WO2019230641A1 - 排ガス洗浄システムおよび排ガス洗浄システムの運用方法 - Google Patents
排ガス洗浄システムおよび排ガス洗浄システムの運用方法 Download PDFInfo
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- WO2019230641A1 WO2019230641A1 PCT/JP2019/020866 JP2019020866W WO2019230641A1 WO 2019230641 A1 WO2019230641 A1 WO 2019230641A1 JP 2019020866 W JP2019020866 W JP 2019020866W WO 2019230641 A1 WO2019230641 A1 WO 2019230641A1
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- liquid
- exhaust gas
- path
- supply
- cleaning system
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/06—Spray cleaning
- B01D47/063—Spray cleaning with two or more jets impinging against each other
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/92—Chemical or biological purification of waste gases of engine exhaust gases
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B63—SHIPS OR OTHER WATERBORNE VESSELS; RELATED EQUIPMENT
- B63B—SHIPS OR OTHER WATERBORNE VESSELS; EQUIPMENT FOR SHIPPING
- B63B13/00—Conduits for emptying or ballasting; Self-bailing equipment; Scuppers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B63—SHIPS OR OTHER WATERBORNE VESSELS; RELATED EQUIPMENT
- B63H—MARINE PROPULSION OR STEERING
- B63H21/00—Use of propulsion power plant or units on vessels
- B63H21/32—Arrangements of propulsion power-unit exhaust uptakes; Funnels peculiar to vessels
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
- F01N3/02—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for cooling, or for removing solid constituents of, exhaust
- F01N3/04—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for cooling, or for removing solid constituents of, exhaust using liquids
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N9/00—Electrical control of exhaust gas treating apparatus
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N2570/00—Exhaust treating apparatus eliminating, absorbing or adsorbing specific elements or compounds
- F01N2570/04—Sulfur or sulfur oxides
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N2590/00—Exhaust or silencing apparatus adapted to particular use, e.g. for military applications, airplanes, submarines
- F01N2590/02—Exhaust or silencing apparatus adapted to particular use, e.g. for military applications, airplanes, submarines for marine vessels or naval applications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N2610/00—Adding substances to exhaust gases
- F01N2610/14—Arrangements for the supply of substances, e.g. conduits
- F01N2610/1406—Storage means for substances, e.g. tanks or reservoirs
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N2610/00—Adding substances to exhaust gases
- F01N2610/14—Arrangements for the supply of substances, e.g. conduits
- F01N2610/1433—Pumps
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
- Y02T10/10—Internal combustion engine [ICE] based vehicles
- Y02T10/40—Engine management systems
Definitions
- the present disclosure relates to an exhaust gas cleaning system for cleaning exhaust gas discharged from an exhaust gas generator mounted on a ship, and an operation method of the exhaust gas cleaning system.
- the amount of exhaust gas discharged from the main engine of a very large ship (the amount of exhaust gas at 100% load) reaches, for example, 200,000 Nm 3 / h or more.
- a plurality of power generation engines and boilers are installed in order to respond to various electric power demands etc. in a very large ship.
- a desulfurization apparatus having a large passage area is required for a desulfurization apparatus mounted on a very large ship in order to desulfurize a large amount of exhaust gas discharged from these main engines and a plurality of power generation engines / boilers.
- Patent Document 1 discloses a cleaning water supply system for performing a so-called open loop operation in which cleaning water taken from outside the hull is discharged outside the hull after use with an exhaust gas cleaning device, and cleaning water (seawater or fresh water) in the hull.
- An exhaust gas cleaning system for ships is provided, which is provided with a cleaning water supply system for performing so-called closed loop operation, which is used in an exhaust gas cleaning device after cooling.
- Patent Document 1 discloses that either one of a washing water supply system for performing an open loop operation and a washing water supply system for performing a closed loop operation can be switched from one to the other. Yes.
- an object of at least one embodiment of the present invention is to provide an exhaust gas cleaning system that can be easily remodeled from an existing exhaust gas cleaning system and can suppress an increase in the occupied area.
- An exhaust gas cleaning system includes: An exhaust gas cleaning system for cleaning exhaust gas discharged from an exhaust gas generator mounted on a ship, A desulfurization tower that internally defines a gas-liquid contact portion for bringing the cleaning liquid into contact with the exhaust gas; A water intake section for taking outboard water from outside the hull; A supply path connecting the intake section and the desulfurization tower; A discharge path for discharging the cleaning liquid discharged from the desulfurization tower to the outside of the hull; A circulation path for refluxing the cleaning liquid discharged from the desulfurization tower to the supply path as a circulation liquid, and a circulation path that merges at the junction with the supply path; In order to switch the supply source of the cleaning liquid supplied to the desulfurization tower to either the outboard water taken by the water intake section or the circulating liquid returned to the supply path through the circulation path A supply-side switching device of A discharge-side switching device for switching the outflow destination of the cleaning liquid discharged from the desulfurization tower to either the discharge path or the circulation
- the exhaust gas cleaning system uses a supply source of the cleaning liquid supplied to the desulfurization tower as outboard water taken in by the water intake unit, or circulation returned to the supply path via the circulation path A supply-side switching device for switching to any one of the liquids, and a discharge-side switching device for switching the outflow destination of the cleaning liquid discharged from the desulfurization tower to either the discharge path or the circulation path ing.
- the exhaust gas cleaning system includes an open loop operation in which the supply source is outboard water and the outflow destination of the cleaning liquid is a discharge path by the supply side switching device and the discharge side switching device, and the supply source is a circulating fluid. In addition, it is possible to switch to a closed loop operation where the outflow destination of the cleaning liquid is a circulation path.
- the exhaust gas cleaning system is a shared facility in which the downstream portion of the supply passage and the desulfurization tower are used in both the open loop operation and the closed loop operation.
- the downstream portion and the desulfurization tower are used in both the open loop operation and the closed loop operation.
- the water supply pump provided on the downstream side of the junction in the supply path, and the circulation path provided in the circulation path.
- a storage tank capable of storing the liquid.
- the water supply pump is also a shared facility that is used in any operating state of the open loop operation and the closed loop operation, and from the existing exhaust gas cleaning system as in the configuration of (1) above. Remodeling is easy and increase in the area occupied by the exhaust gas cleaning system can be suppressed. Furthermore, by storing the circulating fluid in the storage tank, it is possible to stably supply the circulating fluid to the desulfurization tower during closed loop operation. Further, when the operation state is switched from the closed loop operation to the open loop operation, the operation state can be quickly switched by storing the circulating fluid remaining in the circulation path in the storage tank.
- a storage amount acquisition device configured to be able to acquire a storage amount of the circulating fluid in the storage tank
- the storage tank The outboard water supply device configured to be able to replenish the outboard water and the outboard to the storage tank by the outboard water supply device according to the storage amount acquired by the storage amount acquisition device
- a control unit that controls a replenishment amount of water.
- the exhaust gas cleaning system controls the replenishment amount of the outboard water to the storage tank by the outboard water replenishment device in accordance with the storage amount acquired by the storage amount acquisition device by the control unit. By doing so, the storage amount of the storage tank can be set to an appropriate amount.
- a pH value detection device configured to be able to detect the pH value of the circulating fluid in the storage tank, and the storage tank
- a neutralizer addition device configured to be capable of adding a neutralizer
- the control unit is configured to use the neutralizer addition device according to the pH value detected by the pH value detection device. The amount of the neutralizing agent added is controlled.
- the exhaust gas cleaning system controls the amount of neutralizing agent added by the neutralizing agent adding device according to the pH value detected by the control unit with the pH value detecting device, Excessive consumption of the neutralizing agent can be prevented, and corrosion of equipment and piping such as a water pump located at a later stage than the storage tank can be suppressed. By suppressing corrosion of equipment such as a water pump and piping, the exhaust gas cleaning system can stably clean the exhaust gas over a long period of time.
- a circulating liquid processing apparatus capable of removing impurities from the circulating liquid, and the circulating liquid is used as the circulating liquid processing apparatus.
- a liquid path to be processed to be sent to the circulating liquid processing apparatus as a liquid to be processed by the liquid processing apparatus, and a liquid flow rate control valve configured to be able to control a flow rate of the liquid to be processed in the liquid path to be processed are further provided.
- the circulating liquid in which impurities are concentrated by repeatedly cleaning the exhaust gas is sent to the circulating liquid processing apparatus via the processing liquid path as the processing liquid to be processed by the circulating liquid processing apparatus.
- clogging and scaling of the piping can be prevented, so that stable operation is possible.
- the exhaust gas cleaning system according to (5) further includes a specific gravity detection device capable of detecting a specific gravity of the cleaning liquid after cleaning the exhaust gas, and the control unit includes the specific gravity.
- the opening degree of the to-be-processed liquid flow rate control valve can be controlled according to the specific gravity of the cleaning liquid after cleaning the exhaust gas detected by the detection device.
- the cleaning liquid (circulating liquid) in which impurities are concentrated by repeated exhaust gas cleaning tends to increase in specific gravity.
- the control unit controls the opening degree of the liquid flow control valve to be processed in accordance with the specific gravity of the cleaning liquid after cleaning the exhaust gas detected by the specific gravity detection device.
- a cleaning liquid (liquid to be processed) having an appropriate flow rate can be supplied to the processing liquid path.
- a liquid storage tank that is provided in the liquid path to be processed and that can store the liquid to be processed is further provided. Prepare.
- the exhaust gas cleaning system stores a part of the liquid to be processed before being processed by the circulating liquid processing apparatus in the liquid storage tank to be processed, so that the processing amount per unit time is increased. Even a small and small circulating liquid processing apparatus can process the liquid to be processed. Further, by reducing the size of the circulating fluid treatment device, it is possible to save the space of the exhaust gas cleaning system and reduce the device cost.
