WO2019106935A1 - Display device - Google Patents

Display device Download PDF

Info

Publication number
WO2019106935A1
WO2019106935A1 PCT/JP2018/036495 JP2018036495W WO2019106935A1 WO 2019106935 A1 WO2019106935 A1 WO 2019106935A1 JP 2018036495 W JP2018036495 W JP 2018036495W WO 2019106935 A1 WO2019106935 A1 WO 2019106935A1
Authority
WO
WIPO (PCT)
Prior art keywords
area
substrate
region
film thickness
display device
Prior art date
Application number
PCT/JP2018/036495
Other languages
French (fr)
Japanese (ja)
Inventor
匠 佐野
Original Assignee
株式会社ジャパンディスプレイ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ジャパンディスプレイ filed Critical 株式会社ジャパンディスプレイ
Publication of WO2019106935A1 publication Critical patent/WO2019106935A1/en

Links

Images

Classifications

    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • H05B33/06Electrode terminals

Definitions

  • Embodiments of the present invention relate to a display device.
  • Such a display device is provided with a pad connected to an external circuit or the like in the non-display area around the display area to supply a voltage to each pixel, a wire connected to the pad, etc. .
  • the substrate is accommodated in an electronic device or the like in a bent state such that the pad is disposed on the back surface of the substrate.
  • substrate and laminates a flexible back plate on the peeled part is known.
  • An object of the present embodiment is to provide a display device capable of suppressing a decrease in yield.
  • the first area overlapping the display area, the second area overlapping the plurality of pads arranged in the first direction, and the second area are positioned between the first area and the second area.
  • a second support substrate bonded to the second support substrate, and the insulating substrate extends in the first direction to a first boundary between the first region and the third region on the other surface side
  • a second slit extending in the first direction at a second boundary between the first slit, the second region, and the third region Tsu a preparative and, a display apparatus is provided.
  • the first area overlapping the display area, the second area overlapping the plurality of pads arranged in the first direction, and the second area are positioned between the first area and the second area.
  • An insulating substrate having a third region, a signal line formed on one surface of the insulating substrate, extending in a second direction intersecting the first direction, and connected to the pad; the insulating substrate A first support substrate disposed on the other surface side opposite to the one surface side of the first adhesive layer and adhered to the first area via the first adhesive layer, and the second area via the second adhesive layer And a third support substrate bonded to the second support substrate, the third region including a first portion, a second portion, and a third portion located between the first portion and the second portion.
  • the signal line is continuously formed from the first area to the pad in the second area;
  • the display device is formed in a position overlapping with the third portion, and the film thickness of the third portion is larger than the film thickness of the first portion and the film thickness of the second portion. .
  • FIG. 1 is a perspective view showing a configuration of a display device according to the present embodiment.
  • FIG. 2 is a cross-sectional view showing a display area of the display device shown in FIG.
  • FIG. 3 is a cross-sectional view of the display shown in FIG. 1 along the YZ plane.
  • FIG. 4 is a plan view showing the display device according to the first embodiment.
  • FIG. 5 is a cross-sectional view for explaining the step of peeling the substrate from the insulating substrate.
  • FIG. 6 is a cross-sectional view for explaining a process of attaching a support substrate by an adhesive layer.
  • FIG. 7 is a cross-sectional view for explaining the process of pressure bonding the first flexible wiring substrate to the display panel.
  • FIG. 1 is a perspective view showing a configuration of a display device according to the present embodiment.
  • FIG. 2 is a cross-sectional view showing a display area of the display device shown in FIG.
  • FIG. 3 is a cross-sectional view of the display
  • FIG. 8 is a cross-sectional view for explaining the step of forming the protective member and the step of cutting the support substrate.
  • FIG. 9 is a cross-sectional view for explaining the step of peeling the portion of the support substrate and the portion of the adhesive layer in the third region.
  • FIG. 10 is a cross-sectional view for explaining the step of bending the bending area of the display panel.
  • FIG. 11 is a cross-sectional view showing the display panel after the bending area shown in FIG. 10 is bent.
  • FIG. 12 is a plan view showing a display device according to the second embodiment.
  • FIG. 13 is a cross-sectional view taken along line AB of the display device shown in FIG.
  • FIG. 14 is a cross-sectional view of the display device shown in FIG.
  • FIG. 15 is a cross-sectional view along the YZ plane of the display device shown in FIG. 1 according to the third embodiment.
  • FIG. 1 is a perspective view showing the configuration of a display device DSP according to the present embodiment.
  • the display device DSP is an organic electroluminescence (EL) display device
  • FIG. 1 shows a three-dimensional space defined by a first direction X, a second direction Y perpendicular to the first direction X, and a third direction Z perpendicular to the first direction X and the second direction Y. ing.
  • the first direction X, the second direction Y, and the third direction Z are orthogonal to each other, but may intersect at an angle other than 90 °.
  • the direction toward the tip of the arrow in the third direction Z is defined as upper, and the direction opposite to the direction toward the tip of the arrow in the third direction Z is defined as downward.
  • the second member on the first member and “the second member below the first member” the second member may be in contact with the first member or separated from the first member It may be In the latter case, a third member may be interposed between the first member and the second member.
  • the display device DSP includes a display panel PNL, a first flexible printed circuit FPC1, a second flexible printed circuit FPC2, a first support substrate SP1, and a second support substrate SP2.
  • the display panel PNL includes a flat first substrate SUB1 and a flat second substrate SUB2 opposite to the first substrate SUB1.
  • the display panel PNL also includes a display area DA for displaying an image and a non-display area NDA surrounding the display area DA.
  • the display panel PNL includes a plurality of pixels PX in the display area DA. The plurality of pixels PX are arranged in the first direction X and the second direction Y, and are provided in a matrix.
  • the first substrate SUB1 has a terminal portion T and a bending area BA in the area extending outward beyond the area overlapping the second substrate SUB2.
  • the three side edges of the first substrate SUB1 are aligned with the three side edges of the second substrate SUB2 in the third direction Z.
  • the length of the side edge parallel to the first direction X of the first substrate SUB1 is substantially equal to the length of the side edge parallel to the first direction X of the second substrate SUB2.
  • the length of the side edge of the first substrate SUB1 parallel to the second direction Y is larger than the length of the side edge parallel to the second direction Y of the second substrate SUB2. That is, the area parallel to the XY plane of the first substrate SUB1 is larger than the area parallel to the XY plane of the second substrate SUB2.
  • the XY plane is a plane defined by the first direction X and the second direction Y.
  • the first flexible printed circuit FPC1 is mounted on the terminal portion T in the non-display area NDA.
  • the length of the side edge parallel to the first direction X of the first flexible wiring board FPC1 is compared to the length of the side edge parallel to the first direction X of the first substrate SUB1 and the second substrate SUB2. It may be small but equal.
  • the first flexible printed circuit FPC1 is electrically connected to the display panel PNL.
  • the second flexible printed circuit FPC2 is mounted under the first flexible printed circuit FPC1 and is electrically connected to the first flexible printed circuit FPC1.
  • the bending area BA is located between the terminal portion T and the display area DA in the non-display area NDA.
  • the bending area BA corresponds to an area to be bent when the display device DSP is accommodated in a housing of an electronic device or the like, and is shown by oblique lines in the drawing. That is, the bending area BA is bent so that the first flexible wiring board FPC1 and the second flexible wiring board FPC2 are disposed below the display area DA.
  • the first support substrate SP1 and the second support substrate SP2 are attached below the display panel PNL.
  • the first support substrate SP1 overlaps the display area DA in the third direction Z.
  • the second support substrate SP2 overlaps the terminal portion T in the third direction Z.
  • the first support substrate SP1 and the second support substrate SP2 are not arranged at positions overlapping the bending area BA in the third direction Z.
  • FIG. 2 is a cross-sectional view showing a display area DA of the display device DSP shown in FIG.
  • the display panel PNL includes the insulating substrate 10, the switching elements SW 1, SW 2, SW 3, the reflective layer 4, the organic EL elements OLED 1, OLED 2, OLED 3, the sealing layer 41, the first support substrate SP 1, the first.
  • An adhesive layer AD1, an adhesive layer GL, a film FL and the like are provided.
  • the first substrate SUB1 includes the insulating substrate 10, the switching elements SW1, SW2, SW3, the reflective layer 4, the organic EL elements OLED1, OLED2, OLED3, the sealing layer 41, the first adhesion
  • the layer AD1, the first support substrate SP1, the second substrate SUB2 is a film FL, and the first substrate SUB1 and the second substrate SUB2 are bonded to each other by the adhesive layer GL.
  • the insulating substrate 10 is formed using an organic insulating material, and is formed using, for example, polyimide.
  • the insulating substrate 10 may be a single layer formed of polyimide, or a laminated body in which a layer formed of polyimide, an inorganic film, and a layer formed of polyimide are sequentially laminated. It may be
  • the insulating substrate 10 has one surface SF11 and the other surface SF12 opposite to the one surface.
  • One surface SF ⁇ b> 11 of the insulating substrate 10 is covered with the first insulating film 11.
  • the switching elements SW1, SW2, and SW3 are formed on the first insulating film 11.
  • the switching elements SW1, SW2, and SW3 are formed of top gate thin film transistors, but may be formed of bottom gate thin film transistors. Since the switching elements SW1, SW2, and SW3 have the same configuration, the structure will be described in more detail focusing on the switching element SW1.
  • the switching element SW1 includes a semiconductor layer SC formed on the first insulating film 11.
  • the semiconductor layer SC is covered by the second insulating film 12.
  • the second insulating film 12 is also disposed on the first insulating film 11.
  • the gate electrode WG of the switching element SW1 is formed on the second insulating film 12, and is located directly on the semiconductor layer SC.
  • the gate electrode WG is covered by the third insulating film 13.
  • the third insulating film 13 is also disposed on the second insulating film 12.
  • the first insulating film 11, the second insulating film 12, and the third insulating film 13 are made of, for example, an inorganic material such as silicon oxide or silicon nitride.
  • the source electrode WS and the drain electrode WD of the switching element SW1 are formed on the third insulating film 13.
  • the source electrode WS and the drain electrode WD are electrically connected to the semiconductor layer SC through contact holes penetrating the second insulating film 12 and the third insulating film 13, respectively.
  • the switching element SW1 is covered by the fourth insulating film 14.
  • the fourth insulating film 14 is also disposed on the third insulating film 13.
  • Such a fourth insulating film 14 is formed of, for example, an organic material such as a transparent resin.
  • the reflective layer 4 is formed on the fourth insulating film 14.
  • the reflective layer 4 is formed of a metal material having a high light reflectance, such as aluminum or silver.
  • the upper surface of the reflective layer 4 may be a flat surface or may be an uneven surface for imparting light scattering properties.
  • the organic EL elements OLED1 to OLED3 are formed on the fourth insulating film 14. That is, the organic EL elements OLED1 to OLED3 are located between the insulating substrate 10 and the film FL.
  • the organic EL element OLED1 is electrically connected to the switching element SW1
  • the organic EL element OLED2 is electrically connected to the switching element SW2
  • the organic EL element OLED3 is electrically connected to the switching element SW3.
  • the organic EL elements OLED1 to OLED3 are configured as top emission types that emit blue light, green light, and red light toward the side of the film FL, respectively. All such organic EL elements OLED1 to OLED3 have the same structure.
  • the organic EL elements OLED1 to OLED3 are partitioned by the ribs 15, respectively.
  • the organic EL element OLED1 includes a pixel electrode PE1 formed on the reflective layer 4.
  • the pixel electrode PE1 is in contact with the drain electrode WD of the switching element SW1 and is electrically connected to the switching element SW1.
  • the organic EL element OLED2 includes a pixel electrode PE2 electrically connected to the switching element SW2
  • the organic EL element OLED3 includes a pixel electrode PE3 electrically connected to the switching element SW3.
  • the pixel electrodes PE1, PE2 and PE3 are formed of, for example, a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO).
  • the organic EL element OLED1 comprises an organic light emitting layer ORGB emitting blue light
  • the organic EL element OLED2 comprises an organic light emitting layer ORGG emitting green
  • the organic EL element OLED3 comprises an organic light emitting layer ORGR emitting red
  • the organic light emitting layer ORGB is located on the pixel electrode PE1
  • the organic light emitting layer ORGG is located on the pixel electrode PE2
  • the organic light emitting layer ORGR is located on the pixel electrode PE3.
  • the organic EL elements OLED1 to OLED3 are provided with the common electrode CE.
  • the common electrode CE is located on the organic light emitting layers ORGB, ORGG, ORGR.
  • the common electrode CE is also located on the rib 15.
  • One of the pixel electrode PE and the common electrode CE is an anode, and the other is a cathode.
  • the common electrode CE is formed of, for example, a transparent conductive material such as ITO or IZO.
  • the sealing layer 41 covers the top of the organic EL elements OLED1, OLED2, and OLED3.
  • the sealing layer 41 seals a member disposed between the insulating substrate 10 and the sealing layer 41.
  • the sealing layer 41 suppresses the entry of oxygen and moisture into the organic EL elements OLED1, OLED2, and OLED3, and suppresses the deterioration of the organic EL elements OLED1, OLED2, and OLED3.
  • the sealing layer 41 may be formed of a laminate of an inorganic film and an organic film.
  • the film FL is disposed on the sealing layer 41.
  • the film FL is, for example, a protective film, an optical film, or the like, and is formed using a transparent material.
  • the film FL is adhered to the sealing layer 41 by the adhesive layer GL.
  • the adhesive layer GL is formed using, for example, any of an acrylic material, an epoxy material, and a polyimide.
  • the first support substrate SP1 is bonded to the surface SF12 of the insulating substrate 10 by the first adhesive layer AD1.
  • a material of the first support substrate SP1 for example, a material which is excellent in heat resistance, gas barrier property, moisture resistance, and strength and is inexpensive is preferable.
  • the first support substrate SP1 has, for example, heat resistance that does not deteriorate or deform at the process temperature in the process of manufacturing the display device DSP.
  • the first support substrate SP1 has, for example, a strength higher than that of the insulating substrate 10, and functions as a support layer that suppresses a situation where the display panel PNL is bent in the state where no external stress is applied.
  • the first support substrate SP1 has, for example, a moisture-proof property that suppresses the entry of moisture and the like into the insulating substrate 10, a gas blocking property that suppresses the entry of gas, and the like, and functions as a barrier layer.
  • the first support substrate SP1 is, for example, a film formed using polyethylene terephthalate.
  • the second support substrate SP2 shown in FIG. 1 is also formed using the same material as the first support substrate SP1.
  • the pixel PX shown in FIG. 1 is, for example, the smallest unit constituting a color image, and includes the above-described organic EL elements OLED1 to OLED3.
  • the organic EL elements OLED1 to OLED3 respectively include the organic light emitting layer ORGB emitting blue light, the organic light emitting layer ORGG emitting green light, and the organic light emitting layer ORGR emitting red light. It is not limited.
  • the organic EL elements OLED1 to OLED3 may be provided with a common organic light emitting layer. At this time, for example, the organic EL elements OLED1 to OLED3 emit white light.
  • the color filter layer is disposed on the sealing layer 41.
  • FIG. 3 is a cross-sectional view of the display device DSP shown in FIG. 1 along the YZ plane.
  • the insulating substrate 10 has a first area AR1 overlapping the display area DA, a second area AR2 overlapping the terminal T, and a third area AR3 located between the first area AR1 and the second area AR2. doing.
  • the third area AR3 corresponds to an area overlapping the bending area BA.
  • the insulating substrate 10 has a first film thickness T1 in the first region AR1, a second film thickness T2 in the second region AR2, and a third film thickness T3 in the third region AR3.
  • insulating substrate 10 has slit SL1 at the first boundary BR1 between first region AR1 and third region AR3 on the side of surface SF12, and the second boundary between second region AR2 and third region AR3. And a slit SL2 in BR2.
  • the slit SL1 and the slit SL2 are formed in a straight line along the first boundary BR1 and the second boundary BR2, respectively.
  • the insulating substrate 10 has a film thickness T11 in the slit SL1 and a film thickness T12 in the slit SL2.
  • the first film thickness T1 and the second film thickness T2 are respectively larger than the third film thickness T3.
  • the first film thickness T1 and the second film thickness T2 are equal to each other.
  • the film thicknesses T11 and T12 are respectively smaller than the third film thickness T3.
  • the insulating substrate 10 has the first surface SF1 of the first region AR1, the second surface SF2 of the second region AR2, and the third surface SF3 of the third region AR3 on the surface SF12 side.
  • the third surface SF3 is located between the first surface SF1 and the second surface SF2.
  • the third surface SF3 is located closer to the surface SF11 than the first surface SF1 and the second surface SF2.
  • the first support substrate SP1 and the second support substrate SP2 are disposed on the surface SF12 side of the insulating substrate 10.
  • the first support substrate SP1 is bonded to the first surface SF1 of the first area AR1 via the first adhesive layer AD1.
  • the second support substrate SP2 is bonded to the second surface SF2 of the second area AR2 via the second adhesive layer AD2.
  • the insulating substrate 10 has an end EG4 extending in the first direction X.
  • the first insulating film 11 and the second insulating film 12 extend in the second direction Y to a position overlapping the end EG 4 of the insulating substrate 10.
  • the third insulating film 13 does not extend in the second direction Y to a position overlapping the first boundary BR1.
  • the signal wiring 6 is disposed on the second insulating film 12 and the third insulating film 13. That is, the signal wiring 6 is disposed on the surface SF11 side of the insulating substrate 10.
  • the signal wiring 6 is continuously arranged from the first area AR1 to the pad of the second area AR2. In addition, the signal wiring 6 overlaps the first area AR1, the second area AR2, and the third area AR3.
  • the signal wiring 6 is formed of, for example, a laminated body of titanium, aluminum, and titanium.
  • the signal lines 6 correspond to power supply lines, various control lines, and the like.
  • the fourth insulating film 14 covers the signal wiring 6.
  • the fourth insulating film 14 has a contact hole CH penetrating to the signal wiring 6.
  • the pad PD is disposed on the fourth insulating film 14 and also disposed in the contact hole CH. Further, the pad PD is disposed at a position overlapping with the second area AR2.
  • the pad PD is electrically connected to the signal wiring 6 in the contact hole CH.
  • the pad PD is formed of, for example, the same material and in the same process as the pixel electrodes PE1, PE2, and PE3 illustrated in FIG. 2, and is formed using ITO, IZO, or the like.
  • both of the signal wiring 6 and the pad PD may be disposed in the same layer. At this time, the signal wiring 6 and the pad PD may be separately formed or may be integrally formed. Further, as shown in the figure, signal interconnection 6 and pad PD are arranged in different layers, and both are electrically connected through a contact hole formed in the interlayer insulating film between signal interconnection 6 and pad PD. May be
  • the rib 15, the sealing layer 41, the adhesive layer GL, and the film FL are disposed at positions overlapping the first area AR1 and do not extend to positions overlapping the second area AR2.
  • the sealing layer 41 covers the rib 15 and is also in contact with the fourth insulating film 14.
  • the adhesive layer GL covers the sealing layer 41 and is also in contact with the fourth insulating film 14.
  • the first flexible printed circuit FPC1 is mounted on the display panel PNL on the fourth insulating film 14. That is, the first flexible printed circuit FPC1 is mounted at a position overlapping the second region AR2 on the surface SF11 side of the insulating substrate 10.
