WO2017090384A1 - Liquid crystal compound, liquid crystal composition, and display element - Google Patents

Liquid crystal compound, liquid crystal composition, and display element Download PDF

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WO2017090384A1
WO2017090384A1 PCT/JP2016/082404 JP2016082404W WO2017090384A1 WO 2017090384 A1 WO2017090384 A1 WO 2017090384A1 JP 2016082404 W JP2016082404 W JP 2016082404W WO 2017090384 A1 WO2017090384 A1 WO 2017090384A1
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group
formula
compound represented
general formula
preferable
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PCT/JP2016/082404
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French (fr)
Japanese (ja)
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清香 野瀬
須藤 豪
翔太 小坂
楠本 哲生
宗矩 櫻井
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Dic株式会社
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Priority to JP2017527390A priority Critical patent/JPWO2017090384A1/en
Publication of WO2017090384A1 publication Critical patent/WO2017090384A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00Ethers; Compounds having groups, groups or groups
    • C07C43/02Ethers
    • C07C43/20Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/225Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing halogen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/10Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
    • C09K19/12Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings at least two benzene rings directly linked, e.g. biphenyls
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/10Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
    • C09K19/14Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/30Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Definitions

  • the present invention relates to a liquid crystal compound.
  • Liquid crystal display elements are used in various measuring instruments, automobile panels, word processors, electronic notebooks, printers, computers, televisions, watches, advertisement display boards, etc., including clocks and calculators.
  • Typical liquid crystal display methods include TN (twisted nematic) type, STN (super twisted nematic) type, VA (vertical alignment) type using TFT (thin film transistor), and IPS (in-plane Switching) type or FFS (fringe field switching) type.
  • the main characteristics required for the liquid crystal composition are (1) being stable against external stimuli such as moisture, air, heat, light, etc. There are four examples: (3) low viscosity, and (4) low driving voltage.
  • dielectric anisotropy ( ⁇ ) and refractive index anisotropy ( ⁇ n) In general, the liquid crystal composition is composed of several to several tens of kinds of compounds in order to obtain an optimal value.
  • a positive value composition and a negative value composition are used separately.
  • examples of a display method using a liquid crystal material in which ⁇ has a negative value include ECB type, VA type, and further FFS type.
  • the VA display system is used for applications such as televisions, and is required to have a high speed and a wide viewing angle.
  • the liquid crystal composition is required to have low voltage driving, high-speed response, and a wide operating temperature range. That is, ⁇ is negative, the absolute value is large, the viscosity ( ⁇ ) is low, and a high nematic phase-isotropic liquid phase transition temperature (T ni ) is required.
  • ⁇ n of the liquid crystal composition needs to be adjusted to an appropriate range according to d.
  • the cell gap tends to be designed to be small, and in this case, it is required to increase ⁇ n of the liquid crystal composition.
  • PSA Polymer Sustained Alignment
  • PSVA Polymer Stabilized Vertical Alignment
  • a PSA or PSVA type liquid crystal display element is a liquid crystal molecule in which a polymerizable compound-containing liquid crystal composition comprising a non-polymerizable liquid crystal composition and a polymerizable compound is arranged between substrates, and a voltage is applied between the substrates in some cases.
  • the polymerized compound is polymerized by irradiating ultraviolet rays or the like in the aligned state, and the alignment state of the liquid crystal is stored in the cured product.
  • IPS in-plane switching
  • mold liquid crystal display element it can produce by hardening in a no-application state. When applied to such a liquid crystal display element, a composition resistant to ultraviolet rays is required.
  • the problem to be solved by the present invention is to provide a liquid crystal compound having a large negative ⁇ , a high Tni, a small ⁇ , a large ⁇ n, and a compound that can be easily synthesized, together with a refractive index anisotropy ( ⁇ n).
  • Liquid crystal composition having a large negative value and a negative dielectric anisotropy ( ⁇ ) having a large absolute value, compatible with a narrow gap LCD, and capable of driving at a low voltage, and a liquid crystal such as a VA type, a PSA type, and a PSVA type It is to provide a display element.
  • the present invention relates to the general formula (i)
  • R i1 represents an alkenyl group having 3 to 15 carbon atoms, and one —CH 2 — present in the alkenyl group or two or more non-adjacent —CH 2 — represents —O— , —S—, —COO—, —OCO—, —CO—, —CH ⁇ CH—, —C ⁇ C— or a ring structure
  • R i2 represents an alkyl group having from 1 to 15 carbon atoms, one -CH 2 present in the alkyl group - or nonadjacent two or more -CH 2 - is -O -, - S- , —COO—, —OCO—, —CO—, —CH ⁇ CH—, —C ⁇ C— or a ring structure
  • n i1 represents 1, 2 or 3
  • X i1 and X i2 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a trifluoro
  • the liquid crystal compound according to the present invention has a low viscosity, a high isotropic transition temperature, a high compatibility, a high refractive index anisotropy, and is hardly deteriorated by heat or light.
  • a high-speed response liquid crystal display element can be provided.
  • R i1 is preferably an alkenyl group having 3 to 8 carbon atoms, and particularly preferably an alkenyl group having 3 to 5 carbon atoms, in order to reduce the viscosity. Moreover, it is preferable that it is linear.
  • R i2 is preferably an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms in order to reduce the viscosity, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms. Particularly preferred is an alkenyl group of ⁇ 5. Moreover, it is preferable that it is linear. In order to increase miscibility with other liquid crystal components, it is preferable that R i1 and R i2 are different, and it is preferable that the number of carbon atoms is different.
  • n i1 is preferably 1 or 2.
  • X i1 and X i2 are preferably both a hydrogen atom, a fluorine atom, or one is a hydrogen atom and the other is a fluorine atom.
  • the number of fluorine atoms in the molecule is preferably 0 to 2, preferably 2 as a compound with a negative ⁇ , and 0 or 1 as a neutral compound with a ⁇ of about ⁇ 1 to 1. It is preferable that
  • n i1 is 1 or 2
  • X i1 and X i2 are each independently preferably a fluorine atom, a chlorine atom, a trifluoromethyl group or a trifluoromethoxy group.
  • n i1 is 2
  • X i1 and X i2 are each independently a fluorine atom, a chlorine atom, a trifluoromethyl group, or a trifluoromethoxy group.
  • n i1 is 2 and that X i1 and X i2 are both fluorine atoms.
  • X i1 and X i2 are each independently a fluorine atom, a chlorine atom, a trifluoromethyl group, or a trifluoromethoxy group.
  • n i1 is preferably 2 or 3.
  • X i1 and X i2 are each independently a hydrogen atom or a fluorine atom.
  • n i1 is preferably 2 or 3.
  • the compound represented by general formula (i) is preferably a compound represented by general formula (i-1) to (i-2).
  • R i1 is preferably an alkenyl group having 3 to 8 carbon atoms, particularly preferably an alkenyl group having 3 to 5 carbon atoms, in order to reduce the viscosity. Moreover, it is preferable that it is linear.
  • R i2 is preferably an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms in order to reduce the viscosity, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms. Particularly preferred is an alkenyl group of ⁇ 5. Moreover, it is preferable that it is linear. In order to increase miscibility with other liquid crystal components, it is preferable that R i1 and R i2 are different, and it is preferable that the number of carbon atoms is different.
  • R i1, R i2, X i1, X i2 and n i1 are as defined R i1, R i2, X i1 , X i2 and n i1 in formula (i)
  • R i3 and R i4 independently represents a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 have a cyclic structure, —CH 2 CH 2 —, —CH 2 CH 2 CH 2 —, or —CH 2 C (CH 3 ) represents 2 CH 2 —)
  • the compound represented by the general formula (S-3) is obtained by reacting the compound represented by the general formula (S-1) with the compound represented by the general formula (S-2). Several reactions can be used depending on the choice of X i3 substituent in -1).
  • the hydroxyl group of the general formula (S-2) is A method of reacting with the general formula (S-1) as a phenolate with a base can be used.
  • the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals.
  • alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred.
  • Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
  • reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
  • chlorine solvents include dichloromethane, 1,2-dichloroethane, and carbon tetrachloride.
  • hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane
  • aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene
  • polar solvents include N, N-dimethylformamide
  • Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane.
  • ether solvents such as tetrahydrofuran and diethyl ether
  • polar solvents such as N, N-dimethylformamide are more preferable.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 30 ° C to 120 ° C.
  • the generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
  • Mitsunobu reaction When a compound in which Xi3 represents a hydroxyl group is used, Mitsunobu reaction can be used.
  • the Mitsunobu reaction is a reaction in which alcohol and a wide variety of nucleophiles having active protons are dehydrated, and uses a combination of triphenylphosphine and an azodicarboxylic acid derivative or maleic acid derivative.
  • the compound represented by the general formula (S-2) and the alcohol derivative represented by the general formula (S-1) are reacted in the presence of a trisubstituted phosphine derivative and an azodicarboxylic acid derivative.
  • a compound represented by (S-3) is obtained.
  • trisubstituted phosphine derivative examples include trialkylphosphine and triphenylphosphine, but triphenylphosphine is preferable.
  • Various compounds are used as azodicarboxylic acid derivatives, and it is possible to use maleic acid derivatives instead of azodicarboxylic acid derivatives, but the combination of triphenylphosphine and azodicarboxylic acid derivatives is easier to handle. Is desirable.
  • azodicarboxylic acid derivative examples include diethyl azodicarboxylate, diisopropyl azodicarboxylate, tetramethyl azodicarboxamide, tetrapropyl azodicarboxyamide, 1,1 '-(azodicarbonyl) dipiperidine. Diethyl azodicarboxylate and diisopropyl azodicarboxylate are preferred for ease of handling, and diisopropyl azodicarboxylate is more preferred for ease of handling.
  • reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed appropriately, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, and the like can be preferably used.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether.
  • chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride.
  • hydrocarbon solvent examples include pentane, hexane, cyclohexane, heptane and octane
  • aromatic solvent examples include benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • ether solvents such as tetrahydrofuran and aromatic solvents such as toluene are more preferable.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 0 ° C to 30 ° C.
  • a compound represented by the general formula (S-4) can be obtained by oxidizing the compound represented by the general formula (S-3). This oxidation can be carried out by deprotonation with an organometallic reagent, reaction with a trialkyl borate to form a boron compound, and subsequent action of an oxidizing agent.
  • Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
  • hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred.
  • organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide, lithium 2,2,4,4-tetramerpiperidide, etc. N-Butyllithium, sec-butyllithium and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide which can be efficiently deprotonated are more preferable.
  • a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent.
  • the reaction temperature at the time of deprotonation is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C.
  • trialkyl borate trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling.
  • combination of trialkyl borate and organometallic reagent any of the above-mentioned combinations can be used, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred.
  • the reaction temperature during boriding is preferably from -100 ° C to -20 ° C, more preferably from -78 ° C to -40 ° C.
  • the obtained boron compound may be isolated once or may be reacted with an oxidizing agent without isolation. Further, the obtained boron compound may be hydrolyzed and converted into a boric acid compound and then reacted with an oxidizing agent.
  • the oxidizing agent hydrogen peroxide water, peracetic acid or performic acid is preferably used.
  • the reaction temperature is preferably -78 ° C to 70 ° C, more preferably 0 ° C to 50 ° C.
  • water may be contained in the solvent at the time of reaction with an oxidizing agent.
  • the compound represented by the general formula (S-6) is obtained by reacting the compound represented by the general formula (S-4) with the compound represented by the general formula (S-5). Several reactions can be used depending on the choice of X i4 substituent in -5).
  • the hydroxyl group of the general formula (S-4) is A method of reacting with the general formula (S-5) as a phenolate with a base can be used.
  • the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals.
  • alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred.
  • Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
  • reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
  • chlorine solvents include dichloromethane, 1,2-dichloroethane, and carbon tetrachloride.
  • hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane
  • aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene
  • polar solvents include N, N-dimethylformamide
  • Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane.
  • ether solvents such as tetrahydrofuran and diethyl ether
  • polar solvents such as N, N-dimethylformamide are more preferable.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 30 ° C to 120 ° C.
  • the generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
  • Mitsunobu reaction When a compound in which Xi4 represents a hydroxyl group is used, Mitsunobu reaction can be used.
  • the Mitsunobu reaction is a reaction in which an alcohol and a wide variety of nucleophiles having active protons are dehydrated and used in combination with triphenylphosphine and an azodicarboxylic acid derivative or maleic acid derivative.
  • the compound represented by the general formula (S-4) and the alcohol derivative represented by the general formula (S-5) are reacted in the presence of a trisubstituted phosphine derivative and an azodicarboxylic acid derivative.
  • a compound represented by (S-6) is obtained.
  • trisubstituted phosphine derivative examples include trialkylphosphine and triphenylphosphine, but triphenylphosphine is preferable.
  • Various compounds are used as azodicarboxylic acid derivatives, and it is possible to use maleic acid derivatives instead of azodicarboxylic acid derivatives, but the combination of triphenylphosphine and azodicarboxylic acid derivatives is easier to handle. Is desirable.
  • azodicarboxylic acid derivatives include diethyl azodicarboxylate, diisopropyl azodicarboxylate, tetramethyl azodicarboxyamide, tetrapropyl azodicarboxyamide, 1,1 '-(azodicarbonyl) dipiperidine, Diethyl azodicarboxylate and diisopropyl azodicarboxylate are preferred for ease of handling, and diisopropyl azodicarboxylate is more preferred for ease of handling.
  • reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed appropriately, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, and the like can be preferably used.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether.
  • chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride.
  • hydrocarbon solvent examples include pentane, hexane, cyclohexane, heptane and octane
  • aromatic solvent examples include benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • ether solvents such as tetrahydrofuran and aromatic solvents such as toluene are more preferable.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 0 ° C to 30 ° C.
  • the deprotection of the compound represented by the general formula (S-6) is preferably performed under acidic conditions.
  • the acid used include protonic acids such as formic acid, acetic acid, trifluoroacetic acid, oxalic acid, and p-toluenesulfonic acid, and Lewis acids such as boron trifluoride.
  • Formic acid is preferably used.
  • reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, ketone solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like are preferably used. And may be reacted without solvent.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
  • chlorine solvents include dichloromethane, 1,2-dichloroethane, chloroform, and carbon tetrachloride.
  • benzene and acetonitrile, dimethyl sulfoxide and the like as polar solvents.
  • hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane and octane
  • aromatic solvents such as benzene, toluene and xylene are more preferable.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 100 ° C, more preferably 30 ° C to 60 ° C.
  • the compound represented by the formula (S-7) thus obtained may be obtained as a mixture of a cis isomer and a trans isomer relating to the cyclohexane ring, but must be a trans isomer for use as an intermediate of a liquid crystal compound. Is preferred.
  • cis-trans isomerization can be performed by allowing a base to act as necessary, and an excess of trans isomer can be obtained.
  • the base used at this time is preferably sodium hydroxide, potassium hydroxide or the like
  • the reaction solvent is preferably methanol, ethanol or tetrahydrofuran
  • the reaction temperature is preferably -40 ° C to 20 ° C, more preferably -20 ° C to 10 ° C. preferable.
  • a compound represented by the general formula (i) can be obtained by reacting an alkyl phosphorus ylide with the compound represented by the formula (S-7).
  • the phosphorus ylide can be adjusted from a phosphonium salt, a phosphonic acid ester or the like, but is preferably adjusted from an alkyltriphenylphosphonium salt.
  • a base is allowed to act.
  • potassium-t-butoxide, n-butyllithium, phenyllithium, sodium hydride and the like are preferable, and potassium-t -Butoxide is more preferred.
  • reaction solvent ether solvents, aromatic solvents, polar solvents and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
  • aromatic solvents include benzene, toluene, xylene, mesitylene, and the like as polar solvents.
  • a good example is N, N-dimethylformamide. Tetrahydrofuran and toluene are more preferred.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, but is preferably -40 ° C to 30 ° C, more preferably -20 ° C to 20 ° C.
  • the obtained ylide is preferably reacted with the compound represented by the formula (5) without isolation.
  • a base may be added to the mixture of the alkyltriphenylphosphonium salt and the compound represented by the formula (5).
  • the alkyltriphenylphosphonium salt methyltriphenylphosphonium salt is preferable.
  • a compound represented by general formula (S-1) is used as a starting material, and general formula (S-3), general formula (S-4), general formula (S-6) and general formula (S— 7)
  • the compound represented by the general formula (i) is produced via the compound represented by the formula (S), and the compound represented by the general formula (S-3) is used as a starting material.
  • -4 it is also preferable to produce the compound represented by the general formula (i) via the compound represented by the general formula (S-6) and (S-7).
  • the compound represented by general formula (i) is produced via the compound represented by general formula (S-6) and (S-7).
  • R i1, R i2, X i1, X i2 and n i1 are as defined R i1, R i2, X i1 , X i2 and n i1 in formula (i)
  • R i3 and R i4 independently represents a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 have a cyclic structure, —CH 2 CH 2 —, —CH 2 CH 2 CH 2 —, or —CH 2 C (CH 3 ) represents 2 CH 2 —)
  • the compound represented by the general formula (S-6) is obtained by reacting the compound represented by the general formula (S-1) with the compound represented by the general formula (S-8). Several reactions can be used depending on the choice of X i3 substituent in -1).
  • the hydroxyl group of the general formula (S-8) is A method of reacting with the general formula (S-1) as a phenolate with a base can be used.
  • the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals.
  • alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred.
  • Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
  • reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
  • chlorine solvents include dichloromethane, 1,2-dichloroethane, and carbon tetrachloride.
  • hydrocarbon solvents examples include pentane, hexane, cyclohexane, heptane, and octane
  • aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene
  • polar solvents include N, N-dimethylformamide
  • Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane.
  • ether solvents such as tetrahydrofuran and diethyl ether
  • polar solvents such as N, N-dimethylformamide are more preferable.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 30 ° C to 120 ° C.
  • the generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
  • Mitsunobu reaction When a compound in which Xi3 represents a hydroxyl group is used, Mitsunobu reaction can be used.
  • the Mitsunobu reaction is a reaction in which an alcohol and a wide variety of nucleophiles having active protons are dehydrated and used in combination with triphenylphosphine and an azodicarboxylic acid derivative or maleic acid derivative.
  • the compound represented by the general formula (S-8) and the alcohol derivative represented by the general formula (S-1) are reacted in the presence of a trisubstituted phosphine derivative and an azodicarboxylic acid derivative.
  • a compound represented by (S-6) is obtained.
  • trisubstituted phosphine derivative examples include trialkylphosphine and triphenylphosphine, but triphenylphosphine is preferable.
  • Various compounds are used as azodicarboxylic acid derivatives, and it is possible to use maleic acid derivatives instead of azodicarboxylic acid derivatives, but the combination of triphenylphosphine and azodicarboxylic acid derivatives is easier to handle. Is desirable.
  • azodicarboxylic acid derivative examples include diethyl azodicarboxylate, diisopropyl azodicarboxylate, tetramethyl azodicarboxamide, tetrapropyl azodicarboxyamide, 1,1 '-(azodicarbonyl) dipiperidine. Diethyl azodicarboxylate and diisopropyl azodicarboxylate are preferred for ease of handling, and diisopropyl azodicarboxylate is more preferred for ease of handling.
  • reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed appropriately, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, and the like can be preferably used.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether.
  • chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride.
  • hydrocarbon solvent examples include pentane, hexane, cyclohexane, heptane and octane
  • aromatic solvent examples include benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene.
  • ether solvents such as tetrahydrofuran and aromatic solvents such as toluene are more preferable.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the deprotection of the compound represented by the general formula (S-6) is preferably performed under acidic conditions.
  • the acid used include protonic acids such as formic acid, acetic acid, trifluoroacetic acid, oxalic acid, and p-toluenesulfonic acid, and Lewis acids such as boron trifluoride.
  • Formic acid is preferably used.
  • reaction solvent Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, ketone solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like are preferably used. And may be reacted without solvent.
  • ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
  • chlorine solvents include dichloromethane, 1,2-dichloroethane, chloroform, and carbon tetrachloride.
  • benzene and acetonitrile, dimethyl sulfoxide and the like as polar solvents.
  • hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane and octane
  • aromatic solvents such as benzene, toluene and xylene are more preferable.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 100 ° C, more preferably 30 ° C to 60 ° C.
  • the compound represented by the formula (S-7) thus obtained may be obtained as a mixture of a cis isomer and a trans isomer relating to the cyclohexane ring, but must be a trans isomer for use as an intermediate of a liquid crystal compound. Is preferred.
  • cis-trans isomerization can be performed by allowing a base to act as necessary, and an excess of trans isomer can be obtained.
  • the base used at this time is preferably sodium hydroxide, potassium hydroxide or the like
  • the reaction solvent is preferably methanol, ethanol or tetrahydrofuran
  • the reaction temperature is preferably -40 ° C to 20 ° C, more preferably -20 ° C to 10 ° C. preferable.
  • a compound represented by the general formula (i) can be obtained by reacting an alkyl phosphorus ylide with the compound represented by the formula (S-7).
  • the phosphorus ylide can be adjusted from a phosphonium salt, a phosphonic acid ester or the like, but is preferably adjusted from an alkyltriphenylphosphonium salt.
  • a base is allowed to act.
  • potassium-t-butoxide, n-butyllithium, phenyllithium, sodium hydride and the like are preferable, and potassium-t -Butoxide is more preferred.
  • reaction solvent ether solvents, aromatic solvents, polar solvents and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.
  • aromatic solvents include benzene, toluene, xylene, mesitylene, and the like as polar solvents.
  • a good example is N, N-dimethylformamide. Tetrahydrofuran and toluene are more preferred.
  • Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
  • the reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, but is preferably -40 ° C to 30 ° C, more preferably -20 ° C to 20 ° C.
  • the obtained ylide is preferably reacted with the compound represented by the formula (5) without isolation.
  • a base may be added to the mixture of the alkyltriphenylphosphonium salt and the compound represented by the formula (5).
  • the alkyltriphenylphosphonium salt methyltriphenylphosphonium salt is preferable.
  • the present invention provides a compound represented by general formula (i) via a compound represented by general formula (S-6) and (S-7) using a compound represented by general formula (S-1) as a starting material.
  • the compound represented by the general formula (i) is produced from the compound represented by the general formula (S-6) as a starting material via the compound represented by the general formula (S-7). It is also preferable to produce a compound represented by general formula (i) using a compound represented by general formula (S-7) as a starting material.
  • composition of the present invention preferably contains one or more compounds represented by the general formula (N-1) together with the compound represented by the general formula (i).
  • Represented by the general formula (N-1) is a dielectrically negative compound (the sign of ⁇ is negative and its absolute value is greater than 2).
  • the group (a), the group (b) and the group (c) may be each independently substituted with a cyano group, a fluorine atom or a chlorine atom
  • n N11 and n N12 each represent independently an integer of 0 ⁇ 3
  • n N11 + n N12 is 1, 2 or 3 if A N11 ⁇ A N12, Z N11 ⁇ Z N12 there is a plurality, They may be the same or different.
  • the compound represented by the general formula (N-1) is preferably a compound having a negative ⁇ and an absolute
  • R N11 and R N12 each independently represent an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or An alkenyloxy group having 2 to 8 carbon atoms is preferable, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkyl group having 2 to 5 carbon atoms.
  • alkenyloxy group is preferred, an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is more preferred, and an alkyl group having 2 to 5 carbon atoms or an alkenyl group having 2 to 3 carbon atoms is further preferred.
  • An alkenyl group having 3 carbon atoms (propenyl group) is particularly preferable.
  • the ring structure to which it is bonded is a phenyl group (aromatic)
  • An alkenyl group having 4 to 5 atoms is preferable
  • the ring structure to which the alkenyl group is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane
  • a straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred.
  • the total of carbon atoms and oxygen atoms, if present is preferably 5 or less, and is preferably linear.
  • the alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dots in each formula represent carbon atoms in the ring structure.)
  • a N11 and A N12 are preferably aromatic when it is required to independently increase ⁇ n, and are preferably aliphatic for improving the response speed, and trans-1,4 -Cyclohexylene group, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 2, 3-difluoro-1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, piperidine-1,4-diyl group, naphthalene-2,6- It preferably represents a diyl group, decahydronaphthalene-2,6-diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, and more preferably represents the following structure:
  • it represents a trans-1,4-cyclohexylene group or a 1,4-phenylene group.
  • Z N11 and Z N12 are each independently -CH 2 O -, - CF 2 O -, - CH 2 CH 2 -, - CF 2 CF 2 - or preferably a single bond, -CH 2 O-, —CH 2 CH 2 — or a single bond is more preferable, —CH 2 O— or a single bond is particularly preferable.
  • n N11 + n N12 is preferably 1 or 2, a combination in which n N11 is 1 and n N12 is 0, a combination in which n N11 is 2 and n N12 is 0, n N11 is 1 and n N12 is 1 A certain combination is preferred in which n N11 is 2 and n N12 is 1.
  • the lower limit of the preferable content of the compound represented by the formula (N-1) with respect to the total amount of the composition of the present invention is 1%, 10%, 20%, 30% , 40%, 50%, 55%, 60%, 65%, 70%, 75%, and 80%.
  • the upper limit of the preferred content is 95%, 85%, 75%, 65%, 55%, 45%, 35%, 25%, 20% It is.
  • R N11 and R N12 are as defined R N11 and R N12 in the general formula (N-1), n Na11 represents 0 or 1, n NB11 represents 0 or 1, n NC11 is Represents 0 or 1, and n Nd11 represents 0 or 1)
  • the lower limit value is preferably low and the upper limit value is preferably low.
  • the above lower limit value is preferably low and the upper limit value is preferably low.
  • the above lower limit value is increased and the upper limit value is high.
  • the compound represented by the general formula (N-1) is a compound selected from the group of compounds represented by the general formulas (N-1-1) to (N-1-21). preferable.
  • the compound represented by the general formula (N-1-1) is the following compound.
  • R N111 and R N112 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • R N111 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably a propyl group or a pentyl group.
  • RN112 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group or a butoxy group.
  • the compound represented by the general formula (N-1-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-1) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17%, 20%, 23%, 25%, 27%, 30%, 33%, 35%.
  • the upper limit of the preferable content is 50%, 40%, 38%, 35%, 33%, 30%, and 28% with respect to the total amount of the composition of the present invention. %, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8%, 7%, 6% %, 5%, 3%.
  • the compound represented by the general formula (N-1-1) is a compound selected from the group of compounds represented by the formula (N-1-1.1) to the formula (N-1-1.14).
  • it is a compound represented by the formulas (N-1-1.1) to (N-1-1.4), and the formula (N-1-1.1) and the formula (N
  • the compound represented by -1-1.3) is preferable.
  • the compounds represented by the formulas (N-1-1.1) to (N-1-1.4) can be used alone or in combination.
  • the lower limit of the preferred content of these compounds alone or with respect to the total amount is 5%, 10%, 13%, 15%, 17%, 20%, 23% 25% 27% 30% 33% 35%
  • the upper limit of the preferable content is 50%, 40%, 38%, 35%, 33%, 30%, and 28% with respect to the total amount of the composition of the present invention. %, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8%, 7%, 6% %, 5%, 3%.
  • the compound represented by the general formula (N-1-2) is the following compound.
  • R N121 and R N122 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • RN121 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group, a butyl group or a pentyl group.
  • RN122 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and includes a methyl group, a propyl group, a methoxy group, an ethoxy group, or a propoxy group. preferable.
  • the compound represented by the general formula (N-1-2) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-2) with respect to the total amount of the composition of the present invention is 5%, 7%, 10%, 13% 15%, 17%, 20%, 23%, 25%, 27%, 30%, 33%, 35%, 37% 40% and 42%.
  • the upper limit of the preferable content is 50%, 48%, 45%, 43%, 40%, 38%, and 35% with respect to the total amount of the composition of the present invention. %, 33%, 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% %, 8%, 7%, 6%, 5%.
  • the compound represented by the general formula (N-1-2) is a compound selected from the group of compounds represented by the formula (N-1-2.1) to the formula (N-1-2.13).
  • the compound represented by (N-1-2.13) is preferable, and when importance is placed on the improvement of ⁇ , the formula (N-1-2.3) to the formula (N-1-2.7) in the compounds represented, when emphasizing improvements in T NI formula (N-1-2.10), formula (N-1-2.11) and formula (N-1-2.13) It is preferable that it is a compound represented by these.
  • the compounds represented by the formula (N-1-2.1) to the formula (N-1-2.13) can be used alone or in combination.
  • the lower limit of the preferable content of these compounds alone or with respect to the total amount of is 5%, 10%, 13%, 15%, 17%, 20%, 23 %, 25%, 27%, 30%, 33%, and 35%.
  • the upper limit of the preferable content is 50%, 40%, 38%, 35%, 33%, 30%, and 28% with respect to the total amount of the composition of the present invention. %, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8%, 7%, 6% %, 5%, 3%.
  • the compound represented by the general formula (N-1-3) is the following compound.
  • R N131 and R N132 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • R N131 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N132 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-3) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-3) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-3) is a compound selected from the group of compounds represented by the formula (N-1-3.1) to the formula (N-1-3.11).
  • it is a compound represented by the formulas (N-1-3.1) to (N-1-3.7), and the formula (N-1-3.1) and the formula (N -1-3.2), formula (N-1-3.3), formula (N-1-3.4) and compounds represented by formula (N-1-3.6) are preferred.
  • the compounds represented by formula (N-1-3.1) to formula (N-1-3.4) and formula (N-1-3.6) may be used alone or in combination. Is possible, but the combination of formula (N-1-3.1) and formula (N-1-3.2), formula (N-1-3.3), formula (N-1-3.4) ) And a combination of two or three selected from formula (N-1-3.6) are preferred.
  • the lower limit of the preferred content of these compounds alone or with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15%, 17%, 20% %.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-4) is the following compound.
  • R N141 and R N142 each independently represents the same meaning as R N11 and R N12 in the general formula (N).
  • R N141 and R N142 are each independently an alkyl group having 1 to 5 carbon atoms, an alkenyl group or an alkoxy group having 1 to 4 carbon atoms carbon atoms 4-5 preferably a methyl group, a propyl group, an ethoxy Group or butoxy group is preferred.
  • the compound represented by the general formula (N-1-4) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-4) with respect to the total amount of the composition of the present invention is 3%, 5%, 7%, 10% 13%, 15%, 17%, 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, 13%, 11%, 10%, and 8%.
  • the compound represented by the general formula (N-1-4) is a compound selected from the group of compounds represented by the formula (N-1-4.1) to the formula (N-1-4.14).
  • it is a compound represented by the formulas (N-1-4.1) to (N-1-4.4), and the formula (N-1-4.1) and the formula (N
  • the compound represented by -1-4.2) is preferable.
  • the compounds represented by formulas (N-1-4.1) to (N-1-4.4) can be used singly or in combination, but the compounds of the present invention
  • the lower limit of the preferable content of these compounds alone or with respect to the total amount is 3%, 5%, 7%, 10%, 13%, 15%, 17% And 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, 13%, 11%, 10%, and 8%.
  • the compound represented by the general formula (N-1-5) is the following compound.
  • R N151 and R N152 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • R N151 and R N152 are each independently an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethyl group, a propyl group, or a butyl group. Is preferred.
  • the compound represented by the general formula (N-1-5) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-5) with respect to the total amount of the composition of the present invention is 5%, 8%, 10%, 13% 15%, 17%, 20%.
  • the upper limit of the preferable content is 35%, 33%, 30%, 28%, 25%, 23%, and 20% with respect to the total amount of the composition of the present invention. %, 18%, 15% and 13%.
  • the compound represented by the general formula (N-1-5) is a compound selected from the group of compounds represented by the formula (N-1-5.1) to the formula (N-1-5.6). It is preferable that a compound represented by the formula (N-1-3.2 and the formula (N-1-3.4) is preferable.
