WO2019019634A1 - 3d显示装置及其制备方法 - Google Patents

3d显示装置及其制备方法 Download PDF

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Publication number
WO2019019634A1
WO2019019634A1 PCT/CN2018/077547 CN2018077547W WO2019019634A1 WO 2019019634 A1 WO2019019634 A1 WO 2019019634A1 CN 2018077547 W CN2018077547 W CN 2018077547W WO 2019019634 A1 WO2019019634 A1 WO 2019019634A1
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Prior art keywords
substrate
black matrix
grating
display device
away
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PCT/CN2018/077547
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English (en)
French (fr)
Inventor
胡伟频
邱云
孙晓
赵合彬
王延峰
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/080,336 priority Critical patent/US11409153B2/en
Priority to EP18755693.1A priority patent/EP3660579B1/en
Publication of WO2019019634A1 publication Critical patent/WO2019019634A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
    • G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
    • G02B30/26—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type
    • G02B30/30—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type involving parallax barriers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
    • G02F1/133562—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements on the viewer side
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

Definitions

  • a 3D display is realized using a grating and a display panel, thereby providing a good visual experience.
  • a 3D display device includes: a first substrate; a second substrate, the second substrate and the first substrate are disposed in a box; a black matrix; a grating; wherein the black matrix and the grating are disposed in the a black matrix is disposed in the same layer as the grating, and a black matrix and a side of the grating on the first substrate are light emitted by the 3D display device. side.
  • the second substrate is an array substrate, a color resistance is disposed on the second substrate, and a black matrix is not disposed on a side of the first substrate adjacent to the second substrate.
  • the grating includes a plurality of shielding portions disposed in parallel with each other, and two side edges of each shielding portion are respectively in contact with the black matrix.
  • the second substrate includes a plurality of sub-pixels, and a crosstalk region between adjacent ones of the sub-pixels.
  • the black matrix, the occlusion portion, the sub-pixel, and the crosstalk region satisfy the following relationship:
  • m is the black matrix line width
  • c is the crosstalk area line width
  • k is the shrinkage ratio
  • a is the occlusion portion line width
  • p is the sub-pixel line width.
  • the black matrix line width is about 4.996 ⁇ m
  • the crosstalk area line width is about 5 ⁇ m
  • the shrinkage rate is about 0.9993
  • the occlusion line width is about 49.964 ⁇ m.
  • the sub-pixel line width is about 50 ⁇ m.
  • the material of the grating is the same as the material of the black matrix.
  • the grating is integrally formed with the black matrix.
  • the black matrix and the grating are formed on a surface of the first substrate away from the second substrate.
  • the 3D display device further includes: a third substrate attached on a surface of the first substrate away from the second substrate; wherein the black matrix and the grating Formed on a surface of the third substrate away from the second substrate.
  • the 3D display device further includes: a film substrate adhered on a surface of the first substrate away from the second substrate; wherein the black matrix and the grating Formed on a surface of the film substrate away from the second substrate.
  • a method of fabricating a 3D display device includes: providing a first substrate and a second substrate opposite to the first substrate; and forming a black matrix and a grating on a side of the first substrate away from the second substrate; wherein the black matrix and the grating In the same layer, the side on which the black matrix and the grating are located on the first substrate is the light exiting side of the 3D display device.
  • forming the black matrix and the grating on a side of the first substrate away from the second substrate comprises: forming the surface on the surface of the first substrate away from the second substrate by a patterning process Black matrix and raster.
  • forming the black matrix and the grating on a side of the first substrate away from the second substrate comprises: forming the black matrix and the grating on a surface of the third substrate by a patterning process; and The third substrate is bonded to the first substrate; wherein the black matrix and the grating are located on a surface of the third substrate away from the second substrate.
  • forming the black matrix and the grating on a side of the first substrate away from the second substrate comprises: forming the black matrix and the grating on the film substrate by a patterning process; and forming the film base The material is bonded to the first substrate; wherein the black matrix and the grating are located on a surface of the film substrate away from the second substrate.
  • 1 is a schematic view showing an optical path of a 3D display device in an ideal state
  • 2a is a schematic diagram of an optical path of a 3D display device according to an embodiment of the present disclosure
  • Figure 2b is a plan view of the first substrate in the embodiment shown in Figure 2a;
  • 2c is a schematic diagram of a 3D display device according to another embodiment of the present disclosure.
  • 2d is a schematic diagram of a 3D display device according to still another embodiment of the present disclosure.
  • FIG. 3 is a flowchart of a method for fabricating a 3D display device according to an embodiment of the present disclosure.
  • the present disclosure provides a 3D display device and a method for fabricating the same according to the above-mentioned deficiencies in the prior art, which at least partially solve the problem that the display effect and the capacity of the existing 3D display device cannot be balanced.