  • the first flexible printed circuit FPC 1 includes the core substrate 200, the connection wiring 100 disposed on the lower surface side of the core substrate 200, and the drive IC chip 3 disposed on the upper surface side of the core substrate 200.
  • the drive IC chip 3 functions as a signal supply source or the like that supplies signals necessary to drive the display panel PNL.
  • the position of the drive IC chip 3 is not particularly limited, and may be disposed on the lower surface side of the core substrate 200.
  • the display panel PNL and the first flexible printed circuit FPC1 are electrically connected to and bonded to each other through an anisotropic conductive film 8 which is a conductive material.
  • the anisotropic conductive film 8 contains conductive particles dispersed in an adhesive.
  • the anisotropic conductive film 8 is in contact with the pad PD and electrically connected.
  • the anisotropic conductive film 8 is in contact with the connection wiring 100 and is electrically connected.
  • the connection wiring 100 is electrically connected to the pad PD and the signal wiring 6 via the anisotropic conductive film 8.
  • the protective member PT is disposed on the fourth insulating film 14 at a position overlapping with the bending area BA.
  • the protection member PT is in contact with the upper surface US1 and the side surface SD1 of the first flexible printed circuit FPC1, the upper surface US2 and the side surface SD2 of the film FL, the side surface SD3 of the adhesive layer GL, and the like.
  • the protective member PT is formed of, for example, a resin.
  • FIG. 4 is a plan view showing the display device DSP according to the first embodiment.
  • FIG. 4 shows the positional relationship and the like of the first area AR1, the second area AR2, and the third area AR3.
  • the insulating substrate 10 has a first end EG1 and a second end EG2 extending in the second direction Y, and a third end EG3 and a fourth end EG4 extending in the first direction X. ing.
  • the second end EG2 is located on the opposite side of the first end EG1 across the display area DA.
  • the fourth end EG4 is located on the opposite side of the third end EG3 across the display area DA.
  • the first area AR ⁇ b> 1 is indicated by diagonal lines rising to the left
  • the second area AR ⁇ b> 2 is indicated by diagonal lines rising to the right.
  • the third area AR3 overlaps the bending area BA, is located between the first area AR1 and the second area AR2, and extends from the first end EG1 to the second end EG2 along the first direction X There is.
  • the first area AR1, the third area AR3 and the second area AR2 are arranged in the second direction Y in this order.
  • the first area AR1 corresponds to an area overlapping with the first support substrate SP1 in plan view
  • the second area AR2 corresponds to an area overlapping with the second support substrate SP2 in plan view
  • the third area AR3 is This corresponds to a region not overlapping with the first support substrate SP1 and the second support substrate SP2 in plan view.
  • the plurality of pads PD overlap the second area AR2 in plan view, and are arranged side by side in the first direction X.
  • the plurality of signal lines 6 are respectively connected to the pads PD, extend in the second direction Y in the bending area BA, and are arranged side by side in the first direction X.
  • the slit SL1 extends in the first direction X at the first boundary BR1.
  • the slit SL2 extends in the first direction X at the second boundary BR2.
  • the outer shape of the display panel PNL in the XY plane is rectangular, but it may be a round shape in which the four corners of the display panel PNL are rounded.
  • FIG. 5 is a cross-sectional view for explaining a process of peeling the substrate 7 from the insulating substrate 10.
  • the first mother substrate M1 for forming the plurality of first substrates SUB1 is formed on the substrate 7, and the second mother substrate M2 for forming the plurality of second substrates SUB2 is formed by the adhesive layer GL. 1 Bond to the mother substrate M1.
  • the insulating substrate 10 is irradiated with the laser beam LL1 from under the substrate 7.
  • the substrate 7 is formed of glass
  • the insulating substrate 10 is formed of polyimide.
  • the laser beam LL ⁇ b> 1 When the laser beam LL ⁇ b> 1 is irradiated from below the substrate 7, the laser beam LL ⁇ b> 1 reaches the surface SF ⁇ b> 12 of the insulating substrate 10.
  • the insulating substrate 10 is decomposed at the interface between the substrate 7 and the insulating substrate 10 by absorbing the laser light LL1. Thus, a space is generated at the interface between the substrate 7 and the insulating substrate 10, and the substrate 7 is peeled off from the insulating substrate 10.
  • FIG. 6 is a cross-sectional view for explaining the process of attaching the support substrate SP by the adhesive layer AD.
  • the support substrate SP is attached to the surface SF12 of the insulating substrate 10 by the adhesive layer AD.
  • the support substrate SP is aligned and then heated to perform the insulating substrate Paste to 10 faces SF12.
  • the adhesive layer AD is heated after the alignment of the support substrate SP, the positional deviation of the support substrate SP with respect to the insulating substrate 10 can be suppressed.
  • FIG. 7 is a cross-sectional view for explaining a process of pressure bonding the first flexible printed circuit FPC1 to the display panel PNL.
  • individual display panels PNL are cut out from the display panel PNL configured by the first mother substrate and the second mother substrate.
  • the step of pressure-bonding the first flexible wiring substrate FPC1 to the respective display panels PNL using the anisotropic conductive film 8 is performed. That is, the anisotropic conductive film 8 is disposed between the first flexible wiring substrate FPC1 and the display panel PNL and at a position overlapping the pad PD, and the first flexible wiring substrate FPC1 and the display panel PNL are provided. From the bottom, pressure is applied in the direction of the arrow shown in FIG.
  • the anisotropic conductive film 8 melts, and the conductive particles contained in the anisotropic conductive film 8 contact the pad PD and the connection wiring 100, and the first flexible wiring substrate FPC1 and the display panel PNL are electrically and physically Connected.
  • the support substrate SP is disposed on the entire lower surface of the display panel PNL. Therefore, the supporting substrate SP can reinforce the strength of the insulating substrate 10 in each process, and it is possible to suppress the occurrence of disconnection of the signal wiring 6 and the like.
  • FIG. 8 is a cross-sectional view for illustrating the process of forming the protective member PT and the process of cutting the support substrate SP.
  • an organic insulating material is applied on the fourth insulating film 14 between the film FL and the first flexible wiring substrate FPC1, and cured by UV irradiation to form a protective member PT.
  • the laser light LL2 is irradiated from below the support substrate SP.
  • the support substrate SP is cut at two places.
  • the portion irradiated with the laser beam LL2 corresponds to the first boundary BR1 and the second boundary BR2.
  • the support substrate SP is cut by the laser beam LL2, and at the same time, the adhesive layer AD is cut to form a slit in the insulating substrate 10. That is, the laser beam LL2 reaches the insulating substrate 10.
  • FIG. 9 is a cross-sectional view for explaining the step of peeling the portion SPa of the support substrate SP and the portion ADa of the adhesive layer AD in the third region AR3.
  • cuts 61 and 62 are formed in the support substrate SP, the adhesive layer AD, and the insulating substrate 10.
  • the cut 61 and the cut 62 penetrate the support substrate SP and the adhesive layer AD, and the insulating substrate 10 is formed halfway without penetrating. That is, the cut 61 includes the slit SL1 formed in the insulating substrate 10, and the cut 62 includes the slit SL2 formed in the insulating substrate 10.
  • the laser beam LL3 is irradiated from below the support substrate SP in the third region AR3.
  • the laser beam LL3 reaches the surface SF12 of the insulating substrate 10, and the insulating substrate 10 is reformed at the interface with the adhesive layer AD.
  • a space GP is generated between the insulating substrate 10 and the adhesive layer AD in the third region AR3.
  • the tip of the laser beam LL2 when cutting the support substrate SP, for example, the tip of the laser beam LL2 may be irradiated with waves in the third direction Z. Therefore, when the laser beam LL2 is irradiated so as to form the cut 61 and the cut 62 in the middle of the adhesive layer AD, the tip of the laser beam LL2 is irradiated to both the support substrate SP and the adhesive layer AD. As a result, the supporting substrate SP and the adhesive layer AD melt, are mixed, and are cooled, and there is a possibility that a sticking substance having high adhesive strength may be generated.
  • the display panel PNL is pulled, which may cause a crack in the inorganic film or a break in the signal wiring 6. is there.
  • the insulating substrate 10 has the slit SL1 and the slit SL2. That is, the laser beam LL2 for cutting the support substrate SP is irradiated to the insulating substrate 10. Therefore, even if the tip of the laser beam LL2 is waved in the third direction Z, since the wave is waved in the insulating substrate 10, a fixed substance in which the support substrate SP and the adhesive layer AD are mixed hardly occurs. Therefore, the load on the display panel PNL when peeling off the portion SPa can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
  • the first support substrate SP1 and the second support substrate SP2 are formed by peeling the portion SPa of the support substrate SP. For this reason, the process of peeling the whole support substrate SP once, and sticking the other member used as 1st support substrate SP1 and 2nd support substrate SP2 is unnecessary.
  • the step of peeling the entire support substrate SP charging of the insulating substrate 10 can be suppressed, and damage to the display panel PNL due to electrostatic breakdown or the like can be suppressed.
  • electrostatic breakdown of the insulating films such as the second insulating film 12 and the third insulating film 13 can be suppressed, damage to the switching element SW can be suppressed.
  • FIG. 10 is a cross-sectional view for illustrating the process of bending the bending area BA of the display panel PNL.
  • the third region AR3 is modified by the laser beam LL3
  • the third film thickness T3 is formed smaller than each of the first film thickness T1 and the second film thickness T2.
  • the third surface SF3 is located above the first surface SF1 and the third surface SF3.
  • the support substrate SP is peeled off in a region overlapping with the third region AR3, the first support substrate SP1 and the second support substrate SP2 are formed from the support substrate SP.
  • the first adhesive layer AD1 and the second adhesive layer AD2 are formed from the adhesive layer AD.
  • the position of the support member 9 is aligned, and the support member 9 is bonded to the first support substrate SP1 by the adhesive layer AD11.
  • the bending area BA of the display panel PNL is bent so that the first flexible printed circuit FPC1 is disposed below the first support substrate SP1. That is, the bending area BA is bent so that the first flexible printed circuit FPC1 is disposed under the support member 9 with the support member 9 as a base point, and the first flexible printed circuit FPC1 is attached to the support member 9 by the adhesive layer AD12.
  • the support member 9 is formed in, for example, a sheet shape.
  • the insulating substrate 10 has a slit SL1 and a slit SL2. Therefore, when bending, since the slit can be used as a starting point, the insulating substrate 10 can be easily bent as compared with the case where the slit is not provided. Therefore, the load on the display panel PNL when bending the bending area BA can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
  • FIG. 11 is a cross-sectional view showing the display panel PNL after the bending area BA shown in FIG. 10 is bent.
  • the bending area BA is bent so that the first support substrate SP1 and the first flexible printed circuit FPC1 face each other.
  • the support member 9 is disposed between the first support substrate SP1 and the first flexible printed circuit FPC1.
  • the adhesive layer AD11 is disposed between the first support substrate SP1 and the support member 9, and bonds the both.
  • the adhesive layer AD12 is disposed between the first flexible printed circuit FPC1 and the support member 9, and bonds the two together.
  • the adhesive layers AD11 and AD12 may be formed separately as shown, or may be integrally formed.
  • the adhesive layers AD11 and AD12 are, for example, double-sided tapes.
  • FIG. 12 is a plan view showing a display device DSP according to the second embodiment. Compared with the configuration shown in FIG. 4, the configuration shown in FIG. 12 is different from the configuration shown in FIG. 4 in the third area AR3 between the first portion PA1, the second portion PA2, the first portion PA1 and the second portion PA2. It is different in having a portion PA3.
  • the first portion PA1 and the second portion PA2 correspond to a region indicated by oblique lines rising to the right in the third region AR3.
  • the first portion PA1, the third portion PA3, and the second portion PA2 are aligned in the first direction X in this order.
  • the first portion PA1 is located on the first end EG1 side
  • the second portion PA2 is located on the second end EG2 side.
  • the signal wiring 6 is disposed at a position overlapping the third portion PA3 and is not disposed at a position overlapping the first portion PA1 and the second portion PA2.
  • FIG. 13 is a cross-sectional view of the display device DSP shown in FIG. 12 taken along line AB.
  • the insulating substrate 10 has a fourth film thickness T4 in the first portion PA1, a fifth film thickness T5 in the second portion PA2, and a sixth film thickness T6 in the third portion PA3.
  • the fourth film thickness T4 and the fifth film thickness T5 are respectively smaller than the sixth film thickness T6.
  • the sixth film thickness T6 is equivalent to the third film thickness T3 shown in FIG.
  • the fourth film thickness T4 and the fifth film thickness T5 are equal to each other.
  • the insulating substrate 10 has a fourth surface SF4 of the first portion PA1, a fifth surface SF5 of the second portion PA2, and a sixth surface SF6 of the third portion PA3 on the surface SF12 side.
  • the fourth surface SF4 and the fifth surface SF5 are respectively located closer to the surface SF11 than the sixth surface SF6.
  • the fourth surface SF4 and the fifth surface SF5 are located above the sixth surface SF6, thereby removing the portion SPa of the support substrate SP as shown in FIG. It becomes easy to insert a tool for peeling off the portion SPa between the portion ADa of the adhesive layer AD and the first portion PA1 and between the portion ADa and the second portion PA2. Therefore, it becomes possible to peel part SPa easily.
  • the conditions such as the number of scans of the laser beam LL3, the power, and the overlap in the process shown in FIG.
  • the part PA1, the second part PA2, and the third part PA3 are different from one another.
  • the number of times of irradiation of the first portion PA1 and the second portion PA2 of the laser beam LL3 is made larger than the number of times of irradiation of the third portion PA3.
  • FIG. 14A is a cross-sectional view of the display device DSP shown in FIG. 12 along the line CD.
  • FIG. 14B is a cross-sectional view of the display device DSP shown in FIG. 12 along the line EF.
  • FIG. 14C is a cross-sectional view of the display device DSP shown in FIG. 12 along the line GH.
  • the insulating substrate 10 has a slit SL1 at a first boundary BR1 between the first region AR1 and the third portion PA3, and the insulating substrate 10 has a slit SL1 between the second region AR2 and the third portion PA3. And a second slit SL2 at a second boundary BR2 between them.
  • the insulating substrate 10 has a film thickness T11 in the slit SL1 and a film thickness T12 in the slit SL2.
  • the sixth surface SF6 is located closer to the surface SF11 than the first surface SF1 and the second surface SF2.
  • the fourth film thickness T4 is smaller than each of the first film thickness T1 and the second film thickness T2.
  • the fourth surface SF4 is located closer to the surface SF11 than the first surface SF1 and the second surface SF2. Is the fourth film thickness T4 equal to or less than the film thickness T11 at the first boundary BR1 shown in FIG. 14 (b), and is it equal to the film thickness T12 at the second boundary BR2 shown in FIG. 14 (b)? It is less than that. That is, when the first portion PA1 is formed thinner than the third portion PA3 by laser light, the slit SL1 between the first portion PA1 and the first region AR1, and the first portion PA1 and the second region AR2 The slit SL2 between them disappears.
  • the fifth film thickness T5 is smaller than each of the first film thickness T1 and the second film thickness T2.
  • the fifth surface SF5 is located closer to the surface SF11 than the first surface SF1 and the second surface SF2. Is the fifth film thickness T5 equal to or less than the film thickness T11 at the first boundary BR1 shown in FIG. 14 (b), and is it equal to the film thickness T12 at the second boundary BR2 shown in FIG. 14 (b)? It is less than that. That is, when the second part PA2 is formed thinner than the third part PA3 by laser light, the slit SL1 between the second part PA2 and the first area AR1, and the second part PA2 and the second area AR2 The slit SL2 between them disappears.
  • FIG. 15 is a cross-sectional view of the display device DSP shown in FIG. 1 according to the third embodiment, taken along the YZ plane.
  • the end portions ADE1 and ADE2 of the first adhesive layer AD1 and the second adhesive layer AD2 are respectively recessed behind the first boundary BR1 and the second boundary BR2 It differs in the point which is doing.
  • the other configuration shown in FIG. 15 is the same as that shown in FIG.
  • the end ADE1 on the third area AR3 side of the first adhesive layer AD1 is located closer to the first area AR1 than the end SPE1 on the third area AR3 side of the first support substrate SP1.
  • the end ADE2 on the third area AR3 side of the second adhesive layer AD2 is located closer to the second area AR2 than the end SPE2 on the third area AR3 side of the second support substrate SP2.
  • both ends of the first adhesive layer AD1 and the second adhesive layer AD2 are retracted, but only one of them may be retracted. In that case, the end of the adhesive layer on the bending start side should be retracted, and in the present embodiment, the end ADE1 of the first adhesive layer AD1 should be retracted.
  • the supporting substrate SP is cut by irradiating the first boundary BR1 and the second boundary BR2 with the laser light LL2.
  • the adhesive layer AD contains a wavelength absorber. Therefore, the thermal sensitivity of the adhesive layer AD can be improved, and the amount of scraping of the adhesive layer AD with respect to the laser beam LL2 can be increased.
  • the laser beam LL2 has a wavelength of 266 to 10600 nm. More specifically, the laser beam LL2 has a wavelength of 266, 355, 532, 1064, 9300, 9600, 10600 nm.
  • a wavelength absorber optimum for the wavelength of the laser light LL2 as described above is used.
  • the insulating substrate 10 does not absorb the laser beam LL2 more than the adhesive layer AD. Therefore, the plasma and plume generated at the time of the irradiation of the laser beam LL2 tend to cut the adhesive layer AD perpendicularly to the irradiation direction of the laser beam LL2.
  • the irradiation direction of the laser beam LL2 is parallel to the third direction Z. That is, the plasma and the plume can scrape the adhesion layer AD in the direction along the XY plane. Therefore, the end ADE1 of the first adhesive layer AD1 and the end ADE2 of the second adhesive layer AD2 recede from the first boundary BR1 and the second boundary BR2.
  • a step of bending the bending area BA is performed.
  • the bending area BA is bent with the support member 9 as a base point while holding and pulling the second area AR2 of the insulating substrate 10.
  • the insulating substrate 10 may be extended to some extent, and the first area AR1 may also be bent.
  • tensile stress is also applied to the portion where the first support substrate SP1 and the insulating substrate 10 are bonded. Since the first support substrate SP1 is superior in strength to the insulating substrate 10, the stress applied when the first area AR1 is bent is large, and cracks of the inorganic film and disconnection of the signal wiring 6 are close to the display area DA. May occur.
  • the first area AR1 which is not supposed to be bent may also be bent. Then, cracks in the inorganic film and disconnection of the signal wiring 6 may occur.
  • the end ADE1 of the first adhesive layer AD1 and the end ADE2 of the second adhesive layer AD2 are respectively recessed relative to the first boundary BR1 and the second boundary BR2. Therefore, even if the first support substrate SP1 and the second support substrate SP2 are bent, the stress applied to the insulating substrate 10 can be relaxed. Therefore, the load on the display panel PNL at the time of bending can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
  • the adhesive layer AD is more easily scraped by the laser beam LL2 than the support substrate SP. There is almost no sticking of the layer AD. Therefore, the load on the display panel PNL when peeling off the portion SPa can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
  • the slits SL1 and SL2 formed in a straight line are provided at the first boundary BR1 and the second boundary BR2. Therefore, even if the support member 9 is not used or positional deviation occurs, the slits SL1 and SL2 can be used as a starting point for bending, so it is possible to suppress bending of a region not supposed to be bent. it can. Therefore, the load on the display panel PNL at the time of bending can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
  • the display panel PNL is, for example, a liquid crystal display panel including a first substrate SUB1, a second substrate SUB2, and a liquid crystal layer sandwiched between the first substrate SUB1 and the second substrate SUB2.
  • the display panel PNL may be a reflective type that displays an image by selectively reflecting light incident from the second substrate SUB2 side, or is incident from the first substrate SUB1 side. It may be of a transmission type that displays an image by selectively transmitting the light.
  • the main configuration of the present embodiment is substantially the same as in the case where the display device DSP is a liquid crystal display device.

