WO2020040184A1 - Joining composition - Google Patents

Joining composition Download PDF

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Publication number
WO2020040184A1
WO2020040184A1 PCT/JP2019/032597 JP2019032597W WO2020040184A1 WO 2020040184 A1 WO2020040184 A1 WO 2020040184A1 JP 2019032597 W JP2019032597 W JP 2019032597W WO 2020040184 A1 WO2020040184 A1 WO 2020040184A1
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Prior art keywords
fine particles
silver fine
silver
bonding composition
bonding
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PCT/JP2019/032597
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French (fr)
Japanese (ja)
Inventor
智文 渡辺
啓資 田中
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バンドー化学株式会社
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Priority to JP2019547736A priority Critical patent/JP6736782B2/en
Publication of WO2020040184A1 publication Critical patent/WO2020040184A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/102Metallic powder coated with organic material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J1/00Adhesives based on inorganic constituents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers

Definitions

  • High-brightness lighting devices and light-emitting devices with light-emitting elements such as LEDs, and semiconductor devices with semiconductor elements that operate at high temperatures and with high efficiency called power devices, etc. tend to have high driving temperatures when using the devices. is there. Since the melting point of solder is lower than the driving temperature of these devices, it is not suitable for bonding light emitting elements such as LEDs, semiconductor chips, and the like. Furthermore, in recent years, lead-free bonding materials have been demanded from the viewpoint of environmental protection and the regulations of the "European Parliament and Council Directive on the Restriction of the Use of Specific Hazardous Substances in Electric and Electronic Equipment” (RoHS).
  • the present inventors have conducted intensive studies to achieve the above object, and as a result, through a step of firing at a relatively low temperature without applying pressure, excellent bonding strength, and a bonding material having excellent heat resistance reliability.
  • the present inventors have found that the above problem can be solved by the following constitution.
  • the primary amine has a boiling point of 300 ° C. or less, preferably 250 ° C. or less, from the viewpoint of easily detaching from the surface of silver fine particles even at a relatively low temperature.
  • the bonding composition of the present invention includes the first silver fine particles and the second silver fine particles as silver fine particles, thereby realizing firing at a relatively low temperature and firing after bonding.
  • the generation of cracks and voids in the consolidated body is suppressed, and a sintered body having a low porosity, a higher density, and excellent bonding strength can be obtained.
  • the average particle diameter of the second silver fine particles exceeds 550 nm
  • the bonding composition of the present invention when the bonding composition of the present invention is sandwiched between the members to be bonded, a gap is generated due to the metal particles having a large particle diameter, and the bonding strength is reduced. May decrease.
  • a preferred lower limit of the average particle size of the second metal particles is 240 nm, and a preferred upper limit is 450 nm.
  • the alcohol is a compound containing one or more OH groups in the molecular structure, and includes an aliphatic alcohol, a cyclic alcohol and an alicyclic alcohol, each of which may be used alone or in combination of two or more. Good. Further, a part of the OH group may be derived to an acetoxy group or the like as long as the effect of the present invention is not impaired.
  • the bonding composition of the present invention does not contain a polymer dispersant. This is because the polymer dispersant tends to remain in the bonding layer even after firing at a temperature of 300 ° C. or less, hinder sintering, and may adversely affect the bonding reliability.
  • the porosity of the bonding layer obtained by heating and baking the bonding composition of the present invention at 275 ° C. is preferably 10% or less. Further, it is preferable that the porosity of the bonding layer obtained by heating and firing at 275 ° C. without pressure is 10% or less. This is because, in such a state, from the viewpoint of heat resistance reliability, the crack progresses slowly with respect to strain due to a difference in linear expansion coefficient.
  • the thickener examples include clay minerals such as clay, bentonite and hectorite; for example, emulsions such as polyester emulsion resin, acrylic emulsion resin, polyurethane emulsion resin and blocked isocyanate; methyl cellulose, carboxymethyl cellulose, hydroxy Cellulose derivatives such as ethylcellulose, hydroxypropylcellulose and hydroxypropylmethylcellulose; polysaccharides such as xanthan gum and guar gum; and the like, each of which may be used alone or in combination of two or more.
  • clay minerals such as clay, bentonite and hectorite
  • emulsions such as polyester emulsion resin, acrylic emulsion resin, polyurethane emulsion resin and blocked isocyanate
  • methyl cellulose carboxymethyl cellulose, hydroxy Cellulose derivatives such as ethylcellulose, hydroxypropylcellulose and hydroxypropylmethylcellulose
  • polysaccharides such as xanthan gum
  • the surfactant is not particularly limited, and any one of an anionic surfactant, a cationic surfactant, and a nonionic surfactant can be used. Examples thereof include an alkylbenzene sulfonate, a quaternary ammonium salt, and the like. Is mentioned. Since the effect can be obtained with a small addition amount, a fluorine-based surfactant is preferable.
  • Silver oxalate is the simplest silver dicarboxylate, and the silver oxalate amine complex synthesized using silver oxalate is suitable for the synthesis of the silver fine particles of the present invention because the reduction proceeds in a short time at a low temperature. It is. Furthermore, when silver oxalate is used, by-products are not generated at the time of synthesis, and only carbon dioxide derived from oxalate ions is emitted out of the system, so that there is little labor for purification after the synthesis.
  • a dispersion liquid containing silver fine particles whose surface is coated with an organic protective component is allowed to stand for a certain period of time, and after removing the supernatant, a solvent (eg, water, methanol, (A mixed solvent of methanol / water, etc.), stirring the mixture, leaving the mixture to stand still for a certain period of time, and removing the supernatant liquid several times.
  • a solvent eg, water, methanol, (A mixed solvent of methanol / water, etc.
  • stirring the mixture leaving the mixture to stand still for a certain period of time, and removing the supernatant liquid several times.
  • other methods include a method of performing centrifugation instead of the above-mentioned standing, and a method of desalting with an ultrafiltration device or an ion exchange device.
  • the term “coating” is a concept that includes a case where the bonding composition is applied in a plane and a case where the bonding composition is applied (drawn) in a linear manner.
  • the shape of the coating film made of the bonding composition before being fired by heating can be a desired shape. Therefore, the shape of the sintered body (bonding layer) obtained by firing the bonding composition may be planar or linear.
  • These planar bonding layer and linear bonding layer may be continuous or discontinuous, and may include a continuous portion and a discontinuous portion.
  • Various methods can be used for applying the bonding composition to the members to be bonded, and examples thereof include dipping, screen printing, spraying, bar coating, spin coating, ink jet, dispenser, and pin transfer.
  • Method, stamping method, coating method using a brush, casting method, flexo method, gravure method, offset method, transfer method, hydrophilic / hydrophobic pattern method, syringe method, pin transfer, stencil printing and the like can be used.
  • the bonding composition of the present invention has a high solid content concentration, and thus can be suitably used for dispensers, pin transfer, and stencil printing.
  • ⁇ Preparation of bonding composition 1 g of each of the obtained silver fine particles A and silver fine particles B was measured, and 0.1 g of hexyl carbitol, 0.1 g of butyl carbitol acetate, and 0.01 g of linoseal acid were added thereto as a dispersion medium, followed by stirring and mixing. A bonding composition was obtained.
  • Example 8 The dodecylamine used in the preparation of the silver fine particles A and the silver fine particles B was not added, and the amounts of the silver fine particles A and the silver fine particles B used in the preparation of the bonding composition were as follows. Except that the fine particles B were changed to 0.8 g and the dispersion medium was changed to 0.05 g of hexyl carbitol, 0.05 g of butyl carbitol acetate, and 0.005 g of ricinoleic acid, the same procedure as in Example 5 was carried out. A composition was obtained. The evaluation test was performed in the same manner as in Example 5 except that the preliminary drying at 70 ° C. was not performed in the production of the laminate in the evaluation tests (2) and (3). The results obtained are shown in Table 1 below.
  • Example 4 In the preparation of the bonding composition, a bonding composition was prepared in the same manner as in Example 3 except that micro silver particles (average particle size: 2.5 ⁇ m) manufactured by Fukuda Metal Foil Powder Co., Ltd. were used as the silver fine particles B. Evaluation was performed in the same manner as in Example 3. The results obtained are shown in Table 2 below.
  • ⁇ Preparation of bonding composition 1.0 g of each of the obtained silver fine particles A and silver fine particles B was measured, and 0.1 g of hexyl carbitol, 0.1 g of butyl carbitol acetate, and 0.01 g of ricinoleic acid were added thereto as a dispersion medium, followed by stirring. By mixing, a bonding composition was obtained. An evaluation test was performed on the obtained bonding composition in the same manner as in Example 1. The results obtained are shown in Table 2 below.
  • the bonding composition according to Comparative Example 7 containing no unsaturated hydrocarbon (ricinoleic acid) in the dispersion medium was inferior in all of the bonding strength, the porosity, and the heat resistance reliability.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Powder Metallurgy (AREA)
  • Conductive Materials (AREA)

Abstract

The present invention provides a joining composition whereby joining can be performed without pressure even at relatively low temperature, and excellent joining strength and excellent heat-resistant reliability are obtained. The present invention is a joining composition containing silver fine particles coated with a primary amine, and a dispersion medium, the primary amine having a carbon number of 4 to 12 and a boiling point of 300°C or lower, the silver fine particles including first silver fine particles having an average particle diameter of 45 to 75 nm and second silver fine particles having an average particle diameter of 200 to 550 nm, and the dispersion medium including an unsaturated hydrocarbon.

Description

接合用組成物Bonding composition
本発明は、接合用組成物に関する。 The present invention relates to a bonding composition.
従来、金属部品と金属部品とを機械的、電気的及び/又は熱的に接合するために、接合材が用いられている。上記接合材としては、例えば、はんだ、導電性接着剤、銀ペースト、異方導電性フィルム等が挙げられる。これらの接合材は、金属部品同士の接合だけではなく、金属部品と、セラミック部品、樹脂部品等との接合にも用いられることがある。例えば、近年、発光ダイオード(LED)等の発光素子、半導体チップ等を基板に接合する用途や、これらの基板を更に放熱部材に接合する用途に接合材が用いられることがある。 Conventionally, a joining material has been used to mechanically, electrically, and / or thermally join a metal component and a metal component. Examples of the bonding material include a solder, a conductive adhesive, a silver paste, and an anisotropic conductive film. These joining materials may be used not only for joining metal parts, but also for joining metal parts to ceramic parts, resin parts, and the like. For example, in recent years, a bonding material may be used for bonding a light emitting element such as a light emitting diode (LED), a semiconductor chip, and the like to a substrate, and further bonding these substrates to a heat dissipation member.
LED等の発光素子を備えた高輝度の照明デバイスや発光デバイス、パワーデバイスと言われる高温で高効率の動作をする半導体素子を備えた半導体デバイス等は、デバイス使用時の駆動温度が高い傾向にある。はんだは、これらのデバイスの駆動温度よりも融点が低いため、LED等の発光素子、半導体チップ等の接合には適さない。更に、近年、環境保全や「電気・電子機器に含まれる特定有害物質の使用制限に関する欧州議会及び理事会指令」(RoHS)の規制の観点から、鉛を含まない接合材が求められている。 High-brightness lighting devices and light-emitting devices with light-emitting elements such as LEDs, and semiconductor devices with semiconductor elements that operate at high temperatures and with high efficiency called power devices, etc., tend to have high driving temperatures when using the devices. is there. Since the melting point of solder is lower than the driving temperature of these devices, it is not suitable for bonding light emitting elements such as LEDs, semiconductor chips, and the like. Furthermore, in recent years, lead-free bonding materials have been demanded from the viewpoint of environmental protection and the regulations of the "European Parliament and Council Directive on the Restriction of the Use of Specific Hazardous Substances in Electric and Electronic Equipment" (RoHS).
耐熱性が高く、鉛を含有しない新たな接合材として、金属ナノ粒子を含有する接合材料が検討されている(例えば、特許文献1~9等参照)。 As a new bonding material having high heat resistance and not containing lead, bonding materials containing metal nanoparticles have been studied (for example, see Patent Documents 1 to 9).
特許文献1には、銀粒子からなる固形分と溶剤とを混練してなる金属ペーストにおいて、前記固形分が、粒径100~200nmの銀粒子を粒子数基準で30%以上含む銀粒子で構成されており、固形分を構成する銀粒子全体の平均粒径が、60~800nmであり、更に、固形分を構成する銀粒子は、保護剤として炭素数の総和が4~8のアミン化合物が結合しており、TG-DTA分析における銀粒子の焼結に起因する発熱ピークが200℃未満で発現する金属ペーストが開示されている。 Patent Document 1 discloses that in a metal paste obtained by kneading a solid content composed of silver particles and a solvent, the solid content is composed of silver particles containing 30% or more of silver particles having a particle diameter of 100 to 200 nm on a particle number basis. The silver particles constituting the solid content have an average particle size of 60 to 800 nm, and the silver particles constituting the solid content are amine compounds having a total of 4 to 8 carbon atoms as a protective agent. Disclosed are metal pastes that are bonded and exhibit an exothermic peak below 200 ° C. due to sintering of silver particles in TG-DTA analysis.
特許文献2には、一次粒子の粒度分布が、粒径20~700nmの範囲内の第1ピークと、粒径200~500nmの範囲内の第2ピークとを有する銀粉を含む接合材であって、従来の加熱温度よりも低温の加熱処理であっても高いシェア強度を有する接合層を形成することが可能で、長時間保存でも増粘しにくく、保存安定性が高い接合材とこれを用いた接合体の製造方法が開示されている。 Patent Document 2 discloses a bonding material containing silver powder in which the particle size distribution of primary particles has a first peak in a particle size range of 20 to 700 nm and a second peak in a particle size range of 200 to 500 nm. It is possible to form a bonding layer having high shear strength even with a heat treatment at a temperature lower than the conventional heating temperature. A method for manufacturing a bonded article is disclosed.
特許文献3には、銅粒子と、銅粒子を被覆する複数の銀微粒子とを備え、銀微粒子の表面の少なくとも一部は、大気圧下における沸点が70~300℃であるアミン化合物で被覆され、銀微粒子の粒子径が1~500nmである、複合粒子が開示されている。そして、このような複合粒子は300℃未満の加熱により焼結するため、複合粒子同士は、その表面で銀の金属結合を形成し、複合粒子と被着体との界面では、金属結合や金属拡散が発生し、接合強度も高いものとなり、その結果、半導体部材(半導体素子、半導体素子搭載用支持部材)との接着性に優れ、接着信頼性の高い焼結体が得られることが開示されている。 Patent Document 3 includes copper particles and a plurality of silver fine particles covering the copper particles, and at least a part of the surface of the silver fine particles is coated with an amine compound having a boiling point of 70 to 300 ° C. under atmospheric pressure. And composite particles in which the silver fine particles have a particle size of 1 to 500 nm. And since such composite particles are sintered by heating at less than 300 ° C., the composite particles form a silver metal bond on the surface thereof, and the metal bond or the metal bond is formed at the interface between the composite particle and the adherend. It is disclosed that diffusion occurs and the bonding strength is high, and as a result, a sintered body having excellent adhesion to a semiconductor member (semiconductor element, semiconductor element mounting support member) and high adhesion reliability can be obtained. ing.
特許第5795096号公報Japanese Patent No. 5795096 特開2017-106086号公報JP-A-2017-106086 特開2016-129101号公報JP 2016-129101 A 特開2015-232181号公報JP-A-2005-232181 国際公開第2013/108408号International Publication No. WO 2013/108408 特開2014-74132号公報JP 2014-74132 A 特開2011-94223号公報JP 2011-94223 A 特開2008-161907号公報JP 2008-161907 A 特開2011-175871号公報JP 2011-175871 A
従来、金属ナノ粒子を用いた接合では、300~350℃の不活性雰囲気下で加圧しながら接合を行うことがあった。また、LED等の発光素子、半導体チップ等の接合では、接合時におけるこれらのデバイスの損傷を防ぐ観点からは、300℃未満の焼成温度で焼結できることが望ましい。 Conventionally, in the case of joining using metal nanoparticles, the joining may be performed while applying pressure in an inert atmosphere at 300 to 350 ° C. Further, in joining a light emitting element such as an LED, a semiconductor chip, or the like, from the viewpoint of preventing damage to these devices at the time of joining, it is desirable that sintering can be performed at a firing temperature of less than 300 ° C.
近年、LED等の発光素子、半導体チップ等を備えたデバイスには、出力を高める要請があり、高集積化したり、投入電力を増大したりすることがある。そのため、これらのデバイスの駆動温度はより高くなり、接合材の使用環境がより過酷になる傾向にあるため、LED等の発光素子、半導体チップ等の接合には、高い接合強度及び耐熱信頼性が求められる。 In recent years, devices including light emitting elements such as LEDs, semiconductor chips, and the like have been demanded to increase the output, and may be highly integrated or the input power may be increased. Therefore, the driving temperature of these devices is higher, and the usage environment of the bonding material tends to be harsher. For bonding of light emitting elements such as LEDs and semiconductor chips, high bonding strength and heat resistance reliability are required. Desired.
