WO2020075704A1 - Pyridone compound, and agricultural and horticultural fungicide containing same as active ingredient - Google Patents

Pyridone compound, and agricultural and horticultural fungicide containing same as active ingredient Download PDF

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Publication number
WO2020075704A1
WO2020075704A1 PCT/JP2019/039619 JP2019039619W WO2020075704A1 WO 2020075704 A1 WO2020075704 A1 WO 2020075704A1 JP 2019039619 W JP2019039619 W JP 2019039619W WO 2020075704 A1 WO2020075704 A1 WO 2020075704A1
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group
substituent
optionally substituted
formula
solvent
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PCT/JP2019/039619
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French (fr)
Japanese (ja)
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英明 生島
豪毅 梅谷
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三井化学アグロ株式会社
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Priority to JP2020551160A priority Critical patent/JP7291151B2/en
Publication of WO2020075704A1 publication Critical patent/WO2020075704A1/en

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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/72Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms as ring hetero atoms
    • A01N43/74Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms as ring hetero atoms five-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,3
    • A01N43/781,3-Thiazoles; Hydrogenated 1,3-thiazoles
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/04Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond

Definitions

  • the present invention relates to a pyridone compound and an agrochemical containing the compound as an active ingredient.
  • Controlling diseases of agricultural and horticultural crops plays an important role in ensuring stable agricultural production. For this reason, various fungicides are used, but the use of fungicides over the years has led to the emergence of drug-resistant bacteria. Have been.
  • 1,3,5,6-substituted-2-pyridone compounds for example, 1,3,5,6-substituted-2 having an aryl group or a heteroaryl group at the 3-position as a GABA alpha-2 / 3 ligand -Pyridone compounds have been disclosed (see, for example, WO 98/55480).
  • 1,3,5,6-substituted-2-pyridone compounds having a carboxyl group at the 3-position have been disclosed as therapeutic agents for bacterial infections (for example, see European Patent No. 0308020).
  • An object of the present invention is to provide a novel compound which is effective as a fungicide for agricultural and horticultural use.
  • the present invention is as follows.
  • R1 is Hydroxyl group, Cyano group, A C1 to C6 alkyl group optionally substituted with a substituent A, A C1 to C6 haloalkyl group, A C3 to C8 cycloalkyl group which may be optionally substituted with a substituent A, A C2-C6 alkenyl group optionally substituted with a substituent A, A C2-C6 haloalkenyl group, A C2-C6 alkynyl group optionally substituted with a substituent A, A C2-C6 haloalkynyl group, A C1 to C6 alkoxy group optionally substituted with a substituent A, A C1 to C6 haloalkoxy group, A C3 to C8 cycloalkoxy group optionally substituted with a substituent A, A C2-C6 alkenyloxy group which may be optionally substituted with a substituent A, A C2-C6 haloalkenyloxy group
  • R2 is Hydrogen atom, Nitro group, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent A, A C1 to C6 haloalkyl group, A C3 to C8 cycloalkyl group which may be optionally substituted with a substituent A, A C2-C6 alkenyl group optionally substituted with a substituent A, A C2-C6 haloalkenyl group, A C2-C6 alkynyl group optionally substituted with a substituent A, A C2-C6 haloalkynyl group, A C1 to C6 alkoxy group optionally substituted with a substituent A, A C1 to C6 haloalkoxy group, A C3 to C8 cycloalkoxy group optionally substituted with a substituent A, A C2-C6 alkenyloxy group which may be optionally substituted with a substituent A, A C2-C6 haloalkenyloxy group, A C C2-C
  • R3 is Hydroxyl group, Cyano group, Nitro group, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent C, A C1 to C6 haloalkyl group, A C3 to C8 cycloalkyl group optionally substituted with a substituent C, A C2-C6 alkenyl group optionally substituted with a substituent C, C2-C6 haloalkenyl group, A C2 to C6 alkynyl group optionally substituted with a substituent C, A C2-C6 haloalkynyl group, A C1 to C6 alkoxy group optionally substituted with a substituent C, A C1 to C6 haloalkoxy group, A C3 to C8 cycloalkoxy group optionally substituted with a substituent C, A C2-C6 alkenyloxy group which may be optionally substituted with a substituent C, A C2-C6 haloalkenyloxy group, A C3
  • R4 is Hydroxyl group, Cyano group, Nitro group, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent C, A C1 to C6 haloalkyl group, A C3 to C8 cycloalkyl group optionally substituted with a substituent C, A C2-C6 alkenyl group optionally substituted with a substituent C, C2-C6 haloalkenyl group, A C2 to C6 alkynyl group optionally substituted with a substituent C, A C2-C6 haloalkynyl group, A C1 to C6 alkoxy group optionally substituted with a substituent C, A C1 to C6 haloalkoxy group, A C3 to C8 cycloalkoxy group optionally substituted with a substituent C, A C2-C6 alkenyloxy group which may be optionally substituted with a substituent C, A C2-C6 haloalkenyloxy group, A C3
  • Het Represents a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, or a thiatriazolyl group
  • R3 is appropriately substituted by 0 to 2 (provided that when there is disubstituted R3, R3 represents each independent substituent).
  • R1 is A C1 to C6 alkyl group optionally substituted with a substituent A, Or represents a C1-C6 haloalkyl group
  • R2 is Hydrogen atom, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent A, A C1 to C6 haloalkyl group, A C2-C6 alkynyl group optionally substituted with a substituent A, Or represents a C1-C6 alkoxy group which may be optionally substituted with a substituent A
  • Het Represents a thiazolyl group or a thiadiazolyl group, In the thiazolyl group or the thiadiazolyl group, R3 is appropriately substituted by 0 to 2 (provided that when there is disubstituted R3, R3 represents each independent substituent).
  • R3 is Cyano group, Nitro group, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent C, A C1 to C6 haloalkyl group, A C3 to C8 cycloalkyl group optionally substituted with a substituent C, A C2-C6 alkenyl group optionally substituted with a substituent C, A C2 to C6 alkynyl group optionally substituted with a substituent C, A C1 to C6 alkoxy group optionally substituted with a substituent C, RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group).
  • an alkyl group, or Ra and Rb represent an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group together with the nitrogen atom to which they are attached.
  • R4 is Cyano group, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent C, A C1 to C6 haloalkyl group, A C1 to C6 alkoxy group optionally substituted with a substituent C, Or represents a C1-C6 haloalkoxy group;
  • R5 is Hydroxyl group, Cyano group, Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent C, A C1 to C6 haloalkyl group, A C2-C6 alkenyl group optionally substituted with a substituent C, A C2 to C6 alkynyl group optionally substituted with a substituent C, A C1 to C6 alkoxy group optionally substituted with a substituent C, A C1 to C6 haloalkoxy group, Or Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 halo
  • R1 is Represents a C1-C6 alkyl group which may be optionally substituted with a substituent A
  • R2 is Hydrogen atom, Halogen atom, Or represents a C1 to C6 alkyl group which may be optionally substituted with a substituent A
  • R3 is Halogen atom, A C1 to C6 alkyl group optionally substituted with a substituent C, A C1 to C6 haloalkyl group, Or RaRbN— (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 Or a Ra and Rb together with the nitrogen atom to which they are attached form an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homo
  • R4 is Halogen atom, Or represents a C1 to C6 alkyl group which may be optionally substituted with a substituent C
  • R5 is Cyano group, Halogen atom, Or represents a C1 to C6 alkoxy group which may be optionally substituted with a substituent C, The compound or salt thereof according to [3].
  • R1 is Represents a C1 to C6 alkyl group
  • R2 is Represents a halogen atom
  • Het Represents a thiazolyl group or a thiadiazolyl group
  • R3 of the thiazolyl group or the thiadiazolyl group is appropriately substituted
  • R3 is Halogen atom, C1 to C6 alkyl group, A C1 to C6 haloalkyl group, Or RaRbN— (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 Or a Ra and Rb together with the nitrogen atom to which they are attached form an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an
  • R4 is Represents a halogen atom
  • R5 is Represents a halogen atom
  • n represents an integer of 0 to 2
  • X represents an oxygen atom
  • a bond including a broken line portion represents a double bond, The compound or salt thereof according to [4].
  • An agricultural and horticultural pest control agent containing the compound or salt thereof according to [1] as an active ingredient.
  • a method for controlling plant diseases which comprises applying the agricultural and horticultural pest control agent according to [6] to plants, plant seeds, or soil for cultivating plants.
  • a method for controlling plant diseases which comprises applying the agricultural / horticultural fungicide according to [7] to plants, plant seeds, or soil in which plants are cultivated.
  • Cx to Cy means that it has x to y carbon atoms.
  • x and y represent integers, and it is understood that all integers present between x and y are also individually disclosed.
  • C1-C6 is 1, 2, 3, 4, 5, or 6 carbon atoms
  • C2-C6 is 2, 3, 4, 5, or 6 carbon atoms
  • C3-C8 is 3, 4, 5, 6, 7, or 8 carbon atoms
  • C3-C6 is 3, 4, 5, or 6 carbon atoms
  • C1-C3 is 1, 2, or 3 It means having each carbon atom of.
  • the term “may be appropriately substituted” means substituted or unsubstituted.
  • the number of substituents when the number of substituents is not specified, it indicates that the number of substituents is 1.
  • the number of substituents is designated as “optionally substituted by 0 to 3”, it is understood that all integers existing between 0 and 3 are also individually disclosed. To be done. That is, it means that the number of substituents is none, 1, 2, or 3 substituents.
  • “optionally substituted by 0 to 2” means having none, one, or two substituents, respectively.
  • the C1-C6 alkyl group may be linear or branched, and is methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl.
  • the halogen atom includes a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
  • C1 to C6 haloalkyl group refers to the above C1 to C6 alkyl group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent.
  • C1 to C6 haloalkyl group examples include a monofluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a monochloromethyl group, a monobromomethyl group, a monoiodomethyl group, a chlorodifluoromethyl group, a bromodifluoromethyl group, 1 -Fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group , Pentafluoroethyl group, 2,2,2-trichloroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2
  • Examples of the C3-C8 cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like.
  • the C2-C6 alkenyl group represents a linear or branched unsaturated hydrocarbon group having one or more double bonds.
  • the C2 to C6 alkenyl group include vinyl group, 1-propenyl group, allyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 1-pentenyl group, 2-pentenyl group, 3-pentenyl group.
  • C2-C6 haloalkenyl group refers to the above-mentioned C2-C6 alkenyl group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent.
  • C2-C6 haloalkenyl group examples include 2-fluorovinyl group, 2,2-difluorovinyl group, 2,2-dichlorovinyl group, 3-fluoroallyl group, 3,3-difluoroallyl group, 3, Examples thereof include a 3-dichloroallyl group, a 4,4-difluoro-3-butenyl group, a 5,5-difluoro-4-pentenyl group, and a 6,6-difluoro-5-hexenyl group.
  • the C2-C6 alkynyl group represents a linear or branched unsaturated hydrocarbon group having one or two or more triple bonds.
  • Specific examples of the C2-C6 alkynyl group include ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, 3-pentynyl group.
  • C2-C6 haloalkynyl group refers to the above-mentioned C2-C6 alkynyl group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent.
  • C2-C6 haloalkynyl group examples include 2-fluoroethynyl group, 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3,3-difluoro-1-propynyl group, 3-chloro.
  • C1 to C6 alkoxy group refers to the above C1 to C6 alkyl group bonded via an oxygen atom.
  • Specific examples of the C1 to C6 alkoxy group include methoxy group, ethoxy group, propyloxy group, isopropyloxy group, butoxy group, isobutoxy group, sec-butoxy group, t-butoxy group, pentyloxy group, isopentyloxy group.
  • C1 to C6 haloalkoxy group refers to the above C1 to C6 alkoxy group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent.
  • Specific examples of the C1 to C6 haloalkoxy group include difluoromethoxy group, trifluoromethoxy group, chlorodifluoromethoxy group, bromodifluoromethoxy group, 2-fluoroethoxy group, 2,2-difluoroethoxy group, 2,2,2.
  • -Trifluoroethoxy group 1,1,2,2-tetrafluoroethoxy group, pentafluoroethoxy group, 2,2,2-trichloroethoxy group, 3,3-difluoropropyloxy group, 3,3,3-tri Fluoropropyloxy group, heptafluoropropyloxy group, heptafluoroisopropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) -ethoxy group, nonafluorobutoxy group, nonafluoro-sec-butoxy group, 3 , 3,4,4,5,5,5-heptafluoropentyloxy group Undecafluoro pentyloxy group, tridecafluorohexyl group, and the like.
  • the C3 to C8 cycloalkoxy group represents a group in which the C3 to C8 cycloalkyl group is bonded via an oxygen atom.
  • Specific examples of the C3 to C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group and a cyclooctyloxy group.
  • C2-C6 alkenyloxy group refers to the C2-C6 alkenyl group bonded through an oxygen atom.
  • the C2-C6 alkenyloxy group include vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, 3-butenyloxy group, 1-pentenyloxy group, 2-pentenyloxy group.
  • 3-pentenyloxy group 4-pentenyloxy group, 3-methyl-2-butenyloxy group, 1-hexenyloxy group, 2-hexenyloxy group, 3-hexenyloxy group, 4-hexenyloxy group, 5-hexenyloxy group Group, 4-methyl-3-pentenyloxy group, 3-methyl-2-pentenyloxy group and the like.
  • C2-C6 haloalkenyloxy group refers to the above-mentioned C2-C6 alkenyloxy group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent.
  • C2-C6 haloalkenyloxy group examples include a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, a 2,2-dichlorovinyloxy group, a 3-fluoroallyloxy group, and a 3,3-difluoro group.
  • Examples include allyloxy group, 3,3-dichloroallyloxy group, 4,4-difluoro-3-butenyloxy group, 5,5-difluoro-4-pentenyloxy group, and 6,6-difluoro-5-hexenyloxy group.
  • the C3-C6 alkynyloxy group refers to the C2-C6 alkynyl group in which the C3-C6 alkynyl group is bonded via an oxygen atom.
  • Specific examples of the C3-C6 alkynyloxy group include propargyloxy group, 2-butynyloxy group, 3-butynyloxy group, 2-pentynyloxy group, 3-pentynyloxy group, 4-pentynyloxy group, 1,1. Examples thereof include a dimethyl-2-propynyloxy group, a 2-hexynyloxy group, a 3-hexynyloxy group, a 4-hexynyloxy group and a 5-hexynyloxy group.
  • the C3 to C6 haloalkynyloxy group refers to the above C3 to C6 alkynyloxy group in which a hydrogen atom is optionally substituted by one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent.
  • Specific examples of the C3-C6 haloalkynyloxy group include 1,1-difluoro-2-propynyloxy group, 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro-2-butynyloxy group.
  • the C2 to C6 alkoxyalkoxy group is one in which the hydrogen atom in the C1 to C5 alkoxy group among the above C1 to C6 alkoxy groups is optionally substituted with one or two or more C1 to C5 alkoxy groups.
  • Specific examples of the C2 to C6 alkoxyalkoxy group include methoxymethoxy group, ethoxymethoxy group, propyloxymethoxy group, isopropyloxymethoxy group, methoxyethoxy group, ethoxyethoxy group, propyloxyethoxy group, isopropyloxyethoxy group, methoxypropyl. Examples thereof include an oxy group, an ethoxypropyloxy group, a propyloxypropyloxy group and an isopropyloxypropyloxy group.
  • 3- to 6-membered ring group containing 1 to 2 oxygen atoms include 1,2-epoxyetanyl group, oxetanyl group, oxolanyl group, oxanyl group, 1,3-dioxolanyl group, 1,3- Examples thereof include dioxanyl group and 1,4-dioxanyl group.
  • the pyridone compound of the present invention includes a compound represented by the following formula (1) and a salt thereof.
  • R1 in the formula (1) is a hydroxyl group, a cyano group, a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, or a C3 to C8 optionally substituted with a substituent A.
  • R1 is preferably a C1 to C6 alkyl group which may be appropriately substituted with a substituent A, or a C1 to C6 haloalkyl group,
  • a C1-C6 alkyl group which may be appropriately substituted with the substituent A is preferable.
  • R1 in the formula (1) includes a hydroxyl group and a cyano group.
  • the C1 to C6 alkyl group of the “C1 to C6 alkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same meaning as defined above, and is preferably a methyl group or an ethyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
  • the “C1-C6 haloalkyl group” for R1 in formula (1) has the same meaning as defined above, and is preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group or a 2,2,2-trifluoro group. It is an ethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group, or a 2,2,2- It is a trifluoroethyl group.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with the substituent A" in R1 of the formula (1) has the same meaning as defined above, and preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
  • the C2-C6 alkenyl group of the "C2-C6 alkenyl group optionally substituted with the substituent A" in R1 of the formula (1) has the same meaning as defined above, preferably a vinyl group, 1- It is a propenyl group or an allyl group, more preferably a vinyl group or an allyl group.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkenyl group” for R1 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 3-fluoroallyl group, or It is a 3,3-difluoroallyl group, more preferably a 2-fluorovinyl group or a 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted by the substituent A" in R1 of the formula (1) has the same meaning as defined above, preferably a propargyl group, 2- It is a butynyl group or a 3-butynyl group, and more preferably a propargyl group.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkynyl group” for R 1 in formula (1) has the same meaning as defined above, and is preferably a 4,4-difluoro-2-butynyl group or 4-chloro-4,4-difluoro- 2-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group, or 4,4,4-trifluoro-2-butynyl group, and more preferably 4,4-difluoro-2-butynyl group. Or a 4,4,4-trifluoro-2-butynyl group.
  • the C1 to C6 alkoxy group of the “C1 to C6 alkoxy group optionally substituted by the substituent A” in R1 of the formula (1) has the same meaning as defined above, and is preferably a methoxy group or an ethoxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
  • the "C1-C6 haloalkoxy group" in R1 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2,2. 2-trifluoroethoxy group, 3,3-difluoropropyloxy group or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted by the substituent A" in R1 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent A.
  • the C2-C6 alkenyloxy group in the "C2-C6 alkenyloxy group optionally substituted with the substituent A" in R1 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably an allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkenyloxy group” for R 1 in formula (1) has the same meaning as defined above, and is preferably 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 3-fluoro.
  • the C3-C6 alkynyloxy group of the "C3-C6 alkynyloxy group optionally substituted by the substituent A" in R1 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, and more preferably propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
  • C3-C6 haloalkynyloxy group for R1 in formula (1) has the same meaning as defined above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4- It is a difluoro-2-butynyloxy group, a 4-bromo-4,4-difluoro-2-butynyloxy group, or a 4,4,4-trifluoro-2-butynyloxy group, and more preferably 4,4-difluoro-2.
  • Ra and RbN— are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 A haloalkyl group, or a C3-C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which they are attached are an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group.
  • Each of the terms, which represents what is formed, is as defined above.
  • the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B.
  • a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a pyrrolidinyl group, or a piperidinyl group is preferable.
  • a hydrogen atom or a C1-C6 alkyl group optionally substituted with a substituent B is preferable.
  • RaRbN- is preferably an amino group, a methylamino group, an ethylamino group, a (methoxymethyl) amino group, a (2-methoxyethyl) amino group, a (cyanomethyl) amino group, a (2-cyanoethyl) amino group, Dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, 2,2- A difluoroethylamino group, a 2,2,2-trifluoroethylamino group, a cyclopropylamino group, a (cyclopropyl) methylamino group, a pyrrolidinyl group, or a piperidinyl group, more preferably an amino group,
  • R2 in the formula (1) is appropriately substituted with a hydrogen atom, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, or a substituent A.
  • C3 to C8 cycloalkyl group C2 to C6 alkenyl group optionally substituted with substituent A, C2 to C6 haloalkenyl group, C2 to C6 alkynyl optionally substituted with substituent A Group, C2 to C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cyclo group optionally substituted with substituent A Alkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent A, C2-C6 haloalkenyloxy group, C3-C6 alkynyl optionally substituted with substituent A Alkoxy group, a C3 ⁇ C6 haloalkynyl group, Rc-L-(wherein, Rc represents an alkyl group or a C1 ⁇ C6 haloalkyl group, a C1 ⁇ C6, L is S, SO
  • R2 is a hydrogen atom, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a C2 to C6 alkynyl optionally substituted with a substituent A Group, or a C1 to C6 alkoxy group optionally substituted with a substituent A is preferable, Particularly, a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which may be appropriately substituted with the substituent A is preferable.
  • R2 in the formula (1) includes a hydrogen atom and a nitro group.
  • the halogen atom in R2 of the formula (1) is as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, more preferably a chlorine atom or a bromine atom.
  • the C1 to C6 alkyl group of the “C1 to C6 alkyl group optionally substituted with the substituent A” in R2 of the formula (1) has the same meaning as defined above, and preferably a methyl group or an ethyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
  • the “C1-C6 haloalkyl group” in R2 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with the substituent A" in R2 of the formula (1) has the same meaning as defined above, and is preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
  • the C2-C6 alkenyl group in the "C2-C6 alkenyl group optionally substituted by the substituent A" in R2 of the formula (1) has the same meaning as defined above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group is more preferable, and a vinyl group, a 1-propenyl group, or an allyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
  • C2-C6 haloalkenyl group for R2 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, and more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted with the substituent A" in R2 of the formula (1) has the same meaning as defined above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group is more preferable, and an ethynyl group, a 1-propynyl group, or a propargyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
  • C2-C6 haloalkynyl group in R2 of the formula (1) has the same meaning as defined above, and is preferably a 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1.
  • the C1 to C6 alkoxy group of the “C1 to C6 alkoxy group optionally substituted with the substituent A” in R2 of the formula (1) has the same meaning as defined above, and is preferably a methoxy group or an ethoxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
  • the "C1-C6 haloalkoxy group" in R2 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2,2. 2-trifluoroethoxy group, 3,3-difluoropropyloxy group or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted with the substituent A" in R2 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent A.
  • the C2-C6 alkenyloxy group in the "C2-C6 alkenyloxy group optionally substituted with the substituent A" in R2 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, It is a 1-propenyloxy group, an allyloxy group, a 1-butenyloxy group, a 2-butenyloxy group or a 3-butenyloxy group, more preferably a vinyloxy group, a 1-propenyloxy group or an allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkenyloxy group” in R2 of the formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group or a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluoro group. It is a vinyloxy group.
  • the C3-C6 alkynyloxy group of the "C3-C6 alkynyloxy group optionally substituted by the substituent A" in R2 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, and more preferably propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
  • the “C3-C6 haloalkynyloxy group” in R2 of the formula (1) has the same meaning as defined above, and is preferably 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro group.
  • Rc-L— in R2 of the formula (1) (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2 ). Each term of) is synonymous with the above.
  • Rc-L- is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, more preferably a methylthio group or a methanesulfinyl group. Or a methanesulfonyl group.
  • Rx1C ( ⁇ O) — in R2 of the formula (1) (wherein Rx1 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, C3 To C8 cycloalkyl group, C1 to C6 alkoxy group, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group, or RaRbN— (wherein Ra and Rb are as defined above). .) Is synonymous with the above definition.
  • Rx1 is preferably a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C1 to C6 alkoxy group, more preferably a hydrogen atom, It is a C1-C6 alkyl group which may be optionally substituted with a substituent B, or a C1-C6 alkoxy group.
  • Rx1C ( ⁇ O) — includes formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, cyclopropanecarbonyl group, methoxycarbonyl group, ethoxycarbonyl group, 2 , 2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group, ethylamino Carbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dimethylaminocarbonyl group, ethyl
  • Rx1C ( ⁇ O) — is preferably a formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, or ethoxycarbonyl group, and Preferred are formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, methoxycarbonyl group, and ethoxycarbonyl group.
  • Het represents a 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom.
  • R3 is appropriately substituted with 0 to 2. (However, when 2-substituted R3 is present, each R3 represents an independent substituent.)
  • the 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom include a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, and a thiatriazolyl group.
  • Het is preferably a thiazolyl group or a thiadiazolyl group.
  • R3 of the thiazolyl group or the thiadiazolyl group is appropriately substituted with 0 to 2. (However, when 2-substituted R3 is present, each R3 represents an independent substituent.)
  • R3 is a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a C3 optionally substituted with a substituent C
  • B Alkyl group which may C1 ⁇ C6, represent a representative.
  • R3 is a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a C3 to optionally substituted with a substituent C.
  • a C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent C, a C2-C6 alkynyl group optionally substituted with a substituent C, a substituent C optionally substituted C1 to C6 alkoxy group, RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group) , Or a C3-C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which they are attached are an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, Represents a peridinyl group, a homopiperidinyl group, or an azocanyl group.), Or Rx2C ( O) N (Rx3)-(wherein Rx2 is a hydrogen
  • Rx3 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or C3 to C8. Represents a cycloalkyl group of),
  • a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, Represents a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group which may be optionally substituted with a substituent B, or Ra and Rb together with the nitrogen atom to which they are attached;
  • an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group is preferable.
  • R3 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
  • the halogen atom in R3 of the formula (1) has the same meaning as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and particularly preferably a chlorine atom or a bromine atom.
  • the C1 to C6 alkyl group in the “C1 to C6 alkyl group optionally substituted with a substituent C” in R3 of the formula (1) has the same meaning as defined above, and preferably a methyl group or an ethyl group.
  • the hydrogen atom in the C1 to C6 alkyl group is optionally substituted by the substituent C.
  • the “C1-C6 haloalkyl group” for R3 in formula (1) has the same meaning as defined above, and is preferably a monofluoromethyl group, a monochloromethyl group, a monobromomethyl group, a difluoromethyl group, a trifluoromethyl group. , 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably monobromomethyl group , A difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or a 2,2,2-trifluoroethyl group.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted by the substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
  • the C2-C6 alkenyl group in the "C2-C6 alkenyl group optionally substituted with a substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group is more preferable, and a vinyl group, a 1-propenyl group, or an allyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkenyl group” for R3 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, and more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted by the substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group is more preferable, and an ethynyl group, a 1-propynyl group, or a propargyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
  • C2-C6 haloalkynyl group in R3 of the formula (1) has the same meaning as defined above, and is preferably a 3,3-difluoro-1-propynyl group or a 3,3,3-trifluoro-1 group.
  • the C1 to C6 alkoxy group of the “C1 to C6 alkoxy group optionally substituted with a substituent C” in R3 of the formula (1) has the same meaning as defined above, and preferably a methoxy group or an ethoxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent C.
  • the “C1-C6 haloalkoxy group” in R3 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2,2. 2-trifluoroethoxy group, 3,3-difluoropropyloxy group or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted with a substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
  • the C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with a substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, It is a 1-propenyloxy group, an allyloxy group, a 1-butenyloxy group, a 2-butenyloxy group or a 3-butenyloxy group, more preferably a vinyloxy group, a 1-propenyloxy group or an allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkenyloxy group” for R3 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluoro group. It is a vinyloxy group.
  • the C3 to C6 alkynyloxy group of the "C3 to C6 alkynyloxy group optionally substituted with a substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, and more preferably propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
  • C3-C6 haloalkynyloxy group for R3 in formula (1) has the same meaning as defined above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro group.
  • Ra and Rb of "RaRbN-" in R3 of the formula (1) are as defined above.
  • Ra and Rb a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a pyrrolidinyl group, or a piperidinyl group is preferable.
  • a hydrogen atom or a C1-C6 alkyl group optionally substituted with a substituent B is preferable.
  • RaRbN— is amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, dimethyl group.
  • Amino group, ethylmethylamino group, or diethyl group An amino group, particularly preferably an amino group.
  • Rc and L of "Rc-L-" in R3 of the formula (1) have the same meaning as above.
  • "Rc-L-" is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group or a methanesulfinyl group. Or a methanesulfonyl group.
  • Rx1 is preferably a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C1 to C6 alkoxy group, more preferably a hydrogen atom, It is a C1-C6 alkyl group which may be optionally substituted with a substituent B, or a C1-C6 alkoxy group.
  • Rx1C ( ⁇ O) — is preferably formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, cyclopropanecarbonyl group, methoxycarbonyl group, ethoxycarbonyl.
  • “Rx1C ( ⁇ O) O—” is preferably formyloxy group, acetyloxy group, methoxyacetyloxy group, cyanoacetyloxy group, propionyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group, cyclopropanecarbonyl.
  • Oxy group methoxycarbonyloxy group, ethoxycarbonyloxy group, 2,2-difluoroethoxycarbonyloxy group, 2,2,2-trifluoroethoxycarbonyloxy group, 3,3,3-trifluoropropyloxycarbonyloxy group, Cyclopropyloxycarbonyloxy group, aminocarbonyloxy group, methylaminocarbonyloxy group, ethylaminocarbonyloxy group, (methoxymethyl) aminocarbonyloxy group, (2-methoxyethyl) aminocarbonyl group Oxy group, (cyanomethyl) aminocarbonyloxy group, (2-cyanoethyl) aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethylmethylaminocarbonyloxy group, diethylaminocarbonyloxy group, (methoxymethyl) methylaminocarbonyloxy group, ( 2-methoxyethyl) methylaminocarbonyloxy group, (cyano
  • Rx3 represents a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group).
  • the terms are synonymous with the above definitions.
  • the “C1 to C6 alkyl group optionally substituted with the substituent B” in the case of having the substituent B, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B. .
  • Rx2 is preferably a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group, or RaRbN— (wherein Ra and Rb Is the same as defined above.), And more preferably a C1-C6 alkyl group optionally substituted by the substituent B.
  • Rx3 is preferably a hydrogen atom, a C1 to C6 alkyl group which may be appropriately substituted with a substituent B, or a C1 to C6 haloalkyl group, and more preferably a hydrogen atom.
  • Rx2 are preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group and 2,2-difluoroethoxy.
  • Rx3 are preferably hydrogen atom, methyl group, methoxymethyl group, ethoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-cyanoethyl group, propyl group.
  • 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, or cyclopropyl group and more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, 2-methoxy. It is an ethyl group, a 2,2-difluoroethyl group, or a 2,2,2-trifluoroethyl group.
  • Rx2C ( ⁇ O) N (Rx3) — is preferably an acetylamide group, a 2,2,2-trifluoroacetylamide group, a methylcarbamate group, or an ethylcarbamate group, and more preferably It is an acetylamide group.
  • Het When Het is a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, or a thiatriazolyl group, Het has the formula (a-1) Or formula (a-2) (Wherein R3 is as defined above, G1, G2, and G3 are each independently a carbon atom or a nitrogen atom, and at least G1, G2, and G3) One represents a nitrogen atom, and ma represents an integer of 0 to 2).
  • two R3's each represent an independent substituent, which may be the same or different and can be arbitrarily selected.
  • R4 in the formula (1) is optionally substituted with a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group which may be optionally substituted with a substituent C, a C1 to C6 haloalkyl group, and a substituent C.
  • a C3 to C8 cycloalkyl group a C2 to C6 alkenyl group optionally substituted with a substituent C, a C2 to C6 haloalkenyl group, a C2 to C6 alkynyl optionally substituted with a substituent C Group, C2 to C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent C, C1 to C6 haloalkoxy group, C3 to C8 cyclo optionally substituted with substituent C Alkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent C, C2-C6 haloalkenyloxy group, C3-C6 optionally substituted with substituent C Alkynyloxy group, C3-C6 haloalkynyloxy group, RaRbN- (wherein Ra and Rb are as defined above), Rc-L- (wherein Rc and L are as defined above).
  • Rx1C O)-(where Rx1 is as defined above
  • Rx1C O) O- (where Rx1 is as defined above)
  • Rx2C O) N (Rx3)-(wherein Rx2 and Rx3 are as defined above).
  • R4 is a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy optionally substituted with a substituent C.
  • a group or a C1-C6 haloalkoxy group is preferred, Particularly, R4 is preferably a halogen atom or a C1 to C6 alkyl group which may be appropriately substituted with a substituent C.
  • R4 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
  • the halogen atom in R4 of the formula (1) has the same meaning as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and more preferably a fluorine atom, a chlorine atom or a bromine atom. And particularly preferably a fluorine atom.
  • the C1 to C6 alkyl group in the "C1 to C6 alkyl group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and is preferably a methyl group or an ethyl group.
  • the hydrogen atom in the C1 to C6 alkyl group is optionally substituted by the substituent C.
  • the “C1-C6 haloalkyl group” for R4 in formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2. -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, and more preferably difluoromethyl group or trifluoromethyl group.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
  • the C2-C6 alkenyl group in the "C2-C6 alkenyl group optionally substituted by the substituent C" in R4 of the formula (1) has the same meaning as defined above, and is preferably a vinyl group, 1- It is a propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, and more preferably a vinyl group.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkenyl group” for R4 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, and more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted by the substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably an ethynyl group, 1- It is a propynyl group or a propargyl group, more preferably an ethynyl group.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
  • C2-C6 haloalkynyl group in R4 of the formula (1) has the same meaning as defined above, and is preferably a 3,3-difluoro-1-propynyl group or a 3,3,3-trifluoro-1 group.
  • the C1 to C6 alkoxy group of the "C1 to C6 alkoxy group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and is preferably a methoxy group or an ethoxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent C.
  • the “C1-C6 haloalkoxy group” in R4 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, A 2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, or a 3,3,3-trifluoropropyloxy group is more preferable, and a difluoromethoxy group or a trifluoromethoxy group is more preferable.
  • the C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
  • the C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted by the substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably an allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkenyloxy group” for R4 in formula (1) has the same meaning as defined above, and is preferably 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluoro group. It is a vinyloxy group.
  • the C3 to C6 alkynyloxy group of the "C3 to C6 alkynyloxy group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, and more preferably propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
  • the “C3-C6 haloalkynyloxy group” for R4 in formula (1) has the same meaning as defined above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro group.
  • Ra and Rb of "RaRbN-" in R4 of the formula (1) are as defined above.
  • Preferred as “RaRbN—” is amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, dimethyl group.
  • Amino group ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, 2,2-difluoro
  • It is an ethylamino group, a 2,2,2-trifluoroethylamino group, a cyclopropylamino group, a (cyclopropyl) methylamino group, a pyrrolidinyl group, or a piperidinyl group, more preferably an amino group, a dimethylamino group, or ethyl. It is a methylamino group or a diethylamino group.
  • Rc and L of "Rc-L-" in R4 of the formula (1) have the same meaning as above.
  • "Rc-L-" is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group or a methanesulfinyl group. Or a methanesulfonyl group.
  • “Rx1C ( ⁇ O) —” is preferably an acetyl group, a methoxyacetyl group, a cyanoacetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropanecarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, 2 , 2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group, ethylamino Carbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) amino
  • “Rx1C ( ⁇ O) O—” is preferably acetyloxy group, methoxyacetyloxy group, cyanoacetyloxy group, propionyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group, cyclopropanecarbonyloxy group, methoxy.
  • Rx2C ( ⁇ O) N (Rx3) — in R4 of the formula (1) (wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 A haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as defined above).
  • Rx3 represents a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group).
  • the terms are synonymous with the above definitions.
  • the “C1 to C6 alkyl group optionally substituted with the substituent B” in the case of having the substituent B, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B. .
  • Rx2 is preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2,2-difluoroethoxy group, 2 , 2,2-trifluoroethoxy group, cyclopropyloxy group, amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2 -Cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group Group, 2,2-di
  • Rx3 is preferably hydrogen atom, methyl group, methoxymethyl group, ethoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-cyanoethyl group, propyl group, 2, 2-difluoroethyl group, 2,2,2-trifluoroethyl group, or cyclopropyl group, more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, It is a 2,2-difluoroethyl group or a 2,2,2-trifluoroethyl group.
  • R5 in formula (1) has the same meaning as R4 described above. That is, a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, and a C3 to C8 optionally substituted with a substituent C.
  • R5 is a hydroxyl group, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a C2 to C6 optionally substituted with a substituent C.
  • R5 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
  • the halogen atom in R5 of the formula (1) has the same meaning as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, more preferably a fluorine atom or a chlorine atom, and particularly preferably Preferred is a fluorine atom.
  • the C1 to C6 alkyl group of the “C1 to C6 alkyl group optionally substituted by the substituent C” in R5 of the formula (1) has the same meaning as defined above, and preferably a methyl group or an ethyl group.
  • the hydrogen atom in the C1 to C6 alkyl group is optionally substituted by the substituent C.
  • the “C1-C6 haloalkyl group” in R5 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2.
  • the C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with the substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
  • the C2-C6 alkenyl group in the "C2-C6 alkenyl group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group is more preferable, and a vinyl group, a 1-propenyl group, or an allyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkenyl group” for R5 in the formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, and more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group is more preferable, and an ethynyl group, a 1-propynyl group, or a propargyl group is more preferable.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
  • C2-C6 haloalkynyl group for R5 in formula (1) has the same meaning as defined above, and is preferably a 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1.
  • the C1 to C6 alkoxy group of the "C1 to C6 alkoxy group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a methoxy group or an ethoxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent C.
  • the substituent C is preferably a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C2 to C6 alkoxyalkoxy group, or Rc-L- (wherein Rc And L are as defined above, and more preferably a cyano group, a C1 to C6 alkoxy group, or Rc-L- (wherein Rc and L are as defined above). is there.
  • the C1-C6 alkoxy group substituted with the substituent C is preferably a cyanomethoxy group, a cyanoethoxy group, a methoxymethoxy group, a methoxyethoxy group, an ethoxymethoxy group, or an ethoxyethoxy group, and more preferably cyanomethoxy group.
  • the "C1-C6 haloalkoxy group" in R5 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2,2. 2-trifluoroethoxy group, 3,3-difluoropropyloxy group or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C3-C8 cycloalkoxy group of the "C3-C8 cycloalkoxy group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
  • the C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group or allyloxy group, particularly preferably, It is an allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkenyloxy group” for R5 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluoro group. It is a vinyloxy group.
  • the C3 to C6 alkynyloxy group of the "C3 to C6 alkynyloxy group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, more preferably propargyloxy group, or 2-butynyloxy group, and particularly preferably propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
  • the “C3-C6 haloalkynyloxy group” for R5 in formula (1) has the same meaning as defined above, and is preferably 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro group.
  • Ra and Rb of "RaRbN-" in R5 of the formula (1) are as defined above.
  • Ra and Rb a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a pyrrolidinyl group, or a piperidinyl group is preferable.
  • a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a pyrrolidinyl group, or a piperidinyl group is preferable.
  • a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a pyrrolidinyl group, or a piperidinyl group is preferable.
  • RaRbN— is amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, dimethyl group.
  • Rc and L of "Rc-L-" in R5 of the formula (1) have the same meaning as above.
  • Rc is preferably a C1-C6 alkyl group.
  • L is preferably S.
  • Rc-L- is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group or a methanesulfinyl group. Or a methanesulfonyl group.
  • “Rx1C ( ⁇ O) —” is preferably an acetyl group, a methoxyacetyl group, a cyanoacetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropanecarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, 2 , 2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group, ethylamino Carbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) amino
  • Rx1 is preferably a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 halo. It is an alkoxy group, a C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as defined above), and more preferably a C1-C6 optionally substituted with a substituent B.
  • Ra and RbN— are as defined above.
  • Rx1C ( ⁇ O) O— is preferably acetyloxy group, methoxyacetyloxy group, cyanoacetyloxy group, propionyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group, cyclopropanecarbonyloxy group, methoxy.
  • Rx2C ( ⁇ O) N (Rx3) — in R5 of the formula (1) (wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 A haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as defined above).
  • Rx3 represents a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group).
  • the terms are synonymous with the above definitions.
  • the “C1 to C6 alkyl group optionally substituted with the substituent B” in the case of having the substituent B, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B. .
  • Rx2 is preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2,2-difluoroethoxy group, 2 , 2,2-trifluoroethoxy group, cyclopropyloxy group, amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2 -Cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group Group, 2,2-di
  • Rx3 is preferably hydrogen atom, methyl group, methoxymethyl group, ethoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-cyanoethyl group, propyl group, 2, 2-difluoroethyl group, 2,2,2-trifluoroethyl group, or cyclopropyl group, more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, It is a 2,2-difluoroethyl group or a 2,2,2-trifluoroethyl group.
  • the phenyl group having R4 and R5 has the formula (Y) (Wherein R4 and R5 have the same meanings as described above, and n represents an integer of 0 to 4).
  • N in the formula (Y) represents an integer of 0 to 4.
  • n in the formula (Y) is 2 or more, two or more R 5 s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
  • the ortho position of the phenyl group means the position of the phenyl group having the substituent R4, as shown in the formula (Y).
  • the phenyl group in which the substituent R4 is located at the ortho position is a feature of the present invention.
  • a preferred combination of the substituents of the formula (Y) is 2-R4-phenyl group, 2-R4-6-R5-phenyl group, 2-R4-4-R5-phenyl group, 2-R4-4-R5-6.
  • a -R5-phenyl group, a 2-R4-3-R5-phenyl group, or a 2-R4-3-R5-4-R5-6-R5-phenyl group, and a more preferable combination of substituents is 2-R4.
  • a “2-R4-6-R5-phenyl group” means a disubstituted phenyl group having a substituent R4 at the 2-position and a substituent R5 at the 6-position, and the following description is also the same.
  • X in the formula (1) represents an oxygen atom or a sulfur atom.
  • Preferred X is an oxygen atom.
  • the bond including the broken line part in the equation (1) is Represents a portion represented by.
  • the bond containing the broken line in formula (1) represents a double bond or a single bond.
  • R2 in the formula (1b) is a substituent other than a hydrogen atom, it is either the R isomer or the S isomer, or a mixture of the R isomer and the S isomer at an arbitrary ratio.
  • the “substituent A” in the formula (1) is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, RaRbN— (Wherein Ra and Rb have the same meanings as described above) and Rc-L- (wherein Rc and L have the same meanings as described above). .
  • the substituent A is preferably a cyano group, a C1-C6 alkoxy group, or Rc-L- (wherein Rc and L have the same meanings as described above), Particularly, a cyano group or a C1-C6 alkoxy group is preferable.
  • substituent A a hydroxyl group; a cyano group;
  • a C3-C8 cycloalkyl group a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
  • the C1 to C6 haloalkoxy group difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group, 2,2,2-trifluoroethoxy group, 3,3-difluoropropyloxy group, and 3,3 , 3-trifluoropropyloxy group;
  • a C3-C8 cycloalkoxy group a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group
  • substituent A a hydroxyl group; a cyano group; As a C3 to C8 cycloalkyl group, a cyclopropyl group and a cyclobutyl group, As a C1 to C6 alkoxy group, a methoxy group and an ethoxy group, As the C1 to C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group, As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, and a cyclobutoxy group, RaRbN- (wherein Ra and Rb are as defined above), a dimethylamino group, an ethylmethylamino group, and a diethylamino group, And Rc-L- (wherein Rc and L have the same meaning
  • the “substituent B” in the formula (1) represents at least one selected from the group consisting of a cyano group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, and a C3 to C8 cycloalkoxy group. .
  • the substituent B is preferably a cyano group or a C1-C6 alkoxy group.
  • substituent B a cyano group
  • the C1 to C6 haloalkoxy group difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group, 2,2,2-trifluoroethoxy group, 3,3-difluoropropyloxy group, and 3,3 , 3-trifluoropropyloxy group
  • the C3-C8 cycloalkoxy group is a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
  • substituent B a cyano group; As a C1-C6 alkoxy group, a methoxy group and an ethoxy group; As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group; Also, examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group and a cyclobutoxy group.
  • substituted C in the formula (1) means a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, C2.
  • the substituent C is a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C2 to C6 alkoxyalkoxy group, Rc-L- (where Rc and L is as defined above, Rx1C ( ⁇ O) — (wherein Rx1 has the same meaning as above), or a 3- to 6-membered ring group containing 1 to 2 oxygen atoms.
  • substituent C a hydroxyl group; a cyano group;
  • a C3-C8 cycloalkyl group a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
  • the C1 to C6 haloalkoxy group difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group, 2,2,2-trifluoroethoxy group, 3,3-difluoropropyloxy group, and 3,3 , 3-trifluoropropyloxy group;
  • a C3-C8 cycloalkoxy group a cyclopropyl
  • Carbonyl group methoxycarbonyl group, ethoxycarbonyl group, 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group , Aminocarbonyl group, methylaminocarbonyl group, ethylaminocarbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dime Ruaminocarbonyl group, ethylmethylaminocarbonyl group, diethylaminocarbonyl group, (methoxymethyl) methylaminocarbonyl group, (2-methoxyethyl) methylaminocarbonyl group, (cyanomethyl) methylaminocarbonyl group, (2-
  • substituent C a hydroxyl group; a cyano group; As a C3 to C8 cycloalkyl group, a cyclopropyl group and a cyclobutyl group; As a C1-C6 alkoxy group, a methoxy group and an ethoxy group; As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group; As a C3-C8 cycloalkoxy group, a cyclopropyloxy group and a cyclobutoxy group; As a C2-C6 alkoxyalkoxy group, a methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, and an ethoxyethoxy group; RaRbN- (wherein Ra and
  • the compound represented by the formula (1) may have one or two axial chirality.
  • the isomer ratio at this time is a single ratio or a mixing ratio of an arbitrary ratio, and is not particularly limited.
  • the compound represented by the formula (1) may contain an asymmetric atom.
  • the isomer ratio at this time is a single ratio or a mixing ratio of an arbitrary ratio, and is not particularly limited.
  • the compound represented by the formula (1) may include geometrical isomers.
  • the isomer ratio at this time is a single ratio or a mixing ratio of an arbitrary ratio, and is not particularly limited.
  • the compound represented by the formula (1) may be capable of forming a salt.
  • Acid salts such as hydrochloric acid, sulfuric acid, acetic acid, fumaric acid, and maleic acid, and metal salts such as sodium, potassium, and calcium are exemplified, but are not particularly limited as long as they can be used as agricultural and horticultural fungicides. There is no.
  • the method for producing the compound represented by the formula (1) of the present invention is shown below.
  • the method for producing the compound of the present invention is not limited to the production methods A to AL.
  • Y is (Wherein R4, R5 and n are as defined above), Z1 is Het (where Het is as defined above) or a C1 to C6 alkyl group, and R6 is hydrogen. Represents an atom or a C1 to C6 alkyl group, and R2, X and Y have the same meanings as defined above.
  • the production method A is a method for producing a compound represented by the formula (5), which is an intermediate for producing the compound of the present invention, comprising a compound represented by the formula (3) and a compound represented by the formula (4). In a solvent in the presence of a base.
  • the compound in which Z1 is a C1 to C6 alkyl group is obtained as a commercial product, or produced by using a reference example or a known method. be able to.
  • the compound in which Z1 is Het can be obtained as a commercial product or can be produced by a known method. Also, Green Chemistry, Vol. 41, pp. 580-585, and The Journal of Organic Chemistry, Vol. 65, No. 20, 6458-6461 (2000). Alternatively, it can be synthesized by referring to US Pat. No. 5,922,718 and the like.
  • the compound represented by the formula (4) used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of the compound represented by the formula (4) used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (3). However, it is usually 1 equivalent or more and 3 equivalents or less.
  • Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide, and potassium t-butoxide. Etc.
  • the amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 0.01 equivalent or more and 3 equivalents or less with respect to the compound represented by the formula (3). Is.
  • the solvent used in this reaction is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, a benzene solvent such as benzene, toluene, xylene, mesitylene, chlorobenzene or dichlorobenzene, Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl -2-Urea-based solvents such as imidazolidinone, halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, sulfur-based solvents such as
  • the amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (3). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually -50 ° C or higher and 150 ° C or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (5) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • the reaction mixture containing the compound represented by the formula (5) obtained above can be distilled under reduced pressure to remove the solvent.
  • reaction mixture containing the compound represented by the formula (5) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • R6a represents a C1 to C6 alkyl group
  • R2, X, Y and Z1 have the same meanings as described above.
  • the production method B is a method for obtaining a production intermediate represented by the formula (5b) among the compounds represented by the formula (5), wherein the compound represented by the formula (5a) is treated under an acidic condition or a base.
  • the production method comprises reacting in a solvent under sexual conditions.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid, hydrobromic acid and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid. There is no particular limitation as long as the desired reaction proceeds.
  • the amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but is usually 0.01 with respect to the compound represented by the formula (5a). Equivalent or more. Further, a liquid acid can be used as a solvent.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an aqueous solvent, an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t- Butyl ether, dimethoxyethane, tetrahydrofuran, ether solvents such as dioxane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (5a). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually 0 ° C. or higher and 180 ° C. or lower, or the boiling point of the solvent or lower.
  • Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide and potassium hydroxide, but the base is not particularly limited as long as the intended reaction proceeds.
  • the amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (5a), but usually 1 equivalent It is above 30 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether such as water solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane.
  • alcohol-based solvents such as methanol, ethanol and isopropanol
  • benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene
  • ester-based solvents such as ethyl acetate, isopropyl acetate and butyl acetate
  • nitriles such as acetonitrile -Based solvent
  • amide-based solvent such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide
  • urea-based solvent such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroe Down, chloroform
  • halogen solvents such as carbon tetrachloride.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (5a). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -20 ° C or higher and 180 ° C or lower, or the boiling point of the solvent or lower.
  • the reaction under acidic condition and the reaction under basic condition can be performed by the common method. Separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate
  • An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (5b) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (5b) obtained above can be distilled under reduced pressure to remove the solvent.
  • reaction mixture containing the compound represented by the formula (5b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • the compound represented by the formula (5b) is represented by the formula (5b ′) (In the formula, R2, X, Y and Z1 are as defined above.)
  • the isomer represented by is also included.
  • the compound represented by the formula (5b ′) can be treated in the same manner as the compound represented by the formula (5b), and can be applied to, for example, the production method C. Further, the compound represented by the formula (5b ') contains an asymmetric carbon, and the mixing ratio of the isomers may be singly or a mixture having an arbitrary ratio. Further, it may be a mixture of the compound represented by the formula (5b) and the compound represented by the formula (5b '), and the isomer mixture ratio thereof may be a single or a mixture in an arbitrary ratio.
  • R7 is a hydrogen atom, a hydroxyl group, a cyano group, a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a C3 to optionally substituted with a substituent A C8 cycloalkyl group, C2-C6 alkenyl group optionally substituted with substituent A, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent A, C2- C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent A, substituted A C2-C6 alkenyloxy group optionally substituted with a group A, a C2-C6 haloalkenyloxy group, a C3-
  • Production method C is a method for obtaining a compound represented by the formula (6), which is a production intermediate of the compound of the present invention, wherein the compound represented by the formula (5) is reacted with R7NH 2 in the presence of an acid. It is a manufacturing method including the following.
  • R7NH 2 used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • R7NH 2 may be in the form of a salt with an acidic compound such as hydrochloric acid or acetic acid, and is not particularly limited as long as the desired reaction proceeds.
  • the amount of R7NH 2 used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (5), and is not particularly limited as long as the intended reaction proceeds, but it is usually It is 1 equivalent or more and 200 equivalents or less.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid and p-toluenesulfonic acid, and are not particularly limited as long as the intended reaction proceeds. No, but preferably acetic acid.
  • acetic acid When a salt of R7NH 2 and an acidic compound is used, the use of an acid is not essential.
  • the amount of the acid used in this reaction may be 1 equivalent or more based on R7NH 2 and is not particularly limited as long as the desired reaction proceeds, but is usually 1 equivalent to 200 equivalents. .
  • the acid used is a liquid, it can be used as a solvent.
  • a solvent can be used in this reaction, but it is not always essential.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy.
  • an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy.
  • Ether-based solvents such as ethane, tetrahydrofuran, dioxane, alcohol-based solvents such as methanol, ethanol, isopropanol, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, butyl acetate, etc.
  • Ester-based solvents such as acetonitrile, amide-based solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and urea-based solvents such as 1,3-dimethyl-2-imidazolidinone Melting , Dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the solvent is preferably an acidic solvent, and more preferably acetic acid.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (5). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (6) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • the solvent of the reaction mixture containing the compound represented by the formula (6) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (6) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Lv represents a leaving group such as a methanesulfonyl group, a trifluoromethanesulfonyl group, a p-toluenesulfonyl group, a halogen atom and the like, and R1, R2, X, Y and Z1 are as defined above.
  • Production method D is a method for obtaining a compound represented by formula (6b) which is an intermediate for producing the compound of the present invention, wherein the compound represented by formula (6a) and R1-Lv are added in the presence of a base, It is a production method including reacting in a solvent.
  • the compound represented by the formula (6a), which is a raw material of the present invention, is prepared by non-patent documents such as the production method C and Journal of Heterocyclic Chemistry, Volume 20, Item 65-67 (1983). Can be synthesized into a reference.
  • R1-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • Examples of the base used in this reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and sodium hydride, but are not particularly limited as long as the intended reaction proceeds. It will not be done.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (6a), and is not particularly limited as long as the intended reaction proceeds, but it is usually 1 It is equal to or more than 10 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Methanol, ethanol, alcohol solvents such as isopropanol, benzene, toluene, xylene, mesitylene, chlorobenzene, benzene solvents such as dichlorobenzene, ethyl acetate, isopropyl acetate, ester solvents such as butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane,
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (6a). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (6b) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (6b) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (6b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • SR represents a sulfurizing agent
  • R1, R2, Y and Z1 are as defined above.
  • the production method E is a method for obtaining the compound represented by the formula (6b-2) among the compounds represented by the formula (6b), wherein the compound represented by the formula (6b-1) and the sulfurizing agent are (SR) is a production method including reacting with (SR) in a solvent.
  • sulfurizing agent examples include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide).
  • the amount of the sulfurizing agent used in this reaction may be 0.5 equivalent or more with respect to the compound represented by the formula (6b-1), and is not particularly limited as long as the intended reaction proceeds. However, it is usually 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (6b-1). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane.
  • ether solvents such as t-butyl ether
  • halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride
  • hydrocarbon solvents such as hexane, heptane,
  • these solvents can be added.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. In this reaction, a liquid separation operation is not essential.
  • the water content of the reaction mixture containing the compound represented by the formula (6b-2) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (6b-2) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (6b-2) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Production method F is the compound represented by formula (6b) in which R2a is optionally substituted with a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, or a substituent A.
  • R2a-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of R2a-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (6b-3), and is not particularly limited as long as the intended reaction proceeds. Usually, it is 1 equivalent or more and 1.8 equivalents or less.
  • metal hydrides such as sodium hydride, organic lithiums such as methyllithium, butyllithium, sec-butyllithium, t-butyllithium, and hexyllithium, lithium diisopropylamide, hexamethyldisilazane
  • metal amides such as lithium, sodium hexamethyldisilazane, and potassium hexamethyldisilazane.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (6b-3), and is not particularly limited as long as the intended reaction proceeds, but is usually It is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, and hydrocarbon-based solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane
  • benzene-based solvents such as
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (6b-3). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -80 ° C or higher and 100 ° C or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Add solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. Is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (6b-4) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (6b-4) obtained above can be distilled under reduced pressure to remove the solvent.
  • the reaction mixture containing the compound represented by the formula (6b-4) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Ox represents an oxidizing agent
  • R1, R2, X, Y and Z1 are as defined above.
  • the production method G is a method for obtaining a compound represented by the formula (7) which is an intermediate for producing the compound of the present invention, wherein the compound represented by the formula (6b) and the oxidizing agent (Ox) are mixed in a solvent. It is a manufacturing method including reacting with.
  • oxidizing agent used in this reaction examples include metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile and benzoyl peroxide.
  • the oxidizing agent is a metal oxide
  • the amount of the oxidizing agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (6b), but it is usually 1 It is equal to or more than 200 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, Examples thereof include halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less by weight with respect to the compound represented by the formula (6b). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • a liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate
  • An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane.
  • ether solvents such as t-butyl ether
  • halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride
  • hydrocarbon solvents such as hexane, heptane,
  • these solvents can be added.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. In this reaction, a liquid separation operation is not essential.
  • the water content of the reaction mixture containing the compound represented by the formula (7) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (7) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • the amount of the oxidizing agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more relative to the compound represented by the formula (6b), but it is usually 1 It is equal to or more than 20 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, Examples thereof include halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less by weight with respect to the compound represented by the formula (6b). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane.
  • ether solvents such as t-butyl ether
  • halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride
  • hydrocarbon solvents such as hexane, heptane,
  • these solvents can be added.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. In this reaction, a liquid separation operation is not essential.
  • the water content of the reaction mixture containing the compound represented by the formula (7) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (7) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • the oxidizing agent is a combination of a radical initiator and a halogenating agent.
  • the amounts of the radical initiator and the halogenating agent used in this reaction are 0.01 equivalents or more and 1.0 equivalents or more, respectively, with respect to the compound represented by the formula (6b), the desired reaction proceeds. There is no particular limitation as long as it does. Usually, the amount of the radical initiator is from 0.01 to 1 equivalent, and the amount of the halogenating agent is from 1 to 3 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate.
  • halogenated benzene solvents such as chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate.
  • examples thereof include solvents, halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon-based solvents such as hexane, heptane, cyclohexane and methylcyclohexane.
  • solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less by weight with respect to the compound represented by the formula (6b). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Add solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. Is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (7) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • R2b represents a halogen atom
  • HalR represents a halogenating agent
  • R1, Z1, X and Y have the same meanings as described above.
  • Production method H is a method for obtaining a compound represented by formula (7b) in which R2b represents a halogen atom, wherein the compound represented by formula (7a) and a halogenating agent (HalR) are used in a solvent. It is a manufacturing method including reacting.
  • selectfluor N-fluoro-N'-chloromethyl-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7a). It is 1 equivalent or more and 10 equivalents or less.
  • the amount of the halogenating agent containing hydantoin is not particularly limited as long as the desired reaction proceeds, as long as it is 0.5 equivalent or more, and is usually 1 equivalent to 5 equivalents.
  • the halogenating agent used in this reaction is an iodizing agent
  • inorganic acids such as hydrochloric acid and sulfuric acid
  • acids such as organic acids
  • acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid you can
  • the desired reaction proceeds.
  • the amount is not particularly limited as long as it is, but usually 0.1 equivalent or more and 3 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc.
  • Ether solvents such as diisopropyl
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7a). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7b) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7b) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (7b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Z2 represents a halogen atom
  • HalR, R1, R2, X and Y have the same meanings as described above.
  • Production method I is a method for obtaining a compound represented by formula (7d) in which Z2 is a halogen atom, wherein a compound represented by formula (7c) is added to a radical initiator and a halogenating agent (HalR). It is a production method including subjecting it to a reaction used.
  • preferable Z2 is a chlorine atom, a bromine atom or an iodine atom.
  • the radical initiator used in this reaction includes azobisisobutyronitrile, benzoyl peroxide and the like.
  • the amount of the radical initiator used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0.01 equivalent or more and 1 equivalent to the compound represented by the formula (7c). It is not more than 0.0 equivalent.
  • the halogenating agent used in this reaction is N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin. , 1,3-diiodo-5,5-dimethylhydantoin and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 2 equivalents or more with respect to the compound represented by the formula (7c). It is 2 equivalents or more and 2.8 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate.
  • halogenated benzene solvents such as chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate.
  • examples thereof include solvents, halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon-based solvents such as hexane, heptane, cyclohexane and methylcyclohexane.
  • solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7c). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Add solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. Is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7d) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7d) obtained above can be distilled under reduced pressure to remove the solvent.
  • reaction mixture containing the compound represented by the formula (7d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Production method J is a method for obtaining a compound represented by the formula (7e) which is a production intermediate of the compound of the present invention, and comprises hydrolyzing the compound represented by the formula (7d) in the presence of water. It is a manufacturing method.
  • preferable Z2 is a chlorine atom, a bromine atom or an iodine atom.
  • the amount of water used in this reaction is not limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7d). Water can be used as a solvent.
  • the amount of silver nitrate used in this reaction is not limited as long as the intended reaction proceeds, as long as it is 2 equivalents or more based on the compound represented by the formula (7d), and usually 2 equivalents or more 10 It is below the equivalent.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether such as water solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane.
  • ether such as water solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane.
  • system solvents and nitrile solvents such as acetonitrile.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7d). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -10 ° C or higher and 100 ° C or lower or the boiling point of the solvent or lower.
  • a liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate
  • An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7e) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7e) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (7e) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Z3 is a hydrogen atom, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a C3 optionally substituted with a substituent C
  • Z3 may be optionally substituted with a hydrogen atom, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a substituent C.
  • organometallic reagent used in this reaction examples include organomagnesium halides (Z3-CH2-Mg-Hal: where Hal represents a halogen atom and Z3 has the same meaning as above) and organolithium reagents (Z3- CH2-Li: Here, Z3 has the same meaning as above.), Organomagnesium halide-zinc (II) ate complex reagent ([(Z3-CH2) 3-Zn]-[Mg-Hal] + [Mg- (Hal) 2] 2: Here, Z3 and Hal have the same meanings as described above. These organometallic reagents can be obtained as commercial products or can be produced by known methods.
  • the amount of the organometallic reagent used in this reaction may be 1 equivalent or more with respect to the formula (7e) and is not particularly limited as long as the intended reaction proceeds, Usually, it is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in the reaction is not particularly limited as long as the desired reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, hexane, etc. , Hydrocarbon solvents such as heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, hexane, etc.
  • Hydrocarbon solvents such as heptane, cyclohexane and methylcyclohexane.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7e). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -80 ° C or higher and 100 ° C or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane and chloroform, a hydrocarbon solvent such as hexane, heptane, cyclohexane and methylcyclohexane, which is incompatible with water. It is possible.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7f) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7f) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (7f) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Ox ′ represents an oxidizing agent
  • R1, R2, X, Y and Z3 have the same meanings as described above.
  • Production method L is a method for obtaining a compound represented by formula (7g), which comprises reacting the compound represented by formula (7f) with an oxidizing agent (Ox ′) in a solvent. Is.
  • This production method should be carried out by an oxidation method commonly used by those skilled in the art, such as Dess-Martin oxidation, Swern oxidation, and Parich-Doering oxidation.
  • the oxidation reaction is not particularly limited as long as the desired reaction proceeds.
  • the method of the Parrick-Daling oxidation using dimethyl sulfoxide, pyridine-sulfur trioxide complex and a base in a solvent is described.
  • the amount of dimethyl sulfoxide used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7f), and it is also used as a solvent. You can also do it.
  • the amount of the pyridine-sulfur trioxide complex used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7f). Usually, it is 1 equivalent or more and 20 equivalents or less.
  • the base used in this reaction includes organic amines such as triethylamine, tributylamine, diisopropylethylamine and the like.
  • the amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7f), and usually 1 equivalent or more. It is 50 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but dichloromethane, dichloroethane, chloroform, halogen-based solvents such as carbon tetrachloride, sulfur-based solvents such as dimethyl sulfoxide, etc. Can be mentioned. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7f). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -10 ° C or higher and 150 ° C or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane and chloroform, a hydrocarbon solvent such as hexane, heptane, cyclohexane and methylcyclohexane, which is incompatible with water. It is possible.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7 g) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7 g) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (7 g) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Z4 represents a p-toluenesulfonyl group, a methyl ester group, or an ethyl ester group
  • R1, R2, X, Y, and Z3 have the same meanings as described above.
  • the production method M is a method for obtaining the compound represented by the formula (7h), and the compound represented by the formula (7g) and NH 2 NH-Z4 (wherein Z4 has the same meaning as described above).
  • the production method includes reacting in a solvent in the presence of an acid.
  • NH 2 NH-Z4 used in this reaction can be obtained as a commercially available product or can be produced by a known method.
  • NH 2 NH-Z4 may be a salt formed with an acidic compound such as hydrochloric acid or sulfuric acid, or NH 2 NH-Z4 can be used after desalting by a known method in advance. .
  • the amount of NH 2 NH-Z4 used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7g). Usually, it is 1 equivalent or more and 20 equivalents or less.
  • the acids used in this reaction include organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid.
  • the amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but is usually 0.1 with respect to the compound represented by the formula (7g). Equivalent or more. Further, a liquid acid can be used as a solvent.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Methanol, ethanol, alcohol solvents such as isopropanol, benzene, toluene, xylene, mesitylene, chlorobenzene, benzene solvents such as dichlorobenzene, ethyl acetate, isopropyl acetate, ester solvents such as butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane,
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7g). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually 0 ° C. or higher and 180 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7h) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7h) obtained above can be distilled under reduced pressure to remove the solvent.
  • reaction mixture containing the compound represented by the formula (7h) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • the production method N is a method of obtaining the compound represented by the formula (1-a) among the compounds of the present invention represented by the formula (1), wherein the compound represented by the formula (7h) and thionyl chloride are It is a production method including reacting in a solvent.
  • the amount of thionyl chloride used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 2 equivalents or more based on the compound represented by the formula (7h), but it is usually 2 It is equal to or more than 20 equivalents. Also, thionyl chloride can be used as a solvent.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Methanol, ethanol, alcohol solvents such as isopropanol, benzene, toluene, xylene, mesitylene, chlorobenzene, benzene solvents such as dichlorobenzene, ethyl acetate, isopropyl acetate, ester solvents such as butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane,
  • the amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less by weight with respect to the compound represented by the formula (7h). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually 0 ° C. or higher and 180 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-a) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-a) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (1-a) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Z5 represents a halogen atom
  • R1, R2, Z3, X, Y and HalR are as defined above.
  • Production method O is a method for obtaining a compound represented by formula (7i) in which Z5 represents a halogen atom, wherein the compound represented by formula (7g) and a halogenating agent (HalR) are present in the presence of an acid.
  • a production method including reacting in a solvent.
  • selectfluor N-fluoro-N'-chloromethyl-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7g). It is 1 equivalent or more and 10 equivalents or less.
  • the amount of the halogenating agent containing hydantoin is not particularly limited as long as the desired reaction proceeds, as long as it is 0.5 equivalent or more, and is usually 1 equivalent to 5 equivalents.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid.
  • the amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but is usually 0.1 with respect to the compound represented by the formula (7g). Equivalent or more. Further, a liquid acid can be used as a solvent.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc.
  • Ether solvents such as diisopropyl
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7g). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7i) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7i) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (7i) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • the production method P is a method for obtaining the compound represented by the formula (1-b) among the compounds of the present invention represented by the formula (1), wherein the compound represented by the formula (7i) and thiourea are combined.
  • a production method including reacting in a solvent.
  • the amount of thiourea used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more relative to the compound represented by the formula (7i), but usually 1 equivalent It is above 10 equivalents.
  • This reaction can be performed in the presence of acid.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid.
  • the amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but is usually 0.1 with respect to the compound represented by the formula (7i). Equivalent or more. Further, a liquid acid can be used as a solvent.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc.
  • Ether solvents such as diisopropyl
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7i). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-b) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-b) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (1-b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Z7 represents a hydrogen atom, a cyano group, or a halogen atom
  • R1, R2, Z3, X, and Y have the same meanings as described above.
  • the production method Q is a method of obtaining the compound represented by the formula (1-c) among the compounds of the present invention represented by the formula (1), A production method comprising reacting sodium nitrate or nitrite with a solvent in the presence of an acid.
  • a production method comprising reacting sodium nitrate or nitrite with a solvent in the presence of an acid.
  • This reaction can be carried out in the presence of an acid, using a combination of sodium nitrite and phosphinic acid.
  • the amount of sodium nitrite used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). Usually, it is 1 equivalent or more and 10 equivalents or less.
  • the amount of phosphinic acid used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). It is 1 equivalent or more and 20 equivalents or less.
  • the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid.
  • the amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but it is usually 1 with respect to the compound represented by the formula (1-b). Equivalent or more. Further, a liquid acid can be used as a solvent.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc.
  • Ether solvents such as diisopropyl
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is generally 3 times or more and 200 times or more the weight of the compound represented by the formula (1-b). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-c) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-c) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (1-c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Z7 is a hydrogen atom
  • a production method using nitrites will be described.
  • Nitrite used in this reaction is not particularly limited as long as the intended reaction proceeds, methyl nitrite, ethyl nitrite, isoamyl nitrite, isobutyl nitrite, isopropyl nitrite, nitrite Examples thereof include t-butyl nitrate, n-propyl nitrite and n-butyl nitrite.
  • the amount of nitrites used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). Usually, it is 1 equivalent or more and 20 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc.
  • Ether solvents such as diisopropyl
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is generally 3 times or more and 200 times or more the weight of the compound represented by the formula (1-b). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-c) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-c) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (1-c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • a method for producing a compound represented by the formula (1-c) in which Z7 is a cyano group or a halogen atom will be described.
  • This reaction can be carried out in the presence of an acid, using a combination of sodium nitrite and a copper reagent or an inorganic salt.
  • the amount of sodium nitrite used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). Usually, it is 1 equivalent or more and 10 equivalents or less.
  • the copper reagent used in this reaction is a copper reagent containing a halogen atom such as copper chloride, copper bromide, and copper iodide when Z7 is a halogen atom, and a cyano group such as copper cyanide when Z7 is a cyano group. Copper reagents containing groups are mentioned.
  • the amount of the copper reagent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). It is 1 equivalent or more and 20 equivalents or less.
  • Z7 is a halogen atom
  • inorganic salts used in this reaction include halogen atoms such as sodium chloride, sodium bromide, sodium iodide, potassium chloride, potassium bromide, and potassium iodide, and Z7 is cyano.
  • Z7 is a halogen atom
  • Z7 is cyano.
  • groups inorganic salts containing a cyano group such as sodium cyanide or potassium cyanide can be mentioned.
  • the amount of the inorganic salt used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). It is 1 equivalent or more and 20 equivalents or less.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid.
  • the amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but it is usually 1 with respect to the compound represented by the formula (1-b). Equivalent or more. Further, a liquid acid can be used as a solvent.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc.
  • Ether solvents such as diisopropyl
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is generally 3 times or more and 200 times or more the weight of the compound represented by the formula (1-b). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-c) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-c) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (1-c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Z6 is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent A C2-C6 alkenyl group optionally substituted with C, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, or a C2-C6 haloalkynyl group, R1, R2, X and Y are as defined above.
  • Z6 is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent A C2-C6 alkenyl group optionally substituted with a group C, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, or a C2-C6 haloalkynyl group.
  • a method for obtaining the compound represented by the formula (7k) which is a production method comprising reacting the compound represented by the formula (7j) with an organometallic reagent in a solvent.
  • the organometallic reagent used in this reaction includes organomagnesium halides (Z6-Mg-Hal: where Hal represents a halogen atom and Z6 has the same meaning as described above) and organolithium reagents (Z6-Li: Here, Z6 is as defined above.), Organomagnesium halide-zinc (II) ate complex reagent ([(Z6) 3-Zn]-[Mg-Hal] + [Mg- (Hal) 2] 2 : Here, Z6 and Hal have the same meanings as described above.) And the like. These organometallic reagents can be obtained as commercial products or can be produced by known methods.
  • the amount of the organometallic reagent used in this reaction may be 1 equivalent or more with respect to the formula (7j), and is not particularly limited as long as the intended reaction proceeds, Usually, it is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in the reaction is not particularly limited as long as the desired reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, hexane, etc. , Hydrocarbon solvents such as heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, hexane, etc.
  • Hydrocarbon solvents such as heptane, cyclohexane and methylcyclohexane.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7j). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -80 ° C or higher and 100 ° C or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane and chloroform, a hydrocarbon solvent such as hexane, heptane, cyclohexane and methylcyclohexane, which is incompatible with water. It is possible.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (7k) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (7k) obtained above can be distilled under reduced pressure to remove the solvent.
  • reaction mixture containing the compound represented by the formula (7k) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Ox ′′ represents an oxidizing agent
  • R1, R2, X, Y and Z6 have the same meanings as described above.
  • Production method S is a method for obtaining a compound represented by the formula (7L), which comprises reacting the compound represented by the formula (7k) with an oxidizing agent (Ox ′′) in a solvent. Is the way.
  • This production method should be carried out by an oxidation method commonly used by those skilled in the art, such as Dess-Martin oxidation, Swern oxidation, and Parich-Doering oxidation. You can The oxidation reaction is not particularly limited as long as the desired reaction proceeds.
  • the production method S can be carried out according to the production method L.
  • the production method T is a method for obtaining the compound represented by the formula (7m), wherein the compound represented by the formula (7L) and NH 2 NH-Z4 (wherein Z4 has the same meaning as described above).
  • the production method includes reacting in a solvent in the presence of an acid.
  • NH 2 NH-Z4 used in this reaction can be obtained as a commercially available product or can be produced by a known method.
  • NH 2 NH-Z4 may be a salt formed with an acidic compound such as hydrochloric acid or sulfuric acid, or NH 2 NH-Z4 can be used after desalting by a known method in advance. .
  • the amount of NH 2 NH—Z4 used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7L). Usually, it is 1 equivalent or more and 20 equivalents or less.
  • the acids used in this reaction include organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid.
  • the production method T can be carried out according to the production method M.
  • R1, R2, X, Y, Z4 and Z6 are as defined above.
  • the production method U is a method for obtaining the compound represented by the formula (1-d) among the compounds of the present invention represented by the formula (1), wherein the compound represented by the formula (7m) and thionyl chloride are It is a production method including reacting in a solvent.
  • the amount of thionyl chloride used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 2 equivalents or more based on the compound represented by the formula (7m), but usually 2 It is equal to or more than 20 equivalents. Also, thionyl chloride can be used as a solvent.
  • the production method U can be carried out according to the production method N.
  • Production method V is a method for obtaining a compound represented by formula (7n), in which Z5 represents a halogen atom, wherein the compound represented by formula (7L) and a halogenating agent (HalR) are present in the presence of an acid.
  • a production method including reacting in a solvent.
  • selectfluor N-fluoro-N'-chloromethyl-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the production method V can be carried out according to the production method O.
  • the production method W is a method for obtaining the compound represented by the formula (1-e) among the compounds of the present invention represented by the formula (1), wherein the compound represented by the formula (7n) and thiourea are combined. , A production method including reacting in a solvent.
  • the production method W can be carried out according to the production method P.
  • the production method X is a method of obtaining the compound represented by the formula (1-f) among the compounds of the present invention represented by the formula (1), and the compound represented by the formula (1-e) is A production method comprising reacting sodium nitrate or nitrite with a solvent in the presence of an acid.
  • production method X can be carried out according to production method Q. it can.
  • J represents an oxygen atom or a sulfur atom
  • R2c is a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, or a substituent A.
  • Production method Y is a compound represented by formula (1a), wherein J represents an oxygen atom or a sulfur atom, and when J is an oxygen atom, R2c is a C1 to C6 which may be optionally substituted with a substituent A.
  • R2c is a C1 to C6 alkyl group or C1 to C6
  • R2c-JQ and a compound represented by formula (1-g) are represented by the formula (1-h)
  • a manufacturing method comprising obtained by a coupling reaction that.
  • R2b is chlorine atom, bromine atom or iodine atom.
  • R2c-JQ used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
  • the amount of R2c-JQ used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is at least 1 equivalent relative to the compound represented by the formula (1-g). .
  • Q is a hydrogen atom, it can be used also as a solvent.
  • the transition metals used in this reaction may have a ligand, and include palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladium compounds such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • the amount of transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. There is no such thing.
  • triphenylphosphine 1,1′-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2′4′6′-triisopropylbiphenyl, 2-di-t
  • a phosphine ligand such as -butylphosphino-2'4'6'-triisopropylbiphenyl can be added.
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. It will not be done.
  • the bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate, and organic bases such as triethylamine, tributylamine and diisopropylethylamine.
  • the amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g), but is preferably It is 1 equivalent or more and 50 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but R2c-JH (wherein R2c has the same meaning as described above and J is an oxygen atom).
  • Alcohol solvent represented by diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, ether solvent such as dioxane, benzene solvent such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc. Is mentioned.
  • These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-g). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • a saline solution Etc can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by performing a filtration operation.
  • the water content of the reaction mixture containing the compound represented by the formula (1-h) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-h) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (1-h) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • R2d is a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent A, a substituent A Represents a C2-C6 alkenyl group which may be optionally substituted with, or a C2-C6 haloalkenyl group, R2d-B represents an organic boronic acid, and R1, Het, R2b, X and Y have the same meanings as described above. ..
  • Production method Z is a compound represented by formula (1a) in which R2d is optionally substituted with a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, and a substituent A, which may be optionally substituted with a substituent A.
  • R2b is chlorine atom, bromine atom, or iodine atom.
  • R2d-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercial product or can be produced by a known method.
  • the amount of R2d-B used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more relative to the compound represented by the formula (1-g). , And preferably 1 equivalent or more and 10 equivalents or less.
  • the transition metals used in this reaction are palladium, nickel, ruthenium, etc., and may have a ligand.
  • Preferred are palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis (triphenylphosphine) palladium, bis (triphenylphosphine) palladium dichloride and the like. Examples include palladiums.
  • the amount of transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. There is no such thing.
  • a phosphine ligand such as triphenylphosphine or tricyclohexylphosphine can be added to allow the reaction to proceed efficiently.
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. It will not be done.
  • the bases used in this reaction are inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide.
  • the amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g), but is preferably It is 1 equivalent or more and 50 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether such as water solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane.
  • the solvent include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-g). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • a saline solution Etc can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by performing a filtration operation.
  • the water content of the reaction mixture containing the compound represented by the formula (1-i) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-i) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (1-i) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • R2e represents a C2-C6 alkynyl group which may be appropriately substituted with the substituent A, or a C2-C6 haloalkynyl group
  • R1, Het, R2b, X and Y have the same meanings as described above.
  • the production method AA is performed by synthesizing a compound represented by the formula (1a) in which R2e is a C2-C6 alkynyl group optionally substituted by a substituent A, or a C2-C6 haloalkynyl group.
  • j) a method of synthesizing a compound represented by formula (1-g) and a terminal alkyne compound in a solvent in the presence of a transition metal and a base, a Sonogashira coupling It is a manufacturing method including obtaining.
  • R2b is chlorine atom, bromine atom, or iodine atom.
  • the terminal alkyne compound used in this reaction can be obtained as a commercial product or can be produced by a known method. Further, trimethylsilylacetylene can also be used as the terminal alkyne compound. In this case, it is necessary to introduce a trimethylsilylethynyl group into the compound represented by formula (1a-b) and then perform desilylation. Regarding desilylation, Journal of the American Chemical Society, Vol. 131, No. 2, pp. 634-643 (2009). And Journal of Organometallic Chemistry, Vol. 696, No. 25, pp. 4039-4045 (2011). And the like.
  • the amount of the terminal alkyne compound used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). It is preferably 1 equivalent or more and 10 equivalents or less.
  • the transition metals used in this reaction may have a ligand, and include palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladium compounds such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • coppers such as copper chloride, copper bromide, and copper iodide are used at the same time.
  • the amount of transition metals used in this reaction may be 0.001 equivalent or more of palladium and copper and the compound represented by the formula (1a-b), respectively, so that the desired reaction proceeds. There is no particular limitation as long as it does. Preferred amounts are 0.001 equivalent to 1 equivalent in both cases.
  • Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
  • organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine
  • inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
  • the amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g), but is preferably It is 1 equivalent or more and 50 equivalents or less.
  • an organic base in a liquid state can be used as a solvent.
  • a phosphine ligand such as tri-t-butylphosphine or 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added to promote the reaction efficiently, but it is not essential. .
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. It will not be done.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester-based solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile-based solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide , Amide solvents such as N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform and
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-g). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • a post-treatment of the reaction it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, or a saline solution is optional.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by performing a filtration operation.
  • the water content of the reaction mixture containing the compound represented by the formula (1-j) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-j) obtained above can be distilled under reduced pressure to remove the solvent.
  • reaction mixture containing the compound represented by the formula (1-j) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Rya represents a C1 to C6 alkoxy group
  • Het1 represents a 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom
  • the 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom is R3.
  • R1, R2, X, Y and the broken line portion have the same meanings as described above.
  • Production method AB is a method for synthesizing a compound represented by the formula (1-L) having a hydroxyl group among the compounds represented by the formula (1), wherein Rya is a C1 to C6 alkoxy group ( 1-k) is a production method which comprises obtaining a compound represented by 1-k) and an acid in a solvent.
  • the acids used in this reaction include boron halides such as boron trichloride and boron tribromide.
  • the amount of the acid used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-k) and is not particularly limited as long as the intended reaction proceeds, but is preferably Is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is a benzene solvent such as benzene, toluene, xylene, mesitylene, chlorobenzene, or dichlorobenzene, and a nitrile solvent such as acetonitrile.
  • benzene solvent such as benzene, toluene, xylene, mesitylene, chlorobenzene, or dichlorobenzene
  • a nitrile solvent such as acetonitrile.
  • Halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride
  • hydrocarbon-based solvents such as hexane, heptane, cyclohexane and methylcyclohexane.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-k). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -80 ° C or higher and 100 ° C or lower, or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • a saline solution Etc can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-L) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-L) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by the formula (1-L) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • a method for synthesizing a compound which comprises reacting the compound represented by the formula (1-L) with Ryb-Lv in a solvent in the presence of a base.
  • Ryb-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of Ryb-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-L), and is not particularly limited as long as the intended reaction proceeds. , And preferably 1 equivalent or more and 10 equivalents or less.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and sodium hydride
  • organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine and lutidine Examples thereof include, but are not particularly limited as long as the desired reaction proceeds.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-L), and is not particularly limited as long as the intended reaction proceeds, but is preferably Is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Methanol, ethanol, alcohol solvents such as isopropanol, benzene, toluene, xylene, mesitylene, chlorobenzene, benzene solvents such as dichlorobenzene, ethyl acetate, isopropyl acetate, ester solvents such as butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane,
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-L). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -20 ° C or higher and 150 ° C or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-m) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-m) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (1-m) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • Ryc represents a halogen atom
  • Ryd represents a C1 to C6 alkyl group optionally substituted by a substituent C
  • a C1 to C6 haloalkyl group a C3 to C8 optionally substituted by a substituent C.
  • Ryd-B represents an organic boronic acid
  • R1, R2, Het1, X , Y and the broken line portion have the same meanings as described above.
  • the production method AD is a compound represented by the formula (1) in which Ryd is appropriately substituted with a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, and a substituent C which may be optionally substituted with a substituent C.
  • a C3 to C8 cycloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent C, or a C2 to C6 haloalkenyl group represented by the formula (1-o) A synthetic method, which is obtained by Suzuki-Miyaura coupling in which a compound represented by the formula (1-n) and an organic boronic acid (Ryd-B) are reacted in a solvent in the presence of a transition metal and a base. It is a manufacturing method including the above.
  • Ryc is a chlorine atom, a bromine atom or an iodine atom.
  • Ryd-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercial product or can be produced by a known method.
  • Production Method Z by using the compound represented by Formula (1-g) and R2d-B in Production Method Z instead of the compound represented by Formula (1-n) and Ryd-B, respectively.
  • the manufacturing method AD can be carried out according to.
  • Rye represents a C2 to C6 alkynyl group which may be appropriately substituted with a substituent C, or a C2 to C6 haloalkynyl group
  • Ryc, R1, R2, X, Y, Het1 and the broken line portion are as described above. are synonymous.
  • the production method AE is a compound represented by the formula (1) wherein Rye is a C2-C6 alkynyl group optionally substituted with a substituent C, or a C2-C6 haloalkynyl group.
  • p) a method for synthesizing a compound represented by formula (1-n) and a terminal alkyne compound in the presence of a transition metal and a base in a solvent, Sonogashira coupling It is a manufacturing method including obtaining.
  • Ryc is a chlorine atom, a bromine atom or an iodine atom.
  • the production method AE can be carried out according to the production method AA. .
  • Ryf represents a halogen atom
  • Het2 represents a 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom
  • the 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom is substituted with R3 as appropriate.
  • HalR, R1, R2, X, Y and the broken line portion are as defined above.
  • the production method AF is a production method for obtaining a compound represented by the formula (1-r) in which Ryf is a halogen atom among the compounds represented by the formula (1), wherein at least one substituent is substituted for Het2. It is a production method which comprises reacting the compound represented by the formula (1-q) having a hydrogen atom with a halogenating agent (HalR) in a solvent.
  • a halogenating agent HalR
  • selectrofluor N-fluoro-N'-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1 , 3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-q). It is preferably 1 equivalent or more and 10 equivalents or less.
  • the amount of the halogenating agent containing hydantoin is not particularly limited as long as the desired reaction proceeds as long as the amount is 0.5 equivalent or more, and is preferably 1 equivalent to 5 equivalents.
  • the halogenating agent used in this reaction is an iodizing agent
  • inorganic acids such as hydrochloric acid and sulfuric acid
  • acids such as organic acids
  • acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid you can
  • the desired reaction It is not particularly limited as long as it proceeds, but it is preferably 0.1 equivalent or more and 3 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc.
  • Ether solvents such as diisopropyl
  • Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-q). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-r) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-r) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (1-r) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • R5c represents a halogen atom
  • R5a may be optionally substituted with a cyano group, a C1 to C6 alkoxy group optionally substituted with a substituent C, a C1 to C6 haloalkoxy group, or a substituent C.
  • R1, R2, R4, Het, Q, X and the broken line portion have the same meanings as described above.
  • Production method AG is a compound represented by formula (1) in which R5a is a cyano group, a C1 to C6 alkoxy group optionally substituted with a substituent C, a C1 to C6 haloalkoxy group, a substituent C Optionally substituted with a C3 to C8 cycloalkoxy group, a C2 to C6 alkenyloxy group optionally substituted with a substituent C, a C2 to C6 haloalkenyloxy group, a substituent C optionally substituted with C3 to C6 alkynyloxy group, C3 to C6 haloalkynyloxy group, RaRbN- (wherein Ra and Rb have the same meanings as described above), or Rc-L- (herein, Rc and L).
  • R5a-Q used in this reaction can be obtained as a commercial product.
  • Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
  • the amount of R5a-Q used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is at least 1 equivalent to the compound represented by the formula (1-s). , And preferably 1 equivalent or more and 30 equivalents or less.
  • Q represents a hydrogen atom, it can be used as a solvent.
  • the base used in this reaction is preferably an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate or sodium hydride.
  • Q is an alkali metal, the use of a base is not essential.
  • the amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-s). It is preferably 1 equivalent or more and 30 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an alcohol solvent represented by R5a-H, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy.
  • Ether-based solvents such as ethane, tetrahydrofuran and dioxane, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester-based solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile-based solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide and other amide solvents, 1,3-dimethyl-2-imidazolidinone and other urea solvents, dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc Halogenated solvents, dimethylsulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such
  • the amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more by weight that of the compound represented by the formula (1-s). It is the following.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
  • a post-treatment of the reaction it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, or a saline solution is optional.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (1-t) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (1-t) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
  • reaction mixture containing the compound represented by the formula (1-t) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • R5aa represents a C1 to C6 alkoxy group which may be appropriately substituted with a substituent C
  • R1, R2, R4, X, Het and the broken line have the same meanings as described above.
  • the production method AH is a method for synthesizing a compound represented by the formula (1-v) having a hydroxyl group among the compounds represented by the formula (1), wherein R5aa is a C1 to C6 alkoxy group ( 1-u) is a production method which comprises obtaining the compound represented by 1-u) by reacting with an acid in a solvent.
  • production method AH can be carried out according to production method AB. .
  • R5b is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent C
  • An optionally substituted C2-C6 alkenyl group, a C2-C6 haloalkenyl group, an optionally substituted C3-C6 alkynyl group, a C3-C6 haloalkynyl group, or Rx1C ( O)-(Rx1 has the same meaning as described above), and Lv, R1, R2, R4, Het, X and the broken line have the same meaning as described above.
  • the production method AI is a compound represented by the formula (1), in which R5b-O- is a C1 to C6 alkoxy group, C1 to C6 haloalkoxy group or a substituent C in which R5b-O- may be appropriately substituted with a substituent C.
  • a method for synthesizing a compound which comprises reacting a compound represented by the formula (1-v) with R5b-Lv in a solvent in the presence of a base.
  • the R5b-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • production method AI can be carried out according to production method AC. .
  • R5d is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent C Represents a C2 to C6 alkenyl group which may be optionally substituted with, or a C2 to C6 haloalkenyl group, R5d-B represents an organic boronic acid, R1, R2, R4, R5c, X, Het and a broken line part It is synonymous with the above.
  • the production method AJ is a compound represented by the formula (1) in which R5d is appropriately substituted with a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, and a substituent C which may be optionally substituted with a substituent C.
  • R5c is a chlorine atom, a bromine atom or an iodine atom.
  • production method AJ can be carried out according to production method AD. .
  • R5e represents a C2 to C6 alkynyl group which may be appropriately substituted with a substituent C, or a C2 to C6 haloalkynyl group
  • R1, R2, R4, R5c, X, Het and the broken line portion are as described above. are synonymous.
  • the production method AK is a compound represented by the formula (1-) in which R5e is a C2-C6 alkynyl group which may be optionally substituted with a substituent C, or a C2-C6 haloalkynyl group in the compound represented by the formula (1).
  • y) a method for synthesizing a compound represented by the formula (1-s), wherein Sonogashira coupling is carried out by reacting the compound represented by the formula (1-s) with a terminal alkyne compound in the presence of a transition metal and a base. It is a manufacturing method including obtaining.
  • R5c is a chlorine atom, a bromine atom or an iodine atom.
  • production method AK can be carried out according to production method AE. .
  • the production method AL is represented by the formula (Lb) in which Rb contained in R2, R3, R4, R5, the substituent A and the substituent C in the compound represented by the formula (1) is SO or SO 2.
  • a production method comprising reacting a compound and an oxidizing agent (Ox ′ ′′) in a solvent.
  • oxidizing agent used in this reaction examples include hydrogen peroxide solution and peroxides such as meta-chloroperbenzoic acid. Also, transition metals such as sodium tungstate can be added.
  • the amount of the oxidizing agent used in this reaction is usually 1.0 equivalent or more and 1.2 equivalents or less with respect to the compound represented by the formula (La) when SO is produced, and SO 2 is produced. When doing, it is usually 2 equivalents or more and 10 equivalents or less. When adding transition metals, the amount is usually 0.001 equivalent or more and 1 equivalent or less.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it may be an aqueous solvent, an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene or the like.
  • an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene or the like.
  • examples thereof include benzene-based solvents, nitrile-based solvents such as acetonitrile, halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (La). is there.
  • the temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -10 ° C or higher and 120 ° C or lower or the boiling point of the solvent or lower.
  • aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved
  • an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved
  • thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily.
  • a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl-
  • An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add.
  • these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
  • the number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
  • the water content of the reaction mixture containing the compound represented by the formula (Lb) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • reaction mixture containing the compound represented by the formula (Lb) obtained above can be distilled under reduced pressure to remove the solvent.
  • reaction mixture containing the compound represented by the formula (Lb) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
  • the compounds represented by the formula (1) can be produced by arbitrarily combining the production methods A to AL shown above.
  • the compound represented by the formula (1) can be produced by arbitrarily combining the known method and the production methods A to AL.
  • the compound of the present invention can control organisms harmful to plants, it can be used as an agricultural chemical.
  • Specific examples include fungicides, insecticides, herbicides, plant growth regulators, and the like.
  • a bactericide is preferable.
  • the compound of the present invention can be used as a fungicide for agricultural and horticultural use for controlling plant diseases in fields, paddy fields, tea fields, orchards, meadows, lawns, forests, gardens, roadside trees and the like.
  • the plant diseases referred to in the present invention are crops, flowers, flowers, trees, wilting of plants such as trees, systemic abnormal pathological symptoms such as wilting, yellowing, atrophy, and captivity, or spots, leaf wilting, mosaic. , Partial morbidity such as cigar, wilting, root rot, root-knot, and hump are caused. That is, the plant becomes ill.
  • Pathogens causing plant diseases mainly include fungi, bacteria, spiroplasma, phytoplasma, viruses, viroids, parasitic higher plants, nematodes and the like.
  • the compound of the present invention is effective on fungi, but is not limited thereto.
  • the diseases caused by fungi are mainly fungal diseases.
  • Fungi pathogens which cause fungal diseases include fungus fungi, oomycetes, zygomycetes, ascomycetes, basidiomycetes and incomplete fungi.
  • fungus fungi root-knot fungus, powdery mildew fungus, sugar beet wilt fungus, oomycete, downy mildew, Pythium genus, Aphanomyces genus, zygomycetes Rhizopus genus, ascomycetes Fungi include peach leaf blight, corn sesame leaf blight, rice blast, powdery mildew, anthracnose, red mold, bacillus seedling, sclerotium, basidiomycetes, rust, smut, and purple print Fungi, blast fungus, sheath blight fungus, and imperfect fungi include gray mold, Alternaria, Fusarium, Penicillium, Rhizoctonia, and white silk.
  • the compound of the present invention is effective against various plant diseases.
  • specific examples of the disease name and the pathogen name will be shown.
  • Rice blast (Magnaporthe grisea), sheath blight (Thanatephorus cucumeris), brown rot (Ceratobasidium setariae), brown sclerotium (Waitea circinata), brown spot rot spelling bacterium (Therca erucorus phus) Sclerotium hydrophilum, red rot (Wairea circinata), black rot (Entyloma dactylidis), pneumococcal disease (Magnaporthe salvinii leaf blight, Ceratobosa sigma rot) Blight disease (Sphaerulina oryzina) , Frog seedling disease (Gibberella fujikuroi), seedling blight (Pythium spp., Fusarium spp., Trichoderma spp., Rhizopus spp., Rhizonia spore, Rhizoctonia spore, Rhizoptonia solipani, M
  • Tritici Tritici
  • rust Pierinia striiformis, Puccinia graminis, Puccinia reconitia, Puccinia reconia, Puccinia reconia, Puccinia reconitia, Puccinia reno) disease Pyrenophora teres
  • Fusarium zeae Fusarium culmorum, Fusarium avenaceum, Monographella nivalis, Snow rot (Typhula incarina, Typhula inicarina, Typhula iniganeis raisulai sushi) nuda), fishy smell smut (Tilletia caries, Tilletia controversa), Memonbyo (Pseudocercosporella herpotrichoides), stock rot (Ceratobasidium gramineum), scald (Rhynchosporium secalis), leaf blight (Septoria tritici), glume
  • Syringae Fusarium aveneum, Penicillium spp., Pythium spp., Rhizoctonia spp., Pustinia sprouts, Pustinia sorghum blight, Puccinia sorghum blight (Puccinia sorghum) (Utilago maydis), Anthrax (Colletotrichum graminicola), Northern spot (Cochliobolus carbonum), Brown streak (Acidovorax avenae ssp.
  • Erwinia sp. Apical carcinoma (Agrobacterium tumefaciens), rust blight (Erwinia chrysanthemi pv. Chrysanthemi), and flower rot bacterial disease (Pseudomonas syringa. s ringae), bacterial wilt disease (Erwinia sp.); peach scab (Cladosporium carpophilum), homopsis rot (Phomopsis sp.), plague (Phytophthora spp.), and anthrax (Colletotrophithosporium). deformans), perforated bacterial disease (Xhanthomonas campestris pv.
  • ytoplasma asteris yellow dwarf (Tobacco leaf curl subgroup III geminivirus); Brown spot bacterial disease (Pseudomonas cichorii), stem nematode bacterial disease (Pseudomonas corrugata), stem rot bacterial disease (Erwinia chrysanthemi), soft rot (Erwinia carotovora spores, spores of spores, spores, spores, spores, spores and germs).
  • Black rot Alternaria brassicae
  • black rot Xhanthomonas campestris pv.
  • Campestris black rot (Pseudomonas syringae pv. Eravia kuroa eroa var. Etc.), white spot disease (Cercosporella brassicae), root rot disease (Pharma lingam), clubroot disease (Plasmodiophora brassicae), downy mildew (Peronospora sarcoma, black rot sampa sampa samposa, black rot) Pseudomonas sy ringae pv. maculicola), soft rot (Erwinia carotovora subsp.
  • soybean purpura (Cercospora kikuchii), black rot (Elsinoe glycines), black spot (Diaporthe phasoolz, rhizopha spores and lysophia rotoh rotoh rotonia sarcopodium) e), downy mildew (Peronospora manshurica), rust (Phakopsora pachyrhizi), anthrax (Colletotrichum truncatum, etc.), leaf blight (Xanthomonas camps pesgos pest.
  • Anthrax Coldletotrichum lindemutianum
  • bacterial wilt Ralstonia solanacearum
  • scab Pseudomonas syringae pv. Phaseolicola
  • brown spot bacterial disease Pseudomonas visamrais virions virion virion virion virion virion virion virion sv. .
  • phaseoli Phaseoli
  • Peanut black spot Mycosphaerella berkeleyi
  • brown spot Mycosphaerella arachidis
  • bacterial wilt Ralstonia solanacearum
  • pea powdery mildew Erysiphe psi
  • porphyra spermosis downy mildew (Personia alba) syringae pv. pisi)
  • vine rot Xhanthomonas campestris pv.
  • Streptomyces ipomoea Streptomyces leaf spot (Cercospora beticola), downy mildew (Peronospora schaecchia), Black root (Aphanomyces eschariis).
  • Strawberry powdery mildew (Sphaerotheca aphanis var. Aphanis), plague (Phytophthora nicotianae, etc.), anthrax (Glomerella singulata, etc.), fruit rot (Pythium ultimum), bacterial rot (Stithium ultimum), Xanthomonas sclera campestris), Bacterial blight (Pseudomonas marginalis pv.
  • Fusarium sickness (Sphaerotheca pannosa, etc.), plague (Phytophthora megasperma), downy mildew (Peronospora sparsa), root carcinoma (Agrobacterium tumefaciens), chrysanthemum spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore sb. ), Plague (Phytophthora actorum), spot bacterial disease (Pseudomonas ichorii), soft rot (Erwinia carotovora subsp
  • ifolia turf brown patch disease (Rhizoctonia solani), dollar spot disease (Sclerotinia homoeocarpa), curvularia leaf blight (Curvularia sp.), rust (Puccinia zoysia sp.
  • the compound of the present invention may be used as the present compound alone, but is preferably mixed with a solid carrier, a liquid carrier, a gas carrier, a surfactant, a fixing agent, a dispersant, a stabilizer, etc., and a powder or wettable powder.
  • a solid carrier e.g., a liquid carrier, a gas carrier, a surfactant, a fixing agent, a dispersant, a stabilizer, etc.
  • a powder or wettable powder e. wettable powder, aqueous solvent, granular aqueous solution, granule, emulsion, solution, microemulsion, aqueous suspension preparation, aqueous emulsion preparation, suspoemulsion preparation and the like.
  • the composition is not limited as long as the effect is exhibited.
  • composition of the present invention (agricultural / horticultural pest control agent, agricultural / horticultural fungicide) will be described below.
  • Examples of the method of applying the composition containing the compound of the present invention include a method of contacting with a plant or seed, or a method of adding the composition to cultivated soil and contacting with a root or rhizome of a plant.
  • any method of application as used by those skilled in the art will work well.
  • plant refers to a plant that performs photosynthesis and lives without exercise.
  • Specific examples include rice, wheat, barley, corn, coffee, banana, grape, apple, pear, peach, cherry, oyster, citrus, soybean, bean, cotton, strawberry, potato, cabbage, lettuce, tomato, cucumber, eggplant, Watermelon, sugar beet, spinach, snow pea, pumpkin, sugar cane, tobacco, bell pepper, sweet potato, taro, konjac, cotton, sunflower, rose, tulip, chrysanthemum, turf, etc. and their F1 varieties and the like can be mentioned.
  • it includes genetically modified crops that are produced by manipulating genes and the like and are not originally present in the natural world.For example, soybeans, corn, cotton, etc.
  • the “plant” in the present invention is a general term for all parts constituting the above-mentioned plant individual, and includes, for example, stems, leaves, roots, seeds, flowers, fruits and the like.
  • seed refers to a seed that stores nutrients for germination of young plants and is used for agricultural reproduction.
  • Specific examples include seeds of corn, soybeans, cotton, rice, sugar beet, wheat, barley, sunflower, tomato, cucumber, eggplant, spinach, snow peas, pumpkin, sugar cane, tobacco, peppers, oilseed rape, and their F1 varieties.
  • Examples include seeds, seed potatoes such as taro, potato, sweet potato, and konjac, edible lilies, bulbs such as tulips, seed balls such as rakkyo, and seeds and tubers of genetically modified crops.
  • the application rate and application concentration of the composition containing the compound of the present invention vary depending on the target crop, target disease, degree of disease occurrence, dosage form of the compound, application method and various environmental conditions, but when spraying or irrigating. Is suitably 0.1 to 10,000 g per hectare, and preferably 10 to 1,000 g per hectare. In the case of seed treatment, the amount used is 0.0001 to 1000 g, preferably 0.001 to 100 g, per 1 kg of seeds as the amount of active ingredient.
  • the composition containing the compound of the present invention is used as a foliage spraying treatment on a plant individual, a spraying treatment on a soil surface, an injection treatment into soil or a soil irrigation treatment, the composition is diluted with an appropriate carrier at an appropriate concentration.
  • the processing may be performed.
  • the composition containing the compound of the present invention When the composition containing the compound of the present invention is brought into contact with a plant seed, it may be diluted to an appropriate concentration and then immersed, dressed, sprayed or smeared on the plant seed before use.
  • the amount of the composition used in the case of dipping, dressing, spraying or smearing is usually about 0.05 to 50%, preferably 0.1 to 30% of the weight of dry plant seeds as the amount of active ingredient. Is suitable, but it may be appropriately set depending on the form of the composition and the kind of plant seed to be treated, and is not limited to these ranges.
  • composition containing the compound of the present invention if necessary, other pesticides, for example, fungicides, insecticides, acaricides, nematicides, herbicides, pesticides such as biological pesticides and plant growth regulators, nucleic acids. It can be used as a mixture with a disease controlling agent (International Publication No. 2014/062775) containing as an active ingredient, a soil conditioner or a fertilizer.
  • fungicides for example, fungicides, insecticides, acaricides, nematicides, herbicides, pesticides such as biological pesticides and plant growth regulators, nucleic acids.
  • insecticides for example, fungicides, insecticides, acaricides, nematicides, herbicides, pesticides such as biological pesticides and plant growth regulators, nucleic acids.
  • a disease controlling agent International Publication No. 2014/062775
  • bactericide that can be used by mixing with the compound of the present invention are exemplified in the following group b, and include salts, isomers and N-oxides thereof.
  • the known disinfectants are not limited to these.
  • Group b b-1: Phenylamide fungicide As a phenylamide fungicide, [b-1.1]: benalaxyl (benalaxyl), [b-1.2] benalaxyl M or chiralaxyl (benalaxyl-M or chiralaxyl), [b -1.3] Furalaxyl, [b-1.4] Metalaxyl, [b-1.5] Metalaxyl M or Mephenoxam (Metalaxyl-M or mefenoxam), [b-1.6] Oxadixyl (-) oxadixyl), [b-1.7] off-race, and the like.
  • b-2 mitotic cell division and cell division inhibitor
  • mitotic cell division and cell division inhibitor As a mitotic cell division and cell division inhibitor, [b-2.1] benomyl, [b-2.2] carbendazim, [b- 2.3] fuberidazole, [b-2.4] thiabendazole, [b-2.5] thiophanate, [b-2.6] thiophanate-methyl, [b- 2.7] Diethofencarb, [b-2.8] zoxamide, [b-2.9] ethaboxam, [b-2.10] pencycuron, [b-2. 11] Full opico Lido (fluopicolide), [b-2.12] phenamacril and the like can be mentioned.
  • SDHI agent Succinate dehydrogenase inhibitor
  • b-4 Quinone external inhibitor (QoI agent) As a quinone external inhibitor (QoI agent), [b-4.1] azoxystrobin, [b-4.2] cumoxystrobin, [b-4.3] dimoxist Robin (dimoxystrobin), [b-4.4] enoxastrobin (enoxastrobin), [b-4.5] famoxadone, [b-4.6] fenamidone, [b-4.7.
  • quinone internal inhibitor examples include [b-5.1] cyazofamide and [b-5.2] amisulbrom.
  • b-6 Oxidative phosphorylation uncoupling inhibitor As an oxidative phosphorylation uncoupling inhibitor, [b-6.1] binapacryl (binapacryl), [b-6.2] meptyldinocap, [b-6.2] Examples thereof include b-6.3] dinocap and [b-6.4] fluazinam.
  • quinone external stigmaterin-binding subsite inhibitor examples include [b-7.1] amethoctrazine.
  • b-8 Amino acid biosynthesis inhibitor As an amino acid biosynthesis inhibitor, [b-8.1] cyprodinil, [b-8.2] mepanipyrim, and [b-8.3] pyrimethanil (pyrimethanil). ) And the like.
  • b-9 Protein biosynthesis inhibitor [b-9.1] streptomycin, [b-9.2] blasticidin S (blasticidin-S), [b-9. 3] Kasugamycin, [b-9.4] oxytetracycline and the like.
  • b-10 Signal transduction inhibitor As a signal transduction inhibitor, [b-10.1] fenpiclonil, [b-10.2] fludioxonil, [b-10.3] quinoxyphen, [B-10.4] proquinazid, [b-10.5] chlorozolinate, [b-10.6] dimethaclone, [b-10.7] iprodione, [b -10.8] procymidone, [b-10.9] vinclozoline and the like can be mentioned.
  • b-11 Lipid and Cell Membrane Biosynthesis Inhibitors [b-11.1] edifenphos, [b-11.2] iprobenphos, [b-11.3] as lipid and cell membrane biosynthesis inhibitors. ] Pyrazophos, [b-11.4] isoprothiolane, [b-11.5] biphenyl, [b-11.6] chloroneb, [b-11.7] dichlorane (Dicloran), [b-11. 8] quintozene, [b-11. 9] tecnazene, [b-11.10] tolclofos-methyl, [b-11.11]. Etridiazole (ec hlomezol or etridiazole), [b-11.12] iodocarb, [b-11.13] propamocarb, [b-11.14] prothiocarb, and the like.
  • Etridiazole ec hlomezol or etridiazole
  • DI agent Demethylation inhibitor
  • demethylation inhibitors include [b-12.1] azaconazole, [b-12.2] bitertanol, [b-12.3] bromuconazole, and [b-12.3] bromuconazole.
  • Fenbuconazole [b-12.12] fluquinconazole, [b-12.13] quinconazole, [b-12.14] flusilazole, [b-12] .15] Flutriafol, [b-12.16] hexaconazole, [b-12.17] imazalil, [b-12.18] imibenconazole, [B-12.19] ipconazole, [b-12.20] metconazole, [b-12.21] microbutanil , [B-12.22] nuarimol, [b-12.23] oxpoconazole, [b-12.24] oxpoconazole fumarate, [b- 12.25] pefurazoate, [b-12.26] penconazole, [b-12.27] prochloraz, [b-12.28] propiconazole, [b- 12.29] Prothioconazole, [b-12.30] Pyrifenox, [b-12.31] Pyriso
  • Triadimenol [b-12.37] triflumizole, [b-12.38] triforine, [b-12.39] triticonazole [b-12] .40] mefentrifluconazole, [b-12.41] ipfentrifluconazole, and the like.
  • b-13 Amine-based bactericide As amine-based bactericide, [b-13.1] aldimorph, [b-13.2] dodemorph, [b-13.3] fenpropimorph ), [B-13.4] tridemorph, [b-13.5] phenpropidin, [b-13.6] piperalin, [b-13.7] spiroxamine. ) And the like.
  • b-14 3-keto reductase inhibitor in C4 demethylation of sterol biosynthesis
  • b-15 Squalene epoxidase inhibitor for sterol biosynthesis
  • a squalene epoxidase inhibitor for sterol biosynthesis [b-15.1] pyributicarb (b-15.2) naphthifine (naftifine), [b] -15.3] Terbinafine and the like can be mentioned.
  • b-16 Cell wall biosynthesis inhibitor As a cell wall biosynthesis inhibitor, [b-16.1] polyoxins (polyoxins), [b-16.2] dimethomorph, [b-16.3] flumorph ( flumorph), [b-16.4] pyrimorph, [b-16.5] bench avalicarb, [b-16.6] bench avalicarb isopropyl (b). -16.7] iprovalicarb, [b-16.8] mandipropamide, [b-17.9] valifenalate and the like can be mentioned.
  • b-17 Melanin biosynthesis inhibitor As a melanin biosynthesis inhibitor, [b-17.1] phtalide or phthalide, [b-17.2] pyroquilon, [b-17.3] tricyclazole. (Tricylazole), [b-17.4] carpropamide, [b-17.5] diclocymet, [b-17.6] phenoxanil, [b-17.7] tolprocarb. ) And the like.
  • b-18 Host plant resistance inducer [b-18.1] acibenzolar S-methyl (acibenzalar-S-methyl), [b-18.2] probenazole (b), and [b-18.2] -18.3] thiazinyl (tiadinil), [b-18.4] isotianil, [b-18.5] laminarin and the like can be mentioned.
  • b-19 Dithiocarbamate fungicide
  • a dithiocarbamate fungicide [b-19.1] mancozeb or manzeb (mancozeb or manzeb), [b-19.2] manneb, [b-19.3].
  • Phthalimide bactericide As phthalimide bactericide, [b-20.1] captan (captan), [b-20.2] captafol (captafol), [b-20.3] folpet (folpet) ), [B-20.4] fluorofolpet and the like.
  • b-21 Guanidine fungicide As a guanidine fungicide, [b-21.1] guazatin, [b-21.2] iminoctadine, [b-21.3] iminoctadine albesylate (Imnoctadine albesilate), [b-21.4] iminoctadine triacetate and the like.
  • Multi-action point contact active type bactericide [b-22.1] basic copper chloride (copper oxychloride), [b-22.2] cupric hydroxide (Copper (II) hydroxide), [b-22.3] basic copper sulfate (copper hydroxide sulfate), [b-22.4] organic copper compound (organocopper compound), [b-22.5] dodecylbenzene sulfone Acid bisethylenediamine copper complex salt [II] (Dodecylbenzene sulphonic acid bisethylenediamineamine copper [II] salt, DBEDC), [b-22.6] sulphur, [b-22.7] fluorimide (fluorim).
  • b-23 Other fungicides As other fungicides, [b-23.1] diclobentiazox, [b-23.2] fenpicoxamide, [b-23.3]. ] Dipymetitron, [b-23.4] bupyrimate, [b-23.5] dimethirimol, [b-23.6] ethirimol, [b-23.7] acetic acid Triphenyl tin (fentin acetate), [b-23.8] triphenyl tin chloride (fentin chloride), [b-23.9] triphenyl tin hydroxide (fentin hydroxide), [b-23.10] oxolinic acid (Oxo linic acid), [b-23.11] hymexazol, [b-23.12] octilinone, [b-23.13] fosetyl, [b-23.14] phosphite.
  • A3 represents a hydrogen atom, a halogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a cyano group
  • A4 represents a hydrogen atom, a C1 to C6 alkyl group, a C1 to C6 It represents a haloalkyl group or a C3-C8 cycloalkyl group.
  • m2 represents an integer of 0 to 6
  • A14 and A15 each independently represent a halogen atom, a cyano group, or a C1 to C6 alkyl group
  • A16 represents a hydrogen atom or a halogen atom.
  • A17 represents a halogen atom or a C1 to C6 alkoxy group
  • m2 is 2 or more, 2 or more A17's each independently represent a substituent, Can be different.
  • Expression (s20) [In the formula, A18 and A19 each independently represent a halogen atom, a cyano group, or a C1 to C6 alkyl group, and A20, A21, and A22 each independently represent a hydrogen atom, a halogen atom, Alternatively, it represents a C1 to C6 alkoxy group. (See WO 07/066601),
  • Expression (s24) or Expression (s25) [Wherein, m4 represents an integer of 0 to 5, A27 represents a C1 to C6 alkyl group, A28 represents a halogen atom, a cyano group, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group. And when m4 is 2 or more, two or more A28's each independently represent a substituent and may be the same or different, and A29 is a C1 to C6 alkyl group, a C2 to C6 alkenyl group, or C3. Represents a C6 alkynyl group. ] (See WO 13/037771),
  • Expression (s26) or Expression (s27) [Wherein, m5 represents an integer of 0 to 5, A30 represents a C1 to C6 alkyl group, A31 represents a halogen atom, a cyano group, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group. When m5 is 2 or more, 2 or more A31's each independently represent a substituent, and may be the same or different, and A32's are C1 to C6 alkyl groups, C2 to C6 alkenyl groups, or C3. Represents a C6 alkynyl group. ] (See WO 13/037771),
  • A41 represents a hydrogen atom, a sulfur group (-SH), a thiocyanate group (-SCN), or a C1 to C6 alkylthio group
  • A42, A43, A44 and A45 are each independently Represents a hydrogen atom or a halogen atom.
  • the compound represented by these (refer international publication 09/077443),
  • insecticide that can be used as a mixture with the compound of the present invention are exemplified in the following group c, and include salts, isomers and N-oxides thereof.
  • known insecticides are not limited to these.
  • Group c c-1: Carbamate acetylcholinesterase (AChE) inhibitor [C-1.1] phosphocarb, [c-1.2] alanycarb, [c-1.1] as a carbamate acetylcholinesterase (AChE) inhibitor -1.3] butocarboxim, [c-1.4] butoxycarboxim, [c-1.5] thiodicarb, [c-1.6] thiophanox ), [C-1.7] aldicarb, [c-1.8] bendiocarb, [c-1.9] benfuracarb, [c-1.10] carbaryl (carba).
  • AChE carbaryl
  • c-2 Organophosphorus acetylcholinesterase (AChE) inhibitor [c-2.1] acephate, [c-2.2] azamethiphos, as an organophosphorus acetylcholinesterase (AChE) inhibitor [C-2.3] Azinphos-methyl, [c-2.4] Azinphos-ethyl, [c-2.5] Ethephon, [c-2.6] ] Cadussafos, [c-2.7] chlorethoxyphos, [c-2.8] chlorfenvinphos, [c-2.9] chlormephos, [c- 2.10] Black Chlorpyrifos, [c-2.11] chlorpyrifos-methyl, [c-2.12] coumaphos, [c-2.13] cyanophos, [c-2.
  • GABAergic chloride ion blocker As GABAergic chloride ion blocker, [c-3.1] chlordane, [c-3.2] endosulfan, [c-3.3] ] Lindane, [c-3.4] dienochlor, [c-3.5] ethiprole, [c-3.6] fipronil, [c-3.7] acetate Examples include acetoprole and the like.
  • c-4 Sodium channel modulator As a sodium channel modulator, [c-4.1] acrinathrin, [c-4.2] allethrin [(1R) -isomer] (allethrin [(1R) -somer]), [C-4.3] bifenthrin, [c-4.4] bioallethrin, [c-4.5] bioallethrin S-cyclopentenyl isomer, [c- 4.6] bioresmethrin, [c-4.7] cycloprothrin, [c-4.8] cyfluthrin, [c-4.
  • c-5 Competitive modulator of nicotinic acetylcholine receptor (nAChR) As a competitive modulator of nicotinic acetylcholine receptor (nAChR), [c-5.1] acetamiprid, [c-5.2] clothianidin (clothianidin).
  • c-6 Nicotinic acetylcholine receptor (nAChR) allosteric modulator As a nicotinic acetylcholine receptor (nAChR) allosteric modulator, [c-6.1] spinosad, [c-6.2] spinetoram, etc. Is mentioned.
  • c-7 Glutamate agonist chloride ion channel (GluCl) allosteric modulator
  • glutamate agonist chloride ion channel (GluCl) allosteric modulator [c-7.1] abamectin, [c-7.2] emamectin benzoic acid Examples thereof include salt (emactin benzoate), [c-7.3] lepimectin, and [c-7.4] milbemectin.
  • c-8 Juvenile hormone analogs As juvenile hormone analogs, [c-8.1] hydroprene, [c-8.2] quinoprene, [c-8.3] methoprene (methoprene) ), [C-8.4] phenoxycarb, and [c-8.5] pyriproxyfen.
  • c-9 Non-specific (multi-site) inhibitor
  • a non-specific (multi-site) inhibitor As a non-specific (multi-site) inhibitor, [c-9.1] methyl bromide (meth-bromide), [c-9.2] chloropicrin , [C-9.3] cryolite, [c-9.4] sulfuryl fluoride, [c-9.5] borax, [c-9.6] boro Acid (boric acid), [c-9.7] octaborate disodium salt (disodium octoborate), [c-9.8] metaborate sodium salt (sodium metaborate), [c-9.9] tartar ( tartar emetic, [c-9.10] dazomet, [c-9.11] metam ( metam), [c-9.12] carbam sodium salt, and the like.
  • chordal organ TRPV channel modulator examples include [c-10.1] pymetrozine and [c-10.2] pyrifluquinazon.
  • c-11 Mite growth inhibitor As a mite growth inhibitor, [c-11.1] clofentezine, [c-11.2] diflovidazin, [c-11.3] hexithiazox (Hexythiazox), [c-11.4] ethoxazole and the like.
  • c-12 Mitochondrial ATP synthase inhibitor As a mitochondrial ATP synthase inhibitor, [c-12.1] diafenthiuron, [c-12.2] azocyclotin, [c-12. 3] Cyhexatin, [c-12.4] fenbutatin oxide, [c-12.5] propargite, [c-12.6] tetradiphone and the like. .
  • c-13 Oxidative phosphorylation uncoupling agent that perturbs proton gradient
  • oxidative phosphorylation uncoupling agent that perturbs proton gradient [c-13.1] chlorfenapyl and [c-13.2] DNOC (Dinitro-ortho-cresol), [c-13.3] vinapacryl, [c-13.4] sulfluramide and the like.
  • c-14 Nicotinic Acetylcholine Receptor (nAChR) Channel Blocker As a nicotinic acetylcholine receptor (nAChR) channel blocker, [c-14.1] bensultap, [c-14.2] cartap hydrochloride (cartap) hydrochloride), [c-14.3] thiocyclam, [c-14.4] monosultap and the like.
  • nAChR Nicotinic Acetylcholine Receptor
  • nAChR nicotinic acetylcholine receptor
  • c-15 Chitin biosynthesis inhibitor type 0
  • chitin biosynthesis inhibitor type 0 As the chitin biosynthesis inhibitor type 0, [c-15.1] bistrifluron (bistrifluron), [c-15.2] chlorfluazuron (chlorfluazuron), [c-15.3] diflubenzuron, [C-15.4] flucycloxuron, [c-15.5] fluphenoxuron, [c-15.6] hexaflumuron, [c-15.7] Lufenuron, [c-15.8] novaluron, [c-15.9] noviflumuron, [c-15.10] teflubenzuron, [c-15.11]. Rifurumuron (triflumuron), and the like.
  • c-16 chitin biosynthesis inhibitor type 1
  • Examples of the chitin biosynthesis inhibitor type 1 include [c-16.1] buprofezin and the like.
  • c-17 Insect molting inhibitor for fly flies
  • An insect molting inhibitor for fly flies includes [c-17.1] cyromazine and the like.
  • c-18 Molting hormone (ecdysone) receptor agonist
  • a molting hormone (ecdysone) receptor agonist [c-18.1] chromafenozide, [c-18.2] halofenozide, [c-18] .3] methoxyphenozide, [c-18.4] tebufenozide and the like.
  • Octopamine receptor agonist examples include [c-19.1] amitraz.
  • c-20 Mitochondrial electron transfer complex III inhibitor As a mitochondrial electron transfer complex III inhibitor, [c-20.1] hydramethylnon, [c-20.2] acequinocyl, Examples include [c-20.3] fluacrypyrim and [c-20.4] bifenazate.
  • c-21 Mitochondrial electron transport complex I inhibitor (METI) As a mitochondrial electron transport complex I inhibitor (METI), [c-21.1] fenazaquin, [c-21.2] fenpyroximate, [c-21.3] pyridaben, [C-21.4] pyrimidifen, [c-21.5] tebufenpyrad, [c-21.6] tolfenpyrad, [c-21.7] rotenone and the like.
  • METI Mitochondrial electron transport complex I inhibitor
  • c-22 Voltage-gated sodium channel blocker
  • Examples of the voltage-gated sodium channel blocker include [c-22.1] indoxacarb and [c-22.2] metaflumizone.
  • c-23 Acetyl CoA carboxylase inhibitor As an acetyl CoA carboxylase inhibitor, [c-23.1] spirodiclofen, [c-23.2] spiromesifen, [c-23.3]. ] Spirotetramat etc. are mentioned.
  • c-24 Mitochondrial electron transport complex IV inhibitor As a mitochondrial electron transport complex IV inhibitor, [c-24.1] aluminum phosphide, [c-24.2] calcium phosphide ( calcium phosphide, [c-24.3] phosphine, [c-24.4] zinc phosphide, [c-24.5] calcium cyanide, [c Examples include ⁇ 24.6] sodium cyanide and [c-24.7] potassium cyanide.
  • c-25 Mitochondrial electron transport complex II inhibitor [c-25.1] cyenopyrafen, [c-25.2] cyflumethofen, [c-25.1] as mitochondrial electron transport complex II inhibitor -25.3] Pyflubumide and the like.
  • ryanodine receptor modulator As a ryanodine receptor modulator, [c-26.1] chlorantraniliprole (chlanantraniprole), [c-26.2] cyantraniliprole, [c-26. 3] Flubendiamide and the like can be mentioned.
  • c-28 Other insecticides [c-28.1] azadirachtin, [c-28.2] benzoximate, [c-28.3] phenisobromo as other insecticides. Phenisobromolate, [c-28.4] quinomethionate, [c-28.5] dicofol, [c-28.6] pyridalyl, [c-28.7] bromopropyiate.
  • Fatty acid glyceride decanoyloctanoylglycerol
  • [c-28.94] propylene glycol monofatty acid ester propyrene glycol fatty acid ester
  • V3 represents a nitrogen atom, a carbon atom, or CF
  • V4 and V5 each independently represent a nitrogen atom or a carbon atom.
  • m10 represents an integer of 0 to 2
  • A61 represents a trifluoromethyl group, a trifluoromethylthio group, a trifluoromethylsulfinyl group, or a trifluoromethylsulfonyl group
  • A62 represents a hydrogen atom, or It represents a trifluoromethyl group
  • V6 represents a nitrogen atom or a carbon atom
  • V7 represents an oxygen atom or an N-methyl group.
  • A65 represents a hydrogen atom, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group
  • A66 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group
  • A67 and A68 represent A hydrogen atom, a C1 to C6 alkyl group optionally substituted with a cyano group, an alkyl group optionally substituted with a methoxy group, an alkyl group optionally substituted with an ethoxy group, Or represents a C3 to C8 cycloalkyl group
  • A69 represents a hydrogen atom, a cyano group, a C1-C6 haloalkyl group optionally substituted with a cyano group, a C1-C6 alkyl group, or a C3-C8 cycloalkyl group.
  • A70 represents a methyl group, an ethyl group, an isopropyl group, a 2,2,2-trifluoroethyl group, or a phenyl group
  • A71 represents A72 represents a partial structure selected from the group consisting of: V8 represents an oxygen atom, a sulfur atom, —CH 2 —, or —CH 2 CH 2 —. (See WO 14/167084, WO 16/055431),
  • m11 represents an integer of 0 to 1
  • A73 represents a chlorine atom, a bromine atom, a methyl group, or a trifluoromethyl group
  • A74 represents a hydrogen atom, a chlorine atom, a bromine atom, a cyano group, Or a trifluoromethyl group
  • A75 represents a hydrogen atom, a chlorine atom or a bromine atom
  • A76 and A77 each independently represent a C1 to C6 alkyl group, or a C3 to C8 cycloalkyl group
  • A78 represents a chlorine atom, a bromine atom, a cyano group, a nitro group, a difluoromethyl group, or a trifluoromethyl group.
  • a compound represented by the formula see International Patent Publication No.
  • the mixing ratio of the compound of the present invention and the pest controlling agent is not particularly limited as long as the effect is exerted, but the pest controlling agent is usually 0.001 to 0.001 by weight based on the compound of the present invention.
  • the ratio is 1000, preferably 0.01 to 100.
  • Step 2 Synthesis of 5- (2-amino-5-methylthiazol-4-yl) -3-bromo-6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound Number: 4)
  • Step 2 Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (4-methylthiazol-5-yl) pyridin-2 (1H) -one (Compound No. 6)
  • Step 1 Synthesis of 1- (2,6-difluorophenyl) -N-phenylpropane-1-imine Chloride containing 23.91 g of titanium tetrachloride in 100 ml of methylene chloride solution containing 11.74 g of aniline and 17.01 g of triethylamine 50 ml of methylene solution was added dropwise under ice cooling. After 30 ml of a methylene chloride solution containing 14.30 g of 1- (2,6-difluorophenyl) propan-1-one was added dropwise to the reaction solution, the temperature was raised from ice cooling to room temperature and the mixture was stirred overnight.
  • Step 2 Synthesis of 6- (2,6-difluorophenyl) -5-methyl-3,4-dihydropyridin-2 (1H) -one 1- (2,6-difluorophenyl) -N obtained in Step 1
  • 6.57 g of acrylamide monomer was added to 200 ml of a dioxane solution containing 21.10 g of -phenylpropane-1-imine and 12.33 g of aluminum chloride, and the mixture was stirred at 90 ° C for 3 hours. After distilling off the solvent of the reaction mixture under reduced pressure to about half the volume, 1N hydrochloric acid and ethyl acetate were added to carry out liquid separation.
  • the obtained organic layer was washed with a saturated saline solution and dried with sodium sulfate. After evaporating the solvent under reduced pressure, the obtained residue was purified by silica gel column chromatography. The obtained solid was washed with isopropyl ether to give the title compound as a white solid (11.65 g).
  • THF containing 1.00 g of 5-bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridine-3-carbaldehyde synthesized with reference to Reference Examples 1 to 6 1.73 ml of a 2 mol / l solution of ethylmagnesium chloride in THF was added dropwise to 10 ml of the solution at 0 ° C., and the mixture was stirred for 30 minutes. The reaction solution was heated to room temperature and stirred for 2 hours. A saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture to separate it.
  • the obtained organic layer was washed successively with a 1% aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate.
  • the solvent was distilled off from the organic layer under reduced pressure, and the obtained residue was purified by silica gel column chromatography.
  • the title compound was obtained as 118 mg of a clear oil.
  • Table 4 shows compounds synthesized according to the above-mentioned examples, but the present invention is not limited thereto.

