WO2018182127A1 - Photosensitive resin composition, and color filter and image display device prepared by using same - Google Patents

Photosensitive resin composition, and color filter and image display device prepared by using same Download PDF

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Publication number
WO2018182127A1
WO2018182127A1 PCT/KR2017/013588 KR2017013588W WO2018182127A1 WO 2018182127 A1 WO2018182127 A1 WO 2018182127A1 KR 2017013588 W KR2017013588 W KR 2017013588W WO 2018182127 A1 WO2018182127 A1 WO 2018182127A1
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WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
group
formula
cardo
Prior art date
Application number
PCT/KR2017/013588
Other languages
French (fr)
Korean (ko)
Inventor
김형주
강덕기
왕현정
Original Assignee
동우화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from KR1020170040619A external-priority patent/KR101958414B1/en
Priority claimed from KR1020170109527A external-priority patent/KR101840348B1/en
Application filed by 동우화인켐 주식회사 filed Critical 동우화인켐 주식회사
Priority to CN201780088307.3A priority Critical patent/CN110419002B/en
Priority to JP2019551963A priority patent/JP6934062B2/en
Publication of WO2018182127A1 publication Critical patent/WO2018182127A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present invention relates to a photosensitive resin composition comprising specific scattering particles and an alkali-soluble resin, a color filter and an image display device manufactured using the same.
  • the color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units.
  • the size of one pixel is about tens to hundreds of micrometers.
  • Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
  • color filters are used in various fields, including various image display devices, not only excellent pattern characteristics but also high color reproducibility and excellent performance such as high brightness and high contrast ratio are required.
  • a color filter manufacturing method using a self-luminous photosensitive resin composition is proposed.
  • Republic of Korea Patent Publication No. 2013-0000506 relates to a display device, a plurality of wavelength conversion particles for converting the wavelength of light; And a color converter including a plurality of color filter particles that absorb light having a predetermined wavelength in the light.
  • the efficiency of the color filter may be somewhat degraded as the efficiency of the quantum dot, in particular, the blue quantum dot is reduced, and in the case of the blue quantum dot, there is a problem that the overall manufacturing cost increases. .
  • Patent Document 1 Republic of Korea Patent Publication No. 2013-0000506 (2013.01.03.)
  • An object of this invention is to provide the photosensitive resin composition which can prevent the fall of the efficiency of a blue pixel, and can lower manufacturing cost.
  • the present invention is to provide a color filter and an image display device including a blue pixel layer manufactured using the photosensitive resin composition described above. Specifically, the present invention is to provide a color filter and an image display device excellent in image quality, viewing angle, durability, reliability.
  • the photosensitive resin composition according to the present invention for achieving the above object is an alkali-soluble resin; And scattering particles comprising a metal oxide having an average particle diameter of 30 to 500 nm; wherein the alkali-soluble resin comprises a first cardo-based binder resin and a compound represented by the following Chemical Formula 2, including the compound represented by the following Chemical Formula 1. It characterized in that it comprises at least one selected from the group consisting of a second cardo-based binder resin to be polymerized.
  • R1 and R2 are each independently
  • X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group
  • R3 is hydrogen or an alkyl group having 1 to 5 carbon atoms
  • R4 and R5 are each independently
  • X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group
  • R6 is hydrogen or an alkyl group having 1 to 5 carbon atoms.
  • the present invention provides a color filter made of the photosensitive resin composition described above and an image display device including the same.
  • the photosensitive resin composition of this invention has the advantage that provision of the outstanding color reproduction characteristic and light efficiency is possible.
  • the color filter made of the photosensitive resin composition of the present invention and an image display device including the same can ensure high quality image quality, excellent viewing angle, high durability, and reliability, and can reduce manufacturing cost.
  • a member when a member is located "on" another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.
  • alkali-soluble resin comprising a first cardo-based binder resin and a compound represented by the following Chemical Formula 2, including the compound represented by the following Chemical Formula 1.
  • the alkali-soluble resin comprises a first cardo-based binder resin and a compound represented by the following Chemical Formula 2, including the compound represented by the following Chemical Formula 1.
  • a photosensitive resin composition comprising at least one selected from the group consisting of a second cardo-based binder resin to be polymerized, including.
  • R1 and R2 are each independently
  • X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group
  • R3 is hydrogen or an alkyl group having 1 to 5 carbon atoms
  • R4 and R5 are each independently
  • X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group
  • R6 is hydrogen or an alkyl group having 1 to 5 carbon atoms.
  • the photosensitive resin composition of the present invention is selected from the group consisting of a first cardo-based binder resin that is polymerized including a compound represented by the following Formula 1 and a second cardo-based binder resin that is polymerized including a compound represented by the following Formula 2 It includes one or more.
  • R1 and R2 are each independently
  • X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group
  • R3 is hydrogen or an alkyl group having 1 to 5 carbon atoms
  • R4 and R5 are each independently
  • X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group
  • R6 is hydrogen or an alkyl group having 1 to 5 carbon atoms.
  • the alkali-soluble resin has reactivity and alkali solubility by the action of light or heat.
  • the alkali-soluble resin may act as a binder resin for scattering particles, and may be soluble in an alkaline developer used in a developing step for manufacturing a color filter.
  • the alkali-soluble resin according to the present invention includes the first cardo-based binder resin polymerized by including the compound represented by the following Chemical Formula 1, thereby improving adhesion to the substrate and excellent development adhesion, thereby realizing a fine pattern for high resolution. There is an advantage to that.
  • R1 and R2 are each independently
  • X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group
  • R 3 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably X is a hydroxyl group
  • R 3 is a hydrogen atom or a methyl group.
  • the compound represented by Chemical Formula 1 may be synthesized using Chemical Formula 5 below, and the first cardo-based binder resin having alkali solubility may be obtained by further reacting an acid anhydride or an acid 2 anhydride compound.
  • the compound represented by Chemical Formula 5 is mixed with epichlorohydrin and t-butylammonium bromide, heated and reacted with a solvent, followed by dropwise addition of an aqueous alkali solution, precipitation and separation to synthesize an epoxy compound, and synthesis.
  • the resulting epoxy compound by reacting it with t-butylammonium bromide, acrylic acid, phenolic compound and solvent, and an acid anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, anhydride.
  • hexahydrophthalic acid methyl endomethylenetetrahydrophthalic anhydride, chloric anhydride, methyltetrahydrophthalic anhydride or acid anhydride, pyromellitic anhydride, benzophenonetetracarboxylic acid anhydride, biphenyltetracarboxylic acid anhydride, biphenyl Aromatic polyhydric acids such as phenyl ether tetracarboxylic acid dianhydride It can be prepared by reacting at least one member selected from the group consisting of acids anhydride, but are not limited to this.
  • the alkali-soluble binder resin according to the present invention includes a second cardo-based binder resin polymerized by including the compound of the formula (2), thereby improving the adhesion to the substrate, excellent development adhesion and fine patterns for high resolution Enable to implement
  • R4 and R5 are each independently,
  • X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group
  • R6 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably X is a hydroxyl group
  • R6 is a hydrogen atom or a methyl group.
  • the compound represented by Chemical Formula 2 may be synthesized using the following Chemical Formula 6, and the second cardo-based binder resin having alkali solubility may be obtained by further reacting an acid anhydride or an acid 2 anhydride compound.
  • the compound represented by Chemical Formula 6 is mixed with epichlorohydrin, t-butylammonium bromide and a solvent, and then reacted by heating together, an aqueous alkali solution is added dropwise, precipitated and separated to synthesize an epoxy compound, and then synthesized.
  • the resulting epoxy compound by reacting it with t-butylammonium bromide, acrylic acid, phenolic compound and solvent, and an acid anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, anhydride.
  • the position of the hydroxyl group (-OH) in the above formulas (5) and (6) is not particularly limited, and for example, may be 2-position, 3-position, and 4-position, and preferably 4-position (positioning is xanthene). And determine the carbon bonded to 1-top).
  • More specific examples of the compound represented by Formula 1 include 9,9-bis (3-cinnamic diester) fluorene, 9,9-bis ( 3-cinnamoyl, 4-hydroxyphenyl) fluorene (9,9-bis (3-cinnamoyl, 4-hydroxyphenyl) fluorene), 9,9-bis (glycidyl methacrylate ether) fluorene (9, 9-bis (glycidyl methacrylate ether) fluorene, 9,9-bis (3,4-dihydroxyphenyl) fluorene disinnamic ester, 3,4-dihydroxyphenyl) fluorene dicinnamic ester , 6-diglycidyl methacrylate ether spiro (fluorene-9,9-xanthene) (3,6-diglycidyl methacrylate ether spiro (fluorene-9,9-xanthene)), 9,9-bis (3- Allyl, 4-hydroxyphenylfluor
  • More specific examples of the compound represented by Formula 2 include 9,9-bis (3,4-methacrylic diester) xanthene, but are not limited thereto.
  • the acid value of the alkali-soluble binder resin may be 20 to 200 mgKOH / g, preferably 30 to 150 mgKOH / g.
  • the solubility in the developing solution is improved, so that the non-exposed part is easily dissolved and the sensitivity is increased, and as a result, the pattern of the exposed part remains at the time of development to improve the film remaining ratio. .
  • acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of an acrylic polymer, and can be obtained by titration using an aqueous potassium hydroxide solution.
  • the polystyrene reduced weight average molecular weight (hereinafter, simply referred to as 'weight average molecular weight') measured by gel permeation chromatography (GPC; tetrahydrofuran as an eluting solvent) is 2,000 to 200,000, preferably 3,000 to 100,000. Alkali-soluble resins are preferred.
  • the molecular weight is in the above range, the hardness of the coating film is improved, the residual film ratio is high, the solubility of the non-exposed portion in the developer is excellent and the resolution tends to be improved, which is preferable.
  • the said alkali-soluble resin it is preferable that it is 1.0-6.0, and, as for the molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] of the said alkali-soluble resin, it is more preferable that it is 1.5-6.0.
  • the cardo-based binder resin is included in 1 to 50 parts by weight, preferably 5 to 40 parts by weight, more preferably 5 to 30 parts by weight based on 100 parts by weight of the total photosensitive resin composition. Can be.
  • the solubility in a developing solution is sufficient so that development residues are less likely to occur on the substrate of the non-pixel portion, and it is difficult to reduce the film portion of the pixel portion of the exposed portion during development. It is preferable because there is an advantage that the omission property tends to be good.
  • the alkali-soluble resin may further include a cardo-based binder resin comprising at least one repeating unit of the following formula (3) and (4).
  • R7 and R8 are each independently hydrogen, hydroxy group, thiol group, amino group, nitro group or halogen atom,
  • Ar1 is each independently a C6 to C15 aryl group
  • Y is an acid anhydride residue
  • Z is an acid 2 anhydride residue
  • A is O, S, N, Si or Se
  • a and b are each independently an integer of 1 to 6,
  • n are each independently an integer of 0 to 30,
  • the halogen atom F, Cl, Br or I The halogen atom F, Cl, Br or I.
  • the aryl group may be a C6 to C15 monocyclic aryl group, or a polycyclic aryl group.
  • the monocyclic aryl group may be a phenyl group, biphenyl group, terphenyl group, stilbenyl group and the like, but is not limited thereto.
  • the polycyclic aryl group may be naphthyl group, anthracenyl group, phenanthryl group, pyrenyl group, perylenyl group, chrysenyl group, fluorenyl group, and the like, but is not limited thereto.
  • Y in Formula 3 is a residue of an acid anhydride, and an acid anhydride capable of introducing residue Y is not particularly limited.
  • an acid anhydride capable of introducing residue Y is not particularly limited.
  • Hydrophthalic acid methylene anhydride, methylenetetrahydrophthalic acid, chlororenic acid anhydride, methyltetrahydrophthalic anhydride, and the like can be given.
  • Z in the formula (4) is a residue of the acid 2 anhydride
  • acid 2 anhydride compound that can introduce the residue Z is not particularly limited, for example, pyromellitic anhydride, benzophenone tetracarboxylic acid anhydride, biphenyltetracarboxylic acid Dianhydride, bitenyl ether tetracarboxylic acid dianhydride, cyclohexyl dianhydride, cyclobutyl acid dianhydride, and the like.
  • the cardo-based binder resin according to the present invention is included in the photosensitive resin composition, there is an advantage that the light emission intensity, the diffusion rate and the external light reflectance may have more excellent effects.
  • the alkali-soluble resin further comprises a cardo-based binder resin including at least one repeating unit selected from the group consisting of Formula 3 and Formula 4
  • the cardo-based binder resin is 100 parts by weight of the total alkali-soluble resin. 1 to 50 parts by weight, preferably 5 to 40 parts by weight, and more preferably 5 to 30 parts by weight.
  • the cardo-based binder resin which may be further included, is included in the above range, the light emission intensity, the diffusion rate, and the external light reflectance may be more excellent.
  • the cardo-based binder resin including at least one repeating unit of Formulas 3 and 4 may be prepared by, for example, the following method.
  • a cardo-based binder resin including at least one repeating unit of Formulas 3 and 4 may be obtained by polymerizing a compound represented by Formulas 12 to 16 with carboxylic dianhydride.
  • A, R7, and R8 are as defined in Formulas 3 and 4.
  • A, Ar1, R7 and R8 are as defined in the formulas (3) and (4).
  • carboxylic dianhydride examples include pyromellitic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, and 2,3,3', 4'-biphenyltetracarboxylic dianhydride , 2,2 ', 3,3'-biphenyltetracarboxylic dianhydride, 3,3', 4,4'-benzophenonetetracarboxylic dianhydride, 2,2 ', 3,3'-benzo Phenonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) propane dianhydride, 1,1-bis ( 3,4-dicarboxyphenyl) ethane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, bis (3,4-dicarboxyphen
  • the polymerization reaction may be performed at 100 to 130 ° C., or 110 to 120 ° C. for 2 hours to 24 hours, or 4 hours to 12 hours.
  • the carboxylic dianhydride may be added in an amount of 5 to 40 parts by weight, 10 to 30 parts by weight, or 10 to 20 parts by weight based on 100 parts by weight of the monomer represented by Formula 12 to 16, for example.
  • the method for preparing a cardo-based binder resin including at least one repeating unit of Chemical Formulas 3 and 4 may include, for example, reacting by adding an end-capping agent after initiation of the polymerization reaction. have.
  • the end capping reaction may be performed at 100 to 130 ° C., or 110 to 120 ° C. for 30 minutes to 4 hours, or 1 hour to 3 hours, for example.
  • the end capping agent may be added in an amount of 2 to 10 parts by weight, 2 to 5 parts by weight, or 3 to 5 parts by weight based on 100 parts by weight of the monomer represented by Formula 12 to 16, for example.
  • the end capping agent is preferably aromatic carboxylic anhydride, for example, phthalic anhydride, and the like, and in this case, excellent heat resistance, high permeability, and high refractive properties.
  • the weight average molecular weight of the cardo-based binder resin including at least one repeating unit of Formula 3 and Formula 4 is, for example, 1,000 to 100,000 g / mol, preferably 2,000 to 50,000 g / mol, more preferably 3,000 to It may be 10,000 g / mol, it is excellent in heat resistance within this range and the development speed of the photosensitive material and the development by the developing solution is suitable, there is an effect that the pattern formation is good.
  • the weight average molecular weight can be measured by gel permeation chromatography (GPC) method.
  • the degree of dispersion of the cardo-based binder resin resin including at least one repeating unit of Formulas 3 and 4 may be in the range of 1.0 to 5.0, preferably 1.5 to 4.0, and has excellent heat resistance within this range. And the development speed of the photosensitive material and the development by the developer is suitable, there is an effect that the pattern formation is good.
  • the dispersion degree of this description can be measured by GPC measuring method.
  • the alkali-soluble resin may further include an acrylic binder resin.
  • the alkali-soluble resin further includes the acrylic binder resin, it is preferable because the size of the minimum pattern that can be formed without loss of the pattern is small, which has advantages of high-resolution pattern implementation and pattern straightness.
  • acrylic binder resin examples include a carboxyl group-containing monomer and a copolymer with another monomer copolymerizable with the monomer.
  • unsaturated carboxylic acids such as unsaturated monocarboxylic acid, unsaturated polyhydric carboxylic acid, such as unsaturated polycarboxylic acid which has 1 or more carboxyl groups in molecules, such as unsaturated dicarboxylic acid and unsaturated tricarboxylic acid, are mentioned, for example.
  • unsaturated monocarboxylic acid acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example.
  • unsaturated dicarboxylic acid a maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example.
  • the unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride.
  • the unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester thereof, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl ), Mono (2-acryloyloxyethyl) phthalate, mono (2-methacryloyloxyethyl) phthalate, etc. are mentioned.
  • the unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate. .
  • These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
  • styrene (alpha) -methylstyrene, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p-chloro styrene, o-methoxy styrene, m-meth Oxy styrene, p-methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p- Aromatic vinyl compounds such as vinyl benzyl glycidyl ether and indene; Methyl acrylate, methyl methyl styrene, o-vinyl toluene, m-
  • Unsaturated carboxylic acid esters 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxyl such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate and 3-dimethylaminopropyl methacrylate Acid aminoalkyl esters; Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; Un
  • Unsaturated imides such as N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; And monoacryloyl or monomethacryloyl groups at the terminal of the polymer molecular chain of polystyrene, polymethylacrylate, polymethylmethacrylate, poly-n-butylacrylate, poly-n-butylmethacrylate, polysiloxane. And macromonomers to have. These monomers can be used individually or in mixture of 2 or more types, respectively.
  • bulky monomers such as monomers having a norbornyl skeleton, monomers having an adamantane skeleton, and monomers having a rosin skeleton as the other monomers copolymerizable with the carboxyl group-containing monomer are preferable because they tend to lower the dielectric constant.
  • the acrylic binder resin may be included, for example, in an amount of 10 to 90 parts by weight, preferably 20 to 80 parts by weight, more preferably 30 to 70 parts by weight, based on 100 parts by weight of the alkali-soluble resin in total, in this case Fairness, such as implementation and pattern straightness, is advantageous.
  • the content of the alkali-soluble resin is usually in the range of 1 to 50 parts by weight, preferably 3 to 40 parts by weight, and still more preferably 5 to 30 parts by weight based on 100 parts by weight of the total photosensitive resin composition.
  • the solubility in a developing solution is sufficient so that development residues are less likely to occur on the substrate of the non-pixel portion, and the film portion of the pixel portion of the exposed portion is less likely to occur during development. Since the omission of a part tends to be good, it is preferable.
  • the photosensitive resin composition according to the present invention includes scattering particles containing a metal oxide having an average particle diameter of 30 to 500 nm.
  • the metal oxide is Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, It may include one or more oxides selected from the group consisting of Ti, Sb, Sn, Zr, Nb, Ce, Ta, In and combinations thereof.
  • the metal oxide is Al 2 O 3 , SiO 2 , ZnO, ZrO 2 , BaTiO 3 , TiO 2 , Ta 2 O 5 , Ti 3 O 5 , ITO, IZO, ATO, ZnO It may include one or more selected from the group consisting of -Al, Nb 2 O 3 , SnO, MgO and combinations thereof, and a material surface-treated with a compound having an unsaturated bond such as acrylate may be used if necessary. .
  • the scattering particles limit the content in the average particle diameter and the total composition to maximize the light emission intensity of the color filter.
  • the "average particle diameter” may be a number average particle diameter, and can be obtained from an image observed by, for example, a field emission runner electron microscope (FE-SEM) or a transmission electron microscope (TEM). Specifically, several samples can be extracted from the observed images of FE-SEM or TEM, and the diameters of these samples can be measured to obtain arithmetic mean values.
  • FE-SEM field emission runner electron microscope
  • TEM transmission electron microscope
  • the metal oxide has an average particle diameter of 30 to 500 nm, preferably 30 to 300 nm.
  • the average particle diameter of the metal oxide satisfies the above range, the scattering effect is increased, and even though the photosensitive resin composition including the scattering particles does not include blue quantum dots, the blue oxide may serve as a blue pixel. Since the phenomenon which sinks in a composition can be prevented and the surface of a blue pattern layer of uniform quality can be obtained, it can adjust and use it suitably within the said range.
  • the scattering particles may be included in an amount of 0.1 to 50 parts by weight, preferably 0.5 to 30 parts by weight, more preferably 0.5 to 100 parts by weight of the total photosensitive resin composition. To 20 parts by weight.
  • the scattering particles are included in the above range, there is an advantage in that a color filter having excellent emission intensity can be manufactured.
  • the scattering particles when the scattering particles are included in the above range, it may be easy to ensure the emission intensity to be obtained, there is an advantage that can suppress the degradation of the composition stability.
  • the photosensitive resin composition of this invention may further contain a blue coloring agent. Since the photosensitive resin composition according to the present invention further includes a blue colorant, the light of the light source reflected by the scattering particles, which will be described later, may be prevented from being reflected back by external light such as sunlight, thereby realizing high quality images. There is this.
  • the blue colorant may specifically include a blue pigment, and the blue pigment may specifically include a compound classified as a pigment in the color index (published by The society of Dyers and Colourists). Although the pigment of the same color index (CI) number is mentioned, It is not necessarily limited to these.
  • the blue colorant is C.I. Pigment Blue 15: 3, 15: 4, 15: 6, 16, 21, 28, 60, 64, 76 and at least one blue pigment selected from the group consisting of a combination thereof; may include.
  • C.I. Pigment Blue 15: 3 C.I. Pigment Blue 15: 4, Pigment Blue 15: 6, C.I. It is preferable to include at least one member selected from the group consisting of Pigment Blue 16 in view of the effect of suppressing external light reflection and high color reproducibility.
  • the blue colorant may further include one or more selected from the group consisting of dyes and purple pigments.
  • the purple pigment is not limited thereto, for example, C.I. Pigment violet 1, 14, 19, 23, 29, 32, 33, 36, 37, 38, and combinations thereof, and at least one selected from the group consisting of C.I. It is preferable to use pigment violet 23 in view of realizing high color reproducibility even through a small colorant content.
  • the dye may include a compound classified as a dye in the color index (Published by The Society of Dyers and Colourists) or a known blue or purple dye described in a dye note (color dyed yarn).
  • C.I. Solvent blue 35, 36, 44, 45 and 70; And C.I. It is preferred to include at least one member selected from the group consisting of solvent violet 13.
  • the said dye can be used individually or in combination of 2 or more types, respectively.
  • the blue colorant may be included in 0.1 to 50 parts by weight, preferably 0.5 to 30 parts by weight, more preferably 1 to 20 parts by weight based on 100 parts by weight of the total photosensitive resin composition. have.
  • the content of the blue colorant is less than the above range, it may be difficult to secure the external light reflection suppression effect to be obtained, on the contrary, when the content exceeds the above range, the increase in luminescence intensity may be slightly lowered, and the problem of lowering the viscosity stability of the composition may occur. Since it arises, it uses suitably within the said range.
  • the photosensitive resin composition is a photopolymerizable compound; Photopolymerization initiator; solvent; And it may further include one or more selected from the group consisting of additives.
  • the photopolymerizable compound contained in the photosensitive resin composition of this invention is a compound which can superpose
  • monofunctional monomers include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, and N-vinyl py. A ralidone etc. are mentioned.
  • polyfunctional monomers include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, Dipentaerythritol hexa (meth) acrylate and the like.
  • bifunctional or higher polyfunctional monomers are preferably used.
  • the photopolymerizable compound is used in the range of 1 to 30 parts by weight, preferably 5 to 20 parts by weight based on 100 parts by weight of the total photosensitive resin composition.
  • the photopolymerizable compound satisfies the above range, the intensity and smoothness of the pixel portion tend to be good, which is preferable.
  • the said photoinitiator used by this invention contains an acetophenone type compound.
  • acetophenone type compound diethoxy acetophenone, 2-hydroxy-2- methyl-1- phenyl propane- 1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- ( 2-hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1 -One, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl [4- (1-methylvinyl) phenyl] propane-1 Oligomer of -one, etc. are mentioned, Preferably 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one etc. are mentioned.
  • Photoinitiators other than the said acetophenone series can be used in combination.
  • Photopolymerization initiators other than the acetophenone series include active radical generators, sensitizers, and acid generators that generate active radicals by irradiation with light.
  • a benzoin type compound As said active radical generating agent, a benzoin type compound, a benzophenone type compound, a thioxanthone type compound, a triazine type compound, etc. are mentioned, for example.
  • benzoin type compound benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoisobutyl ether, etc. are mentioned, for example.
  • benzophenone type compound for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'-tetra (t-butylperoxycarbonyl) benzophenone, 2,4, 6-trimethyl benzophenone, etc. are mentioned.
  • thioxanthone type compound 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro, for example 4-propoxy city oxanthone etc. are mentioned.
  • Examples of the active radical generator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2, -bis (o-chlorophenyl) -4,4 ', 5,5'-tetra Phenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene Compounds and the like can be used.
  • Examples of the acid generator include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate and 4-acetoxyphenyldimethylsulfonium p-toluenesulfo.
  • a triazine photopolymerization initiator is also used as an acid generator.
  • Content of the said photoinitiator used for the photosensitive resin composition which concerns on this invention is 0.1-40 weight part normally with respect to the total amount of the said alkali-soluble resin and the said photopolymerizable compound based on 100 weight part of solid content whole, Preferably it is 1-30. Parts by weight.
  • photoinitiator start adjuvant can be used.