上記特許文献1~9には、金属粒子を含有する金属ペーストが開示されており、比較的低温で、加圧を行わなくとも接合強度が得られること等が開示されている。しかしながら、さらに高い接合強度を実現するためには、更なる検討の余地があった。 Patent Documents 1 to 9 disclose metal pastes containing metal particles, and disclose that a bonding strength can be obtained at a relatively low temperature without applying pressure. However, there is room for further study in order to achieve higher bonding strength.
本発明は、上記課題に鑑みてなされたものであり、比較的低温でも、加圧することなく接合することができ、優れた接合強度、及び、優れた耐熱信頼性が得られる接合用組成物を提供する。 The present invention has been made in view of the above problems, and can be bonded without applying pressure even at a relatively low temperature, has excellent bonding strength, and a bonding composition that has excellent heat resistance. provide.
本発明者らは、上記目的を達成すべく鋭意検討を重ねた結果、比較的低温で加圧することなく焼成する工程を経て、優れた接合強度、及び、優れた耐熱信頼性を有する接合材を得るためには、特定の第一級アミンに被覆された平均粒径の異なる2種類の銀微粒子を用い、さらに、分散媒として不飽和炭化水素を含むことが、上記目的を達成するうえで極めて有効であることを見出し、本発明に到達した。
本発明者らは、以下の構成により上記課題が解決できることを見出した。
The present inventors have conducted intensive studies to achieve the above object, and as a result, through a step of firing at a relatively low temperature without applying pressure, excellent bonding strength, and a bonding material having excellent heat resistance reliability. In order to achieve the above object, it is necessary to use two types of fine silver particles coated with a specific primary amine and having different average particle diameters, and to further contain an unsaturated hydrocarbon as a dispersion medium. They have found that they are effective and have reached the present invention.
The present inventors have found that the above problem can be solved by the following constitution.
すなわち、本発明は、第一級アミンで被覆されている銀微粒子と、分散媒とを含有する接合用組成物であって、上記第一級アミンは、炭素数が4~12、かつ、沸点が300℃以下であり、上記銀微粒子は、平均粒径が45~75nmである第一の銀微粒子と、平均粒径が200~550nmである第二の銀微粒子とを含み、上記分散媒は、不飽和炭化水素を含むことを特徴とする。 That is, the present invention relates to a bonding composition containing silver fine particles coated with a primary amine and a dispersion medium, wherein the primary amine has 4 to 12 carbon atoms and a boiling point of Is 300 ° C. or less, and the silver fine particles include first silver fine particles having an average particle size of 45 to 75 nm and second silver fine particles having an average particle size of 200 to 550 nm. And unsaturated hydrocarbons.
上記第二の銀微粒子は、上記第一の銀微粒子とは異なる銀錯化合物から形成されたものであることが好ましい。 The second silver fine particles are preferably formed from a silver complex compound different from the first silver fine particles.
上記第一の銀微粒子と上記第二の銀微粒子との重量比率は、4:6~7:3であることが好ましい。 The weight ratio of the first silver fine particles to the second silver fine particles is preferably 4: 6 to 7: 3.
上記分散媒は、水酸基を有する有機溶剤を少なくとも含むことが好ましい。 The dispersion medium preferably contains at least an organic solvent having a hydroxyl group.
上記不飽和炭化水素は、リシノール酸であることが好ましい。 Preferably, the unsaturated hydrocarbon is ricinoleic acid.
上記接合用組成物は、高分子分散剤を含まないことが好ましい。 The bonding composition preferably does not contain a polymer dispersant.
上記接合用組成物を275℃で加熱焼成して得られる接合層の空隙率が10%以下であることが好ましい。 It is preferable that the porosity of the bonding layer obtained by heating and baking the bonding composition at 275 ° C. is 10% or less.
本発明によれば、比較的低温でも、加圧することなく接合することができ、空隙率が低く、優れた接合強度、及び、優れた耐熱信頼性が得られる接合用組成物を提供することができる。 According to the present invention, it is possible to provide a bonding composition that can be bonded without applying pressure even at a relatively low temperature, has a low porosity, has excellent bonding strength, and has excellent heat resistance reliability. it can.
本発明の接合用組成物は、第一級アミンで被覆されている銀微粒子と、分散媒とを含有する接合用組成物であって、上記第一級アミンは、炭素数が4~12、かつ、沸点が300℃以下であり、上記銀微粒子は、平均粒径が45~75nmである第一の銀微粒子と、平均粒径が200~550nmである第二の銀微粒子とを含み、上記分散媒は、不飽和炭化水素を含むことを特徴とする。 The bonding composition of the present invention is a bonding composition containing silver fine particles coated with a primary amine and a dispersion medium, wherein the primary amine has 4 to 12 carbon atoms. The silver fine particles having a boiling point of 300 ° C. or less, the first silver fine particles having an average particle size of 45 to 75 nm, and the second silver fine particles having an average particle size of 200 to 550 nm, The dispersion medium contains an unsaturated hydrocarbon.
なお、本明細書で示す沸点とは、1気圧(大気圧下)での値である。 In addition, the boiling point shown in this specification is a value at 1 atmosphere (at atmospheric pressure).
上記第一級アミンは、銀微粒子の表面の少なくとも一部に結合し、コロイドを形成する成分である。上記第一級アミンは、銀微粒子の表面の全てを被覆する必要はなく、コロイドを形成できる程度に、銀微粒子の表面の少なくとも一部を被覆していればよい。上記第一級アミンに被覆されていることで、本発明の接合用組成物中における上記銀微粒子の分散安定性を向上させ、凝集を防ぐことができる。一方、本発明の接合用組成物を焼成する際に、上記第一級アミンが残存していると、銀微粒子同士の融着を阻害するため、焼成時には蒸発又は分解する観点から、上記第一級アミンは、比較的低温でも、銀微粒子の表面から離脱しやすいアミンであることが好ましい。 The primary amine is a component that binds to at least a part of the surface of the silver fine particles to form a colloid. The primary amine does not need to cover the entire surface of the silver fine particles, but only needs to cover at least a part of the surface of the silver fine particles to the extent that a colloid can be formed. By being coated with the primary amine, the dispersion stability of the silver fine particles in the bonding composition of the present invention can be improved, and aggregation can be prevented. On the other hand, when the bonding composition of the present invention is fired, if the primary amine remains, the fusion of silver fine particles is inhibited. It is preferable that the secondary amine is an amine which is easily released from the surface of the silver fine particles even at a relatively low temperature.
従って、上述の観点から、本発明の銀微粒子を被覆する上記第一級アミンは、炭素数が4~12、かつ、沸点が300℃以下のものである。このような第一級アミンであれば、特に限定されず、直鎖状であっても分鎖状であってもよく、また、側鎖を有していてもよい。
具体的には、例えば、1,4-ブタンジアミン、1,5-ペンタンジアミン等のジアミン;ペンタノールアミン、アミノイソブタノール等のアミノアルコール;ブチルアミン、ペンチルアミン、ヘキシルアミン、ヘプチルアミン、オクチルアミン、ノニルアミン、デシルアミン、ウンデシルアミン、ドデシルアミン等のアルキルアミン(直鎖状アルキルアミン、側鎖を有していてもよい。);シクロペンチルアミン、シクロヘキシルアミン等のシクロアルキルアミン;3-メトキシプロピルアミン等のアルコキシアミン;ジグリコールアミン;アニリン;アリルアミン等が挙げられる。なお、上記第一級アミンの炭素数とは、主鎖及び側鎖の炭素数の合計である。
Therefore, from the above viewpoint, the primary amine coating the silver fine particles of the present invention has 4 to 12 carbon atoms and a boiling point of 300 ° C. or less. It is not particularly limited as long as it is such a primary amine, and it may be linear or branched, and may have a side chain.
Specifically, for example, diamines such as 1,4-butanediamine and 1,5-pentanediamine; amino alcohols such as pentanolamine and aminoisobutanol; butylamine, pentylamine, hexylamine, heptylamine, octylamine; Alkylamines such as nonylamine, decylamine, undecylamine and dodecylamine (linear alkylamines, which may have side chains); cycloalkylamines such as cyclopentylamine and cyclohexylamine; 3-methoxypropylamine and the like Alkoxyamine; diglycolamine; aniline; allylamine and the like. In addition, the carbon number of the primary amine is the total of the carbon numbers of the main chain and the side chain.
上記第一級アミンは、例えば、ヒドロキシル基、カルボキシル基、アルコキシ基、カルボニル基、エステル基、メルカプト基等の、アミン以外の官能基を含む化合物であってもよい。また、上記第一級アミンは、それぞれ単独で用いてもよく、2種以上を併用してもよい。 The primary amine may be, for example, a compound containing a functional group other than an amine, such as a hydroxyl group, a carboxyl group, an alkoxy group, a carbonyl group, an ester group, and a mercapto group. The primary amines may be used alone or in combination of two or more.
上記第一級アミンは、比較的低温でも銀微粒子の表面から離脱しやすい観点から、沸点が300℃以下とされ、250℃以下であることが好ましい。
より低温で銀微粒子の表面から離脱するアミンを用いることで、本発明の接合用組成物を焼成する際に、銀微粒子同士の融着をより促進することができる。
The primary amine has a boiling point of 300 ° C. or less, preferably 250 ° C. or less, from the viewpoint of easily detaching from the surface of silver fine particles even at a relatively low temperature.
By using the amine which is released from the surface of the silver fine particles at a lower temperature, fusion of the silver fine particles can be further promoted when the bonding composition of the present invention is fired.
本発明の接合用組成物は、銀微粒子として、平均粒径が45~75nmの第一の銀微粒子と、平均粒径が200~550nmである第二の銀微粒子とを含む。すなわち、本発明の接合用組成物は、銀微粒子の分布を測定したときに、粒径45~75nmの範囲内に第一のピークを有し、かつ粒径200~550nmの範囲内に第二のピークを有する。上記第一の銀微粒子は平均粒径が45~75nmであるため、比表面積が大きく、単位重量あたりの被覆する第一級アミン量も多くなる。そのため、焼成時の体積収縮が大きくなり、接合後にクラックやボイドが発生しやすくなる傾向にある。一方、上記第二の銀微粒子は平均粒径が200~550nmであるため、比表面積が小さく、単位重量あたりの被覆する第一級アミン量は少なくなる。よって、焼成時の体積収縮が小さく、接合後にクラックやボイドが発生しにくくなる傾向にある。このような上記第一の銀微粒子と上記第二の銀微粒子とを併用することで、焼成時の体積収縮を抑え、クラックやボイドを生じ難くすることができ、より密度の高い焼結体を得ることができる。 The bonding composition of the present invention contains, as silver fine particles, first silver fine particles having an average particle size of 45 to 75 nm and second silver fine particles having an average particle size of 200 to 550 nm. That is, when the distribution of silver fine particles is measured, the bonding composition of the present invention has a first peak in a particle size range of 45 to 75 nm and a second peak in a particle size range of 200 to 550 nm. Having a peak of Since the first silver fine particles have an average particle size of 45 to 75 nm, the specific surface area is large and the amount of the primary amine to be coated per unit weight is large. For this reason, volume shrinkage at the time of firing becomes large, and cracks and voids tend to be easily generated after joining. On the other hand, since the second silver fine particles have an average particle diameter of 200 to 550 nm, the specific surface area is small, and the amount of the primary amine to be coated per unit weight is small. Therefore, the volume shrinkage during firing is small, and cracks and voids tend to hardly occur after joining. By using such first silver fine particles and second silver fine particles in combination, volume shrinkage during firing can be suppressed, cracks and voids can be hardly generated, and a sintered body having a higher density can be obtained. Obtainable.
ここで、融点の高い貴金属類について、微粒子化することにより、量子サイズ効果、すなわち、ナノ粒子化によって発現する量子力学的な効果によって融点が大幅に低下することが一般的に知られている。よって、本発明の接合用組成物について、できるだけ低い温度での焼成を実現させるには、接合用組成物に含まれる銀微粒子の平均粒径を小さくすることが重要であると考えられている。 Here, it is generally known that, when noble metals having a high melting point are formed into fine particles, the melting point is greatly reduced by a quantum size effect, that is, a quantum mechanical effect developed by the formation of nanoparticles. Therefore, it is considered that it is important to reduce the average particle size of the silver fine particles contained in the bonding composition in order to realize the firing at the lowest possible temperature for the bonding composition of the present invention.
上記第二の銀微粒子は、上記第一の銀微粒子と比べると、平均粒径が大きく、上述のようなサイズ効果の影響が小さくなり焼成温度は高温になってしまうため、被接合体と接合しにくくなる傾向にあるが、上記第一の銀微粒子と上記第二の銀微粒子とを併用することで、焼成温度を比較的低温に抑えることができる。 The second silver fine particles have a larger average particle size than the first silver fine particles, and the influence of the size effect as described above is reduced, and the firing temperature becomes high. The firing temperature can be suppressed to a relatively low temperature by using the first silver fine particles and the second silver fine particles in combination.
すなわち、本発明の接合用組成物は、銀微粒子として、上記第一の銀微粒子と上記第二の銀微粒子とを含むことで、比較的低温度での焼成を実現しながら、接合後の焼結体でのクラックやボイドの発生を抑制し、空隙率が低くより密度が高い、優れた接合強度を有する焼結体を得ることができる。 That is, the bonding composition of the present invention includes the first silver fine particles and the second silver fine particles as silver fine particles, thereby realizing firing at a relatively low temperature and firing after bonding. The generation of cracks and voids in the consolidated body is suppressed, and a sintered body having a low porosity, a higher density, and excellent bonding strength can be obtained.
上記第一の銀微粒子の平均粒径は、45~75nmである。本発明の接合用組成物は、300℃を超える焼成温度でも金属粒子同士を焼結させることができるが、平均粒径が45~75nmの上記第一の銀微粒子を含むことにより、融点降下が生じ、比較的低温(例えば、300℃以下、好ましくは275℃程度)でも金属粒子同士を焼結させることができる。また、接合用組成物中の金属粒子の分散性を経時的に変化し難くすることができる。上記第一の銀微粒子の平均粒径が45nm未満であると、銀微粒子の比表面積が大きくなることに起因して、接合用組成物の粘度が高くなり、取り扱い性が低下する。また、銀微粒子の表面を第一級アミンで被覆する場合に、上記第一級アミンの成分量が増加し、焼成後に有機物が残留して、焼結体の密度が低下するため、接合強度が低下する。一方、上記第一の銀微粒子の平均粒径が75nmを超えると、融点降下が生じ難くなり、比較的低温で銀微粒子同士が焼結し難くなる。上記第一の銀微粒子の平均粒径の好ましい下限は47nmであり、好ましい上限は72nmである。 The average particle size of the first silver fine particles is 45 to 75 nm. The bonding composition of the present invention can sinter metal particles even at a firing temperature exceeding 300 ° C., but contains the first silver fine particles having an average particle size of 45 to 75 nm, so that the melting point drop is reduced. Then, the metal particles can be sintered at a relatively low temperature (for example, 300 ° C. or less, preferably about 275 ° C.). Further, the dispersibility of the metal particles in the bonding composition can be hardly changed with time. When the average particle diameter of the first silver fine particles is less than 45 nm, the specific surface area of the silver fine particles increases, so that the viscosity of the bonding composition increases and the handleability decreases. In addition, when the surface of the silver fine particles is coated with a primary amine, the amount of the primary amine increases, the organic matter remains after firing, and the density of the sintered body decreases. descend. On the other hand, when the average particle diameter of the first silver fine particles exceeds 75 nm, a decrease in the melting point hardly occurs, and the silver fine particles hardly sinter at a relatively low temperature. A preferred lower limit of the average particle size of the first silver fine particles is 47 nm, and a preferred upper limit is 72 nm.
上記第二の銀微粒子の平均粒径は、200~550nmである。上記第二の銀微粒子の平均粒径が200nm未満であると、銀微粒子の比表面積が大きくなることに起因して、被覆する第一級アミンの量が増加し、焼成時の収縮が大きくなり、全体の体積収縮を充分に抑制できないことがある。すなわち、接合後の焼結体にクラックやボイドが発生しやすくなる場合がある。また、第二の銀微粒子の表面を被覆する上記第一級アミンの量が増加し、焼成後に有機物が残留して、焼結体の密度が低下し、接合強度の低下を招く恐れが生じる。一方、上記第二の銀微粒子の平均粒径が550nmを超えると、本発明の接合用組成物を被接合部材同士で挟んだ際に、粒径の大きい金属粒子によって隙間が生じ、接合強度が低下する場合がある。上記第二の金属粒子の平均粒径の好ましい下限は240nmであり、好ましい上限は450nmである。 The average particle size of the second silver fine particles is 200 to 550 nm. If the average particle size of the second silver fine particles is less than 200 nm, the specific surface area of the silver fine particles increases, so that the amount of the primary amine to be coated increases, and the shrinkage during firing increases. In some cases, the overall volume shrinkage cannot be sufficiently suppressed. That is, cracks and voids may easily occur in the sintered body after joining. In addition, the amount of the primary amine covering the surface of the second silver fine particles increases, and an organic substance remains after firing, resulting in a decrease in the density of the sintered body, which may cause a decrease in bonding strength. On the other hand, when the average particle diameter of the second silver fine particles exceeds 550 nm, when the bonding composition of the present invention is sandwiched between the members to be bonded, a gap is generated due to the metal particles having a large particle diameter, and the bonding strength is reduced. May decrease. A preferred lower limit of the average particle size of the second metal particles is 240 nm, and a preferred upper limit is 450 nm.
