WO2019149220A1 - 液箱和液体循环装置 - Google Patents

液箱和液体循环装置 Download PDF

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Publication number
WO2019149220A1
WO2019149220A1 PCT/CN2019/073911 CN2019073911W WO2019149220A1 WO 2019149220 A1 WO2019149220 A1 WO 2019149220A1 CN 2019073911 W CN2019073911 W CN 2019073911W WO 2019149220 A1 WO2019149220 A1 WO 2019149220A1
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Prior art keywords
liquid
liquid tank
plate
exhaust pipe
chamber
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PCT/CN2019/073911
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English (en)
French (fr)
Inventor
刘伟
高玉英
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上海微电子装备（集团）股份有限公司
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Publication of WO2019149220A1 publication Critical patent/WO2019149220A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/02—Foam dispersion or prevention

Definitions

  • the present disclosure relates to the field of liquid circulation systems, for example, to a liquid tank and a liquid circulation device.
  • Liquid circulation systems or equipment are widely used in various industries, such as: fan coil system in the HVAC industry, lithography environment subsystem in the semiconductor industry, and external auxiliary liquid temperature control equipment in the etching machine.
  • liquid circulation system is an important guarantee to ensure the normal operation of the equipment.
  • liquid circulation systems need to continuously and reliably provide a working environment for the lithography machine to function properly.
  • the present disclosure proposes a liquid tank and a liquid circulation device that can be automatically vented to prevent generated bubbles from entering the liquid circulation line and can reduce the risk of liquid leakage.
  • An embodiment provides a liquid tank including a tank body, a partition plate disposed in the tank body, and an exhaust pipe connecting the inside of the tank body and the external environment; wherein the tank body includes a liquid inlet chamber partitioned by the partition plate And a liquid discharge chamber, a bottom of the liquid inlet chamber is in communication with a bottom portion of the liquid discharge chamber, and a top portion of the liquid inlet chamber is in communication with a top portion of the liquid discharge chamber;
  • the separator is configured to block bubbles generated in the inlet chamber from flowing to the outlet chamber, the exhaust tube being configured to discharge the overflowing bubbles.
  • An embodiment also provides a liquid circulation device comprising the above described liquid tank.
  • Figure 1 is a front elevational view of a liquid tank provided by an embodiment
  • Figure 2 is a side view of the liquid tank of Figure 1;
  • Figure 3 is a front elevational view of another liquid tank provided by an embodiment
  • FIG. 4 is a side view of another tank of Figure 1;
  • FIG. 5 is a side view of another tank of Figure 1;
  • Figure 6 is a front elevational view of another liquid tank provided by an embodiment
  • Figure 7 is a side view of the liquid tank of Figure 6;
  • Figure 8 is a front elevational view of another liquid tank according to an embodiment
  • Figure 9 is a side view of the liquid tank of Figure 8.
  • Figure 10 is a front elevational view of another liquid tank provided by an embodiment
  • Figure 11 is a side view of the liquid tank of Figure 10;
  • Figure 12 is a schematic view showing the position of an exhaust pipe according to an embodiment
  • Figure 13 is a schematic view showing the position of another exhaust pipe according to an embodiment
  • Figure 14 is a block diagram showing the structure of a liquid circulation device according to an embodiment
  • Figure 15 is a schematic view showing the structure of a liquid circulation device according to an embodiment.
  • FIG. 1 is a front view of a liquid tank provided by the present embodiment; and FIG. 2 is a side view of the liquid tank of FIG.
  • the tank is suitable for use in a liquid circulation device and is configured to store a liquid for circulation in a liquid circulation device.
  • the tank 1 includes a tank 100, a partitioning plate 101 disposed in the casing 100, and an exhaust pipe 102 that communicates the inside of the casing 100 with the external environment.
  • the partitioning plate 101 divides the tank 100 into an inlet chamber 200 and an outlet chamber 300.
  • the bottom of the inlet chamber 200 communicates with the bottom of the outlet chamber 300, and the top of the inlet chamber 200 communicates with the top of the outlet chamber 300.
  • the partitioning plate 101 is disposed to block the bubble generated in the liquid inlet chamber 200 from flowing to the liquid discharge chamber 300, and the exhaust pipe 102 is disposed to discharge the overflowed air bubbles.
  • the box body 100 is a closed box body, and the position of the partitioning plate 101 can be set according to the actual situation inside the box body 100 (such as a liquid return tube and a refilling tube communicating with the liquid inlet chamber 200, and the liquid discharging chamber 300).
