WO2020119044A1 - 显示面板、显示屏及显示终端 - Google Patents

显示面板、显示屏及显示终端 Download PDF

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Publication number
WO2020119044A1
WO2020119044A1 PCT/CN2019/090894 CN2019090894W WO2020119044A1 WO 2020119044 A1 WO2020119044 A1 WO 2020119044A1 CN 2019090894 W CN2019090894 W CN 2019090894W WO 2020119044 A1 WO2020119044 A1 WO 2020119044A1
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Prior art keywords
display panel
light
panel according
diffraction
substrate
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PCT/CN2019/090894
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English (en)
French (fr)
Inventor
许立雄
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昆山国显光电有限公司
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Publication of WO2020119044A1 publication Critical patent/WO2020119044A1/zh
Priority to US17/151,693 priority Critical patent/US12004370B2/en

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K59/8792—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/856—Arrangements for extracting light from the devices comprising reflective means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/176—Passive-matrix OLED displays comprising two independent displays, e.g. for emitting information from two major sides of the display
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/878—Arrangements for extracting light from the devices comprising reflective means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/179—Interconnections, e.g. wiring lines or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes

Definitions

  • the present application relates to the field of display technology, specifically to a display panel, a display screen and a display terminal.
  • a display panel including: a substrate, including a first surface and a second surface, the first surface is used for external light input, and the second surface is used for external light output; At least one diffraction eliminating structure is provided on the second surface of the substrate to reduce or eliminate diffracted light formed on the second surface by external light passing through the substrate.
  • a display screen including a first display area and a second display area, the first display area is provided with the display panel according to any one of the first aspect of the present application, and the second display area A passive matrix organic light emitting diode (Passive Organic Light-Emitting Diode, abbreviated as PMOLED) display panel or an active matrix organic light emitting diode (Active Matrix Organic Light-Emitting Diode, abbreviated as AMOLED) display panel; the first A photosensitive device can be set under the display area.
  • PMOLED Passive Organic Light-Emitting Diode
  • AMOLED Active Matrix Organic Light-Emitting Diode
  • a display terminal comprising: a device body having a device area; a display screen according to any one of the second aspect of the present application, covered on the device body; wherein, the device area Located below the first display area, and in the device area, a photosensitive device for collecting light through the first display area is provided.
  • the display panel provided by the present application includes: a substrate, including a first surface and a second surface, the first surface is used for external light input, the second surface is used for external light output; at least one diffraction elimination structure , Provided on the second surface of the substrate, is used to reduce or eliminate the diffracted light formed on the second surface by external light passing through the substrate.
  • the second surface of the above display panel is provided with a diffraction elimination structure, which can effectively eliminate the positive and negative order diffracted light formed on the second surface of the substrate by the external light entering from the first surface of the substrate and exiting from the second surface.
  • the light entering the photosensitive elements such as the camera below the second surface of the display panel only has 0th order diffracted light, thereby eliminating or reducing the picture distortion problems such as ghosting and color fringing caused by the diffracted light, improving the imaging quality, and the overall screen consistency Sex is good.
  • FIG. 1 is a schematic diagram of a specific example of a display panel in an embodiment of this application.
  • FIG. 2 is a schematic diagram of another specific example of the display panel in the embodiment of the present application.
  • FIG. 3 is a schematic diagram of another specific example of the display panel in the embodiment of the present application.
  • FIG. 4 is a schematic diagram of another specific example of the display panel in the embodiment of the present application.
  • FIG. 5 is a schematic diagram of a specific example of a method for determining the shape of the groove inner wall of the display panel in the embodiment of the present application;
  • FIG. 6 is a schematic diagram of another specific example of the display panel in the embodiment of the present application.
  • FIG. 7 is a schematic diagram of another specific example of the display panel in the embodiment of the present application.
  • FIG. 8 is a schematic diagram of a specific example of scan lines of a display panel in an embodiment of the present application.
  • FIG. 9 is a schematic diagram of another specific example of the scan line of the display panel in the embodiment of the present application.
  • FIG. 10 is a schematic diagram of another specific example of the scan line of the display panel in the embodiment of the present application.
  • FIG. 11 is a schematic diagram of a specific example of the first electrode of the display panel in the embodiment of the present application.
  • FIG. 12 is a schematic diagram of another specific example of the first electrode of the display panel in the embodiment of the present application.
  • FIG. 13 is a schematic diagram of another specific example of the first electrode of the display panel in the embodiment of the present application.
  • FIG. 14 is a schematic diagram of a specific example of the pixel defining layer opening of the display panel in the embodiment of the present application.
  • 15 is a schematic diagram of a specific example of a display screen in an embodiment of this application.
  • 16 is a schematic diagram of a specific example of a display terminal in an embodiment of this application.
  • 17 is a schematic structural diagram of a device body in an embodiment of this application.
  • the display screen In order to achieve full-screen display, the display screen needs to achieve a certain transparency to meet the transparency requirements of cameras and the like.
  • a photosensitive element such as a camera
  • the image obtained by taking pictures often suffers from a large degree of blurring.
  • the inventors found that the reason for this problem is that due to the presence of conductive traces in the display body of the electronic device, the external light passing through these conductive traces will cause a more complicated diffraction intensity distribution, resulting in diffraction fringes, which will affect the camera Wait for the normal operation of the photosensitive device.
  • the transparent display screen forms a second-circumference grating due to the metal traces in the screen and the patterns in the layer, which diffracts the incident light, thereby blurring the image and causing ghosting and color fringing.
  • refractive index differences and pattern differences between the thin films in the transparent display screen and there are also diffraction effects like two-dimensional gratings.
  • When light is cast there will be diffraction, which seriously affects the imaging quality, thereby distorting the picture taken by the camera.
  • multi-order diffracted light will be formed. After these different orders of diffracted light enter the photosensitive element such as a camera, light and dark stripes are formed in the photosensitive element, which in turn causes the camera to take images Distortion seriously affects the image quality.
  • the present application provides a display panel that can eliminate diffraction, optimize imaging quality, and solve the above problems well.
  • FIG. 1 is a cross-sectional view of a display panel in an embodiment, as shown in FIG. 1, including: a substrate 1 having a first surface and a second surface, the first surface is used for incident external light, and the second surface is used for external light And the at least one diffraction elimination structure 11 provided on the second surface of the substrate 1.
  • the diffraction elimination structure is used to reduce or eliminate the diffracted light formed on the second surface of the substrate 1 by external light passing through the substrate 1.
  • the display panel has double-sided light transmission, the display panel has a front and a back, the front of the display panel is used to display static or dynamic pictures, and the light emitted from the back of the display panel enters an external photosensitive element;
  • the first side of the substrate corresponds to the front of the display panel, and the second side of the substrate corresponds to the back of the display panel.
  • an external photosensitive element such as a camera is used, external light enters from the first surface of the substrate and enters the photosensitive element through the second surface of the substrate, so that the photosensitive element realizes light collection.
  • the second surface of the display panel is provided with a diffraction elimination structure, which can effectively eliminate the positive and negative order diffracted light formed on the second surface of the substrate, so that only the light entering the photosensitive elements such as the camera under the second surface of the display panel is left
  • the lower 0th order diffracted light eliminates or reduces the ghosting and color fringing caused by the diffracted light, and improves the imaging quality.
  • the substrate 1 may be a rigid substrate, such as a transparent substrate such as a glass substrate, a quartz substrate, or a plastic substrate; the substrate 1 may also be a flexible substrate, such as a polyimide film (abbreviated as PI film), etc. To increase the transparency of the display panel.
  • a rigid substrate such as a transparent substrate such as a glass substrate, a quartz substrate, or a plastic substrate
  • the substrate 1 may also be a flexible substrate, such as a polyimide film (abbreviated as PI film), etc.
  • PI film polyimide film
  • the diffraction eliminating structure 11 includes an absorption layer 111; the absorption layer is used to absorb the diffracted light formed on the second surface of the substrate through the substrate. By absorbing the diffracted light on the second surface of the substrate, the purpose of eliminating or weakening the diffraction is achieved.
  • the material of the absorption layer is a material with a light absorption rate greater than 70%, which can better realize the absorption of positive and negative orders of diffracted light while reducing the production cost.
  • the material of the absorption layer may be black organic glue or black PEC film, etc., which can be reasonably set according to actual needs.
  • the light absorption rate of the absorption layer can also be set to other values, for example, the light absorption rate is greater than 80% or greater than 60%, the greater the light absorption rate, the better the absorption effect of diffracted light, specifically Reasonable setting according to actual needs, this embodiment does not limit this.
  • the diffraction eliminating structure includes a reflective layer 112, which is used to reflect the diffracted light formed on the second surface of the substrate through the substrate. By reflecting the diffracted light on the second surface of the substrate, the purpose of eliminating or weakening the diffraction is achieved.
