WO2018225522A1 - Liquid crystal compound, and composition thereof - Google Patents
Liquid crystal compound, and composition thereof Download PDFInfo
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- WO2018225522A1 WO2018225522A1 PCT/JP2018/019966 JP2018019966W WO2018225522A1 WO 2018225522 A1 WO2018225522 A1 WO 2018225522A1 JP 2018019966 W JP2018019966 W JP 2018019966W WO 2018225522 A1 WO2018225522 A1 WO 2018225522A1
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- general formula
- group
- compound represented
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 188
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 72
- 239000000203 mixture Substances 0.000 title claims abstract description 51
- 238000006243 chemical reaction Methods 0.000 claims abstract description 104
- 239000003054 catalyst Substances 0.000 claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 15
- 150000003624 transition metals Chemical class 0.000 claims abstract description 15
- 150000001450 anions Chemical class 0.000 claims abstract description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 119
- 125000000217 alkyl group Chemical group 0.000 claims description 56
- 125000003342 alkenyl group Chemical group 0.000 claims description 52
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 48
- 229910052731 fluorine Inorganic materials 0.000 claims description 35
- 125000001153 fluoro group Chemical group F* 0.000 claims description 35
- -1 naphthalene-2,6-diyl group Chemical group 0.000 claims description 32
- 125000003545 alkoxy group Chemical group 0.000 claims description 28
- 229910052801 chlorine Inorganic materials 0.000 claims description 24
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 23
- 239000003153 chemical reaction reagent Substances 0.000 claims description 23
- 125000002524 organometallic group Chemical group 0.000 claims description 23
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 22
- 229910052740 iodine Inorganic materials 0.000 claims description 22
- 230000005595 deprotonation Effects 0.000 claims description 21
- 238000010537 deprotonation reaction Methods 0.000 claims description 21
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 16
- 125000003302 alkenyloxy group Chemical group 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 125000004429 atom Chemical group 0.000 claims description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 239000011630 iodine Substances 0.000 claims description 5
- 125000005948 methanesulfonyloxy group Chemical group 0.000 claims description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 claims description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 claims description 3
- 150000001721 carbon Chemical group 0.000 claims description 3
- 238000007259 addition reaction Methods 0.000 claims description 2
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 claims description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 2
- 230000001747 exhibiting effect Effects 0.000 abstract description 4
- 230000001939 inductive effect Effects 0.000 abstract 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 94
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 69
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 63
- 239000002904 solvent Substances 0.000 description 62
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 60
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 51
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 46
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 36
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 36
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 34
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 32
- 239000004210 ether based solvent Substances 0.000 description 31
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 30
- 239000002585 base Substances 0.000 description 29
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 28
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 28
- 239000000243 solution Substances 0.000 description 25
- 229910052751 metal Inorganic materials 0.000 description 23
- 239000002184 metal Substances 0.000 description 23
- 239000004215 Carbon black (E152) Substances 0.000 description 22
- 238000013213 extrapolation Methods 0.000 description 22
- 229930195733 hydrocarbon Natural products 0.000 description 22
- 150000002430 hydrocarbons Chemical class 0.000 description 22
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 22
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 22
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 21
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 20
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 16
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 16
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 15
- 239000007810 chemical reaction solvent Substances 0.000 description 15
- 239000012071 phase Substances 0.000 description 15
- 229910000318 alkali metal phosphate Inorganic materials 0.000 description 13
- 239000003849 aromatic solvent Substances 0.000 description 13
- 239000002798 polar solvent Substances 0.000 description 13
- NHDIQVFFNDKAQU-UHFFFAOYSA-N tripropan-2-yl borate Chemical compound CC(C)OB(OC(C)C)OC(C)C NHDIQVFFNDKAQU-UHFFFAOYSA-N 0.000 description 13
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- 229910052783 alkali metal Inorganic materials 0.000 description 12
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 12
- 150000008041 alkali metal carbonates Chemical class 0.000 description 12
- 229910000102 alkali metal hydride Inorganic materials 0.000 description 12
- 150000008046 alkali metal hydrides Chemical class 0.000 description 12
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 12
- 229910000024 caesium carbonate Inorganic materials 0.000 description 12
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 11
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 11
- 229910000027 potassium carbonate Inorganic materials 0.000 description 11
- 235000011181 potassium carbonates Nutrition 0.000 description 11
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 11
- 235000019798 tripotassium phosphate Nutrition 0.000 description 11
- 239000008096 xylene Substances 0.000 description 11
- VDFVNEFVBPFDSB-UHFFFAOYSA-N 1,3-dioxane Chemical compound C1COCOC1 VDFVNEFVBPFDSB-UHFFFAOYSA-N 0.000 description 10
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 10
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 10
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 10
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 10
- 239000012044 organic layer Substances 0.000 description 10
- 239000007800 oxidant agent Substances 0.000 description 10
- 125000004430 oxygen atom Chemical group O* 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 9
- 0 CC(C)(*)OC(C)(C)c(ccc1c2[o]c3c1ccc(C(C)(C)OC(C)(C)I)c3F)c2F Chemical compound CC(C)(*)OC(C)(C)c(ccc1c2[o]c3c1ccc(C(C)(C)OC(C)(C)I)c3F)c2F 0.000 description 9
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 9
- 239000000460 chlorine Substances 0.000 description 9
- 229910052744 lithium Inorganic materials 0.000 description 9
- 239000012299 nitrogen atmosphere Substances 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 9
- 229910019142 PO4 Inorganic materials 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 8
- 235000021317 phosphate Nutrition 0.000 description 8
- 229910000029 sodium carbonate Inorganic materials 0.000 description 8
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 8
- KZPYGQFFRCFCPP-UHFFFAOYSA-N 1,1'-bis(diphenylphosphino)ferrocene Chemical compound [Fe+2].C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1 KZPYGQFFRCFCPP-UHFFFAOYSA-N 0.000 description 7
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 239000005456 alcohol based solvent Substances 0.000 description 7
- 150000001340 alkali metals Chemical class 0.000 description 7
- 150000001408 amides Chemical class 0.000 description 7
- 150000001639 boron compounds Chemical class 0.000 description 7
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 7
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 7
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 125000005407 trans-1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])[C@]([H])([*:2])C([H])([H])C([H])([H])[C@@]1([H])[*:1] 0.000 description 7
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 6
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 230000000996 additive effect Effects 0.000 description 6
- YNHIGQDRGKUECZ-UHFFFAOYSA-N dichloropalladium;triphenylphosphanium Chemical compound Cl[Pd]Cl.C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 YNHIGQDRGKUECZ-UHFFFAOYSA-N 0.000 description 6
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 6
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- DVSDBMFJEQPWNO-UHFFFAOYSA-N methyllithium Chemical compound C[Li] DVSDBMFJEQPWNO-UHFFFAOYSA-N 0.000 description 6
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 6
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 6
- 239000012312 sodium hydride Substances 0.000 description 6
- 229910000104 sodium hydride Inorganic materials 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- SYJZEJPJEIECHN-UHFFFAOYSA-N CC(C)(C)P(C(C)(C)C)C(C=C1)=CC=C1N(C)C.CC(C)(C)P(C(C)(C)C)C(C=C1)=CC=C1N(C)C.Cl.Cl Chemical compound CC(C)(C)P(C(C)(C)C)C(C=C1)=CC=C1N(C)C.CC(C)(C)P(C(C)(C)C)C(C=C1)=CC=C1N(C)C.Cl.Cl SYJZEJPJEIECHN-UHFFFAOYSA-N 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 5
- 239000003446 ligand Substances 0.000 description 5
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical group C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 5
- LXNAVEXFUKBNMK-UHFFFAOYSA-N palladium(II) acetate Substances [Pd].CC(O)=O.CC(O)=O LXNAVEXFUKBNMK-UHFFFAOYSA-N 0.000 description 5
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 5
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 5
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 5
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 4
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 239000004988 Nematic liquid crystal Substances 0.000 description 4
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 4
- 150000007942 carboxylates Chemical class 0.000 description 4
- NXQGGXCHGDYOHB-UHFFFAOYSA-L cyclopenta-1,4-dien-1-yl(diphenyl)phosphane;dichloropalladium;iron(2+) Chemical compound [Fe+2].Cl[Pd]Cl.[CH-]1C=CC(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1.[CH-]1C=CC(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 NXQGGXCHGDYOHB-UHFFFAOYSA-L 0.000 description 4
- 229940117389 dichlorobenzene Drugs 0.000 description 4
- 238000007710 freezing Methods 0.000 description 4
- 230000008014 freezing Effects 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 229910000103 lithium hydride Inorganic materials 0.000 description 4
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 4
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 229910052987 metal hydride Inorganic materials 0.000 description 4
- 150000004681 metal hydrides Chemical class 0.000 description 4
- 229910000000 metal hydroxide Inorganic materials 0.000 description 4
- 150000004692 metal hydroxides Chemical class 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 4
- 235000019796 monopotassium phosphate Nutrition 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 description 4
- 229940031826 phenolate Drugs 0.000 description 4
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 4
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 4
- 235000015497 potassium bicarbonate Nutrition 0.000 description 4
- 239000011736 potassium bicarbonate Substances 0.000 description 4
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 4
- 229910000105 potassium hydride Inorganic materials 0.000 description 4
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 4
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 235000017550 sodium carbonate Nutrition 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- 125000005449 2-fluoro-1,4-phenylene group Chemical group [H]C1=C([*:2])C([H])=C(F)C([*:1])=C1[H] 0.000 description 3
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 125000004956 cyclohexylene group Chemical group 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 229910001463 metal phosphate Inorganic materials 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 description 3
- LTEHWCSSIHAVOQ-UHFFFAOYSA-N tripropyl borate Chemical compound CCCOB(OCCC)OCCC LTEHWCSSIHAVOQ-UHFFFAOYSA-N 0.000 description 3
- 125000005714 2,5- (1,3-dioxanylene) group Chemical group [H]C1([H])OC([H])([*:1])OC([H])([H])C1([H])[*:2] 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 2
- 125000005451 3-fluoro-1,4-phenylene group Chemical group [H]C1=C([*:1])C([H])=C(F)C([*:2])=C1[H] 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- YNHIGQDRGKUECZ-UHFFFAOYSA-L PdCl2(PPh3)2 Substances [Cl-].[Cl-].[Pd+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 YNHIGQDRGKUECZ-UHFFFAOYSA-L 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000004990 Smectic liquid crystal Substances 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000005725 cyclohexenylene group Chemical group 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000010511 deprotection reaction Methods 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- 229940043279 diisopropylamine Drugs 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000003759 ester based solvent Substances 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- 230000026030 halogenation Effects 0.000 description 2
- 238000005658 halogenation reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- NCPHGZWGGANCAY-UHFFFAOYSA-N methane;ruthenium Chemical compound C.[Ru] NCPHGZWGGANCAY-UHFFFAOYSA-N 0.000 description 2
- 239000002480 mineral oil Substances 0.000 description 2
- 235000010446 mineral oil Nutrition 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910003446 platinum oxide Inorganic materials 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 238000010898 silica gel chromatography Methods 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- CYPYTURSJDMMMP-WVCUSYJESA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].[Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 CYPYTURSJDMMMP-WVCUSYJESA-N 0.000 description 1
- AGJAUFUNZWHLKE-UHFFFAOYSA-N (2E,4E)-N-isobutyl-2,4-tetradecadienamide Natural products CCCCCCCCCC=CC=CC(=O)NCC(C)C AGJAUFUNZWHLKE-UHFFFAOYSA-N 0.000 description 1
- IDIQAVWEIFSEBU-UHFFFAOYSA-L 1-diphenylphosphanylpropan-2-yl(diphenyl)phosphane;nickel(2+);dichloride Chemical compound Cl[Ni]Cl.C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)CP(C=1C=CC=CC=1)C1=CC=CC=C1 IDIQAVWEIFSEBU-UHFFFAOYSA-L 0.000 description 1
- IBXNCJKFFQIKKY-UHFFFAOYSA-N 1-pentyne Chemical compound CCCC#C IBXNCJKFFQIKKY-UHFFFAOYSA-N 0.000 description 1
- 125000005450 2,3-difluoro-1,4-phenylene group Chemical group [H]C1=C([*:2])C(F)=C(F)C([*:1])=C1[H] 0.000 description 1
- QIAQIYQASAWZPP-UHFFFAOYSA-N 2-chloro-6-fluorophenol Chemical compound OC1=C(F)C=CC=C1Cl QIAQIYQASAWZPP-UHFFFAOYSA-N 0.000 description 1
- JTNCEQNHURODLX-UHFFFAOYSA-N 2-phenylethanimidamide Chemical compound NC(=N)CC1=CC=CC=C1 JTNCEQNHURODLX-UHFFFAOYSA-N 0.000 description 1
- PQQCEIMCLFXJLN-UHFFFAOYSA-N 4-butylphosphanyl-n,n-dimethylaniline Chemical group CCCCPC1=CC=C(N(C)C)C=C1 PQQCEIMCLFXJLN-UHFFFAOYSA-N 0.000 description 1
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- XJUZRXYOEPSWMB-UHFFFAOYSA-N Chloromethyl methyl ether Chemical compound COCCl XJUZRXYOEPSWMB-UHFFFAOYSA-N 0.000 description 1
- 239000004986 Cholesteric liquid crystals (ChLC) Substances 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZEEBGORNQSEQBE-UHFFFAOYSA-N [2-(3-phenylphenoxy)-6-(trifluoromethyl)pyridin-4-yl]methanamine Chemical compound C1(=CC(=CC=C1)OC1=NC(=CC(=C1)CN)C(F)(F)F)C1=CC=CC=C1 ZEEBGORNQSEQBE-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000005271 boronizing Methods 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229940061627 chloromethyl methyl ether Drugs 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical group C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008774 maternal effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- KFIGICHILYTCJF-UHFFFAOYSA-N n'-methylethane-1,2-diamine Chemical compound CNCCN KFIGICHILYTCJF-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ZBRJXVVKPBZPAN-UHFFFAOYSA-L nickel(2+);triphenylphosphane;dichloride Chemical compound [Cl-].[Cl-].[Ni+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 ZBRJXVVKPBZPAN-UHFFFAOYSA-L 0.000 description 1
- RGOVYLWUIBMPGK-UHFFFAOYSA-N nonivamide Chemical compound CCCCCCCCC(=O)NCC1=CC=C(O)C(OC)=C1 RGOVYLWUIBMPGK-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- GRGCWBWNLSTIEN-UHFFFAOYSA-N trifluoromethanesulfonyl chloride Chemical compound FC(F)(F)S(Cl)(=O)=O GRGCWBWNLSTIEN-UHFFFAOYSA-N 0.000 description 1
- UCPYLLCMEDAXFR-UHFFFAOYSA-N triphosgene Chemical compound ClC(Cl)(Cl)OC(=O)OC(Cl)(Cl)Cl UCPYLLCMEDAXFR-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
- C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
- C07D493/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/34—Non-steroidal liquid crystal compounds containing at least one heterocyclic ring
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
Definitions
- the present invention relates to a compound having a condensed ring that is useful as an organic electronic material, medical pesticide, or a liquid crystal display element material, and a liquid crystal composition using these compounds.
- Liquid crystal display elements are used in various measuring instruments, automobile panels, word processors, electronic notebooks, printers, computers, televisions, clocks, advertisement display boards, etc., including watches and calculators.
- Typical liquid crystal display methods include TN (twisted nematic) type, STN (super twisted nematic) type, vertical alignment type using TFT (thin film transistor), and IPS (in-plane switching) type.
- There is a drive system such as.
- the liquid crystal compositions used in these liquid crystal display elements are stable against external factors such as moisture, air, heat, and light, and the liquid crystal phase (nematic phase, smectic phase) in the widest possible temperature range centering on room temperature. Phase, blue phase, etc.), low viscosity, and low driving voltage.
- the liquid crystal composition is selected from several to several tens of kinds of compounds in order to optimize the dielectric anisotropy ( ⁇ ) and the refractive index anisotropy ( ⁇ n) according to the individual display elements, It
- the liquid crystal composition When the liquid crystal composition is used as a display element or the like, it is required to exhibit a stable nematic phase in a wide temperature range. In order to maintain a nematic phase in a wide temperature range, it is required that individual components constituting the liquid crystal composition have high miscibility with other components and have a high clearing point (T ni ). . Moreover, when using a liquid crystal composition as a display element etc., it is calculated
- R 1 and R 2 each independently represents an alkyl group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or an alkynyl group having 2 to 15 carbon atoms, Each independently represents 0 or 1)
- the problem to be solved by the present invention is to provide a compound having a high T ni and having a large ⁇ , and a liquid crystal composition and a liquid crystal display device comprising the compound as a constituent member.
- the present invention has the general formula (i)
- X i1 and X i2 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a trifluoromethoxy group
- Y i1 and Y i2 each independently represent —O—, —S—, —SO—, —SOO—, —CF 2 —, —CO—, —CX i3 X i4 —, wherein Y i1 and Y any one or more of i2 represents —O—, —S—, —SO—, —SOO—;
- X i3 and X i4 each independently represent the same meaning as X i1 , W i1
- W i2 represents a single bond or —CL i9 L i10 —
- L i1 , L i2 , L i3 , L i4 , L i5 , L i6 , L i7 , L i8 , L i9 and L i10 are each independently a hydrogen atom, bromine atom, iodine atom, hydroxyl group, carbon number 1 To 15 alkyl groups, alkenyl groups of 2 to 15 carbon atoms, or
- R i1 represents a hydrogen atom, a bromine atom, an iodine atom, a hydroxyl group, an alkyl group having 1 to 15 carbon atoms, an alkoxy group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or carbon. Represents an alkenyloxy group having 2 to 15 atoms
- a i1 represents (a) a 1,4-cyclohexylene group (one —CH 2 — present in this group or two or more non-adjacent —CH 2 — represents —O— or —S—).
- (B) 1,4-phenylene group (one —CH ⁇ present in this group or two or more non-adjacent —CH ⁇ may be replaced by —N ⁇ , present in this group)
- One hydrogen atom may be substituted with a fluorine atom.
- a hydrogen atom present in these groups may be substituted with a fluorine atom, or present in a naphthalene-2,6-diyl group or a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group.
- n i1 represents 1 or 2, but when n i1 represents 2 and a plurality of A i1 and Z i1 exist, they may be the same or different.
- the compound represented by the general formula (i) provided by the present invention has a high clearing point (T ni ). Therefore, a stable nematic phase can be exhibited in a wide temperature range by using the compound represented by the general formula (i) as a component of the liquid crystal composition.
- the compound represented by the general formula (i) provided by the present invention exhibits a large
- X i1 and X i2 each independently preferably represent a fluorine atom, and in order to exhibit a more negative ⁇ , it is more preferable that both X i1 and X i2 represent a fluorine atom.
- Y i1 and Y i2 each independently preferably represent an oxygen atom or a sulfur atom, and it is more preferable that both Y i1 and Y i2 represent an oxygen atom or a sulfur atom in order to exhibit a more negative ⁇ .
- both are preferably oxygen atoms.
- Y i2 is -CH 2 - - either Y i1 and Y i2 is -CH 2 in the case of emphasizing gamma 1 and more preferably from.
- both are preferably sulfur atoms.
- W i2 preferably represents a single bond or —CH 2 CH 2 —.
- L i1 and L i2 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms.
- An alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is particularly preferable.
- L i1 and L i2 are preferably different, and the alkoxy group or alkenyloxy group is preferably one of L i1 and L i2 , Is particularly preferably L i1 .
- the hydrogen atom present in L i1 and L i2 may be substituted with a fluorine atom, but is preferably not substituted with a fluorine atom.
- R i1 is preferably an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms in order to reduce ⁇ 1, and an alkyl group having 1 to 5 carbon atoms or the number of carbon atoms Particularly preferred are 2 to 5 alkenyl groups. Moreover, it is preferable that it is linear. In order to increase
- R i1s are different from each other, and any one of R i1s having a plurality of alkoxy groups or alkenyloxy groups exists.
- the alkoxy group or alkenyloxy group is particularly preferably R i1 in L i1 .
- the hydrogen atom present in R i1 may be substituted with a fluorine atom, but is preferably not substituted with a fluorine atom.
- a 1 is a trans-1,4-cyclohexylene group, an unsubstituted 1,4-phenylene group, a 2-fluoro-1,4-phenylene group, or a 3-fluoro group for decreasing ⁇ 1.
- a 1,4-phenylene group is preferred, and a trans-1,4-cyclohexylene group is particularly preferred.
- it may be a trans-1,4-cyclohexylene group, a 2-fluoro-1,4-phenylene group or a 3-fluoro-1,4-phenylene group. preferable.
- an unsubstituted 1,4-phenylene group, an unsubstituted 1,4-cyclohexylene group, a 1,4-cyclohexenylene group, or an unsubstituted naphthalene-2,6-diyl group It is preferable that In order to exhibit negatively large ⁇ , a 2-fluoro-1,4-phenylene group, a 3-fluoro-1,4-phenylene group, or a 2,3-difluoro-1,4-phenylene group is preferable.
- the total number of fluorine atoms present in A i1 is preferably 1 to 4, preferably 1 to 3. It is particularly preferred.
- Z i1 is preferably a single bond, —CH 2 CH 2 —, —CH 2 O— or —OCH 2 —, and preferably a single bond or —CH 2 CH 2 — in order to decrease ⁇ 1. Is more preferable.
- a single bond, —COO—, —OCO—, —CH ⁇ CH— or —C ⁇ C— is preferable, and a single bond, —CH ⁇ CH— or —C ⁇ C— -Is more preferable.
- a single bond, —CH 2 CH 2 —, —CH 2 O— or —OCH 2 — is preferable.
- a single bond is preferable.
- n i1 When n i1 represents 2, it is preferable that any one or more of a plurality of Z i1 represent a single bond. n i1 is preferably 1 when ⁇ 1 is important. When importance is attached to Tni , it is preferably 2.
- L i3 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, an alkoxy group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or an alkenyloxy group having 2 to 15 carbon atoms.
- an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms is preferable.
- Particularly preferred is an alkenyl group of ⁇ 5. Moreover, it is preferable that it is linear.
- L i1 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms
- L i3 is
- L i4 and L i5 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms, and more preferably a hydrogen atom.
- L i6 and L i7 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms.
- An alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is particularly preferable.
- L i8 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, an alkoxy group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or an alkenyloxy group having 2 to 15 carbon atoms.
- an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms is preferable.
- Particularly preferred is an alkenyl group of ⁇ 5. Moreover, it is preferable that it is linear.
- L i2 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms
- L i8 is
- L i9 and L i10 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms, and more preferably a hydrogen atom.
- the number of the groups is preferably 2 or less in order to increase the miscibility with other liquid crystal components.
- it is preferably present at the positions of L i1 and L i2 , L i1 and L i8 , L i3 and L i2 , or L i3 and L i8.
- two groups exist in the general formula (i) it is preferably present at the positions of L i1 and L i2 .
- it does not become a structure where hetero atoms are directly bonded.
- compounds represented by the following general formulas (i-1) to (i-946) are preferable.
- particularly preferred compounds are (i-1), (i-2), (i-3), (i-4), (i-5), (i-6), (i-7), (I-8), (i-9), (i-10), (i-11), (i-12).
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- R i1 and R i2 are the general formula (i) represents the same meaning as R i1.
- the compound represented by the general formula (i) is, for example, the general formula (i-r1)
- X i2 , Y i2 , W i1 , L i2 and L i5 represent the same meaning as X i2 , Y i2 , W i1 , L i2 and L i5 in general formula (i), respectively, but a plurality of X i2 may be different even in the same
- R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
- a broken line indicates that a bond may not exist or may exist.
- X i1 , Y i1 , L i1 , L i3 , L i4 and W i2 represent the same meanings as X i1 , Y i1 , L i1 , L i3 , L i4 and W i2 in general formula (i), respectively.
- X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, or a trifluoromethanesulfonyloxy group.
- X i1 , X i2 , Y i1 , Y i2 , W i1 , W i2 , L i1 , L i2 , L i3 , L i4 and L i5 are X i1 , X i2 , Y i1 in the general formula (i)).
- Y i2 , W i1 , W i2 , L i1 , L i2 , L i3 , L i4 and L i5 each represent the same meaning, but a plurality of X i2 may be the same or different
- a broken line indicates that a bond may not exist or may exist.
- L i2 are as defined L i2 in the general formula (i).
- a compound represented by general formula (ir-7) Is reacted with a compound represented by general formula (ir-7) in the presence of a transition metal catalyst, a copper catalyst and a base.
- L i1 , L i2 , X i1 and X i2 represent the same meaning as L i1 , L i2 , X i1 and X i2 in the general formula (i)
- R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
- L i11 represents the same meaning as L i1
- X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, a trifluoromethanesulf
- a compound represented by general formula (S-3) is obtained by reacting a compound represented by general formula (S-1) with a compound represented by (S-2) in the presence of a transition metal catalyst and a base. Can do. Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably.
- the reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred. Further, water may be used as necessary in order to allow the reaction to proceed appropriately.
- ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether
- alcohol solvents such as methanol, ethanol and propanol
- Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred.
- water may be used as necessary in order to allow the reaction to proceed
- Any base can be used as long as it allows the reaction to proceed suitably.
- Carbonates such as potassium carbonate, sodium carbonate and cesium carbonate; phosphates such as tripotassium phosphate and potassium dihydrogen phosphate; Are preferable, and potassium carbonate, cesium carbonate, and tripotassium phosphate are more preferable.
- the reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
- the compound represented by the general formula (S-4) can be obtained by intramolecular reaction of the compound represented by the general formula (S-3). This intramolecular reaction can be performed by deprotonating —Y i3 —H of the general formula (S-3) with a base to generate an anion.
- Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred.
- Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
- reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether
- chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride.
- hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane
- examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene
- examples of polar solvents include N, N-dimethylformamide
- Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane.
- ether solvents such as tetrahydrofuran and diethyl ether
- polar solvents such as N, N-dimethylformamide are more preferable.
- each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
- the reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 30 ° C to 120 ° C.
- the compound represented by the general formula (S-5) can be obtained by oxidizing the compound represented by the general formula (S-4). This oxidation can be carried out by deprotonation with an organometallic reagent, reaction with a trialkyl borate to form a boron compound, and subsequent action of an oxidizing agent.
- Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
- hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
- organometallic reagent examples include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramerpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable.
- a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent.
- the reaction temperature for deprotonation is preferably from ⁇ 100 ° C. to ⁇ 20 ° C., more preferably from ⁇ 78 ° C. to ⁇ 40 ° C.
- trialkyl borate trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling.
- combination of trialkyl borate and organometallic reagent any of the above-mentioned combinations are possible, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred.
- the reaction temperature during boriding is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C.
- the obtained boron compound may be isolated once or may be reacted with an oxidizing agent without isolation. Further, the obtained boron compound may be hydrolyzed and converted into a boric acid compound and then reacted with an oxidizing agent.
- the oxidizing agent it is preferable to use hydrogen peroxide, peracetic acid or performic acid.
- the reaction temperature is preferably -78 ° C to 70 ° C, more preferably 0 ° C to 50 ° C.
- water may be contained in the solvent at the time of reaction with an oxidizing agent.
- the compound represented by the general formula (S-7) can be obtained by reacting the hydroxyl group of the general formula (S-5) with the base as a phenolate with the general formula (S-6).
- Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred.
- Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
- Any reaction solvent may be used as long as it allows the reaction to proceed suitably.
- Ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether, and examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride.
- hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane
- examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene
- examples of polar solvents include N, N-dimethylformamide
- Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane.
- ether solvents such as tetrahydrofuran and diethyl ether
- polar solvents such as N, N-dimethylformamide are more preferable.
- each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
- the reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C.
- the generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
- the compound represented by the general formula (S-8) can be obtained by halogenating the compound represented by the general formula (S-7). This halogenation can be performed by deprotonation with an organometallic reagent and then reacting with bromine or iodine to form a halogen compound.
- reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
- hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
- organometallic reagents examples include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide.
- N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable.
- a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent.
- the reaction temperature for deprotonation is preferably from ⁇ 100 ° C. to ⁇ 20 ° C., more preferably from ⁇ 78 ° C. to ⁇ 40 ° C.
- a compound represented by general formula (S-10) by reacting a compound represented by general formula (S-8) with a compound represented by (S-9) in the presence of a transition metal catalyst, a copper catalyst and a base. Can be obtained. Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably.
- phosphine-type ligands such as a triphenylphosphine
- Any copper catalyst may be used as long as it allows the reaction to proceed suitably, but copper (I) chloride, copper (I) bromide, copper iodide (I), copper acetate (I), etc.
- a monovalent copper catalyst is preferred, and copper (I) iodide is more preferred.
- the reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene, polar solvents such as N, N-dimethylformamide, N-methylpyrrolidone, dimethyl sulfoxide and sulfolane are preferred, and tetrahydrofuran, ethanol, toluene and N, N-dimethylformamide are more preferred. . Further, water may be used as necessary in order to allow the reaction to proceed appropriately.
- ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether
- alcohol solvents such as methanol, ethanol and propanol
- Aromatic solvents such as benzene
- the reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
- the compound represented by the general formula (S-11) can be obtained by simultaneously performing deprotection with an acid and intramolecular reaction in the presence of water in the compound represented by the general formula (S-10).
- Any acid can be used as long as it allows the reaction to proceed suitably, but inorganic acids such as hydrochloric acid and sulfuric acid, sulfonic acids such as p-toluenesulfonic acid, and the like are preferable, and hydrochloric acid is more preferable.
- inorganic acids such as hydrochloric acid and sulfuric acid, sulfonic acids such as p-toluenesulfonic acid, and the like are preferable, and hydrochloric acid is more preferable.
- any solvent can be used as long as it allows the reaction to proceed suitably, but water-soluble solvents such as tetrahydrofuran, ethanol, methanol, isopropyl alcohol and the like are preferable.
- the reaction temperature may be any temperature that allows the reaction to proceed suitably, but a temperature from room temperature to the boiling point of the solvent is preferred.
- the compound represented by the general formula (S-12) can be obtained by reacting the compound represented by the general formula (S-11) with hydrogen gas in the presence of a metal catalyst in an organic solvent.
- Any organic solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents such as diisopropyl ether, diethyl ether, 1,4-dioxane or tetrahydrofuran, hexane, heptane, toluene or xylene, etc.
- Hydrocarbon solvents, alcohol solvents such as methanol, ethanol, propanol, isopropyl alcohol or butanol, and ester solvents such as ethyl acetate or butyl acetate are preferred, and tetrahydrofuran, hexane, heptane, toluene, ethanol or ethyl acetate are preferred.
- acids such as hydrochloric acid, acetic acid, or a sulfuric acid, as needed.
- the reaction temperature may be any temperature that allows the reaction to proceed suitably, but is preferably 0 ° C. to 80 ° C., more preferably room temperature to 60 ° C.
- the metal catalyst to be used may be any metal catalyst that allows the reaction to proceed suitably, but is preferably palladium carbon, ruthenium carbon, platinum black or platinum oxide, and more preferably palladium carbon.
- the hydrogen pressure at the time of reaction may be any as long as it allows the reaction to proceed suitably, but is preferably from atmospheric pressure to 0.5 MPa, and more preferably from 0.2 MPa to 0.5 MPa.
- R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
- X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, a trifluoromethanesul
- the compound represented by the general formula (S-14) can be obtained by boronizing the compound represented by the general formula (S-13). This boronation can be performed by deprotonation with an organometallic reagent and then reacting with a trialkyl borate to form a boron compound.
- Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
- hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
- organometallic reagents examples include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide.
- N-Butyllithium, sec-butyllithium and lithium diisopropylamide are preferred from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide capable of efficient deprotonation are more preferred.
- a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent.
- the reaction temperature for deprotonation is preferably from ⁇ 100 ° C. to ⁇ 20 ° C., more preferably from ⁇ 78 ° C. to ⁇ 40 ° C.
- trialkyl borate trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling.
- combination of trialkyl borate and organometallic reagent any of the above-mentioned combinations are possible, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred.
- the reaction temperature during boriding is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C.
- a compound represented by general formula (S-16) is obtained by reacting a compound represented by general formula (S-14) with a compound represented by (S-15) in the presence of a transition metal catalyst and a base. Can do. Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably.
