WO2020052097A1 - 阵列基板及显示面板 - Google Patents

阵列基板及显示面板 Download PDF

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Publication number
WO2020052097A1
WO2020052097A1 PCT/CN2018/118192 CN2018118192W WO2020052097A1 WO 2020052097 A1 WO2020052097 A1 WO 2020052097A1 CN 2018118192 W CN2018118192 W CN 2018118192W WO 2020052097 A1 WO2020052097 A1 WO 2020052097A1
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WIPO (PCT)
Prior art keywords
array substrate
array
substrate
blocking
same
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Ceased
Application number
PCT/CN2018/118192
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English (en)
French (fr)
Inventor
杨春辉
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HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
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HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
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Priority to US16/312,616 priority Critical patent/US20200081301A1/en
Publication of WO2020052097A1 publication Critical patent/WO2020052097A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

Definitions

  • the present application relates to the technical field of display devices, and in particular, to an array substrate and a display panel.
  • the currently widely used liquid crystal displays usually have two substrates with a liquid crystal layer interposed therebetween, a sealing glue is located between the two substrates to join the two substrates, and the liquid crystal layer is sealed between the two substrates.
  • the first process is the alignment layer process.
  • an alignment layer (Alignment Layer or Orientation Layer) is provided on the surface of each substrate, and an alignment layer is formed by providing an alignment groove on the alignment layer.
  • a sealant is set to join the two substrates.
  • the alignment layer forming liquid can rotate polyimide (PI).
  • PI polyimide
  • the inkjet method has gradually become a common method.
  • the inkjet method has blurred borders, and it is difficult to control the accuracy reasonably and accurately, which causes the problem of poor coating. Therefore, during the manufacturing process, a plurality of dummy walls (DPSW, DPSW) and a plurality of grooves are set in the peripheral area of the substrate, so as to prevent the effective display area around the effective display area when the alignment layer forming liquid is coated on the substrate.
  • the alignment layer liquid overflows to the effective display area or the area close to the sealant.
  • this method requires a process of placing a partition wall around the effective display area in the substrate manufacturing process, which not only increases the difficulty of the process, but also affects the yield of the finished product.
  • An object of the present application is to provide an array substrate including, but not limited to, a technical problem that is difficult to accurately control the formation of an alignment layer forming liquid when the substrate is coated on the boundary.
  • an array substrate including:
  • Substrate including effective display area and border area
  • An array structure provided at least in an effective display area of the substrate.
  • a blocking structure disposed in a frame region of the substrate, the blocking structure surrounding the array structure;
  • the blocking structure has uneven surfaces with different heights arranged alternately.
  • the concave-convex surface of the blocking structure is provided with a plurality of grooves.
  • a shape of a cross section of the plurality of grooves is at least one of a straight line, a polyline, a non-closed curve, a closed curve, a polygon, and a radial shape, and the cross section is parallel to the base.
  • the plurality of grooves are disposed on the surface of the blocking structure in an equal interval, an unequal interval, or a local equal interval; the lengths of the plurality of grooves are the same, different, or partially the same.
  • the widths of the plurality of grooves are the same, different, or partially the same; the depths of the plurality of grooves are the same, different, or partially the same.
  • the depth of each of the grooves is less than the thickness of the blocking structure.
  • the thickness of the blocking structure is between 200 mm and 600 mm, and the depth of the groove is between 200 mm and 500 mm; and the width of the groove is between 0.1 mm and 0.5 mm. .
  • a sealant is provided on an edge of a side of the frame region away from the effective display region, and the blocking structure has alternately uneven surfaces with different heights.
  • the sealant is located between the sealant and the effective Between display areas.
  • the array substrate further includes a flow guiding structure disposed on the periphery of the array structure, and the flow guiding structure and the blocking structure have a height difference.
  • a separation groove is provided between the blocking structure and the array structure, and the flow guiding structure is disposed in the separation groove.
  • the diversion structure includes a plurality of barrier walls and a plurality of openings, and each of the barrier walls and the openings are alternately arranged.
  • the diversion structure includes a plurality of diversion walls, the widths of the plurality of diversion walls are the same, different or partially the same, and the heights of the plurality of diversion walls are the same, different Or the parts are the same, and the thicknesses of the plurality of diversion walls are the same, different or partly the same.
  • a shape of a cross section of the plurality of diversion walls is at least one of a straight line, a polyline, a non-closed curve, a closed curve, a polygon, and a radial shape, and the cross section is parallel to the base.
  • the width of the diversion wall is 10 ⁇ m to 300 ⁇ m
  • the height of the diversion wall is 2 ⁇ m to 5 ⁇ m
  • the thickness of the diversion wall is 0.3 ⁇ m to 5 ⁇ m.
  • the array substrate is an active switch array substrate
  • the blocking structure is one of the metal film, the inorganic insulating film, the transparent conductive film, and the semiconductor film or one of the above-mentioned films provided on the active switch array substrate. Made of combinations.
  • the array substrate is a color filter substrate
  • the blocking structure is one or more of a color filter film, a protective film, a black matrix film, and a transparent conductive film provided on the color filter substrate. Made of a combination of films.
  • the barrier structure and the protective layer of the array substrate are made of the same material, and the barrier structure and the protective layer of the array substrate are made of the same material at one time.
