CN110799867B

CN110799867B - Optical film

Info

Publication number: CN110799867B
Application number: CN201880042849.1A
Authority: CN
Inventors: 小桥亚依; 阪上智惠; 小泽昭一
Original assignee: Sumitomo Chemical Co Ltd
Current assignee: Sumitomo Chemical Co Ltd
Priority date: 2017-06-27
Filing date: 2018-06-21
Publication date: 2022-09-13
Anticipated expiration: 2038-06-21
Also published as: JP2019008295A; TW201906732A; WO2019004045A1; CN110799867A; KR20200019726A; TWI782045B

Abstract

Provided is an optical film which has a good function of suppressing deterioration and which exhibits high absorption selectivity for ultraviolet light and short-wavelength visible light having a wavelength of about 405nm, thereby satisfactorily suppressing deterioration of a retardation film or an organic EL light-emitting element due to ultraviolet light and short-wavelength visible light. An optical film includes a light selective absorption layer A satisfying the following formula (1) and a light selective absorption layer B satisfying the following formula (2). A (350) is not less than 0.5 (1); a (405) is not less than 0.5(2) [ in the formula (1), A (350) represents an absorbance at a wavelength of 350 nm. In the formula (2), A (405) represents absorbance at a wavelength of 405nm ].

Description

Optical film

Technical Field

The present invention relates to an optical film.

Background

Display devices (FPD: flat panel display) such as organic EL display devices and liquid crystal display devices use various members such as display elements such as organic EL elements and liquid crystal cells, and optical films such as polarizing plates. Since organic EL compounds, liquid crystal compounds, and the like used for these members are organic substances, deterioration by Ultraviolet (UV) rays is likely to be a problem. In order to solve such a problem, for example, patent document 1 describes a polarizing plate in which an ultraviolet absorber having excellent ultraviolet absorption performance in a wavelength range of 370nm or less is added to a protective film of the polarizing plate.

Documents of the prior art

Patent document

Patent document 1: japanese patent laid-open publication No. 2006-308936

Disclosure of Invention

Problems to be solved by the invention

In addition, in recent years, as the thickness of display devices has been reduced, development of liquid crystal retardation films obtained by aligning and photocuring polymerizable liquid crystal compounds has been advanced. It was found that these liquid crystal retardation films and organic EL light-emitting devices tend to be deteriorated not only by ultraviolet light but also by visible light having a short wavelength of about 400 nm. However, the polarizing plate described in patent document 1 has a low absorption performance for visible light around 400nm even though it has an excellent ultraviolet absorption performance in a wavelength range of 370nm or less, and may not sufficiently suppress deterioration of the liquid crystal retardation film and the organic EL light emitting element. Further, in recent display devices, further excellent display characteristics are required.

The invention provides an optical film which has a good function of inhibiting deterioration and shows high absorption selectivity for ultraviolet rays with a wavelength of 350nm and the like and visible light with a short wavelength near the wavelength of 405nm, thereby well inhibiting deterioration of a phase difference film and an organic EL light-emitting element caused by the ultraviolet rays and the visible light with the short wavelength.

Means for solving the problems

[1] An optical film includes a light selective absorption layer A satisfying the following formula (1) and a light selective absorption layer B satisfying the following formula (2).

A(350)≥0.5 (1)

A(405)≥0.5 (2)

[ in the formula (1), A (350) represents the absorbance at a wavelength of 350 nm.

In the formula (2), A (405) represents the absorbance at a wavelength of 405 nm. ]

[2] The optical film according to [1], which further satisfies the following formula (3).

A(440)≤0.1 (3)

[ in formula (3), A (440) represents the absorbance at a wavelength of 440 nm. ]

[3] The optical film according to [1], which further satisfies the following formula (4).

A(405)/A(440)≥5 (4)

In the formula (4), A (405) represents the absorbance at a wavelength of 405nm, and A (440) represents the absorbance at a wavelength of 440 nm. ]

[4] The optical film according to any one of [1] to [3], wherein the light selective absorption layer A is a layer formed of a resin composition containing a resin (A1) and a light selective absorption compound (B1),

the resin (a1) is at least 1 resin selected from the group consisting of a cellulose-based resin, (meth) acrylic resin, polyester-based resin, polyamide-based resin, polyimide-based resin, and cycloolefin-based resin.

[5] The optical film according to [4], wherein the content of the light selective absorbing compound (B1) is 0.01 to 20 parts by mass based on 100 parts by mass of the resin (A1).

[6] The optical film according to any one of [1] to [5], wherein the light selective absorption layer B is an adhesive layer having a light selective absorption function.

[7] The optical film according to [6], wherein the light selective absorbing layer B is an adhesive layer formed of an adhesive composition comprising a (meth) acrylic resin (a), a crosslinking agent (B) and a light selective absorbing compound (c).

[8] The optical film according to [7], wherein the content of the crosslinking agent (b) is 0.01 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (a).

[9] The optical film according to [7] or [8], wherein the content of the light selective absorbing compound (c) is 0.01 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (a).

[10] The optical film according to any one of [7] to [9], wherein the light selective absorbing compound (c) is a compound satisfying formula (5).

ε(405)≥20 (5)

[ in the formula (5),. epsilon. (. epsilon.) (405) represents the gram absorption coefficient of the compound at a wavelength of 405 nm. The unit of the gram absorption coefficient is L/(g.cm). ]

[11] The optical film according to any one of [7] to [10], wherein the light selective absorbing compound (c) is a compound satisfying formula (6).

ε(405)/ε(440)≥20 (6)

[ in the formula (6),. epsilon. (. epsilon.) (405) represents the gram absorption coefficient of the compound at a wavelength of 405nm, and. epsilon. (. epsilon.) (440) represents the gram absorption coefficient at a wavelength of 440 nm. ]

[12] The optical film according to any one of [7] to [11], wherein the light selective absorbing compound (c) is a compound having a merocyanine structure in a molecule.

[13] A display device comprising the optical film according to any one of [1] to [12 ].

[14] An optical film satisfying the following formula (1) and the following formula (2).

A(350)≥0.5 (1)

A(405)≥0.5 (2)

Effects of the invention

The optical film of the present invention has a good function of suppressing deterioration, and exhibits high absorption selectivity for ultraviolet rays such as 350nm and visible light having a short wavelength in the vicinity of 405nm, thereby satisfactorily suppressing deterioration of a retardation film and an organic EL light-emitting element due to ultraviolet rays. The optical film of the present invention exhibits high absorption selectivity for visible light having a short wavelength of around 405nm even after a weather resistance test, and can keep the deterioration due to ultraviolet light or visible light having a short wavelength. When the optical film of the present invention is used in a display device, good display characteristics and durability can be provided.

Drawings

Fig. 1 shows an example of the layer structure of the optical film of the present invention.

Fig. 2 shows an example of the layer structure of an optical laminate including the optical film of the present invention.

Fig. 3 shows an example of the layer structure of an optical laminate including the optical film of the present invention.

Fig. 4 shows an example of the layer structure of an optical laminate including the optical film of the present invention.

Detailed Description

The optical film of the present invention includes a light selective absorbing layer A satisfying the following formula (1) and a light selective absorbing layer B satisfying the following formula (2).

A(350)≥0.5 (1)

A(405)≥0.5 (2)

< light selective absorption layer A >

The light selective absorbing layer a satisfies the above formula (1). The larger the value of a (350), the higher the absorption at a wavelength of 350nm, and the smaller the value of a (350) is, the lower the absorption at a wavelength of 350nm, and the less the effect of suppressing deterioration of a display device such as a retardation film or an organic EL element in ultraviolet rays is. The value of a (350) is preferably 0.5 or more, more preferably 0.8 or more, and particularly preferably 1.0 or more.

The light selective absorbing layer a is preferably a layer formed of a resin composition containing a resin (a1) and a light selective absorbing compound (B1) (hereinafter, sometimes referred to as "resin composition (1)"), and the resin (a1) is preferably at least 1 resin selected from the group consisting of a cellulose-based resin, a (meth) acrylic resin, a polyester-based resin, a polyamide-based resin, a polyimide-based resin, and a cycloolefin-based resin.

The cellulose-based resin is preferably a cellulose ester-based resin, that is, a resin in which at least a part of hydroxyl groups in cellulose is esterified with acetic acid, and may be a mixed ester in which a part of hydroxyl groups is esterified with acetic acid and a part of hydroxyl groups is esterified with another acid. The cellulose ester resin is preferably an acetyl cellulose resin. Specific examples of the acetyl cellulose resin include triacetyl cellulose, diacetyl cellulose, cellulose acetate propionate, and cellulose acetate butyrate.

As the raw material cotton of acetyl cellulose, a cellulose raw material such as wood pulp and cotton linter known in the invention Association published technical works 2001-1745 can be used. Acetyl cellulose can be synthesized by a method described in Timber chemistry on pages 180 to 190 (Co-pending publication, Kyota, and the like, 1968).

Commercially available triacetyl cellulose products include those sold under the trade names "UV-50", "UV-80", "SH-80", "TD-80U", "TD-TAC" and "UZ-TAC" manufactured by Fuji film company.

Examples of the (meth) acrylic resin include: homopolymers of alkyl methacrylate or alkyl acrylate, copolymers of alkyl methacrylate and alkyl acrylate, and the like. Specific examples of the alkyl methacrylate include methyl methacrylate, ethyl methacrylate, and propyl methacrylate, and specific examples of the alkyl acrylate include methyl acrylate, ethyl acrylate, and propyl acrylate. As the (meth) acrylic resin, commercially available general-purpose (meth) acrylic resins can be used. As the (meth) acrylic resin, a resin called an impact-resistant (meth) acrylic resin may also be used.

Specific examples of the (meth) acrylic resin include "Acryset VH" and "Acryset VRL 20A" available from Mitsubishi corporation.

The polyester resin is a polymer resin having a repeating unit of an ester bond in the main chain, and is generally obtained by polycondensation of a polycarboxylic acid or a derivative thereof and a polyhydric alcohol or a derivative thereof.

As the polyester-providing polycarboxylic acid or derivative thereof, there may be mentioned: aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid, phthalic acid, 2, 6-naphthalenedicarboxylic acid, diphenyldicarboxylic acid, diphenylsulfonedicarboxylic acid, diphenoxyethanedicarboxylic acid, and 5-sodium sulfonedicarboxylic acid; aliphatic dicarboxylic acids such as oxalic acid, succinic acid, adipic acid, sebacic acid, dimer acid, maleic acid, and fumaric acid; alicyclic dicarboxylic acids such as 1, 4-cyclohexanedicarboxylic acid; hydroxycarboxylic acids such as p-hydroxybenzoic acid, and derivatives thereof. Examples of the dicarboxylic acid derivative include: esterified compounds such as dimethyl terephthalate, diethyl terephthalate, 2-hydroxyethyl methyl terephthalate, dimethyl 2, 6-naphthalenedicarboxylate, dimethyl isophthalate, dimethyl adipate, diethyl maleate and dimethyl dimer acid. Among them, terephthalic acid, isophthalic acid, 2, 6-naphthalenedicarboxylic acid, 1, 4-cyclohexanedicarboxylic acid, and their esterified products are preferably used from the viewpoint of moldability and handleability.

Examples of the polyester-providing polyol or derivative thereof include: aliphatic dihydroxy compounds such as ethylene glycol, diethylene glycol, 1, 2-propylene glycol, 1, 3-butylene glycol, 1, 4-butylene glycol, 1, 5-pentanediol, 1, 6-hexanediol, and neopentyl glycol, polyoxyalkylene glycols such as diethylene glycol, polyethylene glycol, polypropylene glycol, and polytetramethylene glycol, alicyclic dihydroxy compounds such as 1, 4-cyclohexanedimethanol, and spiroglycol, aromatic dihydroxy compounds such as bisphenol a and bisphenol S, and derivatives thereof. Among them, ethylene glycol, diethylene glycol, 1, 3-propanediol, 1, 4-butanediol, neopentyl glycol, and 1, 4-cyclohexanedimethanol are preferably used from the viewpoint of moldability and handleability.

Examples of the polyester resin include: polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polypropylene terephthalate, polypropylene naphthalate, polycyclohexanedimethanol terephthalate, polycyclohexanedimethanol naphthalate, and the like. Among them, polyethylene terephthalate, polyethylene naphthalate and the like are preferable.

The polyamide resin is a polymer resin having an amide bond in a repeating unit as a main chain, and includes, for example: aromatic polyamides (aromatic polyamides) in which aromatic ring skeletons are bonded via amide bonds, aliphatic polyamides in which aliphatic skeletons are bonded via amide bonds, and the like. In general, the polycarboxylic acid compound can be obtained by polymerization reaction of a polycarboxylic acid or a derivative thereof with a polyamine, or the like.

Examples of the polycarboxylic acid or a derivative thereof which can provide a polyamide include terephthaloyl chloride, 2-chloroterephthaloyl chloride, isophthaloyl dichloride, naphthalenedicarboxylic acid chloride, biphenyldicarboxylic acid chloride, and terphenyldicarboxylic acid chloride.

Examples of the polyamine that provides the polyamide include: 4, 4 '-diaminodiphenyl ether, 3, 4' -diaminodiphenyl ether, 4 '-diaminodiphenyl sulfone, 3' -diaminodiphenyl sulfone, 2 '-bis (trifluoromethyl) -4, 4' -diaminobiphenyl, 9-bis (4-aminophenyl) fluorene, 9-bis (4-amino-3-methylphenyl) fluorene, bis [ 4- (4-aminophenoxy) phenyl ] sulfone, bis [ 4- (3-aminophenoxy) phenyl ] sulfone, 2-bis [ 4- (4-aminophenoxy) phenyl ] propane, 2-bis (4-aminophenyl) hexafluoropropane and the like, and preferred examples thereof include 4, 4 '-diaminodiphenyl sulfone, 3' -diaminodiphenyl sulfone, 2 '-bis (trifluoromethyl) -4, 4' -diaminobiphenyl, 9-bis (4-aminophenyl) fluorene, 9-bis (4-amino-3-methylphenyl) fluorene, 1, 4-cyclohexanediamine, 1, 4-norbornenediamine.

The polyimide-based resin is a resin containing an imide bond in a repeating unit. Examples of the polyimide-based resin include a condensation type polyimide obtained by polycondensation using diamines and tetracarboxylic dianhydrides as starting materials. As the diamine, an aromatic diamine, an alicyclic diamine, an aliphatic diamine, or the like can be used. As the tetracarboxylic acid dianhydride, aromatic tetracarboxylic acid dianhydride, alicyclic tetracarboxylic acid dianhydride, acyclic aliphatic tetracarboxylic acid dianhydride, or the like can be used. The diamines and tetracarboxylic dianhydrides may be used alone or in combination of 2 or more. Instead of the tetracarboxylic dianhydride, a tetracarboxylic acid compound selected from tetracarboxylic acid compound analogs such as an acid chloride compound may be used as a starting material.

