TWI684613B - Photosensitive resin composition, color filter and image display device produced using the same - Google Patents

Abstract

A photosensitive resin composition according to the present invention includes an alkali-soluble resin; and scattering particles comprising a metal oxide, which has an average particle size of 30 to 500 nm, and the alkali-soluble resin includes one or more selected from the group consisting of a first cardo-based binder resin polymerized with a compound represented by Formula 1 and a second cardo-based binder resin polymerized with a compound represented by Formula 2.

The photosensitive resin composition according to the present invention may impart an excellent color reproduction characteristic and high luminous efficiency, thereby realizing a high-quality image.

Description

Photosensitive resin composition, color filter and image display device manufactured using the same

The present invention relates to a photosensitive resin composition containing specific scattering particles and an alkali-soluble resin, and a color filter and image display device manufactured using the same.

The color filter is a thin-film optical element that extracts three colors of red, green, and blue from white light to become a fine pixel area, and the pixel size is about tens of microns to hundreds Micron. Such a color filter has the following structure: a black matrix layer is formed in a predetermined pattern on a transparent substrate to shield the light in the boundary area between pixels, and the pixel areas are sequentially stacked. In the pixel area, the light The three primary colors (usually red (R), green (G), and blue (B)) are arranged in a predetermined order to form each pixel.

Recently, as one of the methods for realizing the color filter, a pigment dispersion using a pigment-dispersed photosensitive resin has been applied, but light emitted from the light source passes through the color During the transmission of the filter, part of the light system is absorbed, thereby reducing the luminous efficiency, and the color reproducibility is reduced due to the characteristics of the pigment included in the color filter.

In particular, as color filters are used in various fields including various types of image display devices, excellent performance such as high color gamut, high brightness, and high contrast ratio and excellent pattern characteristics are required, and In order to solve these problems, a method of manufacturing a color filter using a self-emissive photosensitive resin composition including quantum dots has been proposed.

Korean Unexamined Patent Application No. 2013-0000506 relates to a display device and discloses a plurality of wavelength conversion particles that convert the wavelength of light; and a display device including a color conversion unit, the color conversion unit including A plurality of color filter particles that absorb light in a predetermined wavelength range.

However, in the case of color filters containing quantum dots, reducing the efficiency of quantum dots, especially the efficiency of blue quantum dots, may slightly reduce the performance of color filters, and blue quantum dots are expensive, Therefore, the total production cost increases.

Therefore, there is a need to develop a photosensitive resin composition that can prevent blue pixel efficiency from decreasing and reduce production costs.

[Prior Technical Literature] [Patent Literature]

(Patent Document 1) Korean Unexamined Patent Application No. 2013-0000506 (January 3, 2013)

The present invention aims to provide a photosensitive resin composition capable of preventing a reduction in blue pixel efficiency and reducing production costs.

In addition, the present invention aims to provide a color filter and an image display device including a blue pixel layer prepared using the above-mentioned photosensitive resin composition. Specifically, the present invention provides a color filter and image display device with high image quality, wide viewing angle, high durability and reliability.

To achieve this goal, the photosensitive resin composition according to the present invention includes an alkali-soluble resin; and metal oxide-containing scattering particles having an average particle diameter of 30 nm to 500 nm, wherein the alkali-soluble resin contains One or more of the following groups: a first cardo-based binder resin polymerized with the compound represented by Formula 1 and a second carbo-based binder resin polymerized with the compound represented by Formula 2.

，X為氫原子、具有1至5個碳原子的烷基、或羥基，且R3為氫原子或具有1至5個碳原子的烷基。 In Formula 1, R1 and R2 are each independently

, X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R3 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

，X為氫原子、具有1至5個碳原子的烷基、或羥基，且R6為氫原子或具有1至5個碳原子的烷基。 In Equation 2, R4 and R5 are each independently

, X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R6 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

In addition, the present invention provides a color filter manufactured using the photosensitive resin composition and an image display device including the color filter.

The photosensitive resin composition of the present invention can impart excellent color reproduction characteristics and high light efficiency.

In addition, a color filter manufactured using the photosensitive resin composition of the present invention and an image display device including the color filter can have high image quality, wide viewing angle, and high durability, ensuring reliability and reducing production costs.

Hereinafter, the present invention will be described in further detail.

In the present invention, when it is assumed that one component is located "on" another component, it may be directly disposed on the other component, or there may be an intermediary component between the two.

In the present invention, when a component "includes" one component, unless specifically mentioned otherwise, another component may be further included without excluding other components.

<Photosensitive resin composition>

In one aspect, the present invention provides a photosensitive resin composition including an alkali-soluble resin; and metal oxide-containing scattering particles having an average particle diameter of 30 nm to 500 nm, wherein The alkali-soluble resin includes one or more selected from the group consisting of: a first carboline-based binder resin polymerized with the compound represented by Formula 1, and a second carboline-based polymer polymerized with the compound represented by Formula 2 Binder resin.

，X為氫原子、具有1至5個碳原子的烷基、或羥基，且R3為氫原子或具有1至5個碳原子的烷基。 In Formula 1, R1 and R2 are each independently

, X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R3 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

，X為氫原子、具有1至5個碳原子的烷基、或羥基，且R6為氫原子或具有1至5個碳原子的烷基。 In Equation 2, R4 and R5 are each independently

, X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R6 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

Alkali soluble resin

The photosensitive resin composition of the present invention includes one or more selected from the group consisting of: a first carbole-based binder resin polymerized with a compound represented by the following formula 1, and a polymerized compound represented by the following formula 2 The second carboline binder resin.

，X為氫原子、具有1至5個碳原子的烷基、或羥基，且R3為氫原子或具有1至5個碳原子的烷基。 In Formula 1, R1 and R2 are each independently

, X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R3 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

，X為氫原子、具有1至5個碳原子的烷基、或羥基，且R6為氫原子或具有1至5個碳原子的烷基。 In Equation 2, R4 and R5 are each independently

, X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R6 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

The alkali-soluble resin has reactivity due to the action of light or heat and alkali solubility. Specifically, the alkali-soluble resin is used as a binder resin for scattering particles, and is soluble in the alkaline developer used in the development step of manufacturing the color filter.

The alkali-soluble resin according to the present invention may include a first carbole-based binder resin polymerized with a compound represented by the following formula 1, thereby improving the adhesive strength to the substrate, and achieving high application strength due to excellent developing adhesive strength Resolution micropattern.

，X為氫原子、具有1至5個碳原子的烷基、或羥基，R3為氫原子或具有1至5個碳原子的烷基，且較佳地，X為羥基，且R3為氫原子或甲基。 In Formula 1, R1 and R2 are each independently

, X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, R3 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and preferably, X is a hydroxyl group, and R3 is a hydrogen atom Or methyl.

The compound represented by Formula 1 can be synthesized using the following Formula 5, and can be further reacted with an acid anhydride or dianhydride compound, thereby obtaining a first carbole-based binder resin having alkali solubility.

For example, the compound of formula 1 can be prepared by mixing the compound represented by formula 5 with epichlorohydrin and t-butylammonium bromide, and heating the mixture with a solvent to initiate the reaction, And add dropwise an alkaline aqueous solution to precipitate and separate, thereby synthesizing the epoxy compound, and by synthesizing the epoxy compound and the third butyl ammonium bromide, acrylic acid, phenol-based compound (phenol-based compound) and The compound obtained by mixing the solvent reacts with at least one selected from the group consisting of maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic acid as an acid anhydrous compound Anhydride, hexahydrophthalic anhydride, methylendomethylene tetrahydrophthalic anhydride, chlorendic anhydride and methyltetrahydrophthalic anhydride, or including as Aromatic polyvalent carboxylic anhydrides of pyromellitic anhydride, benzophenone tetracarboxylic dianhydride, biphenyl tetracarboxylic dianhydride, and diphenyl ether tetracarboxylic dianhydride, but this The invention is not limited to this.

In addition, the alkali-soluble binder resin according to the present invention may include a second carbole-based binder resin polymerized with the compound of the following formula 2, thereby improving the adhesion strength to the substrate, and being used due to the excellent development adhesion strength For high resolution micro patterns.

，X為氫原子、具有1至5個碳原子的烷基、或羥基，R6為氫原子或具有1至5個碳原子的烷基，且較佳地X為羥基，且R6為氫原子或甲基。 In Formula 2, R4 and R5 are each independently

, X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, R6 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and preferably X is a hydroxyl group, and R6 is a hydrogen atom or methyl.

The compound represented by Formula 2 can be synthesized using the following Formula 6, and can be further reacted with an acid anhydride or dianhydride compound to obtain a second carbole-based binder resin having alkali solubility.

For example, the compound of formula 2 can be prepared by mixing the compound represented by formula 6 with epichlorohydrin, tert-butylammonium bromide, and a solvent, heating the mixture to cause a reaction, and dropping an alkaline aqueous solution to precipitate and separate, Thereby, an epoxy compound is synthesized, and a compound obtained by mixing the synthesized epoxy compound with the third butyl ammonium bromide, acrylic acid, phenol-based compound, and solvent is reacted with at least one selected from the group consisting of: As acid anhydrous compounds, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl-methylenetetrahydrophthalic acid Anhydride, chlorobridge anhydride and methyltetrahydrophthalic anhydride, or including pyromellitic dianhydride as dianhydride, benzophenone tetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride and diphenyl The aromatic polyvalent carboxylic acid anhydride of ether tetracarboxylic dianhydride, but the present invention is not limited thereto.

