WO2019004045A1

WO2019004045A1 - Optical film

Info

Publication number: WO2019004045A1
Application number: PCT/JP2018/023586
Authority: WO
Inventors: 亜依小橋; 智恵阪上; 昭一小澤
Original assignee: 住友化学株式会社
Priority date: 2017-06-27
Filing date: 2018-06-21
Publication date: 2019-01-03
Also published as: CN110799867B; JP7474564B2; JP2019008295A; KR20200019726A; TWI782045B; TW201906732A; CN110799867A

Abstract

In order to provide an optical film which, by exhibiting a high absorption selectivity for UV light and for short-wavelength visible light near the wavelength 405nm, has a good deterioration suppression function for suppressing deterioration of a phase-difference film or an organic EL light-emitting element due to UV light and short-wave visible light, this optical film includes a selective light absorption layer A satisfying formula (1) below and a selective light absorption layer B satisfying formula (2) below. (1) A(350) ≥ 0.5 (2) A(405) ≥ 0.5 [In formula (1), A(350) represents absorbance at the wavelength 350 nm. In formula (2), A(405) represents absorbance at the wavelength 405 nm.]

Description

Optical film

The present invention relates to an optical film.

Various members such as organic EL elements, display elements such as liquid crystal cells, and optical films such as polarizing plates are used in display devices (FPD: flat panel display) such as organic EL display devices and liquid crystal display devices. Since organic EL compounds and liquid crystal compounds used for these members are organic substances, deterioration by ultraviolet light (UV) tends to be a problem. In order to solve such a problem, for example, Patent Document 1 describes a polarizing plate in which an ultraviolet light absorber excellent in ultraviolet light absorbing performance in a wavelength range of 370 nm or less is added to a protective film of the polarizing plate.

Unexamined-Japanese-Patent No. 2006-308936

Further, with the progress in thinning of display devices in recent years, development of a liquid crystal retardation film formed by aligning and photocuring a polymerizable liquid crystal compound has been advanced. It has become clear that these liquid crystal retardation films and organic EL light emitting devices tend not to deteriorate not only by ultraviolet light but also by visible light of a short wavelength around 400 nm. However, even if the polarizing plate described in Patent Document 1 is excellent in the ultraviolet light absorbing performance in the wavelength region of 370 nm or less, the light absorbing performance of visible light in the vicinity of 400 nm is low, and the liquid crystal retardation film or the organic EL light emitting device is deteriorated. There was a case where suppression was not enough. Furthermore, in display devices in recent years, better display characteristics have been required.

The present invention is excellent in deterioration of the retardation film or the organic EL light emitting element due to ultraviolet light or short wavelength visible light by showing high absorption selectivity to ultraviolet light such as wavelength 350 nm and short wavelength near 405 nm. It is providing the optical film which has a suppression function.

[1] An optical film comprising a light selective absorption layer A satisfying the following formula (1) and a light selective absorption layer B satisfying the following formula (2).
A (350) 0.5 0.5 (1)
A (405) 0.5 0.5 (2)
[In Formula (1), A (350) represents the light absorbency in wavelength 350 nm.
In Formula (2), A (405) represents the absorbance at a wavelength of 405 nm. ]
[2] The optical film according to [1], further satisfying the following formula (3).
A (440) ≦ 0.1 (3)
[In Formula (3), A (440) represents the absorbance at a wavelength of 440 nm. ]
[3] The optical film according to [1], further satisfying the following formula (4).
A (405) / A (440) ≧ 5 (4)
[In Formula (4), A (405) represents the light absorbency in wavelength 405 nm, and A (440) represents the light absorbency in wavelength 440 nm. ]
[4] A layer in which the light selective absorption layer A is formed from a resin composition containing a resin (A1) and a light selective absorption compound (B1),
The resin (A1) is at least one resin selected from cellulose resins, (meth) acrylic resins, polyester resins, polyamide resins, polyimide resins and cycloolefin resins [1] to [3] The optical film as described in any one.
[5] The optical film according to [4], wherein the content of the light selective absorption compound (B1) is 0.01 to 20 parts by mass with respect to 100 parts by mass of the resin (A1).
[6] The optical film according to any one of [1] to [5], wherein the light selective absorption layer B is an adhesive layer having a light selective absorption function.
[7] A pressure-sensitive adhesive layer in which a pressure-sensitive adhesive layer having a photoselective absorption function is formed of a pressure-sensitive adhesive composition comprising a (meth) acrylic resin (a), a crosslinking agent (b) and a photoselective absorption compound (c) The optical film as described in [6].
[8] The optical film as described in [7], wherein the content of the crosslinking agent (b) is 0.01 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (a).
[9] The content according to [7] or [8], wherein the content of the light selective absorption compound (c) is 0.01 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (a) Optical film.
[10] The optical film according to any one of [7] to [9], wherein the light selective absorption compound (c) is a compound satisfying the formula (5).
ε (405) 20 20 (5)
[In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. The unit of gram absorption coefficient is L / (g · cm). ]
[11] The optical film according to any one of [7] to [10], wherein the light selective absorption compound (c) is a compound satisfying the formula (6).
ε (405) / ε (440) ≧ 20 (6)
[In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm. ]
[12] The optical film according to any one of [7] to [11], wherein the photoselective absorption compound (c) is a compound having a merocyanine structure in the molecule.
[13] A display device including the optical film of [1] to [12].
[14] An optical film satisfying the following formula (1) and the following formula (2).
A (350) 0.5 0.5 (1)
A (405) 0.5 0.5 (2)
[In Formula (1), A (350) represents the light absorbency in wavelength 350 nm.
In Formula (2), A (405) represents the absorbance at a wavelength of 405 nm. ]

The optical film of the present invention exhibits a high absorption selectivity to ultraviolet light such as 350 nm and visible light having a short wavelength near 405 nm, thereby having a good suppression function for the deterioration of the retardation film and the organic EL light emitting device due to ultraviolet light. In addition, the optical film of the present invention exhibits high absorption selectivity to visible light of a short wavelength near 405 nm even after a weathering test, and can suppress deterioration due to ultraviolet light or visible light of short wavelength. . When the optical film of the present invention is used in a display device, good display characteristics and durability can be imparted.

An example of the laminated constitution of the optical film of this invention is shown. An example of the laminated constitution of the optical laminated body containing the optical film of this invention is shown. An example of the laminated constitution of the optical laminated body containing the optical film of this invention is shown. An example of the laminated constitution of the optical laminated body containing the optical film of this invention is shown.

The optical film of the present invention includes a light selective absorption layer A satisfying the following formula (1) and a light selective absorption layer B satisfying the following formula (2).
A (350) 0.5 0.5 (1)
A (405) 0.5 0.5 (2)
[In Formula (1), A (350) represents the light absorbency in wavelength 350 nm.
In Formula (2), A (405) represents the absorbance at a wavelength of 405 nm. ]

<Selective absorption layer A>
The light selective absorption layer A satisfies the above formula (1). The larger the value of A (350), the higher the absorption at a wavelength of 350 nm. When the value of A (350) is less than 0.5, the absorption at a wavelength of 350 nm is low, and a retardation film or an organic EL element in ultraviolet light Etc. The effect of suppressing the deterioration of the display device is small. The value of A (350) is preferably 0.5 or more, more preferably 0.8 or more, and particularly preferably 1.0 or more.

The light selective absorption layer A is a layer formed of a resin composition containing a resin (A1) and a light selective absorption compound (B1) (hereinafter sometimes referred to as “resin composition (1)”). The resin (A1) is preferably at least one resin selected from cellulose resins, (meth) acrylic resins, polyester resins, polyamide resins, polyimide resins, and cycloolefin resins.

The cellulose-based resin is preferably a cellulose ester-based resin, that is, a resin in which at least a part of hydroxyl groups in cellulose is acetate-esterified, a part is acetate-esterified, and a part is esterified with another acid It may be a mixed ester. The cellulose ester resin is preferably an acetyl cellulose resin. Specific examples of the acetyl cellulose-based resin include triacetyl cellulose, diacetyl cellulose, cellulose acetate propionate, and cellulose acetate butyrate.
As a raw material cotton of acetyl cellulose, cellulose raw materials such as wood pulp and cotton linters which are known according to Inventive Society of Japan published technology 2001-1745 etc. can be used. In addition, acetylcellulose can be synthesized by the method described in Wood Chemistry, pp. 180-190 (Kyoritsu Shuppan, Akita et al., 1968).
As commercial products of triacetyl cellulose, trade names "UV-50", "UV-80", "SH-80", "TD-80U", "TD-TAC", "UZ-TAC" manufactured by Fuji Film Co., Ltd. Etc. are mentioned.

Examples of (meth) acrylic resins include homopolymers of methacrylic acid alkyl esters or acrylic acid alkyl esters, and copolymers of methacrylic acid alkyl esters and acrylic acid alkyl esters. Specific examples of the methacrylic acid alkyl ester include methyl methacrylate, ethyl methacrylate and propyl methacrylate. Specific examples of the acrylic acid alkyl ester include methyl acrylate, ethyl acrylate and propyl acrylate. As such (meth) acrylic resins, those commercially available as general-purpose (meth) acrylic resins can be used. As the (meth) acrylic resin, one called an impact resistant (meth) acrylic resin may be used.
Moreover, "acrypet VH" of Mitsubishi Rayon Co., Ltd. and "acrypet VRL 20A" etc. are mentioned as a specific example of (meth) acrylic-type resin.

The polyester resin is a polymer resin having a repeating unit of an ester bond in the main chain, and is generally obtained by condensation polymerization of a polyvalent carboxylic acid or a derivative thereof and a polyalcohol or a derivative thereof.
Examples of polyvalent carboxylic acids or derivatives thereof which give polyesters include terephthalic acid, isophthalic acid, phthalic acid, 2,6-naphthalene dicarboxylic acid, diphenyl dicarboxylic acid, diphenyl sulfone dicarboxylic acid, diphenoxy ethane dicarboxylic acid, 5-sodium sulfone dicarboxylic acid Aromatic dicarboxylic acids such as acids; Aliphatic dicarboxylic acids such as oxalic acid, succinic acid, adipic acid, sebacic acid, dimer acid, maleic acid and fumaric acid; Alicyclic dicarboxylic acids such as 1,4-cyclohexanedicarboxylic acid; Mention may be made of oxycarboxylic acids such as parahydroxybenzoic acid, as well as their derivatives. Examples of derivatives of dicarboxylic acid include dimethyl terephthalate, diethyl terephthalate, 2-hydroxyethyl methyl terephthalate, dimethyl 2,6-naphthalenedicarboxylate, dimethyl isophthalate, dimethyl adipate, diethyl maleate, dimethyl dimer acid, etc. Esterified products can be mentioned. Among them, terephthalic acid, isophthalic acid, 2,6-naphthalenedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, and their esterified products are preferably used in view of moldability and handleability.

As polyhydric alcohols or derivatives thereof which give polyesters, ethylene glycol, diethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,3-butanediol, 1,4-butanediol, 1,5-pentane Aliphatic dihydroxy compounds such as diol, 1,6-hexanediol, neopentyl glycol etc., polyoxyalkylene glycols such as diethylene glycol, polyethylene glycol, polypropylene glycol, polytetramethylene glycol etc., 1,4-cyclohexanedimethanol, spiro glycol etc. Alicyclic dihydroxy compounds, aromatic dihydroxy compounds such as bisphenol A and bisphenol S, and derivatives thereof can be mentioned. Among them, ethylene glycol, diethylene glycol, 1,3-propanediol, 1,4-butanediol, neopentyl glycol and 1,4-cyclohexanedimethanol are preferably used in terms of moldability and handleability.

Examples of polyester resins include polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polytrimethylene terephthalate, polytrimethylene naphthalate, polycyclohexanedimethyl terephthalate, and polycyclohexanedimethyl naphthalate. . Among these, polyethylene terephthalate or polyethylene naphthalate is preferable.

The polyamide resin is a polymer resin containing an amide bond in the repeating unit as a main chain, and for example, an aromatic polyamide (aramid) having an aromatic ring skeleton bonded by an amide bond or an aliphatic skeleton bonded by an amide bond Aliphatic polyamide etc. Generally, it can be obtained by the polymerization reaction of a polyvalent carboxylic acid or a derivative thereof and a polyvalent amine.
Examples of polyvalent carboxylic acids which give polyamides or derivatives thereof include terephthalic acid chloride, 2-chloro-terephthalic acid chloride, isophthalic acid dichloride, naphthalene dicarbonyl chloride, biphenyl dicarbonyl chloride, terphenyl dicarbonyl chloride and the like.
Examples of polyhydric amines giving polyamides include 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 2,2'-ditriol. Fluoromethyl-4,4'-diaminobiphenyl, 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (4-amino-3-methylphenyl) fluorene, bis [4- (4-aminophenoxy) ) Phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis (4-aminophenyl) hexafluoro Examples thereof include propane and the like, preferably 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodi Phenylsulfone, 2,2'-ditrifluoromethyl-4,4'-diaminobiphenyl, 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (4-amino-3-methylphenyl) fluorene, It includes 1,4-cyclohexanediamine and 1,4-norbornene diamine.

The polyimide-based resin is a resin containing an imide bond in the repeating unit. Examples of polyimide resins include condensation type polyimides obtained by polycondensation using diamines and tetracarboxylic acid dianhydride as starting materials. As diamines, aromatic diamines, alicyclic diamines, aliphatic diamines, etc. can be used. As tetracarboxylic acid dianhydride, aromatic tetracarboxylic acid dianhydride, alicyclic tetracarboxylic acid dianhydride, acyclic aliphatic tetracarboxylic acid dianhydride, etc. can be used. The diamines and the tetracarboxylic acid dianhydride may be used alone or in combination of two or more. Instead of tetracarboxylic acid dianhydride, a tetracarboxylic acid compound selected from tetracarboxylic acid compound analogs such as an acid chloride compound may be used as a starting material.

As a cycloolefin type resin, the thermoplastic resin (thermoplastic cycloolefin type resin) which has a unit of the monomer which consists of cyclic olefins (cycloolefin) like norbornene or a polycyclic norbornene type monomer is mentioned, for example. The cycloolefin resin may be a hydrogenated product of the above-mentioned ring-opening polymer of cycloolefin or ring-opening copolymer using two or more types of cyclo-olefin, and may be cycloolefin, chain olefin, vinyl It may be an addition polymer with an aromatic compound having a polymerizable double bond such as a group. A polar group may be introduced into the cycloolefin resin.

