WO2019052090A1 - Reinforced toughened filter, graduated neutral-density filter plating device and plating method therefor - Google Patents

Reinforced toughened filter, graduated neutral-density filter plating device and plating method therefor Download PDF

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WO2019052090A1
WO2019052090A1 PCT/CN2017/119986 CN2017119986W WO2019052090A1 WO 2019052090 A1 WO2019052090 A1 WO 2019052090A1 CN 2017119986 W CN2017119986 W CN 2017119986W WO 2019052090 A1 WO2019052090 A1 WO 2019052090A1
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layer
thickness
substrate
thickest portion
layers
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PCT/CN2017/119986
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French (fr)
Chinese (zh)
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张卫良
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江门市卡色光学有限公司
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Priority claimed from CN201710842319.2A external-priority patent/CN107523789B/en
Priority claimed from CN201710841567.5A external-priority patent/CN107526127A/en
Application filed by 江门市卡色光学有限公司 filed Critical 江门市卡色光学有限公司
Publication of WO2019052090A1 publication Critical patent/WO2019052090A1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters

Definitions

  • the invention relates to the field of optical filters, in particular to a reinforced tempering filter, a gradient gray filter plating device and a plating method thereof.
  • the commonly used filter refers to an optical physical filter, which is a photographic accessory with a light filtering effect.
  • the most commonly used filters are the medium gray filter (ND) and the gradient gray filter (GND).
  • the whole gray filter (ND) lens is gray-black, and the main function is to filter light, reduce the amount of light passing through, increase the exposure time, and is often used to capture a motion blur scene;
  • the gradient gray filter (GND) lens The upper part is grayish black, and the lower part is transparent. It is mainly used to balance the light ratio, so that the dark part and the highlight part of the picture are properly exposed. It is suitable for large light ratio environments, such as shooting sunrise and dusk scenes.
  • the filter is composed of a substrate and a film layer.
  • the materials used in the common filter are ordinary glass and resin, the physical strength of the substrate is insufficient, and the surface of the substrate is attached to the surface of the substrate.
  • Most of the materials used in the upper layer are SiO 2 and Cr materials, which tend to cause the physical hardness of the filter to be low and cause some pollution to the environment.
  • the thickness of the film layer must be gradually decreasing from one side to the other side, so the color of one side of the gradient gray filter is grayish black, and gradually changes to the other side. Light, so that the other side becomes a transparent color.
  • a device for plating a gradient gray filter is required, and the gradient gray filter plating device includes a baffle for shielding the film material, and it is difficult to plate the plate if a common structure is used. The gradient linear effect of the filter produces a large benefit.
  • an object of the present invention is to provide a tempered filter, a gradient gray filter plating apparatus, and a plating method thereof, which can improve the hardness of the filter and reduce environmental pollution, and can make the gradient gray filter
  • the thickness of the film in the mirror exhibits a good linear change, giving the filter a better gradual effect.
  • a reinforced tempering filter comprising: a substrate and a film layer, wherein the film layer is formed by alternately laminating a dielectric layer composed of Al 2 O 3 and a metal film layer composed of T i
  • the film layer is attached only to one side surface of the substrate or to both side surfaces of the substrate at the same time.
  • the material of the film layer is composed of Al 2 O 3 and T i , which replaces the conventional SiO 2 and Cr materials, and can improve the hardness and environmental protection of the filter while satisfying the filtered light. In addition, the position of the film layer is improved.
  • the substrate is made of chemically tempered glass.
  • the hardness and strength of chemically tempered glass are larger than those of conventional glass and resin materials.
  • the use of chemically tempered glass materials to make substrates can improve the hardness of the filter and improve the physical strength of the filter.
  • the first layer in the film layer is a dielectric layer, the first layer being attached to the surface of the substrate.
  • the first layer attached to the surface of the substrate is a dielectric layer composed of Al 2 O 3
  • the second layer is a metal film layer composed of T i , and the other layers are formed in such a manner that the metal layers of the dielectric layer are alternately laminated. .
  • the thickness of different portions of each layer is uniform or the thickness of each layer exhibits a linear decreasing tendency from one end to the other.
  • the filter is a medium gray filter, and the main function is to filter light, reduce the amount of light passing through, increase the exposure time, and is often used to capture a dynamic bokeh scene.
  • the filter is a medium gray gradient filter with a gradation effect, which is mainly used to balance the light ratio, so that in the picture Both the dark and the highlights are reasonably exposed, suitable for environments with large light ratios, such as for sunrise and dusk.
  • the thickness of the thickest portion of the first layer in the film layer is 15 nm or 20 nm.
  • the thickness of the thickest portion of the first layer is 20 nm
  • the thickness of the thickest portion of the second layer It is 2.5 nm
  • the thickness of the thickest portion of the third layer is 105.43 nm
  • the thickness of the thickest portion of the fourth layer is 5.79 nm
  • the thickness of the thickest portion of the fifth layer is 101.44 nm.
  • the filter of the above thickness distribution is of the order of 0.3, corresponding to the first step of dimming.
  • the thickness of the thickest portion of the first layer is 20 nm
  • the thickness of the thickest portion of the second layer It is 3.85 nm
  • the thickness of the thickest part of the third layer is 88.27 nm
  • the thickness of the thickest part of the fourth layer is 3.9 nm
  • the thickness of the thickest part of the fifth layer is 79.04 nm
  • the thickness of the thickest part of the sixth layer is 7.6.
  • Nm the thickness of the thickest part of the seventh layer is 77.19 nm.
  • the filter of the above thickness distribution is 0.6 level, corresponding to 2 steps of dimming.
  • the thickness of the thickest portion of the first layer is 15 nm
  • the thickness of the thickest portion of the second layer It is 3.5 nm
  • the thickness of the thickest part of the third layer is 88.38 nm
  • the thickness of the thickest part of the fourth layer is 2.23 nm
  • the thickness of the thickest part of the fifth layer is 81.48 nm
  • the thickness of the thickest part of the sixth layer is 4.93.
  • the thickness of the thickest part of the seventh layer is 76.46 nm.
  • the filter of the above thickness distribution is 0.9 level, corresponding to 3 steps of dimming.
  • the thickness of the thickest portion of the first layer is 20 nm
  • the thickness of the thickest portion of the second layer It is 5.3 nm
  • the thickness of the thickest part of the third layer is 83.28 nm
  • the thickness of the thickest part of the fourth layer is 12.4 nm
  • the thickness of the thickest part of the fifth layer is 65.96 nm
  • the thickness of the thickest part of the sixth layer is 8.5.
  • the thickness of the thickest part of the seventh layer is 76.65 nm.
  • the filter of the above thickness distribution is 1.2 level, corresponding to 4 steps of dimming.
  • the thickness of the thickest portion of the first layer is 20 nm
  • the thickness of the thickest portion of the second layer It is 12 nm
  • the thickness of the thickest part of the third layer is 63.27 nm
  • the thickness of the thickest part of the fourth layer is 16 nm
  • the thickness of the thickest part of the fifth layer is 81.68 nm
  • the thickness of the thickest part of the sixth layer is 7.85 nm.
  • the thickness of the thickest portion of the seventh layer is 77.54 nm.
  • the filter of the above thickness distribution is 1.5 grades, corresponding to 5 divisions of light reduction.
  • the thickness of the thickest portion of the first layer is 20 nm
  • the thickness of the thickest portion of the second layer It is 5.72 nm
  • the thickness of the thickest part of the third layer is 62.65 nm
  • the thickness of the thickest part of the fourth layer is 13.24 nm
  • the thickness of the thickest part of the fifth layer is 85.82 nm
  • the thickness of the thickest part of the sixth layer is 12.2.
  • the thickness of the thickest portion of the seventh layer is 54.11 nm
  • the thickness of the thickest portion of the eighth layer is 15.44 nm
  • the thickness of the thickest portion of the ninth layer is 55.07 nm.
  • the filter of the above thickness distribution is 1.8 grades, corresponding to 6 divisions of light reduction.
  • the thickness of the thickest portion of the first layer is 15 nm
  • the thickness of the thickest portion of the second layer It is 11.62 nm
  • the thickness of the thickest part of the third layer is 72.49 nm
  • the thickness of the thickest part of the fourth layer is 31.84 nm
  • the thickness of the thickest part of the fifth layer is 76.49 nm
  • the thickness of the thickest part of the sixth layer is 26.38.
  • the thickness of the thickest part of the seventh layer is 133.54 nm
  • the thickness of the thickest part of the eighth layer is 80.22 nm
  • the thickness of the thickest part of the ninth layer is 69.26 nm
  • the thickness of the thickest part of the tenth layer is 19.31 nm.
  • the thickness of the thickest part of the eleventh layer is 53.17 nm.
  • the filter of the above thickness distribution is of the order of 3.0, corresponding to a reduction of 10 steps.
  • Figure 10 is a flow chart showing the specific steps of the plating method of the gradient gray filter plating apparatus of the present invention.
  • the baffle fixture bracket 220 is provided with a notch 221 on the surface thereof, and the baffle jig is connected to the baffle jig bracket through the notch 221, and can be freely passed through the notch 221 according to the thickness of the film layer 120 to be plated as needed. Adjust the vertical distance between the baffle fixture and the mounting opening 211.
  • the corresponding different film materials are sequentially selected by the film evaporation device for evaporation.
  • a gradient gray filter plating device comprises a film evaporation device, a coated umbrella disk 210, a baffle fixture 230 and a baffle fixture bracket 220.
  • the overall shape of the baffle fixture 230 is a rectangle, and the block is One side of the plate fixture 230 is fixed at the notch 221 of the baffle fixture bracket 220, and the other side of the opposite side of the baffle fixture 230 is a zigzag shape composed of a finite number of isosceles triangles, and the baffle fixture 230
  • the ratio of length to width is 44:13, and the ratio of height to base of the isosceles triangle is 25:1.