In Formula 5 and Formula 6, the position of the hydroxyl group (-OH) is not particularly limited, and may be, for example, the C2 position, the C3 position, or the C4 position, and preferably the C4 position (determined to be xanthene) (The combined carbon is the C1 position, so select the position).

As a result, depending on the hydroxyl group (-OH) of Formula 5 or Formula 6, the position where R1 and R2 are substituted in Formula 1 or the position where R4 and R5 are substituted in Formula 2 can be determined.

Specific examples of the compound represented by Formula 1 may be at least one selected from the group consisting of 9,9-bis(3-cinnamic diester) fluorene (9,9-bis(3-cinnamic diester)fluorene), 9,9-bis(3-cinnamoyl-4-hydroxyphenyl) fluorene (9,9-bis(3-cinnamoyl-4-hydroxyphenyl)fluorene), 9,9-bis(glycidyl methacrylate) (Ether) stilbene, 9,9-bis (3,4-dihydroxyphenyl) stilbene cinnamate, 3,6-diglycidyl methacrylate ether spiro (fusel-9,9-dibenzopiper Furan) (3,6-diglycidyl methacrylate ether spiro(fluorene-9,9-xanthene)), 9,9-bis(3-allyl-4-hydroxyphenyl) stilbene, 9,9-bis(4- Allyloxyphenyl) stilbene and 9,9-bis(3,4-methacrylic acid diester) stilbene, but the invention is not limited thereto.

A specific example of the compound represented by Formula 2 may be 9,9-bis(3,4-methacrylic acid diester) dibenzopiperan (9,9-bis(3,4-methacrylic diester)xanthene), but The present invention is not limited to this.

The acid value of the alkali-soluble binder resin may be 20 mg KOH/g to 200 mg KOH/g, and preferably 30 mg KOH/g to 150 mg KOH/g. When the acid value is within the above range, the solubility in the developing solution is enhanced, the unexposed portion is easily dissolved, and the sensitivity is increased. Therefore, since the pattern of the exposed portion remains during development, the film remaining ratio can be improved.

The term "acid value" as used herein refers to a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 gram of acrylic polymer, and can usually be determined by titration using an aqueous potassium hydroxide solution .

In addition, the alkali-soluble binder resin may be an alkali-soluble resin having a polystyrene-equivalent weight average molecular weight (hereinafter abbreviated as "weight average molecular weight") of 2,000 to 200,000 and preferably 3,000 to 100,000, the molecular weight is by gel Permeation chromatography (GPC; GPC; using tetrahydrofuran as the elution solvent) was measured. When the molecular weight is within the above range, the hardness of the coating film can be increased, the ratio of the residual film can be increased, the solubility of the unexposed portion in the developer can be excellent, and the resolution can be improved.

The molecular weight distribution [weight average molecular weight (Mw)/number average molecular weight (Mn)] of the alkali-soluble resin may be 1.0 to 6.0, and preferably 1.5 to 6.0. When the molecular weight distribution [weight average molecular weight (Mw)/number average molecular weight (Mn)] satisfies the above range, excellent developability can be achieved.

In an exemplary embodiment of the present invention, based on a total of 100 parts by weight of the photosensitive resin composition, the content of the carbole-based binder resin may be 1 part by weight to 50 parts by weight, preferably 5 parts by weight to 40 parts by weight, and more preferably 5 to 30 parts by weight.

When the content of the carbole-based binder resin is within the above range, due to sufficient dissolution in the developing solution, it is not easy to produce non-pixel development residue on the substrate, and because the pixel portion of the exposed portion is difficult to occur during development The film is reduced, and the non-pixel parts are easy to delete.

In another exemplary embodiment of the present invention, the alkali-soluble resin may further include a carbole-based binder resin including at least one repeating unit of the following Formula 3 and Formula 4.

、

、

R7與R8各自獨立為氫原子、羥基、硫醇基(thiol group)、胺基、硝基或鹵素原子，Ar1各自獨立為C6至C15芳基，Y為酸酐殘基，Z為二酐殘基，A為O、S、N、Si或Se，a與b各自獨立為1至6的整數，且m與n各自獨立為0至30的整數，其中m與n不同時為0。 In Equations 3 and 4, P is independently

,

,

R7 and R8 are each independently a hydrogen atom, a hydroxyl group, a thiol group, an amine group, a nitro group, or a halogen atom, Ar1 is independently a C6 to C15 aryl group, Y is an acid anhydride residue, and Z is a dianhydride residue , A is O, S, N, Si or Se, a and b are each independently an integer of 1 to 6, and m and n are each independently an integer of 0 to 30, where m and n are not 0 at the same time.

The halogen atom is F, Cl, Br or I.

基(chrysenyl)或茀基，但本發明並不限於此。 The aryl group may be a C6 to C15 monocyclic or polycyclic aryl group. The monocyclic aryl group may be phenyl, biphenyl, terphenyl, or stylbenyl, but the present invention is not limited thereto. Polycyclic aryl groups can be naphthyl, anthracenyl, phenanthrenyl, pyrenyl, perylene,

Chrysenyl or chrysoyl, but the invention is not limited thereto.

Y in Formula 3 is a residue of acid anhydride, and the acid anhydride capable of introducing the residue Y may be, but not particularly limited to, for example, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride , Hexahydrophthalic anhydride, methyl-methylenetetrahydrophthalic anhydride, chlorobridge anhydride or methyltetrahydrophthalic anhydride.

Z in Formula 4 is the residue of the dianhydride, and the dianhydride compound capable of introducing the residue Z may be, but not particularly limited to, for example, pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, biphenyltetracarboxylic acid Acid dianhydride, diphenyl ether tetracarboxylic dianhydride, cyclohexyl dianhydride, or cyclobutyl dianhydride.

When the carbole-based binder resin according to the present invention is contained in the photosensitive resin composition, it can exhibit more excellent luminous intensity, diffusivity, and light reflectance.

When the alkali-soluble resin further includes a carboline-based binder resin containing one or more repeating units selected from the group consisting of compounds of Formula 3 and Formula 4, based on a total of 100 parts by weight of the alkali-soluble resin, the carbodol The content of the binder resin may be 1 part by weight to 50 parts by weight, preferably 5 parts by weight to 40 parts by weight, and more preferably 5 parts by weight to 30 parts by weight.

When the content of the carbole-based binder resin that can be further included is within the above range, the luminous intensity, diffusivity, and light reflectance can be more excellent.

The carbole-based binder resin including at least one repeating unit of Formula 3 and Formula 4 can be prepared by the following method: The compounds of the following Formulae 12 to 16 can be obtained as follows: In the presence of a basic or acidic catalyst, the following Formulae 7 to Any one of the compounds represented by 11 is reacted with an epoxy compound such as epichlorohydrin, and then the resulting product is reacted with, for example, thiophenol, 1-thionaphthalene, or 2-naphthalenethiophenol And other compounds to polymerize.

Thereafter, the carbole-based binder resin including at least one repeating unit of Formula 3 and Formula 4 can be obtained by polymerizing a compound represented by the following Formulae 12 to 16 and a carboxylic dianhydride.

In Formula 7 to Formula 11, A, R7 and R8 are as defined in Formula 3 and Formula 4.

In Formula 12 to Formula 16, c is an integer of 1 to 6, and A, Ar1, R7, and R8 are as defined in Formula 3 and Formula 4.

Specific examples of the carboxylic dianhydride may be aromatic tetracarboxylic dianhydrides such as pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,3,3',4 '-Biphenyltetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 2, 2',3,3'-benzophenone tetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3-dicarboxybenzene Group) propane dianhydride, 1,1-bis(3,4-dicarboxyphenyl)ethane dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, bis(3, 4-dicarboxyphenyl)methane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl) benzene dianhydride, bis(3,4-dicarboxybenzene Group) ether dianhydride, 1,2,5,6-naphthalene tetracarboxylic dianhydride, 9,9-bis(3,4-dicarboxyphenyl) stilbene dianhydride, 9,9-bis{4-(3 ,4-dicarboxyphenoxy)phenyl) stilbene dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic dianhydride, 3,4, 9,10-Perylenetetracarboxylic dianhydride or 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, alicyclic tetracarboxylic dianhydride such as 1,2,3,4-ring Butane tetracarboxylic dianhydride, 1,2,3,4-cyclopentane tetracarboxylic dianhydride or 1,2,3,4-cyclohexane tetracarboxylic dianhydride, or 3,3',4, 4'-diphenylbenzene tetracarboxylic dianhydride.

The polymerization can be carried out at 100°C to 130°C or 110°C to 120°C for 2 hours to 24 hours or 4 hours to 12 hours.