本明細書中、「平均粒径」とは、銀微粒子の一次平均粒径であり、数平均粒径をいう。上記数平均粒径は、例えば、走査型電子顕微鏡(SEM)(例えば、日立ハイテクノロジーズ社製のS-4800型)を用いて得られた画像を、画像処理ソフト(例えば、WinROOF、MITANI CORPORATION製)を用いて算出することができる。 In the present specification, the “average particle size” is a primary average particle size of silver fine particles, and refers to a number average particle size. The number average particle size can be determined, for example, by converting an image obtained using a scanning electron microscope (SEM) (for example, Model S-4800 manufactured by Hitachi High-Technologies Corporation) into image processing software (for example, WinROOF, manufactured by MITANNI CORPORATION). ) Can be calculated.
本発明において、上記第二の銀微粒子は、上記第一の銀微粒子とは異なる銀錯化合物から形成されたものであることが好ましい。異なる銀錯化合物から形成されることで、第一及び第二の銀微粒子の表面を被覆する第一級アミン量が異なり、両者を焼成する際の体積収縮が異なる銀微粒子を得ることができる。すなわち、上記第一及び第二の銀微粒子は、異なる銀錯化合物から形成されることにより、平均粒径を異なるものとすることができる。 In the present invention, the second silver fine particles are preferably formed from a silver complex compound different from the first silver fine particles. By being formed from different silver complex compounds, it is possible to obtain silver fine particles having different amounts of primary amine covering the surfaces of the first and second silver fine particles and different in volume shrinkage when both are fired. In other words, the first and second silver fine particles can have different average particle diameters by being formed from different silver complex compounds.
なお、銀微粒子の固形分中の上記第一の銀微粒子を被覆する第一級アミン量は0.5重量%以上3.0重量%以下であることが好ましく、上記第二の銀微粒子を被覆する第一級アミン量は0重量%より大きく0.5重量%未満であることが好ましい。 The amount of the primary amine covering the first silver fine particles in the solid content of the silver fine particles is preferably 0.5% by weight or more and 3.0% by weight or less. Preferably, the amount of the primary amine is more than 0% by weight and less than 0.5% by weight.
本発明における銀微粒子は、上記第一の銀微粒子と上記第二の銀微粒子とを、4:6~7:3の重量比率で含むことが好ましい。これにより、低温焼結性を実現しつつ、接合強度をより向上させることができる。上記第一の銀微粒子の重量が、上記第二の銀微粒子60重量部に対して40重量部未満であると、接合用組成物中の平均粒径が45~75nmである第一の銀微粒子の割合が低くなり、比較的低温において銀微粒子同士が焼結し難くなることがある。一方、上記第一の銀微粒子の重量が、上記第二の銀微粒子30重量部に対して70重量部を超えると、焼成時の体積収縮が大きくなり、焼結体にクラックやボイドが生じ易くなるため、接合強度が低下する傾向にある。上記第一の銀微粒子の重量よりも上記第二の銀微粒子の重量が多くなると、接合用組成物の流動性が低下し取り扱い性が低下する一方で、重量減少率は低下する傾向があるため、上記第一の銀微粒子と上記第二の銀微粒子との重量比率は、取り扱い性と重量減少率とのバランスを考慮して決定することができる。 The silver fine particles in the present invention preferably contain the first silver fine particles and the second silver fine particles in a weight ratio of 4: 6 to 7: 3. Thereby, the joining strength can be further improved while realizing the low-temperature sinterability. When the weight of the first silver fine particles is less than 40 parts by weight based on 60 parts by weight of the second silver fine particles, the first silver fine particles having an average particle size of 45 to 75 nm in the bonding composition. And the silver fine particles may be difficult to sinter at a relatively low temperature. On the other hand, when the weight of the first silver fine particles exceeds 70 parts by weight with respect to 30 parts by weight of the second silver fine particles, volume shrinkage during firing becomes large, and cracks and voids are easily generated in the sintered body. Therefore, the bonding strength tends to decrease. When the weight of the second silver fine particles is larger than the weight of the first silver fine particles, the flowability of the bonding composition is reduced and the handleability is reduced, while the weight reduction rate tends to decrease. The weight ratio between the first silver fine particles and the second silver fine particles can be determined in consideration of the balance between handleability and weight reduction rate.
なお、接合用組成物における第一級アミンの全含有量は、0.1~15重量%であるのが好ましい。上記第一級アミン成分の全含有量が0.1重量%以上であれば、得られる接合用組成物の導電性が良くなる傾向があり、15重量%以下であれば、接合用組成物の分散安定性が良い傾向がある。上記第一級アミンの全含有量のより好ましい下限は0.2重量%であり、より好ましい上限は5重量%であり、更に好ましい下限は0.3重量%であり、更に好ましい上限は4重量%である。上記第一級アミンの全含有量は、熱重量分析により測定することができる。 The total content of the primary amine in the bonding composition is preferably 0.1 to 15% by weight. When the total content of the primary amine component is 0.1% by weight or more, the conductivity of the obtained bonding composition tends to be improved. Dispersion stability tends to be good. A more preferred lower limit of the total content of the primary amine is 0.2% by weight, a more preferred upper limit is 5% by weight, a still more preferred lower limit is 0.3% by weight, and a still more preferred upper limit is 4% by weight. %. The total content of the primary amine can be measured by thermogravimetric analysis.
本発明の接合用組成物は、分散媒を含有する。分散媒を含有することで、接合用組成物の粘度を調整し、取り扱い性を良好なものとすることができる。
なお、本発明の接合用組成物は、分散媒として、上記第一の銀微粒子を被覆する第一級アミン及び上記第二の銀微粒子を被覆する第一級アミンを含まないことが好ましい。分散媒として、上記第一及び第二の銀微粒子と同じ有機成分を含む場合、相溶性が得られるため銀微粒子の分散性が向上する傾向にあるが、被覆していない状態では揮発性が高く、接合用組成物として安定性がない場合があるためである。
The bonding composition of the present invention contains a dispersion medium. By containing the dispersion medium, the viscosity of the bonding composition can be adjusted, and the handleability can be improved.
The bonding composition of the present invention preferably does not contain, as a dispersion medium, a primary amine covering the first silver fine particles and a primary amine covering the second silver fine particles. When the dispersion medium contains the same organic components as the first and second silver fine particles, the dispersibility of the silver fine particles tends to be improved because compatibility is obtained, but the volatility is high in an uncoated state. This is because the bonding composition may not have stability.
上記分散媒は、不飽和炭化水素を含む。これにより本発明の接合用組成物中の固形分である銀微粒子が分散媒中に分散し、上記接合用組成物全体に対する上記分散媒の含有量が少ない場合においても、ペースト状とすることが可能となる。これにより、本発明の接合用組成物のハンドリング性が容易になる。 The dispersion medium contains an unsaturated hydrocarbon. Thereby, the silver fine particles, which are solids in the bonding composition of the present invention, are dispersed in the dispersion medium, and even when the content of the dispersion medium with respect to the entire bonding composition is small, it is possible to form a paste. It becomes possible. This facilitates handling of the bonding composition of the present invention.
上記不飽和炭化水素としては、例えば、アセチレン、ベンゼン、1-ヘキセン、1-オクテン、4-ビニルシクロヘキセン、テルペン系アルコール、アリルアルコール、オレイルアルコール、2-パルミトレイン酸、ペトロセリン酸、オレイン酸、エライジン酸、チアンシ酸、リシノール酸、リノール酸、リノエライジン酸、リノレン酸、アラキドン酸、アクリル酸、メタクリル酸、没食子酸及びサリチル酸等が挙げられる。 Examples of the unsaturated hydrocarbon include acetylene, benzene, 1-hexene, 1-octene, 4-vinylcyclohexene, terpene alcohol, allyl alcohol, oleyl alcohol, 2-palmitoleic acid, petroselinic acid, oleic acid, and elaidic acid. Thiocyanic acid, ricinoleic acid, linoleic acid, linoleic acid, linolenic acid, arachidonic acid, acrylic acid, methacrylic acid, gallic acid and salicylic acid.
なかでも、水酸基を有する不飽和炭化水素が好ましい。水酸基は銀微粒子の表面に配位しやすく、当該銀微粒子の凝集を抑制することができる。水酸基を有する不飽和炭化水素としては、例えば、テルペン系アルコール、アリルアルコール、オレイルアルコール、チアンシ酸、リシノール酸、没食子酸及びサリチル酸等が挙げられる。好ましくは、水酸基を有する不飽和脂肪酸であり、例えば、チアンシ酸、リシノール酸、没食子酸及びサリチル酸等が挙げられる。 Among them, unsaturated hydrocarbons having a hydroxyl group are preferred. The hydroxyl group is easily coordinated on the surface of the silver fine particles, and the aggregation of the silver fine particles can be suppressed. Examples of the unsaturated hydrocarbon having a hydroxyl group include terpene alcohol, allyl alcohol, oleyl alcohol, thiocyanic acid, ricinoleic acid, gallic acid and salicylic acid. Preferred are unsaturated fatty acids having a hydroxyl group, such as thiocyanic acid, ricinoleic acid, gallic acid, and salicylic acid.
上記不飽和炭化水素はリシノール酸であることが好ましい。リシノール酸はカルボキシル基とヒドロキシル基とを有し、銀微粒子の表面に吸着して当該銀微粒子を均一に分散させると共に、銀微粒子の融着と被接合体への接合とを促進する。 Preferably, the unsaturated hydrocarbon is ricinoleic acid. Ricinoleic acid has a carboxyl group and a hydroxyl group, adsorbs on the surface of silver fine particles to uniformly disperse the silver fine particles, and promotes fusion of the silver fine particles and bonding to the object.
本発明の接合用組成物における分散媒全体に対する上記不飽和炭化水素の含有量は、0.1重量%以上、2.0重量%以下であることが好ましい。上記分散媒中の上記不飽和炭化水素の含有量が、0.1重量%未満であると、分散媒に対する銀微粒子の分散性が悪くなる可能性があり、2.0重量%を超えると、銀微粒子の焼結を妨げる問題を生じる可能性がある。
上記不飽和炭化水素の含有量は、0.2重量%以上1.5重量%以下であることがより好ましい。
The content of the unsaturated hydrocarbon relative to the entire dispersion medium in the bonding composition of the present invention is preferably 0.1% by weight or more and 2.0% by weight or less. When the content of the unsaturated hydrocarbon in the dispersion medium is less than 0.1% by weight, the dispersibility of the silver fine particles in the dispersion medium may be deteriorated. There is a possibility of causing a problem that hinders sintering of the silver fine particles.
The content of the unsaturated hydrocarbon is more preferably from 0.2% by weight to 1.5% by weight.
上記分散媒としては、本発明の効果を損なわない範囲で種々のものを使用可能であり、例えば、水又は有機溶剤を用いることができる。上記有機溶剤としては、例えば、炭化水素(但し、上記不飽和炭化水素を除く)、アルコール及びエーテル等が挙げられる。 As the dispersion medium, various ones can be used as long as the effects of the present invention are not impaired. For example, water or an organic solvent can be used. Examples of the organic solvent include hydrocarbons (excluding the unsaturated hydrocarbons), alcohols and ethers.
上記炭化水素としては、脂肪族炭化水素、環状炭化水素及び脂環式炭化水素等が挙げられ、それぞれ単独で用いてもよく、2種以上を併用してもよい。 Examples of the hydrocarbon include an aliphatic hydrocarbon, a cyclic hydrocarbon, and an alicyclic hydrocarbon, and may be used alone or in combination of two or more.
上記脂肪族炭化水素としては、例えば、テトラデカン、オクタデカン、ヘプタメチルノナン、テトラメチルペンタデカン、ヘキサン、ヘプタン、オクタン、ノナン、デカン、トリデカン、メチルペンタン、ノルマルパラフィン、イソパラフィン等の飽和又は不飽和脂肪族炭化水素が挙げられる。 Examples of the aliphatic hydrocarbon include, for example, saturated or unsaturated aliphatic hydrocarbons such as tetradecane, octadecane, heptamethylnonane, tetramethylpentadecane, hexane, heptane, octane, nonane, decane, tridecane, methylpentane, normal paraffin, and isoparaffin. Hydrogen.
上記環状炭化水素としては、例えば、トルエン、キシレン等が挙げられる。 Examples of the cyclic hydrocarbon include toluene, xylene and the like.
上記脂環式炭化水素としては、例えば、リモネン、ジペンテン、テルピネン、ターピネン(テルピネンともいう。)、ネソール、シネン、オレンジフレーバー、テルピノレン、ターピノレン(テルピノレンともいう。)、フェランドレン、メンタジエン、テレベン、ジヒドロサイメン、モスレン、イソテルピネン、イソターピネン(イソテルピネンともいう。)、クリトメン、カウツシン、カジェプテン、オイリメン、ピネン、テレビン、メンタン、ピナン、テルペン、シクロヘキサン等が挙げられる。 Examples of the alicyclic hydrocarbon include limonene, dipentene, terpinene, terpinene (also referred to as terpinene), nesol, sinene, orange flavor, terpinolene, terpinolene (also referred to as terpinolene), ferrandrene, mentadien, terben, and dihydro. Cymen, moslen, isoterpinene, isoterpinene (also referred to as isoterpinene), klitmen, kautushin, kagepten, oilymen, pinene, turpentine, menthan, pinane, terpene, cyclohexane, and the like.
上記アルコールは、OH基を分子構造中に1つ以上含む化合物であり、脂肪族アルコール、環状アルコール及び脂環式アルコールが挙げられ、それぞれ単独で用いてもよく、2種以上を併用してもよい。また、OH基の一部は、本発明の効果を損なわない範囲でアセトキシ基等に誘導されていてもよい。 The alcohol is a compound containing one or more OH groups in the molecular structure, and includes an aliphatic alcohol, a cyclic alcohol and an alicyclic alcohol, each of which may be used alone or in combination of two or more. Good. Further, a part of the OH group may be derived to an acetoxy group or the like as long as the effect of the present invention is not impaired.
上記脂肪族アルコールとしては、例えば、ヘプタノール、オクタノール(1-オクタノール、2-オクタノール、3-オクタノール等)、デカノール(1-デカノール等)、トリデカノール(イソトリデカノール等)、ラウリルアルコール、テトラデシルアルコール、セチルアルコール、2-エチル-1-ヘキサノール、オクタデシルアルコール、ヘキサデセノール、オレイルアルコール等の炭素数が6~30の飽和又は不飽和脂肪族アルコール等が挙げられる。 Examples of the aliphatic alcohol include heptanol, octanol (eg, 1-octanol, 2-octanol, 3-octanol), decanol (eg, 1-decanol), tridecanol (eg, isotridecanol), lauryl alcohol, and tetradecyl alcohol. And saturated or unsaturated aliphatic alcohols having 6 to 30 carbon atoms, such as cetyl alcohol, 2-ethyl-1-hexanol, octadecyl alcohol, hexadecenol and oleyl alcohol.
上記環状アルコールとしては、例えば、クレゾール、オイゲノール等が挙げられる。更に、脂環式アルコールとしては、例えば、シクロヘキサノール等のシクロアルカノール;テルピネオール(α、β、γ異性体、又はこれらの任意の混合物を含む。)、ジヒドロテルピネオール等のテルペンアルコール(モノテルペンアルコール等);ジヒドロターピネオール;ミルテノール;ソブレロール;メントール;カルベオール;ペリリルアルコール;ピノカルベオール;ソブレロール;ベルベノール等が挙げられる。 Examples of the cyclic alcohol include cresol and eugenol. Examples of alicyclic alcohols include, for example, cycloalkanols such as cyclohexanol; terpineols (including α, β, γ isomers or any mixture thereof) and terpene alcohols such as dihydroterpineol (monoterpene alcohols and the like). Dihydroterpineol; myrtenol; sobrelol; menthol; carveol; perillyl alcohol; pinocalveol; sobrelol;
上記エーテルとしては、例えば、ヘキシルエーテル、ブチルカルビトール、ヘキシルカルビトール、ジプロピレングリコール-n-ブチルエーテル、テルソルブTHA-90、トリプロピレングリコールメチルエーテル、トリエチレングリコールモノメチルエーテル、ジエチレングリコールジブチルエーテル、ジエチレングリコールモノヘキシルエーテル、トリエチレングリコールブチルメチルエーテル、ジプロピレングリコールモノブチルエーテル、テトラエチレングリコールジメチルエーテル、テルソルブTOE-100、ブチルカルビトールアセテート、トリエチレングリコールメチルエーテルアセテート等が挙げられる。 Examples of the ether include hexyl ether, butyl carbitol, hexyl carbitol, dipropylene glycol-n-butyl ether, tersolve THA-90, tripropylene glycol methyl ether, triethylene glycol monomethyl ether, diethylene glycol dibutyl ether, and diethylene glycol monohexyl. Examples include ether, triethylene glycol butyl methyl ether, dipropylene glycol monobutyl ether, tetraethylene glycol dimethyl ether, tersolve TOE-100, butyl carbitol acetate, and triethylene glycol methyl ether acetate.