  • the position of the connected water pump) and the space are set, and the position of the partition plate 101 is such that the liquid discharge chamber 300 separated from the liquid in the liquid tank 1 by the partition plate 101 enters the liquid circulation line without affecting other components. Just fine.
  • the bottom of the liquid inlet chamber 200 communicates with the bottom of the liquid discharge chamber 300 to ensure smooth liquid flow, and the liquid entering the liquid inlet chamber 200 flows out of the liquid discharge chamber 300 to form a liquid circulation circuit; the top of the liquid inlet chamber 200 is The top of the liquid discharge chamber 300 is connected to ensure the same air pressure at the liquid level of the liquid inlet chamber 200 and the liquid level of the liquid outlet chamber 300, so as to ensure the working liquid level of the liquid in the entire liquid tank 1 is uniform.
  • the spatial layout of the exhaust pipe 102 is facilitated, and the air inlet 1022 of the exhaust pipe 102 can be arbitrarily placed at the top communication space of the casing 100.
  • the liquid in the liquid inlet chamber 200 is greatly disturbed.
  • the bubbles generated by the bubbles flow to the liquid discharge chamber 300 are blocked by the partition plate 101. Thereafter, the partial bubbles will rise in the liquid in the liquid inlet chamber 200 and float out of the liquid surface, and the formed gas may pass through the exhaust pipe.
  • the spacer 101 is sized and positioned to ensure that the bubble cannot reach the lower edge of the spacer 101, i.e., the bubble cannot enter through the area of the bottom of the inlet chamber 200 that communicates with the bottom of the outlet chamber 300. Liquid chamber 300.
  • FIG. 2 exemplarily illustrates that the liquid tank 1 includes the exhaust pipe 102, but the specific structure and position of the exhaust pipe 102 are not limited.
  • the liquid tank 1 provided in this embodiment is provided with a partition plate 101 in the tank 100 of the liquid tank 1, so that the air bubbles generated by the partition plate 101 in the liquid inlet chamber 200 flow to the liquid discharge chamber 300, and the air bubbles are in the liquid inlet chamber 200.
  • the liquid rises and floats out of the liquid surface, and the formed gas is discharged out of the liquid tank 1 through the exhaust pipe 102, thereby realizing automatic exhausting, reducing the risk of liquid leakage during manual exhausting, and avoiding the flow of bubbles into the liquid discharge chamber and entering the liquid.
  • Circulating piping to prevent air bubble damage (gas decoration) of the liquid pump effectively protecting the flow components (pump body, pump cover, impeller, seal ring, pump shaft and bushing, etc.).
  • the above tank 1 may further include a liquid inlet 103 communicating with the inlet chamber 200, the lower edge of the separator 101 being lower than the inlet port 103.
  • the partitioning plate 101 can more easily prevent the liquid entering the liquid inlet chamber 200 from the liquid inlet 103 from being disturbed to form a bubble.
  • the liquid inlet 103 may include a fluid replacement port 1031 and a liquid return port 1032. The circulating liquid may flow back from the liquid return port 1032 to the liquid inlet chamber 200 through the liquid return pipe 105. When the liquid needs to be replenished, the liquid replacement port 104 may be used to refill the liquid supply port.
  • the partitioning plate 101 injects liquid into the inlet chamber 200.
  • the lower edge of the partitioning plate 101 is lower than the liquid inlet port 103.
  • the partitioning plate 101 can be made more.
  • the space of the partition plate 101 of the present embodiment may also be flush with the liquid inlet port 103 or even higher than the liquid inlet port 103, as long as the position of the partition plate 101 is properly set, the air bubbles flowing to the liquid discharge chamber 300 are The isolation plate 101 can be completely blocked.
  • both sides of the spacer 101 in the embodiment may directly extend to the inner wall of the box 100 and be fixedly connected to the box 100 , wherein the spacer 101 may be welded, riveted or screwed.
  • the form is fixed to the box.
  • at least one side of the insulation panel 101 may not be directly connected to the cabinet 100, but may be fixed to the cabinet 100 by a fixing bracket.
  • the two sides of the partitioning plate 101 are not directly connected to the casing 100, and both sides of the partitioning plate 101 are fixed to the casing 100 through the fixing bracket 107, and the fixing brackets on each side of the partitioning plate 101 are fixed.
  • the number of 107s may be one or more.
  • the structure of the spacer 101 shown in FIG. 1 is employed in an embodiment to reduce the design burden.
  • the spacer may be vertically or obliquely disposed, wherein the tilt in the embodiment refers to tilting up and down, and is at a non-zero angle with the vertical.
