WO2019059456A1 - 다공성 금속 필터 - Google Patents
다공성 금속 필터 Download PDFInfo
- Publication number
- WO2019059456A1 WO2019059456A1 PCT/KR2017/013902 KR2017013902W WO2019059456A1 WO 2019059456 A1 WO2019059456 A1 WO 2019059456A1 KR 2017013902 W KR2017013902 W KR 2017013902W WO 2019059456 A1 WO2019059456 A1 WO 2019059456A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- porous filter
- porous
- filter
- cover portion
- porosity
- Prior art date
Links
- 239000002184 metal Substances 0.000 title claims abstract description 61
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 61
- 239000000843 powder Substances 0.000 claims abstract description 46
- 238000000034 method Methods 0.000 claims description 25
- 239000012530 fluid Substances 0.000 claims description 17
- 229910001220 stainless steel Inorganic materials 0.000 claims description 8
- 239000010935 stainless steel Substances 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 6
- 229910000856 hastalloy Inorganic materials 0.000 claims description 4
- 238000001125 extrusion Methods 0.000 claims description 2
- 239000011148 porous material Substances 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000001914 filtration Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
- B01D35/30—Filter housing constructions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
- B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
Definitions
- the present invention relates to a porous metal filter, and more particularly, to a porous metal filter having excellent filtering performance applicable to a manufacturing facility for a semiconductor process.
- a semiconductor device is manufactured on a silicon wafer through a complicated process such as a process of forming various thin films such as an organic film, an insulating film and a metal film, a process of patterning a thin film, a process of implanting ions into a wafer, and a precise manufacturing equipment.
- a high-performance filter which filters mostly foreign substances, is installed in various process facilities for manufacturing semiconductor devices, which are disposed in a clean room and a clean room for manufacturing semiconductor devices.
- Korean Patent No. 10-0900091 a metal element for a high-cleanliness line, and a filter having the metal element (Registered on May 22, 2009) are exemplified as the filter for semiconductor processing.
- Conventional semiconductor process filters have to increase the porosity (the ratio of the voids formed between the particles in the total volume) to maximize the filtering performance while minimizing the pressure and flow loss of the fluid being filtered, A large amount of space is formed in the filter to easily generate cracks and breakage, thereby greatly increasing the defect rate of the semiconductor process filter.
- the conventional semiconductor process filter has a problem in that when the porosity is increased, the filter is easily broken or cracked, so that it is difficult to adjust the size of the filter as large or small as the user desires.
- the filter performance is greatly reduced due to the reduction of the pore and the flow velocity, which is a problem that it is difficult to apply to the equipment for semiconductor processing.
- the present invention provides a porous metal filter having improved durability by preventing cracks, breakage, and damage due to an increase in average porosity while improving an average porosity to be suitable for a semiconductor manufacturing process.
- the porous metal filter includes: a first porous filter including a first porous filter portion opened at both ends and having a porous structure; and a first cover portion disposed at one end of the first porous filter portion; A second porous filter portion disposed inside the first porous filter so as to face the first porous filter portion and having openings at both ends thereof, and a second porous filter portion provided at one end of the second porous filter portion facing the first cover portion, A second porous filter including a second cover portion formed on the first porous filter; And a third porous filter disposed in a space formed between the first porous filter and the second porous filter and including unfired metal powders.
- the third porous filter of the porous metal filter has a first porosity and the first porous filter and the second porous filter have a second porosity that is less than or equal to the first porosity.
- the deviation of the first porosity and the second porosity of the porous metal filter is 10% to 40%, and the second porosity is 30% to 40%.
- the first porous filter and the second porous filter of the porous metal filter are formed by an extrusion process.
- the first porous filter and the second porous filter of the porous metal filter include at least one of stainless steel powder, nickel powder, and hastelloy powder.
- the metal powders constituting the third porous filter of the porous metal filter include at least one of stainless steel powder, nickel powder, and hastelloy powder.
- the metal powders constituting the third porous filter of the porous metal filter have an aspect ratio.
- the first cover portion of the porous metal filter is welded to the first porous filter portion, and the second cover portion is integrally formed with the second porous filter portion.
- the first cover portion and the second cover portion of the porous metal filter are spaced apart from each other and the third porous filter is disposed in a space between the first cover portion and the second cover portion.
- the first cover portion and the second cover portion of the porous metal filter are in contact with each other.
- a first housing coupled to the other end of the first porous filter portion opposite to the first cover portion of the porous metal filter and to the other end of the second porous filter portion opposite to the second cover portion; And a second housing inserted and coupled to the first housing.