上記分散媒は、水酸基(OH基)を有する有機溶剤を少なくとも含むことが好ましい。水酸基を有する有機溶剤としては、上述のアルコール、上述の炭化水素の中でも水酸基を有するもの、及び、上述のエーテルの中でも水酸基を有するものが挙げられる。分散媒として水酸基を有する有機溶剤を少なくとも含むことで、銀微粒子との相溶性と揮発性とを両立できるためである。
銀微粒子との相溶性と揮発性とを両立する観点から、水酸基を有するエーテルを有機溶剤として用いることが好ましく、ヘキシルカルビトール等が挙げられる。
The dispersion medium preferably contains at least an organic solvent having a hydroxyl group (OH group). Examples of the organic solvent having a hydroxyl group include those having a hydroxyl group among the above-mentioned alcohols and hydrocarbons, and those having a hydroxyl group among the above-mentioned ethers. By containing at least an organic solvent having a hydroxyl group as a dispersion medium, compatibility with silver fine particles and volatility can be achieved.
From the viewpoint of achieving both compatibility with the silver fine particles and volatility, it is preferable to use an ether having a hydroxyl group as the organic solvent, such as hexyl carbitol.
また、分散媒全体に対する上記水酸基を有する有機溶剤の含有量は、50重量%以上、99重量%以下であることが好ましい。上記分散媒中の上記有機溶剤の含有量が、50重量%未満であると、分散媒に対する銀微粒子の分散性が悪くなる可能性があり、99重量%を超えると、接合性が悪化する問題を生じる可能性がある。
上記水酸基を有する有機溶剤の含有量は、60重量%以上98重量%以下であることがより好ましい。
The content of the organic solvent having a hydroxyl group with respect to the entire dispersion medium is preferably 50% by weight or more and 99% by weight or less. If the content of the organic solvent in the dispersion medium is less than 50% by weight, the dispersibility of the silver fine particles in the dispersion medium may be deteriorated. If the content exceeds 99% by weight, the joining property may be deteriorated. May occur.
The content of the organic solvent having a hydroxyl group is more preferably 60% by weight or more and 98% by weight or less.
本発明の接合用組成物全体に対する上記分散媒の含有量は、6重量%以上、15重量%以下であることが好ましい。上記分散媒の含有量が6重量%未満であると、接合用組成物のせん断粘度が高すぎるため取り扱い性が悪く、被接合部材に塗工し難くなる。一方で、上記分散媒の含有量が、15重量%を超えると、25℃から550℃までの熱分析による重量減少率が増大する。また、接合用組成物中の銀微粒子の含有量が少なくなるため、焼結体の密度が低くなり、充分な接合強度が得られない場合がある。 It is preferable that the content of the above-mentioned dispersion medium with respect to the whole bonding composition of the present invention is 6% by weight or more and 15% by weight or less. When the content of the dispersion medium is less than 6% by weight, the shearing viscosity of the bonding composition is too high, so that the handleability is poor and it is difficult to apply to the member to be bonded. On the other hand, when the content of the dispersion medium exceeds 15% by weight, the rate of weight loss by thermal analysis from 25 ° C. to 550 ° C. increases. Further, since the content of silver fine particles in the bonding composition is reduced, the density of the sintered body is reduced, and sufficient bonding strength may not be obtained.
また、上記分散媒は、沸点が250℃以上であることが好ましい。このような分散媒を含む接合用組成物は、印刷中や塗布後等において、常温で乾燥することがなく、取扱性に優れるためである。また、上記分散媒は、常温において液体であることが好ましい。 The dispersion medium preferably has a boiling point of 250 ° C. or higher. This is because the bonding composition containing such a dispersion medium does not dry at room temperature during printing or after application, and is excellent in handleability. Further, the dispersion medium is preferably liquid at ordinary temperature.
上記分散媒は、上述の観点から、上記炭化水素、上記アルコール及び上記エタノールが1つ以上選択されたものであることが好ましく、特に、ヘキシルカルビトール(沸点258℃)及びブチルカルビトールアセテート(沸点245℃)を含み、沸点が250℃以上であることが好ましい。 From the viewpoint described above, the dispersion medium is preferably a mixture of at least one of the hydrocarbon, the alcohol, and the ethanol. In particular, hexyl carbitol (boiling point: 258 ° C.) and butyl carbitol acetate (boiling point: 245 ° C.) and the boiling point is preferably 250 ° C. or higher.
更に、本発明の接合用組成物は、高分子分散剤を含有しないことが好ましい。高分子分散剤は、300℃以下の焼成では焼成後も接合層に残り易く、焼結を阻害し、接合信頼性に悪影響を及ぼす可能性があるためである。 Further, it is preferable that the bonding composition of the present invention does not contain a polymer dispersant. This is because the polymer dispersant tends to remain in the bonding layer even after firing at a temperature of 300 ° C. or less, hinder sintering, and may adversely affect the bonding reliability.
本発明の接合用組成物を275℃で加熱焼成して得られる接合層の空隙率は、10%以下であることが好ましい。また、加圧されることなく、275℃で加熱焼成して得られる接合層の空隙率が10%以下であることが好ましい。このような状態であることにより耐熱信頼性という観点で、線膨張係数の違いによるひずみに対してクラックの進展が遅くなるためである。 The porosity of the bonding layer obtained by heating and baking the bonding composition of the present invention at 275 ° C. is preferably 10% or less. Further, it is preferable that the porosity of the bonding layer obtained by heating and firing at 275 ° C. without pressure is 10% or less. This is because, in such a state, from the viewpoint of heat resistance reliability, the crack progresses slowly with respect to strain due to a difference in linear expansion coefficient.
本発明の接合用組成物が用いられる被接合体は、Au、Ag、Cu等が挙げられ、無垢のCuを好適に用いることができる。なお、被接合体として無垢のCuを用いる場合、接合するためには表面酸化膜を除去しなければならないという課題を生じる。そのため、本発明の接合用組成物は、分散媒としてリシノール酸のようなカルボン酸を含む不飽和炭化水素を含有することが好ましい。カルボン酸は銅表面の酸化膜を除去する効果があり、銅表面に無加圧接合する際に有効であるためである。
また、本発明の接合用組成物は、大気雰囲気又は不活性雰囲気下で加熱焼成されるものであるが、被接合体として無垢のCuを用いる場合、不活性雰囲気下で加熱焼成されるものであることが好ましい。
接合層(焼結体ともいう)を形成する際の雰囲気が、大気雰囲気という酸素を含む酸化雰囲気である場合、接合力に悪影響を及ぼす可能性のある、被接合体との界面部の酸化膜形成が懸念される。Au、Agを用いる場合は酸化膜をほとんど形成しないが、無垢のCuを用いる場合、こうした影響が顕著になる傾向があると考えられる。したがって、こうした影響を排除できうる窒素を初めとした不活性雰囲気下で加熱焼成されるものであることが好ましい。なお、本発明の接合用組成物は、不活性雰囲気下での加熱焼成においても、充分な接合強度を発揮するものである。
The object to which the bonding composition of the present invention is used includes Au, Ag, Cu and the like, and pure Cu can be suitably used. In the case where pure Cu is used as an object to be joined, there arises a problem that a surface oxide film must be removed in order to join. Therefore, the bonding composition of the present invention preferably contains an unsaturated hydrocarbon containing a carboxylic acid such as ricinoleic acid as a dispersion medium. Carboxylic acid has an effect of removing an oxide film on the copper surface, and is effective when bonding to the copper surface without pressure.
Further, the bonding composition of the present invention is heated and fired in an air atmosphere or an inert atmosphere, but when solid Cu is used as an object to be bonded, it is heated and fired in an inert atmosphere. Preferably, there is.
When the atmosphere in which the bonding layer (also referred to as a sintered body) is formed is an oxidizing atmosphere including oxygen, which is an air atmosphere, an oxide film at an interface with the body to be bonded, which may adversely affect bonding strength. Concern about formation. When using Au or Ag, almost no oxide film is formed, but when using pure Cu, it is considered that such an effect tends to be remarkable. Therefore, it is preferable that the substrate be heated and fired under an inert atmosphere such as nitrogen which can eliminate such an influence. The bonding composition of the present invention exhibits sufficient bonding strength even when heated and baked in an inert atmosphere.
本発明の接合用組成物は、上記の成分に加えて、本発明の効果を損なわない範囲で、使用目的に応じた適度な粘性、密着性、乾燥性又は印刷性等の機能を付与するために、例えば、バインダーとしての役割を果たすオリゴマー成分、樹脂成分、有機溶剤(固形分の一部を溶解又は分散していてよい。)、増粘剤、界面活性剤又は表面張力調整剤等の任意成分を添加してもよい。かかる任意成分としては、特に限定されない。 The bonding composition of the present invention, in addition to the components described above, within a range that does not impair the effects of the present invention, to impart a function such as appropriate viscosity, adhesion, drying property, or printability according to the purpose of use. In addition, for example, optional components such as an oligomer component, a resin component, an organic solvent (which may dissolve or disperse a part of solid content), a thickener, a surfactant, and a surface tension modifier, which serve as a binder, Components may be added. Such optional components are not particularly limited.
上記樹脂成分としては、例えば、ポリエステル系樹脂、ポリウレタン系樹脂(例えば、ブロックドイソシアネートを用いたもの)、ポリアクリレート系樹脂、ポリアクリルアミド系樹脂、ポリエーテル系樹脂、メラミン系樹脂又はテルペン系樹脂等を挙げることができ、これらはそれぞれ単独で用いてもよく、2種以上を併用してもよい。 Examples of the resin component include a polyester resin, a polyurethane resin (for example, one using blocked isocyanate), a polyacrylate resin, a polyacrylamide resin, a polyether resin, a melamine resin, a terpene resin, and the like. These may be used alone or in combination of two or more.
上記有機溶剤としては、上記の分散媒として挙げられたものを除き、例えば、メチルアルコール、エチルアルコール、n-プロピルアルコール、2-プロピルアルコール、1,3-プロパンジオール、1,2-プロパンジオール、1,4-ブタンジオール、1,2,6-ヘキサントリオール、1-エトキシ-2-プロパノール、2-ブトキシエタノール、エチレングリコール、ジエチレングリコール、トリエチレングリコール、重量平均分子量が200以上1,000以下の範囲内であるポリエチレングリコール、プロピレングリコール、ジプロピレングリコール、トリプロピレングリコール、重量平均分子量が300以上1,000以下の範囲内であるポリプロピレングリコール、N,N-ジメチルホルムアミド、ジメチルスルホキシド、N-メチル-2-ピロリドン、N,N-ジメチルアセトアミド、グリセリン又はアセトン等が挙げられ、これらはそれぞれ単独で用いてもよく、2種以上を併用してもよい。 Examples of the organic solvent, except those mentioned as the dispersion medium, include, for example, methyl alcohol, ethyl alcohol, n-propyl alcohol, 2-propyl alcohol, 1,3-propanediol, 1,2-propanediol, 1,4-butanediol, 1,2,6-hexanetriol, 1-ethoxy-2-propanol, 2-butoxyethanol, ethylene glycol, diethylene glycol, triethylene glycol, having a weight average molecular weight of 200 to 1,000 Polyethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, polypropylene glycol having a weight average molecular weight in the range of 300 to 1,000, N, N-dimethylformamide, dimethyl sulfoxide, - methyl-2-pyrrolidone, N, N- dimethylacetamide, glycerin, or acetone and the like may be used each of which alone or in combination of two or more.
上記増粘剤としては、例えば、クレイ、ベントナイト又はヘクトライト等の粘土鉱物;例えば、ポリエステル系エマルジョン樹脂、アクリル系エマルジョン樹脂、ポリウレタン系エマルジョン樹脂又はブロックドイソシアネート等のエマルジョン;メチルセルロース、カルボキシメチルセルロース、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロース、ヒドロキシプロピルメチルセルロース等のセルロース誘導体;キサンタンガム又はグアーガム等の多糖類等が挙げられ、これらはそれぞれ単独で用いてもよく、2種以上を併用してもよい。 Examples of the thickener include clay minerals such as clay, bentonite and hectorite; for example, emulsions such as polyester emulsion resin, acrylic emulsion resin, polyurethane emulsion resin and blocked isocyanate; methyl cellulose, carboxymethyl cellulose, hydroxy Cellulose derivatives such as ethylcellulose, hydroxypropylcellulose and hydroxypropylmethylcellulose; polysaccharides such as xanthan gum and guar gum; and the like, each of which may be used alone or in combination of two or more.
上記界面活性剤としては、特に限定されず、アニオン性界面活性剤、カチオン性界面活性剤、ノニオン性界面活性剤の何れかを用いることができ、例えば、アルキルベンゼンスルホン酸塩、4級アンモニウム塩等が挙げられる。少量の添加量で効果が得られるので、フッ素系界面活性剤が好ましい。 The surfactant is not particularly limited, and any one of an anionic surfactant, a cationic surfactant, and a nonionic surfactant can be used. Examples thereof include an alkylbenzene sulfonate, a quaternary ammonium salt, and the like. Is mentioned. Since the effect can be obtained with a small addition amount, a fluorine-based surfactant is preferable.
本発明の接合用組成物において、上記第一及び第二の銀微粒子は、銀コロイド粒子として存在している。一般的に、上記銀コロイド粒子の形態に関しては、例えば、銀微粒子の表面の一部に有機物が付着して構成されている銀コロイド粒子、銀微粒子をコアとして、その表面が有機物で被覆されて構成されている銀コロイド粒子、それらが混在して構成されている銀コロイド粒子等が挙げられるが、特に限定されない。本発明においては、有機物である第一級アミンが付着している銀コロイド粒子、第一級アミンに被覆されている銀コロイド粒子、及び、それらが混在して構成される銀コロイド粒子を銀微粒子という。本明細書における銀微粒子としては、銀微粒子をコアとして、その表面が第一級アミンで被覆されて構成されている銀コロイド粒子が好ましい。 In the bonding composition of the present invention, the first and second silver fine particles are present as silver colloid particles. In general, regarding the form of the silver colloid particles, for example, a silver colloid particle formed by attaching an organic substance to a part of the surface of the silver fine particle, the silver fine particle as a core, and the surface is coated with an organic substance. Examples of the silver colloid particles include, but are not particularly limited to, silver colloid particles formed by mixing them. In the present invention, silver colloid particles having a primary amine as an organic substance attached thereto, silver colloid particles coated with a primary amine, and silver colloid particles composed of a mixture thereof are referred to as silver fine particles. That. The silver fine particles in the present specification are preferably silver colloid particles composed of silver fine particles as a core and the surface thereof coated with a primary amine.
本明細書において、第一級アミンで被覆されている銀微粒子は、銀微粒子の表面の一部に付着する有機物、及び/又は、銀微粒子の表面を被覆する有機物等に対し、第一級アミンが50重量%以上である場合に、第一級アミンで被覆されている銀微粒子という。ここで、銀微粒子を被覆する有機物中の第一級アミンの量は、例えば、熱重量分析等の方法により測定することができる。 In the present specification, the silver fine particles coated with the primary amine are a primary amine to an organic substance adhering to a part of the surface of the silver fine particles and / or an organic substance coating the surface of the silver fine particles. Is 50% by weight or more, it is referred to as silver fine particles coated with a primary amine. Here, the amount of the primary amine in the organic substance covering the silver fine particles can be measured, for example, by a method such as thermogravimetric analysis.
本発明の接合用組成物のせん断粘度は、本発明の効果を損なわない範囲で適宜調整すればよいが、25℃におけるせん断粘度が、せん断速度10s-1において、15~200Pa・sであることが好ましい。上記範囲とすることにより、例えば、LED等の発光素子、半導体チップ等を基板に接合する用途、これらの基板を更に放熱部材に接合する用途に好適に用いることができる。上記せん断粘度のより好ましい下限は25Pa・sであり、より好ましい上限は180Pa・sである。 The shear viscosity of the bonding composition of the present invention may be appropriately adjusted within a range that does not impair the effects of the present invention. The shear viscosity at 25 ° C. is 15 to 200 Pa · s at a shear rate of 10 s −1 . Is preferred. By setting the content within the above range, for example, it can be suitably used for a purpose of bonding a light emitting element such as an LED, a semiconductor chip and the like to a substrate, and a purpose of further bonding these substrates to a heat dissipation member. A more preferred lower limit of the shear viscosity is 25 Pa · s, and a more preferred upper limit is 180 Pa · s.
