TW201936773A - Epoxy resin composition and electronic device - Google Patents

Epoxy resin composition and electronic device Download PDF

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Publication number
TW201936773A
TW201936773A TW107142143A TW107142143A TW201936773A TW 201936773 A TW201936773 A TW 201936773A TW 107142143 A TW107142143 A TW 107142143A TW 107142143 A TW107142143 A TW 107142143A TW 201936773 A TW201936773 A TW 201936773A
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epoxy resin
resin composition
chlorine
atm
containing particles
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TW107142143A
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和田雅浩
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日商住友電木股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/02Halogenated hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/09Carboxylic acids; Metal salts thereof; Anhydrides thereof
    • C08K5/095Carboxylic acids containing halogens
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/17Amines; Quaternary ammonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/10Materials in mouldable or extrudable form for sealing or packing joints or covers

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Epoxy Resins (AREA)
  • Sealing Material Composition (AREA)

Abstract

This epoxy resin composition contains an epoxy resin, a curing agent and an inorganic filler, while containing chlorine-containing particles that contain an organic substance.

Description

環氧樹脂組成物及電子裝置Epoxy resin composition and electronic device

本發明係關於一種環氧樹脂組成物及電子裝置。The invention relates to an epoxy resin composition and an electronic device.

到目前為止,已對環氧樹脂組成物進行了各種開發。作為該種技術,例如已知有專利文獻1所記載之技術。專利文獻1中記載有如下內容:為了減少源自原料的水解性氯的含量,使用藉由在原料中未使用表氯醇(環氧氯丙烷)之方法製造之環氧化合物(專利文獻1的0012段)。
[先前技術文獻]
[專利文獻]
So far, various developments have been made on epoxy resin compositions. As such a technique, for example, the technique described in Patent Document 1 is known. Patent Document 1 describes the following: In order to reduce the content of hydrolyzable chlorine derived from raw materials, an epoxy compound produced by a method that does not use epichlorohydrin (epichlorohydrin) in the raw materials is used (Patent Document 1 of 0012).
[Prior Technical Literature]
[Patent Literature]

專利文獻1:日本特開2012-92247號公報Patent Document 1: Japanese Patent Laid-Open No. 2012-92247

[發明所欲解決之課題][Problems to be solved by the invention]

本發明人進行了研究之結果判明了,在專利文獻1所記載之使用了環氧化合物之環氧樹脂組成物中,關於金屬密接性的方面有改善的空間。
[解決課題之技術手段]
As a result of research conducted by the present inventors, it was found that the epoxy resin composition using an epoxy compound described in Patent Document 1 has room for improvement in terms of metal adhesion.
[Technical means to solve the problem]

本發明人進一步進行了研究之結果發現了,藉由適當地控制環氧樹脂組成物所含有之氯的存在狀態,能夠改變環氧樹脂組成物的特性。基於該種見解進一步進行了深入研究之結果發現了,藉由在環氧樹脂組成物中包含含有有機物之含氯粒子,能夠提高環氧樹脂組成物中的金屬密接性,從而完成了本發明。
詳細機制雖然尚不明確,但認為含氯粒子對Cu等金屬具有氧化作用,藉由該種氧化作用來改質金屬的表面,並提高與環氧樹脂組成物的親和性,因此金屬密接性提高。
As a result of further investigations by the present inventors, it was found that by appropriately controlling the presence state of chlorine contained in the epoxy resin composition, the characteristics of the epoxy resin composition can be changed. As a result of further research based on this insight, it was found that by including chlorine-containing particles containing an organic substance in the epoxy resin composition, the metal adhesion in the epoxy resin composition can be improved, and the present invention has been completed.
Although the detailed mechanism is not yet clear, it is believed that the chlorine-containing particles have an oxidizing effect on metals such as Cu, and this type of oxidation improves the surface of the metal and improves the affinity with the epoxy resin composition, so the metal adhesion is improved .

依本發明,提供一種環氧樹脂組成物,其包含環氧樹脂、硬化劑及無機填充材料,
該環氧樹脂組成物包含:含有有機物之含氯粒子。
According to the present invention, an epoxy resin composition is provided, which includes an epoxy resin, a hardener and an inorganic filler,
The epoxy resin composition includes chlorine-containing particles containing organic matter.

又,依本發明,提供一種具備上述環氧樹脂組成物的硬化物之電子裝置。In addition, according to the present invention, there is provided an electronic device provided with a cured product of the epoxy resin composition.

依本發明,提供一種金屬密接性優異的環氧樹脂組成物及使用該環氧樹脂組成物之電子裝置。According to the present invention, there is provided an epoxy resin composition excellent in metal adhesion and an electronic device using the epoxy resin composition.

以下,適當地利用圖式對實施形態進行說明。另外,在所有圖式中,對相同的構成要素標註相同的符號,並適當地省略說明。Hereinafter, the embodiments will be described as appropriate using drawings. In addition, in all drawings, the same constituent elements are denoted by the same symbols, and descriptions are omitted as appropriate.

[環氧樹脂組成物]
本實施形態的環氧樹脂組成物能夠包含環氧樹脂、硬化劑及無機填充材料。該環氧樹脂組成物係包含含有有機物之含氯粒子者。
[Epoxy resin composition]
The epoxy resin composition of this embodiment can contain an epoxy resin, a hardener, and an inorganic filler. This epoxy resin composition includes those containing organic-containing chlorine-containing particles.

依本發明人的見解,判明了如下內容。
以往,已知有將環氧樹脂組成物中的總氯和水解性氯作為對象,並將對象含量作為指標進行檢查之方法。作為習知對象之水解性氯和游離氯均勻地存在於整個環氧樹脂組成物(例如密封材料)中。
相對於此,發現了稱為含有有機物之含氯粒子(以下,有時簡稱為“含氯粒子”)之、氯的新的存在形態。判明了該含氯粒子的氯的存在形態與來自於水解性氯和游離氯之氯不同,局部存在於環氧樹脂組成物中並在該粒子中成為高濃度。例如能夠藉由能量分散型X射線光譜法(EDX)的元素映射(mapping)等顯著確認含氯粒子中的氯的存在。
詳細機制雖然尚不明確,但認為該種含氯粒子對Cu等金屬具有氧化作用,藉由該種氧化作用改質金屬的表面,並提高與環氧樹脂組成物的親和性,從而能夠提高環氧樹脂組成物中的金屬密接性。
因此,藉由在環氧樹脂組成物中包含:含有有機物之含氯粒子,能夠提高環氧樹脂組成物中的金屬密接性。
According to the inventor's opinion, the following contents were determined.
Conventionally, a method of inspecting the total chlorine and hydrolyzable chlorine in an epoxy resin composition as a target and using the target content as an index has been known. Hydrolyzable chlorine and free chlorine, which are conventional objects, exist uniformly in the entire epoxy resin composition (for example, sealing material).
In contrast to this, a new form of existence of chlorine called organic-containing chlorine-containing particles (hereinafter, sometimes simply referred to as "chlorine-containing particles") was discovered. It was found that the presence of chlorine in the chlorine-containing particles is different from chlorine derived from hydrolyzable chlorine and free chlorine, and is locally present in the epoxy resin composition and becomes a high concentration in the particles. For example, the presence of chlorine in chlorine-containing particles can be clearly confirmed by element mapping of energy dispersive X-ray spectroscopy (EDX).
Although the detailed mechanism is not clear, it is believed that the chlorine-containing particles have an oxidation effect on metals such as Cu, and the surface of the metal is modified by this oxidation, and the affinity with the epoxy resin composition is improved, so that the ring can be improved. Metal adhesion in the oxygen resin composition.
Therefore, by including chlorine-containing particles containing organic matter in the epoxy resin composition, the metal adhesion in the epoxy resin composition can be improved.

在本實施形態中,能夠設為如下:含氯粒子係,將該環氧樹脂組成物與丙酮混合而獲得溶液,並將所獲得之溶液使用網孔尺寸為75μm的過濾器過濾,而包含在其過濾器上的殘渣中者。In this embodiment, it can be set as follows: a chlorine-containing particle system, this epoxy resin composition is mixed with acetone to obtain a solution, and the obtained solution is filtered using a filter with a mesh size of 75 μm, and contained in Among the residues on the filter.

在本實施形態中,含氯粒子能夠藉由以下檢查方法(以下,有時亦稱為含氯粒子的檢查方法)進行檢測。
(1)作為試樣(樣品),準備環氧樹脂組成物或構成環氧樹脂組成物之原料成分(例如,環氧樹脂、硬化劑、無機填充材料等)。環氧樹脂組成物使用將各原料成分進行混合、混練並對所獲得之混練物進行冷卻而得者(B階段狀態的環氧樹脂組成物)。
(2)將(1)的試樣50g投入到清洗完的聚丙烯製的1000ml容器中,並添加丙酮300ml,蓋上容器之後,在室溫25℃,使用震盪器在300來回/分鐘的條件下搖動(混合)50分鐘。使用之丙酮使用藉由網孔尺寸為12μm的過濾器過濾而得者。
(3)在漏斗套組(過濾器具)中設置了用上述丙酮清洗之過濾器。過濾器使用了對網孔尺寸為75μm的尼龍製過濾器進行了超音波清洗而得者。
(4)靜置(2)中搖動後的容器,然後,將容器中的溶液從(3)的漏斗上部注入,經由過濾器抽吸過濾。當使用試樣中所包含之無機填充材料等的填料的粒徑大於過濾器的網孔的粒徑時,亦可以使用過濾器過濾該溶液中的上清液。
(5)取出漏斗,並在抽吸之狀態下乾燥過濾器上的殘渣。
(6)在(5)的過濾器表面黏貼測量用片材的黏著性表面,並將殘渣回收到測量用片材的黏著性表面。
(7)將(6)的測量用片材從過濾器剝離,針對其黏著性表面的整個面,使用數位顯微鏡製作合成照片。將視野倍率調整為50倍之後,觀察整個表面,記錄殘渣所存在之位置並進行了印刷。
(8)在(7)的印刷物中確認殘渣的位置,並且使用掃描型電子顯微鏡(SEM)/能量分散型X射線分析裝置(EDS),對該殘渣實施組成分析。
(9)由基於(8)的能量分散型X射線光譜法(EDX)的殘渣的組成分析結果,計數環氧樹脂組成物或構成該環氧樹脂組成物之原料成分中所含有之含氯粒子的個數,並且特定含氯粒子中的元素成分。亦可以根據需要對含氯粒子實施各種分析。
In this embodiment, the chlorine-containing particles can be detected by the following inspection method (hereinafter, sometimes referred to as an inspection method for chlorine-containing particles).
(1) As a sample (sample), prepare an epoxy resin composition or a raw material component constituting the epoxy resin composition (for example, epoxy resin, hardener, inorganic filler, etc.). As the epoxy resin composition, those obtained by mixing and kneading the raw material components and cooling the obtained kneaded material (B-stage epoxy resin composition) were used.
(2) Put 50g of the sample of (1) into a cleaned polypropylene 1000ml container, add 300ml of acetone, cover the container, and use a shaker at a temperature of 300 rounds / min at room temperature 25 ° Shake (mix) for 50 minutes. The acetone used was obtained by filtering through a filter with a mesh size of 12 μm.
(3) A filter cleaned with the above acetone is installed in the funnel set (filter appliance). The filter was obtained by ultrasonic cleaning of a nylon filter with a mesh size of 75 μm.
(4) Let the container shaken in (2) stand, and then inject the solution in the container from the upper part of the funnel of (3) and filter it with suction through a filter. When the particle size of the filler such as the inorganic filler contained in the sample is larger than the particle size of the mesh of the filter, the supernatant in the solution can also be filtered using a filter.
(5) Take out the funnel and dry the residue on the filter in the state of suction.
(6) Stick the adhesive surface of the measurement sheet to the filter surface of (5), and collect the residue on the adhesive surface of the measurement sheet.
(7) Peel off the measurement sheet of (6) from the filter, and use a digital microscope to create a composite photo of the entire surface of the adhesive surface. After adjusting the field of view magnification to 50 times, observe the entire surface, record the location of the residue and print it.
(8) Confirm the position of the residue in the printed matter of (7), and use a scanning electron microscope (SEM) / energy dispersive X-ray analyzer (EDS) to conduct a composition analysis of the residue.
(9) Based on the analysis results of the residue based on the energy dispersive X-ray spectroscopy (EDX) of (8), count the chlorine-containing particles contained in the epoxy resin composition or the raw material component constituting the epoxy resin composition The number and specific element composition in chlorine-containing particles. Various analyses can also be performed on chlorine-containing particles as needed.

測量習知之總氯量之方法係將無機氯及來自於環氧樹脂的原料等的水解性氯作為對象者,因此無法將上述含氯粒子作為測量的對象。
相對於此,上述含氯粒子的檢查方法係對環氧樹脂組成物、其原料成分中所含有之含氯粒子、該粒子所含有之氯穩定地進行檢測之方法,係由本發明人新確立之方法。
The conventional method for measuring the total amount of chlorine is based on inorganic chlorine and hydrolyzable chlorine derived from raw materials such as epoxy resin. Therefore, the above-mentioned chlorine-containing particles cannot be measured.
In contrast, the above-mentioned method for inspecting chlorine-containing particles is a method for stably detecting the chlorine-containing particles contained in the epoxy resin composition, its raw material components, and the chlorine contained in the particles, which is newly established by the present inventors method.