  • Another object of the present application is to provide an array substrate, including:
  • a substrate including an effective display area and a border area provided around the effective display area
  • An array structure provided in the effective display area
  • a blocking structure disposed in the frame region and surrounding the array structure
  • the blocking structure includes a plurality of protruding portions and a plurality of recessed portions arranged alternately, a periphery of the array structure is provided with a flow guiding structure, and there is a height difference between the flow guiding structure and the blocking structure, and the blocking A separation groove is provided between the structure and the array structure, and the flow guiding structure is disposed in the separation groove.
  • Another object of the present application is to provide a display panel, including:
  • An array substrate includes a substrate, an array structure disposed on an effective display area of the substrate, and a protective layer and a barrier structure disposed on a surface of the substrate;
  • the opposite substrate is disposed opposite to the array substrate and includes a base layer and a barrier structure disposed on the base layer and facing the array substrate;
  • a liquid crystal layer between the array substrate and the opposite substrate A liquid crystal layer between the array substrate and the opposite substrate
  • a sealant is located between the array substrate and the opposite substrate, and the sealant ring is provided on the periphery of the liquid crystal layer;
  • the barrier structure surrounds the array structure, the barrier structure has concave-convex surfaces alternately arranged with different step heights, the barrier structure and the protective layer are made of the same material, and the barrier structure and the protective layer are once Molding; the barrier structure is provided corresponding to the barrier structure, and has uneven surfaces with different heights arranged alternately.
  • the display panel provided in the embodiment of the present application improves the coating accuracy of the alignment layer forming liquid by increasing the roughness of the frame substrate's frame area, and it is easy to control the overflow boundary of the forming liquid and control the manufacturing process.
  • 1 is a plan view of a substrate of an exemplary liquid crystal display panel
  • FIG. 2 is a cross-sectional view of a blocking and flow guiding structure of an array substrate according to an embodiment of the present application
  • FIG. 3 is a schematic diagram of a shape of a groove on a surface of a blocking structure according to an embodiment of the present application
  • FIG. 4 is a schematic diagram of a shape of a groove on a surface of a blocking structure according to another embodiment of the present application.
  • FIG. 5 is a schematic diagram of a shape of a groove on a surface of a blocking structure according to another embodiment of the present application.
  • FIG. 6 is a schematic configuration diagram of a blocking structure of a display panel according to an embodiment of the present application.
  • FIG. 7 is a cross-sectional view of an array substrate's blocking and conducting structure provided by an embodiment of the present application.
  • FIG. 8 is a cross-sectional view of a liquid crystal display panel according to an embodiment of the present application.
  • FIG. 1 illustrates a cross-sectional structure of an exemplary liquid crystal display panel.
  • the basic structure of the liquid crystal display panel includes an array substrate 100, an opposite substrate 200, a sealant 106, and a liquid crystal layer 105.
  • the array substrate 100 includes a substrate 101; an array structure 102 disposed on the substrate 101; an alignment layer 103 disposed on the array structure 102; and a barrier structure 104 disposed on the substrate 101 and substantially surrounding the alignment layer 103.
  • the barrier structure 104 and The surface of the substrate 101 constitutes a height difference.
  • the alignment layer 103 is formed by applying an alignment layer-forming liquid polyimide (PI) on the array structure 102.
  • PI alignment layer-forming liquid polyimide
  • the blocking structure 103 includes several different structures, which can be designed according to different requirements, such as: grooves, partition walls provided by Photo Spacer (PS), non-display area color blocking walls, or one of these three components. Structural design consisting of at least one of them.
  • the center of the array substrate 100 is an effective display area, which includes a plurality of pixel areas.
  • Each pixel area is provided with a plurality of different color resists, which are different according to the specifications of the display panel, such as three-color resists, Design of four-color color resist or other multi-color color resist.
  • Three-color resist such as red, green, and blue, and four-color resist such as red, green, blue, and white.
  • the combination of each color resistance may also include a color resistance of yellow or other colors.
  • the material of the non-display area color blocking wall is red color resistance, blue color resistance, or green color resistance.
  • the non-display area color barrier wall is firstly subjected to red, blue, or green color barrier coating during processing.
  • the barrier wall is coated with a barrier color barrier and exposed to the barrier.
  • the partition wall is arranged on the non-display area color blocking wall. Depending on the design requirements, several partition walls can be set. The height of the partition wall and the width of the groove are designed to take into account the part of the multi-coated alignment layer forming fluid caused by the accuracy error of the machine.
  • this method requires an additional process of setting a barrier wall around the effective display area in the substrate manufacturing process, which not only increases the difficulty of the process but also affects the yield of the finished product.
  • FIG. 2 is a cross-sectional view of a blocking and conducting structure of an array substrate according to an embodiment of the present application.
  • an array substrate 300 includes: a substrate 310; an array structure 320 disposed on an effective display area of the substrate 310, the array structure 320 corresponding to at least the effective display area; and a blocking structure 330
  • the blocking structure 330 is disposed on the surface of the substrate 310 and is located in a border region of the substrate 310.
  • the blocking structure 330 surrounds the array structure 320.
  • the blocking structure 330 has concave and convex surfaces of different heights arranged alternately.
  • the array substrate 300 is an active switch array substrate
  • the blocking structure 330 is made of one of a metal film, an inorganic insulating film, a transparent conductive film, and a semiconductor film or a combination of the foregoing films provided on the active switch array substrate. to make.
  • the array substrate 300 is a color filter substrate
  • the blocking structure 330 is made of one of a color filter film, a protective film, a black matrix film, and a transparent conductive film or a combination of the foregoing films provided on the color filter substrate. to make.
  • the concave-convex surface of the blocking structure 330 is provided with a plurality of grooves 331.
  • the plurality of grooves 331 are provided with a plurality of flow guiding grooves, so as to facilitate the flow of the alignment layer forming liquid in the frame region during the application.
