WO2020124705A1 - Procédé de préparation pour écran d'affichage, écran d'affichage et dispositif d'affichage - Google Patents

Procédé de préparation pour écran d'affichage, écran d'affichage et dispositif d'affichage Download PDF

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Publication number
WO2020124705A1
WO2020124705A1 PCT/CN2019/070931 CN2019070931W WO2020124705A1 WO 2020124705 A1 WO2020124705 A1 WO 2020124705A1 CN 2019070931 W CN2019070931 W CN 2019070931W WO 2020124705 A1 WO2020124705 A1 WO 2020124705A1
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WO
WIPO (PCT)
Prior art keywords
substrate
display panel
mask
black matrix
manufacturing
Prior art date
Application number
PCT/CN2019/070931
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English (en)
Chinese (zh)
Inventor
陈珍霞
陈黎暄
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Publication of WO2020124705A1 publication Critical patent/WO2020124705A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Definitions

  • the present invention relates to the field of semiconductor technology, and in particular to a method for manufacturing a display panel, a display panel, and a display device.
  • Contrast is defined as the ratio of white state to black state. So for the improvement of contrast, there are two key points, one is the brightness of the white state, and the other is the brightness of the black state.
  • the brightness of the white state can be improved by simple methods, such as increasing the brightness of the backlight, but this will increase energy consumption, increase the operating temperature, increase the problem of heat dissipation, and the cost will also rise. It can be seen that this method has many drawbacks ; On the other hand, by reducing the brightness of the black state to achieve the purpose of high contrast, reduce the brightness of the black state, but there is currently no effective implementation.
  • Embodiments of the present invention provide a preparation method of a display panel, a display panel, and a display device. While the cost and energy consumption are not increased, the contrast of the display panel is effectively improved.
  • the present application provides a method for manufacturing a display panel, the method including:
  • a second substrate is provided opposite to the first substrate
  • the step of patterning the black matrix film and forming a black matrix light-shielding layer pattern on the first substrate includes:
  • the line width of the black matrix light-shielding layer pattern is 3 ⁇ m.
  • the line width of the preset simulated intensity light mask is 1 to 4 ⁇ m.
  • the preset simulated light intensity mask is a combined mask formed by 1 to 3 masks.
  • the simulated light intensity mask includes a first mask, a second mask and a third mask arranged in order from left to right, and a first mask is arranged between the first mask and the second mask There is a gap, and a second gap is set between the second mask and the third mask.
  • the third photomask is rectangular, or the right side of the third photomask is zigzag, and the left side is linear.
  • the left side of the first photomask is zigzag, the right side is linear, or the first photomask is rectangular.
  • the distance between the first pitch and the second pitch is equal.
  • the present application provides a method for manufacturing a display panel, the method including:
  • a second substrate is provided opposite to the first substrate
  • a liquid crystal layer is provided between the first substrate and the second substrate.
  • the step of patterning the black matrix film and forming a black matrix light-shielding layer pattern on the first substrate includes:
  • the black matrix film is patterned to form a black matrix light-shielding layer pattern on the first substrate.
  • the line width of the preset simulated intensity light mask is 1 to 4 ⁇ m.
  • the preset simulated light intensity mask is a combined mask formed by 1 to 3 masks.
  • the simulated light intensity mask includes a first mask, a second mask and a third mask arranged in order from left to right, and a first mask is arranged between the first mask and the second mask There is a gap, and a second gap is set between the second mask and the third mask.
  • the third photomask is rectangular, or the right side of the third photomask is zigzag, and the left side is linear.
  • the left side of the first photomask is zigzag, the right side is linear, or the first photomask is rectangular.
  • the distance between the first pitch and the second pitch is equal.
  • the preset simulated light intensity mask is an independent mask, and both sides of the preset simulated light intensity mask are serrated.
  • the preset simulated light intensity mask is symmetrical on both sides.
  • the line width of the black matrix light-shielding layer pattern is 3 ⁇ m.
  • the present application provides a display panel, which is manufactured by using the method for manufacturing a display panel according to any one of the first aspects.
  • the present application provides a display device, which includes the display panel described in the second aspect.
  • the method of the embodiment of the present invention provides a first substrate; coats a black matrix film on the first substrate, and patterns the black matrix film to form a black matrix on the first substrate; A second substrate; a liquid crystal layer is provided between the first substrate and the second substrate.
  • a black matrix is used to form a light-shielding layer pattern to block light leakage in pixels, which can avoid the disadvantages of reflection and depolarization when the metal light-shielding layer is blocked, and effectively improve the contrast of the display panel while the cost and energy consumption are not increased.
  • FIG. 1 is a schematic structural view of using a metal light-shielding layer to block light leakage in pixels in the prior art
  • FIG. 2 is a schematic flowchart of an embodiment of a method for manufacturing a display panel provided by an embodiment of the present invention
