WO2020010641A1 - 一种多列多排等效负折射率平板透镜的加工工艺 - Google Patents

一种多列多排等效负折射率平板透镜的加工工艺 Download PDF

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WO2020010641A1
WO2020010641A1 PCT/CN2018/095949 CN2018095949W WO2020010641A1 WO 2020010641 A1 WO2020010641 A1 WO 2020010641A1 CN 2018095949 W CN2018095949 W CN 2018095949W WO 2020010641 A1 WO2020010641 A1 WO 2020010641A1
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row
parallel
refractive index
negative refractive
rectangular
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PCT/CN2018/095949
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English (en)
French (fr)
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范超
韩东成
张亮亮
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安徽省东超科技有限公司
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Application filed by 安徽省东超科技有限公司 filed Critical 安徽省东超科技有限公司
Priority to JP2021500934A priority Critical patent/JP7097501B2/ja
Priority to EP18925794.2A priority patent/EP3805815B1/en
Publication of WO2020010641A1 publication Critical patent/WO2020010641A1/zh
Priority to US17/142,584 priority patent/US11092888B2/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00663—Production of light guides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
    • G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
    • G02B30/26—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/136—Reflex reflectors plural reflecting elements forming part of a unitary body
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G02B1/007—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of negative effective refractive index materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
    • G02B30/50—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images the image being built up from image elements distributed over a 3D volume, e.g. voxels
    • G02B30/56—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images the image being built up from image elements distributed over a 3D volume, e.g. voxels by projecting aerial or floating images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Definitions