  • the present disclosure provides a 3D display device.
  • the 3D display device includes: a first substrate 1; a second substrate 2, the second substrate 2 and the first substrate 1 are disposed in a box; a black matrix 3; a grating 4; wherein the black matrix 3 and the The grating 4 is disposed on a side of the first substrate 1 away from the second substrate 2, and the black matrix 3 is disposed in the same layer as the grating 4, and the black matrix 3 and the first substrate 1 are disposed on the first substrate 1
  • the side where the grating 4 is located is the light exiting side of the 3D display device.
  • the 3D display device is a liquid crystal display device, that is, a liquid crystal layer (shown by reference numeral 5 in FIG. 2a) may be further disposed between the first substrate 1 and the second substrate 2.
  • the second substrate 2 may be an array substrate, that is, the second substrate 2 may include a plurality of sub-pixels.
  • the second substrate 2 can also be provided with r, g, b color resistance (as shown by r, g, and b in FIG. 2a), and then the second substrate 2 is a COA (Color Filter On Array) substrate.
  • the line width of the black matrix 3 is m, and the projection of the black matrix 3 on the second substrate 2 is located between the directly adjacent sub-pixels for shielding the thin film transistor on the second substrate 2.
  • Metal traces are shown in FIG. 2a and FIG. 2b.
  • the projection referred to herein is a projection (ie, oblique projection) of light received by the human eye on the second substrate 2, that is, the black matrix is on the second substrate along the line of sight of the user.
  • the projection on is located between directly adjacent sub-pixels.
  • two directly adjacent sub-pixels may be a left-eye pixel L and a right-eye pixel R, respectively.
  • the second substrate is an array substrate, a color resistance is disposed on the second substrate, and a black matrix is not disposed on a side of the first substrate adjacent to the second substrate.
  • the second substrate 2 in the embodiment of the present disclosure may also be an OLED display substrate, and thus the 3D display device of the embodiment of the present disclosure may also be an OLED display device.
  • the black matrix is usually disposed on a side of the substrate opposite to the COA substrate on the substrate of the COA substrate.
  • the black matrix 3 since the black matrix 3 has been disposed on the side of the first substrate 1 away from the second substrate 2, the black matrix is no longer disposed on the side of the first substrate 1 adjacent to the second substrate 2.
  • the black matrix and the grating are disposed on a side of the first substrate away from the second substrate, and a side of the first substrate on which the black matrix and the grating are located are The light exit side of the 3D display device. Since the black matrix and the grating are not disposed between the two substrates of the pair of boxes, correspondingly, the liquid crystal molecules inside the 3D display device are not affected, so there is no need to additionally increase the baking process, thereby allowing for 3D display. The capacity and display effect of the device.
  • the black matrix 3 has a line width m of 5-10 microns. In this way, the aperture ratio can be achieved and the effect of preventing crosstalk of adjacent sub-pixels can be ensured.
  • the 3D display device may further include a grating 4 located on a side of the first substrate 1 away from the second substrate 2; the grating 4 includes a plurality of The shielding portions 41 are disposed in parallel with each other, and the two side edges of each of the shielding portions 41 are in contact with the black matrix 3, respectively.
  • a grating opening 42 is formed between each of the shielding portions 41.
  • the grating is placed perpendicular to the two eyes (ie, placed in parallel with the 3D display device), and the left and right eyes are observed at different angles to the grating, and 3D is viewed.
  • the images presented by the display device are different, and there is an aberration between the left eye image and the right eye image. Due to the existence of aberrations, the human brain can produce a sense of stereo to achieve a 3D display effect.
  • the optical path diagram of the 3D display device provided with the grating 4 is as shown in FIG. 1, and the sub-pixel regions of the second substrate 2 (ie, the left-eye pixel region L and the right-eye pixel region R in FIG. 1) are all valid.
  • the light-emitting area that is, there is no non-light-emitting area between adjacent sub-pixels.
  • the display element such as a thin film transistor is provided on the second substrate 2, it is inevitable to occupy a partial position of the sub-pixel region.
  • the area occupied by the thin film transistor in the sub-pixel is a non-light-emitting area, and the left-eye pixel area L and the right-eye pixel area R are effective light-emitting areas, and form a sub-pixel together with the non-light-emitting area.
  • the non-light-emitting area A needs to be occluded by the black matrix 3. Therefore, the projection of the black matrix 3 on the second substrate 2 covers the non-light-emitting area A.
  • the grating 4 includes a plurality of shielding portions 41 disposed in parallel with each other, and two side edges of each shielding portion 41 are in contact with the black matrix 3, respectively.
  • FIG. 2a is the optical path of the light when the black matrix 3 is not disposed outside the 3D display device (ie, the optical path of FIG. 1), and the solid line in FIG. 2a is the black matrix 3 and the grating 4.