Examples of the cycloolefin resin include: a thermoplastic resin (thermoplastic cycloolefin resin) having a unit containing a cyclic olefin (cycloolefin) monomer such as norbornene or polycyclic norbornene-based monomer. The cycloolefin resin may be a ring-opened polymer of the above cycloolefin, a hydrogenated product of a ring-opened copolymer using 2 or more kinds of the cycloolefin, or an addition polymer of the cycloolefin and a chain olefin, an aromatic compound having a polymerizable double bond such as a vinyl group, or the like. The cycloolefin resin may have a polar group introduced therein.

When the first protective film is formed using a copolymer of a cycloolefin and a chain olefin and/or an aromatic compound having a vinyl group, examples of the chain olefin include ethylene and propylene, and examples of the aromatic compound having a vinyl group include styrene, α -methylstyrene, and styrene having an alkyl group substituted in the core (core アルキル exchange スチレン). In such a copolymer, the unit of the cycloolefin-containing monomer may be 50 mol% or less, and preferably about 15 to 50 mol%. In particular, when the first protective film is formed using a terpolymer of a cycloolefin, a chain olefin, and an aromatic compound having a vinyl group, the unit of the cycloolefin-containing monomer can be made small as described above. In the terpolymer, the unit of the monomer containing the chain olefin is usually 5 to 80 mol%, and the unit of the monomer containing the aromatic compound having a vinyl group is usually 5 to 80 mol%.

As the cycloolefin resin, commercially available products can be suitably used. For example, there may be mentioned: "TOPAS" sold by Polyplastics, Inc., "Arton" sold by JSR, and "ZEONOR (ゼオノア)" and "ZEONEX (ゼオネックス)" sold by Nippon ruing Co., Ltd, "APEL" (trade name, both of the above) sold by Mitsui chemical corporation, and the like.

The storage elastic modulus E at 23 ℃ of the resin (A1) is usually 100MPa or more, preferably 500MPa or more, more preferably 1000MPa or more, and preferably 100000MPa or less. If the storage elastic modulus of the resin (a1) is high, shrinkage and dimensional change of the optical film of the present invention when exposed to a high-temperature environment can be suppressed.

The light selective absorbing compound (B1) is a compound having high absorption at a wavelength of 350nm, and examples thereof include an ultraviolet absorber. The ultraviolet absorber is not particularly limited, and examples thereof include: organic ultraviolet absorbers such as oxybenzone-based ultraviolet absorbers, benzotriazole-based ultraviolet absorbers, salicylate-based ultraviolet absorbers, benzophenone-based ultraviolet absorbers, cyanoacrylate-based ultraviolet absorbers, triazine-based ultraviolet absorbers, and the like. More specifically, 5-chloro-2- (3, 5-di-sec-butyl-2-hydroxyphenyl) -2H-benzotriazole, (2-2H-benzotriazol-2-yl) -6- (linear and side chain dodecyl) -4-methylphenol, 2-hydroxy-4-benzyloxybenzophenone, 2, 4-benzyloxybenzophenone, and the like can be given.

Examples of the ultraviolet absorber include "Kemisorb 102" manufactured by Chemipro corporation, "adekasta LA 46" and "ADEKASTAB LAF 70" manufactured by ADEKA corporation, "Tinuvin 109", "Tinuvin 171", "Tinuvin 234", "Tinuvin 326", "Tinuvin 327", "Tinuvin 328", "Tinuvin 928", "Tinuvin 400", "Tinuvin 460", "Tinuvin 405" and "Tinuvin 477" (trade names). Examples of the benzotriazole-based ultraviolet absorber include: "ADEKASTAB LA 31" and "ADEKASTAB LA 36" (trade names) manufactured by ADEKA, Sumisorb 200 "," Sumisorb 250 "," Sumisorb 300 "," Sumisorb 340 "and" Sumisorb 350 "(trade names) manufactured by Chemex, Kemisorb 74", "Kemisorb 79" and "Kemisorb 279" (trade names) manufactured by Chemipro, and "TINUVIN 99-2", "TINUVIN 900" and "TINUVIN 928" (trade names) manufactured by BASF.

The ultraviolet absorber may be used in combination of 2 or more.

The ultraviolet absorber may be an inorganic ultraviolet absorber. Examples of the inorganic ultraviolet absorber include: titanium oxide, zinc oxide, indium oxide, tin oxide, talc, kaolin, calcium carbonate, titanium oxide-based composite oxide, zinc oxide-based composite oxide, ITO (tin-doped indium oxide), ATO (antimony-doped tin oxide), and the like. Examples of the titanium oxide-based composite oxide include: silicon oxide, aluminum oxide-doped zinc oxide, and the like. These inorganic ultraviolet absorbers may be used in 1 kind, or 2 or more kinds in combination. In addition, the organic ultraviolet absorber and the inorganic ultraviolet absorber may be used in combination.

The content of the light selective absorbing compound (B1) is usually 0.01 to 20 parts by mass, preferably 0.05 to 15 parts by mass, and more preferably 0.1 to 10 parts by mass, based on 100 parts by mass of the resin (a 1).

The resin composition (1) may further contain a solvent, a plasticizer, an organic acid, a pigment, an antistatic agent, a surfactant, a lubricant, a flame retardant, a filler, rubber particles, and a retardation adjusting agent.

The light selective absorbing layer a is a film that can be formed from the resin composition (1) by using a known molding process. Examples of the molding method include compression molding, transfer molding, injection molding, extrusion molding, blow molding, powder molding, FRP molding, casting coating (for example, casting), calendering, and hot press. Since the smoothness of the obtained film can be improved and good optical uniformity can be obtained, the extrusion molding method or the cast coating method is preferable. The molding conditions may be appropriately set according to the composition and type of the resin used.

The thickness of the light selective absorption layer A is usually 1 to 500 μm, preferably 5 to 300 μm, more preferably 10 to 150 μm, further preferably 10 to 100 μm, and particularly preferably 10 to 50 μm. The light selective absorption layer a may be unstretched or stretched. When the light selective absorbing layer a is stretched, it may be uniaxially stretched or biaxially stretched. The draw ratio is usually 1.01 to 10 times, preferably 1.01 to 6 times. The stretching direction may be performed in various directions and dimensions such as a longitudinal direction, a width direction, a thickness direction, and an oblique direction.

The storage elastic modulus E' of the light selective absorbing layer a at 23 ℃ is usually 100MPa or more, preferably 300MPa or more, more preferably 500MPa or more, further preferably 1000MPa or more, and particularly preferably 3000MPa or more. The lower limit is not particularly limited, but is usually 100000MPa or less.

The storage elastic modulus at 23 ℃ of the light selective absorbing layer a can be measured by the method described in examples.

< light selective absorption layer B >

The light selective absorbing layer B satisfies the above formula (2). The larger the value of a (405) is, the higher the absorption at a wavelength of 405nm is, and the smaller the value of a (405) is, the lower the absorption at a wavelength of 405nm is, and the effect of suppressing deterioration of a display device such as a retardation film or an organic EL element in ultraviolet rays is small. The value of a (405) is preferably 0.6 or more, more preferably 0.8 or more, and particularly preferably 1.0 or more. The lower limit is not particularly limited, but is usually 10.0 or less.

The light selective absorbing layer B may be any layer for forming an optical film as long as it satisfies the above formula (2), and is preferably an adhesive layer having a light selective absorbing function. The pressure-sensitive adhesive layer having a light selective absorption function is formed from a pressure-sensitive adhesive composition (hereinafter, sometimes referred to as "pressure-sensitive adhesive composition (2)").

The thickness of the light selective absorption layer B is usually 0.1 to 50 μm, preferably 1 to 30 μm, and more preferably 4 to 20 μm.

The adhesive composition (2) is preferably an adhesive composition containing a (meth) acrylic resin (a), a crosslinking agent (b), and a light selective absorbing compound (c).

< (meth) acrylic resin (a) >

The (meth) acrylic resin (a) is preferably a polymer containing a structural unit derived from a (meth) acrylate ester as a main component (preferably, containing 50 mass% or more). The structural unit derived from a (meth) acrylate ester may contain one or more structural units derived from a monomer other than a (meth) acrylate ester (for example, a structural unit derived from a monomer having a polar functional group). In the present specification, (meth) acrylic acid means any of acrylic acid and methacrylic acid, and "(meth)" in the case of (meth) acrylate and the like is also used in the same manner.

Examples of the (meth) acrylate include (meth) acrylates represented by the following formula (I).

[ in the formula (I), R ₁ Represents a hydrogen atom or a methyl group, R ₂ Represents an alkyl group having 1 to 14 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and the hydrogen atom of the alkyl group or the aralkyl group may be substituted with an alkoxy group having 1 to 10 carbon atoms.]

In the formula (I), R ₂ Preferably an alkyl group having 1 to 14 carbon atoms, and more preferably an alkyl group having 1 to 8 carbon atoms.

Examples of the (meth) acrylate represented by the formula (I) include:

linear alkyl esters of (meth) acrylic acid such as methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, n-heptyl (meth) acrylate, n-octyl (meth) acrylate, n-nonyl (meth) acrylate, n-decyl (meth) acrylate, n-dodecyl (meth) acrylate, lauryl (meth) acrylate, and stearyl (meth) acrylate;

branched alkyl esters of (meth) acrylic acid such as isopropyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, isoamyl (meth) acrylate, isohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isooctyl (meth) acrylate, isononyl (meth) acrylate, isostearyl (meth) acrylate, and isoamyl (meth) acrylate;

alicyclic skeleton-containing alkyl esters of (meth) acrylic acid such as cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, adamantyl (meth) acrylate, dicyclopentanyl (meth) acrylate, cyclododecyl (meth) acrylate, methylcyclohexyl (meth) acrylate, trimethylcyclohexyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, and cyclohexyl α -ethoxyacrylate;

aromatic ring skeleton-containing esters of (meth) acrylic acid such as phenyl (meth) acrylate; and so on.

Further, there may be mentioned a substituted alkyl (meth) acrylate obtained by introducing a substituent to an alkyl group of an alkyl (meth) acrylate. The substituent of the alkyl (meth) acrylate having a substituent is a group in which a hydrogen atom of an alkyl group is substituted, and specific examples thereof include a phenyl group, an alkoxy group, and a phenoxy group. Specific examples of the alkyl (meth) acrylate containing a substituent include: 2-methoxyethyl (meth) acrylate, ethoxymethyl (meth) acrylate, phenoxyethyl (meth) acrylate, 2- (2-phenoxyethoxy) ethyl (meth) acrylate, phenoxydiglycol (meth) acrylate, phenoxypoly (ethylene glycol) meth) acrylate, and the like.

These (meth) acrylates may be used alone, or different (meth) acrylates may be used.

The (meth) acrylic resin (a) preferably contains a structural unit derived from an alkyl acrylate (a1) having a glass transition temperature Tg of less than 0 ℃ derived from a homopolymer and a structural unit derived from an alkyl acrylate (a2) having a Tg of 0 ℃ or higher derived from a homopolymer. Containing a structural unit derived from an alkyl acrylate (a1) and a structural unit derived from an alkyl acrylate (a2) is advantageous in improving the high-temperature durability of the adhesive layer. The Tg of the homopolymer of the alkyl (meth) acrylate can be obtained, for example, from literature values of POLYMER HANDBOOK (Wiley-Interscience) and the like.

Specific examples of the alkyl acrylate (a1) include: and alkyl acrylates having an alkyl group of about 2 to 12 carbon atoms such as ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, n-pentyl acrylate, n-hexyl acrylate, isohexyl acrylate, n-heptyl acrylate, n-octyl acrylate, isooctyl acrylate, 2-ethylhexyl acrylate, n-nonyl acrylate, isononyl acrylate, n-decyl acrylate, isodecyl acrylate, and n-dodecyl acrylate.

The alkyl acrylate (a1) may be used in a single amount of 1 kind, or may be used in combination of 2 or more kinds. Among them, n-butyl acrylate, n-octyl acrylate, 2-ethylhexyl acrylate and the like are preferable from the viewpoint of the followability and the reworkability (リワーク property) when the light selective absorption layer B is laminated on another layer.

The alkyl acrylate (a2) is an alkyl acrylate other than the alkyl acrylate (a 1). Specific examples of the alkyl acrylate (a2) include methyl acrylate, cyclohexyl acrylate, isobornyl acrylate, stearyl acrylate, and t-butyl acrylate.

The alkyl acrylate (a2) may be used in a single amount of 1 kind, or may be used in combination of 2 or more kinds. Among them, the alkyl acrylate (a2) preferably contains methyl acrylate, cyclohexyl acrylate, isobornyl acrylate, and the like, and more preferably contains methyl acrylate, from the viewpoint of high-temperature durability.

The structural unit derived from the (meth) acrylate represented by the formula (I) is preferably 50% by mass or more, preferably 60 to 95% by mass, and more preferably 65 to 95% by mass or more of the total structural units contained in the (meth) acrylic resin (a).

The structural unit derived from a monomer other than the (meth) acrylate is preferably a structural unit derived from a monomer having a polar functional group, and more preferably a structural unit derived from a (meth) acrylate having a polar functional group. Examples of the polar functional group include: and heterocyclic groups such as hydroxyl, carboxyl, substituted or unsubstituted amino, and epoxy groups.

