WO2019075900A1 - Panneau d'affichage à cristaux liquides, et procédé de fabrication associé - Google Patents

Panneau d'affichage à cristaux liquides, et procédé de fabrication associé Download PDF

Info

Publication number
WO2019075900A1
WO2019075900A1 PCT/CN2017/117234 CN2017117234W WO2019075900A1 WO 2019075900 A1 WO2019075900 A1 WO 2019075900A1 CN 2017117234 W CN2017117234 W CN 2017117234W WO 2019075900 A1 WO2019075900 A1 WO 2019075900A1
Authority
WO
WIPO (PCT)
Prior art keywords
spacer
forming
color
substrate
outer layer
Prior art date
Application number
PCT/CN2017/117234
Other languages
English (en)
Chinese (zh)
Inventor
潘于新
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Publication of WO2019075900A1 publication Critical patent/WO2019075900A1/fr

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the invention relates to a liquid crystal display panel technology, in particular to an array substrate and a display panel.
  • TFT-LCD Thin Film Transistor, Liquid Crystal Display, Liquid Crystal Display
  • CF substrate color filter substrate
  • PI alignment film
  • the accuracy of the group and the degree of shrinkage of the surface of the two substrate films may cause slight deviation between the upper and lower substrates (the upper substrate may be a color film substrate or a general one).
  • the cover plate and the lower substrate are array substrates), so that light leakage is poor.
  • the current solution is to control the accuracy of the group and control the shrinkage of the layers of the upper and lower substrates. This method sacrifices the monitoring production time of each site during the operation and cannot completely solve the light leakage problem.
  • the present invention provides a liquid crystal display panel and a manufacturing method thereof, thereby simplifying the process and saving cost.
  • the present invention provides a liquid crystal display panel comprising an upper substrate and a lower substrate, the upper substrate or the lower substrate comprising a color resist layer and a black matrix disposed between the color resists of the color resist layer, wherein the black matrix is provided with a spacer comprising a spacer made of the same photoresist material as the color resist layer and an outer layer disposed outside the spacer.
  • the spacer includes a primary spacer and a secondary spacer, and the heights of the primary spacer and the secondary spacer are different.
  • the main spacer is composed of a spacer made of a photoresist material having the same color resistance of two colors of the color resist layer and an outer layer disposed outside the spacer.
  • the secondary spacer is made up of a spacer made of a photoresist material having the same color resistance as that of the color resist layer and an outer layer disposed outside the spacer.
  • the present invention also provides a method for fabricating a liquid crystal display panel, comprising the fabrication of an upper substrate, the fabrication of the upper substrate comprising the following steps:
  • a spacer is simultaneously formed in the process of forming the color resist layer.
  • first spacer and the outer layer of the second spacer are not formed to constitute the secondary spacer; the first spacer, the second spacer and the outer layer formed with the second spacer constitute the main spacer.
  • the outer layer is made of a photoresist material for making spacers.
  • the present invention also provides a method for fabricating a liquid crystal display panel, comprising the fabrication of a lower substrate, the fabrication of the lower substrate comprising the following steps:
  • a spacer is simultaneously formed in the process of forming the color resist layer.
  • first spacer and the outer layer of the second spacer are not formed to constitute the secondary spacer; the first spacer, the second spacer and the outer layer formed with the second spacer constitute the main spacer.
  • the outer layer is made of a photoresist material for making spacers.
  • the invention makes spacers while fabricating the color resist layer on the upper substrate or the lower substrate, thereby eliminating the half-tone or gray-tone mask, ensuring process stability and cost saving. Can achieve the accuracy of the process.
  • Figure 1 is a schematic view of a first embodiment of the present invention
  • FIG. 2 is a schematic view showing the fabrication of a black matrix of the present invention
  • Figure 3 is a schematic view of one of the spacers of the present invention.
  • Figure 4 is a schematic view of another spacer formed by the present invention.
  • Figure 5 is a schematic view showing the outer layer of the present invention outside the spacer
  • Figure 6 is a plan view of the present invention.
  • Figure 7 is a schematic illustration of a second embodiment of the invention.
  • a liquid crystal display panel of the present invention includes an upper substrate and a lower substrate, and the upper substrate or the lower substrate includes a color resist layer 1 and a color resistance layer disposed between the color resist layers 1 .
  • the black matrix 2 is provided with a spacer 3 on the black matrix 2, and the spacer 3 includes a spacer 6 made of the same photoresist material as the color resist layer and an outer layer 7 provided outside the spacer 6.
  • the spacer 3 includes a primary spacer 4 and a secondary spacer 5, the heights of the primary spacer 4 and the secondary spacer 5 being different, wherein:
  • the main spacer 4 is composed of a spacer 6 made of a photoresist material having the same color resistance of the two colors of the color resist layer 1, and an outer layer 7 provided outside the spacer 6;
  • the secondary spacer 5 is made up of a spacer 6 made of a photoresist material having the same color resistance as that of the color resist layer 1 and an outer layer 7 provided outside the spacer 6.
  • the color resistance of one of the colors is made of a photoresist of the same color of color resistance, for example:
  • the spacer 6 constituting the main spacer 4 is a first spacer 61 and a second spacer 62 made of a photoresist material having the same color resistance as red and blue color resistance;
  • the spacer 6 is a first spacer 61 made of a photoresist material having the same color resistance as red.
  • the present invention is not limited thereto, and the spacers may be formed by using color resists of other colors according to the fabrication of the color resist layer.
