WO2018181350A1 - Cured film–forming composition, alignment material, and phase difference material - Google Patents

Cured film–forming composition, alignment material, and phase difference material Download PDF

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Publication number
WO2018181350A1
WO2018181350A1 PCT/JP2018/012488 JP2018012488W WO2018181350A1 WO 2018181350 A1 WO2018181350 A1 WO 2018181350A1 JP 2018012488 W JP2018012488 W JP 2018012488W WO 2018181350 A1 WO2018181350 A1 WO 2018181350A1
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Prior art keywords
group
carbon atoms
component
cured film
mass
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PCT/JP2018/012488
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French (fr)
Japanese (ja)
Inventor
伊藤 潤
裕太 菅野
真 畑中
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日産化学株式会社
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Priority to JP2019509906A priority Critical patent/JP7152704B2/en
Priority to CN201880020993.5A priority patent/CN110461964B/en
Priority to KR1020197029831A priority patent/KR102555706B1/en
Publication of WO2018181350A1 publication Critical patent/WO2018181350A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D161/00Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
    • C09D161/20Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C09D161/26Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
    • C09D161/28Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation

Definitions

  • the present invention relates to a cured film forming composition that can be used as a liquid crystal aligning agent for photo-alignment for aligning liquid crystal molecules, an alignment material, and a retardation material.
  • the present invention is useful for producing a patterned retardation material used in a circularly polarized glasses type 3D display and a retardation material used in a circularly polarizing plate used as an antireflection film of an organic EL display.
  • the present invention relates to a cured film forming composition, an alignment material, and a retardation material that can be used as a liquid crystal alignment agent for photo-alignment.
  • a retardation material is usually disposed on a display element such as a liquid crystal panel.
  • a retardation material a plurality of two kinds of retardation regions having different retardation characteristics are regularly arranged, and a patterned retardation material is formed.
  • a retardation material patterned so as to arrange a plurality of retardation regions having different retardation characteristics is referred to as a patterned retardation material.
  • the patterned retardation material can be produced, for example, by optically patterning a retardation material made of a polymerizable liquid crystal as disclosed in Patent Document 1.
  • Optical patterning of a retardation material made of a polymerizable liquid crystal utilizes a photo-alignment technique known for forming an alignment material for a liquid crystal panel. That is, a coating film made of a photo-alignment material is provided on a substrate, and two types of polarized light having different polarization directions are irradiated on the coating film. Then, a photo-alignment film is obtained as an alignment material in which two types of liquid crystal alignment regions having different liquid crystal alignment control directions are formed.
  • a solution-like retardation material containing a polymerizable liquid crystal is applied on the photo-alignment film to realize the alignment of the polymerizable liquid crystal. Thereafter, the aligned polymerizable liquid crystal is cured to form a patterned retardation material.
  • the anti-reflective film of the organic EL display is composed of a linear polarizing plate and a quarter-wave retardation plate, converts external light directed to the panel surface of the image display panel into linear polarized light by the linear polarizing plate, and continues to the quarter wavelength. It is converted into circularly polarized light by the phase difference plate.
  • the extraneous light by the circularly polarized light is reflected by the surface of the image display panel or the like, but the rotation direction of the polarization plane is reversed during the reflection.
  • this reflected light is converted from the quarter-wave retardation plate into linearly polarized light in the direction shielded by the linear polarizing plate, and then shielded by the subsequent linear polarizing plate, As a result, the emission to the outside is remarkably suppressed.
  • Patent Document 2 discloses that this optical film has a reverse dispersion characteristic by configuring a 1/4 wavelength phase difference plate by combining a 1/2 wavelength plate and a 1/4 wavelength plate. Has been proposed. In the case of this method, an optical film can be formed with reverse dispersion characteristics using a liquid crystal material with positive dispersion characteristics in a wide wavelength band used for displaying a color image.
  • Patent Documents 3 and 4 As liquid crystal materials applicable to the retardation layer, those having reverse dispersion characteristics have been proposed (Patent Documents 3 and 4). According to the liquid crystal material having such a reverse dispersion characteristic, instead of forming a quarter-wave retardation plate by combining two half-wave plates and a quarter-wave plate to form a quarter-wave retardation plate. It is possible to achieve an optical film capable of ensuring a desired phase difference in a wide wavelength band with a simple configuration.
  • An alignment layer is used to align the liquid crystal.
  • a method for forming the alignment layer for example, a rubbing method or a photo-alignment method is known.
  • the photo-alignment method does not generate static electricity or dust, which is a problem of the rubbing method, and can control the alignment process quantitatively. It is useful in.
  • acrylic resins and polyimide resins having photodimerization sites such as cinnamoyl groups and chalcone groups in the side chain are known as usable photo-alignment materials. These resins have been reported to exhibit the ability to control the alignment of liquid crystals (hereinafter also referred to as liquid crystal alignment) when irradiated with polarized UV light (see Patent Documents 5 to 7).
  • the alignment layer is required to have solvent resistance in addition to the liquid crystal alignment ability.
  • the alignment layer may be exposed to heat or a solvent in the manufacturing process of the retardation material. When the alignment layer is exposed to a solvent, the liquid crystal alignment ability may be significantly reduced.
  • Patent Document 8 in order to obtain stable liquid crystal alignment ability, a liquid crystal aligning agent containing a polymer component having a structure capable of crosslinking reaction by light and a structure crosslinked by heat, and light.
  • a liquid crystal aligning agent containing a polymer component having a structure capable of crosslinking reaction and a compound having a structure crosslinked by heat has been proposed.
  • JP 2005-49865 A Japanese Patent Laid-Open No. 10-68816 U.S. Pat. No. 8,119,026 JP 2009-179563 A Japanese Patent No. 3611342 JP 2009-058584 A JP-T-2001-517719 Japanese Patent No. 4207430
  • the retardation material is formed by laminating a cured polymerizable liquid crystal layer on a photo-alignment film that is an alignment material. Therefore, it is necessary to develop an alignment material that can achieve both excellent liquid crystal alignment and solvent resistance.
  • an acrylic resin having a photodimerization site such as a cinnamoyl group and a chalcone group in the side chain cannot obtain sufficient characteristics when applied to the formation of a retardation material. It was issued.
  • a large amount of polarized UV exposure is required.
  • the polarized UV exposure amount is much larger than the polarized UV exposure amount (for example, about 30 mJ / cm 2) sufficient to align the liquid crystal for a normal liquid crystal panel.
  • the reason for increasing the amount of polarized UV exposure is that, in the case of retardation material formation, unlike liquid crystals for liquid crystal panels, polymerizable liquid crystals are used in the state of solution and applied onto the alignment material. Yes.
  • an alignment material is formed using an acrylic resin having a photodimerization site such as a cinnamoyl group in the side chain, and the polymerizable liquid crystal is to be aligned, the acrylic resin is subjected to photocrosslinking by a photodimerization reaction. . And it is necessary to irradiate polarized light with many exposure amounts until resistance to the polymerizable liquid crystal solution is developed. In order to align the liquid crystal of the liquid crystal panel, it is usually only necessary to dimerize only the surface of the photo-alignment alignment material.
  • an object of the present invention is to form a cured film that can be used as a liquid crystal aligning agent for photo-alignment for providing an alignment material that has excellent solvent resistance and can align a polymerizable liquid crystal with high sensitivity. It is to provide a composition.
  • the present inventors have (A) a reaction product of a monomer having an epoxy group and a specific cinnamic acid derivative, and (B) a cured film based on a crosslinking agent.
  • a forming composition it was found that a cured film (alignment material) having excellent solvent resistance and capable of aligning a polymerizable liquid crystal with high sensitivity could be formed, and the present invention was completed.
  • A a polymer obtained by using a monomer that is a reaction product of a monomer having an epoxy group and a cinnamic acid derivative represented by the following formula (1):
  • a 1 and A 2 each independently represent a hydrogen atom or a methyl group
  • R 1 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, or 1 to 6 carbon atoms.
  • Haloalkyl groups alkoxy groups having 1 to 6 carbon atoms, haloalkoxy groups having 1 to 6 carbon atoms, cycloalkyl groups having 3 to 8 carbon atoms, halocycloalkyl groups having 3 to 8 carbon atoms, carbon, carbon An alkenyl group having 2 to 6 atoms, a haloalkenyl group having 2 to 6 carbon atoms, a cycloalkenyl group having 3 to 8 carbon atoms, a halocycloalkenyl group having 3 to 8 carbon atoms, and 2 to 6 carbon atoms Alkynyl group, haloalkynyl group having 2 to 6 carbon atoms, alkoxy group having 1 to 6 carbon atoms, haloalkoxy group having 1 to 6 carbon atoms, (alkyl having 1 to 6 carbon atoms) carbonyl group, (carbon C with 1-6 atoms (Alkyl) carbonyl group, (alkoxy having 1 to 6 carbon
  • (B) A cured film forming composition containing a crosslinking agent.
  • a crosslinking agent As a 2nd viewpoint, it is related with the cured film formation composition as described in a 1st viewpoint whose crosslinking agent of (B) component is a crosslinking agent which has a methylol group or an alkoxymethyl group.
  • (C) described in the first aspect or the second aspect further containing a polymer having at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group.
  • the present invention relates to a cured film forming composition.
  • a 4th viewpoint it is related with the cured film formation composition as described in any one of the 1st viewpoint thru
  • the cured film formation according to any one of the first aspect to the fifth aspect containing 1 part by mass to 500 parts by mass of the component (B) based on 100 parts by mass of the component (A) Relates to the composition.
  • a seventh aspect from the third aspect to the sixth aspect, containing 1 part by mass to 400 parts by mass of the component (C) with respect to 100 parts by mass of the total amount of the crosslinking agent of the component (A) and the component (B). It is related with the cured film formation composition as described in any one.
  • the fourth aspect to the seventh aspect contain the component (D) in an amount of 0.01 to 20 parts by mass with respect to 100 parts by mass of the total amount of the crosslinking agents of the components (A) and (B)
  • the cured film forming composition according to any one of the aspects.
