CN108977761B

CN108977761B - Mask plate, mask device, manufacturing method of mask device and mask manufacturing equipment

Info

Publication number: CN108977761B
Application number: CN201710408986.XA
Authority: CN
Inventors: 罗昶; 梁逸南; 吴海东; 吴建鹏
Original assignee: BOE Technology Group Co Ltd; Chengdu BOE Optoelectronics Technology Co Ltd
Current assignee: BOE Technology Group Co Ltd; Chengdu BOE Optoelectronics Technology Co Ltd
Priority date: 2017-06-02
Filing date: 2017-06-02
Publication date: 2020-04-03
Anticipated expiration: 2037-06-02
Also published as: CN108977761A; WO2018218932A1

Abstract

The invention discloses a mask plate, a mask device, a manufacturing method of the mask device and mask manufacturing equipment. The mask plate comprises a pattern part, wherein a first stretching matching structure is arranged on the edge of the pattern part in a first direction, a second stretching matching structure is arranged on the edge of the pattern part in a second direction, and the first direction and the second direction are arranged in a crossed mode. According to the invention, the pattern parts are applied with pulling forces in the first direction and the second direction, so that the problem of inconsistent deformation of the mask plate in different directions is avoided, wrinkles of the mask plate are avoided, and the production yield of the light-emitting device is improved.

Description

Mask plate, mask device, manufacturing method of mask device and mask manufacturing equipment

Technical Field

The invention relates to the technical field of display, in particular to a mask plate, a mask device, a manufacturing method of the mask device and mask manufacturing equipment.

Background

At present, the Organic Light-Emitting Diode (OLED) panel is mainly produced by evaporation coating. In the evaporation process, a high precision metal mask (FMM) is usually used to deposit the RGB film layers. The flatness of the FMM has a direct impact on the uniformity and positional accuracy of film deposition.

Before use, the FMM is firstly stretched and welded on a metal Frame (Frame) by laser. Generally, the FMM is shaped like a bar, and thus the FMM has four sides, two sides oppositely disposed are located in one direction, and the other two sides oppositely disposed are located in the other direction. The welding is performed after the tension is applied in opposite directions at both ends of the FMM in one direction to straighten the FMM in that direction during the web-expanding process.

In the prior art, because the pulling force is applied to the two ends of the strip-shaped FMM in the opposite directions only, and the pulling force is not applied to the two ends of the strip-shaped FMM in the other direction, the FMM is stressed unevenly, the FMM is deformed unevenly in different directions, wrinkles are easily generated in the other direction, and the wrinkles cause the defects of uneven evaporation, Shadow (Shadow), color mixing and the like, so that the production yield of OLED devices is low.

Disclosure of Invention

The invention provides a mask plate, a mask device, a manufacturing method of the mask device and mask manufacturing equipment, which are used for avoiding wrinkles generated on the mask plate, so that the production yield of a light-emitting device is improved.

In order to achieve the above object, the present invention provides a mask plate, which includes a pattern portion, wherein a first stretch-fit structure is disposed on an edge of the pattern portion in a first direction, a second stretch-fit structure is disposed on an edge of the pattern portion in a second direction, and the first direction and the second direction are arranged in a crossing manner.

Optionally, the second stretch-fit structure includes a side structure and at least one hollowed-out structure disposed on the side structure.

Optionally, the second stretch fit structure is a hollowed-out structure.

Optionally, the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are integrally formed, a first dividing line is disposed between the first stretch-fit structure and the pattern portion, and a second dividing line is disposed between the second stretch-fit structure and the pattern portion.

Optionally, the pattern portion is provided with at least one first stretch-fit structure on two oppositely-arranged edges in the first direction, and the pattern portion is provided with at least one second stretch-fit structure on two oppositely-arranged edges in the second direction.

In order to achieve the above object, the present invention provides a mask device, which includes a frame and a plurality of mask plates disposed on the frame.

Optionally, a plurality of the mask plates are arranged on the frame side by side, the frame is further provided with shielding mask plates, the shielding mask plates are arranged between the mask plates and arranged at intervals, the edges of the shielding mask plates and the edges of the mask plates are arranged in an overlapping mode, and the edges of the shielding mask plates and the edges of the mask plates are fixedly connected.

Optionally, the edge of the mask is an edge of the pattern portion in the second direction.