Abstract

Provided is a novel compound that controls plant diseases. A pyridone compound according to the present invention is a novel compound and can control plant diseases.

Description

ピリドン化合物およびそれを有効成分とする農園芸用殺菌剤Pyridone compounds and agricultural and horticultural fungicides containing them as active ingredients
 本発明は、ピリドン化合物および該化合物を有効成分とする農薬に関するものである。 The present invention relates to a pyridone compound and an agrochemical containing the compound as an active ingredient.
 安定的な農業生産を確保する上で、農園芸作物の病害を防除することは重要な役割を果たす。そのため、様々な殺菌剤が使用されているが、長年にわたる殺菌剤の使用は薬剤耐性菌の出現を招くために、薬剤感受性菌のみならず薬剤耐性菌に対しても有効な新規殺菌剤が切望されている。 Controlling diseases of agricultural and horticultural crops plays an important role in ensuring stable agricultural production. For this reason, various fungicides are used, but the use of fungicides over the years has led to the emergence of drug-resistant bacteria. Have been.
 ところで、1,3,5,6-置換-2-ピリドン化合物に関して、例えば、GABAアルファー2/3リガンドとして、3位にアリール基またはヘテロアリール基を有する1,3,5,6-置換-2-ピリドン化合物が開示されている(例えば、国際公開第98/55480号参照)。また、細菌性感染症の治療薬として、3位にカルボキシル基を有する1,3,5,6-置換-2-ピリドン化合物が開示されている(例えば、欧州特許第0308020明細書参照)。 By the way, regarding 1,3,5,6-substituted-2-pyridone compounds, for example, 1,3,5,6-substituted-2 having an aryl group or a heteroaryl group at the 3-position as a GABA alpha-2 / 3 ligand -Pyridone compounds have been disclosed (see, for example, WO 98/55480). In addition, 1,3,5,6-substituted-2-pyridone compounds having a carboxyl group at the 3-position have been disclosed as therapeutic agents for bacterial infections (for example, see European Patent No. 0308020).
国際公開第98/55480号International Publication No. 98/55480 欧州特許第0308020明細書European Patent No. 0308020
 しかしながら、国際公開第98/55480号および欧州特許第0308020明細書に記載されている化合物の用途は、いずれも医薬に関するものであり、本発明に係る農園芸用殺菌剤が属する技術分野とは相違する。 However, the uses of the compounds described in WO 98/55480 and EP 0308020 are all related to pharmaceuticals, which is different from the technical field to which the agricultural and horticultural fungicide according to the present invention belongs. To do.
 本発明の課題は、農園芸用殺菌剤として有効である新規な化合物を提供することである。 An object of the present invention is to provide a novel compound which is effective as a fungicide for agricultural and horticultural use.
 本発明者らは、前記課題を解決すべく、1,3,5,6-置換-2-ピリドン化合物群について鋭意検討を行った結果、当該2-ピリドン骨格中の5位に関して、チアゾールやチアジアゾールのような硫黄原子および窒素原子を有する5員の複素環基を有し、かつ当該2-ピリドン骨格中の6位に関して、オルト位に置換基を有するアリール基を導入した新規な化合物群が、植物病害に対して優れた防除活性を発揮することを見出し、本発明を完成するに至った。 In order to solve the above-mentioned problems, the inventors of the present invention have conducted diligent studies on a group of 1,3,5,6-substituted-2-pyridone compounds, and as a result, have found that thiazole and thiadiazole are associated with the 5-position in the 2-pyridone skeleton. A novel compound group having a 5-membered heterocyclic group having a sulfur atom and a nitrogen atom, and introducing an aryl group having a substituent at the ortho position with respect to the 6-position in the 2-pyridone skeleton, They have found that they exert an excellent controlling activity against plant diseases and have completed the present invention.
 すなわち、本発明は、以下の通りである。 That is, the present invention is as follows.
[1] 式(1)
Figure JPOXMLDOC01-appb-C000002

 [式中、R1は、
  水酸基、
  シアノ基、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表し; R2は、
  水素原子、
  ニトロ基、
  ハロゲン原子、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6のハロアルケニル基、
  置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  Rc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSOを表す。)、
  またはRx1C(=O)-(ここで、Rx1は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)を表す。)を表し;
 Hetは、
  硫黄原子および窒素原子を含む5員の複素環基を表し、
  該硫黄原子および窒素原子を含む5員の複素環基は、R3が適宜0~2置換し(ただし、2置換のR3がある場合、R3はそれぞれ独立した置換基を表す。)、
 R3は、
  水酸基、
  シアノ基、
  ニトロ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6ハロアルケニル基、
  置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  RaRbN-(ここで、RaおよびRbは、前記と同義である。)、
  Rc-L-(ここで、RcおよびLは、前記と同義である。)、
  Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、
  Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、
  またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
 R4は、
  水酸基、
  シアノ基、
  ニトロ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
  C2~C6ハロアルケニル基、
  置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
  C2~C6のハロアルキニル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
  C2~C6のハロアルケニルオキシ基、
  置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
  C3~C6のハロアルキニルオキシ基、
  RaRbN-(ここで、RaおよびRbは、前記と同義である。)、
  Rc-L-(ここで、RcおよびLは、前記と同義である。)、
  Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、
  Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、
  またはRx2C(=O)N(Rx3)-(ここで、Rx2およびRx3は、前記と同義である。)を表し;
 R5は、前記に記載のR4と同義であり;
 nは、0~4の整数を表し;
 Xは、酸素原子、または硫黄原子を表し;
 破線部を含む結合は、二重結合、または単結合を表し;
 そして、置換基Aは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、およびRc-L-(ここで、RcおよびLは、前記と同義である。)からなる群から選択される少なくとも1種であり;
 置換基Bは、シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種であり;
 置換基Cは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種である。]で表される化合物またはその塩。
[2]
 Hetは、
   チアゾリル基、イソチアゾリル基、チアジアゾリル基、またはチアトリアゾリル基を表し、
  該チアゾリル基、該イソチアゾリル基、該チアジアゾリル基、または該チアトリアゾリル基は、R3が適宜0~2置換する(ただし、2置換のR3がある場合、R3はそれぞれ独立した置換基を表す。)、
[1]に記載の化合物またはその塩。
[3]
 R1は、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  またはC1~C6のハロアルキル基を表し;
 R2は、
  水素原子、
  ハロゲン原子、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
  または置換基Aで適宜置換されてもよいC1~C6のアルコキシ基を表し;
 Hetは、
  チアゾリル基、またはチアジアゾリル基を表し、
  該チアゾリル基、または該チアジアゾリル基は、R3が適宜0~2置換し(ただし、2置換のR3がある場合、R3はそれぞれ独立した置換基を表す。)、
 R3は、
  シアノ基、
  ニトロ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
  置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  RaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)、
  またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
 R4は、
  シアノ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  またはC1~C6のハロアルコキシ基を表し;
 R5は、
  水酸基、
  シアノ基、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
  置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
  置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
  C1~C6のハロアルコキシ基、
  またはRc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSOを表す。)を表す、
[2]に記載の化合物またはその塩。
 [4]
 R1は、
  置換基Aで適宜置換されてもよいC1~C6のアルキル基を表し;
 R2は、
  水素原子、
  ハロゲン原子、
  または置換基Aで適宜置換されてもよいC1~C6のアルキル基を表し;
 R3は、
  ハロゲン原子、
  置換基Cで適宜置換されてもよいC1~C6のアルキル基、
  C1~C6のハロアルキル基、
  またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表し;
 R4は、
  ハロゲン原子、
  または置換基Cで適宜置換されてもよいC1~C6のアルキル基を表し;
 R5は、
  シアノ基、
  ハロゲン原子、
  または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基を表す、
[3]に記載の化合物またはその塩。
 [5]
 R1は、
  C1~C6のアルキル基を表し;
 R2は、
  ハロゲン原子を表し;
 Hetは、
  チアゾリル基、またはチアジアゾリル基を表し、
  該チアゾリル基、または該チアジアゾリル基は、R3が適宜置換し、
 R3は、
  ハロゲン原子、
  C1~C6のアルキル基、
  C1~C6のハロアルキル基、
  またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表し;
 R4は、
  ハロゲン原子を表し;
 R5は、
  ハロゲン原子を表し;
 nは、0~2の整数を表し;
 Xは、酸素原子を表し;
 破線部を含む結合は、二重結合を表す、
[4]に記載の化合物またはその塩。
[6] [1]に記載の化合物またはその塩を有効成分として含有する農園芸用有害生物防除剤。
[7] [1]に記載の化合物またはその塩を有効成分として含有する農園芸用殺菌剤。
[8] [6]に記載の農園芸用有害生物防除剤を、植物、植物の種子、または植物を栽培する土壌に施用することを含む、植物病害を防除する方法。
[9] [7]に記載の農園芸用殺菌剤を、植物、植物の種子、または植物を栽培する土壌に施用することを含む、植物病害を防除する方法。
[1] Formula (1)
Figure JPOXMLDOC01-appb-C000002