  • the outer layer 7 is made of a conventional photoresist material for forming spacers, and the light passing through the position of the outer layer 7 is 100%, and the fluidity of the photoresist and the spacer itself are utilized.
  • the height difference is such that spacers of different heights are formed, and the outer layer 7 has a thickness of 2 to 4 um.
  • the manufacturing method of the liquid crystal display panel of the present invention comprises the following steps:
  • a black matrix 2 and a color resist layer 1 are sequentially formed on the upper substrate or the lower substrate, and the black matrix 2 and the color resist layer 1 are fabricated by using the prior art. method;
  • the spacer 3 is simultaneously formed in the process of forming the color resist layer 1 (as shown in FIGS. 3 and 4).
  • simultaneously forming the spacer 3 in the process of forming the color resist layer 1 includes:
  • An outer layer 7 (shown in Figure 5) is formed outside the first spacer 61 and the second spacer 62.
  • the portion of the first spacer 61 and the outer layer 7 that are not formed with the second spacer 62 constitute the secondary spacer 5; the portion of the first spacer 61 and the second spacer 62 that are formed with the second spacer 62 and The outer layer 7 constitutes the main spacer 4.
  • the outer layer 7 is made of a photoresist material for making spacers. Specifically, the outer layer 7 is formed on the outer surface of the first spacer 61 and the second spacer 62 to apply a photoresist material for forming spacers on the first spacer 61 and the second spacer 62. a process of etching the photoresist material other than the first spacer 61 and the second spacer 62 to form an outer layer 7 outside the first spacer 61 and the second spacer 62; in the photolithography process, The light at the first pad 61 and the second pad 62 can pass 100%.
  • the spacer 6 constituting the main spacer 4 is a first spacer 61 and a second spacer 62 made of a photoresist material having the same color resistance as red and blue color resistance;
  • the spacer 6 is a first spacer 61 made of a photoresist material having the same color resistance as red.
  • the present invention is not limited thereto, and the spacers may be formed by using color resists of other colors according to the fabrication of the color resist layer.
  • the upper substrate may be a color film substrate
  • the lower substrate may be a BOA substrate
  • the lower substrate is a BOA substrate
  • an ITO film is coated on the surface of the cover glass opposite to the lower substrate.
  • Embodiment 1 is a diagrammatic representation of Embodiment 1:
  • the liquid crystal display panel of the first embodiment includes an upper substrate and a lower substrate, wherein the upper substrate is a color film substrate 100, and the lower substrate is a prior art TFT (thin film transistor) substrate. Since both are prior art, only For the improvement of the present invention, the differences of the color filter substrate 100 will be described with reference to FIG.
  • the color filter substrate 100 includes a substrate 101 , a color resist layer 1 disposed on the substrate 101 , a black matrix 2 disposed between the color resists of the color resist layer 1 , and a spacer 3 .
  • the spacer 3 is disposed on the black matrix 2, where the spacer 3 is disposed in the prior art, and the position of the spacer is not limited herein; the spacer 3 includes the same photoresist material as the color resist layer.
  • the prepared spacer 6 and the outer layer 7 disposed outside the spacer 6; the color filter substrate 100 further includes an ITO film layer (not shown), and the arrangement of the ITO film layer is the same as the existing arrangement. , do not give specific instructions here.
  • the spacer 3 includes a primary spacer 4 and a secondary spacer 5, the heights of the primary spacer 4 and the secondary spacer 5 being different, wherein:
  • the main spacer 4 is composed of a spacer 6 made of a photoresist material having the same color resistance of the two colors of the color resist layer 1 and an outer layer 7 provided outside the spacer 6;
  • the secondary spacer 5 is made up of a spacer 6 made of a photoresist material having the same color resistance as that of the color resist layer 1 and an outer layer 7 provided outside the spacer 6.
  • the color resistance of one of the colors is made of a photoresist of the same color of color resistance, for example:
  • the spacer 6 constituting the main spacer 4 is a first spacer 61 and a second spacer 62 made of a photoresist material having the same color resistance as red and blue color resistance;
  • the spacer 6 is a first spacer 61 made of a photoresist material having the same color resistance as red.
  • the present invention is not limited thereto, and the spacers may be formed by using color resists of other colors according to the fabrication of the color resist layer.
  • the outer layer 7 is made of a conventional photoresist material for forming spacers, and the light passing through the position of the outer layer 7 is 100%, and the fluidity of the photoresist and the spacer itself are utilized.
  • the height difference is such that spacers of different heights are formed, and the outer layer 7 has a thickness of 2 to 4 um.
  • the manufacturing method of the liquid crystal display panel in the first embodiment includes: the fabrication of the upper substrate and the fabrication of the lower substrate, wherein the fabrication of the upper substrate comprises the following steps:
  • a substrate 101 is provided.
  • a black matrix 2 is formed on the substrate 101 (as shown in FIG. 2); specifically, a black photoresist material is coated on the substrate 101, and the black matrix 2 is formed by one photolithography process.
  • a color resist layer 1 is formed in a pixel region between the black matrices 2 (as shown in FIGS. 2, 3, and 4); specifically:
  • a red photoresist material is coated, a red color resist is formed by a mask process, and a first spacer 61 is formed on the black matrix 2 at a position of the spacer 3;
  • 3 is a primary spacer 4 and a secondary spacer 5;
  • a green photoresist material is coated, and a green color resist is formed by a mask process
  • a blue photoresist material is coated, and a blue color resist is formed by a single mask process while forming a second on the first spacer 61 at the position of the main spacer 4 on the brown matrix 2.