  • the fourth aspect to the eighth aspect containing the component (E) in an amount of 1 part by mass to 100 parts by mass with respect to 100 parts by mass of the total amount of the crosslinking agent of the component (A) and the component (B) It is related with the cured film formation composition as described in any one.
  • the present invention relates to a cured film obtained by curing the cured film-forming composition according to any one of the first to ninth aspects.
  • An eleventh aspect relates to an alignment material obtained by curing the cured film forming composition according to any one of the first to ninth aspects.
  • the present invention relates to a retardation material characterized by being formed using a cured film obtained from the cured film forming composition according to any one of the first aspect to the ninth aspect.
  • ADVANTAGE OF THE INVENTION According to this invention, it can provide the cured film which has the outstanding solvent resistance, can align a polymerizable liquid crystal with high sensitivity, and a cured film formation composition suitable for the formation.
  • ADVANTAGE OF THE INVENTION According to this invention, the phase difference material in which the orientation material excellent in liquid crystal orientation and light transmittance and high-precision optical patterning are possible can be provided.
  • the cured film forming composition of the present invention comprises (A) a polymer obtained by using a monomer that is a reaction product of a monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1), and (B ) Contains a crosslinking agent.
  • the cured film forming composition of the present invention further comprises a group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group as the component (C). It is also possible to contain a polymer having at least one group selected from Furthermore, a crosslinking catalyst can also be contained as (D) component.
  • component (E) at least one group A selected from the group consisting of one or more polymerizable groups, a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or at least reacts with the group A Compounds having one group can be contained. And as long as the effect of this invention is not impaired, another additive can be contained.
  • group A selected from the group consisting of one or more polymerizable groups, a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group
  • the component (A) contained in the cured film forming composition of the present invention is obtained by using a monomer that is a reaction product of a monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1). It is a coalescence.
  • ⁇ Monomer having an epoxy group Specific examples of the polymerizable unsaturated compound (monomer) having an epoxy group used for the reaction with the cinnamic acid derivative represented by the above formula (1) in the present invention include, for example, glycidyl acrylate, glycidyl methacrylate, ⁇ - Glycidyl ethyl acrylate, glycidyl ⁇ -n-propyl acrylate, glycidyl ⁇ -n-butyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, -6,7-acrylic acid Mention of epoxyheptyl, methacrylic acid-6,7-epoxyheptyl, ⁇ -ethylacrylic acid-6,7-epoxyheptyl, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p
  • cinnamic acid derivative having a carboxyl group examples include compounds represented by the above formula (1).
  • halogen atom in the above formula (1) examples include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
  • the notation “halo” also represents these halogen atoms.
  • the notation of an alkyl group having carbon atoms a to b in the above formula (1) represents a linear or branched hydrocarbon group having carbon atoms of a to b, such as a methyl group, an ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group, t-butyl group, n-pentyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylpropyl group, 1,1-dimethylpropyl group, 1,2-dimethylpropyl group, 2,2-dimethylpropyl group, n-hexyl group, 1-methylpentyl group, 2-methylpentyl group, 1,1 Specific examples include dimethylbutyl group, 1,3-dimethylbutyl group, heptyl group, octyl group, nonyl group, decyl
  • the notation of the haloalkyl group having carbon atoms a to b in the above formula (1) is a straight chain comprising a to b carbon atoms, in which a hydrogen atom bonded to a carbon atom is arbitrarily substituted with a halogen atom. Alternatively, it represents a branched hydrocarbon group, and when substituted with two or more halogen atoms, these halogen atoms may be the same as or different from each other.
  • fluoromethyl group chloromethyl group, bromomethyl group, iodomethyl group, difluoromethyl group, chlorofluoromethyl group, dichloromethyl group, bromofluoromethyl group, trifluoromethyl group, chlorodifluoromethyl group, dichlorofluoromethyl group, trichloromethyl Group, bromodifluoromethyl group, bromochlorofluoromethyl group, dibromofluoromethyl group, 2-fluoroethyl group, 2-chloroethyl group, 2-bromoethyl group, 2,2-difluoroethyl group, 2-chloro-2-fluoroethyl Group, 2,2-dichloroethyl group, 2-bromo-2-fluoroethyl group, 2,2,2-trifluoroethyl group, 2-chloro-2,2-difluoroethyl group, 2,2-dichloro-2 -Fl group, 2-chloro-2,2-
  • the notation of the cycloalkyl group having a carbon number of a to b in the above formula (1) represents a cyclic hydrocarbon group having a carbon number of a to b, a monocyclic ring having 3 to 6 members, A complex ring structure can be formed. Each ring may be optionally substituted with an alkyl group within the range of the specified number of carbon atoms.
  • cyclopropyl group 1-methylcyclopropyl group, 2-methylcyclopropyl group, 2,2-dimethylcyclopropyl group, 2,2,3,3-tetramethylcyclopropyl group, cyclobutyl group, cyclopentyl group, 2- Specific examples include methylcyclopentyl group, 3-methylcyclopentyl group, cyclohexyl group, 2-methylcyclohexyl group, 3-methylcyclohexyl group, 4-methylcyclohexyl group, bicyclo [2.2.1] heptan-2-yl group, and the like. Each of which is selected for each specified number of carbon atoms.
  • the description of the halocycloalkyl group having a carbon number of a to b is a cyclic group in which the hydrogen atom bonded to the carbon atom is optionally substituted with a halogen atom and having a carbon number of a to b. And can form a monocyclic or complex ring structure of 3 to 6 membered rings.
  • Each ring may be optionally substituted with an alkyl group within the range of the specified number of carbon atoms, and the substitution with a halogen atom may be a ring structure part, a side chain part, They may be both, and when they are substituted by two or more halogen atoms, the halogen atoms may be the same as or different from each other.
  • 2,2-difluorocyclopropyl group, 2,2-dichlorocyclopropyl group, 2,2-dibromocyclopropyl group, 2,2-difluoro-1-methylcyclopropyl group, 2,2-dichloro-1-methyl Cyclopropyl group, 2,2-dibromo-1-methylcyclopropyl group, 2,2,3,3-tetrafluorocyclobutyl group, 2- (trifluoromethyl) cyclohexyl group, 3- (trifluoromethyl) cyclohexyl group , 4- (trifluoromethyl) cyclohexyl group and the like are listed as specific examples, and each is selected within the range of the designated number of carbon atoms.
  • the alkenyl group having a carbon number of a to b is linear or branched having a carbon number of a to b, and one or two or more carbon atoms in the molecule.
  • Represents an unsaturated hydrocarbon group having a heavy bond for example, vinyl group, 1-propenyl group, 2-propenyl group, 1-methylethenyl group, 2-butenyl group, 1-methyl-2-propenyl group, 2-methyl-2 -Propenyl group, 2-pentenyl group, 2-methyl-2-butenyl group, 3-methyl-2-butenyl group, 2-ethyl-2-propenyl group, 1,1-dimethyl-2-propenyl group, 2-hexenyl Group, 2-methyl-2-pentenyl group, 2,4-dimethyl-2,6-heptadienyl group, 3,7-dimethyl-2,6-octadienyl group, etc. In a range of numbers Be-option.
  • the haloalkenyl group having a carbon number of a to b is a straight chain composed of a to b carbon atoms in which a hydrogen atom bonded to a carbon atom is optionally substituted with a halogen atom.
  • the halogen atoms may be the same as or different from each other.
  • the description of the cycloalkenyl group having a carbon number of a to b is a cyclic unsaturated hydrocarbon having 1 to 2 carbon atoms and having one or more double bonds.
  • Each ring may be optionally substituted with an alkyl group within a range of the specified number of carbon atoms, and the double bond may be in an endo- or exo- form.
  • 2-cyclopenten-1-yl group, 3-cyclopenten-1-yl group, 2-cyclohexen-1-yl group, 3-cyclohexen-1-yl group, bicyclo [2.2.1] -5-heptene- A 2-yl group or the like is given as a specific example, and is selected within the range of each designated number of carbon atoms.
  • a halocycloalkenyl group having a carbon number of a to b in the above formula (1) is a cyclic structure having a carbon number of a to b, wherein a hydrogen atom bonded to the carbon atom is optionally substituted with a halogen atom And an unsaturated hydrocarbon group having one or two or more double bonds, and can form a monocyclic or complex ring structure having 3 to 6 members.
  • Each ring may be optionally substituted with an alkyl group within a range of the specified number of carbon atoms, and the double bond may be in an endo- or exo- form.
  • substitution by a halogen atom may be a ring structure part, a side chain part or both of them, and when substituted by two or more halogen atoms, those halogen atoms May be the same as or different from each other.
  • a 2-chlorobicyclo [2.2.1] -5-hepten-2-yl group and the like can be mentioned as specific examples, and each group is selected within the range of the designated number of carbon atoms.
  • the alkynyl group having a carbon number of a to b is linear or branched having a carbon number of a to b and one or more triples in the molecule.
  • Specific examples include butynyl group, 1,1-dimethyl-2-propynyl group, 2-hexynyl group and the like, and each is selected within the range of the designated number of carbon atoms.
  • a haloalkynyl group having a carbon number of a to b is a straight chain composed of a to b carbon atoms in which a hydrogen atom bonded to the carbon atom is arbitrarily substituted with a halogen atom.
  • the halogen atoms may be the same as or different from each other.
  • Specific examples include 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3-chloro-2-propynyl group, 3-bromo-2-propynyl group, 3-iodo-2-propynyl group and the like. Each of which is selected for each specified number of carbon atoms.
  • the notation of an alkoxy group having carbon atoms a to b represents an alkyl-O— group having the above-mentioned meaning consisting of a to b carbon atoms, such as methoxy group, ethoxy group, n
  • alkyl-O— group having the above-mentioned meaning consisting of a to b carbon atoms, such as methoxy group, ethoxy group, n
  • Specific examples include -propyloxy group, i-propyloxy group, n-butyloxy group, i-butyloxy group, s-butyloxy group, t-butyloxy group, n-pentyloxy group, n-hexyloxy group, and the like.