In order to achieve the above object, the present invention provides a mask manufacturing apparatus, comprising a first stretching device, a second stretching device and the mask device;

each first stretching device exerts a pulling force on the pattern part in the first direction through the corresponding first stretching matching structure so as to exert the pulling force on the pattern part in the opposite direction in the first direction;

each second stretching device exerts a pulling force on the pattern part in the second direction through the corresponding second stretching matching structure, so that the pulling force is exerted on the pattern part in the second direction in the opposite direction.

Optionally, the mask plate is adopted;

the second stretching device comprises a fixing part and a stretching part, and the fixing part is arranged in the hollow structure;

the stretching portion is configured to apply a tensile force to the pattern portion in the second direction.

Optionally, a groove is arranged on the outer side and/or the inner side of the fixing part, and the groove is clamped with the edge of the hollowed-out structure.

In order to achieve the above object, the present invention provides a method for manufacturing a mask device, the mask device includes a frame and a mask plate, the mask plate includes a pattern portion, an edge of the pattern portion in a first direction is provided with a first stretch fit structure, an edge of the pattern portion in a second direction is provided with a second stretch fit structure, and the first direction and the second direction are arranged in a crossing manner;

the method comprises the following steps:

each first stretching device exerts a pulling force on the pattern part in the first direction through the corresponding first stretch fit structure so as to realize the application of the pulling force on the pattern part in the opposite direction in the first direction, and each second stretching device exerts a pulling force on the pattern part in the second direction through the corresponding second stretch fit structure so as to realize the application of the pulling force on the pattern part in the opposite direction in the second direction;

and fixing the mask plate on the frame.

Optionally, the first stretch-fit structure, the second stretch-fit structure and the pattern portion are integrally formed, a first dividing line is arranged between the first stretch-fit structure and the pattern portion, and a second dividing line is arranged between the second stretch-fit structure and the pattern portion;

before the mask plate is fixed on the frame, the method further comprises the following steps:

removing the first stretch-fit structure from the pattern portion along the first cut line and removing the second stretch-fit structure from the pattern portion along the first cut line.

Optionally, the second stretch fit structure includes a side structure and a hollow structure disposed on the side structure, or the second stretch fit structure is a hollow structure; the second stretching device comprises a fixing part and a stretching part, and the fixing part is arranged in the hollow structure;

each second stretching device applies a pulling force to the pattern part in the second direction through the corresponding second stretch fit structure, and the pulling force comprises:

each second stretching device penetrates through the corresponding hollow structure to apply a pulling force to the pattern part in a second direction.

The invention has the following beneficial effects:

according to the technical scheme provided by the invention, the edge of the pattern part in the first direction is provided with the first stretching fit structure, the edge of the pattern part in the second direction is provided with the second stretching fit structure, the first stretching fit structure applies a pulling force to the pattern part in the first direction, and the second stretching fit structure applies a pulling force to the pattern part in the second direction.

Drawings

Fig. 1 is a schematic structural diagram of a mask according to a first embodiment of the present invention;

FIG. 2 is a schematic diagram of the application of the mask shown in FIG. 1;

FIG. 3 is a schematic structural view of the second stretching assembly shown in FIG. 2;

fig. 4 is a schematic structural diagram of a mask according to a second embodiment of the present invention;

FIG. 5 is a schematic structural view of the second stretching assembly shown in FIG. 4;

fig. 6 is a schematic structural diagram of a mask according to a third embodiment of the present invention;

fig. 7a is a schematic structural diagram of a mask device according to a fourth embodiment of the present invention;

FIG. 7b is a schematic view of a shadow mask;

fig. 8 is a schematic structural diagram of a mask device according to a fifth embodiment of the present invention;

fig. 9 is a schematic structural diagram of a mask device according to a sixth embodiment of the present invention;

fig. 10 is a flowchart illustrating a method for manufacturing a mask device according to an eighth embodiment of the present invention;

fig. 11 is a schematic diagram comparing the stress deformation of the mask in the prior art and the present invention.

Detailed Description

In order to make those skilled in the art better understand the technical solution of the present invention, the mask plate, the mask device, the manufacturing method thereof, and the mask manufacturing apparatus provided by the present invention will be described in detail below with reference to the accompanying drawings.

