WO2018182133A1 - Blue photo-sensitive resin composition, color filter manufactured by using same, and image display device - Google Patents

Blue photo-sensitive resin composition, color filter manufactured by using same, and image display device Download PDF

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Publication number
WO2018182133A1
WO2018182133A1 PCT/KR2017/013931 KR2017013931W WO2018182133A1 WO 2018182133 A1 WO2018182133 A1 WO 2018182133A1 KR 2017013931 W KR2017013931 W KR 2017013931W WO 2018182133 A1 WO2018182133 A1 WO 2018182133A1
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WO
WIPO (PCT)
Prior art keywords
formula
resin composition
blue
photosensitive resin
color filter
Prior art date
Application number
PCT/KR2017/013931
Other languages
French (fr)
Korean (ko)
Inventor
조성배
김형주
Original Assignee
동우 화인켐 주식회사
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Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to JP2019542616A priority Critical patent/JP6884872B2/en
Priority to CN201780085893.6A priority patent/CN110268324B/en
Publication of WO2018182133A1 publication Critical patent/WO2018182133A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present invention relates to a blue photosensitive resin composition, a color filter manufactured using the same, and an image display device.
  • the color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units.
  • the size of one pixel is about tens to hundreds of micrometers.
  • Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
  • Korean Patent Publication No. 2007-0094679 suggests that color reproducibility can be improved by having a color filter layer formed of quantum dots, and Korean Patent Publication No. 2009-0036373 uses a conventional color filter as a quantum dot phosphor. It is proposed that the display quality can be improved by improving the luminous efficiency by replacing the light emitting layer.
  • the photosensitive resin composition developed to manufacture a color filter did not sufficiently satisfy the requirements of excellent solvent resistance, adhesiveness, and pattern formability (fine pattern formability) when formed into a cured film. .
  • the present invention provides a color filter having excellent solvent resistance, adhesion and pattern formability (fine pattern formability), in particular, a blue photosensitive resin composition capable of realizing a self-luminous color filter when formed into a cured film, and a color filter manufactured using the same. It is an object to provide an image display device.
  • the present invention is a blue photosensitive resin composition
  • a scattering particle comprising a scattering particle, a thiol compound represented by the following formula (1), a blue colorant, a binder resin, a cardo-based binder resin, a photopolymerizable compound, a photoinitiator, and a solvent,
  • Z 1 is a methylene group or a linear or branched alkylene group or alkylmethylene group having 2 to 10 carbon atoms
  • Y is a single bond, -CO-, -O-CO- or -NHCO-
  • n Is an integer of 3 to 10
  • X is a C2-C70 n-valent hydrocarbon group which may have one or a plurality of ether bonds, or n is 3 and X is a trivalent group represented by the following formula (2):
  • Z 2 , Z 3 and Z 4 are each independently a methylene group or an alkylene group having 2 to 6 carbon atoms, and “*” represents a bond).
  • the present invention provides a color filter comprising a blue pattern layer made of the above-described blue photosensitive resin composition.
  • the present invention is the color filter; And a light source emitting blue light.
  • the blue photosensitive resin composition of the present invention comprises a thiol compound represented by the formula (1) in the blue photosensitive resin composition, so that the blue photosensitive resin composition has excellent solvent resistance, adhesiveness and pattern forming property when formed into a cured film. It is possible to implement a color filter having excellent fine pattern formability, particularly a self-luminous color filter.
  • the blue photosensitive resin composition of the present invention may include scattering particles, a thiol compound represented by Formula 1, a blue colorant, a binder resin, a cardo-based binder resin, a photopolymerizable compound, a photoinitiator, and a solvent, and in particular, a thiol represented by Formula 1
  • the blue photosensitive resin composition may be a color filter having excellent solvent resistance, adhesiveness, and pattern formability (fine pattern formability), particularly self-luminous color filter, when formed into a cured film.
  • the scattering particles of the present invention may be a metal oxide having an average particle diameter of 10 to 1000 nm, more preferably when the average particle diameter is in the range of 30 to 300 nm. If the average particle diameter of the scattering particles satisfies the above range, a sufficient scattering effect of the light emitted from the quantum dots can be expected, and the scattering particles may sink in the blue photosensitive composition, or a problem may occur in which the surface of the light emitting layer may be uneven. Lowers.
  • the metal oxide is Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, It may be an oxide including one metal selected from the group consisting of Ce, Ta, In, and combinations thereof.
  • the scattering particles may be appropriately adjusted as necessary to the average particle diameter and the content in the entire composition to sufficiently improve the light emission intensity of the color filter.
  • the scattering particles may be appropriately adjusted as necessary to the average particle diameter and the content in the entire composition to sufficiently improve the light emission intensity of the color filter.
  • the scattering particles may be included in 0.1 to 50% by weight relative to the total weight of solids in the blue photosensitive resin, preferably 5 to 30% by weight.
  • the content of the scattering particles satisfies the above range, while achieving the desired emission intensity, it is possible to lower the possibility of a problem of deterioration in stability of the blue photosensitive resin composition.
  • the thiol compound represented by the formula (1) included in the present invention serves to improve the pattern characteristics formed of the blue photosensitive resin composition and to enhance durability and reliability.
  • Z 1 is a methylene group or a linear or branched alkylene group or alkylmethylene group having 2 to 10 carbon atoms
  • Y is a single bond, -CO-, -O-CO- or -NHCO-
  • n Is an integer of 3 to 10
  • X is a C2-C70 n-valent hydrocarbon group which may have one or a plurality of ether bonds, or n is 3 and X is a trivalent group represented by the following formula (2):
  • Z 2 , Z 3 and Z 4 are independently of each other a methylene group or an alkylene group having 2 to 6 carbon atoms, "*" represents a bond).
  • n is preferably 4 or more, or an integer of 4 to 10, and more preferably 4, 6 or 8.
  • the thiol compound represented by Chemical Formula 1 may include at least one selected from the group consisting of compounds represented by Chemical Formulas 5 to 12, and preferably, a compound represented by Chemical Formula 5, a compound represented by Chemical Formula 9 It may include.
  • the blue photosensitive resin composition is a color filter excellent in excellent solvent resistance, adhesion and pattern formability (fine pattern formability), particularly when formed into a cured film
  • the self-luminous color filter may be implemented.
  • the thiol compound represented by Chemical Formula 1 may be used alone or in combination of two or more thereof.
  • the thiol compound may be included in 0.05 to 5% by weight, preferably 0.08 to 3% by weight based on the total weight of solids in the blue photosensitive resin.
  • the content of the thiol compound satisfies the above range, it is advantageous in terms of stability, smell, sensitivity, resolution, developability, and adhesion of the blue photosensitive resin composition.
  • examples of the blue pigment include compounds classified as pigments in the color index (Published by The society of Dyers and Colourists), and more specifically, the color index (CI) as follows.
  • pigment of number is mentioned, It is not necessarily limited to these.
  • Blue pigments are specifically described, for example, in C.I. Pigment blue 15: 3, 15: 4, 15: 6, 16, 21, 28, and 76, and the like.
  • Pigment Blue 15: 3, Pigment Blue 15: 6, Pigment Blue 16 It is preferable to include at least 1 type selected from the group which consists of.
  • the blue colorant of the present invention may further comprise a blue dye, which is a known dye which is described in a compound or dyeing note (color dyed yarn) classified as a dye in the color index (published by The Society of Dyers and Colourists). And dyes.
  • a blue dye which is a known dye which is described in a compound or dyeing note (color dyed yarn) classified as a dye in the color index (published by The Society of Dyers and Colourists). And dyes.
  • the said blue dye can be used individually or in combination of 2 or more types, respectively.
  • the blue colorant of the present invention may further include a purple colorant as an additional colorant.
  • the purple coloring agent may comprise at least one of a purple pigment and a purple dye, wherein the purple pigment is specifically C.I. Pigment violet 1, 14, 19, 23, 29, 32, 33, 36, 37 and 38, among which C.I. It is more preferred to include pigment violet 23.
  • Purple dyes are specifically, C.I. Solvent violet, C.I. acid violet, C.I. acid violet, C.I. modanto violet, and the like, but are not limited thereto.
  • the C.I. Solvent violet is C.I. Solvent violet 8, 9, 13, 14, 36, 37, 47 and 49, and the like. More preferably, solvent violet 13 is included.
  • C.I. acid violet includes C.I. Acid violet 6B, 7, 9, 17, 19 and 66, and the like. More preferably, acid violet 66 is included.
  • CI direct violet includes CI direct violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103 and 104. .
  • the blue colorant may include 0.1 to 50% by weight, and preferably 0.5 to 30% by weight, based on the total weight of solids in the blue photosensitive resin. It may be included in 0.1 to 50% by weight based on 100% by weight of the blue photosensitive resin composition, preferably 0.5 to 30% by weight, more preferably 1 to 20% by weight.
  • the content of the blue colorant satisfies the above range, it is advantageous to achieve the effect of suppressing the external light reflection and is advantageous because it is less likely to cause a problem of lowering the luminescence intensity or a problem of lowering the viscosity stability of the blue photosensitive resin composition.
  • the blue colorant and the scattering particles are included even though the blue quantum dots are not included, thereby reducing the efficiency of the blue pixel of the color filter, particularly the self-luminous color filter.
  • the binder resin of this invention contains cardo system binder resin.
  • the cardo-based binder resin has reactivity and alkali solubility due to the action of light or heat and acts as a dispersion medium of the coloring material.
  • the cardo-based binder resin contained in the blue photosensitive resin composition of the present invention is not limited as long as it is a resin that acts as a binder resin for scattering particles and is soluble in an alkaline developer used in the developing step for producing a color filter.
  • the cardo-based binder resin of the present invention may include one or more of the compounds represented by Chemical Formulas 13-1 and 13-2.
  • R 1 , R 2 , R 3 and R 4 are each independently, Is;
  • X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group
  • R 5 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
  • the compound represented by Chemical Formula 13-1 may be synthesized by the compound represented by Chemical Formula 14-1, and the compound represented by Chemical Formula 13-2 may be synthesized using the compound represented by Chemical Formula 14-2. .
  • the compound represented by Formula 13-1 may be any one or more of compounds represented by Formula 15 or Formula 16, and the compound represented by Formula 13-2 may be any one or more of compounds represented by Formula 17 or Formula 18.
  • the cardo-based binder resin is 9,9-bis (3-cinnamic diester) fluorene (9,9-bis (3-cinnamic diester) fluorene), 9,9-bis (3- cinnamoyl, 4-hydride Hydroxyphenyl) fluorene (9,9-bis (3-cinnamoil, 4-hydroxyphenyl) fluorene), 9,9-bis (glycidyl methacrylate ether) fluorene (9,9-bis (glycidyl methacrylate ether) fluorene), 9,9-bis (3,4-dihydroxyphenyl) fluorene dinamic ester (9,9-bis (3,4-dihydroxyphenyl) fluorene dicinnamic ester), 3,6-diglycidyl meta Acrylate ether spiro (3,6-diglycidyl methacrylate ether spiro (fluorene-9,9-xantene)), 9,9-bis (3-ally
  • It can be prepared by reacting with at least one selected from the group consisting of aromatic polyhydric carboxylic acid anhydrides such as pyromellitic anhydride, benzophenone tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, and bitenyl ether tetracarboxylic acid dianhydride. It is not limited.
  • aromatic polyhydric carboxylic acid anhydrides such as pyromellitic anhydride, benzophenone tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, and bitenyl ether tetracarboxylic acid dianhydride. It is not limited.
  • the present invention is a binder resin, acrylic alkali-soluble resin may be used together with the cardo resin. That is, in the present invention, the blue photosensitive resin composition may further include an acrylic alkali-soluble resin in the cardo-based resin.
  • acrylic alkali-soluble resin examples include carboxyl group-containing monomers and copolymers with other monomers copolymerizable with this monomer.
  • carboxyl group-containing monomer unsaturated carboxylic acids, such as unsaturated monocarboxylic acid, unsaturated polycarboxylic acid, such as unsaturated polyhydric carboxylic acid which has one or more carboxyl groups in molecules, such as unsaturated dicarboxylic acid and unsaturated tricarboxylic acid, are mentioned, for example. have.
  • unsaturated monocarboxylic acid acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example.
  • unsaturated dicarboxylic acid a maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example.
  • the unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride.
  • the unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester thereof, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl ), Mono (2-acryloyloxyethyl) phthalate, mono (2-methacryloyloxyethyl) phthalate, etc. are mentioned.
  • the unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate. .
  • carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
  • styrene (alpha) -methylstyrene, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p-chloro styrene, o-methoxy styrene, m-meth Oxy styrene, p-methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p- Aromatic vinyl compounds such as vinyl benzyl
  • Unsaturated carboxylic acid esters 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxyl such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate and 3-dimethylaminopropyl methacrylate Acid aminoalkyl esters; Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; Un
  • Unsaturated imides such as N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; And monoacryloyl or monomethacryloyl groups at the terminal of the polymer molecular chain of polystyrene, polymethylacrylate, polymethylmethacrylate, poly-n-butylacrylate, poly-n-butylmethacrylate, polysiloxane. And macromonomers to have. These monomers can be used individually or in mixture of 2 or more types, respectively.
  • bulky monomers such as monomers having a norbornyl skeleton, monomers having an adamantane skeleton, and monomers having a rosin skeleton as the other monomers copolymerizable with the carboxyl group-containing monomer are preferable because they tend to lower the dielectric constant.
  • the acid value is preferably in the range of 20 to 200 (KOH mg / g). If the acid value is in the above range, the solubility in the developing solution is improved, so that the non-exposed part is easily dissolved and the sensitivity is increased, and as a result, the pattern of the exposed part remains at the time of development to improve the film remaining ratio.
  • the acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer, and can usually be obtained by titration using an aqueous potassium hydroxide solution.
  • the polystyrene reduced weight average molecular weight (hereinafter, simply referred to as 'weight average molecular weight') measured by gel permeation chromatography (GPC; tetrahydrofuran as an eluting solvent) is 2,000 to 200,000, preferably 3,000 to 100,000.
  • GPC gel permeation chromatography
  • Cardo-based binder resins and / or acrylic alkali-soluble resins are preferred.
  • the molecular weight is in the above range, the hardness of the coating film is improved, the residual film ratio is high, the solubility of the non-exposed portion in the developer is excellent and the resolution tends to be improved, which is preferable.
  • the molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) of the cardo-based binder resin and / or the acrylic alkali-soluble resin is preferably 1.0 to 6.0, more preferably 1.5 to 6.0. If molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] is 1.5-6.0, since developability is excellent, it is preferable.
  • the binder resin of the present invention may be included in 5 to 85% by weight, preferably 5 to 60% by weight relative to the total weight of solids in the blue photosensitive resin. When content of binder resin is used in said range
  • solubility in a developing solution is sufficient, so that development residues are less likely to occur on the substrate of the non-pixel portion, and the film reduction of the pixel portion of the exposed portion is less likely to occur at the time of development, and the omission of the non-pixel portion is good.
  • the photopolymerizable compound contained in the blue photosensitive resin composition of this invention is a compound which can superpose
  • bifunctional monomer examples include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, Bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, etc. are mentioned.
  • polyfunctional monomers include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol penta (meth) acrylate, and dipenta Erythritol hexa (meth) acrylate etc. are mentioned. Of these, bifunctional or higher polyfunctional monomers are preferably used.
  • the photopolymerizable compound may be included in 5 to 50% by weight, preferably 5 to 30% by weight based on the total weight of solids in the blue photosensitive resin.
  • the content of the photopolymerizable compound satisfies the above range, the intensity and smoothness of the pixel portion tend to be good, which is preferable.
  • the photopolymerization initiator used in the present invention serves to improve the sensitivity of the photosensitive resin composition to increase productivity, and preferably contains an acetophenone-based compound.
  • an acetophenone type compound for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2 -Hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1- On, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl [4- (1-methylvinyl) phenyl] propane-1- And the like, and preferably 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1-one and 2-benzy
  • Photoinitiators other than the said acetophenone series can be used in combination.
  • Photopolymerization initiators other than the acetophenone series include active radical generators, sensitizers, and acid generators that generate active radicals by irradiation with light.
  • an active radical generating agent a benzoin compound, a benzophenone type compound, a thioxanthone type compound, a triazine type compound, etc. are mentioned, for example.
  • As a benzoin type compound benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoisobutyl ether, etc. are mentioned, for example.
  • benzophenone type compound for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( t-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned.
  • thioxanthone type compound 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-, for example 4-propoxy city oxanthone etc. are mentioned.
  • Examples of the active radical generator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2, -bis (o-chlorophenyl) -4,4 ', 5,5'-tetra Phenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene Compounds and the like can be used.
  • Examples of the acid generator include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate and 4-acetoxyphenyldimethylsulfonium p-toluenesulfo.
  • a triazine photopolymerization initiator is also used as an acid generator.
  • the photopolymerization initiator used in the blue photosensitive resin composition according to the present invention may be included in an amount of 0.1 to 30% by weight, preferably 0.3 to 20% by weight, based on the total weight of solids in the blue photosensitive resin.
  • the coloring photosensitive resin composition becomes highly sensitive and the intensity
  • photoinitiator start adjuvant can be used.
  • a photoinitiator adjuvant may be used in combination with a photoinitiator, and is a compound used in order to accelerate superposition
  • photopolymerization start adjuvant an amine compound, an alkoxy anthracene type compound, a thioxanthone type compound, etc. are mentioned.
  • Examples of the amine compound include triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 2-dimethylamino benzoic acid.
  • Ethyl, 2-ethylhexyl 4-dimethylaminobenzoic acid, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzphenone (commonly known as Michler's ketone), 4,4'-bis (diethyl Amino) benzophenone, 4, 4'-bis (ethylmethylamino) benzophenone, etc. are mentioned, Among these, 4,4'-bis (diethylamino) benzophenone is preferable.