Abstract

A display device which is provided with: an insulating substrate which has a first region that overlaps with a display region, a second region that overlaps with a plurality of pads that are aligned in a first direction, and a third region that is positioned between the first region and the second region; a signal wiring line which is formed on one surface of the insulating substrate so as to extend in a second direction that intersects with the first direction, and which is connected to the pads; a first supporting substrate which is arranged on the other surface of the insulating substrate, said other surface being on the reverse side of the above-described one surface, and which is bonded to the first region, with a first bonding layer being interposed therebetween; and a second supporting substrate which is bonded to the second region, with a second bonding layer being interposed therebetween. The insulating substrate has, in the other surface, a first slit which extends in the first direction at a first boundary between the first region and the third region, while having a second slit which extends in the first direction at a second boundary between the second region and the third region.

Description

表示装置Display device
 本発明の実施形態は、表示装置に関する。 Embodiments of the present invention relate to a display device.
 近年、液晶表示装置や有機EL(Organic Electroluminescence)表示装置等の表示装置の分野において、より一層の狭額縁化を実現する表示装置の要求が高まっている。また、柔軟性を有する基板を用いて形成されることにより、曲折することが可能なフレキシブル表示装置が開発されている。 In recent years, in the field of display devices such as liquid crystal display devices and organic EL (Organic Electroluminescence) display devices, there is an increasing demand for display devices that realize further narrowing of the frame. In addition, a flexible display device which can be bent by being formed using a flexible substrate has been developed.
 このような表示装置は、各画素に電圧を供給するために、表示領域の周辺の非表示領域において外部回路等に接続され電圧が供給されるパッド、パッドに接続される配線等を備えている。表示装置を狭額縁化するために、パッドが基板の背面に配置されるように、基板が折り曲げられた状態で電子機器等に収容される。 
 また、ガラス製の基板上に有機電界発光装置を製造した後に、ガラス製の基板を剥離し、剥離した部分にフレキシブルなバックプレートをラミネートする技術が知られている。
Such a display device is provided with a pad connected to an external circuit or the like in the non-display area around the display area to supply a voltage to each pixel, a wire connected to the pad, etc. . In order to narrow the frame of the display device, the substrate is accommodated in an electronic device or the like in a bent state such that the pad is disposed on the back surface of the substrate.
Moreover, after manufacturing an organic electroluminescent apparatus on a glass-made board | substrate, the technique which peels a glass-made board | substrate and laminates a flexible back plate on the peeled part is known.
特開2015-50181号公報JP, 2015-50181, A 特開2015-148728号公報JP 2015-148728 A 特開2014-232300号公報JP, 2014-232300, A
 本実施形態の目的は、歩留まりの低下を抑制することが可能な表示装置を提供することにある。 An object of the present embodiment is to provide a display device capable of suppressing a decrease in yield.
 本実施形態によれば、表示領域と重なる第1領域と、第1方向に並んで配置された複数のパッドと重なる第2領域と、前記第1領域と前記第2領域との間に位置する第3領域と、を有する絶縁基板と、前記絶縁基板の一方の面側に形成され、前記第1方向と交差する第2方向に延在し前記パッドに接続された信号配線と、前記絶縁基板の一方の面側とは反対側の他方の面側に配置され、第1接着層を介して前記第1領域に接着された第1支持基板と、第2接着層を介して前記第2領域に接着された第2支持基板と、を備え、前記絶縁基板は、前記他方の面側において、前記第1領域と前記第3領域との間の第1境界に前記第1方向に延在する第1スリットと、前記第2領域と前記第3領域との間の第2境界に前記第1方向に延在する第2スリットと、を有する、表示装置が提供される。 According to this embodiment, the first area overlapping the display area, the second area overlapping the plurality of pads arranged in the first direction, and the second area are positioned between the first area and the second area. An insulating substrate having a third region, a signal line formed on one surface of the insulating substrate, extending in a second direction intersecting the first direction, and connected to the pad; the insulating substrate A first support substrate disposed on the other surface side opposite to the one surface side of the first adhesive layer and adhered to the first area via the first adhesive layer, and the second area via the second adhesive layer A second support substrate bonded to the second support substrate, and the insulating substrate extends in the first direction to a first boundary between the first region and the third region on the other surface side A second slit extending in the first direction at a second boundary between the first slit, the second region, and the third region Tsu a preparative and, a display apparatus is provided.
 本実施形態によれば、表示領域と重なる第1領域と、第1方向に並んで配置された複数のパッドと重なる第2領域と、前記第1領域と前記第2領域との間に位置する第3領域と、を有する絶縁基板と、前記絶縁基板の一方の面側に形成され、前記第1方向と交差する第2方向に延在し前記パッドに接続された信号配線と、前記絶縁基板の一方の面側とは反対側の他方の面側に配置され、第1接着層を介して前記第1領域に接着された第1支持基板と、第2接着層を介して前記第2領域に接着された第2支持基板と、を備え、前記第3領域は、第1部分と、第2部分と、前記第1部分と前記第2部分との間に位置する第3部分と、を有し、前記信号配線は、前記第1領域から前記第2領域の前記パッドまで連続して形成されており、前記第3領域において、前記第3部分と重なる位置に形成されており、前記第3部分の膜厚は、前記第1部分の膜厚及び前記第2部分の膜厚よりも大きい、表示装置が提供される。 According to this embodiment, the first area overlapping the display area, the second area overlapping the plurality of pads arranged in the first direction, and the second area are positioned between the first area and the second area. An insulating substrate having a third region, a signal line formed on one surface of the insulating substrate, extending in a second direction intersecting the first direction, and connected to the pad; the insulating substrate A first support substrate disposed on the other surface side opposite to the one surface side of the first adhesive layer and adhered to the first area via the first adhesive layer, and the second area via the second adhesive layer And a third support substrate bonded to the second support substrate, the third region including a first portion, a second portion, and a third portion located between the first portion and the second portion. The signal line is continuously formed from the first area to the pad in the second area; In the display device, the display device is formed in a position overlapping with the third portion, and the film thickness of the third portion is larger than the film thickness of the first portion and the film thickness of the second portion. .
図1は、本実施形態に係る表示装置の構成を示す斜視図である。FIG. 1 is a perspective view showing a configuration of a display device according to the present embodiment. 図2は、図1に示した表示装置の表示領域を示す断面図である。FIG. 2 is a cross-sectional view showing a display area of the display device shown in FIG. 図3は、図1に示した表示装置のY-Z平面に沿った断面図である。FIG. 3 is a cross-sectional view of the display shown in FIG. 1 along the YZ plane. 図4は、第1実施形態に係る表示装置を示す平面図である。FIG. 4 is a plan view showing the display device according to the first embodiment. 図5は、絶縁基板から基板を剥離する工程を説明するための断面図である。FIG. 5 is a cross-sectional view for explaining the step of peeling the substrate from the insulating substrate. 図6は、接着層によって支持基板を貼り付ける工程を説明するための断面図である。FIG. 6 is a cross-sectional view for explaining a process of attaching a support substrate by an adhesive layer. 図7は、第1フレキシブル配線基板を表示パネルに圧着する工程を説明するための断面図である。FIG. 7 is a cross-sectional view for explaining the process of pressure bonding the first flexible wiring substrate to the display panel. 図8は、保護部材を形成する工程及び支持基板を切断する工程を説明するための断面図である。FIG. 8 is a cross-sectional view for explaining the step of forming the protective member and the step of cutting the support substrate. 図9は、第3領域において支持基板の部分及び接着層の部分を剥離する工程を説明するための断面図である。FIG. 9 is a cross-sectional view for explaining the step of peeling the portion of the support substrate and the portion of the adhesive layer in the third region. 図10は、表示パネルの折り曲げ領域を折り曲げる工程を説明するための断面図である。FIG. 10 is a cross-sectional view for explaining the step of bending the bending area of the display panel. 図11は、図10に示した折り曲げ領域を折り曲げた後の表示パネルを示す断面図である。FIG. 11 is a cross-sectional view showing the display panel after the bending area shown in FIG. 10 is bent. 図12は、第2実施形態に係る表示装置を示す平面図である。FIG. 12 is a plan view showing a display device according to the second embodiment. 図13は、図12に示した表示装置の線A-Bにおける断面図である。FIG. 13 is a cross-sectional view taken along line AB of the display device shown in FIG. 図14は、図12に示した表示装置の断面図である。FIG. 14 is a cross-sectional view of the display device shown in FIG. 図15は、第3実施形態に係る図1に示した表示装置のY-Z平面に沿った断面図である。FIG. 15 is a cross-sectional view along the YZ plane of the display device shown in FIG. 1 according to the third embodiment.
 以下、本実施形態について、図面を参照しながら説明する。なお、開示はあくまで一例に過ぎず、当業者において、発明の主旨を保っての適宜変更について容易に想到し得るものについては、当然に本発明の範囲に含有されるものである。また、図面は、説明をより明確にするため、実際の態様に比べて、各部の幅、厚さ、形状等について模式的に表される場合があるが、あくまで一例であって、本発明の解釈を限定するものではない。また、本明細書と各図において、既出の図に関して前述したものと同一又は類似した機能を発揮する構成要素には同一の参照符号を付し、重複する詳細な説明を適宜省略することがある。 Hereinafter, the present embodiment will be described with reference to the drawings. The disclosure is merely an example, and it is naturally included within the scope of the present invention as to what can be easily conceived of by those skilled in the art as to appropriate changes while maintaining the gist of the invention. In addition, the drawings may be schematically represented as to the width, thickness, shape, etc. of each portion as compared with the actual embodiment in order to clarify the description, but this is merely an example, and the present invention It does not limit the interpretation. In the specification and the drawings, components having the same or similar functions as those described above with reference to the drawings already described may be denoted by the same reference symbols, and overlapping detailed descriptions may be omitted as appropriate. .
 まず、第1実施形態に係る表示装置について詳細に説明する。 First, the display device according to the first embodiment will be described in detail.
 図1は、本実施形態に係る表示装置DSPの構成を示す斜視図である。以下、表示装置DSPが有機エレクトロルミネッセンス(EL)表示装置である場合について説明する。 
 図1は、第1方向Xと、第1方向Xに垂直な第2方向Yと、第1方向X及び第2方向Yに垂直な第3方向Zと、によって規定される三次元空間を示している。なお、第1方向X、第2方向Y、及び、第3方向Zは、互いに直交しているが、90°以外の角度で交差していてもよい。
FIG. 1 is a perspective view showing the configuration of a display device DSP according to the present embodiment. Hereinafter, the case where the display device DSP is an organic electroluminescence (EL) display device will be described.
FIG. 1 shows a three-dimensional space defined by a first direction X, a second direction Y perpendicular to the first direction X, and a third direction Z perpendicular to the first direction X and the second direction Y. ing. The first direction X, the second direction Y, and the third direction Z are orthogonal to each other, but may intersect at an angle other than 90 °.
 また、本実施形態においては、第3方向Zの矢印の先端に向かう方向を上と定義し、第3方向Zの矢印の先端に向かう方向とは反対側の方向を下と定義する。また、「第1部材の上の第2部材」及び「第1部材の下の第2部材」とした場合、第2部材は、第1部材に接していてもよく、又は第1部材から離れていてもよい。後者の場合、第1部材と第2部材との間に、第3部材が介在していてもよい。 Further, in the present embodiment, the direction toward the tip of the arrow in the third direction Z is defined as upper, and the direction opposite to the direction toward the tip of the arrow in the third direction Z is defined as downward. Further, in the case of “the second member on the first member” and “the second member below the first member”, the second member may be in contact with the first member or separated from the first member It may be In the latter case, a third member may be interposed between the first member and the second member.
 図1に示すように、表示装置DSPは、表示パネルPNL、第1フレキシブル配線基板FPC1、第2フレキシブル配線基板FPC2、第1支持基板SP1、第2支持基板SP2を備えている。 As shown in FIG. 1, the display device DSP includes a display panel PNL, a first flexible printed circuit FPC1, a second flexible printed circuit FPC2, a first support substrate SP1, and a second support substrate SP2.
 表示パネルPNLは、平板状の第1基板SUB1と、第1基板SUB1に対向配置された平板状の第2基板SUB2と、を備えている。また、表示パネルPNLは、画像を表示する表示領域DAと、表示領域DAを囲む非表示領域NDAと、を備えている。表示パネルPNLは、表示領域DAにおいて、複数の画素PXを備えている。複数の画素PXは、第1方向X及び第2方向Yに並べられ、マトリクス状に設けられている。 The display panel PNL includes a flat first substrate SUB1 and a flat second substrate SUB2 opposite to the first substrate SUB1. The display panel PNL also includes a display area DA for displaying an image and a non-display area NDA surrounding the display area DA. The display panel PNL includes a plurality of pixels PX in the display area DA. The plurality of pixels PX are arranged in the first direction X and the second direction Y, and are provided in a matrix.
 第1基板SUB1は、第2基板SUB2と重なる領域よりも外側に延出した領域において端子部T及び折り曲げ領域BAを有している。第1基板SUB1の3つの側縁は、第3方向Zにおいて、第2基板SUB2の3つの側縁と揃っている。第1基板SUB1の第1方向Xに平行な側縁の長さは、第2基板SUB2の第1方向Xに平行な側縁の長さと略等しい。また、第1基板SUB1の第2方向Yに平行な側縁の長さは、第2基板SUB2の第2方向Yに平行な側縁の長さより大きい。つまり、第1基板SUB1のX-Y平面に平行な面積は、第2基板SUB2のX-Y平面に平行な面積より大きい。ここで、X-Y平面は、第1方向Xと第2方向Yとで規定される平面である。 The first substrate SUB1 has a terminal portion T and a bending area BA in the area extending outward beyond the area overlapping the second substrate SUB2. The three side edges of the first substrate SUB1 are aligned with the three side edges of the second substrate SUB2 in the third direction Z. The length of the side edge parallel to the first direction X of the first substrate SUB1 is substantially equal to the length of the side edge parallel to the first direction X of the second substrate SUB2. Further, the length of the side edge of the first substrate SUB1 parallel to the second direction Y is larger than the length of the side edge parallel to the second direction Y of the second substrate SUB2. That is, the area parallel to the XY plane of the first substrate SUB1 is larger than the area parallel to the XY plane of the second substrate SUB2. Here, the XY plane is a plane defined by the first direction X and the second direction Y.
 図示した例では、第1フレキシブル配線基板FPC1は、非表示領域NDAにおいて、端子部Tの上に実装されている。図示した例では、第1フレキシブル配線基板FPC1の第1方向Xに平行な側縁の長さは、第1基板SUB1及び第2基板SUB2の第1方向Xに平行な側縁の長さと比べて小さいが、同等であっても良い。第1フレキシブル配線基板FPC1は、表示パネルPNLと電気的に接続されている。第2フレキシブル配線基板FPC2は、第1フレキシブル配線基板FPC1の下に実装され、第1フレキシブル配線基板FPC1と電気的に接続されている。 In the illustrated example, the first flexible printed circuit FPC1 is mounted on the terminal portion T in the non-display area NDA. In the illustrated example, the length of the side edge parallel to the first direction X of the first flexible wiring board FPC1 is compared to the length of the side edge parallel to the first direction X of the first substrate SUB1 and the second substrate SUB2. It may be small but equal. The first flexible printed circuit FPC1 is electrically connected to the display panel PNL. The second flexible printed circuit FPC2 is mounted under the first flexible printed circuit FPC1 and is electrically connected to the first flexible printed circuit FPC1.
 折り曲げ領域BAは、非表示領域NDA内で、端子部Tと表示領域DAとの間に位置している。折り曲げ領域BAは、表示装置DSPが電子機器等の筐体に収容される際に折り曲げられる領域に相当し、図中に斜線で示されている。すなわち、第1フレキシブル配線基板FPC1、第2フレキシブル配線基板FPC2が表示領域DAの下側に配置されるように、折り曲げ領域BAが折り曲げられる。 The bending area BA is located between the terminal portion T and the display area DA in the non-display area NDA. The bending area BA corresponds to an area to be bent when the display device DSP is accommodated in a housing of an electronic device or the like, and is shown by oblique lines in the drawing. That is, the bending area BA is bent so that the first flexible wiring board FPC1 and the second flexible wiring board FPC2 are disposed below the display area DA.
 第1支持基板SP1及び第2支持基板SP2は、表示パネルPNLの下に貼り付けられている。第1支持基板SP1は、第3方向Zに表示領域DAと重なっている。第2支持基板SP2は、第3方向Zに端子部Tと重なっている。第1支持基板SP1及び第2支持基板SP2は、第3方向Zに折り曲げ領域BAと重なる位置には配置されていない。 The first support substrate SP1 and the second support substrate SP2 are attached below the display panel PNL. The first support substrate SP1 overlaps the display area DA in the third direction Z. The second support substrate SP2 overlaps the terminal portion T in the third direction Z. The first support substrate SP1 and the second support substrate SP2 are not arranged at positions overlapping the bending area BA in the third direction Z.
 図2は、図1に示した表示装置DSPの表示領域DAを示す断面図である。 
 図2に示すように、表示パネルPNLは、絶縁基板10、スイッチング素子SW1、SW2、SW3、反射層4、有機EL素子OLED1、OLED2、OLED3、封止層41、第1支持基板SP1、第1接着層AD1、接着層GL、フィルムFL等を備えている。このような有機エレクトロルミネッセンス表示装置においては、第1基板SUB1は、絶縁基板10、スイッチング素子SW1、SW2、SW3、反射層4、有機EL素子OLED1、OLED2、OLED3、封止層41、第1接着層AD1、第1支持基板SP1によって構成され、第2基板SUB2は、フィルムFLによって構成され、第1基板SUB1及び第2基板SUB2は、接着層GLによって互いに接着されているものとする。
FIG. 2 is a cross-sectional view showing a display area DA of the display device DSP shown in FIG.
As shown in FIG. 2, the display panel PNL includes the insulating substrate 10, the switching elements SW 1, SW 2, SW 3, the reflective layer 4, the organic EL elements OLED 1, OLED 2, OLED 3, the sealing layer 41, the first support substrate SP 1, the first. An adhesive layer AD1, an adhesive layer GL, a film FL and the like are provided. In such an organic electroluminescence display device, the first substrate SUB1 includes the insulating substrate 10, the switching elements SW1, SW2, SW3, the reflective layer 4, the organic EL elements OLED1, OLED2, OLED3, the sealing layer 41, the first adhesion The layer AD1, the first support substrate SP1, the second substrate SUB2 is a film FL, and the first substrate SUB1 and the second substrate SUB2 are bonded to each other by the adhesive layer GL.
 絶縁基板10は、有機絶縁材料を用いて形成され、例えば、ポリイミドを用いて形成される。また、絶縁基板10は、ポリイミドを用いて形成された単層であっても良いし、ポリイミドを用いて形成された層、無機膜、ポリイミドを用いて形成された層が順に積層された積層体であっても良い。絶縁基板10は、一方の面SF11と、一方の面とは反対側の他方の面SF12と、を有している。絶縁基板10の一方の面SF11は、第1絶縁膜11によって覆われている。 The insulating substrate 10 is formed using an organic insulating material, and is formed using, for example, polyimide. The insulating substrate 10 may be a single layer formed of polyimide, or a laminated body in which a layer formed of polyimide, an inorganic film, and a layer formed of polyimide are sequentially laminated. It may be The insulating substrate 10 has one surface SF11 and the other surface SF12 opposite to the one surface. One surface SF <b> 11 of the insulating substrate 10 is covered with the first insulating film 11.