  • the said photoinitiator adjuvant may be used in combination with the said photoinitiator, and is a compound used in order to accelerate superposition
  • An amine compound, an alkoxy anthracene type compound, a thioxanthone type compound etc. are mentioned as said photoinitiator starting adjuvant.
  • Examples of the amine compound include triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 2-dimethylamino benzoic acid.
  • Ethyl, 2-ethylhexyl 4-dimethylaminobenzoic acid, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzphenone (commonly known as Michler's ketone), 4,4'-bis (diethyl Amino) benzophenone, 4, 4'-bis (ethylmethylamino) benzophenone, etc. are mentioned, Among these, 4,4'-bis (diethylamino) benzophenone is preferable.
  • an alkoxy anthracene type compound 9,10- dimethoxy anthracene, 2-ethyl-9,10- dimethoxy anthracene, 9,10- diethoxy anthracene, 2-ethyl-9, 10- diethoxy anthracene, for example.
  • Etc. can be mentioned.
  • a thioxanthone type compound 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro- 4-propoxy city oxanthone etc. are mentioned.
  • photoinitiators (D) may be used alone or in combination of a plurality thereof.
  • a commercially available thing can be used as a photoinitiator starter,
  • brand name "EAB-F” manufactured by Hodogaya Chemical Co., Ltd.
  • EAB-F manufactured by Hodogaya Chemical Co., Ltd.
  • the amount thereof is usually 10 mol or less, preferably 0.01 to 5 mol, per mol of the photopolymerization initiator. If it exists in the said range, since the sensitivity of the said photosensitive resin composition becomes higher and the productivity of the color filter formed using this composition tends to improve, it is preferable.
  • the solvent contained in the photosensitive resin composition of this invention is not specifically limited, Various organic solvents used in the field of the photosensitive resin composition can be used. Specific examples thereof include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene.
  • ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene.
  • Diethylene glycol dialkyl ethers such as glycol dipropyl ether and diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, and propylene glycol Alkylene glycol alkyl ether acetates such as monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxy butyl acetate and methoxy pentyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene, mesitylene, methyl ethyl ketone, acetone , Ketones such as methyl amyl ketone, methyl isobutyl ketone, cyclohexanone, alcohols such as ethanol, propanol, butanol, hexanol, cycl
  • organic solvents having a boiling point of 100 ° C. to 200 ° C. in the coating properties and drying properties are preferable, and alkylene glycol alkyl ether acetates, ketones, and 3-ethoxy are more preferable.
  • Ester such as ethyl propionate and the methyl 3-methoxy propionate, is mentioned, More preferably, propylene glycol monomethyl ether acetate, a propylene glycol monoethyl ether acetate, cyclohexanone, 3-ethoxy propionate, 3- Methyl methoxy propionate etc. are mentioned.
  • the said solvent can be used individually or in mixture of 2 or more types, respectively.
  • Content of the said solvent in the photosensitive resin composition of this invention is 60-90 weight part normally with respect to 100 weight part of whole said photosensitive resin composition containing it, Preferably it is 70-85 weight part.
  • a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, or the like. It is preferable because there is.
  • the photosensitive resin composition of this invention is a filler, another high molecular compound, a pigment dispersant as needed. It is also possible to use additives, such as an adhesion promoter, an antioxidant, a ultraviolet absorber, and an aggregation inhibitor.
  • the filler include glass, silica, alumina and the like.
  • the other polymer compound include curable resins such as epoxy resins and maleimide resins, thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ethers, polyfluoroalkyl acrylates, polyesters, polyurethanes, and the like.
  • curable resins such as epoxy resins and maleimide resins
  • thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ethers, polyfluoroalkyl acrylates, polyesters, polyurethanes, and the like.
  • surfactants can be used as the pigment dispersant, and examples thereof include surfactants such as silicone, fluorine, ester, cationic, anionic, nonionic and amphoteric. These can be used individually or in combination of 2 types or more, respectively.
  • polyoxyethylene alkyl ether for example, polyoxyethylene alkyl ether, polyoxyethylene alkyl peer ether, polyethyleneglycol diester, sorbitan fatty acid ester, fatty acid modified polyester, tertiary amine modified polyurethane , Polyethylenimine, etc.
  • trade names include KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by Tochem Products), MEGAFAC (manufactured by Dainippon Ink Chemical Industries, Ltd.), Florard (manufactured by Sumitomo 3M), Asahi guard, Surflon (above, manufactured by Asahi Glass), Sol SLSPERSE (made by Genka Corporation), EFKA (made by EFKA Chemicals), PB 821 (made by Ajinomoto Co., Ltd.), etc.
  • adhesion promoter for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminoprotriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2 -(3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyl Trimethoxysilane etc.
  • antioxidant examples include 2,2'-thiobis (4-methyl-6-t-butylphenol), 2,6-di-t-butyl-4-methylphenol, and the like.
  • ultraviolet absorber examples include 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzothiazole, alkoxybenzophenone and the like.
  • aggregation inhibitor examples include sodium polyacrylate and the like.
  • the additive may be used by those skilled in the art in addition to an appropriate amount within the scope that does not impair the effects of the present invention.
  • the method of preparing the photosensitive resin composition is not limited thereto, and for example, the photosensitive resin composition may be prepared by the following method.
  • the scattering particles are mixed with the solvent in advance and dispersed using a bead mill or the like until the average particle diameter becomes 30 to 500 nm.
  • a dispersing agent can be further used as needed, and some or all of alkali-soluble resin may be mix
  • the remainder of alkali-soluble resin, a photopolymerizable compound, a photoinitiator, the other components used as needed, and the additional solvent as needed are further added to the obtained dispersion liquid (henceforth a mill base) so that it may become a predetermined concentration. To obtain the desired photosensitive resin composition.
  • Another aspect of the present invention relates to a self-luminous pixel-containing color filter comprising a blue pattern layer containing a cured product of the photosensitive resin composition described above.
  • the photosensitive resin composition may be a photosensitive resin composition for forming a blue pattern layer.
  • the said photosensitive resin composition does not contain a quantum dot.
  • the color filter according to the present invention is made of the photosensitive resin composition described above instead of blue quantum dots, the manufacturing cost can be lowered, and there is an advantage of having an excellent viewing angle.
  • the color filter includes a substrate and a blue pattern layer formed on the substrate.
  • the substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited.
  • the substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
  • the blue pattern layer is a layer including the photosensitive resin composition of the present invention, and may be a layer formed by applying the photosensitive resin composition and exposing, developing, and thermosetting in a predetermined pattern, and the pattern layer is commonly known in the art. It can form by performing a method.
  • the color filter may further include one or more selected from the group consisting of a red pattern layer and a green pattern layer.
  • the color filter according to the present invention may include the above-described blue pattern layer, and may further include a self-luminous pixel further comprising at least one selected from the group consisting of a red pattern layer and a green pattern layer.
  • the red pattern layer or the green pattern layer may include quantum dots and scattering particles.
  • the color filter according to the present invention may include a red pattern layer including a red quantum dot or a green pattern layer including a green quantum dot, and the red pattern layer or the green pattern layer may include scattering particles.
  • the red pattern layer or the green pattern layer may emit red light or blue light, respectively, by a light source emitting blue light, which will be described later.
  • the scattering particles may include a metal oxide having an average particle diameter of 30 to 500 nm, and the content of the scattering particles and the metal oxide may be applied to the content of the scattering particles and the metal oxide included in the photosensitive resin composition according to the present invention. Can be.
  • the shape, configuration, and content of the quantum dots included in the red pattern layer or the green pattern layer are not limited, and quantum dots commonly used in the art may be applied.
  • the color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
  • the above-described color filter And a light source emitting blue light.
  • the image display apparatus includes a color filter including a blue pattern layer including a cured product of the photosensitive resin composition described above, and a light source emitting blue light.
  • the color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
  • the image display device includes a color filter including a blue pattern layer and the light source according to the present invention
  • a color filter including a blue pattern layer and the light source according to the present invention there is an advantage of having excellent light emission intensity or viewing angle.
  • the blue pattern layer included in the color filter according to the present invention does not include blue quantum dots, there is an advantage in that an image display device having low manufacturing cost can be manufactured.
  • a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping lot, and a nitrogen introduction tube was prepared, and as a monomer dropping lot, 74.8 g (0.20 mole) of benzylmaleimide, 43.2 g (0.30 mole) of acrylic acid, and vinyltoluene 118.0 g (0.50 mol), 4 g of t-butylperoxy-2-ethylhexanoate and 40 g of propylene glycol monomethyl ether acetate (PGMEA) were added thereto, followed by stirring and mixing.
  • PGMEA propylene glycol monomethyl ether acetate
  • n-dodecanethiol 6g and PGMEA24g were added, and the thing mixed with stirring was prepared. Thereafter, 395 g of PGMEA was introduced into the flask, and the atmosphere in the flask was changed to nitrogen from air, followed by stirring, thereby raising the temperature of the flask to 90 ° C. Subsequently, dropping of the monomer and the chain transfer agent was started from the dropping lot. The dropwise addition was performed for 2 h while maintaining 90 ° C., and after 1 h, the temperature was raised to 110 ° C. and maintained for 3 h.
  • the temperature was melt
  • the temperature was heated to 120 ° C. to completely dissolve it.
  • the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8).
  • the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula (2).
  • HLC-8120GPC manufactured by Tosoh Corporation
  • Photopolymerizable Compound (C) dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
  • Photopolymerizable Compound (C) dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
  • Photopolymerizable Compound (C) dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
  • Photopolymerizable Compound (C) dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
  • Photopolymerizable Compound (C) dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
  • Photopolymerizable Compound (C) dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
  • Photopolymerizable Compound (C) dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
  • the color filter was manufactured using the photosensitive resin composition manufactured according to the said Example and the comparative example. That is, each of the photosensitive resin composition was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film.
  • test photomask having a transmissive pattern of horizontal ⁇ vertical 20 mm ⁇ 20 mm squares and a line / space pattern of 1 to 100 ⁇ m was placed on the thin film, and ultraviolet rays were irradiated with a distance of 100 ⁇ m from the test photomask.
  • the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmospheric atmosphere using an ultrahigh pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • an ultrahigh pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • the thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5.
  • the thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern.
  • the film thickness of the color pattern prepared above was 5.0 ⁇ m.
  • Sensitivity The degree of formation of a flawless thin film of the sensitivity mask fine pattern (1 to 60) (the lower the value, the better the sensitivity).
  • Pattern Stability Pattern error after exposure of pattern mask at low exposure amount (20-100mJ)
  • Solvent resistance evaluation The color filter prepared above is immersed in solvent NMP (1-methyl- 2-pyrrolidinone) for 30 minutes, and the color change before and after evaluation is calculated and compared.
  • the equation used at this time is calculated by the following equation (1) representing the color change in the three-dimensional colorimeter defined by L * , a * , b * .
  • Heat resistance evaluation The color filter manufactured by the above method was calculated by Equation (1) to measure the color change before and after heating after heating for 2 hours in a heating oven at 230 °C.
  • the size of the pattern which was obtained through a line / space pattern mask designed to 100 ⁇ m among color filters manufactured using the photosensitive resins according to the above examples and comparative examples, was measured by OM equipment (ECLIPSE LV100POL Nikon). . The measurement results are shown in Table 10.
  • a negative value means a threshold value that causes a process defect.
  • Example 1 Developing speed Sensitivity Pattern stability Fine pattern Heat resistance Solvent resistance
  • Example 2 29 9 ⁇ 12 ⁇ ⁇ Example 3 28 9 ⁇ 11 ⁇ ⁇ Example 4
  • 30 8 ⁇ 6 ⁇ ⁇ Example 5 30 12 ⁇ 2 ⁇ ⁇ Example 6 27 14 ⁇ 12 ⁇ ⁇ Example 7 23 12 ⁇ 10 ⁇ ⁇ Example 8 19 11 ⁇ 13 ⁇ ⁇ Example 9 25 9 ⁇ 8 ⁇ ⁇ Example 10 21 12 ⁇ 11 ⁇ ⁇ Example 11 28 11 ⁇ 9 ⁇ ⁇ Example 12 29 8 ⁇ 10 ⁇ ⁇ Example 13 25 12 ⁇ 8 ⁇ ⁇ Example 14 23 9 ⁇ 6 ⁇ ⁇ Example 15 21 13 ⁇ 10 ⁇ ⁇ Example 16 16 14 ⁇ 9 ⁇ ⁇ Example 17 28 9 ⁇ 8 ⁇ ⁇ Example 18 27 11 ⁇ 7 ⁇ ⁇ Example 19 30 10 ⁇ 6 ⁇ ⁇ Example 20 28 11 ⁇ 7 ⁇ ⁇ Example 21 27 13 ⁇ 10 ⁇ ⁇ Example 22 28 10 ⁇ 14 ⁇ 14 ⁇
  • the optical intensity according to the viewing angle under the transmissive conditions was formed on the portion formed in the pattern of 20 ⁇ 20 mm square among the color filters manufactured using the photosensitive resin compositions prepared according to the above Examples and Comparative Examples (GC-5000L, Nippon). Denshoku) was used, and the diffusion rate was calculated using the following equation (2).
  • the measurement results are shown in Table 11.
  • I means light intensity measured at the viewing angle.
  • Spectrophotometer CM- was used to measure the light reflectance under light-transmitting conditions on the portion formed in the pattern of 20 ⁇ 20 mm square in the color filter manufactured using the photosensitive resin composition prepared according to Examples 22 to 46 and Comparative Examples 5 to 10. It was measured using 3600A (Konica Minolta Co., Ltd.) and the measurement results are shown in Table 8.
  • Example 1 28500 20.5 - Example 2 34700 43.5 - Example 3 31800 78.3 - Example 4 29800 78.1 - Example 5 28200 84.3 - Example 6 31300 53.5 - Example 7 26500 78.9 - Example 8 23900 48.6 - Example 9 36500 48.6 - Example 10 28500 82.1 - Example 11 34800 33.6 - Example 12 30800 78.1 - Example 13 27800 82.1 - Example 14 34200 51.3 - Example 15 31300 72.6 - Example 16 26500 74.9 - Example 17 21900 43.5 - Example 18 36500 49.7 - Example 19 25900 80.7 - Example 20 38600 42.1 - Example 21 271960 44.8 - Example 22 28500 20.5 3.1 Example 23 34700 43.5 3.8 Example 24 31800 78.3 2.8 Example 25 29800 78.1 2.6 Example 26 28200 84.3 2.7 Example 27 31300 53.5 3.6 Example 28 26500 78.9 3.8 Example 29 23900 48.6
  • the scattering particles of the metal oxide was found that the viewing angle is improved compared to the comparative example in the case of using the scattering particles of the metal oxide 30 to 500 nm average particle diameter.

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Abstract

A photosensitive resin composition according to the present invention comprises: an alkali soluble resin; and scattering particles having an average particle diameter of 30-500nm and comprising metal oxide. The alkali soluble resin comprises one or more selected from a group consisting of a first cardo-based binder resin which comprises a compound represented by chemical formula (1) and is polymerized and a second cardo-based binder resin which comprises a compound represented by chemical formula (2) and is polymerized. The photosensitive resin composition according to the present invention can provide excellent color reproduction properties and high luminous efficiency and can produce a high-quality image.

Description

감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치Photosensitive resin composition, color filter and image display device manufactured using the same
본 발명은 특정 산란입자 및 알칼리 가용성 수지를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치에 관한 것이다.The present invention relates to a photosensitive resin composition comprising specific scattering particles and an alkali-soluble resin, a color filter and an image display device manufactured using the same.
컬러필터는 백색광에서 적색, 녹색 및 청색의 3가지 색을 추출하여 미세한 화소단위로 가능하게 하는 박막 필름형 광학부품으로서, 한 화소의 크기가 수십에서 수백 마이크로미터 정도이다. 이러한 컬러필터는 각각의 화소 사이의 경계부분을 차광하기 위하여 투명 기판 상에 정해진 패턴으로 형성된 블랙 매트릭스 층 및 각각의 화소를 형성하기 위해 복수의 색(통상적으로 적색(R), 녹색(G) 및 청색(B))의 3원색을 정해진 순서로 배열한 화소부가 차례로 적층된 구조를 취하고 있다.The color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units. The size of one pixel is about tens to hundreds of micrometers. Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
최근에는 컬러필터를 구현하는 방법 중의 하나로서, 안료 분산형의 감광성 수지를 이용한 안료 분산법이 적용되고 있으나, 광원에서 조사된 광이 컬러필터를 투과하는 과정에서 광의 일부가 컬러필터에 흡수되어 광 효율이 저하되고, 또한 색 필터에 포함되어 있는 안료의 특성으로 인하여 색재현이 저하되는 문제점이 발생하고 있다.Recently, as one of the methods of implementing a color filter, a pigment dispersion method using a pigment-dispersible photosensitive resin has been applied, but a part of the light is absorbed by the color filter while the light emitted from the light source passes through the color filter. The problem is that the efficiency is lowered and the color reproduction is lowered due to the characteristics of the pigment contained in the color filter.
특히, 컬러필터가 각종 화상표시장치를 비롯한 다양한 분야에 사용됨에 따라 우수한 패턴 특성뿐만 아니라 높은 색재현율과 함께 우수한 고휘도, 고명암비와 같은 성능이 요구되고 있는 바, 이러한 문제를 해결하기 위하여, 양자점을 포함하는 자발광 감광성 수지 조성물을 이용한 컬러필터 제조방법이 제안되었다.In particular, as color filters are used in various fields, including various image display devices, not only excellent pattern characteristics but also high color reproducibility and excellent performance such as high brightness and high contrast ratio are required. A color filter manufacturing method using a self-luminous photosensitive resin composition is proposed.
대한민국 공개특허 제2013-0000506호는 표시 장치에 관한 것으로서, 광의 파장을 변환시키는 다수 개의 파장 변환 입자들; 및 상기 광에서 소정의 파장 대의 광을 흡수하는 다수 개의 컬러 필터 입자들을 포함하는 색 변환부를 포함하는 표시장치에 관한 내용을 개시하고 있다.Republic of Korea Patent Publication No. 2013-0000506 relates to a display device, a plurality of wavelength conversion particles for converting the wavelength of light; And a color converter including a plurality of color filter particles that absorb light having a predetermined wavelength in the light.
그러나, 양자점을 포함하는 컬러필터의 경우 양자점의 효율, 특히 청색 양자점의 효율이 떨어짐에 따라 컬러필터의 성능이 다소 저하될 수 있으며, 청색 양자점의 경우 고가이기 때문에 전체적인 제조비용이 상승하는 문제가 있다.However, in the case of a color filter including a quantum dot, the efficiency of the color filter may be somewhat degraded as the efficiency of the quantum dot, in particular, the blue quantum dot is reduced, and in the case of the blue quantum dot, there is a problem that the overall manufacturing cost increases. .
그러므로, 청색 화소의 효율의 저하를 방지하고, 제조 단가를 낮출 수 있는 감광성 수지 조성물의 개발이 요구되고 있는 실정이다.Therefore, development of the photosensitive resin composition which can prevent the fall of the efficiency of a blue pixel, and can lower manufacturing cost is calculated | required.
[선행기술문헌][Preceding technical literature]
[특허문헌][Patent Documents]
(특허문헌 1) 대한민국 공개특허 제2013-0000506호 (2013.01.03.)(Patent Document 1) Republic of Korea Patent Publication No. 2013-0000506 (2013.01.03.)
본 발명은 청색 화소의 효율 저하를 방지하고, 제조 단가를 낮출 수 있는 감광성 수지 조성물을 제공하는 것을 목적으로 한다.An object of this invention is to provide the photosensitive resin composition which can prevent the fall of the efficiency of a blue pixel, and can lower manufacturing cost.
또한, 본 발명은 전술한 감광성 수지 조성물을 이용하여 제조된 청색 화소층을 포함하는 컬러필터 및 화상표시장치를 제공하고자 한다. 구체적으로, 본 발명은 화질, 시야각, 내구성, 신뢰성 등이 우수한 컬러필터 및 화상표시장치를 제공하고자 한다.In addition, the present invention is to provide a color filter and an image display device including a blue pixel layer manufactured using the photosensitive resin composition described above. Specifically, the present invention is to provide a color filter and an image display device excellent in image quality, viewing angle, durability, reliability.
상기 목적을 달성하기 위한 본 발명에 따른 감광성 수지 조성물은 알칼리 가용성 수지; 및 평균입경 30 내지 500nm의 금속산화물을 포함하는 산란입자;를 포함하고, 상기 알칼리 가용성 수지는 하기 화학식 1로 표시되는 화합물을 포함하여 중합되는 제1 카도계 바인더 수지 및 하기 화학식 2로 표시되는 화합물을 포함하여 중합되는 제2 카도계 바인더 수지로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것을 특징으로 한다.The photosensitive resin composition according to the present invention for achieving the above object is an alkali-soluble resin; And scattering particles comprising a metal oxide having an average particle diameter of 30 to 500 nm; wherein the alkali-soluble resin comprises a first cardo-based binder resin and a compound represented by the following Chemical Formula 2, including the compound represented by the following Chemical Formula 1. It characterized in that it comprises at least one selected from the group consisting of a second cardo-based binder resin to be polymerized.
[화학식 1][Formula 1]
Figure PCTKR2017013588-appb-I000001
Figure PCTKR2017013588-appb-I000001
[화학식 2][Formula 2]
Figure PCTKR2017013588-appb-I000002
Figure PCTKR2017013588-appb-I000002
화학식 1에서, In Formula 1,
R1 및 R2는 각각 독립적으로
Figure PCTKR2017013588-appb-I000003
R1 and R2 are each independently
Figure PCTKR2017013588-appb-I000003
X는 수소, 탄소수 1 내지 5의 알킬기 또는 수산기이며,X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group,
R3는 수소 또는 탄소수 1 내지 5의 알킬기이고,R3 is hydrogen or an alkyl group having 1 to 5 carbon atoms,
화학식 2에서, In Formula 2,
R4 및 R5는 각각 독립적으로
Figure PCTKR2017013588-appb-I000004
R4 and R5 are each independently
Figure PCTKR2017013588-appb-I000004
X는 수소, 탄소수 1 내지 5의 알킬기 또는 수산기이며,X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group,
R6은 수소 또는 탄소수 1 내지 5의 알킬기이다.R6 is hydrogen or an alkyl group having 1 to 5 carbon atoms.
또한, 본 발명은 전술한 감광성 수지 조성물로 제조된 컬러 필터 및 이를 포함하는 화상표시장치를 제공한다.In addition, the present invention provides a color filter made of the photosensitive resin composition described above and an image display device including the same.
본 발명의 감광성 수지 조성물은 우수한 색재현 특성 및 광효율의 부여가 가능한 이점이 있다.The photosensitive resin composition of this invention has the advantage that provision of the outstanding color reproduction characteristic and light efficiency is possible.
또한, 본 발명의 감광성 수지 조성물로 제조된 컬러 필터 및 이를 포함하는 화상표시장치는 고품질의 화질, 우수한 시야각, 높은 내구성, 신뢰성의 확보가 가능하며, 제조 단가의 저감이 가능한 이점이 있다. In addition, the color filter made of the photosensitive resin composition of the present invention and an image display device including the same can ensure high quality image quality, excellent viewing angle, high durability, and reliability, and can reduce manufacturing cost.
이하, 본 발명에 대하여 더욱 상세히 설명한다.Hereinafter, the present invention will be described in more detail.
본 발명에서 어떤 부재가 다른 부재 "상에" 위치하고 있다고 할 때, 이는 어떤 부재가 다른 부재에 접해 있는 경우뿐 아니라 두 부재 사이에 또 다른 부재가 존재하는 경우도 포함한다.In the present invention, when a member is located "on" another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.
본 발명에서 어떤 부분이 어떤 구성요소를 "포함" 한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.In the present invention, when a part "includes" a certain component, this means that it may further include other components, without excluding the other components unless otherwise stated.
<감광성 수지 조성물><Photosensitive resin composition>
본 발명의 한 양태는, 알칼리 가용성 수지; 및 평균입경 30 내지 500nm의 금속산화물을 포함하는 산란입자;를 포함하고, 상기 알칼리 가용성 수지는 하기 화학식 1로 표시되는 화합물을 포함하여 중합되는 제1 카도계 바인더 수지 및 하기 화학식 2로 표시되는 화합물을 포함하여 중합되는 제2 카도계 바인더 수지로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 감광성 수지 조성물에 관한 것이다.One embodiment of the present invention, alkali-soluble resin; And scattering particles comprising a metal oxide having an average particle diameter of 30 to 500 nm; wherein the alkali-soluble resin comprises a first cardo-based binder resin and a compound represented by the following Chemical Formula 2, including the compound represented by the following Chemical Formula 1. It relates to a photosensitive resin composition comprising at least one selected from the group consisting of a second cardo-based binder resin to be polymerized, including.
[화학식 1][Formula 1]
Figure PCTKR2017013588-appb-I000005
Figure PCTKR2017013588-appb-I000005
[화학식 2][Formula 2]
Figure PCTKR2017013588-appb-I000006
Figure PCTKR2017013588-appb-I000006
화학식 1에서, In Formula 1,
R1 및 R2는 각각 독립적으로
Figure PCTKR2017013588-appb-I000007
R1 and R2 are each independently
Figure PCTKR2017013588-appb-I000007
X는 수소, 탄소수 1 내지 5의 알킬기 또는 수산기이며,X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group,
R3는 수소 또는 탄소수 1 내지 5의 알킬기이고,R3 is hydrogen or an alkyl group having 1 to 5 carbon atoms,
화학식 2에서, In Formula 2,
R4 및 R5는 각각 독립적으로
Figure PCTKR2017013588-appb-I000008
R4 and R5 are each independently
Figure PCTKR2017013588-appb-I000008
X는 수소, 탄소수 1 내지 5의 알킬기 또는 수산기이며,X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group,
R6은 수소 또는 탄소수 1 내지 5의 알킬기이다.R6 is hydrogen or an alkyl group having 1 to 5 carbon atoms.