  • the zigzag shape is composed of a finite isosceles triangle, and the number of isosceles triangles is larger, the unobstructed gap between adjacent isosceles triangles is smaller, and the linear transition effect is better, so that the gradient of the filter The ash effect will be better.

Abstract

A reinforced toughened filter, comprising a substrate (110) and a film layer (120). The film layer (120) is formed by alternately stacking a dielectric layer consisting of Al2O3 and a metal film layer consisting of Ti; the film layer (120) is merely attached to one side surface of the substrate (110) or simultaneously attached to both side surfaces of the substrate (110). Also disclosed are a graduated neutral-density filter plating device and a plating method applying the graduated neutral-density filter plating device.

Description

一种加强钢化滤镜、渐变灰滤镜镀制装置及其镀制方法Strengthening tempering filter, gradient gray filter plating device and plating method thereof 技术领域Technical field
本发明涉及光学滤镜领域，特别是一种加强钢化滤镜、渐变灰滤镜镀制装置及其镀制方法。The invention relates to the field of optical filters, in particular to a reinforced tempering filter, a gradient gray filter plating device and a plating method thereof.
背景技术Background technique
目前，通常所说到的滤镜，是指光学物理滤镜，是一种具有光线过滤效果的摄影配件。在风光摄影中，一般使用最多的滤镜就是中灰滤镜(ND)和渐变灰滤镜(GND)。所述中灰滤镜(ND)整张镜片为灰黑色，主要功能是过滤光线、降低通光量、增加曝光时间，常用于拍摄出动感虚化情景；所述渐变灰滤镜(GND)镜片的上半部分为灰黑色，下半部分为透明色，主要用于平衡光比，使画面中的暗部与高光部均合理曝光，适用于大光比的环境，比如用于拍摄日出及黄昏的场景。所述滤镜是由基片和膜层构成的，由于常见滤镜中的基片采用的材料大部分都是普通的玻璃和树脂，耐摔物理强度有所欠缺，另外，附着在基片表面上的膜层采用的材料大部分都是SiO 2和Cr材料，往往会导致滤镜的物理硬度偏低以及对环境造成一定的污染。 At present, the commonly used filter refers to an optical physical filter, which is a photographic accessory with a light filtering effect. In landscape photography, the most commonly used filters are the medium gray filter (ND) and the gradient gray filter (GND). The whole gray filter (ND) lens is gray-black, and the main function is to filter light, reduce the amount of light passing through, increase the exposure time, and is often used to capture a motion blur scene; the gradient gray filter (GND) lens The upper part is grayish black, and the lower part is transparent. It is mainly used to balance the light ratio, so that the dark part and the highlight part of the picture are properly exposed. It is suitable for large light ratio environments, such as shooting sunrise and dusk scenes. The filter is composed of a substrate and a film layer. Since most of the materials used in the common filter are ordinary glass and resin, the physical strength of the substrate is insufficient, and the surface of the substrate is attached to the surface of the substrate. Most of the materials used in the upper layer are SiO 2 and Cr materials, which tend to cause the physical hardness of the filter to be low and cause some pollution to the environment.
另外，为了使渐变灰滤镜达到渐变效果，膜层的厚度必须从一侧向另一侧呈现出逐渐递减的趋势，因此渐变灰滤镜的一侧颜色为灰黑色，向另一侧逐渐变淡，从而使另一侧变为透明色。为了使滤镜具有渐变效果，需要用到镀制渐变灰滤镜的装置，渐变灰滤镜镀制装置中包含用于遮挡膜料的挡板，若采用普通结构的挡板难以对镀制的滤镜的渐变线性效果产生较大的益处。In addition, in order to achieve the gradient effect of the gradient gray filter, the thickness of the film layer must be gradually decreasing from one side to the other side, so the color of one side of the gradient gray filter is grayish black, and gradually changes to the other side. Light, so that the other side becomes a transparent color. In order to make the filter have a gradual effect, a device for plating a gradient gray filter is required, and the gradient gray filter plating device includes a baffle for shielding the film material, and it is difficult to plate the plate if a common structure is used. The gradient linear effect of the filter produces a large benefit.
发明内容Summary of the invention
为解决上述问题，本发明的目的在于提供一种加强钢化滤镜、渐变灰滤镜镀制装置及其镀制方法，能够提高滤镜的硬度以及减少对环境的污染，同时能够使渐变灰滤镜中的膜层厚度呈现出良好的线性变化，使滤镜具有更好渐变效果。In order to solve the above problems, an object of the present invention is to provide a tempered filter, a gradient gray filter plating apparatus, and a plating method thereof, which can improve the hardness of the filter and reduce environmental pollution, and can make the gradient gray filter The thickness of the film in the mirror exhibits a good linear change, giving the filter a better gradual effect.
本发明解决其问题所采用的技术方案是：The technical solution adopted by the present invention to solve the problem is:
一种加强钢化滤镜，其特征在于：包括基片和膜层，所述膜层是由Al 2O 3构成的电介质层和由T i构成的金属膜层通过交替层叠而形成的，所述膜层只附着于基片的单侧表面或者同时附着于基片的两侧表面。膜层的材料采用Al 2O 3和T i构成，替代以往常用的SiO 2和Cr材料，在满足过滤光线的情况下能够提高滤镜的硬度和环保性，另外，镀制膜层的位置方式有两种，一种是单面镀制，另一种是双面镀制。 A reinforced tempering filter comprising: a substrate and a film layer, wherein the film layer is formed by alternately laminating a dielectric layer composed of Al 2 O 3 and a metal film layer composed of T i The film layer is attached only to one side surface of the substrate or to both side surfaces of the substrate at the same time. The material of the film layer is composed of Al 2 O 3 and T i , which replaces the conventional SiO 2 and Cr materials, and can improve the hardness and environmental protection of the filter while satisfying the filtered light. In addition, the position of the film layer is improved. There are two types, one is single-sided plating, and the other is double-sided plating.
进一步地，所述基片采用的材料是化学钢化玻璃。化学钢化玻璃的硬度和强度都比以往常用的普通玻璃和树脂材料要大，采用化学钢化玻璃材料来制作基片，能够提高滤镜的硬度，提高滤镜的耐摔物理强度。Further, the substrate is made of chemically tempered glass. The hardness and strength of chemically tempered glass are larger than those of conventional glass and resin materials. The use of chemically tempered glass materials to make substrates can improve the hardness of the filter and improve the physical strength of the filter.
进一步地，所述电介质层和金属膜层的总层数包括5-15层。膜层中的电介质层和金属 膜层相互交替层叠，且电介质层和金属膜层的总层数由5-15层不等。Further, the total number of layers of the dielectric layer and the metal film layer includes 5-15 layers. The dielectric layer and the metal film layer in the film layer are alternately laminated with each other, and the total number of layers of the dielectric layer and the metal film layer is varied from 5 to 15 layers.
进一步地，膜层中的第一层为电介质层，所述第一层附着于基片的表面。附着于基片表面的第一层是Al 2O 3构成的电介质层，第二层是T i构成的金属膜层，按照电介质层金属膜层交替层叠的形式如此类推出其他层数的材料组成。 Further, the first layer in the film layer is a dielectric layer, the first layer being attached to the surface of the substrate. The first layer attached to the surface of the substrate is a dielectric layer composed of Al 2 O 3 , and the second layer is a metal film layer composed of T i , and the other layers are formed in such a manner that the metal layers of the dielectric layer are alternately laminated. .
进一步地，每一层的不同部位的厚度均保持一致或者每一层的厚度由一端向另一端呈现出线性递减的趋势。当膜层中的每一层的不同部位的厚度均保持一致时，所述滤镜为中灰滤镜，主要功能是过滤光线、降低通光量、增加曝光时间，常用于拍摄出动感虚化情景；当膜层中的每一层的厚度由一端向另一端呈现出线性递减的趋势时，所述滤镜为中灰渐变滤镜，具有渐变效果，主要用于平衡光比，使画面中的暗部与高光部均合理曝光，适用于大光比的环境，比如用于拍摄日出及黄昏的场景。Further, the thickness of different portions of each layer is uniform or the thickness of each layer exhibits a linear decreasing tendency from one end to the other. When the thickness of different parts of each layer in the film layer is consistent, the filter is a medium gray filter, and the main function is to filter light, reduce the amount of light passing through, increase the exposure time, and is often used to capture a dynamic bokeh scene. When the thickness of each layer in the film layer shows a linear decreasing trend from one end to the other end, the filter is a medium gray gradient filter with a gradation effect, which is mainly used to balance the light ratio, so that in the picture Both the dark and the highlights are reasonably exposed, suitable for environments with large light ratios, such as for sunrise and dusk.
进一步地，膜层中的第一层的最厚部位的厚度是15nm或者20nm。Further, the thickness of the thickest portion of the first layer in the film layer is 15 nm or 20 nm.
进一步地，当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为5层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是2.5nm，第三层最厚部位的厚度是105.43nm，第四层最厚部位的厚度是5.79nm，第五层最厚部位的厚度是101.44nm。上述厚度分布的滤镜为0.3级别，相对应减光1档。Further, when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 5 layers, the thickness of the thickest portion of the first layer is 20 nm, and the thickness of the thickest portion of the second layer It is 2.5 nm, the thickness of the thickest portion of the third layer is 105.43 nm, the thickness of the thickest portion of the fourth layer is 5.79 nm, and the thickness of the thickest portion of the fifth layer is 101.44 nm. The filter of the above thickness distribution is of the order of 0.3, corresponding to the first step of dimming.
进一步地，当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为7层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是3.85nm，第三层最厚部位的厚度是88.27nm，第四层最厚部位的厚度是3.9nm，第五层最厚部位的厚度是79.04nm，第六层最厚部位的厚度是7.6nm，第七层最厚部位的厚度是77.19nm。上述厚度分布的滤镜为0.6级别，相对应减光2档。Further, when the film layer is attached only to the one-side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 7 layers, the thickness of the thickest portion of the first layer is 20 nm, and the thickness of the thickest portion of the second layer It is 3.85 nm, the thickness of the thickest part of the third layer is 88.27 nm, the thickness of the thickest part of the fourth layer is 3.9 nm, the thickness of the thickest part of the fifth layer is 79.04 nm, and the thickness of the thickest part of the sixth layer is 7.6. Nm, the thickness of the thickest part of the seventh layer is 77.19 nm. The filter of the above thickness distribution is 0.6 level, corresponding to 2 steps of dimming.
