相溶性の観点から、Rβが2価の脂肪族環基であることが好ましく、2価のアダマンタン環基であることがより好ましい。
 一方で、信頼性の観点から、Rβが2価の芳香族環基であることが好ましく、2価のフルオレン環基であることがより好ましい。
Among these, from the viewpoint of compatibility, R β is preferably a divalent aliphatic ring group, and more preferably a divalent adamantane ring group.
On the other hand, from the viewpoint of reliability, R β is preferably a divalent aromatic ring group, and more preferably a divalent fluorene ring group.
 前記のとおり、式(ii-2)中のベンゼン環は、さらに任意の置換基により置換されていてもよい。該置換基としては、例えば、ヒドロキシル基、メチル基、メトキシ基、エチル基、エトキシ基、プロピル基、プロポキシ基等が挙げられる。置換基の数も特に限定されず、1つでもよいし、2つ以上でもよい。また、これらの置換基を介して、式(ii-2)中の2つのベンゼン環が連結されていてもよい。
 パターニング特性の観点からは、無置換であることが好ましい。
As described above, the benzene ring in formula (ii-2) may be further substituted with any substituent. Examples of the substituent include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group and a propoxy group. The number of substituents is not particularly limited and may be one or two or more. In addition, the two benzene rings in formula (ii-2) may be linked via these substituents.
From the viewpoint of patterning characteristics, it is preferably unsubstituted.
 以下に前記式(ii-2)で表される部分構造の具体例を挙げる。 Specific examples of the partial structure represented by the formula (ii-2) will be given below.
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 一方で、前記式(ii)で表される部分構造は、相溶性の観点から、下記式(ii-3)で表される部分構造であることが好ましい。 On the other hand, the partial structure represented by the formula (ii) is preferably a partial structure represented by the following formula (ii-3) from the viewpoint of compatibility.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
 式(ii-3)中、Rc及びRdは前記式(ii)と同義である。RZは水素原子又は多塩基酸残基を表す。) In the formula (ii-3), R c and R d have the same meaning as in the formula (ii). R Z represents a hydrogen atom or a polybasic acid residue. )
 多塩基酸残基とは、多塩基酸又はその無水物からOH基を1つ除した1価の基を意味する。なお、さらにもう1つのOH基が除され、式(ii-3)で表される他の分子におけるRZと共用されていてもよく、つまり、RZを介して複数の式(ii-3)が連結していてもよい。
 多塩基酸としては、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ベンゾフェノンテトラカルボン酸、メチルヘキサヒドロフタル酸、エンドメチレンテトラヒドロフタル酸、クロレンド酸、メチルテトラヒドロフタル酸、ビフェニルテトラカルボン酸から選ばれた1種又は2種以上が挙げられる。
 これらの中でもパターニング特性の観点から、多塩基酸としては、好ましくは、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ビフェニルテトラカルボン酸であり、より好ましくは、テトラヒドロフタル酸、ビフェニルテトラカルボン酸である。
The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Further, another OH group may be removed and shared with R Z in another molecule represented by the formula (ii-3), that is, a plurality of formula (ii-3 may be introduced via R Z. ) May be linked.
Examples of polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid. Examples thereof include one or more selected from acids, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.
Of these, from the viewpoint of patterning properties, the polybasic acid is preferably maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid. Acids, and more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.
 エポキシ(メタ)アクリレート系樹脂(b1-B)1分子中に含まれる、前記式(ii-3)で表される部分構造は、1種でも2種以上でもよく、例えば、RXが水素原子のものと、RZが多塩基酸残基のものが混在していてもよい。 The partial structure represented by the formula (ii-3) contained in one molecule of the epoxy (meth)acrylate resin (b1-B) may be one kind or two or more kinds, for example, R X is a hydrogen atom. And those having R Z as a polybasic acid residue may be mixed.
 また、エポキシ(メタ)アクリレート系樹脂(b1-B)1分子中に含まれる、前記式(ii)で表される部分構造の数は特に限定されないが、1以上が好ましく、3以上がより好ましく、また、20以下が好ましく、15以下がより好ましく、10以下がさらに好ましい。例えば、1~20が好ましく、1~15がより好ましく、3~15がより好ましく、3~10がよりさらに好ましい。前記下限値以上とすることで硬化性が良好となる傾向があり、また、前記上限値以下とすることで現像溶解性が良好となる傾向がある。 The number of partial structures represented by the formula (ii) contained in one molecule of the epoxy (meth)acrylate resin (b1-B) is not particularly limited, but is preferably 1 or more, more preferably 3 or more. Further, 20 or less is preferable, 15 or less is more preferable, and 10 or less is further preferable. For example, 1 to 20 is preferable, 1 to 15 is more preferable, 3 to 15 is more preferable, 3 to 10 is even more preferable. When it is at least the lower limit, the curability tends to be good, and when it is at most the upper limit, the developing solubility tends to be good.
 一方で、(b)アルカリ可溶性樹脂として、着色剤や分散剤等との相溶性の観点から、(b2)アクリル共重合樹脂を用いることが好ましい。 On the other hand, as the (b) alkali-soluble resin, it is preferable to use (b2) an acrylic copolymer resin from the viewpoint of compatibility with a colorant, a dispersant and the like.
<(b2)アクリル共重合樹脂>
 (b2)アクリル共重合樹脂は、カルボキシル基又は水酸基を含むアクリル共重合樹脂であれば特に限定されないが、側鎖にエチレン性不飽和基を有するものであることが好ましい。エチレン性不飽和基を有するものとすることで、露光による光硬化により、現像時にアルカリ現像液による膜減りが起こりにくくなり、表面粗度が良好となる傾向がある。
<(b2) Acrylic copolymer resin>
The (b2) acrylic copolymer resin is not particularly limited as long as it is an acrylic copolymer resin containing a carboxyl group or a hydroxyl group, but it is preferable that the side chain has an ethylenically unsaturated group. By having an ethylenically unsaturated group, it is less likely that film loss due to an alkali developer will occur during development due to photocuring by exposure, and the surface roughness tends to be good.
(一般式(I)で表される部分構造)
 (b2)アクリル共重合樹脂が、側鎖にエチレン性不飽和基を有する場合、エチレン性不飽和基を有する側鎖を含む部分構造は特に限定されないが、膜の柔軟性に伴うラジカルの発散しやすさの観点から、例えば、下記一般式(I)で表される部分構造を有することが好ましい。
(Partial structure represented by general formula (I))
(B2) When the acrylic copolymer resin has an ethylenically unsaturated group in its side chain, the partial structure containing the side chain having an ethylenically unsaturated group is not particularly limited, but the emission of radicals accompanying the flexibility of the film From the viewpoint of ease, for example, it is preferable to have a partial structure represented by the following general formula (I).
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 式(I)中、R1及びR2は各々独立に、水素原子又はメチル基を表す。*は結合手を表す。) In formula (I), R 1 and R 2 each independently represent a hydrogen atom or a methyl group. * Represents a bond. )
 また、前記式(I)で表される部分構造の中でも、感度やアルカリ現像性の観点から、下記一般式(I’)で表される部分構造が好ましい。 Among the partial structures represented by the above formula (I), the partial structure represented by the following general formula (I′) is preferable from the viewpoint of sensitivity and alkali developability.
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
 式(I’)中、R1及びR2は各々独立に、水素原子又はメチル基を表す。RXは水素原子又は多塩基酸残基を表す。 In formula (I′), R 1 and R 2 each independently represent a hydrogen atom or a methyl group. R X represents a hydrogen atom or a polybasic acid residue.
 多塩基酸残基とは、多塩基酸又はその無水物からOH基を1つ除した1価の基を意味する。多塩基酸としては、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ベンゾフェノンテトラカルボン酸、メチルヘキサヒドロフタル酸、エンドメチレンテトラヒドロフタル酸、クロレンド酸、メチルテトラヒドロフタル酸、ビフェニルテトラカルボン酸から選ばれた1種又は2種以上が挙げられる。
 これらの中でもパターニング特性の観点から、好ましくは、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタル酸、ピロメリット酸、トリメリット酸、ビフェニルテトラカルボン酸であり、より好ましくは、テトラヒドロフタル酸、ビフェニルテトラカルボン酸である。
The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Examples of polybasic acids include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid. Examples thereof include one or more selected from acids, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.
Among these, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid are preferable from the viewpoint of patterning characteristics, and more preferable. Are tetrahydrophthalic acid and biphenyltetracarboxylic acid.
 (b2)アクリル共重合樹脂が前記一般式(I)で表される部分構造を含む場合、その含有割合は特に限定されないが10モル%以上が好ましく、30モル%以上がより好ましく、50モル%以上がさらに好ましく、70モル%以上がよりさらに好ましく、80モル%以上が特に好ましく、また、98モル%以下が好ましく、95モル%以下がより好ましい。例えば、10~98モル%が好ましく、30~98モル%がより好ましく、50~98モル%がさらに好ましく、70~98モル%がよりさらに好ましく、80~95モル%が特に好ましい。前記下限値以上とすることで機械的特性が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。 When the acrylic copolymer resin (b2) includes the partial structure represented by the general formula (I), the content ratio is not particularly limited, but is preferably 10 mol% or more, more preferably 30 mol% or more, and 50 mol%. The above is more preferable, 70 mol% or more is still more preferable, 80 mol% or more is particularly preferable, 98 mol% or less is preferable, and 95 mol% or less is more preferable. For example, 10 to 98 mol% is preferable, 30 to 98 mol% is more preferable, 50 to 98 mol% is further preferable, 70 to 98 mol% is further preferable, and 80 to 95 mol% is particularly preferable. When it is at least the lower limit, mechanical properties tend to be improved, and when it is at most the upper limit, residues tend to be reduced.
 (b2)アクリル共重合樹脂が前記一般式(I’)で表される部分構造を含む場合、その含有割合は特に限定されないが、10モル%以上が好ましく、30モル%以上がより好ましく、50モル%以上がさらに好ましく、70モル%以上がよりさらに好ましく、80モル%以上が特に好ましく、また、98モル%以下が好ましく、95モル%以下がより好ましい。例えば、10~98モル%が好ましく、30~98モル%がより好ましく、50~98モル%がさらに好ましく、70~98モル%がよりさらに好ましく、80~95モル%が特に好ましい。前記下限値以上とすることでアルカリ現像性や機械特性が良好になりやすい傾向があり、また、前記上限値以下とすることで表面粗度が向上し、残渣が低減する傾向がある。 When the acrylic copolymer resin (b2) contains the partial structure represented by the general formula (I′), the content ratio thereof is not particularly limited, but is preferably 10 mol% or more, more preferably 30 mol% or more, and 50 It is more preferably at least mol%, further preferably at least 70 mol%, particularly preferably at least 80 mol%, preferably at most 98 mol%, more preferably at most 95 mol%. For example, 10 to 98 mol% is preferable, 30 to 98 mol% is more preferable, 50 to 98 mol% is further preferable, 70 to 98 mol% is further preferable, and 80 to 95 mol% is particularly preferable. When it is at least the lower limit, the alkali developability and mechanical properties tend to be good, and when it is at most the upper limit, the surface roughness is improved and the residue tends to be reduced.
(一般式(II)で表される部分構造)
 (b2)アクリル共重合樹脂が前記一般式(I)で表される部分構造を含む場合、他に含まれる部分構造は特に限定されないが、現像密着性の観点から、例えば、下記一般式(II)で表される部分構造を有することも好ましい。
(Partial structure represented by general formula (II))
When the acrylic copolymer resin (b2) contains the partial structure represented by the general formula (I), the other partial structure is not particularly limited, but from the viewpoint of development adhesion, for example, the following general formula (II) It is also preferable to have a partial structure represented by
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
 上記式(II)中、R3は水素原子又はメチル基を表し、R4は置換基を有していてもよいアルキル基、置換基を有していてもよい芳香族環基、又は置換基を有していてもよいアルケニル基を表す。 In the above formula (II), R 3 represents a hydrogen atom or a methyl group, R 4 represents an alkyl group which may have a substituent, an aromatic ring group which may have a substituent, or a substituent. Represents an alkenyl group which may have.
(R4
 前記式(II)において、R4は置換基を有していてもよいアルキル基、置換基を有していてもよい芳香族環基、又は置換基を有していてもよいアルケニル基を表す。
 R4におけるアルキル基としては直鎖状、分岐鎖状又は環状のアルキル基が挙げられる。その炭素数は、1以上が好ましく、3以上がより好ましく、5以上がさらに好ましく、8以上が特に好ましく、また、20以下が好ましく、18以下がより好ましく、16以下がさらに好ましく、14以下がよりさらに好ましく、12以下が特に好ましい。例えば、1~20が好ましく、1~18がより好ましく、3~16がさらに好ましく、5~14がよりさらに好ましく、8~12が特に好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。
(R 4 )
In the above formula (II), R 4 represents an alkyl group which may have a substituent, an aromatic ring group which may have a substituent, or an alkenyl group which may have a substituent. ..
Examples of the alkyl group for R 4 include linear, branched or cyclic alkyl groups. The carbon number is preferably 1 or more, more preferably 3 or more, further preferably 5 or more, particularly preferably 8 or more, and preferably 20 or less, more preferably 18 or less, further preferably 16 or less, and 14 or less. Even more preferable, and 12 or less are particularly preferable. For example, 1 to 20 is preferable, 1 to 18 is more preferable, 3 to 16 is further preferable, 5 to 14 is further preferable, and 8 to 12 is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
 アルキル基の具体例としては、メチル基、エチル基、シクロヘキシル基、ジシクロペンタニル基、ドデカニル基等が挙げられる。これらの中でも現像性の観点から、ジシクロペンタニル基又はドデカニル基が好ましく、ジシクロペンタニル基がより好ましい。
 また、アルキル基が有していてもよい置換基としては、メトキシ基、エトキシ基、クロロ基、ブロモ基、フルオロ基、ヒドロキシ基、アミノ基、エポキシ基、オリゴエチレングリコール基、フェニル基、カルボキシル基、アクリロイル基、メタクリロイル基などが挙げられ、現像性の観点から、ヒドロキシ基、オリゴエチレングリコール基が好ましい。
Specific examples of the alkyl group include a methyl group, an ethyl group, a cyclohexyl group, a dicyclopentanyl group, a dodecanyl group and the like. Among these, a dicyclopentanyl group or a dodecanyl group is preferable, and a dicyclopentanyl group is more preferable, from the viewpoint of developability.
Further, the substituent that the alkyl group may have is a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, an oligoethylene glycol group, a phenyl group, a carboxyl group. , An acryloyl group, a methacryloyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
 R4における芳香族環基としては、1価の芳香族炭化水素環基及び1価の芳香族複素環基が挙げられる。その炭素数は6以上が好ましく、また、24以下が好ましく、22以下がより好ましく、20以下がさらに好ましく、18以下が特に好ましい。例えば、6~24が好ましく、6~22がより好ましく、6~20がさらに好ましく、6~18が特に好ましい。前記下限値以上とすることで現像密着性が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。
 芳香族炭化水素環基における芳香族炭化水素環としては、単環であっても縮合環であってもよく、例えば、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ペリレン環、テトラセン環、ピレン環、ベンズピレン環、クリセン環、トリフェニレン環、アセナフテン環、フルオランテン環、フルオレン環などが挙げられる。
 また、芳香族複素環基における芳香族複素環基としては、単環であっても縮合環であってもよく、例えば、フラン環、ベンゾフラン環、チオフェン環、ベンゾチオフェン環、ピロール環、ピラゾール環、イミダゾール環、オキサジアゾール環、インドール環、カルバゾール環、ピロロイミダゾール環、ピロロピラゾール環、ピロロピロール環、チエノピロール環、チエノチオフェン環、フロピロール環、フロフラン環、チエノフラン環、ベンゾイソオキサゾール環、ベンゾイソチアゾール環、ベンゾイミダゾール環、ピリジン環、ピラジン環、ピリダジン環、ピリミジン環、トリアジン環、キノリン環、イソキノリン環、シノリン環、キノキサリン環、フェナントリジン環、ペリミジン環、キナゾリン環、キナゾリノン環、アズレン環などが挙げられる。これらの中でも現像性の観点から、ベンゼン環、又はナフタレン環が好ましく、ベンゼン環がより好ましい。
 また、芳香族環基が有していてもよい置換基としては、メチル基、エチル基、プロピル基、メトキシ基、エトキシ基、クロロ基、ブロモ基、フルオロ基、ヒドロキシ基、アミノ基、エポキシ基、オリゴエチレングリコール基、フェニル基、カルボキシル基などが挙げられ、現像性の観点から、ヒドロキシ基、オリゴエチレングリコール基が好ましい。
Examples of the aromatic ring group for R 4 include a monovalent aromatic hydrocarbon ring group and a monovalent aromatic heterocyclic group. The carbon number is preferably 6 or more, more preferably 24 or less, more preferably 22 or less, further preferably 20 or less, particularly preferably 18 or less. For example, 6 to 24 is preferable, 6 to 22 is more preferable, 6 to 20 is further preferable, and 6 to 18 is particularly preferable. When it is at least the lower limit, the development adhesion tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
The aromatic hydrocarbon ring in the aromatic hydrocarbon ring group may be a single ring or a condensed ring, and examples thereof include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, and a pyrene. Examples thereof include a ring, a benzpyrene ring, a chrysene ring, a triphenylene ring, an acenaphthene ring, a fluoranthene ring and a fluorene ring.
The aromatic heterocyclic group in the aromatic heterocyclic group may be a single ring or a condensed ring, and examples thereof include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring and a pyrazole ring. , Imidazole ring, oxadiazole ring, indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furofuran ring, thienofuran ring, benzisoxazole ring, benzoiso Thiazole ring, benzimidazole ring, pyridine ring, pyrazine ring, pyridazine ring, pyrimidine ring, triazine ring, quinoline ring, isoquinoline ring, cynoline ring, quinoxaline ring, phenanthridine ring, perimidine ring, quinazoline ring, quinazolinone ring, azulene ring And so on. Among these, a benzene ring or a naphthalene ring is preferable, and a benzene ring is more preferable, from the viewpoint of developability.
Further, the substituent which the aromatic ring group may have, a methyl group, an ethyl group, a propyl group, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group , An oligoethylene glycol group, a phenyl group, a carboxyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
 R4におけるアルケニル基としては、直鎖状、分岐鎖状又は環状のアルケニル基が挙げられる。その炭素数は、2以上が好ましく、また、22以下が好ましく、20以下がより好ましく、18以下がさらに好ましく、16以下がよりさらに好ましく、14以下が特に好ましい。例えば、2~22が好ましく、2~20がより好ましく、2~18がさらに好ましく、2~16がよりさらに好ましく、2~14が特に好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。 The alkenyl group for R 4 includes a linear, branched or cyclic alkenyl group. The carbon number is preferably 2 or more, more preferably 22 or less, more preferably 20 or less, further preferably 18 or less, even more preferably 16 or less, and particularly preferably 14 or less. For example, 2 to 22 is preferable, 2 to 20 is more preferable, 2 to 18 is further preferable, 2 to 16 is even more preferable, and 2 to 14 is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
 また、アルケニル基が有していてもよい置換基としては、メチル基、エチル基、プロピル基、メトキシ基、エトキシ基、クロロ基、ブロモ基、フルオロ基、ヒドロキシ基、アミノ基、エポキシ基、オリゴエチレングリコール基、フェニル基、カルボキシル基などが挙げられ、現像性の観点から、ヒドロキシ基、オリゴエチレングリコール基が好ましい。 The substituent which the alkenyl group may have includes a methyl group, an ethyl group, a propyl group, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, and an oligo group. Examples thereof include an ethylene glycol group, a phenyl group and a carboxyl group. From the viewpoint of developability, a hydroxy group and an oligoethylene glycol group are preferable.
 このように、R4は置換基を有していてもよいアルキル基、置換基を有していてもよいアリール基、又は置換基を有していてもよいアルケニル基を表すが、これらの中でも現像性と膜強度の観点から、アルキル基又はアルケニルが好ましく、アルキル基がより好ましい。 As described above, R 4 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkenyl group which may have a substituent. From the viewpoint of developability and film strength, an alkyl group or alkenyl is preferable, and an alkyl group is more preferable.
 (b2)アクリル共重合樹脂が前記一般式(II)で表される部分構造を含む場合、その含有割合は特に限定されないが、0.1モル%以上が好ましく、0.5モル%以上がより好ましく、1モル%以上がさらに好ましく、また、70モル%以下が好ましく、50モル%以下がより好ましく、30モル%以下がさらに好ましく、10モル%以下が特に好ましい。例えば、0.1~70モル%が好ましく、0.1~50モル%がより好ましく、0.5~30モル%がさらに好ましく、1~10モル%が特に好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。 When the acrylic copolymer resin (b2) contains the partial structure represented by the general formula (II), the content ratio thereof is not particularly limited, but is preferably 0.1 mol% or more, and more preferably 0.5 mol% or more. 1 mol% or more is more preferable, 70 mol% or less is preferable, 50 mol% or less is more preferable, 30 mol% or less is further preferable, and 10 mol% or less is particularly preferable. For example, 0.1 to 70 mol% is preferable, 0.1 to 50 mol% is more preferable, 0.5 to 30 mol% is further preferable, and 1 to 10 mol% is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
(一般式(III)で表される部分構造)
 (b2)アクリル共重合樹脂が前記一般式(I)で表される部分構造を含む場合、他に含まれる部分構造として、耐熱性、膜強度の観点から下記一般式(III)で表される部分構造が含まれることが好ましい。
(Partial structure represented by general formula (III))
When the acrylic copolymer resin (b2) includes the partial structure represented by the general formula (I), the other partial structure represented by the general formula (III) is from the viewpoint of heat resistance and film strength. It is preferable that a partial structure is included.
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
 上記式(III)中、R5は水素原子又はメチル基を表し、R6は置換基を有していてもよいアルキル基、置換基を有していてもよいアルケニル基、置換基を有していてもよいアルキニル基、ヒドロキシル基、カルボキシル基、ハロゲン原子、置換基を有していてもよいアルコキシ基、チオール基、又は置換基を有していてもよいアルキルスルフィド基を表す。tは0~5の整数を表す。 In the above formula (III), R 5 represents a hydrogen atom or a methyl group, and R 6 has an alkyl group which may have a substituent, an alkenyl group which may have a substituent, and a substituent. Optionally represents an alkynyl group, a hydroxyl group, a carboxyl group, a halogen atom, an alkoxy group which may have a substituent, a thiol group, or an alkylsulfide group which may have a substituent. t represents an integer of 0 to 5.
(R6
 前記式(III)においてR6は置換基を有していてもよいアルキル基、置換基を有していてもよいアルケニル基、置換基を有していてもよいアルキニル基、ヒドロキシル基、カルボキシル基、ハロゲン原子、置換基を有していてもよいアルコキシ基、チオール基、又は置換基を有していてもよいアルキルスルフィド基を表す。
 R6におけるアルキル基としては、直鎖状、分岐鎖状又は環状のアルキル基が挙げられる。その炭素数は、1以上が好ましく、3以上がより好ましく、5以上がさらに好ましく、また、20以下が好ましく、18以下がより好ましく、16以下がさらに好ましく、14以下がよりさらに好ましく、12以下が特に好ましい。例えば、1~20が好ましく、3~18がより好ましく、3~16がさらに好ましく、5~14がよりさらに好ましく、5~12が特に好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。
(R 6 )
In the formula (III), R 6 is an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, a hydroxyl group, a carboxyl group. Represents a halogen atom, an alkoxy group which may have a substituent, a thiol group, or an alkylsulfide group which may have a substituent.
Examples of the alkyl group for R 6 include linear, branched or cyclic alkyl groups. The number of carbon atoms is preferably 1 or more, more preferably 3 or more, further preferably 5 or more, preferably 20 or less, more preferably 18 or less, further preferably 16 or less, still more preferably 14 or less, and 12 or less. Is particularly preferable. For example, 1 to 20 is preferable, 3 to 18 is more preferable, 3 to 16 is further preferable, 5 to 14 is further preferable, and 5 to 12 is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
 アルキル基の具体例としては、メチル基、エチル基、シクロヘキシル基、ジシクロペンタニル基、ドデカニル基等が挙げられる。これらの中でも現像性と表面粗度の観点から、ジシクロペンタニル基又はドデカニル基が好ましく、ジシクロペンタニル基がより好ましい。
 また、アルキル基が有していてもよい置換基としては、メトキシ基、エトキシ基、クロロ基、ブロモ基、フルオロ基、ヒドロキシ基、アミノ基、エポキシ基、オリゴエチレングリコール基、フェニル基、カルボキシル基、アクリロイル基、メタクリロイル基などが挙げられ、現像性の観点から、ヒドロキシ基、オリゴエチレングリコール基が好ましい。
Specific examples of the alkyl group include a methyl group, an ethyl group, a cyclohexyl group, a dicyclopentanyl group, a dodecanyl group and the like. Of these, a dicyclopentanyl group or a dodecanyl group is preferable, and a dicyclopentanyl group is more preferable, from the viewpoints of developability and surface roughness.
Further, as the substituent which the alkyl group may have, methoxy group, ethoxy group, chloro group, bromo group, fluoro group, hydroxy group, amino group, epoxy group, oligoethylene glycol group, phenyl group, carboxyl group , An acryloyl group, a methacryloyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
 R6におけるアルケニル基としては、直鎖状、分岐鎖状又は環状のアルケニル基が挙げられる。その炭素数は、2以上が好ましく、また、22以下が好ましく、20以下がより好ましく、18以下がさらに好ましく、16以下がよりさらに好ましく、14以下が特に好ましい。例えば、2~22が好ましく、2~20がより好ましく、2~18がさらに好ましく、2~16がよりさらに好ましく、2~14が特に好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。 The alkenyl group for R 6 includes a linear, branched or cyclic alkenyl group. The carbon number is preferably 2 or more, more preferably 22 or less, more preferably 20 or less, further preferably 18 or less, even more preferably 16 or less, and particularly preferably 14 or less. For example, 2 to 22 is preferable, 2 to 20 is more preferable, 2 to 18 is further preferable, 2 to 16 is even more preferable, and 2 to 14 is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
 また、アルケニル基が有していてもよい置換基としては、メチル基、エチル基、プロピル基、メトキシ基、エトキシ基、クロロ基、ブロモ基、フルオロ基、ヒドロキシ基、アミノ基、エポキシ基、オリゴエチレングリコール基、フェニル基、カルボキシル基などが挙げられ、現像性の観点から、ヒドロキシ基、オリゴエチレングリコール基が好ましい。 The substituent which the alkenyl group may have includes a methyl group, an ethyl group, a propyl group, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, and an oligo group. Examples thereof include an ethylene glycol group, a phenyl group and a carboxyl group. From the viewpoint of developability, a hydroxy group and an oligoethylene glycol group are preferable.
 R6におけるアルキニル基としては、直鎖状、分岐鎖状又は環状のアルキニル基が挙げられる。その炭素数は、2以上が好ましく、また、22以下が好ましく、20以下がより好ましく、18以下がさらに好ましく、16以下がよりさらに好ましく、14以下が特に好ましい。例えば、2~22が好ましく、2~20がより好ましく、2~18がさらに好ましく、2~16がよりさらに好ましく、2~14が特に好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。 Examples of the alkynyl group for R 6 include a linear, branched or cyclic alkynyl group. The carbon number is preferably 2 or more, more preferably 22 or less, more preferably 20 or less, further preferably 18 or less, even more preferably 16 or less, and particularly preferably 14 or less. For example, 2 to 22 is preferable, 2 to 20 is more preferable, 2 to 18 is further preferable, 2 to 16 is even more preferable, and 2 to 14 is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
 また、アルキニル基が有していてもよい置換基としては、メチル基、エチル基、プロピル基、メトキシ基、エトキシ基、クロロ基、ブロモ基、フルオロ基、ヒドロキシ基、アミノ基、エポキシ基、オリゴエチレングリコール基、フェニル基、カルボキシル基などが挙げられ、現像性の観点から、ヒドロキシ基、オリゴエチレングリコール基が好ましい。 Further, as the substituent which the alkynyl group may have, a methyl group, an ethyl group, a propyl group, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, an oligo group. Examples thereof include an ethylene glycol group, a phenyl group and a carboxyl group. From the viewpoint of developability, a hydroxy group and an oligoethylene glycol group are preferable.
 R6におけるハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられ、これらの中でも撥インク性の観点からはフッ素原子が好ましい。 Examples of the halogen atom in R 6 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and among these, a fluorine atom is preferable from the viewpoint of ink repellency.
 R6におけるアルコキシ基としては、直鎖状、分岐鎖状又は環状のアルコキシ基が挙げられる。その炭素数は、1以上が好ましく、また、20以下が好ましく、18以下がより好ましく、16以下がさらに好ましく、14以下がよりさらに好ましく、12以下が特に好ましい。例えば、1~20が好ましく、1~18がより好ましく、1~16がさらに好ましく、1~14がよりさらに好ましく、1~12が特に好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。 Examples of the alkoxy group for R 6 include linear, branched or cyclic alkoxy groups. The carbon number is preferably 1 or more, preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, even more preferably 14 or less, and particularly preferably 12 or less. For example, 1 to 20 is preferable, 1 to 18 is more preferable, 1 to 16 is further preferable, 1 to 14 is further preferable, and 1 to 12 is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
 また、アルコシ基が有していてもよい置換基としては、メトキシ基、エトキシ基、クロロ基、ブロモ基、フルオロ基、ヒドロキシ基、アミノ基、エポキシ基、オリゴエチレングリコール基、フェニル基、カルボキシル基、アクリロイル基、メタクリロイル基などが挙げられ、現像性の観点から、ヒドロキシ基、オリゴエチレングリコール基が好ましい。 Further, as the substituent which the alkoxy group may have, a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, an oligoethylene glycol group, a phenyl group, a carboxyl group. , An acryloyl group, a methacryloyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
 R6におけるアルキルスルフィド基としては、直鎖状、分岐鎖状又は環状のアルキルスルフィド基が挙げられる。その炭素数は、1以上が好ましく、また、20以下が好ましく、18以下がより好ましく、16以下がさらに好ましく、14以下がよりさらに好ましく、12以下が特に好ましい。例えば、1~20が好ましく、1~18がより好ましく、1~16がさらに好ましく、1~14がよりさらに好ましく、1~12が特に好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。 Examples of the alkyl sulfide group for R 6 include linear, branched or cyclic alkyl sulfide groups. The carbon number is preferably 1 or more, preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, even more preferably 14 or less, and particularly preferably 12 or less. For example, 1 to 20 is preferable, 1 to 18 is more preferable, 1 to 16 is further preferable, 1 to 14 is further preferable, and 1 to 12 is particularly preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
 また、アルキルスルフィド基におけるアルキル基が有していてもよい置換基としては、メトキシ基、エトキシ基、クロロ基、ブロモ基、フルオロ基、ヒドロキシ基、アミノ基、エポキシ基、オリゴエチレングリコール基、フェニル基、カルボキシル基、アクリロイル基、メタクリロイル基などが挙げられ、現像性の観点から、ヒドロキシ基、オリゴエチレングリコール基が好ましい。 Further, the substituent which the alkyl group in the alkyl sulfide group may have is a methoxy group, an ethoxy group, a chloro group, a bromo group, a fluoro group, a hydroxy group, an amino group, an epoxy group, an oligoethylene glycol group, phenyl. Group, a carboxyl group, an acryloyl group, a methacryloyl group, and the like, and a hydroxy group and an oligoethylene glycol group are preferable from the viewpoint of developability.
 このように、R6は置換基を有していてもよいアルキル基、置換基を有していてもよいアルケニル基、置換基を有していてもよいアルキニル基、ヒドロキシル基、カルボキシル基、ハロゲン原子、アルコキシ基、ヒドロキシアルキル基、チオール基、又は置換基を有していてもよいアルキルスルフィド基を表すが、これらの中でも現像性の観点から、ヒドロキシル基又はカルボキシル基が好ましく、カルボキシル基がより好ましい。 Thus, R 6 is an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, a hydroxyl group, a carboxyl group, a halogen group. An atom, an alkoxy group, a hydroxyalkyl group, a thiol group, or an alkylsulfide group which may have a substituent is represented, and among these, from the viewpoint of developability, a hydroxyl group or a carboxyl group is preferable, and a carboxyl group is more preferable. preferable.
 前記式(III)においてtは0~5の整数を表すが、合成容易性の観点からはtが0であることが好ましい。 In the formula (III), t represents an integer of 0 to 5, but t is preferably 0 from the viewpoint of easiness of synthesis.
