WO2020087814A1

WO2020087814A1 - Display panel, display screen, and method for manufacturing display panel

Info

Publication number: WO2020087814A1
Application number: PCT/CN2019/076357
Authority: WO
Inventors: 谢峰
Original assignee: 云谷（固安）科技有限公司
Priority date: 2018-10-31
Filing date: 2019-02-27
Publication date: 2020-05-07
Also published as: CN110767690B; CN110767690A

Abstract

The present application provides a display panel, a display screen, and a method for manufacturing a display panel. The display panel comprises: a substrate; a substrate electrode, formed on the substrate; a pixel defining layer, formed on the substrate electrode of the substrate, a plurality of pixel openings being formed on the pixel defining layer, and light emitting structural layers contacting the substrate electrode being formed in the pixel openings; and an isolation column, formed on the pixel defining layer and used for isolating a first electrode material layer to form a plurality of first electrodes which are insulated from each other, the plurality of first electrodes being located on the light emitting structural layers. The isolation column comprises a plurality of isolation layers which are stacked in sequence, a step is formed between adjacent two isolation layers, and angles of adjacent two steps are different.

Description

Display panel, display screen and method for preparing display panel

Technical field

The present application relates to the field of display technology, in particular to a display panel, a display screen, and a method of preparing a display panel.

Background technique

With the rapid development of electronic devices, users have higher and higher requirements on the screen ratio, making the comprehensive screen display of electronic devices more and more concerned. Since electronic devices (such as mobile phones, tablet computers, etc.) need to integrate components such as front cameras, earpieces, and infrared sensing elements, it is usually necessary to form a slot (Notch) on the display screen of the electronic device to form a slotted area to accommodate the camera, Earpieces and infrared sensing elements and other components. The slotted area cannot be used to display pictures. However, for electronic devices with a camera function, outside light can enter the photosensitive element located below the display screen through the slotted area on the display screen. None of these electronic devices can realize a full-screen display in the true sense, that is, these electronic devices cannot display pictures in various areas of the entire display screen, for example, cannot display pictures in the camera area.

Summary of the invention

The present application provides a display panel, a display screen, and a method for preparing a display panel, which can improve the stability of the display panel.

An aspect of the present application provides a display panel, including:

Substrate

A substrate electrode, the substrate electrode is formed on the substrate;

A pixel definition layer formed on the substrate electrode of the substrate, and a plurality of pixel openings are formed on the pixel definition layer, and a light emitting structure in contact with the substrate electrode is formed in the pixel opening Layer; and

An isolation pillar formed on the pixel definition layer for blocking the first electrode material layer to form a plurality of first electrodes insulated from each other, the plurality of first electrodes being located on the light emitting structure layer ,

Wherein, the isolation column includes a plurality of partition layers stacked in sequence, a step is formed between two adjacent partition layers, and the angles of the two adjacent steps are different.

In some embodiments, in two adjacent steps, the angle of the step away from the substrate is smaller than the angle of the step near the substrate.

In some embodiments, the plurality of barrier layers include a first barrier layer and a second barrier layer stacked in sequence, the second barrier layer is closer to the substrate relative to the first barrier layer, the first The first electrode layer material is formed on the partition layer.

In some embodiments, the cross-section of the first barrier layer in the first direction is rectangular, and the cross-section of the second barrier layer in the first direction is in a shape where the upper base is smaller than the lower base. One direction is perpendicular to the extension direction of the isolation pillar and perpendicular to the substrate, and the extension direction of the isolation pillar is parallel to the substrate.

In some embodiments, the plurality of partition layers further include: a third partition layer and a fourth partition layer that are sequentially disposed under the second partition layer, the fourth partition layer being opposite to the third partition layer The layer is closer to the substrate; the cross-section of the fourth barrier layer in the first direction is shaped such that the upper bottom edge is larger than the lower bottom edge.

In some embodiments, the angle of the step formed between the first barrier layer and the second barrier layer is smaller than the angle of the step formed between the second barrier layer and the third barrier layer, the The angle of the step formed between the second barrier layer and the third barrier layer is smaller than the angle of the step formed between the third barrier layer and the fourth barrier layer.

In some embodiments, the fourth barrier layer, the third barrier layer, and the second barrier layer are films prepared by the same etching process, and the etching process is ion milling etching, plasma etching Etching, reactive ion etching.

In some embodiments, the etching selection ratio of the fourth partition layer and the third partition layer is greater than 1; the etching selection ratio of the second partition layer and the third partition layer is greater than 1.

In some embodiments, the material of the first barrier layer is photoresist, the material of the second barrier layer and the fourth barrier layer is silicon nitride, and the material of the third barrier layer is silicon oxide .

In some embodiments, multiple first electrodes extend in parallel in the same direction, and there is a gap between two adjacent first electrodes, and the extending direction of the first electrodes is parallel to the substrate.

In some embodiments, in the extending direction of the first electrode, the width of the first electrode continuously changes, and the pitch continuously changes.

In some embodiments, in the extending direction of the first electrode, the width of the first electrode varies intermittently, and the pitch of two adjacent first electrodes varies intermittently.