  • the partitioning plate 101 is vertically disposed; referring to FIG. 4, the partitioning plate 101 is disposed obliquely at a non-zero angle with respect to the vertical direction.
  • the lower portion of the partitioning plate 101 may be inclined to the liquid discharge chamber 300. It is also possible to tilt toward the inlet chamber 200.
  • the partitioning plate 101 when the partitioning plate 101 is vertically or obliquely disposed, it may be inclined forward and backward, that is, the partitioning plate 101 is not perpendicular to the side wall of the fixed partitioning plate 101 on the casing.
  • the partitioning plate 101 when the partitioning plate 101 is vertically disposed and inclined forward and backward, and the front and rear refers to the left-right direction in FIG. 2, FIG. 4, or FIG.
  • one or more grid plates may be disposed on the separator 101.
  • the partitioning plate 101 includes a grille portion 500, and the grille portion 500 includes at least one grille plate 108 which is spaced apart from top to bottom (i.e., two grid plates adjacent to each other) 108 has a certain spacing, the gap between the upper and lower adjacent grid plates 108 is the communication region between the inlet chamber 200 and the outlet chamber 300), and both sides of the grid plate 108 are fixed on the partition plate 101; 108 extends obliquely downward in the liquid discharge chamber 300 (refer to FIG.
  • the grid plate 108 extends obliquely upward in the liquid inlet chamber 200, that is, the partitioning plate 101 is Non-zero angle.
  • the grid plate 108 is inclined downwardly in the outlet chamber 300, a part of the bubbles will be blocked by the downwardly inclined grid plate 108 after entering the communication region between the upper and lower adjacent grid plates 108, and then the bubbles It rises along the grid plate 108, returns to the liquid inlet chamber 200, and rises to the liquid level in the liquid in the liquid inlet chamber 200.
  • the spacing between the upper and lower adjacent grid plates 108 is less than the length of the grid plate 108 in the vertical direction, which further prevents the air bubbles from connecting from the upper and lower adjacent grid plates 108. Enter the liquid outlet chamber 300.
  • the area of the grill portion 500 and the position of the grill portion 500 on the partition plate 101 can be arbitrarily set.
  • the upper edge of the grill portion 500 is flush with or lower than the liquid inlet 103.
  • the partitioning plate 101 extends to the bottom of the casing 100, the grating portion 500 is located at a lower portion of the partitioning plate 101, and the communicating portion formed by the grating portion 500 is such that the liquid inlet chamber 200 The bottom portion communicates with the bottom of the liquid discharge chamber 300, thereby preventing the bubble from being pushed into the liquid discharge chamber 300 by the water flow due to the excessive flow of the liquid.
  • the upper edge of the grill portion 500 may also be higher than the liquid inlet 103 to increase the communication region between the middle and upper liquids.
  • the upper edge of the partitioning plate 101 is higher than the working liquid level 400 of the liquid in the liquid tank 1. Therefore, it is not necessary to consider the case where the bubble enters the liquid discharge chamber 300 during the ascending process, and the design load of the separation plate 101 is alleviated.
  • the partitioning plate 101 is a flat plate or a curved plate, which is not limited thereto, as long as the separating plate 101 can block the bubble generated in the liquid inlet chamber 200 from flowing to the liquid discharge chamber 300.
  • the air outlet of the exhaust pipe 102 is disposed upward or downward, and the air inlet of the exhaust pipe 102 is higher than the working liquid level of the liquid in the liquid tank 1.
  • the air outlet of the exhaust pipe 102 is disposed downward to prevent external foreign matter from entering the liquid tank 1 through the air outlet of the exhaust pipe 102; if the air outlet of the exhaust pipe 102 is disposed upward, the A protective baffle is disposed above the air outlet to prevent external debris from entering the liquid tank 1 through the air outlet of the exhaust pipe 102.
  • the structure and position of the exhaust pipe 102 will be described by taking the air outlet of the exhaust pipe 102 downward.
  • the exhaust pipe 102 extends downward from the inside of the casing 100 and penetrates the bottom of the casing 100.
  • the air outlet 1021 of the exhaust pipe 102 is disposed downward, and the air inlet of the exhaust pipe 102 is disposed. 1022 is higher than the working liquid level 400 of the liquid in the tank 1, and the exhaust pipe 102 is fixed to the tank 100 through the bracket 106.
  • the exhaust pipe 102 may be located in the liquid inlet chamber 200 (as shown in FIG. 12) or in the liquid discharge chamber 300 (as shown in FIG. 2). In an embodiment, as shown in FIG.