- the liquid passage to be treated is provided downstream of the water supply pump in the supply passage.
- a first treatment liquid path connecting the first branching section and the circulating liquid treatment apparatus; and the treatment liquid flow rate control valve is capable of controlling a flow rate of the treatment liquid in the first treatment liquid path.
- the 1st to-be-processed liquid flow rate control valve comprised is included.
- the exhaust gas cleaning system controls the flow rate of the liquid to be treated in the first liquid flow path by the first liquid flow rate control valve, so that the first liquid flow path is controlled.
- the liquid to be treated can be flowed at an appropriate flow rate from the supply path to the circulating liquid treatment apparatus.
- the pump pressure of a water-feed pump acts on the to-be-processed liquid in a 1st to-be-processed liquid path.
- the piping design of the 1st to-be-processed liquid path can be increased.
- the liquid passage to be treated is a first connecting the storage tank and the circulating liquid treatment apparatus.
- the liquid flow rate control valve includes a second liquid flow rate control valve configured to be able to control the flow rate of the liquid to be processed in the second liquid flow path.
- the exhaust gas cleaning system controls the flow rate of the liquid to be processed in the second liquid path to be processed by the second liquid flow rate control valve for the second liquid to be processed via the second liquid path to be processed.
- the exhaust gas cleaning system can flow the circulating fluid remaining in the storage tank to the second treated liquid path after switching from the closed loop operation to the open loop operation, the closed loop operation is changed to the open loop operation. Can be switched quickly.
- the exhaust gas cleaning system performs control for opening the second liquid flow rate control valve by the control unit when the storage amount acquired by the storage amount acquisition device exceeds the upper limit threshold.
- excess circulating fluid stored in the storage tank can be quickly discharged from the storage tank.
- the control unit sets the storage amount acquired by the storage amount acquisition device to a lower limit threshold value.
- fill the control which switches the said supply source by the said supply side switching apparatus to the said outboard water taken in by the said intake part is possible.
- the exhaust gas cleaning system supplies the control by switching the supply-side switching device by the control unit when the storage amount acquired by the storage amount acquisition device is less than the lower limit threshold. Since the source can be switched to the outboard water acquired by the water supply section, the insufficient circulating fluid can be quickly supplied to the storage tank.
- the desulfurization tower in the exhaust gas cleaning system according to any one of (2) to (11), includes a liquid pool portion positioned below the gas-liquid contact portion, The storage tank located below the liquid pool is further defined inside.
- An operation method of the exhaust gas cleaning system includes: An operation method of an exhaust gas cleaning system for cleaning exhaust gas discharged from an exhaust gas generator mounted on a ship,
- the exhaust gas cleaning system is A desulfurization tower that internally defines a gas-liquid contact portion for bringing the cleaning liquid into contact with the exhaust gas;
- a water intake section for taking outboard water from outside the hull;
- a supply path connecting the intake section and the desulfurization tower;
- a water pump provided downstream of the junction in the supply path;
- the supply source of the cleaning liquid is returned to the supply path through the circulation path from the outboard water taken by the intake section by the supply side switching device.
- the operation state of the exhaust gas cleaning system is changed by performing a first supply source switching step for switching to the circulating fluid and a first outlet switching step for switching the discharge destination of the cleaning liquid from the discharge path to the circulation path by the discharge side switching device. It is possible to switch from open loop operation to closed loop operation.
- the exhaust gas cleaning system in the circulation path and can store the circulating fluid; and A storage amount acquisition device configured to be capable of acquiring the amount of the circulating fluid stored in the storage tank, and the operation method of the exhaust gas cleaning system is configured to store the amount of the circulating fluid stored by the storage amount acquisition device.
- a storage amount acquisition step to be acquired is further provided, wherein the first supply source switching step is after the first outflow destination switching step and after the storage amount acquired by the storage amount acquisition step exceeds a predetermined amount. Done.
- the operation method of the exhaust gas cleaning system can acquire the storage amount of the circulating fluid in the storage tank in the storage amount acquisition step.
- the first supply source switching step is performed after the first outflow destination switching step and after the storage amount in the storage tank exceeds a predetermined amount.
- the operation method of such an exhaust gas cleaning system is that the sufficient amount of circulating fluid is stored in the storage tank when the supply source of cleaning fluid is switched from outboard water to circulating fluid. It is possible to suppress a decrease in the cleaning ability.
- An operation method of the exhaust gas cleaning system includes: An operation method of an exhaust gas cleaning system for cleaning exhaust gas discharged from an exhaust gas generator mounted on a ship,
- the exhaust gas cleaning system is A desulfurization tower that internally defines a gas-liquid contact portion for bringing the cleaning liquid into contact with the exhaust gas;
- a water intake section for taking outboard water from outside the hull;
- a supply path connecting the intake section and the desulfurization tower;
- a water pump provided downstream of the junction in the supply path;
- the operation method of the exhaust gas cleaning system is such that the supply side of the cleaning liquid is taken out from the circulating liquid returned to the supply path through the circulation path by the supply side switching device.
- the operation state of the exhaust gas cleaning system is closed by performing a second supply source switching step for switching to water and a second outlet switching step for switching the discharge destination of the cleaning liquid from the circulation path to the discharge path by the discharge side switching device. It is possible to switch from loop operation to open loop operation.
- the exhaust gas cleaning system in the circulation path and can store the circulating fluid; and A circulating liquid processing apparatus capable of removing impurities from the circulating liquid, and a liquid path to be processed for sending the circulating liquid to the circulating liquid processing apparatus as a processing liquid to be processed by the circulating liquid processing apparatus.
- the process liquid flow rate control valve is opened and stored in the storage tank after the second supply source switching step and the second outflow destination switching step.
- the serial circulating fluid further comprises a circulating fluid discharge step of sending to the circulating fluid processing apparatus.
- the exhaust gas cleaning system is operated after the second supply source switching step and the second outlet switching step, after the liquid flow rate control valve (second liquid flow rate control valve to be processed). ) Is opened, and the circulating fluid discharge step for sending the circulating fluid stored in the storage tank to the circulating fluid treatment device is further provided. Therefore, when the operating state of the exhaust gas cleaning system is switched from closed loop operation to open loop operation. The circulating fluid remaining in the storage tank can be discharged to the circulating fluid processing device located outside the storage tank.
- an exhaust gas cleaning system that can be easily modified from an existing exhaust gas cleaning system and can suppress an increase in the exclusive area.
- an expression indicating that things such as “identical”, “equal”, and “homogeneous” are in an equal state not only represents an exactly equal state, but also has a tolerance or a difference that can provide the same function. It also represents the existing state.
- expressions representing shapes such as quadrangular shapes and cylindrical shapes represent not only geometrically strict shapes such as quadrangular shapes and cylindrical shapes, but also irregularities and chamfers as long as the same effects can be obtained. A shape including a part or the like is also expressed.
- the expressions “comprising”, “comprising”, “comprising”, “including”, or “having” one constituent element are not exclusive expressions for excluding the existence of the other constituent elements.
- symbol may be attached
- FIG. 1 is a perspective view of a ship including an exhaust gas cleaning system according to an embodiment.
- the exhaust gas cleaning system 20 is mounted on a ship 1 as shown in FIG.
- the ship 1 is a very large ship in which the amount of exhaust gas from the main engine (the amount of exhaust gas at 100% load) exceeds 200,000 Nm 3 / h, for example, as shown in FIG.
- the ship 1 is an ultra-large container ship having a container loading capacity of 10,000 TEU or more called ULCS (Ultra Large Container Ship).
- the ship 1 includes a hull 2 having a hull including an upper deck 3, a ship side outer plate 4, and a ship bottom outer plate 5, a living area 6 provided to protrude from the upper deck 3, A steel plate structure 7 protruding from the deck 3.
- the steel plate structure 7 is called a chimney or an engine casing.
- the residential area 6 is provided at a position slightly ahead of the center in the bow-stern direction, and the steel plate structure 7 is provided at a position on the stern side of the residential area 6. ing.
- FIG. 2 is an enlarged perspective view showing the periphery of the steel plate structure in the ship shown in FIG.
- an engine room 8 is formed inside the hull 2.
- the engine room 8 is provided at a position vertically below the steel plate structure 7.
- the engine room 8 includes a main engine 11 including a marine diesel engine for applying a propulsive force to the ship 1 and a main engine boiler for driving a main engine turbine, and various thermal demands in the ship 1.
- a plurality of auxiliary engines 12 including an auxiliary boiler for responding to the demand and an auxiliary engine for responding to power demand and the like are installed.
- the main engine 11 and the auxiliary engine 12 correspond to the exhaust gas generator 10 mounted on the ship 1.
- the steel plate structure 7 is a structure for releasing the exhaust gas discharged from the exhaust gas generator 10 such as the main engine 11 and the auxiliary engine 12 to the outside of the ship 1.
- the steel plate structure 7 is formed in a long cylindrical shape having a longitudinal direction along the starboard-portal direction (width direction) of the ship 1.
- a desulfurization tower 30 for cleaning (desulfurization) exhaust gas discharged from the exhaust gas generators 10 such as the main engine 11 and the auxiliary engine 12 is disposed inside the steel plate structure 7, and exhaust gas is generated.
- An exhaust gas introducing device 13 for guiding the exhaust gas discharged from the device 10 to the inside of the desulfurization tower 30 is disposed.
- FIG. 3 is a configuration diagram schematically showing the configuration of the exhaust gas cleaning system according to the embodiment.