알칼리 가용성 수지Alkali soluble resin
본 발명의 감광성 수지 조성물은 하기 화학식 1로 표시되는 화합물을 포함하여 중합되는 제1 카도계 바인더 수지 및 하기 화학식 2로 표시되는 화합물을 포함하여 중합되는 제2 카도계 바인더 수지로 이루어진 군으로부터 선택되는 하나 이상을 포함한다.The photosensitive resin composition of the present invention is selected from the group consisting of a first cardo-based binder resin that is polymerized including a compound represented by the following Formula 1 and a second cardo-based binder resin that is polymerized including a compound represented by the following Formula 2 It includes one or more.
[화학식 1][Formula 1]
Figure PCTKR2017013588-appb-I000009
Figure PCTKR2017013588-appb-I000009
[화학식 2][Formula 2]
Figure PCTKR2017013588-appb-I000010
Figure PCTKR2017013588-appb-I000010
화학식 1에서, In Formula 1,
R1 및 R2는 각각 독립적으로
Figure PCTKR2017013588-appb-I000011
R1 and R2 are each independently
Figure PCTKR2017013588-appb-I000011
X는 수소, 탄소수 1 내지 5의 알킬기 또는 수산기이며,X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group,
R3는 수소 또는 탄소수 1 내지 5의 알킬기이고,R3 is hydrogen or an alkyl group having 1 to 5 carbon atoms,
화학식 2에서, In Formula 2,
R4 및 R5는 각각 독립적으로
Figure PCTKR2017013588-appb-I000012
R4 and R5 are each independently
Figure PCTKR2017013588-appb-I000012
X는 수소, 탄소수 1 내지 5의 알킬기 또는 수산기이며,X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group,
R6은 수소 또는 탄소수 1 내지 5의 알킬기이다.R6 is hydrogen or an alkyl group having 1 to 5 carbon atoms.
상기 알칼리 가용성 수지는 광이나 열의 작용에 의한 반응성 및 알칼리 용해성을 갖는다. 구체적으로, 상기 알칼리 가용성 수지는 산란입자에 대한 결합제 수지로서 작용하고, 컬러필터의 제조를 위한 현상 단계에서 사용되는 알칼리성 현상액에 용해 가능한 것일 수 있다.The alkali-soluble resin has reactivity and alkali solubility by the action of light or heat. Specifically, the alkali-soluble resin may act as a binder resin for scattering particles, and may be soluble in an alkaline developer used in a developing step for manufacturing a color filter.
본 발명에 따른 알칼리 가용성 수지는 하기 화학식 1로 표시되는 화합물을 포함하여 중합되는 제1 카도계 바인더 수지를 포함함으로써, 기판과의 접착력을 향상시키고 현상 밀착력이 우수하여 고해상도를 위한 미세 패턴을 구현할 수 있는 이점이 있다.The alkali-soluble resin according to the present invention includes the first cardo-based binder resin polymerized by including the compound represented by the following Chemical Formula 1, thereby improving adhesion to the substrate and excellent development adhesion, thereby realizing a fine pattern for high resolution. There is an advantage to that.
[화학식 1][Formula 1]
Figure PCTKR2017013588-appb-I000013
Figure PCTKR2017013588-appb-I000013
식중에서, R1 및 R2는 각각 독립적으로
Figure PCTKR2017013588-appb-I000014
Wherein R1 and R2 are each independently
Figure PCTKR2017013588-appb-I000014
X는 수소 원자, 탄소수 1 내지 5의 알킬기 또는 수산기이고, R3는 수소 원자 또는 탄소수 1 내지 5의 알킬기이며, 바람직하게는 X는 수산기이고, R3는 수소 원자 또는 메틸기인 것이 좋다.X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group, R 3 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably X is a hydroxyl group, and R 3 is a hydrogen atom or a methyl group.
상기 화학식 1로 표시되는 화합물은 하기 화학식 5을 이용하여 합성될 수 있으며, 여기에 산무수물 또는 산2무수물 화합물을 더 반응시킴으로써 알칼리 가용성을 가지는 상기 제1 카도계 바인더 수지를 얻을 수 있다.The compound represented by Chemical Formula 1 may be synthesized using Chemical Formula 5 below, and the first cardo-based binder resin having alkali solubility may be obtained by further reacting an acid anhydride or an acid 2 anhydride compound.
[화학식 5][Formula 5]
Figure PCTKR2017013588-appb-I000015
Figure PCTKR2017013588-appb-I000015
예컨대, 상기 화학식 5로 표시되는 화합물을 에피클로로히드린, t-부틸암모늄 브로마이드와 혼합한 뒤 용매와 함께 가열하여 반응시킨 뒤 알칼리 수용액을 적하하고, 침전 및 분리하여 에폭시 화합물을 합성한 뒤, 합성된 에폭시 화합물을 t-부틸암모늄 브로마이드, 아크릴산, 페놀계 화합물 및 용매와 함께 혼합하여 반응시킴으로서 얻은 화합물과 산무수화합물로서 무수말레산, 무수숙신산, 무수이타콘산, 무수프탈산, 무수테트라히드로프탈산, 무수헥사히드로프탈산, 무수메틸엔도메틸렌테트라히드로프탈산, 무수클로렌드산, 무수메틸테트라히드로프탈산으로 이루어진 군 또는 산2무수물로서 무수피로멜리트산, 벤조페논테트라카르복시산2무수물, 바이페닐테트라카르복시산2무수물, 바이페닐에테르테트라카르복시산2무수물 등의 방향족다가카르복시산무수물로 이루어진 군에서 선택된 적어도 1종과 반응을 시켜 제조할 수 있으나, 이에 한정되지는 않는다.For example, the compound represented by Chemical Formula 5 is mixed with epichlorohydrin and t-butylammonium bromide, heated and reacted with a solvent, followed by dropwise addition of an aqueous alkali solution, precipitation and separation to synthesize an epoxy compound, and synthesis. The resulting epoxy compound by reacting it with t-butylammonium bromide, acrylic acid, phenolic compound and solvent, and an acid anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, anhydride. Group consisting of hexahydrophthalic acid, methyl endomethylenetetrahydrophthalic anhydride, chloric anhydride, methyltetrahydrophthalic anhydride or acid anhydride, pyromellitic anhydride, benzophenonetetracarboxylic acid anhydride, biphenyltetracarboxylic acid anhydride, biphenyl Aromatic polyhydric acids such as phenyl ether tetracarboxylic acid dianhydride It can be prepared by reacting at least one member selected from the group consisting of acids anhydride, but are not limited to this.
또한, 본 발명에 따른 알칼리 가용성 바인더 수지는 하기 화학식 2의 화합물을 포함하여 중합한 제2 카도계 바인더 수지를 포함함으로써, 기판과의 접착력을 향상시키고, 현상 밀착력이 우수하여 고해상도를 위한 미세 패턴을 구현할 수 있게 한다.In addition, the alkali-soluble binder resin according to the present invention includes a second cardo-based binder resin polymerized by including the compound of the formula (2), thereby improving the adhesion to the substrate, excellent development adhesion and fine patterns for high resolution Enable to implement
[화학식 2][Formula 2]
Figure PCTKR2017013588-appb-I000016
Figure PCTKR2017013588-appb-I000016
식 중에서, R4 및 R5는 각각 독립적으로,
Figure PCTKR2017013588-appb-I000017
In formula, R4 and R5 are each independently,
Figure PCTKR2017013588-appb-I000017
X는 수소 원자, 탄소수 1 내지 5의 알킬기 또는 수산기이고, R6은 수소 원자 또는 탄소수 1 내지 5의 알킬기이며, 바람직하게는 X는 수산기이고, R6은 수소 원자 또는 메틸기인 것이 좋다.X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group, R6 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably X is a hydroxyl group, and R6 is a hydrogen atom or a methyl group.
상기 화학식 2로 표시되는 화합물은 하기 화학식 6을 이용하여 합성될 수 있으며, 여기에 산무수물 또는 산2무수물 화합물을 더 반응시킴으로써 알칼리 가용성을 가지는 상기 제2 카도계 바인더 수지를 얻을 수 있다.The compound represented by Chemical Formula 2 may be synthesized using the following Chemical Formula 6, and the second cardo-based binder resin having alkali solubility may be obtained by further reacting an acid anhydride or an acid 2 anhydride compound.
[화학식 6][Formula 6]
Figure PCTKR2017013588-appb-I000018
Figure PCTKR2017013588-appb-I000018
예컨대, 상기 화학식 6으로 표시되는 화합물을 에피클로로히드린, t-부틸암모늄 브로마이드, 용매와 혼합한 뒤 함께 가열하여 반응시킨 뒤 알칼리 수용액을 적하하고, 침전 및 분리하여 에폭시 화합물을 합성한 뒤, 합성된 에폭시 화합물을 t-부틸암모늄 브로마이드, 아크릴산, 페놀계 화합물 및 용매와 함께 혼합하여 반응시킴으로서 얻은 화합물과 산무수화합물로서 무수말레산, 무수숙신산, 무수이타콘산, 무수프탈산, 무수테트라히드로프탈산, 무수헥사히드로프탈산, 무수메틸엔도메틸렌테트라히드로프탈산, 무수클로렌드산, 무수메틸테트라히드로프탈산으로 이루어진 군 또는 산2무수물로서 무수피로멜리트산, 벤조페논테트라카르복시산2무수물, 바이페닐테트라카르복시산2무수물, 바이페닐에테르테트라카르복시산2무수물 등의 방향족다가카르복시산무수물로 이루어진 군에서 선택된 적어도 1종과 반응을 시켜 제조할 수 있으나, 이에 한정되지는 않는다.For example, the compound represented by Chemical Formula 6 is mixed with epichlorohydrin, t-butylammonium bromide and a solvent, and then reacted by heating together, an aqueous alkali solution is added dropwise, precipitated and separated to synthesize an epoxy compound, and then synthesized. The resulting epoxy compound by reacting it with t-butylammonium bromide, acrylic acid, phenolic compound and solvent, and an acid anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, anhydride. Group consisting of hexahydrophthalic acid, methyl endomethylenetetrahydrophthalic anhydride, chloric anhydride, methyltetrahydrophthalic anhydride, or an acid dianhydride, pyromellitic anhydride, benzophenone tetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, biphenyl Aromatic polyhydric acids such as phenyl ether tetracarboxylic acid dianhydride It can be prepared by reacting at least one member selected from the group consisting of acids anhydride, but are not limited to this.
상기 화학식 5 및 6 중에서 수산기(-OH)의 위치는 특별히 한정되지 않으며, 예를 들면, 2-위, 3-위 및 4-위일 수 있으며, 바람직하게는 4-위인 것이 좋다(위치 선정은 잔텐과 결합된 탄소를 1-위로 하여 결정한다).The position of the hydroxyl group (-OH) in the above formulas (5) and (6) is not particularly limited, and for example, may be 2-position, 3-position, and 4-position, and preferably 4-position (positioning is xanthene). And determine the carbon bonded to 1-top).
결과적으로, 화학식 5 또는 6의 수산기(-OH)의 위치에 따라, 상기 화학식 1의 R1 및 R2의 치환 위치 또는 상기 화학식 2의 R4 및 R5의 치환 위치가 결정될 수 있다.As a result, according to the position of the hydroxyl group (-OH) of the formula (5) or 6, the substitution position of R1 and R2 of the formula (1) or the substitution position of R4 and R5 of the formula (2) can be determined.
상기 화학식 1로 표시되는 화합물의 보다 구체적인 예를 들면, 9,9-비스(3-시나믹 디에스테르)플루오렌(9,9-bis(3-cinnamic diester)fluorene), 9,9-비스(3-시나모일, 4-하이드록시페닐)플루오렌(9,9-bis(3-cinnamoyl, 4-hydroxyphenyl)fluorene), 9,9-비스(글리시딜 메타크릴레이트 에테르)플루오렌(9,9-bis(glycidyl methacrylate ether)fluorene), 9,9-비스(3,4-디하이드록시페닐)플루오렌 디시나믹 에스테르(9,9-bis(3,4-dihydroxyphenyl)fluorene dicinnamic ester), 3,6-디글리시딜 메타크릴레이트 에테르 스피로(플루오렌-9,9-잔텐)(3,6-diglycidyl methacrylate ether spiro(fluorene-9,9-xanthene)), 9,9-비스(3-알릴, 4-하이드록시페닐플루오렌)(9,9-bis(3-allyl, 4-hydroxyphenylfluorene), 9,9-비스(4-알릴록시페닐)플루오렌(9,9-bis(4-allyloxyphenyl)fluorene), 9,9-비스(3,4-메타크릴릭 디에스테르)플루오렌(9,9-bis(3,4-methacrylic diester)fluorene)으로 이루어진 군에서 선택된 적어도 1종일 수 있으며, 이에 한정되는 것은 아니다.More specific examples of the compound represented by Formula 1 include 9,9-bis (3-cinnamic diester) fluorene, 9,9-bis ( 3-cinnamoyl, 4-hydroxyphenyl) fluorene (9,9-bis (3-cinnamoyl, 4-hydroxyphenyl) fluorene), 9,9-bis (glycidyl methacrylate ether) fluorene (9, 9-bis (glycidyl methacrylate ether) fluorene, 9,9-bis (3,4-dihydroxyphenyl) fluorene disinnamic ester, 3,4-dihydroxyphenyl) fluorene dicinnamic ester , 6-diglycidyl methacrylate ether spiro (fluorene-9,9-xanthene) (3,6-diglycidyl methacrylate ether spiro (fluorene-9,9-xanthene)), 9,9-bis (3- Allyl, 4-hydroxyphenylfluorene) (9,9-bis (3-allyl, 4-hydroxyphenylfluorene), 9,9-bis (4-allyloxyphenyl) fluorene (9,9-bis (4-allyloxyphenyl ) fluorene), 9,9-bis (3,4-methacrylic diester) fluorene (9,9-bis (3,4-methacrylic diester) fluorene) It may be at least one selected, but is not limited thereto.
상기 화학식 2로 표시되는 화합물의 보다 구체적인 예를 들면, 9,9-비스(3,4-메타크릴릭 디에스테르)잔텐을 들 수 있으며, 이에 한정되는 것은 아니다.More specific examples of the compound represented by Formula 2 include 9,9-bis (3,4-methacrylic diester) xanthene, but are not limited thereto.
상기 알칼리 가용성 바인더 수지의 산가는 20 내지 200mgKOH/g일 수 있으며, 바람직하게는 30 내지 150mgKOH/g인 것이 좋다. 상기 범위 내의 산가를 가지는 경우, 현상액 중의 용해성이 향상되어, 비-노출부가 쉽게 용해되고 감도가 증가하여, 결과적으로 노출부의 패턴이 현상시에 남아서 잔막율(film remaining ratio)을 개선하게 되어 바람직하다.The acid value of the alkali-soluble binder resin may be 20 to 200 mgKOH / g, preferably 30 to 150 mgKOH / g. In the case of having an acid value within the above range, the solubility in the developing solution is improved, so that the non-exposed part is easily dissolved and the sensitivity is increased, and as a result, the pattern of the exposed part remains at the time of development to improve the film remaining ratio. .
본 발명에서 "산가"란, 아크릴계 중합체 1g을 중화하는 데 필요한 수산화칼륨의 양(mg)으로서 측정되는 값이며, 통상적으로 수산화칼륨 수용액을 사용하여 적정함으로써 구할 수 있다.In the present invention, "acid value" is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of an acrylic polymer, and can be obtained by titration using an aqueous potassium hydroxide solution.
또한, 겔 투과 크로마토그래피(GPC; 테트라히드로퓨란을 용출용제로 함)로 측정한 폴리스티렌 환산 중량평균분자량(이하, 간단히 '중량평균분자량'이라고 한다)인 2,000 내지 200,000, 바람직하게는 3,000 내지 100,000인 알칼리 가용성 수지가 바람직하다. 분자량이 상기 범위에 있으면, 코팅 필름의 경도가 향상되어, 잔막율이 높고, 현상액 중의 비-노출부의 용해성이 탁월하고 해상도가 향상되는 경향이 있어 바람직하다. Also, the polystyrene reduced weight average molecular weight (hereinafter, simply referred to as 'weight average molecular weight') measured by gel permeation chromatography (GPC; tetrahydrofuran as an eluting solvent) is 2,000 to 200,000, preferably 3,000 to 100,000. Alkali-soluble resins are preferred. When the molecular weight is in the above range, the hardness of the coating film is improved, the residual film ratio is high, the solubility of the non-exposed portion in the developer is excellent and the resolution tends to be improved, which is preferable.
상기 알칼리 가용성 수지의 분자량 분포[중량평균분자량(Mw)/수평균분자량(Mn)]는 1.0 내지 6.0 인 것이 바람직하고, 1.5내지 6.0인 것이 보다 바람직하다. 상기 분자량분포[중량평균분자량(Mw)/수평균분자량(Mn)]가 상기 범위를 만족하는 경우 현상성이 우수하기 때문에 바람직하다.It is preferable that it is 1.0-6.0, and, as for the molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] of the said alkali-soluble resin, it is more preferable that it is 1.5-6.0. When the said molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] satisfy | fills the said range, since developability is excellent, it is preferable.
본 발명의 일 실시형태에 있어서, 상기 카도계 바인더 수지는 상기 감광성 수지 조성물 전체 100 중량부에 대하여 1 내지 50 중량부, 바람직하게는 5 내지 40 중량부, 더욱 바람직하게는 5 내지 30 중량부로 포함될 수 있다.In one embodiment of the present invention, the cardo-based binder resin is included in 1 to 50 parts by weight, preferably 5 to 40 parts by weight, more preferably 5 to 30 parts by weight based on 100 parts by weight of the total photosensitive resin composition. Can be.
상기 카도계 바인더 수지가 상기 범위 내로 포함되는 경우 현상액에의 용해성이 충분하여 비화소 부분의 기판상에 현상 잔사가 발생하기 어렵고, 현상시에 노광부의 화소 부분의 막 감소가 생기기 어려워 비화소 부분의 누락성이 양호한 경향이 있는 이점이 있으므로 바람직하다.When the cardo-based binder resin is included in the above range, the solubility in a developing solution is sufficient so that development residues are less likely to occur on the substrate of the non-pixel portion, and it is difficult to reduce the film portion of the pixel portion of the exposed portion during development. It is preferable because there is an advantage that the omission property tends to be good.
본 발명의 또 다른 실시형태에 있어서, 상기 알칼리 가용성 수지는 하기 화학식 3 및 하기 화학식 4 중 적어도 하나의 반복단위를 포함하는 카도계 바인더 수지를 더 포함하는 것일 수 있다.In another embodiment of the present invention, the alkali-soluble resin may further include a cardo-based binder resin comprising at least one repeating unit of the following formula (3) and (4).
[화학식 3][Formula 3]
Figure PCTKR2017013588-appb-I000019
Figure PCTKR2017013588-appb-I000019
[화학식 4][Formula 4]
Figure PCTKR2017013588-appb-I000020
Figure PCTKR2017013588-appb-I000020
상기 화학식 3 및 4에서,In Chemical Formulas 3 and 4,
P는 각각 독립적으로
Figure PCTKR2017013588-appb-I000021
Figure PCTKR2017013588-appb-I000022
P is each independently
Figure PCTKR2017013588-appb-I000021
Figure PCTKR2017013588-appb-I000022
R7 및 R8는 각각 독립적으로 수소, 히드록시기, 티올기, 아미노기, 니트로기 또는 할로겐 원자이며,R7 and R8 are each independently hydrogen, hydroxy group, thiol group, amino group, nitro group or halogen atom,
Ar1은 각각 독립적으로 C6 내지 C15 아릴기이고,Ar1 is each independently a C6 to C15 aryl group,
Y는 산무수물 잔기이며,Y is an acid anhydride residue,
Z는 산2무수물 잔기이고,Z is an acid 2 anhydride residue,
A는 O, S, N, Si 또는 Se이며,A is O, S, N, Si or Se,
a 및 b는 각각 독립적으로 1 내지 6의 정수이고,a and b are each independently an integer of 1 to 6,
m 및 n 은 각각 독립적으로 0 내지 30의 정수이며, m and n are each independently an integer of 0 to 30,
단 m 및 n은 동시에 0은 아니다.Provided that m and n are not zero at the same time.
상기 할로겐 원자 F, Cl, Br 또는 I이다.The halogen atom F, Cl, Br or I.
상기 아릴기는 C6 내지 C15의 단환식 아릴기, 또는 다환식 아릴기일 수 있다. 상기 단환식 아릴기로는 페닐기, 바이페닐기, 터페닐기, 스틸베닐기 등이 될 수 있으나, 이에 한정되는 것은 아니다. 상기 다환식 아릴기로는 나프틸기, 안트라세닐기, 페난트릴기, 파이레닐기, 페릴레닐기, 크라이세닐기, 플루오레닐기 등이 될 수 있으나, 이에 한정되는 것은 아니다.The aryl group may be a C6 to C15 monocyclic aryl group, or a polycyclic aryl group. The monocyclic aryl group may be a phenyl group, biphenyl group, terphenyl group, stilbenyl group and the like, but is not limited thereto. The polycyclic aryl group may be naphthyl group, anthracenyl group, phenanthryl group, pyrenyl group, perylenyl group, chrysenyl group, fluorenyl group, and the like, but is not limited thereto.
상기 화학식 3의 Y는 산무수물의 잔기로서, 잔기 Y를 도입할 수 있는 산무수물은 특별히 한정되지는 않으며, 예컨대, 무수말레인산, 무수숙신산, 무수이타콘산, 무수프탈산, 무수테트라히드로프탈산, 무수헥사히드로프탈산, 무수메틸렌도 메틸렌테트라히드로프탈산, 무수클로로렌드산, 무수메틸테트라히드로프탈산 등을 들 수 있다.Y in Formula 3 is a residue of an acid anhydride, and an acid anhydride capable of introducing residue Y is not particularly limited. For example, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, or hexahydride Hydrophthalic acid, methylene anhydride, methylenetetrahydrophthalic acid, chlororenic acid anhydride, methyltetrahydrophthalic anhydride, and the like can be given.
상기 화학식 4의 Z는 산2무수물의 잔기로서, 잔기 Z를 도입할 수 있는 산2무수물 화합물은 특별히 한정되지 않으며, 예를 들면, 무수피로멜리트산, 벤조페논테트라카르복시산2무수물, 바이페닐테트라카르복시산2무수물, 바이테닐에테르테트라카르복시산2무수물, 시클로헥실산2무수물, 시클로부틸산2무수물 등을 들 수 있다.Z in the formula (4) is a residue of the acid 2 anhydride, acid 2 anhydride compound that can introduce the residue Z is not particularly limited, for example, pyromellitic anhydride, benzophenone tetracarboxylic acid anhydride, biphenyltetracarboxylic acid Dianhydride, bitenyl ether tetracarboxylic acid dianhydride, cyclohexyl dianhydride, cyclobutyl acid dianhydride, and the like.
본 발명에 따른 카도계 바인더 수지가 감광성 수지 조성물 내에 포함될 경우 발광 강도, 확산율과 외광반사율이 더욱 우수한 효과를 낼 수 있는 이점이 있다. When the cardo-based binder resin according to the present invention is included in the photosensitive resin composition, there is an advantage that the light emission intensity, the diffusion rate and the external light reflectance may have more excellent effects.
상기 알칼리 가용성 수지가 상기 화학식 3 및 상기 화학식 4로 이루어진 군으로부터 선택되는 1 이상의 반복단위를 포함하는 카도계 바인더 수지를 더 포함하는 경우, 상기 카도계 바인더 수지는 상기 알칼리 가용성 수지 전체 100 중량부에 대하여 1 내지 50 중량부, 바람직하게는 5 내지 40 중량부, 더욱 바람직하게는 5 내지 30 중량부로 포함될 수 있다.When the alkali-soluble resin further comprises a cardo-based binder resin including at least one repeating unit selected from the group consisting of Formula 3 and Formula 4, the cardo-based binder resin is 100 parts by weight of the total alkali-soluble resin. 1 to 50 parts by weight, preferably 5 to 40 parts by weight, and more preferably 5 to 30 parts by weight.
추가로 포함될 수 있는 상기 카도계 바인더 수지가 상기 범위 내로 포함될 경우 발광 강도, 확산율, 외광반사율이 더욱 우수해지는 이점이 있으므로 바람직하다.When the cardo-based binder resin, which may be further included, is included in the above range, the light emission intensity, the diffusion rate, and the external light reflectance may be more excellent.
상기 화학식 3 및 상기 화학식 4 중 적어도 하나의 반복단위를 포함하는 카도계 바인더 수지는 예컨대, 하기와 같은 방법으로 제조할 수 있다.The cardo-based binder resin including at least one repeating unit of Formulas 3 and 4 may be prepared by, for example, the following method.