Based on 100 parts by weight of the monomers represented by Formula 12 to Formula 16, the amount of carboxylic dianhydride added may be 5 to 40 parts by weight, 10 to 30 parts by weight, or 10 to 20 parts by weight .

The method for preparing a carbole-based binder resin including at least one repeating unit of Formula 3 and Formula 4 may include adding an end-capping agent to react after the start of polymerization.

The end-capping reaction can be carried out at 100°C to 130°C or 110°C to 120°C for 30 minutes to 4 hours or 1 hour to 3 hours.

Based on 100 parts by weight of the monomers represented by Formula 12 to Formula 16, the addition amount of the blocking agent may be 2 to 10 parts by weight, 2 to 5 parts by weight, or 3 to 5 parts by weight.

The blocking agent may be aromatic carboxylic anhydride, and specifically phthalic anhydride, and in this case, heat resistance, high transmittance, and high refractive index characteristics will be achieved.

The carbole-based binder resin including at least one repeating unit of Formula 3 and Formula 4 may have 1,000 g/mole (g/mol) to 100,000 g/mole, preferably 2,000 g/mole to 50,000 g/mole, and More preferably, the weight average molecular weight of 3,000 g/mol to 10,000 g/mol is within this range, and because of excellent heat resistance, proper development rate of the photosensitive material, and proper development by the developer, pattern formation becomes easy.

The weight average molecular weight can be measured by GPC.

The dispersion degree of the carbole-based binder resin including at least one repeating unit of Formula 3 and Formula 4 may be in the range of 1.0 to 5.0 and preferably 1.5 to 4.0, and within this range, due to excellent heat resistance, development of the photosensitive material Appropriate speed and proper development by the developer make pattern formation easy.

The dispersion of the resin can be measured by GPC.

In still another exemplary embodiment of the present invention, the alkali-soluble resin may further include an acrylic binder resin. When the alkali-soluble resin further includes an acrylic binder resin, since the size of the smallest pattern that can be formed is small and there is no pattern loss, a high-resolution pattern can be realized, and it is advantageous for pattern straightness.

The acrylic binder resin may be, for example, a carboxyl group-containing monomer and a copolymer of the carboxyl group-containing monomer and different polymerizable monomers.

The carboxyl group-containing monomer may be, for example, an unsaturated carboxylic acid, such as an unsaturated polyvalent carboxylic acid having one or more carboxyl groups in the molecule, such as an unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, or unsaturated tricarboxylic acid acid. Here, the unsaturated monocarboxylic acid may be, for example, acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, or cinnamic acid. The unsaturated dicarboxylic acid may be, for example, maleic acid, fumaric acid, itaconic acid, citraconic acid, or mesaconic acid. The unsaturated polyvalent carboxylic acid may be an anhydride, and specifically maleic anhydride, itaconic anhydride or citraconic anhydride. In addition, the unsaturated polyvalent carboxylic acid may be its mono(2-methacryloyloxyalkyl) ester, such as mono(2-propenyloxyethyl) succinate, mono(2-methacryloyl) Oxyethyl) succinate, mono(2-acryloyloxyethyl) phthalate, or mono(2-methacryloyloxyethyl) phthalate.

The unsaturated polyvalent carboxylic acid may be a mono(meth)acrylate having a dicarboxylic acid polymer at both ends thereof, for example, ω-carboxypolycaprolactone monoacrylate or ω-carboxypolycaprolactone monomethyl Acrylate. These carboxyl group-containing monomers can be used alone or in combination of two or more. Examples of different monomers copolymerizable with the carboxyl group-containing monomer may include aromatic vinyl compounds, including styrene, α-methylstyrene, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p- Chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o Vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, and indene; unsaturated carboxylic acid esters, including methyl acrylate, methyl methacrylate, ethyl acrylate, Ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, isopropyl acrylate, isopropyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, methacrylic acid Isobutyl ester, second butyl acrylate, second butyl methacrylate, third butyl acrylate, third butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-Hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-methacrylate Hydroxybutyl ester, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl acrylate, allyl methacrylate Ester, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, methacrylate-2- Methoxy ethyl ester, 2-phenoxy ethyl acrylate, 2-phenoxy ethyl methacrylate, methoxy diethylene glycol acrylate, methoxy diethylene glycol methacrylate, Methoxy triethylene glycol acrylate, methoxy triethylene glycol methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy dipropylene glycol acrylate, methoxy diglycol Propylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadienyl acrylate, dicyclopentadienyl methacrylate, adamantyl (meth)acrylate (adamantyl(meth)acrylate), norbornyl(meth)acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxymethacrylate Propyl, glycerol monoacrylate and glycerol monomethacrylate; unsaturated carboxylic acid aminoalkyl esters, including 2-aminoethyl acrylate, 2-aminoethyl methacrylate, acrylic acid-2 -(Dimethylamino)ethyl, 2-(dimethylamino)ethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, acrylic-2 -Dimethylaminopropyl ester, methacrylic acid-2-dimethylaminopropyl ester, acrylic acid-3-aminopropyl ester, methacrylic acid-3-aminopropyl ester, acrylic acid-3-(dimethyl Amino) propyl ester and methyl 3-(Dimethylamino)propyl acrylate; unsaturated glycidyl carboxylates, including glycidyl acrylate and glycidyl methacrylate; vinyl carboxylates, including vinyl acetate, vinyl propionate, Vinyl butyrate and vinyl benzoate; unsaturated ethers, including vinyl methyl ether, vinyl ether and allyl glycidyl ether; vinyl cyanide, including acrylonitrile, methacrylonitrile, α-chloroacrylonitrile And vinylidene cyanide; unsaturated amides, including acrylamide, methacrylamide, α-chloropropene amide, N-2-hydroxyethylacrylamide, and N-2-hydroxy Ethylmethacrylamide; unsaturated amide imines, including maleimide, benzylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide; Aliphatic conjugated diene (aliphatic conjugated diene), including 1,3-butadiene, isoprene and chloroprene; and at the molecular chain ends of the following polymers have a single propylene acetyl group or a single Macromonomer of methacryloyl group: polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate or polysiloxane polymer (polysiloxane polymer). These monomers can be used alone or in combination of two or more.

In particular, as different monomers that can be polymerized with the carboxyl group-containing monomer, for example, monomers having a norbornyl backbone, monomers having an adamantane backbone, or monomers having a rosin backbone, etc., bulky monomers (bulky) monomer) can reduce the dielectric constant.

Based on a total of 100 parts by weight of alkali-soluble resin, the content of the acrylic binder resin may be 10 parts by weight to 90 parts by weight, preferably 20 parts by weight to 80 parts by weight, and more preferably 30 parts by weight to 70 parts by weight Parts, and in this case, it is advantageous for achieving high-resolution patterns and workability such as pattern straightness.

Based on a total of 100 parts by weight of the photosensitive resin composition, the content of the alkali-soluble resin may generally be 1 part by weight to 50 parts by weight, preferably 3 parts by weight to 40 parts by weight, and more preferably 5 parts by weight to 30 parts by weight Parts by weight. When the content of the alkali-soluble resin satisfies the above range, since it is sufficiently dissolved in the developing solution, it is not easy to produce a development residue of the non-pixel portion on the substrate, and it is difficult for the film of the pixel portion of the exposed portion to occur during development Reduce, the non-pixel part is easy to delete.

Scattering particles

The photosensitive resin composition according to the present invention contains metal oxide-containing scattering particles having an average particle diameter of 30 nm to 500 nm.

In another exemplary embodiment of the present invention, the metal oxide may include at least one metal oxide selected from the group consisting of Li, Be, B, Na, Mg, Al, Si, K, Ca, and Sc , V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm , Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In and combinations thereof.

In yet another exemplary embodiment of the present invention, the metal oxide may be one or more selected from the group consisting of Al ₂ O ₃ , SiO ₂ , ZnO, ZrO ₂ , BaTiO ₃ , TiO ₂ , Ta ₂ O ₅ , Ti ₃ O ₅ , ITO, IZO, ATO, ZnO-Al, Nb ₂ O ₃ , SnO, MgO, and combinations thereof, and compounds with unsaturated bonds such as acrylate can also be surface-treated if necessary The material is used as a metal oxide.

Limit the average particle size and content of the scattering particles in the entire composition to maximize the luminous intensity of the color filter.

The term "average particle diameter" used herein may be a number average particle diameter, and may be observed by, for example, field emission scanning electron microscopy (FE-SEM) or transmission electron microscopy (TEM) To the image. Specifically, the average particle diameter can be obtained as the arithmetic average of the diameters measured from several samples extracted from the images observed by FE-SEM or TEM.

The metal oxide may have an average particle size of 30 nm to 500 nm, and preferably 30 nm to 300 nm. When the average particle diameter of the metal oxide satisfies the above range, the scattering effect increases, and although the photosensitive resin composition including scattering particles does not include blue quantum dots, it can be used as a blue pixel due to a blue light source, and By preventing precipitation in the composition, the surface of the blue pattern layer of uniform quality can be obtained. Therefore, the average particle diameter can be appropriately controlled within the above range.

