WO2018218932A1 - Mask, mask apparatus and manufacturing method therefor, and mask manufacturing equipment - Google Patents
Mask, mask apparatus and manufacturing method therefor, and mask manufacturing equipment Download PDFInfo
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- WO2018218932A1 WO2018218932A1 PCT/CN2017/116610 CN2017116610W WO2018218932A1 WO 2018218932 A1 WO2018218932 A1 WO 2018218932A1 CN 2017116610 W CN2017116610 W CN 2017116610W WO 2018218932 A1 WO2018218932 A1 WO 2018218932A1
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- mask
- pattern portion
- edge
- tensile
- stretching
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 230000013011 mating Effects 0.000 claims description 66
- 238000000034 method Methods 0.000 claims description 11
- 230000000873 masking effect Effects 0.000 claims description 9
- 230000037303 wrinkles Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- 239000002184 metal Substances 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- 238000003698 laser cutting Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K99/00—Subject matter not provided for in other groups of this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Definitions
- Embodiments of the present disclosure relate to a mask, a mask device, a method of fabricating the same, and a mask manufacturing apparatus.
- OLED Organic Light-Emitting Diode
- a high-precision metal mask Fine Metal Mask, FMM for short
- the flatness of the FMM has a direct impact on the uniformity and positional accuracy of the film deposition.
- Embodiments of the present disclosure provide a mask, a mask device, a method of fabricating the same, and a mask manufacturing apparatus.
- a mask comprising:
- a pattern portion comprising a first edge and a second edge; a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge; as well as
- a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;
- first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects.
- the second tensile mating structure includes a relative orientation from the pattern portion in the second direction An outer protruding side structure and at least one hollow structure disposed on the side structure.
- the second tensile fit structure is a hollow structure.
- the first tensile mating structure, the second tensile mating structure, and the pattern portion are a unitary structure.
- a first dividing line is disposed between the first stretch fitting structure and the pattern portion, and a second dividing line is disposed between the second stretching mating structure and the pattern portion.
- the mask further includes two first edges that are oppositely disposed in the first direction, and two second edges that are oppositely disposed in the second direction.
- a masking apparatus comprising a frame and a plurality of the mask sheets disposed on the frame.
- the mask device further includes an occlusion mask, the occlusion mask is located on the frame, the occlusion mask is spaced apart from the mask, and each of the occlusion masks An edge and a corresponding edge of the mask are overlapped, and each edge of the occlusion mask is fixedly coupled to a corresponding edge of the mask.
- a mask manufacturing apparatus comprising: a first stretching device, a second stretching device, and the mask device;
- each of the first stretching devices is configured to apply a pulling force to the pattern portion in the first direction by the first tensile matching structure to achieve a pair of pattern portions in the first direction Apply tension in the opposite direction;
- Each of the second stretching devices is configured to apply a pulling force to the pattern portion in the second direction by the second tensile mating structure to achieve an upper edge of the pattern portion in the second direction Apply tension in the opposite direction.
- the second stretching device includes a fixed portion and a stretched portion, the fixed portion being configured to be disposed in the hollow structure.
- the fixed portion includes a groove configured to engage an edge of the hollow structure.
- a method of fabricating a mask device wherein the mask device comprises a frame and a mask, the mask comprising:
- the pattern portion including a first edge and a second edge
- a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge;
- a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;
- first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects;
- the method includes:
- the mask is affixed to the frame.
- first tensile mating structure the second tensile mating structure, and the pattern portion are integrally formed.
- a first dividing line is disposed between the first stretch fitting structure and the pattern portion, and a second dividing line is disposed between the second stretching mating structure and the pattern portion.
- the manufacturing method further includes removing the first tensile mating structure from the pattern portion along the first dividing line and fixing along the first dividing line before fixing the mask sheet to the frame
- the second dividing line removes the second tensile mating structure from the pattern portion.
- the second stretch-fit structure includes a side structure protruding from the pattern portion to the opposite outer side in the second direction, and a hollow structure disposed on the side structure, or the second stretch
- the mating structure is a hollow structure
- the second stretching device includes a fixing portion and a stretching portion, and the fixing portion is disposed in the hollow structure
- the method further includes:
- Each of the second stretching devices passes through a corresponding hollow structure to apply a pulling force to the pattern portion in the second direction.
- the hollow structure has a rectangular shape, a circular hole shape, or an elliptical hole shape
- the fixed portion of the second stretching device is a rectangular parallelepiped shape, a cylindrical shape, or an elliptical cylindrical shape.
- the fixing portion of the second stretching device is provided with a groove that cooperates with the hollow structure.
- FIG. 1 is a schematic structural view of a mask according to Embodiment 1 of the present disclosure.
- FIG. 2 is a schematic view showing the application of the mask in FIG. 1;
- FIG. 3A-C are schematic structural views of the first and second stretching devices of Fig. 2;
- FIG. 4 is a schematic structural view of a mask according to Embodiment 2 of the present disclosure.
- Figure 5 is a schematic structural view of the second stretching device of Figure 4.
- FIG. 6 is a schematic structural diagram of a mask provided according to Embodiment 3 of the present disclosure.
- FIG. 7 is a schematic structural diagram of a mask device according to Embodiment 4 of the present disclosure.
- FIG. 7b is a schematic view of a masking mask according to an embodiment of the present disclosure.
- FIG. 8 is a schematic structural diagram of a mask device according to Embodiment 5 of the present disclosure.
- FIG. 9 is a schematic structural diagram of a mask device according to Embodiment 6 of the present disclosure.
- FIG. 10 is a flowchart of a method of fabricating a mask device according to Embodiment 8 of the present disclosure.
- FIG. 11 is a schematic view showing the force deformation of the mask in the prior art and the embodiment of the present disclosure.
- the FMM is first laid before use and the FMM is soldered to the metal frame.
- the shape of the FMM is strip, and the FMM has four sides, of which the relative setting The two sides are in one direction, and the opposite two sides are in the other direction.
- the ends of the FMM are applied in opposite directions in a direction to pull the FMM in this direction and then weld.
- the inventors have found that since the pulling force is applied in the opposite direction only on both ends of one direction of the strip-shaped FMM, and no tension is applied to the both ends of the strip-shaped FMM in the other direction, the force on the FMM is uneven.
- the deformation of the FMM in different directions is inconsistent, and it is easy to produce wrinkles in the other direction. These wrinkles will result in poor evaporation, shadowing or color mixing, resulting in low production yield of the OLED device.
- FIG. 1 is a schematic structural view of a mask plate according to Embodiment 1 of the present disclosure
- FIG. 2 is a schematic view of the application of the mask plate of FIG. 1
- FIG. 3A is a schematic structural view of the first stretching device
- the first stretching device is A stretching device cooperates with the first tensile fit structure
- 3B-3C are schematic structural views of the second stretching device of Fig. 2, the second stretching device being engaged with the second tensile fitting structure.
- the mask comprises a pattern portion 1, and the edge 15 (first edge) of the pattern portion 1 is provided with a first tensile fit structure 2, a first stretch fit structure 2 and a A tensile structure 14 fits.
- the edge 16 (second edge) of the pattern portion 1 is provided with a second stretch-fit structure 3, and the second stretch-fit structure 3 is mated with the second stretch structure 4.
- a first direction and a second direction are disposed, the first edge 15 is located at two ends of the pattern portion in the first direction and the second edge 16 is located at two sides of the pattern portion in the second direction end.
- the number of the first stretching devices may be plural, and the number of the second stretching devices 4 may be plural.
- the masking plate can be stretched by applying a pulling force to the pattern portion 1 by the first stretching device and the second stretching device.
- each of the first stretching devices applies a pulling force to the pattern portion 1 in the first direction by the corresponding first stretching mating structure 2 to effect application of a pulling force to the pattern portion 1 in the opposite direction in the first direction;
- the second stretching device 4 applies a pulling force to the pattern portion 1 in the second direction by the corresponding second stretching fit structure 3 to effect application of a pulling force to the pattern portion 1 in the opposite direction in the second direction.
- the pattern portion 1 is provided with at least one first tensile fit structure 2 on each of the oppositely disposed two edges in the first direction.
- the pattern portion 1 is respectively provided with a first tensile fit structure 2 on opposite edges of the first direction.
- the first stretch-fit structure 2 is joined to the edge of the pattern portion 1, for example, the first stretch-fit structure 2 and the pattern portion 1 are integrally formed. Every first pull The stretching device 14 clamps the corresponding first tensile mating structure 2 in the first direction, and then in the first direction, each of the first stretching devices 14 applies a pulling force to the clamped first tensile mating structure 2 to achieve The pattern portion 1 is stretched in the opposite direction in the first direction. For example, as shown in FIGS.
- a first stretching device 14 applies a pulling force to the first stretching fit structure 2 on the upper side of the pattern portion 1 in the upward direction, and the other first stretching device 14 The pulling force is applied to the first tensile fitting structure 2 located on the lower side of the pattern portion 1 in the downward direction, thereby realizing the application of the pulling force to the pattern portion 1 in the opposite direction in the first direction.
- the top end of the first stretch-fit structure 2 is provided with a recessed portion 21, and both sides of the recessed portion 21 of the first stretch-fitted structure 2 are gripping portions 22, and the first stretching device 14 holds the first stretch fit
- the clamping portion of the structure 2 is configured to apply a pulling force to the first tensile mating structure 2.
- a recessed portion 21 is provided on the first stretch-fit structure 2, thereby facilitating the first stretching device 14 to sandwich the first stretch-fit structure 2, and capable of dispersing stress so that the strain of the pattern portion 1 is more uniform.
- the first stretching device can be a clamp for facilitating clamping of the clamping portion of the first tensile-fit structure 2.
- the second tensile mating structure 3 includes a side structure 31 and at least one hollow structure 32 disposed on the side structure 31.
- the second stretching device 4 applies a pulling force to the pattern portion 1 in the second direction through the corresponding hollow structure 32.
- the pattern portions 1 are respectively provided with at least one second tensile fit structure 3 on opposite edges of the second direction.
- the pattern portion 1 is respectively provided with a second tensile fit structure 3 on opposite edges of the second direction.
- the second stretch-fit structure 3 is integrally formed with the pattern portion 1.
- Each of the second stretching devices 4 clamps a corresponding second stretching fit structure 3 in the second direction, and then applies a second stretching device 4 to the clamped second tensile mating structure 3 in the second direction.
- the second stretching device 4 located on the left side of the pattern portion 1 in FIG. 2 passes through the corresponding hollow structure 32 and faces the pattern portion 1 in the left direction (the dotted arrow in the figure)
- the pulling direction of the finger applies a pulling force
- the second stretching device 4 located on the right side of the pattern portion 1 passes through the corresponding hollow structure 32 and applies the pattern portion 1 in the rightward direction (the pulling direction indicated by the dotted arrow in the figure)
- the second tensile structure 4 is a robot.
- the second stretch fit structure 3 of the pattern portion 1 disposed at two edges in the second direction is provided with a hollow structure 32, and the hollow structure 32 of the second stretch fit structure 3 disposed at two edges is one by one. Corresponding settings.
- the number of second stretching devices 4 may be the same as the number of hollow structures 32, and the number of hollow structures 32 may be plural.
- eight hollow structures 32 are taken as an example for description, and the second stretching device is used.
- the number of sets 4 is eight, and only two second stretching devices 4 are illustrated in FIG. 2 as an example.
- the provision of the plurality of hollow structures 32 allows the pattern portion 1 to have a plurality of force application points in the second direction, so that the pattern portion 1 can be better stretched in the second direction.