하기 화학식 7 내지 화학식 11로 표시되는 화합물 중 어느 하나와 에피클로로히드린과 같은 에폭시 화합물을 염기촉매 또는 산촉매 하에서 반응시킨 후 티오페놀, 1-티오나프탈렌, 2-티오나프탈렌과 같은 화합물과 반응시켜 합성함으로써, 하기 화학식 12 내지 16의 화합물을 얻을 수 있다.Synthesized by reacting any one of the compounds represented by Formula 7 to Formula 11 with an epoxy compound such as epichlorohydrin under a base catalyst or an acid catalyst and then reacted with a compound such as thiophenol, 1-thionaphthalene, 2-thionaphthalene By doing so, the compounds of the following Chemical Formulas 12 to 16 can be obtained.
그 후, 하기 화학식 12 내지 16으로 표시되는 화합물과 카르복시산 이무수물을 중합 반응시킴으로써 상기 화학식 3 및 상기 화학식 4 중 적어도 하나의 반복단위를 포함하는 카도계 바인더 수지를 얻을 수 있다.Thereafter, a cardo-based binder resin including at least one repeating unit of Formulas 3 and 4 may be obtained by polymerizing a compound represented by Formulas 12 to 16 with carboxylic dianhydride.
[화학식 7][Formula 7]
Figure PCTKR2017013588-appb-I000023
Figure PCTKR2017013588-appb-I000023
[화학식 8][Formula 8]
Figure PCTKR2017013588-appb-I000024
Figure PCTKR2017013588-appb-I000024
[화학식 9][Formula 9]
Figure PCTKR2017013588-appb-I000025
Figure PCTKR2017013588-appb-I000025
[화학식 10][Formula 10]
Figure PCTKR2017013588-appb-I000026
Figure PCTKR2017013588-appb-I000026
[화학식 11][Formula 11]
Figure PCTKR2017013588-appb-I000027
Figure PCTKR2017013588-appb-I000027
상기 화학식 7 내지 11에서 A, R7 및 R8는 화학식 3 및 4에서 정의한 바와 같다.In Formulas 7 to 11, A, R7, and R8 are as defined in Formulas 3 and 4.
[화학식 12][Formula 12]
Figure PCTKR2017013588-appb-I000028
Figure PCTKR2017013588-appb-I000028
[화학식 13][Formula 13]
Figure PCTKR2017013588-appb-I000029
Figure PCTKR2017013588-appb-I000029
[화학식 14][Formula 14]
Figure PCTKR2017013588-appb-I000030
Figure PCTKR2017013588-appb-I000030
[화학식 15][Formula 15]
Figure PCTKR2017013588-appb-I000031
Figure PCTKR2017013588-appb-I000031
[화학식 16][Formula 16]
Figure PCTKR2017013588-appb-I000032
Figure PCTKR2017013588-appb-I000032
상기 화학식 12 내지 16에서 c는 1 내지 6의 정수이고,In Chemical Formulas 12 to 16 c is an integer of 1 to 6,
A, Ar1, R7 및 R8은 화학식 3 및 4에서 정의한 바와 같다.A, Ar1, R7 and R8 are as defined in the formulas (3) and (4).
상기의 카르복시산 이무수물의 구체적인 예로피로메리트산 이무수물, 3,3',4,4'-비페닐테트라카르복실산 이무수물, 2,3,3',4'-비페닐테트라카르복실산 이무수물, 2,2',3,3'-비페닐테트라카르복실산 이무수물, 3,3',4,4'-벤조페논테트라카르복실산 이무수물, 2,2',3,3'-벤조페논테트라카르복실산 이무수물, 2,2-비스(3,4-디카르복시페닐)프로판 이무수물, 2,2-비스(2,3-디카르복시페닐)프로판 이무수물, 1,1-비스(3,4-디카르복시페닐)에탄 이무수물, 1,1-비스(2,3-디카르복시페닐)에탄 이무수물, 비스(3,4-디카르복시페닐)메탄 이무수물, 비스(2,3-디카르복시페닐)메탄 이무수물, 비스(3,4-디카르복실페닐)술폰 이무수물, 비스(3,4-디카르복시페닐)에테르 이무수물,1,2,5,6-나프탈렌테트라카르복실산 이무수물, 9,9-비스(3,4-디카르복시페닐)플루오렌산 이무수물, 9,9-비스{4-(3,4-디카르복시페녹시)페닐}플루오렌산 이무수물, 2,3,6,7-나프탈렌테트라카르복실산 이무수물, 2,3,5,6-피리딘테트라카르복실산 이무수물, 3,4,9,10-페릴렌테트라카르복실산 이무수물, 2,2-비스(3,4-디카르복시페닐)헥사플루오로프로판 이무수물 등의 방향족환의 테트라카르복실산 이무수물이나, 1,2,3,4-시클로부탄테트라카르복실산 이무수물, 1,2,3,4-시클로펜탄테트라카르복실산 이무수물, 1,2,3,4-시클로헥산테트라카르복실산 이무수물 등의 지환족의 테트라카르복실산 이무수물이나 3,3',4,4'-디페닐술폰테트라카르복실산 이무수물 등일 수 있다.Specific examples of the above carboxylic dianhydride include pyromellitic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, and 2,3,3', 4'-biphenyltetracarboxylic dianhydride , 2,2 ', 3,3'-biphenyltetracarboxylic dianhydride, 3,3', 4,4'-benzophenonetetracarboxylic dianhydride, 2,2 ', 3,3'-benzo Phenonetetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) propane dianhydride, 1,1-bis ( 3,4-dicarboxyphenyl) ethane dianhydride, 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, bis (2,3- Dicarboxyphenyl) methane dianhydride, bis (3,4-dicarboxylphenyl) sulfone dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, 1,2,5,6-naphthalenetetracarboxylic acid Dianhydrides, 9,9-bis (3,4-dicarboxyphenyl) fluorene acid dianhydrides, 9,9-bis {4- (3,4-dicar Ciphenoxy) phenyl} fluorene dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic dianhydride, 3,4,9, Tetracarboxylic dianhydride of aromatic rings, such as 10-perylene tetracarboxylic dianhydride and 2, 2-bis (3, 4- dicarboxy phenyl) hexafluoro propane dianhydride, and 1,2,3,4 Alicyclic tetracarboxes such as -cyclobutanetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,3,4-cyclohexanetetracarboxylic dianhydride Acid dianhydride, 3,3 ', 4,4'-diphenylsulfontetracarboxylic dianhydride and the like.
상기 중합반응은 일례로 2 시간 내지 24시간, 또는 4 시간 내지 12 시간 동안 100 내지 130 ℃, 또는 110 내지 120 ℃에서 실시할 수 있다.The polymerization reaction may be performed at 100 to 130 ° C., or 110 to 120 ° C. for 2 hours to 24 hours, or 4 hours to 12 hours.
상기 카르복시산 이무수물은 일례로 상기 화학식 12 내지 16으로 표시되는 모노머 100 중량부를 기준으로 5 내지 40중량부, 10 내지 30 중량부, 또는 10 내지 20 중량부로 투입될 수 있다.The carboxylic dianhydride may be added in an amount of 5 to 40 parts by weight, 10 to 30 parts by weight, or 10 to 20 parts by weight based on 100 parts by weight of the monomer represented by Formula 12 to 16, for example.
상기 화학식 3 및 상기 화학식 4 중 적어도 하나의 반복단위를 포함하는 카도계 바인더 수지의 제조방법은 일례로 상기 중합반응 개시 후 말단 캡핑제(end-capping agent)를 투입하여 반응시키는 단계를 포함할 수 있다.The method for preparing a cardo-based binder resin including at least one repeating unit of Chemical Formulas 3 and 4 may include, for example, reacting by adding an end-capping agent after initiation of the polymerization reaction. have.
상기 말단 캡핑 반응은 일례로 30분 내지 4 시간, 또는 1 시간 내지 3 시간 동안 100 내지 130℃, 또는 110 내지 120℃에서 실시할 수 있다.The end capping reaction may be performed at 100 to 130 ° C., or 110 to 120 ° C. for 30 minutes to 4 hours, or 1 hour to 3 hours, for example.
상기 말단 캡핑제는 일례로 상기 화학식 12 내지 16으로 표시되는 모노머 100 중량부를 기준으로 2 내지 10 중량부, 2 내지 5 중량부, 또는 3 내지 5 중량부로 투입될 수 있다.The end capping agent may be added in an amount of 2 to 10 parts by weight, 2 to 5 parts by weight, or 3 to 5 parts by weight based on 100 parts by weight of the monomer represented by Formula 12 to 16, for example.
상기 말단 캡핑제는 일례로 방향족 카르복시산 무수물이 바람직하고, 구체적인 예로 프탈산 무수물 등이며, 이 경우 내열성, 고투과 및 고굴절 특성이 우수한 효과가 있다.The end capping agent is preferably aromatic carboxylic anhydride, for example, phthalic anhydride, and the like, and in this case, excellent heat resistance, high permeability, and high refractive properties.
상기 화학식 3 및 상기 화학식 4 중 적어도 하나의 반복단위를 포함하는 카도계 바인더 수지의 중량평균 분자량은 일례로 1,000 내지 100,000 g/mol, 바람직하게는 2,000 내지 50,000g/mol, 보다 바람직하게는 3,000 내지 10,000 g/mol일 수 있고, 이 범위 내에서 내열성이 우수하고 감광재의 현상 속도 및 현상액에 의한 현상이 알맞아 패턴형성이 잘 되는 효과가 있다.The weight average molecular weight of the cardo-based binder resin including at least one repeating unit of Formula 3 and Formula 4 is, for example, 1,000 to 100,000 g / mol, preferably 2,000 to 50,000 g / mol, more preferably 3,000 to It may be 10,000 g / mol, it is excellent in heat resistance within this range and the development speed of the photosensitive material and the development by the developing solution is suitable, there is an effect that the pattern formation is good.
상기 중량평균 분자량은 겔투과크로마토그래피(GPC)방법에 의하여 측정할 수 있다.The weight average molecular weight can be measured by gel permeation chromatography (GPC) method.
상기 화학식 3 및 상기 화학식 4 중 적어도 하나의 반복단위를 포함하는 카도계 바인더 수지 수지의 분산도는 일례로 1.0 내지 5.0 범위, 바람직하게는 1.5 내지 4.0 범위일 수 있고, 이 범위 내에서 내열성이 우수하고 감광재의 현상 속도 및 현상액에 의한 현상이 알맞아 패턴형성이 잘 되는 효과가 있다.The degree of dispersion of the cardo-based binder resin resin including at least one repeating unit of Formulas 3 and 4 may be in the range of 1.0 to 5.0, preferably 1.5 to 4.0, and has excellent heat resistance within this range. And the development speed of the photosensitive material and the development by the developer is suitable, there is an effect that the pattern formation is good.
본 기재의 분산도는 GPC 측정방법에 의하여 측정할 수 있다.The dispersion degree of this description can be measured by GPC measuring method.
본 발명의 또 다른 실시형태에 있어서, 상기 알칼리 가용성 수지는 아크릴계 바인더 수지를 더 포함할 수 있다. 상기 알칼리 가용성 수지가 상기 아크릴계 바인더 수지를 더 포함하는 경우 패턴의 유실 없이 형성 가능한 최소 패턴의 크기가 작아 고해상도의 패턴구현과 패턴직진성이 유리한 이점이 있으므로 바람직하다.In another embodiment of the present invention, the alkali-soluble resin may further include an acrylic binder resin. When the alkali-soluble resin further includes the acrylic binder resin, it is preferable because the size of the minimum pattern that can be formed without loss of the pattern is small, which has advantages of high-resolution pattern implementation and pattern straightness.
상기 아크릴계 바인더 수지는 예컨대, 카르복실기 함유 단량체, 및 이 단량체와 공중합 가능한 다른 단량체와의 공중합체등을 들 수 있다. Examples of the acrylic binder resin include a carboxyl group-containing monomer and a copolymer with another monomer copolymerizable with the monomer.
카르복실기 함유 단량체로서는, 예를 들면 불포화 모노카르복실산이나, 불포화 디카르복실산, 불포화 트리카르복실산 등의 분자 중에 1개 이상의 카르복실기를 갖는 불포화 다가 카르복실산 등의 불포화 카르복실산 등을 들 수 있다. 여기서, 불포화 모노카르복실산으로서는, 예를 들면 아크릴산, 메타크릴산, 크로톤산, α-클로로아크릴산, 신남산 등을 들 수 있다. 불포화 디카르복실산으로서는, 예를 들면 말레산, 푸마르산, 이타콘산, 시트라콘산, 메사콘산 등을 들 수 있다. 불포화 다가 카르복실산은 산무수물일 수도 있으며, 구체적으로는 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물 등을 들 수 있다. 또한, 불포화 다가 카르복실산은 그의 모노(2-메타크릴로일옥시알킬)에스테르일 수도 있으며, 예를 들면 숙신산 모노(2-아크릴로일옥시에틸), 숙신산 모노(2-메타크릴로일옥시에틸), 프탈산 모노(2-아크릴로일옥시에틸), 프탈산 모노(2-메타크릴로일옥시에틸) 등을 들 수 있다. As a carboxyl group-containing monomer, unsaturated carboxylic acids, such as unsaturated monocarboxylic acid, unsaturated polyhydric carboxylic acid, such as unsaturated polycarboxylic acid which has 1 or more carboxyl groups in molecules, such as unsaturated dicarboxylic acid and unsaturated tricarboxylic acid, are mentioned, for example. Can be. Here, as unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example. As unsaturated dicarboxylic acid, a maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example. The unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride. In addition, the unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester thereof, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl ), Mono (2-acryloyloxyethyl) phthalate, mono (2-methacryloyloxyethyl) phthalate, etc. are mentioned.
불포화 다가 카르복실산은 그 양말단 디카르복시 중합체의 모노(메타)아크릴레이트일 수도 있으며, 예를 들면 ω-카르복시폴리카프로락톤 모노아크릴레이트, ω-카르복시폴리카프로락톤 모노메타크릴레이트 등을 들 수 있다. 이들 카르복실기 함유 단량체는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. 상기 카르복실기 함유 단량체와 공중합 가능한 다른 단량체로서는, 예를 들면 스티렌, α-메틸스티렌, o-비닐톨루엔, m-비닐톨루엔, p-비닐톨루엔, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐벤질메틸에테르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르, 인덴 등의 방향족 비닐 화합물; 메틸아크릴레이트, 메틸메타크릴레이트, 에틸아크릴레이트, 에틸메타크릴레이트, n-프로필아크릴레이트, n-프로필메타크릴레이트, i-프로필아크릴레이트, i-프로필메타크릴레이트, n-부틸아크릴레이트, n-부틸메타크릴레이트, i-부틸아크릴레이트, i-부틸메타크릴레이트, sec-부틸아크릴레이트, sec-부틸메타크릴레이트, t-부틸아크릴레이트, t-부틸메타크릴레이트, 2-히드록시에틸아크릴레이트, 2-히드록시에틸메타크릴레이트, 2-히드록시프로필아크릴레이트, 2-히드록시프로필메타크릴레이트, 3-히드록시프 로필아크릴레이트, 3-히드록시프로필메타크릴레이트, 2-히드록시부틸아크릴레이트, 2-히드록시부틸메타크릴레이 트, 3-히드록시부틸아크릴레이트, 3-히드록시부틸메타크릴레이트, 4-히드록시부틸아크릴레이트, 4-히드록시부틸메타크릴레이트, 알릴아크릴레이트, 알릴메타크릴레이트, 벤질아크릴레이트, 벤질메타크릴레이트, 시클로헥실아크릴레이트, 시클로헥실메타크릴레이트, 페닐아크릴레이트, 페닐메타크릴레이트, 2-메톡시에틸아크릴레이트, 2-메톡시에틸메타크릴레이트, 2-페녹시에틸아크릴레이트, 2-페녹시에틸메타크릴레이트, 메톡시디에틸렌글리콜아크릴레이트, 메톡시디에틸렌글리콜메타크릴레이트, 메톡시트리에틸렌글리콜아크릴레이트, 메톡시트리에틸렌글리콜메타크릴레이트, 메톡시프로필렌글리콜아크릴레이트, 메톡시프로필렌글리콜메타크릴레이트, 메톡시디프로필렌글리콜아크릴레이트, 메톡시디프로필렌글리콜메타크릴레이트, 이소보르닐아크릴레이트, 이소보르닐메타크릴레이트, 디시클로펜타디에닐아크릴레이트, 디시클로펜타디에틸메타크릴레이트, 아다만틸(메타)아크릴레이트, 노르보르닐(메타)아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-히드록시-3-페녹시프로필메타크릴레이트, 글리세롤모노아크릴레이트, 글리세롤모노메타크릴레이트 등의 불포화 카르복실산 에스테르류; 2-아미노에틸아크릴레이트, 2-아미노에틸메타크릴레이트, 2-디메틸아미노에틸아크릴레이트, 2-디메틸아미노에틸 메타크릴레이트, 2-아미노프로필아크릴레이트, 2-아미노프로필메타크릴레이트, 2-디메틸아미노프로필아크릴레이트, 2-디메틸아미노프로필메타크릴레이트, 3-아미노프로필아크릴레이트, 3-아미노프로필메타크릴레이트, 3-디메틸아미노프로필아크릴레이트, 3-디메틸아미노프로필메타크릴레이트 등의 불포화 카르복실산 아미노알킬에스테르류; 글리시딜아크릴레이트, 글리시딜메타크릴레이트 등의 불포화 카르복실산 글리시딜에스테르류; 아세트산 비닐, 프로피온산 비닐, 부티르산 비닐, 벤조산 비닐 등의 카르복실산 비닐에스테르류; 비닐메틸에테르, 비닐에틸에테르, 알릴글리시딜에테르 등의 불포화 에테르류; 아크릴로니트릴, 메타크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴 등의 시안화 비닐 화합물; 아크릴아미드, 메타크릴아미드, α-클로로아크릴아미드, N-2-히드록시에틸아크릴아미드, N-2-히드록시에틸메타크릴아미드 등의 불포화 아미드류; 말레이미드, 벤질말레이미드, N-페닐말레이미드. N-시클로헥실말레이미드 등의 불포화 이미드류; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공액 디엔류; 및 폴리스티렌, 폴리메틸아크릴레이트, 폴리메틸메타크릴레이트, 폴리-n-부틸아크릴레이트, 폴리-n-부틸메타크릴레이트, 폴리실록산의 중합체 분자쇄의 말단에 모노아크릴로일기 또는 모노메타크릴로일기를 갖는 거대 단량체류등을 들 수 있다. 이들 단량체는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. The unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate. . These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively. As another monomer copolymerizable with the said carboxyl group-containing monomer, For example, styrene, (alpha) -methylstyrene, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p-chloro styrene, o-methoxy styrene, m-meth Oxy styrene, p-methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p- Aromatic vinyl compounds such as vinyl benzyl glycidyl ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxy Ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxy propyl acrylate, 3-hydroxypropyl methacrylate, 2- Hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, Allyl Acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl Methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol meth Methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy dipropylene glycol acrylate, methoxy dipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadier Nyl acrylate, dicyclopentadiethyl methacrylate, adamantyl (meth) Acrylate, norbornyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, etc. Unsaturated carboxylic acid esters; 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxyl such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate and 3-dimethylaminopropyl methacrylate Acid aminoalkyl esters; Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; Vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile and vinylidene cyanide; Unsaturated amides such as acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethylacrylamide and N-2-hydroxyethyl methacrylamide; Maleimide, benzylmaleimide, N-phenylmaleimide. Unsaturated imides such as N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; And monoacryloyl or monomethacryloyl groups at the terminal of the polymer molecular chain of polystyrene, polymethylacrylate, polymethylmethacrylate, poly-n-butylacrylate, poly-n-butylmethacrylate, polysiloxane. And macromonomers to have. These monomers can be used individually or in mixture of 2 or more types, respectively.
특히, 상기 카르복실기 함유 단량체와 공중합 가능한 다른 단량체로서 노르보닐 골격을 갖는 단량체, 아다만탄골격을 갖는 단량체, 로진 골격을 갖는 단량체 등의 벌키성 단량체가 비유전 상수값을 낮추는 경향이 있기 때문에 바람직하다.In particular, bulky monomers such as monomers having a norbornyl skeleton, monomers having an adamantane skeleton, and monomers having a rosin skeleton as the other monomers copolymerizable with the carboxyl group-containing monomer are preferable because they tend to lower the dielectric constant. .
상기 아크릴계 바인더 수지는 예컨대, 상기 알칼리 가용성 수지 전체 100 중량부에 대하여 10 내지 90 중량부, 바람직하게는 20 내지 80 중량부, 더욱 바람직하게는 30 내지 70 중량부로 포함될 수 있으며, 이 경우 고해상도의 패턴 구현 및 패턴 직진성과 같은 공정성이 유리한 이점이 있다.The acrylic binder resin may be included, for example, in an amount of 10 to 90 parts by weight, preferably 20 to 80 parts by weight, more preferably 30 to 70 parts by weight, based on 100 parts by weight of the alkali-soluble resin in total, in this case Fairness, such as implementation and pattern straightness, is advantageous.
상기 알칼리 가용성 수지의 함량은 상기 감광성 수지 조성물 전체 100 중량부에 대하여 통상 1 내지 50 중량부, 바람직하게는 3 내지 40 중량부, 더욱 더 바람직하게는 5 내지 30 중량부의 범위이다. 상기 알칼리 가용성 수지의 함유량이 상기의 범위를 만족하는 경우 현상액에의 용해성이 충분하여 비화소 부분의 기판상에 현상 잔사가 발생하기 어렵고, 현상시에 노광부의 화소 부분의 막 감소가 생기기 어려워 비화소 부분의 누락성이 양호한 경향이 있으므로 바람직하다.The content of the alkali-soluble resin is usually in the range of 1 to 50 parts by weight, preferably 3 to 40 parts by weight, and still more preferably 5 to 30 parts by weight based on 100 parts by weight of the total photosensitive resin composition. When the content of the alkali-soluble resin satisfies the above range, the solubility in a developing solution is sufficient so that development residues are less likely to occur on the substrate of the non-pixel portion, and the film portion of the pixel portion of the exposed portion is less likely to occur during development. Since the omission of a part tends to be good, it is preferable.
산란입자Scattering particles
본 발명에 따른 감광성 수지 조성물은 평균입경이 30 내지 500nm의 금속산화물을 포함하는 산란입자를 포함한다.The photosensitive resin composition according to the present invention includes scattering particles containing a metal oxide having an average particle diameter of 30 to 500 nm.
본 발명의 또 다른 실시형태에 있어서, 상기 금속산화물은 Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In 및 이들의 조합으로 이루어진 군에서 선택되는 1 이상의 산화물을 포함할 수 있다.In another embodiment of the present invention, the metal oxide is Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, It may include one or more oxides selected from the group consisting of Ti, Sb, Sn, Zr, Nb, Ce, Ta, In and combinations thereof.
본 발명의 또 다른 실시형태에 있어서, 상기 금속산화물은 Al2O3, SiO2, ZnO, ZrO2, BaTiO3, TiO2, Ta2O5, Ti3O5, ITO, IZO, ATO, ZnO-Al, Nb2O3, SnO, MgO 및 이들의 조합으로 이루어진 군에서 선택되는 1 이상을 포함할 수 있으며, 필요에 따라서 아크릴레이트와 같은 불포화 결합을 갖는 화합물로 표면 처리된 재질도 사용 가능하다.In another embodiment of the present invention, the metal oxide is Al 2 O 3 , SiO 2 , ZnO, ZrO 2 , BaTiO 3 , TiO 2 , Ta 2 O 5 , Ti 3 O 5 , ITO, IZO, ATO, ZnO It may include one or more selected from the group consisting of -Al, Nb 2 O 3 , SnO, MgO and combinations thereof, and a material surface-treated with a compound having an unsaturated bond such as acrylate may be used if necessary. .
상기 산란입자는 컬러필터의 발광 세기를 극대화할 수 있도록 평균입경 및 전체 조성물 내에서 함량을 한정한다.The scattering particles limit the content in the average particle diameter and the total composition to maximize the light emission intensity of the color filter.
본 발명에서, “평균입경”이란, 수평균 입경일 수 있으며, 예컨대 전계방출 주자전자현미경(FE-SEM) 또는 투과전자 현미경(TEM)에 의해 관찰한 상으로부터 구할 수 있다. 구체적으로, FE-SEM 또는 TEM의 관찰 화상으로부터 몇 개의 샘플을 추출하고 이들 샘플의 직경을 측정하여 산술 평균한 값으로 얻을 수 있다.In the present invention, the "average particle diameter" may be a number average particle diameter, and can be obtained from an image observed by, for example, a field emission runner electron microscope (FE-SEM) or a transmission electron microscope (TEM). Specifically, several samples can be extracted from the observed images of FE-SEM or TEM, and the diameters of these samples can be measured to obtain arithmetic mean values.
상기 금속산화물은 평균입경이 30 내지 500nm이고, 바람직하게는 30 내지 300nm일 수 있다. 상기 금속산화물의 평균입경이 상기 범위를 만족하는 경우 산란 효과가 증대되어 상기 산란 입자를 포함하는 감광성 수지 조성물이 청색 양자점을 포함하지 않는다 하더라도 청색 광원에 의하여 청색 화소의 역할을 수행할 수 있으므로 바람직하며, 조성물 내에 가라앉는 현상을 방지하여 균일한 품질의 청색 패턴층 표면을 얻을 수 있으므로, 상기 범위 내에서 적절히 조절하여 사용할 수 있다.The metal oxide has an average particle diameter of 30 to 500 nm, preferably 30 to 300 nm. When the average particle diameter of the metal oxide satisfies the above range, the scattering effect is increased, and even though the photosensitive resin composition including the scattering particles does not include blue quantum dots, the blue oxide may serve as a blue pixel. Since the phenomenon which sinks in a composition can be prevented and the surface of a blue pattern layer of uniform quality can be obtained, it can adjust and use it suitably within the said range.