Fig. 1 is a schematic structural diagram of a mask according to a first embodiment of the present invention, fig. 2 is a schematic structural diagram of the mask in fig. 1, and fig. 3 is a schematic structural diagram of a second stretching device in fig. 2, as shown in fig. 1 to 3, the mask includes a pattern portion 1, a first stretch-fit structure 2 is disposed on an edge of the pattern portion 1 in a first direction, a second stretch-fit structure 3 is disposed on an edge of the pattern portion 1 in a second direction, and the first direction and the second direction are arranged in a crossing manner.

In practical application, the number of the first stretching devices may be multiple, the number of the second stretching devices may be multiple, and a tensile force may be applied to the pattern portion 1 by the first stretching devices and the second stretching devices, so that the mask plate is stretched. Specifically, each first stretching device (not shown in the figures) applies a pulling force to the pattern part 1 in a first direction through the corresponding first stretch-fit structure 2, so as to apply a pulling force to the pattern part 1 in an opposite direction in the first direction; each second stretching device (not shown in the figures) exerts a pulling force on the pattern part 1 in the second direction through the corresponding second stretch-fit structure 3, so as to exert a pulling force on the pattern part 1 in the opposite direction in the second direction.

The pattern part 1 is provided with at least one first stretch-fit structure 2 on two edges oppositely arranged in the first direction. In this embodiment, the two opposite edges of the pattern part 1 in the first direction are respectively provided with one first stretch-fit structure 2. The first stretch-fit structure 2 is connected to an edge of the pattern part 1, and preferably, the first stretch-fit structure 2 and the pattern part 1 are integrally formed. Each first stretching device clamps the corresponding first stretch-fit structure 2 in the first direction, and then each first stretching device applies a pulling force to the clamped first stretch-fit structure 2 in the first direction to stretch the pattern part 1 in the opposite direction in the first direction. For example, as shown in fig. 1, one first stretching device applies a pulling force in an upward direction to the clamped first stretch-fit structure 2 located on the upper side of the pattern part 1, and the other first stretching device applies a pulling force in a downward direction to the clamped first stretch-fit structure 2 located on the lower side of the pattern part 1, thereby realizing that the pulling force is applied in an opposite direction to the pattern part 1 in the first direction. The top of first tensile cooperation structure 2 is provided with recess position 21, and the both sides of the recess position 21 of first tensile cooperation structure 2 are the clamping part, and the clamping part of first tensile cooperation structure 2 of first stretching device centre gripping is in order to realize exerting the pulling force to first tensile cooperation structure 2. Set up recessed part 21 on first tensile cooperation structure 2 to be convenient for first tensile device centre gripping first tensile cooperation structure 2, and can disperse stress, make the meeting an emergency of pattern portion 1 more even.

The second stretch-fit structure 3 comprises a side structure 31 and at least one hollow structure 32 disposed on the side structure 31. The second stretching device 4 applies a pulling force to the pattern part 1 in the second direction through the corresponding hollow structure 32. The pattern part 1 is provided with at least one second stretch-fit structure 3 on two oppositely-arranged edges in the second direction, respectively. In this embodiment, the two opposite edges of the pattern part 1 in the second direction are respectively provided with one second stretch-fit structure 3. The second stretch-fit structure 3 is integrally formed with the pattern portion 1. Each second stretching device 4 clamps the corresponding second stretch-fit structure 3 in the second direction, and then each second stretching device 4 applies a pulling force to the clamped second stretch-fit structure 3 in the second direction to achieve stretching of the pattern part 1 in the opposite direction in the second direction. For example, as shown in fig. 1 and fig. 2, specifically, the second stretching device 4 located at the left side of the pattern part 1 in fig. 2 passes through the corresponding hollow structure 32 and applies a pulling force to the pattern part 1 in the left direction (the pulling force direction indicated by the dotted arrow in the figure) (the second stretching device 4 located at the right side of the pattern part 1 passes through the corresponding hollow structure 32 and applies a pulling force to the pattern part 1 in the right direction (the pulling force direction indicated by the dotted arrow in the figure) so as to stretch the pattern part 1 in the opposite direction in the second direction, in this embodiment, the second stretch-fit structure 3 is a manipulator.