- the number of second stretching devices 4 may also differ from the number of hollow structures 32, for example, the number of second stretching devices 4 is less than the number of hollow structures 32, but in the hollowed out structure of the two edges in the second direction
- the second stretching device 4 is symmetrically disposed to uniformly and symmetrically stretch the pattern portion 1.
- the cross-sectional shape of the hollow structure 32 may include a triangle, a rectangle, a circle, an ellipse, a zigzag, or a wave.
- the cross-sectional shape of the hollow structure 32 is a rectangle, but the embodiment of the present disclosure is not limited thereto, and for example, the hollow structure 32 may also adopt other shapes as described above.
- the spacing between the hollow structures 32, the width of the hollow structure 32, the location of the hollow structure 32, and the thickness of the hollow structure 32 may vary. Accordingly, for example, in order to match the rectangular shape of the exemplary hollow structure 32, the second stretching device 4 includes the fixing portion 41 in the shape of a rectangular parallelepiped as shown in FIGS. 2 and 3B-3C.
- the second stretching device 4 can further include a stretched portion 42 that is disposed in the hollow structure 32.
- the stretched portion 42 is for applying a pulling force to the pattern portion 1 in the second direction.
- the fixed portion 41 and the stretched portion 42 are disposed to intersect, for example, the fixed portion 41 and the stretched portion 42 are vertically intersected.
- a groove 43 is provided on the outer side and/or the inner side of the fixed portion 41, and the groove 43 is engaged with the edge of the hollow structure 32.
- the outer side of the fixing portion 41 refers to the side 46 facing away from the pattern portion 1, that is, the side away from the pattern portion 1 (stretching direction); the inner finger of the fixing portion 41 It is toward the side 45 of the pattern portion 1, that is, the side adjacent to the pattern portion 1.
- a groove 43 is provided on the outer side of the fixed portion 41.
- the shape and size of the corresponding edges of the groove 43 and the hollow structure 32 are matched so that the groove 43 can be engaged with the edge of the hollow structure 32, so that the second tensile fitting structure 3 can be caught in the groove 43, thereby being effective
- the warpage of the pattern portion 1 or the offset in the first direction is avoided.
- the inside of the fixed portion 41 is provided with a groove 43.
- the shape and size of the corresponding edges of the groove 43 and the hollow structure 32 are matched so that the groove 43 can be engaged with the edge of the hollow structure 32, so that the second tensile fitting structure 3 can be caught in the groove 43, thereby being effective
- the warpage of the pattern portion 1 or the offset in the first direction is avoided.
- a first dividing line 5 is disposed between the first tensile mating structure 2 and the pattern portion 1, and the pulling of the pattern portion 1 in the first direction and the second direction is completed.
- the web is removed from the pattern portion 1 along the first dividing line 5.
- the first tensile mating structure 2 can be removed from the pattern portion 1 along the first dividing line 5 by the first stretching device.
- the first stretch-fit structure 2 may be removed from the pattern portion 1 along the first dividing line 5 by laser cutting.
- the first stretch-fit structure 2 is removed from the pattern portion 1 without affecting the structure of the entire mask, nor affecting the uniformity of the contact between the mask and the substrate during the evaporation process.
- the first tensile mating structure 2 may not be removed from the pattern portion 1 after the end of the web, so that there is no need to provide the first dividing line 5 between the first stretching mating structure 2 and the pattern portion 1. .
- a second dividing line 6 is disposed between the second tensile mating structure 3 and the pattern portion 1, and the pulling of the pattern portion 1 in the first direction and the second direction is completed.
- the second tensile mating structure 3 can be removed from the pattern portion 1 along the second dividing line 6.
- the second tensile mating structure 3 can be removed from the pattern portion 1 along the second dividing line 6 by the second stretching device 4.
- the second tensile mating structure 3 may be removed from the pattern portion 1 along the second dividing line 6 by laser cutting.
- the second stretch-fit structure 3 is removed from the pattern portion 1 without affecting the structure of the entire mask, nor affecting the uniformity of the contact between the mask and the substrate during the evaporation process.
- the second tensile mating structure 3 may not be removed from the pattern portion 1 after the end of the web, so that there is no need to provide the second dividing line 6 between the second stretching mating structure 3 and the pattern portion 1. .
- the pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11.
- the first tensile mating structure 2 is joined to the edge of the peripheral zone 12 and the second tensile mating structure 3 is joined to the edge of the peripheral zone 12.
- the mask is a high precision metal mask (FMM).
- FIG. 4 is a schematic structural view of a mask plate according to Embodiment 2 of the present disclosure
- FIG. 5 is a schematic structural view of the second stretching device 4 of FIG. 4, as shown in FIG. 4 and FIG. 5, the embodiment and the above implementation.
- the difference of the first example is that, for example, the cross-sectional shape of the hollow structure 32 in the present embodiment is a circular hole shape. Accordingly, in order to match the shape of the hollow structure 32, the shape of the fixed portion 41 is cylindrical. For the rest of the description, refer to the first embodiment, and the description is not repeated here.
- FIG. 6 is a schematic structural diagram of a mask according to Embodiment 3 of the present disclosure.
- the difference between the embodiment and the first embodiment is that the second tensile fit structure is a hollow structure in this embodiment. 32.
- the cross-sectional shape of the hollow structure 32 is elliptical, and the fixing portion 41 of the second stretching device with which the shape is matched is shaped as an elliptical cylinder passing through the corresponding hollow structure 32 in the second direction.
- a pulling force is applied to the pattern portion 1.
- the second stretching device is not shown in Fig. 6, and the description can be referred to the description in the first embodiment and Fig. 2 and Figs. 3B-3C.
- the pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11.
- the hollowed out area 32 is located in the peripheral zone 12.
- the edge of the pattern portion in the first direction is provided with a first stretch-fit structure
- the edge of the pattern portion is disposed with the second stretch-fit structure at the edge in the second direction.
- the first stretching device can be used to apply a pulling force to the pattern portion in the first direction by the first stretching fitting structure
- the second stretching device can be used to apply the pulling force to the pattern portion in the second direction by the second stretching fitting structure.
- the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the Production yield of light-emitting devices.
- FIG. 7 is a schematic structural diagram of a mask device according to Embodiment 4 of the present disclosure. As shown in FIG. 7 , the mask device includes a frame 7 and a mask disposed on the frame 7 .
- the mask can be used as the mask provided in the first embodiment, and details are not described herein again.
- the frame 7 is a ring structure.
- the material of the frame 7 can be metal.
- the number of masks disposed on the frame 7 may be one or more.
- FIG. 7b is a schematic view of a mask blocking plate.
- a plurality of masks are arranged side by side on the frame 7, and a plurality of masks are arranged at intervals, that is, a certain mask is provided between the masks. Interval.
- three mask sheets are provided in FIG. 7b, and three mask sheets are disposed side by side on the frame 7, but the embodiment of the present disclosure is not limited thereto.
- the frame 7 is further provided with a shielding mask 10, the shielding mask 10 is disposed between the masks, and the edges of the shielding mask 10 and the edges of the mask are overlapped, and the mask is blocked.
- the edge of 10 is fixedly attached to the edge of the mask.
- the shielding mask is usually strip-shaped, and can also serve as an edge for supporting the mask, and shielding the spacing of the mask.
- the edge of the mask is the edge of the pattern portion 1 in the second direction.
- the pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11, and thus the edge of the pattern portion 1 in the second direction is the peripheral area 12 of the pattern portion 1 in the second direction.
- the edge of the occlusion mask 10 is fixedly connected to the peripheral portion 12 of the pattern portion 1 in the second direction.
- the edge of the shielding mask and the edge of the mask can be fixedly connected by a laser.
- the edge of the pattern portion 1 in the second direction is provided with a solder joint 8 through which the mask mask is shielded
- the edge of the panel 10 is welded to the edge of the mask.
- the edge of the shielding mask and the edge of the mask are fixedly connected, and the shielding mask can provide a continuous pulling force in the second direction by the shielding mask with higher strength, thereby further improving the mask.
- the strength of the sheet is reduced, the wrinkles are reduced, and the flatness of the mask is improved.
- FIG. 8 is a schematic structural diagram of a mask device according to Embodiment 5 of the present disclosure. As shown in FIG. 8 , the mask device includes a frame 7 and a mask plate disposed on the frame 7 .
- the mask plate provided in the above embodiment 2 can be used as the mask, and details are not described herein again.
- the frame 7 is a ring structure.
- the material of the frame 7 can be metal.
- the number of masks disposed on the frame 7 may be one or more.
- FIG. 9 is a schematic structural diagram of a mask device according to Embodiment 6 of the present disclosure. As shown in FIG. 9, the mask device includes a frame 7 and a mask plate disposed on the frame 7. The mask plate provided in the above embodiment 3 can be used as the mask, and details are not described herein again.
- the frame 7 is a ring structure.
- the material of the frame 7 can be metal.
- the number of masks disposed on the frame 7 may be one or more.
- the edge of the pattern portion in the first direction is provided with a first stretch-fit structure
- the edge of the pattern portion is disposed with the second stretch-fit structure at the edge in the second direction.
- a pulling force may be applied to the pattern portion in the first direction by the first stretching mating structure
- a pulling force may be applied to the pattern portion in the second direction by the second stretching mating structure, in the first direction and the second in the embodiment of the present disclosure
- the pulling force is applied to the pattern portion in two directions, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the production yield of the light emitting device.
- Embodiment 7 of the present disclosure provides a mask manufacturing apparatus including a first stretching device, a second stretching device, and a mask device.
- the mask device may be the mask device provided in the fourth embodiment, the fifth embodiment or the sixth embodiment.
- Each of the first stretching devices applies a pulling force to the pattern portion in the first direction by the corresponding first stretching mating structure to achieve a pulling force in a direction opposite to the pattern portion in the first direction
- Each of the second stretching devices applies a pulling force to the pattern portion in the second direction through the corresponding second stretching mating structure to achieve opposite directions on the pattern portion in the second direction Apply tension.
- the descriptions of the first stretching device and the second stretching device can be referred to the description in the first embodiment or the second embodiment.
- the edge of the pattern portion in the first direction is provided with a first tensile matching structure, and the edge of the pattern portion is disposed with the second tensile matching structure at the edge in the second direction.
- a pulling force may be applied to the pattern portion in the first direction by the first tensile mating structure, and a pulling force may be applied to the pattern portion in the second direction by the second stretching mating structure.
- the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the Production yield of light-emitting devices.
- the mask device includes a frame and a mask.
- the mask includes a pattern portion, and the pattern portion is first.
- the edge in the direction is provided with a first stretch-fit structure
- the edge of the pattern portion in the second direction is provided with a second stretch-fit structure, and the first direction and the second direction are disposed to intersect.
- the method includes:
- Step 101 each first stretching device applies a pulling force to the pattern portion in a first direction by a corresponding first tensile matching structure to achieve a pulling force in a direction opposite to the pattern portion in the first direction, and each second The stretching device applies a pulling force to the pattern portion in the second direction by the corresponding second tensile fitting structure to effect application of a pulling force in the opposite direction on the pattern portion in the second direction.
- Step 102 Fix the mask to the frame.
- the mask can be welded to the frame by laser.
- the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are integrally formed, and a first dividing line is disposed between the first stretch-fit structure and the pattern portion, and between the second stretch-fit structure and the pattern portion A second dividing line is set.