Examples of the monomer having a polar functional group include:

1-hydroxymethyl (meth) acrylate, 1-hydroxyethyl (meth) acrylate, 1-hydroxyheptyl (meth) acrylate, 1-hydroxybutyl (meth) acrylate, 1-hydroxypentyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypentyl (meth) acrylate, 2-hydroxyhexyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 3-hydroxypentyl (meth) acrylate, 3-hydroxyhexyl (meth) acrylate, 3-hydroxyheptyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 4-hydroxypentyl (meth) acrylate, 4-hydroxyhexyl (meth) acrylate, 4-hydroxyheptyl (meth) acrylate, and mixtures thereof, 4-hydroxyoctyl (meth) acrylate, 2-chloro-2-hydroxypropyl (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, 5-hydroxyhexyl (meth) acrylate, 5-hydroxyheptyl (meth) acrylate, 5-hydroxyoctyl (meth) acrylate, 5-hydroxynonyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 6-hydroxyheptyl (meth) acrylate, 6-hydroxyoctyl (meth) acrylate, 6-hydroxynonyl (meth) acrylate, 6-hydroxydecyl (meth) acrylate, 7-hydroxyheptyl (meth) acrylate, 7-hydroxyoctyl (meth) acrylate, 7-hydroxynonyl (meth) acrylate, 7-hydroxydecyl (meth) acrylate, and mixtures thereof, 7-hydroxyundecyl (meth) acrylate, 8-hydroxyoctyl (meth) acrylate, 8-hydroxynonyl (meth) acrylate, 8-hydroxydecyl (meth) acrylate, 8-hydroxyundecyl (meth) acrylate, 8-hydroxydodecyl (meth) acrylate, 9-hydroxynonyl (meth) acrylate, 9-hydroxydecyl (meth) acrylate, 9-hydroxyundecyl (meth) acrylate, 9-hydroxydodecyl (meth) acrylate, 9-hydroxytridecyl (meth) acrylate, 10-hydroxydecyl (meth) acrylate, 10-hydroxyundecyl (meth) acrylate, 10-hydroxydodecyl (meth) acrylate, 10-hydroxytridecyl acrylate, 10-hydroxytetradecyl (meth) acrylate, 11-hydroxyundecyl (meth) acrylate, 11-hydroxydodecyl (meth) acrylate, and mixtures thereof, Hydroxyl group-having monomers such as 11-hydroxytridecyl (meth) acrylate, 11-hydroxytetradecyl (meth) acrylate, 11-hydroxypentadecyl (meth) acrylate, 12-hydroxydodecyl (meth) acrylate, 12-hydroxytridecyl (meth) acrylate, 12-hydroxytetradecyl (meth) acrylate, 13-hydroxypentadecyl (meth) acrylate, 13-hydroxytetradecyl (meth) acrylate, 13-hydroxypentadecyl (meth) acrylate, 14-hydroxytetradecyl (meth) acrylate, 14-hydroxypentadecyl (meth) acrylate, 15-hydroxypentadecyl (meth) acrylate, and 15-hydroxyheptadecyl (meth) acrylate;

carboxyl group-containing monomers such as (meth) acrylic acid, carboxyalkyl (meth) acrylate (e.g., carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate), maleic acid, maleic anhydride, fumaric acid, and crotonic acid;

monomers having a heterocyclic group such as acryloylmorpholine, vinylcaprolactam, N-vinyl-2-pyrrolidone, vinylpyridine, tetrahydrofurfuryl (meth) acrylate, caprolactone-modified tetrahydrofurfuryl acrylate, 3, 4-epoxycyclohexylmethyl (meth) acrylate, glycidyl (meth) acrylate, 2, 5-dihydrofuran and the like;

monomers having a substituted or unsubstituted amino group such as aminoethyl (meth) acrylate, N-dimethylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) acrylate, and the like.

Among them, from the viewpoint of reactivity of the (meth) acrylate polymer and the crosslinking agent, a monomer having a hydroxyl group or a monomer having a carboxyl group is preferable, and both a monomer having a hydroxyl group and a monomer having a carboxyl group are more preferable.

As the monomer having a hydroxyl group, 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 5-hydroxypentyl acrylate, and 6-hydroxyhexyl acrylate are preferable. In particular, good durability can be obtained by using 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate and 5-hydroxypentyl acrylate.

As the monomer having a carboxyl group, acrylic acid is preferably used.

From the viewpoint of preventing an increase in the peel force of a release film that can be laminated on the outer surface of the pressure-sensitive adhesive layer, the (meth) acrylic resin (a) preferably contains substantially no structural unit derived from a monomer having an amino group. The term "substantially not included" means 0.1 parts by mass or less per 100 parts by mass of all the structural units constituting the (meth) acrylic resin (a).

The content of the structural unit derived from the monomer having a polar functional group is preferably 20 parts by mass or less, more preferably 0.5 parts by mass or more and 15 parts by mass or less, further preferably 0.5 parts by mass or more and 10 parts by mass or less, and particularly preferably 1 part by mass or more and 7 parts by mass or less, relative to 100 parts by mass of the total structural units of the (meth) acrylic resin (a).

The content of the structural unit derived from the aromatic group-containing monomer is preferably 20 parts by mass or less, more preferably 4 parts by mass or more and 20 parts by mass or less, and further preferably 4 parts by mass or more and 16 parts by mass or less, based on 100 parts by mass of the total structural units of the (meth) acrylic resin (a).

As structural units derived from monomers other than (meth) acrylates, there may be mentioned: a structural unit derived from a styrene-based monomer, a structural unit derived from a vinyl-based monomer, a structural unit derived from a monomer having a plurality of (meth) acryloyl groups in the molecule, a structural unit derived from a (meth) acrylamide-based monomer, and the like.

Examples of the styrene monomer include: styrene; alkylstyrenes such as methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, triethylstyrene, propylstyrene, butylstyrene, hexylstyrene, heptylstyrene, octylstyrene and the like; halogenated styrenes such as fluorostyrene, chlorostyrene, bromostyrene, dibromostyrene, iodostyrene, etc.; nitrostyrene; acetyl styrene; a methoxystyrene; and divinylbenzene.

Examples of the vinyl monomer include vinyl esters of fatty acids such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl 2-ethylhexanoate, and vinyl laurate; vinyl halides such as vinyl chloride and vinyl bromide; vinylidene halides such as vinylidene chloride; vinyl nitrogen-containing heteroaromatic compounds such as vinylpyridine, vinylpyrrolidone and vinylcarbazole; conjugated dienes such as butadiene, isoprene and chloroprene; and unsaturated nitriles such as acrylonitrile and methacrylonitrile.

Examples of the monomer having a plurality of (meth) acryloyl groups in the molecule include: monomers having 2 (meth) acryloyl groups in the molecule, such as 1, 4-butanediol di (meth) acrylate, 1, 6-hexanediol di (meth) acrylate, 1, 9-nonanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, and tripropylene glycol di (meth) acrylate; a monomer having 3 (meth) acryloyl groups in the molecule, such as trimethylolpropane tri (meth) acrylate.

Examples of the (meth) acrylamide monomer include: n-hydroxymethyl (meth) acrylamide, N- (2-hydroxyethyl) (meth) acrylamide, N- (3-hydroxypropyl) (meth) acrylamide, N- (4-hydroxybutyl) (meth) acrylamide, N- (5-hydroxypentyl) (meth) acrylamide, N- (6-hydroxyhexyl) (meth) acrylamide, N-dimethyl (meth) acrylamide, N-diethyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N- (3-dimethylaminopropyl) (meth) acrylamide, N- (1, 1-dimethyl-3-oxobutyl) (meth) acrylamide, N- [ 2- (2-oxo-1-imidazolidinyl) ethyl ] (meth) acrylamide, 2-acrylamido-2-methyl-1-propanesulfonic acid, N- (methoxymethyl) acrylamide, N- (ethoxymethyl) (meth) acrylamide, N- (propoxymethyl) (meth) acrylamide, N- (1-methylethoxymethyl) (meth) acrylamide, N- (1-methylpropoxymethyl) (meth) acrylamide, N- (2-methylpropoxymethyl) (meth) acrylamide, N- (butoxymethyl) (meth) acrylamide, N- (1, 1-dimethylethoxymethyl) (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N- (2-ethoxyethyl) (meth) acrylamide, N- (2-propoxyethyl) (meth) acrylamide, N- [ 2- (1-methylethoxy) ethyl ] (meth) acrylamide, N- [ 2- (1-methylpropoxy) ethyl ] (meth) acrylamide, N- (1-methylethoxy) ethyl (meth) acrylamide, N- (1-methylpropoxy) ethyl (meth) acrylamide, N- (1-methylethoxy) acrylamide, N- (2-N-ethylpropoxy) acrylamide, N-N-2-N-2-1-methylethoxy) acrylamide, N-2-N-2-propy-methyl-acrylamide, N-2-propy-2-propy-amide, N-propy-2-amide, N-propy-amide, N-2-propy-2-propy-N-2-one, N, N- [ 2- (2-methylpropoxy) ethyl ] (meth) acrylamide, N- (2-butoxyethyl) (meth) acrylamide, N- [ 2- (1, 1-dimethylethoxy) ethyl ] (meth) acrylamide, and the like. Among them, N- (methoxymethyl) acrylamide, N- (ethoxymethyl) acrylamide, N- (propoxymethyl) acrylamide, N- (butoxymethyl) acrylamide, and N- (2-methylpropyloxymethyl) acrylamide are preferable.

The weight average molecular weight (Mw) of the (meth) acrylic resin (a) is preferably 50 to 250 ten thousand. When the weight average molecular weight is 50 ten thousand or more, the durability of the pressure-sensitive adhesive layer in a high-temperature environment is improved, and problems such as peeling of an adherend from the pressure-sensitive adhesive layer by lifting and cohesive failure of the pressure-sensitive adhesive layer are easily suppressed. When the weight average molecular weight is 250 ten thousand or less, it is advantageous from the viewpoint of coatability when the adhesive composition is processed into, for example, a sheet form (applied to a substrate). From the viewpoint of satisfying both the durability of the pressure-sensitive adhesive layer and the coatability of the pressure-sensitive adhesive composition, the weight average molecular weight is preferably 60 to 180 ten thousand, more preferably 70 to 170 ten thousand, and particularly preferably 100 to 160 ten thousand. The molecular weight distribution (Mw/Mn) represented by the ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn) is usually 2 to 10, preferably 3 to 8, and more preferably 3 to 6. The weight average molecular weight can be analyzed by gel permeation chromatography and is a value in terms of standard polystyrene.

When the (meth) acrylic resin (a) is dissolved in ethyl acetate to form a 20 mass% solution, the viscosity at 25 ℃ is preferably 20 pas or less, and more preferably 0.1 to 15 pas. A viscosity in this range is advantageous from the viewpoint of coatability when the adhesive composition (2) is applied to a substrate. The viscosity can be measured by a brookfield viscometer.

The glass transition temperature (Tg) of the (meth) acrylic resin (a) may be, for example, -60 to 20 ℃, preferably-50 to 15 ℃, more preferably-45 to 10 ℃, and particularly preferably-40 to 0 ℃. When the Tg is 20 ℃ or lower, the wettability of the pressure-sensitive adhesive layer to an adherend substrate is improved, and when the Tg is-60 ℃ or higher, the durability of the pressure-sensitive adhesive layer is improved. The glass transition temperature can be measured by a Differential Scanning Calorimeter (DSC).

The (meth) acrylic resin (a) can be produced by a known method such as solution polymerization, bulk polymerization, suspension polymerization, or emulsion polymerization, and the solution polymerization is particularly preferred. Examples of the solution polymerization method include: a method comprising mixing a monomer and an organic solvent, adding a thermal polymerization initiator in a nitrogen atmosphere, and stirring at a temperature of about 40 to 90 ℃, preferably about 50 to 80 ℃ for about 3 to 15 hours. In order to control the reaction, the monomer or the thermal polymerization initiator may be continuously or intermittently added during the polymerization. The monomer and the thermal initiator may be added to an organic solvent.

As the polymerization initiator, a thermal polymerization initiator, a photopolymerization initiator, or the like can be used. Examples of the photopolymerization initiator include 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone and the like. Examples of the thermal polymerization initiator include azo compounds such as 2, 2 ' -azobisisobutyronitrile, 2 ' -azobis (2-methylbutyronitrile), 1 ' -azobis (cyclohexane-1-carbonitrile), 2 ' -azobis (2, 4-dimethylvaleronitrile), 2 ' -azobis (2, 4-dimethyl-4-methoxyvaleronitrile), dimethyl 2, 2 ' -azobis (2-methylpropionate), and 2, 2 ' -azobis (2-hydroxymethylpropionitrile); organic peroxides such as lauryl peroxide, t-butyl hydroperoxide, benzoyl peroxide, t-butyl peroxybenzoate, cumene hydroperoxide, diisopropyl peroxydicarbonate, dipropyl peroxydicarbonate, t-butyl peroxyneodecanoate, t-butyl peroxypivalate, and (3, 5, 5-trimethylhexanoyl) peroxide; and inorganic peroxides such as potassium persulfate, ammonium persulfate, and hydrogen peroxide. In addition, redox initiators using a combination of a peroxide and a reducing agent, and the like can also be used.

The proportion of the polymerization initiator is about 0.001 to 5 parts by mass relative to 100 parts by mass of the total amount of the monomers constituting the (meth) acrylic resin. Polymerization methods using active energy rays (e.g., ultraviolet rays) can also be used for the polymerization of the (meth) acrylic resin.

Examples of the organic solvent include aromatic hydrocarbons such as toluene and xylene; esters such as ethyl acetate and butyl acetate; aliphatic alcohols such as propanol and isopropanol; ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone.

The content of the (meth) acrylic resin (a) is usually 60 to 99.9 mass%, preferably 70 to 99.5 mass%, and more preferably 80 to 99 mass% in 100 mass% of the adhesive composition (2).

< crosslinking agent (b) >)

The crosslinking agent (b) reacts with the polar functional group (for example, a hydroxyl group, an amino group, a carboxyl group, a heterocyclic group, or the like) in the (meth) acrylic resin (a). The crosslinking agent (b) forms a crosslinked structure with a (meth) acrylic resin or the like, and forms a crosslinked structure advantageous for durability and reworkability.

Examples of the crosslinking agent (b) include an isocyanate crosslinking agent, an epoxy crosslinking agent, an aziridine crosslinking agent, a metal chelate crosslinking agent, and the like, and particularly from the viewpoints of the pot life of the adhesive composition (2), the durability of the adhesive layer, the crosslinking rate, and the like, an isocyanate crosslinking agent is preferable.

The isocyanate compound is preferably a compound having at least 2 isocyanate groups (-NCO) in the molecule, and examples thereof include aliphatic isocyanate compounds (e.g., hexamethylene diisocyanate), alicyclic isocyanate compounds (e.g., isophorone diisocyanate, hydrogenated diphenylmethane diisocyanate, hydrogenated xylylene diisocyanate), aromatic isocyanate compounds (e.g., toluene diisocyanate, xylylene diisocyanate, diphenylmethane diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, and the like). The crosslinking agent (B) may be an adduct (adduct) of the isocyanate compound with a polyol compound [ for example, an adduct of glycerin, trimethylolpropane or the like ], an isocyanurate compound, a biuret compound, a urethane prepolymer type isocyanate compound obtained by addition reaction with a polyether polyol, a polyester polyol, an acryl polyol, a polybutadiene polyol, a polyisoprene polyol or the like, or the like. The crosslinking agent (B) may be used alone or in combination of two or more. Among them, typically, aromatic isocyanate compounds (e.g., toluene diisocyanate, xylylene diisocyanate), aliphatic isocyanate compounds (e.g., hexamethylene diisocyanate), adducts thereof based on polyol compounds (e.g., glycerin, trimethylolpropane), or isocyanurates are exemplified. When the crosslinking agent (B) is an aromatic isocyanate-based compound and/or an adduct thereof based on a polyol compound or an isocyanurate compound, the durability of the adhesive layer can be improved, probably because it is advantageous to form an optimum crosslinking density (or crosslinking structure). In particular, when the adhesive layer is a toluene diisocyanate-based compound and/or an adduct thereof based on a polyol compound, durability can be improved even when the adhesive layer is applied to a polarizing plate, for example.

The content of the crosslinking agent (b) is usually 0.01 to 15 parts by mass, preferably 0.05 to 10 parts by mass, and more preferably 0.1 to 5 parts by mass, based on 100 parts by mass of the (meth) acrylic resin (a).

< Selective light-absorbing Compound (c) >)

The light selective absorbing compound (c) is a compound that selectively absorbs light having a wavelength of 405nm, preferably a compound satisfying formula (5), and more preferably a compound also satisfying formula (6).