In another exemplary embodiment of the present invention, based on a total of 100 parts by weight of the photosensitive resin composition, the content of the scattering particles may be 0.1 to 50 parts by weight, preferably 0.5 to 30 parts by weight , And more preferably 0.5 to 20 parts by weight. When the content of the scattering particles is within the above range, a color filter with excellent luminous intensity can be manufactured. Specifically, when the content of the scattering particles is within the above range, the luminous intensity to be obtained can be easily ensured, and the stability of the composition can be prevented from decreasing.

Blue colorant

The photosensitive resin composition of the present invention may further include a blue colorant. Since the photosensitive resin composition according to the present invention may further include a blue colorant, the phenomenon of external light such as sunlight again reflecting light from the light source that has been reflected by the scattering particles can be prevented as described below to achieve high-quality images .

The blue colorant may specifically include a blue pigment, and the blue pigment may be specifically classified as a Color Index (CI; published by the Society of Dyers and Colourists). The compound of the pigment, and more specifically, the color of the CI number described below, but the present invention is not necessarily limited thereto.

In yet another exemplary embodiment of the present invention, the blue colorant may include at least one blue pigment selected from the group consisting of CI Pigment Blue 15:3, CI Pigment Blue 15:4, and CI Pigment Blue 15: 6. CI Pigment Blue 16, CI Pigment Blue 21, CI Pigment Blue 28, CI Pigment Blue 60, CI Pigment Blue 64, CI Pigment Blue 76 and combinations thereof.

Among them, in terms of the effect of suppressing the reflection of external light and the effect of achieving high color reproducibility, it is preferable to include at least one selected from the group consisting of: CI Pigment Blue 15:3, CI Pigment Blue 15:4, and CI Pigment Blue 15:6 and CI Pigment Blue 16.

In still another exemplary embodiment of the present invention, the blue colorant may further include one or more selected from dyes and purple pigments.

The purple pigment may be, but not limited to, for example, one or more selected from the group consisting of CI Pigment Violet 1, CI Pigment Violet 14, CI Pigment Violet 19, CI Pigment Violet 23, CI Pigment Violet 29, CI Pigment Violet 32 , CI Pigment Violet 33, CI Pigment Violet 36, CI Pigment Violet 37, CI Pigment Violet 38, and combinations thereof, and in terms of achieving high color reproducibility through low pigment content, CI Pigment Violet 23 is preferred.

The dye may be a compound classified as a dye in the color index (published by the British Society of Dyestuffs and Colorists) or as described in Dyeing Note (Dyeing Note, published by Shikisensha Co. Ltd.) The conventional blue or purple dye.

For example, CI solvent dyes may include CI solvent blue 5, CI solvent blue 35, CI solvent blue 36, CI solvent blue 37, CI solvent blue 44, CI solvent blue 45, CI solvent blue 59, CI solvent blue 67 and CI solvent blue 70; and CI solvent violet 8, CI solvent violet 9, CI solvent violet 13, CI solvent violet 14, CI solvent violet 36, CI solvent violet 37, CI solvent violet 47 and CI solvent violet 49.

Among them, the C.I. solvent dye preferably includes one or more selected from the group consisting of C.I. Solvent Blue 35, C.I. Solvent Blue 36, C.I. Solvent Blue 44, C.I. Solvent Blue 45 and C.I. Solvent Blue 70; and C.I. Solvent Violet 13.

In addition, CI acid dyes may include CI acid blue 1, CI acid blue 7, CI acid blue 9, CI acid blue 15, CI acid blue 18, CI acid blue 23, CI acid blue 25, CI acid blue 27, CI acid blue 29, CI Acid Blue 40, CI Acid Blue 42, CI Acid Blue 45, CI Acid Blue 51, CI Acid Blue 62, CI Acid Blue 70, CI Acid Blue 74, CI Acid Blue 80, CI Acid Blue 83, CI Acid Blue 86, CI Acid Blue 87, CI Acid Blue 90, CI Acid Blue 92, CI Acid Blue 96, CI Acid Blue 103, CI Acid Blue 112, CI Acid Blue 113, CI Acid Blue 120, CI Acid Blue 129, CI Acid Blue 138, CI Acid Blue 147, CI Acid Blue 150, CI Acid Blue 158, CI Acid Blue 171, CI Acid Blue 182, CI Acid Blue 192, CI Acid Blue 210, CI Acid Blue 242, CI Acid Blue 243, CI Acid Blue 256, CI Acid Blue 259, CI Acid Blue 267, CI Acid Blue 278, CI Acid Blue 280, CI Acid Blue 285, CI Acid Blue 290, CI Acid Blue 296, CI Acid Blue 315, CI Acid Blue 324: 1, CI Acid Blue 335 and CI Acid Blue 340; and CI Acid Violet 6B, CI Acid Violet 7, CI Acid Violet 9, CI Acid Violet 17, CI Acid Violet 19 and CI Acid Violet 66.

Among them, the C.I. acid dye preferably includes one or more selected from the group consisting of C.I. Acid Blue 80 and 90; and C.I. Acid Violet 66.

In addition, CI Direct dyes can include CI Direct Blue 38, CI Direct Blue 44, CI Direct Blue 57, CI Direct Blue 70, CI Direct Blue 77, CI Direct Blue 80, CI Direct Blue 81, CI Direct Blue 84, CI Direct Blue 85, CI Direct Blue 86, CI Direct Blue 90, CI Direct Blue 93, CI Direct Blue 94, CI Direct Blue 95, CI Direct Blue 97, CI Direct Blue 98, CI Direct Blue 99, CI Direct Blue 100, CI Direct Blue 101, CI Direct Blue 106, CI Direct Blue 107, CI Direct Blue 108, CI Direct Blue 109, CI Direct Blue 113, CI Direct Blue 114, CI Direct Blue 115, CI Direct Blue 117, CI Direct Blue 119, CI Direct Blue 137, CI Direct Blue 149, CI Direct Blue 150, CI Direct Blue 153, CI Direct Blue 155, CI Direct Blue 156, CI Direct Blue 158, CI Direct Blue 159, CI Direct Blue 160, CI Direct Blue 161, CI Direct Blue 162, CI Direct Blue 163, CI Direct Blue 164, CI Direct Blue 166, CI Direct Blue 167, CI Direct Blue 170, CI Direct Blue 171, CI Direct Blue 172, CI Direct Blue 173, CI Direct Blue 188, CI Direct Blue 189, CI Direct Blue 190, CI Direct Blue 192, CI Direct Blue 193, CI Direct Blue 194, CI Direct Blue 196, CI Direct Blue 198, CI Direct Blue 199, CI Direct Blue 200, CI Direct Blue 207, CI Direct Blue 209, CI Direct Blue 210, CI Direct Blue 212, CI Direct Blue 213, CI Direct Blue 214, CI Direct Blue 222, CI Direct Blue 228, CI Direct Blue 229, CI Direct Blue 237, CI Direct Blue 238, CI Direct Blue 242, CI Direct Blue 243, CI Direct Blue 244, CI Direct Blue 245, CI Direct Blue 247, CI Direct Blue 248, CI Direct Blue 250, CI Direct Blue 251, CI Direct Blue 252, CI Direct Blue 256, CI Direct Blue 257, CI Direct Blue 259, CI Direct Blue 260, CI Direct Blue 268, CI Direct Blue 274, CI Direct Blue 275 and CI Direct Blue 293; and CI Direct Violet 47, CI Direct Violet 52, CI Direct Violet 54, CI Direct Violet 59, CI Direct Violet 60 , CI Direct Violet 65, CI Direct Violet 66, CI Direct Violet 79, CI Direct Violet 80, CI Direct Violet 81, CI Direct Violet 82, CI Direct Violet 84, CI Direct Violet 89, CI Direct Violet 90, CI Direct Violet 93 , CI Direct Violet 95, CI Direct Violet 96, CI Direct Violet 103 and CI Direct Violet 104.

In addition, CI mordant dye can include CI mordant blue 1, CI mordant blue 2, CI mordant blue 3, CI mordant blue 7, CI mordant blue 8, CI mordant blue 9, CI mordant blue 12, CI mordant blue 13, CI mordant blue 15, CI mordant blue 16, CI mordant blue 19, CI mordant blue 20, CI mordant blue 21, CI mordant blue 22, CI mordant blue 23, CI mordant blue 24, CI mordant blue 26, CI mordant blue 30, CI mordant blue 31, CI mordant blue 32, CI mordant blue 39, CI mordant blue 40, CI mordant blue 41, CI mordant blue 43, CI mordant blue 44, CI mordant blue 48, CI mordant blue 49, CI mordant blue 53, CI mordant blue 61, CI mordant blue 74, CI mordant blue 77, CI mordant blue 83 and CI mordant blue 84; and CI mordant violet 1, CI mordant violet 2, CI mordant violet 4, CI mordant violet 5, CI mordant Violet 7, CI mordant violet 14, CI mordant violet 22, CI mordant violet 24, CI mordant violet 30, CI mordant violet 31, CI mordant violet 32, CI mordant violet 37, CI mordant violet 40, CI mordant violet 41, CI mordant violet Violet 44, CI Mordant Violet 45, CI Mordant Violet 47, CI Mordant Violet 48, CI Mordant Violet 53 and CI Mordant Violet 58.