- the desulfurization tower 30 includes a desulfurization tower body 31, an exhaust gas introduction part 32, and an exhaust gas discharge part 33.
- the desulfurization tower main body 31 defines an internal space 34 inside.
- an exhaust gas introduction port 36 communicating with the internal space 34 (lower internal space 34B) is formed on the wall surface 35 on the exhaust gas introduction part 32 side of the desulfurization tower main body 31.
- the exhaust gas introduced into the internal space 34 from the exhaust gas inlet 36 through the exhaust gas inlet 32 flows from the exhaust gas inlet 32 toward the side away from the exhaust gas inlet 32, and then rises in the internal space 34. While flowing.
- the desulfurization tower 30 further includes a spraying device 37 configured to spray a cleaning liquid (for example, seawater) on the exhaust gas flowing through the internal space 34.
- the spraying device 37 may be configured to efficiently perform gas-liquid contact, and is not limited to a configuration that ejects the cleaning liquid downward as shown in FIG. 3, for example.
- the spraying device 37 is provided in each of the plurality of water spray pipes 37 ⁇ / b> A that extend along the horizontal direction and are arranged at equal intervals, and the water spray pipe 37 ⁇ / b> A. And at least one watering nozzle 37 ⁇ / b> B capable of spraying into the space 34.
- the internal space 34 includes a lower internal space 34 ⁇ / b> B formed below the spraying device 37 and an upper internal space 34 ⁇ / b> C formed above the spraying device 37. Further, the desulfurization tower 30 defines a gas-liquid contact portion 38 for bringing the cleaning liquid into contact with the exhaust gas.
- the spraying device 37 is provided at a position closer to the upper side of the internal space 34 and jets the cleaning liquid toward the lower side opposite to the flow direction of the exhaust gas.
- diffusion apparatus 37 is comprised so that the sulfur content contained in exhaust gas may be removed by spraying cleaning liquid with respect to the waste gas which flows through the lower side internal space 34B, and making cleaning fluid contact the exhaust gas.
- the lower inner space 34B corresponds to the gas-liquid contact portion 38 described above.
- a mist eliminator 39 that separates the upper side internal space 34C and the outlet side internal space 34D is disposed in the internal space 34 at a position above the upper side internal space 34C.
- the mist eliminator 39 is configured to remove moisture from the exhaust gas passing through the mist eliminator 39. Then, the exhaust gas that has passed through the mist eliminator 39 is discharged to the outside of the ship 1 from the exhaust gas discharge part 33 connected to the uppermost part of the desulfurization tower main body 31 via the outlet side internal space 34D.
- the desulfurization tower main body 31 stores the sprayed cleaning liquid sprayed on the exhaust gas guided to the internal space 34, that is, the cleaning liquid after cleaning the exhaust gas.
- a liquid pool portion 34A is formed.
- the liquid pool portion 34A is formed below the lower internal space 34B and below the lower surface of the exhaust gas inlet 36.
- the exhaust gas cleaning system 20 connects the above-described desulfurization tower 30, a water intake part 41 for taking outboard water from the outside of the hull 2, a water intake part 41, and the desulfurization tower 30.
- a supply path 40, a discharge path 50 for discharging the cleaning liquid discharged from the desulfurization tower 30 to the outside of the hull 2, and a water supply pump 43 provided in the supply path 40 are provided.
- the exhaust gas cleaning system 20 can perform an open loop operation.
- the outboard water means water located outside the hull 2 and includes seawater, river water, lake water, and the like.
- the intake section 41 is an opening formed below the draft line of the hull 2 and is an opening communicating with the outside of the hull 2.
- the outboard water taken in the water intake unit 41 is sent as a cleaning liquid from the water intake unit 41 to the spraying device 37 of the desulfurization tower 30 via the supply path 40.
- the outboard water (cleaning liquid) is sent to the spraying device 37 by driving the water pump 43.
- the cleaning liquid is sprayed by the spraying device 37 and comes into contact with the exhaust gas flowing through the internal space 34 of the desulfurization tower 30 to clean the exhaust gas.
- the cleaning liquid after cleaning the exhaust gas is discharged from the desulfurization tower 30 and then discharged to the outside of the hull 2 through the discharge path 50.
- the above-described exhaust gas cleaning system 20 is an exhaust liquid treatment device 51 provided in the discharge path 50, and is configured to be able to process the cleaning liquid (exhaust liquid) flowing through the discharge path 50.
- the waste liquid treatment device 51 may be further provided.
- the treatment of the effluent in the effluent treatment device 51 includes adjusting the pH value of the effluent by adding outboard water to the effluent to dilute the effluent. Further, the treatment of the effluent in the effluent treatment apparatus 51 may include removing impurities (contaminants) from the effluent.
- the discharged liquid is discharged outside the hull 2 after being processed by the discharged liquid processing device 51.
- Such an exhaust gas cleaning system 20 is provided with the exhaust liquid treatment device 51, so that contamination of outboard water located outside the hull 2 due to discharge of the exhaust liquid to the outside of the hull 2 can be suppressed. It is.
- the exhaust gas cleaning system 20 described above is a circulation path 60 for refluxing the cleaning liquid discharged from the desulfurization tower 30 to the supply path 40 as a circulation liquid, and the supply path 40 and the junction 42.
- the supply source of the cleaning liquid supplied to the desulfurization tower 30 is either outboard water taken in by the water intake section 41 or the circulating liquid returned to the supply path 40 via the circulation path 60.
- the water pump 43 mentioned above is provided in the downstream rather than the confluence
- the exhaust gas cleaning system 20 can perform open-loop operation and closed-loop operation, and can switch the operating state of the exhaust gas cleaning system 20 in both open-loop operation and closed-loop operation.
- the cleaning liquid after cleaning the exhaust gas is recirculated as a circulating liquid to the supply path 40 and sent to the spraying device 37 of the desulfurization tower 30 through the supply path 40.
- the circulating liquid (cleaning liquid) is sent to the spraying device 37 by driving the water pump 43.
- the circulating liquid (cleaning liquid) is sprayed by the spraying device 37 and is brought into contact with the exhaust gas flowing through the internal space 34 of the desulfurization tower 30 to clean the exhaust gas.
- the supply-side switching device 71 is electrically connected to the control unit 21 and supplies a cleaning liquid supplied to the desulfurization tower 30 in accordance with a signal transmitted from the control unit 21. It is configured to be switchable.
- the control unit 21 is configured as a microcomputer including a central processing unit (CPU), a random access memory (RAM), a read only memory (ROM), and an I / O interface.
- the supply-side switching device 71 is a supply-side three-way valve 73 provided in the junction 42 with the circulation path 60 of the supply path 40.
- the discharge-side switching device 72 is electrically connected to the control unit 21, and the outflow destination of the cleaning liquid discharged from the desulfurization tower 30 in accordance with a signal transmitted from the control unit 21. It is configured to be switchable.
- the discharge side switching device 72 is a discharge side three-way valve 74 provided at a branch portion 52 between the discharge path 50 and the circulation path 60.
- the supply path 40 includes a supply pipe 40 ⁇ / b> A that connects the intake section 41 and the supply-side three-way valve 73, a supply pipe 40 ⁇ / b> B that connects the supply-side three-way valve 73 and the water supply pump 43, And a supply pipe 40 ⁇ / b> C for connecting the water pump 43 and the spraying device 37.
- the discharge path 50 includes a discharge pipe 50 ⁇ / b> A that connects the desulfurization tower 30 and the discharge side three-way valve 74, and a discharge pipe 50 ⁇ / b> B that connects the discharge side three-way valve 74 and the discharge liquid processing device 51.
- the circulation path 60 is provided with a storage tank 61 that defines an internal space 62 for storing the cleaning liquid (circulating liquid).
- the circulation path 60 is a common pipe connected to the above-described discharge pipe 50 ⁇ / b> A, a circulation pipe 60 ⁇ / b> A connecting the desulfurization tower 30 and the discharge side three-way valve 74, and a circulation connecting the discharge side three-way valve 74 and the storage tank 61.
- a pipe 60B and a circulation pipe 60C that connects the storage tank 61 and the supply side three-way valve 73 are included.
- the supply-side switching device 71 uses the supply source of the cleaning liquid as outboard water taken by the water supply unit 41, and the discharge-side switching device 72 sets the discharge destination of the cleaning liquid as the discharge path 50.
- the cleaning liquid flows in the order of the supply pipes 40A, 40B, 40C and the discharge pipes 50A, 50B.
- the supply-side switching device 71 uses the supply source of the cleaning liquid as the circulating fluid that has been refluxed to the supply passage 40 via the circulation path 60, and the discharge-side switching device 72 uses the circulation liquid 60 as the outflow destination of the cleaning liquid. To do.
- the cleaning liquid (circulating liquid) flows in the order of the circulation pipes 60A, 60B, 60C, and the supply pipes 40B, 40C.
- the discharge side switching device 72 switches the outflow destination of the cleaning liquid from the discharge path 50 (discharge pipe 50B) to the circulation path 60 (circulation pipe 60B) in accordance with a signal transmitted from the control unit 21 (first outflow). Destination switching step S202).
- the supply-side switching device 71 returns the cleaning liquid supply source from the outboard water taken by the water intake unit 41 to the supply channel 40 via the circulation path 60.
- the circulating fluid is switched (first supply source switching step S201).
- the supply-side switching device 71 takes a supply source of the cleaning liquid from the circulating liquid returned to the supply path 40 via the circulation path 60 by the water intake section 41. Switching to outside water (second supply source switching step S301).
- the discharge side switching device 72 switches the outflow destination of the cleaning liquid from the circulation path 60 (circulation pipe 60B) to the discharge path 50 (discharge pipe 50B) in accordance with a signal transmitted from the control unit 21 (second).