- the reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred. Further, water may be used as necessary in order to allow the reaction to proceed appropriately.
- ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether
- alcohol solvents such as methanol, ethanol and propanol
- Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred.
- water may be used as necessary in order to allow the reaction to proceed
- Any base can be used as long as it allows the reaction to proceed suitably.
- Carbonates such as potassium carbonate, sodium carbonate and cesium carbonate; phosphates such as tripotassium phosphate and potassium dihydrogen phosphate; Are preferable, and potassium carbonate, cesium carbonate, and tripotassium phosphate are more preferable.
- the reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
- the compound represented by the general formula (S-17) can be obtained by intramolecular reaction of the compound represented by the general formula (S-16). This intramolecular reaction can be carried out by deprotonation of —Y i3 —H of the general formula (S-16) with a base to generate an anion.
- Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred.
- Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
- reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether
- chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride.
- hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane
- examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene
- examples of polar solvents include N, N-dimethylformamide
- Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane.
- ether solvents such as tetrahydrofuran and diethyl ether
- polar solvents such as N, N-dimethylformamide are more preferable.
- each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
- the reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C.
- the compound represented by the general formula (S-18) can be obtained by halogenating the compound represented by the general formula (S-17). This halogenation can be performed by deprotonation with an organometallic reagent and then reacting with bromine or iodine to form a halogen compound.
- Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents.
- ether solvents examples include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
- hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
- organometallic reagents examples include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide.
- N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable.
- a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent.
- the reaction temperature for deprotonation is preferably from ⁇ 100 ° C. to ⁇ 20 ° C., more preferably from ⁇ 78 ° C. to ⁇ 40 ° C.
- a compound represented by general formula (S-20) is obtained by reacting a compound represented by general formula (S-18) with a compound represented by (S-19) in the presence of a transition metal catalyst and a base. Can do. Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably.
- the reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred. Further, water may be used as necessary in order to allow the reaction to proceed appropriately.
- ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether
- alcohol solvents such as methanol, ethanol and propanol
- Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred.
- water may be used as necessary in order to allow the reaction to proceed
- Any base can be used as long as it allows the reaction to proceed suitably.
- Carbonates such as potassium carbonate, sodium carbonate and cesium carbonate; phosphates such as tripotassium phosphate and potassium dihydrogen phosphate; Are preferable, and potassium carbonate, cesium carbonate, and tripotassium phosphate are more preferable.
- the reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred. (Manufacturing method 3)
- L i2, X i1, X i2 , Y i2 and W i1 represent the same meaning in the general formula (i) and L i2, X i1, X i2 , Y i2 and W i1, X i5 represents chlorine, bromine, iodine, benzenesulfonyloxy group, p-toluenesulfonyloxy group, methanesulfonyloxy group or trifluoromethanesulfonyloxy group; Y i3 represents —O— or —S—, R i2 represents an alkyl group having 1 to 15 carbon atoms or an alkenyl group having 2 to 15 carbon atoms.
- the compound represented by the general formula (S-21) can be obtained by oxidizing the compound represented by the general formula (S-17). This oxidation can be carried out by deprotonation with an organometallic reagent, reaction with a trialkyl borate to form a boron compound, and subsequent action of an oxidizing agent.
- Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
- hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
- organometallic reagent examples include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramerpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable.
- a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent.
- the reaction temperature for deprotonation is preferably from ⁇ 100 ° C. to ⁇ 20 ° C., more preferably from ⁇ 78 ° C. to ⁇ 40 ° C.
- trialkyl borate trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling.
- combination of trialkyl borate and organometallic reagent any of the above-mentioned combinations are possible, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred.
- the reaction temperature during boriding is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C.
- the obtained boron compound may be isolated once or may be reacted with an oxidizing agent without isolation. Further, the obtained boron compound may be hydrolyzed and converted into a boric acid compound and then reacted with an oxidizing agent.
- the oxidizing agent hydrogen peroxide water, peracetic acid or performic acid is preferably used.
- the reaction temperature is preferably -78 ° C to 70 ° C, more preferably 0 ° C to 50 ° C.
- water may be contained in the solvent at the time of reaction with an oxidizing agent.
- the compound represented by the general formula (S-23) can be obtained by reacting the compound represented by the general formula (S-21) with the compound represented by the general formula (S-22). This reaction can be carried out by reacting the hydroxyl group of the general formula (S-21) with the base as a phenolate with the general formula (S-22).
- the base used in this case is a metal hydride, metal carbonate, metal Mention may be made of phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides, alkali metal phosphates, alkali metal phosphates, alkali metal carbonates, alkali metals Hydroxides, alkali metal amides and alkali metals are preferred, and alkali metal phosphates, alkali metal hydrides and alkali metal carbonates are more preferred.
- Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
- Any reaction solvent may be used as long as it allows the reaction to proceed suitably.
- Ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether, and examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride.
- hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane
- examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene
- examples of polar solvents include N, N-dimethylformamide
- Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane.
- ether solvents such as tetrahydrofuran and diethyl ether
- polar solvents such as N, N-dimethylformamide are more preferable.
- each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
- the reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C.
- the phenolate produced may be isolated once and then reacted with the compound represented by the general formula (S-22), or it may be reacted without isolation, but it is not isolated for ease of work. It is better to react. (Manufacturing method 4)
- L i1 , L i2 , X i1 , X i2 , Y i2 and W i11 have the same meaning as L i1 , L i2 , X i1 , X i2 , Y i2 and W i1 in the general formula (i)).
- Y i3 represents —O— or —S—.
- the compound represented by the general formula (S-25) can be obtained by reacting the compound represented by the general formula (S-17) with the compound represented by the general formula (S-24). This reaction can be carried out by deprotonation with an organometallic reagent and reaction with general formula (S-24).
- reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents.
- ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
- hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
- organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide.
- N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable.
- a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent.
- the reaction temperature for deprotonation is preferably from ⁇ 100 ° C. to ⁇ 20 ° C., more preferably from ⁇ 78 ° C. to ⁇ 40 ° C.
- a compound represented by the general formula (S-26) can be obtained by dehydrating the compound represented by the general formula (S-25).
- Examples of the dehydration method include a method of heating in the presence of an acid.
- Examples of the acid include inorganic acids such as hydrochloric acid, sulfuric acid, and potassium bisulfate, organic acids such as acetic acid, trifluoroacetic acid, and p-toluenesulfonic acid, and Lewis acids such as boron trifluoride.
- the hydroxyl group can be reacted with p-toluenesulfonic acid chloride, trifluoromethanesulfonic acid chloride, triphosgene, etc.
- the compound represented by the general formula (S-27) can be obtained by reacting the compound represented by the general formula (S-26) with hydrogen gas in an organic solvent in the presence of a metal catalyst.
- Any organic solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents such as diisopropyl ether, diethyl ether, 1,4-dioxane or tetrahydrofuran, hexane, heptane, toluene or xylene, etc.
- Hydrocarbon solvents, alcohol solvents such as methanol, ethanol, propanol, isopropyl alcohol or butanol, and ester solvents such as ethyl acetate or butyl acetate are preferred, and tetrahydrofuran, hexane, heptane, toluene, ethanol or ethyl acetate are preferred.
- acids such as hydrochloric acid, acetic acid, or a sulfuric acid, as needed.
- the reaction temperature may be any temperature that allows the reaction to proceed suitably, but is preferably 0 ° C. to 80 ° C., more preferably room temperature to 60 ° C.
- the metal catalyst to be used may be any metal catalyst that allows the reaction to proceed suitably, but is preferably palladium carbon, ruthenium carbon, platinum black or platinum oxide, and more preferably palladium carbon.
- the hydrogen pressure at the time of reaction may be any as long as it allows the reaction to proceed suitably, but is preferably from atmospheric pressure to 0.5 MPa, and more preferably from 0.2 MPa to 0.5 MPa. (Manufacturing method 5)
- R i3 represents an alkyl group having 1 to 15 carbon atoms or an alkenyl group having 2 to 15 carbon atoms, and one —CH 2 — or two or more non-adjacent ones present in the alkyl group or alkenyl group.
- —CH 2 — may be replaced by —C ⁇ C—, —O—, —S—, —COO—, —OCO— or —CO—, and the hydrogen atom present in the alkyl or alkenyl group is fluorine.
- the compound represented by the general formula (S-29) can be obtained by reacting the compound represented by the general formula (S-18) with the compound represented by (S-28) in the presence of a transition metal catalyst. .
- Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably.
- phosphine-type ligands such as a triphenylphosphine, as needed.
- the reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred.
- ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether
- alcohol solvents such as methanol, ethanol and propanol
- Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred.
- the reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
- the general formula (i) At least one compound represented by formula (1), but it is preferable to contain at least one of the following second to fourth components as other components.
- the second component is a so-called n-type liquid crystal compound having a negative dielectric anisotropy, and examples thereof include compounds represented by the following general formulas (LC3) to (LC5).
- R LC31, R LC32, R LC41 , R LC42, R LC51 and R LC52 is 1 to 15 carbon atoms independently, one in the alkyl group or two or more —CH 2 — may be substituted with —O—, —CH ⁇ CH—, —CO—, —OCO—, —COO— or —C ⁇ C— so that the oxygen atom is not directly adjacent.
- one or more hydrogen atoms in the group may be optionally substituted by a halogen atom, a LC31, a LC32, a LC41, a LC42, a LC51 and a LC52 each independently any of the following Structure
- one or more —CH 2 — in the cyclohexylene group may be substituted with an oxygen atom
- one or more —CH— in the 1,4-phenylene group is Any one of which may be substituted with a nitrogen atom
- one or more hydrogen atoms in the structure may be substituted with a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 ).
- Z LC31, Z LC32, Z LC41, Z LC42, Z LC51 and Z LC51 each independently represent a single bond
- -CH CH -, - C ⁇ C -, - CH 2 CH 2 -, - ( CH 2 ) 4 —, —COO—, —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—
- Z 5 represents —CH 2 — or an oxygen atom
- X LC41 represents Represents a hydrogen atom or a fluorine atom
- m LC31 , m L C32, m LC41, m LC42, m LC51 and m LC52 each independently represent 0 ⁇ 3, m LC31 + m LC32, m LC41 + m LC42 and m LC51 + m LC52 is 1, 2 or 3,
- a LC31 ⁇ When a plurality of A LC52 and Z
- R LC31 to R LC52 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms. Most preferably,
- a LC31 to A LC52 each independently preferably has the following structure:
- Z LC31 to Z LC51 each independently has a single bond, —CH 2 O—, —COO—, —OCO— , —CH 2 CH 2 —, —CF 2 O—, —OCF 2 — or —OCH 2 —. preferable.
- LC3 is the following general formula (LC3-a) and general formula (LC3-b)
- R LC31 , R LC32 , A LC31 and Z LC31 each independently represent the same meaning as R LC31 , R LC32 , A LC31 and Z LC31 in the general formula (LC3)
- X LC3b1 to X LC3b6 are Represents a hydrogen atom or a fluorine atom
- at least one of X LC3b1 and X LC3b2 or X LC3b3 and X LC3b4 represents a fluorine atom
- m LC3a1 is 1, 2 or 3
- m LC3b1 is 0 or
- a plurality of A LC31 and Z LC31 may be the same or different, provided that they are represented by the general formula (LC3-b) in the general formula (LC3-a)
- a compound selected from the group of compounds represented by the formula: Rukoto is preferable.
- R LC31 and R LC32 each independently represents an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, or an alkenyloxy group having 2 to 7 carbon atoms. Is preferably represented.
- a LC31 preferably represents a 1,4-phenylene group, a trans-1,4-cyclohexylene group, a tetrahydropyran-2,5-diyl group, or a 1,3-dioxane-2,5-diyl group.
- 4-phenylene group and trans-1,4-cyclohexylene group are more preferable.
- Z LC31 is a single bond, -CH 2 O -, - COO -, - OCO -, - CH 2 CH 2 - is preferred to represent, and more preferably a single bond.
- the general formula (LC3-a) preferably represents the following general formula (LC3-a1) to general formula (LC3-a4).
- R LC31 and R LC32 each independently represent the same meaning as R LC31 and R LC32 in General Formula (LC3).
- R LC31 and R LC32 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and R LC31 has 1 carbon atom. More preferably, it represents an alkyl group of ⁇ 7 , and R LC32 represents an alkoxy group of 1 to 7 carbon atoms.
- the general formula (LC3-b) is preferably represented by the following general formula (LC3-b1) to general formula (LC3-b12).
- the general formula (LC3-b1), the general formula (LC3-b6), the general formula (LC3-b8) and general formula (LC3-b11) are more preferable, general formula (LC3-b1) and general formula (LC3-b6) are more preferable, and general formula (LC3-b1) is Most preferably it represents.
- R LC31 and R LC32 each independently represent the same meaning as R LC31 and R LC32 in General Formula (LC3).
- R LC31 and R LC32 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and R LC31 has 2 carbon atoms. Or an alkyl group having 3 carbon atoms, and more preferably R LC32 represents an alkyl group having 2 carbon atoms.
- LC4 is general formula (LC4-a) to general formula (LC4-c)
- general formula (LC5) is general formula (LC5-a) to general formula (LC5-c).
- R LC41, R LC42 and X LC41 each independently represent the same meaning as R LC41, R LC42 and X LC41 in the general formula (LC4)
- R LC51 and R LC52 is the general independently It represents the same meaning as R LC51 and R LC52 in formula (LC5)
- R LC41, R LC42, R LC51 and R LC52 each independently represents an alkyl group of 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, the number alkenyl group or a carbon atom of 2 to 7 carbon atoms 2 It preferably represents ⁇ 7 alkenyloxy groups.
- Z LC4a1 to Z LC5c1 each independently preferably represents a single bond, —CH 2 O—, —COO—, —OCO— , —CH 2 CH 2 —, and more preferably represents a single bond.
- the third component is a so-called nonpolar liquid crystal compound having a dielectric anisotropy of about 0, and examples thereof include compounds represented by the following general formula (LC6).
- R LC61 and R LC62 each independently represents an alkyl group having 1 to 15 carbon atoms, and one or more of —CH 2 — in the alkyl group is not directly adjacent to an oxygen atom. And may be substituted with —O—, —CH ⁇ CH—, —CO—, —OCO—, —COO— or —C ⁇ C—, and one or more hydrogen atoms in the alkyl group May be optionally halogen-substituted, and A LC61 to A LC63 each independently represent
- one or more —CH 2 CH 2 — in the cyclohexylene group may be substituted with —CH ⁇ CH—, —CF 2 O—, —OCF 2 —, -One or two or more CH groups in the phenylene group may be substituted with a nitrogen atom
- Z LC61 and Z LC62 each independently represent a single bond, —CH ⁇ CH—, Represents —C ⁇ C—, —CH 2 CH 2 —, — (CH 2 ) 4 —, —COO—, —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—
- m Lc6 represents 0-3.
- R LC61 and R LC62 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms. Most preferably,
- a LC61 to A LC63 each independently preferably has the following structure:
- Z LC61 and Z LC62 are each independently preferably a single bond, —CH 2 CH 2 —, —COO— , —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—.
- R LC61 and R LC62 are each independently an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, or 2 to 7 carbon atoms) It is more preferable that it is 1 type, or 2 or more types of compounds chosen from the group which consists of a compound represented by this.
- the fourth component is a so-called p-type liquid crystal compound having a positive dielectric anisotropy, and examples thereof include compounds represented by the following general formulas (LC1) and (LC2).
- R LC11 and R LC21 each independently represents an alkyl group having 1 to 15 carbon atoms, and one or more of —CH 2 — in the alkyl group is not directly adjacent to an oxygen atom. And may be substituted with —O—, —CH ⁇ CH—, —CO—, —OCO—, —COO— or —C ⁇ C—, and one or more hydrogen atoms in the alkyl group May be optionally substituted with a halogen atom, and A LC11 and A LC21 are each independently any one of the following structures:
- one or more —CH 2 — in the cyclohexylene group may be substituted with an oxygen atom, and one or more —CH— in the 1,4-phenylene group may be substituted. May be substituted with a nitrogen atom, and one or more hydrogen atoms in the structure may be substituted with a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 ).
- X LC11, X LC12, X LC21 ⁇ X LC23 are each independently a hydrogen atom, a fluorine atom, a chlorine atom, a -CF 3 or -OCF 3
- Y LC11 and Y LC21 are each independently a hydrogen atom, fluorine atom, a chlorine atom, a cyano group, -CF 3
- LC11 and m LC21 each independently represents an integer of 1 to 4, and when there are
- R LC11 and R LC21 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and an alkyl group having 1 to 5 carbon atoms.
- Group, an alkoxy group having 1 to 5 carbon atoms, and an alkenyl group having 2 to 5 carbon atoms are more preferable, and a straight chain is more preferable, and the alkenyl group most preferably represents the following structure.
- a LC11 and A LC21 each independently preferably have the following structure.
- Y LC11 and Y LC21 are each independently preferably a fluorine atom, a cyano group, —CF 3 or —OCF 3 , preferably a fluorine atom or —OCF 3 , and particularly preferably a fluorine atom.
- Z LC11 and Z LC21 are preferably a single bond, —CH 2 CH 2 —, —COO—, —OCO— , —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O— , —CH 2 CH 2 —, —OCH 2 —, —OCF 2 — or —CF 2 O— are preferred, and a single bond, —OCH 2 — or —CF 2 O— is more preferred.
- m LC11 and m LC21 are preferably 1, 2 or 3, preferably 1 or 2 when emphasizing storage stability at low temperature and response speed, and 2 or 3 for improving the upper limit of the nematic phase upper limit temperature. Is preferred.
- LC1 is represented by the following general formula (LC1-a) to general formula (LC1-c)
- R LC11, Y LC11, X LC11 and X LC12 each independently represent the same meaning as R LC11, Y LC11, X LC11 and X LC12 in the general formula (LC1)
- a LC1a1, A LC1a2 and A LC1b1 represents a trans-1,4-cyclohexylene group, a tetrahydropyran-2,5-diyl group, or a 1,3-dioxane-2,5-diyl group
- XLC1b1 , XLC1b2 , XLC1c1 to XLC1c4 Are each independently a hydrogen atom, a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 ), and are preferably one or more compounds selected from the group consisting of compounds represented by:
- R LC11 is preferably independently an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, an alkyl group having 1 to 5 carbon atoms, carbon An alkoxy group having 1 to 5 atoms and an alkenyl group having 2 to 5 carbon atoms are more preferable.
- X LC11 to X LC1c4 are each independently preferably a hydrogen atom or a fluorine atom.
- Y LC11 is preferably independently a fluorine atom, —CF 3 or —OCF 3 .
- the general formula (LC1) is changed from the following general formula (LC1-d) to the general formula (LC1-m).
- R LC11, Y LC11, X LC11 and X LC12 each independently represent the same meaning as R LC11, Y LC11, X LC11 and X LC12 in the general formula (LC1), A LC1d1, A LC1f1, A LC1g1 , A LC1j1 , A LC1k1 , A LC1k2 , A LC1m1 to A LC1m3 are 1,4-phenylene group, trans-1,4-cyclohexylene group, tetrahydropyran-2,5-diyl group, 1,3- It represents dioxane-2,5-diyl group, X LC1d1, X LC1d2, X LC1f1, X LC1f2, X LC1g1, X LC1g2, X LC1h1, X LC1h2, X LC1i1, X LC1i2, X LC1 LC1
- R LC11 is preferably independently an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, an alkyl group having 1 to 5 carbon atoms, carbon An alkoxy group having 1 to 5 atoms and an alkenyl group having 2 to 5 carbon atoms are more preferable.
- X LC11 to X LC1m2 are each independently preferably a hydrogen atom or a fluorine atom.
- Y LC11 is preferably independently a fluorine atom, —CF 3 or —OCF 3 .
- Z LC1d1 to Z LC1m1 are each independently preferably —CF 2 O— or —OCH 2 —.
- the general formula (LC2) is changed from the following general formula (LC2-a) to the general formula (LC2-g).
- R LC21 , Y LC21 , X LC21 to X LC23 each independently represents the same meaning as R LC21 , Y LC21 , X LC21 to X LC23 in the general formula (LC2), and X LC2d1 to X LC2d4 , X LC2e1 to X LC2e4 , X LC2f1 to X LC2f4 and X LC2g1 to X LC2g4 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 , and Z LC2a1 , Z LC2b1 , Z LC2c1 , Z LC2d1 , Z LC2e1 , Z LC2f1 and Z LC2g1 are each independently a single bond, —CH ⁇ CH—, —CF ⁇ CF— , —C ⁇ C— , —CH
- R LC21 is preferably independently an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, an alkyl group having 1 to 5 carbon atoms, carbon An alkoxy group having 1 to 5 atoms and an alkenyl group having 2 to 5 carbon atoms are more preferable.
- X LC21 to X LC2g4 are each independently preferably a hydrogen atom or a fluorine atom
- Y LC21 is preferably each independently a fluorine atom, —CF 3 or —OCF 3 .
- Z LC2a1 to Z LC2g4 are each independently preferably —CF 2 O— or —OCH 2 —.
- the composition of the present invention preferably does not contain a compound having a structure in which oxygen atoms such as a peracid (—CO—OO—) structure are bonded in the molecule.
- the content of the compound having a carbonyl group is preferably 5% or less, more preferably 3% or less with respect to the total mass of the composition. Preferably, it is more preferably 1% or less, and most preferably not substantially contained.
- the content of the compound substituted with chlorine atoms is preferably 15% or less, preferably 10% or less, based on the total mass of the composition. % Or less, preferably 5% or less, more preferably 3% or less, and still more preferably substantially not contained.
- the content of the compound having a cyclohexenylene group as a ring structure, and the content of the compound having a cyclohexenylene group as the total mass of the composition is preferably 10% or less, preferably 8% or less, more preferably 5% or less, preferably 3% or less, and still more preferably not contained.
- a hydrogen atom to reduce the content of the compound having the optionally substituted 2-methyl-1,4-diyl group halogen in the molecule is preferably 10% or less, more preferably 8% or less with respect to the total mass of the composition. It is preferably 5% or less, more preferably 3% or less, and still more preferably substantially not contained.
- substantially not contained in the present application means that it is not contained except for an unintentionally contained product.
- the alkenyl group when the compound contained in the composition of the first embodiment of the present invention has an alkenyl group as a side chain, when the alkenyl group is bonded to cyclohexane, the alkenyl group has 2 to 5 carbon atoms.
- the alkenyl group is bonded to benzene, the number of carbon atoms of the alkenyl group is preferably 4 to 5, and the unsaturated bond of the alkenyl group and benzene are directly bonded. Preferably not.
- the average elastic constant (K AVG ) of the liquid crystal composition used in the present invention is preferably 10 to 25, and the lower limit thereof is preferably 10, preferably 10.5, preferably 11 and preferably 11.5.
- 12 is preferable, 12.3 is preferable, 12.5 is preferable, 12.8 is preferable, 13 is preferable, 13.3 is preferable, 13.5 is preferable, 13.8 is preferable, 14 is preferable, 14 .3 is preferred, 14.5 is preferred, 14.8 is preferred, 15 is preferred, 15.3 is preferred, 15.5 is preferred, 15.8 is preferred, 16 is preferred, 16.3 is preferred, 16 .5, 16.8 is preferable, 17 is preferable, 17.3 is preferable, 17.5 is preferable, 17.8 is preferable, and 18 is preferable.
- 25 is preferable, 24.5 is preferable, 24 is preferable, 23.5 is preferable, 23 is preferable, 22.8 is preferable, 22.5 is preferable, 22.3 is preferable, 22 is preferable, and 21.8 is 21.5 is preferred, 21.3 is preferred, 21 is preferred, 20.8 is preferred, 20.5 is preferred, 20.3 is preferred, 20 is preferred, 19.8 is preferred, 19.5 is preferred 19.3 is preferred, 19 is preferred, 18.8 is preferred, 18.5 is preferred, 18.3 is preferred, 18 is preferred, 17.8 is preferred, 17.5 is preferred, 17.3 is preferred 17 is preferable. When importance is placed on reducing power consumption, it is effective to reduce the amount of light from the backlight, and it is preferable to improve the light transmittance of the liquid crystal display element.
- the liquid crystal composition of the present invention has a refractive index anisotropy ( ⁇ n) at 20 ° C. of 0.08 to 0.14, more preferably 0.09 to 0.13, and 0.09 to 0.12. Particularly preferred. More specifically, it is preferably 0.10 to 0.13 when dealing with a thin cell gap, and preferably 0.08 to 0.10 when dealing with a thick cell gap.
- the liquid crystal composition of the present invention has a viscosity ( ⁇ ) at 20 ° C. of 10 to 30 mPa ⁇ s, more preferably 10 to 25 mPa ⁇ s, and particularly preferably 10 to 22 mPa ⁇ s.
- the liquid crystal composition of the present invention has a rotational viscosity ( ⁇ 1 ) at 20 ° C. of 60 to 200 mPa ⁇ s, more preferably 60 to 120 mPa ⁇ s, and particularly preferably 60 to 100 mPa ⁇ s. .
- the liquid crystal composition of the present invention has a nematic phase-isotropic liquid phase transition temperature (T ni ) of 60 ° C. to 120 ° C., more preferably 70 ° C. to 100 ° C., and particularly preferably 70 ° C. to 85 ° C. In addition, it is preferable to show a nematic liquid crystal at 20 ° C.
- T ni nematic phase-isotropic liquid phase transition temperature
- the liquid crystal composition of the present invention may contain a normal nematic liquid crystal, a smectic liquid crystal, a cholesteric liquid crystal, an antioxidant, an ultraviolet absorber, an infrared absorber, a polymerizable monomer, or a light stabilizer in addition to the above-described compounds. Good.
- the liquid crystal display device using the liquid crystal composition containing the compound of the present invention is useful for achieving both high-speed response and suppression of display failure, and is particularly useful for a liquid crystal display device for active matrix driving.
- the present invention can be applied to liquid crystal display elements in various modes such as a mode, a PSVA mode, a PSA mode, an IPS mode, an FFS mode, or an ECB mode.
- % in the compositions of the following Examples and Comparative Examples means “% by mass”.
- the phase transition temperature was measured using a polarizing microscope equipped with a temperature control stage and a differential scanning calorimeter (DSC).
- T n-i nematic phase - represents the transition temperature of the isotropic phase.
- the reaction mixture was warmed to room temperature, 10% hydrochloric acid (150 ml) and hexane (100 ml) were added and stirred, and the resulting organic layers were combined, washed with water and saturated brine, and anhydrous sodium sulfate. And dried.
- the obtained solution was concentrated to obtain 29.5 g. While stirring the resulting solid in THF (150 ml) and sodium hydrogen carbonate (0.42 g), 30% aqueous hydrogen peroxide (14.9 g) was added dropwise at room temperature and stirred for 12 hours. The solution temperature was cooled to 0 ° C. and 15% aqueous sodium thiosulfate solution (150 ml) was added.
- Example 325 Preparation of Liquid Crystal Composition-1 Host liquid crystal (H) showing the following physical properties Was prepared. All the values are actually measured values.
- T n-i (nematic phase - isotropic liquid phase transition temperature): 73.8 ° C.
- ⁇ dielectric anisotropy at 25 ° C.
- ⁇ 2.79 ⁇ n (refractive index anisotropy at 25 ° C.): 0.101 ⁇ 1 (rotational viscosity coefficient at 25 ° C.): 118
- MA liquid crystal composition
- the extrapolated value of each physical property value of) was as follows.
- the prepared liquid crystal composition (MA) maintained a uniform nematic liquid crystal state for one month or more at room temperature.
- liquid crystal display device manufactured using the liquid crystal composition (MA) showed excellent display characteristics, maintained stable display characteristics for a long time, and showed high reliability.
- Example 326 Preparation of liquid crystal composition-2 A liquid crystal composition (MB) comprising 90% of the base liquid crystal (H) and 10% of the compound (1-8-203) obtained in Example 2 was prepared. From this composition (M-B), the extrapolated T n-i of the compound obtained in Example 2 (1-8-203), extrapolated [Delta] [epsilon], extrapolation [Delta] n, the extrapolation gamma 1 values below It is as follows.
- Extrapolation T n-i 38.9 °C Extrapolation ⁇ : ⁇ 17.9 Extrapolation ⁇ n: 0.198 Extrapolation ⁇ 1 : 372 mPa ⁇ s Further, the prepared liquid crystal composition (MB) maintained a uniform nematic liquid crystal state for one month or more at room temperature.
- liquid crystal display device manufactured using the liquid crystal composition (MB) exhibited excellent display characteristics, maintained stable display characteristics over a long period of time, and exhibited high reliability.
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Abstract
Provided are: a compound represented by general formula (i); and a composition and a liquid crystal display element which use said compound. The compound represented by general formula (i) is obtained by reacting a compound represented by general formula (i-r2) with a compound represented by general formula (i-r1) in the presence of a transition metal catalyst and a base to obtain a compound represented by general formula (i-r3), and subsequently inducing an intramolecular reaction by using the base to deprotonate the -Yi3-H in the compound represented by general formula (i-r3) to generate an anion. According to the present invention, a compound exhibiting a high Tni and a large Δε, and a composition and a liquid crystal display element which use said compound can be provided. Furthermore, a method for producing the compound and a production intermediate of the compound can also be provided.
Description
本発明は有機電子材料や医農薬、特に液晶表示素子用材料として有用な縮合環を有する化合物及びこれらを用いた液晶組成物に関する。
The present invention relates to a compound having a condensed ring that is useful as an organic electronic material, medical pesticide, or a liquid crystal display element material, and a liquid crystal composition using these compounds.
液晶表示素子は、時計、電卓をはじめとして、各種測定機器、自動車用パネル、ワードプロセッサー、電子手帳、プリンター、コンピューター、テレビ、時計、広告表示板等に用いられている。液晶表示方式としては、その代表的なものにTN(ツイステッド・ネマチック)型、STN(スーパー・ツイステッド・ネマチック)型、TFT(薄膜トランジスタ)を用いた垂直配向型やIPS(イン・プレーン・スイッチング)型等の駆動方式がある。これらの液晶表示素子に用いられる液晶組成物は水分、空気、熱、光などの外的要因に対して安定であること、また、室温を中心としてできるだけ広い温度範囲で液晶相(ネマチック相、スメクチック相及びブルー相等)を示し、低粘性であり、かつ駆動電圧が低いことが求められる。更に液晶組成物は個々の表示素子にあわせて誘電率異方性(Δε)及び屈折率異方性(Δn)等を最適な値とするために、数種類から数十種類の化合物を選択し、構成されている。
Liquid crystal display elements are used in various measuring instruments, automobile panels, word processors, electronic notebooks, printers, computers, televisions, clocks, advertisement display boards, etc., including watches and calculators. Typical liquid crystal display methods include TN (twisted nematic) type, STN (super twisted nematic) type, vertical alignment type using TFT (thin film transistor), and IPS (in-plane switching) type. There is a drive system such as. The liquid crystal compositions used in these liquid crystal display elements are stable against external factors such as moisture, air, heat, and light, and the liquid crystal phase (nematic phase, smectic phase) in the widest possible temperature range centering on room temperature. Phase, blue phase, etc.), low viscosity, and low driving voltage. Furthermore, the liquid crystal composition is selected from several to several tens of kinds of compounds in order to optimize the dielectric anisotropy (Δε) and the refractive index anisotropy (Δn) according to the individual display elements, It is configured.