 スイッチング素子SW1、SW2、SW3は、第1絶縁膜11の上に形成されている。図示した例では、スイッチング素子SW1、SW2、SW3はトップゲート型の薄膜トランジスタで構成されているが、ボトムゲート型の薄膜トランジスタで構成されていても良い。スイッチング素子SW1、SW2、SW3は、同一構成であるため、以下、スイッチング素子SW1に着目してその構造をより詳細に説明する。スイッチング素子SW1は、第1絶縁膜11の上に形成された半導体層SCを備えている。半導体層SCは、第2絶縁膜12によって覆われている。また、第2絶縁膜12は、第1絶縁膜11の上にも配置されている。 The switching elements SW1, SW2, and SW3 are formed on the first insulating film 11. In the illustrated example, the switching elements SW1, SW2, and SW3 are formed of top gate thin film transistors, but may be formed of bottom gate thin film transistors. Since the switching elements SW1, SW2, and SW3 have the same configuration, the structure will be described in more detail focusing on the switching element SW1. The switching element SW1 includes a semiconductor layer SC formed on the first insulating film 11. The semiconductor layer SC is covered by the second insulating film 12. The second insulating film 12 is also disposed on the first insulating film 11.
 スイッチング素子SW1のゲート電極WGは、第2絶縁膜12の上に形成され、半導体層SCの直上に位置している。ゲート電極WGは、第3絶縁膜13によって覆われている。また、第3絶縁膜13は、第2絶縁膜12の上にも配置されている。 The gate electrode WG of the switching element SW1 is formed on the second insulating film 12, and is located directly on the semiconductor layer SC. The gate electrode WG is covered by the third insulating film 13. The third insulating film 13 is also disposed on the second insulating film 12.
 このような第1絶縁膜11、第2絶縁膜12、及び、第3絶縁膜13は、例えば、シリコン酸化物やシリコン窒化物等の無機系材料によって形成されている。 The first insulating film 11, the second insulating film 12, and the third insulating film 13 are made of, for example, an inorganic material such as silicon oxide or silicon nitride.
 スイッチング素子SW1のソース電極WS及びドレイン電極WDは、第3絶縁膜13の上に形成されている。ソース電極WS及びドレイン電極WDは、それぞれ第2絶縁膜12及び第3絶縁膜13を貫通するコンタクトホールを通して半導体層SCと電気的に接続されている。スイッチング素子SW1は、第4絶縁膜14によって覆われている。第4絶縁膜14は、第3絶縁膜13の上にも配置されている。このような第4絶縁膜14は、例えば、透明な樹脂等の有機系材料によって形成されている。 The source electrode WS and the drain electrode WD of the switching element SW1 are formed on the third insulating film 13. The source electrode WS and the drain electrode WD are electrically connected to the semiconductor layer SC through contact holes penetrating the second insulating film 12 and the third insulating film 13, respectively. The switching element SW1 is covered by the fourth insulating film 14. The fourth insulating film 14 is also disposed on the third insulating film 13. Such a fourth insulating film 14 is formed of, for example, an organic material such as a transparent resin.
 反射層4は、第4絶縁膜14の上に形成されている。反射層4は、アルミニウムや銀等の光反射率が高い金属材料で形成される。なお、反射層4の上面は、平坦面であっても良いし、光散乱性を付与するための凹凸面であっても良い。 The reflective layer 4 is formed on the fourth insulating film 14. The reflective layer 4 is formed of a metal material having a high light reflectance, such as aluminum or silver. The upper surface of the reflective layer 4 may be a flat surface or may be an uneven surface for imparting light scattering properties.
 有機EL素子OLED1乃至OLED3は、第4絶縁膜14の上に形成されている。すなわち、有機EL素子OLED1乃至OLED3は、絶縁基板10とフィルムFLとの間に位置している。図示した例では、有機EL素子OLED1はスイッチング素子SW1と電気的に接続され、有機EL素子OLED2はスイッチング素子SW2と電気的に接続され、有機EL素子OLED3はスイッチング素子SW3と電気的に接続されている。有機EL素子OLED1乃至OLED3は、それぞれフィルムFLの側に向かって青色光、緑色光、赤色光を放射するトップエミッションタイプとして構成されている。このような有機EL素子OLED1乃至OLED3は、いずれも同一構造である。図示した例では、有機EL素子OLED1乃至OLED3は、それぞれリブ15によって区画されている。 The organic EL elements OLED1 to OLED3 are formed on the fourth insulating film 14. That is, the organic EL elements OLED1 to OLED3 are located between the insulating substrate 10 and the film FL. In the illustrated example, the organic EL element OLED1 is electrically connected to the switching element SW1, the organic EL element OLED2 is electrically connected to the switching element SW2, and the organic EL element OLED3 is electrically connected to the switching element SW3. There is. The organic EL elements OLED1 to OLED3 are configured as top emission types that emit blue light, green light, and red light toward the side of the film FL, respectively. All such organic EL elements OLED1 to OLED3 have the same structure. In the illustrated example, the organic EL elements OLED1 to OLED3 are partitioned by the ribs 15, respectively.
 有機EL素子OLED1は、反射層4の上に形成された画素電極PE1を備えている。画素電極PE1は、スイッチング素子SW1のドレイン電極WDとコンタクトし、スイッチング素子SW1と電気的に接続されている。同様に、有機EL素子OLED2はスイッチング素子SW2と電気的に接続された画素電極PE2を備え、有機EL素子OLED3はスイッチング素子SW3と電気的に接続された画素電極PE3を備えている。画素電極PE1、PE2、PE3は、例えば、インジウム・ティン・オキサイド(ITO)やインジウム・ジンク・オキサイド(IZO)等の透明な導電材料によって形成されている。 The organic EL element OLED1 includes a pixel electrode PE1 formed on the reflective layer 4. The pixel electrode PE1 is in contact with the drain electrode WD of the switching element SW1 and is electrically connected to the switching element SW1. Similarly, the organic EL element OLED2 includes a pixel electrode PE2 electrically connected to the switching element SW2, and the organic EL element OLED3 includes a pixel electrode PE3 electrically connected to the switching element SW3. The pixel electrodes PE1, PE2 and PE3 are formed of, for example, a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO).
 例えば、有機EL素子OLED1は青色に発光する有機発光層ORGBを備え、有機EL素子OLED2は緑色に発光する有機発光層ORGGを備え、有機EL素子OLED3は赤色に発光する有機発光層ORGRを備えている。有機発光層ORGBは、画素電極PE1の上に位置し、有機発光層ORGGは、画素電極PE2の上に位置し、有機発光層ORGRは、画素電極PE3の上に位置している。また、有機EL素子OLED1乃至OLED3は、共通電極CEを備えている。共通電極CEは、有機発光層ORGB,ORGG、ORGRの上に位置している。共通電極CEは、リブ15の上にも位置している。画素電極PE及び共通電極CEのうち、一方が陽極であり、他方が陰極である。共通電極CEは、例えば、ITOやIZO等の透明な導電材料によって形成されている。 For example, the organic EL element OLED1 comprises an organic light emitting layer ORGB emitting blue light, the organic EL element OLED2 comprises an organic light emitting layer ORGG emitting green, and the organic EL element OLED3 comprises an organic light emitting layer ORGR emitting red There is. The organic light emitting layer ORGB is located on the pixel electrode PE1, the organic light emitting layer ORGG is located on the pixel electrode PE2, and the organic light emitting layer ORGR is located on the pixel electrode PE3. In addition, the organic EL elements OLED1 to OLED3 are provided with the common electrode CE. The common electrode CE is located on the organic light emitting layers ORGB, ORGG, ORGR. The common electrode CE is also located on the rib 15. One of the pixel electrode PE and the common electrode CE is an anode, and the other is a cathode. The common electrode CE is formed of, for example, a transparent conductive material such as ITO or IZO.
 封止層41は、有機EL素子OLED1、OLED2、OLED3の上を覆っている。封止層41は、絶縁基板10との間に配置された部材を封止している。封止層41は、有機EL素子OLED1、OLED2、OLED3への酸素や水分の侵入を抑制し、有機EL素子OLED1、OLED2、OLED3の劣化を抑制する。なお、封止層41は、無機膜と有機膜の積層体から構成されていても良い。 The sealing layer 41 covers the top of the organic EL elements OLED1, OLED2, and OLED3. The sealing layer 41 seals a member disposed between the insulating substrate 10 and the sealing layer 41. The sealing layer 41 suppresses the entry of oxygen and moisture into the organic EL elements OLED1, OLED2, and OLED3, and suppresses the deterioration of the organic EL elements OLED1, OLED2, and OLED3. The sealing layer 41 may be formed of a laminate of an inorganic film and an organic film.
 フィルムFLは、封止層41の上に配置されている。フィルムFLは、例えば、保護フィルム、光学フィルム等であり、透明な材料を用いて形成されている。フィルムFLは、接着層GLによって封止層41に接着されている。接着層GLは、例えば、アクリル系材料、エポキシ系材料、ポリイミドの何れかを用いて形成されている。 The film FL is disposed on the sealing layer 41. The film FL is, for example, a protective film, an optical film, or the like, and is formed using a transparent material. The film FL is adhered to the sealing layer 41 by the adhesive layer GL. The adhesive layer GL is formed using, for example, any of an acrylic material, an epoxy material, and a polyimide.
 第1支持基板SP1は、第1接着層AD1によって絶縁基板10の面SF12に接着されている。第1支持基板SP1の材料としては、例えば、耐熱性、ガス遮断性、防湿性、強度に優れ、尚且つ安価な材料が好ましい。第1支持基板SP1は、例えば、表示装置DSPを製造する過程でのプロセス温度にて変質、変形しない程度の耐熱性を有する。また、第1支持基板SP1は、例えば、絶縁基板10より大きな強度を有し、表示パネルPNLが外部からの応力がかからない状態にて湾曲する事態を抑制する支持層として機能する。また、第1支持基板SP1は、例えば、絶縁基板10への水分等の侵入を抑制する防湿性やガスの侵入を抑制するガス遮断性等を有し、バリア層として機能する。第1支持基板SP1は、例えば、ポリエチレンテレフタラートを用いて形成されたフィルムである。なお、図1に示した第2支持基板SP2も第1支持基板SP1と同様の材料を用いて形成される。 The first support substrate SP1 is bonded to the surface SF12 of the insulating substrate 10 by the first adhesive layer AD1. As a material of the first support substrate SP1, for example, a material which is excellent in heat resistance, gas barrier property, moisture resistance, and strength and is inexpensive is preferable. The first support substrate SP1 has, for example, heat resistance that does not deteriorate or deform at the process temperature in the process of manufacturing the display device DSP. In addition, the first support substrate SP1 has, for example, a strength higher than that of the insulating substrate 10, and functions as a support layer that suppresses a situation where the display panel PNL is bent in the state where no external stress is applied. In addition, the first support substrate SP1 has, for example, a moisture-proof property that suppresses the entry of moisture and the like into the insulating substrate 10, a gas blocking property that suppresses the entry of gas, and the like, and functions as a barrier layer. The first support substrate SP1 is, for example, a film formed using polyethylene terephthalate. The second support substrate SP2 shown in FIG. 1 is also formed using the same material as the first support substrate SP1.
 このような表示装置DSPにおいては、有機EL素子OLED1乃至OLED3のそれぞれが発光した際、有機EL素子OLED1は青色の光を出射し、有機EL素子OLED2は緑色の光を出射し、有機EL素子OLED3は赤色の光を出射する。そのため、表示装置DSPのカラー表示が実現される。 In such a display device DSP, when each of the organic EL elements OLED1 to OLED3 emits light, the organic EL element OLED1 emits blue light, and the organic EL element OLED2 emits green light, and the organic EL element OLED3 Emits red light. Therefore, color display of the display device DSP is realized.
 図1に示した画素PXは、例えば、カラー画像を構成する最小単位であり、上記の有機EL素子OLED1乃至OLED3を備えている。 The pixel PX shown in FIG. 1 is, for example, the smallest unit constituting a color image, and includes the above-described organic EL elements OLED1 to OLED3.
 なお、上記の構成例では、有機EL素子OLED1乃至OLED3はそれぞれ青色に発光する有機発光層ORGB、緑色に発光する有機発光層ORGG、赤色に発光する有機発光層ORGRを備えていたが、これに限定されるものではない。有機EL素子OLED1乃至OLED3は共通の有機発光層を備えていても良い。このとき、例えば、有機EL素子OLED1乃至OLED3は、白色光を出射する。このような構成例においては、カラーフィルタ層が、封止層41の上に配置される。 In the above configuration example, the organic EL elements OLED1 to OLED3 respectively include the organic light emitting layer ORGB emitting blue light, the organic light emitting layer ORGG emitting green light, and the organic light emitting layer ORGR emitting red light. It is not limited. The organic EL elements OLED1 to OLED3 may be provided with a common organic light emitting layer. At this time, for example, the organic EL elements OLED1 to OLED3 emit white light. In such a configuration example, the color filter layer is disposed on the sealing layer 41.
 図3は、図1に示した表示装置DSPのY-Z平面に沿った断面図である。 
 絶縁基板10は、表示領域DAと重なる第1領域AR1と、端子部Tと重なる第2領域AR2と、第1領域AR1と第2領域AR2との間に位置する第3領域AR3と、を有している。第3領域AR3は、折り曲げ領域BAと重なる領域に相当する。絶縁基板10は、第1領域AR1において第1膜厚T1と、第2領域AR2において第2膜厚T2と、第3領域AR3において第3膜厚T3と、を有している。また、絶縁基板10は、面SF12側において、第1領域AR1と第3領域AR3との間の第1境界BR1においてスリットSL1と、第2領域AR2と第3領域AR3との間の第2境界BR2においてスリットSL2と、を有している。スリットSL1及びスリットSL2は、それぞれ第1境界BR1及び第2境界BR2に沿って、一直線状に形成されている。絶縁基板10は、スリットSL1において膜厚T11と、スリットSL2において膜厚T12と、を有している。第1膜厚T1及び第2膜厚T2は、それぞれ第3膜厚T3よりも大きい。第1膜厚T1及び第2膜厚T2は互いに等しい。膜厚T11及びT12は、それぞれ第3膜厚T3よりも小さい。
FIG. 3 is a cross-sectional view of the display device DSP shown in FIG. 1 along the YZ plane.
The insulating substrate 10 has a first area AR1 overlapping the display area DA, a second area AR2 overlapping the terminal T, and a third area AR3 located between the first area AR1 and the second area AR2. doing. The third area AR3 corresponds to an area overlapping the bending area BA. The insulating substrate 10 has a first film thickness T1 in the first region AR1, a second film thickness T2 in the second region AR2, and a third film thickness T3 in the third region AR3. In addition, insulating substrate 10 has slit SL1 at the first boundary BR1 between first region AR1 and third region AR3 on the side of surface SF12, and the second boundary between second region AR2 and third region AR3. And a slit SL2 in BR2. The slit SL1 and the slit SL2 are formed in a straight line along the first boundary BR1 and the second boundary BR2, respectively. The insulating substrate 10 has a film thickness T11 in the slit SL1 and a film thickness T12 in the slit SL2. The first film thickness T1 and the second film thickness T2 are respectively larger than the third film thickness T3. The first film thickness T1 and the second film thickness T2 are equal to each other. The film thicknesses T11 and T12 are respectively smaller than the third film thickness T3.
 絶縁基板10は、面SF12側において、第1領域AR1の第1面SF1と、第2領域AR2の第2面SF2と、第3領域AR3の第3面SF3と、を有している。第3面SF3は、第1面SF1と第2面SF2との間に位置している。第3面SF3は、第1面SF1及び第2面SF2より、面SF11側に位置している。 The insulating substrate 10 has the first surface SF1 of the first region AR1, the second surface SF2 of the second region AR2, and the third surface SF3 of the third region AR3 on the surface SF12 side. The third surface SF3 is located between the first surface SF1 and the second surface SF2. The third surface SF3 is located closer to the surface SF11 than the first surface SF1 and the second surface SF2.
 第1支持基板SP1及び第2支持基板SP2は、絶縁基板10の面SF12側に配置されている。第1支持基板SP1は、第1接着層AD1を介して第1領域AR1の第1面SF1に接着されている。第2支持基板SP2は、第2接着層AD2を介して第2領域AR2の第2面SF2に接着されている。 The first support substrate SP1 and the second support substrate SP2 are disposed on the surface SF12 side of the insulating substrate 10. The first support substrate SP1 is bonded to the first surface SF1 of the first area AR1 via the first adhesive layer AD1. The second support substrate SP2 is bonded to the second surface SF2 of the second area AR2 via the second adhesive layer AD2.
 後述するが、絶縁基板10は、第1方向Xに延出した端部EG4を有している。図示した例では、第1絶縁膜11及び第2絶縁膜12は、絶縁基板10の端部EG4と重なる位置まで第2方向Yに延出している。第3絶縁膜13は、第1境界BR1と重なる位置まで第2方向Yに延出していない。 Although described later, the insulating substrate 10 has an end EG4 extending in the first direction X. In the illustrated example, the first insulating film 11 and the second insulating film 12 extend in the second direction Y to a position overlapping the end EG 4 of the insulating substrate 10. The third insulating film 13 does not extend in the second direction Y to a position overlapping the first boundary BR1.
 信号配線6は、第2絶縁膜12及び第3絶縁膜13の上に配置されている。すなわち、信号配線6は、絶縁基板10の面SF11側に配置されている。信号配線6は、第1領域AR1から第2領域AR2のパッドまで連続して配置されている。また、信号配線6は、第1領域AR1、第2領域AR2、及び、第3領域AR3と重なっている。信号配線6は、例えば、チタン、アルミニウム、チタンの積層体で形成されている。信号配線6は、電源線や各種制御用配線等に相当する。 The signal wiring 6 is disposed on the second insulating film 12 and the third insulating film 13. That is, the signal wiring 6 is disposed on the surface SF11 side of the insulating substrate 10. The signal wiring 6 is continuously arranged from the first area AR1 to the pad of the second area AR2. In addition, the signal wiring 6 overlaps the first area AR1, the second area AR2, and the third area AR3. The signal wiring 6 is formed of, for example, a laminated body of titanium, aluminum, and titanium. The signal lines 6 correspond to power supply lines, various control lines, and the like.
 第4絶縁膜14は、信号配線6を覆っている。第4絶縁膜14は、信号配線6まで貫通するコンタクトホールCHを有している。 The fourth insulating film 14 covers the signal wiring 6. The fourth insulating film 14 has a contact hole CH penetrating to the signal wiring 6.
 パッドPDは、第4絶縁膜14の上に配置され、コンタクトホールCH内にも配置されている。また、パッドPDは、第2領域AR2と重なる位置に配置されている。パッドPDは、コンタクトホールCH内において信号配線6と電気的に接続されている。パッドPDは、例えば、図2に示した画素電極PE1、PE2、PE3と同一工程で同一材料にて形成され、ITOやIZO等を用いて形成される。 The pad PD is disposed on the fourth insulating film 14 and also disposed in the contact hole CH. Further, the pad PD is disposed at a position overlapping with the second area AR2. The pad PD is electrically connected to the signal wiring 6 in the contact hole CH. The pad PD is formed of, for example, the same material and in the same process as the pixel electrodes PE1, PE2, and PE3 illustrated in FIG. 2, and is formed using ITO, IZO, or the like.
 なお、信号配線6及びパッドPDは、両者が同層に配置されていても良い。このとき、信号配線6及びパッドPDは、それぞれ別々に形成されていても良いし、一体的に形成されていても良い。また、図示したように、信号配線6及びパッドPDが互いに異なる層に配置され、信号配線6とパッドPDとの間の層間絶縁膜に形成されたコンタクトホールを介して両者が電気的に接続されていても良い。 Note that both of the signal wiring 6 and the pad PD may be disposed in the same layer. At this time, the signal wiring 6 and the pad PD may be separately formed or may be integrally formed. Further, as shown in the figure, signal interconnection 6 and pad PD are arranged in different layers, and both are electrically connected through a contact hole formed in the interlayer insulating film between signal interconnection 6 and pad PD. May be
 リブ15、封止層41、接着層GL、フィルムFLは、第1領域AR1と重なる位置に配置され、第2領域AR2と重なる位置までは延出していない。封止層41は、リブ15を覆い、第4絶縁膜14にも接している。接着層GLは、封止層41を覆い、第4絶縁膜14にも接している。 The rib 15, the sealing layer 41, the adhesive layer GL, and the film FL are disposed at positions overlapping the first area AR1 and do not extend to positions overlapping the second area AR2. The sealing layer 41 covers the rib 15 and is also in contact with the fourth insulating film 14. The adhesive layer GL covers the sealing layer 41 and is also in contact with the fourth insulating film 14.
 第1フレキシブル配線基板FPC1は、第4絶縁膜14の上で表示パネルPNLに実装されている。すなわち、第1フレキシブル配線基板FPC1は、絶縁基板10の面SF11側で第2領域AR2と重なる位置に実装されている。第1フレキシブル配線基板FPC1は、コア基板200と、コア基板200の下面側に配置された接続配線100と、コア基板200の上面側に配置された駆動ICチップ3と、を備えている。駆動ICチップ3は、表示パネルPNLを駆動するのに必要な信号を供給する信号供給源等として機能する。なお、駆動ICチップ3の位置は、特に制限されるものではなく、コア基板200の下面側に配置されていても良い。 The first flexible printed circuit FPC1 is mounted on the display panel PNL on the fourth insulating film 14. That is, the first flexible printed circuit FPC1 is mounted at a position overlapping the second region AR2 on the surface SF11 side of the insulating substrate 10. The first flexible printed circuit FPC 1 includes the core substrate 200, the connection wiring 100 disposed on the lower surface side of the core substrate 200, and the drive IC chip 3 disposed on the upper surface side of the core substrate 200. The drive IC chip 3 functions as a signal supply source or the like that supplies signals necessary to drive the display panel PNL. The position of the drive IC chip 3 is not particularly limited, and may be disposed on the lower surface side of the core substrate 200.