  • the outer layer 7 is formed outside the pad in which only the first spacer 61 and the first spacer 61 and the second spacer 62 are formed, and finally the secondary spacer 5 and the main spacer 4 are formed.
  • a photoresist material for forming a spacer is coated on the first spacer 61, the second spacer 62, and the color resist layer 1 and the black matrix 2, and the first spacer 61 is removed by a single mask process.
  • the photoresist material other than the second spacer 62 is etched away to form the outer layer 7 outside the first spacer 61 and the second spacer 62.
  • the portion of the first spacer 61 and the outer layer 7 that are not formed with the second spacer 62 constitute the secondary spacer 5; the portion of the first spacer 61 and the second spacer 62 that are formed with the second spacer 62 and The outer layer 7 constitutes the main spacer 4.
  • the lower substrate adopts a BOA substrate
  • the BOA substrate includes: an array substrate, and the array substrate may include a data line, a scan line, a thin film transistor, and a pixel electrode.
  • the improvement in the second embodiment does not involve improvements such as data lines, scan lines, thin film transistors, and pixel electrodes, this part will not be described in detail herein. It is only necessary to know that the structure of the BOA substrate is no different from the prior art. .
  • the lower substrate includes an array substrate 200, a color resist layer 1, a black matrix 2 disposed between the color resists of the color resist layer 1, and a spacer 3, wherein the color resist layer 1 and the black matrix 2 are disposed on the array substrate 200.
  • the spacer 3 is disposed on the black matrix 2, where the spacer 3 is disposed at a position prior to the prior art, and the position is not limited herein; the spacer 3 includes the same photoresist as the color resist layer A spacer 6 made of a material and an outer layer 7 provided outside the spacer 6.
  • the spacer 3 includes a primary spacer 4 and a secondary spacer 5, the heights of the primary spacer 4 and the secondary spacer 5 being different, wherein:
  • the main spacer 4 is composed of a spacer 6 made of a photoresist material having the same color resistance of the two colors of the color resist layer 1 and an outer layer 7 provided outside the spacer 6;
  • the secondary spacer 5 is made up of a spacer 6 made of a photoresist material having the same color resistance as that of the color resist layer 1 and an outer layer 7 provided outside the spacer 6.
  • the color resistance of one of the colors is made of a photoresist of the same color of color resistance, for example:
  • the spacer 6 constituting the main spacer 4 is a first spacer 61 and a second spacer 62 made of a photoresist material having the same color resistance as red and blue color resistance;
  • the spacer 6 is a first spacer 61 made of a photoresist material having the same color resistance as red.
  • the present invention is not limited thereto, and the spacers may be formed by using color resists of other colors according to the fabrication of the color resist layer.
  • the outer layer 7 is made of a conventional photoresist material for forming spacers, and the light passing through the position of the outer layer 7 is 100%, and the fluidity of the photoresist and the spacer itself are utilized.
  • the height difference is such that spacers of different heights are formed, and the outer layer 7 has a thickness of 2 to 4 um.
  • the upper substrate 300 includes a cover glass 301 and an ITO film 302 coated on the cover glass.
  • the manufacturing method of the liquid crystal display panel in the second embodiment includes the fabrication of the upper substrate and the fabrication of the lower substrate, wherein the fabrication of the lower substrate includes the following steps:
  • the array substrate may include a data line, a scan line, a thin film transistor, a pixel electrode, and the like, and is not specifically limited herein.
  • a black matrix 2 is formed on the array substrate 200 (as shown in FIG. 2); specifically, a black photoresist material is coated on the array substrate 200, and the black matrix 2 is formed by one photolithography process.
  • a color resist layer 1 is formed in a pixel region between the black matrices 2 (as shown in FIGS. 2, 3, and 4); specifically:
  • a red photoresist material is coated, a red color resist is formed by a mask process, and a first spacer 61 is formed on the black matrix 2 at a position of the spacer 3;
  • 3 is a primary spacer 4 and a secondary spacer 5;
  • a green photoresist material is coated, and a green color resist is formed by a mask process
  • a blue photoresist material is coated, and a blue color resist is formed by a single mask process while forming a second on the first spacer 61 at the position of the main spacer 4 on the brown matrix 2.
  • the outer layer 7 is formed outside the pad in which only the first spacer 61 and the first spacer 61 and the second spacer 62 are formed, and finally the secondary spacer 5 and the main spacer 4 are formed.
  • a photoresist material for forming a spacer is coated on the first spacer 61, the second spacer 62, and the color resist layer 1 and the black matrix 2, and the first spacer 61 is removed by a single mask process.
  • the photoresist material other than the second spacer 62 is etched away to form the outer layer 7 outside the first spacer 61 and the second spacer 62.
  • the portion of the first spacer 61 and the outer layer 7 that are not formed with the second spacer 62 constitute the secondary spacer 5; the portion of the first spacer 61 and the second spacer 62 that are formed with the second spacer 62 and The outer layer 7 constitutes the main spacer 4.
  • the fabrication of the upper substrate includes:
  • An ITO film 302 is formed on the cover glass 301.
  • the lower substrate may also be a COA substrate.
  • the fabrication steps may be changed according to actual needs.
  • the fabrication of the color resist layer and the black matrix may be replaced by the fabrication method of the second embodiment of the liquid crystal panel of the present invention.
  • the spacer is formed by a single photolithography process, and is formed by 100% exposure. Since the level of the photoresist at the pad position is different, the outer layer is formed outside the spacer, and finally a spacer is formed. This eliminates the need for a half-tone or gray-tone reticle to ensure process stability, cost savings and process accuracy.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