  • an alkoxy anthracene type compound 9,10- dimethoxy anthracene, 2-ethyl-9,10- dimethoxy anthracene, 9,10- diethoxy anthracene, 2-ethyl-9, 10- diethoxy anthracene, for example.
  • Etc. can be mentioned.
  • a thioxanthone type compound 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro- 4-propoxy city oxanthone etc. are mentioned.
  • photoinitiators (D) may be used alone or in combination of a plurality thereof.
  • a commercially available thing can be used as a photoinitiator starter,
  • brand name "EAB-F” manufactured by Hodogaya Chemical Co., Ltd.
  • EAB-F manufactured by Hodogaya Chemical Co., Ltd.
  • the amount thereof is usually 10 mol or less, preferably 0.01 to 5 mol, per mol of the photopolymerization initiator. If it exists in the said range, since the sensitivity of a coloring photosensitive resin composition becomes higher and the productivity of the color filter formed using this composition tends to improve, it is preferable.
  • the solvent contained in the blue photosensitive resin composition of this invention is not specifically limited, Various organic solvents used in the field of a blue photosensitive resin composition can be used. Specific examples thereof include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene.
  • ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene.
  • Diethylene glycol dialkyl ethers such as glycol dipropyl ether and diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, and propylene glycol Alkylene glycol alkyl ether acetates such as monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate and methoxypentyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene, methyl Ketones such as methyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, cyclohexanone, ethanol, propanol, butanol, hexanol, cyclohexanol, alcohol
  • organic solvents having a boiling point of 100 ° C. to 200 ° C. in the coating properties and drying properties are preferable, and alkylene glycol alkyl ether acetates, ketones, and 3-ethoxy are more preferable.
  • Ester such as ethyl propionate and the methyl 3-methoxy propionate, is mentioned, More preferably, propylene glycol monomethyl ether acetate, a propylene glycol monoethyl ether acetate, cyclohexanone, 3-ethoxy propionate, 3- Methyl methoxy propionate etc. are mentioned.
  • These solvents can be used individually or in mixture of 2 or more types, respectively.
  • Content of the solvent in the blue photosensitive resin composition of this invention can be contained 50-90 mass%, Preferably it is 55-85 mass% based on 100 weight% of blue photosensitive resin compositions. Applicability when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, if the content of the solvent is in the range of 50 to 90 mass% based on the above criteria. This is preferable because it tends to be good.
  • a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, if the content of the solvent is in the range of 50 to 90 mass% based on the above criteria. This is preferable because it tends to be good.
  • the blue photosensitive resin composition which concerns on this invention is a filler, another high molecular compound, a pigment dispersant as needed.
  • Additives such as an adhesion promoter, antioxidant, a ultraviolet absorber, and an aggregation inhibitor, can be further included.
  • the filler examples include glass, silica, alumina and the like.
  • the other polymer compound examples include curable resins such as epoxy resins and maleimide resins, thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ethers, polyfluoroalkyl acrylates, polyesters, polyurethanes, and the like. Can be.
  • surfactants can be used as the pigment dispersant, and examples thereof include surfactants such as silicone, fluorine, ester, cationic, anionic, nonionic and amphoteric. These can be used individually or in combination of 2 types or more, respectively.
  • polyoxyethylene alkyl ether For example, polyoxyethylene alkyl ether, polyoxyethylene alkyl peer ether, polyethyleneglycol diester, sorbitan fatty acid ester, fatty acid modified polyester, tertiary amine modified polyurethane , Polyethylenimine, etc.
  • trade names include KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by Tochem Products), MEGAFAC (manufactured by Dainippon Ink Chemical Industries, Ltd.), Florard (manufactured by Sumitomo 3M), Asahi guard, Surflon (above, manufactured by Asahi Glass), Sol SLSPERSE (made by Genka Corporation), EFKA (made by EFKA Chemicals), PB 821 (made by Ajinomoto Co., Ltd.), etc. are mentioned.
  • adhesion promoter for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminoprotriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2 -(3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyl Trimethoxysilane etc. are mentioned.
  • antioxidants examples include 2,2'-thiobis (4-methyl-6-t-butylphenol), 2,6-di-t-butyl-4-methylphenol, and the like.
  • ultraviolet absorber examples include 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzothiazole, alkoxybenzophenone and the like.
  • aggregation inhibitor examples include sodium polyacrylate and the like.
  • the additives can be used by those skilled in the art as appropriate without departing from the effect of the present invention.
  • the additive may be used in an amount of 0.05 to 10 parts by weight, preferably 0.1 to 10 parts by weight, more preferably 0.1 to 5 parts by weight, based on 100 parts by weight of the total blue photosensitive resin composition, but is not limited thereto.
  • the blue photosensitive resin composition which concerns on this invention can be manufactured, for example by the following method.
  • the scattering particles are mixed with the solvent in advance and dispersed using a bead mill or the like until the average particle diameter becomes 10 to 1000 nm.
  • a dispersing agent can be further used as needed, and some or all of binder resin (cardo resin or mixture of cardo resin and acrylic alkali-soluble resin) may be mix
  • the binder resin mixture of cardo resin or cardo resin and acrylic alkali soluble resin
  • the other component used as needed, and an additional solvent can be further added as needed, and a desired blue photosensitive resin composition can be obtained as needed.
  • Another aspect of the present invention relates to a color filter comprising a blue pattern layer containing a cured product of the blue photosensitive resin composition for forming a blue pattern layer described above.
  • the color filter according to the present invention is made of the blue photosensitive resin composition for forming the blue pattern layer instead of the blue quantum dots, there is an advantage of lowering the manufacturing cost.
  • the blue photosensitive resin composition is a color excellent in excellent solvent resistance, adhesion and pattern formability (fine pattern formability) when forming a cured film Filter, self-luminous color filter may be implemented.
  • the color filter includes a substrate and a blue pattern layer formed on the substrate.
  • the substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited.
  • the substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
  • the blue pattern layer is a layer including the blue photosensitive resin composition of the present invention, and may be a layer formed by applying the blue photosensitive resin composition for forming a blue pattern layer and exposing, developing and thermosetting in a predetermined pattern. Can be formed by carrying out methods commonly known in the art.
  • the color filter may further include one or more selected from the group consisting of a red pattern layer and a green pattern layer.
  • the red pattern layer or green pattern layer may include a quantum dot and / or scattering particles.
  • the color filter according to the present invention may include a red pattern layer including a red quantum dot or a green pattern layer including a green quantum dot, and the red pattern layer or the green pattern layer may include scattering particles.
  • the red pattern layer or the green pattern layer may emit red light or blue light, respectively, by a light source emitting blue light, which will be described later.
  • the scattering particles included in the red pattern layer or the green pattern layer may include a metal oxide having an average particle diameter of 10 to 1000nm, the details of the scattering particles and the metal oxide The content of the scattering particles and the metal oxide contained in the blue photosensitive resin composition according to the invention can be applied.
  • the shape, configuration, and content of the quantum dots included in the red pattern layer or the green pattern layer are not limited, and quantum dots commonly used in the art may be applied.
  • the color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
  • the color filter may be a self-luminous color filter.
  • the above-described color filter And a light source emitting blue light.
  • the image display apparatus includes a color filter including a blue pattern layer including a cured product of the above-described blue photosensitive resin composition and a light source emitting blue light.
  • the color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
  • the image display device includes the color filter including the blue pattern layer and the light source according to the present invention
  • the blue pattern layer included in the color filter according to the present invention does not include blue quantum dots, there is an advantage in that an image display device having low manufacturing cost can be manufactured.
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, and as the monomer dropping lot, 74.8 g (0.20 mol) of benzylmaleimide, 43.2 g (0.30 mol) of acrylic acid, and vinyltoluene 118.0 g (0.50 mol), 4 g of t-butylperoxy-2-ethylhexanoate and 40 g of propylene glycol monomethyl ether acetate (PGMEA) were added thereto, followed by stirring and mixing.
  • PGMEA propylene glycol monomethyl ether acetate
  • n-dodecanethiol 6g and PGMEA24g were added, and the thing mixed with stirring was prepared.
  • the temperature was melt
  • the temperature was heated to 120 ° C. to completely dissolve it.
  • the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8).
  • the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 17.
  • HLC-8120GPC manufactured by Tosoh Corporation
  • the ratio of the weight average molecular weight and number average molecular weight obtained above was made into molecular weight distribution (Mw / Mn).
  • V-1 Fastogen Super Violet 140V (DIC): C.I. Pigment Violet 23
  • Photopolymerizable Compound (C) dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
  • Color filters were prepared using the blue photosensitive resin compositions prepared in Examples 1 to 5 and Comparative Examples 1 and 2. That is, each of the blue photosensitive resin compositions was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film.
  • test photomask having a transmissive pattern of 20 mm x 20 mm square and a line / space pattern of 1 to 100 ⁇ m was placed on the thin film and irradiated with ultraviolet rays at a distance of 100 ⁇ m from the test photomask.
  • the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmospheric atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • the thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5.
  • the thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern.
  • the film thickness of the color pattern prepared above was 5.0 ⁇ m.
  • the produced color filter was immersed in N-methylpyrrolidone solvent for 30 minutes, and the color change before and after evaluation was evaluated. Specifically, the solvent resistance was measured by using a colorimeter (Olympus, OSP-200) and chromaticity of the substrate produced in the color filter manufacturing and after immersing the substrate on which the color coordinate measurement is completed for 30 minutes in N-methylpyrrolidone solvent Color and transmittance were remeasured with a colorimeter (Olympus, OSP-200).
  • ⁇ Eab is a value required by the following saturation equation by the CIE 1976 (L *, a *, b *) spatial colorimeter. (Japanese Color Society New Colors Color Handbook (Showa 60) p.266).
  • Equation (1) representing the color change in the three-dimensional colorimeter defined by L *, a *, b *, the smaller the color change value, it is possible to manufacture a highly reliable color filter .
  • Equation (1) representing the color change in the three-dimensional colorimeter defined by L *, a *, b *, the smaller the color change value, it is possible to manufacture a highly reliable color filter .
  • Table 3 The results are shown in Table 3 below.
  • the size of the pattern obtained through the line / space pattern mask designed to 100 ⁇ m of the color filters manufactured using the blue photosensitive resins prepared in Examples 1 to 5 and Comparative Examples 1 to 2 was measured by OM equipment (ECLIPSE LV100POL Nikon Corporation). The pattern size was measured through).
  • a negative value means a threshold value that causes a process defect.
  • the blue photosensitive resin composition of the present invention comprises a thiol compound represented by the formula (1) in the blue photosensitive resin composition, so that the blue photosensitive resin composition has excellent solvent resistance, adhesiveness and pattern forming property when formed into a cured film. It is possible to implement a color filter having excellent fine pattern formability, particularly a self-luminous color filter.

Abstract

The present invention relates to: a blue photo-sensitive resin composition containing scattered particles, a thiol compound represented by chemical formula 1, a blue colorant, a cardo-based binder resin as a binder resin, a photo-polymerizable compound, a photo-initiator, and a solvent; and a color filter comprising the same; and an image display device.

Description

청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 Blue photosensitive resin composition, color filter and image display device manufactured using the same
본 발명은 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치에 관한 것이다.  The present invention relates to a blue photosensitive resin composition, a color filter manufactured using the same, and an image display device.
컬러필터는 백색광에서 적색, 녹색 및 청색의 3가지 색을 추출하여 미세한 화소단위로 가능하게 하는 박막 필름형 광학부품으로서, 한 화소의 크기가 수십에서 수백 마이크로미터 정도이다. 이러한 컬러필터는 각각의 화소 사이의 경계부분을 차광하기 위하여 투명 기판 상에 정해진 패턴으로 형성된 블랙 매트릭스 층 및 각각의 화소를 형성하기 위해 복수의 색(통상적으로 적색(R), 녹색(G) 및 청색(B))의 3원색을 정해진 순서로 배열한 화소부가 차례로 적층된 구조를 취하고 있다.  The color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units. The size of one pixel is about tens to hundreds of micrometers. Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
최근에는 컬러필터를 구현하는 방법 중의 하나로서, 안료 분산형의 감광성 수지를 이용한 안료 분산법이 적용되고 있으나, 광원에서 조사된 광이 컬러필터를 투과하는 과정에서 광의 일부가 컬러필터에 흡수되어 광 효율이 저하되고, 또한 색 필터에 포함되어 있는 안료의 특성으로 인하여 색재현이 저하되는 문제점이 발생하고 있다. Recently, as one of the methods of implementing a color filter, a pigment dispersion method using a pigment-dispersible photosensitive resin has been applied, but a part of the light is absorbed by the color filter while the light emitted from the light source passes through the color filter. The problem is that the efficiency is lowered and the color reproduction is lowered due to the characteristics of the pigment contained in the color filter.
이러한 문제점을 해결하기 위해 양자점을 포함하는 자발광 감광성 수지 조성물을 이용한 컬러필터 제조방법이 제안되었다. In order to solve this problem, a color filter manufacturing method using a self-luminous photosensitive resin composition including a quantum dot has been proposed.
구체적으로 대한민국 공개특허 제2007-0094679호는 양자점(Quantum Dot)들로 형성된 컬러필터층을 가져 색 재현성을 높일 수 있다고 제시하고 있고, 대한민국 공개특허 제2009-0036373호는 기존의 컬러필터를 양자점 형광체로 이루어진 발광층으로 대치함으로써 발광 효율을 향상시켜 표시품질을 개선할 수 있다고 제시하고 있다. Specifically, Korean Patent Publication No. 2007-0094679 suggests that color reproducibility can be improved by having a color filter layer formed of quantum dots, and Korean Patent Publication No. 2009-0036373 uses a conventional color filter as a quantum dot phosphor. It is proposed that the display quality can be improved by improving the luminous efficiency by replacing the light emitting layer.
그러나, 현재까지 컬러필터를 제조하기 위해 개발된 감광성 수지조성물은 경화막으로 형성 시 경화막으로 형성 시 뛰어난 내용제성, 밀착성 및 패턴 형성성(미세패턴 형성성) 등의 요건을 충분히 만족시키지 못하였다. However, until now, the photosensitive resin composition developed to manufacture a color filter did not sufficiently satisfy the requirements of excellent solvent resistance, adhesiveness, and pattern formability (fine pattern formability) when formed into a cured film. .
본 발명은, 경화막으로 형성 시 뛰어난 내용제성, 밀착성 및 패턴 형성성(미세패턴 형성성)이 우수한 컬러필터, 특히 자발광 컬러필터 구현이 가능한 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치을 제공하는 것을 목적으로 한다. The present invention provides a color filter having excellent solvent resistance, adhesion and pattern formability (fine pattern formability), in particular, a blue photosensitive resin composition capable of realizing a self-luminous color filter when formed into a cured film, and a color filter manufactured using the same. It is an object to provide an image display device.
본 발명은, 산란입자, 하기 화학식 1로 표시되는 티올 화합물, 청색 착색제, 바인더 수지로써 카도계 바인더 수지, 광중합성 화합물, 광개시제, 및 용제를 포함하는 청색 감광성 수지 조성물로서, The present invention is a blue photosensitive resin composition comprising a scattering particle, a thiol compound represented by the following formula (1), a blue colorant, a binder resin, a cardo-based binder resin, a photopolymerizable compound, a photoinitiator, and a solvent,
[화학식 1] [Formula 1]
Figure PCTKR2017013931-appb-I000001
Figure PCTKR2017013931-appb-I000001
(화학식 1에서, Z1은 메틸렌기 또는 탄소수 2 내지 10의 직쇄 또는 분지쇄인 알킬렌기 또는 알킬메틸렌기이고, Y는 단결합, -CO-, -O-CO- 또는 -NHCO-이고, n이 3 내지 10의 정수이고, X가 1개 또는 복수개의 에테르 결합을 가질 수 있는 탄소수 2 내지 70의 n가의 탄화수소기이거나, 또는 n이 3이며 X가 하기 화학식 2로 표시되는 3가의 기임) (Formula 1, Z 1 is a methylene group or a linear or branched alkylene group or alkylmethylene group having 2 to 10 carbon atoms, Y is a single bond, -CO-, -O-CO- or -NHCO-, n Is an integer of 3 to 10, X is a C2-C70 n-valent hydrocarbon group which may have one or a plurality of ether bonds, or n is 3 and X is a trivalent group represented by the following formula (2):
[화학식 2] [Formula 2]
Figure PCTKR2017013931-appb-I000002
Figure PCTKR2017013931-appb-I000002
(화학식 2에서, Z2, Z3 및 Z4는 서로 독립적으로 메틸렌기 또는 탄소수 2 내지 6의 알킬렌기이고, "*"는 결합손을 나타냄)을 제공한다.(Wherein, Z 2 , Z 3 and Z 4 are each independently a methylene group or an alkylene group having 2 to 6 carbon atoms, and “*” represents a bond).
또한, 본 발명은 상술한 청색 감광성 수지 조성물로 이루어진 청색 패턴층을 포함하는 컬러필터를 제공한다.In addition, the present invention provides a color filter comprising a blue pattern layer made of the above-described blue photosensitive resin composition.
또한, 본 발명은 상기 컬러필터; 및 청색광을 방출하는 광원;을 포함하는 화상표시장치를 제공한다.In addition, the present invention is the color filter; And a light source emitting blue light.
본 발명의 청색 감광성 수지 조성물은 청색 감광성 수지 조성물에 화학식 1로 표시되는 티올 화합물을 포함함으로써, 상기 청색 감광성 수지 조성물은 경화막으로 형성 시 경화막으로 형성 시 뛰어난 내용제성, 밀착성 및 패턴 형성성(미세패턴 형성성)이 우수한 컬러필터, 특히 자발광 컬러필터 구현이 가능할 수 있다.The blue photosensitive resin composition of the present invention comprises a thiol compound represented by the formula (1) in the blue photosensitive resin composition, so that the blue photosensitive resin composition has excellent solvent resistance, adhesiveness and pattern forming property when formed into a cured film. It is possible to implement a color filter having excellent fine pattern formability, particularly a self-luminous color filter.