  • the exhaust pipe 102 extends through the side wall of the casing 100 and extends outwardly from the casing 100.
  • the air outlet 1021 of the exhaust pipe 102 is disposed downward, and the exhaust pipe 102 is advanced.
  • the gas port 1022 is higher than the working liquid level 400 of the liquid in the liquid tank 1, and the exhaust pipe 102 is fixed to the casing 100 through the bracket 106.
  • the structure and position of the exhaust pipe 102 of the present embodiment are not limited to the above-described cases, as long as the action of the gas in the discharge tank 1 can be achieved.
  • the present embodiment also provides a liquid circulation device including the liquid tank 1 provided by the above embodiment.
  • the liquid circulation device is suitable for the fan coil system, the lithography environment sub-system and the external auxiliary liquid temperature control device of the etching machine to provide a normal working environment (temperature) for the device.
  • the liquid circulation device of the present embodiment further includes a circulation power assembly 20, a temperature control assembly 30, and a refill assembly 40.
  • the circulating power assembly 20 is arranged to extract the liquid in the liquid discharge chamber of the liquid tank 1 to provide circulating fluid power for the liquid to flow through the temperature control assembly 30 and the liquid object 40 and return to the liquid tank 1 a liquid chamber
  • the circulating power assembly 20 may include a water pump
  • the liquid object may include, but is not limited to, a photolithography machine
  • the temperature control assembly 30 is configured to monitor the temperature of the liquid flowing into and out of the liquid object 40, and the temperature control assembly 30 may include a temperature control system such as a temperature sensor, a heater, a pressure sensor, a flow sensor, a flow meter, and a heat exchanger. Common parts in ;
  • the fluid replacement assembly 50 is configured to replenish liquid into the inlet chamber.
  • the temperature control component may include a refrigeration unit and/or a heating unit to achieve at least one of a cooling and heating function of the liquid circulation device.
  • the liquid circulation device may include a tank 1, a rehydration assembly 50, a water pump 2, four temperature sensors 3, a first heater 4, a pressure sensor 5, a first manual valve 6, and a flow sensor. 7.
  • a lithography machine 8 a particulate filter 9, an automatic valve 10, a flow meter 11, a second manual valve 12, an ion filter 13, a heat exchanger 14, a second heater 15, and a level sensor 16.
  • the second heaters 15 are sequentially connected by a pipeline, and the pipelines may be hoses or pipes; wherein two temperature sensors 3 are respectively disposed on the front and rear pipelines of the first heater 4, and the other two temperature sensors 3 are respectively disposed at the second The front and rear pipelines of the second heater 15; the pressure sensor 5 and the first manual valve 6 are disposed on the pipeline between the first heater 4 and the flow sensor 7; the flow meter 11 is disposed on the automatic valve 10 and the second manual valve 12
  • the liquid replenishing assembly 50 is filled with liquid into the liquid tank 1 through the rehydration tube; the liquid level sensor 16 is disposed on the liquid tank 1 for monitoring the liquid level of the liquid in the liquid tank 1 to instruct the rehydration assembly 50 to perform rehydration;
  • the second heater 15 is connected to the tank 1 through a liquid return pipe
  • the liquid in the liquid tank 1 is taken out by the water pump 2, and the liquid is heated and sent to the lithography machine 8 through the first heater 4, and then processed by the heat exchanger 14 and the second heater 15
  • the liquid pipe is returned to the tank 1.
  • the partitioning plate 101 in the liquid tank 1 isolates the air bubbles generated during the flow, and the air bubbles rise to the floating liquid level in the liquid in the liquid inlet chamber 200, and the formed gas is discharged through the exhaust pipe 102.
  • the liquid circulation device is only one specific example of the present application, and other liquid circulation devices including the liquid tank 1 provided in the embodiment are within the protection scope of the present application.
  • the liquid circulation device provided in this embodiment includes the liquid tank 1 provided in the above embodiment, and has corresponding functions and advantageous effects.

