JP2019014675A - Phenyl phenol derivative and method for producing dibenzofuran derivative using the same - Google Patents
Phenyl phenol derivative and method for producing dibenzofuran derivative using the same Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/91—Dibenzofurans; Hydrogenated dibenzofurans
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- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/34—Non-steroidal liquid crystal compounds containing at least one heterocyclic ring
- C09K19/3402—Non-steroidal liquid crystal compounds containing at least one heterocyclic ring having oxygen as hetero atom
- C09K19/3405—Non-steroidal liquid crystal compounds containing at least one heterocyclic ring having oxygen as hetero atom the heterocyclic ring being a five-membered ring
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/06—Non-steroidal liquid crystal compounds
- C09K19/34—Non-steroidal liquid crystal compounds containing at least one heterocyclic ring
- C09K19/3402—Non-steroidal liquid crystal compounds containing at least one heterocyclic ring having oxygen as hetero atom
- C09K19/3405—Non-steroidal liquid crystal compounds containing at least one heterocyclic ring having oxygen as hetero atom the heterocyclic ring being a five-membered ring
- C09K2019/3408—Five-membered ring with oxygen(s) in fused, bridged or spiro ring systems
Abstract
Description
本発明は、液晶組成物などの製造に有用な新規化合物に関する。 The present invention relates to a novel compound useful for producing a liquid crystal composition and the like.
単独で又は混合物とした際に液晶相を発現する化合物は、特に液晶表示素子等に用いられる液晶組成物として有用である。このような液晶化合物の一種として、ジベンゾフラン誘導体が知られている。 A compound that exhibits a liquid crystal phase when used alone or as a mixture is particularly useful as a liquid crystal composition used in a liquid crystal display device or the like. As one kind of such a liquid crystal compound, a dibenzofuran derivative is known.
ジベンゾフラン誘導体は、その優れた諸特性から液晶組成物用途をはじめ、幅広い分野への応用が期待されている。しかしながら、該化合物を簡便かつ高収率で製造するための方法は未だ確立されていないのが現状である。 Dibenzofuran derivatives are expected to be applied to a wide range of fields including liquid crystal composition applications due to their excellent properties. However, the present condition is that the method for manufacturing this compound simply and with a high yield is not yet established.
上記文献1に記載の方法では、例えばCsFといった高価な試薬が必要となるため、製造コストに難点があり、また、所望の化合物を得るまでに多くの反応工程数が必要である。上記文献2に記載の方法では、収率が低く、また具体的な反応条件も記載されていない。 In the method described in Document 1, an expensive reagent such as CsF is required, so that the production cost is difficult, and a large number of reaction steps are required to obtain a desired compound. In the method described in Document 2, the yield is low, and no specific reaction conditions are described.
一方、本発明は、ジベンゾフラン誘導体を簡便かつ高収率で得ることを実現できる。すなわち、本発明はジベンゾフラン誘導体の製造中間体として有用なフェニルフェノール誘導体と、該中間体からジベンゾフラン誘導体を誘導する製造方法を提供する。 On the other hand, this invention can implement | achieve obtaining a dibenzofuran derivative simply and with a high yield. That is, the present invention provides a phenylphenol derivative useful as a production intermediate of a dibenzofuran derivative and a production method for deriving a dibenzofuran derivative from the intermediate.
本発明者らは、新規な構造的特徴を有する化合物が、ジベンゾフラン誘導体を製造するための中間体として有用であることを見出し、本発明を完成するに至った。すなわち、本発明は、一般式(i) The present inventors have found that a compound having a novel structural characteristic is useful as an intermediate for producing a dibenzofuran derivative, and has completed the present invention. That is, the present invention relates to the general formula (i)
(式中、Xi1はハロゲン原子を表し、Xi2は水素原子又は電子求引性基を表し、Ri1、Ri2、Ri3、Ri4、Ri5、Ri6及びRi7はそれぞれ独立してH又は置換基を表す。)
で表される化合物である。
(In the formula, X i1 represents a halogen atom, X i2 represents a hydrogen atom or an electron-withdrawing group, and R i1 , R i2 , R i3 , R i4 , R i5 , R i6 and R i7 are independent of each other. Represents H or a substituent.
It is a compound represented by these.
本発明の化合物は、ジベンゾフラン誘導体を簡便かつ高収率で得るのに有用である。また、本発明によれば、液晶表示素子用の液晶組成物に特に好適な、高極性のジベンゾフラン誘導体を容易に製造することができる。 The compound of the present invention is useful for obtaining a dibenzofuran derivative simply and in high yield. In addition, according to the present invention, a highly polar dibenzofuran derivative particularly suitable for a liquid crystal composition for a liquid crystal display element can be easily produced.
<一般式(i)で表される化合物>
一般式(i)において、Xi1基とOH基との脱離しやすく、かつXi1基の置換した炭素原子の電子密度を下げ、反応性を向上させる観点から、Xi1はフッ素原子であることが好ましい。
<Compound represented by formula (i)>
In general formula (i), X i1 is a fluorine atom from the viewpoint of easy elimination of the X i1 group and the OH group, and lowering the electron density of the carbon atom substituted by the X i1 group and improving the reactivity. Is preferred.