  • the plurality of grooves 331 are disposed on the surface of the blocking structure 330 in an equal interval, an unequal interval, a local equal interval, or an array configuration.
  • the lengths of the plurality of grooves 331 are the same, different or partially the same.
  • the widths of the plurality of grooves 331 are the same, different, or partially the same.
  • the depths of the plurality of grooves 331 are the same, different or partially the same.
  • the thickness of the blocking structure 330 is d1
  • the depth of the groove 331 is d2
  • the thickness of the blocking structure 330 is between 200 mm and 600 mm, and the depth of the groove is between 200 mm and 500 mm.
  • the width of the groove 331 is between 0.1 mm and 0.5 mm.
  • a sealant 510 is disposed on an edge of the frame region away from the effective display region, and the blocking structure 330 has concave-convex surfaces with different heights arranged between the sealant 510 and the effective display region.
  • FIGS. 3 to 5 show the shape of the grooves on the surface of the barrier structure according to the embodiments of the present application.
  • the shape of the cross section of the plurality of grooves can be at least one selected from the group consisting of a circle, a square, and a cross.
  • the cross sections are parallel. ⁇ Substrate 310.
  • the shape of the plurality of grooves 331 may be from at least one of a straight line, a polyline, a non-closed curve, a closed curve, a polygon, and a radial shape, such as a semi-circular arc, a semi-elliptical arc, a square, a circle, At least one of an oval shape, a cross shape, a rice shape, a star shape, and an L shape.
  • FIG. 6 illustrates a blocking structure of a display panel according to an embodiment of the present application.
  • the barrier structure 330 is specially designed according to the photomask to which the thin film layer belongs, such as the use of half-tone mask (HTM), single narrow Single-slit mask (SSM), gray-tone mask (GTM).
  • HTM half-tone mask
  • SSM single narrow Single-slit mask
  • GTM gray-tone mask
  • SSM and GTM use the pattern slit diffraction principle to reduce local ultraviolet transmittance.
  • HTM uses a semi-permeable film on a mask to achieve local ultraviolet reduction, and then both are made to achieve the formation of their own film layers with different film thickness barrier structures. . As shown in FIG.
  • the first edge (E1) in the figure represents the formation liquid boundary when the actual alignment layer forming liquid is applied without overflowing;
  • the third boundary E3 represents the formation of the final setting layer after the actual alignment layer forming liquid is applied and overflowed.
  • the second boundary E2 indicates that after the barrier structure 330 is provided in the frame area (A area), that is, after increasing the roughness of the substrate surface, the coating liquid is actually applied and spilled out of the alignment layer, and the liquid boundary is finally set.
  • FIG. 7 illustrates a blocking and conducting structure of an array substrate according to an embodiment of the present application.
  • an array substrate 300 includes: a substrate 310; an array structure 320 disposed on the substrate 310; a blocking structure 330 disposed on the substrate 310 and surrounding the array structure 320; and a flow guiding structure 340, It is disposed on the periphery of the array structure 320 and has a height difference from the blocking structure 330.
  • the concave-convex surface of the blocking structure is provided with a plurality of grooves.
  • the diversion structure 340 includes a plurality of partition walls and a plurality of openings, and the partition walls and the openings are alternately arranged.
  • a plurality of separation grooves 350 are disposed between the blocking structure 330 and the array structure 320, and the flow guiding structure 340 is disposed in the separation grooves 350.
  • the widths of the plurality of separation grooves 350 can be set to be the same, different, or partially the same.
  • the depths of the plurality of separation grooves 350 may be set to be the same, different, or partially the same.
  • the depth of the separation groove 350 is about 0.4 micrometers to 1.6 micrometers.
  • the diversion structure 340 includes a plurality of diversion walls 341.
  • the widths of the plurality of diversion walls 341 can be set to be the same, different, or partially the same.
  • the width of the diversion wall 341 is about 10 ⁇ m to 300 ⁇ m.
  • the heights of the plurality of diversion walls 341 can be set to be the same, different, or partially the same.
  • the height of the guide wall 341 is about 2 micrometers to 5 micrometers.
  • the thicknesses of the plurality of diversion walls 341 can be set to be the same, different, or partially the same.
  • the thickness of the guide wall 341 is about 0.3 micrometers to 5 micrometers.
  • the shape of the cross sections of the plurality of diversion walls 341 is at least one of a straight line, a polyline, a non-closed curve, a closed curve, a polygon, and a radial shape.
  • the cross section is parallel to the base 310, such as a semi-circular arc. , Semi-elliptical arc, square, circle, oval, cross, m-shaped, star and L-shaped.
  • An array substrate provided by an embodiment of the present application includes a base 310, an array structure 320, and a blocking structure 330.
  • the base 310 includes an effective display area and a border area provided around the effective display area.
  • the array structure 320 The blocking structure 330 is disposed in the effective display area and is disposed around the array structure 320.
  • the blocking structure 300 includes a plurality of protrusions and a plurality of depressions arranged alternately, and a flow guiding structure 340 is provided on the periphery of the array structure 320. There is a height difference between the diversion structure 340 and the blocking structure 330.
  • a separation groove 350 is provided between the blocking structure 330 and the array structure 320.
  • the diversion structure 340 is disposed in the separation groove 350. In this way, the roughness of the frame area of the substrate can be improved, and the alignment can be improved. When the layer forming liquid is applied to the frame area, it is easy to control the overflow boundary, which is convenient for the control of the manufacturing process.