上記せん断粘度の調整は、銀微粒子の粒径の調整、有機物である第一級アミンの含有量の調整、分散媒その他の成分の添加量の調整、各成分の配合比の調整、増粘剤の添加等によって行うことができる。上記せん断粘度は、コーンプレート型粘度計(例えば、アントンパール社製のレオメーターMCR301)により測定することができる。 The adjustment of the shear viscosity is performed by adjusting the particle size of the silver fine particles, adjusting the content of the primary amine which is an organic substance, adjusting the addition amount of the dispersion medium and other components, adjusting the mixing ratio of each component, and using a thickener. And the like. The above-mentioned shear viscosity can be measured by a cone plate type viscometer (for example, a rheometer MCR301 manufactured by Anton Paar).
本発明の接合用組成物により被接合部材同士を接合した場合の接合強度は、20~150MPaであることが好ましい。接合強度が、20~150MPaであれば、LED等の発光素子、半導体チップ等と基板との接合、上記基板と放熱部材との接合に好適に用いることができる。上記接合強度のより好ましい下限は30MPaであり、更に好ましい下限は50MPaである。上記接合強度は、一方の被接合部材に接合用組成物を塗工し、他方の被接合部材を貼り付けた後、焼成し、得られた積層体について、例えば、ボンドテスター(レスカ社製)を用いて、接合強度試験を行うことで評価できる。 The joining strength when the members to be joined are joined with the joining composition of the present invention is preferably 20 to 150 MPa. When the bonding strength is 20 to 150 MPa, it can be suitably used for bonding a light emitting element such as an LED, a semiconductor chip or the like to a substrate, and bonding the substrate to a heat dissipation member. A more preferred lower limit of the bonding strength is 30 MPa, and a still more preferred lower limit is 50 MPa. The bonding strength is determined by applying a bonding composition to one of the members to be bonded, attaching the other member to be bonded, and sintering the resultant. For example, a bond tester (manufactured by Resca Corporation) Can be evaluated by performing a bonding strength test.
本発明の接合用組成物は、優れた耐熱信頼性(ヒートサイクル信頼性ともいう。)を有する。上記ヒートサイクル信頼性が良好であることで、駆動温度が高いデバイスの製造における、LED等の発光素子、半導体チップ等の接合にも好適に用いることができる。上記ヒートサイクル信頼性は、例えば、接合用組成物と被接合部材とを焼結した積層体を、大気雰囲気下で-40℃及び150℃で、10分ずつ保持することを1サイクルとして、500~1000サイクルのヒートサイクル試験を行うことで評価することができる。上記ヒートサイクル試験は、例えば、冷熱衝撃試験機(ヒューテック製)を用いて行うことができる。積層体の初期強度に対する、ヒートサイクル試験後の積層体の接合強度の低下率は、20%未満であることが好ましく、5%未満であることがより好ましい。 The bonding composition of the present invention has excellent heat resistance (also referred to as heat cycle reliability). Since the heat cycle reliability is good, it can be suitably used for bonding of a light emitting element such as an LED, a semiconductor chip, and the like in the manufacture of a device having a high driving temperature. The above-mentioned heat cycle reliability is, for example, 500 ° C. for a cycle in which a laminate obtained by sintering a joining composition and a member to be joined is held at −40 ° C. and 150 ° C. in an air atmosphere for 10 minutes each. It can be evaluated by performing a heat cycle test of up to 1000 cycles. The heat cycle test can be performed using, for example, a thermal shock tester (manufactured by Hutec). The rate of decrease in the bonding strength of the laminate after the heat cycle test with respect to the initial strength of the laminate is preferably less than 20%, more preferably less than 5%.
<接合用組成物の調製>
本発明の接合用組成物の製造方法は、特に限定されないが、まず、銀微粒子分散体を調製し、上記銀微粒子分散体と分散媒とを、必要に応じて上記各種成分と混合することにより、本発明の接合用組成物を得ることができる。
<Preparation of bonding composition>
The method for producing the bonding composition of the present invention is not particularly limited.First, a silver fine particle dispersion is prepared, and the silver fine particle dispersion and the dispersion medium are mixed with the various components as necessary. Thus, the bonding composition of the present invention can be obtained.
上記銀微粒子分散体の調製方法としては、還元により分解して銀原子を生成しうる銀化合物と、有機保護成分との混合液を調製する第1工程と、上記混合液中の上記銀化合物を還元することで表面の少なくとも一部に有機保護成分が付着した銀微粒子を生成する第2工程とを含む方法が挙げられる。以下に、具体的な製造方法を説明する。 As a method for preparing the silver fine particle dispersion, a first step of preparing a mixed solution of a silver compound capable of decomposing by reduction to generate silver atoms and an organic protective component, and the silver compound in the mixed solution A second step of generating silver fine particles having an organic protective component adhered to at least a part of the surface by reduction. Hereinafter, a specific manufacturing method will be described.
上記第1工程においては、第一級アミン(以下、単にアミンという。)を銀1molに対して1mol以上添加することが好ましい。上記アミンの添加量を銀1molに対して1mol以上とすることで、還元によって生成される銀微粒子の表面に上記アミンを一定量以上付着させることができ、上記銀微粒子に種々の分散媒に対する優れた分散性と低温焼結性とを付与することができる。 In the first step, it is preferable to add a primary amine (hereinafter, simply referred to as an amine) in an amount of 1 mol or more per 1 mol of silver. When the amount of the amine is 1 mol or more per 1 mol of silver, the amine can be adhered to the surface of silver fine particles generated by reduction in a certain amount or more, and the silver fine particles are excellent in various dispersion media. High dispersibility and low-temperature sinterability.
以下、銀微粒子の製造方法を具体的に説明するが、下記説明は上記第一の銀微粒子及び上記第二の銀微粒子の両者に共通するものであるため、単に「銀微粒子」と記載する。 Hereinafter, the method for producing silver fine particles will be specifically described, but since the following description is common to both the first silver fine particles and the second silver fine particles, it is simply referred to as “silver fine particles”.
有機成分であるアミンで被覆された銀微粒子を得るための出発材料としては、種々の公知の銀化合物を用いることができ、例えば、銀塩又は銀塩の水和物を用いることができる。具体的には、硝酸銀、硫酸銀、塩化銀、酸化銀、酢酸銀、シュウ酸銀、ギ酸銀、亜硝酸銀、塩素酸銀、硫化銀等の銀塩が挙げられる。これらは還元可能なものであれば特に限定されず、適当な溶媒中に溶解させても、溶媒中に分散させたまま使用してもよい。また、これらは単独で用いても複数併用してもよい。なかでも、シュウ酸銀が好ましい。シュウ酸銀は、最も単純なジカルボン酸銀であり、シュウ酸銀を用いて合成されるシュウ酸銀アミン錯体は、低温かつ短時間で還元が進むことから、本発明の銀微粒子の合成に好適である。更に、シュウ酸銀を用いると、合成時には副生成物が発生せず、系外にシュウ酸イオン由来の二酸化炭素が出るのみであるため、合成後に精製の手間が少ない。 Various known silver compounds can be used as a starting material for obtaining silver fine particles coated with an amine as an organic component. For example, a silver salt or a hydrate of a silver salt can be used. Specific examples include silver salts such as silver nitrate, silver sulfate, silver chloride, silver oxide, silver acetate, silver oxalate, silver formate, silver nitrite, silver chlorate, and silver sulfide. These are not particularly limited as long as they can be reduced, and may be dissolved in an appropriate solvent or used while being dispersed in the solvent. These may be used alone or in combination of two or more. Among them, silver oxalate is preferred. Silver oxalate is the simplest silver dicarboxylate, and the silver oxalate amine complex synthesized using silver oxalate is suitable for the synthesis of the silver fine particles of the present invention because the reduction proceeds in a short time at a low temperature. It is. Furthermore, when silver oxalate is used, by-products are not generated at the time of synthesis, and only carbon dioxide derived from oxalate ions is emitted out of the system, so that there is little labor for purification after the synthesis.
上記銀化合物を還元する方法としては、加熱する方法が好ましい。上記加熱方法は特に限定されない。上記加熱により上記銀化合物を還元する方法としては、例えば、シュウ酸銀等の銀化合物とアミン等の有機成分から生成される錯化合物を加熱して、上記錯化合物に含まれるシュウ酸イオン等を分解して生成する原子状の銀を凝集させる方法が挙げられる。上記方法により、アミン等の有機保護成分で被覆された銀微粒子を製造することができる。 As a method of reducing the silver compound, a method of heating is preferable. The heating method is not particularly limited. As a method of reducing the silver compound by the heating, for example, heating a complex compound formed from a silver compound such as silver oxalate and an organic component such as an amine to reduce oxalate ions and the like contained in the complex compound There is a method of aggregating atomic silver generated by decomposition. By the above method, silver fine particles coated with an organic protective component such as an amine can be produced.
このように、銀化合物の錯化合物をアミンの存在下で熱分解することで、アミンにより被覆された銀微粒子を製造する金属アミン錯体分解法においては、単一種の分子である銀アミン錯体の分解反応により原子状銀が生成するため、反応系内に均一に原子状銀を生成することが可能である。そのため、複数の成分間の反応により銀原子を生成する場合と比較して、反応を構成する成分の組成揺らぎに起因する反応の不均一が抑制され、特に工業的規模で多量の銀微粒子を製造する際に有利である。 As described above, in the metal amine complex decomposition method for producing silver fine particles coated with an amine by thermally decomposing the complex compound of the silver compound in the presence of the amine, the decomposition of the silver amine complex which is a single kind of molecule is performed. Since atomic silver is generated by the reaction, it is possible to uniformly generate atomic silver in the reaction system. Therefore, compared with the case where silver atoms are generated by the reaction between a plurality of components, the nonuniformity of the reaction due to the fluctuation of the composition of the components constituting the reaction is suppressed, and particularly, a large amount of silver fine particles are produced on an industrial scale. It is advantageous when doing.
なお、上記第1工程における混合液の組成、及び、上記第2工程における還元条件(例えば、加熱温度及び加熱時間等)は、所望の銀微粒子が第一の銀微粒子であれば、得られる銀微粒子の平均粒径を45~75nmとするように調整し、所望の銀微粒子が第二の銀微粒子であれば、得られる銀微粒子の平均粒径を200~550nmとするように調整する。また、上記第2工程で得られる銀微粒子分散体から銀微粒子を取り出す方法は特に限定されないが、例えば、その銀微粒子分散体の洗浄を行う方法等が挙げられる。 The composition of the liquid mixture in the first step and the reduction conditions (for example, heating temperature and heating time) in the second step are determined by selecting a desired silver fine particle as the first silver fine particle. The average particle size of the fine particles is adjusted to 45 to 75 nm, and if the desired silver fine particles are the second silver fine particles, the average particle size of the obtained silver fine particles is adjusted to 200 to 550 nm. The method for extracting silver fine particles from the silver fine particle dispersion obtained in the second step is not particularly limited, and examples thereof include a method for washing the silver fine particle dispersion.
また、有機保護成分である第一級アミンは、上記銀化合物と、有機保護成分(第一級アミン)との混合液を調製する第1工程のみではなく、第1工程で得られた混合液中の上記銀化合物を還元する第2工程において添加されることとしてもよい。また、上記第1工程で添加される第一級アミンと上記第2工程で添加される第一級アミンとは、同じ種類であっても、異なる種類であってもよい。ただし、得られた銀微粒子に付着又は被覆する有機保護成分のうち50重量%以上が第一級アミンであることが好ましく、得られた銀微粒子に付着又は被覆する有機保護成分の全てが第一級アミンであることがより好ましい。 Further, the primary amine which is an organic protective component is used not only in the first step of preparing a mixed liquid of the silver compound and the organic protective component (primary amine), but also in the mixed liquid obtained in the first step. It may be added in the second step of reducing the silver compound therein. The primary amine added in the first step and the primary amine added in the second step may be of the same type or different types. However, it is preferable that 50% by weight or more of the organic protective component attached to or coated on the obtained silver fine particles is a primary amine, and all of the organic protective components attached or coated on the obtained silver fine particles are primary amines. More preferably, it is a secondary amine.
また、金属アミン錯体分解法においては、生成する銀原子にアミン分子が配位結合しており、上記銀原子に配位したアミン分子の働きにより凝集を生じる際の銀原子の運動がコントロールされるものと推察される。この結果として、金属アミン錯体分解法によれば非常に微細で、粒度分布が狭い銀微粒子を製造することが可能となる。 In addition, in the metal amine complex decomposition method, an amine molecule is coordinated to a generated silver atom, and the movement of the silver atom during aggregation is controlled by the action of the amine molecule coordinated to the silver atom. It is assumed that As a result, according to the metal amine complex decomposition method, it is possible to produce very fine silver fine particles having a narrow particle size distribution.
更に、製造される銀微粒子の表面にも多数のアミン分子が比較的弱い力の配位結合を生じており、これらが銀微粒子の表面に緻密な保護被膜を形成するため、保存安定性に優れ、表面の清浄な有機被覆銀微粒子を製造することが可能となる。また、上記被膜を形成するアミン分子は加熱等により容易に脱離可能であるため、非常に低温で焼結可能な銀微粒子を製造することが可能となる。
特に本発明における接合用組成物において、銀微粒子を被覆する第一級アミンは、炭素数が4~12であり、かつ、沸点が300℃以下であるため、300℃以下の比較的低温度においても銀微粒子から脱離しやすい。
Furthermore, a large number of amine molecules also have relatively weak coordination bonds on the surface of the manufactured silver fine particles, and these form a dense protective film on the surface of the silver fine particles, so that they have excellent storage stability. Thus, it becomes possible to produce organic-coated silver fine particles having a clean surface. Further, since the amine molecules forming the coating can be easily detached by heating or the like, it becomes possible to produce silver fine particles that can be sintered at a very low temperature.
In particular, in the bonding composition of the present invention, since the primary amine covering the silver fine particles has 4 to 12 carbon atoms and a boiling point of 300 ° C. or less, it can be used at a relatively low temperature of 300 ° C. or less. Are also easily separated from the silver fine particles.
また、固体状の銀化合物とアミンとを混合して錯化合物等の複合化合物が生成する際に、被覆銀微粒子の被膜を構成する酸価をもつ分散剤に対して、アミンを混合して用いることにより、錯化合物等の複合化合物の生成が容易になり、短時間の混合で複合化合物を製造可能となる。また、上記アミンを混合して用いることにより、各種の用途に応じた特性を有する被覆銀微粒子の製造が可能である。 Further, when a composite compound such as a complex compound is formed by mixing a solid silver compound and an amine, an amine is used by mixing with a dispersant having an acid value constituting a coating of the coated silver fine particles. This facilitates the production of a complex compound such as a complex compound, and makes it possible to produce the complex compound by short-time mixing. Further, by mixing and using the above amines, it is possible to produce coated silver fine particles having characteristics according to various uses.
上記のようにして得られたアミン等の有機保護成分で被覆された銀微粒子を含む分散液には、銀微粒子の他に、金属塩の対イオン、分散剤等が存在しており、液全体の電解質濃度や有機物濃度が高い傾向にある。このような状態の液は、電導度が高い等の理由で銀微粒子の凝析が起こり、沈殿し易い。または、沈殿しなくても、金属塩の対イオン、分散に必要な量以上の過剰な分散剤等が残留していると、導電性を悪化させるおそれがある。そこで、上記銀微粒子を含む溶液を洗浄して余分な残留物を取り除くことにより、有機保護成分で被覆された銀微粒子を確実に得ることができる。 The dispersion liquid containing silver fine particles coated with an organic protective component such as an amine obtained as described above contains, in addition to the silver fine particles, a counter ion of a metal salt, a dispersant, and the like. Tend to have a high electrolyte concentration and a high organic matter concentration. In the liquid in such a state, coagulation of silver fine particles occurs due to high conductivity and the like, and the liquid is easily precipitated. Alternatively, even if precipitation does not occur, the conductivity may be deteriorated if a counter ion of the metal salt or an excessive amount of a dispersant or the like remaining in an amount necessary for dispersion remain. Thus, by washing the solution containing the silver fine particles to remove excess residues, it is possible to reliably obtain the silver fine particles coated with the organic protective component.