  • the material of the reflective layer is a material with a light reflectance greater than 90%, which reflects the diffracted light to the greatest extent, reduces the positive and negative orders of diffracted light entering the photosensitive element, realizes the elimination of diffraction, and reduces production cost.
  • the reflective layer may be a metal layer, for example, silver.
  • the light reflectance of the reflective layer can also be set to other values, for example, the light reflectance is greater than 95% or greater than 80%, the greater the light reflectance, the better the reflection effect on diffracted light, specifically Reasonable setting according to actual needs, this embodiment does not limit this.
  • the diffraction elimination structure includes an absorption layer and a reflection layer; the absorption layer absorbs diffracted light, and the reflection layer reflects the diffracted light.
  • the diffracted light on both sides can absorb it and reflect it. Double elimination of diffraction or weakening of diffraction makes the imaging quality better.
  • the reflective layer is provided on the absorption layer, and the diffracted light is first absorbed by the absorption layer. If it cannot be completely absorbed, it is then reflected by the reflection layer provided on the absorption layer to reflect the diffracted light back, minimizing the entrance.
  • the positive and negative orders of diffracted light in the photosensitive element below the display panel achieve the purpose of eliminating or weakening diffraction.
  • the positions of the reflecting layer and the absorbing layer can be reasonably set according to actual needs, and this embodiment does not make any limitation on this.
  • the diffraction-removing structure has a plurality of grooves, the inner wall of the groove is a curved surface, and the curve of the longitudinal section of the curved surface includes multiple curves of different curvature radii connected together; different orders of diffracted light have different diffraction paths, The diffracted lights of different diffraction paths correspond to different curves.
  • the above-mentioned diffraction elimination structure sets curves of different radii of curvature for each order of diffracted light to achieve the best elimination of diffraction or to weaken the diffraction effect.
  • the first surface of the substrate is provided with a pixel array
  • the grooves correspond to the sub-pixels in the pixel array one by one
  • each sub-pixel corresponds to a groove
  • the shape of the inner wall is the same, and the shape of the inner wall of the groove corresponding to the sub-pixels of different color types is different.
  • the sub-pixels of different color types have different diffraction effects on the light, and the diffraction formed by the light after passing through the substrate is also different.
  • the different diffracted light is separately eliminated or weakened by diffraction to achieve a better imaging effect.
  • the color sub-pixel (G) and the green sub-pixel (B) have different wavelengths, so the positions and diffraction angles of the diffraction orders corresponding to R/G/B are different, and different shapes of the groove inner wall are required.
  • the inner wall shape of the groove is determined by optical simulation calculation, as shown in Figure 5; other higher-order diffracted light corresponds
  • the method for determining the internal shape of the groove is the same as above, and will not be described here.
  • the light-emitting material layer of the sub-pixel When external light (such as white light) passes through the sub-pixels of the display panel, it needs to penetrate the light-emitting material layer of the sub-pixel. Different light-emitting material layers have different transmittances for external light, so that the external light transmitted through the light-emitting material layer is different. For example, the external light passes through the luminescent material layer of the red sub-pixel.
  • the luminescent material layer has a high transmittance for red light and a low transmittance for light of other colors, so that the external light transmits light emitted by the red sub-pixel
  • the material layer contains mainly red light, and the diffracted light that reaches the external photosensitive element through the substrate is mainly red light. Therefore, the wavelength in the above diffraction formula corresponds to the wavelength of red light.
  • the above diffraction formula is described by taking light directly incident on the substrate as an example. Of course, in other alternative embodiments, the incident direction of light may also be various.
  • the non-normal incidence diffraction formula and the normal incidence diffraction The formulas are different and more complicated. The shape of the inner wall of the groove can be determined according to the actual situation.
  • the curvature radius of each curve in the multiple curves with different curvature radii connected is mainly determined according to the order of the diffracted light, the wavelength of the diffracted light, and the incident direction of the diffracted light.
  • Various factors affect the substrate second
  • the diffracted light formed by the surface can achieve the optimal effect of eliminating or weakening the diffracted light according to the curve obtained by these influencing factors.
  • the curvature radii of the curves with different curvature radii that are connected in series gradually decrease from the center of the groove to the direction of the groove notch.
  • the bottom of the groove corresponds to the 0th order diffracted light, which is positive from the center to both sides Elimination of negative first-order diffracted light, elimination of positive and negative second-order diffracted light, and higher-order diffracted light, the higher the order of diffracted light, the greater the radius of curvature corresponding to the larger, to minimize the diffracted light; of course, in other embodiments, the radii of curvature of different curves can be specifically determined according to actual diffracted light.
  • the first surface of the substrate is provided with a pixel array
  • the grooves correspond to the sub-pixels in the pixel array one-to-one.
  • the placement position of the groove on the second surface of the substrate is determined according to the arrangement of the pixel array, which can ensure pixel-by-pixel optimization. As shown in FIG. 6, each groove corresponds to a sub-pixel.
  • the width of the notch of the groove is larger than the width of the sub-pixel, ensuring that the light emitted by the sub-pixel passes through the substrate to eliminate or weaken the positive and negative order diffracted light as much as possible; of course, in other alternative embodiments In this case, the width of the notch of the groove can be reasonably determined according to the actual situation, and this embodiment does not make any limitation on this.
  • a plurality of grooves are connected through the first connection part; the coverage area of the first connection part is determined according to the specific arrangement of the pixel array, which can effectively ensure that the grooves correspond to the sub-pixels one by one.
  • the effect of eliminating or weakening the diffraction of pixels can be optimized.
  • the thickness of the first connection portion is not greater than 10um; this arrangement reduces the production cost while ensuring a better diffraction elimination or attenuation effect; of course, in other alternative embodiments, the thickness of the first connection portion is also It can be set to other values, and the specific value can be reasonably determined according to actual needs.
  • the bottom of the groove exposes the material of the second surface of the substrate.
  • the bottom of the groove is not covered with an absorption layer or a reflective layer. While eliminating or weakening positive and negative orders of diffracted light, it can also Ensure that the required light reaches the photosensitive element as much as possible, which improves the imaging quality.
  • the diffraction elimination structure in this embodiment may be a layer of embossable soft material (such as black organic glue) on the second side of the substrate.
  • a groove is prepared on the material; a hard material can also be prepared on the second surface of the substrate, and the groove is formed by a photolithography process; the groove can also be formed by other conventional methods. This embodiment does not limit the formation of the groove .
  • the diffraction-removing structure can also be prepared separately. After the preparation is completed, it is attached to the second surface of the substrate. Specifically, the diffraction-removing structure can be processed into a thin film or a patch type, and then it can be pasted according to the alignment mark. Attached to the substrate.
  • the shape of the inner wall of the groove corresponding to the sub-pixels of different color types is different, and the shape of the inner wall can be determined according to actual tests. For example, the position of the same type of sub-pixels on multiple display panels produced in the same batch The diffraction phenomenon of the transmitted light is consistent. Selecting some of them as the test sample can get the groove shape corresponding to this type of sub-pixel. Other types of sub-pixels can also be tested accordingly in this way to get the corresponding With the shape of the groove, the diffraction elimination structure in this embodiment can be obtained through the above test sample. It should also be noted that when the materials are the same and the process parameter settings are the same, the diffraction that occurs on the display panels produced by different batches is also the same. The diffraction elimination structure obtained by one test can be applied to the display of all batches of production. Panel, there is no need to test every batch, which improves efficiency.
  • the above display panel further includes: a pixel circuit 2 disposed on the substrate 1; a first electrode layer disposed on the pixel circuit 2 and the first electrode layer A plurality of first electrodes 3 are included, and the pixel circuit 2 and the first electrode 3 are in a one-to-one correspondence; the pixel defining layer 4 has a plurality of openings, and a light emitting structure layer 5 is provided in the openings to form a plurality of sub-elements
  • the pixels and sub-pixels correspond to the first electrodes 3 in one-to-one correspondence; and the scan lines and data lines all connected to the pixel circuit 2.
  • the light-emitting structure layer may be a light-emitting structure layer between an anode and a cathode in an Organic Light-Emitting Diode (abbreviated as OLED).
  • OLED Organic Light-Emitting Diode
  • the pixel circuit 2 includes at least one switching device.
  • the switching device includes a first terminal 2a, a second terminal 2b, and a control terminal 2c.
  • the scanning line 7 is connected to the control terminal 2c of the switching device.
  • the data line 8 is connected to the first end 2a of the switching device, and the first electrode 3 is connected to the second end 2b of the switching device. As shown in FIG.
  • the pixel circuit 2 includes a switching device, and the switching device is provided in a one-to-one correspondence with the first electrode 3, the data line 8 is connected to the first terminal 2a of the switching device, and the scanning line 7 is connected to the control terminal 2c of the switching device Multiple sub-pixels correspond to multiple switching devices, that is, one sub-pixel corresponds to one switching device.
