WO2020073452A1 - 一种粗糙度测量夹具及其测量方法 - Google Patents
一种粗糙度测量夹具及其测量方法 Download PDFInfo
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- WO2020073452A1 WO2020073452A1 PCT/CN2018/118062 CN2018118062W WO2020073452A1 WO 2020073452 A1 WO2020073452 A1 WO 2020073452A1 CN 2018118062 W CN2018118062 W CN 2018118062W WO 2020073452 A1 WO2020073452 A1 WO 2020073452A1
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- pressing column
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/20—Sample handling devices or methods
Definitions
- the invention relates to the measurement field, in particular to a roughness measurement fixture and a measurement method thereof.
- soft thin film materials are widely used in various industries, such as the thin film transistor liquid crystal display industry, the release film of polarizers, the release film of anisotropic conductive adhesive (ACF, Anisotropic Conductive Film), etc. These film materials
- the surface smoothness itself has an important influence on other process conditions, so it is important to understand the surface roughness of these membranes.
- both sides are fixed on hard plates such as glass substrates with double-sided tape, and then a piece of hard plate is pressed on the surface of the sample, and the plate is pressed firmly with your fingers to ensure that the sample is good with double-sided tape Lay on the substrate, and then press the hard substrate with the sample under test with the clamp of the sample stage to measure the sample.
- hard plates such as glass substrates with double-sided tape
- the double-sided tape itself has a certain roughness, when the scanning probe scans on the surface of the film material, it will not rule out that it will be affected by the double-sided tape;
- the invention relates to a roughness measuring fixture and a measuring method thereof, which are used to solve the problems of fixing and measuring thin film materials in the prior art.
- a roughness measuring fixture provided according to the present invention includes: a pressing column, a small fixing plate, a large fixing plate and a pressing ring; wherein,
- the pressing column is arranged at the bottom of the entire roughness measuring fixture
- the small fixed plate, the pressing column cooperates with the small fixed plate through an opening in the middle of the small fixed plate;
- the large fixed disk is being set for the small fixed disk and the atomic force microscope sample stage, the outer diameter of the disk of the large fixed disk is larger than the outer diameter of the disk of the small fixed disk, and the The large fixed disc is provided with a tablet foot;
- the pressing ring is being provided to the opening in the middle of the large fixed plate.
- the atomic force microscope sample stage, the large fixed disk, the small fixed disk and the pressing column all include a first end surface and a second end surface.
- the pressing column is a cylindrical structure
- the small fixed plate and the large fixed plate are both hollow disc-shaped structures
- the pressing ring is a circular ring structure .
- the outer diameter of the large fixed disk is less than or equal to the outer diameter of the round hole in the middle opening of the sample stage of the atomic force microscope, and is larger than the outer diameter of the pressing ring;
- the outer diameter is equal to the outer diameter of the second end surface of the pressing column.
- both the large fixed disk and the small fixed disk have a magnetic attraction function.
- the pressing foot and the large fixed plate are connected by a connecting device.
- connection device is a bolt connection or a rivet connection.
- the pressing column may be cylindrical or a part of a cylinder and a part of a circular truncated cone.
- the pressing leg and the sample stage of the atomic force microscope are fixed by a connecting device or fixed by magnetic force.
- the present invention also provides another roughness measuring fixture, including:
- a roughness measuring fixture comprising: a pressing column, a small fixing plate, a large fixing plate and a pressing ring; wherein,
- the pressing column is arranged at the bottom of the entire roughness measuring fixture
- the small fixed disc is arranged between the pressing column and the large fixed disc, and its outer diameter is larger than the pressing column and smaller than the large fixed disc;
- the large fixed disk is being set for the small fixed disk and the atomic force microscope sample stage, and the outer diameter of the disk of the large fixed disk is larger than the outer diameter of the disk of the small fixed disk;
- the pressing ring is setting the position of the center of the large fixed plate
- the atomic force microscope sample stage, the large fixed disk, the small fixed disk and the pressing column all include a first end surface and a second end surface.
- a presser foot is provided on the second end surface of the large fixed plate.
- the pressing column is a cylindrical structure
- the small fixed plate and the large fixed plate are both hollow disc-shaped structures
- the pressing ring is a circular ring structure .
- the outer diameter of the large fixed disk is less than or equal to the outer diameter of the round hole in the middle opening of the sample stage of the atomic force microscope, and is larger than the outer diameter of the pressing ring;
- the outer diameter is equal to the outer diameter of the second end surface of the pressing column.
- both the large fixed disk and the small fixed disk have a magnetic attraction function.
- the sample material is detected using an atomic force microscope.