Preferably, the pattern part 1 is provided with hollow structures 32 in the second stretch matching structures 3 arranged at two edges in the second direction, and the hollow structures 32 in the second stretch matching structures 3 arranged at the two edges are arranged in a one-to-one correspondence manner.

Preferably, the number of the second stretching devices 4 may be the same as that of the hollow structures 32, the number of the hollow structures 32 is multiple, and eight hollow structures 32 are described as an example in fig. 2, so that the number of the second stretching devices 4 is eight, and only two second stretching devices 4 are illustrated as an example in fig. 2. The plurality of hollow structures 32 are arranged, so that the pattern part 1 has a plurality of force application points in the second direction, and the pattern part 1 can be better stretched in the second direction. In practical applications, the number of the second stretching devices 4 may also be different from the number of the hollow structures 32, for example, the number of the second stretching devices 4 is smaller than the number of the hollow structures 32, but it is to be ensured that the second stretching devices 4 are symmetrically arranged in the hollow structures at two edges in the second direction, so as to achieve uniform stretching of the pattern portion 1.

The shape of the cutouts 32 may include triangular, rectangular, circular, oval, saw-tooth, or wavy. In this embodiment, the hollow structure 32 is rectangular, and in practical applications, the hollow structure 32 may also have other shapes, which are not listed here. The distance between the hollow structures 32, the width of the hollow structures 32, the setting position of the hollow structures 32 and the thickness of the hollow structures 32 can be set as required. Accordingly, the fixing portion 41 has a rectangular parallelepiped shape to fit the shape of the cutout 32.

As shown in fig. 2 and 3, the second stretching device 4 includes a fixing portion 41 and a stretching portion 42, and the fixing portion 41 is disposed in the hollow structure 32. The stretching portion 41 is used to apply a tensile force to the pattern part 1 in the second direction. The fixing portion 41 and the stretching portion 42 are disposed to intersect, and preferably, the fixing portion 41 and the stretching portion 42 are disposed to intersect perpendicularly.

The outer side and/or the inner side of the fixing portion 41 is provided with a groove 43, and the groove 43 is engaged with the edge of the hollow structure 32. When the fixing portion 41 is disposed in the hollow structure 32, the outer side of the fixing portion 41 refers to a side facing away from the pattern portion 1, and the inner side of the fixing portion 41 refers to a side facing toward the pattern portion 1. In this embodiment, the outer side of the fixing portion 41 is provided with a groove 43. The shape and the size of the corresponding edge of recess 43 and hollow out construction 32 all match to make recess 43 can with the edge block of hollow out construction 32, make second tensile fit structure 3 can block in recess 43, thereby effectively avoided pattern portion 1 to take place the warpage or take place the skew in the first direction.

As shown in fig. 1 and 2, a first dividing line 5 is further provided between the first stretch-fit structure 2 and the pattern part 1, and after the stretching of the pattern part 1 in the first direction and the second direction is completed (i.e., the stretching of the web), the first stretch-fit structure 2 can be removed from the pattern part 1 along the first dividing line 5. Preferably, the first stretch-fit structure 2 is removable from the pattern part 1 along the first dividing line 5 by a first stretching means. Alternatively, the first stretch-fit structure 2 may be removed from the pattern portion 1 along the first dividing line 5 by laser cutting. After the net is stretched, the first stretch fit structure 2 is removed from the pattern part 1, the structure of the whole mask plate cannot be influenced, and the contact uniformity of the mask plate and the substrate in the evaporation process cannot be influenced. In practical applications, the first stretch-fit structure 2 may optionally not be removed from the pattern portion 1 after the web is completed, so that the first dividing line 5 does not need to be provided between the first stretch-fit structure 2 and the pattern portion 1.

As shown in fig. 1 and 2, a second dividing line 6 is further provided between the second stretch-fit structure 3 and the pattern part 1, and after the stretching of the pattern part 1 in the first direction and the second direction is completed (i.e., the net is stretched), the second stretch-fit structure 3 can be removed from the pattern part 1 along the second dividing line 6. Preferably, the second stretch-fit structure 3 is removable from the pattern part 1 along the second dividing line 6 by the second stretching device 4. Alternatively, the second stretch-fit structure 3 may be removed from the pattern part 1 along the second dividing line 6 by means of laser cutting. After the net is stretched, the second stretch matching structure 3 is removed from the pattern part 1, the structure of the whole mask plate cannot be influenced, and the contact uniformity of the mask plate and the substrate in the evaporation process cannot be influenced. In practical applications, the second stretch-fit structure 3 may optionally not be removed from the pattern part 1 after the web is completed, so that the second dividing line 6 does not need to be provided between the second stretch-fit structure 3 and the pattern part 1.