液晶組成物を表示素子等として使用する際には、広い温度範囲において安定なネマチック相を示すことが求められる。広い温度範囲にてネマチック相を維持するためには、液晶組成物を構成する個々の成分が他の成分との高い混和性を持つこと、及び高い透明点(Tni)を持つ事が求められる。 また、液晶組成物を表示素子等として使用する際には、可能な限り回転粘性係数(γ1)が低いことが求められる。γ1の低い液晶組成物を得るためには様々な方法があるが、その一つとして大きな|Δε|(外挿値)を有する化合物を用いる事が知られている。この理由について以下に説明する。液晶組成物のγ1を低下させるためには、|Δε|(外挿値)がほぼ0であり低いγ1(外挿値)を示す非極性化合物の使用量を可能な限り増やすことが有効である。一般的に必要とされる組成物のΔεは液晶パネルごとに決まっており、Δεを付与するためにγ1(外挿値)の大きな極性化合物を添加している。したがって、大きな|Δε|(外挿値)を示す化合物に置き換える事で、非極性化合物の使用量を増やすことが出来るため、結果として液晶組成物のγ1低下を達成することが出来る。
When the liquid crystal composition is used as a display element or the like, it is required to exhibit a stable nematic phase in a wide temperature range. In order to maintain a nematic phase in a wide temperature range, it is required that individual components constituting the liquid crystal composition have high miscibility with other components and have a high clearing point (T ni ). . Moreover, when using a liquid crystal composition as a display element etc., it is calculated | required that a rotational viscosity coefficient ((gamma) 1 ) is as low as possible. In order to obtain a low gamma 1 liquid crystal composition There are various ways, big as one | [Delta] [epsilon] | It is known that a compound having a (extrapolated value). The reason for this will be described below. In order to reduce γ 1 of the liquid crystal composition, it is effective to increase as much as possible the use amount of a nonpolar compound having | Δε | (extrapolated value) of almost 0 and showing a low γ 1 (extrapolated value). It is. The Δε of the composition that is generally required is determined for each liquid crystal panel, and a polar compound having a large γ 1 (extrapolated value) is added to give Δε. Therefore, by replacing the compound with a large | Δε | (extrapolated value), the amount of the nonpolar compound used can be increased, and as a result, a decrease in γ 1 of the liquid crystal composition can be achieved.
このように、高いTniを示し、また、大きな|Δε|(外挿値)を示す化合物の開発が求められている。これまで、ジベンゾフラン構造を有する下記のような化合物が報告されているが、Tniが十分に大きくないという課題があった(特許文献1及び特許文献2)。
Thus, there is a demand for the development of a compound that exhibits a high T ni and a large | Δε | (extrapolated value). So far, the following compounds having a dibenzofuran structure have been reported, but there has been a problem that T ni is not sufficiently large (Patent Documents 1 and 2).
(式中、R1及びR2は各々独立して炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基、炭素原子数2から15のアルキニル基を表し、m及びnは各々独立して0又は1を表す。)
Wherein R 1 and R 2 each independently represents an alkyl group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or an alkynyl group having 2 to 15 carbon atoms, Each independently represents 0 or 1)
本発明が解決しようとする課題は、高いTniを示し、また、大きなΔεを有する化合物を提供し、併せて当該化合物を構成部材とする液晶組成物及び液晶表示素子を提供することである。
The problem to be solved by the present invention is to provide a compound having a high T ni and having a large Δε, and a liquid crystal composition and a liquid crystal display device comprising the compound as a constituent member.
前記課題を解決するため、本願発明者らは種々の化合物の検討を行った結果、下記縮合環を有する化合物が効果的に課題を解決できることを見出し、本願発明の完成に至った。
In order to solve the above problems, the present inventors have studied various compounds, and as a result, have found that a compound having the following condensed ring can effectively solve the problems, and have completed the present invention.
本願発明は、一般式(i)
The present invention has the general formula (i)
(式中、Xi1及びXi2はそれぞれ独立して水素原子、フッ素原子、塩素原子、シアノ基、トリフルオロメチル基、トリフルオロメトキシ基を表し、
Yi1及びYi2はそれぞれ独立して-O-、-S-、-SO-、-SOO-、-CF2-、-CO-、-CXi3Xi4-を表し、ただし、Yi1及びYi2のいずれか一つ以上は-O-、-S-、-SO-、-SOO-を表し、
Xi3、Xi4はそれぞれ独立してXi1と同じ意味を表し、
Wi1は
( Wherein , X i1 and X i2 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a trifluoromethoxy group,
Y i1 and Y i2 each independently represent —O—, —S—, —SO—, —SOO—, —CF 2 —, —CO—, —CX i3 X i4 —, wherein Y i1 and Y any one or more of i2 represents —O—, —S—, —SO—, —SOO—;
X i3 and X i4 each independently represent the same meaning as X i1 ,
W i1
Yi1及びYi2はそれぞれ独立して-O-、-S-、-SO-、-SOO-、-CF2-、-CO-、-CXi3Xi4-を表し、ただし、Yi1及びYi2のいずれか一つ以上は-O-、-S-、-SO-、-SOO-を表し、
Xi3、Xi4はそれぞれ独立してXi1と同じ意味を表し、
Wi1は
( Wherein , X i1 and X i2 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a trifluoromethoxy group,
Y i1 and Y i2 each independently represent —O—, —S—, —SO—, —SOO—, —CF 2 —, —CO—, —CX i3 X i4 —, wherein Y i1 and Y any one or more of i2 represents —O—, —S—, —SO—, —SOO—;
X i3 and X i4 each independently represent the same meaning as X i1 ,
W i1
(但し、式中の黒点はLi2又はYi2への結合点を表す。)を表し、
Wi2は単結合又は-CLi9Li10-を表し、
Li1、Li2、Li3、Li4、Li5、Li6、Li7、Li8、Li9及びLi10はそれぞれ独立して水素原子、臭素原子、よう素原子、水酸基、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基又は (However, the black point in the formula represents the point of attachment to L i2 or Y i2 ),
W i2 represents a single bond or —CL i9 L i10 —,
L i1 , L i2 , L i3 , L i4 , L i5 , L i6 , L i7 , L i8 , L i9 and L i10 are each independently a hydrogen atom, bromine atom, iodine atom, hydroxyl group, carbon number 1 To 15 alkyl groups, alkenyl groups of 2 to 15 carbon atoms, or
Wi2は単結合又は-CLi9Li10-を表し、
Li1、Li2、Li3、Li4、Li5、Li6、Li7、Li8、Li9及びLi10はそれぞれ独立して水素原子、臭素原子、よう素原子、水酸基、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基又は (However, the black point in the formula represents the point of attachment to L i2 or Y i2 ),
W i2 represents a single bond or —CL i9 L i10 —,
L i1 , L i2 , L i3 , L i4 , L i5 , L i6 , L i7 , L i8 , L i9 and L i10 are each independently a hydrogen atom, bromine atom, iodine atom, hydroxyl group, carbon number 1 To 15 alkyl groups, alkenyl groups of 2 to 15 carbon atoms, or
(式中、Ri1は水素原子、臭素原子、よう素原子、水酸基、炭素原子数1から15のアルキル基、炭素原子数1から15のアルコキシ基、炭素原子数2から15のアルケニル基又は炭素原子数2から15のアルケニルオキシ基を表し、
Ai1は
(a)1,4-シクロへキシレン基(この基中に存在する1個の-CH2-又は隣接していない2個以上の-CH2-は-O-又は-S-に置き換えられても良い。)
(b)1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良く、この基中に存在する1つの水素原子はフッ素原子に置換されても良い。)
(c)1,4-シクロヘキセニレン基、ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基(これらの基中に存在する水素原子はフッ素原子に置換されても良く、また、ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
からなる群より選ばれる基を表し、
Zi1は、-CH2O-、-OCH2-、-CF2O-、-OCF2-、-COO-、-OCO-、-CH2CH2-、-CF2CF2-、-CH=CH-、-CF=CF-、-C≡C-又は単結合を表し、
ni1は1又は2を表すが、ni1が2を表しAi1及びZi1が複数存在する場合、それらは同一であっても異なっていてもよい。)
で表される基を表し、Li1、Li2、Li3、Li4、Li5、Li6、Li7、Li8、Li9及びLi10中に存在する1個の-CH2-又は隣接していない2個以上の-CH2-は-C≡C-、-O-、-S-、-COO-、-OCO-又は-CO-により置き換えられても良く、また、アルキル基又はアルケニル基中に存在する水素原子はフッ素原子に置換されても良い。)
で表される基を表す。)
で表される化合物を提供し、併せて当該化合物を含有する液晶組成物及び当該液晶組成物を用いた液晶表示素子、並びに当該化合物の製造方法及びその中間体を提供する。 (Wherein R i1 represents a hydrogen atom, a bromine atom, an iodine atom, a hydroxyl group, an alkyl group having 1 to 15 carbon atoms, an alkoxy group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or carbon. Represents an alkenyloxy group having 2 to 15 atoms,
A i1 represents (a) a 1,4-cyclohexylene group (one —CH 2 — present in this group or two or more non-adjacent —CH 2 — represents —O— or —S—). May be replaced.)
(B) 1,4-phenylene group (one —CH═ present in this group or two or more non-adjacent —CH═ may be replaced by —N═, present in this group) One hydrogen atom may be substituted with a fluorine atom.)
(C) 1,4-cyclohexenylene group, naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, decahydronaphthalene-2,6-diyl group ( A hydrogen atom present in these groups may be substituted with a fluorine atom, or present in a naphthalene-2,6-diyl group or a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group. One -CH = or two or more non-adjacent -CH = may be replaced by -N =.)
Represents a group selected from the group consisting of
Z i1 represents —CH 2 O—, —OCH 2 —, —CF 2 O—, —OCF 2 —, —COO—, —OCO—, —CH 2 CH 2 —, —CF 2 CF 2 —, —CH ═CH—, —CF═CF—, —C≡C— or a single bond,
n i1 represents 1 or 2, but when n i1 represents 2 and a plurality of A i1 and Z i1 exist, they may be the same or different. )
One —CH 2 — or adjacent group present in L i1 , L i2 , L i3 , L i4 , L i5 , L i6 , L i7 , L i8 , L i9 and L i10 Two or more —CH 2 — that are not present may be replaced by —C≡C—, —O—, —S—, —COO—, —OCO— or —CO—, and may be an alkyl group or alkenyl. A hydrogen atom present in the group may be substituted with a fluorine atom. )
Represents a group represented by )
In addition, a liquid crystal composition containing the compound, a liquid crystal display device using the liquid crystal composition, a method for producing the compound, and an intermediate thereof are provided.
Ai1は
(a)1,4-シクロへキシレン基(この基中に存在する1個の-CH2-又は隣接していない2個以上の-CH2-は-O-又は-S-に置き換えられても良い。)
(b)1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良く、この基中に存在する1つの水素原子はフッ素原子に置換されても良い。)
(c)1,4-シクロヘキセニレン基、ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基(これらの基中に存在する水素原子はフッ素原子に置換されても良く、また、ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
からなる群より選ばれる基を表し、
Zi1は、-CH2O-、-OCH2-、-CF2O-、-OCF2-、-COO-、-OCO-、-CH2CH2-、-CF2CF2-、-CH=CH-、-CF=CF-、-C≡C-又は単結合を表し、
ni1は1又は2を表すが、ni1が2を表しAi1及びZi1が複数存在する場合、それらは同一であっても異なっていてもよい。)
で表される基を表し、Li1、Li2、Li3、Li4、Li5、Li6、Li7、Li8、Li9及びLi10中に存在する1個の-CH2-又は隣接していない2個以上の-CH2-は-C≡C-、-O-、-S-、-COO-、-OCO-又は-CO-により置き換えられても良く、また、アルキル基又はアルケニル基中に存在する水素原子はフッ素原子に置換されても良い。)
で表される基を表す。)
で表される化合物を提供し、併せて当該化合物を含有する液晶組成物及び当該液晶組成物を用いた液晶表示素子、並びに当該化合物の製造方法及びその中間体を提供する。 (Wherein R i1 represents a hydrogen atom, a bromine atom, an iodine atom, a hydroxyl group, an alkyl group having 1 to 15 carbon atoms, an alkoxy group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or carbon. Represents an alkenyloxy group having 2 to 15 atoms,
A i1 represents (a) a 1,4-cyclohexylene group (one —CH 2 — present in this group or two or more non-adjacent —CH 2 — represents —O— or —S—). May be replaced.)
(B) 1,4-phenylene group (one —CH═ present in this group or two or more non-adjacent —CH═ may be replaced by —N═, present in this group) One hydrogen atom may be substituted with a fluorine atom.)
(C) 1,4-cyclohexenylene group, naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, decahydronaphthalene-2,6-diyl group ( A hydrogen atom present in these groups may be substituted with a fluorine atom, or present in a naphthalene-2,6-diyl group or a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group. One -CH = or two or more non-adjacent -CH = may be replaced by -N =.)
Represents a group selected from the group consisting of
Z i1 represents —CH 2 O—, —OCH 2 —, —CF 2 O—, —OCF 2 —, —COO—, —OCO—, —CH 2 CH 2 —, —CF 2 CF 2 —, —CH ═CH—, —CF═CF—, —C≡C— or a single bond,
n i1 represents 1 or 2, but when n i1 represents 2 and a plurality of A i1 and Z i1 exist, they may be the same or different. )
One —CH 2 — or adjacent group present in L i1 , L i2 , L i3 , L i4 , L i5 , L i6 , L i7 , L i8 , L i9 and L i10 Two or more —CH 2 — that are not present may be replaced by —C≡C—, —O—, —S—, —COO—, —OCO— or —CO—, and may be an alkyl group or alkenyl. A hydrogen atom present in the group may be substituted with a fluorine atom. )
Represents a group represented by )
In addition, a liquid crystal composition containing the compound, a liquid crystal display device using the liquid crystal composition, a method for producing the compound, and an intermediate thereof are provided.
本発明により提供される、一般式(i)で表される化合物は、高い透明点(Tni)を有する。従って、一般式(i)で表される化合物を液晶組成物の成分として用いる事により、広い温度範囲において安定なネマチック相を示すことができる。また、本発明により提供される、一般式(i)で表される化合物は、大きな|Δε|を示しさらに化学的に高い安定性を併せ持つ。従って、一般式(i)で表される化合物を液晶組成物の成分として用いる事により、低いγ1を示す液晶組成物を得ることができる。このため、高速応答が求められる液晶表示素子用の液晶組成物の構成成分として非常に有用である。
The compound represented by the general formula (i) provided by the present invention has a high clearing point (T ni ). Therefore, a stable nematic phase can be exhibited in a wide temperature range by using the compound represented by the general formula (i) as a component of the liquid crystal composition. In addition, the compound represented by the general formula (i) provided by the present invention exhibits a large | Δε | and also has a high chemical stability. Therefore, by using the compound represented by the general formula (i) as a component of the liquid crystal composition, a liquid crystal composition exhibiting a low γ 1 can be obtained. For this reason, it is very useful as a component of a liquid crystal composition for a liquid crystal display element that requires a high-speed response.
Xi1及びXi2はそれぞれ独立して、フッ素原子を表すことが好ましく、より負に大きなΔεを示すにはXi1及びXi2が共にフッ素原子を表すことがより好ましい。
X i1 and X i2 each independently preferably represent a fluorine atom, and in order to exhibit a more negative Δε, it is more preferable that both X i1 and X i2 represent a fluorine atom.
Yi1及びYi2はそれぞれ独立して、酸素原子または硫黄原子を表すことが好ましく、より負に大きなΔεを示すにはYi1及びYi2が共に酸素原子または硫黄原子を表すことがより好ましい。負に大きなΔεを示しつつ液晶表示素子とした際の長期信頼性を向上させるには共に酸素原子であることが好ましい。γ1を重視する場合にはYi1及びYi2のいずれかが-CH2-であることが好ましく、Yi2が-CH2-であることがより好ましい。より大きなΔnを示すには共に硫黄原子であることが好ましい。
Y i1 and Y i2 each independently preferably represent an oxygen atom or a sulfur atom, and it is more preferable that both Y i1 and Y i2 represent an oxygen atom or a sulfur atom in order to exhibit a more negative Δε. In order to improve long-term reliability when a liquid crystal display element is produced while exhibiting a large negative Δε, both are preferably oxygen atoms. is preferably, Y i2 is -CH 2 - - either Y i1 and Y i2 is -CH 2 in the case of emphasizing gamma 1 and more preferably from. In order to show a larger Δn, both are preferably sulfur atoms.
Wi1は
W i1
(但し、式中の黒点はLi2又はYi2への結合点を表す。)
であることが好ましく、Tni及びγ1を重視する場合には (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
It is preferable that when T ni and γ 1 are important
であることが好ましく、Tni及びγ1を重視する場合には (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
It is preferable that when T ni and γ 1 are important
(但し、式中の黒点はLi2又はYi2への結合点を表す。)
であることがより好ましく、他の液晶成分との混和性を上昇させるためには (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
In order to increase the miscibility with other liquid crystal components.
であることがより好ましく、他の液晶成分との混和性を上昇させるためには (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
In order to increase the miscibility with other liquid crystal components.
(但し、式中の黒点はLi2又はYi2への結合点を表す。)
であることがより好ましく、大きなΔnを示すには (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
It is more preferable that to show a large Δn
であることがより好ましく、大きなΔnを示すには (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
It is more preferable that to show a large Δn
(但し、式中の黒点はLi2又はYi2への結合点を表す。)
であることがより好ましい。 (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
It is more preferable that
であることがより好ましい。 (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
It is more preferable that
Wi2は単結合又は-CH2CH2-を表すことが好ましい。
W i2 preferably represents a single bond or —CH 2 CH 2 —.
Li1及びLi2はそれぞれ独立して、水素原子、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基を表すことが好ましく、γ1を低下させる為には、炭素原子数1~8のアルキル基又は炭素原子数2~8のアルケニル基であることが好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。|Δε|を大きくさせるためには、炭素原子数1~8のアルコキシ基又は炭素原子数2~8のアルケニルオキシ基であることが好ましく、炭素原子数1~5のアルコキシ基又は炭素原子数2~5のアルケニルオキシ基であることが特に好ましい。他の液晶成分との混和性を上昇させるためには、Li1及びLi2が異なることが好ましく、アルコキシ基又はアルケニルオキシ基はLi1及びLi2のいずれか一方であることが好ましく、アルコキシ基はLi1であることが特に好ましい。Li1及びLi2中に存在する水素原子はフッ素原子に置換されていても良いが、フッ素原子に置換されていないことが好ましい。
L i1 and L i2 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms. In order to reduce γ 1 , An alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is particularly preferable. Moreover, it is preferable that it is linear. In order to increase | Δε |, it is preferably an alkoxy group having 1 to 8 carbon atoms or an alkenyloxy group having 2 to 8 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms or 2 carbon atoms. Particularly preferred is an alkenyloxy group of 5 to 5. In order to increase the miscibility with other liquid crystal components, L i1 and L i2 are preferably different, and the alkoxy group or alkenyloxy group is preferably one of L i1 and L i2 , Is particularly preferably L i1 . The hydrogen atom present in L i1 and L i2 may be substituted with a fluorine atom, but is preferably not substituted with a fluorine atom.
また、Li1及びLi2は
L i1 and L i2 are
を表すことが好ましい。
Is preferably represented.
Ri1はγ1を低下させる為には、炭素原子数1~8のアルキル基又は炭素原子数2~8のアルケニル基であることが好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。|Δε|を大きくさせるためには、炭素原子数1~8のアルコキシ基又は炭素原子数2~8のアルケニルオキシ基であることが好ましく、炭素原子数1~5のアルコキシ基又は炭素原子数2~5のアルケニルオキシ基であることが特に好ましい。Ri1が複数存在する場合、他の液晶成分との混和性を上昇させるためには、Ri1が互いに異なることが好ましく、アルコキシ基又はアルケニルオキシ基は複数存在するRi1のうちいずれか一つであることが好ましく、アルコキシ基又はアルケニルオキシ基はLi1中のRi1であることが特に好ましい。Ri1中に存在する水素原子はフッ素原子に置換されていても良いが、フッ素原子に置換されていないことが好ましい。
R i1 is preferably an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms in order to reduce γ 1, and an alkyl group having 1 to 5 carbon atoms or the number of carbon atoms Particularly preferred are 2 to 5 alkenyl groups. Moreover, it is preferable that it is linear. In order to increase | Δε |, it is preferably an alkoxy group having 1 to 8 carbon atoms or an alkenyloxy group having 2 to 8 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms or 2 carbon atoms. Particularly preferred is an alkenyloxy group of 5 to 5. When there are a plurality of R i1 s, in order to increase the miscibility with other liquid crystal components, it is preferable that R i1s are different from each other, and any one of R i1s having a plurality of alkoxy groups or alkenyloxy groups exists. And the alkoxy group or alkenyloxy group is particularly preferably R i1 in L i1 . The hydrogen atom present in R i1 may be substituted with a fluorine atom, but is preferably not substituted with a fluorine atom.
Ai1は
A i1 is
から選ばれる基を表すことが好ましい。具体的には、A1はγ1を低下させる為にはトランス-1,4-シクロヘキシレン基、無置換の1,4-フェニレン基、2-フルオロ-1,4-フェニレン基又は3-フルオロ-1,4-フェニレン基であることが好ましく、トランス-1,4-シクロヘキシレン基であることが特に好ましい。他の液晶成分との混和性を向上させる為には、トランス-1,4-シクロヘキシレン基、2-フルオロ-1,4-フェニレン基又は3-フルオロ-1,4-フェニレン基であることが好ましい。Tniを上昇させる為には、無置換の1,4-フェニレン基、無置換の1,4-シクロヘキシレン基、1,4-シクロヘキセニレン基又は無置換のナフタレン-2,6-ジイル基であることが好ましい。負に大きなΔεを示すためには、2-フルオロ-1,4-フェニレン基、3-フルオロ-1,4-フェニレン基又は2,3-ジフルオロー1,4-フェニレン基であることが好ましい。負に大きなΔεを示しながら、他の液晶成分との混和性を両立させるためには、Ai1中に存在するフッ素原子の数の合計は、1~4であることが好ましく、1~3であることが特に好ましい。
It is preferable to represent a group selected from: Specifically, A 1 is a trans-1,4-cyclohexylene group, an unsubstituted 1,4-phenylene group, a 2-fluoro-1,4-phenylene group, or a 3-fluoro group for decreasing γ 1. A 1,4-phenylene group is preferred, and a trans-1,4-cyclohexylene group is particularly preferred. In order to improve miscibility with other liquid crystal components, it may be a trans-1,4-cyclohexylene group, a 2-fluoro-1,4-phenylene group or a 3-fluoro-1,4-phenylene group. preferable. In order to increase T ni , an unsubstituted 1,4-phenylene group, an unsubstituted 1,4-cyclohexylene group, a 1,4-cyclohexenylene group, or an unsubstituted naphthalene-2,6-diyl group It is preferable that In order to exhibit negatively large Δε, a 2-fluoro-1,4-phenylene group, a 3-fluoro-1,4-phenylene group, or a 2,3-difluoro-1,4-phenylene group is preferable. In order to achieve both miscibility with other liquid crystal components while exhibiting a negative Δε, the total number of fluorine atoms present in A i1 is preferably 1 to 4, preferably 1 to 3. It is particularly preferred.
Zi1は、γ1を低下させる為には単結合、-CH2CH2-、-CH2O-又は-OCH2-であることが好ましく、単結合又は-CH2CH2-であることが更に好ましい。Tniを上昇させるためには、単結合、-COO-,-OCO-、-CH=CH-又は-C≡C-であることが好ましく、単結合、-CH=CH-又は-C≡C-であることが更に好ましい。他の液晶成分との混和性を向上させる為には、単結合、-CH2CH2-、-CH2O-又は-OCH2-であることが好ましい。液晶表示素子とした際の長期信頼性を向上させるには単結合であることが好ましい。
Z i1 is preferably a single bond, —CH 2 CH 2 —, —CH 2 O— or —OCH 2 —, and preferably a single bond or —CH 2 CH 2 — in order to decrease γ 1. Is more preferable. In order to increase T ni , a single bond, —COO—, —OCO—, —CH═CH— or —C≡C— is preferable, and a single bond, —CH═CH— or —C≡C— -Is more preferable. In order to improve miscibility with other liquid crystal components, a single bond, —CH 2 CH 2 —, —CH 2 O— or —OCH 2 — is preferable. In order to improve long-term reliability when a liquid crystal display device is used, a single bond is preferable.
ni1が2を表す場合、複数存在するZi1のいずれか一つ以上が単結合を表すことが好ましい。ni1はγ1を重視する場合には1であることが好ましい。Tniを重視する場合には2であることが好ましい。
When n i1 represents 2, it is preferable that any one or more of a plurality of Z i1 represent a single bond. n i1 is preferably 1 when γ 1 is important. When importance is attached to Tni , it is preferably 2.
Li3は水素原子、炭素原子数1から15のアルキル基、炭素原子数1から15のアルコキシ基、炭素原子数2から15のアルケニル基、炭素原子数2から15のアルケニルオキシ基を表すことが好ましく、γ1を低下させる為には、炭素原子数1~8のアルキル基又は炭素原子数2~8のアルケニル基であることが好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。
L i3 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, an alkoxy group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or an alkenyloxy group having 2 to 15 carbon atoms. In order to reduce γ 1 , an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms is preferable. Particularly preferred is an alkenyl group of ˜5. Moreover, it is preferable that it is linear.
また、Li1が水素原子、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基を表す場合、Li3は
When L i1 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms, L i3 is
を表すことが好ましい。
Is preferably represented.
Li4及びLi5はそれぞれ独立して、水素原子、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基を表すことが好ましく、水素原子を表すことがより好ましい。
L i4 and L i5 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms, and more preferably a hydrogen atom.
Li6及びLi7はそれぞれ独立して、水素原子、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基を表すことが好ましく、γ1を低下させる為には、炭素原子数1~8のアルキル基又は炭素原子数2~8のアルケニル基であることが好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。
Li8は水素原子、炭素原子数1から15のアルキル基、炭素原子数1から15のアルコキシ基、炭素原子数2から15のアルケニル基、炭素原子数2から15のアルケニルオキシ基を表すことが好ましく、γ1を低下させる為には、炭素原子数1~8のアルキル基又は炭素原子数2~8のアルケニル基であることが好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。 L i6 and L i7 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms. In order to reduce γ 1 , An alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is particularly preferable. Moreover, it is preferable that it is linear.
L i8 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, an alkoxy group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or an alkenyloxy group having 2 to 15 carbon atoms. In order to reduce γ 1 , an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms is preferable. Particularly preferred is an alkenyl group of ˜5. Moreover, it is preferable that it is linear.
Li8は水素原子、炭素原子数1から15のアルキル基、炭素原子数1から15のアルコキシ基、炭素原子数2から15のアルケニル基、炭素原子数2から15のアルケニルオキシ基を表すことが好ましく、γ1を低下させる為には、炭素原子数1~8のアルキル基又は炭素原子数2~8のアルケニル基であることが好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。 L i6 and L i7 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms. In order to reduce γ 1 , An alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is particularly preferable. Moreover, it is preferable that it is linear.
L i8 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, an alkoxy group having 1 to 15 carbon atoms, an alkenyl group having 2 to 15 carbon atoms, or an alkenyloxy group having 2 to 15 carbon atoms. In order to reduce γ 1 , an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms is preferable. Particularly preferred is an alkenyl group of ˜5. Moreover, it is preferable that it is linear.
また、Li2が水素原子、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基を表す場合、Li8が、
When L i2 represents a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms, L i8 is
を表すことが好ましい。
Is preferably represented.
Li9及びLi10はそれぞれ独立して、水素原子、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基を表すことが好ましく、水素原子を表すことがより好ましい。
L i9 and L i10 each independently represent a hydrogen atom, an alkyl group having 1 to 15 carbon atoms, or an alkenyl group having 2 to 15 carbon atoms, and more preferably a hydrogen atom.
一般式(i)で表される化合物において
In the compound represented by the general formula (i)
で表される基が存在する場合、他の液晶成分との混和性を高くする為に、当該基の数は2つ以下であることが好ましい。一般式(i)中に当該基の数が2つ存在する場合、Li1及びLi2、Li1及びLi8、Li3及びLi2、又はLi3及びLi8の位置に存在することが好ましい。一般式(i)中に当該基の数が2つ存在する場合、Li1及びLi2の位置に存在することが好ましい。 なお、一般式(i)で表される化合物において、ヘテロ原子同士が直接結合する構造となることはない。
一般式(i)の中では以下の一般式(i-1)~一般式(i-946)で表される各化合物が好ましい。その中で特に好ましい化合物は、(i-1)、(i-2)、(i-3)、(i-4)、(i-5)、(i-6)、(i-7)、(i-8)、(i-9)、(i-10)、(i-11)、(i-12)である。 In the case where a group represented by the formula (1) is present, the number of the groups is preferably 2 or less in order to increase the miscibility with other liquid crystal components. When there are two such groups in general formula (i), it is preferably present at the positions of L i1 and L i2 , L i1 and L i8 , L i3 and L i2 , or L i3 and L i8. . When two groups exist in the general formula (i), it is preferably present at the positions of L i1 and L i2 . In addition, in the compound represented by general formula (i), it does not become a structure where hetero atoms are directly bonded.
Of the general formula (i), compounds represented by the following general formulas (i-1) to (i-946) are preferable. Among them, particularly preferred compounds are (i-1), (i-2), (i-3), (i-4), (i-5), (i-6), (i-7), (I-8), (i-9), (i-10), (i-11), (i-12).
一般式(i)の中では以下の一般式(i-1)~一般式(i-946)で表される各化合物が好ましい。その中で特に好ましい化合物は、(i-1)、(i-2)、(i-3)、(i-4)、(i-5)、(i-6)、(i-7)、(i-8)、(i-9)、(i-10)、(i-11)、(i-12)である。 In the case where a group represented by the formula (1) is present, the number of the groups is preferably 2 or less in order to increase the miscibility with other liquid crystal components. When there are two such groups in general formula (i), it is preferably present at the positions of L i1 and L i2 , L i1 and L i8 , L i3 and L i2 , or L i3 and L i8. . When two groups exist in the general formula (i), it is preferably present at the positions of L i1 and L i2 . In addition, in the compound represented by general formula (i), it does not become a structure where hetero atoms are directly bonded.
Of the general formula (i), compounds represented by the following general formulas (i-1) to (i-946) are preferable. Among them, particularly preferred compounds are (i-1), (i-2), (i-3), (i-4), (i-5), (i-6), (i-7), (I-8), (i-9), (i-10), (i-11), (i-12).
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
(式中、Ri1及びRi2は、一般式(i)におけるRi1と同じ意味を表す。)
(Wherein, R i1 and R i2 are the general formula (i) represents the same meaning as R i1.)
本発明において、一般式(i)で表される化合物は、例えば、一般式(i-r1)
In the present invention, the compound represented by the general formula (i) is, for example, the general formula (i-r1)
(式中Xi2、Yi2、Wi1、Li2及びLi5は一般式(i)におけるXi2、Yi2、Wi1、Li2及びLi5とそれぞれ同じ意味を表すが、複数存在するXi2は同一であっても異なっていてもよく、
Ri3及びRi4はそれぞれ独立に水素原子、メチル基、エチル基、もしくはプロピル基を表すか、またはRi3及びRi4は互いに結合して環状の構造となり-CH2-CH2-、-CH2-CH2-CH2-、又は-CH2-C(CH3)2-CH2-を表し、
破線は結合が存在しなくても良く、存在しても良いことを表す。)
で表される化合物と、一般式(i-r2) ( Wherein X i2 , Y i2 , W i1 , L i2 and L i5 represent the same meaning as X i2 , Y i2 , W i1 , L i2 and L i5 in general formula (i), respectively, but a plurality of X i2 may be different even in the same,
R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
A broken line indicates that a bond may not exist or may exist. )
And a compound of the general formula (ir-2)
Ri3及びRi4はそれぞれ独立に水素原子、メチル基、エチル基、もしくはプロピル基を表すか、またはRi3及びRi4は互いに結合して環状の構造となり-CH2-CH2-、-CH2-CH2-CH2-、又は-CH2-C(CH3)2-CH2-を表し、
破線は結合が存在しなくても良く、存在しても良いことを表す。)
で表される化合物と、一般式(i-r2) ( Wherein X i2 , Y i2 , W i1 , L i2 and L i5 represent the same meaning as X i2 , Y i2 , W i1 , L i2 and L i5 in general formula (i), respectively, but a plurality of X i2 may be different even in the same,
R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
A broken line indicates that a bond may not exist or may exist. )
And a compound of the general formula (ir-2)
(式中Xi1、Yi1、Li1、Li3、Li4及びWi2は一般式(i)におけるXi1、Yi1、Li1、Li3、Li4及びWi2とそれぞれ同じ意味を表し、
Xi3は塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基を表す。)
で表される化合物を遷移金属触媒及び塩基存在下反応させることにより、一般式(i-r3) ( Wherein X i1 , Y i1 , L i1 , L i3 , L i4 and W i2 represent the same meanings as X i1 , Y i1 , L i1 , L i3 , L i4 and W i2 in general formula (i), respectively. ,
X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, or a trifluoromethanesulfonyloxy group. )
Is reacted in the presence of a transition metal catalyst and a base to give a compound of the general formula (ir-3)
Xi3は塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基を表す。)
で表される化合物を遷移金属触媒及び塩基存在下反応させることにより、一般式(i-r3) ( Wherein X i1 , Y i1 , L i1 , L i3 , L i4 and W i2 represent the same meanings as X i1 , Y i1 , L i1 , L i3 , L i4 and W i2 in general formula (i), respectively. ,
X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, or a trifluoromethanesulfonyloxy group. )
Is reacted in the presence of a transition metal catalyst and a base to give a compound of the general formula (ir-3)
(式中Xi1、Xi2、Yi1、Yi2、Wi1、Wi2、Li1、Li2、Li3、Li4及びLi5は一般式(i)におけるXi1、Xi2、Yi1、Yi2、Wi1、Wi2、Li1、Li2、Li3、Li4及びLi5とそれぞれ同じ意味を表すが、複数存在するXi2は同一であっても異なっていてもよく、
破線は結合が存在しなくても良く、存在しても良いことを表す。)
で表される化合物を得た後、該一般式(i-r3)中の-Yi1-Hを塩基により脱プロトン化しアニオンを生成することで分子内反応させることによって得られる。
また一般式(i)で表される化合物は、例えば、一般式(i-r4) ( Wherein X i1 , X i2 , Y i1 , Y i2 , W i1 , W i2 , L i1 , L i2 , L i3 , L i4 and L i5 are X i1 , X i2 , Y i1 in the general formula (i)). , Y i2 , W i1 , W i2 , L i1 , L i2 , L i3 , L i4 and L i5 each represent the same meaning, but a plurality of X i2 may be the same or different,
A broken line indicates that a bond may not exist or may exist. )
Is obtained by deprotonating —Y i1 —H in the general formula (i-r3) with a base to generate an anion, thereby causing an intramolecular reaction.