- the step "S10" includes:
- S102 Pass the second end surface of the pressing column through the first end surface and the second end surface of the small fixing plate, so that the second end surface of the pressing column protrudes from the second end surface of the small fixing plate.
- the step "S30" includes:
- S302 Slowly push the whole formed by the small fixed plate and the pressing column along the first end surface direction of the large fixed plate, so that the large fixed plate and the small fixed plate are attracted together.
- the step “S50" includes:
- the invention provides a brand-new roughness measuring fixture, which can effectively fix and measure the sample material without affecting the surface roughness of the sample, and the operation is simple, making the surface of the sample material tested The roughness accuracy is higher.
- FIG. 1 is a first schematic structural diagram of a roughness measuring fixture and an atomic force microscope sample stage provided by an embodiment of the present invention.
- FIG. 2 is a schematic diagram of a second structure of a roughness measuring fixture provided by an embodiment of the present invention.
- FIG. 3 is a third schematic structural diagram of a roughness measuring fixture provided by an embodiment of the present invention.
- FIG. 4 is a schematic diagram of a third structure of a roughness measuring fixture provided by an embodiment of the present invention.
- FIG. 5 is a fourth schematic structural diagram of a roughness measuring fixture provided by an embodiment of the present invention.
- FIG. 6 is a fifth schematic structural diagram of a roughness measuring fixture and an atomic force microscope sample stage provided by an embodiment of the present invention.
- FIG. 7 is a first schematic structural view of a medium-pressure column of a roughness measuring fixture provided by an embodiment of the present invention.
- FIG. 7B is a second schematic structural diagram of the medium-pressure column of the roughness measuring fixture provided by the embodiment of the present invention.
- FIG. 8 is a schematic diagram of a second structure of a roughness measurement fixture and an atomic force microscope sample stage provided by an embodiment of the present invention.
- first and second are used for description purposes only, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated.
- the features defined as “first” and “second” may explicitly or implicitly include one or more of the features.
- the meaning of “plurality” is two or more, unless otherwise specifically limited.
- FIG. 1 is a schematic diagram of a first structure of a roughness measuring fixture and an atomic force microscope sample stage.
- 10 is the pressure column, 101 is the first end surface of the pressure column, 102 is the second end surface of the pressure column; 20 is the small fixed disk, 201 is the first end surface of the small fixed disk, 202 is the second end surface of the small fixed disk, 203 Is the middle opening of the small fixed plate; 30 is the large fixed plate, 301 is the first end surface of the large fixed plate, 302 is the second end surface of the large fixed plate, 303 is the middle opening of the large fixed plate, and 304 is the large fixed plate
- the upper pressing foot, 305 is the connecting device between the large fixed plate and the pressing foot; 40 is the pressing ring; 50 is the atomic force microscope sample stage, 501 is the first end surface of the atomic force microscope sample stage, and 502 is the atomic force microscope sample stage 503 is the opening in the
- a roughness measuring fixture provided according to the present invention includes: a pressing column 10, a small fixed disc 20, a large fixed disc 30, and a pressing ring 40; the pressing column 10 is disposed at the bottom of the entire roughness measuring fixture; A small fixed plate 20, the pressing column 10 cooperates with the small fixed plate 20 through an opening 203 in the middle of the small fixed plate 20; a large fixed plate 30, the large fixed plate 30 faces the small fixed plate 20 and the atomic force microscope sample stage 50 are set, the outer diameter of the disk of the large fixed disk 30 is larger than the outer diameter of the disk of the small fixed disk; the pressure ring 40 is facing the opening 303 in the middle of the large fixed disk 30 Make settings.
- the atomic force microscope sample stage 50, the large fixed disk 30, the small fixed disk 20, and the pressing column 10 each include a first end surface and a second end surface.
- the second end surface 302 of the large fixed plate 30 is provided with a presser foot 304.
- the connection device between the large fixing plate 30 and the tableting leg 304 is a bolt connection or a rivet connection.
- the pressing column 10 is a cylindrical structure
- the small fixed disc 20 and the large fixed disc 30 are both hollow disc-shaped structures
- the pressing ring 40 is a In a circular ring structure
- the pressing leg 304 is a sheet-like structure.
- the outer diameter of the large fixed plate 30 is less than or equal to the outer diameter of the circular hole 503 of the intermediate opening portion 503 of the atomic force microscope sample stage 50, and greater than the outer diameter of the pressure ring 40;
- the outer diameter of the pressure ring 40 is equal to the outer diameter of the second end surface 102 of the pressure column 10.
- both the large fixed disk 30 and the small fixed disk 20 have a magnetic attraction function.
- the two are reliably magnetically attracted together.
- the pressure The column 10, the small fixed disk 20 and the large fixed disk 30 are all in a fixed state, which realizes the first fixing of the roughness measuring jig.