[In the formula, R1 is
Hydroxyl group,
Cyano group,
A C1 to C6 alkyl group optionally substituted with a substituent A,
A C1 to C6 haloalkyl group,
A C3 to C8 cycloalkyl group which may be optionally substituted with a substituent A,
A C2-C6 alkenyl group optionally substituted with a substituent A,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with a substituent A,
A C2-C6 haloalkynyl group,
A C1 to C6 alkoxy group optionally substituted with a substituent A,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group optionally substituted with a substituent A,
A C2-C6 alkenyloxy group which may be optionally substituted with a substituent A,
A C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted with a substituent A,
A C3 to C6 haloalkynyloxy group,
Or RaRbN— (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 Or a Ra and Rb together with the nitrogen atom to which they are attached form an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Representation; R2 is
Hydrogen atom,
Nitro group,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent A,
A C1 to C6 haloalkyl group,
A C3 to C8 cycloalkyl group which may be optionally substituted with a substituent A,
A C2-C6 alkenyl group optionally substituted with a substituent A,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with a substituent A,
A C2-C6 haloalkynyl group,
A C1 to C6 alkoxy group optionally substituted with a substituent A,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group optionally substituted with a substituent A,
A C2-C6 alkenyloxy group which may be optionally substituted with a substituent A,
A C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group which may be optionally substituted with a substituent A,
A C3 to C6 haloalkynyloxy group,
Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2 ),
Or Rx1C (═O) — (wherein Rx1 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, C1 To C6 alkoxy group, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group, or RaRbN— (wherein Ra and Rb have the same meanings as described above);
Het,
Represents a 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom,
In the 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom, R3 is appropriately substituted with 0 to 2 (provided that when there is disubstituted R3, R3 represents an independent substituent).
R3 is
Hydroxyl group,
Cyano group,
Nitro group,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent C,
A C1 to C6 haloalkyl group,
A C3 to C8 cycloalkyl group optionally substituted with a substituent C,
A C2-C6 alkenyl group optionally substituted with a substituent C,
C2-C6 haloalkenyl group,
A C2 to C6 alkynyl group optionally substituted with a substituent C,
A C2-C6 haloalkynyl group,
A C1 to C6 alkoxy group optionally substituted with a substituent C,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group optionally substituted with a substituent C,
A C2-C6 alkenyloxy group which may be optionally substituted with a substituent C,
A C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group optionally substituted with a substituent C,
A C3 to C6 haloalkynyloxy group,
RaRbN- (wherein Ra and Rb are as defined above),
Rc-L- (wherein Rc and L are as defined above),
Rx1C (= O)-(where Rx1 is as defined above),
Rx1C (= O) O- (where Rx1 is as defined above),
Or Rx2C (═O) N (Rx3)-(wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group). An alkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as described above), and Rx3 is , A hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group).
R4 is
Hydroxyl group,
Cyano group,
Nitro group,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent C,
A C1 to C6 haloalkyl group,
A C3 to C8 cycloalkyl group optionally substituted with a substituent C,
A C2-C6 alkenyl group optionally substituted with a substituent C,
C2-C6 haloalkenyl group,
A C2 to C6 alkynyl group optionally substituted with a substituent C,
A C2-C6 haloalkynyl group,
A C1 to C6 alkoxy group optionally substituted with a substituent C,
A C1 to C6 haloalkoxy group,
A C3 to C8 cycloalkoxy group optionally substituted with a substituent C,
A C2-C6 alkenyloxy group which may be optionally substituted with a substituent C,
A C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group optionally substituted with a substituent C,
A C3 to C6 haloalkynyloxy group,
RaRbN- (wherein Ra and Rb are as defined above),
Rc-L- (wherein Rc and L are as defined above),
Rx1C (= O)-(where Rx1 is as defined above),
Rx1C (= O) O- (where Rx1 is as defined above),
Or Rx2C (= O) N (Rx3)-(wherein Rx2 and Rx3 have the same meanings as defined above);
R5 has the same meaning as R4 described above;
n represents an integer of 0 to 4;
X represents an oxygen atom or a sulfur atom;
A bond containing a broken line represents a double bond or a single bond;
The substituent A is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or a RaRbN- (here, Ra And Rb are as defined above.), And Rc-L- (wherein Rc and L are as defined above), and at least one selected from the group consisting of:
Substituent B is at least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group;
Substituent C is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2-C6 alkoxyalkoxy group, RaRbN -(Wherein Ra and Rb are as defined above), Rc-L- (wherein Rc and L are as defined above), Rx1C (= O)-(wherein Rx1) Is the same as defined above.) And 3 to 6 membered ring group containing 1 to 2 oxygen atoms. Or a salt thereof.
[2]
Het,
Represents a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, or a thiatriazolyl group,
In the thiazolyl group, the isothiazolyl group, the thiadiazolyl group, or the thiatriazolyl group, R3 is appropriately substituted by 0 to 2 (provided that when there is disubstituted R3, R3 represents each independent substituent).
The compound according to [1] or a salt thereof.
[3]
R1 is
A C1 to C6 alkyl group optionally substituted with a substituent A,
Or represents a C1-C6 haloalkyl group;
R2 is
Hydrogen atom,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent A,
A C1 to C6 haloalkyl group,
A C2-C6 alkynyl group optionally substituted with a substituent A,
Or represents a C1-C6 alkoxy group which may be optionally substituted with a substituent A;
Het,
Represents a thiazolyl group or a thiadiazolyl group,
In the thiazolyl group or the thiadiazolyl group, R3 is appropriately substituted by 0 to 2 (provided that when there is disubstituted R3, R3 represents each independent substituent).
R3 is
Cyano group,
Nitro group,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent C,
A C1 to C6 haloalkyl group,
A C3 to C8 cycloalkyl group optionally substituted with a substituent C,
A C2-C6 alkenyl group optionally substituted with a substituent C,
A C2 to C6 alkynyl group optionally substituted with a substituent C,
A C1 to C6 alkoxy group optionally substituted with a substituent C,
RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group). Or an alkyl group, or Ra and Rb represent an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group together with the nitrogen atom to which they are attached.
Or Rx2C (═O) N (Rx3)-(wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group). An alkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as described above), and Rx3 is , A hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group).
R4 is
Cyano group,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent C,
A C1 to C6 haloalkyl group,
A C1 to C6 alkoxy group optionally substituted with a substituent C,
Or represents a C1-C6 haloalkoxy group;
R5 is
Hydroxyl group,
Cyano group,
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent C,
A C1 to C6 haloalkyl group,
A C2-C6 alkenyl group optionally substituted with a substituent C,
A C2 to C6 alkynyl group optionally substituted with a substituent C,
A C1 to C6 alkoxy group optionally substituted with a substituent C,
A C1 to C6 haloalkoxy group,
Or Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2 ).
The compound or salt thereof according to [2].
[4]
R1 is
Represents a C1-C6 alkyl group which may be optionally substituted with a substituent A;
R2 is
Hydrogen atom,
Halogen atom,
Or represents a C1 to C6 alkyl group which may be optionally substituted with a substituent A;
R3 is
Halogen atom,
A C1 to C6 alkyl group optionally substituted with a substituent C,
A C1 to C6 haloalkyl group,
Or RaRbN— (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 Or a Ra and Rb together with the nitrogen atom to which they are attached form an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Representation;
R4 is
Halogen atom,
Or represents a C1 to C6 alkyl group which may be optionally substituted with a substituent C;
R5 is
Cyano group,
Halogen atom,
Or represents a C1 to C6 alkoxy group which may be optionally substituted with a substituent C,
The compound or salt thereof according to [3].
[5]
R1 is
Represents a C1 to C6 alkyl group;
R2 is
Represents a halogen atom;
Het,
Represents a thiazolyl group or a thiadiazolyl group,
R3 of the thiazolyl group or the thiadiazolyl group is appropriately substituted,
R3 is
Halogen atom,
C1 to C6 alkyl group,
A C1 to C6 haloalkyl group,
Or RaRbN— (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 Or a Ra and Rb together with the nitrogen atom to which they are attached form an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Representation;
R4 is
Represents a halogen atom;
R5 is
Represents a halogen atom;
n represents an integer of 0 to 2;
X represents an oxygen atom;
A bond including a broken line portion represents a double bond,
The compound or salt thereof according to [4].
[6] An agricultural and horticultural pest control agent containing the compound or salt thereof according to [1] as an active ingredient.
[7] An agricultural and horticultural fungicide containing the compound according to [1] or a salt thereof as an active ingredient.
[8] A method for controlling plant diseases, which comprises applying the agricultural and horticultural pest control agent according to [6] to plants, plant seeds, or soil for cultivating plants.
[9] A method for controlling plant diseases, which comprises applying the agricultural / horticultural fungicide according to [7] to plants, plant seeds, or soil in which plants are cultivated.
 本発明によれば、農園芸用殺菌剤として有効である新規な化合物を提供することができる。 According to the present invention, it is possible to provide a novel compound which is effective as an agricultural / horticultural germicide.
 以下、本発明を実施するための形態について詳細に説明する。 Hereinafter, embodiments for carrying out the present invention will be described in detail.
 なお、特許請求の範囲および明細書中において用いられる各用語は、特に断らない限り、当該技術分野において一般的に用いられる定義によるものとする。 Unless otherwise specified, each term used in the claims and the specification is based on the definition generally used in the technical field.
 本明細書において、使用する略号を以下に説明する。 The abbreviations used in this specification are explained below.
 DMF:N,N-ジメチルホルムアミド、THF:テトラヒドロフラン、Me:メチル基、Et:エチル基、Pr:プロピル基、Bu:ブチル基、Ac:アセチル基、Ph:フェニル基、i:イソ、sec:セカンダリ、t:ターシャリ、=:二重結合、≡:三重結合を表す。表のカラム中、Pr、Buに関しては、接頭辞がない場合は、ノルマルを意味する。 DMF: N, N-dimethylformamide, THF: tetrahydrofuran, Me: methyl group, Et: ethyl group, Pr: propyl group, Bu: butyl group, Ac: acetyl group, Ph: phenyl group, i: iso, sec: secondary. , T: tertiary, =: double bond, ≡: triple bond. Regarding Pr and Bu in the columns of the table, when there is no prefix, it means normal.
 以下に、本明細書中に使用される用語の定義を説明する。 The definitions of terms used in this specification are explained below.
 Cx~Cyとの記載は、x個からy個の炭素原子を有することを表す。ここで、x及びyは整数を表し、また、xとyとの間に存在する全ての整数も個別に開示されているものと理解される。例えば、C1~C6は、1、2、3、4、5、または6個の炭素原子を、C2~C6は、2、3、4、5、または6個の炭素原子を、C3~C8は、3、4、5、6、7、または8個の炭素原子を、C3~C6は、3、4、5、または6個の炭素原子を、C1~C3は、1、2、または3個の炭素原子をそれぞれ有することを意味する。 The description of Cx to Cy means that it has x to y carbon atoms. Here, x and y represent integers, and it is understood that all integers present between x and y are also individually disclosed. For example, C1-C6 is 1, 2, 3, 4, 5, or 6 carbon atoms, C2-C6 is 2, 3, 4, 5, or 6 carbon atoms, and C3-C8 is 3, 4, 5, 6, 7, or 8 carbon atoms, C3-C6 is 3, 4, 5, or 6 carbon atoms, C1-C3 is 1, 2, or 3 It means having each carbon atom of.
 用語「適宜置換されてもよい」とは、置換または無置換であることを意味する。この用語を用いる際、置換基の数が明示されていないときは、置換基の数は1であることを表す。一方で、例えば、「適宜0~3置換されてもよい」と置換基の数が指定されている場合、0と3との間に存在する全ての整数も個別に開示されているものと理解される。即ち、置換基が、なし、1、2、または3個の置換基数であることを意味する。同様に、「適宜0~2置換されてもよい」では、なし、1、または2個の置換基数を、それぞれ有することを意味する。 The term “may be appropriately substituted” means substituted or unsubstituted. In using this term, when the number of substituents is not specified, it indicates that the number of substituents is 1. On the other hand, for example, when the number of substituents is designated as “optionally substituted by 0 to 3”, it is understood that all integers existing between 0 and 3 are also individually disclosed. To be done. That is, it means that the number of substituents is none, 1, 2, or 3 substituents. Similarly, “optionally substituted by 0 to 2” means having none, one, or two substituents, respectively.
 C1~C6のアルキル基とは、直鎖状または分岐状でよく、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、t-ブチル基、ペンチル基、イソペンチル基、2-メチルブチル基、ネオペンチル基、1-エチルプロピル基、ヘキシル基、4-メチルペンチル基、3-メチルペンチル基、2-メチルペンチル基、1-メチルペンチル基、3,3-ジメチルブチル基、2,2-ジメチルブチル基、1,1-ジメチルブチル基、1,2-ジメチルブチル基、1,3-ジメチルブチル基、2,3-ジメチルブチル基、2-エチルブチル基、1-イソプロピルプロピル基、1,1,2-トリメチルプロピル基、1,2,2-トリメチルプロピル基等が挙げられる。 The C1-C6 alkyl group may be linear or branched, and is methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl. Group, 2-methylbutyl group, neopentyl group, 1-ethylpropyl group, hexyl group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group, 1-methylpentyl group, 3,3-dimethylbutyl group , 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3-dimethylbutyl group, 2-ethylbutyl group, 1-isopropylpropyl group Group, 1,1,2-trimethylpropyl group, 1,2,2-trimethylpropyl group and the like.
 ハロゲン原子とは、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
 C1~C6のハロアルキル基とは、前記のC1~C6のアルキル基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C1~C6のハロアルキル基の具体例として、モノフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、モノクロロメチル基、モノブロモメチル基、モノヨードメチル基、クロロジフルオロメチル基、ブロモジフルオロメチル基、1-フルオロエチル基、2-フルオロエチル基、1,1-ジフルオロエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、1,1,2,2-テトラフルオロエチル基、ペンタフルオロエチル基、2,2,2-トリクロロエチル基、3,3-ジフルオロプロピル基、3,3,3-トリフルオロプロピル基、ヘプタフルオロプロピル基、ヘプタフルオロイソプロピル基、2,2,2-トリフルオロ-1-(トリフルオロメチル)エチル基、ノナフルオロブチル基、ノナフルオロ-sec-ブチル基、3,3,4,4,5,5,5-ヘプタフルオロペンチル基、ウンデカフルオロペンチル基、トリデカフルオロヘキシル基等が挙げられる。 The term “C1 to C6 haloalkyl group” refers to the above C1 to C6 alkyl group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent. Specific examples of the C1 to C6 haloalkyl group include a monofluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a monochloromethyl group, a monobromomethyl group, a monoiodomethyl group, a chlorodifluoromethyl group, a bromodifluoromethyl group, 1 -Fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group , Pentafluoroethyl group, 2,2,2-trichloroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2 -Trifluoro-1- (trifluoromethyl) ethyl group, nonafluorobutyl group, nonafluoro sec- butyl group, 3,3,4,4,5,5,5-heptafluoro-pentyl group, undecyl decafluoropentyl, tridecafluorohexyl group, and the like.
 C3~C8のシクロアルキル基とは、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基等が挙げられる。 Examples of the C3-C8 cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group and the like.
 C2~C6のアルケニル基とは、1個または2個以上の二重結合を有し、直鎖状または分岐状である不飽和炭化水素基のものを表す。また、幾何異性体がある場合、E体またはZ体のどちらか一方のみ、あるいはE体とZ体との任意の割合の混合物であり、指定される炭素数の範囲であれば、特に限定されることはない。C2~C6のアルケニル基の具体例として、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、3-ブテニル基、1-ペンテニル基、2-ペンテニル基、3-ペンテニル基、4-ペンテニル基、3-メチル-2-ブテニル基、1-ヘキセニル基、2-ヘキセニル基、3-ヘキセニル基、4-ヘキセニル基、5-ヘキセニル基、4-メチル-3-ペンテニル基、3-メチル-2-ペンテニル基等が挙げられる。 The C2-C6 alkenyl group represents a linear or branched unsaturated hydrocarbon group having one or more double bonds. In addition, when there is a geometric isomer, only one of the E-form or the Z-form, or a mixture of the E-form and the Z-form at an arbitrary ratio is used. Never. Specific examples of the C2 to C6 alkenyl group include vinyl group, 1-propenyl group, allyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 1-pentenyl group, 2-pentenyl group, 3-pentenyl group. Group, 4-pentenyl group, 3-methyl-2-butenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group, 4-methyl-3-pentenyl group, Examples thereof include 3-methyl-2-pentenyl group.
 C2~C6のハロアルケニル基とは、前記のC2~C6のアルケニル基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルケニル基の具体例として、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、3,3-ジクロロアリル基、4,4-ジフルオロ-3-ブテニル基、5,5-ジフルオロ-4-ペンテニル基、6,6-ジフルオロ-5-ヘキセニル基等が挙げられる。 The term “C2-C6 haloalkenyl group” refers to the above-mentioned C2-C6 alkenyl group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkenyl group include 2-fluorovinyl group, 2,2-difluorovinyl group, 2,2-dichlorovinyl group, 3-fluoroallyl group, 3,3-difluoroallyl group, 3, Examples thereof include a 3-dichloroallyl group, a 4,4-difluoro-3-butenyl group, a 5,5-difluoro-4-pentenyl group, and a 6,6-difluoro-5-hexenyl group.
 C2~C6のアルキニル基とは、1個または2個以上の三重結合を有し、直鎖状または分岐状である不飽和炭化水素基のものを表す。C2~C6のアルキニル基の具体例として、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、3-ブチニル基、1-ペンチニル基、2-ペンチニル基、3-ペンチニル基、4-ペンチニル基、1,1-ジメチル-2-プロピニル基、1-ヘキシニル基、2-ヘキシニル基、3-ヘキシニル基、4-ヘキシニル基、5-ヘキシニル基等が挙げられる。 The C2-C6 alkynyl group represents a linear or branched unsaturated hydrocarbon group having one or two or more triple bonds. Specific examples of the C2-C6 alkynyl group include ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, 3-pentynyl group. Group, 4-pentynyl group, 1,1-dimethyl-2-propynyl group, 1-hexynyl group, 2-hexynyl group, 3-hexynyl group, 4-hexynyl group, 5-hexynyl group and the like.
 C2~C6のハロアルキニル基とは、前記のC2~C6のアルキニル基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルキニル基の具体例として、2-フルオロエチニル基、2-クロロエチニル基、2-ブロモエチニル基、2-ヨードエチニル基、3,3-ジフルオロ-1-プロピニル基、3-クロロ-3,3-ジフルオロ-1-プロピニル基、3-ブロモ-3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4-クロロ-4,4-ジフルオロ-1-ブチニル基、4-クロロ-4,4-ジフルオロ-2-ブチニル基、4-ブロモ-4,4-ジフルオロ-1-ブチニル基、4-ブロモ-4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、4,4,4-トリフルオロ-2-ブチニル基、5,5-ジフルオロ-3-ペンチニル基、5-クロロ-5,5-ジフルオロ-3-ペンチニル基、5-ブロモ-5,5-ジフルオロ-3-ペンチニル基、5,5,5-トリフルオロ-3-ペンチニル基、6,6-ジフルオロ-4-ヘキシニル基、6-クロロ-6,6-ジフルオロ-4-ヘキシニル基、6-ブロモ-6,6-ジフルオロ-4-ヘキシニル基、6,6,6-トリフルオロ-4-ヘキシニル基等が挙げられる。 The term “C2-C6 haloalkynyl group” refers to the above-mentioned C2-C6 alkynyl group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkynyl group include 2-fluoroethynyl group, 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3,3-difluoro-1-propynyl group, 3-chloro. -3,3-difluoro-1-propynyl group, 3-bromo-3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1-propynyl group, 4,4-difluoro-1-butynyl Group, 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro-1-butynyl group, 4-chloro-4,4-difluoro-2-butynyl group, 4-bromo-4,4 -Difluoro-1-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, 4,4,4-trifluoro-2-butynyl group 5, 5-difluoro-3-pentynyl group, 5-chloro-5,5-difluoro-3-pentynyl group, 5-bromo-5,5-difluoro-3-pentynyl group, 5,5,5-trifluoro-3- Pentynyl group, 6,6-difluoro-4-hexynyl group, 6-chloro-6,6-difluoro-4-hexynyl group, 6-bromo-6,6-difluoro-4-hexynyl group, 6,6,6- Examples thereof include a trifluoro-4-hexynyl group.
 C1~C6のアルコキシ基とは、前記のC1~C6のアルキル基が酸素原子を介して結合したものを表す。C1~C6のアルコキシ基として、具体的には、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、sec-ブトキシ基、t-ブトキシ基、ペンチルオキシ基、イソペンチルオキシ基、1-メチルブトキシ基、2-メチルブトキシ基、ネオペンチルオキシ基、1-エチルプロピルオキシ基、1,2-ジメチルプロピルオキシ基、ヘキシルオキシ基、1-メチルペンチルオキシ基、2-メチルペンチルオキシ基、3-メチルペンチルオキシ基、4-メチルペンチルオキシ基、1,1-ジメチルブトキシ基、2,2-ジメチルブトキシ基、3,3-ジメチルブトキシ基、1,2-ジメチルブトキシ基、1,3-ジメチルブトキシ基、2,3-ジメチルブトキシ基、2-エチルブトキシ基、1-イソプロピルプロピルオキシ基、1,1,2-トリメチルプロピルオキシ基、1,2,2-トリメチルプロピルオキシ基等が挙げられる。 The term “C1 to C6 alkoxy group” refers to the above C1 to C6 alkyl group bonded via an oxygen atom. Specific examples of the C1 to C6 alkoxy group include methoxy group, ethoxy group, propyloxy group, isopropyloxy group, butoxy group, isobutoxy group, sec-butoxy group, t-butoxy group, pentyloxy group, isopentyloxy group. Group, 1-methylbutoxy group, 2-methylbutoxy group, neopentyloxy group, 1-ethylpropyloxy group, 1,2-dimethylpropyloxy group, hexyloxy group, 1-methylpentyloxy group, 2-methylpentyl group Oxy group, 3-methylpentyloxy group, 4-methylpentyloxy group, 1,1-dimethylbutoxy group, 2,2-dimethylbutoxy group, 3,3-dimethylbutoxy group, 1,2-dimethylbutoxy group, 1 , 3-dimethylbutoxy group, 2,3-dimethylbutoxy group, 2-ethylbutoxy group, 1-a Propyl propyl group, 1,1,2-trimethyl propyl group, 1,2,2-trimethyl propyl group, and the like.
 C1~C6のハロアルコキシ基とは、前記のC1~C6のアルコキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C1~C6のハロアルコキシ基の具体例として、ジフルオロメトキシ基、トリフルオロメトキシ基、クロロジフルオロメトキシ基、ブロモジフルオロメトキシ基、2-フルオロエトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、1,1,2,2-テトラフルオロエトキシ基、ペンタフルオロエトキシ基、2,2,2-トリクロロエトキシ基、3,3-ジフルオロプロピルオキシ基、3,3,3-トリフルオロプロピルオキシ基、ヘプタフルオロプロピルオキシ基、ヘプタフルオロイソプロピルオキシ基、2,2,2-トリフルオロ-1-(トリフルオロメチル)-エトキシ基、ノナフルオロブトキシ基、ノナフルオロ-sec-ブトキシ基、3,3,4,4,5,5,5-ヘプタフルオロペンチルオキシ基、ウンデカフルオロペンチルオキシ基、トリデカフルオロヘキシルオキシ基等が挙げられる。 The term “C1 to C6 haloalkoxy group” refers to the above C1 to C6 alkoxy group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent. Specific examples of the C1 to C6 haloalkoxy group include difluoromethoxy group, trifluoromethoxy group, chlorodifluoromethoxy group, bromodifluoromethoxy group, 2-fluoroethoxy group, 2,2-difluoroethoxy group, 2,2,2. -Trifluoroethoxy group, 1,1,2,2-tetrafluoroethoxy group, pentafluoroethoxy group, 2,2,2-trichloroethoxy group, 3,3-difluoropropyloxy group, 3,3,3-tri Fluoropropyloxy group, heptafluoropropyloxy group, heptafluoroisopropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) -ethoxy group, nonafluorobutoxy group, nonafluoro-sec-butoxy group, 3 , 3,4,4,5,5,5-heptafluoropentyloxy group Undecafluoro pentyloxy group, tridecafluorohexyl group, and the like.
 C3~C8のシクロアルコキシ基とは、前記のC3~C8のシクロアルキル基が酸素原子を介して結合したものを表す。C3~C8のシクロアルコキシ基の具体例として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基、シクロヘプチルオキシ基、シクロオクチルオキシ基等が挙げられる。 The C3 to C8 cycloalkoxy group represents a group in which the C3 to C8 cycloalkyl group is bonded via an oxygen atom. Specific examples of the C3 to C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group and a cyclooctyloxy group.
 C2~C6のアルケニルオキシ基とは、前記のC2~C6のアルケニル基が酸素原子を介して結合したものを表す。また、幾何異性体がある場合、E体またはZ体のどちらか一方のみ、あるいはE体とZ体との任意の割合の混合物であり、指定される炭素数の範囲であれば、特に制限されることはない。C2~C6のアルケニルオキシ基の具体例として、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、3-ブテニルオキシ基、1-ペンテニルオキシ基、2-ペンテニルオキシ基、3-ペンテニルオキシ基、4-ペンテニルオキシ基、3-メチル-2-ブテニルオキシ基、1-ヘキセニルオキシ基、2-ヘキセニルオキシ基、3-ヘキセニルオキシ基、4-ヘキセニルオキシ基、5-ヘキセニルオキシ基、4-メチル-3-ペンテニルオキシ基、3-メチル-2-ペンテニルオキシ基等が挙げられる。 The term "C2-C6 alkenyloxy group" refers to the C2-C6 alkenyl group bonded through an oxygen atom. When there is a geometric isomer, only one of the E-form and the Z-form, or a mixture of the E-form and the Z-form at an arbitrary ratio, is not particularly limited as long as the number of carbon atoms is within a specified range. Never. Specific examples of the C2-C6 alkenyloxy group include vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, 3-butenyloxy group, 1-pentenyloxy group, 2-pentenyloxy group. , 3-pentenyloxy group, 4-pentenyloxy group, 3-methyl-2-butenyloxy group, 1-hexenyloxy group, 2-hexenyloxy group, 3-hexenyloxy group, 4-hexenyloxy group, 5-hexenyloxy group Group, 4-methyl-3-pentenyloxy group, 3-methyl-2-pentenyloxy group and the like.
 C2~C6のハロアルケニルオキシ基とは、前記のC2~C6のアルケニルオキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C2~C6のハロアルケニルオキシ基の具体例として、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、3,3-ジクロロアリルオキシ基、4,4-ジフルオロ-3-ブテニルオキシ基、5,5-ジフルオロ-4-ペンテニルオキシ基、6,6-ジフルオロ-5-ヘキセニルオキシ基等が挙げられる。 The term “C2-C6 haloalkenyloxy group” refers to the above-mentioned C2-C6 alkenyloxy group in which a hydrogen atom is optionally substituted with one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkenyloxy group include a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, a 2,2-dichlorovinyloxy group, a 3-fluoroallyloxy group, and a 3,3-difluoro group. Examples include allyloxy group, 3,3-dichloroallyloxy group, 4,4-difluoro-3-butenyloxy group, 5,5-difluoro-4-pentenyloxy group, and 6,6-difluoro-5-hexenyloxy group. To be
 C3~C6のアルキニルオキシ基とは、前記のC2~C6のアルキニル基のうち、C3~C6のアルキニル基が酸素原子を介して結合したのものを表す。C3~C6のアルキニルオキシ基の具体例として、プロパルギルオキシ基、2-ブチニルオキシ基、3-ブチニルオキシ基、2-ペンチニルオキシ基、3-ペンチニルオキシ基、4-ペンチニルオキシ基、1,1-ジメチル-2-プロピニルオキシ基、2-ヘキシニルオキシ基、3-ヘキシニルオキシ基、4-ヘキシニルオキシ基、5-ヘキシニルオキシ基等が挙げられる。 The C3-C6 alkynyloxy group refers to the C2-C6 alkynyl group in which the C3-C6 alkynyl group is bonded via an oxygen atom. Specific examples of the C3-C6 alkynyloxy group include propargyloxy group, 2-butynyloxy group, 3-butynyloxy group, 2-pentynyloxy group, 3-pentynyloxy group, 4-pentynyloxy group, 1,1. Examples thereof include a dimethyl-2-propynyloxy group, a 2-hexynyloxy group, a 3-hexynyloxy group, a 4-hexynyloxy group and a 5-hexynyloxy group.
 C3~C6のハロアルキニルオキシ基とは、前記のC3~C6のアルキニルオキシ基における水素原子が1個または2個以上のハロゲン原子によって任意に置換されたものを表す。2個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。C3~C6のハロアルキニルオキシ基の具体例として、1,1-ジフルオロ-2-プロピニルオキシ基、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、4,4,4-トリフルオロ-2-ブチニルオキシ基、5,5-ジフルオロ-3-ペンチニルオキシ基、5-クロロ-5,5-ジフルオロ-3-ペンチニルオキシ基、5-ブロモ-5,5-ジフルオロ-3-ペンチニルオキシ基、5,5,5-トリフルオロ-3-ペンチニルオキシ基、6,6-ジフルオロ-4-ヘキシニルオキシ基、6-クロロ-6,6-ジフルオロ-4-ヘキシニルオキシ基、6-ブロモ-6,6-ジフルオロ-4-ヘキシニルオキシ基、6,6,6-トリフルオロ-4-ヘキシニルオキシ基等が挙げられる。 The C3 to C6 haloalkynyloxy group refers to the above C3 to C6 alkynyloxy group in which a hydrogen atom is optionally substituted by one or two or more halogen atoms. When substituted with two or more halogen atoms, those halogen atoms may be the same or different, and the number of substitution is not particularly limited as long as it can be present as a substituent. Specific examples of the C3-C6 haloalkynyloxy group include 1,1-difluoro-2-propynyloxy group, 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro-2-butynyloxy group. , 4-bromo-4,4-difluoro-2-butynyloxy group, 4,4,4-trifluoro-2-butynyloxy group, 5,5-difluoro-3-pentynyloxy group, 5-chloro-5,5 -Difluoro-3-pentynyloxy group, 5-bromo-5,5-difluoro-3-pentynyloxy group, 5,5,5-trifluoro-3-pentynyloxy group, 6,6-difluoro-4 -Hexynyloxy group, 6-chloro-6,6-difluoro-4-hexynyloxy group, 6-bromo-6,6-difluoro-4-hexynyloxy group, 6,6,6- Trifluoroacetic 4- hexynyloxy group.
 C2~C6のアルコキシアルコキシ基とは、前記のC1~C6のアルコキシ基のうちC1~C5のアルコキシ基における水素原子が、1個または2個以上のC1~C5アルコキシ基で任意に置換されたものを表す。炭素数の総和が指定される炭素数の範囲であれば、特に限定されることはない。C2~C6のアルコキシアルコキシ基の具体例として、メトキシメトキシ基、エトキシメトキシ基、プロピルオキシメトキシ基、イソプロピルオキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、プロピルオキシエトキシ基、イソプロピルオキシエトキシ基、メトキシプロピルオキシ基、エトキシプロピルオキシ基、プロピルオキシプロピルオキシ基、イソプロピルオキシプロピルオキシ基等が挙げられる。 The C2 to C6 alkoxyalkoxy group is one in which the hydrogen atom in the C1 to C5 alkoxy group among the above C1 to C6 alkoxy groups is optionally substituted with one or two or more C1 to C5 alkoxy groups. Represents There is no particular limitation as long as the sum of the carbon numbers is within the specified carbon number range. Specific examples of the C2 to C6 alkoxyalkoxy group include methoxymethoxy group, ethoxymethoxy group, propyloxymethoxy group, isopropyloxymethoxy group, methoxyethoxy group, ethoxyethoxy group, propyloxyethoxy group, isopropyloxyethoxy group, methoxypropyl. Examples thereof include an oxy group, an ethoxypropyloxy group, a propyloxypropyloxy group and an isopropyloxypropyloxy group.
 1~2個の酸素原子を含む3~6員環の基の具体例として、1,2-エポキシエタニル基、オキセタニル基、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、1,3-ジオキサニル基、1,4-ジオキサニル基等が挙げられる。 Specific examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include 1,2-epoxyetanyl group, oxetanyl group, oxolanyl group, oxanyl group, 1,3-dioxolanyl group, 1,3- Examples thereof include dioxanyl group and 1,4-dioxanyl group.
 本発明のピリドン化合物は、下記式(1)で表される化合物とその塩を包含する。
Figure JPOXMLDOC01-appb-C000003
The pyridone compound of the present invention includes a compound represented by the following formula (1) and a salt thereof.
Figure JPOXMLDOC01-appb-C000003
 以下、式(1)について説明する。 The formula (1) will be described below.
 式(1)におけるR1は、水酸基、シアノ基、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表す。 R1 in the formula (1) is a hydroxyl group, a cyano group, a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, or a C3 to C8 optionally substituted with a substituent A. Cycloalkyl group, C2-C6 alkenyl group optionally substituted with substituent A, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent A, C2-C6 Haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent A, substituent A C2-C6 alkenyloxy group optionally substituted with A, a C2-C6 haloalkenyloxy group, a C3-C6 alkynyloxy group optionally substituted with a substituent A, A 3-C6 haloalkynyloxy group, or RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 Represents a haloalkyl group or a C3 to C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which they are attached are an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Represents that which forms).
 中でもR1は、置換基Aで適宜置換されてもよいC1~C6のアルキル基、またはC1~C6のハロアルキル基が好ましく、 Among them, R1 is preferably a C1 to C6 alkyl group which may be appropriately substituted with a substituent A, or a C1 to C6 haloalkyl group,
 特に、置換基Aで適宜置換されてもよいC1~C6のアルキル基が好ましい。 Particularly, a C1-C6 alkyl group which may be appropriately substituted with the substituent A is preferable.
 式(1)のR1には、水酸基、およびシアノ基が含まれる。 R1 in the formula (1) includes a hydroxyl group and a cyano group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、またはプロピル基であり、特に好ましくは、エチル基である。置換基Aを有する場合、C1~C6のアルキル基における水素原子が、置換基Aによって任意に置換される。 The C1 to C6 alkyl group of the “C1 to C6 alkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same meaning as defined above, and is preferably a methyl group or an ethyl group. , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, more preferably a methyl group, an ethyl group, or a propyl group, and particularly preferably an ethyl group. When it has a substituent A, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
 式(1)のR1における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、2-フルオロエチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、2-フルオロエチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1-C6 haloalkyl group” for R1 in formula (1) has the same meaning as defined above, and is preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group or a 2,2,2-trifluoro group. It is an ethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group, or a 2,2,2- It is a trifluoroethyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Aを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Aによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with the substituent A" in R1 of the formula (1) has the same meaning as defined above, and preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. When it has a substituent A, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、またはアリル基であり、さらに好ましくは、ビニル基、またはアリル基である。置換基Aを有する場合、C2~C6のアルケニル基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyl group of the "C2-C6 alkenyl group optionally substituted with the substituent A" in R1 of the formula (1) has the same meaning as defined above, preferably a vinyl group, 1- It is a propenyl group or an allyl group, more preferably a vinyl group or an allyl group. When it has a substituent A, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、3-フルオロアリル基、または3,3-ジフルオロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” for R1 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 3-fluoroallyl group, or It is a 3,3-difluoroallyl group, more preferably a 2-fluorovinyl group or a 2,2-difluorovinyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、プロパルギル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、プロパルギル基である。置換基Aを有する場合、C2~C6のアルキニル基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted by the substituent A" in R1 of the formula (1) has the same meaning as defined above, preferably a propargyl group, 2- It is a butynyl group or a 3-butynyl group, and more preferably a propargyl group. When it has a substituent A, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニル基、4-クロロ-4,4-ジフルオロ-2-ブチニル基、4-ブロモ-4,4-ジフルオロ-2-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基である。 The “C2-C6 haloalkynyl group” for R 1 in formula (1) has the same meaning as defined above, and is preferably a 4,4-difluoro-2-butynyl group or 4-chloro-4,4-difluoro- 2-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group, or 4,4,4-trifluoro-2-butynyl group, and more preferably 4,4-difluoro-2-butynyl group. Or a 4,4,4-trifluoro-2-butynyl group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、またはエトキシ基である。置換基Aを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C1 to C6 alkoxy group of the “C1 to C6 alkoxy group optionally substituted by the substituent A” in R1 of the formula (1) has the same meaning as defined above, and is preferably a methoxy group or an ethoxy group. , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group or an ethoxy group. When it has a substituent A, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
 式(1)のR1における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The "C1-C6 haloalkoxy group" in R1 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2,2. 2-trifluoroethoxy group, 3,3-difluoropropyloxy group or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Aを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted by the substituent A" in R1 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. When it has a substituent A, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent A.
 式(1)のR1における「置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基であり、さらに好ましくは、アリルオキシ基である。置換基Aを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyloxy group in the "C2-C6 alkenyloxy group optionally substituted with the substituent A" in R1 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably an allyloxy group. When it has a substituent A, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
 式(1)のR1における「C2~C6のハロアルケニルオキシ基」とは、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、3-フルオロアリルオキシ基、または3,3-ジフルオロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” for R 1 in formula (1) has the same meaning as defined above, and is preferably 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 3-fluoro. An allyloxy group or a 3,3-difluoroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluorovinyloxy group.
 式(1)のR1における「置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Aを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C3-C6 alkynyloxy group of the "C3-C6 alkynyloxy group optionally substituted by the substituent A" in R1 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, and more preferably propargyloxy group. When it has a substituent A, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
 式(1)のR1における「C3~C6のハロアルキニルオキシ基」とは、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The "C3-C6 haloalkynyloxy group" for R1 in formula (1) has the same meaning as defined above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4- It is a difluoro-2-butynyloxy group, a 4-bromo-4,4-difluoro-2-butynyloxy group, or a 4,4,4-trifluoro-2-butynyloxy group, and more preferably 4,4-difluoro-2. A butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR1における「RaRbN-」(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)の各用語は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。RaおよびRbとして、好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、水素原子、または置換基Bで適宜置換されてもよいC1~C6のアルキル基である。「RaRbN-」として、好ましくは、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、アミノ基、メチルアミノ基、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基である。 “RaRbN—” in R1 of formula (1) (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 A haloalkyl group, or a C3-C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which they are attached are an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Each of the terms, which represents what is formed, is as defined above. Regarding the “C1 to C6 alkyl group optionally substituted with the substituent B”, in the case of having the substituent B, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B. . As Ra and Rb, a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a pyrrolidinyl group, or a piperidinyl group is preferable. And more preferably a hydrogen atom or a C1-C6 alkyl group optionally substituted with a substituent B. "RaRbN-" is preferably an amino group, a methylamino group, an ethylamino group, a (methoxymethyl) amino group, a (2-methoxyethyl) amino group, a (cyanomethyl) amino group, a (2-cyanoethyl) amino group, Dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, 2,2- A difluoroethylamino group, a 2,2,2-trifluoroethylamino group, a cyclopropylamino group, a (cyclopropyl) methylamino group, a pyrrolidinyl group, or a piperidinyl group, more preferably an amino group, a methylamino group, Dimethylamino group, ethylmethylamino group, or diethyl Is an amino group.
 式(1)中のR2は、水素原子、ニトロ基、ハロゲン原子、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、Rc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSOを表す。)、またはRx1C(=O)-(ここで、Rx1は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)を表す。)を表す。 R2 in the formula (1) is appropriately substituted with a hydrogen atom, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, or a substituent A. C3 to C8 cycloalkyl group, C2 to C6 alkenyl group optionally substituted with substituent A, C2 to C6 haloalkenyl group, C2 to C6 alkynyl optionally substituted with substituent A Group, C2 to C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cyclo group optionally substituted with substituent A Alkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent A, C2-C6 haloalkenyloxy group, C3-C6 alkynyl optionally substituted with substituent A Alkoxy group, a C3 ~ C6 haloalkynyl group, Rc-L-(wherein, Rc represents an alkyl group or a C1 ~ C6 haloalkyl group, a C1 ~ C6, L is S, SO or SO 2, Or Rx1C (═O) — (wherein Rx1 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 A cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb are as defined above). Represent
 中でも、R2は、水素原子、ハロゲン原子、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、または置換基Aで適宜置換されてもよいC1~C6のアルコキシ基が好ましく、
 特に、水素原子、ハロゲン原子、または置換基Aで適宜置換されてもよいC1~C6のアルキル基が好ましい。
Among them, R2 is a hydrogen atom, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a C2 to C6 alkynyl optionally substituted with a substituent A Group, or a C1 to C6 alkoxy group optionally substituted with a substituent A is preferable,
Particularly, a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which may be appropriately substituted with the substituent A is preferable.
 式(1)のR2には、水素原子、およびニトロ基が含まれる。 R2 in the formula (1) includes a hydrogen atom and a nitro group.
式(1)のR2におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子であり、さらに好ましくは、塩素原子、または臭素原子である。 The halogen atom in R2 of the formula (1) is as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, more preferably a chlorine atom or a bromine atom.
 式(1)のR2における「置換基Aで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、またはエチル基である。置換基Aを有する場合、C1~C6のアルキル基における水素原子が、置換基Aによって任意に置換される。 The C1 to C6 alkyl group of the “C1 to C6 alkyl group optionally substituted with the substituent A” in R2 of the formula (1) has the same meaning as defined above, and preferably a methyl group or an ethyl group. , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group or an ethyl group. When it has a substituent A, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
 式(1)のR2における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R2 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2. A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or It is a 2,2,2-trifluoroethyl group.
 式(1)のR2における「置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Aを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Aによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with the substituent A" in R2 of the formula (1) has the same meaning as defined above, and is preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. When it has a substituent A, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
 式(1)のR2における「置換基Aで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Aを有する場合、C2~C6のアルケニル基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyl group in the "C2-C6 alkenyl group optionally substituted by the substituent A" in R2 of the formula (1) has the same meaning as defined above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group is more preferable, and a vinyl group, a 1-propenyl group, or an allyl group is more preferable. When it has a substituent A, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
 式(1)のR2における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The "C2-C6 haloalkenyl group" for R2 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, and more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
 式(1)のR2における「置換基Aで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Aを有する場合、C2~C6のアルキニル基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted with the substituent A" in R2 of the formula (1) has the same meaning as defined above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group is more preferable, and an ethynyl group, a 1-propynyl group, or a propargyl group is more preferable. When it has a substituent A, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
 式(1)のR2における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The "C2-C6 haloalkynyl group" in R2 of the formula (1) has the same meaning as defined above, and is preferably a 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1. -Propinyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- It is a 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group or a 3,3,3-trifluoro-1-propynyl group.
 式(1)のR2における「置換基Aで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、またはイソプロピルオキシ基である。置換基Aを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C1 to C6 alkoxy group of the “C1 to C6 alkoxy group optionally substituted with the substituent A” in R2 of the formula (1) has the same meaning as defined above, and is preferably a methoxy group or an ethoxy group. , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, or an isopropyloxy group. When it has a substituent A, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
 式(1)のR2における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The "C1-C6 haloalkoxy group" in R2 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2,2. 2-trifluoroethoxy group, 3,3-difluoropropyloxy group or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
 式(1)のR2における「置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Aを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Aによって任意に置換される。 The C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted with the substituent A" in R2 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. When it has a substituent A, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent A.
 式(1)のR2における「置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、または3-ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基である。置換基Aを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C2-C6 alkenyloxy group in the "C2-C6 alkenyloxy group optionally substituted with the substituent A" in R2 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, It is a 1-propenyloxy group, an allyloxy group, a 1-butenyloxy group, a 2-butenyloxy group or a 3-butenyloxy group, more preferably a vinyloxy group, a 1-propenyloxy group or an allyloxy group. When it has a substituent A, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
 式(1)のR2における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” in R2 of the formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group or a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluoro group. It is a vinyloxy group.
 式(1)のR2における「置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Aを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Aによって任意に置換される。 The C3-C6 alkynyloxy group of the "C3-C6 alkynyloxy group optionally substituted by the substituent A" in R2 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, and more preferably propargyloxy group. When it has a substituent A, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent A.
 式(1)のR2における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R2 of the formula (1) has the same meaning as defined above, and is preferably 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro group. -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR2における「Rc-L-」(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSOを表す。)の各用語は、前記と同義である。「Rc-L-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、またはトリフルオロメタンスルホニル基であり、さらに好ましくは、メチルチオ基、メタンスルフィニル基、またはメタンスルホニル基である。 “Rc-L—” in R2 of the formula (1) (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2 ). Each term of) is synonymous with the above. "Rc-L-" is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, more preferably a methylthio group or a methanesulfinyl group. Or a methanesulfonyl group.
 式(1)のR2における「Rx1C(=O)-」(ここで、Rx1は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)を表す。)の各用語は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。Rx1として、好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC1~C6のアルコキシ基であり、さらに好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、またはC1~C6のアルコキシ基である。「Rx1C(=O)-」として、ホルミル基、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、メチルアミノカルボニル基、エチルアミノカルボニル基、(メトキシメチル)アミノカルボニル基、(2-メトキシエチル)アミノカルボニル基、(シアノメチル)アミノカルボニル基、(2-シアノエチル)アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、(メトキシメチル)メチルアミノカルボニル基、(2-メトキシエチル)メチルアミノカルボニル基、(シアノメチル)メチルアミノカルボニル基、(2-シアノエチル)メチルアミノカルボニル基、2,2-ジフルオロエチルアミノカルボニル基、2,2,2-トリフルオロエチルアミノカルボニル基、シクロプロピルアミノカルボニル基、(シクロプロピル)メチルアミノカルボニル基、ピロリジニルカルボニル基、およびピペリジニルカルボニル基等が挙げられる。「Rx1C(=O)-」として好ましくは、ホルミル基、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、またはエトキシカルボニル基であり、さらに好ましくは、ホルミル基、アセチル基、メトキシアセチル基、シアノアセチル基、メトキシカルボニル基、またはエトキシカルボニル基である。 “Rx1C (═O) —” in R2 of the formula (1) (wherein Rx1 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, C3 To C8 cycloalkyl group, C1 to C6 alkoxy group, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group, or RaRbN— (wherein Ra and Rb are as defined above). .) Is synonymous with the above definition. Regarding the “C1 to C6 alkyl group optionally substituted with the substituent B”, in the case of having the substituent B, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B. . Rx1 is preferably a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C1 to C6 alkoxy group, more preferably a hydrogen atom, It is a C1-C6 alkyl group which may be optionally substituted with a substituent B, or a C1-C6 alkoxy group. “Rx1C (═O) —” includes formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, cyclopropanecarbonyl group, methoxycarbonyl group, ethoxycarbonyl group, 2 , 2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group, ethylamino Carbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dimethylaminocarbonyl group, ethylmethyl Minocarbonyl group, diethylaminocarbonyl group, (methoxymethyl) methylaminocarbonyl group, (2-methoxyethyl) methylaminocarbonyl group, (cyanomethyl) methylaminocarbonyl group, (2-cyanoethyl) methylaminocarbonyl group, 2,2- Examples include difluoroethylaminocarbonyl group, 2,2,2-trifluoroethylaminocarbonyl group, cyclopropylaminocarbonyl group, (cyclopropyl) methylaminocarbonyl group, pyrrolidinylcarbonyl group, piperidinylcarbonyl group, and the like. . “Rx1C (═O) —” is preferably a formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, or ethoxycarbonyl group, and Preferred are formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, methoxycarbonyl group, and ethoxycarbonyl group.
 式(1)中、Hetは、硫黄原子および窒素原子を含む5員の複素環基を表す。 In the formula (1), Het represents a 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom.
 該硫黄原子および窒素原子を含む5員の複素環基は、R3が適宜0~2置換する。(ただし、2置換のR3がある場合、R3はそれぞれ独立した置換基を表す。) In the 5-membered heterocyclic group containing the sulfur atom and the nitrogen atom, R3 is appropriately substituted with 0 to 2. (However, when 2-substituted R3 is present, each R3 represents an independent substituent.)
 硫黄原子および窒素原子を含む5員の複素環基の具体例としては、チアゾリル基、イソチアゾリル基、チアジアゾリル基、またはチアトリアゾリル基が挙げられる。 Specific examples of the 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom include a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, and a thiatriazolyl group.
 中でも、Hetは、チアゾリル基、またはチアジアゾリル基が好ましい。 Among them, Het is preferably a thiazolyl group or a thiadiazolyl group.
 該チアゾリル基、または該チアジアゾリル基は、R3が適宜0~2置換する。(ただし、2置換のR3がある場合、R3はそれぞれ独立した置換基を表す。) R3 of the thiazolyl group or the thiadiazolyl group is appropriately substituted with 0 to 2. (However, when 2-substituted R3 is present, each R3 represents an independent substituent.)
 R3は、水酸基、シアノ基、ニトロ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6ハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表す。 R3 is a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a C3 optionally substituted with a substituent C A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent C, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, C2-C6 Haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent C, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent C, substituent C2-C6 alkenyloxy group optionally substituted by C, C2-C6 haloalkenyloxy group, C3-C6 alkynyloxy optionally substituted by substituent C Group, C3 to C6 haloalkynyloxy group, RaRbN- (wherein Ra and Rb have the same meanings as described above), Rc-L- (wherein Rc and L have the same meanings as described above). , Rx1C (= O)-(where Rx1 is as defined above), Rx1C (= O) O- (where Rx1 is as defined above), or Rx2C (= O). N (Rx3)-(wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, C1 to C6 Represents an alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN— (wherein Ra and Rb have the same meanings as defined above), and Rx3 represents a hydrogen atom or a substituent. Appropriately replaced by B Alkyl group which may C1 ~ C6, represent a representative.) A cycloalkyl group of haloalkyl group having C1 ~ C6 or C3 ~ C8,.
 中でも、R3は、シアノ基、ニトロ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、RaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)、またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)が好ましく、 Among them, R3 is a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a C3 to optionally substituted with a substituent C. A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent C, a C2-C6 alkynyl group optionally substituted with a substituent C, a substituent C optionally substituted C1 to C6 alkoxy group, RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group) , Or a C3-C8 cycloalkyl group, or Ra and Rb together with the nitrogen atom to which they are attached are an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, Represents a peridinyl group, a homopiperidinyl group, or an azocanyl group.), Or Rx2C (= O) N (Rx3)-(wherein Rx2 is a hydrogen atom or C1 optionally substituted with a substituent B). To C6 alkyl group, C1 to C6 haloalkyl group, C3 to C8 cycloalkyl group, C1 to C6 alkoxy group, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group, or RaRbN- (wherein , Ra and Rb are as defined above.), And Rx3 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or C3 to C8. Represents a cycloalkyl group of),
 特に、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)が好ましい。 In particular, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, Represents a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group which may be optionally substituted with a substituent B, or Ra and Rb together with the nitrogen atom to which they are attached; And an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group is preferable.).
 式(1)のR3には、水酸基、シアノ基、およびニトロ基が含まれる。 R3 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
 式(1)のR3におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子であり、特に好ましくは、塩素原子、または臭素原子である。 The halogen atom in R3 of the formula (1) has the same meaning as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and particularly preferably a chlorine atom or a bromine atom.
 式(1)のR3における「置換基Cで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、またはプロピル基であり、特に好ましくは、メチル基、またはエチル基である。置換基Cを有する場合、C1~C6のアルキル基における水素原子が、置換基Cによって任意に置換される。 The C1 to C6 alkyl group in the “C1 to C6 alkyl group optionally substituted with a substituent C” in R3 of the formula (1) has the same meaning as defined above, and preferably a methyl group or an ethyl group. , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, more preferably a methyl group, an ethyl group, or a propyl group, and particularly preferably a methyl group or an ethyl group. When it has a substituent C, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted by the substituent C.
 式(1)のR3における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、モノフルオロメチル基、モノクロロメチル基、モノブロモメチル基、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、モノブロモメチル基、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1-C6 haloalkyl group” for R3 in formula (1) has the same meaning as defined above, and is preferably a monofluoromethyl group, a monochloromethyl group, a monobromomethyl group, a difluoromethyl group, a trifluoromethyl group. , 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, more preferably monobromomethyl group , A difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or a 2,2,2-trifluoroethyl group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Cを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted by the substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. When it has a substituent C, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
 式(1)のR3における「置換基Cで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Cを有する場合、C2~C6のアルケニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyl group in the "C2-C6 alkenyl group optionally substituted with a substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group is more preferable, and a vinyl group, a 1-propenyl group, or an allyl group is more preferable. When it has a substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
 式(1)のR3における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” for R3 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, and more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Cを有する場合、C2~C6のアルキニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted by the substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group is more preferable, and an ethynyl group, a 1-propynyl group, or a propargyl group is more preferable. When it has a substituent C, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
 式(1)のR3における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The "C2-C6 haloalkynyl group" in R3 of the formula (1) has the same meaning as defined above, and is preferably a 3,3-difluoro-1-propynyl group or a 3,3,3-trifluoro-1 group. -Propinyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- It is a 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group or a 3,3,3-trifluoro-1-propynyl group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、またはイソプロピルオキシ基である。置換基Cを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C1 to C6 alkoxy group of the “C1 to C6 alkoxy group optionally substituted with a substituent C” in R3 of the formula (1) has the same meaning as defined above, and preferably a methoxy group or an ethoxy group. , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, or an isopropyloxy group. When it has a substituent C, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent C.
 式(1)のR3における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The “C1-C6 haloalkoxy group” in R3 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2,2. 2-trifluoroethoxy group, 3,3-difluoropropyloxy group or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Cを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted with a substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. When it has a substituent C, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
 式(1)のR3における「置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、または3-ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基である。置換基Cを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with a substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, It is a 1-propenyloxy group, an allyloxy group, a 1-butenyloxy group, a 2-butenyloxy group or a 3-butenyloxy group, more preferably a vinyloxy group, a 1-propenyloxy group or an allyloxy group. When it has a substituent C, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
 式(1)のR3における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” for R3 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluoro group. It is a vinyloxy group.
 式(1)のR3における「置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Cを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C6 alkynyloxy group of the "C3 to C6 alkynyloxy group optionally substituted with a substituent C" in R3 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, and more preferably propargyloxy group. When it has a substituent C, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
 式(1)のR3における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The "C3-C6 haloalkynyloxy group" for R3 in formula (1) has the same meaning as defined above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro group. -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR3における「RaRbN-」のRaおよびRbは、前記と同義である。RaおよびRbとして、好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、水素原子、または置換基Bで適宜置換されてもよいC1~C6のアルキル基である。「RaRbN-」として好ましくは、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、アミノ基、メチルアミノ基、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基であり、特に好ましくは、アミノ基である。 Ra and Rb of "RaRbN-" in R3 of the formula (1) are as defined above. As Ra and Rb, a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a pyrrolidinyl group, or a piperidinyl group is preferable. And more preferably a hydrogen atom or a C1-C6 alkyl group optionally substituted with a substituent B. Preferred as “RaRbN—” is amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, dimethyl group. Amino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, 2,2-difluoro It is an ethylamino group, a 2,2,2-trifluoroethylamino group, a cyclopropylamino group, a (cyclopropyl) methylamino group, a pyrrolidinyl group, or a piperidinyl group, more preferably an amino group, a methylamino group, or dimethyl. Amino group, ethylmethylamino group, or diethyl group An amino group, particularly preferably an amino group.
 式(1)のR3における「Rc-L-」のRcおよびLは、前記と同義である。「Rc-L-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、またはトリフルオロメタンスルホニル基であり、さらに好ましくは、メチルチオ基、メタンスルフィニル基、またはメタンスルホニル基である。 Rc and L of "Rc-L-" in R3 of the formula (1) have the same meaning as above. "Rc-L-" is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group or a methanesulfinyl group. Or a methanesulfonyl group.
 式(1)のR3における「Rx1C(=O)-」のRx1は、前記の定義と同義である。Rx1として、好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC1~C6のアルコキシ基であり、さらに好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、またはC1~C6のアルコキシ基である。「Rx1C(=O)-」として、好ましくは、ホルミル基、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、メチルアミノカルボニル基、エチルアミノカルボニル基、(メトキシメチル)アミノカルボニル基、(2-メトキシエチル)アミノカルボニル基、(シアノメチル)アミノカルボニル基、(2-シアノエチル)アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、(メトキシメチル)メチルアミノカルボニル基、(2-メトキシエチル)メチルアミノカルボニル基、(シアノメチル)メチルアミノカルボニル基、(2-シアノエチル)メチルアミノカルボニル基、2,2-ジフルオロエチルアミノカルボニル基、2,2,2-トリフルオロエチルアミノカルボニル基、シクロプロピルアミノカルボニル基、(シクロプロピル)メチルアミノカルボニル基、ピロリジニルカルボニル基、またはピペリジニルカルボニル基であり、さらに好ましくは、ホルミル基、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基である。 Rx1 of "Rx1C (= O)-" in R3 of the formula (1) has the same meaning as defined above. Rx1 is preferably a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C1 to C6 alkoxy group, more preferably a hydrogen atom, It is a C1-C6 alkyl group which may be optionally substituted with a substituent B, or a C1-C6 alkoxy group. “Rx1C (═O) —” is preferably formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, cyclopropanecarbonyl group, methoxycarbonyl group, ethoxycarbonyl. Group, 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group , Ethylaminocarbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dimethylaminocarbonyl group, Cylmethylaminocarbonyl group, diethylaminocarbonyl group, (methoxymethyl) methylaminocarbonyl group, (2-methoxyethyl) methylaminocarbonyl group, (cyanomethyl) methylaminocarbonyl group, (2-cyanoethyl) methylaminocarbonyl group, 2, 2-difluoroethylaminocarbonyl group, 2,2,2-trifluoroethylaminocarbonyl group, cyclopropylaminocarbonyl group, (cyclopropyl) methylaminocarbonyl group, pyrrolidinylcarbonyl group, or piperidinylcarbonyl group , And more preferably formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, ethoxycarbonyl group.
 式(1)のR3における「Rx1C(=O)O-」のRx1は、前記の定義と同義である。「Rx1C(=O)O-」として、好ましくは、ホルミルオキシ基、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、プロピオニルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、シクロプロパンカルボニルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、2,2-ジフルオロエトキシカルボニルオキシ基、2,2,2-トリフルオロエトキシカルボニルオキシ基、3,3,3-トリフルオロプロピルオキシカルボニルオキシ基、シクロプロピルオキシカルボニルオキシ基、アミノカルボニルオキシ基、メチルアミノカルボニルオキシ基、エチルアミノカルボニルオキシ基、(メトキシメチル)アミノカルボニルオキシ基、(2-メトキシエチル)アミノカルボニルオキシ基、(シアノメチル)アミノカルボニルオキシ基、(2-シアノエチル)アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、ジエチルアミノカルボニルオキシ基、(メトキシメチル)メチルアミノカルボニルオキシ基、(2-メトキシエチル)メチルアミノカルボニルオキシ基、(シアノメチル)メチルアミノカルボニルオキシ基、(2-シアノエチル)メチルアミノカルボニルオキシ基、2,2-ジフルオロエチルアミノカルボニルオキシ基、2,2,2-トリフルオロエチルアミノカルボニルオキシ基、シクロプロピルアミノカルボニルオキシ基、(シクロプロピル)メチルアミノカルボニルオキシ基、ピロリジニルカルボニルオキシ基、またはピペリジニルカルボニルオキシ基であり、さらに好ましくは、ホルミルオキシ基、アセチルオキシ基、またはトリフルオロアセチルオキシ基である。 Rx1 of "Rx1C (= O) O-" in R3 of the formula (1) has the same meaning as defined above. “Rx1C (═O) O—” is preferably formyloxy group, acetyloxy group, methoxyacetyloxy group, cyanoacetyloxy group, propionyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group, cyclopropanecarbonyl. Oxy group, methoxycarbonyloxy group, ethoxycarbonyloxy group, 2,2-difluoroethoxycarbonyloxy group, 2,2,2-trifluoroethoxycarbonyloxy group, 3,3,3-trifluoropropyloxycarbonyloxy group, Cyclopropyloxycarbonyloxy group, aminocarbonyloxy group, methylaminocarbonyloxy group, ethylaminocarbonyloxy group, (methoxymethyl) aminocarbonyloxy group, (2-methoxyethyl) aminocarbonyl group Oxy group, (cyanomethyl) aminocarbonyloxy group, (2-cyanoethyl) aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethylmethylaminocarbonyloxy group, diethylaminocarbonyloxy group, (methoxymethyl) methylaminocarbonyloxy group, ( 2-methoxyethyl) methylaminocarbonyloxy group, (cyanomethyl) methylaminocarbonyloxy group, (2-cyanoethyl) methylaminocarbonyloxy group, 2,2-difluoroethylaminocarbonyloxy group, 2,2,2-trifluoro Ethylaminocarbonyloxy group, cyclopropylaminocarbonyloxy group, (cyclopropyl) methylaminocarbonyloxy group, pyrrolidinylcarbonyloxy group, or piperidinylcarbonyl group An alkoxy group, more preferably a formyloxy group, an acetyloxy group or trifluoroacetyl group.
 式(1)のR3における「Rx2C(=O)N(Rx3)-」(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)の各用語は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。Rx2として、好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)であり、さらに好ましくは、置換基Bで適宜置換されてもよいC1~C6のアルキル基である。Rx3として、好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、またはC1~C6のハロアルキル基であり、さらに好ましくは、水素原子である。Rx2の具体例として、好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、エチル基、ジフルオロメチル基、トリフルオロメチル基、シクロプロピル基、メトキシ基、エトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、シクロプロピルオキシ基、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、ジフルオロメチル基、トリフルオロメチル基、メトキシ基、エトキシ基、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基である。また、Rx3の具体例として、好ましくは、水素原子、メチル基、メトキシメチル基、エトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2-エトキシエチル基、2-シアノエチル基、プロピル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、またはシクロプロピル基であり、さらに好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。また、「Rx2C(=O)N(Rx3)-」として好ましくは、アセチルアミド基、2,2,2,-トリフルオロアセチルアミド基、メチルカルバメート基、またはエチルカルバメート基であり、さらに好ましくは、アセチルアミド基である。 "Rx2C (= O) N (Rx3)-" in R3 of the formula (1) (wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 A haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as defined above). Rx3 represents a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group). The terms are synonymous with the above definitions. Regarding the “C1 to C6 alkyl group optionally substituted with the substituent B”, in the case of having the substituent B, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B. . Rx2 is preferably a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group, or RaRbN— (wherein Ra and Rb Is the same as defined above.), And more preferably a C1-C6 alkyl group optionally substituted by the substituent B. Rx3 is preferably a hydrogen atom, a C1 to C6 alkyl group which may be appropriately substituted with a substituent B, or a C1 to C6 haloalkyl group, and more preferably a hydrogen atom. Specific examples of Rx2 are preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group and 2,2-difluoroethoxy. Group, 2,2,2-trifluoroethoxy group, cyclopropyloxy group, amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group , (2-cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl ) Methylamino group, 2,2-difluoroethylamino group, 2, , 2-trifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group, or piperidinyl group, and more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, difluoromethyl group. A group, a trifluoromethyl group, a methoxy group, an ethoxy group, an amino group, a dimethylamino group, an ethylmethylamino group, or a diethylamino group. In addition, specific examples of Rx3 are preferably hydrogen atom, methyl group, methoxymethyl group, ethoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-cyanoethyl group, propyl group. , 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, or cyclopropyl group, and more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, 2-methoxy. It is an ethyl group, a 2,2-difluoroethyl group, or a 2,2,2-trifluoroethyl group. Further, “Rx2C (═O) N (Rx3) —” is preferably an acetylamide group, a 2,2,2-trifluoroacetylamide group, a methylcarbamate group, or an ethylcarbamate group, and more preferably It is an acetylamide group.
 以下、式(1)におけるHetについて詳細に説明する。 The Het in the formula (1) will be described in detail below.
 Hetが、チアゾリル基、イソチアゾリル基、チアジアゾリル基、またはチアトリアゾリル基のとき、Hetは、式(a-1)
Figure JPOXMLDOC01-appb-C000004

または式(a-2)
Figure JPOXMLDOC01-appb-C000005

で表される部分構造(ここで、R3は前記と同義であり、G1、G2、およびG3は、それぞれ独立していて、炭素原子または窒素原子を表し、該G1、該G2および該G3の少なくとも一つは窒素原子を表し、maは0~2の整数を表す。)を表す。
When Het is a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, or a thiatriazolyl group, Het has the formula (a-1)
Figure JPOXMLDOC01-appb-C000004

Or formula (a-2)
Figure JPOXMLDOC01-appb-C000005

(Wherein R3 is as defined above, G1, G2, and G3 are each independently a carbon atom or a nitrogen atom, and at least G1, G2, and G3) One represents a nitrogen atom, and ma represents an integer of 0 to 2).
 式(a-1)、および式(a-2)のmaが2の場合、2つのR3は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When ma in the formula (a-1) and the formula (a-2) is 2, two R3's each represent an independent substituent, which may be the same or different and can be arbitrarily selected.
 式(a-1)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000006
Specific examples of the partial structure of the formula (a-1) are shown below.
Figure JPOXMLDOC01-appb-C000006
 式(a-1)の部分構造のうち、好ましい具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000007
Preferred specific examples of the partial structure of the formula (a-1) are shown below.
Figure JPOXMLDOC01-appb-C000007
 式(a-1)の部分構造のうち、さらに好ましい具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000008
More preferable specific examples of the partial structure of the formula (a-1) are shown below.
Figure JPOXMLDOC01-appb-C000008
 式(a-2)の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000009
Specific examples of the partial structure of the formula (a-2) are shown below.
Figure JPOXMLDOC01-appb-C000009
 式(a-2)の部分構造の好ましい具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000010
Preferred specific examples of the partial structure of the formula (a-2) are shown below.
Figure JPOXMLDOC01-appb-C000010
 式(a-2)の部分構造のさらに好ましい具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000011
More preferable specific examples of the partial structure of the formula (a-2) are shown below.
Figure JPOXMLDOC01-appb-C000011
 式(1)におけるR4は、水酸基、シアノ基、ニトロ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6ハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、またはRx2C(=O)N(Rx3)-(ここで、Rx2およびRx3は、前記と同義である。)を表す。 R4 in the formula (1) is optionally substituted with a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group which may be optionally substituted with a substituent C, a C1 to C6 haloalkyl group, and a substituent C. Optionally a C3 to C8 cycloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent C, a C2 to C6 haloalkenyl group, a C2 to C6 alkynyl optionally substituted with a substituent C Group, C2 to C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent C, C1 to C6 haloalkoxy group, C3 to C8 cyclo optionally substituted with substituent C Alkoxy group, C2-C6 alkenyloxy group optionally substituted with substituent C, C2-C6 haloalkenyloxy group, C3-C6 optionally substituted with substituent C Alkynyloxy group, C3-C6 haloalkynyloxy group, RaRbN- (wherein Ra and Rb are as defined above), Rc-L- (wherein Rc and L are as defined above). .), Rx1C (= O)-(where Rx1 is as defined above), Rx1C (= O) O- (where Rx1 is as defined above), or Rx2C (=. O) N (Rx3)-(wherein Rx2 and Rx3 are as defined above).
 中でも、R4は、シアノ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、またはC1~C6のハロアルコキシ基が好ましく、
 特に、R4は、ハロゲン原子、または置換基Cで適宜置換されてもよいC1~C6のアルキル基が好ましい。
Among them, R4 is a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy optionally substituted with a substituent C. A group or a C1-C6 haloalkoxy group is preferred,
Particularly, R4 is preferably a halogen atom or a C1 to C6 alkyl group which may be appropriately substituted with a substituent C.
 式(1)のR4には、水酸基、シアノ基、およびニトロ基が含まれる。 R4 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
 式(1)のR4におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子であり、さらに好ましくは、フッ素原子、塩素原子、または臭素原子であり、特に好ましくは、フッ素原子である。 The halogen atom in R4 of the formula (1) has the same meaning as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and more preferably a fluorine atom, a chlorine atom or a bromine atom. And particularly preferably a fluorine atom.
 式(1)のR4における「置換基Cで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、またはイソプロピル基であり、さらに好ましくは、メチル基、エチル基、またはプロピル基である。置換基Cを有する場合、C1~C6のアルキル基における水素原子が、置換基Cによって任意に置換される。 The C1 to C6 alkyl group in the "C1 to C6 alkyl group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and is preferably a methyl group or an ethyl group. , A propyl group, or an isopropyl group, and more preferably a methyl group, an ethyl group, or a propyl group. When it has a substituent C, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted by the substituent C.
 式(1)のR4における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、またはトリフルオロメチル基である。 The “C1-C6 haloalkyl group” for R4 in formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2. -Trifluoroethyl group, 3,3-difluoropropyl group, or 3,3,3-trifluoropropyl group, and more preferably difluoromethyl group or trifluoromethyl group.
 式(1)のR4における「置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Cを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. When it has a substituent C, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
 式(1)のR4における「置換基Cで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基である。置換基Cを有する場合、C2~C6のアルケニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyl group in the "C2-C6 alkenyl group optionally substituted by the substituent C" in R4 of the formula (1) has the same meaning as defined above, and is preferably a vinyl group, 1- It is a propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, and more preferably a vinyl group. When it has a substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
 式(1)のR4における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” for R4 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, and more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
 式(1)のR4における「置換基Cで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基であり、さらに好ましくは、エチニル基である。置換基Cを有する場合、C2~C6のアルキニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted by the substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably an ethynyl group, 1- It is a propynyl group or a propargyl group, more preferably an ethynyl group. When it has a substituent C, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
 式(1)のR4における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The "C2-C6 haloalkynyl group" in R4 of the formula (1) has the same meaning as defined above, and is preferably a 3,3-difluoro-1-propynyl group or a 3,3,3-trifluoro-1 group. -Propinyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- It is a 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group or a 3,3,3-trifluoro-1-propynyl group.
 式(1)のR4における「置換基Cで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、またはイソプロピルオキシ基であり、さらに好ましくは、メトキシ基、またはエトキシ基である。置換基Cを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C1 to C6 alkoxy group of the "C1 to C6 alkoxy group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and is preferably a methoxy group or an ethoxy group. , A propyloxy group, or an isopropyloxy group, and more preferably a methoxy group or an ethoxy group. When it has a substituent C, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent C.
 式(1)のR4における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、またはトリフルオロメトキシ基である。 The “C1-C6 haloalkoxy group” in R4 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, A 2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, or a 3,3,3-trifluoropropyloxy group is more preferable, and a difluoromethoxy group or a trifluoromethoxy group is more preferable.
 式(1)のR4における「置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Cを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkoxy group of the "C3 to C8 cycloalkoxy group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. When it has a substituent C, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
 式(1)のR4における「置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基であり、さらに好ましくは、アリルオキシ基である。置換基Cを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted by the substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably an allyloxy group. When it has a substituent C, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
 式(1)のR4における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” for R4 in formula (1) has the same meaning as defined above, and is preferably 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluoro group. It is a vinyloxy group.
 式(1)のR4における「置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Cを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C6 alkynyloxy group of the "C3 to C6 alkynyloxy group optionally substituted with a substituent C" in R4 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, and more preferably propargyloxy group. When it has a substituent C, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
 式(1)のR4における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” for R4 in formula (1) has the same meaning as defined above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro group. -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR4における「RaRbN-」のRaおよびRbは、前記と同義である。「RaRbN-」として好ましくは、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基である。 Ra and Rb of "RaRbN-" in R4 of the formula (1) are as defined above. Preferred as “RaRbN—” is amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, dimethyl group. Amino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, 2,2-difluoro It is an ethylamino group, a 2,2,2-trifluoroethylamino group, a cyclopropylamino group, a (cyclopropyl) methylamino group, a pyrrolidinyl group, or a piperidinyl group, more preferably an amino group, a dimethylamino group, or ethyl. It is a methylamino group or a diethylamino group.
 式(1)のR4における「Rc-L-」のRcおよびLは、前記と同義である。「Rc-L-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、またはトリフルオロメタンスルホニル基であり、さらに好ましくは、メチルチオ基、メタンスルフィニル基、またはメタンスルホニル基である。 Rc and L of "Rc-L-" in R4 of the formula (1) have the same meaning as above. "Rc-L-" is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group or a methanesulfinyl group. Or a methanesulfonyl group.
 式(1)のR4における「Rx1C(=O)-」のRx1は、前記の定義と同義である。「Rx1C(=O)-」として、好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、メチルアミノカルボニル基、エチルアミノカルボニル基、(メトキシメチル)アミノカルボニル基、(2-メトキシエチル)アミノカルボニル基、(シアノメチル)アミノカルボニル基、(2-シアノエチル)アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、(メトキシメチル)メチルアミノカルボニル基、(2-メトキシエチル)メチルアミノカルボニル基、(シアノメチル)メチルアミノカルボニル基、(2-シアノエチル)メチルアミノカルボニル基、2,2-ジフルオロエチルアミノカルボニル基、2,2,2-トリフルオロエチルアミノカルボニル基、シクロプロピルアミノカルボニル基、(シクロプロピル)メチルアミノカルボニル基、ピロリジニルカルボニル基、またはピペリジニルカルボニル基であり、さらに好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、またはジエチルアミノカルボニル基である。 Rx1 of "Rx1C (= O)-" in R4 of the formula (1) has the same meaning as defined above. “Rx1C (═O) —” is preferably an acetyl group, a methoxyacetyl group, a cyanoacetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropanecarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, 2 , 2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group, ethylamino Carbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dimethylaminocarbonyl group, ethylmethyl Minocarbonyl group, diethylaminocarbonyl group, (methoxymethyl) methylaminocarbonyl group, (2-methoxyethyl) methylaminocarbonyl group, (cyanomethyl) methylaminocarbonyl group, (2-cyanoethyl) methylaminocarbonyl group, 2,2- A difluoroethylaminocarbonyl group, a 2,2,2-trifluoroethylaminocarbonyl group, a cyclopropylaminocarbonyl group, a (cyclopropyl) methylaminocarbonyl group, a pyrrolidinylcarbonyl group, or a piperidinylcarbonyl group, and Preferably, acetyl group, methoxyacetyl group, cyanoacetyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, ethoxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl. , Ethyl-methylaminocarbonyl group or diethylamino group.
 式(1)のR4における「Rx1C(=O)O-」のRx1は、前記の定義と同義である。「Rx1C(=O)O-」として、好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、プロピオニルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、シクロプロパンカルボニルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、2,2-ジフルオロエトキシカルボニルオキシ基、2,2,2-トリフルオロエトキシカルボニルオキシ基、3,3,3-トリフルオロプロピルオキシカルボニルオキシ基、シクロプロピルオキシカルボニルオキシ基、アミノカルボニルオキシ基、メチルアミノカルボニルオキシ基、エチルアミノカルボニルオキシ基、(メトキシメチル)アミノカルボニルオキシ基、(2-メトキシエチル)アミノカルボニルオキシ基、(シアノメチル)アミノカルボニルオキシ基、(2-シアノエチル)アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、ジエチルアミノカルボニルオキシ基、(メトキシメチル)メチルアミノカルボニルオキシ基、(2-メトキシエチル)メチルアミノカルボニルオキシ基、(シアノメチル)メチルアミノカルボニルオキシ基、(2-シアノエチル)メチルアミノカルボニルオキシ基、2,2-ジフルオロエチルアミノカルボニルオキシ基、2,2,2-トリフルオロエチルアミノカルボニルオキシ基、シクロプロピルアミノカルボニルオキシ基、(シクロプロピル)メチルアミノカルボニルオキシ基、ピロリジニルカルボニルオキシ基、またはピペリジニルカルボニルオキシ基であり、さらに好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、またはジエチルアミノカルボニルオキシ基である。 Rx1 of "Rx1C (= O) O-" in R4 of the formula (1) has the same meaning as defined above. “Rx1C (═O) O—” is preferably acetyloxy group, methoxyacetyloxy group, cyanoacetyloxy group, propionyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group, cyclopropanecarbonyloxy group, methoxy. Carbonyloxy group, ethoxycarbonyloxy group, 2,2-difluoroethoxycarbonyloxy group, 2,2,2-trifluoroethoxycarbonyloxy group, 3,3,3-trifluoropropyloxycarbonyloxy group, cyclopropyloxycarbonyl Oxy group, aminocarbonyloxy group, methylaminocarbonyloxy group, ethylaminocarbonyloxy group, (methoxymethyl) aminocarbonyloxy group, (2-methoxyethyl) aminocarbonyloxy group, (sia Methyl) aminocarbonyloxy group, (2-cyanoethyl) aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethylmethylaminocarbonyloxy group, diethylaminocarbonyloxy group, (methoxymethyl) methylaminocarbonyloxy group, (2-methoxyethyl ) Methylaminocarbonyloxy group, (cyanomethyl) methylaminocarbonyloxy group, (2-cyanoethyl) methylaminocarbonyloxy group, 2,2-difluoroethylaminocarbonyloxy group, 2,2,2-trifluoroethylaminocarbonyloxy group A group, a cyclopropylaminocarbonyloxy group, a (cyclopropyl) methylaminocarbonyloxy group, a pyrrolidinylcarbonyloxy group, or a piperidinylcarbonyloxy group, Preferably, acetyloxy group, methoxyacetyloxy group, cyanoacetyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group, methoxycarbonyloxy group, ethoxycarbonyloxy group, aminocarbonyloxy group, dimethylaminocarbonyloxy group, It is an ethylmethylaminocarbonyloxy group or a diethylaminocarbonyloxy group.
 式(1)のR4における「Rx2C(=O)N(Rx3)-」(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)の各用語は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。Rx2として、好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、エチル基、ジフルオロメチル基、トリフルオロメチル基、シクロプロピル基、メトキシ基、エトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、シクロプロピルオキシ基、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、ジフルオロメチル基、トリフルオロメチル基、メトキシ基、エトキシ基、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基である。また、Rx3として、好ましくは、水素原子、メチル基、メトキシメチル基、エトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2-エトキシエチル基、2-シアノエチル基、プロピル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、またはシクロプロピル基であり、さらに好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 “Rx2C (═O) N (Rx3) —” in R4 of the formula (1) (wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 A haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as defined above). Rx3 represents a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group). The terms are synonymous with the above definitions. Regarding the “C1 to C6 alkyl group optionally substituted with the substituent B”, in the case of having the substituent B, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B. . Rx2 is preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2,2-difluoroethoxy group, 2 , 2,2-trifluoroethoxy group, cyclopropyloxy group, amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2 -Cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group Group, 2,2-difluoroethylamino group, 2,2,2- Rifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group, or piperidinyl group, more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, difluoromethyl group, trifluoromethyl group, It is a fluoromethyl group, a methoxy group, an ethoxy group, an amino group, a dimethylamino group, an ethylmethylamino group, or a diethylamino group. Further, Rx3 is preferably hydrogen atom, methyl group, methoxymethyl group, ethoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-cyanoethyl group, propyl group, 2, 2-difluoroethyl group, 2,2,2-trifluoroethyl group, or cyclopropyl group, more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, It is a 2,2-difluoroethyl group or a 2,2,2-trifluoroethyl group.
 式(1)におけるR5は、前記に記載のR4と同義である。すなわち、水酸基、シアノ基、ニトロ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6ハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、またはRx2C(=O)N(Rx3)-(ここで、Rx2およびRx3は、前記と同義である。)を表す。 R5 in formula (1) has the same meaning as R4 described above. That is, a hydroxyl group, a cyano group, a nitro group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, and a C3 to C8 optionally substituted with a substituent C. A cycloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent C, a C2 to C6 haloalkenyl group, a C2 to C6 alkynyl group optionally substituted with a substituent C, a C2 to C6 Haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent C, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent C, substituent C A C2-C6 alkenyloxy group optionally substituted with, a C2-C6 haloalkenyloxy group, a C3-C6 alkynyloxy optionally substituted with a substituent C Group, C3 to C6 haloalkynyloxy group, RaRbN- (wherein Ra and Rb have the same meanings as described above), Rc-L- (wherein Rc and L have the same meanings as described above). , Rx1C (= O)-(where Rx1 is as defined above), Rx1C (= O) O- (where Rx1 is as defined above), or Rx2C (= O). N (Rx3)-(wherein Rx2 and Rx3 have the same meanings as described above).
 中でも、R5は、水酸基、シアノ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、またはRc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSOを表す。)が好ましく、
 特に、シアノ基、ハロゲン原子、または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基が好ましい。
Among them, R5 is a hydroxyl group, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a C2 to C6 optionally substituted with a substituent C. Alkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, a C1-C6 alkoxy group optionally substituted with a substituent C, a C1-C6 haloalkoxy group, or Rc-L -(Wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2 ),
Particularly, a cyano group, a halogen atom, or a C1 to C6 alkoxy group which may be appropriately substituted with a substituent C is preferable.
 式(1)のR5には、水酸基、シアノ基、およびニトロ基が含まれる。 R5 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
 式(1)のR5におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子であり、さらに好ましくは、フッ素原子、または塩素原子であり、特に好ましくは、フッ素原子である。 The halogen atom in R5 of the formula (1) has the same meaning as defined above, preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, more preferably a fluorine atom or a chlorine atom, and particularly preferably Preferred is a fluorine atom.
 式(1)のR5における「置換基Cで適宜置換されてもよいC1~C6のアルキル基」のC1~C6のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、またはエチル基である。置換基Cを有する場合、C1~C6のアルキル基における水素原子が、置換基Cによって任意に置換される。 The C1 to C6 alkyl group of the “C1 to C6 alkyl group optionally substituted by the substituent C” in R5 of the formula (1) has the same meaning as defined above, and preferably a methyl group or an ethyl group. , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group or an ethyl group. When it has a substituent C, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted by the substituent C.
 式(1)のR5における「C1~C6のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、3,3-ジフルオロプロピル基、または3,3,3-トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R5 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2. A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or It is a 2,2,2-trifluoroethyl group.
 式(1)のR5における「置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基」のC3~C8のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Cを有する場合、C3~C8のシクロアルキル基における水素原子が、置換基Cによって任意に置換される。 The C3 to C8 cycloalkyl group of the "C3 to C8 cycloalkyl group optionally substituted with the substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a cyclopropyl group. , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. When it has a substituent C, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
 式(1)のR5における「置換基Cで適宜置換されてもよいC2~C6のアルケニル基」のC2~C6のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、または3-ブテニル基であり、さらに好ましくは、ビニル基、1-プロペニル基、またはアリル基である。置換基Cを有する場合、C2~C6のアルケニル基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyl group in the "C2-C6 alkenyl group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group is more preferable, and a vinyl group, a 1-propenyl group, or an allyl group is more preferable. When it has a substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
 式(1)のR5における「C2~C6のハロアルケニル基」は、前記の定義と同義であり、好ましくは、2-フルオロビニル基、2,2-ジフルオロビニル基、2,2-ジクロロビニル基、3-フルオロアリル基、3,3-ジフルオロアリル基、または3,3-ジクロロアリル基であり、さらに好ましくは、2-フルオロビニル基、または2,2-ジフルオロビニル基である。
 式(1)のR5における「置換基Cで適宜置換されてもよいC2~C6のアルキニル基」のC2~C6のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、または3-ブチニル基であり、さらに好ましくは、エチニル基、1-プロピニル基、またはプロパルギル基である。置換基Cを有する場合、C2~C6のアルキニル基における水素原子が、置換基Cによって任意に置換される。
The “C2-C6 haloalkenyl group” for R5 in the formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group or a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, and more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
The C2-C6 alkynyl group of the "C2-C6 alkynyl group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group is more preferable, and an ethynyl group, a 1-propynyl group, or a propargyl group is more preferable. When it has a substituent C, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
 式(1)のR5における「C2~C6のハロアルキニル基」は、前記の定義と同義であり、好ましくは、3,3-ジフルオロ-1-プロピニル基、3,3,3-トリフルオロ-1-プロピニル基、4,4-ジフルオロ-1-ブチニル基、4,4-ジフルオロ-2-ブチニル基、4,4,4-トリフルオロ-1-ブチニル基、または4,4,4-トリフルオロ-2-ブチニル基であり、さらに好ましくは、3,3-ジフルオロ-1-プロピニル基、または3,3,3-トリフルオロ-1-プロピニル基である。 The "C2-C6 haloalkynyl group" for R5 in formula (1) has the same meaning as defined above, and is preferably a 3,3-difluoro-1-propynyl group or 3,3,3-trifluoro-1. -Propinyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- It is a 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group or a 3,3,3-trifluoro-1-propynyl group.
 式(1)のR5における「置換基Cで適宜置換されてもよいC1~C6のアルコキシ基」のC1~C6のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、またはイソプロピルオキシ基である。置換基Cを有する場合、C1~C6のアルコキシ基における水素原子が、置換基Cによって任意に置換される。置換基Cとして好ましくは、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C2~C6のアルコキシアルコキシ基、Rc-L-(ここで、RcおよびLは、前記と同義である。)であり、さらに好ましくは、シアノ基、C1~C6のアルコキシ基、またはRc-L-(ここで、RcおよびLは、前記と同義である。)である。置換基Cで置換されたC1~C6のアルコキシ基として好ましくは、シアノメトキシ基、シアノエトキシ基、メトキシメトキシ基、メトキシエトキシ基、エトキシメトキシ基、またはエトキシエトキシ基であり、さらに好ましくは、シアノメトキシ基、メトキシメトキシ基、またはメトキシエトキシ基である。 The C1 to C6 alkoxy group of the "C1 to C6 alkoxy group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a methoxy group or an ethoxy group. , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, or an isopropyloxy group. When it has a substituent C, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent C. The substituent C is preferably a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C2 to C6 alkoxyalkoxy group, or Rc-L- (wherein Rc And L are as defined above, and more preferably a cyano group, a C1 to C6 alkoxy group, or Rc-L- (wherein Rc and L are as defined above). is there. The C1-C6 alkoxy group substituted with the substituent C is preferably a cyanomethoxy group, a cyanoethoxy group, a methoxymethoxy group, a methoxyethoxy group, an ethoxymethoxy group, or an ethoxyethoxy group, and more preferably cyanomethoxy group. A group, a methoxymethoxy group, or a methoxyethoxy group.
 式(1)のR5における「C1~C6のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、または3,3,3-トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、または2,2,2-トリフルオロエトキシ基である。 The "C1-C6 haloalkoxy group" in R5 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2,2. 2-trifluoroethoxy group, 3,3-difluoropropyloxy group or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
 式(1)のR5における「置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基」のC3~C8のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Cを有する場合、C3~C8のシクロアルコキシ基における水素原子が、置換基Cによって任意に置換される。 The C3-C8 cycloalkoxy group of the "C3-C8 cycloalkoxy group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. When it has a substituent C, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent C.
 式(1)のR5における「置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基」のC2~C6のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、1-プロペニルオキシ基、アリルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、または3-ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、1-プロペニルオキシ基、またはアリルオキシ基であり、特に好ましくは、アリルオキシ基である。置換基Cを有する場合、C2~C6のアルケニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C2-C6 alkenyloxy group of the "C2-C6 alkenyloxy group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group or 3-butenyloxy group, more preferably vinyloxy group, 1-propenyloxy group or allyloxy group, particularly preferably, It is an allyloxy group. When it has a substituent C, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent C.
 式(1)のR5における「C2~C6のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、2-フルオロビニルオキシ基、2,2-ジフルオロビニルオキシ基、2,2-ジクロロビニルオキシ基、3-フルオロアリルオキシ基、3,3-ジフルオロアリルオキシ基、または3,3-ジクロロアリルオキシ基であり、さらに好ましくは、2-フルオロビニルオキシ基、または2,2-ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” for R5 in formula (1) has the same meaning as defined above, and is preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, or a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluoro group. It is a vinyloxy group.
 式(1)のR5における「置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基」のC3~C6のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、2-ブチニルオキシ基、または3-ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基、または2-ブチニルオキシ基であり、特に好ましくは、プロパルギルオキシ基である。置換基Cを有する場合、C3~C6のアルキニルオキシ基における水素原子が、置換基Cによって任意に置換される。 The C3 to C6 alkynyloxy group of the "C3 to C6 alkynyloxy group optionally substituted with a substituent C" in R5 of the formula (1) has the same meaning as defined above, and preferably a propargyloxy group. , 2-butynyloxy group, or 3-butynyloxy group, more preferably propargyloxy group, or 2-butynyloxy group, and particularly preferably propargyloxy group. When it has a substituent C, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent C.
 式(1)のR5における「C3~C6のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、4-クロロ-4,4-ジフルオロ-2-ブチニルオキシ基、4-ブロモ-4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基であり、さらに好ましくは、4,4-ジフルオロ-2-ブチニルオキシ基、または4,4,4-トリフルオロ-2-ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” for R5 in formula (1) has the same meaning as defined above, and is preferably 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro group. -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- It is a butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
 式(1)のR5における「RaRbN-」のRaおよびRbは、前記と同義である。RaおよびRbとして、好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、ピロリジニル基、またはピぺリジニル基である。「RaRbN-」として好ましくは、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、アミノ基、メチルアミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、またはピぺリジニル基である。 Ra and Rb of "RaRbN-" in R5 of the formula (1) are as defined above. As Ra and Rb, a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a pyrrolidinyl group, or a piperidinyl group is preferable. And more preferably a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B, a pyrrolidinyl group, or a piperidinyl group. Preferred as “RaRbN—” is amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2-cyanoethyl) amino group, dimethyl group. Amino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group, 2,2-difluoro It is an ethylamino group, a 2,2,2-trifluoroethylamino group, a cyclopropylamino group, a (cyclopropyl) methylamino group, a pyrrolidinyl group, or a piperidinyl group, more preferably an amino group, a methylamino group, or dimethyl. Amino group, ethylmethylamino group, diethylamino group A pyrrolidinyl group or piperidines lysinyl group.
 式(1)のR5における「Rc-L-」のRcおよびLは、前記と同義である。Rcとして、好ましくは、C1~C6のアルキル基である。Lとして、好ましくは、Sである。「Rc-L-」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、またはトリフルオロメタンスルホニル基であり、さらに好ましくは、メチルチオ基、メタンスルフィニル基、またはメタンスルホニル基である。 Rc and L of "Rc-L-" in R5 of the formula (1) have the same meaning as above. Rc is preferably a C1-C6 alkyl group. L is preferably S. "Rc-L-" is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, or a trifluoromethanesulfonyl group, and more preferably a methylthio group or a methanesulfinyl group. Or a methanesulfonyl group.
 式(1)のR5における「Rx1C(=O)-」のRx1は、前記の定義と同義である。「Rx1C(=O)-」として、好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、メチルアミノカルボニル基、エチルアミノカルボニル基、(メトキシメチル)アミノカルボニル基、(2-メトキシエチル)アミノカルボニル基、(シアノメチル)アミノカルボニル基、(2-シアノエチル)アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、(メトキシメチル)メチルアミノカルボニル基、(2-メトキシエチル)メチルアミノカルボニル基、(シアノメチル)メチルアミノカルボニル基、(2-シアノエチル)メチルアミノカルボニル基、2,2-ジフルオロエチルアミノカルボニル基、2,2,2-トリフルオロエチルアミノカルボニル基、シクロプロピルアミノカルボニル基、(シクロプロピル)メチルアミノカルボニル基、ピロリジニルカルボニル基、またはピペリジニルカルボニル基であり、さらに好ましくは、アセチル基、メトキシアセチル基、シアノアセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、またはジエチルアミノカルボニル基である。 Rx1 of "Rx1C (= O)-" in R5 of the formula (1) has the same meaning as defined above. “Rx1C (═O) —” is preferably an acetyl group, a methoxyacetyl group, a cyanoacetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropanecarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, 2 , 2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, methylaminocarbonyl group, ethylamino Carbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dimethylaminocarbonyl group, ethylmethyl Minocarbonyl group, diethylaminocarbonyl group, (methoxymethyl) methylaminocarbonyl group, (2-methoxyethyl) methylaminocarbonyl group, (cyanomethyl) methylaminocarbonyl group, (2-cyanoethyl) methylaminocarbonyl group, 2,2- A difluoroethylaminocarbonyl group, a 2,2,2-trifluoroethylaminocarbonyl group, a cyclopropylaminocarbonyl group, a (cyclopropyl) methylaminocarbonyl group, a pyrrolidinylcarbonyl group, or a piperidinylcarbonyl group, and Preferably, acetyl group, methoxyacetyl group, cyanoacetyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, ethoxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl. , Ethyl-methylaminocarbonyl group or diethylamino group.
 式(1)のR5における「Rx1C(=O)O-」のRx1は、前記の定義と同義である。Rx1として、好ましくは、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)であり、さらに好ましくは、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)である。「Rx1C(=O)O-」として、好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、プロピオニルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、シクロプロパンカルボニルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、2,2-ジフルオロエトキシカルボニルオキシ基、2,2,2-トリフルオロエトキシカルボニルオキシ基、3,3,3-トリフルオロプロピルオキシカルボニルオキシ基、シクロプロピルオキシカルボニルオキシ基、アミノカルボニルオキシ基、メチルアミノカルボニルオキシ基、エチルアミノカルボニルオキシ基、(メトキシメチル)アミノカルボニルオキシ基、(2-メトキシエチル)アミノカルボニルオキシ基、(シアノメチル)アミノカルボニルオキシ基、(2-シアノエチル)アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、ジエチルアミノカルボニルオキシ基、(メトキシメチル)メチルアミノカルボニルオキシ基、(2-メトキシエチル)メチルアミノカルボニルオキシ基、(シアノメチル)メチルアミノカルボニルオキシ基、(2-シアノエチル)メチルアミノカルボニルオキシ基、2,2-ジフルオロエチルアミノカルボニルオキシ基、2,2,2-トリフルオロエチルアミノカルボニルオキシ基、シクロプロピルアミノカルボニルオキシ基、(シクロプロピル)メチルアミノカルボニルオキシ基、ピロリジニルカルボニルオキシ基、またはピペリジニルカルボニルオキシ基であり、さらに好ましくは、アセチルオキシ基、メトキシアセチルオキシ基、シアノアセチルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、またはジエチルアミノカルボニルオキシ基である。 Rx1 of "Rx1C (= O) O-" in R5 of the formula (1) has the same meaning as defined above. Rx1 is preferably a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 halo. It is an alkoxy group, a C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as defined above), and more preferably a C1-C6 optionally substituted with a substituent B. It is an alkyl group, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group, or RaRbN— (wherein Ra and Rb are as defined above). “Rx1C (═O) O—” is preferably acetyloxy group, methoxyacetyloxy group, cyanoacetyloxy group, propionyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group, cyclopropanecarbonyloxy group, methoxy. Carbonyloxy group, ethoxycarbonyloxy group, 2,2-difluoroethoxycarbonyloxy group, 2,2,2-trifluoroethoxycarbonyloxy group, 3,3,3-trifluoropropyloxycarbonyloxy group, cyclopropyloxycarbonyl Oxy group, aminocarbonyloxy group, methylaminocarbonyloxy group, ethylaminocarbonyloxy group, (methoxymethyl) aminocarbonyloxy group, (2-methoxyethyl) aminocarbonyloxy group, (sia Methyl) aminocarbonyloxy group, (2-cyanoethyl) aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethylmethylaminocarbonyloxy group, diethylaminocarbonyloxy group, (methoxymethyl) methylaminocarbonyloxy group, (2-methoxyethyl ) Methylaminocarbonyloxy group, (cyanomethyl) methylaminocarbonyloxy group, (2-cyanoethyl) methylaminocarbonyloxy group, 2,2-difluoroethylaminocarbonyloxy group, 2,2,2-trifluoroethylaminocarbonyloxy group A group, a cyclopropylaminocarbonyloxy group, a (cyclopropyl) methylaminocarbonyloxy group, a pyrrolidinylcarbonyloxy group, or a piperidinylcarbonyloxy group, Preferably, acetyloxy group, methoxyacetyloxy group, cyanoacetyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group, methoxycarbonyloxy group, ethoxycarbonyloxy group, aminocarbonyloxy group, dimethylaminocarbonyloxy group, It is an ethylmethylaminocarbonyloxy group or a diethylaminocarbonyloxy group.
 式(1)のR5における「Rx2C(=O)N(Rx3)-」(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)の各用語は、前記の定義と同義である。なお、「置換基Bで適宜置換されてもよいC1~C6のアルキル基」に関しては、置換基Bを有する場合、C1~C6のアルキル基における水素原子が、置換基Bによって任意に置換される。Rx2として、好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、エチル基、ジフルオロメチル基、トリフルオロメチル基、シクロプロピル基、メトキシ基、エトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、シクロプロピルオキシ基、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、ジフルオロメチル基、トリフルオロメチル基、メトキシ基、エトキシ基、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基である。また、Rx3として、好ましくは、水素原子、メチル基、メトキシメチル基、エトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2-エトキシエチル基、2-シアノエチル基、プロピル基、2,2-ジフルオロエチル基、2,2,2-トリフルオロエチル基、またはシクロプロピル基であり、さらに好ましくは、水素原子、メチル基、メトキシメチル基、シアノメチル基、エチル基、2-メトキシエチル基、2,2-ジフルオロエチル基、または2,2,2-トリフルオロエチル基である。 “Rx2C (═O) N (Rx3) —” in R5 of the formula (1) (wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 A haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as defined above). Rx3 represents a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group). The terms are synonymous with the above definitions. Regarding the “C1 to C6 alkyl group optionally substituted with the substituent B”, in the case of having the substituent B, the hydrogen atom in the C1 to C6 alkyl group is optionally substituted with the substituent B. . Rx2 is preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2,2-difluoroethoxy group, 2 , 2,2-trifluoroethoxy group, cyclopropyloxy group, amino group, methylamino group, ethylamino group, (methoxymethyl) amino group, (2-methoxyethyl) amino group, (cyanomethyl) amino group, (2 -Cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2-cyanoethyl) methylamino group Group, 2,2-difluoroethylamino group, 2,2,2- Rifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group, or piperidinyl group, more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, difluoromethyl group, trifluoromethyl group, It is a fluoromethyl group, a methoxy group, an ethoxy group, an amino group, a dimethylamino group, an ethylmethylamino group, or a diethylamino group. Further, Rx3 is preferably hydrogen atom, methyl group, methoxymethyl group, ethoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-cyanoethyl group, propyl group, 2, 2-difluoroethyl group, 2,2,2-trifluoroethyl group, or cyclopropyl group, more preferably hydrogen atom, methyl group, methoxymethyl group, cyanomethyl group, ethyl group, 2-methoxyethyl group, It is a 2,2-difluoroethyl group or a 2,2,2-trifluoroethyl group.
 以下、式(1)中、R4およびR5を有するフェニル基について詳細に説明する。 Hereinafter, the phenyl group having R4 and R5 in the formula (1) will be described in detail.
 R4およびR5を有するフェニル基は、式(Y)
Figure JPOXMLDOC01-appb-C000012