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  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Steam Or Hot-Water Central Heating Systems (AREA)

Abstract

一种液箱（1），包括箱体（100）、设置于箱体（100）内的隔离板（101）和连通箱体（100）内部与外界环境的排气管（102）；其中，箱体（100）包括由隔离板（101）分隔成的进液腔（200）和出液腔（300），进液腔（200）的底部与出液腔（300）的底部相连通，进液腔（200）的顶部与出液腔（300）的顶部相连通；隔离板（101）设置为阻隔在进液腔（200）产生的气泡流向出液腔（300），排气管（102）设置为排出溢出的气泡。

Description

液箱和液体循环装置
本申请要求申请日为2018年1月31日、申请号为201810097819.2的中国专利申请的优先权，该申请的全部内容通过引用结合在本申请中。
技术领域
本公开涉及液体循环系统技术领域，例如涉及一种液箱和液体循环装置。
背景技术
液体循环系统或设备被广泛应用于各行各业中，如：暖通空调行业的风机盘管系统，半导体行业的光刻机环境分系统和刻蚀机外部辅助液体温控设备等。
在对设备运行环境要求高的设备中，液体循环系统是保证设备正常运行的重要保证。在半导体设备尤其是精度极高的光刻机中，液体循环系统需要持续可靠地为光刻机提供正常工作的运行环境。
然而，在液体循环系统中空气气泡的产生会影响循环系统的正常工作。如产生的气泡会对液体泵造成损坏(气蚀)，由循环液体回流产生的气泡进入泵体内部会加速泵的磨损，产生震动和噪声，降低泵的性能，长期下去会破坏过流部件。
因此，需要对产生的气泡进行及时处理，防止气泡被运行的泵体吸入循环管路。通常，会在循环系统中加入排气阀，通过定期手动排气。但由于循环管路在不间断地进行液体循环，因此气泡的产生也是连续的，定期手动排气无法完全避免气泡被泵体吸入循环管路。另外，由于建筑空间有限，留出维修维护区域很有限，出现气体进入循环管路问题时手动排气极不方便，而且需要开启泵罐泵放空，操作麻烦，且有泄漏风险。
发明内容
本公开提出了一种液箱和液体循环装置，可以自动排气，避免产生的气泡进入液体循环管路，且可以降低液体泄露的风险。
一实施例提供了一种液箱，包括箱体、设置于箱体内的隔离板和连通箱体内部与外界环境的排气管；其中，所述箱体包括由隔离板分隔成的进液腔和出液腔，所述进液腔的底部与所述出液腔的底部相连通，所述进液腔的顶部与所 述出液腔的顶部相连通；
所述隔离板设置为阻隔在进液腔产生的气泡流向出液腔，所述排气管设置为排出溢出的气泡。
一实施例还提供了一种液体循环装置，包括上述的液箱。
附图说明
图1是一实施例提供的一种液箱的主视图；
图2是图1中液箱的侧视图；
图3是一实施例提供的另一种液箱的主视图；
图4是图1中另一种液箱的侧视图；
图5是图1中另一种液箱的侧视图；
图6是一实施例提供的另一种液箱的主视图；
图7是图6中液箱的侧视图；
图8是一实施例提供的另一种液箱的主视图；
图9是图8中液箱的侧视图；
图10是一实施例提供的另一种液箱的主视图；
图11是图10中液箱的侧视图；
图12是一实施例提供的排气管的位置示意图；
图13是一实施例提供的另一种排气管的位置示意图；
图14是一实施例提供的液体循环装置的结构框图；
图15是一实施例提供的液体循环装置的结构示意图。
具体实施方式
在本申请的描述中，需要理解的是，术语“上”、“下”、“前”、“后”、“竖直”、“水平”、“顶”、“底”“内”和“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
图1是本实施例提供的一种液箱的主视图；图2是图1中液箱的侧视图。该液箱适用于液体循环装置中，设置为存储液体循环装置中循环用的液体。如图1和图2所示，该液箱1包括箱体100、设置于箱体100内的隔离板101和连通箱体100 内部与外界环境的排气管102。
隔离板101将箱体100分隔成进液腔200和出液腔300，进液腔200的底部与出液腔300的底部相连通，进液腔200的顶部与出液腔300的顶部相连通；隔离板101设置为阻隔在进液腔200产生的气泡流向出液腔300，排气管102设置为排出溢出的气泡。