上記洗浄方法としては、例えば、表面を有機保護成分で被覆された銀微粒子を含む分散液を一定時間静置し、上澄み液を取り除いた後、銀微粒子を沈殿させる溶媒(例えば、水、メタノール、メタノール/水混合溶媒等)を加えて撹枠し、再度一定期間静置して上澄み液を取り除く工程を幾度か繰り返す方法が挙げられる。他の方法としては、上記の静置の代わりに遠心分離を行う方法、限外濾過装置やイオン交換装置等により脱塩する方法等が挙げられる。このような洗浄によって余分な残留物を取り除くと共に有機溶媒を除去することにより、表面を有機保護成分で被覆された銀微粒子を得ることができる。 As the washing method, for example, a dispersion liquid containing silver fine particles whose surface is coated with an organic protective component is allowed to stand for a certain period of time, and after removing the supernatant, a solvent (eg, water, methanol, (A mixed solvent of methanol / water, etc.), stirring the mixture, leaving the mixture to stand still for a certain period of time, and removing the supernatant liquid several times. Examples of other methods include a method of performing centrifugation instead of the above-mentioned standing, and a method of desalting with an ultrafiltration device or an ion exchange device. By removing excess residue and organic solvent by such washing, silver fine particles whose surface is coated with an organic protective component can be obtained.
上記方法により第一の銀微粒子と第二の銀微粒子とが得られるが、これらを含む銀微粒子分散体と分散媒とを混合する方法は特に限定されず、攪拌機やスターラー等を用いて従来公知の方法によって行うことができる。スパチュラのようなもので撹拌したりして、適当な出力の超音波ホモジナイザーを当ててもよい。
このようにして接合用組成物を調製することができる。
Although the first silver fine particles and the second silver fine particles are obtained by the above method, the method of mixing the silver fine particle dispersion containing these and the dispersion medium is not particularly limited, and is conventionally known using a stirrer or a stirrer. The method can be performed by the following method. An ultrasonic homogenizer having an appropriate output may be applied by stirring with a spatula or the like.
Thus, the bonding composition can be prepared.
<接合方法>
本発明の接合用組成物を用いれば、比較的低温(例えば、300℃以下、好ましくは275℃程度)でも、加熱を伴う部材同士の接合において高い接合強度を得ることができる。即ち、上記接合用組成物を第1の被接合部材と第2の被接合部材との間に塗布する接合用組成物塗布工程と、第1の被接合部材と第2の被接合部材との間に塗布した接合用組成物を、所望の温度(例えば、300℃以下、好ましくは275℃程度)で焼成して接合する接合工程とにより、第1の被接合部材と第2の被接合部材とを接合することができる。
<Joining method>
When the bonding composition of the present invention is used, high bonding strength can be obtained in bonding members with heating even at a relatively low temperature (for example, 300 ° C. or lower, preferably about 275 ° C.). That is, a bonding composition application step of applying the bonding composition between a first member to be bonded and a second member to be bonded, and a step of coating the first member to be bonded and the second member to be bonded. A first bonding member and a second bonding member by a bonding step of firing and bonding the bonding composition applied in between at a desired temperature (for example, 300 ° C. or lower, preferably about 275 ° C.) And can be joined.
上記接合工程では、第1の被接合部材と第2の被接合部材とが対向する方向に加圧することもできるが、特に加圧しなくとも充分な接合強度を得ることができるのも本発明の利点のひとつである。上記焼成は、段階的に温度を上げたり下げたりすることもできる。上記被接合部材は、予め表面に界面活性剤又は表面活性化剤等を塗布しておくことも可能である。 In the joining step, the first member to be joined and the second member to be joined can be pressed in a direction in which they face each other. However, it is also possible to obtain a sufficient joining strength without applying any pressure. One of the advantages. In the firing, the temperature can be raised or lowered stepwise. The surface of the member to be joined may be previously coated with a surfactant or a surface activator.
上記「塗布」とは、接合用組成物を面状に塗布する場合も線状に塗布(描画)する場合も含む概念である。加熱により焼成される前の状態の接合用組成物からなる塗膜の形状は、所望する形状にすることが可能である。したがって、接合用組成物を焼成することで得られる焼結体(接合層)の形状は、面状であってもよいし、線状であってもよい。これら面状の接合層及び線状の接合層は、連続していても不連続であってもよく、連続する部分と不連続の部分とを含んでいてもよい。 The term “coating” is a concept that includes a case where the bonding composition is applied in a plane and a case where the bonding composition is applied (drawn) in a linear manner. The shape of the coating film made of the bonding composition before being fired by heating can be a desired shape. Therefore, the shape of the sintered body (bonding layer) obtained by firing the bonding composition may be planar or linear. These planar bonding layer and linear bonding layer may be continuous or discontinuous, and may include a continuous portion and a discontinuous portion.
上記第1の被接合部材及び第2の被接合部材としては、接合用組成物を塗布して加熱により焼成して接合することのできるものであればよく、特に制限はないが、接合時の温度により損傷しない程度の耐熱性を具備した部材であるのが好ましい。 The first member to be joined and the second member to be joined are not particularly limited as long as they can be joined by applying a bonding composition and firing the mixture by heating. It is preferable that the member has heat resistance enough not to be damaged by temperature.
上記第1及び第2の被接合部材を構成する材料としては、例えば、ポリエチレンテレフタレート(PET)、ポリブチレンテレフタレート(PBT)、ポリエチレンナフタレート(PEN)等のポリエステルや、ポリアミド(PA)、ポリイミド(PI)、ポリアミドイミド(PAI)、ポリカーボネート(PC)、ポリエーテルスルホン(PES)、ビニル樹脂、フッ素樹脂、液晶ポリマー、セラミクス、ガラス又は金属等を挙げることができる。 Examples of the material forming the first and second members to be joined include polyester such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), and polyethylene naphthalate (PEN), polyamide (PA), and polyimide ( PI), polyamide imide (PAI), polycarbonate (PC), polyether sulfone (PES), vinyl resin, fluororesin, liquid crystal polymer, ceramics, glass or metal.
上記第1及び第2の被接合部材は、例えば板状又はストリップ状等の種々の形状であってよく、リジッドでもフレキシブルでもよい。上記第1及び第2の被接合部材の厚さも適宜選択することができる。接着性若しくは密着性の向上又はその他の目的のために、表面層が形成された部材や親水化処理等の表面処理を施した部材を上記第1及び第2の被接合部材として用いてもよい。 The first and second members to be joined may have various shapes such as a plate shape or a strip shape, and may be rigid or flexible. The thicknesses of the first and second members to be joined can also be appropriately selected. A member having a surface layer formed thereon or a member having been subjected to a surface treatment such as a hydrophilization treatment may be used as the first and second members to be joined for the purpose of improving adhesion or adhesion, or for other purposes. .
上記第1及び第2の被接合部材としては、樹脂基板、金属板、LED等の発光素子、半導体チップ、電子回路が形成されたセラミック基板等が挙げられ、その被接合部材の表面が、無垢の銅の他、金や銀といった金属であるものに対して好適に用いることができる。 Examples of the first and second members to be joined include a resin substrate, a metal plate, a light emitting element such as an LED, a semiconductor chip, a ceramic substrate on which an electronic circuit is formed, and the like. In addition to copper, it can be suitably used for metals such as gold and silver.
接合用組成物を被接合部材に塗布する工程としては、種々の方法を用いることができ、例えば、ディッピング、スクリーン印刷、スプレー式、バーコート式、スピンコート式、インクジェット式、ディスペンサー式、ピントランスファー法、スタンピング法、刷毛による塗布方式、流延式、フレキソ式、グラビア式、オフセット法、転写法、親疎水パターン法、シリンジ式、ピン転写又はステンシル印刷等を用いることができる。なかでも、本発明の接合用組成物は、固形分濃度が高いため、ディスペンサー式、ピン転写、ステンシル印刷にも好適に用いることができる。 Various methods can be used for applying the bonding composition to the members to be bonded, and examples thereof include dipping, screen printing, spraying, bar coating, spin coating, ink jet, dispenser, and pin transfer. Method, stamping method, coating method using a brush, casting method, flexo method, gravure method, offset method, transfer method, hydrophilic / hydrophobic pattern method, syringe method, pin transfer, stencil printing and the like can be used. In particular, the bonding composition of the present invention has a high solid content concentration, and thus can be suitably used for dispensers, pin transfer, and stencil printing.
上記焼成を行う方法は特に限定されるものではなく、例えば従来公知のオーブン等を用いて、被接合部材上に塗布または描画した上記接合用組成物の温度が、例えば300℃以下となるように焼成することによって接合することができる。上記焼成の温度の下限は必ずしも限定されず、被接合部材同士を接合できる温度であって、かつ、本発明の効果を損なわない範囲の温度であることが好ましい。上記焼成の温度の下限は、例えば、230℃である。 The method of performing the baking is not particularly limited, for example, using a conventionally known oven or the like, so that the temperature of the bonding composition applied or drawn on the member to be bonded is, for example, 300 ° C. or less. It can be joined by firing. The lower limit of the firing temperature is not necessarily limited, and is preferably a temperature at which members to be bonded can be bonded to each other, and a temperature within a range that does not impair the effects of the present invention. The lower limit of the firing temperature is, for example, 230 ° C.
上記焼成を行う環境は、大気雰囲気下でも不活性雰囲気下でもよいが、不活性雰囲気下で好適に焼成することができる。特に無垢の銅を表面に有する被接合部材の接合を行う場合は、窒素雰囲気下で焼成されることが好ましい。 The environment in which the above-described firing is performed may be either an air atmosphere or an inert atmosphere, but the firing can be suitably performed in an inert atmosphere. In particular, when joining members to be joined having pure copper on the surface, firing is preferably performed in a nitrogen atmosphere.
なお、本発明の接合用組成物は、従来のエポキシ樹脂等の熱硬化を利用し、焼成後の接合強度を得るものとは異なり、上述したように金属粒子の焼結によって充分な接合強度が得られるものである。そのため、接合後において、接合温度よりも高温の使用環境に置かれて、残存した有機物が劣化したり、分解・消失した場合であっても、接合強度の低下するおそれはなく、耐熱性に優れている。 In addition, the bonding composition of the present invention utilizes a conventional thermosetting of an epoxy resin or the like, and is different from one that obtains bonding strength after firing. As described above, sufficient bonding strength is obtained by sintering the metal particles. It is obtained. Therefore, even if the remaining organic matter is degraded or decomposed or disappears after being put in a use environment higher than the joining temperature after joining, there is no possibility that the joining strength is reduced, and the heat resistance is excellent. ing.
本発明の接合用組成物によれば、例えば、300℃以下、好ましくは275℃程度の低温加熱による焼成でも、優れた接合強度が得られるため、比較的熱に弱い被接合部材同士を接合することができる。また、焼成時間は特に限定されるものではなく、焼成温度に応じて、接合できる焼成時間であればよい。 According to the bonding composition of the present invention, for example, even when fired by heating at a low temperature of 300 ° C. or less, preferably about 275 ° C., excellent bonding strength can be obtained, and thus the members to be bonded relatively weak to heat are bonded. be able to. Further, the firing time is not particularly limited, and may be any firing time that can be joined according to the firing temperature.
本実施形態においては、上記被接合部材と接合層との密着性を更に高めるため、上記被接合部材の表面処理を行ってもよい。上記表面処理方法としては、例えば、コロナ処理、プラズマ処理、UV処理、電子線処理等のドライ処理を行う方法、基材上にあらかじめプライマー層や接合用組成物の受容層を設ける方法等が挙げられる。 In the present embodiment, the surface treatment of the member to be joined may be performed in order to further enhance the adhesion between the member to be joined and the joining layer. Examples of the surface treatment method include a method of performing a dry treatment such as a corona treatment, a plasma treatment, a UV treatment, and an electron beam treatment, and a method of previously providing a primer layer or a receiving layer of a bonding composition on a base material. Can be
以上、本発明の実施形態について説明したが、本発明はこれらのみに限定されるものではない。本発明の接合用組成物は、更に、例えば、導電性、熱伝導性、誘電性、イオン伝導性等に優れたスズドープ酸化インジウム、アルミナ、チタン酸バリウム、鉄リン酸リチウム等の無機粒子を含有してもよい。 As described above, the embodiments of the present invention have been described, but the present invention is not limited thereto. The bonding composition of the present invention further contains, for example, inorganic particles such as tin-doped indium oxide, alumina, barium titanate, and lithium iron phosphate having excellent conductivity, heat conductivity, dielectric properties, and ion conductivity. May be.
以下、本発明について実施例を掲げて更に詳しく説明するが、本発明はこれらの実施例のみに限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to only these Examples.
(実施例1)
<銀微粒子Aの調製>
3-メトキシプロピルアミン(沸点116℃)3.0gをマグネティックスターラーで充分に攪拌しながらシュウ酸銀3.0gを添加し、増粘させた。得られた粘性物質を100℃の恒温層に入れ、約15分間反応させた。さらにそこへドデシルアミン(沸点249℃)を20g添加して同温度で15分間反応させた。
(Example 1)
<Preparation of silver fine particles A>
While sufficiently stirring 3.0 g of 3-methoxypropylamine (boiling point: 116 ° C.) with a magnetic stirrer, 3.0 g of silver oxalate was added to increase the viscosity. The obtained viscous substance was put in a thermostat at 100 ° C. and reacted for about 15 minutes. Further, 20 g of dodecylamine (boiling point: 249 ° C.) was added thereto and reacted at the same temperature for 15 minutes.
反応後の懸濁液の分散媒を置換するため、メタノール10mlを当該懸濁液に加えて攪拌後、遠心分離により銀微粒子Aを沈殿させて分離し、上澄みを捨てた。分離した銀微粒子Aに対して再度メタノール10mlを加え、攪拌及び遠心分離を行うことで銀微粒子Aを沈殿させて分離した。 In order to replace the dispersion medium of the suspension after the reaction, 10 ml of methanol was added to the suspension, followed by stirring. Then, silver fine particles A were precipitated and separated by centrifugation, and the supernatant was discarded. 10 ml of methanol was again added to the separated silver fine particles A, and the mixture was stirred and centrifuged to precipitate and separate the silver fine particles A.
<銀微粒子Bの調製>
ジグリコールアミン6.0gをマグネティックスターラーで充分に攪拌しながらシュウ酸銀3.0gを添加し、増粘させた。得られた粘性物質を100℃の恒温層に入れ、約15分間反応させた。そこへドデシルアミン(沸点249℃)を20g添加して同温度で15分間反応させた。
<Preparation of silver fine particles B>
While sufficiently stirring 6.0 g of diglycolamine with a magnetic stirrer, 3.0 g of silver oxalate was added to increase the viscosity. The obtained viscous substance was put in a thermostat at 100 ° C. and reacted for about 15 minutes. 20 g of dodecylamine (boiling point: 249 ° C.) was added thereto and reacted at the same temperature for 15 minutes.
反応後の懸濁液の分散媒を置換するため、メタノール10mlを当該懸濁液に加えて攪拌後、遠心分離により銀微粒子Bを沈殿させて分離し、上澄みを捨てた。分離した銀微粒子Bに対して再度メタノール10mlを加え、攪拌及び遠心分離を行うことで銀微粒子Bを沈殿させて分離した。 In order to replace the dispersion medium of the suspension after the reaction, 10 ml of methanol was added to the suspension, followed by stirring. Then, silver fine particles B were precipitated and separated by centrifugation, and the supernatant was discarded. 10 ml of methanol was again added to the separated silver fine particles B, and the mixture was stirred and centrifuged to precipitate and separate the silver fine particles B.
<接合用組成物の調製>
得られた銀微粒子A及び銀微粒子Bをそれぞれ1gずつ測り取り、ここに、分散媒としてヘキシルカルビトール0.1g、ブチルカルビトールアセテート0.1g及びリノシール酸0.01gを加えて攪拌混合し、接合用組成物を得た。
<Preparation of bonding composition>
1 g of each of the obtained silver fine particles A and silver fine particles B was measured, and 0.1 g of hexyl carbitol, 0.1 g of butyl carbitol acetate, and 0.01 g of linoseal acid were added thereto as a dispersion medium, followed by stirring and mixing. A bonding composition was obtained.
上記のようにして得られた接合用組成物について下記項目を評価した。 The following items were evaluated for the bonding composition obtained as described above.
[評価試験]
(1)一次粒子の平均粒径の測定
得られた銀微粒子A及び銀微粒子Bの一次粒子の平均粒子径を、走査型電子顕微鏡(日立ハイテクノロジーズ製、S-4800)を用いて撮影した写真から、ランダムに選択した200個程度の一次粒子の粒径を画像処理ソフトWinROOF(MITANI CORPORATION製)にて測定して算出した。
得られた結果を下記表1に示す。
[Evaluation test]
(1) Measurement of Average Particle Size of Primary Particles Photograph of the average particle diameter of the primary particles of the obtained silver fine particles A and silver fine particles B taken with a scanning electron microscope (S-4800, manufactured by Hitachi High-Technologies Corporation). Then, the particle diameter of about 200 randomly selected primary particles was measured and calculated using image processing software WinROOF (manufactured by Mitani Corporation).
The results obtained are shown in Table 1 below.