 (b2)アクリル共重合樹脂が前記一般式(III)で表される部分構造を含む場合、その含有割合は特に限定されないが、0.5モル%以上が好ましく、1モル%以上がより好ましく、2モル%以上がさらに好ましい。また、50モル%以下が好ましく、30モル%以下がより好ましく、20モル%以下がさらに好ましく、10モル%以下がより好ましい。例えば、0.5~50モル%が好ましく、1~30モル%がより好ましく、1~20モル%がさらに好ましく、2~10モル%がより好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで残渣が低減する傾向がある。 When the acrylic copolymer resin (b2) contains the partial structure represented by the general formula (III), the content ratio thereof is not particularly limited, but is preferably 0.5 mol% or more, more preferably 1 mol% or more, It is more preferably 2 mol% or more. Moreover, 50 mol% or less is preferable, 30 mol% or less is more preferable, 20 mol% or less is further preferable, and 10 mol% or less is more preferable. For example, 0.5 to 50 mol% is preferable, 1 to 30 mol% is more preferable, 1 to 20 mol% is further preferable, and 2 to 10 mol% is more preferable. When the content is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the residue tends to be reduced.
(一般式(IV)で表される部分構造)
 (b2)アクリル共重合樹脂が前記一般式(I)で表される部分構造を有する場合、他に含まれる部分構造として、現像性の観点から下記一般式(IV)で表される部分構造を有することも好ましい。
(Partial structure represented by general formula (IV))
When the acrylic copolymer resin (b2) has a partial structure represented by the general formula (I), the partial structure represented by the following general formula (IV) is included as another partial structure from the viewpoint of developability. It is also preferable to have.
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 上記式(IV)中、R7は水素原子又はメチル基を表す。 In the above formula (IV), R 7 represents a hydrogen atom or a methyl group.
 (b2)アクリル共重合樹脂が前記一般式(IV)で表される部分構造を含む場合、その含有割合は特に限定されないが、5モル%以上が好ましく、10モル%以上がより好ましく、20モル%以上がさらに好ましく、また、80モル%以下が好ましく、70モル%以下がより好ましく、60%モル以下がさらに好ましい。例えば、5~80モル%が好ましく、10~70モル%がより好ましく、20~60%モルがさらに好ましい。前記下限値以上とすることで現像性が向上する傾向があり、また、前記上限値以下とすることで表面粗度が向上する傾向がある。 When the acrylic copolymer resin (b2) includes the partial structure represented by the general formula (IV), the content ratio thereof is not particularly limited, but is preferably 5 mol% or more, more preferably 10 mol% or more, and 20 mol%. % Or more, more preferably 80 mol% or less, further preferably 70 mol% or less, and further preferably 60% mol or less. For example, 5 to 80 mol% is preferable, 10 to 70 mol% is more preferable, and 20 to 60% mol is further preferable. When it is at least the lower limit, the developability tends to be improved, and when it is at most the upper limit, the surface roughness tends to be improved.
 一方で、(b2)アクリル共重合樹脂の酸価は特に限定されないが、10mgKOH/g以上が好ましく、15mgKOH/g以上がより好ましく、20mgKOH/g以上がさらに好ましく、また、150mgKOH/g以下が好ましく、120mgKOH/g以下がより好ましく、100mgKOH/g以下がさらに好ましく、50mgKOH/g以下がよりさらに好ましい。例えば、10~150mgKOH/gが好ましく、10~120mgKOH/gがより好ましく、15~100mgKOH/gがさらに好ましく、20~50mgKOH/gがよりさらに好ましい。前記下限値以上とすることで現像性が向上する傾向があり、また、前記上限値以下とすることで表面粗度が向上する傾向がある。 On the other hand, the acid value of the (b2) acrylic copolymer resin is not particularly limited, but 10 mgKOH/g or more is preferable, 15 mgKOH/g or more is more preferable, 20 mgKOH/g or more is further preferable, and 150 mgKOH/g or less is preferable. , 120 mgKOH/g or less is more preferable, 100 mgKOH/g or less is still more preferable, and 50 mgKOH/g or less is still more preferable. For example, 10 to 150 mgKOH/g is preferable, 10 to 120 mgKOH/g is more preferable, 15 to 100 mgKOH/g is further preferable, and 20 to 50 mgKOH/g is even more preferable. When it is at least the lower limit, the developability tends to be improved, and when it is at most the upper limit, the surface roughness tends to be improved.
 (b2)アクリル共重合樹脂の重量平均分子量(Mw)は特に限定されないが、通常1000以上、好ましくは2000以上、より好ましくは4000以上、さらに好ましくは6000以上、よりさらに好ましくは7000以上、特に好ましくは8000以上であり、また、通常30000以下、好ましくは20000以下、より好ましくは15000以下、さらに好ましくは10000以下である。例えば、1000~20000が好ましく、2000~20000がより好ましく、4000~15000がさらに好ましく、6000~15000がよりさらに好ましく、7000~10000が特に好ましく、8000~10000がとりわけ好ましい。前記下限値以上とすることで表面粗度が向上する傾向があり、また、前記上限値以下とすることで現像性が良好となる傾向がある。 The weight average molecular weight (Mw) of the (b2) acrylic copolymer resin is not particularly limited, but is usually 1000 or more, preferably 2000 or more, more preferably 4000 or more, still more preferably 6000 or more, still more preferably 7,000 or more, and particularly preferably. Is 8,000 or more, and is usually 30,000 or less, preferably 20,000 or less, more preferably 15,000 or less, still more preferably 10,000 or less. For example, 1000 to 20000 is preferable, 2000 to 20000 is more preferable, 4000 to 15000 is further preferable, 6000 to 15000 is still more preferable, 7000 to 10000 is particularly preferable, and 8000 to 10000 is particularly preferable. When it is at least the lower limit, the surface roughness tends to be improved, and when it is at most the upper limit, the developability tends to be good.
 (b2)アクリル共重合樹脂の二重結合当量は特に限定されないが、500以下が好ましく、400以下がより好ましく、350以下がさらに好ましく、300以下が特に好ましく、また、100以上が好ましく、150以上がより好ましく、180以上がさらに好ましく、200以上が特に好ましい。例えば、100~500が好ましく、150~400がより好ましく、180~350がさらに好ましく、200~300が特に好ましい。前記上限値以下とすることで機械的特性や表面粗度が向上する傾向があり、また、前記下限値以上とすることで保存安定性が向上する傾向がある。 (B2) The double bond equivalent of the acrylic copolymer resin is not particularly limited, but is preferably 500 or less, more preferably 400 or less, further preferably 350 or less, particularly preferably 300 or less, and preferably 100 or more, 150 or more. Is more preferable, 180 or more is further preferable, and 200 or more is particularly preferable. For example, 100 to 500 is preferable, 150 to 400 is more preferable, 180 to 350 is further preferable, and 200 to 300 is particularly preferable. When it is at most the upper limit, mechanical properties and surface roughness will tend to improve, and when it is at least the lower limit, storage stability will tend to improve.
 なお、(b2)アクリル共重合樹脂の具体例としては、例えば、日本国特開平8-297366号公報や日本国特開2001-89533号公報に記載の樹脂が挙げられる。 Specific examples of the (b2) acrylic copolymer resin include resins described in JP-A-8-297366 and JP-A-2001-89533.
<(c)光重合開始剤>
 (c)光重合開始剤は、光を直接吸収し、分解反応又は水素引き抜き反応を起こし、重合活性ラジカルを発生する機能を有する成分である。必要に応じて重合促進剤(連鎖移動剤)、増感色素等の付加剤を添加して使用してもよい。
 光重合開始剤としては、例えば、日本国特開昭59-152396号公報、日本国特開昭61-151197号公報に記載のチタノセン化合物を含むメタロセン化合物;日本国特開2000-56118号公報に記載のヘキサアリールビイミダゾール誘導体;日本国特開平10-39503号公報記載のハロメチル化オキサジアゾール誘導体、ハロメチル-s-トリアジン誘導体、N-フェニルグリシン等のN-アリール-α-アミノ酸類、N-アリール-α-アミノ酸塩類、N-アリール-α-アミノ酸エステル類等のラジカル活性剤、α-アミノアルキルフェノン誘導体;日本国特開2000-80068号公報、日本国特開2006-36750号公報等に記載されているオキシムエステル系化合物等が挙げられる。
<(c) Photopolymerization initiator>
The (c) photopolymerization initiator is a component having a function of directly absorbing light, causing a decomposition reaction or a hydrogen abstraction reaction, and generating a polymerization active radical. If necessary, an addition agent such as a polymerization accelerator (chain transfer agent) or a sensitizing dye may be added and used.
Examples of the photopolymerization initiator include metallocene compounds containing a titanocene compound described in JP-A-59-152396 and JP-A-61-151197; JP-A-2000-56118. Hexaarylbiimidazole derivatives described; N-aryl-α-amino acids such as halomethylated oxadiazole derivatives, halomethyl-s-triazine derivatives, N-phenylglycine and the like described in JP-A-10-39503, N- Radical activators such as aryl-α-amino acid salts and N-aryl-α-amino acid esters, α-aminoalkylphenone derivatives; JP-A 2000-80068, JP-A 2006-36750, etc. The oxime ester compounds described and the like can be mentioned.
 光重合開始剤としては、機械的特性と表面粗度向上の観点から、特にヘキサアリールビイミダゾール化合物が好ましい。 As the photopolymerization initiator, a hexaarylbiimidazole compound is particularly preferable from the viewpoint of improving mechanical properties and surface roughness.
 ヘキサアリールビイミダゾール化合物としては、機械的特性の観点から、下記一般式(1-1)及び/又は下記一般式(1-2)で表されるヘキサアリールビイミダゾール系光ラジカル開始剤が好ましい。 As the hexaarylbiimidazole compound, a hexaarylbiimidazole-based photoradical initiator represented by the following general formula (1-1) and/or the following general formula (1-2) is preferable from the viewpoint of mechanical properties.
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
 上記式中、R1~R3は、各々独立に置換基を有してもよい炭素数1~4のアルキル基、置換基を有してもよい炭素数1~4のアルコキシ基、又はハロゲン原子を表し、l、m及びnは、各々独立に0~5の整数を表す。 In the above formula, R 1 to R 3 are each independently an alkyl group having 1 to 4 carbon atoms which may have a substituent, an alkoxy group having 1 to 4 carbon atoms which may have a substituent, or halogen. Represents an atom, and l, m and n each independently represent an integer of 0-5.
 R1~R3のアルキル基の炭素数は1~4の範囲内であれば特に限定されないが、機械的特性の観点から、好ましくは3以下、より好ましくは2以下である。アルキル基は鎖状のものでも、環状のものでもよい。アルキル基の具体例としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基が挙げられ、中でもメチル基、エチル基が好ましい。R1~R3の炭素数1~4のアルキル基が有してもよい置換基としては、水素を除く1価の非金属原子団の基が用いられ、好ましい例としては、ハロゲン原子(-F、-Br、-Cl、-I)、ヒドロキシル基、アルコキシ基が挙げられる。 The carbon number of the alkyl group of R 1 to R 3 is not particularly limited as long as it is within the range of 1 to 4, but from the viewpoint of mechanical properties, it is preferably 3 or less, more preferably 2 or less. The alkyl group may be chain-shaped or cyclic. Specific examples of the alkyl group include, for example, a methyl group, an ethyl group, a propyl group and an isopropyl group, and among them, a methyl group and an ethyl group are preferable. As the substituent that the alkyl group having 1 to 4 carbon atoms of R 1 to R 3 may have, a monovalent non-metal atomic group group other than hydrogen is used, and a preferable example thereof is a halogen atom (- F, —Br, —Cl, —I), a hydroxyl group and an alkoxy group.
 また、R1~R3のアルコキシ基の炭素数は1~4の範囲内であれば特に限定されないが、テーパー角度増大の観点から、好ましくは3以下、より好ましくは2以下である。アルコキシ基のアルキル基部分は鎖状のものでも、環状のものでもよい。アルコキシ基の具体例とは、例えば、メトキシ基、エトキシ基、プロポキシ基、イソプロピルオキシ基、ブトキシ基が挙げられ、中でもメトキシ基、エトキシ基が好ましい。R1~R3の炭素数1~4のアルコキシ基が有してもよい置換基としてはアルキル基、アルコキシ基が挙げられるが、好ましくはアルキル基である。 Further, the number of carbon atoms of the alkoxy group of R 1 to R 3 is not particularly limited as long as it is within the range of 1 to 4, but from the viewpoint of increasing the taper angle, it is preferably 3 or less, more preferably 2 or less. The alkyl group portion of the alkoxy group may be linear or cyclic. Specific examples of the alkoxy group include, for example, a methoxy group, an ethoxy group, a propoxy group, an isopropyloxy group and a butoxy group, and among them, a methoxy group and an ethoxy group are preferable. Examples of the substituent which the alkoxy group having 1 to 4 carbon atoms represented by R 1 to R 3 may have include an alkyl group and an alkoxy group, and an alkyl group is preferable.
 また、R1~R3のハロゲン原子とは、例えば、塩素原子、ヨウ素原子、臭素原子、フッ素原子が挙げられ、中でも合成容易性の観点から、塩素原子又はフッ素原子が好ましく、塩素原子がより好ましい。
 これらの中でも、感度や合成容易性の観点から、R1~R3は各々独立にハロゲン原子であることが好ましく、塩素原子であることがより好ましい。
The halogen atom represented by R 1 to R 3 includes, for example, a chlorine atom, an iodine atom, a bromine atom, and a fluorine atom. Among them, a chlorine atom or a fluorine atom is preferable, and a chlorine atom is more preferable, from the viewpoint of easy synthesis. preferable.
Among these, from the viewpoint of sensitivity and ease of synthesis, R 1 to R 3 are preferably each independently a halogen atom, and more preferably a chlorine atom.
 m、n及びlは、各々独立に0~5の整数を表すが、合成容易性の観点から、m、n及びlの少なくとも2つが1以上の整数であることが好ましく、m、n及びlのうちいずれか2つが1であり、かつ、残りの1つが0であることがより好ましい。 m, n and l each independently represent an integer of 0 to 5, but from the viewpoint of ease of synthesis, at least two of m, n and l are preferably integers of 1 or more, and m, n and l It is more preferable that any two of them are 1 and the other one is 0.
 一般式(1-1)及び/又は一般式(1-2)で表されるヘキサアリールビイミダゾール化合物としては、例えば、2,2’-ビス(o-クロロフェニル)-4,5,4’,5’-テトラフェニルビイミダゾール、2,2’-ビス(o-メチルフェニル)-4,5,4’,5’-テトラフェニルビイミダゾール、2,2’-ビス(o-クロロフェニル)-4,4’,5,5’-テトラ(o,p-ジクロロフェニル)ビイミダゾール、2,2’-ビス(o,p-ジクロロフェニル)-4,4’,5,5’-テトラ(o,p-ジクロロフェニル)ビイミダゾール、2,2’-ビス(o-クロロフェニル)-4,4’,5,5’-テトラ(p-フルオロフェニル)ビイミダゾール、2,2’-ビス(o-クロロフェニル)-4,4’,5,5’-テトラ(o,p-ジブロモフェニル)ビイミダゾール、2,2’-ビス(o-ブロモフェニル)-4,4’,5,5’-テトラ(o,p-ジクロロフェニル)ビイミダゾール、2,2’-ビス(o-クロロフェニル)-4,4’,5,5’-テトラ(p-クロロナフチル)ビイミダゾール等が挙げられる。中でも、ヘキサフェニルビイミダゾール化合物が好ましく、そのイミダゾール環上の2,2’-位に結合したベンゼン環のo-位がメチル基、メトキシ基、又はハロゲン原子で置換されたものがさらに好ましく、そのイミダゾール環上の4,4’,5,5’-位に結合したベンゼン環が無置換、又は、ハロゲン原子若しくはメトキシ基で置換されたもの等が好ましい。 Examples of the hexaarylbiimidazole compound represented by the general formula (1-1) and/or the general formula (1-2) include 2,2′-bis(o-chlorophenyl)-4,5,4′, 5'-tetraphenylbiimidazole, 2,2'-bis(o-methylphenyl)-4,5,4',5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorophenyl)-4, 4',5,5'-tetra(o,p-dichlorophenyl)biimidazole, 2,2'-bis(o,p-dichlorophenyl)-4,4',5,5'-tetra(o,p-dichlorophenyl) ) Biimidazole, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetra(p-fluorophenyl)biimidazole, 2,2'-bis(o-chlorophenyl)-4, 4',5,5'-tetra(o,p-dibromophenyl)biimidazole, 2,2'-bis(o-bromophenyl)-4,4',5,5'-tetra(o,p-dichlorophenyl) ) Biimidazole, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetra(p-chloronaphthyl)biimidazole and the like. Among them, a hexaphenylbiimidazole compound is preferable, and a compound in which the o-position of the benzene ring bonded to the 2,2′-position on the imidazole ring is substituted with a methyl group, a methoxy group, or a halogen atom is more preferable. It is preferable that the benzene ring bonded to the 4,4',5,5'-position on the imidazole ring is unsubstituted or substituted with a halogen atom or a methoxy group.
 (c)光重合開始剤として、一般式(1-1)で表されるヘキサアリールビイミダゾール化合物と一般式(1-2)で表されるヘキサアリールビイミダゾール化合物のいずれかを用いてもよく、両者を併用してもよい。併用する場合には、その比率については特に限定されない。 As the photopolymerization initiator (c), either a hexaarylbiimidazole compound represented by the general formula (1-1) or a hexaarylbiimidazole compound represented by the general formula (1-2) may be used. , And both may be used together. When used in combination, the ratio is not particularly limited.
 またチタノセン誘導体類としては、ジシクロペンタジエニルチタニウムジクロリド、ジシクロペンタジエニルチタニウムビスフェニル、ジシクロペンタジエニルチタニウムビス(2,3,4,5,6-ペンタフルオロフェニル)、ジシクロペンタジエニルチタニウムビス(2,3,5,6-テトラフルオロフェニル)、ジシクロペンタジエニルチタニウムビス(2,4,6-トリフルオロフェニル)、ジシクロペンタジエニルチタニウムジ(2,6-ジフルオロフェニル)、ジシクロペンタジエニルチタニウムジ(2,4-ジフルオロフェニル)、ジ(メチルシクロペンタジエニル)チタニウムビス(2,3,4,5,6-ペンタフルオロフェニル)、ジ(メチルシクロペンタジエニル)チタニウムビス(2,6-ジフルオロフェニル)、ジシクロペンタジエニルチタニウム〔2,6-ジフルオロ-3-(ピロール-1-イル)フェニル〕等が挙げられる。 Examples of titanocene derivatives include dicyclopentadienyl titanium dichloride, dicyclopentadienyl titanium bisphenyl, dicyclopentadienyl titanium bis(2,3,4,5,6-pentafluorophenyl), and dicyclopentadiene. Dienyl titanium bis(2,3,5,6-tetrafluorophenyl), dicyclopentadienyl titanium bis(2,4,6-trifluorophenyl), dicyclopentadienyl titanium di(2,6-difluoro) Phenyl), dicyclopentadienyl titanium di(2,4-difluorophenyl), di(methylcyclopentadienyl) titanium bis(2,3,4,5,6-pentafluorophenyl), di(methylcyclopenta) Examples thereof include dienyl)titanium bis(2,6-difluorophenyl) and dicyclopentadienyltitanium [2,6-difluoro-3-(pyrrol-1-yl)phenyl].
 また、ハロメチル化オキサジアゾール誘導体類としては、2-トリクロロメチル-5-(2’-ベンゾフリル)-1,3,4-オキサジアゾール、2-トリクロロメチル-5-〔β-(2’-ベンゾフリル)ビニル〕-1,3,4-オキサジアゾール、2-トリクロロメチル-5-〔β-(2’-(6’’-ベンゾフリル)ビニル)〕-1,3,4-オキサジアゾール、2-トリクロロメチル-5-フリル-1,3,4-オキサジアゾール等が挙げられる。 The halomethylated oxadiazole derivatives include 2-trichloromethyl-5-(2'-benzofuryl)-1,3,4-oxadiazole and 2-trichloromethyl-5-[β-(2'- Benzofuryl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2′-(6″-benzofuryl)vinyl)]-1,3,4-oxadiazole, 2-trichloromethyl-5-furyl-1,3,4-oxadiazole and the like can be mentioned.
 また、ハロメチル-s-トリアジン誘導体類としては、2-(4-メトキシフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4-メトキシナフチル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4-エトキシナフチル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4-エトキシカルボニルナフチル)-4,6-ビス(トリクロロメチル)-s-トリアジン等が挙げられる。 Further, halomethyl-s-triazine derivatives include 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine and 2-(4-methoxynaphthyl)-4,6-bis( Trichloromethyl)-s-triazine, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl) -S-triazine and the like can be mentioned.
 また、α-アミノアルキルフェノン誘導体類としては、2-メチル-1-〔4-(メチルチオ)フェニル〕-2-モルフォリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)ブタン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)ブタン-1-オン、4-ジメチルアミノエチルベンゾエ-ト、4-ジメチルアミノイソアミルベンゾエ-ト、4-ジエチルアミノアセトフェノン、4-ジメチルアミノプロピオフェノン、2-エチルヘキシル-1,4-ジメチルアミノベンゾエート、2,5-ビス(4-ジエチルアミノベンザル)シクロヘキサノン、7-ジエチルアミノ-3-(4-ジエチルアミノベンゾイル)クマリン、4-(ジエチルアミノ)カルコン等が挙げられる。 Further, examples of α-aminoalkylphenone derivatives include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one and 2-benzyl-2-dimethylamino-1-(4 -Morpholinophenyl)butan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 4-dimethylaminoethylbenzoate, 4-dimethylaminoisoamyl Benzoate, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, 2-ethylhexyl-1,4-dimethylaminobenzoate, 2,5-bis(4-diethylaminobenzal)cyclohexanone, 7-diethylamino-3- Examples include (4-diethylaminobenzoyl)coumarin and 4-(diethylamino)chalcone.
 オキシムエステル系化合物としては、例えば、下記一般式(IV)で表される化合物が挙げられる。 Examples of the oxime ester compound include compounds represented by the following general formula (IV).
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
 上記式(IV)中、R21aは、水素原子、置換基を有していてもよいアルキル基、又は、置換基を有していてもよい芳香族環基を示す。
 R21bは芳香環を含む任意の置換基を示す。
 R22aは、置換基を有していてもよいアルカノイル基、又は、置換基を有していてもよいアリーロイル基を示す。
 nは0又は1の整数を示す。
In the above formula (IV), R 21a represents a hydrogen atom, an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent.
R 21b represents an arbitrary substituent containing an aromatic ring.
R 22a represents an alkanoyl group which may have a substituent or an aryloyl group which may have a substituent.
n represents an integer of 0 or 1.
 R21aにおけるアルキル基の炭素数は特に限定されないが、溶媒への溶解性や感度の観点から、通常1以上、好ましくは2以上、また、通常20以下、好ましくは15以下、より好ましくは10以下である。例えば、1~20が好ましく、1~15がより好ましく、1~10がさらに好ましく、2~10がよりさらに好ましい。アルキル基の具体例としては、メチル基、エチル基、プロピル基、シクロペンチルエチル基、プロピル基等が挙げられる。
 アルキル基が有していてもよい置換基としては、芳香族環基、水酸基、カルボキシル基、ハロゲン原子、アミノ基、アミド基、4-(2-メトキシ-1-メチル)エトキシ-2-メチルフェニル基又はN-アセチル-N-アセトキシアミノ基などが挙げられ、合成容易性の観点からは、無置換であることが好ましい。
The carbon number of the alkyl group in R 21a is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 20 or less, preferably 15 or less, more preferably 10 or less from the viewpoint of solubility in a solvent and sensitivity. Is. For example, 1 to 20 is preferable, 1 to 15 is more preferable, 1 to 10 is further preferable, and 2 to 10 is even more preferable. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a cyclopentylethyl group, a propyl group and the like.
The substituent which the alkyl group may have is an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, 4-(2-methoxy-1-methyl)ethoxy-2-methylphenyl. Group or N-acetyl-N-acetoxyamino group, and the like, and is preferably unsubstituted from the viewpoint of ease of synthesis.
 R21aにおける芳香族環基としては、芳香族炭化水素環基及び芳香族複素環基が挙げられる。芳香族環基の炭素数は特に限定されないが、感光性着色組成物への溶解性の観点から5以上が好ましい。また、現像性の観点から30以下が好ましく、20以下がより好ましく、12以下がさらに好ましい。例えば、5~30が好ましく、5~20がより好ましく、5~12がさらに好ましい。 Examples of the aromatic ring group for R 21a include an aromatic hydrocarbon ring group and an aromatic heterocyclic group. The carbon number of the aromatic ring group is not particularly limited, but is preferably 5 or more from the viewpoint of solubility in the photosensitive coloring composition. Further, from the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, still more preferably 12 or less. For example, 5 to 30 is preferable, 5 to 20 is more preferable, and 5 to 12 is further preferable.
 芳香族環基の具体例としては、フェニル基、ナフチル基、ピリジル基、フリル基などが挙げられ、これらの中でも現像性の観点から、フェニル基又はナフチル基が好ましく、フェニル基がより好ましい。
 芳香族環基が有していてもよい置換基としては、水酸基、カルボキシル基、ハロゲン原子、アミノ基、アミド基、アルキル基、アルコキシ基、これらの置換基が連結した基などが挙げられ、現像性の観点からアルキル基、アルコキシ基、これらを連結した基が好ましく、連結したアルコキシ基がより好ましい。
 これらの中でも、現像性の観点から、R21aが置換基を有していてもよい芳香族環基であることが好ましく、連結したアルコキシ基を置換基に有する芳香族環基であることがさらに好ましい。
Specific examples of the aromatic ring group include a phenyl group, a naphthyl group, a pyridyl group, a furyl group and the like. Among these, from the viewpoint of developability, a phenyl group or a naphthyl group is preferable, and a phenyl group is more preferable.
Examples of the substituent that the aromatic ring group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, an alkyl group, an alkoxy group, a group in which these substituents are linked, and the like. From the viewpoint of properties, an alkyl group, an alkoxy group, and a group in which these are linked are preferable, and a linked alkoxy group is more preferable.
Among these, from the viewpoint of developability, R 21a is preferably an aromatic ring group which may have a substituent, and more preferably an aromatic ring group having a linked alkoxy group as a substituent. preferable.
 また、R21bとしては、好ましくは置換されていてもよいカルバゾリル基、置換されていてもよいチオキサントニル基又は置換されていてもよいジフェニルスルフィド基が挙げられる。これらの中でも、感度の観点から、置換されていてもよいカルバゾリル基が好ましい。 Further, R 21b is preferably an optionally substituted carbazolyl group, an optionally substituted thioxanthonyl group or an optionally substituted diphenyl sulfide group. Among these, an optionally substituted carbazolyl group is preferable from the viewpoint of sensitivity.
 また、R22aにおけるアルカノイル基の炭素数は特に限定されないが、溶媒への溶解性や感度の観点から、通常2以上、好ましくは3以上、また、通常20以下、好ましくは15以下、より好ましくは10以下、さらに好ましくは5以下である。例えば、2~20が好ましく、2~15がより好ましく、2~10がさらに好ましく、2~5がよりさらに好ましく、3~5が特に好ましい。アルカノイル基の具体例としては、アセチル基、プロパノイル基、ブタノイル基等が挙げられる。
 アルカノイル基が有していてもよい置換基としては、芳香族環基、水酸基、カルボキシル基、ハロゲン原子、アミノ基、アミド基などが挙げられ、合成容易性の観点からは、無置換であることが好ましい。
The carbon number of the alkanoyl group in R 22a is not particularly limited, but is usually 2 or more, preferably 3 or more, and usually 20 or less, preferably 15 or less, more preferably from the viewpoint of solubility in a solvent and sensitivity. It is 10 or less, more preferably 5 or less. For example, 2 to 20 is preferable, 2 to 15 is more preferable, 2 to 10 is further preferable, 2 to 5 is further preferable, and 3 to 5 is particularly preferable. Specific examples of the alkanoyl group include an acetyl group, a propanoyl group and a butanoyl group.
Examples of the substituent which the alkanoyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group and an amide group, and from the viewpoint of ease of synthesis, it is unsubstituted. Is preferred.
 また、R22aにおけるアリーロイル基の炭素数は特に限定されないが、溶媒への溶解性や感度の観点から、通常7以上、好ましくは8以上、また、通常20以下、好ましくは15以下、より好ましくは12以下、さらに好ましくは10以下である。例えば、7~20が好ましく、7~15がより好ましく、7~12がさらに好ましく、8~12がよりさらに好ましい。アリーロイル基の具体例としては、ベンゾイル基、ナフトイル基等が挙げられる。
 アリーロイル基が有していてもよい置換基としては、水酸基、カルボキシル基、ハロゲン原子、アミノ基、アミド基、アルキル基などが挙げられ、合成容易性の観点からは、無置換であることが好ましい。
 これらの中でも、感度の観点から、R22aが置換基を有していてもよいアルカノイル基であることが好ましく、無置換のアルカノイル基であることがより好ましく、アセチル基であることがさらに好ましい。
The carbon number of the aryloyl group in R 22a is not particularly limited, but is usually 7 or more, preferably 8 or more, and usually 20 or less, preferably 15 or less, more preferably from the viewpoint of solubility in a solvent and sensitivity. It is 12 or less, more preferably 10 or less. For example, 7 to 20 is preferable, 7 to 15 is more preferable, 7 to 12 is further preferable, and 8 to 12 is even more preferable. Specific examples of the aryloyl group include a benzoyl group and a naphthoyl group.
Examples of the substituent that the aryloyl group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, and an alkyl group, and from the viewpoint of ease of synthesis, it is preferably unsubstituted. ..
Among these, from the viewpoint of sensitivity, R 22a is preferably an alkanoyl group which may have a substituent, more preferably an unsubstituted alkanoyl group, and further preferably an acetyl group.
 また日本国特開2016-133574号公報に記載される開始剤も、着色剤による液晶層の汚染が低減されるという点からも好適も用いられる。 In addition, the initiator described in Japanese Patent Laid-Open No. 2016-133574 is also preferably used from the viewpoint that the contamination of the liquid crystal layer by the colorant is reduced.
 光重合開始剤は、1種類を単独で用いても、2種類以上を組み合わせて使用してもよい。
 光重合開始剤には、必要に応じて、感応感度を高める目的で、画像露光光源の波長に応じた増感色素、重合促進剤を配合させることができる。増感色素としては、日本国特開平4-221958号公報、日本国特開平4-219756号公報に記載のキサンテン色素、日本国特開平3-239703号公報、日本国特開平5-289335号公報に記載の複素環を有するクマリン色素、日本国特開平3-239703号公報、日本国特開平5-289335号公報に記載の3-ケトクマリン化合物、日本国特開平6-19240号公報に記載のピロメテン色素、その他、日本国特開昭47-2528号公報、日本国特開昭54-155292号公報、日本国特公昭45-37377号公報、日本国特開昭48-84183号公報、日本国特開昭52-112681号公報、日本国特開昭58-15503号公報、日本国特開昭60-88005号公報、日本国特開昭59-56403号公報、日本国特開平2-69号公報、日本国特開昭57-168088号公報、日本国特開平5-107761号公報、日本国特開平5-210240号公報、日本国特開平4-288818号公報に記載のジアルキルアミノベンゼン骨格を有する色素等を挙げることができる。
The photopolymerization initiator may be used alone or in combination of two or more kinds.
If necessary, the photopolymerization initiator may be blended with a sensitizing dye or a polymerization accelerator depending on the wavelength of the image exposure light source for the purpose of increasing the sensitivity. Examples of the sensitizing dyes include xanthene dyes described in JP-A-4-221958 and JP-A-4-219756, JP-A-3-239703, and JP-A-5-289335. Coumarin dyes having a heterocycle described in JP-A-3-239703, 3-ketocoumarin compounds described in JP-A-5-289335, and pyrromethene described in JP-A-6-19240. Dyes, etc., JP-A-47-2528, JP-A-54-155292, JP-B-45-37377, JP-A-48-84183, and JP-A- Japanese Unexamined Patent Publication No. 52-112681, Japanese Unexamined Patent Publication No. 58-15503, Japanese Unexamined Patent Publication No. 60-88005, Japanese Unexamined Patent Publication No. 59-56403, Japanese Unexamined Patent Publication No. 2-69. And a dialkylaminobenzene skeleton described in Japanese Patent Application Laid-Open No. 57-168088, Japanese Patent Application Laid-Open No. 5-107761, Japanese Patent Application Laid-Open No. 5-210240, and Japanese Patent Application Laid-Open No. 4-288818. Examples thereof include dyes.