  • the data line is connected to the first end of the switching device, and the scanning line is connected to the control end of the switching device, reducing the number of switching devices in the pixel circuit to one, greatly reducing the load current of the scanning line and the load current of the data line.
  • the pixel circuit may also include two switching devices or even more switching devices, and may also include a capacitive element, and multiple switching devices may be connected in series or in parallel as needed, such as 2T1C, 7T1C and other pixels.
  • the circuit is not limited in this embodiment.
  • the pixel circuit includes two switching devices (a first switching device and a second switching device); when the two switching devices are connected in series, the control terminal of the first switching device and the control terminal of the second switching device are connected to each other and scanned Line connection, the first end of the first switching device is connected to the data line, the second end of the first switching device is connected to the first end of the second switching device, and the second end of the second switching device is connected to the first electrode;
  • the control terminal of the first switching device and the control terminal of the second switching device are connected to each other and then to the scanning line, and the first terminal of the first switching device and the first terminal of the second switching device are connected to each other
  • the second end of the first switching device and the second end of the second switching device are connected to each other and then connected to the first electrode.
  • the switching device is a thin film transistor (Thin Film Transistor, abbreviated as TFT)
  • the first terminal 2a is a source of the driving TFT
  • the second terminal 2b is a drain of the driving TFT
  • the control terminal 2c is the gate of the driving TFT
  • the driving TFT is a top gate structure or a bottom gate structure.
  • the structure of the source and drain of the TFT is the same and can be interchanged.
  • the source of the thin film transistor is used as the first end, and the drain of the thin film transistor is used as the second end
  • the drain of the thin film transistor can also be used as the first end, and the source of the thin film transistor can be used as the second end.
  • the switching device may also be a metal-oxide semiconductor field-effect transistor (Metal-Oxide-Semiconductor Field-Effect Transistor, abbreviated as MOSFET), and may also be other elements that conventionally have switching characteristics, such as Insulated gate bipolar transistors (Insulated Gate Bipolar Transistor, abbreviated as IGBT), etc., as long as they can realize the switching function in this embodiment and can be integrated into the display panel, the electronic components fall within the protection scope of the present application.
  • MOSFET Metal-Oxide-Semiconductor Field-Effect Transistor
  • IGBT Insulated gate bipolar transistors
  • the thin film transistor may be an oxide thin film transistor or a low temperature polycrystalline silicon thin film transistor (Low Temperature, Polycrystalline, Silicon, Thin Film Transistor, abbreviated as LTPS TFT), and the thin film transistor is preferably an Indium Gallium Zinc Oxide Thin Film Transistor (Indium Gallium Zinc Oxide Thin Film Transistor (Indium Gallium Zinc Oxide Thin Film Transistor) Thin Film Transistor, abbreviated as IGZO TFT).
  • the low-temperature polysilicon thin film transistor has high electron mobility, high resolution, simpler design and better display effect; the oxide thin film transistor has high optical transmittance, mature technology and simple preparation.
  • the thin-film transistor can be configured as a top-gate structure.
  • the top-gate structure of the TFT requires a small number of photolithographic masks, the manufacturing process is simple, and the cost is low; of course, in other alternative embodiments, the thin-film transistor also The bottom gate structure has a complicated manufacturing process.
  • the gate of the TFT and the gate insulating layer can be used as an optical protective film, which has good optical characteristics.
  • the scan line is connected to the gate.
  • the scan line and the gate can be formed in the same process step.
  • the scanning line and the gate material are both indium tin oxide (Indium Tin Oxide, abbreviated as ITO) materials.
  • ITO Indium Tin Oxide
  • a layer of ITO can be prepared first.
  • the film plate patterns ITO and simultaneously forms scan lines and gates.
  • the scan lines may also be disposed above or below the gate, so that the gate and scan lines need to be formed separately.
  • the data line and the first electrode are formed in the same process step.
  • the data line and the first electrode are both made of ITO material, a full surface of ITO is prepared, and the ITO is patterned through the second mask plate to form the data line and the first electrode at the same time
  • the data line and the first electrode can also be formed separately.
  • the materials of the first electrode, the second electrode, the data line, and the scan line are transparent conductive materials, and the light transmittance of the transparent conductive materials is greater than 90%. Therefore, the light transmittance of the entire display panel can be more than 70%, and the transparency of the display panel is higher.
  • the transparent conductive material may be indium tin oxide (ITO), indium zinc oxide (Indium Zinc Oxide, IZO), silver-doped indium tin oxide (Ag+ITO), or silver-doped Indium zinc oxide (Ag+IZO). Since the ITO process is mature and the cost is low, the conductive material is preferably indium zinc oxide. Further, in order to reduce the resistance of each conductive trace on the basis of ensuring high light transmittance, the transparent conductive material is made of aluminum-doped zinc oxide, silver-doped ITO, or silver-doped IZO.
  • the transparent conductive material may also use conventional other materials, which can be reasonably set according to actual needs, which is not limited in this embodiment.
  • the material of at least one of the first electrode, the second electrode, the data line, and the scan line is a transparent conductive material.
  • a plurality of scan lines extend in parallel along the first direction, a plurality of data lines extend in parallel along the second direction, the first direction and the second direction intersect, and at least one side of the scan lines and/or data lines in the extending direction is a wave shape.
  • the scan line extends in the X direction
  • the data line extends in the Y direction
  • the projections of the data line and the scan line on the substrate are perpendicular to each other
  • the two sides of the scan line in the extension direction are waves
  • the two sides of the data line in its extending direction are also wavy.
  • the wavy data line and the scanning line can produce diffraction stripes with different positions and diffusion directions, thereby weakening the diffraction effect, and thus ensuring that the camera is set on the display When the panel is underneath, the captured image has a high definition.
  • the width of the scan lines changes continuously or intermittently.
  • Continuously changing width means that the width of any two adjacent positions on the scan line is different.
  • the extending direction of the scanning line 7 is its longitudinal direction, and the width of the scanning line continuously changes in the extending direction.
  • the discontinuous change in width refers to the existence of the same width on two adjacent positions in a partial area on the scan line, but the widths on two adjacent positions in a partial area are not the same.
  • a plurality of scan lines are regularly arranged on the substrate. Therefore, the gap between two adjacent scan lines also shows continuous changes or intermittent changes in the direction parallel to the extension of the scan lines. In the extending direction of the scanning line, whether the width of the scanning line changes continuously or intermittently can be a periodic change.
  • both sides of the scanning line in the extending direction are wavy, the peaks of the two sides are set oppositely, and the valleys are set oppositely.
  • the peaks T of the two sides in the extending direction are relatively arranged and the valleys B are relatively arranged.
  • the width between the peaks of the same scanning line is W1
  • the width between the valleys of the same scanning line is W2
  • adjacent The spacing between the peaks of two scan lines is D1
  • the spacing between the peaks of two adjacent scan lines is D2.
  • both sides are formed by connecting the same arc-shaped side.
  • the two sides may also be formed by connecting the same elliptical side, as shown in FIG. 9.
  • both sides of the scanning line 7 into a wave shape formed by a circular arc shape or an ellipse shape, it can be ensured that the diffraction fringes generated on the scanning line can be diffused in different directions, and thus no significant diffraction effect will be generated.
  • a second connecting portion is formed at a position opposite to the valley of the wavy scanning line, and the second connecting portion may be a straight line or a curved line.
  • the second connection portion is in the shape of a strip, and the second connection portion is the area where the scanning line 7 is electrically connected to the switching device, that is, the position where the control end of the switching device is connected to the second connection portion.
  • the second connecting portion may also adopt other irregular structures, such as a shape with large middle ends and small ends, or a shape with large middle ends and small ends.
  • the data lines are wavy, there is a second spacing between adjacent data lines, and the second spacing changes continuously or intermittently; the width of the data lines changes continuously or intermittently.
  • the data line is similar to the scan line.
  • the data line can adopt any of the wavy shapes in Figure 8-10.
  • the two sides of the data line in the extension direction are wavy, the peaks of the two sides are oppositely arranged, and the valleys are relatively arranged; the third connection part is formed at the opposite side of the valley of the data line, and the third connection part is the data line and the switch
  • the data line and scan line settings are similar, see the scan line settings for details.
  • the scanning lines and data lines on the display panel adopt any of the wavy shapes in Figure 8-10, which can ensure that in the extending direction of the data line and the scanning line, the light passes through the positions of different widths and adjacent traces Diffraction stripes with different positions can be formed at different gaps, thereby reducing the diffraction effect, so that the photosensitive device placed under the display panel can work normally.
  • the shape of the first electrode may be a circle as shown in FIG. 11, or an ellipse as shown in FIG. 12, or a dumbbell shape as shown in FIG. 13, it can be understood that the first electrode It can also be formed by other curves with different radii of curvature everywhere.