で表される部分構造(ここで、R4およびR5は前記と同義であり、nは0~4の整数を表す。)を表す。
The phenyl group having R4 and R5 has the formula (Y)
Figure JPOXMLDOC01-appb-C000012

(Wherein R4 and R5 have the same meanings as described above, and n represents an integer of 0 to 4).
 式(Y)のnは、0~4の整数を表す。 N in the formula (Y) represents an integer of 0 to 4.
 式(Y)のnが2以上の場合、2以上のR5は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When n in the formula (Y) is 2 or more, two or more R 5 s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
 本明細書においてフェニル基のオルト位とは、式(Y)に示されるように、置換基R4があるフェニル基の位置を意味する。 In the present specification, the ortho position of the phenyl group means the position of the phenyl group having the substituent R4, as shown in the formula (Y).
 置換基R4がオルト位に位置したフェニル基は、本発明の特徴をなしている。 The phenyl group in which the substituent R4 is located at the ortho position is a feature of the present invention.
 式(Y)の好ましい置換基の組み合わせは、2-R4-フェニル基、2-R4-6-R5-フェニル基、2-R4-4-R5-フェニル基、2-R4-4-R5-6-R5-フェニル基、2-R4-3-R5-フェニル基、または2-R4-3-R5-4-R5-6-R5-フェニル基であり、さらに好ましい置換基の組み合わせは、2-R4-フェニル基、2-R4-6-R5-フェニル基、2-R4-4-R5-フェニル基、2-R4-4-R5-6-R5-フェニル基である。ここで例えば、「2-R4-6-R5-フェニル基」は、2位に置換基R4、6位に置換基R5を有する二置換フェニル基を意味し、以下の記載も同様である。 A preferred combination of the substituents of the formula (Y) is 2-R4-phenyl group, 2-R4-6-R5-phenyl group, 2-R4-4-R5-phenyl group, 2-R4-4-R5-6. A -R5-phenyl group, a 2-R4-3-R5-phenyl group, or a 2-R4-3-R5-4-R5-6-R5-phenyl group, and a more preferable combination of substituents is 2-R4. A phenyl group, a 2-R4-6-R5-phenyl group, a 2-R4-4-R5-phenyl group and a 2-R4-4-R5-6-R5-phenyl group. Here, for example, a “2-R4-6-R5-phenyl group” means a disubstituted phenyl group having a substituent R4 at the 2-position and a substituent R5 at the 6-position, and the following description is also the same.
 式(1)のXは、酸素原子、または硫黄原子を表す。好ましいXは、酸素原子である。 X in the formula (1) represents an oxygen atom or a sulfur atom. Preferred X is an oxygen atom.
 式(1)における破線部を含む結合は、
Figure JPOXMLDOC01-appb-C000013

で表される箇所を表す。
The bond including the broken line part in the equation (1) is
Figure JPOXMLDOC01-appb-C000013

Represents a portion represented by.
 式(1)における破線部を含む結合は、二重結合または単結合を表す。 The bond containing the broken line in formula (1) represents a double bond or a single bond.
 式(1)における破線部を含む結合が二重結合の場合は、式(1a)
Figure JPOXMLDOC01-appb-C000014

(式中、R1、R2、R4、R5、Het、X、およびnは、式(1)と同義である。)で表される化合物、またはその塩を表す。
When the bond containing the dashed line in Formula (1) is a double bond, Formula (1a)
Figure JPOXMLDOC01-appb-C000014

(In the formula, R1, R2, R4, R5, Het, X, and n have the same meanings as in formula (1).) Or a salt thereof.
 式(1)における破線部を含む結合が単結合の場合は、式(1b)
Figure JPOXMLDOC01-appb-C000015

(式中、R1、R2、R4、R5、Het、X、およびnは、式(1)と同義である。)で表される化合物、またはその塩を表す。
In the case where the bond including the broken line in the formula (1) is a single bond, the formula (1b)
Figure JPOXMLDOC01-appb-C000015

(In the formula, R1, R2, R4, R5, Het, X, and n have the same meanings as in formula (1).) Or a salt thereof.
 式(1b)におけるR2が水素原子以外の置換基の場合、R体もしくはS体のどちらか一方のみ、またはR体とS体との任意の割合の混合物である。 When R2 in the formula (1b) is a substituent other than a hydrogen atom, it is either the R isomer or the S isomer, or a mixture of the R isomer and the S isomer at an arbitrary ratio.
 式(1)の「置換基A」は、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、およびRc-L-(ここで、RcおよびLは、前記と同義である。)からなる群から選択される少なくとも1種を表す。 The “substituent A” in the formula (1) is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, RaRbN— (Wherein Ra and Rb have the same meanings as described above) and Rc-L- (wherein Rc and L have the same meanings as described above). .
 中でも置換基Aは、シアノ基、C1~C6のアルコキシ基、またはRc-L-(ここで、RcおよびLは、前記と同義である。)が好ましく、
 特に、シアノ基、またはC1~C6のアルコキシ基が好ましい。
Among them, the substituent A is preferably a cyano group, a C1-C6 alkoxy group, or Rc-L- (wherein Rc and L have the same meanings as described above),
Particularly, a cyano group or a C1-C6 alkoxy group is preferable.
 置換基Aの好ましい具体例に関しては、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基;
RaRbN-(ここで、RaおよびRbは、前記と同義である。)として、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、およびピペリジニル基;
ならびにRc-L-(ここで、RcおよびLは、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基である。
For preferred specific examples of the substituent A, a hydroxyl group; a cyano group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1 to C6 alkoxy group;
As the C1 to C6 haloalkoxy group, difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group, 2,2,2-trifluoroethoxy group, 3,3-difluoropropyloxy group, and 3,3 , 3-trifluoropropyloxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group;
As RaRbN- (wherein Ra and Rb have the same meanings as described above), an amino group, a methylamino group, an ethylamino group, a (methoxymethyl) amino group, a (2-methoxyethyl) amino group, (cyanomethyl) Amino group, (2-cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2 -Cyanoethyl) methylamino group, 2,2-difluoroethylamino group, 2,2,2-trifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group, and piperidinyl group;
And Rc-L- (wherein Rc and L are as defined above) as a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group. is there.
 置換基Aのさらに好ましい具体例に関しては、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基、
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基、
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基、
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基、
RaRbN-(ここで、RaおよびRbは、前記と同義である。)として、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基、
ならびにRc-L-(ここで、RcおよびLは、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基である。
For more preferred specific examples of the substituent A, a hydroxyl group; a cyano group;
As a C3 to C8 cycloalkyl group, a cyclopropyl group and a cyclobutyl group,
As a C1 to C6 alkoxy group, a methoxy group and an ethoxy group,
As the C1 to C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group,
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, and a cyclobutoxy group,
RaRbN- (wherein Ra and Rb are as defined above), a dimethylamino group, an ethylmethylamino group, and a diethylamino group,
And Rc-L- (wherein Rc and L have the same meanings as described above), a methylthio group, a methanesulfinyl group, and a methanesulfonyl group.
 式(1)の「置換基B」は、シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種を表す。 The “substituent B” in the formula (1) represents at least one selected from the group consisting of a cyano group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, and a C3 to C8 cycloalkoxy group. .
 中でも置換基Bは、シアノ基、またはC1~C6のアルコキシ基が好ましい。 Among them, the substituent B is preferably a cyano group or a C1-C6 alkoxy group.
 置換基Bの好ましい具体例に関しては、シアノ基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基である。
For preferred specific examples of the substituent B, a cyano group;
A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1 to C6 alkoxy group;
As the C1 to C6 haloalkoxy group, difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group, 2,2,2-trifluoroethoxy group, 3,3-difluoropropyloxy group, and 3,3 , 3-trifluoropropyloxy group;
Further, the C3-C8 cycloalkoxy group is a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
 置換基Bのさらに好ましい具体例に関しては、シアノ基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
ならびにC3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基が挙げられる。
For more preferred specific examples of the substituent B, a cyano group;
As a C1-C6 alkoxy group, a methoxy group and an ethoxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group;
Also, examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group and a cyclobutoxy group.
 式(1)の「置換基C」とは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種を表し、
 中でも置換基Cは、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C2~C6のアルコキシアルコキシ基、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、または1~2個の酸素原子を含む3~6員環の基が好ましく、
 特に、シアノ基、C1~C6のアルコキシ基、またはRc-L-(ここで、RcおよびLは、前記と同義である。)が好ましい。
The “substituent C” in the formula (1) means a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, C2. To C6 alkoxyalkoxy group, RaRbN- (wherein Ra and Rb are as defined above), Rc-L- (wherein Rc and L are as defined above), Rx1C (= O)-(wherein Rx1 has the same meaning as described above), and at least one selected from the group consisting of a group of 3 to 6 membered ring containing 1 to 2 oxygen atoms,
Among them, the substituent C is a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C2 to C6 alkoxyalkoxy group, Rc-L- (where Rc and L is as defined above, Rx1C (═O) — (wherein Rx1 has the same meaning as above), or a 3- to 6-membered ring group containing 1 to 2 oxygen atoms. Preferably
Particularly, a cyano group, a C1-C6 alkoxy group, or Rc-L- (wherein Rc and L have the same meanings as described above) is preferable.
 置換基Cの好ましい具体例に関しては、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基;
C1~C6のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、およびt-ブトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、3,3-ジフルオロプロピルオキシ基、および3,3,3-トリフルオロプロピルオキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基;
C2~C6のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、およびメトキシプロピルオキシ基;
RaRbN-(ここで、RaおよびRbは、前記と同義である。)として、アミノ基、メチルアミノ基、エチルアミノ基、(メトキシメチル)アミノ基、(2-メトキシエチル)アミノ基、(シアノメチル)アミノ基、(2-シアノエチル)アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、(メトキシメチル)メチルアミノ基、(2-メトキシエチル)メチルアミノ基、(シアノメチル)メチルアミノ基、(2-シアノエチル)メチルアミノ基、2,2-ジフルオロエチルアミノ基、2,2,2-トリフルオロエチルアミノ基、シクロプロピルアミノ基、(シクロプロピル)メチルアミノ基、ピロリジニル基、およびピペリジニル基;
Rc-L-(ここで、RcおよびLは、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基;
Rx1C(=O)-(ここで、Rx1は、前記と同義である。)として、ホルミル基、アセチル基、メトキシアセチル基、シアノアセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、3,3,3-トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、メチルアミノカルボニル基、エチルアミノカルボニル基、(メトキシメチル)アミノカルボニル基、(2-メトキシエチル)アミノカルボニル基、(シアノメチル)アミノカルボニル基、(2-シアノエチル)アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、(メトキシメチル)メチルアミノカルボニル基、(2-メトキシエチル)メチルアミノカルボニル基、(シアノメチル)メチルアミノカルボニル基、(2-シアノエチル)メチルアミノカルボニル基、2,2-ジフルオロエチルアミノカルボニル基、2,2,2-トリフルオロエチルアミノカルボニル基、シクロプロピルアミノカルボニル基、(シクロプロピル)メチルアミノカルボニル基、ピロリジニルカルボニル基、およびピペリジニルカルボニル基;
ならびに1~2個の酸素原子を含む3~6員環の基として、オキソラニル基、オキサニル基、1,3-ジオキソラニル基、および1,3-ジオキサニル基である。
For preferred specific examples of the substituent C, a hydroxyl group; a cyano group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group as the C1 to C6 alkoxy group;
As the C1 to C6 haloalkoxy group, difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group, 2,2,2-trifluoroethoxy group, 3,3-difluoropropyloxy group, and 3,3 , 3-trifluoropropyloxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group;
As a C2-C6 alkoxyalkoxy group, a methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, an ethoxyethoxy group, and a methoxypropyloxy group;
As RaRbN- (wherein Ra and Rb have the same meanings as described above), an amino group, a methylamino group, an ethylamino group, a (methoxymethyl) amino group, a (2-methoxyethyl) amino group, (cyanomethyl) Amino group, (2-cyanoethyl) amino group, dimethylamino group, ethylmethylamino group, diethylamino group, (methoxymethyl) methylamino group, (2-methoxyethyl) methylamino group, (cyanomethyl) methylamino group, (2 -Cyanoethyl) methylamino group, 2,2-difluoroethylamino group, 2,2,2-trifluoroethylamino group, cyclopropylamino group, (cyclopropyl) methylamino group, pyrrolidinyl group, and piperidinyl group;
Rc-L- (wherein Rc and L have the same meanings as described above) as a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group;
Rx1C (= O)-(wherein Rx1 has the same meaning as above), a formyl group, an acetyl group, a methoxyacetyl group, a cyanoacetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, and cyclopropane. Carbonyl group, methoxycarbonyl group, ethoxycarbonyl group, 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group , Aminocarbonyl group, methylaminocarbonyl group, ethylaminocarbonyl group, (methoxymethyl) aminocarbonyl group, (2-methoxyethyl) aminocarbonyl group, (cyanomethyl) aminocarbonyl group, (2-cyanoethyl) aminocarbonyl group, dime Ruaminocarbonyl group, ethylmethylaminocarbonyl group, diethylaminocarbonyl group, (methoxymethyl) methylaminocarbonyl group, (2-methoxyethyl) methylaminocarbonyl group, (cyanomethyl) methylaminocarbonyl group, (2-cyanoethyl) methylamino Carbonyl group, 2,2-difluoroethylaminocarbonyl group, 2,2,2-trifluoroethylaminocarbonyl group, cyclopropylaminocarbonyl group, (cyclopropyl) methylaminocarbonyl group, pyrrolidinylcarbonyl group, and piperidi Nylcarbonyl group;
In addition, examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group, and a 1,3-dioxanyl group.
 置換基Cのさらに好ましい具体例に関しては、水酸基;シアノ基;
C3~C8のシクロアルキル基として、シクロプロピル基、およびシクロブチル基;
C1~C6のアルコキシ基として、メトキシ基、およびエトキシ基;
C1~C6のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、2,2-ジフルオロエトキシ基、および2,2,2-トリフルオロエトキシ基;
C3~C8のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基;
C2~C6のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、およびエトキシエトキシ基;
RaRbN-(ここで、RaおよびRbは、前記と同義である。)として、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基;
Rc-L-(ここで、RcおよびLは、前記と同義である。)として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基;
Rx1C(=O)-(ここで、Rx1は、前記と同義である。)として、ホルミル基、アセチル基、メトキシアセチル基、シアノアセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、およびジエチルアミノカルボニル基;
ならびに1~2個の酸素原子を含む3~6員環の基として、1,3-ジオキソラニル基、および1,3-ジオキサニル基である。
For more preferable examples of the substituent C, a hydroxyl group; a cyano group;
As a C3 to C8 cycloalkyl group, a cyclopropyl group and a cyclobutyl group;
As a C1-C6 alkoxy group, a methoxy group and an ethoxy group;
As a C1-C6 haloalkoxy group, a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group and a cyclobutoxy group;
As a C2-C6 alkoxyalkoxy group, a methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, and an ethoxyethoxy group;
RaRbN- (wherein Ra and Rb have the same meanings as described above), as a dimethylamino group, an ethylmethylamino group, and a diethylamino group;
Rc-L- (wherein Rc and L are as defined above) as a methylthio group, a methanesulfinyl group, and a methanesulfonyl group;
Rx1C (═O) — (wherein Rx1 has the same meaning as above) is a formyl group, acetyl group, methoxyacetyl group, cyanoacetyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, ethoxy. A carbonyl group, an aminocarbonyl group, a dimethylaminocarbonyl group, an ethylmethylaminocarbonyl group, and a diethylaminocarbonyl group;
And a 3- to 6-membered ring group containing 1 to 2 oxygen atoms are a 1,3-dioxolanyl group and a 1,3-dioxanyl group.
 式(1)で表される化合物は、1個または2個の軸不斉を有することがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。 The compound represented by the formula (1) may have one or two axial chirality. The isomer ratio at this time is a single ratio or a mixing ratio of an arbitrary ratio, and is not particularly limited.
 式(1)で表される化合物は、不斉原子を含むことがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。 The compound represented by the formula (1) may contain an asymmetric atom. The isomer ratio at this time is a single ratio or a mixing ratio of an arbitrary ratio, and is not particularly limited.
 式(1)で表される化合物は、幾何異性体を含むことがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。 The compound represented by the formula (1) may include geometrical isomers. The isomer ratio at this time is a single ratio or a mixing ratio of an arbitrary ratio, and is not particularly limited.
 式(1)で表される化合物は、塩を形成できることがある。塩酸、硫酸、酢酸、フマル酸、マレイン酸のような酸塩や、ナトリウム、カリウム、カルシウムのような金属塩等が例示されるが、農園芸用殺菌剤として使用できる限り、特に限定されることはない。 The compound represented by the formula (1) may be capable of forming a salt. Acid salts such as hydrochloric acid, sulfuric acid, acetic acid, fumaric acid, and maleic acid, and metal salts such as sodium, potassium, and calcium are exemplified, but are not particularly limited as long as they can be used as agricultural and horticultural fungicides. There is no.
 以上説明したR1、R2、Het、R3、R4、R5、X、n、破線部を含む結合、置換基A、置換基B、および置換基Cにおける好ましい範囲を任意に組み合わせて得られる全ての化合物の範囲も本発明の式(1)の範囲として記載されているものとする。 All compounds obtained by arbitrarily combining the preferred ranges of R1, R2, Het, R3, R4, R5, X, n, the bond including the broken line portion, the substituent A, the substituent B, and the substituent C described above. The range of is also described as the range of the formula (1) of the present invention.
  次に、本発明の具体的な化合物は、表1に示す構造式P-1~P-28(ここで、表1中のXは酸素原子、または硫黄原子であり、破線部を含む結合は、二重結合または単結合を表す。)と、表2に示すY(ここで、Yは、R4およびR5を有するフェニル基を表す。)の構造式(Y-1~Y-216)と、表3に示すHet(ここで、Hetは前記と同義である。)(Het-1~Het-260)との組み合わせによって表される。これらの化合物は例示のためのものであって、本発明はこれらに限定されるものではない。 Next, specific compounds of the present invention are represented by structural formulas P-1 to P-28 shown in Table 1 (where X in Table 1 is an oxygen atom or a sulfur atom, and a bond including a broken line is Represents a double bond or a single bond) and the structural formula (Y-1 to Y-216) of Y shown in Table 2 (wherein Y represents a phenyl group having R4 and R5), It is represented by a combination with Het shown in Table 3 (where Het has the same meaning as above) (Het-1 to Het-260). These compounds are for illustration only and the invention is not limited thereto.
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000024
Figure JPOXMLDOC01-appb-T000024
Figure JPOXMLDOC01-appb-T000025
Figure JPOXMLDOC01-appb-T000025
Figure JPOXMLDOC01-appb-T000026
Figure JPOXMLDOC01-appb-T000026
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000029
 以下に、本発明の式(1)で表される化合物の製造方法を示す。本発明化合物の製造方法は、製造方法A~製造方法ALに限定されるものではない。 The method for producing the compound represented by the formula (1) of the present invention is shown below. The method for producing the compound of the present invention is not limited to the production methods A to AL.
[製造方法A]
Figure JPOXMLDOC01-appb-C000030

 式中、Yは、
Figure JPOXMLDOC01-appb-C000031

(ここで、R4、R5およびnは前記と同義である。)を表し、Z1はHet(ここで、Hetは前記と同義である。)、またはC1~C6のアルキル基を表し、R6は水素原子またはC1~C6のアルキル基を表し、R2、XおよびYは、前記と同義である。
[Production method A]
Figure JPOXMLDOC01-appb-C000030

In the formula, Y is
Figure JPOXMLDOC01-appb-C000031

(Wherein R4, R5 and n are as defined above), Z1 is Het (where Het is as defined above) or a C1 to C6 alkyl group, and R6 is hydrogen. Represents an atom or a C1 to C6 alkyl group, and R2, X and Y have the same meanings as defined above.
 製造方法Aは、本発明化合物の製造中間体である式(5)で表される化合物の製造方法であって、式(3)で表される化合物と式(4)で表される化合物とを、塩基存在下、溶媒中で反応させることを含む製造方法である。 The production method A is a method for producing a compound represented by the formula (5), which is an intermediate for producing the compound of the present invention, comprising a compound represented by the formula (3) and a compound represented by the formula (4). In a solvent in the presence of a base.
 本反応に使用する式(3)で表される化合物中、Z1がC1~C6のアルキル基で表される化合物は、市販品として入手したり、参考例や公知の方法を利用して製造することができる。 In the compound represented by the formula (3) used in this reaction, the compound in which Z1 is a C1 to C6 alkyl group is obtained as a commercial product, or produced by using a reference example or a known method. be able to.
 本反応に使用する式(3)で表される化合物中、Z1がHetで表される化合物は、市販品として入手したり、公知の方法を利用して製造することができる。また、グリーンケミストリー(Green Chemistry)、第41巻、580-585頁や、ザ ジャーナル オブ オルガニック ケミストリー(The Journal of Organic Chemistry)、第65巻、20号、6458-6461頁(2000).や、米国特許第5922718号等を参照にしても合成することができる。 Among the compounds represented by the formula (3) used in this reaction, the compound in which Z1 is Het can be obtained as a commercial product or can be produced by a known method. Also, Green Chemistry, Vol. 41, pp. 580-585, and The Journal of Organic Chemistry, Vol. 65, No. 20, 6458-6461 (2000). Alternatively, it can be synthesized by referring to US Pat. No. 5,922,718 and the like.
 本反応に使用する式(4)で表される化合物は、市販品として入手または公知の方法で製造することができる。 The compound represented by the formula (4) used in this reaction can be obtained as a commercial product or can be produced by a known method.
 本反応に使用する式(4)で表される化合物の量は、式(3)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上3当量以下である。 The amount of the compound represented by the formula (4) used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (3). However, it is usually 1 equivalent or more and 3 equivalents or less.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウムのような無機塩基類やナトリウムメトキシド、ナトリウムエトキシド、ナトリウム t-ブトキシド、カリウム t-ブトキシド等の金属アルコキシド類等である。 Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide, and potassium t-butoxide. Etc.
 本反応に使用する塩基の量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(3)で表される化合物に対して0.01当量以上3当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 0.01 equivalent or more and 3 equivalents or less with respect to the compound represented by the formula (3). Is.
 本反応に使用する溶媒は、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, a benzene solvent such as benzene, toluene, xylene, mesitylene, chlorobenzene or dichlorobenzene, Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl -2-Urea-based solvents such as imidazolidinone, halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, sulfur-based solvents such as dimethyl sulfoxide and sulfolane, acetone, methyl ethyl ketone, methyl Ketone solvents such as Sobuchiruketon like. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(3)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (3). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-50℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually -50 ° C or higher and 150 ° C or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(5)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (5) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(5)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (5) obtained above can be distilled under reduced pressure to remove the solvent.
 溶媒留去後に得られた式(5)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (5) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法B]
Figure JPOXMLDOC01-appb-C000032

 式中、R6aはC1~C6のアルキル基を表し、R2、X、YおよびZ1は、前記と同義である。
[Production method B]
Figure JPOXMLDOC01-appb-C000032

In the formula, R6a represents a C1 to C6 alkyl group, and R2, X, Y and Z1 have the same meanings as described above.
 製造方法Bは、式(5)で表される化合物のうち、式(5b)で表される製造中間体を得る方法であって、式(5a)で表される化合物を、酸性条件または塩基性条件下、溶媒中で反応させることを含む製造方法である。 The production method B is a method for obtaining a production intermediate represented by the formula (5b) among the compounds represented by the formula (5), wherein the compound represented by the formula (5a) is treated under an acidic condition or a base. The production method comprises reacting in a solvent under sexual conditions.
 まず、酸性条件の反応について説明する。 First, I will explain the reaction under acidic conditions.
 本反応に使用する酸は、塩酸、臭化水素酸、リン酸等の無機酸類や、酢酸、メタンスルホン酸、p-トルエンスルホン酸、トリフルオロ酢酸等の有機酸類が例示される。目的とする反応が進行する限り特に制限されることはない。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid, hydrobromic acid and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid. There is no particular limitation as long as the desired reaction proceeds.
 本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、式(5a)で表される化合物に対して0.01当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but is usually 0.01 with respect to the compound represented by the formula (5a). Equivalent or more. Further, a liquid acid can be used as a solvent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、酢酸、メタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an aqueous solvent, an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t- Butyl ether, dimethoxyethane, tetrahydrofuran, ether solvents such as dioxane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, acetic acid Ester solvents such as butyl, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, etc. U A solvent, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (5a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上180℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually 0 ° C. or higher and 180 ° C. or lower, or the boiling point of the solvent or lower.
 次に、塩基性条件の反応について説明する。 Next, I will explain the reaction under basic conditions.
 本反応に使用する塩基は、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等の無機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide and potassium hydroxide, but the base is not particularly limited as long as the intended reaction proceeds.
 本反応に使用する塩基の量は、式(5a)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上30当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (5a), but usually 1 equivalent It is above 30 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether such as water solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane. -Based solvents, alcohol-based solvents such as methanol, ethanol and isopropanol, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester-based solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitriles such as acetonitrile -Based solvent, amide-based solvent such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea-based solvent such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroe Down, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (5a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-20℃以上180℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -20 ° C or higher and 180 ° C or lower, or the boiling point of the solvent or lower.
 反応の後処理は、酸性条件での反応と塩基性条件の反応は共通の方法で行える。反応混合物に対して、水、もしくは適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 After the reaction, the reaction under acidic condition and the reaction under basic condition can be performed by the common method. Separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(5b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (5b) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(5b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (5b) obtained above can be distilled under reduced pressure to remove the solvent.
 溶媒留去後に得られた式(5b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (5b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
 式(5b)で表される化合物は、式(5b’)
Figure JPOXMLDOC01-appb-C000033

(式中、R2、X、YおよびZ1は、前記と同義である。)
で表される異性体も含む。
The compound represented by the formula (5b) is represented by the formula (5b ′)
Figure JPOXMLDOC01-appb-C000033

(In the formula, R2, X, Y and Z1 are as defined above.)
The isomer represented by is also included.
 式(5b’)で表される化合物は、式(5b)で表される化合物と同様に取り扱うことが可能であり、例えば、製造方法Cに適応することができる。また、式(5b’)で表される化合物は不斉炭素を含むが、その異性体混合比は、単独でも任意の割合の混合物でもよい。さらに、式(5b)で表される化合物と式(5b’)で表される化合物との混合物でもよく、その異性体混合比は、単独でも任意の割合の混合物でもよい。 The compound represented by the formula (5b ′) can be treated in the same manner as the compound represented by the formula (5b), and can be applied to, for example, the production method C. Further, the compound represented by the formula (5b ') contains an asymmetric carbon, and the mixing ratio of the isomers may be singly or a mixture having an arbitrary ratio. Further, it may be a mixture of the compound represented by the formula (5b) and the compound represented by the formula (5b '), and the isomer mixture ratio thereof may be a single or a mixture in an arbitrary ratio.
[製造方法C]
Figure JPOXMLDOC01-appb-C000034

 式中、R7は、水素原子、水酸基、シアノ基、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、R2、R6、X、YおよびZ1は、前記と同義である。
[Production method C]
Figure JPOXMLDOC01-appb-C000034

In the formula, R7 is a hydrogen atom, a hydroxyl group, a cyano group, a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a C3 to optionally substituted with a substituent A C8 cycloalkyl group, C2-C6 alkenyl group optionally substituted with substituent A, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent A, C2- C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent A, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent A, substituted A C2-C6 alkenyloxy group optionally substituted with a group A, a C2-C6 haloalkenyloxy group, a C3-C6 alkynyloxy group optionally substituted with a substituent A, C ~ Haloalkynyloxy group C6, or RaRbN- (wherein, Ra and Rb have the same meanings as defined above.) Represent, R2, R6, X, Y and Z1 are as defined above.
 製造方法Cは、本発明化合物の製造中間体である式(6)で表される化合物を得る方法であって、式(5)で表される化合物とR7NHとを、酸存在下で反応させることを含む製造方法である。 Production method C is a method for obtaining a compound represented by the formula (6), which is a production intermediate of the compound of the present invention, wherein the compound represented by the formula (5) is reacted with R7NH 2 in the presence of an acid. It is a manufacturing method including the following.
 本反応に使用するR7NHは、市販品として入手または公知の方法で製造することができる。R7NHは、塩酸、酢酸のような酸性化合物との塩を形成したものでもよく、目的とする反応が進行する限りにおいて特に限定されることはない。 R7NH 2 used in this reaction can be obtained as a commercial product or can be produced by a known method. R7NH 2 may be in the form of a salt with an acidic compound such as hydrochloric acid or acetic acid, and is not particularly limited as long as the desired reaction proceeds.
 本反応に使用するR7NHの量は、式(5)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上200当量以下である。 The amount of R7NH 2 used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (5), and is not particularly limited as long as the intended reaction proceeds, but it is usually It is 1 equivalent or more and 200 equivalents or less.
 本反応に使用する酸として、塩酸、硫酸等の無機酸類や、酢酸、メタンスルホン酸、p-トルエンスルホン酸等の有機酸類が例示され、目的とする反応が進行する限りにおいて特に限定することはないが、好ましくは、酢酸である。また、R7NHと酸性化合物との塩を使用する際には、酸の使用は必須ではない。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid and p-toluenesulfonic acid, and are not particularly limited as long as the intended reaction proceeds. No, but preferably acetic acid. When a salt of R7NH 2 and an acidic compound is used, the use of an acid is not essential.
 本反応に使用する酸の量は、R7NHに対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上200当量以下である。また、使用する酸が液体である場合には、溶媒として使用することも可能である。 The amount of the acid used in this reaction may be 1 equivalent or more based on R7NH 2 and is not particularly limited as long as the desired reaction proceeds, but is usually 1 equivalent to 200 equivalents. . When the acid used is a liquid, it can be used as a solvent.
 本反応には溶媒を使用することができるが、必ずしも必須ではない。 A solvent can be used in this reaction, but it is not always essential.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、酢酸、メタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。溶媒として、好ましくは、酸性系溶媒が挙げられ、さらに好ましくは、酢酸が挙げられる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy. Ether-based solvents such as ethane, tetrahydrofuran, dioxane, alcohol-based solvents such as methanol, ethanol, isopropanol, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, butyl acetate, etc. Ester-based solvents, nitrile-based solvents such as acetonitrile, amide-based solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and urea-based solvents such as 1,3-dimethyl-2-imidazolidinone Melting , Dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The solvent is preferably an acidic solvent, and more preferably acetic acid.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(5)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (5). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、50℃以上180℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(6)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (6) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(6)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The solvent of the reaction mixture containing the compound represented by the formula (6) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(6)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法D]
Figure JPOXMLDOC01-appb-C000035

 式中、Lvはメタンスルホニル基、トリフルオロメタンスルホニル基、p‐トルエンスルホニル基、ハロゲン原子等の脱離基を表し、R1、R2、X、YおよびZ1は、前記と同義である。
[Production method D]
Figure JPOXMLDOC01-appb-C000035

In the formula, Lv represents a leaving group such as a methanesulfonyl group, a trifluoromethanesulfonyl group, a p-toluenesulfonyl group, a halogen atom and the like, and R1, R2, X, Y and Z1 are as defined above.
 製造方法Dは、本発明化合物の製造中間体である式(6b)で表される化合物を得る方法であって、式(6a)で表される化合物とR1-Lvとを、塩基存在下、溶媒中で反応させることを含む製造方法である。 Production method D is a method for obtaining a compound represented by formula (6b) which is an intermediate for producing the compound of the present invention, wherein the compound represented by formula (6a) and R1-Lv are added in the presence of a base, It is a production method including reacting in a solvent.
 本発明の原料である式(6a)で表される化合物は、製造方法Cやジャーナル オブ ヘテロサイクリック ケミストリー(Journal of Heterocyclic Chemistry)、20巻、65-67項(1983)等の非特許文献を参照に合成することができる。 The compound represented by the formula (6a), which is a raw material of the present invention, is prepared by non-patent documents such as the production method C and Journal of Heterocyclic Chemistry, Volume 20, Item 65-67 (1983). Can be synthesized into a reference.
 本反応に使用するR1‐Lvは、市販品として入手または公知の方法で製造することができる。 R1-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
 本反応に使用する塩基として、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Examples of the base used in this reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and sodium hydride, but are not particularly limited as long as the intended reaction proceeds. It will not be done.
 本反応に使用する塩基の量は、式(6a)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (6a), and is not particularly limited as long as the intended reaction proceeds, but it is usually 1 It is equal to or more than 10 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Methanol, ethanol, alcohol solvents such as isopropanol, benzene, toluene, xylene, mesitylene, chlorobenzene, benzene solvents such as dichlorobenzene, ethyl acetate, isopropyl acetate, ester solvents such as butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (6a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(6b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (6b) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(6b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6b) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(6b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法E]
Figure JPOXMLDOC01-appb-C000036

 式中、SRは硫黄化剤を表し、R1、R2、YおよびZ1は、前記と同義である。
[Production method E]
Figure JPOXMLDOC01-appb-C000036

In the formula, SR represents a sulfurizing agent, and R1, R2, Y and Z1 are as defined above.
 製造方法Eは、式(6b)で表される化合物のうち、式(6b-2)で表される化合物を得る方法であって、式(6b-1)で表される化合物と硫黄化剤(SR)とを、溶媒中で反応させることを含む製造方法である。 The production method E is a method for obtaining the compound represented by the formula (6b-2) among the compounds represented by the formula (6b), wherein the compound represented by the formula (6b-1) and the sulfurizing agent are (SR) is a production method including reacting with (SR) in a solvent.
 本反応に使用する硫黄化剤としては、ローソン試薬(2,4-ビス(4-メトキシフェニル)-1,3-ジチア-2,4-ジホスフェタン-2,4-ジスルフィド)等が挙げられる。 Examples of the sulfurizing agent used in this reaction include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide).
 本反応に使用する硫黄化剤の量は、式(6b-1)で表される化合物に対して0.5当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上10当量以下である。 The amount of the sulfurizing agent used in this reaction may be 0.5 equivalent or more with respect to the compound represented by the formula (6b-1), and is not particularly limited as long as the intended reaction proceeds. However, it is usually 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6b-1)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (6b-1). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、50℃以上180℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水、もしくは適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応においては、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. In this reaction, a liquid separation operation is not essential.
 前記で得られた式(6b-2)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (6b-2) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(6b-2)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6b-2) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(6b-2)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6b-2) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法F]
Figure JPOXMLDOC01-appb-C000037

 式中、R2aは、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、またはRx1C(=O)-(ここで、Rx1は、前記と同義である。)を表し、R1、X、Y、Z1およびLvは、前記と同義である。
[Production method F]
Figure JPOXMLDOC01-appb-C000037

In the formula, R2a represents a C1 to C6 alkyl group optionally substituted by the substituent A, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted by the substituent A, a substituent A C2-C6 alkenyl group optionally substituted with A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent A, a C2-C6 haloalkynyl group, or Rx1C (= O)-(wherein Rx1 has the same meaning as described above), and R1, X, Y, Z1 and Lv have the same meaning as described above.
 製造方法Fは、式(6b)で表される化合物のうち、R2aが、置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、またはRx1C(=O)-(ここで、Rx1は、前記と同義である。)である、式(6b-4)で表される化合物を得る方法であって、式(6b-3)で表される化合物とR2a-Lvとを、塩基存在下、溶媒中で反応させることを含む製造方法である。 Production method F is the compound represented by formula (6b) in which R2a is optionally substituted with a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, or a substituent A. Optionally substituted C3 to C8 cycloalkyl group, optionally substituted C2 to C6 alkenyl group, C2 to C6 haloalkenyl group, optionally substituted C2 to C6 Is a alkynyl group of C2 to C6, or Rx1C (═O) — (where Rx1 has the same meaning as described above), and a compound represented by the formula (6b-4) Which is a production method comprising reacting a compound represented by the formula (6b-3) with R2a-Lv in a solvent in the presence of a base.
 本反応に使用するR2a-Lvは、市販品として入手または公知の方法で製造することができる。 R2a-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
 本反応に使用するR2a-Lvの量は、式(6b-3)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上1.8当量以下である。 The amount of R2a-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (6b-3), and is not particularly limited as long as the intended reaction proceeds. Usually, it is 1 equivalent or more and 1.8 equivalents or less.
 本反応に使用する塩基として、水素化ナトリウム等の金属ヒドリド類、メチルリチウム、ブチルリチウム、sec-ブチルリチウム、t-ブチルリチウム、ヘキシルリチウム等の有機リチウム類や、リチウムジイソプロピルアミド、ヘキサメチルジシラザンリチウム、ヘキサメチルジシラザンナトリウム、ヘキサメチルジシラザンカリウム等の金属アミド類が例示される。 As the base used in this reaction, metal hydrides such as sodium hydride, organic lithiums such as methyllithium, butyllithium, sec-butyllithium, t-butyllithium, and hexyllithium, lithium diisopropylamide, hexamethyldisilazane Examples are metal amides such as lithium, sodium hexamethyldisilazane, and potassium hexamethyldisilazane.
 本反応に使用する塩基の量は、式(6b-3)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (6b-3), and is not particularly limited as long as the intended reaction proceeds, but is usually It is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, and hydrocarbon-based solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6b-3)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (6b-3). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -80 ° C or higher and 100 ° C or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Add solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. Is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(6b-4)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (6b-4) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(6b-4)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (6b-4) obtained above can be distilled under reduced pressure to remove the solvent.
 溶媒留去後に得られた式(6b-4)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (6b-4) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法G]
Figure JPOXMLDOC01-appb-C000038

 式中、Oxは酸化剤を表し、R1、R2、X、YおよびZ1は、前記と同義である。
[Production method G]
Figure JPOXMLDOC01-appb-C000038

In the formula, Ox represents an oxidizing agent, and R1, R2, X, Y and Z1 are as defined above.
 製造方法Gは、本発明化合物の製造中間体である式(7)で表される化合物を得る方法であって、式(6b)で表される化合物と酸化剤(Ox)とを、溶媒中で反応させることを含む製造方法である。 The production method G is a method for obtaining a compound represented by the formula (7) which is an intermediate for producing the compound of the present invention, wherein the compound represented by the formula (6b) and the oxidizing agent (Ox) are mixed in a solvent. It is a manufacturing method including reacting with.
 本反応に使用する酸化剤としては、二酸化マンガン等の金属酸化物類、2,3-ジクロロ-5,6-ジシアノ-p-ベンゾキノン等のベンゾキノン類、アゾビスイソブチロニトリル、過酸化ベンゾイル等のラジカル開始剤とN-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン等のハロゲン化剤とを組み合わせたもの等を使用することができる。 Examples of the oxidizing agent used in this reaction include metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile and benzoyl peroxide. Radical initiator of N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3- A combination of a halogenating agent such as diiodo-5,5-dimethylhydantoin and the like can be used.
 以下、酸化剤が金属酸化物類である方法について説明する。 Hereafter, the method in which the oxidizing agent is a metal oxide will be described.
 本反応に使用する酸化剤の量は、式(6b)に表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上200当量以下である。 The amount of the oxidizing agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (6b), but it is usually 1 It is equal to or more than 200 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, Examples thereof include halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less by weight with respect to the compound represented by the formula (6b). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、溶解していない金属類を濾過することにより除去することが可能である。さらに、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応において、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to remove undissolved metals by filtering. Furthermore, a liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. In this reaction, a liquid separation operation is not essential.
 前記で得られた式(7)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(7)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
 以下、酸化剤がベンゾキノン類である方法について説明する。 The following describes the method in which the oxidant is a benzoquinone.
 本反応に使用する酸化剤の量は、式(6b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上20当量以下である。 The amount of the oxidizing agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more relative to the compound represented by the formula (6b), but it is usually 1 It is equal to or more than 20 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, Examples thereof include halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less by weight with respect to the compound represented by the formula (6b). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応において、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. In this reaction, a liquid separation operation is not essential.
 前記で得られた式(7)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(7)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
 以下、酸化剤がラジカル開始剤とハロゲン化剤との組み合わせである方法について説明する。 Described below is the method in which the oxidizing agent is a combination of a radical initiator and a halogenating agent.
 本反応に使用するラジカル開始剤とハロゲン化剤の量は、それぞれ、式(6b)で表される化合物に対して0.01当量以上と1.0当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはない。通常、ラジカル開始剤が0.01当量以上1当量以下であり、ハロゲン化剤が1当量以上3当量以下である。 If the amounts of the radical initiator and the halogenating agent used in this reaction are 0.01 equivalents or more and 1.0 equivalents or more, respectively, with respect to the compound represented by the formula (6b), the desired reaction proceeds. There is no particular limitation as long as it does. Usually, the amount of the radical initiator is from 0.01 to 1 equivalent, and the amount of the halogenating agent is from 1 to 3 equivalents.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、クロロベンゼン、ジクロロベンゼン等のハロゲン化ベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate. Examples thereof include solvents, halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon-based solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(6b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less by weight with respect to the compound represented by the formula (6b). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、20℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Add solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. Is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(7)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法H]
Figure JPOXMLDOC01-appb-C000039

 式中、R2bはハロゲン原子を表し、HalRはハロゲン化剤を表し、R1、Z1、XおよびYは前記と同義である。
[Production method H]
Figure JPOXMLDOC01-appb-C000039

In the formula, R2b represents a halogen atom, HalR represents a halogenating agent, and R1, Z1, X and Y have the same meanings as described above.
 製造方法Hは、R2bがハロゲン原子を表す、式(7b)で表される化合物を得る方法であって、式(7a)で表される化合物とハロゲン化剤(HalR)とを、溶媒中で反応させることを含む製造方法である。 Production method H is a method for obtaining a compound represented by formula (7b) in which R2b represents a halogen atom, wherein the compound represented by formula (7a) and a halogenating agent (HalR) are used in a solvent. It is a manufacturing method including reacting.
 本反応に使用するハロゲン化剤としては、セレクトフルオル(N-フルオロ-N’-クロロメチル-トリエチレンジアミン ビス(テトラフルオロボラート))、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As the halogenating agent used in this reaction, selectfluor (N-fluoro-N'-chloromethyl-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
 本反応に使用するハロゲン化剤の量は、式(7a)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。ただし、ヒダントインを含むハロゲン化剤の量は、0.5当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、通常、1当量以上5当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7a). It is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the desired reaction proceeds, as long as it is 0.5 equivalent or more, and is usually 1 equivalent to 5 equivalents.
 本反応に使用するハロゲン化剤がヨウ素化剤である場合、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸を加えることができる。 When the halogenating agent used in this reaction is an iodizing agent, add inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid. You can
 本反応に使用するハロゲン化剤がヨウ素化剤である場合に使用する酸の量は、式(7a)で表される化合物に対して0.01当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、0.1当量以上3当量以下である。 When the amount of the acid used when the halogenating agent used in this reaction is an iodizing agent is 0.01 equivalent or more with respect to the compound represented by the formula (7a), the desired reaction proceeds. The amount is not particularly limited as long as it is, but usually 0.1 equivalent or more and 3 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. , Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7a)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7a). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7b) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7b) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(7b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法I]
Figure JPOXMLDOC01-appb-C000040

 式中、Z2はハロゲン原子を表し、HalR、R1、R2、XおよびYは前記と同義である。
[Manufacturing method I]
Figure JPOXMLDOC01-appb-C000040

In the formula, Z2 represents a halogen atom, and HalR, R1, R2, X and Y have the same meanings as described above.
 製造方法Iは、Z2がハロゲン原子である、式(7d)で表される化合物を得る方法であって、式(7c)で表される化合物を、ラジカル開始剤とハロゲン化剤(HalR)を用いる反応に付すことを含む製造方法である。 Production method I is a method for obtaining a compound represented by formula (7d) in which Z2 is a halogen atom, wherein a compound represented by formula (7c) is added to a radical initiator and a halogenating agent (HalR). It is a production method including subjecting it to a reaction used.
 式(7d)中、好ましいZ2は、塩素原子、臭素原子、またはヨウ素原子である。 In the formula (7d), preferable Z2 is a chlorine atom, a bromine atom or an iodine atom.
 本反応に使用するラジカル開始剤は、アゾビスイソブチロニトリル、過酸化ベンゾイル等が挙げられる。 The radical initiator used in this reaction includes azobisisobutyronitrile, benzoyl peroxide and the like.
 本反応に使用するラジカル開始剤の量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7c)で表される化合物に対して0.01当量以上1.0当量以下である。 The amount of the radical initiator used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0.01 equivalent or more and 1 equivalent to the compound represented by the formula (7c). It is not more than 0.0 equivalent.
 本反応に使用するハロゲン化剤は、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン等が挙げられる。 The halogenating agent used in this reaction is N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin. , 1,3-diiodo-5,5-dimethylhydantoin and the like.
 本反応に使用するハロゲン化剤の量は、式(7c)で表される化合物に対して2当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、2当量以上2.8当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 2 equivalents or more with respect to the compound represented by the formula (7c). It is 2 equivalents or more and 2.8 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、クロロベンゼン、ジクロロベンゼン等のハロゲン化ベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate. Examples thereof include solvents, halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon-based solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7c)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7c). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、20℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Add solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. Is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7d)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7d) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7d)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7d) obtained above can be distilled under reduced pressure to remove the solvent.
 溶媒留去後に得られた式(7d)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法J]
Figure JPOXMLDOC01-appb-C000041

 式中、R1、R2、X、YおよびZ2は前記と同義である。
[Production method J]
Figure JPOXMLDOC01-appb-C000041

In the formula, R1, R2, X, Y and Z2 are as defined above.
 製造方法Jは、本発明化合物の製造中間体である式(7e)で表される化合物を得る方法であって、水存在下、式(7d)で表される化合物を加水分解することを含む製造方法である。 Production method J is a method for obtaining a compound represented by the formula (7e) which is a production intermediate of the compound of the present invention, and comprises hydrolyzing the compound represented by the formula (7d) in the presence of water. It is a manufacturing method.
 式(7d)中、好ましいZ2は、塩素原子、臭素原子、またはヨウ素原子である。 In the formula (7d), preferable Z2 is a chlorine atom, a bromine atom or an iodine atom.
 本反応には、水が必須である。また、本反応を円滑に進行させるために、硝酸銀を使用することができる。 -Water is essential for this reaction. Further, silver nitrate can be used in order to make the reaction proceed smoothly.
 本反応に使用する水の量は、式(7d)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて限定されることはない。また、水は溶媒として使用することができる。 The amount of water used in this reaction is not limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7d). Water can be used as a solvent.
 本反応に使用する硝酸銀の量は、式(7d)で表される化合物に対して2当量以上あれば、目的とする反応が進行する限りにおいて限定されることはなく、通常、2当量以上10当量以下である。 The amount of silver nitrate used in this reaction is not limited as long as the intended reaction proceeds, as long as it is 2 equivalents or more based on the compound represented by the formula (7d), and usually 2 equivalents or more 10 It is below the equivalent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、アセトニトリル等のニトリル系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether such as water solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane. Examples include system solvents and nitrile solvents such as acetonitrile. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7d)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7d). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-10℃以上100℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -10 ° C or higher and 100 ° C or lower or the boiling point of the solvent or lower.
 反応の後処理としては、溶解していない金属類を濾過することにより除去することが可能である。さらに、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to remove undissolved metals by filtering. Furthermore, a liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7e)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7e) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7e)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7e) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(7e)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7e) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法K]
Figure JPOXMLDOC01-appb-C000042

 式中、Z3は水素原子、シアノ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6ハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRc-L-(ここで、RcおよびLは、前記と同義である。)を表し、R1、R2、XおよびYは前記と同義である。
[Production method K]
Figure JPOXMLDOC01-appb-C000042

In the formula, Z3 is a hydrogen atom, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a C3 optionally substituted with a substituent C A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent C, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, C2-C6 Haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent C, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent C, substituent A C2-C6 alkenyloxy group optionally substituted by C, a C2-C6 haloalkenyloxy group, a C3-C6 alkynyloxy group optionally substituted by a substituent C, Haloalkynyloxy group of 3 ~ C6 or Rc-L-(wherein, Rc and L have the same meanings as defined above.), Represents, R1, R2, X and Y are as defined above.
 製造方法Kは、Z3が水素原子、シアノ基、ハロゲン原子、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6ハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、C2~C6のハロアルキニル基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRc-L-(ここで、RcおよびLは、前記と同義である。)である式(7f)で表される化合物を得る方法であって、式(7e)で表される化合物と有機金属試薬とを、溶媒中で反応させることを含む製造方法である。 In the production method K, Z3 may be optionally substituted with a hydrogen atom, a cyano group, a halogen atom, a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, or a substituent C. A C3 to C8 cycloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent C, a C2 to C6 haloalkenyl group, a C2 to C6 alkynyl group optionally substituted with a substituent C, C2 To C6 haloalkynyl group, C1 to C6 alkoxy group optionally substituted with substituent C, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group optionally substituted with substituent C, C2-C6 alkenyloxy group optionally substituted with substituent C, C2-C6 haloalkenyloxy group, C3-C6 alkynyl optionally substituted with substituent C A method for obtaining a compound represented by the formula (7f) which is an oxy group, a C3-C6 haloalkynyloxy group, or Rc-L- (wherein Rc and L have the same meanings as defined above). , A compound represented by the formula (7e) and an organometallic reagent are reacted in a solvent.
 本反応に使用する有機金属試薬としては、有機マグネシウムハロゲン化物(Z3-CH2-Mg-Hal:ここで、Halはハロゲン原子を表し、Z3は前記と同義である。)、有機リチウム試薬(Z3-CH2-Li:ここで、Z3は前記と同義である。)、有機マグネシウムハロゲン化物-亜鉛(II)アート錯体試薬([(Z3-CH2)3-Zn]-[Mg-Hal]+[Mg-(Hal)2]2:ここで、Z3およびHalは前記と同義である。)等が挙げられる。これらの有機金属試薬は、市販品として入手または公知の方法で製造することができる。 Examples of the organometallic reagent used in this reaction include organomagnesium halides (Z3-CH2-Mg-Hal: where Hal represents a halogen atom and Z3 has the same meaning as above) and organolithium reagents (Z3- CH2-Li: Here, Z3 has the same meaning as above.), Organomagnesium halide-zinc (II) ate complex reagent ([(Z3-CH2) 3-Zn]-[Mg-Hal] + [Mg- (Hal) 2] 2: Here, Z3 and Hal have the same meanings as described above. These organometallic reagents can be obtained as commercial products or can be produced by known methods.
 本反応に使用する有機金属試薬の量は、式(7e)で表される式に対して、1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the organometallic reagent used in this reaction may be 1 equivalent or more with respect to the formula (7e) and is not particularly limited as long as the intended reaction proceeds, Usually, it is 1 equivalent or more and 10 equivalents or less.
 反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in the reaction is not particularly limited as long as the desired reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, hexane, etc. , Hydrocarbon solvents such as heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7e)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7e). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -80 ° C or higher and 100 ° C or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- It is possible to add an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane and chloroform, a hydrocarbon solvent such as hexane, heptane, cyclohexane and methylcyclohexane, which is incompatible with water. It is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7f)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7f) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7f)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7f) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(7f)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7f) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法L]
Figure JPOXMLDOC01-appb-C000043

 式中、Ox’は酸化剤を表し、R1、R2、X、YおよびZ3は前記と同義である。
[Production method L]
Figure JPOXMLDOC01-appb-C000043

In the formula, Ox ′ represents an oxidizing agent, and R1, R2, X, Y and Z3 have the same meanings as described above.
 製造方法Lは、式(7g)で表される化合物を得る方法であって、式(7f)で表される化合物と酸化剤(Ox’)とを、溶媒中で反応させることを含む製造方法である。 Production method L is a method for obtaining a compound represented by formula (7g), which comprises reacting the compound represented by formula (7f) with an oxidizing agent (Ox ′) in a solvent. Is.
 本製造方法は、デス・マーチン酸化(Dess-Martin oxidation)、スワーン酸化(Swern oxidation)、パリック・デーリング酸化(Parikh-Doering oxidation)等のような当業者が通常使用する酸化方法で実施することができる。また、該酸化反応は、目的とする反応が進行する限りにおいて特に制限されることはない。ここでは、ジメチルスルホキシド、ピリジン-三酸化硫黄コンプレックスおよび塩基を溶媒中で使用するパリック・デーリング酸化の方法を説明する。 This production method should be carried out by an oxidation method commonly used by those skilled in the art, such as Dess-Martin oxidation, Swern oxidation, and Parich-Doering oxidation. You can The oxidation reaction is not particularly limited as long as the desired reaction proceeds. Here, the method of the Parrick-Daling oxidation using dimethyl sulfoxide, pyridine-sulfur trioxide complex and a base in a solvent is described.
 本反応に使用するジメチルスルホキシドの量は、式(7f)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、溶媒としても使用することもできる。 The amount of dimethyl sulfoxide used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7f), and it is also used as a solvent. You can also do it.
 本反応に使用するピリジン-三酸化硫黄コンプレックスの量は、式(7f)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、通常、1当量以上20当量以下である。 The amount of the pyridine-sulfur trioxide complex used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7f). Usually, it is 1 equivalent or more and 20 equivalents or less.
 本反応に使用する塩基は、トリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン等の有機アミン類等が挙げられる。 The base used in this reaction includes organic amines such as triethylamine, tributylamine, diisopropylethylamine and the like.
 本反応に使用する塩基の量は、式(7f)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、通常、1当量以上50当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7f), and usually 1 equivalent or more. It is 50 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド等の硫黄系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but dichloromethane, dichloroethane, chloroform, halogen-based solvents such as carbon tetrachloride, sulfur-based solvents such as dimethyl sulfoxide, etc. Can be mentioned. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7f)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7f). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-10℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -10 ° C or higher and 150 ° C or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- It is possible to add an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane and chloroform, a hydrocarbon solvent such as hexane, heptane, cyclohexane and methylcyclohexane, which is incompatible with water. It is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7g)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7 g) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7g)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7 g) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(7g)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7 g) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法M]
Figure JPOXMLDOC01-appb-C000044

 式中、Z4は、p‐トルエンスルホニル基、メチルエステル基、またはエチルエステル基を表し、R1、R2、X、YおよびZ3は前記と同義である。
[Manufacturing method M]
Figure JPOXMLDOC01-appb-C000044

In the formula, Z4 represents a p-toluenesulfonyl group, a methyl ester group, or an ethyl ester group, and R1, R2, X, Y, and Z3 have the same meanings as described above.
 製造方法Mは、式(7h)で表される化合物を得る方法であって、式(7g)で表される化合物とNHNH-Z4(ここで、Z4は前記と同義である。)を、酸存在下、溶媒中で反応させることを含む製造方法である。 The production method M is a method for obtaining the compound represented by the formula (7h), and the compound represented by the formula (7g) and NH 2 NH-Z4 (wherein Z4 has the same meaning as described above). The production method includes reacting in a solvent in the presence of an acid.
 本反応に使用するNHNH-Z4は、市販品として入手または公知の方法で製造できる。NHNH-Z4は、塩酸、硫酸のような酸性化合物との塩を形成したものでもよく、また、予め公知の方法により脱塩してからNHNH-Z4を使用することも可能である。 NH 2 NH-Z4 used in this reaction can be obtained as a commercially available product or can be produced by a known method. NH 2 NH-Z4 may be a salt formed with an acidic compound such as hydrochloric acid or sulfuric acid, or NH 2 NH-Z4 can be used after desalting by a known method in advance. .
 本反応に使用するNHNH-Z4の量は、式(7g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上20当量以下である。 The amount of NH 2 NH-Z4 used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7g). Usually, it is 1 equivalent or more and 20 equivalents or less.
 本反応に使用する酸は、酢酸、メタンスルホン酸、p-トルエンスルホン酸、トリフルオロ酢酸等の有機酸類等が挙げられる。 The acids used in this reaction include organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid.
 本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、式(7g)で表される化合物に対して0.1当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but is usually 0.1 with respect to the compound represented by the formula (7g). Equivalent or more. Further, a liquid acid can be used as a solvent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Methanol, ethanol, alcohol solvents such as isopropanol, benzene, toluene, xylene, mesitylene, chlorobenzene, benzene solvents such as dichlorobenzene, ethyl acetate, isopropyl acetate, ester solvents such as butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7g)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7g). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上180℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually 0 ° C. or higher and 180 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7h)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7h) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7h)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7h) obtained above can be distilled under reduced pressure to remove the solvent.
 溶媒留去後に得られた式(7h)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7h) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法N]
Figure JPOXMLDOC01-appb-C000045

