WO2019075900A1 - 液晶显示面板及其制作方法 - Google Patents

液晶显示面板及其制作方法 Download PDF

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Publication number
WO2019075900A1
WO2019075900A1 PCT/CN2017/117234 CN2017117234W WO2019075900A1 WO 2019075900 A1 WO2019075900 A1 WO 2019075900A1 CN 2017117234 W CN2017117234 W CN 2017117234W WO 2019075900 A1 WO2019075900 A1 WO 2019075900A1
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Prior art keywords
spacer
forming
color
resist layer
substrate
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English (en)
French (fr)
Inventor
潘于新
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the invention relates to a liquid crystal display panel technology, in particular to an array substrate and a display panel.
  • TFT-LCD Thin Film Transistor, Liquid Crystal Display, Liquid Crystal Display
  • CF substrate color filter substrate
  • PI alignment film
  • the accuracy of the group and the degree of shrinkage of the surface of the two substrate films may cause slight deviation between the upper and lower substrates (the upper substrate may be a color film substrate or a general one).
  • the cover plate and the lower substrate are array substrates), so that light leakage is poor.
  • the current solution is to control the accuracy of the group and control the shrinkage of the layers of the upper and lower substrates. This method sacrifices the monitoring production time of each site during the operation and cannot completely solve the light leakage problem.
  • the present invention provides a liquid crystal display panel and a manufacturing method thereof, thereby simplifying the process and saving cost.
  • the present invention provides a liquid crystal display panel comprising an upper substrate and a lower substrate, the upper substrate or the lower substrate comprising a color resist layer and a black matrix disposed between the color resists of the color resist layer, wherein the black matrix is provided with a spacer comprising a spacer made of the same photoresist material as the color resist layer and an outer layer disposed outside the spacer.
  • the spacer includes a primary spacer and a secondary spacer, and the heights of the primary spacer and the secondary spacer are different.
  • the main spacer is composed of a spacer made of a photoresist material having the same color resistance of two colors of the color resist layer and an outer layer disposed outside the spacer.
  • the secondary spacer is made up of a spacer made of a photoresist material having the same color resistance as that of the color resist layer and an outer layer disposed outside the spacer.
  • the present invention also provides a method for fabricating a liquid crystal display panel, comprising the fabrication of an upper substrate, the fabrication of the upper substrate comprising the following steps:
  • a spacer is simultaneously formed in the process of forming the color resist layer.
  • first spacer and the outer layer of the second spacer are not formed to constitute the secondary spacer; the first spacer, the second spacer and the outer layer formed with the second spacer constitute the main spacer.
  • the outer layer is made of a photoresist material for making spacers.
  • the present invention also provides a method for fabricating a liquid crystal display panel, comprising the fabrication of a lower substrate, the fabrication of the lower substrate comprising the following steps:
  • a spacer is simultaneously formed in the process of forming the color resist layer.
  • first spacer and the outer layer of the second spacer are not formed to constitute the secondary spacer; the first spacer, the second spacer and the outer layer formed with the second spacer constitute the main spacer.
  • the outer layer is made of a photoresist material for making spacers.
  • the invention makes spacers while fabricating the color resist layer on the upper substrate or the lower substrate, thereby eliminating the half-tone or gray-tone mask, ensuring process stability and cost saving. Can achieve the accuracy of the process.
  • Figure 1 is a schematic view of a first embodiment of the present invention
  • FIG. 2 is a schematic view showing the fabrication of a black matrix of the present invention
  • Figure 3 is a schematic view of one of the spacers of the present invention.
  • Figure 4 is a schematic view of another spacer formed by the present invention.
  • Figure 5 is a schematic view showing the outer layer of the present invention outside the spacer
  • Figure 6 is a plan view of the present invention.
  • Figure 7 is a schematic illustration of a second embodiment of the invention.
  • a liquid crystal display panel of the present invention includes an upper substrate and a lower substrate, and the upper substrate or the lower substrate includes a color resist layer 1 and a color resistance layer disposed between the color resist layers 1 .
  • the black matrix 2 is provided with a spacer 3 on the black matrix 2, and the spacer 3 includes a spacer 6 made of the same photoresist material as the color resist layer and an outer layer 7 provided outside the spacer 6.
  • the spacer 3 includes a primary spacer 4 and a secondary spacer 5, the heights of the primary spacer 4 and the secondary spacer 5 being different, wherein:
  • the main spacer 4 is composed of a spacer 6 made of a photoresist material having the same color resistance of the two colors of the color resist layer 1, and an outer layer 7 provided outside the spacer 6;
  • the secondary spacer 5 is made up of a spacer 6 made of a photoresist material having the same color resistance as that of the color resist layer 1 and an outer layer 7 provided outside the spacer 6.