  • the invention belongs to the field of optical manufacturing, and in particular relates to a processing technology of multiple-row and multi-row equivalent negative refractive index flat plate lenses for realizing air imaging.
  • the existing imaging technology mainly uses lens imaging, which is mainly limited by the field of view and aperture. It has optical aberrations such as spherical aberration, coma, astigmatism, field curvature, distortion, and chromatic aberration.
  • the large-aperture imaging display field is relatively limited.
  • most of the existing naked-eye three-dimensional display technologies are based on adjusting the parallax of the left and right eyes to realize three-dimensional senses, rather than the actual three-dimensional display technology.
  • the holographic imaging technology has high production cost.
  • the present invention provides a processing technology for an equivalent negative refractive index flat lens capable of realizing three-dimensional stereoscopic imaging display, and an equivalent negative refractive index flat lens for realizing three-dimensional naked eye display.
  • the parallelism of each surface is inconsistent, resulting in a multi-column multi-row equivalent for three-dimensional imaging after cutting.
  • the rows and columns of the negative refractive index flat lens are irregularly arranged, which makes the directions of the deflections of the light rays of the square waveguides inconsistent, resulting in shearing of various regions of the image; it is difficult to achieve clear three-dimensional imaging.
  • the present invention provides a processing technology of multiple columns and rows of equivalent negative refractive index flat plate lenses, which can greatly reduce individual differences existing in traditional processing of strip optical waveguides, and realize a spliced array.
  • the technical solution of the present invention is:
  • a processing technology of a multi-row and multi-row equivalent negative refractive index flat lens includes:
  • the exposed and unexposed blocks of the exposure process are rectangular. All rectangular The diagonal sides are respectively parallel to the edges of the parallel flat plates, and the exposed blocks and the unexposed blocks are arranged at oblique crossing intervals;
  • the sizes of the exposed blocks and the unexposed blocks in the step (2) are: 0.01 mm ⁇ length / width ⁇ 2 mm.
  • the protective layer in the step (4) is resin or photoresist.
  • the reflective film is an aluminum film.
  • the filling material in the step (5) is resin or optical glass.
  • a light-sensitive adhesive or a heat-sensitive adhesive is used between the new parallel flat plate and the protective window.
  • FIG. 1 provides a schematic structural diagram of a multi-row and multi-row equivalent negative refractive index flat lens obtained by using the present invention.
  • the flat lens includes a pair of glass windows (1, 3) having two optical surfaces, and An optical waveguide assembly (2) between two glass windows, the optical waveguide assembly includes a plurality of rows and rows of rectangular optical waveguide arrays arranged at a 45 ° oblique direction, and an edge optical waveguide placed on a periphery of the rectangular optical waveguide array, The individual rectangular optical waveguides of each column and / or each row of the rectangular optical waveguide array are the same size.
  • This kind of flat lens can make two-dimensional or three-dimensional light source directly into the real image in the air and realize a true holographic image, while realizing a large field of view, large aperture, high resolution, no distortion, no dispersion, and the naked eye three-dimensional three-dimensional display characteristics .
  • the beneficial effect of the present invention is that the present invention can greatly reduce the individual differences between traditionally processed strip-shaped optical waveguides, and adopts photolithography to process them, so that the size of each unit is processed uniformly, the error is small, and the system is avoided. Assembly error.
  • the processing size of each imaging unit of the flat lens can be reduced to the order of micrometers, which can greatly improve the imaging resolution of the flat lens.
  • the system processing error is extremely small, the imaging distortion is extremely small, the three-dimensional stereo display characteristics and the naked-eye three-dimensional holographic display requirements are achieved, and the purpose of clear three-dimensional imaging of the stitching array is truly achieved.
  • FIG. 1 is a schematic structural diagram of a multi-row and multi-row equivalent negative refractive index flat lens obtained by using the present invention, in which 1-first glass window, 2-optical waveguide assembly, 3-second glass window.
  • Embodiment 2 is a schematic structural diagram of a square flat plate in Embodiment 1 of the present invention, in which 4-flat thickness, 5-flat width, 6-flat length, 7-front surface, and 8-back surface.
  • FIG. 3 is a schematic diagram of the structure of the parallel plate photolithography surface after being glued in Embodiment 1 of the present invention, where 3-1 is a front view and 3-2 is a perspective view.
  • FIG. 4 is a schematic diagram of the structure of a parallel plate photolithography surface mask after exposure in Embodiment 1 of the present invention, where 4-1 is a side view, 4-2 is a top view, and 9-exposed block and unexposed block sizes.
  • FIG. 5 is a schematic structural diagram of a groove on a surface of a parallel flat plate in Embodiment 1 of the present invention, where 5-1 is a perspective view of the unexposed blocks on the parallel plate after the glue is removed, and 5-2 is a rectangular groove processed on the parallel plate. Front view, 10-groove side.
  • FIG. 6 is a schematic structural diagram of a parallel flat plate coated with a protective layer and plated with a reflective film in Embodiment 1 of the present invention, where 11-exposed block surface and 12-groove bottom surface.
  • FIG. 7 is a schematic structural diagram of a parallel flat plate after removing a protective layer in Embodiment 1 of the present invention.
  • FIG. 8 is a schematic structural diagram of a parallel flat plate groove filled in Embodiment 1 of the present invention.
  • FIG. 9 is a schematic structural diagram of a new parallel flat plate in Embodiment 1 of the present invention.
  • FIG. 10 is a schematic diagram of imaging and focusing of light reflected inside an optical waveguide, where A is an object side and B is an image side.
  • FIG. 11 is a schematic diagram of object-side light propagating to the image surface through the internal reflection of a single microlens, where 11-1 is a side view of light propagation, and 11-2 is a left side view of light propagation.
  • This embodiment provides a processing technology of multiple rows and multiple rows of equivalent negative refractive index flat lens, including:
  • the optical material is processed into rectangular blocks, and the rectangular blocks are cut into square flat plates.
  • the structure is shown in Figure 2.
  • the dimensions are: 10mm ⁇ length (6) ⁇ 100mm, 10mm ⁇ width (5) ⁇ 100mm, 1mm ⁇ thickness (4) ⁇ 6mm; grinding and polishing the front surface 8 and back surface 9 of the square flat plate to make them parallel to each other;
  • Adding protective windows to the front and rear surfaces of the new parallel flat plate has multiple columns and multiple rows of equivalent negative refractive index flat plate lenses as shown in FIG. 1. Among them, a photosensitive adhesive or a thermal adhesive is used between the protective window and the flat lens. glued.
  • the multi-row and multi-row equivalent negative refractive index flat lens is disclosed by Chinese Patent Application No. 201711305662X.
  • the invention relates to a core imaging element that is a multi-column and multi-row equivalent negative refractive index optical waveguide array plate shown in FIG. 9, which can realize square-to-point aberration-free imaging of an object image.
  • the specific principle is shown in Figure 10.
  • the object-side light on the A side is reflected by the equivalent negative refractive index flat lens optical waveguide, and there is one or more reflections. It transmits the light beam to the B-side image side and modulates it into a mirror image. The light, re-converges.
  • the principle of the object-side light through the single lens of the flat lens to reflect the modulation of the image surface is that when the light passes through a single lens, the component of the light in the right-angle plane will rotate 180 °, vertical right The components of the plane will propagate according to the reflection direction of the mirror, where the X ⁇ Y plane is a right-angle plane, and the X ⁇ Z plane is a vertical right-angle plane.
  • the final imaging effect of this imaging principle is consistent with a flat lens made of a negative refractive index material (refer to FIG. 9).
  • the present invention can greatly reduce the individual differences between conventionally processed strip-shaped optical waveguides, and adopts photolithography to process them, so that the size of each unit is processed uniformly, and the error is small, thereby avoiding system assembly errors.
  • the processing size of each imaging unit of the flat lens can be reduced to the order of micrometers, which can greatly improve the imaging resolution of the flat lens.
  • the system processing error is extremely small, the imaging distortion is extremely small, the three-dimensional stereo display characteristics and the naked-eye three-dimensional holographic display requirements are achieved, and the purpose of clear three-dimensional imaging of the stitching array is truly achieved.