環氧樹脂所含有之上述含氯粒子中的有機物能夠包含選自由碳酸鹽、醯胺化合物及矽酸鹽組成的群中之1種以上。該等有機物可以為與環氧樹脂的混合物。
環氧樹脂組成物中所含有之上述含氯粒子中的有機物能夠包含選自由纖維素、聚對苯二甲酸乙二酯、聚丙烯、絲綢、聚矽氧化合物及醯胺化合物組成的群中之1種以上。該等可以單獨使用,亦可以組合2種以上使用。或者,亦可以為該等的混合物。
上述含氯粒子可以含有除此以外的有機物。能夠使用FT-IR(傅立葉轉換紅外線光譜)從含氯粒子的光譜結果中鑑定有機物。
The organic substance in the chlorine-containing particles contained in the epoxy resin can include one or more kinds selected from the group consisting of carbonates, amide compounds, and silicates. The organic substance may be a mixture with epoxy resin.
The organic matter in the above-mentioned chlorine-containing particles contained in the epoxy resin composition can include one selected from the group consisting of cellulose, polyethylene terephthalate, polypropylene, silk, polysiloxane compound, and amide compound One or more. These can be used alone or in combination of two or more. Alternatively, it may be a mixture of these.
The chlorine-containing particles may contain other organic substances. FT-IR (Fourier Transform Infrared Spectroscopy) can be used to identify organic matter from the spectral results of chlorine-containing particles.

上述含氯粒子中的氯濃度的下限值例如為0.01Atm%以上,可以為0.5Atm%以上,亦可以為0.1Atm%以上。藉此,能夠提高金屬密接性。另一方面,上述含氯粒子中的氯濃度的上限值例如為20Atm%以下,較佳為10Atm%以下,更佳為7Atm%以下。藉此,能夠提高可靠性。
又,當存在複數個含氯粒子時,能夠藉由減小氯濃度的最大值來提高可靠性。
The lower limit of the chlorine concentration in the chlorine-containing particles is, for example, 0.01 Atm% or more, may be 0.5 Atm% or more, or may be 0.1 Atm% or more. With this, the metal adhesion can be improved. On the other hand, the upper limit of the chlorine concentration in the chlorine-containing particles is, for example, 20 Atm% or less, preferably 10 Atm% or less, and more preferably 7 Atm% or less. With this, reliability can be improved.
In addition, when there are a plurality of chlorine-containing particles, the reliability can be improved by reducing the maximum value of the chlorine concentration.

上述含氯粒子中的碳濃度的下限值例如為40Atm%以上,較佳為50Atm%以上,更佳為60Atm%以上。藉此,能夠將氯穩定地固定在含氯粒子中。另一方面,上述含氯粒子中的碳濃度的上限值可以依據其他構成成分適當地變更,並沒有特別限定,例如,可以為99Atm%以下,亦可以為90Atm%以下,亦可以為85Atm%以下,亦可以為70Atm%以下。The lower limit of the carbon concentration in the chlorine-containing particles is, for example, 40 Atm% or more, preferably 50 Atm% or more, and more preferably 60 Atm% or more. With this, chlorine can be stably fixed in the chlorine-containing particles. On the other hand, the upper limit of the carbon concentration in the chlorine-containing particles can be appropriately changed according to other constituent components, and is not particularly limited. For example, it may be 99 Atm% or less, 90 Atm% or less, or 85 Atm% The following may also be 70 Atm% or less.

上述含氯粒子可以含有氧成分。在該情況下,上述含氯粒子中的氧濃度例如可以為1Atm%~50Atm%,亦可以為2Atm%~35Atm%,亦可以為3Atm%~30Atm%,亦可以為3Atm%~28Atm%(以下,關於“~”只要沒有特別說明,則表示包括上限值和下限值)。The chlorine-containing particles may contain oxygen components. In this case, the oxygen concentration in the chlorine-containing particles may be, for example, 1 Atm% to 50 Atm%, 2 Atm% to 35 Atm%, 3 Atm% to 30 Atm%, or 3 Atm% to 28 Atm% (below , As long as there is no special explanation, it means that the upper limit and lower limit are included).

上述含氯粒子能夠含有選自由Al元素、Mg元素、Si元素、Fe元素、Zn元素、Ti元素、Ca元素、Na元素、K元素、S元素、碳酸化合物組成的群中之1種以上。該等可以單獨使用,亦可以組合2種以上使用。
在該情况下,上述含氯粒子中的Al濃度可以為0.1Atm%~4Atm%,亦可以為0.1Atm%~1.0Atm%。
上述含氯粒子中的Mg濃度可以為0.1Atm%~0.5Atm%,亦可以為0.1Atm%~0.4Atm%。
上述含氯粒子中的Si濃度可以為0.1Atm%~5Atm%,亦可以為0.1Atm%~2.0Atm%,亦可以為0.1Atm%~1Atm%。
上述含氯粒子中的Fe濃度可以為0.1Atm%~4Atm%,亦可以為0.1Atm%~2.0Atm%。
上述含氯粒子中的Zn濃度可以為0.1Atm%~5Atm%,亦可以為0.1Atm%~1.0Atm%。
上述含氯粒子中的Ti濃度可以為0.01Atm%~1.0Atm%,亦可以為0.04Atm%~0.8Atm%。
上述含氯粒子中的Ca濃度可以為0.01Atm%~17Atm%,亦可以為0.02Atm%~6Atm%,亦可以為0.1Atm%~3Atm%。
上述含氯粒子中的Na濃度可以為0.01Atm%~2Atm%,亦可以為0.1Atm%~1.5Atm%。
上述含氯粒子中的K濃度可以為0.01Atm%~5Atm%,亦可以為0.1Atm%~1.0Atm%。
上述含氯粒子中的S濃度可以為0.01Atm%~2Atm%,亦可以為0.02Atm%~1.0Atm%。
作為上述含氯粒子中的元素成分,除了氯元素及碳元素以外,還可以含有1種以上、2種以上或5種以上的其他元素。
The chlorine-containing particles can contain one or more selected from the group consisting of Al element, Mg element, Si element, Fe element, Zn element, Ti element, Ca element, Na element, K element, S element, and carbonic acid compound. These can be used alone or in combination of two or more.
In this case, the Al concentration in the chlorine-containing particles may be 0.1 Atm% to 4 Atm%, or may be 0.1 Atm% to 1.0 Atm%.
The Mg concentration in the chlorine-containing particles may be 0.1 Atm% to 0.5 Atm%, or may be 0.1 Atm% to 0.4 Atm%.
The Si concentration in the chlorine-containing particles may be 0.1 Atm% to 5 Atm%, 0.1 Atm% to 2.0 Atm%, or 0.1 Atm% to 1 Atm%.
The Fe concentration in the chlorine-containing particles may be 0.1 Atm% to 4 Atm% or 0.1 Atm% to 2.0 Atm%.
The concentration of Zn in the chlorine-containing particles may be 0.1 Atm% to 5 Atm%, or may be 0.1 Atm% to 1.0 Atm%.
The Ti concentration in the chlorine-containing particles may be 0.01 Atm% to 1.0 Atm%, or may be 0.04 Atm% to 0.8 Atm%.
The Ca concentration in the chlorine-containing particles may be 0.01 Atm% to 17 Atm%, 0.02 Atm% to 6 Atm%, or 0.1 Atm% to 3 Atm%.
The Na concentration in the chlorine-containing particles may be 0.01 Atm% to 2 Atm% or 0.1 Atm% to 1.5 Atm%.
The K concentration in the chlorine-containing particles may be 0.01 Atm% to 5 Atm%, or may be 0.1 Atm% to 1.0 Atm%.
The concentration of S in the chlorine-containing particles may be 0.01 Atm% to 2 Atm% or 0.02 Atm% to 1.0 Atm%.
As the element component in the chlorine-containing particles, in addition to the element chlorine and carbon, one or more elements, two or more elements, or five or more other elements may be contained.

在本實施形態中,針對上述含氯粒子中的元素組成或其元素濃度,能夠基於能量分散型X射線光譜法(EDX)進行測量。In this embodiment, the element composition or the element concentration in the chlorine-containing particles can be measured based on energy dispersive X-ray spectroscopy (EDX).

在本實施形態中,藉由使用上述<含氯粒子的檢查方法>,能夠測量環氧樹脂組成物中的含氯粒子或環氧樹脂中的含氯粒子的個數。
上述50g的環氧樹脂組成物中的含氯粒子的個數能夠設為1個以上。藉此,當作為密封電子零件之密封材料(密封用環氧樹脂組成物)而使用環氧樹脂組成物時,能夠提高與金屬電路、金屬墊、金屬線等金屬部件的密接性。尤其能夠提高與Cu等金屬部件的密接性。又,環氧樹脂組成物中的含氯粒子的個數例如可以設為10個以下,亦可以設為5個以下,亦可以設為3個以下,亦可以設為2個以下。藉此,作為密封電子零件之密封材料而使用環氧樹脂組成物時,能夠提高可靠性。
關於上述環氧樹脂組成物所使用之各成分,例如,在50g的環氧樹脂中,含氯粒子的個數可以為1~5個以下,亦可以為1~3個以下,亦可以為1~2個以下,亦可以為1個。
In this embodiment, the number of chlorine-containing particles in the epoxy resin composition or chlorine-containing particles in the epoxy resin can be measured by using the above-mentioned <method for inspecting chlorine-containing particles>.
The number of chlorine-containing particles in the 50 g epoxy resin composition can be set to one or more. With this, when an epoxy resin composition is used as a sealing material (epoxy resin composition for sealing) for sealing electronic parts, the adhesion to metal parts such as metal circuits, metal pads, and metal wires can be improved. In particular, the adhesion to metal components such as Cu can be improved. In addition, the number of chlorine-containing particles in the epoxy resin composition may be, for example, 10 or less, 5 or less, 3 or less, or 2 or less. As a result, when an epoxy resin composition is used as a sealing material for sealing electronic parts, reliability can be improved.
Regarding each component used in the above epoxy resin composition, for example, in 50 g of epoxy resin, the number of chlorine-containing particles may be 1 to 5 or less, or 1 to 3 or less, or 1 ~ 2 or less, may be one.

在本實施形態中,例如,藉由適當地選擇熱固性樹脂組成物中所包含之各成分的種類・摻合量・製作方法(製造方法或製造後的提純方法)、熱固性樹脂組成物的製備方法等,能夠控制上述含氯粒子的量。該等中,例如可列舉:針對環氧樹脂和硬化劑等各成分,用過濾器過濾溶解於有機溶劑之溶液等液態物質;此時使用網孔尺寸小的該過濾器;又,將上述液態物質進行離心分離,去除含有異物之下部層,僅使用上部層;藉由徹底去除反應中產生之HCL來消除氯源等,可列舉針對無機填充材料減小保證篩的尺寸、從複數個批次中選擇合適者等,而作為用於將上述含氯粒子的量設為所期望的數值範圍之要素。In the present embodiment, for example, by appropriately selecting the kind, blending amount, production method (manufacturing method or purification method after production) of each component included in the thermosetting resin composition, and the production method of the thermosetting resin composition Etc. can control the amount of the chlorine-containing particles. Among these, for example, for each component such as epoxy resin and hardener, a liquid substance such as a solution dissolved in an organic solvent is filtered with a filter; in this case, the filter with a small mesh size is used; The material is centrifuged to remove the lower layer containing foreign substances, and only the upper layer is used; the chlorine source is eliminated by completely removing the HCL generated in the reaction. A suitable one is selected as an element for setting the amount of the chlorine-containing particles to a desired numerical range.

以下,對本實施形態中的環氧樹脂組成物的各成分進行詳細說明。Hereinafter, each component of the epoxy resin composition in the present embodiment will be described in detail.

[環氧樹脂]
上述環氧樹脂組成物包含環氧樹脂。
作為上述環氧樹脂,係在1分子內具有2個以上的環氧基之單體、寡聚物、聚合物全部,並沒有特別限定其分子量、分子結構。
作為上述環氧樹脂,例如可列舉聯苯型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、茋型環氧樹脂、氫醌型環氧樹脂等2官能性或結晶性環氧樹脂;甲酚酚醛清漆型環氧樹脂、苯酚酚醛清漆型環氧樹脂、萘酚酚醛清漆型環氧樹脂等酚醛清漆型環氧樹脂;含伸苯基骨架之苯酚芳烷基型環氧樹脂、含聯伸苯基骨架之苯酚芳烷基型環氧樹脂、含伸苯基骨架之萘酚芳烷基型環氧樹脂等苯酚芳烷基型環氧樹脂;三酚甲烷型環氧樹脂及烷基改質三酚甲烷型環氧樹脂等3官能型環氧樹脂;二環戊二烯改質苯酚型環氧樹脂、萜烯改質苯酚型環氧樹脂等改質苯酚型環氧樹脂;含三口井核之環氧樹脂等含雜環之環氧樹脂等。該等可以單獨使用1種,亦可以組合2種以上使用。
[Epoxy resin]
The epoxy resin composition contains epoxy resin.
As the epoxy resin, there are all monomers, oligomers, and polymers having two or more epoxy groups in one molecule, and the molecular weight and molecular structure are not particularly limited.
Examples of the epoxy resin include bifunctional epoxy resins, bisphenol A epoxy resins, bisphenol F epoxy resins, stilbene epoxy resins, and hydroquinone epoxy resins. Epoxy resin; cresol novolac epoxy resin, phenol novolac epoxy resin, naphthol novolac epoxy resin and other novolac epoxy resin; phenol aralkyl ring containing phenylene skeleton Oxygen resin, phenol aralkyl type epoxy resin containing biphenylene skeleton, naphthol aralkyl type epoxy resin containing phenylene skeleton etc. phenol aralkyl type epoxy resin; triphenol methane type epoxy resin Resin and alkyl modified 3-functional epoxy resins such as triphenol methane epoxy resin; modified phenol epoxy resin such as dicyclopentadiene modified phenol epoxy resin, terpene modified phenol epoxy resin Resin; epoxy resin containing three well cores and other heterocyclic epoxy resin. These can be used alone or in combination of two or more.