- the step 102 further includes: removing the first tensile mating structure from the pattern portion along the first dividing line and the second stretching mating structure from the second dividing line from the Removed from the pattern.
- the second tensile mating structure includes a side structure and a hollow structure disposed on the side structure, or the second tensile mating structure is a hollow structure.
- the second stretching device includes a fixed portion and a stretched portion, and the fixed portion is disposed in the hollow structure.
- each of the second stretching devices applying a pulling force to the pattern portion in the second direction by the corresponding second tensile mating structure includes: each of the second stretching devices passes through a corresponding hollow The structure applies a pulling force to the pattern portion in the second direction.
- the manufacturing method of the mask device provided in this embodiment can be used to manufacture the above-mentioned embodiment 4 and the embodiment. 5 or the mask device provided in the sixth embodiment.
- the fourth embodiment, the fifth embodiment or the sixth embodiment refer to the fourth embodiment, the fifth embodiment or the sixth embodiment.
- the edge of the pattern portion in the first direction is provided with a first tensile matching structure, and the edge of the pattern portion is disposed with the second stretching at the edge in the second direction.
- the first stretching device applies a pulling force to the pattern portion in the first direction by the first stretching fit structure
- the second stretching device applies a pulling force to the pattern portion in the second direction by the second stretching mating structure
- the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the illumination.
- the deformation of the force applied to the mask plate can be simulated by the ANSYS finite element simulation software.
- 11 is a schematic view showing the force deformation of the mask in the prior art and the embodiment of the present disclosure. As shown in FIG. 11, the display area of the mask in the prior art is unevenly applied, thereby generating wrinkles; The display area of the mask in the embodiment of the present disclosure is uniformly applied, and the elastic deformation of the display area is more uniform, and wrinkles are not generated, thereby improving the flatness of the mask.
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Abstract
A mask, a mask apparatus and manufacturing method therefor, and mask manufacturing equipment. The mask comprises: a pattern part (1), comprising first edges (15) and second edges (16); first stretching fitting structures (2) used to relatively stretch the pattern part (1) along a first direction, the first stretching fitting structures (2) being located on the first edges (15); and second stretching fitting structures (3) used to relatively stretch the pattern part along a second direction, the second stretching fitting structures (3) being located on the second edges (16). The first edges (15) are located at two ends of the pattern part (1) in the first direction, the second edges (16) are located at two ends of the pattern part (1) in the second direction, and the first direction and the second direction intersect.
Description
相关申请的交叉引用Cross-reference to related applications
本申请要求于2017年06月02日向SIPO提交的名称为“掩膜板、掩膜装置及其制造方法和掩膜制造设备”的中国专利申请No.201710408986.X的优先权,其全文通过引用合并于本文。The present application claims priority to Chinese Patent Application No. 201710408986.X, which is assigned to the PCT filed on Jun. 2,,,,,,,,,,,,,,,,, Incorporated in this article.
本公开的实施例涉及一种掩膜板、掩膜装置及其制造方法和掩膜制造设备。Embodiments of the present disclosure relate to a mask, a mask device, a method of fabricating the same, and a mask manufacturing apparatus.
有机发光二极管(Organic Light-Emitting Diode,简称:OLED)面板的生产主要采用的是蒸发镀膜的方式。蒸镀过程中,通常采用高精度金属掩膜板(Fine Metal Mask,简称:FMM)来沉积RGB膜层。FMM的平坦度对膜层沉积的均一性、位置准确性有着直接的影响。The production of Organic Light-Emitting Diode (OLED) panels is mainly by evaporation coating. In the evaporation process, a high-precision metal mask (Fine Metal Mask, FMM for short) is usually used to deposit the RGB film layer. The flatness of the FMM has a direct impact on the uniformity and positional accuracy of the film deposition.
发明内容Summary of the invention
本公开的实施例提供一种掩膜板、掩膜装置及其制造方法和掩膜制造设备。Embodiments of the present disclosure provide a mask, a mask device, a method of fabricating the same, and a mask manufacturing apparatus.
根据本公开的至少一个实施例,提供一种掩膜板,包括:According to at least one embodiment of the present disclosure, a mask is provided, comprising:
图案部,包括第一边缘和第二边缘;用于将所述图案部沿第一方向相对拉伸的第一拉伸配合结构,所述第一拉伸配合结构位于所述第一边缘上;以及a pattern portion comprising a first edge and a second edge; a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge; as well as
用于将所述图案部沿第二方向相对拉伸的第二拉伸配合结构,所述第二拉伸配合结构位于所述第二边缘上;a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;
其中,所述第一边缘位于所述图案部在所述第一方向的两端以及所述第二边缘位于所述图案部在所述第二方向的两端,并且所述第一方向和所述第二方向相交。Wherein the first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects.
例如,所述第二拉伸配合结构包括从所述图案部沿第二方向分别向相对
的外侧突出的侧边结构和设置于所述侧边结构上的至少一个镂空结构。For example, the second tensile mating structure includes a relative orientation from the pattern portion in the second direction
An outer protruding side structure and at least one hollow structure disposed on the side structure.
例如,所述第二拉伸配合结构为镂空结构。For example, the second tensile fit structure is a hollow structure.
例如,所述第一拉伸配合结构、所述第二拉伸配合结构与所述图案部为一体结构。For example, the first tensile mating structure, the second tensile mating structure, and the pattern portion are a unitary structure.
例如,所述第一拉伸配合结构和所述图案部之间设置有第一分割线,以及所述第二拉伸配合结构和所述图案部之间设置有第二分割线。For example, a first dividing line is disposed between the first stretch fitting structure and the pattern portion, and a second dividing line is disposed between the second stretching mating structure and the pattern portion.
例如,所述的掩膜板还包括:在所述第一方向上相对设置的两个所述第一边缘,以及在所述第二方向上相对设置的两个所述第二边缘。For example, the mask further includes two first edges that are oppositely disposed in the first direction, and two second edges that are oppositely disposed in the second direction.
根据本公开的至少一个实施例,还提供一种掩膜装置,包括框架和设置于所述框架之上的多个所述的掩膜板。According to at least one embodiment of the present disclosure, there is also provided a masking apparatus comprising a frame and a plurality of the mask sheets disposed on the frame.
例如,所述掩膜装置还包括遮挡掩膜板,所述遮挡掩模板位于所述框架上,所述遮挡掩膜板与所述掩膜板间隔设置,且所述遮挡掩膜板的每个边缘和所述掩膜板的相应边缘重叠设置,以及所述遮挡掩膜板的每个边缘和所述掩膜板的相应边缘固定连接。For example, the mask device further includes an occlusion mask, the occlusion mask is located on the frame, the occlusion mask is spaced apart from the mask, and each of the occlusion masks An edge and a corresponding edge of the mask are overlapped, and each edge of the occlusion mask is fixedly coupled to a corresponding edge of the mask.
根据本公开的至少一个实施例,还提供一种掩膜制造设备,包括:第一拉伸装置、第二拉伸装置和所述掩膜装置;According to at least one embodiment of the present disclosure, there is also provided a mask manufacturing apparatus comprising: a first stretching device, a second stretching device, and the mask device;
其中,每个所述第一拉伸装置被配置为通过所述第一拉伸配合结构在所述第一方向上对所述图案部施加拉力,以实现在所述第一方向上对图案部沿相反方向施加拉力;以及Wherein each of the first stretching devices is configured to apply a pulling force to the pattern portion in the first direction by the first tensile matching structure to achieve a pair of pattern portions in the first direction Apply tension in the opposite direction;
每个所述第二拉伸装置被配置为通过所述第二拉伸配合结构在所述第二方向上对所述图案部施加拉力,以实现在所述第二方向上对图案部上沿相反方向施加拉力。Each of the second stretching devices is configured to apply a pulling force to the pattern portion in the second direction by the second tensile mating structure to achieve an upper edge of the pattern portion in the second direction Apply tension in the opposite direction.
例如,所述第二拉伸装置包括固定部分和拉伸部分,所述固定部分被配置为设置于所述镂空结构中。For example, the second stretching device includes a fixed portion and a stretched portion, the fixed portion being configured to be disposed in the hollow structure.
例如,所述固定部分包括凹槽,所述凹槽被配置为卡合所述镂空结构的边缘。For example, the fixed portion includes a groove configured to engage an edge of the hollow structure.
根据本公开的至少一个实施例,还提供一种掩膜装置的制造方法,其中,所述掩膜装置包括框架和掩膜板,所述掩膜板包括:According to at least one embodiment of the present disclosure, there is also provided a method of fabricating a mask device, wherein the mask device comprises a frame and a mask, the mask comprising:
图案部,所述图案部包括第一边缘和第二边缘;a pattern portion, the pattern portion including a first edge and a second edge;
用于将所述图案部沿第一方向相对拉伸的第一拉伸配合结构,所述第一拉伸配合结构位于所述第一边缘上;以及
a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge;
用于将所述图案部沿第二方向相对拉伸的第二拉伸配合结构,所述第二拉伸配合结构位于所述第二边缘上;a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;
其中,所述第一边缘位于所述图案部在所述第一方向的两端以及所述第二边缘位于所述图案部在所述第二方向的两端,并且所述第一方向和所述第二方向相交;Wherein the first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects;
所述方法包括:The method includes:
通过第一拉伸装置向所述第一拉伸配合结构在所述第一方向上施加拉力,以使所述图案部在所述第一方向上受到大小相同方向相反的力,以及通过第二拉伸装置向所述第二拉伸配合结构在所述第二方向上施加拉力以使所述图案部在第二方向上受到大小相同方向相反的力;以及Applying a pulling force to the first tensile mating structure in the first direction by the first stretching device such that the pattern portion receives forces of opposite magnitudes in the first direction, and passes through the second Stretching means applies a pulling force to the second tensile mating structure in the second direction such that the pattern portions are subjected to forces of opposite magnitudes in the second direction;
将所述掩膜板固定于所述框架上。The mask is affixed to the frame.
例如,所述第一拉伸配合结构、所述第二拉伸配合结构和所述图案部一体成型。For example, the first tensile mating structure, the second tensile mating structure, and the pattern portion are integrally formed.
例如,所述第一拉伸配合结构和所述图案部之间设置有第一分割线,以及所述第二拉伸配合结构和所述图案部之间设置有第二分割线。For example, a first dividing line is disposed between the first stretch fitting structure and the pattern portion, and a second dividing line is disposed between the second stretching mating structure and the pattern portion.
例如,所述制造方法还包括:在将所述掩膜板固定于所述框架上之前,沿所述第一分割线将所述第一拉伸配合结构从所述图案部上去除,以及沿所述第二分割线将所述第二拉伸配合结构从所述图案部上去除。For example, the manufacturing method further includes removing the first tensile mating structure from the pattern portion along the first dividing line and fixing along the first dividing line before fixing the mask sheet to the frame The second dividing line removes the second tensile mating structure from the pattern portion.
例如,所述第二拉伸配合结构包括从所述图案部沿第二方向分别向相对的外侧突出的侧边结构和设置于所述侧边结构上的镂空结构,或者所述第二拉伸配合结构为镂空结构;所述第二拉伸装置包括固定部分和拉伸部分,所述固定部分设置于所述镂空结构中;For example, the second stretch-fit structure includes a side structure protruding from the pattern portion to the opposite outer side in the second direction, and a hollow structure disposed on the side structure, or the second stretch The mating structure is a hollow structure; the second stretching device includes a fixing portion and a stretching portion, and the fixing portion is disposed in the hollow structure;
所述方法还包括:The method further includes:
每个所述第二拉伸装置穿过对应的镂空结构以在所述第二方向上对所述图案部相对施加拉力。Each of the second stretching devices passes through a corresponding hollow structure to apply a pulling force to the pattern portion in the second direction.