(2)接合強度測定
得られた接合用組成物を無垢の無酸素銅板(20mm角)にメタルマスクを用いて6mm角に塗布し、予備乾燥として70℃に設定したオーブンに入れて30分間乾燥させた。乾燥させた該接合用組成物の上に、金メッキを施したSiチップ(底面積5mm×5mm)を積層し、0.2MPaで押し付けた。
(2) Measurement of bonding strength The obtained bonding composition was applied to a 6 mm square using a metal mask on a pure oxygen-free copper plate (20 mm square), and was dried in an oven set at 70 ° C for 30 minutes as preliminary drying. I let it. A gold-plated Si chip (bottom area 5 mm × 5 mm) was laminated on the dried bonding composition and pressed at 0.2 MPa.
得られた積層体をリフロー炉((株)シンアペックス製)に入れ、窒素を流し、酸素濃度300ppmになったところで室温から昇温速度3.8℃/minで最大温度275℃まで昇温した後、60分間保持し焼成処理を行った。焼成処理の際、加圧は行わず無添加で行い、窒素は流し続けた。自然冷却し積層体を取り出した。 The obtained laminate was placed in a reflow furnace (manufactured by Shin Apex Co., Ltd.), and nitrogen was flowed. When the oxygen concentration reached 300 ppm, the temperature was raised from room temperature to a maximum temperature of 275 ° C. at a rate of 3.8 ° C./min. After that, it was kept for 60 minutes to perform a baking treatment. At the time of the calcination treatment, no pressure was applied and the addition was performed without addition, and nitrogen was kept flowing. After natural cooling, the laminate was taken out.
得られた積層体に対し、常温にて100kgfのロードセルのボンドテスター((株)レスカ製)を用いて接合強度試験を行った。なお、5mm角のチップかつ100kgfのロードセルの場合、接合強度の上限は40MPaとなる。
得られた結果を下記表1に示す。
The obtained laminate was subjected to a bonding strength test at room temperature using a 100 kgf load cell bond tester (manufactured by Resca Corporation). In the case of a 5 mm square chip and a 100 kgf load cell, the upper limit of the bonding strength is 40 MPa.
The results obtained are shown in Table 1 below.
(3)耐熱信頼性試験(-40℃/200℃ヒートサイクル試験)
得られた接合用組成物を無垢の無酸素の窒化ケイ素の銅張り基板(30mm×40mm)にメタルマスクを用いて11mm角に塗布し、予備乾燥として70℃に設定したオーブンに入れて30間乾燥させた。乾燥させた該接合用組成物の上に、金メッキを施したSiチップ(底面積10mm×10mm)を積層し、0.2MPaで押し付けた。
(3) Thermal reliability test (-40 ° C / 200 ° C heat cycle test)
The obtained bonding composition is applied to an 11 mm square using a metal mask on a pure oxygen-free silicon nitride copper-clad substrate (30 mm × 40 mm), and placed in an oven set at 70 ° C. for preliminary drying for 30 minutes. Let dry. A gold-plated Si chip (bottom area 10 mm × 10 mm) was laminated on the dried bonding composition, and pressed at 0.2 MPa.
得られた積層体をリフロー炉((株)シンアペックス製)に入れ、窒素を流し、酸素濃度300ppmになったところで室温から昇温速度3.8℃/minで最大温度275℃まで昇温した後、60分間保持し焼成処理を行った。焼成処理の際、加圧は行わず無添加で行い、窒素は流し続けた。自然冷却し積層体を取り出した。 The obtained laminate was put into a reflow furnace (manufactured by Shin Apex Co., Ltd.), and nitrogen was flowed. When the oxygen concentration reached 300 ppm, the temperature was raised from room temperature to a maximum temperature of 275 ° C. at a rate of 3.8 ° C./min. After that, it was kept for 60 minutes to perform a baking treatment. At the time of the calcination treatment, no pressure was applied and the addition was performed without addition, and nitrogen was kept flowing. After natural cooling, the laminate was taken out.
得られた積層体を冷熱衝撃試験機((株)ヒューテック製)に入れ、大気雰囲気で-40℃と200℃とでそれぞれ10分間キープするサイクルを、任意のサイクル数で取り出した。1000サイクル後に0サイクルに対してボイド率が50%以上増加した場合を「×」、10%より大きく50%未満増加した場合を「△」、10%以下の増加であり変化していないと判断できる場合を「〇」と判定した。得られた結果を下記表1に示す。 The obtained laminate was placed in a thermal shock tester (manufactured by Hutec Co., Ltd.), and cycles of keeping at -40 ° C. and 200 ° C. for 10 minutes in an air atmosphere were taken out at an arbitrary number of cycles. “X” when the void ratio increased by 50% or more with respect to 0 cycle after 1000 cycles was “X”, and when the void ratio increased more than 10% and less than 50% was “Δ”, it was judged that the increase was 10% or less and did not change. When it was possible, it was judged as "〇". The results obtained are shown in Table 1 below.
なお、ボイド率は、日本クラウトクレーマー(株)製の超音波探傷装置(探触子80MHz・φ3mm・PF=10mm)にて評価した。接合界面での反射ピークが最も高くなるところに微調整し、材質音速=Si:9600mm/sとして測定した。 The void fraction was evaluated with an ultrasonic flaw detector (probe 80 MHz, φ3 mm, PF = 10 mm) manufactured by Nippon Clout Kramer Co., Ltd. Fine adjustment was made so that the reflection peak at the bonding interface became the highest, and the measurement was performed with the material sound velocity = Si: 9600 mm / s.
(4)空隙率の測定
上記(3)で作製した耐熱信頼性試験前の積層体の接合部分を研磨した後、イオンミリングにて断面出しを行った。その後、走査電子顕微鏡(日立ハイテクノロジーズ製、S-4800)にて断面観察を行った。断面観察した電子顕微鏡写真から該接合用組成物が焼結した層の空隙の面積を、該接合用組成物が焼結した層の全体面積で割って空隙率を算出した(画像処理ソフトWinROOF(MITANI CORPORATION製)にて測定し算出した)。空隙率が10%以下の場合を「〇」、空隙率が11~20%の場合を「△」、空隙率が20%以上の場合、及び、大きな空隙が存在したり、接合した界面が剥離したりしているものは「×」とした。
得られた結果を下記表1に示す。
(4) Measurement of porosity The bonded portion of the laminate before the heat resistance test prepared in the above (3) was polished, and a cross section was formed by ion milling. Thereafter, the cross section was observed with a scanning electron microscope (S-4800, manufactured by Hitachi High-Technologies Corporation). The porosity was calculated by dividing the area of the voids of the layer where the bonding composition was sintered by the total area of the layer where the bonding composition was sintered from the electron micrograph of the cross-sectional observation (image processing software WinROOF ( MITANI CORPORATION). "〇" when the porosity is 10% or less, "△" when the porosity is 11 to 20%, when the porosity is 20% or more, and when a large void exists or the bonded interface is peeled off. Those who do are marked "x".
The results obtained are shown in Table 1 below.
(実施例2)
接合用組成物の調製で用いる銀微粒子A及び銀微粒子Bの量を、銀微粒子Aを0.8g、銀微粒子Bを1.2gに変更したこと以外は実施例1と同様にして接合用組成物を調製し、実施例1と同様の評価試験を行った。得られた結果を下記表1に示す。
(Example 2)
Except that the amounts of silver fine particles A and silver fine particles B used in the preparation of the bonding composition were changed to 0.8 g for silver fine particles A and 1.2 g for silver fine particles B, the composition for bonding was the same as in Example 1. The product was prepared and the same evaluation test as in Example 1 was performed. The results obtained are shown in Table 1 below.
(実施例3)
接合用組成物の調製で用いる銀微粒子A及び銀微粒子Bの量を、銀微粒子Aを1.2g、銀微粒子Bを0.8gに変更したこと以外は実施例1と同様にして接合用組成物を調製し、実施例1と同様の評価試験を行った。得られた結果を下記表1に示す。
(Example 3)
The composition for bonding was the same as in Example 1 except that the amounts of the silver fine particles A and the silver fine particles B used in the preparation of the bonding composition were changed to 1.2 g for the silver fine particles A and 0.8 g for the silver fine particles B. The product was prepared and the same evaluation test as in Example 1 was performed. The results obtained are shown in Table 1 below.
(実施例4)
銀微粒子Bの調製で用いるジグリコールアミンを6.0gから10.0gに変更したこと以外は実施例1と同様にして接合用組成物を調製し、実施例1と同様の評価試験を行った。得られた結果を下記表1に示す。
(Example 4)
A bonding composition was prepared in the same manner as in Example 1 except that the amount of diglycolamine used in the preparation of silver fine particles B was changed from 6.0 g to 10.0 g, and the same evaluation test as in Example 1 was performed. . The results obtained are shown in Table 1 below.
(実施例5)
銀微粒子Aの調製で用いる3-メトキシプロピルアミンを3.0gから9.0gに変更し、銀微粒子Bの調製で用いるジグリコールアミンを6.0gから10.0gに変更し、さらに、接合用組成物の調製で用いる銀微粒子A及び銀微粒子Bの量を、銀微粒子Aを1.4g、銀微粒子Bを0.6gに変更したこと以外は実施例1と同様にして接合用組成物を調製し、実施例1と同様の評価試験を行った。得られた結果を下記表1に示す。
(Example 5)
The amount of 3-methoxypropylamine used in the preparation of silver fine particles A was changed from 3.0 g to 9.0 g, and the amount of diglycolamine used in the preparation of silver fine particles B was changed from 6.0 g to 10.0 g. A bonding composition was prepared in the same manner as in Example 1 except that the amounts of silver fine particles A and silver fine particles B used in the preparation of the composition were changed to 1.4 g for silver fine particles A and 0.6 g for silver fine particles B. It was prepared and subjected to the same evaluation test as in Example 1. The results obtained are shown in Table 1 below.
(実施例6)
銀微粒子A及び銀微粒子Bの調製で用いたドデシルアミンをオクチルアミン(沸点176℃)に変更し、接合用組成物の調製で用いた分散媒を、ヘキシルカルビトール0.05g、ブチルカルビトールアセテート0.05g及びリシノール酸0.005gに変更したこと以外は、実施例1と同様にして接合用組成物を得た。また、上記評価試験(2)及び(3)における積層体の作製において70℃の予備乾燥を行わなかったこと以外は実施例1と同様にして評価試験を行った。得られた結果を下記表1に示す。
(Example 6)
The dodecylamine used in the preparation of the silver fine particles A and the silver fine particles B was changed to octylamine (boiling point: 176 ° C.), and the dispersion medium used in the preparation of the bonding composition was 0.05 g of hexyl carbitol, butyl carbitol acetate Except having changed to 0.05 g and ricinoleic acid 0.005 g, it carried out similarly to Example 1, and obtained the composition for joining. An evaluation test was performed in the same manner as in Example 1 except that preliminary drying at 70 ° C. was not performed in the production of the laminate in the evaluation tests (2) and (3). The results obtained are shown in Table 1 below.
(実施例7)
銀微粒子A及び銀微粒子Bの調製で用いたドデシルアミンをオクチルアミン(沸点176℃)に変更し、接合用組成物の調製で用いた銀微粒子A及び銀微粒子Bの量を、銀微粒子Aを1.0g、銀微粒子Bを1.0gに変更し、分散媒を、ヘキシルカルビトール0.05g、ブチルカルビトールアセテート0.05g及びリシノール酸0.005gに変更したこと以外は、実施例5と同様にして接合用組成物を得た。また、上記評価試験(2)及び(3)における積層体の作製において70℃の予備乾燥を行わなかったこと以外は実施例5と同様にして評価試験を行った。得られた結果を下記表1に示す。
(Example 7)
The dodecylamine used in the preparation of the silver fine particles A and the silver fine particles B was changed to octylamine (boiling point: 176 ° C.), and the amounts of the silver fine particles A and the silver fine particles B used in the preparation of the bonding composition were changed. Example 5 except that 1.0 g, the silver fine particles B were changed to 1.0 g, and the dispersion medium was changed to 0.05 g of hexyl carbitol, 0.05 g of butyl carbitol acetate, and 0.005 g of ricinoleic acid. Similarly, a bonding composition was obtained. The evaluation test was performed in the same manner as in Example 5 except that the preliminary drying at 70 ° C. was not performed in the production of the laminate in the evaluation tests (2) and (3). The results obtained are shown in Table 1 below.
(実施例8)
銀微粒子A及び銀微粒子Bの調製で用いたドデシルアミンを添加しなかったこと、接合用組成物の調製で用いた銀微粒子A及び銀微粒子Bの量を、銀微粒子Aを1.2g、銀微粒子Bを0.8gに変更し、分散媒を、ヘキシルカルビトール0.05g、ブチルカルビトールアセテート0.05g及びリシノール酸0.005gに変更したこと以外は、実施例5と同様にして接合用組成物を得た。また、上記評価試験(2)及び(3)における積層体の作製において70℃の予備乾燥を行わなかったこと以外は実施例5と同様にして評価試験を行った。得られた結果を下記表1に示す。
(Example 8)
The dodecylamine used in the preparation of the silver fine particles A and the silver fine particles B was not added, and the amounts of the silver fine particles A and the silver fine particles B used in the preparation of the bonding composition were as follows. Except that the fine particles B were changed to 0.8 g and the dispersion medium was changed to 0.05 g of hexyl carbitol, 0.05 g of butyl carbitol acetate, and 0.005 g of ricinoleic acid, the same procedure as in Example 5 was carried out. A composition was obtained. The evaluation test was performed in the same manner as in Example 5 except that the preliminary drying at 70 ° C. was not performed in the production of the laminate in the evaluation tests (2) and (3). The results obtained are shown in Table 1 below.
(実施例9)
銀微粒子A及び銀微粒子Bの調製で用いたドデシルアミンをオクチルアミン(沸点176℃)に変更したこと以外は実施例1と同様にして接合用組成物を得た。また、実施例1と同様にして評価試験を行った。得られた結果を下記表1に示す。
(Example 9)
A bonding composition was obtained in the same manner as in Example 1, except that dodecylamine (boiling point: 176 ° C.) was used in the preparation of silver fine particles A and silver fine particles B. An evaluation test was performed in the same manner as in Example 1. The results obtained are shown in Table 1 below.
(比較例1)
接合用組成物の調製で用いた銀微粒子Aを添加せず、銀微粒子Bの量を2.0gに変更したこと以外は実施例1と同様にして接合用組成物を調製し、実施例1と同様に評価を行った。得られた結果を下記表2に示す。
(Comparative Example 1)
A bonding composition was prepared in the same manner as in Example 1 except that the silver fine particles A used in the preparation of the bonding composition were not added and the amount of the silver fine particles B was changed to 2.0 g. The evaluation was performed in the same manner as described above. The results obtained are shown in Table 2 below.
(比較例2)
接合用組成物の調製で用いた銀微粒子Bを添加せず、銀微粒子Aの量を2.0gに変更したこと以外は実施例1と同様にして接合用組成物を調製し、実施例1と同様に評価を行った。得られた結果を下記表2に示す。
(Comparative Example 2)
Example 1 A bonding composition was prepared in the same manner as in Example 1 except that the silver fine particles B used in the preparation of the bonding composition were not added and the amount of the silver fine particles A was changed to 2.0 g. The evaluation was performed in the same manner as described above. The results obtained are shown in Table 2 below.
(比較例3)
<銀微粒子Aの調製>
3-メトキシプロピルアミン(沸点116℃)2.0gとジグリコールアミン2.0gをマグネティックスターラーで充分に攪拌しながらシュウ酸銀3.0gを添加し、増粘させた。得られた粘性物質を100℃の恒温層に入れ、約15分間反応させた。反応後の懸濁液の分散媒を置換するため、メタノール10mlを当該懸濁液に加えて攪拌後、遠心分離により銀微粒子Aを沈殿させて分離し、上澄みを捨てた。分離した銀微粒子Aに対して再度メタノール10mlを加え、攪拌及び遠心分離を行うことで銀微粒子Aを沈殿させて分離した。
(Comparative Example 3)
<Preparation of silver fine particles A>
While sufficiently stirring 2.0 g of 3-methoxypropylamine (boiling point: 116 ° C.) and 2.0 g of diglycolamine with a magnetic stirrer, 3.0 g of silver oxalate was added to increase the viscosity. The obtained viscous substance was put in a thermostat at 100 ° C. and reacted for about 15 minutes. In order to replace the dispersion medium of the suspension after the reaction, 10 ml of methanol was added to the suspension, followed by stirring. Then, silver fine particles A were precipitated and separated by centrifugation, and the supernatant was discarded. 10 ml of methanol was again added to the separated silver fine particles A, and the mixture was stirred and centrifuged to precipitate and separate the silver fine particles A.
<接合用組成物の調製>
得られた銀微粒子Aを2g測り取り、ここに、分散媒としてヘキシルカルビトール0.05g、ブチルカルビトールアセテート0.05g及びリシノール酸0.005gを加えて攪拌混合し、接合用組成物を得た。
<Preparation of bonding composition>
2 g of the obtained silver fine particles A were measured and added thereto, and 0.05 g of hexyl carbitol, 0.05 g of butyl carbitol acetate, and 0.005 g of ricinoleic acid were added thereto as a dispersion medium, followed by stirring and mixing to obtain a bonding composition. Was.
