WO2019111707A1 - Epoxy resin composition and electronic device - Google Patents

Abstract

This epoxy resin composition contains an epoxy resin, a curing agent and an inorganic filler, while containing chlorine-containing particles that contain an organic substance.

Description

Epoxy resin composition and electronic device

The present invention relates to an epoxy resin composition and an electronic device.

Until now, various developments have been made for epoxy resin compositions. As this type of technology, for example, the technology described in Patent Document 1 is known. Patent Document 1 describes that an epoxy compound produced by a method not using epichlorohydrin (epichlorohydrin) as a raw material is used to reduce the content of hydrolyzable chlorine derived from the raw material ( Paragraph 0012 of Patent Document 1).

JP 2012-92247 A

As a result of the present inventor's investigation, it was found that the epoxy resin composition using the epoxy compound described in Patent Document 1 has room for improvement in terms of metal adhesion.

The inventors further studied and found that the properties of the epoxy resin composition can be modified by appropriately controlling the state of the chlorine contained in the epoxy resin composition. As a result of further intensive studies based on such findings, it is found that metal adhesion in an epoxy resin composition can be improved by incorporating chlorine-containing particles containing an organic substance in the epoxy resin composition, and the present invention is completed. It came to
Although the detailed mechanism is not clear, the chlorine-containing particles have an oxidizing action on a metal such as Cu, and the oxidation action modifies the surface of the metal to improve the affinity to the epoxy resin composition, It is believed that metal adhesion is improved.

According to the invention
An epoxy resin composition comprising an epoxy resin, a curing agent and an inorganic filler,
An epoxy resin composition is provided which comprises organic containing chlorine containing particles.

Further, according to the present invention, there is provided an electronic device comprising a cured product of the above epoxy resin composition.

ADVANTAGE OF THE INVENTION According to this invention, the epoxy resin composition excellent in metal adhesiveness and the electronic device using the same are provided.

The objects described above, and other objects, features and advantages will become more apparent from the preferred embodiments described below and the following drawings associated therewith.

FIG. 2 is a cross-sectional view showing an example of a semiconductor device. FIG. 2 is a cross-sectional view showing an example of a semiconductor device. It is a sectional view showing an example of a structure.

Hereinafter, embodiments will be described using drawings as appropriate. In all the drawings, the same components are denoted by the same reference numerals, and the description thereof will be appropriately omitted.

[Epoxy resin composition]
The epoxy resin composition of the present embodiment can include an epoxy resin, a curing agent and an inorganic filler. This epoxy resin composition contains chlorine-containing particles containing an organic substance.

According to the findings of the inventor of the present invention, the following has been found.
Conventionally, there is known a method in which total chlorine or hydrolyzable chlorine in an epoxy resin composition is used as a target and the content of the target is used as an index. Hydrolyzable chlorine and free chlorine which have been conventionally targeted are uniformly present in the entire epoxy resin composition (for example, sealing material).
On the other hand, a new form of existence of chlorine has been discovered: chlorine-containing particles containing organic matter (hereinafter sometimes simply referred to as “chlorine-containing particles”). It has been found that the chlorine of the chlorine-containing particles is different from the hydrolyzable chlorine and the chlorine derived from free chlorine in the form of presence, and is present locally to the epoxy resin composition, in the particles. It becomes high concentration. For example, the presence of chlorine in the chlorine-containing particles can be confirmed significantly by, for example, element mapping of energy dispersive X-ray spectroscopy (EDX).
Although the detailed mechanism is not clear, such chlorine-containing particles have an oxidizing effect on metals such as Cu, and by such oxidizing action, the surface of the metal is modified to have an affinity with the epoxy resin composition. It is thought that it can improve and the metal adhesiveness in an epoxy resin composition can be improved.
Therefore, the metal adhesiveness in an epoxy resin composition can be improved by containing chlorine containing particle | grains containing an organic substance in an epoxy resin composition.

In this embodiment, the chlorine-containing particles are obtained by mixing the epoxy resin composition in acetone to obtain a solution, and filtering the obtained solution through a filter with an opening size of 75 μm, and contained in the residue on the filter It can be

In the present embodiment, chlorine-containing particles can be detected by the following inspection method (hereinafter sometimes referred to as inspection method of chlorine-containing particles).
(1) As a sample (sample), a raw material component (for example, an epoxy resin, a curing agent, an inorganic filler, etc.) which comprises an epoxy resin composition or an epoxy resin composition is prepared. As the epoxy resin composition, one obtained by mixing and kneading each raw material component and cooling the obtained kneaded product (epoxy resin composition in a B-stage state) is used.
(2) Put 50 g of the sample of (1) into a cleaned 1000 ml container made of polypropylene, add 300 ml of acetone, cap the container, and use a shaker at room temperature 25 ° C. for 300 reciprocations / minute Shake (mix) for 50 minutes. The acetone to be used uses what was filtered by the filter of 12 micrometers of mesh sizes.
(3) Install the above acetone-washed filter in a funnel set (filtration device). The filter used is a nylon filter with an opening size of 75 μm, which has been subjected to ultrasonic cleaning.
(4) The container shaken in (2) was allowed to stand, and then the solution in the container was poured from the top of the funnel of (3) and suction filtered through a filter. If the particle size of the filler such as the inorganic filler contained in the sample is larger than the pore size of the filter, the supernatant in the solution may be filtered by a filter.
(5) Remove the funnel and dry the residue on the filter while suctioning.
(6) Stick the adhesive surface of the measurement sheet to the filter surface of (5), and collect the residue on the adhesive surface of the measurement sheet.
(7) The measurement sheet of (6) is peeled off from the filter, and a composite photograph is made of the entire surface of the adhesive surface using a digital microscope. After adjusting the visual field magnification to be 50 times, the entire surface is observed, and the position where the residue is present is recorded and printed.
(8) While confirming the position of the residue in the printed matter of (7), composition analysis is performed on the residue using a scanning electron microscope (SEM) / energy dispersive X-ray analyzer (EDS).
(9) From the compositional analysis result of the residue based on energy dispersive X-ray spectroscopy (EDX) of (8), count the number of chlorine-containing particles contained in the epoxy resin composition or the raw material component constituting it. And identify the elemental component in the chlorine-containing particles. If desired, various analyzes may be performed on the chlorine-containing particles.