The compound represented by the general formula (i) is, for example, the general formula (i-r4)
破線は結合が存在しなくても良く、存在しても良いことを表す。)
で表される化合物を得た後、該一般式(i-r3)中の-Yi1-Hを塩基により脱プロトン化しアニオンを生成することで分子内反応させることによって得られる。
また一般式(i)で表される化合物は、例えば、一般式(i-r4) ( Wherein X i1 , X i2 , Y i1 , Y i2 , W i1 , W i2 , L i1 , L i2 , L i3 , L i4 and L i5 are X i1 , X i2 , Y i1 in the general formula (i)). , Y i2 , W i1 , W i2 , L i1 , L i2 , L i3 , L i4 and L i5 each represent the same meaning, but a plurality of X i2 may be the same or different,
A broken line indicates that a bond may not exist or may exist. )
Is obtained by deprotonating —Y i1 —H in the general formula (i-r3) with a base to generate an anion, thereby causing an intramolecular reaction.
The compound represented by the general formula (i) is, for example, the general formula (i-r4)
(式中Xi1、Xi2、Yi1、Yi2、Wi2、Li1、Li3、Li4及びLi5は一般式(i)におけるXi1、Xi2、Yi1、Yi2、Wi2、Li1、Li3、Li4及びLi5とそれぞれ同じ意味を表し、
Li11はLi1と同じ意味を表す。)
で表される化合物を有機金属試薬により脱プロトン化した後、臭素又はよう素と反応させることにより、一般式(i-r5) ( Where X i1 , X i2 , Y i1 , Y i2 , W i2 , L i1 , L i3 , L i4 and L i5 are X i1 , X i2 , Y i1 , Y i2 , W i2 in the general formula (i)). , L i1 , L i3 , L i4 and L i5 each have the same meaning,
L i11 represents the same meaning as L i1 . )
The compound represented by general formula (ir5) is deprotonated with an organometallic reagent and then reacted with bromine or iodine.
Li11はLi1と同じ意味を表す。)
で表される化合物を有機金属試薬により脱プロトン化した後、臭素又はよう素と反応させることにより、一般式(i-r5) ( Where X i1 , X i2 , Y i1 , Y i2 , W i2 , L i1 , L i3 , L i4 and L i5 are X i1 , X i2 , Y i1 , Y i2 , W i2 in the general formula (i)). , L i1 , L i3 , L i4 and L i5 each have the same meaning,
L i11 represents the same meaning as L i1 . )
The compound represented by general formula (ir5) is deprotonated with an organometallic reagent and then reacted with bromine or iodine.
(式中Xi1、Xi2、Yi1、Yi2、Wi2、Li1、Li3、Li4及びLi5は一般式(i)におけるXi1、Xi2、Yi1、Yi2、Wi2、Li1、Li3、Li4及びLi5とそれぞれ同じ意味を表し、
Li11はLi1と同じ意味を表し、
Xi3は臭素原子又はよう素原子を表す。)
で表される化合物を得、一般式(i-r6) ( Where X i1 , X i2 , Y i1 , Y i2 , W i2 , L i1 , L i3 , L i4 and L i5 are X i1 , X i2 , Y i1 , Y i2 , W i2 in the general formula (i)). , L i1 , L i3 , L i4 and L i5 each have the same meaning,
L i11 represents the same meaning as L i1 ,
X i3 represents a bromine atom or an iodine atom. )
To obtain a compound represented by the general formula (ir-6)
Li11はLi1と同じ意味を表し、
Xi3は臭素原子又はよう素原子を表す。)
で表される化合物を得、一般式(i-r6) ( Where X i1 , X i2 , Y i1 , Y i2 , W i2 , L i1 , L i3 , L i4 and L i5 are X i1 , X i2 , Y i1 , Y i2 , W i2 in the general formula (i)). , L i1 , L i3 , L i4 and L i5 each have the same meaning,
L i11 represents the same meaning as L i1 ,
X i3 represents a bromine atom or an iodine atom. )
To obtain a compound represented by the general formula (ir-6)
(式中Li2は一般式(i)におけるLi2と同じ意味を表す。)
で表される化合物と遷移金属触媒、銅触媒及び塩基存在下反応させることにより、一般式(i-r7) (Wherein L i2 are as defined L i2 in the general formula (i).)
Is reacted with a compound represented by general formula (ir-7) in the presence of a transition metal catalyst, a copper catalyst and a base.
で表される化合物と遷移金属触媒、銅触媒及び塩基存在下反応させることにより、一般式(i-r7) (Wherein L i2 are as defined L i2 in the general formula (i).)
Is reacted with a compound represented by general formula (ir-7) in the presence of a transition metal catalyst, a copper catalyst and a base.
(式中Xi1、Xi2、Yi1、Yi2、Wi2、Li1、Li2、Li3、Li4及びLi5は一般式(i)におけるXi1、Xi2、Yi1、Yi2、Wi2、Li1、Li2、Li3、Li4及びLi5とそれぞれ同じ意味を表し、
Li11はLi1と同じ意味を表す。)
で表される化合物を得た後、該一般式(i-r7)中の-Yi2-Li11を水存在下酸による脱保護反応と分子内反応を同時に進行させることによってWi1が ( Where X i1 , X i2 , Y i1 , Y i2 , W i2 , L i1 , L i2 , L i3 , L i4, and L i5 are X i1 , X i2 , Y i1 , Y i2 in general formula (i)). , W i2 , L i1 , L i2 , L i3 , L i4 and L i5 respectively,
L i11 represents the same meaning as L i1 . )
After obtaining a compound represented by in, W i1 By the -Y i2 -L i11 in the general formula (i-r7) to proceed deprotection reaction and intramolecular reaction by the presence of water acid simultaneously
Li11はLi1と同じ意味を表す。)
で表される化合物を得た後、該一般式(i-r7)中の-Yi2-Li11を水存在下酸による脱保護反応と分子内反応を同時に進行させることによってWi1が ( Where X i1 , X i2 , Y i1 , Y i2 , W i2 , L i1 , L i2 , L i3 , L i4, and L i5 are X i1 , X i2 , Y i1 , Y i2 in general formula (i)). , W i2 , L i1 , L i2 , L i3 , L i4 and L i5 respectively,
L i11 represents the same meaning as L i1 . )
After obtaining a compound represented by in, W i1 By the -Y i2 -L i11 in the general formula (i-r7) to proceed deprotection reaction and intramolecular reaction by the presence of water acid simultaneously
(但し、式中の黒点はLi2又はYi2への結合点を表す。)
で表されるものとして得られる。またその化合物の二重結合に付加反応させることによってWi1が (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
It is obtained as represented by In addition, an addition reaction to the double bond of the compound causes W i1 to
で表されるものとして得られる。またその化合物の二重結合に付加反応させることによってWi1が (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
It is obtained as represented by In addition, an addition reaction to the double bond of the compound causes W i1 to
(但し、式中の黒点はLi2又はYi2への結合点を表す。)
で表されるものが得られる。より具体的には、以下のようにして製造することができる。勿論本発明の趣旨及び適用範囲は、これら製造例により制限されるものではない。
(製造方法1) (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
Can be obtained. More specifically, it can be produced as follows. Of course, the spirit and scope of the present invention are not limited by these production examples.
(Manufacturing method 1)
で表されるものが得られる。より具体的には、以下のようにして製造することができる。勿論本発明の趣旨及び適用範囲は、これら製造例により制限されるものではない。
(製造方法1) (However, the black point in the formula represents the point of attachment to L i2 or Y i2 .)
Can be obtained. More specifically, it can be produced as follows. Of course, the spirit and scope of the present invention are not limited by these production examples.
(Manufacturing method 1)
(式中、Li1、Li2、Xi1及びXi2は、一般式(i)におけるLi1、Li2、Xi1及びXi2と同じ意味を表し、
Ri3及びRi4はそれぞれ独立に水素原子、メチル基、エチル基、もしくはプロピル基を表すか、またはRi3及びRi4は互いに結合して環状の構造となり-CH2-CH2-、-CH2-CH2-CH2-、又は-CH2-C(CH3)2-CH2-を表し、
Li11はLi1と同じ意味を表し、
Xi3は塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基を表し、
Xi4は塩素原子、臭素原子又はよう素原子を表し、
Xi5は臭素原子又はよう素原子を表し、
Yi3は-O-又は-S-を表す。)
一般式(S-1)で表される化合物を(S-2)で表される化合物と遷移金属触媒及び塩基存在下反応させることにより一般式(S-3)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。 ( Wherein L i1 , L i2 , X i1 and X i2 represent the same meaning as L i1 , L i2 , X i1 and X i2 in the general formula (i),
R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
L i11 represents the same meaning as L i1 ,
X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, a trifluoromethanesulfonyloxy group,
X i4 represents a chlorine atom, a bromine atom or an iodine atom,
X i5 represents a bromine atom or an iodine atom,
Y i3 represents —O— or —S—. )
A compound represented by general formula (S-3) is obtained by reacting a compound represented by general formula (S-1) with a compound represented by (S-2) in the presence of a transition metal catalyst and a base. Can do.
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Tetrakis (triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium dichloride (II), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) dichloride is preferred, Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] dichloride More preferably, it is palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
Ri3及びRi4はそれぞれ独立に水素原子、メチル基、エチル基、もしくはプロピル基を表すか、またはRi3及びRi4は互いに結合して環状の構造となり-CH2-CH2-、-CH2-CH2-CH2-、又は-CH2-C(CH3)2-CH2-を表し、
Li11はLi1と同じ意味を表し、
Xi3は塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基を表し、
Xi4は塩素原子、臭素原子又はよう素原子を表し、
Xi5は臭素原子又はよう素原子を表し、
Yi3は-O-又は-S-を表す。)
一般式(S-1)で表される化合物を(S-2)で表される化合物と遷移金属触媒及び塩基存在下反応させることにより一般式(S-3)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。 ( Wherein L i1 , L i2 , X i1 and X i2 represent the same meaning as L i1 , L i2 , X i1 and X i2 in the general formula (i),
R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
L i11 represents the same meaning as L i1 ,
X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, a trifluoromethanesulfonyloxy group,
X i4 represents a chlorine atom, a bromine atom or an iodine atom,
X i5 represents a bromine atom or an iodine atom,
Y i3 represents —O— or —S—. )
A compound represented by general formula (S-3) is obtained by reacting a compound represented by general formula (S-1) with a compound represented by (S-2) in the presence of a transition metal catalyst and a base. Can do.
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Tetrakis (triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium dichloride (II), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) dichloride is preferred, Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] dichloride More preferably, it is palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
使用する反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラヒドロフラン、ジエチルエーテル、tert-ブチルメチルエーテル等のエーテル系溶媒、メタノール、エタノール、プロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン等の芳香族系溶媒が好ましく、テトラヒドロフラン、エタノール、トルエンが更に好ましい。また、反応を好適に進行させるため、必要に応じて水を用いても良い。
The reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred. Further, water may be used as necessary in order to allow the reaction to proceed appropriately.
使用する塩基としては、反応を好適に進行させるものであればいずれでも構わないが、炭酸カリウム、炭酸ナトリウム、炭酸セシウム等の炭酸塩、りん酸三カリウム、りん酸二水素カリウム等のりん酸塩が好ましく、炭酸カリウム、炭酸セシウム、りん酸三カリウムが更に好ましい。
Any base can be used as long as it allows the reaction to proceed suitably. Carbonates such as potassium carbonate, sodium carbonate and cesium carbonate; phosphates such as tripotassium phosphate and potassium dihydrogen phosphate; Are preferable, and potassium carbonate, cesium carbonate, and tripotassium phosphate are more preferable.
反応温度としては、反応を好適に進行させるものであれば何度でも構わないが、室温から使用している溶媒が還流する温度までが好ましく、40℃から溶媒が還流するまでの温度が更に好ましく、60℃から溶媒が還流するまでの温度であることが特に好ましい。
一般式(S-3)で表される化合物を分子内反応させることによって一般式(S-4)で表される化合物を得ることができる。この分子内反応は一般式(S-3)の-Yi3-Hを塩基により脱プロトン化しアニオンを生成することで行うことができる。
この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属りん酸塩、アルカリ金属りん酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属りん酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属りん酸塩としてはりん酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。 The reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
The compound represented by the general formula (S-4) can be obtained by intramolecular reaction of the compound represented by the general formula (S-3). This intramolecular reaction can be performed by deprotonating —Y i3 —H of the general formula (S-3) with a base to generate an anion.
Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
一般式(S-3)で表される化合物を分子内反応させることによって一般式(S-4)で表される化合物を得ることができる。この分子内反応は一般式(S-3)の-Yi3-Hを塩基により脱プロトン化しアニオンを生成することで行うことができる。
この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属りん酸塩、アルカリ金属りん酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属りん酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属りん酸塩としてはりん酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。 The reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
The compound represented by the general formula (S-4) can be obtained by intramolecular reaction of the compound represented by the general formula (S-3). This intramolecular reaction can be performed by deprotonating —Y i3 —H of the general formula (S-3) with a base to generate an anion.
Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether, and examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and examples of polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Of these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Moreover, each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、30℃から120℃がより好ましい。
The reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 30 ° C to 120 ° C.
一般式(S-4)で表される化合物を酸化することにより一般式(S-5)で表される化合物を得ることができる。この酸化は、有機金属試薬により脱プロトン化した後、ほう酸トリアルキルと反応させてほう素化合物とし、その後酸化剤を作用させることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。 The compound represented by the general formula (S-5) can be obtained by oxidizing the compound represented by the general formula (S-4). This oxidation can be carried out by deprotonation with an organometallic reagent, reaction with a trialkyl borate to form a boron compound, and subsequent action of an oxidizing agent.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred. Examples of the organometallic reagent include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramerpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。 The compound represented by the general formula (S-5) can be obtained by oxidizing the compound represented by the general formula (S-4). This oxidation can be carried out by deprotonation with an organometallic reagent, reaction with a trialkyl borate to form a boron compound, and subsequent action of an oxidizing agent.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred. Examples of the organometallic reagent include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramerpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
ほう酸トリアルキルとしては、ほう酸トリメチル、ほう酸トリエチル、ほう酸トリプロピルおよびほう酸トリイソプロピルを用いるのが好ましいが、入手および取り扱いの容易さからほう酸トリメチルおよびほう酸トリイソプロピルがより好ましい。ほう酸トリアルキルと有機金属試薬の組み合わせとしては、上記で挙げたいずれの組み合わせも可能であるが、sec-ブチルリチウムとほう酸トリメチルの組み合わせ、およびリチウム ジイソプロピルアミドとほう酸トリイソプロピルの組み合わせが好ましく、リチウム ジイソプロピルアミドとほう酸トリイソプロピルの組み合わせがより好ましい。ほう素化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。得られたほう素化合物は一度単離してもよく、単離せずそのまま酸化剤と反応させてもよい。また、得られたほう素化合物を加水分解してほう酸化合物へと変換した後に酸化剤と反応させても構わない。
As the trialkyl borate, trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling. As the combination of trialkyl borate and organometallic reagent, any of the above-mentioned combinations are possible, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred. The reaction temperature during boriding is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C. The obtained boron compound may be isolated once or may be reacted with an oxidizing agent without isolation. Further, the obtained boron compound may be hydrolyzed and converted into a boric acid compound and then reacted with an oxidizing agent.
酸化剤としては、過酸化水素水、過酢酸または過ギ酸を用いるのが好ましい。反応温度は-78℃から70℃が好ましく、0℃から50℃がより好ましい。また、酸化剤との反応時には、溶媒に水が含まれていても構わない。
一般式(S-5)の水酸基を塩基によりフェノラートとして一般式(S-6)と反応させることによって一般式(S-7)で表される化合物を得ることができる。 As the oxidizing agent, it is preferable to use hydrogen peroxide, peracetic acid or performic acid. The reaction temperature is preferably -78 ° C to 70 ° C, more preferably 0 ° C to 50 ° C. Moreover, water may be contained in the solvent at the time of reaction with an oxidizing agent.
The compound represented by the general formula (S-7) can be obtained by reacting the hydroxyl group of the general formula (S-5) with the base as a phenolate with the general formula (S-6).
一般式(S-5)の水酸基を塩基によりフェノラートとして一般式(S-6)と反応させることによって一般式(S-7)で表される化合物を得ることができる。 As the oxidizing agent, it is preferable to use hydrogen peroxide, peracetic acid or performic acid. The reaction temperature is preferably -78 ° C to 70 ° C, more preferably 0 ° C to 50 ° C. Moreover, water may be contained in the solvent at the time of reaction with an oxidizing agent.
The compound represented by the general formula (S-7) can be obtained by reacting the hydroxyl group of the general formula (S-5) with the base as a phenolate with the general formula (S-6).
この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属リン酸塩、アルカリ金属リン酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属リン酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属リン酸塩としてはリン酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably. Ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether, and examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and examples of polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Of these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Moreover, each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably. Ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether, and examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and examples of polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Of these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Moreover, each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、30℃から120℃がより好ましい。なお、生成したフェノラートを一度単離してから一般式(S-5)で表される化合物と反応させてもよく、単離せずに反応させてもよいが、作業の容易さから単離せずに反応させたほうがよい。
一般式(S-7)で表される化合物をハロゲン化することにより一般式(S-8)で表される化合物を得ることができる。このハロゲン化は、有機金属試薬により脱プロトン化した後、臭素又はよう素と反応させてハロゲン化合物とすることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。 The reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C. The generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
The compound represented by the general formula (S-8) can be obtained by halogenating the compound represented by the general formula (S-7). This halogenation can be performed by deprotonation with an organometallic reagent and then reacting with bromine or iodine to form a halogen compound.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
一般式(S-7)で表される化合物をハロゲン化することにより一般式(S-8)で表される化合物を得ることができる。このハロゲン化は、有機金属試薬により脱プロトン化した後、臭素又はよう素と反応させてハロゲン化合物とすることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。 The reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C. The generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
The compound represented by the general formula (S-8) can be obtained by halogenating the compound represented by the general formula (S-7). This halogenation can be performed by deprotonation with an organometallic reagent and then reacting with bromine or iodine to form a halogen compound.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメチルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。
一般式(S-8)で表される化合物を(S-9)で表される化合物と遷移金属触媒、銅触媒及び塩基存在下反応させることにより一般式(S-10)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。
使用する銅触媒としては、反応を好適に進行させるものであればいずれでも構わないが、塩化銅(I)、臭化銅(I)、よう化銅(I)、酢酸銅(I)等の1価の銅触媒が好ましく、よう化銅(I)であることが更に好ましい。 Examples of organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
A compound represented by general formula (S-10) by reacting a compound represented by general formula (S-8) with a compound represented by (S-9) in the presence of a transition metal catalyst, a copper catalyst and a base. Can be obtained.
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Tetrakis (triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium dichloride (II), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) dichloride is preferred, Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] dichloride More preferably, it is palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
Any copper catalyst may be used as long as it allows the reaction to proceed suitably, but copper (I) chloride, copper (I) bromide, copper iodide (I), copper acetate (I), etc. A monovalent copper catalyst is preferred, and copper (I) iodide is more preferred.
一般式(S-8)で表される化合物を(S-9)で表される化合物と遷移金属触媒、銅触媒及び塩基存在下反応させることにより一般式(S-10)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。
使用する銅触媒としては、反応を好適に進行させるものであればいずれでも構わないが、塩化銅(I)、臭化銅(I)、よう化銅(I)、酢酸銅(I)等の1価の銅触媒が好ましく、よう化銅(I)であることが更に好ましい。 Examples of organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
A compound represented by general formula (S-10) by reacting a compound represented by general formula (S-8) with a compound represented by (S-9) in the presence of a transition metal catalyst, a copper catalyst and a base. Can be obtained.
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Tetrakis (triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium dichloride (II), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) dichloride is preferred, Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] dichloride More preferably, it is palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
Any copper catalyst may be used as long as it allows the reaction to proceed suitably, but copper (I) chloride, copper (I) bromide, copper iodide (I), copper acetate (I), etc. A monovalent copper catalyst is preferred, and copper (I) iodide is more preferred.
使用する反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラヒドロフラン、ジエチルエーテル、tert-ブチルメチルエーテル等のエーテル系溶媒、メタノール、エタノール、プロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン等の芳香族系溶媒、N,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等の極性溶媒が好ましく、テトラヒドロフラン、エタノール、トルエン、N,N-ジメチルホルムアミドが更に好ましい。また、反応を好適に進行させるため、必要に応じて水を用いても良い。
The reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene, polar solvents such as N, N-dimethylformamide, N-methylpyrrolidone, dimethyl sulfoxide and sulfolane are preferred, and tetrahydrofuran, ethanol, toluene and N, N-dimethylformamide are more preferred. . Further, water may be used as necessary in order to allow the reaction to proceed appropriately.
使用する塩基としては、反応を好適に進行させるものであればいずれでも構わないが、トリエチルアミン、ジエチルアミン、エチルアミン、トリメチルアミン、ジメチルアミン、メチルアミン、ジイソプロピルエチルアミン、ジイソプロピルアミン、イソプロピルアミン、N,N-テトラメチルエチレンジアミン、エチレンジアミン、トリエタノールアミン、ジエタノールアミン、エタノールアミン等のアミン、炭酸カリウム、炭酸ナトリウム、炭酸セシウム等の炭酸塩、りん酸三カリウム、りん酸二水素カリウム等のりん酸塩が好ましく、トリエチルアミン、ジエチルアミン、ジイソプロピルエチルアミン、ジイソプロピルアミンが更に好ましい。
Any base can be used as long as it allows the reaction to proceed appropriately. Triethylamine, diethylamine, ethylamine, trimethylamine, dimethylamine, methylamine, diisopropylethylamine, diisopropylamine, isopropylamine, N, N-tetra Preferred are amines such as methylethylenediamine, ethylenediamine, triethanolamine, diethanolamine, ethanolamine, carbonates such as potassium carbonate, sodium carbonate, cesium carbonate, phosphates such as tripotassium phosphate, potassium dihydrogen phosphate, triethylamine, Diethylamine, diisopropylethylamine, and diisopropylamine are more preferable.
反応温度としては、反応を好適に進行させるものであれば何度でも構わないが、室温から使用している溶媒が還流する温度までが好ましく、40℃から溶媒が還流するまでの温度が更に好ましく、60℃から溶媒が還流するまでの温度であることが特に好ましい。
The reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
一般式(S-10)で表される化合物を水存在下酸による脱保護と分子内反応を同時に行うことにより一般式(S-11)で表される化合物を得ることができる。
The compound represented by the general formula (S-11) can be obtained by simultaneously performing deprotection with an acid and intramolecular reaction in the presence of water in the compound represented by the general formula (S-10).
使用する酸としては反応を好適に進行させるものであればいずれでも構わないが、塩酸、硫酸等の無機酸、p-トルエンスルホン酸等のスルホン酸類等が好ましく、塩酸が更に好ましい。
Any acid can be used as long as it allows the reaction to proceed suitably, but inorganic acids such as hydrochloric acid and sulfuric acid, sulfonic acids such as p-toluenesulfonic acid, and the like are preferable, and hydrochloric acid is more preferable.
使用する溶媒としては反応を好適に進行させるものであればいずれでも構わないが、テトラヒドロフラン、エタノール、メタノール、イソプロピルアルコール等の水溶性溶媒が好ましい。
As the solvent to be used, any solvent can be used as long as it allows the reaction to proceed suitably, but water-soluble solvents such as tetrahydrofuran, ethanol, methanol, isopropyl alcohol and the like are preferable.
反応温度としては、反応を好適に進行させる温度であればいずれでも構わないが、室温から溶媒の沸点までの温度が好ましい。
The reaction temperature may be any temperature that allows the reaction to proceed suitably, but a temperature from room temperature to the boiling point of the solvent is preferred.
一般式(S-11)で表される化合物を有機溶媒中、金属触媒存在下、水素ガスと反応させることにより一般式(S-12)で表される化合物を得ることができる。
The compound represented by the general formula (S-12) can be obtained by reacting the compound represented by the general formula (S-11) with hydrogen gas in the presence of a metal catalyst in an organic solvent.
使用する有機溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、ジイソプロピルエーテル、ジエチルエーテル、1,4-ジオキサン又はテトラヒドロフラン等のエーテル系溶媒、ヘキサン、ヘプタン、トルエン又はキシレン等の炭化水素系溶媒、メタノール、エタノール、プロパノール、イソプロピルアルコール又はブタノール等のアルコール系溶媒、酢酸エチル又は酢酸ブチル等のエステル系溶媒が好ましく、テトラヒドロフラン、ヘキサン、ヘプタン、トルエン、エタノール又は酢酸エチルが好ましい。また、必要に応じて塩酸、酢酸又は硫酸等の酸を添加する事も好ましい。
Any organic solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents such as diisopropyl ether, diethyl ether, 1,4-dioxane or tetrahydrofuran, hexane, heptane, toluene or xylene, etc. Hydrocarbon solvents, alcohol solvents such as methanol, ethanol, propanol, isopropyl alcohol or butanol, and ester solvents such as ethyl acetate or butyl acetate are preferred, and tetrahydrofuran, hexane, heptane, toluene, ethanol or ethyl acetate are preferred. Moreover, it is also preferable to add acids, such as hydrochloric acid, acetic acid, or a sulfuric acid, as needed.
反応温度としては、反応を好適に進行させる温度であればいずれでも構わないが、0℃から80℃が好ましく、室温から60℃が更に好ましい。
The reaction temperature may be any temperature that allows the reaction to proceed suitably, but is preferably 0 ° C. to 80 ° C., more preferably room temperature to 60 ° C.
使用する金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、パラジウム炭素、ルテニウム炭素、白金黒又は酸化白金が好ましく、パラジウム炭素が更に好ましい。
The metal catalyst to be used may be any metal catalyst that allows the reaction to proceed suitably, but is preferably palladium carbon, ruthenium carbon, platinum black or platinum oxide, and more preferably palladium carbon.
反応する際の水素圧は、反応を好適に進行させるものであればいずれでも構わないが、大気圧から0.5MPaであることが好ましく、0.2MPaから0.5MPaであることが更に好ましい。
(製造方法2) The hydrogen pressure at the time of reaction may be any as long as it allows the reaction to proceed suitably, but is preferably from atmospheric pressure to 0.5 MPa, and more preferably from 0.2 MPa to 0.5 MPa.
(Manufacturing method 2)
(製造方法2) The hydrogen pressure at the time of reaction may be any as long as it allows the reaction to proceed suitably, but is preferably from atmospheric pressure to 0.5 MPa, and more preferably from 0.2 MPa to 0.5 MPa.
(Manufacturing method 2)
(式中、Li1、Li2、Xi1、Xi2、Yi2及びWi1は、一般式(i)におけるLi1、Li2、Xi1、Xi2、Yi2及びWi1と同じ意味を表し、
Ri3及びRi4はそれぞれ独立に水素原子、メチル基、エチル基、もしくはプロピル基を表すか、またはRi3及びRi4は互いに結合して環状の構造となり-CH2-CH2-、-CH2-CH2-CH2-、又は-CH2-C(CH3)2-CH2-を表し、
Xi3は塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基を表し、
Xi4は臭素原子又はよう素原子を表し、
Yi3は-O-又は-S-を表す。)
一般式(S-13)で表される化合物をほう素化することにより一般式(S-14)で表される化合物を得ることができる。このほう素化は、有機金属試薬により脱プロトン化した後、ほう酸トリアルキルと反応させてほう素化合物とすることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。 (Wherein, L i1, L i2, X i1 , X i2, Y i2 and W i1 are the same meaning in the general formula (i) and L i1, L i2, X i1 , X i2, Y i2 and W i1 Represent,
R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, a trifluoromethanesulfonyloxy group,
X i4 represents a bromine atom or an iodine atom,
Y i3 represents —O— or —S—. )
The compound represented by the general formula (S-14) can be obtained by boronizing the compound represented by the general formula (S-13). This boronation can be performed by deprotonation with an organometallic reagent and then reacting with a trialkyl borate to form a boron compound.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
Ri3及びRi4はそれぞれ独立に水素原子、メチル基、エチル基、もしくはプロピル基を表すか、またはRi3及びRi4は互いに結合して環状の構造となり-CH2-CH2-、-CH2-CH2-CH2-、又は-CH2-C(CH3)2-CH2-を表し、
Xi3は塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基を表し、
Xi4は臭素原子又はよう素原子を表し、
Yi3は-O-又は-S-を表す。)
一般式(S-13)で表される化合物をほう素化することにより一般式(S-14)で表される化合物を得ることができる。このほう素化は、有機金属試薬により脱プロトン化した後、ほう酸トリアルキルと反応させてほう素化合物とすることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。 (Wherein, L i1, L i2, X i1 , X i2, Y i2 and W i1 are the same meaning in the general formula (i) and L i1, L i2, X i1 , X i2, Y i2 and W i1 Represent,
R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, a trifluoromethanesulfonyloxy group,
X i4 represents a bromine atom or an iodine atom,
Y i3 represents —O— or —S—. )
The compound represented by the general formula (S-14) can be obtained by boronizing the compound represented by the general formula (S-13). This boronation can be performed by deprotonation with an organometallic reagent and then reacting with a trialkyl borate to form a boron compound.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメチルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。
Examples of organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide. N-Butyllithium, sec-butyllithium and lithium diisopropylamide are preferred from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide capable of efficient deprotonation are more preferred. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
ほう酸トリアルキルとしては、ほう酸トリメチル、ほう酸トリエチル、ほう酸トリプロピルおよびほう酸トリイソプロピルを用いるのが好ましいが、入手および取り扱いの容易さからほう酸トリメチルおよびほう酸トリイソプロピルがより好ましい。ほう酸トリアルキルと有機金属試薬の組み合わせとしては、上記で挙げたいずれの組み合わせも可能であるが、sec-ブチルリチウムとほう酸トリメチルの組み合わせ、およびリチウム ジイソプロピルアミドとほう酸トリイソプロピルの組み合わせが好ましく、リチウム ジイソプロピルアミドとほう酸トリイソプロピルの組み合わせがより好ましい。ほう素化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。
一般式(S-14)で表される化合物を(S-15)で表される化合物と遷移金属触媒及び塩基存在下反応させることにより一般式(S-16)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。 As the trialkyl borate, trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling. As the combination of trialkyl borate and organometallic reagent, any of the above-mentioned combinations are possible, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred. The reaction temperature during boriding is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C.