  • the color resistance of one of the colors is made of a photoresist of the same color of color resistance, for example:
  • the spacer 6 constituting the main spacer 4 is a first spacer 61 and a second spacer 62 made of a photoresist material having the same color resistance as red and blue color resistance;
  • the spacer 6 is a first spacer 61 made of a photoresist material having the same color resistance as red.
  • the present invention is not limited thereto, and the spacers may be formed by using color resists of other colors according to the fabrication of the color resist layer.
  • the outer layer 7 is made of a conventional photoresist material for forming spacers, and the light passing through the position of the outer layer 7 is 100%, and the fluidity of the photoresist and the spacer itself are utilized.
  • the height difference is such that spacers of different heights are formed, and the outer layer 7 has a thickness of 2 to 4 um.
  • the manufacturing method of the liquid crystal display panel of the present invention comprises the following steps:
  • a black matrix 2 and a color resist layer 1 are sequentially formed on the upper substrate or the lower substrate, and the black matrix 2 and the color resist layer 1 are fabricated by using the prior art. method;
  • the spacer 3 is simultaneously formed in the process of forming the color resist layer 1 (as shown in FIGS. 3 and 4).
  • simultaneously forming the spacer 3 in the process of forming the color resist layer 1 includes:
  • An outer layer 7 (shown in Figure 5) is formed outside the first spacer 61 and the second spacer 62.
  • the portion of the first spacer 61 and the outer layer 7 that are not formed with the second spacer 62 constitute the secondary spacer 5; the portion of the first spacer 61 and the second spacer 62 that are formed with the second spacer 62 and The outer layer 7 constitutes the main spacer 4.
  • the outer layer 7 is made of a photoresist material for making spacers. Specifically, the outer layer 7 is formed on the outer surface of the first spacer 61 and the second spacer 62 to apply a photoresist material for forming spacers on the first spacer 61 and the second spacer 62. a process of etching the photoresist material other than the first spacer 61 and the second spacer 62 to form an outer layer 7 outside the first spacer 61 and the second spacer 62; in the photolithography process, The light at the first pad 61 and the second pad 62 can pass 100%.
  • the spacer 6 constituting the main spacer 4 is a first spacer 61 and a second spacer 62 made of a photoresist material having the same color resistance as red and blue color resistance;
  • the spacer 6 is a first spacer 61 made of a photoresist material having the same color resistance as red.
  • the present invention is not limited thereto, and the spacers may be formed by using color resists of other colors according to the fabrication of the color resist layer.
  • the upper substrate may be a color film substrate
  • the lower substrate may be a BOA substrate
  • the lower substrate is a BOA substrate
  • an ITO film is coated on the surface of the cover glass opposite to the lower substrate.
  • Embodiment 1 is a diagrammatic representation of Embodiment 1:
  • the liquid crystal display panel of the first embodiment includes an upper substrate and a lower substrate, wherein the upper substrate is a color film substrate 100, and the lower substrate is a prior art TFT (thin film transistor) substrate. Since both are prior art, only For the improvement of the present invention, the differences of the color filter substrate 100 will be described with reference to FIG.
  • the color filter substrate 100 includes a substrate 101 , a color resist layer 1 disposed on the substrate 101 , a black matrix 2 disposed between the color resists of the color resist layer 1 , and a spacer 3 .
  • the spacer 3 is disposed on the black matrix 2, where the spacer 3 is disposed in the prior art, and the position of the spacer is not limited herein; the spacer 3 includes the same photoresist material as the color resist layer.
  • the prepared spacer 6 and the outer layer 7 disposed outside the spacer 6; the color filter substrate 100 further includes an ITO film layer (not shown), and the arrangement of the ITO film layer is the same as the existing arrangement. , do not give specific instructions here.
  • the spacer 3 includes a primary spacer 4 and a secondary spacer 5, the heights of the primary spacer 4 and the secondary spacer 5 being different, wherein:
  • the main spacer 4 is composed of a spacer 6 made of a photoresist material having the same color resistance of the two colors of the color resist layer 1 and an outer layer 7 provided outside the spacer 6;
  • the secondary spacer 5 is made up of a spacer 6 made of a photoresist material having the same color resistance as that of the color resist layer 1 and an outer layer 7 provided outside the spacer 6.