When the first protective film is formed using a copolymer of a cycloolefin and an aromatic compound having a linear olefin and / or a vinyl group, examples of the linear olefin include ethylene and propylene, and Examples of the aromatic compound having a vinyl group include styrene, α-methylstyrene and nuclear alkyl-substituted styrene. In such a copolymer, the unit of the cycloolefin monomer may be 50 mol% or less, preferably about 15 to 50 mol%. In particular, when a first protective film is formed using a ternary copolymer of a cycloolefin, a linear olefin, and an aromatic compound having a vinyl group, as described above, the unit of the monomer composed of the cycloolefin is compared Amount can be reduced. In such a ternary copolymer, the unit of monomers consisting of chain olefins is usually 5 to 80 mol%, and the unit of monomers consisting of aromatic compounds having a vinyl group is usually 5 to 80 mol%.

As the cycloolefin resin, an appropriate commercially available product can be used. For example, "TOPAS" sold by Polyplastics Co., Ltd., "Arton" sold by JSR Co., Ltd., "ZEONOR" and "ZEONEX" sold by Nippon Zeon Co., Ltd., Examples include “Apple” (all of which are trade names) sold by Mitsui Chemicals, Inc.

The storage elastic modulus E at 23 ° C. of the resin (A1) is usually 100 MPa or more, preferably 500 MPa or more, more preferably 1000 MPa or more, and preferably 100,000 MPa or less. When the storage elastic modulus of the resin (A1) is high, it is possible to suppress shrinkage and dimensional change when the optical film of the present invention is placed in a high temperature environment.

The photoselective absorption compound (B1) is a compound having high absorption at a wavelength of 350 nm, and examples thereof include an ultraviolet absorber. The UV absorber is not particularly limited, but, for example, oxybenzophenone based UV absorber, benzotriazole based UV absorber, salicylic acid ester based UV absorber, benzophenone based UV absorber, cyanoacrylate based UV absorber, triazine based UV absorber And organic UV absorbers such as agents. More specifically, 5-chloro-2- (3,5-di-sec-butyl-2-hydroxyphenyl) -2H-benzotriazole, (2-2H-benzotriazol-2-yl) -6- ( Straight-chain and side-chain dodecyl) -4-methylphenol, 2-hydroxy-4-benzyloxybenzophenone, 2,4-benzyloxybenzophenone and the like.

The UV absorber may be a commercially available product. For example, as a triazine-based UV absorber, “Kemisorb 102” manufactured by Chemi-Pro Chemical Co., Ltd., “ADEKA STAB LA 46” made by ADEKA CORPORATION, “ADEKA STAB LAF 70”, BASF Japan "Tinuvin 109", "Tinubin 171", "Tinubin 234", "Tinubin 327", "Tinubin 328", "Tinubin 928", "Tinubin 400", "Tinubin 460", "Tinubin" 405 "," tinuvin 477 "(all trade names), and the like. As benzotriazole-based UV absorbers, "ADEKA STAB LA 31" and "ADEKA STAB LA 36" (both are trade names) manufactured by ADEKA Co., Ltd., "Sumisorb 200", "Sumisorb 250" and "Sumisorb 300" manufactured by Sumika Chemtex Co., Ltd. “Sumisorb 340” and “Sumisorb 350” (all trade names), “Kemisorb 74”, “Kemisorb 79” and “Kemisorb 279” (all trade names) manufactured by Chemi-Pro Chemical Co., Ltd., and “BASM” TINUVIN 99-2, "TINUVIN 900" and "TINUVIN 928" (all trade names), and the like.
Two or more types of UV absorbers may be used in combination.

The ultraviolet absorber may be an inorganic ultraviolet absorber. Examples of inorganic ultraviolet absorbers include titanium oxide, zinc oxide, indium oxide, tin oxide, talc, kaolin, calcium carbonate, titanium oxide composite oxide, zinc oxide composite oxide, ITO (tin-doped indium oxide), ATO (Antimony-doped tin oxide) and the like. Examples of titanium oxide-based composite oxides include silica, zinc oxide doped with alumina, and the like. These inorganic ultraviolet absorbers may be used alone or in combination of two or more. Further, an organic ultraviolet absorber and an inorganic ultraviolet absorber may be used in combination.

The content of the light selective absorption compound (B1) is usually 0.01 to 20 parts by mass, preferably 0.05 to 15 parts by mass, more preferably 0 based on 100 parts by mass of the resin (A1). 1 to 10 parts by mass.

The resin composition (1) may further contain a solvent, a plasticizer, an organic acid, a dye, an antistatic agent, a surfactant, a lubricant, a flame retardant, a filler, a rubber particle, and a phase difference adjusting agent.

The light selective absorption layer A is a film that can be formed from the resin composition (1) by using a known molding method. As the molding processing method, compression molding method, transfer molding method, injection molding method, extrusion molding method, blow molding method, powder molding method, FRP molding method, cast coating method (for example, casting method), calendar molding method, heat The press method etc. may be mentioned. The extrusion molding method or the cast coating method is preferred because the smoothness of the resulting film can be enhanced and good optical uniformity can be obtained. Molding conditions may be appropriately set according to the composition and type of the resin used.

The thickness of the light selective absorption layer A is usually 1 to 500 μm, preferably 5 to 300 μm, more preferably 10 to 150 μm, still more preferably 10 to 100 μm, and particularly preferably 10 to 50 μm. . The light selective absorption layer A may be unstretched or stretched. When the light selective absorption layer A is stretched, it may be uniaxially stretched or biaxially stretched. The stretching ratio is usually 1.01 to 10 times, preferably 1.01 to 6 times. The stretching direction can also be performed in various directions and dimensions, such as the length direction, the width direction, the thickness direction, and the oblique direction.

The storage elastic modulus E ′ at 23 ° C. of the light selective absorption layer A is usually 100 MPa or more, preferably 300 MPa or more, more preferably 500 MPa or more, still more preferably 1000 MPa or more, particularly preferably 3000 MPa or more It is. Although the lower limit is not limited, it is usually 100000 MPa or less.
The storage elastic modulus at 23 ° C. of the light selective absorption layer A can be measured by the method described in the examples.

<Selective absorption layer B>
The light selective absorption layer B satisfies the above formula (2). The larger the value of A (405), the higher the absorption at a wavelength of 405 nm. When the value of A (405) is less than 0.5, the absorption at a wavelength of 405 nm is low, and a retardation film or an organic EL element in ultraviolet light Etc. The effect of suppressing the deterioration of the display device is small. The value of A (405) is preferably 0.6 or more, more preferably 0.8 or more, and particularly preferably 1.0 or more. The lower limit is not particularly limited, but is usually 10.0 or less.

The light selective absorption layer B may be any layer that forms an optical film as long as it satisfies the formula (2), but is preferably a pressure-sensitive adhesive layer having a light selective absorption function. The pressure-sensitive adhesive layer having a light selective absorption function is formed of a pressure-sensitive adhesive composition (hereinafter sometimes referred to as "pressure-sensitive adhesive composition (2)").
The thickness of the light selective absorption layer B is usually 0.1 μm to 50 μm, preferably 1 μm to 30 μm, and more preferably 4 μm to 20 μm.

The pressure-sensitive adhesive composition (2) is preferably a pressure-sensitive adhesive composition containing a (meth) acrylic resin (a), a crosslinking agent (b) and a light selective absorption compound (c).

<(Meth) acrylic resin (a)>
The (meth) acrylic resin (a) is preferably a polymer having a constituent unit derived from (meth) acrylic acid ester as a main component (preferably containing 50% by mass or more). The structural unit derived from (meth) acrylic acid ester is a structural unit derived from a monomer other than one or more (meth) acrylic acid esters (for example, a structural unit derived from a monomer having a polar functional group) May be included. In the present specification, (meth) acrylic acid means that either acrylic acid or methacrylic acid may be used, and in the case of (meth) acrylate etc., “(meth)” also has the same meaning. .

Examples of the (meth) acrylic acid ester include (meth) acrylic acid esters represented by the following formula (I)

[In formula (I), R ₁ represents a hydrogen atom or a methyl group, R ₂ represents an alkyl group having 1 to 14 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and hydrogen of the alkyl group or the aralkyl group The atom may be replaced by an alkoxy group having 1 to 10 carbon atoms. ]

In formula (I), R ₂ is preferably an alkyl group having 1 to 14 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms.

As the (meth) acrylic acid ester represented by the formula (I),
Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, (Meth) acrylic acid n-heptyl, (meth) acrylic acid n-octyl, (meth) acrylic acid n-nonyl, (meth) acrylic acid n-decyl, (meth) acrylic acid n-dodecyl, (meth) acrylic acid Linear alkyl esters of (meth) acrylic acid such as lauryl, stearyl (meth) acrylate, etc .;
(Meth) acrylic acid i-propyl, (meth) acrylic acid i-butyl, (meth) acrylic acid t-butyl, (meth) acrylic acid i-pentyl, (meth) acrylic acid i-hexyl, (meth) acrylic acid Branching of (meth) acrylic acid such as 2-ethylhexyl, i-octyl (meth) acrylate, i-nonyl (meth) acrylate, i-stearyl (meth) acrylate, i-amyl (meth) acrylate, etc. Alkyl esters;
(Meth) acrylic acid cyclohexyl, isoboronyl (meth) acrylic acid, adamantyl (meth) acrylic acid, dicyclopentanyl (meth) acrylic acid, cyclododecyl (meth) acrylic acid, methyl cyclohexyl (meth) acrylic acid, ( Alicyclic skeleton-containing alkyl ester of (meth) acrylic acid such as trimethylcyclohexyl (meth) acrylate, tert-butylcyclohexyl (meth) acrylate, cyclohexyl α-ethoxyacrylate, etc .;
Aromatic ring skeleton-containing ester of (meth) acrylic acid such as phenyl (meth) acrylate;
Etc.

Moreover, the substituent-containing (meth) acrylic acid alkyl ester in which the substituent was introduce | transduced into the alkyl group in (meth) acrylic acid alkyl ester can also be mentioned. The substituent of the substituent-containing (meth) acrylic acid alkyl ester is a group that substitutes a hydrogen atom of the alkyl group, and specific examples thereof include a phenyl group, an alkoxy group, and a phenoxy group. Specific examples of the substituent-containing (meth) acrylic acid alkyl ester include 2-methoxyethyl (meth) acrylate, ethoxymethyl (meth) acrylate, phenoxyethyl (meth) acrylate, 2- (meth) acrylate Examples thereof include (2-phenoxyethoxy) ethyl, phenoxydiethylene glycol (meth) acrylate, and phenoxypoly (ethylene glycol) (meth) acrylate.

These (meth) acrylic acid esters can be used alone or in combination of two or more different ones.

The (meth) acrylic resin (a) is a structural unit derived from an acrylic acid alkyl ester (a1) having a homopolymer glass transition temperature Tg of less than 0 ° C., and an alkyl acrylate having a homopolymer Tg of 0 ° C. or more. It is preferable to contain the structural unit derived from ester (a2). Containing the structural unit derived from the acrylic acid alkyl ester (a1) and the structural unit derived from the acrylic acid alkyl ester (a2) is advantageous for enhancing the high temperature durability of the pressure-sensitive adhesive layer. As the Tg of the homopolymer of (meth) acrylic acid alkyl ester, literature values such as, for example, POLYMER HANDBOOK (Wiley-Interscience) can be adopted.

Specific examples of the acrylic acid alkyl ester (a1) include ethyl acrylate, n- and i-propyl acrylate, n- and i-butyl acrylate, n-pentyl acrylate, n- and i-hexyl acrylate , N-heptyl acrylate, n- and i-octyl acrylate, 2-ethylhexyl acrylate, n- and i-nonyl acrylate, n- and i-decyl acrylate, and n-dodecyl acrylate alkyl Examples thereof include acrylic acid alkyl esters having about 2 to 12 carbon atoms.

As the acrylic acid alkyl ester (a1), only one type may be used, or two or more types may be used in combination. Among them, n-butyl acrylate, n-octyl acrylate, 2-ethylhexyl acrylate and the like are preferable from the viewpoint of followability and reworkability when the light selective absorption layer B is laminated on another layer.

The acrylic acid alkyl ester (a2) is an acrylic acid alkyl ester other than the acrylic acid alkyl ester (a1). Specific examples of the acrylic acid alkyl ester (a2) include methyl acrylate, cyclohexyl acrylate, isoboronyl acrylate, stearyl acrylate, t-butyl acrylate and the like.

As the acrylic acid alkyl ester (a2), only one type may be used, or two or more types may be used in combination. Among them, from the viewpoint of high temperature durability, the acrylic acid alkyl ester (a2) preferably contains methyl acrylate, cyclohexyl acrylate, isoboronyl acrylate and the like, and more preferably methyl acrylate.

The structural unit derived from the (meth) acrylic acid ester represented by the formula (I) is preferably 50% by mass or more in all structural units contained in the (meth) acrylic resin (a), preferably 60 to 95 The content is preferably in the range of 50% by mass, and more preferably in the range of 65 to 95% by mass.