 表示パネルPNL及び第1フレキシブル配線基板FPC1は、導電材料である異方性導電膜8を介して互いに電気的に接続されると共に接着されている。異方性導電膜8は、接着剤中に分散された導電粒子を含んでいる。異方性導電膜8は、パッドPDと接し、電気的に接続されている。また、異方性導電膜8は、接続配線100と接し、電気的に接続されている。これにより、接続配線100は、異方性導電膜8を介して、パッドPD及び信号配線6と電気的に接続されている。 The display panel PNL and the first flexible printed circuit FPC1 are electrically connected to and bonded to each other through an anisotropic conductive film 8 which is a conductive material. The anisotropic conductive film 8 contains conductive particles dispersed in an adhesive. The anisotropic conductive film 8 is in contact with the pad PD and electrically connected. The anisotropic conductive film 8 is in contact with the connection wiring 100 and is electrically connected. Thus, the connection wiring 100 is electrically connected to the pad PD and the signal wiring 6 via the anisotropic conductive film 8.
 保護部材PTは、折り曲げ領域BAと重なる位置において第4絶縁膜14の上に配置されている。図示した例では、保護部材PTは、第1フレキシブル配線基板FPC1の上面US1と側面SD1、フィルムFLの上面US2と側面SD2、接着層GLの側面SD3等に接している。保護部材PTを配置することによって、第1フレキシブル配線基板FPC1とフィルムFLとの間において絶縁基板10の厚さを補強することができる。保護部材PTは、例えば、樹脂を用いて形成されている。 The protective member PT is disposed on the fourth insulating film 14 at a position overlapping with the bending area BA. In the illustrated example, the protection member PT is in contact with the upper surface US1 and the side surface SD1 of the first flexible printed circuit FPC1, the upper surface US2 and the side surface SD2 of the film FL, the side surface SD3 of the adhesive layer GL, and the like. By arranging the protective member PT, the thickness of the insulating substrate 10 can be reinforced between the first flexible printed circuit FPC1 and the film FL. The protective member PT is formed of, for example, a resin.
 図4は、第1実施形態に係る表示装置DSPを示す平面図である。図4は、第1領域AR1、第2領域AR2、及び、第3領域AR3の位置関係等を示している。 
 絶縁基板10は、第2方向Yに延出した第1端部EG1及び第2端部EG2と、第1方向Xに延出した第3端部EG3及び第4端部EG4と、を有している。第2端部EG2は、表示領域DAを挟んで第1端部EG1の反対側に位置している。第4端部EG4は、表示領域DAを挟んで第3端部EG3の反対側に位置している。
FIG. 4 is a plan view showing the display device DSP according to the first embodiment. FIG. 4 shows the positional relationship and the like of the first area AR1, the second area AR2, and the third area AR3.
The insulating substrate 10 has a first end EG1 and a second end EG2 extending in the second direction Y, and a third end EG3 and a fourth end EG4 extending in the first direction X. ing. The second end EG2 is located on the opposite side of the first end EG1 across the display area DA. The fourth end EG4 is located on the opposite side of the third end EG3 across the display area DA.
 図4において、第1領域AR1は、左上がりの斜線で示されており、第2領域AR2は、右上がりの斜線で示されている。第3領域AR3は、折り曲げ領域BAと重なり、第1領域AR1と第2領域AR2との間に位置し、第1方向Xに沿って第1端部EG1から第2端部EG2へ延出している。第1領域AR1、第3領域AR3、及び、第2領域AR2は、この順に第2方向Yに並んでいる。第1領域AR1は、平面視で、第1支持基板SP1と重なる領域に相当し、第2領域AR2は、平面視で、第2支持基板SP2と重なる領域に相当し、第3領域AR3は、平面視で、第1支持基板SP1及び第2支持基板SP2と重ならない領域に相当する。複数のパッドPDは、平面視で、第2領域AR2に重なり、第1方向Xに並んで配置されている。複数の信号配線6は、それぞれパッドPDに接続され、折り曲げ領域BAにおいて第2方向Yに延出し、第1方向Xに並んで配置されている。スリットSL1は、第1境界BR1において第1方向Xに延在している。スリットSL2は、第2境界BR2において第1方向Xに延在している。 In FIG. 4, the first area AR <b> 1 is indicated by diagonal lines rising to the left, and the second area AR <b> 2 is indicated by diagonal lines rising to the right. The third area AR3 overlaps the bending area BA, is located between the first area AR1 and the second area AR2, and extends from the first end EG1 to the second end EG2 along the first direction X There is. The first area AR1, the third area AR3 and the second area AR2 are arranged in the second direction Y in this order. The first area AR1 corresponds to an area overlapping with the first support substrate SP1 in plan view, the second area AR2 corresponds to an area overlapping with the second support substrate SP2 in plan view, and the third area AR3 is This corresponds to a region not overlapping with the first support substrate SP1 and the second support substrate SP2 in plan view. The plurality of pads PD overlap the second area AR2 in plan view, and are arranged side by side in the first direction X. The plurality of signal lines 6 are respectively connected to the pads PD, extend in the second direction Y in the bending area BA, and are arranged side by side in the first direction X. The slit SL1 extends in the first direction X at the first boundary BR1. The slit SL2 extends in the first direction X at the second boundary BR2.
 なお、図示した例では、X-Y平面における表示パネルPNLの外形は矩形状であるが、表示パネルPNLの四隅が丸められたラウンド状であっても良い。 In the illustrated example, the outer shape of the display panel PNL in the XY plane is rectangular, but it may be a round shape in which the four corners of the display panel PNL are rounded.
 次に、本実施形態の表示装置DSPの製造工程について、図5から図11までを参照して説明する。 Next, the manufacturing process of the display device DSP of the present embodiment will be described with reference to FIG. 5 to FIG.
 図5は、絶縁基板10から基板7を剥離する工程を説明するための断面図である。 
 まず、基板7の上に、複数の第1基板SUB1を形成するための第1マザー基板M1を形成し、複数の第2基板SUB2を形成するための第2マザー基板M2を接着層GLによって第1マザー基板M1に貼り合せる。その後、絶縁基板10から基板7を剥離するために、基板7の下から絶縁基板10にレーザー光LL1を照射する。ここで、本実施形態においては、例えば、基板7はガラスによって形成され、絶縁基板10はポリイミドによって形成されている。基板7の下からレーザー光LL1が照射されると、レーザー光LL1は、絶縁基板10の面SF12に到達する。絶縁基板10は、基板7と絶縁基板10との間の界面で、レーザー光LL1を吸収することによって分解される。これにより、基板7と絶縁基板10との間の界面に空間が生じ、絶縁基板10から基板7が剥離される。
FIG. 5 is a cross-sectional view for explaining a process of peeling the substrate 7 from the insulating substrate 10.
First, the first mother substrate M1 for forming the plurality of first substrates SUB1 is formed on the substrate 7, and the second mother substrate M2 for forming the plurality of second substrates SUB2 is formed by the adhesive layer GL. 1 Bond to the mother substrate M1. Thereafter, in order to peel off the substrate 7 from the insulating substrate 10, the insulating substrate 10 is irradiated with the laser beam LL1 from under the substrate 7. Here, in the present embodiment, for example, the substrate 7 is formed of glass, and the insulating substrate 10 is formed of polyimide. When the laser beam LL <b> 1 is irradiated from below the substrate 7, the laser beam LL <b> 1 reaches the surface SF <b> 12 of the insulating substrate 10. The insulating substrate 10 is decomposed at the interface between the substrate 7 and the insulating substrate 10 by absorbing the laser light LL1. Thus, a space is generated at the interface between the substrate 7 and the insulating substrate 10, and the substrate 7 is peeled off from the insulating substrate 10.
 図6は、接着層ADによって支持基板SPを貼り付ける工程を説明するための断面図である。 
 次に、支持基板SPを、接着層ADによって絶縁基板10の面SF12に貼り付ける。具体的には、絶縁基板10及び支持基板SPの間に接着層ADとして、例えば接着シート等を配置した状態で、支持基板SPをアライメントした後、加温処理することで支持基板SPを絶縁基板10の面SF12に貼り付ける。このように、接着層ADは支持基板SPのアライメント後に加温処理されるため、絶縁基板10に対する支持基板SPの位置ズレが生じるのを抑制することができる。
FIG. 6 is a cross-sectional view for explaining the process of attaching the support substrate SP by the adhesive layer AD.
Next, the support substrate SP is attached to the surface SF12 of the insulating substrate 10 by the adhesive layer AD. Specifically, in a state in which, for example, an adhesive sheet or the like is disposed as the adhesive layer AD between the insulating substrate 10 and the support substrate SP, the support substrate SP is aligned and then heated to perform the insulating substrate Paste to 10 faces SF12. As described above, since the adhesive layer AD is heated after the alignment of the support substrate SP, the positional deviation of the support substrate SP with respect to the insulating substrate 10 can be suppressed.
 図7は、第1フレキシブル配線基板FPC1を表示パネルPNLに圧着する工程を説明するための断面図である。 
 次に、第1マザー基板及び第2マザー基板によって構成された表示パネルPNLから個々の表示パネルPNLを切り出す。そして、それぞれの表示パネルPNLに、異方性導電膜8を用いて第1フレキシブル配線基板FPC1を圧着する工程が行われる。すなわち、第1フレキシブル配線基板FPC1と表示パネルPNLとの間であってパッドPDと重なる位置に、異方性導電膜8を配置し、第1フレキシブル配線基板FPC1の上、及び、表示パネルPNLの下から、図7に示した矢印の方向に圧力を加え加熱する。これにより、異方性導電膜8が溶融して異方性導電膜8に含まれる導電粒子がパッドPDおよび接続配線100に接触し、第1フレキシブル配線基板FPC1及び表示パネルPNLが電気的及び物理的に接続される。
FIG. 7 is a cross-sectional view for explaining a process of pressure bonding the first flexible printed circuit FPC1 to the display panel PNL.
Next, individual display panels PNL are cut out from the display panel PNL configured by the first mother substrate and the second mother substrate. Then, the step of pressure-bonding the first flexible wiring substrate FPC1 to the respective display panels PNL using the anisotropic conductive film 8 is performed. That is, the anisotropic conductive film 8 is disposed between the first flexible wiring substrate FPC1 and the display panel PNL and at a position overlapping the pad PD, and the first flexible wiring substrate FPC1 and the display panel PNL are provided. From the bottom, pressure is applied in the direction of the arrow shown in FIG. Thereby, the anisotropic conductive film 8 melts, and the conductive particles contained in the anisotropic conductive film 8 contact the pad PD and the connection wiring 100, and the first flexible wiring substrate FPC1 and the display panel PNL are electrically and physically Connected.
 なお、図6及び図7に示す工程において、表示パネルPNLの下面には略全面に亘って、支持基板SPが配置されている。このため、各工程で支持基板SPが絶縁基板10の強度を補強することが可能であり、信号配線6等の配線の断線が生じるのを抑制することができる。 In the processes shown in FIGS. 6 and 7, the support substrate SP is disposed on the entire lower surface of the display panel PNL. Therefore, the supporting substrate SP can reinforce the strength of the insulating substrate 10 in each process, and it is possible to suppress the occurrence of disconnection of the signal wiring 6 and the like.
 図8は、保護部材PTを形成する工程及び支持基板SPを切断する工程を説明するための断面図である。 
 次に、フィルムFLと第1フレキシブル配線基板FPC1との間において、第4絶縁膜14の上に有機絶縁材料を塗布し、UV照射によって硬化することで、保護部材PTを形成する。そして、支持基板SPを切断するために、支持基板SPの下からレーザー光LL2を照射する。折り曲げ領域BAにおいて支持基板SPを取り除くために、支持基板SPを2か所切断する。このとき、レーザー光LL2が照射される個所は、第1境界BR1及び第2境界BR2に相当する。本実施形態においては、レーザー光LL2によって、支持基板SPを切断すると同時に、接着層ADを切断し、絶縁基板10にスリットを形成する。すなわち、レーザー光LL2は、絶縁基板10まで到達している。
FIG. 8 is a cross-sectional view for illustrating the process of forming the protective member PT and the process of cutting the support substrate SP.
Next, an organic insulating material is applied on the fourth insulating film 14 between the film FL and the first flexible wiring substrate FPC1, and cured by UV irradiation to form a protective member PT. Then, in order to cut the support substrate SP, the laser light LL2 is irradiated from below the support substrate SP. In order to remove the support substrate SP in the bending area BA, the support substrate SP is cut at two places. At this time, the portion irradiated with the laser beam LL2 corresponds to the first boundary BR1 and the second boundary BR2. In the present embodiment, the support substrate SP is cut by the laser beam LL2, and at the same time, the adhesive layer AD is cut to form a slit in the insulating substrate 10. That is, the laser beam LL2 reaches the insulating substrate 10.
 図9は、第3領域AR3において支持基板SPの部分SPa及び接着層ADの部分ADaを剥離する工程を説明するための断面図である。 
 支持基板SPの下からレーザー光LL2を照射した後、支持基板SP、接着層AD、及び、絶縁基板10には切れ目61及び切れ目62が形成されている。切れ目61及び切れ目62は、支持基板SP及び接着層ADを貫通し、絶縁基板10は貫通せずに途中まで形成されている。すなわち、切れ目61は絶縁基板10に形成されたスリットSL1を含み、切れ目62は絶縁基板10に形成されたスリットSL2を含んでいる。
FIG. 9 is a cross-sectional view for explaining the step of peeling the portion SPa of the support substrate SP and the portion ADa of the adhesive layer AD in the third region AR3.
After irradiating the laser beam LL2 from under the support substrate SP, cuts 61 and 62 are formed in the support substrate SP, the adhesive layer AD, and the insulating substrate 10. The cut 61 and the cut 62 penetrate the support substrate SP and the adhesive layer AD, and the insulating substrate 10 is formed halfway without penetrating. That is, the cut 61 includes the slit SL1 formed in the insulating substrate 10, and the cut 62 includes the slit SL2 formed in the insulating substrate 10.
 次に、第3領域AR3において支持基板SPの部分SPa及び接着層ADの部分ADaを剥離するために、レーザー光LL3を第3領域AR3において支持基板SPの下から照射する。レーザー光LL3は絶縁基板10の面SF12に到達し、絶縁基板10は接着層ADとの間の界面で改質される。これにより、第3領域AR3において絶縁基板10と接着層ADとの間に空間GPが生じる。支持基板SP及び接着層ADを貫通する切れ目61及び切れ目62が形成されていることにより、部分SPa及び部分ADaを絶縁基板10から剥離することができる。 Next, in order to peel off the portion SPa of the support substrate SP and the portion ADa of the adhesive layer AD in the third region AR3, the laser beam LL3 is irradiated from below the support substrate SP in the third region AR3. The laser beam LL3 reaches the surface SF12 of the insulating substrate 10, and the insulating substrate 10 is reformed at the interface with the adhesive layer AD. Thus, a space GP is generated between the insulating substrate 10 and the adhesive layer AD in the third region AR3. By forming the cut 61 and the cut 62 penetrating the support substrate SP and the adhesive layer AD, the portion SPa and the portion ADa can be peeled off from the insulating substrate 10.
 図8に示したように支持基板SPを切断する際に、例えば、レーザー光LL2の先端が第3方向Zに波打って照射される場合がある。そのため、切れ目61及び切れ目62を接着層ADの途中まで形成するようにレーザー光LL2を照射した場合、レーザー光LL2の先端は支持基板SP及び接着層ADの両方に照射される。その結果、支持基板SP及び接着層ADが溶けて混ざり冷却され、粘着強度の大きい固着物が発生する恐れがある。このような固着物が生じた状態で、支持基板SPの部分SPaを絶縁基板10から剥離すると、表示パネルPNLが引っ張られ、無機膜にクラックを生じたり、信号配線6が断線したりする恐れがある。 As shown in FIG. 8, when cutting the support substrate SP, for example, the tip of the laser beam LL2 may be irradiated with waves in the third direction Z. Therefore, when the laser beam LL2 is irradiated so as to form the cut 61 and the cut 62 in the middle of the adhesive layer AD, the tip of the laser beam LL2 is irradiated to both the support substrate SP and the adhesive layer AD. As a result, the supporting substrate SP and the adhesive layer AD melt, are mixed, and are cooled, and there is a possibility that a sticking substance having high adhesive strength may be generated. When the portion SPa of the support substrate SP is peeled off from the insulating substrate 10 in the state where such a fixed substance is generated, the display panel PNL is pulled, which may cause a crack in the inorganic film or a break in the signal wiring 6. is there.
 本実施形態によれば、絶縁基板10は、スリットSL1及びスリットSL2を有している。つまり、支持基板SPを切断するレーザー光LL2は、絶縁基板10まで照射されている。そのため、レーザー光LL2の先端が第3方向Zに波打ったとしても、絶縁基板10において波打つため、支持基板SP及び接着層ADが混ざった固着物がほとんど生じない。したがって、部分SPaを剥離する際の表示パネルPNLへの負荷を抑制することができ、無機膜のクラックや信号配線6の断線の発生を抑制することができる。 According to the present embodiment, the insulating substrate 10 has the slit SL1 and the slit SL2. That is, the laser beam LL2 for cutting the support substrate SP is irradiated to the insulating substrate 10. Therefore, even if the tip of the laser beam LL2 is waved in the third direction Z, since the wave is waved in the insulating substrate 10, a fixed substance in which the support substrate SP and the adhesive layer AD are mixed hardly occurs. Therefore, the load on the display panel PNL when peeling off the portion SPa can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
 また、本実施形態によれば、第1支持基板SP1及び第2支持基板SP2は、支持基板SPの部分SPaが剥離されることにより形成される。このため、支持基板SP全体を一度剥離して第1支持基板SP1及び第2支持基板SP2となる別の部材を貼る工程が不要である。支持基板SP全体を剥離する工程を省くことで、絶縁基板10の帯電を抑制し、静電気破壊等によって表示パネルPNLが損傷するのを抑制することができる。また、第2絶縁膜12、第3絶縁膜13などの絶縁膜の静電気破壊を抑制することができるため、スイッチング素子SWの破損を抑制することができる。また、支持基板SPとは別の部材として第1支持基板SP1及び第2支持基板SP2を用いることによる製造コストの増加を抑制することが可能である。 Further, according to the present embodiment, the first support substrate SP1 and the second support substrate SP2 are formed by peeling the portion SPa of the support substrate SP. For this reason, the process of peeling the whole support substrate SP once, and sticking the other member used as 1st support substrate SP1 and 2nd support substrate SP2 is unnecessary. By omitting the step of peeling the entire support substrate SP, charging of the insulating substrate 10 can be suppressed, and damage to the display panel PNL due to electrostatic breakdown or the like can be suppressed. Further, since electrostatic breakdown of the insulating films such as the second insulating film 12 and the third insulating film 13 can be suppressed, damage to the switching element SW can be suppressed. Moreover, it is possible to suppress the increase in the manufacturing cost by using 1st support substrate SP1 and 2nd support substrate SP2 as a member different from support substrate SP.
 図10は、表示パネルPNLの折り曲げ領域BAを折り曲げる工程を説明するための断面図である。 
 図9に示した工程において、第3領域AR3がレーザー光LL3によって改質されたため、第3膜厚T3は第1膜厚T1及び第2膜厚T2の各々よりも小さく形成されている。また、第3面SF3は、第1面SF1及び第3面SF3よりも上側に位置している。また、第3領域AR3と重なる領域において支持基板SPが剥離されたことにより、支持基板SPから第1支持基板SP1及び第2支持基板SP2が形成された。また、第3領域AR3と重なる領域において接着層ADが剥離されたことにより、接着層ADから第1接着層AD1及び第2接着層AD2が形成された。
FIG. 10 is a cross-sectional view for illustrating the process of bending the bending area BA of the display panel PNL.
In the process shown in FIG. 9, since the third region AR3 is modified by the laser beam LL3, the third film thickness T3 is formed smaller than each of the first film thickness T1 and the second film thickness T2. The third surface SF3 is located above the first surface SF1 and the third surface SF3. In addition, since the support substrate SP is peeled off in a region overlapping with the third region AR3, the first support substrate SP1 and the second support substrate SP2 are formed from the support substrate SP. Further, by peeling off the adhesive layer AD in the region overlapping with the third region AR3, the first adhesive layer AD1 and the second adhesive layer AD2 are formed from the adhesive layer AD.
 次に、サポート部材9の位置をアライメントし、サポート部材9を接着層AD11によって第1支持基板SP1に接着する。その後、第1フレキシブル配線基板FPC1が第1支持基板SP1の下に配置されるように、表示パネルPNLの折り曲げ領域BAを折り曲げる。つまり、サポート部材9を基点として、第1フレキシブル配線基板FPC1がサポート部材9の下に配置されるように折り曲げ領域BAを折り曲げ、接着層AD12によって第1フレキシブル配線基板FPC1をサポート部材9に貼り付ける。なお、本実施形態において、サポート部材9は、例えば、シート状に形成されている。 Next, the position of the support member 9 is aligned, and the support member 9 is bonded to the first support substrate SP1 by the adhesive layer AD11. Thereafter, the bending area BA of the display panel PNL is bent so that the first flexible printed circuit FPC1 is disposed below the first support substrate SP1. That is, the bending area BA is bent so that the first flexible printed circuit FPC1 is disposed under the support member 9 with the support member 9 as a base point, and the first flexible printed circuit FPC1 is attached to the support member 9 by the adhesive layer AD12. . In the present embodiment, the support member 9 is formed in, for example, a sheet shape.
 本実施形態において絶縁基板10は、スリットSL1及びスリットSL2を有している。そのため、折り曲げる際に、スリットを起点として折り曲げることができるため、スリットを有していない場合と比較して絶縁基板10を折り曲げやすくなる。したがって、折り曲げ領域BAを折り曲げる際の表示パネルPNLへの負荷を抑制することができ、無機膜のクラックや信号配線6の断線の発生を抑制することができる。 In the present embodiment, the insulating substrate 10 has a slit SL1 and a slit SL2. Therefore, when bending, since the slit can be used as a starting point, the insulating substrate 10 can be easily bent as compared with the case where the slit is not provided. Therefore, the load on the display panel PNL when bending the bending area BA can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