- Outflow destination switching step S302 By performing the second supply source switching step S301 and the second destination switching step S302, the operation state of the exhaust gas cleaning system 20 can be switched from the closed loop operation to the open loop operation.
- FIG. 4 is a block diagram schematically showing the configuration of an exhaust gas cleaning system capable of open-loop operation according to a comparative example.
- the exhaust gas cleaning system 20 ⁇ / b> A according to the comparative example includes the above-described desulfurization tower 30, the above-described supply path 40, the above-described water intake unit 41, the above-described water supply pump 43, and the above-described discharge path 50. And the above-described drainage treatment apparatus 51.
- the exhaust gas cleaning system 20A can be modified to the exhaust gas cleaning system 20 by adding the above-described circulation path 60, the above-described supply-side switching device 71, the above-described discharge-side switching device 72, and the like. Note that when the exhaust gas cleaning system 20A is modified to the exhaust gas cleaning system 20, the water pump 43 may be replaced with one that can handle closed loop operation.
- the exhaust gas cleaning system 20 includes the desulfurization tower 30 described above, the water intake unit 41 described above, the supply path 40 described above, and the discharge described above as illustrated in FIG.
- the passage 50, the circulation path 60 described above, the supply switching device 71 described above, and the discharge switching device 72 described above are provided.
- the supply source of the cleaning liquid supplied to the desulfurization tower 30 is returned to the supply path 40 via the outboard water taken by the water intake unit 41 or the circulation path 60.
- a switching device 72 for switching to any one of the circulating fluids and the discharge side for switching the outflow destination of the cleaning fluid discharged from the desulfurization tower 30 to either one of the discharge passage 50 or the circulation passage 60.
- the exhaust gas cleaning system 20 uses the supply-side switching device 71 and the discharge-side switching device 72 to perform open loop operation in which the supply source is outboard water and the cleaning liquid is discharged to the discharge passage 50, and the supply source is It is possible to switch to a closed loop operation in which the circulating fluid is used and the outflow destination of the cleaning fluid is the circulation path 60.
- the downstream portion (supply pipes 40B and 40C) of the supply path 40 and the desulfurization tower 30 are used in any operating state of the open loop operation and the closed loop operation. It is a common facility.
- the downstream portion (supply pipes 40B and 40C) of the supply passage 40 and the desulfurization tower 30 common, it is easy to modify the existing exhaust gas cleaning system (for example, the exhaust gas cleaning system 20A). In addition, an increase in the area occupied by the exhaust gas cleaning system 20 can be suppressed.
- the above-described exhaust gas cleaning system 20 is provided in the above-described water supply pump 43 and the circulation path 60 as shown in FIG. 61.
- the water supply pump 43 is also a shared facility that is used in both the open-loop operation and the closed-loop operation, and the downstream portion of the supply section 40 (the supply pipe 40B and the supply pipe 40B).
- 40C) and the desulfurization tower 30 are shared facilities, it is possible to easily modify the existing exhaust gas cleaning system (for example, the exhaust gas cleaning system 20A) and to suppress an increase in the exclusive area of the exhaust gas cleaning system 20. is there.
- the circulating fluid can be stably supplied to the desulfurization tower 30 during the closed loop operation. Further, when the operation state is switched from the closed loop operation to the open loop operation, the operation state can be quickly switched by storing the circulating fluid remaining in the circulation path 60 in the storage tank 61.
- the exhaust gas cleaning system 20 described above includes a storage amount acquisition device 63 configured to be able to acquire a storage amount of circulating fluid in the storage tank 61, and the storage tank 61, as shown in FIG. And an outboard water replenishing device 64 configured to replenish outboard water. And the control part 21 mentioned above controls the replenishment amount of the outboard water to the storage tank 61 by the outboard water replenishment device 64 according to the storage amount acquired by the storage amount acquisition device 63. .
- the storage amount acquisition device 63 is a water level detection sensor that is provided in the storage tank 61 and detects the water level of the storage tank 61.
- the outboard water replenishing device 64 is configured to obtain outboard water (makeup water) from the outside of the hull 2, and outboard water (makeup water) from the second intake unit 641 to the storage tank 61. ),
- the second water pump 642 provided in the middle of the outboard water supply path 640, and the flow rate of the outboard water (supply water) in the outboard water supply path 640 can be controlled.
- the makeup water flow rate control valve 643 is provided on the downstream side of the second water supply pump 642 in the outboard water supply channel 640.
- the makeup water flow rate control valve 643 is electrically connected to the control unit 21, and performs control to adjust the opening / closing of the valve or the opening of the valve in accordance with a signal transmitted from the control unit 21.
- the storage amount acquisition device 63 is not limited to the above-described water level detection sensor as long as the storage amount of the circulating fluid in the storage tank 61 can be acquired. Further, the storage amount acquisition device 63 may be provided in addition to the storage tank 61. For example, the storage amount acquisition device 63 may calculate the storage amount in the storage tank 61 from the difference between the flow rates of the circulating fluid flowing through the circulation pipes 60B and 60C.
- the exhaust gas cleaning system 20 is configured to supply the outboard water to the storage tank 61 by the outboard water supply device 64 according to the storage amount acquired by the control unit 21 using the storage amount acquisition device 63.
- the storage amount of the storage tank 61 can be set to an appropriate amount.
- the exhaust gas cleaning system 20 described above includes a pH value detection device 65 configured to be able to detect the pH value of the circulating fluid in the storage tank 61, and the storage tank 61, as shown in FIG. And a neutralizer addition device 66 configured to be capable of adding a neutralizer.
- the control unit 21 described above is configured to control the amount of neutralizing agent added by the neutralizing agent adding device 66 in accordance with the pH value detected by the pH value detecting device 65.
- the pH value detection device 65 is a pH meter provided in the storage tank 61.
- the neutralizer addition device 66 includes a neutralizer storage tank 661 for storing the neutralizer, and a neutralizer supply path 660 for sending the neutralizer from the neutralizer storage tank 661 to the storage tank 61.
- a neutralizer supply pump 662 provided in the middle of the neutralizer supply path 660, a neutralizer amount control valve 663 configured to be able to control the amount of neutralizer in the neutralizer supply path 660, have.
- the neutralizer amount control valve 663 is provided on the downstream side of the neutralizer supply pump 662 in the neutralizer supply path 660.
- the neutralizing agent amount control valve 663 is electrically connected to the control unit 21 and performs control for opening / closing the valve or adjusting the opening of the valve in accordance with a signal transmitted from the control unit 21.
- the pH value detection device 65 only needs to be configured to be able to detect the pH value of the circulating fluid in the storage tank 61, and is not limited to the pH meter described above. Further, the pH value detection device 65 may be provided other than the storage tank 61.
- the exhaust gas cleaning system 20 controls the amount of neutralizing agent added by the neutralizing agent adding device 66 in accordance with the pH value detected by the control unit 21 with the pH value detecting device 65.
- the exhaust gas cleaning system 20 can stably clean the exhaust gas over a long period of time.
- the exhaust gas cleaning system 20 described above further includes a cooler 44 for cooling the cleaning liquid (circulating liquid) in the closed loop operation, as shown in FIG.
- the cooler 44 is provided in a portion (supply pipe 40 ⁇ / b> C) on the downstream side of the water supply pump 43 in the supply path 40.
- the cooler 44 exchanges heat with the third water intake portion 441 for obtaining outboard water (coolant) from the outside of the hull 2 and the outboard water (coolant), so that the water supply pump 43 in the supply passage 40 is exchanged.
- a cooling section 442 capable of cooling the downstream portion (supply pipe 40C), a cooling liquid path 440 for sending outboard water (cooling liquid) from the third water intake section 441 to the cooling section 442, and a cooling liquid path And a third water supply pump 443 provided in the middle of 440.
- the outboard water (coolant) after heat exchange in the cooling section 442 is discharged to the outside of the hull 2.
- the cooler 44 is configured to operate during closed loop operation. In this case, the cleaning liquid (circulating liquid) flowing through the supply path 40 can be cooled by the cooler 44.
- the exhaust gas cleaning system 20 described above further includes a parallel water pump 43B arranged in parallel with the water pump 43, as shown in FIG.
- the supply path 40 includes a bypass 431 that bypasses the water pump 43.
- the parallel water pump 43B is provided in the bypass 431.
- the detour 431 includes a pipe that connects a portion upstream of the water supply pump 43 in the supply passage 40 (supply pipe 40B) and a portion downstream of the water supply pump 43 in the supply passage 40 (supply pipe 40C). .
- the parallel water pump 43 ⁇ / b> B arranged in parallel with the water pump 43.
- the required amount can be supplied.
- the exhaust gas cleaning system 20 described above includes a pair of connection paths 444 and 445 that connect the water pump 43 described above and the third water pump 443 described above in parallel, as shown in FIG. It has more.
- the connection path 444 upstream connection path
- the connection path 445 downstream connection path
- the connection path 445 is The pipes connect the downstream sides of the water pump 43 and the third water pump.
- connection path 444 includes a part upstream of the water supply pump 43 in the supply path 40 (supply pipe 40B), a part upstream of the third water supply pump 443 in the cooling liquid path 440 (supply pipe 440A), It consists of piping that connects the two.
- the connection path 445 connects a part of the supply path 40 downstream of the water pump 43 (supply pipe 40C) and a part of the cooling liquid path 440 downstream of the third water pump 443 (supply pipe 440B). It consists of piping. Note that valves (open / close valves, flow path adjusting valves) may be provided in the connection paths 444 and 445.