一般式(i)において、Xi1基の置換した炭素原子の電子密度を下げる観点から、Xi2はハロゲン原子、ニトロ基、シアノ基、アルデヒド、ケトン、エステル、アミド、イミン、スルホキシド、スルホンを表すことが好ましく、ハロゲン原子、ニトロ基、シアノ基がより好ましく、ハロゲン原子、ニトロ基がさらに好ましい。 In the general formula (i), X i2 represents a halogen atom, a nitro group, a cyano group, an aldehyde, a ketone, an ester, an amide, an imine, a sulfoxide, or a sulfone from the viewpoint of reducing the electron density of the substituted carbon atom of the X i1 group. Of these, a halogen atom, a nitro group, and a cyano group are more preferable, and a halogen atom and a nitro group are more preferable.
一般式(i)において、 ビフェニル部位の電子密度を下げる観点から、Ri1はハロゲン原子を表すことが好ましく、フッ素原子を表すことがより好ましい。 In general formula (i), R i1 preferably represents a halogen atom, more preferably a fluorine atom, from the viewpoint of lowering the electron density of the biphenyl moiety.
一般式(i)において、Ri2及びRi5は水素原子、ハロゲン原子、炭素原子数1〜20の直鎖又は分岐のアルキル基(アルキル基中の1個又は非隣接の2個以上の−CH2−がそれぞれ独立して−CH=CH−、−C≡C−、−O−、−CO−、−COO−又は−OCO−によって置換されていてもよい。また、アルキル基中の水素原子はフッ素原子に置換されていてもよい。)、水酸基、−B(OH)2を表すことが好ましい。 In the general formula (i), R i2 and R i5 are a hydrogen atom, a halogen atom, a linear or branched alkyl group having 1 to 20 carbon atoms (one or non-adjacent two or more —CH in the alkyl group). 2- may be each independently substituted by —CH═CH—, —C≡C—, —O—, —CO—, —COO—, or —OCO—, or a hydrogen atom in an alkyl group May be substituted with a fluorine atom.), A hydroxyl group, and —B (OH) 2 .
Ri2及びRi5の少なくとも一方は、基中の1個又は非隣接の2個以上の−CH2−がそれぞれ独立して−CH=CH−、−C≡C−、−O−、−CO−、−COO−又は−OCO−によって置換されていてもよい炭素原子数1〜8のアルキル基を表することが好ましく、基中の1個又は非隣接の2個以上の−CH2−がそれぞれ独立して−O−、−CO−、−COO−又は−OCO−によって置換されていてもよい炭素原子数1〜8のアルキル基を表することがより好ましく、アルコキシル基がさらに好ましく、メトキシ基、エトキシ基、n−プロポキシ基、n−ブトキシ基又はn−ペントキシ基であることが特に好ましい。 In at least one of R i2 and R i5 , one or two or more non-adjacent —CH 2 — in the group are each independently —CH═CH—, —C≡C—, —O—, —CO. It preferably represents an alkyl group having 1 to 8 carbon atoms which may be substituted by —, —COO— or —OCO—, and one or non-adjacent two or more —CH 2 — in the group represents More preferably, each independently represents an alkyl group having 1 to 8 carbon atoms which may be substituted by -O-, -CO-, -COO- or -OCO-, more preferably an alkoxyl group, Particularly preferred is a group, an ethoxy group, an n-propoxy group, an n-butoxy group or an n-pentoxy group.
一般式(i)において、Ri3、Ri4、Ri6及びRi7は水素を表わすことが好ましい。 In the general formula (i), R i3 , R i4 , R i6 and R i7 preferably represent hydrogen.
一般式(i)で表される化合物のうち、好ましい具体的な化合物としては、以下の式(i−1)〜式(i−135)で表される化合物が挙げられる。 Among the compounds represented by the general formula (i), preferable specific compounds include compounds represented by the following formulas (i-1) to (i-135).
本発明の化合物の製造方法は、特に限定されるものではないが、例えば以下の手順によって製造することができる。 Although the manufacturing method of the compound of this invention is not specifically limited, For example, it can manufacture by the following procedures.
化合物(a)(100mmol)、イミダゾール(8.2g、120mmol)、ジクロロメタン(100mL)を混合し、氷冷下、トリエチルシリルクロリド(18.1g、120mmol)を滴下する。得られた反応溶液を室温にて1時間撹拌後、水及びジクロロメタンを加えて分液し、水層をジクロロメタンで抽出し、あわせた有機層を水、飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥する。粗成生物中の溶媒を減圧留去後、シリカゲルカラムクロマトグラフィー(シリカゲル25g、移動相:ヘキサン)により精製することにより、定量的に化合物(b)を液体として得られる。 Compound (a) (100 mmol), imidazole (8.2 g, 120 mmol) and dichloromethane (100 mL) are mixed, and triethylsilyl chloride (18.1 g, 120 mmol) is added dropwise under ice cooling. The resulting reaction solution was stirred at room temperature for 1 hour, and water and dichloromethane were added for liquid separation, the aqueous layer was extracted with dichloromethane, and the combined organic layer was washed with water and saturated brine, and anhydrous sodium sulfate was added. In addition, dry. The solvent in the crude product is distilled off under reduced pressure, and then purified by silica gel column chromatography (silica gel 25 g, mobile phase: hexane) to quantitatively obtain the compound (b) as a liquid.