上述環氧樹脂組成物中的環氧樹脂的含量的下限值相對於環氧樹脂組成物的總固體成分,例如較佳為8質量%以上,更佳為10質量%以上,特佳為12質量%以上。藉由將環氧樹脂的含量設為上述下限值以上,能夠提高環氧樹脂組成物的流動性,並且能夠實現成形性的進一步提高。
另一方面,環氧樹脂的含量的上限值相對於環氧樹脂組成物的總固體成分,例如較佳為30質量%以下,更佳為20質量%以下。藉由將環氧樹脂的含量設為上述上限值以下,針對具備使用環氧樹脂組成物而形成之硬化物之半導體裝置及其他結構體,能夠提高耐濕可靠性或耐回焊性、耐溫度循環性。
The lower limit of the content of the epoxy resin in the epoxy resin composition relative to the total solid content of the epoxy resin composition is, for example, preferably 8% by mass or more, more preferably 10% by mass or more, and particularly preferably 12 Mass% or more. By setting the content of the epoxy resin to the above lower limit or more, the fluidity of the epoxy resin composition can be improved, and the moldability can be further improved.
On the other hand, the upper limit of the content of the epoxy resin is preferably 30% by mass or less, and more preferably 20% by mass or less with respect to the total solid content of the epoxy resin composition. By setting the content of the epoxy resin to the upper limit value or less, it is possible to improve the humidity resistance reliability, the reflow resistance, and the resistance of semiconductor devices and other structures having a cured product formed using an epoxy resin composition Temperature cycling.

在本說明書中,環氧樹脂組成物的總固體成分係指環氧樹脂組成物中的不揮發部分,並且係指去除水或溶劑等揮發成分之剩餘部分。又,在本實施形態中,當含有溶劑時,相對於環氧樹脂組成物整體的含量係指,相對於樹脂組成物中的除了溶劑以外的固體成分整體的含量。In this specification, the total solid content of the epoxy resin composition refers to the non-volatile portion in the epoxy resin composition, and refers to the remaining portion from which volatile components such as water or solvent are removed. In addition, in the present embodiment, when a solvent is contained, the content relative to the entire epoxy resin composition refers to the content relative to the entire solid component excluding the solvent in the resin composition.

[硬化劑]
上述環氧樹脂組成物能夠含有硬化劑。
上述硬化劑只要為一般用於環氧樹脂組成物者,則並無特別限制,例如可列舉酚醛樹脂系硬化劑、胺系硬化劑、酸酐系硬化劑、硫醇系硬化劑等。該等中,從耐燃性、耐濕性、電特性、硬化性、保存穩定性等的平衡的觀點考慮,較佳為酚醛樹脂系硬化劑。
[hardener]
The epoxy resin composition can contain a hardener.
The curing agent is not particularly limited as long as it is generally used in epoxy resin compositions, and examples thereof include phenol resin curing agents, amine curing agents, anhydride curing agents, and thiol curing agents. Among these, from the viewpoint of the balance of flame resistance, moisture resistance, electrical characteristics, curability, storage stability, and the like, a phenol resin-based curing agent is preferred.

<酚醛樹脂系硬化劑>
作為上述酚醛樹脂系硬化劑,只要為一般用於環氧樹脂組成物者,則並無特別限制,例如可列舉以苯酚酚醛清漆樹脂、甲酚酚醛清漆樹脂為首之將酚、甲酚、間苯二酚、鄰苯二酚、雙酚A、雙酚F、苯基酚、胺基酚、α-萘酚、β-萘酚、二羥萘等酚類與甲醛或酮類在酸性觸媒下進行縮合或共縮合而獲得之酚醛清漆樹脂、由上述之酚類與二甲氧基對二甲苯或雙(甲氧基甲基)聯苯所合成之具有伸苯基骨架之苯酚芳烷基樹脂、具有聯伸苯基骨架之苯酚芳烷基樹脂等苯酚芳烷基樹脂、具有三苯基甲烷骨架之酚醛樹脂等,該等可單獨使用亦可組合2種以上使用。
<Phenolic resin hardener>
The phenolic resin-based curing agent is not particularly limited as long as it is generally used in an epoxy resin composition, and examples thereof include phenol novolak resin and cresol novolak resin. Phenol, cresol, and m-benzene Phenol, catechol, bisphenol A, bisphenol F, phenylphenol, aminophenol, α-naphthol, β-naphthol, dihydroxynaphthalene and other phenols and formaldehyde or ketones under acid catalyst Novolak resin obtained by condensation or co-condensation, phenol aralkyl resin with phenylene skeleton synthesized from the above phenols and dimethoxy-p-xylene or bis (methoxymethyl) biphenyl , Phenol aralkyl resins such as phenol aralkyl resins with biphenylene skeletons, phenolic resins with triphenylmethane skeletons, etc. These can be used alone or in combination of two or more.

<胺系硬化劑>
作為上述胺系硬化劑,可列舉除了二伸乙三胺(DETA)、三伸乙四胺(TETA)、間苯二甲胺(MXDA)等脂肪族多胺、二胺基二苯基甲烷(DDM)、間苯二胺(MPDA)、二胺基二苯基碸(DDS)等芳香族多胺之外,還含有二氰二胺(DICY)、有機酸二醯肼等之多胺化合物等,該等可單獨使用亦可組合2種以上使用。
<Amine Hardener>
Examples of the amine-based hardener include aliphatic polyamines such as diethylenetriamine (DETA), triethylenetetramine (TETA), and m-xylylenediamine (MXDA), and diaminodiphenylmethane ( DDM), m-phenylenediamine (MPDA), diaminodiphenyl sulfone (DDS) and other aromatic polyamines, and polyamine compounds such as dicyandiamine (DICY), organic acid dihydrazine, etc. These can be used alone or in combination of two or more.

<酸酐系硬化劑>
作為上述酸酐系硬化劑,可列舉六氫酞酸酐(HHPA)、甲基四氫酞酸酐(MTHPA)、順丁烯二酸酐等脂環族酸酐、1,2,4-苯三甲酸酐(TMA)、焦蜜石酸二酐(PMDA)、二苯基酮四羧酸(BTDA)、酞酸酐等芳香族酸酐等,該等可單獨使用亦可組合2種以上使用。
<Acid anhydride hardener>
Examples of the acid anhydride-based hardener include hexahydrophthalic anhydride (HHPA), methyltetrahydrophthalic anhydride (MTHPA), maleic anhydride and other alicyclic anhydrides, and 1,2,4-benzenetricarboxylic anhydride (TMA). , Aromatic acid anhydrides such as pyromellite dianhydride (PMDA), diphenyl ketone tetracarboxylic acid (BTDA), phthalic anhydride, etc., these can be used alone or in combination of two or more.

<硫醇系硬化劑>
作為上述硫醇系硬化劑,可列舉三羥甲基丙烷三(3-巰基丁酸酯)、三羥甲基乙烷三(3-巰基丁酸酯)等,該等可單獨使用亦可組合2種以上使用。
<Thiol-based hardener>
Examples of the thiol-based hardener include trimethylolpropane tris (3-mercaptobutyrate), trimethylolethane tris (3-mercaptobutyrate), etc. These can be used alone or in combination Use more than 2 types.

<其他硬化劑>
作為其他硬化劑,可列舉異氰酸酯預聚物、封端異氰酸酯等異氰酸酯化合物、含羧酸之聚酯樹脂等有機酸類等,該等可單獨使用亦可組合2種以上使用。
又,亦可組合上述中不同系的硬化劑的2種以上使用。
<Other hardeners>
Examples of other hardeners include isocyanate compounds such as isocyanate prepolymers and blocked isocyanates, and organic acids such as carboxylic acid-containing polyester resins. These may be used alone or in combination of two or more.
In addition, two or more kinds of hardeners of different systems may be used in combination.

上述硬化劑為酚醛樹脂系硬化劑的情況下,環氧樹脂與硬化劑的當量比、亦即,環氧樹脂中的環氧基莫耳數/酚醛樹脂系硬化劑中的酚性羥基莫耳數之比並無特別限制,為了獲得成形性和可靠性優異的環氧樹脂組成物,例如較佳為0.5以上2以下的範圍,更佳為0.6以上1.8以下的範圍,最佳為0.8以上1.5以下的範圍。When the above-mentioned hardener is a phenolic resin-based hardener, the equivalent ratio of epoxy resin to hardener, that is, the number of epoxy groups in the epoxy resin / phenolic hydroxyl mole in the phenolic resin-based hardener The number ratio is not particularly limited. In order to obtain an epoxy resin composition excellent in moldability and reliability, for example, a range of 0.5 to 2 is preferable, a range of 0.6 to 1.8 is more preferable, and a range of 0.8 to 1.5 is most preferable The following range.

[無機填充材料]
上述環氧樹脂組成物能夠含有無機填充材料。
作為上述無機填充材料,例如可列舉熔融破碎二氧化矽及熔融球狀二氧化矽等熔融二氧化矽、結晶二氧化矽等二氧化矽、氧化鋁、氫氧化鋁、氮化矽及氮化鋁等。該等可單獨使用亦可組合2種以上使用。其中,較佳為熔融破碎二氧化矽、熔融球狀二氧化矽、結晶二氧化矽等二氧化矽,更佳為能夠使用熔融球狀二氧化矽。
[Inorganic filler]
The epoxy resin composition can contain an inorganic filler.
Examples of the inorganic filler include fused silica such as fused and crushed silica and fused spherical silica, silicon dioxide such as crystalline silica, alumina, aluminum hydroxide, silicon nitride, and aluminum nitride. Wait. These can be used alone or in combination of two or more. Among them, silicon dioxide such as fused and crushed silicon dioxide, molten spherical silicon dioxide, and crystalline silicon dioxide is preferred, and more preferably, molten spherical silicon dioxide can be used.

上述無機填充材料的平均粒徑(D50)的下限值例如可以為0.01μm以上,亦可以為1μm以上,亦可以為5μm以上。藉此,使環氧樹脂組成物的流動性變得良好,並能夠更有效地提高成形性。又,無機填充材料的平均粒徑(D50)的上限值例如為50μm以下,較佳為40μm以下。藉此,能夠可靠地抑制產生未填充等。又,本實施形態的無機填充材料能夠至少包含平均粒徑(D50)為1μm以上50μm以下的無機填充材料。藉此,能夠使流動性變得更優異。The lower limit value of the average particle diameter (D50) of the inorganic filler may be, for example, 0.01 μm or more, 1 μm or more, or 5 μm or more. As a result, the fluidity of the epoxy resin composition is improved, and the moldability can be improved more effectively. In addition, the upper limit of the average particle diameter (D50) of the inorganic filler is, for example, 50 μm or less, preferably 40 μm or less. With this, unfilling and the like can be reliably suppressed. In addition, the inorganic filler of the present embodiment can include at least an inorganic filler having an average particle diameter (D50) of 1 μm or more and 50 μm or less. With this, the fluidity can be made more excellent.

上述無機填充材料的平均粒徑(D50)使用市售的雷射繞射式粒度分佈測量裝置(例如,SHIMADZU CORPORATION製,SALD-7000)以體積基準測量粒子的粒度分佈,並能夠將中位數直徑(D50)設為平均粒徑。The average particle size (D50) of the above inorganic filler is measured on a volume basis using a commercially available laser diffraction particle size distribution measuring device (for example, manufactured by SHIMADZU CORPORATION, SALD-7000), and the median The diameter (D50) is set as the average particle diameter.