- the second housing of the porous metal filter is formed with a fluid inlet portion through which fluid is introduced from the outside, and a fluid outlet portion through which the fluid having passed through the first through third porous filters is discharged is formed in the first housing.
- the first average particle size of the first metal powder constituting the third porous filter of the porous metal filter is in the range of 10% to 20% of the second average particle size of the second porous metal powder constituting the first porous filter and the second porous filter, %to be.
- the porous metal filter according to the present invention is characterized in that outer filters are formed in a wall shape having a relatively low porosity to prevent cracks and cracks from being generated and that the inner filter having a relatively high porosity It is possible to maximize the filtering performance while minimizing the flow rate drop and the pressure loss of the fluid to be filtered by arranging the filter.
- FIG. 1 is a cross-sectional view of a porous metal filter according to an embodiment of the present invention.
- FIG. 2 is an exploded perspective view showing the first porous filter and the second porous filter of FIG. 1;
- FIG. 3 is an enlarged view of the 'A' portion of the third porous filter of FIG.
- FIG. 4 is an enlarged view of the 'B' portion of the first porous filter of FIG.
- FIG. 5 is an enlarged view of the 'C' portion of the second porous filter of FIG.
- first, second, etc. may be used to distinguish between various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another.
- FIG. 1 is a cross-sectional view of a porous metal filter according to an embodiment of the present invention.
- FIG. 2 is an exploded perspective view showing the first porous filter and the second porous filter of FIG. 1;
- FIG. 1 is a cross-sectional view of a porous metal filter according to an embodiment of the present invention.
- FIG. 2 is an exploded perspective view showing the first porous filter and the second porous filter of FIG. 1;
- the porous metal filter 500 includes a first porous filter 100, a second porous filter 200, and a third porous filter 300.
- the porous metal filter 500 may include a housing 400.
- the first porous filter 100 includes a first porous filter portion 110 and a first cover portion 120.
- the first porous filter portion 110 may be formed in a cylindrical shape having a diameter of, for example, L1 and open at both ends.
- the first cover portion 120 may be formed, for example, 1 porous filter unit 110.
- the porous filter unit 110 includes a porous filter unit 110,
- the first porous filter unit 110 is formed in a cylindrical shape and the first cover unit 120 is formed in a circular plate shape in the embodiment of the present invention, A rectangular plate, a polygonal column, or the like corresponding to the shape of the first porous filter part 110.
- the first cover part 120 may have a shape such as a triangular shape, a square shape, And may be formed in various shapes.
- the first cover part 120 may be coupled to the end of the first porous filter part 110 by welding or the like, and the first cover part 120 may have porosity or no porosity.
- the second porous filter 200 is disposed inside the first porous filter 100 and the center of the second porous filter 200 is aligned with the center of the first porous filter 100.
- the second porous filter 200 includes a second porous filter portion 210 and a second cover portion 220.
- the second porous filter portion 210 may be formed in a cylindrical shape having a diameter of L2 (L2 ⁇ L1) smaller than L1 and open at both ends, for example.
- the second cover part 220 is formed integrally with one end of the second porous filter part 210 and the second cover part 220 is formed integrally with the first porous filter 100, The first cover portion 120 of the first embodiment.
- the second porous filter portion 210 is formed in a cylindrical shape and the second cover portion 220 is formed in a circular plate shape in the embodiment of the present invention
- the second cover part 220 may have various shapes such as a triangular plate, a rectangular plate, a polygonal plate, and the like corresponding to the shape of the second porous filter part 210 And may be formed in various shapes.
- the second porous filter 200 is disposed inside the first porous filter 100 and the second porous filter 200 is formed in a smaller size than the first porous filter 100, And the second porous filter part 210 are mutually spaced apart from each other and the first cover part 110 and the second cover part 210 are disposed to face each other.
- the third porous filter 300 is disposed in a space formed between the first porous filter 100 and the second porous filter 200.
- the third porous filter 300 includes, for example, first metal powders having a high porosity in an uncured state.
- the third porous filter 300 is filled in a space formed between the first porous filter portion 110 and the second porous filter portion 210 and between the first cover portion 120 and the second cover portion 220 .
- the first cover part 120 and the second cover part 220 are spaced apart from each other by a predetermined distance. However, the first cover part 120 and the second cover part 220 May be in contact with each other.
- the housing 400 includes a first housing 410 and a second housing 420.
