WO2018218932A1

WO2018218932A1 - Mask, mask apparatus and manufacturing method therefor, and mask manufacturing equipment

Info

Publication number: WO2018218932A1
Application number: PCT/CN2017/116610
Authority: WO
Inventors: 罗昶; 梁逸南; 吴海东; 吴建鹏
Original assignee: 京东方科技集团股份有限公司; 成都京东方光电科技有限公司
Priority date: 2017-06-02
Filing date: 2017-12-15
Publication date: 2018-12-06
Also published as: CN108977761B; CN108977761A

Abstract

A mask, a mask apparatus and manufacturing method therefor, and mask manufacturing equipment. The mask comprises: a pattern part (1), comprising first edges (15) and second edges (16); first stretching fitting structures (2) used to relatively stretch the pattern part (1) along a first direction, the first stretching fitting structures (2) being located on the first edges (15); and second stretching fitting structures (3) used to relatively stretch the pattern part along a second direction, the second stretching fitting structures (3) being located on the second edges (16). The first edges (15) are located at two ends of the pattern part (1) in the first direction, the second edges (16) are located at two ends of the pattern part (1) in the second direction, and the first direction and the second direction intersect.

Description

Mask plate, mask device, manufacturing method thereof and mask manufacturing device

Cross-reference to related applications

The present application claims priority to Chinese Patent Application No. 201710408986.X, which is assigned to the PCT filed on Jun. 2,,,,,,,,,,,,,,,,, Incorporated in this article.

Technical field

Embodiments of the present disclosure relate to a mask, a mask device, a method of fabricating the same, and a mask manufacturing apparatus.

Background technique

The production of Organic Light-Emitting Diode (OLED) panels is mainly by evaporation coating. In the evaporation process, a high-precision metal mask (Fine Metal Mask, FMM for short) is usually used to deposit the RGB film layer. The flatness of the FMM has a direct impact on the uniformity and positional accuracy of the film deposition.

Summary of the invention

Embodiments of the present disclosure provide a mask, a mask device, a method of fabricating the same, and a mask manufacturing apparatus.

According to at least one embodiment of the present disclosure, a mask is provided, comprising:

a pattern portion comprising a first edge and a second edge; a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge; as well as

a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;

Wherein the first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects.

For example, the second tensile mating structure includes a relative orientation from the pattern portion in the second direction An outer protruding side structure and at least one hollow structure disposed on the side structure.

For example, the second tensile fit structure is a hollow structure.

For example, the first tensile mating structure, the second tensile mating structure, and the pattern portion are a unitary structure.

For example, a first dividing line is disposed between the first stretch fitting structure and the pattern portion, and a second dividing line is disposed between the second stretching mating structure and the pattern portion.

For example, the mask further includes two first edges that are oppositely disposed in the first direction, and two second edges that are oppositely disposed in the second direction.

According to at least one embodiment of the present disclosure, there is also provided a masking apparatus comprising a frame and a plurality of the mask sheets disposed on the frame.

For example, the mask device further includes an occlusion mask, the occlusion mask is located on the frame, the occlusion mask is spaced apart from the mask, and each of the occlusion masks An edge and a corresponding edge of the mask are overlapped, and each edge of the occlusion mask is fixedly coupled to a corresponding edge of the mask.

According to at least one embodiment of the present disclosure, there is also provided a mask manufacturing apparatus comprising: a first stretching device, a second stretching device, and the mask device;

Wherein each of the first stretching devices is configured to apply a pulling force to the pattern portion in the first direction by the first tensile matching structure to achieve a pair of pattern portions in the first direction Apply tension in the opposite direction;

Each of the second stretching devices is configured to apply a pulling force to the pattern portion in the second direction by the second tensile mating structure to achieve an upper edge of the pattern portion in the second direction Apply tension in the opposite direction.

For example, the second stretching device includes a fixed portion and a stretched portion, the fixed portion being configured to be disposed in the hollow structure.

For example, the fixed portion includes a groove configured to engage an edge of the hollow structure.