又,上述無機填充材料例如亦可以併用2種以上的不同平均粒徑(D50)的填充材料。藉此,能夠更有效地提高相對於環氧樹脂組成物的總固體成分的無機填充材料的填充性。又,在本實施形態中,從提高環氧樹脂組成物的填充性的觀點考慮,作為一例可以使用:包含平均粒徑0.01μm以上1μm以下的填充材料及平均粒徑大於1μm且50μm以下的填充材料。
又,作為本實施形態的無機填充材料的一例,從進一步提高環氧樹脂組成物的填充性之觀點考慮,例如能夠包含平均粒徑0.01μm以上1μm以下的第一填充材料、平均粒徑大於1μm且15μm以下的第二填充材料及平均粒徑大於15μm且50μm以下的第三填充材料。
In addition, for the inorganic filler, for example, two or more fillers having different average particle diameters (D50) may be used in combination. Thereby, the filling property of the inorganic filler with respect to the total solid content of the epoxy resin composition can be improved more effectively. In addition, in the present embodiment, from the viewpoint of improving the filling property of the epoxy resin composition, it can be used as an example: a filler including an average particle diameter of 0.01 μm or more and 1 μm or less and a filler having an average particle size of more than 1 μm and 50 μm or less. material.
In addition, as an example of the inorganic filler of the present embodiment, from the viewpoint of further improving the filling property of the epoxy resin composition, for example, the first filler having an average particle diameter of 0.01 μm or more and 1 μm or less and an average particle size of more than 1 μm In addition, the second filler material having an average particle size of 15 μm or less and the third filler material having an average particle size of more than 15 μm and 50 μm or less.

相對於環氧樹脂組成物的總固體成分,上述無機填充材料的含量的下限值例如較佳為70質量%以上,更佳為73質量%以上,特佳為75質量%以上。藉此,能夠提高低吸濕性及低熱膨脹性,並能夠更有效地提高半導體裝置及其他結構體的耐溫度循環性或耐回焊性。另一方面,相對於環氧樹脂組成物的總固體成分,上述無機填充材料的含量的上限值例如較佳為95質量%以下,更佳為93質量%以下,特佳為90質量%以下。藉此,能夠更有效地提高環氧樹脂組成物成形時的流動性或填充性。The lower limit of the content of the inorganic filler relative to the total solid content of the epoxy resin composition is preferably 70% by mass or more, more preferably 73% by mass or more, and particularly preferably 75% by mass or more. As a result, low moisture absorption and low thermal expansion can be improved, and temperature cycle resistance or reflow resistance of semiconductor devices and other structures can be more effectively improved. On the other hand, the upper limit of the content of the inorganic filler relative to the total solid content of the epoxy resin composition is, for example, preferably 95% by mass or less, more preferably 93% by mass or less, and particularly preferably 90% by mass or less . With this, the fluidity or filling property at the time of molding the epoxy resin composition can be more effectively improved.

[硬化促進劑]
上述環氧樹脂組成物根據需要能夠進一步包含硬化促進劑。
上述硬化促進劑只要為促進上述環氧樹脂與上述硬化劑的交聯反應者,則能夠使用一般的環氧樹脂組成物所使用者。
[Hardening accelerator]
The said epoxy resin composition can further contain a hardening accelerator as needed.
The curing accelerator can be used by a general epoxy resin composition as long as it promotes the cross-linking reaction between the epoxy resin and the curing agent.

作為上述硬化促進劑,例如可列舉1,8-二吖雙環(5,4,0)十一烯-7等二吖雙環烯烴及其衍生物;三苯基膦、甲基二苯基膦等有機膦類;2-甲基咪唑等咪唑化合物(咪唑系硬化促進劑);四苯基鏻・四苯基硼酸鹽等四取代鏻・四取代硼酸鹽等。該等可單獨使用亦可組合2種以上使用。Examples of the above-mentioned hardening accelerator include diacrylic bicycloalkenes such as 1,8-diazepine (5,4,0) undecene-7 and their derivatives; triphenylphosphine, methyldiphenylphosphine, etc. Organic phosphines; imidazole compounds such as 2-methylimidazole (imidazole-based hardening accelerators); tetra-substituted phosphonium ・ tetraphenyl borate and other tetra-substituted phosphonium ・ tetra-substituted borate and so on. These can be used alone or in combination of two or more.

作為上述咪唑系硬化促進劑,例如可列舉咪唑、2-甲基咪唑、2-十一烷基咪唑、2-十七烷基咪唑、1,2-二甲基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-苯基咪唑、1-苄基-2-甲基咪唑、1-氰乙基-2-甲基咪唑、1-氰乙基-2-乙基-4-甲基咪唑、1-氰乙基-2-十一烷基咪唑、1-氰乙基-2-苯基咪唑、1-氰乙基-2-十一烷基咪唑鎓偏苯三酸鹽、1-氰乙基-2-苯基咪唑鎓偏苯三酸鹽、2,4-二胺基-6-[2’-甲基咪唑基(1’)]-乙基-s-三口井、2,4-二胺基-6-[2’-十一烷基咪唑基(1’)]-乙基-s-三口井、2,4-二胺基-6-[2’-乙基-4-甲基咪唑基(1’)]-乙基-s-三口井、2,4-二胺基-6-[2’-甲基咪唑基(1’)]-乙基-s-三口井的異三聚氰酸加成物、2-苯基咪唑的異三聚氰酸加成物、2-甲基咪唑的異三聚氰酸加成物、2-苯基-4,5-二羥基二甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑等。該等可單獨使用亦可組合2種以上使用。Examples of the imidazole-based hardening accelerator include imidazole, 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, and 2-ethyl-4. -Methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-phenylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl- 2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 1 -Cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6- [2 ' -Methylimidazolyl (1 ')]-ethyl-s-three wells, 2,4-diamino-6- [2'-undecylimidazolyl (1')]-ethyl-s- Three wells, 2,4-diamino-6- [2'-ethyl-4-methylimidazolyl (1 ')]-ethyl-s-three wells, 2,4-diamino-6- [2'-Methylimidazolyl (1 ')]-ethyl-s-iso-cyanuric acid adduct of Mitsui, 2-phenylimidazole-isocyanic acid adduct, 2-methyl Isocyanuric acid adducts of imidazole, 2-phenyl-4,5-dihydroxydimethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, etc. These can be used alone or in combination of two or more.

上述硬化促進劑的含量的下限值例如相對於環氧樹脂組成物的總固體成分,較佳為0.20質量%以上,更佳為0.40質量%以上,特佳為0.70質量%以上。藉由將硬化促進劑的含量設為上述下限值以上,能夠有效地提高成形時的硬化性。另一方面,上述硬化促進劑的含量的上限值例如相對於環氧樹脂組成物的總固體成分,較佳為3.0質量%以下,更佳為2.0質量%以下。藉由將硬化促進劑的含量設為上述上限值以下,能夠實現成形時的流動性的提高。The lower limit of the content of the hardening accelerator is, for example, preferably 0.20% by mass or more, more preferably 0.40% by mass or more, and particularly preferably 0.70% by mass or more with respect to the total solid content of the epoxy resin composition. By setting the content of the hardening accelerator to the above lower limit or more, the hardenability during molding can be effectively improved. On the other hand, the upper limit of the content of the hardening accelerator is, for example, preferably 3.0% by mass or less, and more preferably 2.0% by mass or less with respect to the total solid content of the epoxy resin composition. By setting the content of the hardening accelerator to the upper limit value or less, it is possible to improve the fluidity during molding.

[偶合劑]
上述環氧樹脂組成物根據需要能夠包含偶合劑。
作為上述偶合劑,例如能夠使用環氧矽烷、巰基矽烷、胺基矽烷、烷基矽烷、脲矽烷、乙烯基矽烷、甲基丙烯酸矽烷等各種矽烷系化合物、鈦系化合物、鋁螯合類、鋁/鋯系化合物等公知的偶合劑。若例示該等,可列舉乙烯基三氯矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(β-甲氧基乙氧基)矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三乙氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、γ-甲基丙烯醯氧基丙基三乙氧基矽烷、乙烯基三乙醯氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-胺基丙基三乙氧基矽烷、γ-苯胺基丙基三甲氧基矽烷、γ-苯胺基丙基甲基二甲氧基矽烷、γ-[雙(β-羥乙基)]胺基丙基三乙氧基矽烷、N-β-(胺基乙基)-γ-胺基丙基三甲氧基矽烷、N-β-(胺基乙基)-γ-胺基丙基三乙氧基矽烷、N-β-(胺基乙基)-γ-胺基丙基甲基二甲氧基矽烷、苯基胺基丙基三甲氧基矽烷、γ-(β-胺基乙基)胺基丙基二甲氧基甲基矽烷、N-(三甲氧基矽基丙基)乙二胺、N-(二甲氧基甲基矽基異丙基)乙二胺、甲基三甲氧基矽烷、二甲基二甲氧基矽烷、甲基三乙氧基矽烷、N-β-(N-乙烯基苄基胺基乙基)-γ-胺基丙基三甲氧基矽烷、γ-氯丙基三甲氧基矽烷、六甲基二矽烷、乙烯基三甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、3-三乙氧基矽基-N-(1,3-二甲基-亞丁基)丙胺的水解物等矽烷系偶合劑、三異硬脂醯基鈦酸異丙酯、三(二辛基焦磷酸酯)鈦酸異丙酯、三(N-胺基乙基-胺基乙基)鈦酸異丙酯、四辛基雙(二(十三烷基)亞磷酸酯)鈦酸酯、四(2,2-二烯丙氧基甲基-1-丁基)雙(二(十三烷基))亞磷酸酯鈦酸酯、雙(二辛基焦磷酸酯)氧基乙酸酯鈦酸酯、雙(二辛基焦磷酸酯)伸乙基鈦酸鹽、三辛醯基鈦酸異丙酯、二甲基丙烯基異硬脂醯基鈦酸異丙酯、三(十二烷基)苯磺醯基鈦酸異丙酯、異硬脂醯基二丙烯基鈦酸異丙酯、三(二辛基磷酸酯)鈦酸異丙酯、三異丙苯基苯基鈦酸異丙酯、四異丙基雙(二辛基亞磷酸酯)鈦酸酯等鈦酸酯系偶合劑。該等可單獨使用1種、亦可組合使用2種以上。該等中,更佳為環氧矽烷、巰基矽烷、胺基矽烷、烷基矽烷、脲矽烷或乙烯基矽烷的矽烷系化合物。又,從更有效地提高填充性或成形性的觀點考慮,特佳為使用以苯基胺基丙基三甲氧基矽烷為代表之2級胺基矽烷。
[Coupling agent]
The above epoxy resin composition may contain a coupling agent as needed.
As the coupling agent, for example, various silane-based compounds such as epoxy silane, mercapto silane, amino silane, alkyl silane, urea silane, vinyl silane, methacrylic silane, titanium compound, aluminum chelate, aluminum / Zirconium compounds and other well-known coupling agents. Examples of these include vinyl trichlorosilane, vinyl trimethoxy silane, vinyl triethoxy silane, vinyl tri (β-methoxy ethoxy) silane, and γ-methacryl amide Propylpropyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyl Triethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyl Triethoxysilane, vinyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-anilinopropyltrimethoxysilane, γ -Anilinopropylmethyldimethoxysilane, γ- [bis (β-hydroxyethyl)] aminopropyltriethoxysilane, N-β- (aminoethyl) -γ-amino Propyltrimethoxysilane, N-β- (aminoethyl) -γ-aminopropyltriethoxysilane, N-β- (aminoethyl) -γ-aminopropylmethyldi Methoxysilane, phenylaminopropyltrimethoxysilane, γ- (β-amine Ethyl) aminopropyldimethoxymethylsilane, N- (trimethoxysilylpropyl) ethylenediamine, N- (dimethoxymethylsilylisopropyl) ethylenediamine, methyl Trimethoxysilane, dimethyldimethoxysilane, methyltriethoxysilane, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane , Γ-chloropropyltrimethoxysilane, hexamethyldisilazane, vinyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, 3-isocyanatepropyltriethoxysilane, 3- Silane-based coupling agent such as hydrolyzate of propylene oxypropyltrimethoxysilane, 3-triethoxysilyl-N- (1,3-dimethyl-butylene) propylamine, triisostearyl acetyl group Isopropyl titanate, tris (dioctyl pyrophosphate) isopropyl titanate, tris (N-aminoethyl-aminoethyl) isopropyl titanate, tetraoctyl bis (bis (thirteen Alkyl) phosphite) titanate, tetra (2,2-diallyloxymethyl-1-butyl) bis (di (tridecyl)) phosphite titanate, bis (di Octyl pyrophosphate) oxyacetate titanate, bis (dioctyl pyrophosphate) Ethyl titanate, isopropyl trioctyl titanate, dimethyl propenyl isostearyl isopropyl titanate, tris (dodecyl) benzenesulfonyl isopropyl titanate, isostearyl Acetyl dipropenyl isopropyl titanate, tris (dioctyl phosphate) isopropyl titanate, tricumylphenyl isopropyl titanate, tetraisopropyl bis (dioctyl phosphite ) Titanate coupling agent such as titanate. These can be used alone or in combination of two or more. Among these, silane-based compounds of epoxy silane, mercapto silane, amino silane, alkyl silane, urea silane or vinyl silane are more preferable. In addition, from the viewpoint of more effectively improving the filling property or formability, it is particularly preferable to use a second-stage aminosilane represented by phenylaminopropyltrimethoxysilane.