窒素雰囲気下、上記化合物(b)(38mmol)、ジクロロビス[ジ−t−ブチル(p−ジメチルアミノフェニル)ホスフィノ]パラジウム(II)(1.3g、1.9mmol)、2mol/L炭酸カリウム水溶液(42mL、84mmol)及びTHF(50mL)を混合し、60℃に加熱する。加熱下、化合物(c)(42mmol)のTHF(25mL)溶液を滴下し、60℃にて1.5時間撹拌する。次いで、氷冷した反応液を、濃塩酸と氷の混合物に加え、1時間撹拌した。水層を分離後、トルエンで2回抽出し、有機層をあわせ、飽和食塩水で洗浄し、無水硫酸ナトリウムで乾燥する。粗生成物中の溶媒を減圧留去後、シリカゲルカラムクロマトグラフィー(シリカゲル15g、移動相:トルエン)により精製し、続いてトルエン/ヘキサン混合溶媒から再結晶することにより、一般式(i)で表される化合物を固体として得られる。
<一般式(ii)で表される化合物の製造方法>
本発明の一態様は、一般式(i)で表される化合物を製造中間体として用いる、一般式(ii)
Under a nitrogen atmosphere, the compound (b) (38 mmol), dichlorobis [di-t-butyl (p-dimethylaminophenyl) phosphino] palladium (II) (1.3 g, 1.9 mmol), 2 mol / L aqueous potassium carbonate solution ( 42 mL, 84 mmol) and THF (50 mL) are mixed and heated to 60 ° C. Under heating, a solution of compound (c) (42 mmol) in THF (25 mL) is added dropwise and stirred at 60 ° C. for 1.5 hours. Next, the ice-cooled reaction mixture was added to a mixture of concentrated hydrochloric acid and ice and stirred for 1 hour. The aqueous layer is separated and extracted twice with toluene. The organic layers are combined, washed with saturated brine, and dried over anhydrous sodium sulfate. After the solvent in the crude product was distilled off under reduced pressure, the residue was purified by silica gel column chromatography (silica gel 15 g, mobile phase: toluene), and then recrystallized from a toluene / hexane mixed solvent. Is obtained as a solid.
<Method for Producing Compound Represented by General Formula (ii)>
One embodiment of the present invention uses a compound represented by general formula (i) as a production intermediate.
(式中、Xi2、Ri1、Ri2、Ri3、Ri4、Ri5、Ri6及びRi7は前記一般式(i)におけるXi2、Ri1、Ri2、Ri3、Ri4、Ri5、Ri6及びRi7と同じ意味を表す。)で表されるジベンゾフラン誘導体の製造方法である。 (Wherein X i2 , R i1 , R i2 , R i3 , R i4 , R i5 , R i6 and R i7 are X i2 , R i1 , R i2 , R i3 , R i4 , It represents the same meaning as R i5 , R i6, and R i7 ).
本発明の化合物を製造中間体として用いることで、簡便な方法で化合物中にエーテル結合を生成し、ジベンゾフラン誘導体へ誘導することができる。すなわち、分子内環化反応を行えばよい。 By using the compound of the present invention as a production intermediate, an ether bond can be generated in the compound by a simple method and derived into a dibenzofuran derivative. That is, an intramolecular cyclization reaction may be performed.
上記製造方法によれば、従来の製造方法よりも高収率、短工程でジベンゾフラン誘導体を得られるため好ましい。 According to the said manufacturing method, since a dibenzofuran derivative can be obtained with a high yield and a short process rather than the conventional manufacturing method, it is preferable.
上記脱離反応に際しては、例えば以下の条件を採用することができる。 In the above elimination reaction, for example, the following conditions can be employed.
一般式(i)で表される化合物を塩基存在下、加熱して反応させることが好ましい。 It is preferable to react the compound represented by the general formula (i) by heating in the presence of a base.
なお、上記収率は、常法のGC分析により確認することができる。 The yield can be confirmed by a conventional GC analysis.
一般式(i)で表される化合物は、精製された単独の化合物として用いてもよく、フェノール類等の製造原料との混和状態のままで用いてもよい。後者の場合は、一般式(i)で表される化合物の単離工程を経ることなく、フェノール類等の製造原料から、一貫した連続工程としてジベンゾフラン誘導体までを製造してもよい。 The compound represented by the general formula (i) may be used as a purified single compound, or may be used in a mixed state with a raw material for production such as phenols. In the latter case, a dibenzofuran derivative may be produced as a consistent continuous process from production raw materials such as phenols without undergoing an isolation process for the compound represented by formula (i).