According to at least one embodiment of the present disclosure, there is also provided a method of fabricating a mask device, wherein the mask device comprises a frame and a mask, the mask comprising:

a pattern portion, the pattern portion including a first edge and a second edge;

a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge;

Wherein the first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects;

The method includes:

Applying a pulling force to the first tensile mating structure in the first direction by the first stretching device such that the pattern portion receives forces of opposite magnitudes in the first direction, and passes through the second Stretching means applies a pulling force to the second tensile mating structure in the second direction such that the pattern portions are subjected to forces of opposite magnitudes in the second direction;

The mask is affixed to the frame.

For example, the first tensile mating structure, the second tensile mating structure, and the pattern portion are integrally formed.

For example, the manufacturing method further includes removing the first tensile mating structure from the pattern portion along the first dividing line and fixing along the first dividing line before fixing the mask sheet to the frame The second dividing line removes the second tensile mating structure from the pattern portion.

For example, the second stretch-fit structure includes a side structure protruding from the pattern portion to the opposite outer side in the second direction, and a hollow structure disposed on the side structure, or the second stretch The mating structure is a hollow structure; the second stretching device includes a fixing portion and a stretching portion, and the fixing portion is disposed in the hollow structure;

The method further includes:

Each of the second stretching devices passes through a corresponding hollow structure to apply a pulling force to the pattern portion in the second direction.

For example, the hollow structure has a rectangular shape, a circular hole shape, or an elliptical hole shape, and the fixed portion of the second stretching device is a rectangular parallelepiped shape, a cylindrical shape, or an elliptical cylindrical shape.

For example, the fixing portion of the second stretching device is provided with a groove that cooperates with the hollow structure.

DRAWINGS

The embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings, in which

1 is a schematic structural view of a mask according to Embodiment 1 of the present disclosure;

2 is a schematic view showing the application of the mask in FIG. 1;

3A-C are schematic structural views of the first and second stretching devices of Fig. 2;

4 is a schematic structural view of a mask according to Embodiment 2 of the present disclosure;

Figure 5 is a schematic structural view of the second stretching device of Figure 4;

FIG. 6 is a schematic structural diagram of a mask provided according to Embodiment 3 of the present disclosure;

FIG. 7 is a schematic structural diagram of a mask device according to Embodiment 4 of the present disclosure; FIG.

7b is a schematic view of a masking mask according to an embodiment of the present disclosure;

8 is a schematic structural diagram of a mask device according to Embodiment 5 of the present disclosure;

FIG. 9 is a schematic structural diagram of a mask device according to Embodiment 6 of the present disclosure;

10 is a flowchart of a method of fabricating a mask device according to Embodiment 8 of the present disclosure;

FIG. 11 is a schematic view showing the force deformation of the mask in the prior art and the embodiment of the present disclosure.

detailed description

The technical solutions in the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings in the embodiments of the present disclosure. It is apparent that the described embodiments are only a part of the embodiments of the present disclosure, and not all of them. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present disclosure without departing from the inventive scope are intended to be within the scope of the disclosure.

Unless otherwise defined, technical terms or scientific terms used herein shall be understood in the ordinary meaning as understood by those of ordinary skill in the art. The words "first," "second," and similar terms used in the present disclosure do not denote any order, quantity, or importance, but are used to distinguish different components. The word "comprising" or "comprises" or the like means that the element or item preceding the word is intended to be in the "Upper", "lower", "left", "right", etc. are only used to indicate the relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may also change accordingly.

In the RGB film layer deposited by using a high-precision metal mask (Fine Metal Mask, FMM for short), the FMM is first laid before use and the FMM is soldered to the metal frame. Usually the shape of the FMM is strip, and the FMM has four sides, of which the relative setting The two sides are in one direction, and the opposite two sides are in the other direction. During the web process, the ends of the FMM are applied in opposite directions in a direction to pull the FMM in this direction and then weld.

The inventors have found that since the pulling force is applied in the opposite direction only on both ends of one direction of the strip-shaped FMM, and no tension is applied to the both ends of the strip-shaped FMM in the other direction, the force on the FMM is uneven. The deformation of the FMM in different directions is inconsistent, and it is easy to produce wrinkles in the other direction. These wrinkles will result in poor evaporation, shadowing or color mixing, resulting in low production yield of the OLED device.