본 발명의 청색 감광성 수지 조성물은 산란입자, 화학식 1로 표시되는 티올 화합물 청색 착색제, 바인더 수지로써 카도계 바인더 수지, 광중합성 화합물, 광개시제, 및 용제를 포함할 수 있으며, 특히 화학식 1로 표시되는 티올 화합물을 포함함으로써, 상기 청색 감광성 수지 조성물은 경화막으로 형성 시 뛰어난 내용제성, 밀착성 및 패턴 형성성(미세패턴 형성성)이 우수한 컬러필터, 특히 자발광 컬러필터 구현이 가능할 수 있다. The blue photosensitive resin composition of the present invention may include scattering particles, a thiol compound represented by Formula 1, a blue colorant, a binder resin, a cardo-based binder resin, a photopolymerizable compound, a photoinitiator, and a solvent, and in particular, a thiol represented by Formula 1 By including the compound, the blue photosensitive resin composition may be a color filter having excellent solvent resistance, adhesiveness, and pattern formability (fine pattern formability), particularly self-luminous color filter, when formed into a cured film.
이하, 본 발명의 구성을 상세히 설명한다. Hereinafter, the configuration of the present invention will be described in detail.
산란입자Scattering particles
본 발명의 산란입자는 평균입경이 10 내지 1000 nm의 평균입경을 가지는 금속 산화물 일 수 있으며, 평균입경이 30 내지 300 nm범위 일 경우 보다 바람직 하다. 산란입자의 평균 입경이 상기 범위를 만족하는 경우 양자점으로부터 방출된 빛의 충분한 산란 효과를 기대할 수 있고 상기 산란입자가 청색 감광성 조성물 내에서 가라앉거나 균일하지 않는 자발광층 표면이 생기는 문제가 발생할 가능성이 낮아진다. 상기 금속산화물은 Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In 및 이들의 조합으로 이루어진 군에서 선택된 1종의 금속을 포함하는 산화물일 수 있다. 보다 구체적으로 Al2O3, SiO2, ZnO, ZrO2, BaTiO3, TiO2, Ta2O5, Ti3O5, ITO, IZO, ATO, ZnO-Al, Nb2O3, SnO, MgO 및 이들의 조합으로 이루어진 군에서 선택된 1종 이상 일 수 있다. 필요한 경우 아크릴레이트 등의 불포화 결합을 갖는 화합물로 표면 처리된 재질도 사용 가능하다.The scattering particles of the present invention may be a metal oxide having an average particle diameter of 10 to 1000 nm, more preferably when the average particle diameter is in the range of 30 to 300 nm. If the average particle diameter of the scattering particles satisfies the above range, a sufficient scattering effect of the light emitted from the quantum dots can be expected, and the scattering particles may sink in the blue photosensitive composition, or a problem may occur in which the surface of the light emitting layer may be uneven. Lowers. The metal oxide is Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, It may be an oxide including one metal selected from the group consisting of Ce, Ta, In, and combinations thereof. More specifically Al 2 O 3 , SiO 2 , ZnO, ZrO 2 , BaTiO 3 , TiO 2 , Ta 2 O 5 , Ti 3 O 5 , ITO, IZO, ATO, ZnO-Al, Nb 2 O 3 , SnO, MgO and At least one selected from the group consisting of a combination thereof. If necessary, a material surface-treated with a compound having an unsaturated bond such as acrylate may be used.
상기 산란입자는 컬러필터의 발광 세기를 충분히 향상시킬 수 있도록 평균입경 및 전체 조성물 내의 함량을 필요에 따라 적절히 조절 할 수 있다. The scattering particles may be appropriately adjusted as necessary to the average particle diameter and the content in the entire composition to sufficiently improve the light emission intensity of the color filter.
상기 산란입자는 컬러필터의 발광 세기를 충분히 향상시킬 수 있도록 평균입경 및 전체 조성물 내의 함량을 필요에 따라 적절히 조절 할 수 있다. The scattering particles may be appropriately adjusted as necessary to the average particle diameter and the content in the entire composition to sufficiently improve the light emission intensity of the color filter.
상기 산란입자는 청색 감광성 수지 중의 고형분 총 중량에 대하여 0.1 내지 50중량%으로 포함 될 수 있으며, 바람직하기로 5 내지 30 중량%로 포함 될 수 있다. 산란입자의 함량이 상기 범위를 만족하는 경우 원하는 발광세기를 달성하면서도 청색 감광성 수지 조성물의 안정성 저하 문제가 발생할 가능성을 낮출 수 있다.The scattering particles may be included in 0.1 to 50% by weight relative to the total weight of solids in the blue photosensitive resin, preferably 5 to 30% by weight. When the content of the scattering particles satisfies the above range, while achieving the desired emission intensity, it is possible to lower the possibility of a problem of deterioration in stability of the blue photosensitive resin composition.
화학식 1로 표시되는 티올 화합물Thiol compound represented by formula (1)
본 발명에 포함되는 화학식 1로 표시되는 티올 화합물은 청색 감광성 수지 조성물로 형성한 패턴 특성을 우수하게 하고 내구성 및 신뢰성을 높이는 역할을 한다.The thiol compound represented by the formula (1) included in the present invention serves to improve the pattern characteristics formed of the blue photosensitive resin composition and to enhance durability and reliability.
[화학식 1][Formula 1]
Figure PCTKR2017013931-appb-I000003
Figure PCTKR2017013931-appb-I000003
(화학식 1에서, Z1은 메틸렌기 또는 탄소수 2 내지 10의 직쇄 또는 분지쇄인 알킬렌기 또는 알킬메틸렌기이고, Y는 단결합, -CO-, -O-CO- 또는 -NHCO-이고, n이 3 내지 10의 정수이고, X가 1개 또는 복수개의 에테르 결합을 가질 수 있는 탄소수 2 내지 70의 n가의 탄화수소기이거나, 또는 n이 3이며 X가 하기 화학식 2로 표시되는 3가의 기임)(Formula 1, Z 1 is a methylene group or a linear or branched alkylene group or alkylmethylene group having 2 to 10 carbon atoms, Y is a single bond, -CO-, -O-CO- or -NHCO-, n Is an integer of 3 to 10, X is a C2-C70 n-valent hydrocarbon group which may have one or a plurality of ether bonds, or n is 3 and X is a trivalent group represented by the following formula (2):
[화학식 2][Formula 2]
Figure PCTKR2017013931-appb-I000004
Figure PCTKR2017013931-appb-I000004
(화학식 2에서, Z2, Z3 및 Z4는 서로 독립적으로 메틸렌기 또는 탄소수 2 내지 6의 알킬렌기이고, "*"는 결합손을 나타냄).(In Formula 2, Z 2 , Z 3 and Z 4 are independently of each other a methylene group or an alkylene group having 2 to 6 carbon atoms, "*" represents a bond).
n은 바람직하게는 4 이상, 또는 4 내지 10의 정수인 것이 바람직하고, 4, 6 또는 8인 것이 보다 바람직하다.n is preferably 4 or more, or an integer of 4 to 10, and more preferably 4, 6 or 8.
n이 3인 경우의 X로는, 예를 들면 하기 화학식 5로 표시되는 3가의 기를 들 수 있으며,As X when n is 3, the trivalent group represented by following General formula (5) is mentioned, for example,
n이 4, 6 또는 8인 경우의 X로는, 예를 들면 하기 화학식 6으로 표시되는 4, 6 또는 8가의 기 등을 각각 바람직한 것으로서 들 수 있다.As X when n is 4, 6, or 8, the 4, 6, or octavalent group represented by following formula (6) etc. are mentioned as a preferable thing, respectively.
[화학식 3][Formula 3]
Figure PCTKR2017013931-appb-I000005
Figure PCTKR2017013931-appb-I000005
(화학식 3에서, "*"는 결합손을 나타냄),(In formula 3, "*" represents a bond.),
[화학식 4][Formula 4]
Figure PCTKR2017013931-appb-I000006
Figure PCTKR2017013931-appb-I000006
(화학식 4에서, m은 0 내지 2의 정수이며, "*"는 결합손을 나타냄).(In formula 4, m is an integer of 0 to 2, and "*" represents a bond.).
상기 화학식 1로 표시되는 티올 화합물은 화학식 5 내지 화학식 12로 표시되는 화합물로 이루어지 군에서 선택된 선택된 1종 이상을 포함할 수 있고, 바람직하게는 화학식 5로 표시되는 화합물, 화학식 9로 표시되는 화합물을 포함할 수 있다.The thiol compound represented by Chemical Formula 1 may include at least one selected from the group consisting of compounds represented by Chemical Formulas 5 to 12, and preferably, a compound represented by Chemical Formula 5, a compound represented by Chemical Formula 9 It may include.
[화학식 5][Formula 5]
Figure PCTKR2017013931-appb-I000007
Figure PCTKR2017013931-appb-I000007
[화학식 6][Formula 6]
Figure PCTKR2017013931-appb-I000008
Figure PCTKR2017013931-appb-I000008
[화학식 7][Formula 7]
Figure PCTKR2017013931-appb-I000009
Figure PCTKR2017013931-appb-I000009
[화학식 8][Formula 8]
Figure PCTKR2017013931-appb-I000010
Figure PCTKR2017013931-appb-I000010
[화학식 9][Formula 9]
Figure PCTKR2017013931-appb-I000011
Figure PCTKR2017013931-appb-I000011
[화학식 10][Formula 10]
Figure PCTKR2017013931-appb-I000012
Figure PCTKR2017013931-appb-I000012
[화학식 11][Formula 11]
Figure PCTKR2017013931-appb-I000013
Figure PCTKR2017013931-appb-I000013
[화학식 12][Formula 12]
Figure PCTKR2017013931-appb-I000014
Figure PCTKR2017013931-appb-I000014
본 발명의 청색 감광성 수지 조성물에 화학식 1로 표시되는 티올 화합물을 포함함으로써, 상기 청색 감광성 수지 조성물은 경화막으로 형성 시 뛰어난 내용제성, 밀착성 및 패턴 형성성(미세패턴 형성성)이 우수한 컬러필터 특히, 자발광 컬러필터 구현이 가능할 수 있다.By including the thiol compound represented by the formula (1) in the blue photosensitive resin composition of the present invention, the blue photosensitive resin composition is a color filter excellent in excellent solvent resistance, adhesion and pattern formability (fine pattern formability), particularly when formed into a cured film For example, the self-luminous color filter may be implemented.
상기 화학식 1로 표시되는 티올 화합물물은 1종 단독으로 또는 2종 이상을 조합하여 사용할 수 있다.The thiol compound represented by Chemical Formula 1 may be used alone or in combination of two or more thereof.
상기 티올 화합물은 청색 감광성 수지 중의 고형분 총 중량에 대하여 0.05 내지 5 중량%, 바람직하게는 0.08 내지 3 중량%로 포함될 수 있다.The thiol compound may be included in 0.05 to 5% by weight, preferably 0.08 to 3% by weight based on the total weight of solids in the blue photosensitive resin.
상기 티올 화합물의 함량이 상기 범위를 만족하는 경우 청색 감광성 수지 조성물의 안정성, 냄새, 감도, 해상성, 현상성, 밀착성 측면에서 유리하다. When the content of the thiol compound satisfies the above range, it is advantageous in terms of stability, smell, sensitivity, resolution, developability, and adhesion of the blue photosensitive resin composition.
청색 착색제 Blue colorant
본 발명의 청색 착색제에 있어서, 청색 안료로는 구체적으로 색지수(The society of Dyers and Colourists 출판)에서 피그먼트로 분류되어 있는 화합물을 들 수 있고, 보다 구체적으로는 이하와 같은 색지수(C.I.) 번호의 안료를 들 수 있지만, 반드시 이들로 한정되는 것은 아니다. 청색 안료는 구체적으로 예를 들어, C.I. 피그먼트 블루 15:3, 15:4, 15:6, 16, 21, 28, 및 76 등을 들 수 있으며, C.I. 피그먼트 블루 15:3, 피그먼트 블루 15:6, 피그먼트 블루 16으로 이루어진 군으로부터 선택되는 1종 이상을 포함하는 것이 바람직하다.In the blue colorant of the present invention, examples of the blue pigment include compounds classified as pigments in the color index (Published by The society of Dyers and Colourists), and more specifically, the color index (CI) as follows. Although pigment of number is mentioned, It is not necessarily limited to these. Blue pigments are specifically described, for example, in C.I. Pigment blue 15: 3, 15: 4, 15: 6, 16, 21, 28, and 76, and the like. Pigment Blue 15: 3, Pigment Blue 15: 6, Pigment Blue 16 It is preferable to include at least 1 type selected from the group which consists of.
본 발명의 청색 착색제는 청색 염료를 더 포함할 수 있으며, 청색 염료로는 컬러 인덱스(The Society of Dyers and Colourists 출판)내에 염료로 분류되어 있는 화합물 또는 염색 노트(색염사)에 기재되어 있는 공지의 염료를 들 수 있다.The blue colorant of the present invention may further comprise a blue dye, which is a known dye which is described in a compound or dyeing note (color dyed yarn) classified as a dye in the color index (published by The Society of Dyers and Colourists). And dyes.
상기 추가로 사용할 수 있는 염료를 구체적으로 예를 들면, Specific examples of the dye which can be used further include
C.I. 솔벤트 염료로서,C.I. As solvent dyes,
C.I. 솔벤트 블루 5, 35, 36, 37, 44, 45, 59, 67 및 70 등을 들 수 있으며, C.I. 솔벤트 블루 35, 36, 44, 45 및 70 중 1종 이상을 포함함이 보다 바람직하다. C.I. Solvent blue 5, 35, 36, 37, 44, 45, 59, 67 and 70, and the like. More preferably at least one of Solvent Blue 35, 36, 44, 45 and 70.
또한, C.I. 애시드 염료로서,In addition, C.I. As an acid dye,
C.I.애시드 블루 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103, 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324:1, 335 및 340등을 들 수 있으며, 그 중에서도 C.I. 애시드 블루 80 및 90중 1종이상을 포함함이 보다 바람직하다. CI acid blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103 , 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324: 1 , 335 and 340, among others CI More preferably, it contains one or more of acid blue 80 and 90.
또한, C.I. 다이렉트 염료로서,In addition, C.I. As a direct dye,
C.I.다이렉트 블루 38, 44, 57, 70, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113, 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189, 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248, 250, 251, 252, 256, 257, 259, 260, 268, 274, 275 및 293등을 들수 있다.CI direct blue 38, 44, 57, 70, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113 , 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189 , 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248 , 250, 251, 252, 256, 257, 259, 260, 268, 274, 275 and 293.
C.I.모단토 블루 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83 및 84등을 들 수 있다. CI Modanto Blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83, 84, etc. are mentioned.
상기 청색 염료는 각각 단독 또는 2종 이상을 조합하여 사용할 수 있다.The said blue dye can be used individually or in combination of 2 or more types, respectively.
본 발명의 청색 착색제는 추가 착색제로서, 자색 착색제를 더 포함할 수 있다. 자색착색제는 자색 안료 및 자색 염료 중 하나이상을 포함할 수 있으며, 상기 자색 안료는 구체적으로, C.I. 피그먼트 바이올렛 1, 14, 19, 23, 29, 32, 33, 36, 37 및 38등을 들 수 있으며, 그 중에서도 C.I. 피그먼트 바이올렛 23을 포함함이 보다 바람직 하다. The blue colorant of the present invention may further include a purple colorant as an additional colorant. The purple coloring agent may comprise at least one of a purple pigment and a purple dye, wherein the purple pigment is specifically C.I. Pigment violet 1, 14, 19, 23, 29, 32, 33, 36, 37 and 38, among which C.I. It is more preferred to include pigment violet 23.
자색염료는 구체적으로, C.I. 솔벤트 바이올렛, C.I.애시드 바이올렛, C.I.애시드 바이올렛, C.I.모단토 바이올렛 등을 들 수 있으나, 이에 한정되는 것은 아니다.Purple dyes are specifically, C.I. Solvent violet, C.I. acid violet, C.I. acid violet, C.I. modanto violet, and the like, but are not limited thereto.
구체적으로 상기 C.I. 솔벤트 바이올렛은 C.I. 솔벤트 바이올렛 8, 9, 13, 14, 36, 37, 47 및 49 등을 들 수 있으며, C.I. 솔벤트 바이올렛 13을 포함함이 보다 바람직 하다. C.I.애시드 바이올렛으로는 C.I. 애시드 바이올렛 6B, 7, 9, 17, 19 및 66 등을 들 수 있으며, C.I. 애시드 바이올렛 66을 포함함이 보다 바람직하다. C.I.다이렉트 바이올렛으로는 C.I.다이렉트 바이올렛 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103 및 104 등을 들 수 있다.Specifically, the C.I. Solvent violet is C.I. Solvent violet 8, 9, 13, 14, 36, 37, 47 and 49, and the like. More preferably, solvent violet 13 is included. C.I. acid violet includes C.I. Acid violet 6B, 7, 9, 17, 19 and 66, and the like. More preferably, acid violet 66 is included. CI direct violet includes CI direct violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103 and 104. .
또한, C.I.모단토 바이올렛 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53 및 58 등을 들 수 있다.Furthermore, CI modanto violet 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58, etc. are mentioned. .
상기 청색 착색제는 청색 감광성 수지 중의 고형분 총 중량에 대하여 0.1 내지 50중량%를 포함될 수 있으며, 바람직하게는 0.5 내지 30중량%로 사용할 수 있다. 청색 감광성 수지 조성물 100 중량%을 기준으로 0.1 내지 50 중량%로 포함될 수 있으며, 바람직하기로 0.5 내지 30 중량%가 바람직하며, 1 내지 20 중량%가 보다 바람직하다. The blue colorant may include 0.1 to 50% by weight, and preferably 0.5 to 30% by weight, based on the total weight of solids in the blue photosensitive resin. It may be included in 0.1 to 50% by weight based on 100% by weight of the blue photosensitive resin composition, preferably 0.5 to 30% by weight, more preferably 1 to 20% by weight.