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
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  • Ophthalmology & Optometry (AREA)
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Abstract

一种多列多排等效负折射率平板透镜的加工工艺，包括：将光学材料加工成前后表面相互平行的平行平板；取平行平板前后表面之一作为光刻表面，对光刻表面依次进行涂胶、掩膜、曝光处理；将平行平板上未曝光区块的胶去除后加工成深度在0.1～2mm的矩形凹槽；将曝光区块表面和矩形凹槽所有面均涂上保护层，然后在矩形凹槽侧面镀上反射膜；将曝光区块表面和矩形凹槽底面的保护层去除后将凹槽用充填材料填满，对平行平板的前后表面进一步处理使其前后表面的平行度偏差<1'；在新平行平板的前后表面添加保护窗片。可大大减小传统加工条形光波导之间存在的个体差异，实现拼接阵列清晰三维成像的目的。

Description

一种多列多排等效负折射率平板透镜的加工工艺 技术领域
本发明属于光学制造领域，具体涉及一种用于实现空气成像的多列多排等效负折射率平板透镜的加工工艺。
背景技术
随着成像显示技术的发展，对成像的特性要求不断提高。一方面要求有较高的解像，保证观察画面清晰度的同时，还需要满足小畸变要求。另一方面要求有三维立体显示特性的同时，具有裸眼三维全息显示要求。现有的成像技术一方面，主要采用透镜成像，主要受视场和孔径的限制，其存在球差、彗差、像散、场曲、畸变、色差等光学像差，其在大视场、大孔径成像显示领域受限较大。另一方面，现有的裸眼三维显示技术大多数是基于调节左右眼视差来实现三维感官，而非实际三维显示技术。而全息成像技术，制作成本高。
为了追求更好的显示效果和产品体验，本发明提供针对一种可实现三维立体成像显示的等效负折射率平板透镜的加工工艺，为实现裸眼三维显示的一种等效负折射率平板透镜提供工艺支撑。传统光波导加工工艺制造的条形光波导，其各波导之间存在较大的个体差异：各表面平行度偏差不一致，导致切割后，拼接的一种用于三维成像的多列多排等效负折射率平板透镜各行各列排布不规则，使得各方形波导对光线偏折方向不一致，导致图像各区域发生剪切；难以实现清晰的三维成像。
发明内容
针对现有技术存在的问题，本发明提供一种多列多排等效负折射率平板透镜的加工工艺，该工艺可大大减小传统加工条形光波导之间存在的个体差异， 实现拼接阵列清晰三维成像的目的。本发明的技术方案为：
一种多列多排等效负折射率平板透镜的加工工艺，包括：
(1)将光学材料加工成矩形体块料，将矩形体块料切割成方形平板，并将方形平板加工成前后表面相互平行的平行平板；
(2)取平行平板前后表面之一作为光刻表面，对该光刻表面依次进行涂胶、掩膜、曝光处理，其中曝光处理的曝光区块与未曝光区块均为矩形，所有矩形的对角边分别平行所述平行平板的棱边，且曝光区块与未曝光区块以斜向交叉间隔排布；
(3)将平行平板上未曝光区块的胶去除后加工成深度在0.1～2mm的矩形凹槽；
(4)将曝光区块表面和矩形凹槽所有面均涂上保护层，然后在矩形凹槽侧面镀上反射膜；
(5)将曝光区块表面和矩形凹槽底面的保护层去除后将凹槽用充填材料填满，对平行平板的前后表面进一步处理使其前后表面的平行度偏差<1’，得到新平行平板；
(6)在该新平行平板的前后表面添加保护窗片既得。
进一步地，所述步骤(2)中曝光区块与未曝光区块的尺寸为：0.01mm<长/宽<2mm。
进一步地，所述步骤(4)中保护层为树脂或者光刻胶。
进一步地，所述步骤(4)中反射膜为铝膜。
进一步地，所述步骤(5)的充填材料为树脂或者光学玻璃。
进一步地，所述步骤(6)中新平行平板和保护窗片之间采用光敏胶或者热敏胶胶合。
图1提供了采用本发明得到的多列多排等效负折射率平板透镜的一种结构示意图，该平板透镜包括分别具有两个光学面的一对玻璃窗口(1,3)，以及位于两个玻璃窗口之间的光波导组件(2)，该光波导组件包括多排多列且呈45°斜向布置的矩形光波导阵列，以及置于矩形光波导阵列外围一圈的边缘光波导，该矩形光波导阵列的每一列和/或每一排的单个矩形光波导尺寸相同。这种平板透镜可以使二维或者三维光源直接在空气中成实像且实现真正的全息影像，在实现大视场、大孔径、高解像、无畸变、无色散的同时实现裸眼三维立体显示特性。