Conventional methods for measuring total chlorine content are inorganic chlorine and hydrolyzable chlorine derived from raw materials of epoxy resin, so the above-mentioned chlorine-containing particles can not be measured. The
On the other hand, the inspection method of the above-mentioned chlorine content particles is a method of detecting stably chlorine content particles contained in an epoxy resin composition or its raw material component, and chlorine contained in the particles concerned, and the present invention It is a method newly established by the

The organic substance in the above-mentioned chlorine-containing particles contained in the epoxy resin can include one or more selected from the group consisting of carbonates, amide compounds, and silicates. These organic substances may be a mixture with an epoxy resin.
The organic substance in the above-mentioned chlorine-containing particles contained in the epoxy resin composition can contain one or more selected from the group consisting of cellulose, polyethylene terephthalate, polypropylene, silk, a silicone compound, and an amide compound. These may be used alone or in combination of two or more. Or it may be a mixture of these.
The above-mentioned chlorine-containing particles may contain organic substances other than these. Organic substances can be identified from the spectrum results of chlorine-containing particles using FT-IR (Fourier transform infrared spectroscopy).

The lower limit value of the chlorine concentration in the chlorine-containing particles is, for example, 0.01 Atm% or more, and may be 0.5 Atm% or more, or 0.1 Atm% or more. Thereby, metal adhesiveness can be improved. On the other hand, the upper limit of the chlorine concentration in the chlorine-containing particles is, for example, 20 Atm% or less, preferably 10 Atm% or less, and more preferably 7 Atm% or less. This can improve the reliability.
In addition, when a plurality of chlorine-containing particles are present, it is possible to improve the reliability by reducing the maximum value of the chlorine concentration.

The lower limit value of the carbon concentration in the chlorine-containing particles is, for example, 40 Atm% or more, preferably 50 Atm% or more, and more preferably 60 Atm% or more. This makes it possible to stably fix chlorine in the chlorine-containing particles. On the other hand, the upper limit value of the carbon concentration in the above-mentioned chlorine-containing particles may be appropriately changed depending on other constituent components and is not particularly limited, but may be 99 Atm% or less, 90 Atm% or less, or 85 Atm% or less It may be 70 Atm% or less.

The chlorine-containing particles may contain an oxygen component. In this case, the oxygen concentration in the chlorine-containing particles may be, for example, 1 Atm% to 50 Atm%, 2 Atm% to 35 Atm%, 3 Atm% to 30 Atm%, or 3 Atm% to 28 Atm%. “～” indicates including upper limit value and lower limit value unless otherwise specified.

The chlorine-containing particles contain one or more selected from the group consisting of Al element, Mg element, Si element, Fe element, Zn element, Ti element, Ca element, Na element, K element, S element, carbonate compound be able to. These may be used alone or in combination of two or more.
In this case, the Al concentration in the chlorine-containing particles may be 0.1 Atm% to 4 Atm%, or 0.1 Atm% to 1.0 Atm%.
The Mg concentration in the chlorine-containing particles may be 0.1 Atm% to 0.5 Atm%, or 0.1 Atm% to 0.4 Atm%.
The Si concentration in the chlorine-containing particles may be 0.1 Atm% to 5 Atm%, 0.1 Atm% to 2.0 Atm%, or 0.1 Atm% to 1 Atm%.
The Fe concentration in the chlorine-containing particles may be 0.1 Atm% to 4 Atm%, or may be 0.1 Atm% to 2.0 Atm%.
The Zn concentration in the chlorine-containing particles may be 0.1 Atm% to 5 Atm%, or may be 0.1 Atm% to 1.0 Atm%.
The Ti concentration in the chlorine-containing particles may be 0.01 Atm% to 1.0 Atm%, or may be 0.04 Atm% to 0.8 Atm%.
The Ca concentration in the chlorine-containing particles may be 0.01 Atm% to 17 Atm%, may be 0.02 Atm% to 6 Atm%, and may be 0.1 Atm% to 3 Atm%.
The concentration of Na in the chlorine-containing particles may be 0.01 Atm% to 2 Atm%, or 0.1 Atm% to 1.5 Atm%.
The K concentration in the chlorine-containing particles may be 0.01 Atm% to 5 Atm%, or 0.1 Atm% to 1.0 Atm%.
The S concentration in the chlorine-containing particles may be 0.01 Atm% to 2 Atm%, or may be 0.02 Atm% to 1.0 Atm%.
As an element component in the above-mentioned chlorine content particles, in addition to chlorine element and carbon element, 1 type or more may be sufficient, 2 types or more may be sufficient, or 5 or more types of other elements may be contained.

In the present embodiment, the elemental composition and the elemental concentration in the chlorine-containing particles can be measured based on energy dispersive X-ray spectroscopy (EDX).

In the present embodiment, the number of chlorine-containing particles in the epoxy resin composition or the number of chlorine-containing particles in the epoxy resin can be measured by using the above-mentioned <Method for inspecting chlorine-containing particles>.
The number of chlorine-containing particles in the 50 g of the epoxy resin composition can be one or more. Thereby, when using an epoxy resin composition as a sealing material (an epoxy resin composition for sealing) which seals electronic parts, adhesiveness with metal members, such as a metal circuit, a metal pad, and a metal wire, is improved. be able to. In particular, the adhesion to a metal member such as Cu can be improved. The number of chlorine-containing particles in the epoxy resin composition may be, for example, 10 or less, 5 or less, 3 or less, or 2 or less. Thereby, when an epoxy resin composition is used as a sealing material which seals electronic parts, reliability can be improved.
Regarding each component used for the above epoxy resin composition, for example, in 50 g of epoxy resin, the number of chlorine-containing particles may be 1 to 5 or less, 1 to 3 or less, or 1 to 2 or less. , May be one.

In the present embodiment, for example, types, blending amounts, preparation methods of each component contained in the thermosetting resin composition (production method or purification method after production), preparation method of the thermosetting resin composition, etc. are appropriately made. By selecting, it is possible to control the amount of the above-mentioned chlorine-containing particles. Among these, for example, for each component such as an epoxy resin and a curing agent, filtering a liquid substance such as a solution dissolved in an organic solvent with a filter, and in that case using the filter with a small opening size In addition, the liquid is centrifuged to remove the lower layer containing foreign matter, and only the upper layer is used, or the HCL generated during the reaction is thoroughly removed to eradicate the chlorine source. Inorganic filler, reducing the size of the guarantee screen, selecting appropriate ones from a plurality of lots, and the like can be mentioned as factors for setting the amount of the above-mentioned chlorine-containing particles in the desired numerical range.

Hereinafter, each component of the epoxy resin composition in this embodiment is explained in full detail.