塩基としては、求核性が低く、フェノール性水酸基を脱プロトン化できる塩基性が必要であり、無機塩基が好ましく、水素化ナトリウム、炭酸セシウム、炭酸カリウムであることがさらに好ましい。 The base is low in nucleophilicity and needs to be basic enough to deprotonate a phenolic hydroxyl group, and is preferably an inorganic base, more preferably sodium hydride, cesium carbonate, or potassium carbonate.
加熱は以下の条件で行うことが好ましい。温度は、反応速度の観点から、60℃以上であることが好ましく、80℃以上であることがより好ましく、100℃以上であることがさらに好ましく、プロセスの簡便性から200℃以下であることが好ましく、150℃以下であることが好ましい。ただし、反応中必ずしも恒温に保つ必要はなく、上記範囲内であれば反応の進行に応じて温度を変動させてもよい。加熱時間は、生成物の収率の観点から、1時間以上であることが好ましい。 Heating is preferably performed under the following conditions. The temperature is preferably 60 ° C. or higher, more preferably 80 ° C. or higher, more preferably 100 ° C. or higher, and 200 ° C. or lower in terms of process simplicity. Preferably, it is 150 degrees C or less. However, it is not always necessary to keep the temperature constant during the reaction, and the temperature may be varied according to the progress of the reaction as long as it is within the above range. The heating time is preferably 1 hour or longer from the viewpoint of the yield of the product.
加熱は、反応制御の観点から、溶媒の存在下に行うことが好ましい。例えば、一般式(i)で表される化合物と塩基とを溶媒中に溶解もしくは分散させ、溶液もしくは分散液の状態で加熱することが好ましい。 Heating is preferably performed in the presence of a solvent from the viewpoint of reaction control. For example, it is preferable to dissolve or disperse the compound represented by the general formula (i) and the base in a solvent and to heat in a solution or dispersion state.
溶媒としては、特に限定されるものではないが、沸点が60℃以上の化合物であることが好ましく、DMF、DMSO、CH3CN、THF及びNMPからなる群から選択される一種又は二種以上を用いることがより好ましい。 The solvent is not particularly limited, preferably has a boiling point of a compound of the above 60 ℃, DMF, DMSO, CH 3 CN, one or two or more selected from the group consisting of THF and NMP More preferably, it is used.
上記反応を行う雰囲気は特に限定されないが、酸素及び水との反応性の高い試薬を用いる場合などは、窒素、アルゴン等の不活性雰囲気下にて行うことが好ましい。 The atmosphere in which the above reaction is performed is not particularly limited. However, when a reagent having high reactivity with oxygen and water is used, the reaction is preferably performed in an inert atmosphere such as nitrogen or argon.
上記製造方法によって得られた一般式(ii)で表される化合物乃至該化合物を含む混合物は、常法により精製することができる。
<一般式(ii)で表される化合物>
本発明の製造方法の目的化合物である、一般式(ii)
The compound represented by the general formula (ii) obtained by the above production method or a mixture containing the compound can be purified by a conventional method.
<Compound represented by formula (ii)>
General formula (ii) which is the target compound of the production method of the present invention
(式中、Xi2、Ri1、Ri2、Ri3、Ri4、Ri5、Ri6及びRi7は前記一般式(i)におけるXi2、Ri1、Ri2、Ri3、Ri4、Ri5、Ri6及びRi7と同じ意味を表す。)で表される化合物は、その構造について何ら限定されるものではない。ただし、一般式(ii)におけるRi1〜Ri7で表される各基の組み合わせによっては、本発明の製造方法の効果が低下するおそれがある。すなわち、Ri1〜Ri7で表される各基の組み合わせによっては、製造中間体として用いる一般式(i)で表される化合物の反応効率を阻害する可能性がある。 (Wherein X i2 , R i1 , R i2 , R i3 , R i4 , R i5 , R i6 and R i7 are X i2 , R i1 , R i2 , R i3 , R i4 , The compound represented by R i5 , R i6, and R i7 has the same meaning), and the structure thereof is not limited at all. However, depending on the combination of groups represented by R i1 to R i7 in the general formula (ii), the effect of the production method of the present invention may be reduced. That is, depending on the combination of each group represented by R i1 to R i7 , there is a possibility that the reaction efficiency of the compound represented by the general formula (i) used as the production intermediate is inhibited.
このような場合、一般式(i)で表される化合物のうち、上述した好ましい化合物群のいずれかを製造中間体として一般式(ii)で表される化合物を製造した上で、改めて当該化合物中に所望のRi1〜Ri7で表される各基の1つ又は2つ以上を導入すればよい。 In such a case, among the compounds represented by the general formula (i), after producing the compound represented by the general formula (ii) using any one of the above-mentioned preferred compound groups as a production intermediate, the compound is again produced. What is necessary is just to introduce | transduce 1 or 2 or more of each group represented by desired R <i1 > -R < i7 > in it.