- the water pump 43 can be used in place of the third water pump 443 when water is not supplied from the supply pipe 40B to the water pump 43 by water supply by the parallel water pump 43B. That is, the water supply pump 43 can supply water to the cooler 44. Therefore, according to said structure, it can be set as the structure remove
- the exhaust gas cleaning system 20 described above is processed by a circulating fluid processing device 81 capable of removing impurities from the circulating fluid and the circulating fluid by the circulating fluid processing device 81 as shown in FIG.
- the liquid passage 80 to be treated described above is connected to the first branch 45 provided on the downstream side of the water supply pump 43 of the supply passage 40 and the circulating liquid treatment device 81. It includes a processing liquid path 83 and a second processing target liquid path 85 that connects the storage tank 61 and the circulating liquid processing apparatus 81.
- the to-be-processed liquid flow rate control valve 82 mentioned above is the 1st to-be-processed liquid flow rate control valve 84 comprised so that control of the flow volume of the to-be-processed liquid in the 1st to-be-processed liquid path 83 was possible, and 2nd to-be-processed liquid.
- a second processed liquid flow rate control valve 86 configured to be able to control the flow rate of the processed liquid in the passage 85.
- the circulating liquid processing target
- the 4th water supply pump 87 for sending liquid is provided.
- the impurities removed from the circulating liquid (liquid to be processed) in the circulating liquid processing apparatus 81 are stored in the impurity tank 100. Further, in the circulating liquid processing apparatus 81, the circulating liquid (processed liquid) from which impurities are removed is discharged from the processed liquid discharge path 102.
- the liquid discharge path 102 to be processed is a liquid pipe 102A to be processed that connects the circulating liquid processing apparatus 81 and the branching section 103, and a pipe that connects the branching section 103 to the middle of the discharge pipe 50B.
- a processing liquid pipe 102 ⁇ / b> B and a processing liquid pipe 102 ⁇ / b> C that connects the processing liquid tank 101 capable of storing the processing liquid and the branch portion 103 are included.
- the treated liquid pipe 102B is provided with a first treated liquid flow rate control valve 104 capable of controlling the flow rate of the treated liquid after being processed by the circulating liquid processing apparatus 81 flowing through the treated liquid pipe 102B.
- the treated liquid pipe 102C is provided with a second treated liquid flow rate control valve 105 capable of controlling the flow rate of the treated liquid after being processed by the circulating liquid processing apparatus 81 flowing through the treated liquid pipe 102C.
- the above-described first processed liquid flow rate control valve 104 is opened, and the above-described second processed liquid flow rate control valve 105 is closed. And the to-be-processed liquid discharged
- the circulating fluid remaining in the storage tank 61 can be processed and discharged via the second liquid passage 85 to be processed, the operation can be quickly switched to the open loop operation.
- the above-described second processed liquid flow rate control valve 105 is opened, and the above-described first processed liquid flow rate control valve 104 is closed. Then, the liquid to be processed discharged from the liquid discharge path 102 is sent to the liquid tank 101 through the liquid pipes 102A and 102C. After switching from the closed loop operation to the open loop operation, the liquid to be processed stored in the liquid tank 101 to be processed is sent to the discharged liquid processing apparatus 51 via the second liquid discharge path 106.
- the circulating liquid in which impurities are concentrated by repeatedly cleaning the exhaust gas is sent to the circulating liquid processing apparatus 81 via the processing liquid path 80 as the processing liquid to be processed by the circulating liquid processing apparatus 81.
- clogging and scaling of the pipes can be prevented, and stable operation becomes possible.
- the liquid passage 80 to be treated may include only one of the first liquid passage 83 to be treated and the second liquid passage 85 to be treated. Both the first treated liquid path 83 and the second treated liquid path 85 may not be included. Further, the above-described liquid passage 80 to be treated may include a liquid passage to be treated other than the first liquid passage 83 to be treated and the second liquid passage 85 to be treated.
- the exhaust gas cleaning system 20 described above further includes a specific gravity detector 67 capable of detecting the specific gravity of the cleaning liquid after cleaning the exhaust gas, as shown in FIG.
- the control part 21 mentioned above is the opening degree of the to-be-processed liquid flow control valve 82 (1st to-be-processed liquid flow control valve 84) according to the specific gravity of the washing
- the specific gravity detection device 67 is a hydrometer that detects the specific gravity of the cleaning liquid in the storage tank 61.
- the specific gravity detection device 67 is configured to supply cleaning liquid in the supply path 40 (supply pipes 40B, 40C), the circulation path 60 (circulation pipes 60A, 60B, 60C), the liquid pool 34A of the desulfurization tower 30, and the like. It may be a hydrometer that detects specific gravity.
- the control part 21 mentioned above controls the opening degree of the 2nd to-be-processed liquid flow control valve 86) according to the specific gravity of the washing
- the cleaning liquid (circulating liquid) in which impurities are concentrated by repeated exhaust gas cleaning tends to increase in specific gravity.
- the control unit 21 controls the opening degree of the liquid flow control valve 82 to be processed in accordance with the specific gravity of the cleaning liquid after cleaning the exhaust gas detected by the specific gravity detection device 67.
- a cleaning liquid (liquid to be processed) having an appropriate flow rate can be passed through the processing liquid path 80.
- By flowing a cleaning liquid (liquid to be processed) at an appropriate flow rate through the liquid path 80 to be processed it is possible to prevent clogging and scaling of the pipes (supply pipes 40B and 40C, circulation pipes 60A to 60C, etc.). Driving becomes possible.
- the processing amount of the processing liquid in the circulating liquid processing apparatus 81 can be reduced.
- FIG. 5 is a block diagram schematically showing the configuration of an exhaust gas cleaning system according to another embodiment.
- the exhaust gas cleaning system 20 described above further includes a liquid storage tank 90 that is provided in the liquid path 80 to be processed and can store the liquid to be processed.
- the liquid passage 80 to be treated is a second branch portion 88 provided between the first branch 45 in the first liquid passage 83 and the first liquid flow control valve 84 to be treated.
- 1 further includes a bypass passage 89 that branches from the first liquid passage 83 to be treated and is connected to the circulating fluid treatment device 81.
- the bypass passage 89 is provided with the above-mentioned liquid storage tank 90 to be processed that defines an internal space 91 for storing the circulating liquid (liquid to be processed) before being processed by the circulating liquid processing apparatus 81. .
- a bypass path inlet side flow rate control valve 92 capable of controlling the flow rate of the liquid to be treated sent to the liquid tank 90 to be treated via the bypass path 89 is provided upstream of the liquid tank 90 to be treated in the bypass path 89. It is done.
- the bypass path outlet side capable of controlling the flow rate of the to-be-treated liquid sent from the to-be-treated liquid storage tank 90 to the circulating liquid processing apparatus 81 via the bypass path 89.
- a flow control valve 93 is provided.
- the bypass passage inlet side flow control valve 92 is opened and the bypass passage outlet side flow control valve 93 is closed. For this reason, at the time of closed loop operation, a part of the liquid to be processed flowing through the first liquid liquid path 83 is sent to the liquid tank 90 to be processed via the bypass path 89 and stored in the liquid tank 90 to be processed. Is done.
- the bypass path inlet side flow control valve 92 After switching from closed loop operation to open loop operation, the bypass path inlet side flow control valve 92 is closed and the bypass path outlet side flow control valve 93 is opened. For this reason, the to-be-processed liquid stored in the to-be-processed liquid storage tank 90 at the time of closed loop operation is sent to the circulating liquid processing apparatus 81 at the time of an open loop operation.
- the exhaust gas cleaning system 20 stores a part of the liquid to be processed before being processed by the circulating liquid processing device 81 in the liquid tank 90 to be processed, so that the processing amount per unit time is reduced. Even the small and small circulating liquid processing apparatus 81 can process the liquid to be processed. Further, by reducing the size of the circulating fluid treatment device 81, it is possible to save the space of the exhaust gas cleaning system 20 and reduce the device cost.
- the liquid path 80 to be processed connects the first branch 45 provided on the downstream side of the water supply pump 43 of the supply path 40 and the circulating liquid processing apparatus 81.
- the first treated liquid path 83 described above is included.
- the above-mentioned to-be-processed liquid flow control valve 82 contains the above-mentioned 1st to-be-processed liquid flow control valve 84 comprised so that control of the flow of the to-be-processed liquid in the 1st to-be-processed liquid path 83 was possible.
- the exhaust gas cleaning system 20 controls the flow rate of the liquid to be treated in the first liquid flow path 83 by the first liquid flow rate control valve 84 so that the first liquid flow path 83 is controlled. Accordingly, the liquid to be processed can be flowed at an appropriate flow rate from the supply path 40 to the circulating liquid processing device 81. Moreover, since the 1st to-be-processed liquid path 83 is provided in the downstream rather than the water supply pump 43 of the supply path 40, the pump pressure of the water supply pump 43 acts on the to-be-processed liquid in the 1st to-be-processed liquid path 83.
- the 1st to-be-processed liquid path 83 where the pump pressure of the water pump 43 acts can enlarge the head and horizontal distance from the water pump 43 to the circulating liquid processing apparatus 81, Therefore
- the 1st to-be-processed liquid path The degree of freedom of 83 piping design can be increased.
- the above-described processing target liquid path 80 includes the above-described second processing target liquid path 85 that connects the storage tank 61 and the circulating liquid processing apparatus 81.
- the above-mentioned to-be-processed liquid flow control valve 82 contains the above-mentioned 2nd to-be-processed liquid flow control valve 86 comprised so that control of the flow of the to-be-processed liquid in the 2nd to-be-processed liquid path 85 is possible.