[Epoxy resin]
The epoxy resin composition contains an epoxy resin.
The epoxy resin is generally a monomer, an oligomer or a polymer having two or more epoxy groups in one molecule, and the molecular weight and molecular structure thereof are not particularly limited.
Examples of the epoxy resin include bifunctional or crystalline epoxy resins such as biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, stilbene type epoxy resin, hydroquinone type epoxy resin; cresol novolac type epoxy resin Novolak type epoxy resin such as phenol novolac type epoxy resin and naphthol novolac type epoxy resin; Phenol aralkyl type such as phenylene skeleton containing phenol aralkyl type epoxy resin, biphenylene skeleton containing phenol aralkyl type epoxy resin, phenylene skeleton containing naphthol aralkyl type epoxy resin Epoxy resin; Trifunctional epoxy resin such as triphenolmethane epoxy resin and alkyl-modified triphenolmethane epoxy resin Dicyclopentadiene-modified phenol type epoxy resins, modified phenol type epoxy resins such as terpene-modified phenol type epoxy resins; heterocycle-containing epoxy resins such as triazine nucleus-containing epoxy resins. One of these may be used alone, or two or more of these may be used in combination.

The lower limit of the content of the epoxy resin in the epoxy resin composition is, for example, preferably 8% by mass or more, and more preferably 10% by mass or more based on the total solid content of the epoxy resin composition. And 12% by mass or more is particularly preferable. By making content of an epoxy resin more than the said lower limit, the fluidity | liquidity of an epoxy resin composition can be improved and the further improvement of a moldability can be aimed at.
On the other hand, the upper limit value of the content of the epoxy resin is, for example, preferably 30% by mass or less, and more preferably 20% by mass or less, based on the total solid content of the epoxy resin composition. By setting the content of the epoxy resin to the above upper limit value or less, the moisture resistance, the reflow resistance, and the temperature cycle resistance of the semiconductor device and the other structures provided with the cured product formed using the epoxy resin composition Can be improved.

In the present specification, the total solid content of the epoxy resin composition refers to the non-volatile content in the epoxy resin composition, and refers to the remainder excluding volatile components such as water and solvent. Moreover, in the present embodiment, the content with respect to the entire epoxy resin composition refers to the content with respect to the entire solid content excluding the solvent in the resin composition when the solvent is included.

[Hardener]
The epoxy resin composition can include a curing agent.
The curing agent is not particularly limited as long as it is generally used in epoxy resin compositions, but, for example, a phenol resin curing agent, an amine curing agent, an acid anhydride curing agent, a mercaptan curing agent, etc. , Is mentioned. Among these, from the viewpoint of balance such as flame resistance, moisture resistance, electric properties, curability, storage stability, etc., a phenol resin-based curing agent is preferable.

<Phenolic resin curing agent>
The phenolic resin-based curing agent is not particularly limited as long as it is generally used in epoxy resin compositions, and examples thereof include phenol novolac resin, phenol including cresol novolac resin, cresol, resorcinol, catechol, Novolak resin obtained by condensation or cocondensation of phenols such as bisphenol A, bisphenol F, phenylphenol, aminophenol, α-naphthol, β-naphthol, dihydroxynaphthalene and formaldehyde or ketones under an acid catalyst, as described above A phenol aralkyl resin such as a phenol aralkyl resin having a phenylene skeleton synthesized from phenols and dimethoxyparaxylene or bis (methoxymethyl) biphenyl and a phenol aralkyl resin having a biphenylene skeleton Lukil resin, a phenol resin having a trisphenylmethane skeleton, and the like can be mentioned, and these may be used alone or in combination of two or more.

<Amine curing agent>
Examples of the amine-based curing agent include aliphatic polyamines such as diethylenetriamine (DETA), triethylenetetramine (TETA) and metaxylylenediamine (MXDA), diaminodiphenylmethane (DDM), m-phenylenediamine (MPDA) and diaminodiphenyl sulfone In addition to aromatic polyamines such as (DDS), polyamine compounds containing dicyandiamide (DICY), organic acid dihydrazide and the like may be mentioned, and these may be used alone or in combination of two or more.

<Acid anhydride curing agent>
Examples of the acid anhydride-based curing agent include alicyclic anhydrides such as hexahydrophthalic anhydride (HHPA), methyltetrahydrophthalic anhydride (MTHPA) and maleic anhydride, trimellitic anhydride (TMA) and pyromellitic anhydride Examples thereof include acids (PMDA), benzophenonetetracarboxylic acids (BTDA), and aromatic acid anhydrides such as phthalic anhydride. These may be used alone or in combination of two or more.

<Mercaptan-based curing agent>
As the above-mentioned mercaptan-based curing agent, trimethylolpropane tris (3-mercaptobutyrate), trimethylolethane tris (3-mercaptobutyrate), etc. may be mentioned, and even if they are used alone, they may be used in combination of two or more. May be

<Other curing agent>
Other curing agents include isocyanate compounds such as isocyanate prepolymers and blocked isocyanates, organic acids such as carboxylic acid-containing polyester resins, etc. These may be used alone or in combination of two or more. .
Moreover, you may use combining 2 or more types of the hardening agent of a different system among the above-mentioned.

When the curing agent is a phenol resin-based curing agent, the ratio of the epoxy resin to the curing agent equivalent ratio, that is, the ratio of the number of epoxy groups in the epoxy resin / the number of phenolic hydroxyl groups in the phenol resin-based curing agent is particularly Although there is no limitation, in order to obtain an epoxy resin composition excellent in moldability and reliability, for example, the range of 0.5 or more and 2 or less is preferable, and the range of 0.6 or more and 1.8 or less is more preferable, 0.8 The range of not less than 1.5 is the most preferable.

[Inorganic filler]
The epoxy resin composition can contain an inorganic filler.
Examples of the inorganic filler include fused silica such as fused and crushed silica and fused spherical silica, silica such as crystalline silica, alumina, aluminum hydroxide, silicon nitride, and aluminum nitride. These may be used alone or in combination of two or more. Among these, preferred are silicas such as fused and crushed silica, fused spherical silica, and crystalline silica, and more preferably fused spherical silica can be used.

The lower limit of the average particle diameter (D50) of the inorganic filler may be, for example, 0.01 μm or more, 1 μm or more, or 5 μm or more. As a result, the flowability of the epoxy resin composition can be improved, and the moldability can be more effectively improved. Moreover, the upper limit of the average particle diameter (D50) of an inorganic filler is 50 micrometers or less, for example, Preferably it is 40 micrometers or less. Thereby, the occurrence of non-filling and the like can be reliably suppressed. In addition, the inorganic filler of the present embodiment can include at least an inorganic filler having an average particle diameter (D50) of 1 μm or more and 50 μm or less. Thereby, the fluidity can be made better.

The average particle diameter (D50) of the inorganic filler is measured on a volume basis of the particle size distribution of particles using a commercially available laser diffraction type particle size distribution measuring apparatus (for example, SALD-7000 manufactured by Shimadzu Corporation), and its median The diameter (D50) can be an average particle diameter.