ε(405)≥20 (5)

ε(405)/ε(440)≥20 (6)

[ in the formula (6),. epsilon. (. epsilon.) (405) represents the gram absorption coefficient of the compound at a wavelength of 405nm, and. epsilon. (440) represents the gram absorption coefficient at a wavelength of 440 nm. ]

The gram absorbance coefficient was measured by the method described in examples.

The larger the value of epsilon (405), the more easily the compound absorbs light having a wavelength of 405nm, and the function of suppressing deterioration due to ultraviolet light or visible light having a short wavelength is easily exhibited. When the value of ∈ (405) is less than 20L/(g · cm), the content of the light selective absorbing compound (c) in the light absorption selective layer B increases in order to exhibit a function of suppressing deterioration due to ultraviolet light or short-wavelength visible light with respect to a retardation film or an organic EL light-emitting element. When the content of the light selective absorbing compound (c) is increased, the light selective absorbing compound (c) may bleed out or be unevenly dispersed, and the light absorbing function may be insufficient. The value of ε (405) is preferably 20L/(g cm) or more, more preferably 30L/(g cm) or more, still more preferably 40L/(g cm) or more, and usually 500L/(g cm) or less.

The larger the value of epsilon (405)/epsilon (440), the more light near 405nm can be absorbed to suppress light degradation of a display device such as a retardation film or an organic EL element without impairing the color expression of the display device. The value of ε (405)/ε (440) is preferably 20 or more, more preferably 40 or more, still more preferably 70 or more, and particularly more preferably 80 or more.

The light selective absorbing compound (c) is preferably a compound having a merocyanine structure in the molecule. Examples of the compound having a merocyanine structure include merocyanine compounds, cyanine compounds, indole compounds, and benzotriazole compounds, which contain a partial structure represented by- (N-C) -in the molecule. The light selective absorbing compound (c) is preferably a merocyanine compound, a cyanine compound, or a benzotriazole compound.

The light selective absorbing compound (c) is preferably a compound represented by the formula (I) (hereinafter, may be referred to as compound (I)).

[ in the formula, R ¹ And R ⁵ Each independently represents a hydrogen atom, an alkyl group having 1 to 25 carbon atoms which may have a substituent, an aralkyl group having 7 to 15 carbon atoms which may have a substituent, an aryl group having 6 to 15 carbon atoms, a heterocyclic group, or-CH contained in the alkyl group or the aralkyl group ₂ Can be-NR ^1A －、－CO－、－SO ₂ -, -O-or-S-substitution.

R ^1A Represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.

R ² 、R ³ And R ⁴ Each independently represents a hydrogen atom, an optionally substituted alkyl group having 1 to 6 carbon atoms, an optionally substituted aromatic hydrocarbon group or an optionally substituted aromatic heterocyclic group, -CH contained in the alkyl group ₂ Can be-NR ^1B －、－CO－、－SO ₂ -, -O-or-S-substitution.

R ^1B Represents a hydrogen atomOr an alkyl group having 1 to 6 carbon atoms.

R ⁶ And R ⁷ Each independently represents a hydrogen atom, an alkyl group having 1 to 25 carbon atoms or an electron-withdrawing group, or R ⁶ And R ⁷ May be interconnected to form a ring structure.

R ¹ And R ² May be linked to each other to form a ring structure, R ² And R ³ May be linked to each other to form a ring structure, R ² And R ⁴ May be linked to each other to form a ring structure, R ³ And R ⁶ May be interconnected to form a ring structure.]

As R ¹ And R ⁵ Examples of the alkyl group having 1 to 25 carbon atoms include methyl, ethyl, n-propyl, isopropyl, 2-cyanopropyl, n-butyl, tert-butyl, sec-butyl, n-pentyl, n-hexyl, 1-methylbutyl, 3-methylbutyl, n-octyl, n-decyl, and 2-hexyloctyl.

As R ¹ And R ⁵ Examples of the substituent that the alkyl group having 1 to 25 carbon atoms may have include groups described in the following group a.

Group A: nitro group, hydroxyl group, carboxyl group, sulfo group, cyano group, amino group, halogen atom, alkoxy group having 1 to 6 carbon atoms, alkylsilyl group having 1 to 12 carbon atoms, alkylcarbonyl group having 2 to 8 carbon atoms, — R ^a1 －(O－R ^a2 ) _t1 －R ^a3 (R ^a1 And R ^a2 Each independently represents an alkanediyl group having 1 to 6 carbon atoms, R ^a3 An alkyl group having 1 to 6 carbon atoms, and s1 represents an integer of 1 to 3).

Examples of the alkylsilyl group having 1 to 12 carbon atoms include monoalkylsilyl groups such as methylsilyl group, ethylsilyl group, and propylsilyl group; dialkylsilyl groups such as dimethylsilyl group, diethylsilyl group and methylethylsilyl group; trialkylsilyl groups such as trimethylsilyl, triethylsilyl and tripropylsilyl groups.

Examples of the alkylcarbonyl group having 2 to 8 carbon atoms include a methylcarbonyl group, an ethylcarbonyl group and the like.

Examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom.

As R ¹ And R ⁵ Examples of the aralkyl group having 7 to 15 carbon atoms include benzyl group and phenylethyl group. -CH included as an aralkyl group ₂ -is replaced by-SO ₂ Examples of the-or-COO-group include 2-phenylacetate ethyl group and the like.

As R ¹ And R ⁵ Examples of the substituent that the aralkyl group having 7 to 15 carbon atoms may have include those described in the above group A.

As R ¹ And R ⁵ Examples of the aryl group having 6 to 15 carbon atoms include phenyl, naphthyl, and anthracenyl.

As R ¹ And R ⁵ Examples of the substituent which the aryl group having 6 to 15 carbon atoms may have include those described in the above group A.

As R ¹ And R ⁵ Examples of the heterocyclic group having 6 to 15 carbon atoms include aromatic heterocyclic groups having 3 to 9 carbon atoms such as pyridyl, pyrrolidinyl, quinolyl, thienyl, imidazolyl, oxazolyl, pyrrolyl, thiazolyl and furyl groups.

As R ^1A And R ^1B Examples of the alkyl group having 1 to 6 carbon atoms include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a tert-butyl group, a sec-butyl group, a n-pentyl group, and a n-hexyl group.

As R ² 、R ³ And R ⁴ The alkyl group having 1 to 6 carbon atoms includes ^1B The alkyl groups having 1 to 6 carbon atoms are the same.

As R ² 、R ³ And R ⁴ Examples of the substituent that the alkyl group having 1 to 6 carbon atoms may have include those described in the above group A.

As R ² 、R ³ And R ⁴ The aromatic hydrocarbon group includes aryl groups having 6 to 15 carbon atoms such as phenyl, naphthyl, and anthracenyl; aralkyl groups having 7 to 15 carbon atoms such as benzyl group and phenylethyl group.

As R ² 、R ³ And R ⁴ Examples of the substituent which may be contained in the aromatic hydrocarbon group include those described in the above group A.

As R ² 、R ³ And R ⁴ Examples of the aromatic heterocyclic group include aromatic heterocyclic groups having 3 to 9 carbon atoms such as pyridyl, pyrrolidinyl, quinolyl, thienyl, imidazolyl, oxazolyl, pyrrolyl, thiazolyl and furyl groups.

As R ² 、R ³ And R ⁴ Examples of the substituent that the aromatic heterocycle shown may have include the groups described in the above group A.

As R ⁶ And R ⁷ The alkyl group having 1 to 25 carbon atoms includes ¹ And R ⁵ The alkyl groups having 1 to 25 carbon atoms are the same.

As R ⁶ And R ⁷ Examples of the substituent that the alkyl group having 1 to 25 carbon atoms may have include those described in the above group A.

As R ⁶ And R ⁷ Examples of the electron-withdrawing group include a cyano group, a nitro group, a halogen atom, an alkyl group substituted with a halogen atom, and a group represented by the formula (I-1).

*-X ¹ -R ¹¹ (I-1)

[ in the formula, R ¹¹ Represents a hydrogen atom or an alkyl group having 1 to 25 carbon atoms, and at least 1 of methylene groups contained in the alkyl group may be replaced with an oxygen atom.

X ¹ represents-CO-, -COO-, -OCO-, -CS-, -CSS-, -COS-, -NR ¹² CO-or CONR ¹³ －。

R ¹² And R ¹³ Each independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a phenyl group.]

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

Examples of the alkyl group substituted with a halogen atom include a perfluoroalkyl group such as a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluoroisopropyl group, a perfluorobutyl group, a perfluorosec-butyl group, a perfluorotert-butyl group, a perfluoropentyl group, and a perfluorohexyl group. The number of carbon atoms of the alkyl group substituted with a halogen atom is usually 1 to 25.

As R ¹¹ The alkyl group having 1 to 25 carbon atoms includes ¹ And R ⁵ Alkyl groups shown are the same groups.

As R ¹² And R ¹³ The alkyl group having 1 to 6 carbon atoms includes ^1A The alkyl groups having 1 to 6 carbon atoms are the same.

R ⁶ And R ⁷ May be linked to each other to form a ring structure represented by R ⁶ And R ⁷ Examples of the ring structure to be formed include: meldrum's acid structure, Barbituric acid (Barbituric acid) structure, Dimedone (Dimedone) structure, and the like.

As R ² And R ³ Ring structures formed by bonding to each other and including R ² Examples of the nitrogen-containing ring structure of the bonded nitrogen atom include a nitrogen-containing heterocycle having 4 to 14 rings. R ² And R ³ The ring structures formed by the mutual connection may be monocyclic or polycyclic. Specific examples thereof include a pyrrolidine ring, a pyrroline ring, an imidazolidine ring, an imidazoline ring, an oxazoline ring, a thiazoline ring, a piperidine ring, a morpholine ring, a piperazine ring, an indole ring, and an isoindole ring.

As R ¹ And R ² Ring structures formed by bonding to each other and containing R bonded thereto ¹ And R ² Examples of the nitrogen-containing ring structure of the nitrogen atom in (b) include a nitrogen-containing heterocycle having 4 to 14 rings (preferably 4 to 8 rings). R ¹ And R ² The ring structures formed by the mutual connection may be monocyclic or polycyclic. Specifically, R and R may be mentioned ² And R ³ The ring structures are connected to form the same ring structure.

As R ² And R ⁴ Examples of the ring structure formed by bonding to each other include a nitrogen-containing ring structure having 4 to 14 members, preferably a nitrogen-containing ring structure having 5 to 9 members. R ² And R ⁴ The ring structures formed by bonding to each other may be monocyclic or polycyclic. These rings can haveThe ring structure having a substituent may be represented by the formula R ² And R ³ The ring structure formed is the same as the exemplified ring structure.

As R ³ And R ⁶ The ring structures formed by interconnection are R ³ －C＝C－C＝C－R ⁶ The ring structure forming the backbone of the ring. For example, phenyl group and the like are mentioned.

As R ² And R ³ As the compound represented by the formula (I) which is linked to each other to form a ring structure, a compound represented by the formula (I-A) is exemplified as R ² And R ⁴ Examples of the compound represented by the formula (I) which is linked to each other to form a ring structure include compounds represented by the formula (I-B).

[ formula (I-A) or formula (I-B) wherein R ¹ 、R ³ 、R ⁴ 、R ⁵ 、R ⁶ And R ⁷ Each represents the same meaning as above.

Ring W ¹ And a ring W ² Each independently represents a nitrogen-containing ring.]

Ring W ¹ And a ring W ² Represents a nitrogen-containing ring containing a nitrogen atom as a structural unit of the ring. Ring W ¹ And a ring W ² The cyclic structure may be monocyclic or polycyclic, and may contain a hetero atom other than nitrogen as a structural unit of the ring. Ring W ¹ And a ring W ² Each independently preferably a 5-to 9-membered ring.

The compound represented by the formula (I-A) is preferably a compound represented by the formula (I-A-1).

[ in the formula (I-A), R ¹ 、R ⁴ 、R ⁵ 、R ⁶ And R ⁷ Each represents the same meaning as above.

A ¹ represents-CH ₂ -, -O-, -S-or-NR ^1D －。

R ¹⁴ And R ¹⁵ Each independently represents a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.

R ^1D Represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.]

The compound represented by the formula (I-B) is preferably a compound represented by the formula (I-B-1) or a compound represented by the formula (I-B-2).

[ in the formula (I-B-1), R ¹ 、R ⁶ And R ⁷ Each represents the same meaning as above.

R ¹⁶ Each independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group.]

[ in the formula (I-B-2), R ³ 、R ⁵ 、R ⁶ And R ⁷ Each represents the same meaning as above.

R ³⁰ Represents a hydrogen atom, a cyano group, a nitro group, a halogen atom, a mercapto group, an amino group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, an acyl group having 2 to 13 carbon atoms, an acyloxy group having 2 to 13 carbon atoms or an alkoxycarbonyl group having 2 to 13 carbon atoms.

R ³¹ Represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a mercapto group, an alkylthio group having 1 to 12 carbon atoms, an amino group which may have a substituent, or a heterocyclic group.]

As R ³⁰ Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

As R ³⁰ Examples of the acyl group having 2 to 13 carbon atoms include acetyl, propionyl, and butyryl.

As R ³⁰ Examples of the acyloxy group having 2 to 13 carbon atoms include a methylcarbonyloxy group, an ethylcarbonyloxy group, a propylcarbonyloxy group, a butylcarbonyloxy group and the like.

As R ³⁰ Examples of the alkoxycarbonyl group having 2 to 13 carbon atoms include methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, butoxycarbonyl, and the like.

As R ³⁰ The aromatic hydrocarbon group having 6 to 18 carbon atoms includes aryl groups having 6 to 18 carbon atoms such as phenyl, naphthyl, biphenyl and the like; aralkyl groups having 7 to 18 carbon atoms such as benzyl group and phenylethyl group.

As R ³⁰ The alkyl group having 1 to 12 carbon atoms includes ¹⁴ The alkyl groups having 1 to 12 carbon atoms are the same.

As R ³⁰ Examples of the alkoxy group having 1 to 12 carbon atoms include methoxy, ethoxy, propoxy, butoxy, and pentoxy.

R ³⁰ Preferably an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an amino group or a mercapto group.

As R ³¹ The alkyl group having 1 to 12 carbon atoms includes ¹⁴ The alkyl groups having 1 to 12 carbon atoms are the same.

As R ³¹ The alkoxy group having 1 to 12 carbon atoms includes ³⁰ The alkoxy groups having 1 to 12 carbon atoms are the same.

As R ³¹ The alkylthio group having 1 to 12 carbon atoms includes a methylthio group, an ethylthio group, a propylthio group, a butylthio group, a pentylthio group, a hexylthio group, and the like.