The mask, the mask device, the manufacturing method thereof and the mask manufacturing device provided by the embodiments of the present disclosure are described in detail below with reference to the accompanying drawings.

1 is a schematic structural view of a mask plate according to Embodiment 1 of the present disclosure, FIG. 2 is a schematic view of the application of the mask plate of FIG. 1, and FIG. 3A is a schematic structural view of the first stretching device, and the first stretching device is A stretching device cooperates with the first tensile fit structure. 3B-3C are schematic structural views of the second stretching device of Fig. 2, the second stretching device being engaged with the second tensile fitting structure.

As shown in FIGS. 1 to 3A-3C, the mask comprises a pattern portion 1, and the edge 15 (first edge) of the pattern portion 1 is provided with a first tensile fit structure 2, a first stretch fit structure 2 and a A tensile structure 14 fits. The edge 16 (second edge) of the pattern portion 1 is provided with a second stretch-fit structure 3, and the second stretch-fit structure 3 is mated with the second stretch structure 4. a first direction and a second direction are disposed, the first edge 15 is located at two ends of the pattern portion in the first direction and the second edge 16 is located at two sides of the pattern portion in the second direction end.

For example, the number of the first stretching devices may be plural, and the number of the second stretching devices 4 may be plural. The masking plate can be stretched by applying a pulling force to the pattern portion 1 by the first stretching device and the second stretching device. For example, each of the first stretching devices applies a pulling force to the pattern portion 1 in the first direction by the corresponding first stretching mating structure 2 to effect application of a pulling force to the pattern portion 1 in the opposite direction in the first direction; The second stretching device 4 applies a pulling force to the pattern portion 1 in the second direction by the corresponding second stretching fit structure 3 to effect application of a pulling force to the pattern portion 1 in the opposite direction in the second direction.

The pattern portion 1 is provided with at least one first tensile fit structure 2 on each of the oppositely disposed two edges in the first direction. In this embodiment, the pattern portion 1 is respectively provided with a first tensile fit structure 2 on opposite edges of the first direction. The first stretch-fit structure 2 is joined to the edge of the pattern portion 1, for example, the first stretch-fit structure 2 and the pattern portion 1 are integrally formed. Every first pull The stretching device 14 clamps the corresponding first tensile mating structure 2 in the first direction, and then in the first direction, each of the first stretching devices 14 applies a pulling force to the clamped first tensile mating structure 2 to achieve The pattern portion 1 is stretched in the opposite direction in the first direction. For example, as shown in FIGS. 1-2, a first stretching device 14 applies a pulling force to the first stretching fit structure 2 on the upper side of the pattern portion 1 in the upward direction, and the other first stretching device 14 The pulling force is applied to the first tensile fitting structure 2 located on the lower side of the pattern portion 1 in the downward direction, thereby realizing the application of the pulling force to the pattern portion 1 in the opposite direction in the first direction. The top end of the first stretch-fit structure 2 is provided with a recessed portion 21, and both sides of the recessed portion 21 of the first stretch-fitted structure 2 are gripping portions 22, and the first stretching device 14 holds the first stretch fit The clamping portion of the structure 2 is configured to apply a pulling force to the first tensile mating structure 2. A recessed portion 21 is provided on the first stretch-fit structure 2, thereby facilitating the first stretching device 14 to sandwich the first stretch-fit structure 2, and capable of dispersing stress so that the strain of the pattern portion 1 is more uniform. For example, the first stretching device can be a clamp for facilitating clamping of the clamping portion of the first tensile-fit structure 2.