これら一連の工程により一般式(ii)の化合物を製造する方法も、当然に本願発明の製造方法の範囲に含まれるものである。 The method for producing the compound of the general formula (ii) through these series of steps is naturally included in the scope of the production method of the present invention.
一般式(ii)で表される化合物のうち、好ましい具体的な化合物としては、以下の式(ii−1)〜式(ii−125)で表される化合物が挙げられる。 Among the compounds represented by the general formula (ii), preferred specific compounds include compounds represented by the following formulas (ii-1) to (ii-125).
以下に実施例を挙げて本発明を更に詳述するが、本発明はこれらの実施例に限定されるものではない。また、以下の実施例及び比較例の組成物における「%」は『質量%』を意味する。
以下、下記の略語を使用する。
Me:メチル基
Et:エチル基
iPr:イソプロピル基
Bu:ブチル基
Pent:ペンチル基
DMF:N,N−ジメチルホルムアミド
DMSO:ジメチルスルホキシド
NMP:N−メチルピロリドン
THF:テトラヒドロフラン
amphos:ジ−t−ブチル(p−ジメチルアミノフェニル)ホスフィン
NFSI:N−フルオロベンゼンスルホンイミド
DMAP:N,N−ジメチル−4−アミノピリジン
Cr:結晶
Sm:スメクチック相
Iso:等方性液体
(実施例1)
EXAMPLES The present invention will be described in further detail with reference to examples below, but the present invention is not limited to these examples. Further, “%” in the compositions of the following Examples and Comparative Examples means “% by mass”.
The following abbreviations are used below.
Me: methyl group Et: ethyl group iPr: isopropyl group Bu: butyl group Pent: pentyl group DMF: N, N-dimethylformamide DMSO: dimethyl sulfoxide NMP: N-methylpyrrolidone THF: tetrahydrofuran amphos: di-t-butyl (p -Dimethylaminophenyl) phosphine NFSI: N-fluorobenzenesulfonimide DMAP: N, N-dimethyl-4-aminopyridine Cr: crystal
Sm: Smectic phase Iso: Isotropic liquid (Example 1)
(1−1) 2−クロロ−6−フルオロフェノール(14.7g、100mmol)、イミダゾール(8.2g、120mmol)、ジクロロメタン(100mL)を混合し、氷冷下、トリエチルシリルクロリド(18.1g、120mmol)を滴下した。反応溶液を室温にて1時間撹拌後、水及びジクロロメタンを加えて分液し、水層をジクロロメタンで抽出し、あわせた有機層を水、飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。溶媒を減圧留去後、シリカゲルカラムクロマトグラフィー(シリカゲル25g、移動相:ヘキサン)により精製することにより、定量的に2−クロロ−6−フルオロフェノキシトリエチルシラン(27.1g)を無色液体として得た。 (1-1) 2-Chloro-6-fluorophenol (14.7 g, 100 mmol), imidazole (8.2 g, 120 mmol) and dichloromethane (100 mL) were mixed, and triethylsilyl chloride (18.1 g, 120 mmol) was added dropwise. The reaction solution is stirred at room temperature for 1 hour, and water and dichloromethane are added for liquid separation, the aqueous layer is extracted with dichloromethane, and the combined organic layer is washed with water and saturated brine, and dried over anhydrous sodium sulfate. did. After distilling off the solvent under reduced pressure, the residue was purified by silica gel column chromatography (silica gel 25 g, mobile phase: hexane) to quantitatively obtain 2-chloro-6-fluorophenoxytriethylsilane (27.1 g) as a colorless liquid. .
(1−2) 窒素雰囲気下、2−クロロ−6−フルオロフェノキシトリエチルシラン(10.0g、38mmol)、ジクロロビス[ジ−t−ブチル(p−ジメチルアミノフェニル)ホスフィノ]パラジウム(II)(1.3g、1.9mmol)、2mol/L炭酸カリウム水溶液(42mL、84mmol)及びTHF(50mL)を混合し、60℃に加熱した。加熱下、(4−エトキシ2,3−ジフルオロフェニル)ボロン酸(8.4g、42mmol)のTHF(25mL)溶液を滴下し、60℃にて1.5時間撹拌した。氷冷した反応液を、濃塩酸と氷の混合物に加え、1時間撹拌した。水層を分離後、トルエンで2回抽出し、有機層をあわせ、飽和食塩水で洗浄し、無水硫酸ナトリウムで乾燥させた。溶媒を減圧留去後、シリカゲルカラムクロマトグラフィー(シリカゲル15g、移動相:トルエン)により精製し、続いてトルエン/ヘキサン混合溶媒から再結晶することにより、4’−エトキシ−2’,3,3’−トリフルオロ−[1,1’−ビフェニル]−2−オール(5.7g、収率56%)を橙色固体として得た。
(実施例2)
(1-2) Under a nitrogen atmosphere, 2-chloro-6-fluorophenoxytriethylsilane (10.0 g, 38 mmol), dichlorobis [di-t-butyl (p-dimethylaminophenyl) phosphino] palladium (II) (1. 3 g, 1.9 mmol), 2 mol / L aqueous potassium carbonate solution (42 mL, 84 mmol) and THF (50 mL) were mixed and heated to 60 ° C. Under heating, a solution of (4-ethoxy2,3-difluorophenyl) boronic acid (8.4 g, 42 mmol) in THF (25 mL) was added dropwise and stirred at 60 ° C. for 1.5 hours. The ice-cooled reaction mixture was added to a mixture of concentrated hydrochloric acid and ice and stirred for 1 hour. The aqueous layer was separated and extracted twice with toluene. The organic layers were combined, washed with saturated brine, and dried over anhydrous sodium sulfate. After the solvent was distilled off under reduced pressure, purification was performed by silica gel column chromatography (silica gel 15 g, mobile phase: toluene), followed by recrystallization from a toluene / hexane mixed solvent to obtain 4′-ethoxy-2 ′, 3,3 ′. -Trifluoro- [1,1'-biphenyl] -2-ol (5.7 g, 56% yield) was obtained as an orange solid.
