WO2018221177A1 - Triazine peroxide derivative and polymerizable composition containing said compound - Google Patents
Triazine peroxide derivative and polymerizable composition containing said compound Download PDFInfo
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- WO2018221177A1 WO2018221177A1 PCT/JP2018/018484 JP2018018484W WO2018221177A1 WO 2018221177 A1 WO2018221177 A1 WO 2018221177A1 JP 2018018484 W JP2018018484 W JP 2018018484W WO 2018221177 A1 WO2018221177 A1 WO 2018221177A1
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- -1 Triazine peroxide Chemical class 0.000 title claims abstract description 120
- 239000000203 mixture Substances 0.000 title claims description 79
- 150000001875 compounds Chemical class 0.000 title claims description 77
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 18
- 125000001424 substituent group Chemical group 0.000 claims abstract description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 13
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims abstract description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 12
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims abstract description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 9
- 125000003118 aryl group Chemical group 0.000 claims abstract description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 7
- 125000002252 acyl group Chemical group 0.000 claims abstract description 6
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 6
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 5
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 5
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 6
- 239000003505 polymerization initiator Substances 0.000 claims description 44
- 125000004432 carbon atom Chemical group C* 0.000 claims description 30
- 238000010438 heat treatment Methods 0.000 claims description 24
- 229920005989 resin Polymers 0.000 claims description 22
- 239000011347 resin Substances 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 230000001678 irradiating effect Effects 0.000 claims description 11
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 6
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 3
- 150000002978 peroxides Chemical class 0.000 claims 1
- 125000006702 (C1-C18) alkyl group Chemical group 0.000 abstract 1
- 238000003786 synthesis reaction Methods 0.000 description 73
- 230000015572 biosynthetic process Effects 0.000 description 72
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 56
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical class ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 49
- 238000000034 method Methods 0.000 description 45
- 238000006243 chemical reaction Methods 0.000 description 37
- 150000003254 radicals Chemical class 0.000 description 35
- 239000000047 product Substances 0.000 description 29
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 27
- 239000002904 solvent Substances 0.000 description 25
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
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- 238000005160 1H NMR spectroscopy Methods 0.000 description 18
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- 238000002451 electron ionisation mass spectrometry Methods 0.000 description 18
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- 238000004458 analytical method Methods 0.000 description 17
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 16
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 16
- 239000007864 aqueous solution Substances 0.000 description 15
- 230000035945 sensitivity Effects 0.000 description 14
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 13
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- IWZSHWBGHQBIML-ZGGLMWTQSA-N (3S,8S,10R,13S,14S,17S)-17-isoquinolin-7-yl-N,N,10,13-tetramethyl-2,3,4,7,8,9,11,12,14,15,16,17-dodecahydro-1H-cyclopenta[a]phenanthren-3-amine Chemical compound CN(C)[C@H]1CC[C@]2(C)C3CC[C@@]4(C)[C@@H](CC[C@@H]4c4ccc5ccncc5c4)[C@@H]3CC=C2C1 IWZSHWBGHQBIML-ZGGLMWTQSA-N 0.000 description 7
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- 150000003440 styrenes Chemical class 0.000 description 1
- 235000011044 succinic acid Nutrition 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- PUGUQINMNYINPK-UHFFFAOYSA-N tert-butyl 4-(2-chloroacetyl)piperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(C(=O)CCl)CC1 PUGUQINMNYINPK-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- 239000012720 thermal barrier coating Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
- WIOADUFWOUUQCV-UHFFFAOYSA-N triphenylphosphanium dichloride Chemical compound [Cl-].[Cl-].C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 WIOADUFWOUUQCV-UHFFFAOYSA-N 0.000 description 1
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 1
- 235000019798 tripotassium phosphate Nutrition 0.000 description 1
- NHDIQVFFNDKAQU-UHFFFAOYSA-N tripropan-2-yl borate Chemical compound CC(C)OB(OC(C)C)OC(C)C NHDIQVFFNDKAQU-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/16—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to only one ring carbon atom
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/28—Oxygen or compounds releasing free oxygen
- C08F4/32—Organic compounds
- C08F4/36—Per-compounds with more than one peroxy radical
Definitions
- the present invention relates to a triazine peroxide derivative, a polymerizable composition containing a polymerization initiator containing the compound and a radical polymerizable compound, a cured product thereof, and a method for producing the cured product.
- radical polymerization initiators that generate radicals by heat, light or oxidation-reduction are widely used as polymerization initiators.
- the photopolymerization initiator can generate a radical by bond cleavage or hydrogen abstraction reaction by absorbing active energy rays such as light, and is used as a polymerization initiator for a radical polymerizable compound.
- ⁇ -hydroxyacetophenone derivatives, ⁇ -aminoacetophenone derivatives, acylphosphine oxide derivatives, halomethyltriazine derivatives, benzyl ketal derivatives, thioxanthone derivatives, and the like are used.
- the photopolymerizable composition comprising the photopolymerization initiator and the radical polymerizable compound as described above is quickly cured by light irradiation, from the viewpoint of fast curability and low VOC, a coating agent, paint, printing ink, It is applied to applications such as photosensitive printing plates, adhesives, and various photoresists.
- Patent Document 1 discloses a polymerization initiator containing, as an active ingredient, a benzophenone group-containing peroxyester having a peroxide bond (—O—O—) in a molecule that generates radicals by light or heat.
- Patent Document 2 discloses an adhesive composition comprising the polymerization initiator and a radical polymerizable compound, and by dual cure that performs curing by irradiation with light at room temperature and subsequent curing by heating, The adhesive exhibits strong adhesive strength and high durability.
- Dual cure type polymerizable compositions include, for example, curing of polymerizable compositions containing light-absorbing and scattering pigments and fillers at high concentrations, and black frames and touch panels around protective covers in flat panel display manufacturing processes. It is also effective for curing areas where light does not reach, such as the bottom of electrodes.
- Patent Document 3 discloses a halomethyltriazine derivative having a specific structure as a photopolymerization initiator having a triazine skeleton, and is known to be effective for photopolymerization.
- the benzophenone group-containing peroxyesters described in Patent Document 1 and Patent Document 2 do not sufficiently absorb light having a wavelength of 365 nm or the like emitted from a high-pressure mercury lamp or LED, and are therefore the most important photopolymerization initiator. Sensitivity, which is a basic characteristic, is not sufficient, and improvement of sensitivity is a problem.
- halomethyltriazine derivatives described in Patent Document 3 and the like cannot be used for thermal polymerization, and a cured film obtained using the compound as a photopolymerization initiator has high yellowness. Therefore, the said compound cannot be used as a polymerization initiator of the use as which high transparency is requested
- the present invention is capable of generating radicals by efficiently absorbing light having a wavelength of 365 nm emitted from a lamp such as a high-pressure mercury lamp or LED, and generating radicals by heat. Further, the present invention provides a triazine peroxide derivative that has both heat-polymerizable properties and that can reduce the yellowness of a cured product.
- the present invention provides a polymerizable composition containing a polymerization initiator containing the triazine peroxide derivative and a radical polymerizable compound, a cured product thereof, and a method for producing the cured product.
- the present invention relates to the general formula (1):
- R 1 and R 2 are each independently a methyl group or an ethyl group
- R 3 is an aliphatic hydrocarbon group having 1 to 5 carbon atoms, or an optionally substituted alkyl group having 6 to 6 carbon atoms.
- 9 represents an aromatic hydrocarbon group of 9
- n represents an integer of 0 to 2
- X is an aryl group represented by the general formula (2): Ar 1 , Ar 2 , Ar 3 , or Ar 4 .
- R 4 is an independent substituent, an alkyl group having 1 to 18 carbon atoms, represented by the general formula (3):
- R 5 —Y— represents a substituent, a nitro group, or a cyano group, and Y represents an oxygen atom or a sulfur atom, and R 5 represents any of an ether bond, a thioether bond, and a hydroxyl group at the terminal in the carbon skeleton.
- R 4 represents a triazine peroxide derivative represented by two adjacent general formulas (3): a hydrocarbon group that forms a 5- to 6-membered ring by R 5 —Y—.
- the present invention also includes a polymerizable composition containing (a) a polymerization initiator and (b) a radical polymerizable compound containing the triazine peroxide derivative, a cured product formed from the polymerizable composition, and the curing
- a polymerizable composition containing (a) a polymerization initiator and (b) a radical polymerizable compound containing the triazine peroxide derivative, a cured product formed from the polymerizable composition, and the curing
- the present invention relates to a method for manufacturing a product.
- the triazine peroxide derivative of the present invention can efficiently generate radicals by efficiently absorbing light having a wavelength of 365 nm or the like emitted from a lamp such as a high-pressure mercury lamp or LED, and has a peroxide bond in the molecule. And useful as a thermal polymerization initiator. Therefore, the polymerizable composition containing the triazine peroxide derivative and the radical polymerizable compound can be cured well by light irradiation and can be cured well by heat even in a dark part where light does not reach.
- halomethyltriazine derivatives release chloro radicals by photolysis, and aromatic chlorides as a by-product are presumed to be the cause of coloration, but the triazine peroxide derivatives of the present invention do not contain chlorine atoms, so The yellowness of the product can be reduced.
- the triazine peroxide derivative of the present invention can be represented by the following general formula (1).
- R 1 and R 2 are each independently a methyl group or an ethyl group
- R 3 is an aliphatic hydrocarbon group having 1 to 5 carbon atoms, or an optionally substituted alkyl group having 6 to 6 carbon atoms.
- 9 represents an aromatic hydrocarbon group of 9, n represents an integer of 0 to 2
- X is an aryl group represented by the general formula (2): Ar 1 , Ar 2 , Ar 3 , or Ar 4 .
- R 4 is an independent substituent, an alkyl group having 1 to 18 carbon atoms, represented by the general formula (3):
- R 5 —Y— represents a substituent, a nitro group, or a cyano group, and Y represents an oxygen atom or a sulfur atom, and R 5 represents any of an ether bond, a thioether bond, and a hydroxyl group at the terminal in the carbon skeleton.
- R 4 represents a hydrocarbon group forming a 5- to 6-membered ring by the two adjacent general formulas (3): R 5 —Y—.
- R 1 and R 2 independently represent a methyl group or an ethyl group.
- R 1 and R 2 are preferably methyl groups from the viewpoint of increasing the storage stability of the polymerizable composition because the decomposition temperature of the triazine peroxide derivative is high.
- R 3 is an aliphatic hydrocarbon group having 1 to 5 carbon atoms or an aromatic hydrocarbon group having 6 to 9 carbon atoms which may have an alkyl group.
- the alkyl group may be linear or branched.
- Specific examples of R 3 include a methyl group, an ethyl group, a propyl group, a 2,2-dimethylpropyl group, a phenyl group, and an isopropylphenyl group.
- a methyl group, an ethyl group, a propyl group, a 2,2-dimethylpropyl group, and a phenyl group are preferable from the viewpoint of easy synthesis of the triazine peroxide derivative. Since the decomposition temperature of the triazine peroxide derivative is high, the storage stability of the polymerizable composition is increased, and the methyl group and the ethyl group are more preferable from the viewpoint of high sensitivity to light of the lamp.
- n is represented by an integer of 0 to 2. From the viewpoint of easy synthesis of the triazine peroxide derivative, n is preferably 0 or 1. When n is 0, X is Ar 2 , Ar 3 , or Ar 4 , and when n is 1, X is Ar 1 to efficiently absorb the light of the lamp and to obtain a cured product From the viewpoint that the yellowness of can be reduced, it is more preferable.
- m is represented by an integer from 0 to 3.
- M is preferably 0 to 2 from the viewpoint of easy synthesis of the triazine peroxide derivative, and m is more preferably 1 from the viewpoint of efficiently absorbing the light of the lamp.
- R 4 is an independent substituent, an alkyl group having 1 to 18 carbon atoms, a general formula (3): a substituent represented by R 5 —Y—, a nitro group Or Y represents an oxygen atom or a sulfur atom, and R 5 has one or more of an ether bond, a thioether bond, and a hydroxyl group at the terminal in the carbon skeleton. It represents an optionally substituted hydrocarbon group having 1 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 9 carbon atoms which may have an alkyl group, or an acyl group having 1 to 8 carbon atoms. Alternatively, R 4 represents a hydrocarbon group that forms a 5- to 6-membered ring by two adjacent general formulas (3): R 5 —Y—.