In some embodiments, a plurality of the substrate electrodes extend in parallel in the same direction, and there is a gap between two adjacent substrate electrodes, and the extension direction of the substrate electrodes is parallel to the substrate.

In some embodiments, in the extending direction of the substrate electrode, the width of the substrate electrode continuously changes, and the pitch continuously changes.

In some embodiments, in the extending direction of the substrate electrode, the width of the substrate electrode varies intermittently, and the spacing between two adjacent substrate electrodes varies intermittently.

Another aspect of the present application provides a method of preparing a display panel, the method including:

Providing a substrate and forming substrate electrodes on the substrate;

Forming a pixel definition layer on the substrate electrode, and forming a plurality of pixel openings on the pixel definition layer;

Forming an isolation pillar on the pixel definition layer;

Forming a light emitting structure layer in contact with the substrate electrode in the pixel opening;

Laying a first electrode material layer in one layer on the substrate having the isolation pillar and the light emitting structure layer, the isolation pillar blocking the first electrode material layer to form a plurality of mutually insulated first electrodes, The plurality of first electrodes are located on the light emitting structure layer;

Wherein, the isolation pillar includes a plurality of stacked barrier layers, a step is formed between two adjacent barrier layers, and the angles of the two adjacent steps are different.

In some embodiments, the process of forming an isolation pillar on the pixel definition layer includes:

Depositing a fourth barrier film layer on the pixel definition layer;

Depositing a third barrier film layer on the fourth barrier film layer;

Removing part of the third barrier film layer to form a third barrier layer;

Depositing a second blocking film layer on the pixel defining layer having the third blocking layer;

Forming a first barrier layer on the second barrier film layer; and

Using the first barrier layer and the third barrier layer as masks, the second barrier film layer and the fourth barrier film layer are etched to form a second barrier layer and a fourth barrier layer, respectively.

Depositing silicon nitride material on the pixel definition layer to form a fourth barrier film layer;

Depositing silicon oxide material on the fourth barrier film layer to form a third barrier film layer;

Removing part of the silicon oxide material of the third barrier film layer to form a third barrier layer;

Depositing a silicon nitride material on the pixel defining layer with the third barrier layer to form a second barrier film layer;

Forming a first barrier layer on the second barrier film layer; and

Using the first and third barrier layers as masks, the silicon nitride materials of the second and fourth barrier films are etched to form second and fourth barrier layers, respectively .

In some embodiments, the etch selection ratio of the fourth barrier layer to the third barrier layer is greater than 1; the etch selection ratio of the second barrier layer to the third barrier layer is greater than 1.

Yet another aspect of the present application provides a display screen having a first display area and a second display area. Both the first display area and the second display area are used to display a picture. A photosensitive device may be provided below the second display area. The display screen includes a first display panel provided in the first display area and a second display panel provided in the second display area. The first display panel and the second display panel are formed on the same substrate. The light transmittance of the second display panel is greater than the light transmittance of the first display panel. The second display panel is the display panel in any of the above embodiments.

In some embodiments, the first display panel is an AMOLED display panel, and the second display panel is a PMOLED display panel.

In the above display panel, display screen, and method for preparing a display panel, since the isolation column includes a plurality of partition layers stacked in sequence, and steps are formed between two adjacent barrier layers, the angles of the two adjacent steps are different Therefore, the isolation column can effectively block the first electrode material layer to form a plurality of first electrodes insulated from each other, so that adjacent first electrodes will not be connected, so that the display panel can work stably.

BRIEF DESCRIPTION

In order to more clearly explain the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings used in the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application. Those of ordinary skill in the art can obtain drawings of other embodiments according to these drawings without paying any creative labor.

FIG. 1 is a schematic structural diagram of a display panel;

2 is a schematic structural diagram of a display panel according to an embodiment of the present application;

3 is a schematic structural diagram of an isolation column according to an embodiment of the present application;

4 is a schematic structural diagram of an isolation column according to another embodiment of the present application;

5 is a schematic diagram of a plan layout of a first electrode according to an embodiment of the present application;

6 is a schematic diagram of a projection of a pixel opening on a substrate according to an embodiment of the application;

7 is a schematic structural diagram of a display terminal according to an embodiment of the present application;

8 is a schematic structural diagram of the device body in FIG. 7;

9 is a schematic structural view of the composite screen in FIG. 7;

10 to 15 are schematic cross-sectional views of a preparation process of an isolation column according to an embodiment of the present application.

detailed description

In order to facilitate understanding of the present application, the present application will be described more fully below with reference to related drawings. Some embodiments of the present application are given in the drawings. However, the present application can be implemented in many different forms and is not limited to the embodiments described herein. The purpose of providing these embodiments is to be able to understand the disclosure of the application more thoroughly and comprehensively.

In describing the positional relationship, unless otherwise specified, when an element such as a layer, film, or substrate is described as being disposed "on" another film layer, the element may be directly disposed on the other film layer, or There may be one or more intermediate film layers. Further, when an element is described as being disposed "under" another film layer, the element may be directly disposed under the other film layer, or one or more intermediate film layers may also be present. When a film layer is described as being disposed "between" two film layers, the film layer may be the only film layer disposed between the two film layers, or there may be one or more between the two film layers One interlayer.