本实施例中，箱体100为封闭式箱体，隔离板101的位置可根据箱体100内部实际情况设置部件(如与进液腔200连通的回液管和补液管，与出液腔300连通的水泵)的位置及对空间进行设置，隔离板101的位置在不影响其他部件的情况下，只要使得液箱1中的液体由隔离板101分隔出的出液腔300进入液体循环管路即可。进液腔200的底部与出液腔300的底部相连通，可以确保液体流动顺畅，使进入进液腔200的液体由出液腔300流出，形成液体的循环回路；进液腔200的顶部与出液腔300的顶部相连通，一方面可以确保进液腔200液面处和出液腔300液面处的气压相同，以保证整个液箱1内的液体的工作液位一致，另一方面便于排气管102的空间布局，排气管102的进气口1022在箱体100的顶部连通空间可以任意放置。
本实施例中，在液体循环装置中液体循环管路的液体流回液箱1的进液腔200，或向进液腔200注入液体时，进液腔200的液体受到较大的扰动会产生气泡，而产生的流向出液腔300的气泡会受到隔离板101的阻隔，之后，该部分气泡将在进液腔200的液体中上升并浮出液面，形成的气体或可通过排气管102排出液箱1。在一实施例中，隔离板101的尺寸及位置的设置足以保证气泡无法到达隔离板101的下边缘，即气泡无法通过进液腔200的底部与出液腔300的底部相连通的区域进入出液腔300。
在一实施例中，图2仅示例性地说明液箱1包括排气管102，但对排气管102的具体结构及位置并不作限定。
本实施例提供的液箱1，通过在液箱1的箱体100内设置隔离板101，使隔离板101阻隔在进液腔200产生的气泡流向出液腔300，气泡在进液腔200的液体中上升并浮出液面，形成的气体通过排气管102排出液箱1，实现了自动排气，降低了人工排气时液体泄露风险，同时避免了气泡流至出液腔后进入液体循环管路，从而防止气泡损坏(气饰)液体泵，有效地保护了过流部件(泵体、泵盖、叶轮、密封环、泵轴和轴套等)。
在一实施例中，继续参考图2，上述液箱1还可以包括连通于进液腔200的进 液口103，隔离板101的下边缘低于进液口103。此时，因为隔离板101的下边缘低于进液口103，隔离板101可以更容易地避免由进液口103进入进液腔200的液体因产生扰动而形成气泡。其中，进液口103可以包括补液口1031和回液口1032，循环液体可以通过回液管105从回液口1032流回进液腔200，需要补充液体时，可以通过补液管104从补液口1031向进液腔200注入液体。在一实施例中，隔离板101的下边缘低于进液口103，在保证隔离板101阻隔在进液腔200产生的气泡流向出液腔300的情况下，可以使隔离板101有更多的空间布局；本实施例的隔离板101的下边缘也可以与进液口103齐平甚至高于进液口103，只要通过合理设置隔离板101的位置，使流向出液腔300的气泡被隔离板101完全阻隔即可。
另外，参考图1，本实施例中的隔离板101的两侧可以直接延伸至箱体100的内壁上，并与箱体100固定连接，其中，隔离板101可采用焊接、铆接或螺纹连接的形式固定于箱体上。在一实施例中，隔离板101的至少一侧可以不与箱体100直接连接，而是通过固定支架固定于箱体100上。示例性的，如图3所示，隔离板101的两侧均不与箱体100直接连接，隔离板101的两侧通过固定支架107固定于箱体100上，隔离板101每侧的固定支架107的数量可以为一个或多个。此时，在设计隔离板101的尺寸时，应考虑气泡在流向出液腔以及上升的过程中不能到达隔离板101两侧的连通区域。因此，在一实施例中采用图1所示的隔离板101结构，以减轻设计负担。
在一实施例中，上述隔离板可竖直设置或倾斜设置，其中本实施例中的倾斜是指上下倾斜，与竖直方向呈非零夹角。示例性的，参考图2，隔离板101竖直设置；参考图4，隔离板101倾斜设置，与竖直方向呈非零夹角，此时，隔离板101的下部可向出液腔300倾斜，也可向进液腔200倾斜。另外，隔离板101在竖直设置或倾斜设置时，也可以前后倾斜，即隔离板101与箱体上固定隔离板101的侧壁不垂直。例如，参考图5，隔离板101竖直设置且前后倾斜，前后指的是图2、图4或图5中的左右方向。