 これらの増感色素のうち好ましいものは、アミノ基含有増感色素であり、さらに好ましいものは、アミノ基及びフェニル基を同一分子内に有する化合物である。特に、好ましいのは、例えば、4,4’-ジメチルアミノベンゾフェノン、4,4’-ジエチルアミノベンゾフェノン、2-アミノベンゾフェノン、4-アミノベンゾフェノン、4,4’-ジアミノベンゾフェノン、3,3’-ジアミノベンゾフェノン、3,4-ジアミノベンゾフェノン等のベンゾフェノン系化合物;2-(p-ジメチルアミノフェニル)ベンゾオキサゾール、2-(p-ジエチルアミノフェニル)ベンゾオキサゾール、2-(p-ジメチルアミノフェニル)ベンゾ[4,5]ベンゾオキサゾール、2-(p-ジメチルアミノフェニル)ベンゾ[6,7]ベンゾオキサゾール、2,5-ビス(p-ジエチルアミノフェニル)-1,3,4-オキサゾール、2-(p-ジメチルアミノフェニル)ベンゾチアゾール、2-(p-ジエチルアミノフェニル)ベンゾチアゾール、2-(p-ジメチルアミノフェニル)ベンズイミダゾール、2-(p-ジエチルアミノフェニル)ベンズイミダゾール、2,5-ビス(p-ジエチルアミノフェニル)-1,3,4-チアジアゾール、(p-ジメチルアミノフェニル)ピリジン、(p-ジエチルアミノフェニル)ピリジン、(p-ジメチルアミノフェニル)キノリン、(p-ジエチルアミノフェニル)キノリン、(p-ジメチルアミノフェニル)ピリミジン、(p-ジエチルアミノフェニル)ピリミジン等のp-ジアルキルアミノフェニル基含有化合物等である。このうち最も好ましいものは、4,4’-ジアルキルアミノベンゾフェノンである。
 増感色素もまた1種を単独で用いてもよく、2種以上を併用してもよい。
Among these sensitizing dyes, preferred are sensitizing dyes containing an amino group, and more preferred are compounds having an amino group and a phenyl group in the same molecule. Particularly preferred are, for example, 4,4′-dimethylaminobenzophenone, 4,4′-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobenzophenone, 4,4′-diaminobenzophenone, 3,3′-diaminobenzophenone. Benzophenone compounds such as 3,4-diaminobenzophenone; 2-(p-dimethylaminophenyl)benzoxazole, 2-(p-diethylaminophenyl)benzoxazole, 2-(p-dimethylaminophenyl)benzo[4,5 ] Benzoxazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzoxazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-oxazole, 2-(p-dimethylaminophenyl) ) Benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2-(p-diethylaminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)- 1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (p-diethylaminophenyl)pyridine, (p-dimethylaminophenyl)quinoline, (p-diethylaminophenyl)quinoline, (p-dimethylaminophenyl)pyrimidine , P-dialkylaminophenyl group-containing compounds such as (p-diethylaminophenyl)pyrimidine and the like. The most preferred of these is 4,4′-dialkylaminobenzophenone.
The sensitizing dyes may be used alone or in combination of two or more.
 重合促進剤としては、例えば、p-ジメチルアミノ安息香酸エチル、安息香酸2-ジメチルアミノエチル等の芳香族アミン、n-ブチルアミン、N-メチルジエタノールアミン等の脂肪族アミン、後述するメルカプト化合物等が用いられる。重合促進剤は、1種類を単独で用いても、2種以上を組み合わせて使用してもよい。 Examples of the polymerization accelerator include aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate, aliphatic amines such as n-butylamine and N-methyldiethanolamine, and mercapto compounds described below. To be The polymerization accelerators may be used alone or in combination of two or more.
<(d)エチレン性不飽和化合物>
 本発明の感光性着色組成物は、(d)エチレン性不飽和化合物を含む。(d)エチレン性不飽和化合物を含むことで、感度が向上する。
 本発明に用いられるエチレン性不飽和化合物は、分子内にエチレン性不飽和基を少なくとも1個有する化合物である。具体的には、例えば(メタ)アクリル酸、(メタ)アクリル酸アルキルエステル、アクリロニトリル、スチレン、及びエチレン性不飽和結合を1個有するカルボン酸と、多価又は1価アルコールのモノエステル、等が挙げられる。
<(d) Ethylenically unsaturated compound>
The photosensitive coloring composition of the present invention contains (d) an ethylenically unsaturated compound. (D) The sensitivity is improved by containing the ethylenically unsaturated compound.
The ethylenically unsaturated compound used in the present invention is a compound having at least one ethylenically unsaturated group in the molecule. Specifically, for example, (meth)acrylic acid, (meth)acrylic acid alkyl ester, acrylonitrile, styrene, and a carboxylic acid having one ethylenically unsaturated bond, and a monoester of polyhydric or monohydric alcohol, etc. Can be mentioned.
 本発明においては、特に、1分子中にエチレン性不飽和基を2個以上有する多官能エチレン性単量体を使用することが望ましい。多官能エチレン性単量体が有するエチレン性不飽和基の数は特に限定されないが、通常2個以上であり、好ましくは4個以上であり、より好ましくは5個以上であり、また、好ましくは8個以下であり、より好ましくは7個以下である。例えば、2~8個が好ましく、4~8個がより好ましく、4~7個がさらに好ましく、5~7個がよりさらに好ましい。前記下限値以上とすることで高感度となる傾向があり、前記上限値以下とすることで溶媒への溶解性が向上する傾向がある。
 多官能エチレン性単量体の例としては、例えば脂肪族ポリヒドロキシ化合物と不飽和カルボン酸とのエステル;芳香族ポリヒドロキシ化合物と不飽和カルボン酸とのエステル;脂肪族ポリヒドロキシ化合物、芳香族ポリヒドロキシ化合物等の多価ヒドロキシ化合物と、不飽和カルボン酸及び多塩基性カルボン酸とのエステル化反応により得られるエステルなどが挙げられる。
In the present invention, it is particularly preferable to use a polyfunctional ethylenic monomer having two or more ethylenically unsaturated groups in one molecule. The number of ethylenically unsaturated groups contained in the polyfunctional ethylenic monomer is not particularly limited, but is usually 2 or more, preferably 4 or more, more preferably 5 or more, and preferably It is 8 or less, more preferably 7 or less. For example, 2 to 8 are preferred, 4 to 8 are more preferred, 4 to 7 are still more preferred, and 5 to 7 are even more preferred. When it is at least the lower limit value, the sensitivity tends to be high, and when it is at most the upper limit value, the solubility in a solvent tends to be improved.
Examples of the polyfunctional ethylenic monomer include, for example, an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid; an ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid; an aliphatic polyhydroxy compound, an aromatic polyhydroxy compound. Examples thereof include esters obtained by the esterification reaction of a polyvalent hydroxy compound such as a hydroxy compound with an unsaturated carboxylic acid and a polybasic carboxylic acid.
 前記脂肪族ポリヒドロキシ化合物と不飽和カルボン酸とのエステルとしては、エチレングリコールジアクリレート、トリエチレングリコールジアクリレート、トリメチロールプロパントリアクリレート、トリメチロールエタントリアクリレート、ペンタエリスリトールジアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールテトラアクリレート、ジペンタエリスリトールペンタアクリレート、ジペンタエリスリトールヘキサアクリレート、グリセロールアクリレート等の脂肪族ポリヒドロキシ化合物のアクリル酸エステル、これら例示化合物のアクリレートをメタクリレートに代えたメタクリル酸エステル、同様にイタコネートに代えたイタコン酸エステル、クロネートに代えたクロトン酸エステルもしくはマレエートに代えたマレイン酸エステル等が挙げられる。 As the ester of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid, ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, Acrylic acid esters of aliphatic polyhydroxy compounds such as pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate and glycerol acrylate, and methacrylic acid esters obtained by replacing the acrylates of these exemplified compounds with methacrylates. Similarly, itaconic acid ester replaced with itaconate, crotonic acid ester replaced with clonate, maleic acid ester replaced with maleate, and the like can be mentioned.
 芳香族ポリヒドロキシ化合物と不飽和カルボン酸とのエステルとしては、ハイドロキノンジアクリレート、ハイドロキノンジメタクリレート、レゾルシンジアクリレート、レゾルシンジメタクリレート、ピロガロールトリアクリレート等の芳香族ポリヒドロキシ化合物のアクリル酸エステル及びメタクリル酸エステル等が挙げられる。 Examples of the ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid include an acrylic ester and a methacrylic ester of an aromatic polyhydroxy compound such as hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate, and pyrogallol triacrylate. Etc.
 多塩基性カルボン酸及び不飽和カルボン酸と、多価ヒドロキシ化合物のエステル化反応により得られるエステルとしては必ずしも単一物ではないが、代表的な具体例を挙げれば、アクリル酸、フタル酸、及びエチレングリコールの縮合物、アクリル酸、マレイン酸、及びジエチレングリコールの縮合物、メタクリル酸、テレフタル酸及びペンタエリスリトールの縮合物、アクリル酸、アジピン酸、ブタンジオール及びグリセリンの縮合物等が挙げられる。 The ester obtained by the esterification reaction of a polybasic carboxylic acid and an unsaturated carboxylic acid, and a polyvalent hydroxy compound is not necessarily a single substance, but typical representative examples include acrylic acid, phthalic acid, and Examples thereof include condensates of ethylene glycol, acrylic acid, maleic acid, and condensates of diethylene glycol, condensates of methacrylic acid, terephthalic acid and pentaerythritol, condensates of acrylic acid, adipic acid, butanediol and glycerin.
 その他、本発明に用いられる多官能エチレン性単量体の例としては、ポリイソシアネート化合物と水酸基含有(メタ)アクリル酸エステル又はポリイソシアネート化合物とポリオール及び水酸基含有(メタ)アクリル酸エステルを反応させて得られるようなウレタン(メタ)アクリレート類;多価エポキシ化合物とヒドロキシ(メタ)アクリレート又は(メタ)アクリル酸との付加反応物のようなエポキシアクリレート類;エチレンビスアクリルアミド等のアクリルアミド類;フタル酸ジアリル等のアリルエステル類;ジビニルフタレート等のビニル基含有化合物等が有用である。 Other examples of the polyfunctional ethylenic monomer used in the present invention include reacting a polyisocyanate compound with a hydroxyl group-containing (meth)acrylic acid ester or a polyisocyanate compound with a polyol and a hydroxyl group-containing (meth)acrylic acid ester. Urethane (meth)acrylates obtained; epoxy acrylates such as addition reaction products of polyvalent epoxy compounds with hydroxy (meth)acrylate or (meth)acrylic acid; acrylamides such as ethylenebisacrylamide; diallyl phthalate Allyl esters such as; vinyl group-containing compounds such as divinyl phthalate are useful.
 上記ウレタン(メタ)アクリレート類としては、例えば、DPHA-40H、UX-5000、UX-5002D-P20、UX-5003D、UX-5005(日本化薬社製)、U-2PPA、U-6LPA、U-10PA、U-33H、UA-53H、UA-32P、UA-1100H(新中村化学工業社製)、UA-306H、UA-510H、UF-8001G(共栄社化学社製)、UV-1700B、UV-7600B、UV-7605B、UV-7630B、UV7640B(日本合成化学工業社製)等が挙げられる。 Examples of the urethane (meth)acrylates include DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, U-6LPA, U. -10PA, U-33H, UA-53H, UA-32P, UA-1100H (manufactured by Shin-Nakamura Chemical Co., Ltd.), UA-306H, UA-510H, UF-8001G (manufactured by Kyoeisha Chemical Co., Ltd.), UV-1700B, UV -7600B, UV-7605B, UV-7630B, UV7640B (manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) and the like.
 これらの中でも、硬化性の観点から(d)エチレン性不飽和化合物として、(メタ)アクリル酸アルキルエステルを用いることが好ましく、ジペンタエリスリトールヘキサアクリレートを用いることがより好ましい。
 これらは1種を単独で用いてもよく、2種以上を併用してもよい。
Among these, from the viewpoint of curability, it is preferable to use (meth)acrylic acid alkyl ester as the (d) ethylenically unsaturated compound, and it is more preferable to use dipentaerythritol hexaacrylate.
These may be used alone or in combination of two or more.
<(e)溶剤>
 本発明の感光性着色組成物は、(e)溶剤を含んでいてもよい。(e)溶剤を含むことで、顔料を溶剤中に分散でき、また、塗布が容易となる傾向がある。
 本発明の感光性着色組成物は、通常、(a)着色剤、(b)アルカリ可溶性樹脂、(c)光重合開始剤、及び(d)エチレン性不飽和化合物、並びに必要に応じて使用されるその他の配合成分が、溶剤に溶解又は分散した状態で使用される。溶剤の中でも、分散性や塗布性の観点から有機溶剤が好ましい。
<(e) Solvent>
The photosensitive coloring composition of the present invention may contain (e) a solvent. (E) By including the solvent, the pigment can be dispersed in the solvent and the coating tends to be easy.
The photosensitive coloring composition of the present invention is usually used (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, and (d) an ethylenically unsaturated compound, and if necessary. Other compounding ingredients are used in a state of being dissolved or dispersed in a solvent. Among the solvents, organic solvents are preferable from the viewpoint of dispersibility and coatability.
 有機溶剤の中でも、塗布性の観点から沸点が100~300℃の範囲にある有機溶剤が好ましく、沸点が120~280℃の範囲にある有機溶剤がより好ましい。なお、ここでいう沸点は、圧力1013.25hPaにおける沸点を意味し、以下沸点に関してはすべて同様である。 Among the organic solvents, an organic solvent having a boiling point in the range of 100 to 300° C. is preferable, and an organic solvent having a boiling point in the range of 120 to 280° C. is more preferable from the viewpoint of coatability. The boiling point mentioned here means the boiling point at a pressure of 1013.25 hPa, and the same applies to the following boiling points.
 このような有機溶剤としては、例えば、次のようなものが挙げられる。
 エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノ-n-ブチルエーテル、プロピレングリコール-t-ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノ-n-ブチルエーテル、メトキシメチルペンタノール、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノメチルエーテル、3-メトキシブタノール、3-メチル-3-メトキシブタノール、トリエチレングリコールモノメチルエーテル、トリエチレングリコールモノエチルエーテル、トリプロピレングリコールメチルエーテルのようなグリコールモノアルキルエーテル類;
 エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテル、ジプロピレングリコールジメチルエーテルのようなグリコールジアルキルエーテル類;
Examples of such an organic solvent include the following.
Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol-t-butyl ether, diethylene glycol monomethyl ether Ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethyl pentanol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoxybutanol, 3-methyl-3-methoxybutanol, triethylene glycol monomethyl Glycol monoalkyl ethers such as ether, triethylene glycol monoethyl ether, tripropylene glycol methyl ether;
Glycol dialkyl ethers such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, dipropylene glycol dimethyl ether;
 エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、エチレングリコールモノ-n-ブチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート、プロピレングリコールモノブチルエーテルアセテート、メトキシブチルアセテート、3-メトキシブチルアセテート、メトキシペンチルアセテート、ジエチレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノ-n-ブチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、トリエチレングリコールモノメチルエーテルアセテート、トリエチレングリコールモノエチルエーテルアセテート、3-メチル-3-メトキシブチルアセテートのようなグリコールアルキルエーテルアセテート類;
 エチレングリコールジアセテート、1,3-ブチレングリコールジアセテート、1,6-ヘキサノールジアセテートなどのグリコールジアセテート類;
 シクロヘキサノールアセテートなどのアルキルアセテート類;
 アミルエーテル、ジエチルエーテル、ジプロピルエーテル、ジイソプロピルエーテル、ジブチルエーテル、ジアミルエーテル、エチルイソブチルエーテル、ジヘキシルエーテルのようなエーテル類;
Ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, methoxybutyl Acetate, 3-methoxybutyl acetate, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl acetate Glycol alkyl ether acetates such as ether acetate and 3-methyl-3-methoxybutyl acetate;
Glycol diacetates such as ethylene glycol diacetate, 1,3-butylene glycol diacetate and 1,6-hexanol diacetate;
Alkyl acetates such as cyclohexanol acetate;
Ethers such as amyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, diamyl ether, ethyl isobutyl ether, dihexyl ether;
 アセトン、メチルエチルケトン、メチルアミルケトン、メチルイソプロピルケトン、メチルイソアミルケトン、ジイソプロピルケトン、ジイソブチルケトン、メチルイソブチルケトン、シクロヘキサノン、エチルアミルケトン、メチルブチルケトン、メチルヘキシルケトン、メチルノニルケトン、メトキシメチルペンタノンのようなケトン類;
 エタノール、プロパノール、ブタノール、ヘキサノール、シクロヘキサノール、エチレングリコール、プロピレングリコール、ブタンジオール、ジエチレングリコール、ジプロピレングリコール、トリエチレングリコール、メトキシメチルペンタノール、グリセリン、ベンジルアルコールのような1価又は多価アルコール類;
 n-ペンタン、n-オクタン、ジイソブチレン、n-ヘキサン、ヘキセン、イソプレン、ジペンテン、ドデカンのような脂肪族炭化水素類;
 シクロヘキサン、メチルシクロヘキサン、メチルシクロヘキセン、ビシクロヘキシルのような脂環式炭化水素類;
Like acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone, methoxymethyl pentanone Ketones;
Monohydric or polyhydric alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butanediol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerin, benzyl alcohol;
Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-hexane, hexene, isoprene, dipentene, dodecane;
Alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, bicyclohexyl;
 ベンゼン、トルエン、キシレン、クメンのような芳香族炭化水素類;
 アミルホルメート、エチルホルメート、酢酸エチル、酢酸ブチル、酢酸プロピル、酢酸アミル、メチルイソブチレート、エチレングリコールアセテート、エチルプロピオネート、プロピルプロピオネート、酪酸ブチル、酪酸イソブチル、イソ酪酸メチル、エチルカプリレート、ブチルステアレート、エチルベンゾエート、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、γ-ブチロラクトンのような鎖状又は環状エステル類;
 3-メトキシプロピオン酸、3-エトキシプロピオン酸のようなアルコキシカルボン酸類;
 ブチルクロリド、アミルクロリドのようなハロゲン化炭化水素類;
 メトキシメチルペンタノンのようなエーテルケトン類;
 アセトニトリル、ベンゾニトリルのようなニトリル類等。
Aromatic hydrocarbons such as benzene, toluene, xylene, cumene;
Amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl Caprylate, butyl stearate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, 3-methoxypropionic acid Chain or cyclic esters such as butyl and γ-butyrolactone;
Alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid;
Halogenated hydrocarbons such as butyl chloride, amyl chloride;
Ether ketones such as methoxymethylpentanone;
Nitriles such as acetonitrile and benzonitrile.
 上記に該当する市販の有機溶剤としては、ミネラルスピリット、バルソル#2、アプコ#18ソルベント、アプコシンナー、ソーカルソルベントNo.1及びNo.2、ソルベッソ#150、シェルTS28 ソルベント、カルビトール、エチルカルビトール、ブチルカルビトール、メチルセロソルブ(「セロソルブ」は登録商標。以下同じ。)、エチルセロソルブ、エチルセロソルブアセテート、メチルセロソルブアセテート、ジグライム(いずれも商品名)などが挙げられる。
 これらの有機溶剤は、単独で用いてもよく、2種以上を併用してもよい。
Commercially available organic solvents corresponding to the above include mineral spirits, balsol #2, Apco #18 solvent, Apco thinner, socal solvent No. 1 and No. 1 2, Solvesso #150, Shell TS28 solvent, carbitol, ethyl carbitol, butyl carbitol, methyl cellosolve (“cellosolve” is a registered trademark; the same applies hereinafter), ethyl cellosolve, ethyl cellosolve acetate, methyl cellosolve acetate, diglyme (any of them). Product name) etc.
These organic solvents may be used alone or in combination of two or more.
 フォトリソグラフィー法にて着色スペーサーを形成する場合、有機溶剤としては沸点が100~200℃の範囲にある有機溶剤が好ましく、120~170℃の範囲にある有機溶剤がより好ましい。 When the colored spacer is formed by the photolithography method, the organic solvent is preferably an organic solvent having a boiling point of 100 to 200°C, more preferably 120 to 170°C.
 上記有機溶剤のうち、塗布性、表面張力などのバランスが良く、組成物中の構成成分の溶解度が比較的高い点からは、グリコールアルキルエーテルアセテート類が好ましい。
 また、グリコールアルキルエーテルアセテート類は、単独で使用してもよいが、他の有機溶剤を併用してもよい。併用する有機溶剤として、特に好ましいのはグリコールモノアルキルエーテル類である。中でも、特に組成物中の構成成分の溶解性からプロピレングリコールモノメチルエーテルが好ましい。なお、グリコールモノアルキルエーテル類は極性が高く、添加量が多すぎると顔料が凝集しやすく、後に得られる感光性着色組成物の粘度が上がっていくなどの保存安定性が低下する傾向があるので、溶剤中のグリコールモノアルキルエーテル類の割合は5質量%~30質量%が好ましく、5質量%~20質量%がより好ましい。
Among the above organic solvents, glycol alkyl ether acetates are preferable because they have a good balance of coating properties, surface tension and the like, and have relatively high solubility of the constituent components in the composition.
The glycol alkyl ether acetates may be used alone or in combination with other organic solvents. As the organic solvent used in combination, glycol monoalkyl ethers are particularly preferable. Of these, propylene glycol monomethyl ether is particularly preferred because of the solubility of the constituents in the composition. Incidentally, glycol monoalkyl ethers have high polarity, and if the addition amount is too large, the pigment tends to aggregate, and the storage stability such as the viscosity of the photosensitive coloring composition obtained later tends to decrease. The proportion of glycol monoalkyl ethers in the solvent is preferably 5% by mass to 30% by mass, more preferably 5% by mass to 20% by mass.
 また、150℃以上の沸点をもつ有機溶剤(以下「高沸点溶剤」と称す場合がある。)を併用することも好ましい。このような高沸点溶剤を併用することにより、感光性着色組成物は乾きにくくなるが、組成物中における顔料の均一な分散状態が、急激な乾燥により破壊されることを防止する効果がある。すなわち、例えばスリットノズル先端における、着色剤などの析出・固化による異物欠陥の発生を防止する効果がある。このような効果が高い点から、上述の各種溶剤の中でも、特にジエチレングリコールモノ-n-ブチルエーテル、ジエチレングリコールモノ-n-ブチルエーテルアセテート、及びジエチレングリコールモノエチルエーテルアセテートが好ましい。 Also, it is preferable to use an organic solvent having a boiling point of 150° C. or higher (hereinafter sometimes referred to as “high boiling point solvent”) together. By using such a high-boiling-point solvent in combination, it becomes difficult for the photosensitive coloring composition to dry, but it is effective in preventing the uniformly dispersed state of the pigment in the composition from being destroyed by rapid drying. That is, for example, there is an effect of preventing the generation of foreign matter defects at the tip of the slit nozzle due to the precipitation and solidification of the colorant or the like. Among the above-mentioned various solvents, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-butyl ether acetate, and diethylene glycol monoethyl ether acetate are particularly preferable because of the high effect.
 有機溶剤中の高沸点溶剤の含有割合は、3質量%~50質量%が好ましく、5質量%~40質量%がより好ましく、5質量%~30質量%が特に好ましい。前記下限値以上とすることで、例えばスリットノズル先端で着色剤などが析出・固化して異物欠陥を惹き起こすのを抑制できる傾向があり、また前記上限値以下とすることで組成物の乾燥温度が遅くなるのを抑制し、減圧乾燥プロセスのタクト不良や、プリベークのピン跡といった問題を抑制できる傾向がある。 The content ratio of the high boiling point solvent in the organic solvent is preferably 3% by mass to 50% by mass, more preferably 5% by mass to 40% by mass, and particularly preferably 5% by mass to 30% by mass. By setting the lower limit value or more, for example, there is a tendency that it is possible to prevent the colorant or the like from depositing and solidifying at the tip of the slit nozzle to cause foreign matter defects, and by setting the upper limit value or less, the drying temperature of the composition. It tends to be able to suppress the delay of the cycle time, and to suppress problems such as tact failure in the vacuum drying process and pin marks of prebaking.
 なお、沸点150℃以上の高沸点溶剤が、グリコールアルキルエーテルアセテート類であってもよく、またグリコールアルキルエーテル類であってもよく、この場合は、沸点150℃以上の高沸点溶剤を別途含有させなくてもかまわない。
 好ましい高沸点溶剤として、例えば前述の各種溶剤の中ではジエチレングリコールモノ-n-ブチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジプロピレングリコールメチルエーテルアセテート、1,3-ブチレングリコールジアセテート、1,6-ヘキサノールジアセテート、トリアセチンなどが挙げられる。
The high-boiling point solvent having a boiling point of 150° C. or higher may be glycol alkyl ether acetates or glycol alkyl ethers. In this case, a high-boiling point solvent having a boiling point of 150° C. or higher may be contained separately. It doesn't matter.
Preferred high boiling point solvents include, for example, among the above-mentioned various solvents, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,6-hexanol diacetate. Examples thereof include acetate and triacetin.
<(f)分散剤>
 本発明の感光性着色組成物においては、(a)着色剤を微細に分散させてその分散状態を安定化させる目的で(f)分散剤を含んでいてもよい。
 (f)分散剤としては、官能基を有する高分子分散剤が好ましく、さらに、分散安定性の面からカルボキシル基;リン酸基;スルホン酸基;又はこれらの塩基;一級、二級又は三級アミノ基;四級アンモニウム塩基;ピリジン、ピリミジン、ピラジン等の含窒素ヘテロ環由来の基、等の官能基を有する高分子分散剤が好ましい。中でも特に、一級、二級又は三級アミノ基;四級アンモニウム塩基;ピリジン、ピリミジン、ピラジン等の含窒素ヘテロ環由来の基、等の塩基性官能基を有する高分子分散剤が顔料を分散する際に少量の分散剤で分散することができるとの観点から特に好ましい。
<(f) Dispersant>
The photosensitive coloring composition of the present invention may contain (f) a dispersant for the purpose of finely dispersing (a) the colorant and stabilizing the dispersed state.
As the dispersant (f), a polymer dispersant having a functional group is preferable, and from the viewpoint of dispersion stability, a carboxyl group; a phosphoric acid group; a sulfonic acid group; or their bases; primary, secondary or tertiary. A polymer dispersant having a functional group such as an amino group; a quaternary ammonium salt group; a group derived from a nitrogen-containing heterocycle such as pyridine, pyrimidine, or pyrazine is preferable. Among them, a polymeric dispersant having a basic functional group such as a primary, secondary, or tertiary amino group; a quaternary ammonium salt group; a group derived from a nitrogen-containing heterocycle such as pyridine, pyrimidine, or pyrazine disperses the pigment. At this time, it is particularly preferable from the viewpoint that it can be dispersed with a small amount of a dispersant.
 また、高分子分散剤としては、例えばウレタン系分散剤、アクリル系分散剤、ポリエチレンイミン系分散剤、ポリアリルアミン系分散剤、アミノ基を持つモノマーとマクロモノマーからなる分散剤、ポリオキシエチレンアルキルエーテル系分散剤、ポリオキシエチレンジエステル系分散剤、ポリエーテルリン酸系分散剤、ポリエステルリン酸系分散剤、ソルビタン脂肪族エステル系分散剤、脂肪族変性ポリエステル系分散剤等を挙げることができる。 As the polymer dispersant, for example, a urethane dispersant, an acrylic dispersant, a polyethyleneimine dispersant, a polyallylamine dispersant, a dispersant comprising a monomer having an amino group and a macromonomer, polyoxyethylene alkyl ether. Examples thereof include a system dispersant, a polyoxyethylene diester dispersant, a polyether phosphoric acid dispersant, a polyester phosphoric acid dispersant, a sorbitan aliphatic ester dispersant, and an aliphatic modified polyester dispersant.
 このような分散剤の具体例としては、商品名で、EFKA(登録商標。BASF社製。)、DISPERBYK(登録商標。ビックケミー社製。)、ディスパロン(登録商標。楠本化成社製。)、SOLSPERSE(登録商標。ルーブリゾール社製。)、KP(信越化学工業社製)、ポリフロー(共栄社化学社製)、アジスパー(登録商標。味の素社製。)等を挙げることができる。
 これらの高分子分散剤は1種を単独で使用してもよく、又は2種以上を併用してもよい。
Specific examples of such dispersants include EFKA (registered trademark; manufactured by BASF Corporation), DISPERBYK (registered trademark, manufactured by Big Chemie), DISPARON (registered trademark, manufactured by Kusumoto Kasei Co., Ltd.), and SOLSPERSE under trade names. (Registered trademark; manufactured by Lubrizol Co., Ltd.), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), Azisper (registered trademark, manufactured by Ajinomoto Co., Inc.) and the like.
These polymer dispersants may be used alone or in combination of two or more.
 高分子分散剤の重量平均分子量(Mw)は通常700以上、好ましくは1000以上であり、また通常100000以下、好ましくは50000以下である。例えば、700~100000が好ましく、700~50000がより好ましく、1000~50000がさらに好ましい。
 これらのうち、顔料の分散性の観点から、(f)分散剤は官能基を有するウレタン系高分子分散剤及び/又はアクリル系高分子分散剤を含むことが好ましく、アクリル系高分子分散剤を含むことが特に好ましい。
 また分散性、保存性の面から、塩基性官能基を有し、ポリエステル結合及び/又はポリエーテル結合を有する高分子分散剤が好ましい。
The weight average molecular weight (Mw) of the polymer dispersant is usually 700 or more, preferably 1000 or more, and usually 100,000 or less, preferably 50,000 or less. For example, 700 to 100,000 is preferable, 700 to 50,000 is more preferable, and 1,000 to 50,000 is further preferable.
Among these, from the viewpoint of the dispersibility of the pigment, the (f) dispersant preferably contains a urethane polymer dispersant and/or an acrylic polymer dispersant having a functional group. It is particularly preferable to include.
From the viewpoint of dispersibility and storability, a polymer dispersant having a basic functional group and a polyester bond and/or a polyether bond is preferable.
 ウレタン系及びアクリル系高分子分散剤としては、例えばDISPERBYK160~166、182シリーズ(いずれもウレタン系)、DISPERBYK2000、2001、BYK-LPN21116等(いずれもアクリル系)(以上すべてビックケミー社製)が挙げられる。
 ウレタン系高分子分散剤として好ましい化学構造を具体的に例示するならば、例えば、ポリイソシアネート化合物と、分子内に水酸基を1個又は2個有する数平均分子量300~10000の化合物と、同一分子内に活性水素と3級アミノ基を有する化合物とを反応させることによって得られる、重量平均分子量1000~200000の分散樹脂等が挙げられる。これらをベンジルクロリド等の四級化剤で処理することで、3級アミノ基の全部又は一部を4級アンモニウム塩基にすることができる。
Examples of the urethane-based and acrylic-based polymer dispersants include DISPERBYK160 to 166, 182 series (all are urethane-based), DISPERBYK2000, 2001, BYK-LPN21116 and the like (all are acrylic-based) (all of which are manufactured by Big Chemie). ..
To specifically exemplify a preferable chemical structure as the urethane polymer dispersant, for example, a polyisocyanate compound, a compound having one or two hydroxyl groups in the molecule and a number average molecular weight of 300 to 10,000, and the same molecule Examples thereof include a dispersion resin having a weight average molecular weight of 1,000 to 200,000 obtained by reacting active hydrogen with a compound having a tertiary amino group. By treating these with a quaternizing agent such as benzyl chloride, all or part of the tertiary amino group can be converted to a quaternary ammonium base.