- the pressing column 10 may be cylindrical or a part of a cylinder and a part of a circular truncated cone.
- A (cylindrical) in FIG. 7 and B (a part of a cylinder and a part of a circle) Taiwan).
- the pressure column 10 and the small fixed plate 20 are fixed together, and the cooperation between the pressure column 10 and the small fixed plate 20 may be an interference fit or a threaded fit.
- a connection device is installed between the tablet foot 304 and the large fixing plate 30, and the connection may be a bolt connection or a rivet connection.
- the pressing leg 304 and the atomic force microscope sample stage 50 are fixed by a connecting device or fixed by magnetic force.
- Atomic Force Microscope Atomic Force Microscope
- AFM Atomic Force Microscope
- the basic principle of Microscope is to use a very fine needle tip as a probe.
- the force between the atoms at the top of the probe and the atoms on the surface of the sample will cause the cantilever beam to deviate from its original position or change in motion
- the laser light incident on the cantilever beam will also be deflected and projected onto a four-quadrant detector, and then reconstruct the three-dimensional image according to the deviation of the probe when scanning the sample, and the topography of the sample surface can be obtained.
- the roughness measuring jig includes the features described in any of the aforementioned roughness measuring jigs, the method includes the following steps: S10, first fixing the pressing column 10 and the small fixing plate 20 to form a whole ; S20, take a sample material to be tested and place it on the second end face 102 of the pressure column 10; S30, the whole formed by the small fixed disc 20 and the pressure column 10 and the large fixed disc 30 Cooperate placement; S40, place the pressure ring 40 on the second end surface 102 of the pressure column 10; S50, fix the tablet foot 304 of the large fixed plate 30 and the atomic force microscope sample stage 50 together; S60, the sample material is detected using an atomic force microscope.
- the step “S10” includes: S101, aligning the second end face 102 of the pressing column 10 with the middle opening 203 of the first end face 201 of the small fixed plate 20; S102, passing the second end surface 102 of the pressing column 10 through the first end surface 201 and the second end surface 202 of the small fixing plate 20, so that the second end surface 102 of the pressing column 10 protrudes from the small fixing The second end surface 202 of the disc 20.
- the step “S20” includes: S201, cutting a sample material of a suitable size to be tested; S201, placing the cut sample material on the second end surface of the pressing column 10 102.
- the step “S30” includes: S301, the whole formed by the small fixed disc 20 and the pressing column 10, is facing the first end surface 301 of the large fixed disc 30
- the middle opening 303 is placed so that the second end face 202 of the small fixed plate 20 is directly facing the first end face 301 of the large fixed plate 30; S302, slowly pushed in the direction of the first end face 301 of the large fixed plate 30
- S302 slowly pushed in the direction of the first end face 301 of the large fixed plate 30
- the integrality of the small fixed plate 20 and the pressing column 10 makes the large fixed plate 30 and the small fixed plate 20 attract together.
- the step “S50” includes: S501, placing the entire roughness detection jig together against the first end surface 501 of the middle opening 503 of the atomic force microscope sample stage 50, so that the The second end surface 302 of the large fixed disk 30 is directly opposite to the first end surface 501 of the atomic force microscope sample stage 50; S502, the entire roughness measurement fixture is pushed along the first end surface 501 of the atomic force microscope sample stage 50, so that the large fixed The second end surface 302 of the disc 30 is flush with the second end surface 502 of the atomic force microscope sample stage 50; S503, rotating the pressing foot 304 of the large fixed disk 30, so that the pressing foot 304 of the large fixed disk 30 The corresponding position of the second end surface 502 of the atomic force microscope sample stage 50 is fixed.
- the pressing ring 40 is placed on the second end surface 102 of the pressing column 10 to prevent the sample material from moving, and it is not convenient to measure the surface roughness. See FIG. 5 for details.
- the entire roughness measuring device is installed on the atomic force microscope sample stage 50, so that the pressing foot 304 on the large fixed disk 30 and the positioning hole 504 on the atomic force microscope sample stage are installed together to achieve Secondary fixation to prevent the measured material from sliding around, see Figure 6 for details.
- the cooperation between the pressing leg 304 and the positioning hole 504 of the large fixing plate 30 may be a bolt connection or a rivet connection.
- Another possible coordination method is that the positioning hole 504 is not provided on the sample table 50 of the atomic force microscope, the pressing foot 304 itself is magnetic, and then the roughness measuring device is installed on the sample table 50 of the atomic force microscope Only by rotating the tabletting foot 304, the roughness measuring device can be connected to the atomic force microscope sample stage 50 for measurement, see FIG. 8 for details.