In this embodiment, the pattern portion 1 includes a display area (a-a area) 11 and a peripheral area 12 located around the display area 11. The first stretch-fit structure 2 is connected to an edge of the peripheral section 12 and the second stretch-fit structure 3 is connected to an edge of the peripheral section 12.

In this embodiment, the mask is an FMM.

Fig. 4 is a schematic structural view of a mask according to a second embodiment of the present invention, and fig. 5 is a schematic structural view of a second stretching device in fig. 4, as shown in fig. 4 and fig. 5, a difference between this embodiment and the first embodiment is that the hollow structure 32 in this embodiment is circular. Accordingly, the fixing portion 41 has a cylindrical shape to match the shape of the cutout 32. The rest of the description can be referred to the first embodiment, and the description is not repeated here.

Fig. 6 is a schematic structural view of a mask according to a third embodiment of the present invention, as shown in fig. 6, the difference between this embodiment and the first embodiment is that the second stretching-fit structure is a hollow structure 32, and the second stretching device passes through the corresponding hollow structure 32 to apply a pulling force to the pattern portion 1 in the second direction. The second stretching device is not shown in fig. 6, and the detailed description can refer to the description in the first embodiment and fig. 2 and 3.

In this embodiment, the pattern portion 1 includes a display area (a-a area) 11 and a peripheral area 12 located around the display area 11. The hollowed-out area 32 is located in the peripheral area 12.

The rest of the description of this embodiment can be referred to the first embodiment, and the description is not repeated here.

According to the technical scheme of the mask plate, the edge of the pattern portion in the first direction is provided with the first stretching fit structure, the edge of the pattern portion in the second direction is provided with the second stretching fit structure, the first stretching fit structure can apply pulling force to the pattern portion in the first direction, and the second stretching fit structure can apply pulling force to the pattern portion in the second direction.

Fig. 7a is a schematic structural diagram of a mask device according to a fourth embodiment of the present invention, and as shown in fig. 7, the mask device includes a frame 7 and a mask plate disposed on the frame 7. The mask plate provided in the first embodiment can be used as the mask plate, and details are not repeated here.

In this embodiment, the frame 7 has a ring structure. The material of the frame 7 may be metal.

In this embodiment, the number of the mask plates arranged on the frame 7 may be one or more.

Fig. 7b is a schematic view of shielding masks, as shown in fig. 7b, a plurality of masks are arranged on the frame 7 side by side, and the plurality of masks are arranged at intervals, that is, a certain interval is provided between the masks, in fig. 7b, three masks are used as an example to describe, and three masks are arranged on the frame 7 side by side. Further, a shielding mask plate 10 is further arranged on the frame 7, the shielding mask plate 10 is arranged between the mask plates and is overlapped with the edge of the shielding mask plate 10 and the edge of the mask plate, and the edge of the shielding mask plate 10 is fixedly connected with the edge of the mask plate.

Preferably, the edge of the mask is an edge of the pattern portion 1 in the second direction. The pattern portion 1 includes a display area (a-a area) 11 and a peripheral area 12 located around the display area 11, and thus an edge of the pattern portion 1 in the second direction is the peripheral area 12 of the pattern portion 1 in the second direction. The edge of the masking mask 10 is fixedly connected with the peripheral area 12 of the pattern part 1 in the second direction.

In this embodiment, the edge of the shielding mask plate and the edge of the shielding mask plate can be fixedly connected through laser. Specifically, the edge of the pattern portion 1 in the second direction is provided with a welding spot 8, and the edge of the shielding mask plate 10 and the edge of the mask plate are welded together by the welding spot 8.

In the embodiment, the edge of the shielding mask plate is fixedly connected with the edge of the shielding mask plate, and the shielding mask plate with higher strength can provide continuous pulling force for the shielding mask plate in the second direction, so that the mesh strength of the shielding mask plate is further improved, wrinkles are reduced, and the flatness of the shielding mask plate is improved.