상기 청색 착색제의 함량이 상기 범위를 만족하는 경우 외광 반사 억제 효과 달성에 유리하고 발광세기 저하 문제 또는 청색 감광성 수지 조성물의 점도 안정성 저하 문제가 발생할 가능성이 적으므로 유리하다.When the content of the blue colorant satisfies the above range, it is advantageous to achieve the effect of suppressing the external light reflection and is advantageous because it is less likely to cause a problem of lowering the luminescence intensity or a problem of lowering the viscosity stability of the blue photosensitive resin composition.
본 발명에서는 청색 양자점을 포함하지 않음에도 청색 착색제 및 산란입자를 포함함으로써, 컬러필터, 특히 자발광 컬러필터의 청색 화소의 효율의 저하를 방지할 수 있다.In the present invention, the blue colorant and the scattering particles are included even though the blue quantum dots are not included, thereby reducing the efficiency of the blue pixel of the color filter, particularly the self-luminous color filter.
바인더 수지Binder resin
본 발명의 바인더 수지는, 카도계 바인더 수지를 포함한다. 상기 카도계 바인더 수지는 광이나 열의 작용에 의한 반응성 및 알칼리 용해성을 갖고, 착색재료의 분산매로서 작용한다. 본 발명의 청색 감광성 수지 조성물에 함유되는 카도계 바인더 수지는 산란입자에 대한 결합제수지로서 작용하고, 컬러필터의 제조를 위한 현상 단계에서 사용된 알칼리성 현상액에 용해 가능한 수지라면 제한되지 않는다.The binder resin of this invention contains cardo system binder resin. The cardo-based binder resin has reactivity and alkali solubility due to the action of light or heat and acts as a dispersion medium of the coloring material. The cardo-based binder resin contained in the blue photosensitive resin composition of the present invention is not limited as long as it is a resin that acts as a binder resin for scattering particles and is soluble in an alkaline developer used in the developing step for producing a color filter.
본 발명의 카도계 바인더 수지는 화학식 13-1 및 화학식 13-2로 표시되는 화합물 중 하나 이상을 포함하는 것일 수 있다.The cardo-based binder resin of the present invention may include one or more of the compounds represented by Chemical Formulas 13-1 and 13-2.
[화학식 13-1] [Formula 13-1]
Figure PCTKR2017013931-appb-I000015
Figure PCTKR2017013931-appb-I000015
[화학식 13-2][Formula 13-2]
Figure PCTKR2017013931-appb-I000016
Figure PCTKR2017013931-appb-I000016
상기 화학식 13-1 및 13-2 중에서, In Formulas 13-1 and 13-2,
R1, R2, R3 및 R4는 각각 독립적으로,
Figure PCTKR2017013931-appb-I000017
이며;
R 1 , R 2 , R 3 and R 4 are each independently,
Figure PCTKR2017013931-appb-I000017
Is;
X는 수소 원자, 탄소수 1 내지 5의 알킬기, 또는 수산기이고, R5는 수소 원자 또는 탄소수 1 내지 5의 알킬기이다.X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R 5 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
본 발명에서 상기 화학식 13-1로 표시되는 화합물은 하기 화학식 14-1로 표시되는 화합물로 합성되고, 화학식 13-2로 표시되는 화합물은 화학식 14-2로 표시되는 화합물을 이용하여 합성될 수 있다. In the present invention, the compound represented by Chemical Formula 13-1 may be synthesized by the compound represented by Chemical Formula 14-1, and the compound represented by Chemical Formula 13-2 may be synthesized using the compound represented by Chemical Formula 14-2. .
[화학식 14-1][Formula 14-1]
Figure PCTKR2017013931-appb-I000018
Figure PCTKR2017013931-appb-I000018
[화학식 14-2][Formula 14-2]
Figure PCTKR2017013931-appb-I000019
Figure PCTKR2017013931-appb-I000019
화학식 13-1로 표시되는 화합물은 화학식 15 또는 화학식 16으로 표시되는 화합물 중 어느 하나 이상이고, 화학식 13-2 로 표시되는 화합물은 화학식 17 또는 화학식 18로 표시되는 화합물 중 어느 하나 이상일 수 있다.The compound represented by Formula 13-1 may be any one or more of compounds represented by Formula 15 or Formula 16, and the compound represented by Formula 13-2 may be any one or more of compounds represented by Formula 17 or Formula 18.
[화학식 15][Formula 15]
Figure PCTKR2017013931-appb-I000020
Figure PCTKR2017013931-appb-I000020
[화학식 16][Formula 16]
Figure PCTKR2017013931-appb-I000021
Figure PCTKR2017013931-appb-I000021
[화학식 17][Formula 17]
Figure PCTKR2017013931-appb-I000022
Figure PCTKR2017013931-appb-I000022
[화학식 18][Formula 18]
Figure PCTKR2017013931-appb-I000023
Figure PCTKR2017013931-appb-I000023
상기 카도계 바인더 수지는 9,9-비스(3-시나믹 디에스테르)플루오렌(9,9-bis(3-cinnamic diester)fluorene), 9,9-비스(3-시나모일, 4-하이드록시페닐)플루오렌(9,9-bis(3-cinnamoil, 4-hydroxyphenyl)fluorene), 9,9-비스(글리시딜 메타크릴레이트 에테르)플루오렌(9,9-bis(glycidyl methacrylate ether)fluorene), 9,9-비스(3,4-디하이드록시페닐)플루오렌 디시나믹 에스테르(9,9-bis(3,4-dihydroxyphenyl)fluorene dicinnamic ester), 3,6-디글리시딜 메타크릴레이트 에테르 스피로(플루오렌-9,9-잔텐)(3,6-diglycidyl methacrylate ether spiro(fluorene-9,9-xantene)), 9,9-비스(3-알릴, 4-하이드록시페닐플루오렌)(9,9-bis(3-allyl, 4-hydroxyphenlylfluorene), 9,9-비스(4-알릴록시페닐)플루오렌(`9,9-bis(4-allyloxyphenyl)fluorene) 및 9,9-비스(3,4-메타크릴릭 디에스테르)플루오렌(9,9-bis(3,4-methacrylic diester)fluorine)로 이루어진 군에서 선택된 적어도 1종과 산무수화합물로서 무수말레인산, 무수숙신산, 무수이타콘산, 무수프탈산, 무수테트라히드로프탈산, 무수헥사히드로프탈산, 무수메틸렌도 메틸렌테트라히드로프탈산, 무수클로로렌드산, 무수메틸테트라히드로프탈산으로 이루어진 군 또는 산2무수물로서 무수피로멜리트산, 벤조페논테트라카르복시산2무수물, 바이페닐테트라카르복시산2무수물, 바이테닐에테르테트라카르복시산2무수물 등의 방향족다가카르복시시산무수물로 이루어진 군에서 선택된 적어도 1종과 반응을 시켜 제조할 수 있으나 이에 한정되지 않는다.The cardo-based binder resin is 9,9-bis (3-cinnamic diester) fluorene (9,9-bis (3-cinnamic diester) fluorene), 9,9-bis (3- cinnamoyl, 4-hydride Hydroxyphenyl) fluorene (9,9-bis (3-cinnamoil, 4-hydroxyphenyl) fluorene), 9,9-bis (glycidyl methacrylate ether) fluorene (9,9-bis (glycidyl methacrylate ether) fluorene), 9,9-bis (3,4-dihydroxyphenyl) fluorene dinamic ester (9,9-bis (3,4-dihydroxyphenyl) fluorene dicinnamic ester), 3,6-diglycidyl meta Acrylate ether spiro (3,6-diglycidyl methacrylate ether spiro (fluorene-9,9-xantene)), 9,9-bis (3-allyl, 4-hydroxyphenylflu Orene) (9,9-bis (3-allyl, 4-hydroxyphenlylfluorene), 9,9-bis (4-allyloxyphenyl) fluorene (`9,9-bis (4-allyloxyphenyl) fluorene) and 9,9 Acid anhydrides with at least one member selected from the group consisting of bis (3,4-methacrylic diester) fluorene (9,9-bis (3,4-methacrylic diester) fluorine) Maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylene anhydrous methylenetetrahydrophthalic anhydride, anhydrous chlororenic acid, methyltetrahydrophthalic anhydride, or an acid dianhydride. It can be prepared by reacting with at least one selected from the group consisting of aromatic polyhydric carboxylic acid anhydrides such as pyromellitic anhydride, benzophenone tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, and bitenyl ether tetracarboxylic acid dianhydride. It is not limited.
본 발명은 바인더 수지로써, 상기 카도계 수지와 함께 아크릴계 알칼리 가용성 수지가 병용될 수 있다. 즉, 본 발명은 상기 청색 감광성 수지 조성물은 상기 카도계 수지에 아크릴계 알칼리 가용성 수지를 더 포함할 수 있다. The present invention is a binder resin, acrylic alkali-soluble resin may be used together with the cardo resin. That is, in the present invention, the blue photosensitive resin composition may further include an acrylic alkali-soluble resin in the cardo-based resin.
아크릴계 알칼리 가용성 수지는 예를 들면 카르복실기 함유 단량체, 및 이 단량체와 공중합 가능한 다른 단량체와의 공중합체등을 들 수 있다. 카르복실기 함유 단량체로서는, 예를 들면 불포화 모노카르복실산이나, 불포화 디카르복실산, 불포화 트리카르복실산 등의 분자 중에 1개 이상의 카르복실기를 갖는 불포화 다가 카르복실산 등의 불포화 카르복실산 등을 들수 있다. 여기서, 불포화 모노카르복실산으로서는, 예를 들면 아크릴산, 메타크릴산, 크로톤산, α-클로로아크릴산, 신남산 등을 들 수 있다. 불포화 디카르복실산으로서는, 예를 들면 말레산, 푸마르산, 이타콘산, 시트라콘산, 메사콘산 등을 들 수 있다. 불포화 다가 카르복실산은 산무수물일 수도 있으며, 구체적으로는 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물 등을 들 수 있다. 또한, 불포화 다가 카르복실산은 그의 모노(2-메타크릴로일옥시알킬)에스테르일 수도 있으며, 예를 들면 숙신산 모노(2-아크릴로일옥시에틸), 숙신산 모노(2-메타크릴로일옥시에틸), 프탈산 모노(2-아크릴로일옥시에틸), 프탈산 모노(2-메타크릴로일옥시에틸) 등을 들 수 있다. 불포화 다가 카르복실산은 그 양말단 디카르복시 중합체의 모노(메타)아크릴레이트일 수도 있으며, 예를 들면 ω-카르복시폴리카프로락톤 모노아크릴레이트, ω-카르복시폴리카프로락톤 모노메타크릴레이트 등을 들 수 있다. 이들 카르복실기 함유 단량체는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. 상기 카르복실기 함유 단량체와 공중합 가능한 다른 단량체로서는, 예를 들면 스티렌, α-메틸스티렌, o-비닐톨루엔, m-비닐톨루엔, p-비닐톨루엔, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐벤질메틸에테르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르, 인덴 등의 방향족 비닐 화합물; 메틸아크릴레이트, 메틸메타크릴레이트, 에틸아크릴레이트, 에틸메타크릴레이트, n-프로필아크릴레이트, n-프로필메타크릴레이트, i-프로필아크릴레이트, i-프로필메타크릴레이트, n-부틸아크릴레이트, n-부틸메타크릴레이트, i-부틸아크릴레이트, i-부틸메타크릴레이트, sec-부틸아크릴레이트, sec-부틸메타크릴레이트, t-부틸아크릴레이트, t-부틸메타크릴레이트, 2-히드록시에틸아크릴레이트, 2-히드록시에틸메타크릴레이트, 2-히드록시프로필아크릴레이트, 2-히드록시프로필메타크릴레이트, 3-히드록시프 로필아크릴레이트, 3-히드록시프로필메타크릴레이트, 2-히드록시부틸아크릴레이트, 2-히드록시부틸메타크릴레이 트, 3-히드록시부틸아크릴레이트, 3-히드록시부틸메타크릴레이트, 4-히드록시부틸아크릴레이트, 4-히드록시부틸메타크릴레이트, 알릴아크릴레이트, 알릴메타크릴레이트, 벤질아크릴레이트, 벤질메타크릴레이트, 시클로헥실아크릴레이트, 시클로헥실메타크릴레이트, 페닐아크릴레이트, 페닐메타크릴레이트, 2-메톡시에틸아크릴레이트, 2-메톡시에틸메타크릴레이트, 2-페녹시에틸아크릴레이트, 2-페녹시에틸메타크릴레이트, 메톡시디에틸렌글리콜아크릴레이트, 메톡시디에틸렌글리콜메타크릴레이트, 메톡시트리에틸렌글리콜아크릴레이트, 메톡시트리에틸렌글리콜메타크릴레이트, 메톡시프로필렌글리콜아크릴레이트, 메톡시프로필렌글리콜메타크릴레이트, 메톡시디프로필렌글리콜아크릴레이트, 메톡시디프로필렌글리콜메타크릴레이트, 이소보르닐아크릴레이트, 이소보르닐메타크릴레이트, 디시클로펜타디에닐아크릴레이트, 디시클로펜타디에틸메타크릴레이트, 아다만틸(메타)아크릴레이트, 노르보르닐(메타)아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-히드록시-3-페녹시프로필메타크릴레이트, 글리세롤모노아크릴레이트, 글리세롤모노메타크릴레이트 등의 불포화 카르복실산 에스테르류; 2-아미노에틸아크릴레이트, 2-아미노에틸메타크릴레이트, 2-디메틸아미노에틸아크릴레이트, 2-디메틸아미노에틸 메타크릴레이트, 2-아미노프로필아크릴레이트, 2-아미노프로필메타크릴레이트, 2-디메틸아미노프로필아크릴레이트, 2-디메틸아미노프로필메타크릴레이트, 3-아미노프로필아크릴레이트, 3-아미노프로필메타크릴레이트, 3-디메틸아미노프로필아크릴레이트, 3-디메틸아미노프로필메타크릴레이트 등의 불포화 카르복실산 아미노알킬에스테르류; 글리시딜아크릴레이트, 글리시딜메타크릴레이트 등의 불포화 카르복실산 글리시딜에스테르류; 아세트산 비닐, 프로피온산 비닐, 부티르산 비닐, 벤조산 비닐 등의 카르복실산 비닐에스테르류; 비닐메틸에테르, 비닐에틸에테르, 알릴글리시딜에테르 등의 불포화 에테르류; 아크릴로니트릴, 메타크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴 등의 시안화 비닐 화합물; 아크릴아미드, 메타크릴아미드, α-클로로아크릴아미드, N-2-히드록시에틸아크릴아미드, N-2-히드록시에틸메타크릴아미드 등의 불포화 아미드류; 말레이미드, 벤질말레이미드, N-페닐말레이미드. N-시클로헥실말레이미드 등의 불포화 이미드류; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공액 디엔류; 및 폴리스티렌, 폴리메틸아크릴레이트, 폴리메틸메타크릴레이트, 폴리-n-부틸아크릴레이트, 폴리-n-부틸메타크릴레이트, 폴리실록산의 중합체 분자쇄의 말단에 모노아크릴로일기 또는 모노메타크릴로일기를 갖는 거대 단량체류등을 들 수 있다. 이들 단량체는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. 특히, 상기 카르복실기 함유 단량체와 공중합 가능한 다른 단량체로서 노르보닐 골격을 갖는 단량체, 아다만탄골격을 갖는 단량체, 로진 골격을 갖는 단량체 등의 벌키성 단량체가 비유전 상수값을 낮추는 경향이 있기 때문에 바람직하다.Examples of the acrylic alkali-soluble resin include carboxyl group-containing monomers and copolymers with other monomers copolymerizable with this monomer. As a carboxyl group-containing monomer, unsaturated carboxylic acids, such as unsaturated monocarboxylic acid, unsaturated polycarboxylic acid, such as unsaturated polyhydric carboxylic acid which has one or more carboxyl groups in molecules, such as unsaturated dicarboxylic acid and unsaturated tricarboxylic acid, are mentioned, for example. have. Here, as unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example. As unsaturated dicarboxylic acid, a maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example. The unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride. In addition, the unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester thereof, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl ), Mono (2-acryloyloxyethyl) phthalate, mono (2-methacryloyloxyethyl) phthalate, etc. are mentioned. The unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate. . These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively. As another monomer copolymerizable with the said carboxyl group-containing monomer, For example, styrene, (alpha) -methylstyrene, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p-chloro styrene, o-methoxy styrene, m-meth Oxy styrene, p-methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p- Aromatic vinyl compounds such as vinyl benzyl glycidyl ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxy Ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxy propyl acrylate, 3-hydroxypropyl methacrylate, 2- Hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, Allyl Acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl Methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol meth Methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy dipropylene glycol acrylate, methoxy dipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadier Nyl acrylate, dicyclopentadiethyl methacrylate, adamantyl (meth) Acrylate, norbornyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, etc. Unsaturated carboxylic acid esters; 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxyl such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate and 3-dimethylaminopropyl methacrylate Acid aminoalkyl esters; Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; Vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile and vinylidene cyanide; Unsaturated amides such as acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethylacrylamide and N-2-hydroxyethyl methacrylamide; Maleimide, benzylmaleimide, N-phenylmaleimide. Unsaturated imides such as N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; And monoacryloyl or monomethacryloyl groups at the terminal of the polymer molecular chain of polystyrene, polymethylacrylate, polymethylmethacrylate, poly-n-butylacrylate, poly-n-butylmethacrylate, polysiloxane. And macromonomers to have. These monomers can be used individually or in mixture of 2 or more types, respectively. In particular, bulky monomers such as monomers having a norbornyl skeleton, monomers having an adamantane skeleton, and monomers having a rosin skeleton as the other monomers copolymerizable with the carboxyl group-containing monomer are preferable because they tend to lower the dielectric constant. .