  • the compounds represented by formula (N-1-3.2) and formula (N-1-3.4) can be used alone or in combination.
  • the lower limit of the preferable content of these compounds alone or with respect to the total amount is 5%, 8%, 10%, 13%, 15%, 17%, 20%
  • the upper limit of the preferred content is 35%, 33%, 30%, 28%, 25%, and 23% with respect to the total amount of the composition of the present invention. Yes, 20%, 18%, 15%, 13%.
  • the compound represented by the general formula (N-1-10) is the following compound.
  • R N1101 and R N1102 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • R N1101 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N1102 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-10) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-10) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-10) is a compound selected from the group of compounds represented by the formula (N-1-10.1) to the formula (N-1-10.11).
  • it is a compound represented by the formulas (N-1-10.1) to (N-1-10.5), and the formula (N-1-10.1) and the formula (N
  • the compound represented by (1-10.2) is preferable.
  • the compounds represented by the formula (N-1-10.1) and the formula (N-1-10.2) can be used alone or in combination.
  • the lower limit of the preferable content of these compounds alone or with respect to the total amount is 5%, 10%, 13%, 15%, 17%, and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-11) is the following compound.
  • R N1111 and R N1112 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • R N1111 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N1112 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group or a butoxy group.
  • the compound represented by the general formula (N-1-11) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-11) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-11) is a compound selected from the group of compounds represented by the formula (N-1-11.1) to the formula (N-1-11.15).
  • it is a compound represented by the formulas (N-1-11.1) to (N-1-11.15), and is preferably a compound represented by the formula (N-1-11.2) or the formula (N-- The compound represented by 1-11.4) is preferable.
  • the compounds represented by the formula (N-1-11.2 and the formula (N-1-11.4) can be used alone or in combination.
  • the lower limit of the preferable content of these compounds alone or with respect to the total amount is 5%, 10%, 13%, 15%, 17%, and 20%.
  • the upper limit of the amount is 35%, 30%, 28%, 25%, 23%, 20%, 18% with respect to the total amount of the composition of the present invention. Yes, 15%, 13%.
  • the compound represented by the general formula (N-1-12) is the following compound.
  • R N1121 and R N1122 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • RN1121 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • RN1122 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-12) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-12) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-13) is the following compound.
  • R N1131 and R N1132 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • R N1131 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N1132 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-13) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-13) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-14) is the following compound.
  • R N1141 and R N1142 each independently represent the same meaning as R N11 and R N12 in formula (N).
  • R N1141 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N1142 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-14) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-14) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-15) is the following compound.
  • R N1151 and R N1152 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • RN1151 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N1152 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-15) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-15) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-16) is the following compound.
  • R N1161 and R N1162 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • R N1161 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N1162 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-16) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-16) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-17) is the following compound.
  • R N1171 and R N1172 each independently represent the same meaning as R N11 and R N12 in General Formula (N)).
  • RN1171 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N1172 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-17) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-17) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-18) is the following compound.
  • R N1181 and R N1182 each independently represent the same meaning as R N11 and R N12 in General Formula (N)).
  • RN1181 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • R N1182 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
  • the compound represented by the general formula (N-1-18) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-18) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-20) is the following compound.
  • R N1201 and R N1202 each independently represent the same meaning as R N11 and R N12 in formula (N)).
  • R N1201 and R N1202 are each independently preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • the compound represented by the general formula (N-1-20) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-20) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the compound represented by the general formula (N-1-21) is the following compound.
  • R N1211 and R N1212 each independently represent the same meaning as R N11 and R N12 in General Formula (N).
  • R N1211 and R N1212 are each independently preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
  • the compound represented by the general formula (N-1-21) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (N-1-21) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%.
  • the upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
  • the composition of this invention contains 1 type, or 2 or more types of compounds represented by general formula (L).
  • the compound represented by the general formula (L) corresponds to a dielectrically neutral compound ( ⁇ value is ⁇ 2 to 2).
  • R L1 and R L2 each independently represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently Optionally substituted by —CH ⁇ CH—, —C ⁇ C—, —O—, —CO—, —COO— or —OCO—, n L1 represents 0, 1, 2 or 3,
  • a L1 , A L2 and A L3 each independently represent (a) a 1,4-cyclohexylene group (one —CH 2 — present in the group or two or more —CH 2 — not adjacent to each other).
  • the group (a), the group (b) and the group (c) may be each independently substituted with a cyano group, a fluorine atom or a chlorine atom
  • the compound represented by general formula (L) may be used independently, it can also be used in combination.
  • the types of compounds that can be combined but they are used in appropriate combinations according to desired properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention.
  • the content of the compound represented by the general formula (L) is low-temperature solubility, transition temperature, electrical reliability, birefringence, process compatibility, dripping marks, image sticking, It is necessary to appropriately adjust according to required performance such as dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (L) with respect to the total amount of the composition of the present invention is 1%, 10%, 20%, 30%, 40 %, 50%, 55%, 60%, 65%, 70%, 75%, 80%.
  • the upper limit of the preferable content is 95%, 85%, 75%, 65%, 55%, 45%, 35%, and 25%.
  • the above lower limit value is preferably high and the upper limit value is preferably high. Furthermore, when the composition of the present invention maintains a high Tni and requires a composition having good temperature stability, the above lower limit value is preferably high and the upper limit value is preferably high. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the above lower limit value is lowered and the upper limit value is low.
  • R L1 and R L2 are preferably both alkyl groups, and when importance is placed on reducing the volatility of the compound, it is preferably an alkoxy group, and importance is placed on viscosity reduction. In this case, at least one is preferably an alkenyl group.
  • the number of halogen atoms present in the molecule is preferably 0, 1, 2 or 3, preferably 0 or 1, and 1 is preferred when importance is attached to compatibility with other liquid crystal molecules.
  • R L1 and R L2 are each a linear alkyl group having 1 to 5 carbon atoms or a linear alkyl group having 1 to 4 carbon atoms when the ring structure to which R L1 is bonded is a phenyl group (aromatic).
  • a phenyl group aromatic
  • Alkyl groups, linear alkoxy groups having 1 to 4 carbon atoms and linear alkenyl groups having 2 to 5 carbon atoms are preferred.
  • the total of carbon atoms and oxygen atoms, if present, is preferably 5 or less, and is preferably linear.
  • the alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dots in each formula represent carbon atoms in the ring structure.)
  • n L1 is preferably 0 when importance is attached to the response speed, 2 or 3 is preferred for improving the upper limit temperature of the nematic phase, and 1 is preferred for balancing these. In order to satisfy the properties required for the composition, it is preferable to combine compounds having different values.
  • a L1 , A L2, and A L3 are preferably aromatic when it is required to increase ⁇ n, and are preferably aliphatic for improving the response speed, and are each independently trans- 1,4-cyclohexylene group, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, piperidine-1,4-diyl group, naphthalene-2,6-diyl group, decahydronaphthalene-2,6 -It preferably represents a diyl group or a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, and more preferably represents the following structure:
  • it represents a trans-1,4-cyclohexylene group or a 1,4-phenylene group.
  • Z L1 and Z L2 are preferably single bonds when the response speed is important.
  • the number of halogen atoms in the molecule is preferably 0 or 1.
  • the compound represented by the general formula (L) is preferably a compound selected from the group of compounds represented by the general formulas (L-1) to (L-7).
  • the compound represented by the general formula (L-1) is the following compound.
  • R L11 and R L12 each independently represent the same meaning as R L1 and R L2 in the general formula (L).
  • R L11 and R L12 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
  • the compound represented by the general formula (L-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content is 1%, 2%, 3%, 5%, 7%, 10%, and 15% with respect to the total amount of the composition of the present invention. %, 20%, 25%, 30%, 35%, 40%, 45%, 50%, and 55%.
  • the upper limit of the preferable content is 95%, 90%, 85%, 80%, 75%, 70%, 65%, based on the total amount of the composition of the present invention. %, 60%, 55%, 50%, 45%, 40%, 35%, 30%, 25%.
  • the above lower limit value is preferably high and the upper limit value is preferably high. Furthermore, when the composition of the present invention requires a high Tni and a composition having good temperature stability, it is preferable that the lower limit value is moderate and the upper limit value is moderate. When it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the lower limit value is low and the upper limit value is low.
  • the compound represented by the general formula (L-1) is preferably a compound selected from the group of compounds represented by the general formula (L-1-1).
  • the compound represented by the general formula (L-1-1) is a compound selected from the group of compounds represented by the formula (L-1-1.1) to the formula (L-1-1.3). And is preferably a compound represented by formula (L-1-1.2) or formula (L-1-1.3), and particularly represented by formula (L-1-1.3). It is preferable that it is a compound.
  • the lower limit of the preferable content of the compound represented by the formula (L-1-1.3) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, and 10%.
  • the upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
  • the compound represented by the general formula (L-1) is preferably a compound selected from the group of compounds represented by the general formula (L-1-2).
  • R L12 represents the same meaning as in general formula (L-1).
  • the lower limit of the preferable content of the compound represented by the formula (L-1-2) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 15% 17%, 20%, 23%, 25%, 27%, 30%, 35%.
  • the upper limit of the preferable content is 60%, 55%, 50%, 45%, 42%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 33%, and 30%.
  • the compound represented by the general formula (L-1-2) is a compound selected from the group of compounds represented by the formula (L-1-2.1) to the formula (L-1-2.4).
  • it is a compound represented by the formula (L-1-2.2) to the formula (L-1-2.4).
  • the compound represented by the formula (L-1-2.2) is preferable because the response speed of the composition of the present invention is particularly improved.
  • it is preferable to use a compound represented by the formula (L-1-2.3) or the formula (L-1-2.4).
  • the content of the compounds represented by formula (L-1-2.3) and formula (L-1-2.4) is not preferably 30% or more in order to improve the solubility at low temperatures.
  • the lower limit of the preferable content of the compound represented by the formula (L-1-2.2) with respect to the total amount of the composition of the present invention is 10%, 15%, 18%, 20%, 23%, 25%, 27%, 30%, 33%, 35%, 38%, and 40%.
  • the upper limit of the preferable content is 60%, 55%, 50%, 45%, 43%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 32%, 30%, 27%, 25%, and 22%.
  • the lower limit of the preferable total content of the compound represented by the formula (L-1-1.3) and the compound represented by the formula (L-1-2.2) with respect to the total amount of the composition of the present invention The values are 10%, 15%, 20%, 25%, 27%, 30%, 35% and 40%.
  • the upper limit of the preferable content is 60%, 55%, 50%, 45%, 43%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 32%, 30%, 27%, 25%, and 22%.
  • the compound represented by the general formula (L-1) is preferably a compound selected from the group of compounds represented by the general formula (L-1-3).
  • R L13 and R L14 each independently represents an alkyl group having 1 to 8 carbon atoms or an alkoxy group having 1 to 8 carbon atoms.
  • R L13 and R L14 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
  • the lower limit of the preferable content of the compound represented by the formula (L-1-3) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%, 23%, 25%, 30%.
  • the upper limit of the preferable content is 60%, 55%, 50%, 45%, 40%, 37%, and 35% with respect to the total amount of the composition of the present invention. %, 33%, 30%, 27%, 25%, 23%, 23%, 20%, 17%, 15%, 13%, 10% %.
  • the compound represented by the general formula (L-1-3) is a compound selected from the group of compounds represented by the formula (L-1-3.1) to the formula (L-1-3.12).
  • the compound represented by the formula (L-1-3.1) is preferable because the response speed of the composition of the present invention is particularly improved. Further, when obtaining Tni higher than the response speed, the equation (L-1-3.3), the equation (L-1-3.4), the equation (L-1-3.11), and the equation (L ⁇ It is preferable to use a compound represented by 1-3.12). Sum of compounds represented by formula (L-1-3.3), formula (L-1-3.4), formula (L-1-3.11) and formula (L-1-3.12) The content of is not preferably 20% or more in order to improve the solubility at low temperatures.
  • the lower limit of the preferable content of the compound represented by the formula (L-1-3.1) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferable content is 20%, 17%, 15%, 13%, 10%, 8%, and 7% with respect to the total amount of the composition of the present invention. % And 6%.
  • the compound represented by the general formula (L-1) is preferably a compound selected from the group of compounds represented by the general formula (L-1-4) and / or (L-1-5).
  • R L15 and R L16 each independently represent an alkyl group having 1 to 8 carbon atoms or an alkoxy group having 1 to 8 carbon atoms.
  • R L15 and R L16 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
  • the lower limit of the preferable content of the compound represented by the formula (L-1-4) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%.
  • the upper limit of the preferable content is 25%, 23%, 20%, 17%, 15%, 13%, and 10% with respect to the total amount of the composition of the present invention. %.
  • the lower limit of the preferable content of the compound represented by the formula (L-1-5) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%.
  • the upper limit of the preferable content is 25%, 23%, 20%, 17%, 15%, 13%, and 10% with respect to the total amount of the composition of the present invention. %.
  • the compounds represented by the general formulas (L-1-4) and (L-1-5) are represented by the formulas (L-1-4.1) to (L-1-5.3).
  • a compound represented by the formula (L-1-4.2) or the formula (L-1-5.2) is preferable.
  • the lower limit of the preferable content of the compound represented by the formula (L-1-4.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferable content is 20%, 17%, 15%, 13%, 10%, 8%, and 7% with respect to the total amount of the composition of the present invention. % And 6%.
  • the compound represented by the general formula (L-2) is the following compound.
  • R L21 and R L22 each independently represent the same meaning as R L1 and R L2 in the general formula (L).
  • R L21 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms
  • R L22 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom.
  • An alkoxy group of 1 to 4 is preferable.
  • the compound represented by the general formula (L-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (L-2) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7% and 10%.
  • the upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
  • the compound represented by the general formula (L-2) is preferably a compound selected from the group of compounds represented by the formulas (L-2.1) to (L-2.6).
  • a compound represented by formula (L-2.1), formula (L-2.3), formula (L-2.4) and formula (L-2.6) is preferred.
  • the compound represented by the general formula (L-3) is the following compound.
  • R L31 and R L32 each independently represent the same meaning as R L1 and R L2 in General Formula (L).
  • R L31 and R L32 are each independently preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms.
  • the compound represented by the general formula (L-3) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (L-3) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7% and 10%.
  • the upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
  • the effect is high when the content is set to be large.
  • the effect is high when the content is set low.
  • the compound represented by the general formula (L-3) is preferably a compound selected from the group of compounds represented by the formulas (L-3.1) to (L-3.4).
  • a compound represented by the formula (L-3.7) from (L-3.2) is preferable.
  • the compound represented by the general formula (L-4) is the following compound.
  • R L41 and R L42 each independently represent the same meaning as R L1 and R L2 in General Formula (L).
  • R L41 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms
  • R L42 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom.
  • An alkoxy group of 1 to 4 is preferable.
  • the compound represented by the general formula (L-4) can be used alone, or two or more compounds can be used in combination.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the content of the compound represented by the general formula (L-4) is low-temperature solubility, transition temperature, electrical reliability, birefringence, process compatibility, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (L-4) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% .
  • the upper limit of the preferable content of the compound represented by the formula (L-4) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, and 30%. 20%, 15%, 10%, 5%.
  • the compound represented by general formula (L-4) is preferably a compound represented by formula (L-4.1) to formula (L-4.3), for example.
  • the formula (L-4.2) Even if it contains a compound represented by formula (L-4.1), it contains both a compound represented by formula (L-4.1) and a compound represented by formula (L-4.2). Or all of the compounds represented by formulas (L-4.1) to (L-4.3) may be included.
  • the lower limit of the preferable content of the compound represented by formula (L-4.1) or formula (L-4.2) with respect to the total amount of the composition of the present invention is 3%, Yes, 7%, 9%, 11%, 12%, 13%, 18%, 21%, and the preferred upper limit is 45, 40% , 35%, 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% .
  • the amount of both compounds relative to the total amount of the composition of the present invention is The lower limit of the preferred content is 15%, 19%, 24%, and 30%, and the preferred upper limit is 45, 40%, 35%, and 30%. Yes, 25%, 23%, 20%, 18%, 15%, 13%.
  • the compound represented by the general formula (L-4) is preferably, for example, a compound represented by the formula (L-4.4) to the formula (L-4.6). It is preferable that it is a compound represented by this.
  • the formula (L -4.5) contains both the compound represented by formula (L-4.4) and the compound represented by formula (L-4.5). May be.
  • the lower limit of the preferable content of the compound represented by the formula (L-4.4) or the formula (L-4.5) with respect to the total amount of the composition of the present invention is 3%, Yes, 7%, 9%, 11%, 12%, 13%, 18%, 21%.
  • Preferred upper limit values are 45, 40%, 35%, 30%, 25%, 23%, 20%, 18%, 15%, 13% %, 10%, and 8%.
  • the amount of both compounds relative to the total amount of the composition of the present invention is The lower limit of the preferred content is 15%, 19%, 24%, and 30%, and the preferred upper limit is 45, 40%, 35%, and 30%. Yes, 25%, 23%, 20%, 18%, 15%, 13%.
  • the compound represented by the general formula (L-4) is preferably a compound represented by the formula (L-4.7) to the formula (L-4.10), and particularly the formula (L-4.
  • the compound represented by 9) is preferred.
  • the compound represented by the general formula (L-5) is the following compound.
  • R L51 and R L52 each independently represent the same meaning as R L1 and R L2 in the general formula (L).
  • R L51 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms
  • R L52 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom.
  • An alkoxy group of 1 to 4 is preferable.
  • the compound represented by the general formula (L-5) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the content of the compound represented by the general formula (L-5) includes solubility at low temperature, transition temperature, electrical reliability, birefringence index, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (L-5) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% .
  • the upper limit of the preferable content of the compound represented by the formula (L-5) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, and 30%. , 20%, 15%, 10%, 5%
  • the compound represented by the general formula (L-5) is represented by the formula (L-5.1) or the formula (L-5.2).
  • the compound represented by formula (L-5.1) is particularly desirable.
  • the lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%.
  • the upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
  • the compound represented by the general formula (L-5) is preferably a compound represented by the formula (L-5.3) or the formula (L-5.4).
  • the lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%.
  • the upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
  • the compound represented by the general formula (L-5) is preferably a compound selected from the group of compounds represented by the formulas (L-5.5) to (L-5.7).
  • the compound represented by L-5.7) is preferred.
  • the lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%.
  • the upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
  • the compound represented by the general formula (L-6) is the following compound.
  • R L61 and R L62 each independently represent the same meaning as R L1 and R L2 in the general formula (L), and X L61 and X L62 each independently represent a hydrogen atom or a fluorine atom.
  • R L61 and R L62 are each independently preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and one of X L61 and X L62 is a fluorine atom and the other is a hydrogen atom. Is preferred.
  • the compound represented by the general formula (L-6) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (L-6) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% .
  • the upper limit of the preferable content of the compound represented by the formula (L-6) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, and 30%. 20%, 15%, 10%, 5%.
  • the compound represented by the general formula (L-6) is preferably a compound represented by the formula (L-6.1) to the formula (L-6.9).
  • the compound represented by the general formula (L-6) is preferably, for example, a compound represented by the formula (L-6.10) to the formula (L-6.17).
  • a compound represented by L-6.11) is preferable.
  • the lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%.
  • the upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
  • the compound represented by the general formula (L-7) is the following compound.
  • R L71 and R L72 each independently represent the same meaning as R L1 and R L2 in Formula (L), A L71 and A L72 is A L2 and in the general formula (L) independently A L3 represents the same meaning, but the hydrogen atoms on A L71 and A L72 may be each independently substituted with a fluorine atom, Z L71 represents the same meaning as Z L2 in formula (L), X L71 and X L72 each independently represent a fluorine atom or a hydrogen atom.
  • R L71 and R L72 are each independently preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and
  • a L71 and A L72 Are each independently preferably a 1,4-cyclohexylene group or a 1,4-phenylene group, the hydrogen atoms on A L71 and A L72 may be each independently substituted with a fluorine atom, and
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, and four kinds.
  • the content of the compound represented by the general formula (L-7) includes solubility at low temperature, transition temperature, electrical reliability, birefringence index, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (L-7) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%.
  • the upper limit of the preferable content of the compound represented by the formula (L-7) with respect to the total amount of the composition of the present invention is 30%, 25%, 23%, and 20%. 18%, 15%, 10%, 5%.
  • the content of the compound represented by formula (L-7) is preferably increased, and when an embodiment with low viscosity is desired, the content is It is preferable to reduce the amount.
  • the compound represented by the general formula (L-7) is preferably a compound represented by the formula (L-7.1) to the formula (L-7.4), and the formula (L-7. It is preferable that it is a compound represented by 2).
  • the compound represented by the general formula (L-7) is preferably a compound represented by the formula (L-7.11) to the formula (L-7.13). It is preferable that it is a compound represented by 11).
  • the compound represented by the general formula (L-7) is a compound represented by the formula (L-7.21) to the formula (L-7.23).
  • a compound represented by formula (L-7.21) is preferable.
  • the compound represented by the general formula (L-7) is preferably a compound represented by the formula (L-7.31) to the formula (L-7.34), and the formula (L-7. 31) or / and a compound represented by the formula (L-7.32).
  • the compound represented by the general formula (L-7) is preferably a compound represented by the formula (L-7.41) to the formula (L-7.44), and the formula (L-7. 41) or / and a compound represented by formula (L-7.42).
  • the lower limit of the preferable total content of the compounds represented by the general formulas (i), (L) and (N) with respect to the total amount of the composition of the present invention is 80% and 85%. Yes, 88%, 90%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99% Yes, 100%.
  • the upper limit of the preferable content is 100%, 99%, 98%, and 95%.
  • the lower limit of the preferable content is 80%, 85%, 88%, 90%, 92%, 93%, 94%, 95%, 96% 97%, 98%, 99%, 100%.
  • the upper limit of the preferable content is 100%, 99%, 98%, and 95%.
  • composition of the present invention preferably does not contain a compound having a structure in which oxygen atoms such as a peracid (—CO—OO—) structure are bonded in the molecule.
  • the content of the compound having a carbonyl group is preferably 5% or less, more preferably 3% or less with respect to the total mass of the composition. Preferably, it is more preferably 1% or less, and most preferably not substantially contained.
  • the content of the compound substituted with chlorine atoms is preferably 15% or less, preferably 10% or less, based on the total mass of the composition. % Or less, preferably 5% or less, more preferably 3% or less, and still more preferably substantially not contained.
  • the content of a compound in which all the ring structures in the molecule are 6-membered rings is 80% relative to the total mass of the composition. % Or more, more preferably 90% or more, still more preferably 95% or more, and the composition is composed only of a compound in which all of the ring structures in the molecule are all 6-membered rings. Most preferably.
  • the content of the compound having a cyclohexenylene group as a ring structure, and the content of the compound having a cyclohexenylene group as the total mass of the composition is preferably 10% or less, preferably 8% or less, more preferably 5% or less, preferably 3% or less, and still more preferably not contained.
  • the content of a compound having a 2-methylbenzene-1,4-diyl group in the molecule, in which a hydrogen atom may be substituted with a halogen may be reduced.
  • the content of the compound having a 2-methylbenzene-1,4-diyl group in the molecule is preferably 10% or less, more preferably 8% or less, based on the total mass of the composition. It is more preferably 5% or less, further preferably 3% or less, and still more preferably substantially not contained.
  • substantially not contained in the present application means that it is not contained except for an unintentionally contained product.
  • the alkenyl group when the compound contained in the composition of the first embodiment of the present invention has an alkenyl group as a side chain, when the alkenyl group is bonded to cyclohexane, the alkenyl group has 2 to 5 carbon atoms.
  • the alkenyl group is bonded to benzene, the number of carbon atoms of the alkenyl group is preferably 4 to 5, and the unsaturated bond of the alkenyl group and benzene are directly bonded. Preferably not.
  • the composition of the present invention may contain a polymerizable compound in order to produce a liquid crystal display element such as a PS mode, a transverse electric field type PSA mode, or a transverse electric field type PSVA mode.
  • a polymerizable compound such as a PS mode, a transverse electric field type PSA mode, or a transverse electric field type PSVA mode.
  • the polymerizable compound that can be used include a photopolymerizable monomer that undergoes polymerization by energy rays such as light.
  • the structure has, for example, a liquid crystal skeleton in which a plurality of six-membered rings such as biphenyl derivatives and terphenyl derivatives are connected. Examples thereof include a polymerizable compound. More specifically, the general formula (XX)
  • Z 201 represents —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —CF 2 O—, —OCF 2 —, —CH 2 CH 2 —, —CF 2 CF 2 —, —CH ⁇ CH—COO—, —CH ⁇ CH—OCO—, —COO—CH ⁇ CH—, —OCO—CH ⁇ CH—, —COO—CH 2 CH 2 —, —OCO—CH 2 CH 2 —, —CH 2 CH 2 —COO—, —CH 2 CH 2 —, —OCO—CH 2 CH 2 —, —CH 2 CH 2 —COO—, —CH 2 CH 2 —OCO—, —COO—CH 2 CH 2 —, —OCO—CH 2 CH 2 —, —CH 2 CH 2 —COO—, —CH 2 CH 2 —OCO—, —COO—CH 2 CH 2 —, —OCO—CH 2 CH
  • X 201 and X 202 are each preferably a diacrylate derivative that represents a hydrogen atom, or a dimethacrylate derivative that has a methyl group, and a compound in which one represents a hydrogen atom and the other represents a methyl group.
  • diacrylate derivatives are the fastest, dimethacrylate derivatives are slow, asymmetric compounds are in the middle, and a preferred embodiment can be used depending on the application.
  • a dimethacrylate derivative is particularly preferable.
  • Sp 201 and Sp 202 each independently represent a single bond, an alkylene group having 1 to 8 carbon atoms, or —O— (CH 2 ) s —, but at least one of them is a single bond in a PSA display element.
  • a compound in which both represent a single bond or one in which one represents a single bond and the other represents an alkylene group having 1 to 8 carbon atoms or —O— (CH 2 ) s — is preferable.
  • 1 to 4 alkyl groups are preferable, and s is preferably 1 to 4.
  • Z 201 represents —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —CF 2 O—, —OCF 2 —, —CH 2 CH 2 —, —CF 2 CF 2 — or a single bond
  • —COO—, —OCO— or a single bond is more preferred, and a single bond is particularly preferred.
  • M 201 represents a 1,4-phenylene group, a trans-1,4-cyclohexylene group or a single bond in which any hydrogen atom may be substituted by a fluorine atom, but the 1,4-phenylene group or the single bond is preferable.
  • C represents a ring structure other than a single bond
  • Z 201 is preferably a linking group other than a single bond.
  • M 201 is a single bond
  • Z 201 is preferably a single bond.
  • both ends shall be bonded to Sp 201 or Sp 202.
  • the polymerizable compounds containing these skeletons are optimal for PSA-type liquid crystal display elements because of the alignment regulating power after polymerization, and a good alignment state can be obtained, so that display unevenness is suppressed or does not occur at all.
  • general formula (XX-1) to general formula (XX-4) are particularly preferable, and among them, general formula (XX-2) is most preferable.
  • Sp 20 represents an alkylene group having 2 to 5 carbon atoms.
  • the polymerization proceeds even when no polymerization initiator is present, but may contain a polymerization initiator in order to accelerate the polymerization.
  • the polymerization initiator include benzoin ethers, benzophenones, acetophenones, benzyl ketals, acylphosphine oxides, and the like.
  • composition in the present invention can further contain a compound represented by the general formula (Q).
  • RQ represents a straight-chain alkyl group or a branched-chain alkyl group having 1 to 22 carbon atoms, and one or more CH 2 groups in the alkyl group are —O—so that oxygen atoms are not directly adjacent to each other.
  • MQ represents a trans-1,4-cyclohexylene group, a 1,4
  • the compound represented by the general formula (Q) is preferably a compound represented by the following general formula (Qa) to general formula (Qd).
  • R Q1 is preferably a linear or branched alkyl group having 1 to 10 carbon atoms
  • R Q2 is preferably a linear or branched alkyl group having 1 to 20 carbon atoms
  • R Q3 is A straight-chain alkyl group having 1 to 8 carbon atoms, a branched-chain alkyl group, a straight-chain alkoxy group or a branched-chain alkoxy group is preferred
  • L Q is preferably a straight-chain alkylene group or branched-chain alkylene group having 1 to 8 carbon atoms.
  • compounds represented by general formula (Qa) to general formula (Qd) compounds represented by general formula (Qc) and general formula (Qd) are more preferable.
  • the compound represented by the general formula (Q) preferably contains one or two kinds, more preferably contains 1 to 5 kinds, and the content thereof is from 0.001. It is preferably 1%, more preferably 0.001 to 0.1%, and particularly preferably 0.001 to 0.05%.
  • the polymerizable compound contained therein is polymerized by ultraviolet irradiation to impart liquid crystal alignment ability, and the amount of transmitted light is controlled using the birefringence of the composition.
  • liquid crystal display elements As liquid crystal display elements, AM-LCD (active matrix liquid crystal display element), TN (nematic liquid crystal display element), STN-LCD (super twisted nematic liquid crystal display element), OCB-LCD and IPS-LCD (in-plane switching liquid crystal display element)
  • AM-LCD active matrix liquid crystal display element
  • TN nematic liquid crystal display element
  • STN-LCD super twisted nematic liquid crystal display element
  • OCB-LCD OCB-LCD
  • IPS-LCD in-plane switching liquid crystal display element
  • the two substrates of the liquid crystal cell used in the liquid crystal display element can be made of a transparent material having flexibility such as glass or plastic, and one of them can be an opaque material such as silicon.
  • a transparent substrate having a transparent electrode layer can be obtained, for example, by sputtering indium tin oxide (ITO) on a transparent substrate such as a glass plate.
  • the color filter can be prepared by, for example, a pigment dispersion method, a printing method, an electrodeposition method, or a dyeing method.
  • a method for producing a color filter by a pigment dispersion method will be described as an example.
  • a curable coloring composition for a color filter is applied on the transparent substrate, subjected to patterning treatment, and cured by heating or light irradiation. By performing this process for each of the three colors red, green, and blue, a pixel portion for a color filter can be created.
  • a pixel electrode provided with an active element such as a TFT, a thin film diode, or a metal insulator metal specific resistance element may be provided on the substrate.
  • the substrate is opposed so that the transparent electrode layer is on the inside.
  • the thickness of the obtained light control layer is 1 to 100 ⁇ m. More preferably, the thickness is 1.5 to 10 ⁇ m.
  • the polarizing plate it is preferable to adjust the product of the refractive index anisotropy ⁇ n of the liquid crystal and the cell thickness d so that the contrast is maximized.
  • the polarizing axis of each polarizing plate can be adjusted so that the viewing angle and contrast are good.
  • a retardation film for widening the viewing angle can also be used.
  • the spacer examples include columnar spacers made of glass particles, plastic particles, alumina particles, a photoresist material, and the like. Thereafter, a sealant such as an epoxy thermosetting composition is screen-printed on the substrates with a liquid crystal inlet provided, the substrates are bonded together, and heated to thermally cure the sealant.
  • a sealant such as an epoxy thermosetting composition is screen-printed on the substrates with a liquid crystal inlet provided, the substrates are bonded together, and heated to thermally cure the sealant.
  • a normal vacuum injection method or an ODF method can be used as a method of sandwiching the polymerizable compound-containing composition between two substrates.
  • it can be suitably used for a display element manufactured using the ODF method.
  • a sealant such as epoxy photothermal combination curing is drawn on a backplane or front plane substrate using a dispenser in a closed-loop bank shape, and then removed.
  • a liquid crystal display element can be manufactured by bonding a front plane and a back plane after dropping a predetermined amount of the composition under air.
  • the composition of the present invention can be suitably used because the composition can be stably dropped in the ODF process.