上記評価試験(2)及び(3)における積層体の作製において70℃の予備乾燥を行わなかったこと以外は実施例1と同様にして評価試験を行った。得られた結果を下記表2に示す。 The evaluation test was performed in the same manner as in Example 1 except that the preliminary drying at 70 ° C. was not performed in the production of the laminate in the evaluation tests (2) and (3). The results obtained are shown in Table 2 below.
(比較例4)
接合用組成物の調製において、銀微粒子Bとして福田金属箔粉工業製マイクロ銀粒子(平均粒径2.5μm)を用いたこと以外は実施例3と同様にして接合用組成物を調製し、実施例3と同様にして評価を行った。得られた結果を下記表2に示す。
(Comparative Example 4)
In the preparation of the bonding composition, a bonding composition was prepared in the same manner as in Example 3 except that micro silver particles (average particle size: 2.5 μm) manufactured by Fukuda Metal Foil Powder Co., Ltd. were used as the silver fine particles B. Evaluation was performed in the same manner as in Example 3. The results obtained are shown in Table 2 below.
(比較例5)
<銀微粒子Aの調製>
3-メトキシプロピルアミン(沸点116℃)3.0gをマグネティックスターラーで充分に攪拌しながらシュウ酸銀3.0gを添加し、増粘させた。得られた粘性物質を100℃の恒温層に入れ、約15分間反応させた。さらにそこへレブリン酸10gを添加して同温度で15分間反応させた。反応後の懸濁液の分散媒を置換するため、メタノール10mlを当該懸濁液に加えて攪拌後、遠心分離により銀微粒子Aを沈殿させて分離し、上澄みを捨てた。分離した銀微粒子Aに対して再度メタノール10mlを加え、攪拌及び遠心分離を行うことで銀微粒子Aを沈殿させて分離した。得られた銀微粒子Aは、レブリン酸で被覆されており、3-メトキシプロピルアミンによる被覆はされていなかった。
(Comparative Example 5)
<Preparation of silver fine particles A>
While sufficiently stirring 3.0 g of 3-methoxypropylamine (boiling point: 116 ° C.) with a magnetic stirrer, 3.0 g of silver oxalate was added to increase the viscosity. The obtained viscous substance was put in a thermostat at 100 ° C. and reacted for about 15 minutes. Further, 10 g of levulinic acid was added thereto and reacted at the same temperature for 15 minutes. In order to replace the dispersion medium of the suspension after the reaction, 10 ml of methanol was added to the suspension, followed by stirring. Then, silver fine particles A were precipitated and separated by centrifugation, and the supernatant was discarded. 10 ml of methanol was again added to the separated silver fine particles A, and the mixture was stirred and centrifuged to precipitate and separate the silver fine particles A. The obtained silver fine particles A were coated with levulinic acid, and were not coated with 3-methoxypropylamine.
<銀微粒子Bの調製>
ジグリコールアミン6.0gをマグネティックスターラーで充分に攪拌しながらシュウ酸銀3.0gを添加し、増粘させた。得られた粘性物質を100℃の恒温層に入れ、約15分間反応させた。反応後の懸濁液の分散媒を置換するため、メタノール10mlを当該懸濁液に加えて攪拌後、遠心分離により銀微粒子Bを沈殿させて分離し、上澄みを捨てた。分離した銀微粒子Bに対して再度メタノール10mlを加え、攪拌及び遠心分離を行うことで銀微粒子Bを沈殿させて分離した。
<Preparation of silver fine particles B>
While sufficiently stirring 6.0 g of diglycolamine with a magnetic stirrer, 3.0 g of silver oxalate was added to increase the viscosity. The obtained viscous substance was put in a thermostat at 100 ° C. and reacted for about 15 minutes. In order to replace the dispersion medium of the suspension after the reaction, 10 ml of methanol was added to the suspension, followed by stirring. Then, silver fine particles B were precipitated and separated by centrifugation, and the supernatant was discarded. 10 ml of methanol was again added to the separated silver fine particles B, and the mixture was stirred and centrifuged to precipitate and separate the silver fine particles B.
<接合用組成物の調製>
得られた銀微粒子Aを0.8g、銀微粒子Bを1.2g測り取り、ここに、分散媒としてヘキシルカルビトール0.1g、ブチルカルビトールアセテート0.1g及びリシノール酸0.01gを加えて攪拌混合し、接合用組成物を得た。
得られた接合用組成物に対し、実施例1と同様にして評価試験を行った。得られた結果を下記表2に示す。
<Preparation of bonding composition>
0.8 g of the obtained silver fine particles A and 1.2 g of the silver fine particles B were measured, and 0.1 g of hexyl carbitol, 0.1 g of butyl carbitol acetate, and 0.01 g of ricinoleic acid were added thereto as a dispersion medium. The mixture was stirred and mixed to obtain a bonding composition.
An evaluation test was performed on the obtained bonding composition in the same manner as in Example 1. The results obtained are shown in Table 2 below.
(比較例6)
<銀微粒子Aの調製>
3-メトキシプロピルアミン(沸点116℃)3.0gと、ドデシルアミン(沸点249℃)20gと、をマグネティックスターラーで充分に攪拌しながらシュウ酸銀3.0gを添加し、増粘させた。得られた粘性物質を100℃の恒温層に入れ、約15分間反応させた。反応後の懸濁液の分散媒を置換するため、メタノール10mlを当該懸濁液に加えて攪拌後、遠心分離により銀微粒子Aを沈殿させて分離し、上澄みを捨てた。分離した銀微粒子Aに対して再度メタノール10mlを加え、攪拌及び遠心分離を行うことで銀微粒子Aを沈殿させて分離した。
(Comparative Example 6)
<Preparation of silver fine particles A>
3.0 g of silver oxalate was added while sufficiently stirring 3.0 g of 3-methoxypropylamine (boiling point: 116 ° C.) and 20 g of dodecylamine (boiling point: 249 ° C.) with a magnetic stirrer to increase the viscosity. The obtained viscous substance was put in a thermostat at 100 ° C. and reacted for about 15 minutes. In order to replace the dispersion medium of the suspension after the reaction, 10 ml of methanol was added to the suspension, followed by stirring. Then, silver fine particles A were precipitated and separated by centrifugation, and the supernatant was discarded. 10 ml of methanol was again added to the separated silver fine particles A, and the mixture was stirred and centrifuged to precipitate and separate the silver fine particles A.
<銀微粒子Bの調製>
3-メトキシプロピルアミン(沸点116℃)5.0gと、ドデシルアミン(沸点249℃)0.5gと、ジグリコールアミン6.0gと、をマグネティックスターラーで充分に攪拌しながらシュウ酸銀3.0gを添加し、増粘させた。得られた粘性物質を100℃の恒温層に入れ、約15分間反応させた。反応後の懸濁液の分散媒を置換するため、メタノール10mlを当該懸濁液に加えて攪拌後、遠心分離により銀微粒子Bを沈殿させて分離し、上澄みを捨てた。分離した銀微粒子Bに対して再度メタノール10mlを加え、攪拌及び遠心分離を行うことで銀微粒子Bを沈殿させて分離した。
<Preparation of silver fine particles B>
3.0 g of silver oxalate was sufficiently stirred with 5.0 g of 3-methoxypropylamine (boiling point: 116 ° C.), 0.5 g of dodecylamine (boiling point: 249 ° C.), and 6.0 g of diglycolamine with a magnetic stirrer. Was added to increase the viscosity. The obtained viscous substance was put in a thermostat at 100 ° C. and reacted for about 15 minutes. In order to replace the dispersion medium of the suspension after the reaction, 10 ml of methanol was added to the suspension, followed by stirring. Then, silver fine particles B were precipitated and separated by centrifugation, and the supernatant was discarded. 10 ml of methanol was again added to the separated silver fine particles B, and the mixture was stirred and centrifuged to precipitate and separate the silver fine particles B.
<接合用組成物の調製>
得られた銀微粒子Aと銀微粒子Bとをそれぞれ1.0gずつ測り取り、ここに、分散媒としてヘキシルカルビトール0.1g、ブチルカルビトールアセテート0.1g及びリシノール酸0.01gを加えて攪拌混合し、接合用組成物を得た。
得られた接合用組成物に対し、実施例1と同様にして評価試験を行った。得られた結果を下記表2に示す。
<Preparation of bonding composition>
1.0 g of each of the obtained silver fine particles A and silver fine particles B was measured, and 0.1 g of hexyl carbitol, 0.1 g of butyl carbitol acetate, and 0.01 g of ricinoleic acid were added thereto as a dispersion medium, followed by stirring. By mixing, a bonding composition was obtained.
An evaluation test was performed on the obtained bonding composition in the same manner as in Example 1. The results obtained are shown in Table 2 below.
(比較例7)
接合用組成物の調製において、分散媒としてリシノール酸を加えなかったこと以外は実施例1と同様にして接合用組成物を調製し、実施例1と同様にして評価試験を行った。得られた結果を下記表2に示す。
(Comparative Example 7)
In the preparation of the bonding composition, a bonding composition was prepared in the same manner as in Example 1 except that ricinoleic acid was not added as a dispersion medium, and an evaluation test was performed in the same manner as in Example 1. The results obtained are shown in Table 2 below.
(実施例10)
接合用組成物の調製で用いた銀微粒子A及び銀微粒子Bの量を、銀微粒子A0.8g、銀微粒子B1.2gに変更したこと以外は、実施例8と同様にして接合用組成物を得た。また、実施例8と同様にして評価試験を行った。得られた結果を下記表3に示す。
(Example 10)
Except that the amounts of silver fine particles A and silver fine particles B used in the preparation of the bonding composition were changed to 0.8 g of silver fine particles A and 1.2 g of silver fine particles B, the bonding composition was prepared in the same manner as in Example 8. Obtained. An evaluation test was performed in the same manner as in Example 8. The results obtained are shown in Table 3 below.
(実施例11)
銀微粒子Bとして、実施例1の銀微粒子Bの調製方法においてドデシルアミンを添加せずに合成したものを用いたことと、分散媒を2-エチル-1,3-ヘキサンジオール0.05g、ブチルカルビトールアセテート0.05g、リシノール酸0.005gに変更したこと以外は実施例10と同様にして接合用組成物を得た。また、実施例10と同様にして評価試験を行った。得られた結果を下記表3に示す。
(Example 11)
As the silver fine particles B, those prepared by adding the dodecylamine in the preparation method of the silver fine particles B in Example 1 were used, and the dispersion medium was 2-ethyl-1,3-hexanediol 0.05 g, butyl A bonding composition was obtained in the same manner as in Example 10, except that carbitol acetate was changed to 0.05 g and ricinoleic acid to 0.005 g. An evaluation test was performed in the same manner as in Example 10. The results obtained are shown in Table 3 below.
(実施例12)
銀微粒子Bとして、実施例1の銀微粒子Bの調製方法においてドデシルアミンを添加せずに合成したものを用いたことと、接合用組成物の調製で用いた銀微粒子A及び銀微粒子Bの量を、銀微粒子A0.4g、銀微粒子B1.6gに変更したこと以外は、実施例8と同様にして接合用組成物を得た。また、実施例8と同様にして評価試験を行った。得られた結果を下記表3に示す。
(Example 12)
As the silver fine particles B, those prepared in the preparation method of the silver fine particles B of Example 1 without adding dodecylamine were used, and the amounts of the silver fine particles A and the silver fine particles B used in the preparation of the bonding composition Was changed to 0.4 g of silver fine particles A and 1.6 g of silver fine particles B in the same manner as in Example 8 to obtain a bonding composition. An evaluation test was performed in the same manner as in Example 8. The results obtained are shown in Table 3 below.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
上記表1~3の結果から、特定の第一級アミンに被覆されており平均粒径が45~75nmである銀微粒子A、及び、特定の第一級アミンに被覆されており平均粒径が200~550nmである銀微粒子Bを含み、さらに、分散媒として不飽和炭化水素(リシノール酸)を含む実施例1~12は、40MPa以上の高い接合強度を有し、空隙率が10%以下の高密度接合層が形成されており、耐熱信頼性が充分に高いものであった。 From the results of Tables 1 to 3 above, it is found that silver fine particles A coated with a specific primary amine and having an average particle size of 45 to 75 nm, and coated with a specific primary amine and having an average particle size of 45 to 75 nm. Examples 1 to 12 containing silver fine particles B of 200 to 550 nm and further containing an unsaturated hydrocarbon (ricinoleic acid) as a dispersion medium have high bonding strength of 40 MPa or more and a porosity of 10% or less. A high-density bonding layer was formed, and the heat resistance was sufficiently high.
一方、銀微粒子の粒子径が特定の範囲の組み合わせを満たさない比較例1~4に係る接合用組成物は、接合強度、空隙率及び耐熱信頼性のいずれかが劣るものであり、全てを満たした接合用組成物は得られなかった。 On the other hand, the bonding compositions according to Comparative Examples 1 to 4 in which the particle diameter of the silver fine particles does not satisfy the combination in the specific range are inferior in any of the bonding strength, the porosity, and the heat resistance reliability. No joining composition was obtained.
また、銀微粒子として、特定の第一級アミンに被覆されていない銀微粒子A及びBを用いた比較例5に係る接合用組成物は、接合強度、空隙率及び耐熱信頼性のいずれもが劣るものであった。 In addition, the bonding composition according to Comparative Example 5 using silver fine particles A and B not coated with a specific primary amine as silver fine particles is inferior in any of bonding strength, porosity, and heat resistance reliability. Was something.
また、比較例6に係る接合用組成物は、銀微粒子として、特定の第一級アミンを一部に含むが、その含有量により加熱前の錯化合物が異なってくるため、銀微粒子Aの粒径が小さくなった。そのため、比較例6に係る接合用組成物は、接合強度、空隙率及び耐熱信頼性のいずれもが劣るものであった。 Further, the bonding composition according to Comparative Example 6 partially contained a specific primary amine as silver fine particles, but the complex compound before heating varied depending on the content thereof. The diameter has become smaller. Therefore, the bonding composition according to Comparative Example 6 was inferior in all of the bonding strength, porosity, and heat resistance reliability.
分散媒に不飽和炭化水素(リシノール酸)を含まない比較例7に係る接合用組成物は、接合強度、空隙率及び耐熱信頼性のいずれもが劣るものであった。 The bonding composition according to Comparative Example 7 containing no unsaturated hydrocarbon (ricinoleic acid) in the dispersion medium was inferior in all of the bonding strength, the porosity, and the heat resistance reliability.

Claims (7)

  1. 第一級アミンで被覆されている銀微粒子と、分散媒とを含有する接合用組成物であって、
    前記第一級アミンは、炭素数が4~12、かつ、沸点が300℃以下であり、
    前記銀微粒子は、平均粒径が45~75nmである第一の銀微粒子と、平均粒径が200~550nmである第二の銀微粒子とを含み、
    前記分散媒は、不飽和炭化水素を含むことを特徴とする接合用組成物。
    A bonding composition containing silver fine particles coated with a primary amine and a dispersion medium,
    The primary amine has 4 to 12 carbon atoms and a boiling point of 300 ° C. or less;
    The silver fine particles include first silver fine particles having an average particle size of 45 to 75 nm, and second silver fine particles having an average particle size of 200 to 550 nm,
    The joining composition, wherein the dispersion medium contains an unsaturated hydrocarbon.
  2. 前記第二の銀微粒子は、前記第一の銀微粒子とは異なる銀錯化合物から形成されたものであることを特徴とする請求項1に記載の接合用組成物。 The bonding composition according to claim 1, wherein the second silver fine particles are formed from a silver complex compound different from the first silver fine particles.
  3. 前記第一の銀微粒子と前記第二の銀微粒子との重量比率は、4:6~7:3であることを特徴とする請求項1又は2に記載の接合用組成物。 3. The bonding composition according to claim 1, wherein a weight ratio of the first silver fine particles to the second silver fine particles is from 4: 6 to 7: 3.
  4. 前記分散媒は、水酸基を有する有機溶剤を少なくとも含むことを特徴とする請求項1~3のいずれかに記載の接合用組成物。 4. The bonding composition according to claim 1, wherein the dispersion medium contains at least an organic solvent having a hydroxyl group.
  5. 前記不飽和炭化水素は、リシノール酸であることを特徴とする請求項1~4のいずれかに記載の接合用組成物。 The bonding composition according to any one of claims 1 to 4, wherein the unsaturated hydrocarbon is ricinoleic acid.
  6. 高分子分散剤を含まないことを特徴とする請求項1~5のいずれかに記載の接合用組成物。 The bonding composition according to any one of claims 1 to 5, wherein the composition does not contain a polymer dispersant.
  7. 前記接合用組成物を275℃で加熱焼成して得られる接合層の空隙率が10%以下であることを特徴とする請求項1~6のいずれかに記載の接合用組成物。 The bonding composition according to any one of claims 1 to 6, wherein a porosity of a bonding layer obtained by heating and baking the bonding composition at 275 ° C is 10% or less.
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