As R ³¹ Examples of the amino group which may have a substituent include: an amino group; an amino group substituted with 1 alkyl group having 1 to 8 carbon atoms such as an N-methylamino group, an N-ethylamino group, etc.; an amino group substituted with 2 alkyl groups having 1 to 8 carbon atoms, such as an N, N-dimethylamino group, an N, N-diethylamino group, or an N, N-methylethylamino group; and so on.

As R ³¹ Examples of the heterocyclic ring include pyrrolidinyl, piperidinyl and morpholinylAnd nitrogen-containing heterocyclic groups having 4 to 9 carbon atoms.

As R ³ And R ⁶ Are connected to each other to form a ring structure, and R ² And R ⁴ Examples of the compound represented by the formula (I) bonded to each other to form a ring structure include compounds represented by the formula (I-C).

[ in the formula (I-C), R ¹ 、R ⁶ And R ⁷ The same meaning as above is indicated.

R ²¹ 、R ²² Each independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms or a hydroxyl group.

X ² And X ³ Each independently represents-CH ₂ -or-N (R) ²⁵ )＝。

R ²⁵ Represents a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an aromatic hydrocarbon group which may have a substituent.]

As R ²⁵ The alkyl group having 1 to 25 carbon atoms includes ¹ The alkyl groups having 1 to 25 carbon atoms are the same.

As R ²⁵ Examples of the aromatic hydrocarbon group include aryl groups such as phenyl and naphthyl: aralkyl groups such as benzyl and phenylethyl: biphenyl, etc., preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms. As R ²⁵ Examples of the substituent that may be contained in the aromatic hydrocarbon group include a hydroxyl group.

R ³ And R ⁶ Each independently is preferably an electron-withdrawing group.

As R ¹ And R ² Are connected to each other to form a ring structure, and R ³ And R ⁶ Examples of the compound represented by the formula (I) bonded to each other to form a ring structure include compounds represented by the formula (I-D).

[ formula (I-D) wherein R ⁴ 、R ⁵ 、R ⁷ The same meaning as above is indicated.

R ²⁵ 、R ²⁶ 、R ²⁷ And R ²⁸ Each independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may have a substituent, a hydroxyl group, or an aralkyl group.]

As R ²⁵ 、R ²⁶ 、R ²⁷ And R ²⁸ The alkyl group having 1 to 12 carbon atoms includes ^1A And R ^1B The alkyl groups having 1 to 12 carbon atoms are the same. As R ²⁵ 、R ²⁶ 、R ²⁷ And R ²⁸ Examples of the substituent that the alkyl group having 1 to 12 carbon atoms may have include a hydroxyl group.

As R ²⁵ 、R ²⁶ 、R ²⁷ And R ²⁸ Examples of the aralkyl group include aralkyl groups having 7 to 15 carbon atoms such as a benzyl group and a phenylethyl group.

As R ⁶ And R ⁷ Examples of the compound (I) which is linked to each other to form a ring structure include compounds represented by the formula (I-E).

[ in the formula (I-E), R ¹ 、R ³ 、R ⁴ 、R ⁵ Each represents the same meaning as above.

Ring W ³ Represents a cyclic compound.

Ring W ³ The ring having 5 to 9 members may contain a heteroatom such as a nitrogen atom, an oxygen atom, or a sulfur atom as a structural unit of the ring.

The compound represented by the formula (I-E) is preferably a compound represented by the formula (IE-1).

[ formula (I-C-1) wherein R ¹ 、R ² 、R ³ And R ⁵ Each represents the same meaning as above.

R ¹⁷ 、R ¹⁸ 、R ¹⁹ 、R ^q Each independently represents a hydrogen atom or an alkyl group, an aralkyl group or an aryl group having 1 to 12 carbon atoms which may have a substituent, and-CH contained in the alkyl group or the aralkyl group ₂ The-radical being replaceable by-NR ^1D －、－C(＝O)－、－C(＝S)－、－O－、－S－，R ¹⁷ And R ¹⁸ May be linked to each other to form a ring structure, R ¹⁸ And R ¹⁹ May be linked to each other to form a ring structure, R ¹⁹ And R ^q May be connected to each other to form a ring structure. m, p and q each independently represent an integer of 0 to 3.]

Examples of the compound represented by the formula (I) include the following compounds.

The content of the light selective absorbing compound (c) is usually 0.01 to 20 parts by mass, preferably 0.05 to 15 parts by mass, more preferably 0.1 to 10 parts by mass, and still more preferably 0.1 to 5 parts by mass, based on 100 parts by mass of the (meth) acrylic resin (a).

The adhesive composition (2) may further contain a silane compound (d). Examples of the silane compound (d) include: vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylethoxydimethylsilane, 2- (3, 4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane and the like.

The silane compound (d) may be a silicone oligomer. Specific examples of the silicone oligomer are described below when the monomers are combined with each other.

Mercaptopropyl-containing oligomers such as 3-mercaptopropyltrimethoxysilane-tetramethoxysilane oligomer, 3-mercaptopropyltrimethoxysilane-tetraethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetramethoxysilane oligomer, and 3-mercaptopropyltriethoxysilane-tetraethoxysilane oligomer; mercapto methyl group-containing oligomers such as mercapto methyltrimethoxysilane-tetramethoxysilane oligomer, mercapto methyltrimethoxysilane-tetraethoxysilane oligomer, mercapto methyltriethoxysilane-tetramethoxysilane oligomer, and mercapto methyltriethoxysilane-tetraethoxysilane oligomer; 3-glycidoxypropyl group-containing copolymers such as 3-glycidoxypropyltrimethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropyltrimethoxysilane-tetraethoxysilane copolymer, 3-glycidoxypropyltriethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropyltriethoxysilane-tetraethoxysilane copolymer, 3-glycidoxypropylmethyldimethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropylmethyldimethoxysilane-tetraethoxysilane copolymer, 3-glycidoxypropylmethyldiethoxysilane-tetramethoxysilane copolymer and 3-glycidoxypropylmethyldiethoxysilane-tetraethoxysilane copolymer; methacryloxypropyl-containing oligomers such as 3-methacryloxypropyltrimethoxysilane-tetramethoxysilane oligomer, 3-methacryloxypropyltrimethoxysilane-tetraethoxysilane oligomer, 3-methacryloxypropyltriethoxysilane-tetramethoxysilane oligomer, 3-methacryloxypropyltriethoxysilane-tetraethoxysilane oligomer, 3-methacryloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-methacryloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-methacryloxypropylmethyldiethoxysilane-tetramethoxysilane oligomer, and 3-methacryloxypropylmethyldiethoxysilane-tetraethoxysilane oligomer; acryloxypropyl-containing oligomers such as 3-acryloxypropyltrimethoxysilane-tetramethoxysilane oligomer, 3-acryloxypropyltrimethoxysilane-tetraethoxysilane oligomer, 3-acryloxypropyltriethoxysilane-tetramethoxysilane oligomer, 3-acryloxypropyltriethoxysilane-tetraethoxysilane oligomer, 3-acryloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-acryloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-acryloxypropylmethyldiethoxysilane-tetramethoxysilane oligomer, and 3-acryloxypropylmethyldiethoxysilane-tetraethoxysilane oligomer; vinyl group-containing oligomers such as vinyltrimethoxysilane-tetramethoxysilane oligomer, vinyltrimethoxysilane-tetraethoxysilane oligomer, vinyltriethoxysilane-tetramethoxysilane oligomer, vinyltriethoxysilane-tetraethoxysilane oligomer, vinylmethyldimethoxysilane-tetramethoxysilane oligomer, vinylmethyldimethoxysilane-tetraethoxysilane oligomer, vinylmethyldiethoxysilane-tetramethoxysilane oligomer, and vinylmethyldiethoxysilane-tetraethoxysilane oligomer; and amino group-containing copolymers such as 3-aminopropyltrimethoxysilane-tetramethoxysilane copolymer, 3-aminopropyltrimethoxysilane-tetraethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetramethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetramethoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldiethoxysilane-tetramethoxysilane copolymer, and 3-aminopropylmethyldiethoxysilane-tetraethoxysilane copolymer.

The silane compound (d) may be a silane compound represented by the following formula (d 1). When the pressure-sensitive adhesive composition (2) contains the silane compound represented by the following formula (d1), adhesion to a substrate, glass, a transparent electrode, or the like can be further improved, and therefore, a light-selective absorbing layer B having excellent durability in which peeling off by floating or foaming is not easily caused in a high-temperature environment can be formed.

(wherein B represents a C1-20 alkanediyl group or a C3-20 divalent alicyclic hydrocarbon group, -CH constituting the alkanediyl group and the alicyclic hydrocarbon group ₂ Can be replaced by-O-or-CO－，R ^d7 Represents an alkyl group having 1 to 5 carbon atoms, R ^d8 、R ^d9 、R ^d10 、R ^d11 And R ^d12 Each independently represents an alkyl group having 1 to 5 carbon atoms or an alkoxy group having 1 to 5 carbon atoms)

In the formula (d1), B represents an alkanediyl group having 1 to 20 carbon atoms such as a methylene group, an ethylene group, a trimethylene group, a tetramethylene group, a hexamethylene group, a heptamethylene group, and an octamethylene group; a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms such as a cyclobutyl group (e.g., 1, 2-cyclobutyl group), a cyclopentyl group (e.g., 1, 2-cyclopentyl group), a cyclohexyl group (e.g., 1, 2-cyclohexyl group), a cyclooctylene group (e.g., 1, 2-cyclooctylene group), etc., or-CH constituting these alkanediyl group and the alicyclic hydrocarbon group ₂ -substituted by-O-or-CO-. Preferably, B is an alkanediyl group having 1 to 10 carbon atoms. R is ^d7 Represents an alkyl group having 1 to 5 carbon atoms such as methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, pentyl, etc., R ^d8 、R ^d9 、R ^d10 、R ^d11 And R ^d12 Each independently represents the above R ²¹ In the above, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, a sec-butoxy group, a tert-butoxy group, etc., are exemplified. Preferred R ^d8 、R ^d9 、R ^d10 、R ^d11 And R ^d12 Each independently is an alkoxy group having 1 to 5 carbon atoms. These silane compounds (d) may be used alone or in combination of two or more.

Specific examples of the silane compound represented by the formula (d1) include (trimethoxysilyl) methane, 1, 2-bis (trimethoxysilyl) ethane, 1, 2-bis (triethoxysilyl) ethane, 1, 3-bis (trimethoxysilyl) propane, 1, 3-bis (triethoxysilyl) propane, 1, 4-bis (trimethoxysilyl) butane, 1, 4-bis (triethoxysilyl) butane, 1, 5-bis (trimethoxysilyl) pentane, 1, 5-bis (triethoxysilyl) pentane, 1, 6-bis (trimethoxysilyl) hexane, 1, 6-bis (triethoxysilyl) hexane, 1, 6-bis (tripropoxysilyl) hexane, 1, 8-bis (trimethoxysilyl) octane, 1, bis (tri-C1-5 alkoxysilyl) C1-10 alkanes such as 8-bis (triethoxysilyl) octane and 1, 8-bis (tripropoxysilyl) octane; bis (di-C1-5 alkoxy C1-5 alkylsilyl) C1-10 alkanes such as bis (dimethoxymethylsilyl) methane, 1, 2-bis (dimethoxymethylsilyl) ethane, 1, 2-bis (dimethoxyethylsilyl) ethane, 1, 4-bis (dimethoxymethylsilyl) butane, 1, 4-bis (dimethoxyethylsilyl) butane, 1, 6-bis (dimethoxymethylsilyl) hexane, 1, 6-bis (dimethoxyethylsilyl) hexane, 1, 8-bis (dimethoxymethylsilyl) octane and 1, 8-bis (dimethoxyethylsilyl) octane; and bis (mono C1-5 alkoxydiC 1-5 alkylsilyl) C1-10 alkanes such as 1, 6-bis (methoxydimethylsilyl) hexane and 1, 8-bis (methoxydimethylsilyl) octane. Among them, bis (tri C1-3 alkoxysilyl) C1-10 alkanes such as 1, 2-bis (trimethoxysilyl) ethane, 1, 3-bis (trimethoxysilyl) propane, 1, 4-bis (trimethoxysilyl) butane, 1, 5-bis (trimethoxysilyl) pentane, 1, 6-bis (trimethoxysilyl) hexane, 1, 8-bis (trimethoxysilyl) octane and the like are preferable, and 1, 6-bis (trimethoxysilyl) hexane and 1, 8-bis (trimethoxysilyl) octane are particularly preferable.

The content of the silane compound (d) is usually 0.01 to 10 parts by mass, preferably 0.03 to 5 parts by mass, more preferably 0.05 to 2 parts by mass, and still more preferably 0.1 to 1 part by mass, based on 100 parts by mass of the (meth) acrylic resin (a). When the content is not more than the upper limit, bleeding of the silane compound (d) from the pressure-sensitive adhesive layer is favorably suppressed, and when the content is not less than the lower limit, adhesiveness (or adhesiveness) between the pressure-sensitive adhesive layer and the metal layer, the glass substrate, or the like is easily improved, and peeling resistance or the like is favorably improved.

The adhesive composition (2) may further contain an antistatic agent.

Examples of the antistatic agent include surfactants, silicone compounds, and conductive polymersAnd ionic compounds, etc., preferably ionic compounds. The ionic compound may be a conventional ionic compound. Examples of the cation component constituting the ionic compound include an organic cation and an inorganic cation. Examples of the organic cation include a pyridinium cation, a pyrrolidinium cation, a piperidinium cation, an imidazolium cation, an ammonium cation, a sulfonium cation, and a phosphonium cation. Examples of the inorganic cation include alkali metal cations such as lithium cation, potassium cation, sodium cation, and cesium cation, and alkaline earth metal cations such as magnesium cation and calcium cation. In particular, from the viewpoint of compatibility with the (meth) acrylic resin, a pyridinium cation, an imidazolium cation, a pyrrolidinium cation, a lithium cation, and a potassium cation are preferable. The anionic component constituting the ionic compound may be any of inorganic anions and organic anions, and is preferably an anionic component containing a fluorine atom from the viewpoint of antistatic performance. Examples of the anion component containing a fluorine atom include hexafluorophosphate anion (PF) ₆ ^－ ) Bis (trifluoromethanesulfonyl) imide anion [ (CF) ₃ SO ₂ ) ₂ N ^－ ]Bis (fluorosulfonyl) imide anion [ (FSO) ₂ ) ₂ N ^－ ]Tetrakis (pentafluorophenyl) borate anion [ (C) ₆ F ₅ ) ₄ B ^－ ]And so on. These ionic compounds may be used alone or in combination of two or more. Particularly preferred is the bis (trifluoromethanesulfonyl) imide anion [ (CF) ₃ SO ₂ ) ₂ N ^－ ]Bis (fluorosulfonyl) imide anion [ (FSO) ₂ ) ₂ N ^－ ]Tetrakis (pentafluorophenyl) borate anion [ (C) ₆ F ₅ ) ₄ B ^－ ]。

From the viewpoint of the stability with time of the antistatic performance of the pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition (2), an ionic compound which is solid at room temperature is preferable.