  • the diversion structure 340 is provided by a protective layer (Protective Varnish, PV).
  • the frame area of the array substrate is provided with a protective layer, and a special pattern design is made for the position of the PV mask in the frame area.
  • the PV mask uses, for example, a half-tone mask (HTM), a single-slit mask (single- slit mask (SSM), gray-tone mask (GTM).
  • HTM half-tone mask
  • SSM single-slit mask
  • GTM gray-tone mask
  • the SSM mask and the GTM mask use the pattern slit diffraction principle to reduce the local UV transmittance.
  • the HTM mask uses a semi-permeable film on the mask to reduce the local UV, and then achieve the setting of PV layers with different film thicknesses. .
  • FIG. 8 illustrates a cross-sectional structure of a liquid crystal display panel according to an embodiment of the present application.
  • a display panel includes: an array substrate 300; an opposite substrate 400 disposed opposite to the array substrate 300; a liquid crystal layer 520 between the array substrate 300 and the opposite substrate 400; and a seal
  • the glue 510 is located between the array substrate 300 and the opposite substrate 400 and is arranged around the periphery of the liquid crystal layer 520.
  • the array substrate 300 includes a substrate 310, an array structure 320 protective layer, and a barrier structure 330; the array structure 320 is disposed in an effective display area of the substrate 310, the barrier structure 330 is disposed in a border area of the substrate 310, and the barrier structure 330 is mainly disposed in the array substrate 300
  • the barrier structure 330 and the protection layer of the array substrate are made of the same material.
  • the protection structure of the barrier structure 330 and the array substrate is formed at one time.
  • the barrier structure 330 surrounds the array structure 320 and has alternately arranged different heights. Bump surface.
  • the opposing substrate 400 includes a base layer 410 and a barrier structure 430 disposed on the base layer 410 facing the array substrate 300.
  • the barrier structure 430 is disposed corresponding to the barrier structure 330.
  • the barrier structure 430 has uneven surfaces with different heights, that is, the opposing substrate 400 also has
  • the barrier structure 430 is provided to improve the coating accuracy of the alignment layer forming liquid.
  • the barrier structure 430 and the barrier structure may adopt the same or different structures.
  • the present application can improve the coating accuracy of the array substrate alignment layer forming liquid in the display panel manufacturing process without significantly changing the existing production process, easily control the overflow boundary of the forming liquid, and facilitate the control of the manufacturing process, thereby improving the manufacturing process of the display panel. Quality and yield.