본 발명의 또 다른 실시형태에 있어서, 상기 산란입자는 상기 감광성 수지 조성물 전체 100 중량부에 대하여 0.1 내지 50 중량부로 포함될 수 있으며, 바람직하게는 0.5 내지 30 중량부로 포함될 수 있고, 더욱 바람직하게는 0.5 내지 20 중량부로 포함될 수 있다. 상기 산란입자가 상기 범위 내로 포함될 경우 우수한 발광 세기를 가지는 컬러 필터의 제조가 가능한 이점이 있다. 구체적으로, 상기 산란입자가 상기 범위 내로 포함되는 경우 얻고자 하는 발광 세기의 확보가 용이할 수 있고, 조성물의 안정성 저하를 억제할 수 있는 이점이 있다.In another embodiment of the present invention, the scattering particles may be included in an amount of 0.1 to 50 parts by weight, preferably 0.5 to 30 parts by weight, more preferably 0.5 to 100 parts by weight of the total photosensitive resin composition. To 20 parts by weight. When the scattering particles are included in the above range, there is an advantage in that a color filter having excellent emission intensity can be manufactured. Specifically, when the scattering particles are included in the above range, it may be easy to ensure the emission intensity to be obtained, there is an advantage that can suppress the degradation of the composition stability.
청색 착색제Blue colorant
본 발명의 감광성 수지 조성물은 청색 착색제를 더 포함할 수 있다. 본 발명에 따른 감광성 수지 조성물은 청색 착색제를 더 포함하기 때문에 후술할 산란입자에 의하여 반사된 광원의 빛이, 태양광과 같은 외광에 의하여 다시 반사되는 현상을 방지하여 고품위의 화질을 구현할 수 있는 이점이 있다.The photosensitive resin composition of this invention may further contain a blue coloring agent. Since the photosensitive resin composition according to the present invention further includes a blue colorant, the light of the light source reflected by the scattering particles, which will be described later, may be prevented from being reflected back by external light such as sunlight, thereby realizing high quality images. There is this.
상기 청색 착색제는 구체적으로 청색 안료를 포함할 수 있으며, 상기 청색 안료는 구체적으로 색지수(The society of Dyers and Colourists 출판)에서 피그먼트로 분류되어 있는 화합물을 들 수 있고, 보다 구체적으로는 이하와 같은 색지수(C.I.) 번호의 안료를 들 수 있지만, 반드시 이들로 한정되는 것은 아니다.The blue colorant may specifically include a blue pigment, and the blue pigment may specifically include a compound classified as a pigment in the color index (published by The society of Dyers and Colourists). Although the pigment of the same color index (CI) number is mentioned, It is not necessarily limited to these.
본 발명의 또 다른 실시형태에 있어서, 상기 청색 착색제는 C.I. 피그먼트 블루 15:3, 15:4, 15:6, 16, 21, 28, 60, 64, 76 및 이들의 조합으로 이루어진 군에서 선택된 적어도 1종 이상의 청색 안료;를 포함할 수 있다.In another embodiment of the present invention, the blue colorant is C.I. Pigment Blue 15: 3, 15: 4, 15: 6, 16, 21, 28, 60, 64, 76 and at least one blue pigment selected from the group consisting of a combination thereof; may include.
이 중에서도 C.I. 피그먼트 블루 15:3, C.I. 피그먼트 블루 15:4, 피그먼트 블루 15:6, C.I. 피그먼트 블루 16으로 이루어진 군으로부터 선택되는 1종 이상을 포함하는 것이 외광반사 억제 효과와 높은 색재현성 구현하는 효과면에서 바람직하다.Among these, C.I. Pigment Blue 15: 3, C.I. Pigment Blue 15: 4, Pigment Blue 15: 6, C.I. It is preferable to include at least one member selected from the group consisting of Pigment Blue 16 in view of the effect of suppressing external light reflection and high color reproducibility.
본 발명의 또 다른 실시형태에 있어서, 상기 청색 착색제는 염료 및 자색 안료로 이루어진 군에서 선택되는 1 이상을 더 포함할 수 있다.In another embodiment of the present invention, the blue colorant may further include one or more selected from the group consisting of dyes and purple pigments.
상기 자색 안료는 이에 한정되는 것은 아니나, 예컨대 C.I. 피그먼트 바이올렛 1, 14, 19, 23, 29, 32, 33, 36, 37, 38 및 이들의 조합으로 이루어진 군에서 선택되는 1종 이상일 수 있으며, 그 중에서도 C.I. 피그먼트 바이올렛 23을 사용하는 것이 적은 색재함량을 통해서도 고색재현성을 구현하는 면에서 바람직하다.The purple pigment is not limited thereto, for example, C.I. Pigment violet 1, 14, 19, 23, 29, 32, 33, 36, 37, 38, and combinations thereof, and at least one selected from the group consisting of C.I. It is preferable to use pigment violet 23 in view of realizing high color reproducibility even through a small colorant content.
상기 염료는 컬러 인덱스(The Society of Dyers and Colourists 출판)내에 염료로 분류되어 있는 화합물 또는 염색 노트(색염사)에 기재되어 있는 공지의 청색 또는 자색 염료를 들 수 있다.The dye may include a compound classified as a dye in the color index (Published by The Society of Dyers and Colourists) or a known blue or purple dye described in a dye note (color dyed yarn).
예컨대, C.I. 솔벤트 염료로서, For example, C.I. As solvent dyes,
C.I. 솔벤트 블루 5, 35, 36, 37, 44, 45, 59, 67 및 70; 및C.I. Solvent blue 5, 35, 36, 37, 44, 45, 59, 67 and 70; And
C.I. 솔벤트 바이올렛 8, 9, 13, 14, 36, 37, 47 및 49 등을 들 수 있다.C.I. Solvent violet 8, 9, 13, 14, 36, 37, 47 and 49; and the like.
그 중에서도 C.I. 솔벤트 블루 35, 36, 44, 45 및 70; 및 C.I. 솔벤트 바이올렛 13으로 이루어진 군으로부터 선택되는 1종 이상을 포함하는 것이 바람직하다.Among them, C.I. Solvent blue 35, 36, 44, 45 and 70; And C.I. It is preferred to include at least one member selected from the group consisting of solvent violet 13.
또한, C.I. 애시드 염료로서,In addition, C.I. As an acid dye,
C.I.애시드 블루 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103, 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324:1, 335 및 340; 및CI acid blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103 , 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324: 1 , 335 and 340; And
C.I.애시드 바이올렛 6B, 7, 9, 17, 19 및 66 등을 들 수 있다.C.I. acid violet 6B, 7, 9, 17, 19, 66, etc. are mentioned.
그 중에서도 C.I. 애시드 블루 80 및 90; 및 C.I. 애시드 바이올렛 66으로 이루어진 군으로부터 선택되는 1종 이상을 포함하는 것이 바람직하다.Among them, C.I. Acid blue 80 and 90; And C.I. It is preferred to include at least one member selected from the group consisting of acid violet 66.
또한, C.I. 다이렉트 염료로서,In addition, C.I. As a direct dye,
C.I.다이렉트 블루 38, 44, 57, 70, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113, 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189, 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248, 250, 251, 252, 256, 257, 259, 260, 268, 274, 275 및 293; 및CI direct blue 38, 44, 57, 70, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113 , 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189 , 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248 , 250, 251, 252, 256, 257, 259, 260, 268, 274, 275 and 293; And
C.I.다이렉트 바이올렛 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103 및 104 등을 들 수 있다.C.I. direct violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104 and the like.
또한, C.I. 모단토 염료로서,In addition, C.I. As a modanto dye,
C.I.모단토 블루 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83 및 84;CI Modanto Blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83 and 84;
C.I.모단토 바이올렛 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53 및 58 등을 들 수 있다.C.I. modanto violet 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58 and the like.
상기 염료는 각각 단독 또는 2종 이상을 조합하여 사용할 수 있다.The said dye can be used individually or in combination of 2 or more types, respectively.
본 발명의 또 다른 실시형태에 있어서, 상기 청색 착색제는 상기 감광성 수지 조성물 전체 100 중량부에 대하여 0.1 내지 50 중량부, 바람직하게는 0.5 내지 30 중량부, 더욱 바람직하게는 1 내지 20 중량부로 포함될 수 있다.In another embodiment of the present invention, the blue colorant may be included in 0.1 to 50 parts by weight, preferably 0.5 to 30 parts by weight, more preferably 1 to 20 parts by weight based on 100 parts by weight of the total photosensitive resin composition. have.
상기 청색 착색제의 함량이 상기 범위 미만이면 얻고자 하는 외광 반사 억제 효과의 확보가 다소 어려울 수 있고, 이와 반대로 상기 범위를 초과할 경우 발광 세기 증대가 다소 저하될 수 있으며, 조성물의 점도 안정성 저하 문제가 발생하므로, 상기 범위 내에서 적절히 사용한다.When the content of the blue colorant is less than the above range, it may be difficult to secure the external light reflection suppression effect to be obtained, on the contrary, when the content exceeds the above range, the increase in luminescence intensity may be slightly lowered, and the problem of lowering the viscosity stability of the composition may occur. Since it arises, it uses suitably within the said range.
본 발명의 또 다른 실시형태에 있어서, 상기 감광성 수지 조성물은 광중합성 화합물; 광중합 개시제; 용제; 및 첨가제로 이루어진 군에서 선택되는 1 이상을 더 포함할 수 있다.In another embodiment of the present invention, the photosensitive resin composition is a photopolymerizable compound; Photopolymerization initiator; solvent; And it may further include one or more selected from the group consisting of additives.
광중합성 화합물Photopolymerizable compound
본 발명의 감광성 수지 조성물에 함유되는 광중합성 화합물은 광 및 후술하는 광중합 개시제의 작용으로 중합할 수 있는 화합물로서, 단관능 단량체, 2관능 단량체, 그 밖의 다관능 단량체 등을 들 수 있다. The photopolymerizable compound contained in the photosensitive resin composition of this invention is a compound which can superpose | polymerize by the action | action of light and the photoinitiator mentioned later, A monofunctional monomer, a bifunctional monomer, another polyfunctional monomer, etc. are mentioned.
상기 단관능 단량체의 구체예로는 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등을 들 수 있다. Specific examples of the monofunctional monomers include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, and N-vinyl py. A ralidone etc. are mentioned.
상기 2관능 단량체의 구체예로는 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르, 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있다. As a specific example of the said bifunctional monomer, 1, 6- hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene glycol di (meth) acrylate And bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, and the like.
그 밖의 상기 다관능 단량체의 구체예로서는 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 펜타에리트리톨테트라(메타)아크릴레이트, 디펜타에리트리톨펜타(메타)아크릴레이트, 디펜타에리트리톨헥사(메타)아크릴레이트 등을 들 수 있다. 이들 중에서 2관능 이상의 다관능 단량체가 바람직하게 사용된다. Specific examples of the other polyfunctional monomers include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, Dipentaerythritol hexa (meth) acrylate and the like. Of these, bifunctional or higher polyfunctional monomers are preferably used.
상기 광중합성 화합물은 상기 감광성 수지 조성물 전체 100 중량부에 대해서 1 내지 30중량부, 바람직하게는 5 내지 20중량부의 범위에서 사용된다. 상기 광중합성 화합물이 상기 범위를 만족하는 경우 화소부의 강도나 평활성이 양호하게 되는 경향이 있기 때문에 바람직하다.The photopolymerizable compound is used in the range of 1 to 30 parts by weight, preferably 5 to 20 parts by weight based on 100 parts by weight of the total photosensitive resin composition. When the photopolymerizable compound satisfies the above range, the intensity and smoothness of the pixel portion tend to be good, which is preferable.
광중합 개시제Photopolymerization initiator
본 발명에서 사용되는 상기 광중합 개시제는 아세토페논계 화합물을 함유하는 것이 바람직하다. It is preferable that the said photoinitiator used by this invention contains an acetophenone type compound.
상기 아세토페논계 화합물로는, 예를 들면, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸[4-(1-메틸비닐)페닐]프로판-1-온의 올리고머 등을 들 수 있고, 바람직하게는 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다. As said acetophenone type compound, diethoxy acetophenone, 2-hydroxy-2- methyl-1- phenyl propane- 1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- ( 2-hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1 -One, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl [4- (1-methylvinyl) phenyl] propane-1 Oligomer of -one, etc. are mentioned, Preferably 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one etc. are mentioned.
또한, 상기 아세토페논계 이외의 광중합 개시제를 조합하여 사용할 수 있다. 상기 아세토페논계 이외의 광중합 개시제는 빛을 조사함으로써 활성 라디칼을 발생하는 활성 라디칼 발생제, 증감제, 산발생제 등을 들 수 있다. Moreover, photoinitiators other than the said acetophenone series can be used in combination. Photopolymerization initiators other than the acetophenone series include active radical generators, sensitizers, and acid generators that generate active radicals by irradiation with light.
상기 활성라디칼 발생제로는, 예를 들면, 벤조인계 화합물, 벤조페논계 화합물, 티옥산톤계 화합물, 트리아진계 화합물등을 들 수 있다. 상기 벤조인계 화합물로는, 예를 들면, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조이소부틸에테르 등을 들 수 있다. 상기 벤조페논계 화합물로는, 예를 들면, 벤조페논, o-벤조일벤조산메틸, 4-페닐조페논, 4-벤조일-4'-메틸디페닐설파이드, 3,3',4,4'-테트라(t-부틸퍼옥시카보닐)벤조페논, 2,4,6-트리메틸벤조페논 등을 들 수 있다. 상기 티옥산톤계 화합물로는, 예를 들면, 2-이소프로필티옥산톤, 4-이소프로필티옥산톤, 2,4-디에틸티옥산톤, 2,4-디클로로티옥산톤, 1-클로로-4-프로폭시티옥산톤 등을 들 수 있다. 상기 트리아진계 화합물로는, 예를 들면, 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진,2,4-비스(트리클로로메틸)-6-[2-(3,4디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다. 상기 활성 라디칼 발생제로는, 예를 들면, 2,4,6-트리메틸벤조일디페닐포스핀옥사이드, 2,2,-비스(o-클로르로페닐)-4,4', 5,5'-테트라페닐-1,2'-비이미다졸, 10-부틸-2-클로로아크리돈, 2-에틸안트라퀴논, 벤질, 9,10-페난트렌퀴논, 캄포르퀴논, 페닐글리옥실산메틸, 티타노센 화합물 등을 사용할 수 있다. As said active radical generating agent, a benzoin type compound, a benzophenone type compound, a thioxanthone type compound, a triazine type compound, etc. are mentioned, for example. As said benzoin type compound, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoisobutyl ether, etc. are mentioned, for example. As said benzophenone type compound, for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'-tetra (t-butylperoxycarbonyl) benzophenone, 2,4, 6-trimethyl benzophenone, etc. are mentioned. As said thioxanthone type compound, 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro, for example 4-propoxy city oxanthone etc. are mentioned. As said triazine type compound, 2, 4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1, 3, 5- triazine, 2, 4-bis (trichloromethyl ) -6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxystyryl) -1,3,5- Triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloro Methyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino -2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4dimethoxyphenyl) ethenyl] -1,3, 5-triazine etc. are mentioned. Examples of the active radical generator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2, -bis (o-chlorophenyl) -4,4 ', 5,5'-tetra Phenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene Compounds and the like can be used.
상기 산발생제로는 예를 들면, 4-히드록시페닐디메틸설포늄 p-톨루엔설포네이트, 4-히드록시페닐디메틸설포늄헥사플루오로안티모네이트, 4-아세톡시페닐디메틸설포늄 p-톨루엔설포네이트, 4-아세톡시페닐메틸벤질설포늄헥사 플루오로안티모네이트, 트리페닐설포늄 p-톨루엔설포네이트, 트리페닐설포늄헥사플루오로안티모네이트, 디페닐요오도늄 p-톨루엔설포네이트, 디페닐요오도늄헥사플루오로안티모네이트 등의 오늄염류나 니트로벤질토실레이트류, 벤조인토실레이트류 등을 들 수 있다. 또한, 활성 라디칼 발생제로서 상기 화합물 중에는 활성 라디칼과 동시에 산을 발생하는 화합물도 있으며, 예를들면, 트리아진계 광중합 개시제는 산 발생제로서도 사용된다. Examples of the acid generator include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate and 4-acetoxyphenyldimethylsulfonium p-toluenesulfo. Acetate, 4-acetoxyphenylmethylbenzylsulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium p-toluenesulfonate, Onium salts, such as diphenyl iodonium hexafluoro antimonate, nitrobenzyl tosylate, benzoin tosylate, etc. are mentioned. In addition, there are some compounds which generate an acid simultaneously with the active radicals in the compound as an active radical generator, for example, a triazine photopolymerization initiator is also used as an acid generator.
본 발명에 따른 감광성 수지 조성물에 사용되는 상기 광중합 개시제의 함유량은, 고형분 전체 100 중량부를 기준으로 상기 알칼리 가용성 수지 및 상기 광중합성 화합물의 합계량에 대해서 통상 0.1 내지 40 중량부, 바람직하게는 1 내지 30 중량부이다. 상기의 범위에 있으면 상기 감광성 수지 조성물이 고감도화되어 이 조성물을 사용하여 형성한 화소부의 강도나, 이 화소부의 표면에서의 평활성이 양호하게 되는 경향이 있기 때문에 바람직하다. 나아가, 본 발명에서는 광중합 개시 조제를 사용할 수 있다. 상기 광중합 개시 조제는 상기 광중합 개시제와 조합하여 사용되는 경우가 있으며, 상기 광중합 개시제에 의해 중합이 개시된 광중합성 화합물의 중합을 촉진시키기 위해 사용되는 화합물이다. 상기 광중합 개시 조제로서는, 아민계 화합물, 알콕시안트라센계 화합물, 티옥산톤계 화합물 등을 들수 있다.Content of the said photoinitiator used for the photosensitive resin composition which concerns on this invention is 0.1-40 weight part normally with respect to the total amount of the said alkali-soluble resin and the said photopolymerizable compound based on 100 weight part of solid content whole, Preferably it is 1-30. Parts by weight. When it exists in the said range, since the said photosensitive resin composition becomes highly sensitive and the intensity | strength of the pixel part formed using this composition and the smoothness in the surface of this pixel part tend to become favorable, it is preferable. Furthermore, in this invention, photoinitiator start adjuvant can be used. The said photoinitiator adjuvant may be used in combination with the said photoinitiator, and is a compound used in order to accelerate superposition | polymerization of the photopolymerizable compound in which superposition | polymerization was started by the said photoinitiator. An amine compound, an alkoxy anthracene type compound, a thioxanthone type compound etc. are mentioned as said photoinitiator starting adjuvant.
아민계 화합물로는, 예를 들면, 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이소아밀, 벤조산2-디메틸아미노에틸, 4-디메틸아미노벤조산 2-에틸헥실, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤즈페논(통칭, 미힐러즈케톤), 4,4'-비스(디에틸아미노)벤조페논, 4,4'-비스(에틸메틸아미노)벤조페논 등을 들 수 있으며, 이 중에서도 4,4'-비스(디에틸아미노)벤조페논이 바람직하다. 알콕시안트라센계 화합물로는, 예를 들면, 9,10-디메톡시안트라센, 2-에틸-9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디에톡시안트라센 등을 들 수 있다. 티옥산톤계화합물로는, 예를 들면, 2-이소프로필티옥산톤, 4-이소프로필티옥산톤, 2,4-디에틸티옥산톤, 2,4-디클로로티옥산톤, 1-클로로-4-프로폭시티옥산톤 등을 들 수 있다. 이러한 광중합 개시제(D)는 단독으로 또는 복수를 조합하여 사용해도 지장이 없다. 또한, 광중합 개시 조제로서시판되는 것을 사용할 수 있으며, 시판되는 광중합 개시 조제로는, 예를 들면, 상품명 「EAB-F」[제조원: 호도가야가가쿠고교가부시키가이샤] 등을 들 수 있다.Examples of the amine compound include triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 2-dimethylamino benzoic acid. Ethyl, 2-ethylhexyl 4-dimethylaminobenzoic acid, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzphenone (commonly known as Michler's ketone), 4,4'-bis (diethyl Amino) benzophenone, 4, 4'-bis (ethylmethylamino) benzophenone, etc. are mentioned, Among these, 4,4'-bis (diethylamino) benzophenone is preferable. As an alkoxy anthracene type compound, 9,10- dimethoxy anthracene, 2-ethyl-9,10- dimethoxy anthracene, 9,10- diethoxy anthracene, 2-ethyl-9, 10- diethoxy anthracene, for example. Etc. can be mentioned. As a thioxanthone type compound, 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro- 4-propoxy city oxanthone etc. are mentioned. These photoinitiators (D) may be used alone or in combination of a plurality thereof. In addition, a commercially available thing can be used as a photoinitiator starter, As a commercially available photoinitiator starter, brand name "EAB-F" (manufacturer: Hodogaya Chemical Co., Ltd.) etc. are mentioned, for example.
이들 광중합 개시 조제를 사용하는 경우, 이의 사용량은 광중합 개시제 1 몰당 통상적으로 10 몰 이하, 바람직하게는 0.01~5 몰이 바람직하다. 상기의 범위에 있으면 상기 감광성 수지 조성물의 감도가 더 높아지고, 이 조성물을 사용하여 형성되는 컬러필터의 생산성이 향상되는 경향이 있기 때문에 바람직하다.In the case of using these photopolymerization initiation aids, the amount thereof is usually 10 mol or less, preferably 0.01 to 5 mol, per mol of the photopolymerization initiator. If it exists in the said range, since the sensitivity of the said photosensitive resin composition becomes higher and the productivity of the color filter formed using this composition tends to improve, it is preferable.
용제solvent
본 발명의 감광성 수지 조성물에 함유되는 용제는 특별히 제한되지 않으며 감광성 수지 조성물의 분야에서 사용되고 있는 각종 유기 용제를 사용할 수 있다. 그의 구체예로서는 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르,에틸렌글리콜모노부틸에테르 등의 에틸렌글리콜모노알킬에테르류, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르 등의 디에틸렌글리콜디알킬에테르류,메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트 등의 에틸렌글리콜알킬에테르아세테이트류, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 메톡시부틸아세테이트 및 메톡시펜틸아세테이트 등의 알킬렌글리콜알킬에테르아세테이트류, 벤젠, 톨루엔, 크실렌, 메시틸렌 등의 방향족 탄화수소류, 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논등의 케톤류, 에탄올, 프로판올, 부탄올, 헥사놀, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올류, 3-에톡시프로피온산 에틸, 3-메톡시프로피온산 메틸 등의 에스테르류, γ-부티롤락톤 등의 환상 에스테르류 등을 들수 있다. 상기의 용제 중, 도포성, 건조성면에서 바람직하게는 상기 용제 중에서 비점이 100℃ 내지 200℃인 유기 용제를 들 수 있고, 보다 바람직하게는 알킬렌글리콜알킬에테르아세테이트류, 케톤류, 3-에톡시프로피온산 에틸이나, 3-메톡시프로피온산 메틸 등의 에스테르류를 들 수 있으며, 더욱 바람직하게는 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 시클로헥사논, 3-에톡시프로피온산 에틸, 3-메톡시프로피온산 메틸 등을 들 수 있다. 상기 용제는 각각 단독으로 또는 2종류 이상 혼합하여 사용할 수 있다.The solvent contained in the photosensitive resin composition of this invention is not specifically limited, Various organic solvents used in the field of the photosensitive resin composition can be used. Specific examples thereof include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene. Diethylene glycol dialkyl ethers such as glycol dipropyl ether and diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, and propylene glycol Alkylene glycol alkyl ether acetates such as monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxy butyl acetate and methoxy pentyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene, mesitylene, methyl ethyl ketone, acetone , Ketones such as methyl amyl ketone, methyl isobutyl ketone, cyclohexanone, alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerin, ethyl 3-ethoxypropionate, 3-methoxypropionic acid Esters such as methyl, and cyclic esters such as γ-butyrolactone. Among the solvents described above, organic solvents having a boiling point of 100 ° C. to 200 ° C. in the coating properties and drying properties are preferable, and alkylene glycol alkyl ether acetates, ketones, and 3-ethoxy are more preferable. Ester, such as ethyl propionate and the methyl 3-methoxy propionate, is mentioned, More preferably, propylene glycol monomethyl ether acetate, a propylene glycol monoethyl ether acetate, cyclohexanone, 3-ethoxy propionate, 3- Methyl methoxy propionate etc. are mentioned. The said solvent can be used individually or in mixture of 2 or more types, respectively.