  • Each selected range of carbon atoms is selected.
  • a haloalkoxy group having carbon atoms a to b in the above formula (1) represents a haloalkyl-O— group having the above-mentioned meaning consisting of a to b carbon atoms, such as a difluoromethoxy group, trifluoro Methoxy group, chlorodifluoromethoxy group, bromodifluoromethoxy group, 2-fluoroethoxy group, 2-chloroethoxy group, 2,2,2-trifluoroethoxy group, 1,1,2,2, -tetrafluoroethoxy group, 2-chloro-1,1,2-trifluoroethoxy group, 2-bromo-1,1,2-trifluoroethoxy group, pentafluoroethoxy group, 2,2-dichloro-1,1,2-trifluoroethoxy group 2,2,2-trichloro-1,1-difluoroethoxy group, 2-bromo-1,1,2,2-tetrafluoroethoxy group
  • the notation of (alkyl of carbon atoms a to b) carbonyl group represents an alkyl-C (O) -group having the above meaning consisting of a to b carbon atoms, for example acetyl
  • acetyl Specific examples include a group, propionyl group, butyryl group, isobutyryl group, valeryl group, isovaleryl group, 2-methylbutanoyl group, pivaloyl group, hexanoyl group, heptanoyl group, etc. Selected.
  • the notation of (haloalkyl having a carbon number of a to b) carbonyl group represents a haloalkyl-C (O) -group having the above-mentioned meaning consisting of a to b carbon atoms.
  • Acetyl group chloroacetyl group, difluoroacetyl group, dichloroacetyl group, trifluoroacetyl group, chlorodifluoroacetyl group, bromodifluoroacetyl group, trichloroacetyl group, pentafluoropropionyl group, heptafluorobutanoyl group, 3-chloro-2
  • Specific examples include, 2-dimethylpropanoyl group, and the like, and each is selected within the range of the designated number of carbon atoms.
  • the notation of (alkoxy having carbon atoms a to b) carbonyl group in the above formula (1) represents an alkyl-O—C (O) — group having the above-mentioned meaning consisting of a to b carbon atoms, Specific examples include methoxycarbonyl group, ethoxycarbonyl group, n-propyloxycarbonyl group, i-propyloxycarbonyl group, n-butoxycarbonyl group, i-butoxycarbonyl group, t-butoxycarbonyl group and the like. Selected within the specified number of carbon atoms.
  • the expression of (haloalkoxy having a carbon number of a to b) carbonyl group represents a haloalkyl-O—C (O) — group having the above meaning consisting of a carbon number of a to b.
  • Specific examples include 2-chloroethoxycarbonyl group, 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 2,2,2-trichloroethoxycarbonyl group, etc. Selected within the specified number of carbon atoms.
  • the notation of (alkylamino having a carbon number of a to b) carbonyl group is carbamoyl substituted with an alkyl group as defined above, wherein one of the hydrogen atoms is composed of a to b carbon atoms.
  • Specific examples are given, each selected in the range of the specified number of carbon atoms.
  • the notation of (haloalkylamino of carbon atoms a to b) carbonyl group in the above formula (1) is a carbamoyl group substituted by a haloalkyl group as defined above, wherein one of the hydrogen atoms is composed of a carbon atom of a to b
  • Specific examples include 2-fluoroethylcarbamoyl group, 2-chloroethylcarbamoyl group, 2,2-difluoroethylcarbamoyl group, 2,2,2-trifluoroethylcarbamoyl group, and the like. Selected in the range of the number of carbon atoms.
  • the notation of di (alkyl having a carbon number of ab) aminocarbonyl group is such that both hydrogen atoms may be the same or different from each other from ab.
  • a carbamoyl group substituted by an alkyl group as defined above for example, N, N-dimethylcarbamoyl group, N-ethyl-N-methylcarbamoyl group, N, N-diethylcarbamoyl group, N, N-di- Specific examples include n-propylcarbamoyl group, N, N-di-n-butylcarbamoyl group and the like, and each is selected within the range of the designated number of carbon atoms.
  • the substituents R 1 , R 4 , R 5 , R 6 and R 7 of the cinnamic acid derivative represented by the formula (1) are each independently a hydrogen atom, a halogen atom, or an alkyl having 1 to 6 carbon atoms.
  • the substituent R 1 is preferably a substituent other than a hydrogen atom in the above definition from the viewpoint of orientation sensitivity, and is preferably a halogen atom, an alkyl group having 1 to 6 carbon atoms, or 1 to 6 carbon atoms. And more preferably a substituent selected from the group consisting of a haloalkyl group, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, and a nitro group.
  • Examples of the divalent aromatic group of the substituent R 2 include 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 2,3,5, 6-tetrafluoro-1,4-phenylene group and the like; as the divalent alicyclic group for R 2 , for example, 1,2-cyclopropylene group, 1,3-cyclobutylene group, 1,4-cyclohexylene
  • the divalent heterocyclic group represented by R 2 includes, for example, a 1,4-pyridylene group, a 2,5-pyridylene group, a 1,4-furylene group, and the like; a divalent condensed cyclic group represented by R 2 Examples of the group include a 2,6-naphthylene group.
  • R 2 is preferably a 1,4-phenylene group.
  • Preferred examples of the compound represented by the above formula (1) include, for example, the following formulas (1-1) to (1-5): (In the above formulas, R 1 are each the same meaning as R 1 in the formula (1).) Of can be mentioned cinnamic acid derivatives represented by each.
  • the cinnamic acid derivative represented by the above formula (1) can be synthesized by appropriately combining organic chemistry methods.
  • the reaction product (monomer) of the monomer having an epoxy group and the specific cinnamic acid derivative used for the preparation of the polymer as the component (A) of the present invention is the monomer having the epoxy group as described above and the specific cinnamic It can be synthesized by reacting an acid derivative, preferably in the presence of a catalyst, preferably in a suitable organic solvent.
  • the use ratio of the cinnamic acid derivative used in the reaction is preferably 0.01 to 1.5 mol, more preferably 0.05 to 1 with respect to 1 mol of the epoxy group contained in the monomer having an epoxy group. .3 mole, more preferably 0.1 to 1.1 mole.
  • a compound known as a so-called curing accelerator that accelerates the reaction between an organic base or an epoxy compound and an acid anhydride can be used.
  • organic base examples include primary and secondary organic amines such as ethylamine, diethylamine, piperazine, piperidine, pyrrolidine, and pyrrole; triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, 4-dimethylaminopyridine, And tertiary organic amines such as diazabicycloundecene; quaternary organic amines such as tetramethylammonium hydroxide.
  • primary and secondary organic amines such as ethylamine, diethylamine, piperazine, piperidine, pyrrolidine, and pyrrole
  • triethylamine tri-n-propylamine
  • tri-n-butylamine pyridine
  • 4-dimethylaminopyridine 4-dimethylaminopyridine
  • tertiary organic amines such as diazabicycloundecene
  • quaternary organic amines such
  • tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine and 4-dimethylaminopyridine; quaternary organic amines such as tetramethylammonium hydroxide preferable.
  • the curing accelerator examples include tertiary amines such as benzyldimethylamine, 2,4,6-tris (dimethylaminomethyl) phenol, cyclohexyldimethylamine, and triethanolamine; 2-methylimidazole, 2-n-heptylimidazole 2-n-undecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1,2-dimethylimidazole, 2- Ethyl-4-methylimidazole, 1- (2-cyanoethyl) -2-methylimidazole, 1- (2-cyanoethyl) -2-n-undecylimidazole, 1- (2-cyanoethyl) -2-phenylimidazole, 1 -(2-Cyanoethyl) -2-ethyl 4-methylimidazole,
  • Benzyltriphenylphosphonium chloride tetra-n-butylphosphonium bromide, methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, n-butyltriphenylphosphonium bromide, tetraphenylphosphonium bromide , Ethyltriphenylphosphonium iodide, ethyltriphenylphosphonium acetate, tetra-n-butylphosphonium o, o-diethylphosphorodithionate, tetra-n-butylphosphonium benzotriazolate, tetra -N-butylphosphonium tetrafluoroborate, tetra-n-butylphosphonium tetraphenylborate, tetraphenylphosphonium tetraphenylborate Quaternary phosphonium salts such as salts; Dia
  • Organic metal compounds tetraethylammonium bromide, tetra-n-butylammonium bromide, quaternary ammonium salts such as tetraethylammonium chloride, tetra-n-butylammonium chloride; boron compounds such as boron trifluoride and triphenylborate; Metal halide compounds such as zinc and stannic chloride; high melting point dispersion type latent curing accelerators such as amine addition accelerators such as dicyandiamide and adducts of amine and epoxy resin; imidazole compounds, organophosphorus compounds and 4 Table of curing accelerators such as grade phosphonium salts Microcapsule-type latent curing accelerator coated with polymer; amine salt-type latent curing accelerator; high-temperature dissociation type thermal cationic polymerization type latent curing accelerator such as Lewis acid salt and Bronsted acid salt Can be mentioned.
  • quaternary ammonium salts such as tetraethylammonium bromide, tetra-n-butylammonium bromide, tetraethylammonium chloride, and tetra-n-butylammonium chloride are preferable.
  • the ratio of the catalyst used is preferably 100 parts by mass or less, more preferably 0.01 to 100 parts by mass, and further preferably 0.1 to 20 parts by mass with respect to 100 parts by mass of the monomer having an epoxy group. is there.
  • the organic solvent examples include hydrocarbon compounds, ether compounds, ester compounds, ketone compounds, amide compounds, alcohol compounds, and the like. Of these, ether compounds, ester compounds, ketone compounds, and alcohol compounds are preferred from the viewpoints of solubility of raw materials and products and ease of purification of the products.