进一步地，当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为7层时，第一层最厚部位的厚度是15nm，第二层最厚部位的厚度是3.5nm，第三层最厚部位的厚度是88.38nm，第四层最厚部位的厚度是2.23nm，第五层最厚部位的厚度是81.48nm，第六层最厚部位的厚度是4.93nm，第七层最厚部位的厚度是76.46nm。上述厚度分布的滤镜为0.9级别，相对应减光3档。Further, when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 7 layers, the thickness of the thickest portion of the first layer is 15 nm, and the thickness of the thickest portion of the second layer It is 3.5 nm, the thickness of the thickest part of the third layer is 88.38 nm, the thickness of the thickest part of the fourth layer is 2.23 nm, the thickness of the thickest part of the fifth layer is 81.48 nm, and the thickness of the thickest part of the sixth layer is 4.93. Nm, the thickness of the thickest part of the seventh layer is 76.46 nm. The filter of the above thickness distribution is 0.9 level, corresponding to 3 steps of dimming.
进一步地，当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为7层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是5.3nm，第三层最厚部位的厚度是83.28nm，第四层最厚部位的厚度是12.4nm，第五层最厚部位的厚度是65.96nm，第六层最厚部位的厚度是8.5nm，第七层最厚部位的厚度是76.65nm。上述厚度分布的滤镜为1.2级别，相对应减光4档。Further, when the film layer is attached only to the one-side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 7 layers, the thickness of the thickest portion of the first layer is 20 nm, and the thickness of the thickest portion of the second layer It is 5.3 nm, the thickness of the thickest part of the third layer is 83.28 nm, the thickness of the thickest part of the fourth layer is 12.4 nm, the thickness of the thickest part of the fifth layer is 65.96 nm, and the thickness of the thickest part of the sixth layer is 8.5. Nm, the thickness of the thickest part of the seventh layer is 76.65 nm. The filter of the above thickness distribution is 1.2 level, corresponding to 4 steps of dimming.
进一步地，当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为7层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是12nm，第三层最厚部位的厚度是63.27nm，第四层最厚部位的厚度是16nm，第五层最厚部位的厚度是81.68nm，第六层最厚部位的厚度是7.85nm，第七层最厚部位的厚度是77.54nm。上述厚度分布的滤镜为1.5级别，相对应减光5档。Further, when the film layer is attached only to the one-side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 7 layers, the thickness of the thickest portion of the first layer is 20 nm, and the thickness of the thickest portion of the second layer It is 12 nm, the thickness of the thickest part of the third layer is 63.27 nm, the thickness of the thickest part of the fourth layer is 16 nm, the thickness of the thickest part of the fifth layer is 81.68 nm, and the thickness of the thickest part of the sixth layer is 7.85 nm. The thickness of the thickest portion of the seventh layer is 77.54 nm. The filter of the above thickness distribution is 1.5 grades, corresponding to 5 divisions of light reduction.
进一步地，当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为9层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是5.72nm，第三层最厚部位的厚度是62.65nm，第四层最厚部位的厚度是13.24nm，第五层最厚部位的厚度是85.82nm，第六层最厚部位的厚度是12.2nm，第七层最厚部位的厚度是54.11nm，第八层最厚部位的厚度是15.44nm，第九层最厚部位的厚度是55.07nm。上述厚度分布的滤镜为1.8级别，相对应减光6档。Further, when the film layer is attached only to the one-side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 9 layers, the thickness of the thickest portion of the first layer is 20 nm, and the thickness of the thickest portion of the second layer It is 5.72 nm, the thickness of the thickest part of the third layer is 62.65 nm, the thickness of the thickest part of the fourth layer is 13.24 nm, the thickness of the thickest part of the fifth layer is 85.82 nm, and the thickness of the thickest part of the sixth layer is 12.2. Nm, the thickness of the thickest portion of the seventh layer is 54.11 nm, the thickness of the thickest portion of the eighth layer is 15.44 nm, and the thickness of the thickest portion of the ninth layer is 55.07 nm. The filter of the above thickness distribution is 1.8 grades, corresponding to 6 divisions of light reduction.
进一步地，当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为11层时，第一层最厚部位的厚度是15nm，第二层最厚部位的厚度是11.62nm，第三层最厚部位的厚度是72.49nm，第四层最厚部位的厚度是31.84nm，第五层最厚部位的厚度是76.49nm，第六层最厚部位的厚度是26.38nm，第七层最厚部位的厚度是133.54nm，第八层最厚部位的厚度是80.22nm，第九层最厚部位的厚度是69.26nm，第十层最厚部位的厚度是19.31nm，第十一层最厚部位的厚度是53.17nm。上述厚度分布的滤镜为3.0级别，相对应减光10档。Further, when the film layer is attached only to the one-side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 11 layers, the thickness of the thickest portion of the first layer is 15 nm, and the thickness of the thickest portion of the second layer It is 11.62 nm, the thickness of the thickest part of the third layer is 72.49 nm, the thickness of the thickest part of the fourth layer is 31.84 nm, the thickness of the thickest part of the fifth layer is 76.49 nm, and the thickness of the thickest part of the sixth layer is 26.38. Nm, the thickness of the thickest part of the seventh layer is 133.54 nm, the thickness of the thickest part of the eighth layer is 80.22 nm, the thickness of the thickest part of the ninth layer is 69.26 nm, and the thickness of the thickest part of the tenth layer is 19.31 nm. The thickness of the thickest part of the eleventh layer is 53.17 nm. The filter of the above thickness distribution is of the order of 3.0, corresponding to a reduction of 10 steps.
进一步地，当膜层同时附着于基片的两侧表面时，两侧膜层中的金属膜层的厚度是当膜层只附着于基片的单侧表面时的对应厚度的一半，两侧膜层中的电介质层的厚度与当膜层只附着于基片的单侧表面时的对应厚度一致。当双面镀制时，膜层中由Ti金属材料构成的金属膜层的厚度为单面镀制时厚度的一半，由Al 2O 3材料构成的电介质层的厚度与单面镀制时一致。 Further, when the film layer is simultaneously attached to both side surfaces of the substrate, the thickness of the metal film layer in the film layers on both sides is half of the corresponding thickness when the film layer is attached only to the one-side surface of the substrate, both sides The thickness of the dielectric layer in the film layer is consistent with the corresponding thickness when the film layer is only attached to the one-sided surface of the substrate. When double-sided plating, the thickness of the metal film layer made of Ti metal material in the film layer is half of the thickness of single-sided plating, and the thickness of the dielectric layer composed of Al 2 O 3 material is the same as that of single-sided plating. .
进一步地，当膜层同时附着于基片的两侧表面时，基片两侧膜层的厚度以基片为中心呈现出相对称的结构分布。当双面镀制时，基片两侧的膜层的结构和厚度均以基片为中心形成对称。Further, when the film layer is simultaneously attached to both side surfaces of the substrate, the thickness of the film layers on both sides of the substrate exhibits a symmetrical structural distribution centering on the substrate. When double-sided plating, the structure and thickness of the film layers on both sides of the substrate are symmetrically centered on the substrate.
一种渐变灰滤镜镀制装置，其特征在于：包括膜料蒸发装置、用于固定基片的镀膜伞盘、用于线性遮挡膜料的挡板治具和用于连接镀膜伞盘和挡板治具的挡板治具支架，所述挡板治具支架的顶端连接至镀膜伞盘，所述挡板治具支架还连接至挡板治具，所述膜料蒸发装置位于挡板治具的下方。A gradient gray filter plating device, comprising: a film evaporation device, a coated umbrella plate for fixing a substrate, a baffle fixture for linear shielding film material, and a connection for coating a coated umbrella disk and a block a baffle fixture bracket of the fixture, the top end of the baffle fixture bracket is connected to the coated umbrella tray, the baffle fixture bracket is also connected to the baffle fixture, and the film evaporation device is located at the baffle plate With the bottom.
进一步地，所述镀膜伞盘表面开设有一个以上的用于固定基片的安装口，所述安装口位于挡板治具的上方。Further, the surface of the coated umbrella disk is provided with more than one mounting opening for fixing the substrate, and the mounting opening is located above the baffle fixture.
进一步地，所述挡板治具支架表面开设有用于调节档板治具高度的槽口，所述档板治具通过槽口连接至档板治具支架。Further, the surface of the baffle fixture bracket is provided with a notch for adjusting the height of the baffle fixture, and the baffle jig is connected to the baffle fixture bracket through the slot.
进一步地，所述挡板治具的整体形状为矩形，所述挡板治具的一边固定在挡板治具支架的槽口位置，所述挡板治具的对侧另一边为有限个等腰三角形组成的锯齿状。Further, the overall shape of the baffle fixture is rectangular, one side of the baffle fixture is fixed at a notch position of the baffle fixture bracket, and the other side of the baffle jig is limited, etc. The waist triangle is composed of a jagged shape.
进一步地，所述挡板治具的长度与宽度的比值为44:13。Further, the ratio of the length to the width of the baffle fixture is 44:13.
进一步地，所述等腰三角形的高与底边的比值为25:1。Further, the ratio of the height of the isosceles triangle to the base is 25:1.