  • the technology of the present application can be used in the manufacturing process of various types of liquid crystal display panels with high applicability.
  • the display panel of the present application may be, for example, a liquid crystal display panel, but it is not limited thereto, and it may also be an organic light-emitting diode (OLED) display panel, a white organic light-emitting diode (White Light- Emitting Diode (W-OLED) display panel, Quantum Dot Light Emitting Diodes (QLED) display panel, plasma display panel, curved display panel or other type of display panel; display device can be mobile phone, brand tablet computer , TV, monitor, notebook computer, digital photo frame, navigator and any other products or parts with display function.
  • OLED organic light-emitting diode
  • W-OLED white organic light-emitting diode
  • QLED Quantum Dot Light Emitting Diodes
  • plasma display panel curved display panel or other type of display panel
  • display device can be mobile phone, brand tablet computer , TV, monitor, notebook computer, digital photo frame, navigator and any other products or parts with display function.

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Abstract

一种显示面板，包括：阵列基板（300），包括基底（310）、设置于基底（310）的有效显示区的阵列结构（320）以及设置于基底（310）表面的保护层和阻挡结构（330）；对向基板（400），包括基层（410）以及设置于基层（410）面向阵列基板（300）的阻隔结构（430）；液晶层（520）；封合胶（510），位于阵列基板（300）与对向基板（400）之间；其中，阻挡结构（330）环绕阵列结构（320），阻挡结构（330）具有交替配置不同高度的凹凸表面；阻隔结构（430）对应阻挡结构（330）设置，具有交替配置不同高度的凹凸表面。

Description

阵列基板及显示面板
本申请要求于2018年9月11日提交中国专利局，申请号为201811057899.5，发明名称为“阵列基板及显示面板”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示设备技术领域，尤其涉及一种阵列基板及显示面板。
背景技术
目前被广泛应用的液晶显示器通常具有两个基底，其间夹设液晶层，封合胶位于两基底之间，以接合两基底，并将液晶层封合在两基底之间。
在现有的显示面板制程中，第一道制程即为配向层制程。其为使两基底之间的液晶分子设置一定配向，在各基底的表面分别设置配向层(Alignment Layer或Orientation Layer)，通过在配向层上设置配向槽来构成配向层。配向层设置后，再设置封合胶以接合两基底。
配向层形成液可以旋转聚酰亚胺(Polyimide，PI)，其常见涂布方式有三种：浸泡模式、凸版印刷模式、喷墨方式。但随着玻璃尺寸越来越大，喷墨方式逐渐成为常用手段。然而，喷墨方式存在边界模糊，难以合理准确控制精度，进而引起涂布不良问题。故制程中，会通过在基底的周边区域中设置数道隔挡墙(Dummy PS Wall，DPSW)及数条沟槽，从而防止在基底上涂布配向层形成液时，使有效显示区域周围的配向层液溢流到有效显示区或是接近封合胶的区域。但此方法需在基板制程中，多作一道隔挡墙设置于有效显示区周边的制程，不但增加制程难度，同时也影响成品良率。
申请内容
本申请一目的在于提供一种阵列基板，包括但不限于解决准确控制配向层形成液在基底的边界涂布时制成难度高的技术问题。
本申请实施例采用的技术方案是：一种阵列基板，包括：
基底，包括有效显示区和边框区；
阵列结构，至少设置于所述基底的有效显示区；以及
阻挡结构，设置于所述基底的边框区，所述阻挡结构环绕所述阵列结构；
其中，所述阻挡结构具有交替配置的不同高度的凹凸表面。
在一个实施例中，所述阻挡结构的凹凸表面设置多个凹槽。
在一个实施例中，所述多个凹槽的横截面的形状为直线、折线、非闭合曲线、闭合曲线、多边形与放射形中至少其一，所述横截面平行于所述基底。
在一个实施例中，所述多个凹槽是等间隔、不等间隔或局部等间隔的方式设置于所述阻挡结构的表面；所述多个凹槽的长度为相同、相异或局部相同；所述多个凹槽的宽度为相同、相异或局部相同；所述多个凹槽的深度为相同、相异或局部相同。
在一个实施例中，各所述凹槽的深度皆小于所述阻挡结构的厚度。
在一个实施例中，所述阻挡结构的厚度为200毫米至600毫米之间，所述凹槽的深度为200毫米至500毫米之间；所述凹槽的宽度为0.1毫米至0.5毫米之间。
在一个实施例中，所述边框区远离所述有效显示区的一侧的边缘设有封合胶，所述阻挡结构具有交替配置不同高度的凹凸表面是位于所述封合胶和所述有效显示区之间。