- the first porous filter (100) and the second porous filter (200) are fixed to the first housing (410).
- the other end of the first porous filter part 110 facing the first cover part 120 of the first porous filter 100 is coupled to the first housing 410 and the other end of the second porous filter part 200
- the other end of the second porous filter portion 210 facing the cover portion 220 is also coupled to the first housing 410.
- the first housing 410 may be made of a metal material having excellent corrosion resistance or a synthetic resin material having excellent corrosion resistance.
- the second housing 420 is formed in a tubular shape having a space for accommodating the first porous filter 100 and the second porous filter 100 is accommodated in the receiving space of the second housing 420, The end of the housing 420 is firmly coupled to the first housing 410.
- the second housing 420 is formed with a fluid inlet portion 425 through which fluid to be filtered from the outside is introduced and a fluid outlet portion 415 through which the filtered fluid is passed is formed in the first housing 410.
- FIG. 3 is an enlarged view of the 'A' portion of the third porous filter of FIG.
- the third porous filter 300 described above includes non-sintered first metal powders.
- the first metal powders constituting the third porous filter 300 include, for example, a metal powder of at least one of stainless steel powder, nickel powder and hostelloy powder.
- stainless steel powder can be made of SUS 316 and SUS 316L materials with excellent corrosion resistance.
- the unconsolidated first metal powders forming the third porous filter 300 may, for example, have different sizes, and the first metal powders have an average first average size D1.
- the first average size D1 of the first metal powder may be, for example, from about 10 [mu] m to about 20 [mu] m.
- a third porous filter 300 comprised of a first metal powder having a first average size (D1) of between about 10 microns and about 20 microns has a first porosity (the porosity occupies the entire volume of the third porous filter Quot; ratio ").
- the first porosity can be set suitably for the filter for semiconductor manufacturing process, and the first porosity can be changed according to the demand of the user.
- the third porous filter 300 made of the first metal powder may be formed with a first thickness, and the first metal shells may have different aspect ratios with different aspect ratios.
- FIG. 4 is an enlarged view of the 'B' portion of the first porous filter of FIG. 5 is an enlarged view of the 'C' portion of the second porous filter of FIG.
- a first porous filter 100 and a second porous filter 200 which surround the unconsolidated third porous filter 300 to prevent scattering of the third porous filter 300, ) Can be formed by extruding or sintering the metal powders.
- the first porous filter 100 and the second porous filter 200 include a second metal powder comprising at least one of stainless steel powder, nickel powder, and hostelloy powder.
- the second metal powder constituting the first porous filter 100 and the second porous filter 200 is made of, for example, stainless steel powder, nickel powder, and hostelloy powder .
- the second metal powder has a second average size D2, D3, the second average size D2, D3 being, for example, Is larger than the average size (D1).
- the first average size D1 of the first metal powder forming the third porous filter 300 is greater than the first average size D1 of the second porous filter 100, May be about 10% of the second average size (D2, D3) of the powder.
- the first average size D1 of the first metal powder of the third porous filter 300 is about 10 microns
- the second average of the second metal powders of the first and second porous filters 100 may be about 100 mu m.
- the first porous filter 100 and the second porous filter 200 having a second average size D2 and D3 that is greater than the first average size D1 of the third porous filter 300, (Defined as the ratio of voids to the total volume of the first and second porous filters) that is less than or equal to the first porosity of the first porous filter. That is, the first porosity is formed higher than the second porosity.
- the difference between the first porosity of the third porous filter 300 and the second porosity of the first and second porous filters 100,200 may be between about 10% and about 40%.
- the second porosity of the first and second porous filters 100,200 is, for example, from about 30% to about 40%, while the second porosity is varied high or low, .
- the first porosity can be about 40% to about 70%, and if the second porosity is about 40%, the first porosity can be about 50% to about 80% .
- the second porosity of the first and second porous filters 100,200 when the second porosity of the first and second porous filters 100,200 is between about 10% and about 40% lower than the first porosity of the third porous filter 300,
- the porous filters (100, 200) have a strength that is not easily cracked or broken due to a relatively low porosity, thereby preventing cracking and breakage of the porous metal filter.
- the third porous filter 300 in a non-porous state inside the first and second porous filters 100 and 200 while preventing cracks and breakage of the first and second porous filters 100 and 200, 500 can be increased to improve the filtering performance while lowering the fluid flow rate and pressure loss of the porous metal filter 500.