A compound represented by general formula (S-16) is obtained by reacting a compound represented by general formula (S-14) with a compound represented by (S-15) in the presence of a transition metal catalyst and a base. Can do.
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Tetrakis (triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium dichloride (II), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) dichloride is preferred, Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] dichloride More preferably, it is palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
一般式(S-14)で表される化合物を(S-15)で表される化合物と遷移金属触媒及び塩基存在下反応させることにより一般式(S-16)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。 As the trialkyl borate, trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling. As the combination of trialkyl borate and organometallic reagent, any of the above-mentioned combinations are possible, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred. The reaction temperature during boriding is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C.
A compound represented by general formula (S-16) is obtained by reacting a compound represented by general formula (S-14) with a compound represented by (S-15) in the presence of a transition metal catalyst and a base. Can do.
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Tetrakis (triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium dichloride (II), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) dichloride is preferred, Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] dichloride More preferably, it is palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
使用する反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラヒドロフラン、ジエチルエーテル、tert-ブチルメチルエーテル等のエーテル系溶媒、メタノール、エタノール、プロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン等の芳香族系溶媒が好ましく、テトラヒドロフラン、エタノール、トルエンが更に好ましい。また、反応を好適に進行させるため、必要に応じて水を用いても良い。
The reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred. Further, water may be used as necessary in order to allow the reaction to proceed appropriately.
使用する塩基としては、反応を好適に進行させるものであればいずれでも構わないが、炭酸カリウム、炭酸ナトリウム、炭酸セシウム等の炭酸塩、りん酸三カリウム、りん酸二水素カリウム等のりん酸塩が好ましく、炭酸カリウム、炭酸セシウム、りん酸三カリウムが更に好ましい。
Any base can be used as long as it allows the reaction to proceed suitably. Carbonates such as potassium carbonate, sodium carbonate and cesium carbonate; phosphates such as tripotassium phosphate and potassium dihydrogen phosphate; Are preferable, and potassium carbonate, cesium carbonate, and tripotassium phosphate are more preferable.
反応温度としては、反応を好適に進行させるものであれば何度でも構わないが、室温から使用している溶媒が還流する温度までが好ましく、40℃から溶媒が還流するまでの温度が更に好ましく、60℃から溶媒が還流するまでの温度であることが特に好ましい。
一般式(S-16)で表される化合物を分子内反応させることによって一般式(S-17)で表される化合物を得ることができる。この分子内反応は一般式(S-16)の-Yi3-Hを塩基により脱プロトン化しアニオンを生成することで行うことができる。
この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属りん酸塩、アルカリ金属りん酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属りん酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属りん酸塩としてはりん酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。 The reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
The compound represented by the general formula (S-17) can be obtained by intramolecular reaction of the compound represented by the general formula (S-16). This intramolecular reaction can be carried out by deprotonation of —Y i3 —H of the general formula (S-16) with a base to generate an anion.
Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
一般式(S-16)で表される化合物を分子内反応させることによって一般式(S-17)で表される化合物を得ることができる。この分子内反応は一般式(S-16)の-Yi3-Hを塩基により脱プロトン化しアニオンを生成することで行うことができる。
この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属りん酸塩、アルカリ金属りん酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属りん酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属りん酸塩としてはりん酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。 The reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
The compound represented by the general formula (S-17) can be obtained by intramolecular reaction of the compound represented by the general formula (S-16). This intramolecular reaction can be carried out by deprotonation of —Y i3 —H of the general formula (S-16) with a base to generate an anion.
Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether, and examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and examples of polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Of these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Moreover, each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、30℃から120℃がより好ましい。
一般式(S-17)で表される化合物をハロゲン化することにより一般式(S-18)で表される化合物を得ることができる。このハロゲン化は、有機金属試薬により脱プロトン化した後、臭素又はよう素と反応させてハロゲン化合物とすることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。 The reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C.
The compound represented by the general formula (S-18) can be obtained by halogenating the compound represented by the general formula (S-17). This halogenation can be performed by deprotonation with an organometallic reagent and then reacting with bromine or iodine to form a halogen compound.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
一般式(S-17)で表される化合物をハロゲン化することにより一般式(S-18)で表される化合物を得ることができる。このハロゲン化は、有機金属試薬により脱プロトン化した後、臭素又はよう素と反応させてハロゲン化合物とすることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。 The reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C.
The compound represented by the general formula (S-18) can be obtained by halogenating the compound represented by the general formula (S-17). This halogenation can be performed by deprotonation with an organometallic reagent and then reacting with bromine or iodine to form a halogen compound.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメチルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。
一般式(S-18)で表される化合物を(S-19)で表される化合物と遷移金属触媒及び塩基存在下反応させることにより一般式(S-20)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。 Examples of organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
A compound represented by general formula (S-20) is obtained by reacting a compound represented by general formula (S-18) with a compound represented by (S-19) in the presence of a transition metal catalyst and a base. Can do.
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Tetrakis (triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium dichloride (II), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) dichloride is preferred, Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] dichloride More preferably, it is palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
一般式(S-18)で表される化合物を(S-19)で表される化合物と遷移金属触媒及び塩基存在下反応させることにより一般式(S-20)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。 Examples of organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
A compound represented by general formula (S-20) is obtained by reacting a compound represented by general formula (S-18) with a compound represented by (S-19) in the presence of a transition metal catalyst and a base. Can do.
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Tetrakis (triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium dichloride (II), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) dichloride is preferred, Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] dichloride More preferably, it is palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
使用する反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラヒドロフラン、ジエチルエーテル、tert-ブチルメチルエーテル等のエーテル系溶媒、メタノール、エタノール、プロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン等の芳香族系溶媒が好ましく、テトラヒドロフラン、エタノール、トルエンが更に好ましい。また、反応を好適に進行させるため、必要に応じて水を用いても良い。
The reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred. Further, water may be used as necessary in order to allow the reaction to proceed appropriately.
使用する塩基としては、反応を好適に進行させるものであればいずれでも構わないが、炭酸カリウム、炭酸ナトリウム、炭酸セシウム等の炭酸塩、りん酸三カリウム、りん酸二水素カリウム等のりん酸塩が好ましく、炭酸カリウム、炭酸セシウム、りん酸三カリウムが更に好ましい。
Any base can be used as long as it allows the reaction to proceed suitably. Carbonates such as potassium carbonate, sodium carbonate and cesium carbonate; phosphates such as tripotassium phosphate and potassium dihydrogen phosphate; Are preferable, and potassium carbonate, cesium carbonate, and tripotassium phosphate are more preferable.
反応温度としては、反応を好適に進行させるものであれば何度でも構わないが、室温から使用している溶媒が還流する温度までが好ましく、40℃から溶媒が還流するまでの温度が更に好ましく、60℃から溶媒が還流するまでの温度であることが特に好ましい。
(製造方法3) The reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
(Manufacturing method 3)
(製造方法3) The reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
(Manufacturing method 3)
(式中、Li2、Xi1、Xi2、Yi2及びWi1は、一般式(i)におけるLi2、Xi1、Xi2、Yi2及びWi1と同じ意味を表し、
Xi5は塩素、臭素、よう素、ベンゼンスルホニルオキシ基、p-トルエンスルホニルオキシ基、メタンスルホニルオキシ基又はトリフルオロメタンスルホニルオキシ基を表し、
Yi3は-O-又は-S-を表し、
Ri2は炭素原子数1から15のアルキル基又は炭素原子数2から15のアルケニル基を表す。)
一般式(S-17)で表される化合物を酸化することにより一般式(S-21)で表される化合物を得ることができる。この酸化は、有機金属試薬により脱プロトン化した後、ほう酸トリアルキルと反応させてほう素化合物とし、その後酸化剤を作用させることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。 (Wherein, L i2, X i1, X i2 , Y i2 and W i1 represent the same meaning in the general formula (i) and L i2, X i1, X i2 , Y i2 and W i1,
X i5 represents chlorine, bromine, iodine, benzenesulfonyloxy group, p-toluenesulfonyloxy group, methanesulfonyloxy group or trifluoromethanesulfonyloxy group;
Y i3 represents —O— or —S—,
R i2 represents an alkyl group having 1 to 15 carbon atoms or an alkenyl group having 2 to 15 carbon atoms. )
The compound represented by the general formula (S-21) can be obtained by oxidizing the compound represented by the general formula (S-17). This oxidation can be carried out by deprotonation with an organometallic reagent, reaction with a trialkyl borate to form a boron compound, and subsequent action of an oxidizing agent.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred. Examples of the organometallic reagent include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramerpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
Xi5は塩素、臭素、よう素、ベンゼンスルホニルオキシ基、p-トルエンスルホニルオキシ基、メタンスルホニルオキシ基又はトリフルオロメタンスルホニルオキシ基を表し、
Yi3は-O-又は-S-を表し、
Ri2は炭素原子数1から15のアルキル基又は炭素原子数2から15のアルケニル基を表す。)
一般式(S-17)で表される化合物を酸化することにより一般式(S-21)で表される化合物を得ることができる。この酸化は、有機金属試薬により脱プロトン化した後、ほう酸トリアルキルと反応させてほう素化合物とし、その後酸化剤を作用させることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。 (Wherein, L i2, X i1, X i2 , Y i2 and W i1 represent the same meaning in the general formula (i) and L i2, X i1, X i2 , Y i2 and W i1,
X i5 represents chlorine, bromine, iodine, benzenesulfonyloxy group, p-toluenesulfonyloxy group, methanesulfonyloxy group or trifluoromethanesulfonyloxy group;
Y i3 represents —O— or —S—,
R i2 represents an alkyl group having 1 to 15 carbon atoms or an alkenyl group having 2 to 15 carbon atoms. )
The compound represented by the general formula (S-21) can be obtained by oxidizing the compound represented by the general formula (S-17). This oxidation can be carried out by deprotonation with an organometallic reagent, reaction with a trialkyl borate to form a boron compound, and subsequent action of an oxidizing agent.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred. Examples of the organometallic reagent include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramerpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
ほう酸トリアルキルとしては、ほう酸トリメチル、ほう酸トリエチル、ほう酸トリプロピルおよびほう酸トリイソプロピルを用いるのが好ましいが、入手および取り扱いの容易さからほう酸トリメチルおよびほう酸トリイソプロピルがより好ましい。ほう酸トリアルキルと有機金属試薬の組み合わせとしては、上記で挙げたいずれの組み合わせも可能であるが、sec-ブチルリチウムとほう酸トリメチルの組み合わせ、およびリチウム ジイソプロピルアミドとほう酸トリイソプロピルの組み合わせが好ましく、リチウム ジイソプロピルアミドとほう酸トリイソプロピルの組み合わせがより好ましい。ほう素化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。得られたほう素化合物は一度単離してもよく、単離せずそのまま酸化剤と反応させてもよい。また、得られたほう素化合物を加水分解してほう酸化合物へと変換した後に酸化剤と反応させても構わない。
As the trialkyl borate, trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling. As the combination of trialkyl borate and organometallic reagent, any of the above-mentioned combinations are possible, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred. The reaction temperature during boriding is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C. The obtained boron compound may be isolated once or may be reacted with an oxidizing agent without isolation. Further, the obtained boron compound may be hydrolyzed and converted into a boric acid compound and then reacted with an oxidizing agent.
酸化剤としては、過酸化水素水、過酢酸または過ギ酸を用いるのが好ましい。反応温度は-78℃から70℃が好ましく、0℃から50℃がより好ましい。また、酸化剤との反応時には、溶媒に水が含まれていても構わない。
As the oxidizing agent, hydrogen peroxide water, peracetic acid or performic acid is preferably used. The reaction temperature is preferably -78 ° C to 70 ° C, more preferably 0 ° C to 50 ° C. Moreover, water may be contained in the solvent at the time of reaction with an oxidizing agent.
一般式(S-21)で表される化合物に一般式(S-22)で表される化合物を反応させることによって一般式(S-23)で表される化合物を得ることができる。この反応は一般式(S-21)の水酸基を塩基によりフェノラートとして一般式(S-22)と反応させることで行うことができる
この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属リン酸塩、アルカリ金属リン酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属リン酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属リン酸塩としてはリン酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 The compound represented by the general formula (S-23) can be obtained by reacting the compound represented by the general formula (S-21) with the compound represented by the general formula (S-22). This reaction can be carried out by reacting the hydroxyl group of the general formula (S-21) with the base as a phenolate with the general formula (S-22). The base used in this case is a metal hydride, metal carbonate, metal Mention may be made of phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides, alkali metal phosphates, alkali metal phosphates, alkali metal carbonates, alkali metals Hydroxides, alkali metal amides and alkali metals are preferred, and alkali metal phosphates, alkali metal hydrides and alkali metal carbonates are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably. Ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether, and examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and examples of polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Of these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Moreover, each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属リン酸塩、アルカリ金属リン酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属リン酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属リン酸塩としてはリン酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 The compound represented by the general formula (S-23) can be obtained by reacting the compound represented by the general formula (S-21) with the compound represented by the general formula (S-22). This reaction can be carried out by reacting the hydroxyl group of the general formula (S-21) with the base as a phenolate with the general formula (S-22). The base used in this case is a metal hydride, metal carbonate, metal Mention may be made of phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides, alkali metal phosphates, alkali metal phosphates, alkali metal carbonates, alkali metals Hydroxides, alkali metal amides and alkali metals are preferred, and alkali metal phosphates, alkali metal hydrides and alkali metal carbonates are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
Any reaction solvent may be used as long as it allows the reaction to proceed suitably. Ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether, and examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, examples of aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and examples of polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Of these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Moreover, each said solvent may be used independently, or 2 or more types of solvents may be mixed and used.
反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、30℃から120℃がより好ましい。なお、生成したフェノラートを一度単離してから一般式(S-22)で表される化合物と反応させてもよく、単離せずに反応させてもよいが、作業の容易さから単離せずに反応させたほうがよい。
(製造方法4) The reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C. The phenolate produced may be isolated once and then reacted with the compound represented by the general formula (S-22), or it may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
(Manufacturing method 4)
(製造方法4) The reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, preferably from 0 ° C to 150 ° C, more preferably from 30 ° C to 120 ° C. The phenolate produced may be isolated once and then reacted with the compound represented by the general formula (S-22), or it may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
(Manufacturing method 4)
(式中、Li1、Li2、Xi1、Xi2、Yi2及びWi11は、一般式(i)におけるLi1、Li2、Xi1、Xi2、Yi2及びWi1と同じ意味を表し、
Yi3は-O-又は-S-を表す。)
一般式(S-17)で表される化合物を一般式(S-24)で表される化合物と反応させることにより一般式(S-25)で表される化合物を得ることができる。この反応は、有機金属試薬により脱プロトン化した後、一般式(S-24)と反応させることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。
有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメチルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。 (In the formula, L i1 , L i2 , X i1 , X i2 , Y i2 and W i11 have the same meaning as L i1 , L i2 , X i1 , X i2 , Y i2 and W i1 in the general formula (i)). Represent,
Y i3 represents —O— or —S—. )
The compound represented by the general formula (S-25) can be obtained by reacting the compound represented by the general formula (S-17) with the compound represented by the general formula (S-24). This reaction can be carried out by deprotonation with an organometallic reagent and reaction with general formula (S-24).
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
Examples of organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
Yi3は-O-又は-S-を表す。)
一般式(S-17)で表される化合物を一般式(S-24)で表される化合物と反応させることにより一般式(S-25)で表される化合物を得ることができる。この反応は、有機金属試薬により脱プロトン化した後、一般式(S-24)と反応させることによって行うことができる。
反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。
有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメチルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウム ジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウム ジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。 (In the formula, L i1 , L i2 , X i1 , X i2 , Y i2 and W i11 have the same meaning as L i1 , L i2 , X i1 , X i2 , Y i2 and W i1 in the general formula (i)). Represent,
Y i3 represents —O— or —S—. )
The compound represented by the general formula (S-25) can be obtained by reacting the compound represented by the general formula (S-17) with the compound represented by the general formula (S-24). This reaction can be carried out by deprotonation with an organometallic reagent and reaction with general formula (S-24).
Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
Examples of organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide and lithium 2,2,4,4-tetramethylpiperidide. N-Butyllithium, sec-butyllithium, and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide that can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature for deprotonation is preferably from −100 ° C. to −20 ° C., more preferably from −78 ° C. to −40 ° C.
一般式(S-25)で表される化合物を脱水することにより一般式(S-26)で表される化合物を得ることができる。脱水の方法としては、酸の存在下で加熱する方法が挙げられる。酸としては、例えば塩酸、硫酸、重硫酸カリウムなどの無機酸や、酢酸、トリフルオロ酢酸、p-トルエンスルホン酸などの有機酸、トリフッ化ホウ素などのルイス酸が挙げられる。あるいは、脱水の方法として、水酸基をp-トルエンスルホン酸クロリド、トリフルオロメタンスルホン酸クロリド、トリホスゲンなどと反応させて脱離基に変換した後、脱離反応を行うことで脱水することもできる。
一般式(S-26)で表される化合物を有機溶媒中、金属触媒存在下、水素ガスと反応させる事で一般式(S-27)で表される化合物を得ることが出来る。 A compound represented by the general formula (S-26) can be obtained by dehydrating the compound represented by the general formula (S-25). Examples of the dehydration method include a method of heating in the presence of an acid. Examples of the acid include inorganic acids such as hydrochloric acid, sulfuric acid, and potassium bisulfate, organic acids such as acetic acid, trifluoroacetic acid, and p-toluenesulfonic acid, and Lewis acids such as boron trifluoride. Alternatively, as a dehydration method, the hydroxyl group can be reacted with p-toluenesulfonic acid chloride, trifluoromethanesulfonic acid chloride, triphosgene, etc. to convert it to a leaving group, and then dehydrated by performing an elimination reaction.
The compound represented by the general formula (S-27) can be obtained by reacting the compound represented by the general formula (S-26) with hydrogen gas in an organic solvent in the presence of a metal catalyst.
一般式(S-26)で表される化合物を有機溶媒中、金属触媒存在下、水素ガスと反応させる事で一般式(S-27)で表される化合物を得ることが出来る。 A compound represented by the general formula (S-26) can be obtained by dehydrating the compound represented by the general formula (S-25). Examples of the dehydration method include a method of heating in the presence of an acid. Examples of the acid include inorganic acids such as hydrochloric acid, sulfuric acid, and potassium bisulfate, organic acids such as acetic acid, trifluoroacetic acid, and p-toluenesulfonic acid, and Lewis acids such as boron trifluoride. Alternatively, as a dehydration method, the hydroxyl group can be reacted with p-toluenesulfonic acid chloride, trifluoromethanesulfonic acid chloride, triphosgene, etc. to convert it to a leaving group, and then dehydrated by performing an elimination reaction.
The compound represented by the general formula (S-27) can be obtained by reacting the compound represented by the general formula (S-26) with hydrogen gas in an organic solvent in the presence of a metal catalyst.
使用する有機溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、ジイソプロピルエーテル、ジエチルエーテル、1,4-ジオキサン又はテトラヒドロフラン等のエーテル系溶媒、ヘキサン、ヘプタン、トルエン又はキシレン等の炭化水素系溶媒、メタノール、エタノール、プロパノール、イソプロピルアルコール又はブタノール等のアルコール系溶媒、酢酸エチル又は酢酸ブチル等のエステル系溶媒が好ましく、テトラヒドロフラン、ヘキサン、ヘプタン、トルエン、エタノール又は酢酸エチルが好ましい。また、必要に応じて塩酸、酢酸又は硫酸等の酸を添加する事も好ましい。
Any organic solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents such as diisopropyl ether, diethyl ether, 1,4-dioxane or tetrahydrofuran, hexane, heptane, toluene or xylene, etc. Hydrocarbon solvents, alcohol solvents such as methanol, ethanol, propanol, isopropyl alcohol or butanol, and ester solvents such as ethyl acetate or butyl acetate are preferred, and tetrahydrofuran, hexane, heptane, toluene, ethanol or ethyl acetate are preferred. Moreover, it is also preferable to add acids, such as hydrochloric acid, acetic acid, or a sulfuric acid, as needed.
反応温度としては、反応を好適に進行させる温度であればいずれでも構わないが、0℃から80℃が好ましく、室温から60℃が更に好ましい。
The reaction temperature may be any temperature that allows the reaction to proceed suitably, but is preferably 0 ° C. to 80 ° C., more preferably room temperature to 60 ° C.
使用する金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、パラジウム炭素、ルテニウム炭素、白金黒又は酸化白金が好ましく、パラジウム炭素が更に好ましい。
The metal catalyst to be used may be any metal catalyst that allows the reaction to proceed suitably, but is preferably palladium carbon, ruthenium carbon, platinum black or platinum oxide, and more preferably palladium carbon.
反応する際の水素圧は、反応を好適に進行させるものであればいずれでも構わないが、大気圧から0.5MPaであることが好ましく、0.2MPaから0.5MPaであることが更に好ましい。
(製造方法5) The hydrogen pressure at the time of reaction may be any as long as it allows the reaction to proceed suitably, but is preferably from atmospheric pressure to 0.5 MPa, and more preferably from 0.2 MPa to 0.5 MPa.
(Manufacturing method 5)
(製造方法5) The hydrogen pressure at the time of reaction may be any as long as it allows the reaction to proceed suitably, but is preferably from atmospheric pressure to 0.5 MPa, and more preferably from 0.2 MPa to 0.5 MPa.
(Manufacturing method 5)
(式中、Li2、Xi1、Xi2、Yi2及びWi1は、一般式(i)におけるLi2、Xi1、Xi2、Yi2及びWi1と同じ意味を表し、
Ri3は炭素原子数1から15のアルキル基又は炭素原子数2から15のアルケニル基を表し、アルキル基又はアルケニル基中に存在する1個の-CH2-又は隣接していない2個以上の-CH2-は-C≡C-、-O-、-S-、-COO-、-OCO-又は-CO-により置き換えられても良く、アルキル基又はアルケニル基中に存在する水素原子はフッ素原子に置換されても良く、
Xi4は臭素原子又はよう素原子を表し、
Xi5は塩素原子又は臭素原子を表し、
Yi3は-O-又は-S-を表す。)
一般式(S-18)で表される化合物を(S-28)で表される化合物と遷移金属触媒存在下反応させることにより一般式(S-29)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、二塩化ビス(トリフェニルホスフィン)ニッケル(II)、二塩化[1,2-ビス(ジフェニルホスフィノ)エタン]ニッケル(II)、二塩化[1,2-ビス(ジフェニルホスフィノ)プロパン]ニッケル(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]ニッケル(II)、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)、トリス(ジベンジリデンアセトン)パラジウム(0)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。 (Wherein, L i2, X i1, X i2 , Y i2 and W i1 represent the same meaning in the general formula (i) and L i2, X i1, X i2 , Y i2 and W i1,
R i3 represents an alkyl group having 1 to 15 carbon atoms or an alkenyl group having 2 to 15 carbon atoms, and one —CH 2 — or two or more non-adjacent ones present in the alkyl group or alkenyl group. —CH 2 — may be replaced by —C≡C—, —O—, —S—, —COO—, —OCO— or —CO—, and the hydrogen atom present in the alkyl or alkenyl group is fluorine. May be substituted with atoms,
X i4 represents a bromine atom or an iodine atom,
X i5 represents a chlorine atom or a bromine atom,
Y i3 represents —O— or —S—. )
The compound represented by the general formula (S-29) can be obtained by reacting the compound represented by the general formula (S-18) with the compound represented by (S-28) in the presence of a transition metal catalyst. .
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Bis (triphenylphosphine) nickel (II) dichloride, [1,2-bis (diphenylphosphino) dichloride, Ethane] nickel (II), dichloride [1,2-bis (diphenylphosphino) propane] nickel (II), [1,1′-bis (diphenylphosphino) ferrocene] nickel (II), tetrakis ( Triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium (II) dichloride, [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or dichloride Bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) chloride is preferred. Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II), tris (dibenzylideneacetone) palladium (0) or bis [dichloride More preferred is -tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
Ri3は炭素原子数1から15のアルキル基又は炭素原子数2から15のアルケニル基を表し、アルキル基又はアルケニル基中に存在する1個の-CH2-又は隣接していない2個以上の-CH2-は-C≡C-、-O-、-S-、-COO-、-OCO-又は-CO-により置き換えられても良く、アルキル基又はアルケニル基中に存在する水素原子はフッ素原子に置換されても良く、
Xi4は臭素原子又はよう素原子を表し、
Xi5は塩素原子又は臭素原子を表し、
Yi3は-O-又は-S-を表す。)
一般式(S-18)で表される化合物を(S-28)で表される化合物と遷移金属触媒存在下反応させることにより一般式(S-29)で表される化合物を得ることができる。
使用する遷移金属触媒としては、反応を好適に進行させるものであればいずれでも構わないが、二塩化ビス(トリフェニルホスフィン)ニッケル(II)、二塩化[1,2-ビス(ジフェニルホスフィノ)エタン]ニッケル(II)、二塩化[1,2-ビス(ジフェニルホスフィノ)プロパン]ニッケル(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]ニッケル(II)、テトラキス(トリフェニルホスフィン)パラジウム(0)、酢酸パラジウム(II)、二塩化ビス(トリフェニルホスフィン)パラジウム(II)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)が好ましく、テトラキス(トリフェニルホスフィン)パラジウム(0)、二塩化[1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)、トリス(ジベンジリデンアセトン)パラジウム(0)又は二塩化ビス[ジ-tert-ブチル(4-ジメチルアミノフェニル)ホスフィン]パラジウム(II)であることが更に好ましい。また、反応を好適に進行させるため、必要に応じてトリフェニルホスフィン等のホスフィン系配位子を添加しても良い。 (Wherein, L i2, X i1, X i2 , Y i2 and W i1 represent the same meaning in the general formula (i) and L i2, X i1, X i2 , Y i2 and W i1,
R i3 represents an alkyl group having 1 to 15 carbon atoms or an alkenyl group having 2 to 15 carbon atoms, and one —CH 2 — or two or more non-adjacent ones present in the alkyl group or alkenyl group. —CH 2 — may be replaced by —C≡C—, —O—, —S—, —COO—, —OCO— or —CO—, and the hydrogen atom present in the alkyl or alkenyl group is fluorine. May be substituted with atoms,
X i4 represents a bromine atom or an iodine atom,
X i5 represents a chlorine atom or a bromine atom,
Y i3 represents —O— or —S—. )
The compound represented by the general formula (S-29) can be obtained by reacting the compound represented by the general formula (S-18) with the compound represented by (S-28) in the presence of a transition metal catalyst. .
Any transition metal catalyst may be used as long as it allows the reaction to proceed suitably. Bis (triphenylphosphine) nickel (II) dichloride, [1,2-bis (diphenylphosphino) dichloride, Ethane] nickel (II), dichloride [1,2-bis (diphenylphosphino) propane] nickel (II), [1,1′-bis (diphenylphosphino) ferrocene] nickel (II), tetrakis ( Triphenylphosphine) palladium (0), palladium (II) acetate, bis (triphenylphosphine) palladium (II) dichloride, [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) or dichloride Bis [di-tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II) chloride is preferred. Tetrakis (triphenylphosphine) palladium (0), [1,1′-bis (diphenylphosphino) ferrocene] palladium (II), tris (dibenzylideneacetone) palladium (0) or bis [dichloride More preferred is -tert-butyl (4-dimethylaminophenyl) phosphine] palladium (II). Moreover, in order to advance reaction suitably, you may add phosphine-type ligands, such as a triphenylphosphine, as needed.
使用する反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、テトラヒドロフラン、ジエチルエーテル、tert-ブチルメチルエーテル等のエーテル系溶媒、メタノール、エタノール、プロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン等の芳香族系溶媒が好ましく、テトラヒドロフラン、エタノール、トルエンが更に好ましい。
The reaction solvent to be used may be any as long as it allows the reaction to proceed suitably, but ether solvents such as tetrahydrofuran, diethyl ether and tert-butyl methyl ether, alcohol solvents such as methanol, ethanol and propanol, Aromatic solvents such as benzene, toluene and xylene are preferred, and tetrahydrofuran, ethanol and toluene are more preferred.
反応温度としては、反応を好適に進行させるものであれば何度でも構わないが、室温から使用している溶媒が還流する温度までが好ましく、40℃から溶媒が還流するまでの温度が更に好ましく、60℃から溶媒が還流するまでの温度であることが特に好ましい。
The reaction temperature may be any number of times as long as the reaction proceeds suitably, but is preferably from room temperature to the temperature at which the solvent used is refluxed, more preferably from 40 ° C to the temperature at which the solvent is refluxed. A temperature from 60 ° C. to the reflux of the solvent is particularly preferred.
このように、一般式(i)で表される化合物と混合して使用することのできる化合物の好ましい代表例としては、本発明の提供する組成物においては、その第一成分として一般式(i)で表される化合物を少なくとも1種含有するが、その他の成分として特に以下の第二から第四成分から少なくとも1種含有することが好ましい。
Thus, as a preferable representative example of the compound that can be used by mixing with the compound represented by the general formula (i), in the composition provided by the present invention, as the first component, the general formula (i At least one compound represented by formula (1), but it is preferable to contain at least one of the following second to fourth components as other components.
即ち、第二成分は誘電率異方性が負のいわゆるn型液晶化合物であって、以下の一般式(LC3)~一般式(LC5)で示される化合物を挙げることができる。
That is, the second component is a so-called n-type liquid crystal compound having a negative dielectric anisotropy, and examples thereof include compounds represented by the following general formulas (LC3) to (LC5).
(式中、RLC31、RLC32、RLC41、RLC42、RLC51及びRLC52はそれぞれ独立して炭素原子数1~15のアルキル基を表し、該アルキル基中の1つ又は2つ以上の-CH2-は、酸素原子が直接隣接しないように、-O-、-CH=CH-、-CO-、-OCO-、-COO-又は-C≡C-で置換されてよく、該アルキル基中の1つ又は2つ以上の水素原子は任意にハロゲン原子によって置換されていてもよく、ALC31、ALC32、ALC41、ALC42、ALC51及びALC52はそれぞれ独立して下記の何れかの構造
(Wherein, represents an alkyl group of R LC31, R LC32, R LC41 , R LC42, R LC51 and R LC52 is 1 to 15 carbon atoms independently, one in the alkyl group or two or more —CH 2 — may be substituted with —O—, —CH═CH—, —CO—, —OCO—, —COO— or —C≡C— so that the oxygen atom is not directly adjacent. one or more hydrogen atoms in the group may be optionally substituted by a halogen atom, a LC31, a LC32, a LC41, a LC42, a LC51 and a LC52 each independently any of the following Structure
(該構造中シクロヘキシレン基中の1つ又は2つ以上の-CH2-は酸素原子で置換されていてもよく、1,4-フェニレン基中の1つ又は2つ以上の-CH-は窒素原子で置換されていてもよく、また、該構造中の1つ又は2つ以上の水素原子はフッ素原子、塩素原子、-CF3又は-OCF3で置換されていてもよい。)のいずれかを表し、ZLC31、ZLC32、ZLC41、ZLC42、ZLC51及びZLC51はそれぞれ独立して単結合、-CH=CH-、-C≡C-、-CH2CH2-、-(CH2)4-、-COO-、-OCH2-、-CH2O-、-OCF2-又は-CF2O-を表し、Z5は-CH2-又は酸素原子を表し、XLC41は水素原子又はフッ素原子を表し、mLC31、mLC32、mLC41、mLC42、mLC51及びmLC52はそれぞれ独立して0~3を表し、mLC31+mLC32、mLC41+mLC42及びmLC51+mLC52は1、2又は3であり、ALC31~ALC52、ZLC31~ZLC52が複数存在する場合は、それらは同一であっても異なっていても良い。)
RLC31~RLC52は、それぞれ独立して、炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、アルケニル基としては下記構造を表すことが最も好ましく、 (In the structure, one or more —CH 2 — in the cyclohexylene group may be substituted with an oxygen atom, and one or more —CH— in the 1,4-phenylene group is Any one of which may be substituted with a nitrogen atom, and one or more hydrogen atoms in the structure may be substituted with a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 ). indicates whether, Z LC31, Z LC32, Z LC41, Z LC42, Z LC51 and Z LC51 each independently represent a single bond, -CH = CH -, - C≡C -, - CH 2 CH 2 -, - ( CH 2 ) 4 —, —COO—, —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—, Z 5 represents —CH 2 — or an oxygen atom, and X LC41 represents Represents a hydrogen atom or a fluorine atom, m LC31 , m L C32, m LC41, m LC42, m LC51 and m LC52 each independently represent 0 ~ 3, m LC31 + m LC32, m LC41 + m LC42 and m LC51 + m LC52 is 1, 2 or 3, A LC31 ~ When a plurality of A LC52 and Z LC31 to Z LC52 are present, they may be the same or different. )
R LC31 to R LC52 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms. Most preferably,
RLC31~RLC52は、それぞれ独立して、炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、アルケニル基としては下記構造を表すことが最も好ましく、 (In the structure, one or more —CH 2 — in the cyclohexylene group may be substituted with an oxygen atom, and one or more —CH— in the 1,4-phenylene group is Any one of which may be substituted with a nitrogen atom, and one or more hydrogen atoms in the structure may be substituted with a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 ). indicates whether, Z LC31, Z LC32, Z LC41, Z LC42, Z LC51 and Z LC51 each independently represent a single bond, -CH = CH -, - C≡C -, - CH 2 CH 2 -, - ( CH 2 ) 4 —, —COO—, —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—, Z 5 represents —CH 2 — or an oxygen atom, and X LC41 represents Represents a hydrogen atom or a fluorine atom, m LC31 , m L C32, m LC41, m LC42, m LC51 and m LC52 each independently represent 0 ~ 3, m LC31 + m LC32, m LC41 + m LC42 and m LC51 + m LC52 is 1, 2 or 3, A LC31 ~ When a plurality of A LC52 and Z LC31 to Z LC52 are present, they may be the same or different. )
R LC31 to R LC52 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms. Most preferably,
(式中、環構造へは右端で結合するものとする。)
ALC31~ALC52はそれぞれ独立して下記の構造が好ましく、 (In the formula, it shall be bonded to the ring structure at the right end.)