- the roughness measurement jig and method can effectively fix and measure the sample material without affecting the surface roughness of the sample, and the operation is simple, which makes the surface roughness of the sample material measured more accurate.
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Abstract
一种粗糙度测量夹具,该夹具包括:压柱、小固定盘、大固定盘以及压环;压柱,设置于底部;小固定盘,设置于压柱和大固定盘之间,且其外径大于压柱,小于大固定盘;大固定盘,正对于小固定盘和原子力显微镜样品台;压环,正对于大固定盘中心的位置。
Description
本发明涉及测量领域,特别是涉及一种粗糙度测量夹具及其测量方法。
现阶段的软质薄膜材料广泛应用在各行各业,比如薄膜晶体管液晶显示器行业中,偏光片的离型膜、异方性导电胶(ACF,Anisotropic Conductive Film)的离型膜等,这些膜材本身的表面光滑程度对其他工艺条件有着重要的影响,因此了解这些膜材的表面粗糙度是很重要的。
现阶段,对于薄膜材料的测量,都是用双面胶固定在玻璃基板等硬质板材上,然后在样品表面再压一片硬质板材,并用手指用力按压板材,以将样品被双面胶良好贴合在底材上,然后再将贴有被测样品的硬质底材用样品台的卡夹压住进行上样测量。
这种方法虽然很简便,但还存在一些问题:
由于薄膜材料是通过双面胶贴合在底材上的,而双面胶本身具有一定的粗糙度,当扫描探针在薄膜材料的表面扫描的时候,不排除会受到双面胶的影响;
为了将薄膜材料良好地固定在底材上,需要借助外力施加在薄膜材料的表面,这种处理方式对薄膜材料的表面难免会有一定的损坏。
因此,现有的薄膜材料测量技术中,还存在如何在不影响薄膜材料表面粗糙度的情况下,对其进行固定并测量的问题,急需改进。
本发明涉及一种粗糙度测量夹具及其测量方法,用于解决现有技术中存在的薄膜材料的固定和测量问题。
为解决上述问题,本发明提供的技术方案如下:
根据本发明提供的一种粗糙度测量夹具,包括:一压柱,一小固定盘,一大固定盘以及一压环;其中,
所述压柱,设置于整个粗糙度测量夹具的底部;
所述小固定盘,所述压柱通过所述小固定盘中间的开口部与所述小固定盘配合作业;
所述大固定盘,所述大固定盘正对于所述小固定盘和原子力显微镜样品台进行设置,所述大固定盘的圆盘外径大于所述小固定盘的圆盘外径,且所述大固定盘设置有压片脚;
所述压环,正对于所述大固定盘中间的开口部进行设置。
根据本发明提供的一优选实施例,所述原子力显微镜样品台,所述大固定盘,所述小固定盘和所述压柱均包括第一端面和第二端面。
根据本发明提供的一优选实施例,所述压柱为一柱形结构,所述小固定盘和所述大固定盘均为中空的圆盘状结构,所述压环为一圆环状结构。
根据本发明提供的一优选实施例,所述大固定盘的外径小于或等于所述原子力显微镜样品台中间开口部的圆孔外径,大于所述压环的外径;所述压环的外径等于所述压柱第二端面的外径。
根据本发明提供的一优选实施例,所述大固定盘和所述小固定盘均有磁力吸引功能。
根据本发明提供的一优选实施例,所述压片脚与所述大固定盘之间通过连接装置进行连接。
根据本发明提供的一优选实施例,所述连接装置为螺栓连接或是铆钉连接。
根据本发明提供的一优选实施例,所述压柱可以是圆柱形或是一部分圆柱一部分圆台形。
根据本发明提供的一优选实施例,所述压柱和所述小固定盘之间为过盈配合或是螺纹配合。
根据本发明提供的一优选实施例,所述压片脚与所述原子力显微镜样品台之间通过连接装置固定或是磁力固定。
为解决上述问题,本发明还提供另外一种粗糙度测量夹具,包括:
一种粗糙度测量夹具,其包括:一压柱,一小固定盘,一大固定盘以及一压环;其中,
所述压柱,设置于整个粗糙度测量夹具的底部;
所述小固定盘,设置于所述压柱和所述大固定盘之间,且其外径大于所述压柱,小于所述大固定盘;
所述大固定盘,正对于所述小固定盘和原子力显微镜样品台进行设置,所述大固定盘的圆盘外径大于所述小固定盘的圆盘外径;
所述压环,正对于所述大固定盘中心的位置进行设置;
根据本发明提供的一优选实施例,所述原子力显微镜样品台,所述大固定盘,所述小固定盘和所述压柱均包括第一端面和第二端面。
根据本发明提供的一优选实施例,所述大固定盘的第二端面设置有压片脚。