- R 4 is an independent substituent from the viewpoint of efficiently absorbing the light of the lamp, and is an alkyl group having 1 to 8 carbon atoms, or a substituent represented by the general formula (3):
- R 5 —Y— Y represents an oxygen atom
- R 5 has 1 to 8 carbon atoms which may have any one or more of an ether bond and a hydroxyl group at the terminal in the carbon skeleton.
- a hydrocarbon group or an aromatic hydrocarbon group having 6 to 9 carbon atoms which may have an alkyl group, or R 4 is represented by two adjacent general formulas (3):
- R 5 —X— A hydrocarbon group forming a 5- to 6-membered ring is preferable.
- R 4 include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, n-hexyl, octyl, 2- Alkyl groups such as ethylhexyl group, dodecyl group, octadecyl group; methoxy group, ethoxy group, n-propyloxy group, isopropyloxy group, n-butyloxy group, sec-butyloxy group, tert-butyloxy group, n-pentyloxy group, Cyclopentyloxy group, n-hexyloxy group, cyclohexyloxy group, octyloxy group, 2-ethylhexyloxy group, dodecyloxy group, octadecyloxy group, 2-hydroxyethoxy group, 2-methoxyethoxy group,
- R 1 represents a methoxy group, an ethoxy group, 2- A hydroxyethoxy group is more preferred.
- substitution position of R 4 is not particularly limited, but when X is Ar 1 , it is preferable that at least one of R 4 is substituted at the 4-position of the benzene ring substituted with the triazine group, and X is Ar. In the case of 2 , at least one of R 4 is preferably substituted at the 4-position of a benzene ring different from the benzene ring substituted with the triazine group.
- R 4 When X is Ar 3 , at least one of R 4 is it is preferable substituted in the 4-position of the substituted triazine group in the 1-position when X is Ar 4, at least one R 4 is another benzene ring with the benzene ring to which a triazine group substituted
- the substitution at the 4-position is preferable in order to efficiently absorb the light of the lamp.
- the triazine peroxide derivative of the present invention is preferably compound 19, compound 23, compound 25, compound 26, compound 27, compound 28, compound 31, compound 32, compound 33, compound 35, compound 37, compound 38, compound 39, Compound 40, Compound 41, Compound 42, Compound 43, Compound 44, Compound 46, Compound 47, Compound 48 are mentioned, More preferably, Compound 25, Compound 26, Compound 31, Compound 32, Compound 35, Compound 37, Compound 38 are mentioned. , Compound 41, Compound 44, Compound 47, and Compound 48.
- the method for producing the triazine peroxide derivative represented by the general formula (1) is obtained, for example, by a step of obtaining a cyanuric chloride derivative (hereinafter also referred to as step (A)) as in the following reaction formula. And a method comprising reacting a cyanuric chloride derivative with hydroperoxide in the presence of an alkali (hereinafter also referred to as step (B)).
- step (A) and / or (B) the process of distilling off excess raw materials etc. (removal), and the refinement
- n, R 1 , R 2 , R 3 and X are the same as in the general formula (1).
- a commercially available product can be used as the cyanuric chloride derivative.
- it can synthesize
- a cyanuric chloride derivative when synthesized by a Grignard reaction, it can be synthesized according to a known synthesis method described in JP-A-6-179661.
- the aromatic compound Z in the step (A) an aromatic compound represented by a chlorine atom, a bromine atom, or an iodine atom can be used.
- a cyanuric chloride derivative can be synthesized by preparing a Grignard reagent by reacting an aromatic compound with magnesium and then reacting the obtained Grignard reagent with cyanuric chloride.
- magnesium is preferably used in an amount of 0.8 to 2.0 mol, more preferably 1 to 1.5 mol, relative to 1 mol of the aromatic compound.
- the reaction initiator iodine, bromoethane, dibromoethane or the like may be used, and 0.0001 to 0.01 mol is preferably used with respect to 1 mol of the aromatic compound.
- the reaction temperature is preferably 0 to 70 ° C, more preferably 10 to 60 ° C.
- the reaction time is preferably 30 minutes to 20 hours, more preferably 1 hour to 10 hours.
- a solvent such as ethers such as tetrahydrofuran can be used.
- cyanuric chloride In the reaction between the Grignard reagent and cyanuric chloride, 0.7 to 1.5 mol of cyanuric chloride is preferably used relative to 1 mol of the aromatic compound, and 0.8 to 1.2 mol is preferably used. More preferred.
- the reaction temperature is preferably ⁇ 30 to 70 ° C., more preferably ⁇ 10 to 40 ° C.
- the reaction time is preferably 10 minutes to 10 hours, more preferably 30 minutes to 5 hours.
- the prepared Grignard reagent may be charged with cyanuric chloride, or the cyanuric chloride solution may be charged with Grignard reagent.
- a solvent such as ether such as tetrahydrofuran can be used.
- step (A) when a cyanuric chloride derivative is synthesized by a lithiation reaction, it can be synthesized according to a known synthesis method described in WO2012 / 096263.
- aromatic compound Z in the step (A) an aromatic compound represented by a chlorine atom, a bromine atom, or an iodine atom can be used.
- a cyanuric chloride derivative can be synthesized by adjusting a lithio compound by reacting an aromatic compound and a lithiating agent, and then reacting the obtained lithio compound with cyanuric chloride.
- Examples of the lithiating agent include alkyl lithiums such as methyl lithium, n-butyl lithium, s-butyl lithium, and t-butyl lithium; aryl lithiums such as phenyl lithium; lithium diisopropylamide, lithium bis (trimethylsilyl) amide, and the like.
- Examples include lithium amides, and n-butyllithium, s-butyllithium, t-butyllithium, and phenyllithium are preferable.
- the lithiating agent is preferably used in an amount of 0.8 to 3.0 mol, more preferably 1.0 to 2.2 mol, relative to 1 mol of the aromatic compound.
- the reaction temperature is preferably ⁇ 100 to 50 ° C., more preferably ⁇ 80 to 0 ° C.
- the reaction time is preferably 0.2 to 20 hours, more preferably 0.5 to 10 hours.
- a solvent such as ethers such as tetrahydrofuran can be used.
- lithio compound and cyanuric chloride In the reaction of the above-mentioned lithio compound and cyanuric chloride, it is preferable to use 0.7 to 1.5 mol, and 0.8 to 1.2 mol of cyanuric chloride to 1 mol of the aromatic compound. More preferred.
- the reaction temperature is preferably ⁇ 30 to 70 ° C., more preferably ⁇ 10 to 40 ° C.
- the reaction time is preferably 10 minutes to 10 hours, more preferably 30 minutes to 5 hours. It should be noted that cyanuric chloride may be added to the prepared lithio compound, or the lithium compound may be added to the cyanuric chloride solution.
- a solvent such as ethers such as tetrahydrofuran can be used.
- a cyanuric chloride derivative when synthesized by a Suzuki coupling reaction, it can be synthesized according to a known synthesis method described in WO2012 / 096263. For example, by reacting the above-mentioned lithio compound with a boron reagent, a boron compound in which Z of the aromatic compound is converted into a boronyl group or a boronic acid can be synthesized. Next, a cyanuric chloride derivative can be synthesized by reacting the obtained boron compound with cyanuric chloride. In addition, when the commercial item of a boron compound is sold, it can be used as it is.
- boron reagent examples include trimethyl borate, triisopropyl borate, 2-isopropoxy-4,4,5,5-tetramethyl-1,3,2-dioxaborolane, and the like.
- the boron reagent is preferably used in an amount of 0.8 to 3.0 mol, more preferably 1.0 to 2.0 mol, per 1 mol of the lithio compound.
- the reaction temperature is preferably ⁇ 100 to 50 ° C., more preferably ⁇ 80 to 20 ° C.
- the reaction time is preferably 10 minutes to 20 hours, more preferably 30 minutes to 10 hours.
- a solvent such as ethers such as tetrahydrofuran can be used.
- the cyanuric chloride is preferably used in an amount of 0.7 to 1.5 mol, more preferably 0.8 to 1.2 mol, relative to 1 mol of the boron compound. preferable.
- the reaction temperature is preferably ⁇ 30 to 70 ° C., more preferably ⁇ 10 to 40 ° C.
- the reaction time is preferably 10 minutes to 10 hours, more preferably 30 minutes to 5 hours. Note that cyanuric chloride may be added to the boron compound, or the boron compound may be added to the cyanuric chloride solution.
- a palladium catalyst and an alkali are preferably used, and a ligand may be added as necessary.
- the palladium catalyst examples include palladium acetate, tetrakistriphenylphosphine palladium, bis (triphenylphosphine) palladium dichloride, (bis (diphenylphosphino) ferrocene) palladium dichloride-methylene chloride complex, and the like.
- alkali examples include inorganic bases such as alkali metal salts such as sodium carbonate, sodium bicarbonate, sodium acetate, potassium acetate and potassium phosphate; organic bases such as triethylamine.
- inorganic bases such as alkali metal salts such as sodium carbonate, sodium bicarbonate, sodium acetate, potassium acetate and potassium phosphate
- organic bases such as triethylamine.
- Examples of the ligand include organic compounds such as triphenylphosphine, tricyclohexylphosphine, 2,2′-bis (diphenylphosphino) -1,1′-binaphthalene, and 2-dicyclohexylphosphino-2,6′-dimethoxybiphenyl. Examples thereof include phosphorus-based ligands.
- ethers such as tetrahydrofuran and 1,4-dioxane; alcohols such as methanol and 2-propanol; aromatic hydrocarbons such as toluene and xylene; N, N-dimethyl Organic solvents such as amides such as formamide can be used.
- the said organic solvent may be used independently and may use 2 or more types together. Furthermore, a mixed solvent of the organic solvent and water can be used.
- step (A) when a cyanuric chloride derivative is synthesized by Friedel-Crafts reaction, it can be synthesized according to a known synthesis method described in US Pat.
- a cyanuric chloride derivative can be synthesized by reacting an aromatic compound with cyanuric chloride in the presence of a Lewis acid such as aluminum chloride.
- Lewis acid examples include aluminum chloride, aluminum bromide, iron chloride (III), titanium chloride (IV), tin chloride (IV), zinc chloride, bismuth (III) triflate, hafnium (IV) triflate, boron trifluoride.
- a diethyl ether complex or the like can be used.
- the cyanuric chloride is preferably used in an amount of 0.7 to 1.5 mol, more preferably 0.8 to 1.2 mol, per mol of the aromatic compound.
- Aluminum chloride is preferably used in an amount of 1.0 to 3.0 mol, more preferably 1.0 to 2.0 mol, per 1 mol of the aromatic compound.
- the reaction temperature is preferably ⁇ 50 to 60 ° C., more preferably 0 to 40 ° C.
- the reaction time is preferably 10 minutes to 10 hours, more preferably 30 minutes to 5 hours.
- Aluminum chloride may be added to the solution of the aromatic compound and cyanuric chloride, or the aromatic compound may be added to the solution of cyanuric chloride and aluminum chloride.
- a solvent such as dichloromethane, 1,2-dichloroethane, xylene can be used.
- the method for producing the triazine peroxide derivative represented by the general formula (1) is not particularly limited, but according to the known method for synthesizing triazine peroxide described in Japanese Patent Publication No. 45-39468. Can be synthesized.
- the triazine peroxide derivative is obtained by the step (B) of reacting the cyanuric chloride derivative obtained in the above step (A) with hydroperoxide in the presence of an alkali.
- the hydroperoxide is preferably reacted in an amount of 1.8 mol or more, and 2.0 mol or more with respect to 1 mol of the cyanuric chloride derivative from the viewpoint of increasing the yield of the target product. And more preferably 5.0 mol or less, and more preferably 3.8 mol or less.
- Hydroperoxide is commercially available, and when there is no commercial product, it can be synthesized according to a known synthesis method described in JP-A No. 58-72557.
- the reaction temperature is preferably ⁇ 10 ° C. or higher, more preferably 0 ° C. or higher, and 40 ° C. or lower from the viewpoint of increasing the yield of the target product. Is preferable, and it is more preferable that it is 30 degrees C or less.
- the reaction time varies depending on the raw materials, reaction temperature, etc., and thus cannot be determined unconditionally.