  • an appropriate polymerization rate is desirable in order to obtain good alignment performance of liquid crystals. Therefore, active energy rays such as ultraviolet rays or electron beams are irradiated singly or in combination or sequentially.
  • the method of polymerizing by is preferred.
  • ultraviolet rays When ultraviolet rays are used, a polarized light source or a non-polarized light source may be used.
  • the polymerization is carried out in a state where the polymerizable compound-containing composition is sandwiched between two substrates, at least the substrate on the irradiated surface side must be given adequate transparency to the active energy rays. Don't be.
  • the orientation state of the unpolymerized part is changed by changing conditions such as an electric field, a magnetic field, or temperature, and further irradiation with active energy rays is performed. Then, it is possible to use a means for polymerization.
  • a means for polymerization In particular, when ultraviolet exposure is performed, it is preferable to perform ultraviolet exposure while applying an alternating electric field to the polymerizable compound-containing composition.
  • the alternating electric field to be applied is preferably an alternating current having a frequency of 10 Hz to 10 kHz, more preferably a frequency of 60 Hz to 10 kHz, and the voltage is selected depending on a desired pretilt angle of the liquid crystal display element.
  • the pretilt angle of the liquid crystal display element can be controlled by the applied voltage.
  • the pretilt angle is preferably controlled from 80 degrees to 89.9 degrees from the viewpoint of alignment stability and contrast.
  • the temperature at the time of irradiation is preferably within a temperature range in which the liquid crystal state of the composition of the present invention is maintained.
  • Polymerization is preferably performed at a temperature close to room temperature, that is, typically at a temperature of 15 to 35 ° C.
  • a lamp for generating ultraviolet rays a metal halide lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, or the like can be used.
  • a wavelength of the ultraviolet-ray to irradiate it is preferable to irradiate the ultraviolet-ray of the wavelength range which is not the absorption wavelength range of a composition, and it is preferable to cut and use an ultraviolet-ray as needed.
  • the intensity of the irradiated ultraviolet light is preferably 0.1 mW / cm 2 to 100 W / cm 2, more preferably 2 mW / cm 2 to 50 W / cm 2.
  • the amount of energy of ultraviolet rays to be irradiated can be adjusted as appropriate, but is preferably 10 mJ / cm 2 to 500 J / cm 2, and more preferably 100 mJ / cm 2 to 200 J / cm 2.
  • the intensity may be changed.
  • the time for irradiating with ultraviolet rays is appropriately selected depending on the intensity of the irradiating ultraviolet rays.
  • the liquid crystal display device using the composition of the present invention is useful for achieving both high-speed response and suppression of display failure, and is particularly useful for a liquid crystal display device for active matrix driving.
  • VA mode, PSVA mode, PSA It can be applied to a mode, IPS mode or ECB mode liquid crystal display element.
  • the measured characteristics are as follows.
  • T ni Nematic phase-isotropic liquid phase transition temperature (° C.)
  • T cn Solid phase (smectic phase) -nematic phase transition temperature (° C)
  • ⁇ n Refractive index anisotropy at 20 ° C.
  • Dielectric anisotropy at 20 ° C.
  • ⁇ 1 Rotational viscosity at 20 ° C. (mPa ⁇ s)
  • the temperature of the reaction mixture was raised to 0 ° C., 700 ml of 10% aqueous ammonium chloride solution was added and stirred, the organic layer was separated, and the aqueous layer was further extracted with 200 ml of THF.
  • the obtained organic layers were combined, washed with 10% aqueous ammonium chloride solution (500 ml) and saturated brine (500 ml), dried over anhydrous sodium sulfate.
  • the obtained solution was cooled to 0 ° C., a mixture of 71 g of 30% aqueous hydrogen peroxide and 210 ml of water was added, the temperature was raised to room temperature, and the mixture was stirred for 2.5 hours.
  • the obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure to obtain 145.3 g of a crude product of compound (ia1-301).
  • a crude product previously dissolved in 300 ml of hexane / toluene (volume ratio 4/1) was passed through column chromatography (silica gel 200 g), and further eluted with 1200 ml of hexane / toluene (volume ratio 4/1).
  • the obtained solution was concentrated to obtain 114.4 g of a crude product of compound (ia1-301).
  • the transition point is C68I.
  • Example 2 (Compound (ia-1-201)) to Example 28 (Compound (ia-2-802)) was synthesized.
  • Example 30 Compound (ia-1-203) was used except that the compound represented by the formula (a2-1) was used in place of the compound represented by the formula (a1-1).
  • Example 56 Compound (ia-2-804) was synthesized.
  • Example 3 Example 4, Comparative Example 1 and Comparative Example 2
  • LC-1 Example 3
  • LC-2 Example 4
  • LC-A Comparative Example 1
  • LC-B Comparative Example 2
  • the liquid crystal composition LC-1 of the present invention showed large ⁇ n and ⁇ absolute values.
  • 1V-Cy-1O-Ph5-O1 which is a compound represented by the general formula (i) of the present application is replaced with 3-Cy-1O-Ph5-O2 having a common skeleton, and LC- As for A, although Tni raised, (DELTA) (epsilon) fell.
  • DELTA epsilon
  • the liquid crystal composition of the present invention has a large refractive index anisotropy ( ⁇ n) and a large absolute value and a negative dielectric anisotropy ( ⁇ ). It was confirmed that the liquid crystal display elements such as the type and the PSVA type are excellent in low-voltage driving and can sufficiently cope with the narrow gap LCD.

Abstract

The present invention addresses the problem of providing: a liquid crystal compound which has a large negative Δε, a high Tni, a small η, and a large Δn, and can be easily synthesized; a liquid crystal composition which has a large refractive-index anisotropy (Δn), and a negative dielectric-constant anisotropy (Δε) having a large absolute value, is applicable to a narrow-gap LCD, and can be driven by a low voltage; and a liquid crystal display element of VA type, PSA type, PSVA type, or the like. The present invention provides a compound represented by general formula (i), a liquid crystal composition using the same, and a liquid crystal display element using the same.

Description

液晶性化合物、液晶組成物および表示素子Liquid crystal compound, liquid crystal composition and display element
 本発明は液晶性化合物に関する。 The present invention relates to a liquid crystal compound.
 液晶表示素子は、時計、電卓をはじめとして、各種測定機器、自動車用パネル、ワードプロセッサー、電子手帳、プリンター、コンピューター、テレビ、時計、広告表示板等に用いられるようになっている。液晶表示方式としては、その代表的なものにTN(ツイステッド・ネマチック)型、STN(スーパー・ツイステッド・ネマチック)型、TFT(薄膜トランジスタ)を用いたVA(垂直配向)型やIPS(イン・プレーン・スイッチング)型またはFFS(フリンジ・フィールド・スイッチング)型等がある。液晶組成物に求められる主な特性としては、(1)水分、空気、熱、光などの外的刺激に対して安定であること、(2)室温を中心としてできるだけ広い温度範囲で液晶相を示していること、(3)低粘性であること、および(4)駆動電圧が低いことの4つが挙げられ、個々の表示素子にとって誘電率異方性(Δε)や屈折率異方性(Δn)等を最適な値とするために、液晶組成物は数種類から数十種類の化合物から構成されていることが一般的である。 Liquid crystal display elements are used in various measuring instruments, automobile panels, word processors, electronic notebooks, printers, computers, televisions, watches, advertisement display boards, etc., including clocks and calculators. Typical liquid crystal display methods include TN (twisted nematic) type, STN (super twisted nematic) type, VA (vertical alignment) type using TFT (thin film transistor), and IPS (in-plane Switching) type or FFS (fringe field switching) type. The main characteristics required for the liquid crystal composition are (1) being stable against external stimuli such as moisture, air, heat, light, etc. There are four examples: (3) low viscosity, and (4) low driving voltage. For each display element, dielectric anisotropy (Δε) and refractive index anisotropy (Δn) In general, the liquid crystal composition is composed of several to several tens of kinds of compounds in order to obtain an optimal value.
 上記の液晶組成物の特性のうち、Δεについては、正の値である組成物と負の値である組成物が各々使い分けられている。これらのうち、Δεが負の値を示す液晶材料を用いる表示方式としては、ECB型、VA型、更にFFS型などが挙げられる。中でも、VA型表示方式は、テレビ等の用途に使用され、高速かつ広視野角であることが要求される。この際に液晶組成物に対しては、低電圧駆動、高速応答及び広い動作温度範囲が要求される。すなわち、Δεが負で絶対値が大きく、粘度(η)が低く、高いネマチック相-等方性液体相転移温度(Tni)を示すことが要求される。また、屈折率異方性(Δn)とセルギャップ(d)との積であるΔn×dの設定から、液晶組成物のΔnはdに合わせて適当な範囲に調節する必要があるが、近年高速応答に対応するためにセルギャップは小さく設計される傾向にあり、この場合は液晶組成物のΔnを大きくすることが要求される。 Among the characteristics of the liquid crystal composition described above, for Δε, a positive value composition and a negative value composition are used separately. Among these, examples of a display method using a liquid crystal material in which Δε has a negative value include ECB type, VA type, and further FFS type. Among these, the VA display system is used for applications such as televisions, and is required to have a high speed and a wide viewing angle. At this time, the liquid crystal composition is required to have low voltage driving, high-speed response, and a wide operating temperature range. That is, Δε is negative, the absolute value is large, the viscosity (η) is low, and a high nematic phase-isotropic liquid phase transition temperature (T ni ) is required. Further, from the setting of Δn × d, which is the product of refractive index anisotropy (Δn) and cell gap (d), Δn of the liquid crystal composition needs to be adjusted to an appropriate range according to d. In order to cope with high-speed response, the cell gap tends to be designed to be small, and in this case, it is required to increase Δn of the liquid crystal composition.
 また、高速応答性や高いコントラストが得られる液晶表示素子としてPSA(Polymer Sustained Alignment)型液晶表示装置、PSVA(Polymer Stabilised Vertical Alignment)型液晶表示装置が開発されている。PSAやPSVA型液晶表示素子は、非重合性液晶性組成物及び重合性化合物からなる重合性化合物含有液晶組成物を基板間に配した状態で、場合により基板間に電圧を印加して液晶分子を配向させ、配向した状態で紫外線等を照射することにより、重合性化合物を重合させて液晶の配向状態を硬化物に記憶させている。またIPS(インプレーンスイッチング)型液晶表示素子に適用する場合は、無印加状態で硬化させることにより作成できる。このような液晶表示素子に適用する場合は、紫外線に強い組成物が必要である。 Also, PSA (Polymer Sustained Alignment) type liquid crystal display devices and PSVA (Polymer Stabilized Vertical Alignment) type liquid crystal display devices have been developed as liquid crystal display elements that can obtain high-speed response and high contrast. A PSA or PSVA type liquid crystal display element is a liquid crystal molecule in which a polymerizable compound-containing liquid crystal composition comprising a non-polymerizable liquid crystal composition and a polymerizable compound is arranged between substrates, and a voltage is applied between the substrates in some cases. The polymerized compound is polymerized by irradiating ultraviolet rays or the like in the aligned state, and the alignment state of the liquid crystal is stored in the cured product. Moreover, when applying to an IPS (in-plane switching) type | mold liquid crystal display element, it can produce by hardening in a no-application state. When applied to such a liquid crystal display element, a composition resistant to ultraviolet rays is required.
 上記の要求を満たすべく、種々の液晶化合物がこれまでに開発されてきた。Δεが負の液晶材料として、以下のような2,3-ジフルオロフェニレン骨格を有する液晶化合物が提案されている(特許文献1参照)。 In order to satisfy the above requirements, various liquid crystal compounds have been developed so far. As a liquid crystal material having a negative Δε, a liquid crystal compound having the following 2,3-difluorophenylene skeleton has been proposed (see Patent Document 1).
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
 しかしながら、このような化合物は、比較的Δεの絶対値(|Δε|)は大きいものの、Δnが小さいため、dを小さくして高速応答化を実現するには有効ではなく、またTniが低く、これら化合物を液晶組成物に添加すると液晶組成物のTniが低下してしまう問題点を有していた。 However, such a compound has a relatively large absolute value of Δε (| Δε |), but since Δn is small, it is not effective for realizing a high-speed response by reducing d, and Tni is low. When these compounds are added to the liquid crystal composition, there is a problem that Tni of the liquid crystal composition is lowered.
 また、Tniが高く、かつΔnが大きい化合物としては、下記のようなトラン骨格を有する化合物が知られているが、粘度(η)が高く、高速応答の要求には不十分であった(非特許文献1、2参照)。 Further, as compounds having a high Tni and a large Δn, the following compounds having a tolan skeleton are known, but they have a high viscosity (η) and are insufficient for the demand for a high-speed response (non- (See Patent Documents 1 and 2).
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 以上より、|Δε|が大きく、ηが小さく、且つΔnが大きな液晶化合物が望まれている。また、TFT用液晶組成物に使用することから、微量不純物が少なく安価に製造できる製造方法及び製造中間体の開発が求められていた。 From the above, a liquid crystal compound having a large | Δε |, a small η, and a large Δn is desired. Moreover, since it is used for the liquid crystal composition for TFT, development of the manufacturing method and manufacturing intermediate which can manufacture at low cost with few trace impurities was calculated | required.
特願平1-56566Japanese Patent Application No. 1-565666
 本願発明が解決しようとする課題は、負のΔεが大きく、Tniが高く、ηが小さく、Δnが大きく、かつ簡便に合成可能な液晶化合物を提供し、併せて屈折率異方性(Δn)が大きく、絶対値が大きな負の誘電率異方性(Δε)を有する、狭ギャップLCDに対応可能で、低電圧駆動を可能とする液晶組成物及びVA型やPSA型、PSVA型等の液晶表示素子を提供することである。 The problem to be solved by the present invention is to provide a liquid crystal compound having a large negative Δε, a high Tni, a small η, a large Δn, and a compound that can be easily synthesized, together with a refractive index anisotropy (Δn). Liquid crystal composition having a large negative value and a negative dielectric anisotropy (Δε) having a large absolute value, compatible with a narrow gap LCD, and capable of driving at a low voltage, and a liquid crystal such as a VA type, a PSA type, and a PSVA type It is to provide a display element.
 本願発明者は上記課題を解決するために鋭意検討した結果、本願発明の完成に至った。
すなわち、本発明は、一般式(i)
The inventor of the present application has intensively studied to solve the above problems, and as a result, the present invention has been completed.
That is, the present invention relates to the general formula (i)
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
(式中、Ri1は炭素原子数3から15のアルケニル基を表すが、アルケニル基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-、-S-、-COO-、-OCO-、-CO-、-CH=CH-、-C≡C-又は環構造により置き換えられても良く、
i2は炭素原子数1から15のアルキル基を表すが、アルキル基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-、-S-、-COO-、-OCO-、-CO-、-CH=CH-、-C≡C-又は環構造により置き換えられても良く、
i1は、1、2又は3を表し、
i1及びXi2は各々独立して、水素原子、フッ素原子、塩素原子、トリフルオロメチル基又はトリフルオロメトキシ基を表す。)で表される化合物を提供し、併せて当該化合物を含有する液晶組成物及び表示素子を提供する。
(Wherein R i1 represents an alkenyl group having 3 to 15 carbon atoms, and one —CH 2 — present in the alkenyl group or two or more non-adjacent —CH 2 — represents —O— , —S—, —COO—, —OCO—, —CO—, —CH═CH—, —C≡C— or a ring structure,
R i2 represents an alkyl group having from 1 to 15 carbon atoms, one -CH 2 present in the alkyl group - or nonadjacent two or more -CH 2 - is -O -, - S- , —COO—, —OCO—, —CO—, —CH═CH—, —C≡C— or a ring structure,
n i1 represents 1, 2 or 3,
X i1 and X i2 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a trifluoromethyl group or a trifluoromethoxy group. And a liquid crystal composition containing the compound and a display element.
本発明に係る液晶化合物は、粘度が低く、アイソトロピック転移温度が高く、相溶性が高く、屈折率異方性が高く、熱や光による劣化を起こしにくい。本発明に係る液晶化合物を用いた液晶組成物を用いると高速応答液晶表示素子の提供が可能となる。 The liquid crystal compound according to the present invention has a low viscosity, a high isotropic transition temperature, a high compatibility, a high refractive index anisotropy, and is hardly deteriorated by heat or light. When the liquid crystal composition using the liquid crystal compound according to the present invention is used, a high-speed response liquid crystal display element can be provided.
 一般式(i)において、Ri1は粘度を低下させる為には、炭素原子数3~8のアルケニル基であることが好ましく、炭素原子数3~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。 In general formula (i), R i1 is preferably an alkenyl group having 3 to 8 carbon atoms, and particularly preferably an alkenyl group having 3 to 5 carbon atoms, in order to reduce the viscosity. Moreover, it is preferable that it is linear.
 Ri2は粘度を低下させる為には、炭素原子数1~8のアルキル基又は炭素原子数2~8のアルケニル基であることが好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。なお、他の液晶成分との混和性を上昇させるためには、Ri1及びRi2が異なることが好ましく、炭素原子数が異なることが好ましい。 R i2 is preferably an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms in order to reduce the viscosity, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms. Particularly preferred is an alkenyl group of ˜5. Moreover, it is preferable that it is linear. In order to increase miscibility with other liquid crystal components, it is preferable that R i1 and R i2 are different, and it is preferable that the number of carbon atoms is different.
 ni1は、1又は2が好ましい。 n i1 is preferably 1 or 2.
 Xi1及びXi2は、ともに水素原子であるか、ともにフッ素原子であるか、一方が水素原子で他方がフッ素原子であることが好ましい。 X i1 and X i2 are preferably both a hydrogen atom, a fluorine atom, or one is a hydrogen atom and the other is a fluorine atom.
 分子内にフッ素原子が、0~2個あることが好ましく、Δεが負の化合物としては2個であることが好ましく、Δεが-1~1程度である中性の化合物としては0又は1個であることが好ましい。 The number of fluorine atoms in the molecule is preferably 0 to 2, preferably 2 as a compound with a negative Δε, and 0 or 1 as a neutral compound with a Δε of about −1 to 1. It is preferable that
 一般式(i)において、ni1が1または2であり、Xi1及びXi2が各々独立して、フッ素原子、塩素原子、トリフルオロメチル基又はトリフルオロメトキシ基であることが好ましく、一般式(i)において、ni1が2であり、Xi1及びXi2が各々独立して、フッ素原子、塩素原子、トリフルオロメチル基又はトリフルオロメトキシ基であることがさらに好ましい。特に、ni1が2であり、Xi1及びXi2がともにフッ素原子であることが特に好ましい。 In general formula (i), n i1 is 1 or 2, and X i1 and X i2 are each independently preferably a fluorine atom, a chlorine atom, a trifluoromethyl group or a trifluoromethoxy group. In (i), it is more preferable that n i1 is 2, and X i1 and X i2 are each independently a fluorine atom, a chlorine atom, a trifluoromethyl group, or a trifluoromethoxy group. In particular, it is particularly preferable that n i1 is 2 and that X i1 and X i2 are both fluorine atoms.
 負のΔεを示し、かつ|Δε|を大きくするためには、Xi1及びXi2が各々独立して、フッ素原子、塩素原子、トリフルオロメチル基又はトリフルオロメトキシ基であることが好ましい。また、Tniを高くするためには、ni1が2又は3であることが好ましい。また、粘度を低くするためには、ni1が1又は2であり、かつXi1及びXi2が各々独立して水素原子またはフッ素原子であることが好ましい。また、Δnを大きくするためには、ni1が2又は3であることが好ましい。 In order to exhibit negative Δε and increase | Δε |, it is preferable that X i1 and X i2 are each independently a fluorine atom, a chlorine atom, a trifluoromethyl group, or a trifluoromethoxy group. In order to increase Tni, n i1 is preferably 2 or 3. In order to reduce the viscosity, n i1 is preferably 1 or 2, and X i1 and X i2 are each independently a hydrogen atom or a fluorine atom. In order to increase Δn, n i1 is preferably 2 or 3.
 本発明の一般式(i)で表される化合物の好ましい化合物の具体例を以下に示すが、本発明はこれらに限定されるものではない。 Specific examples of preferable compounds of the compound represented by the general formula (i) of the present invention are shown below, but the present invention is not limited thereto.
 一般式(i)で表される化合物は、一般式(i-1)~(i-2)で表される化合物が好ましい。 The compound represented by general formula (i) is preferably a compound represented by general formula (i-1) to (i-2).
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
(式中、Ri1、Ri2、Xi1及びXi2は一般式(i)におけるRi1、Ri2、Xi1及びXi2と同じ意味を表す。)
 Ri1は粘度を低下させる為には、炭素原子数3~8のアルケニル基であることが好ましく、炭素原子数3~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。
(Wherein, R i1, R i2, X i1 and X i2 in the general formula (i) represents the same meaning as R i1, R i2, X i1 and X i2.)
R i1 is preferably an alkenyl group having 3 to 8 carbon atoms, particularly preferably an alkenyl group having 3 to 5 carbon atoms, in order to reduce the viscosity. Moreover, it is preferable that it is linear.
 Ri2は粘度を低下させる為には、炭素原子数1~8のアルキル基又は炭素原子数2~8のアルケニル基であることが好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基であることが特に好ましい。また、直鎖状であることが好ましい。なお、他の液晶成分との混和性を上昇させるためには、Ri1及びRi2が異なることが好ましく、炭素原子数が異なることが好ましい。 R i2 is preferably an alkyl group having 1 to 8 carbon atoms or an alkenyl group having 2 to 8 carbon atoms in order to reduce the viscosity, and an alkyl group having 1 to 5 carbon atoms or 2 carbon atoms. Particularly preferred is an alkenyl group of ˜5. Moreover, it is preferable that it is linear. In order to increase miscibility with other liquid crystal components, it is preferable that R i1 and R i2 are different, and it is preferable that the number of carbon atoms is different.
 一般式(i-1)で表される化合物(一般式(ia)と同義である。)としては、以下の一般式(ia-1)~(ia-5)が特に好ましい。 As the compound represented by the general formula (i-1) (synonymous with the general formula (ia)), the following general formulas (ia-1) to (ia-5) are particularly preferable.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 一般式(i-2)で表される化合物(一般式(ib)と同義である。)としては、以下の一般式(ib-1)~(ib-5)が特に好ましい。 As the compound represented by the general formula (i-2) (synonymous with the general formula (ib)), the following general formulas (ib-1) to (ib-5) are particularly preferable.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 本発明において、一般式(i)で表される化合物は、以下のようにして製造することができる。勿論本発明の趣旨及び適用範囲は、これら製造例により制限されるものではない。
(製法1)一般式(i)で表される化合物の合成方法(1)
In the present invention, the compound represented by the general formula (i) can be produced as follows. Of course, the spirit and scope of the present invention are not limited by these production examples.
(Production Method 1) Synthesis Method (1) of Compound Represented by General Formula (i)
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
(式中、Ri1、Ri2、Xi1、Xi2及びni1は前記一般式(i)におけるRi1、Ri2、Xi1、Xi2及びni1と同じ意味を表し、Ri3およびRi4はそれぞれ独立的にメチル基、エチル基またはプロピル基を表すか、Ri3及びRi4は環状の構造となり-CHCH-、-CHCHCH-又は-CHC(CH)CH-を表す。)
 一般式(S-1)で表される化合物に一般式(S-2)で表される化合物を反応させることによって一般式(S-3)で表される化合物を得るが、一般式(S-1)におけるXi3の置換基の選択により幾つかの反応を用いることが可能である。
(Wherein, R i1, R i2, X i1, X i2 and n i1 are as defined R i1, R i2, X i1 , X i2 and n i1 in formula (i), R i3 and R i4 independently represents a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 have a cyclic structure, —CH 2 CH 2 —, —CH 2 CH 2 CH 2 —, or —CH 2 C (CH 3 ) represents 2 CH 2 —)
The compound represented by the general formula (S-3) is obtained by reacting the compound represented by the general formula (S-1) with the compound represented by the general formula (S-2). Several reactions can be used depending on the choice of X i3 substituent in -1).
 Xi3が塩素、臭素、よう素、ベンゼンスルホニルオキシ基、p-トルエンスルホニルオキシ基、メタンスルホニルオキシ基又はトリフルオロメタンスルホニルオキシ基を表す化合物を用いた場合、一般式(S-2)の水酸基を塩基によりフェノラートとして一般式(S-1)と反応させる方法を用いることができる。この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属リン酸塩、アルカリ金属リン酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属リン酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属リン酸塩としてはリン酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。 When a compound in which Xi3 represents chlorine, bromine, iodine, benzenesulfonyloxy group, p-toluenesulfonyloxy group, methanesulfonyloxy group or trifluoromethanesulfonyloxy group is used, the hydroxyl group of the general formula (S-2) is A method of reacting with the general formula (S-1) as a phenolate with a base can be used. Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
 反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.Examples of chlorine solvents include dichloromethane, 1,2-dichloroethane, and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Among these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
 反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、30℃から120℃がより好ましい。なお、生成したフェノラートを一度単離してから一般式(S-5)で表される化合物と反応させてもよく、単離せずに反応させてもよいが、作業の容易さから単離せずに反応させたほうがよい。 The reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 30 ° C to 120 ° C. The generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
 Xi3が水酸基を表す化合物を用いた場合、光延反応を用いることが可能である。光延反応はアルコールと活性プロトンを持つ多種多様な求核剤とを脱水的に縮合させる反応であり、トリフェニルホスフィンと、アゾジカルボン酸誘導体又はマレイン酸誘導体を組み合わせて用いる。具体的には、一般式(S-2)で表される化合物と一般式(S-1)で表されるアルコール誘導体を三置換ホスフィン誘導体及びアゾジカルボン酸誘導体存在下に反応させることにより一般式(S-3)で表される化合物を得る。 When a compound in which Xi3 represents a hydroxyl group is used, Mitsunobu reaction can be used. The Mitsunobu reaction is a reaction in which alcohol and a wide variety of nucleophiles having active protons are dehydrated, and uses a combination of triphenylphosphine and an azodicarboxylic acid derivative or maleic acid derivative. Specifically, the compound represented by the general formula (S-2) and the alcohol derivative represented by the general formula (S-1) are reacted in the presence of a trisubstituted phosphine derivative and an azodicarboxylic acid derivative. A compound represented by (S-3) is obtained.
 三置換ホスフィン誘導体としては、トリアルキルホスフィン、トリフェニルホスフィン等が挙げられるがトリフェニルホスフィンが好ましい。又、アゾジカルボン酸誘導体としては種々の化合物が用いられており、アゾジカルボン酸誘導体に替えてマレイン酸誘導体を用いることが可能であるが、取り扱いの容易さよりトリフェニルホスフィンとアゾジカルボン酸誘導体の組み合わせが望ましい。アゾジカルボン酸誘導体としてはジエチル アゾジカルボキシレート、ジイソプロピル アゾジカルボキシレート、テトラメチル アゾジカルボキシアミド、テトラプロピル アゾジカルボキシアミド、1,1’-(アゾジカルボニル)ジピペリジンが挙げられるが、入手の容易さよりジエチル アゾジカルボキシレートおよびジイソプロピル アゾジカルボキシレートが好ましく、取り扱いの容易さよりジイソプロピル アゾジカルボキシレートがより好ましい。 Examples of the trisubstituted phosphine derivative include trialkylphosphine and triphenylphosphine, but triphenylphosphine is preferable. Various compounds are used as azodicarboxylic acid derivatives, and it is possible to use maleic acid derivatives instead of azodicarboxylic acid derivatives, but the combination of triphenylphosphine and azodicarboxylic acid derivatives is easier to handle. Is desirable. Examples of the azodicarboxylic acid derivative include diethyl azodicarboxylate, diisopropyl azodicarboxylate, tetramethyl azodicarboxamide, tetrapropyl azodicarboxyamide, 1,1 '-(azodicarbonyl) dipiperidine. Diethyl azodicarboxylate and diisopropyl azodicarboxylate are preferred for ease of handling, and diisopropyl azodicarboxylate is more preferred for ease of handling.
 反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒および芳香族系溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタンおよび四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼンおよびジクロロベンゼン等を好例として挙げることができる。中でも、テトラヒドロフラン等のエーテル系溶媒およびトルエン等の芳香族系溶媒等がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Any reaction solvent may be used as long as it allows the reaction to proceed appropriately, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether. Examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Preferable examples of the hydrocarbon solvent include pentane, hexane, cyclohexane, heptane and octane, and examples of the aromatic solvent include benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. Of these, ether solvents such as tetrahydrofuran and aromatic solvents such as toluene are more preferable. Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
 反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、0℃から30℃がより好ましい。 The reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 0 ° C to 30 ° C.
 一般式(S-3)で表される化合物を酸化することにより一般式(S-4)で表される化合物を得ることができる。この酸化は、有機金属試薬により脱プロトン化した後、ほう酸トリアルキルと反応させてほう素化合物とし、その後酸化剤を作用させることによって行うことができる。反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒および炭化水素系溶媒等を挙げることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等が挙げられ、中でもテトラヒドロフランが好ましい。有機金属試薬としてはn-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム、メチルリチウム、リチウム ジイソプロピルアミドおよびリチウム 2,2,4,4-テトラメルピペリジド等を挙げることができ、入手および取り扱いの容易さからn-ブチルリチウム、sec-ブチルリチウムおよびリチウムジイソプロピルアミドが好ましく、効率的に脱プロトン化が可能であるsec-ブチルリチウムおよびリチウムジイソプロピルアミドがより好ましい。また、脱プロトン化の際には、上記有機金属試薬と共にカリウム-t-ブトキシド、テトラメチルエチレンジアミン等の塩基を添加剤として用いてもよい。脱プロトン化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。 A compound represented by the general formula (S-4) can be obtained by oxidizing the compound represented by the general formula (S-3). This oxidation can be carried out by deprotonation with an organometallic reagent, reaction with a trialkyl borate to form a boron compound, and subsequent action of an oxidizing agent. Any reaction solvent may be used as long as it allows the reaction to proceed suitably, and examples thereof include ether solvents and hydrocarbon solvents. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane. Of these, tetrahydrofuran is preferred. Examples of organometallic reagents include n-butyllithium, sec-butyllithium, tert-butyllithium, methyllithium, lithium diisopropylamide, lithium 2,2,4,4-tetramerpiperidide, etc. N-Butyllithium, sec-butyllithium and lithium diisopropylamide are preferable from the viewpoint of ease of handling, and sec-butyllithium and lithium diisopropylamide which can be efficiently deprotonated are more preferable. In the deprotonation, a base such as potassium tert-butoxide or tetramethylethylenediamine may be used as an additive together with the organometallic reagent. The reaction temperature at the time of deprotonation is preferably -100 ° C to -20 ° C, more preferably -78 ° C to -40 ° C.
 ほう酸トリアルキルとしては、ほう酸トリメチル、ほう酸トリエチル、ほう酸トリプロピルおよびほう酸トリイソプロピルを用いるのが好ましいが、入手および取り扱いの容易さからほう酸トリメチルおよびほう酸トリイソプロピルがより好ましい。ほう酸トリアルキルと有機金属試薬の組み合わせとしては、上記で挙げたいずれの組み合わせも可能であるが、sec-ブチルリチウムとほう酸トリメチルの組み合わせ、およびリチウム ジイソプロピルアミドとほう酸トリイソプロピルの組み合わせが好ましく、リチウム ジイソプロピルアミドとほう酸トリイソプロピルの組み合わせがより好ましい。ほう素化の際の反応温度は-100℃から-20℃が好ましく、-78℃から-40℃がより好ましい。得られたほう素化合物は一度単離してもよく、単離せずそのまま酸化剤と反応させてもよい。また、得られたほう素化合物を加水分解してほう酸化合物へと変換した後に酸化剤と反応させても構わない。 As the trialkyl borate, trimethyl borate, triethyl borate, tripropyl borate and triisopropyl borate are preferably used, but trimethyl borate and triisopropyl borate are more preferred from the viewpoint of availability and handling. As the combination of trialkyl borate and organometallic reagent, any of the above-mentioned combinations can be used, but the combination of sec-butyl lithium and trimethyl borate, and the combination of lithium diisopropylamide and triisopropyl borate are preferable, and lithium diisopropyl A combination of amide and triisopropyl borate is more preferred. The reaction temperature during boriding is preferably from -100 ° C to -20 ° C, more preferably from -78 ° C to -40 ° C. The obtained boron compound may be isolated once or may be reacted with an oxidizing agent without isolation. Further, the obtained boron compound may be hydrolyzed and converted into a boric acid compound and then reacted with an oxidizing agent.