 式中、R1、R2、X、Y、Z3およびZ4は前記と同義である。
[Manufacturing method N]
Figure JPOXMLDOC01-appb-C000045

In the formula, R1, R2, X, Y, Z3 and Z4 are as defined above.
 製造方法Nは、式(1)で表される本発明化合物のうち、式(1-a)で表される化合物を得る方法であって、式(7h)で表される化合物と塩化チオニルを溶媒中で反応させることを含む製造方法である。 The production method N is a method of obtaining the compound represented by the formula (1-a) among the compounds of the present invention represented by the formula (1), wherein the compound represented by the formula (7h) and thionyl chloride are It is a production method including reacting in a solvent.
 本反応に使用する塩化チオニルの量は、式(7h)で表される化合物に対して2当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、2当量以上20当量以下である。また、塩化チオニルは、溶媒として使用することもできる。 The amount of thionyl chloride used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 2 equivalents or more based on the compound represented by the formula (7h), but it is usually 2 It is equal to or more than 20 equivalents. Also, thionyl chloride can be used as a solvent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Methanol, ethanol, alcohol solvents such as isopropanol, benzene, toluene, xylene, mesitylene, chlorobenzene, benzene solvents such as dichlorobenzene, ethyl acetate, isopropyl acetate, ester solvents such as butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7h)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less by weight with respect to the compound represented by the formula (7h). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上180℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the desired reaction proceeds, but it is usually 0 ° C. or higher and 180 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-a)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-a) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-a)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-a) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(1-a)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-a) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法O]
Figure JPOXMLDOC01-appb-C000046

 式中、Z5はハロゲン原子を表し、R1、R2、Z3、X、YおよびHalRは前記と同義である。
[Production method O]
Figure JPOXMLDOC01-appb-C000046

In the formula, Z5 represents a halogen atom, and R1, R2, Z3, X, Y and HalR are as defined above.
 製造方法Oは、Z5がハロゲン原子を表す、式(7i)で表される化合物を得る方法であって、式(7g)で表される化合物とハロゲン化剤(HalR)とを、酸存在下、溶媒中で反応させることを含む製造方法である。 Production method O is a method for obtaining a compound represented by formula (7i) in which Z5 represents a halogen atom, wherein the compound represented by formula (7g) and a halogenating agent (HalR) are present in the presence of an acid. , A production method including reacting in a solvent.
 本反応に使用するハロゲン化剤としては、セレクトフルオル(N-フルオロ-N’-クロロメチル-トリエチレンジアミン ビス(テトラフルオロボラート))、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As the halogenating agent used in this reaction, selectfluor (N-fluoro-N'-chloromethyl-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
 本反応に使用するハロゲン化剤の量は、式(7g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。ただし、ヒダントインを含むハロゲン化剤の量は、0.5当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、通常、1当量以上5当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7g). It is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the desired reaction proceeds, as long as it is 0.5 equivalent or more, and is usually 1 equivalent to 5 equivalents.
 本反応に使用する酸は、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸等が挙げられる。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid.
 本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、式(7g)で表される化合物に対して0.1当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but is usually 0.1 with respect to the compound represented by the formula (7g). Equivalent or more. Further, a liquid acid can be used as a solvent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. , Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7g)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7g). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7i)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7i) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7i)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7i) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(7i)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7i) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法P]
Figure JPOXMLDOC01-appb-C000047

 式中、R1、R2、Z3、Z5、X、およびYは前記と同義である。
[Manufacturing method P]
Figure JPOXMLDOC01-appb-C000047

In the formula, R1, R2, Z3, Z5, X, and Y have the same meanings as described above.
 製造方法Pは、式(1)で表される本発明化合物のうち、式(1-b)で表される化合物を得る方法であって、式(7i)で表される化合物とチオウレアとを、溶媒中で反応させることを含む製造方法である。
 本反応に使用するチオウレアの量は、式(7i)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。
The production method P is a method for obtaining the compound represented by the formula (1-b) among the compounds of the present invention represented by the formula (1), wherein the compound represented by the formula (7i) and thiourea are combined. , A production method including reacting in a solvent.
The amount of thiourea used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more relative to the compound represented by the formula (7i), but usually 1 equivalent It is above 10 equivalents.
 本反応は、酸存在下で行うことが出来る。 This reaction can be performed in the presence of acid.
 本反応に使用する酸は、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸等が挙げられる。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid.
 本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、式(7i)で表される化合物に対して0.1当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but is usually 0.1 with respect to the compound represented by the formula (7i). Equivalent or more. Further, a liquid acid can be used as a solvent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. , Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7i)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7i). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-b)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-b) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-b)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-b) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1-b)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法Q]
Figure JPOXMLDOC01-appb-C000048

 式中、Z7は、水素原子、シアノ基、またはハロゲン原子を表し、R1、R2、Z3、X、およびYは前記と同義である。
[Production method Q]
Figure JPOXMLDOC01-appb-C000048

In the formula, Z7 represents a hydrogen atom, a cyano group, or a halogen atom, and R1, R2, Z3, X, and Y have the same meanings as described above.
 製造方法Qは、式(1)で表される本発明化合物のうち、式(1-c)で表される化合物を得る方法であって、式(1-b)で表される化合物と亜硝酸ナトリウムまたは亜硝酸エステル類とを酸存在下、溶媒中で反応させることを含む製造方法である。
 まず、式(1-c)で表される化合物中、Z7が水素原子である化合物の製造方法について説明する。
 本反応は酸存在下、亜硝酸ナトリウムとホスフィン酸との組み合わせで行うことが出来る。
 本反応に使用する亜硝酸ナトリウムの量は、式(1-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。
The production method Q is a method of obtaining the compound represented by the formula (1-c) among the compounds of the present invention represented by the formula (1), A production method comprising reacting sodium nitrate or nitrite with a solvent in the presence of an acid.
First, a method for producing a compound represented by formula (1-c) in which Z7 is a hydrogen atom will be described.
This reaction can be carried out in the presence of an acid, using a combination of sodium nitrite and phosphinic acid.
The amount of sodium nitrite used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). Usually, it is 1 equivalent or more and 10 equivalents or less.
 本反応に使用するホスフィン酸の量は、式(1-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上20当量以下である。
 本反応に使用する酸は、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸等が挙げられる。
The amount of phosphinic acid used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). It is 1 equivalent or more and 20 equivalents or less.
Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid.
 本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、式(1-b)で表される化合物に対して1当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but it is usually 1 with respect to the compound represented by the formula (1-b). Equivalent or more. Further, a liquid acid can be used as a solvent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. , Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is generally 3 times or more and 200 times or more the weight of the compound represented by the formula (1-b). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-c)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-c) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-c)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-c) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(1-c)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
 次に、式(1-c)で表される化合物中、Z7が水素原子である化合物について、亜硝酸エステル類を使用する製造方法について説明する。 Next, of the compounds represented by the formula (1-c), Z7 is a hydrogen atom, a production method using nitrites will be described.
 本反応に使用する亜硝酸エステル類は、目的とする反応が進行する限りにおいて特に限定されることはないが、亜硝酸メチル、亜硝酸エチル、亜硝酸イソアミル、亜硝酸イソブチル、亜硝酸イソプロピル、亜硝酸t-ブチル、亜硝酸n-プロピルおよび亜硝酸n-ブチル等が挙げられる。 Nitrite used in this reaction is not particularly limited as long as the intended reaction proceeds, methyl nitrite, ethyl nitrite, isoamyl nitrite, isobutyl nitrite, isopropyl nitrite, nitrite Examples thereof include t-butyl nitrate, n-propyl nitrite and n-butyl nitrite.
 本反応に使用する亜硝酸エステル類の量は、式(1-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上20当量以下である。 The amount of nitrites used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). Usually, it is 1 equivalent or more and 20 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. , Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is generally 3 times or more and 200 times or more the weight of the compound represented by the formula (1-b). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-c)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-c) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-c)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-c) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(1-c)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
 さらに、式(1-c)で表される化合物中、Z7がシアノ基、またはハロゲン原子である化合物の製造方法について説明する。
 本反応は酸存在下、亜硝酸ナトリウムと銅試薬、または無機塩との組み合わせで行うことが出来る。
 本反応に使用する亜硝酸ナトリウムの量は、式(1-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。
Further, a method for producing a compound represented by the formula (1-c) in which Z7 is a cyano group or a halogen atom will be described.
This reaction can be carried out in the presence of an acid, using a combination of sodium nitrite and a copper reagent or an inorganic salt.
The amount of sodium nitrite used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). Usually, it is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する銅試薬は、Z7がハロゲン原子の場合、塩化銅、臭化銅、およびヨウ化銅等のハロゲン原子を含む銅試薬類、Z7がシアノ基の場合、シアン化銅等のシアノ基を含む銅試薬類が挙げられる。 The copper reagent used in this reaction is a copper reagent containing a halogen atom such as copper chloride, copper bromide, and copper iodide when Z7 is a halogen atom, and a cyano group such as copper cyanide when Z7 is a cyano group. Copper reagents containing groups are mentioned.
 本反応に使用する銅試薬の量は、式(1-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上20当量以下である。
 本反応に使用する無機塩は、Z7がハロゲン原子の場合、塩化ナトリウム、臭化ナトリウム、ヨウ化ナトリウム、塩化カリウム、臭化カリウム、およびヨウ化カリウム等のハロゲン原子を含む無機塩類、Z7がシアノ基の場合、シアン化ナトリウムまたはシアン化カリウム等のシアノ基を含む無機塩類が挙げられる。
The amount of the copper reagent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). It is 1 equivalent or more and 20 equivalents or less.
When Z7 is a halogen atom, inorganic salts used in this reaction include halogen atoms such as sodium chloride, sodium bromide, sodium iodide, potassium chloride, potassium bromide, and potassium iodide, and Z7 is cyano. In the case of groups, inorganic salts containing a cyano group such as sodium cyanide or potassium cyanide can be mentioned.
 本反応に使用する無機塩の量は、式(1-b)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上20当量以下である。 The amount of the inorganic salt used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-b). It is 1 equivalent or more and 20 equivalents or less.
 本反応に使用する酸は、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸等が挙げられる。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid.
 本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、式(1-b)で表される化合物に対して1当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount and is not particularly limited as long as the intended reaction proceeds, but it is usually 1 with respect to the compound represented by the formula (1-b). Equivalent or more. Further, a liquid acid can be used as a solvent.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. , Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-b)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is generally 3 times or more and 200 times or more the weight of the compound represented by the formula (1-b). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の、水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- Solvents that are incompatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. Can be added. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-c)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-c) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-c)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-c) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(1-c)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-c) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法R]
Figure JPOXMLDOC01-appb-C000049

 式中、Z6は、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6ハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基であり、R1、R2、XおよびYは前記と同義である。
[Production method R]
Figure JPOXMLDOC01-appb-C000049

In the formula, Z6 is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent A C2-C6 alkenyl group optionally substituted with C, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, or a C2-C6 haloalkynyl group, R1, R2, X and Y are as defined above.
 製造方法Rは、Z6が置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6ハロアルケニル基、置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基である式(7k)で表される化合物を得る方法であって、式(7j)で表される化合物と有機金属試薬とを、溶媒中で反応させることを含む製造方法である。 In the production method R, Z6 is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent A C2-C6 alkenyl group optionally substituted with a group C, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, or a C2-C6 haloalkynyl group. A method for obtaining the compound represented by the formula (7k), which is a production method comprising reacting the compound represented by the formula (7j) with an organometallic reagent in a solvent.
 本反応に使用する式(7j)で表される化合物は、参考例を参照にして入手することができる。 The compound represented by the formula (7j) used in this reaction can be obtained by referring to Reference Examples.
 本反応に使用する有機金属試薬としては、有機マグネシウムハロゲン化物(Z6-Mg-Hal:ここで、Halはハロゲン原子を表し、Z6は前記と同義である。)、有機リチウム試薬(Z6-Li:ここで、Z6は前記と同義である。)、有機マグネシウムハロゲン化物-亜鉛(II)アート錯体試薬([(Z6)3-Zn]-[Mg-Hal]+[Mg‐(Hal)2]2:ここで、Z6およびHalは前記と同義である。)等が挙げられる。これらの有機金属試薬は、市販品として入手または公知の方法で製造することができる。 The organometallic reagent used in this reaction includes organomagnesium halides (Z6-Mg-Hal: where Hal represents a halogen atom and Z6 has the same meaning as described above) and organolithium reagents (Z6-Li: Here, Z6 is as defined above.), Organomagnesium halide-zinc (II) ate complex reagent ([(Z6) 3-Zn]-[Mg-Hal] + [Mg- (Hal) 2] 2 : Here, Z6 and Hal have the same meanings as described above.) And the like. These organometallic reagents can be obtained as commercial products or can be produced by known methods.
 本反応に使用する有機金属試薬の量は、式(7j)で表される式に対して、1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、通常、1当量以上10当量以下である。 The amount of the organometallic reagent used in this reaction may be 1 equivalent or more with respect to the formula (7j), and is not particularly limited as long as the intended reaction proceeds, Usually, it is 1 equivalent or more and 10 equivalents or less.
 反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in the reaction is not particularly limited as long as the desired reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, hexane, etc. , Hydrocarbon solvents such as heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(7j)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (7j). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -80 ° C or higher and 100 ° C or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- It is possible to add an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane and chloroform, a hydrocarbon solvent such as hexane, heptane, cyclohexane and methylcyclohexane, which is incompatible with water. It is possible. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(7k)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (7k) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(7k)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (7k) obtained above can be distilled under reduced pressure to remove the solvent.
 溶媒留去後に得られた式(7k)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (7k) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法S]
Figure JPOXMLDOC01-appb-C000050

 式中、Ox’’は酸化剤を表し、R1、R2、X、YおよびZ6は前記と同義である。
[Manufacturing method S]
Figure JPOXMLDOC01-appb-C000050

In the formula, Ox ″ represents an oxidizing agent, and R1, R2, X, Y and Z6 have the same meanings as described above.
 製造方法Sは、式(7L)で表される化合物を得る方法であって、式(7k)で表される化合物と酸化剤(Ox’’)とを、溶媒中で反応させることを含む製造方法である。 Production method S is a method for obtaining a compound represented by the formula (7L), which comprises reacting the compound represented by the formula (7k) with an oxidizing agent (Ox ″) in a solvent. Is the way.
 本製造方法は、デス・マーチン酸化(Dess-Martin oxidation)、スワーン酸化(Swern oxidation)、パリック・デーリング酸化(Parikh-Doering oxidation)等のような当業者が通常使用する酸化方法で実施することができる。また、該酸化反応は、目的とする反応が進行する限りにおいて特に制限されることはない。
 製造方法Lにおける式(7f)で表される化合物を、式(7k)で表される化合物に代えて使用することにより、製造方法Lに準じて製造方法Sを実施することができる。
This production method should be carried out by an oxidation method commonly used by those skilled in the art, such as Dess-Martin oxidation, Swern oxidation, and Parich-Doering oxidation. You can The oxidation reaction is not particularly limited as long as the desired reaction proceeds.
By using the compound represented by the formula (7f) in the production method L instead of the compound represented by the formula (7k), the production method S can be carried out according to the production method L.
[製造方法T]
Figure JPOXMLDOC01-appb-C000051

 式中、R1、R2、X、Y、Z4およびZ6は前記と同義である。
[Manufacturing method T]
Figure JPOXMLDOC01-appb-C000051

In the formula, R1, R2, X, Y, Z4 and Z6 are as defined above.
 製造方法Tは、式(7m)で表される化合物を得る方法であって、式(7L)で表される化合物とNHNH-Z4(ここで、Z4は前記と同義である。)を、酸存在下、溶媒中で反応させることを含む製造方法である。 The production method T is a method for obtaining the compound represented by the formula (7m), wherein the compound represented by the formula (7L) and NH 2 NH-Z4 (wherein Z4 has the same meaning as described above). The production method includes reacting in a solvent in the presence of an acid.
 本反応に使用するNHNH-Z4は、市販品として入手または公知の方法で製造できる。NHNH-Z4は、塩酸、硫酸のような酸性化合物との塩を形成したものでもよく、また、予め公知の方法により脱塩してからNHNH-Z4を使用することも可能である。 NH 2 NH-Z4 used in this reaction can be obtained as a commercially available product or can be produced by a known method. NH 2 NH-Z4 may be a salt formed with an acidic compound such as hydrochloric acid or sulfuric acid, or NH 2 NH-Z4 can be used after desalting by a known method in advance. .
 本反応に使用するNHNH-Z4の量は、式(7L)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、1当量以上20当量以下である。 The amount of NH 2 NH—Z4 used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (7L). Usually, it is 1 equivalent or more and 20 equivalents or less.
 本反応に使用する酸は、酢酸、メタンスルホン酸、p-トルエンスルホン酸、トリフルオロ酢酸等の有機酸類等が挙げられる。 The acids used in this reaction include organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid and trifluoroacetic acid.
 製造方法Mにおける式(7g)で表される化合物を、式(7L)で表される化合物に代えて使用することにより、製造方法Mに準じて製造方法Tを実施することができる。 By using the compound represented by the formula (7g) in the production method M in place of the compound represented by the formula (7L), the production method T can be carried out according to the production method M.
[製造方法U]
Figure JPOXMLDOC01-appb-C000052

 式中、R1、R2、X、Y、Z4およびZ6は前記と同義である。
[Manufacturing method U]
Figure JPOXMLDOC01-appb-C000052

In the formula, R1, R2, X, Y, Z4 and Z6 are as defined above.
 製造方法Uは、式(1)で表される本発明化合物のうち、式(1-d)で表される化合物を得る方法であって、式(7m)で表される化合物と塩化チオニルを溶媒中で反応させることを含む製造方法である。 The production method U is a method for obtaining the compound represented by the formula (1-d) among the compounds of the present invention represented by the formula (1), wherein the compound represented by the formula (7m) and thionyl chloride are It is a production method including reacting in a solvent.
 本反応に使用する塩化チオニルの量は、式(7m)で表される化合物に対して2当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、2当量以上20当量以下である。また、塩化チオニルは、溶媒として使用することもできる。 The amount of thionyl chloride used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 2 equivalents or more based on the compound represented by the formula (7m), but usually 2 It is equal to or more than 20 equivalents. Also, thionyl chloride can be used as a solvent.
 製造方法Nにおける式(7h)で表される化合物を、式(7m)で表される化合物に代えて使用することにより、製造方法Nに準じて製造方法Uを実施することができる。 By using the compound represented by the formula (7h) in the production method N in place of the compound represented by the formula (7m), the production method U can be carried out according to the production method N.
[製造方法V]
Figure JPOXMLDOC01-appb-C000053

 式中、R1、R2、Z5、Z6、X、YおよびHalRは前記と同義である。
[Manufacturing method V]
Figure JPOXMLDOC01-appb-C000053

In the formula, R1, R2, Z5, Z6, X, Y and HalR are as defined above.
 製造方法Vは、Z5がハロゲン原子を表す、式(7n)で表される化合物を得る方法であって、式(7L)で表される化合物とハロゲン化剤(HalR)とを、酸存在下、溶媒中で反応させることを含む製造方法である。 Production method V is a method for obtaining a compound represented by formula (7n), in which Z5 represents a halogen atom, wherein the compound represented by formula (7L) and a halogenating agent (HalR) are present in the presence of an acid. , A production method including reacting in a solvent.
 本反応に使用するハロゲン化剤としては、セレクトフルオル(N-フルオロ-N’-クロロメチル-トリエチレンジアミン ビス(テトラフルオロボラート))、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As the halogenating agent used in this reaction, selectfluor (N-fluoro-N'-chloromethyl-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
 製造方法Oにおける式(7g)で表される化合物を、式(7L)で表される化合物に代えて使用することにより、製造方法Oに準じて製造方法Vを実施することができる。 By using the compound represented by the formula (7g) in the production method O instead of the compound represented by the formula (7L), the production method V can be carried out according to the production method O.
[製造方法W]
Figure JPOXMLDOC01-appb-C000054

 式中、R1、R2、Z5、Z6、X、およびYは前記と同義である。
[Production method W]
Figure JPOXMLDOC01-appb-C000054

In the formula, R1, R2, Z5, Z6, X, and Y have the same meanings as described above.
 製造方法Wは、式(1)で表される本発明化合物のうち、式(1-e)で表される化合物を得る方法であって、式(7n)で表される化合物とチオウレアとを、溶媒中で反応させることを含む製造方法である。 The production method W is a method for obtaining the compound represented by the formula (1-e) among the compounds of the present invention represented by the formula (1), wherein the compound represented by the formula (7n) and thiourea are combined. , A production method including reacting in a solvent.
 製造方法Pにおける式(7i)で表される化合物を、式(7n)で表される化合物に代えて使用することにより、製造方法Pに準じて製造方法Wを実施することができる。 By using the compound represented by the formula (7i) in the production method P instead of the compound represented by the formula (7n), the production method W can be carried out according to the production method P.
[製造方法X]
Figure JPOXMLDOC01-appb-C000055

 式中、R1、R2、Z6、Z7、X、およびYは前記と同義である。
[Production method X]
Figure JPOXMLDOC01-appb-C000055

In the formula, R1, R2, Z6, Z7, X, and Y have the same meanings as described above.
 製造方法Xは、式(1)で表される本発明化合物のうち、式(1-f)で表される化合物を得る方法であって、式(1-e)で表される化合物と亜硝酸ナトリウムまたは亜硝酸エステル類とを酸存在下、溶媒中で反応させることを含む製造方法である。 The production method X is a method of obtaining the compound represented by the formula (1-f) among the compounds of the present invention represented by the formula (1), and the compound represented by the formula (1-e) is A production method comprising reacting sodium nitrate or nitrite with a solvent in the presence of an acid.
 製造方法Qにおける式(1-b)で表される化合物を、式(1-e)で表される化合物に代えて使用することにより、製造方法Qに準じて製造方法Xを実施することができる。 By using the compound represented by formula (1-b) in production method Q in place of the compound represented by formula (1-e), production method X can be carried out according to production method Q. it can.
[製造方法Y]
Figure JPOXMLDOC01-appb-C000056

 式中、Jは酸素原子または硫黄原子を表し、Jが酸素原子の場合、R2cは置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC3~C6のアルキニル基、またはC3~C6のハロアルキニル基を表し、Jが硫黄原子の場合、R2cはC1~C6のアルキル基またはC1~C6のハロアルキル基を表し、Qは水素原子または金属を表し、R1、Het、R2b、XおよびYは前記と同義である。
[Production method Y]
Figure JPOXMLDOC01-appb-C000056

In the formula, J represents an oxygen atom or a sulfur atom, and when J is an oxygen atom, R2c is a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, or a substituent A. An optionally substituted C3 to C8 cycloalkyl group, an optionally substituted C2 to C6 alkenyl group, an optionally substituted C2 to C6 haloalkenyl group, an optionally substituted C3 To C6 alkynyl group or C3 to C6 haloalkynyl group, when J is a sulfur atom, R2c represents a C1 to C6 alkyl group or a C1 to C6 haloalkyl group, and Q represents a hydrogen atom or a metal. , R1, Het, R2b, X and Y are as defined above.
 製造方法Yは、式(1a)で表される化合物のうち、Jは酸素原子または硫黄原子を表し、Jが酸素原子の場合、R2cが置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Aで適宜置換されてもよいC3~C6のアルキニル基、またはC3~C6のハロアルキニル基を表し、Jが硫黄原子の場合、R2cはC1~C6のアルキル基またはC1~C6のハロアルキル基を表す式(1-h)で表される化合物の合成法であって、式(1-g)で表される化合物とR2c-J-Qとを、遷移金属類および塩基の存在下、溶媒中で反応させるカップリング反応によって得ることを含む製造方法である。 Production method Y is a compound represented by formula (1a), wherein J represents an oxygen atom or a sulfur atom, and when J is an oxygen atom, R2c is a C1 to C6 which may be optionally substituted with a substituent A. An alkyl group, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent A, a C2 to C6 alkenyl group optionally substituted with a substituent A, a C2 to C6 halo. An alkenyl group, a C3 to C6 alkynyl group which may be optionally substituted with a substituent A, or a C3 to C6 haloalkynyl group, and when J is a sulfur atom, R2c is a C1 to C6 alkyl group or C1 to C6 In the presence of a transition metal and a base, wherein R2c-JQ and a compound represented by formula (1-g) are represented by the formula (1-h) Under the solvent Is a manufacturing method comprising obtained by a coupling reaction that.
 式(1-g)で表される化合物中、好ましいR2bは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1-g), preferable R2b is chlorine atom, bromine atom or iodine atom.
 本反応に使用するR2c-J-Qは、市販品として入手または公知の方法で製造できる。好ましいQは、水素原子、または、ナトリウム、カリウム等のアルカリ金属類である。 R2c-JQ used in this reaction can be obtained as a commercial product or can be produced by a known method. Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
 本反応に使用するR2c-J-Qの量は、式(1-g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはない。Qが水素原子のときは、溶媒としても使用可能である。 The amount of R2c-JQ used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is at least 1 equivalent relative to the compound represented by the formula (1-g). . When Q is a hydrogen atom, it can be used also as a solvent.
 本反応に使用する遷移金属類は、配位子を有してよく、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類等である。 The transition metals used in this reaction may have a ligand, and include palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladium compounds such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
 本反応に使用する遷移金属類の量は、式(1-g)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. There is no such thing.
 本反応を効率的に進行させるために、トリフェニルホスフィン、1,1’-ビス(ジフェニルホスフィノ)フェロセン、2-ジシクロヘキシルホスフィノ-2’4’6’-トリイソプロピルビフェニル、2-ジ-t-ブチルホスフィノ-2’4’6’-トリイソプロピルビフェニル等のホスフィン配位子を添加することができる。 In order to proceed this reaction efficiently, triphenylphosphine, 1,1′-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2′4′6′-triisopropylbiphenyl, 2-di-t A phosphine ligand such as -butylphosphino-2'4'6'-triisopropylbiphenyl can be added.
 本反応に使用するホスフィン配位子の量は、式(1-g)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. It will not be done.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウムのような無機塩基類やトリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン等の有機塩基類等である。 The bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate, and organic bases such as triethylamine, tributylamine and diisopropylethylamine.
 本反応に使用する塩基の量は、式(1-g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上50当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g), but is preferably It is 1 equivalent or more and 50 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、R2c-J-H(式中、R2cは前記と同義であり、Jは酸素原子である。)で表されるアルコール溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but R2c-JH (wherein R2c has the same meaning as described above and J is an oxygen atom). ) Alcohol solvent represented by), diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, ether solvent such as dioxane, benzene solvent such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc. Is mentioned. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-g)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-g). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、30℃以上200℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, or a saline solution Etc. can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by performing a filtration operation.
 前記で得られた式(1-h)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-h) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-h)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-h) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(1-h)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-h) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法Z]
Figure JPOXMLDOC01-appb-C000057

 式中、R2dは置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基を表し、R2d-Bは有機ボロン酸類を表し、R1、Het、R2b、XおよびYは前記と同義である。
[Production method Z]
Figure JPOXMLDOC01-appb-C000057

In the formula, R2d is a C1 to C6 alkyl group optionally substituted with a substituent A, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent A, a substituent A Represents a C2-C6 alkenyl group which may be optionally substituted with, or a C2-C6 haloalkenyl group, R2d-B represents an organic boronic acid, and R1, Het, R2b, X and Y have the same meanings as described above. ..
 製造方法Zは、式(1a)で表される化合物のうち、R2dが置換基Aで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Aで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基である式(1-i)で表される化合物の合成方法であって、式(1-g)で表される化合物と有機ボロン酸類(R2d-B)とを、遷移金属類および塩基の存在下、溶媒中で反応させる鈴木-宮浦カップリングによって得ることを含む製造方法である。 Production method Z is a compound represented by formula (1a) in which R2d is optionally substituted with a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, and a substituent A, which may be optionally substituted with a substituent A. A C3 to C8 cycloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent A, or a C2 to C6 haloalkenyl group represented by the formula (1-i): A synthetic method, which is obtained by Suzuki-Miyaura coupling in which a compound represented by the formula (1-g) and an organic boronic acid (R2d-B) are reacted in a solvent in the presence of a transition metal and a base. It is a manufacturing method including the above.
 式(1-g)中、好ましいR2bは、塩素原子、臭素原子、またはヨウ素原子である。 In formula (1-g), preferred R2b is chlorine atom, bromine atom, or iodine atom.
 本反応に使用するR2d-Bは、有機ボロン酸や有機ボロン酸エステル等の有機ボロン酸類を表し、市販品として入手または公知の方法で製造できる。 R2d-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercial product or can be produced by a known method.
 本反応に使用するR2d-Bの量は、式(1-g)で表される化合物に対して、1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上10当量以下である。 The amount of R2d-B used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more relative to the compound represented by the formula (1-g). , And preferably 1 equivalent or more and 10 equivalents or less.
 本反応に使用する遷移金属類は、パラジウム、ニッケル、ルテニウム等であり、配位子を有してよい。好ましくは、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類が挙げられる。 The transition metals used in this reaction are palladium, nickel, ruthenium, etc., and may have a ligand. Preferred are palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis (triphenylphosphine) palladium, bis (triphenylphosphine) palladium dichloride and the like. Examples include palladiums.
 本反応に使用する遷移金属類の量は、式(1-g)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. There is no such thing.
 本反応を効率的に進行させるために、トリフェニルホスフィン、トリシクロヘキシルホスフィン等のホスフィン配位子を添加することができる。 A phosphine ligand such as triphenylphosphine or tricyclohexylphosphine can be added to allow the reaction to proceed efficiently.
 本反応に使用するホスフィン配位子の量は、式(1-g)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. It will not be done.
 本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウムのような無機塩基類やナトリウムメトキシド、ナトリウムエトキシド、カリウム t-ブトキシド等の金属アルコキシド類等である。 The bases used in this reaction are inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide.
 本反応に使用する塩基の量は、式(1-g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上50当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g), but is preferably It is 1 equivalent or more and 50 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether such as water solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane. Examples of the solvent include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-g)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-g). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、30℃以上200℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, or a saline solution Etc. can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by performing a filtration operation.
 前記で得られた式(1-i)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-i) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-i)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-i) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(1-i)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-i) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法AA]
Figure JPOXMLDOC01-appb-C000058

 式中、R2eは置換基Aで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、R1、Het、R2b、XおよびYは前記と同義である。
[Production method AA]
Figure JPOXMLDOC01-appb-C000058

In the formula, R2e represents a C2-C6 alkynyl group which may be appropriately substituted with the substituent A, or a C2-C6 haloalkynyl group, and R1, Het, R2b, X and Y have the same meanings as described above.
 製造方法AAは、式(1a)で表される化合物のうち、R2eが置換基Aで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基である式(1-j)で表される化合物の合成方法であって、式(1-g)で表される化合物と末端アルキン化合物とを、遷移金属類および塩基の存在下、溶媒中で反応させる薗頭カップリングによって得ることを含む製造方法である。 The production method AA is performed by synthesizing a compound represented by the formula (1a) in which R2e is a C2-C6 alkynyl group optionally substituted by a substituent A, or a C2-C6 haloalkynyl group. j) a method of synthesizing a compound represented by formula (1-g) and a terminal alkyne compound in a solvent in the presence of a transition metal and a base, a Sonogashira coupling It is a manufacturing method including obtaining.
 式(1-j)中、好ましいR2bは、塩素原子、臭素原子、またはヨウ素原子である。 In formula (1-j), preferred R2b is chlorine atom, bromine atom, or iodine atom.
 本反応に使用する末端アルキン化合物は、市販品として入手または公知の方法で製造することができる。また、末端アルキン化合物として、トリメチルシリルアセチレンも使用することができる。この場合は、式(1a-b)で表される化合物にトリメチルシリルエチニル基を導入後、脱シリル化を行う必要がある。脱シリル化については、ジャーナル オブ ザ アメリカン ケミカル ソサエティー(Journal of the American Chemical Society)、第131巻、2号、634-643頁(2009).およびジャーナル オブ オルガノメタリック ケミストリー(Journal of Organometallic Chemistry)、696巻、25号、4039-4045頁(2011).等の非特許文献を参考にして行うことができる。 The terminal alkyne compound used in this reaction can be obtained as a commercial product or can be produced by a known method. Further, trimethylsilylacetylene can also be used as the terminal alkyne compound. In this case, it is necessary to introduce a trimethylsilylethynyl group into the compound represented by formula (1a-b) and then perform desilylation. Regarding desilylation, Journal of the American Chemical Society, Vol. 131, No. 2, pp. 634-643 (2009). And Journal of Organometallic Chemistry, Vol. 696, No. 25, pp. 4039-4045 (2011). And the like.
 本反応に使用する末端アルキン化合物の量は、式(1-g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上10当量以下である。 The amount of the terminal alkyne compound used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). It is preferably 1 equivalent or more and 10 equivalents or less.
 本反応に使用する遷移金属類は、配位子を有してよく、酢酸パラジウム、[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロリド、トリス(ジベンジリデンアセトン)ジパラジウム、テトラキス(トリフェニルホスフィン)パラジウム、ビス(トリフェニルホスフィン)パラジウムジクロリド等のパラジウム類等である。また、塩化銅、臭化銅、ヨウ化銅等の銅類も同時に使用する。 The transition metals used in this reaction may have a ligand, and include palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladium compounds such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride. In addition, coppers such as copper chloride, copper bromide, and copper iodide are used at the same time.
 本反応に使用する遷移金属類の量は、パラジウム類等および銅類が、それぞれ式(1a-b)で表される化合物に対して0.001当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはない。好ましい量は、双方ともに0.001当量以上1当量以下である。 The amount of transition metals used in this reaction may be 0.001 equivalent or more of palladium and copper and the compound represented by the formula (1a-b), respectively, so that the desired reaction proceeds. There is no particular limitation as long as it does. Preferred amounts are 0.001 equivalent to 1 equivalent in both cases.
 本反応に使用する塩基は、トリエチルアミン、トリブチルアミン、イソプロピルアミン、ジエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン等の有機アミン類や、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩基類等が挙げられる。 Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
 本反応に使用する塩基の量は、式(1-g)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上50当量以下である。また、有機塩基で液体状のものに関しては、溶媒として使用することができる。 The amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g), but is preferably It is 1 equivalent or more and 50 equivalents or less. In addition, an organic base in a liquid state can be used as a solvent.
 本反応を効率的に進行させるために、トリt-ブチルホスフィン、2-ジシクロヘキシルホスフィノ-2’4’6’-トリイソプロピルビフェニル等のホスフィン配位子を添加することができるが、必須ではない。 A phosphine ligand such as tri-t-butylphosphine or 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added to promote the reaction efficiently, but it is not essential. .
 本反応に使用するホスフィン配位子の量は、式(1-g)で表される化合物に対して0.001当量以上1当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1-g), but is not particularly limited as long as the intended reaction proceeds. It will not be done.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、トリエチルアミン、トリブチルアミン、イソプロピルアミン、ジエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン等の有機アミン溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester-based solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile-based solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide , Amide solvents such as N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, triethylamine, Butylamine, isopropylamine, diethylamine, diisopropylamine, organic amine solvents such as diisopropylethylamine. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-g)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-g). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, or a saline solution is optional. Can be used for During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield. It is also possible, but not essential, to remove insolubles by performing a filtration operation.
 前記で得られた式(1-j)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-j) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-j)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-j) obtained above can be distilled under reduced pressure to remove the solvent.
 溶媒留去後に得られた式(1-j)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-j) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法AB]
Figure JPOXMLDOC01-appb-C000059

 式中、RyaはC1~C6のアルコキシ基を表し、Het1は、硫黄原子および窒素原子を含む5員の複素環基を表し、該硫黄原子および窒素原子を含む5員の複素環基は、R3が適宜置換し、R1、R2、X、Yおよび破線部は前記と同義である。
[Production method AB]
Figure JPOXMLDOC01-appb-C000059

In the formula, Rya represents a C1 to C6 alkoxy group, Het1 represents a 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom, and the 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom is R3. Are appropriately substituted, and R1, R2, X, Y and the broken line portion have the same meanings as described above.
 製造方法ABは、式(1)で表される化合物のうち、水酸基を有する式(1-L)で表される化合物の合成方法であって、RyaがC1~C6のアルコキシ基である式(1-k)で表される化合物と酸とを、溶媒中で反応させることによって得ることを含む製造方法である。 Production method AB is a method for synthesizing a compound represented by the formula (1-L) having a hydroxyl group among the compounds represented by the formula (1), wherein Rya is a C1 to C6 alkoxy group ( 1-k) is a production method which comprises obtaining a compound represented by 1-k) and an acid in a solvent.
 本反応に使用する酸として、三塩化ホウ素、三臭化ホウ素等のハロゲン化ホウ素類等がある。 The acids used in this reaction include boron halides such as boron trichloride and boron tribromide.
 本反応に使用する酸の量は、式(1-k)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。 The amount of the acid used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-k) and is not particularly limited as long as the intended reaction proceeds, but is preferably Is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、アセトニトリル等のニトリル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is a benzene solvent such as benzene, toluene, xylene, mesitylene, chlorobenzene, or dichlorobenzene, and a nitrile solvent such as acetonitrile. , Halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon-based solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-k)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-k). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-80℃以上100℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -80 ° C or higher and 100 ° C or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, or a saline solution Etc. can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-L)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-L) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-L)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-L) obtained above can be evaporated under reduced pressure as long as the compound is not decomposed.
 溶媒留去後に得られた式(1-L)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-L) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法AC]
Figure JPOXMLDOC01-appb-C000060

 式中、Rybは、置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC3~C6のアルキニル基、C3~C6のハロアルキニル基、またはRx1C(=O)-(Rx1は、前記と同義である。)を表し、Lv、R1、R2、Het1、X、Yおよび破線部は前記と同義である。
[Manufacturing method AC]
Figure JPOXMLDOC01-appb-C000060

In the formula, Ryb is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent A C2-C6 alkenyl group optionally substituted with C, a C2-C6 haloalkenyl group, a C3-C6 alkynyl group optionally substituted with a substituent C, a C3-C6 haloalkynyl group, or Rx1C (= O)-(Rx1 has the same meaning as described above), and Lv, R1, R2, Het1, X, Y and the broken line have the same meaning as described above.
 製造方法ACは、式(1)で表される化合物のうち、Ryb-O-が置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRx1C(=O)O-(Rx1は、前記と同義である。)を表す式(1-m)で表される化合物の合成方法であって、式(1-L)で表される化合物とRyb-Lvとを、塩基存在下、溶媒中で反応させることを含む製造方法である。 The production method AC is a compound represented by the formula (1), in which Ryb—O— may be optionally substituted with a substituent C, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, and a substituent C Optionally substituted with a C3 to C8 cycloalkoxy group, a C2 to C6 alkenyloxy group optionally substituted with a substituent C, a C2 to C6 haloalkenyloxy group, a substituent C optionally substituted with Or a C3-C6 alkynyloxy group, a C3-C6 haloalkynyloxy group, or Rx1C (= O) O- (Rx1 is as defined above) and represented by formula (1-m). A method for synthesizing a compound, which comprises reacting the compound represented by the formula (1-L) with Ryb-Lv in a solvent in the presence of a base.
 本反応に使用するRyb-Lvは、市販品として入手または公知の方法で製造することができる。 Ryb-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
 本反応に使用するRyb-Lvの量は、式(1-L)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。 The amount of Ryb-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-L), and is not particularly limited as long as the intended reaction proceeds. , And preferably 1 equivalent or more and 10 equivalents or less.
 本反応に使用する塩基として、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類や、トリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン、ピリジン、4-ジメチルアミノピリジン、コリジン、ルチジン等の有機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 As the base used in this reaction, inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate and sodium hydride, and organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine and lutidine Examples thereof include, but are not particularly limited as long as the desired reaction proceeds.
 本反応に使用する塩基の量は、式(1-L)で表される化合物に対して1当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-L), and is not particularly limited as long as the intended reaction proceeds, but is preferably Is 1 equivalent or more and 10 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an ether solvent such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane, Methanol, ethanol, alcohol solvents such as isopropanol, benzene, toluene, xylene, mesitylene, chlorobenzene, benzene solvents such as dichlorobenzene, ethyl acetate, isopropyl acetate, ester solvents such as butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-L)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-L). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-20℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -20 ° C or higher and 150 ° C or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-m)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-m) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-m)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-m) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1-m)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-m) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法AD]
Figure JPOXMLDOC01-appb-C000061

 式中、Rycはハロゲン原子を表し、Rydは置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基を表し、、Ryd-Bは有機ボロン酸類を表し、R1、R2、Het1、X、Yおよび破線部は前記と同義である。
[Manufacturing method AD]
Figure JPOXMLDOC01-appb-C000061

In the formula, Ryc represents a halogen atom, Ryd represents a C1 to C6 alkyl group optionally substituted by a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 optionally substituted by a substituent C. Represents a cycloalkyl group, a C2-C6 alkenyl group which may be optionally substituted with a substituent C, or a C2-C6 haloalkenyl group, Ryd-B represents an organic boronic acid, and R1, R2, Het1, X , Y and the broken line portion have the same meanings as described above.
 製造方法ADは、式(1)で表される化合物のうち、Rydが置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基である式(1-o)で表される化合物の合成方法であって、式(1-n)で表される化合物と有機ボロン酸類(Ryd-B)とを、遷移金属類および塩基の存在下、溶媒中で反応させる鈴木-宮浦カップリングによって得ることを含む製造方法である。 The production method AD is a compound represented by the formula (1) in which Ryd is appropriately substituted with a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, and a substituent C which may be optionally substituted with a substituent C. A C3 to C8 cycloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent C, or a C2 to C6 haloalkenyl group represented by the formula (1-o) A synthetic method, which is obtained by Suzuki-Miyaura coupling in which a compound represented by the formula (1-n) and an organic boronic acid (Ryd-B) are reacted in a solvent in the presence of a transition metal and a base. It is a manufacturing method including the above.
 式(1-n)で表される化合物中、好ましいRycは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1-n), preferable Ryc is a chlorine atom, a bromine atom or an iodine atom.
 本反応に使用するRyd-Bは、有機ボロン酸や有機ボロン酸エステル等の有機ボロン酸類を表し、市販品として入手または公知の方法で製造できる。 Ryd-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercial product or can be produced by a known method.
 製造方法Zにおける式(1-g)で表される化合物とR2d-Bとを、それぞれ式(1-n)で表される化合物とRyd-Bとに代えて使用することにより、製造方法Zに準じて製造方法ADを実施することができる。 Production Method Z by using the compound represented by Formula (1-g) and R2d-B in Production Method Z instead of the compound represented by Formula (1-n) and Ryd-B, respectively. The manufacturing method AD can be carried out according to.
[製造方法AE]
Figure JPOXMLDOC01-appb-C000062

 式中、Ryeは置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、Ryc、R1、R2、X、Y、Het1および破線部は前記と同義である。
[Manufacturing method AE]
Figure JPOXMLDOC01-appb-C000062

In the formula, Rye represents a C2 to C6 alkynyl group which may be appropriately substituted with a substituent C, or a C2 to C6 haloalkynyl group, and Ryc, R1, R2, X, Y, Het1 and the broken line portion are as described above. Are synonymous.
 製造方法AEは、式(1)で表される化合物のうち、Ryeが置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基である式(1-p)で表される化合物の合成方法であって、式(1-n)で表される化合物と末端アルキン化合物とを、遷移金属類および塩基の存在下、溶媒中で反応させる薗頭カップリングによって得ることを含む製造方法である。 The production method AE is a compound represented by the formula (1) wherein Rye is a C2-C6 alkynyl group optionally substituted with a substituent C, or a C2-C6 haloalkynyl group. p) a method for synthesizing a compound represented by formula (1-n) and a terminal alkyne compound in the presence of a transition metal and a base in a solvent, Sonogashira coupling It is a manufacturing method including obtaining.
 式(1-n)で表される化合物中、好ましいRycは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1-n), preferable Ryc is a chlorine atom, a bromine atom or an iodine atom.
 製造方法AAにおける式(1-g)で表される化合物を式(1-n)で表される化合物に代えて使用することにより、製造方法AAに準じて製造方法AEを実施することができる。 By using the compound represented by the formula (1-g) in the production method AA instead of the compound represented by the formula (1-n), the production method AE can be carried out according to the production method AA. .
[製造方法AF]
Figure JPOXMLDOC01-appb-C000063

 式中、Ryfはハロゲン原子を表し、Het2は、硫黄原子および窒素原子を含む5員の複素環基を表し、該硫黄原子および窒素原子を含む5員の複素環基は、R3が適宜置換し、HalR、R1、R2、X、Yおよび破線部は前記と同義である。
[Manufacturing method AF]
Figure JPOXMLDOC01-appb-C000063

In the formula, Ryf represents a halogen atom, Het2 represents a 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom, and the 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom is substituted with R3 as appropriate. , HalR, R1, R2, X, Y and the broken line portion are as defined above.
 製造方法AFは、式(1)で表される化合物のうち、Ryfがハロゲン原子である式(1-r)で表される化合物を得る製造方法であって、Het2の置換基に少なくとも1つ以上の水素原子を有する式(1-q)で表される化合物とハロゲン化剤(HalR)とを、溶媒中で反応させることを含む製造方法である。 The production method AF is a production method for obtaining a compound represented by the formula (1-r) in which Ryf is a halogen atom among the compounds represented by the formula (1), wherein at least one substituent is substituted for Het2. It is a production method which comprises reacting the compound represented by the formula (1-q) having a hydrogen atom with a halogenating agent (HalR) in a solvent.
 本反応に使用するハロゲン化剤としては、セレクトロフルオル(N-フルオロ-N’-トリエチレンジアミン ビス(テトラフルオロボラート))、N-クロロスクシンイミド、N-ブロモスクシンイミド、N-ヨードスクシンイミド、1,3-ジクロロ-5,5-ジメチルヒダントイン、1,3-ジブロモ-5,5-ジメチルヒダントイン、1,3-ジヨード-5,5-ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As the halogenating agent used in this reaction, selectrofluor (N-fluoro-N'-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1 , 3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
 本反応に使用するハロゲン化剤の量は、式(1-q)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、1当量以上10当量以下である。ただし、ヒダントインを含むハロゲン化剤の量は、0.5当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、好ましくは1当量以上5当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-q). It is preferably 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the desired reaction proceeds as long as the amount is 0.5 equivalent or more, and is preferably 1 equivalent to 5 equivalents.
 本反応に使用するハロゲン化剤がヨウ素化剤である場合、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸を加えることができる。 When the halogenating agent used in this reaction is an iodizing agent, add inorganic acids such as hydrochloric acid and sulfuric acid, and acids such as organic acids such as acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid. You can
 本反応に使用するハロゲン化剤がヨウ素化剤である場合に使用する酸の量は、式(1-q)で表される化合物に対して0.01当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、0.1当量以上3当量以下である。 When the amount of the acid used when the halogenating agent used in this reaction is an iodizing agent is 0.01 equivalent or more relative to the compound represented by the formula (1-q), the desired reaction It is not particularly limited as long as it proceeds, but it is preferably 0.1 equivalent or more and 3 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid, trifluoromethanesulfonic acid, diethyl ether, etc. , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. , Ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-q)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more the weight of the compound represented by the formula (1-q). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-r)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-r) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-r)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-r) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1-r)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-r) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法AG]
Figure JPOXMLDOC01-appb-C000064

 式中、R5cはハロゲン原子を表し、R5aはシアノ基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、またはRc-L-(ここで、RcおよびLは、前記と同義である。)を表し、R1、R2、R4、Het、Q、Xおよび破線部は前記と同義である。
[Manufacturing method AG]
Figure JPOXMLDOC01-appb-C000064

In the formula, R5c represents a halogen atom, and R5a may be optionally substituted with a cyano group, a C1 to C6 alkoxy group optionally substituted with a substituent C, a C1 to C6 haloalkoxy group, or a substituent C. A C3 to C8 cycloalkoxy group, a C2 to C6 alkenyloxy group optionally substituted with a substituent C, a C2 to C6 haloalkenyloxy group, a C3 to C6 alkynyl optionally substituted with a substituent C An oxy group, a C3-C6 haloalkynyloxy group, RaRbN- (wherein Ra and Rb are as defined above), or Rc-L- (wherein Rc and L are as defined above). , And R1, R2, R4, Het, Q, X and the broken line portion have the same meanings as described above.
 製造方法AGは、式(1)で表される化合物のうち、R5aがシアノ基、置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、またはRc-L-(ここで、RcおよびLは、前記と同義である。)である式(1-t)で表される化合物の合成方法であって、式(1-s)で表される化合物とR5a-Qとを、場合により塩基の存在下、溶媒中で反応させることを含む製造方法である。 Production method AG is a compound represented by formula (1) in which R5a is a cyano group, a C1 to C6 alkoxy group optionally substituted with a substituent C, a C1 to C6 haloalkoxy group, a substituent C Optionally substituted with a C3 to C8 cycloalkoxy group, a C2 to C6 alkenyloxy group optionally substituted with a substituent C, a C2 to C6 haloalkenyloxy group, a substituent C optionally substituted with C3 to C6 alkynyloxy group, C3 to C6 haloalkynyloxy group, RaRbN- (wherein Ra and Rb have the same meanings as described above), or Rc-L- (herein, Rc and L). Is the same as defined above.) In the method of synthesizing a compound represented by the formula (1-t), wherein the compound represented by the formula (1-s) and R5a-Q are optionally a base. In the presence of A production method comprising reacting.
 本反応で使用されるR5a-Qは、市販品として入手することができる。好ましいQは、水素原子、またはナトリウム、カリウム等のアルカリ金属類である。 R5a-Q used in this reaction can be obtained as a commercial product. Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
 本反応で使用されるR5a-Qの量は、式(1-s)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上30当量以下である。また、Qが水素原子を表すときは、溶媒として使用することができる。 The amount of R5a-Q used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is at least 1 equivalent to the compound represented by the formula (1-s). , And preferably 1 equivalent or more and 30 equivalents or less. When Q represents a hydrogen atom, it can be used as a solvent.
 場合により本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類が好ましい。また、Qがアルカリ金属類のときは、塩基の使用は、必須ではない。 In some cases, the base used in this reaction is preferably an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate or sodium hydride. When Q is an alkali metal, the use of a base is not essential.
 場合により本反応に使用する塩基の量は、式(1-s)で表される化合物に対して1当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、1当量以上30当量以下である。 In some cases, the amount of the base used in this reaction is not particularly limited as long as the intended reaction proceeds, as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-s). It is preferably 1 equivalent or more and 30 equivalents or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、R5a-Hで表されるアルコール系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒、1,3-ジメチル-2-イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is an alcohol solvent represented by R5a-H, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy. Ether-based solvents such as ethane, tetrahydrofuran and dioxane, benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester-based solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile-based solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide and other amide solvents, 1,3-dimethyl-2-imidazolidinone and other urea solvents, dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc Halogenated solvents, dimethylsulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(1-s)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 3 times or more and 200 times or more by weight that of the compound represented by the formula (1-s). It is the following.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、0℃以上150℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually 0 ° C. or higher and 150 ° C. or lower, or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, or a saline solution is optional. Can be used for During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(1-t)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (1-t) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(1-t)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1-t) obtained above can be evaporated under reduced pressure as long as the compound does not decompose.
 溶媒留去後に得られた式(1-t)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-t) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
[製造方法AH]
Figure JPOXMLDOC01-appb-C000065

 式中、R5aaは置換基Cで適宜置換されてもよいC1~C6のアルコキシ基を表し、R1、R2、R4、X、Hetおよび破線部は前記と同義である。
[Production method AH]
Figure JPOXMLDOC01-appb-C000065

In the formula, R5aa represents a C1 to C6 alkoxy group which may be appropriately substituted with a substituent C, and R1, R2, R4, X, Het and the broken line have the same meanings as described above.
 製造方法AHは、式(1)で表される化合物のうち、水酸基を有する式(1-v)で表される化合物の合成方法であって、R5aaがC1~C6のアルコキシ基である式(1-u)で表される化合物と酸とを、溶媒中で反応させることによって得ることを含む製造方法である。 The production method AH is a method for synthesizing a compound represented by the formula (1-v) having a hydroxyl group among the compounds represented by the formula (1), wherein R5aa is a C1 to C6 alkoxy group ( 1-u) is a production method which comprises obtaining the compound represented by 1-u) by reacting with an acid in a solvent.
 製造方法ABにおける式(1-k)で表される化合物を式(1-u)で表される化合物に代えて使用することにより、製造方法ABに準じて製造方法AHを実施することができる。 By using the compound represented by formula (1-k) in production method AB instead of the compound represented by formula (1-u), production method AH can be carried out according to production method AB. .
[製造方法AI]
Figure JPOXMLDOC01-appb-C000066

 式中、R5bは置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、C2~C6のハロアルケニル基、置換基Cで適宜置換されてもよいC3~C6のアルキニル基、C3~C6のハロアルキニル基、またはRx1C(=O)-(Rx1は、前記と同義である。)を表し、Lv、R1、R2、R4、Het、Xおよび破線部は前記と同義である。
[Manufacturing method AI]
Figure JPOXMLDOC01-appb-C000066

In the formula, R5b is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent C An optionally substituted C2-C6 alkenyl group, a C2-C6 haloalkenyl group, an optionally substituted C3-C6 alkynyl group, a C3-C6 haloalkynyl group, or Rx1C ( = O)-(Rx1 has the same meaning as described above), and Lv, R1, R2, R4, Het, X and the broken line have the same meaning as described above.
 製造方法AIは、式(1)で表される化合物のうち、R5b-O-が置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、C1~C6のハロアルコキシ基、置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、C2~C6のハロアルケニルオキシ基、置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、C3~C6のハロアルキニルオキシ基、またはRx1C(=O)O-(Rx1は、前記と同義である。)を表す式(1-w)で表される化合物の合成方法であって、式(1-v)で表される化合物とR5b-Lvとを、塩基存在下、溶媒中で反応させることを含む製造方法である。 The production method AI is a compound represented by the formula (1), in which R5b-O- is a C1 to C6 alkoxy group, C1 to C6 haloalkoxy group or a substituent C in which R5b-O- may be appropriately substituted with a substituent C. Optionally substituted with a C3 to C8 cycloalkoxy group, a C2 to C6 alkenyloxy group optionally substituted with a substituent C, a C2 to C6 haloalkenyloxy group, a substituent C optionally substituted with Or a C3 to C6 alkynyloxy group, a C3 to C6 haloalkynyloxy group, or Rx1C (═O) O— (Rx1 has the same meaning as defined above). A method for synthesizing a compound, which comprises reacting a compound represented by the formula (1-v) with R5b-Lv in a solvent in the presence of a base.
 本反応に使用するR5b-Lvは、市販品として入手または公知の方法で製造することができる。 The R5b-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
 製造方法ACにおける式(1-L)で表される化合物を式(1-v)で表される化合物に代えて使用することにより、製造方法ACに準じて製造方法AIを実施することができる。 By using the compound represented by formula (1-L) in production method AC instead of the compound represented by formula (1-v), production method AI can be carried out according to production method AC. .
[製造方法AJ]
Figure JPOXMLDOC01-appb-C000067

 式中、R5dは置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基を表し、R5d-Bは有機ボロン酸類を表し、R1、R2、R4、R5c、X、Hetおよび破線部は前記と同義である。
[Manufacturing method AJ]
Figure JPOXMLDOC01-appb-C000067

In the formula, R5d is a C1 to C6 alkyl group optionally substituted with a substituent C, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group optionally substituted with a substituent C, a substituent C Represents a C2 to C6 alkenyl group which may be optionally substituted with, or a C2 to C6 haloalkenyl group, R5d-B represents an organic boronic acid, R1, R2, R4, R5c, X, Het and a broken line part It is synonymous with the above.
 製造方法AJは、式(1)で表される化合物のうち、R5dが置換基Cで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、置換基Cで適宜置換されてもよいC2~C6のアルケニル基、またはC2~C6のハロアルケニル基である式(1-x)で表される化合物の合成方法であって、式(1-s)で表される化合物と有機ボロン酸類(R5d-B)とを、遷移金属類および塩基の存在下、溶媒中で反応させる鈴木-宮浦カップリングによって得ることを含む製造方法である。 The production method AJ is a compound represented by the formula (1) in which R5d is appropriately substituted with a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, and a substituent C which may be optionally substituted with a substituent C. A C3 to C8 cycloalkyl group, a C2 to C6 alkenyl group optionally substituted with a substituent C, or a C2 to C6 haloalkenyl group represented by the formula (1-x): A synthetic method, which is obtained by Suzuki-Miyaura coupling in which a compound represented by the formula (1-s) and an organic boronic acid (R5d-B) are reacted in a solvent in the presence of a transition metal and a base. It is a manufacturing method including the above.
 式(1-s)で表される化合物中、好ましいR5cは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1-s), preferable R5c is a chlorine atom, a bromine atom or an iodine atom.
 製造方法ADにおける式(1-n)で表される化合物を式(1-x)で表される化合物に代えて使用することにより、製造方法ADに準じて製造方法AJを実施することができる。 By using the compound represented by formula (1-n) in production method AD instead of the compound represented by formula (1-x), production method AJ can be carried out according to production method AD. .
[製造方法AK]
Figure JPOXMLDOC01-appb-C000068

 式中、R5eは置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基を表し、R1、R2、R4、R5c、X、Hetおよび破線部は前記と同義である。
[Manufacturing method AK]
Figure JPOXMLDOC01-appb-C000068

In the formula, R5e represents a C2 to C6 alkynyl group which may be appropriately substituted with a substituent C, or a C2 to C6 haloalkynyl group, and R1, R2, R4, R5c, X, Het and the broken line portion are as described above. Are synonymous.
 製造方法AKは、式(1)で表される化合物のうち、R5eが置換基Cで適宜置換されてもよいC2~C6のアルキニル基、またはC2~C6のハロアルキニル基である式(1-y)で表される化合物の合成方法であって、式(1-s)で表される化合物と末端アルキン化合物とを、遷移金属類および塩基の存在下、溶媒中で反応させる薗頭カップリングによって得ることを含む製造方法である。 The production method AK is a compound represented by the formula (1-) in which R5e is a C2-C6 alkynyl group which may be optionally substituted with a substituent C, or a C2-C6 haloalkynyl group in the compound represented by the formula (1). y) a method for synthesizing a compound represented by the formula (1-s), wherein Sonogashira coupling is carried out by reacting the compound represented by the formula (1-s) with a terminal alkyne compound in the presence of a transition metal and a base. It is a manufacturing method including obtaining.
 式(1-s)で表される化合物中、好ましいR5cは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1-s), preferable R5c is a chlorine atom, a bromine atom or an iodine atom.
 製造方法AEにおける式(1-n)で表される化合物を式(1-s)で表される化合物に代えて使用することにより、製造方法AEに準じて製造方法AKを実施することができる。 By using the compound represented by formula (1-n) in production method AE instead of the compound represented by formula (1-s), production method AK can be carried out according to production method AE. .
[製造方法AL]
Figure JPOXMLDOC01-appb-C000069

 式中、LaはSを表し、LbはSOまたはSOを表し、Ox’’’は酸化剤を表す。
[Manufacturing method AL]
Figure JPOXMLDOC01-appb-C000069