- 10 minutes to 6 hours is preferable.
- the alkali used is not particularly limited, but sodium hydroxide, potassium hydroxide, lithium hydroxide, potassium carbonate, sodium carbonate, sodium bicarbonate, pyridine, ⁇ -picoline, ⁇ -picoline, Examples thereof include dimethylaminopyridine, triethylamine, tributylamine, N, N-diisopropylethylamine, 1,5-diazabicyclo [4.3.0] -5-nonene.
- the alkali is preferably used in an amount of 1.8 mol or more, more preferably 2.0 mol or more, with respect to 1 mol of the cyanuric chloride derivative, from the viewpoint of increasing the yield of the target product. It is preferable to use 0 mol or less, and it is more preferable to use 3.8 mol or less.
- the reaction when the cyanuric chloride derivative is liquid, the reaction can be performed without using an organic solvent. Moreover, when the cyanuric chloride derivative is solid, it is preferable to use an organic solvent.
- the organic solvent is not particularly limited because the solubility varies depending on the type of cyanuric chloride derivative.
- aromatic hydrocarbons such as toluene, xylene, and ethylbenzene, ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone, tetrahydrofuran And ethers such as dioxane, esters such as ethyl acetate and butyl acetate, and halogenated hydrocarbons such as methylene chloride and chloroform.
- the said organic solvent may be used independently and may use 2 or more types together.
- the amount of the organic solvent used is usually about 30 to 500 parts by mass with respect to 100 parts by mass of the total amount of raw materials.
- the organic solvent may be removed after the step (B) to take out the triazine peroxide derivative, and the triazine peroxide derivative is used as a diluted product of the organic solvent in order to improve handling and reduce the risk of thermal decomposition. May be used.
- the step (B) can be performed under normal pressure and air, but may be performed under a nitrogen stream or a nitrogen atmosphere.
- the purification step in order to remove surplus raw materials and by-products, for example, ion-exchanged water or basic such as sodium hydrogen carbonate, potassium hydrogen carbonate, sodium carbonate, potassium carbonate, sodium hydroxide, potassium hydroxide, etc.
- a step of purifying the target product by washing with an aqueous solution, an aqueous sodium sulfite solution or the like can be mentioned.
- the polymerizable composition of the present invention contains (a) a polymerization initiator and (b) a radical polymerizable compound. Furthermore, the polymerizable composition can impart developability by containing (c) an alkali-soluble resin. Moreover, the polymerizable composition can contain other components in appropriate combination.
- the polymerization initiator (a) of the present invention contains a triazine peroxide derivative represented by the general formula (1).
- the (a) polymerization initiator has a function of decomposing by active energy rays or heat, and the generated radicals start polymerization (curing) of the (b) radical polymerizable compound.
- a triazine peroxide derivative may be used independently and may use 2 or more types together.
- the (a) polymerization initiator may contain a polymerization initiator other than the triazine peroxide derivative (hereinafter also referred to as other polymerization initiator).
- a polymerization initiator other than the triazine peroxide derivative hereinafter also referred to as other polymerization initiator.
- the high sensitivity of the polymerizable composition for example, for a lamp that emits light of multiple wavelengths such as a high-pressure mercury lamp can be achieved.
- the types of pigments that absorb or scatter light contained in the polymerizable composition the film thickness of the cured product, etc.
- the surface curability, deep part curability, transparency, etc. of the polymerizable composition can be improved.
- ⁇ -Hydroxyacetophenone derivatives such as -2-methylpropiophenone, 2-hydroxy-1- (4- (4- (2-hydroxy-2-methylpropionyl) benzyl) phenyl) -2-methylpropan-1-one 2-methyl-4′-methylthio-2-morpholinopropiophenone, 2-benzyl-2- (N, N-dimethylamino) -1- (4-morpholinophenyl) butan-1-one, 2- (dimethyl ⁇ -aminoacetoph such as amino) -2- (4-methylbenzyl) -1- (4-morpholinophenyl) butan-1-one Enone derivatives; acyl phosphine oxide derivatives such as diphenyl-2,4,6-trimethylbenz
- the content of the (a) polymerization initiator is preferably 0.1 to 40 parts by mass, and 0.5 to 20 parts by mass with respect to 100 parts by mass of the (b) radical polymerizable compound. More preferably, it is 1 to 15 parts by mass. If the content of the (a) polymerization initiator is less than 0.1 parts by mass with respect to 100 parts by mass of the (b) radical polymerizable compound, the curing reaction does not proceed, which is not preferable.
- the solubility in (b) radical polymerizable compound reaches saturation, and
- the crystal of the polymerization initiator is precipitated during film formation of the adhesive composition and the surface of the film becomes rough, or (a) the strength of the coating film of the cured product increases due to an increase in the decomposition residue of the polymerization initiator. Is not preferred because it may decrease.
- the ratio of another polymerization initiator is 80 mass% or less in (a) polymerization initiator, and is 50 masses. More preferably, it is% or less.
- radically polymerizable compound (b) of the present invention a compound having an ethylenically unsaturated group can be preferably used.
- radical polymerizable compounds include (meth) acrylic acid esters, styrenes, maleic acid esters, fumaric acid esters, itaconic acid esters, cinnamic acid esters, crotonic acid esters, and vinyl ethers. Vinyl esters, vinyl ketones, allyl ethers, allyl esters, N-substituted maleimides, N-vinyl compounds, unsaturated nitriles, olefins and the like. Among these, it is preferable to contain (meth) acrylic acid esters having high reactivity.
- a radically polymerizable compound may be used independently and may use 2 or more types together.
- monofunctional compounds and polyfunctional compounds can be used as the (meth) acrylic acid esters.
- Monofunctional compounds include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, tert-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) Alkyl (meth) acrylates such as acrylate; cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) Ester compounds of (meth) acrylic acid and alicyclic alcohols such as acrylate, 2-ethyl-2-adamantyl (meth) acrylate; aryl (meth) such as pheny
- Monomers having fluorine atoms (meth) acrylic acid, succinic acid mono (2- (meth) acryloyloxyethyl), phthalic acid mono (2- (meth) acryloyloxyethyl), maleic acid mono (2- (meth) acryloyl) Oxyethyl), ⁇ -carboxy-polycaprolactone mono (me A) Monomers having a carboxyl group such as acrylate.
- polyfunctional compound examples include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, glycerin di (meth) acrylate, glycerin tri (meth) acrylate, glycerin propoxytri (meth) acrylate, trimethylol ethanetri (Meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol Di (meth) acrylate monoste
- the (meth) acrylic acid esters are used to improve the sensitivity of the polymerizable composition, reduce oxygen inhibition, and improve the mechanical strength and hardness, heat resistance, durability, and chemical resistance of the cured coating film.
- an ester compound of the polyhydric alcohol and (meth) acrylic acid is preferable, and in particular, trimethylolethane triacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, di Pentaerythritol hexaacrylate is preferred.
- copolymer obtained from the said (b) radically polymerizable compound can be added to the said polymeric composition.
- the polymerizable composition can be suitably used as a negative resist by further blending (c) an alkali-soluble resin.
- an alkali-soluble resin As alkali-soluble resin, what is generally used for a negative resist can be used, and it will not be specifically limited if it is resin soluble in alkaline aqueous solution, However, It should be resin containing a carboxyl group. preferable.
- Alkali-soluble resin may be used independently and may use 2 or more types together.
- (c) alkali-soluble resin of the present invention for example, a carboxyl group-containing (meth) acrylic acid ester copolymer, a carboxyl group-containing epoxy acrylate resin, and the like are preferably used.
- the carboxyl group-containing (meth) acrylic acid ester copolymer is at least one selected from the above-mentioned monofunctional compounds of (meth) acrylic acid esters (excluding the monomer having a carboxyl group), ) Acrylic acid, dimer of (meth) acrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl benzoic acid, cinnamic acid, succinic acid mono (2- (meth) acryloyloxyethyl), phthalic acid mono Ethylenically unsaturated groups such as (2- (meth) acryloyloxyethyl), mono (2- (meth) acryloyloxyethyl) maleate, ⁇ -carboxy-polycaprolactone mono (meth) acrylate, and acid anhydrides thereof It is a copolymer containing at least one selected from the containing carboxylic acids.
- carboxyl group-containing (meth) acrylic acid ester copolymer examples include a copolymer of methyl methacrylate, cyclohexyl methacrylate, and methacrylic acid. Further, styrene, ⁇ -methylstyrene, N-vinyl-2-pyrrolidone, N-methylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide, diethyl fumarate, diethyl itaconate and the like may be copolymerized.
- the carboxyl group-containing (meth) acrylic acid ester copolymer is a reaction of ethylenically unsaturated groups, etc., from the viewpoint of achieving both the developability of the negative resist and the film properties such as heat resistance, hardness, and chemical resistance.
- a carboxyl group-containing (meth) acrylic acid ester copolymer in which a functional group is introduced into the side chain is also preferably used.
- an ethylenically unsaturated group into the above side chain for example, a part of the carboxyl group of the carboxyl group-containing (meth) acrylic ester copolymer, an epoxy group in the molecule such as glycidyl (meth) acrylate
- a method of adding a compound having an ethylenically unsaturated group a method of adding an ethylenically unsaturated group-containing monocarboxylic acid such as methacrylic acid to an epoxy group- and carboxyl group-containing (meth) acrylic acid ester copolymer
- a method of adding a compound having an isocyanate group and an ethylenically unsaturated group in a molecule such as 2- (meth) acryloyloxyethyl isocyanate to a hydroxyl group- and carboxyl group-containing (meth) acrylic acid ester copolymer.
- carboxyl group-containing epoxy acrylate resin a compound obtained by further reacting an acid anhydride with an epoxy acrylate resin which is a reaction product of an epoxy compound and the ethylenically unsaturated group-containing carboxylic acid is preferable.
- epoxy resin examples include (o, m, p-) cresol novolak type epoxy resin, phenol novolak type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, trisphenol methane type epoxy resin, and bisphenyl fluorene.
- Examples of the acid anhydride include maleic anhydride, succinic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, endomethylenetetrahydrophthalic anhydride, and chloredinic anhydride. , Trimellitic anhydride, pyromellitic anhydride, benzophenonetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, itaconic anhydride and the like.
- the acid anhydride group remaining after the reaction is hydrolyzed to obtain a carboxyl group.
- ethylenic double bonds can be increased by using maleic anhydride containing an ethylenically unsaturated group.
- the acid value of the (c) alkali-soluble resin is preferably 20 to 300 mgKOH / g, and more preferably 40 to 180 mg / KOH.
- the acid value is less than 20 mgKOH / g, the solubility in an alkaline aqueous solution is poor, and it becomes difficult to develop the unexposed area, which is not preferable.
- the acid value is more than 300 mgKOH / g, the exposed part tends to be detached from the substrate during development, which is not preferable.
- the weight average molecular weight of the (c) alkali-soluble resin is preferably 1,000 to 100,000, more preferably 1,500 to 30,000.
- a weight average molecular weight of less than 1,000 is not preferred because the heat resistance and hardness of the exposed area are poor.
- the weight average molecular weight can be measured by a gel permeation chromatography (GPC) method.
- HLC-8220GPC manufactured by Tosoh Corporation
- TSKgelHZM-M manufactured by Tosoh Corporation
- tetrahydrofuran is used as a developing solvent
- column temperature is 40 ° C.
- flow rate is 0.3 ml / min.
- the chromatography can be performed under the conditions of RI detector, sample injection concentration 0.5 mass%, injection amount 10 microliters, and the weight average molecular weight in terms of polystyrene can be obtained.
- the ratio of (c) alkali-soluble resin is preferably 10 to 70% by mass, and more preferably 15 to 60% by mass in the total solid content of the polymerizable composition.
- the ratio is less than 10% by mass, the developability is poor, which is not preferable.
- the ratio is more than 70% by mass, the pattern shape reproducibility and heat resistance are lowered, which is not preferable.
- the (c) alkali-soluble resin may be a product obtained by isolating and purifying an alkali-soluble resin which is an active ingredient after the synthesis reaction, or a reaction solution obtained by the synthesis reaction, a dried product thereof, or the like. You can also.
- the polymerizable composition can be cured by heating at a low temperature.