 酸化剤としては、過酸化水素水、過酢酸または過ギ酸を用いるのが好ましい。反応温度は-78℃から70℃が好ましく、0℃から50℃がより好ましい。また、酸化剤との反応時には、溶媒に水が含まれていても構わない。 As the oxidizing agent, hydrogen peroxide water, peracetic acid or performic acid is preferably used. The reaction temperature is preferably -78 ° C to 70 ° C, more preferably 0 ° C to 50 ° C. Moreover, water may be contained in the solvent at the time of reaction with an oxidizing agent.
 一般式(S-4)で表される化合物に一般式(S-5)で表される化合物を反応させることによって一般式(S-6)で表される化合物を得るが、一般式(S-5)におけるXi4の置換基の選択により幾つかの反応を用いることが可能である。 The compound represented by the general formula (S-6) is obtained by reacting the compound represented by the general formula (S-4) with the compound represented by the general formula (S-5). Several reactions can be used depending on the choice of X i4 substituent in -5).
 Xi3が塩素、臭素、よう素、ベンゼンスルホニルオキシ基、p-トルエンスルホニルオキシ基、メタンスルホニルオキシ基又はトリフルオロメタンスルホニルオキシ基を表す化合物を用いた場合、一般式(S-4)の水酸基を塩基によりフェノラートとして一般式(S-5)と反応させる方法を用いることができる。この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属リン酸塩、アルカリ金属リン酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属リン酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属リン酸塩としてはリン酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。 When a compound in which Xi3 represents chlorine, bromine, iodine, benzenesulfonyloxy group, p-toluenesulfonyloxy group, methanesulfonyloxy group or trifluoromethanesulfonyloxy group is used, the hydroxyl group of the general formula (S-4) is A method of reacting with the general formula (S-5) as a phenolate with a base can be used. Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
 反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.Examples of chlorine solvents include dichloromethane, 1,2-dichloroethane, and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Among these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
 反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、30℃から120℃がより好ましい。なお、生成したフェノラートを一度単離してから一般式(S-5)で表される化合物と反応させてもよく、単離せずに反応させてもよいが、作業の容易さから単離せずに反応させたほうがよい。 The reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 30 ° C to 120 ° C. The generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
 Xi4が水酸基を表す化合物を用いた場合、光延反応を用いることが可能である。光延反応はアルコールと活性プロトンを持つ多種多様な求核剤とを脱水的に縮合させる反応であり、トリフェニルホスフィンとアゾジカルボン酸誘導体又はマレイン酸誘導体を組み合わせて用いる。具体的には、一般式(S-4)で表される化合物と一般式(S-5)で表されるアルコール誘導体を三置換ホスフィン誘導体及びアゾジカルボン酸誘導体存在下に反応させることにより一般式(S-6)で表される化合物を得る。 When a compound in which Xi4 represents a hydroxyl group is used, Mitsunobu reaction can be used. The Mitsunobu reaction is a reaction in which an alcohol and a wide variety of nucleophiles having active protons are dehydrated and used in combination with triphenylphosphine and an azodicarboxylic acid derivative or maleic acid derivative. Specifically, the compound represented by the general formula (S-4) and the alcohol derivative represented by the general formula (S-5) are reacted in the presence of a trisubstituted phosphine derivative and an azodicarboxylic acid derivative. A compound represented by (S-6) is obtained.
 三置換ホスフィン誘導体としては、トリアルキルホスフィン、トリフェニルホスフィン等が挙げられるがトリフェニルホスフィンが好ましい。又、アゾジカルボン酸誘導体としては種々の化合物が用いられており、アゾジカルボン酸誘導体に替えてマレイン酸誘導体を用いることが可能であるが、取り扱いの容易さよりトリフェニルホスフィンとアゾジカルボン酸誘導体の組み合わせが望ましい。アゾジカルボン酸誘導体としてはジエチル アゾジカルボキシレート、ジイソプロピル アゾジカルボキシレート、テトラメチル アゾジカルボキシアミド、テトラプロピル アゾジカルボキシアミド、1,1’-(アゾジカルボニル)ジピペリジンが挙げられるが、入手の容易さよりジエチル アゾジカルボキシレートおよびジイソプロピル アゾジカルボキシレートが好ましく、取り扱いの容易さよりジイソプロピル アゾジカルボキシレートがより好ましい。 Examples of the trisubstituted phosphine derivative include trialkylphosphine and triphenylphosphine, but triphenylphosphine is preferable. Various compounds are used as azodicarboxylic acid derivatives, and it is possible to use maleic acid derivatives instead of azodicarboxylic acid derivatives, but the combination of triphenylphosphine and azodicarboxylic acid derivatives is easier to handle. Is desirable. Examples of azodicarboxylic acid derivatives include diethyl azodicarboxylate, diisopropyl azodicarboxylate, tetramethyl azodicarboxyamide, tetrapropyl azodicarboxyamide, 1,1 '-(azodicarbonyl) dipiperidine, Diethyl azodicarboxylate and diisopropyl azodicarboxylate are preferred for ease of handling, and diisopropyl azodicarboxylate is more preferred for ease of handling.
 反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒および芳香族系溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタンおよび四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼンおよびジクロロベンゼン等を好例として挙げることができる。中でも、テトラヒドロフラン等のエーテル系溶媒およびトルエン等の芳香族系溶媒等がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Any reaction solvent may be used as long as it allows the reaction to proceed appropriately, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether. Examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Preferable examples of the hydrocarbon solvent include pentane, hexane, cyclohexane, heptane and octane, and examples of the aromatic solvent include benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. Of these, ether solvents such as tetrahydrofuran and aromatic solvents such as toluene are more preferable. Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
 反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、0℃から30℃がより好ましい。 The reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 0 ° C to 30 ° C.
 一般式(S-6)で表される化合物の脱保護は、酸性条件下で行うことが好ましい。使用する酸としては、ギ酸、酢酸、トリフルオロ酢酸、しゅう酸、p-トルエンスルホン酸等のプロトン酸および三フッ化ほう素等のルイス酸等が挙げられるが、ギ酸を用いるのが好ましい。 The deprotection of the compound represented by the general formula (S-6) is preferably performed under acidic conditions. Examples of the acid used include protonic acids such as formic acid, acetic acid, trifluoroacetic acid, oxalic acid, and p-toluenesulfonic acid, and Lewis acids such as boron trifluoride. Formic acid is preferably used.
 反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、ケトン系溶媒、炭化水素系溶媒、芳香族系溶媒および極性溶媒等を好ましく用いることができ、無溶媒で反応させてもよい。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン、クロロホルムおよび四塩化炭素等を、ケトン系溶媒としてはアセトンおよび2-ブタノン等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼンおよびジクロロベンゼン等を、極性溶媒としてはアセトニトリルおよびジメチルスルホキシド等を好例として挙げることができる。中でも、ペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等の炭化水素系溶媒およびベンゼン、トルエン、キシレン等の芳香族系溶媒等がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, ketone solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like are preferably used. And may be reacted without solvent. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of chlorine solvents include dichloromethane, 1,2-dichloroethane, chloroform, and carbon tetrachloride. Acetone, 2-butanone and the like as ketone solvents, pentane, hexane, cyclohexane, heptane and octane as hydrocarbon solvents, and benzene, toluene, xylene, mesitylene, chlorobenzene and dibenzene as aromatic solvents. Preferable examples include chlorobenzene and acetonitrile, dimethyl sulfoxide and the like as polar solvents. Of these, hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane and octane, and aromatic solvents such as benzene, toluene and xylene are more preferable. Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
 反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から100℃が好ましく、30℃から60℃がより好ましい。 The reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 100 ° C, more preferably 30 ° C to 60 ° C.
 こうして得られる式(S-7)で表される化合物は、シクロヘキサン環に関するシス体およびトランス体の混合物として得られる場合があるが、液晶化合物の中間体として使用するためにはトランス体であることが好ましい。式(S-7)で表される化合物のシクロヘキサン環に関しては、必要に応じて塩基を作用させることによりシス-トランス異性化を行うことができ、トランス体を過剰に得ることができる。この際使用する塩基としては水酸化ナトリウム、水酸化カリウム等が好ましく、反応溶媒はメタノール、エタノールおよびテトラヒドロフラン等が好ましく、反応温度は-40℃から20℃が好ましく、-20℃から10℃がより好ましい。 The compound represented by the formula (S-7) thus obtained may be obtained as a mixture of a cis isomer and a trans isomer relating to the cyclohexane ring, but must be a trans isomer for use as an intermediate of a liquid crystal compound. Is preferred. With respect to the cyclohexane ring of the compound represented by the formula (S-7), cis-trans isomerization can be performed by allowing a base to act as necessary, and an excess of trans isomer can be obtained. The base used at this time is preferably sodium hydroxide, potassium hydroxide or the like, the reaction solvent is preferably methanol, ethanol or tetrahydrofuran, the reaction temperature is preferably -40 ° C to 20 ° C, more preferably -20 ° C to 10 ° C. preferable.
 式(S-7)で表される化合物にアルキルリンイリドを反応させることによって一般式(i)で表される化合物を得ることができる。リンイリドはホスホニウム塩、ホスホン酸エステル等から調整することができるが、アルキルトリフェニルホスホニウム塩から調整することが好ましい。 A compound represented by the general formula (i) can be obtained by reacting an alkyl phosphorus ylide with the compound represented by the formula (S-7). The phosphorus ylide can be adjusted from a phosphonium salt, a phosphonic acid ester or the like, but is preferably adjusted from an alkyltriphenylphosphonium salt.
 アルキルトリフェニルホスホニウム塩を用いてイリドを調整する場合塩基を作用させて行うが、使用する塩基としてはカリウム-t-ブトキシド、n-ブチルリチウム、フェニルリチウム、水素化ナトリウム等が好ましく、カリウム-t-ブトキシドがより好ましい。反応溶媒はエーテル系溶媒、芳香族系溶媒および極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン等を、極性溶媒としてはN,N-ジメチルホルムアミド等を好例として挙げることができる。テトラヒドロフランおよびトルエンがより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、-40℃から30℃が好ましく、-20℃から20℃がより好ましい。得られたイリドは単離することなく式(5)で表される化合物と反応させるのが好ましい。また、アルキルトリフェニルホスホニウム塩および式(5)で表される化合物の混合物に対して塩基を加えてもよい。アルキルトリフェニルホスホニウム塩としてはメチルトリフェニルホスホニウム塩が好ましい。 When adjusting an ylide using an alkyltriphenylphosphonium salt, a base is allowed to act. As the base to be used, potassium-t-butoxide, n-butyllithium, phenyllithium, sodium hydride and the like are preferable, and potassium-t -Butoxide is more preferred. As the reaction solvent, ether solvents, aromatic solvents, polar solvents and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of aromatic solvents include benzene, toluene, xylene, mesitylene, and the like as polar solvents. A good example is N, N-dimethylformamide. Tetrahydrofuran and toluene are more preferred. Each of the above solvents may be used alone, or two or more solvents may be mixed and used. The reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, but is preferably -40 ° C to 30 ° C, more preferably -20 ° C to 20 ° C. The obtained ylide is preferably reacted with the compound represented by the formula (5) without isolation. Further, a base may be added to the mixture of the alkyltriphenylphosphonium salt and the compound represented by the formula (5). As the alkyltriphenylphosphonium salt, methyltriphenylphosphonium salt is preferable.
 本願発明は、一般式(S-1)で表される化合物を出発原料として、一般式(S-3)、一般式(S-4)、一般式(S-6)及び一般式(S-7)で表される化合物を経由して一般式(i)で表される化合物を製造するものであるが、一般式(S-3)で表される化合物を出発原料として、一般式(S-4)、一般式(S-6)及び一般式(S-7)で表される化合物を経由して一般式(i)で表される化合物を製造することも好ましく、一般式(S-4)で表される化合物を出発原料として、一般式(S-6)及び一般式(S-7)で表される化合物を経由して一般式(i)で表される化合物を製造することも好ましく、一般式(S-6)で表される化合物を出発原料として、一般式(S-7)で表される化合物を経由して一般式(i)で表される化合物を製造することも好ましく、一般式(S-7)で表される化合物を出発原料として、一般式(i)で表される化合物を製造することも好ましい。
(製法2)一般式(i)で表される化合物の合成方法(2)
In the present invention, a compound represented by general formula (S-1) is used as a starting material, and general formula (S-3), general formula (S-4), general formula (S-6) and general formula (S— 7) The compound represented by the general formula (i) is produced via the compound represented by the formula (S), and the compound represented by the general formula (S-3) is used as a starting material. -4), it is also preferable to produce the compound represented by the general formula (i) via the compound represented by the general formula (S-6) and (S-7). 4) Starting from the compound represented by 4), the compound represented by general formula (i) is produced via the compound represented by general formula (S-6) and (S-7). It is also preferable that the compound represented by the general formula (S-6) is used as a starting material and the compound represented by the general formula (i) via the compound represented by the general formula (S-7). It is also preferred to produce a compound represented by the compound represented by formula (S-7) as a starting material, it is also preferable to produce a compound represented by the general formula (i).
(Production Method 2) Method for Synthesizing Compound Represented by General Formula (i) (2)
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
(式中、Ri1、Ri2、Xi1、Xi2及びni1は前記一般式(i)におけるRi1、Ri2、Xi1、Xi2及びni1と同じ意味を表し、Ri3およびRi4はそれぞれ独立的にメチル基、エチル基またはプロピル基を表すか、Ri3およびRi4は環状の構造となり-CHCH-、-CHCHCH-又は-CHC(CH)CH-を表す。)
 一般式(S-1)で表される化合物に一般式(S-8)で表される化合物を反応させることによって一般式(S-6)で表される化合物を得るが、一般式(S-1)におけるXi3の置換基の選択により幾つかの反応を用いることが可能である。
(Wherein, R i1, R i2, X i1, X i2 and n i1 are as defined R i1, R i2, X i1 , X i2 and n i1 in formula (i), R i3 and R i4 independently represents a methyl group, an ethyl group, or a propyl group, or R i3 and R i4 have a cyclic structure, —CH 2 CH 2 —, —CH 2 CH 2 CH 2 —, or —CH 2 C (CH 3 ) represents 2 CH 2 —)
The compound represented by the general formula (S-6) is obtained by reacting the compound represented by the general formula (S-1) with the compound represented by the general formula (S-8). Several reactions can be used depending on the choice of X i3 substituent in -1).
 Xi3が塩素、臭素、よう素、ベンゼンスルホニルオキシ基、p-トルエンスルホニルオキシ基、メタンスルホニルオキシ基又はトリフルオロメタンスルホニルオキシ基を表す化合物を用いた場合、一般式(S-8)の水酸基を塩基によりフェノラートとして一般式(S-1)と反応させる方法を用いることができる。この場合に使用する塩基としては金属水素化物、金属炭酸塩、金属リン酸塩、金属水酸化物、金属カルボン酸塩、金属アミド及び金属等を挙げることができ、中でもアルカリ金属水素化物、アルカリ金属リン酸塩、アルカリ金属リン酸塩、アルカリ金属炭酸塩、アルカリ金属水酸化物、アルカリ金属アミド及びアルカリ金属が好ましく、アルカリ金属リン酸塩、アルカリ金属水素化物及びアルカリ金属炭酸塩は更に好ましい。アルカリ金属水素化物としては水素化リチウム、水素化ナトリウム及び水素化カリウムを、アルカリ金属リン酸塩としてはリン酸三カリウムを、アルカリ金属炭酸塩としては炭酸ナトリウム、炭酸水素ナトリウム、炭酸セシウム、炭酸カリウム及び炭酸水素カリウムをそれぞれ好ましく挙げることができる。 When a compound in which Xi3 represents chlorine, bromine, iodine, benzenesulfonyloxy group, p-toluenesulfonyloxy group, methanesulfonyloxy group or trifluoromethanesulfonyloxy group is used, the hydroxyl group of the general formula (S-8) is A method of reacting with the general formula (S-1) as a phenolate with a base can be used. Examples of the base used in this case include metal hydrides, metal carbonates, metal phosphates, metal hydroxides, metal carboxylates, metal amides and metals, among which alkali metal hydrides and alkali metals. Phosphate, alkali metal phosphate, alkali metal carbonate, alkali metal hydroxide, alkali metal amide and alkali metal are preferred, and alkali metal phosphate, alkali metal hydride and alkali metal carbonate are more preferred. Lithium hydride, sodium hydride and potassium hydride as alkali metal hydrides, tripotassium phosphate as alkali metal phosphates, sodium carbonate, sodium bicarbonate, cesium carbonate, potassium carbonate as alkali metal carbonates And potassium hydrogen carbonate can be preferably mentioned.
 反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒、芳香族系溶媒及び極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテル及びt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン及び四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタン及びオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン及びジクロロベンゼン等を、極性溶媒としてはN,N-ジメチルホルムアミド、N-メチルピロリドン、ジメチルスルホキシド及びスルホラン等を好例として挙げることができる。中でも、テトラヒドロフラン、ジエチルエーテル等のエーテル系溶媒及びN,N-ジメチルホルムアミド等の極性溶媒がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether.Examples of chlorine solvents include dichloromethane, 1,2-dichloroethane, and carbon tetrachloride. Examples of hydrocarbon solvents include pentane, hexane, cyclohexane, heptane, and octane, aromatic solvents include benzene, toluene, xylene, mesitylene, chlorobenzene, and dichlorobenzene, and polar solvents include N, N-dimethylformamide, Preferable examples include N-methylpyrrolidone, dimethyl sulfoxide, and sulfolane. Among these, ether solvents such as tetrahydrofuran and diethyl ether and polar solvents such as N, N-dimethylformamide are more preferable. Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
 反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から150℃が好ましく、30℃から120℃がより好ましい。なお、生成したフェノラートを一度単離してから一般式(S-5)で表される化合物と反応させてもよく、単離せずに反応させてもよいが、作業の容易さから単離せずに反応させたほうがよい。 The reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 150 ° C, more preferably 30 ° C to 120 ° C. The generated phenolate may be isolated once and then reacted with the compound represented by the general formula (S-5), or may be reacted without isolation, but it is not isolated for ease of work. It is better to react.
 Xi3が水酸基を表す化合物を用いた場合、光延反応を用いることが可能である。光延反応はアルコールと活性プロトンを持つ多種多様な求核剤とを脱水的に縮合させる反応であり、トリフェニルホスフィンとアゾジカルボン酸誘導体又はマレイン酸誘導体を組み合わせて用いる。具体的には、一般式(S-8)で表される化合物と一般式(S-1)で表されるアルコール誘導体を三置換ホスフィン誘導体及びアゾジカルボン酸誘導体存在下に反応させることにより一般式(S-6)で表される化合物を得る。 When a compound in which Xi3 represents a hydroxyl group is used, Mitsunobu reaction can be used. The Mitsunobu reaction is a reaction in which an alcohol and a wide variety of nucleophiles having active protons are dehydrated and used in combination with triphenylphosphine and an azodicarboxylic acid derivative or maleic acid derivative. Specifically, the compound represented by the general formula (S-8) and the alcohol derivative represented by the general formula (S-1) are reacted in the presence of a trisubstituted phosphine derivative and an azodicarboxylic acid derivative. A compound represented by (S-6) is obtained.
 三置換ホスフィン誘導体としては、トリアルキルホスフィン、トリフェニルホスフィン等が挙げられるがトリフェニルホスフィンが好ましい。又、アゾジカルボン酸誘導体としては種々の化合物が用いられており、アゾジカルボン酸誘導体に替えてマレイン酸誘導体を用いることが可能であるが、取り扱いの容易さよりトリフェニルホスフィンとアゾジカルボン酸誘導体の組み合わせが望ましい。アゾジカルボン酸誘導体としてはジエチル アゾジカルボキシレート、ジイソプロピル アゾジカルボキシレート、テトラメチル アゾジカルボキシアミド、テトラプロピル アゾジカルボキシアミド、1,1’-(アゾジカルボニル)ジピペリジンが挙げられるが、入手の容易さよりジエチル アゾジカルボキシレートおよびジイソプロピル アゾジカルボキシレートが好ましく、取り扱いの容易さよりジイソプロピル アゾジカルボキシレートがより好ましい。 Examples of the trisubstituted phosphine derivative include trialkylphosphine and triphenylphosphine, but triphenylphosphine is preferable. Various compounds are used as azodicarboxylic acid derivatives, and it is possible to use maleic acid derivatives instead of azodicarboxylic acid derivatives, but the combination of triphenylphosphine and azodicarboxylic acid derivatives is easier to handle. Is desirable. Examples of the azodicarboxylic acid derivative include diethyl azodicarboxylate, diisopropyl azodicarboxylate, tetramethyl azodicarboxamide, tetrapropyl azodicarboxyamide, 1,1 '-(azodicarbonyl) dipiperidine. Diethyl azodicarboxylate and diisopropyl azodicarboxylate are preferred for ease of handling, and diisopropyl azodicarboxylate is more preferred for ease of handling.
 反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、炭化水素系溶媒および芳香族系溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタンおよび四塩化炭素等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼンおよびジクロロベンゼン等を好例として挙げることができる。中でも、テトラヒドロフラン等のエーテル系溶媒およびトルエン等の芳香族系溶媒等がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Any reaction solvent may be used as long as it allows the reaction to proceed appropriately, but ether solvents, chlorine solvents, hydrocarbon solvents, aromatic solvents, and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether and t-butyl methyl ether. Examples of chlorine solvents include dichloromethane, 1,2-dichloroethane and carbon tetrachloride. Preferable examples of the hydrocarbon solvent include pentane, hexane, cyclohexane, heptane and octane, and examples of the aromatic solvent include benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. Of these, ether solvents such as tetrahydrofuran and aromatic solvents such as toluene are more preferable. Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
 一般式(S-6)で表される化合物の脱保護は、酸性条件下で行うことが好ましい。使用する酸としては、ギ酸、酢酸、トリフルオロ酢酸、しゅう酸、p-トルエンスルホン酸等のプロトン酸および三フッ化ほう素等のルイス酸等が挙げられるが、ギ酸を用いるのが好ましい。 The deprotection of the compound represented by the general formula (S-6) is preferably performed under acidic conditions. Examples of the acid used include protonic acids such as formic acid, acetic acid, trifluoroacetic acid, oxalic acid, and p-toluenesulfonic acid, and Lewis acids such as boron trifluoride. Formic acid is preferably used.
 反応溶媒としては、反応を好適に進行させるものであればいずれでも構わないが、エーテル系溶媒、塩素系溶媒、ケトン系溶媒、炭化水素系溶媒、芳香族系溶媒および極性溶媒等を好ましく用いることができ、無溶媒で反応させてもよい。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、塩素系溶媒としてはジクロロメタン、1,2-ジクロロエタン、クロロホルムおよび四塩化炭素等を、ケトン系溶媒としてはアセトンおよび2-ブタノン等を、炭化水素系溶媒としてはペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン、クロロベンゼンおよびジクロロベンゼン等を、極性溶媒としてはアセトニトリルおよびジメチルスルホキシド等を好例として挙げることができる。中でも、ペンタン、ヘキサン、シクロヘキサン、ヘプタンおよびオクタン等の炭化水素系溶媒およびベンゼン、トルエン、キシレン等の芳香族系溶媒等がより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。 Any reaction solvent may be used as long as it allows the reaction to proceed suitably, but ether solvents, chlorine solvents, ketone solvents, hydrocarbon solvents, aromatic solvents, polar solvents, and the like are preferably used. And may be reacted without solvent. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of chlorine solvents include dichloromethane, 1,2-dichloroethane, chloroform, and carbon tetrachloride. Acetone, 2-butanone and the like as ketone solvents, pentane, hexane, cyclohexane, heptane and octane as hydrocarbon solvents, and benzene, toluene, xylene, mesitylene, chlorobenzene and dibenzene as aromatic solvents. Preferable examples include chlorobenzene and acetonitrile, dimethyl sulfoxide and the like as polar solvents. Of these, hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane and octane, and aromatic solvents such as benzene, toluene and xylene are more preferable. Each of the above solvents may be used alone, or two or more solvents may be mixed and used.
 反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、0℃から100℃が好ましく、30℃から60℃がより好ましい。 The reaction temperature can be from the freezing point of the solvent to the reflux temperature range, but is preferably 0 ° C to 100 ° C, more preferably 30 ° C to 60 ° C.
 こうして得られる式(S-7)で表される化合物は、シクロヘキサン環に関するシス体およびトランス体の混合物として得られる場合があるが、液晶化合物の中間体として使用するためにはトランス体であることが好ましい。式(S-7)で表される化合物のシクロヘキサン環に関しては、必要に応じて塩基を作用させることによりシス-トランス異性化を行うことができ、トランス体を過剰に得ることができる。この際使用する塩基としては水酸化ナトリウム、水酸化カリウム等が好ましく、反応溶媒はメタノール、エタノールおよびテトラヒドロフラン等が好ましく、反応温度は-40℃から20℃が好ましく、-20℃から10℃がより好ましい。 The compound represented by the formula (S-7) thus obtained may be obtained as a mixture of a cis isomer and a trans isomer relating to the cyclohexane ring, but must be a trans isomer for use as an intermediate of a liquid crystal compound. Is preferred. With respect to the cyclohexane ring of the compound represented by the formula (S-7), cis-trans isomerization can be performed by allowing a base to act as necessary, and an excess of trans isomer can be obtained. The base used at this time is preferably sodium hydroxide, potassium hydroxide or the like, the reaction solvent is preferably methanol, ethanol or tetrahydrofuran, the reaction temperature is preferably -40 ° C to 20 ° C, more preferably -20 ° C to 10 ° C. preferable.
 式(S-7)で表される化合物にアルキルリンイリドを反応させることによって一般式(i)で表される化合物を得ることができる。リンイリドはホスホニウム塩、ホスホン酸エステル等から調整することができるが、アルキルトリフェニルホスホニウム塩から調整することが好ましい。 A compound represented by the general formula (i) can be obtained by reacting an alkyl phosphorus ylide with the compound represented by the formula (S-7). The phosphorus ylide can be adjusted from a phosphonium salt, a phosphonic acid ester or the like, but is preferably adjusted from an alkyltriphenylphosphonium salt.
 アルキルトリフェニルホスホニウム塩を用いてイリドを調整する場合塩基を作用させて行うが、使用する塩基としてはカリウム-t-ブトキシド、n-ブチルリチウム、フェニルリチウム、水素化ナトリウム等が好ましく、カリウム-t-ブトキシドがより好ましい。反応溶媒はエーテル系溶媒、芳香族系溶媒および極性溶媒等を好ましく用いることができる。エーテル系溶媒としては、1,4-ジオキサン、1,3-ジオキサン、テトラヒドロフラン、ジエチルエーテルおよびt-ブチルメチルエーテル等を、芳香族系溶媒としてはベンゼン、トルエン、キシレン、メシチレン等を、極性溶媒としてはN,N-ジメチルホルムアミド等を好例として挙げることができる。テトラヒドロフランおよびトルエンがより好ましい。また、前記の各溶媒を単独で使用しても、2種もしくはそれ以上の溶媒を混合して使用してもよい。反応温度は溶媒の凝固点から還流温度範囲で行うことができるが、-40℃から30℃が好ましく、-20℃から20℃がより好ましい。得られたイリドは単離することなく式(5)で表される化合物と反応させるのが好ましい。また、アルキルトリフェニルホスホニウム塩および式(5)で表される化合物の混合物に対して塩基を加えてもよい。アルキルトリフェニルホスホニウム塩としてはメチルトリフェニルホスホニウム塩が好ましい。 When adjusting an ylide using an alkyltriphenylphosphonium salt, a base is allowed to act. As the base to be used, potassium-t-butoxide, n-butyllithium, phenyllithium, sodium hydride and the like are preferable, and potassium-t -Butoxide is more preferred. As the reaction solvent, ether solvents, aromatic solvents, polar solvents and the like can be preferably used. Examples of ether solvents include 1,4-dioxane, 1,3-dioxane, tetrahydrofuran, diethyl ether, and t-butyl methyl ether. Examples of aromatic solvents include benzene, toluene, xylene, mesitylene, and the like as polar solvents. A good example is N, N-dimethylformamide. Tetrahydrofuran and toluene are more preferred. Each of the above solvents may be used alone, or two or more solvents may be mixed and used. The reaction temperature can be in the range from the freezing point of the solvent to the reflux temperature, but is preferably -40 ° C to 30 ° C, more preferably -20 ° C to 20 ° C. The obtained ylide is preferably reacted with the compound represented by the formula (5) without isolation. Further, a base may be added to the mixture of the alkyltriphenylphosphonium salt and the compound represented by the formula (5). As the alkyltriphenylphosphonium salt, methyltriphenylphosphonium salt is preferable.
 本願発明は、一般式(S-1)で表される化合物を出発原料として、一般式(S-6)及び一般式(S-7)で表される化合物を経由して一般式(i)で表される化合物を製造するものであるが、一般式(S-6)で表される化合物を出発原料として、一般式(S-7)で表される化合物を経由して一般式(i)で表される化合物を製造することも好ましく、一般式(S-7)で表される化合物を出発原料として、一般式(i)で表される化合物を製造することも好ましい。 The present invention provides a compound represented by general formula (i) via a compound represented by general formula (S-6) and (S-7) using a compound represented by general formula (S-1) as a starting material. The compound represented by the general formula (i) is produced from the compound represented by the general formula (S-6) as a starting material via the compound represented by the general formula (S-7). It is also preferable to produce a compound represented by general formula (i) using a compound represented by general formula (S-7) as a starting material.
 本発明の組成物は、一般式(i)で表される化合物とともに、一般式(N-1)で表される化合物を1種類又は2種類以上含有することが好ましい。一般式(N-1)で表されるは誘電的に負の化合物(Δεの符号が負で、その絶対値が2より大きい。)に該当する。 The composition of the present invention preferably contains one or more compounds represented by the general formula (N-1) together with the compound represented by the general formula (i). Represented by the general formula (N-1) is a dielectrically negative compound (the sign of Δε is negative and its absolute value is greater than 2).
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
(式中、RN11及びRN12はそれぞれ独立して炭素原子数1~8のアルキル基を表し、該アルキル基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
 AN11及びAN12はそれぞれ独立して
(a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)及び
(b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)
(c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子又は塩素原子で置換されていても良く、
 ZN11及びZN12はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-COO-、-OCO-、-OCF-、-CFO-、-CH=N-N=CH-、-CH=CH-、-CF=CF-又は-C≡C-を表し、
 nN11及びnN12はそれぞれ独立して0~3の整数を表すが、nN11+nN12は1、2又は3であり、AN11~AN12、ZN11~ZN12が複数存在する場合は、それらは同一であっても異なっていても良い。)
 一般式(N-1)で表される化合物は、Δεが負でその絶対値が3よりも大きな化合物であることが好ましい。
(Wherein R N11 and R N12 each independently represent an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently Optionally substituted by —CH═CH—, —C≡C—, —O—, —CO—, —COO— or —OCO—,
Independently A N11 and A N12, respectively (a) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - is -O And (b) a 1,4-phenylene group (one —CH═ present in the group or two or more non-adjacent —CH═ are replaced with —N =). May be.)