  • the color resistance of one of the colors is made of a photoresist of the same color of color resistance, for example:
  • the spacer 6 constituting the main spacer 4 is a first spacer 61 and a second spacer 62 made of a photoresist material having the same color resistance as red and blue color resistance;
  • the spacer 6 is a first spacer 61 made of a photoresist material having the same color resistance as red.
  • the present invention is not limited thereto, and the spacers may be formed by using color resists of other colors according to the fabrication of the color resist layer.
  • the outer layer 7 is made of a conventional photoresist material for forming spacers, and the light passing through the position of the outer layer 7 is 100%, and the fluidity of the photoresist and the spacer itself are utilized.
  • the height difference is such that spacers of different heights are formed, and the outer layer 7 has a thickness of 2 to 4 um.
  • the manufacturing method of the liquid crystal display panel in the first embodiment includes: the fabrication of the upper substrate and the fabrication of the lower substrate, wherein the fabrication of the upper substrate comprises the following steps:
  • a substrate 101 is provided.
  • a black matrix 2 is formed on the substrate 101 (as shown in FIG. 2); specifically, a black photoresist material is coated on the substrate 101, and the black matrix 2 is formed by one photolithography process.
  • a color resist layer 1 is formed in a pixel region between the black matrices 2 (as shown in FIGS. 2, 3, and 4); specifically:
  • a red photoresist material is coated, a red color resist is formed by a mask process, and a first spacer 61 is formed on the black matrix 2 at a position of the spacer 3;
  • 3 is a primary spacer 4 and a secondary spacer 5;
  • a green photoresist material is coated, and a green color resist is formed by a mask process
  • a blue photoresist material is coated, and a blue color resist is formed by a single mask process while forming a second on the first spacer 61 at the position of the main spacer 4 on the brown matrix 2.
  • the outer layer 7 is formed outside the pad in which only the first spacer 61 and the first spacer 61 and the second spacer 62 are formed, and finally the secondary spacer 5 and the main spacer 4 are formed.
  • a photoresist material for forming a spacer is coated on the first spacer 61, the second spacer 62, and the color resist layer 1 and the black matrix 2, and the first spacer 61 is removed by a single mask process.
  • the photoresist material other than the second spacer 62 is etched away to form the outer layer 7 outside the first spacer 61 and the second spacer 62.
  • the portion of the first spacer 61 and the outer layer 7 that are not formed with the second spacer 62 constitute the secondary spacer 5; the portion of the first spacer 61 and the second spacer 62 that are formed with the second spacer 62 and The outer layer 7 constitutes the main spacer 4.
  • the lower substrate adopts a BOA substrate
  • the BOA substrate includes: an array substrate, and the array substrate may include a data line, a scan line, a thin film transistor, and a pixel electrode.
  • the improvement in the second embodiment does not involve improvements such as data lines, scan lines, thin film transistors, and pixel electrodes, this part will not be described in detail herein. It is only necessary to know that the structure of the BOA substrate is no different from the prior art. .
  • the lower substrate includes an array substrate 200, a color resist layer 1, a black matrix 2 disposed between the color resists of the color resist layer 1, and a spacer 3, wherein the color resist layer 1 and the black matrix 2 are disposed on the array substrate 200.
  • the spacer 3 is disposed on the black matrix 2, where the spacer 3 is disposed at a position prior to the prior art, and the position is not limited herein; the spacer 3 includes the same photoresist as the color resist layer A spacer 6 made of a material and an outer layer 7 provided outside the spacer 6.
  • the spacer 3 includes a primary spacer 4 and a secondary spacer 5, the heights of the primary spacer 4 and the secondary spacer 5 being different, wherein:
  • the main spacer 4 is composed of a spacer 6 made of a photoresist material having the same color resistance of the two colors of the color resist layer 1 and an outer layer 7 provided outside the spacer 6;
  • the secondary spacer 5 is made up of a spacer 6 made of a photoresist material having the same color resistance as that of the color resist layer 1 and an outer layer 7 provided outside the spacer 6.
  • the color resistance of one of the colors is made of a photoresist of the same color of color resistance, for example:
  • the spacer 6 constituting the main spacer 4 is a first spacer 61 and a second spacer 62 made of a photoresist material having the same color resistance as red and blue color resistance;
  • the spacer 6 is a first spacer 61 made of a photoresist material having the same color resistance as red.
  • the present invention is not limited thereto, and the spacers may be formed by using color resists of other colors according to the fabrication of the color resist layer.