(Example 2)
(2−1) 窒素雰囲気下、水素化ナトリウム(60%、2.6g、65mmol)及びDMF(50mL)を室温で混合し、そこに4’−エトキシ−2’,3,3’−トリフルオロ−[1,1’−ビフェニル]−2−オール(14.5g、54mmol)のDMF(100mL)溶液を加えた。発泡の停止後、反応容器内をフローにより再度窒素置換し、徐々に100℃まで加温、5時間加熱撹拌した。放冷後、水及びトルエンを加えて分液し、水層をトルエンで抽出し、あわせた有機層を飽和食塩水で洗浄し、無水硫酸ナトリウムを加えて乾燥した。溶媒を減圧留去後、シリカゲルカラムクロマトグラフィー(シリカゲル15g、移動相:トルエン)により精製し、続いてアセトン/エタノール混合溶媒から再結晶することにより、3−エトキシ−4,6−ジフルオロジベンゾフラン(9.8g、収率73%)を白色固体として得た。 (2-1) Under a nitrogen atmosphere, sodium hydride (60%, 2.6 g, 65 mmol) and DMF (50 mL) were mixed at room temperature, and 4′-ethoxy-2 ′, 3,3′-trifluoro was mixed there. A solution of [1,1′-biphenyl] -2-ol (14.5 g, 54 mmol) in DMF (100 mL) was added. After stopping the foaming, the inside of the reaction vessel was again purged with nitrogen by flow, gradually heated to 100 ° C. and stirred with heating for 5 hours. After allowing to cool, water and toluene were added for liquid separation, the aqueous layer was extracted with toluene, and the combined organic layer was washed with saturated brine, and dried over anhydrous sodium sulfate. After distilling off the solvent under reduced pressure, the residue was purified by silica gel column chromatography (silica gel 15 g, mobile phase: toluene), and then recrystallized from a mixed solvent of acetone / ethanol to give 3-ethoxy-4,6-difluorodibenzofuran (9 0.8 g, 73% yield) was obtained as a white solid.
(2−2) 窒素雰囲気下、3−エトキシ−4,6−ジフルオロジベンゾフラン(4.7g、19mmol)のTHF(50mL)溶液に、1.6mol/Lノルマルブチルリチウムヘキサン溶液(14mL、23mmol)を−60℃で滴下し、1時間攪拌した後、ほう酸トリメチル(2.6g、25mmol)を−60℃で滴下し、0.5時間攪拌した。室温まで昇温させ、水及び飽和塩化アンモニウム水溶液を加え、水層をトルエン/THF混合溶媒で抽出後、飽和食塩水で洗浄し、無水硫酸ナトリウムで乾燥させた。溶媒を減圧留去し、得られた固体をトルエンで3回懸濁洗浄することにより、(7−エトキシ−4,6−ジフルオロジベンゾフラン−3−イル)ボロン酸(4.2g、収率76%)を白色固体として得た。 (2-2) Under a nitrogen atmosphere, a 1.6 mol / L normal butyl lithium hexane solution (14 mL, 23 mmol) was added to a THF (50 mL) solution of 3-ethoxy-4,6-difluorodibenzofuran (4.7 g, 19 mmol). After dropping at −60 ° C. and stirring for 1 hour, trimethyl borate (2.6 g, 25 mmol) was added dropwise at −60 ° C. and stirred for 0.5 hour. The temperature was raised to room temperature, water and a saturated aqueous ammonium chloride solution were added, the aqueous layer was extracted with a toluene / THF mixed solvent, washed with saturated brine, and dried over anhydrous sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained solid was suspended and washed three times with toluene to give (7-ethoxy-4,6-difluorodibenzofuran-3-yl) boronic acid (4.2 g, yield 76%). ) Was obtained as a white solid.