 上記のポリイソシアネート化合物の例としては、パラフェニレンジイソシアネート、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、4,4’-ジフェニルメタンジイソシアネート、ナフタレン-1,5-ジイソシアネート、トリジンジイソシアネート等の芳香族ジイソシアネート、ヘキサメチレンジイソシアネート、リジンメチルエステルジイソシアネート、2,4,4-トリメチルヘキサメチレンジイソシアネート、ダイマー酸ジイソシアネート等の脂肪族ジイソシアネート、イソホロンジイソシアネート、4,4’-メチレンビス(シクロヘキシルイソシアネート)、ω,ω’-ジイソシアネートジメチルシクロヘキサン等の脂環族ジイソシアネート、キシリレンジイソシアネート、α,α,α’,α’-テトラメチルキシリレンジイソシアネート等の芳香環を有する脂肪族ジイソシアネート、リジンエステルトリイソシアネート、1,6,11-ウンデカントリイソシアネート、1,8-ジイソシアネート-4-イソシアネートメチルオクタン、1,3,6-ヘキサメチレントリイソシアネート、ビシクロヘプタントリイソシアネート、トリス(イソシアネートフェニルメタン)、トリス(イソシアネートフェニル)チオホスフェート等のトリイソシアネート、及びこれらの三量体、水付加物、及びこれらのポリオール付加物等が挙げられる。ポリイソシアネートとして好ましいのは有機ジイソシアネートの三量体で、最も好ましいのはトリレンジイソシアネートの三量体とイソホロンジイソシアネートの三量体である。これらは1種を単独で用いてもよく、2種以上を併用してもよい。 Examples of the above polyisocyanate compound include paraphenylene diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 4,4′-diphenylmethane diisocyanate, naphthalene-1,5-diisocyanate and tolidine diisocyanate. Aromatic diisocyanates, hexamethylene diisocyanates, lysine methyl ester diisocyanates, 2,4,4-trimethylhexamethylene diisocyanates, aliphatic diisocyanates such as dimer acid diisocyanates, isophorone diisocyanates, 4,4′-methylenebis(cyclohexyl isocyanate), ω,ω Aliphatic diisocyanates such as'-diisocyanate dimethylcyclohexane, xylylene diisocyanate, α,α,α',α'-tetramethyl xylylene diisocyanate, etc., aliphatic diisocyanates having aromatic rings, lysine ester triisocyanate, 1,6, 11-undecane triisocyanate, 1,8-diisocyanate-4-isocyanatomethyl octane, 1,3,6-hexamethylene triisocyanate, bicycloheptane triisocyanate, tris(isocyanatophenylmethane), tris(isocyanatophenyl)thiophosphate, etc. Examples thereof include triisocyanates, trimers thereof, water adducts, and polyol adducts thereof. Preferred as the polyisocyanate are trimers of organic diisocyanates, and most preferred are trimers of tolylene diisocyanate and trimers of isophorone diisocyanate. These may be used alone or in combination of two or more.
 イソシアネートの三量体の製造方法としては、前記ポリイソシアネート類を適当な三量化触媒、例えば第3級アミン類、ホスフィン類、アルコキシド類、金属酸化物、カルボン酸塩類等を用いてイソシアネート基の部分的な三量化を行い、触媒毒の添加により三量化を停止させた後、未反応のポリイソシアネートを溶剤抽出、薄膜蒸留により除去して目的のイソシアヌレート基含有ポリイソシアネートを得る方法が挙げられる。 As a method for producing a trimer of isocyanate, the above-mentioned polyisocyanates are prepared by using a suitable trimerization catalyst such as tertiary amines, phosphines, alkoxides, metal oxides, carboxylates, etc. A method in which the desired isocyanurate group-containing polyisocyanate is obtained by removing unreacted polyisocyanate by solvent extraction and thin-film distillation after stopping the trimerization by adding a catalyst poison, is carried out.
 同一分子内に水酸基を1個又は2個有する数平均分子量300~10000の化合物としては、ポリエーテルグリコール、ポリエステルグリコール、ポリカーボネートグリコール、ポリオレフィングリコール等、及びこれらの化合物の片末端水酸基が炭素数1~25のアルキル基でアルコキシ化されたもの及びこれら2種類以上の混合物が挙げられる。
 ポリエーテルグリコールとしては、ポリエーテルジオール、ポリエーテルエステルジオール、及びこれら2種類以上の混合物が挙げられる。ポリエーテルジオールとしては、アルキレンオキシドを単独又は共重合させて得られるもの、例えばポリエチレングリコール、ポリプロピレングリコール、ポリエチレン-プロピレングリコール、ポリオキシテトラメチレングリコール、ポリオキシヘキサメチレングリコール、ポリオキシオクタメチレングリコール及びそれらの2種以上の混合物が挙げられる。
As the compound having one or two hydroxyl groups in the same molecule and having a number average molecular weight of 300 to 10,000, polyether glycol, polyester glycol, polycarbonate glycol, polyolefin glycol and the like, and one terminal hydroxyl group of these compounds has a carbon number of 1 to 10 Examples thereof include those alkoxylated with 25 alkyl groups and mixtures of two or more of these.
Examples of polyether glycols include polyether diols, polyether ester diols, and mixtures of two or more thereof. As the polyether diol, those obtained by homopolymerizing or copolymerizing alkylene oxide, for example, polyethylene glycol, polypropylene glycol, polyethylene-propylene glycol, polyoxytetramethylene glycol, polyoxyhexamethylene glycol, polyoxyoctamethylene glycol and those And a mixture of two or more thereof.
 ポリエーテルエステルジオールとしては、エーテル基含有ジオールもしくは他のグリコールとの混合物をジカルボン酸又はそれらの無水物と反応させるか、又はポリエステルグリコールにアルキレンオキシドを反応させることによって得られるもの、例えばポリ(ポリオキシテトラメチレン)アジペート等が挙げられる。ポリエーテルグリコールとして最も好ましいのはポリエチレングリコール、ポリプロピレングリコール、ポリオキシテトラメチレングリコール又はこれらの化合物の片末端水酸基が炭素数1~25のアルキル基でアルコキシ化された化合物である。 Examples of the polyether ester diol include those obtained by reacting a mixture with an ether group-containing diol or another glycol with a dicarboxylic acid or an anhydride thereof, or by reacting a polyester glycol with an alkylene oxide, for example, a poly(polyether Oxytetramethylene) adipate and the like. The most preferable polyether glycol is polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol, or a compound in which one end hydroxyl group of these compounds is alkoxylated with an alkyl group having 1 to 25 carbon atoms.
 ポリエステルグリコールとしては、ジカルボン酸(コハク酸、グルタル酸、アジピン酸、セバシン酸、フマル酸、マレイン酸、フタル酸等)又はそれらの無水物とグリコール(エチレングリコール、ジエチレングリコール、トリエチレングリコール、プロピレングリコール、ジプロピレングリコール、トリプロピレングリコール、1,2-ブタンジオール、1,3-ブタンジオール、1,4-ブタンジオール、2,3-ブタンジオール、3-メチル-1,5-ペンタンジオール、ネオペンチルグリコール、2-メチル-1,3-プロパンジオール、2-メチル-2-プロピル-1,3-プロパンジオール、2-ブチル-2-エチル-1,3-プロパンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオール、2-メチル-2,4-ペンタンジオール、2,2,4-トリメチル-1,3-ペンタンジオール、2-エチル-1,3-ヘキサンジオール、2,5-ジメチル-2,5-ヘキサンジオール、1,8-オクタメチレングリコール、2-メチル-1,8-オクタメチレングリコール、1,9-ノナンジオール等の脂肪族グリコール、ビスヒドロキシメチルシクロヘキサン等の脂環族グリコール、キシリレングリコール、ビスヒドロキシエトキシベンゼン等の芳香族グリコール、N-メチルジエタノールアミン等のN-アルキルジアルカノールアミン等)とを重縮合させて得られたもの、例えばポリエチレンアジペート、ポリブチレンアジペート、ポリヘキサメチレンアジペート、ポリエチレン/プロピレンアジペート等、又は前記ジオール類又は炭素数1~25の1価アルコールを開始剤として用いて得られるポリラクトンジオール又はポリラクトンモノオール、例えばポリカプロラクトングリコール、ポリメチルバレロラクトン及びこれらの2種以上の混合物が挙げられる。ポリエステルグリコールとして最も好ましいのはポリカプロラクトングリコール又は炭素数1~25のアルコールを開始剤としたポリカプロラクトンである。 As the polyester glycol, dicarboxylic acids (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, phthalic acid, etc.) or their anhydrides and glycols (ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, Dipropylene glycol, tripropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 3-methyl-1,5-pentanediol, neopentyl glycol , 2-methyl-1,3-propanediol, 2-methyl-2-propyl-1,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,5-pentanediol, 1 ,6-hexanediol, 2-methyl-2,4-pentanediol, 2,2,4-trimethyl-1,3-pentanediol, 2-ethyl-1,3-hexanediol, 2,5-dimethyl-2 Aliphatic glycols such as 1,5-hexanediol, 1,8-octamethylene glycol, 2-methyl-1,8-octamethylene glycol and 1,9-nonanediol, alicyclic glycols such as bishydroxymethylcyclohexane, xylyl Polyglycene adipate, polybutylene adipate, polyhexamethylene adipate obtained by polycondensation of ren glycol, aromatic glycols such as bishydroxyethoxybenzene, N-alkyl dialkanol amines such as N-methyldiethanolamine, etc. , Polyethylene/propylene adipate, or the like, or polylactone diols or polylactone monools obtained by using the above diols or monohydric alcohols having 1 to 25 carbon atoms as an initiator, for example, polycaprolactone glycol, polymethylvalerolactone and the like. Mixtures of two or more may be mentioned. The most preferable polyester glycol is polycaprolactone glycol or polycaprolactone having an alcohol having 1 to 25 carbon atoms as an initiator.
 ポリカーボネートグリコールとしては、ポリ(1,6-ヘキシレン)カーボネート、ポリ(3-メチル-1,5-ペンチレン)カーボネート等、ポリオレフィングリコールとしてはポリブタジエングリコール、水素添加型ポリブタジエングリコール、水素添加型ポリイソプレングリコール等が挙げられる。
 これらは1種を単独で用いてもよく、2種以上を併用してもよい。
Polycarbonate glycols include poly(1,6-hexylene)carbonate and poly(3-methyl-1,5-pentylene)carbonate. Polyolefin glycols include polybutadiene glycol, hydrogenated polybutadiene glycol and hydrogenated polyisoprene glycol. Are listed.
These may be used alone or in combination of two or more.
 同一分子内に水酸基を1個又は2個有する化合物の数平均分子量は、通常300~10000、好ましくは500~6000、さらに好ましくは1000~4000である。 The number average molecular weight of the compound having one or two hydroxyl groups in the same molecule is usually 300 to 10000, preferably 500 to 6000, and more preferably 1000 to 4000.
 本発明に用いられる同一分子内に活性水素と3級アミノ基を有する化合物を説明する。
 活性水素、即ち、酸素原子、窒素原子又は硫黄原子に直接結合している水素原子としては、水酸基、アミノ基、チオール基等の官能基中の水素原子が挙げられ、中でもアミノ基、特に1級のアミノ基の水素原子が好ましい。
The compound having active hydrogen and a tertiary amino group in the same molecule used in the present invention will be described.
Examples of active hydrogen, that is, a hydrogen atom directly bonded to an oxygen atom, a nitrogen atom or a sulfur atom, include a hydrogen atom in a functional group such as a hydroxyl group, an amino group and a thiol group, and among them, an amino group, particularly a primary group. The hydrogen atom of the amino group of is preferred.
 3級アミノ基は、特に限定されないが、例えば炭素数1~4のアルキル基を有するアミノ基、又はヘテロ環構造、より具体的にはイミダゾール環又はトリアゾール環、などが挙げられる。
 このような同一分子内に活性水素と3級アミノ基を有する化合物を例示するならば、N,N-ジメチル-1,3-プロパンジアミン、N,N-ジエチル-1,3-プロパンジアミン、N,N-ジプロピル-1,3-プロパンジアミン、N,N-ジブチル-1,3-プロパンジアミン、N,N-ジメチルエチレンジアミン、N,N-ジエチルエチレンジアミン、N,N-ジプロピルエチレンジアミン、N,N-ジブチルエチレンジアミン、N,N-ジメチル-1,4-ブタンジアミン、N,N-ジエチル-1,4-ブタンジアミン、N,N-ジプロピル-1,4-ブタンジアミン、N,N-ジブチル-1,4-ブタンジアミン等が挙げられる。
The tertiary amino group is not particularly limited, and examples thereof include an amino group having an alkyl group having 1 to 4 carbon atoms, or a heterocyclic structure, more specifically, an imidazole ring or a triazole ring.
Examples of such compounds having active hydrogen and a tertiary amino group in the same molecule include N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3-propanediamine, N , N-dipropyl-1,3-propanediamine, N,N-dibutyl-1,3-propanediamine, N,N-dimethylethylenediamine, N,N-diethylethylenediamine, N,N-dipropylethylenediamine, N,N -Dibutylethylenediamine, N,N-dimethyl-1,4-butanediamine, N,N-diethyl-1,4-butanediamine, N,N-dipropyl-1,4-butanediamine, N,N-dibutyl-1 , 4-butanediamine and the like.
 また、3級アミノ基が含窒素ヘテロ環構造である場合の該含窒素ヘテロ環としては、ピラゾール環、イミダゾール環、トリアゾール環、テトラゾール環、インドール環、カルバゾール環、インダゾール環、ベンズイミダゾール環、ベンゾトリアゾール環、ベンゾオキサゾール環、ベンゾチアゾール環、ベンゾチアジアゾール環等の含窒素ヘテロ5員環、ピリジン環、ピリダジン環、ピリミジン環、トリアジン環、キノリン環、アクリジン環、イソキノリン環等の含窒素ヘテロ6員環が挙げられる。これらの含窒素ヘテロ環のうち好ましいものはイミダゾール環又はトリアゾール環である。 When the tertiary amino group has a nitrogen-containing heterocyclic structure, examples of the nitrogen-containing heterocycle include a pyrazole ring, an imidazole ring, a triazole ring, a tetrazole ring, an indole ring, a carbazole ring, an indazole ring, a benzimidazole ring and benzo. 5-membered nitrogen-containing hetero ring such as triazole ring, benzoxazole ring, benzothiazole ring and benzothiadiazole ring, 6-membered nitrogen-containing hetero ring such as pyridine ring, pyridazine ring, pyrimidine ring, triazine ring, quinoline ring, acridine ring and isoquinoline ring A ring is included. Preferred among these nitrogen-containing heterocycles are imidazole rings and triazole rings.
 これらのイミダゾール環とアミノ基を有する化合物を具体的に例示するならば、1-(3-アミノプロピル)イミダゾール、ヒスチジン、2-アミノイミダゾール、1-(2-アミノエチル)イミダゾール等が挙げられる。また、トリアゾール環とアミノ基を有する化合物を具体的に例示するならば、3-アミノ-1,2,4-トリアゾール、5-(2-アミノ-5-クロロフェニル)-3-フェニル-1H-1,2,4-トリアゾール、4-アミノ-4H-1,2,4-トリアゾール-3,5-ジオール、3-アミノ-5-フェニル-1H-1,3,4-トリアゾール、5-アミノ-1,4-ジフェニル-1,2,3-トリアゾール、3-アミノ-1-ベンジル-1H-2,4-トリアゾール等が挙げられる。中でも、N,N-ジメチル-1,3-プロパンジアミン、N,N-ジエチル-1,3-プロパンジアミン、1-(3-アミノプロピル)イミダゾール、3-アミノ-1,2,4-トリアゾールが好ましい。
 これらは1種を単独で用いてもよく、2種以上を併用してもよい。
Specific examples of these compounds having an imidazole ring and an amino group include 1-(3-aminopropyl)imidazole, histidine, 2-aminoimidazole, 1-(2-aminoethyl)imidazole and the like. Specific examples of the compound having a triazole ring and an amino group include 3-amino-1,2,4-triazole and 5-(2-amino-5-chlorophenyl)-3-phenyl-1H-1. ,2,4-triazole, 4-amino-4H-1,2,4-triazole-3,5-diol, 3-amino-5-phenyl-1H-1,3,4-triazole, 5-amino-1 , 4-diphenyl-1,2,3-triazole, 3-amino-1-benzyl-1H-2,4-triazole and the like. Among them, N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3-propanediamine, 1-(3-aminopropyl)imidazole and 3-amino-1,2,4-triazole are preferable.
These may be used alone or in combination of two or more.
 ウレタン系高分子分散剤を製造する際の原料の好ましい配合比率はポリイソシアネート化合物100質量部に対し、同一分子内に水酸基を1個又は2個有する数平均分子量300~10000の化合物が10~200質量部、好ましくは20~190質量部、さらに好ましくは30~180質量部、同一分子内に活性水素と3級アミノ基を有する化合物が0.2~25質量部、好ましくは0.3~24質量部である。 A preferable mixing ratio of raw materials for producing the urethane-based polymer dispersant is 10-200 with respect to 100 parts by mass of the polyisocyanate compound, a compound having one or two hydroxyl groups in the same molecule and having a number average molecular weight of 300 to 10,000. Parts by mass, preferably 20 to 190 parts by mass, more preferably 30 to 180 parts by mass, 0.2 to 25 parts by mass, preferably 0.3 to 24 parts by mass of a compound having active hydrogen and a tertiary amino group in the same molecule. It is a mass part.
 ウレタン系高分子分散剤の製造はポリウレタン樹脂製造の公知の方法に従って行われる。製造する際の溶媒としては、通常、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロペンタノン、シクロヘキサノン、イソホロン等のケトン類、酢酸エチル、酢酸ブチル、酢酸セロソルブ等のエステル類、ベンゼン、トルエン、キシレン、ヘキサン等の炭化水素類、ダイアセトンアルコール、イソプロパノール、第二ブタノール、第三ブタノール等一部のアルコール類、塩化メチレン、クロロホルム等の塩化物、テトラヒドロフラン、ジエチルエーテル等のエーテル類、ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキサイド等の非プロトン性極性溶媒等が用いられる。これらは1種を単独で用いてもよく、2種以上を併用してもよい。 The production of the urethane-based polymer dispersant is performed according to a known method for producing a polyurethane resin. As the solvent during the production, usually, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, ketones such as isophorone, ethyl acetate, butyl acetate, esters such as cellosolve acetate, benzene, toluene, xylene, hexane. Hydrocarbons such as diacetone alcohol, some alcohols such as diacetone alcohol, isopropanol, secondary butanol and tertiary butanol, chlorides such as methylene chloride and chloroform, ethers such as tetrahydrofuran and diethyl ether, dimethylformamide, N-methyl An aprotic polar solvent such as pyrrolidone or dimethyl sulfoxide is used. These may be used alone or in combination of two or more.
 上記製造に際して、通常、ウレタン化反応触媒が用いられる。この触媒としては、例えば、ジブチルチンジラウレート、ジオクチルチンジラウレート、ジブチルチンジオクトエート、スタナスオクトエート等の錫系、鉄アセチルアセトナート、塩化第二鉄等の鉄系、トリエチルアミン、トリエチレンジアミン等の3級アミン系等が挙げられる。これらは1種を単独で用いてもよく、2種以上を併用して用いてもよい。 -Urethanization reaction catalyst is usually used in the above production. Examples of the catalyst include tin-based compounds such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin dioctoate and stannas octoate; iron-based compounds such as iron acetylacetonate and ferric chloride; and triethylamine and triethylenediamine. Examples include primary amines. These may be used alone or in combination of two or more.
 同一分子内に活性水素と3級アミノ基を有する化合物の導入量は反応後のアミン価で1~100mgKOH/gの範囲に制御することが好ましい。より好ましくは5~95mgKOH/gの範囲である。アミン価は、塩基性アミノ基を酸により中和滴定し、酸価に対応させてKOHのmg数で表した値である。前記下限値以上とすることで分散能力が良好となる傾向があり、また、前記上限値以下とすることで現像性の低下が抑制しやすい傾向がある。 The amount of the compound having active hydrogen and a tertiary amino group introduced in the same molecule is preferably controlled within the range of 1 to 100 mgKOH/g based on the amine value after the reaction. More preferably, it is in the range of 5 to 95 mgKOH/g. The amine value is a value obtained by neutralizing and titrating a basic amino group with an acid and expressing it in mg of KOH corresponding to the acid value. When it is at least the above lower limit, the dispersibility tends to be good, and when it is at most the above upper limit, deterioration of the developability tends to be easily suppressed.
 なお、以上の反応で高分子分散剤にイソシアネート基が残存する場合にはさらに、アルコールやアミノ化合物でイソシアネート基を他の官能基に変換すると生成物の経時安定性が高くなるので好ましい。
 ウレタン系高分子分散剤の重量平均分子量(Mw)は通常1000~200000、好ましくは2000~100000、より好ましくは3000~50000である。前記下限値以上とすることで分散性及び分散安定性が良好となる傾向があり、前記上限値以下とすることで溶解性や分散性の低下を抑制しやすい傾向がある。
When the isocyanate group remains in the polymer dispersant by the above reaction, it is preferable to further convert the isocyanate group into another functional group with an alcohol or an amino compound because the stability of the product with time increases.
The weight average molecular weight (Mw) of the urethane polymer dispersant is usually 1,000 to 200,000, preferably 2,000 to 100,000, and more preferably 3,000 to 50,000. When it is at least the above lower limit, dispersibility and dispersion stability will tend to be good, and when it is at most the above upper limit, deterioration of solubility and dispersibility will tend to be suppressed.
 アクリル系高分子分散剤としては、官能基(ここでいう官能基とは、高分子分散剤に含有される官能基として前述した官能基である。)を有する不飽和基含有単量体と、官能基を有さない不飽和基含有単量体とのランダム共重合体、グラフト共重合体、ブロック共重合体を使用することが好ましい。これらの共重合体は公知の方法で製造することができる。 As the acrylic polymer dispersant, an unsaturated group-containing monomer having a functional group (the functional group here is the functional group described above as the functional group contained in the polymer dispersant), It is preferable to use a random copolymer, a graft copolymer, or a block copolymer with an unsaturated group-containing monomer having no functional group. These copolymers can be produced by a known method.
 官能基を有する不飽和基含有単量体としては、(メタ)アクリル酸、2-(メタ)アクリロイロキシエチルコハク酸、2-(メタ)アクリロイロキシエチルフタル酸、2-(メタ)アクリロイロキシエチルヘキサヒドロフタル酸、アクリル酸ダイマー等のカルボキシル基を有する不飽和単量体、ジメチルアミノエチル(メタ)アクリレート、ジエチルアミノエチル(メタ)アクリレート及びこれらの4級化物などの3級アミノ基、4級アンモニウム塩基を有する不飽和単量体が具体例として挙げられる。これらは1種を単独で用いてもよく、2種以上を併用してもよい。 Examples of the unsaturated group-containing monomer having a functional group include (meth)acrylic acid, 2-(meth)acryloyloxyethylsuccinic acid, 2-(meth)acryloyloxyethylphthalic acid, and 2-(meth)acryloyl Unsaturated monomers having a carboxyl group such as loyloxyethyl hexahydrophthalic acid and acrylic acid dimer, dimethylaminoethyl (meth)acrylate, diethylaminoethyl (meth)acrylate and tertiary amino groups such as quaternary compounds thereof, Specific examples include unsaturated monomers having a quaternary ammonium salt group. These may be used alone or in combination of two or more.
 官能基を有さない不飽和基含有単量体としては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、t-ブチル(メタ)アクリレート、ベンジル(メタ)アクリレート、フェニル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、フェノキシメチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート、トリシクロデカン(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、N-ビニルピロリドン、スチレン及びその誘導体、α-メチルスチレン、N-シクロヘキシルマレイミド、N-フェニルマレイミド、N-ベンジルマレイミドなどのN-置換マレイミド、アクリロニトリル、酢酸ビニル及びポリメチル(メタ)アクリレートマクロモノマー、ポリスチレンマクロモノマー、ポリ2-ヒドロキシエチル(メタ)アクリレートマクロモノマー、ポリエチレングリコールマクロモノマー、ポリプロピレングリコールマクロモノマー、ポリカプロラクトンマクロモノマーなどのマクロモノマー等が挙げられる。これらは1種を単独で用いてもよく、2種以上を併用してもよい。 Examples of the unsaturated group-containing monomer having no functional group include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl ( (Meth)acrylate, t-butyl(meth)acrylate, benzyl(meth)acrylate, phenyl(meth)acrylate, cyclohexyl(meth)acrylate, phenoxyethyl(meth)acrylate, phenoxymethyl(meth)acrylate, 2-ethylhexyl(meth) Acrylate, isobornyl (meth)acrylate, tricyclodecane (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, N-vinylpyrrolidone, styrene and its derivatives, α-methylstyrene, N-cyclohexylmaleimide, N-phenylmaleimide, N -N-substituted maleimides such as benzyl maleimide, acrylonitrile, vinyl acetate and polymethyl (meth)acrylate macromonomers, polystyrene macromonomers, poly-2-hydroxyethyl (meth)acrylate macromonomers, polyethylene glycol macromonomers, polypropylene glycol macromonomers, poly Examples thereof include macromonomers such as caprolactone macromonomers. These may be used alone or in combination of two or more.
 アクリル系高分子分散剤は、特に好ましくは、官能基を有するAブロックと官能基を有さないBブロックからなるA-B又はB-A-Bブロック共重合体であるが、この場合、Aブロック中には上記官能基を含む不飽和基含有単量体由来の部分構造の他に、上記官能基を含まない不飽和基含有単量体由来の部分構造が含まれていてもよく、これらが該Aブロック中においてランダム共重合又はブロック共重合のいずれの態様で含有されていてもよい。また、官能基を含まない部分構造の、Aブロック中の含有割合は、通常80質量%以下であり、好ましくは50質量%以下、さらに好ましくは30質量%以下である。 The acrylic polymer dispersant is particularly preferably an AB or BABB block copolymer consisting of an A block having a functional group and a B block having no functional group. In this case, A In the block, in addition to the partial structure derived from the unsaturated group-containing monomer containing the functional group, a partial structure derived from the unsaturated group-containing monomer containing no functional group may be contained. May be contained in the A block in any form of random copolymerization or block copolymerization. The content of the partial structure containing no functional group in the A block is usually 80% by mass or less, preferably 50% by mass or less, and more preferably 30% by mass or less.
 Bブロックは、上記官能基を含まない不飽和基含有単量体由来の部分構造からなるものであるが、1つのBブロック中に2種以上の単量体由来の部分構造が含有されていてもよく、これらは、該Bブロック中においてランダム共重合又はブロック共重合のいずれの態様で含有されていてもよい。
 該A-B又はB-A-Bブロック共重合体は、例えば、以下に示すリビング重合法にて調製される。
 リビング重合法には、アニオンリビング重合法、カチオンリビング重合法、ラジカルリビング重合法があり、このうち、アニオンリビング重合法は、重合活性種がアニオンであり、例えば下記スキームで表される。
The B block is composed of a partial structure derived from an unsaturated group-containing monomer which does not contain the above functional group, but one B block contains partial structures derived from two or more kinds of monomers. Alternatively, these may be contained in the B block in any mode of random copolymerization or block copolymerization.
The AB or BAB block copolymer is prepared, for example, by the following living polymerization method.
The living polymerization method includes an anionic living polymerization method, a cationic living polymerization method, and a radical living polymerization method. Among them, the anionic living polymerization method has an anion as a polymerization active species, and is represented by the following scheme, for example.
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
 上記スキーム中、Ar1は1価の有機基であり、Ar2はAr1とは異なる1価の有機基であり、Mは金属原子であり、s及びtはそれぞれ1以上の整数である。 In the above scheme, Ar 1 is a monovalent organic group, Ar 2 is a monovalent organic group different from Ar 1 , M is a metal atom, and s and t are each an integer of 1 or more.
 ラジカルリビング重合法は重合活性種がラジカルであり、例えば下記スキームで示される。 In the radical living polymerization method, the polymerization active species is a radical, which is shown in the following scheme, for example.
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
 上記スキーム中、Ar1は1価の有機基であり、Ar2はAr1とは異なる1価の有機基であり、j及びkはそれぞれ1以上の整数であり、Raは水素原子又は1価の有機基であり、RbはRaとは異なる水素原子又は1価の有機基である。 In the above scheme, Ar 1 is a monovalent organic group, Ar 2 is a monovalent organic group different from Ar 1 , j and k are each an integer of 1 or more, and R a is a hydrogen atom or 1 the valence of the organic radical, the R b are different hydrogen atom or a monovalent organic group and R a.
 このアクリル系高分子分散剤を合成するに際しては、日本国特開平9-62002号公報や、P.Lutz, P.Masson et al, Polym. Bull. 12, 79 (1984), B.C.Anderson, G.D.Andrews et al, Macromolecules, 14, 1601(1981), K.Hatada, K.Ute,et al, Polym. J. 17, 977(1985), 18, 1037(1986), 右手浩一、畑田耕一、高分子加工、36, 366(1987),東村敏延、沢本光男、高分子論文集、46, 189(1989), M.Kuroki, T.Aida, J. Am. Chem. Sic, 109, 4737(1987)、相田卓三、井上祥平、有機合成化学、43, 300(1985), D.Y.Sogoh, W.R.Hertler et al, Macromolecules, 20, 1473(1987)などに記載の公知の方法を採用することができる。 When synthesizing this acrylic polymer dispersant, Japanese Patent Laid-Open No. 9-62002 or P. Lutz, P. Masson et al, Polym. Bull. 12, 79 (1984), B. C. Anderson, G.M. D. Andrews et al, Macromolecules, 14, 1601 (1981), K.M. Hatada, K. Ute, et al, Polym. J. 17, 977 (1985), 18, 1037 (1986), Koichi Right Hand, Koichi Hatada, Polymer Processing, 36, 366 (1987), Toshinobu Higashimura, Mitsuo Sawamoto, Journal of Polymer Science, 46, 189 (1989), M. Kuroki, T. Aida, J. Am. Chem. Sic, 109, 4737 (1987), Takuzo Aida, Shohei Inoue, Synthetic Organic Chemistry, 43, 300 (1985), D.M. Y. Sogoh, W. R. Known methods described in Hertler et al, Macromolecules, 20, 1473 (1987) and the like can be adopted.
 本発明で用いることができるアクリル系高分子分散剤はA-Bブロック共重合体であっても、B-A-Bブロック共重合体であってもよく、その共重合体を構成するAブロック/Bブロック比は1/99~80/20、特に5/95~60/40(質量比)であることが好ましく、この範囲内にすることで分散性と保存安定性のバランスの確保ができる傾向がある。
 また、本発明で用いることができるA-Bブロック共重合体、B-A-Bブロック共重合体1g中の4級アンモニウム塩基の量は、通常0.1~10mmolであることが好ましく、この範囲内にすることで良好な分散性を確保できる傾向がある。
The acrylic polymer dispersant that can be used in the present invention may be an AB block copolymer or a BAB block copolymer, and the A block constituting the copolymer may be used. The /B block ratio is preferably 1/99 to 80/20, and particularly preferably 5/95 to 60/40 (mass ratio). By setting it within this range, the balance between dispersibility and storage stability can be secured. Tend.
Further, the amount of the quaternary ammonium salt group in 1 g of the AB block copolymer or BAB block copolymer that can be used in the present invention is usually preferably 0.1 to 10 mmol. Within the range, good dispersibility tends to be ensured.
 なお、このようなブロック共重合体中には、通常、製造過程で生じたアミノ基が含有される場合があるが、そのアミン価は1~100mgKOH/g程度であり、分散性の観点から、好ましくは10mgKOH/g以上、より好ましくは30mgKOH/g以上、さらに好ましくは50mgKOH/g以上、また、好ましくは90mgKOH/g以下、より好ましくは80mgKOH/g以下、さらに好ましくは75mgKOH/g以下である。例えば、10~90mgKOH/gが好ましく、30~80mgKOH/gがより好ましく、50~75mgKOH/gがさらに好ましい。
 ここで、これらのブロック共重合体等の分散剤のアミン価は、分散剤試料中の溶剤を除いた固形分1gあたりの塩基量と当量のKOHの質量で表し、次の方法により測定する。
 100mLのビーカーに分散剤試料の0.5~1.5gを精秤し、50mLの酢酸で溶解する。pH電極を備えた自動滴定装置を使って、この溶液を0.1mol/LのHClO4酢酸溶液にて中和滴定する。滴定pH曲線の変曲点を滴定終点とし次式によりアミン価を求める。
Incidentally, such a block copolymer may usually contain an amino group generated in the production process, but its amine value is about 1 to 100 mgKOH/g, and from the viewpoint of dispersibility, It is preferably 10 mgKOH/g or more, more preferably 30 mgKOH/g or more, further preferably 50 mgKOH/g or more, preferably 90 mgKOH/g or less, more preferably 80 mgKOH/g or less, and further preferably 75 mgKOH/g or less. For example, 10 to 90 mgKOH/g is preferable, 30 to 80 mgKOH/g is more preferable, and 50 to 75 mgKOH/g is further preferable.
Here, the amine value of the dispersant such as the block copolymer is represented by the mass of KOH equivalent to the amount of the base per 1 g of the solid content excluding the solvent in the sample of the dispersant, and is measured by the following method.
Precisely weigh 0.5-1.5 g of the dispersant sample in a 100 mL beaker and dissolve with 50 mL acetic acid. Using an automatic titrator equipped with a pH electrode, this solution is subjected to neutralization titration with 0.1 mol/L HClO 4 acetic acid solution. Using the inflection point of the titration pH curve as the end point of titration, the amine value is calculated by the following formula.