在一个实施例中，所述阵列基板还包括设置于所述阵列结构外围的导流结构，所述导流结构与所述阻挡结构存在高度差。
在一个实施例中，所述阻挡结构与所述阵列结构之间设置有分隔槽，所述导流结构设置于所述分隔槽内。
在一个实施例中，所述导流结构包括多个隔挡墙与多个开口，各所述隔挡墙和所述开口交互排列。
在一个实施例中，所述导流结构包括多个导流墙，所述多个导流墙的宽度为相同、相异或局部相同，所述多个导流墙的高度为相同、相异或局部相同，所述多个导流墙的厚度为相同、相异或局部相同。
在一个实施例中，所述多个导流墙的横截面的形状为直线、折线、非闭合曲线、闭合曲线、多边形与放射形中至少其一，所述横截面平行于所述基底。
在一个实施例中，所述导流墙的宽度为10微米至300微米，所述导流墙的高度为2微米至5微米，所述导流墙的厚度为0.3微米至5微米。
在一个实施例中，所述阵列基板为主动开关阵列基板，所述阻挡结构由在所述主动开关阵列基板上设置的金属薄膜、无机绝缘薄膜、透明导电薄膜和半导体薄膜中的一个或上述薄膜的组合制成。
在一个实施例中，所述阵列基板为彩色滤光基板，所述阻挡结构由在所述彩色滤光基板上设置的彩膜薄膜、保护薄膜、黑矩阵薄膜和透明导电薄膜中的一个或上述薄膜的组合制成。
在一个实施例中，所述阻挡结构与所述阵列基板的保护层采用相同材料，所述阻挡结构与所述阵列基板的保护层采用相同材料一次成型。
本申请的另一目的在于提供一种阵列基板，包括：
基底，包括有效显示区和绕所述有效显示区周围设置的边框区；
阵列结构，设置于所述有效显示区；以及
阻挡结构，设置于所述边框区，环绕所述阵列结构；
其中，所述阻挡结构包括交替设置的多个凸出部和多个凹陷部，所述阵列结构的外围设置有导流结构，所述导流结构与所述阻挡结构存在高度差，所述阻挡结构与所述阵列结构之间设置有分隔槽，所述导流结构设置于所述分隔槽内。
本申请的再一目的在于提供一种显示面板，包括：
阵列基板，包括基底、设置于所述基底的有效显示区的阵列结构以及设置于所述基底表面的保护层和阻挡结构；
对向基板，与所述阵列基板对向设置，包括基层以及设置于所述基层面向所述阵列基板的阻隔结构；
液晶层，位于所述阵列基板与所述对向基板之间；以及
封合胶，位于所述阵列基板与所述对向基板之间，所述封合胶环设于所述液晶层外围；
其中，所述阻挡结构环绕所述阵列结构，所述阻挡结构具有交替配置不同高度段差高度的凹凸表面，所述阻挡结构与所述保护层采用相同材料，所述阻挡结构与所述保护层一次成型；所述阻隔结构对应所述阻挡结构设置，具有交替配置不同高度的凹凸表面。
本申请实施例提供的显示面板，通过增加阵列基板边框区的粗糙度来改善配向层形成液涂布精度，易于控制形成液的外溢边界，便于制程把控。
附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例或现有技 术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其它的附图。
图1是范例性的液晶显示面板的基板俯视图；
图2是本申请实施例提供的阵列基板的阻挡及导流结构的剖视图；
图3是本申请一实施例提供的阻挡结构表面凹槽形状示意图；
图4是本申请另一实施例提供的阻挡结构表面凹槽形状示意图；
图5是本申请又一实施例提供的阻挡结构表面凹槽形状示意图；
图6是本申请一实施例提供的显示面板的阻挡结构的配置示意图；
图7是本申请一实施例提供的阵列基板的阻挡及导流结构的剖视图；
图8是本申请一实施例提供的液晶显示面板的剖视图。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进行进一步详细说明。应当理解，此处所描述的具体实施例仅用以解释本发明，并不用于限定本发明。
需说明的是，当部件被称为“固定于”或“设置于”另一个部件，它可以直接在另一个部件上或者间接在该另一个部件上。当一个部件被称为是“连接于”另一个部件，它可以是直接或者间接连接至该另一个部件上。术语“上”、“下”、“左”、“右”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本专利的限制，对于本领域的普通技术人员而言，可以根据具体情况理解上述术语的具体含义。术语“第 一”、“第二”仅用于便于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明技术特征的数量。“多个”的含义是两个或两个以上，除非另有明确具体的限定。
为了说明本申请所述的技术方案，以下结合具体附图及实施例进行详细说明。
图1示出了范例性的液晶显示面板的横截面的结构，液晶显示面板基本结构包括阵列基板100、对向基板200、封合胶106以及液晶层105。阵列基板100包括基底101；阵列结构102，设置于基底101上；配向层103，设置于阵列结构102上；以及阻挡结构104，设置于基底101处并大体环绕配向层103，其中阻挡结构104与基底101的表面构成高度差。如图1所示，配向层103是由配向层形成液聚酰亚胺(Polyimide，PI)涂布在阵列结构102上所设置。阻挡结构103包括数种不同的结构，依据不同的需求可以设计如：凹槽、光间隔物(Photo Spacer，PS)设置的隔挡墙、非显示区域色阻挡墙，或是此三种组件之中至少其一者所组成的结构设计。
请继续参考图1，阵列基板100的中央是有效显示区域，其包括多个像素区域，每一像素区域配置有多个相异色阻，依据显示面板的规格而有不同，如三色色阻、四色色阻或是其它多色色阻的设计，三色色阻例如红色色阻、绿色色阻与蓝色色阻，四色色阻例如红色色阻、绿色色阻、蓝色色阻与白色色阻。各色阻的组合还可以包括黄色色阻或其它颜色的色阻。非显示区域色阻挡墙的材料为红色色阻、蓝色色阻或者绿色色阻。
在一个实施例中，当阻挡结构103包括凹槽、隔挡墙和非显示区域色阻挡墙时，非显示区域色阻挡墙，在加工时先进行红色、蓝色或者绿色色阻涂布，隔挡墙进行隔挡墙色阻涂布同时对色阻进行曝光。隔挡墙是配置在非显示区域 色阻挡墙上，依据设计需求，可以设置数层隔挡墙。隔挡墙高度及凹槽的宽度设计上考虑了由于机台的精度误差导致的多涂布的配向层形成液的部分，通过计算准确定义隔挡墙及凹槽的铺设尺寸，从而防止在阵列基板上涂布配向层形成液时，使有效显示区域周围的配向层液溢流到有效显示区或是接近封合胶106的区域。但此方法需在基板制程中，多作一道设置隔挡墙于有效显示区周边的制程，不但增加制程难度，同时也影响成品良率。