FIG. 1 is a schematic structural diagram of a display panel. The display panel includes a substrate, a second electrode (or may also be referred to as a substrate electrode) stacked in sequence, a pixel definition layer, a spacer, and a plurality of first electrodes. Generally, a negative photoresist is used to prepare the spacer. The process of preparing a spacer using a negative photoresist requires an exposure process. However, due to the material characteristics of the negative photoresist and the mechanism of the exposure process, the prepared post cannot have the desired height and tilt angle. Therefore, the connection of the plurality of first electrodes on the spacer is likely to occur, resulting in malfunction of the display panel.

The present application provides a display panel, a display screen, a method for preparing a display panel, and a display terminal, which can improve the controllability and stability of the display panel.

2 is a schematic structural diagram of a display panel according to an embodiment of the present application. As shown in FIG. 2, this embodiment provides a display panel. The display panel includes a substrate 11, a second electrode (or may also be referred to as a substrate electrode), a pixel definition layer, a spacer 12, and a first electrode 13 that are sequentially stacked. The pixel definition layer may form a plurality of pixel openings. A light emitting structure layer may be provided in the plurality of pixel openings, and the light emitting structure layer may be in contact with the second electrode. The spacer 12 is provided on the pixel definition layer.

In the process of preparing the first electrode 13, the first electrode material layer is laid on the substrate 11 provided with the separation column 12, and the separation column 12 can cut off the first electrode material layer to form mutually insulated Multiple first electrodes 13.

The isolation pillar 12 may include a plurality of

partition layers

121 and 122 stacked in sequence, and a step 14 is formed between two adjacent partition layers 121 and 122. Further, the angles of the two adjacent steps 14 are different, so that the first electrode material layer can be effectively cut off, so that there is no coupling between the formed plurality of first electrodes 13. Furthermore, the angle of the step 14 away from the substrate 11 in the two adjacent steps 14 is smaller than the angle of the step 14 close to the substrate 11, so that the first electrode material layer can be more effectively cut off to ensure the adjacent first electrode 13 No connection occurs, so that the display panel can work stably. The spacer 12 extends in a plane parallel to the substrate 11. The direction perpendicular to the extending direction of the spacer 12 and perpendicular to the substrate 11 may be defined as the first direction. The angle of the step 14 is the included angle θ of the cross section of the step 14 in the first direction, that is, the included angle θ formed at the intersection of the cross sections of the two adjacent barrier layers 121 and 122 forming the step 14 in the first direction .

In the above embodiment, since the isolation pillar 12 includes a plurality of barrier layers 121 and 122 stacked in sequence, two adjacent barrier layers 121 and 122 may form a step 14, and the two adjacent steps 14 are far from the substrate 11 The angle of the step 14 is smaller than the angle of the step 14 close to the substrate 11, so the isolation column 12 can more effectively block the first electrode material layer, so that the adjacent first electrodes 13 are not connected, so that the display panel can work stably.

FIG. 3 is a schematic structural diagram of an isolation column according to an embodiment of the present application. As shown in FIG. 3, in an embodiment, the isolation pillar 20 may include a first barrier layer 21 and a second barrier layer 22 that are sequentially stacked. The second barrier layer 22 is closer to the substrate 11 than the first barrier layer 21 is. In this embodiment, the second barrier layer 22 may be disposed on the pixel definition layer, and the first barrier layer 21 may be disposed on the second barrier layer 22. A first electrode material layer may be provided on the first blocking layer 21, and the first blocking layer 21 blocks the first electrode material layer to form a plurality of first electrodes 13 insulated from each other.

The spacer 20 extends in a plane parallel to the substrate 11. The cross-section of the first partition layer 21 in the first direction may be rectangular. The cross-section of the second partition layer 22 in the first direction may have a shape with an upper bottom edge smaller than a lower bottom edge, for example, a regular trapezoid. For example, the side of the second partition layer 22 close to the pixel definition layer may be a long bottom side, and the side of the second partition layer 22 close to the first partition layer 21 may be a short bottom side, and the The length of the cross-section near the bottom edge of the second partition layer 22 is greater than the length of the short bottom edge of the second partition layer 22. Therefore, a step 23 is formed between the first barrier layer 21 and the second barrier layer 22, and the angle φ of the step 23 is less than 90 degrees.

In the above embodiment, the isolation pillar 20 includes at least two

partition layers

21, 22, wherein the cross section of the first partition layer 21 in the first direction is rectangular, and the cross section of the second partition layer 22 in the first direction is upper bottom The side is smaller than the shape of the bottom side, and a step 23 is formed between two adjacent barrier layers 21 and 22. The step 23 of the isolation pillar 20 makes it difficult for the two adjacent first electrodes 13 to be connected, so that the two adjacent first electrodes 13 can be insulated, and the display panel can work stably.

4 is a schematic structural diagram of an isolation column according to another embodiment of the present application. As shown in FIG. 4, in an embodiment, the isolation pillar 30 may include at least four partition layers stacked in sequence from bottom to top: a fourth partition layer 34, a third partition layer 33, a second partition layer 32, and a first Partition 31. In this embodiment, the fourth partition layer 34 may be disposed on the pixel definition layer. The first blocking layer 31 may block the first electrode material layer to form a plurality of first electrodes 13 that are insulated from each other.