In the formula, La represents S, Lb represents SO or SO 2 , and Ox ′ ″ represents an oxidizing agent.
 製造方法ALは、式(1)で表される化合物中、R2、R3、R4、R5、置換基Aおよび置換基Cに含まれるLbがSOまたはSOである式(Lb)で表される化合物の製造方法であって、式(1)で表される化合物中、R2、R3、R4、R5、置換基Aおよび置換基Cに含まれるLaがSである式(La)で表される化合物と酸化剤(Ox’’’)とを、溶媒中で反応させることを含む製造方法である。 The production method AL is represented by the formula (Lb) in which Rb contained in R2, R3, R4, R5, the substituent A and the substituent C in the compound represented by the formula (1) is SO or SO 2. A method for producing a compound, which is represented by formula (La) in which R contained in the compound represented by formula (1) is R2, R3, R4, R5, Substituent A and Substituent C is S. A production method comprising reacting a compound and an oxidizing agent (Ox ′ ″) in a solvent.
 本反応に使用する酸化剤は、過酸化水素水、メタ-クロロ過安息香酸等の過酸化物類等が挙げられる。また、タングステン酸ナトリウムのような遷移金属類を添加することもできる。 Examples of the oxidizing agent used in this reaction include hydrogen peroxide solution and peroxides such as meta-chloroperbenzoic acid. Also, transition metals such as sodium tungstate can be added.
 本反応に使用する酸化剤の量は、SOを製造する際には式(La)で表される化合物に対して、通常、1.0当量以上1.2当量以下であり、SOを製造する際には、通常、2当量以上10当量以下である。また、遷移金属類を添加する際には、通常、0.001当量以上1当量以下である。 The amount of the oxidizing agent used in this reaction is usually 1.0 equivalent or more and 1.2 equivalents or less with respect to the compound represented by the formula (La) when SO is produced, and SO 2 is produced. When doing, it is usually 2 equivalents or more and 10 equivalents or less. When adding transition metals, the amount is usually 0.001 equivalent or more and 1 equivalent or less.
 本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、酢酸等の酸性系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、アセトニトリル等のニトリル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または2種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but it may be an aqueous solvent, an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene or the like. Examples thereof include benzene-based solvents, nitrile-based solvents such as acetonitrile, halogen-based solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride. These solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio.
 本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式(La)で表される化合物に対して3重量倍以上200重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but is usually 3 times or more and 200 times or less the weight of the compound represented by the formula (La). is there.
 本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、-10℃以上120℃以下または溶媒の沸点以下である。 The temperature for carrying out this reaction is not particularly limited as long as the intended reaction proceeds, but it is usually -10 ° C or higher and 120 ° C or lower or the boiling point of the solvent or lower.
 反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸、塩化アンモニウム等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄原子を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル-t-ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、2種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to carry out a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When an aqueous solution is used, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, ammonium chloride, or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, or the like is dissolved, thiosulfate An aqueous solution or salt solution in which a salt containing a sulfur atom such as sodium or sodium sulfite is dissolved can be used arbitrarily. During the liquid separation operation, if necessary, a benzene solvent such as toluene, xylene, benzene, chlorobenzene, dichlorobenzene, an ester solvent such as ethyl acetate, isopropyl acetate, butyl acetate, diethyl ether, diisopropyl ether, methyl- An ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, a hydrocarbon solvent such as hexane, heptane, cyclohexane, methylcyclohexane, etc. It is possible to add. In addition, these solvents can be used alone or as a mixture of two or more kinds at an arbitrary ratio. The number of liquid separations is not particularly limited, and can be carried out according to the desired purity and yield.
 前記で得られた式(Lb)で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The water content of the reaction mixture containing the compound represented by the formula (Lb) obtained above can be removed with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
 前記で得られた式(Lb)で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (Lb) obtained above can be distilled under reduced pressure to remove the solvent.
 溶媒留去後に得られた式(Lb)で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (Lb) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography and the like with an appropriate solvent. What is necessary is just to set suitably according to the objective purity.
 以上に示した、製造方法A~製造方法ALを任意に組み合わせて、式(1)で表される化合物を製造することができる。もしくは、公知の方法と製造方法A~製造方法ALを任意に組み合わせても、式(1)で表される化合物を製造することができる。 The compounds represented by the formula (1) can be produced by arbitrarily combining the production methods A to AL shown above. Alternatively, the compound represented by the formula (1) can be produced by arbitrarily combining the known method and the production methods A to AL.
 本発明化合物は、植物に対して有害な生物を防除できるために、農薬として使用することができる。具体的には、殺菌剤、殺虫剤、除草剤、植物成長調整剤等が挙げられる。好ましくは、殺菌剤である。 Since the compound of the present invention can control organisms harmful to plants, it can be used as an agricultural chemical. Specific examples include fungicides, insecticides, herbicides, plant growth regulators, and the like. A bactericide is preferable.
 本発明化合物は、植物病害の防除のために、畑地、水田、茶園、果樹園、牧草地、芝生、森林、庭園、街路樹等で農園芸用殺菌剤として使用することができる。 The compound of the present invention can be used as a fungicide for agricultural and horticultural use for controlling plant diseases in fields, paddy fields, tea fields, orchards, meadows, lawns, forests, gardens, roadside trees and the like.
 本発明でいう植物病害とは、農作物、花き、花木、樹木等の植物に萎ちょう、立枯れ、黄化、萎縮、徒長等の全身的な異常な病的症状、または斑点、葉枯れ、モザイク、葉巻、枝枯れ、根腐れ、根こぶ、こぶ等の部分的な病的症状が惹起されることである。即ち、植物が病気になることである。植物病害を引き起こす病原体として、主に、菌類、細菌、スピロプラズマ、ファイトプラズマ、ウイルス、ウイロイド、寄生性高等植物、線虫等が挙げられる。本発明化合物は菌類に有効であるが、これに限定されるものではない。 The plant diseases referred to in the present invention are crops, flowers, flowers, trees, wilting of plants such as trees, systemic abnormal pathological symptoms such as wilting, yellowing, atrophy, and captivity, or spots, leaf wilting, mosaic. , Partial morbidity such as cigar, wilting, root rot, root-knot, and hump are caused. That is, the plant becomes ill. Pathogens causing plant diseases mainly include fungi, bacteria, spiroplasma, phytoplasma, viruses, viroids, parasitic higher plants, nematodes and the like. The compound of the present invention is effective on fungi, but is not limited thereto.
 菌類によって引き起こされる病害は、主に菌類病である。菌類病を引き起こす菌類(病原体)として、ネコブカビ菌類、卵菌類、接合菌類、子のう菌類、担子菌類および不完全菌類等が挙げられる。例えば、ネコブカビ菌類として、根こぶ病菌、ジャカイモ粉状そうか病菌、テンサイそう根病菌、卵菌類として疫病菌、べと病菌、Pythium属菌、Aphanomyces属菌、接合菌類としてRhizopus属菌、子のう菌類としてモモ縮葉病菌、トウモロコシごま葉枯病菌、イネいもち病菌、うどんこ病菌、炭そ病菌、赤かび病菌、ばか苗病菌、菌核病菌、担子菌類としてさび病菌類、黒穂病菌類、紫紋羽病菌、もち病菌、紋枯病菌、不完全菌類として灰色かび病菌、Alternaria属菌、Fusarium属菌、Penicillium属菌、Rhizoctonia属菌、白絹病菌等が挙げられる。 The diseases caused by fungi are mainly fungal diseases. Fungi (pathogens) which cause fungal diseases include fungus fungi, oomycetes, zygomycetes, ascomycetes, basidiomycetes and incomplete fungi. For example, as fungus fungi, root-knot fungus, powdery mildew fungus, sugar beet wilt fungus, oomycete, downy mildew, Pythium genus, Aphanomyces genus, zygomycetes Rhizopus genus, ascomycetes Fungi include peach leaf blight, corn sesame leaf blight, rice blast, powdery mildew, anthracnose, red mold, bacillus seedling, sclerotium, basidiomycetes, rust, smut, and purple print Fungi, blast fungus, sheath blight fungus, and imperfect fungi include gray mold, Alternaria, Fusarium, Penicillium, Rhizoctonia, and white silk.
 本発明化合物は、各種の植物病害に対して有効である。以下に、病害名およびその病原菌名の具体例を示す。 The compound of the present invention is effective against various plant diseases. Hereinafter, specific examples of the disease name and the pathogen name will be shown.
 イネのいもち病(Magnaporthe grisea)、紋枯病(Thanatephorus cucumeris)、褐色菌核病(Ceratobasidium setariae)、褐色小粒菌核病(Waitea circinata)、褐色紋枯病(Thanatephorus cucumeris)、球状菌核病(Sclerotium hydrophilum)、赤色菌核病(Wairea circinata)、黒しゅ病(Entyloma dactylidis)、小球菌核病(Magnaporthe salvinii)、灰色菌核病(Ceratobasidium cornigerum)、ごま葉枯病(Cochliobolus miyabeanus)、条葉枯病(Sphaerulina oryzina)、ばか苗病(Gibberella fujikuroi)、苗立枯病(Pythium spp.、Fusarium spp.、Trichoderma spp.、Rhizopus spp.、Rhizoctonia solani、Mucor sp.、Phoma sp.)、苗腐病(Pythium spp.、Achlya spp.、Dictyuchus spp.)、稲こうじ病(Claviceps virens)、墨黒穂病(Tilletia barclayana)、褐色米(Curvularia spp.、Alternaria spp.)、黄化萎縮病(Sclerophthora macrospora)、白葉枯病(Xanthomonas oryzae pv. oryzae)、褐条病(Acidovorax avenae subsp. avenae)、内頴褐変病(Erwinia ananas)、苗立枯細菌病(Burkholderia plantarii)、もみ枯細菌病(Burkholderia glumae)、葉鞘褐変病(Pseudomonas fuscovaginae)、かさ枯病(Pseudomonas syringae pv.oryzae)、株腐病(Erwinia chrysanthemi)、黄萎病(Phytoplasma oryzae)、縞葉枯病(Rice stripe tenuivirus)、萎縮病(Rice dwarf reovirus);
ムギ類のうどんこ病(Blumeria graminis f.sp.hordei; f.sp.tritici)、さび病(Puccinia striiformis、 Puccinia graminis、Puccinia recondita、Puccinia hordei)、斑葉病(Pyrenophora graminea)、網斑病(Pyrenophora teres)、赤かび病(Gibberella zeae、Fusarium culmorum、Fusarium avenaceum、Monographella nivalis)、雪腐病(Typhula incarnata、Typhula ishikariensis、Monographella nivalis)、裸黒穂病(Ustilago nuda)、なまぐさ黒穂病(Tilletia caries、Tilletia controversa)、眼紋病(Pseudocercosporella herpotrichoides)、株腐病(Ceratobasidium gramineum)、雲形病(Rhynchosporium secalis)、葉枯病(Septoria tritici)、ふ枯病(Phaeosphaeria nodorum)、苗立枯病(Fusarium spp.、Pythium spp.、Rhizoctonia spp.、Septoria spp.、Pyrenophora spp.)、立枯病(Gaeumannomyces graminis)、炭疽病(Colletotrichum graminicola)、麦角病(Claviceps purpurea)、斑点病(Cochliobolus sativus)、黒節病(Pseudomonas syringae pv. syringae);
トウモロコシの赤かび病(Gibberella zeae等)、苗立枯病(Fusarium avenaceum、Penicillium spp.、Pythium spp.、Rhizoctonia spp.)、さび病(Puccinia sorghi)、ごま葉枯病(Cochliobolus heterostrophus)、黒穂病(Ustilago maydis)、炭疽病(Colletotrichum graminicola)、北方斑点病(Cochliobolus carbonum)、褐条病(Acidovorax avenae subsp. avenae)、条斑細菌病(Burkholderia andropogonis)、倒伏細菌病(Erwinia chrysanthemi pv. zeae)、萎ちょう細菌病(Erwinia stewartii);ブドウのべと病(Plasmopara viticola)、さび病(Physopella ampelopsidis)、うどんこ病(Uncinula necator)、黒とう病(Elsinoe ampelina)、晩腐病(Glomerella cingulata、Colletotrichum acutatum)、黒腐病(Guignardia bidwellii)、つる割病(Phomopsis viticola)、すす点病(Zygophiala jamaicensis)、灰色かび病(Botrytis cinerea)、芽枯病(Diaporthe medusaea)、紫紋羽病(Helicobasidium mompa)、白紋羽病(Rosellinia necatrix)、根頭がんしゅ病(Agrobacterium vitis);リンゴのうどんこ病(Podosphaera leucotricha)、黒星病(Venturia inaequalis)、斑点落葉病(Alternaria mali)、赤星病(Gymnosporangium yamadae)、モニリア病(Monilinia mali)、腐らん病(Valsa ceratosperma)、輪紋病(Botryosphaeria berengeriana)、炭疽病(Colletotrichum acutatum、Glomerella cingulata)、すす点病(Zygophiala jamaicensis)、すす斑病(Gloeodes pomigena)、黒点病(Mycosphaerella pomi)、紫紋羽病(Helicobasidium mompa)、白紋羽病(Rosellinia necatrix)、胴枯病(Phomopsis mali、Diaporthe tanakae)、褐斑病(Diplocarpon mali)、リンゴの火傷病(Erwinia amylovora)、根頭がんしゅ病(Agrobacterium tumefaciens)、毛根病(Agrobacterium rhizogenes);
ナシの黒斑病(Alternaria kikuchiana)、黒星病(Venturia nashicola)、赤星病(Gymnosporangium asiaticum)、輪紋病(Botryosphaeria berengeriana f.sp. piricola)、胴枯病(Phomopsis fukushii)、枝枯細菌病(Erwinia sp.)、根頭がんしゅ病(Agrobacterium tumefaciens)、さび色胴枯病(Erwinia chrysanthemi pv. chrysanthemi)、花腐細菌病(Pseudomonas syringae pv. syringae);セイヨウナシの疫病(Phytophthora cactorum、Phytophthora syringae)、枝枯細菌病(Erwinia sp.);モモの黒星病(Cladosporium carpophilum)、ホモプシス腐敗病(Phomopsis sp.)、疫病(Phytophthora sp.)、炭疽病(Colletotrichum gloeosporioides)、縮葉病(Taphrina deformans)、穿孔細菌病(Xhanthomonas campestris pv. pruni)、根頭がんしゅ病(Agrobacterium tumefaciens);オウトウの炭疽病(Glomerella cingulata)、幼果菌核病(Monilinia kusanoi)、灰星病(Monilinia fructicola)、根頭がんしゅ病(Agrobacterium tumefaciens)、樹脂細菌病(Pseudomonas syringae pv. syringae);カキの炭疽病(Glomerella cingulata)、落葉病(Cercospora kaki; Mycosphaerella nawae)、うどんこ病(Phyllactinia kakikora)、根頭がんしゅ病(Agrobacterium tumefaciens);カンキツの黒点病(Diaporthe citri)、緑かび病(Penicillium digitatum)、青かび病(Penicillium italicum)、そうか病(Elsinoe fawcettii)、褐色腐敗病(Phytophthora citrophthora)、かいよう病(Xhanthomonas campestris pv. citri)、褐斑細菌病(Pseudomonas syringae pv. syringae)、グリーニング病(Liberibactor asiaticus)、根頭がんしゅ病(Agrobacterium tumefaciens);
トマト、キュウリ、豆類、イチゴ、ジャガイモ、キャベツ、ナス、レタス等の灰色かび病(Botrytis cinerea);トマト、キュウリ、豆類、イチゴ、ジャガイモ、ナタネ、キャベツ、ナス、レタス等の菌核病(Sclerotinia sclerotiorum);トマト、キュウリ、豆類、ダイコン、スイカ、ナス、ナタネ、ピーマン、ホウレンソウ、テンサイ等各種野菜の苗立枯病(Rhizoctonia spp.、Pythium spp.、Fusarium spp.、Phythophthora spp.、Sclerotinia sclerotiorum等);ナス科植物の青枯病(Ralstonia solanacearum);ウリ類のべと病(Pseudoperonospora cubensis)、うどんこ病(Sphaerotheca fuliginea)、炭疽病(Colletotrichum orbiculare)、つる枯病(Didymella bryoniae)、つる割病(Fusarium oxysporum)、疫病(Phytophthora parasitica、Phytophthora melonis、Phytophthora nicotianae、Phytophthora drechsleri、Phytophthora capsici等)、褐斑細菌病(Xhanthomonas campestris pv.cucurbitae)、軟腐病(Erwinia carotovora subsp. carotovora)、斑点細菌病(Pseudomonas syringae pv. lachrymans)、縁枯細菌病(Pseudomonas marginalis pv. marginalis)、がんしゅ病(Streptomyces sp.)、毛根病(Agrobacterium rhizogenes)、キュウリモザイクウィルス(Cucumber mosaic virus);
トマトの輪紋病(Alternaria solani)、葉かび病(Fulvia fulva)、疫病(Phytophthora infestans)、萎凋病(Fusarium oxysporum)、根腐病(Pythium myriotylum、Pythium dissotocum)、炭疽病(Colletotrichum gloeosporioides)、かいよう病(Clavibacter michiganensis)、茎えそ細菌病(Pseudomonas corrugata)、黒斑細菌病(Pseudomonas viridiflava)、軟腐病(Erwinia carotovora subsp. carotovora)、葉こぶ病(Crynebacterium sp.)、萎黄病(Phytoplasma asteris)、黄化萎縮病(Tobacco leaf curl subgroup III geminivirus);ナスのうどんこ病(Sphaerotheca fuliginea等)、すすかび病(Mycovellosiella nattrassii)、疫病(Phytophthora infestans)、褐色腐敗病(Phytophthora capsici)、褐斑細菌病(Pseudomonas cichorii)、茎えそ細菌病(Pseudomonas corrugata)、茎腐細菌病(Erwinia chrysanthemi)、軟腐病(Erwinia carotovora subsp. carotovora)、斑点細菌病(Pseudomonas sp.);ナタネの黒斑病(Alternaria brassicae)、黒腐病(Xhanthomonas campestris pv. campestris)、黒斑細菌病(Pseudomonas syringae pv. maculicola)、軟腐病(Erwinia carotovora);アブラナ科野菜の黒斑病(Alternaria brassicae等)、白斑病(Cercosporella brassicae)、根朽病(Phoma lingam)、根こぶ病(Plasmodiophora brassicae)、べと病(Peronospora parasitica)、黒腐病(Xhanthomonas campestris pv. campestris)、黒斑細菌病(Pseudomonas syringae pv. maculicola)、軟腐病(Erwinia carotovora subsp. carotovora);
キャベツの株腐病(Thanatephorus cucumeris)、萎黄病(Fusarium oxysporum)、黒すす病(Alternaria brassisicola);ハクサイの尻腐病(Rhizoctonia solani)、黄化病(Verticillium dahliae);ネギのさび病(Puccinia allii)、黒斑病(Alternaria porri)、白絹病(Sclerotium rolfsii)、白色疫病(Phytophthora porri)、黒腐菌核病(Sclerotium cepivorum);タマネギのかいよう病(Curtobacterium flaccumfaciens)、軟腐病(Erwinia carotovora subsp. carotovora)、斑点細菌病(Pseudomonas syringae pv. syringae)、腐敗病(Erwinia rhapontici)、鱗片腐敗病(Burkholderia gladioli)、萎黄病(Phytoplasma asteris);ニンニクの軟腐病(Erwinia carotovora subsp. carotovora)、春腐病(Pseudomonas marginalis pv.marginalis);ダイズの紫斑病(Cercospora kikuchii)、黒とう病(Elsinoe glycines)、黒点病(Diaporthe phaseolorum)、リゾクトニア根腐病(Rhizoctonia solani)、茎疫病(Phytophthora sojae)、べと病(Peronospora manshurica)、さび病(Phakopsora pachyrhizi)、炭疽病(Colletotrichum truncatum等)、葉焼病(Xhanthomonas campestris pv. glycines)、斑点細菌病(Pseudomonas syringae pv. glycinea);インゲンの炭疽病(Colletotrichum lindemuthianum)、青枯病(Ralstonia solanacearum)、かさ枯病(Pseudomonas syringae pv. phaseolicola)、褐斑細菌病(Pseudomonas viridiflava)、葉焼病(Xhanthomonas campestris pv. phaseoli);
ラッカセイの黒渋病(Mycosphaerella berkeleyi)、褐斑病(Mycosphaerella arachidis)、青枯病(Ralstonia solanacearum);エンドウのうどんこ病(Erysiphe pisi)、べと病(Peronospora pisi)、つる枯細菌病(Pseudomonas syringae pv.pisi)、つる腐細菌病(Xhanthomonas campestris pv.pisi);ソラマメのべと病(Peronospora viciae)、疫病(Phytophthora nicotianae);ジャガイモの夏疫病(Alternaria solani)、黒あざ病(Thanatephorus cucumeris)、疫病(Phytophthora infestans)、銀か病(Helminthosporium solani)、乾腐病(Fusarium oxysporum、Fusarium solani)、粉状そうか病(Spongospora subterranea)、青枯病(Ralstonia solanacearum)、黒あし病(Erwinia carotovora subsp. atroseptica)、そうか病(Streptomyces scabies、Streptomyces acidiscabies)、軟腐病(Erwinia carotovora subsp. carotovora)、粘性腐敗病(Crostridium spp.)、輪腐病(Clavibacter michiganensis subsp.sepedonicus);サツマイモの立枯病(Streptomyces ipomoeae);テンサイの褐斑病(Cercospora beticola)、べと病(Peronospora schachtii)、黒根病(Aphanomyces cochioides)、蛇の目病(Phoma betae)、根頭がんしゅ病(Agrobacterium tumefaciens)、そうか病(Streptomyces scabies)、斑点細菌病(Pseudomonas syringae pv. aptata);
ニンジンの黒葉枯病(Alternaria dauci)、こぶ病(Rhizobacter dauci)、根頭がんしゅ病(Agrobacterium tumefaciens)、ストレプトミセスそうか病(Streptomyces spp.)、軟腐病(Erwinia carotovora subsp. carotovora);イチゴのうどんこ病(Sphaerotheca aphanis var. aphanis)、疫病(Phytophthora nicotianae等)、炭疽病(Glomerella cingulata等)、果実腐敗病(Pythium ultimum)、青枯病(Ralstonia solanacearum)、角斑細菌病(Xhanthomonas campestris)、芽枯細菌病(Pseudomonas marginalis pv. marginalis);チャの網もち病(Exobasidium reticulatum)、白星病(Elsinoe leucospila)、炭疽病(Colletotrichum theae-sinensis)、輪斑病(Pestalotiopsis longiseta)、赤焼病(Pseudomonas syringae pv.theae)、かいよう病(Xhanthomonas campestris pv. theicola)、てんぐ巣病(Pseudomonas sp.);タバコの赤星病(Alternaria alternata)、うどんこ病(Erysiphe cichoracearum)、炭疽病(Colletotrichum gloeosporioides)、疫病(Phytophthora nicotianae)、野火病(Pseudomonas syringae pv.tabaci)、黄がさ細菌病(Pseudomonas syringae pv.mellea)、空洞病(Erwinia carotovora subsp. carotovora)、立枯病(Ralstonia solanacearum)、タバコモザイクウィルス(Tobacco mosaic virus);
コーヒーのさび病(Hemileia vastatrix);バナナの黒シガトガ病(Mycosphaerella fijiensis)、パナマ病(Fusarium oxysporum f.sp cubense);ワタの立枯病(Fusarium oxysporum)、白かび病(Ramularia areola);ヒマワリの菌核病(Sclerotinia sclerotiorum)、角点病(Xhanthomonas campestris pv.malvacearum)、空洞病(Erwinia carotovora subsp. carotovora)、斑点細菌病(Pseudomonas syringae pv.helianthi);バラの黒星病(Diplocarpon rosae)、うどんこ病(Sphaerotheca pannosa等)、疫病(Phytophthora megasperma)、べと病(Peronospora sparsa)、根頭がんしゅ病(Agrobacterium tumefaciens);キクの褐斑病(Septoria obesa)、白さび病(Puccinia horiana)、疫病(Phytophthora cactorum)、斑点細菌病(Pseudomonas cichorii)、軟腐病(Erwinia carotovora subsp. carotovora)、根頭がんしゅ病(Agrobacterium tumefaciens)、毛根病(Agrobacterium rhizogenes)、緑化病(Phytoplasma aurantifolia);芝のブラウンパッチ病(Rhizoctonia solani)、ダラースポット病(Sclerotinia homoeocarpa)、カーブラリア葉枯病(Curvularia sp.)、さび病(Puccinia zoysiae)、ヘルミントスポリウム葉枯病(Cochliobolus sp.)、雲形病(Rhynchosporium secalis)、立枯病(Gaeumannomyces graminis)、炭疽病(Colletotrichum sp.)、雪腐褐色小粒菌核病(Typhula incarnata)、雪腐黒色小粒菌核病(Typhula ishikariensis)、雪腐大粒菌核病(Myriosclerotinia borealis)、フェアリーリング病(Marasmius oreades等)、ピシウム病(Pythium aphanidermatum等)、いもち病(Pyricularia grisea)等が挙げられる。
Rice blast (Magnaporthe grisea), sheath blight (Thanatephorus cucumeris), brown rot (Ceratobasidium setariae), brown sclerotium (Waitea circinata), brown spot rot spelling bacterium (Therca erucorus phus) Sclerotium hydrophilum, red rot (Wairea circinata), black rot (Entyloma dactylidis), pneumococcal disease (Magnaporthe salvinii leaf blight, Ceratobosa sigma rot) Blight disease (Sphaerulina oryzina) , Frog seedling disease (Gibberella fujikuroi), seedling blight (Pythium spp., Fusarium spp., Trichoderma spp., Rhizopus spp., Rhizonia spore, Rhizoctonia spore, Rhizoptonia solipani, Ms. Rhizotonia sol. Achlya spp., Dictyuchus spp.), Rice scab (Clavipesps virens), Black smut (Tilletia barclayana), Brown rice (Curvularia spp., Alternaria spp., Yellow wilt disease, Alternaria spp., Yellowing disease) Xanthomonas oryzae pv. Oryzae, brown streak (Acidovora) avenae subsp. oryzae), strain rot (Erwinia chrysanthemi), yellow dwarf (Phytoplasma oryzae), Rice stripe tenuivirus, dwarf disease (Rice dwarf revirus);
Powdery mildew of wheat (Blumeria graminis f. Sp. Hordei; f. Sp. Tritici), rust (Puccinia striiformis, Puccinia graminis, Puccinia reconitia, Puccinia reconia, Puccinia reconia, Puccinia reconitia, Puccinia reno) disease Pyrenophora teres), Fusarium zeae, Fusarium culmorum, Fusarium avenaceum, Monographella nivalis, Snow rot (Typhula incarina, Typhula inicarina, Typhula iniganeis raisulai sushi) nuda), fishy smell smut (Tilletia caries, Tilletia controversa), Memonbyo (Pseudocercosporella herpotrichoides), stock rot (Ceratobasidium gramineum), scald (Rhynchosporium secalis), leaf blight (Septoria tritici), glume blotch (Phaeosphaeria nodorum), Fusarium spp., Pythium spp., Rhizoctonia spp., Septoria spp., Pyrenophora spp.), Wilt blight (Gaeumanomyces gramminolitis) Ergot (Claviceps purpurea), Leaf spot (Cochliobolus sativus), Black spot (Pseudomonas syringae pv. Syringae);
Fusarium aveneum, Penicillium spp., Pythium spp., Rhizoctonia spp., Pustinia sprouts, Pustinia sorghum blight, Puccinia sorghum blight (Puccinia sorghum) (Utilago maydis), Anthrax (Colletotrichum graminicola), Northern spot (Cochliobolus carbonum), Brown streak (Acidovorax avenae ssp. ), Fusarium wilt disease (Erwinia stewartii); Grape downy mildew (Plasmopara viticola), rust (Physopella ampelopsidis), powdery mildew (Uncinula necrotor, Elus erin aelin erin aelin erin aelin ell erin ella melin elsa) , Colletotrichum acutatum, black rot (Guignardia bidwellii), vine disease (Phomopsis viticola), soybean spot disease (Zygophiala jamaicensis), gray mold disease (Broterisea stomach disease) Helicobasidium mompa), white crest Disease (Rosellinia necatrix), apical carcinoma disease (Agrobacterium vitis); powdery mildew of apples (Podosphaera leucotricha), scab (Venturia inaealia, red leaf sprouts (Alternaria ganaria nymph) Diseases (Monilinia mali), rot (Valsa ceratosperma), ring spot (Botryosphaeria berengeriana), anthrax (Colletotrichum acutatum espodia, gomaella singula sigma, swelling) ena), black spot disease (Mycosphaerella pomi), purple root rot (Helicobasium momopa), white root rot (Rosellinia necatrix), blight disease (Phomopsis mali, Diaporthe tanako papaya tanako papaya) Injury and disease (Erwinia amylovora), apical carcinoma (Agrobacterium tumefaciens), hairy root disease (Agrobacterium rhizogenes);
Pear black spot (Alternaria kikuchiana), scab (Venturia nasicola), scab (Gymnosporangium asiaticum), ring spot (Botryosphaeria wisp, sclerosis, sclerosis, sclerosis, and so on). Erwinia sp.), Apical carcinoma (Agrobacterium tumefaciens), rust blight (Erwinia chrysanthemi pv. Chrysanthemi), and flower rot bacterial disease (Pseudomonas syringa. s ringae), bacterial wilt disease (Erwinia sp.); peach scab (Cladosporium carpophilum), homopsis rot (Phomopsis sp.), plague (Phytophthora spp.), and anthrax (Colletotrophithosporium). deformans), perforated bacterial disease (Xhanthomonas campestris pv. pruni), apical carcinoma disease (Agrobacterium tumefaciens); cherry anthracnose (Glomerella singulata), and germ fungus sclerosis (Milica koniota milion) ), Apical carcinoma (Agrobacter) um tumefaciens, resinous bacterial disease (Pseudomonas syringae pv. syringae); oyster anthracnose (Glomerella singulata), deciduous disease (Cercospora kaki, sickness of Mycosphaerakaya kana; tumefaciens; citrus black spot (Diaporthe citri), green mold (Penicillium digitatum), blue mold (Penicillium italicum), scab (Elsinoe thawthophthia, brown rot, phthophtha, and rot) omonas campestris pv. citri), brown spot bacterial disease (Pseudomonas syringae pv. syringae), greening disease (Liberactor asiaticus), apical carcinoma (Agrobacterium tumefaciens);
Botrytis cinerea such as tomato, cucumber, beans, strawberries, potatoes, cabbage, eggplant, lettuce; sclerotinia sclerotium such as tomato, cucumber, beans, strawberry, potato, rapeseed, cabbage, eggplant, lettuce ); Tomato, cucumber, legumes, radish, watermelon, eggplant, rapeseed, bell pepper, spinach, sugar beet, and various other types of seedling wilt (Rhizoctonia spp., Pythium spp., Fusarium spp., Phylophthroprosa sp., Etc.) Rustonia solanacearum of Solanaceae; downy mildew of cucurbits (Pseudoperonospora cubens); s), powdery mildew (Sphaerotheca fuliginea), anthracnose (Colletotrichum orbiculare), vine blight (Didymella bryoniae), Fusarium disease (Fusarium oxysporum), plague (Phytophthora parasitica, Phytophthora melonis, Phytophthora nicotianae, Phytophthora drechsleri, Phytophthora capsici Etc.), brown spot bacterial disease (Xhanthomonas campestris pv. Cucurbitae), soft rot (Erwinia carotovora subsp. Carotovora), spot bacterial disease (Pseudomonas syri) ... Gae pv lachrymans), edges bacterial grain rot (Pseudomonas marginalis pv marginalis), temple petitioner disease (Streptomyces sp), root disease (Agrobacterium rhizogenes), cucumber mosaic virus (Cucumber mosaic virus);
Tomato ring rot (Alternaria solani), leaf mold (Fulvia fulva), plague (Phytophthora infestans), wilt (Fusarium oxysporum), root rot (Pythium myriotium sulcus) Diseases (Claviobacter michiganensis), Stem Necrotic Bacterial Disease (Pseudomonas corrugata), Black Spot Bacterial Disease (Pseudomonas viridiflava), Soft Rot (Erwinia carrotova sp. ytoplasma asteris), yellow dwarf (Tobacco leaf curl subgroup III geminivirus); Brown spot bacterial disease (Pseudomonas cichorii), stem nematode bacterial disease (Pseudomonas corrugata), stem rot bacterial disease (Erwinia chrysanthemi), soft rot (Erwinia carotovora spores, spores of spores, spores, spores, spores, spores, spores and germs). Black rot (Alternaria brassicae), black rot (Xhanthomonas campestris pv. Campestris), black rot (Pseudomonas syringae pv. Eravia kuroa eroa var. Etc.), white spot disease (Cercosporella brassicae), root rot disease (Pharma lingam), clubroot disease (Plasmodiophora brassicae), downy mildew (Peronospora sarcoma, black rot sampa sampa samposa, black rot) Pseudomonas sy ringae pv. maculicola), soft rot (Erwinia carotovora subsp. carotovora);
Cabbage plant rot (Thanatephorus cucumeris), yellow rot (Fusarium oxysporum), black scab (Alternaria brassicicola); Chinese cabbage rot (Rhizotnia sulnia erutia succinata) ), Black leaf spot (Alternaria porri), white silk spot (Sclerotium rolfsii), white plague (Phytophthora porri), black rot fungus (Sclerotium sepivorum); Carot vora), spot bacterial disease (Pseudomonas syringae pv. syringae), rot (Erwinia rhapontici), scale rot (Burkholderia gladioli rot), and yellow rot (Phytoplasa saunia rot). Disease (Pseudomonas marginalis pv. Marginalis); soybean purpura (Cercospora kikuchii), black rot (Elsinoe glycines), black spot (Diaporthe phasoolz, rhizopha spores and lysophia rotoh rotoh rotonia sarcopodium) e), downy mildew (Peronospora manshurica), rust (Phakopsora pachyrhizi), anthrax (Colletotrichum truncatum, etc.), leaf blight (Xanthomonas camps pesgos pest. Anthrax (Colletotrichum lindemutianum), bacterial wilt (Ralstonia solanacearum), scab (Pseudomonas syringae pv. Phaseolicola), brown spot bacterial disease (Pseudomonas visamrais virions virion virion virion virion sv. . phaseoli);
Peanut black spot (Mycosphaerella berkeleyi), brown spot (Mycosphaerella arachidis), bacterial wilt (Ralstonia solanacearum); pea powdery mildew (Erysiphe psi), porphyra spermosis, downy mildew (Personia alba) syringae pv. pisi), vine rot (Xhanthomonas campestris pv. pisi); downy mildew (Peronospora viciae), plague (Phytophthora nicotianae); , Plague (Phyt ophthora infestans, silver scab (Helminthosporium solani), dry rot (Fusarium oxysporum, Fusarium solani), sponge scab (Spongospora serrata serrata), and bacterial wilt (Ralson scrotum). ), Scab (Streptomyces scabies, Streptomyces acidiscabies), soft rot (Erwinia carotovora subsp. sp. sepedonicus); Streptomyces ipomoea; Streptomyces leaf spot (Cercospora beticola), downy mildew (Peronospora schaecchia), Black root (Aphanomyces eschariis). Agrobacterium tumefaciens, Streptomyces scabies, Pseudomonas syringae pv. Aptata;
Bacterial leaf blight of carrots (Alternaria dauci), club scab (Rhizobacter dauci), apical carcinoma (Agrobacterium tumefaciens), Streptomyces scab (Streptomyces spop. Strawberry powdery mildew (Sphaerotheca aphanis var. Aphanis), plague (Phytophthora nicotianae, etc.), anthrax (Glomerella singulata, etc.), fruit rot (Pythium ultimum), bacterial rot (Stithium ultimum), Xanthomonas sclera campestris), Bacterial blight (Pseudomonas marginalis pv. Marginalis); tea leaf blast (Exobasidium reticulatus red scabies), anthracnose (Elsinoe leucospilatus vulgaris) syringae pv.theae), scab (Xhanthomonas campestris pv.theicola), witches' broom (Pseudomonas sp.); tobacco scab (Alternaria alternae), powdery mildew (Ericorrhea) hum gloeosporioides), late blight (Phytophthora nicotianae), Wildfire Disease (Pseudomonas syringae pv.tabaci), Huang and bacterial diseases (Pseudomonas syringae pv.mellea), cavity disease (Erwinia carotovora subsp. carotovora), damping off (Ralstonia solanacearum) , Tobacco mosaic virus;
Rust of coffee (Hemileia vastatrix); Black sigatoga disease of banana (Mycosphaerella fijiensis), Panama disease (Fusarium oxysporum f. Sp cubense); Cotton wilt disease (Fusaria moria, R. sarcoa) Sclerotinia sclerotiorum, Xanthomonas campestris pv. Malvacearum, Scab disease (Erwinia carotovora subsp. Fusarium sickness (Sphaerotheca pannosa, etc.), plague (Phytophthora megasperma), downy mildew (Peronospora sparsa), root carcinoma (Agrobacterium tumefaciens), chrysanthemum spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore spore sb. ), Plague (Phytophthora actorum), spot bacterial disease (Pseudomonas ichorii), soft rot (Erwinia carotovora subsp. ifolia); turf brown patch disease (Rhizoctonia solani), dollar spot disease (Sclerotinia homoeocarpa), curvularia leaf blight (Curvularia sp.), rust (Puccinia zoysia sp. , Scallops (Rynchosporium secalis), wilt (Gaeumannomyces graminis), anthrax (Colletotrichum sp.), Snow rot brown sclerotia (Typhula incarnata), snow rot black sclerophyll sari shirahi shira shira shira shira shira shira shira shira shira shira shira shira shira shikotsuka Bacterial bacterial rot (Myriosclerotinia borealis), fairy ring disease Marasmius Oreades etc.), Pythium disease (Pythium aphanidermatum, etc.), blast (Pyricularia grisea), and the like.
 本発明化合物は、本化合物単体で使用してもよいが、好ましくは、固体担体、液体担体、気体担体、界面活性剤、固着剤、分散剤、安定剤等と混合し、粉剤、水和剤、顆粒水和剤、水溶剤、顆粒水溶剤、粒剤、乳剤、液剤、マイクロエマルション剤、水性懸濁製剤、水性乳濁製剤、サスポエマルション製剤等の組成物として使用することができる。効果が発揮される限りにおいて、それらの組成物に限定されることはない。 The compound of the present invention may be used as the present compound alone, but is preferably mixed with a solid carrier, a liquid carrier, a gas carrier, a surfactant, a fixing agent, a dispersant, a stabilizer, etc., and a powder or wettable powder. , Granule wettable powder, aqueous solvent, granular aqueous solution, granule, emulsion, solution, microemulsion, aqueous suspension preparation, aqueous emulsion preparation, suspoemulsion preparation and the like. The composition is not limited as long as the effect is exhibited.
 以下に具体的な製剤化例を示すが、これらに限定されるものではない。 Specific formulation examples are shown below, but the invention is not limited to these.
[製剤例1 フロアブル剤]
 本発明化合物(10質量部)、ナフタレンスルホン酸のホルムアルデヒド縮合物ナトリウム塩(5質量部)、ポリオキシエチレンアリールフェニルエーテル(1質量部)、プロピレングリコール(5質量部)、シリコン系消泡剤(0.1質量部)、キサンタンガム(0.2質量部)、イオン交換水(78.7質量部)を混合してスラリーとなし、さらにダイノミルKDLで直径1.0mmのガラスビーズを用いて湿式粉砕しフロアブル剤を得る。
[Formulation Example 1 Flowable]
Compound of the present invention (10 parts by mass), sodium salt of formaldehyde condensate of naphthalenesulfonic acid (5 parts by mass), polyoxyethylene arylphenyl ether (1 part by mass), propylene glycol (5 parts by mass), silicon-based antifoaming agent ( 0.1 parts by mass), xanthan gum (0.2 parts by mass), ion-exchanged water (78.7 parts by mass) to form a slurry, and further wet milling using glass beads having a diameter of 1.0 mm with Dynomill KDL. To obtain a flowable agent.
[製剤例2 乳剤]
 本発明化合物(5質量部)をキシレン(40質量部)とシクロヘキサン(35質量部)の混合溶液に溶解し、この溶液にTween20(20質量部)を添加混合し、乳剤を得る。
[Formulation Example 2 Emulsion]
The compound of the present invention (5 parts by mass) is dissolved in a mixed solution of xylene (40 parts by mass) and cyclohexane (35 parts by mass), and Tween 20 (20 parts by mass) is added and mixed with the solution to obtain an emulsion.
[製剤例3 水和剤]
 本発明化合物(10質量部)、ホワイトカーボン(10質量部)、ポリビニルアルコール(2質量部)、ジオクチルスルホコハク酸ナトリウム塩(0.5質量部)、アルキルベンゼンスルホン酸ナトリウム塩(5質量部)、焼成珪藻土(10質量部)およびカオリナイトクレー(62.5質量部)を充分に混合し、エアーミルで粉砕し、水和剤を得る。
[Formulation Example 3 wettable powder]
Compound of the present invention (10 parts by mass), white carbon (10 parts by mass), polyvinyl alcohol (2 parts by mass), sodium salt of dioctylsulfosuccinate (0.5 part by mass), sodium salt of alkylbenzenesulfonic acid (5 parts by mass), calcining Diatomaceous earth (10 parts by mass) and kaolinite clay (62.5 parts by mass) are sufficiently mixed and pulverized with an air mill to obtain a wettable powder.
 以下、本発明の組成物(農園芸用有害生物防除剤、農園芸用殺菌剤)の施用について説明する。 The application of the composition of the present invention (agricultural / horticultural pest control agent, agricultural / horticultural fungicide) will be described below.
 本発明化合物を含有する組成物の施用方法としては、植物体もしくは種子と接触させる方法、または、栽培土壌に含有させて、植物の根もしくは地下茎に接触させる方法が挙げられる。具体例として、組成物の植物個体への茎葉散布処理、注入処理、苗箱処理、セルトレー処理、植物種子への吹き付け処理、植物種子への塗沫処理、植物種子への浸漬処理、植物種子への粉衣処理、土壌表面への散布処理、土壌表面への散布処理後の土壌混和、土壌中への注入処理、土壌中での注入処理後の土壌混和、土壌潅注処理、土壌潅注処理後の土壌混和等が挙げられる。通常、当業者が利用するようないかなる施用方法を用いても十分な効力を発揮する。 Examples of the method of applying the composition containing the compound of the present invention include a method of contacting with a plant or seed, or a method of adding the composition to cultivated soil and contacting with a root or rhizome of a plant. As specific examples, foliage spraying treatment, injection treatment, seedling box treatment, cell tray treatment, spraying treatment on plant seeds, spray treatment on plant seeds, immersion treatment on plant seeds, immersion treatment on plant seeds on plant seeds of the composition Dressing, spraying on the soil surface, soil mixing after spraying on the soil surface, injection into the soil, soil mixing after injection in the soil, soil irrigation, after soil irrigation Soil mixing and the like. In general, any method of application as used by those skilled in the art will work well.
 本発明でいう「植物」とは、光合成をして運動せずに生活するものをいう。具体例として、稲、小麦、大麦、トウモロコシ、コーヒー、バナナ、ブドウ、リンゴ、ナシ、モモ、オウトウ、カキ、カンキツ、大豆、インゲン、ワタ、イチゴ、ジャガイモ、キャベツ、レタス、トマト、キュウリ、ナス、スイカ、テンサイ、ホウレンソウ、サヤエンドウ、カボチャ、サトウキビ、タバコ、ピーマン、サツマイモ、サトイモ、コンニャク、綿、ヒマワリ、バラ、チューリップ、キク、芝等およびそれらのF1品種等が挙げられる。また、遺伝子等を人工的に操作することにより生み出され、元来自然界に存在するものではない遺伝子組み換え作物も含み、例えば、除草剤耐性を付与した大豆、トウモロコシ、綿等、寒冷地適応したイネ、タバコ等、殺虫物質生産能を付与したトウモロコシ、綿等の農園芸作物等が挙げられる。さらに、マツ、トネリコ、イチョウ、カエデ、カシ、ポプラ、ケヤキ等の樹木等が挙げられる。また、本発明でいう「植物体」とは、前記の植物個体を構成する全ての部位を総称するものであり、例えば、茎、葉、根、種子、花、果実等が挙げられる。 The term “plant” as used in the present invention refers to a plant that performs photosynthesis and lives without exercise. Specific examples include rice, wheat, barley, corn, coffee, banana, grape, apple, pear, peach, cherry, oyster, citrus, soybean, bean, cotton, strawberry, potato, cabbage, lettuce, tomato, cucumber, eggplant, Watermelon, sugar beet, spinach, snow pea, pumpkin, sugar cane, tobacco, bell pepper, sweet potato, taro, konjac, cotton, sunflower, rose, tulip, chrysanthemum, turf, etc. and their F1 varieties and the like can be mentioned. In addition, it includes genetically modified crops that are produced by manipulating genes and the like and are not originally present in the natural world.For example, soybeans, corn, cotton, etc. that have been imparted with herbicide resistance, such as rice adapted to cold regions. And agricultural and horticultural crops, such as corn and cotton, to which insecticide-producing ability is imparted. Further, trees such as pine, ash, ginkgo, maple, oak, poplar, zelkova and the like can be mentioned. The “plant” in the present invention is a general term for all parts constituting the above-mentioned plant individual, and includes, for example, stems, leaves, roots, seeds, flowers, fruits and the like.
 本発明でいう「種子」とは、幼植物が発芽するための栄養分を蓄え、農業上繁殖に用いられるものをいう。具体例として、トウモロコシ、大豆、綿、稲、テンサイ、小麦、大麦、ヒマワリ、トマト、キュウリ、ナス、ホウレンソウ、サヤエンドウ、カボチャ、サトウキビ、タバコ、ピーマン、セイヨウアブラナ等の種子、それらのF1品種等の種子、サトイモ、ジャガイモ、サツマイモ、コンニャク等の種芋、食用ゆり、チューリップ等の球根、ラッキョウ等の種球、および遺伝子組み換え作物の種子ならびに塊茎等が挙げられる。 The term “seed” as used in the present invention refers to a seed that stores nutrients for germination of young plants and is used for agricultural reproduction. Specific examples include seeds of corn, soybeans, cotton, rice, sugar beet, wheat, barley, sunflower, tomato, cucumber, eggplant, spinach, snow peas, pumpkin, sugar cane, tobacco, peppers, oilseed rape, and their F1 varieties. Examples include seeds, seed potatoes such as taro, potato, sweet potato, and konjac, edible lilies, bulbs such as tulips, seed balls such as rakkyo, and seeds and tubers of genetically modified crops.
 本発明化合物を含有する組成物の施用量および施用濃度は、対象作物、対象病害、病害の発生程度、化合物の剤型、施用方法および各種環境条件等によって変動するが、散布または潅注する場合には、有効成分量としてヘクタール当たり0.1~10,000gが適当であり、好ましくは、ヘクタール当り10~1,000gである。また、種子処理の場合の使用量は、有効成分量として種子1kg当たり0.0001~1000gであり、好ましくは、0.001~100gである。本発明化合物を含有する組成物を植物個体への茎葉散布処理、土壌表面への散布処理、土壌中への注入処理または土壌潅注処理として使用する場合は、適当な担体に適当な濃度で希釈した後、処理を行ってもよい。本発明化合物を含有する組成物を植物種子に接触させる場合は、適当な濃度に希釈した後、植物種子に浸漬、粉衣、吹き付けまたは塗沫処理して用いてもよい。浸漬、粉衣、吹き付けまたは塗沫処理する場合の組成物使用量は、通常、有効成分量として、乾燥植物種子重量の0.05~50%程度であり、好ましくは、0.1~30%が適当であるが、組成物の形態や処理対象となる植物種子の種類により適宜設定すればよく、これら範囲に限定されるものではない。 The application rate and application concentration of the composition containing the compound of the present invention vary depending on the target crop, target disease, degree of disease occurrence, dosage form of the compound, application method and various environmental conditions, but when spraying or irrigating. Is suitably 0.1 to 10,000 g per hectare, and preferably 10 to 1,000 g per hectare. In the case of seed treatment, the amount used is 0.0001 to 1000 g, preferably 0.001 to 100 g, per 1 kg of seeds as the amount of active ingredient. When the composition containing the compound of the present invention is used as a foliage spraying treatment on a plant individual, a spraying treatment on a soil surface, an injection treatment into soil or a soil irrigation treatment, the composition is diluted with an appropriate carrier at an appropriate concentration. Thereafter, the processing may be performed. When the composition containing the compound of the present invention is brought into contact with a plant seed, it may be diluted to an appropriate concentration and then immersed, dressed, sprayed or smeared on the plant seed before use. The amount of the composition used in the case of dipping, dressing, spraying or smearing is usually about 0.05 to 50%, preferably 0.1 to 30% of the weight of dry plant seeds as the amount of active ingredient. Is suitable, but it may be appropriately set depending on the form of the composition and the kind of plant seed to be treated, and is not limited to these ranges.
 本発明化合物を含有する組成物は、必要に応じて他の農薬、例えば、殺菌剤、殺虫剤、殺ダニ剤、殺線虫剤、除草剤、生物農薬および植物成長調節剤等の農薬、核酸を有効成分とする病害防除剤(国際公開第2014/062775号)、土壌改良剤または肥効物質と混合して使用することができる。本発明化合物と他の農薬を混合して使用する方法としては、本発明化合物と他の農薬とを一つの剤型に製剤化して使用する方法、それぞれが別々の剤型に製剤化された両者を使用前に混合して使用する方法、それぞれが別々の剤型に製剤化された両者を同時に使用する方法、または、それぞれが別々の剤型に製剤化された両者について、いずれか一方を使用した後に他方を使用する方法が挙げられる。 The composition containing the compound of the present invention, if necessary, other pesticides, for example, fungicides, insecticides, acaricides, nematicides, herbicides, pesticides such as biological pesticides and plant growth regulators, nucleic acids. It can be used as a mixture with a disease controlling agent (International Publication No. 2014/062775) containing as an active ingredient, a soil conditioner or a fertilizer. As a method of mixing and using the compound of the present invention and another pesticide, a method of formulating and using the compound of the present invention and another pesticide in one dosage form, and both methods in which each is formulated in a separate dosage form Are used before and after use, or both are separately formulated in separate dosage forms, or both are formulated in separate dosage forms. And then use the other.
 本発明化合物と混合して使用することができる殺菌剤に含まれる具体的な成分は、以下の群bで例示され、これらの塩、異性体およびN-オキシド体を含む。ただし、公知の殺菌剤はこれらに限定されるものではない。 Specific components contained in the bactericide that can be used by mixing with the compound of the present invention are exemplified in the following group b, and include salts, isomers and N-oxides thereof. However, the known disinfectants are not limited to these.
群b:
b-1:フェニルアミド系殺菌剤
 フェニルアミド系殺菌剤として、[b-1.1]:ベナラキシル(benalaxyl)、[b-1.2]ベナラキシルMまたはキララキシル(benalaxyl-Mまたはkiralaxyl)、[b-1.3]フララキシル(furalaxyl)、[b-1.4]メタラキシル(metalaxyl)、[b-1.5]メタラキシルMまたはメフェノキサム(metalaxyl-Mまたはmefenoxam)、[b-1.6]オキサジキシル(oxadixyl)、[b-1.7]オフラセ(ofurace)等が挙げられる。
Group b:
b-1: Phenylamide fungicide As a phenylamide fungicide, [b-1.1]: benalaxyl (benalaxyl), [b-1.2] benalaxyl M or chiralaxyl (benalaxyl-M or chiralaxyl), [b -1.3] Furalaxyl, [b-1.4] Metalaxyl, [b-1.5] Metalaxyl M or Mephenoxam (Metalaxyl-M or mefenoxam), [b-1.6] Oxadixyl (-) oxadixyl), [b-1.7] off-race, and the like.
b-2:有糸核分裂および細胞分裂阻害剤
 有糸核分裂および細胞分裂阻害剤として、[b-2.1]ベノミル(benomyl)、[b-2.2]カルベンダジム(carbendazim)、[b-2.3]フベリダゾール(fuberidazole)、[b-2.4]チアベンダゾール(thiabendazole)、[b-2.5]チオファネート(thiophanate)、[b-2.6]チオファネートメチル(thiophanate-methyl)、[b-2.7]ジエトフェンカルブ(diethofencarb)、[b-2.8]ゾキサミド(zoxamide)、[b-2.9]エタボキサム(ethaboxam)、[b-2.10]ペンシクロン(pencycuron)、[b-2.11]フルオピコリド(fluopicolide)、[b-2.12]フェナマクリル(phenamacril)等が挙げられる。
b-2: mitotic cell division and cell division inhibitor As a mitotic cell division and cell division inhibitor, [b-2.1] benomyl, [b-2.2] carbendazim, [b- 2.3] fuberidazole, [b-2.4] thiabendazole, [b-2.5] thiophanate, [b-2.6] thiophanate-methyl, [b- 2.7] Diethofencarb, [b-2.8] zoxamide, [b-2.9] ethaboxam, [b-2.10] pencycuron, [b-2. 11] Full opico Lido (fluopicolide), [b-2.12] phenamacril and the like can be mentioned.
b-3:コハク酸脱水素酵素阻害剤(SDHI剤)
 コハク酸脱水素酵素阻害剤(SDHI剤)として、[b-3.1]ベノダニル(benodanil)、[b-3.2]ベンゾビンジフルピル(benzovindiflupyr)、[b-3.3]ビキサフェン(bixafen)、[b-3.4]ボスカリド(boscalid)、[b-3.5]カルボキシン(carboxin)、[b-3.6]フェンフラム(fenfuram)、[b-3.7]フルオピラム(fluopyram)、[b-3.8]フルトラニル(flutolanil)、[b-3.9]フルキサピロキサド(fluxapyroxad)、[b-3.10]フラメトピル(furametpyr)、[b-3.11]イソフェタミド(isofetamid)、[b-3.12]イソピラザム(isopyrazam)、[b-3.13]メプロニル(mepronil)、[b-3.14]オキシカルボキシン(oxycarboxin)、[b-3.15]ペンチオピラド(penthiopyrad)、[b-3.16]ペンフルフェン(penflufen)、[b-3.17]ピジフルメトフェン(pydiflumetofen)、[b-3.18]セダキサン(sedaxane)、[b-3.19]チフルザミド(thifluzamide)、[b-3.20]ピラジフルミド(pyraziflumid)等が挙げられる。
b-3: Succinate dehydrogenase inhibitor (SDHI agent)
As a succinate dehydrogenase inhibitor (SDHI agent), [b-3.1] benodanil, [b-3.2] benzobindiflupyr, [b-3.3] bixaphen (bixafen) ), [B-3.4] boscalid, [b-3.5] carboxin, [b-3.6] fenfuram, [b-3.7] fluopyram. , [B-3.8] flutolanil, [b-3.9] fluxapyroxad, [b-3.10] furametpyr, [b-3.11] isofetamide (isofetamide). ), [B-3.12] isopyrazam (isop razam), [b-3.13] mepronil, [b-3.14] oxycarboxin, [b-3.15] penthiopyrad, [b-3.16] penflufen ( penflufen), [b-3.17] pydiflumethofen, [b-3.18] sedaxane, [b-3.19] thifluzamide, [b-3.20] pyradiflumide. (Pyraziflumid) and the like.
b-4:キノン外部阻害剤(QoI剤)
 キノン外部阻害剤(QoI剤)として、[b-4.1]アゾキシストロビン(azoxystrobin)、[b-4.2]クモキシストロビン(coumoxystrobin)、[b-4.3]ジモキシストロビン(dimoxystrobin)、[b-4.4]エノキサストロビン(enoxastrobin)、[b-4.5]ファモキサドン(famoxadone)、[b-4.6]フェンアミドン(fenamidone)、[b-4.7]フェナミンストロビン(fenaminstrobin)、[b-4.8]フルフェノキシストロビン(flufenoxystrobin)、[b-4.9]フルオキサストロビン(fluoxastrobin)、[b-4.10]クレソキシムメチル(kresoxim-methyl)、[b-4.11]マンデストロビン(mandestrobin)、[b-4.12]メトミノストロビン(metominostrobin)、[b-4.13]オリサストロビン(orysastrobin)、[b-4.14]ピコキシストロビン(picoxystrobin)、[b-4.15]ピラクロストロビン(pyraclostrobin)、[b-4.16]ピラメトストロビン(pyrametostrobin)、[b-4.17]ピラオキシストロビン(pyraoxystrobin)、[b-4.18]ピリベンカルブ(pyribencarb)、[b-4.19]トリクロピリカルブ(triclopyricarb)、[b-4.20]トリフロキシストロビン(trifloxystrobin)等が挙げられる。
b-4: Quinone external inhibitor (QoI agent)
As a quinone external inhibitor (QoI agent), [b-4.1] azoxystrobin, [b-4.2] cumoxystrobin, [b-4.3] dimoxist Robin (dimoxystrobin), [b-4.4] enoxastrobin (enoxastrobin), [b-4.5] famoxadone, [b-4.6] fenamidone, [b-4.7. ] Phenamine stroben, [b-4.8] fluphenoxystrobin, [b-4.9] fluoxastrobin, [b-4.10] kresoxim-methyl (kresoxim-me) hyl), [b-4.11] mandestrobin, [b-4.12] metaminostrobin, [b-4.13] orysastrobin, [b-4.14]. Picoxystrobin, [b-4.15] pyraclostrobin, [b-4.16] pyrametostrobin, [b-4.17] pyraoxystrobin , [B-4.18] pyribencarb, [b-4.19] triclopyricarb, [b-4.20] trifloxystrobin. obin), and the like.
b-5:キノン内部阻害剤(QiI剤)
 キノン内部阻害剤(QiI剤)として、[b-5.1]シアゾファミド(cyazofamid)、[b-5.2]アミスルブロム(amisulbrom)等が挙げられる。
b-5: quinone internal inhibitor (QiI agent)
Examples of the quinone internal inhibitor (QiI agent) include [b-5.1] cyazofamide and [b-5.2] amisulbrom.
b-6:酸化的リン酸化脱共役阻害剤
 酸化的リン酸化脱共役阻害剤として、[b-6.1]ビナパクリル(binapacryl)、[b-6.2]メプチルジノカップ(meptyldinocap)、[b-6.3]ジノカップ(dinocap)、[b-6.4]フルアジナム(fluazinam)等が挙げられる。
b-6: Oxidative phosphorylation uncoupling inhibitor As an oxidative phosphorylation uncoupling inhibitor, [b-6.1] binapacryl (binapacryl), [b-6.2] meptyldinocap, [b-6.2] Examples thereof include b-6.3] dinocap and [b-6.4] fluazinam.
b-7:キノン外部スチグマテリン結合サブサイト阻害剤(QoSI剤)
 キノン外部スチグマテリン結合サブサイト阻害剤(QoSI剤)として、[b-7.1]アメトクトラジン(ametoctradin)等が挙げられる。
b-7: quinone external stigmaterin-binding subsite inhibitor (QOSI agent)
Examples of the quinone external stigmaterin-binding subsite inhibitor (QOSI agent) include [b-7.1] amethoctrazine.
b-8:アミノ酸生合成阻害剤
 アミノ酸生合成阻害剤として、[b-8.1]シプロジニル(cyprodinil)、[b-8.2]メパニピリム(mepanipyrim)、[b-8.3]ピリメタニル(pyrimethanil)等が挙げられる。
b-8: Amino acid biosynthesis inhibitor As an amino acid biosynthesis inhibitor, [b-8.1] cyprodinil, [b-8.2] mepanipyrim, and [b-8.3] pyrimethanil (pyrimethanil). ) And the like.
b-9:タンパク質生合成阻害剤
 タンパク質生合成阻害剤として、[b-9.1]ストレプトマイシン(streptomycin)、[b-9.2]ブラストサイジンS(blasticidin-S)、[b-9.3]カスガマイシン(kasugamycin)、[b-9.4]オキシテトラサイクリン(oxytetracycline)等が挙げられる。
b-9: Protein biosynthesis inhibitor [b-9.1] streptomycin, [b-9.2] blasticidin S (blasticidin-S), [b-9. 3] Kasugamycin, [b-9.4] oxytetracycline and the like.
b-10:シグナル伝達阻害剤
 シグナル伝達阻害剤として、[b-10.1]フェンピクロニル(fenpiclonil)、[b-10.2]フルジオキソニル(fludioxonil)、[b-10.3]キノキシフェン(quinoxyfen)、[b-10.4]プロキナジド(proquinazid)、[b-10.5]クロゾリネート(chlozolinate)、[b-10.6]ジメタクロン(dimethachlone)、[b-10.7]イプロジオン(iprodione)、[b-10.8]プロシミドン(procymidone)、[b-10.9]ビンクロゾリン(vinclozolin)等が挙げられる。
b-10: Signal transduction inhibitor As a signal transduction inhibitor, [b-10.1] fenpiclonil, [b-10.2] fludioxonil, [b-10.3] quinoxyphen, [B-10.4] proquinazid, [b-10.5] chlorozolinate, [b-10.6] dimethaclone, [b-10.7] iprodione, [b -10.8] procymidone, [b-10.9] vinclozoline and the like can be mentioned.
b-11:脂質および細胞膜生合成阻害剤
 脂質および細胞膜生合成阻害剤として、[b-11.1]エジフェンホス(edifenphos)、[b-11.2]イプロベンホス(iprobenfos)、[b-11.3]ピラゾホス(pyrazophos)、[b-11.4]イソプロチオラン(isoprothiolane)、[b-11.5]ビフェニル(biphenyl)、[b-11.6]クロロネブ(chloroneb)、[b-11.7]ジクロラン(dicloran)、[b-11.8]キントゼン(quintozene)、[b-11.9]テクナゼン(tecnazene)、[b-11.10]トルクロホスメチル(tolclofos-methyl)、[b-11.11]エトリジアゾール(echlomezol or etridiazole)、[b-11.12]ヨードカルブ(iodocarb)、[b-11.13]プロパモカルブ(propamocarb)、[b-11.14]プロチオカルブ(prothiocarb)等が挙げられる。
b-11: Lipid and Cell Membrane Biosynthesis Inhibitors [b-11.1] edifenphos, [b-11.2] iprobenphos, [b-11.3] as lipid and cell membrane biosynthesis inhibitors. ] Pyrazophos, [b-11.4] isoprothiolane, [b-11.5] biphenyl, [b-11.6] chloroneb, [b-11.7] dichlorane (Dicloran), [b-11. 8] quintozene, [b-11. 9] tecnazene, [b-11.10] tolclofos-methyl, [b-11.11]. Etridiazole (ec hlomezol or etridiazole), [b-11.12] iodocarb, [b-11.13] propamocarb, [b-11.14] prothiocarb, and the like.
b-12:脱メチル化阻害剤(DMI剤)
 脱メチル化阻害剤(DMI剤)として、[b-12.1]アザコナゾール(azaconazole)、[b-12.2]ビテルタノール(bitertanol)、[b-12.3]ブロムコナゾール(bromuconazole)、[b-12.4]シプロコナゾール(cyproconazole)、[b-12.5]ジフェノコナゾール(difenoconazole)、[b-12.6]ジニコナゾール(diniconazole)、[b-12.7]ジニコナゾールM(diniconazole-M)、[b-12.8]エポキシコナゾール(epoxiconazole)、[b-12.9]エタコナゾール(etaconazole)、[b-12.10]フェナリモル(fenarimol)、[b-12.11]フェンブコナゾール(fenbuconazole)、[b-12.12]フルキンコナゾール(fluquinconazole)、[b-12.13]キンコナゾール(quinconazole)、[b-12.14]フルシラゾール(flusilazole)、[b-12.15]フルトリアホール(flutriafol)、[b-12.16]ヘキサコナゾール(hexaconazole)、[b-12.17]イマザリル(imazalil)、[b-12.18]イミベンコナゾール(imibenconazole)、[b-12.19]イプコナゾール(ipconazole)、[b-12.20]メトコナゾール(metconazole)、[b-12.21]ミクロブタニル(myclobutanil)、[b-12.22]ヌアリモール(nuarimol)、[b-12.23]オキスポコナゾール(oxpoconazole)、[b-12.24]オキスポコナゾールフマル酸塩(oxpoconazole fumarate)、[b-12.25]ペフラゾエート(pefurazoate)、[b-12.26]ペンコナゾール(penconazole)、[b-12.27]プロクロラズ(prochloraz)、[b-12.28]プロピコナゾール(propiconazole)、[b-12.29]プロチオコナゾール(prothioconazole)、[b-12.30]ピリフェノックス(pyrifenox)、[b-12.31]ピリソキサゾール(pyrisoxazole)、[b-12.32]シメコナゾール(simeconazole)、[b-12.33]テブコナゾール(tebuconazole)、[b-12.34]テトラコナゾール(tetraconazole)、[b-12.35]トリアジメホン(triadimefon)、[b-12.36]トリアジメノール(triadimenol)、[b-12.37]トリフルミゾール(triflumizole)、[b-12.38]トリホリン(triforine)、[b-12.39]トリチコナゾール(triticonazole)[b-12.40]メフェントリフルコナゾール(mefentrifluconazole)、[b-12.41]イプフェントリフルコナゾール(ipfentrifluconazole)等が挙げられる。
b-12: Demethylation inhibitor (DMI agent)
Examples of demethylation inhibitors (DMI agents) include [b-12.1] azaconazole, [b-12.2] bitertanol, [b-12.3] bromuconazole, and [b-12.3] bromuconazole. [b-12.4] cyproconazole, [b-12.5] difenoconazole, [b-12.6] diniconazole, [b-12.7] diniconazole M (diniconazole-M) ), [B-12.8] epoxyconazole, [b-12.9] ethaconazole, [b-12.10] phenarimol, [b-12.11]. Fenbuconazole, [b-12.12] fluquinconazole, [b-12.13] quinconazole, [b-12.14] flusilazole, [b-12] .15] Flutriafol, [b-12.16] hexaconazole, [b-12.17] imazalil, [b-12.18] imibenconazole, [B-12.19] ipconazole, [b-12.20] metconazole, [b-12.21] microbutanil , [B-12.22] nuarimol, [b-12.23] oxpoconazole, [b-12.24] oxpoconazole fumarate, [b- 12.25] pefurazoate, [b-12.26] penconazole, [b-12.27] prochloraz, [b-12.28] propiconazole, [b- 12.29] Prothioconazole, [b-12.30] Pyrifenox, [b-12.31] Pyrisoxazole, [b-12.32] Cimeconazole, [b-12.33] tebuconazole, [b-12.34] tetraconazole, [b-12.35] triadimefone, [b-12.36]. Triadimenol, [b-12.37] triflumizole, [b-12.38] triforine, [b-12.39] triticonazole [b-12] .40] mefentrifluconazole, [b-12.41] ipfentrifluconazole, and the like.
b-13:アミン系殺菌剤
 アミン系殺菌剤として、[b-13.1]アルジモルフ(aldimorph)、[b-13.2]ドデモルフ(dodemorph)、[b-13.3]フェンプロピモルフ(fenpropimorph)、[b-13.4]トリデモルフ(tridemorph)、[b-13.5]フェンプロピジン(fenpropidin)、[b-13.6]ピペラリン(piperalin)、[b-13.7]スピロキサミン(spiroxamine)等が挙げられる。
b-13: Amine-based bactericide As amine-based bactericide, [b-13.1] aldimorph, [b-13.2] dodemorph, [b-13.3] fenpropimorph ), [B-13.4] tridemorph, [b-13.5] phenpropidin, [b-13.6] piperalin, [b-13.7] spiroxamine. ) And the like.
b-14:ステロール生合成のC4位脱メチル化における3-ケト還元酵素阻害剤
 ステロール生合成のC4位脱メチル化における3-ケト還元酵素阻害剤として、[b-14.1]フェンヘキサミド(fenhexamid)、[b-14.2]フェンピラザミン(fenpyrazamine)等が挙げられる。
b-14: 3-keto reductase inhibitor in C4 demethylation of sterol biosynthesis [b-14.1] phenhexamide as a 3-keto reductase inhibitor in C4 demethylation of sterol biosynthesis (Fenhexamid), [b-14.2] fenpyrazamine, and the like.
b-15:ステロール生合成のスクアレンエポキシダーゼ阻害剤
 ステロール生合成のスクアレンエポキシダーゼ阻害剤として、[b-15.1]ピリブチカルブ(pyributicarb)、[b-15.2]ナフチフィン(naftifine)、[b-15.3]テルビナフィン(terbinafine)等が挙げられる。
b-15: Squalene epoxidase inhibitor for sterol biosynthesis As a squalene epoxidase inhibitor for sterol biosynthesis, [b-15.1] pyributicarb (b-15.2) naphthifine (naftifine), [b] -15.3] Terbinafine and the like can be mentioned.
b-16:細胞壁生合成阻害剤
 細胞壁生合成阻害剤として、[b-16.1]ポリオキシン類(polyoxins)、[b-16.2]ジメトモルフ(dimethomorph)、[b-16.3]フルモルフ(flumorph)、[b-16.4]ピリモルフ(pyrimorph)、[b-16.5]ベンチアバリカルブ(benthiavalicarb)、[b-16.6]ベンチアバリカルブイソプロピル(benthivalicarb-isopropyl)、[b-16.7]イプロバリカルブ(iprovalicarb)、[b-16.8]マンジプロパミド(mandipropamid)、[b-17.9]バリフェナレート(valifenalate)等が挙げられる。
b-16: Cell wall biosynthesis inhibitor As a cell wall biosynthesis inhibitor, [b-16.1] polyoxins (polyoxins), [b-16.2] dimethomorph, [b-16.3] flumorph ( flumorph), [b-16.4] pyrimorph, [b-16.5] bench avalicarb, [b-16.6] bench avalicarb isopropyl (b). -16.7] iprovalicarb, [b-16.8] mandipropamide, [b-17.9] valifenalate and the like can be mentioned.
b-17:メラニン生合成阻害剤
 メラニン生合成阻害剤として、[b-17.1]フサライド(phthalide or fthalide)、[b-17.2]ピロキロン(pyroquilone)、[b-17.3]トリシクラゾール(tricyclazole)、[b-17.4]カルプロパミド(carpropamid)、[b-17.5]ジクロシメット(diclocymet)、[b-17.6]フェノキサニル(fenoxanil)、[b-17.7]トルプロカルブ(tolprocarb)等が挙げられる。
b-17: Melanin biosynthesis inhibitor As a melanin biosynthesis inhibitor, [b-17.1] phtalide or phthalide, [b-17.2] pyroquilon, [b-17.3] tricyclazole. (Tricylazole), [b-17.4] carpropamide, [b-17.5] diclocymet, [b-17.6] phenoxanil, [b-17.7] tolprocarb. ) And the like.
b-18:宿主植物抵抗性誘導剤
 宿主植物抵抗性誘導剤として、[b-18.1]アシベンゾラルSメチル(acibenzolar-S-methyl)、[b-18.2]プロベナゾール(probenazole)、[b-18.3]チアジニル(tiadinil)、[b-18.4]イソチアニル(isotianil)、[b-18.5]ラミナリン(laminarin)等が挙げられる。
b-18: Host plant resistance inducer [b-18.1] acibenzolar S-methyl (acibenzalar-S-methyl), [b-18.2] probenazole (b), and [b-18.2] -18.3] thiazinyl (tiadinil), [b-18.4] isotianil, [b-18.5] laminarin and the like can be mentioned.
b-19:ジチオカーバメート系殺菌剤
 ジチオカーバメート系殺菌剤として、[b-19.1]マンコゼブまたはマンゼブ(mancozeb or manzeb)、[b-19.2]マンネブ(maneb)、[b-19.3]メチラム(metiram)、[b-19.4]プロピネブ(propineb)、[b-19.5]チウラム(thiram)、[b-19.6]ジネブ(zineb)、[b-19.7]ジラム(ziram)、[b-19.8]フェルバム(ferbam)等が挙げられる。
b-19: Dithiocarbamate fungicide As a dithiocarbamate fungicide, [b-19.1] mancozeb or manzeb (mancozeb or manzeb), [b-19.2] manneb, [b-19.3]. ] Metiram, [b-19.4] propineb, [b-19.5] thiuram, [b-19.6] zineb, [b-19.7] ziram (Ziram), [b-19.8] ferbam and the like.
b-20:フタルイミド系殺菌剤
 フタルイミド系殺菌剤として、[b-20.1]キャプタン(captan)、[b-20.2]キャプタホール(captafol)、[b-20.3]ホルペット(folpet)、[b-20.4]フルオロホルペット(fluorofolpet)等が挙げられる。
b-20: Phthalimide bactericide As phthalimide bactericide, [b-20.1] captan (captan), [b-20.2] captafol (captafol), [b-20.3] folpet (folpet) ), [B-20.4] fluorofolpet and the like.
b-21:グアニジン系殺菌剤
 グアニジン系殺菌剤として、[b-21.1]グアザチン(guazatine)、[b-21.2]イミノクタジン(iminoctadine)、[b-21.3]イミノクタジンアルベシル酸塩(iminoctadine albesilate)、[b-21.4]イミノクタジン三酢酸塩(iminoctadine triacetate)等が挙げられる。
b-21: Guanidine fungicide As a guanidine fungicide, [b-21.1] guazatin, [b-21.2] iminoctadine, [b-21.3] iminoctadine albesylate (Imnoctadine albesilate), [b-21.4] iminoctadine triacetate and the like.
b-22:多作用点接触活性型殺菌剤
 多作用点接触活性型殺菌剤として、[b-22.1]塩基性塩化銅(copper oxychloride)、[b-22.2]水酸化第二銅(copper(II) hydroxide)、[b-22.3]塩基性硫酸銅(copper hydroxide sulfate)、[b-22.4]有機銅化合物(organocopper compound)、[b-22.5]ドデシルベンゼンスルホン酸ビスエチレンジアミン銅錯塩[II](Dodecylbenzenesulphonic acid bisethylenediamine copper [II] salt、DBEDC)、[b-22.6]硫黄(sulphur)、[b-22.7]フルオルイミド(fluoroimide)、[b-22.8]クロロタロニル(chlorothalonil)、[b-22.9]ジクロフルアニド(dichlofluanid)、[b-22.10]トリルフルアニド(tolylfluanid)、[b-22.11]アニラジン(anilazine)、[b-22.12]ジチアノン(dithianon)、[b-22.13]キノメチオナート(chinomethionat or quinomethionate)、[b-22.14]ハウチワマメ苗木の子葉からの抽出物(BLAD)等が挙げられる。
b-22: Multi-action point contact active type bactericide [b-22.1] basic copper chloride (copper oxychloride), [b-22.2] cupric hydroxide (Copper (II) hydroxide), [b-22.3] basic copper sulfate (copper hydroxide sulfate), [b-22.4] organic copper compound (organocopper compound), [b-22.5] dodecylbenzene sulfone Acid bisethylenediamine copper complex salt [II] (Dodecylbenzene sulphonic acid bisethylenediamineamine copper [II] salt, DBEDC), [b-22.6] sulphur, [b-22.7] fluorimide (fluorim). de), [b-22.8] chlorothalonil, [b-22.9] diclofluanid, [b-22.10] tolylfluanid, [b-22.11]. Anilazine, [b-22.12] dithianon, [b-22.13] quinomethionate or quinomethionate, [b-22.14] extract from cotyledon of Japanese bean seedling (BLAD), etc. Is mentioned.
b-23:その他の殺菌剤
 その他の殺菌剤として、[b-23.1]ジクロベンチアゾクス(dichlobentiazox)、[b-23.2]フェンピコキサミド(fenpicoxamid)、[b-23.3]ジピメチトロン(dipymetitrone)、[b-23.4]ブピリメート(bupirimate)、[b-23.5]ジメチリモール(dimethirimol)、[b-23.6]エチリモール(ethirimol)、[b-23.7]酢酸トリフェニルスズ(fentin acetate)、[b-23.8]塩化トリフェニルスズ(fentin chloride)、[b-23.9]水酸化トリフェニルスズ(fentin hydroxide)、[b-23.10]オキソリニック酸(oxolinic acid)、[b-23.11]ヒメキサゾール(hymexazol)、[b-23.12]オクチリノン(octhilinone)、[b-23.13]ホセチル(fosetyl)、[b-23.14]亜リン酸(phosphorous acid)、[b-23.15]亜リン酸のナトリウム塩(sodium phosphite)、[b-23.16]亜リン酸のアンモニウム塩(ammonium phosphite)、[b-23.17]亜リン酸のカリウム塩(potassium phosphite)、[b-23.18]テクロフタラム(tecloftalam)、[b-23.19]トリアゾキシド(triazoxide)、[b-23.20]フルスルファミド(flusulfamide)、[b-23.21]ジクロメジン(diclomezine)、[b-23.22]シルチオファム(silthiofam)、[b-23.23]ジフルメトリム(diflumetorim)、[b-23.24]メタスルホカルブ(methasulfocarb)、[b-23.25]シフルフェナミド(cyflufenamid)、[b-23.26]メトラフェノン(metrafenone)、[b-23.27]ピリオフェノン(pyriofenone)、[b-23.28]ドジン(dodine)、[b-23.29]フルチアニル(flutianil)、[b-23.30]フェリムゾン(ferimzone)、[b-23.31]オキサチアピプロリン(oxathiapiprolin)、[b-23.32]テブフロキン(tebufloquin)、[b-23.33]ピカルブトラゾクス(picarbutrazox)、[b-23.34]バリダマイシン類(validamycins)、[b-23.35]シモキサニル(cymoxanil)、[b-23.36]キノフメリン(quinofumelin)、
b-23: Other fungicides As other fungicides, [b-23.1] diclobentiazox, [b-23.2] fenpicoxamide, [b-23.3]. ] Dipymetitron, [b-23.4] bupyrimate, [b-23.5] dimethirimol, [b-23.6] ethirimol, [b-23.7] acetic acid Triphenyl tin (fentin acetate), [b-23.8] triphenyl tin chloride (fentin chloride), [b-23.9] triphenyl tin hydroxide (fentin hydroxide), [b-23.10] oxolinic acid (Oxo linic acid), [b-23.11] hymexazol, [b-23.12] octilinone, [b-23.13] fosetyl, [b-23.14] phosphite. (Phosphorus acid), sodium salt of [b-23.15] phosphite (sodium phosphite), ammonium salt of [b-23.16] phosphite (ammonium phosphite), [b-23.17] phosphite. Potassium salt of acid (potassium phosphite), [b-23.18] tecloftalam, [b-23.19] triazoxide, [b-23.20] fursulfamide. [B-23.21] dichromezine, [b-23.22] silthiofam, [b-23.23] diflumetrim, [b-23.24] metasulphocarb, [B-23.25] cyflufenamide, [b-23.26] metrafenone, [b-23.27] pyriophenone, [b-23.28] dodine, [b] -23.29] flutianil, [b-23.30] ferrimzone, [b-23.31] oxathiapiproline, [b-23. 32] tebufloquine, [b-23.33] picarbutrazox, [b-23.34] validamycins, [b-23.35] cymoxanil, [b- 23.36] quinofumelin,
[b-23.37]式(s1)
Figure JPOXMLDOC01-appb-C000070

で表される化合物(国際公開第98/046607号参照)、
[B-23.37] Expression (s1)
Figure JPOXMLDOC01-appb-C000070

(See WO 98/046607),
[b-23.38]式(s2)
Figure JPOXMLDOC01-appb-C000071

で表される化合物(国際公開第08/148570号参照)、
[B-23.38] Expression (s2)
Figure JPOXMLDOC01-appb-C000071

(See WO 08/148570),
[b-23.39]式(s3)
Figure JPOXMLDOC01-appb-C000072

で表される化合物(国際公開第92/012970号参照)、
[B-23.39] Expression (s3)
Figure JPOXMLDOC01-appb-C000072

(See WO 92/012970),
[b-23.40]式(s4)
Figure JPOXMLDOC01-appb-C000073

で表される化合物(国際公開第12/084812号参照)、
[B-23.40] Expression (s4)
Figure JPOXMLDOC01-appb-C000073

A compound represented by the following formula (see International Publication No. 12/084812):
[b-23.41]式(s5)
Figure JPOXMLDOC01-appb-C000074

で表される化合物(gougerotin)、
[B-23.41] Expression (s5)
Figure JPOXMLDOC01-appb-C000074

A compound (gougerotin) represented by
[b-23.42]式(s6)
Figure JPOXMLDOC01-appb-C000075

で表される化合物(ningnanmycin)、
[B-23.42] Expression (s6)
Figure JPOXMLDOC01-appb-C000075

A compound (ningnanmycin) represented by:
[b-23.43]式(s7)
Figure JPOXMLDOC01-appb-C000076

で表される化合物(国際公開第10/136475号参照)、
[B-23.43] Expression (s7)
Figure JPOXMLDOC01-appb-C000076

(See WO 10/136475),
[b-23.44]式(s8)
Figure JPOXMLDOC01-appb-C000077

で表される化合物(国際公開第14/010737号参照)、
[B-23.44] Expression (s8)
Figure JPOXMLDOC01-appb-C000077

(See WO 14/010737),
[b-23.45]式(s9)
Figure JPOXMLDOC01-appb-C000078

で表される化合物(国際公開第11/085084号参照)、
[B-23.45] Expression (s9)
Figure JPOXMLDOC01-appb-C000078

(See WO 11/085084),
[b-23.46]式(s10)
Figure JPOXMLDOC01-appb-C000079

で表される化合物(国際公開第11/137002号参照)、
[B-23.46] Expression (s10)
Figure JPOXMLDOC01-appb-C000079

(See WO 11/137002),
[b-23.47]式(s11)
Figure JPOXMLDOC01-appb-C000080

で表される化合物(国際公開第13/162072号参照)、
[B-23.47] Expression (s11)
Figure JPOXMLDOC01-appb-C000080

(See WO 13/162072),
[b-23.48]式(s12)
Figure JPOXMLDOC01-appb-C000081

で表される化合物(国際公開第08/110313号参照)、
[B-23.48] Expression (s12)
Figure JPOXMLDOC01-appb-C000081

(See WO 08/110313),
[b-23.49]式(s13)
Figure JPOXMLDOC01-appb-C000082

で表される化合物(国際公開第09/156098号参照)、
[B-23.49] Expression (s13)
Figure JPOXMLDOC01-appb-C000082

A compound represented by (see International Publication No. 09/156098),
[b-23.50]式(s14)
Figure JPOXMLDOC01-appb-C000083

で表される化合物(国際公開第12/025557号参照)、
[B-23.50] Expression (s14)
Figure JPOXMLDOC01-appb-C000083

(See WO 12/025557),
[b-23.51]式(s15)
Figure JPOXMLDOC01-appb-C000084

で表される化合物(国際公開第14/006945号参照)、
[B-23.51] Expression (s15)
Figure JPOXMLDOC01-appb-C000084

(See WO 14/006945),
[b-23.52]式(s16)
Figure JPOXMLDOC01-appb-C000085

[式中、A3は、水素原子、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、またはシアノ基を表し、A4は、水素原子、C1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。]で表される化合物(国際公開第14/095675号参照)、
[B-23.52] Expression (s16)
Figure JPOXMLDOC01-appb-C000085

[In the formula, A3 represents a hydrogen atom, a halogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, or a cyano group, and A4 represents a hydrogen atom, a C1 to C6 alkyl group, a C1 to C6 It represents a haloalkyl group or a C3-C8 cycloalkyl group. (See WO 14/095675),
[b-23.53]式(s17)
Figure JPOXMLDOC01-appb-C000086

[式中、m1は、0~3の整数を表し、A5およびA6は、それぞれ独立していて、ハロゲン原子、またはC1~C6のアルキル基を表し、A7およびA8は、それぞれ独立していて、ハロゲン原子、またはC1~C6のアルコキシ基を表し、m1が2以上の場合、2以上のA7は、それぞれ独立した置換基を表し、同一または異なっていてよい。]で表される化合物(国際公開第09/137538号、国際特許第09/137651号参照)、
[B-23.53] Expression (s17)
Figure JPOXMLDOC01-appb-C000086

[In the formula, m1 represents an integer of 0 to 3, A5 and A6 are each independently a halogen atom or a C1 to C6 alkyl group, and A7 and A8 are each independently, When a halogen atom or a C1 to C6 alkoxy group is represented, and m1 is 2 or more, 2 or more A7's each independently represent a substituent, which may be the same or different. (See WO09 / 137538 and WO09 / 137651),
[b-23.54]式(s18)
Figure JPOXMLDOC01-appb-C000087

[式中、A9およびA10は、それぞれ独立していて、水素原子、またはハロゲン原子を表し、A11は、ハロゲン原子を表し、A12は、ハロゲン原子、またはC1~C6のアルキル基を表し、A13は、ハロゲン原子、シアノ基、C1~C6のアルキル基、またはC1~C6のアルコキシ基を表す。]で表される化合物(国際公開第12/031061号参照)、
[B-23.54] Expression (s18)
Figure JPOXMLDOC01-appb-C000087

[In the formula, A9 and A10 each independently represent a hydrogen atom or a halogen atom, A11 represents a halogen atom, A12 represents a halogen atom or a C1 to C6 alkyl group, and A13 represents Represents a halogen atom, a cyano group, a C1 to C6 alkyl group, or a C1 to C6 alkoxy group. ] (See WO 12/031061),
[b-23.55]式(s19)
Figure JPOXMLDOC01-appb-C000088

[式中、m2は、0~6の整数を表し、A14およびA15は、それぞれ独立していて、ハロゲン原子、シアノ基、またはC1~C6のアルキル基を表し、A16は、水素原子、ハロゲン原子、またはC1~C6のアルコキシ基を表し、A17は、ハロゲン原子、またはC1~C6のアルコキシ基を表し、m2が2以上の場合、2以上のA17は、それぞれ独立した置換基を表し、同一または異なっていてよい。]で表される化合物(国際公開第05/121104号参照)、
[B-23.55] Expression (s19)
Figure JPOXMLDOC01-appb-C000088