  • an obstacle such as a slit, a small hole, or a disc
  • diffraction the distribution of diffraction fringes is affected by the size of obstacles, such as the width of the slit and the size of the small holes.
  • the positions of the diffraction fringes at the positions with the same width are consistent, so that a more obvious diffraction effect will occur. .
  • By changing the shape of the anode to a circle, ellipse, or dumbbell it can be ensured that when light passes through the anode layer, diffraction stripes with different positions and diffusion directions can be generated at different width positions of the anode, thereby weakening the diffraction effect, and thus ensuring the camera When it is set under the display panel, the image obtained by taking a picture has high definition.
  • the sides of the projection of the opening on the pixel-defining layer on the substrate are not parallel to each other and each side is a curve, that is, the opening has a varying width in all directions and different directions of diffraction and diffusion at the same position, when external light passes
  • diffraction stripes with different positions and diffusion directions can be generated at different width positions, so that no more obvious diffraction effect is generated, thereby ensuring that the photosensitive element disposed under the display panel can work normally.
  • the openings on the conventional pixel-defining layer are all set to be rectangular or square according to the pixel size.
  • the rectangular shape has two sets of parallel sides, so that it has the same width in the length and width directions. Therefore, when external light passes through the opening, diffraction stripes with the same position and the same diffusion direction are generated at different positions in the length direction or the width direction, so that a significant diffraction effect occurs, making the photosensitive element located below the display panel unable to normal work.
  • the display panel in this embodiment can solve this problem well and ensure that the photosensitive element under the display panel can work normally.
  • the curve adopted by each side of the projection of the opening on the substrate may be at least one of a circle, an ellipse, and other curves with varying curvatures.
  • the sides of the opening are curved, so when the light passes through the opening, the generated diffraction fringes will not spread in one direction, but in the direction of 360 degrees, so that the diffraction is very insignificant and has a better diffraction improvement effect. .
  • the projection graphic unit opening on the substrate is circular, elliptical, dumbbell-shaped or wavy, similar to the shape of the first electrode, please refer to the first electrode, see FIGS. 11-13, in This will not be repeated here.
  • the shape of the opening projected on the substrate can be determined according to the shape of the corresponding light emitting structure.
  • the number can be determined according to the aspect ratio of the light emitting structure.
  • the projection shape of the opening on the substrate may also be an axisymmetric structure, thereby ensuring that each pixel on the entire display panel has a uniform opening ratio, which does not affect the final display effect. Referring to FIG.
  • the corresponding light emitting structure shape is a rectangle or a square with an aspect ratio of less than 1.5
  • the symmetry axis of the opening projection corresponds to the symmetry axis of the corresponding light emitting structure.
  • the diameter of the circle in the projection is smaller than the minimum width of the light emitting structure.
  • the diameter of the projected circle can be determined according to the shape of the light emitting structure and the comprehensive aperture ratio. Since the determination process can be determined by a conventional method of determining the size of the opening, it will not be described here.
  • the aspect ratio of the sub-pixel corresponding to the opening is between 1.5 and 2.5.
  • the projection is formed by two circles communicating with each other to form a dumbbell shape.
  • the two circles are arranged along the length of the corresponding light emitting structure.
  • the aspect ratio of the light emitting structure corresponding to the opening is greater than 2.5.
  • the projection is a wavy shape formed by three or more circles communicating with each other. Three or more circles are arranged along the length direction of the corresponding light emitting structure.
  • a connection portion is also formed in the projection.
  • the connection part is an arc, that is, the intersection of more than three circles is connected by an arc, so as to ensure that the light can diffuse in all directions when passing through the connection part, thereby improving the diffraction effect.
  • the projection When the length-to-width ratio of the light emitting structure corresponding to the opening is equal to 1.5, the projection may be a circle, or a dumbbell shape in which two circles communicate with each other. When the length-to-width ratio of the light emitting structure corresponding to the opening is equal to 2.5, the projection may be a dumbbell shape in which two circles communicate with each other, or a wave shape in which three circles communicate with each other, as shown in FIG. 14.
  • the shape of the sub-pixel is the same as the shape of the above opening, that is, the sub-pixel is circular, elliptical, or dumbbell-shaped.
  • the shape design rules of the anode can also refer to the design rules of the openings, which can further improve the diffraction effect.
  • the anode can also adopt a conventional rectangular shape design.
  • This embodiment also provides a display screen including a first display area, where the display panel mentioned in any of the above embodiments is provided in the first display area, and a photosensitive device may be provided below the first display area.
  • the first display area uses the display panel in the foregoing embodiment, when light passes through the display area, no diffraction effect or weakening of the diffraction effect is generated, thereby ensuring that the photosensitive device below the first display area can work normally .
  • the first display area can normally display dynamic or static pictures when the photosensitive device is not working, and needs to be in a non-display state when the photosensitive device is working, so as to ensure that the photosensitive device can normally perform light collection through the display panel , Eliminate or reduce diffraction, thereby improving the imaging quality of the photosensitive element.
  • the above display screen further includes a second display area, and the display panel provided in the second display area is a PMOLED display panel or an AMOLED display panel.
  • the display screen includes a first display area 161 and a second display area 162, both of which are used to display static or dynamic pictures, wherein A display area 161 uses the display panel mentioned in any of the above embodiments, and the first display area 161 is located at the upper part of the display screen.
  • the display screen may further include three or more display areas, such as three display areas (first display area, second display area, and third display area), and the first display area uses
  • the display panel mentioned in any of the above embodiments, which display panel is used in the second display area and the third display area, which is not limited in this embodiment, may be a PMOLED display panel or an AMOLED display panel, of course
  • the display panel in this embodiment may also be used.
  • This embodiment also provides a display terminal, including the above display screen covered on the device body.
  • the above display terminal may be a mobile phone, a tablet, a television, a display, a palmtop computer, an ipod, a digital camera, a navigator, and other products or components with display functions.
  • the display terminal includes a device body 810 and a display screen 820.
  • the display screen 820 is provided on the device body 810 and connected to the device body 810.
  • the display screen 820 may use the display screen in any of the foregoing embodiments to display static or dynamic images.
  • FIG. 17 is a schematic structural diagram of a device body 810 in an embodiment.
  • the device body 810 may be provided with a slotted area 812 and a non-slotted area 814.
  • photosensitive devices such as a camera 930 and a photosensor, a light sensor, etc. may be provided.
  • the display panel of the first display area of the display screen 820 is bonded together corresponding to the slotted area 812, so that the above-mentioned photosensitive devices such as the camera 930 and the light sensor can transmit external light through the first display area Collection and other operations.
  • the display panel in the first display area can effectively improve the diffraction phenomenon caused by external light transmitting through the first display area, the quality of the image captured by the camera 930 in the display terminal can be effectively improved, and the image captured due to diffraction can be avoided Distortion can also improve the accuracy and sensitivity of the light sensor to sense external light.