  • the light path of the light after the respective blocking portions 41 are connected.
  • the projection of each black matrix 3 on the second substrate 2 can effectively cover the non-light-emitting regions A.
  • the second substrate includes a plurality of sub-pixels, and a crosstalk region between adjacent ones of the sub-pixels.
  • the black matrix, the occlusion portion, the sub-pixel, and the crosstalk region satisfy the following relationship:
  • m is the black matrix line width
  • c is the crosstalk area line width
  • k is the shrinkage ratio
  • a is the occlusion portion line width
  • p is the sub-pixel line width.
  • the shrinkage rate k is related to the distance from the user to the display device and the thickness of the display device, and can be set according to actual conditions.
  • the black matrix line width is about 4.996 ⁇ m
  • the crosstalk area line width is about 5 ⁇ m
  • the shrinkage rate is about 0.9993
  • the occlusion line width is about 49.964 ⁇ m.
  • the sub-pixel line width is about 50 ⁇ m.
  • the material of the grating 4 is the same as that of the black matrix 3.
  • the grating 4 is integrally formed with the black matrix 3.
  • the line width of the grating 4 is changed from the original a to a+2m, which can function as the 3D display of the grating 4 and can block the black matrix 3 from blocking the first substrate 1. The role of the trace of the thin film transistor.
  • the line width a of the shield portion 41 of the grating 4 may be 40-100 microns. It should be noted that the line width a of the shielding portion 41 can be set according to the type of the 3D display device. For example, if the 3D display device is a portable 3D display device such as a mobile phone or a pad, since the human eye is closer to the 3D display device (usually about 30 cm), the line width a of the blocking portion 41 can be compared within the above range.
  • the line width a of the shielding portion 41 can be A larger value is taken within the above range.
  • the black matrix 3 is disposed on the side of the first substrate 1 away from the second substrate 2.
  • various ways of setting the black matrix 3 will be described in detail.
  • Manner 1 As shown in FIG. 2a, the black matrix 3 and the grating 4 are formed on a surface of the first substrate 1 away from the second substrate 2.
  • the black matrix 3 and the grating 4 are arranged in a manner such that the black matrix 3 and the grating 4 are directly formed on the first substrate 1, and the preparation process is simpler.
  • the 3D display device further includes a third substrate 6 attached to the surface of the first substrate 1 away from the second substrate 2; wherein the black matrix 3 and the The grating 4 is formed on a surface of the third substrate 6 away from the second substrate 2. That is, the black matrix 3 and the grating 4 are not directly formed on the first substrate 1, but are directly formed on the third substrate 6, and the third substrate 6 on which the black matrix 3 is formed is bonded to the first substrate 1. So that the black matrix 3 is located on the light exit side of the 3D display device.
  • the 3D display device further includes a film substrate 7 attached to a surface of the first substrate 1 away from the second substrate 2; wherein the black matrix 3 and the The grating 4 is formed on a surface of the film substrate 7 away from the second substrate 2. That is, the black matrix 3 and the grating 4 are not directly formed on the first substrate 1, but are directly formed on the film substrate 7, and the film substrate 7 on which the black matrix 3 is formed is bonded to the first substrate 1. So that the black matrix 3 is located on the light exit side of the 3D display device.
  • the 3D display device further includes the grating 4 and the material of the grating 4 is the same as the material of the black matrix 3, the grating 4 and the black matrix 3 may be formed simultaneously in the above three modes.
  • the present disclosure also provides a method of preparing a 3D display device for preparing a 3D display device as described above.
  • the method will be described in detail below with reference to Figures 2a-2d and Figure 3.
  • the method includes the following steps:
  • step S1 the first substrate 1 and the second substrate 2 opposite to the first substrate 1 are provided.
  • the second substrate 2 may be an array substrate.
  • the second substrate 2 may further be provided with r, g, b color resistance, and then the second substrate 2 is a COA substrate.
  • the first substrate 1 may be a counter substrate, wherein a black matrix is no longer disposed on a side of the first substrate 1 adjacent to the second substrate 2.
  • step S2 the black matrix 3 and the grating 4 are formed on the side of the first substrate 1 away from the second substrate 2.
  • the black matrix 3 is disposed in the same layer as the grating 4, and the side on which the black matrix 3 and the grating 4 are located on the first substrate 1 is the light exiting side of the 3D display device.
  • the second substrate includes a plurality of sub-pixels, and a crosstalk region between adjacent ones of the sub-pixels.
  • the black matrix, the occlusion portion, the sub-pixel, and the crosstalk region satisfy the following relationship:
  • m is the black matrix line width
  • c is the crosstalk area line width
  • k is the shrinkage ratio
  • a is the occlusion portion line width
  • p is the sub-pixel line width.
  • the shrinkage rate k is related to the distance from the user to the display device and the thickness of the display device, and can be set according to actual conditions.