  • the solvent is used in such an amount that the solid content concentration (the ratio of the mass of components other than the solvent in the reaction solution to the total mass of the solution) is preferably 0.1% by mass or more, more preferably 5 to 50% by mass. Is done.
  • the reaction temperature is preferably 0 to 200 ° C, more preferably 50 to 150 ° C.
  • the reaction time is preferably 0.1 to 50 hours, more preferably 0.5 to 20 hours.
  • a solution containing a monomer which is a reaction product of the monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1) is obtained.
  • This solution may be used as it is for the preparation of the polymer as the component (A), may be used for the preparation of the polymer as the component (A) after isolating the monomer contained in the solution.
  • the separated monomer may be purified and then used for the preparation of the polymer as component (A).
  • the polymer which is the component (A) used in the present invention is a polymer obtained by polymerizing a monomer which is a reaction product of the monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1).
  • the polymer of the component (A) is a copolymer of a monomer that is a reaction product of the monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1) and another polymerizable unsaturated compound. Can be.
  • polymerizable unsaturated compounds include (meth) acrylic acid alkyl ester, (meth) acrylic acid cyclic alkyl ester, methacrylic acid aryl ester, acrylic acid aryl ester, unsaturated dicarboxylic acid diester, bicyclounsaturated compounds, maleimide
  • examples include compounds, unsaturated aromatic compounds, conjugated diene compounds, unsaturated monocarboxylic acids, unsaturated dicarboxylic acids, unsaturated dicarboxylic acid anhydrides, and other polymerizable unsaturated compounds.
  • methacrylic acid alkyl esters such as hydroxymethyl methacrylate, 2-hydroxyethyl methacrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate, diethylene glycol monomethacrylate, 2,3-dihydroxypropyl methacrylate, 2- Methacryloxyethylglycoside, 4-hydroxyphenyl methacrylate, methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, sec-butyl methacrylate, 2-ethylhexyl methacrylate, isodecyl methacrylate, n-lauryl methacrylate, tridecyl methacrylate, n-stearyl methacrylate Etc .; alkyl acrylate esters such as methyl acrylate Over DOO, isopropyl acrylate and the like; as methacrylic acid cyclic alkyl esters such as cyclohexy
  • bicyclo unsaturated compounds include bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2.2.1]. Hept-2-ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxybicyclo [2.2.1] hept-2-ene, 5,6-dimethoxybicyclo [2.2 .1] Hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept-2-ene, 5- (2′-hydroxyethyl) bicyclo [2.2.1] hept-2- Ene, 5,6-dihydroxybicyclo [2.2.1] hept-2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept-2-ene, 5,6-di ( 2'-hydroxyethyl) bicyclo [2.2.1] hept-2 Ene, 5-hydroxy-5-methylbicyclo [2.2.1]
  • unsaturated dicarboxylic acid maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, etc .
  • unsaturated dicarboxylic acid anhydride each unsaturated dicarboxylic acid anhydride
  • polymerizable unsaturated compound other than the above Examples thereof include acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate and the like.
  • the copolymerization ratio of the monomer which is a reaction product of the monomer having an epoxy group and the cinnamic acid derivative represented by the above formula (1) in the polymer as the component (A) is preferably 30 mol% or more. More preferably, it is 50 mol% or more. From the viewpoint of orientation sensitivity, it is more preferably 70 mol% or more.
  • the synthesis of the polymer as component (A) can be carried out by a known radical polymerization method, preferably in a solvent and in the presence of a suitable polymerization initiator.
  • a solution containing the polymer as the component (A) is obtained.
  • This solution may be used as it is for the preparation of the liquid crystal aligning agent, may be used for the preparation of the liquid crystal aligning agent after isolating the polymer contained in the solution, or after the isolated polymer is purified. You may use for preparation of a liquid crystal aligning agent.
  • Component (B) in the cured film forming composition of the present invention is a crosslinking agent.
  • a crosslinking agent as component (B), a compound having at least two groups capable of forming a crosslink with the thermally crosslinkable functional group of component (A) is preferable.
  • a crosslinking having at least two methylol groups or alkoxymethyl groups is preferable.
  • the compound having these groups include methylol compounds such as alkoxymethylated glycoluril, alkoxymethylated benzoguanamine, and alkoxymethylated melamine.
  • alkoxymethylated glycoluril examples include, for example, 1,3,4,6-tetrakis (methoxymethyl) glycoluril, 1,3,4,6-tetrakis (butoxymethyl) glycoluril, 1,3,4 , 6-tetrakis (hydroxymethyl) glycoluril, 1,3-bis (hydroxymethyl) urea, 1,1,3,3-tetrakis (butoxymethyl) urea, 1,1,3,3-tetrakis (methoxymethyl) Examples include urea, 1,3-bis (hydroxymethyl) -4,5-dihydroxy-2-imidazolinone, and 1,3-bis (methoxymethyl) -4,5-dimethoxy-2-imidazolinone.
  • glycoluril compounds (trade names: Cymel (registered trademark) 1170, Powderlink (registered trademark) 1174) manufactured by Nippon Cytec Industries Co., Ltd. (former Mitsui Cytec Co., Ltd.), methylated urea resins (Trade name: UFR (registered trademark) 65), butylated urea resin (trade names: UFR (registered trademark) 300, U-VAN10S60, U-VAN10R, U-VAN11HV), DIC Corporation (formerly Dainippon Ink Chemical Co., Ltd.) Urea / formaldehyde resin (high condensation type, trade name: Beccamin (registered trademark) J-300S, P-955, N) manufactured by Kogyo Co., Ltd.).
  • alkoxymethylated benzoguanamine examples include tetramethoxymethylbenzoguanamine.
  • Commercially available products are made by Nippon Cytec Industries Co., Ltd. (formerly Mitsui Cytec Co., Ltd.) (trade name: Cymel (registered trademark) 1123), manufactured by Sanwa Chemical Co., Ltd. (product name: Nicarak (registered trademark) BX-) 4000, BX-37, BL-60, BX-55H) and the like.
  • alkoxymethylated melamine examples include, for example, hexamethoxymethylmelamine.
  • methoxymethyl type melamine compounds (trade names: Cymel (registered trademark) 300, 301, 303, 350) manufactured by Nippon Cytec Industries Co., Ltd. (former Mitsui Cytec Co., Ltd.), butoxymethyl type melamine Compound (trade name: My Coat (registered trademark) 506, 508), methoxymethyl type melamine compound (trade name: Nicalac (registered trademark) MW-30, MW-22, MW-) manufactured by Sanwa Chemical Co., Ltd. 11, MS-001, MX-002, MX-730, MX-750, MX-035), butoxymethyl type melamine compound (trade name: Nicalac (registered trademark) MX-45, MX-410) , MX-302).
  • a crosslinking agent a compound obtained by condensing a melamine compound, urea compound, glycoluril compound and benzoguanamine compound in which a hydrogen atom of an amino group is substituted with a methylol group or an alkoxymethyl group may be used.
  • the high molecular weight compound manufactured from the melamine compound and the benzoguanamine compound which are described in US Patent 6,323,310 is mentioned.
  • Examples of commercially available products of the melamine compound include trade name: Cymel (registered trademark) 303 and the like.
  • Examples of commercially available products of the benzoguanamine compound include product name: Cymel (registered trademark) 1123 (Nippon Cytec Industries, Ltd.). ) (Formerly Mitsui Cytec Co., Ltd.).
  • hydroxymethyl groups that is, methylol groups
  • alkoxymethyl groups such as N-hydroxymethylacrylamide, N-methoxymethylmethacrylamide, N-ethoxymethylacrylamide, N-butoxymethylmethacrylamide, etc.
  • Polymers produced using an acrylamide compound or a methacrylamide compound substituted with a can also be used.
  • Examples of such a polymer include poly (N-butoxymethylacrylamide), a copolymer of N-butoxymethylacrylamide and styrene, a copolymer of N-hydroxymethylmethacrylamide and methylmethacrylate, and N-ethoxymethyl. And a copolymer of methacrylamide and benzyl methacrylate, a copolymer of N-butoxymethylacrylamide, benzyl methacrylate and 2-hydroxypropyl methacrylate.
  • a polymer having an N-alkoxymethyl group and a polymerizable group containing a C ⁇ C double bond can also be used.
  • Examples of the polymerizable group containing a C ⁇ C double bond include an acryl group, a methacryl group, a vinyl group, an allyl group, and a maleimide group.
  • the method for obtaining the polymer as described above is not particularly limited.
  • an acrylic polymer having a specific functional group is generated in advance by a polymerization method such as radical polymerization.
  • a specific compound a compound having an unsaturated bond at the terminal
  • a polymerizable group containing can be introduced.
  • the specific functional group possessed by the acrylic polymer is a functional group such as a carboxyl group, a glycidyl group, a hydroxy group, an amino group having active hydrogen, a phenolic hydroxy group or an isocyanate group, or a plurality of types selected from these functional groups.
  • a functional group such as a carboxyl group, a glycidyl group, a hydroxy group, an amino group having active hydrogen, a phenolic hydroxy group or an isocyanate group, or a plurality of types selected from these functional groups.
  • the preferred combination of the specific functional group possessed by the acrylic polymer and the functional group possessed by the specific compound and involved in the reaction is a carboxyl group and an epoxy group, a hydroxy group and an isocyanate group, or a phenolic hydroxy group.
  • a more preferable combination is an epoxy group in a carboxy group and glycidyl methacrylate, or an isocyanate group in a hydroxy group and isocyanate ethyl methacrylate.
  • the weight average molecular weight (polystyrene equivalent value) of such a polymer is 1,000 to 500,000, preferably 2,000 to 200,000, more preferably 3,000 to 150,000. More preferably, it is 3,000 to 50,000.
  • cross-linking agents can be used alone or in combination of two or more.