- a curing accelerator for example, an amine compound, a thiourea compound, a 2-mercaptobenzimidazole compound, an orthobenzoixsulfimide, a fourth-period transition metal compound compound, or the like can be used.
- a hardening accelerator may be used independently and may use 2 or more types together.
- the amine compound is preferably a tertiary amine, for example, N, N-dimethylaniline, N, N-dimethyltoluidine, N, N-diethylaniline, N, N-bis (2-hydroxyethyl) -p- Toluidine, ethyl 4- (dimethylamino) benzoate, (2-methacryloyloxy) ethyl 4-dimethylaminobenzoate and the like.
- a tertiary amine for example, N, N-dimethylaniline, N, N-dimethyltoluidine, N, N-diethylaniline, N, N-bis (2-hydroxyethyl) -p- Toluidine, ethyl 4- (dimethylamino) benzoate, (2-methacryloyloxy) ethyl 4-dimethylaminobenzoate and the like.
- thiourea examples include acetylthiourea, N, N′dibutylthiourea, and the like.
- Examples of the 2-mercaptobenzimidazole compound include 2-mercaptobenzimidazole, 2-mercaptomethylbenzimidazole, 2-mercaptomethoxybenzimidazole, and the like.
- the compound of the fourth period transition metal compound can be selected from organic acid salts such as vanadium, cobalt, copper, or metal chelate compounds, for example, cobalt octylate, cobalt naphthenate, copper naphthenate, vanadium naphthenate. , Copper acetylacetonate, manganese acetylacetonate, vanadyl acetylacetonate and the like.
- organic acid salts such as vanadium, cobalt, copper, or metal chelate compounds, for example, cobalt octylate, cobalt naphthenate, copper naphthenate, vanadium naphthenate.
- the curing accelerator is preferably blended immediately before using the polymerizable composition.
- the content of the curing accelerator is preferably 0.1 to 20 parts by mass and more preferably 0.2 to 10 parts by mass with respect to 100 parts by mass of the (b) radical polymerizable compound.
- the polymerizable composition is generally used in applications such as coating agents, paints, printing inks, photosensitive printing plates, adhesives, various photoresists such as color resists and black resists.
- Additives can be blended.
- additives include sensitizers (isopropylthioxanthone, diethylthioxanthone, 4,4′-bis (diethylamino) benzophenone, 9,10-dibutoxyanthracene, coumarin, ketocoumarin, acridine orange, camphorquinone, etc.), polymerization inhibition Agents (p-methoxyphenol, hydroquinone, 2,6-di-t-butyl-4-methylphenol, phenothiazine, etc.), ultraviolet absorbers, infrared absorbers, light stabilizers, antioxidants, leveling agents, surface conditioners , Surfactant, thickener, antifoaming agent, adhesion promoter, plasticizer, epoxy compound, thiol compound,
- the content of the additive is appropriately selected according to the purpose of use and is not particularly limited, but is usually 500 parts by mass or less with respect to 100 parts by mass of the (b) radical polymerizable compound.
- the amount is preferably 100 parts by mass or less.
- the solvent may be further added to the polymerizable composition in order to improve the viscosity, paintability, and smoothness of the cured film.
- the solvent is capable of dissolving or dispersing the (a) polymerization initiator, the (b) radical polymerizable compound, the (c) alkali-soluble resin, and the other components, and is volatilized at a drying temperature. If it is a solvent, it will not restrict
- Examples of the solvent include water, alcohol solvents, carbitol solvents, ester solvents, ketone solvents, ether solvents, lactone solvents, unsaturated hydrocarbon solvents, cellosolve acetate solvents, carbitol acetate solvents.
- Examples include solvents, propylene glycol monomethyl ether acetate, and diethylene glycol dimethyl ether.
- a solvent may be used independently and may use 2 or more types together.
- the amount of the solvent used is preferably 10 to 1000 parts by mass and more preferably 20 to 500 parts by mass with respect to 100 parts by mass of the solid content of the polymerizable composition.
- ⁇ Method for Preparing Polymerizable Composition When adjusting the polymerizable composition, the (a) polymerization initiator, the (b) radical polymerizable compound, and, if necessary, the (c) alkali-soluble resin and the other components in a storage container. And then dissolved or dispersed in accordance with a conventional method using a paint shaker, bead mill, sand grind mill, ball mill, attritor mill, 2-roll mill, 3-roll mill or the like. Moreover, you may filter through a mesh or a membrane filter etc. as needed.
- the (a) polymerization initiator may be added to the polymerizable composition from the beginning, but when the polymerizable composition is stored for a relatively long time.
- the (a) polymerization initiator is preferably dissolved or dispersed in the composition containing (b) radical polymerizability immediately before use.
- the cured product of the present invention is formed from the polymerizable composition.
- cured material is a manufacturing which includes any process of the process of irradiating the said polymeric composition with an active energy ray, and heating the said polymeric composition after apply
- Examples of the coating method include spin coating, bar coating, spray coating, dip coating, flow coating, slit coating, doctor blade coating, gravure coating, screen printing, offset printing, and inkjet.
- Various methods, such as a printing method and a dispenser printing method, are mentioned.
- Examples of the substrate include glass, silicon wafer, metal and plastic films and sheets, and three-dimensional molded products, and the shape of the substrate is not limited.
- the step of irradiating the polymerizable composition with active energy rays comprises (a) decomposing a polymerization initiator by irradiating active energy rays such as electron beam, ultraviolet ray, visible light, and radiation, and (b) radical polymerization.
- active energy rays such as electron beam, ultraviolet ray, visible light, and radiation
- radical polymerization irradiating active energy rays such as electron beam, ultraviolet ray, visible light, and radiation.
- a cured product can be obtained by polymerizing the active compound.
- the active energy ray is preferably light having an active energy ray wavelength of 250 to 450 nm, and more preferably light having a wavelength of 350 to 410 nm from the viewpoint of allowing rapid curing.
- a low pressure mercury lamp As the light source for the light irradiation, a low pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, an ultraviolet electrodeless lamp, a light emitting diode (LED), a xenon arc lamp, a carbon arc lamp, sunlight, a YAG laser, etc.
- a gas laser such as a solid-state laser, a semiconductor laser, or an argon laser can be used.
- curing can be performed by using a sensitizer that absorbs the light as the additive. .
- the exposure amount of the active energy ray should be appropriately set according to the wavelength and intensity of the active energy ray and the composition of the polymerizable composition.
- the exposure dose in the UV-A region is preferably 10 to 5,000 mJ / cm 2 , and more preferably 30 to 1,000 mJ / cm 2 .
- (a) polymerization initiator is completely by an active energy ray.
- the exposure amount should be set as appropriate so that it is not decomposed.
- a cured product in the step of heating the polymerizable composition, can be obtained by (a) decomposing the polymerization initiator with heat and (b) polymerizing the radical polymerizable compound.
- examples of the heating method include heating and ventilation heating.
- the heating method is not particularly limited, and examples thereof include an oven, a hot plate, infrared irradiation, electromagnetic wave irradiation, and the like.
- a ventilation drying oven etc. are mentioned, for example.
- the higher the heating temperature the faster the decomposition rate of (a) the polymerization initiator.
- the decomposition rate is too high, there are cases where the decomposition residue of (b) radical polymerizable compound increases.
- the lower the heating temperature the slower the decomposition rate of (a) the polymerization initiator, and thus a longer time is required for curing. Therefore, the heating temperature and the heating time should be appropriately set depending on the composition of the polymerizable composition.
- the heating temperature is preferably 50 to 230 ° C, and more preferably 100 to 160 ° C.
- heating temperature can be arbitrarily adjusted at 160 degreeC from room temperature with the kind and compounding quantity.
- the heating time is preferably 1 to 180 minutes, and more preferably 5 to 120 minutes.
- a colored pigment that absorbs or scatters light by performing a heating process after a process of irradiating the polymerizable composition with active energy rays. This is preferable because it can efficiently cure the deep part of the coating film of the polymerization composition containing a high concentration of light and a portion where light is blocked and light does not reach.
- the method for producing the cured product may include a drying step.
- a drying step when applying the step of irradiating with the active energy ray after applying the polymerizable composition on the substrate, it is preferable to provide a drying step before the step of irradiating with the active energy ray.
- examples of the method for drying the solvent include heat drying, ventilation heat drying, and reduced pressure drying.
- the method of heat drying is not particularly limited, and examples thereof include an oven, a hot plate, infrared irradiation, electromagnetic wave irradiation, and the like.
- a ventilation drying oven etc. are mentioned, for example.
- the temperature of the polymerizable composition is lower than the preset drying temperature due to the latent heat of vaporization of the solvent, so that it is possible to ensure a long time until the polymerizable composition is gelled. Since the time until gelation is affected by the drying method, film thickness, and the like, the drying temperature and time should be appropriately set including the selection of the solvent. As an example, the drying temperature is preferably 20 to 120 ° C., and more preferably 40 to 100 ° C. The drying time is preferably 1 to 60 minutes, and more preferably 1 to 30 minutes. Further, by using the polymerization inhibitor, it is possible to ensure a long time until gelation. The triazine peroxide derivative is decomposed by heat, but the decomposition rate of the compound when heated at 80 ° C. for 5 minutes is about 0.1%. There is not much thickening or gelation.
- the dry film thickness (film thickness of the cured product) of the polymerizable composition is appropriately set depending on the application, but is preferably 0.05 to 300 ⁇ m, more preferably 0.1 to 100 ⁇ m. .
- a pattern can be formed by a photolithography method.
- the polymerizable composition is applied to a substrate and dried as necessary to form a dry film. Then, by irradiating the dry film with active energy rays through a mask, the radical polymerizable compound (b) is polymerized in the exposed portion to form a cured film.
- a highly accurate pattern shape can be produced without using a mask by direct writing using a laser.
- the unexposed portion is developed and removed with an alkaline developer such as an aqueous solution of 0.3 to 3% by mass of sodium carbonate to obtain a patterned cured film.
- an alkaline developer such as an aqueous solution of 0.3 to 3% by mass of sodium carbonate
- post-baking is performed as post-drying at 180 to 250 ° C. for 20 to 90 minutes for the purpose of improving the adhesion between the cured film and the substrate. In this way, a desired pattern based on the cured film is formed.
- the polymerizable composition of the present invention includes a hard coating agent, a coating agent for optical disks, a coating agent for optical fibers, a coating material for mobile terminals, a coating material for home appliances, a coating material for cosmetic containers, an inner surface antireflection coating material for optical elements, and a high / low refractive index.
- Coating agents thermal barrier coating agents, heat dissipation coating agents, anti-fogging agents, and other paints and coating agents; offset printing ink, gravure printing ink, screen printing ink, inkjet printing ink, conductive ink, insulating ink, light guide plate ink Photosensitive printing plates; nanoimprint materials; 3D printer resins; holographic recording materials; dental materials; waveguide materials; black stripes for lens sheets; green sheets and electrode materials for capacitors; adhesives for FPDs; HDD adhesive, optical pickup adhesive, image sensor adhesive, organic Adhesives and sealants such as L sealant, OCA for touch panel, OCR for touch panel; color resist, black resist, color filter protective film, photo spacer, black column spacer, frame resist, TFT wiring photoresist, interlayer insulation Resist for FPD such as film; Resist for printed circuit board such as liquid solder resist, dry film resist; Semiconductor materials such as semiconductor resist, buffer coat film, etc.
- Table 3 shows the results of Compound R1 and Compound R2.
- Compound R1 was synthesized according to the production method described in JP-A-59-197401 and identified by EI-MS and 1 H-NMR.
- compound R2 Irgacure 184 (manufactured by BASF) was used.
- ⁇ max is the maximum absorption wavelength (nm)
- ⁇ max is the molar extinction coefficient at the maximum absorption wavelength (L ⁇ mol ⁇ 1 ⁇ cm ⁇ 1 )
- ⁇ 313 is the molar extinction coefficient at the wavelength of 313 nm (L ⁇ mol).
- ⁇ 1 ⁇ cm ⁇ 1 ) and ⁇ 365 indicate the molar extinction coefficient (L ⁇ mol ⁇ 1 ⁇ cm ⁇ 1 ) at a wavelength of 365 nm.
- an ultra-high pressure mercury lamp or a high-pressure mercury lamp has a wavelength of 365 nm (i-line) as a main wavelength and efficiently emits light having a wavelength of 313 nm (j-line).