In the present embodiment, the spacer 30 extends in a plane parallel to the substrate 11. The cross-section of the fourth partition layer 34 in the first direction may have a shape with an upper base greater than a lower base, such as an inverted trapezoid. For example, in the cross section of the fourth partition layer 34, the bottom edge near the pixel definition layer is a short bottom edge, and the bottom edge away from the pixel definition layer is a long bottom edge. The cross section of the third barrier layer 33 in the first direction may be rectangular. In the cross section of the third partition layer 33, the length of the bottom side of the third partition layer 33 near the fourth partition layer 34 is greater than or equal to the length of the long bottom side of the fourth partition layer 34. Therefore, a step 35 is formed between the fourth barrier layer 34 and the third barrier layer 33, and the angle α of the step 35 is greater than 90 degrees. The cross-section of the second partition layer 32 in the first direction may have a shape with an upper bottom edge smaller than a lower bottom edge, for example, a regular trapezoid. For example, in the cross section of the second barrier layer 32, the bottom edge near the pixel definition layer is a long bottom edge, and the bottom edge away from the pixel definition layer is a short bottom edge. A step 36 is formed between the third barrier layer 32 and the second barrier layer 32, and the angle β of the step 36 is about 90 degrees. The first partition layer 31 may have a rectangular cross-section in the first direction. In the cross section of the first partition layer 31, the length of the bottom side of the first partition layer 31 near the second partition layer 32 is greater than the length of the short bottom side of the second partition layer 32. Therefore, a step 37 is formed between the second barrier layer 32 and the first barrier layer 31, and the angle ω of the step 37 is less than 90 degrees. In this embodiment, the first barrier layer 31 and the second barrier layer 32, the second barrier layer 32 and the third barrier layer 33, and the third barrier layer 33 and the fourth barrier layer 34 are respectively formed The

steps

37, 36, and 35, and the angle of the two adjacent steps formed are different, the angle ω of the step 37 is smaller than the angle β of the step 36, and the angle β of the step 36 is smaller than the angle α of the step 35.

In the above embodiment, the isolation pillar 12 includes at least four

barrier layers

31, 32, 33, 34 stacked in sequence, and steps 35, 36, 37 are formed between two adjacent barrier layers, and two adjacent steps The angle of the step far away from the substrate 11 in the middle is smaller than the angle of the step closer to the substrate 11, so that the isolation pillar 12 can more effectively block the first electrode material layer, so that the formed plurality of first electrodes 13 can be insulated from each other, improving the display panel Stability.

As shown in FIG. 4, in an embodiment, the fourth barrier layer 34, the third barrier layer 33, and the second barrier layer 32 may be film layers prepared by the same etching process. In this embodiment, the etching process may be one of ion milling etching, plasma etching, reactive ion etching and other dry etching processes. When plasma etching is used, the ambient air pressure can be maintained at 10 to 100 Pa, or 200 to 300 Pa, or 300 to 900 Pa, or 900 to 1000 Pa.

Further, in this embodiment, the etching selection ratio of the fourth partition layer 34 and the third partition layer 33 is greater than 1; the etching selection ratio of the second partition layer 32 and the third partition layer 33 is greater than 1. During the etching process, the etching rate of the side of the fourth barrier layer 34 away from the third barrier layer 33 is greater than the etching rate of the side of the fourth barrier layer 34 closer to the third barrier layer 33; The etching rate of the side of the third barrier layer 33 is greater than the etching rate of the side of the second barrier layer 32 close to the third barrier layer 33. Therefore, the fourth partition layer 34 may have a shape in which the upper bottom side is larger than the lower bottom side, and the second partition layer 32 may have a shape in which the upper bottom side is smaller than the lower bottom side.

In order to satisfy the above etching selection ratio, in some embodiments, the material of the first barrier layer 31 may be photoresist, the material of the second barrier layer 32 and the fourth barrier layer 34 may be silicon nitride, and the third barrier The material of the layer 33 may be silicon oxide.

In the above embodiments, the fourth isolation layer 34, the third isolation layer 33, and the second isolation layer 32 are simultaneously prepared by the same etching process, which effectively reduces the manufacturing cost. Since the etching selection ratio of the fourth isolation layer 34 and the third isolation layer 33 is greater than 1, the etching selection ratio of the second isolation layer 32 and the third isolation layer 33 is greater than 1, so that the isolation pillar formed after etching has at least The two steps with different angles can effectively block the first electrode material layer and improve the stability of the display panel.

FIG. 5 shows a schematic plan layout of the first electrode 41 according to an embodiment of the present application. For ease of description, FIG. 5 only shows parts related to the embodiments of the present application.

As shown in FIG. 5, in some embodiments of the present application, the first electrode 41 extends in a wave shape in a direction parallel to the substrate 42. The plurality of first electrodes 41 extend in parallel in the same direction, and there is a gap between adjacent first electrodes 41. In the extending direction of the first electrode 41, the width of the first electrode 41 changes continuously or intermittently, and the pitch between adjacent first electrodes 41 changes continuously or intermittently. The width of the first electrode 41 refers to the width of the first electrode 41 in a direction parallel to the substrate 11 and perpendicular to the extending direction of the first electrode 41.