The dye can be used alone or in combination of two or more thereof.

In still another exemplary embodiment of the present invention, based on a total of 100 parts by weight of the photosensitive resin composition, the content of the blue colorant may be 0.1 to 50 parts by weight, preferably 0.5 to 30 parts by weight Parts by weight, and more preferably 1 part by weight to 20 parts by weight.

When the content of the blue colorant is less than the above range, it may be slightly difficult to ensure that the suppression effect on the reflection of external light reaches a desired degree, while conversely, when the content of the blue colorant is more than the above range, the increase in luminous intensity may Slightly reduced, and the viscosity stability of the composition may be reduced, so the blue colorant is suitable for use within the above range.

In still another exemplary embodiment of the present invention, the photosensitive resin composition may further include one or more selected from the group consisting of photopolymerizable compounds; photoinitiators; solvents; and additives.

Photopolymerizable compound

The photopolymerizable compound contained in the photosensitive resin composition of the present invention is a compound that can be polymerized under the action of light and the following photoinitiator, and can be a monofunctional monomer, a bifunctional monomer, or any Other multifunctional monomers.

Specific examples of the monofunctional monomer may be nonyl phenylcarbitol acrylate (nonyl phenylcarbitol acrylate), 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, acrylic acid -2-hydroxyethyl or N-vinylpyrrolidone.

Specific examples of the bifunctional monomer may be 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate (neopentyl glycol di (meth)acrylate), triethylene glycol di(meth)acrylate, bis(acryloxyethyl) ether of bisphenol A, or 3-methylpentanediol di(meth)acrylate.

Specific examples of the polyfunctional monomer may be trimethylolpropane tri(meth)acrylate, neopentylerythritol tri(meth)acrylate, neopentyltetraritol tri(meth)acrylate ) Acrylate, dipentaerythritol penta (meth) acrylate, or dipentaerythritol hexa (meth) acrylate. Among them, bifunctional or higher polyfunctional monomers are preferably used.

The amount of the photopolymerizable compound may range from 1 part by weight to 30 parts by weight and preferably 5 parts by weight to 20 parts by weight based on a total of 100 parts by weight of the photosensitive resin composition. When the photopolymerizable compound satisfies the above range, it is preferable because the intensity or flattening of the pixel area is easily improved.

Photoinitiator

The photoinitiator used in the present invention may contain an acetophenone-based compound.

Acetophenone-based compounds may be oligomers such as diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2 -Hydroxy-1-[4-(2-hydroxyethoxy)phenyl]-2-methylpropan-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1-(4-methyl Thiophenyl)-2-morpholinopropan-1-one (2-methyl-1-(4-methylthiophenyl)-2-morpholinopropane-1-one), 2-benzyl-2-dimethylamine Yl-1-(4-morpholinylphenyl)butan-1-one or 2-hydroxy-2-methyl[4-(1-methylvinyl)phenyl]propan-1-one, and Preferably, it is 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butan-1-one.

In addition to the acetophenone-based photoinitiator, other photoinitiators can be used in combination. Examples of the photoinitiator other than the acetophenone-based photoinitiator may include active radical generators, sensitizers, and acid generators that generate active radicals by irradiation with light.

Examples of the active radical generator may include benzoin-based compounds, benzophenone-based compounds, thioxanthone-based compounds, and triazine-based compounds. Examples of the benzoin-based compound may include benzoin, benzoin methyl ether, benzoin ether, benzoin isopropyl ether, and benzoin isobutyl ether. Examples of the benzophenone-based compound may include benzophenone, methyl o-benzoyl benzoate, 4-phenyl benzophenone, 4-benzoyl-4'-methyldiphenyl sulfide Ether, 3,3',4,4'-tetrakis(third butylperoxycarbonyl)benzophenone, and 2,4,6-trimethylbenzophenone. Examples of the thioxanthone-based compound may include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1 -Chloro-4-propoxythioxanthone. Examples of the triazine-based compound may include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl Group)-6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1 ,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2-yl)vinyl]-1,3,5-triazine, 2 ,4-bis(trichloromethyl)-6-[2-(furan-2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6- [2-(4-Diethylamino-2-methylphenyl)vinyl]-1,3,5-triazine, and 2,4-bis(trichloromethyl)-6-[2- (3,4-Dimethoxyphenyl)vinyl]-1,3,5-triazine. As the active radical generator, for example, (2,4,6-trimethylbenzyl)diphenylphosphine oxide, 2,2,-bis(o-chlorophenyl)-4,4',5 can be used ,5'-tetraphenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzil, 9,10-phenanthrenequinone , Camphorquinone (camphorquinone), methyl phenyl glyoxylate, or titanocene compound (titanocene compound).

Examples of acid generators may include onium salts, such as 4-hydroxyphenyldimethylammonium p-toluenesulfonate, 4-hydroxyphenyldimethylammonium hexafluoroantimonate, 4-acetoxyphenyldi Methylammonium p-toluenesulfonate, 4-acetoxyphenylmethylbenzylammonium hexafluoroantimonate, triphenylammonium p-toluenesulfonate, triphenylammonium hexafluoroantimonate, diphenyl Iodonium p-toluenesulfonate and diphenyliodonium hexafluoroantimonate, nitrobenzyl tosylate, and benzoin tosylate. In addition, the compound as an active radical generator may include a compound that generates an acid and an active radical, and for example, a triazine-based photoinitiator may also be used as an acid generator.

The content of the photoinitiator used in the photosensitive resin composition according to the present invention can generally be 0.1 part by weight based on the solid content in the total amount of 100 parts by weight of the alkali-soluble resin and the photopolymerizable compound To 40 parts by weight, and preferably 1 part to 30 parts by weight. It is preferable in the above range because the sensitivity of the photosensitive resin composition is high, so the intensity of the pixel region formed using the composition tends to increase, and the flattening of the surface of the pixel region tends to increase. In addition, in the present invention, a photoinitiator adjuvant may be used. The photoinitiator adjuvant can be used in combination with the photoinitiator, and is a compound for promoting the polymerization of the photopolymerizable compound initiated by the photoinitiator. The photoinitiator adjuvant may be an amine compound, an alkoxyanthracene compound or a thioxanthone compound.

The amine-based compound may be, for example, triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4-dimethylamine Isoamyl benzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, N,N-dimethyl p-toluidine, 4, 4'-bis(dimethylamino)benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)benzophenone, or 4, 4'-bis(ethylmethylamino)benzophenone, and preferably 4,4'-bis(diethylamino)benzophenone. The alkoxyanthracene-based compound may be, for example, 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, or 2-ethyl-9 , 10-diethoxyanthracene. The thioxanthone-based compound may be, for example, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, or 1-chloro -4-propoxythioxanthone. These photoinitiator adjuvants can be used alone or in combination of two or more. In addition, commercially available photoinitiator adjuvants, such as the trade name "EAB-F" (manufactured by Hodogaya Chemical Co., Ltd.) can also be used.

When such a photoinitiator adjuvant is used, for each molar initiator, a photoinitiator adjuvant of 10 moles or less and preferably 0.01 mole to 5 moles may be generally included. It is preferable within the above range because the sensitivity of the photosensitive resin composition can be further improved, and therefore the productivity of the color filter formed using the composition tends to be improved.

Solvent

The solvent contained in the photosensitive resin composition of the present invention is not particularly limited, so various types of organic solvents used in the field of photosensitive resin compositions can be used. Specific examples of the solvent may include ethylene glycol monoalkyl ethers, such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dialkyl ether , Such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetate, such as methyl cellulose Ester (methylcellosolve acetate) and ethylcellulose acetate; alkylene glycol alkyl ether acetate, such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate Ester, methoxybutyl acetate and methoxypentyl acetate; aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene; ketones such as methyl ethyl ketone, acetone, methyl amyl Ketones, methyl isobutyl ketone, and cyclohexanone; alcohols, such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin; esters, such as ethyl 3-ethoxypropionate, 3-Methoxypropionic acid methyl ester; and cyclic esters such as γ-butyrolactone. Among these solvents, in terms of coatability and drying properties, organic solvents having a boiling point of 100° C. to 200° C. are preferably used, and alkylene glycol alkyl ether acetate, ketone, Or esters, such as ethyl 3-ethoxypropionate or methyl 3-methoxypropionate, and more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 3 -Ethyl ethoxypropionate or methyl 3-methoxypropionate. These solvents may be used alone or in combination of two or more.

Based on a total of 100 parts by weight of the photosensitive resin composition of the present invention, the content of the solvent in the photosensitive resin composition of the present invention may generally be 60 to 90 parts by weight, and preferably 70 to 85 parts by weight . When the content of the solvent satisfies the above range, it is preferable because when using a coating device such as a roll coater, a spin coater, a slit and spin coater (slit and spin coater), a slit coater (sometimes called a die) (Die coater) It is easy to improve the coating property when coating.

additive

If necessary, in the photosensitive resin composition of the present invention, for example, fillers, different polymer compounds, pigment dispersants, adhesion promoters, antioxidants, ultraviolet absorbers (UV absorbent), Additives such as anti-agglomerating agent.