The second tensile mating structure 3 includes a side structure 31 and at least one hollow structure 32 disposed on the side structure 31. The second stretching device 4 applies a pulling force to the pattern portion 1 in the second direction through the corresponding hollow structure 32. The pattern portions 1 are respectively provided with at least one second tensile fit structure 3 on opposite edges of the second direction. In this embodiment, the pattern portion 1 is respectively provided with a second tensile fit structure 3 on opposite edges of the second direction. For example, the second stretch-fit structure 3 is integrally formed with the pattern portion 1. Each of the second stretching devices 4 clamps a corresponding second stretching fit structure 3 in the second direction, and then applies a second stretching device 4 to the clamped second tensile mating structure 3 in the second direction. Pulling force to achieve stretching of the pattern portion 1 in the opposite direction in the second direction. For example, as shown in FIGS. 1 and 2, the second stretching device 4 located on the left side of the pattern portion 1 in FIG. 2 passes through the corresponding hollow structure 32 and faces the pattern portion 1 in the left direction (the dotted arrow in the figure) The pulling direction of the finger applies a pulling force, and the second stretching device 4 located on the right side of the pattern portion 1 passes through the corresponding hollow structure 32 and applies the pattern portion 1 in the rightward direction (the pulling direction indicated by the dotted arrow in the figure) Pulling force to achieve stretching of the pattern portion 1 in the opposite direction in the second direction. In the present embodiment, for example, the second tensile structure 4 is a robot.

For example, the second stretch fit structure 3 of the pattern portion 1 disposed at two edges in the second direction is provided with a hollow structure 32, and the hollow structure 32 of the second stretch fit structure 3 disposed at two edges is one by one. Corresponding settings.

For example, the number of second stretching devices 4 may be the same as the number of hollow structures 32, and the number of hollow structures 32 may be plural. In FIG. 2, eight hollow structures 32 are taken as an example for description, and the second stretching device is used. The number of sets 4 is eight, and only two second stretching devices 4 are illustrated in FIG. 2 as an example. The provision of the plurality of hollow structures 32 allows the pattern portion 1 to have a plurality of force application points in the second direction, so that the pattern portion 1 can be better stretched in the second direction. For example, the number of second stretching devices 4 may also differ from the number of hollow structures 32, for example, the number of second stretching devices 4 is less than the number of hollow structures 32, but in the hollowed out structure of the two edges in the second direction The second stretching device 4 is symmetrically disposed to uniformly and symmetrically stretch the pattern portion 1.

The cross-sectional shape of the hollow structure 32 may include a triangle, a rectangle, a circle, an ellipse, a zigzag, or a wave. In the present embodiment, the cross-sectional shape of the hollow structure 32 is a rectangle, but the embodiment of the present disclosure is not limited thereto, and for example, the hollow structure 32 may also adopt other shapes as described above. The spacing between the hollow structures 32, the width of the hollow structure 32, the location of the hollow structure 32, and the thickness of the hollow structure 32 may vary. Accordingly, for example, in order to match the rectangular shape of the exemplary hollow structure 32, the second stretching device 4 includes the fixing portion 41 in the shape of a rectangular parallelepiped as shown in FIGS. 2 and 3B-3C.

Continuing with FIG. 2 and FIGS. 3B-3C, the second stretching device 4 can further include a stretched portion 42 that is disposed in the hollow structure 32. The stretched portion 42 is for applying a pulling force to the pattern portion 1 in the second direction. The fixed portion 41 and the stretched portion 42 are disposed to intersect, for example, the fixed portion 41 and the stretched portion 42 are vertically intersected.

A groove 43 is provided on the outer side and/or the inner side of the fixed portion 41, and the groove 43 is engaged with the edge of the hollow structure 32. When the fixing portion 41 is disposed in the hollow structure 32, the outer side of the fixing portion 41 refers to the side 46 facing away from the pattern portion 1, that is, the side away from the pattern portion 1 (stretching direction); the inner finger of the fixing portion 41 It is toward the side 45 of the pattern portion 1, that is, the side adjacent to the pattern portion 1. For example, as shown in FIG. 3B, a groove 43 is provided on the outer side of the fixed portion 41. The shape and size of the corresponding edges of the groove 43 and the hollow structure 32 are matched so that the groove 43 can be engaged with the edge of the hollow structure 32, so that the second tensile fitting structure 3 can be caught in the groove 43, thereby being effective The warpage of the pattern portion 1 or the offset in the first direction is avoided.

For example, as shown in FIG. 3C, the inside of the fixed portion 41 is provided with a groove 43. The shape and size of the corresponding edges of the groove 43 and the hollow structure 32 are matched so that the groove 43 can be engaged with the edge of the hollow structure 32, so that the second tensile fitting structure 3 can be caught in the groove 43, thereby being effective The warpage of the pattern portion 1 or the offset in the first direction is avoided.