The content of the antistatic agent is, for example, 0.01 to 20 parts by mass, preferably 0.1 to 10 parts by mass, and more preferably 1 to 7 parts by mass, based on 100 parts by mass of the (meth) acrylic resin (a).

The pressure-sensitive adhesive composition (2) may contain 1 or 2 or more of additives such as a solvent, a crosslinking catalyst, a thickener, a plasticizer, a softening agent, a pigment, a rust inhibitor, an inorganic filler, and light-scattering fine particles.

The optical film of the present invention is an optical film comprising a light selective absorbing layer a and a light selective absorbing layer B. Since the optical film of the present invention has the light selective absorption layer a and the light selective absorption layer B, the optical film of the present invention also satisfies the above formula (1) and the above formula (2).

The optical film of the present invention preferably satisfies the following formula (3).

A(440)≤0.1 (3)

A smaller value of A (440) means lower absorption at a wavelength of 440nm, and a value of A (440) larger than 0.1 tends to impair good color expression in a display device. In addition, since light emission of the display device is impaired, luminance is also reduced. The value of a (440) is preferably 0.05 or less, more preferably 0.04 or less, and particularly preferably 0.03. The lower limit is not particularly limited, but is usually 0.00001 or more.

The optical film of the present invention preferably satisfies the following formula (4).

A(405)/A(440)≥5 (4)

The value of A (405)/A (440) represents the magnitude of absorption at a wavelength of 405nm relative to the magnitude of absorption at a wavelength of 440nm, and a larger value indicates more specific absorption in a wavelength range around 405 nm. The value of A (405)/A (440) is preferably 10 or more, more preferably 30 or more, and particularly preferably 60 or more.

Fig. 1 shows an example of the layer structure of the optical film of the present invention. In the optical film of the present invention, the light selective absorbing layer a and the light selective absorbing layer B may be directly laminated as shown in fig. 1, or another layer may be present between the light selective absorbing layer a and the light selective absorbing layer B.

When the light selective absorption layer B is a pressure-sensitive adhesive layer having a light selective absorption function, a release film (release film) laminated on the outer surface of the light selective absorption layer B may be included. The separator is usually peeled off and removed at the time of use of the light selective absorbing layer B (for example, at the time of lamination onto the optical film 40). The separator may be formed by applying a mold release treatment such as silicone treatment to the surface of a film made of various resins such as polyethylene terephthalate, polybutylene terephthalate, polycarbonate, and polyarylate on which the light selective absorption layer 10 is formed.

The optical film of the present invention can be obtained by laminating the light selective absorbing layer a and the light selective absorbing layer B.

When the light selective absorbing layer B is an adhesive layer having a light selective absorbing function, it can be obtained, for example, by: the optical film of the present invention can be obtained by dissolving or dispersing the components constituting the pressure-sensitive adhesive composition (2) in a solvent to prepare a solvent-containing pressure-sensitive adhesive composition, applying the solvent-containing pressure-sensitive adhesive composition to the surface of the light selective absorbing layer a, and drying the applied solvent-containing pressure-sensitive adhesive composition to form the light selective absorbing layer B. The optical film of the present invention can be obtained by: the light selective absorption layer B is formed on the release-treated surface of the separator in the same manner as described above, and the light selective absorption layer B is laminated (transferred) on the surface of the light selective absorption layer a. The light selective absorption layer a and the light selective absorption layer B may be laminated with another film or layer interposed therebetween. The present invention can exhibit excellent optical characteristics and durability even when directly laminated.

Fig. 2 to 4 show an example of the layer structure of an optical laminate including the optical film of the present invention.

The optical laminate 10A shown in fig. 2 is a laminate including a protective film 8, an adhesive layer 7, a polarizing film 9, an adhesive layer 7, a light selective absorption layer a, and a light selective absorption layer B.

The optical laminate 10B shown in fig. 3 and the optical laminate 10C shown in fig. 4 are laminates including a protective film 8, an adhesive layer 7, a polarizing film 9, an adhesive layer 7, a light selective absorbing layer a, a light selective absorbing layer B, an optical film 40, an adhesive layer 7a, and a light emitting element 30 (liquid crystal cell, OLED cell), and the optical film 40 has a multilayer structure.

The light selective absorbing layer a is preferably located on the visible side (the side opposite to the light emitting element) with respect to the light selective absorbing layer B.

The optical film 40 has optical functions such as transmission, reflection, and absorption of light, and may be a single-layer film or a multilayer film. Examples of the optical film 40 include a polarizing film, a retardation film, a brightness enhancement film, an antiglare film, an antireflection film, a diffusion film, a light-condensing film, and a window film, and a polarizing film, a retardation film, and a laminated film thereof are preferable.

The retardation film is an optical film exhibiting optical anisotropy, and examples thereof include: and a stretched film obtained by stretching a polymer film containing polyvinyl alcohol, polycarbonate, polyester, polyarylate, polyimide, polyolefin, polycycloolefin, polystyrene, polysulfone, polyethersulfone, polyvinylidene fluoride/polymethyl methacrylate, acetyl cellulose, a saponified ethylene-vinyl acetate copolymer, polyvinyl chloride, or the like by a factor of about 1.01 to 6. Among them, a polycarbonate film and a cycloolefin resin film are preferably uniaxially or biaxially stretched to form a polymer film. In the present specification, the retardation film includes a zero retardation film, and includes films such as a uniaxial retardation film, a low photoelastic rate retardation film, and a wide-angle retardation film.

Examples of the film exhibiting optical anisotropy by application and alignment of a liquid crystalline compound and the film exhibiting optical anisotropy by application of an inorganic layered compound include: a FILM called a temperature compensation type retardation FILM, "NH FILM (trade name: a FILM in which rod-like liquid crystal is obliquely oriented)" sold by JX liquid crystal FILM co., a "WV FILM" (trade name: a FILM in which discotic liquid crystal is obliquely oriented) "sold by fuji FILM co., a" VAC FILM (trade name: a FILM of complete biaxial orientation) "sold by sumitomo chemical co., a" new VAC FILM "(trade name: a FILM of biaxial orientation)" and the like.

Zero retardation film means that the front retardation R is _e Retardation R with respect to the thickness direction _th Are all made of-15 to 15nm, optically isotropic film. The zero retardation film may be a resin film containing a cellulose-based resin, a polyolefin-based resin (e.g., a chain polyolefin-based resin or a polycycloolefin-based resin), or a polyethylene terephthalate-based resin, and is preferably a cellulose-based resin or a polyolefin-based resin from the viewpoint of easy control of retardation value and easy availability. A zero retardation film may also be used as the protective film. Examples of the zero retardation film include: "Z-TAC" (trade name) sold by Fuji film corporation, "Zero TAC (registered trademark)" sold by Konica Minolta corporation, "ZF-14" (trade name) sold by Nippon Rieger Co., Ltd.

In the optical film of the present invention, the retardation film is preferably a retardation film obtained by curing a polymerizable liquid crystal compound.

Examples of the film exhibiting optical anisotropy by application and alignment of a liquid crystalline compound include:

the first mode is as follows: a retardation film in which the rod-like liquid crystal compound is oriented in a horizontal direction with respect to the supporting substrate,

The second mode is as follows: a retardation film in which the rod-like liquid crystal compound is aligned in a direction perpendicular to the supporting substrate,

A third mode: a retardation film in which the orientation direction of the rod-like liquid crystal compound changes in a spiral shape in a plane,

A fourth formula: a retardation film in which a discotic liquid crystal compound is obliquely oriented,

The fifth mode is: a biaxial retardation film in which a discotic liquid crystal compound is aligned in a direction perpendicular to a support base.

For example, the first, second, and fifth embodiments are suitable as optical films used in organic electroluminescent displays. Alternatively, they may be stacked and used.

When the retardation film is a layer containing a polymer in an aligned state of a polymerizable liquid crystal compound (hereinafter, sometimes referred to as "optically anisotropic layer"), the retardation film preferably has reverse wavelength dispersibility. The reverse wavelength dispersibility is an optical property that a retardation value in a liquid crystal alignment plane at a short wavelength is smaller than that at a long wavelength, and it is preferable that the retardation film satisfies the following formulas (7) and (8). Re (λ) represents an in-plane phase difference value with respect to light having a wavelength λ nm.

Re(450)/Re(550)≤1 (7)

1≤Re(630)/Re(550) (8)

In the optical film of the present invention, when the retardation film is of the first aspect and has reverse wavelength dispersibility, coloration in black display in a display device is reduced, and therefore, it is preferable that 0.82. ltoreq. Re (450)/Re (550). ltoreq.0.93 is more preferable in the above formula (7). Furthermore, 120. ltoreq. Re (550). ltoreq.150 is preferred.

Examples of the polymerizable liquid crystal compound in the case where the retardation film is a film having an optically anisotropic layer include: examples of the polymerizable liquid crystal compounds include compounds having a polymerizable group among compounds described in "3.8.6 network (completely crosslinked type)" and "6.5.1 liquid crystal material b" which are available from "liquid crystal materials" published by the editorial committee for liquid crystal accessibility (12 years, 10 months, 30 days), "and polymerizable liquid crystal compounds described in japanese patent application laid-open No. 2010-31223, japanese patent application laid-open No. 2010-270108, japanese patent application laid-open No. 2011-6360, japanese patent application laid-open No. 2011-207765, japanese patent application laid-open No. 2016-81035, international patent application laid-open No. 2017/043438, and japanese patent application laid-open No. 2011-207765.

Examples of a method for producing a retardation film from a polymer in an aligned state of a polymerizable liquid crystal compound include the method described in jp 2010-31223 a.

In the case of the second mode, the front phase difference Re (550) may be adjusted to a range of 0 to 10nm, preferably 0 to 5nm, and the phase difference R in the thickness direction _th It is adjusted to a range of-10 to-300 nm, preferably-20 to-200 nm. Thickness-direction phase difference value R representing thickness-direction refractive index anisotropy _th The phase difference value R can be measured by tilting the fast axis in the plane by 50 degrees as the tilt axis ₅₀ Phase difference value R from plane ₀ And (6) calculating. Namely, the phase difference value R in the thickness direction _th Can be calculated as follows: according to the in-plane phase difference value R ₀ A phase difference value R measured by tilting the optical axis by 50 degrees with the fast axis as the tilt axis ₅₀ Thickness d of retardation film, and average refractive index n of retardation film ₀ N is obtained by the following equations (10) to (12) _x 、n _y And n _z Then, they are calculated by substituting them into the formula (9).

R _th ＝[(n _x +n _y )/2－n _z ]×d (9)

R ₀ ＝(n _x －n _y )×d (10)

(n _x +n _y +n _z )/3＝n ₀ (12)

Here, the number of the first and second electrodes,

the retardation film may be a multilayer film having two or more layers. Examples thereof include: a film obtained by laminating a protective film on one or both surfaces of a retardation film, or a film obtained by laminating two or more retardation films with an adhesive or a pressure-sensitive adhesive interposed therebetween.

When the optical film 40 is a multilayer film in which two or more retardation films are laminated, examples of the configuration of the optical laminate including the optical film of the present invention include, as shown in fig. 3: the optical film 40 is composed of a 1/4 wavelength retardation layer 50 which imparts a retardation of 1/4 wavelength parts to transmitted light and a 1/2 wavelength retardation layer 70 which imparts a retardation of 1/2 wavelength parts to transmitted light, which are laminated via an adhesive or a pressure-sensitive adhesive 60. As shown in fig. 4, there may be mentioned: the optical film comprises an optical film 40 in which an 1/4 wavelength retardation layer 50a and a positive C layer 80 are laminated via an adhesive layer or a pressure-sensitive adhesive layer.

The 1/4 wavelength retardation layer 50 that imparts a retardation of 1/4 wavelength parts and the 1/2 wavelength retardation layer 70 that imparts a retardation of 1/2 wavelength parts to transmitted light in fig. 3 may be the optical film of the first embodiment or the optical film of the fifth embodiment. In the case of the configuration of fig. 3, at least one of them is more preferably the fifth aspect.

In the case of the configuration of fig. 4, the 1/4-wavelength retardation layer 50a is preferably an optical film of the first embodiment, and more preferably satisfies the expressions (7) and (8).

The thickness of the retardation film is usually 0.1 to 100 μm.

When the retardation film is a multilayer film, the total thickness of the retardation film is preferably 0.2 to 200 μm.

The polarizing film is a film having a function of extracting linearly polarized light from incident natural light, and examples thereof include: a polarizing film in which a dichroic dye such as iodine or a dichroic organic dye is adsorbed and oriented on a polyvinyl alcohol resin film. The polyvinyl alcohol resin can be obtained by saponifying a polyvinyl acetate resin. Examples of the polyvinyl acetate resin include polyvinyl acetate which is a homopolymer of vinyl acetate, and a copolymer of a monomer copolymerizable with vinyl acetate and vinyl acetate. Examples of the monomer copolymerizable with vinyl acetate include unsaturated carboxylic acids, olefins, vinyl ethers, unsaturated sulfonic acids, and acrylamides having an ammonium group.

The saponification degree of the polyvinyl alcohol resin is usually 85 mol% to 100 mol%, and preferably 98 mol% or more. The polyvinyl alcohol resin may be modified, and may be, for example, polyvinyl formal, polyvinyl acetal, or the like, which are obtained by modifying an aldehyde. The polymerization degree of the polyvinyl alcohol resin is usually 1000 to 10000, preferably 1500 to 5000.

A film formed from a polyvinyl alcohol resin is generally used as a raw material film for a polarizing film. The polyvinyl alcohol resin can be formed into a film by a known method. The thickness of the raw material film is usually 1 to 150 μm, and is preferably 10 μm or more in consideration of ease of stretching.

The polarizing film is manufactured, for example, as follows. Namely: the method for producing the color filter is characterized by comprising the steps of performing a uniaxial stretching step of a raw material film, a step of dyeing the film with a dichroic pigment and adsorbing the dichroic pigment, a step of treating the film with an aqueous boric acid solution, a step of washing the film with water, and finally drying the film. The thickness of the polarizing film is usually 1 to 30 μm.

The polarizing plate is preferably a polarizing plate having a protective film provided on at least one surface of the polarizing film with an adhesive interposed therebetween.

As the adhesive, a known adhesive can be used, and an aqueous adhesive or an active energy ray-curable adhesive can be used.

Examples of the aqueous adhesive include conventional aqueous adhesives (for example, adhesives containing an aqueous polyvinyl alcohol resin solution, aqueous two-component urethane emulsion adhesives, aldehyde compounds, epoxy compounds, melamine compounds, methylol compounds, isocyanate compounds, amine compounds, crosslinking agents such as polyvalent metal salts, and the like). Among them, an aqueous adhesive containing an aqueous solution of a polyvinyl alcohol resin can be suitably used. In the case of using the water-based adhesive, it is preferable to perform a drying step after the polarizing film and the protective film are bonded to each other in order to remove water contained in the water-based adhesive. After the drying step, a curing step of curing at a temperature of, for example, about 20 to 45 ℃ may be provided. The adhesive layer formed of the aqueous adhesive is usually 0.001 to 5 μm.