一种应用上述渐变灰滤镜镀制装置的镀制方法，其特征在于，包括以下步骤：A plating method using the above gradient gray filter plating apparatus, characterized in that the method comprises the following steps:
S1：开始；S1: Start;
S2:将渐变灰滤镜镀制装置放置在真空环境中；S2: placing the gradient gray filter plating device in a vacuum environment;
S3：所述膜料蒸发装置对膜料进行处理后以气相的形式蒸发出来；S3: the film evaporation device processes the film material and evaporates in the form of a gas phase;
S4：所述档板治具会对蒸发出来的膜料进行线性遮挡；S4: the baffle fixture linearly blocks the evaporated film material;
S5：所述膜料会以气相的形式线性沉积到基片的表面；S5: the film material is linearly deposited on the surface of the substrate in the form of a gas phase;
S6：结束。S6: End.
本发明的有益效果是：本发明采用的一种加强钢化滤镜、渐变灰滤镜镀制装置及其镀制方法，其中本发明采用的一种加强钢化滤镜，膜层是由Al 2O 3构成的电介质层和由T i构成的金属膜层通过交替层叠而形成的，镀制膜层的方式包括单面镀制和双面镀制，滤镜膜层中的电介质层采用Al 2O 3材料替代常用的SiO 2材料，由于Al 2O 3的硬度SiO 2的硬度要大，所以能够增强滤镜的硬度，另外，滤镜膜层中的金属膜层采用T i材料替代Cr材料，由于T i的环保性比Cr要好，所以能够减少对环境的污染，提高滤镜的环保性。另外，本发明采用的一种渐变灰滤镜镀制装置及其镀制方法，包括膜料蒸发装置、镀膜伞盘、挡板治具和挡板治具支架，能够使膜料蒸发出来经过挡板治具并以气相的形式沉积在基片的表面，实现蒸发镀膜的过程，由于挡板治具能够对蒸发的膜料进行线性遮挡，从而使基片上膜层的厚度从一侧向另一侧呈现出线性递减的趋势，不仅能使滤镜具备渐变效果，而且还能够提高滤镜的线性度。 The invention has the beneficial effects that the invention adopts a reinforced tempering filter, a gradient ash filter plating device and a plating method thereof, wherein the invention adopts a reinforced tempering filter, and the film layer is made of Al 2 O The dielectric layer composed of 3 and the metal film layer composed of T i are formed by alternately laminating, and the manner of plating the film layer includes single-sided plating and double-sided plating, and the dielectric layer in the filter film layer is Al 2 O. 3 to replace the common material SiO 2 material, the hardness of SiO Al 2 O 3 is larger hardness 2, it is possible to increase the hardness of the filters, further, the metal film employed in the filter layer material substitution Cr material T i, Since T i environmental protection is better than Cr, it is possible to reduce environmental pollution and improve the environmental protection filter. In addition, the gradient gray filter plating device and the plating method thereof used in the invention include a film evaporation device, a coated umbrella plate, a baffle fixture and a baffle fixture bracket, which can evaporate the film material through the block. The jig is deposited on the surface of the substrate in the form of a vapor phase to realize the process of evaporating the coating. Since the baffle fixture can linearly block the evaporated film, the thickness of the film on the substrate is from one side to the other. The side exhibits a linear decreasing trend that not only gives the filter a gradual effect, but also increases the linearity of the filter.
附图说明DRAWINGS
下面结合附图和实例对本发明作进一步说明。The invention will now be further described with reference to the accompanying drawings and examples.
图1是本发明一种加强钢化滤镜的第一实施例的总体结构图；Figure 1 is a general structural view of a first embodiment of a reinforced tempering filter of the present invention;
图2是本发明一种加强钢化滤镜的第二实施例的总体结构图；Figure 2 is a general structural view of a second embodiment of a reinforced tempering filter of the present invention;
图3是本发明一种加强钢化滤镜的第一实施例的膜层结构图；Figure 3 is a structural view of a film layer of a first embodiment of a tempered tempering filter of the present invention;
图4是本发明一种加强钢化滤镜的第二实施例的膜层结构图；Figure 4 is a structural view of a film layer of a second embodiment of a reinforced tempering filter of the present invention;
图5是本发明一种渐变灰滤镜镀制装置的渐变灰滤镜的基本结构图；Figure 5 is a basic structural view of a gradient gray filter of a gradient gray filter plating apparatus of the present invention;
图6是本发明一种渐变灰滤镜镀制装置的镀膜伞盘、挡板治具和挡板治具支架之间的位置连接关系图；6 is a view showing a positional connection relationship between a coated umbrella disk, a baffle jig and a baffle jig of a gradient gray filter plating device according to the present invention;
图7是本发明一种渐变灰滤镜镀制装置的镀膜伞盘安装口、挡板治具和挡板治具支架之间的位置关系图；7 is a positional relationship diagram between a coated umbrella disk mounting port, a baffle jig and a baffle jig bracket of a gradient gray filter plating device according to the present invention;
图8是本发明一种渐变灰滤镜镀制装置的挡板治具的具体结构图；Figure 8 is a detailed structural view of a baffle jig of a gradient gray filter plating apparatus of the present invention;
图9是本发明一种渐变灰滤镜镀制装置的挡板治具的锯齿状A部位放大图；9 is an enlarged view of a sawtooth A portion of a baffle fixture of a gradient gray filter plating apparatus according to the present invention;
图10是本发明一种渐变灰滤镜镀制装置的镀制方法的具体步骤流程图。Figure 10 is a flow chart showing the specific steps of the plating method of the gradient gray filter plating apparatus of the present invention.
具体实施方式Detailed ways
一种加强钢化滤镜，包括基片110和膜层120，所述膜层120是由Al 2O 3构成的电介质层和由T i构成的金属膜层通过交替层叠而形成的，所述膜层120附着于基片110的表面；所述膜层120只附着于基片110的单侧表面或者同时附着于基片110的两侧表面；所述基片110是采用化学钢化玻璃制作而成。 A reinforced steel filters, comprising the substrate 110 and the film 120, the film 120 is a dielectric layer and a metal film layer composed of T i made of Al 2 O 3 is formed by alternately stacked, said membrane The layer 120 is attached to the surface of the substrate 110; the film layer 120 is attached only to one side surface of the substrate 110 or to both side surfaces of the substrate 110; the substrate 110 is made of chemically tempered glass. .
参照图1和图2，本发明一种加强钢化滤镜的两种不同实施例的总体结构图。在满足滤镜过滤光线的情况下，所述膜层120附着于基片110的位置形式有两种，其中一种如图1所示，所述膜层120只附着于基片110的单侧表面，为单面镀制；另外一种如图2所示，所述膜层120同时附着于基片110的两侧表面，为双面镀制。所述基片110是采用化学钢化玻璃制作而成，硬度强，从而使滤镜的耐摔物理强度得到提高，区别于树脂薄膜、树脂版和普通玻璃薄板。Referring to Figures 1 and 2, a general structural view of two different embodiments of a reinforced tempering filter of the present invention is shown. In the case where the filter filter light is satisfied, the film layer 120 is attached to the substrate 110 in two positions, one of which is as shown in FIG. 1, and the film layer 120 is attached only to one side of the substrate 110. The surface is one-side plating; the other is as shown in FIG. 2, and the film layer 120 is simultaneously attached to both side surfaces of the substrate 110, and is double-sided plated. The substrate 110 is made of chemically tempered glass and has high hardness, so that the physical strength of the filter is improved, which is different from the resin film, the resin plate and the ordinary glass sheet.
一种加强钢化滤镜，所述电介质层和金属膜层的总层数包括5-15层，且膜层120中的第一层为电介质层，第一层附着于基片110的表面。另外，每一层的不同部位的厚度均保持一致或者每一层的厚度由一端向另一端呈现出线性递减的趋势。当电介质层和金属膜层的总层数不同时，膜层120中的每一层的厚度会有所改变，当双面镀制时，两侧膜层120中的金属膜层的厚度是单面镀制时对应厚度的一半，两侧膜层120中的电介质层的厚度与单面镀制时的对应厚度一致。同时，当双面镀制时，膜层120同时附着于基片110的两侧表面，基片110两侧膜层120的厚度以基片110为中心呈现出相对称的结构分布。A reinforced tempering filter, the total number of layers of the dielectric layer and the metal film layer comprising 5-15 layers, and the first layer of the film layer 120 is a dielectric layer, and the first layer is attached to the surface of the substrate 110. In addition, the thickness of different portions of each layer is uniform or the thickness of each layer exhibits a linear decreasing tendency from one end to the other. When the total number of layers of the dielectric layer and the metal film layer are different, the thickness of each layer in the film layer 120 is changed. When double-sided plating, the thickness of the metal film layer in the film layers 120 on both sides is single. When the surface plating is half of the thickness, the thickness of the dielectric layer in the film layers 120 on both sides coincides with the corresponding thickness at the time of single-sided plating. Meanwhile, when double-sided plating, the film layer 120 is simultaneously attached to both side surfaces of the substrate 110, and the thickness of the film layer 120 on both sides of the substrate 110 exhibits a symmetrical structural distribution centering on the substrate 110.
参照图3和图4，本发明一种加强钢化滤镜的两种不同施例的膜层120结构图；所述膜层120是由Al 2O 3构成的电介质层和由T i构成的金属膜层通过交替层叠而形成的，所述电介 质层和金属膜层的总层数包括5-15层。本发明的膜层120中的电介质层采用的是Al 2O 3材料，替代了以往的SiO 2材料，由于Al 2O 3的硬度要比SiO 2的要大，从而使滤镜的硬度得到提高；另外，膜层120中的金属膜层120采用的是食品级的高纯度Ti金属材料，替代了以往的Cr金属材料，由于Ti金属材料的环保性要比Cr金属材料的要好，从而减少了对环境的污染。在满足滤镜良好的过滤光线的效果下，所述膜层120中的电介质层和金属膜层的总层数可以是5-15层不等。如图3所示的是膜层120中的电介质层和金属膜层的总层数为7层的情况，如图4所示的是膜层120中的电介质层和金属膜层的总层数为11层的情况。 3 and FIG. 4, the present invention is a configuration diagram of a reinforced layer 120 of two different embodiments of steel filter; the dielectric layer 120 is a film made of Al 2 O 3 and a metal composed of T i The film layer is formed by alternately laminating, and the total number of layers of the dielectric layer and the metal film layer includes 5-15 layers. The dielectric layer in the film layer 120 of the present invention is made of an Al 2 O 3 material instead of the conventional SiO 2 material. Since the hardness of the Al 2 O 3 is larger than that of the SiO 2 , the hardness of the filter is improved. In addition, the metal film layer 120 in the film layer 120 is made of a food-grade high-purity Ti metal material, which replaces the conventional Cr metal material, and the environmental friendliness of the Ti metal material is better than that of the Cr metal material, thereby reducing the Pollution to the environment. The total number of layers of the dielectric layer and the metal film layer in the film layer 120 may vary from 5 to 15 layers under the effect of satisfying the filter light of the filter. As shown in FIG. 3, the total number of layers of the dielectric layer and the metal film layer in the film layer 120 is 7 layers, and as shown in FIG. 4, the total number of layers of the dielectric layer and the metal film layer in the film layer 120 is shown in FIG. For the 11th floor case.