[In the formula, m2 represents an integer of 0 to 6, A14 and A15 each independently represent a halogen atom, a cyano group, or a C1 to C6 alkyl group, and A16 represents a hydrogen atom or a halogen atom. Or a C1 to C6 alkoxy group, A17 represents a halogen atom or a C1 to C6 alkoxy group, and when m2 is 2 or more, 2 or more A17's each independently represent a substituent, Can be different. (See WO 05/121104),
[b-23.56]式(s20)
Figure JPOXMLDOC01-appb-C000089

[式中、A18およびA19は、それぞれ独立していて、ハロゲン原子、シアノ基、またはC1~C6のアルキル基を表し、A20、A21およびA22は、それぞれ独立していて、水素原子、ハロゲン原子、またはC1~C6のアルコキシ基を表す。]で表される化合物(国際公開第07/066601号参照)、
[B-23.56] Expression (s20)
Figure JPOXMLDOC01-appb-C000089

[In the formula, A18 and A19 each independently represent a halogen atom, a cyano group, or a C1 to C6 alkyl group, and A20, A21, and A22 each independently represent a hydrogen atom, a halogen atom, Alternatively, it represents a C1 to C6 alkoxy group. (See WO 07/066601),
[b-23.57]式(s21)
Figure JPOXMLDOC01-appb-C000090

[式中、A23およびA24は、それぞれ独立していて、水素原子、ハロゲン原子、C1~C6のアルキル基、またはC3~C8のシクロアルキル基を表し、Xは、酸素原子または硫黄原子を表す。]で表される化合物(国際公開第07/087906号、国際特許第09/016220号、国際特許第10/130767号参照)、
[B-23.57] Expression (s21)
Figure JPOXMLDOC01-appb-C000090

[In the formula, A23 and A24 each independently represent a hydrogen atom, a halogen atom, a C1-C6 alkyl group, or a C3-C8 cycloalkyl group, and X represents an oxygen atom or a sulfur atom. (See WO 07/087906, WO 09/016220, WO 10/130767),
[b-23.58]式(s22)
Figure JPOXMLDOC01-appb-C000091

[式中、m3は、0~5の整数を表し、A25は、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、またはC3~C8のシクロアルキル基を表し、m3が2以上の場合、2以上のA25は、それぞれ独立した置換基を表し、同一または異なっていてよい。]で表される化合物(国際公開第13/092224号参照)、
[B-23.58] Expression (s22)
Figure JPOXMLDOC01-appb-C000091

[Wherein, m3 represents an integer of 0 to 5, A25 represents a halogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, Alternatively, when it represents a C3 to C8 cycloalkyl group, and m3 is 2 or more, 2 or more A25's each independently represent a substituent, which may be the same or different. (See WO 13/092224),
[b-23.59]式(s23)
Figure JPOXMLDOC01-appb-C000092

[式中、A26は、水素原子、またはハロゲン原子を表し、V1およびV2は、それぞれ独立していて、酸素原子、または硫黄原子を表す。]で表される化合物(国際公開第12/025450号参照)、
[B-23.59] Expression (s23)
Figure JPOXMLDOC01-appb-C000092

[In the formula, A26 represents a hydrogen atom or a halogen atom, and V1 and V2 each independently represent an oxygen atom or a sulfur atom. (See WO 12/025450),
[b-23.60]式(s24)または式(s25)
Figure JPOXMLDOC01-appb-C000093

[式中、m4は、0~5の整数を表し、A27は、C1~C6のアルキル基を表し、A28は、ハロゲン原子、シアノ基、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、m4が2以上の場合、2以上のA28は、それぞれ独立した置換基を表し、同一または異なっていてよく、A29は、C1~C6のアルキル基、C2~C6のアルケニル基、またはC3~C6のアルキニル基を表す。]で表される化合物(国際公開第13/037717号参照)、
[B-23.60] Expression (s24) or Expression (s25)
Figure JPOXMLDOC01-appb-C000093

[Wherein, m4 represents an integer of 0 to 5, A27 represents a C1 to C6 alkyl group, A28 represents a halogen atom, a cyano group, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group. And when m4 is 2 or more, two or more A28's each independently represent a substituent and may be the same or different, and A29 is a C1 to C6 alkyl group, a C2 to C6 alkenyl group, or C3. Represents a C6 alkynyl group. ] (See WO 13/037771),
[b-23.61]式(s26)または式(s27)
Figure JPOXMLDOC01-appb-C000094

[式中、m5は、0~5の整数を表し、A30は、C1~C6のアルキル基を表し、A31は、ハロゲン原子、シアノ基、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、m5が2以上の場合、2以上のA31は、それぞれ独立した置換基を表し、同一または異なっていてよく、A32は、C1~C6のアルキル基、C2~C6のアルケニル基、またはC3~C6のアルキニル基を表す。]で表される化合物(国際公開第13/037717号参照)、
[B-23.61] Expression (s26) or Expression (s27)
Figure JPOXMLDOC01-appb-C000094

[Wherein, m5 represents an integer of 0 to 5, A30 represents a C1 to C6 alkyl group, A31 represents a halogen atom, a cyano group, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group. When m5 is 2 or more, 2 or more A31's each independently represent a substituent, and may be the same or different, and A32's are C1 to C6 alkyl groups, C2 to C6 alkenyl groups, or C3. Represents a C6 alkynyl group. ] (See WO 13/037771),
[b-23.62]式(s28)
Figure JPOXMLDOC01-appb-C000095

[式中、A33、A34、A35およびA36は、それぞれ独立していて、水素原子、またはハロゲン原子を表し、A37は、水素原子、アセチル基、またはベンゾイル基を表す。]で表される化合物(国際公開第06/031631号、国際特許第10/069882号参照)、
[B-23.62] Expression (s28)
Figure JPOXMLDOC01-appb-C000095

[Wherein A33, A34, A35 and A36 are each independently a hydrogen atom or a halogen atom, and A37 represents a hydrogen atom, an acetyl group or a benzoyl group. (See WO 06/031631, WO 10/069882),
[b-23.63]式(s29)
Figure JPOXMLDOC01-appb-C000096

[式中、A38は、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、A39およびA40は、それぞれ独立していて、水素原子、またはハロゲン原子を表す。]で表される化合物(国際公開第14/043376号参照)、
[B-23.63] Expression (s29)
Figure JPOXMLDOC01-appb-C000096

[In the formula, A38 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and A39 and A40 each independently represent a hydrogen atom or a halogen atom. (See WO 14/043376),
[b-23.64]式(s30)
Figure JPOXMLDOC01-appb-C000097

[式中、A41は、水素原子、水硫基(-SH)、チオシアン酸基(-SCN)、またはC1~C6のアルキルチオ基を表し、A42、A43、A44およびA45は、それぞれ独立していて、水素原子、またはハロゲン原子を表す。]で表される化合物(国際公開第09/077443号参照)、
[B-23.64] Expression (s30)
Figure JPOXMLDOC01-appb-C000097

[In the formula, A41 represents a hydrogen atom, a sulfur group (-SH), a thiocyanate group (-SCN), or a C1 to C6 alkylthio group, and A42, A43, A44 and A45 are each independently Represents a hydrogen atom or a halogen atom. ] The compound represented by these (refer international publication 09/077443),
[b-23.65]式(s31)または式(s32)
Figure JPOXMLDOC01-appb-C000098

[式中、A46は、水素原子、またはハロゲン原子を表し、A47は、C1~C6のアルキル基を表し、A48は、ハロゲン原子を表す。]で表される化合物(国際公開第11/070771号参照)、
[B-23.65] Expression (s31) or Expression (s32)
Figure JPOXMLDOC01-appb-C000098

[In the formula, A46 represents a hydrogen atom or a halogen atom, A47 represents a C1-C6 alkyl group, and A48 represents a halogen atom. (See WO 11/070771),
[b-23.66]式(s33)
Figure JPOXMLDOC01-appb-C000099

[式中、A49、A50およびA51は、それぞれ独立していて、水素原子、またはハロゲン原子を表す。]で表される化合物(国際公開第11/081174号参照)等が挙げられる。
[B-23.66] Expression (s33)
Figure JPOXMLDOC01-appb-C000099

[Wherein, A49, A50 and A51 each independently represent a hydrogen atom or a halogen atom. (See International Publication No. 11/081174).
 本発明化合物と混合して使用することができる殺虫剤に含まれる具体的な成分は、以下の群cで例示され、これらの塩、異性体およびN-オキシド体を含む。ただし、公知の殺虫剤はこれらに限定されるものではない。 Specific components contained in the insecticide that can be used as a mixture with the compound of the present invention are exemplified in the following group c, and include salts, isomers and N-oxides thereof. However, known insecticides are not limited to these.
群c:
c-1:カーバメート系アセチルコリンエステラーゼ(AChE)阻害剤
 カーバメート系アセチルコリンエステラーゼ(AChE)阻害剤として、[c-1.1]ホスホカルブ(phosphocarb)、[c-1.2]アラニカルブ(alanycarb)、[c-1.3]ブトカルボキシム(butocarboxim)、[c-1.4]ブトキシカルボキシム(butoxycarboxim)、[c-1.5]チオジカルブ(thiodicarb)、[c-1.6]チオファノックス(thiofanox)、[c-1.7]アルジカルブ(aldicarb)、[c-1.8]ベンジオカルブ(bendiocarb)、[c-1.9]ベンフラカルブ(benfuracarb)、[c-1.10]カルバリル(carbaryl)、[c-1.11]カルボフラン(carbofuran)、[c-1.12]カルボスルファン(carbosulfan)、[c-1.13]エチオフェンカルブ(ethiofencarb)、[c-1.14]フェノブカルブ(fenobucarb)、[c-1.15]ホルメタネート(formetanate)、[c-1.16]フラチオカルブ(furathiocarb)、[c-1.17]イソプロカルブ(isoprocarb)、[c-1.18]メチオカルブ(methiocarb)、[c-1.19]メソミル(methomyl)、[c-1.20]オキサミル(oxamyl)、[c-1.21]ピリミカルブ(pirimicarb)、[c-1.22]プロポキスル(propoxur)、[c-1.23]トリメタカルブ(trimethacarb)、[c-1.24]XMC(3,5-xylyl methylcarbamate)、[c-1.25]アリキシカルブ(allyxycarb)、[c-1.26]アルドキシカルブ(aldoxycarb)、[c-1.27]ブフェンカルブ(bufencarb)、[c-1.28]ブタカルブ(butacarb)、[c-1.29]カーバノレート(carbanolate)、[c-1.30]メトルカルブ(metolcarb)、[c-1.31]キシルイルカルブ(xylylcarb)、[c-1.32]フェノチオカルブ(fenothiocarb)、[c-1.33]キシリルカルブ(xylylcarb)、[c-1.34]ベンダイオカルブ(bendiocarb)等が挙げられる。
Group c:
c-1: Carbamate acetylcholinesterase (AChE) inhibitor [C-1.1] phosphocarb, [c-1.2] alanycarb, [c-1.1] as a carbamate acetylcholinesterase (AChE) inhibitor -1.3] butocarboxim, [c-1.4] butoxycarboxim, [c-1.5] thiodicarb, [c-1.6] thiophanox ), [C-1.7] aldicarb, [c-1.8] bendiocarb, [c-1.9] benfuracarb, [c-1.10] carbaryl (carba). ryl), [c-1.11] carbofuran, [c-1.12] carbosulfan, [c-1.13] ethiofencarb, [c-1.14] phenocarb. fenobcarb, [c-1.15] formetanate, [c-1.16] furatiocarb, [c-1.17] isoprocarb, [c-1.18] methiocarb. , [C-1.19] methomyl, [c-1.20] oxamyl, [c-1. 21] pirimicab, [c-1. 22] propoxur, c-1.23] trimetacarb, [c-1.24] XMC (3,5-xylyl methylcarbamate), [c-1.25] allyxycarb, [c-1.26] aldoxicarb (Aldoxycarb), [c-1.27] bufencarb, [c-1.28] butacarb, [c-1.29] carbanolate, [c-1.30] metolcarb. ), [C-1.31] xylylcarb (xylylcarb), [c-1.32] phenothiocarb, [c-1.33] xylylcarb, [c-1.34] bendiocarb. bendiocarb), and the like.
c-2:有機リン系アセチルコリンエステラーゼ(AChE)阻害剤
 有機リン系アセチルコリンエステラーゼ(AChE)阻害剤として、[c-2.1]アセフェート(acephate)、[c-2.2]アザメチホス(azamethiphos)、[c-2.3]アジンホス-メチル(azinphos-methyl)、[c-2.4]アジンホス-エチル(azinphos-ethyl)、[c-2.5]エセフォン(ethephon)、[c-2.6]カズサホス(cadusafos)、[c-2.7]クロルエトキシホス(chlorethoxyfos)、[c-2.8]クロルフェンビンホス(chlorfenvinphos)、[c-2.9]クロルメホス(chlormephos)、[c-2.10]クロルピリホス(chlorpyrifos)、[c-2.11]クロルピリホス-メチル(chlorpyrifos-methyl)、[c-2.12]クマホス(coumaphos)、[c-2.13]シアノホス(cyanophos)、[c-2.14]デメトン-S-メチル(demeton-S-methyl)、[c-2.15]ダイアジノン(diazinon)、[c-2.16]ジクロフェンチオン(dichlofenthion)、[c-2.17]ジクロルボス(dichlorvos)、[c-2.18]ジクロトホス(dicrotophos)、[c-2.19]ジメトエート(dimethoate)、[c-2.20]ジメチルビンホス(dimethylvinphos)、[c-2.21]ジスルホトン(disulfoton)、[c-2.22]O-エチル O-4-ニトロフェニル フェニルホスホノチオアート(O-ethyl O-4-nitrophenyl phenylphosphonothioate)、[c-2.23]エチオン(ethion)、[c-2.24]エトプロホス(ethoprophos)、[c-2.25]ファムフール(famphur)、[c-2.26]フェナミホス(fenamiphos)、[c-2.27]フェニトロチオン(fenitrothion)、[c-2.28]フェンチオン(fenthion)、[c-2.29]ホスチアゼート(fosthiazate)、[c-2.30]ヘプテノホス(heptenophos)、[c-2.31]イソフェンホス-メチル(isofenphos-methyl)、[c-2.32]イソカルボホス(Isocarbophos)、[c-2.33]イソキサチオン(isoxathion)、[c-2.34]マラチオン(malathion)、[c-2.35]メカルバム(mecarbam)、[c-2.36]メタミドホス(methamidophos)、[c-2.37]メチダチオン(methidathion)、[c-2.38]メビンホス(mevinphos)、[c-2.39]モノクロトホス(monocrotophos)、[c-2.40]ナレッド(naled)、[c-2.41]オメトエート(omethoate)、[c-2.42]オキシデメトン-メチル(oxydemeton-methyl)、[c-2.43]パラチオン(parathions)、[c-2.44]パラチオン-メチル(parathion-methyl)、[c-2.45]フェントエート(phenthoate)、[c-2.46]ホレート(phorate)、[c-2.47]ホサロン(phosalone)、[c-2.48]ホスメット(phosmet)、[c-2.49]ホスファミドン(phosphamidon)、[c-2.50]ホキシム(phoxim)、[c-2.51]ピリミホス-メチル(pirimiphos-methyl)、[c-2.52]プロフェノホス(profenofos)、[c-2.53]プロペタンホス(propetamphos)、[c-2.54]プロチオホス(prothiofos)、[c-2.55]ピラクロホス(pyraclofos)、[c-2.56]ピリダフェンチオン(pyridaphenthion)、[c-2.57]キナルホス(quinalphos)、[c-2.58]スルホテップ(sulfotep)、[c-2.59]テブピリムホス(tebupirimfos)、[c-2.60]テメホス(temephos)、[c-2.61]テルブホス(terbufos)、[c-2.62]チオメトン(thiometon)、[c-2.63]トリアゾホス(triazophos)、[c-2.64]トリクロルホン(trichlorfon)、[c-2.65]バミドチオン(vamidothion)、[c-2.66]クロルチオン(chlorothion)、[c-2.67]ブロムフェンビンホス(bromfenvinfos)、[c-2.68]ブロモホス(bromophos)、[c-2.69]ブロモホス-エチル(bromophos-ethyl)、[c-2.70]ブタチオホス(butathiofos)、[c-2.71]カルボフェノチオン(carbophenothion)、[c-2.72]クロルホキシム(chlorphoxim)、[c-2.73]スルプロホス(sulprofos)、[c-2.74]ジアミダホス(diamidafos)、[c-2.75]テトラクロルビンホス(tetrachlorvinphos)、[c-2.76]プロパホス(propaphos)、[c-2.77]メスルフェンホス(mesulfenfos)、[c-2.78]ジオキサベンゾホス(dioxabenzofos)、[c-2.79]エトリムホス(etrimfos)、[c-2.80]オキシデプロホス(oxydeprofos)、[c-2.81]ホルモチオン(formothion)、[c-2.82]フェンスルホチオン(fensulfothion)、[c-2.83]イサゾホス(isazofos)、[c-2.84]イミシアホス(imicyafos)、[c-2.85]イサミドホス(isamidofos)、[c-2.86]チオナジン(thionazin)、[c-2.87]ホスチエタン(fosthietan)等が挙げられる。
c-2: Organophosphorus acetylcholinesterase (AChE) inhibitor [c-2.1] acephate, [c-2.2] azamethiphos, as an organophosphorus acetylcholinesterase (AChE) inhibitor [C-2.3] Azinphos-methyl, [c-2.4] Azinphos-ethyl, [c-2.5] Ethephon, [c-2.6] ] Cadussafos, [c-2.7] chlorethoxyphos, [c-2.8] chlorfenvinphos, [c-2.9] chlormephos, [c- 2.10] Black Chlorpyrifos, [c-2.11] chlorpyrifos-methyl, [c-2.12] coumaphos, [c-2.13] cyanophos, [c-2. 14] demeton-S-methyl, [c-2.15] diazinon, [c-2.16] diclofenthion, [c-2.17] dichlorvos. , [C-2.18] dicrotophos, [c-2.19] dimethoate, [c-2.20] dimethylvinphos, [c-2. 21] disul. [C-2.22] O-ethyl O-4-nitrophenyl phenylphosphonothioate (O-ethyl O-4-nitrophenyl phenylphosphonothioate), [c-2.23] ethion, c-2.24] Ethoprophos, [c-2.25] famfur, [c-2.26] fenamiphos, [c-2.27] fenitrothion, [c- 2.28] fenthion, [c-2.29] fosthiazate, [c-2.30] heptenophos, [c-2.31] isofenphos-methyl isofenphos-methyl), [c-2.32] isocarbophos, [c-2.33] isoxathion, [c-2.34] malathion, [c-2.35] mecarbam ( mecarbam), [c-2.36] methamidophos, [c-2.37] methidathion, [c-2.38] mevinphos, [c-2.39] monocrotophos. ), [C-2.40] naled, [c-2.41] omethoate, [c-2.42] oxydemethon-methyl, [c-2.4]. ] Parathion (parathions), [c-2.44] parathion-methyl (parathion-methyl), [c-2.45] phentoate (c-2.46) phorate (crate), [c-2] .47] phosalone, [c-2.48] phosmet, [c-2.49] phosphamidon, [c-2.50] phoxim, [c-2.51] ] Pirimiphos-methyl, [c-2.52] profenofos, [c-2.53] propetanphos, [c-2.54] prothiophos, [c-2] .55] Pyraclofos, [c-2.56] pyridaphenthion, [c-2.57] quinalphos, [c-2.58] sulfotep, [c-2.59] tebupirimphos ( tebupirimfos), [c-2.60] temephos, [c-2.61] terbufos, [c-2.62] thiomethone, [c-2.63] triazophos. , [C-2.64] trichlorfon, [c-2.65] vamidthione, [c-2.66] chlorthion, [c-2.67] bromphene. Bromfenvinfos, [c-2.68] bromophos, [c-2.69] bromophos-ethyl, [c-2.70] butathiophos, [c-2. 71] Carbophenothion, [c-2.72] chlorphoxim, [c-2.73] sulprofos, [c-2.74] diamidaphos, [c-2. 75] Tetrachlorvinphos, [c-2.76] propaphos, [c-2.77] mesulfenfos, [c-2.78] dioxabenzo (Dioxabenzofos), [c-2.79] etrimfos, [c-2.80] oxydeprofos, [c-2.81] formothion (formation), [c-2.82]. Fensulfothion, [c-2.83] isazofos, [c-2.84] imicyafos, [c-2.85] isamidofos, [c-2.86] thionazine (f-sulfothion). and thionazin) and [c-2.87] fosthietan.
c-3:GABA作動性塩素イオンチャネルブロッカー
 GABA作動性塩素イオンチャネルブロッカーとして、[c-3.1]クロルデン(chlordane)、[c-3.2]エンドスルファン(endosulfan)、[c-3.3]リンデン(lindane)、[c-3.4]ジエノクロル(dienochlor)、[c-3.5]エチプロール(ethiprole)、[c-3.6]フィプロニル(fipronil)、[c-3.7]アセトプロール(acetoprole)等が挙げられる。
c-3: GABAergic chloride ion blocker As GABAergic chloride ion blocker, [c-3.1] chlordane, [c-3.2] endosulfan, [c-3.3] ] Lindane, [c-3.4] dienochlor, [c-3.5] ethiprole, [c-3.6] fipronil, [c-3.7] acetate Examples include acetoprole and the like.
c-4:ナトリウムチャネルモジュレーター
 ナトリウムチャネルモジュレーターとして、[c-4.1]アクリナトリン(acrinathrin)、[c-4.2]アレスリン[(1R)-アイソマー](allethrin[(1R)-isomer])、[c-4.3]ビフェントリン(bifenthrin)、[c-4.4]ビオアレスリン(bioallethrin)、[c-4.5]ビオアレスリン S-シクロペンテニル アイソマー(bioallethrin S-cyclopentenyl  isomer)、[c-4.6]ビオレスメトリン(bioresmethrin)、[c-4.7]シクロプロトリン(cycloprothrin)、[c-4.8]シフルトリン(cyfluthrin)、[c-4.9]ベータ-シフルトリン(beta-cyfluthrin)、[c-4.10]シハロトリン(cyhalothrin)、[c-4.11]ガンマ-シハロトリン(gamma-cyhalothrin)、[c-4.12]ラムダ-シハロトリン(lambda-cyhalothrin)、[c-4.13]シペルメトリン(cypermethrin)、[c-4.14]アルファ-シペルメトリン(alpha-cypermethrin)、[c-4.15]ベータ-シペルメトリン(beta-cypermethrin)、[c-4.16]セタ-シペルメトリン(theta-cypermethrin)、[c-4.17]ゼダ-シペルメトリン(zeta-cypermethrin)、[c-4.18]シフェノトリン[(1R)-トランス-アイソマー](cyphenothrin[(1R)-trans-isomer])、[c-4.19]デルタメトリン(deltamethrin)、[c-4.20]エンペントリン[(EZ)-(1R)-アイソマー](empenthrin[(EZ)-(1R)-isomer])、[c-4.21]エスフェンバレレート(esfenvalerate)、[c-4.22]エトフェンプロックス(ethofenprox)、[c-4.23]フェンプロパトリン(fenpropathrin)、[c-4.24]フェンバレレート(fenvalerate)、[c-4.25]フルシトリネート(flucythrinate)、[c-4.26]フルメトリン(flumethrin)、[c-4.27]タウ-フルバリネート(tau-fluvalinate)、[c-4.28]ハルフェンプロックス(halfenprox)、[c-4.29]イミプロトリン(imiprothrin)、[c-4.30]メトトリン(methothrin)、[c-4.31]メトフルトリン(metofluthrin)、[c-4.32]イプシロン-メトフルトリン(epsilon-metofluthrin)、[c-4.33]モンフルオロトリン(momfluorothrin)、[c-4.34]イプシロン-モンフルオロトリン(epsilon-momfluorothrin)、[c-4.35]ペルメトリン(permethrin)、[c-4.36]フェノトリン[(1R)-トランス-アイソマー](phenothrin[(1R)-trans-isomer])、[c-4.37]プラレトリン(prallethrin)、[c-4.38]レスメトリン(resmethrin)、[c-4.39]カデトリン(kadethrin)、[c-4.40]シラフルオフェン(silafluofen)、[c-4.41]テフルトリン(tefluthrin)、[c-4.42]テトラメトリン(tetramethrin)、[c-4.43]テトラメトリン[(1R)-アイソマー](tetramethrin[(1R)-isomer])、[c-4.44]トラロメトリン(tralomethrin)、[c-4.45]トランスフルトリン(transfluthrin)、[c-4.46]ZXI8901(3-(4-bromophenoxy)phenyl]-cyanomethyl4-(difluoromethoxy)-α-(1-methylethyl)benzeneacetate)、[c-4.47]バイオペルメトリン(biopermethrin)、[c-4.48]フラメトリン(furamethrin)、[c-4.49]プロフルトリン(profluthrin)、[c-4.50]フルブロシトリネート(flubrocythrinate)、[c-4.51]ジメフルトリン(dimefluthrin)、[c-4.52]DDT(dichloro-diphenyl-trichloroethane)、[c-4.53]メトキシクロル(methoxychlor)、[c-4.54]フェノトリン(phenothrin)、[c-4.55]フルバリネート(fluvalinate)等が挙げられる。
c-4: Sodium channel modulator As a sodium channel modulator, [c-4.1] acrinathrin, [c-4.2] allethrin [(1R) -isomer] (allethrin [(1R) -somer]), [C-4.3] bifenthrin, [c-4.4] bioallethrin, [c-4.5] bioallethrin S-cyclopentenyl isomer, [c- 4.6] bioresmethrin, [c-4.7] cycloprothrin, [c-4.8] cyfluthrin, [c-4. ] Beta-cyfluthrin, [c-4.10] cyhalothrin, [c-4.11] gamma-cyhalothrin, [c-4.12] lambda-cyhalothrin (lambda) -Cyhalothrin), [c-4.13] cypermethrin, [c-4.14] alpha-cypermethrin, [c-4.15] beta-cypermethrin. , [C-4.16] ceta-cypermethrin, [c-4.17] zeda-cypermethrin, [c-4.18] cife Trin [(1R) -trans-isomer] (cyphenothrin [(1R) -trans-somer]), [c-4.19] deltamethrin, [c-4.20] Empentrin [(EZ)-(1R) ) -Isomer] (empthrin [(EZ)-(1R) -isomer]), [c-4.21] esfenvalerate, [c-4.22] etofenprox, [c- 4.23] fenpropathrin, [c-4.24] fenvalerate, [c-4.25] flucytrinate, [c-4.26] flumethrin ), [C-4.27] tau-fluvalinate, [c-4.28] halfenprox, [c-4.29] imiprothrin, [c-4. 30] Methothrin, [c-4.31] Metofluthrin, [c-4.32] Epsilon-Metofluthrin, [c-4.33] Monfluorothrin, [c-4.33] c-4.34] epsilon-monfluorothrin, [c-4.35] permethrin, [c-4.36] phenothrin [(1R) -trans-a] Somer] (phenothrin [(1R) -trans-somer]), [c-4.37] prallethrin, [c-4.38] resmethrin, [c-4.39] cadethrin. , [C-4.40] silafluofen, [c-4.41] tefluthrin, [c-4.42] tetramethrin, [c-4.43] tetramethrin [(1R)- Isomer] (tetramethrin [(1R) -isomer]), [c-4.44] tralomethrin, [c-4.45] transfluthrin, [c-4.46] ZXI. 901 (3- (4-bromophenoxy) phenyl] -cyanomethyl 4- (difluoromethoxy) -α- (1-methylethyl) benzeneacetate), [c-4.47] biopermethrin, [c-4.48] (c-4.48). furamethrin), [c-4.49] profluthrin, [c-4.50] flubrocytrinate, [c-4.51] dimefluthrin, [c-4.52] DDT. (Dichloro-diphenyl-trichloroethane), [c-4.53] methoxychlor, [c-4. 4] phenothrin (phenothrin), and the like [c-4.55] fluvalinate (fluvalinate).
c-5:ニコチン性アセチルコリン受容体(nAChR)競合的モジュレーター
 ニコチン性アセチルコリン受容体(nAChR)競合的モジュレーターとして、[c-5.1]アセタミプリド(acetamiprid)、[c-5.2]クロチアニジン(clothianidin)、[c-5.3]ジノテフラン(dinotefuran)、[c-5.4]イミダクロプリド(imidacloprid)、[c-5.5]ニテンピラム(nitenpyram)、[c-5.6]チアクロプリド(thiacloprid)、[c-5.7]チアメトキサム(thiamethoxam)、[c-5.8]ニコチン(nicotine)、[c-5.9]硫酸ニコチン(nicotine sulfate)、[c-5.10]スルホキサフロル(sulfoxaflor)、[c-5.11]フルピラジフロン(flupyradifurone)、[c-5.12]トリフルメゾピリム(triflumezopyrim)等が挙げられる。
c-5: Competitive modulator of nicotinic acetylcholine receptor (nAChR) As a competitive modulator of nicotinic acetylcholine receptor (nAChR), [c-5.1] acetamiprid, [c-5.2] clothianidin (clothianidin). ), [C-5.3] dinotefuran, [c-5.4] imidacloprid, [c-5.5] nitenpyram, [c-5.6] thiacloprid, [C-5.7] thiamethoxam, [c-5.8] nicotine, [c-5.9] nicotine sulfate, [c-5.10] sulphate Kisafuroru (sulfoxaflor), [c-5.11] Furupirajifuron (flupyradifurone), and the like [c-5.12] triflupromazine meso pyridinium beam (triflumezopyrim).
c-6:ニコチン性アセチルコリン受容体(nAChR)アロステリックモジュレーター
 ニコチン性アセチルコリン受容体(nAChR)アロステリックモジュレーターとして、[c-6.1]スピノサド(spinosad)、[c-6.2]スピネトラム(spinetoram)等が挙げられる。
c-6: Nicotinic acetylcholine receptor (nAChR) allosteric modulator As a nicotinic acetylcholine receptor (nAChR) allosteric modulator, [c-6.1] spinosad, [c-6.2] spinetoram, etc. Is mentioned.
c-7:グルタミン酸作動性塩素イオンチャネル(GluCl)アロステリックモジュレーター
 グルタミン酸作動性塩素イオンチャネル(GluCl)アロステリックモジュレーターとして、[c-7.1]アバメクチン(abamectin)、[c-7.2]エマメクチン安息香酸塩(emamectin benzoate)、[c-7.3]レピメクチン(lepimectin)、[c-7.4]ミルベメクチン(milbemectin)等が挙げられる。
c-7: Glutamate agonist chloride ion channel (GluCl) allosteric modulator As a glutamate agonist chloride ion channel (GluCl) allosteric modulator, [c-7.1] abamectin, [c-7.2] emamectin benzoic acid Examples thereof include salt (emactin benzoate), [c-7.3] lepimectin, and [c-7.4] milbemectin.
c-8:幼若ホルモン類似剤
 幼若ホルモン類似剤として、[c-8.1]ヒドロプレン(hydroprene)、[c-8.2]キノプレン(kinoprene)、[c-8.3]メトプレン(methoprene)、[c-8.4]フェノキシカルブ(fenoxycarb)、[c-8.5]ピリプロキシフェン(pyriproxyfen)等が挙げられる。
c-8: Juvenile hormone analogs As juvenile hormone analogs, [c-8.1] hydroprene, [c-8.2] quinoprene, [c-8.3] methoprene (methoprene) ), [C-8.4] phenoxycarb, and [c-8.5] pyriproxyfen.
c-9:非特異的(マルチサイト)阻害剤
 非特異的(マルチサイト)阻害剤として、[c-9.1]臭化メチル(methyl bromide)、[c-9.2]クロルピクリン(chloropicrin)、[c-9.3]クリオライト(cryolite)、[c-9.4]フッ化スルフリル(sulfuryl fluoride)、[c-9.5]ホウ砂(borax)、[c-9.6]ホウ酸(boric acid)、[c-9.7]オクタホウ酸ニナトリウム塩(disodium octaborate)、[c-9.8]メタホウ酸ナトリウム塩(sodium metaborate)、[c-9.9]吐酒石(tartar emetic)、[c-9.10]ダゾメット(dazomet)、[c-9.11]メタム(metam)、[c-9.12]カーバムナトリウム塩(metham sodium)等が挙げられる。
c-9: Non-specific (multi-site) inhibitor As a non-specific (multi-site) inhibitor, [c-9.1] methyl bromide (meth-bromide), [c-9.2] chloropicrin , [C-9.3] cryolite, [c-9.4] sulfuryl fluoride, [c-9.5] borax, [c-9.6] boro Acid (boric acid), [c-9.7] octaborate disodium salt (disodium octoborate), [c-9.8] metaborate sodium salt (sodium metaborate), [c-9.9] tartar ( tartar emetic, [c-9.10] dazomet, [c-9.11] metam ( metam), [c-9.12] carbam sodium salt, and the like.
c-10:弦音器官TRPVチャネルモジュレーター
 弦音器官TRPVチャネルモジュレーターとして、[c-10.1]ピメトロジン(pymetrozine)、[c-10.2]ピリフルキナゾン(pyrifluquinazon)等が挙げられる。
c-10: Chordonic organ TRPV channel modulator Examples of the chordal organ TRPV channel modulator include [c-10.1] pymetrozine and [c-10.2] pyrifluquinazon.
c-11:ダニ類成長阻害剤
 ダニ類成長阻害剤として、[c-11.1]クロフェンテジン(clofentezine)、[c-11.2]ジフロビダジン(diflovidazin)、[c-11.3]ヘキシチアゾクス(hexythiazox)、[c-11.4]エトキサゾール(etoxazole)等が挙げられる。
c-11: Mite growth inhibitor As a mite growth inhibitor, [c-11.1] clofentezine, [c-11.2] diflovidazin, [c-11.3] hexithiazox (Hexythiazox), [c-11.4] ethoxazole and the like.
c-12:ミトコンドリアATP合成酵素阻害剤
 ミトコンドリアATP合成酵素阻害剤として、[c-12.1]ジアフェンチウロン(diafenthiuron)、[c-12.2]アゾシクロチン(azocyclotin)、[c-12.3]シヘキサチン(cyhexatin)、[c-12.4]フェンブタチンオキシド(fenbutatin oxide)、[c-12.5]プロパルギット(propargite)、[c-12.6]テトラジホン(tetradifon)等が挙げられる。
c-12: Mitochondrial ATP synthase inhibitor As a mitochondrial ATP synthase inhibitor, [c-12.1] diafenthiuron, [c-12.2] azocyclotin, [c-12. 3] Cyhexatin, [c-12.4] fenbutatin oxide, [c-12.5] propargite, [c-12.6] tetradiphone and the like. .
c-13:プロトン勾配を撹乱する酸化的リン酸化脱共役剤
 プロトン勾配を撹乱する酸化的リン酸化脱共役剤として、[c-13.1]クロルフェナピル(chlorfenapyl)、[c-13.2]DNOC(dinitro-ortho-cresol)、[c-13.3]ビナパクリル(binapacryl)、[c-13.4]スルフルラミド(sulfluramid)等が挙げられる。
c-13: Oxidative phosphorylation uncoupling agent that perturbs proton gradient As oxidative phosphorylation uncoupling agent that perturbs proton gradient, [c-13.1] chlorfenapyl and [c-13.2] DNOC (Dinitro-ortho-cresol), [c-13.3] vinapacryl, [c-13.4] sulfluramide and the like.
c-14:ニコチン性アセチルコリン受容体(nAChR)チャネルブロッカー
 ニコチン性アセチルコリン受容体(nAChR)チャネルブロッカーとして、[c-14.1]ベンスルタップ(bensultap)、[c-14.2]カルタップ塩酸塩(cartap hydrochloride)、[c-14.3]チオシクラム(thiocyclam)、[c-14.4]モノスルタップ(monosultap)等が挙げられる。
c-14: Nicotinic Acetylcholine Receptor (nAChR) Channel Blocker As a nicotinic acetylcholine receptor (nAChR) channel blocker, [c-14.1] bensultap, [c-14.2] cartap hydrochloride (cartap) hydrochloride), [c-14.3] thiocyclam, [c-14.4] monosultap and the like.
c-15:キチン生合成阻害剤タイプ0
 キチン生合成阻害剤タイプ0として、[c-15.1]ビストリフルロン(bistrifluron)、[c-15.2]クロルフルアズロン(chlorfluazuron)、[c-15.3]ジフルベンズロン(diflubenzuron)、[c-15.4]フルシクロクスロン(flucycloxuron)、[c-15.5]フルフェノクスロン(flufenoxuron)、[c-15.6]ヘキサフルムロン(hexaflumuron)、[c-15.7]ルフェヌロン(lufenuron)、[c-15.8]ノバルロン(novaluron)、[c-15.9]ノビフルムロン(noviflumuron)、[c-15.10]テフルベンズロン(teflubenzuron)、[c-15.11]トリフルムロン(triflumuron)等が挙げられる。
c-15: Chitin biosynthesis inhibitor type 0
As the chitin biosynthesis inhibitor type 0, [c-15.1] bistrifluron (bistrifluron), [c-15.2] chlorfluazuron (chlorfluazuron), [c-15.3] diflubenzuron, [C-15.4] flucycloxuron, [c-15.5] fluphenoxuron, [c-15.6] hexaflumuron, [c-15.7] Lufenuron, [c-15.8] novaluron, [c-15.9] noviflumuron, [c-15.10] teflubenzuron, [c-15.11]. Rifurumuron (triflumuron), and the like.
c-16:キチン生合成阻害剤タイプ1
 キチン生合成阻害剤タイプ1として、[c-16.1]ブプロフェジン(buprofezin)等が挙げられる。
c-16: chitin biosynthesis inhibitor type 1
Examples of the chitin biosynthesis inhibitor type 1 include [c-16.1] buprofezin and the like.
c-17:ハエ目昆虫脱皮阻害剤
 ハエ目昆虫脱皮阻害剤として、[c-17.1]シロマジン(cyromazine)等が挙げられる。
c-17: Insect molting inhibitor for fly flies An insect molting inhibitor for fly flies includes [c-17.1] cyromazine and the like.
c-18:脱皮ホルモン(エクダイソン)受容体アゴニスト
 脱皮ホルモン(エクダイソン)受容体アゴニストとして、[c-18.1]クロマフェノジド(chromafenozide)、[c-18.2]ハロフェノジド(halofenozide)、[c-18.3]メトキシフェノジド(methoxyfenozide)、[c-18.4]テブフェノジド(tebufenozide)等が挙げられる。
c-18: Molting hormone (ecdysone) receptor agonist As a molting hormone (ecdysone) receptor agonist, [c-18.1] chromafenozide, [c-18.2] halofenozide, [c-18] .3] methoxyphenozide, [c-18.4] tebufenozide and the like.
c-19:オクトパミン受容体アゴニスト
 オクトパミン受容体アゴニストとして、[c-19.1]アミトラズ(amitraz)等が挙げられる。
c-19: Octopamine receptor agonist Examples of the octopamine receptor agonist include [c-19.1] amitraz.
c-20:ミトコンドリア電子伝達系複合体III阻害剤
 ミトコンドリア電子伝達系複合体III阻害剤として、[c-20.1]ヒドラメチルノン(hydramethylnon)、[c-20.2]アセキノシル(acequinocyl)、[c-20.3]フルアクリピリム(fluacrypyrim)、[c-20.4]ビフェナゼート(bifenazate)等が挙げられる。
c-20: Mitochondrial electron transfer complex III inhibitor As a mitochondrial electron transfer complex III inhibitor, [c-20.1] hydramethylnon, [c-20.2] acequinocyl, Examples include [c-20.3] fluacrypyrim and [c-20.4] bifenazate.
c-21:ミトコンドリア電子伝達系複合体I阻害剤(METI)
 ミトコンドリア電子伝達系複合体I阻害剤(METI)として、[c-21.1]フェナザキン(fenazaquin)、[c-21.2]フェンピロキシメート(fenpyroximate)、[c-21.3]ピリダベン(pyridaben)、[c-21.4]ピリミジフェン(pylimidifen)、[c-21.5]テブフェンピラド(tebufenpyrad)、[c-21.6]トルフェンピラド(tolfenpyrad)、[c-21.7]ロテノン(rotenone)等が挙げられる。
c-21: Mitochondrial electron transport complex I inhibitor (METI)
As a mitochondrial electron transport complex I inhibitor (METI), [c-21.1] fenazaquin, [c-21.2] fenpyroximate, [c-21.3] pyridaben, [C-21.4] pyrimidifen, [c-21.5] tebufenpyrad, [c-21.6] tolfenpyrad, [c-21.7] rotenone and the like. To be
c-22:電位依存性ナトリウムチャネルブロッカー
 電位依存性ナトリウムチャネルブロッカーとして、[c-22.1]インドキサカルブ(indoxacarb)、[c-22.2]メタフルミゾン(metaflumizone)等が挙げられる。
c-22: Voltage-gated sodium channel blocker Examples of the voltage-gated sodium channel blocker include [c-22.1] indoxacarb and [c-22.2] metaflumizone.
c-23:アセチルCoAカルボキシラーゼ阻害剤
 アセチルCoAカルボキシラーゼ阻害剤として、[c-23.1]スピロジクロフェン(spirodiclofen)、[c-23.2]スピロメシフェン(spiromesifen)、[c-23.3]スピロテトラマト(spirotetramat)等が挙げられる。
c-23: Acetyl CoA carboxylase inhibitor As an acetyl CoA carboxylase inhibitor, [c-23.1] spirodiclofen, [c-23.2] spiromesifen, [c-23.3]. ] Spirotetramat etc. are mentioned.
c-24:ミトコンドリア電子伝達系複合体IV阻害剤
 ミトコンドリア電子伝達系複合体IV阻害剤として、[c-24.1]リン化アルミニウム(aluminum phosphide)、[c-24.2]リン化カルシウム(calcium phosphide)、[c-24.3]リン化水素(phosphine)、[c-24.4]リン化亜鉛(zinc phosphide)、[c-24.5]シアン化カルシウム(calcium cyanide)、[c-24.6]シアン化ナトリウム(sodium cyanide)、[c-24.7]シアン化カリウム(potassium cyanide)等が挙げられる。
c-24: Mitochondrial electron transport complex IV inhibitor As a mitochondrial electron transport complex IV inhibitor, [c-24.1] aluminum phosphide, [c-24.2] calcium phosphide ( calcium phosphide, [c-24.3] phosphine, [c-24.4] zinc phosphide, [c-24.5] calcium cyanide, [c Examples include −24.6] sodium cyanide and [c-24.7] potassium cyanide.
c-25:ミトコンドリア電子伝達系複合体II阻害剤
 ミトコンドリア電子伝達系複合体II阻害剤として、[c-25.1]シエノピラフェン(cyenopyrafen)、[c-25.2]シフルメトフェン(cyflumetofen)、[c-25.3]ピフルブミド(pyflubumide)等が挙げられる。
c-25: Mitochondrial electron transport complex II inhibitor [c-25.1] cyenopyrafen, [c-25.2] cyflumethofen, [c-25.1] as mitochondrial electron transport complex II inhibitor -25.3] Pyflubumide and the like.
c-26:リアノジン受容体モジュレーター
 リアノジン受容体モジュレーターとして、[c-26.1]クロラントラニリプロール(chlorantraniliprole)、[c-26.2]シアントラニリプロール(cyantraniliprole)、[c-26.3]フルベンジアミド(flubendiamide)等が挙げられる。
c-26: ryanodine receptor modulator As a ryanodine receptor modulator, [c-26.1] chlorantraniliprole (chlanantraniprole), [c-26.2] cyantraniliprole, [c-26. 3] Flubendiamide and the like can be mentioned.
c-27:標的部位未特定の弦音器官モジュレーター
 標的部位未特定の弦音器官モジュレーターとして、[c-27.1]フロニカミド(flonicamid)等が挙げられる。
c-27: Modulator of string sound organ with unspecified target site [c-27.1] flonicamid etc. are mentioned as a modulator of string sound organ with unspecified target site.
c-28:その他の殺虫剤
 その他の殺虫剤として、[c-28.1]アザジラクチン(azadirachtin)、[c-28.2]ベンゾキシメート(benzoximate)、[c-28.3]フェニソブロモレート(phenisobromolate)、[c-28.4]キノメチオナート(chinomethionat)、[c-28.5]ジコホル(dicofol)、[c-28.6]ピリダリル(pyridalyl)、[c-28.7]ブロモプロピレート(bromopropylate)、[c-28.8]トリアザメート(triazamate)、[c-28.9]ジシクラニル(dicyclanil)、[c-28.10]ジノブトン(dinobuton)、[c-28.11]ジノカップ(dinocap)、[c-28.12]シアン化水素(hydrogen cyanide)、[c-28.13]ヨウ化メチル(methyliodide)、[c-28.14]カランジン(karanjin)、[c-28.15]塩化水銀(mercury chloride)、[c-28.16]メチルイソチオシアネート(methyl isothiocyanate)、[c-28.17]ペンタクロロフェノール(pentachlorophenol)、[c-28.18]ホスフィン(phosphine)、[c-28.19]ピペロニル ブトキシド(piperonylbutoxide)、[c-28.20]ポリナクチン複合体(polynactins)、[c-28.21]サバディラ(sabadilla)、[c-28.22]スルコフロン塩(スルコフロン-ナトリウム(sulcofuron-sodium))、[c-28.23]トリブホス(tribufos)、[c-28.24]アルドリン(aldrin)、[c-28.25]アミジチオオン(amidithion)、[c-28.26]アミドチオエート(amidothioate)、[c-28.27]アミノカルブ(aminocarb)、[c-28.28]アミトン(amiton)、[c-28.29]アラマイト(aramite)、[c-28.30]アチダチオン(athidathion)、[c-28.31]アゾトエート(azothoate)、[c-28.32]ポリスルフィドバリウム(barium polysulphide)、[c-28.33]ベンクロチアズ(benclothiaz)、[c-28.34]5-(1,3-ベンゾジオキソール-5-イル)-3-ヘキシルシクロヘキサ-2-エノン(5-(1,3-benzodioxol-5-yl)-3-hexylcyclohexa-2-enone)、[c-28.35]1,1-ビス(4-クロロフェニル)-2-エトキシエタノール(1,1-bis(4-chlorophenyl)-2-ethoxyethanol)、[c-28.36]ブトネート(butonate)、[c-28.37]ブトピロノキシル(butopyronoxyl)、[c-28.38]2-(2-ブトキシエトキシ)エチル チオシアナート(2-(2-butoxyethoxy)ethyl thiocyanate)、[c-28.39]カンフェクロル(camphechlor)、[c-28.40]クロルベンシド(chlorbenside)、[c-28.41]クロルデコン(chlordecone)、[c-28.42]クロルジメホルム(chlordimeform)、[c-28.43]クロルフェネトール(chlorfenethol)、[c-28.44]クロルフェンソン(chlorfenson)、[c-28.45]フルアズロン(fluazuron)、[c-28.46]メタアルデヒド(metaldehyde)、[c-28.47]ビアラホス(bialaphos)、[c-28.48]塩酸レバミゾール(levamisol)、[c-28.49]アミドフルメト(amidoflumet)、[c-28.50]ピラフルプロール(pyrafluprole)、[c-28.51]ピリプロール(pyriprole)、[c-28.52]トラロピリル(tralopyril)、[c-28.53]フルピラゾフォス(flupyrazofos)、[c-28.54]ジオフェノラン(diofenolan)、[c-28.55]クロルベンジレート(chlorobenzilate)、[c-28.56]フルフェンジン(flufenzine)、[c-28.57]ベンゾメート(benzomate)、[c-28.58]フルフェネリム(flufenerim)、[c-28.59]アルベンダゾール(albendazole)、[c-28.60]オキシベンダゾール(oxibendazole)、[c-28.61]フェンベンダゾール(fenbendazole)、[c-28.62]メタム・ナトリウム(metam-sodium)、[c-28.63]1,3-ジクロロプロペン(1,3-dichloropropene)、[c-28.64]フロメトキン(flometoquin)、[c-28.65]シクラニリプロール(cyclaniliprole)、[c-28.66]テトラニリプロール(tetraniliprole)、[c-28.67]ブロフラニリド(broflanilide)、[c-28.68]ジクロロメゾチアズ(dicloromezotiaz)、[c-28.69]エチレンジブロマイド(ethylene dibromide)、[c-28.70]アクリロニトリル(acrylonitrile)、[c-28.71]ビス(2-クロロエチル)エーテル(bis(2-chloroethyl)ether)、[c-28.72]1-ブロモ-2-クロロエタン(1-bromo-2-chloroethane)、[c-28.73]3-ブロモ-1-クロロプロパ-1-エン(3-bromo-1-chloroprop-1-ene)、[c-28.74]ブロモシクレン(bromocyclen)、[c-28.75]二硫化炭素(carbon disulfide)、[c-28.76]四塩化炭素(tetrachloromethane)、[c-28.77]ネマデクチン(nemadectin)、[c-28.78]シミアゾール(cymiazole)、[c-28.79]カルシウム ポリスルフィド(calcium polysulfide)、[c-28.80]サイトカイニン(cytokinin)、[c-28.81]2-(オクチルチオ)エタノール(2-(octylthio)ethanol)、[c-28.82]オレイン酸カリウム(potassium oleate)、[c-28.83]オレイン酸ナトリウム(sodium oleate)、[c-28.84]マシン油(machine oil)、[c-28.85]タール油(tar oil)、[c-28.86]アナバシン(anabasine)、[c-28.87]酒石酸モランテル(morantel tartrate)、[c-28.88]除虫菊(pyrethrum)、[c-28.89]ナタネ油(rape seed oil)、[c-28.90]ダイズレチシン(soybean lecithin)、[c-28.91]デンプン(starch)、[c-28.92]ヒドロキシプロピルデンプン(hydroxypropylstarch)、[c-28.93]脂肪酸グリセリド(decanoyloctanoylglycerol)、[c-28.94]プロピレングリコールモノ脂肪酸エステル(propylene glycol fatty acid ester)、[c-28.95]ケイソウ土(diatomite)、[c-28.96]アフォキソラネル(afoxolaner)、[c-28.97]フルアザインドリジン(fluazaindolizine)、[c-28.98]アフィドピロペン(afidopyropen)、[c-28.99]シハロジアミド(cyhalodiamide)、[c-28.100]チオキサザフェン(tioxazafen)、[c-28.101]フルヘキサフォン(fluhexafon)、[c-28.102]フルララネル(fluralaner)、[c-28.103]フルキサメタミド(fluxametamide)、[c-28.104]テトラクロラントラニリプロール(tetrachlorantraniliprole)、[c-28.105]サロラネル(sarolaner)、[c-28.106]ロチラネル(lotilaner)、[c-28.107]シクロキサプリド(cycloxaprid)、[c-28.108]フルエンスルホン(fluensulfone)、[c-28.109]TPIC(tripropyl isocyanurate)、[c-28.110]D-D(1,3-Dichloropropene)、[c-28.111]ペルオキソカルボナート(peroxocarbonate)、[c-28.112]MB-599(verbutin)、[c-28.113]ビス(2,3,3,3-テトラクロロプロピル)エーテル(bis(2,3,3,3-tetrachloropropyl)ether)、[c-28.114]DCIP(bis(2-chloro-1-methylethyl)ether)、[c-28.115]ENT-8184(N-(2-Ethylhexyl)bicyclo[2.2.1]hept-5-ene-2,3-dicarboximide)、[c-28.116]Bayer 22408(O,O-diethyl O-naphthalimidophosphorothioate)、[c-28.117]Bayer 32394(tris(1-dodecyl-3-methyl-2-phenylbenzimidazolium)hexacyanoferrate)、
c-28: Other insecticides [c-28.1] azadirachtin, [c-28.2] benzoximate, [c-28.3] phenisobromo as other insecticides. Phenisobromolate, [c-28.4] quinomethionate, [c-28.5] dicofol, [c-28.6] pyridalyl, [c-28.7] bromopropyiate. Brompropylate, [c-28.8] triazamate, [c-28.9] dicyclanil, [c-28.1] dinobuton, [c-28.11] zinocup ( din ocap), [c-28.12] hydrogen cyanide, [c-28.13] methyl iodide, [c-28.14] caranjin, [c-28.15] chloride. Mercury Chloride, [c-28.16] Methyl Isothiocyanate, [c-28.17] Pentachlorophenol, [c-28.18] Phosphine, [c- 28.19] piperonyl butoxide, [c-28.20] polynactin complex, [c-28.21] sabadilla, [C-28.22] sulcofuron salt (sulcofuron-sodium), [c-28.23] tribufos, [c-28.24] aldrin, [c-28.25]. ] Amidithione, [c-28.26] amidothioate, [c-28.27] aminocarb, [c-28.28] amiton, [c-28.29]. ] Alamite, [c-28.30] atidathion, [c-28.31] azothoate, [c-28.32] barium polysulfide, [c-2] 8.33] benclothiaz, [c-28.34] 5- (1,3-benzodioxol-5-yl) -3-hexylcyclohex-2-enone (5- (1,3- benzdioxol-5-yl) -3-hexylcyclohexa-2-enone), [c-28.35] 1,1-bis (4-chlorophenyl) -2-ethoxyethanol (1,1-bis (4-chlorophenyl)- 2-ethoxyethanol, [c-28.36] butonate, [c-28.37] butopyronoxyl, [c-28.38] 2- (2-butoxyethoxy) ethyl thiocyanate (2- ( 2-butoxyethyloxy) ethyl thiocyana e), [c-28.39] camphechlor, [c-28.40] chlorbenside, [c-28.41] chlordecone, [c-28.42] chlordimeform. , [C-28.43] chlorphenethol, [c-28.44] chlorfenson, [c-28.45] fluazuron, [c-28.46] methaaldehyde. (Metaldehyde), [c-28.47] bialaphos, [c-28.48] levamisole hydrochloride (levamisol), [c-28.49] amidoflumet, [C-28.50] pyrafluprole, [c-28.51] pyriprole, [c-28.52] tralopyril, [c-28.53] flupyrazofos, [C-28.54] diofenolan, [c-28.55] chlorobenzilate, [c-28.56] flufenzine, [c-28.57] benzomate (benzomate), [C-28.58] flufenerim, [c-28.59] albendazole, [c-28.60] oxybendazole, c-28.61] fenbendazole, [c-28.62] metam-sodium, [c-28.63] 1,3-dichloropropene (1,3-dichloropropene), [C-28.64] flometoquin, [c-28.65] cyclaniliprole, [c-28.66] tetraniliprole, [c-28.67] brofuranilide (c-28.65) cyclaniliprole broflanilide), [c-28.68] dichloromezotiaz, [c-28.69] ethylene dibromide, [c-28.70] acrylonitrile (a). rylonitril), [c-28.71] bis (2-chloroethyl) ether (bis (2-chloroethyl) ether), [c-28.72] 1-bromo-2-chloroethane (1-bromo-2-chloroethane) , [C-28.73] 3-bromo-1-chloroprop-1-ene (3-bromo-1-chloroprop-1-ene), [c-28.74] bromocyclen, [c-28. 75] carbon disulfide, [c-28.76] carbon tetrachloride, [c-28.77] nemadectin, [c-28.78] cymiazole, [c] -28.79] Cal Calcium polysulfide, [c-28.80] cytokinin, [c-28.81] 2- (octylthio) ethanol (2- (octylthio) ethanol), [c-28.82] oleic acid. Potassium oleate, [c-28.83] sodium oleate, [c-28.84] machine oil, [c-28.85] tar oil, [c-28.85] c-28.86] anabasine, [c-28.87] morantel tartrate, [c-28.88] pyrethrum, [c-28.89] rapeseed (rape seed). d oil), [c-28.90] soybean lecithin, [c-28.91] starch (starch), [c-28.92] hydroxypropyl starch, [c-28.93]. Fatty acid glyceride (decanoyloctanoylglycerol), [c-28.94] propylene glycol monofatty acid ester (propyrene glycol fatty acid ester), [c-28.95] diatomite (diatomite), [c-28.96] afoxolanel (faxoranel). , [C-28.97] fluazaindolidine, [c-28.98] afidopyropen (afidopyro) en), [c-28.99] cyhalodiamide, [c-28.100] thioxazaphen, [c-28.101] fluhexafone, [c-28.102] fluralaner ( fluuralaner), [c-28.103] fluxamethamide, [c-28.104] tetrachlorantraniliprole, [c-28.105] saroraner, [c-28.106]. ] Rotilaner, [c-28.107] cycloxapride, [c-28.108] fluensulfone, c-28.109] TPIC (tripropyl isocyanaurate), [c-28.110] DD (1,3-Dichloropropene), [c-28.111] peroxocarbonate, [c-28.112]. ] MB-599 (verbutin), [c-28.113] bis (2,3,3,3-tetrachloropropyl) ether (bis (2,3,3,3-tetrachloropropoxyl) ether), [c-28 .114] DCIP (bis (2-chloro-1-methylethyl) ether), [c-28.115] ENT-8184 (N- (2-Ethylhexyl) bicyclo [2.2.1] hept-5-ene- 2,3-dicarbo imide), [c-28.116] Bayer 22408 (O, O-diethyl O-naphthalimidophosphorothioate), [c-28.117] Bayer 32394 (tris (1-dodecyl-3-methyl-2-phenylbenzimidazolium) hexacyanoferrate),
[c-28.118]式(s34)
Figure JPOXMLDOC01-appb-C000100

で表される化合物(国際公開第10/051926号参照)、
[C-28.118] Expression (s34)
Figure JPOXMLDOC01-appb-C000100

(See WO10 / 051926),
[c-28.119]式(s35)
Figure JPOXMLDOC01-appb-C000101

で表される化合物(国際公開第13/115391号参照)、
[C-28.119] Expression (s35)
Figure JPOXMLDOC01-appb-C000101

A compound represented by (see International Publication No. 13/115391),
[c-28.120]式(s36)
Figure JPOXMLDOC01-appb-C000102

で表される化合物(国際公開第12/029672号参照)、
[C-28.120] Expression (s36)
Figure JPOXMLDOC01-appb-C000102

A compound represented by the formula (see International Publication No. 12/029672):
[c-28.121]式(s37)
Figure JPOXMLDOC01-appb-C000103

で表される化合物(国際公開第06/056108号参照)、
[C-28.121] Expression (s37)
Figure JPOXMLDOC01-appb-C000103

(See WO 06/056108),
[c-28.122]式(s38)
Figure JPOXMLDOC01-appb-C000104

で表される化合物(国際公開第14/053450号、国際特許第15/144683号参照)、
[C-28.122] Expression (s38)
Figure JPOXMLDOC01-appb-C000104

(See WO 14/053450, WO 15/144683);
[c-28.123]式(s39)
Figure JPOXMLDOC01-appb-C000105

で表される化合物(国際公開第14/053450号、国際特許第15/144683号参照)、
[C-28.123] Expression (s39)
Figure JPOXMLDOC01-appb-C000105

(See WO 14/053450, WO 15/144683);
[c-28.124]式(s40)
Figure JPOXMLDOC01-appb-C000106

で表される化合物(国際公開第14/053450号、国際特許第15/144683号参照)、
[C-28.124] Expression (s40)
Figure JPOXMLDOC01-appb-C000106

(See WO 14/053450, WO 15/144683);
[c-28.125]式(s41)
Figure JPOXMLDOC01-appb-C000107

[式中、m6は、0~2の整数を表す。]で表される化合物(国際公開第10/129497号参照)、
[C-28.125] Expression (s41)
Figure JPOXMLDOC01-appb-C000107

[In the formula, m6 represents an integer of 0 to 2. (See WO 10/129497),
[c-28.126]式(s42)
Figure JPOXMLDOC01-appb-C000108

[式中、m7は、0~2の整数を表す。]で表される化合物(国際公開第11/152320号参照)、
[C-28.126] Expression (s42)
Figure JPOXMLDOC01-appb-C000108

[In the formula, m7 represents an integer of 0 to 2. (See WO 11/152320),
[c-28.127]式(s43)
Figure JPOXMLDOC01-appb-C000109

[式中、m8は、0~2の整数を表す。]で表される化合物(特開2015―160813号公報参照)、
[C-28.127] Expression (s43)
Figure JPOXMLDOC01-appb-C000109

[In the formula, m8 represents an integer of 0 to 2. ] (See JP-A-2015-160813),
[c-28.128]式(s44)
Figure JPOXMLDOC01-appb-C000110

[式中、A52は、水素原子、またはフッ素原子を表す。]で表される化合物(国際公開第11/134964号、国際特許第14/005982号参照)、
[C-28.128] Expression (s44)
Figure JPOXMLDOC01-appb-C000110

[Wherein, A52 represents a hydrogen atom or a fluorine atom. (See WO 11/134964, WO 14/005982),
[c-28.129]式(s45)
Figure JPOXMLDOC01-appb-C000111

[式中、m9は、0~2の整数を表し、A53は、フッ素原子、または塩素原子を表す。]で表される化合物(国際公開第15/025826号参照)、
[C-28.129] Expression (s45)
Figure JPOXMLDOC01-appb-C000111

[In the formula, m9 represents an integer of 0 to 2, and A53 represents a fluorine atom or a chlorine atom. (See WO 15/025826),
[c-28.130]式(s46)
Figure JPOXMLDOC01-appb-C000112

[式中、V3は、窒素原子、炭素原子、またはC-Fを表し、V4およびV5は、それぞれ独立していて、窒素原子、または炭素原子を表す。]で表される化合物(国際公開第11/134964号、国際公開第14/005982号参照)、
[C-28.130] Expression (s46)
Figure JPOXMLDOC01-appb-C000112

[In the formula, V3 represents a nitrogen atom, a carbon atom, or CF, and V4 and V5 each independently represent a nitrogen atom or a carbon atom. (See WO 11/134964, WO 14/005982),
[c-28.131]式(s47)
Figure JPOXMLDOC01-appb-C000113

[式中、A54は、水素原子、メチル基、メトキシ基、またはエトキシ基を表し、A55は、塩素原子、またはメチル基を表し、A56は、メチル基、またはエチル基を表す。]で表される化合物(国際公開第09/049851号参照)、
[C-28.131] Expression (s47)
Figure JPOXMLDOC01-appb-C000113

[Wherein, A54 represents a hydrogen atom, a methyl group, a methoxy group, or an ethoxy group, A55 represents a chlorine atom or a methyl group, and A56 represents a methyl group or an ethyl group. (See WO09 / 049851),
[c-28.132]式(s48)
Figure JPOXMLDOC01-appb-C000114

[式中、A57は、水素原子、フッ素原子、または塩素原子を表し、A58は、
Figure JPOXMLDOC01-appb-C000115

からなる群から選択される1種の部分構造を表す。]で表される化合物(国際公開第11/067272号参照)、
[C-28.132] Expression (s48)
Figure JPOXMLDOC01-appb-C000114

[Wherein, A57 represents a hydrogen atom, a fluorine atom, or a chlorine atom;
Figure JPOXMLDOC01-appb-C000115

Represents one kind of partial structure selected from the group consisting of: (See International Publication No. 11/067272),
[c-28.133]式(s49)
Figure JPOXMLDOC01-appb-C000116

[式中、A59は、水素原子、フッ素原子、または塩素原子を表し、A60は、
Figure JPOXMLDOC01-appb-C000117

からなる群から選択される部分構造を表す。]で表される化合物(国際公開第10/090344号参照)、
[C-28.133] Expression (s49)
Figure JPOXMLDOC01-appb-C000116

[Wherein, A59 represents a hydrogen atom, a fluorine atom, or a chlorine atom;
Figure JPOXMLDOC01-appb-C000117

Represents a partial structure selected from the group consisting of (See WO 10/090344),
[c-28.134]式(s50)
Figure JPOXMLDOC01-appb-C000118

[式中、m10は、0~2の整数を表し、A61は、トリフルオロメチル基、トリフルオロメチルチオ基、トリフルオロメチルスルフィニル基、またはトリフルオロメチルスルホニル基を表し、A62は、水素原子、またはトリフルオロメチル基を表し、V6は、窒素原子、または炭素原子を表し、V7は、酸素原子、またはN-メチル基を表す。]で表される化合物(国際公開第14/104407号参照)、
[C-28.134] Expression (s50)
Figure JPOXMLDOC01-appb-C000118

[In the formula, m10 represents an integer of 0 to 2, A61 represents a trifluoromethyl group, a trifluoromethylthio group, a trifluoromethylsulfinyl group, or a trifluoromethylsulfonyl group, and A62 represents a hydrogen atom, or It represents a trifluoromethyl group, V6 represents a nitrogen atom or a carbon atom, and V7 represents an oxygen atom or an N-methyl group. (See WO 14/104407),
[c-28.135]式(s51)
Figure JPOXMLDOC01-appb-C000119

[式中、A63は、水素原子、またはフッ素原子を表し、アミド基は4位、または5位に結合し、A64は、
Figure JPOXMLDOC01-appb-C000120

からなる群から選択される部分構造を表す。]で表される化合物(国際公開第15/038503号、国際特許第16/144351号、国際特許第16/144678号参照)、
[C-28.135] Expression (s51)
Figure JPOXMLDOC01-appb-C000119

[Wherein, A63 represents a hydrogen atom or a fluorine atom, the amide group is bonded to the 4- or 5-position, and A64 is
Figure JPOXMLDOC01-appb-C000120

Represents a partial structure selected from the group consisting of (See WO 15/038503, WO 16/144351, WO 16/144678),
[c-28.136]式(s52)
Figure JPOXMLDOC01-appb-C000121

[式中、A65は、水素原子、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、A66は、水素原子、ハロゲン原子、またはC1~C6のアルキル基を表し、A67およびA68は、それぞれ独立していて、水素原子、シアノ基で適宜置換されてもよいC1~C6のアルキル基、メトキシ基で適宜置換されてもよいアルキル基、エトキシ基で適宜置換されてもよいアルキル基、またはC3~C8のシクロアルキル基を表し、
A69は、水素原子、シアノ基、シアノ基で適宜置換されてもよいC1~C6のハロアルキル基、C1~C6のアルキル基、またはC3~C8のシクロアルキル基を表す。]で表される化合物(国際公開第12/143317号、国際特許第16/016369号参照)、
[C-28.136] Expression (s52)
Figure JPOXMLDOC01-appb-C000121

[In the formula, A65 represents a hydrogen atom, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group, A66 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group, and A67 and A68 represent A hydrogen atom, a C1 to C6 alkyl group optionally substituted with a cyano group, an alkyl group optionally substituted with a methoxy group, an alkyl group optionally substituted with an ethoxy group, Or represents a C3 to C8 cycloalkyl group,
A69 represents a hydrogen atom, a cyano group, a C1-C6 haloalkyl group optionally substituted with a cyano group, a C1-C6 alkyl group, or a C3-C8 cycloalkyl group. (See WO 12/143317, WO 16/016369),
[c-28.137]式(s53)または式(s54)
Figure JPOXMLDOC01-appb-C000122

[式中、A70は、メチル基、エチル基、イソプロピル基、2,2,2-トリフルオロエチル基、またはフェニル基を表し、A71は、
Figure JPOXMLDOC01-appb-C000123

からなる群から選択される部分構造を表し、A72は、
Figure JPOXMLDOC01-appb-C000124

からなる群から選択される部分構造を表し、V8は、酸素原子、硫黄原子、-CH-、または-CHCH-を表す。]で表される化合物(国際公開第14/167084号、国際特許第16/055431号参照)、
[C-28.137] Expression (s53) or Expression (s54)
Figure JPOXMLDOC01-appb-C000122

[In the formula, A70 represents a methyl group, an ethyl group, an isopropyl group, a 2,2,2-trifluoroethyl group, or a phenyl group, and A71 represents
Figure JPOXMLDOC01-appb-C000123

A72 represents a partial structure selected from the group consisting of:
Figure JPOXMLDOC01-appb-C000124

V8 represents an oxygen atom, a sulfur atom, —CH 2 —, or —CH 2 CH 2 —. (See WO 14/167084, WO 16/055431),
[c-28.138]式(s55)
Figure JPOXMLDOC01-appb-C000125

[式中、m11は、0~1の整数を表し、A73は、塩素原子、臭素原子、メチル基、またはトリフルオロメチル基を表し、A74は、水素原子、塩素原子、臭素原子、シアノ基、またはトリフルオロメチル基表し、A75は、水素原子、塩素原子または臭素原子を表し、A76およびA77は、それぞれ独立していて、C1~C6のアルキル基、またはC3~C8のシクロアルキル基を表し、A78は、塩素原子、臭素原子、シアノ基、ニトロ基、ジフルオロメチル基、またはトリフルオロメチル基を表す。]で表される化合物(国際公開第13/024009号参照)、
[C-28.138] Expression (s55)
Figure JPOXMLDOC01-appb-C000125

[In the formula, m11 represents an integer of 0 to 1, A73 represents a chlorine atom, a bromine atom, a methyl group, or a trifluoromethyl group, and A74 represents a hydrogen atom, a chlorine atom, a bromine atom, a cyano group, Or a trifluoromethyl group, A75 represents a hydrogen atom, a chlorine atom or a bromine atom, A76 and A77 each independently represent a C1 to C6 alkyl group, or a C3 to C8 cycloalkyl group, A78 represents a chlorine atom, a bromine atom, a cyano group, a nitro group, a difluoromethyl group, or a trifluoromethyl group. A compound represented by the formula (see International Patent Publication No.
[c-28.139]式(s56)
Figure JPOXMLDOC01-appb-C000126

[式中、A79、A80、A81およびA82は、それぞれ独立していて、水素原子、ハロゲン原子、C1~C6のアルキル基、C1~C6のハロアルキル基、C1~C6のアルコキシ基、またはC3~C8のシクロアルコキシ基を表す。]で表される化合物(国際公開第12/027521号参照)、
[C-28.139] Expression (s56)
Figure JPOXMLDOC01-appb-C000126

[Wherein A79, A80, A81 and A82 are each independently a hydrogen atom, a halogen atom, a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, a C1 to C6 alkoxy group, or a C3 to C8 Represents a cycloalkoxy group. (See WO 12/027521),
[c-28.140]式(s57)
Figure JPOXMLDOC01-appb-C000127

[式中、m12は、0~2の整数を表し、A83は、水素原子、またはフッ素原子を表し、A84は、
Figure JPOXMLDOC01-appb-C000128

からなる群から選択される部分構造を表す。]で表される化合物(国際公開第13/162715号参照)、
[C-28.140] Expression (s57)
Figure JPOXMLDOC01-appb-C000127

[In the formula, m12 represents an integer of 0 to 2, A83 represents a hydrogen atom or a fluorine atom, and A84 represents
Figure JPOXMLDOC01-appb-C000128

Represents a partial structure selected from the group consisting of (See WO 13/162715),
[c-28.141]アシノナピル(acynonapyr)、 [C-28.141] asynonapyr,
[c-28.142]式(s59)
Figure JPOXMLDOC01-appb-C000129

[A90は、ハロゲン原子、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、A91は、C1~C6のハロアルキル基を表し、A92およびA93は、それぞれ独立していて、水素原子、C1~C6のアルキル基、アセチル基、プロピオニル基、メタンスルホニルエチル基、メトキシカルボニル基、またはエトキシカルボニル基を表し、A94およびA95は、それぞれ独立していて、水素原子、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表す。]で表される化合物(国際公開第12/164698号参照)等が挙げられる。
[C-28.142] Expression (s59)
Figure JPOXMLDOC01-appb-C000129