 アミン価[mgKOH/g]=(561×V)/(W×S)
〔但し、W:分散剤試料秤取量[g]、V:滴定終点での滴定量[mL]、S:分散剤試料の固形分濃度[質量%]を表す。〕
 また、このブロック共重合体の酸価は、該酸価の元となる酸性基の有無及び種類にもよるが、一般に低い方が好ましく、通常10mgKOH/g以下であり、その重量平均分子量(Mw)は、1000~100000の範囲が好ましい。前記範囲内とすることで良好な分散性を確保できる傾向がある。
Amine value [mgKOH/g]=(561×V)/(W×S)
[However, W: Dispersant sample weight [g], V: Titration amount [mL] at the end point of titration, S: Solid content concentration [mass%] of the dispersant sample. ]
Although the acid value of this block copolymer depends on the presence and type of the acidic group which is the source of the acid value, it is generally preferable that the acid value is low, usually 10 mgKOH/g or less, and its weight average molecular weight (Mw). ) Is preferably in the range of 1000 to 100,000. Within the above range, good dispersibility tends to be ensured.
 アクリル系高分子分散剤が4級アンモニウム塩基を官能基として有する場合、アクリル系高分子分散剤の具体的な構造については特に限定されないが、分散性の観点からは、下記式(i)で表される繰り返し単位(以下、「繰り返し単位(i)」ということがある。)を有することが好ましい。 When the acrylic polymer dispersant has a quaternary ammonium salt group as a functional group, the specific structure of the acrylic polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is represented by the following formula (i). It is preferable to have a repeating unit (hereinafter, may be referred to as “repeating unit (i)”).
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
 上記式(i)中、R31~R33は各々独立に、水素原子、置換基を有していてもよいアルキル基、置換基を有していてもよいアリール基、又は置換基を有していてもよいアラルキル基であり、R31~R33のうち2つ以上が互いに結合して環状構造を形成してもよい。R34は水素原子又はメチル基である。Xは2価の連結基であり、Y-は対アニオンである。 In the above formula (i), R 31 to R 33 each independently have a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. It is an optionally substituted aralkyl group, and two or more of R 31 to R 33 may be bonded to each other to form a cyclic structure. R 34 is a hydrogen atom or a methyl group. X is a divalent linking group, and Y is a counter anion.
 上記式(i)のR31~R33における、置換基を有していてもよいアルキル基の炭素数は特に限定されないが、通常1以上であり、また、10以下であることが好ましく、6以下であることがより好ましい。例えば、1~10が好ましく、1~6がより好ましい。アルキル基の具体例としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基などが挙げられ、これらの中でも、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、又はヘキシル基であることが好ましく、メチル基、エチル基、プロピル基、又はブチル基であることがより好ましい。また、直鎖状、分岐鎖状のいずれであってもよい。また、シクロヘキシル基、シクロヘキシルメチル基などの環状構造を含んでもよい。 The number of carbon atoms of the alkyl group which may have a substituent in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 1 or more, and preferably 10 or less, 6 The following is more preferable. For example, 1 to 10 is preferable, and 1 to 6 is more preferable. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and the like. Among these, a methyl group, an ethyl group, a propyl group, and a butyl group. A group, a pentyl group, or a hexyl group is preferable, and a methyl group, an ethyl group, a propyl group, or a butyl group is more preferable. Further, it may be linear or branched. It may also contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group.
 上記式(i)のR31~R33における、置換基を有していてもよいアリール基の炭素数は特に限定されないが、通常6以上であり、また、16以下であることが好ましく、12以下であることがより好ましい。例えば、6~16が好ましく、6~12がより好ましい。アリール基の具体例としては、フェニル基、メチルフェニル基、エチルフェニル基、ジメチルフェニル基、ジエチルフェニル基、ナフチル基、アントラセニル基などが挙げられ、これらの中でもフェニル基、メチルフェニル基、エチルフェニル基、ジメチルフェニル基、又はジエチルフェニル基であることが好ましく、フェニル基、メチルフェニル基、又はエチルフェニル基であることがより好ましい。 The number of carbon atoms of the optionally substituted aryl group in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 6 or more, and preferably 16 or less, 12 The following is more preferable. For example, 6 to 16 are preferable, and 6 to 12 are more preferable. Specific examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, an anthracenyl group, and the like. Among these, a phenyl group, a methylphenyl group, an ethylphenyl group , A dimethylphenyl group, or a diethylphenyl group, and more preferably a phenyl group, a methylphenyl group, or an ethylphenyl group.
 上記式(i)のR31~R33における、置換基を有していてもよいアラルキル基の炭素数は特に限定されないが、通常7以上であり、また、16以下であることが好ましく、12以下であることがより好ましい。例えば、7~16が好ましく、7~12がより好ましい。アラルキル基の具体例としては、フェニルメチル基(ベンジル基)、フェニルエチル基(フェネチル基)、フェニルプロピル基、フェニルブチル基、フェニルイソプロピル基などが挙げられ、これらの中でも、フェニルメチル基、フェニルエチル基、フェニルプロピル基、又はフェニルブチル基であることが好ましく、フェニルメチル基、又はフェニルエチル基であることがより好ましい。 The number of carbon atoms of the aralkyl group which may have a substituent in R 31 to R 33 of the above formula (i) is not particularly limited, but is usually 7 or more, and preferably 16 or less, 12 The following is more preferable. For example, 7 to 16 are preferable, and 7 to 12 are more preferable. Specific examples of the aralkyl group include a phenylmethyl group (benzyl group), a phenylethyl group (phenethyl group), a phenylpropyl group, a phenylbutyl group, a phenylisopropyl group and the like. Among these, a phenylmethyl group, a phenylethyl group A group, a phenylpropyl group, or a phenylbutyl group is preferable, and a phenylmethyl group or a phenylethyl group is more preferable.
 これらの中でも、分散性の観点から、R31~R33が各々独立にアルキル基、又はアラルキル基であることが好ましく、具体的には、R31及びR33が各々独立にメチル基、又はエチル基であり、かつ、R32がフェニルメチル基、又はフェニルエチル基であることが好ましく、R31及びR33がメチル基であり、かつ、R32がフェニルメチル基であることがさらに好ましい。 Among these, from the viewpoint of dispersibility, R 31 to R 33 are preferably each independently an alkyl group or an aralkyl group, and specifically, R 31 and R 33 are each independently a methyl group or an ethyl group. It is preferable that R 32 is a group and R 32 is a phenylmethyl group or a phenylethyl group, and it is further preferable that R 31 and R 33 are a methyl group and R 32 is a phenylmethyl group.
 また、前記アクリル系高分子分散剤が官能基として3級アミンを有する場合、分散性の観点からは、下記式(ii)で表される繰り返し単位(以下、「繰り返し単位(ii)」ということがある。)を有することが好ましい。 Further, when the acrylic polymer dispersant has a tertiary amine as a functional group, from the viewpoint of dispersibility, a repeating unit represented by the following formula (ii) (hereinafter referred to as “repeating unit (ii)”) There is a).
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039
 上記式(ii)中、R35及びR36は各々独立に、水素原子、置換基を有していてもよいアルキル基、置換基を有していてもよいアリール基、又は置換基を有していてもよいアラルキル基であり、R35及びR36が互いに結合して環状構造を形成してもよい。R37は水素原子又はメチル基である。Zは2価の連結基である。 In the above formula (ii), R 35 and R 36 each independently have a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. And R 35 and R 36 may be bonded to each other to form a cyclic structure. R 37 is a hydrogen atom or a methyl group. Z is a divalent linking group.
 また、上記式(ii)のR35及びR36における、置換基を有していてもよいアルキル基としては、上記式(i)のR31~R33として例示したものを好ましく採用することができる。
 同様に、上記式(ii)のR35及びR36における、置換基を有していてもよいアリール基としては、上記式(i)のR31~R33として例示したものを好ましく採用することができる。また、上記式(ii)のR35及びR36における、置換基を有していてもよいアラルキル基としては、上記式(i)のR31~R33として例示したものを好ましく採用することができる。
Further, as the alkyl group which may have a substituent in R 35 and R 36 of the above formula (ii), those exemplified as R 31 to R 33 of the above formula (i) are preferably adopted. it can.
Similarly, as the aryl group which may have a substituent in R 35 and R 36 of the above formula (ii), those exemplified as R 31 to R 33 of the above formula (i) are preferably adopted. You can Further, as the aralkyl group which may have a substituent in R 35 and R 36 of the above formula (ii), those exemplified as R 31 to R 33 of the above formula (i) are preferably adopted. it can.
 これらの中でも、R35及びR36が各々独立に、置換基を有していてもよいアルキル基であることが好ましく、メチル基、又はエチル基であることがより好ましい。 Among these, R 35 and R 36 are each independently preferably an alkyl group which may have a substituent, and more preferably a methyl group or an ethyl group.
 上記式(i)のR31~R33及び上記式(ii)のR35及びR36におけるアルキル基、アラルキル基又はアリール基が有していてもよい置換基としては、ハロゲン原子、アルコキシ基、ベンゾイル基、水酸基などが挙げられる。 The substituent which the alkyl group, aralkyl group or aryl group in R 31 to R 33 of the above formula (i) and R 35 and R 36 of the above formula (ii) may have is a halogen atom, an alkoxy group, Examples thereof include benzoyl group and hydroxyl group.
 上記式(i)及び(ii)において、2価の連結基X及びZとしては、例えば、炭素数1~10のアルキレン基、炭素数6~12のアリーレン基、-CONH-R43-基、-COOR44-基〔但し、R43及びR44は単結合、炭素数1~10のアルキレン基、又は炭素数2~10のエーテル基(アルキルオキシアルキル基)である〕等が挙げられ、好ましくは-COO-R44-基である。
 また、上記式(i)において、対アニオンのY-としては、Cl-、Br-、I-、ClO4 -、BF4 -、CH3COO-、PF6 -等が挙げられる。
In the above formulas (i) and (ii), the divalent linking groups X and Z are, for example, an alkylene group having 1 to 10 carbon atoms, an arylene group having 6 to 12 carbon atoms, a —CONH—R 43 — group, —COOR 44 — group (provided that R 43 and R 44 are a single bond, an alkylene group having 1 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms) and the like are preferable. Is a —COO—R 44 — group.
Further, in the above formula (i), examples of Y as a counter anion include Cl , Br , I , ClO 4 , BF 4 , CH 3 COO , PF 6 − and the like.
 前記式(i)で表される繰り返し単位の含有割合は特に限定されないが、分散性の観点から、前記式(i)で表される繰り返し単位の含有割合と前記式(ii)で表される繰り返し単位の含有割合の合計に対して好ましくは60モル%以下であり、より好ましくは50モル%以下であり、さらに好ましくは40モル%以下であり、特に好ましくは35モル%以下であり、また、好ましくは5モル%以上であり、より好ましくは10モル%以上であり、さらに好ましくは20モル%以上であり、特に好ましくは30モル%以上である。 The content ratio of the repeating unit represented by the formula (i) is not particularly limited, but from the viewpoint of dispersibility, it is represented by the content ratio of the repeating unit represented by the formula (i) and the formula (ii). It is preferably 60 mol% or less, more preferably 50 mol% or less, still more preferably 40 mol% or less, and particularly preferably 35 mol% or less, based on the total content of repeating units. , Preferably 5 mol% or more, more preferably 10 mol% or more, further preferably 20 mol% or more, particularly preferably 30 mol% or more.
 また、高分子分散剤の全繰り返し単位に占める前記式(i)で表される繰り返し単位の含有割合は特に限定されないが、分散性の観点から、1モル%以上が好ましく、5モル%以上がより好ましく、10モル%以上がさらに好ましく、また、50モル%以下が好ましく、30モル%以下がより好ましく、20モル%以下がさらに好ましく、15モル%以下が特に好ましい。例えば、1~50モル%が好ましく、5~30モル%がより好ましく、5~20モル%がさらに好ましく、10~15モル%が特に好ましい。 Further, the content ratio of the repeating unit represented by the formula (i) in all the repeating units of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 1 mol% or more, and 5 mol% or more. More preferably, 10 mol% or more is further preferable, 50 mol% or less is preferable, 30 mol% or less is more preferable, 20 mol% or less is further preferable, and 15 mol% or less is particularly preferable. For example, 1 to 50 mol% is preferable, 5 to 30 mol% is more preferable, 5 to 20 mol% is further preferable, and 10 to 15 mol% is particularly preferable.
 また、高分子分散剤の全繰り返し単位に占める前記式(ii)で表される繰り返し単位の含有割合は特に限定されないが、分散性の観点から、5モル%以上が好ましく、10モル%以上がより好ましく、15モル%以上がさらに好ましく、20モル%以上が特に好ましく、また、60モル%以下が好ましく、40モル%以下がより好ましく、30モル%以下がさらに好ましく、25モル%以下が特に好ましい。例えば、5~60モル%が好ましく、10~40モル%がより好ましく、15~30モル%がさらに好ましく、20~25モル%が特に好ましい。 Further, the content ratio of the repeating unit represented by the formula (ii) in all repeating units of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 5 mol% or more, and 10 mol% or more. More preferably, 15 mol% or more is further preferable, 20 mol% or more is particularly preferable, 60 mol% or less is preferable, 40 mol% or less is more preferable, 30 mol% or less is further preferable, and 25 mol% or less is particularly preferable. preferable. For example, 5 to 60 mol% is preferable, 10 to 40 mol% is more preferable, 15 to 30 mol% is further preferable, and 20 to 25 mol% is particularly preferable.
 また、高分子分散剤は、溶媒等のバインダー成分に対する相溶性を高め、分散安定性を向上させるとの観点から、下記式(iii)で表される繰り返し単位(以下、「繰り返し単位(iii)」ということがある。)を有することが好ましい。 In addition, the polymer dispersant is a repeating unit represented by the following formula (iii) (hereinafter, “repeating unit (iii)” from the viewpoint of increasing compatibility with a binder component such as a solvent and improving dispersion stability. It may be said that it has ".
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
 上記式(iii)中、R40はエチレン基又はプロピレン基であり、R41は置換基を有していてもよいアルキル基であり、R42は水素原子又はメチル基である。nは1~20の整数である。 In the formula (iii), R 40 is an ethylene group or a propylene group, R 41 is an alkyl group which may have a substituent, and R 42 is a hydrogen atom or a methyl group. n is an integer of 1 to 20.
 上記式(iii)のR41における、置換基を有していてもよいアルキル基の炭素数は特に限定されないが、通常1以上であり、2以上が好ましく、また、10以下が好ましく、6以下がより好ましい。例えば、1~10が好ましく、1~6がより好ましく、2~6がさらに好ましい。アルキル基の具体例としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基などが挙げられ、これらの中でも、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、又はヘキシル基であることが好ましく、メチル基、エチル基、プロピル基、又はブチル基であることがより好ましい。また、直鎖状、分岐鎖状のいずれであってもよい。また、シクロヘキシル基、シクロヘキシルメチル基などの環状構造を含んでもよい。 The number of carbon atoms of the alkyl group which may have a substituent in R 41 of the above formula (iii) is not particularly limited, but is usually 1 or more, preferably 2 or more, and preferably 10 or less, and 6 or less. Is more preferable. For example, 1 to 10 is preferable, 1 to 6 is more preferable, and 2 to 6 is further preferable. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and the like. Among these, a methyl group, an ethyl group, a propyl group, and a butyl group. A group, a pentyl group, or a hexyl group is preferable, and a methyl group, an ethyl group, a propyl group, or a butyl group is more preferable. Further, it may be linear or branched. It may also contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group.
 また、上記式(iii)におけるnは溶媒等バインダー成分に対する相溶性と分散性の観点から、1以上が好ましく、2以上がより好ましく、また、10以下が好ましく、5以下がより好ましい。例えば、1~10が好ましく、1~5がより好ましく、2~5がさらに好ましい。 Further, n in the above formula (iii) is preferably 1 or more, more preferably 2 or more, more preferably 10 or less, and more preferably 5 or less, from the viewpoint of compatibility and dispersibility with a binder component such as a solvent. For example, 1 to 10 is preferable, 1 to 5 is more preferable, and 2 to 5 is further preferable.
 また、高分子分散剤の全繰り返し単位に占める前記式(iii)で表される繰り返し単位の含有割合は特に限定されないが、1モル%以上が好ましく、2モル%以上がより好ましく、4モル%以上がさらに好ましく、また、30モル%以下が好ましく、20モル%以下がより好ましく、10モル%以下がさらに好ましい。例えば、1~30モル%が好ましく、2~20モル%がより好ましく、4~10モル%がさらに好ましい。前記範囲内の場合には溶媒等バインダー成分に対する相溶性と分散安定性の両立が可能となる傾向がある。 The content of the repeating unit represented by the formula (iii) in all repeating units of the polymer dispersant is not particularly limited, but is preferably 1 mol% or more, more preferably 2 mol% or more, and 4 mol%. The above is more preferable, 30 mol% or less is preferable, 20 mol% or less is more preferable, and 10 mol% or less is further preferable. For example, 1 to 30 mol% is preferable, 2 to 20 mol% is more preferable, and 4 to 10 mol% is further preferable. Within the above range, compatibility with a binder component such as a solvent and dispersion stability tend to be compatible.
 また、高分子分散剤は、分散剤の溶媒等バインダー成分に対する相溶性を高め、分散安定性を向上させるという観点から、下記式(iv)で表される繰り返し単位(以下、「繰り返し単位(iv)」ということがある。)を有することが好ましい。 Further, the polymer dispersant is a repeating unit represented by the following formula (iv) (hereinafter, referred to as "repeating unit (iv)" from the viewpoint of increasing the compatibility of the dispersant with a binder component such as a solvent and improving the dispersion stability. )” in some cases.).
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
 上記式(iv)中、R38は置換基を有していてもよいアルキル基、置換基を有していてもよいアリール基、又は置換基を有していてもよいアラルキル基である。R39は水素原子又はメチル基である。 In the above formula (iv), R 38 is an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent. R 39 is a hydrogen atom or a methyl group.
 上記式(iv)のR38における、置換基を有していてもよいアルキル基の炭素数は特に限定されないが、通常1以上であり、2以上であることが好ましく、4以上であることがより好ましく、また、10以下であることが好ましく、8以下であることがより好ましい。例えば、1~10が好ましく、1~8がより好ましく、2~8がさらに好ましく、4~8がよりさらに好ましい。アルキル基の具体例としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基などが挙げられ、これらの中でも、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、又はヘキシル基であることが好ましく、メチル基、エチル基、プロピル基、又はブチル基であることがより好ましい。また、直鎖状、分岐鎖状のいずれであってもよい。また、シクロヘキシル基、シクロヘキシルメチル基などの環状構造を含んでもよい。 The number of carbon atoms of the alkyl group which may have a substituent in R 38 of the above formula (iv) is not particularly limited, but is usually 1 or more, preferably 2 or more, and preferably 4 or more. More preferably, it is preferably 10 or less, and more preferably 8 or less. For example, 1 to 10 is preferable, 1 to 8 is more preferable, 2 to 8 is further preferable, and 4 to 8 is even more preferable. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and the like. Among these, a methyl group, an ethyl group, a propyl group, and a butyl group. A group, a pentyl group, or a hexyl group is preferable, and a methyl group, an ethyl group, a propyl group, or a butyl group is more preferable. Further, it may be linear or branched. It may also contain a cyclic structure such as a cyclohexyl group or a cyclohexylmethyl group.
 上記式(iv)のR38における、置換基を有していてもよいアリール基の炭素数は特に限定されないが、通常6以上であり、また、16以下が好ましく、12以下がより好ましく、8以下がさらに好ましい。例えば、6~16が好ましく、6~12がより好ましく、6~8がさらに好ましい。アリール基の具体例としては、フェニル基、メチルフェニル基、エチルフェニル基、ジメチルフェニル基、ジエチルフェニル基、ナフチル基、アントラセニル基などが挙げられ、これらの中でもフェニル基、メチルフェニル基、エチルフェニル基、ジメチルフェニル基、又はジエチルフェニル基であることが好ましく、フェニル基、メチルフェニル基、又はエチルフェニル基であることがより好ましい。 The number of carbon atoms of the aryl group which may have a substituent in R 38 of the above formula (iv) is not particularly limited, but is usually 6 or more, and is preferably 16 or less, more preferably 12 or less, and 8 The following are more preferable. For example, 6 to 16 is preferable, 6 to 12 is more preferable, and 6 to 8 is further preferable. Specific examples of the aryl group include a phenyl group, a methylphenyl group, an ethylphenyl group, a dimethylphenyl group, a diethylphenyl group, a naphthyl group, an anthracenyl group, and the like. Among these, a phenyl group, a methylphenyl group, an ethylphenyl group , A dimethylphenyl group, or a diethylphenyl group, and more preferably a phenyl group, a methylphenyl group, or an ethylphenyl group.
 上記式(iv)のR38における、置換基を有していてもよいアラルキル基の炭素数は特に限定されないが、通常7以上であり、また、16以下であることが好ましく、12以下であることがより好ましく、10以下であることがさらに好ましい。例えば、7~16が好ましく、7~12がより好ましく、7~10がさらに好ましい。アラルキル基の具体例としては、フェニルメチル基、フェニルエチル基、フェニルプロピル基、フェニルブチル基、フェニルイソプロピル基などが挙げられ、これらの中でも、フェニルメチル基、フェニルエチル基、フェニルプロピル基、又はフェニルブチル基であることが好ましく、フェニルメチル基、又はフェニルエチル基であることがより好ましい。 The number of carbon atoms of the aralkyl group which may have a substituent in R 38 of the above formula (iv) is not particularly limited, but is usually 7 or more, and preferably 16 or less, and 12 or less. More preferably, it is more preferably 10 or less. For example, 7 to 16 are preferable, 7 to 12 are more preferable, and 7 to 10 are further preferable. Specific examples of the aralkyl group include a phenylmethyl group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, a phenylisopropyl group, and the like. Among these, a phenylmethyl group, a phenylethyl group, a phenylpropyl group, or a phenyl group. It is preferably a butyl group, and more preferably a phenylmethyl group or a phenylethyl group.
 これらの中でも、溶剤相溶性と分散安定性の観点から、R38がアルキル基、又はアラルキル基であることが好ましく、メチル基、エチル基、又はフェニルメチル基であることがより好ましい。
 R38における、アルキル基が有していてもよい置換基としては、ハロゲン原子、アルコキシ基等が挙げられる。また、アリール基又はアラルキル基が有していてもよい置換基としては、鎖状のアルキル基、ハロゲン原子、アルコキシ基等が挙げられる。また、R38で示される鎖状のアルキル基には、直鎖状及び分岐鎖状のいずれも含まれる。
Among these, from the viewpoint of solvent compatibility and dispersion stability, R 38 is preferably an alkyl group or an aralkyl group, and more preferably a methyl group, an ethyl group or a phenylmethyl group.
Examples of the substituent which the alkyl group may have in R 38 include a halogen atom and an alkoxy group. Examples of the substituent that the aryl group or aralkyl group may have include a chain alkyl group, a halogen atom and an alkoxy group. The chain alkyl group represented by R 38 includes both straight chain and branched chain groups.
 また、高分子分散剤の全繰り返し単位に占める前記式(iv)で表される繰り返し単位の含有割合は、分散性の観点から、30モル%以上が好ましく、40モル%以上がより好ましく、50モル%以上がさらに好ましく、また、80モル%以下が好ましく、70モル%以下がより好ましい。例えば、30~80モル%が好ましく、40~80モル%がより好ましく、50~70モル%以上がさらに好ましい。 From the viewpoint of dispersibility, the content of the repeating unit represented by the formula (iv) in all repeating units of the polymer dispersant is preferably 30 mol% or more, more preferably 40 mol% or more, and 50 It is more preferably at least mol%, preferably at most 80 mol%, more preferably at most 70 mol%. For example, 30 to 80 mol% is preferable, 40 to 80 mol% is more preferable, and 50 to 70 mol% or more is further preferable.
 高分子分散剤は、繰り返し単位(i)、繰り返し単位(ii)、繰り返し単位(iii)及び繰り返し単位(iv)以外の繰り返し単位を有していてもよい。そのような繰り返し単位の例としては、スチレン、α-メチルスチレンなどのスチレン系単量体;(メタ)アクリル酸クロリドなどの(メタ)アクリル酸塩系単量体;(メタ)アクリルアミド、N-メチロールアクリルアミドなどの(メタ)アクリルアミド系単量体;酢酸ビニル;アクリロニトリル;アリルグリシジルエーテル、クロトン酸グリシジルエーテル;N-メタクリロイルモルホリン等の単量体に由来する繰り返し単位が挙げられる。 The polymer dispersant may have a repeating unit other than the repeating unit (i), the repeating unit (ii), the repeating unit (iii) and the repeating unit (iv). Examples of such repeating units include styrene-based monomers such as styrene and α-methylstyrene; (meth)acrylate-based monomers such as (meth)acrylic acid chloride; (meth)acrylamide, N- (Meth)acrylamide-based monomers such as methylol acrylamide; vinyl acetate; acrylonitrile; allyl glycidyl ether, crotonic acid glycidyl ether; and N-methacryloylmorpholine.
 高分子分散剤は、分散性をより高めるとの観点から、繰り返し単位(i)及び繰り返し単位(ii)を有するAブロックと、繰り返し単位(i)及び繰り返し単位(ii)を有さないBブロックとを有する、ブロック共重合体であることが好ましい。該ブロック共重合体は、A-Bブロック共重合体又はB-A-Bブロック共重合体であることが好ましい。Aブロックに4級アンモニウム塩基だけでなく3級アミノ基も導入することにより、意外にも、分散剤の分散能力が著しく向上する傾向がある。また、Bブロックが繰り返し単位(iii)を有することが好ましく、さらに繰り返し単位(iv)を有することがより好ましい。 From the viewpoint of further improving dispersibility, the polymer dispersant is an A block having a repeating unit (i) and a repeating unit (ii) and a B block having no repeating unit (i) and a repeating unit (ii). It is preferable that the block copolymer has The block copolymer is preferably an AB block copolymer or a BAB block copolymer. Surprisingly, the dispersibility of the dispersant tends to be significantly improved by introducing not only a quaternary ammonium salt group but also a tertiary amino group into the A block. Further, the B block preferably has a repeating unit (iii), and more preferably has a repeating unit (iv).
 Aブロック中において、繰り返し単位(i)及び繰り返し単位(ii)は、ランダム共重合、ブロック共重合のいずれの態様で含有されていてもよい。また、繰り返し単位(i)及び繰り返し単位(ii)は、1つのAブロック中に各々2種以上含有されていてもよく、その場合、各々の繰り返し単位は、該Aブロック中においてランダム共重合、ブロック共重合のいずれの態様で含有されていてもよい。 In the A block, the repeating unit (i) and the repeating unit (ii) may be contained in any form of random copolymerization and block copolymerization. Further, the repeating unit (i) and the repeating unit (ii) may each be contained in one A block in an amount of two or more, and in that case, each repeating unit is randomly copolymerized in the A block, It may be contained in any form of block copolymerization.
 また、繰り返し単位(i)及び繰り返し単位(ii)以外の繰り返し単位が、Aブロック中に含有されていてもよく、そのような繰り返し単位の例としては、前述の(メタ)アクリル酸エステル系単量体由来の繰り返し単位等が挙げられる。繰り返し単位(i)及び繰り返し単位(ii)以外の繰り返し単位の、Aブロック中の含有割合は、好ましくは0~50モル%、より好ましくは0~20モル%であるが、かかる繰り返し単位はAブロック中に含有されないことが最も好ましい。 Further, the repeating unit (i) and a repeating unit other than the repeating unit (ii) may be contained in the A block, and examples of such a repeating unit include the above-mentioned (meth)acrylic acid ester-based monomer. Examples include repeating units derived from a monomer. The content ratio of the repeating unit (i) and the repeating unit other than the repeating unit (ii) in the A block is preferably 0 to 50 mol %, more preferably 0 to 20 mol %. Most preferably, it is not contained in the block.
 繰り返し単位(iii)及び(iv)以外の繰り返し単位がBブロック中に含有されていてもよく、そのような繰り返し単位の例としては、スチレン、α-メチルスチレンなどのスチレン系単量体;(メタ)アクリル酸クロリドなどの(メタ)アクリル酸塩系単量体;(メタ)アクリルアミド、N-メチロールアクリルアミドなどの(メタ)アクリルアミド系単量体;酢酸ビニル;アクリロニトリル;アリルグリシジルエーテル、クロトン酸グリシジルエーテル;N-メタクリロイルモルホリン等の単量体に由来する繰り返し単位が挙げられる。繰り返し単位(iii)及び繰り返し単位(iv)以外の繰り返し単位の、Bブロック中の含有量は、好ましくは0~50モル%、より好ましくは0~20モル%であるが、かかる繰り返し単位はBブロック中に含有されないことが最も好ましい。 Repeating units other than the repeating units (iii) and (iv) may be contained in the B block, and examples of such repeating units include styrene-based monomers such as styrene and α-methylstyrene; (Meth)acrylic acid chloride-based monomers such as (meth)acrylic acid chloride; (meth)acrylamide-based monomers such as (meth)acrylamide and N-methylolacrylamide; vinyl acetate; acrylonitrile; allyl glycidyl ether, glycidyl crotonic acid Ether; a repeating unit derived from a monomer such as N-methacryloylmorpholine. The content of the repeating unit other than the repeating unit (iii) and the repeating unit (iv) in the B block is preferably 0 to 50 mol %, more preferably 0 to 20 mol %. Most preferably, it is not contained in the block.
 また分散安定性向上の点から、(f)分散剤は、後述する顔料誘導体と併用することが好ましい。 Further, from the viewpoint of improving dispersion stability, it is preferable to use the (f) dispersant in combination with a pigment derivative described later.
<感光性着色組成物のその他の配合成分>
 本発明の感光性着色組成物には、上述の成分の他、シランカップリング剤等の密着向上剤、界面活性剤(塗布性向上剤)、顔料誘導体、光酸発生剤、架橋剤、メルカプト化合物、重合禁止剤、現像改良剤、紫外線吸収剤、酸化防止剤等の添加剤を適宜配合することができる。
<Other compounding components of photosensitive coloring composition>
In the photosensitive coloring composition of the present invention, in addition to the above-mentioned components, an adhesion improver such as a silane coupling agent, a surfactant (coating improver), a pigment derivative, a photoacid generator, a crosslinking agent, a mercapto compound. Additives such as a polymerization inhibitor, a development improver, an ultraviolet absorber and an antioxidant can be appropriately added.
 (1)密着向上剤
 本発明の感光性着色組成物には、基板との密着性を改善するため、密着向上剤を含有させてもよい。密着向上剤としては、シランカップリング剤、燐酸基含有化合物等が好ましい。
 シランカップリング剤の種類としては、エポキシ系、(メタ)アクリル系、アミノ系等種々のものを、1種を単独で、或いは2種以上を混合して使用できる。
(1) Adhesion improver The photosensitive coloring composition of the present invention may contain an adhesion improver in order to improve the adhesion to the substrate. As the adhesion improver, a silane coupling agent, a phosphoric acid group-containing compound and the like are preferable.
As the type of the silane coupling agent, various types such as epoxy type, (meth)acrylic type and amino type can be used alone or in combination of two or more.
 好ましいシランカップリング剤として、例えば、3-メタクリロキシプロピルメチルジメトキシシラン、3-メタクリロキシプロピルトリメトキシシラン等の(メタ)アクリロキシシラン類、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルメチルジエトキシシラン、3-グリシドキシプロピルトリエトキシシラン等のエポキシシラン類、3-ウレイドプロピルトリエトキシシラン等のウレイドシラン類、3-イソシアネートプロピルトリエトキシシラン等のイソシアネートシラン類が挙げられるが、特に好ましくは、エポキシシラン類のシランカップリング剤である。
 燐酸基含有化合物としては、(メタ)アクリロイル基含有ホスフェート類が好ましく、下記一般式(g1)、(g2)又は(g3)で表されるものが好ましい。
Examples of preferable silane coupling agents include (meth)acryloxysilanes such as 3-methacryloxypropylmethyldimethoxysilane and 3-methacryloxypropyltrimethoxysilane, and 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane. Epoxy silanes such as 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane and 3-glycidoxypropyltriethoxysilane, ureidosilanes such as 3-ureidopropyltriethoxysilane, Isocyanate silanes such as 3-isocyanate propyl triethoxy silane may be mentioned, but silane coupling agents of epoxy silanes are particularly preferable.
As the phosphoric acid group-containing compound, (meth)acryloyl group-containing phosphates are preferable, and compounds represented by the following general formula (g1), (g2) or (g3) are preferable.
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
 上記一般式(g1)、(g2)及び(g3)において、R51は水素原子又はメチル基を示し、l及びl’は1~10の整数、mは1、2又は3である。
 これらの燐酸基含有化合物は、1種類を単独で用いても、2種以上を組み合わせて使用してもよい。
In the above general formulas (g1), (g2) and (g3), R 51 represents a hydrogen atom or a methyl group, l and l′ are integers of 1 to 10, and m is 1, 2 or 3.