- the triazine peroxide derivative of the present invention has a large molar extinction coefficient at a wavelength of 365 nm and a wavelength of 313 nm emitted from a high-pressure mercury lamp or the like with respect to the compound R1 having a benzophenone skeleton. Furthermore, a single light having a wavelength of 365 nm or the like is emitted from the LED, but compound 25, compound 26, compound 31, compound 32, compound 35, compound 37, compound 38, compound 40, compound 41, compound 44, compound 19 and Compound 48 are found to have a large molar extinction coefficient at a wavelength of 365 nm.
- DPHA is a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (trade name: Aronix M-402, manufactured by Toagosei Co., Ltd.); RD200 is a methyl methacrylate / methacrylic acid / cyclohexyl maleimide (mass%: 61/14/25) copolymer, weight average molecular weight: 17,000, acid value: 90 (synthetic product); EMK: 4,4'-bis (diethylamino) benzophenone (Tokyo Chemical Industry Reagent) F-477 is a fluorine-based leveling agent (trade name: Megafax F-477, manufactured by DIC Corporation); PGMEA indicates propylene glycol monomethyl ether acetate (Wako Pure Chemical Industries, Ltd.).
- UV-3700B is urethane acrylate (trade name: Purple light UV-3700B, manufactured by Nippon Synthetic Chemical Industry); IBOA is isobornyl acrylate (Tokyo Chemical Industry Reagent); THFA is tetrahydrofurfuryl acrylate (Tokyo Chemical Industry Reagent); TMPTA is trimethylolpropane triacrylate (Tokyo Chemical Industry Reagent); DMT indicates N, N-dimethyltoluidine (Tokyo Chemical Industry Reagent).
- the polymerizable composition (D) prepared as described above was applied to a PET film (trade name: Cosmo Shine A4300, manufactured by Toyobo Co., Ltd.) having a thickness of 100 ⁇ m by an applicator.
- a PET film (having a wavelength of 365 nm having a transmittance of less than 0.1%) applied to 50 ⁇ m and having a black coating on the surface was placed in a half region of the coating.
- irradiation of 100 mJ / cm ⁇ 2 > was performed using the conveyor type
- the black film-coated PET film was removed to expose the cured film, and the cured film portion was measured for degree of cure (%) by attenuated total reflection infrared spectroscopy (ATR-IR). .
- ATR-IR attenuated total reflection infrared spectroscopy
- the triazine peroxide derivative of the present invention and the polymerizable composition containing the compound have excellent sensitivity to light, and are characterized by having photocurability and thermosetting properties. it is obvious.
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Abstract
Description
本発明のトリアジンペルオキシド誘導体は、下記一般式(1)で表すことができる。
(式(2)中、mは0から3の整数を表し、R4は、独立した置換基であって、炭素数1~18のアルキル基、一般式(3):R5-Y-で表される置換基、ニトロ基、またはシアノ基を表し、前記Yは、酸素原子または硫黄原子を表し、前記R5は、炭素骨格中に、エーテル結合、チオエーテル結合、および、末端に水酸基のいずれか1つ以上を有していてもよい炭素数1~18の炭化水素基、アルキル基を有してもよい炭素数6~9の芳香族炭化水素基、または炭素数1~8のアシル基を表す。あるいは、R4は隣接する2つの前記一般式(3):R5-Y-により5~6員環を形成する炭化水素基を表す。) <Triazine peroxide derivative>
The triazine peroxide derivative of the present invention can be represented by the following general formula (1).
(In the formula (2), m represents an integer of 0 to 3, R 4 is an independent substituent, an alkyl group having 1 to 18 carbon atoms, represented by the general formula (3): R 5 —Y— Represents a substituent, a nitro group, or a cyano group, and Y represents an oxygen atom or a sulfur atom, and R 5 represents any of an ether bond, a thioether bond, and a hydroxyl group at the terminal in the carbon skeleton. Or a hydrocarbon group having 1 to 18 carbon atoms which may have one or more, an aromatic hydrocarbon group having 6 to 9 carbon atoms which may have an alkyl group, or an acyl group having 1 to 8 carbon atoms Alternatively, R 4 represents a hydrocarbon group forming a 5- to 6-membered ring by the two adjacent general formulas (3): R 5 —Y—.
前記一般式(1)で表されるトリアジンペルオキシド誘導体の製造方法は、例えば、下記反応式のように、塩化シアヌル誘導体を得る工程(以下、工程(A)とも称す)と、続いて、得られた塩化シアヌル誘導体と、ヒドロペルオキシドを、アルカリの存在下で、反応させる工程(以下、工程(B)とも称す)を含む方法が挙げられる。なお、上記の工程(A)および/または(B)の後には、余剰の原料等を減圧留去(除去)する工程や、精製工程を含んでもよい。
The method for producing the triazine peroxide derivative represented by the general formula (1) is obtained, for example, by a step of obtaining a cyanuric chloride derivative (hereinafter also referred to as step (A)) as in the following reaction formula. And a method comprising reacting a cyanuric chloride derivative with hydroperoxide in the presence of an alkali (hereinafter also referred to as step (B)). In addition, after said process (A) and / or (B), the process of distilling off excess raw materials etc. (removal), and the refinement | purification process may be included.
前記工程(A)において、グリニャール反応により、塩化シアヌル誘導体を合成する場合、特開平6-179661号公報等に記載の公知の合成法に準じて合成することができる。前記工程(A)における芳香族化合物のZは塩素原子、臭素原子、またはヨウ素原子で表される芳香族化合物を使用することができる。芳香族化合物とマグネシウムを反応させることでグリニャール試薬を調整し、次いで得られたグリニャール試薬を塩化シアヌルと反応させることにより塩化シアヌル誘導体を合成することができる。 <Synthesis of cyanuric chloride derivatives by Grignard reaction>
In the step (A), when a cyanuric chloride derivative is synthesized by a Grignard reaction, it can be synthesized according to a known synthesis method described in JP-A-6-179661. As the aromatic compound Z in the step (A), an aromatic compound represented by a chlorine atom, a bromine atom, or an iodine atom can be used. A cyanuric chloride derivative can be synthesized by preparing a Grignard reagent by reacting an aromatic compound with magnesium and then reacting the obtained Grignard reagent with cyanuric chloride.
前記工程(A)において、リチオ化反応により、塩化シアヌル誘導体を合成する場合、WO2012/096263公報等に記載の公知の合成法に準じて合成することができる。前記工程(A)における芳香族化合物のZは塩素原子、臭素原子、またはヨウ素原子で表される芳香族化合物を使用することができる。芳香族化合物とリチオ化剤を反応させることでリチオ化合物を調整し、次いで得られたリチオ化合物と塩化シアヌルを反応させることにより塩化シアヌル誘導体を合成することができる。 <Synthesis of cyanuric chloride derivatives by lithiation reaction>
In the step (A), when a cyanuric chloride derivative is synthesized by a lithiation reaction, it can be synthesized according to a known synthesis method described in WO2012 / 096263. As the aromatic compound Z in the step (A), an aromatic compound represented by a chlorine atom, a bromine atom, or an iodine atom can be used. A cyanuric chloride derivative can be synthesized by adjusting a lithio compound by reacting an aromatic compound and a lithiating agent, and then reacting the obtained lithio compound with cyanuric chloride.
前記工程(A)において、鈴木カップリング反応により、塩化シアヌル誘導体を合成する場合、WO2012/096263公報等に記載の公知の合成法に準じて合成することができる。例えば、前述のリチオ化合物をホウ素試薬と反応させることによって、芳香族化合物のZがボロニル基またはボロン酸に変換されたホウ素化合物を合成することができる。次いで得られたホウ素化合物を塩化シアヌルと反応させることにより塩化シアヌル誘導体を合成することができる。なお、ホウ素化合物の市販品が販売されている場合、そのまま使用することができる。 <Synthesis of cyanuric chloride derivatives by Suzuki coupling>
In the step (A), when a cyanuric chloride derivative is synthesized by a Suzuki coupling reaction, it can be synthesized according to a known synthesis method described in WO2012 / 096263. For example, by reacting the above-mentioned lithio compound with a boron reagent, a boron compound in which Z of the aromatic compound is converted into a boronyl group or a boronic acid can be synthesized. Next, a cyanuric chloride derivative can be synthesized by reacting the obtained boron compound with cyanuric chloride. In addition, when the commercial item of a boron compound is sold, it can be used as it is.
前記工程(A)において、フリーデル・クラフツ反応により、塩化シアヌル誘導体を合成する場合、US5322941公報等に記載の公知の合成法に準じて合成することができる。前記工程(A)における芳香族化合物のZは水素原子、n=0で表される芳香族化合物を使用することができる。塩化アルミニウム等のルイス酸の存在下、芳香族化合物と塩化シアヌルを反応させることにより塩化シアヌル誘導体を合成することができる。 <Synthesis of cyanuric chloride derivatives by Friedel-Crafts reaction>
In the step (A), when a cyanuric chloride derivative is synthesized by Friedel-Crafts reaction, it can be synthesized according to a known synthesis method described in US Pat. The aromatic compound Z in the step (A) can be a hydrogen atom, and an aromatic compound represented by n = 0 can be used. A cyanuric chloride derivative can be synthesized by reacting an aromatic compound with cyanuric chloride in the presence of a Lewis acid such as aluminum chloride.
前記工程(B)において、一般式(1)で表されるトリアジンペルオキシド誘導体の製造方法は、特に限定されないが、特公昭45-39468号公報等に記載の公知のトリアジンペルオキシドの合成法に準じて合成することができる。 <Synthesis of triazine peroxide derivative>
In the step (B), the method for producing the triazine peroxide derivative represented by the general formula (1) is not particularly limited, but according to the known method for synthesizing triazine peroxide described in Japanese Patent Publication No. 45-39468. Can be synthesized.
本発明の重合性組成物は、(a)重合開始剤および(b)ラジカル重合性化合物を含有する。さらに、重合性組成物は、(c)アルカリ可溶性樹脂を含有することで現像性を付与することができる。また、重合性組成物は、その他の成分を適宜組み合わせて含有させることができる。 <Polymerizable composition>
The polymerizable composition of the present invention contains (a) a polymerization initiator and (b) a radical polymerizable compound. Furthermore, the polymerizable composition can impart developability by containing (c) an alkali-soluble resin. Moreover, the polymerizable composition can contain other components in appropriate combination.
本発明の(a)重合開始剤は、前記一般式(1)で表されるトリアジンペルオキシド誘導体を含有する。(a)重合開始剤は、活性エネルギー線または熱により分解し、発生したラジカルが(b)ラジカル重合性化合物の重合(硬化)を開始する働きを有する。トリアジンペルオキシド誘導体は、単独で用いてもよく2種類以上を併用してもよい。 <(A) Polymerization initiator>
The polymerization initiator (a) of the present invention contains a triazine peroxide derivative represented by the general formula (1). The (a) polymerization initiator has a function of decomposing by active energy rays or heat, and the generated radicals start polymerization (curing) of the (b) radical polymerizable compound. A triazine peroxide derivative may be used independently and may use 2 or more types together.
本発明の(b)ラジカル重合性化合物としては、エチレン性不飽和基を有する化合物を好ましく用いることができる。(b)ラジカル重合性化合物としては、例えば、(メタ)アクリル酸エステル類、スチレン類、マレイン酸エステル類、フマル酸エステル類、イタコン酸エステル類、桂皮酸エステル類、クロトン酸エステル類、ビニルエーテル類、ビニルエステル類、ビニルケトン類、アリルエーテル類、アリルエステル類、N-置換マレイミド類、N-ビニル化合物類、不飽和ニトリル類、オレフィン類等が挙げられる。これらの中でも、反応性が高い(メタ)アクリル酸エステル類を含むことが好ましい。(b)ラジカル重合性化合物は、単独で用いてもよく2種類以上を併用してもよい。 <(B) Radical polymerizable compound>
As the radically polymerizable compound (b) of the present invention, a compound having an ethylenically unsaturated group can be preferably used. Examples of (b) radical polymerizable compounds include (meth) acrylic acid esters, styrenes, maleic acid esters, fumaric acid esters, itaconic acid esters, cinnamic acid esters, crotonic acid esters, and vinyl ethers. Vinyl esters, vinyl ketones, allyl ethers, allyl esters, N-substituted maleimides, N-vinyl compounds, unsaturated nitriles, olefins and the like. Among these, it is preferable to contain (meth) acrylic acid esters having high reactivity. (B) A radically polymerizable compound may be used independently and may use 2 or more types together.