- the exhaust gas cleaning system 20 controls the flow rate of the liquid to be treated in the second liquid flow path 85 to be treated by the second liquid flow rate control valve 86, so that the second liquid passage 85 to be treated is controlled. Accordingly, the liquid to be processed can be flowed from the storage tank 61 to the circulating liquid processing apparatus 81 through the storage tank 61. Further, since the exhaust gas cleaning system 20 can flow the circulating liquid remaining in the storage tank 61 to the second liquid passage 85 after switching from the closed loop operation to the open loop operation, the closed loop operation is changed to the open loop operation. Switching to operation can be performed quickly.
- FIG. 6 is a diagram for explaining the control of the storage amount of the storage tank, and is a schematic sectional view of the storage tank.
- the control unit 21 described above has a storage amount of the cleaning liquid (circulating liquid) in the storage tank 61 between the range upper limit value RU and the range lower limit value RL as shown in FIG.
- the opening / closing control of the makeup water flow rate control valve 643 in the outboard water replenishing device 64 or the control for adjusting the opening of the valve is performed so as to fall within the range.
- control unit 21 described above is configured so that the storage amount of the cleaning liquid (circulating liquid) in the storage tank 61 approaches the target value T as shown in FIG.
- the opening / closing control of the makeup water flow rate control valve 643 at 64 or the control for adjusting the opening of the valve may be performed.
- control unit 21 described above is configured such that the second treated liquid flow rate control valve when the storage amount acquired by the storage amount acquisition device 63 exceeds the upper limit threshold UL as illustrated in FIG. 6. Control to open 86 is possible.
- the exhaust gas cleaning system 20 performs control to open the second liquid flow rate control valve 86 by the control unit 21 when the storage amount acquired by the storage amount acquisition device 63 exceeds the upper limit threshold UL. By doing so, excess circulating fluid stored in the storage tank 61 can be quickly discharged from the storage tank 61.
- the control unit 21 described above supplies the supply amount by the supply-side switching device 71 when the storage amount acquired by the storage amount acquisition device 63 is less than the lower limit threshold LL as shown in FIG. Control that switches the source to the outboard water taken by the water intake unit 41 is possible.
- the exhaust gas cleaning system 20 performs control to switch the supply-side switching device 71 by the control unit 21 when the storage amount acquired by the storage amount acquisition device 63 is less than the lower limit threshold LL. Since the supply source can be switched to the outboard water acquired by the water supply unit 41, the insufficient circulating fluid can be quickly supplied to the storage tank 61.
- FIG. 7 is a block diagram schematically showing the configuration of an exhaust gas cleaning system according to another embodiment.
- the supply-side switching device 71 described above includes a first supply-side two-way valve 75 provided between the junction 42 and the water supply pump 43 in the supply path 40, as shown in FIG.
- the second supply side two-way valve 76 provided between the storage tank 61 and the junction 42 in the circulation path 60 is included.
- Each of the first supply side two-way valve 75 and the second supply side two-way valve 76 is electrically connected to the control unit 21.
- Each of the first supply side two-way valve 75 and the second supply side two-way valve 76 can switch the supply source of the cleaning liquid by performing valve opening / closing control according to a signal transmitted from the control unit 21. is there.
- the first supply side two-way valve 75 may be provided between the water intake section 41 and the merge section 42 in the supply path 40.
- the discharge side switching device 72 described above includes a first discharge side 2 provided between the branch portion 52 and the discharge liquid processing device 51 in the discharge path 50, as shown in FIG. And a second discharge side two-way valve 78 provided between the branch portion 52 and the storage tank 61 in the circulation path 60.
- Each of the first discharge side two-way valve 77 and the second discharge side two-way valve 78 is electrically connected to the control unit 21.
- Each of the first discharge side two-way valve 77 and the second discharge side two-way valve 78 performs opening / closing control of the valve in accordance with a signal transmitted from the control unit 21, thereby cleaning liquid discharged from the desulfurization tower 30.
- the outflow destination can be switched.
- the supply path 40 connects the supply pipe 40 ⁇ / b> D that connects the water intake unit 41 and the first supply-side two-way valve 75, and the first supply-side two-way valve 75 and the water supply pump 43.
- the supply pipe 40E and the supply pipe 40C described above are included.
- the discharge path 50 includes a discharge pipe 50C that connects the desulfurization tower 30 and the branching section 52, a discharge pipe 50D that connects the branching section 52 and the first discharge-side two-way valve 77, and a first discharge-side two-way valve 77
- a discharge pipe 50 ⁇ / b> E connecting the discharge liquid processing apparatus 51 is included.
- the circulation path 60 is a common pipe and the above-described discharge pipe 50C, a circulation pipe 60D that connects the desulfurization tower 30 and the branch part 52, and a circulation pipe that connects the branch part 52 and the second discharge-side two-way valve 78.
- 60E a circulation pipe 60F connecting the second discharge side two-way valve 78 and the storage tank 61, a circulation pipe 60G connecting the storage tank 61 and the second supply side two-way valve 76, and a second supply side two-way valve
- a circulation pipe 60 ⁇ / b> H that connects 76 and the joining portion 42 is included.
- FIG. 8 is a block diagram schematically showing the configuration of an exhaust gas cleaning system according to another embodiment.
- the desulfurization tower 30 described above includes a liquid pool portion 34A located below the gas-liquid contact portion 38 and a position below the liquid pool portion 34A.
- a storage tank 61 (storage tank 61A) is defined inside.
- the desulfurization tower 30 and the storage tank 61 are integrally formed.
- the internal space 34 and the internal space 62 are partitioned by the intermediate plate portion 311 constituting the bottom surface of the liquid pool portion 34 ⁇ / b> A and extending along the horizontal direction.
- the above-described liquid pool portion 34 ⁇ / b> A and the above-described storage tank 61 ⁇ / b> A are formed inside the desulfurization tower 30.
- the discharge path 50 includes a discharge pipe 50F connecting the desulfurization tower 30 and the first discharge side two-way valve 77, and the above-described discharge pipe 50E.
- the circulation path 60 includes a circulation pipe 60J connected to the liquid pool portion 34A and the internal space 62, and the above-described circulation pipe 60C.
- the discharge side switching device 72 described above includes a first discharge side two-way valve 77 provided between the desulfurization tower 30 and the discharge liquid processing device 51 in the discharge path 50 described above, A third discharge side two-way valve 79 provided between the liquid pool portion 34A and the internal space 62 in the circulation path 60 (circulation pipe 60J).
- Each of the first discharge side two-way valve 77 and the third discharge side two-way valve 79 is electrically connected to the control unit 21.
- Each of the first discharge side two-way valve 77 and the third discharge side two-way valve 79 performs the opening / closing control of the valve in accordance with a signal transmitted from the control unit 21, thereby cleaning liquid discharged from the desulfurization tower 30.
- the outflow destination can be switched.
- FIG. 9 is a flowchart for explaining an operation method of the exhaust gas cleaning system according to the embodiment.
- FIG. 10 is a flowchart for explaining an operation method of the exhaust gas cleaning system according to another embodiment.
- the operation method 200 ⁇ / b> A, 200 ⁇ / b> B of the exhaust gas cleaning system is an operation method of the above-described exhaust gas cleaning system 20 for cleaning the exhaust gas discharged from the exhaust gas generator 10 mounted on the ship 1. It is.
- the exhaust gas cleaning system 20 in the operation methods 200A and 200B of the exhaust gas cleaning system includes, for example, the above-described desulfurization tower 30, the above-described water intake unit 41, the above-described supply path 40, and the above-described water supply pump as illustrated in FIG. 43, the discharge path 50 described above, the circulation path 60 described above, the supply side switching device 71 described above, and the discharge side switching device 72 described above.
- the exhaust gas cleaning system operating method 200A includes the first supply source switching step S201 described above and the first outlet switching step S202 described above. .
- the supply source of the cleaning liquid is returned from the outboard water taken by the water intake unit 41 to the supply path 40 via the circulation path 60 by the supply side switching device 71.
- the first supply source switching step S201 for switching to the circulating fluid and the first outlet switching step S202 for switching the discharge destination of the cleaning liquid from the discharge path 50 to the circulation path 60 by the discharge side switching device 72 exhaust gas cleaning is performed.
- the operating state of the system 20 can be switched from open loop operation to closed loop operation.
- the exhaust gas cleaning system 20 in the operation method 200A of the exhaust gas cleaning system further includes the above-described storage tank 61 and the above-described storage amount acquisition device 63 as illustrated in FIG. 3, for example. Yes.
- the exhaust gas cleaning system operating method 200 ⁇ / b> A according to some embodiments further includes a storage amount acquisition step S ⁇ b> 203 for acquiring the amount of circulating fluid stored by the storage amount acquisition device 63 described above.
- the first supply source switching step S201 described above is performed after the first outflow destination switching step S202 and after the storage amount acquired by the storage amount acquisition step S203 exceeds a predetermined amount.
- the exhaust gas cleaning system operation method 200 ⁇ / b> A further includes a storage amount determination step S ⁇ b> 204 that determines whether or not the storage amount acquired in the storage amount acquisition step S ⁇ b> 203 exceeds a predetermined amount. Yes.
- the storage amount does not exceed the predetermined amount in the storage amount determination step S204 (“NO” in S204)
- the above-described storage amount acquisition step S203 is performed again.
- the storage amount exceeds the predetermined amount in the storage amount determination step S204 (“YES” in S204)
- the first supply source switching step S201 described above is performed.
- the operation method 200A of the exhaust gas cleaning system can acquire the storage amount of the circulating fluid in the storage tank 61 in the storage amount acquisition step S203.
- the first supply source switching step S201 is performed after the first outflow destination switching step S202 and after the storage amount in the storage tank 61 exceeds a predetermined amount.