本发明的有益效果在于：本发明可大幅减小传统加工条形光波导之间存在的个体差异，采用了光刻的方式对其进行加工，使得各单元尺寸加工均匀，误差小，避免了系统的装配误差。对平板透镜的各成像单元的加工尺寸上，可以减小至微米量级，可大大提高平板透镜的成像分辨率。同时由于系统加工误差极小，实现成像畸变极小、三维立体显示特性和裸眼三维全息显示要求，真正实现了拼接阵列清晰三维成像目的。
附图说明
图1是采用本发明得到的多列多排等效负折射率平板透镜的结构示意图，其中1-第一玻璃窗片，2-光波导组件，3-第二玻璃窗片。
图2是本发明实施例1中方形平板的结构示意图，其中4-平板厚度，5-平板宽度，6-平板长度，7-前表面，8-后表面。
图3是本发明实施例1中平行平板光刻表面涂胶后的结构示意图，其中3-1为正视图，3-2为立体图。
图4是本发明实施例1中平行平板光刻表面掩膜、曝光后的结构示意图，其中4-1为侧视图，4-2为俯视图，9-曝光区块和未曝光区块的尺寸。
图5是本发明实施例1中平行平板表面凹槽的结构示意图，其中5-1为平行平板上未曝光区块的胶去除后的立体图，5-2为平行平板上加工出矩形凹槽的正视图，10-凹槽侧面。
图6是本发明实施例1中平行平板涂上保护层以及镀上反射膜后的结构示意图，其中11-曝光区块表面，12-凹槽底面。
图7是本发明实施例1中平行平板去除保护层后的结构示意图。
图8是本发明实施例1中平行平板凹槽填满后的结构示意图。
图9是本发明实施例1中新平行平板的结构示意图。
图10是光线在光波导内部反射、聚焦成像原理图，其中A为物方，B为像方。
图11是物方光线经过单个微透镜内部反射传播到像面的原理图，其中11-1为光线传播侧视图，11-2为光线传播左视图。
注：以上图片中的五角星代表一幅简单图像。
具体实施方式
下面结合附图和具体的实施例对本发明做进一步详细说明，所述是对本发明的解释而不是限定。
实施例1
本实施例提供一种多列多排等效负折射率平板透镜的加工工艺，包括：
(1)将光学材料加工成矩形体块料，将矩形体块料切割成方形平板，其结构如图2所示，尺寸为：10mm<长(6)<100mm，10mm<宽(5)<100mm，1mm<厚(4)<6mm；并将方形平板前表面8和后表面9进行研磨、抛光处理，使其相互平行；
(2)取平行平板前后表面之一作为光刻表面，对该光刻表面依次进行涂光刻胶(如图3所示)、掩膜、曝光处理，其中曝光处理的曝光区块与未曝光区块 均为矩形，且曝光区块与未曝光区块以纵列和横列方式交叉间隔排布(如图4所示)，且尺寸9满足：0.01mm<长<2mm，0.01mm<宽<2mm；
(3)将平行平板上未曝光区块的胶去除后加工成深度在0.1～2mm的矩形凹槽(如图5所示)；
(4)将曝光区块表面和矩形凹槽所有面均涂上树脂保护层，然后在矩形凹槽侧面镀上铝反射膜代替全反射表面(如图6所示)；
(5)将曝光区块表面和矩形凹槽底面的树脂保护层去除(如图7所示)后将凹槽通过注塑方式用光学玻璃填满(如图8所示)，对平行平板的前后表面进一步处理使其前后表面的平行度偏差<1’，得到新平行平板，其结构如图9所示；
(6)在该新平行平板的前后表面添加保护窗片既得如图1所示的多列多排等效负折射率平板透镜，其中保护窗片与平板透镜之间采用光敏胶或热敏胶胶合。
该多列多排等效负折射率平板透镜由申请号为201711305662X的中国专利公开。
实施例2
对实施例1获得的多列多排等效负折射率平板透镜成像原理进行说明，如下：
本发明涉及核心成像元件为图9所示的多列多排等效负折射率光波导阵列平板，其可实现物像方点对点无像差成像。具体原理如图10所示，A侧物方光线经等效负折射率平板透镜光波导内部反射，存在一次或多次反射，其将光束传导至B侧像方的同时，将其调制成镜像光线，重新会聚成像。如图11所示，物方光线经过平板透镜单个微透镜内部反射调制到达像面的原理图，其调制原理是光线经过单个微透镜时，光线在直角平面内的分量将旋转180°，垂直直角 平面的分量将按照反射镜反射方向传播，其中X\Y面为直角平面，X\Z平面为垂直直角平面。该成像原理最终的成像效果与负折射率材料制成的平板透镜一致(参考图9)。
综上，本发明可大幅减小传统加工条形光波导之间存在的个体差异，采用了光刻的方式对其进行加工，使得各单元尺寸加工均匀，误差小，避免了系统的装配误差。对平板透镜的各成像单元的加工尺寸上，可以减小至微米量级，可大大提高平板透镜的成像分辨率。同时由于系统加工误差极小，实现成像畸变极小、三维立体显示特性和裸眼三维全息显示要求，真正实现了拼接阵列清晰三维成像目的。
尽管上面已经示出和描述了本发明的实施例，可以理解的是，上述实施例是示例性的，不能理解为对本发明的限制，本领域的普通技术人员在本发明的范围内可以对上述实施例进行变化、修改、替换和变型。