- the outer filters are formed in a wall shape having a relatively low porosity to prevent occurrence of cracks and cracks, and at the same time, an inner side having a relatively high porosity in powder form between the outer side filters It is possible to maximize the filtering performance while minimizing the flow rate drop and the pressure loss of the fluid to be filtered by arranging the filter.
- the porous metal filter according to an embodiment of the present invention forms or forms a third porous filter by filling or arranging the first metal powder between the first porous filter and the second porous filter,
- the porosity of the third porous filter can be maximized, the defect rate can be greatly reduced, unnecessary inspection steps can be omitted, and productivity can be greatly improved as compared with the prior art.
- the present invention can be applied to a high-performance filter mounted on a semiconductor facility or the like or various microfiltration apparatuses.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Filtering Materials (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
Claims (13)
- 양단이 개구되며 다공이 형성된 제1 다공성 필터부 및 상기 제1 다공성 필터부의 일측 단부에 배치된 제1 커버부를 포함하는 제1 다공성 필터;양단이 개구된 형상으로 상기 제1 다공성 필터의 내부에 상기 제1 다공성 필터부와 마주보게 배치되며 다공이 형성된 제2 다공성 필터부 및 상기 제1 커버부와 마주하게 상기 제2 다공성 필터부의 일측 단부에 형성된 제2 커버부를 포함하는 제2 다공성 필터; 및상기 제1 다공성 필터 및 상기 제2 다공성 필터의 사이에 형성된 공간에 배치되며 미소결 된 금속 분말들을 포함하는 제3 다공성 필터를 포함하는 다공성 금속 필터.
- 제1항에 있어서,상기 제3 다공성 필터는 제1 공극률을 갖고, 상기 제1 다공성 필터 및 상기 제2 다공성 필터는 상기 제1 공극률 이하인 제2 공극률을 갖는 다공성 금속 필터.
- 제2항에 있어서,상기 제1 공극률 및 상기 제2 공극률의 편차는 10% 내지 40%이고, 상기 제2 공극률은 30% 내지 40%인 다공성 금속 필터.
- 제1항에 있어서,상기 제1 다공성 필터 및 상기 제2 다공성 필터는 압출 공정에 의하여 형성된 다공성 금속 필터.
- 제4항에 있어서,상기 제1 다공성 필터 및 상기 제2 다공성 필터는 스테인리스 스틸 분말, 니켈 분말 및 하스텔로이(hastelloy) 분말 중 적어도 하나를 포함하는 다공성 금속 필터.
- 제1항에 있어서,상기 제3 다공성 필터를 이루는 상기 금속 분말들은 스테인리스 스틸 분말, 니켈 분말 및 하스텔로이(hastelloy) 분말 중 적어도 하나를 포함하는 다공성 금속 필터.
- 제6항에 있어서,상기 제3 다공성 필터를 이루는 상기 금속 분말들은 이형률(aspect ration)를 갖는 다공성 금속 필터.
- 제1항에 있어서,상기 제1 커버부는 상기 제1 다공성 필터부에 용접에 의하여 결합 되고, 상기 제2 커버부는 상기 제2 다공성 필터부에 일체로 형성된 다공성 금속 필터.
- 제1항에 있어서,상기 제1 커버부 및 상기 제2 커버부는 상호 이격되어 배치되며, 상기 제1 커버부 및 상기 제2 커버부 사이의 공간에는 상기 제3 다공성 필터가 배치된 다공성 금속 필터.
- 제1항에 있어서,상기 제1 커버부 및 상기 제2 커버부는 상호 접촉된 다공성 금속 필터.
- 제1항에 있어서,상기 제1 커버부와 대향하는 상기 제1 다공성 필터부의 타측 단부 및 상기 제2 커버부와 대향하는 상기 제2 다공성 필터부의 타측 단부에 결합된 제1 하우징 및 상기 제1 다공성 필터가 삽입되며 상기 제1 하우징에 결합 되는 제2 하우징을 포함하는 하우징을 갖는 다공성 금속 필터.
- 제11항에 있어서,상기 제2 하우징에는 외부로부터 유체가 도입되는 유체 도입부가 형성되고, 상기 제1 하우징에는 상기 제1 내지 제3 다공성 필터들을 통과한 유체가 배출되는 유체 배출부가 형성된 다공성 금속 필터.