前記重合性組成物は、さらに(c)アルカリ可溶性樹脂を配合することにより、ネガ型レジストとして好適に使用することができる。(c)アルカリ可溶性樹脂としては、ネガ型レジストに一般的に使用されるものを用いることができ、アルカリ水溶液に可溶な樹脂であれば特に限定されないが、カルボキシル基を含む樹脂であることが好ましい。(c)アルカリ可溶性樹脂は、単独で用いてもよく2種類以上を併用してもよい。 <(C) Alkali-soluble resin>
The polymerizable composition can be suitably used as a negative resist by further blending (c) an alkali-soluble resin. (C) As alkali-soluble resin, what is generally used for a negative resist can be used, and it will not be specifically limited if it is resin soluble in alkaline aqueous solution, However, It should be resin containing a carboxyl group. preferable. (C) Alkali-soluble resin may be used independently and may use 2 or more types together.
前記その他の成分として、硬化促進剤を用いることで、重合性組成物の加熱による硬化を低温で行なうこともできる。硬化促進剤としては、例えば、アミン化合物、チオ尿素化合物、2-メルカプトベンズイミダゾール系化合物、オルトベンゾイックスルフィミド、第4周期遷移金属化合物合物等を使用することができる。硬化促進剤は、単独で用いてもよく2種類以上を併用してもよい。 <Other ingredients>
By using a curing accelerator as the other component, the polymerizable composition can be cured by heating at a low temperature. As the curing accelerator, for example, an amine compound, a thiourea compound, a 2-mercaptobenzimidazole compound, an orthobenzoixsulfimide, a fourth-period transition metal compound compound, or the like can be used. A hardening accelerator may be used independently and may use 2 or more types together.
前記重合性組成物を調整する場合には、収納容器内に前記(a)重合開始剤、前記(b)ラジカル重合性化合物、必要に応じて、前記(c)アルカリ可溶性樹脂や前記その他の成分を投入し、ペイントシェーカー、ビーズミル、サンドグラインドミル、ボールミル、アトライターミル、2本ロールミル、3本ロールミル等を用いて、常法に従って溶解または分散させればよい。また、必要に応じて、メッシュまたはメンブレンフィルター等を通してもろ過してもよい。 <Method for Preparing Polymerizable Composition>
When adjusting the polymerizable composition, the (a) polymerization initiator, the (b) radical polymerizable compound, and, if necessary, the (c) alkali-soluble resin and the other components in a storage container. And then dissolved or dispersed in accordance with a conventional method using a paint shaker, bead mill, sand grind mill, ball mill, attritor mill, 2-roll mill, 3-roll mill or the like. Moreover, you may filter through a mesh or a membrane filter etc. as needed.
本発明の硬化物は、前記重合性組成物から形成されるものである。硬化物の製造方法は、重合性組成物を基板上に塗布後、当該重合性組成物を活性エネルギー線で照射する工程、および当該重合性組成物を加熱する工程のいずれかの工程を含む製造方法である。また、前記活性エネルギー線で照射する工程と前記加熱する工程の両方を含む工程を、デュアルキュア工程ともいう。 <Method for producing cured product>
The cured product of the present invention is formed from the polymerizable composition. The manufacturing method of hardened | cured material is a manufacturing which includes any process of the process of irradiating the said polymeric composition with an active energy ray, and heating the said polymeric composition after apply | coating a polymeric composition on a board | substrate. Is the method. Moreover, the process including both the process of irradiating with the active energy ray and the process of heating is also referred to as a dual cure process.
前記重合性組成物が(c)アルカリ可溶性樹脂を含む場合、フォトリソグラフィー法によりパターンを形成することができる。前述と同様にして重合性組成物を基材に塗布し、必要に応じて、乾燥して乾燥被膜を形成する。そして、乾燥被膜にマスクを介して活性エネルギー線を照射することにより、露光部では(b)ラジカル重合性化合物が重合することで硬化膜となる。一方、レーザーを用いた直接描画により、マスクを介さずに高精度なパターン形状を作製することもできる。 <Pattern formation method>
When the polymerizable composition contains (c) an alkali-soluble resin, a pattern can be formed by a photolithography method. In the same manner as described above, the polymerizable composition is applied to a substrate and dried as necessary to form a dry film. Then, by irradiating the dry film with active energy rays through a mask, the radical polymerizable compound (b) is polymerized in the exposed portion to form a cured film. On the other hand, a highly accurate pattern shape can be produced without using a mask by direct writing using a laser.
(1)トリアジンペルオキシド誘導体の合成
[合成例1:化合物1の合成]
20mLナスフラスコにイオン交換水1.66g、48質量%水酸化ナトリウム水溶液0.553g(6.64mmol)を加え、30℃以下で69質量%tert-ブチルヒドロペルオキシド水溶液0.698g(5.31mmol)を徐々に加えた。ここに、2,4-ジクロロ-6-フェニル-1,3,5-トリアジン0.500g(2.21mmol、ナミキ商事より購入)とテトラヒドロフラン1mLの混合溶液を、10℃で10分かけて滴下し、20℃にて3.5時間反応させた。反応終了後、ジクロロメタン10mLを添加した後に、水相を分液した。油相をイオン交換水で洗浄し、0℃にて無水硫酸マグネシウムで乾燥した。ろ過後、油相を減圧下で濃縮し、0.683g(収率92%)の本発明の化合物1を得た。得られた化合物1の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 <Examples 1 to 5>
(1) Synthesis of triazine peroxide derivative [Synthesis Example 1: Synthesis of Compound 1]
To a 20 mL eggplant flask, 1.66 g of ion-exchanged water and 0.553 g (6.64 mmol) of a 48% by mass sodium hydroxide aqueous solution were added, and 0.698 g (5.31 mmol) of a 69% by mass tert-butyl hydroperoxide aqueous solution at 30 ° C. or lower. Was gradually added. To this, a mixed solution of 0.500 g of 2,4-dichloro-6-phenyl-1,3,5-triazine (2.21 mmol, purchased from Namiki Shoji) and 1 mL of tetrahydrofuran was added dropwise at 10 ° C. over 10 minutes. And reacted at 20 ° C. for 3.5 hours. After completion of the reaction, 10 mL of dichloromethane was added, and the aqueous phase was separated. The oil phase was washed with ion exchange water and dried over anhydrous magnesium sulfate at 0 ° C. After filtration, the oil phase was concentrated under reduced pressure to obtain 0.683 g (yield 92%) of Compound 1 of the present invention. Table 1 and Table 2 show the properties, EI-MS and 1 H-NMR analysis results of the obtained Compound 1.
ヒートドライ乾燥した500mL三つ口フラスコに、マグネシウム1.69g(69.5mmol)、脱水テトラヒドロフラン57mL、触媒量のヨウ素を入れ、室温下で撹拌した。ここに、1-ブロモナフタレン7.07g(50.7mmol)と脱水テトラヒドロフラン57mLの混合溶液を滴下した後、還流撹拌させた。1時間後、内温を-60℃以下まで冷却した。別途調整した塩化シアヌル8.92g(48.4mmol)と脱水テトラヒドロフランの混合溶液を15分かけ滴下した。その後、30分かけて室温にあげ、水浴下で撹拌した。62時間後、反応液を氷浴で冷却し、1M塩酸を加え、飽和炭酸水素ナトリウム水溶液でpHを8に調整した。次いで、イオン交換水160mLを加え、酢酸エチルで抽出した。油相を飽和食塩水で1回洗浄した後、硫酸マグネシウムで脱水した。ろ過後、油相を減圧下で濃縮し、粗体14.6gを得た。粗体をシリカゲルカラムクロマトグラフィー(n-ヘキサン/酢酸エチル=1/1から1/3)で精製し、5.14g(収率38%)の2,4-ジクロロ-6-(1-ナフタレニル)-1,3,5-トリアジンを得た。 [Synthesis Example 2: Synthesis of Compound 23]
In a 500 mL three-necked flask dried by heat drying, 1.69 g (69.5 mmol) of magnesium, 57 mL of dehydrated tetrahydrofuran and a catalytic amount of iodine were added and stirred at room temperature. To this was added dropwise a mixed solution of 7.07 g (50.7 mmol) of 1-bromonaphthalene and 57 mL of dehydrated tetrahydrofuran, followed by stirring under reflux. After 1 hour, the internal temperature was cooled to −60 ° C. or lower. A separately prepared mixed solution of cyanuric chloride 8.92 g (48.4 mmol) and dehydrated tetrahydrofuran was added dropwise over 15 minutes. Thereafter, the mixture was raised to room temperature over 30 minutes and stirred in a water bath. After 62 hours, the reaction solution was cooled in an ice bath, 1M hydrochloric acid was added, and the pH was adjusted to 8 with a saturated aqueous sodium hydrogen carbonate solution. Next, 160 mL of ion-exchanged water was added and extracted with ethyl acetate. The oil phase was washed once with saturated saline and then dehydrated with magnesium sulfate. After filtration, the oil phase was concentrated under reduced pressure to obtain 14.6 g of a crude product. The crude product was purified by silica gel column chromatography (n-hexane / ethyl acetate = 1/1 to 1/3) and 5.14 g (yield 38%) of 2,4-dichloro-6- (1-naphthalenyl). -1,3,5-triazine was obtained.
300mLナスフラスコに、1-メトキシナフタレン5.01g(31.7mmol)、脱水ジクロロメタン100mL、塩化シアヌル6.12g(33.2mmol)を入れ、氷浴下撹拌した。15分後、塩化アルミニウム4.43g(33.2mmol)を加え、室温に昇温した。1時間後、反応液を氷冷1M塩酸75mLに注ぎ、水相を分液した。油相を飽和食塩水100mLで洗浄し、無水硫酸ナトリウムにて脱水した。ろ過後、減圧濃縮し、粗体を9.59gの黄色固体を得た。粗体をシリカゲルカラムクロマトグラフィー(n-ヘキサン/トルエン=4/1から1.5/1)で精製し、8.05g(収率83%)の2,4-ジクロロ-6-(4-メトキシ-1-ナフタレニル)-1,3,5-トリアジンを得た。 [Synthesis Example 3: Synthesis of Compound 25]
A 300 mL eggplant flask was charged with 5.01 g (31.7 mmol) of 1-methoxynaphthalene, 100 mL of dehydrated dichloromethane and 6.12 g (33.2 mmol) of cyanuric chloride, and stirred in an ice bath. After 15 minutes, 4.43 g (33.2 mmol) of aluminum chloride was added, and the temperature was raised to room temperature. After 1 hour, the reaction solution was poured into 75 mL of ice-cold 1M hydrochloric acid, and the aqueous phase was separated. The oil phase was washed with 100 mL of saturated brine and dehydrated with anhydrous sodium sulfate. After filtration, the filtrate was concentrated under reduced pressure to obtain 9.59 g of a yellow solid as a crude product. The crude product was purified by silica gel column chromatography (n-hexane / toluene = 4/1 to 1.5 / 1), and 8.05 g (yield 83%) of 2,4-dichloro-6- (4-methoxy). -1-Naphthalenyl) -1,3,5-triazine was obtained.
本発明の化合物4は、合成例2に記載の1-ブロモナフタレンを、2-ブロモ-6-メトキシナフタレンに変更したこと以外は、合成例2に記載の方法に準じて合成した。得られた化合物26の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 4: Synthesis of Compound 26]
Compound 4 of the present invention was synthesized according to the method described in Synthesis Example 2, except that 1-bromonaphthalene described in Synthesis Example 2 was changed to 2-bromo-6-methoxynaphthalene. Table 1 and Table 2 show the properties of the obtained Compound 26 and the results of analysis by EI-MS and 1 H-NMR.