Moreover, the said inorganic filler may use together the 2 or more types of filler of a different average particle diameter (D50), for example. Thereby, the fillability of the inorganic filler to the total solid content of the epoxy resin composition can be more effectively enhanced. Moreover, in the present embodiment, a filler having an average particle diameter of 0.01 μm or more and 1 μm or less and a filler having an average particle diameter of 1 μm to 50 μm or less improve the filling property of the epoxy resin composition. And may be used as an example.
Moreover, as an example of the inorganic filler of the present embodiment, from the viewpoint of further improving the filling property of the epoxy resin composition, for example, a first filler having an average particle diameter of 0.01 μm or more and 1 μm or less and an average particle diameter of 1 μm The second filler may be larger than 15 μm, and the third filler may be larger than 15 μm and 50 μm or less.

The lower limit of the content of the inorganic filler is, for example, preferably 70% by mass or more, more preferably 73% by mass or more, and more preferably 75% by mass, based on the total solid content of the epoxy resin composition. It is especially preferable that it is more than. Thereby, low moisture absorption and low thermal expansion can be improved, and the temperature cycle resistance and the reflow resistance of the semiconductor device and the other structures can be more effectively improved. On the other hand, the upper limit value of the content of the inorganic filler is, for example, preferably 95% by mass or less, more preferably 93% by mass or less, based on the total solid content of the epoxy resin composition. It is particularly preferable that the content is less than or equal to mass%. This makes it possible to more effectively improve the flowability and the fillability at the time of molding of the epoxy resin composition.

[Hardening accelerator]
The said epoxy resin composition can further contain a hardening accelerator as needed.
As the curing accelerator, any curing accelerator may be used as long as it accelerates the crosslinking reaction of the epoxy resin and the curing agent, and those used for general epoxy resin compositions can be used.

Examples of the curing accelerator include diazabicycloalkenes such as 1,8-diazabicyclo (5,4,0) undecene-7 and derivatives thereof; organic phosphines such as triphenylphosphine and methyl diphenylphosphine; Imidazole compounds such as imidazole (imidazole-based curing accelerator); tetra-substituted phosphonium tetra-substituted borates such as tetraphenyl phosphonium tetraphenyl borate and the like. These may be used alone or in combination of two or more.

Examples of the imidazole-based curing accelerator include imidazole, 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole and 2-phenylimidazole. 2-phenyl-4-methylimidazole, 1-benzyl-2-phenylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4 Diamino-6- [2′-methylimidazolyl (1 ′)]-ethyl-s-triazine, 2,4-diamino-6- [2′-undecylimidazolyl (1 ′)]-ethyl-s-triazine, 2 , 4-Diamino-6- [2′-ethyl-4-methylimidazolyl (1 ′)]-ethyl-s-triazine, 2,4-diamino-6- [2′-methylimidazolyl (1 ′)]-ethyl Isocyanuric acid adduct of 2-s-triazine, isocyanuric acid adduct of 2-phenylimidazole, isocyanuric acid adduct of 2-methylimidazole, 2-phenyl-4,5-dihydroxydimethylimidazole, 2-phenyl-4-methyl- And 5-hydroxymethylimidazole. These may be used alone or in combination of two or more.

The lower limit of the content of the curing accelerator is, for example, preferably 0.20% by mass or more, and more preferably 0.40% by mass or more, with respect to the total solid content of the epoxy resin composition. It is especially preferable that it is 0.70 mass% or more. By making content of a hardening accelerator more than the said lower limit, the hardenability at the time of shaping | molding can be improved effectively. On the other hand, the upper limit value of the content of the curing accelerator is, for example, preferably 3.0% by mass or less, and more preferably 2.0% by mass or less based on the total solid content of the epoxy resin composition. preferable. By making content of a hardening accelerator below the said upper limit, the improvement of the fluidity | liquidity at the time of shaping | molding can be aimed at.

[Coupling agent]
The said epoxy resin composition can contain a coupling agent as needed.
Examples of the coupling agent include various silane compounds such as epoxysilane, mercaptosilane, aminosilane, alkylsilane, ureidosilane, vinylsilane and methacrylsilane, titanium compounds, aluminum chelates and aluminum / zirconium compounds. Coupling agents can be used. These are exemplified by vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxy Silane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyltriethoxysilane , Vinyltriacetoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-anilinopropyltrimethoxysilane, γ-anilinopropylmethyldimethoxysilane, -[Bis (β-hydroxyethyl)] aminopropyltriethoxysilane, N-β- (aminoethyl) -γ-aminopropyltrimethoxysilane, N-β- (aminoethyl) -γ-aminopropyltriethoxysilane, N-β- (aminoethyl) -γ-aminopropylmethyldimethoxysilane, phenylaminopropyltrimethoxysilane, γ- (β-aminoethyl) aminopropyldimethoxymethylsilane, N- (trimethoxysilylpropyl) ethylenediamine, N- (Dimethoxymethylsilylisopropyl) ethylenediamine, methyltrimethoxysilane, dimethyldimethoxysilane, methyltriethoxysilane, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane, γ-chloropropyltrimethoxysila , Hexamethyldisilane, vinyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, 3-isocyanatopropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-triethoxysilyl-N- (1,3-dimethyl) Silane-based coupling agents such as hydrolyzate of (butylidene) propylamine, isopropyl triisostearoyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, isopropyl tri (N-aminoethyl-aminoethyl) titanate, tetraoctyl bis (ditriethyl) Decyl phosphite) titanate, tetra (2,2-diallyloxymethyl-1-butyl) bis (ditridecyl) phosphite titanate, bis (dioctyl pyrophosphate) oxide Tate titanate, bis (dioctyl pyrophosphate) ethylene titanate, isopropyl trioctanoyl titanate, isopropyl dimethacrylic isostearoyl titanate, isopropyl tridodecyl benzene sulfonyl titanate, isopropyl isostearoyl diacrylic titanate, isopropyl tri (dioctyl phosphate) titanate, isopropyl tricumyl Titanate coupling agents such as phenyl titanate and tetraisopropyl bis (dioctyl phosphite) titanate are mentioned. One of these may be used alone, or two or more of these may be used in combination. Among these, silane compounds of epoxysilane, mercaptosilane, aminosilane, alkylsilane, ureidosilane or vinylsilane are more preferable. Further, from the viewpoint of more effectively improving the filling property and the moldability, it is particularly preferable to use a secondary aminosilane represented by phenylaminopropyltrimethoxysilane.

The lower limit value of the content of the coupling agent is preferably 0.1% by mass or more, and more preferably 0.15% by mass or more based on the total solid content of the epoxy resin composition. By making content of a coupling agent more than the said lower limit, fluidity | liquidity of an epoxy resin composition can be made favorable. On the other hand, the upper limit value of the content of the coupling agent is preferably 1% by mass or less and more preferably 0.5% by mass or less based on the total solid content of the epoxy resin composition. By making content of a coupling agent below the said upper limit, the improvement of the mechanical strength in the hardened | cured material of an epoxy resin composition can be aimed at.