  • the outer layer 7 is made of a conventional photoresist material for forming spacers, and the light passing through the position of the outer layer 7 is 100%, and the fluidity of the photoresist and the spacer itself are utilized.
  • the height difference is such that spacers of different heights are formed, and the outer layer 7 has a thickness of 2 to 4 um.
  • the upper substrate 300 includes a cover glass 301 and an ITO film 302 coated on the cover glass.
  • the manufacturing method of the liquid crystal display panel in the second embodiment includes the fabrication of the upper substrate and the fabrication of the lower substrate, wherein the fabrication of the lower substrate includes the following steps:
  • the array substrate may include a data line, a scan line, a thin film transistor, a pixel electrode, and the like, and is not specifically limited herein.
  • a black matrix 2 is formed on the array substrate 200 (as shown in FIG. 2); specifically, a black photoresist material is coated on the array substrate 200, and the black matrix 2 is formed by one photolithography process.
  • a color resist layer 1 is formed in a pixel region between the black matrices 2 (as shown in FIGS. 2, 3, and 4); specifically:
  • a red photoresist material is coated, a red color resist is formed by a mask process, and a first spacer 61 is formed on the black matrix 2 at a position of the spacer 3;
  • 3 is a primary spacer 4 and a secondary spacer 5;
  • a green photoresist material is coated, and a green color resist is formed by a mask process
  • a blue photoresist material is coated, and a blue color resist is formed by a single mask process while forming a second on the first spacer 61 at the position of the main spacer 4 on the brown matrix 2.
  • the outer layer 7 is formed outside the pad in which only the first spacer 61 and the first spacer 61 and the second spacer 62 are formed, and finally the secondary spacer 5 and the main spacer 4 are formed.
  • a photoresist material for forming a spacer is coated on the first spacer 61, the second spacer 62, and the color resist layer 1 and the black matrix 2, and the first spacer 61 is removed by a single mask process.