(C) (c) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6- One —CH═ present in a diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ are replaced by —N═. Is also good.)
The group (a), the group (b) and the group (c) may be each independently substituted with a cyano group, a fluorine atom or a chlorine atom,
Z N11 and Z N12 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —OCF 2 -, -CF 2 O-, -CH = NN-CH-, -CH = CH-, -CF = CF- or -C≡C-
Although n N11 and n N12 each represent independently an integer of 0 ~ 3, n N11 + n N12 is 1, 2 or 3, if A N11 ~ A N12, Z N11 ~ Z N12 there is a plurality, They may be the same or different. )
The compound represented by the general formula (N-1) is preferably a compound having a negative Δε and an absolute value larger than 3.
 一般式(N-1)中、RN11及びRN12はそれぞれ独立して、炭素原子数1~8のアルキル基、炭素原子数1~8のアルコキシ基、炭素原子数2~8のアルケニル基又は炭素原子数2~8のアルケニルオキシ基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基又は炭素原子数2~5のアルケニルオキシ基が好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が更に好ましく、炭素原子数2~5のアルキル基又は炭素原子数2~3のアルケニル基が更に好ましく、炭素原子数3のアルケニル基(プロペニル基)が特に好ましい。 In general formula (N-1), R N11 and R N12 each independently represent an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or An alkenyloxy group having 2 to 8 carbon atoms is preferable, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkyl group having 2 to 5 carbon atoms. An alkenyloxy group is preferred, an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is more preferred, and an alkyl group having 2 to 5 carbon atoms or an alkenyl group having 2 to 3 carbon atoms is further preferred. An alkenyl group having 3 carbon atoms (propenyl group) is particularly preferable.
 また、それが結合する環構造がフェニル基(芳香族)である場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び炭素原子数4~5のアルケニル基が好ましく、それが結合する環構造がシクロヘキサン、ピラン及びジオキサンなどの飽和した環構造の場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。ネマチック相を安定化させるためには炭素原子及び存在する場合酸素原子の合計が5以下であることが好ましく、直鎖状であることが好ましい。 Further, when the ring structure to which it is bonded is a phenyl group (aromatic), a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms and carbon An alkenyl group having 4 to 5 atoms is preferable, and when the ring structure to which the alkenyl group is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane, a linear alkyl group having 1 to 5 carbon atoms, a straight chain A straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred. In order to stabilize the nematic phase, the total of carbon atoms and oxygen atoms, if present, is preferably 5 or less, and is preferably linear.
 アルケニル基としては、式(R1)から式(R5)のいずれかで表される基から選ばれることが好ましい。(各式中の黒点は環構造中の炭素原子を表す。) The alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dots in each formula represent carbon atoms in the ring structure.)
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 AN11及びAN12はそれぞれ独立してΔnを大きくすることが求められる場合には芳香族であることが好ましく、応答速度を改善するためには脂肪族であることが好ましく、トランス-1,4-シクロへキシレン基、1,4-フェニレン基、2-フルオロ-1,4-フェニレン基、3-フルオロ-1,4-フェニレン基、3,5-ジフルオロ-1,4-フェニレン基、2,3-ジフルオロ-1,4-フェニレン基、1,4-シクロヘキセニレン基、1,4-ビシクロ[2.2.2]オクチレン基、ピペリジン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基を表すことが好ましく、下記の構造を表すことがより好ましく、 A N11 and A N12 are preferably aromatic when it is required to independently increase Δn, and are preferably aliphatic for improving the response speed, and trans-1,4 -Cyclohexylene group, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 2, 3-difluoro-1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, piperidine-1,4-diyl group, naphthalene-2,6- It preferably represents a diyl group, decahydronaphthalene-2,6-diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, and more preferably represents the following structure:
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
トランス-1,4-シクロへキシレン基又は1,4-フェニレン基を表すことがより好ましい。 More preferably, it represents a trans-1,4-cyclohexylene group or a 1,4-phenylene group.
 ZN11及びZN12はそれぞれ独立して-CHO-、-CFO-、-CHCH-、-CFCF-又は単結合を表すことが好ましく、-CHO-、-CHCH-又は単結合が更に好ましく、-CHO-又は単結合が特に好ましい。 Z N11 and Z N12 are each independently -CH 2 O -, - CF 2 O -, - CH 2 CH 2 -, - CF 2 CF 2 - or preferably a single bond, -CH 2 O-, —CH 2 CH 2 — or a single bond is more preferable, —CH 2 O— or a single bond is particularly preferable.
 nN11+nN12は1又は2が好ましく、nN11が1でありnN12が0である組み合わせ、nN11が2でありnN12が0である組み合わせ、nN11が1でありnN12が1である組み合わせ、nN11が2でありnN12が1である組み合わせが好ましい。 n N11 + n N12 is preferably 1 or 2, a combination in which n N11 is 1 and n N12 is 0, a combination in which n N11 is 2 and n N12 is 0, n N11 is 1 and n N12 is 1 A certain combination is preferred in which n N11 is 2 and n N12 is 1.
 本発明の組成物の総量に対しての式(N-1)で表される化合物の好ましい含有量の下限値は、1%であり、10%であり、20%であり、30%であり、40%であり、50%であり、55%であり、60%であり、65%であり、70%であり、75%であり、80%である。好ましい含有量の上限値は、95%であり、85%であり、75%であり、65%であり、55%であり、45%であり、35%であり、25%であり、20%である。 The lower limit of the preferable content of the compound represented by the formula (N-1) with respect to the total amount of the composition of the present invention is 1%, 10%, 20%, 30% , 40%, 50%, 55%, 60%, 65%, 70%, 75%, and 80%. The upper limit of the preferred content is 95%, 85%, 75%, 65%, 55%, 45%, 35%, 25%, 20% It is.
 特に、一般式(i)で表される化合物と組み合わせると好ましい化合物として、下記の一般式(N-1a)~(N-1d)で表される化合物群を挙げることができる。 In particular, the compounds represented by the following general formulas (N-1a) to (N-1d) can be exemplified as preferred compounds when combined with the compound represented by the general formula (i).
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
(式中、RN11及びRN12は一般式(N-1)におけるRN11及びRN12と同じ意味を表し、nNa11は0又は1を表し、nNb11は0又は1を表し、nNc11は0又は1を表し、nNd11は0又は1を表す。)
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値が低く上限値が低いことが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値が低く上限値が低いことが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高く上限値が高いことが好ましい。
(Wherein, R N11 and R N12 are as defined R N11 and R N12 in the general formula (N-1), n Na11 represents 0 or 1, n NB11 represents 0 or 1, n NC11 is Represents 0 or 1, and n Nd11 represents 0 or 1)
In the case where a composition having a low response speed and a high response speed is required, the lower limit value is preferably low and the upper limit value is preferably low. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, the above lower limit value is preferably low and the upper limit value is preferably low. When it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the above lower limit value is increased and the upper limit value is high.
 より具体的には、一般式(N-1)で表される化合物は一般式(N-1-1)~(N-1-21)で表される化合物群から選ばれる化合物であることが好ましい。 More specifically, the compound represented by the general formula (N-1) is a compound selected from the group of compounds represented by the general formulas (N-1-1) to (N-1-21). preferable.
 一般式(N-1-1)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-1) is the following compound.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
(式中、RN111及びRN112はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN111は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、プロピル基又はペンチル基が好ましい。RN112は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基又はブトキシ基が好ましい。
(In the formula, R N111 and R N112 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
R N111 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably a propyl group or a pentyl group. RN112 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group or a butoxy group.
  一般式(N-1-1)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量を少なめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Setting to a small value is highly effective. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-1)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%であり、23%であり、25%であり、27%であり、30%であり、33%であり、35%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、50%であり、40%であり、38%であり、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-1) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17%, 20%, 23%, 25%, 27%, 30%, 33%, 35%. The upper limit of the preferable content is 50%, 40%, 38%, 35%, 33%, 30%, and 28% with respect to the total amount of the composition of the present invention. %, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8%, 7%, 6% %, 5%, 3%.
 さらに、一般式(N-1-1)で表される化合物は、式(N-1-1.1)から式(N-1-1.14)で表される化合物群から選ばれる化合物であることが好ましく、式(N-1-1.1)~(N-1-1.4)で表される化合物であることが好ましく、式(N-1-1.1)及び式(N-1-1.3)で表される化合物が好ましい。 Further, the compound represented by the general formula (N-1-1) is a compound selected from the group of compounds represented by the formula (N-1-1.1) to the formula (N-1-1.14). Preferably, it is a compound represented by the formulas (N-1-1.1) to (N-1-1.4), and the formula (N-1-1.1) and the formula (N The compound represented by -1-1.3) is preferable.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 式(N-1-1.1)~(N-1-1.4)で表される化合物は単独で使用することも、組み合わせて使用することも可能であるが、本発明の組成物の総量に対しての単独又はこれら化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%であり、23%であり、25%であり、27%であり、30%であり、33%であり、35%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、50%であり、40%であり、38%であり、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The compounds represented by the formulas (N-1-1.1) to (N-1-1.4) can be used alone or in combination. The lower limit of the preferred content of these compounds alone or with respect to the total amount is 5%, 10%, 13%, 15%, 17%, 20%, 23% 25% 27% 30% 33% 35% The upper limit of the preferable content is 50%, 40%, 38%, 35%, 33%, 30%, and 28% with respect to the total amount of the composition of the present invention. %, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8%, 7%, 6% %, 5%, 3%.
 一般式(N-1-2)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-2) is the following compound.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
(式中、RN121及びRN122はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN121は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基、ブチル基又はペンチル基が好ましい。RN122は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、メチル基、プロピル基、メトキシ基、エトキシ基又はプロポキシ基が好ましい。
(In the formula, R N121 and R N122 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
RN121 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group, a butyl group or a pentyl group. RN122 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and includes a methyl group, a propyl group, a methoxy group, an ethoxy group, or a propoxy group. preferable.
  一般式(N-1-2)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-2) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を少なめに設定すると効果が高く、TNIを重視する場合は含有量を多めに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 When emphasizing the improvement of Δε, it is preferable to set the content higher. When emphasizing the solubility at low temperature, it is more effective to set the content lower. When emphasizing T NI , the content is preferable. Setting a large number of is highly effective. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-2)で表される化合物の好ましい含有量の下限値は、5%であり、7%であり、10%であり、13%であり、15%であり、17%であり、20%であり、23%であり、25%であり、27%であり、30%であり、33%であり、35%であり、37%であり、40%であり、42%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、50%であり、48%であり、45%であり、43%であり、40%であり、38%であり、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-2) with respect to the total amount of the composition of the present invention is 5%, 7%, 10%, 13% 15%, 17%, 20%, 23%, 25%, 27%, 30%, 33%, 35%, 37% 40% and 42%. The upper limit of the preferable content is 50%, 48%, 45%, 43%, 40%, 38%, and 35% with respect to the total amount of the composition of the present invention. %, 33%, 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% %, 8%, 7%, 6%, 5%.
 さらに、一般式(N-1-2)で表される化合物は、式(N-1-2.1)から式(N-1-2.13)で表される化合物群から選ばれる化合物であることが好ましく、式(N-1-2.3)から式(N-1-2.7)、式(N-1-2.10)、式(N-1-2.11)及び式(N-1-2.13)で表される化合物であることが好ましく、Δεの改良を重視する場合には式(N-1-2.3)から式(N-1-2.7)で表される化合物が好ましく、TNIの改良を重視する場合には式(N-1-2.10)、式(N-1-2.11)及び式(N-1-2.13)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (N-1-2) is a compound selected from the group of compounds represented by the formula (N-1-2.1) to the formula (N-1-2.13). Preferably, the formula (N-1-2.3) to the formula (N-1-2.7), the formula (N-1-2.10), the formula (N-1-2.11) and the formula The compound represented by (N-1-2.13) is preferable, and when importance is placed on the improvement of Δε, the formula (N-1-2.3) to the formula (N-1-2.7) in the compounds represented, when emphasizing improvements in T NI formula (N-1-2.10), formula (N-1-2.11) and formula (N-1-2.13) It is preferable that it is a compound represented by these.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 式(N-1-2.1)から式(N-1-2.13)で表される化合物は単独で使用することも、組み合わせて使用することも可能であるが、本発明の組成物の総量に対しての単独又はこれら化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%であり、23%であり、25%であり、27%であり、30%であり、33%であり、35%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、50%であり、40%であり、38%であり、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The compounds represented by the formula (N-1-2.1) to the formula (N-1-2.13) can be used alone or in combination. The lower limit of the preferable content of these compounds alone or with respect to the total amount of is 5%, 10%, 13%, 15%, 17%, 20%, 23 %, 25%, 27%, 30%, 33%, and 35%. The upper limit of the preferable content is 50%, 40%, 38%, 35%, 33%, 30%, and 28% with respect to the total amount of the composition of the present invention. %, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8%, 7%, 6% %, 5%, 3%.
 一般式(N-1-3)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-3) is the following compound.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
(式中、RN131及びRN132はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN131は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN132は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N131 and R N132 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
R N131 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N132 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-3)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-3) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-3)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-3) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 さらに、一般式(N-1-3)で表される化合物は、式(N-1-3.1)から式(N-1-3.11)で表される化合物群から選ばれる化合物であることが好ましく、式(N-1-3.1)~(N-1-3.7)で表される化合物であることが好ましく、式(N-1-3.1)、式(N-1-3.2)、式(N-1-3.3)、式(N-1-3.4)及び式(N-1-3.6)で表される化合物が好ましい。 Further, the compound represented by the general formula (N-1-3) is a compound selected from the group of compounds represented by the formula (N-1-3.1) to the formula (N-1-3.11). Preferably, it is a compound represented by the formulas (N-1-3.1) to (N-1-3.7), and the formula (N-1-3.1) and the formula (N -1-3.2), formula (N-1-3.3), formula (N-1-3.4) and compounds represented by formula (N-1-3.6) are preferred.
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
 式(N-1-3.1)~式(N-1-3.4)及び式(N-1-3.6)で表される化合物は単独で使用することも、組み合わせて使用することも可能であるが、式(N-1-3.1)及び式(N-1-3.2)の組み合わせ、式(N-1-3.3)、式(N-1-3.4)及び式(N-1-3.6)から選ばれる2種又は3種の組み合わせが好ましい。本発明の組成物の総量に対しての単独又はこれら化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The compounds represented by formula (N-1-3.1) to formula (N-1-3.4) and formula (N-1-3.6) may be used alone or in combination. Is possible, but the combination of formula (N-1-3.1) and formula (N-1-3.2), formula (N-1-3.3), formula (N-1-3.4) ) And a combination of two or three selected from formula (N-1-3.6) are preferred. The lower limit of the preferred content of these compounds alone or with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15%, 17%, 20% %. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-4)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-4) is the following compound.
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
(式中、RN141及びRN142はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN141及びRN142はそれぞれ独立して、炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、メチル基、プロピル基、エトキシ基又はブトキシ基が好ましい。
(Wherein, R N141 and R N142 each independently represents the same meaning as R N11 and R N12 in the general formula (N).)
R N141 and R N142 are each independently an alkyl group having 1 to 5 carbon atoms, an alkenyl group or an alkoxy group having 1 to 4 carbon atoms carbon atoms 4-5 preferably a methyl group, a propyl group, an ethoxy Group or butoxy group is preferred.
 一般式(N-1-4)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-4) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量を少なめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Setting to a small value is highly effective. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-4)で表される化合物の好ましい含有量の下限値は、3%であり、5%であり、7%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、11%であり、10%であり、8%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-4) with respect to the total amount of the composition of the present invention is 3%, 5%, 7%, 10% 13%, 15%, 17%, 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, 13%, 11%, 10%, and 8%.
 さらに、一般式(N-1-4)で表される化合物は、式(N-1-4.1)から式(N-1-4.14)で表される化合物群から選ばれる化合物であることが好ましく、式(N-1-4.1)~(N-1-4.4)で表される化合物であることが好ましく、式(N-1-4.1)及び式(N-1-4.2)で表される化合物が好ましい。 Further, the compound represented by the general formula (N-1-4) is a compound selected from the group of compounds represented by the formula (N-1-4.1) to the formula (N-1-4.14). Preferably, it is a compound represented by the formulas (N-1-4.1) to (N-1-4.4), and the formula (N-1-4.1) and the formula (N The compound represented by -1-4.2) is preferable.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 式(N-1-4.1)~(N-1-4.4)で表される化合物は単独で使用することも、組み合わせて使用することも可能であるが、本発明の組成物の総量に対しての単独又はこれら化合物の好ましい含有量の下限値は、3%であり、5%であり、7%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、11%であり、10%であり、8%である。 The compounds represented by formulas (N-1-4.1) to (N-1-4.4) can be used singly or in combination, but the compounds of the present invention The lower limit of the preferable content of these compounds alone or with respect to the total amount is 3%, 5%, 7%, 10%, 13%, 15%, 17% And 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, 13%, 11%, 10%, and 8%.
 一般式(N-1-5)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-5) is the following compound.
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
(式中、RN151及びRN152はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN151及びRN152はそれぞれ独立して、炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましくエチル基、プロピル基又はブチル基が好ましい。
(In the formula, R N151 and R N152 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
R N151 and R N152 are each independently an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethyl group, a propyl group, or a butyl group. Is preferred.
 一般式(N-1-5)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-5) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を少なめに設定すると効果が高く、TNIを重視する場合は含有量を多めに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 When emphasizing the improvement of Δε, it is preferable to set the content higher. When emphasizing the solubility at low temperature, it is more effective to set the content lower. When emphasizing T NI , the content is preferable. Setting a large number of is highly effective. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-5)で表される化合物の好ましい含有量の下限値は、5%であり、8%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-5) with respect to the total amount of the composition of the present invention is 5%, 8%, 10%, 13% 15%, 17%, 20%. The upper limit of the preferable content is 35%, 33%, 30%, 28%, 25%, 23%, and 20% with respect to the total amount of the composition of the present invention. %, 18%, 15% and 13%.
 さらに、一般式(N-1-5)で表される化合物は、式(N-1-5.1)から式(N-1-5.6)で表される化合物群から選ばれる化合物であることが好ましく、式(N-1-3.2及び式(N-1-3.4)で表される化合物が好ましい。 Further, the compound represented by the general formula (N-1-5) is a compound selected from the group of compounds represented by the formula (N-1-5.1) to the formula (N-1-5.6). It is preferable that a compound represented by the formula (N-1-3.2 and the formula (N-1-3.4) is preferable.
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 式(N-1-3.2及び式(N-1-3.4)で表される化合物は単独で使用することも、組み合わせて使用することも可能であるが、本発明の組成物の総量に対しての単独又はこれら化合物の好ましい含有量の下限値は、5%であり、8%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The compounds represented by formula (N-1-3.2) and formula (N-1-3.4) can be used alone or in combination. The lower limit of the preferable content of these compounds alone or with respect to the total amount is 5%, 8%, 10%, 13%, 15%, 17%, 20% The upper limit of the preferred content is 35%, 33%, 30%, 28%, 25%, and 23% with respect to the total amount of the composition of the present invention. Yes, 20%, 18%, 15%, 13%.
 一般式(N-1-10)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-10) is the following compound.
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
(式中、RN1101及びRN1102はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1101は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1102は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N1101 and R N1102 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
R N1101 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N1102 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-10)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-10) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-10)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-10) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 さらに、一般式(N-1-10)で表される化合物は、式(N-1-10.1)から式(N-1-10.11)で表される化合物群から選ばれる化合物であることが好ましく、式(N-1-10.1)~(N-1-10.5)で表される化合物であることが好ましく、式(N-1-10.1)及び式(N-1-10.2)で表される化合物が好ましい。 Further, the compound represented by the general formula (N-1-10) is a compound selected from the group of compounds represented by the formula (N-1-10.1) to the formula (N-1-10.11). Preferably, it is a compound represented by the formulas (N-1-10.1) to (N-1-10.5), and the formula (N-1-10.1) and the formula (N The compound represented by (1-10.2) is preferable.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 式(N-1-10.1)及び式(N-1-10.2)で表される化合物は単独で使用することも、組み合わせて使用することも可能であるが、本発明の組成物の総量に対しての単独又はこれら化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The compounds represented by the formula (N-1-10.1) and the formula (N-1-10.2) can be used alone or in combination. The lower limit of the preferable content of these compounds alone or with respect to the total amount is 5%, 10%, 13%, 15%, 17%, and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-11)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-11) is the following compound.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
(式中、RN1111及びRN1112はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1111は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1112は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N1111 and R N1112 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
R N1111 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N1112 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group or a butoxy group.
 一般式(N-1-11)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-11) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-11)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-11) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 さらに、一般式(N-1-11)で表される化合物は、式(N-1-11.1)から式(N-1-11.15)で表される化合物群から選ばれる化合物であることが好ましく、式(N-1-11.1)~(N-1-11.15)で表される化合物であることが好ましく、式(N-1-11.2及び式(N-1-11.4)で表される化合物が好ましい。 Further, the compound represented by the general formula (N-1-11) is a compound selected from the group of compounds represented by the formula (N-1-11.1) to the formula (N-1-11.15). Preferably, it is a compound represented by the formulas (N-1-11.1) to (N-1-11.15), and is preferably a compound represented by the formula (N-1-11.2) or the formula (N-- The compound represented by 1-11.4) is preferable.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 式(N-1-11.2及び式(N-1-11.4)で表される化合物は単独で使用することも、組み合わせて使用することも可能であるが、本発明の組成物の総量に対しての単独又はこれら化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The compounds represented by the formula (N-1-11.2 and the formula (N-1-11.4) can be used alone or in combination. The lower limit of the preferable content of these compounds alone or with respect to the total amount is 5%, 10%, 13%, 15%, 17%, and 20%. The upper limit of the amount is 35%, 30%, 28%, 25%, 23%, 20%, 18% with respect to the total amount of the composition of the present invention. Yes, 15%, 13%.
 一般式(N-1-12)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-12) is the following compound.
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
(式中、RN1121及びRN1122はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1121は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1122は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N1121 and R N1122 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
RN1121 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. RN1122 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-12)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-12) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-12)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-12) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-13)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-13) is the following compound.
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
(式中、RN1131及びRN1132はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1131は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1132は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N1131 and R N1132 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
R N1131 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N1132 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-13)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-13) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-13)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-13) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-14)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-14) is the following compound.
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
(式中、RN1141及びRN1142はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1141は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1142は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N1141 and R N1142 each independently represent the same meaning as R N11 and R N12 in formula (N).)
R N1141 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N1142 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-14)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-14) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-14)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-14) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-15)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-15) is the following compound.
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
(式中、RN1151及びRN1152はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1151は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1152は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N1151 and R N1152 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
RN1151 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N1152 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-15)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-15) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-15)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-15) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-16)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-16) is the following compound.
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
(式中、RN1161及びRN1162はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1161は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1162は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N1161 and R N1162 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
R N1161 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N1162 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-16)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-16) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-16)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-16) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-17)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-17) is the following compound.
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
(式中、RN1171及びRN1172はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1171は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1172は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
(In the formula, R N1171 and R N1172 each independently represent the same meaning as R N11 and R N12 in General Formula (N)).
RN1171 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N1172 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-17)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-17) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-17)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-17) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-18)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-18) is the following compound.
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
(式中、RN1181及びRN1182はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1181は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。RN1182は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、エトキシ基、プロポキシ基又はブトキシ基が好ましい。
( Wherein , R N1181 and R N1182 each independently represent the same meaning as R N11 and R N12 in General Formula (N)).
RN1181 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group. R N1182 is preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and preferably an ethoxy group, a propoxy group, or a butoxy group.
 一般式(N-1-18)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-18) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-18)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-18) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-20)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-20) is the following compound.
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
(式中、RN1201及びRN1202はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1201及びRN1202はそれぞれ独立して、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。
(In the formula, R N1201 and R N1202 each independently represent the same meaning as R N11 and R N12 in formula (N)).
R N1201 and R N1202 are each independently preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
 一般式(N-1-20)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-20) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-20)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 The lower limit of the preferable content of the compound represented by the formula (N-1-20) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.
 一般式(N-1-21)で表される化合物は下記の化合物である。 The compound represented by the general formula (N-1-21) is the following compound.
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
(式中、RN1211及びRN1212はそれぞれ独立して、一般式(N)におけるRN11及びRN12と同じ意味を表す。)
 RN1211及びRN1212はそれぞれ独立して、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、エチル基、プロピル基又はブチル基が好ましい。
(In the formula, R N1211 and R N1212 each independently represent the same meaning as R N11 and R N12 in General Formula (N).)
R N1211 and R N1212 are each independently preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and preferably an ethyl group, a propyl group or a butyl group.
 一般式(N-1-21)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (N-1-21) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 Δεの改善を重視する場合には含有量を高めに設定することが好ましく、低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、TNIを重視する場合は含有量をおおめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 It is preferable to set a higher content in the case of emphasizing improved [Delta] [epsilon], to emphasize the solubility at low temperature highly effective when larger amount to set the content, when importance is attached to T NI content Highly effective when set to. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(N-1-21)で表される化合物の好ましい含有量の下限値は、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、35%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。



 本発明の組成物は、一般式(L)で表される化合物を1種類又は2種類以上含有することが好ましい。一般式(L)で表される化合物は誘電的にほぼ中性の化合物(Δεの値が-2~2)に該当する。
The lower limit of the preferable content of the compound represented by the formula (N-1-21) with respect to the total amount of the composition of the present invention is 5%, 10%, 13%, 15% 17% and 20%. The upper limit of the preferable content is 35%, 30%, 28%, 25%, 23%, 20%, and 18% with respect to the total amount of the composition of the present invention. %, 15%, and 13%.



It is preferable that the composition of this invention contains 1 type, or 2 or more types of compounds represented by general formula (L). The compound represented by the general formula (L) corresponds to a dielectrically neutral compound (Δε value is −2 to 2).
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039
(式中、RL1及びRL2はそれぞれ独立して炭素原子数1~8のアルキル基を表し、該アルキル基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
 nL1は0、1、2又は3を表し、
 AL1、AL2及びAL3はそれぞれ独立して
(a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)及び
(b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)
(c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子又は塩素原子で置換されていても良く、
 ZL1及びZL2はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-COO-、-OCO-、-OCF-、-CFO-、-CH=N-N=CH-、-CH=CH-、-CF=CF-又は-C≡C-を表し、
 nL1が2又は3であってAL2が複数存在する場合は、それらは同一であっても異なっていても良く、nL1が2又は3であってZL3が複数存在する場合は、それらは同一であっても異なっていても良いが、一般式(i)及び一般式(N-1)で表される化合物を除く。)
 一般式(L)で表される化合物は単独で用いてもよいが、組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの所望の性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類である。あるいは本発明の別の実施形態では2種類であり、3種類であり、4種類であり、5種類であり、6種類であり、7種類であり、8種類であり、9種類であり、10種類以上である。
(Wherein R L1 and R L2 each independently represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently Optionally substituted by —CH═CH—, —C≡C—, —O—, —CO—, —COO— or —OCO—,
n L1 represents 0, 1, 2 or 3,
A L1 , A L2 and A L3 each independently represent (a) a 1,4-cyclohexylene group (one —CH 2 — present in the group or two or more —CH 2 — not adjacent to each other). May be replaced by —O—) and (b) a 1,4-phenylene group (one —CH═ present in this group or two or more —CH═ not adjacent to each other —N May be replaced by =.)
(C) (c) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6- One —CH═ present in a diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ are replaced by —N═. Is also good.)
The group (a), the group (b) and the group (c) may be each independently substituted with a cyano group, a fluorine atom or a chlorine atom,
Z L1 and Z L2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —OCF 2 -, -CF 2 O-, -CH = NN-CH-, -CH = CH-, -CF = CF- or -C≡C-
When n L1 is 2 or 3, and a plurality of A L2 are present, they may be the same or different, and when n L1 is 2 or 3, and a plurality of Z L3 are present, May be the same or different, but excludes compounds represented by general formula (i) and general formula (N-1). )
Although the compound represented by general formula (L) may be used independently, it can also be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to desired properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention. Alternatively, in another embodiment of the present invention, there are two types, three types, four types, five types, six types, seven types, eight types, nine types, 10 types, More than types.
 本発明の組成物において、一般式(L)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、複屈折率、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (L) is low-temperature solubility, transition temperature, electrical reliability, birefringence, process compatibility, dripping marks, image sticking, It is necessary to appropriately adjust according to required performance such as dielectric anisotropy.
 本発明の組成物の総量に対しての式(L)で表される化合物の好ましい含有量の下限値は、1%であり、10%であり、20%であり、30%であり、40%であり、50%であり、55%であり、60%であり、65%であり、70%であり、75%であり、80%である。好ましい含有量の上限値は、95%であり、85%であり、75%であり、65%であり、55%であり、45%であり、35%であり、25%である。 The lower limit of the preferable content of the compound represented by the formula (L) with respect to the total amount of the composition of the present invention is 1%, 10%, 20%, 30%, 40 %, 50%, 55%, 60%, 65%, 70%, 75%, 80%. The upper limit of the preferable content is 95%, 85%, 75%, 65%, 55%, 45%, 35%, and 25%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値が高く上限値が高いことが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値が高く上限値が高いことが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を低く上限値が低いことが好ましい。 When the viscosity of the composition of the present invention is kept low and a composition having a high response speed is required, the above lower limit value is preferably high and the upper limit value is preferably high. Furthermore, when the composition of the present invention maintains a high Tni and requires a composition having good temperature stability, the above lower limit value is preferably high and the upper limit value is preferably high. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the above lower limit value is lowered and the upper limit value is low.
 信頼性を重視する場合にはRL1及びRL2はともにアルキル基であることが好ましく、化合物の揮発性を低減させることを重視する場合にはアルコキシ基であることが好ましく、粘性の低下を重視する場合には少なくとも一方はアルケニル基であることが好ましい。 When importance is attached to reliability, R L1 and R L2 are preferably both alkyl groups, and when importance is placed on reducing the volatility of the compound, it is preferably an alkoxy group, and importance is placed on viscosity reduction. In this case, at least one is preferably an alkenyl group.
  分子内に存在するハロゲン原子は0、1、2又は3個が好ましく、0又は1が好ましく、他の液晶分子との相溶性を重視する場合には1が好ましい。 The number of halogen atoms present in the molecule is preferably 0, 1, 2 or 3, preferably 0 or 1, and 1 is preferred when importance is attached to compatibility with other liquid crystal molecules.
 RL1及びRL2は、それが結合する環構造がフェニル基(芳香族)である場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び炭素原子数4~5のアルケニル基が好ましく、それが結合する環構造がシクロヘキサン、ピラン及びジオキサンなどの飽和した環構造の場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。ネマチック相を安定化させるためには炭素原子及び存在する場合酸素原子の合計が5以下であることが好ましく、直鎖状であることが好ましい。 R L1 and R L2 are each a linear alkyl group having 1 to 5 carbon atoms or a linear alkyl group having 1 to 4 carbon atoms when the ring structure to which R L1 is bonded is a phenyl group (aromatic). When the ring structure to which it is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane, a straight-chain C 1-5 carbon atom is preferred. Alkyl groups, linear alkoxy groups having 1 to 4 carbon atoms and linear alkenyl groups having 2 to 5 carbon atoms are preferred. In order to stabilize the nematic phase, the total of carbon atoms and oxygen atoms, if present, is preferably 5 or less, and is preferably linear.
 アルケニル基としては、式(R1)から式(R5)のいずれかで表される基から選ばれることが好ましい。(各式中の黒点は環構造中の炭素原子を表す。) The alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dots in each formula represent carbon atoms in the ring structure.)