为了满足滤镜过滤光线的作用，所述膜层120中的电介质层和金属膜层均有一定的厚度。In order to satisfy the effect of the filter filtering light, the dielectric layer and the metal film layer in the film layer 120 have a certain thickness.
当所述膜层120中每一层的不同部位的厚度均保持一致时，所述滤镜为中灰滤镜(ND)，主要功能是过滤光线、降低通光量、增加曝光时间，常用于拍摄出动感虚化情景；When the thickness of different parts of each layer in the film layer 120 is consistent, the filter is a medium gray filter (ND), and the main function is to filter light, reduce the amount of light passing through, increase the exposure time, and is often used for shooting. a situation of ambiguity;
当所述膜层120每一层的厚度由一端向另一端呈现出线性递减的趋势时，所述滤镜为中灰渐变滤镜(GND)，具有渐变效果，主要用于平衡光比，使画面中的暗部与高光部均合理曝光，适用于大光比的环境，比如用于拍摄日出及黄昏的场景。When the thickness of each layer of the film layer 120 shows a linear decreasing trend from one end to the other end, the filter is a medium gray gradient filter (GND) with a gradation effect, mainly used to balance the light ratio, so that Both the dark part and the highlight part of the picture are reasonably exposed, suitable for environments with large light ratios, such as for shooting sunrises and dusks.
对于中灰滤镜(ND)和中灰渐变滤镜(GND)，所述中灰滤镜(ND)的金属膜层和电介质层的厚度和中灰渐变滤镜(GND)中的对应的金属膜层和电介质层的最厚部位的厚度一致，具体如下列表格所示，列出了在单面镀制膜层120时，电介质层和金属膜层的总层数为5层、7层、9层和11层的厚度分布情况。所述滤镜是通过控制档位来达到减光或平衡光比的效果，当每一层的材料厚度不同时，滤镜的级别和档位也相应改变。所述滤镜一般有0.3、0.6、0.9、1.2、1.5、1.8、2.4和3.0级别，相对应减光1、2、3、4、5、6、8和10档位，档位不同会导致曝光的时间也相应改变。For the medium gray filter (ND) and the medium gray gradient filter (GND), the thickness of the metal film layer and the dielectric layer of the medium gray filter (ND) and the corresponding metal in the medium gray gradient filter (GND) The thickness of the thickest part of the film layer and the dielectric layer are the same, as shown in the following table, and the total number of layers of the dielectric layer and the metal film layer is 5 layers and 7 layers when the single-sided film layer 120 is coated. The thickness distribution of the 9th and 11th layers. The filter achieves the effect of dimming or balancing the light ratio by controlling the gear position. When the material thickness of each layer is different, the level and the gear position of the filter are also changed accordingly. The filters generally have grades of 0.3, 0.6, 0.9, 1.2, 1.5, 1.8, 2.4, and 3.0, corresponding to dimming 1, 2, 3, 4, 5, 6, 8, and 10 gear positions, resulting in different gear positions. The exposure time also changes accordingly.
当单面镀制时，电介质层和金属膜层的总层数为5层的厚度分布情况如下表1所示，对应滤镜为0.3级别，档位为1档：When single-sided plating, the total thickness of the dielectric layer and the metal film layer is 5 layers, as shown in Table 1, the corresponding filter is 0.3 level, and the gear position is 1st gear:
层数和材料Number of layers and materials 厚度thickness
第一层(Al 2O 3) First layer (Al 2 O 3 ) 2020
第二层(Ti)Second layer (Ti) 2.52.5
第三层(Al 2O 3) Third layer (Al 2 O 3 ) 105.43105.43
第四层(Ti)Fourth layer (Ti) 5.795.79
第五层(Al 2O 3) Fifth layer (Al 2 O 3 ) 101.44101.44
表1Table 1
当单面镀制时，电介质层和金属膜层的总层数为7层的第一种厚度分布情况如下表2所示，对应滤镜为0.6级别，档位为2档：When single-sided plating, the first thickness distribution of the total number of layers of dielectric layer and metal film layer is 7 as shown in Table 2, the corresponding filter is 0.6 level, and the gear position is 2 files:
层数和材料Number of layers and materials 厚度thickness
第一层(Al 2O 3) First layer (Al 2 O 3 ) 2020
第二层(Ti)Second layer (Ti) 3.853.85
第三层(Al 2O 3) Third layer (Al 2 O 3 ) 88.2788.27
第四层(Ti)Fourth layer (Ti) 3.93.9
第五层(Al 2O 3) Fifth layer (Al 2 O 3 ) 79.0479.04
第六层(Ti)Sixth layer (Ti) 7.67.6
第七层(Al 2O 3) The seventh layer (Al 2 O 3 ) 77.1977.19
表2Table 2
当单面镀制时，电介质层和金属膜层的总层数为7层的第二种厚度分布情况如下表3所示，对应滤镜为0.9级别，档位为3档：When the single-sided plating is performed, the second thickness distribution of the total number of layers of the dielectric layer and the metal film layer is 7 as shown in Table 3, the corresponding filter is 0.9 level, and the gear position is 3 files:
层数和材料Number of layers and materials 厚度thickness
第一层(Al 2O 3) First layer (Al 2 O 3 ) 1515
第二层(Ti)Second layer (Ti) 3.53.5
第三层(Al 2O 3) Third layer (Al 2 O 3 ) 88.3888.38
第四层(Ti)Fourth layer (Ti) 2.232.23
第五层(Al 2O 3) Fifth layer (Al 2 O 3 ) 81.4881.48
第六层(Ti)Sixth layer (Ti) 4.934.93
第七层(Al 2O 3) The seventh layer (Al 2 O 3 ) 76.4676.46
表3table 3
当单面镀制时，电介质层和金属膜层的总层数为7层的第三种厚度分布情况如下表4所示，对应滤镜为1.2级别，档位为4档：When single-sided plating, the third thickness distribution of the total number of layers of dielectric layer and metal film layer is 7 as shown in Table 4, the corresponding filter is 1.2 level, and the gear position is 4 files:
层数和材料Number of layers and materials 厚度thickness
第一层(Al 2O 3) First layer (Al 2 O 3 ) 2020
第二层(Ti)Second layer (Ti) 5.35.3
第三层(Al 2O 3) Third layer (Al 2 O 3 ) 83.2883.28
第四层(Ti)Fourth layer (Ti) 12.412.4
第五层(Al 2O 3) Fifth layer (Al 2 O 3 ) 65.9665.96
第六层(Ti)Sixth layer (Ti) 8.58.5
第七层(Al 2O 3) The seventh layer (Al 2 O 3 ) 76.6576.65
表4Table 4
当单面镀制时，电介质层和金属膜层的总层数为7层的第四种厚度分布情况如下表5所示，对应滤镜为1.5级别，档位为5档：When single-sided plating, the fourth thickness distribution of the total number of layers of dielectric layer and metal film layer is 7 as shown in Table 5, the corresponding filter is 1.5 level, and the gear position is 5 files:
层数和材料Number of layers and materials 厚度thickness
第一层(Al 2O 3) First layer (Al 2 O 3 ) 2020
第二层(Ti)Second layer (Ti) 1212
第三层(Al 2O 3) Third layer (Al 2 O 3 ) 63.3763.37
第四层(Ti)Fourth layer (Ti) 1616
第五层(Al 2O 3) Fifth layer (Al 2 O 3 ) 81.6881.68
第六层(Ti)Sixth layer (Ti) 7.857.85
第七层(Al 2O 3) The seventh layer (Al 2 O 3 ) 77.5477.54
表5table 5
当单面镀制时，电介质层和金属膜层的总层数为9层的厚度分布情况如下表6所示，对应滤镜为1.8级别，档位为6档：When single-sided plating, the thickness distribution of the total number of layers of the dielectric layer and the metal film layer is 9 as shown in Table 6, the corresponding filter is 1.8 level, and the gear position is 6 files:
层数和材料Number of layers and materials 厚度thickness
第一层(Al 2O 3) First layer (Al 2 O 3 ) 2020
第二层(Ti)Second layer (Ti) 5.725.72
第三层(Al 2O 3) Third layer (Al 2 O 3 ) 62.6562.65
第四层(Ti)Fourth layer (Ti) 13.2413.24
第五层(Al 2O 3) Fifth layer (Al 2 O 3 ) 85.8285.82
第六层(Ti)Sixth layer (Ti) 12.212.2
第七层(Al 2O 3) The seventh layer (Al 2 O 3 ) 54.1154.11
第八层(Ti)The eighth layer (Ti) 15.4415.44
第九层(Al 2O 3) The ninth layer (Al 2 O 3 ) 55.0755.07
表6Table 6
当单面镀制时，电介质层和金属膜层的总层数为11层的厚度分布情况如下表7所示，对应滤镜为3.0级别，档位为10档：When single-sided plating, the total thickness of the dielectric layer and the metal film layer is 11 layers, as shown in Table 7 below, the corresponding filter is 3.0 level, and the gear position is 10 files:
层数和材料Number of layers and materials 厚度thickness
第一层(Al 2O 3) First layer (Al 2 O 3 ) 1515
第二层(Ti)Second layer (Ti) 11.6211.62
第三层(Al 2O 3) Third layer (Al 2 O 3 ) 72.4972.49
第四层(Ti)Fourth layer (Ti) 31.8431.84
第五层(Al 2O 3) Fifth layer (Al 2 O 3 ) 76.4976.49
第六层(Ti)Sixth layer (Ti) 26.3826.38
第七层(Al 2O 3) The seventh layer (Al 2 O 3 ) 133.54133.54
第八层(Ti)The eighth layer (Ti) 80.2280.22
第九层(Al 2O 3) The ninth layer (Al 2 O 3 ) 69.2669.26
第十层(Ti)Tenth layer (Ti) 19.3119.31
第十一层(Al 2O 3) The eleventh layer (Al 2 O 3 ) 53.1753.17
表7Table 7
上述表1-7的厚度单位均为纳米(nm)。The thickness units of the above Tables 1-7 are all nanometers (nm).