  • the black matrix 3 has a line width m of 5-10 microns.
  • the black matrix 3 and the grating 4 are formed on a side of the first substrate 1 away from the second substrate 2, and specifically include the following three schemes:
  • Solution 1 As shown in FIG. 2a, the black matrix 3 and the grating 4 are formed on the surface of the first substrate 1 away from the second substrate 2 by a patterning process. Thus, the black matrix 3 and the grating 4 can be directly formed on the first substrate 1, and the preparation process is simple.
  • the black matrix 3 and the grating 4 are located on a surface of the third substrate 6 away from the second substrate 2.
  • the black matrix 3 and the grating 4 are not directly formed on the first substrate 1, but are formed on the third substrate 6, and the third substrate 6 and the first substrate 1 on which the black matrix 3 and the grating 4 are formed are further formed.
  • the bonding is such that the black matrix 3 and the grating 4 are located on the light exiting side of the 3D display device.
  • Solution 3 As shown in Figure 2d, the following steps are specifically included:
  • the black matrix 3 and the grating 4 are located on a surface of the film substrate 7 away from the second substrate 2.
  • the black matrix 3 and the grating 4 are not directly formed on the first substrate 1, but are formed on the film substrate 7, and the film substrate 7 and the first substrate 1 on which the black matrix 3 and the grating 4 are formed are further formed.
  • the bonding is such that the black matrix 3 and the grating 4 are located on the light exiting side of the 3D display device.
  • the grating 4 may be formed in synchronization with the black matrix 3.
  • the grating 4 includes a plurality of shielding portions 41 disposed in parallel with each other, and two side edges of each shielding portion 41 are in contact with the black matrix 3, respectively.
  • the line width a of the shielding portion 41 of the grating 4 is 40-100 micrometers.
  • the preparation method of the 3D display device is simple in process and easy to implement. Especially when the 3D display device includes the grating 4, the grating 4 and the black matrix 3 can be formed simultaneously, which can further simplify the preparation process.