例如,所述镂空结构的截面形状为矩形,圆孔形,或椭圆孔形,所述第二拉伸装置的所述固定部分为与之配合的长方体形,圆柱形,或椭圆柱形。For example, the hollow structure has a rectangular shape, a circular hole shape, or an elliptical hole shape, and the fixed portion of the second stretching device is a rectangular parallelepiped shape, a cylindrical shape, or an elliptical cylindrical shape.
例如,所述第二拉伸装置的所述固定部分上设置有与所述镂空结构配合的凹槽。For example, the fixing portion of the second stretching device is provided with a groove that cooperates with the hollow structure.
以下将结合附图对本公开的实施例进行更详细的说明,以使本领域普通技术人员更加清楚地理解本公开的实施例,其中:The embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings, in which
图1为本公开实施例一提供的一种掩膜板的结构示意图;1 is a schematic structural view of a mask according to Embodiment 1 of the present disclosure;
图2为图1中掩膜板的应用示意图;2 is a schematic view showing the application of the mask in FIG. 1;
图3A-C分别为图2中第一和第二拉伸装置的结构示意图;3A-C are schematic structural views of the first and second stretching devices of Fig. 2;
图4为本公开实施例二提供的一种掩膜板的结构示意图;4 is a schematic structural view of a mask according to Embodiment 2 of the present disclosure;
图5为图4中第二拉伸装置的结构示意图;Figure 5 is a schematic structural view of the second stretching device of Figure 4;
图6为本公开实施例三提供的一种掩膜板的结构示意图;FIG. 6 is a schematic structural diagram of a mask provided according to Embodiment 3 of the present disclosure;
图7a为本公开实施例四提供的一种掩膜装置的结构示意图;FIG. 7 is a schematic structural diagram of a mask device according to Embodiment 4 of the present disclosure; FIG.
图7b为本公开实施例的遮挡掩膜板的示意图;7b is a schematic view of a masking mask according to an embodiment of the present disclosure;
图8为本公开实施例五提供的一种掩膜装置的结构示意图;8 is a schematic structural diagram of a mask device according to Embodiment 5 of the present disclosure;
图9为本公开实施例六提供的一种掩膜装置的结构示意图;FIG. 9 is a schematic structural diagram of a mask device according to Embodiment 6 of the present disclosure;
图10为本公开实施例八提供的一种掩膜装置的制造方法的流程图;10 is a flowchart of a method of fabricating a mask device according to Embodiment 8 of the present disclosure;
图11为现有技术和本公开实施例中的掩膜板的受力形变对比示意图。FIG. 11 is a schematic view showing the force deformation of the mask in the prior art and the embodiment of the present disclosure.
下面将结合本公开的实施例中的附图,对本公开的实施例中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本公开的一部分实施例,而不是全部的实施例。基于本公开中的实施例,本领域普通技术人员在无须做出创造性劳动前提下所获得的所有其它实施例,都应属于本公开保护的范围。The technical solutions in the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings in the embodiments of the present disclosure. It is apparent that the described embodiments are only a part of the embodiments of the present disclosure, and not all of them. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present disclosure without departing from the inventive scope are intended to be within the scope of the disclosure.
除非另外定义,此处使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性,而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同,而不排除其他元件或者物件。“上”、“下”、“左”、“右”等仅用于表示相对位置关系,当被描述对象的绝对位置改变后,则该相对位置关系也可能相应地改变。Unless otherwise defined, technical terms or scientific terms used herein shall be understood in the ordinary meaning as understood by those of ordinary skill in the art. The words "first," "second," and similar terms used in the present disclosure do not denote any order, quantity, or importance, but are used to distinguish different components. The word "comprising" or "comprises" or the like means that the element or item preceding the word is intended to be in the "Upper", "lower", "left", "right", etc. are only used to indicate the relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may also change accordingly.
在采用高精度金属掩膜板(Fine Metal Mask,简称:FMM)来沉积RGB膜层中,使用前需先对FMM进行张网,并用激光将FMM焊接在金属框架(Frame)上。通常FMM的形状为条状,FMM具备四条边,其中相对设置
的两条边位于一个方向上,相对设置的另两条边位于另一个方向上。张网过程中在FMM的一个方向上的两端沿相反方向施加拉力以将FMM在该方向上拉直后进行焊接。In the RGB film layer deposited by using a high-precision metal mask (Fine Metal Mask, FMM for short), the FMM is first laid before use and the FMM is soldered to the metal frame. Usually the shape of the FMM is strip, and the FMM has four sides, of which the relative setting
The two sides are in one direction, and the opposite two sides are in the other direction. During the web process, the ends of the FMM are applied in opposite directions in a direction to pull the FMM in this direction and then weld.
发明人发现:由于仅在条状的FMM的一个方向的两端上沿相反方向施加拉力,而在条状的FMM的另一个方向的两端未施加拉力,因此导致FMM上受力不均,使得FMM在不同方向的形变不一致,容易在另一个方向上产生褶皱,这些褶皱将导致蒸镀不均、阴影(Shadow)或混色等不良,从而导致OLED器件的生产良率低。The inventors have found that since the pulling force is applied in the opposite direction only on both ends of one direction of the strip-shaped FMM, and no tension is applied to the both ends of the strip-shaped FMM in the other direction, the force on the FMM is uneven. The deformation of the FMM in different directions is inconsistent, and it is easy to produce wrinkles in the other direction. These wrinkles will result in poor evaporation, shadowing or color mixing, resulting in low production yield of the OLED device.
下面结合附图对本公开实施例提供的掩膜板、掩膜装置及其制造方法和掩膜制造设备进行详细描述。The mask, the mask device, the manufacturing method thereof and the mask manufacturing device provided by the embodiments of the present disclosure are described in detail below with reference to the accompanying drawings.
图1为本公开实施例一提供的一种掩膜板的结构示意图,图2为图1中掩膜板的应用示意图,图3A为第一拉伸装置的结构示意图,第一拉伸装置第一拉伸装置与第一拉伸配合结构配合。图3B-3C为图2中第二拉伸装置的结构示意图,第二拉伸装置与第二拉伸配合结构配合。1 is a schematic structural view of a mask plate according to Embodiment 1 of the present disclosure, FIG. 2 is a schematic view of the application of the mask plate of FIG. 1, and FIG. 3A is a schematic structural view of the first stretching device, and the first stretching device is A stretching device cooperates with the first tensile fit structure. 3B-3C are schematic structural views of the second stretching device of Fig. 2, the second stretching device being engaged with the second tensile fitting structure.
如图1至图3A-3C所示,该掩膜板包括图案部1,图案部1的边缘15(第一边缘)设置有第一拉伸配合结构2,第一拉伸配合结构2与第一拉伸结构14配合。图案部1的边缘16(第二边缘)设置有第二拉伸配合结构3,第二拉伸配合结构3与第二拉伸结构4配合。第一方向和第二方向交叉设置,所述第一边缘15位于所述图案部在所述第一方向的两端以及所述第二边缘16位于所述图案部在所述第二方向的两端。As shown in FIGS. 1 to 3A-3C, the mask comprises a pattern portion 1, and the edge 15 (first edge) of the pattern portion 1 is provided with a first tensile fit structure 2, a first stretch fit structure 2 and a A tensile structure 14 fits. The edge 16 (second edge) of the pattern portion 1 is provided with a second stretch-fit structure 3, and the second stretch-fit structure 3 is mated with the second stretch structure 4. a first direction and a second direction are disposed, the first edge 15 is located at two ends of the pattern portion in the first direction and the second edge 16 is located at two sides of the pattern portion in the second direction end.
例如,第一拉伸装置的数量可以为多个,第二拉伸装置4的数量可以为多个。可通过第一拉伸装置和第二拉伸装置对图案部1施加拉力,从而实现对掩膜板进行张网。例如,每个第一拉伸装置通过对应的第一拉伸配合结构2在第一方向上对图案部1施加拉力,以实现在第一方向上对图案部1沿相反方向施加拉力;每个第二拉伸装置4通过对应的第二拉伸配合结构3在第二方向上对图案部1施加拉力,以实现在第二方向上对图案部1沿相反方向施加拉力。For example, the number of the first stretching devices may be plural, and the number of the second stretching devices 4 may be plural. The masking plate can be stretched by applying a pulling force to the pattern portion 1 by the first stretching device and the second stretching device. For example, each of the first stretching devices applies a pulling force to the pattern portion 1 in the first direction by the corresponding first stretching mating structure 2 to effect application of a pulling force to the pattern portion 1 in the opposite direction in the first direction; The second stretching device 4 applies a pulling force to the pattern portion 1 in the second direction by the corresponding second stretching fit structure 3 to effect application of a pulling force to the pattern portion 1 in the opposite direction in the second direction.
图案部1在第一方向上的相对设置的两个边缘上分别设置有至少一个第一拉伸配合结构2。本实施例中,图案部1在第一方向上的相对设置的两个边缘上分别设置有一个第一拉伸配合结构2。第一拉伸配合结构2与图案部1的边缘连接,例如,第一拉伸配合结构2和图案部1一体成型。每个第一拉
伸装置14夹持第一方向上对应的第一拉伸配合结构2,而后在第一方向上每个第一拉伸装置14对夹持的第一拉伸配合结构2施加拉力,以实现在第一方向上沿相反方向拉伸图案部1。例如,如图1-2所示,一个第一拉伸装置14对夹持的位于图案部1上侧的第一拉伸配合结构2沿向上的方向施加拉力,另一个第一拉伸装置14对夹持的位于图案部1下侧的第一拉伸配合结构2沿向下的方向施加拉力,从而实现了在第一方向上对图案部1沿相反方向施加拉力。第一拉伸配合结构2的顶端设置有凹进部位21,第一拉伸配合结构2的凹进部位21的两侧为夹持部位22,第一拉伸装置14夹持第一拉伸配合结构2的夹持部位以实现对第一拉伸配合结构2施加拉力。在第一拉伸配合结构2上设置凹进部位21,从而便于第一拉伸装置14夹持第一拉伸配合结构2,且能够分散应力,使得图案部1的应变更加均匀。例如,第一拉伸装置可以为夹具,方便夹持第一拉伸配合结构2的夹持部位。The pattern portion 1 is provided with at least one first tensile fit structure 2 on each of the oppositely disposed two edges in the first direction. In this embodiment, the pattern portion 1 is respectively provided with a first tensile fit structure 2 on opposite edges of the first direction. The first stretch-fit structure 2 is joined to the edge of the pattern portion 1, for example, the first stretch-fit structure 2 and the pattern portion 1 are integrally formed. Every first pull
The stretching device 14 clamps the corresponding first tensile mating structure 2 in the first direction, and then in the first direction, each of the first stretching devices 14 applies a pulling force to the clamped first tensile mating structure 2 to achieve The pattern portion 1 is stretched in the opposite direction in the first direction. For example, as shown in FIGS. 1-2, a first stretching device 14 applies a pulling force to the first stretching fit structure 2 on the upper side of the pattern portion 1 in the upward direction, and the other first stretching device 14 The pulling force is applied to the first tensile fitting structure 2 located on the lower side of the pattern portion 1 in the downward direction, thereby realizing the application of the pulling force to the pattern portion 1 in the opposite direction in the first direction. The top end of the first stretch-fit structure 2 is provided with a recessed portion 21, and both sides of the recessed portion 21 of the first stretch-fitted structure 2 are gripping portions 22, and the first stretching device 14 holds the first stretch fit The clamping portion of the structure 2 is configured to apply a pulling force to the first tensile mating structure 2. A recessed portion 21 is provided on the first stretch-fit structure 2, thereby facilitating the first stretching device 14 to sandwich the first stretch-fit structure 2, and capable of dispersing stress so that the strain of the pattern portion 1 is more uniform. For example, the first stretching device can be a clamp for facilitating clamping of the clamping portion of the first tensile-fit structure 2.