根据本发明提供的一优选实施例,所述压柱为一柱形结构,所述小固定盘和所述大固定盘均为中空的圆盘状结构,所述压环为一圆环状结构。
根据本发明提供的一优选实施例,所述大固定盘的外径小于或等于所述原子力显微镜样品台中间开口部的圆孔外径,大于所述压环的外径;所述压环的外径等于所述压柱第二端面的外径。
根据本发明提供的一优选实施例,所述大固定盘和所述小固定盘均有磁力吸引功能。
根据本发明的上述目的,提供一种使用上述任一优选实施例的测量夹具进行粗糙度测量方法,所述方法包括如下步骤:
S10,先将所述压柱和所述小固定盘进行固定,形成一个整体;
S20,取一份待测样品材料,放置于所述压柱的第二端面;
S30,将所述小固定盘和所述压柱形成的整体与所述大固定盘进行配合放置;
S40,将所述压环放置于所述压柱的第二端面;
S50,将所述大固定盘的压片脚与所述原子力显微镜样品台固定在一起;
S60,使用原子力显微镜对样品材料进行检测。
根据本发明提供的一优选实施例,所述步骤“S10”包括:
S101,将所述压柱的第二端面与所述小固定盘的第一端面的中间开口部对齐;
S102,将所述压柱的第二端面穿过所述小固定盘的第一端面和第二端面,使得所述压柱的第二端面凸出于所述小固定盘的第二端面。
根据本发明提供的一优选实施例,所述步骤“S30”包括:
S301,将所述小固定盘和所述压柱形成的整体,正对于所述大固定盘第一端面的中间开口部进行放置,使得所述小固定盘的第二端面正对于所述大固定盘的第一端面;
S302,慢慢沿所述大固定盘第一端面方向推动所述小固定盘和所述压柱形成的整体,使得所述大固定盘和所述小固定盘吸引在一起。
根据本发明提供的一优选实施例,所述步骤“S50”包括:
S501,将整个粗糙度检测夹具一起正对于所述原子力显微镜样品台中间开口部的第一端面放置,使得所述大固定盘的第二端面正对于所述原子力显微镜样品台的第一端面;
S502,将整个粗糙度测量夹具沿原子力显微镜样品台的第一端面推动,使得所述大固定盘的第二端面与所述原子力显微镜样品台的第二端面平齐;
S503,旋转所述大固定盘的压片脚,使得所述大固定盘的压片脚与所述原子力显微镜样品台第二端面的相应位置进行固定。
本发明与现有技术相比,提供一种全新的粗糙度测量夹具,可以在不影响样品表面粗糙度的情况下,对样品材料进行有效固定和测量,操作简便,使得所测样品材料的表面粗糙度准确性更高。
为了更清楚地说明本发明实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的粗糙度测量夹具和原子力显微镜样品台的第一结构示意图。
图2为本发明实施例提供的粗糙度测量夹具的第二结构示意图。
图3为本发明实施例提供的粗糙度测量夹具的第三结构示意图。
图4为本发明实施例提供的粗糙度测量夹具的第三结构示意图。
图5为本发明实施例提供的粗糙度测量夹具的第四结构示意图。
图6为本发明实施例提供的粗糙度测量夹具和原子力显微镜样品台的第五结构示意图。
图7中的A为本发明实施例提供的粗糙度测量夹具中压柱的第一结构示意图。
图7中的B为本发明实施例提供的粗糙度测量夹具中压柱的第二结构示意图。
图8为本发明实施例提供的粗糙度测量夹具和原子力显微镜样品台的第二结构示意图。
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
在本发明的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本发明的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。
本发明提供一种粗糙度测量夹具及其测量方法,具体请结合图1-8。图1为粗糙度测量夹具与原子力显微镜样品台的第一结构示意图。10为压柱,101为压柱的第一端面,102为压柱的第二端面;20为小固定盘,201为小固定盘的第一端面,202为小固定盘的第二端面,203为小固定盘的中间开口部;30为大固定盘,301为大固定盘的第一端面,302为大固定盘的第二端面,303为大固定盘的中间开口部,304为大固定盘上的压片脚,305为大固定盘与其压片脚之间的连接装置;40为压环;50为原子力显微镜样品台,501为原子力显微镜样品台的第一端面,502为原子力显微镜样品台的第二端面,503为原子力显微镜样品台中间的开口部,504为定位孔。