본 발명의 카도계 바인더 수지 및/또는 아크릴계 알칼리 가용성 수지로는 산가가 20 내지 200(KOH ㎎/g)의 범위가 바람직하다. 산가가 상기 범위에 있으면, 현상액 중의 용해성이 향상되어, 비-노출부가 쉽게 용해되고 감도가 증가하여, 결과적으로 노출부의 패턴이 현상시에 남아서 잔막율(film remaining ratio)을 개선하게 되어 바람직하다. 여기서 산가란, 아크릴계 중합체 1g을 중화하는 데 필요한 수산화칼륨의 양(mg)으로서 측정되는 값이며, 통상적으로 수산화칼륨 수용액을 사용하여 적정함으로써 구할 수 있다. 또한, 겔 투과 크로마토그래피(GPC; 테트라히드로퓨란을 용출용제로 함)로 측정한 폴리스티렌 환산 중량평균분자량(이하, 간단히 '중량평균분자량'이라고 한다)인 2,000 내지 200,000, 바람직하게는 3,000 내지 100,000인 카도계 바인더 수지 및/또는 아크릴계 알칼리 가용성 수지가 바람직하다. 분자량이 상기 범위에 있으면, 코팅 필름의 경도가 향상되어, 잔막율이 높고, 현상액 중의 비-노출부의 용해성이 탁월하고 해상도가 향상되는 경향이 있어 바람직하다.As the cardo binder resin and / or the acrylic alkali-soluble resin of the present invention, the acid value is preferably in the range of 20 to 200 (KOH mg / g). If the acid value is in the above range, the solubility in the developing solution is improved, so that the non-exposed part is easily dissolved and the sensitivity is increased, and as a result, the pattern of the exposed part remains at the time of development to improve the film remaining ratio. The acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer, and can usually be obtained by titration using an aqueous potassium hydroxide solution. Also, the polystyrene reduced weight average molecular weight (hereinafter, simply referred to as 'weight average molecular weight') measured by gel permeation chromatography (GPC; tetrahydrofuran as an eluting solvent) is 2,000 to 200,000, preferably 3,000 to 100,000. Cardo-based binder resins and / or acrylic alkali-soluble resins are preferred. When the molecular weight is in the above range, the hardness of the coating film is improved, the residual film ratio is high, the solubility of the non-exposed portion in the developer is excellent and the resolution tends to be improved, which is preferable.
카도계 바인더 수지 및/또는 아크릴계 알칼리 가용성 수지의 분자량 분포[중량평균분자량(Mw)/수평균분자량(Mn)]는 1.0 내지 6.0 인 것이 바람직하고, 1.5 내지 6.0인 것이 보다 바람직하다. 분자량분포[중량평균분자량(Mw)/수평균분자량(Mn)]가 1.5 내지 6.0이면 현상성이 우수하기 때문에 바람직하다.The molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) of the cardo-based binder resin and / or the acrylic alkali-soluble resin is preferably 1.0 to 6.0, more preferably 1.5 to 6.0. If molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] is 1.5-6.0, since developability is excellent, it is preferable.
본 발명의 바인더 수지는 청색 감광성 수지 중의 고형분 총 중량에 대하여 5 내지 85중량%, 바람직하게는 5 내지 60중량%로 포함될 수 있다. 바인더 수지의 함유량이 상기의 범위로 사용되는 경우 The binder resin of the present invention may be included in 5 to 85% by weight, preferably 5 to 60% by weight relative to the total weight of solids in the blue photosensitive resin. When content of binder resin is used in said range
현상액에의 용해성이 충분하여 비화소 부분의 기판상에 현상 잔사가 발생하기 어렵고, 현상시에 노광부의 화소 부분의 막 감소가 생기기 어려워 비화소 부분의 누락성이 양호한 경향이 있으므로 바람직하다.It is preferable because the solubility in a developing solution is sufficient, so that development residues are less likely to occur on the substrate of the non-pixel portion, and the film reduction of the pixel portion of the exposed portion is less likely to occur at the time of development, and the omission of the non-pixel portion is good.
광중합성 화합물Photopolymerizable compound
본 발명의 청색 감광성 수지 조성물에 함유되는 광중합성 화합물은 광 및 후술하는 광중합 개시제의 작용으로 중합할 수 있는 화합물로서, 단관능 단량체, 2관능 단량체, 그 밖의 다관능 단량체 등을 들 수 있다. 단관능 단량체의 구체예로는 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등을 들 수 있다. 2관능 단량체의 구체예로는 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르, 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있다. 그 밖의 다관능 단량체의 구체예로서는 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 펜타에리트리톨테트라(메타)아크릴레이트, 펜타에리트리톨펜타(메타)아크릴레이트, 디펜타에리트리톨헥사(메타)아크릴레이트 등을 들 수 있다. 이들 중에서 2관능 이상의 다관능 단량체가 바람직하게 사용된다.The photopolymerizable compound contained in the blue photosensitive resin composition of this invention is a compound which can superpose | polymerize by the action | action of light and the photoinitiator mentioned later, A monofunctional monomer, a bifunctional monomer, another polyfunctional monomer, etc. are mentioned. Specific examples of the monofunctional monomers include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate and N-vinylpyrroli Money, etc. Specific examples of the bifunctional monomer include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, Bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, etc. are mentioned. Specific examples of other polyfunctional monomers include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol penta (meth) acrylate, and dipenta Erythritol hexa (meth) acrylate etc. are mentioned. Of these, bifunctional or higher polyfunctional monomers are preferably used.
상기 광중합성 화합물은 청색 감광성 수지 중의 고형분 총 중량에 대하여 5 내지 50중량%로 포함될 수 있고, 바람직하게는 5 내지 30중량%로 포함될 수 있다. 상기 광중합성 화합물의 함량이 상기 범위를 만족하는 경우 화소부의 강도나 평활성이 양호하게 되는 경향이 있기 때문에 바람직하다.The photopolymerizable compound may be included in 5 to 50% by weight, preferably 5 to 30% by weight based on the total weight of solids in the blue photosensitive resin. When the content of the photopolymerizable compound satisfies the above range, the intensity and smoothness of the pixel portion tend to be good, which is preferable.
광개시제Photoinitiator
본 발명에서 사용되는 광중합 개시제는 감광성 수지 조성물의 감도를 향상시켜 생산성을 높여주는 역할을 하며, 아세토페논계 화합물을 함유하는 것이 바람직하다. 아세토페논계 화합물로는, 예를 들면, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸[4-(1-메틸비닐)페닐]프로판-1-온 등을 들 수 있고, 바람직하게는 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다. 또한, 상기 아세토페논계 이외의 광중합 개시제를 조합하여 사용할 수 있다. 아세토페논계 이외의 광중합 개시제는 빛을 조사함으로써 활성 라디칼을 발생하는 활성 라디칼 발생제, 증감제, 산발생제 등을 들 수 있다. 활성라디칼 발생제로는, 예를 들면, 벤조인계 화합물, 벤조페논계 화합물, 티옥산톤계 화합물, 트리아진계 화합물등을 들 수 있다. 벤조인계 화합물로는, 예를 들면, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조이소부틸에테르 등을 들 수 있다. 벤조페논계 화합물로는, 예를 들면, 벤조페논, o-벤조일벤조산메틸, 4-페닐조페논, 4-벤조일-4'-메틸디페닐설파이드, 3,3',4,4'-테트라(t-부틸퍼옥시카보닐)벤조페논, 2,4,6-트리메틸벤조페논 등을 들 수 있다. 티옥산톤계 화합물로는, 예를 들면, 2-이소프로필티옥산톤, 4-이소프로필티옥산톤, 2,4-디에틸티옥산톤, 2,4-디클로로티옥산톤, 1-클로로-4-프로폭시티옥산톤 등을 들 수 있다. 트리아진계 화합물로는, 예를 들면, 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진,2,4-비스(트리클로로메틸)-6-[2-(3,4디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다. 상기 활성 라디칼 발생제로는, 예를 들면, 2,4,6-트리메틸벤조일디페닐포스핀옥사이드, 2,2,-비스(o-클로르로페닐)-4,4', 5,5'-테트라페닐-1,2'-비이미다졸, 10-부틸-2-클로로아크리돈, 2-에틸안트라퀴논, 벤질, 9,10-페난트렌퀴논, 캄포르퀴논, 페닐글리옥실산메틸, 티타노센 화합물 등을 사용할 수 있다. 상기 산발생제로는 예를 들면, 4-히드록시페닐디메틸설포늄 p-톨루엔설포네이트, 4-히드록시페닐디메틸설포늄헥사플루오로안티모네이트, 4-아세톡시페닐디메틸설포늄 p-톨루엔설포네이트, 4-아세톡시페닐메틸벤질설포늄헥사 플루오로안티모네이트, 트리페닐설포늄 p-톨루엔설포네이트, 트리페닐설포늄헥사플루오로안티모네이트, 디페닐요오도늄 p-톨루엔설포네이트, 디페닐요오도늄헥사플루오로안티모네이트 등의 오늄염류나 니트로벤질토실레이트류, 벤조인토실레이트류 등을 들 수 있다. 또한, 활성 라디칼 발생제로서 상기 화합물 중에는 활성 라디칼과 동시에 산을 발생하는 화합물도 있으며, 예를들면, 트리아진계 광중합 개시제는 산 발생제로서도 사용된다. The photopolymerization initiator used in the present invention serves to improve the sensitivity of the photosensitive resin composition to increase productivity, and preferably contains an acetophenone-based compound. As an acetophenone type compound, for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2 -Hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1- On, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl [4- (1-methylvinyl) phenyl] propane-1- And the like, and preferably 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1-one and 2-benzyl-2-dimethylamino-1- (4-mor Polynophenyl) butan-1-one etc. are mentioned. Moreover, photoinitiators other than the said acetophenone series can be used in combination. Photopolymerization initiators other than the acetophenone series include active radical generators, sensitizers, and acid generators that generate active radicals by irradiation with light. As an active radical generating agent, a benzoin compound, a benzophenone type compound, a thioxanthone type compound, a triazine type compound, etc. are mentioned, for example. As a benzoin type compound, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoisobutyl ether, etc. are mentioned, for example. As a benzophenone type compound, for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( t-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned. As a thioxanthone type compound, 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-, for example 4-propoxy city oxanthone etc. are mentioned. As a triazine type compound, 2, 4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1, 3, 5- triazine, 2, 4-bis (trichloromethyl), for example -6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxystyryl) -1,3,5-tri Azine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl ) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino- 2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4dimethoxyphenyl) ethenyl] -1,3,5 -Triazine and the like. Examples of the active radical generator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2, -bis (o-chlorophenyl) -4,4 ', 5,5'-tetra Phenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene Compounds and the like can be used. Examples of the acid generator include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate and 4-acetoxyphenyldimethylsulfonium p-toluenesulfo. Acetate, 4-acetoxyphenylmethylbenzylsulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium p-toluenesulfonate, Onium salts, such as diphenyl iodonium hexafluoro antimonate, nitrobenzyl tosylate, benzoin tosylate, etc. are mentioned. In addition, there are some compounds which generate an acid simultaneously with the active radicals in the compound as an active radical generator, for example, a triazine photopolymerization initiator is also used as an acid generator.
본 발명에 따른 청색 감광성 수지 조성물에 사용되는 상기 광중합 개시제는 청색 감광성 수지 중의 고형분 총 중량에 대하여 0.1 내지 30중량%, 바람직하게는 0.3 내지 20중량% 포함될 수 있다. 상기의 범위에 있으면 착색 감광성 수지 조성물이 고감도화되어 이 조성물을 사용하여 형성한 화소부의 강도나, 이 화소부의 표면에서의 평활성이 양호하게 되는 경향이 있기 때문에 바람직하다. The photopolymerization initiator used in the blue photosensitive resin composition according to the present invention may be included in an amount of 0.1 to 30% by weight, preferably 0.3 to 20% by weight, based on the total weight of solids in the blue photosensitive resin. When it exists in the said range, since the coloring photosensitive resin composition becomes highly sensitive and the intensity | strength of the pixel part formed using this composition and the smoothness in the surface of this pixel part tend to become favorable, it is preferable.
나아가, 본 발명에서는 광중합 개시 조제를 사용할 수 있다. 광중합 개시 조제는 광중합 개시제와 조합하여 사용되는 경우가 있으며, 광중합 개시제에 의해 중합이 개시된 광중합성 화합물의 중합을 촉진시키기 위해 사용되는 화합물이다. 광중합 개시 조제로서는, 아민계 화합물, 알콕시안트라센계 화합물, 티옥산톤계 화합물 등을 들수 있다.Furthermore, in this invention, photoinitiator start adjuvant can be used. A photoinitiator adjuvant may be used in combination with a photoinitiator, and is a compound used in order to accelerate superposition | polymerization of the photopolymerizable compound in which superposition | polymerization was started by a photoinitiator. As photopolymerization start adjuvant, an amine compound, an alkoxy anthracene type compound, a thioxanthone type compound, etc. are mentioned.
아민계 화합물로는, 예를 들면, 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이소아밀, 벤조산2-디메틸아미노에틸, 4-디메틸아미노벤조산 2-에틸헥실, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤즈페논(통칭, 미힐러즈케톤), 4,4'-비스(디에틸아미노)벤조페논, 4,4'-비스(에틸메틸아미노)벤조페논 등을 들 수 있으며, 이 중에서도 4,4'-비스(디에틸아미노)벤조페논이 바람직하다. 알콕시안트라센계 화합물로는, 예를 들면, 9,10-디메톡시안트라센, 2-에틸-9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디에톡시안트라센 등을 들 수 있다. 티옥산톤계화합물로는, 예를 들면, 2-이소프로필티옥산톤, 4-이소프로필티옥산톤, 2,4-디에틸티옥산톤, 2,4-디클로로티옥산톤, 1-클로로-4-프로폭시티옥산톤 등을 들 수 있다. 이러한 광중합 개시제(D)는 단독으로 또는 복수를 조합하여 사용해도 지장이 없다. 또한, 광중합 개시 조제로서시판되는 것을 사용할 수 있으며, 시판되는 광중합 개시 조제로는, 예를 들면, 상품명 「EAB-F」[제조원: 호도가야가가쿠고교가부시키가이샤] 등을 들 수 있다. Examples of the amine compound include triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 2-dimethylamino benzoic acid. Ethyl, 2-ethylhexyl 4-dimethylaminobenzoic acid, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzphenone (commonly known as Michler's ketone), 4,4'-bis (diethyl Amino) benzophenone, 4, 4'-bis (ethylmethylamino) benzophenone, etc. are mentioned, Among these, 4,4'-bis (diethylamino) benzophenone is preferable. As an alkoxy anthracene type compound, 9,10- dimethoxy anthracene, 2-ethyl-9,10- dimethoxy anthracene, 9,10- diethoxy anthracene, 2-ethyl-9, 10- diethoxy anthracene, for example. Etc. can be mentioned. As a thioxanthone type compound, 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro- 4-propoxy city oxanthone etc. are mentioned. These photoinitiators (D) may be used alone or in combination of a plurality thereof. In addition, a commercially available thing can be used as a photoinitiator starter, As a commercially available photoinitiator starter, brand name "EAB-F" (manufacturer: Hodogaya Chemical Co., Ltd.) etc. are mentioned, for example.
이들 광중합 개시 조제를 사용하는 경우, 이의 사용량은 광중합 개시제 1몰당 통상적으로 10몰 이하, 바람직하게는 0.01~5몰이 바람직하다. 상기의 범위에 있으면 착색 감광성 수지 조성물의 감도가 더 높아지고, 이 조성물을 사용하여 형성되는 컬러필터의 생산성이 향상되는 경향이 있기 때문에 바람직하다. In the case of using these photopolymerization initiation assistants, the amount thereof is usually 10 mol or less, preferably 0.01 to 5 mol, per mol of the photopolymerization initiator. If it exists in the said range, since the sensitivity of a coloring photosensitive resin composition becomes higher and the productivity of the color filter formed using this composition tends to improve, it is preferable.
용제solvent
본 발명의 청색 감광성 수지 조성물에 함유되는 용제는 특별히 제한되지 않으며 청색 감광성 수지 조성물의 분야에서 사용되고 있는 각종 유기 용제를 사용할 수 있다. 그의 구체예로서는 에틸렌글리콜 모노메틸 에테르, 에틸렌글리콜 모노에틸 에테르, 에틸렌글리콜 모노프로필 에테르, 에틸렌글리콜 모노부틸 에테르 등의 에틸렌글리콜 모노알킬 에테르류, 디에틸렌글리콜 디메틸에테르, 디에틸렌글리콜 디에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르 등의 디에틸렌글리콜디알킬에테르류, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트 등의 에틸렌글리콜 알킬에테르 아세테이트류, 프로필렌글리콜 모노메틸에테르아세테이트, 프로필렌글리콜 모노에틸에테르아세테이트, 프로필렌글리콜 모노프로필에테르아세테이트, 메톡시부틸 아세테이트 및 메톡시펜틸 아세테이트 등의 알킬렌글리콜알킬에테르 아세테이트류, 벤젠, 톨루엔, 크실렌, 메시틸렌 등의 방향족 탄화수소류, 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논등의 케톤류, 에탄올, 프로판올, 부탄올, 헥사놀, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올류, 3-에톡시프로피온산 에틸, 3-메톡시프로피온산 메틸 등의 에스테르류, γ-부티롤락톤 등의 환상 에스테르류 등을 들수 있다. 상기의 용제 중, 도포성, 건조성면에서 바람직하게는 상기 용제 중에서 비점이 100℃ 내지 200℃인 유기 용제를 들 수 있고, 보다 바람직하게는 알킬렌글리콜알킬에테르아세테이트류, 케톤류, 3-에톡시프로피온산 에틸이나, 3-메톡시프로피온산 메틸 등의 에스테르류를 들 수 있으며, 더욱 바람직하게는 프로필렌글리콜 모노메틸에테르아세테이트, 프로필렌글리콜 모노에틸에테르아세테이트, 시클로헥사논, 3-에톡시프로피온산 에틸, 3-메톡시프로피온산 메틸 등을 들 수 있다. 이들 용제는 각각 단독으로 또는 2종류 이상 혼합하여 사용할 수 있다.The solvent contained in the blue photosensitive resin composition of this invention is not specifically limited, Various organic solvents used in the field of a blue photosensitive resin composition can be used. Specific examples thereof include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene. Diethylene glycol dialkyl ethers such as glycol dipropyl ether and diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, and propylene glycol Alkylene glycol alkyl ether acetates such as monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate and methoxypentyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene, methyl Ketones such as methyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, cyclohexanone, ethanol, propanol, butanol, hexanol, cyclohexanol, alcohols such as ethylene glycol, glycerin, ethyl 3-ethoxypropionate, Ester, such as 3-methoxy methyl propionate, Cyclic ester, such as (gamma) -butyrolactone, etc. are mentioned. Among the solvents described above, organic solvents having a boiling point of 100 ° C. to 200 ° C. in the coating properties and drying properties are preferable, and alkylene glycol alkyl ether acetates, ketones, and 3-ethoxy are more preferable. Ester, such as ethyl propionate and the methyl 3-methoxy propionate, is mentioned, More preferably, propylene glycol monomethyl ether acetate, a propylene glycol monoethyl ether acetate, cyclohexanone, 3-ethoxy propionate, 3- Methyl methoxy propionate etc. are mentioned. These solvents can be used individually or in mixture of 2 or more types, respectively.