Referring again to FIGS. 1 and 2, for example, a first dividing line 5 is disposed between the first tensile mating structure 2 and the pattern portion 1, and the pulling of the pattern portion 1 in the first direction and the second direction is completed. After stretching (ie: The web is removed from the pattern portion 1 along the first dividing line 5. For example, the first tensile mating structure 2 can be removed from the pattern portion 1 along the first dividing line 5 by the first stretching device. Alternatively, the first stretch-fit structure 2 may be removed from the pattern portion 1 along the first dividing line 5 by laser cutting. After the end of the net, the first stretch-fit structure 2 is removed from the pattern portion 1 without affecting the structure of the entire mask, nor affecting the uniformity of the contact between the mask and the substrate during the evaporation process. Alternatively, the first tensile mating structure 2 may not be removed from the pattern portion 1 after the end of the web, so that there is no need to provide the first dividing line 5 between the first stretching mating structure 2 and the pattern portion 1. .

As shown in FIGS. 1 and 2, for example, a second dividing line 6 is disposed between the second tensile mating structure 3 and the pattern portion 1, and the pulling of the pattern portion 1 in the first direction and the second direction is completed. After stretching (ie, a web), the second tensile mating structure 3 can be removed from the pattern portion 1 along the second dividing line 6. For example, the second tensile mating structure 3 can be removed from the pattern portion 1 along the second dividing line 6 by the second stretching device 4. Alternatively, the second tensile mating structure 3 may be removed from the pattern portion 1 along the second dividing line 6 by laser cutting. After the end of the net, the second stretch-fit structure 3 is removed from the pattern portion 1 without affecting the structure of the entire mask, nor affecting the uniformity of the contact between the mask and the substrate during the evaporation process. Alternatively, the second tensile mating structure 3 may not be removed from the pattern portion 1 after the end of the web, so that there is no need to provide the second dividing line 6 between the second stretching mating structure 3 and the pattern portion 1. .

In the present embodiment, the pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11. The first tensile mating structure 2 is joined to the edge of the peripheral zone 12 and the second tensile mating structure 3 is joined to the edge of the peripheral zone 12.

In this embodiment, the mask is a high precision metal mask (FMM).

4 is a schematic structural view of a mask plate according to Embodiment 2 of the present disclosure, and FIG. 5 is a schematic structural view of the second stretching device 4 of FIG. 4, as shown in FIG. 4 and FIG. 5, the embodiment and the above implementation. The difference of the first example is that, for example, the cross-sectional shape of the hollow structure 32 in the present embodiment is a circular hole shape. Accordingly, in order to match the shape of the hollow structure 32, the shape of the fixed portion 41 is cylindrical. For the rest of the description, refer to the first embodiment, and the description is not repeated here.

FIG. 6 is a schematic structural diagram of a mask according to Embodiment 3 of the present disclosure. As shown in FIG. 6 , the difference between the embodiment and the first embodiment is that the second tensile fit structure is a hollow structure in this embodiment. 32. The cross-sectional shape of the hollow structure 32 is elliptical, and the fixing portion 41 of the second stretching device with which the shape is matched is shaped as an elliptical cylinder passing through the corresponding hollow structure 32 in the second direction. A pulling force is applied to the pattern portion 1. The second stretching device is not shown in Fig. 6, and the description can be referred to the description in the first embodiment and Fig. 2 and Figs. 3B-3C.

In the present embodiment, the pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11. The hollowed out area 32 is located in the peripheral zone 12.

For the rest of the description of the embodiment, refer to the first embodiment, and the description is not repeated here.

In the technical solution of the mask provided by the embodiment of the present disclosure, the edge of the pattern portion in the first direction is provided with a first stretch-fit structure, and the edge of the pattern portion is disposed with the second stretch-fit structure at the edge in the second direction. The first stretching device can be used to apply a pulling force to the pattern portion in the first direction by the first stretching fitting structure, and the second stretching device can be used to apply the pulling force to the pattern portion in the second direction by the second stretching fitting structure. In the embodiment of the present disclosure, the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the Production yield of light-emitting devices.