根据本发明提供的一种粗糙度测量夹具,包括:一压柱10,一小固定盘20,一大固定盘30以及一压环40;压柱10,设置于整个粗糙度测量夹具的底部;小固定盘20,所述压柱10通过所述小固定盘20中间的开口部203与所述小固定盘20配合作业;大固定盘30,所述大固定盘30正对于所述小固定盘20和原子力显微镜样品台50进行设置,所述大固定盘30的圆盘外径大于所述小固定盘的圆盘外径;压环40,正对于所述大固定盘30中间的开口部303进行设置。
根据本发明提供的一优选实施例,所述原子力显微镜样品台50,所述大固定盘30,所述小固定盘20和所述压柱10均包括第一端面和第二端面。
根据本发明提供的一优选实施例,所述大固定盘30的第二端面302设置有压片脚304。所述大固定盘30与所述压片脚304之间的连接装置为螺栓连接或是铆钉连接。
根据本发明提供的一优选实施例,所述压柱10为一柱形结构,所述小固定盘20和所述大固定盘30均为中空的圆盘状结构,所述压环40为一圆环状结构,所述压片脚304为一片状结构。
根据本发明提供的一优选实施例,所述大固定盘30的外径小于或等于所述原子力显微镜样品台50中间开口部503的圆孔外径,大于所述压环40的外径;所述压环40的外径等于所述压柱10第二端面102的外径。
根据本发明提供的一优选实施例,所述大固定盘30和所述小固定盘20均有磁力吸引功能。作业时,当所述小固定盘20靠近所述大固定盘30时,两者可靠磁力吸合在一起,当所述小固定盘20和所述大固定盘30固定在一起时,所述压柱10,所述小固定盘20和所述大固定盘30均为固定状态,实现了该粗糙度测量夹具的第一次固定。
根据本发明提供的一优选实施例,所述压柱10可以是圆柱形或是一部分圆柱一部分圆台形,具体详见图7中的A(圆柱形)和图7中的B(一部分圆柱一部分圆台形)。作业时,所述压柱10和所述小固定盘20固定在一起,所述压柱10和所述小固定盘20之间的配合可以是过盈配合可以是螺纹配合等。
根据本发明提供的一优选实施例,所述压片脚304与所述大固定盘30之间装有连接装置,该处连接可以是螺栓连接或是铆钉连接等。所述压片脚304与所述原子力显微镜样品台50之间通过连接装置固定或是磁力固定。
原子力显微镜(AFM,Atomic Force
Microscope)的基本原理是利用一个非常精细的针尖作为探针,当探针非常靠近样品时,其顶端的原子与样品表面原子间的作用力,会使悬臂梁偏离原来的位置或运动状态发生变化,此时入射到悬臂梁上的激光也会随之发生偏转并投射到一个四象限的探测器上,随后根据扫描样品时探针的偏离量重建三维图像,就能获得样品表面的形貌。
因此,本发明提供的一种粗糙度测量方法,配合原子力显微镜进行使用。其中,所述粗糙度测量夹具包括前述任一条粗糙度测量夹具所述的特征,所述方法包括如下步骤:S10,先将所述压柱10和所述小固定盘20进行固定,形成一个整体;S20,取一份待测样品材料,放置于所述压柱10的第二端面102;S30,将所述小固定盘20和所述压柱10形成的整体与所述大固定盘30进行配合放置;S40,将所述压环40放置于所述压柱10的第二端面102;S50,将所述大固定盘30的压片脚304与所述原子力显微镜样品台50固定在一起;S60,使用原子力显微镜对样品材料进行检测。
根据本发明提供的一优选实施例,所述步骤“S10”包括:S101,将所述压柱10的第二端面102与所述小固定盘20的第一端面201的中间开口部203对齐;S102,将所述压柱10的第二端面102穿过所述小固定盘20的第一端面201和第二端面202,使得所述压柱10的第二端面102凸出于所述小固定盘20的第二端面202。
根据本发明提供的一优选实施例,所述步骤“S20”包括:S201,切取一份适量大小的待测样品材料;S201,将切取完成的样品材料放置于所述压柱10的第二端面102。
根据本发明提供的一优选实施例,所述步骤“S30”包括:S301,将所述小固定盘20和所述压柱10形成的整体,正对于所述大固定盘30第一端面301的中间开口部303进行放置,使得所述小固定盘20的第二端面202正对于所述大固定盘30的第一端面301;S302,慢慢沿所述大固定盘30第一端面301方向推动所述小固定盘20和所述压柱10形成的整体,使得所述大固定盘30和所述小固定盘20吸引在一起。
根据本发明提供的一优选实施例,所述步骤“S50”包括:S501,将整个粗糙度检测夹具一起正对于所述原子力显微镜样品台50中间开口部503的第一端面501放置,使得所述大固定盘30的第二端面302正对于所述原子力显微镜样品台50的第一端面501;S502,将整个粗糙度测量夹具沿原子力显微镜样品台50的第一端面501推动,使得所述大固定盘30的第二端面302与所述原子力显微镜样品台50的第二端面502平齐;S503,旋转所述大固定盘30的压片脚304,使得所述大固定盘30的压片脚304与所述原子力显微镜样品台50第二端面502的相应位置进行固定。