The continuous change of the width of the first electrode 41 means that the width of the first electrode 41 at any two adjacent positions is different in the extending direction of the first electrode 41.

The discontinuous change of the width of the first electrode 41 means that in the extending direction of the first electrode 41, the width of the first electrode 41 at the two adjacent positions in the partial area is the same, and the adjacent two in the partial area The width at the location is different.

In the extending direction of the first electrode 41, regardless of whether the width of the first electrode 41 changes continuously or intermittently, the width of the first electrode 41 may change periodically. The length of one change period in the extending direction of the first electrode 41 may correspond to the width of one pixel.

In some embodiments, the plurality of first electrodes 41 are regularly arranged on the substrate 42, therefore, the spacing between two adjacent first electrodes 41 also continuously changes or is intermittent in the extending direction of the first electrodes 41 Variety.

In the above embodiment, a plurality of wavy first electrodes 41 are provided, and in the extending direction of the first electrode 41, the width of the first electrode 41 changes continuously or intermittently, so that the adjacent first electrodes 41 The pitch changes continuously or intermittently. Therefore, at different width positions of the first electrode 41 and at different pitches of the adjacent first electrodes 41, the distribution positions of the generated diffraction fringes are different. The derivative effects at different positions can cancel each other, so the diffraction effect of the entire display panel can be effectively reduced, thereby improving the clarity of the image captured by the camera disposed under the display panel.

In an embodiment, a plurality of second electrodes extending in parallel in the same direction may also be provided, and there is a gap between two adjacent second electrodes. In the extending direction of the second electrode, the width of the second electrode may be continuously changed or intermittently changed, and the interval between two adjacent second electrodes may also be continuously changed or intermittently changed. The structure of the second electrode in this embodiment is similar to the structure of the first electrode in the above embodiment, and will not be repeated here.

The present application also provides a method for preparing a display panel. The method may include:

Step S1: A substrate 11 is provided, and a second electrode is formed on the substrate 11.

In this embodiment, the substrate 11 may be made of a plastic material such as glass material, metal material, or polyethylene terephthalate (PET), polyethylene naphthalate (PEN), or polyimide. Suitable materials are formed.

After the substrate 11 is formed, a plurality of second electrodes can be formed on the substrate 11. In some embodiments, the second electrode may be an anode. The second electrode can be made of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium oxide (In ₂ O ₃ ), indium gallium oxide (IGO), or aluminum zinc oxide (AZO). Prepared from one or more materials.

Step S2: forming a pixel definition layer on the second electrode, and forming a plurality of pixel openings on the pixel definition layer.

FIG. 6 shows a schematic diagram of the projection of the pixel opening 51 on the substrate 50 in an embodiment of the present application. For ease of description, FIG. 6 only shows parts related to the embodiments of the present application.

As shown in FIG. 6, in some embodiments of the present application, the curve pattern of the projection of the pixel opening 51 on the substrate 50. Therefore, the pixel opening 51 has a varying width in each direction and has different diffraction diffusion directions at the same position. In the diffraction process, the size of obstacles (such as the width of slits, the size of small holes, etc.) will affect the distribution of diffraction fringes. The distribution positions of the diffraction fringes generated at the positions with the same width are consistent, so that a more obvious diffraction effect will appear. When external light passes through the pixel opening, diffraction stripes with different distribution positions and diffusion directions can be generated at different width positions, which can effectively reduce the diffraction effect, thereby ensuring that the photosensitive element provided under the display panel can work normally.

In some embodiments, the projection of the pixel opening 51 on the substrate 50 is a graphic unit or a plurality of graphic units communicating with each other. The graphic unit may be circular or elliptical. The graphic unit may also be composed of curves with different radii of curvature. The number of graphics units can be determined according to the shape of the corresponding sub-pixel. For example, the number of graphics units can be determined according to the aspect ratio of the sub-pixels. When determining the number of graphic units, it is necessary to take into account the aperture ratio of the pixels. In some embodiments, the graphic unit may also be an axisymmetric graphic, so as to ensure that each pixel on the entire display panel has a uniform aperture ratio, so that the display panel has a uniform display effect.

Step S3: forming an isolation pillar 30 on the pixel definition layer. The isolation pillar 30 includes a plurality of partition layers 31, 32, 33, and 34 stacked in sequence, and a step 35 is formed between adjacent partition layers 31, 32, 33, and 34. 36, 37.

The isolation column 30 may be formed by sequentially stacking a plurality of partition layers 31, 32, 33, and 34, and steps 35, 36, and 37 may be formed between two adjacent partition layers 31, 32, 33, and 34. Further, the angles of the two adjacent steps are different, and the angle of the step away from the substrate 11 in the two adjacent steps is smaller than the angle of the step near the substrate 11.

Step S4: forming a light emitting structure layer in contact with the second electrode in the pixel opening.

The pixel opening may be filled with an organic material capable of electroluminescence to form a light emitting structure layer, and the light emitting structure layer may be in contact with the second electrode.