  • the black matrix and the grating are disposed on a side of the first substrate away from the second substrate, and a side of the first substrate on which the black matrix and the grating are located are The light exit side of the 3D display device. Since the black matrix and the grating are not disposed between the two substrates of the pair of boxes, correspondingly, the liquid crystal molecules inside the 3D display device are not affected, so there is no need to additionally increase the baking process, thereby allowing for 3D display. The capacity and display effect of the device.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
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Abstract

一种3D显示装置及其制备方法。该3D显示装置包括：第一基板（1）；第二基板（2），第二基板（2）与第一基板（1）对盒设置；黑矩阵（3）；光栅（4）；其中，黑矩阵（3）与光栅（4）设置在第一基板（1）远离第二基板（2）的一侧，黑矩阵（3）与光栅（4）同层设置，第一基板（1）上黑矩阵（3）与光栅（4）所在的一侧为所述3D显示装置的出光侧。

Description

3D显示装置及其制备方法
相关申请
本申请要求保护在2017年7月27日提交的申请号为201710623150.1的中国专利申请的优先权，该申请的全部内容以引用的方式结合到本文中。
技术领域
本公开涉及显示技术领域，具体涉及一种3D显示装置及其制备方法。
背景技术
在常规的3D显示装置中，利用光栅和显示面板来实现3D显示，从而提供良好的视觉体验。
公开内容
根据本公开的一个方面，提供了一种3D显示装置。所述3D显示装置包括：第一基板；第二基板，所述第二基板与所述第一基板对盒设置；黑矩阵；光栅；其中，所述黑矩阵与所述光栅设置在所述第一基板远离所述第二基板的一侧，所述黑矩阵与所述光栅同层设置，所述第一基板上所述黑矩阵与所述光栅所在的一侧为所述3D显示装置的出光侧。
可选地，在一些实施例中，所述第二基板为阵列基板，所述第二基板上设置有色阻，所述第一基板邻近所述第二基板的一侧未设置黑矩阵。
可选地，在一些实施例中，所述光栅包括多个相互平行设置的遮挡部，每个遮挡部的两个侧边分别与所述黑矩阵接触。
可选地，在一些实施例中，所述第二基板包括多个子像素，以及位于相邻所述子像素之间的串扰区。
可选地，在一些实施例中，所述黑矩阵、所述遮挡部、所述子像素、所述串扰区之间满足如下关系：
m＝c×k/2，
a+2m＝(p+c)×k；
其中，m为所述黑矩阵线宽，c为所述串扰区线宽，k为收缩率，a为所述遮挡部线宽，p为所述子像素线宽。
可选地，在一些实施例中，所述黑矩阵线宽约为4.996μm，所述串扰区线宽约为5μm，收缩率约为0.9993，所述遮挡部线宽约为49.964μm，所述子像素线宽约为50μm。
可选地，在一些实施例中，所述光栅的材料与所述黑矩阵的材料相同。
可选地，在一些实施例中，所述光栅与所述黑矩阵一体成型。
可选地，在一些实施例中，所述黑矩阵和所述光栅形成在所述第一基板远离所述第二基板的表面。
可选地，在一些实施例中，所述3D显示装置还包括：贴合在所述第一基板远离所述第二基板的表面上的第三基板；其中，所述黑矩阵和所述光栅形成在所述第三基板远离所述第二基板的表面上。
可选地，在一些实施例中，所述3D显示装置还包括：贴合在所述第一基板远离所述第二基板的表面上的薄膜基材；其中，所述黑矩阵和所述光栅形成在所述薄膜基材远离所述第二基板的表面上。
根据本公开的另一方面，提供了一种3D显示装置的制备方法。所述方法包括：提供第一基板和与所述第一基板相对的第二基板；以及在第一基板远离第二基板的一侧形成黑矩阵和光栅；其中，所述黑矩阵与所述光栅同层设置，所述第一基板上所述黑矩阵和所述光栅所在的一侧为所述3D显示装置的出光侧。
可选地，在一些实施例中，在第一基板远离第二基板的一侧形成黑矩阵和光栅包括：通过构图工艺，在所述第一基板远离所述第二基板的表面上形成所述黑矩阵和光栅。
可选地，在一些实施例中，在第一基板远离第二基板的一侧形成黑矩阵和光栅包括：通过构图工艺在第三基板的表面上形成所述黑矩阵和光栅；以及将所述第三基板与所述第一基板贴合；其中，所述黑矩阵和光栅位于所述第三基板远离所述第二基板的表面上。