As a structural unit derived from monomers other than (meth) acrylic acid ester, a structural unit derived from a monomer having a polar functional group is preferable, and a structure derived from a (meth) acrylic acid ester having a polar functional group Units are more preferred. Examples of polar functional groups include hydroxy groups, carboxyl groups, substituted or unsubstituted amino groups, and heterocyclic groups such as epoxy groups.
As a monomer having a polar functional group,
(Meth) acrylic acid 1-hydroxymethyl, (meth) acrylic acid 1-hydroxyethyl, (meth) acrylic acid 1-hydroxyheptyl, (meth) acrylic acid 1-hydroxybutyl, (meth) acrylic acid 1-hydroxypentyl, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypentyl (meth) acrylate, 2-hydroxyhexyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 3-hydroxypentyl (meth) acrylate, 3-hydroxyhexyl (meth) acrylate, 3-hydroxyheptyl (meth) acrylate, (Meth) acrylic acid 4-hydroxybutyl, (meth) 4-hydroxypentyl methacrylate, 4-hydroxyhexyl (meth) acrylate, 4-hydroxyheptyl (meth) acrylate, 4-hydroxyoctyl (meth) acrylate, 2-chloro-2-hydroxypropyl (meth) acrylate , 3-chloro-2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, 5-hydroxyhexyl (meth) acrylate, (meth ) 5-hydroxyheptyl acrylate, 5-hydroxyoctyl (meth) acrylate, 5-hydroxynonyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 6-hydroxyheptyl (meth) acrylate, (meth) ) Acrylic acid 6-hydroxyoctyl, (meta Acrylic acid 6-hydroxynonyl, (meth) acrylic acid 6-hydroxydecyl, (meth) acrylic acid 7-hydroxyheptyl, (meth) acrylic acid 7-hydroxyoctyl, (meth) acrylic acid 7-hydroxynonyl, (meth) Acrylic acid 7-hydroxydecyl, (meth) acrylic acid 7-hydroxyundecyl, (meth) acrylic acid 8-hydroxyoctyl, (meth) acrylic acid 8-hydroxynonyl, (meth) acrylic acid 8-hydroxydecyl (meth ) 8-hydroxyundecyl acrylate, 8-hydroxydodecyl (meth) acrylate, 9-hydroxynonyl (meth) acrylate, 9-hydroxydecyl (meth) acrylate, 9-hydroxyundecyl (meth) acrylate, (Meth) acrylic acid 9-hydroxydodecyl, (meth) ac 9-hydroxytridecyl acrylate, 10-hydroxydecyl (meth) acrylate, 10-hydroxyundecyl (meth) acrylate, 10-hydroxydodecyl (meth) acrylate, 10-hydroxytridecyl acrylate, (meth) Acrylic acid 10-hydroxytetradecyl, (meth) acrylic acid 11-hydroxyundecyl, (meth) acrylic acid 11-hydroxydodecyl, (meth) acrylic acid 11-hydroxytridecyl, (meth) acrylic acid 11-hydroxytetradecyl 11-hydroxypentadecyl (meth) acrylic acid, 12-hydroxydodecyl (meth) acrylic acid, 12-hydroxytridecyl (meth) acrylic acid, 12-hydroxytetradecyl (meth) acrylic acid, (meth) acrylic acid 13 -Hydroxypentadecyl (Meth) acrylic acid 13-hydroxytetradecyl, (meth) acrylic acid 13-hydroxypentadecyl, (meth) acrylic acid 14-hydroxytetradecyl, (meth) acrylic acid 14-hydroxypentadecyl, (meth) acrylic acid 15 -A monomer having a hydroxy group such as hydroxypentadecyl, 15-hydroxyheptadecyl (meth) acrylic acid;
(Meth) acrylic acid, carboxyalkyl (meth) acrylate (eg, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate), maleic acid, maleic anhydride, fumaric acid, crotonic acid, etc. body;
Acryloyl morpholine, vinylcaprolactam, N-vinyl-2-pyrrolidone, vinylpyridine, tetrahydrofurfuryl (meth) acrylate, caprolactone modified tetrahydrofurfuryl acrylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, glycidyl (meth) acrylate, A monomer having a heterocyclic group such as 2,5-dihydrofuran;
Monomers having a substituted or unsubstituted amino group such as aminoethyl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) acrylate and the like can be mentioned.
Among them, a monomer having a hydroxy group or a monomer having a carboxyl group is preferable in view of the reactivity between the (meth) acrylate polymer and the crosslinking agent, and a monomer having a hydroxy group and a carboxyl group It is more preferable to include any of the monomers having

As a monomer having a hydroxy group, 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 5-hydroxypentyl acrylate, 6-hydroxyhexyl acrylate are preferable. In particular, good durability can be obtained by using 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate and 5-hydroxypentyl acrylate.
As a monomer having a carboxyl group, acrylic acid is preferably used.

From the viewpoint of preventing the peel force enhancement of the separate film which can be laminated on the outer surface of the pressure-sensitive adhesive layer, the (meth) acrylic resin (a) substantially does not contain a structural depression derived from a monomer having an amino group. Is preferred. Here, “not substantially contained” means that it is 0.1 parts by mass or less in 100 parts by mass of all the constituent units constituting the (meth) acrylic resin (a).

The content of the structural unit derived from the monomer having a polar functional group is preferably 20 parts by mass or less, more preferably 0 based on 100 parts by mass of the total structural units of the (meth) acrylic resin (a). 0.5 parts by weight or more and 15 parts by weight or less, more preferably 0.5 parts by weight or more and 10 parts by weight or less, particularly preferably 1 parts by weight or more and 7 parts by weight or less.

The content of the structural unit derived from the monomer having an aromatic group is preferably 20 parts by mass or less, more preferably 4 parts by mass with respect to 100 parts by mass of the total structural units of the (meth) acrylic resin (a) The content is not less than 20 parts by mass and preferably not less than 4 parts by mass and not more than 16 parts by mass.

As structural units derived from monomers other than (meth) acrylic acid esters, structural units derived from styrenic monomers, structural units derived from vinyl monomers, plural (meth) acryloyl groups in the molecule The structural unit derived from the monomer which has group, the structural unit derived from a (meth) acrylamide type monomer, etc. are also mentioned.

As styrene-based monomers, styrene; alkylstyrenes such as methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, triethylstyrene, propylstyrene, butylstyrene, hexylstyrene, heptylstyrene, octylstyrene, etc .; fluorostyrene, Halogenated styrenes such as chlorostyrene, bromostyrene, dibromostyrene, iodostyrene; nitrostyrene; acetylstyrene; methoxystyrene; and divinylbenzene.

Examples of vinyl monomers include fatty acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl 2-ethylhexanoate and vinyl laurate; vinyl halides such as vinyl chloride and vinyl bromide; vinylidene chloride and the like And vinylidene halides; nitrogen-containing heteroaromatic vinyls such as vinylpyridine, vinylpyrrolidone and vinylcarbazole; conjugated dienes such as butadiene, isoprene and chloroprene; and unsaturated nitriles such as acrylonitrile and methacrylonitrile.

As monomers having a plurality of (meth) acryloyl groups in the molecule, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di ( Two (meth) acryloyl groups in the molecule such as meta) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate and tripropylene glycol di (meth) acrylate Monomers having; monomers having three (meth) acryloyl groups in a molecule such as trimethylolpropane tri (meth) acrylate.

Examples of (meth) acrylamide monomers include N-methylol (meth) acrylamide, N- (2-hydroxyethyl) (meth) acrylamide, N- (3-hydroxypropyl) (meth) acrylamide, N- (4-) Hydroxybutyl) (meth) acrylamide, N- (5-hydroxypentyl) (meth) acrylamide, N- (6-hydroxyhexyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide Meta) acrylamide, N-isopropyl (meth) acrylamide, N- (3-dimethylaminopropyl) (meth) acrylamide, N- (1,1-dimethyl-3-oxobutyl) (meth) acrylamide, N- [2- (2-) 2-Oxo-1-imidazolidinyl) ethyl] (meth) acrylamide 2-acryloylamino-2-methyl-1-propanesulfonic acid, N- (methoxymethyl) acrylamide, N- (ethoxymethyl) (meth) acrylamide, N- (propoxymethyl) (meth) acrylamide, N- (1-) Methylethoxymethyl) (meth) acrylamide, N- (1-methylpropoxymethyl) (meth) acrylamide, N- (2-methylpropoxymethyl) (meth) acrylamide, N- (butoxymethyl) (meth) acrylamide, N- (1,1-Dimethylethoxymethyl) (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N- (2-ethoxyethyl) (meth) acrylamide, N- (2-propoxyethyl) (meth) ) Acrylamide, N- [2- (1-methylethoxy) ethyl] Meta) Acrylamide, N- [2- (1-Methylpropoxy) ethyl] (meth) acrylamide, N- [2- (2-Methylpropoxy) ethyl] (meth) acrylamide, N- (2-Butoxyethyl) (meth) acrylamide A) acrylamide, N- [2- (1,1-dimethylethoxy) ethyl] (meth) acrylamide and the like. Among them, N- (methoxymethyl) acrylamide, N- (ethoxymethyl) acrylamide, N- (propoxymethyl) acrylamide, N- (butoxymethyl) acrylamide and N- (2-methylpropoxymethyl) acrylamide are preferable.

The weight average molecular weight (Mw) of the (meth) acrylic resin (a) is preferably 500,000 to 2,500,000. When the weight average molecular weight is 500,000 or more, the durability of the pressure-sensitive adhesive layer in a high temperature environment is improved, and defects such as peeling between adherends and the pressure-sensitive adhesive layer, cohesive failure of the pressure-sensitive adhesive layer, etc. It is easy to control. When the weight average molecular weight is 2,500,000 or less, it is advantageous from the viewpoint of coatability when processing the pressure-sensitive adhesive composition into, for example, a sheet (coating on a substrate). The weight-average molecular weight is preferably 600,000 to 1,800,000, more preferably 700,000 to 1,700,000, and particularly preferably 100, from the viewpoint of achieving both the durability of the pressure-sensitive adhesive layer and the coatability of the pressure-sensitive adhesive composition. It is 10,000 to 1.6 million. The molecular weight distribution (Mw / Mn) represented by the ratio of weight average molecular weight (Mw) to number average molecular weight (Mn) is usually 2 to 10, preferably 3 to 8, and more preferably 3 to 6 . The weight average molecular weight can be analyzed by gel permeation chromatography and is a value in terms of standard polystyrene.

When the (meth) acrylic resin (a) is dissolved in ethyl acetate to form a solution having a concentration of 20% by mass, the viscosity at 25 ° C. is preferably 20 Pa · s or less, preferably 0.1 to 15 Pa · s. It is more preferable that It is advantageous from the viewpoint of the coatability at the time of applying an adhesive constituent (2) to a substrate as it is a viscosity of this range. The viscosity can be measured by a Brookfield viscometer.

The glass transition temperature (Tg) of the (meth) acrylic resin (a) is, for example, -60 to 20 ° C, preferably -50 to 15 ° C, more preferably -45 to 10 ° C, and particularly -40 to 0 ° C. May be A Tg of 20 ° C. or less is advantageous for improving the wettability of the pressure-sensitive adhesive layer to an adherend substrate, and a temperature of −60 ° C. or more is advantageous for improving the durability of the pressure-sensitive adhesive layer. The glass transition temperature can be measured by a differential scanning calorimeter (DSC).

The (meth) acrylic resin (a) can be produced by a known method such as, for example, a solution polymerization method, a bulk polymerization method, a suspension polymerization method, an emulsion polymerization method, and the solution polymerization method is particularly preferable. As the solution polymerization method, for example, a monomer and an organic solvent are mixed, a thermal polymerization initiator is added under a nitrogen atmosphere, and a temperature condition of about 40 to 90 ° C., preferably about 50 to 80 ° C., 3 to 15 The method of stirring for about time is mentioned. In order to control the reaction, monomers or a thermal polymerization initiator may be added continuously or intermittently during the polymerization. The monomer and thermal initiator may be in the state of being added to an organic solvent.

As a polymerization initiator, a thermal polymerization initiator, a photopolymerization initiator, etc. are used. As the photopolymerization initiator, 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone and the like can be mentioned. As a thermal polymerization initiator, 2,2'-azobisisobutyronitrile, 2,2'-azobis (2-methylbutyronitrile), 1,1'-azobis (cyclohexane-1-carbonitrile), 2 2,2'-azobis (2,4-dimethylvaleronitrile), 2,2'-azobis (2,4-dimethyl-4-methoxyvaleronitrile), dimethyl-2,2'-azobis (2-methyl propionate) Azo compounds such as 2,2'-azobis (2-hydroxymethylpropionitrile); lauryl peroxide, t-butyl hydroperoxide, benzoyl peroxide, t-butyl peroxybenzoate, cumene hydroperoxide, Diisopropyl peroxy dicarbonate, dipropyl peroxy dicarbonate, t-butyl peroxy neode Organic peroxides such as noates, t-butylperoxypivalate, (3,5,5-trimethylhexanoyl) peroxide; inorganic peroxides such as potassium persulfate, ammonium persulfate, hydrogen peroxide and the like . In addition, a redox initiator in which a peroxide and a reducing agent are used in combination can also be used.

The proportion of the polymerization initiator is about 0.001 to 5 parts by mass with respect to 100 parts by mass of the total of the monomers constituting the (meth) acrylic resin. The polymerization of the (meth) acrylic resin may be carried out by a polymerization method using active energy rays (for example, ultraviolet rays and the like).

Organic solvents include aromatic hydrocarbons such as toluene and xylene; esters such as ethyl acetate and butyl acetate; aliphatic alcohols such as propyl alcohol and isopropyl alcohol; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone Can be mentioned.

The content of the (meth) acrylic resin (a) is usually 60% by mass to 99.9% by mass, preferably 70% by mass to 99.5% by mass, in 100% by mass of the pressure-sensitive adhesive composition (2). More preferably, it is 80% by mass to 99% by mass.

<Crosslinking agent (b)>
The crosslinking agent (b) reacts with polar functional groups (for example, hydroxy group, amino group, carboxyl group, heterocyclic group, etc.) in the (meth) acrylic resin (a). The crosslinking agent (b) forms a crosslinked structure with a (meth) acrylic resin or the like to form a crosslinked structure that is advantageous for durability and reworkability.

Examples of the crosslinking agent (b) include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, metal chelate-based crosslinking agents, etc. In particular, the pot life of the pressure-sensitive adhesive composition (2) and the durability of the pressure-sensitive adhesive layer It is preferable that it is an isocyanate type crosslinking agent from a viewpoint of property, a crosslinking speed, etc.

As the isocyanate compound, a compound having at least two isocyanato groups (-NCO) in the molecule is preferable. For example, aliphatic isocyanate compounds (for example, hexamethylene diisocyanate etc.), alicyclic isocyanate compounds (for example isophorone diisocyanate) And hydrogenated diphenylmethane diisocyanate, hydrogenated xylylene diisocyanate), aromatic isocyanate compounds (eg, tolylene diisocyanate, xylylene diisocyanate diphenylmethane diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, etc.) and the like. The crosslinking agent (B) may be an adduct of the above-mentioned isocyanate compound with a polyhydric alcohol compound (adduct) [for example, an adduct of glycerol, trimethylolpropane etc.], isocyanurate, burette type compound, polyether polyol, polyester It may be a derivative such as a urethane prepolymer type isocyanate compound which is addition-reacted with a polyol, an acrylic polyol, a polybutadiene polyol, a polyisoprene polyol or the like. The crosslinking agents (B) can be used alone or in combination of two or more. Among these, typically, aromatic isocyanate compounds (eg, tolylene diisocyanate, xylylene diisocyanate), aliphatic isocyanate compounds (eg, hexamethylene diisocyanate) or polyhydric alcohol compounds thereof (eg, glycerol, trimethylolpropane) And adducts thereof, or isocyanurates. If the crosslinking agent (B) is an adduct of an aromatic isocyanate compound and / or a polyhydric alcohol compound thereof or an isocyanurate, it is advantageous for the formation of an optimal crosslinking density (or crosslinked structure), The durability of the pressure-sensitive adhesive layer can be improved. In particular, when it is an adduct of a tolylene diisocyanate compound and / or a polyhydric alcohol compound thereof, the durability can be improved even when, for example, the pressure-sensitive adhesive layer is applied to a polarizing plate.

The content of the crosslinking agent (b) is usually 0.01 to 15 parts by mass, preferably 0.05 to 10 parts by mass, relative to 100 parts by mass of the (meth) acrylic resin (a). Preferably, it is 0.1 to 5 parts by mass.