实施例一
检测时,先将粗糙度测量装置的所述压柱10和所述小固定盘20安装在一起,详见图2。然后将待测样品材料放置在所述压柱10的第二端面102上,向上推动所述压柱10和所述小固定盘20组成的整体,使得所述压柱10的第二端面正对于所述大固定盘30第一端面301的中间开口部303,详见图3。继续向上推动所述压柱10和所述小固定盘20组成的整体,使得所述小固定盘20的第二端面202和所述大固定盘30的第一端面301贴合在一起,以实现第一次固定,详见图4。将所述压环40放在所述压柱10的第二端面102上,防止样品材料移动,不便于测量其表面粗糙度,详见图5。最后再将整个粗糙度测量装置安装到原子力显微镜样品台50上,使得所述大固定盘30上的所述压片脚304和原子力显微镜样品台上的所述定位孔504配合安装在一起,实现二次固定,防止所测材料向四周滑动,详见图6。所述大固定盘30的所述压片脚304和所述定位孔504之间的配合可以是螺栓连接或是铆钉连接等。安装完成后,配合原子力显微镜即可检测样品材料表面的粗糙度值。
实施例二
另一种可能的配合方式是,原子力显微镜样品台50上没有所述定位孔504,所述压片脚304本身是带有磁性的,再将粗糙度测量装置安装到原子力显微镜样品台50上时,只需旋转所述压片脚304,所述粗糙度测量装置即可与原子力显微镜样品台50连接在一起,进行测量,详见图8。
该粗糙度测量夹具和方法,在不影响样品表面粗糙度的情况下,对样品材料进行有效固定和测量,操作简便,使得所测样品材料的表面粗糙度准确性更高。
以上对本发明实施例所提供的一种粗糙度测量夹具及其测量方法进行了详细介绍,本文中应用了具体个例对本发明的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本发明的技术方案及其核心思想;本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例的技术方案的范围。
Claims (19)
- 一种粗糙度测量夹具,其包括:一压柱,一小固定盘,一大固定盘以及一压环;其中,所述压柱,设置于整个粗糙度测量夹具的底部;所述小固定盘,设置于所述压柱和所述大固定盘之间,且其外径大于所述压柱,小于所述大固定盘;所述大固定盘,正对于所述小固定盘和原子力显微镜样品台进行设置,所述大固定盘的圆盘外径大于所述小固定盘的圆盘外径;且所述大固定盘设置有压片脚;所述压环,正对于所述大固定盘中心的位置进行设置。
- 根据权利要求1所述的粗糙度测量夹具,其中,所述原子力显微镜样品台,所述大固定盘,所述小固定盘和所述压柱均包括第一端面和第二端面。
- 根据权利要求1所述的粗糙度测量夹具,其中,所述压柱为一柱形结构,所述小固定盘和所述大固定盘均为中空的圆盘状结构,所述压环为一圆环状结构。
- 根据权利要求1所述的粗糙度测量夹具,其中,所述大固定盘的外径小于或等于所述原子力显微镜样品台中间开口部的圆孔外径,大于所述压环的外径;所述压环的外径等于所述压柱第二端面的外径。
- 根据权利要求1所述的粗糙度测量夹具,其中,所述大固定盘和所述小固定盘均有磁力吸引功能。
- 根据权利要求1所述的粗糙度测量夹具,其中,所述压片脚与所述大固定盘之间通过连接装置进行连接。
- 根据权利要求6所述的粗糙度测量夹具,其中,所述连接装置为螺栓连接或是铆钉连接。
- 根据权利要求1所述的粗糙度测量夹具,其中,所述压柱为圆柱形或是一部分圆柱一部分圆台形。
- 根据权利要求1所述的粗糙度测量夹具,其中,压柱和小固定盘之间为过盈配合或是螺纹配合。
- 根据权利要求1所述的粗糙度测量夹具,其中,压片脚与原子力显微镜样品台之间通过连接装置固定或是磁力固定。
- 一种粗糙度测量夹具,其中,包括:一压柱,一小固定盘,一大固定盘以及一压环;压柱,设置于整个粗糙度测量夹具的底部;小固定盘,设置于所述压柱和所述大固定盘之间,且其外径大于所述压柱,小于所述大固定盘;大固定盘,正对于所述小固定盘和原子力显微镜样品台进行设置,所述大固定盘的圆盘外径大于所述小固定盘的圆盘外径;压环,正对于所述大固定盘中心的位置进行设置。
- 根据权利要求11所述的粗糙度测量夹具,其中,所述原子力显微镜样品台,所述大固定盘,所述小固定盘和所述压柱均包括第一端面和第二端面。
- 根据权利要求11所述的粗糙度测量夹具,其中,所述压柱为一柱形结构,所述小固定盘和所述大固定盘均为中空的圆盘状结构,所述压环为一圆环状结构。