Specific examples of fillers may include glass, silica, and alumina. Specifically, the different polymer compounds may be curable resins such as epoxy resin or maleimide resin, or thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, acrylic polyfluoroalkane Base ester, polyester or polyurethane. As the pigment dispersant, commercially available surfactants, for example, silicone-based surfactants, fluorine-based surfactants, ester-based surfactants, cationic surfactants, anionic surfactants, Non-ionic surfactant or positive surfactant. These can be used alone or in combination of two or more. Examples of the surfactant may include polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, polyethylene glycol diester, sorbitan fatty acid ester (sorbitan fatty acid ester), fatty acid modified polyester, Tertiary amine modified polyurethane and polyethyleneimine, and further includes the following products: KP (Shin-Etsu Chemicals Co., Ltd.), POLYFLOW (Co-prosperity from the local chemical Kyoei Yuji Chemicals Co., Ltd.), EFTOP (Tohkem Products Co., Ltd.), MEGAFACE (Dai Nippon Ink & Chemical Co., Ltd.) ., Ltd.), Flourad (Sumitomo 3M Ltd.), Asahi guard, Surflon (Asahi Glass Co., Ltd.), SOLSPERSE (Lubrizol ))), EFKA (manufactured by EFKA Chemicals) and PB 821 (Ajinomoto Co., Ltd.)). Examples of the tackifier may include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(2-methoxyethoxy)silane, N-(2-aminoethyl)-3- Aminopropylmethyldimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidol Oxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropylmethyl Dimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane. Examples of the antioxidant may include 2,2'-thiobis(4-methyl-6-t-butylphenol) and 2,6-di-t-butyl-4-methylphenol. Examples of the ultraviolet absorber may include 2-(3-third-butyl-2-hydroxy-5-methylphenyl)-5-chlorobenzotriazole and alkoxybenzophenone. A specific example of the anti-agglomerating agent may be sodium polyacrylate.

Those skilled in the art can add additives at appropriate levels without hindering the effects of the present invention.

The method for preparing the photosensitive resin composition is not limited, but the photosensitive resin composition can be prepared by the following method.

The scattering particles are mixed with the solvent in advance, and the mixture is dispersed to an average particle diameter of 30 nm to 500 nm using a bead mill. Here, if necessary, a dispersant may be additionally used, and part or all of the alkali-soluble resin may be added thereto. The remaining part of the alkali-soluble resin, the photopolymerizable compound, the photoinitiator, and other components as required may be added to the obtained dispersion (hereinafter sometimes referred to as mill base), And when needed, additional solvents can be added to achieve a specified concentration, thereby obtaining the desired photosensitive resin composition.

<Color filter and image display device>

Another aspect of the present invention relates to a color filter containing a self-emissive pixel having a blue pattern layer including the cured product of the photosensitive resin composition.

In the present invention, the photosensitive resin composition may be a photosensitive resin composition for forming a blue pattern layer. In the present invention, the photosensitive resin composition does not include quantum dots.

Since the above-mentioned photosensitive resin composition is used instead of blue quantum dots to manufacture the color filter according to the present invention, the production cost can be reduced, and a wide viewing angle can be realized.

The color filter includes a substrate and a blue pattern layer formed on the substrate.

The substrate may be a substrate integrated in the color filter, or an area where the color filter is provided in the display device, but the invention is not particularly limited thereto. The substrate may be glass, silicon (Si), silicon oxide (SiOx) or polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).

The blue pattern layer may be a layer including the photosensitive resin composition of the present invention, and may be formed as follows: the photosensitive resin composition is applied, and exposure, development, and thermal curing are performed in a predetermined pattern. The pattern layer can be formed by implementing a method generally known in the art.

The color filter may further include one or more selected from the group consisting of a red pattern layer and a green pattern layer. For example, the color filter according to the present invention may contain a self-luminous pixel including the above-mentioned blue pattern layer, and further including one or more selected from the group consisting of a red pattern layer and a green pattern layer .

The red pattern layer or the green pattern layer may include quantum dots and scattering particles. Specifically, the color filter according to the present invention may include a red pattern layer containing red quantum dots or a green pattern layer containing green quantum dots, and the red pattern layer or green pattern layer may include scattering particles. The red pattern layer or the green pattern layer can emit red light or blue light from a light source emitting blue light, which will be described later.

The scattering particles may include metal oxides having an average particle diameter of 30 nm to 500 nm, and the description of the scattering particles and metal oxides may be different from the scattering particles and metals included in the photosensitive resin composition according to the present invention The description of oxide is the same.

In the present invention, the shape, structure, and content of the quantum dots included in the red pattern layer or the green pattern layer are not limited, and quantum dots generally used in the technical field can be applied.

As described above, the color filter including the substrate and the pattern layer may further include barriers formed between the patterns, and may further include a black matrix, but the present invention is not limited thereto.

Another aspect of the present invention relates to an image display device including the aforementioned color filter; and a light source emitting blue light. For example, the image display device according to the present invention includes a color filter and a light source that emits blue light. The color filter includes a blue pattern layer containing the cured product of the photosensitive resin composition.

The color filter of the present invention can be applied to various image display devices, such as electroluminescence display devices, plasma display devices, field emission display devices, and conventional liquid crystal display devices.

When the image display device includes the color filter including the blue pattern layer and the light source according to the present invention, it exhibits excellent emission intensity or wide viewing angle. In addition, since the blue pattern layer included in the color filter according to the present invention does not include blue quantum dots, an image display device with low production cost can be manufactured.

Hereinafter, in order to explain the present invention in detail, the present invention will be described in detail with reference to examples. However, the embodiments according to the present invention can be modified in various different forms, and the scope of the present invention should not be considered limited to the embodiments to be described below. Exemplary embodiments of the present invention are provided for those of ordinary skill to more fully understand the present invention. In addition, in the following, unless otherwise specifically defined, "%" and "parts" representing contents are based on weight.

Synthesis example: Synthesis of alkali-soluble resin

Synthesis Example 1: Alkali-soluble resin

Prepare a flask equipped with a stirrer, thermometer, reflux condenser, dropping funnel, and nitrogen inlet tube. In addition, as a monomer dropping funnel, place 74.8 g (0.20 mol) of benzylmaleimide, 43.2 g (0.30 mol) acrylic acid, 118.0 g (0.50 mol) vinyl toluene, 4 g tertiary butyl peroxy-2-ethylhexanoate and 40 g propylene glycol monomethyl ether acetate , PGMEA) and mixed by stirring, and as a chain transfer agent (chain transfer agent) dropping funnel, add 6 g of n-dodecyl mercaptan and 24 g of PGMEA and mix by stirring. Thereafter, 395 g of PGMEA was placed in the flask, and the atmosphere in the flask was changed from air to nitrogen, and then the resulting mixture was heated to 90°C with stirring. Subsequently, the monomer and chain transfer agent began to drop from their respective dropping funnels. The dripping was carried out at 90°C for 2 hours, and after 1 hour, the temperature was raised to 110°C, and then held for 3 hours, and put into a gas inlet pipe to start blowing oxygen/nitrogen (5/95 (volume/volume) )mixed composition. After that, 28.4 g [(0.10 mol) of glycidyl methacrylate [(0.10 mol), (33 mol% based on the carboxyl group of acrylic acid used in this reaction)], 0.4 g of 2,2′-methylene were added to the flask Bis(4-methyl-6-tert-butylphenol) and 0.8 g of triethylamine were reacted at 110° C. for 8 hours, thereby obtaining Resin A having a solid content acid value of 70 mg KOH/g. The polystyrene-equivalent weight-average molecular weight measured by GPC was 16,000, and the molecular weight distribution (Mw/Mn) was 2.3.

Synthesis Example 2: Synthesis of Formula 1 Compound

In a 3000 ml three-necked round bottom flask, 364.4 g of 3', 6'-dihydroxyspiro (fu-9,9'-dibenzopiperan) of formula 3 and 0.4159 g of third butyl ammonium bromide were mixed , And add 2359 grams of epichlorohydrin, and then heated to 90 ℃ for reaction. When it was confirmed by liquid chromatography that 3',6'-dihydroxyspiro (fu-9,9'-dibenzopiperan) was completely consumed, the resulting mixture was cooled to 30°C, and then 50% NaOH was slowly added Aqueous solution (3 equivalents (equiv.)). When it was confirmed by liquid chromatography that epichlorohydrin was completely consumed, the resulting mixture was extracted with dichloromethane and washed three times, the organic layer was dried with magnesium sulfate, dichloromethane was distilled off under reduced pressure, and the mixing ratio was 50:50 The dichloromethane and methanol were recrystallized.