본 발명의 감광성 수지 조성물 중의 상기 용제의 함유량은 그것을 포함하는 상기 감광성 수지 조성물 전체 100 중량부에 대하여 통상 60 내지 90 중량부, 바람직하게는 70 내지 85 중량부이다. 상기 용제의 함유량이 상기 범위를 만족하는 경우 롤 코터, 스핀 코터, 슬릿 앤드 스핀 코터, 슬릿 코터(다이 코터라고도 하는 경우가 있음), 잉크젯 등의 도포 장치로 도포했을 때 도포성이 양호해지는 경향이 있기 때문에 바람직하다.Content of the said solvent in the photosensitive resin composition of this invention is 60-90 weight part normally with respect to 100 weight part of whole said photosensitive resin composition containing it, Preferably it is 70-85 weight part. When the content of the solvent satisfies the above range, the applicability tends to be good when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, or the like. It is preferable because there is.
첨가제additive
본 발명의 감광성 수지 조성물에는 필요에 따라 충진제, 다른 고분자 화합물, 안료 분산제. 밀착 촉진제, 산화 방지제, 자외선 흡수제, 응집 방지제 등의 첨가제를 병행하는 것도 가능하다. The photosensitive resin composition of this invention is a filler, another high molecular compound, a pigment dispersant as needed. It is also possible to use additives, such as an adhesion promoter, an antioxidant, a ultraviolet absorber, and an aggregation inhibitor.
상기 충진제의 구체적인 예는 유리, 실리카, 알루미나 등이 예시된다. 상기 다른 고분자 화합물로서는 구체적으로 에폭시 수지, 말레이미드 수지 등의 경화성 수지, 폴리비닐알코올, 폴리아크릴산, 폴리에틸렌글리콜모노알킬에테르, 폴리플루오로알킬아크릴레이트, 폴리에스테르, 폴리우레탄 등의 열가소성 수지 등을 들 수 있다. 상기 안료 분산제로서는 시판되는 계면 활성제를 이용할 수 있고, 예를 들면 실리콘계, 불소계, 에스테르계, 양이온계, 음이온계, 비이온계, 양성 등의 계면 활성제 등을 들 수 있다. 이들은 각각 단독으로 또는 2종 이상을 조합하여 사용될 수 있다. 상기의 계면 활성제로서, 예를 들면 폴리옥시에틸렌알킬에테르류, 폴리옥시에틸렌알킬페에테르류, 폴리에틸렌글리콜 디에스테르류, 소르비탄 지방상 에스테르류, 지방산 변성 폴리에스테르류, 3급아민 변성 폴리우레탄류, 폴리에틸렌이민류 등이 있으며 이외에, 상품명으로 KP(신에쯔 가가꾸 고교㈜ 제조), 폴리플로우(POLYFLOW)(교에이샤 가가꾸㈜ 제조), 에프톱(EFTOP)(토켐 프로덕츠사 제조), 메가팩(MEGAFAC)(다이닛본 잉크 가가꾸 고교㈜ 제조), 플로라드(Flourad)(스미또모 쓰리엠㈜ 제조), 아사히가드(Asahi guard), 서플(Surflon)(이상, 아사히 글라스㈜ 제조), 솔스퍼스(SOLSPERSE)(제네까㈜ 제조), EFKA(EFKA 케미칼스사 제조), PB 821(아지노모또㈜ 제조) 등을 들 수 있다. 상기 밀착 촉진제로서, 예를 들면 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리스(2-메톡시에톡시)실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 3-머캅토프로필트리메톡시실란 등을 들 수 있다. 상기 산화 방지제로서는 구체적으로 2,2'-티오비스(4-메틸-6-t-부틸페놀), 2,6-디-t-부틸-4-메틸페놀 등을 들 수 있다. 자외선 흡수제로서는 구체적으로 2-(3-tert-부틸-2-히드록시-5-메틸페닐)-5-클로로벤조티리아졸, 알콕시벤조페논 등을 들 수 있다. 응집 방지제로서는 구체적으로 폴리아크릴산 나트륨 등을 들 수 있다.Specific examples of the filler include glass, silica, alumina and the like. Specific examples of the other polymer compound include curable resins such as epoxy resins and maleimide resins, thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ethers, polyfluoroalkyl acrylates, polyesters, polyurethanes, and the like. Can be. Commercially available surfactants can be used as the pigment dispersant, and examples thereof include surfactants such as silicone, fluorine, ester, cationic, anionic, nonionic and amphoteric. These can be used individually or in combination of 2 types or more, respectively. As said surfactant, For example, polyoxyethylene alkyl ether, polyoxyethylene alkyl peer ether, polyethyleneglycol diester, sorbitan fatty acid ester, fatty acid modified polyester, tertiary amine modified polyurethane , Polyethylenimine, etc., trade names include KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by Tochem Products), MEGAFAC (manufactured by Dainippon Ink Chemical Industries, Ltd.), Florard (manufactured by Sumitomo 3M), Asahi guard, Surflon (above, manufactured by Asahi Glass), Sol SLSPERSE (made by Genka Corporation), EFKA (made by EFKA Chemicals), PB 821 (made by Ajinomoto Co., Ltd.), etc. are mentioned. As the adhesion promoter, for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminoprotriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2 -(3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyl Trimethoxysilane etc. are mentioned. Specific examples of the antioxidant include 2,2'-thiobis (4-methyl-6-t-butylphenol), 2,6-di-t-butyl-4-methylphenol, and the like. Specific examples of the ultraviolet absorber include 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzothiazole, alkoxybenzophenone and the like. Specific examples of the aggregation inhibitor include sodium polyacrylate and the like.
상기 첨가제는 본 발명의 효과를 해치지 않는 범위에서 당업자가 적절한 함량으로 추가하여 사용이 가능하다.The additive may be used by those skilled in the art in addition to an appropriate amount within the scope that does not impair the effects of the present invention.
상기 감광성 수지 조성물의 제조방법은 이에 한정되는 것은 아니지만, 예컨대 하기와 같은 방법을 통하여 제조할 수 있다.The method of preparing the photosensitive resin composition is not limited thereto, and for example, the photosensitive resin composition may be prepared by the following method.
산란입자를 미리 용제와 혼합하여 평균입경이 30 내지 500nm가 될 때까지 비드 밀 등을 이용하여 분산시킨다. 이때, 필요에 따라 분산제를 추가로 사용할 수 있고, 알칼리 가용성 수지의 일부 또는 전부가 배합될 수도 있다. 얻어진 분산액(이하, 밀 베이스라고 하는 경우도 있음)에 알칼리 가용성 수지의 나머지, 광중합성 화합물, 광중합 개시제, 필요에 따라 사용되는 그밖의 성분과 필요에 따라 추가의 용제를 소정의 농도가 되도록 더 첨가하여 목적하는 감광성 수지 조성물을 얻을 수 있다.The scattering particles are mixed with the solvent in advance and dispersed using a bead mill or the like until the average particle diameter becomes 30 to 500 nm. At this time, a dispersing agent can be further used as needed, and some or all of alkali-soluble resin may be mix | blended. The remainder of alkali-soluble resin, a photopolymerizable compound, a photoinitiator, the other components used as needed, and the additional solvent as needed are further added to the obtained dispersion liquid (henceforth a mill base) so that it may become a predetermined concentration. To obtain the desired photosensitive resin composition.
<컬러필터 및 화상표시장치><Color filter and image display device>
본 발명의 또 다른 양태는 전술한 감광성 수지 조성물의 경화물을 포함하는 청색 패턴층을 포함하는 자발광 화소 함유 컬러필터에 관한 것이다.Another aspect of the present invention relates to a self-luminous pixel-containing color filter comprising a blue pattern layer containing a cured product of the photosensitive resin composition described above.
본 발명에 있어서, 상기 감광성 수지 조성물은 청색 패턴층 형성용 감광성 수지 조성물일 수 있다. 본 발명에 있어서, 상기 감광성 수지 조성물은 양자점을 포함하지 않는다.In the present invention, the photosensitive resin composition may be a photosensitive resin composition for forming a blue pattern layer. In this invention, the said photosensitive resin composition does not contain a quantum dot.
본 발명에 따른 컬러필터는 청색 양자점 대신 전술한 감광성 수지 조성물로 제조되기 때문에 제조단가를 낮출 수 있고, 우수한 시야각을 가지는 이점이 있다.Since the color filter according to the present invention is made of the photosensitive resin composition described above instead of blue quantum dots, the manufacturing cost can be lowered, and there is an advantage of having an excellent viewing angle.
상기 컬러필터는 기판 및 상기 기판의 상부에 형성된 청색 패턴층을 포함한다.The color filter includes a substrate and a blue pattern layer formed on the substrate.
상기 기판은 상기 컬러필터 자체 기판일 수 있으며, 또는 디스플레이 장치 등에 컬러필터가 위치되는 부위일 수도 있는 것으로, 특별히 제한되지 않는다. 상기 기판은 유리, 실리콘(Si), 실리콘 산화물(SiOx) 또는 고분자 기판일 수 있으며, 상기 고분자 기판은 폴리에테르설폰(polyethersulfone, PES) 또는 폴리카보네이트(polycarbonate, PC) 등일 수 있다.The substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
상기 청색 패턴층은 본 발명의 감광성 수지 조성물을 포함하는 층으로, 상기 감광성 수지 조성물을 도포하고 소정의 패턴으로 노광, 현상 및 열경화하여 형성된 층일 수 있으며, 상기 패턴층은 당업계에서 통상적으로 알려진 방법을 수행함으로써 형성할 수 있다. The blue pattern layer is a layer including the photosensitive resin composition of the present invention, and may be a layer formed by applying the photosensitive resin composition and exposing, developing, and thermosetting in a predetermined pattern, and the pattern layer is commonly known in the art. It can form by performing a method.
상기 컬러필터는 적색 패턴층 및 녹색 패턴층으로 이루어진 군에서 선택되는 1 이상을 더 포함할 수 있다. 요컨대, 본 발명에 따른 컬러필터는 전술한 청색 패턴층을 포함하고, 적색 패턴층 및 녹색 패턴층으로 이루어진 군에서 선택되는 1 이상을 더 포함하는 자발광 화소를 함유할 수 있다.The color filter may further include one or more selected from the group consisting of a red pattern layer and a green pattern layer. In other words, the color filter according to the present invention may include the above-described blue pattern layer, and may further include a self-luminous pixel further comprising at least one selected from the group consisting of a red pattern layer and a green pattern layer.
상기 적색 패턴층 또는 녹색 패턴층은 양자점 및 산란입자를 포함할 수 있다. 구체적으로, 본 발명에 따른 컬러필터는 적 양자점을 포함하는 적색 패턴층 또는 녹 양자점을 포함하는 녹색 패턴층을 포함할 수 있으며, 상기 적색 패턴층 또는 녹색 패턴층은 산란입자를 포함할 수 있다. 상기 적색 패턴층 또는 녹색 패턴층은 후술할 청색광을 방출하는 광원에 의하여 각각 적색광 또는 청색광을 방출할 수 있다.The red pattern layer or the green pattern layer may include quantum dots and scattering particles. Specifically, the color filter according to the present invention may include a red pattern layer including a red quantum dot or a green pattern layer including a green quantum dot, and the red pattern layer or the green pattern layer may include scattering particles. The red pattern layer or the green pattern layer may emit red light or blue light, respectively, by a light source emitting blue light, which will be described later.
상기 산란입자는 평균입경이 30 내지 500nm인 금속산화물을 포함할 수 있으며, 상기 산란입자 및 금속산화물에 관한 내용은 본 발명에 따른 감광성 수지 조성물 내에 포함되는 산란입자 및 금속산화물에 관한 내용을 적용할 수 있다.The scattering particles may include a metal oxide having an average particle diameter of 30 to 500 nm, and the content of the scattering particles and the metal oxide may be applied to the content of the scattering particles and the metal oxide included in the photosensitive resin composition according to the present invention. Can be.
본 발명에 있어서, 상기 적색 패턴층 또는 녹색 패턴층에 포함되는 양자점의 형태, 구성 및 그 함량은 한정되지 않으며, 당업계에서 통상적으로 사용되는 양자점을 적용할 수 있다.In the present invention, the shape, configuration, and content of the quantum dots included in the red pattern layer or the green pattern layer are not limited, and quantum dots commonly used in the art may be applied.
상기와 같은 기판 및 패턴층을 포함하는 컬러필터는 각 패턴 사이에 형성된 격벽을 더 포함할 수 있으며, 블랙 매트릭스를 더 포함할 수 있으나 이에 한정되지는 않는다.The color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
본 발명의 또 다른 양태는, 전술한 컬러필터; 및 청색광을 방출하는 광원;을 포함하는 화상표시장치에 관한 것이다. 요컨대, 본 발명에 따른 화상표시장치는 전술한 감광성 수지 조성물의 경화물을 포함하는 청색 패턴층을 포함하는 컬러필터와 청색광을 방출하는 광원을 포함한다.Another aspect of the invention, the above-described color filter; And a light source emitting blue light. In short, the image display apparatus according to the present invention includes a color filter including a blue pattern layer including a cured product of the photosensitive resin composition described above, and a light source emitting blue light.
본 발명의 컬러필터는 통상의 액정 표시 장치뿐만 아니라, 전계 발광 표시장치, 플라스마 표시 장치, 전계 방출 표시 장치 등 각종 화상 표시 장치에 적용이 가능하다.The color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
상기 화상표시장치가 본 발명에 따른 청색 패턴층을 포함하는 컬러필터와 상기 광원을 포함하는 경우 우수한 발광강도 또는 시야각을 가지는 이점이 있다. 또한, 본 발명에 따른 컬러필터에 포함되는 청색 패턴층은 청색 양자점을 포함하지 않기 때문에 제조단가가 낮은 화상표시장치를 제조할 수 있는 이점이 있다.When the image display device includes a color filter including a blue pattern layer and the light source according to the present invention, there is an advantage of having excellent light emission intensity or viewing angle. In addition, since the blue pattern layer included in the color filter according to the present invention does not include blue quantum dots, there is an advantage in that an image display device having low manufacturing cost can be manufactured.
이하, 본 명세서를 구체적으로 설명하기 위해 실시예를 들어 상세히 설명한다. 그러나, 본 명세서에 따른 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 명세서의 범위가 아래에서 상술하는 실시예들에 한정되는 것으로 해석되지는 않는다. 본 명세서의 실시예들은 당업계에서 평균적인 지식을 가진 자에게 본 명세서를 보다 완전하게 설명하기 위해 제공되는 것이다. 또한, 이하에서 함유량을 나타내는 "%" 및 "부"는 특별히 언급하지 않는 한 중량 기준이다.Hereinafter, the present invention will be described in detail with reference to Examples. However, the embodiments according to the present disclosure may be modified in various other forms, and the scope of the present specification is not to be interpreted as being limited to the embodiments described below. The embodiments of the present specification are provided to more fully describe the present specification to those skilled in the art. In addition, "%" and "part" which show content below are a basis of weight unless there is particular notice.
합성예Synthesis Example : 알칼리 가용성 수지의 합성: Synthesis of Alkali Soluble Resin
합성예Synthesis Example 1: 알칼리 가용성 수지 1: alkali soluble resin
교반기, 온도계, 환류 냉각관, 적하 로트 및 질소 도입관을 구비한 플라스크를 준비하고, 한편, 모노머 적하 로트로서, 벤질말레이미드 74.8g(0.20몰), 아크릴산 43.2g(0.30몰), 비닐톨루엔 118.0g(0.50몰), t-부틸퍼옥시-2-에틸헥사노에이트 4g, 프로필렌글리콜모노메틸에테르아세테이트(PGMEA) 40g를 투입 후 교반 혼합하여 준비하고, 연쇄 이동제 적하조로서, n-도데칸티올 6g, PGMEA 24g를 넣고 교반 혼합한 것을 준비했다. 이후 플라스크에 PGMEA 395g를 도입하고 플라스크내 분위기를 공기에서 질소로 한 후 교반하면서 플라스크의 온도를 90 ℃까지 승온했다. 이어서 모노머 및 연쇄 이동제를 적하 로트로부터 적하를 개시했다. 적하는, 90 ℃를 유지하면서, 각각 2h 동안 진행하고 1h 후에 110 ℃ 승온하여 3h 유지한 뒤, 가스 도입관을 도입시켜, 산소/질소=5/95(v/v) 혼합가스의 버블링을 개시했다. 이어서, 글리시딜메타크릴레이트 28.4g[(0.10몰), (본 반응에 사용한 아크릴산의 카르복실기에 대하여 33몰%)], 2,2'-메틸렌비스(4-메틸-6-t-부틸페놀) 0.4g, 트리에틸아민 0.8g를 플라스크내에 투입하여 110℃에서 8시간 반응을 계속하고, 고형분 산가가 70㎎KOH/g인 수지 A를 얻었다. GPC에 의해 측정한 폴리스티렌 환산의 중량평균분자량은 16,000이고, 분자량 분포(Mw/Mn)는 2.3이었다.A flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping lot, and a nitrogen introduction tube was prepared, and as a monomer dropping lot, 74.8 g (0.20 mole) of benzylmaleimide, 43.2 g (0.30 mole) of acrylic acid, and vinyltoluene 118.0 g (0.50 mol), 4 g of t-butylperoxy-2-ethylhexanoate and 40 g of propylene glycol monomethyl ether acetate (PGMEA) were added thereto, followed by stirring and mixing. As a chain transfer agent dropping tank, n-dodecanethiol 6g and PGMEA24g were added, and the thing mixed with stirring was prepared. Thereafter, 395 g of PGMEA was introduced into the flask, and the atmosphere in the flask was changed to nitrogen from air, followed by stirring, thereby raising the temperature of the flask to 90 ° C. Subsequently, dropping of the monomer and the chain transfer agent was started from the dropping lot. The dropwise addition was performed for 2 h while maintaining 90 ° C., and after 1 h, the temperature was raised to 110 ° C. and maintained for 3 h. Then, a gas introduction tube was introduced to prevent bubbling of oxygen / nitrogen = 5/95 (v / v) mixed gas. Started. Next, 28.4 g glycidyl methacrylate [(0.10 mol), (33 mol% with respect to the carboxyl group of acrylic acid used for this reaction)], 2,2'- methylenebis (4-methyl-6-t-butylphenol ) 0.4 g and 0.8 g of triethylamine were charged into a flask, and the reaction was continued at 110 ° C. for 8 hours to obtain a resin A having a solid acid value of 70 mgKOH / g. The weight average molecular weight of polystyrene conversion measured by GPC was 16,000, and molecular weight distribution (Mw / Mn) was 2.3.
합성예Synthesis Example 2: 화학식 1의 화합물의 합성  2: Synthesis of Compound of Formula 1
3000ml 삼구 라운드 플라스크에 화학식 3의 3',6'-디하이드록시스피로(플루오렌-9,9-잔텐)(3',6′'-dihydroxyspiro(fluorene-9,9-xantene) 364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 3,6-디하이드록시스피로(플루오렌-9,9-잔텐)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액(3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다.In a 3000 ml three-neck round flask, 364.4 g of 3 ', 6'-dihydroxyspiro (fluorene-9,9-xanthene) (3', 6 ''-dihydroxyspiro (fluorene-9,9-xantene) of formula 3 and t 0.4159 g of -butylammonium bromide was mixed, 2359 g of epichlorohydrin was added and heated to 90 ° C. The reaction was performed by liquid chromatography to give 3,6-dihydroxyspiro (fluorene-9,9-xanthene). Once completely consumed, it was cooled to 30 ° C. and a 50% aqueous solution of NaOH (3 equivalents) was added slowly, after analysis by liquid chromatography, epichlorohydrin was completely consumed, extracted with dichloromethane and washed three times, and then the organic layer was magnesium sulfate. After drying with dichloromethane, dichloromethane was distilled under reduced pressure and recrystallized using a dichloromethane and methanol mixture ratio of 50:50.
이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 아크릴산 2.2당량을 혼합한 후 용매 프로피렌 글리콜 모노메틸 에테르 아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 1의 화합물을 얻었다.Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol, and 2.2 equivalent of acrylic acid were mixed, and then 24.89 g of solvent propylene glycol monomethyl ether acetate was added thereto. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula (1).
합성예Synthesis Example 3 : 화학식 2의 화합물의 합성 3: Synthesis of Compound of Formula 2
3000ml 삼구 라운드 플라스크에 화학식 4의 4,4'-(9H-잔텐-9,9-디일)디페놀(4,4'-(9H-xanthene-9,9-diyl)diphenol)364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 4,4'-(9H-잔텐-9,9-디일)디페놀 (4,4'-(9Hxanthene-9,9-diyl)diphenol)이 완전히 소진되면 30로 냉각하여 50% NaOH 수용액 (3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다. 이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 아크릴산 2.2당량을 혼합한 후 용매 프로필렌글리콜모노메틸에테르아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 2 의 화합물을 얻었다.In a 3000 ml three-neck round flask, 364.4 g of 4,4 '-(9H-xanthene-9,9-diyl) diphenol (4,4'-(9H-xanthene-9,9-diyl) diphenol) of formula 4 and t- 0.4159 g of butylammonium bromide was mixed, 2359 g of epichlorohydrin was added thereto, and the mixture was heated and reacted at 90 ° C. After liquid chromatography, 4,4 '-(9H-xanthene-9,9-diyl) diphenol (4,4'-(9Hxanthene-9,9-diyl) diphenol) is completely depleted. Aqueous% aqueous NaOH solution (3 equiv) was added slowly. After epichlorohydrin was completely exhausted by liquid chromatography, the mixture was extracted with dichloromethane and washed three times. The organic layer was dried over magnesium sulfate, and dichloromethane was distilled under reduced pressure, and the mixture ratio of dichloromethane and methanol was 50:50. Recrystallized. Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol and 2.2 equivalent of acrylic acid were mixed, and then 24.89 g of solvent propylene glycol monomethyl ether acetate was added thereto and mixed. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula (2).
합성예Synthesis Example 4 :  4 : 카도계Cardo system 바인더 수지의 합성(A-1) Synthesis of Binder Resin (A-1)
합성예 2의 화학식 1의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 비페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃ 에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다. 고형분 산가가 70㎎KOH/g인 수지 A-1를 얻었다. GPC에 의해 측정한 폴리스티렌 환산의 중량평균분자량은 4,530 이었다.After dissolving by adding 600 g of propylene glycol monomethyl ether acetate to 307.0 g of the compound of Formula 1 of Synthesis Example 2, 78 g of biphenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually heated up at 110 to 115 ° C. The reaction was carried out for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo binder resin. Loss of anhydride was confirmed by IR spectrum. Resin A-1 whose solid acid value was 70 mgKOH / g. The weight average molecular weight of polystyrene conversion measured by GPC was 4,530.
합성예Synthesis Example 5 :  5: 카도계Cardo system 바인더 수지의 합성(A-2) Synthesis of Binder Resin (A-2)
합성예 3의 화학식 2의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃ 에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다. 고형분 산가가 98㎎KOH/g인 수지 A-2를 얻었다. GPC에 의해 측정한 폴리스티렌 환산의 중량평균분자량은 3,830 이었다.After dissolving by adding 600 g of propylene glycol monomethyl ether acetate to 307.0 g of the compound of Formula 2 of Synthesis Example 2, 78 g of phenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually warmed to 4 at 110 to 115 ° C. The reaction was carried out for a time. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo binder resin. Loss of anhydride was confirmed by IR spectrum. Resin A-2 whose solid acid value was 98 mgKOH / g. The weight average molecular weight of polystyrene conversion measured by GPC was 3,830.
합성예Synthesis Example 6:  6: 카도계Cardo system 바인더 수지의 합성(B-1, B-2) Synthesis of Binder Resin (B-1, B-2)
(1) 합성예 6-1: 2,2'-((((9H-플루오렌-9,9-디일)비스(4,1-페닐렌))비스(옥시))비스(메틸렌))비스(옥시란)(2,2'-((((9H-fluorene-9,9-diyl)bis(4,1-phenylene))bis(oxy))bis(methylene))bis(oxirane))의 합성(1) Synthesis Example 6-1: 2,2 '-((((9H-fluorene-9,9-diyl) bis (4,1-phenylene)) bis (oxy)) bis (methylene)) bis Synthesis of (oxirane) (2,2 '-((((9H-fluorene-9,9-diyl) bis (4,1-phenylene)) bis (oxy)) bis (methylene)) bis (oxirane))
9,9-비스페놀플루오렌(9,9-bispehnolfluorene 42.5g을 넣고 2-(클로로메틸)옥시란(2-(chloromethyl)oxirane) 220ml와 t-부틸암모늄 브로마이드(t-butylammonium bromide) 100mg를 함께 90℃에서 반응물이 모두 소진될 때까지 교반한 후, 감압 증류한다. 다시 온도를 30℃ 낮추고 디클로로메테인(dichloromethane)을 주입 후 NaOH를 서서히 투입하였다. 생성물이 96% 이상인 것을 고성능액체크로마토그래피(HPLC)방법으로 확인한 후 5% HCl을 적하하여 반응을 종결하였다. 반응물은 추출하여 층분리한 후, 유기층을 물로 씻어주고 중성이 되도록 세척하였다. 유기층은 MgSO4로 건조한 후 회전증발기로 감압 증류하여 농축하였다. 농축된 생성물에 디클로로메테인(dichloromethane)을 넣고 40℃까지 온도를 올리면서 교반하면서 메탄올(methanol)을 투입한 후 용액 온도를 낮추고 교반하였다. 생성된 고체를 여과한 후, 상온에서 진공 건조하여 흰색 고체 분말 52.7g(수율 94%)을 얻었다. Add 42.5 g of 9,9-bispehnolfluorene, add 220 ml of 2- (chloromethyl) oxirane and 100 mg of t-butylammonium bromide. The reaction mixture was stirred until the reaction mixture was exhausted at 0 ° C., and then distilled under reduced pressure, the temperature was lowered 30 ° C., dichloromethane was injected, and NaOH was slowly added thereto. The reaction was terminated by dropping 5% HCl, and the reaction was extracted and separated into layers, the organic layer was washed with water and washed to neutrality.The organic layer was dried over MgSO 4 and concentrated under reduced pressure with a rotary evaporator. Dichloromethane was added to the concentrated product, methanol was added while stirring while raising the temperature to 40 ° C., and the solution temperature was lowered and stirred. After excessive, and vacuum-dried at room temperature to give a solid white powder 52.7g (94% yield).