Claims (6)

  1. 一种多列多排等效负折射率平板透镜的加工工艺，其特征在于，包括：
    (1)将光学材料加工成矩形体块料，将矩形体块料切割成方形平板，并将方形平板加工成前后表面相互平行的平行平板；
    (2)取平行平板前后表面之一作为光刻表面，对该光刻表面依次进行涂胶、掩膜、曝光处理，其中曝光处理的曝光区块与未曝光区块均为矩形，所有矩形的对角边分别平行所述平行平板的棱边，且曝光区块与未曝光区块以斜向交叉间隔排布；
    (3)将平行平板上未曝光区块的胶去除后加工成深度在0.1～2mm的矩形凹槽；
    (4)将曝光区块表面和矩形凹槽所有面均涂上保护层，然后在矩形凹槽侧面镀上反射膜；
    (5)将曝光区块表面和矩形凹槽底面的保护层去除后将凹槽用充填材料填满，对平行平板的前后表面进一步处理使其前后表面的平行度偏差<1’；
    (6)在该新平行平板的前后表面添加保护窗片既得。
  2. 根据权利要求1所述的一种多列多排等效负折射率平板透镜的加工工艺，其特征在于，所述步骤(2)中曝光区块与未曝光区块的尺寸为：0.01mm<长/宽<2mm。
  3. 根据权利要求1所述的一种多列多排等效负折射率平板透镜的加工工艺，其特征在于，所述步骤(4)中保护层为树脂或者光刻胶。
  4. 根据权利要求1所述的一种多列多排等效负折射率平板透镜的加工工艺，其特征在于，所述步骤(4)中反射膜为铝膜。
  5. 根据权利要求1所述的一种多列多排等效负折射率平板透镜的加工工艺，其特征在于，所述步骤(5)的充填材料为树脂或者光学玻璃。
  6. 根据权利要求1所述的一种多列多排等效负折射率平板透镜的加工工艺，其特征在于，所述步骤(6)中新平行平板和保护窗片之间采用光敏胶或者热敏胶胶合。
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