在一实施例中，基于上述实施例，为增大进液腔200和出液腔300的连通区域，可以在隔离板101上设置一个或多个格栅板。如图6和图7所示，隔离板101包括格栅部500，格栅部500包括至少一个格栅板108，格栅板108由上到下间隔设置(即上下相邻两个格栅板108具有一定间距，上下相邻两个格栅板108之间的空隙为进液腔200和出液腔300的连通区域)，格栅板108的两侧固定于隔离板101上；格栅板108在出液腔300内向下倾斜延伸(参考图7)，即与述隔离板101 呈非零夹角；或者，格栅板108在进液腔200向上倾斜延伸，即与述隔离板101呈非零夹角。当格栅板108在出液腔300内向下倾斜延伸时，部分气泡在进入上下相邻两个格栅板108之间的连通区域后，会被向下倾斜的格栅板108阻挡，然后气泡顺着格栅板108上升，返回至进液腔200，在进液腔200的液体中上升至浮出液面。同理，当格栅板108在进液腔200内向上倾斜延伸时，进入上下相邻两个格栅板108之间的连通区域的气泡被格栅板108阻挡后，会顺着格栅板108上升，从连通区域返回至进液腔200，在进液腔200的液体中上升至浮出液面。因此，不管格栅板108在出液腔300内向下倾斜延伸，还是格栅板108在进液腔200内向上倾斜延伸，都可以有效避免气泡最终流进出液腔300。
在一实施例中，上下相邻两个格栅板108之间的间距小于格栅板108在竖直方向的长度，可进一步防止气泡从上下相邻两个格栅板108之间的连通区域进入出液腔300。
本实施例中，格栅部500的面积以及格栅部500位于隔离板101上的位置可以任意设置。在一实施例中，格栅部500的上边缘与进液口103齐平或低于进液口103。在一实施例中，如图8和图9所示，隔离板101延伸至箱体100的底部，格栅部500位于隔离板101的下部，格栅部500形成的连通区域使得进液腔200的底部与出液腔300的底部相连通，由此，可防止因液体流动过快气泡被水流压入出液腔300。另外，如图10和图11所示，格栅部500的上边缘也可高于进液口103，以增大中部及上部液体的连通区域。
基于上述实施例，可参考图2、图4、图5、图7、图9和图11，隔离板101的上边缘高于液箱1内液体的工作液位400。由此可不必考虑气泡在上升的过程中进入出液腔300的情况，减轻隔离板101的设计负担。
在一实施例中，隔离板101为平板或曲面板，对此不作限制，只要隔离板101可以阻隔在进液腔200产生的气泡流向出液腔300即可。
在一实施例中，排气管102的出气口朝上设置或朝下设置，排气管102的进气口高于液箱1内液体的工作液位。其中，将排气管102的出气口朝下设置可防止外部杂物通过排气管102的出气口进入到液箱1内；若需将排气管102的出气口朝上设置，则可在出气口的上方设置防护挡板，以防止外部杂物通过排气管102的出气口进入到液箱1内。
本实施例以排气管102的出气口朝下设置为例对排气管102的结构及位置进行说明。在一实施例中，如图12所示，排气管102由箱体100内向下延伸并贯穿 箱体100底部，排气管102的出气口1021朝下设置，排气管102的进气口1022高于液箱1内液体的工作液位400，排气管102通过支架106固定于箱体100上。本实施例中，排气管102可位于进液腔200中(如图12所示)，也可位于出液腔300中(如图2所示)。在一实施例中，如图13所示，排气管102贯穿箱体100的侧壁并由箱体100外向下延伸，排气管102的出气口1021朝下设置，排气管102的进气口1022高于液箱1内液体的工作液位400，排气管102通过支架106固定于箱体100上。本实施例的排气管102的结构及位置并不仅限于上述几种情况，只要可以实现排出液箱1内气体的作用即可。
另外，本实施例还提供了一种液体循环装置，该液体循环装置包括本上述实施例提供的液箱1。该液体循环装置适用于风机盘管系统、光刻机环境分系统和刻蚀机外部辅助液体温控设备等，为设备提供正常工作的运行环境(温度)。
如图14所示，基于上述方案，本实施例的液体循环装置还包括循环动力组件20、温控组件30和补液组件40。
其中，循环动力组件20设置为抽取液箱1的出液腔中的液体，为液体提供循环流动的动力，以使液体流经温控组件30和用液对象40后回到液箱1的进液腔，该循环动力组件20可以包括水泵，用液对象可以包括但不限于光刻机；
温控组件30设置为监测控制流进和流出用液对象40的液体的温度，该温控组件30可以包括温度传感器、加热器、压力传感器、流量传感器、流量表和换热器等温控系统中的通用部件；
补液组件50设置为向进液腔补充液体。
可选的，温控组件可包括制冷单元和/或制热单元，以实现液体循环装置的制冷和制热功能中至少一项。