FIG. 7 is a schematic structural diagram of a mask device according to Embodiment 4 of the present disclosure. As shown in FIG. 7 , the mask device includes a frame 7 and a mask disposed on the frame 7 . The mask can be used as the mask provided in the first embodiment, and details are not described herein again.

In this embodiment, the frame 7 is a ring structure. The material of the frame 7 can be metal.

In this embodiment, the number of masks disposed on the frame 7 may be one or more.

7b is a schematic view of a mask blocking plate. As shown in FIG. 7b, a plurality of masks are arranged side by side on the frame 7, and a plurality of masks are arranged at intervals, that is, a certain mask is provided between the masks. Interval. For example, three mask sheets are provided in FIG. 7b, and three mask sheets are disposed side by side on the frame 7, but the embodiment of the present disclosure is not limited thereto. Further, the frame 7 is further provided with a shielding mask 10, the shielding mask 10 is disposed between the masks, and the edges of the shielding mask 10 and the edges of the mask are overlapped, and the mask is blocked. The edge of 10 is fixedly attached to the edge of the mask. It should be noted that the shielding mask is usually strip-shaped, and can also serve as an edge for supporting the mask, and shielding the spacing of the mask.

For example, the edge of the mask is the edge of the pattern portion 1 in the second direction. The pattern portion 1 includes a display area (A-A area) 11 and a peripheral area 12 located around the display area 11, and thus the edge of the pattern portion 1 in the second direction is the peripheral area 12 of the pattern portion 1 in the second direction. The edge of the occlusion mask 10 is fixedly connected to the peripheral portion 12 of the pattern portion 1 in the second direction.

In this embodiment, the edge of the shielding mask and the edge of the mask can be fixedly connected by a laser. For example, the edge of the pattern portion 1 in the second direction is provided with a solder joint 8 through which the mask mask is shielded The edge of the panel 10 is welded to the edge of the mask.

In this embodiment, the edge of the shielding mask and the edge of the mask are fixedly connected, and the shielding mask can provide a continuous pulling force in the second direction by the shielding mask with higher strength, thereby further improving the mask. The strength of the sheet is reduced, the wrinkles are reduced, and the flatness of the mask is improved.

FIG. 8 is a schematic structural diagram of a mask device according to Embodiment 5 of the present disclosure. As shown in FIG. 8 , the mask device includes a frame 7 and a mask plate disposed on the frame 7 . The mask plate provided in the above embodiment 2 can be used as the mask, and details are not described herein again.

FIG. 9 is a schematic structural diagram of a mask device according to Embodiment 6 of the present disclosure. As shown in FIG. 9, the mask device includes a frame 7 and a mask plate disposed on the frame 7. The mask plate provided in the above embodiment 3 can be used as the mask, and details are not described herein again.

In the technical solution of the mask device provided by the embodiment of the present disclosure, the edge of the pattern portion in the first direction is provided with a first stretch-fit structure, and the edge of the pattern portion is disposed with the second stretch-fit structure at the edge in the second direction. A pulling force may be applied to the pattern portion in the first direction by the first stretching mating structure, and a pulling force may be applied to the pattern portion in the second direction by the second stretching mating structure, in the first direction and the second in the embodiment of the present disclosure The pulling force is applied to the pattern portion in two directions, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the production yield of the light emitting device.

Embodiment 7 of the present disclosure provides a mask manufacturing apparatus including a first stretching device, a second stretching device, and a mask device.

In this embodiment, the mask device may be the mask device provided in the fourth embodiment, the fifth embodiment or the sixth embodiment.

Each of the first stretching devices applies a pulling force to the pattern portion in the first direction by the corresponding first stretching mating structure to achieve a pulling force in a direction opposite to the pattern portion in the first direction Each of the second stretching devices applies a pulling force to the pattern portion in the second direction through the corresponding second stretching mating structure to achieve opposite directions on the pattern portion in the second direction Apply tension. In the present embodiment, the descriptions of the first stretching device and the second stretching device can be referred to the description in the first embodiment or the second embodiment.