  • the content of the crosslinking agent as the component (B) in the cured film forming composition of the present invention is preferably 1 part by mass to 500 parts by mass, more preferably based on 100 parts by mass of the polymer as the component (A). 5 parts by mass to 400 parts by mass.
  • content of a crosslinking agent is too small, the solvent tolerance of the cured film obtained from a cured film formation composition will fall, and liquid crystal orientation will fall. On the other hand, when the content is excessive, the liquid crystal orientation and storage stability may be lowered.
  • the cured film forming composition of the present invention may contain a polymer having at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group as the component (C). good.
  • polymer as the component (C) examples include acrylic polymer, polyamic acid, polyimide, polyvinyl alcohol, polyester, polyester polycarboxylic acid, polyether polyol, polyester polyol, polycarbonate polyol, polycaprolactone polyol, polyalkyleneimine, poly Examples include allylamines, celluloses (cellulose or derivatives thereof), polymers having a linear or branched structure such as phenol novolac resins and melamine formaldehyde resins, and cyclic polymers such as cyclodextrins.
  • the polymer as the component (C) preferably includes acrylic polymers, hydroxyalkylcyclodextrins, celluloses, polyether polyols, polyester polyols, polycarbonate polyols, and polycaprolactone polyols.
  • the acrylic polymer which is a preferred example of the polymer of component (C) is a polymer obtained by polymerizing a monomer having an unsaturated double bond such as acrylic acid, methacrylic acid, styrene, vinyl compound, etc. It may be a polymer obtained by polymerizing a monomer containing a monomer having a functional group or a mixture thereof, and is not particularly limited with respect to the skeleton of the main chain of the polymer constituting the acrylic polymer and the type of side chain.
  • the monomer having a specific functional group includes a monomer having a polyethylene glycol ester group, a monomer having a hydroxyalkyl ester group having 2 to 5 carbon atoms, a monomer having a phenolic hydroxy group, a monomer having a carboxyl group, and an amino group.
  • Examples of the monomer having a polyethylene glycol ester group described above include monoacrylate or monomethacrylate of H— (OCH 2 CH 2 ) n —OH.
  • the value of n is 2 to 50, preferably 2 to 10.
  • Examples of the monomer having a hydroxyalkyl ester group having 2 to 5 carbon atoms include 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl methacrylate, 2-hydroxypropyl acrylate, and 4-hydroxybutyl acrylate. 4-hydroxybutyl methacrylate.
  • Examples of the above-mentioned monomer having a phenolic hydroxy group include p-hydroxystyrene, m-hydroxystyrene, and o-hydroxystyrene.
  • Examples of the above-mentioned monomer having a carboxyl group include acrylic acid, methacrylic acid, and vinyl benzoic acid.
  • Examples of the monomer having an amino group described above include 2-aminoethyl acrylate, 2-aminoethyl methacrylate, aminopropyl acrylate, and aminopropyl methacrylate.
  • Examples of the monomer having an alkoxysilyl group include 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, vinyl, and the like. Examples include trimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, and allyltriethoxysilane.
  • the alkyl group having 1 to 12 carbon atoms and the alkoxy group having 1 to 12 carbon atoms in R 62 are groups having the corresponding number of carbon atoms among the alkyl groups and alkoxy groups exemplified above. Is mentioned.
  • Examples of the monomer having a group represented by the above formula (2) include monomers having groups represented by the following formulas [2-1] to [2-5].
  • a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group are used as long as the effects of the present invention are not impaired.
  • Monomers that do not have any of the groups represented can be used in combination.
  • Such monomers include acrylic ester compounds, methacrylic ester compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds and vinyl compounds.
  • acrylic ester compound examples include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthryl methyl acrylate, phenyl acrylate, 2,2,2-trifluoroethyl acrylate, tert-butyl.
  • methacrylic acid ester compound examples include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthryl methyl methacrylate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate, tert-butyl.
  • maleimide compounds include maleimide, N-methylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide.
  • styrene compound examples include styrene, methylstyrene, chlorostyrene, and bromostyrene.
  • vinyl compound examples include vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether.
  • the usage-amount of the monomer which has a specific functional group used in order to obtain the acrylic polymer which is an example of a component is based on the total amount of all the monomers used in order to obtain the acrylic polymer which is (C) component, It is preferable that it is 2 mol% or more. If the monomer having a specific functional group is too small, the solvent resistance of the resulting cured film tends to be insufficient.
  • the method to obtain the acrylic polymer which is an example of a component is not specifically limited,
  • the monomer containing the monomer which has a specific functional group, the monomer which does not have a specific functional group depending on necessity, a polymerization initiator, etc. Can be obtained by a polymerization reaction at a temperature of 50 ° C. to 110 ° C. in a solvent coexisting with.
  • the solvent used will not be specifically limited if it dissolves the monomer which has a specific functional group, the monomer which does not have the specific functional group used depending on necessity, a polymerization initiator, etc. Specific examples are described in the section of [Solvent] described later.
  • the acrylic polymer which is an example of the component (C) obtained by the above method is usually in a solution state dissolved in a solvent.
  • the acrylic polymer solution which is an example of the component (C) obtained by the above method, is poured into diethyl ether or water under stirring to cause reprecipitation, and the generated precipitate is filtered and washed. Under normal or reduced pressure, it can be dried at room temperature or by heating to obtain an acrylic polymer powder as an example of the component (C).
  • the polymerization initiator and unreacted monomer coexisting with the acrylic polymer which is an example of the component (C) can be removed, and as a result, the acrylic polymer which is an example of the purified component (C) Of powder is obtained. If sufficient purification cannot be achieved by a single operation, the obtained powder may be redissolved in a solvent and the above operation may be repeated.
  • the acrylic polymer which is a preferred example of the component (C) has a weight average molecular weight of preferably 3000 to 200000, more preferably 4000 to 150,000, and further preferably 5000 to 100,000. If the weight average molecular weight exceeds 200,000, the solvent solubility may decrease and handling may decrease. If the weight average molecular weight is less than 3,000, the curing may be insufficient during thermal curing. And solvent resistance may be reduced.
  • the weight average molecular weight is a value obtained by using gel as a standard material by gel permeation chromatography (GPC).
  • GPC gel permeation chromatography
  • polyether polyol which is a preferable example of the polymer of component (C)
  • polyethylene glycol, polypropylene glycol, propylene glycol, bisphenol A, triethylene glycol, polyhydric alcohol such as sorbitol, propylene oxide, polyethylene glycol, polypropylene The thing which added glycol etc. is mentioned.
  • polyether polyols include ADEKA Adeka Polyether P Series, G Series, EDP Series, BPX Series, FC Series, CM Series, NOF UNIOX (registered trademark) HC-40, HC-60, ST- 30E, ST-40E, G-450, G-750, Uniol (registered trademark) TG-330, TG-1000, TG-3000, TG-4000, HS-1600D, DA-400, DA-700, DB-400 Nonion (registered trademark) LT-221, ST-221, OT-221 and the like.
  • a diol such as ethylene glycol, propylene glycol, butylene glycol, polyethylene glycol or polypropylene glycol is reacted with a polyvalent carboxylic acid such as adipic acid, sebacic acid or isophthalic acid.
  • a polyvalent carboxylic acid such as adipic acid, sebacic acid or isophthalic acid.
  • polyester polyol examples include DIC polylite (registered trademark) OD-X-286, OD-X-102, OD-X-355, OD-X-2330, OD-X-240, OD-X-668, OD-X-2108, OD-X-2376, OD-X-2044, OD-X-688, OD-X-2068, OD-X-2547, OD-X-2420, OD-X-2523, OD- X-2555, OD-X-2560, Kuraray polyols P-510, P-1010, P-2010, P-3010, P-4010, P-5010, P-6010, F-510, F-1010, F -2010, F-3010, P-1011, P-2011, P-2013, P-2030, N-2010, PNNA-2016 and the like.
  • DIC polylite registered trademark
  • the polycaprolactone polyol which is a preferred example of the polymer of component (C), includes those obtained by ring-opening polymerization of ⁇ -caprolactone using a polyhydric alcohol such as trimethylolpropane or ethylene glycol as an initiator.
  • Specific examples of the polycaprolactone polyol include DIC polylite (registered trademark) OD-X-2155, OD-X-640, OD-X-2568, Daicel Plaxel (registered trademark) 205, L205AL, 205U, 208, 210, 212, L212AL, 220, 230, 240, 303, 305, 308, 312, 320, and the like.
  • polycarbonate polyol which is a preferable example of the polymer of component (C) include those obtained by reacting a polyhydric alcohol such as trimethylolpropane or ethylene glycol with diethyl carbonate, diphenyl carbonate, ethylene carbonate or the like.
  • a polyhydric alcohol such as trimethylolpropane or ethylene glycol
  • diethyl carbonate diethyl carbonate
  • diphenyl carbonate ethylene carbonate or the like.
  • Specific examples of the polycarbonate polyol include Placel (registered trademark) CD205, CD205PL, CD210, CD220 manufactured by Daicel, C-590, C-1050, C-2050, C-2090, C-3090 manufactured by Kuraray, and the like.
  • cellulose examples include hydroxyalkyl celluloses such as hydroxyethyl cellulose and hydroxypropyl cellulose, hydroxyalkylalkyl celluloses such as hydroxyethyl methyl cellulose, hydroxypropyl methyl cellulose, hydroxyethyl ethyl cellulose, and cellulose.
  • hydroxyalkyl celluloses such as hydroxyethyl cellulose and hydroxypropyl cellulose are preferable.