These phosphoric acid group-containing compounds may be used alone or in combination of two or more.
 (2)界面活性剤
 本発明の感光性着色組成物には、塗布性向上ため、界面活性剤を含有させてもよい。
(2) Surfactant The photosensitive coloring composition of the present invention may contain a surfactant to improve coatability.
 界面活性剤としては、例えば、アニオン系、カチオン系、非イオン系、両性界面活性剤等各種のものを用いることができる。中でも、諸特性に悪影響を及ぼす可能性が低い点で、非イオン系界面活性剤を用いることが好ましく、中でもフッ素系やシリコン系の界面活性剤が塗布性の面で効果的である。
 このような界面活性剤としては、例えば、TSF4460(モメンティブ・パフォーマンス・マテリアルズ社製)、DFX-18(ネオス社製)、BYK-300、BYK-325、BYK-330(ビックケミー社製)、KP340(信越シリコーン社製)、メガファック(登録商標、以下同じ。)F-470、メガファックF-475、メガファックF-478、メガファックF-554、メガファックF-559(DIC社製)、SH7PA(東レ・ダウコーニング社製)、DS-401(ダイキン社製)、L-77(日本ユニカー社製)、FC4430(3M社製)等が挙げられる。
 なお、界面活性剤は、1種を用いてもよく、2種以上を任意の組み合わせ及び比率で併用してもよい。
As the surfactant, various ones such as anionic, cationic, nonionic and amphoteric surfactants can be used. Among them, it is preferable to use a nonionic surfactant because it is unlikely to adversely affect various properties, and among them, a fluorine-based surfactant or a silicon-based surfactant is effective in terms of coating properties.
Examples of such a surfactant include TSF4460 (manufactured by Momentive Performance Materials), DFX-18 (manufactured by Neos), BYK-300, BYK-325, BYK-330 (manufactured by Big Chemie), KP340. (Manufactured by Shin-Etsu Silicone Co., Ltd.), Megafac (registered trademark, the same applies hereinafter) F-470, Megafac F-475, Megafac F-478, Megafac F-554, Megafac F-559 (manufactured by DIC), Examples include SH7PA (manufactured by Toray Dow Corning), DS-401 (manufactured by Daikin), L-77 (manufactured by Nippon Unicar), FC4430 (manufactured by 3M), and the like.
In addition, 1 type may be used for a surfactant and 2 or more types may be used together by arbitrary combinations and ratios.
 (3)顔料誘導体
 本発明の感光性着色組成物には、分散性、保存性向上のため、分散助剤として顔料誘導体を含有させてもよい。
 顔料誘導体としてはアゾ系、フタロシアニン系、キナクリドン系、ベンズイミダゾロン系、キノフタロン系、イソインドリノン系、ジオキサジン系、アントラキノン系、インダンスレン系、ペリレン系、ペリノン系、ジケトピロロピロール系、ジオキサジン系等の誘導体が挙げられるが、中でもフタロシアニン系、キノフタロン系が好ましい。
 顔料誘導体の置換基としてはスルホン酸基、スルホンアミド基及びその4級塩、フタルイミドメチル基、ジアルキルアミノアルキル基、水酸基、カルボキシル基、アミド基等が顔料骨格に直接又はアルキル基、アリール基、複素環基等を介して結合したものが挙げられ、好ましくはスルホン酸基である。またこれら置換基は一つの顔料骨格に複数置換していてもよい。
(3) Pigment Derivative The photosensitive coloring composition of the present invention may contain a pigment derivative as a dispersion aid in order to improve dispersibility and storability.
Examples of pigment derivatives include azo, phthalocyanine, quinacridone, benzimidazolone, quinophthalone, isoindolinone, dioxazine, anthraquinone, indanthrene, perylene, perinone, diketopyrrolopyrrole, dioxazine. Examples thereof include derivatives such as phthalocyanine compounds and quinophthalone compounds.
As the substituent of the pigment derivative, a sulfonic acid group, a sulfonamide group and a quaternary salt thereof, a phthalimidomethyl group, a dialkylaminoalkyl group, a hydroxyl group, a carboxyl group, an amide group, etc. may be directly attached to the pigment skeleton or may be an alkyl group, an aryl group, a hetero group. Examples thereof include those bonded via a ring group and the like, and a sulfonic acid group is preferable. Further, a plurality of these substituents may be substituted on one pigment skeleton.
 顔料誘導体の具体例としてはフタロシアニンのスルホン酸誘導体、キノフタロンのスルホン酸誘導体、アントラキノンのスルホン酸誘導体、キナクリドンのスルホン酸誘導体、ジケトピロロピロールのスルホン酸誘導体、ジオキサジンのスルホン酸誘導体等が挙げられる。これらは1種を単独で用いてもよく、2種以上を併用してもよい。 Specific examples of pigment derivatives include phthalocyanine sulfonic acid derivatives, quinophthalone sulfonic acid derivatives, anthraquinone sulfonic acid derivatives, quinacridone sulfonic acid derivatives, diketopyrrolopyrrole sulfonic acid derivatives, and dioxazine sulfonic acid derivatives. These may be used alone or in combination of two or more.
 (4)光酸発生剤
 光酸発生剤とは、紫外線により酸を発生することができる化合物であり、露光を行った際に発生する酸の作用により、例えばメラミン化合物等の架橋剤があることで架橋反応を進行させることとなる。係る光酸発生剤の中でも、溶剤に対する溶解性、特に感光性着色組成物に使われる溶剤に対する溶解性が大きいものが好ましいものであり、例えば、ジフェニルヨードニウム、ジトリルヨードニウム、フェニル(p-アニシル)ヨードニウム、ビス(m-ニトロフェニル)ヨードニウム、ビス(p-tert-ブチルフェニル)ヨードニウム、ビス(p-クロロフェニル)ヨードニウム、ビス(n-ドデシル)ヨードニウム、p-イソブチルフェニル(p-トリル)ヨードニウム、p-イソプロピルフェニル(p-トリル)ヨードニウムなどのジアリールヨードニウム、或いはトリフェニルスルホニウムなどのトリアリールスルホニウムのクロリド、ブロミド、或いはホウフッ化塩、ヘキサフルオロフォスフェート塩、ヘキサフルオロアルセネート塩、芳香族スルホン酸塩、テトラキス(ペンタフルオロフェニル)ボレート塩等や、ジフェニルフェナシルスルホニウム(n-ブチル)トリフェニルボレート等のスルホニウム有機ホウ素錯体類、或いは、2-メチル-4,6-ビストリクロロメチルトリアジン、2-(4-メトキシフェニル)-4,6-ビストリクロロメチルトリアジンなどのトリアジン化合物等を挙げることができるがこの限りではない。
(4) Photo-acid generator The photo-acid generator is a compound capable of generating an acid by ultraviolet rays, and has a cross-linking agent such as a melamine compound due to the action of the acid generated upon exposure. The crosslinking reaction proceeds. Among such photo-acid generators, those having a large solubility in a solvent, especially a solvent used in the photosensitive coloring composition are preferable, and examples thereof include diphenyliodonium, ditolyliodonium, and phenyl(p-anisyl). Iodonium, bis(m-nitrophenyl)iodonium, bis(p-tert-butylphenyl)iodonium, bis(p-chlorophenyl)iodonium, bis(n-dodecyl)iodonium, p-isobutylphenyl(p-tolyl)iodonium, p -Diaryl iodonium such as isopropylphenyl (p-tolyl) iodonium, or chloride, bromide, or borofluoride salt, hexafluorophosphate salt, hexafluoroarsenate salt, aromatic sulfonate of triarylsulfonium such as triphenylsulfonium , Tetrakis(pentafluorophenyl)borate salt, etc., sulfonium organoboron complexes such as diphenylphenacylsulfonium(n-butyl)triphenylborate, 2-methyl-4,6-bistrichloromethyltriazine, 2-( Examples thereof include, but are not limited to, triazine compounds such as 4-methoxyphenyl)-4,6-bistrichloromethyltriazine.
 (5)架橋剤
 本発明の感光性着色組成物には、さらに架橋剤を加えることができ、例えばメラミン又はグアナミン系の化合物を用いることができる。これら架橋剤としては、例えば、下記一般式(6)で示されるメラミン又はグアナミン系の化合物を挙げることができる。
(5) Crosslinking Agent A crosslinking agent can be further added to the photosensitive coloring composition of the present invention, and for example, a melamine- or guanamine-based compound can be used. Examples of these cross-linking agents include melamine- or guanamine-based compounds represented by the following general formula (6).
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
 式(6)中、R61は-NR6667基又は炭素数6~12のアリール基を表し、R61が-NR6667基の場合はR62、R63、R64、R65、R66及びR67の一つがCH2OR68基を表し、R61が炭素数6~12のアリール基の場合はR62、R63、R64及びR65の一つが-CH2OR68基を表し、R62、R63、R64、R65、R66及びR67の残りは互いに独立に、水素又は-CH2OR68基を表し、R68は水素原子又は炭素数1~4のアルキル基を表す。
 ここで、炭素数6~12のアリール基は典型的にはフェニル基、1-ナフチル基又は2-ナフチル基であり、これらのフェニル基やナフチル基には、アルキル基、アルコキシ基、ハロゲン原子などの置換基が結合していてもよい。アルキル基及びアルコキシ基は、それぞれ炭素数1~6程度であることができる。R68で表されるアルキル基は、上記の中でも、メチル基又はエチル基、とりわけメチル基であることが好ましい。
In the formula (6), R 61 represents a —NR 66 R 67 group or an aryl group having 6 to 12 carbon atoms, and when R 61 is a —NR 66 R 67 group, R 62 , R 63 , R 64 , R 65 , R 66 and R 67 each represent a CH 2 OR 68 group, and when R 61 is an aryl group having 6 to 12 carbon atoms, one of R 62 , R 63 , R 64 and R 65 is —CH 2 OR 68. R 62 , R 63 , R 64 , R 65 , R 66 and the remaining of R 67 each independently represent hydrogen or a —CH 2 OR 68 group, and R 68 represents a hydrogen atom or a carbon number of 1 to 4 Represents an alkyl group.
Here, the aryl group having 6 to 12 carbon atoms is typically a phenyl group, a 1-naphthyl group or a 2-naphthyl group, and these phenyl groups and naphthyl groups include an alkyl group, an alkoxy group, a halogen atom, etc. The substituent of may be bonded. The alkyl group and the alkoxy group may each have about 1 to 6 carbon atoms. Among the above, the alkyl group represented by R 68 is preferably a methyl group or an ethyl group, and particularly preferably a methyl group.
 一般式(6)に相当するメラミン系化合物、すなわち下記一般式(6-1)の化合物には、ヘキサメチロールメラミン、ペンタメチロールメラミン、テトラメチロールメラミン、ヘキサメトキシメチルメラミン、ペンタメトキシメチルメラミン、テトラメトキシメチルメラミン、ヘキサエトキシメチルメラミンなどが包含される。 Melamine compounds corresponding to the general formula (6), that is, compounds of the following general formula (6-1) include hexamethylolmelamine, pentamethylolmelamine, tetramethylolmelamine, hexamethoxymethylmelamine, pentamethoxymethylmelamine, tetramethoxy. Methyl melamine, hexaethoxymethyl melamine and the like are included.
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044
 式(6-1)中、R62、R63、R64、R65、R66及びR67の一つがアリール基の場合はR62、R63、R64及びR65の一つが-CH2OR68基を表し、R62、R63、R64、R65、R66及びR67の残りは互いに独立に、水素原子又は-CH2OR68基を表し、ここにR68は水素原子又はアルキル基を表す。 In Formula (6-1), when one of R 62 , R 63 , R 64 , R 65 , R 66 and R 67 is an aryl group, one of R 62 , R 63 , R 64 and R 65 is —CH 2 Represents an OR 68 group, the rest of R 62 , R 63 , R 64 , R 65 , R 66 and R 67 independently of each other represents a hydrogen atom or a —CH 2 OR 68 group, wherein R 68 represents a hydrogen atom or Represents an alkyl group.
 また、一般式(6)に相当するグアナミン系化合物、すなわち一般式(6)中のR61がアリールである化合物には、テトラメチロールベンゾグアナミン、テトラメトキシメチルベンゾグアナミン、トリメトキシメチルベンゾグアナミン、テトラエトキシメチルベンゾグアナミンなどが包含される。 Further, the guanamine-based compound corresponding to the general formula (6), that is, the compound in which R 61 in the general formula (6) is aryl, includes tetramethylolbenzoguanamine, tetramethoxymethylbenzoguanamine, trimethoxymethylbenzoguanamine, and tetraethoxymethylbenzoguanamine. Are included.
 さらに、メチロール基又はメチロールアルキルエーテル基を有する架橋剤を用いることもできる。以下にその例を挙げる。
 2,6-ビス(ヒドロキシメチル)-4-メチルフェノール、4-tert-ブチル-2,6-ビス(ヒドロキシメチル)フェノール、5-エチル-1,3-ビス(ヒドロキシメチル)ペルヒドロ-1,3,5-トリアジン-2-オン(通称N-エチルジメチロールトリアゾン)又はそのジメチルエーテル体、ジメチロールトリメチレン尿素又はそのジメチルエーテル体、3,5-ビス(ヒドロキシメチル)ペルヒドロ-1,3,5-オキサジアジン-4-オン(通称ジメチロールウロン)又はそのジメチルエーテル体、テトラメチロールグリオキザールジウレイン又はそのテトラメチルエーテル体。
Further, a cross-linking agent having a methylol group or a methylol alkyl ether group can be used. An example is given below.
2,6-bis(hydroxymethyl)-4-methylphenol, 4-tert-butyl-2,6-bis(hydroxymethyl)phenol, 5-ethyl-1,3-bis(hydroxymethyl)perhydro-1,3 ,5-Triazin-2-one (commonly called N-ethyldimethyloltriazone) or its dimethyl ether compound, dimethyloltrimethylene urea or its dimethyl ether compound, 3,5-bis(hydroxymethyl)perhydro-1,3,5- Oxadiazin-4-one (commonly called dimethylolurone) or its dimethyl ether body, tetramethylol glyoxaldiurene or its tetramethyl ether body.
 なお、これら架橋剤は1種を単独で用いても、2種以上を組み合わせて使用してもよい。架橋剤を用いる際の量は、感光性着色組成物の全固形分中に0.1~15質量%が好ましく、特に好ましくは0.5~10質量%である。 Note that these crosslinking agents may be used alone or in combination of two or more. The amount of the crosslinking agent used is preferably 0.1 to 15% by mass, and particularly preferably 0.5 to 10% by mass, based on the total solid content of the photosensitive coloring composition.
 (6)メルカプト化合物
 重合促進剤として、また、硬化物表面の硬化性向上、表面粗度向上のため、メルカプト化合物を添加することも可能である。
 メルカプト化合物としては、芳香族環を有するメルカプト基含有化合物と脂肪族系のメルカプト基含有化合物が挙げられる。
(6) Mercapto compound It is also possible to add a mercapto compound as a polymerization accelerator, and for improving the curability and surface roughness of the surface of the cured product.
Examples of the mercapto compound include a mercapto group-containing compound having an aromatic ring and an aliphatic mercapto group-containing compound.
 芳香族環を有するメルカプト基含有化合物としては、光硬化性の観点から、下記一般式(1-3)で表される化合物が好適に用いられる。 As the mercapto group-containing compound having an aromatic ring, a compound represented by the following general formula (1-3) is preferably used from the viewpoint of photocurability.
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
 式(1-3)中、Zは-O-、-S-又は-NH-を表し、R61、R62、R63、及びR64は各々独立に、水素原子又は1価の置換基を表す。
 これらのうち、光硬化性の観点から、Zは-S-又は-NH-が好ましく、-NH-がより好ましい。
 また、光硬化性の観点から、R61、R62、R63、及びR64は各々独立に、水素原子、炭素数1~4アルキル基又は炭素数1~4のアルコキシ基が好ましく、水素原子がより好ましい。
In formula (1-3), Z represents —O—, —S— or —NH—, and R 61 , R 62 , R 63 , and R 64 each independently represent a hydrogen atom or a monovalent substituent. Represent
Of these, from the viewpoint of photocurability, Z is preferably —S— or —NH—, more preferably —NH—.
From the viewpoint of photocurability, R 61 , R 62 , R 63 , and R 64 are each independently preferably a hydrogen atom, a C 1-4 alkyl group or a C 1-4 alkoxy group, and a hydrogen atom. Is more preferable.
 具体的には、2-メルカプトベンゾチアゾール、2-メルカプトベンゾイミダゾール、2-メルカプトベンゾオキサゾール、3-メルカプト-1,2,4-トリアゾール、2-メルカプト-4(3H)-キナゾリン、β-メルカプトナフタレン、1,4-ジメチルメルカプトベンゼン等の芳香族環を有するメルカプト基含有化合物が挙げられ、テーパー角の観点から、2-メルカプトベンゾチアゾール、2-メルカプトベンゾイミダゾールが好ましい。 Specifically, 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 3-mercapto-1,2,4-triazole, 2-mercapto-4(3H)-quinazoline, β-mercaptonaphthalene Examples thereof include mercapto group-containing compounds having an aromatic ring such as 1,4-dimethylmercaptobenzene, and 2-mercaptobenzothiazole and 2-mercaptobenzimidazole are preferable from the viewpoint of taper angle.
 一方で脂肪族系のメルカプト基含有化合物としては、光硬化性の観点から、へキサンジチオール、デカンジチオール、又は下記一般式(1-4)で表される化合物が好適に用いられる。 On the other hand, as the aliphatic mercapto group-containing compound, hexanedithiol, decanedithiol, or the compound represented by the following general formula (1-4) is preferably used from the viewpoint of photocurability.
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
 式(1-4)中、mは0~4の整数、nは2~4の整数を表す。R71及びR72は各々独立に、水素原子又は炭素数1~4のアルキル基を表す。Xはn価の基を表す。 In formula (1-4), m represents an integer of 0 to 4 and n represents an integer of 2 to 4. R 71 and R 72 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. X represents an n-valent group.
 前記一般式(1-4)において、光硬化性の観点から、mは1又は2であることが好ましい。また、光硬化性の観点から、nは3又は4であることが好ましく、4がより好ましい。
 また、R71及びR72のアルキル基としては、光硬化性の観点から、炭素数1~3のものが好ましい。光硬化性の観点から、R71及びR72のうちの少なくとも一方、例えば、R72は水素原子であることが好ましく、この場合において、R71は水素原子又は炭素数1~3のアルキル基であることが好ましい。
In the general formula (1-4), m is preferably 1 or 2 from the viewpoint of photocurability. From the viewpoint of photocurability, n is preferably 3 or 4, and more preferably 4.
The alkyl group for R 71 and R 72 is preferably one having 1 to 3 carbon atoms from the viewpoint of photocurability. From the viewpoint of photocurability, at least one of R 71 and R 72 , for example, R 72 is preferably a hydrogen atom, and in this case, R 71 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. It is preferable to have.
 nが2である場合、光硬化性の観点から、Xはエーテル結合及び/又は枝分かれ部を有してもよい炭素数1~6のアルキレン基が好ましい。光硬化性の観点から、中でも炭素数1~6のアルキレン基がより好ましく、炭素数4のアルキレン基がさらに好ましい。 When n is 2, X is preferably an alkylene group having 1 to 6 carbon atoms, which may have an ether bond and/or a branched portion, from the viewpoint of photocurability. From the viewpoint of photocurability, an alkylene group having 1 to 6 carbon atoms is more preferable, and an alkylene group having 4 carbon atoms is further preferable.
 nが3である場合、光硬化性の観点から、Xは下記一般式(1-5)又は(1-6)で表される構造であることが好ましい。 When n is 3, X is preferably a structure represented by the following general formula (1-5) or (1-6) from the viewpoint of photocurability.
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
 式(1-5)中、R73は水素原子、炭素数1~6のアルキル基、又はメチロール基を表す。R73の中でも、光硬化性の観点から、エチル基が好ましい。 In formula (1-5), R 73 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a methylol group. Among R 73 , an ethyl group is preferable from the viewpoint of photocurability.
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
 式(1-6)中、R74は炭素数1~4のアルキレン基を表す。R74の中でも、光硬化性の観点から、エチレン基が好ましい。 In formula (1-6), R 74 represents an alkylene group having 1 to 4 carbon atoms. Among R 74 , an ethylene group is preferable from the viewpoint of photocurability.
 一方で、nが4である場合、Xは下記一般式(1-7)で表される構造であることが好ましい。 On the other hand, when n is 4, X preferably has a structure represented by the following general formula (1-7).
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
 具体的には、ブタンジオールビス(3-メルカプトプロピオネート)、ブタンジオールビスチオグリコレート、エチレングリコールビス(3-メルカプトプロピオネート)、エチレングリコールビスチオグリコレート、トリメチロールプロパントリス(3-メルカプトプロピオネート)、トリメチロールプロパントリスチオグリコレート、トリスヒドロキシエチルトリスチオプロピオネート、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)、ペンタエリスリトールトリス(3-メルカプトプロピオネート)、ブタンジオールビス(3-メルカプトブチレート)、エチレングリコールビス(3-メルカプトブチレート)、トリメチロールプロパントリス(3-メルカプトブチレート)、ペンタエリスリトールテトラキス(3-メルカプトブチレート)、ペンタエリスリトールトリス(3-メルカプトブチレート)、1,3,5-トリス(3-メルカプトブチルオキシエチル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン等が挙げられる。 Specifically, butanediol bis(3-mercaptopropionate), butanediol bisthioglycolate, ethylene glycol bis(3-mercaptopropionate), ethylene glycol bisthioglycolate, trimethylolpropane tris(3- Mercaptopropionate), trimethylolpropane tristhioglycolate, trishydroxyethyltristhiopropionate, pentaerythritol tetrakis(3-mercaptopropionate), pentaerythritol tris(3-mercaptopropionate), butanediol bis (3-mercaptobutyrate), ethylene glycol bis(3-mercaptobutyrate), trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate) Rate), 1,3,5-tris(3-mercaptobutyloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, and the like.
 このうち、トリメチロールプロパントリス(3-メルカプトプロピオネート)、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)、ペンタエリスリトールトリス(3-メルカプトプロピオネート)、トリメチロールプロパントリス(3-メルカプトブチレート)、ペンタエリスリトールテトラキス(3-メルカプトブチレート)、ペンタエリスリトールトリス(3-メルカプトブチレート)、1,3,5-トリス(3-メルカプトブチルオキシエチル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオンが好ましく、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)、ペンタエリスリトールテトラキス(3-メルカプトブチレート)がより好ましい。 Of these, trimethylolpropane tris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tris (3-mercaptopropionate), trimethylolpropane tris (3-mercaptobutyrate) ), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), 1,3,5-tris(3-mercaptobutyloxyethyl)-1,3,5-triazine-2, 4,6(1H,3H,5H)-trione is preferable, and pentaerythritol tetrakis(3-mercaptopropionate) and pentaerythritol tetrakis(3-mercaptobutyrate) are more preferable.
 これらは種々のものを、1種を単独で、或いは2種以上を混合して使用できる。 Various types of these can be used alone or in combination of two or more.
 これらの中でも、光硬化性の観点から、2-メルカプトベンゾチアゾール、2-メルカプトベンゾイミダゾール、及び2-メルカプトベンゾオキサゾールからなる群から選択された1以上と、光重合開始剤とを組み合わせて、光重合開始剤系として使用することが好適である。例えば、2-メルカプトベンゾチアゾールを用いてもよく、2-メルカプトベンゾイミダゾールを用いてもよく、2-メルカプトベンゾチアゾールと2-メルカプトベンゾイミダゾールとを併用して用いてもよい。
 また、光硬化性の観点から、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)、及びペンタエリスリトールテトラキス(3-メルカプトブチレート)からなる群から選択された1以上を用いることが好ましい。
Among these, from the viewpoint of photocurability, one or more selected from the group consisting of 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, and 2-mercaptobenzoxazole is combined with a photopolymerization initiator to form a photopolymerization initiator. It is preferably used as a polymerization initiator system. For example, 2-mercaptobenzothiazole may be used, 2-mercaptobenzimidazole may be used, or 2-mercaptobenzothiazole and 2-mercaptobenzimidazole may be used in combination.
From the viewpoint of photocurability, it is preferable to use one or more selected from the group consisting of pentaerythritol tetrakis(3-mercaptopropionate) and pentaerythritol tetrakis(3-mercaptobutyrate).
 さらに、特に光硬化性の観点から、芳香族環を有するメルカプト基含有化合物と脂肪族系のメルカプト基含有化合物を併用して使用することが好適である。これは、開口部の幅が狭いマスクを用いることで露光時の回折によって単位面積あたりの照度が低くなり、線幅が太い場合に比べて酸素阻害の影響を受けやすく、表面硬化性が低くなる傾向があるからである。 Further, particularly from the viewpoint of photocurability, it is preferable to use a mercapto group-containing compound having an aromatic ring and an aliphatic mercapto group-containing compound in combination. This is because when a mask with a narrow opening is used, the illuminance per unit area becomes low due to diffraction during exposure, and it is more susceptible to oxygen inhibition than when the line width is thick, and the surface curability becomes low. Because there is a tendency.
 特に、(c)光重合開始剤としてヘキサアリールビイミダゾール系光重合開始剤を用いた場合には、芳香族環を有するメルカプト基含有化合物と脂肪族系のメルカプト基含有化合物を併用して使用することが好適である。一方で、アセトフェノン系光重合開始剤を用いた場合には、脂肪族系のメルカプト基含有化合物の単独使用でも十分に効果が得られる傾向がある。 In particular, when a hexaarylbiimidazole-based photopolymerization initiator is used as the (c) photopolymerization initiator, a mercapto group-containing compound having an aromatic ring and an aliphatic mercapto group-containing compound are used in combination. Is preferred. On the other hand, when the acetophenone-based photopolymerization initiator is used, the effect tends to be sufficiently obtained even when the aliphatic mercapto group-containing compound is used alone.
 例えば、2-メルカプトベンゾチアゾール、2-メルカプトベンゾイミダゾール、及び2-メルカプトベンゾオキサゾールよりなる群から選択された1以上と、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)、ペンタエリスリトールテトラキス(3-メルカプトブチレート)よりなる群から選択された1以上と、光重合開始剤とを組み合わせて用いることが好ましい。 For example, one or more selected from the group consisting of 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, and 2-mercaptobenzoxazole, pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (3-mercapto). It is preferable to use one or more selected from the group consisting of butyrate) and a photopolymerization initiator in combination.
 (7)重合禁止剤
 形状制御の観点から、重合禁止剤を含有させてもよい。
 重合禁止剤としては、ハイドロキノン、ハイドロキノンモノメチルエーテル、メチルヒドロキノン、メトキシフェノール、2,6-ジ-tert-ブチル-4-クレゾール(BHT)などが挙げられる。これらの中でも形状制御の観点から、2,6-ジ-tert-ブチル-4-クレゾールが好ましい。また人体への安全性の観点から、ハイドロキノンモノメチルエーテル、メチルヒドロキノンが好ましい。
 重合禁止剤は、1種又は2種以上を含有させてもよい。(b)アルカリ可溶性樹脂を製造する際に、当該樹脂中に重合禁止剤が含まれることがあり、それを本発明の重合禁止剤として用いてもよいし、樹脂中に重合禁止剤の他に、それと同一、又は異なる重合禁止剤を感光性着色組成物製造時に添加してもよい。
(7) Polymerization inhibitor From the viewpoint of shape control, a polymerization inhibitor may be contained.
Examples of the polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, methylhydroquinone, methoxyphenol, 2,6-di-tert-butyl-4-cresol (BHT) and the like. Among these, 2,6-di-tert-butyl-4-cresol is preferable from the viewpoint of shape control. Further, from the viewpoint of safety to human body, hydroquinone monomethyl ether and methylhydroquinone are preferable.
The polymerization inhibitor may contain one kind or two or more kinds. (B) When an alkali-soluble resin is produced, the resin may contain a polymerization inhibitor, which may be used as the polymerization inhibitor of the present invention. The same or different polymerization inhibitor may be added during the production of the photosensitive coloring composition.
<感光性着色組成物中の成分配合量>
 本発明の感光性着色組成物において、(b)アルカリ可溶性樹脂の含有割合は特に限定されないが、全固形分中に通常5質量%以上、好ましくは10質量%以上、より好ましくは15質量%以上、さらに好ましくは20質量%以上、特に好ましくは25質量%以上であり、通常80質量%以下、好ましくは70質量%以下、より好ましくは60質量%以下、さらに好ましくは50質量%以下、よりさらに好ましくは40質量%以下、特に好ましくは35質量%以下である。例えば、5~80質量%が好ましく、5~70質量%がより好ましく、10~60質量%がさらに好ましく、15~50質量%がよりさらに好ましく、20~40質量%が特に好ましく、25~35質量%がとりわけ好ましい。(b)アルカリ可溶性樹脂の含有割合を前記下限値以上とすることで、現像溶解性が向上する傾向がある。また前記上限値以下とすることで、機械的特性が向上する傾向がある。
<Amount of Components in Photosensitive Coloring Composition>
In the photosensitive coloring composition of the present invention, the content ratio of the (b) alkali-soluble resin is not particularly limited, but is usually 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more based on the total solid content. , More preferably 20 mass% or more, particularly preferably 25 mass% or more, usually 80 mass% or less, preferably 70 mass% or less, more preferably 60 mass% or less, more preferably 50 mass% or less, even more It is preferably 40% by mass or less, and particularly preferably 35% by mass or less. For example, it is preferably 5 to 80% by mass, more preferably 5 to 70% by mass, further preferably 10 to 60% by mass, further preferably 15 to 50% by mass, particularly preferably 20 to 40% by mass, and 25 to 35% by mass. Mass% is especially preferred. When the content ratio of the alkali-soluble resin (b) is not less than the above lower limit, the developing solubility tends to be improved. Further, when the content is not more than the upper limit, the mechanical properties tend to be improved.
 (c)光重合開始剤の含有割合は特に限定されないが、全固形分中に通常0.1質量%以上、好ましくは0.5質量%以上、より好ましくは1質量%以上、さらに好ましくは1.5質量%以上、通常15質量%以下、好ましくは10質量%以下、より好ましくは8質量%以下、さらに好ましくは6質量%以下、特に好ましくは4質量%以下である。例えば、0.1~15質量%が好ましく、0.1~10質量%がより好ましく、0.5~8質量%がさらに好ましく、1~6質量%が特に好ましく、1.5~4質量%がとりわけ好ましい。(c)光重合開始剤の含有割合を前記下限値以上とすることで光硬化性が高まり、表面粗度が向上する傾向があり、前記上限値以下とすることで現像溶解性が向上する傾向がある。 The content ratio of (c) the photopolymerization initiator is not particularly limited, but is usually 0.1% by mass or more, preferably 0.5% by mass or more, more preferably 1% by mass or more, further preferably 1% by mass based on the total solid content. The amount is 0.5% by mass or more, usually 15% by mass or less, preferably 10% by mass or less, more preferably 8% by mass or less, further preferably 6% by mass or less, and particularly preferably 4% by mass or less. For example, 0.1 to 15% by mass is preferable, 0.1 to 10% by mass is more preferable, 0.5 to 8% by mass is further preferable, 1 to 6% by mass is particularly preferable, 1.5 to 4% by mass. Are particularly preferred. (C) When the content ratio of the photopolymerization initiator is not less than the lower limit value, photocurability is increased, and the surface roughness tends to be improved, and when it is not more than the upper limit value, the developing solubility is improved. There is.
 (c)光重合開始剤と共に重合促進剤を用いる場合、重合促進剤の含有割合は、本発明の感光性着色組成物の全固形分中に、好ましくは0.05質量%以上、通常10質量%以下、好ましくは5質量%以下、例えば、0.05~10質量%、好ましくは0.05~5質量%である。また、重合促進剤は、(c)光重合開始剤100質量部に対して通常0.1~50質量部、好ましくは0.1~20質量部の割合で用いる。重合促進剤の含有割合を前記下限値以上とすることで、露光光線に対する感度の低下を抑制できる傾向があり、前記上限値以下とすることで未露光部分の現像液に対する溶解性の低下を抑制し、現像不良を抑制できる傾向がある。 (C) When a polymerization accelerator is used together with the photopolymerization initiator, the content ratio of the polymerization accelerator is preferably 0.05% by mass or more, and usually 10% by mass in the total solid content of the photosensitive coloring composition of the present invention. % Or less, preferably 5% by mass or less, for example, 0.05 to 10% by mass, preferably 0.05 to 5% by mass. The polymerization accelerator is usually used in a proportion of 0.1 to 50 parts by mass, preferably 0.1 to 20 parts by mass, relative to 100 parts by mass of the (c) photopolymerization initiator. By setting the content ratio of the polymerization accelerator to the lower limit value or more, there is a tendency that it is possible to suppress the decrease in sensitivity to exposure light, and by setting the content ratio to the upper limit value or less, it is possible to suppress the decrease in solubility in the developer of the unexposed portion. However, development failure tends to be suppressed.