可选地，在一些实施例中，在第一基板远离第二基板的一侧形成黑矩阵和光栅包括：通过构图工艺在薄膜基材上形成所述黑矩阵和光栅；以及将所述薄膜基材与所述第一基板贴合；其中，所述黑矩阵和 光栅位于所述薄膜基材远离所述第二基板的表面上。
附图说明
图1为理想状态下的3D显示装置的光路示意图；
图2a为本公开实施例提供的3D显示装置的光路示意图；
图2b为图2a所示实施例中的第一基板的俯视图；
图2c为本公开另一实施例的3D显示装置的示意图；
图2d为本公开又一实施例的3D显示装置的示意图；以及
图3为本公开实施例提供的3D显示装置的制备方法的流程图。
具体实施方式
下面将结合本公开中的附图，对本公开中的技术方案进行清楚、完整的描述，显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于本公开中的实施例，本领域普通技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例，都属于本公开保护的范围。
本公开针对现有技术中存在的上述不足，提供一种3D显示装置及其制备方法，用以至少部分解决现有3D显示装置的显示效果与产能无法兼顾的问题。
如图2a和图2b所示，本公开提供一种3D显示装置。所述3D显示装置包括：第一基板1；第二基板2，所述第二基板2与所述第一基板1对盒设置；黑矩阵3；光栅4；其中，所述黑矩阵3与所述光栅4设置在所述第一基板1远离所述第二基板2的一侧，所述黑矩阵3与所述光栅4同层设置，所述第一基板1上所述黑矩阵3与所述光栅4所在的一侧为所述3D显示装置的出光侧。
在该实施例中，所述3D显示装置为液晶显示装置，即在第一基板1和第二基板2之间还可以设置有液晶层(如图2a中附图标记5所示)。
第二基板2可以为阵列基板，即，所述第二基板2可以包括多个子像素。可选的，第二基板2上还可以设置r、g、b色阻(如图2a中的r、g和b所示)，那么第二基板2即为COA(Color Filter On Array)基板。如图2a和图2b所示，黑矩阵3的线宽为m，黑矩阵3在第二基板2上的投影位于直接相邻的子像素之间，用于遮挡第二基板2上 薄膜晶体管的金属走线。需要说明的是，这里所说的投影为被人眼接收的光线在第二基板2上的投影(即斜投影)，即，沿着用户的视线方向，所述黑矩阵在所述第二基板上的投影位于直接相邻的子像素之间。在本公开实施例中，如图2a所示，两个直接相邻的子像素可以分别是左眼像素L和右眼像素R。
可选地，在一些实施例中，所述第二基板为阵列基板，所述第二基板上设置有色阻，所述第一基板邻近所述第二基板的一侧未设置黑矩阵。
本领域技术人员能够理解，本公开实施例中的第二基板2也可以是OLED显示基板，因此本公开实施例的3D显示装置也可以是OLED显示装置。
需要说明的是，黑矩阵通常设置在与COA基板对盒的基板上邻近所述COA基板的一侧。而在本公开中，由于已将黑矩阵3设置在第一基板1远离第二基板2的一侧，则在第一基板1邻近第二基板2的一侧不再设置黑矩阵。
如果第一基板为COA基板，并且在制备黑矩阵时对黑矩阵进行烘烤，将导致存在黑矩阵内水汽释放不充分的问题。在本公开的实施例中，所述黑矩阵和光栅设置在所述第一基板远离所述第二基板的一侧，所述第一基板上所述黑矩阵和光栅所在的一侧为所述3D显示装置的出光侧。由于黑矩阵和光栅并未设置在对盒的两个基板之间，相应的，也不会对3D显示装置内部的液晶分子产生影响，因此无需再额外增加烘烤工序，由此可以兼顾3D显示装置的产能和显示效果。
可选的，黑矩阵3的线宽m为5-10微米。这样，能够兼顾开口率又能够保证相邻子像素防串扰的效果。
进一步的，为了实现3D显示效果，如图2a和图2b所示，所述3D显示装置还可以包括光栅4，光栅4位于第一基板1远离第二基板2的一侧；光栅4包括多个相互平行设置的遮挡部41，每个遮挡部41的两个侧边分别与所述黑矩阵3接触。各遮挡部41之间形成光栅开口42。
由于人眼的左眼和右眼水平分开在两个不同的位置上，将光栅垂直于两眼放置(即与3D显示装置平行放置)，左眼和右眼对光栅的观察角度不同，观看3D显示装置呈现的图像是不同的，左眼图像与右眼图像之间存在着像差。由于像差的存在，通过人类的大脑可以产生立 体感，从而实现3D显示效果。
在理想状态下，设置有光栅4的3D显示装置的光路图如图1所示，第二基板2的子像素区域(即图1中左眼像素区域L和右眼像素区域R)全部为有效发光区，即相邻子像素之间不存在非发光区。但是在实际中，由于第二基板2上设置有薄膜晶体管等显示元件，必然要占用子像素区域的部分位置。子像素中被薄膜晶体管所占用的区域即为非发光区，左眼像素区域L和右眼像素区域R即为有效发光区，与非发光区共同形成子像素。如图2a所示，非发光区A需要利用黑矩阵3进行遮挡。因此，黑矩阵3在第二基板2上的投影要覆盖该非发光区A。
在本公开实施例中，如图2a和图2b所示，所述光栅4包括多个相互平行设置的遮挡部41，每个遮挡部41的两个侧边分别与所述黑矩阵3接触。
需要说明的是，图2a中的虚线为未在所述3D显示装置的外侧设置黑矩阵3时的光线光路(即图1的光路)，图2a中的实线为将黑矩阵3与光栅4的各遮挡部41连接后的光线光路。通过图2a可以看出，各黑矩阵3在第二基板2上的投影可以有效覆盖各非发光区A。