- a sufficient amount of circulating fluid is stored in the storage tank 61 when the cleaning liquid supply source is switched from outboard water to circulating fluid. It is possible to suppress a reduction in exhaust gas cleaning ability due to the above.
- the first supply source switching step S201 may be executed after a predetermined period of time has elapsed since the execution of the first outflow destination switching step S202. In this case, it is possible to simplify the operation method 200A of the exhaust gas cleaning system by assuming that a predetermined amount or more of the cleaning liquid is stored in the storage tank 61 after a predetermined period.
- the exhaust gas cleaning system operation method 200 ⁇ / b> B includes the above-described second supply source switching step S ⁇ b> 301 and the above-described second outflow destination switching step S ⁇ b> 302. .
- the exhaust gas cleaning system operation method 200 ⁇ / b> B uses the supply side switching device 71 to supply the cleaning liquid as the supply source of the cleaning liquid from the circulating liquid returned to the supply path 40 via the circulation path 60.
- the second supply source switching step S301 for switching to water and the second outlet switching step S302 for switching the discharge destination of the cleaning liquid from the circulation path 60 to the discharge path 50 by the discharge side switching device 72 the exhaust gas cleaning system.
- the 20 operating states can be switched from closed loop operation to open loop operation.
- the downstream portion (supply pipes 40B and 40C) of the supply path 40 and the desulfurization tower 30 are shared facilities that are used in any of the operating states of the open loop operation and the closed loop operation. Therefore, the dirty circulating liquid remaining in the pipe (the supply pipes 40B and 40C, the circulating pipes 60A to 60C, etc.) through which the circulating liquid flows in the closed loop operation and the liquid pool part 34A at the bottom of the desulfurization tower 30 can be washed away. More specifically, by performing the above-described second supply source switching step S301, dirt existing in the pipe (supply pipes 40B, 40C, circulation pipes 60A to 60C, etc.) and in the liquid pool part 34A at the bottom of the desulfurization tower 30 is obtained.
- the timing of the transition from the second supply source switching step S301 described above to the second outlet destination switching step S302 described above is present in the piping (supply pipes 40B, 40C, circulation pipes 60A-60C, etc.) and the liquid pool 34A.
- the time required for replacing all of the circulating fluid to be replaced with the outboard water may be used as a guide, and the above-described control unit 21 may use the above-described second outflow destination switching step using the above-described required time as a guide.
- S302 may be executed.
- the exhaust gas cleaning system 20 in the operation method 200B of the exhaust gas cleaning system includes, for example, the above-described storage tank 61, the above-described circulating liquid processing device 81, and the above-described second system as illustrated in FIG.
- the liquid passage 85 to be treated (liquid passage 80 to be treated) and the second liquid flow control valve 86 (liquid flow control valve 82 to be treated) described above are further provided.
- the exhaust gas cleaning system operation method 200 ⁇ / b> B includes a second treated liquid flow rate control after the second supply source switching step S ⁇ b> 301 and the second outflow destination switching step S ⁇ b> 302.
- a circulating fluid discharge step S303 is also provided in which the valve 86 (processed liquid flow rate control valve 82) is opened and the circulating fluid stored in the storage tank 61 is sent to the circulating fluid processing device 81.
- the operation method 200B of the exhaust gas cleaning system is configured such that the second treated liquid flow rate control valve 86 (treated liquid flow rate control is performed after the second supply source switching step S301 and the second outlet switching step S302. Since the valve 82) is further opened and the circulating fluid discharge step S303 for sending the circulating fluid stored in the storage tank 61 to the circulating fluid processing device 81 is further provided, the operating state of the exhaust gas cleaning system 20 is changed from closed loop operation to open loop. When switching to operation, the circulating fluid remaining in the storage tank 61 can be discharged to the circulating fluid processing device 81 located outside the storage tank 61.
- the present invention is not limited to the above-described embodiments, and includes forms obtained by modifying the above-described embodiments and forms obtained by appropriately combining these forms.
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Abstract
Description
船舶に搭載される排ガス発生装置から排出される排ガスを洗浄するための排ガス洗浄システムであって、
上記排ガスに洗浄液を接触させる気液接触部を内部に画定する脱硫塔と、
船体の外部から船外水を取水するための取水部と、
上記取水部と上記脱硫塔とを接続する供給路と、
上記脱硫塔から排出される上記洗浄液を上記船体の外部に排出するための排出路と、
上記脱硫塔から排出される上記洗浄液を循環液として上記供給路に還流させるための循環路であって、上記供給路と合流部において合流する循環路と、
上記脱硫塔に供給される上記洗浄液の供給源を、上記取水部で取水した上記船外水、又は、上記循環路を介して上記供給路に還流された上記循環液の何れか一方に切り替えるための供給側切替装置と、
上記脱硫塔から排出される上記洗浄液の流出先を、上記排出路、又は、上記循環路の何れか一方に切り替えるための排出側切替装置と、を備える。
さらに、貯留タンクに循環液を貯留することで、クローズドループ運転時に脱硫塔に循環液を安定して供給可能である。また、クローズドループ運転からオープンループ運転に運転状態を切り替える際に、循環路に残った循環液を貯留タンクに貯留することで、上記運転状態の切り替えを迅速に行うことができる。
船舶に搭載される排ガス発生装置から排出される排ガスを洗浄するための排ガス洗浄システムの運用方法であって、
上記排ガス洗浄システムは、
上記排ガスに洗浄液を接触させる気液接触部を内部に画定する脱硫塔と、
船体の外部から船外水を取水するための取水部と、
上記取水部と上記脱硫塔とを接続する供給路と、
上記脱硫塔から排出される上記洗浄液を上記船体の外部に排出するための排出路と、
上記脱硫塔から排出される上記洗浄液を循環液として上記供給路に還流させるための循環路であって、上記供給路と合流部において合流する循環路と、