  • the cyclodextrin which is a preferred example of the polymer of component (C) includes cyclodextrins such as ⁇ -cyclodextrin, ⁇ -cyclodextrin and ⁇ -cyclodextrin, methyl- ⁇ -cyclodextrin, methyl- ⁇ -cyclodextrin and methyl- methylated cyclodextrins such as ⁇ -cyclodextrin, hydroxymethyl- ⁇ -cyclodextrin, hydroxymethyl- ⁇ -cyclodextrin, hydroxymethyl- ⁇ -cyclodextrin, 2-hydroxyethyl- ⁇ -cyclodextrin, 2-hydroxyethyl- ⁇ -cyclodextrin, 2-hydroxyethyl- ⁇ -cyclodextrin, 2-hydroxyethyl- ⁇ -cyclodextrin, 2-hydroxypropyl- ⁇ -cyclodextrin, 2-hydroxypropyl- ⁇ -cyclodextrin, 2-hydroxypro Pill- ⁇
  • a melamine formaldehyde resin includes a resin obtained by polycondensation of melamine and formaldehyde.
  • the methylol group generated during the polycondensation of melamine and formaldehyde is alkylated from the viewpoint of storage stability.
  • the melamine formaldehyde resin include a resin having a unit structure represented by the following formula.
  • R 21 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms
  • n is a natural number representing the number of repeating units.
  • the method for obtaining the melamine formaldehyde resin as component (C) is not particularly limited, but in general, melamine and formaldehyde are mixed, made weakly alkaline using sodium carbonate, ammonia, etc., and then heated at 60 ° C. to 100 ° C. Is synthesized. Further, the methylol group can be alkoxylated by reacting with alcohol.
  • the (C) component melamine formaldehyde resin preferably has a weight average molecular weight of 250 to 5000, more preferably 300 to 4000, and even more preferably 350 to 3500. If the weight average molecular weight exceeds 5,000, the solubility in the solvent may decrease and handling may decrease. If the weight average molecular weight is less than 250, the curing may be insufficient during thermal curing. In some cases, the effect of improving the solvent resistance is not sufficiently exhibited.
  • the melamine formaldehyde resin as the component (C) may be used in a liquid form or a solution form in which a purified liquid is redissolved in a solvent described later.
  • phenol novolak resin that is a preferred example of the specific polymer of the component (C) include phenol-formaldehyde polycondensate.
  • the polymer of component (C) may be used in the form of a powder or in the form of a solution obtained by re-dissolving the purified powder in a solvent described later.
  • the component (C) may be a mixture of a plurality of types of polymers exemplified as the component (C).
  • the content of the component (C) in the cured film forming composition of the present invention is preferably 400 parts by mass or less with respect to 100 parts by mass of the total amount of the polymer as the component (A) and the crosslinking agent of the component (B). More preferably, it is 10 to 380 parts by mass, and still more preferably 40 to 360 parts by mass. When the content of the component (C) is excessive, the liquid crystal orientation tends to be lowered.
  • the cured film forming composition of the present invention can further contain a crosslinking catalyst as the component (D) in addition to the components (A) and (B).
  • a crosslinking catalyst as component (D)
  • an acid or a thermal acid generator can be preferably used as the crosslinking catalyst as component (D).
  • This component (D) is effective in promoting the thermosetting reaction of the cured film forming composition of the present invention.
  • Specific examples of the component (D) include sulfonic acid group-containing compounds, hydrochloric acid or salts thereof as the acid.
  • the thermal acid generator is not particularly limited as long as it is a compound that thermally decomposes during heat treatment to generate an acid, that is, a compound that thermally decomposes at a temperature of 80 ° C. to 250 ° C. to generate an acid. .
  • the acid include, for example, hydrochloric acid or a salt thereof; methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, butanesulfonic acid, pentanesulfonic acid, octanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, camphor Sulfonic acid, trifluoromethanesulfonic acid, p-phenolsulfonic acid, 2-naphthalenesulfonic acid, mesitylenesulfonic acid, p-xylene-2-sulfonic acid, m-xylene-2-sulfonic acid, 4-ethylbenzenesulfonic acid, 1H, 1H, 2H, 2H-perfluorooctanesulfonic acid, perfluoro (2-ethoxyethane) sulfonic acid, pentafluoroethanesulfonic acid, non
  • Examples of the compound that generates an acid by heat include, for example, bis (tosyloxy) ethane, bis (tosyloxy) propane, bis (tosyloxy) butane, p-nitrobenzyl tosylate, o-nitrobenzyl tosylate, 1,2,3 -Phenylenetris (methyl sulfonate), p-toluenesulfonic acid pyridinium salt, p-toluenesulfonic acid morphonium salt, p-toluenesulfonic acid ethyl ester, p-toluenesulfonic acid propyl ester, p-toluenesulfonic acid butyl ester, p- Toluenesulfonic acid isobutyl ester, p-toluenesulfonic acid methyl ester, p-toluenesulfonic acid phenethyl ester,
  • the content of the component (D) in the cured film forming composition of the present invention is preferably 0.01 mass with respect to 100 mass parts of the total amount of the polymer as the component (A) and the crosslinking agent of the component (B). Part to 20 parts by weight, more preferably 0.1 part by weight to 15 parts by weight, still more preferably 0.5 part by weight to 10 parts by weight.
  • This invention can also contain the component (henceforth an adhesion improvement component) which improves the adhesiveness of the cured film formed as (E) component.
  • the polymerizable liquid crystal of the polymerizable liquid crystal is improved so that the adhesion between the alignment material and the polymerizable liquid crystal layer is improved.
  • the polymerizable functional group and the crosslinking reaction site of the alignment material can be linked by a covalent bond.
  • the retardation material of this embodiment formed by laminating a cured polymerizable liquid crystal on the alignment material of this embodiment can maintain strong adhesion even under conditions of high temperature and high humidity , such as peeling. High durability can be exhibited.
  • the component (E) reacts with one or more polymerizable groups and at least one group A selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or the group A.
  • group A selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or the group A.
  • Compounds having at least one group can be used.
  • monomers and polymers having a group selected from a hydroxy group and an N-alkoxymethyl group and a polymerizable group are preferred.
  • Such (E) component includes a compound having a hydroxy group and a (meth) acryl group, a compound having an N-alkoxymethyl group and a (meth) acryl group, an N-alkoxymethyl group and a (meth) acryl group.
  • the polymer etc. which have are mentioned. Specific examples are shown below.
  • the polyfunctional acrylate containing a hydroxyl group (henceforth a hydroxy group containing polyfunctional acrylate) can be mentioned.
  • the hydroxy group-containing polyfunctional acrylate that is an example of the component (E) include pentaerythritol triacrylate and dipentaerythritol pentaacrylate.
  • (E) As an example of a component, the compound which has one (meth) acryl group and one or more hydroxy groups is also mentioned. Preferred examples of such a compound having one (meth) acryl group and one or more hydroxy groups are given below.
  • the compound of (E) component is not limited to the following compound examples.
  • R 11 represents a hydrogen atom or a methyl group, and m represents an integer of 1 to 10.
  • the compound of component (E) includes a compound having at least one polymerizable group containing a C ⁇ C double bond and at least one N-alkoxymethyl group in one molecule.
  • Examples of the polymerizable group containing a C ⁇ C double bond include an acryl group, a methacryl group, a vinyl group, an allyl group, and a maleimide group.
  • N of N-alkoxymethyl group that is, nitrogen atom is adjacent to amide nitrogen atom, thioamide nitrogen atom, urea nitrogen atom, thiourea nitrogen atom, urethane nitrogen atom, nitrogen atom of nitrogen-containing heterocycle And a nitrogen atom bonded to. Therefore, the N-alkoxymethyl group includes an amide nitrogen atom, a thioamide nitrogen atom, a urea nitrogen atom, a thiourea nitrogen atom, a urethane nitrogen atom, and a nitrogen bonded to the adjacent position of the nitrogen atom of the nitrogen-containing heterocyclic ring. Examples include a structure in which an alkoxymethyl group is bonded to a nitrogen atom selected from atoms and the like.
  • any compound having the above-described group may be used, and a compound represented by the following formula (X1) is preferable.
  • R 31 represents a hydrogen atom or a methyl group
  • R 32 represents a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms
  • alkyl group examples include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, and 1-methyl-n.
  • Specific examples of the compound represented by the formula (X1) include N-hydroxymethyl (meth) acrylamide, N-methoxymethyl (meth) acrylamide, N-ethoxymethyl (meth) acrylamide, and N-butoxymethyl (meth).
  • Examples thereof include acrylamide compounds and methacrylamide compounds substituted with a hydroxymethyl group such as acrylamide or an alkoxymethyl group.
  • (Meth) acrylamide means both methacrylamide and acrylamide.
  • R 51 represents a hydrogen atom or a methyl group.
  • R 52 represents an alkyl group having 2 to 20 carbon atoms, a monovalent aliphatic cyclic group having 5 to 6 carbon atoms, or a monovalent aliphatic group containing an aliphatic ring having 5 to 6 carbon atoms, An ether bond may be included in the structure.
  • R 53 is a divalent group containing a linear or branched alkylene group having 2 to 20 carbon atoms, a divalent aliphatic ring group having 5 to 6 carbon atoms, or an aliphatic ring having 5 to 6 carbon atoms. And an ether bond may be included in the structure.
  • R 54 is a linear or branched divalent to 9-valent aliphatic group having 1 to 20 carbon atoms, a divalent to 9-valent aliphatic cyclic group having 5 to 6 carbon atoms, or a carbon number of 5 It represents a divalent to a 9-valent aliphatic group containing 6 to 6 aliphatic rings, and one methylene group or a plurality of non-adjacent methylene groups in these groups may be replaced with an ether bond.
  • Z is> NCOO-, or -OCON ⁇ (where "-" indicates that there is one bond, and ">” and “ ⁇ ” indicate that there are two bonds, and It represents an alkoxymethyl group (that is, —OR 52 group) is bonded to any one of the bonds.)
  • r is a natural number of 2 or more and 9 or less.
  • alkylene group having 2 to 20 carbon atoms in the definition of R 53 include a divalent group obtained by further removing one hydrogen atom from an alkyl group having 2 to 20 carbon atoms.
  • specific examples of the divalent to 9-valent aliphatic group having 1 to 20 carbon atoms in the definition of R 54 include further removing 1 to 8 hydrogen atoms from the alkyl group having 1 to 20 carbon atoms. Examples thereof include divalent to 9-valent groups.