The active energy ray-curable adhesive is an adhesive which is cured by irradiation with an active energy ray such as an ultraviolet ray or an electron ray, and examples thereof include a curable composition containing a polymerizable compound and a photopolymerization initiator, a curable composition containing a photoreactive resin, a curable composition containing a binder resin and a photoreactive crosslinking agent, and the like, and an ultraviolet ray-curable adhesive is preferable.

In the case of using an active energy ray-curable adhesive, after the polarizing film and the protective film are bonded to each other, a drying step is performed as necessary, and then a curing step of curing the active energy ray-curable adhesive is performed by irradiation with an active energy ray. The light source of the active energy ray is not particularly limited, but ultraviolet rays having an emission distribution at a wavelength of 400nm or less are preferable. The adhesive layer formed by the active energy ray curing adhesive is usually 0.1-10 μm.

Examples of the method for bonding the polarizing film to the protective film include: and a method of performing a surface activation treatment such as saponification treatment, corona treatment, or plasma treatment on at least one of the surfaces to be bonded. When protective films are laminated on both surfaces of a polarizing film, the adhesives used for laminating these protective films may be the same type of adhesive or different types of adhesives.

The protective film is preferably a film made of a light-transmitting thermoplastic resin. Specifically, examples include polyolefin-based resins; a cellulose-based resin; a polyester resin; (meth) acrylic resins; or mixtures, copolymers, etc. thereof. When protective films are provided on both sides of the polarizing film, the protective films used may be films containing different thermoplastic resins or films containing the same thermoplastic resin. In addition, the light selective absorbing layer a may also serve as a protective film.

A preferable structure of the polarizing plate is one in which a protective film is laminated on at least one surface of a polarizing film via an adhesive layer. When the protective film is laminated on only one surface of the polarizing film, it is more preferably laminated on the visible side. The protective film laminated on the visible side is preferably a protective film containing a triacetyl cellulose resin or a cycloolefin resin. The protective film may be an unstretched film or may be stretched in any direction to have a retardation. The surface of the protective film laminated on the visible side may be provided with a surface treatment layer such as a hard coat layer or an antiglare layer.

When the protective films are laminated on both sides of the polarizing film, the protective film on the panel side (the side opposite to the visible side) is preferably a protective film or a retardation film comprising a triacetyl cellulose resin, a cycloolefin resin, or an acrylic resin. The retardation film may be a zero retardation film described later.

Other layers or films may be further laminated between the polarizing plate and the panel. When used as a circularly polarizing plate for an organic EL display, it is preferable to laminate a retardation layer having an 1/4-wavelength retardation layer and a 1/2-wavelength retardation layer, and a 1/4-wavelength layer having the above reverse wavelength dispersibility. The retardation layer is preferably a liquid crystal retardation film from the viewpoint of making the film thinner.

The window film is a front panel in a flexible liquid crystal display device such as a flexible display, and is generally disposed on the outermost surface of the display device. Examples of the window film include resin films containing polyimide resins. The window film may be a mixed film of an organic material and an inorganic material, such as a resin film containing polyimide and silica. The window film may have a hard coat layer on its surface for imparting functions such as surface hardness, stain resistance, and fingerprint resistance. Examples of the window film include films described in Japanese patent laid-open publication No. 2017-94488.

The optical film of the present invention can be laminated on a display element such as an organic EL element or a liquid crystal cell, and used for a display device (FPD: flat panel display) such as an organic EL display device or a liquid crystal display device. Among them, an optical laminate in which the optical film of the present invention and the polarizing film are laminated is preferably used for an organic EL display device and a liquid crystal display device because good display characteristics and durability can be achieved at the same time.

Examples

The present invention will be described in more detail below by way of examples and comparative examples, but the present invention is not limited to these examples. In the examples,% and parts indicating the content or amount used are based on mass unless otherwise specified.

Synthesis example 1 Synthesis of light-selective absorbing Compound (1)

A200 mL four-necked flask equipped with a Dimroth (Dimroth) condenser and a thermometer was placed in a nitrogen atmosphere, and 10 parts of a compound represented by the formula (aa) synthesized in the reference patent publication (Japanese patent application laid-open No. 2014-194508), 3.6 parts of acetic anhydride (manufactured by Wako pure chemical industries, Ltd.), 6.9 parts of 2-ethylhexyl cyanoacetate (sometimes referred to as DIPEA; manufactured by Tokyo Kasei Co., Ltd.), and 60 parts of acetonitrile (manufactured by Wako pure chemical industries, Ltd.) were charged and stirred with a magnetic stirrer. 4.5 parts of DIPEA (manufactured by Tokyo chemical industry Co., Ltd.) was added dropwise from the dropping funnel at an internal temperature of 25 ℃ for 1 hour, and the mixture was further kept at an internal temperature of 25 ℃ for 2 hours after completion of the addition. After the completion of the reaction, acetonitrile was removed by a reduced pressure evaporator, and the product was purified by column chromatography (silica gel), and the solvent was removed from the effluent containing the light selective absorbing compound (1) represented by the formula (aa1) by a reduced pressure evaporator, whereby yellow crystals were obtained. The crystals were dried under reduced pressure at 60 ℃ to obtain 4.6 parts of a light selective absorbing compound as a yellow powder. The yield was 50%.

Proceed to ¹ As a result of H-NMR analysis, the following peaks were observed, and it was confirmed that the light selective absorbing compound 1 was produced.

¹ H－NMR(CDCl3)δ：0.87－0.94(m、6H)、1.32－1.67(m、8H)、1.59－1.66(m、2H)、2.09(quin、2H)、3.00(m、5H)、3.64(t、2H)、4.10(dd、2H)、5.52(d、2H)、7.87(d、2H)

< determination of extinction coefficient ε >

In order to measure the gram absorption coefficient of the obtained light selective absorbing compound (1), the light selective absorbing compound (1) was dissolved in 2-butanone. The obtained solution (concentration: 0.007g/L) was put into a 1cm quartz cuvette, which was set in a spectrophotometer UV-2450 (manufactured by Shimadzu corporation), and the absorbance was measured in 1nm steps in a wavelength range of 300 to 800nm by a two-beam method. From the obtained absorbance value, the concentration of the light-absorbing compound in the solution, and the optical path length of the quartz cuvette, the gram absorption coefficient at each wavelength was calculated using the following formula.

ε(λ)＝A(λ)/CL

[ in the formula, [ epsilon ] ([ lambda ]) represents the gram absorption coefficient L/(g · cm) of the compound at a wavelength of [ lambda ], [ lambda ]) represents the absorbance at a wavelength of [ lambda ], [ C represents the concentration g/L, and L represents the optical path length cm of the quartz cuvette. ]

The gram absorbance coefficient of the light selective absorbing compound (1) is 47L/(g.cm) for ε (405), 0.1L/(g.cm) or less for ε (440), and 80 or more for ε (405)/ε (440).

(Synthesis example 2) Synthesis of light-selective absorbing Compound (2)

A300 mL four-necked flask equipped with a Dimrot condenser, a thermometer and a stirrer was placed in a nitrogen atmosphere, 20 parts of malondialdehyde diphenylamine hydrochloride (manufactured by Tokyo chemical industry Co., Ltd.), 13.3 parts of 1, 3-dimethyl barbituric acid (manufactured by Tokyo chemical industry Co., Ltd.) and 46 parts of methanol were charged, and stirring was started at room temperature. 8.6 parts of triethylamine (sometimes referred to as "TEA", manufactured by Wako pure chemical industries, Ltd.) was added dropwise from the dropping funnel over 30 minutes, and the mixture was stirred at room temperature for 1 hour. Thereafter, the mixture was heated to an internal temperature of 65 ℃ by using an oil bath, and refluxed for 1 hour at the boiling point. After the reaction was completed, the internal temperature was cooled to room temperature, and the precipitated crystal was collected by filtration, and the wet crystal was washed with methanol. The washed wet crystals were dried under reduced pressure at 40 ℃ to obtain 18.5g of compound (aa2) as an orange powder. The yield was 84%.

To carry out ¹ As a result of H-NMR analysis, the following peaks were observed, and it was confirmed that the compound (aa2) was produced.

¹ H－NMR(DMSO－d ₆ )δ(ppm)：3.07(s、6H)、7.04－7.07(m、1H)、7.26－7.32(m、4H)、7.43(dd、1H)、8.07(d、1H)、8.55(d、1H)、11.4(s、1H)

A100 mL four-necked flask equipped with a Dimrot condenser and a thermometer was placed in a nitrogen atmosphere, 2.0 parts of compound (aa2), 1.6g of morpholine (Wako pure chemical industries, Ltd.), and 10 parts of 2-propanol (sometimes referred to as "IPA", Nacalai Tesque Co., Ltd.) were added, and the mixture was stirred with a magnetic stirrer. The mixture was heated in an oil bath to reflux at a boiling point of 83 ℃ for 3 hours, and after completion of the reaction, the mixture was cooled to room temperature. The precipitated crystals were collected by filtration, washed with 2-propanol for 4 times in total, and dried under reduced pressure at 40 ℃ to obtain 1.7g of the compound represented by formula (aa3) (light selective absorbing compound 2) as an orange powder. The yield was 85%.

To carry out ¹ As a result of H-NMR analysis, the following peaks were observed, and thus the formation of compound (aa3) was confirmed.

¹ H－NMR(CDCl3)δ(ppm)：1.72－1.74(m、6H)、3.32(s、3H)、3.33(s、3H)、3.49－3.61(m、4H)、7.28－7.37(m、2H)、7.98－8.09(m、1H)

As a result of determining the gram absorbance coefficient of the light-absorbing compound (2) by the same method as described above, the value of ε (405) was 314L/(g.cm), ε (440) was 1.3L/(g.cm), and ε (405)/ε (440) was 241.5.

(Synthesis example 3) Synthesis of light-selective absorbing Compound (3)

A200 mL four-necked flask equipped with a Dimrot condenser and a thermometer was charged with 10g of the compound represented by the formula (aa) synthesized with reference to Japanese unexamined patent publication No. 2014-194508, 3.6g of acetic anhydride (available from Wako pure chemical industries, Ltd.), 10g of 2-butyloctyl cyanoacetate (available from Tokyo Kasei Co., Ltd.), and 60g of acetonitrile (available from Wako pure chemical industries, Ltd.), and stirred with a magnetic stirrer. 4.5g of DIPEA (manufactured by Tokyo chemical industry Co., Ltd.) was added dropwise to the obtained mixture at an internal temperature of 25 ℃ over a period of 1 hour, and the mixture was further kept at an internal temperature of 25 ℃ for 2 hours. Thereafter, acetonitrile was removed by a reduced pressure evaporator, and the product was subjected to column chromatography (silica gel) to purify the product, and the solvent was removed from the effluent containing the compound represented by formula (aa4) by a reduced pressure evaporator to obtain yellow crystals. The crystals were dried under reduced pressure at 60 ℃ to obtain 4.6g of the compound represented by the formula (aa4) (light selective absorbing compound (3)) as a yellow powder. The yield was 56%.

When the gram absorbance coefficient was determined in the same manner as above, the value of ε (405) and ε (420) of the compound represented by formula (aa4) were 45L/(g.cm) and 2.1L/(g.cm), respectively.

< preparation of light selective absorption layer A >

Production example 1 production of light-selective absorbing layer (A-1)

A mixture containing cellulose triacetate (degree of substitution of acetyl group: 2.87; fuji film and wako pure chemical industries, trade name "cellulose triacetate")), Sumisorb 350 (3 parts by mass relative to 100 parts by mass of cellulose triacetate), and a solvent (a mixture of dichloromethane and ethanol, mass ratio 87: 13) cellulose acylate solution of (b) (solid content concentration: 10 mass%) was charged into a mixing tank, and the components were dissolved by stirring. The resulting dissolved substance was uniformly cast on a glass support using an applicator (applicator), dried in an oven at 40 ℃ for 10 minutes, and further dried in an oven at 80 ℃ for 10 minutes. After drying, the obtained film was peeled from the glass support to obtain an optical film having a light selective absorption ability (light selective absorption layer (a-1)). The thickness of the optical film after drying was 30 μm.

The resulting light selective absorbing layer (A-1) was cut into a size of 5mm × 30 mm. The long side of the cut light selective absorbing layer (A-1) was oriented in the stretching direction, and the cut light selective absorbing layer was sandwiched between clamps at an interval of 2cm using a dynamic viscoelasticity measuring apparatus "DVA-220" manufactured by IT measurement, manufactured by imperial corporation (アイティー ), and the storage elastic modulus E' at a temperature of 23 ℃ to 200 ℃ was determined with the stretching and shrinking frequency set to 10Hz and the temperature rise rate set to 10 ℃/min. The storage elastic modulus E' at 23 ℃ is 3600 MPa.

The obtained light selective absorbing layer (a-1) was cut into a size of 30mm × 30mm, and fixed to an open-hole metal plate with an adhesive tape to obtain a sample. The absorbance of the sample thus obtained at a wavelength of 300 to 800nm was measured by a spectrophotometer (UV-2450: Shimadzu corporation) at a wavelength of 350 nm. The absorbance at a wavelength of 350nm is 5.0 or more.

Production example 2 production of light-selective absorbing layer (A-2)

A cellulose acylate solution (solid content concentration: 7 mass%) containing cellulose triacetate (degree of substitution of acetyl group: 2.87; Fuji film and Wako pure chemical industries, Ltd. "cellulose triacetate"), Tinuvin 460 (2 parts by mass relative to 100 parts by mass of cellulose triacetate) and a solvent (a mixture of dichloromethane and ethanol, mass ratio: 90: 10) was put into a mixing tank and stirred to dissolve the components. The resulting solution was uniformly cast on a glass support using an applicator, dried in an oven at 40 ℃ for 10 minutes, and then further dried in an oven at 80 ℃ for 10 minutes. After drying, the obtained film was peeled off from the glass support to obtain an optical film having a light selective absorption ability (light selective absorption layer (a-2)). The thickness of the dried optical film was 13 μm.

The resulting light selective absorbing layer (A-2) was cut into a size of 5mm × 30 mm. The long side of the cut light selective absorption layer (A-2) was set to the stretching direction, and a dynamic viscoelasticity measuring apparatus "DVA-220" manufactured by IT measurement, Inc. was used to hold the cut layer at a clamp interval of 2cm, and the storage elastic modulus E' at a temperature of 23 to 200 ℃ was obtained with the stretching and shrinking frequency set to 10Hz and the temperature rise rate set to 10 ℃/min. The storage elastic modulus E' at 23 ℃ was 3500 MPa.