Moreover, the said epoxy resin composition can contain the low stress agent as needed.
Examples of the low stress agent include silicone oil, silicone rubber, polyisoprene, polybutadiene such as 1,2-polybutadiene and 1,4-polybutadiene, styrene-butadiene rubber, acrylonitrile-butadiene rubber, polychloroprene, poly (oxypropylene), It may contain one or more selected from thermoplastic elastomers such as poly (oxytetramethylene) glycol, polyolefin glycol, poly-ε-caprolactone, polysulfide rubber, and fluororubber. Among these, containing at least one of silicone rubber, silicone oil, and acrylonitrile-butadiene rubber controls the elastic modulus within a desired range, and the temperature cycle resistance of the obtained semiconductor package and other structures. In terms of improving the reflow resistance, it can be selected as a particularly preferred embodiment.

When using the said low stress agent, it is preferable that content of the low stress agent whole is 0.05 mass% or more with respect to the total solid of an epoxy resin composition, and it is 0.10 mass% or more More preferable. On the other hand, the content of the low stress agent is preferably 2% by mass or less, and more preferably 1% by mass or less, based on the total solid content of the epoxy resin composition. By controlling the content of the low stress agent in such a range, the temperature cycle resistance and the reflow resistance of the obtained semiconductor package and other structures can be more reliably improved.

[Other ingredients]
The epoxy resin composition of the present embodiment can further contain other components, if necessary. Other components include, for example, ion capturing agents such as hydrotalcite and aluminum-magnesium inorganic ion exchangers; colorants such as carbon black and bengala; natural waxes such as carnauba wax; montanic acid ester wax; diethanolamine / dimontanic acid Esters, synthetic waxes such as tolylene diisocyanate-modified oxidized waxes, higher fatty acids such as zinc stearate and metal salts thereof or mold release agents such as paraffin; various additives such as antioxidants can be mentioned. These additives may be blended appropriately.

[Method of producing epoxy resin composition]
The manufacturing method of the epoxy resin composition of this embodiment is demonstrated.
The method for producing the epoxy resin composition can include a lot sorting step and a mixing step. First, a plurality of epoxy resins a having different lots are prepared, and the number of chlorine-containing particles of the prepared epoxy resin a is measured using the above-described inspection method of chlorine-containing particles. Based on the obtained measurement results, an epoxy resin a containing chlorine-containing particles is selected from a plurality of lots and used as a raw material component (epoxy resin A) of the epoxy resin composition (lot selection step). An epoxy resin composition can be obtained by mixing other raw material components with the epoxy resin A (mixing step).
In addition, other components (for example, curing agent b and inorganic filler c) are also subjected to lot selection in the same manner as epoxy resin a, and curing agent b and inorganic filler c containing chlorine-containing particles are used as raw materials. You may use as a component (hardener B and the inorganic filler C). Moreover, it is possible to add the method of controlling the quantity of the above-mentioned chlorine containing particle | grains suitably.

Also, in the above mixing step, the mixture is obtained by mixing by a known means. Furthermore, the mixture is melt-kneaded to obtain a kneaded product. As a kneading method, for example, an extrusion kneader such as a single-screw kneading extruder or a twin-screw kneading extruder, or a roll kneader such as a mixing roll can be used, but a twin-screw kneading extruder is used. Is preferred. After cooling, the kneaded product can be made into powder, granules, tablets, or sheets.

As a method of obtaining a powdery particulate resin composition, for example, a method of pulverizing a kneaded material by a pulverizing apparatus may be mentioned. The kneaded material may be formed into a sheet and pulverized. As a grinding device, for example, a hammer mill, a millstone type grinder, a roll crusher or the like can be used.

As a method of obtaining a granular or powdery resin composition, for example, a die having a small diameter is installed at the outlet of a kneading apparatus, and a molten material in a molten state discharged from the dies is given a predetermined length by a cutter or the like. It is also possible to use a granulation method typified by a hot cut method of cutting into pieces. In this case, after obtaining a granular or powdery resin composition by a granulation method such as a hot cut method, it is preferable to carry out degassing while the temperature of the resin composition is not lowered so much.

The epoxy resin composition of the present embodiment can be used in various applications. For example, the epoxy resin composition of the present embodiment can be used for a sealing resin composition or a fixing resin composition. As a sealing resin composition (a sealing resin composition for sealing an electronic component) according to the present embodiment, an electronic component such as a semiconductor chip can be sealed, and it is used for the above semiconductor package Resin composition for encapsulating a semiconductor, resin composition for encapsulating an electronic control unit for automobile sealing a substrate on which an electronic component or the like is mounted, or for a sensor, for a sensor module, for a camera, for a camera module, a module with a display It is applicable to the resin composition for module sealing with dry cells and coin cells. Moreover, as a resin composition for fixation which concerns on this embodiment, it can be used also for fixation of motor components, For example, it is applicable to the resin composition for stator core fixation, a stator fixation, etc.

The structure (for example, an electronic device) of the present embodiment is provided with a cured product of the above epoxy resin composition. Examples of the structure include an electronic control unit in which a semiconductor package, a substrate on which electronic components and the like are mounted are sealed, a sensor, a sensor module, a camera, a camera module, a module with a display, a module with a dry cell / coin cell, a motor, etc. Can be mentioned.

FIG. 1 is a view showing a cross-sectional structure of an example of a semiconductor device using the epoxy resin composition of the present embodiment. The semiconductor element 1 is fixed on the die pad 3 via the die bonding material curing body 2. The electrode pads of the semiconductor element 1 and the lead frame 5 are connected by bonding wires 4. The semiconductor element 1 is sealed by the cured body 6 of the epoxy resin composition of the present embodiment.

FIG. 2 is a view showing a cross-sectional structure of an example of a single-sided sealed type semiconductor device using the epoxy resin composition of the present embodiment. The semiconductor element 1 is fixed on the solder resist 7 of the laminated body in which the layer of the solder resist 7 is formed on the surface of the substrate 8 via the die bonding material cured body 2. In order to electrically connect the semiconductor element 1 and the substrate 8, the solder resist 7 on the electrode pad is removed by a developing method so that the electrode pad of the substrate 8 is exposed. The electrode pads of the semiconductor element 1 and the electrode pads of the substrate 8 are connected by bonding wires 4. Only one side of the substrate 8 on which the semiconductor element 1 is mounted is sealed by the cured product 6 of the epoxy resin composition of the present embodiment. The electrode pads on the substrate 8 are internally joined to the solder balls 9 on the non-sealing surface side on the substrate 8.