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
 nL1は応答速度を重視する場合には0が好ましく、ネマチック相の上限温度を改善するためには2又は3が好ましく、これらのバランスをとるためには1が好ましい。また、組成物として求められる特性を満たすためには異なる値の化合物を組み合わせることが好ましい。 n L1 is preferably 0 when importance is attached to the response speed, 2 or 3 is preferred for improving the upper limit temperature of the nematic phase, and 1 is preferred for balancing these. In order to satisfy the properties required for the composition, it is preferable to combine compounds having different values.
 AL1、AL2及びAL3はΔnを大きくすることが求められる場合には芳香族であることが好ましく、応答速度を改善するためには脂肪族であることが好ましく、それぞれ独立してトランス-1,4-シクロへキシレン基、1,4-フェニレン基、2-フルオロ-1,4-フェニレン基、3-フルオロ-1,4-フェニレン基、3,5-ジフルオロ-1,4-フェニレン基、1,4-シクロヘキセニレン基、1,4-ビシクロ[2.2.2]オクチレン基、ピペリジン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基を表すことが好ましく、下記の構造を表すことがより好ましく、 A L1 , A L2, and A L3 are preferably aromatic when it is required to increase Δn, and are preferably aliphatic for improving the response speed, and are each independently trans- 1,4-cyclohexylene group, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, piperidine-1,4-diyl group, naphthalene-2,6-diyl group, decahydronaphthalene-2,6 -It preferably represents a diyl group or a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, and more preferably represents the following structure:
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
トランス-1,4-シクロへキシレン基又は1,4-フェニレン基を表すことがより好ましい。
More preferably, it represents a trans-1,4-cyclohexylene group or a 1,4-phenylene group.
 ZL1及びZL2は応答速度を重視する場合には単結合であることが好ましい。 Z L1 and Z L2 are preferably single bonds when the response speed is important.
 分子内のハロゲン原子数は0個又は1個が好ましい。 The number of halogen atoms in the molecule is preferably 0 or 1.
 一般式(L)で表される化合物は一般式(L-1)~(L-7)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (L) is preferably a compound selected from the group of compounds represented by the general formulas (L-1) to (L-7).
 一般式(L-1)で表される化合物は下記の化合物である。 The compound represented by the general formula (L-1) is the following compound.
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
(式中、RL11及びRL12はそれぞれ独立して、一般式(L)におけるRL1及びRL2と同じ意味を表す。)
 RL11及びRL12は、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。
(In the formula, R L11 and R L12 each independently represent the same meaning as R L1 and R L2 in the general formula (L).)
R L11 and R L12 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
 一般式(L-1)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (L-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 好ましい含有量の下限値は、本発明の組成物の総量に対して、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、15%であり、20%であり、25%であり、30%であり、35%であり、40%であり、45%であり、50%であり、55%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、95%であり、90%であり、85%であり、80%であり、75%であり、70%であり、65%であり、60%であり、55%であり、50%であり、45%であり、40%であり、35%であり、30%であり、25%である。 The lower limit of the preferable content is 1%, 2%, 3%, 5%, 7%, 10%, and 15% with respect to the total amount of the composition of the present invention. %, 20%, 25%, 30%, 35%, 40%, 45%, 50%, and 55%. The upper limit of the preferable content is 95%, 90%, 85%, 80%, 75%, 70%, 65%, based on the total amount of the composition of the present invention. %, 60%, 55%, 50%, 45%, 40%, 35%, 30%, 25%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値が高く上限値が高いことが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値が中庸で上限値が中庸であることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値が低く上限値が低いことが好ましい。 When the viscosity of the composition of the present invention is kept low and a composition having a high response speed is required, the above lower limit value is preferably high and the upper limit value is preferably high. Furthermore, when the composition of the present invention requires a high Tni and a composition having good temperature stability, it is preferable that the lower limit value is moderate and the upper limit value is moderate. When it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the lower limit value is low and the upper limit value is low.
 一般式(L-1)で表される化合物は一般式(L-1-1)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (L-1) is preferably a compound selected from the group of compounds represented by the general formula (L-1-1).
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
(式中RL12は一般式(L-1)における意味と同じ意味を表す。)
 一般式(L-1-1)で表される化合物は、式(L-1-1.1)から式(L-1-1.3)で表される化合物群から選ばれる化合物であることが好ましく、式(L-1-1.2)又は式(L-1-1.3)で表される化合物であることが好ましく、特に、式(L-1-1.3)で表される化合物であることが好ましい。
(Wherein R L12 represents the same meaning as in general formula (L-1).)
The compound represented by the general formula (L-1-1) is a compound selected from the group of compounds represented by the formula (L-1-1.1) to the formula (L-1-1.3). And is preferably a compound represented by formula (L-1-1.2) or formula (L-1-1.3), and particularly represented by formula (L-1-1.3). It is preferable that it is a compound.
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044
 本発明の組成物の総量に対しての式(L-1-1.3)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The lower limit of the preferable content of the compound represented by the formula (L-1-1.3) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, and 10%. The upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
 一般式(L-1)で表される化合物は一般式(L-1-2)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (L-1) is preferably a compound selected from the group of compounds represented by the general formula (L-1-2).
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
(式中RL12は一般式(L-1)における意味と同じ意味を表す。)
 本発明の組成物の総量に対しての式(L-1-2)で表される化合物の好ましい含有量の下限値は、1%であり、5%であり、10%であり、15%であり、17%であり、20%であり、23%であり、25%であり、27%であり、30%であり、35%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、60%であり、55%であり、50%であり、45%であり、42%であり、40%であり、38%であり、35%であり、33%であり、30%である。
(Wherein R L12 represents the same meaning as in general formula (L-1).)
The lower limit of the preferable content of the compound represented by the formula (L-1-2) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 15% 17%, 20%, 23%, 25%, 27%, 30%, 35%. The upper limit of the preferable content is 60%, 55%, 50%, 45%, 42%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 33%, and 30%.
 さらに、一般式(L-1-2)で表される化合物は、式(L-1-2.1)から式(L-1-2.4)で表される化合物群から選ばれる化合物であることが好ましく、式(L-1-2.2)から式(L-1-2.4)で表される化合物であることが好ましい。特に、式(L-1-2.2)で表される化合物は本発明の組成物の応答速度を特に改善するため好ましい。また、応答速度よりも高いTniを求めるときは、式(L-1-2.3)又は式(L-1-2.4)で表される化合物を用いることが好ましい。式(L-1-2.3)及び式(L-1-2.4)で表される化合物の含有量は、低温での溶解度を良くするために30%以上にすることは好ましくない。 Further, the compound represented by the general formula (L-1-2) is a compound selected from the group of compounds represented by the formula (L-1-2.1) to the formula (L-1-2.4). Preferably, it is a compound represented by the formula (L-1-2.2) to the formula (L-1-2.4). In particular, the compound represented by the formula (L-1-2.2) is preferable because the response speed of the composition of the present invention is particularly improved. When obtaining Tni higher than the response speed, it is preferable to use a compound represented by the formula (L-1-2.3) or the formula (L-1-2.4). The content of the compounds represented by formula (L-1-2.3) and formula (L-1-2.4) is not preferably 30% or more in order to improve the solubility at low temperatures.
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
 本発明の組成物の総量に対しての式(L-1-2.2)で表される化合物の好ましい含有量の下限値は、10%であり、15%であり、18%であり、20%であり、23%であり、25%であり、27%であり、30%であり、33%であり、35%であり、38%であり、40%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、60%であり、55%であり、50%であり、45%であり、43%であり、40%であり、38%であり、35%であり、32%であり、30%であり、27%であり、25%であり、22%である。 The lower limit of the preferable content of the compound represented by the formula (L-1-2.2) with respect to the total amount of the composition of the present invention is 10%, 15%, 18%, 20%, 23%, 25%, 27%, 30%, 33%, 35%, 38%, and 40%. The upper limit of the preferable content is 60%, 55%, 50%, 45%, 43%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 32%, 30%, 27%, 25%, and 22%.
 本発明の組成物の総量に対しての式(L-1-1.3)で表される化合物及び式(L-1-2.2)で表される化合物の合計の好ましい含有量の下限値は、10%であり、15%であり、20%であり、25%であり、27%であり、30%であり、35%であり、40%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、60%であり、55%であり、50%であり、45%であり、43%であり、40%であり、38%であり、35%であり、32%であり、30%であり、27%であり、25%であり、22%である。 The lower limit of the preferable total content of the compound represented by the formula (L-1-1.3) and the compound represented by the formula (L-1-2.2) with respect to the total amount of the composition of the present invention The values are 10%, 15%, 20%, 25%, 27%, 30%, 35% and 40%. The upper limit of the preferable content is 60%, 55%, 50%, 45%, 43%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 32%, 30%, 27%, 25%, and 22%.
 一般式(L-1)で表される化合物は一般式(L-1-3)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (L-1) is preferably a compound selected from the group of compounds represented by the general formula (L-1-3).
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
(式中RL13及びRL14はそれぞれ独立して炭素原子数1~8のアルキル基又は炭素原子数1~8のアルコキシ基を表す。)
 RL13及びRL14は、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。
(Wherein R L13 and R L14 each independently represents an alkyl group having 1 to 8 carbon atoms or an alkoxy group having 1 to 8 carbon atoms.)
R L13 and R L14 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
 本発明の組成物の総量に対しての式(L-1-3)で表される化合物の好ましい含有量の下限値は、1%であり、5%であり、10%であり、13%であり、15%であり、17%であり、20%であり、23%であり、25%であり、30%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、60%であり、55%であり、50%であり、45%であり、40%であり、37%であり、35%であり、33%であり、30%であり、27%であり、25%であり、23%であり、20%であり、17%であり、15%であり、13%であり、10%である。
さらに、一般式(L-1-3)で表される化合物は、式(L-1-3.1)から式(L-1-3.12)で表される化合物群から選ばれる化合物であることが好ましく、式(L-1-3.1)、式(L-1-3.3)又は式(L-1-3.4)で表される化合物であることが好ましい。特に、式(L-1-3.1)で表される化合物は本発明の組成物の応答速度を特に改善するため好ましい。また、応答速度よりも高いTniを求めるときは、式(L-1-3.3)、式(L-1-3.4)、式(L-1-3.11)及び式(L-1-3.12)で表される化合物を用いることが好ましい。式(L-1-3.3)、式(L-1-3.4)、式(L-1-3.11)及び式(L-1-3.12)で表される化合物の合計の含有量は、低温での溶解度を良くするために20%以上にすることは好ましくない。
The lower limit of the preferable content of the compound represented by the formula (L-1-3) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%, 23%, 25%, 30%. The upper limit of the preferable content is 60%, 55%, 50%, 45%, 40%, 37%, and 35% with respect to the total amount of the composition of the present invention. %, 33%, 30%, 27%, 25%, 23%, 23%, 20%, 17%, 15%, 13%, 10% %.
Further, the compound represented by the general formula (L-1-3) is a compound selected from the group of compounds represented by the formula (L-1-3.1) to the formula (L-1-3.12). Preferably, it is a compound represented by formula (L-1-3.1), formula (L-1-3.3) or formula (L-1-3.4). In particular, the compound represented by the formula (L-1-3.1) is preferable because the response speed of the composition of the present invention is particularly improved. Further, when obtaining Tni higher than the response speed, the equation (L-1-3.3), the equation (L-1-3.4), the equation (L-1-3.11), and the equation (L− It is preferable to use a compound represented by 1-3.12). Sum of compounds represented by formula (L-1-3.3), formula (L-1-3.4), formula (L-1-3.11) and formula (L-1-3.12) The content of is not preferably 20% or more in order to improve the solubility at low temperatures.
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
 本発明の組成物の総量に対しての式(L-1-3.1)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、17%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%である。 The lower limit of the preferable content of the compound represented by the formula (L-1-3.1) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferable content is 20%, 17%, 15%, 13%, 10%, 8%, and 7% with respect to the total amount of the composition of the present invention. % And 6%.
 一般式(L-1)で表される化合物は一般式(L-1-4)及び/又は(L-1-5)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (L-1) is preferably a compound selected from the group of compounds represented by the general formula (L-1-4) and / or (L-1-5).
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
(式中RL15及びRL16はそれぞれ独立して炭素原子数1~8のアルキル基又は炭素原子数1~8のアルコキシ基を表す。)
 RL15及びRL16は、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。
(In the formula, R L15 and R L16 each independently represent an alkyl group having 1 to 8 carbon atoms or an alkoxy group having 1 to 8 carbon atoms.)
R L15 and R L16 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
 本発明の組成物の総量に対しての式(L-1-4)で表される化合物の好ましい含有量の下限値は、1%であり、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、25%であり、23%であり、20%であり、17%であり、15%であり、13%であり、10%である。 The lower limit of the preferable content of the compound represented by the formula (L-1-4) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%. The upper limit of the preferable content is 25%, 23%, 20%, 17%, 15%, 13%, and 10% with respect to the total amount of the composition of the present invention. %.
 本発明の組成物の総量に対しての式(L-1-5)で表される化合物の好ましい含有量の下限値は、1%であり、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、25%であり、23%であり、20%であり、17%であり、15%であり、13%であり、10%である。 The lower limit of the preferable content of the compound represented by the formula (L-1-5) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%. The upper limit of the preferable content is 25%, 23%, 20%, 17%, 15%, 13%, and 10% with respect to the total amount of the composition of the present invention. %.
 さらに、一般式(L-1-4)及び(L-1-5)で表される化合物は、式(L-1-4.1)から式(L-1-5.3)で表される化合物群から選ばれる化合物であることが好ましく、式(L-1-4.2)又は式(L-1-5.2)で表される化合物であることが好ましい。 Furthermore, the compounds represented by the general formulas (L-1-4) and (L-1-5) are represented by the formulas (L-1-4.1) to (L-1-5.3). And a compound represented by the formula (L-1-4.2) or the formula (L-1-5.2) is preferable.
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
 本発明の組成物の総量に対しての式(L-1-4.2)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、17%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%である。 The lower limit of the preferable content of the compound represented by the formula (L-1-4.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferable content is 20%, 17%, 15%, 13%, 10%, 8%, and 7% with respect to the total amount of the composition of the present invention. % And 6%.
 式(L-1-1.3)、式(L-1-2.2)、式(L-1-3.1)、式(L-1-3.3)、式(L-1-3.4)、式(L-1-3.11)及び式(L-1-3.12)で表される化合物から選ばれる2種以上の化合物を組み合わせることが好ましく、式(L-1-1.3)、式(L-1-2.2)、式(L-1-3.1)、式(L-1-3.3)、式(L-1-3.4)及び式(L-1-4.2)で表される化合物から選ばれる2種以上の化合物を組み合わせることが好ましく、これら化合物の合計の含有量の好ましい含有量の下限値は、本発明の組成物の総量に対して、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、13%であり、15%であり、18%であり、20%であり、23%であり、25%であり、27%であり、30%であり、33%であり、35%であり、上限値は、本発明の組成物の総量に対して、80%であり、70%であり、60%であり、50%であり、45%であり、40%であり、37%であり、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%である。組成物の信頼性を重視する場合には、式(L-1-3.1)、式(L-1-3.3)及び式(L-1-3.4))で表される化合物から選ばれる2種以上の化合物を組み合わせることが好ましく、組成物の応答速度を重視する場合には、式(L-1-1.3)、式(L-1-2.2)で表される化合物から選ばれる2種以上の化合物を組み合わせることが好ましい。 Formula (L-1-1.3), Formula (L-1-2.2), Formula (L-1-3.1), Formula (L-1-3.3), Formula (L-1- 3.4), it is preferable to combine two or more compounds selected from the compounds represented by formula (L-1-3.11) and formula (L-1-3.12). -1.3), formula (L-1-2.2), formula (L-1-3.1), formula (L-1-3.3), formula (L-1-3.4) and It is preferable to combine two or more compounds selected from the compounds represented by formula (L-1-4.2), and the lower limit of the preferable content of the total content of these compounds is the composition of the present invention. 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18% of the total amount 20% and 23% 25%, 27%, 30%, 33%, 35%, and the upper limit is 80% and 70% with respect to the total amount of the composition of the present invention, 60%, 50%, 45%, 40%, 37%, 35%, 33%, 30%, 28%, 25%, 23% and 20%. When emphasizing the reliability of the composition, compounds represented by formula (L-1-3.1), formula (L-1-3.3) and formula (L-1-3.4)) It is preferable to combine two or more compounds selected from the group consisting of formulas (L-1-1.3) and (L-1-2.2) when the response speed of the composition is important. It is preferable to combine two or more compounds selected from the following compounds.
 一般式(L-2)で表される化合物は下記の化合物である。 The compound represented by the general formula (L-2) is the following compound.
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051
(式中、RL21及びRL22はそれぞれ独立して、一般式(L)におけるRL1及びRL2と同じ意味を表す。)
 RL21は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、RL22は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましい。
(In the formula, R L21 and R L22 each independently represent the same meaning as R L1 and R L2 in the general formula (L).)
R L21 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and R L22 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom. An alkoxy group of 1 to 4 is preferable.
 一般式(L-1)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (L-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、反対に、応答速度を重視する場合は含有量を少なめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 When emphasizing solubility at low temperatures, it is highly effective to set a large amount of content. Conversely, when emphasizing response speed, setting a small amount of content is highly effective. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(L-2)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The lower limit of the preferable content of the compound represented by the formula (L-2) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7% and 10%. The upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
 さらに、一般式(L-2)で表される化合物は、式(L-2.1)から式(L-2.6)で表される化合物群から選ばれる化合物であることが好ましく、式(L-2.1)、式(L-2.3)、式(L-2.4)及び式(L-2.6)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (L-2) is preferably a compound selected from the group of compounds represented by the formulas (L-2.1) to (L-2.6). A compound represented by formula (L-2.1), formula (L-2.3), formula (L-2.4) and formula (L-2.6) is preferred.
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052
 一般式(L-3)で表される化合物は下記の化合物である。 The compound represented by the general formula (L-3) is the following compound.
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000053
(式中、RL31及びRL32はそれぞれ独立して、一般式(L)におけるRL1及びRL2と同じ意味を表す。)
 RL31及びRL32はそれぞれ独立して炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましい。
(In the formula, R L31 and R L32 each independently represent the same meaning as R L1 and R L2 in General Formula (L).)
R L31 and R L32 are each independently preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms.
 一般式(L-3)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (L-3) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 本発明の組成物の総量に対しての式(L-3)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The lower limit of the preferable content of the compound represented by the formula (L-3) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7% and 10%. The upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
 高い複屈折率を得る場合は含有量を多めに設定すると効果が高く、反対に、高いTniを重視する場合は含有量を少なめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 When a high birefringence is obtained, the effect is high when the content is set to be large. On the other hand, when high Tni is emphasized, the effect is high when the content is set low. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 さらに、一般式(L-3)で表される化合物は、式(L-3.1)から式(L-3.4)で表される化合物群から選ばれる化合物であることが好ましく、式(L-3.2)から式(L-3.7)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (L-3) is preferably a compound selected from the group of compounds represented by the formulas (L-3.1) to (L-3.4). A compound represented by the formula (L-3.7) from (L-3.2) is preferable.
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054
 一般式(L-4)で表される化合物は下記の化合物である。 The compound represented by the general formula (L-4) is the following compound.
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000055
(式中、RL41及びRL42はそれぞれ独立して、一般式(L)におけるRL1及びRL2と同じ意味を表す。)
 RL41は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、RL42は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましい。)
 一般式(L-4)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。
(In the formula, R L41 and R L42 each independently represent the same meaning as R L1 and R L2 in General Formula (L).)
R L41 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and R L42 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom. An alkoxy group of 1 to 4 is preferable. )
The compound represented by the general formula (L-4) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 本発明の組成物において、一般式(L-4)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、複屈折率、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (L-4) is low-temperature solubility, transition temperature, electrical reliability, birefringence, process compatibility, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
 本発明の組成物の総量に対しての式(L-4)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、14%であり、16%であり、20%であり、23%であり、26%であり、30%であり、35%であり、40%である。本発明の組成物の総量に対しての式(L-4)で表される化合物の好ましい含有量の上限値は、50%であり、40%であり、35%であり、30%であり、20%であり、15%であり、10%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (L-4) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% . The upper limit of the preferable content of the compound represented by the formula (L-4) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, and 30%. 20%, 15%, 10%, 5%.
 一般式(L-4)で表される化合物は、例えば式(L-4.1)から式(L-4.3)で表される化合物であることが好ましい。 The compound represented by general formula (L-4) is preferably a compound represented by formula (L-4.1) to formula (L-4.3), for example.
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000056
 低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて、式(L-4.1)で表される化合物を含有していても、式(L-4.2)で表される化合物を含有していても、式(L-4.1)で表される化合物と式(L-4.2)で表される化合物との両方を含有していても良いし、式(L-4.1)から式(L-4.3)で表される化合物を全て含んでいても良い。本発明の組成物の総量に対しての式(L-4.1)又は式(L-4.2)で表される化合物の好ましい含有量の下限値は、3%であり、5%であり、7%であり、9%であり、11%であり、12%であり、13%であり、18%であり、21%であり、好ましい上限値は、45であり、40%であり、35%であり、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 Depending on the required performance such as solubility at low temperature, transition temperature, electrical reliability, and birefringence, even if the compound represented by the formula (L-4.1) is contained, the formula (L -4.2) Even if it contains a compound represented by formula (L-4.1), it contains both a compound represented by formula (L-4.1) and a compound represented by formula (L-4.2). Or all of the compounds represented by formulas (L-4.1) to (L-4.3) may be included. The lower limit of the preferable content of the compound represented by formula (L-4.1) or formula (L-4.2) with respect to the total amount of the composition of the present invention is 3%, Yes, 7%, 9%, 11%, 12%, 13%, 18%, 21%, and the preferred upper limit is 45, 40% , 35%, 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% .
 式(L-4.1)で表される化合物と式(L-4.2)で表される化合物との両方を含有する場合は、本発明の組成物の総量に対しての両化合物の好ましい含有量の下限値は、15%であり、19%であり、24%であり、30%であり、好ましい上限値は、45であり、40%であり、35%であり、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 When both the compound represented by formula (L-4.1) and the compound represented by formula (L-4.2) are contained, the amount of both compounds relative to the total amount of the composition of the present invention is The lower limit of the preferred content is 15%, 19%, 24%, and 30%, and the preferred upper limit is 45, 40%, 35%, and 30%. Yes, 25%, 23%, 20%, 18%, 15%, 13%.
 一般式(L-4)で表される化合物は、例えば式(L-4.4)から式(L-4.6)で表される化合物であることが好ましく、式(L-4.4)で表される化合物であることが好ましい。 The compound represented by the general formula (L-4) is preferably, for example, a compound represented by the formula (L-4.4) to the formula (L-4.6). It is preferable that it is a compound represented by this.
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057
 低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて、式(L-4.4)で表される化合物を含有していても、式(L-4.5)で表される化合物を含有していても、式(L-4.4)で表される化合物と式(L-4.5)で表される化合物との両方を含有していても良い。 Depending on the required performance such as solubility at low temperature, transition temperature, electrical reliability, birefringence and the like, even if the compound represented by the formula (L-4.4) is contained, the formula (L -4.5) contains both the compound represented by formula (L-4.4) and the compound represented by formula (L-4.5). May be.
 本発明の組成物の総量に対しての式(L-4.4)又は式(L-4.5)で表される化合物の好ましい含有量の下限値は、3%であり、5%であり、7%であり、9%であり、11%であり、12%であり、13%であり、18%であり、21%である。好ましい上限値は、45であり、40%であり、35%であり、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 The lower limit of the preferable content of the compound represented by the formula (L-4.4) or the formula (L-4.5) with respect to the total amount of the composition of the present invention is 3%, Yes, 7%, 9%, 11%, 12%, 13%, 18%, 21%. Preferred upper limit values are 45, 40%, 35%, 30%, 25%, 23%, 20%, 18%, 15%, 13% %, 10%, and 8%.
 式(L-4.4)で表される化合物と式(L-4.5)で表される化合物との両方を含有する場合は、本発明の組成物の総量に対しての両化合物の好ましい含有量の下限値は、15%であり、19%であり、24%であり、30%であり、好ましい上限値は、45であり、40%であり、35%であり、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 When both the compound represented by the formula (L-4.4) and the compound represented by the formula (L-4.5) are contained, the amount of both compounds relative to the total amount of the composition of the present invention is The lower limit of the preferred content is 15%, 19%, 24%, and 30%, and the preferred upper limit is 45, 40%, 35%, and 30%. Yes, 25%, 23%, 20%, 18%, 15%, 13%.
 一般式(L-4)で表される化合物は、式(L-4.7)から式(L-4.10)で表される化合物であることが好ましく、特に、式(L-4.9)で表される化合物が好ましい。 The compound represented by the general formula (L-4) is preferably a compound represented by the formula (L-4.7) to the formula (L-4.10), and particularly the formula (L-4. The compound represented by 9) is preferred.
Figure JPOXMLDOC01-appb-C000058
Figure JPOXMLDOC01-appb-C000058
 一般式(L-5)で表される化合物は下記の化合物である。 The compound represented by the general formula (L-5) is the following compound.
Figure JPOXMLDOC01-appb-C000059
Figure JPOXMLDOC01-appb-C000059
(式中、RL51及びRL52はそれぞれ独立して、一般式(L)におけるRL1及びRL2と同じ意味を表す。)
 RL51は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、RL52は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましい。
(In the formula, R L51 and R L52 each independently represent the same meaning as R L1 and R L2 in the general formula (L).)
R L51 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and R L52 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom. An alkoxy group of 1 to 4 is preferable.
 一般式(L-5)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (L-5) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 本発明の組成物において、一般式(L-5)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、複屈折率、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (L-5) includes solubility at low temperature, transition temperature, electrical reliability, birefringence index, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
 本発明の組成物の総量に対しての式(L-5)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、14%であり、16%であり、20%であり、23%であり、26%であり、30%であり、35%であり、40%である。本発明の組成物の総量に対しての式(L-5)で表される化合物の好ましい含有量の上限値は、50%であり、40%であり、35%であり、30%であり、20%であり、15%であり、10%であり、5%である
 一般式(L-5)で表される化合物は、式(L-5.1)又は式(L-5.2)で表される化合物であることが好ましく、特に、式(L-5.1)で表される化合物であることが好ましい。
The lower limit of the preferable content of the compound represented by the formula (L-5) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% . The upper limit of the preferable content of the compound represented by the formula (L-5) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, and 30%. , 20%, 15%, 10%, 5% The compound represented by the general formula (L-5) is represented by the formula (L-5.1) or the formula (L-5.2). The compound represented by formula (L-5.1) is particularly desirable.
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%である。これら化合物の好ましい含有量の上限値は、20%であり、15%であり、13%であり、10%であり、9%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%. The upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
Figure JPOXMLDOC01-appb-C000060
Figure JPOXMLDOC01-appb-C000060
 一般式(L-5)で表される化合物は、式(L-5.3)又は式(L-5.4)で表される化合物であることが好ましい。 The compound represented by the general formula (L-5) is preferably a compound represented by the formula (L-5.3) or the formula (L-5.4).
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%である。これら化合物の好ましい含有量の上限値は、20%であり、15%であり、13%であり、10%であり、9%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%. The upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
Figure JPOXMLDOC01-appb-C000061
Figure JPOXMLDOC01-appb-C000061
 一般式(L-5)で表される化合物は、式(L-5.5)から式(L-5.7)で表される化合物群から選ばれる化合物であることが好ましく、特に式(L-5.7)で表される化合物であることが好ましい。 The compound represented by the general formula (L-5) is preferably a compound selected from the group of compounds represented by the formulas (L-5.5) to (L-5.7). The compound represented by L-5.7) is preferred.
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%である。これら化合物の好ましい含有量の上限値は、20%であり、15%であり、13%であり、10%であり、9%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%. The upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
Figure JPOXMLDOC01-appb-C000062
Figure JPOXMLDOC01-appb-C000062
 一般式(L-6)で表される化合物は下記の化合物である。 The compound represented by the general formula (L-6) is the following compound.
Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000063
(式中、RL61及びRL62はそれぞれ独立して、一般式(L)におけるRL1及びRL2と同じ意味を表し、XL61及びXL62はそれぞれ独立して水素原子又はフッ素原子を表す。)
 RL61及びRL62はそれぞれ独立して炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、XL61及びXL62のうち一方がフッ素原子他方が水素原子であることが好ましい。
(In the formula, R L61 and R L62 each independently represent the same meaning as R L1 and R L2 in the general formula (L), and X L61 and X L62 each independently represent a hydrogen atom or a fluorine atom. )
R L61 and R L62 are each independently preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and one of X L61 and X L62 is a fluorine atom and the other is a hydrogen atom. Is preferred.
 一般式(L-6)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (L-6) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required properties such as solubility at low temperatures, transition temperatures, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 本発明の組成物の総量に対しての式(L-6)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、14%であり、16%であり、20%であり、23%であり、26%であり、30%であり、35%であり、40%である。本発明の組成物の総量に対しての式(L-6)で表される化合物の好ましい含有量の上限値は、50%であり、40%であり、35%であり、30%であり、20%であり、15%であり、10%であり、5%である。Δnを大きくすることに重点を置く場合には含有量を多くした方が好ましく、低温での析出に重点を置いた場合には含有量は少ない方が好ましい。 The lower limit of the preferable content of the compound represented by the formula (L-6) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% . The upper limit of the preferable content of the compound represented by the formula (L-6) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, and 30%. 20%, 15%, 10%, 5%. When emphasizing to increase Δn, it is preferable to increase the content, and when emphasizing the precipitation at low temperature, it is preferable to decrease the content.
 一般式(L-6)で表される化合物は、式(L-6.1)から式(L-6.9)で表される化合物であることが好ましい。 The compound represented by the general formula (L-6) is preferably a compound represented by the formula (L-6.1) to the formula (L-6.9).
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000064
 組み合わせることができる化合物の種類に特に制限は無いが、これらの化合物の中から1種~3種類含有することが好ましく、1種~4種類含有することがさらに好ましい。また、選ぶ化合物の分子量分布が広いことも溶解性に有効であるため、例えば、式(L-6.1)又は(L-6.2)で表される化合物から1種類、式(L-6.4)又は(L-6.5)で表される化合物から1種類、式(L-6.6)又は式(L-6.7)で表される化合物から1種類、式(L-6.8)又は(L-6.9)で表される化合物から1種類の化合物を選び、これらを適宜組み合わせることが好ましい。その中でも、式(L-6.1)、式(L-6.3)式(L-6.4)、式(L-6.6)及び式(L-6.9)で表される化合物を含むことが好ましい。 There are no particular restrictions on the types of compounds that can be combined, but 1 to 3 types of these compounds are preferably contained, more preferably 1 to 4 types. Further, since the wide molecular weight distribution of the selected compound is also effective for the solubility, for example, one type of the compound represented by the formula (L-6.1) or (L-6.2), the formula (L- 6.4) or one type from the compound represented by (L-6.5), one type from the compound represented by formula (L-6.6) or formula (L-6.7), It is preferable to select one compound from the compounds represented by -6.8) or (L-6.9) and combine them as appropriate. Among them, represented by formula (L-6.1), formula (L-6.3), formula (L-6.4), formula (L-6.6) and formula (L-6.9). It is preferable to include a compound.
 さらに、一般式(L-6)で表される化合物は、例えば式(L-6.10)から式(L-6.17)で表される化合物であることが好ましく、その中でも、式(L-6.11)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (L-6) is preferably, for example, a compound represented by the formula (L-6.10) to the formula (L-6.17). A compound represented by L-6.11) is preferable.
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000065
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%である。これら化合物の好ましい含有量の上限値は、20%であり、15%であり、13%であり、10%であり、9%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%. The upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
 一般式(L-7)で表される化合物は下記の化合物である。 The compound represented by the general formula (L-7) is the following compound.