  • the alkyl group having 1 carbon atom is a methyl group, and specific examples of the alkyl group having 2 to 20 carbon atoms include an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, and an i-butyl group.
  • R 53 is an ethylene group
  • R 54 is a hexylene group, from the viewpoint of availability of raw materials.
  • alkyl group having 1 to 20 carbon atoms in the definition of R 52 include a specific example of an alkyl group having 2 to 20 carbon atoms in the definition of R 53 and a methyl group. Of these, an alkyl group having 1 to 6 carbon atoms is preferable, and a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is particularly preferable.
  • R may be a natural number of 2 to 9, but a natural number of 2 to 6 is preferable.
  • the content of the component (E) in the cured film forming composition of the embodiment of the present invention is preferably 1 with respect to 100 parts by mass of the total amount of the polymer as the component (A) and the crosslinking agent of the component (B).
  • the amount is from 100 parts by weight to 100 parts by weight, and more preferably from 5 parts by weight to 70 parts by weight.
  • (E) By making content of a component into 1 mass part or more, sufficient adhesiveness can be provided to the cured film formed. However, when the amount is more than 100 parts by mass, the liquid crystal orientation tends to decrease.
  • the component (E) may be a mixture of a plurality of compounds of the component (E).
  • the cured film forming composition of the present invention is mainly used in a solution state dissolved in a solvent.
  • the solvent used in that case is only required to be able to dissolve the component (A), the component (B) and, if necessary, the component (C), the component (D), the component (E) and / or other additives described below.
  • Kinds and structures are not particularly limited.
  • the solvent include, for example, methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, 2-methyl-1-butanol, n-pentanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, Methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether, propylene glycol propyl ether, propylene glycol propyl ether acetate, Toluene, xylene, methyl Ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, 2-butanone
  • the cured film-forming composition of the present invention is used to produce an alignment material by forming a cured film on a resin film
  • solvents can be used alone or in combination of two or more.
  • the cured film-forming composition of the present invention is, as necessary, an adhesion improver, a silane coupling agent, a surfactant, a rheology modifier, a pigment, a dye, a storage stability, as long as the effects of the present invention are not impaired.
  • an adhesion improver e.g., a silane coupling agent, a surfactant, a rheology modifier, a pigment, a dye, a storage stability, as long as the effects of the present invention are not impaired.
  • Agents, antifoaming agents, antioxidants, and the like are examples of the like.
  • the cured film forming composition of the present invention contains (A) component polymer and (B) component cross-linking agent, and (C) component polymer, (D) cross-linking catalyst, and (E) component adhesion as desired. It is a composition that can contain an accelerator and further other additives as long as the effects of the present invention are not impaired. Usually, they are used in the form of a solution in which they are dissolved in a solvent.
  • Preferred examples of the cured film forming composition of the present invention are as follows. [1]: A cured film forming composition containing 1 part by mass to 500 parts by mass of the component (B) based on 100 parts by mass of the component (A) and the component (A).
  • component based on 100 parts by mass of component (A), 1 part by mass to 500 parts by mass of component (B), polymer of component (A) and crosslinking agent of component (B)
  • a cured film forming composition containing 1 to 400 parts by mass of component (C) and a solvent with respect to 100 parts by mass of the amount.
  • component based on 100 parts by mass of component (A), 1 part by mass to 500 parts by mass of component (B), the polymer as component (A) and the crosslinking agent for component (B) 1 to 400 parts by mass of component (C), 100 parts by mass of the polymer as component (A) and 100 parts by mass of the crosslinking agent of component (B)
  • a cured film forming composition containing 20 parts by mass of component (D) and a solvent.
  • component based on 100 parts by mass of component (A), 1 part by mass to 500 parts by mass of component (B), (A) component polymer and (B) component cross-linking agent 1 to 400 parts by mass of component (C), 100 parts by mass of the polymer as component (A) and 100 parts by mass of the crosslinking agent of component (B) 20 parts by mass of component (D), 1 part by mass to 100 parts by mass of component (E) with respect to 100 parts by mass of the total amount of the polymer as component (A) and the crosslinking agent of component (B), and solvent
  • a cured film-forming composition comprising:
  • the blending ratio, preparation method, and the like when the cured film forming composition of the present invention is used as a solution are described in detail below.
  • the ratio of the solid content in the cured film-forming composition of the present invention is not particularly limited as long as each component is uniformly dissolved in the solvent, but is 1% by mass to 60% by mass, preferably 2%.
  • the mass is from 50% by mass to 50% by mass, and more preferably from 2% by mass to 20% by mass.
  • solid content means what remove
  • the method for preparing the cured film forming composition of the present invention is not particularly limited.
  • a preparation method for example, a component (B), a component (C), a component (D), a component (E), and the like are mixed in a predetermined ratio in a solution of the component (A) dissolved in a solvent, and uniform. Examples thereof include a solution method, and a method in which other additives are further added and mixed as necessary at an appropriate stage of the preparation method.
  • a solution of a specific copolymer (polymer) obtained by a polymerization reaction in a solvent can be used as it is.
  • the (B) component, (C) component, (D) component, (E) component, etc. are added to the (A) component solution in the same manner as described above to obtain a uniform solution.
  • a solvent may be further added for the purpose of adjusting the concentration.
  • the solvent used in the production process of the component (A) and the solvent used for adjusting the concentration of the cured film forming composition may be the same or different.
  • the prepared cured film-forming composition solution is preferably used after being filtered using a filter having a pore size of about 0.2 ⁇ m.
  • a solution of the cured film forming composition of the present invention is applied to a substrate (for example, a silicon / silicon dioxide-coated substrate, a silicon nitride substrate, a substrate coated with a metal such as aluminum, molybdenum, or chromium, a glass substrate, a quartz substrate, or ITO.
  • a substrate for example, a silicon / silicon dioxide-coated substrate, a silicon nitride substrate, a substrate coated with a metal such as aluminum, molybdenum, or chromium, a glass substrate, a quartz substrate, or ITO.
  • Substrates) and film substrates eg, triacetyl cellulose (TAC) film, polycarbonate (PC) film, cycloolefin polymer (COP) film, cycloolefin copolymer (COC) film, polyethylene terephthalate (PET) film, acrylic film, polyethylene
  • TAC triacetyl cellulose
  • PC polycarbonate
  • COP cycloolefin polymer
  • COC cycloolefin copolymer
  • PET polyethylene terephthalate
  • acrylic film e.g., acrylic film, polyethylene
  • a resin film such as a film, etc., a bar coating, spin coating, flow coating, roll coating, slit coating, spin coating following slits, ink jet coating, printing, etc.
  • the cured film can be used as an alignment material as it is.
  • the heating and drying conditions may be such that the crosslinking reaction with the crosslinking agent proceeds to such an extent that the components of the cured film (alignment material) do not elute into the polymerizable liquid crystal solution applied thereon.
  • a heating temperature and a heating time appropriately selected from the range of 200 ° C. and a time of 0.4 minutes to 60 minutes are adopted.
  • the heating temperature and the heating time are preferably 70 to 160 ° C. and 0.5 to 10 minutes.
  • the thickness of the cured film (alignment material) formed using the curable composition of the present invention is, for example, 0.05 ⁇ m to 5 ⁇ m, and is appropriately determined in consideration of the level difference of the substrate to be used and optical and electrical properties. You can choose.
  • phase difference material such as a polymerizable liquid crystal solution having vertical alignment property is applied onto the alignment material.
  • the phase difference material can be formed as a layer which has optical anisotropy by hardening the phase difference material which became the orientation state as it is.
  • substrate which forms an orientation material is a film, it becomes useful as a phase difference film.
  • the alignment materials on both substrates are bonded to each other via a spacer, and then between the substrates.
  • a liquid crystal display element in which liquid crystal is injected to align the liquid crystal may be used.
  • the cured film forming composition of this invention can be used suitably for manufacture of various retardation materials (retardation film), a liquid crystal display element, etc.
  • the molecular weight of the acrylic copolymer in the polymerization example was as follows using a room temperature gel permeation chromatography (GPC) apparatus (GPC-101) manufactured by Shodex Co., Ltd. and columns (KD-803, KD-805) manufactured by Shodex Co. And measured.
  • the following number average molecular weight (hereinafter referred to as Mn) and weight average molecular weight (hereinafter referred to as Mw) were expressed in terms of polystyrene.
  • ⁇ Polymerization example 9> CIN1 10.0 g, HEMA 2.7 g, and AIBN 0.4 g as a polymerization catalyst were dissolved in 118.2 g of PM, and reacted for 20 hours under reflux with heating to give 10% by mass of an acrylic copolymer (PA-7). A solution containing was obtained. Mn of the obtained acrylic copolymer was 22,000 and Mw was 41,000.
  • Preparation of polymerizable liquid crystal solution ⁇ Preparation Example 1> Polymeric liquid crystal LC242 (manufactured by BASF) 29.0g, Irgacure 907 (manufactured by BASF) 0.9g as a polymerization initiator, BYK-361N (manufactured by BYK) 0.2g as a leveling agent, and MIBK as a solvent were added. A polymerizable liquid crystal solution (RM-1) having a solid content concentration of 30% by mass was obtained.
  • PA-1 acrylic copolymer
  • the alignment agent compositions of Examples 1 to 9 and Comparative Examples 1 to 3 were applied on a TAC film at a wet film thickness of 4 ⁇ m using a bar coater. Each was heated and dried in a heat circulation oven at a temperature of 110 ° C. for 60 seconds to form a cured film on the TAC film. Each cured film was irradiated vertically with 313 nm linearly polarized light at an exposure amount of 20 mJ / cm 2 to form an alignment material.
  • a polymerizable liquid crystal solution (RM-1) or (RM-2) was applied with a wet film thickness of 6 ⁇ m using a bar coater.