A LC31 to A LC52 each independently preferably has the following structure:
ALC31~ALC52はそれぞれ独立して下記の構造が好ましく、 (In the formula, it shall be bonded to the ring structure at the right end.)
A LC31 to A LC52 each independently preferably has the following structure:
ZLC31~ZLC51はそれぞれ独立して単結合、-CH2O-、-COO-、-OCO-、-CH2CH2-、-CF2O-、-OCF2-又は-OCH2-が好ましい。
Z LC31 to Z LC51 each independently has a single bond, —CH 2 O—, —COO—, —OCO— , —CH 2 CH 2 —, —CF 2 O—, —OCF 2 — or —OCH 2 —. preferable.
一般式(LC3)は、下記一般式(LC3-a)及び一般式(LC3-b)
General formula (LC3) is the following general formula (LC3-a) and general formula (LC3-b)
(式中、RLC31、RLC32、ALC31及びZLC31はそれぞれ独立して前記一般式(LC3)におけるRLC31、RLC32、ALC31及びZLC31と同じ意味を表し、XLC3b1~XLC3b6は水素原子又はフッ素原子を表すが、XLC3b1及びXLC3b2又はXLC3b3及びXLC3b4のうちの少なくとも一方の組み合わせは共にフッ素原子を表し、mLC3a1は1、2又は3であり、mLC3b1は0又は1を表し、ALC31及びZLC31が複数存在する場合は、それらは同一であっても異なっていても良い。ただし、一般式(LC3-a)において一般式(LC3-b)で表される群より選ばれる化合物を除く。)で表される化合物群から選ばれる1種又は2種以上の化合物であることが好ましい。
RLC31及びRLC32はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基又は炭素原子数2~7のアルケニルオキシ基を表すことが好ましい。 (Wherein R LC31 , R LC32 , A LC31 and Z LC31 each independently represent the same meaning as R LC31 , R LC32 , A LC31 and Z LC31 in the general formula (LC3), and X LC3b1 to X LC3b6 are Represents a hydrogen atom or a fluorine atom, and at least one of X LC3b1 and X LC3b2 or X LC3b3 and X LC3b4 represents a fluorine atom, m LC3a1 is 1, 2 or 3, and m LC3b1 is 0 or In the case where a plurality of A LC31 and Z LC31 are present, they may be the same or different, provided that they are represented by the general formula (LC3-b) in the general formula (LC3-a) Or a compound selected from the group of compounds represented by the formula: Rukoto is preferable.
R LC31 and R LC32 each independently represents an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, or an alkenyloxy group having 2 to 7 carbon atoms. Is preferably represented.
RLC31及びRLC32はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基又は炭素原子数2~7のアルケニルオキシ基を表すことが好ましい。 (Wherein R LC31 , R LC32 , A LC31 and Z LC31 each independently represent the same meaning as R LC31 , R LC32 , A LC31 and Z LC31 in the general formula (LC3), and X LC3b1 to X LC3b6 are Represents a hydrogen atom or a fluorine atom, and at least one of X LC3b1 and X LC3b2 or X LC3b3 and X LC3b4 represents a fluorine atom, m LC3a1 is 1, 2 or 3, and m LC3b1 is 0 or In the case where a plurality of A LC31 and Z LC31 are present, they may be the same or different, provided that they are represented by the general formula (LC3-b) in the general formula (LC3-a) Or a compound selected from the group of compounds represented by the formula: Rukoto is preferable.
R LC31 and R LC32 each independently represents an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, or an alkenyloxy group having 2 to 7 carbon atoms. Is preferably represented.
ALC31は、1,4-フェニレン基、トランス-1,4-シクロヘキシレン基、テトラヒドロピラン-2,5-ジイル基、1,3-ジオキサン-2,5-ジイル基を表すことが好ましく、1,4-フェニレン基、トランス-1,4-シクロヘキシレン基を表すことがより好ましい。
A LC31 preferably represents a 1,4-phenylene group, a trans-1,4-cyclohexylene group, a tetrahydropyran-2,5-diyl group, or a 1,3-dioxane-2,5-diyl group. , 4-phenylene group and trans-1,4-cyclohexylene group are more preferable.
ZLC31は単結合、-CH2O-、-COO-、-OCO-、-CH2CH2-を表すことが好ましく、単結合を表すことがより好ましい。
Z LC31 is a single bond, -CH 2 O -, - COO -, - OCO -, - CH 2 CH 2 - is preferred to represent, and more preferably a single bond.
一般式(LC3-a)としては、下記一般式(LC3-a1)~一般式(LC3-a4)を表すことが好ましい。
The general formula (LC3-a) preferably represents the following general formula (LC3-a1) to general formula (LC3-a4).
(式中、RLC31及びRLC32はそれぞれ独立して前記一般式(LC3)におけるRLC31及びRLC32と同じ意味を表す。)
RLC31及びRLC32はそれぞれ独立して、炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、RLC31が炭素原子数1~7のアルキル基を表し、RLC32が炭素原子数1~7のアルコキシ基を表すことがより好ましい。 (In the formula, R LC31 and R LC32 each independently represent the same meaning as R LC31 and R LC32 in General Formula (LC3).)
R LC31 and R LC32 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and R LC31 has 1 carbon atom. More preferably, it represents an alkyl group of ˜7 , and R LC32 represents an alkoxy group of 1 to 7 carbon atoms.
RLC31及びRLC32はそれぞれ独立して、炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、RLC31が炭素原子数1~7のアルキル基を表し、RLC32が炭素原子数1~7のアルコキシ基を表すことがより好ましい。 (In the formula, R LC31 and R LC32 each independently represent the same meaning as R LC31 and R LC32 in General Formula (LC3).)
R LC31 and R LC32 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and R LC31 has 1 carbon atom. More preferably, it represents an alkyl group of ˜7 , and R LC32 represents an alkoxy group of 1 to 7 carbon atoms.
一般式(LC3-b)としては、下記一般式(LC3-b1)~一般式(LC3-b12)を表すことが好ましく、一般式(LC3-b1)、一般式(LC3-b6)、一般式(LC3-b8)、一般式(LC3-b11)を表すことがより好ましく、一般式(LC3-b1)及び一般式(LC3-b6)を表すことがさらに好ましく、一般式(LC3-b1)を表すことが最も好ましい。
The general formula (LC3-b) is preferably represented by the following general formula (LC3-b1) to general formula (LC3-b12). The general formula (LC3-b1), the general formula (LC3-b6), the general formula (LC3-b8) and general formula (LC3-b11) are more preferable, general formula (LC3-b1) and general formula (LC3-b6) are more preferable, and general formula (LC3-b1) is Most preferably it represents.
(式中、RLC31及びRLC32はそれぞれ独立して前記一般式(LC3)におけるRLC31及びRLC32と同じ意味を表す。)
RLC31及びRLC32はそれぞれ独立して、炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、RLC31が炭素原子数2又は3のアルキル基を表し、RLC32が炭素原子数2のアルキル基を表すことがより好ましい。 (In the formula, R LC31 and R LC32 each independently represent the same meaning as R LC31 and R LC32 in General Formula (LC3).)
R LC31 and R LC32 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and R LC31 has 2 carbon atoms. Or an alkyl group having 3 carbon atoms, and more preferably R LC32 represents an alkyl group having 2 carbon atoms.
RLC31及びRLC32はそれぞれ独立して、炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、RLC31が炭素原子数2又は3のアルキル基を表し、RLC32が炭素原子数2のアルキル基を表すことがより好ましい。 (In the formula, R LC31 and R LC32 each independently represent the same meaning as R LC31 and R LC32 in General Formula (LC3).)
R LC31 and R LC32 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and R LC31 has 2 carbon atoms. Or an alkyl group having 3 carbon atoms, and more preferably R LC32 represents an alkyl group having 2 carbon atoms.
一般式(LC4)は下記一般式(LC4-a)から一般式(LC4-c)、一般式(LC5)は下記一般式(LC5-a)から一般式(LC5-c)
General formula (LC4) is general formula (LC4-a) to general formula (LC4-c), and general formula (LC5) is general formula (LC5-a) to general formula (LC5-c).
(式中、RLC41、RLC42及びXLC41はそれぞれ独立して前記一般式(LC4)におけるRLC41、RLC42及びXLC41と同じ意味を表し、RLC51及びRLC52はそれぞれ独立して前記一般式(LC5)におけるRLC51及びRLC52と同じ意味を表し、ZLC4a1、ZLC4b1、ZLC4c1、ZLC5a1、ZLC5b1及びZLC5c1はそれぞれ独立して単結合、-CH=CH-、-C≡C-、-CH2CH2-、-(CH2)4-、-COO-、-OCH2-、-CH2O-、-OCF2-又は-CF2O-を表す。)で表される化合物からなる群より選ばれる1種又は2種以上の化合物であるのがより好ましい。
(Wherein, R LC41, R LC42 and X LC41 each independently represent the same meaning as R LC41, R LC42 and X LC41 in the general formula (LC4), R LC51 and R LC52 is the general independently It represents the same meaning as R LC51 and R LC52 in formula (LC5), Z LC4a1, Z LC4b1, Z LC4c1, Z LC5a1, Z LC5b1 and Z LC5c1 each independently represent a single bond, -CH = CH -, - C≡ C—, —CH 2 CH 2 —, — (CH 2 ) 4 —, —COO—, —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—. More preferably, it is one or more compounds selected from the group consisting of the following compounds.
RLC41、RLC42、RLC51及びRLC52はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基又は炭素原子数2~7のアルケニルオキシ基を表すことが好ましい。
R LC41, R LC42, R LC51 and R LC52 each independently represents an alkyl group of 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, the number alkenyl group or a carbon atom of 2 to 7 carbon atoms 2 It preferably represents ˜7 alkenyloxy groups.
ZLC4a1~ZLC5c1はそれぞれ独立して単結合、-CH2O-、-COO-、-OCO-、-CH2CH2-を表すことが好ましく、単結合を表すことがより好ましい。
Z LC4a1 to Z LC5c1 each independently preferably represents a single bond, —CH 2 O—, —COO—, —OCO— , —CH 2 CH 2 —, and more preferably represents a single bond.
第三成分は誘電率異方性が0程度である、いわゆる非極性液晶化合物であり、以下の一般式(LC6)で示される化合物を挙げることができる。
The third component is a so-called nonpolar liquid crystal compound having a dielectric anisotropy of about 0, and examples thereof include compounds represented by the following general formula (LC6).
(式中、RLC61及びRLC62はそれぞれ独立して炭素原子数1~15のアルキル基を表し、該アルキル基中の1つ又は2つ以上の-CH2-は、酸素原子が直接隣接しないように、-O-、-CH=CH-、-CO-、-OCO-、-COO-又は-C≡C-で置換されてよく、該アルキル基中の1つ又は2つ以上の水素原子は任意にハロゲン置換されていてもよく、ALC61~ALC63はそれぞれ独立して下記
( Wherein R LC61 and R LC62 each independently represents an alkyl group having 1 to 15 carbon atoms, and one or more of —CH 2 — in the alkyl group is not directly adjacent to an oxygen atom. And may be substituted with —O—, —CH═CH—, —CO—, —OCO—, —COO— or —C≡C—, and one or more hydrogen atoms in the alkyl group May be optionally halogen-substituted, and A LC61 to A LC63 each independently represent
(該構造中シクロヘキシレン基中の1つ又は2つ以上の-CH2CH2-は-CH=CH-、-CF2O-、-OCF2-で置換されていてもよく、1,4-フェニレン基中1つ又は2つ以上のCH基は窒素原子で置換されていてもよい。)のいずれかを表し、ZLC61及びZLC62はそれぞれ独立して単結合、-CH=CH-、-C≡C-、-CH2CH2-、-(CH2)4-、-COO-、-OCH2-、-CH2O-、-OCF2-又は-CF2O-を表し、mLc6は0~3を表す。ただし、一般式(LC1)~一般式(LC5)で表される化合物、及び一般式(i)を除く。)
RLC61及びRLC62は、それぞれ独立して、炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、アルケニル基としては下記構造を表すことが最も好ましく、 (In the structure, one or more —CH 2 CH 2 — in the cyclohexylene group may be substituted with —CH═CH—, —CF 2 O—, —OCF 2 —, -One or two or more CH groups in the phenylene group may be substituted with a nitrogen atom), and Z LC61 and Z LC62 each independently represent a single bond, —CH═CH—, Represents —C≡C—, —CH 2 CH 2 —, — (CH 2 ) 4 —, —COO—, —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—, m Lc6 represents 0-3. However, the compounds represented by general formula (LC1) to general formula (LC5) and general formula (i) are excluded. )
R LC61 and R LC62 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms. Most preferably,
RLC61及びRLC62は、それぞれ独立して、炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、アルケニル基としては下記構造を表すことが最も好ましく、 (In the structure, one or more —CH 2 CH 2 — in the cyclohexylene group may be substituted with —CH═CH—, —CF 2 O—, —OCF 2 —, -One or two or more CH groups in the phenylene group may be substituted with a nitrogen atom), and Z LC61 and Z LC62 each independently represent a single bond, —CH═CH—, Represents —C≡C—, —CH 2 CH 2 —, — (CH 2 ) 4 —, —COO—, —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—, m Lc6 represents 0-3. However, the compounds represented by general formula (LC1) to general formula (LC5) and general formula (i) are excluded. )
R LC61 and R LC62 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms. Most preferably,
(式中、環構造へは右端で結合するものとする。)
ALC61~ALC63はそれぞれ独立して下記の構造が好ましく、 (In the formula, it shall be bonded to the ring structure at the right end.)
A LC61 to A LC63 each independently preferably has the following structure:
ALC61~ALC63はそれぞれ独立して下記の構造が好ましく、 (In the formula, it shall be bonded to the ring structure at the right end.)
A LC61 to A LC63 each independently preferably has the following structure:
ZLC61及びZLC62はそれぞれ独立して単結合、-CH2CH2-、-COO-、-OCH2-、-CH2O-、-OCF2-又は-CF2O-が好ましい。
Z LC61 and Z LC62 are each independently preferably a single bond, —CH 2 CH 2 —, —COO— , —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O—.
一般式(LC6)は、一般式(LC6-a)から一般式(LC6-m)
General formula (LC6) is changed from general formula (LC6-a) to general formula (LC6-m)
(式中、RLC61及びRLC62はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基又は炭素原子数2~7のアルケニルオキシ基を表す。)で表される化合物からなる群より選ばれる1種又は2種以上の化合物であるのがより好ましい。
( Wherein R LC61 and R LC62 are each independently an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, or 2 to 7 carbon atoms) It is more preferable that it is 1 type, or 2 or more types of compounds chosen from the group which consists of a compound represented by this.
第四成分は誘電率異方性が正のいわゆるp型液晶化合物であって、以下の一般式(LC1)及び一般式(LC2)で示される化合物を挙げることができる。
The fourth component is a so-called p-type liquid crystal compound having a positive dielectric anisotropy, and examples thereof include compounds represented by the following general formulas (LC1) and (LC2).
(式中、RLC11及びRLC21はそれぞれ独立して炭素原子数1~15のアルキル基を表し、該アルキル基中の1つ又は2つ以上の-CH2-は、酸素原子が直接隣接しないように、-O-、-CH=CH-、-CO-、-OCO-、-COO-又は-C≡C-で置換されてよく、該アルキル基中の1つ又は2つ以上の水素原子は任意にハロゲン原子によって置換されていてもよく、ALC11、及びALC21はそれぞれ独立して下記の何れかの構造
( Wherein R LC11 and R LC21 each independently represents an alkyl group having 1 to 15 carbon atoms, and one or more of —CH 2 — in the alkyl group is not directly adjacent to an oxygen atom. And may be substituted with —O—, —CH═CH—, —CO—, —OCO—, —COO— or —C≡C—, and one or more hydrogen atoms in the alkyl group May be optionally substituted with a halogen atom, and A LC11 and A LC21 are each independently any one of the following structures:
(該構造中、シクロヘキシレン基中の1つ又は2つ以上の-CH2-は酸素原子で置換されていてもよく、1,4-フェニレン基中の1つ又は2つ以上の-CH-は窒素原子で置換されていてもよく、また、該構造中の1つ又は2つ以上の水素原子はフッ素原子、塩素原子、-CF3又は-OCF3で置換されていてもよい。)を表し、XLC11、XLC12、XLC21~XLC23はそれぞれ独立して水素原子、フッ素原子、塩素原子、-CF3又は-OCF3を表し、YLC11及びYLC21はそれぞれ独立して水素原子、フッ素原子、塩素原子、シアノ基、-CF3、-OCH2F、-OCHF2又は-OCF3を表し、ZLC11及びZLC21はそれぞれ独立して単結合、-CH=CH-、-CF=CF-、-C≡C-、-CH2CH2-、-(CH2)4-、-OCH2-、-CH2O-、-OCF2-、-CF2O-、-COO-又は-OCO-を表し、mLC11及びmLC21はそれぞれ独立して1~4の整数を表し、ALC11、ALC21、ZLC11及びZLC21が複数存在する場合は、それらは同一であっても異なっていても良い。)
RLC11及びRLC21はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基がより好ましく、直鎖状であることが更に好ましく、アルケニル基としては下記構造を表すことが最も好ましい。 (In the structure, one or more —CH 2 — in the cyclohexylene group may be substituted with an oxygen atom, and one or more —CH— in the 1,4-phenylene group may be substituted. May be substituted with a nitrogen atom, and one or more hydrogen atoms in the structure may be substituted with a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 ). represents, X LC11, X LC12, X LC21 ~ X LC23 are each independently a hydrogen atom, a fluorine atom, a chlorine atom, a -CF 3 or -OCF 3, Y LC11 and Y LC21 are each independently a hydrogen atom, fluorine atom, a chlorine atom, a cyano group, -CF 3, represents -OCH 2 F, -OCHF 2 or -OCF 3, Z LC11 and Z LC21 each independently represent a single bond, -CH = CH -, - CF = CF- -C≡C -, - CH 2 CH 2 -, - (CH 2) 4 -, - OCH 2 -, - CH 2 O -, - OCF 2 -, - CF 2 O -, - COO- or -OCO- M LC11 and m LC21 each independently represents an integer of 1 to 4, and when there are a plurality of A LC11 , A LC21 , Z LC11 and Z LC21 , they may be the same or different. good. )
R LC11 and R LC21 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and an alkyl group having 1 to 5 carbon atoms. Group, an alkoxy group having 1 to 5 carbon atoms, and an alkenyl group having 2 to 5 carbon atoms are more preferable, and a straight chain is more preferable, and the alkenyl group most preferably represents the following structure.
RLC11及びRLC21はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基がより好ましく、直鎖状であることが更に好ましく、アルケニル基としては下記構造を表すことが最も好ましい。 (In the structure, one or more —CH 2 — in the cyclohexylene group may be substituted with an oxygen atom, and one or more —CH— in the 1,4-phenylene group may be substituted. May be substituted with a nitrogen atom, and one or more hydrogen atoms in the structure may be substituted with a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 ). represents, X LC11, X LC12, X LC21 ~ X LC23 are each independently a hydrogen atom, a fluorine atom, a chlorine atom, a -CF 3 or -OCF 3, Y LC11 and Y LC21 are each independently a hydrogen atom, fluorine atom, a chlorine atom, a cyano group, -CF 3, represents -OCH 2 F, -OCHF 2 or -OCF 3, Z LC11 and Z LC21 each independently represent a single bond, -CH = CH -, - CF = CF- -C≡C -, - CH 2 CH 2 -, - (CH 2) 4 -, - OCH 2 -, - CH 2 O -, - OCF 2 -, - CF 2 O -, - COO- or -OCO- M LC11 and m LC21 each independently represents an integer of 1 to 4, and when there are a plurality of A LC11 , A LC21 , Z LC11 and Z LC21 , they may be the same or different. good. )
R LC11 and R LC21 are each independently preferably an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an alkenyl group having 2 to 7 carbon atoms, and an alkyl group having 1 to 5 carbon atoms. Group, an alkoxy group having 1 to 5 carbon atoms, and an alkenyl group having 2 to 5 carbon atoms are more preferable, and a straight chain is more preferable, and the alkenyl group most preferably represents the following structure.
(式中、環構造へは右端で結合するものとする。)
ALC11及びALC21はそれぞれ独立して下記の構造が好ましい。 (In the formula, it shall be bonded to the ring structure at the right end.)
A LC11 and A LC21 each independently preferably have the following structure.
ALC11及びALC21はそれぞれ独立して下記の構造が好ましい。 (In the formula, it shall be bonded to the ring structure at the right end.)
A LC11 and A LC21 each independently preferably have the following structure.
YLC11及びYLC21はそれぞれ独立してフッ素原子、シアノ基、-CF3又は-OCF3が好ましく、フッ素原子又は-OCF3が好ましく、フッ素原子が特に好ましい。
Y LC11 and Y LC21 are each independently preferably a fluorine atom, a cyano group, —CF 3 or —OCF 3 , preferably a fluorine atom or —OCF 3 , and particularly preferably a fluorine atom.
ZLC11及びZLC21は単結合、-CH2CH2-、-COO-、-OCO-、-OCH2-、-CH2O-、-OCF2-又は-CF2O-が好ましく、単結合、-CH2CH2-、-OCH2-、-OCF2-又は-CF2O-が好ましく、単結合、-OCH2-又は-CF2O-がより好ましい。
Z LC11 and Z LC21 are preferably a single bond, —CH 2 CH 2 —, —COO—, —OCO— , —OCH 2 —, —CH 2 O—, —OCF 2 — or —CF 2 O— , —CH 2 CH 2 —, —OCH 2 —, —OCF 2 — or —CF 2 O— are preferred, and a single bond, —OCH 2 — or —CF 2 O— is more preferred.
mLC11及びmLC21は1、2又は3が好ましく、低温での保存安定性、応答速度を重視する場合には1又は2が好ましく、ネマチック相上限温度の上限値を改善するには2又は3が好ましい。
m LC11 and m LC21 are preferably 1, 2 or 3, preferably 1 or 2 when emphasizing storage stability at low temperature and response speed, and 2 or 3 for improving the upper limit of the nematic phase upper limit temperature. Is preferred.
一般式(LC1)は、下記一般式(LC1-a)から一般式(LC1-c)
General formula (LC1) is represented by the following general formula (LC1-a) to general formula (LC1-c)
(式中、RLC11、YLC11、XLC11及びXLC12はそれぞれ独立して前記一般式(LC1)におけるRLC11、YLC11、XLC11及びXLC12と同じ意味を表し、ALC1a1、ALC1a2及びALC1b1は、トランス-1,4-シクロヘキシレン基、テトラヒドロピラン-2,5-ジイル基、1,3-ジオキサン-2,5-ジイル基を表し、XLC1b1、XLC1b2、XLC1c1~XLC1c4はそれぞれ独立して水素原子、フッ素原子、塩素原子、-CF3又は-OCF3を表す。)で表される化合物からなる群より選ばれる1種又は2種以上の化合物であることが好ましい。
(Wherein, R LC11, Y LC11, X LC11 and X LC12 each independently represent the same meaning as R LC11, Y LC11, X LC11 and X LC12 in the general formula (LC1), A LC1a1, A LC1a2 and A LC1b1 represents a trans-1,4-cyclohexylene group, a tetrahydropyran-2,5-diyl group, or a 1,3-dioxane-2,5-diyl group, and XLC1b1 , XLC1b2 , XLC1c1 to XLC1c4 Are each independently a hydrogen atom, a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 ), and are preferably one or more compounds selected from the group consisting of compounds represented by:
RLC11はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基がより好ましい。
R LC11 is preferably independently an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, an alkyl group having 1 to 5 carbon atoms, carbon An alkoxy group having 1 to 5 atoms and an alkenyl group having 2 to 5 carbon atoms are more preferable.
XLC11~XLC1c4はそれぞれ独立して水素原子又はフッ素原子が好ましい。
X LC11 to X LC1c4 are each independently preferably a hydrogen atom or a fluorine atom.
YLC11はそれぞれ独立してフッ素原子、-CF3又は-OCF3が好ましい。
Y LC11 is preferably independently a fluorine atom, —CF 3 or —OCF 3 .
また、一般式(LC1)は、下記一般式(LC1-d)から一般式(LC1-m)
The general formula (LC1) is changed from the following general formula (LC1-d) to the general formula (LC1-m).
(式中、RLC11、YLC11、XLC11及びXLC12はそれぞれ独立して前記一般式(LC1)におけるRLC11、YLC11、XLC11及びXLC12と同じ意味を表し、ALC1d1、ALC1f1、ALC1g1、ALC1j1、ALC1k1、ALC1k2、ALC1m1~ALC1m3は、1,4-フェニレン基、トランス-1,4-シクロヘキシレン基、テトラヒドロピラン-2,5-ジイル基、1,3-ジオキサン-2,5-ジイル基を表し、XLC1d1、XLC1d2、XLC1f1、XLC1f2、XLC1g1、XLC1g2、XLC1h1、XLC1h2、XLC1i1、XLC1i2、XLC1j1~XLC1j4、XLC1k1、XLC1k2、XLC1m1及びXLC1m2はそれぞれ独立して水素原子、フッ素原子、塩素原子、-CF3又は-OCF3を表し、ZLC1d1、ZLC1e1、ZLC1j1、ZLC1k1、ZLC1m1はそれぞれ独立して単結合、-CH=CH-、-CF=CF-、-C≡C-、-CH2CH2-、-(CH2)4-、-OCH2-、-CH2O-、-OCF2-、-CF2O-、-COO-又は-OCO-を表す。)で表される化合物からなる群より選ばれる1種又は2種以上の化合物であるのが好ましい。
(Wherein, R LC11, Y LC11, X LC11 and X LC12 each independently represent the same meaning as R LC11, Y LC11, X LC11 and X LC12 in the general formula (LC1), A LC1d1, A LC1f1, A LC1g1 , A LC1j1 , A LC1k1 , A LC1k2 , A LC1m1 to A LC1m3 are 1,4-phenylene group, trans-1,4-cyclohexylene group, tetrahydropyran-2,5-diyl group, 1,3- It represents dioxane-2,5-diyl group, X LC1d1, X LC1d2, X LC1f1, X LC1f2, X LC1g1, X LC1g2, X LC1h1, X LC1h2, X LC1i1, X LC1i2, X LC1j1 ~ X LC1j4, X LC1k1, X LC1k2, X LC1 Each 1 and X LC1m2 independently a hydrogen atom, a fluorine atom, a chlorine atom, a -CF 3 or -OCF 3, Z LC1d1, Z LC1e1 , Z LC1j1, Z LC1k1, Z LC1m1 each independently represent a single bond, —CH═CH—, —CF═CF—, —C≡C—, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, — CF 2 O—, —COO— or —OCO— is preferred), and it is preferably one or more compounds selected from the group consisting of compounds represented by:
RLC11はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基がより好ましい。
R LC11 is preferably independently an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, an alkyl group having 1 to 5 carbon atoms, carbon An alkoxy group having 1 to 5 atoms and an alkenyl group having 2 to 5 carbon atoms are more preferable.
XLC11~XLC1m2はそれぞれ独立して水素原子又はフッ素原子が好ましい。
X LC11 to X LC1m2 are each independently preferably a hydrogen atom or a fluorine atom.
YLC11はそれぞれ独立してフッ素原子、-CF3又は-OCF3が好ましい。
Y LC11 is preferably independently a fluorine atom, —CF 3 or —OCF 3 .
ZLC1d1~ZLC1m1はそれぞれ独立して-CF2O-、-OCH2-が好ましい。
一般式(LC2)は、下記一般式(LC2-a)から一般式(LC2-g) Z LC1d1 to Z LC1m1 are each independently preferably —CF 2 O— or —OCH 2 —.
The general formula (LC2) is changed from the following general formula (LC2-a) to the general formula (LC2-g).
一般式(LC2)は、下記一般式(LC2-a)から一般式(LC2-g) Z LC1d1 to Z LC1m1 are each independently preferably —CF 2 O— or —OCH 2 —.
The general formula (LC2) is changed from the following general formula (LC2-a) to the general formula (LC2-g).
(式中、RLC21、YLC21、XLC21~XLC23はそれぞれ独立して前記一般式(LC2)におけるRLC21、YLC21、XLC21~XLC23と同じ意味を表し、XLC2d1~XLC2d4、XLC2e1~XLC2e4、XLC2f1~XLC2f4及びXLC2g1~XLC2g4はそれぞれ独立して水素原子、フッ素原子、塩素原子、-CF3又は-OCF3を表し、ZLC2a1、ZLC2b1、ZLC2c1、ZLC2d1、ZLC2e1、ZLC2f1及びZLC2g1はそれぞれ独立して単結合、-CH=CH-、-CF=CF-、-C≡C-、-CH2CH2-、-(CH2)4-、-OCH2-、-CH2O-、-OCF2-、-CF2O-、-COO-又は-OCO-を表す。)で表される化合物からなる群より選ばれる1種又は2種以上の化合物であるのが好ましい。
( Wherein R LC21 , Y LC21 , X LC21 to X LC23 each independently represents the same meaning as R LC21 , Y LC21 , X LC21 to X LC23 in the general formula (LC2), and X LC2d1 to X LC2d4 , X LC2e1 to X LC2e4 , X LC2f1 to X LC2f4 and X LC2g1 to X LC2g4 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, —CF 3 or —OCF 3 , and Z LC2a1 , Z LC2b1 , Z LC2c1 , Z LC2d1 , Z LC2e1 , Z LC2f1 and Z LC2g1 are each independently a single bond, —CH═CH—, —CF═CF— , —C≡C— , —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, —COO— or Represents —OCO—, and is preferably one or more compounds selected from the group consisting of compounds represented by:
RLC21はそれぞれ独立して炭素原子数1~7のアルキル基、炭素原子数1~7のアルコキシ基、炭素原子数2~7のアルケニル基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基がより好ましい。
R LC21 is preferably independently an alkyl group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an alkenyl group having 2 to 7 carbon atoms, an alkyl group having 1 to 5 carbon atoms, carbon An alkoxy group having 1 to 5 atoms and an alkenyl group having 2 to 5 carbon atoms are more preferable.