(2) 합성예 6-2: 3,3'-((9H-플루오렌-9,9-디일)비스(4,1-페닐렌))비스((옥시))비스(1-페닐티오)프로판-2-올)(3,3'-(((9H-Fluorene-9,9-diyl)bis(4,1-phenylene))bis(oxy))bis(1-(phenylthio)propan-2-ol)) (BTCP) 합성(2) Synthesis Example 6-2: 3,3 '-((9H-fluorene-9,9-diyl) bis (4,1-phenylene)) bis ((oxy)) bis (1-phenylthio) Propan-2-ol) (3,3 '-(((9H-Fluorene-9,9-diyl) bis (4,1-phenylene)) bis (oxy)) bis (1- (phenylthio) propan-2- ol)) (BTCP) synthesis
합성예 6-1의 화합물 (1000g), 티오페놀(thiophenol) 524g, 에탄올 617g을 넣고 교반하였다. 반응 용액에 triethylamine 328g을 천천히 적가하였다. 고성능액체크로마토그래피(HPLC)방법으로 출발물질이 사라진 것을 확인한 후, 반응을 종료하였다. 반응 완료 후, 에탄올을 감압증류하여 제거하였다. 유기물을 디클로로메테인(dichloromethane)에 녹인 후 물로 세척한 후 디클로로메테인(dichloromethane)을 감압증류를 통해 제거하였다. 농축된 유기물은 에틸 아세테이트(ethyl acetate)에 녹인 후 에테르 용매를 적가하고 30분동안 교반하였다. 화합물을 감압증류하여 옅은 노란색 기름(pale yellow oil) 945g (수율 64%)을 얻었다. The compound (1000g) of synthesis example 6-1, 524g of thiophenols, and 617g of ethanol were added and stirred. Triethylamine 328 g was slowly added dropwise to the reaction solution. After confirming that the starting material disappeared by high performance liquid chromatography (HPLC) method, the reaction was terminated. After the reaction was completed, ethanol was removed by distillation under reduced pressure. The organics were dissolved in dichloromethane, washed with water, and then dichloromethane was removed by distillation under reduced pressure. The concentrated organics were dissolved in ethyl acetate and ether ether was added dropwise and stirred for 30 minutes. The compound was distilled under reduced pressure to give 945 g (64%) of pale yellow oil.
(3) 합성 예 6-3 : 카도계 바인더 수지의 합성 (B-1)(3) Synthesis Example 6-3: Synthesis of Cardo-Based Binder Resin (B-1)
50% PGMEA 용매에 녹아있는 BTCP 모노머 200g을 넣고 115℃까지 승온시켰다. 115℃에서 3,3',4,4'-비페닐테트라카복실릭 디안하이드리드(3,3',4,4'-Biphenyltetracarboxylic dianhydride) 31.1g을 적하한 후, 6시간 동안 115℃를 유지하면서 교반시켰다. 프탈릭 안하이드리드(Phthalic anhydride) 7.35g을 넣고 2시간 더 교반한 후, 반응을 종료하였다. 냉각 후 중량평균 분자량 3,500g/mol인 바인더 수지를 얻었다.200 g of BTCP monomer dissolved in 50% PGMEA solvent was added thereto, and the temperature was increased to 115 ° C. 31.1 g of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (3,3', 4,4'-Biphenyltetracarboxylic dianhydride) was added dropwise at 115 ° C, and then maintained at 115 ° C for 6 hours. Stirred. 7.35 g of phthalic anhydride was added thereto, stirred for another 2 hours, and the reaction was terminated. After cooling, a binder resin having a weight average molecular weight of 3,500 g / mol was obtained.
(4) 합성 예 6-4 : 카도계 바인더 수지의 합성 (B-2) (4) Synthesis Example 6-4: Synthesis of Cardo-Based Binder Resin (B-2)
50% PGMEA 용매에 녹아 있는 BTCP 모노머 200g을 넣고 115℃까지 승온시켰다. 115℃에서 Pyromellitic dianhydride 21.1g을 적하한 후 6시간동안 115℃를 유지하면서 교반시켰다. Phthalic anhydride 7.35g을 넣고 2시간 더 교반한 후 반응을 종료하였다. 냉각 후 중량 평균 분자량이 4,500g/mol인 바인더 용액을 얻었다. 200 g of BTCP monomer dissolved in 50% PGMEA solvent was added thereto, and the temperature was increased to 115 ° C. After dropping 21.1 g of Pyromellitic dianhydride at 115 ° C., the mixture was stirred while maintaining 115 ° C. for 6 hours. 7.35 g of Phthalic anhydride was added thereto, followed by further stirring for 2 hours to terminate the reaction. After cooling, a binder solution having a weight average molecular weight of 4,500 g / mol was obtained.
이때, 수지의 중량평균분자량(Mw) 측정에 대해서는 GPC 법을 이용하여 이하의 조건으로 행하였다.At this time, the weight average molecular weight (Mw) measurement of resin was performed on condition of the following using GPC method.
장치 : HLC-8120GPC(도소㈜ 제조)Equipment: HLC-8120GPC (manufactured by Tosoh Corporation)
칼럼 : TSK-GELG4000HXL + TSK-GELG2000HXL(직렬 접속)Column: TSK-GELG4000HXL + TSK-GELG2000HXL (Serial Connection)
칼럼 온도 : 40℃Column temperature: 40 ℃
이동상 용제 : 테트라히드로퓨란Mobile phase solvent: tetrahydrofuran
유속 : 1.0 ㎖/분Flow rate: 1.0 ml / min
주입량 : 50 ㎕Injection volume: 50 μl
검출기 : RIDetector: RI
측정 시료 농도 : 0.6 중량%(용제 = 테트라히드로퓨란)Sample concentration: 0.6 wt% (solvent = tetrahydrofuran)
교정용 표준 물질 : TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500(도소㈜ 제조)Calibration standard: TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500 (manufactured by Tosoh Corporation)
실시예Example 1 내지 46  1 to 46 비교예Comparative example 1 내지 10: 감광성 수지 조성물의 제조 1 to 10: Preparation of Photosensitive Resin Composition
하기 표 1 내지 4의 조성에 따라, 실시예 및 비교예에 따른 감광성 수지 조성물을 제조하였다(표 1은 산란입자를 나타내고, 표 2는 청색 및 자색 착색제를 나타내며, 표 3 내지 표 7은 실시예에 따른 감광성 수지 조성물, 표 8 및 표 9는 비교예에 따른 감광성 수지 조성물의 구성 및 함량을 나타낸다).According to the composition of Tables 1 to 4, a photosensitive resin composition according to Examples and Comparative Examples was prepared (Table 1 shows scattering particles, Table 2 shows blue and purple colorants, Tables 3 to 7 Examples Photosensitive resin composition according to the above, Tables 8 and 9 show the composition and content of the photosensitive resin composition according to the comparative example).
종류Kinds 평균입경Average particle diameter 제품명product name 제조사manufacturer
E-1E-1 TiO2 TiO 2 220 nm220 nm TR-88TR-88 훈츠만사Huntsmansa
E-2E-2 TiO2 TiO 2 30 nm30 nm TTO-55(C)TTO-55 (C) 이시하라Ishihara
E-3E-3 TiO2 TiO 2 130 nm130 nm PT-401LPT-401L 이시하라Ishihara
E-4E-4 TiO2 TiO 2 210 nm210 nm CR-63CR-63 이시하라Ishihara
E-5E-5 TiO2 TiO 2 500 nm500 nm R-960R-960 듀폰사Dupont
E-6E-6 TiO2 TiO 2 900 nm900 nm R-902R-902 듀폰사Dupont
E-7E-7 Al2O3 Al 2 O 3 50 nm50 nm 0.05㎛ Aluminapowder0.05㎛ Aluminapowder 얼라이드사Allied
E-8E-8 Al2O3 Al 2 O 3 300 nm300 nm 0.3㎛ Aluminapowder0.3㎛ Aluminapowder 얼라이드사Allied
E-9E-9 Al2O3 Al 2 O 3 1000 nm1000 nm 1.0㎛ Aluminapowder1.0㎛ Aluminapowder 얼라이드사Allied
E-10E-10 SiO2 SiO 2 2000 nm2000 nm SYLYSIA 220ASYLYSIA 220A 후지사Fujisa
종류Kinds 제품명product name 제조사manufacturer
B-1B-1 C.I.Pigment B15:6C.I.Pigment B15: 6 Fastogen Blue EP-7SFastogen Blue EP-7S DICDIC
B-2B-2 C.I.Pigment B15:4C.I.Pigment B15: 4 Fastogen Blue 5424Fastogen Blue 5424 DICDIC
B-3B-3 C.I.Pigment B15:3C.I.Pigment B15: 3 Heliogen Blue L 7072 DHeliogen Blue L 7072 D BASFBASF
B-4B-4 C.I.Pigment B16C.I.Pigment B16 Pigment Blue 16Pigment Blue 16 CPMACPMA
V-1V-1 C.I.Pigment V23C.I.Pigment V23 Fastogen Super Violet 140VFastogen Super Violet 140V DICDIC
실시예Example
1One 22 33 44 55 66 77 88 99 1010
산란입자Scattering particles E-1E-1 0.500.50 5.005.00 10.0010.00 15.0015.00 20.0020.00 10.0010.00 10.0010.00 10.0010.00 10.0010.00 --
E-2E-2 -- -- -- -- -- -- -- -- -- 10.0010.00
E-3E-3 -- -- -- -- -- -- -- -- -- --
E-4E-4 -- -- -- -- -- -- -- -- -- --
E-5E-5 -- -- -- -- -- -- -- -- -- --
E-6E-6 -- -- -- -- -- -- -- -- -- --
E-7E-7 -- -- -- -- -- -- -- -- -- --
E-8E-8 -- -- -- -- -- -- -- -- -- --
E-9E-9 -- -- -- -- -- -- -- -- -- --
E-10E-10 -- -- -- -- -- -- -- -- -- --
알칼리 가용성 수지Alkali soluble resin 카도계 수지(A-1)Cardo resin (A-1) 9.759.75 9.759.75 9.759.75 9.759.75 9.759.75 6.836.83 4.884.88 2.932.93 -- --
카도계 수지(A-2)Cardo-based resin (A-2) -- -- -- -- -- -- -- -- 9.759.75 4.884.88
아크릴계 수지(A)Acrylic resin (A) -- -- -- -- -- 2.932.93 4.884.88 6.836.83 -- 4.884.88
광중합성화합물1 ) Photopolymerizable compound 1 ) 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50
개시제2 ) Initiator 2 ) 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29
용제3 ) Solvent 3 ) 80.9680.96 76.4676.46 71.4671.46 66.4666.46 61.4661.46 71.4571.45 71.4571.45 71.4571.45 71.4671.46 71.4571.45
1) 광중합성 화합물(C): 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)1) Photopolymerizable Compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
2) 개시제(D): Irgaqure-907 (BASF사 제)2) Initiator (D): Irgaqure-907 (manufactured by BASF Corporation)
3) 용제(E): 프로필렌글리콜모노메틸에테르아세테이트3) Solvent (E): Propylene glycol monomethyl ether acetate
실시예Example
1111 1212 1313 1414 1515 1616 1717 1818 1919 2020 2121
산란입자Scattering particles E-1E-1 -- -- -- -- -- -- -- -- -- 0.100.10 50.0050.00
E-2E-2 -- -- -- -- -- -- -- -- -- -- --
E-3E-3 10.0010.00 -- -- -- -- -- -- -- -- -- --
E-4E-4 -- 10.0010.00 10.0010.00 10.0010.00 10.0010.00 10.0010.00 -- -- -- -- --
E-5E-5 -- -- -- -- -- -- 10.0010.00 -- -- -- --
E-6E-6 -- -- -- -- -- -- -- -- -- -- --
E-7E-7 -- -- -- -- -- -- -- 10.0010.00 -- --
E-8E-8 -- -- -- -- -- -- -- -- 10.0010.00 -- --
E-9E-9 -- -- -- -- -- -- -- -- -- -- --
E-10E-10 -- -- -- -- -- -- -- -- -- -- --
알칼리 가용성 수지Alkali soluble resin 카도계 수지(A-1)Cardo resin (A-1) 9.759.75 9.759.75 -- -- -- -- 9.759.75 9.759.75 9.759.75 9.759.75 9.759.75
카도계 수지(A-2)Cardo-based resin (A-2) -- -- 9.759.75 8.788.78 4.884.88 0.980.98 -- -- -- -- --
아크릴계 수지(A)Acrylic resin (A) -- -- -- 0.980.98 4.884.88 8.788.78 -- -- -- -- --
광중합성화합물1 ) Photopolymerizable compound 1 ) 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50
개시제2 ) Initiator 2 ) 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29
용제3 ) Solvent 3 ) 71.4671.46 71.4671.46 71.4671.46 71.4571.45 71.4571.45 71.4571.45 71.4671.46 71.4671.46 71.4671.46 81.3681.36 31.4631.46
1) 광중합성 화합물(C): 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)1) Photopolymerizable Compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
2) 개시제(D): Irgaqure-907 (BASF사 제)2) Initiator (D): Irgaqure-907 (manufactured by BASF Corporation)
3) 용제(E): 프로필렌글리콜모노메틸에테르아세테이트3) Solvent (E): Propylene glycol monomethyl ether acetate
  실시예Example
2222 2323 2424 2525 2626 2727 2828 2929 3030 3131
산란입자Scattering particles E-1E-1 0.500.50 5.005.00 10.0010.00 15.0015.00 20.0020.00 10.0010.00 10.0010.00 10.0010.00 10.0010.00 10.0010.00
E-2E-2 -- -- -- -- -- -- -- -- -- --
E-3E-3 -- -- -- -- -- -- -- -- -- --
E-4E-4 -- -- -- -- -- -- -- -- -- --
E-5E-5 -- -- -- -- -- -- -- -- -- --
E-6E-6 -- -- -- -- -- -- -- -- -- --
E-7E-7 -- -- -- -- -- -- -- -- -- --
E-8E-8 -- -- -- -- -- -- -- -- -- --
E-9E-9 -- -- -- -- -- -- -- -- -- --
E-10E-10 -- -- -- -- -- -- -- -- -- --
청색 착색제Blue colorant B-1B-1 0.500.50 3.003.00 3.003.00 3.003.00 3.003.00 5.005.00 15.0015.00 30.0030.00 -- --
B-2B-2 -- -- -- -- -- -- -- -- 3.003.00 --
B-3B-3 -- -- -- -- -- -- -- -- -- 3.003.00
B-4B-4 -- -- -- -- -- -- -- -- -- --
자색 착색제Purple colorant V-1V-1 -- -- -- -- -- -- -- -- --  
알칼리 가용성 수지Alkali soluble resin 카도계 수지(A-1)Cardo resin (A-1) 9.759.75 9.759.75 9.759.75 9.759.75 9.759.75 6.836.83 4.884.88 2.932.93 -- --
카도계 수지(A-2)Cardo-based resin (A-2) -- -- -- -- -- -- -- -- 9.759.75 4.884.88
아크릴계 수지(A)Acrylic resin (A) -- -- -- -- -- 2.932.93 4.884.88 6.836.83 -- 4.884.88
광중합성화합물1 ) Photopolymerizable compound 1 ) 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50
개시제2 ) Initiator 2 ) 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29
용제3 ) Solvent 3 ) 80.46 80.46 73.4673.46 68.4668.46 63.4663.46 58.4658.46 66.4566.45 56.4556.45 41.4541.45 68.4668.46 68.4568.45
1) 광중합성 화합물(C): 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)1) Photopolymerizable Compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
2) 개시제(D): Irgaqure-907 (BASF사 제)2) Initiator (D): Irgaqure-907 (manufactured by BASF Corporation)
3) 용제(E): 프로필렌글리콜모노메틸에테르아세테이트3) Solvent (E): Propylene glycol monomethyl ether acetate
  실시예Example
3232 3333 3434 3535 3636 3737 3838 3939 4040 4141
산란입자Scattering particles E-1E-1 10.0010.00 10.0010.00 10.0010.00 -- -- -- -- -- -- --
E-2E-2 -- -- -- 10.0010.00 -- -- -- -- -- --
E-3E-3  -- -- -- -- 10.0010.00 -- -- -- -- --
E-4E-4 --         10.0010.00   -- -- 10.0010.00
E-5E-5 -- -- -- -- -- -- 10.0010.00   -- --
E-6E-6 -- -- -- -- -- -- -- -- -- --
E-7E-7 -- -- -- -- -- -- -- 10.0010.00 -- --
E-8E-8 -- -- -- -- -- -- -- -- 10.0010.00 --
E-9E-9 -- -- -- -- -- -- -- -- -- --
E-10E-10 -- -- -- -- -- -- -- -- -- --
청색 착색제Blue colorant B-1B-1  -- - - 2.702.70 3.003.00 3.003.00 3.003.00 3.003.00 3.003.00 3.003.00 3.003.00
B-2B-2 -- -- -- -- -- -- -- -- -- --
B-3B-3 3.003.00 -- -- -- -- -- -- -- -- --
B-4B-4   3.003.00 -- -- -- -- -- -- -- --
자색 착색제Purple colorant V-1V-1 -- -- 0.300.30 -- -- -- -- -- -- 0.500.50
알칼리 가용성 수지Alkali soluble resin 카도계 수지(A-1)Cardo resin (A-1) 9.759.75 9.759.75 -- -- -- -- 9.759.75 9.759.75 9.759.75 9.759.75
카도계 수지(A-2)Cardo-based resin (A-2) -- -- 9.759.75 8.788.78 4.884.88 0.980.98 -- -- -- --
아크릴계 수지(A)Acrylic resin (A) -- -- -- 0.980.98 4.884.88 8.788.78 -- -- -- --
광중합성화합물1 ) Photopolymerizable compound 1 ) 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50
개시제2 ) Initiator 2 ) 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29
용제3 ) Solvent 3 ) 68.4668.46 68.4668.46 68.4668.46 68.4568.45 68.4568.45 68.4568.45 68.4668.46 68.4668.46 68.4668.46 67.9667.96
1) 광중합성 화합물(C): 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)1) Photopolymerizable Compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
2) 개시제(D): Irgaqure-907 (BASF사 제)2) Initiator (D): Irgaqure-907 (manufactured by BASF Corporation)
3) 용제(E): 프로필렌글리콜모노메틸에테르아세테이트3) Solvent (E): Propylene glycol monomethyl ether acetate
  실시예Example
4242 4343 4444 4545 4646
산란입자Scattering particles E-1E-1 1010 1010 1010 1010 1010
E-2E-2 -- -- -- -- --
E-3E-3 -- -- -- -- --
E-4E-4 -- -- -- -- --
E-5E-5 -- -- -- -- --
E-6E-6 -- -- -- -- --
E-7E-7 -- -- -- -- --
E-8E-8 -- -- -- -- --
E-9E-9 -- -- -- -- --
E-10E-10 -- -- -- -- --
청색 착색제Blue colorant B-1B-1 33 33 33 33 33
B-2B-2 -- -- -- -- --
B-3B-3 -- -- -- -- --
B-4B-4 -- -- -- -- --
자색 착색제Purple colorant V-1V-1 -- -- -- -- --
알칼리 가용성 수지Alkali soluble resin 카도계 수지(A-1)Cardo resin (A-1) 4.884.88 4.884.88 -- -- 3.253.25
카도계 수지(A-2)Cardo-based resin (A-2) -- -- 4.884.88 4.884.88 --
카도계 수지(B-1)Cardo Resin (B-1) 4.884.88 -- 4.884.88 -- 3.253.25
카도계 수지(B-2)Cardo Resin (B-2) -- 4.884.88 -- 4.884.88 --
아크릴계 수지(A)Acrylic resin (A) -- -- -- -- 3.253.25
광중합성화합물1 ) Photopolymerizable compound 1 ) 6.56.5 6.56.5 6.56.5 6.56.5 6.56.5
개시제2 ) Initiator 2 ) 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29
용제3 ) Solvent 3 ) 68.4568.45 68.4568.45 68.4568.45 68.4568.45 68.4668.46
1) 광중합성 화합물(C): 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)1) Photopolymerizable Compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
2) 개시제(D): Irgaqure-907 (BASF사 제)2) Initiator (D): Irgaqure-907 (manufactured by BASF Corporation)
3) 용제(E): 프로필렌글리콜모노메틸에테르아세테이트3) Solvent (E): Propylene glycol monomethyl ether acetate
  비교예Comparative example
1One 22 33 44
산란입자Scattering particles E-1E-1 -- -- -- --
E-2E-2 -- -- -- --
E-3E-3 -- -- -- --
E-4E-4 -- -- -- --
E-5E-5 -- -- -- --
E-6E-6 1515 10.0010.00 --
E-7E-7 -- -- -- --
E-8E-8 -- -- -- --
E-9E-9 -- -- 10.0010.00
E-10E-10 -- -- -- 10.0010.00
알칼리 가용성 수지Alkali soluble resin 카도계 수지(A-1)Cardo resin (A-1) -- -- -- --
카도계 수지(A-2)Cardo-based resin (A-2) -- -- -- --
아크릴계 수지Acrylic resin 9.759.75 9.759.75 9.759.75 9.759.75
광중합성화합물1 ) Photopolymerizable compound 1 ) 6.506.50 6.506.50 6.506.50 6.506.50
개시제2 ) Initiator 2 ) 2.292.29 2.292.29 2.292.29 2.292.29
용제3 ) Solvent 3 ) 66.4666.46 71.4671.46 71.4671.46 71.4671.46
1) 광중합성 화합물(C): 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)1) Photopolymerizable Compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
2) 개시제(D): Irgaqure-907 (BASF사 제)2) Initiator (D): Irgaqure-907 (manufactured by BASF Corporation)
3) 용제(E): 프로필렌글리콜모노메틸에테르아세테이트3) Solvent (E): Propylene glycol monomethyl ether acetate
  비교예Comparative example
55 66 77 88 99 1010
산란입자Scattering particles E-1E-1 0.100.10 10.0010.00 -- -- -- --
E-2E-2 -- -- -- -- -- --
E-3E-3 -- -- -- -- -- --
E-4E-4 -- -- -- -- -- --
E-5E-5 -- -- -- -- -- --
E-6E-6 -- -- 10.0010.00   -- --
E-7E-7 -- -- -- -- -- --
E-8E-8 -- -- -- -- -- --
E-9E-9 -- -- -- 10.0010.00 -- --
E-10E-10 -- -- -- -- 10.0010.00 10.0010.00
청색 착색제Blue colorant B-1B-1 -- 55.0055.00 -- -- -- --
B-2B-2 -- -- 55.0055.00 -- -- --
B-3B-3 -- -- -- 55.0055.00 -- --
B-4B-4 -- -- -- -- 55.0055.00 --
자색 착색제Purple colorant V-1V-1 -- -- -- -- -- 55.0055.00
알칼리 가용성 수지Alkali soluble resin 카도계 수지(A-1)Cardo resin (A-1) -- -- -- -- -- --
카도계 수지(A-2)Cardo-based resin (A-2) -- -- -- -- -- --
아크릴계 수지(A)Acrylic resin (A) 9.759.75 9.759.75 9.759.75 9.759.75 9.759.75 9.759.75
광중합성화합물1 ) Photopolymerizable compound 1 ) 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50 6.506.50
개시제2 ) Initiator 2 ) 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29 2.292.29
용제3 ) Solvent 3 ) 81.3681.36 16.4616.46 16.4616.46 16.4616.46 16.4616.46 16.4616.46
1) 광중합성 화합물(C): 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)1) Photopolymerizable Compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
2) 개시제(D): Irgaqure-907 (BASF사 제)2) Initiator (D): Irgaqure-907 (manufactured by BASF Corporation)
3) 용제(E): 프로필렌글리콜모노메틸에테르아세테이트3) Solvent (E): Propylene glycol monomethyl ether acetate
컬러필터의 제조Manufacture of color filter
상기 실시예 및 비교예에 따라 제조된 감광성 수지 조성물을 이용하여 컬러필터를 제조하였다. 즉, 상기 각각의 감광성 수지 조성물을 스핀 코팅법으로 유리 기판 위에 도포한 다음, 가열판 위에 놓고 100 ℃의 온도에서 3 분간 유지하여 박막을 형성시켰다. The color filter was manufactured using the photosensitive resin composition manufactured according to the said Example and the comparative example. That is, each of the photosensitive resin composition was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film.
이어서 상기 박막 위에 가로 × 세로 20mm × 20mm 정사각형의 투과 패턴과 1 내지 100 ㎛의 라인/스페이스 패턴을 갖는 시험 포토마스크를 올려놓고 시험 포토마스크와의 간격을 100 ㎛로 하여 자외선을 조사하였다. Subsequently, a test photomask having a transmissive pattern of horizontal × vertical 20 mm × 20 mm squares and a line / space pattern of 1 to 100 μm was placed on the thin film, and ultraviolet rays were irradiated with a distance of 100 μm from the test photomask.