上述表1-7是单面镀制的情况，膜层120中的第一层均为电介质层，所述第一层附着于基片110的表面，第二层是T i构成的金属膜层，按照电介质层金属膜层交替层叠的形式如此类推出其他层数的材料组成。 Table 1-7 is a single-sided plating, the first layer are dielectric film layer 120, the first layer is attached to the surface of the substrate 110, the second layer is a metal film composed of T i According to the manner in which the dielectric layer metal film layers are alternately laminated, the material composition of the other layers is derived.
当双面镀制时，膜层120中由Ti金属材料构成的金属膜层的厚度变为单面镀制时厚度的一半，由Al 2O 3材料构成的电介质层的厚度与单面镀制时的厚度一致，另外，基片110两边膜层120的结构和厚度以基片110为中心呈现出相对称的分布。 When double-sided plating, the thickness of the metal film layer made of Ti metal material in the film layer 120 becomes half the thickness at the time of single-sided plating, and the thickness of the dielectric layer composed of Al 2 O 3 material is one-sided plating. The thickness of the film 110 is uniform, and the structure and thickness of the film layer 120 on both sides of the substrate 110 exhibit a symmetrical distribution centering on the substrate 110.
渐变灰滤镜是常用物理滤镜的一种，也称为GND滤镜，主要用于平衡光比，使画面中的暗部与高光部均合理曝光，适用于大光比的环境，比如用于拍摄日出及黄昏的场景。渐变灰滤镜结构上包括基片110和膜层120，膜层120中含有黑色材料，为了达到渐变效果，膜层120的厚度必须从一侧向另一侧呈现出逐渐递减的趋势，因此渐变灰滤镜的一侧颜色为灰黑色，向另一侧逐渐变淡，从而使另一侧变为透明色。Gradient gray filter is a kind of common physical filter, also known as GND filter. It is mainly used to balance the light ratio, so that the dark part and the highlight part of the picture are properly exposed. It is suitable for large light ratio environment, such as for shooting day. Out and dusk scenes. The gradient gray filter structure comprises a substrate 110 and a film layer 120. The film layer 120 contains a black material. In order to achieve a gradation effect, the thickness of the film layer 120 must be gradually decreasing from one side to the other side, so the gradient The color of one side of the gray filter is grayish black, and gradually fades to the other side, so that the other side becomes a transparent color.
参照图5，本发明一种渐变灰滤镜镀制装置的渐变灰滤镜的基本结构图。图5为单面镀制的情况，所述膜层120附着于基片110的单侧表面，且膜层120的厚度由一侧向另一侧呈现出逐渐递减的趋势。当双面镀制时，所述膜层120附着于基片110的两侧表面，且两侧的 膜层120的厚度由一侧向另一侧呈现出逐渐递减的趋势，且膜层120的厚度分布以基片110为中心呈现出相对称的结构分布。Referring to Fig. 5, a basic structural view of a gradient gray filter of a gradient gray filter plating apparatus of the present invention is shown. 5 is a case of single-sided plating, the film layer 120 is attached to a single-sided surface of the substrate 110, and the thickness of the film layer 120 tends to gradually decrease from one side to the other side. When double-sided plating, the film layer 120 is attached to both side surfaces of the substrate 110, and the thickness of the film layers 120 on both sides tends to gradually decrease from one side to the other side, and the film layer 120 The thickness distribution exhibits a symmetrical structural distribution centered on the substrate 110.
一种渐变灰滤镜镀制装置，包括膜料蒸发装置、镀膜伞盘210、挡板治具230和挡板治具支架220，所述挡板治具支架220的顶端连接至镀膜伞盘210，所述挡板治具支架220还连接至挡板治具230，所述膜料蒸发装置位于挡板治具230的下方。所述镀膜伞盘210表面开设有一个以上的用于固定基片110的安装口211，所述安装口211位于挡板治具230的上方。所述挡板治具支架220表面开设有用于调节档板治具高度的槽口221，所述档板治具通过槽口221连接至档板治具支架。A gradient gray filter plating device comprises a film evaporation device, a coated umbrella disk 210, a baffle fixture 230 and a baffle fixture bracket 220, and a top end of the baffle fixture bracket 220 is connected to the coated umbrella tray 210 The baffle fixture bracket 220 is further connected to the baffle fixture 230, and the film evaporation device is located below the baffle fixture 230. The coated umbrella disk 210 is provided with one or more mounting openings 211 for fixing the substrate 110, and the mounting opening 211 is located above the baffle fixture 230. The surface of the baffle fixture bracket 220 is provided with a notch 221 for adjusting the height of the baffle fixture, and the baffle jig is connected to the baffle fixture bracket through the notch 221 .
参照6和图7，本发明一种渐变灰滤镜镀制装置的镀膜伞盘、镀膜伞盘安装口、挡板治具和挡板治具支架之间的位置关系图。所述镀膜伞盘210包括多个安装口211，所述安装口211用于放置基片110。所述每一个安装口211的下方都对应有一个挡板治具230，每一个挡板治具230都对应有一个挡板治具支架220将挡板治具230和镀膜伞盘210进行连接。所述挡板治具支架220表面开设有槽口221，所述档板治具通过槽口221连接至档板治具支架，能够根据需要镀制的膜层120厚度来通过槽口221来自由调节档板治具和安装口211之间的垂直距离。Referring to FIG. 6 and FIG. 7 , a positional relationship diagram between a coated umbrella disk, a coated umbrella disk mounting port, a baffle fixture, and a baffle jig bracket of a gradient gray filter plating apparatus according to the present invention is shown. The coated umbrella disk 210 includes a plurality of mounting openings 211 for placing the substrate 110. A baffle fixture 230 is disposed under each of the mounting ports 211. Each of the baffle fixtures 230 has a baffle fixture bracket 220 for connecting the baffle fixture 230 and the coated umbrella tray 210. The baffle fixture bracket 220 is provided with a notch 221 on the surface thereof, and the baffle jig is connected to the baffle jig bracket through the notch 221, and can be freely passed through the notch 221 according to the thickness of the film layer 120 to be plated as needed. Adjust the vertical distance between the baffle fixture and the mounting opening 211.
所述膜料蒸发装置位于镀膜伞盘210、挡板治具230和挡板治具支架220的下方，所述膜料蒸发装置能够对膜料进行处理后以气相的形式向上蒸发出来，蒸发的膜料向上经过挡板治具230并以气相的形式沉积在基片110的表面，实现蒸发镀膜的过程，由于挡板治具230能够对蒸发的膜料进行线性遮挡，从而使基片110上膜层120的厚度从一侧向另一侧呈现出线性递减的趋势，从而使滤镜具备渐变效果，成功镀制渐变灰滤镜。The film evaporation device is located below the coated umbrella tray 210, the baffle fixture 230 and the baffle fixture bracket 220. The film evaporation device can process the film material and evaporate upward in the form of a gas phase, and evaporate. The film material is passed up through the baffle fixture 230 and deposited on the surface of the substrate 110 in the form of a gas phase to realize the process of evaporating the coating film. Since the baffle fixture 230 can linearly block the evaporated film material, the substrate 110 is placed on the substrate 110. The thickness of the film layer 120 exhibits a linear decreasing tendency from one side to the other, thereby giving the filter a gradual effect and successfully plating the gradient gray filter.
当需要在基片110表面镀制多层不同材料的膜层120时，通过所述膜料蒸发装置依次选择对应的不同膜料进行处理蒸发。When it is required to apply a plurality of layers 120 of different materials on the surface of the substrate 110, the corresponding different film materials are sequentially selected by the film evaporation device for evaporation.
当需要双面镀制时，需要将基片110的上下表面对调，并重新安装在镀膜伞盘210的安装口211位置对基片110的另一表面进行镀制，则能实现双面镀制效果。When double-sided plating is required, the upper and lower surfaces of the substrate 110 need to be reversed, and the other surface of the substrate 110 is plated at the position of the mounting opening 211 of the coated umbrella disk 210, so that double-sided plating can be realized. effect.
一种渐变灰滤镜镀制装置，包括膜料蒸发装置、镀膜伞盘210、挡板治具230和挡板治具支架220，所述挡板治具230的整体形状为矩形，所述挡板治具230的一边固定在挡板治具支架220的槽口221位置，所述挡板治具230的对侧另一边为有限个等腰三角形组成的锯齿状，所述挡板治具230的长度与宽度的比值为44:13，所述等腰三角形的高与底边的比值为25:1。A gradient gray filter plating device comprises a film evaporation device, a coated umbrella disk 210, a baffle fixture 230 and a baffle fixture bracket 220. The overall shape of the baffle fixture 230 is a rectangle, and the block is One side of the plate fixture 230 is fixed at the notch 221 of the baffle fixture bracket 220, and the other side of the opposite side of the baffle fixture 230 is a zigzag shape composed of a finite number of isosceles triangles, and the baffle fixture 230 The ratio of length to width is 44:13, and the ratio of height to base of the isosceles triangle is 25:1.