第二拉伸配合结构3包括侧边结构31和设置于侧边结构31上的至少一个镂空结构32。第二拉伸装置4穿过对应的镂空结构32在第二方向上对图案部1施加拉力。图案部1在第二方向上的相对设置的两个边缘上分别设置有至少一个第二拉伸配合结构3。本实施例中,图案部1在第二方向上的相对设置的两个边缘上分别设置有一个第二拉伸配合结构3。例如,第二拉伸配合结构3与图案部1一体成型。每个第二拉伸装置4夹持第二方向上对应的第二拉伸配合结构3,而后在第二方向上每个第二拉伸装置4对夹持的第二拉伸配合结构3施加拉力,以实现在第二方向上沿相反方向拉伸图案部1。例如,如图1和图2所示,图2中位于图案部1左侧的第二拉伸装置4穿过对应的镂空结构32并对图案部1沿向左的方向(图中虚线箭头所指的拉力方向)施加拉力,位于图案部1右侧的第二拉伸装置4穿过对应的镂空结构32并对图案部1沿向右的方向(图中虚线箭头所指的拉力方向)施加拉力,以实现在第二方向上沿相反方向拉伸图案部1。本实施例中,例如,第二拉伸结构4为机械手。The second tensile mating structure 3 includes a side structure 31 and at least one hollow structure 32 disposed on the side structure 31. The second stretching device 4 applies a pulling force to the pattern portion 1 in the second direction through the corresponding hollow structure 32. The pattern portions 1 are respectively provided with at least one second tensile fit structure 3 on opposite edges of the second direction. In this embodiment, the pattern portion 1 is respectively provided with a second tensile fit structure 3 on opposite edges of the second direction. For example, the second stretch-fit structure 3 is integrally formed with the pattern portion 1. Each of the second stretching devices 4 clamps a corresponding second stretching fit structure 3 in the second direction, and then applies a second stretching device 4 to the clamped second tensile mating structure 3 in the second direction. Pulling force to achieve stretching of the pattern portion 1 in the opposite direction in the second direction. For example, as shown in FIGS. 1 and 2, the second stretching device 4 located on the left side of the pattern portion 1 in FIG. 2 passes through the corresponding hollow structure 32 and faces the pattern portion 1 in the left direction (the dotted arrow in the figure) The pulling direction of the finger applies a pulling force, and the second stretching device 4 located on the right side of the pattern portion 1 passes through the corresponding hollow structure 32 and applies the pattern portion 1 in the rightward direction (the pulling direction indicated by the dotted arrow in the figure) Pulling force to achieve stretching of the pattern portion 1 in the opposite direction in the second direction. In the present embodiment, for example, the second tensile structure 4 is a robot.
例如,图案部1在第二方向上的两个边缘设置的第二拉伸配合结构3中均设置有镂空结构32,两个边缘设置的第二拉伸配合结构3中的镂空结构32一一对应设置。For example, the second stretch fit structure 3 of the pattern portion 1 disposed at two edges in the second direction is provided with a hollow structure 32, and the hollow structure 32 of the second stretch fit structure 3 disposed at two edges is one by one. Corresponding settings.
例如,第二拉伸装置4的数量可以和镂空结构32的数量相同,镂空结构32的数量为多个。图2中以八个镂空结构32为例进行描述,则第二拉伸装
置4的数量为八个,图2中仅以两个第二拉伸装置4为例进行示意。设置多个镂空结构32可以使得图案部1在第二方向上具备多个施力点,从而能够更好的实现在第二方向上对图案部1进行拉伸。例如,第二拉伸装置4的数量也可以和镂空结构32的数量不同,例如,第二拉伸装置4的数量小于镂空结构32的数量,但第二方向上的两个边缘的镂空结构中对称设置第二拉伸装置4,以便对图案部1进行均匀对称的拉伸。For example, the number of second stretching devices 4 may be the same as the number of hollow structures 32, and the number of hollow structures 32 may be plural. In FIG. 2, eight hollow structures 32 are taken as an example for description, and the second stretching device is used.
The number of sets 4 is eight, and only two second stretching devices 4 are illustrated in FIG. 2 as an example. The provision of the plurality of hollow structures 32 allows the pattern portion 1 to have a plurality of force application points in the second direction, so that the pattern portion 1 can be better stretched in the second direction. For example, the number of second stretching devices 4 may also differ from the number of hollow structures 32, for example, the number of second stretching devices 4 is less than the number of hollow structures 32, but in the hollowed out structure of the two edges in the second direction The second stretching device 4 is symmetrically disposed to uniformly and symmetrically stretch the pattern portion 1.
镂空结构32的截面形状可包括三角形、矩形、圆形、椭圆形、锯齿形或者波浪形。本实施例中,镂空结构32的截面形状为矩形,但是,本公开的实施例并不限于此,例如,镂空结构32还可以采用如上所述的其它形状。镂空结构32之间的间距、镂空结构32的宽度、镂空结构32的设置位置以及镂空结构32的厚度均可以变化。相应地,例如,为配合示例的镂空结构32的矩形形状,第二拉伸装置4包括的固定部分41的形状为长方体,如图2和3B-3C所示。The cross-sectional shape of the hollow structure 32 may include a triangle, a rectangle, a circle, an ellipse, a zigzag, or a wave. In the present embodiment, the cross-sectional shape of the hollow structure 32 is a rectangle, but the embodiment of the present disclosure is not limited thereto, and for example, the hollow structure 32 may also adopt other shapes as described above. The spacing between the hollow structures 32, the width of the hollow structure 32, the location of the hollow structure 32, and the thickness of the hollow structure 32 may vary. Accordingly, for example, in order to match the rectangular shape of the exemplary hollow structure 32, the second stretching device 4 includes the fixing portion 41 in the shape of a rectangular parallelepiped as shown in FIGS. 2 and 3B-3C.
继续如图2和图3B-3C所示,第二拉伸装置4还可以包括拉伸部分42,固定部分41设置于镂空结构32中。拉伸部分42用于在第二方向上对图案部1施加拉力。固定部分41和拉伸部分42相交设置,例如,固定部分41和拉伸部分42之间垂直相交设置。Continuing with FIG. 2 and FIGS. 3B-3C, the second stretching device 4 can further include a stretched portion 42 that is disposed in the hollow structure 32. The stretched portion 42 is for applying a pulling force to the pattern portion 1 in the second direction. The fixed portion 41 and the stretched portion 42 are disposed to intersect, for example, the fixed portion 41 and the stretched portion 42 are vertically intersected.
固定部分41的外侧和/或内侧设置有凹槽43,凹槽43与镂空结构32的边缘卡合设置。当固定部分41设置于镂空结构32中时,固定部分41的外侧指的是背向图案部1的一侧46,也即远离图案部1(拉伸方向)一侧;固定部分41的内侧指的是朝向图案部1的一侧45,也即邻近图案部1的一侧。例如,如图3B所示,固定部分41的外侧设置凹槽43。凹槽43和镂空结构32对应的边缘的形状和尺寸均匹配,以使凹槽43能够和镂空结构32的边缘卡合,使得第二拉伸配合结构3能够卡在凹槽43内,从而有效避免了图案部1发生翘曲或者在第一方向上发生偏移。A groove 43 is provided on the outer side and/or the inner side of the fixed portion 41, and the groove 43 is engaged with the edge of the hollow structure 32. When the fixing portion 41 is disposed in the hollow structure 32, the outer side of the fixing portion 41 refers to the side 46 facing away from the pattern portion 1, that is, the side away from the pattern portion 1 (stretching direction); the inner finger of the fixing portion 41 It is toward the side 45 of the pattern portion 1, that is, the side adjacent to the pattern portion 1. For example, as shown in FIG. 3B, a groove 43 is provided on the outer side of the fixed portion 41. The shape and size of the corresponding edges of the groove 43 and the hollow structure 32 are matched so that the groove 43 can be engaged with the edge of the hollow structure 32, so that the second tensile fitting structure 3 can be caught in the groove 43, thereby being effective The warpage of the pattern portion 1 or the offset in the first direction is avoided.
例如,如图3C所示,固定部分41的内侧设置凹槽43。凹槽43和镂空结构32对应的边缘的形状和尺寸均匹配,以使凹槽43能够和镂空结构32的边缘卡合,使得第二拉伸配合结构3能够卡在凹槽43内,从而有效避免了图案部1发生翘曲或者在第一方向上发生偏移。For example, as shown in FIG. 3C, the inside of the fixed portion 41 is provided with a groove 43. The shape and size of the corresponding edges of the groove 43 and the hollow structure 32 are matched so that the groove 43 can be engaged with the edge of the hollow structure 32, so that the second tensile fitting structure 3 can be caught in the groove 43, thereby being effective The warpage of the pattern portion 1 or the offset in the first direction is avoided.
再参照图1和图2所示,例如,第一拉伸配合结构2和图案部1之间设置有第一分割线5,在完成对图案部1在第一方向和第二方向上的拉伸后(即:
张网),可沿第一分割线5将第一拉伸配合结构2从图案部1上去除。例如,可通过第一拉伸装置沿第一分割线5将第一拉伸配合结构2从图案部1上去除。或者,还可以通过激光切割的方式沿第一分割线5将第一拉伸配合结构2从图案部1上去除。张网结束后,将第一拉伸配合结构2从图案部1上去除,不会影响整张掩膜板的结构,也不会影响蒸镀过程中掩膜板和基板接触的均匀性。可选地,在张网结束后可以不将第一拉伸配合结构2从图案部1上去除,这样就无需在第一拉伸配合结构2和图案部1之间设置有第一分割线5。Referring again to FIGS. 1 and 2, for example, a first dividing line 5 is disposed between the first tensile mating structure 2 and the pattern portion 1, and the pulling of the pattern portion 1 in the first direction and the second direction is completed. After stretching (ie:
The web is removed from the pattern portion 1 along the first dividing line 5. For example, the first tensile mating structure 2 can be removed from the pattern portion 1 along the first dividing line 5 by the first stretching device. Alternatively, the first stretch-fit structure 2 may be removed from the pattern portion 1 along the first dividing line 5 by laser cutting. After the end of the net, the first stretch-fit structure 2 is removed from the pattern portion 1 without affecting the structure of the entire mask, nor affecting the uniformity of the contact between the mask and the substrate during the evaporation process. Alternatively, the first tensile mating structure 2 may not be removed from the pattern portion 1 after the end of the web, so that there is no need to provide the first dividing line 5 between the first stretching mating structure 2 and the pattern portion 1. .