上述偶合劑的含量的下限值相對於環氧樹脂組成物的總固體成分,較佳為0.1質量%以上,更佳為0.15質量%以上。藉由將偶合劑的含量設為上述下限值以上,能夠使環氧樹脂組成物的流動性變得良好。另一方面,上述偶合劑的含量的上限值相對於環氧樹脂組成物的總固體成分,較佳為1質量%以下,更佳為0.5質量%以下。藉由將偶合劑的含量設為上述上限值以下,能夠實現環氧樹脂組成物的硬化物中的機械強度的提高。The lower limit of the content of the coupling agent relative to the total solid content of the epoxy resin composition is preferably 0.1% by mass or more, and more preferably 0.15% by mass or more. By setting the content of the coupling agent to the above lower limit or more, the fluidity of the epoxy resin composition can be improved. On the other hand, the upper limit of the content of the coupling agent relative to the total solid content of the epoxy resin composition is preferably 1% by mass or less, and more preferably 0.5% by mass or less. By setting the content of the coupling agent to the upper limit value or less, the mechanical strength of the cured product of the epoxy resin composition can be improved.

又,上述環氧樹脂組成物根據需要能夠含有低應力劑。
上述低應力劑例如能夠包含選自聚矽氧油、聚矽氧橡膠、聚異戊二烯、1,2-聚丁二烯、1,4-聚丁二烯等聚丁二烯、苯乙烯-丁二烯橡膠、丙烯腈-丁二烯橡膠、聚氯丁二烯、聚(氧丙烯)、聚(氧四亞甲基)二醇、聚烯二醇、聚-ε-己內酯等熱塑性彈性體、聚硫橡膠及氟橡膠中之1種或2種以上。該等中,從將彈性模數控制在所期望的範圍內,並提高所獲得之半導體封裝體及其他結構體的耐溫度循環性、耐回焊性的觀點考慮,能夠選擇包含聚矽氧橡膠、聚矽氧油及丙烯腈-丁二烯橡膠中的至少1種之情況作為特佳的態樣。
Moreover, the said epoxy resin composition can contain a low-stress agent as needed.
The low-stress agent can include, for example, polybutadiene and styrene selected from silicone oil, silicone rubber, polyisoprene, 1,2-polybutadiene, 1,4-polybutadiene, etc. -Butadiene rubber, acrylonitrile-butadiene rubber, polychloroprene, poly (oxypropylene), poly (oxytetramethylene) glycol, polyene glycol, poly-ε-caprolactone, etc. One or more of thermoplastic elastomer, polysulfide rubber and fluororubber. Among these, from the viewpoint of controlling the elastic modulus within a desired range, and improving the temperature cycle resistance and reflow resistance of the obtained semiconductor package and other structures, it is possible to choose to include silicone rubber , At least one of polysiloxane oil and acrylonitrile-butadiene rubber is an excellent aspect.

當使用上述低應力劑時,低應力劑整體的含量相對於環氧樹脂組成物的總固體成分,較佳為0.05質量%以上,更佳為0.10質量%以上。另一方面,低應力劑的含量相對於環氧樹脂組成物的總固體成分,較佳為2質量%以下,更佳為1質量%以下。藉由將低應力劑的含量控制在該種範圍內,能夠更可靠地提高所獲得之半導體封裝體及其他結構體的耐溫度循環性、耐回焊性。When the aforementioned low-stress agent is used, the content of the entire low-stress agent relative to the total solid content of the epoxy resin composition is preferably 0.05% by mass or more, and more preferably 0.10% by mass or more. On the other hand, the content of the low-stress agent relative to the total solid content of the epoxy resin composition is preferably 2% by mass or less, and more preferably 1% by mass or less. By controlling the content of the low-stress agent within this range, the temperature cycle resistance and reflow resistance of the obtained semiconductor package and other structures can be more reliably improved.

[其他成分]
本實施形態的環氧樹脂組成物根據需要還能夠含有其他成分。作為其他成分,例如可列舉水滑石、鋁-鎂系無機離子交換體等離子捕捉劑;碳黑、鐵丹(colcothar)等著色劑;棕櫚蠟等天然蠟、褐煤酸酯蠟(montanic acid ester wax)、二乙醇胺-二褐煤酸酯、甲苯二異氰酸酯改質氧化蠟等合成蠟、硬脂酸鋅等高級脂肪酸及其金屬鹽類或石蠟等脫模劑;抗氧化劑等各種添加劑。該等添加劑可以適當地摻合。
[Other ingredients]
The epoxy resin composition of this embodiment may contain other components as needed. Examples of other components include ion scavengers such as hydrotalcite and aluminum-magnesium-based inorganic ion exchangers; colorants such as carbon black and colcothar; natural waxes such as palm wax and montanic acid ester wax , Diethanolamine-dimontanate, toluene diisocyanate modified oxidized wax and other synthetic waxes, zinc stearate and other higher fatty acids and their metal salts or paraffin wax and other release agents; antioxidants and other additives. These additives can be blended appropriately.

[環氧樹脂組成物的製造方法]
對本實施形態的環氧樹脂組成物的製造方法進行說明。
作為上述環氧樹脂組成物的製造方法能夠包括批次選別步驟、混合步驟。首先,準備批次不同的複數個環氧樹脂a,並使用上述含氯粒子的檢查方法,測量已準備之環氧樹脂a的含氯粒子的個數。依據所獲得之測量結果,從複數個批次中選擇含有含氯粒子之環氧樹脂a,並用作環氧樹脂組成物的原料成分(環氧樹脂A)(批次選別步驟)。與該環氧樹脂A一同混合其他原料成分(混合步驟),能夠獲得環氧樹脂組成物。
又,針對其他成分(例如,硬化劑b或無機填充材料c),亦以與環氧樹脂a相同的方式進行批次選別,可以將含有含氯粒子之硬化劑b或無機填充材料c用作原料成分(硬化劑B或無機填充材料C)。又,能夠適當地追加控制上述含氯粒子的量的方法。
[Manufacturing method of epoxy resin composition]
The method for producing the epoxy resin composition of this embodiment will be described.
The method for manufacturing the epoxy resin composition can include a batch selection step and a mixing step. First, prepare a plurality of epoxy resins a from different batches, and measure the number of chlorine-containing particles of the prepared epoxy resin a using the above-mentioned inspection method of the chlorine-containing particles. Based on the obtained measurement results, the epoxy resin a containing chlorine-containing particles is selected from a plurality of batches and used as the raw material component of the epoxy resin composition (epoxy resin A) (batch selection step). The other raw material components are mixed with the epoxy resin A (mixing step) to obtain an epoxy resin composition.
In addition, for other components (for example, hardener b or inorganic filler c), batch selection is also performed in the same manner as epoxy resin a, and the hardener b containing chlorine-containing particles or inorganic filler c can be used as Raw material components (hardener B or inorganic filler C). In addition, a method of controlling the amount of the chlorine-containing particles can be appropriately added.

又,在上述混合步驟中,能夠藉由公知的手段進行混合來獲得混合物。進而,藉由對混合物進行熔融混練來獲得混練物。作為混練方法,例如能夠使用單軸型混練擠出機、雙軸型混練擠出機等擠出混練機或混合輥等輥式混練機,較佳為使用雙軸型混練擠出機。冷卻之後,能夠將混練物製成粉粒狀、顆粒狀、錠狀或片狀。In addition, in the above mixing step, the mixture can be obtained by mixing by a known method. Furthermore, the kneaded material is obtained by melt-kneading the mixture. As the kneading method, for example, an extrusion kneading machine such as a uniaxial kneading extruder or a biaxial kneading extruder or a roller kneading machine such as a mixing roller can be used, and a biaxial kneading extruder is preferably used. After cooling, the kneaded material can be made into powder, granule, ingot or tablet.

作為獲得粉粒狀的樹脂組成物之方法,例如可列舉藉由粉碎裝置粉碎混練物之方法。亦可以粉碎將混練物成形為片者。作為粉碎裝置,例如能夠使用鎚磨機、石臼式磨碎機、輥碎機等。As a method of obtaining the powdery granular resin composition, for example, a method of pulverizing the kneaded material with a pulverizing device can be mentioned. It can also be crushed to shape the kneaded material into pieces. As the pulverizing device, for example, a hammer mill, a stone grinder, a roller crusher, or the like can be used.

作為獲得顆粒狀或粉末狀的樹脂組成物之方法,還能夠使用例如以熱切法作為代表之造粒法等,該熱切法係在混練裝置的出口設置具有小徑的模具,將自模具排出之熔融狀態的混練物用切刀等切割成規定的長度。該情況下,較佳為藉由熱切法等造粒法得到顆粒狀或粉末狀的樹脂組成物之後,在樹脂組成物的溫度並沒有降低太多時進行脫氣。As a method for obtaining a granular or powdery resin composition, for example, a granulation method such as a hot cutting method can be used. This hot cutting method is to install a mold with a small diameter at the outlet of the kneading device and discharge it from the mold. The kneaded material in the molten state is cut to a predetermined length with a cutter or the like. In this case, it is preferable to perform degassing after obtaining a granular or powdery resin composition by a granulation method such as hot-cutting, and when the temperature of the resin composition has not decreased too much.

本實施形態的環氧樹脂組成物能夠用於各種用途。例如,本實施形態的環氧樹脂組成物能夠用於密封用樹脂組成物或固定用樹脂組成物。作為本實施形態之密封用樹脂組成物(用於密封電子零件之密封用樹脂組成物),能夠密封半導體晶片等電子零件,並且能夠適用於用於上述半導體封裝體之半導體密封用樹脂組成物、密封裝載了電子零件等之基板之車載用電子控制單元密封用樹脂組成物或感測器用、感測器模組用、相機用、相機模組用、附顯示體之模組、附乾電池・鈕釦電池之模組密封用樹脂組成物等。又,作為本實施形態之固定用樹脂組成物,還能夠用於固定馬達零件,例如能夠適用於轉子鐵芯磁鐵固定用、定子固定用樹脂組成物等。The epoxy resin composition of this embodiment can be used for various applications. For example, the epoxy resin composition of this embodiment can be used for a sealing resin composition or a fixing resin composition. As the resin composition for sealing (resin composition for sealing electronic components) of this embodiment, it is possible to seal electronic components such as semiconductor wafers, and it can be applied to the resin composition for semiconductor sealing used in the above semiconductor package, Resin composition for sealing of vehicle-mounted electronic control unit mounted with substrates of electronic parts, etc. or for sensor, sensor module, camera, camera module, display module, dry battery button Resin composition for battery module sealing etc. The resin composition for fixing of the present embodiment can also be used for fixing motor parts. For example, it can be applied to a resin composition for fixing a rotor core magnet and a resin for fixing a stator.

本實施形態的結構體(例如,電子裝置)係具備上述環氧樹脂組成物的硬化物者。作為上述結構體,例如可列舉半導體封裝體、密封裝載電子零件等之基板之電子控制單元、感測器、感測器模組、相機、相機模組、附顯示器之模組、附乾電池・鈕釦電池之模組、馬達等。The structure (for example, an electronic device) of the present embodiment is provided with a cured product of the epoxy resin composition. Examples of the above-described structure include a semiconductor package, an electronic control unit that encapsulates a substrate on which electronic parts are mounted, a sensor, a sensor module, a camera, a camera module, a module with a display, and a dry battery with a button Battery modules, motors, etc.

圖1係針對使用本實施形態的環氧樹脂組成物之半導體裝置的一例而示出剖面結構之圖。晶片墊(die pad)3上經由黏晶(die bond)材硬化體2固定有半導體元件1。半導體元件1的電極墊與引線框5之間由焊接線4連接。半導體元件1由本實施形態的環氧樹脂組成物的硬化體6密封。FIG. 1 is a diagram showing a cross-sectional structure of an example of a semiconductor device using the epoxy resin composition of this embodiment. A semiconductor element 1 is fixed on a die pad 3 via a hardened body 2 of a die bond material. The electrode pad of the semiconductor element 1 and the lead frame 5 are connected by a bonding wire 4. The semiconductor element 1 is sealed by the cured body 6 of the epoxy resin composition of this embodiment.

圖2係針對使用本實施形態的環氧樹脂組成物之單面密封型半導體裝置的一例而示出剖面結構之圖。在基板8的表面形成有阻焊劑7的層之積層體的阻焊劑7上經由黏晶材硬化體2固定有半導體元件1。為了導通半導體元件1與基板8,藉由顯影法去除電極墊上的阻焊劑7以便露出基板8的電極墊。半導體元件1的電極墊與基板8的電極墊之間由焊接線4連接。藉由本實施形態的環氧樹脂組成物的硬化體6,僅密封基板8的裝載半導體元件1之一面側。基板8上的電極墊與基板8上的非密封面側的焊球9在內部接合。2 is a diagram showing a cross-sectional structure of an example of a single-sided sealed semiconductor device using the epoxy resin composition of the present embodiment. The semiconductor element 1 is fixed on the solder resist 7 of the layered body in which the layer of the solder resist 7 is formed on the surface of the substrate 8 via the cured material 2 of the die-bonding material. In order to conduct the semiconductor element 1 and the substrate 8, the solder resist 7 on the electrode pad is removed by a development method to expose the electrode pad of the substrate 8. The electrode pad of the semiconductor element 1 and the electrode pad of the substrate 8 are connected by a bonding wire 4. With the cured body 6 of the epoxy resin composition of this embodiment, only the side of the substrate 8 on which the semiconductor element 1 is mounted is sealed. The electrode pad on the substrate 8 and the solder ball 9 on the non-sealing surface side of the substrate 8 are internally joined.