参照图8和图9，本发明一种渐变灰滤镜镀制装置的挡板治具的具体结构图和锯齿状A部位放大图。所述挡板治具230的整体形状为矩形，其中一边为锯齿状；所述挡板治具230的长度为220mm，宽度(包含锯齿状部位)为65mm，其中锯齿状部位的长度也为220mm，宽度为15mm。所述锯齿状部位是由有限个等腰三角形组成，相当于对蒸发膜料的遮挡面积逐渐缩小，进而达到从完全遮挡到完全无遮挡的线性过渡。由于锯齿状由有限个等腰三角形组成，且等腰三角形的个数越多，相邻等腰三角形之间的无遮挡空隙就会越小，线性过渡的效 果会越好，从而滤镜的渐变灰效果会更好。Referring to FIG. 8 and FIG. 9, a specific structural diagram of a baffle jig of a gradient gray filter plating apparatus and an enlarged view of a sawtooth A portion are provided. The overall shape of the baffle fixture 230 is rectangular, one side of which is serrated; the length of the baffle fixture 230 is 220 mm, the width (including the zigzag portion) is 65 mm, and the length of the zigzag portion is also 220 mm. The width is 15mm. The serrated portion is composed of a finite number of isosceles triangles, which is equivalent to a gradual reduction of the occlusion area of the evaporating film material, thereby achieving a linear transition from complete occlusion to complete occlusion. Since the zigzag shape is composed of a finite isosceles triangle, and the number of isosceles triangles is larger, the unobstructed gap between adjacent isosceles triangles is smaller, and the linear transition effect is better, so that the gradient of the filter The ash effect will be better.
参照图10，本发明一种渐变灰滤镜镀制装置的镀制方法的具体步骤流程图：Referring to FIG. 10, a flow chart of specific steps of a plating method of a gradient gray filter plating apparatus of the present invention is as follows:
S1：开始。S1: Start.
S2:将渐变灰滤镜镀制装置放置在真空环境中；本发明采用真空镀膜技术，所述真空镀膜是一种由物理方法产生薄膜材料的技术，在真空环境中材料的原子从加热源离析出来打到被镀物体的表面上。S2: placing the gradient gray filter plating device in a vacuum environment; the present invention adopts a vacuum coating technology, which is a technique for physically producing a film material, in which a material atom is separated from a heating source in a vacuum environment. Come out and hit the surface of the object being plated.
S3：所述膜料蒸发装置对膜料进行处理后以气相的形式蒸发出来；本发明采用蒸发镀膜方式，所述蒸发镀膜是通过加热蒸发某种物质使其沉积在固体的表面。所述膜料蒸发装置的蒸发方式包括电阻加热方式、高频感应方式和电子束加热方式。所述膜料蒸发装置能够根据不同的材料选择相应的蒸发方式对膜料进行蒸发处理，使膜料以气相的形式向上蒸发出来。S3: The film evaporation device processes the film material and evaporates in the form of a gas phase; the invention adopts an evaporation coating method, which evaporates a substance by heating to deposit it on a solid surface. The evaporation mode of the film evaporation device includes a resistance heating method, a high frequency induction method, and an electron beam heating method. The film evaporation device can evaporate the film material according to different evaporation modes of different materials, so that the film material is evaporated upward in the form of a gas phase.
S4：所述档板治具会对蒸发出来的膜料进行线性遮挡；所述挡板治具230的整体形状为矩形，其中一边为锯齿状；所述锯齿状部位是由有限个等腰三角形组成，相当于对蒸发膜料的遮挡面积逐渐缩小，进而达到从完全遮挡到完全无遮挡的线性过渡。S4: the baffle fixture linearly blocks the evaporated film material; the overall shape of the baffle fixture 230 is rectangular, one side of which is serrated; the zigzag part is composed of a finite isosceles triangle The composition is equivalent to a gradual reduction of the occlusion area of the evaporating film material, thereby achieving a linear transition from complete occlusion to complete occlusion.
S5：所述膜料会以气相的形式线性沉积到基片的表面；所述蒸发出来的膜料经过挡板治具230并以气相的形式沉积在基片110的表面，实现蒸发镀膜的过程，由于挡板治具230能够对蒸发的膜料进行线性遮挡，从而使基片110上膜层120的厚度从一侧向另一侧呈现出线性递减的趋势，不仅能使滤镜具备渐变效果，而且还能够提高滤镜的线性度。S5: the film material is linearly deposited on the surface of the substrate in the form of a gas phase; the evaporated film material is deposited on the surface of the substrate 110 through the baffle fixture 230 and in the form of a vapor phase to realize the process of evaporation coating. Since the baffle fixture 230 can linearly block the evaporated film material, the thickness of the film layer 120 on the substrate 110 exhibits a linear decreasing tendency from one side to the other side, which not only enables the filter to have a gradation effect. And can also improve the linearity of the filter.
S6：结束。S6: End.
以上所述，只是本发明的较佳实施例而已，本发明并不局限于上述实施方式，只要其以相同的手段达到本发明的技术效果，都应属于本发明的保护范围。The above is only a preferred embodiment of the present invention, and the present invention is not limited to the above embodiment, and as long as it achieves the technical effects of the present invention by the same means, it should fall within the scope of protection of the present invention.

Claims (22)

  1. 一种加强钢化滤镜，其特征在于：包括基片和膜层，所述膜层是由Al 2O 3构成的电介质层和由T i构成的金属膜层通过交替层叠而形成的，所述膜层只附着于基片的单侧表面或者同时附着于基片的两侧表面。 A reinforced tempering filter comprising: a substrate and a film layer, wherein the film layer is formed by alternately laminating a dielectric layer composed of Al 2 O 3 and a metal film layer composed of T i The film layer is attached only to one side surface of the substrate or to both side surfaces of the substrate at the same time.
  2. 根据权利要求1所述的一种加强钢化滤镜，其特征在于：所述基片采用的材料是化学钢化玻璃。A reinforced tempering filter according to claim 1, wherein said substrate is made of chemically tempered glass.
  3. 根据权利要求1所述的一种加强钢化滤镜，其特征在于：所述电介质层和金属膜层的总层数包括5-15层。A reinforced tempering filter according to claim 1, wherein the total number of layers of the dielectric layer and the metal film layer comprises 5-15 layers.
  4. 根据权利要求3所述的一种加强钢化滤镜，其特征在于：膜层中的第一层为电介质层，所述第一层附着于基片的表面。A reinforced tempering filter according to claim 3, wherein the first layer in the film layer is a dielectric layer, and the first layer is attached to the surface of the substrate.
  5. 根据权利要求3所述的一种加强钢化滤镜，其特征在于：每一层的不同部位的厚度均保持一致或者每一层的厚度由一端向另一端呈现出线性递减的趋势。A tempered tempering filter according to claim 3, wherein the thickness of the different portions of each layer is uniform or the thickness of each layer exhibits a linear decreasing tendency from one end to the other.
  6. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：膜层中的第一层的最厚部位的厚度是15nm或者20nm。A reinforced tempering filter according to claim 5, wherein the thickness of the thickest portion of the first layer in the film layer is 15 nm or 20 nm.
  7. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为5层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是2.5nm，第三层最厚部位的厚度是105.43nm，第四层最厚部位的厚度是5.79nm，第五层最厚部位的厚度是101.44nm。A reinforced tempering filter according to claim 5, wherein when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 5 layers, the first layer is the most The thickness of the thick portion is 20 nm, the thickness of the thickest portion of the second layer is 2.5 nm, the thickness of the thickest portion of the third layer is 105.43 nm, and the thickness of the thickest portion of the fourth layer is 5.79 nm, and the thickest portion of the fifth layer is The thickness is 101.44 nm.
  8. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为7层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是3.85nm，第三层最厚部位的厚度是88.27nm，第四层最厚部位的厚度是3.9nm，第五层最厚部位的厚度是79.04nm，第六层最厚部位的厚度是7.6nm，第七层最厚部位的厚度是77.19nm。A reinforced tempering filter according to claim 5, wherein when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 7 layers, the first layer is the most The thickness of the thick portion is 20 nm, the thickness of the thickest portion of the second layer is 3.85 nm, the thickness of the thickest portion of the third layer is 88.27 nm, and the thickness of the thickest portion of the fourth layer is 3.9 nm, and the thickest portion of the fifth layer is The thickness is 79.04 nm, the thickness of the thickest portion of the sixth layer is 7.6 nm, and the thickness of the thickest portion of the seventh layer is 77.19 nm.
  9. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为7层时，第一层最厚部位的厚度是15nm，第二层最厚部位的厚度是3.5nm，第三层最厚部位的厚度是88.38nm，第四层最厚部位的厚度是2.23nm，第五层最厚部位的厚度是81.48nm，第六层最厚部位的厚度是4.93nm，第七层最厚部位的厚度是76.46nm。A reinforced tempering filter according to claim 5, wherein when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 7 layers, the first layer is the most The thickness of the thick portion is 15 nm, the thickness of the thickest portion of the second layer is 3.5 nm, the thickness of the thickest portion of the third layer is 88.38 nm, and the thickness of the thickest portion of the fourth layer is 2.23 nm, and the thickest portion of the fifth layer is The thickness is 81.48 nm, the thickness of the thickest portion of the sixth layer is 4.93 nm, and the thickness of the thickest portion of the seventh layer is 76.46 nm.
  10. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为7层时，第一层最厚部位的厚度是20nm，第二层 最厚部位的厚度是5.3nm，第三层最厚部位的厚度是83.28nm，第四层最厚部位的厚度是12.4nm，第五层最厚部位的厚度是65.96nm，第六层最厚部位的厚度是8.5nm，第七层最厚部位的厚度是76.65nm。A reinforced tempering filter according to claim 5, wherein when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 7 layers, the first layer is the most The thickness of the thick portion is 20 nm, the thickness of the thickest portion of the second layer is 5.3 nm, the thickness of the thickest portion of the third layer is 83.28 nm, and the thickness of the thickest portion of the fourth layer is 12.4 nm, and the thickest portion of the fifth layer is The thickness is 65.96 nm, the thickness of the thickest portion of the sixth layer is 8.5 nm, and the thickness of the thickest portion of the seventh layer is 76.65 nm.