In the technical solution of the mask manufacturing apparatus provided by the embodiment of the present disclosure, the edge of the pattern portion in the first direction is provided with a first tensile matching structure, and the edge of the pattern portion is disposed with the second tensile matching structure at the edge in the second direction. A pulling force may be applied to the pattern portion in the first direction by the first tensile mating structure, and a pulling force may be applied to the pattern portion in the second direction by the second stretching mating structure. In the embodiment of the present disclosure, the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the Production yield of light-emitting devices.

10 is a flowchart of a method for fabricating a mask device according to Embodiment 8 of the present disclosure. As shown in FIG. 10, the mask device includes a frame and a mask. The mask includes a pattern portion, and the pattern portion is first. The edge in the direction is provided with a first stretch-fit structure, and the edge of the pattern portion in the second direction is provided with a second stretch-fit structure, and the first direction and the second direction are disposed to intersect.

The method includes:

Step 101: each first stretching device applies a pulling force to the pattern portion in a first direction by a corresponding first tensile matching structure to achieve a pulling force in a direction opposite to the pattern portion in the first direction, and each second The stretching device applies a pulling force to the pattern portion in the second direction by the corresponding second tensile fitting structure to effect application of a pulling force in the opposite direction on the pattern portion in the second direction.

For example, in the present embodiment, it is necessary to simultaneously apply a pulling force to the pattern portion in the first direction and the second direction.

Step 102: Fix the mask to the frame.

In this step, the mask can be welded to the frame by laser.

For example, the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are integrally formed, and a first dividing line is disposed between the first stretch-fit structure and the pattern portion, and between the second stretch-fit structure and the pattern portion A second dividing line is set. The step 102 further includes: removing the first tensile mating structure from the pattern portion along the first dividing line and the second stretching mating structure from the second dividing line from the Removed from the pattern.

For example, the second tensile mating structure includes a side structure and a hollow structure disposed on the side structure, or the second tensile mating structure is a hollow structure. The second stretching device includes a fixed portion and a stretched portion, and the fixed portion is disposed in the hollow structure. For example, each of the second stretching devices applying a pulling force to the pattern portion in the second direction by the corresponding second tensile mating structure includes: each of the second stretching devices passes through a corresponding hollow The structure applies a pulling force to the pattern portion in the second direction.

The manufacturing method of the mask device provided in this embodiment can be used to manufacture the above-mentioned embodiment 4 and the embodiment. 5 or the mask device provided in the sixth embodiment. For details, refer to the fourth embodiment, the fifth embodiment or the sixth embodiment.

In the technical solution of the manufacturing method of the mask device provided by the embodiment of the present disclosure, the edge of the pattern portion in the first direction is provided with a first tensile matching structure, and the edge of the pattern portion is disposed with the second stretching at the edge in the second direction. a mating structure, the first stretching device applies a pulling force to the pattern portion in the first direction by the first stretching fit structure, and the second stretching device applies a pulling force to the pattern portion in the second direction by the second stretching mating structure, In the disclosed embodiment, the pulling force is applied to the pattern portion in the first direction and the second direction, thereby avoiding the problem that the deformation of the mask in different directions is inconsistent, thereby avoiding the wrinkles of the mask, thereby improving the illumination. The production yield of the device.

In the embodiment of the present disclosure, the deformation of the force applied to the mask plate can be simulated by the ANSYS finite element simulation software. 11 is a schematic view showing the force deformation of the mask in the prior art and the embodiment of the present disclosure. As shown in FIG. 11, the display area of the mask in the prior art is unevenly applied, thereby generating wrinkles; The display area of the mask in the embodiment of the present disclosure is uniformly applied, and the elastic deformation of the display area is more uniform, and wrinkles are not generated, thereby improving the flatness of the mask.

It is to be understood that the above embodiments are merely exemplary embodiments employed to explain the principles of the embodiments of the present disclosure, but the embodiments of the present disclosure are not limited thereto. Various modifications and improvements can be made by those skilled in the art without departing from the spirit of the disclosure, and such modifications and improvements are also considered to be within the scope of the disclosure.