- 제1항에 있어서,상기 제3 다공성 필터를 이루는 제1 금속 분말의 제1 평균 입자 사이즈는 상기 제1 다공성 필터 및 상기 제2 다공성 필터를 이루는 제2 금속 분말의 제2 평균 입자 사이즈의 10% 내지 20%인 다공성 금속 필터.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170121517 | 2017-09-21 | ||
KR10-2017-0121517 | 2017-09-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2019059456A1 true WO2019059456A1 (ko) | 2019-03-28 |
Family
ID=65810383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2017/013902 WO2019059456A1 (ko) | 2017-09-21 | 2017-11-30 | 다공성 금속 필터 |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2019059456A1 (ko) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3134263B2 (ja) * | 1991-12-05 | 2001-02-13 | 株式会社キッツ | 金属フィルタ |
JP2002119810A (ja) * | 2000-10-13 | 2002-04-23 | New Japan Radio Co Ltd | 金属エアフィルタ装置及び金属エアフィルタの製造方法 |
KR100900091B1 (ko) * | 2008-11-25 | 2009-05-28 | 주식회사 태광에스씨티 | 고청정 라인용 메탈 엘리멘트 및 그를 구비하는 필터 |
KR20100103462A (ko) * | 2007-10-24 | 2010-09-27 | 모트 코포레이션 | 소결 섬유 필터 |
US20110036409A1 (en) * | 2008-05-30 | 2011-02-17 | Nec Display Solutions, Ltd. | Filter, cooling injection member, and cooling wind injection method |
-
2017
- 2017-11-30 WO PCT/KR2017/013902 patent/WO2019059456A1/ko active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3134263B2 (ja) * | 1991-12-05 | 2001-02-13 | 株式会社キッツ | 金属フィルタ |
JP2002119810A (ja) * | 2000-10-13 | 2002-04-23 | New Japan Radio Co Ltd | 金属エアフィルタ装置及び金属エアフィルタの製造方法 |
KR20100103462A (ko) * | 2007-10-24 | 2010-09-27 | 모트 코포레이션 | 소결 섬유 필터 |
US20110036409A1 (en) * | 2008-05-30 | 2011-02-17 | Nec Display Solutions, Ltd. | Filter, cooling injection member, and cooling wind injection method |
KR100900091B1 (ko) * | 2008-11-25 | 2009-05-28 | 주식회사 태광에스씨티 | 고청정 라인용 메탈 엘리멘트 및 그를 구비하는 필터 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100435912C (zh) | 具有极小死空间的可置换薄膜组件 | |
CN101029797A (zh) | 用于炉的基座 | |
US4902319A (en) | Gas filter | |
EP3970825A1 (en) | Filter with interconnected hollow elements and method of use | |
WO2019059456A1 (ko) | 다공성 금속 필터 | |
EP3970836A1 (en) | Branched filter and method of use | |
EP3970826A1 (en) | Branched filter and method of use | |
CN102448583B (zh) | 气体分离模块 | |
CA2366913A1 (en) | Chromatography devices and flow distributor arrangements used in chromatography devices | |
WO2017018590A1 (ko) | 입체필터를 포함하는 원심필터 | |
KR101985706B1 (ko) | 다공성 금속 필터 | |
WO2011129552A2 (ko) | 메탈섬유를 이용한 수처리용 메탈필터 제조방법 | |
WO2013168883A1 (ko) | 고농도 및 저농도의 2층 구조를 갖는 필터 여과재 | |
EP3970828A1 (en) | Branched filter and method of use | |
WO2020086633A1 (en) | Filter panel with macro, micro and nano structures | |
WO2019143165A1 (ko) | 세라믹 필터 여과막 모듈 | |
US11857900B2 (en) | Gas filtration apparatus | |
JPH11347323A (ja) | 焼結体フィルタとその製造方法 | |
CN211838489U (zh) | 一种具有防沉积结构的薄膜传感器 | |
KR102032764B1 (ko) | 복합 필터 | |
EP3970827A1 (en) | Filter with interconnected hollow elements and method of use | |
WO2024063175A1 (ko) | 미세플라스틱 시료 채취 및 크기 분배 장치 | |
CN111214898B (zh) | 复合过滤器 | |
CN210325954U (zh) | 一种排气装置 | |
JP3136369B2 (ja) | サイズ分離ユニットとその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 17925601 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 17925601 Country of ref document: EP Kind code of ref document: A1 |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 17925601 Country of ref document: EP Kind code of ref document: A1 |
|
32PN | Ep: public notification in the ep bulletin as address of the adressee cannot be established |
Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 22/01/2021). |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 17925601 Country of ref document: EP Kind code of ref document: A1 |