  • FIG. 3 is a schematic structural view of an embodiment of a simulated light intensity mask in a method for manufacturing a display panel provided by an embodiment of the present invention
  • FIG. 4 is a schematic structural view of another embodiment of a method for manufacturing a display panel to provide a simulated light intensity mask according to an embodiment of the present invention
  • FIG. 5 is a schematic structural view of another embodiment of a method for preparing a display panel to simulate a light intensity mask provided by an embodiment of the present invention
  • FIG. 6 is a light intensity distribution diagram corresponding to the photomask shown in FIG. 3 in an embodiment of the present invention.
  • FIG. 7 is a light intensity distribution diagram corresponding to the photomask shown in FIG. 4 in an embodiment of the present invention.
  • FIG. 8 is a schematic structural diagram of an embodiment of a display panel in an embodiment of the present invention.
  • first and second are used for description purposes only, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features.
  • the features defined as “first” and “second” may explicitly or implicitly include one or more of the features.
  • the meaning of “plurality” is two or more, unless otherwise specifically limited.
  • FIG. 1 it is a schematic diagram of the structure of using a metal light-shielding layer to block light leakage in pixels in the prior art.
  • a metal pattern is generally used as shown in FIG. 1.
  • the metal light-shielding layer 10 is used in liquid crystal (LC).
  • LC liquid crystal
  • the chaotic light leakage area 20 is blocked, but the disadvantages caused by the metal shading layer include metal reflection, which makes the liquid crystal display (LCD) reflection serious and reduces the image quality of the LCD;
  • the edge of the metal shading layer has a depolarizing effect , Causing light leakage at its edges, causing black light leakage, but lowering the contrast.
  • an embodiment of the present invention provides a method for manufacturing a display panel, a display panel, and a display device, wherein the method for manufacturing a display panel may include: providing a first substrate; and coating a black matrix on the first substrate A thin film, and patterning the black matrix film to form a black matrix light-shielding layer pattern on the first substrate; a second substrate is disposed opposite to the first substrate; between the first substrate and the second substrate Provides a liquid crystal layer.
  • FIG. 2 it is a schematic diagram of an embodiment of a method for manufacturing a display panel in an embodiment of the present invention
  • a display panel usually includes an array substrate, a color filter substrate, and a liquid crystal material between the array substrate and the color filter substrate.
  • the display area of the display panel includes pixel units distributed in an array, and each pixel unit includes a plurality of sub-pixel units, and each sub-pixel unit can be used to display different colors. For example, when one pixel unit includes three sub-pixel units, the three sub-pixel units can be used to display three colors of red, green, and blue, respectively.
  • the embodiment of the present invention does not specifically limit the number of sub-pixel units of the same pixel unit, for example, it may be three, four or more.
  • the material of the first substrate may be a glass substrate, a quartz substrate, a plastic substrate, or a substrate of other suitable materials.
  • the first substrate may be a color filter substrate, on which RGB color filters distributed in an array may be formed, and each color filter is provided in a one-to-one correspondence with the sub-pixel units.
  • the step of patterning the black matrix film and forming a black matrix light-shielding layer pattern on the first substrate may further include: patterning the black matrix using a preset simulated light intensity mask A thin film, forming a black matrix light-shielding layer pattern on the first substrate.
  • the simulated light intensity reticle is a reticle structure provided by the simulated light intensity, and specifically refer to the following detailed structure description.
  • the light-shielding light-shielding layer structure uses a black matrix (BM) material that absorbs light well. Compared with metal materials, it has no light emission and no light depolarization, which can effectively reduce black light leakage and improve display. Panel contrast.
  • BM black matrix
  • the step of patterning the black matrix film and forming a black matrix light-shielding layer pattern on the first substrate includes: using a preset simulated light intensity mask to pattern In the black matrix film, a black matrix light-shielding layer pattern is formed on the first substrate.
  • the preset simulated light intensity mask may be a combined mask formed by 1 to 3 masks.
  • the simulated light intensity mask may include a first mask 301, a second mask 302 and a third mask 303 which are arranged in order from left to right.
  • the first mask 301 and A first distance is set between the second photomask 302, and a second distance is set between the second photomask 302 and the third photomask 303.
  • the second photomask 302 may be rectangular.
  • the third photomask 303 may also be rectangular.
  • the right side of the third photomask 303 is zigzag, and the left side is linear.
  • the left side of the first photomask 301 may be zigzag and the right side is linear.
  • the first photomask 301 may also be rectangular.
  • the distance between the first pitch and the second pitch may be set to be equal.
  • the preset simulated light intensity mask is an independent mask. Specifically, as shown in FIG. 5, both sides of the preset simulated light intensity mask are serrated. Further, the preset simulated light intensity hood is symmetrical on both sides, that is, the preset simulated light intensity hood is symmetrical on both sides.