<Selective light selective compound (c)>
The light selective absorption compound (c) is a compound that selectively absorbs light of wavelength 405 nm, is preferably a compound that satisfies the formula (5), and is more preferably a compound that satisfies the formula (6) .
ε (405) 20 20 (5)
[In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. The unit of gram absorption coefficient is L / (g · cm). ]
ε (405) / ε (440) ≧ 20 (6)
[In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm. ]
The gram absorbance coefficient is measured by the method described in the examples.

The larger the value of ε (405) is, the easier it is to absorb light with a wavelength of 405 nm, and it is easy to exhibit the function of suppressing deterioration by ultraviolet light or visible light of short wavelength. The light absorption selective layer B has a value of ε (405) of less than 20 L / (g · cm) in order to exhibit a function to suppress deterioration of the retardation film or the organic EL light emitting device due to ultraviolet light or short wavelength visible light. The content of the light selective absorption compound (c) in the medium is increased. When the content of the light selective absorption compound (c) is increased, the light selective absorption compound (c) may be bled out or dispersed unevenly, and the light absorption function may be insufficient. The value of ε (405) is preferably 20 L / (g · cm) or more, more preferably 30 L / (g · cm) or more, and even more preferably 40 L / (g · cm) or more Preferably, it is usually 500 L / (g · cm) or less.

A compound having a larger value of ε (405) / ε (440) absorbs light in the vicinity of 405 nm and suppresses light degradation of a display device such as a retardation film or an organic EL element without inhibiting color expression of the display device. can do. The value of ε (405) / ε (440) is preferably 20 or more, more preferably 40 or more, still more preferably 70 or more, and particularly preferably 80 or more.

Moreover, it is preferable that a photoselective absorption compound (c) is a compound which contains a merocyanine structure in a molecule | numerator. The compound having a merocyanine structure is a compound containing in its molecule a partial structure represented by-(N-C = C-C = C)-, and examples thereof include merocyanine compounds, cyanine compounds and indoles. Examples include compounds based on the type and benzotriazole type compounds. The photoselective absorption compound (c) is preferably a merocyanine compound, a cyanine compound or a benzotriazole compound.

The photoselective absorption compound (c) is preferably a compound represented by the formula (I) (hereinafter sometimes referred to as a compound (I)).

[Wherein, R ¹ and R ⁵ each independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms which may have a substituent, or 7 to carbon atoms which may have a substituent; 15 represent an aralkyl group, an aryl group having a carbon number of 6 to 15, and a heterocyclic group, and -CH _2- contained in the alkyl group or the aralkyl group is -NR ^1A- , -CO-, -SO _2- , -O It may be substituted by-or -S-.
R ^1A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
R ² , R ³ and R ⁴ each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms which may have a substituent, or an aromatic hydrocarbon group which may have a substituent Or an aromatic heterocyclic group which may have a substituent, and -CH _2- contained in the alkyl group is -NR ^1B- , -CO-, -SO _2- , -O- or -S- And may be substituted.
R ^1B represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
R ⁶ and R ⁷ each independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an electron-withdrawing group, or R ⁶ and R ⁷ may be linked to each other to form a ring structure .
R ¹ and R ² may be linked to each other to form a ring structure, and R ² and R ³ may be linked to each other to form a ring structure, and R ² and R ⁴ are linked to each other to form a ring structure And R ³ and R ⁶ may be linked to each other to form a ring structure. ]

Examples of the alkyl group having 1 to 25 carbon atoms represented by R ¹ and R ⁵ include methyl group, ethyl group, n-propyl group, isopropyl group, 2-cyanopropyl group, n-butyl group, tert-butyl group, and sec-butyl, n-pentyl, n-hexyl, 1-methylbutyl, 3-methylbutyl, n-octyl, n-decyl, 2-hexyl-octyl and the like.
Examples of the substituent which the alkyl group having 1 to 25 carbon atoms represented by R ¹ and R ⁵ may have include the groups described in the following group A.
Group A: nitro, hydroxy, carboxy, sulfo, cyano, amino, halogen, alkoxy having 1 to 6 carbons, alkylsilyl having 1 to 12 carbons, alkyl having 2 to 8 carbons carbonyl ^{^{_{group, * - R a1 - (O}}} -R a2) t1 -R a3 (R a1 and ^{R a2} each independently represent an alkanediyl group having 1 to 6 carbon ^{atoms, R a3} is a C1- 6 represents an alkyl group, and s 1 represents an integer of 1 to 3.) and the like.
Examples of the alkylsilyl group having 1 to 12 carbon atoms include monoalkylsilyl groups such as methylsilyl group, ethylsilyl and propylsilyl groups; dialkylsilyl groups such as dimethylsilyl group, diethylsilyl group and methylethylsilyl group; trimethylsilyl and triethylsilyl, And trialkylsilyl groups such as tripropylsilyl group.
Examples of the alkylcarbonyl group having 2 to 8 carbon atoms include a methylcarbonyl group and an ethylcarbonyl group.
As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom etc. are mentioned.

Examples of the aralkyl group having 7 to 15 carbon atoms represented by R ¹ and R ⁵ include a benzyl group and a phenylethyl group. Examples of the group in which —CH ₂ — contained in the aralkyl group is replaced by —SO ₂ — or —COO— include a 2-phenylacetic acid ethyl group and the like.
Examples of the substituent which the aralkyl group having 7 to 15 carbon atoms represented by R ¹ and R ⁵ may have include the groups described in Group A above.
Examples of the aryl group having 6 to 15 carbon atoms represented by R ¹ and R ⁵ include a phenyl group, a naphthyl group and an anthracenyl group.
Examples of the substituent which the aryl group having 6 to 15 carbon atoms represented by R ¹ and R ⁵ may have include the groups described in Group A above.
Examples of the heterocyclic group having 6 to 15 carbon atoms represented by R ¹ and R ⁵ include carbons such as pyridyl, pyrrolidinyl, quinolyl, thiophene, imidazolyl, oxazolyl, pyrrole, thiazolyl and furanyl And 3 to 9 aromatic heterocyclic groups.

^Examples of the alkyl group having 1 to 6 carbon atoms represented by R ^1A and R ^1B include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, tert-butyl group, sec-butyl group, n -Pentyl group, n-hexyl group and the like.

Examples of the alkyl group having 1 to 6 carbon atoms represented by R ² , R ³ and R ⁴ include the same ones as the alkyl group having 1 to 6 carbon atoms represented by R ^1B .
Examples of the substituent which the alkyl group having 1 to 6 carbon atoms represented by R ² , R ³ and R ⁴ may have include the groups described in the above-mentioned group A.
The aromatic hydrocarbon group represented by R ² , R ³ and R ⁴ includes aryl groups having 6 to 15 carbon atoms such as phenyl, naphthyl and anthracenyl; and 7 to 15 carbon atoms such as benzyl and phenylethyl. There may be mentioned 15 aralkyl groups.
Examples of the substituent which the aromatic hydrocarbon group represented by R ² , R ³ and R ⁴ may have include the groups described in Group A above.
The aromatic heterocyclic ring represented by R ² , R ³ and R ⁴ has 3 carbon atoms such as pyridyl, pyrrolidinyl, quinolyl, thiophene, imidazolyl, oxazolyl, pyrrole, thiazolyl and furanyl. And aromatic heterocyclic groups of -9.
As a substituent which the aromatic heterocyclic ring represented by R < ² >, R < ³ > and R < ⁴ > may have, the group as described in the said group A is mentioned.

Examples of the alkyl group having 1 to 25 carbon atoms represented by R ⁶ and R ⁷ include the same ones as the alkyl group having 1 to 25 carbon atoms represented by R ¹ and R ⁵ .
Examples of the substituent which the alkyl group having 1 to 25 carbon atoms represented by R ⁶ and R ⁷ may have include the groups described in Group A above.

Examples of the electron withdrawing group represented by R ⁶ and R ⁷ include a cyano group, a nitro group, a halogen atom, an alkyl group substituted with a halogen atom, and a group represented by formula (I-1) .

[Wherein, R ¹¹ represents a hydrogen atom or an alkyl group having 1 to 25 carbon atoms, and at least one of the methylene groups contained in the alkyl group may be substituted by an oxygen atom.
X ¹ is, -CO -, - COO -, - OCO -, - CS -, - CSS -, - COS -, - NR 12 CO- or CONR ¹³ - represents a.
R ¹² and R ¹³ each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. ]

The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alkyl group substituted by a halogen atom include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group, and the like Perfluoroalkyl groups, such as perfluorohexyl group, etc. are mentioned. The carbon number of the alkyl group substituted with a halogen atom is usually 1 to 25.

Examples of the alkyl group having 1 to 25 carbon atoms represented by R ¹¹ include the same as the alkyl groups represented by R ¹ and R ⁵ .
Examples of the C 1 to C 6 alkyl group represented by R ¹² and R ¹³ include the same as the C ¹ to C 6 alkyl group represented by R ^1A .

R ⁶ and R ⁷ may be linked to each other to form a ring structure, and examples of the ring structure formed of R ⁶ and R ⁷ include a Meldrum's acid structure, a barbituric acid structure, a dimedone structure, etc. Be

The ring structure formed by bonding R ² and R ³ to each other is a nitrogen-containing ring structure containing a nitrogen atom bonded to R ^2, and is, for example, a 4- to 14-membered nitrogen-containing heterocyclic ring It can be mentioned. The ring structure formed by linking R ² and R ³ to each other may be monocyclic or polycyclic. Specifically, pyrrolidine ring, pyrroline ring, imidazolidine ring, imidazoline ring, oxazoline ring, thiazoline ring, piperidine ring, morpholine ring, piperazine ring, indole ring, isoindole ring and the like can be mentioned.

The ring structure formed by bonding R ¹ and R ² to each other is a nitrogen-containing ring structure containing a nitrogen atom to which R ¹ and R ² are bonded, and is, for example, a 4- to 14-membered ring (preferably And 4 to 8 membered rings). The ring structure formed by linking R ¹ and R ² to each other may be monocyclic or polycyclic. Specifically, the same as the ring structure formed by linking R ² and R ³ to each other can be mentioned.

The ring structure formed by combining R ² and R ⁴ with one another includes a 4- to 14-membered nitrogen-containing ring structure, and a 5- to 9-membered nitrogen-containing ring structure is preferable. The ring structure formed by bonding R ² and R ⁴ to each other may be monocyclic or polycyclic. These rings may have a substituent, and as such a ring structure, the same one as exemplified as the ring structure formed by R ² and R ³ may be mentioned.

The ring structure formed by linking R ³ and R ⁶ to each other is a ring structure in which R ³ -C = C-C = C-R ⁶ forms a ring skeleton. For example, a phenyl group etc. are mentioned.

Examples of the compound represented by formula (I) in which R ² and R ³ are linked to each other to form a ring structure include compounds represented by formula (IA), and R ² and R ⁴ Examples of the compound represented by the formula (I) which forms a ring structure by linking include a compound represented by the formula (IB) and the like.

[In formula (IA) and formula (IB), R ¹ , R ³ , R ⁴ , R ⁵ , R ⁶ and R ⁷ each represent the same meaning as described above.
Ring W ¹ and ring W ² each independently represent a nitrogen-containing ring. ]

Ring W ¹ and ring W ² represent a nitrogen-containing ring containing a nitrogen atom as a constituent unit of the ring. The ring W ¹ and the ring W ² may be monocyclic or polycyclic, and may contain a heteroatom other than nitrogen as a constituent unit of the ring. The ring W ¹ and the ring W ² are preferably each independently a 5- to 9-membered ring.

The compound represented by the formula (IA) is preferably a compound represented by the formula (IA-1).

[In formula (IA), R ¹ , R ⁴ , R ⁵ , R ⁶ and R ⁷ each represent the same meaning as described above.
A ¹ represents -CH _2- , -O-, -S- or -NR ^1D- .
Each of R ¹⁴ and R ¹⁵ independently represents a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
R ^1D represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. ]

The compound represented by the formula (IB) is preferably a compound represented by the formula (IB-1) and a compound represented by the formula (IB-2).

[In the formula (I-B-1), R ¹ , R ⁶ and R ⁷ each represent the same meaning as described above.
Each R ¹⁶ independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group. ]

[In the formula (I-B-2), R ³ , R ⁵ , R ⁶ and R ⁷ each represent the same meaning as described above.
R ³⁰ represents a hydrogen atom, a cyano group, a nitro group, a halogen atom, a mercapto group, an amino group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aromatic hydrocarbon having 6 to 18 carbon atoms And an acyl group having 2 to 13 carbon atoms, an acyloxy group having 2 to 13 carbon atoms, or an alkoxycarbonyl group having 2 to 13 carbon atoms.
R ³¹ represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a mercapto group, an alkylthio group having 1 to 12 carbon atoms, an amino group or heterocyclic group which may have a substituent, Represent. ]

The halogen atom represented by R ^30, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom.
The acyl group of 2 to 13 carbon atoms represented by R ³⁰ represented by R ^30, an acetyl group, and the like propionyl group and butyryl group.
Examples of the acyloxy group having 2 to 13 carbon atoms represented by R ³⁰ include a methyl carbonyloxy group, an ethyl carbonyloxy group, a propyl carbonyloxy group, and a butyl carbonyloxy group.
Examples of the alkoxycarbonyl group having 2 to 13 carbon atoms represented by R ³⁰ include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group and the like.
Examples of the aromatic hydrocarbon group having 6 to 18 carbon atoms represented by R ³⁰ include aryl groups having 6 to 18 carbon atoms such as phenyl group, naphthyl group and biphenyl group; 7 carbon atoms such as benzyl group and phenylethyl group There may be mentioned an aralkyl group of -18.
Examples of the alkyl group having 1 to 12 carbon atoms represented by R ³⁰ include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R ¹⁴ .
Examples of the alkyl group having 1 to 12 carbon atoms represented by R ³⁰ include a methoxy group, an ethoxy group, a propoxy group, a butoxy group and a pentoxy group.
R ³⁰ is preferably an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an amino group or a mercapto group.

Examples of the alkyl group having 1 to 12 carbon atoms represented by R ³¹ include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R ¹⁴ .
Examples of the C 1-12 alkoxy group represented by R ³¹ include the same as the C 1-12 alkoxy group represented by R ³⁰ .
Examples of the alkylthio group having 1 to 12 carbon atoms represented by R ³¹ include a methylthio group, an ethylthio group, a propylthio group, a butylthio group, a pentylthio group and a hexylthio group.
The amino group which may have a substituent represented by R ³¹ is, for example, an amino group; one alkyl group having 1 to 8 carbon atoms such as N-methylamino group or N-ethylamino group Amino groups; amino groups substituted with two alkyl groups having 1 to 8 carbon atoms such as N, N-dimethylamino, N, N-diethylamino, N, N-methylethylamino and the like; and the like.
Examples of the heterocyclic ring represented by R ³¹ include nitrogen-containing heterocyclic groups having 4 to 9 carbon atoms such as pyrrolidinyl group, piperidinyl group and morpholinyl group.