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Abstract

一种显示面板、显示屏及显示终端，其中，该显示面板包括基板（1），包括第一面和第二面，第一面用于外部光的射入，第二面用于外部光的射出；至少一个衍射消除结构（111），设置于基板（1）的第二面，用于减弱或消除外部光穿过基板（1）在第二面形成的衍射光。上述显示面板的第二面设置衍射消除结构（111），衍射消除结构（111）能够有效消除从基板（1）第一面射入且从第二面射出的外部光在基板（1）第二面形成的正负级次衍射光，使得进入显示面板第二面下方的摄像头等感光元件的光只剩下0级衍射光，从而消除或者减弱了衍射光造成的重影及彩边等画面失真问题，提高了成像质量，实现了全屏显示,使得屏幕的整体一致性更好。

Description

显示面板、显示屏及显示终端 技术领域
本申请涉及显示技术领域，具体涉及一种显示面板、显示屏及显示终端。
背景技术
随着显示终端的快速发展，用户对屏幕占比的要求越来越高，由于屏幕上方需要安装摄像头、传感器、听筒等元件，因此屏幕上方通常会预留一部分区域用于安装上述元件，例如苹果手机iphoneX的屏幕上设置的前刘海区域，这种设置方式并不能实现全屏显示,并且影响了屏幕的整体一致性。
发明内容
基于此，有必要针对上述技术问题，提供一种显示面板、显示屏以及显示终端。
本申请第一方面，提供一种显示面板，包括：基板，包括第一面和第二面，所述第一面用于外部光的射入，所述第二面用于外部光的射出；至少一个衍射消除结构，设置于所述基板的第二面，用于减弱或消除外部光穿过所述基板在所述第二面形成的衍射光。
本申请第二方面，提供一种显示屏，包括第一显示区和第二显示区，所述第一显示区设置有如本申请第一方面任一所述的显示面板，所述第二显示区设置有无源矩阵有机发光二极管(Passive Matrix Organic Light-Emitting Diode，缩写为PMOLED)显示面板或有源矩阵有机发光二极管(Active Matrix Organic Light-Emitting Diode，缩写为AMOLED)显示面板；所述第一显示区下方可设置感光器件。
本申请第三方面，提供一种显示终端，包括：设备本体，具有器件区；如 本申请第二方面中任一所述的显示屏，覆盖在所述设备本体上；其中，所述器件区位于所述第一显示区下方，且所述器件区中设置有透过所述第一显示区进行光线采集的感光器件。
本申请技术方案，具有如下优点：
本申请提供的显示面板，包括：基板，包括第一面和第二面，所述第一面用于外部光的射入，所述第二面用于外部光的射出；至少一个衍射消除结构，设置于所述基板的第二面，用于减弱或消除外部光穿过所述基板在所述第二面形成的衍射光。上述显示面板的第二面设置衍射消除结构，衍射消除结构能够有效消除从基板第一面射入且从第二面射出的外部光在基板第二面形成的正负级次衍射光，从而使得进入显示面板第二面下方的摄像头等感光元件的光只剩下0级衍射光，从而消除或者减弱了衍射光造成的重影及彩边等画面失真问题，提高了成像质量，屏幕的整体一致性好。
附图说明
为了更清楚地说明本申请具体实施方式的技术方案，下面将对具体实施方式描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图是本申请的一些实施方式，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例中显示面板的一个具体示例的示意图；
图2为本申请实施例中显示面板的另一个具体示例的示意图；
图3为本申请实施例中显示面板的另一个具体示例的示意图；
图4为本申请实施例中显示面板的另一个具体示例的示意图；
图5为本申请实施例中显示面板的凹槽内壁形状确定方法的一个具体示例的示意图；
图6为本申请实施例中显示面板的另一个具体示例的示意图；
图7为本申请实施例中显示面板的另一个具体示例的示意图；
图8为本申请实施例中显示面板的扫描线的一个具体示例的示意图；
图9为本申请实施例中显示面板的扫描线的另一个具体示例的示意图；
图10为本申请实施例中显示面板的扫描线的另一个具体示例的示意图；
图11为本申请实施例中显示面板的第一电极的一个具体示例的示意图；
图12为本申请实施例中显示面板的第一电极的另一个具体示例的示意图；
图13为本申请实施例中显示面板的第一电极的另一个具体示例的示意图；
图14为本申请实施例中显示面板的像素限定层开口的一个具体示例的示意图；
图15为本申请实施例中显示屏的一个具体示例的示意图；
图16为本申请实施例中显示终端的一个具体示例的示意图；
图17为本申请实施例中设备本体的结构示意图。
具体实施方式
为使本申请实施例的目的、技术方案和优点更加清楚，下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
在本申请的描述中，需要理解的是，术语“中心”、“纵向”、“上”、“下” “左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”以及“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，需要说明的是，当元件被称为“形成在另一元件上”时，它可以直接连接到另一元件上或者可能同时存在居中元件。当一个元件被认为是“连接”另一个元件，它可以直接连接到另一元件或者同时存在居中元件。相反，当元件被称作“直接在”另一元件“上”时，不存在中间元件。
为了实现全面屏显示，需要显示屏达到一定的透明度，以满足摄像头等对透明度的需求。但是，发明人发现，将摄像头等感光元件设置在显示面板下方时，拍照得到的图像经常出现很大程度的模糊的问题。发明人研究发现，出现这个问题的原因在于，由于电子设备的显示屏体内存在导电走线，外部光线经过这些导电走线时会造成较为复杂的衍射强度分布，从而出现衍射条纹，进而会影响摄像头等感光器件的正常工作。例如，透明显示屏由于屏内的金属走线以及层内的图案(pattern)共同形成了类二围光栅，对入射光会形成衍射，从而使成像模糊，会有重影和彩边，此外，透明显示屏中各层薄膜存在折射率差异和图案(pattern)差异，也存在类二维光栅的衍射效应，光投过时会存在衍射，严重影响成像质量，从而使得摄像头拍摄到的画面出现失真。具体地，入射光穿过显示面板射出后，会形成多级次的衍射光，这些不同级次的衍射光进入摄像头等感光元件后，在感光元件内形成明暗条纹，进而使得摄像头拍照得到的图像失真，严重影响成像质量。
基于此，本申请提供了一种显示面板，该显示面板能够消除衍射，优化成像质量，很好地解决上述问题。
图1为一实施例中显示面板的剖视图，如图1所示，包括：基板1，具有第一面和第二面，第一面用于外部光的射入，第二面用于外部光的射出；以及 设置于基板1第二面的至少一个衍射消除结构11，衍射消除结构用于减弱或消除外部光穿过基板1在基板1第二面形成的衍射光。
需要说明的是，在实际应用中，显示面板具有双面透光，显示面板具有正面和背面，显示面板的正面用于显示静态或动态画面，显示面板的背面出射的光射入外部感光元件；基板的第一面对应显示面板的正面，基板的第二面对应显示面板的背面。在使用摄像头等外部感光元件时，外部光从基板的第一面射入，透过基板的第二面进入感光元件，以使得感光元件实现光的采集。
上述显示面板的第二面设置衍射消除结构，衍射消除结构能够有效消除在基板第二面形成的正负级次衍射光，从而使得进入显示面板第二面下方的摄像头等感光元件的光只剩下0级衍射光，从而消除或者减弱了衍射光造成的重影及彩边等问题，提高了成像质量。
在一实施例中，基板1可以为刚性基板，如玻璃基板、石英基板或者塑料基板等透明基板；基板1也可为柔性基板，如聚酰亚胺薄膜(polyimide film，简写为PI薄膜)等，以提高显示面板的透明度。
在一可选实施例中，如图2所示，衍射消除结构11包括吸收层111；吸收层用于吸收透过基板在基板第二面形成的衍射光。通过将基板第二面的衍射光进行吸收，实现了消除或者减弱衍射的目的。
在一实施例中，吸收层的材料是光吸收率大于70％的材料，较好地实现了正负级次衍射光的吸收，同时降低生产成本。优选地，吸收层的材料可为黑色有机胶或者黑色PEC膜等，根据实际需要合理设置即可。在其它可替换实施例中，吸收层的光吸收率还可设置为其它数值，例如，光吸收率大于80％或者大于60％，光吸收率越大对衍射光的吸收效果越好，具体可根据实际需要合理设置，本实施例对此不作任何限制。
在一可替换实施例中，如图3所示，衍射消除结构包括反射层112，反射 层用于反射透过基板在基板第二面形成的衍射光。通过将基板第二面的衍射光进行反射，实现了消除或者减弱衍射的目的。