The epoxy resin composition of the present embodiment can be used as a sealing resin composition for sealing an on-vehicle electronic control unit.
FIG. 3 is a schematic cross-sectional view showing an example of the structure (vehicle-mounted electronic control unit 10) of the present embodiment.
The in-vehicle electronic control unit 10 is used to control an engine, various in-vehicle devices, and the like. As shown in FIG. 3, the on-vehicle electronic control unit 10 includes, for example, a substrate 12, an electronic component 16 mounted on the substrate 12, and a sealing resin layer 14 for sealing the substrate 12 and the electronic component 16. Have. The substrate 12 has a connection terminal 18 for connecting to the outside on at least one side. The on-vehicle electronic control unit 10 according to an example of the present embodiment is electrically connected to the mating connector via the connecting terminal 18 by fitting the connecting terminal 18 and the mating connector.

The substrate 12 is, for example, a wiring substrate provided with a circuit wiring on one or both of one surface and the other surface opposite to the one surface. As shown in FIG. 3, the substrate 12 has, for example, a flat plate shape. In the present embodiment, for example, an organic substrate formed of an organic material such as polyimide can be employed as the substrate 12. The thickness of the substrate 12 is not particularly limited, but may be, for example, 0.1 mm or more and 5 mm or less, and preferably 0.5 mm or more and 3 mm or less.

In the present embodiment, a through hole 120 may be provided in the substrate 12, for example, penetrating the substrate 12 to connect one surface to the other surface. In this case, the wiring provided on one surface of the substrate 12 and the wiring provided on the other surface are electrically connected via the conductor pattern provided in the through hole 120. The conductive pattern is formed along the wall surface of through hole 120. That is, the conductive pattern in through hole 120 is formed in a cylindrical shape. In the through holes 120 after the sealing step, the void holes formed on the inner wall surface of the conductive pattern are filled with the cured product (sealing resin layer 14) of the epoxy resin composition of the present embodiment.

For example, an electronic component 16 is mounted on one or both of one surface and the other surface of the substrate 12. The electronic component 16 is not particularly limited as long as it can be mounted on a vehicle-mounted electronic control unit, and for example, a microcomputer may be mentioned.

In the on-vehicle electronic control unit 10 according to the present embodiment, the substrate 12 may be mounted, for example, on a metal base. The metal base can function as a heat sink for dissipating heat generated from the electronic component 16, for example. In the present embodiment, the on-vehicle electronic control unit 10 can be formed by integrally sealing and molding, for example, a metal base and the substrate 12 mounted on the metal base using an epoxy resin composition. Although it does not specifically limit as a metal material which comprises a metal base, For example, iron, copper, and aluminum, and the alloy etc. which contain 1 or 2 types of these, etc. can be included. The on-vehicle electronic control unit 10 may not have a metal base.

As mentioned above, although this invention was demonstrated based on embodiment, this invention is not limited to the said embodiment, The structure can also be changed in the range which does not change the summary of this invention.

Hereinafter, the present invention will be described in detail using examples, but the present invention is not limited to the description of these examples.

About the raw material component used by each Example and each comparative example, it shows below.

(Colorant)
Colorant 1: carbon black (carbon # 5, manufactured by Mitsubishi Chemical Corporation)

(Hardening accelerator)
Curing accelerator 1: Curing accelerator 1 represented by the following formula

[Method of synthesizing curing accelerator 1]
In a flask containing 1800 g of methanol, 249.5 g of phenyltrimethoxysilane and 384.0 g of 2,3-dihydroxynaphthalene were added and dissolved, and then 231.5 g of a 28% sodium methoxide-methanol solution was added dropwise while stirring at room temperature. Further, a solution of 503.0 g of tetraphenylphosphonium bromide prepared in advance in 600 g of methanol was added dropwise thereto under stirring at room temperature to precipitate crystals. The precipitated crystals were filtered, washed with water and vacuum dried to obtain the above-mentioned curing accelerator 1 of pinkish white crystals.

Hardening accelerator 2: Hardening accelerator 2 represented by the following formula

[Method of synthesizing curing accelerator 2]
In a separable flask equipped with a condenser and a stirrer, 12.81 g (0.080 mol) of 2,3-dihydroxynaphthalene, 16.77 g (0.040 mol) of tetraphenylphosphonium bromide and 100 ml of methanol are charged and uniformly dissolved. The A sodium hydroxide solution prepared by previously dissolving 1.60 g (0.04 ml) of sodium hydroxide in 10 ml of methanol was gradually dropped into the flask to precipitate crystals. The precipitated crystals were filtered, washed with water and vacuum dried to obtain a hardening accelerator 2 represented by the above formula.

(Coupling agent)
Coupling agent 1: N-phenyl-3-aminopropyltrimethoxysilane (CF-4083, manufactured by Toray Dow Corning)
Coupling agent 2: 3-mercaptopropyltrimethoxysilane (S810, manufactured by Chisso)

(Epoxy resin A)
Epoxy resin a1: phenol-aralkyl epoxy resin containing biphenylene skeleton (NC 3000 L, manufactured by Nippon Kayaku Co., Ltd.)
Epoxy resin a2: Bisphenol A epoxy resin (YL 6810, manufactured by Mitsubishi Chemical Corporation)
Epoxy resin a3: biphenyl type epoxy resin (YX4000K, manufactured by Mitsubishi Chemical Corporation)
Epoxy resin 4: Epoxy resin synthesized without using epichlorohydrin (glycidyl ether type liquid epoxy resin, manufactured by DIC EPICLON EXA-4880, total chlorine: 0 ppm)
Epoxy resin 5: Epoxy resin synthesized without using epichlorohydrin (alicyclic epoxy resin, manufactured by Daisel Co. EHPE 3150, total chlorine: 0 ppm)

(Inorganic filler C)
Inorganic filler c1: fused spherical silica (FB-100XFC, manufactured by Denka, average particle size 13 μm)
Inorganic filler c2: fused spherical silica (MSV-SC3, manufactured by Ryumori, average particle diameter 19 μm)
Inorganic filler c3: spherical silica (SD 2500-SQ, manufactured by Admatex, average particle size 0.5 μm)
Inorganic filler c4: spherical silica (SC-2500-SQ, manufactured by Admatex Co., Ltd., average particle size 0.5 μm)
Inorganic filler c5: fused spherical silica (FB-950FC, manufactured by Denka, average particle diameter 22 μm)

(Flame retardants)
Flame retardant 1: Aluminum hydroxide (BE043, manufactured by Nippon Light Metal Co., Ltd.)
Flame retardant 2: Aluminum hydroxide (CL-303, manufactured by Sumitomo Chemical Co., Ltd.)