이때, 자외선광원은 우시오 덴끼㈜제의 초고압 수은 램프(상품명 USH-250D)를 이용하여 대기 분위기하에 200 mJ/cm2의 노광량(365㎚)으로 광조사하였으며, 특별한 광학 필터는 사용하지 않았다. At this time, the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmospheric atmosphere using an ultrahigh pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
상기에서 자외선이 조사된 박막을 pH 10.5의 KOH 수용액 현상 용액에 80 초 동안 담궈 현상하였다. 이 박막이 입혀진 유리판을 증류수를 사용하여 세척한 다음, 질소 가스를 불어서 건조하고, 150 ℃의 가열 오븐에서 10 분 동안 가열하여 컬러필터 패턴을 제조하였다. 상기에서 제조된 컬러 패턴의 필름 두께는 5.0 ㎛이었다.The thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5. The thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern. The film thickness of the color pattern prepared above was 5.0 μm.
실험예Experimental Example 1 : 컬러필터의 현상속도, 감도, 패턴안정성 실험 1: Development speed, sensitivity, pattern stability test of color filter
실시예 및 비교예에 따른 감광성 수지 조성물로 제조된 컬러필터를 대상으로 현상속도, 감도, 패턴안정성을 측정하였다. 각 실험에 대한 평가 기준은 하기와 같다. 측정결과는 표 10에 기재하였다.The development speed, sensitivity, and pattern stability of the color filter manufactured by the photosensitive resin composition according to the Examples and Comparative Examples were measured. Evaluation criteria for each experiment are as follows. The measurement results are shown in Table 10.
현상속도(sec): 현상<Spray Developer HPMJ 방식>시 비노광부가 현상액에 최초로 용해되는데 걸리는 시간Development speed (sec): Time taken for the first non-exposure part to dissolve in the developer during development <Spray Developer HPMJ method>
감도: 감도 마스크 미세 패턴(1~60)의 뜯김이 없는 박막을 형성한 정도(수치가 낮을수록 감도가 우수)Sensitivity: The degree of formation of a flawless thin film of the sensitivity mask fine pattern (1 to 60) (the lower the value, the better the sensitivity).
패턴 안정성: 저노광량(20~100mJ)에서의 패턴 마스크의 노광후의 패턴의 오류 정도Pattern Stability: Pattern error after exposure of pattern mask at low exposure amount (20-100mJ)
○: 패턴상 오류 없음○: no error on the pattern
△: 패턴상 오류가 1 ~ 2인 경우Δ: pattern error of 1 to 2
×: 패턴상 오류 3개 이상×: 3 or more errors on the pattern
(○, △, ×는 3차원 표면 형상기의 광학현미경을 통한 확인 결과)(○, △, × are the results confirmed by the optical microscope of the three-dimensional surface shape machine)
실험예 2 : 컬러필터의 내용제성 및 내열성 측정 실험 Experimental Example 2 Measurement Experiment of Solvent Resistance and Heat Resistance of Color Filter
상기 실시예 및 비교예에 따른 감광성 수지 조성물로 제조된 컬러필터를 대상으로 내열성 및 내용제성 측정 실험을 통해, 컬러필터 제조시 혹은 액정표시장치를 제작시 사용하게 되는 열 및 용제에 안정한가를 나타내는 평가하였다. 측정결과는 표 10에 기재하였다.Evaluation indicating whether the color filter made of the photosensitive resin composition according to the Examples and Comparative Examples through the heat resistance and solvent resistance measurement experiment, stable to the heat and solvent used in the manufacture of the color filter or when manufacturing the liquid crystal display device It was. The measurement results are shown in Table 10.
내용제성 평가: 상기 제조된 컬러필터를 용제 NMP(1-메틸-2-파이롤리디논)에 30분간 침지시켜, 평가 전후의 색변화를 계산하여 비교 평가하는 것이다. 이때 사용하게 되는 식은 L*, a*, b* 로 정의되는 3차원 색도계에서의 색변화를 나타내는 하기 수학식 (1)에 의해 계산된다. Solvent resistance evaluation: The color filter prepared above is immersed in solvent NMP (1-methyl- 2-pyrrolidinone) for 30 minutes, and the color change before and after evaluation is calculated and compared. The equation used at this time is calculated by the following equation (1) representing the color change in the three-dimensional colorimeter defined by L * , a * , b * .
내열성 평가: 상기의 방법으로 제조된 컬러필터를 230℃ 의 가열 오븐에서 2시 동안 가열 후 가열 전후의 색변화를 측정하기 위해 수학식 (1)에 의해 계산하였다. Heat resistance evaluation: The color filter manufactured by the above method was calculated by Equation (1) to measure the color change before and after heating after heating for 2 hours in a heating oven at 230 ℃.
수학식 (1) △Eab*= [(△L*)2+ (△a*)2+(△b*)2]1 /2 Equation (1) △ Eab * = [ (△ L *) 2 + (△ a *) 2 + (△ b *) 2] 1/2
○: △Eab* = 1 미만,○: less than ΔEab * = 1,
△: △Eab* = 1 ~ 3,Δ: ΔEab * = 1 to 3,
×: △Eab* = 3 초과×: ΔEab * = 3 or more
실험예Experimental Example 3 : 미세패턴 형성 실험 3: micro pattern formation experiment
상기 실시예 및 비교예에 따른 감광성 수지를 사용하여 제조된 컬러필터 중 100 ㎛로 설계된 라인/스페이스 패턴 마스크를 통해 얻어진, 패턴의 크기를 OM장비(ECLIPSE LV100POL 니콘사)를 통해 패턴 크기를 측정하였다. 측정결과는 표 10에 기재하였다.The size of the pattern, which was obtained through a line / space pattern mask designed to 100 μm among color filters manufactured using the photosensitive resins according to the above examples and comparative examples, was measured by OM equipment (ECLIPSE LV100POL Nikon). . The measurement results are shown in Table 10.
라인/스페이스 패턴 마스크의 설계값과 얻어진 미세 패턴의 측정값과의 차이가 20 ㎛ 이상이면, 미세화소의 구현이 어려워지고, 마이너스 값을 가지면 공정불량을 야기하는 임계 수치를 의미한다. When the difference between the design value of the line / space pattern mask and the measured value of the obtained fine pattern is 20 µm or more, it is difficult to implement the fine pixel, and a negative value means a threshold value that causes a process defect.
  현상속도Developing speed 감도Sensitivity 패턴안정성Pattern stability 미세패턴Fine pattern 내열성Heat resistance 내용제성Solvent resistance
실시예1Example 1 3131 1010 1414
실시예2Example 2 2929 99 1212
실시예3Example 3 2828 99 1111
실시예4Example 4 3030 88 66
실시예5Example 5 3030 1212 22
실시예6Example 6 2727 1414 1212
실시예7Example 7 2323 1212 1010
실시예8Example 8 1919 1111 1313
실시예9Example 9 2525 99 88
실시예10Example 10 2121 1212 1111
실시예11Example 11 2828 1111 99
실시예12Example 12 2929 88 1010
실시예13Example 13 2525 1212 88
실시예14Example 14 2323 99 66
실시예15Example 15 2121 1313 1010
실시예16Example 16 1616 1414 99
실시예17Example 17 2828 99 88
실시예18Example 18 2727 1111 77
실시예19Example 19 3030 1010 66
실시예20Example 20 2828 1111 77
실시예21Example 21 2727 1313 1010
실시예22Example 22 2828 1010 1414
실시예23Example 23 2626 99 1212
실시예24Example 24 2525 99 1111
실시예25Example 25 2727 88 66
실시예26Example 26 2727 1212 22
실시예27Example 27 2424 1414 1212
실시예28Example 28 2020 1212 1010
실시예29Example 29 1616 1111 1313
실시예30Example 30 2222 99 88
실시예31Example 31 1818 1212 1111
실시예32Example 32 2525 1111 99
실시예33Example 33 2626 88 1010
실시예34Example 34 2222 1212 88
실시예35Example 35 2020 99 66
실시예36Example 36 1818 1313 1010
실시예37Example 37 1313 1414 99
실시예38Example 38 2525 99 88
실시예39Example 39 2424 1111 77
실시예40Example 40 2424 1111 77
실시예41Example 41 2727 1010 66
실시예42Example 42 2525 99 1010
실시예43Example 43 2626 99 99
실시예44Example 44 2626 1010 99
실시예45Example 45 2424 1111 1010
실시예46Example 46 2525 1010 99
비교예1Comparative Example 1 99 6060 ×× -10-10 ××
비교예2Comparative Example 2 1010 5555 -2-2 ×× ××
비교예3Comparative Example 3 88 5050 ×× -1-One ××
비교예4Comparative Example 4 1111 6060 ×× -5-5 ×× ××
비교예5Comparative Example 5 2525 1515 2323 ××
비교예6Comparative Example 6 66 5959 ×× -10-10 ××
비교예7Comparative Example 7 77 5858 ×× -20-20 ××
비교예8Comparative Example 8 55 4848 ×× -15-15 ××
비교예9Comparative Example 9 55 4949 ×× -13-13 ××
이에 표 10를 보면 금속산화물의 산란입자가 평균입경이 30 내지 500 ㎚ 범위일 경우 미세패턴이 잘 형성 되었음을 확인할 수 있었다. 비교예의 경우 미세패턴의 형성이 어려움을 확인할 수 있었다.In Table 10, it can be seen that the scattering particles of the metal oxides formed fine patterns well when the average particle diameter was in the range of 30 to 500 nm. In the comparative example, it was confirmed that the formation of the micropattern was difficult.
또한 상기 평가결과로부터 카도계 바인더 도입 또는 카도 바인더과 아크릴계 바인더의 병용시 아크릴계 바인더 수지 단독 적용 시 보다 감도, 패턴 안정성, 미세패턴 및 신뢰성이 매우 우수함을 확인할 수 있었다.In addition, it was confirmed that the sensitivity, pattern stability, fine pattern, and reliability were very excellent when the cardo binder was introduced or when the cardo binder and the acrylic binder were used together when the acrylic binder resin alone was applied.
실험예Experimental Example 4 : 발광 강도 측정 4: emission intensity measurement
상기 실시예 산란입자 및 비교예에 따른 감광성 수지를 사용하여 제조된 컬러필터 중 20 × 20 mm 정사각형의 패턴으로 형성된 부분에 365 nm Tube형 4 W UV조사기(VL-4LC, VILBER LOURMAT)를 통하여 광 변환된 영역을 측정하였으며, 실시예 및 비교예는 450 nm 영역에서의 발광 강도를 Spectrum meter(Ocean Optics사)를 이용하여 측정하였다. 측정결과는 표 11에 기재하였다.Light scattered through a 365 nm tube-type 4 W UV irradiator (VL-4LC, VILBER LOURMAT) on a portion formed in a 20 × 20 mm square pattern among color filters prepared using the scattering particles and the photosensitive resin according to the comparative example. The converted region was measured, and the Examples and Comparative Examples measured the emission intensity in the 450 nm region using a Spectrum meter (Ocean Optics). The measurement results are shown in Table 11.
실험예Experimental Example 5 : 시야각 측정 5: viewing angle measurement
상기 실시예 및 비교예에 따라 제조된 감광성 수지 조성물을 사용하여 제조된 컬러필터 중 20 × 20 mm 정사각형의 패턴으로 형성된 부분에 투광조건에서의 시야각에 따른 광 Intensity를 변각광도계(GC-5000L, Nippon Denshoku)를 사용하여 측정하였고, 하기 수학식 (2)를 이용하여 확산율을 산출하였다. 측정결과는 표 11에 기재하였다.The optical intensity according to the viewing angle under the transmissive conditions was formed on the portion formed in the pattern of 20 × 20 mm square among the color filters manufactured using the photosensitive resin compositions prepared according to the above Examples and Comparative Examples (GC-5000L, Nippon). Denshoku) was used, and the diffusion rate was calculated using the following equation (2). The measurement results are shown in Table 11.
수학식 (2)Equation (2)
확산율 = (I70 + I20) / 2 × I5 × 100Diffusion rate = (I70 + I20) / 2 × I5 × 100
I는 시야각에서 측정된 광 Intensity를 의미한다.I means light intensity measured at the viewing angle.
실험예Experimental Example 6: 반사율 측정 6: reflectance measurement
상기 실시예 22 내지 46 및 비교예 5 내지 10에 따라 제조된 감광성 수지 조성물을 사용하여 제조된 컬러필터 중 20 × 20 mm 정사각형의 패턴으로 형성된 부분에 투광조건에서의 광반사율을 분광측색계 CM-3600A(코니카 미놀타社)를 사용하여 측정하였고 측정결과는 표 8에 기재하였다.Spectrophotometer CM- was used to measure the light reflectance under light-transmitting conditions on the portion formed in the pattern of 20 × 20 mm square in the color filter manufactured using the photosensitive resin composition prepared according to Examples 22 to 46 and Comparative Examples 5 to 10. It was measured using 3600A (Konica Minolta Co., Ltd.) and the measurement results are shown in Table 8.
  발광 강도Luminous intensity 확산율Diffusion rate 외광반사율External light reflectance
실시예 1Example 1 2850028500 20.520.5 --
실시예 2Example 2 3470034700 43.543.5 --
실시예 3Example 3 3180031800 78.378.3 --
실시예 4Example 4 2980029800 78.178.1 --
실시예 5Example 5 2820028200 84.384.3 --
실시예 6Example 6 3130031300 53.553.5 --
실시예 7Example 7 2650026500 78.978.9 --
실시예 8Example 8 2390023900 48.648.6 --
실시예 9Example 9 3650036500 48.648.6 --
실시예 10Example 10 2850028500 82.182.1 --
실시예 11Example 11 3480034800 33.633.6 --
실시예 12Example 12 3080030800 78.178.1 --
실시예 13Example 13 2780027800 82.182.1 --
실시예 14Example 14 3420034200 51.351.3 --
실시예 15Example 15 3130031300 72.672.6 --
실시예 16Example 16 2650026500 74.974.9 --
실시예 17Example 17 2190021900 43.543.5 --
실시예 18Example 18 3650036500 49.749.7 --
실시예 19Example 19 2590025900 80.780.7 --
실시예 20Example 20 3860038600 42.142.1 --
실시예 21Example 21 271960271960 44.844.8 --
실시예22Example 22 2850028500 20.520.5 3.13.1
실시예23Example 23 3470034700 43.543.5 3.83.8
실시예24Example 24 3180031800 78.378.3 2.82.8
실시예25Example 25 2980029800 78.178.1 2.62.6
실시예26Example 26 2820028200 84.384.3 2.72.7
실시예27Example 27 3130031300 53.553.5 3.63.6
실시예28Example 28 2650026500 78.978.9 3.83.8
실시예29Example 29 2390023900 48.648.6 3.13.1
실시예30Example 30 3650036500 48.648.6 2.12.1
실시예31Example 31 2850028500 82.182.1 2.52.5
실시예32Example 32 3480034800 33.633.6 2.92.9
실시예33Example 33 3080030800 78.178.1 3.13.1
실시예34Example 34 2780027800 82.182.1 3.83.8
실시예35Example 35 3420034200 51.351.3 3.63.6
실시예36Example 36 3130031300 72.672.6 3.23.2
실시예37Example 37 2650026500 74.974.9 2.92.9
실시예38Example 38 2190021900 43.543.5 2.12.1
실시예39Example 39 3650036500 49.749.7 1.91.9
실시예40Example 40 2590025900 80.780.7 2.32.3
실시예41Example 41 2590025900 80.780.7 3.83.8
실시예42Example 42 3698836988 8282 2.52.5
실시예43Example 43 3758637586 82.382.3 2.62.6
실시예44Example 44 3812438124 83.183.1 2.82.8
실시예45Example 45 3720137201 82.982.9 2.72.7
실시예46Example 46 3690736907 82.682.6 2.72.7
비교예 1Comparative Example 1 1770017700 18.718.7 --
비교예 2Comparative Example 2 2820028200 8.58.5 --
비교예 3Comparative Example 3 1920019200 4.54.5 --
비교예 4Comparative Example 4 1640016400 88 --
비교예5Comparative Example 5 4120041200 2.12.1 8.28.2
비교예6Comparative Example 6 88508850 18.718.7 0.80.8
비교예7Comparative Example 7 88508850 8.58.5 1.21.2
비교예8Comparative Example 8 96009600 4.54.5 1.61.6
비교예9Comparative Example 9 82008200 7.87.8 0.90.9
비교예10Comparative Example 10 82008200 8.28.2 1.81.8
측정된 발광 강도가 높을수록 광효율이 높음을 의미한다. 이에 표 11을 보면, 금속산화물의 산란입자가 평균입경이 30 내지 500 ㎚의 범위 내인 실시예의 경우 비교예에 비하여 발광 강도가 향상되었음을 확인할 수 있었다. The higher the measured light emission intensity, the higher the light efficiency. In Table 11, it can be seen that the scattering particles of the metal oxides had an average particle diameter in the range of 30 to 500 nm, and the emission intensity was improved compared to the comparative example.
측정된 확산율이 높을수록 시야각이 좋아짐을 의미한다. 이에 표 11을 보면, 금속산화물의 산란입자가 평균입경이 30 내지 500 ㎚ 금속산화물의 산란입자를 사용한 실시예의 경우 비교예 대비 시야각이 향상되었음을 확인할 수 있었다. The higher the measured diffusion, the better the viewing angle. In Table 11, the scattering particles of the metal oxide was found that the viewing angle is improved compared to the comparative example in the case of using the scattering particles of the metal oxide 30 to 500 nm average particle diameter.
측정된 반사율은 낮을수록 외광반사 억제 효과가 향상되어 고품위 화질에 유리함을 의미한다. 이에 표 11을 보면, 실시예의 경우 반사율이 우수하고, 발광 강도가 우수한 것을 확인할 수 있었다.The lower the reflectance measured, the better the suppression of external light reflection, which means that it is advantageous to high quality image quality. In Table 11, it can be seen that in the case of Examples, the reflectance was excellent and the emission intensity was excellent.

Claims (11)

  1. 알칼리 가용성 수지; 및Alkali-soluble resins; And
    평균입경 30 내지 500nm의 금속산화물을 포함하는 산란입자;를 포함하고,Includes; scattering particles comprising a metal oxide having an average particle diameter of 30 to 500nm,
    상기 알칼리 가용성 수지는 하기 화학식 1로 표시되는 화합물을 포함하여 중합되는 제1 카도계 바인더 수지 및 하기 화학식 2로 표시되는 화합물을 포함하여 중합되는 제2 카도계 바인더 수지로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 감광성 수지 조성물:The alkali-soluble resin is at least one selected from the group consisting of a first cardo-based binder resin polymerized including a compound represented by the following Chemical Formula 1 and a second cardo-based binder resin polymerized including a compound represented by the following Chemical Formula 2 Photosensitive resin composition comprising:
    [화학식 1][Formula 1]
    Figure PCTKR2017013588-appb-I000033
    Figure PCTKR2017013588-appb-I000033
    [화학식 2][Formula 2]
    Figure PCTKR2017013588-appb-I000034
    Figure PCTKR2017013588-appb-I000034
    화학식 1에서, In Formula 1,
    R1 및 R2는 각각 독립적으로
    Figure PCTKR2017013588-appb-I000035
    R1 and R2 are each independently
    Figure PCTKR2017013588-appb-I000035
    X는 수소, 탄소수 1 내지 5의 알킬기 또는 수산기이며,X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group,
    R3는 수소 또는 탄소수 1 내지 5의 알킬기이고,R3 is hydrogen or an alkyl group having 1 to 5 carbon atoms,
    화학식 2에서, In Formula 2,
    R4 및 R5는 각각 독립적으로
    Figure PCTKR2017013588-appb-I000036
    R4 and R5 are each independently
    Figure PCTKR2017013588-appb-I000036
    X는 수소, 탄소수 1 내지 5의 알킬기 또는 수산기이며,X is hydrogen, an alkyl group having 1 to 5 carbon atoms or a hydroxyl group,
    R6은 수소 또는 탄소수 1 내지 5의 알킬기이다.R6 is hydrogen or an alkyl group having 1 to 5 carbon atoms.
  2. 제1항에 있어서,The method of claim 1,
    상기 알칼리 가용성 수지는 하기 화학식 3 및 하기 화학식 4 중 적어도 하나의 반복단위를 포함하는 카도계 바인더 수지를 더 포함하는 것인 감광성 수지 조성물:The alkali-soluble resin is a photosensitive resin composition further comprises a cardo-based binder resin comprising at least one repeating unit of the following formula (3) and (4):
    [화학식 3][Formula 3]
    Figure PCTKR2017013588-appb-I000037
    Figure PCTKR2017013588-appb-I000037
    [화학식 4][Formula 4]
    Figure PCTKR2017013588-appb-I000038
    Figure PCTKR2017013588-appb-I000038
    상기 화학식 3 및 4에서,In Chemical Formulas 3 and 4,
    P는 각각 독립적으로
    Figure PCTKR2017013588-appb-I000039
    Figure PCTKR2017013588-appb-I000040
    P is each independently
    Figure PCTKR2017013588-appb-I000039
    Figure PCTKR2017013588-appb-I000040
    R7 및 R8는 각각 독립적으로 수소, 히드록시기, 티올기, 아미노기, 니트로기 또는 할로겐 원자이며,R7 and R8 are each independently hydrogen, hydroxy group, thiol group, amino group, nitro group or halogen atom,
    Ar1은 각각 독립적으로 C6 내지 C15 아릴기이고,Ar1 is each independently a C6 to C15 aryl group,
    Y는 산무수물 잔기이며,Y is an acid anhydride residue,
    Z는 산2무수물 잔기이고,Z is an acid 2 anhydride residue,
    A는 O, S, N, Si 또는 Se이며,A is O, S, N, Si or Se,
    a 및 b는 각각 독립적으로 1 내지 6의 정수이고,a and b are each independently an integer of 1 to 6,
    n 및 m은 각각 독립적으로 0 내지 30의 정수이며,n and m are each independently an integer of 0 to 30,
    단, n 및 m은 동시에 0은 아니다.Provided that n and m are not zero at the same time.
  3. 제1항에 있어서,The method of claim 1,
    청색 착색제를 더 포함하는 것인 감광성 수지 조성물.The photosensitive resin composition which further contains a blue coloring agent.
  4. 제1항에 있어서,The method of claim 1,
    상기 금속산화물은 Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In 및 이들의 조합으로 이루어진 군에서 선택되는 1 이상의 산화물을 포함하는 것인 감광성 수지 조성물.The metal oxide is Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Photosensitive resin composition comprising at least one oxide selected from the group consisting of Ce, Ta, In and combinations thereof.
  5. 제4항에 있어서,The method of claim 4, wherein
    상기 금속산화물은 Al2O3, SiO2, ZnO, ZrO2, BaTiO3, TiO2, Ta2O5, Ti3O5, ITO, IZO, ATO, ZnO-Al, Nb2O3, SnO, MgO 및 이들의 조합으로 이루어진 군에서 선택되는 1 이상을 포함하는 것인 감광성 수지 조성물.The metal oxide is Al 2 O 3 , SiO 2 , ZnO, ZrO 2 , BaTiO 3 , TiO 2 , Ta 2 O 5 , Ti 3 O 5 , ITO, IZO, ATO, ZnO-Al, Nb 2 O 3 , SnO, Photosensitive resin composition comprising one or more selected from the group consisting of MgO and combinations thereof.
  6. 제1항에 있어서,The method of claim 1,
    상기 알칼리 가용성 수지는 아크릴계 바인더 수지를 더 포함하는 것인 감광성 수지 조성물.The alkali-soluble resin is a photosensitive resin composition further comprising an acrylic binder resin.
  7. 제1항에 있어서,The method of claim 1,
    상기 산란입자는 상기 감광성 수지 조성물 전체 100 중량부에 대하여 0.1 내지 50 중량부로 포함되는 것인 감광성 수지 조성물.The scattering particles are a photosensitive resin composition that is contained in 0.1 to 50 parts by weight based on 100 parts by weight of the total photosensitive resin composition.
  8. 제1항에 있어서,The method of claim 1,
    상기 카도계 바인더 수지는 상기 감광성 수지 조성물 전체 100 중량부에 대하여 1 내지 50 중량부로 포함되는 것인 감광성 수지 조성물.The cardo-based binder resin is 1 to 50 parts by weight based on 100 parts by weight of the total photosensitive resin composition.
  9. 제1항에 있어서,The method of claim 1,
    광중합성 화합물; 광중합 개시제; 용제; 및 첨가제로 이루어진 군에서 선택되는 1 이상을 더 포함하는 것인 감광성 수지 조성물.Photopolymerizable compounds; Photopolymerization initiator; solvent; And one or more selected from the group consisting of additives.
  10. 제1항 내지 제9항 중 어느 한 항에 따른 감광성 수지 조성물의 경화물을 포함하는 청색 패턴층;을 포함하는 자발광 화소 함유 컬러필터.A self-luminous pixel-containing color filter comprising; a blue pattern layer comprising a cured product of the photosensitive resin composition according to any one of claims 1 to 9.
  11. 제10항에 따른 컬러필터; 및 청색광을 방출하는 광원;을 포함하는 화상표시장치.A color filter according to claim 10; And a light source emitting blue light.
PCT/KR2017/013588 2017-03-30 2017-11-27 Photosensitive resin composition, and color filter and image display device prepared by using same WO2018182127A1 (en)

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