  • the photoresist material other than the second spacer 62 is etched away to form the outer layer 7 outside the first spacer 61 and the second spacer 62.
  • the portion of the first spacer 61 and the outer layer 7 that are not formed with the second spacer 62 constitute the secondary spacer 5; the portion of the first spacer 61 and the second spacer 62 that are formed with the second spacer 62 and The outer layer 7 constitutes the main spacer 4.
  • the fabrication of the upper substrate includes:
  • An ITO film 302 is formed on the cover glass 301.
  • the lower substrate may also be a COA substrate.
  • the fabrication steps may be changed according to actual needs.
  • the fabrication of the color resist layer and the black matrix may be replaced by the fabrication method of the second embodiment of the liquid crystal panel of the present invention.
  • the spacer is formed by a single photolithography process, and is formed by 100% exposure. Since the level of the photoresist at the pad position is different, the outer layer is formed outside the spacer, and finally a spacer is formed. This eliminates the need for a half-tone or gray-tone reticle to ensure process stability, cost savings and process accuracy.

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
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Abstract

一种液晶显示面板，包括上基板和下基板，上基板或下基板包括色阻层（1）以及设于色阻层（1）的各色阻之间的黑色矩阵（2），黑色矩阵（2）上设置有间隔物（3），间隔物（3）包括由与色阻层（1）相同的光阻材料制成的垫块（6）以及设于垫块（6）外的外层（7）。一种液晶显示面板的制作方法，上基板或下基板的制作中包括如下步骤：提供一基板；在基板上依次形成黑色矩阵（2）以及色阻层（1）；在形成色阻层（1）的过程中同时形成间隔物（3）。与现有技术相比，通过在上基板或下基板制作色阻层（1）的同时制作间隔物（3），从而省去了half-tone或gray-tone光罩，保证了制程的稳定性，节省成本又能够达到制程的准确性。

Description

液晶显示面板及其制作方法 技术领域
本发明涉及一种液晶显示面板技术，特别是一种阵列基板及显示面板。
背景技术
TFT-LCD(Thin FilmTransistor，薄膜晶体管，Liquid Crystal Display,液晶显示器)的制作非常复杂，需要经过阵列基板(TFT基板)制作，彩膜基板(CF基板)制作，在阵列基板和彩膜基板上分别涂布PI(配向膜)，完成PI涂布后，在阵列基板或彩膜基板上滴下液晶和框胶，并将滴下液晶和框胶的阵列基板和彩膜基板对组，经过框胶固化后完成制作。在将阵列基板和彩膜基板对组过程中，因对组精度和两个基板膜面收缩程度不同，容易导致上下基板间发生细微偏移(这里的上基板可以为彩膜基板也可以是一般的盖板，下基板为阵列基板)，从而发生漏光不良。目前的解决方法是管控对组精度和管控上下基板各层膜的收缩。该方法在作业过程中会牺牲掉各站点的监控生产时间，并且不能彻底解决漏光问题。
发明内容
为克服现有技术的不足，本发明提供一种液晶显示面板及其制作方法，从而简化制程，节省成本。