Fig. 8 is a schematic structural diagram of a mask device according to a fifth embodiment of the present invention, and as shown in fig. 8, the mask device includes a frame 7 and a mask plate disposed on the frame 7. The mask plate provided by the second embodiment can be adopted as the mask plate, and details are not repeated here.

Fig. 9 is a schematic structural diagram of a mask device according to a sixth embodiment of the present invention, and as shown in fig. 9, the mask device includes a frame 7 and a mask plate disposed on the frame 7. The mask plate provided by the third embodiment can be adopted as the mask plate, and details are not repeated here.

According to the technical scheme of the mask device, the first stretching fit structure is arranged at the edge of the pattern part in the first direction, the second stretching fit structure is arranged at the edge of the pattern part in the second direction, the first stretching fit structure can apply pulling force to the pattern part in the first direction, and the second stretching fit structure can apply pulling force to the pattern part in the second direction.

The seventh embodiment of the present invention provides mask manufacturing equipment, which includes a first stretching device, a second stretching device, and a mask device.

In this embodiment, the mask device may be the mask device provided in the fourth, fifth or sixth embodiment.

Each first stretching device exerts a pulling force on the pattern part in the first direction through the corresponding first stretching matching structure so as to exert the pulling force on the pattern part in the opposite direction in the first direction; each second stretching device exerts a pulling force on the pattern part in the second direction through the corresponding second stretching matching structure, so that the pulling force is exerted on the pattern part in the second direction in the opposite direction. In this embodiment, the description of the first stretching device and the second stretching device can be referred to the description of the first embodiment or the second embodiment.

According to the technical scheme of the mask manufacturing equipment, the first stretching and matching structure is arranged at the edge of the pattern part in the first direction, the second stretching and matching structure is arranged at the edge of the pattern part in the second direction, the pattern part can be applied with the pulling force in the first direction through the first stretching and matching structure, and the pattern part can be applied with the pulling force in the second direction through the second stretching and matching structure.

Fig. 10 is a flowchart of a manufacturing method of a mask device according to an eighth embodiment of the present invention, and as shown in fig. 10, the mask device includes a frame and a mask plate, the mask plate includes a pattern portion, a first stretch-fit structure is disposed on an edge of the pattern portion in a first direction, a second stretch-fit structure is disposed on an edge of the pattern portion in a second direction, and the first direction and the second direction are arranged in a crossing manner.

The method comprises the following steps:

step 101, each first stretching device exerts a pulling force on the pattern portion in a first direction through the corresponding first stretch-fit structure to realize that a pulling force is exerted on the pattern portion in an opposite direction in the first direction, and each second stretching device exerts a pulling force on the pattern portion in a second direction through the corresponding second stretch-fit structure to realize that a pulling force is exerted on the pattern portion in an opposite direction in the second direction.

Preferably, in the present embodiment, it is necessary to apply the tensile force to the pattern portion in the first direction and the second direction at the same time.

And 102, fixing the mask plate on the frame.

In this step, the mask plate may be welded to the frame by laser.

Furthermore, the first stretch fit structure, the second stretch fit structure and the pattern portion are integrally formed, a first dividing line is arranged between the first stretch fit structure and the pattern portion, and a second dividing line is arranged between the second stretch fit structure and the pattern portion. Step 102 further comprises, before: removing the first stretch-fit structure from the pattern portion along the first cut line and removing the second stretch-fit structure from the pattern portion along the first cut line.

Further, the second stretch fit structure includes the side structure and sets up the hollow out construction on the side structure, perhaps the second stretch fit structure is hollow out construction. The second stretching device comprises a fixing part and a stretching part, and the fixing part is arranged in the hollow structure. Specifically, the step of applying a pulling force to the pattern part in the second direction by each second stretching device through the corresponding second stretch-fit structure comprises: each second stretching device penetrates through the corresponding hollow structure to apply a pulling force to the pattern part in a second direction.

The method for manufacturing a mask device provided in this embodiment may be used to manufacture the mask device provided in the fourth embodiment, the fifth embodiment, or the sixth embodiment, and specific descriptions may refer to the fourth embodiment, the fifth embodiment, or the sixth embodiment.