示例性的，如图15所示，液体循环装置可包括液箱1、补液组件50、水泵2、四个温度传感器3、第一加热器4、压力传感器5、第一手动阀6、流量传感器7、光刻机8、颗粒过滤器9、自动阀10、流量表11、第二手动阀12、离子过滤器13、换热器14、第二加热器15和液位传感器16。其中，液箱1、水泵2、第一加热器4、流量传感器7、光刻机8、颗粒过滤器9、自动阀10、第二手动阀12、离子过滤器13、换热器14和第二加热器15通过管路依次连接，管路可以为软管或硬管；其中两个温度传感器3分别设置在第一加热器4的前后管路上，另外两个温度传感器3分别设置在第二加热器15的前后管路上；压力传感器5和第一手动阀6设置于第一加热器4和流量传感器7之间的管路上；流量表11设置于自动阀10和第二手 动阀12之间的管路上；补液组件50通过补液管向液箱1注入液体；液位传感器16设置于液箱1上，用于监测液箱1内液体的液位，以指示补液组件50进行补液；第二加热器15通过回液管连通至液箱1。
液体循环装置正常工作时，通过水泵2将液箱1内的液体抽出，液体通过第一加热器4加热送至光刻机8，再经换热器14及第二加热器15处理后由回液管回流至液箱1。在液体回流进液箱1时，液箱1内的隔离板101将流动时产生的气泡隔离，气泡在进液腔200的液体中上升至浮出液面，形成的气体经由排气管102排出。
在一实施例中，上述液体循环装置仅为本申请的一个具体实例，其他包括本实施例所提供的液箱1的液体循环装置均在本申请的保护范围之内。
本实施例所提供的液体循环装置，包括上述实施例所提供的液箱1，具备相应的功能和有益效果。

Claims (17)

  1. 一种液箱，包括箱体、设置于所述箱体内的隔离板和连通所述箱体内部与外界环境的排气管；
    其中，所述箱体还包括由所述隔离板分隔成的进液腔和出液腔，所述进液腔的底部与所述出液腔的底部相连通，所述进液腔的顶部与所述出液腔的顶部相连通；
    所述隔离板设置为阻隔在所述进液腔产生的气泡流向所述出液腔，所述排气管设置为排出溢出的所述气泡。
  2. 根据权利要求1所述的液箱，还包括与所述进液腔连通的进液口，所述隔离板的下边缘低于所述进液口。
  3. 根据权利要求1所述的液箱，其中，所述隔离板竖直设置或与竖直方向呈非零夹角。
  4. 根据权利要求2所述的液箱，还包括格栅部，所述格栅部包括至少一个格栅板，所述格栅板由上到下间隔设置，所述格栅板的两侧均与所述隔离板固定；其中，所述格栅板设置为在所述出液腔内向下延伸且与所述隔离板呈非零夹角；或者，所述格栅板设置为在所述进液腔内向上延伸且与所述隔离板呈非零夹角。
  5. 根据权利要求4所述的液箱，其中，所述格栅部的上边缘与所述进液口齐平或低于所述进液口。
  6. 根据权利要求1所述的液箱，其中，所述隔离板的上边缘高于所述液箱内液体的工作液位。
  7. 根据权利要求1所述的液箱，其中，所述隔离板为平板或曲面板。
  8. 根据权利要求1所述的液箱，其中，所述隔离板采用焊接、铆接或螺纹连接的形式固定于所述箱体上。
  9. 根据权利要求1所述的液箱，其中，所述排气管的出气口朝上设置或朝下设置，所述排气管的进气口高于所述液箱内液体的工作液位。
  10. 根据权利要求9所述的液箱，其中，所述排气管在所述箱体内向下延伸并贯穿所述箱体底部。
  11. 根据权利要求9所述的液箱，其中，所述排气管贯穿所述箱体的侧壁并向下延伸。
  12. 根据权利要求9所述的液箱，还包括支架，所述排气管通过所述支架固定于所述箱体上。
  13. 一种液体循环装置，包括如权利要求1-12任一项所述的液箱。
  14. 根据权利要求13所述的液体循环装置，还包括循环动力组件、温控组件和补液组件；
    所述循环动力组件设置为抽取所述液箱的出液腔中的液体，为所述液体提供循环流动的动力，以使所述液体流经所述温控组件和用液对象后回到所述液箱的进液腔；
    所述温控组件设置为监测控制流进和流出所述用液对象的液体的温度；
    所述补液组件设置为向所述进液腔补充液体。
  15. 根据权利要求14所述的液体循环装置，其中，所述循环动力组件包括水泵。
  16. 根据权利要求14所述的液体循环装置，其中，所述用液对象包括光刻机。
  17. 根据权利要求14所述的液体循环装置，其中，所述温控组件包括制冷单元和制热单元中的至少一个。
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