XLC21~XLC2g4はそれぞれ独立して水素原子又はフッ素原子が好ましく、
YLC21はそれぞれ独立してフッ素原子、-CF3又は-OCF3が好ましい。 X LC21 to X LC2g4 are each independently preferably a hydrogen atom or a fluorine atom,
Y LC21 is preferably each independently a fluorine atom, —CF 3 or —OCF 3 .
YLC21はそれぞれ独立してフッ素原子、-CF3又は-OCF3が好ましい。 X LC21 to X LC2g4 are each independently preferably a hydrogen atom or a fluorine atom,
Y LC21 is preferably each independently a fluorine atom, —CF 3 or —OCF 3 .
ZLC2a1~ZLC2g4はそれぞれ独立して-CF2O-、-OCH2-が好ましい。 本発明の組成物は、分子内に過酸(-CO-OO-)構造等の酸素原子同士が結合した構造を持つ化合物を含有しないことが好ましい。
Z LC2a1 to Z LC2g4 are each independently preferably —CF 2 O— or —OCH 2 —. The composition of the present invention preferably does not contain a compound having a structure in which oxygen atoms such as a peracid (—CO—OO—) structure are bonded in the molecule.
組成物の信頼性及び長期安定性を重視する場合にはカルボニル基を有する化合物の含有量を前記組成物の総質量に対して5%以下とすることが好ましく、3%以下とすることがより好ましく、1%以下とすることが更に好ましく、実質的に含有しないことが最も好ましい。
When emphasizing the reliability and long-term stability of the composition, the content of the compound having a carbonyl group is preferably 5% or less, more preferably 3% or less with respect to the total mass of the composition. Preferably, it is more preferably 1% or less, and most preferably not substantially contained.
UV照射による安定性を重視する場合、塩素原子が置換している化合物の含有量を前記組成物の総質量に対して15%以下とすることが好ましく、10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。
When importance is attached to the stability by UV irradiation, the content of the compound substituted with chlorine atoms is preferably 15% or less, preferably 10% or less, based on the total mass of the composition. % Or less, preferably 5% or less, more preferably 3% or less, and still more preferably substantially not contained.
組成物の酸化による劣化を抑えるためには、環構造としてシクロヘキセニレン基を有する化合物の含有量を少なくすることが好ましく、シクロヘキセニレン基を有する化合物の含有量を前記組成物の総質量に対して10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。
In order to suppress deterioration due to oxidation of the composition, it is preferable to reduce the content of the compound having a cyclohexenylene group as a ring structure, and the content of the compound having a cyclohexenylene group as the total mass of the composition. On the other hand, it is preferably 10% or less, preferably 8% or less, more preferably 5% or less, preferably 3% or less, and still more preferably not contained.
粘度の改善及びTNIの改善を重視する場合には、水素原子がハロゲンに置換されていてもよい2-メチルベンゼン-1,4-ジイル基を分子内に持つ化合物の含有量を少なくすることが好ましく、前記2-メチルベンゼン-1,4-ジイル基を分子内に持つ化合物の含有量を前記組成物の総質量に対して10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。
When emphasizing improvements of improvement and T NI viscosity, that a hydrogen atom to reduce the content of the compound having the optionally substituted 2-methyl-1,4-diyl group halogen in the molecule The content of the compound having a 2-methylbenzene-1,4-diyl group in the molecule is preferably 10% or less, more preferably 8% or less with respect to the total mass of the composition. It is preferably 5% or less, more preferably 3% or less, and still more preferably substantially not contained.
本願において実質的に含有しないとは、意図せずに含有する物を除いて含有しないという意味である。
“Substantially not contained” in the present application means that it is not contained except for an unintentionally contained product.
本発明の第一実施形態の組成物に含有される化合物が、側鎖としてアルケニル基を有する場合、前記アルケニル基がシクロヘキサンに結合している場合には当該アルケニル基の炭素原子数は2~5であることが好ましく、前記アルケニル基がベンゼンに結合している場合には当該アルケニル基の炭素原子数は4~5であることが好ましく、前記アルケニル基の不飽和結合とベンゼンは直接結合していないことが好ましい。
When the compound contained in the composition of the first embodiment of the present invention has an alkenyl group as a side chain, when the alkenyl group is bonded to cyclohexane, the alkenyl group has 2 to 5 carbon atoms. When the alkenyl group is bonded to benzene, the number of carbon atoms of the alkenyl group is preferably 4 to 5, and the unsaturated bond of the alkenyl group and benzene are directly bonded. Preferably not.
本発明に使用される液晶組成物の平均弾性定数(KAVG)は10から25が好ましいが、その下限値としては、10が好ましく、10.5が好ましく、11が好ましく、11.5が好ましく、12が好ましく、12.3が好ましく、12.5が好ましく、12.8が好ましく、13が好ましく、13.3が好ましく、13.5が好ましく、13.8が好ましく、14が好ましく、14.3が好ましく、14.5が好ましく、14.8が好ましく、15が好ましく、15.3が好ましく、15.5が好ましく、15.8が好ましく、16が好ましく、16.3が好ましく、16.5が好ましく、16.8が好ましく、17が好ましく、17.3が好ましく、17.5が好ましく、17.8が好ましく、18が好ましく、その上限値としては、25が好ましく、24.5が好ましく、24が好ましく、23.5が好ましく、23が好ましく、22.8が好ましく、22.5が好ましく、22.3が好ましく、22が好ましく、21.8が好ましく、21.5が好ましく、21.3が好ましく、21が好ましく、20.8が好ましく、20.5が好ましく、20.3が好ましく、20が好ましく、19.8が好ましく、19.5が好ましく、19.3が好ましく、19が好ましく、18.8が好ましく、18.5が好ましく、18.3が好ましく、18が好ましく、17.8が好ましく、17.5が好ましく、17.3が好ましく、17が好ましい。消費電力削減を重視する場合にはバックライトの光量を抑えることが有効であり、液晶表示素子は光の透過率を向上させることが好ましく、そのためにはKAVGの値を低めに設定することが好ましい。応答速度の改善を重視する場合にはKAVGの値を高めに設定することが好ましい。 本発明の液晶組成物は、20℃における屈折率異方性(Δn)が0.08から0.14であるが、0.09から0.13がより好ましく、0.09から0.12が特に好ましい。更に詳述すると、薄いセルギャップに対応する場合は0.10から0.13であることが好ましく、厚いセルギャップに対応する場合は0.08から0.10であることが好ましい。
The average elastic constant (K AVG ) of the liquid crystal composition used in the present invention is preferably 10 to 25, and the lower limit thereof is preferably 10, preferably 10.5, preferably 11 and preferably 11.5. , 12 is preferable, 12.3 is preferable, 12.5 is preferable, 12.8 is preferable, 13 is preferable, 13.3 is preferable, 13.5 is preferable, 13.8 is preferable, 14 is preferable, 14 .3 is preferred, 14.5 is preferred, 14.8 is preferred, 15 is preferred, 15.3 is preferred, 15.5 is preferred, 15.8 is preferred, 16 is preferred, 16.3 is preferred, 16 .5, 16.8 is preferable, 17 is preferable, 17.3 is preferable, 17.5 is preferable, 17.8 is preferable, and 18 is preferable. 25 is preferable, 24.5 is preferable, 24 is preferable, 23.5 is preferable, 23 is preferable, 22.8 is preferable, 22.5 is preferable, 22.3 is preferable, 22 is preferable, and 21.8 is 21.5 is preferred, 21.3 is preferred, 21 is preferred, 20.8 is preferred, 20.5 is preferred, 20.3 is preferred, 20 is preferred, 19.8 is preferred, 19.5 is preferred 19.3 is preferred, 19 is preferred, 18.8 is preferred, 18.5 is preferred, 18.3 is preferred, 18 is preferred, 17.8 is preferred, 17.5 is preferred, 17.3 is preferred 17 is preferable. When importance is placed on reducing power consumption, it is effective to reduce the amount of light from the backlight, and it is preferable to improve the light transmittance of the liquid crystal display element. For this purpose, the value of K AVG should be set low. preferable. It is preferable to set a higher value of K AVG in the case of emphasizing improved response speed. The liquid crystal composition of the present invention has a refractive index anisotropy (Δn) at 20 ° C. of 0.08 to 0.14, more preferably 0.09 to 0.13, and 0.09 to 0.12. Particularly preferred. More specifically, it is preferably 0.10 to 0.13 when dealing with a thin cell gap, and preferably 0.08 to 0.10 when dealing with a thick cell gap.
本発明の液晶組成物は、20℃における粘度(η)が10から30mPa・sであるが、10から25mPa・sであることがより好ましく、10から22mPa・sであることが特に好ましい。
The liquid crystal composition of the present invention has a viscosity (η) at 20 ° C. of 10 to 30 mPa · s, more preferably 10 to 25 mPa · s, and particularly preferably 10 to 22 mPa · s.
本発明の液晶組成物は、20℃における回転粘性(γ1)が60から200mPa・sであるが、60から120mPa・sであることがより好ましく、60から100mPa・sであることが特に好ましい。
The liquid crystal composition of the present invention has a rotational viscosity (γ 1 ) at 20 ° C. of 60 to 200 mPa · s, more preferably 60 to 120 mPa · s, and particularly preferably 60 to 100 mPa · s. .
本発明の液晶組成物は、ネマチック相-等方性液体相転移温度(Tni)が60℃から120℃であるが、70℃から100℃がより好ましく、70℃から85℃が特に好ましい。加えて、20℃においてネマチック液晶を示す事が好ましい。
The liquid crystal composition of the present invention has a nematic phase-isotropic liquid phase transition temperature (T ni ) of 60 ° C. to 120 ° C., more preferably 70 ° C. to 100 ° C., and particularly preferably 70 ° C. to 85 ° C. In addition, it is preferable to show a nematic liquid crystal at 20 ° C.
本発明の液晶組成物は、上述の化合物以外に、通常のネマチック液晶、スメクチック液晶、コレステリック液晶、酸化防止剤、紫外線吸収剤、赤外線吸収剤、重合性モノマー又は光安定剤等を含有してもよい。 本発明の化合物を含有する液晶組成物を用いた液晶表示素子は、高速応答と表示不良の抑制を両立させた有用なものであり、特に、アクティブマトリックス駆動用液晶表示素子に有用であり、VAモード、PSVAモード、PSAモード、IPSモード、FFSモード又はECBモード用等の種々のモードの液晶表示素子に適用できる。
The liquid crystal composition of the present invention may contain a normal nematic liquid crystal, a smectic liquid crystal, a cholesteric liquid crystal, an antioxidant, an ultraviolet absorber, an infrared absorber, a polymerizable monomer, or a light stabilizer in addition to the above-described compounds. Good. The liquid crystal display device using the liquid crystal composition containing the compound of the present invention is useful for achieving both high-speed response and suppression of display failure, and is particularly useful for a liquid crystal display device for active matrix driving. The present invention can be applied to liquid crystal display elements in various modes such as a mode, a PSVA mode, a PSA mode, an IPS mode, an FFS mode, or an ECB mode.
以下、実施例を挙げて本発明を更に詳述するが、本発明はこれらの実施例に限定されるものではない。また、以下の実施例及び比較例の組成物における「%」は『質量%』を意味する。相転移温度の測定は温度調節ステージを備えた偏光顕微鏡及び示差走査熱量計(DSC)を併用して行った。
Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. Further, “%” in the compositions of the following Examples and Comparative Examples means “% by mass”. The phase transition temperature was measured using a polarizing microscope equipped with a temperature control stage and a differential scanning calorimeter (DSC).
Tn-iはネマチック相-等方相の転移温度を表す。
T n-i nematic phase - represents the transition temperature of the isotropic phase.
化合物記載に下記の略号を使用する。
THF:テトラヒドロフラン
LDA:リチウム ジイソプロピルアミド
Me:メチル基、Et:エチル基、Pr:n-プロピル基、Bu:n-ブチル基、
Pent:n-ペンチル基
(実施例1~2)化合物1-8-203及び化合物2-8-203の合成 The following abbreviations are used in compound descriptions.
THF: tetrahydrofuran LDA: lithium diisopropylamide Me: methyl group, Et: ethyl group, Pr: n-propyl group, Bu: n-butyl group,
Pent: n-pentyl group (Examples 1 and 2) Synthesis of compounds 1-8-203 and 2-8-203
THF:テトラヒドロフラン
LDA:リチウム ジイソプロピルアミド
Me:メチル基、Et:エチル基、Pr:n-プロピル基、Bu:n-ブチル基、
Pent:n-ペンチル基
(実施例1~2)化合物1-8-203及び化合物2-8-203の合成 The following abbreviations are used in compound descriptions.
THF: tetrahydrofuran LDA: lithium diisopropylamide Me: methyl group, Et: ethyl group, Pr: n-propyl group, Bu: n-butyl group,
Pent: n-pentyl group (Examples 1 and 2) Synthesis of compounds 1-8-203 and 2-8-203
(化合物1-2-20の合成)
窒素雰囲気下、撹拌装置、温度計、滴下ロート、冷却管を備えた反応容器に、3-フルオロ-2-ヒドロキシクロロベンゼン(50.0g)、ビス(ジターシャリーブチル(4-ジメチルアミノフェニル)ホスフィン)塩化パラジウム(II)錯体(6.0g)、THF(350ml)および2M炭酸セシウム水溶液(340ml)を加え、攪拌しながら60℃に昇温した。反応混合物にあらかじめTHF(200ml)に溶解しておいた化合物1-2(75.8g)を滴下した。60℃で7時間攪拌後、加熱を止め溶液温度を室温に戻した。その後、10%塩酸(500ml)を加えた。有機層を分けとり、さらに水層をトルエン(200ml)で再抽出した。得られた有機層を合わせた後、水、飽和食塩水の順に洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮後、ヘキサン(150ml)、トルエン(150ml)を加えて溶解した溶液を、シリカゲル(30g)を詰めたカラムを通過させた。得られたカラム通過溶液を濃縮した後、トルエン/ヘキサン混合溶媒を用いて再結晶を繰り返すことで、化合物1-2-20(46.0g)を得た。 (Synthesis of Compound 1-2-20)
Under a nitrogen atmosphere, in a reaction vessel equipped with a stirrer, thermometer, dropping funnel, and condenser, 3-fluoro-2-hydroxychlorobenzene (50.0 g), bis (ditertiary butyl (4-dimethylaminophenyl) phosphine) Palladium (II) chloride complex (6.0 g), THF (350 ml) and 2M aqueous cesium carbonate solution (340 ml) were added, and the temperature was raised to 60 ° C. with stirring. Compound 1-2 (75.8 g) previously dissolved in THF (200 ml) was added dropwise to the reaction mixture. After stirring at 60 ° C. for 7 hours, heating was stopped and the solution temperature was returned to room temperature. Then 10% hydrochloric acid (500 ml) was added. The organic layer was separated and the aqueous layer was re-extracted with toluene (200 ml). The combined organic layers were washed with water and saturated brine in that order, dried over anhydrous sodium sulfate. After concentrating the resulting solution, a solution dissolved by adding hexane (150 ml) and toluene (150 ml) was passed through a column packed with silica gel (30 g). The obtained column passing solution was concentrated, and recrystallization was repeated using a toluene / hexane mixed solvent to obtain compound 1-2-20 (46.0 g).
窒素雰囲気下、撹拌装置、温度計、滴下ロート、冷却管を備えた反応容器に、3-フルオロ-2-ヒドロキシクロロベンゼン(50.0g)、ビス(ジターシャリーブチル(4-ジメチルアミノフェニル)ホスフィン)塩化パラジウム(II)錯体(6.0g)、THF(350ml)および2M炭酸セシウム水溶液(340ml)を加え、攪拌しながら60℃に昇温した。反応混合物にあらかじめTHF(200ml)に溶解しておいた化合物1-2(75.8g)を滴下した。60℃で7時間攪拌後、加熱を止め溶液温度を室温に戻した。その後、10%塩酸(500ml)を加えた。有機層を分けとり、さらに水層をトルエン(200ml)で再抽出した。得られた有機層を合わせた後、水、飽和食塩水の順に洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮後、ヘキサン(150ml)、トルエン(150ml)を加えて溶解した溶液を、シリカゲル(30g)を詰めたカラムを通過させた。得られたカラム通過溶液を濃縮した後、トルエン/ヘキサン混合溶媒を用いて再結晶を繰り返すことで、化合物1-2-20(46.0g)を得た。 (Synthesis of Compound 1-2-20)
Under a nitrogen atmosphere, in a reaction vessel equipped with a stirrer, thermometer, dropping funnel, and condenser, 3-fluoro-2-hydroxychlorobenzene (50.0 g), bis (ditertiary butyl (4-dimethylaminophenyl) phosphine) Palladium (II) chloride complex (6.0 g), THF (350 ml) and 2M aqueous cesium carbonate solution (340 ml) were added, and the temperature was raised to 60 ° C. with stirring. Compound 1-2 (75.8 g) previously dissolved in THF (200 ml) was added dropwise to the reaction mixture. After stirring at 60 ° C. for 7 hours, heating was stopped and the solution temperature was returned to room temperature. Then 10% hydrochloric acid (500 ml) was added. The organic layer was separated and the aqueous layer was re-extracted with toluene (200 ml). The combined organic layers were washed with water and saturated brine in that order, dried over anhydrous sodium sulfate. After concentrating the resulting solution, a solution dissolved by adding hexane (150 ml) and toluene (150 ml) was passed through a column packed with silica gel (30 g). The obtained column passing solution was concentrated, and recrystallization was repeated using a toluene / hexane mixed solvent to obtain compound 1-2-20 (46.0 g).
(化合物1-3-20の合成)
窒素雰囲気下、撹拌装置、温度計、滴下ロート、冷却管を備えた反応容器に、水素化ナトリウム(60%ミネラルオイル分散)(5.4g)およびDMF(54ml)を加え、攪拌しながら氷冷した。そこにあらかじめDMF(150ml)に溶解しておいた化合物1-2-20(30.0g)を滴下した。その後室温に戻し、1時間かけて溶液温度を50℃に加熱した。その後さらに1.5時間かけて溶液温度を105℃まで加熱した。105℃で4時間攪拌後、溶液温度を10℃以下まで冷却した。反応溶液に水(200ml)を加えた。結晶をろ過し、メタノールで洗浄し、真空乾燥した。得られた結晶にトルエン(300ml)を加えて溶解した溶液を、シリカゲル(20g)を詰めたカラムを通過させ、さらにトルエン(200ml)を通過させた。得られたカラム通過溶液を濃縮し、化合物1-3-20(28.6g)を得た。 (Synthesis of Compound 1-3-20)
Under a nitrogen atmosphere, sodium hydride (60% mineral oil dispersion) (5.4 g) and DMF (54 ml) were added to a reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, and a condenser, and ice-cooled while stirring. did. Compound 1-2-20 (30.0 g) previously dissolved in DMF (150 ml) was added dropwise thereto. Thereafter, the temperature was returned to room temperature, and the solution temperature was heated to 50 ° C. over 1 hour. Thereafter, the solution temperature was further heated to 105 ° C. over 1.5 hours. After stirring at 105 ° C. for 4 hours, the solution temperature was cooled to 10 ° C. or lower. Water (200 ml) was added to the reaction solution. The crystals were filtered, washed with methanol and dried in vacuo. A solution in which toluene (300 ml) was added and dissolved in the obtained crystal was passed through a column packed with silica gel (20 g), and further toluene (200 ml) was passed. The resulting column passage solution was concentrated to obtain compound 1-3-20 (28.6 g).
窒素雰囲気下、撹拌装置、温度計、滴下ロート、冷却管を備えた反応容器に、水素化ナトリウム(60%ミネラルオイル分散)(5.4g)およびDMF(54ml)を加え、攪拌しながら氷冷した。そこにあらかじめDMF(150ml)に溶解しておいた化合物1-2-20(30.0g)を滴下した。その後室温に戻し、1時間かけて溶液温度を50℃に加熱した。その後さらに1.5時間かけて溶液温度を105℃まで加熱した。105℃で4時間攪拌後、溶液温度を10℃以下まで冷却した。反応溶液に水(200ml)を加えた。結晶をろ過し、メタノールで洗浄し、真空乾燥した。得られた結晶にトルエン(300ml)を加えて溶解した溶液を、シリカゲル(20g)を詰めたカラムを通過させ、さらにトルエン(200ml)を通過させた。得られたカラム通過溶液を濃縮し、化合物1-3-20(28.6g)を得た。 (Synthesis of Compound 1-3-20)
Under a nitrogen atmosphere, sodium hydride (60% mineral oil dispersion) (5.4 g) and DMF (54 ml) were added to a reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, and a condenser, and ice-cooled while stirring. did. Compound 1-2-20 (30.0 g) previously dissolved in DMF (150 ml) was added dropwise thereto. Thereafter, the temperature was returned to room temperature, and the solution temperature was heated to 50 ° C. over 1 hour. Thereafter, the solution temperature was further heated to 105 ° C. over 1.5 hours. After stirring at 105 ° C. for 4 hours, the solution temperature was cooled to 10 ° C. or lower. Water (200 ml) was added to the reaction solution. The crystals were filtered, washed with methanol and dried in vacuo. A solution in which toluene (300 ml) was added and dissolved in the obtained crystal was passed through a column packed with silica gel (20 g), and further toluene (200 ml) was passed. The resulting column passage solution was concentrated to obtain compound 1-3-20 (28.6 g).
(化合物1-4-20の合成)
窒素雰囲気下、撹拌装置、温度計、滴下ロートを備えた反応容器に、化合物1-3-20(30.1g)をTHF(300ml)に溶かし、-70℃に冷却した。1.6Mブチルリチウム/ヘキサン溶液(90.0ml)を-70℃にて滴下し、1時間攪拌し、次にホウ酸トリイソプロピル(29.7g)を-70℃にて滴下し、1時間攪拌した。この反応混合物を室温に昇温した後、10%塩酸(150ml)とヘキサン(100ml)を加えて攪拌し、得られた有機層を合わせた後、水と飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、29.5gを得た。得られた固体をTHF(150ml)、炭酸水素ナトリウム(0.42g)を攪拌している中に、30%過酸化水素水(14.9g)を室温にて滴下し、12時間攪拌した。溶液温度を0℃に冷却し、15%チオ硫酸ナトリウム水溶液(150ml)を加えた。有機層を分け取り、さらに水層を酢酸エチル(100ml)で抽出した。得られた有機層を合わせた後、水と飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物1-4-20(26.2g)を得た。 (Synthesis of Compound 1-4-20)
Under a nitrogen atmosphere, Compound 1-3-20 (30.1 g) was dissolved in THF (300 ml) in a reaction vessel equipped with a stirrer, a thermometer, and a dropping funnel, and cooled to -70 ° C. 1.6M butyllithium / hexane solution (90.0 ml) was added dropwise at −70 ° C. and stirred for 1 hour, then triisopropyl borate (29.7 g) was added dropwise at −70 ° C. and stirred for 1 hour. did. The reaction mixture was warmed to room temperature, 10% hydrochloric acid (150 ml) and hexane (100 ml) were added and stirred, and the resulting organic layers were combined, washed with water and saturated brine, and anhydrous sodium sulfate. And dried. The obtained solution was concentrated to obtain 29.5 g. While stirring the resulting solid in THF (150 ml) and sodium hydrogen carbonate (0.42 g), 30% aqueous hydrogen peroxide (14.9 g) was added dropwise at room temperature and stirred for 12 hours. The solution temperature was cooled to 0 ° C. and 15% aqueous sodium thiosulfate solution (150 ml) was added. The organic layer was separated, and the aqueous layer was extracted with ethyl acetate (100 ml). The obtained organic layers were combined, washed with water and saturated brine, and dried over anhydrous sodium sulfate. The resulting solution was concentrated to give compound 1-4-20 (26.2 g).
窒素雰囲気下、撹拌装置、温度計、滴下ロートを備えた反応容器に、化合物1-3-20(30.1g)をTHF(300ml)に溶かし、-70℃に冷却した。1.6Mブチルリチウム/ヘキサン溶液(90.0ml)を-70℃にて滴下し、1時間攪拌し、次にホウ酸トリイソプロピル(29.7g)を-70℃にて滴下し、1時間攪拌した。この反応混合物を室温に昇温した後、10%塩酸(150ml)とヘキサン(100ml)を加えて攪拌し、得られた有機層を合わせた後、水と飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、29.5gを得た。得られた固体をTHF(150ml)、炭酸水素ナトリウム(0.42g)を攪拌している中に、30%過酸化水素水(14.9g)を室温にて滴下し、12時間攪拌した。溶液温度を0℃に冷却し、15%チオ硫酸ナトリウム水溶液(150ml)を加えた。有機層を分け取り、さらに水層を酢酸エチル(100ml)で抽出した。得られた有機層を合わせた後、水と飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物1-4-20(26.2g)を得た。 (Synthesis of Compound 1-4-20)
Under a nitrogen atmosphere, Compound 1-3-20 (30.1 g) was dissolved in THF (300 ml) in a reaction vessel equipped with a stirrer, a thermometer, and a dropping funnel, and cooled to -70 ° C. 1.6M butyllithium / hexane solution (90.0 ml) was added dropwise at −70 ° C. and stirred for 1 hour, then triisopropyl borate (29.7 g) was added dropwise at −70 ° C. and stirred for 1 hour. did. The reaction mixture was warmed to room temperature, 10% hydrochloric acid (150 ml) and hexane (100 ml) were added and stirred, and the resulting organic layers were combined, washed with water and saturated brine, and anhydrous sodium sulfate. And dried. The obtained solution was concentrated to obtain 29.5 g. While stirring the resulting solid in THF (150 ml) and sodium hydrogen carbonate (0.42 g), 30% aqueous hydrogen peroxide (14.9 g) was added dropwise at room temperature and stirred for 12 hours. The solution temperature was cooled to 0 ° C. and 15% aqueous sodium thiosulfate solution (150 ml) was added. The organic layer was separated, and the aqueous layer was extracted with ethyl acetate (100 ml). The obtained organic layers were combined, washed with water and saturated brine, and dried over anhydrous sodium sulfate. The resulting solution was concentrated to give compound 1-4-20 (26.2 g).
(化合物1-5-20の合成)
窒素雰囲気下、撹拌装置、温度計、滴下ロート、冷却管を備えた反応容器に、化合物1-4-20(5.3g)、クロロメチルメチルエーテル(2.4g)、水素化ナトリウム(60%ミネラルオイル分散)(1.2g)およびTHF(20ml)を加え、攪拌した。60℃で1.5時間攪拌後、溶液温度を10℃以下まで冷却した。反応溶液に水(20ml)および酢酸エチル(20ml)を加えた。有機層を分けとり、さらに水層を酢酸エチル(30ml)で再抽出した。得られた有機層を合わせた後、水、飽和食塩水の順に洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物1-5-20の粗体(6.9g)を得た。 (Synthesis of Compound 1-5-20)
Under a nitrogen atmosphere, in a reaction vessel equipped with a stirrer, thermometer, dropping funnel, and condenser, compound 1-4-20 (5.3 g), chloromethyl methyl ether (2.4 g), sodium hydride (60% Mineral oil dispersion) (1.2 g) and THF (20 ml) were added and stirred. After stirring at 60 ° C. for 1.5 hours, the solution temperature was cooled to 10 ° C. or lower. Water (20 ml) and ethyl acetate (20 ml) were added to the reaction solution. The organic layer was separated and the aqueous layer was re-extracted with ethyl acetate (30 ml). The combined organic layers were washed with water and saturated brine in that order, dried over anhydrous sodium sulfate. The obtained solution was concentrated to obtain a crude product of compound 1-5-20 (6.9 g).
窒素雰囲気下、撹拌装置、温度計、滴下ロート、冷却管を備えた反応容器に、化合物1-4-20(5.3g)、クロロメチルメチルエーテル(2.4g)、水素化ナトリウム(60%ミネラルオイル分散)(1.2g)およびTHF(20ml)を加え、攪拌した。60℃で1.5時間攪拌後、溶液温度を10℃以下まで冷却した。反応溶液に水(20ml)および酢酸エチル(20ml)を加えた。有機層を分けとり、さらに水層を酢酸エチル(30ml)で再抽出した。得られた有機層を合わせた後、水、飽和食塩水の順に洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物1-5-20の粗体(6.9g)を得た。 (Synthesis of Compound 1-5-20)
Under a nitrogen atmosphere, in a reaction vessel equipped with a stirrer, thermometer, dropping funnel, and condenser, compound 1-4-20 (5.3 g), chloromethyl methyl ether (2.4 g), sodium hydride (60% Mineral oil dispersion) (1.2 g) and THF (20 ml) were added and stirred. After stirring at 60 ° C. for 1.5 hours, the solution temperature was cooled to 10 ° C. or lower. Water (20 ml) and ethyl acetate (20 ml) were added to the reaction solution. The organic layer was separated and the aqueous layer was re-extracted with ethyl acetate (30 ml). The combined organic layers were washed with water and saturated brine in that order, dried over anhydrous sodium sulfate. The obtained solution was concentrated to obtain a crude product of compound 1-5-20 (6.9 g).
(化合物1-6-20の合成)
窒素雰囲気下、撹拌装置、温度計、滴下ロートを備えた反応容器に、化合物1-5-20(4.7g)をTHF(56ml)に溶かし、-70℃に冷却した。1.6Mブチルリチウム/ヘキサン溶液(10.0ml)を-70℃にて滴下し1時間攪拌し、-20℃まで昇温した。再び-70℃に冷却した後、あらかじめTHF(15ml)に溶解させたヨウ素(4.7g)を-70℃にて滴下し、1時間攪拌した。この反応混合物を室温に昇温した後、20%亜硫酸ナトリウム水溶液(100ml)とヘキサン(100ml)を加えて攪拌し、得られた有機層を合わせた後、水と飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物1-6-20(6.4g)を得た。
(化合物1-7-203の合成)
窒素雰囲気下、撹拌装置、温度計、滴下ロート、冷却管を備えた反応容器に、化合物1-6-20(6.3g)、ビス(トリフェニルホスフィン)パラジウム(II)ジクロリド(270.0mg)、ヨウ化銅(145mg)をTHF(350ml)および1Nアンモニア水(35mL)に溶解攪拌している中に、室温下、1-ペンチン(1.8ml)を滴下した後、反応温度を45℃にした。45℃で2時間攪拌した後、酢酸エチル(100ml)を加えた。有機層を分けとり、さらに水層を酢酸エチル(50ml)で再抽出した。得られた有機層を合わせた後、水、飽和食塩水の順に洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮後、化合物1-7-203(5.7g)を得た。 (Synthesis of Compound 1-6-20)
Under a nitrogen atmosphere, Compound 1-5-20 (4.7 g) was dissolved in THF (56 ml) in a reaction vessel equipped with a stirrer, a thermometer, and a dropping funnel, and cooled to -70 ° C. A 1.6M butyllithium / hexane solution (10.0 ml) was added dropwise at -70 ° C, stirred for 1 hour, and the temperature was raised to -20 ° C. After cooling to −70 ° C. again, iodine (4.7 g) previously dissolved in THF (15 ml) was added dropwise at −70 ° C. and stirred for 1 hour. The reaction mixture was warmed to room temperature, 20% aqueous sodium sulfite solution (100 ml) and hexane (100 ml) were added and stirred, and the resulting organic layers were combined, washed with water and saturated brine, Sodium sulfate was added and dried. The resulting solution was concentrated to give compound 1-6-20 (6.4 g).
(Synthesis of Compound 1-7-203)
In a reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, and a condenser tube under a nitrogen atmosphere, compound 1-6-20 (6.3 g), bis (triphenylphosphine) palladium (II) dichloride (270.0 mg) 1-pentyne (1.8 ml) was added dropwise at room temperature to copper iodide (145 mg) dissolved in THF (350 ml) and 1N aqueous ammonia (35 mL) and stirred, and then the reaction temperature was raised to 45 ° C. did. After stirring at 45 ° C. for 2 hours, ethyl acetate (100 ml) was added. The organic layer was separated and the aqueous layer was re-extracted with ethyl acetate (50 ml). The combined organic layers were washed with water and saturated brine in that order, dried over anhydrous sodium sulfate. After concentration of the resulting solution, compound 1-7-203 (5.7 g) was obtained.