According to the technical scheme of the manufacturing method of the mask device, the edge of the pattern portion in the first direction is provided with the first stretching matching structure, the edge of the pattern portion in the second direction is provided with the second stretching matching structure, the first stretching device exerts the tensile force on the pattern portion in the first direction through the first stretching matching structure, and the second stretching device exerts the tensile force on the pattern portion in the second direction through the second stretching matching structure.

In the invention, the deformation of the mask plate under stress when the mask plate is stretched can be simulated by ANSYS finite element simulation software. Fig. 11 is a schematic diagram comparing stress deformation of a mask in the prior art and the mask in the present invention, as shown in fig. 11, a display area of the mask in the prior art is stressed unevenly, so that wrinkles are generated; the display area of the mask plate is stressed uniformly, the elastic deformation of the display area is more uniform, and no wrinkles are generated, so that the flatness of the mask plate is improved.

It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.

Claims

1. The mask plate is characterized by comprising a pattern part, wherein a first stretching and matching structure is arranged at the edge of the pattern part in the first direction, a second stretching and matching structure is arranged at the edge of the pattern part in the second direction, the first direction and the second direction are arranged in a crossed mode, the second stretching and matching structure comprises a side edge structure and at least one hollow structure arranged on the side edge structure, and the hollow structure is used for enabling a corresponding second stretching device to pass through the hollow structure and then apply pulling force to the pattern part in the second direction.

2. A mask according to claim 1, wherein the first stretch fit structure, the second stretch fit structure and the pattern portion are integrally formed, a first dividing line is provided between the first stretch fit structure and the pattern portion, and a second dividing line is provided between the second stretch fit structure and the pattern portion.

3. A mask according to claim 1, wherein the pattern portion is provided with at least one first stretch-fit structure on two edges oppositely arranged in the first direction, and the pattern portion is provided with at least one second stretch-fit structure on two edges oppositely arranged in the second direction.

4. A mask device, comprising a frame and a plurality of mask plates according to any one of claims 1 to 3 arranged on the frame.

5. The mask device according to claim 4, wherein the plurality of mask plates are arranged on the frame side by side, a shielding mask plate is further arranged on the frame, the shielding mask plate is arranged between the mask plates at intervals, the edge of the shielding mask plate and the edge of the mask plate are arranged in an overlapping manner, and the edge of the shielding mask plate and the edge of the mask plate are fixedly connected.

6. The mask device according to claim 5, wherein an edge of the mask is an edge of the pattern portion in the second direction.

7. A mask manufacturing apparatus comprising a first stretching means, a second stretching means, and a mask device according to any one of claims 4 to 6;

each second stretching device exerts a pulling force on the pattern part in the second direction after penetrating through the corresponding hollow structure of the second stretching matching structure, so that the pulling force is exerted on the pattern part in the second direction along the opposite direction.

8. Mask manufacturing apparatus according to claim 7, characterized in that

9. The mask manufacturing apparatus according to claim 8, wherein a groove is provided on an outer side and/or an inner side of the fixing portion, and the groove is engaged with an edge of the hollow structure.

10. The manufacturing method of the mask device is characterized in that the mask device comprises a frame and a mask plate, the mask plate comprises a pattern part, a first stretching fit structure is arranged on the edge of the pattern part in a first direction, a second stretching fit structure is arranged on the edge of the pattern part in a second direction, the first direction and the second direction are arranged in a crossed mode, and the second stretching fit structure comprises a side edge structure and at least one hollow structure arranged on the side edge structure;

the method comprises the following steps:

each first stretching device exerts a pulling force on the pattern part in the first direction through the corresponding first stretching matching structure so as to exert the pulling force on the pattern part in the opposite direction in the first direction, and each second stretching device exerts the pulling force on the pattern part in the second direction after penetrating through the hollow structures in the corresponding second stretching matching structure so as to exert the pulling force on the pattern part in the opposite direction in the second direction;

and fixing the mask plate on the frame.

11. The method for manufacturing a mask device according to claim 10, wherein the first stretch-fit structure, the second stretch-fit structure, and the pattern portion are integrally formed, a first dividing line is provided between the first stretch-fit structure and the pattern portion, and a second dividing line is provided between the second stretch-fit structure and the pattern portion;

12. The method for manufacturing a mask device according to claim 10, wherein the second stretching device comprises a fixing portion and a stretching portion, the fixing portion is disposed in the hollow structure;