在一实施例中，反射层的材料是光反射率大于90％的材料，最大程度地反射衍射光，减少了进入感光元件中的正负级次衍射光，实现了衍射的消除，同时降低生产成本。优选地，反射层可为金属层，例如，银。在其它可替换实施例中，反射层的光反射率还可设置为其它数值，例如，光反射率大于95％或者大于80％，光反射率越大对衍射光的反射效果越好，具体可根据实际需要合理设置，本实施例对此不作任何限制。
在另一可替换实施例中，如图4所示，衍射消除结构包括吸收层和反射层；吸收层对衍射光进行吸收，反射层对衍射光进行反射，上述衍射消除结构对透过基板第二面的衍射光既能够对其进行吸收，又能够对其进行反射，双重的消除衍射或减弱衍射，使得成像质量更优。较佳地，反射层设置于吸收层上，衍射光先被吸收层吸收，如若不能完全吸收，再通过设置于吸收层上的反射层进行反射，将衍射光反射回去，最大程度地减少了进入显示面板下方感光元件中的正负级次衍射光，从而实现了消除或者减弱衍射的目的。当然，在其它实施例中，反射层和吸收层的位置可根据实际需要合理设置，本实施例对此不作任何限制。
在一实施例中，衍射消除结构具有多个凹槽，凹槽的内壁为曲面，曲面的纵截面的曲线包括多段相连的不同曲率半径的曲线；不同级次的衍射光具有不同的衍射路径，不同衍射路径的衍射光对应不同的曲线，上述衍射消除结构对每一个级次的衍射光分别设置不同曲率半径的曲线以达到最佳的消除衍射或者减弱衍射效果。
在一实施例中，基板的第一面设置有像素阵列，凹槽与像素阵列中的子像素一一对应，每一个子像素对应一个凹槽，并且同一颜色类型的子像素所对应 的凹槽内壁的形状相同，不同颜色类型的子像素所对应的凹槽内壁的形状不同。具体地，不同颜色类型的子像素对光的衍射效应不同，光经过基板后所形成的衍射也不相同，对不同的衍射光分别进行衍射消除或者减弱，实现较佳的成像效果。具体地，由衍射公式
Figure PCTCN2019090894-appb-000001
(其中，k为衍射级次，λ为衍射光的波长，θ为k级衍射光的衍射角，d为衍射面到接收面的距离)，由上述公式可知，红色子像素(R)、蓝色子像素(G)、绿色子像素(B)具有不同的波长，故R/G/B对应的衍射级次所在位置及衍射角不同，需要不同的凹槽内壁的形状。根据正一级衍射光(1st)、负一级衍射光(-1st)以及0级衍射光通过光学仿真计算确定凹槽的内壁形状，如图5所示；其它更高级次的衍射光所对应的凹槽内部形状的确定方法同上，在此不再赘述。
外部光(例如白光)透过显示面板的子像素时，需要穿透子像素的发光材料层，不同的发光材料层对外部光的透过率不同，使得透过发光材料层的外部光不同。例如，外部光透过红色子像素的发光材料层，该发光材料层对红色光的透过率较高，对其它颜色的光的透过率较低，使得外部光透过红色子像素的发光材料层后所包含的主要是红色光，进而使得透过基板到达外部感光元件的衍射光主要为红色光，故上述衍射公式中的波长对应为红色光的波长。
上述衍射公式以光直射入基板为例进行说明，当然，在其它可替换实施例中，光的入射方向也可多种多样，当非垂直入射时，非垂直入射的衍射公式与垂直入射的衍射公式不同，且更为复杂，根据实际情况具体确定凹槽内壁的形状即可。
在一实施例中，多段相连的不同曲率半径的曲线中的每一段的曲线的曲率半径主要根据衍射光的级次、衍射光的波长以及衍射光的入射方向确定，多种因素影响基板第二面形成的衍射光，根据这些影响因素综合得出的曲线对衍射光的消除或者减弱效果可达到最优。
优选地，多段相连的不同曲率半径的曲线的曲率半径从凹槽的中心向凹槽的槽口方向逐渐减小，具体地，凹槽底部对应0级衍射光，自中心位置向两边依次为正负一级衍射光的消除，正负二级衍射光的消除以及更高级次的衍射光，衍射光的级次越高所对应的曲率半径越大，以最大程度的减少衍射光；当然，在其它实施例中，不同曲线的曲率半径可根据实际衍射光具体确定。
在一实施例中，基板的第一面设置有像素阵列，凹槽与像素阵列中的子像素一一对应。具体地，凹槽在基板第二面的设置位置根据像素阵列的排布确定，可以保证逐个像素(pixel-by-pixel)进行优化。如图6所示，每一个凹槽对应一个子像素。
在一实施例中，凹槽的槽口宽度大于子像素的宽度，保证子像素发射出的光经过基板后尽可能多地消除或者减弱正负级次衍射光；当然，在其它可替换实施例中，凹槽的槽口宽度可根据实际情况合理确定，本实施例对此不作任何限制。
在一实施例中，多个凹槽通过第一连接部连接；根据像素阵列的具体排布情况确定第一连接部的覆盖区域，能够有效保证凹槽与子像素一一对应，对每一个子像素的衍射消除或者削弱效果均能达到最优。
优选地，第一连接部的厚度不大于10um；这样设置在保证达到较好的衍射消除或者减弱效果的同时，降低生产成本；当然，在其它可替换实施例中，第一连接部的厚度还可设置为其它数值，具体数值可根据实际需要合理确定。
在一实施例中，凹槽的底部暴露出基板的第二面材料，具体地，凹槽的底部上不覆盖吸收层或者反射层，在消除或者减弱正负级次衍射光的同时，还能够保证需要的光尽可能多的到达感光元件，提高了成像质量。
需要说明的是，本实施例中的衍射消除结构在实际制作过程中可为在基板的第二面制备一层可压印的软性材料(如黑色有机胶)，通过模具在上述可压印 材料上制备凹槽；还可以在基板第二面制备硬性材料，通过光刻工艺形成凹槽；还可采用常规的其它方式形成上述凹槽，本实施例对上述凹槽的形成方式不作任何限制。此外，衍射消除结构也可单独制备，制备完成后在贴附于基板的第二面，具体可为先将衍射消除结构加工成薄膜或贴片型，然后根据对位标记(mark)将其贴附于基板上。本领域技术人员可以在不脱离本申请的精神和范围的情况下作出各种修改和变型，这样的修改和变型均落入本实施例所限定的保护范围之内。
还需要说明的是，不同颜色类型的子像素所对应的凹槽的内壁形状不同，内壁形状具体可根据实际测试确定，例如，同一批次生产的多个显示面板上的相同类型的子像素位置所透过的光的衍射现象是一致的，选取其中的若干个作为测试样本便可得到该类型子像素所对应的凹槽形状，其它类型的子像素也按照此方式通过测试便可到相应地凹槽形状，通过上述测试样本便可得到本实施例中的衍射消除结构。还需要说明的是，在材料相同且工艺参数设置相同的情况下，不同批次生产的显示面板上所发生的衍射也相同，通过一次测试得到的衍射消除结构可适用于所有批次生产的显示面板，无需对每一批次均进行测试，提高了效率。
图6为一实施例中显示面板的剖视图，如图6所示，上述显示面板还包括：设置于基板1上的像素电路2；设置于像素电路2上的第一电极层，第一电极层包括多个第一电极3，像素电路2与第一电极3为一一对应关系；像素限定层4，像素限定层4上具有多个开口，开口内设置有发光结构层5，以形成多个子像素，子像素与第一电极3一一对应；以及均与像素电路2连接的扫描线和数据线。
在一实施例中，发光结构层可以是有机发光二极管(Organic Light-Emitting Diode，缩写为OLED)中的阳极和阴极之间的发光结构层。
在一实施例中，像素电路2包括至少一个开关器件，开关器件包括第一端2a、第二端2b和控制端2c，详见后续具体介绍；扫描线7与开关器件的控制端2c连接，数据线8连接开关器件的第一端2a，第一电极3连接开关器件的第二端2b。如图7所示，像素电路2包括一个开关器件，开关器件与第一电极3一一对应设置，数据线8与开关器件的第一端2a连接，扫描线7与开关器件的控制端2c连接，多个子像素与多个开关器件一一对应，即一个子像素对应一个开关器件。数据线连接开关器件的第一端，扫描线连接开关器件的控制端，将像素电路中的开关器件减少至一个，大大降低扫描线的负载电流以及数据线的负载电流。
在一可替换实施例中，像素电路也可包括两个开关器件甚至更多个开关器件，还可以包括电容元件，根据需要将多个开关器件进行串联或者并联的连接，如2T1C、7T1C等像素电路，本实施例对此不作限定。例如，像素电路包括两个开关器件(第一开关器件和第二开关器件)；当两个开关器件串联连接时，第一开关器件的控制端和第二开关器件的控制端相互连接后与扫描线连接，第一开关器件的第一端与数据线连接，第一开关器件的第二端与第二开关器件的第一端连接，第二开关器件的第二端与第一电极连接；当两个开关器件并联连接时，第一开关器件的控制端和第二开关器件的控制端相互连接后与扫描线连接，第一开关器件的第一端和第二开关器件的第一端相互连接后与数据线连接，第一开关器件的第二端和第二开关器件的第二端相互连接后与第一电极连接。