After mixing 1 equivalent of the epoxy compound synthesized as described above, 0.004 equivalent of the third butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol and 2.2 equivalents of acrylic acid, 24.89 g of propylene glycol monomer was added thereto Dimethyl ether acetate solvent and mix with the resulting mixture. While adding air to the reaction solution at a rate of 25 ml/min, the temperature was raised to 90°C to 100°C for dissolution. When the reaction solution became cloudy, the temperature was raised to 120°C to completely dissolve. When the solution became clear and the viscosity increased, the acid value was measured and stirred until the acid value became less than 1.0 mg KOH/g. It took 11 hours to reach the required level of acid value (0.8). After the reaction was completed, the temperature of the reactor was lowered to room temperature, thereby obtaining a colorless and transparent compound of Formula 1.

Synthesis Example 3: Synthesis of Formula 2 Compound

364.4 grams of 4,4'-(9H-dibenzopiperan-9,9-diyl) diphenol of formula 4 and 0.4159 grams of third butylammonium bromide were mixed in a 3,000 ml three-necked round bottom flask, 2,359 g of epichlorohydrin was added, and the reaction was heated to 90°C. After confirming by liquid chromatography that 4,4'-(9H-dibenzopiperan-9,9-diyl) diphenol was completely consumed, the resulting mixture was cooled to 30°C, and then 50% NaOH aqueous solution was slowly added ( 3 equivalents). After confirming the complete consumption of epichlorohydrin by liquid chromatography, the resulting mixture was extracted with dichloromethane and washed three times, the organic layer was dried over magnesium sulfate, dichloromethane was distilled under reduced pressure, and dichloromethane with a mixing ratio of 50:50 was used Methane and methanol are recrystallized. After mixing 1 equivalent of the epoxy compound synthesized as described above, 0.004 equivalent of tert-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol and 2.2 equivalents of acrylic acid, 24.89 g of propylene glycol monomethyl was added Ether acetate solvent and mix with the resulting mixture. While introducing air into the reaction solution at a rate of 25 ml/min, the temperature was raised to 90°C to 100°C to dissolve. When the reaction solution became cloudy, the temperature was raised to 120°C to completely dissolve. When the solution became clear and the viscosity increased, the acid value was measured and stirred until the acid value became less than 1.0 mg KOH/g. It took 11 hours to reach the required level of acid value (0.8). After the reaction was completed, the reactor temperature was lowered to room temperature, thereby obtaining a colorless and transparent compound of Formula 2.

Synthetic Example 4: Synthesis of carbole-based binder resin (A-1)

After adding 600 g of propylene glycol monomethyl ether acetate to 307.0 g of the compound of Formula 1 prepared in Synthesis Example 2 and dissolving it, 78 g of biphenyltetracarboxylic dianhydride mixed with 1 g of tetraethylammonium bromide was added, and The resulting mixture was slowly heated to 110°C to 115°C and reacted for 4 hours. After confirming that the acid anhydride was removed, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90°C for 6 hours to polymerize into a carbole-based binder resin. The removal of acid anhydride was confirmed by IR spectrum. As a result, Resin A-1 with a solid content acid value of 70 mg KOH/g was obtained. The weight average molecular weight in terms of polystyrene measured by GPC was 4,530.

Synthetic example 5: Synthesis of carbole-based binder resin (A-2)

To 307.0 g of the compound of Formula 2 prepared in Synthesis Example 3 was added 600 g of propylene glycol monomethyl ether acetate and dissolved, then 78 g of phenyltetracarboxylic dianhydride mixed with 1 g of tetraethylammonium bromide was added, and The resulting mixture was slowly heated to 110°C to 115°C and reacted for 4 hours. After confirming that the acid anhydride was removed, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90°C for 6 hours to polymerize into a carbole-based binder resin. The removal of anhydride was confirmed by infrared spectroscopy. As a result, Resin A-2 having a solid content acid value of 98 mg KOH/g was obtained. The weight average molecular weight in terms of polystyrene measured by GPC was 3,830.

Synthetic Example 6: Synthesis of Carbodol Binder Resins B-1 and B-2

(1) Synthesis Example 6-1: 2,2'-(((((9H-fu-9,9-diyl)bis(4,1-phenylene))bis(oxygen))bis(methylene ))Bis(ethylene oxide)(2,2'-((((9H-fluorene-9,9-diyl)bis(4,1-phenylene))bis(oxy))bis(met hylene))bis (oxirane))

After putting 42.5 g of 9,9-bisphenol stilbene, 220 ml of 2-(chloromethyl)ethylene oxide and 100 mg of tert-butylammonium bromide, stirring was carried out until the reaction was completely consumed at 90°C, Distillation is carried out under pressure. The temperature was reduced by another 30°C, dichloromethane was added, and then NaOH was slowly added. After performing high performance liquid chromatography (HPLC) to confirm that the product content reached 96%, 5% HCl was added dropwise to terminate the reaction. The reactant was extracted and the layers were separated, and the organic layer was washed with water to neutralize. The organic layer was dehydrated with MgSO ₄ and distilled using a rotary evaporator under pressure to concentrate. Dichloromethane was added to the concentrated product, and the temperature was raised to 40°C while stirring. Methanol was added to lower the temperature of the solution and stirred. The resulting solid was filtered and then vacuum dried at room temperature, thereby obtaining 52.7 g of white solid powder (yield: 94%).

(2) Synthesis Example 6-2: 3,3'-(((9H-fu-9,9-diyl)bis(4,1-phenylene))bis(oxygen))bis(1-(benzene Thio)propan-2-ol)(3,3'-(((9H-Fluorene-9,9-diyl)bis(4,1-phenylene))bis(oxy))bis(1-(phenylthio)propan -2-ol), BTCP) synthesis

1000 g of the compound obtained in Synthesis Example 6-1, 524 g of thiophenol and 617 g of ethanol were put in and stirred. 328 g of triethylamine was slowly added dropwise to the reaction solution. High performance liquid chromatography (HPLC) was performed to confirm that the starting material had disappeared, and the reaction was terminated. After the reaction was completed, ethanol was distilled off under pressure. The organic material was dissolved in methylene chloride and washed with water to remove methylene chloride by pressure distillation. The concentrated organic material was dissolved in ethyl acetate, and ether solvent was added dropwise, followed by stirring for 30 minutes. The compound was distilled under pressure, thereby obtaining 945 g of light yellow oil (yield 64%).

(3) Synthesis Example 6-3: Synthesis of carbole-based binder resin (B-1)

Place 200 grams of BTCP monomer dissolved in 50% PGMEA solvent, and then heat to 115°C. After adding 31.1 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride dropwise at 115°C, the resulting solution was stirred at 115°C for 6 hours. After adding 7.35 g of phthalic anhydride, it was stirred for another 2 hours, and then the reaction was terminated. After cooling, a binder resin having a weight average molecular weight of 3,500 g/mole was obtained.

(4) Synthesis Example 6-4: Synthesis of carbole-based binder resin (B-2)

Place 200 grams of BTCP monomer dissolved in 50% PGMEA solvent and heat to 115°C. 21.1 g of pyromellitic dianhydride was added dropwise at 115°C and stirred at 115°C for 6 hours. After adding 7.35 g of phthalic anhydride, it was stirred for another 2 hours, and then the reaction was terminated. After cooling, a binder resin having a weight average molecular weight of 4,500 g/mole was obtained.

Here, the weight average molecular weight (Mw) of the resin is measured by GPC under the following conditions.

Device: HLC-8120 GPC (Tosoh Corp.)

Column: TSK-GELG4000HXL+TSK-GELG2000HXL (tandem)

Column temperature: 40℃

Mobile phase solvent: tetrahydrofuran

Flow rate: 1.0 ml/min

Introduced volume: 50 microliters (μl)

Detector: RI

Measuring sample concentration: 0.6% by weight (solvent = tetrahydrofuran)

Standard calibration materials: TSK Standard Polystyrene (TSK STANDARD POLYSTYRENE) F-40, F-4, F-1, A-2500, A-500 (Tosoh Co., Ltd.)

Example 1 to Example 46 and Comparative Example 1 to Comparative Example 10: Preparation of photosensitive resin composition

The photosensitive resin compositions according to the examples and comparative examples were prepared according to the compositions shown in Tables 1 to 9 (Table 1 shows scattering particles, Table 2 shows blue colorants and purple colorants, Tables 3 to Tables) 7 shows the photosensitive resin composition according to each embodiment, and Table 8 and Table 9 show the components and contents of the photosensitive resin composition).

1) Photopolymerizable compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

2) Starter (D): Irgaqure-907 (manufactured by BASF)

3) Solvent (E): propylene glycol monomethyl ether acetate

1) Photopolymerizable compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

2) Starter (D): Irgaqure-907 (manufactured by BASF)

3) Solvent (E): propylene glycol monomethyl ether acetate

1) Photopolymerizable compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

2) Starter (D): Irgaqure-907 (manufactured by BASF)

3) Solvent (E): propylene glycol monomethyl ether acetate

1) Photopolymerizable compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

2) Starter (D): Irgaqure-907 (manufactured by BASF)

3) Solvent (E): propylene glycol monomethyl ether acetate

1) Photopolymerizable compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

2) Starter (D): Irgaqure-907 (manufactured by BASF)

3) Solvent (E): propylene glycol monomethyl ether acetate

1) Photopolymerizable compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

2) Starter (D): Irgaqure-907 (manufactured by BASF)

3) Solvent (E): propylene glycol monomethyl ether acetate

1) Photopolymerizable compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)

2) Starter (D): Irgaqure-907 (manufactured by BASF)

3) Solvent (E): propylene glycol monomethyl ether acetate

Manufacturing of color filters

The photosensitive resin composition according to each Example and Comparative Example was used to manufacture a color filter. That is, each photosensitive resin composition was applied on a glass substrate by spin coating, and the substrate was placed on a hot plate and held at 100° C. for 3 minutes to form a thin film.