 また、(c)光重合開始剤と共に増感色素を用いる場合、増感色素の含有割合は、本発明の感光性着色組成物の全固形分中に、好ましくは0.1質量%以上、より好ましくは0.2質量%以上、さらに好ましくは0.3質量%以上、また、好ましくは5質量%以下、より好ましくは4質量%以下、さらに好ましくは3質量%以下である。例えば、0.1~5質量%が好ましく、0.2~4質量%がより好ましく、0.3~3質量%がさらに好ましい。前記下限値以上とすることで光硬化性が高まり、表面粗度が向上する傾向があり、また、前記上限値以下とすることで現像溶解性が向上する傾向がある。 When a sensitizing dye is used together with the (c) photopolymerization initiator, the content ratio of the sensitizing dye is preferably 0.1% by mass or more, based on the total solid content of the photosensitive coloring composition of the present invention. It is preferably 0.2% by mass or more, more preferably 0.3% by mass or more, preferably 5% by mass or less, more preferably 4% by mass or less, still more preferably 3% by mass or less. For example, 0.1 to 5 mass% is preferable, 0.2 to 4 mass% is more preferable, and 0.3 to 3 mass% is further preferable. When it is at least the above lower limit, photocurability will be enhanced and surface roughness will tend to be improved, and when it is at most the above upper limit, development solubility will tend to be improved.
 (d)エチレン性不飽和化合物の含有割合は、本発明の感光性着色組成物の全固形分中に、通常1質量%以上、好ましくは5質量%以上、より好ましくは10質量%以上、さらに好ましくは20質量%以上、よりさらに好ましくは30質量%以上、特に好ましくは40質量%以上、最も好ましくは50質量%以上であり、また、通常80質量%以下、好ましくは70質量%以下、より好ましくは65質量%以下である。例えば、1~80質量%が好ましく、5~80質量%がより好ましく、10~70質量%がさらに好ましく、20~70質量%がよりさらに好ましく、30~70質量%が特に好ましく、40~65質量%がとりわけ好ましく、50~65質量%以上が最も好ましい。(d)エチレン性不飽和化合物の含有割合を前記下限値以上とすることで機械的特性が向上する傾向があり、また、前記上限値以下とすることで、現像溶解性が向上する傾向がある。 The content ratio of the (d) ethylenically unsaturated compound is usually 1% by mass or more, preferably 5% by mass or more, more preferably 10% by mass or more, based on the total solid content of the photosensitive coloring composition of the present invention. It is preferably 20% by mass or more, more preferably 30% by mass or more, particularly preferably 40% by mass or more, most preferably 50% by mass or more, and usually 80% by mass or less, preferably 70% by mass or less, It is preferably 65 mass% or less. For example, 1 to 80% by weight is preferable, 5 to 80% by weight is more preferable, 10 to 70% by weight is further preferable, 20 to 70% by weight is further preferable, 30 to 70% by weight is particularly preferable, and 40 to 65%. Mass% is particularly preferable, and 50 to 65 mass% or more is the most preferable. (D) When the content ratio of the ethylenically unsaturated compound is not less than the lower limit value, mechanical properties tend to be improved, and when it is not more than the upper limit value, the developing solubility tends to be improved. ..
 一方で、(d)エチレン性不飽和化合物100質量部に対する(b)アルカリ可溶性樹脂の含有割合は特に限定されないが、10質量部以上が好ましく、20質量部以上がより好ましく、30質量部以上がさらに好ましく、40質量部以上が特に好ましく、また、通常150質量部以下、120質量部以下が好ましく、100質量部以下がより好ましく、70質量部以下がさらに好ましい。例えば、10~150質量部が好ましく、20~120質量部がより好ましく、30~100質量部がさらに好ましく、40~70質量部が特に好ましい。前記下限値以上とすることで現像溶解性が向上する傾向があり、また、前記上限値以下とすることで機械的特性が良好となる傾向がある。 On the other hand, the content ratio of the (b) alkali-soluble resin to 100 parts by mass of the (d) ethylenically unsaturated compound is not particularly limited, but is preferably 10 parts by mass or more, more preferably 20 parts by mass or more, and 30 parts by mass or more. It is more preferably 40 parts by mass or more, particularly preferably 150 parts by mass or less, 120 parts by mass or less, more preferably 100 parts by mass or less, and further preferably 70 parts by mass or less. For example, it is preferably 10 to 150 parts by mass, more preferably 20 to 120 parts by mass, further preferably 30 to 100 parts by mass, particularly preferably 40 to 70 parts by mass. When it is at least the lower limit, the developing solubility tends to be improved, and when it is at most the upper limit, the mechanical properties tend to be good.
 なお、本発明の感光性着色組成物は、(e)溶剤を使用することで、その全固形分の含有割合が通常5質量%以上、好ましくは10質量%以上、より好ましくは15質量%以上、また通常50質量%以下、好ましくは30質量%以下、より好ましくは25質量%以下となるように調液される。例えば、5~50質量%が好ましく、10~30質量%がより好ましく、15~25質量%がさらに好ましい。 In the photosensitive coloring composition of the present invention, by using the solvent (e), the content ratio of the total solid content is usually 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more. Further, the solution is usually adjusted to 50% by mass or less, preferably 30% by mass or less, and more preferably 25% by mass or less. For example, 5 to 50 mass% is preferable, 10 to 30 mass% is more preferable, and 15 to 25 mass% is further preferable.
 本発明の感光性着色組成物が(f)分散剤を含む場合、(f)分散剤の含有割合は感光性着色組成物の全固形分中に通常0.5質量%以上であり、1質量%以上が好ましく、1.5質量%以上がより好ましく、また通常30質量%以下、20質量%以下が好ましく、15質量%以下がより好ましく、10質量%以下がさらに好ましく、5質量%以下が特に好ましい。例えば、0.5~30質量%が好ましく、0.5~20質量%がより好ましく、1~15質量%がさらに好ましく、1~10質量%がよりさらに好ましく、1.5~5質量%が特に好ましい。(f)分散剤の含有割合を前記下限値以上とすることで、保存安定性が向上する傾向があり、前記上限値以下とすることで表示信頼性が向上する傾向がある。 When the photosensitive coloring composition of the present invention contains the (f) dispersant, the content ratio of the (f) dispersing agent is usually 0.5% by mass or more based on the total solid content of the photosensitive coloring composition, and 1% by mass. % Or more, more preferably 1.5% by mass or more, usually 30% by mass or less, preferably 20% by mass or less, more preferably 15% by mass or less, further preferably 10% by mass or less, and 5% by mass or less. Particularly preferred. For example, 0.5 to 30% by mass is preferable, 0.5 to 20% by mass is more preferable, 1 to 15% by mass is further preferable, 1 to 10% by mass is further more preferable, 1.5 to 5% by mass is Particularly preferred. (F) When the content ratio of the dispersant is not less than the lower limit value, storage stability tends to be improved, and when it is not more than the upper limit value, display reliability tends to be improved.
 また、(a)着色剤100質量部に対する(f)分散剤の含有割合は、通常5質量部以上、10質量部以上がより好ましく、20質量部以上がさらに好ましく、通常50質量部以下、特に40質量部以下であることが好ましい。例えば、5~50質量部が好ましく、10~50質量部がより好ましく、20~40質量部がさらに好ましい。(f)分散剤の含有割合を前記下限値以上とすることで、保存安定性が向上する傾向があり、前記上限値以下とすることで表示信頼性が向上する傾向がある。 Further, the content ratio of the (f) dispersant to 100 parts by mass of the (a) colorant is usually 5 parts by mass or more, more preferably 10 parts by mass or more, further preferably 20 parts by mass or more, and usually 50 parts by mass or less, particularly It is preferably 40 parts by mass or less. For example, 5 to 50 parts by mass is preferable, 10 to 50 parts by mass is more preferable, and 20 to 40 parts by mass is further preferable. (F) When the content ratio of the dispersant is not less than the lower limit value, storage stability tends to be improved, and when it is not more than the upper limit value, display reliability tends to be improved.
 密着向上剤を用いる場合、その含有割合は、感光性着色組成物の全固形分中に通常0.1質量%以上であり、0.2質量%以上が好ましく、0.5質量%以上がより好ましく、また通常30質量%以下、20質量%以下が好ましく、10質量%以下がより好ましく、5質量%以下がさらに好ましく、3質量%以下が特に好ましい。例えば、0.1~30質量%が好ましく、0.2~20質量%がより好ましく、0.2~10質量%がさらに好ましく、0.5~5質量%がよりさらに好ましく、0.5~3質量%が特に好ましい。密着向上剤の含有割合を前記下限値以上とすることで、密着性が向上する傾向があり、前記上限値以下とすることで残渣が低減する傾向がある。 When an adhesion improver is used, its content is usually 0.1% by mass or more, preferably 0.2% by mass or more, more preferably 0.5% by mass or more, based on the total solid content of the photosensitive coloring composition. It is preferably, usually 30% by mass or less, 20% by mass or less, more preferably 10% by mass or less, further preferably 5% by mass or less, particularly preferably 3% by mass or less. For example, 0.1 to 30% by mass is preferable, 0.2 to 20% by mass is more preferable, 0.2 to 10% by mass is further preferable, 0.5 to 5% by mass is still more preferable, 0.5 to 5% by mass. 3% by weight is particularly preferred. When the content ratio of the adhesion improver is not less than the lower limit, the adhesion tends to be improved, and when it is not more than the upper limit, the residue tends to be reduced.
 また、界面活性剤を用いる場合、その含有割合は、感光性着色組成物の全固形分中に通常0.001~10質量%、好ましくは0.005~1質量%、さらに好ましくは0.01~0.5質量%、最も好ましくは0.03~0.3質量%である。界面活性剤の含有割合を前記下限値以上とすることで塗布膜の平滑性、均一性が発現しやすい傾向があり、前記上限値以下とすることで塗布膜の平滑性、均一性が発現しやすく、他の特性の悪化も抑制できる傾向がある。 When a surfactant is used, its content is usually 0.001 to 10% by mass, preferably 0.005 to 1% by mass, and more preferably 0.01% by mass based on the total solid content of the photosensitive coloring composition. To 0.5 mass %, and most preferably 0.03 to 0.3 mass %. By setting the content ratio of the surfactant to the lower limit or more, the smoothness and uniformity of the coating film tend to be easily expressed, and by setting the content ratio of the surfactant or less to the smoothness and uniformity of the coating film. It tends to be easy and can suppress deterioration of other characteristics.
 メルカプト化合物を用いる場合、その含有割合は、感光性着色組成物の全固形分中に、通常0.1質量%以上であり、0.2質量%以上が好ましく、0.5質量%以上がより好ましく、また通常30質量%以下、20質量%以下が好ましく、10質量%以下がより好ましく、5質量%以下がさらに好ましく、3質量%以下が特に好ましい。例えば、0.1~30質量%が好ましく、0.2~20質量%がより好ましく、0.2~10質量%がさらに好ましく、0.5~5質量%がよりさらに好ましく、0.5~3質量%が特に好ましい。メルカプト化合物の含有割合を前記下限値以上とすることで、光硬化性が高まり、表面粗度が向上する傾向があり、前記上限値以下とすることで保存安定性が向上する傾向がある。 When a mercapto compound is used, its content is usually 0.1% by mass or more, preferably 0.2% by mass or more, more preferably 0.5% by mass or more, based on the total solid content of the photosensitive coloring composition. It is preferably, usually 30% by mass or less, 20% by mass or less, more preferably 10% by mass or less, further preferably 5% by mass or less, particularly preferably 3% by mass or less. For example, 0.1 to 30% by mass is preferable, 0.2 to 20% by mass is more preferable, 0.2 to 10% by mass is further preferable, 0.5 to 5% by mass is still more preferable, 0.5 to 5% by mass. 3% by weight is particularly preferred. When the content ratio of the mercapto compound is at least the lower limit value, photocurability is increased, and the surface roughness tends to be improved, and when it is at most the upper limit value, storage stability tends to be improved.
 重合禁止剤を用いる場合、その含有割合は、感光性着色組成物の全固形分中に、通常0.05質量%以上であり、0.1質量%以上が好ましく、0.2質量%以上がより好ましく、また通常2質量%以下、1質量%以下が好ましく、0.8質量%以下がより好ましく、0.7質量%以下がさらに好ましく、0.5質量%以下が特に好ましい。例えば、0.05~2質量%が好ましく、0.05~1質量%がより好ましく、0.1~0.8質量%がさらに好ましく、0.1~0.7質量%がよりさらに好ましく、0.2~0.5質量%が特に好ましい。重合禁止剤の含有割合を前記下限値以上とすることで、解像度が高くなる傾向があり、前記上限値以下とすることで硬化性が高くなる傾向がある。 When a polymerization inhibitor is used, its content is usually 0.05% by mass or more, preferably 0.1% by mass or more, and 0.2% by mass or more, based on the total solid content of the photosensitive coloring composition. It is more preferably, usually 2% by mass or less, 1% by mass or less, more preferably 0.8% by mass or less, further preferably 0.7% by mass or less, particularly preferably 0.5% by mass or less. For example, 0.05 to 2 mass% is preferable, 0.05 to 1 mass% is more preferable, 0.1 to 0.8 mass% is further preferable, 0.1 to 0.7 mass% is further preferable, 0.2 to 0.5 mass% is particularly preferable. When the content ratio of the polymerization inhibitor is not less than the lower limit value, the resolution tends to be high, and when it is not more than the upper limit value, the curability tends to be high.
<感光性着色組成物の物性>
 本発明の感光性着色組成物は、着色スペーサー形成用に好適に使用することができ、着色スペーサーとして用いるとの観点からは、その塗膜の膜厚1μm当たりの光学濃度(OD)が高い方が好ましい。本発明の感光性着色組成物を硬化して得られる着色スペーサー単独では、0.1以上であることが好ましく、0.15以上であることがより好ましく、0.2以上であることがさらに好ましく、0.25以上であることがよりさらに好ましい。ここで光学濃度(OD)は後述する方法にて測定した値である。
<Physical properties of photosensitive coloring composition>
The photosensitive coloring composition of the present invention can be suitably used for forming a colored spacer, and from the viewpoint of being used as a colored spacer, one having a higher optical density (OD) per 1 μm of film thickness of the coating film Is preferred. The color spacer alone obtained by curing the photosensitive coloring composition of the present invention is preferably 0.1 or more, more preferably 0.15 or more, and further preferably 0.2 or more. , 0.25 or more is more preferable. Here, the optical density (OD) is a value measured by the method described later.
<感光性着色組成物の製造方法>
 本発明の感光性着色組成物は、常法に従って製造される。
 通常、(a)着色剤は、予めペイントコンディショナー、サンドグラインダー、ボールミル、ロールミル、ストーンミル、ジェットミル、ホモジナイザー等を用いて分散処理することが好ましい。分散処理により(a)着色剤が微粒子化されるため、感光性着色組成物の塗布特性が向上する。
<Method for producing photosensitive coloring composition>
The photosensitive coloring composition of the present invention is produced according to a conventional method.
Usually, it is preferable that the colorant (a) is previously subjected to a dispersion treatment using a paint conditioner, a sand grinder, a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer or the like. Since the colorant (a) is made into fine particles by the dispersion treatment, the coating properties of the photosensitive coloring composition are improved.
 分散処理は、通常、(a)着色剤、(e)溶剤、及び(f)分散剤、必要に応じて(b)アルカリ可溶性樹脂の一部又は全部を併用した系にて行うことが好ましい(以下、分散処理に供する混合物、及び該処理にて得られた組成物を「インク」又は「顔料分散液」と称することがある)。特に(f)分散剤として高分子分散剤を用いると、得られたインク及び感光性着色組成物の経時の増粘が抑制される(分散安定性に優れる)ので好ましい。
 このように、感光性着色組成物を製造する工程において、(a)着色剤、(e)溶剤、及び(f)分散剤を少なくとも含有する顔料分散液を製造することが好ましい。顔料分散液に用いることができる(a)着色剤、(e)溶剤、及び(f)分散剤としては、それぞれ感光性着色組成物に用いることができるものとして記載したものを好ましく採用することができる。
Generally, the dispersion treatment is preferably performed in a system in which (a) a colorant, (e) a solvent, (f) a dispersant, and optionally (b) an alkali-soluble resin are used in combination or in part ( Hereinafter, the mixture to be subjected to the dispersion treatment and the composition obtained by the treatment may be referred to as "ink" or "pigment dispersion". In particular, it is preferable to use a polymer dispersant as the (f) dispersant, because the obtained ink and the photosensitive coloring composition are prevented from increasing in viscosity over time (excellent in dispersion stability).
Thus, in the step of producing the photosensitive coloring composition, it is preferable to produce a pigment dispersion liquid containing at least (a) a colorant, (e) a solvent, and (f) a dispersant. As the (a) colorant, (e) solvent, and (f) dispersant that can be used in the pigment dispersion, those described as those that can be used in the photosensitive coloring composition are preferably adopted. it can.
 なお、感光性着色組成物に配合する全成分を含有する液に対して分散処理を行った場合、分散処理時に生じる発熱のため、高反応性の成分が変性する可能性がある。従って、(c)光重合開始剤や(d)エチレン性不飽和化合物を含まない系にて分散処理を行うことが好ましい。
 サンドグラインダーで(a)着色剤を分散させる場合には、0.1~8mm程度の粒子径のガラスビーズ又はジルコニアビーズが好ましく用いられる。分散処理条件は、温度は通常0℃から100℃であり、好ましくは室温から80℃の範囲である。分散時間は液の組成及び分散処理装置のサイズ等により適正時間が異なる傾向があり、適宜調節すればよい。顔料分散液又は感光性着色組成物を基板に塗布した際の20度鏡面光沢度(JIS Z8741)が50~300の範囲となるように、インクの光沢を制御することが分散の目安である。前記下限値以上とすることで、分散処理が十分でなく荒い顔料((a)着色剤)粒子の残存を抑制でき、現像性、密着性、解像性等を十分なものとしやすい傾向がある。また、前記上限値以下とすることで、顔料が破砕して超微粒子が多数生じるのを抑制でき、分散安定性を良好なものとすることができる傾向がある。
When the dispersion treatment is performed on the liquid containing all the components to be mixed in the photosensitive coloring composition, the highly reactive component may be modified due to the heat generated during the dispersion treatment. Therefore, it is preferable to perform the dispersion treatment in a system that does not contain (c) a photopolymerization initiator or (d) an ethylenically unsaturated compound.
When the (a) colorant is dispersed with a sand grinder, glass beads or zirconia beads having a particle diameter of about 0.1 to 8 mm are preferably used. Regarding the dispersion treatment condition, the temperature is usually 0° C. to 100° C., preferably room temperature to 80° C. The dispersion time tends to vary depending on the composition of the liquid, the size of the dispersion treatment device, etc., and may be adjusted appropriately. The standard of dispersion is to control the gloss of the ink so that the 20-degree specular gloss (JIS Z8741) when the pigment dispersion or the photosensitive coloring composition is applied to the substrate is in the range of 50 to 300. When the content is at least the lower limit value, the dispersion treatment is not sufficient, and it is possible to suppress the residual of the coarse pigment ((a) colorant) particles, and it is easy to make the developability, adhesion, resolution, etc. sufficient. .. Further, when the content is not more than the upper limit, it is possible to prevent the pigment from crushing and to generate a large number of ultrafine particles, which tends to improve the dispersion stability.
 また、インク中に分散した顔料の分散粒径は通常0.03~0.3μmであり、動的光散乱法等により測定される。
 次に、上記分散処理により得られたインクと、感光性着色組成物中に含まれる、上記の他の成分を混合し、均一な溶液とする。感光性着色組成物の製造工程においては、微細なゴミが液中に混じることが多いため、得られた感光性着色組成物はフィルター等により濾過処理することが望ましい。
The dispersed particle size of the pigment dispersed in the ink is usually 0.03 to 0.3 μm, which is measured by a dynamic light scattering method or the like.
Next, the ink obtained by the above dispersion treatment is mixed with the other components contained in the photosensitive coloring composition to form a uniform solution. In the manufacturing process of the photosensitive coloring composition, fine dust is often mixed in the liquid, and thus the obtained photosensitive coloring composition is preferably filtered by a filter or the like.
[硬化物]
 本発明の硬化物は、本発明の感光性着色組成物を硬化させることで得られる。感光性着色組成物を硬化してなる硬化物は、着色スペーサーとして好適に用いることができる。
[Cured product]
The cured product of the present invention is obtained by curing the photosensitive coloring composition of the present invention. A cured product obtained by curing the photosensitive coloring composition can be suitably used as a colored spacer.
[着色スペーサー]
 次に、本発明の硬化物から構成される、本発明の着色スペーサーについて、その製造方法に従って説明する。
[Colored spacer]
Next, the colored spacer of the present invention, which is composed of the cured product of the present invention, will be described according to its manufacturing method.
 (1)支持体
 着色スペーサーを形成するための支持体としては、適度の強度があれば、その材質は特に限定されるものではない。主に透明基板が使用されるが、材質としては、例えば、ポリエチレンテレフタレートなどのポリエステル系樹脂、ポリプロピレン、ポリエチレンなどのポリオレフィン系樹脂、ポリカーボネート、ポリメチルメタクリレート、ポリスルフォンなどの熱可塑性樹脂製シート、エポキシ樹脂、不飽和ポリエステル樹脂、ポリ(メタ)アクリル系樹脂などの熱硬化性樹脂シート、又は各種ガラスなどが挙げられる。この中でも、耐熱性の観点からガラス、耐熱性樹脂が好ましい。また、基板の表面にITO、IZO等の透明電極が成膜されている場合もある。透明基板以外では、TFTアレイ上に形成することも可能である。
(1) Support The support for forming the colored spacer is not particularly limited in its material as long as it has appropriate strength. Although transparent substrates are mainly used, examples of the material include polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, thermoplastic resin sheets such as polycarbonate, polymethylmethacrylate and polysulfone, and epoxy. Examples thereof include resins, unsaturated polyester resins, thermosetting resin sheets such as poly(meth)acrylic resins, and various glasses. Among these, glass and heat resistant resin are preferable from the viewpoint of heat resistance. In addition, a transparent electrode such as ITO or IZO may be formed on the surface of the substrate. Other than the transparent substrate, it can be formed on the TFT array.
 支持体には、接着性などの表面物性の改良のため、必要に応じ、コロナ放電処理、オゾン処理、シランカップリング剤や、ウレタン系樹脂などの各種樹脂の薄膜形成処理などを行ってもよい。
 透明基板の厚さは、通常0.05~10mm、好ましくは0.1~7mmの範囲とされる。また各種樹脂の薄膜形成処理を行う場合、その膜厚は、通常0.01~10μm、好ましくは0.05~5μmの範囲である。
In order to improve surface properties such as adhesiveness, the support may be subjected to corona discharge treatment, ozone treatment, silane coupling agent, thin film forming treatment of various resins such as urethane resin, etc., if necessary. ..
The thickness of the transparent substrate is usually 0.05 to 10 mm, preferably 0.1 to 7 mm. When a thin film forming treatment of various resins is performed, the film thickness is usually 0.01 to 10 μm, preferably 0.05 to 5 μm.
 (2)着色スペーサー
 本発明の感光性着色組成物は、公知のカラーフィルター用感光性着色組成物と同様の用途に使用することができるが、以下、着色スペーサーとして使用される場合について、その形成方法を説明する。
(2) Colored Spacer The photosensitive colored composition of the present invention can be used in the same applications as known photosensitive colored compositions for color filters, but in the following, when it is used as a colored spacer, its formation The method will be described.
 通常、着色スペーサーが設けられるべき支持体上に、感光性着色組成物を、塗布等の方法により膜状或いはパターン状に供給し、溶剤を乾燥させる。続いて、露光-現像を行うフォトリソグラフィー法などの方法によりパターン形成を行う。その後、必要により追露光や熱硬化処理を行うことにより、該支持体上に着色スペーサーが形成される。 Usually, a photosensitive coloring composition is supplied in a film form or a pattern form by a method such as coating on a support on which a coloring spacer is to be provided, and the solvent is dried. Subsequently, pattern formation is performed by a method such as a photolithography method of exposing and developing. Then, if necessary, additional exposure or heat curing treatment is performed to form a colored spacer on the support.
 (3)着色スペーサーの形成
 [1]基板への供給方法
 本発明の感光性着色組成物は、通常、溶剤に溶解或いは分散された状態で、支持体上へ供給される。その供給方法としては、従来公知の方法、例えば、スピナー法、ワイヤーバー法、フローコート法、ダイコート法、ロールコート法、スプレーコート法などによって行うことができる。また、インクジェット法や印刷法などにより、パターン状に供給されてもよい。中でも、ダイコート法によれば、塗布液の使用量が大幅に削減され、かつ、スピンコート法によった際に付着するミストなどの影響がない、異物発生が抑制されるなど、総合的な観点から好ましい。
(3) Formation of Colored Spacer [1] Method of Supplying to Substrate The photosensitive coloring composition of the present invention is usually supplied onto a support in a state of being dissolved or dispersed in a solvent. As the supply method, a conventionally known method such as a spinner method, a wire bar method, a flow coating method, a die coating method, a roll coating method, or a spray coating method can be used. Further, it may be supplied in a pattern by an inkjet method or a printing method. Among them, according to the die coating method, the usage amount of the coating liquid is significantly reduced, there is no influence of mist attached when the spin coating method is used, and the generation of foreign matter is suppressed. Is preferred.
 塗布量は用途により異なるが、例えば着色スペーサーの場合には、乾燥膜厚として、通常0.5μm~10μm、好ましくは1μm~9μm、特に好ましくは1μm~7μmの範囲である。また、乾燥膜厚或いは最終的に形成されたスペーサーの高さが、基板全域に渡って均一であることが重要である。ばらつきが大きい場合には、液晶パネルに表示斑等の欠陥が生ずる場合がある。 The coating amount varies depending on the use, but in the case of a colored spacer, for example, the dry film thickness is usually 0.5 μm to 10 μm, preferably 1 μm to 9 μm, and particularly preferably 1 μm to 7 μm. Further, it is important that the dry film thickness or the height of the finally formed spacer is uniform over the entire area of the substrate. If the variation is large, defects such as display spots may occur on the liquid crystal panel.
 ただし、本発明の感光性着色組成物を用いて、フォトリソグラフィー法により高さの異なる着色スペーサーを一括形成する場合は、最終的に形成された着色スペーサーの高さは異なるものとなる。 However, in the case of collectively forming colored spacers having different heights by the photolithography method using the photosensitive coloring composition of the present invention, the heights of the finally formed colored spacers are different.
 尚、基板としてはガラス基板など、公知の基板を使用することができる。また、基板表面は平面であることが好適である。 Note that a known substrate such as a glass substrate can be used as the substrate. Further, it is preferable that the surface of the substrate is flat.
 [2]乾燥方法
 基板上に感光性着色組成物を供給した後の乾燥は、ホットプレート、IRオーブン、コンベクションオーブンを使用した乾燥方法によることが好ましい。また、温度を高めず、減圧チャンバー内で乾燥を行う、減圧乾燥法を組み合わせてもよい。
[2] Drying Method Drying after supplying the photosensitive coloring composition onto the substrate is preferably performed by a drying method using a hot plate, an IR oven, or a convection oven. Further, it is also possible to combine a reduced pressure drying method in which drying is performed in a reduced pressure chamber without raising the temperature.
 乾燥温度及び乾燥時間等の乾燥条件は、溶剤成分の種類、使用する乾燥機の性能などに応じて適宜選択することができる。通常は、40℃~130℃の温度で15秒~5分間の範囲で選ばれ、好ましくは50℃~110℃の温度で30秒~3分間の範囲で選ばれる。 The drying conditions such as the drying temperature and the drying time can be appropriately selected according to the type of solvent component, the performance of the dryer used, and the like. Usually, it is selected at a temperature of 40° C. to 130° C. for 15 seconds to 5 minutes, preferably at a temperature of 50° C. to 110° C. for 30 seconds to 3 minutes.
 [3]露光方法
 露光は、感光性着色組成物の塗布膜上に、ネガのマスクパターンを重ね、このマスクパターンを介し、紫外線又は可視光線の光源を照射して行う。露光マスクを用いて露光を行う場合には、露光マスクを感光性着色組成物の塗布膜に近接させる方法や、露光マスクを感光性着色組成物の塗布膜から離れた位置に配置し、該露光マスクを介した露光光を投影する方法によってもよい。また、マスクパターンを用いないレーザー光による走査露光方式によってもよい。この際、必要に応じ、酸素による光重合性層の感度の低下を防ぐため、脱酸素雰囲気下で行ったり、光重合性層上にポリビニルアルコール層などの酸素遮断層を形成した後に露光を行ったりしてもよい。
[3] Exposure Method The exposure is performed by superimposing a negative mask pattern on the coating film of the photosensitive coloring composition and irradiating a light source of ultraviolet rays or visible light through the mask pattern. In the case of performing exposure using an exposure mask, a method of bringing the exposure mask close to the coating film of the photosensitive coloring composition or disposing the exposure mask at a position distant from the coating film of the photosensitive coloring composition, A method of projecting exposure light through a mask may be used. Alternatively, a scanning exposure method using a laser beam that does not use a mask pattern may be used. At this time, if necessary, in order to prevent the sensitivity of the photopolymerizable layer from being lowered by oxygen, the treatment is performed in a deoxygenated atmosphere, or the exposure is performed after forming an oxygen barrier layer such as a polyvinyl alcohol layer on the photopolymerizable layer. You may
 本発明の好ましい態様として、フォトリソグラフィー法により高さの異なる着色スペーサーを同時に形成する場合は、例えば、遮光部(光透過率0%)と、複数の開口部として、平均光透過率の最も高い開口部(完全透過開口部)及び平均光透過率の低い開口部(中間透過開口部)を有する露光マスクを用いる。この方法により、中間透過開口部と完全透過開口部の平均光透過率の差、即ち露光量の差により、残膜率の差異を生じさせる。
 中間透過開口部は、例えば、微小な多角形の遮光ユニットを有するマトリックス状遮光パターンによって作成する方法等が知られている。また吸収体として、クロム系、モリブデン系、タングステン系、シリコン系などの材料の膜によって、光透過率を制御し作成する方法等が知られている。
As a preferred embodiment of the present invention, when colored spacers having different heights are simultaneously formed by a photolithography method, for example, a light-shielding portion (light transmittance 0%) and a plurality of openings have the highest average light transmittance. An exposure mask having an opening (completely transmissive opening) and an opening having a low average light transmittance (intermediate transmissive opening) is used. By this method, a difference in average film transmittance between the intermediate transmission opening and the complete transmission opening, that is, a difference in exposure amount causes a difference in residual film rate.
For example, a method is known in which the intermediate transmission opening is formed by a matrix light-shielding pattern having minute polygonal light-shielding units. Further, there is known a method of controlling the light transmittance by using a film of a material such as a chromium-based material, a molybdenum-based material, a tungsten-based material, or a silicon-based material as the absorber.
 上記の露光に使用される光源は、特に限定されるものではない。光源としては、例えば、キセノンランプ、ハロゲンランプ、タングステンランプ、高圧水銀灯、超高圧水銀灯、メタルハライドランプ、中圧水銀灯、低圧水銀灯、カーボンアーク、蛍光ランプなどのランプ光源や、アルゴンイオンレーザー、YAGレーザー、エキシマレーザー、窒素レーザー、ヘリウムカドミニウムレーザー、青紫色半導体レーザー、近赤外半導体レーザーなどのレーザー光源などが挙げられる。特定の波長の光を照射して使用する場合には、光学フィルターを利用することもできる。 The light source used for the above exposure is not particularly limited. As the light source, for example, a lamp light source such as a xenon lamp, a halogen lamp, a tungsten lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a fluorescent lamp, an argon ion laser, a YAG laser, Laser light sources such as excimer lasers, nitrogen lasers, helium cadmium lasers, blue-violet semiconductor lasers, and near infrared semiconductor lasers can be used. An optical filter can also be used when irradiating and using the light of a specific wavelength.
 光学フィルターとしては、例えば薄膜で露光波長における光透過率を制御可能なタイプでもよく、その場合の材質としては、例えばCr化合物(Crの酸化物、窒化物、酸窒化物、フッ化物など)、MoSi、Si、W、Al等が挙げられる。 The optical filter may be, for example, a type that can control the light transmittance at an exposure wavelength with a thin film, and in that case, as a material thereof, for example, a Cr compound (Cr oxide, nitride, oxynitride, fluoride, etc.), MoSi, Si, W, Al etc. are mentioned.