  • the light intensity distribution of the simulated light intensity mask is preset, and the critical value of the light intensity required for BM exposure development is about 10 candela, as shown in Figure 6, which is the corresponding light of the mask of Figure 3 Strong distribution diagram, Figure 7 is the corresponding distribution diagram of the photomask of Figure 4.
  • the preset simulated light intensity mask can achieve BM CD
  • the width of 2.5-3.5 ⁇ m, that is, the line width of the black matrix light-shielding layer pattern is 2.5-3.5 ⁇ m, preferably, the line width of the black matrix light-shielding layer pattern is 3 ⁇ m.
  • macro Critical Dimension (CD) generally refers to the line width of the mask pattern.
  • the second substrate may be made of the same material as the first substrate, or it may be different, which is not specifically limited here.
  • the spacer in addition to the liquid crystal layer, other necessary structures may be provided in the space between the first substrate and the second substrate, for example, to ensure that the liquid crystal cell is thick between the first substrate and the second substrate.
  • the spacer specifically, such as a columnar spacer or a spherical spacer, since the present invention does not involve the improvement of these structures, it will not be repeated here.
  • the method of the embodiment of the present invention provides a first substrate; coats a black matrix film on the first substrate, and patterns the black matrix film to form a black matrix on the first substrate; A second substrate; a liquid crystal layer is provided between the first substrate and the second substrate.
  • a black matrix is used to form a light-shielding layer pattern to block light leakage in pixels, which can avoid the disadvantages of reflection and depolarization when the metal light-shielding layer is blocked, and effectively improve the contrast of the display panel while the cost and energy consumption are not increased.
  • a display panel is also provided in the embodiments of the present invention. Prepared by the examples.
  • FIG. 8 it is a schematic diagram of an embodiment of a display panel according to an embodiment of the present invention.
  • the display panel includes:
  • the first substrate 801 is provided with a black matrix light-shielding layer pattern 803;
  • the second substrate 802 is disposed opposite to the first substrate 801;
  • the liquid crystal layer 804 is between the first substrate 801 and the second substrate 802.
  • the black matrix light-shielding layer pattern 803 When external light (for example, a backlight used for the display panel) is incident on the black matrix light-shielding layer pattern 803 through the first substrate 801, the light is specularly reflected or diffusely reflected on the lower surface of the black matrix light-shielding layer pattern 803. Return to the backlight, and then reflect it to the light emission direction by the reflective layer of the backlight, for example, these lights can be specularly reflected by the surface of the black matrix light-shielding layer pattern 803 multiple times, and finally pass through the pixel opening position, thereby reflecting the light The light loss of the invalid area of the display panel can be reduced, which in turn can improve contrast and reduce power consumption.
  • a backlight used for the display panel When external light (for example, a backlight used for the display panel) is incident on the black matrix light-shielding layer pattern 803 through the first substrate 801, the light is specularly reflected or diffusely reflected on the lower surface of the black matrix light-s
  • the display panel may be various types of display panels, such as a vertical electric field type, a horizontal electric field type, and the like.
  • the embodiments of the present invention are not limited to specific types of display panels.
  • this embodiment provides a display device including the display panel structure of any of the embodiments disclosed in the embodiments of the present invention.
  • the display device may be a display device such as a liquid crystal display, an electronic paper display, and any product or component having a display function, such as a TV, a digital camera, a mobile phone, a watch, a tablet computer, a notebook computer, a navigator, and the like.
  • a display device such as a liquid crystal display, an electronic paper display, and any product or component having a display function, such as a TV, a digital camera, a mobile phone, a watch, a tablet computer, a notebook computer, a navigator, and the like.
  • the above units or structures can be implemented as independent entities, or they can be combined in any combination as one or several entities.
  • the above units or structures please refer to the previous method embodiments. No longer.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Abstract

L'invention concerne un procédé de préparation pour un écran d'affichage, l'écran d'affichage et un dispositif d'affichage. Le procédé de préparation consiste : à fournir un premier substrat (801); à enduire le premier substrat (801) d'un film mince de matrice noire, à former des motifs sur le film mince de matrice noire et à former une matrice noire sur le premier substrat (801); à disposer un second substrat (802), opposé au premier substrat (801); et à fournir une couche de cristaux liquides (804) entre le premier substrat (801) et le second substrat (802).
PCT/CN2019/070931 2018-12-20 2019-01-09 Procédé de préparation pour écran d'affichage, écran d'affichage et dispositif d'affichage WO2020124705A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201811560164.4A CN109375413A (zh) 2018-12-20 2018-12-20 显示面板的制备方法、显示面板及显示装置
CN201811560164.4 2018-12-20

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WO2020124705A1 true WO2020124705A1 (fr) 2020-06-25

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CN110842375B (zh) * 2019-11-15 2022-03-08 Tcl华星光电技术有限公司 一种显示屏的打码区块、打码方法及显示装置

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CN104267518A (zh) * 2014-09-24 2015-01-07 深圳市华星光电技术有限公司 液晶显示面板及其制造方法
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