Step S5: laying the first electrode material layer on the substrate 11 with the isolation column 30 and the light-emitting structure layer in one layer, the isolation column 30 partitions the first electrode material layer to form a plurality of first electrodes 13 insulated from each other The first electrode 13 is located on the light emitting structure layer.

After forming the isolation pillar 30, a first electrode material layer may be laid over the isolation pillar 30, and the isolation pillar 30 may isolate the first electrode material layer and form a plurality of first electrodes 13 insulated from each other. In this embodiment, the first electrode 13 may be a cathode. The first electrode 13 may be made of silver (Ag), magnesium (Mg), aluminum (Al), platinum (Pt), palladium (Pd), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir) , Chromium (Cr) and other materials are prepared.

In the above embodiment, since the isolation column 30 includes a plurality of barrier layers 31, 32, 33, 34 stacked in sequence, steps 35, 36, 37 are formed between two adjacent barrier layers 31, 32, 33, 34, The two

adjacent steps

35, 36, 37 have different angles, and the angle of the step away from the substrate 50 in the two adjacent steps is smaller than the angle of the step near the substrate 50, so that the isolation column 30 can more effectively block the first step An electrode material layer, so that no connection between adjacent first electrodes 13 occurs, so that the display panel can work stably.

10 to 15 show schematic cross-sectional views of the preparation process of an isolation column according to an embodiment of the present application.

In some embodiments, the process of forming the isolation pillar on the pixel definition layer may specifically include:

Depositing a fourth barrier film layer 104 on the pixel definition layer;

Depositing a third barrier film layer 103 on the fourth barrier film layer 104;

Removing a portion of the third barrier film layer 103 to form a third barrier layer 1030;

Depositing a second barrier film layer 102 on the pixel defining layer with the third barrier layer 1030;

Forming a first barrier layer 1010 on the second barrier film layer 102; and

Using the first barrier layer 1010 and the third barrier layer 1030 as masks, the second barrier film layer 102 and the fourth barrier film layer 104 are etched to form the second barrier layer 1020 and the fourth barrier layer 1040, respectively.

Step S10: deposit silicon nitride material on the pixel definition layer to form a fourth blocking film layer 104.

Specifically, as shown in FIG. 10, the fourth barrier film layer 104 may be prepared on the substrate 100 using silicon nitride material.

Step S11: deposit silicon oxide material on the fourth barrier film layer 104 to form a third barrier film layer 103.

Specifically, as shown in FIG. 11, a silicon oxide material may be used to form a third barrier film layer 103 on the fourth barrier film layer 104 that has been prepared.

Step S12: Remove part of the silicon oxide material of the third barrier film layer 103 to form a third barrier layer 1030.

Specifically, as shown in FIG. 12, a part of the silicon oxide material of the third barrier film layer 103 may be removed by processes such as dry etching or wet etching to form a third barrier layer 1030.

Step S13: deposit a silicon nitride material on the pixel defining layer with the third barrier layer 1030 to form the second barrier film layer 102.

Specifically, as shown in FIG. 13, after the third barrier layer 1030 is formed, a second barrier film layer 102 may be further prepared using silicon nitride material, and the second barrier film layer 102 may be disposed on the third barrier layer 1030.

Step S14: forming a first barrier layer 1010 on the second barrier film layer 102.

Specifically, as shown in FIG. 14, a negative photoresist material may be used to prepare a first barrier layer 1010 on the second barrier film layer 102.

Step S15, using the first and

third barrier layers

1010 and 1030 as masks to etch the silicon nitride materials of the second and fourth barrier film layers 102 and 104 to form the second and second barrier layers 1020 and 10, respectively Partition 1040.

Specifically, as shown in FIG. 15, the first barrier layer 1010 and the third barrier layer 1030 can be used as a mask to etch the second barrier film layer 102 and the fourth barrier film layer 104 to obtain the second barrier layer 1020 and fourth partition 1040.

In some embodiments, the etch selection ratio of the fourth barrier layer 1040 and the third barrier layer 1030 is greater than 1; the etch selection ratio of the second barrier layer 1020 and the third barrier layer 1030 is greater than 1. Therefore, the angle of the step formed between the first barrier layer 1010 and the second barrier layer 1020 is smaller than the angle of the step formed between the second barrier layer 1020 and the third barrier layer 1030, and the second barrier layer 1020 and the third barrier layer The angle of the step formed between 1030 is smaller than the angle of the step formed between the third barrier layer 1030 and the fourth barrier layer 1040.

In the above embodiment, the isolation column includes at least four

barrier layers

1010, 1020, 1030, and 1040 stacked in sequence, and a step is formed between two

adjacent barrier layers

1010, 1020, 1030, and 1040. The angles of the steps are different, so that the spacers can effectively block the first electrode material layer to form a plurality of first electrodes 13 insulated from each other, thereby improving the performance stability of the display panel.

The application also provides a display screen. The display screen has a first display area and a second display area. Both the first display area and the second display area are used to display pictures, such as dynamic or static pictures. A photosensitive device may be provided below the second display area. The display screen includes a first display panel disposed in the first display area and a second display panel disposed in the second display area. The first display panel and the second display panel may be formed on the same substrate. The light transmittance of the second display panel is greater than that of the first display panel. The second display panel is the display panel described in any of the above embodiments.