As a compound represented by the formula (I) in which R ³ and R ⁶ are linked to each other to form a ring structure, and R ² and R ⁴ are linked to each other to form a ring structure, a compound represented by formula (IC) And the like.

[In formula (I-C), R ^1, R ⁶ and R ⁷ represent the same meaning as described above.
Each of R ²¹ and R ²² independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or a hydroxy group.
Each of X ² and X ³ independently represents —CH ₂ — or —N (R ²⁵ ) =.
R ²⁵ represents a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an aromatic hydrocarbon group which may have a substituent. ]

Examples of the alkyl group having 1 to 25 carbon atoms represented by R ²⁵ include the same ones as the alkyl group having 1 to 25 carbon atoms represented by R ¹ .
Examples of the aromatic hydrocarbon group represented by R ²⁵ include aryl groups such as phenyl group and naphthyl group: aralkyl groups such as benzyl group and phenylethyl group: biphenyl group and the like, and aromatics having 6 to 20 carbon atoms It is preferably a hydrocarbon group. Examples of the substituent which the aromatic hydrocarbon group represented by R ²⁵ may have include a hydroxy group and the like.

Preferably, R ³ and R ⁶ are each independently an electron withdrawing group.

Examples of the compound represented by the formula (I) in which R ¹ and R ² are linked to each other to form a ring structure and R ³ and R ⁶ are linked to each other to form a ring structure include a compound represented by formula (ID) And the like.

[In the formula (I-D), R ⁴ , R ⁵ and R ⁷ represent the same meaning as described above.
R ²⁵ , R ²⁶ , R ²⁷ and R ²⁸ each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may have a substituent, a hydroxy group or an aralkyl group. ]

Examples of the alkyl group having 1 to 12 carbon atoms represented by R ²⁵ , R ²⁶ , R ²⁷ and R ²⁸ include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R ^1A and R ^1B . Examples of the substituent which the alkyl group having 1 to 12 carbon atoms represented by R ²⁵ , R ²⁶ , R ²⁷ and R ²⁸ may have include a hydroxy group.
Examples of the aralkyl group represented by R ²⁵ , R ²⁶ , R ²⁷ and R ²⁸ include aralkyl groups having 7 to 15 carbon atoms such as benzyl group and phenylethyl group.

Examples of the compound (I) in which R ⁶ and R ⁷ are linked to each other to form a ring structure include compounds represented by the formula (IE) and the like.

[In formula (IE), R ¹ , R ³ , R ⁴ and R ⁵ each represent the same meaning as described above.
Ring W ³ represents a cyclic compound. Ring W ³ is a 5- to 9-membered ring, and may contain a heteroatom such as a nitrogen atom, an oxygen atom or a sulfur atom as a constituent unit of the ring.

The compound represented by the formula (IE) is preferably a compound represented by the formula (IE-1).

[In formula (I-C-1), R ¹ , R ² , R ³ and R ⁵ each represent the same meaning as described above.
R ¹⁷ , R ¹⁸ , R ¹⁹ and R ^q each independently represent a hydrogen atom or an alkyl, aralkyl or aryl group having 1 to 12 carbon atoms which may have a substituent, and the alkyl or The -CH ₂ -group contained in the aralkyl group may be substituted by -NR ^1D- , -C (= O)-, -C (= S)-, -O-, -S-, R ¹⁷ and R ¹⁸ may be linked to each other to form a ring structure, R ¹⁸ and R ¹⁹ may be linked to each other to form a ring structure, and R ¹⁹ and R ^q are linked to each other to form a ring structure You may m, p and q each independently represent an integer of 0 to 3. ]

Examples of the compound represented by the formula (I) include the following compounds.

The content of the light selective absorption compound (c) is usually 0.01 to 20 parts by mass, preferably 0.05 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (a). More preferably, it is 0.1 to 10 parts by mass, and still more preferably 0.1 to 5 parts by mass.

The pressure-sensitive adhesive composition (2) may further contain a silane compound (d). As the silane compound (d), for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3 -Glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylethoxydimethylsilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, Examples thereof include 3-methacryloyloxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane.
The silane compound (d) may be a silicone oligomer. The specific example of the silicone oligomer is as follows, in the form of a combination of monomers.

3-mercaptopropyltrimethoxysilane-tetramethoxysilane oligomer, 3-mercaptopropyltrimethoxysilane-tetraethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetramethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetraethoxysilane Oligomers containing mercaptopropyl group-containing oligomers; mercaptomethyltrimethoxysilane-tetramethoxysilane oligomers, mercaptomethyltrimethoxysilane-tetraethoxysilane oligomers, mercaptomethyltriethoxysilane-tetramethoxysilane oligomers, mercaptomethyltriethoxysilane-tetraethoxy Mercaptomethyl group-containing oligomers such as silane oligomers; 3-glycidoxypropyl Trimethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropyltrimethoxysilane-tetraethoxysilane copolymer, 3-glycidoxypropyltriethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropyltriethoxysilane-tetra Ethoxysilane copolymer, 3-glycidoxypropylmethyldimethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropylmethyldimethoxysilane-tetraethoxysilane copolymer, 3-glycidoxypropylmethyldiethoxysilane-tetramethoxysilane copolymer, Copolymers containing 3-glycidoxypropyl group such as 3-glycidoxypropylmethyldiethoxysilane-tetraethoxysilane copolymer; 3-methacryloyl Xylpropyltrimethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropyltrimethoxysilane-tetraethoxysilane oligomer, 3-methacryloyloxypropyltriethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropyltriethoxysilane-tetraethoxy Silane oligomers, 3-methacryloyloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-methacryloyloxypropylmethyldiethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxy Propylmethyldiethoxysilane-tetraethoxysilane oligomer Etc .; 3-acryloyloxypropyltrimethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropyltrimethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropyltriethoxysilane-tetramethoxysilane oligomer , 3-acryloyloxypropyltriethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropylmethyldi Ethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropyl Acryloyloxypropyl group-containing oligomers such as chilldiethoxysilane-tetraethoxysilane oligomers; vinyltrimethoxysilane-tetramethoxysilane oligomers, vinyltrimethoxysilane-tetraethoxysilane oligomers, vinyltriethoxysilane-tetramethoxysilane oligomers, vinyltrimethoxysilane oligomers Ethoxysilane-tetraethoxysilane oligomer, vinylmethyldimethoxysilane-tetramethoxysilane oligomer, vinylmethyldimethoxysilane-tetraethoxysilane oligomer, vinylmethyldiethoxysilane-tetramethoxysilane oligomer, vinylmethyldiethoxysilane-tetraethoxysilane oligomer, etc. -Containing oligomers of vinyl; 3-aminopropyltrimethoxysilane-tetramethoxysilane Polymer, 3-aminopropyltrimethoxysilane-tetraethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetramethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetra Amino group-containing such as methoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldiethoxysilane-tetramethoxysilane copolymer, 3-aminopropylmethyldiethoxysilane-tetraethoxysilane copolymer, etc. Copolymer etc.

The silane compound (d) may be a silane compound represented by the following formula (d1). When the pressure-sensitive adhesive composition (2) contains a silane compound represented by the following formula (d1), the adhesion to a substrate, glass, transparent electrode or the like can be further improved, so that peeling off or foaming under high temperature environment It is possible to form a light selective absorption layer B with good durability which is less likely to occur.

(Wherein, B represents an alkanediyl group having 1 to 20 carbon atoms or a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and constitutes the alkanediyl group and the alicyclic hydrocarbon group) -CH _2- may be substituted by -O- or -CO-, and R ^d7 represents an alkyl group having 1 to 5 carbon atoms, and R ^d8 , R ^d9 , R ^d10 , R ^d11 and R ^d12 respectively represent Independently represents an alkyl group of 1 to 5 carbon atoms or an alkoxy group of 1 to 5 carbon atoms)

In the formula (d1), B represents an alkanediyl group having 1 to 20 carbon atoms such as methylene group, ethylene group, trimethylene group, tetramethylene group, tetramethylene group, hexamethylene group, heptamethylene group, octamethylene group, etc .; 1,2-cyclobutylene group), cyclopentylene group (eg, 1,2-cyclopentylene group), cyclohexylene group (eg, 1,2-cyclohexylene group), cyclooctylene group (eg, 1,2-cyclobutylene group) A divalent alicyclic hydrocarbon group having a carbon number of 3 to 20, such as a cyclooctylene group), or an alkanediyl group thereof and -CH _2- constituting the alicyclic hydrocarbon group is -O- or The group substituted by -CO- is shown. Preferred B is a C 1-10 alkanediyl group. R ^d7 represents an alkyl group having a carbon number of 1 to 5, such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, s-butyl group, t-butyl group, pentyl group, etc., and R ^d8 , R ^d9 , R ^d10 , R ^d11 and R ^d12 each independently represent an alkyl group having 1 to 5 carbon atoms as exemplified for the aforementioned R ²¹ , or a methoxy group, an ethoxy group, a propoxy group, an i-propoxy group, a butoxy group or an s-butoxy group And an alkoxy group having 1 to 5 carbon atoms such as t-butoxy group. Desirable R ^d8 , R ^d9 , R ^d10 , R ^d11 and R ^d12 are each independently an alkoxy group having 1 to 5 carbon atoms. These silane compounds (d) can be used alone or in combination of two or more.

Specific examples of the silane compound represented by the above formula (d1) include (trimethoxysilyl) methane, 1,2-bis (trimethoxysilyl) ethane, and 1,2-bis (triethoxysilyl) ethane. 1,3-bis (trimethoxysilyl) propane, 1,3-bis (triethoxysilyl) propane, 1,4-bis (trimethoxysilyl) butane, 1,4-bis (triethoxysilyl) butane, 1,1 5-bis (trimethoxysilyl) pentane, 1,5-bis (triethoxysilyl) pentane, 1,6-bis (trimethoxysilyl) hexane, 1,6-bis (triethoxysilyl) hexane, 1,6- Bis (tripropoxysilyl) hexane, 1,8-bis (trimethoxysilyl) octane, 1,8-bis (triethoxysilyl) octane, 1,8 Bis (triC1-5alkoxysilyl) C1-10 alkanes such as bis (tripropoxysilyl) octane; bis (dimethoxymethylsilyl) methane, 1,2-bis (dimethoxymethylsilyl) ethane, 1,2-bis (dimethoxy) Ethylsilyl) ethane, 1,4-bis (dimethoxymethylsilyl) butane, 1,4-bis (dimethoxyethylsilyl) butane, 1,6-bis (dimethoxymethylsilyl) hexane, 1,6-bis (dimethoxyethylsilyl) ) Bis (di C1-5 alkoxy C1-5 alkyl silyl) C1-10 alkanes such as hexane, 1,8-bis (dimethoxymethylsilyl) octane, 1,8-bis (dimethoxyethylsilyl) octane and the like; 1,6- Bis (methoxydimethylsilyl) hexane, 1,8-bis (methoxydimethyl) Lil) bis octane (mono C1-5 alkoxy - di C1-5 alkylsilyl) such as C1-10 alkanes. Among these, 1,2-bis (trimethoxysilyl) ethane, 1,3-bis (trimethoxysilyl) propane, 1,4-bis (trimethoxysilyl) butane, 1,5-bis (trimethoxysilyl) Bis (tri C 1-3 alkoxysilyl) C 1-10 alkanes such as pentane, 1,6-bis (trimethoxysilyl) hexane, 1,8-bis (trimethoxysilyl) octane, etc. are preferred, in particular 1,6-bis. (Trimethoxysilyl) hexane and 1,8-bis (trimethoxysilyl) octane are preferred.

The content of the silane compound (d) is usually 0.01 to 10 parts by mass, preferably 0.03 to 5 parts by mass, per 100 parts by mass of the (meth) acrylic resin (a). The amount is preferably 0.05 to 2 parts by mass, and more preferably 0.1 to 1 parts by mass. It is advantageous for suppression of bleed-out of the silane compound (d) from the pressure-sensitive adhesive layer if it is not more than the above upper limit value, and adhesion between the pressure-sensitive adhesive layer and the metal layer, glass substrate, etc. It is easy to improve the properties (or adhesion), which is advantageous for improving the peeling resistance and the like.

The pressure-sensitive adhesive composition (2) may further contain an antistatic agent.
As the antistatic agent, surfactants, siloxane compounds, conductive polymers, ionic compounds and the like can be mentioned, with preference given to ionic compounds. Examples of the ionic compound include conventional ones. As a cation component which comprises an ionic compound, an organic cation, an inorganic cation, etc. are mentioned. Examples of the organic cation include pyridinium cation, pyrrolidinium cation, piperidinium cation, imidazolium cation, ammonium cation, sulfonium cation, phosphonium cation and the like. Examples of inorganic cations include lithium cations, potassium cations, sodium cations, alkali metal cations such as cesium cations, and alkaline earth metal cations such as magnesium cations and calcium cations. In particular, pyridinium cation, imidazolium cation, pyrrolidinium cation, lithium cation and potassium cation are preferable from the viewpoint of compatibility with the (meth) acrylic resin. The anion component constituting the ionic compound may be either an inorganic anion or an organic anion, but in terms of antistatic performance, an anion component containing a fluorine atom is preferred. As an anion component containing a fluorine atom, for example, hexafluorophosphate anion (PF _6- ), bis (trifluoromethanesulfonyl) imide anion [(CF ₃ SO ₂ ) ₂ N-], bis (fluorosulfonyl) imide anion [(FSO) ₂ ) ₂ N-], tetra (pentafluorophenyl) borate anion [(C ₆ F ₅ ) ₄ B-] and the like. These ionic compounds can be used alone or in combination of two or more. In particular, bis (trifluoromethanesulfonyl) imide anion [(CF ₃ SO ₂ ) ₂ N-], bis (fluorosulfonyl) imide anion [(FSO ₂ ) ₂ N-], tetra (pentafluorophenyl) borate anion [(C ₆ F ₅ ) ₄ B-] is preferred.
The ionic compound which is solid at room temperature is preferred in view of the temporal stability of the antistatic performance of the pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition (2).

The content of the antistatic agent is, for example, 0.01 to 20 parts by mass, preferably 0.1 to 10 parts by mass, and more preferably 1 to 7 with respect to 100 parts by mass of the (meth) acrylic resin (a). It is mass.