 図11は、図10に示した折り曲げ領域BAを折り曲げた後の表示パネルPNLを示す断面図である。 
 折り曲げ領域BAは、第1支持基板SP1と第1フレキシブル配線基板FPC1とが対向するように折れ曲がっている。サポート部材9は、第1支持基板SP1と第1フレキシブル配線基板FPC1との間に配置されている。接着層AD11は、第1支持基板SP1とサポート部材9との間に配置され、両者を接着している。また、接着層AD12は、第1フレキシブル配線基板FPC1とサポート部材9との間に配置され、両者を接着している。なお、接着層AD11及びAD12は、図示したように離間して形成されていても良いし、一体的に形成されていても良い。接着層AD11及びAD12は、例えば両面テープである。
FIG. 11 is a cross-sectional view showing the display panel PNL after the bending area BA shown in FIG. 10 is bent.
The bending area BA is bent so that the first support substrate SP1 and the first flexible printed circuit FPC1 face each other. The support member 9 is disposed between the first support substrate SP1 and the first flexible printed circuit FPC1. The adhesive layer AD11 is disposed between the first support substrate SP1 and the support member 9, and bonds the both. Further, the adhesive layer AD12 is disposed between the first flexible printed circuit FPC1 and the support member 9, and bonds the two together. The adhesive layers AD11 and AD12 may be formed separately as shown, or may be integrally formed. The adhesive layers AD11 and AD12 are, for example, double-sided tapes.
 次に、第2実施形態に係る表示装置について詳細に説明する。 Next, the display device according to the second embodiment will be described in detail.
 図12は、第2実施形態に係る表示装置DSPを示す平面図である。図12に示す構成は、図4に示した構成と比較して、第3領域AR3が第1部分PA1と、第2部分PA2と、第1部分PA1と第2部分PA2との間の第3部分PA3と、を有している点で相違している。 FIG. 12 is a plan view showing a display device DSP according to the second embodiment. Compared with the configuration shown in FIG. 4, the configuration shown in FIG. 12 is different from the configuration shown in FIG. 4 in the third area AR3 between the first portion PA1, the second portion PA2, the first portion PA1 and the second portion PA2. It is different in having a portion PA3.
 第1部分PA1及び第2部分PA2は、第3領域AR3において右上がりの斜線で示されている領域に相当する。第1部分PA1、第3部分PA3、及び、第2部分PA2は、この順に第1方向Xに並んでいる。第1部分PA1は、第1端部EG1側に位置し、第2部分PA2は、第2端部EG2側に位置している。信号配線6は、第3部分PA3と重なる位置に配置され、第1部分PA1及び第2部分PA2と重なる位置には配置されない。 The first portion PA1 and the second portion PA2 correspond to a region indicated by oblique lines rising to the right in the third region AR3. The first portion PA1, the third portion PA3, and the second portion PA2 are aligned in the first direction X in this order. The first portion PA1 is located on the first end EG1 side, and the second portion PA2 is located on the second end EG2 side. The signal wiring 6 is disposed at a position overlapping the third portion PA3 and is not disposed at a position overlapping the first portion PA1 and the second portion PA2.
 図13は、図12に示した表示装置DSPの線A-Bにおける断面図である。 
 絶縁基板10は、第1部分PA1において第4膜厚T4と、第2部分PA2において第5膜厚T5と、第3部分PA3において第6膜厚T6と、を有している。第4膜厚T4及び第5膜厚T5は、それぞれ第6膜厚T6よりも小さい。ここで、例えば、第6膜厚T6は、図3に示した第3膜厚T3と同等である。また、例えば、第4膜厚T4及び第5膜厚T5は互いに等しい。絶縁基板10は、面SF12側において、第1部分PA1の第4面SF4と、第2部分PA2の第5面SF5と、第3部分PA3の第6面SF6と、を有している。第4面SF4及び第5面SF5は、それぞれ第6面SF6よりも面SF11側に位置している。
FIG. 13 is a cross-sectional view of the display device DSP shown in FIG. 12 taken along line AB.
The insulating substrate 10 has a fourth film thickness T4 in the first portion PA1, a fifth film thickness T5 in the second portion PA2, and a sixth film thickness T6 in the third portion PA3. The fourth film thickness T4 and the fifth film thickness T5 are respectively smaller than the sixth film thickness T6. Here, for example, the sixth film thickness T6 is equivalent to the third film thickness T3 shown in FIG. Also, for example, the fourth film thickness T4 and the fifth film thickness T5 are equal to each other. The insulating substrate 10 has a fourth surface SF4 of the first portion PA1, a fifth surface SF5 of the second portion PA2, and a sixth surface SF6 of the third portion PA3 on the surface SF12 side. The fourth surface SF4 and the fifth surface SF5 are respectively located closer to the surface SF11 than the sixth surface SF6.
 このように、本実施形態によると、第4面SF4及び第5面SF5が第6面SF6より上に位置することによって、図9に示したような支持基板SPの部分SPaを剥離する工程において、接着層ADの部分ADaと第1部分PA1との間、及び、部分ADaと第2部分PA2との間に部分SPaを剥離するためのツールを挿入することが容易となる。よって、部分SPaを容易に剥離することが可能となる。 As described above, according to the present embodiment, the fourth surface SF4 and the fifth surface SF5 are located above the sixth surface SF6, thereby removing the portion SPa of the support substrate SP as shown in FIG. It becomes easy to insert a tool for peeling off the portion SPa between the portion ADa of the adhesive layer AD and the first portion PA1 and between the portion ADa and the second portion PA2. Therefore, it becomes possible to peel part SPa easily.
 図示したように、第1部分PA1及び第5領域ARを第3部分PA3より薄く形成するために、図9に示した工程のレーザー光LL3のスキャン回数、パワー、オーバーラップなどの条件を第1部分PA1、第2部分PA2、第3部分PA3で互いに異ならせる。例えば、レーザー光LL3の第1部分PA1及び第2部分PA2への照射回数を第3部分PA3への照射回数より多くする。 As illustrated, in order to form the first portion PA1 and the fifth region AR thinner than the third portion PA3, the conditions such as the number of scans of the laser beam LL3, the power, and the overlap in the process shown in FIG. The part PA1, the second part PA2, and the third part PA3 are different from one another. For example, the number of times of irradiation of the first portion PA1 and the second portion PA2 of the laser beam LL3 is made larger than the number of times of irradiation of the third portion PA3.
 図14(a)は、図12に示した表示装置DSPの線C-Dにおける断面図である。図14(b)は、図12に示した表示装置DSPの線E-Fにおける断面図である。図14(c)は、図12に示した表示装置DSPの線G-Hにおける断面図である。 FIG. 14A is a cross-sectional view of the display device DSP shown in FIG. 12 along the line CD. FIG. 14B is a cross-sectional view of the display device DSP shown in FIG. 12 along the line EF. FIG. 14C is a cross-sectional view of the display device DSP shown in FIG. 12 along the line GH.
 図14(b)に示すように、絶縁基板10は、第1領域AR1と第3部分PA3との間の第1境界BR1においてスリットSL1を有し、第2領域AR2と第3部分PA3との間の第2境界BR2において第2スリットSL2を有している。図3に示したのと同様に、絶縁基板10は、スリットSL1において膜厚T11と、スリットSL2において膜厚T12と、を有している。第6面SF6は、第1面SF1及び第2面SF2よりも面SF11側に位置している。 As shown in FIG. 14B, the insulating substrate 10 has a slit SL1 at a first boundary BR1 between the first region AR1 and the third portion PA3, and the insulating substrate 10 has a slit SL1 between the second region AR2 and the third portion PA3. And a second slit SL2 at a second boundary BR2 between them. As shown in FIG. 3, the insulating substrate 10 has a film thickness T11 in the slit SL1 and a film thickness T12 in the slit SL2. The sixth surface SF6 is located closer to the surface SF11 than the first surface SF1 and the second surface SF2.
 図14(a)に示すように、第4膜厚T4は、第1膜厚T1及び第2膜厚T2のそれぞれより小さい。第4面SF4は、第1面SF1及び第2面SF2よりも面SF11側に位置している。第4膜厚T4は、図14(b)に示す第1境界BR1における膜厚T11と同等かそれ以下であり、かつ、図14(b)に示す第2境界BR2における膜厚T12と同等かそれ以下である。つまり、レーザー光によって第1部分PA1を第3部分PA3より薄く形成した際に、第1部分PA1と第1領域AR1との間のスリットSL1、及び、第1部分PA1と第2領域AR2との間のスリットSL2が消失する。 As shown in FIG. 14A, the fourth film thickness T4 is smaller than each of the first film thickness T1 and the second film thickness T2. The fourth surface SF4 is located closer to the surface SF11 than the first surface SF1 and the second surface SF2. Is the fourth film thickness T4 equal to or less than the film thickness T11 at the first boundary BR1 shown in FIG. 14 (b), and is it equal to the film thickness T12 at the second boundary BR2 shown in FIG. 14 (b)? It is less than that. That is, when the first portion PA1 is formed thinner than the third portion PA3 by laser light, the slit SL1 between the first portion PA1 and the first region AR1, and the first portion PA1 and the second region AR2 The slit SL2 between them disappears.
 図14(c)に示すように、第5膜厚T5は、第1膜厚T1及び第2膜厚T2のそれぞれより小さい。第5面SF5は、第1面SF1及び第2面SF2よりも面SF11側に位置している。第5膜厚T5は、図14(b)に示す第1境界BR1における膜厚T11と同等かそれ以下であり、かつ、図14(b)に示す第2境界BR2における膜厚T12と同等かそれ以下である。つまり、レーザー光によって第2部分PA2を第3部分PA3より薄く形成した際に、第2部分PA2と第1領域AR1との間のスリットSL1、及び、第2部分PA2と第2領域AR2との間のスリットSL2が消失する。 As shown in FIG. 14C, the fifth film thickness T5 is smaller than each of the first film thickness T1 and the second film thickness T2. The fifth surface SF5 is located closer to the surface SF11 than the first surface SF1 and the second surface SF2. Is the fifth film thickness T5 equal to or less than the film thickness T11 at the first boundary BR1 shown in FIG. 14 (b), and is it equal to the film thickness T12 at the second boundary BR2 shown in FIG. 14 (b)? It is less than that. That is, when the second part PA2 is formed thinner than the third part PA3 by laser light, the slit SL1 between the second part PA2 and the first area AR1, and the second part PA2 and the second area AR2 The slit SL2 between them disappears.
 次に、第3実施形態に係る表示装置について詳細に説明する。 Next, the display device according to the third embodiment will be described in detail.
 図15は、第3実施形態に係る図1に示した表示装置DSPのY-Z平面に沿った断面図である。図15に示す構成は、図3に示した構成と比較して、第1接着層AD1及び第2接着層AD2の端部ADE1及びADE2が、それぞれ第1境界BR1及び第2境界BR2よりも後退している点で相違している。図15に示すその他の構成については図3と同様である。第1接着層AD1の第3領域AR3側の端部ADE1は、第1支持基板SP1の第3領域AR3側の端部SPE1よりも第1領域AR1側に位置している。第2接着層AD2の第3領域AR3側の端部ADE2は、第2支持基板SP2の第3領域AR3側の端部SPE2よりも第2領域AR2側に位置している。なお、図示した例では、第1接着層AD1及び第2接着層AD2の両方の端部が後退しているが、どちらか一方だけが後退していても良い。その場合、折り曲げ始め側の接着層の端部が後退している方が良く、本実施形態においては、第1接着層AD1の端部ADE1は後退している方が良い。 FIG. 15 is a cross-sectional view of the display device DSP shown in FIG. 1 according to the third embodiment, taken along the YZ plane. In the configuration shown in FIG. 15, compared with the configuration shown in FIG. 3, the end portions ADE1 and ADE2 of the first adhesive layer AD1 and the second adhesive layer AD2 are respectively recessed behind the first boundary BR1 and the second boundary BR2 It differs in the point which is doing. The other configuration shown in FIG. 15 is the same as that shown in FIG. The end ADE1 on the third area AR3 side of the first adhesive layer AD1 is located closer to the first area AR1 than the end SPE1 on the third area AR3 side of the first support substrate SP1. The end ADE2 on the third area AR3 side of the second adhesive layer AD2 is located closer to the second area AR2 than the end SPE2 on the third area AR3 side of the second support substrate SP2. In the illustrated example, both ends of the first adhesive layer AD1 and the second adhesive layer AD2 are retracted, but only one of them may be retracted. In that case, the end of the adhesive layer on the bending start side should be retracted, and in the present embodiment, the end ADE1 of the first adhesive layer AD1 should be retracted.
 図8に示したように、第1境界BR1及び第2境界BR2にレーザー光LL2を照射することで、支持基板SPを切断する。ここで、本実施形態においては、接着層ADは、波長吸収剤を含んでいる。そのため、接着層ADの熱感度を向上させることができ、レーザー光LL2に対する接着層ADの削れ量を増加させることができる。例えば、本実施形態においては、レーザー光LL2は、266~10600nmの波長を有する。より具体的には、レーザー光LL2は、266、355、532、1064、9300、9600、10600nmの波長を有する。本実施形態においては、上記のようなレーザー光LL2の波長に最適な波長吸収剤が用いられる。 As shown in FIG. 8, the supporting substrate SP is cut by irradiating the first boundary BR1 and the second boundary BR2 with the laser light LL2. Here, in the present embodiment, the adhesive layer AD contains a wavelength absorber. Therefore, the thermal sensitivity of the adhesive layer AD can be improved, and the amount of scraping of the adhesive layer AD with respect to the laser beam LL2 can be increased. For example, in the present embodiment, the laser beam LL2 has a wavelength of 266 to 10600 nm. More specifically, the laser beam LL2 has a wavelength of 266, 355, 532, 1064, 9300, 9600, 10600 nm. In the present embodiment, a wavelength absorber optimum for the wavelength of the laser light LL2 as described above is used.
 絶縁基板10は、接着層ADよりも、レーザー光LL2を吸収しない。そのため、レーザー光LL2の照射時に発生するプラズマ及びプルームが、レーザー光LL2の照射方向に対して垂直に接着層ADを削りやすくなる。図8に示した例では、レーザー光LL2の照射方向は、第3方向Zに平行である。すなわち、プラズマ及びプルームは、X-Y平面に沿った方向に接着層ADを削ることができる。そのため、第1接着層AD1の端部ADE1及び第2接着層AD2の端部ADE2は、第1境界BR1及び第2境界BR2よりも後退する。 The insulating substrate 10 does not absorb the laser beam LL2 more than the adhesive layer AD. Therefore, the plasma and plume generated at the time of the irradiation of the laser beam LL2 tend to cut the adhesive layer AD perpendicularly to the irradiation direction of the laser beam LL2. In the example shown in FIG. 8, the irradiation direction of the laser beam LL2 is parallel to the third direction Z. That is, the plasma and the plume can scrape the adhesion layer AD in the direction along the XY plane. Therefore, the end ADE1 of the first adhesive layer AD1 and the end ADE2 of the second adhesive layer AD2 recede from the first boundary BR1 and the second boundary BR2.
 次いで、図10に示したように、折り曲げ領域BAを折り曲げる工程を行う。この際、一例としては、所望の曲率を得るために、絶縁基板10の第2領域AR2を保持して引っ張りながらサポート部材9を基点に折り曲げ領域BAを折り曲げる。第2領域AR2を保持し引っ張りながら折り曲げることで、絶縁基板10が多少伸び、第1領域AR1も折り曲がってしまうおそれがある。そうすると、第1支持基板SP1と絶縁基板10とが接着されている部分にも引っ張りの応力が加わる。第1支持基板SP1は、絶縁基板10よりも強度に優れているため、第1領域AR1が折り曲がった場合に加わる応力は大きく、表示領域DAの近くで無機膜のクラックや信号配線6の断線が発生するおそれがある。 Next, as shown in FIG. 10, a step of bending the bending area BA is performed. At this time, as an example, in order to obtain a desired curvature, the bending area BA is bent with the support member 9 as a base point while holding and pulling the second area AR2 of the insulating substrate 10. By holding and pulling the second area AR2, the insulating substrate 10 may be extended to some extent, and the first area AR1 may also be bent. Then, tensile stress is also applied to the portion where the first support substrate SP1 and the insulating substrate 10 are bonded. Since the first support substrate SP1 is superior in strength to the insulating substrate 10, the stress applied when the first area AR1 is bent is large, and cracks of the inorganic film and disconnection of the signal wiring 6 are close to the display area DA. May occur.
 また、サポート部材9を用いない場合やサポート部材9の位置ずれが発生した場合では、折り曲げることを想定していない第1領域AR1も折り曲がってしまうおそれがある。そうすると、無機膜のクラックや信号配線6の断線が発生するおそれがある。 In addition, when the support member 9 is not used or when the positional deviation of the support member 9 occurs, the first area AR1 which is not supposed to be bent may also be bent. Then, cracks in the inorganic film and disconnection of the signal wiring 6 may occur.
 本実施形態によれば、第1接着層AD1の端部ADE1及び第2接着層AD2の端部ADE2は、それぞれ、第1境界BR1及び第2境界BR2よりも後退をしている。そのため、第1支持基板SP1及び第2支持基板SP2が曲がったとしても、絶縁基板10に加わる応力を緩和することができる。したがって、折り曲げる際の表示パネルPNLへの負荷を抑制することができ、無機膜のクラックや信号配線6の断線の発生を抑制することができる。 According to the present embodiment, the end ADE1 of the first adhesive layer AD1 and the end ADE2 of the second adhesive layer AD2 are respectively recessed relative to the first boundary BR1 and the second boundary BR2. Therefore, even if the first support substrate SP1 and the second support substrate SP2 are bent, the stress applied to the insulating substrate 10 can be relaxed. Therefore, the load on the display panel PNL at the time of bending can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
 また、本実施形態によれば、レーザー光LL2の先端が第3方向Zに波打ったとしても、接着層ADの方が支持基板SPよりレーザー光LL2によって削られやすいため、支持基板SP及び接着層ADが混ざった固着物がほとんど生じない。したがって、部分SPaを剥離する際の表示パネルPNLへの負荷を抑制することができ、無機膜のクラックや信号配線6の断線の発生を抑制することができる。 Further, according to the present embodiment, even if the tip of the laser beam LL2 is waved in the third direction Z, the adhesive layer AD is more easily scraped by the laser beam LL2 than the support substrate SP. There is almost no sticking of the layer AD. Therefore, the load on the display panel PNL when peeling off the portion SPa can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
 さらに、本実施形態によれば、第1境界BR1及び第2境界BR2に一直線状に形成されたスリットSL1及びSL2を有している。そのため、サポート部材9を用いなかったり、位置ずれが発生したりしても、スリットSL1及びSL2を起点にして折り曲げることができるため、折り曲げることを想定していない領域が折れ曲がるのを抑制することができる。したがって、折り曲げる際の表示パネルPNLへの負荷を抑制することができ、無機膜のクラックや信号配線6の断線の発生を抑制することができる。 Furthermore, according to the present embodiment, the slits SL1 and SL2 formed in a straight line are provided at the first boundary BR1 and the second boundary BR2. Therefore, even if the support member 9 is not used or positional deviation occurs, the slits SL1 and SL2 can be used as a starting point for bending, so it is possible to suppress bending of a region not supposed to be bent. it can. Therefore, the load on the display panel PNL at the time of bending can be suppressed, and the occurrence of the crack of the inorganic film and the disconnection of the signal wiring 6 can be suppressed.
 以上説明したように、本実施形態によれば、歩留まりの低下を抑制することが可能な表示装置を得ることができる。 As described above, according to the present embodiment, it is possible to obtain a display device capable of suppressing a decrease in yield.
 上記の第1及び第2実施形態は、有機エレクトロルミネッセンス表示装置に限らず、液晶表示装置に適用することも可能である。その場合、表示パネルPNLは、例えば、第1基板SUB1と、第2基板SUB2と、第1基板SUB1と第2基板SUB2との間に挟持された液晶層と、を備えた液晶表示パネルである。表示パネルPNLが液晶表示パネルである場合には、第2基板SUB2側から入射する光を選択的に反射することで画像を表示する反射型であっても良いし、第1基板SUB1側から入射する光を選択的に透過することで画像を表示する透過型であっても良い。なお、本実施形態に関する主要な構成については、表示装置DSPが液晶表示装置であった場合にも略同一である。 The above first and second embodiments can be applied not only to the organic electroluminescence display device but also to a liquid crystal display device. In that case, the display panel PNL is, for example, a liquid crystal display panel including a first substrate SUB1, a second substrate SUB2, and a liquid crystal layer sandwiched between the first substrate SUB1 and the second substrate SUB2. . When the display panel PNL is a liquid crystal display panel, it may be a reflective type that displays an image by selectively reflecting light incident from the second substrate SUB2 side, or is incident from the first substrate SUB1 side. It may be of a transmission type that displays an image by selectively transmitting the light. The main configuration of the present embodiment is substantially the same as in the case where the display device DSP is a liquid crystal display device.
 なお、本発明のいくつかの実施形態を説明したが、これらの実施形態は、例として提示したものであり、発明の範囲を限定することは意図していない。これらの新規な実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これらの実施形態やその変形は、発明の範囲や要旨に含まれるとともに、特許請求の範囲に記載された発明とその均等の範囲に含まれる。 While certain embodiments of the present invention have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, substitutions, and modifications can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and the gist of the invention, and are included in the invention described in the claims and the equivalents thereof.