图2示出了本申请一实施例的阵列基板的阻挡及导流结构的剖视图。请参照图2，在本申请一实施例中，一种阵列基板300，包括：基底310；阵列结构320，设置于基底310的有效显示区，阵列结构320至少对应有效显示区；以及阻挡结构330，设置于基底310的表面且位于基底310的边框区，阻挡结构330环绕阵列结构320；其中，阻挡结构330具有交替配置的不同高度的凹凸表面。
在一实施例中，阵列基板300为主动开关阵列基板，阻挡结构330由在主动开关阵列基板上设置的金属薄膜、无机绝缘薄膜、透明导电薄膜和半导体薄膜中的一个或上述薄膜的组合所制成。
在一实施例中，阵列基板300为彩色滤光基板，阻挡结构330由在彩色滤光基板上设置的彩膜薄膜、保护薄膜、黑矩阵薄膜和透明导电薄膜中的一个或上述薄膜的组合制成。
在一实施例中，阻挡结构330的凹凸表面设置多个凹槽331。多个凹槽331设置多个导流槽，以便于配向层形成液涂布时在边框区的流动。
在一实施例中，多个凹槽331是等间隔、不等间隔、局部等间隔或阵列配置的方式设置于阻挡结构330的表面。
在一实施例中，多个凹槽331的长度为相同、相异或局部相同。多个凹槽 331的宽度为相同、相异或局部相同。多个凹槽331的深度为相同、相异或局部相同。
如图2所示，在一些实施例中，阻挡结构330的厚度为d1，凹槽331的深度为d2，阻挡结构330对应多个凹槽331的位置的厚度为d3，d1＝d2+d3，即各凹槽331的深度皆小于阻挡结构330的厚度。
在一实施例中，阻挡结构330的厚度在200毫米至600毫米之间，凹槽的深度在200毫米至500毫米之间。
在一实施例中，凹槽331的宽度在0.1毫米至0.5毫米之间。
在一实施例中，边框区远离有效显示区的一侧的边缘设有封合胶510，阻挡结构330具有交替配置不同高度的凹凸表面是位于封合胶510和有效显示区之间。
图3至图5示出了本申请各实施例的阻挡结构表面凹槽形状，多个凹槽的横截面的形状可从圆形、方形、十字形中选用至少其一者，该横截面平行于基底310。在一些实施例中，多个凹槽331的形状还可从直线、折线、非闭合曲线、闭合曲线、多边形与放射形中至少其一，如半圆弧、半椭圆弧、方形、圆形、椭圆形、十字形、米字形、星形与L字形中至少其一。
图6示出了本申请一实施例的显示面板的阻挡结构。在一些实施例中，阻挡结构330在制作时，是依据需求薄膜层所属的光罩，将其边框区图案进行特别的设计，如使用半色调光罩(half-tone mask，HTM)、单狭缝光罩(single-slit mask，SSM)、灰阶光罩(gray-tone mask，GTM)。其中，SSM与GTM是采用图形狭缝衍射原理来降低局部紫外线透过率，HTM利用掩膜板上半透膜实现局部紫外线降低，进而都达到实现不同膜厚阻挡结构的所属膜层的制成。如图6所示，图中第一边界(Edge)E1表示实际配向层形成液涂布未外溢时的形成 液边界；第三边界E3表示实际配向层形成液涂布及外溢后最终设置的形成液边界；第二边界E2则示意，在边框区(A区)设置阻挡结构330后，即增加基板表面的粗糙度后，实际配向层形成液涂布及外溢后，最终设置的形成液边界。
图7示出了本申请一实施例的阵列基板的阻挡及导流结构。在本申请一实施例中，一种阵列基板300，包括：基底310；阵列结构320，设置于基底310上；阻挡结构330，设置于基底310处并环绕阵列结构320；以及导流结构340，设置于阵列结构320外围，并与阻挡结构330存在高度差。
在一实施例中，阻挡结构的凹凸表面设置多个凹槽。导流结构340包括多个隔挡墙与多个开口，各隔挡墙和开口交互排列。
在一实施例中，阻挡结构330与阵列结构320之间设置有多个分隔槽350，导流结构340设置于分隔槽350内。
在一实施例中，多个分隔槽350的宽度可设置为相同、相异或局部相同。
在一实施例中，多个分隔槽350的深度可设置为相同、相异或局部相同。
在一实施例中，分隔槽350的深度约为0.4微米至1.6微米。
在一实施例中，导流结构340包括多个导流墙341。
在一实施例中，多个导流墙341的宽度可设置为相同、相异或局部相同。
在一实施例中，导流墙341的宽度约为10微米至300微米。
在一实施例中，多个导流墙341的高度可设置为相同、相异或局部相同。
在一实施例中，导流墙341的高度约为2微米至5微米。
在一实施例中，多个导流墙341的厚度可设置为相同、相异或局部相同。
在一实施例中，导流墙341的厚度约为0.3微米至5微米。
在一实施例中，多个导流墙341的横截面的形状为直线、折线、非闭合曲线、闭合曲线、多边形与放射形中至少其一，该横截面平行于基底310，如半 圆弧、半椭圆弧、方形、圆形、椭圆形、十字形、米字形、星形与L字形中至少其一。
请参照图2、图6，本申请一实施例提供的阵列基板，包括基310、阵列结构320及阻挡结构330，基底310包括有效显示区和绕有效显示区周围设置的边框区，阵列结构320设置于有效显示区，阻挡结构330设置于边框区并环绕阵列结构320设置，阻挡结构300包括交替设置的多个凸出部和多个凹陷部，阵列结构320的外围设置有导流结构340，导流结构340与阻挡结构330存在高度差，阻挡结构330与阵列结构320之间设置有分隔槽350，导流结构340设置于分隔槽350内，如此，可提高基底边框区的粗糙度，配向层形成液涂布于边框区时易于控制外溢边界，便于制程的把控。
在一实施例中，导流结构340是由保护层(Protective Varnish，PV)所设置。阵列基板的边框区配置有保护层，并对PV光罩在边框区位置作特殊图案设计，PV光罩采用如半色调光罩(half-tone mask，HTM)、单狭缝光罩(single-slit mask，SSM)、灰阶光罩(gray-tone mask，GTM)。其中SSM光罩与GTM光罩是采用图形狭缝衍射原理来降低局部紫外线透过率，HTM光罩利用掩膜板上半透膜实现局部紫外线降低，进而都达到实现不同膜厚PV层的设置。
图8示出了本申请一实施例的液晶显示面板的剖视结构。请配合其它图示以利于理解。在本申请一实施例中，一种显示面板，包括：阵列基板300；对向基板400，与阵列基板300对向设置；液晶层520，位于阵列基板300以及对向基板400之间；以及封合胶510，位于阵列基板300以及对向基板400之间且环设于液晶层520外围。阵列基板300包括基底310、阵列结构320保护层和阻挡结构330；阵列结构320设置于基底310的有效显示区，阻挡结构330设置于基底310的边框区，阻挡结构330主要是设置于阵列基板300上的保护 层(PV)，例如，阻挡结构330与阵列基板的保护层采用相同材料，阻挡结构330与阵列基板的保护层为一次成型，阻挡结构330环绕阵列结构320并具有交替配置不同高度的凹凸表面。对向基板400包括基层410以及设置于基层410面向阵列基板300的阻隔结构430，该阻隔结构430对应阻挡结构330设置，阻隔结构430具有交替配置不同高度的凹凸表面，即对向基板400也具有配向膜，设置的阻隔结构430可改善配向层形成液涂布精度，阻隔结构430与阻挡结构可采用相同或不同结构。