Further, the second display panel may include a substrate 11, a second electrode, a pixel definition layer, a spacer 12, and a first electrode 13 that are sequentially stacked. A plurality of pixel openings are formed in the pixel definition layer, and a light emitting structure layer in contact with the second electrode is formed in the pixel openings. The isolation column 12 is used to block the first electrode material layer to form a plurality of first electrodes 13 that are insulated from each other. The isolation pillar 12 may include a plurality of partition layers stacked in sequence, steps are formed between adjacent partition layers, two adjacent steps have different angles, and an angle of a step away from the substrate 11 in the two adjacent steps is less The angle of the step near the substrate 11.

In the display screen of the above embodiment, since the isolation column 12 includes a plurality of partition layers stacked in sequence, and steps may be formed between two adjacent partition layers, the two adjacent steps have different angles, and the adjacent The angle of the step away from the substrate 11 in the two steps is smaller than the angle of the step closer to the substrate 11, so that the isolation column 12 can effectively cut off the first electrode material layer, and the adjacent first electrodes will not be connected, so that the display screen can be stable jobs.

In some embodiments, the first display panel may be an AMOLED (Active-matrix organic light-emitting diode) display panel, and the second display panel may be a PMOLED (Passive-matrix organic light-emitting diode) display panel.

7 is a schematic structural diagram of a display terminal according to an embodiment of the present application. FIG. 8 is a schematic structural diagram of the device body 62 shown in FIG. 7. FIG. 9 is a schematic diagram of the structure of the composite screen 64 shown in FIG. 7.

This application also provides a composite screen. As shown in FIG. 9, the composite screen 64 includes an integrated AM (Active-matrix) screen 642 and PM (Passive-matrix) screen 644. The PM panel 644 may be provided with the display panel described in any embodiment of this application to improve the display performance and effect of the composite screen. The AM screen 642 may include an AMOLED display panel. The PM screen 644 may include a PMOLED display panel.

The present application also provides a display terminal 60. As shown in FIG. 7, the display terminal 60 may include a device body 62 and a composite screen 64. The composite screen 64 is overlaid on the device body 62, and the composite screen 64 and the device body 62 are connected to each other.

As shown in FIG. 8, the device body 62 may be provided with a non-device area 622 and a device area 624 (such as a slotted area). In the device area 624, photosensitive devices such as a camera 626 and a light sensor may be provided.

As shown in FIG. 9, the composite screen 64 may include an AM screen 642 and a PM screen 644.

As shown in FIGS. 7 and 8, when the composite screen 64 is attached and fixed on the device body 62, the PM screen body 644 can correspond to the above-mentioned device area 624, so the photosensitive device provided in the device area 624 can pass through the PM screen The external light of the body 644 is collected and sensed. The above PM screen 644 may include the display panel described in any one of the above embodiments, so that the adjacent first electrodes 13 can be effectively blocked to avoid short circuit of the adjacent first electrodes 13 and affect the display performance of the display terminal And effects.

The above-mentioned display terminal 60 may be an electronic device with a display screen, such as a mobile phone, a notebook computer, a smart watch, a smart bracelet. In addition, as shown in FIG. 9, in order to improve the light transmittance of the PM screen 644, the PM screen 644 can be placed in a non-display state when the photosensitive device is in operation, thereby improving the performance of the photosensitive device to collect external light.

The technical features of the embodiments described above can be combined arbitrarily. In order to simplify the description, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, they should be regarded as within the scope of this description.

The above-mentioned embodiments only express several implementation manners of the present application, and their descriptions are more specific and detailed, but they should not be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which all fall within the protection scope of the present application. Therefore, the protection scope of the patent of this application shall be subject to the appended claims.

Claims

A display panel, including:

Substrate

A plurality of substrate electrodes, the substrate electrodes are formed on the substrate;

A pixel definition layer formed on the substrate electrode, a plurality of pixel openings are formed on the pixel definition layer, and a light emitting structure layer in contact with the substrate electrode is formed in the pixel opening; and

An isolation pillar formed on the pixel defining layer, the isolation pillar partitioning the first electrode material layer to form a plurality of first electrodes insulated from each other, the plurality of first electrodes being located on the light emitting structure layer on,