如图1和图2所示,例如,第二拉伸配合结构3和图案部1之间设置有第二分割线6,在完成对图案部1在第一方向和第二的方向上的拉伸后(即:张网),可沿第二分割线6将第二拉伸配合结构3从图案部1上去除。例如,可通过第二拉伸装置4沿第二分割线6将第二拉伸配合结构3从图案部1上去除。或者,还可以通过激光切割的方式沿第二分割线6将第二拉伸配合结构3从图案部1上去除。张网结束后,将第二拉伸配合结构3从图案部1上去除,不会影响整张掩膜板的结构,也不会影响蒸镀过程中掩膜板和基板接触的均匀性。可选地,在张网结束后可以不将第二拉伸配合结构3从图案部1上去除,这样就无需在第二拉伸配合结构3和图案部1之间设置有第二分割线6。As shown in FIGS. 1 and 2, for example, a second dividing line 6 is disposed between the second tensile mating structure 3 and the pattern portion 1, and the pulling of the pattern portion 1 in the first direction and the second direction is completed. After stretching (ie, a web), the second tensile mating structure 3 can be removed from the pattern portion 1 along the second dividing line 6. For example, the second tensile mating structure 3 can be removed from the pattern portion 1 along the second dividing line 6 by the second stretching device 4. Alternatively, the second tensile mating structure 3 may be removed from the pattern portion 1 along the second dividing line 6 by laser cutting. After the end of the net, the second stretch-fit structure 3 is removed from the pattern portion 1 without affecting the structure of the entire mask, nor affecting the uniformity of the contact between the mask and the substrate during the evaporation process. Alternatively, the second tensile mating structure 3 may not be removed from the pattern portion 1 after the end of the web, so that there is no need to provide the second dividing line 6 between the second stretching mating structure 3 and the pattern portion 1. .
本实施例中,图案部1包括显示区(A-A区)11和位于显示区11周围的周边区12。第一拉伸配合结构2与周边区12的边缘连接,第二拉伸配合结构3与周边区12的边缘连接。In the present embodiment, the pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11. The first tensile mating structure 2 is joined to the edge of the peripheral zone 12 and the second tensile mating structure 3 is joined to the edge of the peripheral zone 12.
本实施例中,掩膜板为高精度金属掩膜板(FMM)。In this embodiment, the mask is a high precision metal mask (FMM).
图4为本公开实施例二提供的一种掩膜板的结构示意图,图5为图4中第二拉伸装置4的结构示意图,如图4和图5所示,本实施例和上述实施例一的区别在于,例如,本实施例中镂空结构32的截面形状为圆孔形。相应地,为配合镂空结构32的形状,固定部分41的形状为圆柱形。其余描述可参见上述实施例一,此处不再重复描述。4 is a schematic structural view of a mask plate according to Embodiment 2 of the present disclosure, and FIG. 5 is a schematic structural view of the second stretching device 4 of FIG. 4, as shown in FIG. 4 and FIG. 5, the embodiment and the above implementation. The difference of the first example is that, for example, the cross-sectional shape of the hollow structure 32 in the present embodiment is a circular hole shape. Accordingly, in order to match the shape of the hollow structure 32, the shape of the fixed portion 41 is cylindrical. For the rest of the description, refer to the first embodiment, and the description is not repeated here.
图6为本公开实施例三提供的一种掩膜板的结构示意图,如图6所示,本实施例和上述实施例一的区别在于,本实施例中第二拉伸配合结构为镂空结构32,镂空结构32的截面形状为椭圆形,形状与之配合的第二拉伸装置的固定部分41的形状为椭圆柱,其穿过对应的镂空结构32以在第二方向上
对图案部1施加拉力。第二拉伸装置在图6中未示出,描述可参见上述实施例一以及图2和图3B-3C中的描述。FIG. 6 is a schematic structural diagram of a mask according to Embodiment 3 of the present disclosure. As shown in FIG. 6 , the difference between the embodiment and the first embodiment is that the second tensile fit structure is a hollow structure in this embodiment. 32. The cross-sectional shape of the hollow structure 32 is elliptical, and the fixing portion 41 of the second stretching device with which the shape is matched is shaped as an elliptical cylinder passing through the corresponding hollow structure 32 in the second direction.
A pulling force is applied to the pattern portion 1. The second stretching device is not shown in Fig. 6, and the description can be referred to the description in the first embodiment and Fig. 2 and Figs. 3B-3C.
本实施例中,图案部1包括显示区(A-A区)11和位于显示区11周围的周边区12。镂空区域32位于周边区12中。In the present embodiment, the pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11. The hollowed out area 32 is located in the peripheral zone 12.
本实施例的其余描述可参见上述实施例一,此处不再重复描述。For the rest of the description of the embodiment, refer to the first embodiment, and the description is not repeated here.
本公开实施例提供的掩膜板的技术方案中,图案部在第一方向上的边缘设置有第一拉伸配合结构,图案部在第二方向上的边缘设置有第二拉伸配合结构,可通过第一拉伸配合结构利用第一拉伸装置在第一方向上对图案部施加拉力,可通过第二拉伸配合结构利用第二拉伸装置在第二方向上对图案部施加拉力,本公开实施例中在第一方向和第二方向两个方向上对图案部施加拉力,避免了掩膜板在不同方向上的形变不一致的问题,从而避免了掩膜板产生褶皱,进而提高了发光器件的生产良率。In the technical solution of the mask provided by the embodiment of the present disclosure, the edge of the pattern portion in the first direction is provided with a first stretch-fit structure, and the edge of the pattern portion is disposed with the second stretch-fit structure at the edge in the second direction. The first stretching device can be used to apply a pulling force to the pattern portion in the first direction by the first stretching fitting structure, and the second stretching device can be used to apply the pulling force to the pattern portion in the second direction by the second stretching fitting structure. In the embodiment of the present disclosure, the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the Production yield of light-emitting devices.
图7a为本公开实施例四提供的一种掩膜装置的结构示意图,如图7所示,该掩膜装置包括框架7和设置于框架7之上的掩膜板。掩膜板可采用上述实施例一提供的掩膜板,此处不再赘述。FIG. 7 is a schematic structural diagram of a mask device according to Embodiment 4 of the present disclosure. As shown in FIG. 7 , the mask device includes a frame 7 and a mask disposed on the frame 7 . The mask can be used as the mask provided in the first embodiment, and details are not described herein again.
本实施例中,框架7为环状结构。框架7的材料可以为金属。In this embodiment, the frame 7 is a ring structure. The material of the frame 7 can be metal.
本实施例中,框架7上的设置的掩膜板的数量可以为一个或者多个。In this embodiment, the number of masks disposed on the frame 7 may be one or more.
图7b为遮挡掩膜板(mask blocking plate)的示意图,如图7b所示,多个掩膜板并排设置于框架7上,且多个掩膜板间隔设置,即掩膜板之间具备一定的间隔。例如,图7b中设置三个掩膜板,三个掩膜板并排设置于框架7上,但是本公开的实施例并不限于此。进一步地,框架7上还设置有遮挡掩膜板10,遮挡掩膜板10设置于掩膜板之间且遮挡掩膜板10的边缘和掩膜板的边缘重叠设置,并且,遮挡掩膜板10的边缘和掩膜板的边缘固定连接。需要说明的是,遮挡掩膜板通常为条状,也可以作为支撑掩膜板边缘的作用,以及对掩模板间隔位置进行遮挡等作用。7b is a schematic view of a mask blocking plate. As shown in FIG. 7b, a plurality of masks are arranged side by side on the frame 7, and a plurality of masks are arranged at intervals, that is, a certain mask is provided between the masks. Interval. For example, three mask sheets are provided in FIG. 7b, and three mask sheets are disposed side by side on the frame 7, but the embodiment of the present disclosure is not limited thereto. Further, the frame 7 is further provided with a shielding mask 10, the shielding mask 10 is disposed between the masks, and the edges of the shielding mask 10 and the edges of the mask are overlapped, and the mask is blocked. The edge of 10 is fixedly attached to the edge of the mask. It should be noted that the shielding mask is usually strip-shaped, and can also serve as an edge for supporting the mask, and shielding the spacing of the mask.
例如,掩膜板的边缘为图案部1在第二方向上的边缘。图案部1包括显示区(A-A区)11和位于显示区11周围的周边区12,因此图案部1在第二方向上的边缘为图案部1在第二方向上的周边区12。遮挡掩膜板10的边缘和图案部1在第二方向上的周边区12固定连接。For example, the edge of the mask is the edge of the pattern portion 1 in the second direction. The pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11, and thus the edge of the pattern portion 1 in the second direction is the peripheral area 12 of the pattern portion 1 in the second direction. The edge of the occlusion mask 10 is fixedly connected to the peripheral portion 12 of the pattern portion 1 in the second direction.
本实施例中,可通过激光将遮挡掩膜板的边缘和掩膜板的边缘固定连接。例如,图案部1在第二方向上的边缘设置有焊点8,通过焊点8将遮挡掩膜
板10的边缘和掩膜板的边缘焊接在一起。In this embodiment, the edge of the shielding mask and the edge of the mask can be fixedly connected by a laser. For example, the edge of the pattern portion 1 in the second direction is provided with a solder joint 8 through which the mask mask is shielded
The edge of the panel 10 is welded to the edge of the mask.
本实施例中将遮挡掩膜板的边缘和掩膜板的边缘固定连接,通过强度较高的遮挡掩膜板可以对掩膜板在第二方向上提供持续的拉力,从而进一步提高了掩膜板的张网强度,减少褶皱,提高了掩膜板的平坦度。In this embodiment, the edge of the shielding mask and the edge of the mask are fixedly connected, and the shielding mask can provide a continuous pulling force in the second direction by the shielding mask with higher strength, thereby further improving the mask. The strength of the sheet is reduced, the wrinkles are reduced, and the flatness of the mask is improved.
图8为本公开实施例五提供的一种掩膜装置的结构示意图,如图8所示,该掩膜装置包括框架7和设置于框架7之上的掩膜板。掩膜板可采用上述实施例二提供的掩膜板,此处不再赘述。FIG. 8 is a schematic structural diagram of a mask device according to Embodiment 5 of the present disclosure. As shown in FIG. 8 , the mask device includes a frame 7 and a mask plate disposed on the frame 7 . The mask plate provided in the above embodiment 2 can be used as the mask, and details are not described herein again.
本实施例中,框架7为环状结构。框架7的材料可以为金属。In this embodiment, the frame 7 is a ring structure. The material of the frame 7 can be metal.
本实施例中,框架7上的设置的掩膜板的数量可以为一个或者多个。In this embodiment, the number of masks disposed on the frame 7 may be one or more.
图9为本公开实施例六提供的一种掩膜装置的结构示意图,如图9所示,该掩膜装置包括框架7和设置于框架7之上的掩膜板。掩膜板可采用上述实施例三提供的掩膜板,此处不再赘述。FIG. 9 is a schematic structural diagram of a mask device according to Embodiment 6 of the present disclosure. As shown in FIG. 9, the mask device includes a frame 7 and a mask plate disposed on the frame 7. The mask plate provided in the above embodiment 3 can be used as the mask, and details are not described herein again.
本实施例中,框架7为环状结构。框架7的材料可以为金属。In this embodiment, the frame 7 is a ring structure. The material of the frame 7 can be metal.
本实施例中,框架7上的设置的掩膜板的数量可以为一个或者多个。In this embodiment, the number of masks disposed on the frame 7 may be one or more.