本发明提供了一种液晶显示面板，包括上基板和下基板，所述上基板或下基板包括色阻层以及设于色阻层的各色阻之间的黑色矩阵，所述黑色矩阵上设置有间隔物，所述间隔物包括由与色阻层相同的光阻材料制成的垫块以及设于垫块外的外层。
进一步地，所述间隔物包括主间隔物和次间隔物，所述主间隔物和次间隔物的高度不相同。
进一步地，所述主间隔物由与色阻层其中两种颜色的色阻相同的光阻材料制成的垫块以及设于垫块外的外层组成。
进一步地，所述次间隔物由与色阻层其中一种颜色的色阻相同的光阻材料制成的垫块以及设于垫块外的外层组成制成。
本发明还提供了一种液晶显示面板的制作方法，包括上基板的制作，所述上基板的制作包括如下步骤：
提供一基板；
在基板上依次形成黑色矩阵以及色阻层；
在形成色阻层的过程中同时形成间隔物。
进一步地，在形成色阻层的过程中同时形成间隔物包括：
在形成其中一种颜色的色阻的同时在黑色矩阵上形成第一垫块；
在形成另一种颜色的色阻的同时在部分第一垫块上形成第二垫块；
在第一垫块和第二垫块外制作外层；
其中，未形成有第二垫块的这部分第一垫块与外层构成次间隔物；形成有第二垫块的这部分第一垫块、第二垫块以及外层构成主间隔物。
进一步地，所述外层由用于制作间隔物的光阻材料制成。
本发明还提供了一种液晶显示面板的制作方法，包括下基板的制作，所述下基板的制作包括如下步骤：
提供一阵列基板；
在阵列基板上依次形成黑色矩阵以及色阻层；
在形成色阻层的过程中同时形成间隔物。
进一步地，在形成色阻层的过程中同时形成间隔物包括：
在形成其中一种颜色的色阻的同时在黑色矩阵上形成第一垫块；
在形成另一种颜色的色阻的同时在部分第一垫块上形成第二垫块；
在第一垫块和第二垫块外制作外层；
其中，未形成有第二垫块的这部分第一垫块与外层构成次间隔物；形成有第二垫块的这部分第一垫块、第二垫块以及外层构成主间隔物。
进一步地，所述外层由用于制作间隔物的光阻材料制成。
本发明与现有技术相比，通过在上基板或下基板制作色阻层的同时制作间隔物，从而省去了half-tone或gray-tone光罩，保证了制程的稳定性，节省成本又能够达到制程的准确性。
附图说明
图1是本发明的第一种实施方式的示意图；
图2是本发明制作黑色矩阵的示意图；
图3是本发明制作其中一个垫块的示意图；
图4是本发明制作另一个垫块的示意图；
图5是本发明在垫块外制作外层的示意图；
图6是本发明的俯视图；
图7是本发明的第二种实施方式的示意图。
具体实施方式
下面结合附图和实施例对本发明作进一步详细说明。
如图1和图6所示，本发明的一种液晶显示面板，包括上基板和下基板，所述上基板或下基板包括色阻层1以及设于色阻层1的各色阻之间的黑色矩阵2，所述黑色矩阵2上设置有间隔物3，所述间隔物3包括由与色阻层相同的光阻材料制成的垫块6以及设于垫块6外的外层7。
所述间隔物3包括主间隔物4和次间隔物5，所述主间隔物4和次间隔物5的高度不相同，其中：
主间隔物4由与色阻层1其中两种颜色的色阻相同的光阻材料制成的垫块 6以及设于垫块6外的外层7组成；
次间隔物5由与色阻层1其中一种颜色的色阻相同的光阻材料制成的垫块6以及设于垫块6外的外层7组成制成。
在主间隔物4和次间隔物5的构成中，其中一种颜色的色阻采用相同颜色的色阻的光阻材料制成，例如：
构成主间隔物4中的垫块6为：与红色的色阻以及蓝色的色阻相同的光阻材料制成的第一垫块61和第二垫块62；构成次间隔物5中的垫块6为：与红色的色阻相同的光阻材料制成的第一垫块61。但本发明不限于此，也可根据色阻层的制作相应的采用其他颜色的色阻制作垫块。
在上述的液晶显示面板中，外层7采用现有的用于制作间隔物的光阻材料，通过对外层7的位置的光为100％的通过，利用光阻的流动性和垫块本身的高度差从而形成不同高度的间隔物，所述外层7的厚度为2～4um。
本发明的液晶显示面板的制作方法：包括如下步骤：
在上基板或下基板上依次形成黑色矩阵2以及色阻层1(如图2、图3和图4所示)，所述黑色矩阵2以及色阻层1的制作均采用现有技术的制作方法；
在形成色阻层1的过程中同时形成间隔物3(如图3和图4所示)。
具体地，在形成色阻层1的过程中同时形成间隔物3包括：
在形成其中一种颜色的色阻的同时在黑色矩阵2上形成第一垫块61；
在形成另一种颜色的色阻的同时在部分第一垫块上形成第二垫块62；
在第一垫块61和第二垫块62外制作外层7(如图5所示)。
其中，未形成有第二垫块62的这部分第一垫块61与外层7构成次间隔物5；形成有第二垫块62的这部分第一垫块61、第二垫块62以及外层7构成主间隔物4。
外层7由用于制作间隔物的光阻材料制成。具体地，在第一垫块61和第 二垫块62外制作外层7为在第一垫块61和第二垫块62上涂布用于制作间隔物的光阻材料，通过一次光刻工艺，使除第一垫块61、第二垫块62以外的光阻材料被蚀刻掉，从而在第一垫块61、第二垫块62外形成外层7；在光刻工艺中，位于第一垫块61、第二垫块62处的光可100％通过。
构成主间隔物4中的垫块6为：与红色的色阻以及蓝色的色阻相同的光阻材料制成的第一垫块61和第二垫块62；构成次间隔物5中的垫块6为：与红色的色阻相同的光阻材料制成的第一垫块61。但本发明不限于此，也可根据色阻层的制作相应的采用其他颜色的色阻制作垫块。