本発明の化合物4は、合成例1に記載の2,4-ジクロロ-6-フェニル-1,3,5-トリアジンを、2,4-ジクロロ-6-(4-エトキシ-1-ナフタレニル)-1,3,5-トリアジン(シグマアルドリッチ試薬)に変更したこと以外は、合成例1に記載の方法に準じて合成した。得られた化合物31の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 5: Synthesis of Compound 31]
Compound 4 of the present invention is obtained by reacting 2,4-dichloro-6-phenyl-1,3,5-triazine described in Synthesis Example 1 with 2,4-dichloro-6- (4-ethoxy-1-naphthalenyl)- The compound was synthesized according to the method described in Synthesis Example 1, except that it was changed to 1,3,5-triazine (Sigma-Aldrich reagent). Properties and EI-MS and 1 H-NMR analysis results of the resulting compound 31 are shown in Tables 1 and 2.
本発明の化合物32は、合成例3に記載の69質量%tert-ブチルヒドロペルオキシド水溶液を、85質量%tert-アミルヒドロペルオキシドに変更したこと以外は、合成例3に記載の方法に準じて合成した。得られた化合物32の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 6: Synthesis of Compound 32]
Compound 32 of the present invention was synthesized according to the method described in Synthesis Example 3 except that the 69% by mass tert-butyl hydroperoxide aqueous solution described in Synthesis Example 3 was changed to 85% by mass tert-amyl hydroperoxide. did. Properties and EI-MS and 1 H-NMR analysis results of the resulting compound 32 are shown in Tables 1 and 2.
本発明の化合物33は、合成例1に記載の2,4-ジクロロ-6-フェニル-1,3,5-トリアジンを、2-(4-ビフェニリル)-4,6-ジクロロ-1,3,5-トリアジン(東京化成工業試薬)に変更したこと以外は、合成例1に記載の方法に準じて合成した。得られた化合物33の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 7: Synthesis of Compound 33]
Compound 33 of the present invention is obtained by reacting 2,4-dichloro-6-phenyl-1,3,5-triazine described in Synthesis Example 1 with 2- (4-biphenylyl) -4,6-dichloro-1,3, The compound was synthesized according to the method described in Synthesis Example 1 except that 5-triazine (Tokyo Chemical Industry Reagent) was used. Properties and EI-MS and 1 H-NMR analysis results of the resulting compound 33 are shown in Tables 1 and 2.
本発明の化合物35は、合成例2に記載の1-ブロモナフタレンを、4-ブロモ-4’-メトキシビフェニルに変更したこと以外は、合成例2に記載の方法に準じて合成した。得られた化合物35の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 8: Synthesis of Compound 35]
Compound 35 of the present invention was synthesized according to the method described in Synthesis Example 2, except that 1-bromonaphthalene described in Synthesis Example 2 was changed to 4-bromo-4′-methoxybiphenyl. Table 1 and Table 2 show the properties of the obtained Compound 35, and the results of analysis by EI-MS and 1 H-NMR.
本発明の化合物37は、合成例2に記載の1-ブロモナフタレンを、4-ブロモ-4’-メトキシビフェニルに、及び69質量%tert-ブチルヒドロペルオキシド水溶液を85質量%tert-アミルヒドロペルオキシドに変更したこと以外は、合成例2に記載の方法に準じて合成した。得られた化合物37の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 9: Synthesis of Compound 37]
Compound 37 of the present invention was prepared by converting 1-bromonaphthalene described in Synthesis Example 2 into 4-bromo-4′-methoxybiphenyl and 69% by mass tert-butyl hydroperoxide aqueous solution into 85% by mass tert-amyl hydroperoxide. The compound was synthesized according to the method described in Synthesis Example 2 except for the change. Table 1 and Table 2 show the properties of the obtained Compound 37, and the results of analysis by EI-MS and 1 H-NMR.
本発明の化合物38は、合成例2に記載の1-ブロモナフタレンを、4-ブロモ-4’-メトキシビフェニル、及び69質量%tert-ブチルヒドロペルオキシド水溶液を90質量%tert-ヘキシルヒドロペルオキシドに変更したこと以外は、合成例2に記載の方法に準じて合成した。得られた化合物38の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 10: Synthesis of Compound 38]
Compound 38 of the present invention was prepared by changing 1-bromonaphthalene described in Synthesis Example 2 to 4-bromo-4′-methoxybiphenyl and a 69% by mass tert-butyl hydroperoxide aqueous solution to 90% by mass tert-hexyl hydroperoxide. Except for the above, it was synthesized according to the method described in Synthesis Example 2. Table 1 and Table 2 show the properties of the obtained Compound 38, and the results of analysis by EI-MS and 1 H-NMR.
本発明の化合物40は、合成例2に記載の1-ブロモナフタレンを、4-ブロモ-4’-メトキシビフェニルに、及び69質量%tert-ブチルヒドロペルオキシド水溶液を80質量%クメンヒドロペルオキシドに変更したこと以外は、合成例2に記載の方法に準じて合成した。得られた化合物40の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 11: Synthesis of Compound 40]
In Compound 40 of the present invention, 1-bromonaphthalene described in Synthesis Example 2 was changed to 4-bromo-4′-methoxybiphenyl, and 69% by mass aqueous tert-butyl hydroperoxide solution was changed to 80% by mass cumene hydroperoxide. Except for the above, it was synthesized according to the method described in Synthesis Example 2. Table 1 and Table 2 show the properties of the obtained compound 40, and the results of analysis by EI-MS and 1 H-NMR.
本発明の化合物41は、合成例2に記載の1-ブロモナフタレンを、4-ブロモスチルベンに変更したこと以外は、合成例2に記載の方法に準じて合成した。得られた化合物41の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 12: Synthesis of Compound 41]
Compound 41 of the present invention was synthesized according to the method described in Synthesis Example 2, except that 1-bromonaphthalene described in Synthesis Example 2 was changed to 4-bromostilbene. Table 1 and Table 2 show the properties of the obtained Compound 41 and the results of analysis by EI-MS and 1 H-NMR.
100mLナスフラスコに、塩化シアヌル5.70g(10mmol)、trans-フェニルビニルボロン酸1.56g(30mmol、シグマアルドリッチ試薬)、ビス(トリフェニルホスフィン)ジクロリド0.31g(0.4mmol)、トルエン40mLを入れ、室温で撹拌した。リン酸三カリウム8.68g(40mmol)の水溶液10mLを0℃で滴下した。滴下終了後、室温で1時間の反応を行った。反応終了後、水相を分液した。油相を飽和食塩水で1回洗浄した後、硫酸マグネシウムで脱水した。ろ過後、油相を減圧下で濃縮し粗体を得た。粗体をシリカゲルカラムクロマトグラフィーで精製し、2.08g(収率78%)の2,4-ジクロロ-6-(2-フェニルエテニル)-1,3,5-トリアジンを得た。 [Synthesis Example 13: Synthesis of Compound 43]
In a 100 mL eggplant flask, 5.70 g (10 mmol) of cyanuric chloride, 1.56 g of trans-phenylvinylboronic acid (30 mmol, Sigma-Aldrich reagent), 0.31 g (0.4 mmol) of bis (triphenylphosphine) dichloride, and 40 mL of toluene were added. And stirred at room temperature. 10 mL of an aqueous solution of 8.68 g (40 mmol) of tripotassium phosphate was added dropwise at 0 ° C. After completion of the dropping, the reaction was performed at room temperature for 1 hour. After completion of the reaction, the aqueous phase was separated. The oil phase was washed once with saturated saline and then dehydrated with magnesium sulfate. After filtration, the oil phase was concentrated under reduced pressure to obtain a crude product. The crude product was purified by silica gel column chromatography to obtain 2.08 g (yield 78%) of 2,4-dichloro-6- (2-phenylethenyl) -1,3,5-triazine.
本発明の化合物35は、合成例2に記載の1-ブロモナフタレンを、p-(2-ブロモ)ビニルアニソールに変更したこと以外は、合成例2に記載の方法に準じて合成した。得られた化合物41の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 14: Synthesis of Compound 44]
Compound 35 of the present invention was synthesized according to the method described in Synthesis Example 2, except that 1-bromonaphthalene described in Synthesis Example 2 was changed to p- (2-bromo) vinylanisole. Table 1 and Table 2 show the properties of the obtained Compound 41 and the results of analysis by EI-MS and 1 H-NMR.
本発明の化合物5は、合成例3に記載の1-メトキシナフタレンを、アニソールに変更したこと以外は、合成例3に記載の方法に準じて合成した。得られた化合物5の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 15: Synthesis of Compound 5]
Compound 5 of the present invention was synthesized according to the method described in Synthesis Example 3 except that 1-methoxynaphthalene described in Synthesis Example 3 was changed to anisole. Table 1 and Table 2 show the properties of the obtained compound 5, and the results of analysis by EI-MS and 1 H-NMR.
本発明の化合物19は、合成例3に記載の1-メトキシナフタレンを、ジフェニルスルフィドに変更したこと以外は、合成例3に記載の方法に準じて合成した。得られた化合物19の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 16: Synthesis of Compound 19]
Compound 19 of the present invention was synthesized according to the method described in Synthesis Example 3, except that 1-methoxynaphthalene described in Synthesis Example 3 was changed to diphenyl sulfide. Table 1 and Table 2 show the properties of the obtained Compound 19, and the results of analysis by EI-MS and 1 H-NMR.
本発明の化合物48は、合成例3に記載の1-メトキシナフタレンを、1-(2-エチルヘキシルオキシ)ナフタレンに変更したこと以外は、合成例3に記載の方法に準じて合成した。得られた化合物19の性状、EI-MSおよび1H-NMRによる分析結果を表1および表2に示す。 [Synthesis Example 17: Synthesis of Compound 48]
Compound 48 of the present invention was synthesized according to the method described in Synthesis Example 3, except that 1-methoxynaphthalene described in Synthesis Example 3 was changed to 1- (2-ethylhexyloxy) naphthalene. Table 1 and Table 2 show the properties of the obtained Compound 19, and the results of analysis by EI-MS and 1 H-NMR.
表1に記載される化合物のアセトニトリル溶液について、UV-VISスペクトル測定装置(1.0cm石英セル、島津製作所製、UV-2450)を用いて、波長200から600nmにおけるUV-VISスペクトルを測定した。その結果を表3に示す。 (2) Evaluation of UV absorption characteristics About acetonitrile solutions of the compounds described in Table 1, using a UV-VIS spectrum measurement device (1.0 cm quartz cell, manufactured by Shimadzu Corporation, UV-2450) at a wavelength of 200 to 600 nm UV-VIS spectrum was measured. The results are shown in Table 3.
また、比較例として、化合物R1および化合物R2の結果を表3に示す。なお、化合物R1は特開昭59-197401号公報に記載の製法に準じて合成し、EI-MSおよび1H-NMRによって同定した。化合物R2はイルガキュア184(BASF製)を使用した。
In addition, as a comparative example, Table 3 shows the results of Compound R1 and Compound R2. Compound R1 was synthesized according to the production method described in JP-A-59-197401 and identified by EI-MS and 1 H-NMR. As compound R2, Irgacure 184 (manufactured by BASF) was used.
<重合性組成物(A)から(C)の調整>
表4に示す量の(b)ラジカル重合性化合物、(c)アルカリ可溶性樹脂、その他の成分を混合撹拌し、(a)重合開始剤を添加してよく撹拌し、実施例18~34および比較例3~5の重合性組成物(A)から(C)を調整した。 <Examples 18 to 34, Comparative Examples 3 to 5>
<Adjustment of polymerizable composition (A) to (C)>
The amounts of (b) radical polymerizable compound, (c) alkali-soluble resin and other components shown in Table 4 were mixed and stirred, (a) the polymerization initiator was added and stirred well, and Examples 18 to 34 and Comparative Example The polymerizable compositions (A) to (C) of Examples 3 to 5 were prepared.
RD200は、メタクリル酸メチル/メタクリル酸/シクロヘキシルマレイミド(質量%:61/14/25)共重合物、重量平均分子量:17,000、酸価:90(合成品);
EMK:4,4‘-ビス(ジエチルアミノ)ベンゾフェノン(東京化成工業試薬)
F-477は、フッ素系レベリング剤(商品名:メガファックF-477、DIC社製);
PGMEAは、プロピレングリコールモノメチルエーテルアセテート(和光純薬工業試薬);を示す。 In Table 4 above, DPHA is a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (trade name: Aronix M-402, manufactured by Toagosei Co., Ltd.);
RD200 is a methyl methacrylate / methacrylic acid / cyclohexyl maleimide (mass%: 61/14/25) copolymer, weight average molecular weight: 17,000, acid value: 90 (synthetic product);
EMK: 4,4'-bis (diethylamino) benzophenone (Tokyo Chemical Industry Reagent)
F-477 is a fluorine-based leveling agent (trade name: Megafax F-477, manufactured by DIC Corporation);
PGMEA indicates propylene glycol monomethyl ether acetate (Wako Pure Chemical Industries, Ltd.).