[A90 represents a halogen atom, a C1 to C6 alkyl group, or a C1 to C6 haloalkyl group, A91 represents a C1 to C6 haloalkyl group, and A92 and A93 are each independently a hydrogen atom, Represents a C1 to C6 alkyl group, an acetyl group, a propionyl group, a methanesulfonylethyl group, a methoxycarbonyl group, or an ethoxycarbonyl group, wherein A94 and A95 are each independently a hydrogen atom, a C1 to C6 alkyl group, Alternatively, it represents a C1-C6 haloalkyl group. And the like (see WO 12/1664698).
 本発明化合物と有害生物防除剤の混合比は、効果が発揮される限りにおいて特に制限されるものではないが、通常、本発明化合物に対して有害生物防除剤が、重量比で0.001~1000の比率であり、好ましくは、0.01~100の比率である。 The mixing ratio of the compound of the present invention and the pest controlling agent is not particularly limited as long as the effect is exerted, but the pest controlling agent is usually 0.001 to 0.001 by weight based on the compound of the present invention. The ratio is 1000, preferably 0.01 to 100.
 以下に、合成例、参考例、および試験例を挙げて、本発明を更に詳細に示すが、本発明はこれらに限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Synthesis Examples, Reference Examples, and Test Examples, but the present invention is not limited thereto.
[合成例1]
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(5-メチル-1,2,3-チアジアゾール-4-イル)ピリジン-2(1H)-オンの合成(化合物番号:1)
Figure JPOXMLDOC01-appb-C000130
[Synthesis Example 1]
Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (5-methyl-1,2,3-thiadiazol-4-yl) pyridin-2 (1H) -one (compound Number: 1)
Figure JPOXMLDOC01-appb-C000130
 参考例9で合成したエチル 2-(1-(5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-イル)プロピリデン)ヒドラジン-1-カルボキシレート 604mgを含むジクロロエタン溶液 10mlに塩化チオニル 0.44mlを室温下で加えて、同温下で3.5時間撹拌した。反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が110mgの褐色固体として得られた。 Ethyl 2- (1- (5-bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridin-3-yl) propylidene) hydrazine-synthesized in Reference Example 9 To 10 ml of a dichloroethane solution containing 604 mg of 1-carboxylate, 0.44 ml of thionyl chloride was added at room temperature, and the mixture was stirred at the same temperature for 3.5 hours. A saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed with saturated saline and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 110 mg as a brown solid.
[合成例2]
 ステップ1:5-(2-アミノ-5-メチルチアゾール-4-イル)-3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号:13)
Figure JPOXMLDOC01-appb-C000131
[Synthesis Example 2]
Step 1: Synthesis of 5- (2-amino-5-methylthiazol-4-yl) -3-bromo-6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound (Number: 13)
Figure JPOXMLDOC01-appb-C000131
 参考例10で合成した3-ブロモ-5-(2-ブロモプロパノイル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 217mgとチオウレア 73.1mgを含む酢酸溶液 3mlを60℃で1時間撹拌した。さらに反応混合物を100℃に昇温して、同温下で3時間撹拌した。室温まで冷却した後に、反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層を硫酸ナトリウムで乾燥した。減圧下で溶媒留去し、表題の化合物を含む275mgの黄色固体を得た。 Contains 217 mg of 3-bromo-5- (2-bromopropanoyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one synthesized in Reference Example 10 and 73.1 mg of thiourea 3 ml of acetic acid solution was stirred at 60 ° C for 1 hour. The reaction mixture was further heated to 100 ° C. and stirred at the same temperature for 3 hours. After cooling to room temperature, saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was dried over sodium sulfate. The solvent was distilled off under reduced pressure to obtain 275 mg of a yellow solid containing the title compound.
 ステップ2:5-(2-アミノ-5-メチルチアゾール-4-イル)-3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号:4)
Figure JPOXMLDOC01-appb-C000132
Step 2: Synthesis of 5- (2-amino-5-methylthiazol-4-yl) -3-bromo-6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound Number: 4)
Figure JPOXMLDOC01-appb-C000132
 5-(2-アミノ-5-メチルチアゾール-4-イル)-3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 235mgを含むTHF溶液 10mlに、亜硝酸tert-ブチル 97.5μlを滴下し、50℃で1.5時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が74mgの黄褐色固体として得られた。 5- (2-amino-5-methylthiazol-4-yl) -3-bromo-6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one in 10 ml of THF solution containing 235 mg. 97.5 μl of tert-butyl nitrite was added dropwise, and the mixture was stirred at 50 ° C. for 1.5 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 74 mg of a tan solid.
[合成例3]
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(1,2,3-チアジアゾール-5-イル)ピリジン-2(1H)-オンの合成(化合物番号:3)
Figure JPOXMLDOC01-appb-C000133
[Synthesis example 3]
Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (1,2,3-thiadiazol-5-yl) pyridin-2 (1H) -one (Compound No. 3)
Figure JPOXMLDOC01-appb-C000133
 参考例13で合成したエチル 2-(2-(5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-イル)エチリデン)ヒドラジン-1-カルボキシレート 315mgを含むジクロロエタン溶液 10mlに塩化チオニル 0.15mlを室温下で加えて、同温下で2時間撹拌した。反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が185mgの白色固体として得られた。 Ethyl 2- (2- (5-bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridin-3-yl) ethylidene) hydrazine-synthesized in Reference Example 13 To 10 ml of dichloroethane solution containing 315 mg of 1-carboxylate, 0.15 ml of thionyl chloride was added at room temperature, and the mixture was stirred at the same temperature for 2 hours. A saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed with saturated saline and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 185 mg of white solid.
[合成例4]
 ステップ1:5-(2-アミノ-4-メチルチアゾール-5-イル)-3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成(化合物番号:14)
Figure JPOXMLDOC01-appb-C000134
[Synthesis Example 4]
Step 1: Synthesis of 5- (2-amino-4-methylthiazol-5-yl) -3-bromo-6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound (Number: 14)
Figure JPOXMLDOC01-appb-C000134
 参考例16で合成した3-ブロモ-5-(1-ブロモ-2-オキソプロピル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 118mgとチオウレア 30mgを含む酢酸溶液 2mlを60℃で1.5時間撹拌した。室温まで冷却した後に、反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層を硫酸ナトリウムで乾燥した。減圧下で溶媒留去し、表題の化合物を含む108mgの黄色油状物を得た。 118 mg of 3-bromo-5- (1-bromo-2-oxopropyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one synthesized in Reference Example 16 and 30 mg of thiourea were added. The acetic acid solution containing 2 ml was stirred at 60 ° C. for 1.5 hours. After cooling to room temperature, saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was dried over sodium sulfate. The solvent was distilled off under reduced pressure to obtain 108 mg of a yellow oily substance containing the title compound.
 ステップ2:3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(4-メチルチアゾール-5-イル)ピリジン-2(1H)-オンの合成(化合物番号:6)
Figure JPOXMLDOC01-appb-C000135
Step 2: Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (4-methylthiazol-5-yl) pyridin-2 (1H) -one (Compound No. 6)
Figure JPOXMLDOC01-appb-C000135
 5-(2-アミノ-4-メチルチアゾール-5-イル)-3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 108mgを含むTHF溶液 10mlに、亜硝酸tert-ブチル 46.6μlを滴下し、50℃で1.5時間撹拌した。室温まで冷却した後に、反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が39mgの黄褐色油状物として得られた。 10 ml of THF solution containing 108 mg of 5- (2-amino-4-methylthiazol-5-yl) -3-bromo-6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one , Tert-butyl nitrite, 46.6 μl were added dropwise, and the mixture was stirred at 50 ° C. for 1.5 hours. After cooling to room temperature, saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 39 mg of a tan oil.
[参考例1]
Figure JPOXMLDOC01-appb-C000136
[Reference Example 1]
Figure JPOXMLDOC01-appb-C000136
 ステップ1:1-(2,6-ジフルオロフェニル)-N-フェニルプロパン-1-イミンの合成
 アニリン 11.74gとトリエチルアミン 17.01gを含む塩化メチレン溶液 100mlに、四塩化チタン23.91gを含む塩化メチレン溶液 50mlを氷冷下で滴下した。該反応液に1-(2,6-ジフルオロフェニル)プロパン-1-オン 14.30gを含む塩化メチレン溶液 30mlを滴下した後に、氷冷から室温まで昇温して終夜撹拌した。得られた反応混合物に1規定塩酸を加えて分液し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、表題の化合物を含む21.10gの濃緑色油状物質が得られた。これ以上精製することなく、次の反応に使用した。
Step 1: Synthesis of 1- (2,6-difluorophenyl) -N-phenylpropane-1-imine Chloride containing 23.91 g of titanium tetrachloride in 100 ml of methylene chloride solution containing 11.74 g of aniline and 17.01 g of triethylamine 50 ml of methylene solution was added dropwise under ice cooling. After 30 ml of a methylene chloride solution containing 14.30 g of 1- (2,6-difluorophenyl) propan-1-one was added dropwise to the reaction solution, the temperature was raised from ice cooling to room temperature and the mixture was stirred overnight. 1N Hydrochloric acid was added to the obtained reaction mixture, the layers were separated, and dried over sodium sulfate. After evaporating the solvent under reduced pressure, 21.10 g of a dark green oil containing the title compound was obtained. Used for the next reaction without further purification.
 ステップ2:6-(2,6-ジフルオロフェニル)-5-メチル-3,4-ジヒドロピリジン-2(1H)-オンの合成
 ステップ1で得られた1-(2,6-ジフルオロフェニル)-N-フェニルプロパン-1-イミン 21.10gと塩化アルミニウム 12.33gを含むジオキサン溶液200mlにアクリルアミド モノマー 6.57gを加えて、90℃で3時間撹拌した。該反応混合物を半分程度の量まで減圧下で溶媒留去した後に、1規定塩酸と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。得られた固体をイソプロピルエーテルで洗浄し、表題の化合物が11.65gの白色固体として得られた。
Step 2: Synthesis of 6- (2,6-difluorophenyl) -5-methyl-3,4-dihydropyridin-2 (1H) -one 1- (2,6-difluorophenyl) -N obtained in Step 1 6.57 g of acrylamide monomer was added to 200 ml of a dioxane solution containing 21.10 g of -phenylpropane-1-imine and 12.33 g of aluminum chloride, and the mixture was stirred at 90 ° C for 3 hours. After distilling off the solvent of the reaction mixture under reduced pressure to about half the volume, 1N hydrochloric acid and ethyl acetate were added to carry out liquid separation. The obtained organic layer was washed with a saturated saline solution and dried with sodium sulfate. After evaporating the solvent under reduced pressure, the obtained residue was purified by silica gel column chromatography. The obtained solid was washed with isopropyl ether to give the title compound as a white solid (11.65 g).
 H-NMR (CDCl) δ: 7.36-7.34 (1H, m), 6.97-6.94 (2H, m), 6.52 (1H, br s), 2.61-2.59 (2H, m), 2.48-2.47 (2H, m), 1.63 (3H, s). 1 H-NMR (CDCl 3 ) δ: 7.36-7.34 (1H, m), 6.97-6.94 (2H, m), 6.52 (1H, br s), 2.61- 2.59 (2H, m), 2.48-2.47 (2H, m), 1.63 (3H, s).
[参考例2]
 6-(2,6-ジフルオロフェニル)-1-エチル-5-メチル-3,4-ジヒドロピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000137
[Reference Example 2]
Synthesis of 6- (2,6-difluorophenyl) -1-ethyl-5-methyl-3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000137
 6-(2,6-ジフルオロフェニル)-5-メチル-3,4-ジヒドロピリジン-2(1H)-オン 12.40g、炭酸セシウム 54.30gおよびヨウ化エチル 25.99gを含むDMF溶液 120mlを50℃で3.5時間撹拌した。次いで炭酸セシウム 27.15gおよびヨウ化エチル 13.01gを追加した後に、50℃で2時間、さらに60℃で1.5時間撹拌した。室温まで冷却後、該反応混合物を濾過することにより不溶物を除去した。濾液を減圧下にて溶媒留去した後に、酢酸エチルと水を加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた固体をイソプロピルエーテルで洗浄した。表題の化合物が11.98gの白色固体として得られた。 50-120 ml of DMF solution containing 12.40 g of 6- (2,6-difluorophenyl) -5-methyl-3,4-dihydropyridin-2 (1H) -one, 54.30 g of cesium carbonate and 25.99 g of ethyl iodide. Stirred at 3.5 ° C. for 3.5 hours. Next, after adding 27.15 g of cesium carbonate and 13.01 g of ethyl iodide, the mixture was stirred at 50 ° C. for 2 hours and further at 60 ° C. for 1.5 hours. After cooling to room temperature, the insoluble material was removed by filtering the reaction mixture. After the solvent of the filtrate was distilled off under reduced pressure, ethyl acetate and water were added to separate the layers. The obtained organic layer was washed successively with an aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained solid was washed with isopropyl ether. The title compound was obtained as 11.98 g of a white solid.
 H-NMR (CDCl) δ: 7.38-7.35 (1H, m), 6.97-6.96 (2H, m), 3.33 (2H, q, J = 7.1 Hz), 2.60-2.58 (2H, m), 2.38-2.36 (2H, m), 1.59 (3H, s), 0.91 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3 ) δ: 7.38-7.35 (1H, m), 6.97-6.96 (2H, m), 3.33 (2H, q, J = 7.1 Hz). ), 2.60-2.58 (2H, m), 2.38-2.36 (2H, m), 1.59 (3H, s), 0.91 (3H, t, J = 7.1). Hz).
[参考例3]
 6-(2,6-ジフルオロフェニル)-1-エチル-5-メチルピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000138
[Reference Example 3]
Synthesis of 6- (2,6-difluorophenyl) -1-ethyl-5-methylpyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000138
 6-(2,6-ジフルオロフェニル)-1-エチル-5-メチル-3,4-ジヒドロピリジン-2(1H)-オン 11.98gと2,3-ジクロロ-5,6-ジシアノ-p-ベンゾキノン 21.65gを含むトルエン溶液 170mlを120℃で1.5時間撹拌した。室温まで冷却した後に、反応混合物を濾過することにより不溶物を除去した。濾液を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。得られた固体をイソプロピルエーテルで洗浄し、表題の化合物が9.34gの淡黄色固体として得られた。 11.98 g of 6- (2,6-difluorophenyl) -1-ethyl-5-methyl-3,4-dihydropyridin-2 (1H) -one and 2,3-dichloro-5,6-dicyano-p-benzoquinone 170 ml of a toluene solution containing 21.65 g was stirred at 120 ° C. for 1.5 hours. After cooling to room temperature, the insoluble material was removed by filtering the reaction mixture. The solvent was distilled off from the filtrate under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The obtained solid was washed with isopropyl ether to give the title compound as a light yellow solid (9.34 g).
 H-NMR (CDCl) δ: 7.50-7.49 (1H, m), 7.27 (2H, d, J = 9.5 Hz), 7.09-7.06 (2H, m), 6.63 (1H, d, J = 9.5 Hz), 3.83 (2H, q, J = 7.1 Hz), 1.80 (3H, s), 1.10 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3 ) δ: 7.50-7.49 (1H, m), 7.27 (2H, d, J = 9.5 Hz), 7.09-7.06 (2H, m) ), 6.63 (1H, d, J = 9.5 Hz), 3.83 (2H, q, J = 7.1 Hz), 1.80 (3H, s), 1.10 (3H, t). , J = 7.1 Hz).
[参考例4]
 3-クロロ-6-(2,6-ジフルオロフェニル)-1-エチル-5-メチルピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000139
[Reference Example 4]
Synthesis of 3-chloro-6- (2,6-difluorophenyl) -1-ethyl-5-methylpyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000139
 6-(2,6-ジフルオロフェニル)-1-エチル-5-メチルピリジン-2(1H)-オン 11.36gとN-クロロスクシンイミド 6.69gを含むDMF溶液 110mlを70℃で50分間撹拌した。室温まで冷却した後に、反応混合物を減圧下で溶媒留去した。これに酢酸エチルと水を加えて分液した後に、得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた固体をイソプロピルエーテルで洗浄した。表題の化合物が11.41gの白色固体として得られた。 110 ml of a DMF solution containing 11.36 g of 6- (2,6-difluorophenyl) -1-ethyl-5-methylpyridin-2 (1H) -one and 6.69 g of N-chlorosuccinimide was stirred at 70 ° C. for 50 minutes . After cooling to room temperature, the reaction mixture was evaporated under reduced pressure. After ethyl acetate and water were added to the mixture for liquid separation, the obtained organic layer was washed successively with an aqueous sodium thiosulfate solution and saturated saline, and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained solid was washed with isopropyl ether. The title compound was obtained as 11.41 g of a white solid.
 H-NMR (CDCl) δ: 7.53-7.49 (1H, m), 7.50 (1H, s), 7.09-7.07 (2H, m), 3.88 (2H, q, J = 7.1 Hz), 1.81 (3H, s), 1.12 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3 ) δ: 7.53-7.49 (1H, m), 7.50 (1H, s), 7.09-7.07 (2H, m), 3.88 (2H). , Q, J = 7.1 Hz), 1.81 (3H, s), 1.12 (3H, t, J = 7.1 Hz).
[参考例5]
 3-クロロ-5-(ジブロモメチル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000140
[Reference Example 5]
Synthesis of 3-chloro-5- (dibromomethyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000140
 3-クロロ-6-(2,6-ジフルオロフェニル)-1-エチル-5-メチルピリジン-2(1H)-オン 12.65gを含むクロロベンゼン溶液 230mlに、N-ブロモスクシンイミド 16.67gとアゾビスイソブチロニトリル 366mgを加えて、110℃で50分間撹拌した。室温まで冷却した後に、反応混合物に水とジクロロメタンを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた固体をイソプロピルエーテルで洗浄した。表題の化合物が16.88gの淡褐色固体として得られた。 230 ml of chlorobenzene solution containing 12.65 g of 3-chloro-6- (2,6-difluorophenyl) -1-ethyl-5-methylpyridin-2 (1H) -one, 16.67 g of N-bromosuccinimide and azobis 366 mg of isobutyronitrile was added, and the mixture was stirred at 110 ° C for 50 minutes. After cooling to room temperature, water and dichloromethane were added to the reaction mixture to separate it. The obtained organic layer was washed with an aqueous sodium thiosulfate solution and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained solid was washed with isopropyl ether. The title compound was obtained as 16.88 g of a light brown solid.
 H-NMR (CDCl) δ: 8.13 (1H, s), 7.65-7.63 (1H, m), 7.18 (2H, dd, J = 8.5, 6.8 Hz), 5.96 (1H, s), 3.82 (2H, q, J = 7.1 Hz), 1.13 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl 3 ) δ: 8.13 (1H, s), 7.65-7.63 (1H, m), 7.18 (2H, dd, J = 8.5, 6.8 Hz ), 5.96 (1H, s), 3.82 (2H, q, J = 7.1 Hz), 1.13 (3H, t, J = 7.1 Hz).
[参考例6]
 5-クロロ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-カルボアルデヒドの合成
Figure JPOXMLDOC01-appb-C000141
[Reference Example 6]
Synthesis of 5-chloro-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridine-3-carbaldehyde
Figure JPOXMLDOC01-appb-C000141
 3-クロロ-5-(ジブロモメチル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オン 18.95gを含むアセトニトリル 380mlに、硝酸銀 21.87gを含む水溶液 190mlを加えて室温で15分間撹拌した。得られた反応混合物を濾過することにより不溶物を除去した。濾液を減圧下にて溶媒留去した後に、水と酢酸エチルを加えて分液した。得られた有機層を1規定塩酸と飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた固体をイソプロピルエーテルで洗浄した。表題の化合物が11.37gの淡黄色固体として得られた。 190 ml of an aqueous solution containing 21.87 g of silver nitrate in 380 ml of acetonitrile containing 18.95 g of 3-chloro-5- (dibromomethyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one Was added and the mixture was stirred at room temperature for 15 minutes. The insoluble material was removed by filtering the obtained reaction mixture. After the solvent was distilled off from the filtrate under reduced pressure, water and ethyl acetate were added to separate the layers. The obtained organic layer was washed with 1N hydrochloric acid and saturated brine, and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the obtained solid was washed with isopropyl ether. The title compound was obtained as 11.37 g as a pale yellow solid.
 H-NMR (CDCl) δ: 9.19 (1H, t, J = 1.0 Hz), 8.13 (1H, s), 7.67-7.63 (1H, m), 7.18-7.16 (2H, m), 3.94 (2H, q, J = 7.1 Hz), 1.19 (3H, t, J = 7.1 Hz).
1.25 (3H, t, J = 7.2 Hz).
1 H-NMR (CDCl 3 ) δ: 9.19 (1H, t, J = 1.0 Hz), 8.13 (1H, s), 7.67-7.63 (1H, m), 7. 18-7.16 (2H, m), 3.94 (2H, q, J = 7.1 Hz), 1.19 (3H, t, J = 7.1 Hz).
1.25 (3H, t, J = 7.2 Hz).
[参考例7]
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(1-ヒドロキシプロピル)ピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000142
[Reference Example 7]
Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (1-hydroxypropyl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000142
 参考例1から6を参考にして合成した5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-カルボアルデヒド 1.00gを含むTHF溶液 10mlに、2mol/lのエチルマグネシウムクロリドのTHF溶液1.73mlを0℃で滴下して30分間撹拌した。この反応溶液を室温まで昇温し、2時間撹拌した。反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を1規定塩酸水と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去をし、表題の化合物を含む黄色油状物を1.09g得た。これ以上精製することなく、次の反応に使用した。 THF containing 1.00 g of 5-bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridine-3-carbaldehyde synthesized with reference to Reference Examples 1 to 6 1.73 ml of a 2 mol / l solution of ethylmagnesium chloride in THF was added dropwise to 10 ml of the solution at 0 ° C., and the mixture was stirred for 30 minutes. The reaction solution was heated to room temperature and stirred for 2 hours. A saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed successively with 1N aqueous hydrochloric acid and saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure to obtain 1.09 g of a yellow oily substance containing the title compound. It was used for the next reaction without further purification.
[参考例8]
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-プロピニルピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000143
[Reference Example 8]
Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5-propynylpyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000143
 参考例7で得られた3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(1-ヒドロキシプロピル)ピリジン-2(1H)-オン 1.09gを含むジクロロメタン溶液 30mlにデス・マーチンペルヨージナン(1,1,1-トリアセトキシ-1,1-ジヒドロ-1,2-ベンゾヨードキソール-3-(1H)-オン) 1.23gを加えて室温で30分間撹拌した。反応混合物に酢酸エチルを加えてセライト濾過した。有機層を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が653mgの白色固体として得られた。 30 ml of a dichloromethane solution containing 1.09 g of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (1-hydroxypropyl) pyridin-2 (1H) -one obtained in Reference Example 7 1.23 g of Dess-Martin periodinane (1,1,1-triacetoxy-1,1-dihydro-1,2-benzoiodoxol-3- (1H) -one) was added to and 30 minutes at room temperature. It was stirred. Ethyl acetate was added to the reaction mixture and the mixture was filtered through Celite. The solvent was distilled off from the organic layer under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 653 mg white solid.
H-NMR (CDCl3) δ: 8.26 (1H, s), 7.53 (1H, tt, J = 8.4, 6.4 Hz), 7.09-7.03 (2H, m), 3.93 (2H, q, J = 7.1 Hz), 2.64 (2H, q, J = 7.1 Hz), 1.15 (3H, t, J = 7.1 Hz), 1.02 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl3) δ: 8.26 (1H, s), 7.53 (1H, tt, J = 8.4, 6.4 Hz), 7.09-7.03 (2H, m) , 3.93 (2H, q, J = 7.1 Hz), 2.64 (2H, q, J = 7.1 Hz), 1.15 (3H, t, J = 7.1 Hz), 1 .02 (3H, t, J = 7.1 Hz).
[参考例9]
 エチル 2-(1-(5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-イル)プロピリデン)ヒドラジン-1-カルボキシレートの合成
Figure JPOXMLDOC01-appb-C000144
[Reference Example 9]
Synthesis of ethyl 2- (1- (5-bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridin-3-yl) propylidene) hydrazine-1-carboxylate
Figure JPOXMLDOC01-appb-C000144
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-プロピニルピリジン-2(1H)-オン 450mgとエチルカルバゼート 188mgとp-トルエンスルホン酸1水和物 104mgを含む酢酸溶液 3mlを65℃で6時間撹拌した。室温まで冷却した後に、反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去をし、表題の化合物を含む黄色油状物 604mgを得た。これ以上精製することなく、次の反応に使用した。 Includes 450 mg of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5-propynylpyridin-2 (1H) -one, 188 mg of ethyl carbazate and 104 mg of p-toluenesulfonic acid monohydrate. 3 ml of acetic acid solution was stirred at 65 ° C for 6 hours. After cooling to room temperature, saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed with saturated saline and dried over sodium sulfate. The solvent was distilled off under reduced pressure to obtain 604 mg of a yellow oil containing the title compound. It was used for the next reaction without further purification.
[参考例10]
 3-ブロモ-5-(2-ブロモプロパノイル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000145
[Reference Example 10]
Synthesis of 3-bromo-5- (2-bromopropanoyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000145
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-プロピニルピリジン-2(1H)-オン 200mgとN-ブロモスクシンイミド 105mgとp-トルエンスルホン酸1水和物 92.3mgをを含むアセトニトリル溶液 4mlを70℃で3時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を1%チオ硫酸ナトリウム水溶液と飽和食塩水にて順次洗浄して、硫酸ナトリウムで乾燥した。有機層を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が217mgの透明油状物として得られた。 3-Bromo-6- (2,6-difluorophenyl) -1-ethyl-5-propynylpyridin-2 (1H) -one 200 mg and N-bromosuccinimide 105 mg and p-toluenesulfonic acid monohydrate 92.3 mg 4 ml of an acetonitrile solution containing was stirred at 70 ° C. for 3 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed successively with a 1% aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. The solvent was distilled off from the organic layer under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 217 mg of a clear oil.
H-NMR (CDCl3) δ: 8.24 (1H, s), 7.54 (1H, tt, J = 8.5, 6.4 Hz), 7.08-7.06 (2H, m), 4.87 (1H, q, J = 6.6 Hz), 3.98-3.91 (2H, m), 1.69 (3H, d, J = 6.6 Hz), 1.16 (3H, t, J = 7.2 Hz). 1 H-NMR (CDCl3) δ: 8.24 (1H, s), 7.54 (1H, tt, J = 8.5, 6.4 Hz), 7.08-7.06 (2H, m) , 4.87 (1H, q, J = 6.6 Hz), 3.98-3.91 (2H, m), 1.69 (3H, d, J = 6.6 Hz), 1.16 ( 3H, t, J = 7.2 Hz).
[参考例11]
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(2-メトキシビニル)ピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000146
[Reference Example 11]
Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (2-methoxyvinyl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000146
 (メトキシメチル)トリフェニルホスホニウムクロリド 1.25gを含むTHF溶液 10mlにtert-ブトキシカリウム408mgを0℃で加えて、40分間撹拌した。得られた反応混合物に、参考例1から6を参考にして合成した5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-カルボアルデヒド 420mgを含むTHF溶液 4mlを0℃で加えた。反応混合物を室温まで昇温し、2時間撹拌した。反応混合物に飽和アンモニウム水溶液と酢酸エチルを加えて分液した。有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。有機層を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が400mgの透明油状物として得られた。 To a 10 ml THF solution containing 1.25 g of (methoxymethyl) triphenylphosphonium chloride, 408 mg of potassium tert-butoxide was added at 0 ° C., and the mixture was stirred for 40 minutes. 5-Bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridine-3-carbohydrate synthesized according to Reference Examples 1 to 6 was added to the obtained reaction mixture. 4 ml of a THF solution containing 420 mg of aldehyde was added at 0 ° C. The reaction mixture was warmed to room temperature and stirred for 2 hours. A saturated aqueous ammonium solution and ethyl acetate were added to the reaction mixture to separate it. The organic layer was washed with saturated saline and dried over sodium sulfate. The solvent was distilled off from the organic layer under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 400 mg of a clear oil.
H-NMR (CDCl3) δ: 8.62 (1H, s, major), 7.88 (1H, s, minor), 7.54-7.49 (1H, m, mixture), 7.09-7.06 (2H, m), 6.68 (1H, d, J = 12.7 Hz, major), 5.88 (1H, d, J = 7.1 Hz, minor), 4.99 (1H, d, J = 12.7 Hz, major), 4.32 (1H, d, J = 7.1 Hz, minor), 3.88 (2H, q, J = 7.2 Hz, mixture), 3.72 (3H, s, major), 3.46 (3H, s, minor), 1.13-1.11 (3H, m, mixture). 1 H-NMR (CDCl3) δ: 8.62 (1H, s, major), 7.88 (1H, s, minor), 7.54-7.49 (1H, m, mixture), 7.09- 7.06 (2H, m), 6.68 (1H, d, J = 12.7 Hz, major), 5.88 (1H, d, J = 7.1 Hz, minor), 4.99 (1H) , D, J = 12.7 Hz, major), 4.32 (1H, d, J = 7.1 Hz, minor), 3.88 (2H, q, J = 7.2 Hz, mixture), 3. .72 (3H, s, major), 3.46 (3H, s, minor), 1.13-1.11 (3H, m, mixture).
[参考例12]
 2-(5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-イル)アセトアルデヒドの合成
Figure JPOXMLDOC01-appb-C000147
[Reference Example 12]
Synthesis of 2- (5-bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridin-3-yl) acetaldehyde
Figure JPOXMLDOC01-appb-C000147
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(2-メトキシビニル)ピリジン-2(1H)-オン 360mgと4規定塩酸水 2mlを含むTHF溶液 4mlを70℃で4時間撹拌した。室温まで冷却した後に、水と酢酸エチルを加えて分液した。得られた有機層を飽和炭酸水素ナトリウム水溶液と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。有機層を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が251mgの透明油状物として得られた。 4 ml of THF solution containing 360 mg of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (2-methoxyvinyl) pyridin-2 (1H) -one and 2 ml of 4N hydrochloric acid water at 70 ° C. And stirred for 4 hours. After cooling to room temperature, water and ethyl acetate were added to separate the layers. The obtained organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, and dried over sodium sulfate. The solvent was distilled off from the organic layer under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 251 mg of a clear oil.
H-NMR (CDCl3) δ: 9.51 (1H, s), 7.72 (1H, s), 7.56 (1H, tt, J = 8.4, 6.4 Hz), 7.13-7.08 (2H, m), 3.89 (2H, q, J = 7.2 Hz), 3.16 (2H, d, J = 1.7 Hz), 1.14 (3H, t, J = 7.2 Hz). 1 H-NMR (CDCl3) δ: 9.51 (1H, s), 7.72 (1H, s), 7.56 (1H, tt, J = 8.4, 6.4 Hz), 7.13 -7.08 (2H, m), 3.89 (2H, q, J = 7.2 Hz), 3.16 (2H, d, J = 1.7 Hz), 1.14 (3H, t, J = 7.2 Hz).
[参考例13]
 エチル 2-(2-(5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-イル)エチリデン)ヒドラジン-1-カルボキシレートの合成
Figure JPOXMLDOC01-appb-C000148
[Reference Example 13]
Synthesis of ethyl 2- (2- (5-bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridin-3-yl) ethylidene) hydrazine-1-carboxylate
Figure JPOXMLDOC01-appb-C000148
 2-(5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-イル)アセトアルデヒド 251mgとエチルカルバゼート 145mgとp-トルエンスルホン酸1水和物 24mgを含む酢酸溶液 3mlを60℃で2時間撹拌した。室温まで冷却した後に、反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去をし、表題の化合物を含む淡黄色油状物 315mgを得た。これ以上精製することなく、次の反応に使用した。 2- (5-Bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridin-3-yl) acetaldehyde 251 mg and ethyl carbazate 145 mg and p-toluenesulfonic acid 3 ml of acetic acid solution containing 24 mg of monohydrate was stirred at 60 ° C. for 2 hours. After cooling to room temperature, saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed with saturated saline and dried over sodium sulfate. The solvent was distilled off under reduced pressure to obtain 315 mg of a pale yellow oil containing the title compound. It was used for the next reaction without further purification.
H-NMR (CDCl3) δ: 7.77-7.75 (2H, m), 7.55 (1H, tt, J = 8.6, 6.4 Hz), 7.14-7.05 (2H, m), 6.96 (1H, br s), 4.25-4.21 (2H, m), 3.87 (2H, q, J = 7.0 Hz), 3.09-3.08 (2H, m), 1.28-1.26 (3H, m), 1.13 (3H, d, J = 7.0 Hz). 1 H-NMR (CDCl3) δ: 7.77-7.75 (2H, m), 7.55 (1H, tt, J = 8.6, 6.4 Hz), 7.14-7.05 ( 2H, m), 6.96 (1H, br s), 4.25-4.21 (2H, m), 3.87 (2H, q, J = 7.0 Hz), 3.09-3. 08 (2H, m), 1.28-1.26 (3H, m), 1.13 (3H, d, J = 7.0 Hz).
[参考例14]
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(2-ヒドロキシプロピル)ピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000149
[Reference Example 14]
Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (2-hydroxypropyl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000149
 2-(5-ブロモ-2-(2,6-ジフルオロフェニル)-1-エチル-6-オキソ-1,6-ジヒドロピリジン-3-イル)アセトアルデヒド 795mgを含むTHF溶液 16mlに、3mol/lのメチルマグネシウムクロリドのTHF溶液0.81mlを0℃で滴下して20分間撹拌した。反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去をした後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が490mgの黄色油状物として得られた。 2- (5-Bromo-2- (2,6-difluorophenyl) -1-ethyl-6-oxo-1,6-dihydropyridin-3-yl) acetaldehyde 3 ml / l methyl in 16 ml THF solution containing 795 mg 0.81 ml of a THF solution of magnesium chloride was added dropwise at 0 ° C., and the mixture was stirred for 20 minutes. A saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed with saturated saline and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 490 mg as a yellow oil.
H-NMR (CDCl3) δ: 7.83 (1H, s), 7.55-7.53 (1H, m), 7.10-7.07 (2H, m), 3.87-3.82 (2H, m), 2.20 (1H, d, J = 1.5 Hz), 1.92-1.85 (1H, m), 1.74-1.71 (1H, m), 1.51-1.50 (1H, m), 1.12 (3H, t, J = 7.1 Hz), 1.07 (3H, d, J = 6.1 Hz). 1 H-NMR (CDCl3) δ: 7.83 (1H, s), 7.55-7.53 (1H, m), 7.10-7.07 (2H, m), 3.87-3. 82 (2H, m), 2.20 (1H, d, J = 1.5 Hz), 1.92-1.85 (1H, m), 1.74-1.71 (1H, m), 1 0.51-1.50 (1H, m), 1.12 (3H, t, J = 7.1 Hz), 1.07 (3H, d, J = 6.1 Hz).
[参考例15]
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(2-ヒドロキシプロピル)ピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000150
[Reference Example 15]
Synthesis of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (2-hydroxypropyl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000150
  参考例14で得られた3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(2-ヒドロキシプロピル)ピリジン-2(1H)-オン 490mgを含むジクロロメタン溶液 10mlにデス・マーチンペルヨージナン(1,1,1-トリアセトキシ-1,1-ジヒドロ-1,2-ベンゾヨードキソール-3-(1H)-オン) 554mgを加えて室温で2時間撹拌した。反応混合物をセライト濾過した後に、ジクロロメタンにて洗浄した。有機層を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が320mgの透明油状物として得られた。 10 ml of a dichloromethane solution containing 490 mg of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (2-hydroxypropyl) pyridin-2 (1H) -one obtained in Reference Example 14 was added to a dessert solution. -554 mg of martin periodinane (1,1,1-triacetoxy-1,1-dihydro-1,2-benzoiodoxol-3- (1H) -one) was added, and the mixture was stirred at room temperature for 2 hours. The reaction mixture was filtered through Celite and washed with dichloromethane. The solvent was distilled off from the organic layer under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 320 mg as a clear oil.
H-NMR (CDCl3) δ: 7.71 (1H, s), 7.55 (1H, tt, J = 8.6, 6.4 Hz), 7.11-7.09 (2H, m), 3.88 (2H, q, J = 7.1 Hz), 3.17 (2H, s), 2.01 (3H, s), 1.13 (3H, t, J = 7.1 Hz). 1 H-NMR (CDCl3) δ: 7.71 (1H, s), 7.55 (1H, tt, J = 8.6, 6.4 Hz), 7.11-7.09 (2H, m) , 3.88 (2H, q, J = 7.1 Hz), 3.17 (2H, s), 2.01 (3H, s), 1.13 (3H, t, J = 7.1 Hz) .
[参考例16]
 3-ブロモ-5-(1-ブロモ-2-オキソプロピル)-6-(2,6-ジフルオロフェニル)-1-エチルピリジン-2(1H)-オンの合成
Figure JPOXMLDOC01-appb-C000151
[Reference Example 16]
Synthesis of 3-bromo-5- (1-bromo-2-oxopropyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000151
 3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(2-ヒドロキシプロピル)ピリジン-2(1H)-オン 205mgとN-ブロモスクシンイミド 108mgとp-トルエンスルホン酸1水和物 94.6mgをを含むアセトニトリル溶液 4mlを60℃で2時間撹拌した。室温まで冷却した後に、反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層を1%チオ硫酸ナトリウム水溶液と飽和食塩水にて順次洗浄して、硫酸ナトリウムで乾燥した。有機層を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が118mgの透明油状物として得られた。 205 mg of 3-bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (2-hydroxypropyl) pyridin-2 (1H) -one and 108 mg of N-bromosuccinimide and 1 water of p-toluenesulfonic acid 4 ml of an acetonitrile solution containing 94.6 mg of a Japanese product was stirred at 60 ° C. for 2 hours. After cooling to room temperature, saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture to separate it. The obtained organic layer was washed successively with a 1% aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. The solvent was distilled off from the organic layer under reduced pressure, and the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 118 mg of a clear oil.
H-NMR (CDCl3) δ: 7.96 (1H, s), 7.63 (1H, tt, J = 8.4, 6.4 Hz), 7.19-7.16 (2H, m), 4.76 (1H, s), 3.87-3.83 (2H, m), 2.25 (3H, s), 1.14-1.12 (3H, m). 1 H-NMR (CDCl3) δ: 7.96 (1H, s), 7.63 (1H, tt, J = 8.4, 6.4 Hz), 7.19-7.16 (2H, m) , 4.76 (1H, s), 3.87-3.83 (2H, m), 2.25 (3H, s), 1.14-1.12 (3H, m).
 表4に、前記した実施例に準じて合成した化合物を示すが、本発明はこれらに限定されるものではない。 Table 4 shows compounds synthesized according to the above-mentioned examples, but the present invention is not limited thereto.
 表4中、構造Aは以下を示す。
Figure JPOXMLDOC01-appb-C000152
In Table 4, structure A shows the following.
Figure JPOXMLDOC01-appb-C000152
 表4中、構造Bは以下を示す。
Figure JPOXMLDOC01-appb-C000153
In Table 4, Structure B shows the following.
Figure JPOXMLDOC01-appb-C000153
 表4中、構造Cは以下を示す。
Figure JPOXMLDOC01-appb-C000154
In Table 4, structure C shows the following.
Figure JPOXMLDOC01-appb-C000154
 表4中、構造Dは以下を示す。
Figure JPOXMLDOC01-appb-C000155
In Table 4, structure D shows the following.
Figure JPOXMLDOC01-appb-C000155
 構造式A~D中、Yは、式(Y)
Figure JPOXMLDOC01-appb-C000156

で表される部分構造(ここで、R4およびR5は前記と同義であり、nは0~4の整数を表す。)を表し、R1、R2、およびHetは前記と同義である。
In the structural formulas A to D, Y is the formula (Y)
Figure JPOXMLDOC01-appb-C000156

(Wherein R4 and R5 have the same meanings as described above, and n represents an integer of 0 to 4), and R1, R2, and Het have the same meanings as described above.
 式(Y)のnは、0~4の整数を表す。 N in the formula (Y) represents an integer of 0 to 4.
 式(Y)のnが2以上の場合、2以上のR5は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 When n in the formula (Y) is 2 or more, two or more R 5 s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
 表4中、YにおけるPhはフェニル基を表す。 In Table 4, Ph in Y represents a phenyl group.
 例えば、表4中、Yの「2,6-di-F-Ph」との記載は、2位と6位にフッ素原子が結合しているフェニル基であることを意味し、他の記載も同様である。 For example, in Table 4, the description of "2,6-di-F-Ph" of Y means a phenyl group having a fluorine atom bonded to the 2- and 6-positions, and other description is also applicable. It is the same.
Figure JPOXMLDOC01-appb-T000157
Figure JPOXMLDOC01-appb-T000157
 次に、表4に記載の化合物に関して、表5にそれらのH-NMRデータを示す。 Next, regarding the compounds described in Table 4, Table 1 shows their 1 H-NMR data.
Figure JPOXMLDOC01-appb-T000158
Figure JPOXMLDOC01-appb-T000158
 次に、本発明化合物が植物病害に有効であることを具体的に示すが、これらの例に限定されるものではない。 Next, it will be specifically shown that the compound of the present invention is effective against plant diseases, but the present invention is not limited to these examples.
 また、表6~表9に本発明化合物と5位に他のヘテロ環を有する化合物との比較例を示す。比較対照化合物として、比較化合物C1、比較化合物C2、および比較化合物C3を以下に記載する。
 比較化合物C1、比較化合物C2、および比較化合物C3は、本願明細書中の製造方法A~Hに記載の方法を参照するか、公知の方法と組み合わせることで合成することができる。
Further, Tables 6 to 9 show comparative examples of the compounds of the present invention and compounds having another heterocycle at the 5-position. Comparative compounds C1, C2, and C3 are described below as comparative control compounds.
The comparative compound C1, the comparative compound C2, and the comparative compound C3 can be synthesized by referring to the methods described in the production methods A to H in the present specification or by combining them with known methods.
 比較化合物C1:3-ブロモ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(4-メチルチオフェン-3-イル)ピリジン-2(1H)-オン
Figure JPOXMLDOC01-appb-C000159
Comparative compound C1: 3-Bromo-6- (2,6-difluorophenyl) -1-ethyl-5- (4-methylthiophen-3-yl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000159
 比較化合物C2:3-クロロ-6-(2-クロロ-4-フルオロフェニル)-1-エチル-5-(4-メチルオキサゾール-5-イル)ピリジン-2(1H)-オン
Figure JPOXMLDOC01-appb-C000160
Comparative compound C2: 3-chloro-6- (2-chloro-4-fluorophenyl) -1-ethyl-5- (4-methyloxazol-5-yl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000160
 比較化合物C3:3-クロロ-6-(2,6-ジフルオロフェニル)-1-エチル-5-(オキサゾール-5-イル)ピリジン-2(1H)-オン
Figure JPOXMLDOC01-appb-C000161
Comparative compound C3: 3-chloro-6- (2,6-difluorophenyl) -1-ethyl-5- (oxazol-5-yl) pyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000161
 以下に示した試験例の発病程度について、無発病の植物の発病程度を0、薬剤無処理区の植物の発病程度を3として、0.05ごとの発病程度の評価を行った。また、発病程度から以下の計算式に従って防除価を算出した。 Regarding the severity of disease in the test examples shown below, the severity of disease was evaluated every 0.05, with the severity of disease of plants having no disease as 0 and the severity of disease of plants in the drug-untreated area as 3. Further, the control value was calculated from the degree of onset according to the following formula.
 <防除価>
 防除価=100{1-(n/3)}
 n=各薬剤処理区の発病程度
<Control value>
Control value = 100 {1- (n / 3)}
n = degree of illness in each drug treatment area
[試験例A] イネいもち病
 供試植物(イネ品種:幸風)の種子を播種後、第2葉が展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、1~2×10個/mlのイネいもち病菌(Magnaporthe grisea)の分生胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約24時間放置し、発病を促した。接種6~10日後の発病程度を調査し、薬液の効果を評価した。
[Test Example A] Rice blast After sown with seeds of a test plant (rice variety: Kofu), it was cultivated until the second leaf developed. In the test, the compound of the present invention was dissolved in a dimethyl sulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a chemical solution. The obtained drug solution was sprayed on the test plant (2.5 ml / pot). The plant after the drug solution was dried was inoculated with 1 to 2 × 10 5 cells / ml of a conidia suspension of the rice blast fungus (Magnaporthe grisea) by spraying. After inoculation, the plant was left in a moist chamber with a room temperature of 20 to 23 ° C. for about 24 hours to promote disease onset. The degree of disease onset 6 to 10 days after the inoculation was investigated to evaluate the effect of the drug solution.
 その結果、以下に示した化合物が50%より大きい防除価を示した。
 化合物番号:3、4、5、6、8、9、10、12
As a result, the compounds shown below showed a control value of more than 50%.
Compound number: 3, 4, 5, 6, 8, 9, 10, 12
 薬液濃度を50ppmとする以外は前記と同様の方法で、本発明化合物3、4、5、6、8、9、10、および12と比較化合物C2およびC3との比較試験を行った結果を表6に示した。 The results of a comparative test conducted between the compounds of the present invention 3, 4, 5, 6, 8, 9, 10, and 12 and the comparative compounds C2 and C3 are shown in the same manner as above except that the chemical concentration is 50 ppm. 6 shows.
Figure JPOXMLDOC01-appb-T000162
Figure JPOXMLDOC01-appb-T000162
 その結果、ヘテロ環に硫黄原子および窒素原子を有する本発明化合物群が、比較化合物C2およびC3と比較して高い防除価を示した。 As a result, the compounds of the present invention having a sulfur atom and a nitrogen atom in the hetero ring showed higher control value than the comparative compounds C2 and C3.
[試験例B] トマト灰色かび病
 供試植物(トマト品種:大型福寿)の種子を播種後、本葉が3~5枚展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、4~8×10個/mlの灰色かび病菌(Botrytis cinerea)の分生胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約48時間放置し、発病を促した。接種2~3日後の発病程度を調査し、薬液の効果を評価した。
[Test Example B] Tomato gray mold disease After sowing seeds of a test plant (tomato variety: large Fukuju), 3 to 5 true leaves were cultivated. In the test, the compound of the present invention was dissolved in a dimethyl sulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a chemical solution. The obtained drug solution was sprayed on the test plant (2.5 ml / pot). After the drug solution was dried, the plants were spray-inoculated with a conidial suspension of 4-8 × 10 5 cells / ml of Botrytis cinerea. After inoculation, the plant was left in a wet room at a room temperature of 20 to 23 ° C. for about 48 hours to promote the onset of disease. The degree of disease onset 2 to 3 days after the inoculation was investigated to evaluate the effect of the drug solution.
 その結果、以下に示した化合物が50%より大きい防除価を示した。
 化合物番号:1、2、3、4、5、6、8、9、10、12
As a result, the compounds shown below showed a control value of more than 50%.
Compound number: 1, 2, 3, 4, 5, 6, 8, 9, 10, 12
 薬液濃度を50ppmまたは250ppmとする以外は前記と同様の方法で、本発明化合物2、3、4、5、6、8、9、10、および12と比較化合物C1およびC2との比較試験を行った結果を表7に示した。 Comparative tests of the compounds of the present invention 2, 3, 4, 5, 6, 8, 9, 10, and 12 with the comparative compounds C1 and C2 were conducted in the same manner as described above except that the chemical concentration was 50 ppm or 250 ppm. The results are shown in Table 7.
Figure JPOXMLDOC01-appb-T000163
Figure JPOXMLDOC01-appb-T000163
 その結果、ヘテロ環に硫黄原子および窒素原子を有する本発明化合物群が、比較化合物C1およびC2と比較して高い防除価を示した。 As a result, the compounds of the present invention having a sulfur atom and a nitrogen atom in the heterocycle showed a higher control value than the comparative compounds C1 and C2.
[試験例C] キャベツ黒すす病
 供試植物(キャベツ品種:四季穫)の種子を播種後、子葉が展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、4~8×10個/mlのキャベツ黒すす病菌(Alternaia brassicicola)の分生胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約48時間放置し、発病を促した。接種2~3日後の発病程度を調査し、薬液の効果を評価した。
[Test Example C] Cabbage black spot disease Seeds of a test plant (cabbage variety: four seasons harvest) were sown and then cultivated until cotyledons developed. In the test, the compound of the present invention was dissolved in a dimethyl sulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a chemical solution. The obtained drug solution was sprayed on the test plant (2.5 ml / pot). The plants after the drug solution had been dried were spray-inoculated with a conidial suspension of 4-8 × 10 5 cells / ml of cabbage black scab (Alternia brassicicola). After inoculation, the plant was left in a wet room at a room temperature of 20 to 23 ° C. for about 48 hours to promote the onset of disease. The degree of disease onset 2 to 3 days after the inoculation was investigated to evaluate the effect of the drug solution.
 その結果、以下に示した化合物が50%より大きい防除価を示した。
 化合物番号:1、2、3、4、5、6、7、8、9、10、11、12
As a result, the compounds shown below showed a control value of more than 50%.
Compound number: 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12
[試験例D] オオムギうどんこ病
 供試植物(オオムギ品種:赤神力)の種子を播種後、第1葉が展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、オオムギうどんこ病菌(Blumeria graminis f.sp.hordei)の分生胞子を叩き落して接種した。接種後、6~10日後の発病程度を調査し、その効果を評価した。
[Test Example D] Barley powdery mildew After planting seeds of a test plant (barley variety: Akakami Riki), it was cultivated until the first leaf developed. In the test, the compound of the present invention was dissolved in a dimethyl sulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a chemical solution. The obtained drug solution was sprayed on the test plant (2.5 ml / pot). After the chemical solution was dried, the conidia of barley powdery mildew (Blumeria graminis f.sp.hordei) were beaten and inoculated to the plants. The degree of illness was investigated 6 to 10 days after the inoculation, and its effect was evaluated.
 その結果、以下に示した化合物が50%より大きい防除価を示した。
 化合物番号:4、6、8
As a result, the compounds shown below showed a control value of more than 50%.
Compound number: 4, 6, 8
 薬液濃度を50ppmまたは250ppmとする以外は前記と同様の方法で、本発明化合物4、6、および8と比較化合物C1、C2およびC3との比較試験を行った結果を表8に示した。 Table 8 shows the results of a comparative test conducted between the present compounds 4, 6, and 8 and the comparative compounds C1, C2, and C3 in the same manner as described above except that the chemical concentration was 50 ppm or 250 ppm.
Figure JPOXMLDOC01-appb-T000164
Figure JPOXMLDOC01-appb-T000164
 その結果、ヘテロ環に硫黄原子および窒素原子を有する本発明化合物群が、比較化合物C1、C2およびC3と比較して高い防除価を示した。 As a result, the compounds of the present invention having a sulfur atom and a nitrogen atom in the heterocycle showed a higher control value than the comparative compounds C1, C2 and C3.
[試験例E] コムギ赤さび病
 供試植物(コムギ品種:農林61号)の種子を播種後、第1葉が展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、1~2×10個/mlのコムギ赤さび病菌(Puccinia recondita)の夏胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約24時間放置し、発病を促した。接種7~10日後の発病程度を調査し、薬液の効果を評価した。
[Test Example E] Wheat leaf rust Seeds of a test plant (wheat variety: Norin 61) were sown and then cultivated until the first leaves developed. In the test, the compound of the present invention was dissolved in a dimethyl sulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a chemical solution. The obtained drug solution was sprayed on the test plant (2.5 ml / pot). After the drug solution was dried, the plants were inoculated with 1 to 2 × 10 5 pieces / ml of a spore suspension of Puccinia recondita. After inoculation, the plant was left in a moist chamber with a room temperature of 20 to 23 ° C. for about 24 hours to promote disease onset. The degree of disease onset 7 to 10 days after the inoculation was investigated to evaluate the effect of the drug solution.
 その結果、以下に示した化合物が50%より大きい防除価を示した。
 化合物番号:1、2、3、4、5、6、7、8、9、10、11、12
As a result, the compounds shown below showed a control value of more than 50%.
Compound number: 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12
[試験例F] トマト疫病
 供試植物(トマト品種:大型福寿)の種子を播種後、本葉が3~5枚展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、4~8×10個/mlのトマト疫病菌(Phytophthora infestans)の遊走子のう懸濁液を噴霧接種した。接種後、室温が20℃の湿室に約24時間放置し、発病を促した。接種5~10日後の発病程度を調査し、薬液の効果を評価した。
[Test Example F] Tomato plague After sowing seeds of a test plant (tomato variety: large Fukuju), 3 to 5 true leaves were cultivated. In the test, the compound of the present invention was dissolved in a dimethyl sulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a chemical solution. The obtained drug solution was sprayed on the test plant (2.5 ml / pot). The plants after the drug solution had been dried were spray-inoculated with 4 to 8 × 10 3 / ml of zoosporangia suspension of Phytophthora infestans. After the inoculation, the cells were allowed to stand in a wet room at room temperature of 20 ° C. for about 24 hours to promote the onset of the disease. The degree of disease onset 5 to 10 days after the inoculation was investigated to evaluate the effect of the drug solution.
[試験例G] ブドウべと病
 供試植物(ブドウ品種:ネオマスカット)の種子を播種後、本葉が3~4枚展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、1~2×10個/mlのブドウべと病菌(Plasmopara viticola)の遊走子のう懸濁液を噴霧接種した。接種後、室温が20℃の湿室に約24時間放置し、発病を促した。接種7~10日後の発病程度を調査し、薬液の効果を評価した。
[Test Example G] Grape downy mildew After sowing seeds of a test plant (grape variety: Neo Muscat), the seedlings were cultivated until 3 to 4 true leaves were developed. In the test, the compound of the present invention was dissolved in a dimethyl sulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a chemical solution. The obtained drug solution was sprayed on the test plant (2.5 ml / pot). After the drug solution was dried, the plants were inoculated by spraying with 1 to 2 × 10 4 / ml of zoosporangia suspension of Plasmopara viticola. After the inoculation, the cells were allowed to stand in a wet room at room temperature of 20 ° C. for about 24 hours to promote the onset of the disease. The degree of disease onset 7 to 10 days after the inoculation was investigated to evaluate the effect of the drug solution.
[試験例H] キュウリ炭疽病
 供試植物(キュウリ品種:相模半白)の種子を播種後、本葉が1枚展開するまで栽培した。試験では、本発明化合物をジメチルスルホキシド-メタノール混合溶液(容積比:9/1)に溶解し、250ppmの濃度となるように井戸水で希釈して薬液を得た。得られた薬液を供試植物に散布した(2.5ml/ポット)。薬液が乾燥した後の植物に、2~4×10個/mlのキュウリ炭疽病菌(Colletotrichum orbiculare)の分生胞子懸濁液を噴霧接種した。接種後、室温が20~23℃の湿室に約24時間放置し、発病を促した。接種6~10日後の発病程度を調査し、薬液の効果を評価した。
[Test Example H] Cucumber Anthrax Disease Seeds of a test plant (cucumber variety: Sagami Hanjiro) were sown, and then cultivated until one true leaf developed. In the test, the compound of the present invention was dissolved in a dimethyl sulfoxide-methanol mixed solution (volume ratio: 9/1) and diluted with well water to a concentration of 250 ppm to obtain a chemical solution. The obtained drug solution was sprayed on the test plant (2.5 ml / pot). After the drug solution was dried, the plants were inoculated with 2 to 4 × 10 5 cells / ml of a conidia suspension of anthrax of Cucumber (Colletotrichum orbiculare) by spraying. After inoculation, the plant was left in a moist chamber with a room temperature of 20 to 23 ° C. for about 24 hours to promote disease onset. The degree of disease onset 6 to 10 days after the inoculation was investigated to evaluate the effect of the drug solution.
 その結果、以下に示した化合物が50%より大きい防除価を示した。
 化合物番号:2、3、4、5、6、8、9、10、12
As a result, the compounds shown below showed a control value of more than 50%.
Compound number: 2, 3, 4, 5, 6, 8, 9, 10, 12
 薬液濃度を50ppmまたは250ppmとする以外は前記と同様の方法で、本発明化合物2、3、5、6、8、10、および12と比較化合物C1、C2およびC3との比較試験を行った結果を表9に示した。 Results of a comparative test of the compounds of the present invention 2, 3, 5, 6, 8, 10, and 12 and the comparative compounds C1, C2, and C3 in the same manner as described above except that the chemical concentration is 50 ppm or 250 ppm. Is shown in Table 9.
Figure JPOXMLDOC01-appb-T000165
Figure JPOXMLDOC01-appb-T000165
 その結果、ヘテロ環に硫黄原子および窒素原子を有する本発明化合物群が、比較化合物C1、C2およびC3と比較して高い防除価を示した。 As a result, the compounds of the present invention having a sulfur atom and a nitrogen atom in the heterocycle showed a higher control value than the comparative compounds C1, C2 and C3.
 表6~表9に記載の比較試験により、ヘテロ環に硫黄原子および窒素原子を有する本発明化合物群が、幅広い植物病害に対して高い防除効果を示すことが分かった。 From the comparative tests shown in Tables 6 to 9, it was found that the compounds of the present invention having a sulfur atom and a nitrogen atom in the heterocycle show a high controlling effect against a wide range of plant diseases.
 本発明のピリドン化合物は新規な化合物であり、植物病害を防除することができるので、農薬、例えば、農園芸用有害生物防除剤、特に農園芸用殺菌剤としての利用価値がある。 Since the pyridone compound of the present invention is a novel compound and can control plant diseases, it is useful as a pesticide, for example, an agricultural and horticultural pest control agent, particularly an agricultural and horticultural fungicide.
 本明細書に記載された全ての文献、特許出願、および技術規格は、個々の文献、特許出願、および技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書に参照により取り込まれる。 All publications, patent applications, and technical standards mentioned herein are to the same extent as if specifically and individually stated that the individual publications, patent applications, and technical standards are incorporated by reference, Incorporated herein by reference.

Claims (8)

  1.  式(1)
    Figure JPOXMLDOC01-appb-C000001

     [式中、R1は、
      水酸基、
      シアノ基、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表し; R2は、
      水素原子、
      ニトロ基、
      ハロゲン原子、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Aで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6のハロアルケニル基、
      置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Aで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Aで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Aで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Aで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      Rc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSOを表す。)、
      またはRx1C(=O)-(ここで、Rx1は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは前記と同義である。)を表す。)を表し;
     Hetは、
      硫黄原子および窒素原子を含む5員の複素環基を表し、
      該硫黄原子および窒素原子を含む5員の複素環基は、R3が適宜0~2置換し(ただし、2置換のR3がある場合、R3はそれぞれ独立した置換基を表す。)、
     R3は、
      水酸基、
      シアノ基、
      ニトロ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6ハロアルケニル基、
      置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      RaRbN-(ここで、RaおよびRbは、前記と同義である。)、
      Rc-L-(ここで、RcおよびLは、前記と同義である。)、
      Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、
      Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、
      またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
     R4は、
      水酸基、
      シアノ基、
      ニトロ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
      C2~C6ハロアルケニル基、
      置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
      C2~C6のハロアルキニル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルコキシ基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニルオキシ基、
      C2~C6のハロアルケニルオキシ基、
      置換基Cで適宜置換されてもよいC3~C6のアルキニルオキシ基、
      C3~C6のハロアルキニルオキシ基、
      RaRbN-(ここで、RaおよびRbは、前記と同義である。)、
      Rc-L-(ここで、RcおよびLは、前記と同義である。)、
      Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、
      Rx1C(=O)O-(ここで、Rx1は、前記と同義である。)、
      またはRx2C(=O)N(Rx3)-(ここで、Rx2およびRx3は、前記と同義である。)を表し;
     R5は、前記に記載のR4と同義であり;
     nは、0~4の整数を表し;
     Xは、酸素原子、または硫黄原子を表し;
     破線部を含む結合は、二重結合、または単結合を表し;
     そして、置換基Aは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、およびRc-L-(ここで、RcおよびLは、前記と同義である。)からなる群から選択される少なくとも1種であり;
     置換基Bは、シアノ基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、およびC3~C8のシクロアルコキシ基からなる群から選択される少なくとも1種であり;
     置換基Cは、水酸基、シアノ基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、C2~C6のアルコキシアルコキシ基、RaRbN-(ここで、RaおよびRbは、前記と同義である。)、Rc-L-(ここで、RcおよびLは、前記と同義である。)、Rx1C(=O)-(ここで、Rx1は、前記と同義である。)、および1~2個の酸素原子を含む3~6員環の基からなる群から選択される少なくとも1種である。]で表される化合物またはその塩。
    Equation (1)
    Figure JPOXMLDOC01-appb-C000001

    [In the formula, R1 is
    Hydroxyl group,
    Cyano group,
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    A C1 to C6 haloalkyl group,
    A C3 to C8 cycloalkyl group which may be optionally substituted with a substituent A,
    A C2-C6 alkenyl group optionally substituted with a substituent A,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with a substituent A,
    A C2-C6 haloalkynyl group,
    A C1 to C6 alkoxy group optionally substituted with a substituent A,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group optionally substituted with a substituent A,
    A C2-C6 alkenyloxy group which may be optionally substituted with a substituent A,
    A C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted with a substituent A,
    A C3 to C6 haloalkynyloxy group,
    Or RaRbN— (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 Or a Ra and Rb together with the nitrogen atom to which they are attached form an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Representation; R2 is
    Hydrogen atom,
    Nitro group,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    A C1 to C6 haloalkyl group,
    A C3 to C8 cycloalkyl group which may be optionally substituted with a substituent A,
    A C2-C6 alkenyl group optionally substituted with a substituent A,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with a substituent A,
    A C2-C6 haloalkynyl group,
    A C1 to C6 alkoxy group optionally substituted with a substituent A,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group optionally substituted with a substituent A,
    A C2-C6 alkenyloxy group which may be optionally substituted with a substituent A,
    A C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group which may be optionally substituted with a substituent A,
    A C3 to C6 haloalkynyloxy group,
    Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2 ),
    Or Rx1C (═O) — (wherein Rx1 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, C1 To C6 alkoxy group, C1 to C6 haloalkoxy group, C3 to C8 cycloalkoxy group, or RaRbN— (wherein Ra and Rb have the same meanings as described above);
    Het,
    Represents a 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom,
    In the 5-membered heterocyclic group containing a sulfur atom and a nitrogen atom, R3 is appropriately substituted with 0 to 2 (provided that when there is disubstituted R3, R3 represents an independent substituent).
    R3 is
    Hydroxyl group,
    Cyano group,
    Nitro group,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent C,
    A C1 to C6 haloalkyl group,
    A C3 to C8 cycloalkyl group optionally substituted with a substituent C,
    A C2-C6 alkenyl group optionally substituted with a substituent C,
    C2-C6 haloalkenyl group,
    A C2 to C6 alkynyl group optionally substituted with a substituent C,
    A C2-C6 haloalkynyl group,
    A C1 to C6 alkoxy group optionally substituted with a substituent C,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group optionally substituted with a substituent C,
    A C2-C6 alkenyloxy group which may be optionally substituted with a substituent C,
    A C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group optionally substituted with a substituent C,
    A C3 to C6 haloalkynyloxy group,
    RaRbN- (wherein Ra and Rb are as defined above),
    Rc-L- (wherein Rc and L are as defined above),
    Rx1C (= O)-(where Rx1 is as defined above),
    Rx1C (= O) O- (where Rx1 is as defined above),
    Or Rx2C (═O) N (Rx3)-(wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group). An alkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as described above), and Rx3 is , A hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group).
    R4 is
    Hydroxyl group,
    Cyano group,
    Nitro group,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent C,
    A C1 to C6 haloalkyl group,
    A C3 to C8 cycloalkyl group optionally substituted with a substituent C,
    A C2-C6 alkenyl group optionally substituted with a substituent C,
    C2-C6 haloalkenyl group,
    A C2 to C6 alkynyl group optionally substituted with a substituent C,
    A C2-C6 haloalkynyl group,
    A C1 to C6 alkoxy group optionally substituted with a substituent C,
    A C1 to C6 haloalkoxy group,
    A C3 to C8 cycloalkoxy group optionally substituted with a substituent C,
    A C2-C6 alkenyloxy group which may be optionally substituted with a substituent C,
    A C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group optionally substituted with a substituent C,
    A C3 to C6 haloalkynyloxy group,
    RaRbN- (wherein Ra and Rb are as defined above),
    Rc-L- (wherein Rc and L are as defined above),
    Rx1C (= O)-(where Rx1 is as defined above),
    Rx1C (= O) O- (where Rx1 is as defined above),
    Or Rx2C (= O) N (Rx3)-(wherein Rx2 and Rx3 have the same meanings as defined above);
    R5 has the same meaning as R4 described above;
    n represents an integer of 0 to 4;
    X represents an oxygen atom or a sulfur atom;
    A bond containing a broken line represents a double bond or a single bond;
    The substituent A is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, or a RaRbN- (here, Ra And Rb are as defined above.), And Rc-L- (wherein Rc and L are as defined above), and at least one selected from the group consisting of:
    Substituent B is at least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group;
    Substituent C is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2-C6 alkoxyalkoxy group, RaRbN -(Wherein Ra and Rb are as defined above), Rc-L- (wherein Rc and L are as defined above), Rx1C (= O)-(wherein Rx1) Is the same as defined above.) And 3 to 6 membered ring group containing 1 to 2 oxygen atoms. Or a salt thereof.
  2.  Hetは、
      チアゾリル基、イソチアゾリル基、チアジアゾリル基、またはチアトリアゾリル基を表し、
      該チアゾリル基、該イソチアゾリル基、該チアジアゾリル基、または該チアトリアゾリル基は、R3が適宜0~2置換する(ただし、2置換のR3がある場合、R3はそれぞれ独立した置換基を表す。)、
    請求項1に記載の化合物またはその塩。
    Het,
    Represents a thiazolyl group, an isothiazolyl group, a thiadiazolyl group, or a thiatriazolyl group,
    In the thiazolyl group, the isothiazolyl group, the thiadiazolyl group, or the thiatriazolyl group, R3 is appropriately substituted by 0 to 2 (provided that when there is disubstituted R3, R3 represents each independent substituent).
    The compound according to claim 1 or a salt thereof.
  3.  R1は、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      またはC1~C6のハロアルキル基を表し;
     R2は、
      水素原子、
      ハロゲン原子、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Aで適宜置換されてもよいC2~C6のアルキニル基、
      または置換基Aで適宜置換されてもよいC1~C6のアルコキシ基を表し;
     Hetは、
      チアゾリル基、またはチアジアゾリル基を表し、
      該チアゾリル基、または該チアジアゾリル基は、R3が適宜0~2置換し(ただし、2置換のR3がある場合、R3はそれぞれ独立した置換基を表す。)、
     R3は、
      シアノ基、
      ニトロ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC3~C8のシクロアルキル基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
      置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      RaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)、
      またはRx2C(=O)N(Rx3)-(ここで、Rx2は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、C3~C8のシクロアルキル基、C1~C6のアルコキシ基、C1~C6のハロアルコキシ基、C3~C8のシクロアルコキシ基、またはRaRbN-(ここで、RaおよびRbは、前記と同義である。)を表し、Rx3は、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表す。)を表し;
     R4は、
      シアノ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      またはC1~C6のハロアルコキシ基を表し;
     R5は、
      水酸基、
      シアノ基、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      置換基Cで適宜置換されてもよいC2~C6のアルケニル基、
      置換基Cで適宜置換されてもよいC2~C6のアルキニル基、
      置換基Cで適宜置換されてもよいC1~C6のアルコキシ基、
      C1~C6のハロアルコキシ基、
      またはRc-L-(ここで、Rcは、C1~C6のアルキル基、またはC1~C6のハロアルキル基を表し、Lは、S、SO、またはSOを表す。)を表す、
    請求項2に記載の化合物またはその塩。
    R1 is
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    Or represents a C1-C6 haloalkyl group;
    R2 is
    Hydrogen atom,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent A,
    A C1 to C6 haloalkyl group,
    A C2-C6 alkynyl group optionally substituted with a substituent A,
    Or represents a C1-C6 alkoxy group which may be optionally substituted with a substituent A;
    Het,
    Represents a thiazolyl group or a thiadiazolyl group,
    In the thiazolyl group or the thiadiazolyl group, R3 is appropriately substituted by 0 to 2 (provided that when there is disubstituted R3, R3 represents each independent substituent).
    R3 is
    Cyano group,
    Nitro group,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent C,
    A C1 to C6 haloalkyl group,
    A C3 to C8 cycloalkyl group optionally substituted with a substituent C,
    A C2-C6 alkenyl group optionally substituted with a substituent C,
    A C2 to C6 alkynyl group optionally substituted with a substituent C,
    A C1 to C6 alkoxy group optionally substituted with a substituent C,
    RaRbN- (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group). Or an alkyl group, or Ra and Rb represent an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group together with the nitrogen atom to which they are attached.
    Or Rx2C (═O) N (Rx3)-(wherein Rx2 is a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group). An alkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or RaRbN- (wherein Ra and Rb have the same meanings as described above), and Rx3 is , A hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 cycloalkyl group).
    R4 is
    Cyano group,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent C,
    A C1 to C6 haloalkyl group,
    A C1 to C6 alkoxy group optionally substituted with a substituent C,
    Or represents a C1-C6 haloalkoxy group;
    R5 is
    Hydroxyl group,
    Cyano group,
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent C,
    A C1 to C6 haloalkyl group,
    A C2-C6 alkenyl group optionally substituted with a substituent C,
    A C2 to C6 alkynyl group optionally substituted with a substituent C,
    A C1 to C6 alkoxy group optionally substituted with a substituent C,
    A C1 to C6 haloalkoxy group,
    Or Rc-L- (wherein Rc represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L represents S, SO, or SO 2 ).
    The compound according to claim 2 or a salt thereof.
  4.  R1は、
      置換基Aで適宜置換されてもよいC1~C6のアルキル基を表し;
     R2は、
      水素原子、
      ハロゲン原子、
      または置換基Aで適宜置換されてもよいC1~C6のアルキル基を表し;
     R3は、
      ハロゲン原子、
      置換基Cで適宜置換されてもよいC1~C6のアルキル基、
      C1~C6のハロアルキル基、
      またはRaRbN-(ここで、RaおよびRbは、それぞれ独立していて、水素原子、置換基Bで適宜置換されてもよいC1~C6のアルキル基、C1~C6のハロアルキル基、またはC3~C8のシクロアルキル基を表すか、あるいはRaおよびRbは、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。)を表し;
     R4は、
      ハロゲン原子、
      または置換基Cで適宜置換されてもよいC1~C6のアルキル基を表し;
     R5は、
      シアノ基、
      ハロゲン原子、
      または置換基Cで適宜置換されてもよいC1~C6のアルコキシ基を表す、
    請求項3に記載の化合物またはその塩。
    R1 is
    Represents a C1-C6 alkyl group which may be optionally substituted with a substituent A;
    R2 is
    Hydrogen atom,
    Halogen atom,
    Or represents a C1 to C6 alkyl group which may be optionally substituted with a substituent A;
    R3 is
    Halogen atom,
    A C1 to C6 alkyl group optionally substituted with a substituent C,
    A C1 to C6 haloalkyl group,
    Or RaRbN— (wherein Ra and Rb are each independently a hydrogen atom, a C1 to C6 alkyl group optionally substituted with a substituent B, a C1 to C6 haloalkyl group, or a C3 to C8 Or a Ra and Rb together with the nitrogen atom to which they are attached form an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Representation;
    R4 is
    Halogen atom,
    Or represents a C1 to C6 alkyl group which may be optionally substituted with a substituent C;
    R5 is
    Cyano group,
    Halogen atom,
    Or represents a C1 to C6 alkoxy group which may be optionally substituted with a substituent C,
    The compound according to claim 3 or a salt thereof.
  5.  請求項1に記載の化合物またはその塩を有効成分として含有する農園芸用有害生物防除剤。 An agricultural and horticultural pest control agent containing the compound according to claim 1 or a salt thereof as an active ingredient.
  6.  請求項1に記載の化合物またはその塩を有効成分として含有する農園芸用殺菌剤。 An agricultural and horticultural fungicide containing the compound according to claim 1 or a salt thereof as an active ingredient.
  7.  請求項5に記載の農園芸用有害生物防除剤を、植物、植物の種子、または植物を栽培する土壌に施用することを含む、植物病害を防除する方法。 A method for controlling plant diseases, which comprises applying the agricultural and horticultural pest control agent according to claim 5 to plants, plant seeds, or soil in which plants are cultivated.
  8.  請求項6に記載の農園芸用殺菌剤を、植物、植物の種子、または植物を栽培する土壌に施用することを含む、植物病害を防除する方法。 A method for controlling plant diseases, which comprises applying the agricultural / horticultural fungicide according to claim 6 to plants, plant seeds, or soil in which plants are cultivated.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017061525A1 (en) * 2015-10-09 2017-04-13 三井化学アグロ株式会社 Pyridone compound and agricultural/horticultural bactericide including same as active ingredient
WO2018139560A1 (en) * 2017-01-26 2018-08-02 三井化学アグロ株式会社 Pyridone compound and bactericide for agricultural and horticultural use, which uses said compound as active ingredient
WO2018190352A1 (en) * 2017-04-11 2018-10-18 三井化学アグロ株式会社 Pyridone compound, and agricultural and horticultural fungicide having this as active component

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017061525A1 (en) * 2015-10-09 2017-04-13 三井化学アグロ株式会社 Pyridone compound and agricultural/horticultural bactericide including same as active ingredient
WO2018139560A1 (en) * 2017-01-26 2018-08-02 三井化学アグロ株式会社 Pyridone compound and bactericide for agricultural and horticultural use, which uses said compound as active ingredient
WO2018190352A1 (en) * 2017-04-11 2018-10-18 三井化学アグロ株式会社 Pyridone compound, and agricultural and horticultural fungicide having this as active component

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