Claims (18)

  1.  表示領域と重なる第1領域と、第1方向に並んで配置された複数のパッドと重なる第2領域と、前記第1領域と前記第2領域との間に位置する第3領域と、を有する絶縁基板と、
     前記絶縁基板の一方の面側に形成され、前記第1方向と交差する第2方向に延在し前記パッドに接続された信号配線と、
     前記絶縁基板の一方の面側とは反対側の他方の面側に配置され、第1接着層を介して前記第1領域に接着された第1支持基板と、第2接着層を介して前記第2領域に接着された第2支持基板と、を備え、
     前記絶縁基板は、前記他方の面側において、前記第1領域と前記第3領域との間の第1境界に前記第1方向に延在する第1スリットと、前記第2領域と前記第3領域との間の第2境界に前記第1方向に延在する第2スリットと、を有する、表示装置。
    A first area overlapping the display area, a second area overlapping the plurality of pads arranged in the first direction, and a third area positioned between the first area and the second area An insulating substrate,
    A signal line formed on one surface side of the insulating substrate, extending in a second direction intersecting the first direction and connected to the pad;
    A first support substrate disposed on the other side opposite to the one side of the insulating substrate and bonded to the first region via the first adhesive layer, and the second supporting layer via the second adhesive layer And a second support substrate bonded to the second area,
    The insulating substrate has a first slit extending in the first direction to a first boundary between the first area and the third area on the other surface side, the second area, and the third area. And a second slit extending in the first direction at a second boundary between the regions.
  2.  前記絶縁基板は、前記第1領域の第1膜厚と、前記第2領域の第2膜厚と、前記第3領域の第3膜厚と、を有し、
     前記第1膜厚及び前記第2膜厚は、前記第3膜厚よりも大きい、請求項1に記載の表示装置。
    The insulating substrate has a first thickness of the first area, a second thickness of the second area, and a third thickness of the third area.
    The display device according to claim 1, wherein the first film thickness and the second film thickness are larger than the third film thickness.
  3.  前記第1膜厚は、前記第2膜厚と等しい、請求項2に記載の表示装置。 The display device according to claim 2, wherein the first film thickness is equal to the second film thickness.
  4.  前記絶縁基板は、前記他方の面側において、前記第1接着層と接触する第1面と、前記第2接着層と接触する第2面と、前記第1面と前記第2面との間に位置する第3面と、を有し、
     前記第3面は、前記第1面及び前記第2面より、前記一方の面側に位置する、請求項1に記載の表示装置。
    The insulating substrate is provided, on the other side, between a first surface in contact with the first adhesive layer, a second surface in contact with the second adhesive layer, and the first surface and the second surface. And a third surface located on the
    The display device according to claim 1, wherein the third surface is located closer to the one surface than the first surface and the second surface.
  5.  前記第3領域は、第1部分と、第2部分と、前記第1部分と前記第2部分との間に位置する第3部分と、を有し、
     前記信号配線は、前記第1領域から前記第2領域の前記パッドまで連続して配置されて、前記第3領域において、前記第3部分と重なる位置に配置され、
     前記第1部分の第4膜厚及び前記第2部分の第5膜厚は、それぞれ前記第3部分の第6膜厚よりも小さい、請求項1に記載の表示装置。
    The third region has a first portion, a second portion, and a third portion located between the first portion and the second portion,
    The signal wiring is continuously disposed from the first area to the pad of the second area, and is disposed at a position overlapping the third portion in the third area.
    The display device according to claim 1, wherein a fourth film thickness of the first portion and a fifth film thickness of the second portion are smaller than a sixth film thickness of the third portion.
  6.  前記信号配線は、前記第1部分及び前記第2部分と重なる位置には配置されていない、請求項5に記載の表示装置。 The display device according to claim 5, wherein the signal wiring is not disposed at a position overlapping with the first portion and the second portion.
  7.  前記絶縁基板は、前記他方の面側において、前記第1部分の第4面と、前記第2部分の第5面と、前記第3部分の第6面と、を有し、
     前記第4面及び前記第5面は、それぞれ前記第6面よりも前記一方の面側に位置している、請求項5に記載の表示装置。
    The insulating substrate has a fourth surface of the first portion, a fifth surface of the second portion, and a sixth surface of the third portion on the other surface side,
    The display device according to claim 5, wherein the fourth surface and the fifth surface are respectively located on the one surface side of the sixth surface.
  8.  前記第3領域が折れ曲がり、前記配線基板と前記第1支持基板とが対向する、請求項1に記載の表示装置。 The display device according to claim 1, wherein the third region is bent and the wiring substrate and the first support substrate face each other.
  9.  前記第1接着層の前記第3領域側の端部は、前記第1支持基板の前記第3領域側の端部よりも前記第1領域側に位置している、請求項1に記載の表示装置。 The display according to claim 1, wherein an end of the first adhesive layer on the third area side is positioned closer to the first area than an end of the first support substrate on the third area side. apparatus.
  10.  前記第2接着層の前記第3領域側の端部は、前記第2支持基板の前記第3領域側の端部よりも前記第2領域側に位置している、請求項1に記載の表示装置。 The display according to claim 1, wherein an end of the second adhesive layer on the third area side is positioned closer to the second area than an end of the second support substrate on the third area side. apparatus.
  11.  表示領域と重なる第1領域と、第1方向に並んで配置された複数のパッドと重なる第2領域と、前記第1領域と前記第2領域との間に位置する第3領域と、を有する絶縁基板と、
     前記絶縁基板の一方の面側に形成され、前記第1方向と交差する第2方向に延在し前記パッドに接続された信号配線と、
     前記絶縁基板の一方の面側とは反対側の他方の面側に配置され、第1接着層を介して前記第1領域に接着された第1支持基板と、第2接着層を介して前記第2領域に接着された第2支持基板と、を備え、
     前記第3領域は、第1部分と、第2部分と、前記第1部分と前記第2部分との間に位置する第3部分と、を有し、
     前記信号配線は、前記第1領域から前記第2領域の前記パッドまで連続して形成されており、前記第3領域において、前記第3部分と重なる位置に形成されており、
     前記第3部分の膜厚は、前記第1部分の膜厚及び前記第2部分の膜厚よりも大きい、表示装置。
    A first area overlapping the display area, a second area overlapping the plurality of pads arranged in the first direction, and a third area positioned between the first area and the second area An insulating substrate,
    A signal line formed on one surface side of the insulating substrate, extending in a second direction intersecting the first direction and connected to the pad;
    A first support substrate disposed on the other side opposite to the one side of the insulating substrate and bonded to the first region via the first adhesive layer, and the second supporting layer via the second adhesive layer And a second support substrate bonded to the second area,
    The third region has a first portion, a second portion, and a third portion located between the first portion and the second portion,
    The signal wiring is continuously formed from the first area to the pad in the second area, and is formed at a position overlapping the third portion in the third area,
    The display device, wherein the film thickness of the third portion is larger than the film thickness of the first portion and the film thickness of the second portion.
  12.  前記信号配線は、前記第1部分及び前記第2部分には配置されていない、請求項11に記載の表示装置。 The display device according to claim 11, wherein the signal wiring is not disposed in the first portion and the second portion.
  13.  前記第1部分の膜厚は、前記第2部分の膜厚と等しい、請求項11に記載の表示装置。 The display device according to claim 11, wherein a film thickness of the first portion is equal to a film thickness of the second portion.
  14.  前記第3部分の膜厚は、前記第1領域の膜厚及び前記第2領域の膜厚よりも小さい、請求項11に記載の表示装置。 The display device according to claim 11, wherein a film thickness of the third portion is smaller than a film thickness of the first region and a film thickness of the second region.
  15.  前記絶縁基板は、前記他方の面側において、前記第1領域と前記第3部分との間の第1境界に前記第1方向に延在する第1スリットと、前記第2領域と前記第3部分との間の第2境界に前記第1方向に延在する第2スリットと、を有する、請求項11に記載の表示装置。 The insulating substrate has a first slit extending in the first direction to a first boundary between the first region and the third portion on the other surface side, the second region, and the third region. The display device according to claim 11, further comprising: a second slit extending in the first direction at a second boundary between the parts.
  16.  前記第3領域が折れ曲がり、前記配線基板と前記第1支持基板とが対向する、請求項11に記載の表示装置。 The display device according to claim 11, wherein the third region is bent and the wiring substrate and the first support substrate face each other.
  17.  前記第1接着層の前記第3領域側の端部は、前記第1支持基板の前記第3領域側の端部よりも前記第1領域側に位置している、請求項11に記載の表示装置。 The display according to claim 11, wherein an end of the first adhesive layer on the third area side is positioned closer to the first area than an end of the first support substrate on the third area side. apparatus.
  18.  前記第2接着層の前記第3領域側の端部は、前記第2支持基板の前記第3領域側の端部よりも前記第2領域側に位置している、請求項11に記載の表示装置。 The display according to claim 11, wherein an end of the second adhesive layer on the side of the third area is positioned closer to the second area than an end of the second support substrate on the side of the third area. apparatus.
PCT/JP2018/036495 2017-12-01 2018-09-28 Display device WO2019106935A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-231937 2017-12-01
JP2017231937A JP2019101224A (en) 2017-12-01 2017-12-01 Display device