본 발명의 청색 감광성 수지 조성물 중의 용제의 함유량은 청색 감광성 수지 조성물 100 중량%을 기준으로 50 내지 90질량%, 바람직하게는 55 내지 85 질량% 포함될 수 있다. 용제의 함유량이 상기의 기준으로 50 내지 90질량%의 범위이면 롤 코터, 스핀 코터, 슬릿 앤드 스핀 코터, 슬릿 코터(다이 코터라고도 하는 경우가 있음), 잉크젯 등의 도포 장치로 도포했을 때 도포성이 양호해지는 경향이 있기 때문에 바람직하다.Content of the solvent in the blue photosensitive resin composition of this invention can be contained 50-90 mass%, Preferably it is 55-85 mass% based on 100 weight% of blue photosensitive resin compositions. Applicability when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, if the content of the solvent is in the range of 50 to 90 mass% based on the above criteria. This is preferable because it tends to be good.
첨가제additive
본 발명에 따른 청색 감광성 수지 조성물은 필요에 따라 충진제, 다른 고분자 화합물, 안료 분산제. 밀착 촉진제, 산화 방지제, 자외선 흡수제, 응집 방지제 등의 첨가제를 추가로 포함할 수 있다.The blue photosensitive resin composition which concerns on this invention is a filler, another high molecular compound, a pigment dispersant as needed. Additives, such as an adhesion promoter, antioxidant, a ultraviolet absorber, and an aggregation inhibitor, can be further included.
상기 충진제의 구체적인 예는 유리, 실리카, 알루미나 등이 예시된다.Specific examples of the filler include glass, silica, alumina and the like.
상기 다른 고분자 화합물로서는 구체적으로 에폭시 수지, 말레이미드 수지 등의 경화성 수지, 폴리비닐알코올, 폴리아크릴산, 폴리에틸렌글리콜모노알킬에테르, 폴리플루오로알킬아크릴레이트, 폴리에스테르, 폴리우레탄 등의 열가소성 수지 등을 들 수 있다. Specific examples of the other polymer compound include curable resins such as epoxy resins and maleimide resins, thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ethers, polyfluoroalkyl acrylates, polyesters, polyurethanes, and the like. Can be.
상기 안료 분산제로서는 시판되는 계면 활성제를 이용할 수 있고, 예를 들면 실리콘계, 불소계, 에스테르계, 양이온계, 음이온계, 비이온계, 양성 등의 계면 활성제 등을 들 수 있다. 이들은 각각 단독으로 또는 2종 이상을 조합하여 사용될 수 있다. Commercially available surfactants can be used as the pigment dispersant, and examples thereof include surfactants such as silicone, fluorine, ester, cationic, anionic, nonionic and amphoteric. These can be used individually or in combination of 2 types or more, respectively.
상기의 계면 활성제로서, 예를 들면 폴리옥시에틸렌알킬에테르류, 폴리옥시에틸렌알킬페에테르류, 폴리에틸렌글리콜 디에스테르류, 소르비탄 지방상 에스테르류, 지방산 변성 폴리에스테르류, 3급아민 변성 폴리우레탄류, 폴리에틸렌이민류 등이 있으며 이외에, 상품명으로 KP(신에쯔 가가꾸 고교㈜ 제조), 폴리플로우(POLYFLOW)(교에이샤 가가꾸㈜ 제조), 에프톱(EFTOP)(토켐 프로덕츠사 제조), 메가팩(MEGAFAC)(다이닛본 잉크 가가꾸 고교㈜ 제조), 플로라드(Flourad)(스미또모 쓰리엠㈜ 제조), 아사히가드(Asahi guard), 서플(Surflon)(이상, 아사히 글라스㈜ 제조), 솔스퍼스(SOLSPERSE)(제네까㈜ 제조), EFKA(EFKA 케미칼스사 제조), PB 821(아지노모또㈜ 제조) 등을 들 수 있다. As said surfactant, For example, polyoxyethylene alkyl ether, polyoxyethylene alkyl peer ether, polyethyleneglycol diester, sorbitan fatty acid ester, fatty acid modified polyester, tertiary amine modified polyurethane , Polyethylenimine, etc., trade names include KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by Tochem Products), MEGAFAC (manufactured by Dainippon Ink Chemical Industries, Ltd.), Florard (manufactured by Sumitomo 3M), Asahi guard, Surflon (above, manufactured by Asahi Glass), Sol SLSPERSE (made by Genka Corporation), EFKA (made by EFKA Chemicals), PB 821 (made by Ajinomoto Co., Ltd.), etc. are mentioned.
상기 밀착 촉진제로서, 예를 들면 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리스(2-메톡시에톡시)실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 3-머캅토프로필트리메톡시실란 등을 들 수 있다. As the adhesion promoter, for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminoprotriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2 -(3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyl Trimethoxysilane etc. are mentioned.
산화 방지제로서는 구체적으로 2,2'-티오비스(4-메틸-6-t-부틸페놀), 2,6-디-t-부틸-4-메틸페놀 등을 들 수 있다. Specific examples of the antioxidant include 2,2'-thiobis (4-methyl-6-t-butylphenol), 2,6-di-t-butyl-4-methylphenol, and the like.
상기 자외선 흡수제로서는 구체적으로 2-(3-tert-부틸-2-히드록시-5-메틸페닐)-5-클로로벤조티리아졸, 알콕시벤조페논 등을 들 수 있다. Specific examples of the ultraviolet absorber include 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzothiazole, alkoxybenzophenone and the like.
상기 응집 방지제로서는 구체적으로 폴리아크릴산 나트륨 등을 들 수 있다.Specific examples of the aggregation inhibitor include sodium polyacrylate and the like.
상기 첨가제는 본 발명의 효과를 저해하지 않는 범위에서 당업자가 적절히 추가하여 사용이 가능하다. 예컨대 상기 첨가제는 상기 청색 감광성 수지 조성물 전체 100 중량부에 대하여 0.05 내지 10 중량부, 바람직하게는 0.1 내지 10 중량부, 더욱 바람직하게는 0.1 내지 5 중량부로 사용할 수 있으나 이에 한정되는 것은 아니다.The additives can be used by those skilled in the art as appropriate without departing from the effect of the present invention. For example, the additive may be used in an amount of 0.05 to 10 parts by weight, preferably 0.1 to 10 parts by weight, more preferably 0.1 to 5 parts by weight, based on 100 parts by weight of the total blue photosensitive resin composition, but is not limited thereto.
본 발명에 따른 청색 감광성 수지 조성물은 예컨대 이하와 같은 방법에 의해 제조될 수 있다. 산란입자를 미리 용제와 혼합하여 평균입경이 10 내지 1000nm가 될 때까지 비드 밀 등을 이용하여 분산시킨다. 이때, 필요에 따라 분산제를 추가로 사용할 수 있고, 바인더 수지(카도계 수지 또는 카도계 수지 및 아크릴계 알칼리 가용성 수진의 혼합물)의 일부 또는 전부가 배합될 수도 있다. 얻어진 분산액(이하, 밀 베이스라고 하는 경우도 있음)에 바인더 수지(카도계 수지 또는 카도계 수지 및 아크릴계 알칼리 가용성 수진의 혼합물)의 나머지, 화학식 1의 티올 화합물, 청색 착색제, 광중합성 화합물, 광중합 개시제, 필요에 따라 사용되는 그밖의 성분과 필요에 따라 추가의 용제를 소정의 농도가 되도록 더 첨가하여 목적하는 청색 감광성 수지 조성물을 얻을 수 있다.The blue photosensitive resin composition which concerns on this invention can be manufactured, for example by the following method. The scattering particles are mixed with the solvent in advance and dispersed using a bead mill or the like until the average particle diameter becomes 10 to 1000 nm. At this time, a dispersing agent can be further used as needed, and some or all of binder resin (cardo resin or mixture of cardo resin and acrylic alkali-soluble resin) may be mix | blended. Thiol compound of the formula (1), blue colorant, photopolymerizable compound, photopolymerization initiator in the obtained dispersion (hereinafter sometimes referred to as mill base) of the binder resin (mixture of cardo resin or cardo resin and acrylic alkali soluble resin) In addition, the other component used as needed, and an additional solvent can be further added as needed, and a desired blue photosensitive resin composition can be obtained as needed.
<컬러필터 및 화상표시장치><Color filter and image display device>
본 발명의 또 다른 양태는 전술한 청색 패턴층 형성용 청색 감광성 수지 조성물의 경화물을 포함하는 청색 패턴층을 포함하는 컬러필터에 관한 것이다.Another aspect of the present invention relates to a color filter comprising a blue pattern layer containing a cured product of the blue photosensitive resin composition for forming a blue pattern layer described above.
본 발명에 따른 컬러필터는 청색 양자점 대신 전술한 청색 패턴층 형성용 청색 감광성 수지 조성물로 제조되기 때문에 제조단가를 낮출 수 있는 이점이 있다. 또한, 본 발명의 청색 감광성 수지 조성물에 화학식 1로 표시되는 티올 화합물을 포함함으로써, 상기 청색 감광성 수지 조성물은 경화막으로 형성 시 뛰어난 내용제성, 밀착성 및 패턴 형성성(미세패턴 형성성)이 우수한 컬러필터, 자발광 컬러필터 구현이 가능할 수 있다.Since the color filter according to the present invention is made of the blue photosensitive resin composition for forming the blue pattern layer instead of the blue quantum dots, there is an advantage of lowering the manufacturing cost. In addition, by including the thiol compound represented by the formula (1) in the blue photosensitive resin composition of the present invention, the blue photosensitive resin composition is a color excellent in excellent solvent resistance, adhesion and pattern formability (fine pattern formability) when forming a cured film Filter, self-luminous color filter may be implemented.
상기 컬러필터는 기판 및 상기 기판의 상부에 형성된 청색 패턴층을 포함한다.The color filter includes a substrate and a blue pattern layer formed on the substrate.
상기 기판은 상기 컬러필터 자체 기판일 수 있으며, 또는 디스플레이 장치 등에 컬러필터가 위치되는 부위일 수도 있는 것으로, 특별히 제한되지 않는다. 상기 기판은 유리, 실리콘(Si), 실리콘 산화물(SiOx) 또는 고분자 기판일 수 있으며, 상기 고분자 기판은 폴리에테르설폰(polyethersulfone, PES) 또는 폴리카보네이트(polycarbonate, PC) 등일 수 있다.The substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
상기 청색 패턴층은 본 발명의 청색 감광성 수지 조성물을 포함하는 층으로, 상기 청색 패턴층 형성용 청색 감광성 수지 조성물을 도포하고 소정의 패턴으로 노광, 현상 및 열경화하여 형성된 층일 수 있으며, 상기 패턴층은 당업계에서 통상적으로 알려진 방법을 수행함으로써 형성할 수 있다. The blue pattern layer is a layer including the blue photosensitive resin composition of the present invention, and may be a layer formed by applying the blue photosensitive resin composition for forming a blue pattern layer and exposing, developing and thermosetting in a predetermined pattern. Can be formed by carrying out methods commonly known in the art.
본 발명의 또 다른 실시형태에 있어서, 상기 컬러필터는 적색 패턴층 및 녹색 패턴층으로 이루어진 군에서 선택되는 1 이상을 더 포함할 수 있다.In another embodiment of the present invention, the color filter may further include one or more selected from the group consisting of a red pattern layer and a green pattern layer.
본 발명의 또 다른 실시형태에 있어서, 상기 적색 패턴층 또는 녹색 패턴층은 양자점 및/또는 산란입자를 포함할 수 있다. 구체적으로, 본 발명에 따른 컬러필터는 적 양자점을 포함하는 적색 패턴층 또는 녹 양자점을 포함하는 녹색 패턴층을 포함할 수 있으며, 상기 적색 패턴층 또는 녹색 패턴층은 산란입자를 포함할 수 있다. 상기 적색 패턴층 또는 녹색 패턴층은 후술할 청색광을 방출하는 광원에 의하여 각각 적색광 또는 청색광을 방출할 수 있다.In another embodiment of the present invention, the red pattern layer or green pattern layer may include a quantum dot and / or scattering particles. Specifically, the color filter according to the present invention may include a red pattern layer including a red quantum dot or a green pattern layer including a green quantum dot, and the red pattern layer or the green pattern layer may include scattering particles. The red pattern layer or the green pattern layer may emit red light or blue light, respectively, by a light source emitting blue light, which will be described later.
본 발명의 또 다른 실시형태에 있어서, 상기 적색 패턴층 또는 녹색 패턴층에 포함되는 산란입자는 평균입경이 10 내지 1000nm인 금속산화물을 포함할 수 있으며, 상기 산란입자 및 금속산화물에 관한 내용은 본 발명에 따른 청색 감광성 수지 조성물 내에 포함되는 산란입자 및 금속산화물에 관한 내용을 적용할 수 있다.In another embodiment of the present invention, the scattering particles included in the red pattern layer or the green pattern layer may include a metal oxide having an average particle diameter of 10 to 1000nm, the details of the scattering particles and the metal oxide The content of the scattering particles and the metal oxide contained in the blue photosensitive resin composition according to the invention can be applied.
본 발명에 있어서, 상기 적색 패턴층 또는 녹색 패턴층에 포함되는 양자점의 형태, 구성 및 그 함량은 한정되지 않으며, 당업계에서 통상적으로 사용되는 양자점을 적용할 수 있다.In the present invention, the shape, configuration, and content of the quantum dots included in the red pattern layer or the green pattern layer are not limited, and quantum dots commonly used in the art may be applied.
상기와 같은 기판 및 패턴층을 포함하는 컬러필터는 각 패턴 사이에 형성된 격벽을 더 포함할 수 있으며, 블랙 매트릭스를 더 포함할 수 있으나 이에 한정되지는 않는다.The color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
본 발명에 있어서, 상기 컬러필터는 자발광 컬러필터일 수 있다.In the present invention, the color filter may be a self-luminous color filter.
본 발명의 또 다른 양태는, 전술한 컬러필터; 및 청색광을 방출하는 광원;을 포함하는 화상표시장치에 관한 것이다. 요컨대, 본 발명에 따른 화상표시장치는 전술한 청색 감광성 수지 조성물의 경화물을 포함하는 청색 패턴층을 포함하는 컬러필터와 청색광을 방출하는 광원을 포함한다.Another aspect of the invention, the above-described color filter; And a light source emitting blue light. In short, the image display apparatus according to the present invention includes a color filter including a blue pattern layer including a cured product of the above-described blue photosensitive resin composition and a light source emitting blue light.
본 발명의 컬러필터는 통상의 액정 표시 장치뿐만 아니라, 전계 발광 표시장치, 플라스마 표시 장치, 전계 방출 표시 장치 등 각종 화상 표시 장치에 적용이 가능하다.The color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
상기 화상표시장치가 본 발명에 따른 청색 패턴층을 포함하는 컬러필터와 상기 광원을 포함하는 경우 우수한 발광강도를 가지는 이점이 있다. 또한, 본 발명에 따른 컬러필터에 포함되는 청색 패턴층은 청색 양자점을 포함하지 않기 때문에 제조단가가 낮은 화상표시장치를 제조할 수 있는 이점이 있다. When the image display device includes the color filter including the blue pattern layer and the light source according to the present invention, there is an advantage of having excellent light emission intensity. In addition, since the blue pattern layer included in the color filter according to the present invention does not include blue quantum dots, there is an advantage in that an image display device having low manufacturing cost can be manufactured.
이하, 본 명세서를 구체적으로 설명하기 위해 실시예를 들어 상세히 설명한다. 그러나, 본 명세서에 따른 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 명세서의 범위가 아래에서 상술하는 실시예들에 한정되는 것으로 해석되지는 않는다. 본 명세서의 실시예들은 당업계에서 평균적인 지식을 가진 자에게 본 명세서를 보다 완전하게 설명하기 위해 제공되는 것이다. 또한, 이하에서 함유량을 나타내는 "%" 및 "부"는 특별히 언급하지 않는 한 중량 기준이다.Hereinafter, the present invention will be described in detail with reference to Examples. However, the embodiments according to the present disclosure may be modified in various other forms, and the scope of the present specification is not to be interpreted as being limited to the embodiments described below. The embodiments of the present specification are provided to more fully describe the present specification to those skilled in the art. In addition, "%" and "part" which show content below are a basis of weight unless there is particular notice.