上記供給路における上記合流部よりも下流側に設けられた送水ポンプと、
上記脱硫塔に供給される上記洗浄液の供給源を、上記取水部で取水した上記船外水、又は、上記循環路を介して上記供給路に還流された上記循環液の何れか一方に切り替えるための供給側切替装置と、
上記脱硫塔から排出される上記洗浄液の流出先を、上記排出路、又は、上記循環路の何れか一方に切り替えるための排出側切替装置と、を備え、
上記排ガス洗浄システムの運用方法は、
上記供給側切替装置により上記洗浄液の上記供給源を、上記取水部で取水した上記船外水から上記循環路を介して上記供給路に還流された上記循環液に切り替える第1供給源切替ステップと、
上記排出側切替装置により上記洗浄液の上記流出先を、上記排出路から上記循環路に切り替える第1流出先切替ステップと、を備える。
船舶に搭載される排ガス発生装置から排出される排ガスを洗浄するための排ガス洗浄システムの運用方法であって、
上記排ガス洗浄システムは、
上記排ガスに洗浄液を接触させる気液接触部を内部に画定する脱硫塔と、
船体の外部から船外水を取水するための取水部と、
上記取水部と上記脱硫塔とを接続する供給路と、
上記脱硫塔から排出される上記洗浄液を上記船体の外部に排出するための排出路と、
上記脱硫塔から排出される上記洗浄液を循環液として上記供給路に還流させるための循環路であって、上記供給路と合流部において合流する循環路と、
上記供給路における上記合流部よりも下流側に設けられた送水ポンプと、
上記脱硫塔に供給される上記洗浄液の供給源を、上記取水部で取水した上記船外水、又は、上記循環路を介して上記供給路に還流された上記循環液の何れか一方に切り替えるための供給側切替装置と、
上記脱硫塔から排出される上記洗浄液の流出先を、上記排出路、又は、上記循環路の何れか一方に切り替えるための排出側切替装置と、を備え、
上記排ガス洗浄システムの運用方法は、
上記供給側切替装置により上記洗浄液の上記供給源を、上記循環路を介して上記供給路に還流された上記循環液から上記取水部で取水した上記船外水に切り替える第2供給源切替ステップと、
上記排出側切替装置により上記洗浄液の上記流出先を、上記循環路から上記排出路に切り替える第2流出先切替ステップと、を備える。
例えば、「ある方向に」、「ある方向に沿って」、「平行」、「直交」、「中心」、「同心」或いは「同軸」等の相対的或いは絶対的な配置を表す表現は、厳密にそのような配置を表すのみならず、公差、若しくは、同じ機能が得られる程度の角度や距離をもって相対的に変位している状態も表すものとする。
例えば、「同一」、「等しい」及び「均質」等の物事が等しい状態であることを表す表現は、厳密に等しい状態を表すのみならず、公差、若しくは、同じ機能が得られる程度の差が存在している状態も表すものとする。
例えば、四角形状や円筒形状等の形状を表す表現は、幾何学的に厳密な意味での四角形状や円筒形状等の形状を表すのみならず、同じ効果が得られる範囲で、凹凸部や面取り部等を含む形状も表すものとする。
一方、一の構成要素を「備える」、「具える」、「具備する」、「含む」、又は、「有する」という表現は、他の構成要素の存在を除外する排他的な表現ではない。
なお、同様の構成については同じ符号を付し説明を省略することがある。
2 船体
3 上甲板
4 船側外板
5 船底外板
6 居住区
7 鋼板構造物
8 機関室
10 排ガス発生装置
11 主機関
12 補助機関
20,20A 排ガス洗浄システム
20 船舶用脱硫装置
21 制御部
30 脱流塔
40 供給路
41 取水部
42 合流部
43 送水ポンプ
44 クーラー
50 排出路
51 排出液処理装置
60 循環路
61,61A 貯留タンク
63 貯留量取得装置
64 船外水補給装置
65 pH値検出装置
66 中和剤添加装置
67 比重検出装置
71 供給側切替装置
72 排出側切替装置
80 被処理液路
81 循環液処理装置
90 被処理液貯留タンク
200A,200B 排ガス洗浄システムの運用方法
LL 下限閾値
RL 範囲下限値
RU 範囲上限値
T 目標値
UL 上限閾値
Claims (16)
- 船舶に搭載される排ガス発生装置から排出される排ガスを洗浄するための排ガス洗浄システムであって、
前記排ガスに洗浄液を接触させる気液接触部を内部に画定する脱硫塔と、
船体の外部から船外水を取水するための取水部と、
前記取水部と前記脱硫塔とを接続する供給路と、
前記脱硫塔から排出される前記洗浄液を前記船体の外部に排出するための排出路と、
前記脱硫塔から排出される前記洗浄液を循環液として前記供給路に還流させるための循環路であって、前記供給路と合流部において合流する循環路と、
前記脱硫塔に供給される前記洗浄液の供給源を、前記取水部で取水した前記船外水、又は、前記循環路を介して前記供給路に還流された前記循環液の何れか一方に切り替えるための供給側切替装置と、
前記脱硫塔から排出される前記洗浄液の流出先を、前記排出路、又は、前記循環路の何れか一方に切り替えるための排出側切替装置と、を備える
排ガス洗浄システム。 - 前記供給路における前記合流部よりも下流側に設けられた送水ポンプと、
前記循環路に設けられるとともに前記循環液を貯留可能な貯留タンクと、をさらに備える
請求項1に記載の排ガス洗浄システム。 - 前記貯留タンクにおける前記循環液の貯留量を取得可能に構成されている貯留量取得装置と、
前記貯留タンクに前記船外水を補給可能に構成されている船外水補給装置と、
前記貯留量取得装置で取得される前記貯留量に応じて、前記船外水補給装置による前記貯留タンクへの前記船外水の補給量を制御する制御部と、をさらに備える
請求項2に記載の排ガス洗浄システム。 - 前記貯留タンクにおける前記循環液のpH値を検出可能に構成されているpH値検出装置と、
前記貯留タンクに中和剤を添加可能に構成されている中和剤添加装置と、をさらに備え、
前記制御部は、前記pH値検出装置で検出される前記pH値に応じて、前記中和剤添加装置による前記中和剤の添加量の制御を行うように構成されている
請求項3に記載の排ガス洗浄システム。 - 前記循環液から不純物を除去可能な循環液処理装置と、
前記循環液を前記循環液処理装置により処理される被処理液として前記循環液処理装置に送るための被処理液路と、
前記被処理液路における前記被処理液の流量を制御可能に構成されている被処理液流量制御弁と、をさらに備える
請求項3又は4に記載の排ガス洗浄システム。 - 前記排ガスを洗浄後の前記洗浄液の比重を検出可能な比重検出装置をさらに備え、
前記制御部は、前記比重検出装置で検出される前記排ガスを洗浄後の前記洗浄液の比重に応じた、前記被処理液流量制御弁の開度の制御が可能に構成されている
請求項5に記載の排ガス洗浄システム。 - 前記被処理液路に設けられるとともに前記被処理液を貯留可能な被処理液貯留タンクをさらに備える
請求項5又は6に記載の排ガス洗浄システム。 - 前記被処理液路は、前記供給路の前記送水ポンプよりも下流側に設けられる第1分岐部と前記循環液処理装置とを接続する第1被処理液路を含み、
前記被処理液流量制御弁は、前記第1被処理液路における前記被処理液の流量を制御可能に構成されている第1被処理液流量制御弁を含む
請求項5乃至7の何れか1項に記載の排ガス洗浄システム。 - 前記被処理液路は、前記貯留タンクと前記循環液処理装置とを接続する第2被処理液路を含み、
前記被処理液流量制御弁は、前記第2被処理液路における前記被処理液の流量を制御可能に構成されている第2被処理液流量制御弁を含む
請求項5乃至8の何れか1項に記載の排ガス洗浄システム。 - 前記制御部は、前記貯留量取得装置で取得される前記貯留量が上限閾値を超える場合に、前記第2被処理液流量制御弁を開く制御が可能に構成されている
請求項9に記載の排ガス洗浄システム。 - 前記制御部は、前記貯留量取得装置で取得される前記貯留量が下限閾値に満たない場合に、前記供給側切替装置による前記供給源を前記取水部で取水した前記船外水に切り替える制御が可能に構成されている
請求項3乃至10の何れか1項に記載の排ガス洗浄システム。 - 前記脱硫塔は、前記気液接触部よりも下方に位置する液だまり部と、前記液だまり部よりも下方に位置する前記貯留タンクと、をさらに内部に画定する
請求項2乃至11の何れか1項に記載の排ガス洗浄システム。 - 船舶に搭載される排ガス発生装置から排出される排ガスを洗浄するための排ガス洗浄システムの運用方法であって、
前記排ガス洗浄システムは、
前記排ガスに洗浄液を接触させる気液接触部を内部に画定する脱硫塔と、
船体の外部から船外水を取水するための取水部と、
前記取水部と前記脱硫塔とを接続する供給路と、
前記脱硫塔から排出される前記洗浄液を前記船体の外部に排出するための排出路と、
前記脱硫塔から排出される前記洗浄液を循環液として前記供給路に還流させるための循環路であって、前記供給路と合流部において合流する循環路と、
前記供給路における前記合流部よりも下流側に設けられた送水ポンプと、
前記脱硫塔に供給される前記洗浄液の供給源を、前記取水部で取水した前記船外水、又は、前記循環路を介して前記供給路に還流された前記循環液の何れか一方に切り替えるための供給側切替装置と、
前記脱硫塔から排出される前記洗浄液の流出先を、前記排出路、又は、前記循環路の何れか一方に切り替えるための排出側切替装置と、を備え、
前記排ガス洗浄システムの運用方法は、
前記供給側切替装置により前記洗浄液の前記供給源を、前記取水部で取水した前記船外水から前記循環路を介して前記供給路に還流された前記循環液に切り替える第1供給源切替ステップと、
前記排出側切替装置により前記洗浄液の前記流出先を、前記排出路から前記循環路に切り替える第1流出先切替ステップと、を備える
排ガス洗浄システムの運用方法。 - 前記排ガス洗浄システムは、
前記循環路に設けられるとともに前記循環液を貯留可能な貯留タンクと、
前記貯留タンクにおける前記循環液の貯留量を取得可能に構成されている貯留量取得装置と、をさらに備え、
前記排ガス洗浄システムの運用方法は、
前記貯留量取得装置により前記循環液の前記貯留量を取得する貯留量取得ステップをさらに備え、
前記第1供給源切替ステップは、前記第1流出先切替ステップよりも後、且つ前記貯留量取得ステップにより取得される前記貯留量が所定量を超えた後に行われる
請求項13に記載の排ガス洗浄システムの運用方法。 - 船舶に搭載される排ガス発生装置から排出される排ガスを洗浄するための排ガス洗浄システムの運用方法であって、
前記排ガス洗浄システムは、
前記排ガスに洗浄液を接触させる気液接触部を内部に画定する脱硫塔と、
船体の外部から船外水を取水するための取水部と、
前記取水部と前記脱硫塔とを接続する供給路と、
前記脱硫塔から排出される前記洗浄液を前記船体の外部に排出するための排出路と、
前記脱硫塔から排出される前記洗浄液を循環液として前記供給路に還流させるための循環路であって、前記供給路と合流部において合流する循環路と、
前記供給路における前記合流部よりも下流側に設けられた送水ポンプと、
前記脱硫塔に供給される前記洗浄液の供給源を、前記取水部で取水した前記船外水、又は、前記循環路を介して前記供給路に還流された前記循環液の何れか一方に切り替えるための供給側切替装置と、
前記脱硫塔から排出される前記洗浄液の流出先を、前記排出路、又は、前記循環路の何れか一方に切り替えるための排出側切替装置と、を備え、
前記排ガス洗浄システムの運用方法は、
前記供給側切替装置により前記洗浄液の前記供給源を、前記循環路を介して前記供給路に還流された前記循環液から前記取水部で取水した前記船外水に切り替える第2供給源切替ステップと、
前記排出側切替装置により前記洗浄液の前記流出先を、前記循環路から前記排出路に切り替える第2流出先切替ステップと、を備える
排ガス洗浄システムの運用方法。 - 前記排ガス洗浄システムは、
前記循環路に設けられるとともに前記循環液を貯留可能な貯留タンクと、
前記循環液から不純物を除去可能な循環液処理装置と、
前記循環液を前記循環液処理装置により処理される被処理液として前記循環液処理装置に送るための被処理液路であって、前記貯留タンクと前記循環液処理装置とを接続する被処理液路と、
前記被処理液路における前記被処理液の流量を制御可能に構成されている被処理液流量制御弁と、をさらに備え、
前記排ガス洗浄システムの運用方法は、
前記第2供給源切替ステップおよび前記第2流出先切替ステップよりも後に、前記被処理液流量制御弁を開いて、前記貯留タンクに貯留される前記循環液を前記循環液処理装置に送る循環液排出ステップをさらに備える
請求項15に記載の排ガス洗浄システムの運用方法。
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CN113788135A (zh) * | 2021-08-17 | 2021-12-14 | 中船澄西船舶修造有限公司 | 一种船舶用脱硫系统电源切断脱钩保护体统 |
WO2022049930A1 (ja) | 2020-09-04 | 2022-03-10 | 富士電機株式会社 | 排ガス処理装置及び排ガス処理装置の排ガス処理方法 |
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