(Hardener B)
Hardening agent b1: biphenylene skeleton-containing phenol aralkyl resin (MEH-7851 SS, manufactured by Meiwa Kasei Co., Ltd.)
Hardening agent b2: Novolak type phenol resin (PR-HF-3, manufactured by Sumitomo Bakelite Co., Ltd.)

(Ion capture agent)
Ion scavenger 1: Hydrotalcite (DHT-4H, manufactured by Kyowa Chemical Industry Co., Ltd.)
Ion trapping agent 2: Aluminum-magnesium inorganic ion exchanger (IXE-700F, manufactured by Toagosei Co., Ltd.)

(Low stress agent)
Low stress agent 1: Acrylonitrile-butadiene copolymer compound (CTBN 1008SP, manufactured by PTI Japan Ltd.)
Low stress agent 2: Melt reactant A (silicone) obtained by the following synthesis method
[Method of synthesizing molten reactant A]
66.1 parts by weight of a bisphenol A-type epoxy resin (JERB Epoxy Resins Co., Ltd., jER (registered trademark) YL 6810, softening point 45 ° C., epoxy equivalent 172) represented by the following formula (8) Then, 33.1 parts by weight of organopolysiloxane represented by the following formula (7) and 0.8 parts by weight of triphenylphosphine were added and melt mixed for 30 minutes to obtain a molten reactant A.

Low stress agent 3: Alkyl group-containing silicone (Silsoft 034, manufactured by Momentive)

(Release agent)
Releasing agent 1: Montanic acid ester wax (WE-4, manufactured by Clariant Japan Ltd.)
Releasing agent 2: Diethanolamine / zimontanic acid ester (NC-133, manufactured by Ito Oil Co., Ltd.)
Releasing agent 3: Tolylene diisocyanate-modified oxidized wax (NPS-6010, manufactured by Nippon Seiwa Co., Ltd.)
Release agent 4: Stearic acid (SR-Sakura, manufactured by NOF Corporation)

<Preparation of Epoxy Resin Composition>
Example 1
A plurality of epoxy resins a1 having different lots were prepared, and the number of chlorine-containing particles of the prepared epoxy resin a1 was measured using the following inspection method of chlorine-containing particles. Based on the obtained measurement results, an epoxy resin a1 containing a number of chlorine-containing particles shown in Table 2 was selected from a plurality of lots and used as a raw material component (epoxy resin A) of the epoxy resin composition . The curing agent b1 was used as the curing agent B, and the inorganic fillers c1 and c3 were used as the inorganic filler C.
Subsequently, after using the other raw material components described in Table 1 together with the above-mentioned epoxy resin A, curing agent B and inorganic filler C, after mixing using a mixer at normal temperature based on the compounding ratio shown in Table 1 The mixture was roll-kneaded at 70 to 90.degree. Subsequently, after cooling the obtained kneaded material, this was pulverized to obtain an epoxy resin composition.
About the obtained epoxy resin composition, the number of objects of chlorine containing particles was measured using the inspection method of the following chlorine containing particles. The results are shown in Table 2.

Example 2
A plurality of epoxy resins a2 having different lots were prepared, and the number of chlorine-containing particles of the prepared epoxy resin a2 was measured using the following inspection method of chlorine-containing particles. Based on the obtained measurement results, an epoxy resin a2 containing a number of chlorine-containing particles shown in Table 2 was selected from a plurality of lots and used as a raw material component (epoxy resin A) of the epoxy resin composition An epoxy resin composition was obtained in the same manner as Example 1 except for the above.

[Example 3]
An epoxy resin composition was obtained in the same manner as in Example 1 except that inorganic fillers c2 and c3 were used as the inorganic filler C.

Example 4
The same procedure as in Example 1 was repeated except that the solution obtained by dissolving in an organic solvent and filtering it with a 1 μm filter was used as a raw material component (curing agent B) for the same lot of curing agent b1 as in Example 1. The epoxy resin composition was obtained.

[Example 5]
A plurality of epoxy resins a3 having different lots were prepared, and the number of chlorine-containing particles of the prepared epoxy resin a3 was measured using the following inspection method of chlorine-containing particles. Based on the obtained measurement results, an epoxy resin a3 containing a number of chlorine-containing particles shown in Table 2 was selected from a plurality of lots and used as a raw material component (epoxy resin A) of the epoxy resin composition . The curing agent b1 was used as the curing agent B, and the inorganic fillers c4 and c5 were used as the inorganic filler C.
Subsequently, after using the other raw material components described in Table 1 together with the above-mentioned epoxy resin A, curing agent B and inorganic filler C, after mixing using a mixer at normal temperature based on the compounding ratio shown in Table 1 The mixture was roll-kneaded at 70 to 90.degree. Subsequently, after cooling the obtained kneaded material, this was pulverized to obtain an epoxy resin composition.
About the obtained epoxy resin composition, the number of objects of chlorine containing particles was measured using the inspection method of the following chlorine containing particles. The results are shown in Table 2.

[Example 6]
The curing agent b2 is used in place of the curing agent b1 of Example 2, and the solution obtained by dissolving the solution in an organic solvent is filtered through a 1 μm filter for the curing agent b2 as a raw material component (curing agent B) An epoxy resin composition was obtained in the same manner as in Example 5 except that it was used.

[Example 7]
The solution obtained by dissolving in an organic solvent was filtered with a 1 μm filter for epoxy resin a3 of a lot different from Example 5 and the number of chlorines shown in Table 2 was measured using the following inspection method of chlorine-containing particles An epoxy resin composition was obtained in the same manner as in Example 5, except that the epoxy resin a3 containing the containing particles was used as a raw material component (epoxy resin A).

Comparative Example 1
An epoxy resin composition was obtained in the same manner as in Example 1 except that the epoxy resin 4 was used as the epoxy resin A.
Comparative Example 2
An epoxy resin composition was obtained in the same manner as in Example 5, except that the epoxy resin 5 was used as the epoxy resin A.

Comparative Example 3
The solution obtained by dissolving in an organic solvent was filtered through a 1 μm filter for epoxy resin a2 of a lot different from Example 2 and the number of chlorine-containing particles measured using the following method for inspecting chlorine-containing particles is 0 An epoxy resin composition was obtained in the same manner as in Example 2 except that the epoxy resin a2 was used as the raw material component (epoxy resin A).