(2−3) (7−エトキシ−4,6−ジフルオロジベンゾフラン−3−イル)ボロン酸(4.2g、14mmol)及びTHF(20mL)の混合物に、室温にて過酸化水素水(30%水溶液、2.1g、18mmol)を滴下し、炭酸水素ナトリウム(36mg、0.4mmol)を加え、40℃にて5時間加熱撹拌した。氷冷下、亜硫酸ナトリウム10%水溶液、飽和食塩水を加え、水層を酢酸エチルで3回抽出後、あわせた有機層を飽和食塩水で洗浄し、無水硫酸ナトリウムで乾燥させた。溶媒を減圧留去後、シリカゲルカラムクロマトグラフィー(シリカゲル4g、移動相:トルエン/酢酸エチル=1/1)により精製し、続いてトルエン/ヘキサン混合溶媒より懸濁洗浄することにより、7−エトキシ−4,6−ジフルオロジベンゾフラン−3−オール(3.5g、収率98%)を得た。 (2-3) Hydrogen peroxide solution (30% aqueous solution) at room temperature in a mixture of (7-ethoxy-4,6-difluorodibenzofuran-3-yl) boronic acid (4.2 g, 14 mmol) and THF (20 mL) 2.1 g, 18 mmol) was added dropwise, sodium hydrogen carbonate (36 mg, 0.4 mmol) was added, and the mixture was heated and stirred at 40 ° C. for 5 hours. Under ice-cooling, a 10% aqueous sodium sulfite solution and saturated brine were added, and the aqueous layer was extracted three times with ethyl acetate. The combined organic layers were washed with saturated brine and dried over anhydrous sodium sulfate. After distilling off the solvent under reduced pressure, the residue was purified by silica gel column chromatography (silica gel 4 g, mobile phase: toluene / ethyl acetate = 1/1), and then suspended and washed with a toluene / hexane mixed solvent to obtain 7-ethoxy- 4,6-difluorodibenzofuran-3-ol (3.5 g, yield 98%) was obtained.
(2−4) 窒素雰囲気下、7−エトキシ−4,6−ジフルオロジベンゾフラン−3−オール(3.0g、11mmol)、1−ヨードペンタン(2.5g、12.5mmol)、炭酸カリウム(2.4g、17mmol)、DMF(12mL)の混合物を、40℃で5時間撹拌した。
室温まで冷却した反応溶液に水を加え、水層をトルエンで3回抽出後、あわせた有機層を水、飽和食塩水で洗浄し、無水硫酸ナトリウムで乾燥させた。溶媒を減圧留去後、シリカゲルカラムクロマトグラフィー(シリカゲル3.5g、移動相:トルエン/ヘキサン=1/1)により精製し、続いてアセトン/エタノールより2回再結晶することにより、3−エトキシ−4,6−ジフルオロ−7−(ペンチルオキシ)ジベンゾ[b,d]フラン(3.0g、収率81%)を得た。
相転移温度はCr 56 Sm 61 Iso
1H NMR:(CDCl3、TMS内部標準)δ(ppm)=0.94(t,3H,J=7.2Hz),1.49(m,7H),1.86(m,2H),4.12(t,2H,J=6.6Hz),4.22(q,2H,J=7.2Hz),6.98(dd,2H,J=8.4Hz,6.8Hz),7.47(d,2H,J=8.4Hz)
[M]:316
(実施例3)
(2-4) 7-Ethoxy-4,6-difluorodibenzofuran-3-ol (3.0 g, 11 mmol), 1-iodopentane (2.5 g, 12.5 mmol), potassium carbonate (2. 4 g, 17 mmol), DMF (12 mL) was stirred at 40 ° C. for 5 h.
Water was added to the reaction solution cooled to room temperature, and the aqueous layer was extracted three times with toluene. The combined organic layer was washed with water and saturated brine, and dried over anhydrous sodium sulfate. After distilling off the solvent under reduced pressure, the residue was purified by silica gel column chromatography (silica gel 3.5 g, mobile phase: toluene / hexane = 1/1), and then recrystallized twice from acetone / ethanol to give 3-ethoxy- 4,6-Difluoro-7- (pentyloxy) dibenzo [b, d] furan (3.0 g, 81% yield) was obtained.
The phase transition temperature is Cr 56 Sm 61 Iso.
1 H NMR: (CDCl 3 , TMS internal standard) δ (ppm) = 0.94 (t, 3H, J = 7.2 Hz), 1.49 (m, 7H), 1.86 (m, 2H), 4.12 (t, 2H, J = 6.6 Hz), 4.22 (q, 2H, J = 7.2 Hz), 6.98 (dd, 2H, J = 8.4 Hz, 6.8 Hz), 7 .47 (d, 2H, J = 8.4 Hz)
[M]: 316
(Example 3)
(2−2) 窒素雰囲気下、水素化ナトリウム(60%、24mg、0.5mmol)、DMSO(1mL)、及び4’−エトキシ−2’,3,3’−トリフルオロ−[1,1’−ビフェニル]−2−オール(134mg、0.5mmol)を室温で混合し、100℃まで加温、9時間加熱撹拌した。トルエンで希釈し、水にて洗浄した有機層をサンプルとし、GCにより分析を行った。GC面積比において、3−エトキシ−4,6−ジフルオロジベンゾフランの収率は90%であった。
(実施例4)
(2-2) Sodium hydride (60%, 24 mg, 0.5 mmol), DMSO (1 mL), and 4′-ethoxy-2 ′, 3,3′-trifluoro- [1,1 ′ under a nitrogen atmosphere -Biphenyl] -2-ol (134 mg, 0.5 mmol) was mixed at room temperature, heated to 100 ° C., and heated and stirred for 9 hours. An organic layer diluted with toluene and washed with water was used as a sample and analyzed by GC. In the GC area ratio, the yield of 3-ethoxy-4,6-difluorodibenzofuran was 90%.