在一实施例中，像素电路包括一个开关器件时，开关器件为驱动薄膜晶体管(Thin Film Transistor，缩写为TFT)，第一端2a为驱动TFT的源极，第二端2b为驱动TFT的漏极，控制端2c为驱动TFT的栅极；驱动TFT为顶栅结构或底栅结构。在实际工艺制作过程中，TFT的源极和漏极的结构一致，可以互换，本实施例中，为了方便描述将薄膜晶体管的源极作为第一端，薄膜晶体管的漏极作为第二端；当然，在其它实施例中，也可将薄膜晶体管的漏极作为第一端， 薄膜晶体管的源极作为第二端。在另一可替换实施例中，开关器件还可为金属氧化物半导体场效应晶体管(Metal-Oxide-Semiconductor Field-Effect Transistor，缩写为MOSFET)，还可为常规地具有开关特性的其它元件，如绝缘栅双极型晶体管(Insulated Gate Bipolar Transistor，缩写为IGBT)等，只要能够实现本实施例中开关功能并且能够集成至显示面板中的电子元件均落入本申请保护范围内。
在一实施例中，薄膜晶体管可为氧化物薄膜晶体管或者低温多晶硅薄膜晶体管(Low Temperature Polycrystalline Silicon Thin Film Transistor，缩写为LTPS TFT)，薄膜晶体管优选为铟镓锌氧化物薄膜晶体管(Indium Gallium Zinc Oxide Thin Film Transistor,缩写为IGZO TFT)。低温多晶硅薄膜晶体管的电子迁移率高、分辨率高，设计更简单，显示效果更优；氧化物薄膜晶体管的光学透过率高、工艺成熟、制备简单。
在一实施例中，薄膜晶体管可设置为顶栅结构，顶栅结构的TFT所需光刻掩膜板数量少，制作工艺简单，成本低；当然，在其它可替换实施例中，薄膜晶体管还设置为底栅结构，底栅结构制作工艺复杂，TFT的栅极和栅极绝缘层可作为光学保护膜，光学特性好。
扫描线与栅极连接，为了简化工艺步骤，节省工艺流程，扫描线与栅极可在同一工艺步骤中形成。在一可选实施例中，具体可为扫描线和栅极的材料均是氧化铟锡(Indium Tin Oxide，缩写为ITO)材料，则在制作过程中可先制备一层ITO，通过第一掩膜板对ITO进行图案化同时形成扫描线和栅极。在一可替换实施例中，扫描线也可设置在栅极的上方或下方，这样便需要分别形成栅极和扫描线。
为了简化工艺步骤，节省工艺流程，数据线与第一电极在同一工艺步骤中形成。在一可选实施例中，具体可为数据线与第一电极的材料均是ITO材料， 制备一整面的ITO，通过第二掩膜板对ITO进行图案化同时形成数据线和第一电极；在一可替换实施例中，当数据线和第一电极材料不相同时，也可分别形成数据线和第一电极。
在一可选实施例中，为了最大化地提高显示面板的整体透明度，第一电极、第二电极、数据线以及扫描线的材料是透明导电材料，透明导电材料的透光率大于90％，从而使得整个显示面板的透光率可以在70％以上，显示面板的透明度更高。
具体地，透明导电材料可为铟锡氧化物(ITO)，也可为铟锌氧化物(Indium Zinc Oxide，IZO)、或者掺杂银的氧化铟锡(Ag+ITO)、或者掺杂银的氧化铟锌(Ag+IZO)。由于ITO工艺成熟、成本低，导电材料优选为铟锌氧化物。进一步的，为了在保证高透光率的基础上，减小各导电走线的电阻，透明导电材料采用铝掺杂氧化锌、掺杂银的ITO或者掺杂银的IZO等材料。
在其它可替换实施例中，透明导电材料也可采用常规的其它材料，根据实际需要合理设置即可，本实施例对此不作限定。在一可替换实施例中，第一电极、第二电极、数据线以及扫描线中的至少一个的材料是透明导电材料。
多个扫描线沿第一方向并行延伸，多个数据线沿第二方向并行延伸，第一方向和第二方向相交，且扫描线和/或数据线在其延伸方向上的至少一条边为波浪形。在一可选实施例中，扫描线在X方向上延伸，数据线在Y方向上延伸，数据线和扫描线在基板上的投影相互垂直，扫描线在其延伸方向上的两条边为波浪形并且数据线在其延伸方向上的两条边也为波浪形，波浪形的数据线和扫描线能够产生具有不同位置以及扩散方向的衍射条纹，从而弱化衍射效应，进而确保摄像头设置在该显示面板下方时，拍照得到的图像具有较高的清晰度。
在一可选实施例中，由于扫描线为波浪形，相邻的扫描线间具有第一间距，第一间距连续变化或间断变化；扫描线的宽度连续变化或间断变化。宽度连续 变化是指扫描线上任意两个相邻位置处的宽度不相同。图8中，扫描线7的延伸方向为其长度方向，扫描线在延伸方向上宽度连续变化。而宽度间断变化是指在扫描线上存在部分区域内相邻两个位置的宽度相同，而在部分区域内相邻两个位置的宽度不相同。在本实施例中，多个扫描线在基板上规则排布，因此，相邻两个扫描线之间的间隙在平行于扫描线的延伸方向上也呈现为连续变化或者间断变化。扫描线在延伸方向上，无论其宽度是连续变化还是间断变化都可以为周期性变化。
扫描线在延伸方向上的两条边均为波浪形，两条边的波峰相对设置，且波谷相对设置。如图8所示，延伸方向上的两条边的波峰T相对设置且波谷B相对设置，同一个扫描线波峰之间的宽度为W1，同一个扫描线波谷之间的宽度为W2，相邻两个扫描线波峰之间的间距为D1，相邻两个扫描线波峰之间的间距为D2。本实施例中，两条边均由同一圆弧形边相连而成。在其他的实施例中，两条边也可以均由同一椭圆形边相连而成，如图9所示。通过将扫描线7的两边设置成由圆弧形或者椭圆形形成的波浪形，可以确保扫描线上产生的衍射条纹能够向不同方向扩散，进而不会产生较为明显的衍射效应。
在一可选实施例中，在波浪形的扫描线的波谷相对处形成有第二连接部，第二连接部可为直线或者曲线。如图10所示，第二连接部为条状，第二连接部为扫描线7与开关器件电连接区域，即开关器件的控制端连接至第二连接部的位置。在其它的实施例中，第二连接部也可以采用其他不规则结构，如中间小两端大的形状，或者采用中间大两端小的形状。
在一可选实施例中，由于数据线为波浪形，相邻的数据线间具有第二间距，第二间距连续变化或间断变化；数据线的宽度连续变化或间断变化。数据线与扫描线类似，详见扫描线的具体描述，在此不再赘述。数据线可采用图8-10中的任意一种波浪形。数据线在延伸方向上的两条边均为波浪形，两条边的波峰相对设置，且波谷相对设置；数据线的波谷相对处形成有第三连接部，第三连 接部为数据线与开关器件电连接区域，数据线与扫描线的设置类似，详见扫描线的设置。
显示面板上的扫描线、数据线采用图8-10中的任意一种波浪形，可以确保在数据线和扫描线走线的延伸方向上，光线经过在不同宽度位置处以及相邻走线的不同间隙处时能够形成具有不同位置的衍射条纹，进而减弱衍射效应，以使得放置于显示面板下方的感光器件能够正常工作。
在一可选实施例中，第一电极的形状可为如图11所示的圆形，或者如图12所示的椭圆形，或者如图13所示的哑铃形，可以理解，第一电极还可以由其它各处具有不同曲率半径的曲线构成。由于光在穿过狭缝、小孔或者圆盘之类的障碍物时，会发生不同程度的弯散传播，从而偏离原来的直线传播，这种现象称之为衍射。衍射过程中，衍射条纹的分布会受到障碍物尺寸，例如狭缝的宽度、小孔的尺寸等的影响，具有相同宽度的位置处产生的衍射条纹的位置一致，从而会出现较为明显的衍射效应。通过将阳极形状改为圆形、椭圆形或者哑铃形，可以确保光线经过阳极层时，在阳极的不同宽度位置处能够产生具有不同位置以及扩散方向的衍射条纹，从而弱化衍射效应，进而确保摄像头设置在该显示面板下方时，拍照得到的图像具有较高的清晰度。
像素限定层上的开口在基板上的投影的各边互不平行且各边均为曲线，也即开口在各个方向上均具有变化的宽度且在同一位置具有不同衍射扩散方向，当外部光线经过该开口时，在不同宽度位置上能够产生具有不同位置和扩散方向的衍射条纹，进而不会产生较为明显的衍射效应，从而可以确保设置于该显示面板下方的感光元件能够正常工作。
传统的像素限定层上的开口均根据像素大小设置成长方形或者正方形。以长方形的开口为例进行说明，由于长方形存在两组相互平行的边，从而使得其在长度和宽度方向上均具有相同的宽度。因此，当外部光线经过该开口时，在 长度方向或者宽度方向的不同位置均产生具有相同位置且扩散方向一致的衍射条纹，从而会出现明显的衍射效应，使得位于该显示面板下方的感光元件无法正常工作。本实施例中的显示面板可以很好的解决该问题，确保显示面板下方的感光元件能够正常工作。
在一可选实施例中，开口在基板上的投影的各边采用的曲线可以为圆形、椭圆形和其它具有变化曲率的曲线中的至少一种。开口的各边为曲线，因此，当光线经过开口时，产生的衍射条纹不会朝着一个方向扩散，而是朝着360度方向扩散，从而使得衍射极不明显，具有较佳的衍射改善效果。