La présente invention se rapporte à un panneau d'affichage à cristaux liquides, qui comprend un substrat supérieur et un substrat inférieur. Le substrat supérieur ou le substrat inférieur comportent une couche de réserves colorées (1) et une matrice noire (2) placée entre diverses réserves colorées de la couche de réserves colorées (1). Une entretoise (3) se trouve sur la matrice noire (2). L'entretoise (3) comprend un coussin amortisseur (6) constitué du même matériau photorésistant que cette couche de réserves colorées (1), et une couche extérieure (7) située à l'extérieur du coussin amortisseur (6). La présente invention a trait aussi à un procédé de fabrication pour le panneau d'affichage à cristaux liquides, la fabrication d'un substrat supérieur ou d'un substrat inférieur comprenant les étapes suivantes : l'utilisation d'un substrat ; la formation successive d'une matrice noire (2) et d'une couche de réserves colorées (1) sur le substrat ; et la formation d'une entretoise (3) au cours du processus de formation de la couche de réserves colorées (1). Par rapport à l'état de la technique, grâce à la fabrication d'une entretoise (3) pendant la fabrication d'une couche de réserves colorées (1) sur un substrat supérieur ou un substrat inférieur, un masque photographique en demi-teinte ou en niveaux de gris est omis, ce qui permet de garantir la stabilité du processus de fabrication, de réaliser des économies, et d'obtenir également un processus de fabrication précis.
PCT/CN2017/117234 2017-10-17 2017-12-19 Panneau d'affichage à cristaux liquides, et procédé de fabrication associé WO2019075900A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710963578.0A CN107728389A (zh) 2017-10-17 2017-10-17 液晶显示面板及其制作方法
CN201710963578.0 2017-10-17