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000066
(式中、RL71及びRL72はそれぞれ独立して一般式(L)におけるRL1及びRL2と同じ意味を表し、AL71及びAL72はそれぞれ独立して一般式(L)におけるAL2及びAL3と同じ意味を表すが、AL71及びAL72上の水素原子はそれぞれ独立してフッ素原子によって置換されていてもよく、ZL71は一般式(L)におけるZL2と同じ意味を表し、XL71及びXL72はそれぞれ独立してフッ素原子又は水素原子を表す。)
 式中、RL71及びRL72はそれぞれ独立して炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、AL71及びAL72はそれぞれ独立して1,4-シクロヘキシレン基又は1,4-フェニレン基が好ましく、AL71及びAL72上の水素原子はそれぞれ独立してフッ素原子によって置換されていてもよく、ZL71は単結合又はCOO-が好ましく、単結合が好ましく、XL71及びXL72は水素原子が好ましい。
(Wherein, R L71 and R L72 each independently represent the same meaning as R L1 and R L2 in Formula (L), A L71 and A L72 is A L2 and in the general formula (L) independently A L3 represents the same meaning, but the hydrogen atoms on A L71 and A L72 may be each independently substituted with a fluorine atom, Z L71 represents the same meaning as Z L2 in formula (L), X L71 and X L72 each independently represent a fluorine atom or a hydrogen atom.)
In the formula, R L71 and R L72 are each independently preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and A L71 and A L72 Are each independently preferably a 1,4-cyclohexylene group or a 1,4-phenylene group, the hydrogen atoms on A L71 and A L72 may be each independently substituted with a fluorine atom, and Z L71 is a single group. A bond or COO- is preferable, a single bond is preferable, and X L71 and X L72 are preferably a hydrogen atom.
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、複屈折率などの求められる性能に応じて組み合わせる。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類である。 There are no particular restrictions on the types of compounds that can be combined, but they are combined according to the required performance, such as solubility at low temperatures, transition temperature, electrical reliability, and birefringence. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, and four kinds.
 本発明の組成物において、一般式(L-7)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、複屈折率、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (L-7) includes solubility at low temperature, transition temperature, electrical reliability, birefringence index, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
 本発明の組成物の総量に対しての式(L-7)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、14%であり、16%であり、20%である。本発明の組成物の総量に対しての式(L-7)で表される化合物の好ましい含有量の上限値は、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、10%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (L-7) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%. The upper limit of the preferable content of the compound represented by the formula (L-7) with respect to the total amount of the composition of the present invention is 30%, 25%, 23%, and 20%. 18%, 15%, 10%, 5%.
 本発明の組成物が高いTniの実施形態が望まれる場合は式(L-7)で表される化合物の含有量を多めにすることが好ましく、低粘度の実施形態が望まれる場合は含有量を少なめにすることが好ましい。 When an embodiment with high Tni is desired for the composition of the present invention, the content of the compound represented by formula (L-7) is preferably increased, and when an embodiment with low viscosity is desired, the content is It is preferable to reduce the amount.
 さらに、一般式(L-7)で表される化合物は、式(L-7.1)から式(L-7.4)で表される化合物であることが好ましく、式(L-7.2)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (L-7) is preferably a compound represented by the formula (L-7.1) to the formula (L-7.4), and the formula (L-7. It is preferable that it is a compound represented by 2).
Figure JPOXMLDOC01-appb-C000067
Figure JPOXMLDOC01-appb-C000067
 さらに、一般式(L-7)で表される化合物は、式(L-7.11)から式(L-7.13)で表される化合物であることが好ましく、式(L-7.11)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (L-7) is preferably a compound represented by the formula (L-7.11) to the formula (L-7.13). It is preferable that it is a compound represented by 11).
Figure JPOXMLDOC01-appb-C000068
Figure JPOXMLDOC01-appb-C000068
 さらに、一般式(L-7)で表される化合物は、式(L-7.21)から式(L-7.23)で表される化合物である。式(L-7.21)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (L-7) is a compound represented by the formula (L-7.21) to the formula (L-7.23). A compound represented by formula (L-7.21) is preferable.
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000069
 さらに、一般式(L-7)で表される化合物は、式(L-7.31)から式(L-7.34)で表される化合物であることが好ましく、式(L-7.31)又は/及び式(L-7.32)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (L-7) is preferably a compound represented by the formula (L-7.31) to the formula (L-7.34), and the formula (L-7. 31) or / and a compound represented by the formula (L-7.32).
Figure JPOXMLDOC01-appb-C000070
Figure JPOXMLDOC01-appb-C000070
 さらに、一般式(L-7)で表される化合物は、式(L-7.41)から式(L-7.44)で表される化合物であることが好ましく、式(L-7.41)又は/及び式(L-7.42)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (L-7) is preferably a compound represented by the formula (L-7.41) to the formula (L-7.44), and the formula (L-7. 41) or / and a compound represented by formula (L-7.42).
Figure JPOXMLDOC01-appb-C000071
Figure JPOXMLDOC01-appb-C000071
 本発明の組成物の総量に対しての一般式(i)、一般式(L)及び(N)で表される化合物の合計の好ましい含有量の下限値は、80%であり、85%であり、88%であり、90%であり、92%であり、93%であり、94%であり、95%であり、96%であり、97%であり、98%であり、99%であり、100%である。好ましい含有量の上限値は、100%であり、99%であり、98%であり、95%である。 The lower limit of the preferable total content of the compounds represented by the general formulas (i), (L) and (N) with respect to the total amount of the composition of the present invention is 80% and 85%. Yes, 88%, 90%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99% Yes, 100%. The upper limit of the preferable content is 100%, 99%, 98%, and 95%.
 本発明の組成物の総量に対しての一般式(i)、一般式(L-1)から(L-7)及び(M-1)から(M-8)で表される化合物の合計の好ましい含有量の下限値は、80%であり、85%であり、88%であり、90%であり、92%であり、93%であり、94%であり、95%であり、96%であり、97%であり、98%であり、99%であり、100%である。好ましい含有量の上限値は、100%であり、99%であり、98%であり、95%である。 The total of the compounds represented by general formula (i), general formula (L-1) to (L-7) and (M-1) to (M-8) with respect to the total amount of the composition of the present invention The lower limit of the preferable content is 80%, 85%, 88%, 90%, 92%, 93%, 94%, 95%, 96% 97%, 98%, 99%, 100%. The upper limit of the preferable content is 100%, 99%, 98%, and 95%.
 本願発明の組成物は、分子内に過酸(-CO-OO-)構造等の酸素原子同士が結合した構造を持つ化合物を含有しないことが好ましい。 The composition of the present invention preferably does not contain a compound having a structure in which oxygen atoms such as a peracid (—CO—OO—) structure are bonded in the molecule.
 組成物の信頼性及び長期安定性を重視する場合にはカルボニル基を有する化合物の含有量を前記組成物の総質量に対して5%以下とすることが好ましく、3%以下とすることがより好ましく、1%以下とすることが更に好ましく、実質的に含有しないことが最も好ましい。 When emphasizing the reliability and long-term stability of the composition, the content of the compound having a carbonyl group is preferably 5% or less, more preferably 3% or less with respect to the total mass of the composition. Preferably, it is more preferably 1% or less, and most preferably not substantially contained.
 UV照射による安定性を重視する場合、塩素原子が置換している化合物の含有量を前記組成物の総質量に対して15%以下とすることが好ましく、10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。 When importance is attached to the stability by UV irradiation, the content of the compound substituted with chlorine atoms is preferably 15% or less, preferably 10% or less, based on the total mass of the composition. % Or less, preferably 5% or less, more preferably 3% or less, and still more preferably substantially not contained.
 分子内の環構造がすべて6員環である化合物の含有量を多くすることが好ましく、分子内の環構造がすべて6員環である化合物の含有量を前記組成物の総質量に対して80%以上とすることが好ましく、90%以上とすることがより好ましく、95%以上とすることが更に好ましく、実質的に分子内の環構造がすべて6員環である化合物のみで組成物を構成することが最も好ましい。 It is preferable to increase the content of a compound in which all the ring structures in the molecule are 6-membered rings, and the content of the compound in which all the ring structures in the molecule are 6-membered rings is 80% relative to the total mass of the composition. % Or more, more preferably 90% or more, still more preferably 95% or more, and the composition is composed only of a compound in which all of the ring structures in the molecule are all 6-membered rings. Most preferably.
 組成物の酸化による劣化を抑えるためには、環構造としてシクロヘキセニレン基を有する化合物の含有量を少なくすることが好ましく、シクロヘキセニレン基を有する化合物の含有量を前記組成物の総質量に対して10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。 In order to suppress deterioration due to oxidation of the composition, it is preferable to reduce the content of the compound having a cyclohexenylene group as a ring structure, and the content of the compound having a cyclohexenylene group as the total mass of the composition. On the other hand, it is preferably 10% or less, preferably 8% or less, more preferably 5% or less, preferably 3% or less, and still more preferably not contained.
 粘度の改善及びTniの改善を重視する場合には、水素原子がハロゲンに置換されていてもよい2-メチルベンゼン-1,4-ジイル基を分子内に持つ化合物の含有量を少なくすることが好ましく、前記2-メチルベンゼン-1,4-ジイル基を分子内に持つ化合物の含有量を前記組成物の総質量に対して10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。 When importance is attached to improvement of viscosity and improvement of Tni, the content of a compound having a 2-methylbenzene-1,4-diyl group in the molecule, in which a hydrogen atom may be substituted with a halogen, may be reduced. Preferably, the content of the compound having a 2-methylbenzene-1,4-diyl group in the molecule is preferably 10% or less, more preferably 8% or less, based on the total mass of the composition. It is more preferably 5% or less, further preferably 3% or less, and still more preferably substantially not contained.
 本願において実質的に含有しないとは、意図せずに含有する物を除いて含有しないという意味である。 “Substantially not contained” in the present application means that it is not contained except for an unintentionally contained product.
 本発明の第一実施形態の組成物に含有される化合物が、側鎖としてアルケニル基を有する場合、前記アルケニル基がシクロヘキサンに結合している場合には当該アルケニル基の炭素原子数は2~5であることが好ましく、前記アルケニル基がベンゼンに結合している場合には当該アルケニル基の炭素原子数は4~5であることが好ましく、前記アルケニル基の不飽和結合とベンゼンは直接結合していないことが好ましい。 When the compound contained in the composition of the first embodiment of the present invention has an alkenyl group as a side chain, when the alkenyl group is bonded to cyclohexane, the alkenyl group has 2 to 5 carbon atoms. When the alkenyl group is bonded to benzene, the number of carbon atoms of the alkenyl group is preferably 4 to 5, and the unsaturated bond of the alkenyl group and benzene are directly bonded. Preferably not.
 本発明の組成物には、PSモード、横電界型PSAモード又は横電界型PSVAモードなどの液晶表示素子を作製するために、重合性化合物を含有することができる。使用できる重合性化合物として、光などのエネルギー線により重合が進行する光重合性モノマーなどが挙げられ、構造として、例えば、ビフェニル誘導体、ターフェニル誘導体などの六員環が複数連結した液晶骨格を有する重合性化合物などが挙げられる。更に具体的には、一般式(XX) The composition of the present invention may contain a polymerizable compound in order to produce a liquid crystal display element such as a PS mode, a transverse electric field type PSA mode, or a transverse electric field type PSVA mode. Examples of the polymerizable compound that can be used include a photopolymerizable monomer that undergoes polymerization by energy rays such as light. The structure has, for example, a liquid crystal skeleton in which a plurality of six-membered rings such as biphenyl derivatives and terphenyl derivatives are connected. Examples thereof include a polymerizable compound. More specifically, the general formula (XX)
Figure JPOXMLDOC01-appb-C000072
Figure JPOXMLDOC01-appb-C000072
(式中、X201及びX202はそれぞれ独立して、水素原子又はメチル基を表し、
Sp201及びSp202はそれぞれ独立して、単結合、炭素原子数1~8のアルキレン基又は-O-(CH-(式中、sは2から7の整数を表し、酸素原子は芳香環に結合するものとする。)が好ましく、
201は-OCH-、-CHO-、-COO-、-OCO-、-CFO-、-OCF-、-CHCH-、-CFCF-、-CH=CH-COO-、-CH=CH-OCO-、-COO-CH=CH-、-OCO-CH=CH-、-COO-CHCH-、-OCO-CHCH-、-CHCH-COO-、-CHCH-OCO-、-COO-CH-、-OCO-CH-、-CH-COO-、-CH-OCO-、-CY=CY-(式中、Y及びYはそれぞれ独立して、フッ素原子又は水素原子を表す。)、-C≡C-又は単結合を表し、
201は1,4-フェニレン基、トランス-1,4-シクロヘキシレン基又は単結合を表し、式中の全ての1,4-フェニレン基は、任意の水素原子がフッ素原子により置換されていても良い。)で表される二官能モノマーが好ましい。
(Wherein, X 201 and X 202 each independently represent a hydrogen atom or a methyl group,
Sp 201 and Sp 202 each independently represent a single bond, an alkylene group having 1 to 8 carbon atoms, or —O— (CH 2 ) s — (wherein s represents an integer of 2 to 7, Preferably bonded to an aromatic ring)
Z 201 represents —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —CF 2 O—, —OCF 2 —, —CH 2 CH 2 —, —CF 2 CF 2 —, —CH═ CH—COO—, —CH═CH—OCO—, —COO—CH═CH—, —OCO—CH═CH—, —COO—CH 2 CH 2 —, —OCO—CH 2 CH 2 —, —CH 2 CH 2 —COO—, —CH 2 CH 2 —OCO—, —COO—CH 2 —, —OCO—CH 2 —, —CH 2 —COO—, —CH 2 —OCO—, —CY 1 ═CY 2 — (Wherein Y 1 and Y 2 each independently represents a fluorine atom or a hydrogen atom), —C≡C— or a single bond;
M 201 represents a 1,4-phenylene group, a trans-1,4-cyclohexylene group or a single bond, and all 1,4-phenylene groups in the formula have an arbitrary hydrogen atom substituted with a fluorine atom. Also good. ) Is preferred.
 X201及びX202は、何れも水素原子を表すジアクリレート誘導体、何れもメチル基を有するジメタクリレート誘導体の何れも好ましく、一方が水素原子を表しもう一方がメチル基を表す化合物も好ましい。これらの化合物の重合速度は、ジアクリレート誘導体が最も早く、ジメタクリレート誘導体が遅く、非対称化合物がその中間であり、その用途により好ましい態様を用いることができる。PSA表示素子においては、ジメタクリレート誘導体が特に好ましい。 X 201 and X 202 are each preferably a diacrylate derivative that represents a hydrogen atom, or a dimethacrylate derivative that has a methyl group, and a compound in which one represents a hydrogen atom and the other represents a methyl group. As for the polymerization rate of these compounds, diacrylate derivatives are the fastest, dimethacrylate derivatives are slow, asymmetric compounds are in the middle, and a preferred embodiment can be used depending on the application. In the PSA display element, a dimethacrylate derivative is particularly preferable.
 Sp201及びSp202はそれぞれ独立して、単結合、炭素原子数1~8のアルキレン基又は-O-(CH-を表すが、PSA表示素子においては少なくとも一方が単結合であることが好ましく、共に単結合を表す化合物又は一方が単結合でもう一方が炭素原子数1~8のアルキレン基又は-O-(CH-を表す態様が好ましい。この場合1~4のアルキル基が好ましく、sは1~4が好ましい。 Sp 201 and Sp 202 each independently represent a single bond, an alkylene group having 1 to 8 carbon atoms, or —O— (CH 2 ) s —, but at least one of them is a single bond in a PSA display element. A compound in which both represent a single bond or one in which one represents a single bond and the other represents an alkylene group having 1 to 8 carbon atoms or —O— (CH 2 ) s — is preferable. In this case, 1 to 4 alkyl groups are preferable, and s is preferably 1 to 4.
 Z201は、-OCH-、-CHO-、-COO-、-OCO-、-CFO-、-OCF-、-CHCH-、-CFCF-又は単結合が好ましく、-COO-、-OCO-又は単結合がより好ましく、単結合が特に好ましい。 Z 201 represents —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —CF 2 O—, —OCF 2 —, —CH 2 CH 2 —, —CF 2 CF 2 — or a single bond Are preferred, —COO—, —OCO— or a single bond is more preferred, and a single bond is particularly preferred.
 M201は任意の水素原子がフッ素原子により置換されていても良い1,4-フェニレン基、トランス-1,4-シクロヘキシレン基又は単結合を表すが、1,4-フェニレン基又は単結合が好ましい。Cが単結合以外の環構造を表す場合、Z201は単結合以外の連結基も好ましく、M201が単結合の場合、Z201は単結合が好ましい。 M 201 represents a 1,4-phenylene group, a trans-1,4-cyclohexylene group or a single bond in which any hydrogen atom may be substituted by a fluorine atom, but the 1,4-phenylene group or the single bond is preferable. When C represents a ring structure other than a single bond, Z 201 is preferably a linking group other than a single bond. When M 201 is a single bond, Z 201 is preferably a single bond.
 これらの点から、一般式(XX)において、Sp201及びSp202の間の環構造は、具体的には次に記載する構造が好ましい。 From these points, in the general formula (XX), the ring structure between Sp 201 and Sp 202 is specifically structured as described next are preferred.
 一般式(XX)において、M201が単結合を表し、環構造が二つの環で形成される場合において、次の式(XXa-1)から式(XXa-5)を表すことが好ましく、式(XXa-1)から式(XXa-3)を表すことがより好ましく、式(XXa-1)を表すことが特に好ましい。 In the general formula (XX), when M 201 represents a single bond and the ring structure is formed of two rings, the following formulas (XXa-1) to (XXa-5) are preferably represented, It is more preferable to represent the formula (XXa-3) from (XXa-1), and it is particularly preferable to represent the formula (XXa-1).
Figure JPOXMLDOC01-appb-C000073
Figure JPOXMLDOC01-appb-C000073
(式中、両端はSp201又はSp202に結合するものとする。)
 これらの骨格を含む重合性化合物は重合後の配向規制力がPSA型液晶表示素子に最適であり、良好な配向状態が得られることから、表示ムラが抑制されるか、又は、全く発生しない。
(In the formula, both ends shall be bonded to Sp 201 or Sp 202. )
The polymerizable compounds containing these skeletons are optimal for PSA-type liquid crystal display elements because of the alignment regulating power after polymerization, and a good alignment state can be obtained, so that display unevenness is suppressed or does not occur at all.
 以上のことから、重合性モノマーとしては、一般式(XX-1)~一般式(XX-4)が特に好ましく、中でも一般式(XX-2)が最も好ましい。 From the above, as the polymerizable monomer, general formula (XX-1) to general formula (XX-4) are particularly preferable, and among them, general formula (XX-2) is most preferable.
Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000074
(式中、Sp20は炭素原子数2から5のアルキレン基を表す。)
 本発明の組成物にモノマーを添加する場合において、重合開始剤が存在しない場合でも重合は進行するが、重合を促進するために重合開始剤を含有していてもよい。重合開始剤としては、ベンゾインエーテル類、ベンゾフェノン類、アセトフェノン類、ベンジルケタール類、アシルフォスフィンオキサイド類等が挙げられる。
(In the formula, Sp 20 represents an alkylene group having 2 to 5 carbon atoms.)
In the case of adding a monomer to the composition of the present invention, the polymerization proceeds even when no polymerization initiator is present, but may contain a polymerization initiator in order to accelerate the polymerization. Examples of the polymerization initiator include benzoin ethers, benzophenones, acetophenones, benzyl ketals, acylphosphine oxides, and the like.
 本発明における組成物は、さらに、一般式(Q)で表される化合物を含有することができる。 The composition in the present invention can further contain a compound represented by the general formula (Q).
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000075
(式中、Rは炭素原子数1から22の直鎖アルキル基又は分岐鎖アルキル基を表し、該アルキル基中の1つ又は2つ以上のCH基は、酸素原子が直接隣接しないように、-O-、-CH=CH-、-CO-、-OCO-、-COO-、-C≡C-、-CFO-、-OCF-で置換されてよく、Mはトランス-1,4-シクロへキシレン基、1,4-フェニレン基又は単結合を表す。)
 Rは炭素原子数1から22の直鎖アルキル基又は分岐鎖アルキル基を表し、該アルキル基中の1つ又は2つ以上のCH基は、酸素原子が直接隣接しないように、-O-、-CH=CH-、-CO-、-OCO-、-COO-、-C≡C-、-CFO-、-OCF-で置換されてよいが、炭素原子数1から10の直鎖アルキル基、直鎖アルコキシ基、1つのCH基が-OCO-又は-COO-に置換された直鎖アルキル基、分岐鎖アルキル基、分岐アルコキシ基、1つのCH基が-OCO-又は-COO-に置換された分岐鎖アルキル基が好ましく、炭素原子数1から20の直鎖アルキル基、1つのCH基が-OCO-又は-COO-に置換された直鎖アルキル基、分岐鎖アルキル基、分岐アルコキシ基、1つのCH基が-OCO-又は-COO-に置換された分岐鎖アルキル基が更に好ましい。Mはトランス-1,4-シクロへキシレン基、1,4-フェニレン基又は単結合を表すが、トランス-1,4-シクロへキシレン基又は1,4-フェニレン基が好ましい。
(Wherein, R Q represents a straight-chain alkyl group or branched alkyl group having from 1 22 carbon atoms, one or two or more CH 2 groups in the alkyl group, so that the oxygen atoms are not directly adjacent a, -O -, - CH = CH -, - CO -, - OCO -, - COO -, - C≡C -, - CF 2 O -, - OCF 2 - may be replaced by, M Q is trans Represents a 1,4-cyclohexylene group, a 1,4-phenylene group or a single bond.)
RQ represents a straight-chain alkyl group or a branched-chain alkyl group having 1 to 22 carbon atoms, and one or more CH 2 groups in the alkyl group are —O—so that oxygen atoms are not directly adjacent to each other. —, —CH═CH—, —CO—, —OCO—, —COO—, —C≡C—, —CF 2 O—, —OCF 2 — may be substituted. Linear alkyl group, linear alkoxy group, linear alkyl group in which one CH 2 group is substituted with —OCO— or —COO—, branched alkyl group, branched alkoxy group, one CH 2 group is —OCO— Or a branched alkyl group substituted with —COO—, a linear alkyl group having 1 to 20 carbon atoms, a linear alkyl group in which one CH 2 group is substituted with —OCO— or —COO—, branched Chain alkyl group, branched alkoxy group, one CH 2 group Is more preferably a branched alkyl group substituted with —OCO— or —COO—. MQ represents a trans-1,4-cyclohexylene group, a 1,4-phenylene group or a single bond, and a trans-1,4-cyclohexylene group or a 1,4-phenylene group is preferred.
 一般式(Q)で表される化合物は、より具体的には、下記の一般式(Q-a)から一般式(Q-d)で表される化合物が好ましい。 More specifically, the compound represented by the general formula (Q) is preferably a compound represented by the following general formula (Qa) to general formula (Qd).
Figure JPOXMLDOC01-appb-C000076
Figure JPOXMLDOC01-appb-C000076
式中、RQ1は炭素原子数1から10の直鎖アルキル基又は分岐鎖アルキル基が好ましく、RQ2は炭素原子数1から20の直鎖アルキル基又は分岐鎖アルキル基が好ましく、RQ3は炭素原子数1から8の直鎖アルキル基、分岐鎖アルキル基、直鎖アルコキシ基又は分岐鎖アルコキシ基が好ましく、Lは炭素原子数1から8の直鎖アルキレン基又は分岐鎖アルキレン基が好ましい。一般式(Q-a)から一般式(Q-d)で表される化合物中、一般式(Q-c)及び一般式(Q-d)で表される化合物が更に好ましい。 In the formula, R Q1 is preferably a linear or branched alkyl group having 1 to 10 carbon atoms, R Q2 is preferably a linear or branched alkyl group having 1 to 20 carbon atoms, and R Q3 is A straight-chain alkyl group having 1 to 8 carbon atoms, a branched-chain alkyl group, a straight-chain alkoxy group or a branched-chain alkoxy group is preferred, and L Q is preferably a straight-chain alkylene group or branched-chain alkylene group having 1 to 8 carbon atoms. . Of the compounds represented by general formula (Qa) to general formula (Qd), compounds represented by general formula (Qc) and general formula (Qd) are more preferable.
 本願発明の組成物において、一般式(Q)で表される化合物を1種又は2種を含有することが好ましく、1種から5種含有することが更に好ましく、その含有量は0.001から1%であることが好ましく、0.001から0.1%が更に好ましく、0.001から0.05%が特に好ましい。 In the composition of the present invention, the compound represented by the general formula (Q) preferably contains one or two kinds, more preferably contains 1 to 5 kinds, and the content thereof is from 0.001. It is preferably 1%, more preferably 0.001 to 0.1%, and particularly preferably 0.001 to 0.05%.
 本発明の重合性化合物を含有した組成物は、これに含まれる重合性化合物が紫外線照射により重合することで液晶配向能が付与され、組成物の複屈折を利用して光の透過光量を制御する液晶表示素子に使用される。液晶表示素子として、AM-LCD(アクティブマトリックス液晶表示素子)、TN(ネマチック液晶表示素子)、STN-LCD(超ねじれネマチック液晶表示素子)、OCB-LCD及びIPS-LCD(インプレーンスイッチング液晶表示素子)に有用であるが、AM-LCDに特に有用であり、透過型あるいは反射型の液晶表示素子に用いることができる。 In the composition containing the polymerizable compound of the present invention, the polymerizable compound contained therein is polymerized by ultraviolet irradiation to impart liquid crystal alignment ability, and the amount of transmitted light is controlled using the birefringence of the composition. Used for liquid crystal display elements. As liquid crystal display elements, AM-LCD (active matrix liquid crystal display element), TN (nematic liquid crystal display element), STN-LCD (super twisted nematic liquid crystal display element), OCB-LCD and IPS-LCD (in-plane switching liquid crystal display element) However, it is particularly useful for AM-LCDs and can be used for transmissive or reflective liquid crystal display elements.
 液晶表示素子に使用される液晶セルの2枚の基板はガラス又はプラスチックの如き柔軟性をもつ透明な材料を用いることができ、一方はシリコン等の不透明な材料でも良い。透明電極層を有する透明基板は、例えば、ガラス板等の透明基板上にインジウムスズオキシド(ITO)をスパッタリングすることにより得ることができる。 The two substrates of the liquid crystal cell used in the liquid crystal display element can be made of a transparent material having flexibility such as glass or plastic, and one of them can be an opaque material such as silicon. A transparent substrate having a transparent electrode layer can be obtained, for example, by sputtering indium tin oxide (ITO) on a transparent substrate such as a glass plate.
 カラーフィルターは、例えば、顔料分散法、印刷法、電着法又は、染色法等によって作成することができる。顔料分散法によるカラーフィルターの作成方法を一例に説明すると、カラーフィルター用の硬化性着色組成物を、該透明基板上に塗布し、パターニング処理を施し、そして加熱又は光照射により硬化させる。この工程を、赤、緑、青の3色についてそれぞれ行うことで、カラーフィルター用の画素部を作成することができる。その他、該基板上に、TFT、薄膜ダイオード、金属絶縁体金属比抵抗素子等の能動素子を設けた画素電極を設置してもよい。 The color filter can be prepared by, for example, a pigment dispersion method, a printing method, an electrodeposition method, or a dyeing method. A method for producing a color filter by a pigment dispersion method will be described as an example. A curable coloring composition for a color filter is applied on the transparent substrate, subjected to patterning treatment, and cured by heating or light irradiation. By performing this process for each of the three colors red, green, and blue, a pixel portion for a color filter can be created. In addition, a pixel electrode provided with an active element such as a TFT, a thin film diode, or a metal insulator metal specific resistance element may be provided on the substrate.
 前記基板を、透明電極層が内側となるように対向させる。その際、スペーサーを介して、基板の間隔を調整してもよい。このときは、得られる調光層の厚さが1~100μmとなるように調整するのが好ましい。1.5から10μmが更に好ましく、偏光板を使用する場合は、コントラストが最大になるように液晶の屈折率異方性Δnとセル厚dとの積を調整することが好ましい。又、二枚の偏光板がある場合は、各偏光板の偏光軸を調整して視野角やコントラトが良好になるように調整することもできる。更に、視野角を広げるための位相差フィルムも使用することもできる。スペーサーとしては、例えば、ガラス粒子、プラスチック粒子、アルミナ粒子、フォトレジスト材料などからなる柱状スペーサー等が挙げられる。その後、エポキシ系熱硬化性組成物等のシール剤を、液晶注入口を設けた形で該基板にスクリーン印刷し、該基板同士を貼り合わせ、加熱しシール剤を熱硬化させる。 The substrate is opposed so that the transparent electrode layer is on the inside. In that case, you may adjust the space | interval of a board | substrate through a spacer. In this case, it is preferable to adjust so that the thickness of the obtained light control layer is 1 to 100 μm. More preferably, the thickness is 1.5 to 10 μm. When a polarizing plate is used, it is preferable to adjust the product of the refractive index anisotropy Δn of the liquid crystal and the cell thickness d so that the contrast is maximized. In addition, when there are two polarizing plates, the polarizing axis of each polarizing plate can be adjusted so that the viewing angle and contrast are good. Furthermore, a retardation film for widening the viewing angle can also be used. Examples of the spacer include columnar spacers made of glass particles, plastic particles, alumina particles, a photoresist material, and the like. Thereafter, a sealant such as an epoxy thermosetting composition is screen-printed on the substrates with a liquid crystal inlet provided, the substrates are bonded together, and heated to thermally cure the sealant.
 2枚の基板間に重合性化合物含有組成物を狭持させる方法は、通常の真空注入法又はODF法などを用いることができるが、真空注入法においては滴下痕が発生しないものの、注入の跡が残る課題を有しているものであるが、本願発明においては、ODF法を用いて製造する表示素子により好適に使用することができる。ODF法の液晶表示素子製造工程においては、バックプレーン又はフロントプレーンのどちらか一方の基板にエポキシ系光熱併用硬化性などのシール剤を、ディスペンサーを用いて閉ループ土手状に描画し、その中に脱気下で所定量の組成物を滴下後、フロントプレーンとバックプレーンを接合することによって液晶表示素子を製造することができる。本発明の組成物は、ODF工程における組成物の滴下が安定的に行えるため、好適に使用することができる。 As a method of sandwiching the polymerizable compound-containing composition between two substrates, a normal vacuum injection method or an ODF method can be used. However, in the present invention, it can be suitably used for a display element manufactured using the ODF method. In the ODF liquid crystal display device manufacturing process, a sealant such as epoxy photothermal combination curing is drawn on a backplane or front plane substrate using a dispenser in a closed-loop bank shape, and then removed. A liquid crystal display element can be manufactured by bonding a front plane and a back plane after dropping a predetermined amount of the composition under air. The composition of the present invention can be suitably used because the composition can be stably dropped in the ODF process.