本實施形態的環氧樹脂組成物能夠用作用於密封車載用電子控制單元之密封用樹脂組成物。
圖3係表示本實施形態的結構體(車載用電子控制單元10)的一例之剖面示意圖。
車載用電子控制單元10用於控制發動機或各種車載設備等。如圖3所示,車載用電子控制單元10例如具備基板12、裝載於基板12上之電子零件16、密封基板12及電子零件16之密封樹脂層14。基板12至少在一邊具有用於與外部連接之連接端子18。本實施形態的一例之車載用電子控制單元10藉由嵌合連接端子18和對接連接器,經由連接端子18與上述對接連接器電性連接。
The epoxy resin composition of this embodiment can be used as a sealing resin composition for sealing a vehicle-mounted electronic control unit.
FIG. 3 is a schematic cross-sectional view showing an example of the structural body (vehicle electronic control unit 10) of this embodiment.
The vehicle-mounted electronic control unit 10 is used to control the engine, various vehicle-mounted devices, and the like. As shown in FIG. 3, the in-vehicle electronic control unit 10 includes, for example, a substrate 12, an electronic component 16 mounted on the substrate 12, and a sealing resin layer 14 that seals the substrate 12 and the electronic component 16. The substrate 12 has connection terminals 18 for connecting to the outside at least on one side. The on-vehicle electronic control unit 10 of an example of the present embodiment is electrically connected to the docking connector via the connection terminal 18 by fitting the connection terminal 18 and the docking connector.

基板12係例如在一面及與該一面相反的另一面中的一者或兩者上設置有電路配線之配線基板。如圖3所示,基板12例如具有平板狀的形狀。在本實施形態中,能夠將由例如聚醯亞胺等有機材料形成之有機基板用作基板12。又,基板12的厚度並無特別限定,例如可以設為0.1mm以上5mm以下,較佳為可以設為0.5mm以上3mm以下。The substrate 12 is, for example, a wiring substrate provided with circuit wiring on one or both of one side and the other side opposite to the one side. As shown in FIG. 3, the substrate 12 has a flat plate shape, for example. In this embodiment, an organic substrate formed of an organic material such as polyimide can be used as the substrate 12. In addition, the thickness of the substrate 12 is not particularly limited. For example, it may be 0.1 mm or more and 5 mm or less, and preferably 0.5 mm or more and 3 mm or less.

在本實施形態中,基板12上可以設置有例如貫穿基板12而連接一面和另一面之貫穿孔120。該情況下,基板12中的設置於一面之配線和設置於另一面之配線經由設置於貫穿孔120內之導電圖案電性連接。導電圖案沿貫穿孔120的壁面上而形成。亦即,貫穿孔120內的導電圖案形成為筒形狀。在密封步驟後的貫穿孔120內,由導電圖案的內壁面構成之空隙孔中填充有本實施形態的環氧樹脂組成物的硬化物(密封樹脂層14)。In this embodiment, the substrate 12 may be provided with, for example, a through-hole 120 penetrating the substrate 12 to connect one side and the other side. In this case, the wiring provided on one side of the substrate 12 and the wiring provided on the other side are electrically connected via the conductive pattern provided in the through hole 120. The conductive pattern is formed along the wall surface of the through hole 120. That is, the conductive pattern in the through hole 120 is formed into a cylindrical shape. In the through-hole 120 after the sealing step, the void hole constituted by the inner wall surface of the conductive pattern is filled with the cured product (sealing resin layer 14) of the epoxy resin composition of this embodiment.

基板12的一面及另一面中的一者或兩者上例如裝載有電子零件16。作為電子零件16,只要為能夠裝載於車載用電子控制單元者,則並無特別限定,例如可列舉微電腦。For example, electronic components 16 are mounted on one or both of one side and the other side of the substrate 12. The electronic component 16 is not particularly limited as long as it can be mounted on an in-vehicle electronic control unit. For example, a microcomputer can be mentioned.

在本實施形態之車載用電子控制單元10中,基板12例如可以裝載於金屬底座上。金屬底座例如能夠作為用於散發從電子零件16產生之熱的散熱裝置發揮功能。在本實施形態中,例如藉由將金屬底座和裝載於金屬底座上之基板12藉由環氧樹脂組成物一體密封成形而能夠形成車載用電子控制單元10。作為構成金屬底座之金屬材料,並無特別限定,例如能夠包含鐵、銅及鋁以及包含該等的1種或2種以上的合金等。另外,車載用電子控制單元10亦可以不具有金屬底座。In the vehicle-mounted electronic control unit 10 of this embodiment, the substrate 12 can be mounted on a metal chassis, for example. The metal base can function as a heat sink for dissipating heat generated from the electronic component 16, for example. In this embodiment, for example, the vehicle-mounted electronic control unit 10 can be formed by integrally sealing and molding the metal base and the substrate 12 mounted on the metal base with an epoxy resin composition. The metal material constituting the metal base is not particularly limited, and for example, it may include iron, copper, and aluminum, and one or more alloys including these. In addition, the vehicle-mounted electronic control unit 10 may not have a metal base.

以上,依據實施形態說明了本發明,但本發明並不限定於上述實施形態,在不改變本發明的主旨的範圍內還能夠改變其構成。
〔實施例〕
The present invention has been described above based on the embodiments. However, the present invention is not limited to the above embodiments, and its configuration can be changed without changing the gist of the present invention.
[Example]

以下,利用實施例詳細說明本發明,但本發明並不限定於該等實施例的記載。Hereinafter, the present invention will be described in detail using examples, but the present invention is not limited to the description of these examples.

關於各實施例、各比較例中使用之原料成分,如下所示。The raw material components used in each example and each comparative example are as follows.

(著色劑)
著色劑1:碳黑(碳#5,Mitsubishi Chemical Corporation製)
(Colorant)
Colorant 1: Carbon black (Carbon # 5, manufactured by Mitsubishi Chemical Corporation)

(硬化促進劑)
硬化促進劑1:由下述式表示之硬化促進劑1

[硬化促進劑1的合成方法]
在放入了甲醇1800g之燒瓶中,加入苯基三甲氧基矽烷249.5g、2,3-二羥萘384.0g並使其溶解,接著在室溫攪拌下滴加了28%甲氧鈉-甲醇溶液231.5g。若進一步在室溫攪拌下向其中滴加預先準備之將四苯基溴化鏻503.0g溶解於甲醇600g中而成之溶液,則析出了結晶。對析出之結晶進行過濾、水洗、真空乾燥,獲得了桃白色結晶的上述硬化促進劑1。
(Hardening accelerator)
Hardening accelerator 1: Hardening accelerator 1 represented by the following formula

[Synthesis method of hardening accelerator 1]
In a flask containing 1800 g of methanol, 249.5 g of phenyltrimethoxysilane and 384.0 g of 2,3-dihydroxynaphthalene were added and dissolved, and then 28% sodium methoxide-methanol was added dropwise with stirring at room temperature Solution 231.5g. If a solution prepared by dissolving 503.0 g of tetraphenylphosphonium bromide in 600 g of methanol was added dropwise under stirring at room temperature, crystals were precipitated. The precipitated crystals were filtered, washed with water, and vacuum-dried to obtain the hardening accelerator 1 of peach white crystals.

硬化促進劑2:由下述式表示之硬化促進劑2Hardening accelerator 2: Hardening accelerator 2 represented by the following formula

[硬化促進劑2的合成方法]
在附有冷卻管及攪拌裝置之可分離式燒瓶中裝入2,3-二羥萘12.81g(0.080mol)、四苯基溴化鏻16.77g(0.040mol)及甲醇100ml並進行攪拌使其均勻地溶解。若將預先將氫氧化鈉1.60g(0.04ml)溶解於10ml甲醇而得之氫氧化鈉溶液緩慢地滴加到燒瓶內,則析出結晶。對析出之結晶進行過濾、水洗、真空乾燥,獲得了由上述式表示之硬化促進劑2。
[Synthesis method of hardening accelerator 2]
A separable flask with a cooling tube and a stirring device was charged with 12.81g (0.080mol) of 2,3-dihydroxynaphthalene, 16.77g (0.040mol) of tetraphenylphosphonium bromide and 100ml of methanol and stirred to make Dissolves evenly. If a sodium hydroxide solution obtained by dissolving 1.60 g (0.04 ml) of sodium hydroxide in 10 ml of methanol in advance is slowly added dropwise to the flask, crystals are precipitated. The precipitated crystals were filtered, washed with water, and vacuum-dried to obtain a hardening accelerator 2 represented by the above formula.

(偶合劑)
偶合劑1:N-苯基-3-胺基丙基三甲氧基矽烷(CF-4083,Dow Corning Toray Co.,Ltd.製)
偶合劑2:3-巰基丙基三甲氧基矽烷(S810,CHISSO CORPORATION製)
(Coupling agent)
Coupling agent 1: N-phenyl-3-aminopropyltrimethoxysilane (CF-4083, manufactured by Dow Corning Toray Co., Ltd.)
Coupling agent 2: 3-mercaptopropyltrimethoxysilane (S810, manufactured by CHISSO CORPORATION)

(環氧樹脂A)
環氧樹脂a1:含聯伸苯基骨架之苯酚芳烷基型環氧樹脂(NC3000L,Nippon Kayaku Co.,Ltd.製)
環氧樹脂a2:雙酚A型環氧樹脂(YL6810,Mitsubishi Chemical Corporation製)
環氧樹脂a3:聯苯型環氧樹脂(YX4000K,Mitsubishi Chemical Corporation製)
環氧樹脂4:未使用表氯醇合成之環氧樹脂(環氧丙基醚型液狀環氧樹脂,DICCorporation製EPICLON EXA-4880,總氯:0ppm)
環氧樹脂5:未使用表氯醇合成之環氧樹脂(脂環式環氧樹脂,Daicel Corporation製EHPE3150,總氯:0ppm)
(Epoxy resin A)
Epoxy resin a1: phenol aralkyl type epoxy resin containing biphenylene skeleton (NC3000L, manufactured by Nippon Kayaku Co., Ltd.)
Epoxy resin a2: Bisphenol A type epoxy resin (YL6810, manufactured by Mitsubishi Chemical Corporation)
Epoxy resin a3: Biphenyl type epoxy resin (YX4000K, manufactured by Mitsubishi Chemical Corporation)
Epoxy resin 4: Epoxy resin synthesized without epichlorohydrin (glycidyl ether liquid epoxy resin, EPICLON EXA-4880 manufactured by DICCorporation, total chlorine: 0 ppm)
Epoxy resin 5: Epoxy resin synthesized without using epichlorohydrin (alicyclic epoxy resin, EHPE3150 manufactured by Daicel Corporation, total chlorine: 0 ppm)

(無機填充材料C)
無機填充材料c1:熔融球狀二氧化矽(FB-100XFC、Denka Company Limited.製,平均粒徑13μm)
無機填充材料c2:熔融球狀二氧化矽(MSV-SC3,TATSUMORI LTD.製,平均粒徑19μm)
無機填充材料c3:球狀二氧化矽(SD2500-SQ,Admatechs Company Limited製,平均粒徑0.5μm)
無機填充材料c4:球狀二氧化矽(SC-2500-SQ,Admatechs Company Limited製,平均粒徑0.5μm)
無機填充材料c5:熔融球狀二氧化矽(FB-950FC,Denka Company Limited.製,平均粒徑22μm)
(Inorganic filler C)
Inorganic filler material c1: molten spherical silica (FB-100XFC, manufactured by Denka Company Limited, average particle size 13 μm)
Inorganic filler material c2: molten spherical silica (MSV-SC3, manufactured by TATSUMORI LTD., Average particle diameter 19 μm)
Inorganic filler c3: spherical silica (SD2500-SQ, manufactured by Admatechs Company Limited, average particle size 0.5 μm)
Inorganic filler c4: spherical silica (SC-2500-SQ, manufactured by Admatechs Company Limited, average particle diameter 0.5 μm)
Inorganic filler material c5: molten spherical silica (FB-950FC, manufactured by Denka Company Limited, average particle size 22 μm)

(阻燃劑)
阻燃劑1:氫氧化鋁(BE043,Nippon Light Metal Company, Ltd.製)
阻燃劑2:氫氧化鋁(CL-303,Sumitomo Chemical Co., Ltd.製)
(Flame retardant)
Flame retardant 1: aluminum hydroxide (BE043, manufactured by Nippon Light Metal Company, Ltd.)
Flame retardant 2: aluminum hydroxide (CL-303, manufactured by Sumitomo Chemical Co., Ltd.)

(硬化劑B)
硬化劑b1:含聯伸苯基骨架之苯酚芳烷基樹脂(MEH-7851SS,Meiwa Plastic Industries, Ltd.製)
硬化劑b2:酚醛清漆型酚醛樹脂(PR-HF-3,Sumitomo Bakelite Co., Ltd.製)
(Hardener B)
Hardener b1: Phenol aralkyl resin with biphenylene skeleton (MEH-7851SS, manufactured by Meiwa Plastic Industries, Ltd.)
Hardener b2: Novolac-type phenolic resin (PR-HF-3, manufactured by Sumitomo Bakelite Co., Ltd.)