Publications (1)

Publication Number Publication Date
WO2019075900A1 true WO2019075900A1 (fr) 2019-04-25

Family

ID=61210570

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/117234 WO2019075900A1 (fr) 2017-10-17 2017-12-19 Panneau d'affichage à cristaux liquides, et procédé de fabrication associé

Country Status (2)

Country Link
CN (1) CN107728389A (fr)
WO (1) WO2019075900A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109031766A (zh) * 2018-09-13 2018-12-18 惠科股份有限公司 彩色滤光片及其制作方法和显示面板
CN109739045A (zh) * 2019-03-13 2019-05-10 惠科股份有限公司 显示面板的制造方法及显示面板
CN110568682B (zh) * 2019-08-08 2020-12-25 深圳市华星光电半导体显示技术有限公司 一种显示面板及显示装置
CN111029388A (zh) * 2019-12-20 2020-04-17 武汉华星光电半导体显示技术有限公司 一种显示面板及其制备方法
WO2022067582A1 (fr) * 2020-09-29 2022-04-07 京东方科技集团股份有限公司 Écran d'affichage, procédé de préparation et dispositif d'affichage
CN114326221A (zh) * 2021-12-30 2022-04-12 惠科股份有限公司 显示面板、基板的制作方法及显示装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1530706A (zh) * 2003-03-17 2004-09-22 统宝光电股份有限公司 液晶显示面板的遮光外框的结构及其制造方法
JP2010117482A (ja) * 2008-11-12 2010-05-27 Toppan Printing Co Ltd カラーフィルタの製造方法及びカラーフィルタ、これを用いた液晶表示装置
CN102360143A (zh) * 2011-10-24 2012-02-22 南京中电熊猫液晶显示科技有限公司 液晶显示装置
CN103744222A (zh) * 2013-12-11 2014-04-23 京东方科技集团股份有限公司 彩色滤光片、制作方法及显示装置
CN104091893A (zh) * 2014-06-26 2014-10-08 京东方科技集团股份有限公司 一种彩膜基板及其制备方法、显示面板
CN106292042A (zh) * 2015-05-29 2017-01-04 鸿富锦精密工业（深圳）有限公司 彩色滤光片基板及其制造方法
CN106483719A (zh) * 2016-12-29 2017-03-08 深圳市华星光电技术有限公司 一种电子设备、阵列基板及其制作方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1530706A (zh) * 2003-03-17 2004-09-22 统宝光电股份有限公司 液晶显示面板的遮光外框的结构及其制造方法
JP2010117482A (ja) * 2008-11-12 2010-05-27 Toppan Printing Co Ltd カラーフィルタの製造方法及びカラーフィルタ、これを用いた液晶表示装置
CN102360143A (zh) * 2011-10-24 2012-02-22 南京中电熊猫液晶显示科技有限公司 液晶显示装置
CN103744222A (zh) * 2013-12-11 2014-04-23 京东方科技集团股份有限公司 彩色滤光片、制作方法及显示装置
CN104091893A (zh) * 2014-06-26 2014-10-08 京东方科技集团股份有限公司 一种彩膜基板及其制备方法、显示面板
CN106292042A (zh) * 2015-05-29 2017-01-04 鸿富锦精密工业（深圳）有限公司 彩色滤光片基板及其制造方法
CN106483719A (zh) * 2016-12-29 2017-03-08 深圳市华星光电技术有限公司 一种电子设备、阵列基板及其制作方法