The obtained light selective absorbing layer (a-2) was cut into a size of 30mm × 30mm, fixed to an open-hole metal plate with an adhesive tape, and used as a sample. The absorbance of the sample was measured in the wavelength range of 300 to 800nm using a spectrophotometer (UV-2450: Shimadzu corporation). The absorbance at 350nm was 1.34.

< fabrication of light-selective absorption layer B >

(Synthesis example 4 Synthesis of (meth) acrylic resin

In a reaction vessel equipped with a condenser, a nitrogen inlet tube, a thermometer and a stirrer, a solution obtained by mixing 81.8 parts of ethyl acetate, 70.4 parts of butyl acrylate, 20.0 parts of methyl acrylate, 8.0 parts of 2-phenoxyethyl acrylate, 1.0 part of 2-hydroxyethyl acrylate and 0.6 part of acrylic acid as solvents was charged. The air in the reaction vessel was replaced with nitrogen, and the internal temperature was set to 60 ℃. Then, a solution prepared by dissolving 0.12 part of azobisisobutyronitrile in 10 parts of ethyl acetate was added. After the temperature was maintained for 1 hour, ethyl acetate was continuously added to the reaction vessel at an addition rate of 17.3 parts/hour so that the polymer concentration became approximately 35%, while maintaining the internal temperature at 54 to 56 ℃. After maintaining the internal temperature at 54 to 56 ℃ until 12 hours have elapsed from the start of the addition of ethyl acetate, ethyl acetate was added to adjust the polymer concentration to 20% to obtain an ethyl acetate solution (1) of a (meth) acrylic resin. The (meth) acrylic resin had a weight average molecular weight Mw of 139 ten thousand and a ratio Mw/Mn of the weight average molecular weight Mw to the number average molecular weight Mn of 5.32.

In the measurement of the weight average molecular weight and the number average molecular weight, a total of 5 of 4 "TSK gel XL (manufactured by Tosoh Corp.) and 1" Shodex GPC KF-802 (manufactured by Showa Denko K.K.) were connected in series in a GPC apparatus as a column, tetrahydrofuran was used as an eluent, and the calculation of the weight average molecular weight and the number average molecular weight was carried out by standard polystyrene conversion under conditions of a sample concentration of 5mg/mL, a sample introduction amount of 100. mu.L, a temperature of 40 ℃ and a flow rate of 1 mL/min.

(Synthesis example 5 Synthesis of (meth) acrylic resin adhesive composition (1)

In an ethyl acetate solution (1) (resin concentration: 20%) of the (meth) acrylic resin obtained in synthesis example 4, 0.4 parts of a crosslinking agent, 0.4 parts of a silane compound, and 2 parts of the light selective absorbing compound (1) synthesized in synthesis example 1 were mixed with 100 parts of the solid content of the solution, and ethyl acetate was added so that the solid content concentration became 14%, thereby obtaining an adhesive composition (1). The amount of the crosslinking agent is the mass part as the active ingredient.

The crosslinking agent and the silane compound used in synthesis example 5 are as follows.

A crosslinking agent: an ethyl acetate solution (solid content concentration: 75%) of a trimethylolpropane adduct of tolylene diisocyanate was obtained under the trade name "CORONATE L" from Tosoh corporation.

Silane compound: 3-glycidoxypropyltrimethoxysilane, available under the trade name "KBM 403" from shin-Etsu chemical Co.

Production example 3 production of light-selective absorbing layer (B-1)

The pressure-sensitive adhesive composition (1) prepared in synthesis example 5 was applied to a release-treated surface of a release film containing a polyethylene terephthalate film (trade name "PLR-382190" obtained from linetec corporation) subjected to release treatment so that the thickness after drying was 20 μm using an applicator, and dried at 100 ℃ for 1 minute to prepare a pressure-sensitive adhesive layer (1) (light selective absorbing layer (B-1)).

The resulting pressure-sensitive adhesive layer (1) was laminated to a 23 μm cycloolefin film by a laminator, and then cured for 7 days at a temperature of 23 ℃ and a relative humidity of 65% to obtain an optical film with a pressure-sensitive adhesive. Next, the optical film with the adhesive was cut into a size of 30mm × 30mm, and bonded to alkali-free glass [ trade name "EAGLE XG" manufactured by corning corporation ], to obtain a sample. The absorbance of the obtained sample at a wavelength of 300 to 800nm was measured by a spectrophotometer (UV-2450: Shimadzu corporation). The absorbance at a wavelength of 405nm was 0.94. The absorbance at 405nm of each of the cycloolefin film and the alkali-free glass was almost 0.

Synthesis example 6 Synthesis of (meth) acrylic resin adhesive composition (2)

A (meth) acrylic resin adhesive composition (2) was obtained in the same manner as in synthesis example 5, except that the light selective absorbing compound was replaced with the light selective absorbing compound (2) obtained in synthesis example 2.

Production example 4 production of light-selective absorbing layer (B-2)

An adhesive layer (2) (light selective absorption layer (B-2)) was produced in the same manner as in production example 3, except that the adhesive composition was replaced with the (meth) acrylic resin adhesive composition (2) obtained in synthesis example 6.

The obtained pressure-sensitive adhesive layer (2) was bonded to a 23 μm cycloolefin film by a laminator, and then cured for 7 days at a temperature of 23 ℃ and a relative humidity of 65%, to obtain an optical film with a pressure-sensitive adhesive. Next, the optical film with the adhesive was cut into a size of 30mm × 30mm, and bonded to alkali-free glass [ trade name "EAGLE XG" manufactured by corning corporation ], to obtain a sample. The absorbance of the obtained sample at a wavelength of 300 to 800nm was measured by a spectrophotometer (UV-2450: Shimadzu corporation). The absorbance at a wavelength of 405nm was 0.83. The absorbance at 405nm of each of the cycloolefin film and the alkali-free glass was almost 0.

(Synthesis example 7 Synthesis of (meth) acrylic resin adhesive composition (3)

A (meth) acrylic resin composition (3) was obtained in the same manner as in synthesis example 5, except that the light selective absorbing compound was replaced with the light selective absorbing compound (3) obtained in synthesis example 3.

Production example 5 production of light-selective absorbing layer (B-3)

An adhesive layer (3) (light selective absorption layer (B-3)) was produced in the same manner as in production example 3, except that the adhesive composition was replaced with the (meth) acrylic resin adhesive composition (3) obtained in synthesis example 7.

The obtained pressure-sensitive adhesive layer (3) was bonded to a 23 μm cycloolefin film by a laminator, and then cured for 7 days at a temperature of 23 ℃ and a relative humidity of 65%, to obtain an optical film with a pressure-sensitive adhesive. Next, the optical film with the adhesive was cut into a size of 30mm × 30mm, and bonded to alkali-free glass [ trade name "EAGLE XG" manufactured by corning corporation ], to obtain a sample. The absorbance of the obtained sample at a wavelength of 300 to 800nm was measured by a spectrophotometer (UV-2450: Shimadzu corporation), and the absorbance at a wavelength of 405nm was 1.89. The absorbance at 405nm of each of the cycloolefin film and the alkali-free glass was almost 0.

(example 1): production of optical film (1)

The light selective absorbing layer (a-1) obtained in production example 1 was subjected to corona discharge treatment on one surface thereof, and then was laminated to the light selective absorbing layer (B-1) obtained in production example 3 using a laminator. Then, the mixture was aged at 23 ℃ and 65% relative humidity for 7 days to obtain an optical film (1) comprising a light selective absorbing layer (A-1) and a light selective absorbing layer (B-1).

(example 2): production of optical film (2)

An optical film (2) including the light selective absorption layer (a-1) and the light selective absorption layer (B-2) was obtained in the same manner as in example 1, except that the light selective absorption layer B was replaced with the light selective absorption layer (B-2) obtained in production example 4.

(example 3): production of optical film (3)

An optical film (3) including the light selective absorption layer (a-2) and the light selective absorption layer (B-3) was obtained in the same manner as in example 1, except that the light selective absorption layer a was replaced with the light selective absorption layer (a-2) obtained in production example 2, and the light selective absorption layer B was replaced with the light selective absorption layer (B-3) obtained in production example 5.

(example 4): production of optical film (4)

An optical film (4) including the light selective absorption layer (a-1) and the light selective absorption layer (B-3) was obtained in the same manner as in example 1, except that the light selective absorption layer B was replaced with the light selective absorption layer (B-3) obtained in production example 5.

Comparative example 1

The pressure-sensitive adhesive layer (1) obtained in production example 3 was laminated on a 23 μm cycloolefin film by a laminator, and then cured for 7 days at a temperature of 23 ℃ and a relative humidity of 65%, to obtain an optical film with a pressure-sensitive adhesive.

< measurement of Absorbance of optical film >

The optical film (1) obtained in example 1 was cut into a size of 30mm × 30mm, and the light selective absorption layer (B-1) and alkali-free glass [ trade name "EAGLE XG" manufactured by corning corporation ] were bonded to each other to prepare a sample. The absorbance of the sample was measured in the wavelength range of 300 to 800nm using a spectrophotometer (UV-2450: Shimadzu corporation). The results of absorbance measurements at a wavelength of 350nm, a wavelength of 405nm and a wavelength of 440nm of the optical film (1) are shown in Table 1. The absorbance of the alkali-free glass at a wavelength of 350nm, a wavelength of 405nm, and a wavelength of 440nm was almost 0.

The sample after the absorbance measurement was put into a Sunshine Weather tester (Sunshine Weather Meter) (manufactured by Suga tester Co., Ltd.) for 24 hours under the conditions of 63 ℃ and 50% humidity, and a Weather resistance test was performed for 24 hours. The absorbance of the sample taken out was measured in the same manner as above. From the measured absorbance, the absorbance retention of the sample at 350nm and 405nm was determined based on the following formula. The results are shown in Table 1. The higher the absorbance retention, the less the light selective absorption function is deteriorated, and the better weather resistance is exhibited.

Absorbance retention rate (a (405) after durability test/a (405) before durability test) x 100

Absorbance retention ratio (a (350) after durability test)/a (350) before durability test) x 100

The same evaluation was performed using the optical film (2), the optical film (3), the optical film (4) and the film with a pressure-sensitive adhesive layer obtained in comparative example 1, respectively, instead of the optical film (1). The results are shown in Table 1.

[ Table 1]

The optical film of the present invention has a good light absorption function at a wavelength of about 350nm and a good light absorption function at a wavelength of about 405 nm. Therefore, when the optical film of the present invention is laminated on a retardation film or an organic EL element, both ultraviolet light and short-wavelength visible light can be blocked, and thus the optical film has a function of suppressing deterioration of the retardation film or the organic EL element. The optical film of the present invention has good light absorption function at a wavelength of around 350nm and good light absorption function at a wavelength of around 405nm even after a weather resistance test, and has good weather resistance (durability). The optical film of the present invention has low light absorption performance at a wavelength around 440nm, and can exhibit a good color without impairing light emission of a liquid crystal display device.

Industrial applicability

The optical film of the present invention can be suitably used for a liquid crystal panel and a liquid crystal display device.

Description of the symbols

10. 10A, 10B, 10C optical laminate

1 light selective absorption layer A

2 light selective absorption layer B

5 adhesive layer

6 liquid crystal cell

7. 60 adhesive layer

7a adhesive layer

8 protective film

9 polarizing film

30 liquid crystal cell

40 optical film

50. 50a 1/4 wavelength phase difference layer

60 adhesive layer

701/2 wavelength phase difference layer

80 positive C layer

Claims

1. An optical film comprising a light selective absorbing layer A satisfying the following formula (1) and a light selective absorbing layer B satisfying the following formula (2),

A(350)≥0.5 (1)

A(405)≥0.5 (2)

in the formula (1), A (350) represents the absorbance at a wavelength of 350nm,

in the formula (2), A (405) represents the absorbance at a wavelength of 405nm,

the light selective absorption layer a and the light selective absorption layer B are each composed of only a single layer,

the light selective absorbing layer a contains a light selective absorbing compound B1,

the light selective absorbing layer B contains a light selective absorbing compound c,

the light selective absorbing compound B1 is an ultraviolet absorber,

the light selective absorbing compound c is a compound that selectively absorbs light having a wavelength of 405nm,

the optical film further satisfies the following formula (3),

A(440)≤0.1 (3)

in the formula (3), A (440) represents the absorbance at a wavelength of 440 nm.

2. An optical film comprising a light selective absorbing layer A satisfying the following formula (1) and a light selective absorbing layer B satisfying the following formula (2),

A(350)≥0.5 (1)

A(405)≥0.5 (2)

in the formula (1), A (350) represents the absorbance at a wavelength of 350nm,

in the formula (2), A (405) represents the absorbance at a wavelength of 405nm,

the light selective absorbing layer a and the light selective absorbing layer B are each a single layer,

the thickness of the light selective absorption layer A is 10-50 μm,

the optical film also satisfies the following formula (3),

A(440)≤0.1 (3)

3. The optical film according to claim 1 or 2, which further satisfies the following formula (4),

A(405)/A(440)≥5 (4)

in the formula (4), A (405) represents the absorbance at a wavelength of 405nm, and A (440) represents the absorbance at a wavelength of 440 nm.

4. The optical film according to claim 1 or 2,

the light selective absorbing layer a is a layer formed of a resin composition containing a resin a1 and a light selective absorbing compound B1,

the resin a1 is at least 1 resin selected from the group consisting of a cellulose-based resin, (meth) acrylic resin, polyester-based resin, polyamide-based resin, polyimide-based resin, and cycloolefin-based resin.

5. The optical film according to claim 4,

the content of the light selective absorbing compound B1 is 0.01 to 20 parts by mass per 100 parts by mass of the resin a 1.

6. The optical film according to any one of claims 1, 2 and 5,

the light selective absorption layer B is an adhesive layer having a light selective absorption function.

7. The optical film according to claim 6,

the light selective absorption layer B is an adhesive layer formed from an adhesive composition containing a (meth) acrylic resin a, a crosslinking agent B, and a light selective absorption compound c.

8. The optical film according to claim 7,

the content of the crosslinking agent b is 0.01 to 15 parts by mass per 100 parts by mass of the (meth) acrylic resin a.

9. The optical film according to claim 7 or 8,

the content of the light selective absorbing compound c is 0.01 to 20 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin a.

10. The optical film according to claim 7 or 8,

the light selective absorption compound c is a compound satisfying the formula (5),

ε(405)≥20 (5)

in the formula (5),. epsilon. (. 405) represents the gram absorptivity of the compound at a wavelength of 405nm, and the unit of the gram absorptivity is L/(g.cm).

11. The optical film according to claim 7 or 8,

the light selective absorbing compound c is a compound satisfying the formula (6),

ε(405)/ε(440)≥20 (6)

in the formula (6), ε (405) represents the gram-absorptivity of the compound at a wavelength of 405nm, and ε (440) represents the gram-absorptivity at a wavelength of 440 nm.

12. The optical film according to claim 7 or 8,

the light selective absorbing compound c is a compound having a merocyanine structure in the molecule.

13. A display device comprising the optical film according to any one of claims 1 to 12.