上記で調整した重合性組成物(A)を、スピンコーターを用いて、アルミニウム基板上に塗布した。塗布後、アルミニウム基板を90℃のクリーンオーブン中で2.5分間乾燥処理により溶媒を乾燥させ、厚さ1.5μmの均一な塗布膜を作製した。次いで、超高圧水銀灯を光源とするプロキシミティー露光機を用い、マスクパターンを介して10から1000mJ/cm2の範囲で、段階露光を行った。露光後のアルミニウム基板を1.0質量%の炭酸ナトリウム水溶液に23℃で60秒間浸漬して、現像による未露光部の除去を行った。続いて純水にて30秒間洗浄を行い、パターン形状を得た。パターン形状が形成される最低露光量を「感度」として評価した。各(a)重合開始剤の評価結果を、表5に示す。 (3) Evaluation of sensitivity The polymerizable composition (A) prepared as described above was applied on an aluminum substrate using a spin coater. After application, the aluminum substrate was dried in a clean oven at 90 ° C. for 2.5 minutes to dry the solvent, thereby producing a uniform coating film having a thickness of 1.5 μm. Subsequently, stepwise exposure was performed in a range of 10 to 1000 mJ / cm 2 through a mask pattern using a proximity exposure machine using an ultrahigh pressure mercury lamp as a light source. The exposed aluminum substrate was immersed in a 1.0% by mass aqueous sodium carbonate solution at 23 ° C. for 60 seconds to remove unexposed portions by development. Subsequently, washing was performed with pure water for 30 seconds to obtain a pattern shape. The minimum exposure amount at which a pattern shape was formed was evaluated as “sensitivity”. Table 5 shows the evaluation results of each (a) polymerization initiator.
<重合性組成物(D)の調整>
表6に示す量の(b)ラジカル重合性化合物、硬化促進剤を混合撹拌し、(a)重合開始剤を添加してよく撹拌し、実施例29および比較例6の重合性組成物(B)を調整した。 <Example 35, Comparative Example 6>
<Adjustment of polymerizable composition (D)>
The amount of (b) radical polymerizable compound and curing accelerator shown in Table 6 were mixed and stirred, (a) the polymerization initiator was added and stirred well, and the polymerizable compositions of Example 29 and Comparative Example 6 (B ) Was adjusted.
IBOAは、イソボルニルアクリレート(東京化成工業試薬);
THFAは、テトラヒドロフルフリルアクリレート(東京化成工業試薬);
TMPTAは、トリメチロールプロパントリアクリレート(東京化成工業試薬);
DMTは、N,N-ジメチルトルイジン(東京化成工業試薬);を示す。 In Table 6, UV-3700B is urethane acrylate (trade name: Purple light UV-3700B, manufactured by Nippon Synthetic Chemical Industry);
IBOA is isobornyl acrylate (Tokyo Chemical Industry Reagent);
THFA is tetrahydrofurfuryl acrylate (Tokyo Chemical Industry Reagent);
TMPTA is trimethylolpropane triacrylate (Tokyo Chemical Industry Reagent);
DMT indicates N, N-dimethyltoluidine (Tokyo Chemical Industry Reagent).
上記で調整した重合性組成物(D)を、厚さ100μmの易接着処理されたPETフィルム(商品名:コスモシャインA4300、東洋紡社製)に、アプリケーターにて50μmに塗布し、表面に黒色コーティングが施されたPETフィルム(波長365nmの透過率は0.1%未満)を被膜の半分の領域に設置した。そして、高圧水銀ランプが設置されたコンベア式UV照射装置を使用して100mJ/cm2の照射を行った。次いで、送風定温恒温機内に静置し、90℃で90分の加熱を行った。 (4) Evaluation of dual cure curing characteristics The polymerizable composition (D) prepared as described above was applied to a PET film (trade name: Cosmo Shine A4300, manufactured by Toyobo Co., Ltd.) having a thickness of 100 μm by an applicator. A PET film (having a wavelength of 365 nm having a transmittance of less than 0.1%) applied to 50 μm and having a black coating on the surface was placed in a half region of the coating. And irradiation of 100 mJ / cm < 2 > was performed using the conveyor type | mold UV irradiation apparatus in which the high pressure mercury lamp was installed. Then, it left still in a ventilation constant temperature thermostat, and heated for 90 minutes at 90 degreeC.
<重合性組成物(E)の調整>
表8に示す量の(b)ラジカル重合性化合物、(c)アルカリ可溶性樹脂、その他の成分を混合撹拌し、(a)重合開始剤を添加してよく撹拌し、実施例36~39および比較例7~8の重合性組成物(E)を調整した。また、比較例のハロメチルトリアジン誘導体である化合物R3および化合物R4は東京化成試薬を使用した。 <Examples 36 to 39, Comparative Examples 7 to 8>
<Adjustment of polymerizable composition (E)>
The amounts of (b) radical polymerizable compound, (c) alkali-soluble resin and other components shown in Table 8 were mixed and stirred, (a) the polymerization initiator was added and stirred well, and Examples 36 to 39 and Comparative Examples The polymerizable compositions (E) of Examples 7 to 8 were prepared. In addition, as a compound R3 and a compound R4, which are halomethyltriazine derivatives of comparative examples, Tokyo Kasei Reagent was used.
上記で調整した重合性組成物(E)を、スピンコーターを用いて、ガラス基板上に塗布した。塗布後、ガラス基板を90℃のクリーンオーブン中で2.5分間乾燥処理により溶媒を乾燥させ、厚さ1.5μmの均一な塗布膜を作製した。そして、高圧水銀ランプが設置されたコンベア式UV照射装置を使用して300mJ/cm2の照射を行い、試験片を作製した。得られた試験片の硬化度を測定した結果、すべての試験片において硬化度は90%以上であった。得られた試験片について、分光測色計(CM-3500d、ミノルタカメラ製)を用いてL*,a*,b*表色系の値をJIS-Z-8722に従って、透過法にて測定した。b*の値を黄色度の指標として評価し、b*が小さいほど黄色度が低い。その結果を表9に示す。 (5) Evaluation of hue (b * value) The polymerizable composition (E) prepared above was applied onto a glass substrate using a spin coater. After coating, the glass substrate was dried in a clean oven at 90 ° C. for 2.5 minutes to dry the solvent, thereby preparing a uniform coating film having a thickness of 1.5 μm. And 300 mJ / cm < 2 > was irradiated using the conveyor type UV irradiation apparatus in which the high pressure mercury lamp was installed, and the test piece was produced. As a result of measuring the degree of cure of the obtained test pieces, the degree of cure of all the test pieces was 90% or more. About the obtained test piece, the value of L * , a * , b * color system was measured by the transmission method according to JIS-Z-8722 using a spectrocolorimeter (CM-3500d, manufactured by Minolta Camera). . b * of the value evaluated as an indicator of yellowness, low yellowness index as b * is small. The results are shown in Table 9.
Claims (7)
- 一般式(1):
- 前記一般式(2)中、R4は、独立した置換基であって、炭素数1から8のアルキル基、または一般式(3):R5-Y-で表される置換基を表し、前記Yは、酸素原子を表し、前記R5は、炭素骨格中に、エーテル結合、および、末端に水酸基のいずれか1つ以上を有していてもよい炭素数1~8の炭化水素基、またはアルキル基を有してもよい炭素数6~9の芳香族炭化水素基を表し、あるいは、R4は隣接する2つの前記一般式(3):R5-Y-により5~6員環を形成する炭化水素基を表すことを特徴とする請求項1記載のトリアジンペルオキシド誘導体。 In the general formula (2), R 4 is an independent substituent and represents an alkyl group having 1 to 8 carbon atoms, or a substituent represented by the general formula (3): R 5 —Y—, Y represents an oxygen atom, and R 5 represents a hydrocarbon group having 1 to 8 carbon atoms which may have any one or more of an ether bond and a hydroxyl group at the terminal in the carbon skeleton, Or an aromatic hydrocarbon group having 6 to 9 carbon atoms which may have an alkyl group, or R 4 is a 5- to 6-membered ring by two adjacent general formulas (3): R 5 —Y— The triazine peroxide derivative according to claim 1, which represents a hydrocarbon group which forms
- 請求項1または請求項2記載のトリアジンペルオキシド誘導体を含む(a)重合開始剤、および(b)ラジカル重合性化合物を含有することを特徴とする重合性組成物。 A polymerizable composition comprising (a) a polymerization initiator containing the triazine peroxide derivative according to claim 1 or 2, and (b) a radical polymerizable compound.
- さらに(c)アルカリ可溶性樹脂を含有することを特徴とする請求項3記載の重合性組成物。 The polymerizable composition according to claim 3, further comprising (c) an alkali-soluble resin.
- 請求項3または請求項4記載の重合性組成物から形成されることを特徴とする硬化物。 A cured product formed from the polymerizable composition according to claim 3 or 4.
- 前記重合性組成物を活性エネルギー線で照射する工程を含むことを特徴とする請求項5記載の硬化物の製造方法。 The method for producing a cured product according to claim 5, comprising a step of irradiating the polymerizable composition with active energy rays.
- 前記活性エネルギー線で照射する工程の後、さらに、加熱する工程を含むことを特徴とする請求項6記載の硬化物の製造方法。 The method for producing a cured product according to claim 6, further comprising a heating step after the step of irradiating with the active energy ray.
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5474887A (en) * | 1977-11-29 | 1979-06-15 | Fuji Photo Film Co Ltd | Photo-polymerizable composition |
JPS6310769A (en) * | 1986-06-11 | 1988-01-18 | アクゾ・ナ−ムロ−ゼ・フェンノ−トシャップ | Unsaturated peroxide |
JPH0845604A (en) * | 1994-08-02 | 1996-02-16 | Yazaki Corp | Waterproof seal part for connector |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59197401A (en) * | 1983-04-26 | 1984-11-09 | Nippon Oil & Fats Co Ltd | Photopolymerization initiator |
JP4213792B2 (en) | 1998-09-24 | 2009-01-21 | 日東電工株式会社 | Thermosetting pressure-sensitive adhesive and its adhesive sheets |
DE102010026973A1 (en) * | 2010-07-13 | 2012-01-19 | Clariant International Ltd. | Flame retardant stabilizer combination for thermoplastic polymers |
DE102010049968A1 (en) * | 2010-10-28 | 2012-05-03 | Clariant International Ltd. | Flame-resistant polyester compounds |
DE102011011928A1 (en) * | 2011-02-22 | 2012-08-23 | Clariant International Ltd. | Flame retardant stabilizer combination for thermoplastic polymers |
-
2018
- 2018-05-14 WO PCT/JP2018/018484 patent/WO2018221177A1/en active Application Filing
- 2018-05-14 JP JP2019522081A patent/JP7021668B2/en active Active
- 2018-05-14 KR KR1020197034707A patent/KR102542689B1/en active IP Right Grant
- 2018-05-14 CN CN201880033759.6A patent/CN110662738B/en active Active
- 2018-05-29 TW TW107118328A patent/TWI762648B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5474887A (en) * | 1977-11-29 | 1979-06-15 | Fuji Photo Film Co Ltd | Photo-polymerizable composition |
JPS6310769A (en) * | 1986-06-11 | 1988-01-18 | アクゾ・ナ−ムロ−ゼ・フェンノ−トシャップ | Unsaturated peroxide |
JPH0845604A (en) * | 1994-08-02 | 1996-02-16 | Yazaki Corp | Waterproof seal part for connector |
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Also Published As
Publication number | Publication date |
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CN110662738A (en) | 2020-01-07 |
KR20200015496A (en) | 2020-02-12 |
KR102542689B1 (en) | 2023-06-12 |
TWI762648B (en) | 2022-05-01 |
JPWO2018221177A1 (en) | 2020-04-02 |
CN110662738B (en) | 2023-06-06 |
TW201902881A (en) | 2019-01-16 |
JP7021668B2 (en) | 2022-02-17 |
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