The pressure-sensitive adhesive composition (2) contains one or more additives such as a solvent, a crosslinking catalyst, a tackifier, a plasticizer, a softener, a pigment, a rust inhibitor, an inorganic filler, and light scattering fine particles. Can.

The optical film of the present invention is an optical film including a light selective absorption layer A and a light selective absorption layer B. Since the light selective absorption layer A and the light selective absorption layer B are provided, the optical film of the present invention also satisfies the above formulas (1) and (2).

Furthermore, it is preferable that the optical film of this invention satisfy | fills following formula (3).
A (440) ≦ 0.1 (3)
[In Formula (3), A (440) represents the absorbance at a wavelength of 440 nm. ]
The smaller the value of A (440), the lower the absorption at a wavelength of 440 nm. When the value of A (440) exceeds 0.1, there is a tendency to impair good color expression in the display device. In addition, since the light emission of the display device is inhibited, the luminance is also reduced. The value of A (440) is preferably 0.05 or less, more preferably 0.04 or less, and particularly preferably 0.03. The lower limit is not particularly limited, but is usually 0.00001 or more.

Furthermore, it is preferable that the optical film of this invention satisfy | fills following formula (4).
A (405) / A (440) ≧ 5 (4)
[In Formula (4), A (405) represents the light absorbency in wavelength 405 nm, and A (440) represents the light absorbency in wavelength 440 nm. ]
The value of A (405) / A (440) represents the magnitude of absorption at a wavelength of 405 nm with respect to the magnitude of absorption at a wavelength of 440 nm. The larger the value, the specific absorption in a wavelength range near 405 nm. Represent. The value of A (405) / A (440) is preferably 10 or more, more preferably 30 or more, and particularly preferably 60 or more.

An example of the layer configuration of the optical film of the present invention is shown in FIG. In the optical film of the present invention, as shown in FIG. 1, the light selective absorption layer A and the light selective absorption layer B may be laminated directly, or between the light selective absorption layer A and the light selective absorption layer B. There may be other layers.

When the light selective absorption layer B is a pressure-sensitive adhesive layer having a light selective absorption function, it may include a separate film (release film) laminated on the outer surface of the light selective absorption layer B. The separate film is usually peeled and removed when the light selective absorption layer B is used (for example, when laminated on the optical film 40). The separate film is, for example, a film made of various resins such as polyethylene terephthalate, polybutylene terephthalate, polycarbonate, polyarete, etc., on the surface on which the light selective absorption layer 10 is formed, is subjected to release treatment such as silicone treatment. be able to.

The optical film of the present invention can be obtained by bonding the light selective absorption layer A and the light selective absorption layer B.
When the light selective absorption layer B is a pressure-sensitive adhesive layer having a light selective absorption function, for example, each component constituting the pressure-sensitive adhesive composition (2) is dissolved or dispersed in a solvent to obtain a solvent-containing pressure-sensitive adhesive composition. Then, this is applied to the surface of the light selective absorption layer A and dried to form a light selective absorption layer B, whereby the optical film of the present invention can be obtained. In the optical film of the present invention, the light selective absorption layer B is formed on the release treated surface of the separate film in the same manner as above, and the light selective absorption layer B is laminated (transferred) on the surface of the light selective absorption layer A It can also be obtained by It may be laminated via other films or layers between the light selective absorption layer A and the light selective absorption layer B. Even when not directly laminated, the present invention can exhibit excellent optical properties and durability.

FIGS. 2 to 4 show an example of the layer configuration of an optical laminate comprising the optical film of the present invention.
The optical laminate 10A described in FIG. 2 is a laminate including a protective film 8, an adhesive layer 7, a polarizing film 9, an adhesive layer 7, a light selective absorption layer A, and a light selective absorption layer B.
The optical laminate 10B described in FIG. 3 and the optical laminate 10C described in FIG. 4 have a protective film 8, an adhesive layer 7, a polarizing film 9, an adhesive layer 7, a light selective absorption layer A, a light selective absorption layer B. The optical film 40 is a laminate including the optical film 40, the pressure-sensitive adhesive layer 7a, and the light emitting element 30 (liquid crystal cell, OLED cell), and the optical film 40 is an optical laminate having a multilayer structure.
It is preferable that the light selective absorption layer A be located on the viewing side (the opposite side to the light emitting element) than the light selective absorption layer B.

The optical film 40 is a film having an optical function of transmitting, reflecting, absorbing, etc. a light beam, and may be a single layer film or a multilayer film. Examples of the optical film 40 include a polarizing film, a retardation film, a brightness enhancement film, an antiglare film, an antireflective film, a diffusion film, a light collecting film, a window film, etc. A polarizing film, a retardation film or a laminate of these It is preferably a film.

The retardation film is an optical film showing optical anisotropy, and for example, polyvinyl alcohol, polycarbonate, polyester, polyarylate, polyimide, polyolefin, polycycloolefin, polystyrene, polysulfone, polyether sulfone, polyvinylidene fluoro, An example is a stretched film obtained by stretching a polymer film composed of a ride / polymethyl methacrylate, acetyl cellulose, a saponified ethylene-vinyl acetate copolymer, polyvinyl chloride and the like by about 1.01 to 6 times. Among them, a polymer film obtained by uniaxially or biaxially stretching a polycarbonate film or a cycloolefin resin film is preferable. In the present specification, the retardation film includes a zero retardation film, and also includes a film referred to as a uniaxial retardation film, a low photoelastic modulus retardation film, a wide viewing angle retardation film, or the like.

A film referred to as a temperature compensation type retardation film, a film referred to as a temperature compensation type retardation film, as a film in which optical anisotropy is expressed by application and orientation of a liquid crystal compound, and a film in which optical anisotropy is expressed by application of an inorganic layered compound. “NH film (trade name; film in which rod-like liquid crystals are inclined and aligned)” sold by Liquid Crystal Film Co., Ltd., “WV film” sold by Fujifilm Co., Ltd. (trade name: disk-like liquid crystal with inclined alignment) Films), “VAC film (trade name; film with perfect biaxial orientation)” sold by Sumitomo Chemical Co., Ltd., “new VAC film” (trade name with a biaxial orientation film), etc. It can be mentioned.

The zero retardation film is an optically isotropic film in which both the front retardation R _e and the retardation R _{th in the} thickness direction are -15 to 15 nm. As a zero retardation film, resin films made of cellulose resins, polyolefin resins (chain polyolefin resins, polycycloolefin resins, etc.) or polyethylene terephthalate resins can be mentioned. Cellulose-based resins or polyolefin-based resins are preferred in that they are easy. The zero retardation film can also be used as a protective film. As the zero retardation film, “Z-TAC” (trade name) sold by Fujifilm Co., Ltd., “Zerotac (registered trademark)” sold by Konica Minolta Co., Ltd., sold by Nippon Zeon Co., Ltd. And “ZF-14” (trade name).

In the optical film of the present invention, the retardation film is preferably a retardation film obtained by curing a polymerizable liquid crystal compound.

As a film in which optical anisotropy is expressed by application and orientation of a liquid crystal compound,
First embodiment: a retardation film in which a rod-like liquid crystal compound is oriented horizontally to a supporting substrate,
Second embodiment: a retardation film in which a rod-like liquid crystal compound is oriented in a direction perpendicular to a supporting substrate,
Third embodiment: Retardation film in which the direction of alignment of the rod-like liquid crystal compound is helically changed in the plane,
Fourth embodiment: a retardation film in which a discotic liquid crystal compound is inclined and aligned,
Fifth embodiment: A biaxial retardation film in which a discotic liquid crystal compound is oriented in a direction perpendicular to a support substrate can be mentioned.

For example, as an optical film used for an organic electroluminescent display, the 1st form, the 2nd form, and the 5th form are used suitably. Or these may be laminated and used.

When the retardation film is a layer composed of a polymer in the alignment state of the polymerizable liquid crystal compound (hereinafter sometimes referred to as "optically anisotropic layer"), the retardation film has reverse wavelength dispersion. preferable. Reverse wavelength dispersion is an optical characteristic in which the in-plane retardation value at the short wavelength is smaller than the in-plane retardation value at the long wavelength, and preferably the retardation film has the following formula It is to satisfy (7) and equation (8). Re (λ) represents an in-plane retardation value for light of wavelength λ nm.
Re (450) / Re (550) ≦ 1 (7)
1 ≦ Re (630) / Re (550) (8)
In the optical film of the present invention, when the retardation film is in the first form and has reverse wavelength dispersion, it is preferable because the coloration at the time of black display in the display device is reduced, and 0.82 ≦ in the formula (7). It is more preferable if Re (450) / Re (550) ≦ 0.93. Furthermore, 120 ≦ Re (550) ≦ 150 is preferable.

As a polymerizable liquid crystal compound when the retardation film is a film having an optically anisotropic layer, “3” of “Liquid Crystal Handbook” (edited by the LCD Handbook Editorial Board, Maruzen Co., Ltd., published on October 30, 2000). Of the compounds described in “8.6 Network (fully cross-linked type)”, “6.5.1 liquid crystal material b. Polymerizable nematic liquid crystal material”, compounds having a polymerizable group, and JP-A-2010-31223 Publication No. 2010-270108 Publication No. 2011-6360 Publication No. 2011-207765 Publication No. 2016-81035 Publication International Publication No. 2017/043438 Publication number 2011-207765 publication number The polymerizable liquid crystal compound as described in is mentioned.

Examples of the method for producing a retardation film from a polymer in the alignment state of the polymerizable liquid crystal compound include the method described in JP-A-2010-31223.

In the case of the second embodiment, the front retardation value Re (550) may be adjusted in the range of 0 to 10 nm, preferably in the range of 0 to 5 nm, and the retardation value R _{th in the} thickness direction is -10 to- It may be adjusted in the range of 300 nm, preferably in the range of -20 to -200 nm. The retardation value R _th in the thickness direction, which means the refractive index anisotropy in the thickness direction, is an in-plane retardation difference from the retardation value R ₅₀ measured by tilting 50 degrees with the in-plane fast axis as the tilt axis. It can be calculated from the value R ₀ . That is, the phase difference value R _th in the thickness direction retardation value R ₀ in the plane retardation value R ₅₀ measured by inclining 50 degrees inclination axis fast axis, thickness of the retardation film d, and positions the average refractive index n ₀ of the retardation film, obtains the n _x, n _y and n _z by the following equation (10) to (12), these are substituted into equation (9) can be calculated.

R _th = [(n _x + n _y ) / 2-n _z ] × d (9)
R ₀ = (n _x -n _y ) × d (10)
R ₅₀ = (n _x -n _y ') × d / cos (φ) (11)
(n _x + n _y + n _z ) / 3 = n ₀ (12)
here,
φ = sin ⁻¹ (sin (40 °) / n ₀ )
n _y '= n _y × n _z / [ _ny ² × sin ² (φ) + n _z ² × cos ² (φ)] ^1/2

The retardation film may be a multilayer film having two or more layers. For example, the thing by which the protective film was laminated | stacked on the single side | surface or both surfaces of retardation film, and the thing by which two or more retardation films were laminated | stacked via the adhesive or the adhesive agent are mentioned.

When the optical film 40 is a multilayer film in which two or more retardation films are laminated, as a configuration of an optical laminate including the optical film of the present invention, as shown in FIG. A quarter-wave retardation layer 50 for giving a retardation of a minute and a half-wave retardation layer 70 for giving a retardation of a 1⁄2 wavelength to transmitted light through an adhesive or a pressure-sensitive adhesive 60 The structure containing the laminated | stacked optical film 40 is mentioned. In addition, as shown in FIG. 4, a configuration including a hydrophilic film 40 in which the 1⁄4 wavelength retardation layer 50 a and the positive C layer 80 are laminated via an adhesive layer or a pressure-sensitive adhesive layer can also be mentioned.

The first wavelength retardation layer 50 for giving a phase difference of 1⁄4 wavelength shown in FIG. 3 and the 1⁄2 wavelength retardation layer 70 for giving a phase difference of 1⁄2 wavelength to transmitted light The optical film of the fifth aspect may be used. In the case of the configuration of FIG. 3, it is more preferable that at least one of them is the fifth form.

In the case of the configuration of FIG. 4, the 1⁄4 wavelength retardation layer 50 a is preferably the optical film of the first embodiment, and it is more preferable to satisfy the formulas (7) and (8).

The thickness of the retardation film is usually 0.1 to 100 μm.
When the retardation film is a multilayer, the total thickness may be 0.2 to 200 μm.

The polarizing film is a film having a function of extracting linearly polarized light from incident natural light, and for example, a polarizing film in which a dichroic dye such as iodine or a dichroic organic dye is adsorbed and oriented on a polyvinyl alcohol resin film. Can be mentioned. The polyvinyl alcohol resin can be obtained by saponifying a polyvinyl acetate resin. Examples of polyvinyl acetate resins include polyvinyl acetate, which is a homopolymer of vinyl acetate, and copolymers of vinyl acetate and a monomer copolymerizable with vinyl acetate. As a monomer copolymerizable with vinyl acetate, unsaturated carboxylic acid, olefin, vinyl ether, unsaturated sulfonic acid, acrylamide having an ammonium group and the like can be mentioned.

The degree of saponification of the polyvinyl alcohol resin is usually 85 mol% to 100 mol%, preferably 98 mol% or more. The polyvinyl alcohol-based resin may be modified, and may be, for example, an aldehyde-modified polyvinyl formal or polyvinyl acetal. The polymerization degree of the polyvinyl alcohol-based resin is usually 1,000 to 10,000, preferably 1,500 to 5,000.

What formed the polyvinyl alcohol-type resin into a film is normally used as a raw film of a polarizing film. The polyvinyl alcohol-based resin can be formed into a film by a known method. The thickness of the raw film is usually 1 to 150 μm, and the thickness is preferably 10 μm or more in consideration of the ease of stretching and the like.

The polarizing film may be, for example, uniaxially stretching a raw film, dyeing the film with a dichroic dye and adsorbing the dichroic dye, treating the film with an aqueous boric acid solution, and The film is subjected to a step of washing with water, and finally dried and manufactured. The film thickness of the polarizing film is usually 1 to 30 μm.

It is preferable that at least one surface of the polarizing film is a polarizing plate provided with a protective film via an adhesive.
As the adhesive, a known adhesive may be used, which may be a water-based adhesive or an active energy ray-curable adhesive.