本发明中，上基板可以为彩膜基板，下基板可以为BOA基板，当上基板采用彩膜基板时，下基板为一般的TFT(薄膜晶体管)基板；而当下基板为BOA基板时，上基板为盖板玻璃，在盖板玻璃与下基板相对的一侧表面涂布有ITO膜。
实施例一：
实施例一中的液晶显示面板包括上基板和下基板，其中上基板采用彩膜基板100，下基板采用现有技术的TFT(薄膜晶体管)基板，由于两者均为现有技术，此处仅针对本发明的改进之处，结合图1对彩膜基板100的不同之处进行描述。
如图1和图6所示，所述彩膜基板100包括基板101，设置于基板101上的色阻层1、设于色阻层1的各色阻之间的黑色矩阵2以及间隔物3，其中：所述间隔物3设置在黑色矩阵2上，此处间隔物3的设置采用现有技术，在此不对其设置位置进行限定；述间隔物3包括由与色阻层相同的光阻材料制成的垫块6以及设于垫块6外的外层7；所述彩膜基板100还包括ITO膜层(图中未示出)，ITO膜层的设置与现有的设置方式无异，在此不做具体说明。
所述间隔物3包括主间隔物4和次间隔物5，所述主间隔物4和次间隔物5的高度不相同，其中：
主间隔物4由与色阻层1其中两种颜色的色阻相同的光阻材料制成的垫块6以及设于垫块6外的外层7组成；
次间隔物5由与色阻层1其中一种颜色的色阻相同的光阻材料制成的垫块6以及设于垫块6外的外层7组成制成。
在主间隔物4和次间隔物5的构成中，其中一种颜色的色阻采用相同颜色的色阻的光阻材料制成，例如：
构成主间隔物4中的垫块6为：与红色的色阻以及蓝色的色阻相同的光阻材料制成的第一垫块61和第二垫块62；构成次间隔物5中的垫块6为：与红色的色阻相同的光阻材料制成的第一垫块61。但本发明不限于此，也可根据色阻层的制作相应的采用其他颜色的色阻制作垫块。
在上述的液晶显示面板中，外层7采用现有的用于制作间隔物的光阻材料，通过对外层7的位置的光为100％的通过，利用光阻的流动性和垫块本身的高度差从而形成不同高度的间隔物，所述外层7的厚度为2～4um。
实施例一中液晶显示面板的制作方法：包括上基板的制作以及下基板的制作，其中上基板的制作包括如下步骤：
提供一基板101。
在基板101上形成黑色矩阵2(如图2所示)；具体地，在基板101上涂布黑色光阻材料，通过一次光刻工艺形成黑色矩阵2。
在位于黑色矩阵2之间的像素区域中制作色阻层1(如图2、图3和图4所示)；具体地：
如图2所示，涂布红色光阻材料，通过一次光罩工艺，形成红色的色阻，同时在黑色矩阵2上位于间隔物3的位置处形成第一垫块61；这里所述的间隔物3为主间隔物4和次间隔物5；
如图3所示，涂布绿色光阻材料，通过一次光罩工艺，形成绿色的色阻；
如图4所示，涂布蓝色光阻材料，通过一次光罩工艺，形成蓝色的色阻，同时在褐色矩阵2上位于主间隔物4的位置处的第一垫块61上形成第二垫块62；
如图5所示，在仅形成有第一垫块61和形成有第一垫块61、第二垫块62的垫块外制作外层7，最终形成次间隔物5、主间隔物4。具体地，在第一垫块61、第二垫块62以及色阻层1、黑色矩阵2上涂布用于制作间隔物的光阻材料，通过一次光罩工艺使除第一垫块61、第二垫块62以外的光阻材料被蚀刻掉，从而在第一垫块61、第二垫块62外形成外层7。
其中，未形成有第二垫块62的这部分第一垫块61与外层7构成次间隔物5；形成有第二垫块62的这部分第一垫块61、第二垫块62以及外层7构成主间隔物4。
所述下基板的制作为现有技术，在此不做具体赘述。
实施例二
如图6和图7所示，实施例二中的液晶显示面板中，下基板采用BOA基板，所述BOA基板包括：阵列基板，该阵列基板可包括数据线、扫描线、薄膜晶体管以及像素电极等，由于实施例二中改进之处不涉及数据线、扫描线、薄膜晶体管以及像素电极等改进，在此不对这部分进行详细的描述，仅需知道，BOA基板的结构与现有技术无异。
所述下基板包括阵列基板200、色阻层1、设于色阻层1的各色阻之间的黑色矩阵2以及间隔物3，其中：色阻层1以及黑色矩阵2设于阵列基板200上，所述间隔物3设置在黑色矩阵2上，此处间隔物3的设置位置采用现有技术，在此不对其设置位置进行限定；所述间隔物3包括由与色阻层相同的光阻材料制成的垫块6以及设于垫块6外的外层7。
所述间隔物3包括主间隔物4和次间隔物5，所述主间隔物4和次间隔物5的高度不相同，其中：
主间隔物4由与色阻层1其中两种颜色的色阻相同的光阻材料制成的垫块6以及设于垫块6外的外层7组成；
次间隔物5由与色阻层1其中一种颜色的色阻相同的光阻材料制成的垫块6以及设于垫块6外的外层7组成制成。
在主间隔物4和次间隔物5的构成中，其中一种颜色的色阻采用相同颜色的色阻的光阻材料制成，例如：
构成主间隔物4中的垫块6为：与红色的色阻以及蓝色的色阻相同的光阻材料制成的第一垫块61和第二垫块62；构成次间隔物5中的垫块6为：与红色的色阻相同的光阻材料制成的第一垫块61。但本发明不限于此，也可根据色阻层的制作相应的采用其他颜色的色阻制作垫块。