Also Published As

Publication number Publication date
CN107728389A (zh) 2018-02-23

Similar Documents

Publication Publication Date Title
WO2019075900A1 (fr) Panneau d'affichage à cristaux liquides, et procédé de fabrication associé
WO2017008369A1 (fr) Panneau d'affichage à cristaux liquides de type coa et son procédé de fabrication
CN107272232B (zh) 一种液晶显示面板的制造方法
US10620472B2 (en) Display substrate, manufacturing method thereof and display device
JP4344725B2 (ja) 液晶表示装置およびその製造方法
WO2017008370A1 (fr) Procédé de fabrication permettant de fabriquer un afficheur à cristaux liquides de type intégré à réseau et filtre coloré, et structure d'un afficheur à cristaux liquides de type intégré à réseau et filtre coloré
WO2016173210A1 (fr) Procédé de fabrication d'une matrice noire
US20060232728A1 (en) Liquid crystal display and fabricating method thereof
WO2013152602A1 (fr) Substrat de film coloré, procédé de fabrication de celui-ci et dispositif d'affichage à cristaux liquides
WO2019047369A1 (fr) Substrat de réseau et son procédé de fabrication
US20160062170A1 (en) Display Substrate and Fabricating Method Thereof, and Display Device
WO2015100775A1 (fr) Procédé pour exposer un substrat en verre d'un dispositif d'affichage à cristaux liquides
WO2017117835A1 (fr) Panneau d'affichage à cristaux liquides et substrat en réseau et son procédé de fabrication
WO2018120691A1 (fr) Substrat de matrice et son procédé de fqabrication, et dispositif d'affichage
WO2017133136A1 (fr) Procédé de fabrication de substrat de filtre coloré
WO2019071846A1 (fr) Panneau d'affichage à cristaux liquides coa et procédé pour sa fabrication
WO2013170595A1 (fr) Filtre coloré, procédé de fabrication de ce filtre coloré, panneau à cristaux liquides, et dispositif d'affichage
WO2018214198A1 (fr) Procédé de fabrication et masque destinés à un écran d'affichage à cristaux liquides présentant une matrice noire d'une pièce et un espaceur de résine photosensible
WO2018141156A1 (fr) Substrat de réseau et son procédé de fabrication
WO2020052097A1 (fr) Substrat de réseau et panneau d'affichage
WO2019085292A1 (fr) Substrat de matrice à commutateurs actifs, procédé de fabrication de ce substrat, et panneau à cristaux liquides
JP2001033790A (ja) 液晶表示装置及び液晶表示装置の製造方法
WO2014201714A1 (fr) Substrat de verre de filtre coloré (cf), procédé de fabrication de celui-ci et appareil d'affichage à cristaux liquides
WO2018196193A1 (fr) Substrat de réseau, son procédé de fabrication, et panneau d'affichage
TW200422723A (en) Liquid crystal displays with post spacers, and their manufacture

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17929057

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17929057

Country of ref document: EP

Kind code of ref document: A1