Subsequently, a test mask with a square transmission pattern of 20 mm×20 mm (width×length) and a line/space pattern of 1 μm to 100 μm was placed on the film, and the self-test mask was radiated at a pitch of 100 μm Shine ultraviolet light.

Here, an ultra-high pressure mercury lamp (product name: USH-250D) manufactured by Ushio Inc. is used as an ultraviolet light source at 200 millijoules per square centimeter (mJ/cm ² ) (365 nanometers) The exposure intensity is light irradiated in an air atmosphere, and no special filter is used.

The film irradiated with ultraviolet rays was immersed in a KOH developing aqueous solution having a pH of 10.5 for 80 seconds, thereby performing development. The thin film-coated glass plate was washed with distilled water, dehydrated with nitrogen, and heated in an oven at 150° C. for 10 minutes, thereby manufacturing a color filter pattern. The thickness of the color pattern thus produced is 5.0 microns.

Experimental Example 1: Experiments on the development rate, sensitivity and pattern stability of color filters

The development speed, sensitivity, and pattern stability of the color filter manufactured using the photosensitive resin composition of each Example and the comparative example were measured. The evaluation criteria for each test are as follows. The measurement results are listed in Table 10.

Development speed (seconds): Time to first dissolve unexposed areas in the developer during development <Spray Developer HPMJ Method>

Sensitivity: the degree of thin film formation of the micromask of the photosensitive mask (1 to 60) (the smaller the value, the better the sensitivity)

Pattern stability: The degree of pattern error after exposure to a pattern mask at a low exposure dose (20 millijoules (mJ) to 100 millijoules).

○: No pattern error

△: One or two patterns are wrong

×: Three or more patterns are wrong

(○, △, and × indicate the results obtained using the optical microscope of the three-dimensional surface profiler)

Experimental Example 2: Experiments to measure the solvent resistance and heat resistance of color filters

By measuring the heat resistance and solvent resistance of the color filter manufactured using the photosensitive resin composition according to each of Examples and Comparative Examples, the evaluation of the color filter or liquid crystal display device Whether heat and solvent affect the stability of color filters or liquid crystal display devices. The measurement results are shown in Table 10.

Evaluation of solvent resistance: The manufactured color filter is immersed in 1-methyl-2-pyrrolidone (NMP) solvent for 30 minutes to detect and compare the color change before and after evaluation . The color change in the three-dimensional colorimeter system defined by L ^* , a ^*, and b ^{* is} calculated by mathematical formula 1.

Evaluation of heat resistance: The color filter manufactured as described above was heated in an oven at 230° C. for 2 hours, and the color change before and after heating was calculated by mathematical formula (1).

Mathematical formula (1) △Eab ^* =[(△L ^* ) ² +(△a ^* ) ² +(△b ^* ) ² ] ^1/2 ○: △Eab ^* = less than 1△: △Eab ^* = 1 to 3×: △Eab ^* = greater than 3

Experimental Example 3: Experiment of forming micro patterns

In each color filter manufactured using the photosensitive resin according to each of the Examples and Comparative Examples, an OM device (Nikon Eclipse LV100POL) was used for measurement using a line/space pattern mask designed to be 100 microns The size of the obtained pattern. The measurement results are listed in Table 10.

When the difference between the design value of the line/space pattern mask and the measured value of the obtained micropattern is 20 μm or more, it is difficult to realize micro pixels, and when the design value of the line/space pattern mask is When the difference between the measured value of the obtained micropattern is negative, it is called the critical value that causes the process to fail.

Referring to Table 10, it can be confirmed that when the metal oxide scattering particles have an average particle diameter of 30 nm to 500 nm, a micropattern is appropriately formed. In the comparative example, it can be confirmed that it is difficult to form a micropattern.

In addition, from the evaluation results, it can be confirmed that the sensitivity, the pattern stability, the micro The pattern and reliability are excellent.

Experimental Example 4: Measurement of luminous intensity

In each color filter manufactured using the scattering particles according to each example and the photosensitive resin according to each comparative example, 365 nanometers applied to the formed square area having a size of 20 mm×20 mm were measured. Rice tube type 4 watt ultraviolet irradiator (VL-4LC, VILBER LOURMAT) part of the light conversion, and in this case, use a spectrometer (Ocean Optics) to measure the 450 nm area light intensity. The measurement results are listed in Table 11.

Experimental Example 5: Measurement of viewing angle

In each color filter manufactured using the photosensitive resin composition according to each example and the comparative example, an angle measuring photometer (GC-5000L, Nippon Denshoku) was used to measure the formed size The luminous intensity depending on the viewing angle is a square portion of 20 mm×20 mm, and the diffusivity is calculated using mathematical formula (2). The measurement results are listed in Table 11.

Mathematical formula (2) Diffusion rate=(I70+I20)/2×I5×100 I represents the luminous intensity measured under the viewing angle.

Experimental Example 6: Measurement of reflectance

In each color filter manufactured using the photosensitive resin compositions prepared according to Examples 22 to 46 and Comparative Examples 5 to 10, for a square pattern having a size of 20 mm×20 mm In part, a spectral colorimeter (CM-3600A; Konica Minolta) was used to measure the reflectance under light transmission conditions. The measurement results are listed in Table 11.

Note that as the measured luminous intensity increases, the luminous efficiency increases. Referring to Table 11, it can be confirmed that in the example in which the average particle diameter of the metal oxide scattering particles is in the range of 30 nm to 500 nm, the luminous intensity is improved compared to the comparative example.

It can be noted that as the measured diffusivity increases, the viewing angle improves. Referring to Table 11, it can be confirmed that, in the example where the average particle diameter of the metal oxide scattering particles is in the range of 30 nm to 500 nm, the viewing angle is improved compared to the comparative example.

It can be noted that as the measured reflectance decreases, the suppression of external light reflection is improved, which is advantageous for high-quality images. Referring to Table 11, it can be confirmed that in the case of each example, the reflectance is excellent and the luminous intensity is excellent.

Claims (10)

A photosensitive resin composition comprising: an alkali-soluble resin; and scattering particles, the scattering particles comprising a metal oxide having an average particle diameter of 30 nm to 500 nm, wherein the alkali is soluble The soluble resin includes one or more selected from the group consisting of: a first cardo-based binder resin polymerized with the compound represented by the following formula 1 and a first polymerized compound with the compound represented by the following formula 2 Dicarbole adhesive resin:

In Formula 1, R1 and R2 are each independently

X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R3 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and in Formula 2, R4 and R5 are each independently

X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R6 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, wherein the alkali-soluble resin further includes formulas 3 and 4 Carboline binder resin with at least one repeating unit in:

In Equations 3 and 4, P is independently

R7 and R8 are each independently a hydrogen atom, a hydroxyl group, a thiol group, an amine group, a nitro group, or a halogen atom, Ar1 is independently a C6 to C15 aryl group, Y is an acid anhydride residue, and Z is a dianhydride Residues, A is O, S, N, Si, or Se, a and b are each independently an integer of 1 to 6, and n and m are each independently an integer of 0 to 30, where n and m are not simultaneously 0 . The photosensitive resin composition as described in claim 1 further contains a blue colorant. The photosensitive resin composition according to claim 1, wherein the metal oxide comprises one or more metal oxides selected from the group consisting of Li, Be, B, Na, Mg, Al, Si, K, Ca , Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm , Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In and Its combination. The photosensitive resin composition according to claim 3, wherein the metal oxide comprises one or more selected from the group consisting of Al ₂ O ₃ , SiO ₂ , ZnO, ZrO ₂ , BaTiO ₃ , TiO ₂ , Ta ₂ O ₅ , Ti ₃ O ₅ , ITO, IZO, ATO, ZnO-Al, Nb ₂ O ₃ , SnO, MgO, and combinations thereof. The photosensitive resin composition according to claim 1, wherein the alkali-soluble resin further contains an acrylic binder resin. The photosensitive resin composition according to claim 1, wherein the content of the scattering particles is 0.1 parts by weight to 50 parts by weight based on a total of 100 parts by weight of the photosensitive resin composition. The photosensitive resin composition according to claim 1, wherein the content of the carbole-based binder resin is 1 part by weight to 50 parts by weight based on a total of 100 parts by weight of the photosensitive resin composition. The photosensitive resin composition according to claim 1, further comprising one or more selected from the group consisting of: a photopolymerizable compound; a photoinitiator; a solvent; and an additive. A color filter containing a self-emissive pixel, the color filter containing the cured product of the photosensitive resin composition according to any one of claims 1 to 8. An image display device comprising: the color filter according to claim 9; and a light source emitting blue light.