 露光量としては、通常、1mJ/cm2以上、好ましくは5mJ/cm2以上、より好ましくは10mJ/cm2以上であり、通常300mJ/cm2以下、好ましくは200mJ/cm2以下、より好ましくは150mJ/cm2以下である。
 また、近接露光方式の場合には、露光対象とマスクパターンとの距離としては、通常10μm以上、好ましくは50μm以上、より好ましくは75μm以上であり、通常500μm以下、好ましくは400μm以下、より好ましくは300μm以下である。
Energy of exposure generally, 1 mJ / cm 2 or more, preferably 5 mJ / cm 2 or more, more preferably 10 mJ / cm 2 or more, usually 300 mJ / cm 2 or less, preferably 200 mJ / cm 2 or less, more preferably It is 150 mJ/cm 2 or less.
In the case of the proximity exposure method, the distance between the exposure target and the mask pattern is usually 10 μm or more, preferably 50 μm or more, more preferably 75 μm or more, and usually 500 μm or less, preferably 400 μm or less, more preferably It is 300 μm or less.
 [4]現像方法
 上記の露光を行った後、アルカリ性化合物の水溶液、又は有機溶剤を用いる現像によって、基板上に画像パターンを形成することができる。この水溶液には、さらに界面活性剤、有機溶剤、緩衝剤、錯化剤、染料又は顔料を含ませることができる。
[4] Development Method After the above exposure, an image pattern can be formed on the substrate by development using an aqueous solution of an alkaline compound or an organic solvent. The aqueous solution may further contain a surfactant, an organic solvent, a buffer, a complexing agent, a dye or a pigment.
 アルカリ性化合物としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム、ケイ酸ナトリウム、ケイ酸カリウム、メタケイ酸ナトリウム、リン酸ナトリウム、リン酸カリウム、リン酸水素ナトリウム、リン酸水素カリウム、リン酸二水素ナトリウム、リン酸二水素カリウム、水酸化アンモニウムなどの無機アルカリ性化合物や、モノ-、ジ-又はトリエタノールアミン、モノ-、ジ-又はトリメチルアミン、モノ-、ジ-又はトリエチルアミン、モノ-又はジイソプロピルアミン、n-ブチルアミン、モノ-、ジ-又はトリイソプロパノールアミン、エチレンイミン、エチレンジイミン、テトラメチルアンモニウムヒドロキシド(TMAH)、コリンなどの有機アルカリ性化合物が挙げられる。これらのアルカリ性化合物は、2種以上の混合物であってもよい。 As the alkaline compound, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, potassium phosphate. Inorganic alkaline compounds such as sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate and ammonium hydroxide, and mono-, di- or triethanolamine, mono-, di- or trimethylamine Organic alkalinity such as mono-, di- or triethylamine, mono- or diisopropylamine, n-butylamine, mono-, di- or triisopropanolamine, ethyleneimine, ethylenediimine, tetramethylammonium hydroxide (TMAH), choline Compounds. These alkaline compounds may be a mixture of two or more kinds.
 上記界面活性剤としては、例えば、ポリオキシエチレンアルキルエーテル類、ポリオキシエチレンアルキルアリールエーテル類、ポリオキシエチレンアルキルエステル類、ソルビタンアルキルエステル類、モノグリセリドアルキルエステル類などのノニオン系界面活性剤;アルキルベンゼンスルホン酸塩類、アルキルナフタレンスルホン酸塩類、アルキル硫酸塩類、アルキルスルホン酸塩類、スルホコハク酸エステル塩類などのアニオン性界面活性剤;アルキルベタイン類、アミノ酸類などの両性界面活性剤、が挙げられる。 Examples of the surfactant include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkylaryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, monoglyceride alkyl esters; alkylbenzene sulfone. Examples thereof include anionic surfactants such as acid salts, alkylnaphthalene sulfonates, alkyl sulfates, alkyl sulfonates, and sulfosuccinate salts; amphoteric surfactants such as alkyl betaines and amino acids.
 有機溶剤としては、例えば、イソプロピルアルコール、ベンジルアルコール、エチルセロソルブ、ブチルセロソルブ、フェニルセロソルブ、プロピレングリコール、ジアセトンアルコールなどが挙げられる。有機溶剤は、単独でも水溶液と併用して使用できる。 Examples of the organic solvent include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, diacetone alcohol and the like. The organic solvent may be used alone or in combination with the aqueous solution.
 現像処理の条件は特に制限はなく、通常、現像温度は10~50℃の範囲、中でも15~45℃、特に好ましくは20~40℃で、現像方法は、浸漬現像法、スプレー現像法、ブラシ現像法、超音波現像法などのいずれかの方法によることができる。 The conditions of the developing treatment are not particularly limited, and the developing temperature is usually in the range of 10 to 50° C., in particular 15 to 45° C., and particularly preferably 20 to 40° C. The developing method is an immersion developing method, a spray developing method or a brush. Any method such as a developing method and an ultrasonic developing method can be used.
 [5]追露光及び熱硬化処理
 現像の後の基板には、必要により上記の露光方法と同様な方法により追露光を行ってもよく、また熱硬化処理を行ってもよい。この際の熱硬化処理条件は、温度は100℃~280℃の範囲、好ましくは150℃~250℃の範囲で選ばれ、時間は5分間~60分間の範囲で選ばれる。
[5] Additional exposure and heat curing treatment The substrate after development may be subjected to additional exposure by a method similar to the above-mentioned exposure method, if necessary, or may be subjected to heat curing treatment. The heat curing treatment conditions at this time are selected such that the temperature is in the range of 100° C. to 280° C., preferably in the range of 150° C. to 250° C., and the time is selected in the range of 5 minutes to 60 minutes.
 本発明の着色スペーサーの大きさや形状等は、これを適用するカラーフィルターの仕様等によって適宜調整されるが、本発明の感光性着色組成物は、特に、フォトリソグラフィー法によりスペーサーとサブスペーサーの高さの異なる着色スペーサーを同時に形成するのに有用であり、その場合、スペーサーの高さは通常1~7μm程度であり、サブスペーサーは、スペーサーよりも通常0.2~1.5μm程度低い高さを有する。 The size, shape, etc. of the colored spacer of the present invention are appropriately adjusted depending on the specifications of the color filter to which the colored spacer is applied, and the photosensitive colored composition of the present invention is particularly high in height of the spacer and the sub spacer by a photolithography method. It is useful for simultaneously forming colored spacers having different heights, in which case the height of the spacer is usually about 1 to 7 μm, and the height of the sub spacer is usually about 0.2 to 1.5 μm lower than that of the spacer. Have.
[画像表示装置]
 本発明の画像表示装置は、本発明の着色スペーサーを備える。
 例えば、上述した本発明の着色スペーサーを有するカラーフィルターと、液晶駆動側基板とを貼り合わせて液晶セルを形成し、形成した液晶セルに液晶を注入することで、本発明の着色スペーサーを備えた、液晶表示装置等の本発明の画像表示装置を製造することができる。
[Image display device]
The image display device of the present invention includes the colored spacer of the present invention.
For example, a color filter having the above-described colored spacer of the present invention and a liquid crystal driving side substrate are bonded together to form a liquid crystal cell, and liquid crystal is injected into the formed liquid crystal cell to provide the colored spacer of the present invention. The image display device of the present invention such as a liquid crystal display device can be manufactured.
 次に、実施例及び比較例を挙げて本発明をより具体的に説明するが、本発明はその要旨を超えない限り以下の実施例に限定されるものではない。
 以下の実施例及び比較例で用いた感光性着色組成物の構成成分は次の通りである。
Next, the present invention will be described more specifically with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples unless it exceeds the gist.
The components of the photosensitive coloring composition used in the following examples and comparative examples are as follows.
 <アルカリ可溶性樹脂-I>
 プロピレングリコールモノメチルエーテルアセテート145質量部を窒素置換しながら攪拌し、120℃に昇温した。ここにスチレン10質量部、グリシジルメタクリレート85質量部およびトリシクロデカン骨格を有するモノメタクリレート(日立化成社製FA-513M)66質量部を滴下し、2,2’-アゾビス-2-メチルブチロニトリル8.5質量部を3時間かけて滴下し、さらに90℃で2時間攪拌し続けた。次に反応容器内を空気に変え、アクリル酸43質量部にトリスジメチルアミノメチルフェノール0.7質量部及びハイドロキノン0.12質量部を投入し、100℃で12時間反応を続けた。その後、テトラヒドロ無水フタル酸(THPA)56質量部、トリエチルアミン0.7質量部を加え、100℃で3.5時間反応させた。こうして得られたアルカリ可溶性樹脂-IのGPCにより測定したポリスチレン換算の重量平均分子量Mwは8400、酸価は80mgKOH/gであった。
<Alkali-soluble resin-I>
145 parts by mass of propylene glycol monomethyl ether acetate was stirred while substituting with nitrogen, and the temperature was raised to 120°C. 10 parts by mass of styrene, 85 parts by mass of glycidyl methacrylate, and 66 parts by mass of monomethacrylate (FA-513M manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton were added dropwise to 2,2′-azobis-2-methylbutyronitrile. 8.5 parts by mass was added dropwise over 3 hours, and stirring was continued at 90° C. for 2 hours. Next, the inside of the reaction vessel was changed to air, 0.7 parts by mass of trisdimethylaminomethylphenol and 0.12 parts by mass of hydroquinone were added to 43 parts by mass of acrylic acid, and the reaction was continued at 100° C. for 12 hours. Then, 56 parts by mass of tetrahydrophthalic anhydride (THPA) and 0.7 parts by mass of triethylamine were added, and the mixture was reacted at 100° C. for 3.5 hours. The weight average molecular weight Mw in terms of polystyrene measured by GPC of the thus obtained alkali-soluble resin-I was 8400, and the acid value was 80 mgKOH/g.
 <アルカリ可溶性樹脂-II>
 プロピレングリコールモノメチルエーテルアセテート124質量部を窒素置換しながら攪拌し、120℃に昇温した。ここにスチレン4質量部、グリシジルメタクリレート132質量部およびトリシクロデカン骨格を有するモノメタクリレート(日立化成社製FA-513M)4質量部を滴下し、2,2’-アゾビス-2-メチルブチロニトリル7.2質量部を3時間かけて滴下し、さらに90℃で2時間攪拌し続けた。次に反応容器内を空気に変え、アクリル酸67質量部にトリスジメチルアミノメチルフェノール0.6質量部及びハイドロキノン0.12質量部を投入し、100℃で12時間反応を続けた。その後、テトラヒドロ無水フタル酸(THPA)15質量部、トリエチルアミン0.6質量部を加え、100℃で3.5時間反応させた。こうして得られたアルカリ可溶性樹脂-IIのGPCにより測定したポリスチレン換算の重量平均分子量Mwは9000、酸価は24mgKOH/g、二重結合当量は260g/molであった。
<Alkali-soluble resin-II>
124 parts by mass of propylene glycol monomethyl ether acetate was stirred while substituting with nitrogen, and the temperature was raised to 120°C. 4 parts by mass of styrene, 132 parts by mass of glycidyl methacrylate, and 4 parts by mass of monomethacrylate (FA-513M manufactured by Hitachi Chemical Co., Ltd.) having a tricyclodecane skeleton were added dropwise to 2,2′-azobis-2-methylbutyronitrile. 7.2 parts by mass was added dropwise over 3 hours, and stirring was continued at 90° C. for 2 hours. Next, the inside of the reaction vessel was changed to air, 0.6 parts by mass of trisdimethylaminomethylphenol and 0.12 parts by mass of hydroquinone were added to 67 parts by mass of acrylic acid, and the reaction was continued at 100° C. for 12 hours. Then, 15 parts by mass of tetrahydrophthalic anhydride (THPA) and 0.6 parts by mass of triethylamine were added, and the reaction was carried out at 100° C. for 3.5 hours. The thus obtained alkali-soluble resin-II had a polystyrene-equivalent weight average molecular weight Mw measured by GPC of 9000, an acid value of 24 mgKOH/g, and a double bond equivalent of 260 g/mol.
 <分散剤-I>
 ビックケミー社製「BYK-LPN21116」(側鎖に4級アンモニウム塩基及び3級アミノ基を有するAブロックと、4級アンモニウム塩基及び3級アミノ基を有さないBブロックからなる、アクリル系A-Bブロック共重合体。アミン価は70mgKOH/g。酸価は1mgKOH/g以下。)
 分散剤-IのAブロック中には、下記式(1a)及び(2a)の繰り返し単位が含まれ、Bブロック中には下記式(3a)の繰り返し単位が含まれる。分散剤-Iの全繰り返し単位に占める下記式(1a)、(2a)、及び(3a)の繰り返し単位の含有割合はそれぞれ11.1モル%、22.2モル%、6.7モル%である。
<Dispersant-I>
"BYK-LPN21116" manufactured by BYK-Chemie (Acrylic AB consisting of an A block having a quaternary ammonium salt group and a tertiary amino group in the side chain and a B block having no quaternary ammonium salt group and a tertiary amino group) Block copolymer having an amine value of 70 mgKOH/g and an acid value of 1 mgKOH/g or less.)
The A block of Dispersant-I contains repeating units of the following formulas (1a) and (2a), and the B block contains repeating units of the following formula (3a). The content ratio of the repeating units of the following formulas (1a), (2a) and (3a) in all the repeating units of the dispersant-I was 11.1 mol%, 22.2 mol% and 6.7 mol% respectively. is there.
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
 <溶剤-I>
 PGMEA:プロピレングリコールモノメチルエーテルアセテート
 <溶剤-II>
 MB:3-メトキシブタノール
<Solvent-I>
PGMEA: Propylene glycol monomethyl ether acetate <Solvent-II>
MB: 3-methoxybutanol
 <光重合開始剤-I>
 黒金化成社製 2,2’-ビス(o-クロロフェニル)-4,5,4’,5’-テトラフェニル-1,2-ビイミダゾール
 <光重合開始剤-II>
 BASF社製 Irgacure(登録商標)369
 <メルカプト化合物>
 東京化成社製 2-メルカプトベンゾチアゾール
<Photopolymerization initiator-I>
2,2'-bis(o-chlorophenyl)-4,5,4',5'-tetraphenyl-1,2-biimidazole manufactured by Kurogane Chemical Co., Ltd. <Photopolymerization Initiator-II>
Irgacure (registered trademark) 369 manufactured by BASF
<Mercapto compound>
2-mercaptobenzothiazole manufactured by Tokyo Kasei
 <光重合性モノマー>
 日本化薬社製 DPHA(ジペンタエリスリトールヘキサアクリレート)
<Photopolymerizable monomer>
Nippon Kayaku Co., Ltd. DPHA (dipentaerythritol hexaacrylate)
 <界面活性剤>
 DIC社製 メガファック F-554
 <添加剤-I>
 日本化薬社製 KAYAMER(登録商標) PM-21(メタクリロイル基含有ホスフェート)
 <添加剤-II>
 精工化学社製 メチルヒドロキノン
<Surfactant>
DIC Megafac F-554
<Additive-I>
KAYAMER (registered trademark) PM-21 (methacryloyl group-containing phosphate) manufactured by Nippon Kayaku Co., Ltd.
<Additive-II>
Seiko Chemical Co., Ltd. Methylhydroquinone
 <顔料分散液1~7の調製>
 表1に記載の顔料、分散剤、アルカリ可溶性樹脂、及び溶剤を、表1に記載の質量比となるように混合して混合液を得た。なお表1中の溶剤の配合割合には、分散剤及びアルカリ可溶性樹脂由来の溶剤の量も含まれる。
 この混合液をペイントシェーカーにより25~45℃の範囲で3時間分散処理を行った。ビーズとしては、0.5mmφのジルコニアビーズを用い、分散液の2.5倍の質量を加えた。分散終了後、フィルターによりビーズと分散液を分離して、顔料分散液1~7を調製した。
<Preparation of Pigment Dispersions 1 to 7>
The pigment, the dispersant, the alkali-soluble resin, and the solvent described in Table 1 were mixed in a mass ratio shown in Table 1 to obtain a mixed solution. The blending ratio of the solvent in Table 1 includes the amounts of the dispersant and the solvent derived from the alkali-soluble resin.
This mixed solution was subjected to a dispersion treatment in the range of 25 to 45° C. for 3 hours with a paint shaker. As the beads, zirconia beads having a diameter of 0.5 mm were used, and a mass 2.5 times that of the dispersion liquid was added. After the dispersion was completed, the beads and the dispersion were separated by a filter to prepare pigment dispersions 1 to 7.
Figure JPOXMLDOC01-appb-T000051
Figure JPOXMLDOC01-appb-T000051
<感光性着色組成物1~13の調製>
[実施例1~8及び比較例1~5]
 上記調製した顔料分散液1~7を用いて、全固形分中の各成分の固形分の比率が表2又は表3の配合割合となるように各成分を加え、さらに全固形分の含有割合が19質量%となるようにPGMEAを加え、攪拌、溶解させて、感光性着色組成物1~13を調製した。得られた各感光性着色組成物を用いて、後述する方法で評価を行った。
<Preparation of Photosensitive Coloring Compositions 1 to 13>
[Examples 1 to 8 and Comparative Examples 1 to 5]
Using the pigment dispersions 1 to 7 prepared above, the respective components were added so that the solid content ratio of the respective components in the total solid content would be the compounding ratio of Table 2 or Table 3, and the content ratio of the total solid content was further added. Was added so that the content of PGMEA was 19% by mass, and the mixture was stirred and dissolved to prepare photosensitive coloring compositions 1 to 13. Using each of the obtained photosensitive coloring compositions, evaluation was performed by the method described below.
Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000053
Figure JPOXMLDOC01-appb-T000053
<単位膜厚当たりの光学濃度(単位OD値)の測定>
 ガラス基板上に感光性着色組成物を加熱硬化後の膜厚が1.5μmとなるようにスピンコーターにて塗布し、1分間減圧乾燥した後に、ホットプレートで90℃にて100秒間乾燥した。得られた塗膜に、マスクを使用せず、365nmでの強度が40mW/cm2である紫外線を用いて、露光量が60mJ/cm2となるよう全面露光処理を施した。
 続いて、0.05質量%の水酸化カリウムと0.08質量%のノニオン性界面活性剤(花王社製「A-60」)を含有する水溶液からなる現像液を用い、25℃において水圧0.15MPaのシャワー現像を100秒間施した後、純水にて現像を停止し、水洗スプレーにて洗浄した。当該基板をオーブン中、230℃で20分間加熱硬化させることで、レジスト硬化膜基板を得た。
<Measurement of optical density (unit OD value) per unit film thickness>
The photosensitive coloring composition was applied onto a glass substrate with a spin coater so that the film thickness after heat curing would be 1.5 μm, dried under reduced pressure for 1 minute, and then dried on a hot plate at 90° C. for 100 seconds. The obtained coating film was subjected to the whole surface exposure treatment using an ultraviolet ray having an intensity at 365 nm of 40 mW/cm 2 without using a mask so that the exposure amount was 60 mJ/cm 2 .
Then, using a developing solution consisting of an aqueous solution containing 0.05% by mass of potassium hydroxide and 0.08% by mass of a nonionic surfactant (“A-60” manufactured by Kao Corporation), the water pressure at 0° C. is 0. After shower development of 0.15 MPa for 100 seconds, development was stopped with pure water, and washing was performed with a water spray. The substrate was heated and cured at 230° C. for 20 minutes in an oven to obtain a resist cured film substrate.
 得られたレジスト硬化膜基板の光学濃度(OD)を透過濃度計X-Rite社製 361T(V)により測定し、膜厚を日立ハイテクノロジー社製走査型白色干渉顕微鏡 VS1530により測定した。光学濃度(OD)及び膜厚から、単位膜厚当たりの光学濃度(単位OD値、OD/μm)を算出し、表4に示した。なお、OD値は遮光能力を示す数値であり、数値が大きいほど高遮光性であることを示す。 The optical density (OD) of the obtained resist-cured film substrate was measured by a transmission densitometer X-Rite 361T (V), and the film thickness was measured by Hitachi High-Technology scanning white light interference microscope VS1530. The optical density (unit OD value, OD/μm) per unit film thickness was calculated from the optical density (OD) and film thickness, and shown in Table 4. The OD value is a numerical value indicating the light-shielding ability, and the larger the numerical value, the higher the light-shielding property.
<粗度の評価>
 露光量を10mJ/cm2とした以外は、前記レジスト硬化膜基板と同様にして、粗度評価用基板を得た。
 得られた基板の10μm×10μmの範囲の表面の算術平均表面粗さ(Sa)を日立ハイテクノロジー社製走査型白色干渉顕微鏡 VS1530により測定し、以下の基準で粗度の評価を行った。測定結果と評価結果を表4に示した。なお、測定モードはFocusモードとし、対物レンズの倍率は50倍、測定光の中心波長は520nmとした。
 Saは、表面形状曲面と平均面で囲まれた部分の体積を測定面積で割ったものであり、数値が小さいほど平滑性が高いことを示す。
<Roughness evaluation>
A substrate for roughness evaluation was obtained in the same manner as the resist cured film substrate, except that the exposure amount was 10 mJ/cm 2 .
The arithmetic average surface roughness (Sa) of the surface of the obtained substrate in the range of 10 μm×10 μm was measured with a scanning white interference microscope VS1530 manufactured by Hitachi High Technology Co., Ltd., and the roughness was evaluated according to the following criteria. The measurement results and evaluation results are shown in Table 4. The measurement mode was Focus mode, the magnification of the objective lens was 50 times, and the center wavelength of the measurement light was 520 nm.
Sa is the volume of the portion surrounded by the surface shape curved surface and the average surface divided by the measurement area, and the smaller the value, the higher the smoothness.
(粗度の評価基準)
  A:2nm以下
  B:2nm超過
(Roughness evaluation criteria)
A: 2 nm or less B: 2 nm or more
<弾性復元率の評価>
 基板として表面にITO膜を形成したガラス基板を用い、露光時に20μm開口(直径20μmの円形開口)を有するマスクを用い、露光ギャップ150μmとした以外は前記レジスト硬化膜基板と同様にして、着色スペーサーを得た。
 得られた着色スペーサーの弾性復元率を以下の手順で測定した。フィッシャースコープH-100(フィッシャーインストルメンツ社製)を用いて、測定温度23℃、直径50μmの平面圧子を使用し、一定速度(5mN/sec)で着色スペーサーに荷重を加え、荷重が300mNに達したところで5秒間保持し、続いて同速度にて除荷を行い、荷重-変位曲線を得た。この荷重-変位曲線より、最大変位H[max]、最終変位H[Last](荷重が0mNになり5秒間保持した後の変位)を測定した。次いで、下記式により弾性復元率を算出し、以下の基準で評価した。その結果を表4に示した。
<Evaluation of elastic recovery rate>
A colored spacer was used in the same manner as the resist-cured film substrate except that a glass substrate having an ITO film formed on the surface was used as a substrate, a mask having a 20 μm opening (circular opening having a diameter of 20 μm) was used during exposure, and the exposure gap was 150 μm. Got
The elastic recovery rate of the obtained colored spacer was measured by the following procedure. Using Fisher Scope H-100 (manufactured by Fisher Instruments), using a flat indenter with a measurement temperature of 23° C. and a diameter of 50 μm, a load is applied to the colored spacer at a constant speed (5 mN/sec), and the load reaches 300 mN. After that, it was held for 5 seconds, and then unloaded at the same speed to obtain a load-displacement curve. From this load-displacement curve, the maximum displacement H[max] and the final displacement H[Last] (displacement after the load became 0 mN and held for 5 seconds) were measured. Next, the elastic recovery rate was calculated by the following formula and evaluated according to the following criteria. The results are shown in Table 4.
 弾性復元率(%)={(最大変位H[max]-最終変位H[Last])/最大変位H[max]}×100 Elastic recovery rate (%)={(maximum displacement H[max]-final displacement H[Last])/maximum displacement H[max]}×100
(弾性復元率の評価基準)
  A:95%以上
  B:95%未満
(Evaluation criteria for elastic recovery rate)
A: 95% or more B: less than 95%
Figure JPOXMLDOC01-appb-T000054
Figure JPOXMLDOC01-appb-T000054
<耐光性の評価>
 前記レジスト硬化膜基板と同様にして、耐光性評価用基板を得た。
 得られた基板の波長450nmにおける吸光度を、日立ハイテクノロジー社製分光光度計U-3500を用いて測定した。
 次に、前記基板を気温25℃、相対湿度50%RHの環境下で、波長450nmでの強度が19mW/cm2の光を、膜面側から500時間照射した。その基板の波長450nmにおける吸光度を同様に測定した。下記式により波長450nmの吸光度の変化率を算出し、以下の基準で評価し、結果を表5に示した。
<Evaluation of light resistance>
A light resistance evaluation substrate was obtained in the same manner as the resist cured film substrate.
The absorbance of the obtained substrate at a wavelength of 450 nm was measured using a spectrophotometer U-3500 manufactured by Hitachi High Technology Co., Ltd.
Next, the substrate was irradiated with light having an intensity of 19 mW/cm 2 at a wavelength of 450 nm for 500 hours in an environment of a temperature of 25° C. and a relative humidity of 50% RH. The absorbance of the substrate at a wavelength of 450 nm was similarly measured. The rate of change in absorbance at a wavelength of 450 nm was calculated by the following formula, evaluated according to the following criteria, and the results are shown in Table 5.
 吸光度の変化率(%)={(照射前の450nmの吸光度-照射後の450nmの吸光度)/照射前の450nmの吸光度}×100 Change rate of absorbance (%)={(absorbance at 450 nm before irradiation-absorbance at 450 nm after irradiation)/absorbance at 450 nm before irradiation}×100
(評価の基準)
  A:20%未満
  B:20%以上
(Evaluation criteria)
A: less than 20% B: 20% or more
Figure JPOXMLDOC01-appb-T000055
Figure JPOXMLDOC01-appb-T000055
 表4に示した実施例1~8から明らかなように、着色剤の含有割合が全固形分中に2~20質量%であり、紫色顔料を含み、着色剤中の紫色顔料の含有割合が50質量%以上である感光性着色組成物を用いることで、表面粗度及び機械的特性に優れた着色スペーサーを形成可能であることがわかる。 As is clear from Examples 1 to 8 shown in Table 4, the content ratio of the colorant is 2 to 20% by mass in the total solid content, the content of the purple pigment is contained in the colorant, and the content ratio of the purple pigment in the colorant is It can be seen that it is possible to form a colored spacer having excellent surface roughness and mechanical properties by using the photosensitive coloring composition of 50% by mass or more.
 実施例1と比較例1との比較から、着色剤中の紫色顔料の含有割合を50質量%以上とすることで、表面粗度が優れることがわかる。紫色顔料は分散性が高く、硬化膜中に均一に分散することから、紫色顔料を多く含有することで、現像時の溶解性が均一になるからであると考えられる。 From the comparison between Example 1 and Comparative Example 1, it can be seen that the surface roughness is excellent when the content ratio of the purple pigment in the colorant is 50% by mass or more. It is considered that since the purple pigment has high dispersibility and is uniformly dispersed in the cured film, the solubility at the time of development becomes uniform by containing a large amount of the purple pigment.
 また、実施例1と比較例2との比較から、着色剤の含有割合が、感光性着色組成物の全固形分中20質量%以下であれば、機械的特性が良好となることがわかる。これは、着色剤の含有割合が高くなりすぎなくすることで、アルカリ可溶性樹脂やエチレン性不飽和化合物の含有割合を相対的に高く設定することができ、得られる着色スペーサーの架橋密度が高くなったからであると考えられる。 Further, from the comparison between Example 1 and Comparative Example 2, it can be seen that if the content ratio of the colorant is 20% by mass or less in the total solid content of the photosensitive coloring composition, the mechanical properties are good. This is because it is possible to set the content ratio of the alkali-soluble resin or the ethylenically unsaturated compound relatively high by preventing the content ratio of the colorant from becoming too high, and the crosslinking density of the obtained colored spacer becomes high. It is thought that it is because of it.
 なお、比較例3及び4との比較から明らかなように、着色剤の含有割合が、感光性着色組成物の全固形分中に2質量%未満の場合には、光学濃度が不十分であり、さらに、着色剤中の紫色顔料の含有割合に関わらず表面粗度が良好となっている。従って、着色剤の含有割合が、感光性着色組成物の全固形分中に2質量%以上とすることで光学濃度が良好になり、そして着色剤中の顔料の種類及び比率によっては表面粗度が不十分となる場合があることがわかる。 As is clear from a comparison with Comparative Examples 3 and 4, when the content ratio of the colorant is less than 2% by mass in the total solid content of the photosensitive coloring composition, the optical density is insufficient. Further, the surface roughness is good regardless of the content ratio of the purple pigment in the colorant. Therefore, when the content ratio of the colorant is 2% by mass or more based on the total solid content of the photosensitive coloring composition, the optical density is improved, and the surface roughness is increased depending on the kind and ratio of the pigment in the colorant. It can be seen that is sometimes insufficient.
 表5に示した実施例1及び5と比較例5の比較から、着色剤中の紫色顔料の含有割合を50質量%以上とすることで、耐光性が優れることがわかる。紫色顔料は、波長450nm付近の吸光度が低く、紫色顔料を多く含有することで、波長450nmの照射光に対する影響を受けにくいためと考えられる。 From the comparison between Examples 1 and 5 and Comparative Example 5 shown in Table 5, it can be seen that the light resistance is excellent when the content ratio of the purple pigment in the colorant is 50% by mass or more. It is considered that the violet pigment has a low absorbance around a wavelength of 450 nm, and contains a large amount of the violet pigment, so that it is less susceptible to the irradiation light having a wavelength of 450 nm.

Claims (9)

  1.  (a)着色剤、(b)アルカリ可溶性樹脂、(c)光重合開始剤、及び(d)エチレン性不飽和化合物を含有する感光性着色組成物であって、
     前記(a)着色剤の含有割合が、感光性着色組成物の全固形分中に2~20質量%であり、
     前記(a)着色剤が紫色顔料を含み、かつ、
     前記(a)着色剤中の前記紫色顔料の含有割合が50質量%以上であることを特徴とする感光性着色組成物。
    A photosensitive coloring composition containing (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, and (d) an ethylenically unsaturated compound,
    The content of the (a) colorant is 2 to 20% by mass based on the total solid content of the photosensitive coloring composition,
    The (a) colorant contains a purple pigment, and
    The photosensitive coloring composition, wherein the content of the purple pigment in the colorant (a) is 50% by mass or more.
  2.  前記紫色顔料が、C.I.ピグメントバイオレット29及びC.I.ピグメントバイオレット23からなる群から選ばれる少なくとも1種を含む、請求項1に記載の感光性着色組成物。 The above-mentioned purple pigment is C.I. I. Pigment Violet 29 and C.I. I. Pigment Violet 23, The photosensitive coloring composition of Claim 1 containing at least 1 sort(s) selected from the group which consists of.
  3.  前記(a)着色剤が、さらに橙色顔料を含む、請求項1又は2に記載の感光性着色組成物。 The photosensitive coloring composition according to claim 1 or 2, wherein the (a) colorant further contains an orange pigment.
  4.  前記(d)エチレン性不飽和化合物100質量部に対する前記(b)アルカリ可溶性樹脂の含有割合が150質量部以下である、請求項1~3のいずれか1項に記載の感光性着色組成物。 The photosensitive coloring composition according to any one of claims 1 to 3, wherein the content ratio of the (b) alkali-soluble resin to 150 parts by mass of the (d) ethylenically unsaturated compound is 150 parts by mass or less.
  5.  前記(c)光重合開始剤が、ヘキサアリールビイミダゾール化合物を含有する、請求項1~4のいずれか1項に記載の感光性着色組成物。 The photosensitive coloring composition according to any one of claims 1 to 4, wherein the photopolymerization initiator (c) contains a hexaarylbiimidazole compound.
  6.  着色スペーサー形成用である、請求項1~5のいずれか1項に記載の感光性着色組成物。 The photosensitive coloring composition according to any one of claims 1 to 5, which is for forming a colored spacer.
  7.  請求項1~6のいずれか1項に記載の感光性着色組成物を硬化して得られる硬化物。 A cured product obtained by curing the photosensitive coloring composition according to any one of claims 1 to 6.
  8.  請求項7に記載の硬化物から構成される着色スペーサー。 A colored spacer composed of the cured product according to claim 7.
  9.  請求項8に記載の着色スペーサーを備える画像表示装置。 An image display device provided with the colored spacer according to claim 8.
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