Wherein, the isolation column includes a plurality of partition layers stacked in sequence, a step is formed between two adjacent partition layers, and the angles of the two adjacent steps are different.
The display panel according to claim 1, wherein in two adjacent steps, the angle of the step away from the substrate is smaller than the angle of the step closer to the substrate.
The display panel according to claim 1, wherein the plurality of barrier layers include a first barrier layer and a second barrier layer that are sequentially stacked, the second barrier layer being closer to the first barrier layer than the first barrier layer On the substrate, the first electrode layer material is formed on the first blocking layer.
The display panel according to claim 3, wherein a cross section of the first barrier layer in the first direction is rectangular, and a cross section of the second barrier layer in the first direction is that the upper bottom edge is smaller than the lower bottom edge In the shape, the first direction is perpendicular to the extension direction of the isolation pillar and perpendicular to the substrate, and the extension direction of the isolation pillar is parallel to the substrate.
The display panel according to claim 3, wherein the plurality of partition layers further comprise: a third partition layer and a fourth partition layer disposed in sequence below the second partition layer, the fourth partition layer facing each other The third partition layer is closer to the substrate; the cross-section of the fourth partition layer in the first direction has a shape with an upper bottom edge larger than a lower bottom edge.
The display panel according to claim 5, wherein the angle of the step formed between the first barrier layer and the second barrier layer is smaller than that formed between the second barrier layer and the third barrier layer The angle of the step, the angle of the step formed between the second barrier layer and the third barrier layer is smaller than the angle of the step formed between the third barrier layer and the fourth barrier layer.
The display panel according to claim 5, wherein the fourth barrier layer, the third barrier layer, and the second barrier layer are film layers prepared by the same etching process, and the etching process is ion One of milling etching, plasma etching, reactive ion etching.
The display panel according to claim 5, wherein an etching selection ratio of the fourth partition layer and the third partition layer is greater than 1; an etching selection ratio of the second partition layer and the third partition layer Ratio is greater than 1.
The display panel according to claim 5, wherein the material of the first barrier layer is photoresist, the material of the second barrier layer and the fourth barrier layer is silicon nitride, and the third barrier The material of the layer is silicon oxide.
The display panel according to claim 1, wherein the plurality of first electrodes extend in parallel in the same direction, and there is a gap between two adjacent first electrodes, and the extending direction of the first electrodes Parallel to the substrate.
The display panel according to claim 10, wherein in the extending direction of the first electrode, the width of the first electrode continuously changes, and the pitch of two adjacent first electrodes continuously changes ,or,

The width of the first electrodes varies intermittently, and the spacing between two adjacent first electrodes varies intermittently.
The display panel according to claim 1, wherein a plurality of the substrate electrodes extend in parallel in the same direction, and there is a gap between two adjacent substrate electrodes, and the extension direction of the substrate electrodes is The substrates are parallel.
The display panel according to claim 12, wherein the width of the substrate electrode continuously changes in the extending direction of the substrate electrode, and the pitch between two adjacent substrate electrodes continuously changes.
The display panel according to claim 12, wherein the width of the substrate electrode varies intermittently in the extending direction of the substrate electrode, and the pitch between two adjacent substrate electrodes varies intermittently.
A method for preparing a display panel, including:

Providing a substrate and forming substrate electrodes on the substrate;

Forming a pixel definition layer on the substrate electrode, and forming a plurality of pixel openings on the pixel definition layer;

Forming an isolation pillar on the pixel definition layer;

Forming a light emitting structure layer in contact with the substrate electrode in the pixel opening;

Laying a first electrode material layer in one layer on the substrate having the isolation pillar and the light emitting structure layer, the isolation pillar blocking the first electrode material layer to form a plurality of mutually insulated first electrodes, The plurality of first electrodes are located on the light emitting structure layer;

Wherein, the isolation column includes a plurality of partition layers stacked in sequence, a step is formed between two adjacent partition layers, and the angles of the two adjacent steps are different.
The method of manufacturing a display panel according to claim 15, wherein, in two adjacent steps, the angle of the step away from the substrate is smaller than the angle of the step closer to the substrate.
The method of manufacturing a display panel according to claim 15, wherein the process of forming the isolation pillars on the pixel definition layer includes:

Depositing a fourth barrier film layer on the pixel definition layer;

Depositing a third barrier film layer on the fourth barrier film layer;

Removing part of the third barrier film layer to form a third barrier layer;

Depositing a second blocking film layer on the pixel defining layer having the third blocking layer;

Forming a first barrier layer on the second barrier film layer; and

Using the first barrier layer and the third barrier layer as masks, the second barrier film layer and the fourth barrier film layer are etched to form a second barrier layer and a fourth barrier layer, respectively.
The method of manufacturing a display panel according to claim 17, wherein the process of forming the isolation pillars on the pixel definition layer includes:

Depositing silicon nitride material on the pixel definition layer to form a fourth barrier film layer;

Depositing silicon oxide material on the fourth barrier film layer to form a third barrier film layer;

Removing part of the silicon oxide material of the third barrier film layer to form a third barrier layer;

Depositing a silicon nitride material on the pixel defining layer with the third barrier layer to form a second barrier film layer;

Forming a first barrier layer on the second barrier film layer; and

Using the first and third barrier layers as masks, the silicon nitride materials of the second and fourth barrier films are etched to form second and fourth barrier layers, respectively .
The method for manufacturing a display panel according to claim 17, wherein an etching selection ratio of the fourth barrier layer to the third barrier layer is greater than 1; the ratio of the second barrier layer to the third barrier layer The etching selectivity ratio is greater than 1.
A display screen having a first display area and a second display area; both the first display area and the second display area are used to display a picture; a photosensitive device may be provided below the second display area; the display The screen includes a first display panel disposed in the first display area and a second display panel disposed in the second display area. The first display panel and the second display panel are formed on the same substrate. The light transmittance of the second display panel is greater than that of the first display panel; the second display panel is the display panel of any one of claims 1-14.