As a water-based adhesive, a conventional water-based adhesive (for example, an adhesive comprising a polyvinyl alcohol-based resin aqueous solution, a water-based two-component urethane-based emulsion adhesive, an aldehyde compound, an epoxy compound, a melamine compound, a methylol compound, an isocyanate compound, Amine compounds, crosslinking agents such as polyvalent metal salts, etc. may be mentioned. Among these, the water-based adhesive which consists of polyvinyl alcohol-type resin aqueous solution can be used suitably. In addition, when using a water-based adhesive, after bonding a polarizing film and a protective film, it is preferable to implement the process to dry in order to remove the water contained in a water-based adhesive. After the drying step, there may be provided a curing step of curing at a temperature of about 20 to 45 ° C., for example. The adhesive layer formed from the water-based adhesive is usually 0.001 to 5 μm.

The above-mentioned active energy ray-curable adhesive means an adhesive which is cured by irradiation with active energy rays such as ultraviolet rays and electron beams, and for example, a curable composition containing a polymerizable compound and a photopolymerization initiator, light A curable composition containing a reactive resin, a curable composition containing a binder resin and a photoreactive crosslinking agent, and the like can be mentioned, with preference given to a UV curable adhesive.

When using an active energy ray-curable adhesive, after bonding a polarizing film and a protective film, a drying process is performed if necessary, and then an active energy ray-curable adhesive is obtained by irradiating an active energy ray. A curing step to cure is performed. Although the light source of the active energy ray is not particularly limited, ultraviolet light having a light emission distribution at a wavelength of 400 nm or less is preferable. The adhesive layer formed from the active energy ray-curable adhesive is usually 0.1 to 10 μm.
As a method of bonding a polarizing film and a protective film, the method etc. of surface-activating processes, such as a saponification process, a corona treatment, a plasma treatment, etc. are mentioned to these bonding surface of at least any one of these. When protective films are laminated on both sides of a polarizing film, the adhesive for laminating these protective films may be either the same kind of adhesive or different kinds of adhesives.

The protective film is preferably a film formed of a translucent thermoplastic resin. Specifically, a film made of a polyolefin resin, a cellulose resin, a polyester resin, a (meth) acrylic resin, a mixture thereof, a copolymer or the like is fried. When protective films are provided on both sides of the polarizing film, the protective films used may be films made of different thermoplastic resins or may be films made of the same thermoplastic resin. In addition, the light selective absorption layer A may double as a protective film.

A preferable configuration of the polarizing plate is a polarizing plate in which a protective film is laminated on at least one surface of a polarizing film via an adhesive layer. When the protective film is laminated on only one side of the polarizing film, it is more preferable to be laminated on the viewing side. It is preferable that the protective film laminated | stacked on the visual recognition side is a protective film which consists of triacetyl-cellulose-type resin or cycloolefin type resin. The protective film may be an unstretched film, or may be stretched in any direction and have a retardation. A surface treatment layer such as a hard coat layer or an antiglare layer may be provided on the surface of the protective film laminated on the viewing side.
When the protective film is laminated on both sides of the polarizing film, the protective film on the panel side (the opposite side to the visible side) is a protective film or a retardation film made of a triacetyl cellulose resin, a cycloolefin resin or an acrylic resin. Is preferred. The retardation film may be a zero retardation film described later.
Another layer or film may be further laminated between the polarizing plate and the panel. When used as a circularly polarizing plate for an organic EL display, a retardation layer having a 1⁄4 wavelength retardation layer and a 1⁄2 wavelength retardation layer, and the 1⁄4 wavelength layer having reverse wavelength dispersion described above are laminated. Is preferred. The retardation layer is preferably a liquid crystal retardation film from the viewpoint of thinning.

The window film means a front plate in a flexible liquid crystal display device such as a flexible display, and is generally disposed on the outermost surface of the display device. The window film is, for example, a resin film made of a polyimide resin. The window film may be a hybrid film of an organic material and an inorganic material such as a resin film containing, for example, polyimide and silica. In addition, a hard coat layer may be disposed on the surface of the window film to impart surface hardness, stain resistance, and fingerprint resistance. As a wind film, the film of Unexamined-Japanese-Patent No. 2017-94488, etc. are mentioned, for example.

The optical film of the present invention can be laminated on a display element such as an organic EL element or a liquid crystal cell, and can be used for a display (FPD: flat panel display) such as an organic EL display or a liquid crystal display. Above all, by applying an optical laminate in which the optical film of the present invention and a polarizing film are laminated to an organic EL display device or a liquid crystal display device, favorable display characteristics and durability can be achieved, which is preferable.

EXAMPLES The present invention will be more specifically described below by showing Examples and Comparative Examples, but the present invention is not limited by these examples. In the examples,% and parts representing contents or amounts used are on a mass basis unless otherwise noted.

Synthesis Example 1 Synthesis of Photoselective Absorbent Compound (1)

A 10 mL portion of a compound represented by the formula (aa) synthesized with reference to patent document (Japanese Patent Laid-Open No. 2014-194508) in a 200 mL four-necked flask equipped with a Dimroth condenser and a thermometer and nitrogen atmosphere, acetic anhydride ( 3.6 parts of Wako Pure Chemical Industries Ltd., 6.9 parts of 2-ethylhexyl cyanoacetate (sometimes referred to as DIPEA; made by Tokyo Chemical Industry Co., Ltd.), and 60 acetonitrile (manufactured by Wako Pure Chemical Industries, Ltd.) The parts were charged and stirred with a magnetic stirrer. At an internal temperature of 25 ° C., 4.5 parts of DIPEA (manufactured by Tokyo Kasei Kogyo Co., Ltd.) was dropped from the dropping funnel over 1 hour, and after completion of dropping, the temperature was kept at 25 ° C. for further 2 hours. After completion of the reaction, acetonitrile is removed using a vacuum evaporator and purified by column chromatography (silica gel) to purify the effluent containing the photoselective absorptive compound (1) represented by the formula (aa1). The solvent was removed using to give yellow crystals. The crystals were dried at 60 ° C. under reduced pressure to obtain 4.6 parts of a photoselective absorptive compound as a yellow powder. The yield was 50%.

^{When 1} H-NMR analysis was performed, the following peaks were observed, and thus, it was confirmed that the light selective absorption compound 1 was generated.
¹ H-NMR (CDCl 3) δ: 0.87 to 0.94 (m, 6H), 1.32-1.67 (m, 8H), 1.59- 1.66 (m, 2H), 09 (quin, 2 H), 3.00 (m, 5 H), 3.64 (t, 2 H), 4. 10 (dd, 2 H), 5.52 (d, 2 H), 7.87 (d, 2 H) )

<Gram absorption coefficient ε measurement>
In order to measure the gram absorption coefficient of the obtained photoselective absorptive compound (1), the photoselective absorptive compound (1) was dissolved in 2-butanone. The resulting solution (concentration: 0.007 g / L) is placed in a 1 cm quartz cell, and the quartz cell is set in a spectrophotometer UV-2450 (manufactured by Shimadzu Corporation), and 1 nm steps 300 to 800 nm by double beam method. Absorbance was measured in the wavelength range of From the obtained absorbance value, the concentration of the light absorbing compound in the solution, and the optical path length of the quartz cell, the gram absorption coefficient for each wavelength was calculated using the following equation.
ε (λ) = A (λ) / CL
[Wherein, ε (λ) represents the gram absorption coefficient L / (g · cm) of the compound at the wavelength λ nm, A (λ) represents the absorbance at the wavelength λ nm, C represents the concentration g / L, and L is It represents the optical path length cm of the quartz cell. ]
The light selective absorption compound (1) gram absorbance coefficient has a value of ε (405) of 47 L / (g · cm) and a value of ε (440) of less than 0.1 L / (g · cm), The value of ε (405) / ε (440) was 80 or more.

Synthesis Example 2 Synthesis of Photoselective Absorbent Compound (2)

A 300 mL four-necked flask equipped with a Dimroth condenser, a thermometer and a stirrer under a nitrogen atmosphere, 20 parts of malonaldehyde dianilide hydrochloride (manufactured by Tokyo Chemical Industry Co., Ltd.), 1,3-dimethyl barbituric acid 13.3 parts of Tokyo Chemical Industry Co., Ltd. and 46 parts of methanol were charged, and stirring was started at room temperature. Triethylamine (sometimes referred to as "TEA"; manufactured by Wako Pure Chemical Industries, Ltd.) 8.6 parts was dropped from a dropping funnel over 30 minutes, and stirring was continued at room temperature for 1 hour. Thereafter, the temperature was raised to an internal temperature of 65 ° C. using an oil bath, and the boiling point was refluxed for 1 hour. After completion of the reaction, the internal temperature was cooled to room temperature, the precipitated crystals were collected by filtration, and the wet crystals were further washed with methanol. The washed wet crystals were dried at 40 ° C. under reduced pressure to obtain 18.5 g of a compound (aa2) as an orange powder. The yield was 84%.

¹ H-NMR analysis was conducted. As a result of observation of the following peaks, it was confirmed that the compound (aa2) was formed.
¹ H-NMR (DMSO-d ₆ ) δ (ppm): 3.07 (s, 6 H), 7.04-7.07 (m, 1 H), 7.26-7.32 (m, 4 H), 7.43 (dd, 1 H), 8.07 (d, 1 H), 8.55 (d, 1 H), 11.4 (s, 1 H)

Dimroat cooling tube, inside a 100 mL four-necked flask equipped with a thermometer under a nitrogen atmosphere, 2.0 parts of compound (aa2), 1.6 g of morpholine (manufactured by Wako Pure Chemical Industries, Ltd.), 2-propanol The amount may be as low as "IPA"; 10 parts of Nacalai Tesque Co., Ltd. was charged and stirred with a magnetic stirrer. The mixture was heated in an oil bath and refluxed for 3 hours at an internal temperature of 83 ° C., and cooled to room temperature after completion of the reaction. The precipitated crystals are collected by filtration, and the wet crystals are washed a total of 4 times with 2-propanol and then dried under reduced pressure at 40 ° C. to obtain a compound (photoselective absorption compound 2) represented by the formula (aa3) as an orange powder. I obtained 1.7 g. The yield was 85%.

¹ H-NMR analysis was conducted. As a result of observation of the following peaks, it was confirmed that the compound (aa3) was formed.
¹ H-NMR (CDCl 3) δ (ppm): 1.72-1.74 (m, 6H), 3.32 (s, 3H), 3.33 (s, 3H), 3.49-3.61 (M, 4H), 7.28-7.37 (m, 2H), 7.98-8.09 (m, 1H)

The gram absorption coefficient of the light absorbing compound (2) was determined in the same manner as described above, and the value of ε (405) was 314 L / (g · cm), and the value of ε (440) was 1.3 L / (G · cm), and the value of ε (405) / ε (440) was 241.5.

Synthesis Example 3 Synthesis of Photoselective Absorbent Compound (3)

10 g of a compound represented by the formula (aa) prepared by referring to JP-A-2014-194508 in a nitrogen atmosphere in a 200 mL four-necked flask provided with a Dimroth condenser and a thermometer, acetic anhydride (Wako Pure Chemical Industries, Ltd. 3.6 g of the product, Inc., 10 g of 2-butyloctyl cyanoacetate (manufactured by Tokyo Chemical Industry Co., Ltd.), and 60 g of acetonitrile (manufactured by Wako Pure Chemical Industries, Ltd.) were charged, and stirred with a magnetic stirrer. After 4.5 g of DIPEA (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise to the obtained mixture over 1 hour at an internal temperature of 25 ° C., the mixture was kept at an internal temperature of 25 ° C. for 2 hours. Thereafter, acetonitrile is removed using a vacuum evaporator and purified by column chromatography (silica gel), and the effluent containing the compound represented by the formula (aa4) is solvent-removed using a vacuum evaporator, yellow I got a crystal. The crystals were dried at 60 ° C. under reduced pressure to obtain 4.6 g of a compound represented by the formula (aa4) (a light selective absorption compound (3)) as a yellow powder. The yield was 56%.
When the gram absorbance coefficient is determined by the same method as described above, the value of ε (405) of the compound represented by formula (aa4) is 45 L / (g · cm), and the value of ε (420) is 2.1 L / (G · cm).

<Preparation of Photoselective Absorption Layer A>
Production Example 1 Preparation of Photoselective Absorption Layer (A-1) Cellulose triacetate (acetyl substitution degree: 2.87; Fuji Film Wako Pure Chemical Industries, Ltd. trade name "cellulose triacetate"), and Smith sorb 350 (cellulose triacetate) A cellulose acylate solution (solid content concentration: 10% by mass) consisting of 3 parts by mass with respect to 100 parts by mass and a solvent (a mixture of methylene chloride and ethanol, mass ratio 87: 13) is introduced into a mixing tank The components were dissolved by stirring. The obtained lysate was uniformly cast on a glass support using an applicator, dried in an oven at 40 ° C. for 10 minutes, and further dried in an oven at 80 ° C. for 10 minutes. After drying, the film obtained from the glass support was peeled off to obtain an optical film having a light selective absorptivity (a light selective absorption layer (A-1)). The thickness of the dried optical film was 30 μm.

The resulting light selective absorption layer (A-1) was cut into a size of 5 mm × 30 mm. Using a dynamic viscoelasticity measuring device “DVA-220” manufactured by IT Measurement & Control Co., Ltd., the long side of the cut light selective absorption layer (A-1) is in the tensile direction The storage elastic modulus E 'at a temperature of 23.degree. C. to 200.degree. C. was determined by holding at an interval of 2 cm, setting the frequency of tension and contraction to 10 Hz, and the temperature rising rate to 10.degree. C./min. The storage elastic modulus E ′ at 23 ° C. was 3600 MPa.

The obtained light selective absorption layer (A-1) was cut into a size of 30 mm × 30 mm, fixed to a perforated metal plate with an adhesive tape, and used as a sample. The absorbance of the prepared sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation) at a wavelength of 350 nm. The absorbance at a wavelength of 350 nm was 5.0 or more.

Production Example 2 Preparation of Photoselective Absorption Layer (A-2) Cellulose triacetate (Acetyl substitution degree: 2.87; Fuji Film Wako Pure Chemical Industries, Ltd., trade name "cellulose triacetate"), tinuvin 460 (cellulose triacetate 100) A cellulose acylate solution (solid content concentration: 7% by mass) consisting of 2 parts by mass with respect to parts by mass and a solvent (mixture of methylene chloride and ethanol, mass ratio 90: 10) is charged into a mixing tank, The components were dissolved by stirring. The obtained lysate was uniformly cast on a glass support using an applicator, dried in an oven at 40 ° C. for 10 minutes, and further dried in an oven at 80 ° C. for 10 minutes. After drying, the film obtained from the glass support was peeled off to obtain an optical film (photoselective absorption layer (A-2)) having a light selective absorptivity. The thickness of the dried optical film was 13 μm.