利用以上布置，不但可以解决黑矩阵3水汽释放不充分带来的3D显示装置显示效果差的问题，而且不用额外增加烘烤工序，由此兼顾产品产能和显示效果。此外，还巧妙将黑矩阵与光栅结合在一起，在兼顾产品产能和显示效果的基础上，还能够实现3D立体显示。
可选地，在一些实施例中，所述第二基板包括多个子像素，以及位于相邻所述子像素之间的串扰区。
可选地，在一些实施例中，所述黑矩阵、所述遮挡部、所述子像素、所述串扰区之间满足如下关系：
m＝c×k/2，
a+2m＝(p+c)×k；
其中，m为所述黑矩阵线宽，c为所述串扰区线宽，k为收缩率，a为所述遮挡部线宽，p为所述子像素线宽。所述收缩率k与用户到显示装置的距离以及显示装置厚度有关，可以根据实际情况进行设置。
可选地，在一些实施例中，所述黑矩阵线宽约为4.996μm，所述串扰区线宽约为5μm，收缩率约为0.9993，所述遮挡部线宽约为49.964μm，所述子像素线宽约为50μm。
可选的，光栅4的材料与黑矩阵3的材料相同。
进一步可选的，光栅4与黑矩阵3一体成型。当光栅4与黑矩阵3一体成型时，光栅4的线宽由原来的a变为a+2m，既能够起到光栅4的3D显示作用，又能够起到黑矩阵3遮挡第一基板1上薄膜晶体管的走线的作用。
如图2a和图2b所示，光栅4的遮挡部41的线宽a可以为40-100微米。需要说明的是，遮挡部41的线宽a可以根据所述3D显示装置的类型进行设置。例如，若所述3D显示装置为手机、pad等便携式3D显示装置，由于使用时人眼距离3D显示装置较近(通常为30cm左右)，遮挡部41的线宽a可以在上述范围内取较小值；若所述3D显示装置为电视、显示器等较大的3D显示装置，由于使用时人眼距离3D显示装置较远(通常为1.5m-2m)，遮挡部41的线宽a可以在上述范围内取较大值。
黑矩阵3在第一基板1远离第二基板2的一侧的设置方式有多种，以下分别对黑矩阵3的各种设置方式进行详细说明。
方式一：如图2a所示，所述黑矩阵3和所述光栅4形成在所述第一基板1远离所述第二基板2的表面。采用方式一设置黑矩阵3和所述光栅4，使得黑矩阵3和所述光栅4直接形成在第一基板1上，制备工艺更为简单。
方式二：如图2c所示，所述3D显示装置还包括贴合在所述第一基板1远离所述第二基板2的表面上的第三基板6；其中，所述黑矩阵3和所述光栅4形成在所述第三基板6远离所述第二基板2的表面上。也就是说，黑矩阵3和光栅4不是直接形成在第一基板1上，而是直接形成在第三基板6上，再将形成有黑矩阵3的第三基板6与第一基板1贴合，以使黑矩阵3位于所述3D显示装置的出光侧。
方式三：如图2d所示，所述3D显示装置还包括贴合在所述第一基板1远离所述第二基板2的表面上的薄膜基材7；其中，所述黑矩阵3和所述光栅4形成在所述薄膜基材7远离所述第二基板2的表面上。也就是说，黑矩阵3和光栅4不是直接形成在第一基板1上，而是直接形成在薄膜基材7上，再将形成有黑矩阵3的薄膜基材7与第一基板1贴合，以使黑矩阵3位于所述3D显示装置的出光侧。
需要说明的是，当所述3D显示装置还包括光栅4且光栅4的材料 与黑矩阵3的材料相同时，上述三种方式中，光栅4和黑矩阵3可以同步形成。
本公开还提供一种3D显示装置制备方法，用于制备如前所述的3D显示装置。以下结合图2a-2d和图3，对所述方法进行详细说明。所述方法包括以下步骤：
步骤S1，提供第一基板1和与第一基板1相对的第二基板2。
具体的，第二基板2可以为阵列基板，可选的，第二基板2上还可以设置r、g、b色阻，那么第二基板2即为COA基板。相应的，第一基板1可以为对盒基板，其中，第一基板1邻近第二基板2的一侧不再设置黑矩阵。
步骤S2，在第一基板1远离第二基板2的一侧形成黑矩阵3和光栅4。
其中，所述黑矩阵3与所述光栅4同层设置，所述第一基板1上所述黑矩阵3和所述光栅4所在的一侧为所述3D显示装置的出光侧。
可选地，在一些实施例中，所述第二基板包括多个子像素，以及位于相邻所述子像素之间的串扰区。
可选地，在一些实施例中，所述黑矩阵、所述遮挡部、所述子像素、所述串扰区之间满足如下关系：
m＝c×k/2，
a+2m＝(p+c)×k；
其中，m为所述黑矩阵线宽，c为所述串扰区线宽，k为收缩率，a为所述遮挡部线宽，p为所述子像素线宽。所述收缩率k与用户到显示装置的距离以及显示装置厚度有关，可以根据实际情况进行设置。
可选的，黑矩阵3的线宽m为5-10微米。
具体的，所述在第一基板1远离第二基板2的一侧形成黑矩阵3和光栅4，具体包括以下三种方案：
方案一：如图2a所示，通过构图工艺，在所述第一基板1远离所述第二基板2的表面上形成所述黑矩阵3和光栅4。这样，可以将黑矩阵3和光栅4直接形成在第一基板1上，制备工艺简单。
方案二：如图2c所示，具体包括以下步骤：
通过构图工艺在第三基板6的表面上形成所述黑矩阵3和光栅4；以及
将所述第三基板6与所述第一基板1贴合；
其中，所述黑矩阵3和光栅4位于所述第三基板6远离所述第二基板2的表面上。
采用方案二，黑矩阵3和光栅4不是直接形成在第一基板1上，而是形成在第三基板6上，再将形成有黑矩阵3和光栅4的第三基板6与第一基板1贴合，以使黑矩阵3和光栅4位于所述3D显示装置的出光侧。
方案三：如图2d所示，具体包括以下步骤：