(離子捕捉劑)
離子捕捉劑1:水滑石(DHT-4H,Kyowa Chemical Industry Co., Ltd.製)
離子捕捉劑2:鋁-鎂系無機離子交換體(IXE-700F,TOAGOSEI CO., LTD.製)
(Ion trapping agent)
Ion trap 1: hydrotalcite (DHT-4H, manufactured by Kyowa Chemical Industry Co., Ltd.)
Ion trapping agent 2: Aluminum-magnesium-based inorganic ion exchanger (IXE-700F, manufactured by TOAGOSEI CO., LTD.)

(低應力劑)
低應力劑1:丙烯腈-丁二烯共聚物化合物(CTBN1008SP,POWERTECH TECHNOLOGY JAPAN LTD.製)
低應力劑2:藉由下述合成方法獲得之熔融反應物A(聚矽氧)
[熔融反應物A的合成方法]
將由下述式(8)表示之雙酚A型環氧樹脂(Japan Epoxy Resins Co., Ltd.製,jER(註冊商標)YL6810,軟化點45℃,環氧當量172)66.1重量份在140℃加溫熔融,並添加由下述式(7)表示之有機聚矽氧烷33.1重量份及三苯基膦0.8重量份,熔融混合30分鐘而獲得了熔融反應物A。


低應力劑3:含烷基之聚矽氧(Silsoft034,Momentive公司製)
(Low stress agent)
Low stress agent 1: acrylonitrile-butadiene copolymer compound (CTBN1008SP, manufactured by POWERTECH TECHNOLOGY JAPAN LTD.)
Low stress agent 2: Molten reactant A (polysiloxane) obtained by the following synthesis method
[Synthesis method of molten reactant A]
66.1 parts by weight of bisphenol A type epoxy resin (manufactured by Japan Epoxy Resins Co., Ltd., jER (registered trademark) YL6810, softening point 45 ° C, epoxy equivalent 172) represented by the following formula (8) at 140 ° C The mixture was heated and melted, and 33.1 parts by weight of organic polysiloxane represented by the following formula (7) and 0.8 parts by weight of triphenylphosphine were added, and melt-mixed for 30 minutes to obtain a molten reactant A.


Low stress agent 3: polysiloxane containing alkyl group (Silsoft034, manufactured by Momentive)

(脫模劑)
脫模劑1:褐煤酸酯蠟(WE-4、ClariantJapanK.K.製)
脫模劑2:二乙醇胺-二褐煤酸酯(NC-133,ITOH OIL CHEMICALS CO.,LTD.製)
脫模劑3:甲苯二異氰酸酯改質氧化蠟(NPS-6010,NIPPON SEIRO CO., LTD.製)
脫模劑4:硬脂酸(SR-Sakura,NOF CORPORATION製)
(Release agent)
Release agent 1: montanate wax (WE-4, manufactured by Clariant Japan K.K.)
Release agent 2: Diethanolamine-dimontanate (NC-133, manufactured by ITOH OIL CHEMICALS CO., LTD.)
Release agent 3: toluene diisocyanate modified oxidized wax (NPS-6010, manufactured by NIPPON SEIRO CO., LTD.)
Release agent 4: stearic acid (SR-Sakura, manufactured by NOF CORPORATION)

<環氧樹脂組成物的製備>
[實施例1]
準備批次不同的複數種環氧樹脂a1,使用下述含氯粒子的檢查方法,測量了已準備之環氧樹脂a1的含氯粒子的個數。依據所獲得之測量結果,從複數個批次中選擇含有表2所示之個數的含氯粒子之環氧樹脂a1,用作環氧樹脂組成物的原料成分(環氧樹脂A)。作為硬化劑B使用硬化劑b1,作為無機填充材料C使用了無機填充材料c1、c3。
接著,與上述環氧樹脂A、硬化劑B、無機填充材料C一同使用表1所記載之其他原料成分,依據表1所示之摻合比率在常溫下使用混合器進行混合之後,在70~90℃進行了輥混練。接著,將所獲得之混練物冷卻之後,將此進行粉碎而獲得了環氧樹脂組成物。
關於所獲得之環氧樹脂組成物,使用下述含氯粒子的檢查方法測量了含氯粒子的個數。將結果示於表2。
<Preparation of epoxy resin composition>
[Example 1]
A plurality of epoxy resins a1 in different batches were prepared, and the number of chlorine-containing particles of the prepared epoxy resin a1 was measured using the following chlorine-containing particle inspection method. Based on the obtained measurement results, the epoxy resin a1 containing the number of chlorine-containing particles shown in Table 2 was selected from a plurality of batches and used as the raw material component of the epoxy resin composition (epoxy resin A). As the hardener B, a hardener b1 was used, and as the inorganic filler C, inorganic fillers c1 and c3 were used.
Next, the other raw material components described in Table 1 are used together with the above-mentioned epoxy resin A, hardener B, and inorganic filler C, and are mixed at room temperature using a mixer according to the blending ratio shown in Table 1, at 70 to Roll mixing was carried out at 90 ° C. Next, after cooling the obtained kneaded material, this was pulverized to obtain an epoxy resin composition.
Regarding the obtained epoxy resin composition, the number of chlorine-containing particles was measured using the following inspection method of chlorine-containing particles. The results are shown in Table 2.

[實施例2]
準備批次不同的複數種環氧樹脂a2,並使用下述含氯粒子的檢查方法測量了已準備之環氧樹脂a2的含氯粒子的個數。依據所獲得之測量結果,從複數個批次中選擇含有表2所示之個數的含氯粒子之環氧樹脂a2,從而用作環氧樹脂組成物的原料成分(環氧樹脂A),除此以外,以與實施例1相同的方式獲得了環氧樹脂組成物。
[Example 2]
A plurality of epoxy resins a2 in different batches were prepared, and the number of chlorine-containing particles of the prepared epoxy resin a2 was measured using the following chlorine-containing particle inspection method. Based on the obtained measurement results, the epoxy resin a2 containing the number of chlorine-containing particles shown in Table 2 was selected from a plurality of batches to be used as the raw material component of the epoxy resin composition (epoxy resin A), Except for this, the epoxy resin composition was obtained in the same manner as in Example 1.

[實施例3]
作為無機填充材料C使用了無機填充材料c2、c3,除此以外,以與實施例1相同的方式獲得了環氧樹脂組成物。
[Example 3]
As the inorganic filler C, the inorganic fillers c2 and c3 were used, except that the epoxy resin composition was obtained in the same manner as in Example 1.

[實施例4]
關於與實施例1相同批次的硬化劑b1,將利用1μm的過濾器過濾溶解於有機溶劑中而獲得之溶液而得者用作原料成分(硬化劑B),除此以外,以與實施例1相同的方式獲得了環氧樹脂組成物。
[Example 4]
Regarding the same batch of hardener b1 as in Example 1, the solution obtained by filtering and dissolving in an organic solvent using a 1 μm filter was used as the raw material component (hardener B). 1 The epoxy resin composition was obtained in the same manner.

[實施例5]
準備批次不同的複數種環氧樹脂a3,並使用下述含氯粒子的檢查方法測量了已準備之環氧樹脂a3的含氯粒子的個數。依據所獲得之測量結果,從複數個批次中選擇含有表2所示之個數的含氯粒子之環氧樹脂a3,用作環氧樹脂組成物的原料成分(環氧樹脂A)。作為硬化劑B使用硬化劑b1,作為無機填充材料C使用了無機填充材料c4、c5。
接著,與上述環氧樹脂A、硬化劑B、無機填充材料C一同使用表1所記載之其他原料成分,依據表1所示之摻合比率在常溫下使用混合器混合之後,在70~90℃進行了輥混練。接著,將所獲得之混練物進行冷卻之後,將此進行粉碎而獲得了環氧樹脂組成物。
關於所獲得之環氧樹脂組成物,使用下述含氯粒子的檢查方法測量了含氯粒子的個數。將結果示於表2。
[Example 5]
A plurality of epoxy resins a3 in different batches were prepared, and the number of chlorine-containing particles of the prepared epoxy resin a3 was measured using the following chlorine-containing particle inspection method. Based on the obtained measurement results, an epoxy resin a3 containing the number of chlorine-containing particles shown in Table 2 was selected from a plurality of batches and used as the raw material component of the epoxy resin composition (epoxy resin A). As the hardener B, a hardener b1 was used, and as the inorganic filler C, inorganic fillers c4 and c5 were used.
Next, the other raw material components described in Table 1 are used together with the above-mentioned epoxy resin A, hardener B, and inorganic filler C, and are mixed at a normal temperature using a mixer according to the blending ratio shown in Table 1, at 70 to 90 Roll mixing was carried out at ℃. Next, after cooling the obtained kneaded material, this was pulverized to obtain an epoxy resin composition.
Regarding the obtained epoxy resin composition, the number of chlorine-containing particles was measured using the following inspection method of chlorine-containing particles. The results are shown in Table 2.

[實施例6]
代替實施例2的硬化劑b1使用硬化劑b2,關於該硬化劑b2,將使用1μm的過濾器過濾溶解於有機溶劑中而獲得之溶液而得者用作原料成分(硬化劑B),除此以外,以與實施例5相同的方式獲得了環氧樹脂組成物。
[Example 6]
The hardener b2 was used instead of the hardener b1 of Example 2. As for the hardener b2, a solution obtained by filtering and dissolving in an organic solvent using a 1 μm filter was used as a raw material component (hardener B). Except for this, an epoxy resin composition was obtained in the same manner as in Example 5.

[實施例7]
關於與實施例5不同批次的環氧樹脂a3,使用1μm的過濾器過濾溶解於有機溶劑而獲得之溶液,將含有使用下述含氯粒子的檢查方法測量之表2所示之個數的含氯粒子之環氧樹脂a3用作原料成分(環氧樹脂A),除此以外,以與實施例5相同的方式獲得了環氧樹脂組成物。
[Example 7]
Regarding the epoxy resin a3 in a different batch from Example 5, a solution obtained by dissolving in an organic solvent was filtered using a 1 μm filter, and the number containing the number shown in Table 2 measured using the following chlorine-containing particle inspection method An epoxy resin composition was obtained in the same manner as in Example 5 except that the epoxy resin a3 containing chlorine particles was used as a raw material component (epoxy resin A).

[比較例1]
作為環氧樹脂A使用了環氧樹脂4,除此以外,以與實施例1相同的方式獲得了環氧樹脂組成物。
[比較例2]
作為環氧樹脂A使用了環氧樹脂5,除此以外,以與實施例5相同的方式獲得了環氧樹脂組成物。
[Comparative Example 1]
An epoxy resin composition was obtained in the same manner as in Example 1 except that epoxy resin 4 was used as epoxy resin A.
[Comparative Example 2]
An epoxy resin composition was obtained in the same manner as in Example 5 except that epoxy resin 5 was used as epoxy resin A.

[比較例3]
關於與實施例2不同批次的環氧樹脂a2,使用1μm的過濾器過濾溶解於有機溶劑中而獲得之溶液,將使用下述含氯粒子的檢查方法測量之含氯粒子的個數為0個之環氧樹脂a2用作原料成分(環氧樹脂A),除此以外,以與實施例2相同的方式獲得了環氧樹脂組成物。
[Comparative Example 3]
Regarding the epoxy resin a2 in a different batch from Example 2, the solution obtained by dissolving in an organic solvent was filtered using a 1 μm filter, and the number of chlorine-containing particles measured using the following chlorine-containing particle inspection method was 0 An epoxy resin composition was obtained in the same manner as in Example 2 except that each epoxy resin a2 was used as a raw material component (epoxy resin A).