(Example 4)
(2−3) 窒素雰囲気下、炭酸カリウム(138mg、1mmol)、NMP(1mL)、及び4’−エトキシ−2’,3,3’−トリフルオロ−[1,1’−ビフェニル]−2−オール(134mg、0.5mmol)を室温で混合し、100℃まで加温、9時間加熱撹拌した。トルエンで希釈し、水にて洗浄した有機層をサンプルとし、GCにより分析を行った。GC面積比において、3−エトキシ−4,6−ジフルオロジベンゾフランの収率は90%であった。
(比較例1)
特開2015−174864に記載の方法にならい、以下のような製造方法によりジフルオロジベンゾフランを得た。
(ステップ1〜ステップ8)
(2-3) In a nitrogen atmosphere, potassium carbonate (138 mg, 1 mmol), NMP (1 mL), and 4′-ethoxy-2 ′, 3,3′-trifluoro- [1,1′-biphenyl] -2- All (134 mg, 0.5 mmol) was mixed at room temperature, heated to 100 ° C., and heated and stirred for 9 hours. An organic layer diluted with toluene and washed with water was used as a sample and analyzed by GC. In the GC area ratio, the yield of 3-ethoxy-4,6-difluorodibenzofuran was 90%.
(Comparative Example 1)
Following the method described in JP-A-2015-174864, difluorodibenzofuran was obtained by the following production method.
(Step 1 to Step 8)
比較例1の方法だと、例えばジフルオロベンゾフラン骨格を得るまでに4工程必要であり(ステップ4)まで、更に、両末端にアルコキシ基を有するジフルオロベンゾフラン化合物を得るまでに8工程必要である(ステップ8まで)。 According to the method of Comparative Example 1, for example, 4 steps are required to obtain a difluorobenzofuran skeleton (step 4), and 8 steps are required to obtain a difluorobenzofuran compound having an alkoxy group at both ends (step 4). Up to 8).
一方、本発明の方法によると、所望の化合物、例えばジフルオロベンゾフラン骨格の化合物を1工程で得られる(実施例2の(2−1))。また、両末端にアルコキシ基を有するジフルオロベンゾフラン化合物を4工程で得られる(実施例2の(2−1)〜(2−4))。中間体の製造方法を工程数に加えたとしても、例えばジフルオロベンゾフラン骨格の化合物を3工程で、両末端にアルコキシ基を有するジフルオロベンゾフラン化合物を7工程で得られる。更に、比較例1の方法では、フッ素化反応を含む工程(ステップ1、ステップ4)があるが、該工程はNFSI(N−フルオロベンゼンスルホンイミド)などのフッ素化剤が分解により、毒性及び腐食性の非常に高いフッ化水素を発生する可能性があり、危険性が高い。一方、本発明では、危険を伴うフッ素化反応を含む工程(ステップ1、ステップ4)が無いため、より簡便に、且つ安全に、所望のジベンゾフラン化合物を得られる。 On the other hand, according to the method of the present invention, a desired compound, for example, a compound having a difluorobenzofuran skeleton can be obtained in one step ((2-1) of Example 2). Moreover, the difluoro benzofuran compound which has an alkoxy group in both terminal is obtained in 4 processes ((2-1)-(2-4) of Example 2). Even if the production method of the intermediate is added to the number of steps, for example, a difluorobenzofuran skeleton compound can be obtained in 3 steps, and a difluorobenzofuran compound having an alkoxy group at both ends can be obtained in 7 steps. Furthermore, in the method of Comparative Example 1, there are processes (Step 1 and Step 4) including a fluorination reaction, and the process involves toxicity and corrosion due to decomposition of a fluorinating agent such as NFSI (N-fluorobenzenesulfonimide). Highly dangerous hydrogen fluoride may be generated, and the danger is high. On the other hand, in the present invention, since there is no process (Step 1, Step 4) including a dangerous fluorination reaction, a desired dibenzofuran compound can be obtained more easily and safely.
Claims (7)
で表される化合物。 Formula (i)
A compound represented by
で表されるジベンゾフラン誘導体の製造方法。 A compound represented by the general formula (i) according to any one of claims 1 to 5, wherein the compound represented by the general formula (ii) is used as a production intermediate.
The manufacturing method of the dibenzofuran derivative represented by these.
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