 重合性化合物を重合させる方法としては、液晶の良好な配向性能を得るためには、適度な重合速度が望ましいので、紫外線又は電子線等の活性エネルギー線を単一又は併用又は順番に照射することによって重合させる方法が好ましい。紫外線を使用する場合、偏光光源を用いても良いし、非偏光光源を用いても良い。また、重合性化合物含有組成物を2枚の基板間に挟持させて状態で重合を行う場合には、少なくとも照射面側の基板は活性エネルギー線に対して適当な透明性が与えられていなければならない。また、光照射時にマスクを用いて特定の部分のみを重合させた後、電場や磁場又は温度等の条件を変化させることにより、未重合部分の配向状態を変化させて、更に活性エネルギー線を照射して重合させるという手段を用いても良い。特に紫外線露光する際には、重合性化合物含有組成物に交流電界を印加しながら紫外線露光することが好ましい。印加する交流電界は、周波数10Hzから10kHzの交流が好ましく、周波数60Hzから10kHzがより好ましく、電圧は液晶表示素子の所望のプレチルト角に依存して選ばれる。つまり、印加する電圧により液晶表示素子のプレチルト角を制御することができる。横電界型MVAモードの液晶表示素子においては、配向安定性及びコントラストの観点からプレチルト角を80度から89.9度に制御することが好ましい。 As a method for polymerizing a polymerizable compound, an appropriate polymerization rate is desirable in order to obtain good alignment performance of liquid crystals. Therefore, active energy rays such as ultraviolet rays or electron beams are irradiated singly or in combination or sequentially. The method of polymerizing by is preferred. When ultraviolet rays are used, a polarized light source or a non-polarized light source may be used. Further, when the polymerization is carried out in a state where the polymerizable compound-containing composition is sandwiched between two substrates, at least the substrate on the irradiated surface side must be given adequate transparency to the active energy rays. Don't be. Moreover, after polymerizing only a specific part using a mask during light irradiation, the orientation state of the unpolymerized part is changed by changing conditions such as an electric field, a magnetic field, or temperature, and further irradiation with active energy rays is performed. Then, it is possible to use a means for polymerization. In particular, when ultraviolet exposure is performed, it is preferable to perform ultraviolet exposure while applying an alternating electric field to the polymerizable compound-containing composition. The alternating electric field to be applied is preferably an alternating current having a frequency of 10 Hz to 10 kHz, more preferably a frequency of 60 Hz to 10 kHz, and the voltage is selected depending on a desired pretilt angle of the liquid crystal display element. That is, the pretilt angle of the liquid crystal display element can be controlled by the applied voltage. In a horizontal electric field type MVA mode liquid crystal display element, the pretilt angle is preferably controlled from 80 degrees to 89.9 degrees from the viewpoint of alignment stability and contrast.
 照射時の温度は、本発明の組成物の液晶状態が保持される温度範囲内であることが好ましい。室温に近い温度、即ち、典型的には15~35℃での温度で重合させることが好ましい。紫外線を発生させるランプとしては、メタルハライドランプ、高圧水銀ランプ、超高圧水銀ランプ等を用いることができる。また、照射する紫外線の波長としては、組成物の吸収波長域でない波長領域の紫外線を照射することが好ましく、必要に応じて、紫外線をカットして使用することが好ましい。照射する紫外線の強度は、0.1mW/cm2~100W/cm2が好ましく、2mW/cm2~50W/cm2がより好ましい。照射する紫外線のエネルギー量は、適宜調整することができるが、10mJ/cm2から500J/cm2が好ましく、100mJ/cm2から200J/cm2がより好ましい。紫外線を照射する際に、強度を変化させても良い。紫外線を照射する時間は照射する紫外線強度により適宜選択されるが、10秒から3600秒が好ましく、10秒から600秒がより好ましい。 The temperature at the time of irradiation is preferably within a temperature range in which the liquid crystal state of the composition of the present invention is maintained. Polymerization is preferably performed at a temperature close to room temperature, that is, typically at a temperature of 15 to 35 ° C. As a lamp for generating ultraviolet rays, a metal halide lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, or the like can be used. Moreover, as a wavelength of the ultraviolet-ray to irradiate, it is preferable to irradiate the ultraviolet-ray of the wavelength range which is not the absorption wavelength range of a composition, and it is preferable to cut and use an ultraviolet-ray as needed. The intensity of the irradiated ultraviolet light is preferably 0.1 mW / cm 2 to 100 W / cm 2, more preferably 2 mW / cm 2 to 50 W / cm 2. The amount of energy of ultraviolet rays to be irradiated can be adjusted as appropriate, but is preferably 10 mJ / cm 2 to 500 J / cm 2, and more preferably 100 mJ / cm 2 to 200 J / cm 2. When irradiating with ultraviolet rays, the intensity may be changed. The time for irradiating with ultraviolet rays is appropriately selected depending on the intensity of the irradiating ultraviolet rays.
 本発明の組成物を用いた液晶表示素子は高速応答と表示不良の抑制を両立させた有用なものであり、特に、アクティブマトリックス駆動用液晶表示素子に有用であり、VAモード、PSVAモード、PSAモード、IPSモード又はECBモード用液晶表示素子に適用できる。 The liquid crystal display device using the composition of the present invention is useful for achieving both high-speed response and suppression of display failure, and is particularly useful for a liquid crystal display device for active matrix driving. VA mode, PSVA mode, PSA It can be applied to a mode, IPS mode or ECB mode liquid crystal display element.
 以下、実施例を挙げて本発明を更に記述するが、本発明はこれらの実施例に限定されるものではない。以下の実施例及び比較例の組成物における「%」は『質量%』を意味する。化合物の純度はGC又はUPLCによって分析した。化合物および反応溶媒の略称は以下の通りである:テトラヒドロフラン(THF)、リチウムジイソプロピルアミド(LDA)
 以下に実施例を挙げて本発明を更に詳述するが、本発明はこれらの実施例に限定されるものではない。また、以下の実施例及び比較例の組成物における「%」は『質量%』を意味する。
実施例において化合物の記載について以下の略号を用いる。
(側鎖及び連結構造)
 -n :-CnH2n+1 炭素原子数nの直鎖状のアルキル基
 n- :CnH2n+1- 炭素原子数nの直鎖状のアルキル基
 -On :-OCnH2n+1 炭素原子数nの直鎖状のアルコキシル基
 nO- :CnH2n+1O- 炭素原子数nの直鎖状のアルコキシル基
 -V :-CH=CH2
 V- :CH2=CH-
 -V1 :-CH=CH-CH3
 1V- :CH3-CH=CH-
 -On- :-OCHn- 炭素原子数nの直鎖状のアルコキシル連結基
 -nO- :-CHnO- 炭素原子数nの直鎖状のアルコキシル連結基
(環構造)
EXAMPLES Hereinafter, although an Example is given and this invention is further described, this invention is not limited to these Examples. “%” In the compositions of the following examples and comparative examples means “% by mass”. The purity of the compound was analyzed by GC or UPLC. Abbreviations of compounds and reaction solvents are as follows: tetrahydrofuran (THF), lithium diisopropylamide (LDA)
EXAMPLES The present invention will be described in further detail with reference to examples below, but the present invention is not limited to these examples. Further, “%” in the compositions of the following Examples and Comparative Examples means “% by mass”.
The following abbreviations are used for the description of compounds in the examples.
(Side chain and linking structure)
-n: -C n H 2n + 1 linear alkyl group having n carbon atoms n-: C n H 2n + 1- linear alkyl group having n carbon atoms -On: -OC n H 2n +1 linear alkoxyl group of carbon atoms n nO-: C n H 2n + 1 O- carbon atom number n of the linear alkoxyl groups -V: -CH = CH 2
V-: CH 2 = CH-
-V1: -CH = CH-CH 3
1V-: CH 3 -CH = CH-
-On-: -OCH n- linear alkoxyl linking group having n carbon atoms -nO-: -CH n O- linear alkoxyl linking group having n carbon atoms (ring structure)
Figure JPOXMLDOC01-appb-C000077
Figure JPOXMLDOC01-appb-C000077
 実施例中、測定した特性は以下の通りである。 In the examples, the measured characteristics are as follows.
 Tni :ネマチック相-等方性液体相転移温度(℃)
 Tcn :固体相(スメクチック相)-ネマチック相転移温度(℃)
 Δn :20℃における屈折率異方性
 Δε :20℃における誘電率異方性
 γ :20℃における回転粘性(mPa・s)
(実施例1)化合物(ia1-301)の製造
T ni : Nematic phase-isotropic liquid phase transition temperature (° C.)
T cn : Solid phase (smectic phase) -nematic phase transition temperature (° C)
Δn: Refractive index anisotropy at 20 ° C. Δε: Dielectric anisotropy at 20 ° C. γ 1 : Rotational viscosity at 20 ° C. (mPa · s)
Example 1 Production of Compound (ia1-301)
Figure JPOXMLDOC01-appb-C000078
Figure JPOXMLDOC01-appb-C000078
 (化合物(a1-2)の合成)窒素雰囲気下、撹拌装置、温度計、滴下ロートを備えた反応容器に、ジイソプロピルアミン65.3gおよびTHF500mlを加え、-10℃に冷却した。1.6Mブチルリチウム/ヘキサン溶液374mlを-10℃にて滴下し、1時間攪拌し、次にあらかじめTHF500mlに溶解しておいた化合物(a1-1)137.5gおよびホウ酸トリイソプロピル130.0gを-10℃にて同時に滴下し、1時間攪拌した。この反応混合物を0℃に昇温した後、10%塩化アンモニウム水溶液700mlを加えて攪拌後、有機層を分けとり、さらに水層をTHF200mlで抽出した。得られた有機層を合わせた後、10%塩化アンモニウム水溶液500mlと飽和食塩水500mlで洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を0℃に冷却し、30%過酸化水素水71gと水210mlの混合物を加え、室温に昇温し、2時間半撹拌した。この反応混合物に亜硫酸ナトリウム水溶液700mlを加えた後、有機層を分離し、さらに水層をTHF/トルエン(体積比1/2)300mlで抽出した。得られた有機層を合わせた後、水500ml、飽和食塩水500mlで洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物(a1-2)の粗体189.4gを得た。 (Synthesis of Compound (a1-2)) Under a nitrogen atmosphere, 65.3 g of diisopropylamine and 500 ml of THF were added to a reaction vessel equipped with a stirrer, a thermometer, and a dropping funnel, and cooled to −10 ° C. 374 ml of 1.6 M butyllithium / hexane solution was added dropwise at −10 ° C., stirred for 1 hour, and then 137.5 g of compound (a1-1) previously dissolved in 500 ml of THF and 130.0 g of triisopropyl borate. Were simultaneously added dropwise at −10 ° C. and stirred for 1 hour. The temperature of the reaction mixture was raised to 0 ° C., 700 ml of 10% aqueous ammonium chloride solution was added and stirred, the organic layer was separated, and the aqueous layer was further extracted with 200 ml of THF. The obtained organic layers were combined, washed with 10% aqueous ammonium chloride solution (500 ml) and saturated brine (500 ml), dried over anhydrous sodium sulfate. The obtained solution was cooled to 0 ° C., a mixture of 71 g of 30% aqueous hydrogen peroxide and 210 ml of water was added, the temperature was raised to room temperature, and the mixture was stirred for 2.5 hours. After adding 700 ml of aqueous sodium sulfite solution to this reaction mixture, the organic layer was separated, and the aqueous layer was further extracted with 300 ml of THF / toluene (volume ratio 1/2). The obtained organic layers were combined, washed with 500 ml of water and 500 ml of saturated brine, and dried by adding anhydrous sodium sulfate. The obtained solution was concentrated to obtain 189.4 g of a crude product of compound (a1-2).
 (化合物(a1-3)の合成)窒素雰囲気下、撹拌装置、温度計、冷却管を備えた反応容器に、上記のとおり得られた化合物(a1-2)の粗体189.4g、ヨウ化メチル72.0g、炭酸カリウム95.6gおよびDMF500mlを加え、80℃で1時間半撹拌した。反応混合物を室温に冷却後、THF/トルエン(体積比1/1)1000ml、水1000mlを加え有機層を分離し、さらに水層をトルエン300mlで抽出した。得られた有機層を合わせた後、水500ml、飽和食塩水500mlで洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物(a1-3)の粗体192.9gを得た。 (Synthesis of Compound (a1-3)) In a reaction vessel equipped with a stirrer, a thermometer and a condenser under a nitrogen atmosphere, 189.4 g of the crude product of Compound (a1-2) obtained as described above, iodinated 72.0 g of methyl, 95.6 g of potassium carbonate and 500 ml of DMF were added, and the mixture was stirred at 80 ° C. for 1.5 hours. After cooling the reaction mixture to room temperature, 1000 ml of THF / toluene (volume ratio 1/1) and 1000 ml of water were added to separate the organic layer, and the aqueous layer was further extracted with 300 ml of toluene. The obtained organic layers were combined, washed with 500 ml of water and 500 ml of saturated brine, and dried by adding anhydrous sodium sulfate. The obtained solution was concentrated to obtain 192.9 g of a crude product of compound (a1-3).
 (化合物(a1-4)の合成)窒素雰囲気下、撹拌装置、温度計を備えた反応容器に、上記のとおり得られた化合物(a1-3)の粗体192.9g、トルエン800mlおよびギ酸(51.3ml)を加え、50℃加温下3時間撹拌した後、室温まで冷却し、水500mlを加えた。水層から、トルエン200mlで抽出した後、得られた有機層を合わせ、水300ml、飽和重曹水300ml及び飽和食塩水300mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥した後、減圧下濃縮することで、化合物(a1-4)の粗体164.3gを得た。 (Synthesis of Compound (a1-4)) Under a nitrogen atmosphere, in a reaction vessel equipped with a stirrer and a thermometer, 192.9 g of the crude product of Compound (a1-3) obtained as described above, 800 ml of toluene and formic acid ( 51.3 ml) was added, and the mixture was stirred at 50 ° C. for 3 hours, then cooled to room temperature, and 500 ml of water was added. After extraction with 200 ml of toluene from the aqueous layer, the obtained organic layers were combined and washed with 300 ml of water, 300 ml of saturated aqueous sodium bicarbonate, and 300 ml of saturated brine. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure to obtain 164.3 g of a crude product of compound (a1-4).
 (化合物(ia1-301)の合成)エチルトリフェニルホスホニウムブロミド222.5gをTHF500mlに分散し、-20℃でカリウム‐t‐ブトキシド64.7gを加え、30分攪拌した。その後、上記のとおり得られた化合物(a1-4)の粗体192.9gをトルエン500mlに溶解した溶液を滴下し、1時間攪拌した。水30mlを加えた後溶媒を減圧留去し、残渣にヘキサン600ml、トルエン200ml、次亜塩素酸ナトリウム水溶液50ml、水450mlおよびメタノール1000mlを加え有機層を分離し、さらに水層をヘキサン/トルエン(体積比3/1)400mlで抽出した。得られた有機層を合わせた後、水/メタノール(体積比2/1)450mlで2回洗浄し、無水硫酸ナトリウムを加えて乾燥した。得られた溶液を濃縮し、化合物(ia1-301)の粗体193.2gを得た。カラムクロマトグラフィー(シリカゲル200g)に対し、あらかじめヘキサン/トルエン(体積比4/1)400mlに溶解しておいた粗体を通し、さらにヘキサン/トルエン(体積比4/1)1200mlで溶出させた。得られた溶液を濃縮し、化合物(ia1-301)の粗体184.0gを得た。窒素雰囲気下、撹拌装置、温度計、滴下ロートを備えた反応容器に、得られた化合物(ia1-301)の粗体184.0g、ベンゼンスルフィン酸ナトリウム3.8g、10%塩酸16.8gおよびトルエン400mlを加え、85℃加温下3時間撹拌した後、室温まで冷却し、飽和重曹水400mlを加えた。水層から、トルエン200mlで抽出した後、得られた有機層を合わせ、水300mlおよび飽和食塩水300mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥した後、減圧下濃縮することで、化合物(ia1-301)の粗体145.3gを得た。カラムクロマトグラフィー(シリカゲル200g)に対し、あらかじめヘキサン/トルエン(体積比4/1)300mlに溶解しておいた粗体を通し、さらにヘキサン/トルエン(体積比4/1)1200mlで溶出させた。得られた溶液を濃縮し、化合物(ia1-301)の粗体114.4gを得た。アセトン/メタノール混合溶媒を用いて再結晶を繰り返すことで、化合物(ia‐1-302)55.5gを得た。転移点はC68I。
GC-MS:m/z  [M]
 実施例1と同様の反応、および必要に応じて公知の方法に準拠した方法を用いて、実施例2(化合物(ia‐1-201))~実施例28(化合物(ia‐2-802))を合成した。
(Synthesis of Compound (ia1-301)) 222.5 g of ethyltriphenylphosphonium bromide was dispersed in 500 ml of THF, and 64.7 g of potassium tert-butoxide was added at −20 ° C., followed by stirring for 30 minutes. Thereafter, a solution of 192.9 g of the crude product (a1-4) obtained as described above in 500 ml of toluene was added dropwise and stirred for 1 hour. After adding 30 ml of water, the solvent was distilled off under reduced pressure. To the residue, 600 ml of hexane, 200 ml of toluene, 50 ml of aqueous sodium hypochlorite solution, 450 ml of water and 1000 ml of methanol were added to separate the organic layer, and the aqueous layer was further separated into hexane / toluene ( Extraction was performed at a volume ratio of 3/1) 400 ml. The obtained organic layers were combined, washed twice with 450 ml of water / methanol (volume ratio 2/1), dried over anhydrous sodium sulfate. The obtained solution was concentrated to obtain 193.2 g of a crude product of compound (ia1-301). A crude product previously dissolved in 400 ml of hexane / toluene (volume ratio 4/1) was passed through column chromatography (silica gel 200 g), and further eluted with 1200 ml of hexane / toluene (volume ratio 4/1). The obtained solution was concentrated to obtain 184.0 g of a crude product of compound (ia1-301). Under a nitrogen atmosphere, in a reaction vessel equipped with a stirrer, a thermometer, and a dropping funnel, 184.0 g of a crude product of the obtained compound (ia1-301), 3.8 g of sodium benzenesulfinate, 16.8 g of 10% hydrochloric acid and After adding 400 ml of toluene and stirring for 3 hours while heating at 85 ° C., the mixture was cooled to room temperature, and 400 ml of saturated aqueous sodium bicarbonate was added. After extraction with 200 ml of toluene from the aqueous layer, the obtained organic layers were combined and washed with 300 ml of water and 300 ml of saturated brine. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure to obtain 145.3 g of a crude product of compound (ia1-301). A crude product previously dissolved in 300 ml of hexane / toluene (volume ratio 4/1) was passed through column chromatography (silica gel 200 g), and further eluted with 1200 ml of hexane / toluene (volume ratio 4/1). The obtained solution was concentrated to obtain 114.4 g of a crude product of compound (ia1-301). By repeating recrystallization using an acetone / methanol mixed solvent, 55.5 g of compound (ia-1-302) was obtained. The transition point is C68I.
GC-MS: m / z [M + ]
Using the same reaction as in Example 1, and if necessary, a method based on a known method, Example 2 (Compound (ia-1-201)) to Example 28 (Compound (ia-2-802)) ) Was synthesized.
Figure JPOXMLDOC01-appb-C000079
Figure JPOXMLDOC01-appb-C000079
Figure JPOXMLDOC01-appb-C000080
Figure JPOXMLDOC01-appb-C000080
(実施例2)化合物(ia-2-301)の製造 Example 2 Production of Compound (ia-2-301)
Figure JPOXMLDOC01-appb-C000081
Figure JPOXMLDOC01-appb-C000081
 実施例1において、式(a1-1)で表される化合物に代えて、式(a2-1)で表される化合物を用いる以外は同様にして実施例30(化合物(ia‐1-203))~実施例56(化合物(ia‐2-804))を合成した。 In Example 1, Example 30 (Compound (ia-1-203)) was used except that the compound represented by the formula (a2-1) was used in place of the compound represented by the formula (a1-1). ) To Example 56 (compound (ia-2-804)) was synthesized.
Figure JPOXMLDOC01-appb-C000082
Figure JPOXMLDOC01-appb-C000082
Figure JPOXMLDOC01-appb-C000083
Figure JPOXMLDOC01-appb-C000083
(実施例3、実施例4、比較例1及び比較例2)
 LC-1(実施例3)、LC-2(実施例4)、LC-A(比較例1)、LC-B(比較例2)の液晶組成物を調製し、その物性値を測定した。液晶組成物の構成とその物性値の結果は下記の表のとおりであった。
(Example 3, Example 4, Comparative Example 1 and Comparative Example 2)
LC-1 (Example 3), LC-2 (Example 4), LC-A (Comparative Example 1) and LC-B (Comparative Example 2) liquid crystal compositions were prepared and their physical properties were measured. The composition of the liquid crystal composition and the results of its physical properties were as shown in the following table.
Figure JPOXMLDOC01-appb-T000084
Figure JPOXMLDOC01-appb-T000084
 本発明の液晶組成物LC-1は、Δn及びΔε絶対値が大きな値を示した。これに対し、本願の一般式(i)で表される化合物である1V-Cy-1O-Ph5-O1を骨格が共通する3-Cy-1O-Ph5-O2に置き換え、Δnを調整したLC-Aは、Tniが上昇するものの、Δεが低下してしまうことがわかった。LC-Aに対し、Δn及びγ1を保ったまま、TniをLC-1と同程度になるよう調製したものが、LC-Bであるが、ΔεをLC-1と同程度まで上昇させることはできなかった。 The liquid crystal composition LC-1 of the present invention showed large Δn and Δε absolute values. In contrast, 1V-Cy-1O-Ph5-O1 which is a compound represented by the general formula (i) of the present application is replaced with 3-Cy-1O-Ph5-O2 having a common skeleton, and LC- As for A, although Tni raised, (DELTA) (epsilon) fell. Compared to LC-A, while maintaining Δn and γ1, Tni is adjusted to be about the same as LC-1, LC-B, but Δε can be increased to the same level as LC-1. could not.
 以上のことから、本発明の液晶組成物は、屈折率異方性(Δn)が大きく、絶対値が大きな負の誘電率異方性(Δε)を有するため、これを用いたVA型やPSA型、PSVA型等の液晶表示素子は狭ギャップLCDに十分対応可能な、低電圧駆動に優れたものであることが確認された。 From the above, the liquid crystal composition of the present invention has a large refractive index anisotropy (Δn) and a large absolute value and a negative dielectric anisotropy (Δε). It was confirmed that the liquid crystal display elements such as the type and the PSVA type are excellent in low-voltage driving and can sufficiently cope with the narrow gap LCD.

Claims (9)

  1. 一般式(i)で表される化合物。
    Figure JPOXMLDOC01-appb-C000001
    (式中、Ri1は炭素原子数3から15のアルケニル基を表すが、アルケニル基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-、-S-、-COO-、-OCO-、-CO-、-CH=CH-、-C≡C-又は環構造により置き換えられても良く、
    i2は炭素原子数1から15のアルキル基を表すが、アルキル基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-、-S-、-COO-、-OCO-、-CO-、-CH=CH-、-C≡C-又は環構造により置き換えられても良く、
    i1は、1、2又は3を表し、
    i1及びXi2は各々独立して、水素原子、フッ素原子、塩素原子、トリフルオロメチル基又はトリフルオロメトキシ基を表す。)
    The compound represented by general formula (i).
    Figure JPOXMLDOC01-appb-C000001
    (Wherein R i1 represents an alkenyl group having 3 to 15 carbon atoms, and one —CH 2 — present in the alkenyl group or two or more non-adjacent —CH 2 — represents —O— , —S—, —COO—, —OCO—, —CO—, —CH═CH—, —C≡C— or a ring structure,
    R i2 represents an alkyl group having from 1 to 15 carbon atoms, one -CH 2 present in the alkyl group - or nonadjacent two or more -CH 2 - is -O -, - S- , —COO—, —OCO—, —CO—, —CH═CH—, —C≡C— or a ring structure,
    n i1 represents 1, 2 or 3,
    X i1 and X i2 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a trifluoromethyl group or a trifluoromethoxy group. )
  2.  一般式(i)において、ni1が1であり、Xi1及びXi2が各々独立して、フッ素原子、塩素原子、トリフルオロメチル基又はトリフルオロメトキシ基である請求項1に記載の化合物。 2. The compound according to claim 1, wherein in general formula (i), n i1 is 1, and X i1 and X i2 are each independently a fluorine atom, a chlorine atom, a trifluoromethyl group, or a trifluoromethoxy group.
  3.  一般式(i)において、ni1が2であり、Xi1及びXi2が各々独立して、フッ素原子、塩素原子、トリフルオロメチル基又はトリフルオロメトキシ基である請求項1に記載の化合物。 The compound according to claim 1, wherein in general formula (i), n i1 is 2, and X i1 and X i2 are each independently a fluorine atom, a chlorine atom, a trifluoromethyl group, or a trifluoromethoxy group.
  4.  一般式(i)において、Ri2がメチル基である請求項1に記載の化合物。 The compound according to claim 1, wherein in formula (i), R i2 is a methyl group.
  5.  請求項1から3のいずれか一項に記載の化合物を一種又は二種以上含有する組成物。 A composition containing one or more compounds according to any one of claims 1 to 3.
  6.  更に一般式(N-1)で表される化合物を含有する請求項5記載の組成物。
    Figure JPOXMLDOC01-appb-C000002
    (式中、RN11及びRN12はそれぞれ独立して炭素原子数1~8のアルキル基を表し、該アルキル基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
     AN11及びAN12はそれぞれ独立して
    (a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)及び
    (b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)
    (c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
    からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子又は塩素原子で置換されていても良く、
     ZN11及びZN12はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-COO-、-OCO-、-OCF-、-CFO-、-CH=N-N=CH-、-CH=CH-、-CF=CF-又は-C≡C-を表し、
     nN11及びnN12はそれぞれ独立して0~3の整数を表すが、nN11+nN12は1、2又は3であり、AN11~AN12、ZN11~ZN12が複数存在する場合は、それらは同一であっても異なっていても良い。)
    The composition according to claim 5, further comprising a compound represented by the general formula (N-1).
    Figure JPOXMLDOC01-appb-C000002
    (Wherein R N11 and R N12 each independently represent an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently Optionally substituted by —CH═CH—, —C≡C—, —O—, —CO—, —COO— or —OCO—,
    Independently A N11 and A N12, respectively (a) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - is -O And (b) a 1,4-phenylene group (one —CH═ present in the group or two or more non-adjacent —CH═ are replaced with —N =). May be.)
    (C) (c) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6- One —CH═ present in a diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ are replaced by —N═. Is also good.)
    The group (a), the group (b) and the group (c) may be each independently substituted with a cyano group, a fluorine atom or a chlorine atom,
    Z N11 and Z N12 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —OCF 2 -, -CF 2 O-, -CH = NN-CH-, -CH = CH-, -CF = CF- or -C≡C-
    Although n N11 and n N12 each represent independently an integer of 0 ~ 3, n N11 + n N12 is 1, 2 or 3, if A N11 ~ A N12, Z N11 ~ Z N12 there is a plurality, They may be the same or different. )
  7.  更に一般式(L)で表される化合物を含有する請求項5又は6記載の組成物。
    Figure JPOXMLDOC01-appb-C000003
    (式中、RL1及びRL2はそれぞれ独立して炭素原子数1~8のアルキル基を表し、該アルキル基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
     nL1は0、1、2又は3を表し、
     AL1、AL2及びAL3はそれぞれ独立して
    (a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)及び
    (b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)
    (c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
    からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子又は塩素原子で置換されていても良く、
     ZL1及びZL2はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-COO-、-OCO-、-OCF-、-CFO-、-CH=N-N=CH-、-CH=CH-、-CF=CF-又は-C≡C-を表し、
     nL1が2又は3であってAL2が複数存在する場合は、それらは同一であっても異なっていても良く、nL1が2又は3であってZL3が複数存在する場合は、それらは同一であっても異なっていても良いが、一般式(i)及び一般式(N-1)で表される化合物を除く。)
    Furthermore, the composition of Claim 5 or 6 containing the compound represented by general formula (L).
    Figure JPOXMLDOC01-appb-C000003
    (Wherein R L1 and R L2 each independently represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently Optionally substituted by —CH═CH—, —C≡C—, —O—, —CO—, —COO— or —OCO—,
    n L1 represents 0, 1, 2 or 3,
    A L1 , A L2 and A L3 each independently represent (a) a 1,4-cyclohexylene group (one —CH 2 — present in the group or two or more —CH 2 — not adjacent to each other). May be replaced by —O—) and (b) a 1,4-phenylene group (one —CH═ present in this group or two or more —CH═ not adjacent to each other —N May be replaced by =.)
    (C) (c) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6- One —CH═ present in a diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ are replaced by —N═. Is also good.)
    The group (a), the group (b) and the group (c) may be each independently substituted with a cyano group, a fluorine atom or a chlorine atom,
    Z L1 and Z L2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —OCF 2 -, -CF 2 O-, -CH = NN-CH-, -CH = CH-, -CF = CF- or -C≡C-
    When n L1 is 2 or 3, and a plurality of A L2 are present, they may be the same or different, and when n L1 is 2 or 3, and a plurality of Z L3 are present, May be the same or different, but excludes compounds represented by general formula (i) and general formula (N-1). )
  8.  室温において液晶相を有する請求項5~7のいずれか1項に記載の組成物。 The composition according to any one of claims 5 to 7, which has a liquid crystal phase at room temperature.
  9.  請求項5~8のいずれか1項に記載の組成物を使用した表示素子。 A display device using the composition according to any one of claims 5 to 8.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111205878A (en) * 2018-11-22 2020-05-29 河北迈尔斯通电子材料有限公司 Low-viscosity quick-response and low-power-consumption negative liquid crystal composition and liquid crystal display

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006064853A1 (en) * 2004-12-15 2006-06-22 Dainippon Ink And Chemicals, Inc. Nematic liquid crystal composition and liquid crystal display utilizing the same
WO2006098366A1 (en) * 2005-03-17 2006-09-21 Dainippon Ink And Chemicals, Inc. Difluorobenzene derivative and nematic liquid crystal composition making use of the same
JP2008273957A (en) * 2007-04-06 2008-11-13 Chisso Corp Alkadienyl-group-containing compound and liquid crystal composition using the same
JP2014114276A (en) * 2012-11-16 2014-06-26 Jnc Corp Liquid crystal compound having vinyloxy, liquid crystal compound and liquid crystal display element
WO2015052948A1 (en) * 2013-10-08 2015-04-16 Dic株式会社 Nematic liquid crystal composition and liquid crystal display element using same
WO2015174175A1 (en) * 2014-05-13 2015-11-19 Dic株式会社 Nematic liquid crystal composition and liquid crystal display element using same
WO2016017519A1 (en) * 2014-07-29 2016-02-04 Dic株式会社 Liquid-crystal display element
WO2016136344A1 (en) * 2015-02-25 2016-09-01 Jnc株式会社 Liquid crystal composition and liquid crystal display element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201522587A (en) * 2013-10-03 2015-06-16 Dainippon Ink & Chemicals Nematic liquid crystal composition and liquid crystal display element using same

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006064853A1 (en) * 2004-12-15 2006-06-22 Dainippon Ink And Chemicals, Inc. Nematic liquid crystal composition and liquid crystal display utilizing the same
WO2006098366A1 (en) * 2005-03-17 2006-09-21 Dainippon Ink And Chemicals, Inc. Difluorobenzene derivative and nematic liquid crystal composition making use of the same
JP2008273957A (en) * 2007-04-06 2008-11-13 Chisso Corp Alkadienyl-group-containing compound and liquid crystal composition using the same
JP2014114276A (en) * 2012-11-16 2014-06-26 Jnc Corp Liquid crystal compound having vinyloxy, liquid crystal compound and liquid crystal display element
WO2015052948A1 (en) * 2013-10-08 2015-04-16 Dic株式会社 Nematic liquid crystal composition and liquid crystal display element using same
WO2015174175A1 (en) * 2014-05-13 2015-11-19 Dic株式会社 Nematic liquid crystal composition and liquid crystal display element using same
WO2016017519A1 (en) * 2014-07-29 2016-02-04 Dic株式会社 Liquid-crystal display element
WO2016136344A1 (en) * 2015-02-25 2016-09-01 Jnc株式会社 Liquid crystal composition and liquid crystal display element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111205878A (en) * 2018-11-22 2020-05-29 河北迈尔斯通电子材料有限公司 Low-viscosity quick-response and low-power-consumption negative liquid crystal composition and liquid crystal display
CN111205878B (en) * 2018-11-22 2022-07-26 河北迈尔斯通电子材料有限公司 Low-viscosity, quick-response and low-power-consumption negative liquid crystal composition and liquid crystal display

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