通过构图工艺在薄膜基材7上形成所述黑矩阵3和光栅4；以及
将所述薄膜基材7与所述第一基板1贴合；
其中，所述黑矩阵3和光栅4位于所述薄膜基材7远离所述第二基板2的表面上。
采用方案三，黑矩阵3和光栅4不是直接形成在第一基板1上，而是形成在薄膜基材7上，再将形成有黑矩阵3和光栅4的薄膜基材7与第一基板1贴合，以使黑矩阵3和光栅4位于所述3D显示装置的出光侧。
需要说明的是，所述步骤S2(包括上述三种方案)中，光栅4可以与黑矩阵3同步形成。在一些实施例中，如图2a和图2b所示，所述光栅4包括多个相互平行设置的遮挡部41，每个遮挡部41的两个侧边分别与所述黑矩阵3接触。
可选的，光栅4的遮挡部41的线宽a为40-100微米。
所述3D显示装置的制备方法工艺简单，易于实现，尤其是当所述3D显示装置包括光栅4时，光栅4与黑矩阵3可以同步形成，可以进一步简化制备工艺。
在本公开的实施例中，所述黑矩阵和光栅设置在所述第一基板远离所述第二基板的一侧，所述第一基板上所述黑矩阵和光栅所在的一侧为所述3D显示装置的出光侧。由于黑矩阵和光栅并未设置在对盒的两个基板之间，相应的，也不会对3D显示装置内部的液晶分子产生影响，因此无需再额外增加烘烤工序，由此可以兼顾3D显示装置的产能和显示效果。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普 通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本公开的保护范围。

Claims (15)

  1. 一种3D显示装置，包括：
    第一基板；
    第二基板，所述第二基板与所述第一基板对盒设置；
    黑矩阵；
    光栅；
    其中，所述黑矩阵与所述光栅设置在所述第一基板远离所述第二基板的一侧，所述黑矩阵与所述光栅同层设置，所述第一基板上所述黑矩阵与所述光栅所在的一侧为所述3D显示装置的出光侧。
  2. 如权利要求1所述的3D显示装置，其中，所述第二基板为阵列基板，所述第二基板上设置有色阻，所述第一基板邻近所述第二基板的一侧未设置黑矩阵。
  3. 如权利要求1所述的3D显示装置，其中，所述光栅包括多个相互平行设置的遮挡部，每个遮挡部的两个侧边分别与所述黑矩阵接触。
  4. 如权利要求1所述的3D显示装置，其中，所述第二基板包括多个子像素，以及位于相邻所述子像素之间的串扰区。
  5. 如权利要求4所述的3D显示装置，其中，所述黑矩阵、所述遮挡部、所述子像素、所述串扰区之间满足如下关系：
    m＝c×k/2，
    a+2m＝(p+c)×k；
    其中，m为所述黑矩阵线宽，c为所述串扰区线宽，k为收缩率，a为所述遮挡部线宽，p为所述子像素线宽。
  6. 如权利要求4所述的3D显示装置，其中，所述黑矩阵线宽约为4.996μm，所述串扰区线宽约为5μm，收缩率约为0.9993，所述遮挡部线宽约为49.964μm，所述子像素线宽约为50μm。
  7. 如权利要求1所述的3D显示装置，其中，所述光栅的材料与所述黑矩阵的材料相同。
  8. 如权利要求7所述的3D显示装置，其中，所述光栅与所述黑矩阵一体成型。
  9. 如权利要求1-8任一项所述的3D显示装置，其中，所述黑矩阵 和所述光栅形成在所述第一基板远离所述第二基板的表面。
  10. 如权利要求1-8任一项所述的3D显示装置，还包括：贴合在所述第一基板远离所述第二基板的表面上的第三基板；其中，所述黑矩阵和所述光栅形成在所述第三基板远离所述第二基板的表面上。
  11. 如权利要求1-8任一项所述的3D显示装置，还包括：贴合在所述第一基板远离所述第二基板的表面上的薄膜基材；其中，所述黑矩阵和所述光栅形成在所述薄膜基材远离所述第二基板的表面上。
  12. 一种3D显示装置的制备方法，包括：
    提供第一基板和与所述第一基板相对的第二基板；以及
    在第一基板远离第二基板的一侧形成黑矩阵和光栅；
    其中，所述黑矩阵与所述光栅同层设置，所述第一基板上所述黑矩阵和所述光栅所在的一侧为所述3D显示装置的出光侧。
  13. 如权利要求12所述的方法，其中，在第一基板远离第二基板的一侧形成黑矩阵和光栅包括：
    通过构图工艺，在所述第一基板远离所述第二基板的表面上形成所述黑矩阵和光栅。
  14. 如权利要求12所述的方法，其中，在第一基板远离第二基板的一侧形成黑矩阵和光栅包括：
    通过构图工艺在第三基板的表面上形成所述黑矩阵和光栅；以及
    将所述第三基板与所述第一基板贴合；
    其中，所述黑矩阵和光栅位于所述第三基板远离所述第二基板的表面上。
  15. 如权利要求12所述的方法，其中，在第一基板远离第二基板的一侧形成黑矩阵和光栅包括：
    通过构图工艺在薄膜基材上形成所述黑矩阵和光栅；以及
    将所述薄膜基材与所述第一基板贴合；
    其中，所述黑矩阵和光栅位于所述薄膜基材远离所述第二基板的表面上。
PCT/CN2018/077547 2017-07-27 2018-02-28 3d显示装置及其制备方法 WO2019019634A1 (zh)

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