합성예: 바인더 수지의 합성Synthesis Example Synthesis of Binder Resin
제조예 1: 아크릴계 알칼리 가용성 수지Preparation Example 1: Acrylic Alkali Soluble Resin
교반기, 온도계 환류 냉각관, 적하 로트 및 질소 도입관을 구비한 플라스크를 준비하고, 한편, 모노머 적하 로 트로서, 벤질말레이미드 74.8g(0.20몰), 아크릴산 43.2g(0.30몰), 비닐톨루엔 118.0g(0.50몰), t-부틸퍼옥시-2-에틸헥사노에이트 4g, 프로필렌글리콜모노메틸에테르아세테이트(PGMEA) 40g를 투입 후 교반 혼합하여 준비하고, 연쇄 이동제 적하조로서, n-도데칸티올 6g, PGMEA 24g를 넣고 교반 혼합한 것을 준비했다. 이후 플라스크에 PGMEA 395g를 도입하고 플라스크내 분위기를 공기에서 질소로 한 후 교반하면서 플라스크의 온도를 90℃까지 승온했다. 이어서 모노머 및 연쇄 이동제를 적하 로트로부터 적하를 개시했다. 적하는, 90℃를 유지하면서, 각각 2h 동안 진행하고 1h 후에 110℃ 승온하여 3h 유지한 뒤, 가스 도입관을 도입시켜, 산소/질소=5/95(v/v) 혼합가스의 버블링을 개시했다. 이어서, 글리시딜메타크릴레이트 28.4g[(0.10몰), (본 반응에 사용한 아크릴산의 카르복실기에 대하여 33몰%)], 2,2'-메틸렌비스(4-메틸-6-t-부틸페놀) 0.4g, 트리에틸아민 0.8g를 플라스크내에 투입하여 110℃에서 8시간 반응을 계속하고, 고형분 산가가 70㎎KOH/g인 수지 A를 얻었다. GPC에 의해 측정한 폴리스티렌 환산의 중량평균분자량은 16,000이고, 분자량 분포(Mw/Mn)는 2.3이었다.A flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, and as the monomer dropping lot, 74.8 g (0.20 mol) of benzylmaleimide, 43.2 g (0.30 mol) of acrylic acid, and vinyltoluene 118.0 g (0.50 mol), 4 g of t-butylperoxy-2-ethylhexanoate and 40 g of propylene glycol monomethyl ether acetate (PGMEA) were added thereto, followed by stirring and mixing. As a chain transfer agent dropping tank, n-dodecanethiol 6g and PGMEA24g were added, and the thing mixed with stirring was prepared. Thereafter, 395 g of PGMEA was introduced into the flask, and the atmosphere in the flask was changed to nitrogen from air, and then the temperature of the flask was raised to 90 ° C. while stirring. Subsequently, dropping of the monomer and the chain transfer agent was started from the dropping lot. The dropwise addition was carried out for 2 h each while maintaining 90 ° C., and after 1 h, the temperature was raised to 110 ° C. and maintained for 3 h. Started. Next, 28.4 g glycidyl methacrylate [(0.10 mol), (33 mol% with respect to the carboxyl group of acrylic acid used for this reaction)], 2,2'- methylenebis (4-methyl-6-t-butylphenol ) 0.4 g and 0.8 g of triethylamine were charged into a flask, and the reaction was continued at 110 ° C. for 8 hours to obtain a resin A having a solid acid value of 70 mgKOH / g. The weight average molecular weight of polystyrene conversion measured by GPC was 16,000, and molecular weight distribution (Mw / Mn) was 2.3.
제조예 2: 화학식 15의 화합물의 합성 Preparation Example 2 Synthesis of Compound of Formula 15
3000ml 삼구 라운드 플라스크에 3',6'-디하이드록시스피로(플루오렌-9,9-잔텐)(3',6′'-dihydroxyspiro(fluorene-9,9-xantene) 364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 3,6-디하이드록시스피로(플루오렌-9,9-잔텐)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액(3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다.364.4 g of 3 ', 6'-dihydroxyspiro (fluorene-9,9-xantene) and 3-, 6'-dihydroxyspiro (fluorene-9,9-xantene) in a 3000 ml three-neck round flask 0.4159 g of bromide was mixed and 2359 g of epichlorohydrin was added and reacted by heating to 90 ° C. When the 3,6-dihydroxyspiro (fluorene-9,9-xanthene) was completely consumed by liquid chromatography, 50% NaOH aqueous solution (3 equiv) was slowly added by cooling to 30 DEG C. After analysis by liquid chromatography, epichlorohydrin was completely consumed, the mixture was extracted with dichloromethane and washed three times, and then the organic layer was dried over magnesium sulfate. Then dichloromethane was distilled under reduced pressure and recrystallized using a dichloromethane and methanol mixture ratio of 50:50.
이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 아크릴산 2.2당량을 혼합한 후 용매 프로피렌 글리콜 모노메틸 에테르 아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 15의 화합물을 얻었다.Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol, and 2.2 equivalent of acrylic acid were mixed, and then 24.89 g of solvent propylene glycol monomethyl ether acetate was added thereto. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 15.
[화학식 15][Formula 15]
Figure PCTKR2017013931-appb-I000024
Figure PCTKR2017013931-appb-I000024
제조예 3 : 화학식 16의 화합물의 합성Preparation Example 3 Synthesis of Compound of Formula 16
3000ml 삼구 라운드 플라스크에 3',6'-디하이드록시스피로(플루오렌-9,9-잔텐)(3',6′'-dihydroxyspiro(fluorene-9,9-xantene) 364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 3,6-디하이드록시스피로(플루오렌-9,9-잔텐)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액(3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다.364.4 g of 3 ', 6'-dihydroxyspiro (fluorene-9,9-xantene) and 3-, 6'-dihydroxyspiro (fluorene-9,9-xantene) in a 3000 ml three-neck round flask 0.4159 g of bromide was mixed and 2359 g of epichlorohydrin was added and reacted by heating to 90 ° C. When the 3,6-dihydroxyspiro (fluorene-9,9-xanthene) was completely consumed by liquid chromatography, 50% NaOH aqueous solution (3 equiv) was slowly added by cooling to 30 DEG C. After analysis by liquid chromatography, epichlorohydrin was completely consumed, the mixture was extracted with dichloromethane and washed three times, and then the organic layer was dried over magnesium sulfate. Then dichloromethane was distilled under reduced pressure and recrystallized using a dichloromethane and methanol mixture ratio of 50:50.
이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 메타아크릴산 2.2당량을 혼합한 후 용매 프로피렌 글리콜 모노메틸 에테르 아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 16의 화합물을 얻었다.Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol, and 2.2 equivalent of methacrylic acid were mixed, and then 24.89 g of a solvent propylene glycol monomethyl ether acetate was added thereto. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 16.
[화학식 16][Formula 16]
Figure PCTKR2017013931-appb-I000025
Figure PCTKR2017013931-appb-I000025
제조예 4 : 화학식 17의 화합물의 합성Preparation Example 4 Synthesis of Compound of Formula 17
3000ml 삼구 라운드 플라스크에 4,4'-(9H-잔텐-9,9-디일)디페놀(4,4'-(9H-xanthene-9,9-diyl)diphenol)364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 4,4'-(9H-잔텐-9,9-디일)디페놀 (4,4'-(9Hxanthene-9,9-diyl)diphenol)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액 (3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다. 이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 아크릴산 2.2당량을 혼합한 후 용매 프로필렌글리콜모노메틸에테르아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 17의 화합물을 얻었다.34.4 g of 4,4 '-(9H-xanthene-9,9-diyl) diphenol and 3-butylammonium bromide in a 3000 ml three-neck round flask 0.4159 g was mixed, 2359 g of epichlorohydrin was added, and the mixture was heated and reacted at 90 ° C. By liquid chromatography, 4,4 '-(9H-xanthene-9,9-diyl) diphenol (4,4'-(9Hxanthene-9,9-diyl) diphenol) is completely depleted and cooled to 30 ℃. 50% NaOH aqueous solution (3 equiv) was added slowly. After epichlorohydrin was completely exhausted by liquid chromatography, the mixture was extracted with dichloromethane and washed three times. The organic layer was dried over magnesium sulfate, and dichloromethane was distilled under reduced pressure, and the mixture ratio of dichloromethane and methanol was 50:50. Recrystallized. Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol and 2.2 equivalent of acrylic acid were mixed, and then 24.89 g of solvent propylene glycol monomethyl ether acetate was added thereto and mixed. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 17.
[화학식 17][Formula 17]
Figure PCTKR2017013931-appb-I000026
Figure PCTKR2017013931-appb-I000026
제조예 5 : 화학식 18의 화합물의 합성Preparation Example 5 Synthesis of Compound of Formula 18
3000ml 삼구 라운드 플라스크에 4,4'-(9H-잔텐-9,9-디일)디페놀(4,4'-(9H-xanthene-9,9-diyl)diphenol)364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 4,4'-(9H-잔텐-9,9-디일)디페놀 (4,4'-(9Hxanthene-9,9-diyl)diphenol)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액 (3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다. 이렇게 합성된 에폭시 화합물 1당량과 t-0.004당량, 2,6-디이소부틸페놀 0.001당량, 메타아크릴산 2.2당량을 혼합한 후 용매 프로필렌글리콜모노메틸에테르아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 1-2-2의 화합물을 얻었다.34.4 g of 4,4 '-(9H-xanthene-9,9-diyl) diphenol and 3-butylammonium bromide in a 3000 ml three-neck round flask 0.4159 g was mixed, 2359 g of epichlorohydrin was added, and the mixture was heated and reacted at 90 ° C. By liquid chromatography, 4,4 '-(9H-xanthene-9,9-diyl) diphenol (4,4'-(9Hxanthene-9,9-diyl) diphenol) is completely depleted and cooled to 30 ℃. 50% NaOH aqueous solution (3 equiv) was added slowly. After epichlorohydrin was completely exhausted by liquid chromatography, the mixture was extracted with dichloromethane and washed three times. The organic layer was dried over magnesium sulfate, and dichloromethane was distilled under reduced pressure, and the mixture ratio of dichloromethane and methanol was 50:50. Recrystallized. 1 equivalent of the epoxy compound thus synthesized, t-0.004 equivalent, 0.001 equivalent of 2,6-diisobutylphenol and 2.2 equivalent of methacrylic acid were mixed, and then 24.89 g of solvent propylene glycol monomethyl ether acetate was added thereto and mixed. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 1-2-2.
[화학식 18][Formula 18]
Figure PCTKR2017013931-appb-I000027
Figure PCTKR2017013931-appb-I000027
제조예 6 : 카도계 바인더 수지의 합성(A-1)Preparation Example 6 Synthesis of Cardo-Based Binder Resin (A-1)
제조예 2의 화학식 15의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 비페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다. 중량평균분자량: 3500After dissolving by adding 600 g of propylene glycol monomethyl ether acetate to 307.0 g of the compound of Formula 15 of Preparation Example 2, 78 g of biphenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually heated up at 110 to 115 ° C. The reaction was carried out for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo-based binder resin. Loss of anhydride was confirmed by IR spectrum. Weight average molecular weight: 3500
제조예 7 : 카도계 바인더 수지의 합성(A-2)Preparation Example 7 Synthesis of Cardo-Based Binder Resin (A-2)
제조예 3의 화학식 16의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 비페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다. 중량평균분자량: 3800After dissolving 600 g of propylene glycol monomethyl ether acetate in 307.0 g of the compound of Formula 16 in Preparation Example 3, 78 g of biphenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually heated up at 110 to 115 ° C. The reaction was carried out for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo-based binder resin. Loss of anhydride was confirmed by IR spectrum. Weight average molecular weight: 3800
제조예 8 : 카도계 바인더 수지의 합성(A-3)Preparation Example 8 Synthesis of Cardo-Based Binder Resin (A-3)
제조예 3의 화학식 17의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다. 중량평균분자량: 4500After dissolving by adding 600 g of propylene glycol monomethyl ether acetate to 307.0 g of the compound of Formula 17 of Preparation Example 3, 78 g of phenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually heated to 4 at 110 to 115 ° C. The reaction was carried out for a time. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo-based binder resin. Loss of anhydride was confirmed by IR spectrum. Weight average molecular weight: 4500
제조예 9 : 카도계 바인더 수지의 합성(A-4)Preparation Example 9 Synthesis of Cardo-Based Binder Resin (A-4)
제조예 3의 화학식 18의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다. 중량평균분자량: 4900After dissolving 600 g of propylene glycol monomethyl ether acetate in 307.0 g of the compound of Formula 18 in Preparation Example 3, 78 g of phenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually heated to 4 at 110 to 115 ° C. The reaction was carried out for a time. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo-based binder resin. Loss of anhydride was confirmed by IR spectrum. Weight average molecular weight: 4900
장치 : HLC-8120GPC(도소㈜ 제조)Equipment: HLC-8120GPC (manufactured by Tosoh Corporation)
칼럼 : TSK-GELG4000HXL + TSK-GELG2000HXL(직렬 접속)Column: TSK-GELG4000HXL + TSK-GELG2000HXL (Serial Connection)
칼럼 온도 : 40℃Column temperature: 40 ℃
이동상 용제 : 테트라히드로퓨란Mobile phase solvent: tetrahydrofuran
유속 : 1.0 ㎖/분Flow rate: 1.0 ml / min
주입량 : 50 ㎕Injection volume: 50 μl
검출기 : RIDetector: RI
측정 시료 농도 : 0.6 중량%(용제 = 테트라히드로퓨란)Sample concentration: 0.6 wt% (solvent = tetrahydrofuran)
교정용 표준 물질 : TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500(도소㈜ 제조)Calibration standard: TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500 (manufactured by Tosoh Corporation)
상기에서 얻어진 중량 평균 분자량 및 수평균 분자량의 비를 분자량 분포(Mw/Mn)로 하였다.The ratio of the weight average molecular weight and number average molecular weight obtained above was made into molecular weight distribution (Mw / Mn).
실시예Example
이하와 같이, 본 발명을 실시예에 기초하여 더욱 상세하게 설명하지만, 어디까지나 예시로써, 본 발명의 범위는 이들의 실시 형태에 한정되지 않는다. 본 발명의 범위는 특허청구 범위에 표시되었고, 더욱이 특허청구 범위 기록과 균등한 의미 및 범위내에의 모든 변경을 함유하고 있다. 또한, 이하에서 함유량을 나타내는 "%" 및 "부"는 특별히 언급하지 않는 한 질량 기준이다. As follows, the present invention will be described in more detail based on Examples. However, the scope of the present invention is not limited to these embodiments. The scope of the invention is indicated in the appended claims, and moreover contains all changes within the meaning and range equivalent to the scope of the claims. In addition, "%" and "part" which show content below are mass references | standards unless there is particular notice.
실시예 1 내지 5 및 비교예 1 내지 2: 청색 감광성 수지 조성물의 제조Examples 1 to 5 and Comparative Examples 1 to 2: Preparation of blue photosensitive resin composition
하기 표 1 내지 2의 조성에 따라, 실시예 1 내지 5 비교예 1 내지 2의 청색 감광성 수지 조성물을 제조하였다. (표 1은 산란입자를 나타내고, 표 2는 실시예 및 비교예의 조성물의 구성 및 함량을 나타낸다.)According to the composition of Tables 1 to 2, blue photosensitive resin compositions of Examples 1 to 5 Comparative Examples 1 and 2 were prepared. (Table 1 shows the scattering particles, Table 2 shows the composition and content of the compositions of Examples and Comparative Examples.)
[표 1]TABLE 1
Figure PCTKR2017013931-appb-I000028
Figure PCTKR2017013931-appb-I000028
[표 2]TABLE 2
(단위:중량%)(Unit: weight%)
Figure PCTKR2017013931-appb-I000029
Figure PCTKR2017013931-appb-I000029
0) 착색제 : 0) Colorant:
B-1 : Fastogen Blue EP-7S(DCI社) : C.I. 피그먼트 블루 15:6B-1: Fastogen Blue EP-7S (DCI): C.I. Pigment Blue 15: 6
B-2: Fastogen Blue 5424(DCI社) : C.I. 피그먼트 블루 15:4B-2: Fastogen Blue 5424 (DCI): C.I. Pigment Blue 15: 4
V-1 : Fastogen Super Violet 140V(DIC社) : C.I. 피그먼트 바이올렛 23V-1: Fastogen Super Violet 140V (DIC): C.I. Pigment Violet 23
1) 바인더 수지 : 1) Binder Resin:
A-1 : 제조예 6, A-1: Production Example 6,
A-2 : 제조예 7, A-2: Preparation Example 7,
A-3 : 제조예 8, A-3: Production Example 8,
A-4 : 제조예 9, A-4: Production Example 9,
A-5 : 모노(2-메타크릴로일옥시알킬)에스테르A-5: mono (2-methacryloyloxyalkyl) ester
2) 광중합성 화합물(C): 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)2) Photopolymerizable Compound (C): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
3) 화학식 1로 표시되는 티올 화합물:3) a thiol compound represented by Formula 1:
D-1: 트리메틸올프로판 트리스 (3-메르캅토 프로피오네이트)(Trimethylolpropane tris (3-mercaptopropionate); TMMP-20P)D-1: Trimethylolpropane tris (3-mercaptopropionate); TMMP-20P
Figure PCTKR2017013931-appb-I000030
Figure PCTKR2017013931-appb-I000030
D-2: 펜타에리스리톨테트라키스 (3-메르캅토프로피오네이트)(Pentaerythritoltetrakis (3-mercaptopropionate); PEMP)D-2: Pentaerythritoltetrakis (3-mercaptopropionate); PEMP
Figure PCTKR2017013931-appb-I000031
Figure PCTKR2017013931-appb-I000031
4) 광개시제(D): IRGACURE® 907 (BASF사 제)4) Photoinitiator (D): IRGACURE® 907 (manufactured by BASF)
Figure PCTKR2017013931-appb-I000032
Figure PCTKR2017013931-appb-I000032
5) 용제(E): 프로필렌글리콜모노메틸에테르아세테이트5) Solvent (E): Propylene glycol monomethyl ether acetate
컬러필터의 제조Manufacture of color filter
상기 실시예 1 내지 5 및 비교예 1 내지 2에서 제조된 청색 감광성 수지조성물을 이용하여 컬러필터를 제조하였다. 즉, 상기 각각의 청색 감광성 수지 조성물을 스핀 코팅법으로 유리 기판 위에 도포한 다음, 가열판 위에 놓고 100℃의 온도에서 3 분간 유지하여 박막을 형성시켰다. Color filters were prepared using the blue photosensitive resin compositions prepared in Examples 1 to 5 and Comparative Examples 1 and 2. That is, each of the blue photosensitive resin compositions was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film.