(含氯粒子的檢查方法)
(1)作為試樣,準備了環氧樹脂組成物或構成環氧樹脂組成物之原料成分。環氧樹脂組成物使用了將各原料成分進行混合、混練,並對所獲得之混練物進行冷卻而得者。
(2)將(1)的試樣50g投入到清洗完的聚丙烯製的1000ml容器中,並添加丙酮300ml,蓋上容器之後,在室溫25℃,使用震盪器在300往復/分鐘的條件下搖動(混合)50分鐘。使用之丙酮使用了藉由網孔尺寸為12μm的過濾器進行過濾而得者。
(3)在漏斗套組(過濾器具)中設置了用上述丙酮清洗之過濾器。過濾器使用了對網孔尺寸為75μm的尼龍製過濾器進行了超音波清洗者。
(4)靜置(2)中搖動後的容器,然後,將容器中的溶液從(3)的漏斗上部注入,經由過濾器抽吸過濾。
(5)取出漏斗,並在抽吸之狀態下乾燥過濾器上的殘渣。
(6)在(5)的過濾器表面黏貼測量用片材的黏著性表面,並將殘渣回收到測量用片材的黏著性表面。
(7)將(6)的測量用片材從過濾器中剝離,針對其黏著性表面的整個面,使用數位顯微鏡製作了合成照片。將視野倍率調整為50倍之後,觀察整個表面,記錄殘渣所存在之位置並進行了印刷。
(8)在(7)的印刷物中確認殘渣的位置,並且使用掃描型電子顯微鏡(SEM)/能量分散型X射線分析裝置(EDS),對該殘渣實施了組成分析。SEM圖像觀察的結果,確認到存在粒子狀殘渣。
(9)由基於(8)的能量分散型X射線光譜法(EDX)的殘渣的組成分析結果,測量(計數)環氧樹脂組成物或構成環氧樹脂組成物之原料成分中所含有之含氯粒子的個數。
(Inspection method of chlorine-containing particles)
(1) As a sample, an epoxy resin composition or raw material components constituting the epoxy resin composition were prepared. The epoxy resin composition was obtained by mixing and kneading the raw material components and cooling the kneaded material obtained.
(2) Put 50g of the sample of (1) into a cleaned polypropylene 1000ml container and add 300ml of acetone. After closing the container, use a shaker at 300 reciprocating / min conditions at room temperature 25 ° C Shake (mix) for 50 minutes. The acetone used was obtained by filtering through a filter with a mesh size of 12 μm.
(3) A filter cleaned with the above acetone is installed in the funnel set (filter appliance). For the filter, a nylon filter with a mesh size of 75 μm was used for ultrasonic cleaning.
(4) Let the container shaken in (2) stand, and then inject the solution in the container from the upper part of the funnel of (3) and filter it with suction through a filter.
(5) Take out the funnel and dry the residue on the filter in the state of suction.
(6) Stick the adhesive surface of the measurement sheet to the filter surface of (5), and collect the residue on the adhesive surface of the measurement sheet.
(7) The measurement sheet of (6) was peeled from the filter, and a composite photograph was produced using a digital microscope for the entire surface of the adhesive surface. After adjusting the field of view magnification to 50 times, observe the entire surface, record the location of the residue and print it.
(8) The position of the residue was confirmed in the printed matter of (7), and a composition analysis was performed on the residue using a scanning electron microscope (SEM) / energy dispersive X-ray analyzer (EDS). As a result of SEM image observation, it was confirmed that particulate residues were present.
(9) Measure (count) the content contained in the epoxy resin composition or the raw material component constituting the epoxy resin composition based on the analysis result of the residue based on the energy dispersive X-ray spectroscopy (EDX) of (8) The number of chlorine particles.

又,關於環氧樹脂中或環氧樹脂組成物中檢測到之含氯粒子,由使用FT-IR(傅立葉轉換紅外線光譜)之光譜結果鑑定出含氯粒子中的有機物。將評價結果示於表2。In addition, regarding the chlorine-containing particles detected in the epoxy resin or the epoxy resin composition, the organic matter in the chlorine-containing particles was identified from the results of the spectrum using FT-IR (Fourier Transform Infrared Spectroscopy). Table 2 shows the evaluation results.

[表1]
[Table 1]

[表2]
[Table 2]

表2中,鑑定出:含氯粒子1A-1的有機物含有環氧樹脂和碳酸鹽的混合物;含氯粒子1A-2的有機物含有碳酸鹽;含氯粒子2A-1的有機物含有醯胺化合物;含氯粒子5A-1的有機物含有碳酸鹽;含氯粒子5A-2的有機物含有碳酸鹽和矽酸鹽;含氯粒子1-4的有機物含有纖維素;含氯粒子2-1的有機物含有纖維素;含氯粒子3-4的有機物含有纖維素。In Table 2, it is identified that the organic matter of the chlorine-containing particles 1A-1 contains a mixture of epoxy resin and carbonate; the organic matter of the chlorine-containing particles 1A-2 contains carbonate; and the organic matter of the chlorine-containing particles 2A-1 contains an amide compound; The organic matter of the chlorine-containing particles 5A-1 contains carbonate; the organic matter of the chlorine-containing particles 5A-2 contains carbonate and silicate; the organic matter of the chlorine-containing particles 1-4 contains cellulose; the organic matter of the chlorine-containing particles 2-1 contains fibers The organic matter containing 3-4 chlorine-containing particles contains cellulose.

<評價>
對所獲得之環氧樹脂組成物進行了以下評價。將評價結果示於表2。
<Evaluation>
The obtained epoxy resin composition was evaluated as follows. Table 2 shows the evaluation results.

(螺旋流)
對所獲得之環氧樹脂組成物進行了螺旋流測量。螺旋流測量藉由如下步驟來進行:使用低壓轉注成形機(Kohtaki Precision Machine Co.,Ltd.製“KTS-15”),在模具溫度175℃、注入壓力6.9MPa、硬化時間120秒鐘的條件下向依照EMMI-1-66之螺旋流測量用的模具注入環氧樹脂組成物,並測量流動長度。將結果示於表2。
(Spiral flow)
The obtained epoxy resin composition was subjected to spiral flow measurement. The spiral flow measurement was performed by the following steps: using a low-pressure rotary injection molding machine ("KTS-15" manufactured by Kohtaki Precision Machine Co., Ltd.) at a mold temperature of 175 ° C, an injection pressure of 6.9 MPa, and a hardening time of 120 seconds Next, the epoxy resin composition was injected into the mold for spiral flow measurement according to EMMI-1-66, and the flow length was measured. The results are shown in Table 2.

(凝膠時間)
在設為175℃之熱板上放置由獲得之環氧樹脂組成物構成之試樣,試樣熔融後,用刮刀攪拌的同時測量了直至硬化的時間。單位為秒(sec)。將結果示於表2。
(Gel time)
A sample composed of the obtained epoxy resin composition was placed on a hot plate set at 175 ° C. After the sample was melted, the time until hardening was measured while stirring with a spatula. The unit is seconds (sec). The results are shown in Table 2.

(金屬密接性)
使用所獲得之環氧樹脂組成物,並利用低壓轉注成形機(SANJO SEIKI CO., LTD.製,“AV-600-50-TF”),在模具溫度175℃、注入壓力10MPa、硬化時間180秒鐘的條件下,在9×29mm的短條狀的試驗用銅引線框上每1水準成形10個3.6mmφ×3mm的密接強度試驗片。接著,使用自動晶片剪切測量裝置(Nordson Advanced Technology K.K.製,DAGE4000型),在室溫下測量了試驗片和框架的晶片剪切強度。將10個試驗片的晶片剪切強度(MPa)的平均值示於表2。
(Metal adhesion)
Using the obtained epoxy resin composition, and using a low-pressure rotary injection molding machine (manufactured by SANJO SEIKI CO., LTD., "AV-600-50-TF") at a mold temperature of 175 ° C, an injection pressure of 10 MPa, and a hardening time of 180 On the condition of seconds, 10 pieces of 3.6 mmφ × 3 mm adhesion strength test pieces were formed per level on a short strip-shaped copper lead frame for test of 9 × 29 mm. Next, the wafer shear strength of the test piece and the frame was measured at room temperature using an automatic wafer shear measuring device (manufactured by Nordson Advanced Technology KK, model DAGE4000). Table 2 shows the average value of the wafer shear strength (MPa) of 10 test pieces.

實施例1至實施例7的環氧樹脂組成物與比較例1~3的環氧樹脂組成物相比,對Cu框架的密接性提高因此判明了金屬密接性優異。Compared with the epoxy resin compositions of Comparative Examples 1 to 3, the epoxy resin compositions of Examples 1 to 7 have improved adhesion to the Cu frame, and thus it was found that the metal adhesion is excellent.

該申請主張以於2017年12月6日提出申請之日本申請特願2017-234008號為基礎之優先權,且將其揭示之全部內容併入本文中。This application claims priority based on Japanese Application No. 2017-234008 filed on December 6, 2017, and incorporates the entire contents of the disclosure.

1‧‧‧半導體元件1‧‧‧Semiconductor components

2‧‧‧黏晶材硬化體 2‧‧‧Viscous crystal hardened body

3‧‧‧晶片墊 3‧‧‧chip pad

4‧‧‧焊接線 4‧‧‧welding line

5‧‧‧引線框 5‧‧‧Lead frame

6‧‧‧硬化體 6‧‧‧hardened body

7‧‧‧阻焊劑 7‧‧‧ solder resist

8‧‧‧基板 8‧‧‧ substrate

9‧‧‧焊球 9‧‧‧ solder ball

10‧‧‧車載用電子控制單元 10‧‧‧Vehicle electronic control unit

12‧‧‧基板 12‧‧‧ substrate

14‧‧‧密封樹脂層 14‧‧‧Sealing resin layer

16‧‧‧電子零件 16‧‧‧Electronic parts

18‧‧‧連接端子 18‧‧‧Connecting terminal

120‧‧‧貫穿孔 120‧‧‧Through hole

上述目的及其他目的、特徵及優點藉由以下描述之較佳實施形態及其附隨之以下附圖而變得更加明確。The above objects and other objects, features, and advantages are made clearer by the preferred embodiments described below and the accompanying drawings.

圖1係表示半導體裝置的一例之剖面圖。FIG. 1 is a cross-sectional view showing an example of a semiconductor device.

圖2係表示半導體裝置的一例之剖面圖。 2 is a cross-sectional view showing an example of a semiconductor device.

圖3係表示結構體的一例之剖面圖。 3 is a cross-sectional view showing an example of a structure.

Claims (11)

一種環氧樹脂組成物,其包含環氧樹脂、硬化劑及無機填充材料, 該環氧樹脂組成物包含:含有有機物之含氯粒子。An epoxy resin composition comprising epoxy resin, hardener and inorganic filler, The epoxy resin composition includes chlorine-containing particles containing organic matter. 如申請專利範圍第1項之環氧樹脂組成物,其中, 依據能量分散型X射線光譜法亦即EDX測量之該含氯粒子中的氯濃度為0.01Atm%以上20Atm%以下。For example, the epoxy resin composition according to item 1 of the patent application scope, in which The chlorine concentration in the chlorine-containing particles measured by energy dispersive X-ray spectroscopy, that is, EDX, is 0.01 Atm% or more and 20 Atm% or less. 如申請專利範圍第1項之環氧樹脂組成物,其中, 該含氯粒子含有選自由Al元素、Mg元素、Si元素、Fe元素、Zn元素、Ti元素、Ca元素、Na元素、K元素、S元素、碳酸化合物組成的群中之1種以上。For example, the epoxy resin composition according to item 1 of the patent application scope, in which The chlorine-containing particles contain one or more kinds selected from the group consisting of Al element, Mg element, Si element, Fe element, Zn element, Ti element, Ca element, Na element, K element, S element, and carbonic acid compound. 如申請專利範圍第1項之環氧樹脂組成物,其中, 依據能量分散型X射線光譜法亦即EDX測量之該含氯粒子中的碳濃度為40Atm%以上99Atm%以下。For example, the epoxy resin composition according to item 1 of the patent application scope, in which The carbon concentration in the chlorine-containing particles measured by energy dispersive X-ray spectroscopy, that is, EDX, is 40 Atm% or more and 99 Atm% or less. 如申請專利範圍第1項之環氧樹脂組成物,其中, 依據能量分散型X射線光譜法亦即EDX測量之該含氯粒子中的氧濃度為1Atm%以上50Atm%以下。For example, the epoxy resin composition according to item 1 of the patent application scope, in which The oxygen concentration in the chlorine-containing particles measured by energy dispersive X-ray spectroscopy, that is, EDX, is 1 Atm% or more and 50 Atm% or less. 如申請專利範圍第1項之環氧樹脂組成物,其中, 該有機物包含選自由碳酸鹽、醯胺化合物及矽酸鹽組成的群中之1種以上。For example, the epoxy resin composition according to item 1 of the patent application scope, in which The organic substance contains one or more kinds selected from the group consisting of carbonates, amide compounds, and silicates. 如申請專利範圍第1項之環氧樹脂組成物,其中, 該含氯粒子係:將該環氧樹脂組成物與丙酮混合而獲得溶液,並將所獲得之該溶液使用網孔尺寸為75μm的過濾器過濾,而包含在該過濾器上的殘渣中者。For example, the epoxy resin composition according to item 1 of the patent application scope, in which The chlorine-containing particle system: the epoxy resin composition is mixed with acetone to obtain a solution, and the obtained solution is filtered using a filter with a mesh size of 75 μm, and is contained in the residue on the filter. 如申請專利範圍第1項之環氧樹脂組成物,其中, 使用該環氧樹脂組成物獲得50g的樣品,該50g的樣品中的該含氯粒子的個數為1個以上10個以下。For example, the epoxy resin composition according to item 1 of the patent application scope, in which Using the epoxy resin composition, a 50 g sample was obtained, and the number of the chlorine-containing particles in the 50 g sample was 1 or more and 10 or less. 如申請專利範圍第1項之環氧樹脂組成物,其在用於密封電子零件之密封用樹脂組成物中使用。For example, the epoxy resin composition of claim 1 is used in a resin composition for sealing electronic parts. 如申請專利範圍第1至9項中任一項之環氧樹脂組成物,其在用於密封車載用電子控制單元的密封用樹脂組成物中使用。The epoxy resin composition according to any one of items 1 to 9 of the patent application range is used in a sealing resin composition for sealing a vehicle-mounted electronic control unit. 一種電子裝置,其具備申請專利範圍第1至10項中任一項之環氧樹脂組成物的硬化物。An electronic device provided with a cured product of an epoxy resin composition according to any one of patent application items 1 to 10.
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