本公开实施例提供的掩膜装置的技术方案中,图案部在第一方向上的边缘设置有第一拉伸配合结构,图案部在第二方向上的边缘设置有第二拉伸配合结构,可通过第一拉伸配合结构在第一方向上对图案部施加拉力,可通过第二拉伸配合结构在第二方向上对图案部施加拉力,本公开实施例中在第一方向和第二方向两个方向上对图案部施加拉力,避免了掩膜板在不同方向上的形变不一致的问题,从而避免了掩膜板产生褶皱,进而提高了发光器件的生产良率。In the technical solution of the mask device provided by the embodiment of the present disclosure, the edge of the pattern portion in the first direction is provided with a first stretch-fit structure, and the edge of the pattern portion is disposed with the second stretch-fit structure at the edge in the second direction. A pulling force may be applied to the pattern portion in the first direction by the first stretching mating structure, and a pulling force may be applied to the pattern portion in the second direction by the second stretching mating structure, in the first direction and the second in the embodiment of the present disclosure The pulling force is applied to the pattern portion in two directions, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the production yield of the light emitting device.
本公开实施例七提供了一种掩膜制造设备,该掩膜制造设备包括第一拉伸装置、第二拉伸装置和掩膜装置。 Embodiment 7 of the present disclosure provides a mask manufacturing apparatus including a first stretching device, a second stretching device, and a mask device.
本实施例中,掩膜装置可采用上述实施例四、实施例五或者实施例六提供的掩膜装置。In this embodiment, the mask device may be the mask device provided in the fourth embodiment, the fifth embodiment or the sixth embodiment.
每个所述第一拉伸装置通过对应的所述第一拉伸配合结构在所述第一方向上对所述图案部施加拉力,以实现在第一方向上对图案部沿相反方向施加拉力;每个所述第二拉伸装置通过对应的所述第二拉伸配合结构在所述第二方向上对所述图案部施加拉力,以实现在第二方向上对图案部上沿相反方向施加拉力。本实施例中,第一拉伸装置和第二拉伸装置的描述可参见上述实施例一或者实施例二中的描述。
Each of the first stretching devices applies a pulling force to the pattern portion in the first direction by the corresponding first stretching mating structure to achieve a pulling force in a direction opposite to the pattern portion in the first direction Each of the second stretching devices applies a pulling force to the pattern portion in the second direction through the corresponding second stretching mating structure to achieve opposite directions on the pattern portion in the second direction Apply tension. In the present embodiment, the descriptions of the first stretching device and the second stretching device can be referred to the description in the first embodiment or the second embodiment.
本公开实施例提供的掩膜制造设备的技术方案中,图案部在第一方向上的边缘设置有第一拉伸配合结构,图案部在第二方向上的边缘设置有第二拉伸配合结构,可通过第一拉伸配合结构在第一方向上对图案部施加拉力,可通过第二拉伸配合结构在第二方向上对图案部施加拉力。本公开实施例中在第一方向和第二方向两个方向上对图案部施加拉力,避免了掩膜板在不同方向上的形变不一致的问题,从而避免了掩膜板产生褶皱,进而提高了发光器件的生产良率。In the technical solution of the mask manufacturing apparatus provided by the embodiment of the present disclosure, the edge of the pattern portion in the first direction is provided with a first tensile matching structure, and the edge of the pattern portion is disposed with the second tensile matching structure at the edge in the second direction. A pulling force may be applied to the pattern portion in the first direction by the first tensile mating structure, and a pulling force may be applied to the pattern portion in the second direction by the second stretching mating structure. In the embodiment of the present disclosure, the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the Production yield of light-emitting devices.
图10为本公开实施例八提供的一种掩膜装置的制造方法的流程图,如图10所示,掩膜装置包括框架和掩膜板,掩膜板包括图案部,图案部在第一方向上的边缘设置有第一拉伸配合结构,图案部在第二方向上的边缘设置有第二拉伸配合结构,第一方向和第二方向交叉设置。10 is a flowchart of a method for fabricating a mask device according to Embodiment 8 of the present disclosure. As shown in FIG. 10, the mask device includes a frame and a mask. The mask includes a pattern portion, and the pattern portion is first. The edge in the direction is provided with a first stretch-fit structure, and the edge of the pattern portion in the second direction is provided with a second stretch-fit structure, and the first direction and the second direction are disposed to intersect.
所述方法包括:The method includes:
步骤101、每个第一拉伸装置通过对应的第一拉伸配合结构在第一方向上对图案部施加拉力以实现在第一方向上对图案部沿相反方向施加拉力,以及每个第二拉伸装置通过对应的第二拉伸配合结构在第二方向上对图案部施加拉力以实现在第二方向上对图案部上沿相反方向施加拉力。Step 101: each first stretching device applies a pulling force to the pattern portion in a first direction by a corresponding first tensile matching structure to achieve a pulling force in a direction opposite to the pattern portion in the first direction, and each second The stretching device applies a pulling force to the pattern portion in the second direction by the corresponding second tensile fitting structure to effect application of a pulling force in the opposite direction on the pattern portion in the second direction.
例如,本实施例中,需要在第一方向上和第二方向上同时对图案部施加拉力。For example, in the present embodiment, it is necessary to simultaneously apply a pulling force to the pattern portion in the first direction and the second direction.
步骤102、将掩膜板固定于框架上。Step 102: Fix the mask to the frame.
本步骤中,可通过激光将掩膜板焊接于框架上。In this step, the mask can be welded to the frame by laser.
例如,第一拉伸配合结构、第二拉伸配合结构和图案部一体成型,第一拉伸配合结构和图案部之间设置有第一分割线,第二拉伸配合结构和图案部之间设置有第二分割线。则步骤102之前还包括:沿所述第一分割线将所述第一拉伸配合结构从所述图案部上去除以及沿所述第二分割线将所述第二拉伸配合结构从所述图案部上去除。For example, the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are integrally formed, and a first dividing line is disposed between the first stretch-fit structure and the pattern portion, and between the second stretch-fit structure and the pattern portion A second dividing line is set. The step 102 further includes: removing the first tensile mating structure from the pattern portion along the first dividing line and the second stretching mating structure from the second dividing line from the Removed from the pattern.
例如,第二拉伸配合结构包括侧边结构和设置于侧边结构上的镂空结构,或者第二拉伸配合结构为镂空结构。第二拉伸装置包括固定部分和拉伸部分,固定部分设置于镂空结构中。例如,每个第二拉伸装置通过对应的所述第二拉伸配合结构在所述第二方向上对所述图案部施加拉力包括:每个所述第二拉伸装置穿过对应的镂空结构以在第二方向上对所述图案部施加拉力。For example, the second tensile mating structure includes a side structure and a hollow structure disposed on the side structure, or the second tensile mating structure is a hollow structure. The second stretching device includes a fixed portion and a stretched portion, and the fixed portion is disposed in the hollow structure. For example, each of the second stretching devices applying a pulling force to the pattern portion in the second direction by the corresponding second tensile mating structure includes: each of the second stretching devices passes through a corresponding hollow The structure applies a pulling force to the pattern portion in the second direction.
本实施例提供的掩膜装置的制造方法可用于制造上述实施例四、实施例
五或者实施例六提供的掩膜装置,具体描述可参见上述实施例四、实施例五或者实施例六。The manufacturing method of the mask device provided in this embodiment can be used to manufacture the above-mentioned embodiment 4 and the embodiment.
5 or the mask device provided in the sixth embodiment. For details, refer to the fourth embodiment, the fifth embodiment or the sixth embodiment.
本公开实施例提供的掩膜装置的制造方法的技术方案中,图案部在第一方向上的边缘设置有第一拉伸配合结构,图案部在第二方向上的边缘设置有第二拉伸配合结构,第一拉伸装置通过第一拉伸配合结构在第一方向上对图案部施加拉力,第二拉伸装置通过第二拉伸配合结构在第二方向上对图案部施加拉力,本公开实施例中在第一方向和第二方向两个方向上对图案部施加拉力,避免了掩膜板在不同方向上的形变不一致的问题,从而避免了掩膜板产生褶皱,进而提高了发光器件的生产良率。In the technical solution of the manufacturing method of the mask device provided by the embodiment of the present disclosure, the edge of the pattern portion in the first direction is provided with a first tensile matching structure, and the edge of the pattern portion is disposed with the second stretching at the edge in the second direction. a mating structure, the first stretching device applies a pulling force to the pattern portion in the first direction by the first stretching fit structure, and the second stretching device applies a pulling force to the pattern portion in the second direction by the second stretching mating structure, In the disclosed embodiment, the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the illumination. The production yield of the device.
本公开的实施例中,可通过ANSYS有限元仿真软件对掩膜板张网时受力的形变进行模拟。图11为现有技术和本公开实施例中的掩膜板的受力形变对比示意图,如图11所示,现有技术中掩膜板的显示区受力不均,从而产生了褶皱;而本公开实施例中的掩膜板的显示区受力均匀,显示区的弹性形变更加均匀,未产生褶皱,从而提高了掩膜板的平坦度。In the embodiment of the present disclosure, the deformation of the force applied to the mask plate can be simulated by the ANSYS finite element simulation software. 11 is a schematic view showing the force deformation of the mask in the prior art and the embodiment of the present disclosure. As shown in FIG. 11, the display area of the mask in the prior art is unevenly applied, thereby generating wrinkles; The display area of the mask in the embodiment of the present disclosure is uniformly applied, and the elastic deformation of the display area is more uniform, and wrinkles are not generated, thereby improving the flatness of the mask.
可以理解的是,以上实施方式仅仅是为了说明本公开实施例的原理而采用的示例性实施方式,然而本公开的实施例并不局限于此。对于本领域内的普通技术人员而言,在不脱离本公开的精神的情况下,可以做出各种变型和改进,这些变型和改进也视为本公开的保护范围。
It is to be understood that the above embodiments are merely exemplary embodiments employed to explain the principles of the embodiments of the present disclosure, but the embodiments of the present disclosure are not limited thereto. Various modifications and improvements can be made by those skilled in the art without departing from the spirit of the disclosure, and such modifications and improvements are also considered to be within the scope of the disclosure.
Claims (18)
- 一种掩膜板,包括:A mask comprising:图案部,包括第一边缘和第二边缘;用于将所述图案部沿第一方向相对拉伸的第一拉伸配合结构,所述第一拉伸配合结构位于所述第一边缘上;以及a pattern portion comprising a first edge and a second edge; a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge; as well as用于将所述图案部沿第二方向相对拉伸的第二拉伸配合结构,所述第二拉伸配合结构位于所述第二边缘上;a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;其中,所述第一边缘位于所述图案部在所述第一方向的两端以及所述第二边缘位于所述图案部在所述第二方向的两端,并且所述第一方向和所述第二方向相交。Wherein the first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects.
- 根据权利要求1所述的掩膜板,其中,所述第二拉伸配合结构包括从所述图案部沿第二方向分别向相对的外侧突出的侧边结构和设置于所述侧边结构上的至少一个镂空结构。The mask according to claim 1, wherein the second stretch fitting structure includes a side structure protruding from the pattern portion toward the opposite outer side in the second direction, and is disposed on the side structure At least one hollow structure.
- 根据权利要求1所述的掩膜板,其中,所述第二拉伸配合结构为镂空结构。The mask of claim 1 wherein the second tensile fit structure is a hollow structure.
- 根据权利要求1-3任一项所述的掩膜板,其中,所述第一拉伸配合结构、所述第二拉伸配合结构与所述图案部为一体结构。The mask according to any one of claims 1 to 3, wherein the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are a unitary structure.
- 根据权利要求1-4任一项所述的掩膜板,其中,所述第一拉伸配合结构和所述图案部之间设置有第一分割线,以及所述第二拉伸配合结构和所述图案部之间设置有第二分割线。The mask according to any one of claims 1 to 4, wherein a first dividing line is disposed between the first tensile fitting structure and the pattern portion, and the second stretching fit structure and A second dividing line is disposed between the pattern portions.