Claims

A mask comprising:

a pattern portion comprising a first edge and a second edge; a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge; as well as

a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;

Wherein the first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects.
The mask according to claim 1, wherein the second stretch fitting structure includes a side structure protruding from the pattern portion toward the opposite outer side in the second direction, and is disposed on the side structure At least one hollow structure.
The mask of claim 1 wherein the second tensile fit structure is a hollow structure.
The mask according to any one of claims 1 to 3, wherein the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are a unitary structure.
The mask according to any one of claims 1 to 4, wherein a first dividing line is disposed between the first tensile fitting structure and the pattern portion, and the second stretching fit structure and A second dividing line is disposed between the pattern portions.
The mask according to any one of claims 1 to 5, further comprising: two of the first edges disposed opposite each other in the first direction, and two oppositely disposed in the second direction The second edge.
A masking device comprising a frame and a plurality of masks according to any one of claims 1 to 6 disposed on the frame.
The mask device of claim 7, wherein the masking device further comprises a masking mask, the masking mask is located on the frame, and the masking mask is spaced from the masking panel And each edge of the occlusion mask and the corresponding edge of the reticle are overlapped, and each edge of the occlusion mask is fixedly connected to a corresponding edge of the reticle.
A mask manufacturing apparatus comprising a first stretching device, a second stretching device, and claim 6 a mask device according to any one of 8; wherein

Each of the first stretching devices is configured to apply a pulling force to the pattern portion in the first direction by the first tensile mating structure to achieve opposite to the pattern portion in the first direction Apply tension to the direction;

Each of the second stretching devices is configured to apply a pulling force to the pattern portion in the second direction by the second tensile mating structure to achieve an upper edge of the pattern portion in the second direction Apply tension in the opposite direction.
The mask manufacturing apparatus according to claim 9, wherein the second stretching device includes a fixing portion and a stretching portion, the fixing portion being configured to be disposed in the hollow structure.
The mask manufacturing apparatus according to claim 10, wherein the fixing portion includes a groove configured to engage an edge of the hollow structure.
A method of manufacturing a mask device, wherein the mask device comprises a frame and a mask, the mask comprising:

a pattern portion, the pattern portion including a first edge and a second edge;

a first tensile mating structure for relatively stretching the pattern portion in a first direction, the first tensile mating structure being located on the first edge;

a second tensile mating structure for relatively stretching the pattern portion in a second direction, the second tensile mating structure being located on the second edge;

Wherein the first edge is located at both ends of the pattern portion in the first direction and the second edge is located at both ends of the pattern portion in the second direction, and the first direction and the The second direction intersects;

The method includes:

Applying a pulling force to the first tensile mating structure in the first direction by the first stretching device such that the pattern portion receives forces of opposite magnitudes in the first direction, and passes through the second Stretching means applies a pulling force to the second tensile mating structure in the second direction such that the pattern portions are subjected to forces of opposite magnitudes in the second direction;

The mask is affixed to the frame.
The method of manufacturing a mask device according to claim 12, wherein the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are integrally formed.
The method of manufacturing a mask device according to claim 13, wherein a first dividing line is disposed between the first tensile fitting structure and the pattern portion, and the second stretching fit structure A second dividing line is disposed between the pattern portion.
The method of manufacturing a mask device according to claim 14, further comprising: before fixing the mask to the frame,

The first tensile mating structure is removed from the pattern portion along the first dividing line, and the second tensile mating structure is removed from the pattern portion along the second dividing line.
The method of manufacturing a mask device according to claim 12, wherein the second stretch-fit structure includes a side structure protruding from the pattern portion toward the opposite outer side in the second direction, and is disposed on the side a hollow structure on the edge structure, or the second tensile fit structure is a hollow structure; the second stretching device comprises a fixed portion and a stretched portion, the fixed portion is disposed in the hollow structure;

The method further includes:

Each of the second stretching devices passes through a corresponding hollow structure to apply a pulling force to the pattern portion in the second direction.
The method of manufacturing a mask device according to claim 16, wherein the cross-sectional shape of the hollow structure is a rectangle, a circular hole shape, or an elliptical hole shape, and the fixed portion of the second stretching device is Fitted rectangular, cylindrical, or elliptical cylindrical.
The method of manufacturing a mask device according to claim 16, wherein the fixing portion of the second stretching device is provided with a groove that engages with the hollow structure.