在一可选实施例中，开口在基板上的投影图形单元为圆形、椭圆形或者哑铃形或者波浪形，与第一电极的形状类似，请参照第一电极，参见图11-13，在此不再赘述。开口在基板上投影的形状可以根据对应的发光结构的形状来确定。例如，可以根据发光结构的长宽比来确定个数。在一实施例中，开口在基板上的投影形状还可以为轴对称结构，从而确保整个显示面板上的各像素具有一致的开口率，不会影响最终的显示效果。参见图11，开口在基板上的投影为一个圆形时，对应的发光结构形状为长宽比小于1.5的长方形或者正方形，开口投影的对称轴与相应发光结构的对称轴对应。投影中的圆的直径小于发光结构的最小宽度。具体地，投影的圆的直径可以根据发光结构的形状并综合开口率进行确定。由于确定过程可以采用传统的确定开口的尺寸的方法来确定，此处不赘述。
开口对应的子像素的长宽比在1.5到2.5之间。此时，投影为由两个圆形彼此连通形成哑铃形。两个圆分别沿对应的发光结构的长度方向排布。在一实施例中，两个圆之间有连接部，连接部的两边均为曲线，而确保光线经过连接部时，也能够向各个方向扩散，从而改善衍射效果。
开口对应的发光结构的长宽比大于2.5。此时，投影为由三个以上圆形彼此连通而成的波浪形。三个以上圆形分别沿对应的发光结构的长度方向排布。在 一实施例中，投影中还形成有连接部。连接部为弧线，也即三个以上圆形的相交处采用弧线连接，从而确保光线经过连接部时，也能够向各个方向扩散，从而改善衍射效果。
当开口对应的发光结构的长宽比等于1.5时，投影可以为一个圆形，也可以为两个圆形彼此连通的哑铃形。当开口对应的发光结构的长宽比等于2.5时，投影可以为两个圆形彼此连通的哑铃形，也可以为由三个圆形彼此连通的波浪形，如图14所示。
在一可选实施例中，参见图11-13，子像素的形状与上述开口的形状相同，即子像素为圆形、椭圆形或者哑铃形。进一步的，阳极的形状设计规则也可参照上述开口的设计规则，可以进一步改善衍射效果。当然，阳极也可采用常规的矩形形状设计。
本实施例还提供一种显示屏，包括第一显示区，在第一显示区设置有上述任一实施例中所提及的显示面板，第一显示区下方可设置感光器件。
由于第一显示区采用了前述实施例中的显示面板，因此当光线经过该显示区域时，不会产生衍射效应或者削弱衍射效应，从而能够确保位于该第一显示区下方的感光器件能够正常工作。可以理解，第一显示区在感光器件不工作时，可以正常进行动态或者静态画面显示，而在感光器件工作时则需要处于不显示状态，从而确保感光器件能够透过该显示面板正常进行光线采集，消除或者减少衍射，从而提高感光元件的成像质量。
上述显示屏还包括第二显示区，第二显示区设置的显示面板为PMOLED显示面板或AMOLED显示面板。
在一实施例中，如图15所示，显示屏包括第一显示区161和第二显示区162，第一显示区161和第二显示区162均用于显示静态或者动态画面，其中，第一显示区161采用上述任一实施例中所提及的显示面板，第一显示区161位于显示屏的上部。
在一可替换实施例中，显示屏还可包括三个甚至更多个显示区域，如包括三个显示区域(第一显示区域、第二显示区域和第三显示区域)，第一显示区域采用上述任一实施例中所提及的显示面板，第二显示区域和第三显示区域采用何种显示面板，本实施例对此不作限定，可以为PMOLED显示面板，也可为AMOLED显示面板，当然，也可以采用本实施例中的显示面板。
本实施例还提供一种显示终端，包括覆盖在设备本体上的上述显示屏。上述显示终端可以为手机、平板、电视机、显示器、掌上电脑、ipod、数码相机、导航仪等具有显示功能的产品或者部件。
图16为一实施例中的显示终端的结构示意图，该显示终端包括设备本体810和显示屏820。显示屏820设置在设备本体810上，且与该设备本体810相互连接。其中，显示屏820可以采用前述任一实施例中的显示屏，用以显示静态或者动态画面。
图17为一实施例中的设备本体810的结构示意图。在本实施例中，设备本体810上可设有开槽区812和非开槽区814。在开槽区812中可设置有诸如摄像头930以及光传感器、光线感应器等感光器件。此时，显示屏820的第一显示区的显示面板对应于开槽区812贴合在一起，以使得上述的诸如摄像头930及光传感器等感光器件能够透过该第一显示区对外部光线进行采集等操作。由于第一显示区中的显示面板能够有效改善外部光线透射该第一显示区所产生的衍射现象，从而可有效提升显示终端中摄像头930所拍摄图像的质量，避免因衍射而导致所拍摄的图像失真，同时也能提升光传感器感测外部光线的精准度和敏感度。
虽然结合附图描述了本申请的实施例，但是本领域技术人员可以在不脱离本申请的精神和范围的情况下作出各种修改和变型，这样的修改和变型均落入由所附权利要求所限定的范围之内。

Claims (20)

  1. 一种显示面板，包括：
    基板，包括第一面和第二面，所述第一面用于外部光的射入，所述第二面用于外部光的射出；
    至少一个衍射消除结构，设置于所述基板的第二面，用于减弱或消除外部光穿过所述基板在所述第二面形成的衍射光。
  2. 根据权利要求1所述的显示面板，其中，所述衍射消除结构为吸收层或反射层。
  3. 根据权利要求1所述的显示面板，其中，所述衍射消除结构包括吸收层和反射层,所述反射层设置于所述吸收层上。
  4. 根据权利要求3所述的显示面板，其中，所述吸收层的材料是光吸收率大于70％的材料；和/或，所述反射层的材料是光反射率大于90％的材料。
  5. 根据权利要求1所述的显示面板，其中，所述衍射消除结构具有多个凹槽，所述凹槽的内壁为曲面，所述曲面的纵截面的曲线包括多段相连的不同曲率半径的曲线。
  6. 根据权利要求5所述的显示面板，其中，所述多段相连的不同曲率半径的曲线中的每一段曲线的曲率半径主要根据衍射光的级次、衍射光的波长以及衍射光的入射方向确定。
  7. 根据权利要求5所述的显示面板，其中，所述多段相连的不同曲率半径的曲线中的每一段曲线的曲率半径通过如下公式确定，
    Figure PCTCN2019090894-appb-100001
    其中，k为衍射级次，λ为衍射光的波长，θ为k级衍射光的衍射角，d为衍射面到接收面的距离，所述多段相连的不同曲率半径的曲线的曲率半径从所述凹槽的中心 向所述凹槽的槽口方向逐渐减小。
  8. 根据权利要求5所述的显示面板，其中，基板的第一面设置有像素阵列，所述凹槽与所述像素阵列中的子像素一一对应，所述凹槽的槽口宽度大于所述子像素的宽度。
  9. 根据权利要求5所述的显示面板，其中，所述多个凹槽通过第一连接部连接。
  10. 根据权利要求9所述的显示面板，其中所述第一连接部的厚度不大于10um。
  11. 根据权利要求5所述的显示面板，其中，所述凹槽的底部暴露出所述基板的第二面材料。
  12. 根据权利要求1所述的显示面板，还包括：
    设置于所述基板上的像素电路；
    设置于所述像素电路上的第一电极层，所述第一电极层包括多个第一电极，所述像素电路与所述第一电极为一一对应关系；
    像素限定层，所述像素限定层上具有多个开口，所述开口内设置有发光结构层，以形成多个子像素，所述子像素与所述第一电极一一对应；
    以及均与所述像素电路连接的扫描线和数据线。
  13. 根据权利要求12所述的显示面板，其中，所述第一电极、数据线以及扫描线中的一个或多个的材料是透明导电材料，所述透明导电材料的透光率大于90％。
  14. 根据权利要求12所述的显示面板，其中，多个所述扫描线沿第一方向并行延伸，多个所述数据线沿第二方向并行延伸，所述第一方向和第二方向相交，且所述扫描线和/或所述数据线在其延伸方向上的至少一条边为波浪形。
  15. 根据权利要求12所述的显示面板，其中，相邻的所述扫描线间具有第一间距，所述第一间距连续变化或间断变化；和/或，相邻的数据线间具有第二间距，所述第二间距连续变化或间断变化；和/或，所述扫描线的宽度连续变化或间断变化；和/或，所述数据线的宽度连续变化或间断变化。
  16. 根据权利要求14所述的显示面板，其中，所述扫描线在所述延伸方向上的两条边均为波浪形，所述两条边的波峰相对设置，且波谷相对设置；和/或，所述数据线在所述延伸方向上的两条边均为波浪形，所述两条边的波峰相对设置，且波谷相对设置。
  17. 根据权利要求16所述的显示面板，其中，所述扫描线的波谷相对处形成有第二连接部；所述第二连接部为条状；和/或，所述数据线的波谷相对处形成有第三连接部；所述第三连接部为条状。
  18. 根据权利要求12所述的显示面板，其中，所述第一电极为圆形、椭圆形或者哑铃形。
  19. 根据权利要求12所述的显示面板，其中，所述子像素为圆形、椭圆形或者哑铃形。
  20. 一种显示屏，包括第一显示区和第二显示区，所述第一显示区设置有如权利要求1-19任意一项所述的显示面板，所述第二显示区设置有无源矩阵有机发光二极管显示面板或有源矩阵有机发光二极管显示面板；所述第一显示区下方可设置感光器件。
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