本申请可以不大幅改变现有生产流程的前提下，改善显示面板制程的阵列基板配向层形成液的涂布精度，易于控制形成液的外溢边界，便于制程的把控，进而提升显示面板的制程品质与良率。其次，此本申请技术可使用于多种类型的液晶显示面板的制程中，适用性较高。
在一实施例中，本申请的显示面板可例如为液晶显示面板，然不限于此，其亦可为有机发光二极管(Organic Light-Emitting Diode，OLED)显示面板，白光有机发光二极管(White Light-Emitting Diode，W-OLED)显示面板，量子点发光二极管(Quantum Dot Light Emitting Diodes，QLED)显示面板，等离子体显示面板，曲面型显示面板或其他类型显示面板；显示装置可以是手机、牌平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
以上仅为本申请的可选实施例而已，并不用于限制本申请。对于本领域的技术人员来说，本申请可以有各种更改和变化。凡在本申请的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本申请的权利要求范围之内。

Claims (18)

  1. 一种阵列基板，包括：
    基底，包括有效显示区和边框区；
    阵列结构，至少设置于所述基底的有效显示区；以及
    阻挡结构，设置于所述基底的边框区，所述阻挡结构环绕所述阵列结构；
    其中，所述阻挡结构具有交替配置的不同高度的凹凸表面。
  2. 根据权利要求1所述的阵列基板，其中，所述阻挡结构的凹凸表面设置多个凹槽。
  3. 根据权利要求2所述的阵列基板，其中，所述多个凹槽的横截面的形状为直线、折线、非闭合曲线、闭合曲线、多边形与放射形中至少其一，所述横截面平行于所述基底。
  4. 根据权利要求2所述的阵列基板，其中，所述多个凹槽是等间隔、不等间隔或局部等间隔的方式设置于所述阻挡结构的表面；所述多个凹槽的长度为相同、相异或局部相同；所述多个凹槽的宽度为相同、相异或局部相同；所述多个凹槽的深度为相同、相异或局部相同。
  5. 根据权利要求2所述的阵列基板，其中，各所述凹槽的深度皆小于所述阻挡结构的厚度。
  6. 根据权利要求5所述的阵列基板，其中，所述阻挡结构的厚度为200毫米至600毫米之间，所述凹槽的深度为200毫米至500毫米之间；所述凹槽的宽度为0.1毫米至0.5毫米之间。
  7. 根据权利要求1所述的阵列基板，其中，所述边框区远离所述有效显示区的一侧的边缘设有封合胶，所述阻挡结构的凹凸表面是位于所述封合胶和 所述有效显示区之间。
  8. 根据权利要求1所述的阵列基板，其中，所述阵列基板还包括设置于所述阵列结构外围的导流结构，所述导流结构与所述阻挡结构存在高度差。
  9. 根据权利要求8所述的阵列基板，其中，所述阻挡结构与所述阵列结构之间设置有分隔槽，所述导流结构设置于所述分隔槽内。
  10. 根据权利要求8所述的阵列基板，其中，所述导流结构包括多个隔挡墙与多个开口，各所述隔挡墙和所述开口交互排列。
  11. 根据权利要求8所述的阵列基板，其中，所述导流结构包括多个导流墙，所述多个导流墙的宽度为相同、相异或局部相同，所述多个导流墙的高度为相同、相异或局部相同，所述多个导流墙的厚度为相同、相异或局部相同。
  12. 根据权利要求11所述的阵列基板，其中，所述多个导流墙的横截面的形状为直线、折线、非闭合曲线、闭合曲线、多边形与放射形中至少其一，所述横截面平行于所述基底。
  13. 根据权利要求11所述的阵列基板，其中，所述导流墙的宽度为10微米至300微米，所述导流墙的高度为2微米至5微米，所述导流墙的厚度为0.3微米至5微米。
  14. 根据权利要求1所述的阵列基板，其中，所述阵列基板为主动开关阵列基板，所述阻挡结构由在所述主动开关阵列基板上设置的金属薄膜、无机绝缘薄膜、透明导电薄膜和半导体薄膜中的一个或上述薄膜的组合制成。
  15. 根据权利要求1所述的阵列基板，其中，所述阵列基板为彩色滤光基板，所述阻挡结构由在所述彩色滤光基板上设置的彩膜薄膜、保护薄膜、黑矩阵薄膜和透明导电薄膜中的一个或上述薄膜的组合制成。
  16. 根据权利要求1所述的阵列基板，其中，所述阻挡结构与所述阵列基 板的保护层采用相同材料一次成型。
  17. 一种阵列基板，包括：
    基底，包括有效显示区和绕所述有效显示区周围设置的边框区；
    阵列结构，设置于所述有效显示区；以及
    阻挡结构，设置于所述边框区，环绕所述阵列结构；
    其中，所述阻挡结构包括交替设置的多个凸出部和多个凹陷部，所述阵列结构的外围设置有导流结构，所述导流结构与所述阻挡结构存在高度差，所述阻挡结构与所述阵列结构之间设置有分隔槽，所述导流结构设置于所述分隔槽内。
  18. 一种显示面板，包括：
    阵列基板，包括基底、设置于所述基底的有效显示区的阵列结构以及设置于所述基底表面的保护层和阻挡结构；
    对向基板，与所述阵列基板对向设置，包括基层以及设置于所述基层面向所述阵列基板的阻隔结构；
    液晶层，位于所述阵列基板与所述对向基板之间；以及
    封合胶，位于所述阵列基板与所述对向基板之间，所述封合胶环设于所述液晶层外围；
    其中，所述阻挡结构环绕所述阵列结构，所述阻挡结构具有交替配置不同高度的凹凸表面，所述阻挡结构与所述保护层采用相同材料，所述阻挡结构与所述保护层一次成型；所述阻隔结构对应所述阻挡结构设置，具有交替配置不同高度的凹凸表面。
PCT/CN2018/118192 2018-09-11 2018-11-29 阵列基板及显示面板 Ceased WO2020052097A1 (zh)

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CN113169287B (zh) * 2019-10-21 2025-01-24 京东方科技集团股份有限公司 显示面板及其制作方法、显示装置

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