- 根据权利要求11所述的粗糙度测量夹具,其中,所述大固定盘的外径小于或等于所述原子力显微镜样品台中间开口部的圆孔外径,大于所述压环的外径;所述压环的外径等于所述压柱第二端面的外径。
- 根据权利要求11所述的粗糙度测量夹具,其中,所述大固定盘和所述小固定盘均有磁力吸引功能。
- 一种粗糙度测量方法,其中,所述粗糙度测量夹具包括权利要求11-16任一条所述的特征,所述方法包括如下步骤:S10,先将所述压柱和所述小固定盘进行固定,形成一个整体;S20,取一份待测样品材料,放置于所述压柱的第二端面;S30,将所述小固定盘和所述压柱形成的整体与所述大固定盘进行配合放置;S40,将所述压环放置于所述压柱的第二端面;S50,将所述大固定盘的压片脚与所述原子力显微镜样品台固定在一起;S60,使用原子力显微镜对样品材料进行检测。
- 根据权利要求17所述的粗糙度测量方法,其中,所述步骤“S10”包括:S101,将所述压柱的第二端面与所述小固定盘的第一端面的中间开口部对齐;S102,将所述压柱的第二端面穿过所述小固定盘的第一端面和第二端面,使得所述压柱的第二端面凸出于所述小固定盘的第二端面。
- 根据权利要求17所述的粗糙度测量方法,其中,所述步骤“S30”包括:S301,将所述小固定盘和所述压柱形成的整体,正对于所述大固定盘第一端面的中间开口部进行放置,使得所述小固定盘的第二端面正对于所述大固定盘的第一端面;S302,慢慢沿所述大固定盘第一端面方向推动所述小固定盘和所述压柱形成的整体,使得所述大固定盘和所述小固定盘吸引在一起。
- 根据权利要求17所述的粗糙度测量方法,其中,所述步骤“S50”包括:S501,将整个粗糙度检测夹具一起正对于所述原子力显微镜样品台中间开口部的第一端面放置,使得所述大固定盘的第二端面正对于所述原子力显微镜样品台的第一端面;S502,将整个粗糙度测量夹具沿原子力显微镜样品台的第一端面推动,使得所述大固定盘的第二端面与所述原子力显微镜样品台的第二端面平齐;S503,旋转所述大固定盘的压片脚,使得所述压片脚与所述原子力显微镜样品台第二端面的相应位置进行固定。
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| CN203824939U (zh) * | 2013-12-19 | 2014-09-10 | 江苏省沙钢钢铁研究院有限公司 | 透射式电子背散射衍射实验用样品台 |
| CN205465825U (zh) * | 2016-01-25 | 2016-08-17 | 哈尔滨理工大学 | 一种用于透射样品喷碳的夹具 |
| CN206114373U (zh) * | 2016-06-20 | 2017-04-19 | 燕山大学 | 一种透射电镜试样制备辅助工具 |
| CN107015027B (zh) * | 2017-03-03 | 2020-09-01 | 复旦大学 | 一种扫描探针显微镜的样品定位固定方法及装置 |
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| WO2014115586A1 (ja) * | 2013-01-23 | 2014-07-31 | 株式会社 日立ハイテクノロジーズ | 表面計測装置 |
| CN105548617A (zh) * | 2015-12-21 | 2016-05-04 | 中国科学院长春光学精密机械与物理研究所 | 一种极紫外凹面反射镜表面粗糙度评估方法 |
| CN206552400U (zh) * | 2017-01-24 | 2017-10-13 | 福建省燕京惠泉啤酒股份有限公司 | 一种用于水晶打标机的托瓶转盘 |
| CN206484455U (zh) * | 2017-02-20 | 2017-09-12 | 安徽机电职业技术学院 | 一种检测用片状零件夹具装置 |
| CN206711864U (zh) * | 2017-04-24 | 2017-12-05 | 上海磐颖实业有限公司 | 一种用于真空互联扫描电镜样品托 |
| CN108333389A (zh) * | 2018-01-08 | 2018-07-27 | 北京建筑大学 | 一种基于原子力显微镜测试集料表面粗糙度的方法 |
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| CN109188028A (zh) | 2019-01-11 |
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