이어서 상기 박막 위에 가로x세로 20mm x 20mm 정사각형의 투과 패턴과 1 내지 100 ㎛의 라인/스페이스 패턴을 갖는 시험 포토마스크를 올려놓고 시험 포토마스크와의 간격을 100 ㎛로 하여 자외선을 조사하였다. Subsequently, a test photomask having a transmissive pattern of 20 mm x 20 mm square and a line / space pattern of 1 to 100 μm was placed on the thin film and irradiated with ultraviolet rays at a distance of 100 μm from the test photomask.
이때, 자외선광원은 우시오 덴끼㈜제의 초고압 수은 램프(상품명 USH-250D)를 이용하여 대기 분위기하에 200 mJ/㎠의 노광량(365 ㎚)으로 광조사하였으며, 특별한 광학 필터는 사용하지 않았다. At this time, the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmospheric atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
상기에서 자외선이 조사된 박막을 pH 10.5의 KOH 수용액 현상 용액에 80 초 동안 담궈 현상하였다. 이 박막이 입혀진 유리판을 증류수를 사용하여 세척한 다음, 질소 가스를 불어서 건조하고, 150℃의 가열 오븐에서 10 분 동안 가열하여 컬러필터 패턴을 제조하였다. 상기에서 제조된 컬러 패턴의 필름 두께는 5.0 ㎛이었다.The thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5. The thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern. The film thickness of the color pattern prepared above was 5.0 μm.
시험예 1. 내용제성Test Example 1. Solvent Resistance
상기 제작된 컬러필터를 N-메틸피롤리돈 용제에 30분간 침지시켜, 평가 전후의 색변화를 비교 평가하는 하였다. 구체적으로 내용제성은 상기 컬러필터 제조에서 제작된 기판의 색도와 투과율을 색도계 (올림푸스사 제조, OSP-200) 로 측정하였고 색좌표 측정이 완료된 기판을 N-메틸피롤리돈 용제에 30분간 침지시킨 후 색도와 투과율을 색도계 (올림푸스사 제조, OSP-200) 로 재 측정 하였다. △Eab는 CIE 1976 (L*, a*, b*)공간 표색계에 의한 아래의 채도공식에 의해 요구되는 값이다. (일본 색채학회편 신편 색채 과학핸드북(쇼와60년) p.266).The produced color filter was immersed in N-methylpyrrolidone solvent for 30 minutes, and the color change before and after evaluation was evaluated. Specifically, the solvent resistance was measured by using a colorimeter (Olympus, OSP-200) and chromaticity of the substrate produced in the color filter manufacturing and after immersing the substrate on which the color coordinate measurement is completed for 30 minutes in N-methylpyrrolidone solvent Color and transmittance were remeasured with a colorimeter (Olympus, OSP-200). ΔEab is a value required by the following saturation equation by the CIE 1976 (L *, a *, b *) spatial colorimeter. (Japanese Color Society New Colors Color Handbook (Showa 60) p.266).
이때 사용하게 되는 식은 L*, a*, b* 로 정의되는 3차원 색도계에서의 색변화를 나타내는 하기 수학식 (1)에 의해 계산되며, 색변화치가 작을수록 고신뢰성의 컬러필터 제조가 가능하다. 결과는 하기 표 3에 나타내었다. At this time, the equation to be used is calculated by the following Equation (1) representing the color change in the three-dimensional colorimeter defined by L *, a *, b *, the smaller the color change value, it is possible to manufacture a highly reliable color filter . The results are shown in Table 3 below.
수학식 (1): △Eab* = [(△L*)2+ (△a*)2+(△b*)2](1/2) Equation (1): ΔEab * = [(ΔL * ) 2 + (Δa * ) 2 + (Δb * ) 2 ] (1/2)
시험예 2. 밀착성Test Example 2 Adhesiveness
생성된 패턴을 광학현미경을 통하여 평가하였을 때 아래와 같은 패턴상에 뜯김 현상 정도로 평가하였다. 결과는 하기 표 3에 나타내었다. When the generated pattern was evaluated through an optical microscope, the degree of tearing was evaluated on the following pattern. The results are shown in Table 3 below.
○ : 패턴상 뜯김 없음○: No tearing on the pattern
△ : 패턴상 뜯김 1~3개△: 1 to 3 tears on the pattern
× : 패턴상 뜯김 4 이상×: 4 or more tears on the pattern
[표 3]TABLE 3
Figure PCTKR2017013931-appb-I000033
Figure PCTKR2017013931-appb-I000033
시험예 3. 미세 패턴 측정Test Example 3 Fine Pattern Measurement
상기 실시예 1 내지 5 및 비교예 1 내지 2에서 제조된 청색 감광성 수지를 사용하여 제조된 컬러필터 중 100 ㎛로 설계된 라인/스페이스 패턴 마스크를 통해 얻어진, 패턴의 크기를 OM장비(ECLIPSE LV100POL 니콘사)를 통해 패턴 크기를 측정하였다. The size of the pattern obtained through the line / space pattern mask designed to 100 μm of the color filters manufactured using the blue photosensitive resins prepared in Examples 1 to 5 and Comparative Examples 1 to 2 was measured by OM equipment (ECLIPSE LV100POL Nikon Corporation). The pattern size was measured through).
[표 4]TABLE 4
Figure PCTKR2017013931-appb-I000034
Figure PCTKR2017013931-appb-I000034
라인/스페이스 패턴 마스크의 설계값과 얻어진 미세 패턴의 측정값과의 차이가 20 ㎛ 이상이면, 미세화소의 구현이 어려워지고, 마이너스 값을 가지면 공정불량을 야기하는 임계 수치를 의미한다. When the difference between the design value of the line / space pattern mask and the measured value of the obtained fine pattern is 20 µm or more, it is difficult to implement the fine pixel, and a negative value means a threshold value that causes a process defect.
표 4에서 확인할 수 있는 바와 같이, 화학식 1로 표시되는 티올 화합물을 포함하지 않는 비교예 1 내지 2의 청색 감광성 수지 조성물에 비하여 화학식 1로 표시되는 티올 화합물을 포함하는 실시예 1 내지 5의 청색 감광성 수지 조성물은 미세패턴이 잘 형성 되었음을 확인할 수 있었다.As can be seen in Table 4, the blue photosensitive of Examples 1 to 5 containing the thiol compound represented by the formula (1) compared to the blue photosensitive resin composition of Comparative Examples 1 to 2 not containing the thiol compound represented by the formula (1) The resin composition was confirmed that the fine pattern was formed well.
본 발명의 청색 감광성 수지 조성물은 청색 감광성 수지 조성물에 화학식 1로 표시되는 티올 화합물을 포함함으로써, 상기 청색 감광성 수지 조성물은 경화막으로 형성 시 경화막으로 형성 시 뛰어난 내용제성, 밀착성 및 패턴 형성성(미세패턴 형성성)이 우수한 컬러필터, 특히 자발광 컬러필터 구현이 가능할 수 있다.The blue photosensitive resin composition of the present invention comprises a thiol compound represented by the formula (1) in the blue photosensitive resin composition, so that the blue photosensitive resin composition has excellent solvent resistance, adhesiveness and pattern forming property when formed into a cured film. It is possible to implement a color filter having excellent fine pattern formability, particularly a self-luminous color filter.

Claims (15)

  1. 산란입자, 하기 화학식 1로 표시되는 티올 화합물, 청색 착색제, 바인더 수지로써 카도계 바인더 수지, 광중합성 화합물, 광개시제, 및 용제를 포함하는 청색 감광성 수지 조성물.A blue photosensitive resin composition comprising a scattering particle, a thiol compound represented by the following Chemical Formula 1, a blue colorant, a binder resin, a cardo-based binder resin, a photopolymerizable compound, a photoinitiator, and a solvent.
    [화학식 1][Formula 1]
    Figure PCTKR2017013931-appb-I000035
    Figure PCTKR2017013931-appb-I000035
    (화학식 1에서, Z1은 메틸렌기 또는 탄소수 2 내지 10의 직쇄 또는 분지쇄인 알킬렌기 또는 알킬메틸렌기이고, Y는 단결합, -CO-, -O-CO- 또는 -NHCO-이고, n이 3 내지 10의 정수이고, X가 1개 또는 복수개의 에테르 결합을 가질 수 있는 탄소수 2 내지 70의 n가의 탄화수소기이거나, 또는 n이 3이며 X가 하기 화학식 2로 표시되는 3가의 기이다.)(Formula 1, Z 1 is a methylene group or a linear or branched alkylene group or alkylmethylene group having 2 to 10 carbon atoms, Y is a single bond, -CO-, -O-CO- or -NHCO-, n It is an integer of 3-10, X is a C2-C70 n-valent hydrocarbon group which may have one or more ether bonds, or n is 3 and X is a trivalent group represented by following General formula (2). )
    [화학식 2][Formula 2]
    Figure PCTKR2017013931-appb-I000036
    Figure PCTKR2017013931-appb-I000036
    (화학식 2에서, Z2, Z3 및 Z4는 서로 독립적으로 메틸렌기 또는 탄소수 2 내지 6의 알킬렌기이고, "*"는 결합손을 나타낸다.).(In Formula 2, Z 2 , Z 3 and Z 4 are each independently a methylene group or an alkylene group having 2 to 6 carbon atoms, and "*" represents a bond).
  2. 청구항 1에 있어서, 상기 화학식 1로 표시되는 티올 화합물은 화학식 5 내지 12으로 표시되는 화합물로 이루어진 군에서 선택된 1종 이상을 포함하는 것인, 청색 감광성 수지 조성물:The blue photosensitive resin composition of claim 1, wherein the thiol compound represented by Chemical Formula 1 includes at least one selected from the group consisting of compounds represented by Chemical Formulas 5 to 12:
    [화학식 5][Formula 5]
    Figure PCTKR2017013931-appb-I000037
    Figure PCTKR2017013931-appb-I000037
    [화학식 6][Formula 6]
    Figure PCTKR2017013931-appb-I000038
    Figure PCTKR2017013931-appb-I000038
    [화학식 7][Formula 7]
    Figure PCTKR2017013931-appb-I000039
    Figure PCTKR2017013931-appb-I000039
    [화학식 8][Formula 8]
    Figure PCTKR2017013931-appb-I000040
    Figure PCTKR2017013931-appb-I000040
    [화학식 9][Formula 9]
    Figure PCTKR2017013931-appb-I000041
    Figure PCTKR2017013931-appb-I000041
    [화학식 10][Formula 10]
    Figure PCTKR2017013931-appb-I000042
    Figure PCTKR2017013931-appb-I000042
    [화학식 11][Formula 11]
    Figure PCTKR2017013931-appb-I000043
    Figure PCTKR2017013931-appb-I000043
    [화학식 12][Formula 12]
    Figure PCTKR2017013931-appb-I000044
    .
    Figure PCTKR2017013931-appb-I000044
    .
  3. 청구항 1에 있어서, 상기 산란입자는 평균입경이 10 내지 1000 ㎚인 금속산화물을 포함하는, 청색 감광성 수지 조성물. The blue photosensitive resin composition of claim 1, wherein the scattering particles include a metal oxide having an average particle diameter of 10 to 1000 nm.
  4. 청구항 1에 있어서, 상기 산란입자는 Al2O3, SiO2, ZnO, ZrO2, BaTiO3, TiO2, Ta2O5, Ti3O5, ZnO, Nb2O3, SnO 및 MgO로 이루어진 군에서 선택되는 1종 이상을 포함하는 것인, 청색 감광성 수지 조성물.The method of claim 1, wherein the scattering particles are Al 2 O 3 , SiO 2 , ZnO, ZrO 2 , BaTiO 3 , TiO 2 , Ta 2 O 5 , Ti 3 O 5 , ZnO, Nb 2 O 3 , SnO and MgO Blue photosensitive resin composition containing 1 or more types selected from the group.
  5. 청구항 1에 있어서, 상기 청색 감광성 수지 조성물은 자색 착색제를 더 포함하는 것인, 청색 감광성 수지 조성물.The blue photosensitive resin composition according to claim 1, wherein the blue photosensitive resin composition further comprises a purple colorant.
  6. 청구항 1에 있어서, 상기 청색 착색제는 청색 안료 및 청색 염료 중 하나 이상을 포함하는, 청색 감광성 수지 조성물.The blue photosensitive resin composition of claim 1, wherein the blue colorant comprises at least one of a blue pigment and a blue dye.
  7. 청구항 1에 있어서, 상기 카도계 바인더 수지는 하기 화학식 13-1 및 화학식 13-2로 표시되는 화합물 중 하나 이상을 포함하는 것인, 청색 감광성 수지 조성물.The blue photosensitive resin composition of claim 1, wherein the cardo-based binder resin includes at least one of compounds represented by the following Chemical Formulas 13-1 and 13-2.
    [화학식 13-1] [Formula 13-1]
    Figure PCTKR2017013931-appb-I000045
    Figure PCTKR2017013931-appb-I000045
    [화학식 13-2][Formula 13-2]
    Figure PCTKR2017013931-appb-I000046
    Figure PCTKR2017013931-appb-I000046
    (상기 화학식 13-1 및 13-2 중에서, (In Formulas 13-1 and 13-2,
    R1, R2, R3 및 R4는 각각 독립적으로,
    Figure PCTKR2017013931-appb-I000047
    이며;
    R 1 , R 2 , R 3 and R 4 are each independently,
    Figure PCTKR2017013931-appb-I000047
    Is;
    X는 수소 원자, 탄소수 1 내지 5의 알킬기, 또는 수산기이고, R5는 수소 원자 또는 탄소수 1 내지 5의 알킬기이다.)X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group, and R 5 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.)
  8. 청구항 7에 있어서, 화학식 13-1로 표시되는 화합물은 화학식 15 또는 화학식 16으로 표시되는 화합물 중 어느 하나 이상이고, 화학식 13-2 로 표시되는 화합물은 화학식 17 또는 화학식 18로 표시되는 화합물 중 어느 하나 이상인, 청색 감광성 수지 조성물:The compound represented by Formula 13-1 is any one or more of compounds represented by Formula 15 or Formula 16, and the compound represented by Formula 13-2 is any one of the compounds represented by Formula 17 or Formula 18. Blue photosensitive resin composition which is more than:
    [화학식 15][Formula 15]
    Figure PCTKR2017013931-appb-I000048
    Figure PCTKR2017013931-appb-I000048
    [화학식 16][Formula 16]
    Figure PCTKR2017013931-appb-I000049
    Figure PCTKR2017013931-appb-I000049
    [화학식 17][Formula 17]
    Figure PCTKR2017013931-appb-I000050
    Figure PCTKR2017013931-appb-I000050
    [화학식 18][Formula 18]
    Figure PCTKR2017013931-appb-I000051
    .
    Figure PCTKR2017013931-appb-I000051
    .
  9. 청구항 1에 있어서, 상기 청색 감광성 수지 조성물은 바인더 수지로써 아크릴계 알칼리 가용성 수지를 더 포함하는 것인, 청색 감광성 수지 조성물. The blue photosensitive resin composition of claim 1, wherein the blue photosensitive resin composition further comprises an acrylic alkali-soluble resin as a binder resin.
  10. 청구항 1에 있어서, 상기 광개시제는 아세토페논계 화합물인 것을 특징으로 하는 청색 감광성 수지 조성물.The blue photosensitive resin composition according to claim 1, wherein the photoinitiator is an acetophenone-based compound.
  11. 청구항 10에 있어서, 상기 아세토페논계 화합물은 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸[4-(1-메틸비닐)페닐]프로판-1-온으로 이루어진 군에서 선택된 1종 이상인 청색 감광성 수지 조성물.The method of claim 10, wherein the acetophenone-based compound is diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2 -Hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1- On, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl [4- (1-methylvinyl) phenyl] propane-1- The blue photosensitive resin composition selected from the group consisting of ions.
  12. 청구항 1 내지 청구항 11 중 어느 한 항의 청색 감광성 수지 조성물로 이루어진 청색 패턴층을 포함하는 컬러필터.The color filter containing the blue pattern layer which consists of a blue photosensitive resin composition of any one of Claims 1-11.
  13. 청구항 12에 있어서,The method according to claim 12,
    상기 컬러필터는 적색 패턴층 및 녹색 패턴층으로 이루어진 군에서 선택되는 1 이상을 더 포함하며, The color filter further includes one or more selected from the group consisting of a red pattern layer and a green pattern layer,
    상기 적색 패턴층 또는 녹색 패턴층은 양자점을 포함하는 것인 컬러필터.The red pattern layer or the green pattern layer is a color filter comprising a quantum dot.
  14. 청구항 12에 있어서, 상기 컬러필터는 자발광 컬러필터인 것을 특징으로 하는 컬러필터. The color filter of claim 12, wherein the color filter is a self-luminous color filter.
  15. 청구항 12에 따른 컬러필터; 및 A color filter according to claim 12; And
    청색광을 방출하는 광원;을 포함하는 화상표시장치.And a light source emitting blue light.
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