(Test method of chlorine-containing particles)
(1) As a sample, the raw material component which comprises an epoxy resin composition or an epoxy resin composition was prepared. The epoxy resin composition used what cooled and obtained the kneaded material which mixed and knead | mixed each raw material component.
(2) 50 g of the sample of (1) is put into a cleaned 1000 ml container made of polypropylene, 300 ml of acetone is added, the container is covered, and using a shaker, room temperature 25 ° C., 300 reciprocations / minute Shake (mix) for 50 minutes. The acetone to be used used what was filtered by the filter of 12 micrometers of mesh sizes.
(3) The above acetone-washed filter was placed in a funnel set (filtering device). The filter used was a nylon filter with an opening size of 75 μm, which was subjected to ultrasonic cleaning.
(4) The container shaken in (2) was allowed to stand, and then the solution in the container was poured from the top of the funnel of (3) and suction filtered through a filter.
(5) The funnel was removed and the residue on the filter was dried with suction.
(6) The adhesive surface of the measurement sheet was attached to the filter surface of (5), and the residue was collected on the adhesive surface of the measurement sheet.
(7) The measurement sheet of (6) was peeled off from the filter, and a composite photograph was created using a digital microscope for the entire surface of the adhesive surface. After adjusting the visual field magnification to be 50 times, the entire surface was observed, and the position where the residue was present was recorded and printed.
(8) The position of the residue was confirmed by the printed matter of (7), and composition analysis was performed on the residue using a scanning electron microscope (SEM) / energy dispersive X-ray analyzer (EDS). As a result of SEM image observation, it was confirmed that particulate residue was present.
(9) From the compositional analysis result of the residue based on energy dispersive X-ray spectroscopy (EDX) of (8), the number of chlorine-containing particles contained in the epoxy resin composition or the raw material component constituting the epoxy resin composition Was measured (counted).

Further, as to chlorine-containing particles detected in the epoxy resin or in the epoxy resin composition, organic substances in the chlorine-containing particles were identified from the spectrum results using FT-IR (Fourier transform infrared spectroscopy). The evaluation results are shown in Table 2.

In Table 2, the organic substance of chlorine-containing particles 1A-1 is a mixture of epoxy resin and carbonate, the organic substance of chlorine-containing particles 1A-2 is a carbonate, the organic substance of chlorine-containing particles 2A-1 is an amide compound, chlorine-containing particles 5A- Organic substances of 1 are carbonates, organic substances of chlorine-containing particles 5A-2 are carbonates and silicates, organic substances of chlorine-containing particles 1-4 are cellulose, organic substances of chlorine-containing particles 2-1 are cellulose, chlorine-containing particles 3- The organic substance of 4 was identified to contain cellulose.

<Evaluation>
The following evaluation was performed about the obtained epoxy resin composition. The evaluation results are shown in Table 2.

(Spiral flow)
Spiral flow measurement was performed on the obtained epoxy resin composition. Spiral flow measurement is performed using a low-pressure transfer molding machine ("KTS-15" manufactured by Kotaki Seiki Co., Ltd.) in a mold for spiral flow measurement according to EMMI-1-66 at a mold temperature of 175 ° C, injection pressure The epoxy resin composition was injected under the conditions of 6.9 MPa and a curing time of 120 seconds, and the flow length was measured. The results are shown in Table 2.

(Gel time)
The sample consisting of the obtained epoxy resin composition was placed on a hot plate at 175 ° C., and after melting the sample, the time until curing while kneading with a spatula was measured. The unit is seconds (sec). The results are shown in Table 2.

(Metal adhesion)
Using the obtained epoxy resin composition, using a low pressure transfer molding machine ("AV-600-50-TF" manufactured by Yamashiro Seiki Co., Ltd.), the mold temperature is 175 ° C, the injection pressure is 10 MPa, and the curing time is 180 seconds. Under the conditions, 10 pieces of adhesion strength test pieces of 3.6 mmφ × 3 mm were formed per level on a 9 × 29 mm strip-like test copper lead frame. Subsequently, the die shear strength of the test piece and the frame was measured at room temperature using an automatic die shear measurement apparatus (DAGE 4000 type manufactured by Nordson Advanced Technology). The average value of die shear strength (MPa) of 10 test pieces is shown in Table 2.

The epoxy resin compositions of Examples 1 to 7 were found to be excellent in metal adhesion as compared with the epoxy resin compositions of Comparative Examples 1 to 3, because the adhesion to the Cu frame was improved.

This application claims priority based on Japanese Patent Application No. 2017-234008 filed on Dec. 6, 2017, the entire disclosure of which is incorporated herein.

Claims (11)

1. An epoxy resin composition comprising an epoxy resin, a curing agent and an inorganic filler,
   An epoxy resin composition containing chlorine-containing particles containing an organic substance.
2. The epoxy resin composition according to claim 1, wherein
   The epoxy resin composition whose chlorine concentration in the said chlorine containing particle | grains measured based on energy dispersive X ray spectroscopy (EDX) is 0.01 Atm% or more and 20 Atm% or less.
3. The epoxy resin composition according to claim 1 or 2, wherein
   The chlorine-containing particles contain one or more selected from the group consisting of Al element, Mg element, Si element, Fe element, Zn element, Ti element, Ca element, Na element, K element, S element, carbonic acid compound , Epoxy resin composition.
4. The epoxy resin composition according to any one of claims 1 to 3, wherein
   The epoxy resin composition whose carbon concentration in the said chlorine containing particle | grains measured based on energy dispersive X ray spectroscopy (EDX) is 40 Atm%-99 Atm%.
5. It is the epoxy resin composition of any one of Claim 1 to 4, Comprising:
   The epoxy resin composition whose oxygen concentration in the said chlorine containing particle | grains measured based on energy dispersive X ray spectroscopy (EDX) is 1 Atm% or more and 50 Atm% or less.
6. The epoxy resin composition according to any one of claims 1 to 5, wherein
   The epoxy resin composition in which the said organic substance contains 1 or more types selected from the group which consists of carbonate, an amide compound, and a silicate.
7. The epoxy resin composition according to any one of claims 1 to 6, wherein
   The chlorine-containing particles are obtained by mixing the epoxy resin composition with acetone to obtain a solution, filtering the obtained solution through a filter with an opening size of 75 μm, and being contained in the residue on the filter , Epoxy resin composition.
8. It is the epoxy resin composition of any one of Claim 1 to 7, Comprising:
   The epoxy resin composition which obtains a 50-g sample using the said epoxy resin composition, and the number of objects of the said chlorine-containing particle in the said 50-g sample is one or more and 10 or less.
9. The epoxy resin composition according to any one of claims 1 to 8, wherein
   The epoxy resin composition used for the resin composition for sealing for sealing an electronic component.
10. The epoxy resin composition according to any one of claims 1 to 9, wherein
    The epoxy resin composition used for the resin composition for sealing for sealing a vehicle-mounted electronic control unit.
11. The electronic device provided with the hardened | cured material of the epoxy resin composition of any one of Claims 1-10.

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