Publications (1)

Publication Number Publication Date
WO2019106935A1 true WO2019106935A1 (en) 2019-06-06

Family

ID=66664856

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2018/036495 WO2019106935A1 (en) 2017-12-01 2018-09-28 Display device

Country Status (2)

Country Link
JP (1) JP2019101224A (en)
WO (1) WO2019106935A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110515499A (en) * 2019-08-30 2019-11-29 京东方科技集团股份有限公司 A kind of touch panel and touch control display apparatus

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111430421B (en) * 2020-04-02 2023-08-15 京东方科技集团股份有限公司 Display device and method for manufacturing the same
CN115206187B (en) * 2022-07-04 2024-02-06 Tcl华星光电技术有限公司 Flip chip film set

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184377A (en) * 2004-12-27 2006-07-13 Seiko Epson Corp Electro-optic device, manufacturing apparatus for same, and electronic equipment
JP2007140107A (en) * 2005-11-18 2007-06-07 Epson Imaging Devices Corp Electrooptical device, packaging structure, method for manufacturing electrooptical device, and electronic apparatus
JP2007256724A (en) * 2006-03-24 2007-10-04 Epson Imaging Devices Corp Electro-optical device, mounting structure, method of manufacturing electro-optical device, and electronic equipment
JP2008263161A (en) * 2007-03-19 2008-10-30 Epson Imaging Devices Corp Mounting structure, electro-optical device, input device, method of manufacturing mounting structure, and electronic equipment
US20170042047A1 (en) * 2015-08-06 2017-02-09 Samsung Display Co., Ltd. Display device and method of manufacturing the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184377A (en) * 2004-12-27 2006-07-13 Seiko Epson Corp Electro-optic device, manufacturing apparatus for same, and electronic equipment
JP2007140107A (en) * 2005-11-18 2007-06-07 Epson Imaging Devices Corp Electrooptical device, packaging structure, method for manufacturing electrooptical device, and electronic apparatus
JP2007256724A (en) * 2006-03-24 2007-10-04 Epson Imaging Devices Corp Electro-optical device, mounting structure, method of manufacturing electro-optical device, and electronic equipment
JP2008263161A (en) * 2007-03-19 2008-10-30 Epson Imaging Devices Corp Mounting structure, electro-optical device, input device, method of manufacturing mounting structure, and electronic equipment
US20170042047A1 (en) * 2015-08-06 2017-02-09 Samsung Display Co., Ltd. Display device and method of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110515499A (en) * 2019-08-30 2019-11-29 京东方科技集团股份有限公司 A kind of touch panel and touch control display apparatus
CN110515499B (en) * 2019-08-30 2023-06-20 京东方科技集团股份有限公司 Touch panel and touch display device

Also Published As

Publication number Publication date
JP2019101224A (en) 2019-06-24

Similar Documents

Publication Publication Date Title
US10342133B2 (en) Display device having a first area, a second area adjacent to the first area, and a third area adjacent to the second area
JP6896454B2 (en) Display device
CN107579092B (en) Display device
US10014362B2 (en) Display device including metal layer and metal carbide layer covering the metal layer
KR102579458B1 (en) Display device
JP6887799B2 (en) Display device
US10367048B2 (en) Display device and method of manufacturing the same
JP6983537B2 (en) Flexible board
CN106886109A (en) Display device
US20170257939A1 (en) Display device
WO2019106935A1 (en) Display device
JP2011128481A (en) Electrooptical device, method of manufacturing the same, and electronic equipment
JP2018124437A (en) Display
JP2018004948A (en) Display
JP2018091913A (en) Display device
US10636989B2 (en) Display device including an insulating substrate with pixels disposed on a first surface
JP2011040269A (en) Electro-optic apparatus and manufacturing method therefor, and electronic device
CN107154418B (en) Display device
JP2017161887A (en) Display device
JP2019003142A (en) Display
CN107123663B (en) Display device
JP7077001B2 (en) Display device
KR20170132940A (en) Organic light emitting display panel, display device comprising the same and method for manufacturing the display device
JP2019184978A (en) Display device
JP2019105805A (en) Display device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 18882955

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 18882955

Country of ref document: EP

Kind code of ref document: A1