在上述的液晶显示面板中，外层7采用现有的用于制作间隔物的光阻材料，通过对外层7的位置的光为100％的通过，利用光阻的流动性和垫块本身的高度差从而形成不同高度的间隔物，所述外层7的厚度为2～4um。
上基板300包括玻璃盖板301以及涂布于玻璃盖板上的ITO膜302。
实施例二中的液晶显示面板的制作方法：包括上基板的制作和下基板的制作，其中下基板的制作包括如下步骤：
提供一阵列基板200，该阵列基板可包括数据线、扫描线、薄膜晶体管以及像素电极等，在此不做具体限定。
在阵列基板200上形成黑色矩阵2(如图2所示)；具体地，在阵列基板200上涂布黑色光阻材料，通过一次光刻工艺形成黑色矩阵2。
在位于黑色矩阵2之间的像素区域中制作色阻层1(如图2、图3和图4所示)；具体地：
如图2所示，涂布红色光阻材料，通过一次光罩工艺，形成红色的色阻，同时在黑色矩阵2上位于间隔物3的位置处形成第一垫块61；这里所述的间隔物3为主间隔物4和次间隔物5；
如图3所示，涂布绿色光阻材料，通过一次光罩工艺，形成绿色的色阻；
如图4所示，涂布蓝色光阻材料，通过一次光罩工艺，形成蓝色的色阻，同时在褐色矩阵2上位于主间隔物4的位置处的第一垫块61上形成第二垫块62；
如图5所示，在仅形成有第一垫块61和形成有第一垫块61、第二垫块62的垫块外制作外层7，最终形成次间隔物5、主间隔物4。具体地，在第一垫块61、第二垫块62以及色阻层1、黑色矩阵2上涂布用于制作间隔物的光阻材料，通过一次光罩工艺使除第一垫块61、第二垫块62以外的光阻材料被蚀刻掉，从而在第一垫块61、第二垫块62外形成外层7。
其中，未形成有第二垫块62的这部分第一垫块61与外层7构成次间隔物5；形成有第二垫块62的这部分第一垫块61、第二垫块62以及外层7构成主间隔物4。
上基板的制作包括：
提供一玻璃盖板301；
在玻璃盖板301上制作ITO膜302。
本发明中下基板还可以为COA基板，此处可以根据实际需要，对制作步骤进行改变，其中色阻层以及黑色矩阵的制作替换为本发明的液晶面板中实施二的制作方法即可。
本发明的制作方法中制作间隔物采用一次光刻工艺，通过100％的曝光量进行制作，由于垫块位置的光阻流平性不同，使垫块外形成外层，最终制作出间隔物，从而无需使用half-tone或gray-tone光罩，保证了制程的稳定性，节省成本又能够达到制程的准确性。
虽然已经参照特定实施例示出并描述了本发明，但是本领域的技术人员将理解：在不脱离由权利要求及其等同物限定的本发明的精神和范围的情况下，可在此进行形式和细节上的各种变化。

Claims (10)

  1. 一种液晶显示面板，包括上基板和下基板，其中：所述上基板或下基板包括色阻层以及设于色阻层的各色阻之间的黑色矩阵，所述黑色矩阵上设置有间隔物，所述间隔物包括由与色阻层相同的光阻材料制成的垫块以及设于垫块外的外层。
  2. 根据权利要求1所述的液晶显示面板，其中：所述间隔物包括主间隔物和次间隔物，所述主间隔物和次间隔物的高度不相同。
  3. 根据权利要求2所述的液晶显示面板，其中：所述主间隔物由与色阻层其中两种颜色的色阻相同的光阻材料制成的垫块以及设于垫块外的外层组成。
  4. 根据权利要求2所述的液晶显示面板，其中：所述次间隔物由与色阻层其中一种颜色的色阻相同的光阻材料制成的垫块以及设于垫块外的外层组成制成。
  5. 一种液晶显示面板的制作方法，包括上基板的制作，其中：所述上基板的制作包括如下步骤：
    提供一基板；
    在基板上依次形成黑色矩阵以及色阻层；
    在形成色阻层的过程中同时形成间隔物。
  6. 根据权利要求5所述的液晶显示面板的制作方法，其中：在形成色阻层的过程中同时形成间隔物包括：
    在形成其中一种颜色的色阻的同时在黑色矩阵上形成第一垫块；
    在形成另一种颜色的色阻的同时在部分第一垫块上形成第二垫块；
    在第一垫块和第二垫块外制作外层；
    其中，未形成有第二垫块的这部分第一垫块与外层构成次间隔物；形成有 第二垫块的这部分第一垫块、第二垫块以及外层构成主间隔物。
  7. 根据权利要求6所述的液晶显示面板的制作方法，其中：所述外层由用于制作间隔物的光阻材料制成。
  8. 一种液晶显示面板的制作方法，包括下基板的制作，其中：所述下基板的制作包括如下步骤：
    提供一阵列基板；
    在阵列基板上依次形成黑色矩阵以及色阻层；
    在形成色阻层的过程中同时形成间隔物。
  9. 根据权利要求8所述的液晶显示面板的制作方法，其中：在形成色阻层的过程中同时形成间隔物包括：
    在形成其中一种颜色的色阻的同时在黑色矩阵上形成第一垫块；
    在形成另一种颜色的色阻的同时在部分第一垫块上形成第二垫块；
    在第一垫块和第二垫块外制作外层；
    其中，未形成有第二垫块的这部分第一垫块与外层构成次间隔物；形成有第二垫块的这部分第一垫块、第二垫块以及外层构成主间隔物。
  10. 根据权利要求9所述的液晶显示面板的制作方法，其中：所述外层由用于制作间隔物的光阻材料制成。
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