The resulting light selective absorption layer (A-2) was cut into a size of 5 mm × 30 mm. Using a dynamic visco-elasticity measuring device “DVA-220” manufactured by IT Measurement & Control Co., Ltd. so that the long side of the cut light selective absorption layer (A-2) is in the tensile direction. The storage elastic modulus E 'at a temperature of 23.degree. C. to 200.degree. C. was determined by holding at an interval of 2 cm, setting the frequency of tension and contraction to 10 Hz, and the temperature rising rate to 10.degree. C./min. The storage elastic modulus E ′ at 23 ° C. was 3500 MPa.

The obtained light selective absorption layer (A-2) was cut into a size of 30 mm × 30 mm, fixed to a perforated metal plate with an adhesive tape, and used as a sample. The absorbance of the prepared sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation). The absorbance at a wavelength of 350 nm was 1.34.

<Preparation of a light selective absorption layer B>
Synthesis Example 4 Synthesis of (Meth) Acrylic Resin In a reaction vessel equipped with a cooling pipe, a nitrogen introducing pipe, a thermometer and a stirrer, 81.8 parts of ethyl acetate as a solvent, 70.4 parts of butyl acrylate, and acrylic acid A solution obtained by mixing 20.0 parts of methyl, 8.0 parts of 2-phenoxyethyl acrylate, 1.0 parts of 2-hydroxyethyl acrylate and 0.6 parts of acrylic acid was charged. After the air in the reaction vessel was replaced with nitrogen gas, the internal temperature was brought to 60.degree. Thereafter, a solution of 0.12 parts of azobisisobutyronitrile in 10 parts of ethyl acetate was added. After maintaining at the same temperature for 1 hour, while maintaining the internal temperature at 54 to 56 ° C., continuously add ethyl acetate at a rate of 17.3 parts / hr to the reaction vessel so that the concentration of the polymer is approximately 35%. Added. The internal temperature is kept at 54 to 56 ° C. until 12 hours have passed from the start of the addition of ethyl acetate, and then ethyl acetate is added to adjust the concentration of the polymer to 20%, and the (meth) acrylic resin An ethyl acetate solution (1) was obtained. The weight average molecular weight Mw of the (meth) acrylic resin was 1,390,000, and the ratio Mw / Mn of the weight average molecular weight Mw to the number average molecular weight Mn was 5.32.

In addition, the measurement of a weight average molecular weight and a number average molecular weight uses four "TSK gel XL (made by Tosoh Corp.)" as a column in a GPC apparatus, and "Shodex GPC KF-802 (made by Showa Denko KK)" 1 piece, 5 pieces in total are connected in series, and using tetrahydrofuran as an eluent, the sample concentration is 5 mg / mL, the sample introduction amount is 100 μL, the temperature is 40 ° C, and the flow rate is 1 mL / min. Calculated by

Synthesis Example 5 Synthesis of (meth) acrylic resin adhesive composition (1) An ethyl acetate solution (1) (resin concentration: 20%) of the (meth) acrylic resin obtained in Synthesis Example 4 0.4 parts of the crosslinking agent, 0.4 parts of the silane compound, and 2 parts of the photoselective absorptive compound (1) synthesized in Synthesis Example 1 were mixed with 100 parts of the solid content of the solution, and the solid content concentration was Ethyl acetate was added so as to be 14% to obtain a pressure-sensitive adhesive composition (1). In addition, the compounding quantity of the said crosslinking agent is a mass part as an active ingredient.

In addition, the crosslinking agent and silane compound which were used by the synthesis example 5 are as follows.
Crosslinking agent: A solution of trimethylolpropane adduct of tolylene diisocyanate in ethyl acetate solution (solid content concentration 75%), trade name "CORONATE L" obtained from Tosoh Corporation.
Silane compound: 3-glycidoxypropyltrimethoxysilane, trade name "KBM403" obtained from Shin-Etsu Chemical Co., Ltd.

Production Example 3 Preparation of Photoselective Absorption Layer (B-1) A separate film consisting of a polyethylene terephthalate film subjected to release treatment from the pressure-sensitive adhesive composition (1) prepared in Synthesis Example 5 [Lintech Co., Ltd. The product is applied to a release-treated surface of trade name “PLR-382190” obtained from the above using an applicator so that the thickness after drying is 20 μm, and dried at 100 ° C. for 1 minute to form an adhesive layer (1) A light selective absorption layer (B-1) was produced.

The obtained pressure-sensitive adhesive layer (1) was adhered to a 23 μm cycloolefin film by a laminator, and then aged for 7 days under conditions of a temperature of 23 ° C. and a relative humidity of 65% to obtain an optical film with a pressure-sensitive adhesive. Subsequently, the pressure-sensitive adhesive-attached optical film was cut into a size of 30 mm × 30 mm, and was bonded to an alkali-free glass (trade name “EAGLE XG” manufactured by Corning Co., Ltd.) to obtain a sample. The absorbance of the sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation). The absorbance at a wavelength of 405 nm was 0.94. The absorbance at 405 nm of each of the cycloolefin film and the alkali-free glass is approximately zero.

Synthesis Example 6 Synthesis of (Meth) acrylic Resin Adhesive Composition (2) The same as in Synthesis Example 5 except that the photoselective absorption compound is replaced with the photoselective absorption compound (2) obtained in Synthesis Example 2. Thus, a (meth) acrylic resin pressure-sensitive adhesive composition (2) was obtained.

Production Example 4 Preparation of Photoselective Absorption Layer (B-2) Production Example 3 except that the pressure-sensitive adhesive composition was replaced with the (meth) acrylic resin pressure-sensitive adhesive composition (2) obtained in Synthesis Example 6. A pressure-sensitive adhesive layer (2) (a light selective absorption layer (B-2) was produced in the same manner as in the above.
The obtained pressure-sensitive adhesive layer (2) was adhered to a 23 μm cycloolefin film by a laminator, and then aged for 7 days under conditions of a temperature of 23 ° C. and a relative humidity of 65% to obtain an optical film with a pressure-sensitive adhesive. Subsequently, the pressure-sensitive adhesive-attached optical film was cut into a size of 30 mm × 30 mm, and was bonded to an alkali-free glass (trade name “EAGLE XG” manufactured by Corning Co., Ltd.) to obtain a sample. The absorbance of the sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation). The absorbance at a wavelength of 405 nm was 0.83. The absorbance at 405 nm of each of the cycloolefin film and the alkali-free glass is approximately zero.

Synthesis Example 7 Synthesis of (Meth) Acrylic Resin Adhesive Composition (3) The same as in Synthesis Example 5 except that the photoselective absorption compound was replaced with the photoselective absorption compound (3) obtained in Synthesis Example 3. Thus, a (meth) acrylic resin composition (3) was obtained.

Production Example 5 Preparation of Photoselective Absorption Layer (B-3) Production Example 3 except that the pressure-sensitive adhesive composition was replaced with the (meth) acrylic resin pressure-sensitive adhesive composition (3) obtained in Synthesis Example 7. A pressure-sensitive adhesive layer (3) (a light selective absorption layer (B-3)) was produced in the same manner as in the above.
The obtained pressure-sensitive adhesive layer (3) was adhered to a 23 μm cycloolefin film by a laminator, and then aged for 7 days under conditions of a temperature of 23 ° C. and a relative humidity of 65% to obtain an optical film with a pressure-sensitive adhesive. Subsequently, the pressure-sensitive adhesive-attached optical film was cut into a size of 30 mm × 30 mm, and was bonded to an alkali-free glass (trade name “EAGLE XG” manufactured by Corning Co., Ltd.) to obtain a sample. The absorbance of the sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation). The absorbance at a wavelength of 405 nm was 1.89. The absorbance at 405 nm of each of the cycloolefin film and the alkali-free glass is approximately zero.

Example 1 Preparation of Optical Film (1) After corona discharge treatment was applied to one side of the light selective absorption layer (A-1) obtained in Production Example 1, the photoselective absorption obtained in Production Example 3 was obtained. Layer (B-1) was laminated by a laminator. Thereafter, it was aged for 7 days under conditions of a temperature of 23 ° C. and a relative humidity of 65% to obtain an optical film (1) including the light selective absorption layer (A-1) and the light selective absorption layer (B-1).

Example 2 Preparation of Optical Film (2) Photoselective absorption in the same manner as in Example 1 except that the light selective absorption layer B was replaced with the light selective absorption layer (B-2) obtained in Production Example 4. An optical film (2) including the layer (A-1) and the light selective absorption layer (B-2) was obtained.

(Example 3) Preparation of Optical Film (3) The light selective absorption layer A was obtained in the light selective absorption layer (A-2) obtained in Production Example 2, and the light selective absorption layer B was obtained in Production Example 5 An optical film (3) including a light selective absorption layer (A-2) and a light selective absorption layer (B-3) in the same manner as in Example 1 except that the light selective absorption layer (B-3) is substituted. I got

Example 4 Preparation of Optical Film (4) The procedure of Example 1 was repeated except that the light selective absorption layer B was replaced with the light selective absorption layer (B-3) obtained in Production Example 5. An optical film (4) including a selective absorption layer (A-1) and a light selective absorption layer (B-3) was obtained.

(Comparative example 1)
The pressure-sensitive adhesive layer (1) obtained in Production Example 3 is bonded to a 23 μm cycloolefin film by a laminator, and then aged for 7 days under conditions of a temperature of 23 ° C. and a relative humidity of 65% to obtain an optical film with a pressure-sensitive adhesive. The

<Absorbance measurement of optical film>
The optical film (1) obtained in Example 1 is cut into a size of 30 mm × 30 mm, and the light selective absorption layer (B-1) and alkali-free glass (trade name “EAGLE XG” manufactured by Corning Incorporated) are obtained. It stuck and made this into the sample. The absorbance of the prepared sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation). The results of absorbance at a wavelength of 350 nm, a wavelength of 405 nm and a wavelength of 440 nm of the optical film (1) are shown in Table 1. In addition, the light absorbency of wavelength 350nm, wavelength 405nm, and wavelength 440nm of alkali free glass is substantially zero.

The sample after absorbance measurement was put into a sunshine weather meter (manufactured by Suga Test Instruments Co., Ltd.) for 24 hours under 63 ° C. and 50% humidity conditions, and a weathering test for 24 hours was conducted. The absorbance of the removed sample was measured in the same manner as described above. From the measured absorbance, the absorbance retention of the sample at 350 nm and 405 nm was determined based on the following equation. The results are shown in Table 1. The higher the absorbance retention rate, the better the weather resistance without deterioration of the light selective absorption function.
Absorbance retention rate = (A (405) after endurance test / A (405) before endurance test) x 100
Absorbance retention rate = (A (350) after endurance test / A (350) before endurance test) x 100

Evaluation was similarly performed using the film with an adhesive layer obtained by optical film (2), optical film (3), optical film (4), and the comparative example 1 instead of optical film (1), respectively. The results are shown in Table 1.

The optical film of the present invention is excellent in light absorbing function near a wavelength of 350 nm and light absorbing function near a wavelength of 405 nm. Therefore, when the optical film of the present invention is laminated on a retardation film or an organic EL element, both light of ultraviolet light and visible light of a short wavelength can be blocked, and thus it has a function of suppressing deterioration of the retardation film and organic EL element . Furthermore, even after the weathering test, the optical film of the present invention has good light absorbing function near a wavelength of 350 nm and light absorbing function near a wavelength of 405 nm, and has good weatherability (durability). In addition, the optical film of the present invention has a low light absorption performance near a wavelength of 440 nm, and can provide a good color expression without inhibiting the light emission of the liquid crystal display device.

The optical film of the present invention is suitably used in liquid crystal panels and liquid crystal displays.

10, 10A, 10B, 10C Optical stack 1 Light selective absorption layer A
2 Light selective absorption layer B
5 adhesive layer 6

liquid crystal cell

7, 60 adhesive layer 7a adhesive layer 8 protective film 9 polarizing film 30 liquid crystal cell 40 optical film 50, 50a quarter wavelength retardation layer 60 adhesive layer 70 1/2 wavelength retardation Stratum 80 positive C stratum

Claims

An optical film comprising a light selective absorption layer A satisfying the following formula (1) and a light selective absorption layer B satisfying the following formula (2).
A (350) 0.5 0.5 (1)
A (405) 0.5 0.5 (2)
[In Formula (1), A (350) represents the light absorbency in wavelength 350 nm.
In Formula (2), A (405) represents the absorbance at a wavelength of 405 nm. ]
Furthermore, the optical film of Claim 1 which satisfy | fills following formula (3).
A (440) ≦ 0.1 (3)
[In Formula (3), A (440) represents the absorbance at a wavelength of 440 nm. ]
The optical film according to claim 1, further satisfying the following formula (4).
A (405) / A (440) ≧ 5 (4)
[In Formula (4), A (405) represents the light absorbency in wavelength 405 nm, and A (440) represents the light absorbency in wavelength 440 nm. ]
The light selective absorption layer A is a layer formed from a resin composition containing a resin (A1) and a light selective absorption compound (B1),
The resin (A1) is at least one resin selected from cellulose resins, (meth) acrylic resins, polyester resins, polyamide resins, polyimide resins, and cycloolefin resins. The optical film as described in.
The optical film according to claim 4, wherein the content of the light selective absorption compound (B1) is 0.01 to 20 parts by mass with respect to 100 parts by mass of the resin (A1).
The optical film according to any one of claims 1 to 5, wherein the light selective absorption layer B is a pressure-sensitive adhesive layer having a light selective absorption function.
The light-sensitive adhesive layer according to claim 6, wherein the light-selective absorption layer B is a pressure-sensitive adhesive layer formed from a pressure-sensitive adhesive composition containing a (meth) acrylic resin (a), a crosslinking agent (b) and a light selective absorption compound (c). Optical film.
The optical film according to claim 7, wherein the content of the crosslinking agent (b) is 0.01 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (a).
The optical film according to claim 7 or 8, wherein the content of the light selective absorption compound (c) is 0.01 to 20 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (a).
The optical film according to any one of claims 7 to 9, wherein the photoselective absorption compound (c) is a compound satisfying the formula (5).
ε (405) 20 20 (5)
[In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. The unit of gram absorption coefficient is L / (g · cm). ]
The optical film according to any one of claims 7 to 10, wherein the photoselective absorption compound (c) is a compound satisfying the formula (6).
ε (405) / ε (440) ≧ 20 (6)
[In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm. ]
The optical film according to any one of claims 7 to 11, wherein the photoselective absorption compound (c) is a compound having a merocyanine structure in the molecule.
A display device comprising the optical film according to claim 1.
The optical film which satisfy | fills following formula (1) and following formula (2).
A (350) 0.5 0.5 (1)
A (405) 0.5 0.5 (2)
[In Formula (1), A (350) represents the light absorbency in wavelength 350 nm.
In Formula (2), A (405) represents the absorbance at a wavelength of 405 nm. ]