窒素雰囲気下、撹拌装置、温度計、滴下ロートを備えた反応容器に、化合物1-5-20(4.7g)をTHF(56ml)に溶かし、-70℃に冷却した。1.6Mブチルリチウム/ヘキサン溶液(10.0ml)を-70℃にて滴下し1時間攪拌し、-20℃まで昇温した。再び-70℃に冷却した後、あらかじめTHF(15ml)に溶解させたヨウ素(4.7g)を-70℃にて滴下し、1時間攪拌した。この反応混合物を室温に昇温した後、20%亜硫酸ナトリウム水溶液(100ml)とヘキサン(100ml)を加えて攪拌し、得られた有機層を合わせた後、水と飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物1-6-20(6.4g)を得た。
(化合物1-7-203の合成)
窒素雰囲気下、撹拌装置、温度計、滴下ロート、冷却管を備えた反応容器に、化合物1-6-20(6.3g)、ビス(トリフェニルホスフィン)パラジウム(II)ジクロリド(270.0mg)、ヨウ化銅(145mg)をTHF(350ml)および1Nアンモニア水(35mL)に溶解攪拌している中に、室温下、1-ペンチン(1.8ml)を滴下した後、反応温度を45℃にした。45℃で2時間攪拌した後、酢酸エチル(100ml)を加えた。有機層を分けとり、さらに水層を酢酸エチル(50ml)で再抽出した。得られた有機層を合わせた後、水、飽和食塩水の順に洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮後、化合物1-7-203(5.7g)を得た。 (Synthesis of Compound 1-6-20)
Under a nitrogen atmosphere, Compound 1-5-20 (4.7 g) was dissolved in THF (56 ml) in a reaction vessel equipped with a stirrer, a thermometer, and a dropping funnel, and cooled to -70 ° C. A 1.6M butyllithium / hexane solution (10.0 ml) was added dropwise at -70 ° C, stirred for 1 hour, and the temperature was raised to -20 ° C. After cooling to −70 ° C. again, iodine (4.7 g) previously dissolved in THF (15 ml) was added dropwise at −70 ° C. and stirred for 1 hour. The reaction mixture was warmed to room temperature, 20% aqueous sodium sulfite solution (100 ml) and hexane (100 ml) were added and stirred, and the resulting organic layers were combined, washed with water and saturated brine, Sodium sulfate was added and dried. The resulting solution was concentrated to give compound 1-6-20 (6.4 g).
(Synthesis of Compound 1-7-203)
In a reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, and a condenser tube under a nitrogen atmosphere, compound 1-6-20 (6.3 g), bis (triphenylphosphine) palladium (II) dichloride (270.0 mg) 1-pentyne (1.8 ml) was added dropwise at room temperature to copper iodide (145 mg) dissolved in THF (350 ml) and 1N aqueous ammonia (35 mL) and stirred, and then the reaction temperature was raised to 45 ° C. did. After stirring at 45 ° C. for 2 hours, ethyl acetate (100 ml) was added. The organic layer was separated and the aqueous layer was re-extracted with ethyl acetate (50 ml). The combined organic layers were washed with water and saturated brine in that order, dried over anhydrous sodium sulfate. After concentration of the resulting solution, compound 1-7-203 (5.7 g) was obtained.
(化合物1-8-203の合成)
窒素雰囲気下、撹拌装置、温度計、滴下ロートを備えた反応容器に、化合物1-7-203(6.0g)をTHF(60ml)及びイソプロピルアルコール(20ml)に溶かし、室温下10%塩酸(40ml)を滴下した。反応温度を55℃に昇温し、5時間攪拌した。室温に戻し、酢酸エチル(100ml)を加え、水と飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、粗体(6.6g)を得た。得られた粗体をシリカゲルクロマトグラフィーにて精製した後、エタノール/酢酸エチル混合溶媒を用いて再結晶を繰り返すことで、化合物1-8-203(3.2g)を得た。相転移温度はCr106Iso。
(化合物2-8-203の合成)
窒素雰囲気下、撹拌装置を備えた反応容器に、化合物1-8-203(1.5g)、10%パラジウムカーボン(150mg)をTHF(9.0ml)およびメタノール(6ml)に溶解させ、水素雰囲気とした。窒素雰囲気に戻した後、触媒をろ別。得られた溶液を濃縮後、シリカゲルクロマトグラフィーにて精製した。エタノール/酢酸エチル混合溶媒を用いて再結晶を繰り返すことで、化合物2-8-203(0.9g)を得た。相転移温度はCr74Iso。
(実施例3~324)化合物1-8-0~化合物4-8-808の合成
実施例1、実施例2と同様の反応、および必要に応じて公知の方法に準拠した方法を用いて、実施例3(化合物1-8-0)~実施例324(化合物4-8-808)を合成した。 (Synthesis of Compound 1-8-203)
In a reaction vessel equipped with a stirrer, thermometer, and dropping funnel in a nitrogen atmosphere, compound 1-7-203 (6.0 g) was dissolved in THF (60 ml) and isopropyl alcohol (20 ml), and 10% hydrochloric acid ( 40 ml) was added dropwise. The reaction temperature was raised to 55 ° C. and stirred for 5 hours. After returning to room temperature, ethyl acetate (100 ml) was added, washed with water and saturated brine, and dried over anhydrous sodium sulfate. The obtained solution was concentrated to obtain a crude product (6.6 g). The obtained crude product was purified by silica gel chromatography, and then recrystallization was repeated using an ethanol / ethyl acetate mixed solvent to obtain compound 1-8-203 (3.2 g). The phase transition temperature is Cr106Iso.
(Synthesis of Compound 2-8-203)
Under a nitrogen atmosphere, compound 1-8-203 (1.5 g), 10% palladium carbon (150 mg) was dissolved in THF (9.0 ml) and methanol (6 ml) in a reaction vessel equipped with a stirrer, and a hydrogen atmosphere It was. After returning to a nitrogen atmosphere, the catalyst is filtered off. The resulting solution was concentrated and purified by silica gel chromatography. Compound 2-8-203 (0.9 g) was obtained by repeated recrystallization using a mixed solvent of ethanol / ethyl acetate. The phase transition temperature is Cr74Iso.
Examples 3 to 324 Synthesis of Compound 1-8-0 to Compound 4-8-808 Using the same reaction as in Example 1 and Example 2, and if necessary, a method based on a known method, Example 3 (Compound 1-8-0) to Example 324 (Compound 4-8-808) were synthesized.
窒素雰囲気下、撹拌装置、温度計、滴下ロートを備えた反応容器に、化合物1-7-203(6.0g)をTHF(60ml)及びイソプロピルアルコール(20ml)に溶かし、室温下10%塩酸(40ml)を滴下した。反応温度を55℃に昇温し、5時間攪拌した。室温に戻し、酢酸エチル(100ml)を加え、水と飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、粗体(6.6g)を得た。得られた粗体をシリカゲルクロマトグラフィーにて精製した後、エタノール/酢酸エチル混合溶媒を用いて再結晶を繰り返すことで、化合物1-8-203(3.2g)を得た。相転移温度はCr106Iso。
(化合物2-8-203の合成)
窒素雰囲気下、撹拌装置を備えた反応容器に、化合物1-8-203(1.5g)、10%パラジウムカーボン(150mg)をTHF(9.0ml)およびメタノール(6ml)に溶解させ、水素雰囲気とした。窒素雰囲気に戻した後、触媒をろ別。得られた溶液を濃縮後、シリカゲルクロマトグラフィーにて精製した。エタノール/酢酸エチル混合溶媒を用いて再結晶を繰り返すことで、化合物2-8-203(0.9g)を得た。相転移温度はCr74Iso。
(実施例3~324)化合物1-8-0~化合物4-8-808の合成
実施例1、実施例2と同様の反応、および必要に応じて公知の方法に準拠した方法を用いて、実施例3(化合物1-8-0)~実施例324(化合物4-8-808)を合成した。 (Synthesis of Compound 1-8-203)
In a reaction vessel equipped with a stirrer, thermometer, and dropping funnel in a nitrogen atmosphere, compound 1-7-203 (6.0 g) was dissolved in THF (60 ml) and isopropyl alcohol (20 ml), and 10% hydrochloric acid ( 40 ml) was added dropwise. The reaction temperature was raised to 55 ° C. and stirred for 5 hours. After returning to room temperature, ethyl acetate (100 ml) was added, washed with water and saturated brine, and dried over anhydrous sodium sulfate. The obtained solution was concentrated to obtain a crude product (6.6 g). The obtained crude product was purified by silica gel chromatography, and then recrystallization was repeated using an ethanol / ethyl acetate mixed solvent to obtain compound 1-8-203 (3.2 g). The phase transition temperature is Cr106Iso.
(Synthesis of Compound 2-8-203)
Under a nitrogen atmosphere, compound 1-8-203 (1.5 g), 10% palladium carbon (150 mg) was dissolved in THF (9.0 ml) and methanol (6 ml) in a reaction vessel equipped with a stirrer, and a hydrogen atmosphere It was. After returning to a nitrogen atmosphere, the catalyst is filtered off. The resulting solution was concentrated and purified by silica gel chromatography. Compound 2-8-203 (0.9 g) was obtained by repeated recrystallization using a mixed solvent of ethanol / ethyl acetate. The phase transition temperature is Cr74Iso.
Examples 3 to 324 Synthesis of Compound 1-8-0 to Compound 4-8-808 Using the same reaction as in Example 1 and Example 2, and if necessary, a method based on a known method, Example 3 (Compound 1-8-0) to Example 324 (Compound 4-8-808) were synthesized.
(実施例325)液晶組成物の調製-1
以下の物性値を示すホスト液晶(H)
を調製した。値はいずれも実測値である。 Example 325 Preparation of Liquid Crystal Composition-1
Host liquid crystal (H) showing the following physical properties
Was prepared. All the values are actually measured values.
以下の物性値を示すホスト液晶(H)
を調製した。値はいずれも実測値である。 Example 325 Preparation of Liquid Crystal Composition-1
Host liquid crystal (H) showing the following physical properties
Was prepared. All the values are actually measured values.
Tn-i(ネマチック相-等方性液体相転移温度):73.8℃
Δε(25℃における誘電率異方性) :-2.79
Δn(25℃における屈折率異方性) :0.101
γ1 (25℃における回転粘性係数):118
この母体液晶(H)90%と、実施例1で得られた化合物(1-8-203)10%からなる液晶組成物(M-A)を調製した。この組成物(M-A)のTn-i、Δε、Δn及びγ1の値を測定し母体液晶からの変化量をもとに、実施例1で得られた化合物(1-8-203)の各物性値の外挿値を求めると、以下のとおりであった。 T n-i (nematic phase - isotropic liquid phase transition temperature): 73.8 ° C.
Δε (dielectric anisotropy at 25 ° C.): −2.79
Δn (refractive index anisotropy at 25 ° C.): 0.101
γ 1 (rotational viscosity coefficient at 25 ° C.): 118
A liquid crystal composition (MA) comprising 90% of the base liquid crystal (H) and 10% of the compound (1-8-203) obtained in Example 1 was prepared. T n-i, [Delta] [epsilon], based on the amount of change from the Δn and gamma 1 value measured maternal liquid crystal compound obtained in Example 1 of the composition (M-A) (1-8-203 The extrapolated value of each physical property value of) was as follows.
Δε(25℃における誘電率異方性) :-2.79
Δn(25℃における屈折率異方性) :0.101
γ1 (25℃における回転粘性係数):118
この母体液晶(H)90%と、実施例1で得られた化合物(1-8-203)10%からなる液晶組成物(M-A)を調製した。この組成物(M-A)のTn-i、Δε、Δn及びγ1の値を測定し母体液晶からの変化量をもとに、実施例1で得られた化合物(1-8-203)の各物性値の外挿値を求めると、以下のとおりであった。 T n-i (nematic phase - isotropic liquid phase transition temperature): 73.8 ° C.
Δε (dielectric anisotropy at 25 ° C.): −2.79
Δn (refractive index anisotropy at 25 ° C.): 0.101
γ 1 (rotational viscosity coefficient at 25 ° C.): 118
A liquid crystal composition (MA) comprising 90% of the base liquid crystal (H) and 10% of the compound (1-8-203) obtained in Example 1 was prepared. T n-i, [Delta] [epsilon], based on the amount of change from the Δn and gamma 1 value measured maternal liquid crystal compound obtained in Example 1 of the composition (M-A) (1-8-203 The extrapolated value of each physical property value of) was as follows.
外挿Tn-i:70.8℃
外挿Δε:-14.6
外挿Δn:0.246
外挿γ1:362mPa・s
また、調製した液晶組成物(M-A)は、室温にて一ヶ月間以上均一なネマチック液晶状態を維持した。 Extrapolation T n-i: 70.8 ℃
Extrapolation Δε: -14.6
Extrapolation Δn: 0.246
Extrapolation γ 1 : 362 mPa · s
Further, the prepared liquid crystal composition (MA) maintained a uniform nematic liquid crystal state for one month or more at room temperature.
外挿Δε:-14.6
外挿Δn:0.246
外挿γ1:362mPa・s
また、調製した液晶組成物(M-A)は、室温にて一ヶ月間以上均一なネマチック液晶状態を維持した。 Extrapolation T n-i: 70.8 ℃
Extrapolation Δε: -14.6
Extrapolation Δn: 0.246
Extrapolation γ 1 : 362 mPa · s
Further, the prepared liquid crystal composition (MA) maintained a uniform nematic liquid crystal state for one month or more at room temperature.
さらに、液晶組成物(M-A)を用いて作製した液晶表示装置は、優れた表示特性を示し、長期にわたり安定な表示特性を保ち、高い信頼性を示した。
Furthermore, the liquid crystal display device manufactured using the liquid crystal composition (MA) showed excellent display characteristics, maintained stable display characteristics for a long time, and showed high reliability.
(実施例326)液晶組成物の調製―2
母体液晶(H)90%と、実施例2で得られた化合物(1-8-203)10%からなる液晶組成物(M-B)を調製した。この組成物(M-B)より、実施例2で得られた化合物(1-8-203)の外挿Tn-i、外挿Δε、外挿Δn、外挿γ1の値は以下のとおりである。 (Example 326) Preparation of liquid crystal composition-2
A liquid crystal composition (MB) comprising 90% of the base liquid crystal (H) and 10% of the compound (1-8-203) obtained in Example 2 was prepared. From this composition (M-B), the extrapolated T n-i of the compound obtained in Example 2 (1-8-203), extrapolated [Delta] [epsilon], extrapolation [Delta] n, the extrapolation gamma 1 values below It is as follows.
母体液晶(H)90%と、実施例2で得られた化合物(1-8-203)10%からなる液晶組成物(M-B)を調製した。この組成物(M-B)より、実施例2で得られた化合物(1-8-203)の外挿Tn-i、外挿Δε、外挿Δn、外挿γ1の値は以下のとおりである。 (Example 326) Preparation of liquid crystal composition-2
A liquid crystal composition (MB) comprising 90% of the base liquid crystal (H) and 10% of the compound (1-8-203) obtained in Example 2 was prepared. From this composition (M-B), the extrapolated T n-i of the compound obtained in Example 2 (1-8-203), extrapolated [Delta] [epsilon], extrapolation [Delta] n, the extrapolation gamma 1 values below It is as follows.
外挿Tn-i:38.9℃
外挿Δε:-17.9
外挿Δn:0.198
外挿γ1:372mPa・s
また、調製した液晶組成物(M-B)は、室温にて一ヶ月間以上均一なネマチック液晶状態を維持した。 Extrapolation T n-i: 38.9 ℃
Extrapolation Δε: −17.9
Extrapolation Δn: 0.198
Extrapolation γ 1 : 372 mPa · s
Further, the prepared liquid crystal composition (MB) maintained a uniform nematic liquid crystal state for one month or more at room temperature.
外挿Δε:-17.9
外挿Δn:0.198
外挿γ1:372mPa・s
また、調製した液晶組成物(M-B)は、室温にて一ヶ月間以上均一なネマチック液晶状態を維持した。 Extrapolation T n-i: 38.9 ℃
Extrapolation Δε: −17.9
Extrapolation Δn: 0.198
Extrapolation γ 1 : 372 mPa · s
Further, the prepared liquid crystal composition (MB) maintained a uniform nematic liquid crystal state for one month or more at room temperature.
さらに、液晶組成物(M-B)を用いて作製した液晶表示装置は、優れた表示特性を示し、長期にわたり安定な表示特性を保ち、高い信頼性を示した。
Furthermore, the liquid crystal display device manufactured using the liquid crystal composition (MB) exhibited excellent display characteristics, maintained stable display characteristics over a long period of time, and exhibited high reliability.
(比較例1)液晶組成物の調製―3
母体液晶(H)85%と、以下に示す化合物(A)15%からなる液晶組成物(M-C)を調製した。 Comparative Example 1 Preparation of Liquid Crystal Composition-3
A liquid crystal composition (MC) comprising 85% of the base liquid crystal (H) and 15% of the following compound (A) was prepared.
母体液晶(H)85%と、以下に示す化合物(A)15%からなる液晶組成物(M-C)を調製した。 Comparative Example 1 Preparation of Liquid Crystal Composition-3
A liquid crystal composition (MC) comprising 85% of the base liquid crystal (H) and 15% of the following compound (A) was prepared.
この組成物(M-C)より、上記化合物(A)の外挿Tn-i、外挿Δε、外挿Δn、外挿γ1の値は以下のとおりである。
From this composition (M-C), extrapolated T n-i, extrapolated [Delta] [epsilon], extrapolation [Delta] n, the extrapolation gamma 1 value of the compound (A) is as follows.
外挿Tn-i:18.3℃
外挿Δε:-15.7
外挿Δn:0.184
外挿γ1:241mPa・s
上記結果を実施例325と比較するとΔεは同程度でありながら、Tn-i及びΔnが小さいことがわかり、実施例326と比較するとTn-i、Δn及びΔεが小さいことが分かる。 Extrapolation T n-i: 18.3 ℃
Extrapolation Δε: −15.7
Extrapolation Δn: 0.184
Extrapolation γ 1 : 241 mPa · s
While Δε is comparable when comparing the results of Example 325, it found to be T n-i and Δn is small, when compared T n-i, that Δn and Δε is less apparent as in Example 326.
外挿Δε:-15.7
外挿Δn:0.184
外挿γ1:241mPa・s
上記結果を実施例325と比較するとΔεは同程度でありながら、Tn-i及びΔnが小さいことがわかり、実施例326と比較するとTn-i、Δn及びΔεが小さいことが分かる。 Extrapolation T n-i: 18.3 ℃
Extrapolation Δε: −15.7
Extrapolation Δn: 0.184
Extrapolation γ 1 : 241 mPa · s
While Δε is comparable when comparing the results of Example 325, it found to be T n-i and Δn is small, when compared T n-i, that Δn and Δε is less apparent as in Example 326.
(比較例2)液晶組成物の調製―4
母体液晶(H)85%と、以下に示す化合物(B)15%からなる液晶組成物(M-D)を調製した。 Comparative Example 2 Preparation of Liquid Crystal Composition-4
A liquid crystal composition (MD) comprising 85% of the base liquid crystal (H) and 15% of the following compound (B) was prepared.
母体液晶(H)85%と、以下に示す化合物(B)15%からなる液晶組成物(M-D)を調製した。 Comparative Example 2 Preparation of Liquid Crystal Composition-4
A liquid crystal composition (MD) comprising 85% of the base liquid crystal (H) and 15% of the following compound (B) was prepared.
この組成物(M-D)より、上記化合物(B)の外挿Tn-i、外挿Δε、外挿Δn、外挿γ1の値は以下のとおりである。
From this composition (M-D), the extrapolated T n-i, extrapolated [Delta] [epsilon], extrapolation [Delta] n, the extrapolation gamma 1 value of the compound (B) is as follows.
外挿Tn-i:3.2℃
外挿Δε:-9.7
外挿Δn:0.073
外挿γ1:94mPa・s
上記結果を実施例325および実施例326と比較すると|Δε|が大幅に小さくなり、Tn-iも大幅に低いことが分かる。 Extrapolation T n−i : 3.2 ° C.
Extrapolation Δε: -9.7
Extrapolation Δn: 0.073
Extrapolation γ 1 : 94 mPa · s
Comparing the above results with Example 325 and Example 326, it can be seen that | Δε | is significantly smaller and T n−i is also significantly lower.
外挿Δε:-9.7
外挿Δn:0.073
外挿γ1:94mPa・s
上記結果を実施例325および実施例326と比較すると|Δε|が大幅に小さくなり、Tn-iも大幅に低いことが分かる。 Extrapolation T n−i : 3.2 ° C.
Extrapolation Δε: -9.7
Extrapolation Δn: 0.073
Extrapolation γ 1 : 94 mPa · s
Comparing the above results with Example 325 and Example 326, it can be seen that | Δε | is significantly smaller and T n−i is also significantly lower.
Claims (21)
- 一般式(i)
Yi1及びYi2はそれぞれ独立して-O-、-S-、-SO-、-SOO-、-CF2-、-CO-、-CXi3Xi4-を表し、ただし、Yi1及びYi2のいずれか一つ以上は-O-、-S-、-SO-、-SOO-を表し、
Xi3、Xi4はそれぞれ独立してXi1と同じ意味を表し、
Wi1は
Wi2は単結合又は-CLi9Li10-を表し、
Li1、Li2、Li3、Li4、Li5、Li6、Li7、Li8、Li9及びLi10はそれぞれ独立して水素原子、臭素原子、よう素原子、水酸基、炭素原子数1から15のアルキル基、炭素原子数2から15のアルケニル基又は
Ai1は
(a)1,4-シクロへキシレン基(この基中に存在する1個の-CH2-又は隣接していない2個以上の-CH2-は-O-又は-S-に置き換えられても良い。)
(b)1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良く、この基中に存在する1つの水素原子はフッ素原子に置換されても良い。)
(c)1,4-シクロヘキセニレン基、ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基(これらの基中に存在する水素原子はフッ素原子に置換されても良く、また、ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
からなる群より選ばれる基を表し、
Zi1は、-CH2O-、-OCH2-、-CF2O-、-OCF2-、-COO-、-OCO-、-CH2CH2-、-CF2CF2-、-CH=CH-、-CF=CF-、-C≡C-又は単結合を表し、
ni1は1又は2を表すが、ni1が2を表しAi1及びZi1が複数存在する場合、それらは同一であっても異なっていてもよい。)
で表される基を表し、Li1、Li2、Li3、Li4、Li5、Li6、Li7、Li8、Li9及びLi10中に存在する1個の-CH2-又は隣接していない2個以上の-CH2-は-C≡C-、-O-、-S-、-COO-、-OCO-又は-CO-により置き換えられても良く、また、アルキル基又はアルケニル基中に存在する水素原子はフッ素原子に置換されても良い。)
で表される基を表す。)
で表される化合物。 Formula (i)
Y i1 and Y i2 each independently represent —O—, —S—, —SO—, —SOO—, —CF 2 —, —CO—, —CX i3 X i4 —, wherein Y i1 and Y any one or more of i2 represents —O—, —S—, —SO—, —SOO—;
X i3 and X i4 each independently represent the same meaning as X i1 ,
W i1
W i2 represents a single bond or —CL i9 L i10 —,
L i1 , L i2 , L i3 , L i4 , L i5 , L i6 , L i7 , L i8 , L i9 and L i10 are each independently a hydrogen atom, bromine atom, iodine atom, hydroxyl group, carbon number 1 To 15 alkyl groups, alkenyl groups of 2 to 15 carbon atoms, or
A i1 represents (a) a 1,4-cyclohexylene group (one —CH 2 — present in this group or two or more non-adjacent —CH 2 — represents —O— or —S—). May be replaced.)
(B) 1,4-phenylene group (one —CH═ present in this group or two or more non-adjacent —CH═ may be replaced by —N═, present in this group) One hydrogen atom may be substituted with a fluorine atom.)
(C) 1,4-cyclohexenylene group, naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, decahydronaphthalene-2,6-diyl group ( A hydrogen atom present in these groups may be substituted with a fluorine atom, or present in a naphthalene-2,6-diyl group or a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group. One -CH = or two or more non-adjacent -CH = may be replaced by -N =.)
Represents a group selected from the group consisting of
Z i1 represents —CH 2 O—, —OCH 2 —, —CF 2 O—, —OCF 2 —, —COO—, —OCO—, —CH 2 CH 2 —, —CF 2 CF 2 —, —CH ═CH—, —CF═CF—, —C≡C— or a single bond,
n i1 represents 1 or 2, but when n i1 represents 2 and a plurality of A i1 and Z i1 exist, they may be the same or different. )
One —CH 2 — or adjacent group present in L i1 , L i2 , L i3 , L i4 , L i5 , L i6 , L i7 , L i8 , L i9 and L i10 Two or more —CH 2 — that are not present may be replaced by —C≡C—, —O—, —S—, —COO—, —OCO— or —CO—, and may be an alkyl group or alkenyl. A hydrogen atom present in the group may be substituted with a fluorine atom. )
Represents a group represented by )
A compound represented by - 一般式(i)において、Li1、Li2、Li3、Li4、Li5、Li6、Li7、Li8、Li9及びLi10の少なくとも1つ以上が
- 一般式(i)において、Li1、Li2、Li3、Li4、Li5、Li6、Li7、Li8、Li9及びLi10の少なくとも1つ以上が
- 一般式(i)において、Yi1及びYi2が互いに-O-を表す請求項1~3に記載の化合物。 The compound according to claims 1 to 3, wherein in the general formula (i), Y i1 and Y i2 each represent -O-.
- 一般式(i)において、Xi1及びXi2が互いにフッ素原子を表す請求項1~4に記載の化合物。 The compound according to claims 1 to 4, wherein, in the general formula (i), X i1 and X i2 each represent a fluorine atom.
- 一般式(i)において、Li1、Li2、Li3及びLi8はそれぞれ独立して水素原子、臭素原子、よう素原子、水酸基、炭素原子数1から15のアルキル基、炭素原子数1から15のアルコキシ基、炭素原子数2から15のアルケニル基又は炭素原子数2から15のアルケニルオキシ基を表し、Li4、Li5、Li6、Li7、Li9及びLi10はそれぞれ独立して水素原子を表す請求項1~5に記載の化合物。 In the general formula (i), L i1 , L i2 , L i3 and L i8 are each independently a hydrogen atom, a bromine atom, an iodine atom, a hydroxyl group, an alkyl group having 1 to 15 carbon atoms, or from 1 carbon atom. 15 represents an alkoxy group, an alkenyl group having 2 to 15 carbon atoms, or an alkenyloxy group having 2 to 15 carbon atoms, and L i4 , L i5 , L i6 , L i7 , L i9 and L i10 are each independently The compound according to claims 1 to 5, which represents a hydrogen atom.
- 一般式(i)において、Wi1が-CH2CH2-又は-CH=CH-を表す請求項1~6に記載の化合物。 The compound according to any one of claims 1 to 6, wherein in the general formula (i), W i1 represents -CH 2 CH 2 -or -CH = CH-.
- 一般式(i)において、Wi2が単結合を表す請求項1~7に記載の化合物。 The compound according to any one of claims 1 to 7, wherein in formula (i), W i2 represents a single bond.
- 請求項1~8に記載の化合物を一種又は二種以上含有する組成物。 A composition comprising one or more of the compounds according to claims 1 to 8.
- 請求項9記載の組成物を使用した液晶表示素子。 A liquid crystal display device using the composition according to claim 9.
- 一般式(i-r3)
で表される化合物中の-Yi1-Hを塩基により脱プロトン化しアニオンを生成することで分子内反応させることによる、一般式(i)で表される化合物の製造方法。 Formula (i-r3)
A method for producing a compound represented by the general formula (i), wherein —Y i1 —H in the compound represented by formula (1) is deprotonated with a base to generate an anion to cause an intramolecular reaction. - 一般式(i-r1)
Ri3及びRi4はそれぞれ独立に水素原子、メチル基、エチル基、もしくはプロピル基を表すか、またはRi3及びRi4は互いに結合して環状の構造となり-CH2-CH2-、-CH2-CH2-CH2-、又は-CH2-C(CH3)2-CH2-を表す。)
で表される化合物と、一般式(i-r2)
Xi3は塩素原子、臭素原子、ヨウ素原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基を表す。)
で表される化合物を遷移金属触媒及び塩基存在下反応させることにより、一般式(i-r3)で表される化合物を得る、請求項11に記載の製造方法。 Formula (i-r1)
R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH It represents 2- CH 2 —CH 2 — or —CH 2 —C (CH 3 ) 2 —CH 2 —. )
And a compound of the general formula (ir-2)
X i3 represents a chlorine atom, a bromine atom, an iodine atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, or a trifluoromethanesulfonyloxy group. )
The production method according to claim 11, wherein the compound represented by general formula (i-r3) is obtained by reacting the compound represented by general formula (i-r3) in the presence of a transition metal catalyst and a base. - 一般式(i-r3)
で表される化合物。 Formula (i-r3)
A compound represented by - 一般式(i-r1)
Ri3及びRi4はそれぞれ独立に水素原子、メチル基、エチル基、もしくはプロピル基を表すか、またはRi3及びRi4は互いに結合して環状の構造となり-CH2-CH2-、-CH2-CH2-CH2-、又は-CH2-C(CH3)2-CH2-を表し、
破線は結合が存在しなくても良く、存在しても良いことを表す。)
で表される化合物。 Formula (i-r1)
R i3 and R i4 each independently represent a hydrogen atom, a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 are bonded to each other to form a cyclic structure —CH 2 —CH 2 —, —CH 2 -CH 2 -CH 2- or -CH 2 -C (CH 3 ) 2 -CH 2-
A broken line indicates that a bond may not exist or may exist. )
A compound represented by - 一般式(i)においてWi1が
で表される化合物の二重結合に付加反応させることによる、一般式(i)においてWi1が
で表される化合物の製造方法。 In formula (i), W i1 is
In the general formula (i), W i1 is an addition reaction to the double bond of the compound represented by
The manufacturing method of the compound represented by these. - 一般式(i-r7)
Li11はLi1と同じ意味を表す。)
で表される化合物中の-Yi2-Li11を水存在下酸による脱保護反応と分子内反応を同時に進行させることによる、一般式(i)においてWi1が
で表される化合物の製造方法。 Formula (ir-7)
L i11 represents the same meaning as L i1 . )
In formula (i), W i1 is represented by the general formula (i) in which —Y i2 -L i11 in the compound represented by
The manufacturing method of the compound represented by these. - 一般式(i-r5)
Li11はLi1と同じ意味を表し、
Xi3は臭素原子又はよう素原子を表す。)
で表される化合物と一般式(i-r6)
で表される化合物を遷移金属触媒、銅触媒及び塩基存在下反応させることによる、一般式(i-r7)
Li11はLi1と同じ意味を表す。)
で表される化合物の製造方法。 Formula (i-r5)
L i11 represents the same meaning as L i1 ,
X i3 represents a bromine atom or an iodine atom. )
And a compound represented by the general formula (ir-6)
By reacting a compound represented by general formula (ir-7) in the presence of a transition metal catalyst, a copper catalyst and a base.
L i11 represents the same meaning as L i1 . )
The manufacturing method of the compound represented by these. - 一般式(i-r4)
Li11はLi1と同じ意味を表す。)
で表される化合物を有機金属試薬により脱プロトン化した後、臭素又はよう素と反応させることによる、一般式(i-r5)
Li11はLi1と同じ意味を表し、
Xi3は臭素原子又はよう素原子を表す。)
で表される化合物の製造方法。 General formula (i-r4)
L i11 represents the same meaning as L i1 . )
The compound represented by general formula (ir5) is obtained by deprotonation with an organometallic reagent and then reacting with bromine or iodine.
L i11 represents the same meaning as L i1 ,
X i3 represents a bromine atom or an iodine atom. )
The manufacturing method of the compound represented by these. - 一般式(i-r7)
Li11はLi1と同じ意味を表す。)
で表される化合物。 Formula (ir-7)
L i11 represents the same meaning as L i1 . )
A compound represented by - 一般式(i-r5)
Li11はLi1と同じ意味を表し、
Xi3は臭素原子又はよう素原子を表す。)
で表される化合物。 Formula (i-r5)
L i11 represents the same meaning as L i1 ,
X i3 represents a bromine atom or an iodine atom. )
A compound represented by - 一般式(i-r4)
Li11はLi1と同じ意味を表す。)
で表される化合物。 General formula (i-r4)
L i11 represents the same meaning as L i1 . )
A compound represented by
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