- 根据权利要求1-5任一项所述的掩膜板,还包括:在所述第一方向上相对设置的两个所述第一边缘,以及在所述第二方向上相对设置的两个所述第二边缘。The mask according to any one of claims 1 to 5, further comprising: two of the first edges disposed opposite each other in the first direction, and two oppositely disposed in the second direction The second edge.
- 一种掩膜装置,包括框架和设置于所述框架之上的多个权利要求1至6任一所述的掩膜板。A masking device comprising a frame and a plurality of masks according to any one of claims 1 to 6 disposed on the frame.
- 根据权利要求7所述的掩膜装置,其中,所述掩膜装置还包括遮挡掩膜板,所述遮挡掩模板位于所述框架上,所述遮挡掩膜板与所述掩膜板间隔设置,且所述遮挡掩膜板的每个边缘和所述掩膜板的相应边缘重叠设置,以及所述遮挡掩膜板的每个边缘和所述掩膜板的相应边缘固定连接。The mask device of claim 7, wherein the masking device further comprises a masking mask, the masking mask is located on the frame, and the masking mask is spaced from the masking panel And each edge of the occlusion mask and the corresponding edge of the reticle are overlapped, and each edge of the occlusion mask is fixedly connected to a corresponding edge of the reticle.
- 一种掩膜制造设备,包括第一拉伸装置、第二拉伸装置和权利要求6 至8任一所述的掩膜装置;其中,A mask manufacturing apparatus comprising a first stretching device, a second stretching device, and claim 6 a mask device according to any one of 8; wherein每个所述第一拉伸装置被配置为通过所述第一拉伸配合结构在所述第一方向上对所述图案部施加拉力,以实现在所述第一方向上对图案部沿相反方向施加拉力;以及Each of the first stretching devices is configured to apply a pulling force to the pattern portion in the first direction by the first tensile mating structure to achieve opposite to the pattern portion in the first direction Apply tension to the direction;每个所述第二拉伸装置被配置为通过所述第二拉伸配合结构在所述第二方向上对所述图案部施加拉力,以实现在所述第二方向上对图案部上沿相反方向施加拉力。Each of the second stretching devices is configured to apply a pulling force to the pattern portion in the second direction by the second tensile mating structure to achieve an upper edge of the pattern portion in the second direction Apply tension in the opposite direction.
- 根据权利要求9所述的掩膜制造设备,其中,所述第二拉伸装置包括固定部分和拉伸部分,所述固定部分被配置为设置于所述镂空结构中。The mask manufacturing apparatus according to claim 9, wherein the second stretching device includes a fixing portion and a stretching portion, the fixing portion being configured to be disposed in the hollow structure.
- 根据权利要求10所述的掩膜制造设备,其中,所述固定部分包括凹槽,所述凹槽被配置为卡合所述镂空结构的边缘。The mask manufacturing apparatus according to claim 10, wherein the fixing portion includes a groove configured to engage an edge of the hollow structure.
- 一种掩膜装置的制造方法,其中,所述掩膜装置包括框架和掩膜板,所述掩膜板包括:A method of manufacturing a mask device, wherein the mask device comprises a frame and a mask, the mask comprising:图案部,所述图案部包括第一边缘和第二边缘;a pattern portion, the pattern portion including a first edge and a second edge;用于将所述图案部沿第一方向相对拉伸的第一拉伸配合结构,所述第一拉伸配合结构位于所述第一边缘上;以及a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge;用于将所述图案部沿第二方向相对拉伸的第二拉伸配合结构,所述第二拉伸配合结构位于所述第二边缘上;a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;其中,所述第一边缘位于所述图案部在所述第一方向的两端以及所述第二边缘位于所述图案部在所述第二方向的两端,并且所述第一方向和所述第二方向相交;Wherein the first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects;所述方法包括:The method includes:通过第一拉伸装置向所述第一拉伸配合结构在所述第一方向上施加拉力,以使所述图案部在所述第一方向上受到大小相同方向相反的力,以及通过第二拉伸装置向所述第二拉伸配合结构在所述第二方向上施加拉力以使所述图案部在第二方向上受到大小相同方向相反的力;以及Applying a pulling force to the first tensile mating structure in the first direction by the first stretching device such that the pattern portion receives forces of opposite magnitudes in the first direction, and passes through the second Stretching means applies a pulling force to the second tensile mating structure in the second direction such that the pattern portions are subjected to forces of opposite magnitudes in the second direction;将所述掩膜板固定于所述框架上。The mask is affixed to the frame.
- 根据权利要求12所述的掩膜装置的制造方法,其中,所述第一拉伸配合结构、所述第二拉伸配合结构和所述图案部一体成型。The method of manufacturing a mask device according to claim 12, wherein the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are integrally formed.
- 根据权利要求13所述的掩膜装置的制造方法,其中,所述第一拉伸配合结构和所述图案部之间设置有第一分割线,以及所述第二拉伸配合结构 和所述图案部之间设置有第二分割线。The method of manufacturing a mask device according to claim 13, wherein a first dividing line is disposed between the first tensile fitting structure and the pattern portion, and the second stretching fit structure A second dividing line is disposed between the pattern portion.
- 根据权利要求14所述的掩膜装置的制造方法,还包括:在将所述掩膜板固定于所述框架上之前,The method of manufacturing a mask device according to claim 14, further comprising: before fixing the mask to the frame,沿所述第一分割线将所述第一拉伸配合结构从所述图案部上去除,以及沿所述第二分割线将所述第二拉伸配合结构从所述图案部上去除。The first tensile mating structure is removed from the pattern portion along the first dividing line, and the second tensile mating structure is removed from the pattern portion along the second dividing line.
- 根据权利要求12所述的掩膜装置的制造方法,其中,所述第二拉伸配合结构包括从所述图案部沿第二方向分别向相对的外侧突出的侧边结构和设置于所述侧边结构上的镂空结构,或者所述第二拉伸配合结构为镂空结构;所述第二拉伸装置包括固定部分和拉伸部分,所述固定部分设置于所述镂空结构中;The method of manufacturing a mask device according to claim 12, wherein the second stretch-fit structure includes a side structure protruding from the pattern portion toward the opposite outer side in the second direction, and is disposed on the side a hollow structure on the edge structure, or the second tensile fit structure is a hollow structure; the second stretching device comprises a fixed portion and a stretched portion, the fixed portion is disposed in the hollow structure;所述方法还包括:The method further includes:每个所述第二拉伸装置穿过对应的镂空结构以在所述第二方向上对所述图案部相对施加拉力。Each of the second stretching devices passes through a corresponding hollow structure to apply a pulling force to the pattern portion in the second direction.
- 根据权利要求16所述的掩膜装置的制造方法,其中,所述镂空结构的截面形状为矩形,圆孔形,或椭圆孔形,所述第二拉伸装置的所述固定部分为与之配合的长方体形,圆柱形,或椭圆柱形。The method of manufacturing a mask device according to claim 16, wherein the cross-sectional shape of the hollow structure is a rectangle, a circular hole shape, or an elliptical hole shape, and the fixed portion of the second stretching device is Fitted rectangular, cylindrical, or elliptical cylindrical.
- 根据权利要求16所述的掩膜装置的制造方法,其中,所述第二拉伸装置的所述固定部分上设置有与所述镂空结构配合的凹槽。 The method of manufacturing a mask device according to claim 16, wherein the fixing portion of the second stretching device is provided with a groove that engages with the hollow structure.
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CN201710408986.XA CN108977761B (en) | 2017-06-02 | 2017-06-02 | Mask plate, mask device, manufacturing method of mask device and mask manufacturing equipment |
CN201710408986.X | 2017-06-02 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115466925A (en) * | 2022-10-14 | 2022-12-13 | 昆山国显光电有限公司 | Mask plate and preparation method thereof |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110117768B (en) * | 2019-05-17 | 2021-02-26 | 京东方科技集团股份有限公司 | Mask device |
CN110373630B (en) * | 2019-08-19 | 2022-01-25 | 京东方科技集团股份有限公司 | Mask assembly, and manufacturing device and manufacturing method thereof |
CN111158211B (en) * | 2020-01-02 | 2023-10-27 | 京东方科技集团股份有限公司 | Preparation method of mask plate and preparation method of display substrate |
CN111952485B (en) * | 2020-08-20 | 2023-12-19 | 京东方科技集团股份有限公司 | Mask plate net tensioning assembly, net tensioning device and net tensioning method |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1510971A (en) * | 2002-11-29 | 2004-07-07 | �����ձ������ƶ���ʾ��ʽ���� | Evaporation mask and method for manufacturing organic electroluminescent device thereby |
JP2005005071A (en) * | 2003-06-11 | 2005-01-06 | Dainippon Printing Co Ltd | Metal mask and method for mounting same |
JP2009041061A (en) * | 2007-08-08 | 2009-02-26 | Sony Corp | Method for manufacturing mask for vapor deposition |
CN102766842A (en) * | 2011-05-06 | 2012-11-07 | 三星移动显示器株式会社 | Split mask and assembling apparatus for assembling a mask frame assembly including the split mask |
CN203021638U (en) * | 2012-12-25 | 2013-06-26 | 唐军 | Mask plate for evaporation |
CN205556762U (en) * | 2016-05-05 | 2016-09-07 | 鄂尔多斯市源盛光电有限责任公司 | Mask plate, mother board, mask plate manufacture equipment and display substrates coating by vaporization system |
CN106086785A (en) * | 2016-07-29 | 2016-11-09 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof, mask assembly |
CN106158697A (en) * | 2014-12-19 | 2016-11-23 | 三星显示有限公司 | The manufacture method of mask frame, precipitation equipment and organic light-emitting display device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN204803391U (en) * | 2014-12-30 | 2015-11-25 | 合肥鑫晟光电科技有限公司 | Mask plate |
-
2017
- 2017-06-02 CN CN201710408986.XA patent/CN108977761B/en active Active
- 2017-12-15 WO PCT/CN2017/116610 patent/WO2018218932A1/en active Application Filing
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1510971A (en) * | 2002-11-29 | 2004-07-07 | �����ձ������ƶ���ʾ��ʽ���� | Evaporation mask and method for manufacturing organic electroluminescent device thereby |
JP2005005071A (en) * | 2003-06-11 | 2005-01-06 | Dainippon Printing Co Ltd | Metal mask and method for mounting same |
JP2009041061A (en) * | 2007-08-08 | 2009-02-26 | Sony Corp | Method for manufacturing mask for vapor deposition |
CN102766842A (en) * | 2011-05-06 | 2012-11-07 | 三星移动显示器株式会社 | Split mask and assembling apparatus for assembling a mask frame assembly including the split mask |
CN203021638U (en) * | 2012-12-25 | 2013-06-26 | 唐军 | Mask plate for evaporation |
CN106158697A (en) * | 2014-12-19 | 2016-11-23 | 三星显示有限公司 | The manufacture method of mask frame, precipitation equipment and organic light-emitting display device |
CN205556762U (en) * | 2016-05-05 | 2016-09-07 | 鄂尔多斯市源盛光电有限责任公司 | Mask plate, mother board, mask plate manufacture equipment and display substrates coating by vaporization system |
CN106086785A (en) * | 2016-07-29 | 2016-11-09 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof, mask assembly |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115466925A (en) * | 2022-10-14 | 2022-12-13 | 昆山国显光电有限公司 | Mask plate and preparation method thereof |
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