  11. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为7层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是12nm，第三层最厚部位的厚度是63.27nm，第四层最厚部位的厚度是16nm，第五层最厚部位的厚度是81.68nm，第六层最厚部位的厚度是7.85nm，第七层最厚部位的厚度是77.54nm。A reinforced tempering filter according to claim 5, wherein when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 7 layers, the first layer is the most The thickness of the thick portion is 20 nm, the thickness of the thickest portion of the second layer is 12 nm, the thickness of the thickest portion of the third layer is 63.27 nm, the thickness of the thickest portion of the fourth layer is 16 nm, and the thickness of the thickest portion of the fifth layer is 81.68 nm, the thickness of the thickest part of the sixth layer is 7.85 nm, and the thickness of the thickest part of the seventh layer is 77.54 nm.
  12. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为9层时，第一层最厚部位的厚度是20nm，第二层最厚部位的厚度是5.72nm，第三层最厚部位的厚度是62.65nm，第四层最厚部位的厚度是13.24nm，第五层最厚部位的厚度是85.82nm，第六层最厚部位的厚度是12.2nm，第七层最厚部位的厚度是54.11nm，第八层最厚部位的厚度是15.44nm，第九层最厚部位的厚度是55.07nm。A reinforced tempering filter according to claim 5, wherein when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 9 layers, the first layer is the most The thickness of the thick portion is 20 nm, the thickness of the thickest portion of the second layer is 5.72 nm, the thickness of the thickest portion of the third layer is 62.65 nm, and the thickness of the thickest portion of the fourth layer is 13.24 nm, and the thickest portion of the fifth layer is The thickness is 85.82 nm, the thickness of the thickest part of the sixth layer is 12.2 nm, the thickness of the thickest part of the seventh layer is 54.11 nm, the thickness of the thickest part of the eighth layer is 15.44 nm, and the thickness of the thickest part of the ninth layer is 55.07nm.
  13. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层只附着于基片的单侧表面且电介质层和金属膜层的总层数为11层时，第一层最厚部位的厚度是15nm，第二层最厚部位的厚度是11.62nm，第三层最厚部位的厚度是72.49nm，第四层最厚部位的厚度是31.84nm，第五层最厚部位的厚度是76.49nm，第六层最厚部位的厚度是26.38nm，第七层最厚部位的厚度是133.54nm，第八层最厚部位的厚度是80.22nm，第九层最厚部位的厚度是69.26nm，第十层最厚部位的厚度是19.31nm，第十一层最厚部位的厚度是53.17nm。A reinforced tempering filter according to claim 5, wherein when the film layer is attached only to one side surface of the substrate and the total number of layers of the dielectric layer and the metal film layer is 11 layers, the first layer is the most The thickness of the thick portion is 15 nm, the thickness of the thickest portion of the second layer is 11.62 nm, the thickness of the thickest portion of the third layer is 72.49 nm, and the thickness of the thickest portion of the fourth layer is 31.84 nm, and the thickest portion of the fifth layer is The thickness is 76.49 nm, the thickness of the thickest part of the sixth layer is 26.38 nm, the thickness of the thickest part of the seventh layer is 133.54 nm, the thickness of the thickest part of the eighth layer is 80.22 nm, and the thickness of the thickest part of the ninth layer is At 69.26 nm, the thickness of the thickest portion of the tenth layer is 19.31 nm, and the thickness of the thickest portion of the eleventh layer is 53.17 nm.
  14. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层同时附着于基片的两侧表面时，两侧膜层中的金属膜层的厚度是当膜层只附着于基片的单侧表面时的对应厚度的一半，两侧膜层中的电介质层的厚度与当膜层只附着于基片的单侧表面时的对应厚度一致。A reinforced tempering filter according to claim 5, wherein when the film layer is simultaneously attached to both side surfaces of the substrate, the thickness of the metal film layer in the film layers on both sides is when the film layer is only attached to The half of the corresponding thickness of the one-sided surface of the substrate, the thickness of the dielectric layer in the film layers on both sides coincides with the corresponding thickness when the film layer is attached only to the one-sided surface of the substrate.
  15. 根据权利要求5所述的一种加强钢化滤镜，其特征在于：当膜层同时附着于基片的两侧表面时，基片两侧膜层的厚度以基片为中心呈现出相对称的结构分布。A reinforced tempering filter according to claim 5, wherein when the film layer is simultaneously attached to both side surfaces of the substrate, the thickness of the film layers on both sides of the substrate is symmetrical with respect to the substrate. Structure distribution.
  16. 一种渐变灰滤镜镀制装置，其特征在于：包括膜料蒸发装置、用于固定基片的镀膜伞盘、用于线性遮挡膜料的挡板治具和用于连接镀膜伞盘和挡板治具的挡板治具支架，所述挡 板治具支架的顶端连接至镀膜伞盘，所述挡板治具支架还连接至挡板治具，所述膜料蒸发装置位于挡板治具的下方。A gradient gray filter plating device, comprising: a film evaporation device, a coated umbrella plate for fixing a substrate, a baffle fixture for linear shielding film material, and a connection for coating a coated umbrella disk and a block a baffle fixture bracket of the fixture, the top end of the baffle fixture bracket is connected to the coated umbrella tray, the baffle fixture bracket is also connected to the baffle fixture, and the film evaporation device is located at the baffle plate With the bottom.
  17. 根据权利要求16所述的一种渐变灰滤镜镀制装置，其特征在于：所述镀膜伞盘表面开设有一个以上的用于固定基片的安装口，所述安装口位于挡板治具的上方。A gradient gray filter plating apparatus according to claim 16, wherein the surface of the coated umbrella disk is provided with more than one mounting opening for fixing the substrate, and the mounting opening is located at the baffle fixture. Above.
  18. 根据权利要求16所述的一种渐变灰滤镜镀制装置，其特征在于：所述挡板治具支架表面开设有用于调节档板治具高度的槽口，所述档板治具通过槽口连接至档板治具支架。The gradient gray filter plating apparatus according to claim 16, wherein the surface of the baffle fixture bracket is provided with a notch for adjusting the height of the baffle fixture, and the baffle fixture passes through the slot. The port is connected to the baffle bracket.
  19. 根据权利要求18所述的一种渐变灰滤镜镀制装置，其特征在于：所述挡板治具的整体形状为矩形，所述挡板治具的一边固定在挡板治具支架的槽口位置，所述挡板治具的对侧另一边为有限个等腰三角形组成的锯齿状。The gradient gray filter plating apparatus according to claim 18, wherein the overall shape of the baffle fixture is rectangular, and one side of the baffle fixture is fixed to the groove of the baffle fixture bracket. The mouth position, the opposite side of the opposite side of the baffle fixture is a zigzag shape composed of a finite number of isosceles triangles.
  20. 根据权利要求19所述的一种渐变灰滤镜镀制装置，其特征在于：所述挡板治具的长度与宽度的比值为44:13。A gradient gray filter plating apparatus according to claim 19, wherein the ratio of the length to the width of the barrier jig is 44:13.
  21. 根据权利要求19所述的一种渐变灰滤镜镀制装置，其特征在于：所述等腰三角形的高与底边的比值为25:1。A gradient gray filter plating apparatus according to claim 19, wherein the ratio of the height of the isosceles triangle to the base is 25:1.
  22. 一种应用权利要求16-21任一所述渐变灰滤镜镀制装置的镀制方法，其特征在于，包括以下步骤：A method of coating a gradient gray filter plating apparatus according to any one of claims 16 to 21, comprising the steps of:
    S1：开始；S1: Start;
    S2:将渐变灰滤镜镀制装置放置在真空环境中；S2: placing the gradient gray filter plating device in a vacuum environment;
    S3：所述膜料蒸发装置对膜料进行处理后以气相的形式蒸发出来；S3: the film evaporation device processes the film material and evaporates in the form of a gas phase;
    S4：所述档板治具会对蒸发出来的膜料进行线性遮挡；S4: the baffle fixture linearly blocks the evaporated film material;
    S5：所述膜料会以气相的形式线性沉积到基片的表面；S5: the film material is linearly deposited on the surface of the substrate in the form of a gas phase;
    S6：结束。S6: End.
PCT/CN2017/119986 2017-09-18 2017-12-29 Reinforced toughened filter, graduated neutral-density filter plating device and plating method therefor WO2019052090A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CN201710842319.2A CN107523789B (en) 2017-09-18 2017-09-18 A kind of gradual change ash filter is coated with device and its plating method
CN201710842319.2 2017-09-18
CN201710841567.5A CN107526127A (en) 2017-09-18 2017-09-18 One kind strengthens tempering filter
CN201710841567.5 2017-09-18

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105245789A (en) * 2015-10-13 2016-01-13 浙江宇视科技有限公司 Graduated neutral density filter and strong light inhibition method based on graduated neutral density filter
CN205942212U (en) * 2016-08-03 2017-02-08 江门市蓬江区卡色商贸有限公司 Grey filter of center gradual change
CN206476893U (en) * 2017-02-20 2017-09-08 惠州璀璨光影技术有限公司 A kind of coating film on glass gradual change mirror of new structure

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105245789A (en) * 2015-10-13 2016-01-13 浙江宇视科技有限公司 Graduated neutral density filter and strong light inhibition method based on graduated neutral density filter
CN205942212U (en) * 2016-08-03 2017-02-08 江门市蓬江区卡色商贸有限公司 Grey filter of center gradual change
CN206476893U (en) * 2017-02-20 2017-09-08 惠州璀璨光影技术有限公司 A kind of coating film on glass gradual change mirror of new structure

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