  • This coating film was dried on a hot plate at a temperature of 90 ° C. for 60 seconds and then exposed at 300 mJ / cm 2 to produce a retardation material.
  • the phase difference material on the prepared substrate is sandwiched between a pair of polarizing plates, the state of the phase difference characteristic in the phase difference material is observed, ⁇ if the phase difference is expressed without defects, and no phase difference is expressed The thing was described as "x" in the column of "orientation”. The evaluation results are summarized in Table 2 later.
  • the obtained retardation material showed good alignment even when any of the polymerizable liquid crystal solutions RM-1 and RM-2 was used.
  • Examples 20 to 22> [Evaluation of orientation]
  • the alignment agent compositions of Examples 1 to 2 and 19 were applied on a TAC film at a wet film thickness of 4 ⁇ m using a bar coater. Each was heated and dried in a thermal circulation oven at a temperature of 90 ° C. for 60 seconds to form a cured film on the TAC film.
  • the linearly polarized light of 313nm in the cured film was irradiated perpendicularly with an exposure amount of 5 mJ / cm 2 or 20 mJ / cm 2, to form an alignment material.
  • a polymerizable liquid crystal solution (RM-1) was applied with a wet film thickness of 6 ⁇ m using a bar coater. 60 seconds after drying this coating temperature 90 ° C. on a hot plate, exposed with 300 mJ / cm 2, to produce a phase difference member.
  • the phase difference material on the prepared substrate is sandwiched between a pair of polarizing plates, the state of the phase difference characteristic in the phase difference material is observed, ⁇ if the phase difference is expressed without defects, and no phase difference is expressed The thing was described as "x" in the column of "orientation”. The evaluation results are summarized in Table 3 later.
  • the cured film forming composition according to the present invention is very useful as a material for forming a liquid crystal alignment film of a liquid crystal display element and an alignment material for forming an optically anisotropic film provided inside or outside the liquid crystal display element.
  • it is suitable as a material for a phase difference material of a circularly polarizing plate used as an antireflection film for an IPS-LCD or an organic EL display.

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Abstract

[Problem] To provide a cured film–forming composition for forming a cured film which exhibits excellent liquid crystal alignment properties and light transmissivity when used as an alignment material with a layer of a polymerizable liquid crystal disposed thereupon. [Solution] A cured film–forming composition containing (A) a polymer obtained using a monomer, the monomer being a reaction product of a monomer having an epoxy group and a cinnamic acid derivative represented by formula (1), and (B) a crosslinking agent; an alignment material characterized by being obtained using the composition; and a phase difference material characterized by being obtained using the composition. (In formula (1): A1 and A2 represent a hydrogen atom or a methyl group; R1 represents a hydrogen atom, a halogen atom, or the like; R2 is a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent fused ring group; R3 is a single bond, an oxygen atom, or the like; R4 to R7 are each independently a hydrogen atom, a halogen atom, or the like; and n is an integer from 0 to 3.)

Description

硬化膜形成組成物、配向材および位相差材Cured film forming composition, alignment material and retardation material
 本発明は液晶分子を配向させる光配向用液晶配向剤として用いることができる硬化膜形成組成物、配向材および位相差材に関する。特に本発明は、円偏光メガネ方式の3Dディスプレイに用いられるパターニングされた位相差材や、有機ELディスプレイの反射防止膜として使用される円偏光板に用いられる位相差材を作製するのに有用な光配向用液晶配向剤として用いることができる硬化膜形成組成物、配向材および位相差材に関する。 The present invention relates to a cured film forming composition that can be used as a liquid crystal aligning agent for photo-alignment for aligning liquid crystal molecules, an alignment material, and a retardation material. In particular, the present invention is useful for producing a patterned retardation material used in a circularly polarized glasses type 3D display and a retardation material used in a circularly polarizing plate used as an antireflection film of an organic EL display. The present invention relates to a cured film forming composition, an alignment material, and a retardation material that can be used as a liquid crystal alignment agent for photo-alignment.
 円偏光メガネ方式の3Dディスプレイの場合、液晶パネル等の画像を形成する表示素子の上に位相差材が配置されるのが通常である。この位相差材は、位相差特性の異なる2種類の位相差領域がそれぞれ複数、規則的に配置されており、パターニングされた位相差材を構成している。尚、以下、本明細書においては、このような位相差特性の異なる複数の位相差領域を配置するようにパターン化された位相差材をパターン化位相差材と称する。 In the case of a circularly polarized glasses type 3D display, a retardation material is usually disposed on a display element such as a liquid crystal panel. In this retardation material, a plurality of two kinds of retardation regions having different retardation characteristics are regularly arranged, and a patterned retardation material is formed. Hereinafter, in the present specification, a retardation material patterned so as to arrange a plurality of retardation regions having different retardation characteristics is referred to as a patterned retardation material.
 パターン化位相差材は、例えば、特許文献1に開示されるように、重合性液晶からなる位相差材料を光学パターニングすることで作製することができる。重合性液晶からなる位相差材料の光学パターニングは、液晶パネルの配向材形成で知られた光配向技術を利用する。すなわち、基板上に光配向性の材料からなる塗膜を設け、これに偏光方向が異なる2種類の偏光を照射する。そして、液晶の配向制御方向の異なる2種類の液晶配向領域が形成された配向材として光配向膜を得る。この光配向膜の上に重合性液晶を含む溶液状の位相差材料を塗布し、重合性液晶の配向を実現する。その後、配向された重合性液晶を硬化してパターン化位相差材を形成する。 The patterned retardation material can be produced, for example, by optically patterning a retardation material made of a polymerizable liquid crystal as disclosed in Patent Document 1. Optical patterning of a retardation material made of a polymerizable liquid crystal utilizes a photo-alignment technique known for forming an alignment material for a liquid crystal panel. That is, a coating film made of a photo-alignment material is provided on a substrate, and two types of polarized light having different polarization directions are irradiated on the coating film. Then, a photo-alignment film is obtained as an alignment material in which two types of liquid crystal alignment regions having different liquid crystal alignment control directions are formed. A solution-like retardation material containing a polymerizable liquid crystal is applied on the photo-alignment film to realize the alignment of the polymerizable liquid crystal. Thereafter, the aligned polymerizable liquid crystal is cured to form a patterned retardation material.
 有機ELディスプレイの反射防止膜は、直線偏光板、1/4波長位相差板により構成され、画像表示パネルのパネル面に向かう外来光を直線偏光板により直線偏光に変換し、続く1/4波長位相差板により円偏光に変換する。ここでこの円偏光による外来光は、画像表示パネルの表面等で反射するものの、この反射の際に偏光面の回転方向が逆転する。その結果、この反射光は、到来時とは逆に、1/4波長位相差板より、直線偏光板により遮光される方向の直線偏光に変換された後、続く直線偏光板により遮光され、その結果、外部への出射が著しく抑制される。 The anti-reflective film of the organic EL display is composed of a linear polarizing plate and a quarter-wave retardation plate, converts external light directed to the panel surface of the image display panel into linear polarized light by the linear polarizing plate, and continues to the quarter wavelength. It is converted into circularly polarized light by the phase difference plate. Here, the extraneous light by the circularly polarized light is reflected by the surface of the image display panel or the like, but the rotation direction of the polarization plane is reversed during the reflection. As a result, contrary to the arrival time, this reflected light is converted from the quarter-wave retardation plate into linearly polarized light in the direction shielded by the linear polarizing plate, and then shielded by the subsequent linear polarizing plate, As a result, the emission to the outside is remarkably suppressed.
 この1/4波長位相差板に関して、特許文献2には、1/2波長板、1/4波長板を組み合わせて1/4波長位相差板を構成することにより、この光学フィルムを逆分散特性により構成する方法が提案されている。この方法の場合、カラー画像の表示に供する広い波長帯域において、正の分散特性による液晶材料を使用して逆分散特性により光学フィルムを構成することができる。 Regarding this 1/4 wavelength phase difference plate, Patent Document 2 discloses that this optical film has a reverse dispersion characteristic by configuring a 1/4 wavelength phase difference plate by combining a 1/2 wavelength plate and a 1/4 wavelength plate. Has been proposed. In the case of this method, an optical film can be formed with reverse dispersion characteristics using a liquid crystal material with positive dispersion characteristics in a wide wavelength band used for displaying a color image.
 また近年、この位相差層に適用可能な液晶材料として、逆分散特性を備えるものが提案されている(特許文献3、4)。このような逆分散特性の液晶材料によれば、1/2波長板、1/4波長板を組み合わせて2層の位相差層により1/4波長位相差板を構成する代わりに、位相差層を単層により構成して逆分散特性を確保することができ、これにより広い波長帯域において所望の位相差を確保することが可能な光学フィルムを簡易な構成により実現することができる。 In recent years, as liquid crystal materials applicable to the retardation layer, those having reverse dispersion characteristics have been proposed (Patent Documents 3 and 4). According to the liquid crystal material having such a reverse dispersion characteristic, instead of forming a quarter-wave retardation plate by combining two half-wave plates and a quarter-wave plate to form a quarter-wave retardation plate. It is possible to achieve an optical film capable of ensuring a desired phase difference in a wide wavelength band with a simple configuration.
 液晶を配向させるためには配向層が用いられる。配向層の形成方法としては、例えばラビング法や光配向法が知られており、光配向法はラビング法の問題点である静電気や塵の発生がなく、定量的な配向処理の制御ができる点で有用である。 An alignment layer is used to align the liquid crystal. As a method for forming the alignment layer, for example, a rubbing method or a photo-alignment method is known. The photo-alignment method does not generate static electricity or dust, which is a problem of the rubbing method, and can control the alignment process quantitatively. It is useful in.
 光配向法を用いた配向材形成では、利用可能な光配向性の材料として、側鎖にシンナモイル基およびカルコン基等の光二量化部位を有するアクリル樹脂やポリイミド樹脂等が知られている。これらの樹脂は、偏光UV照射することにより、液晶の配向を制御する性能(以下、液晶配向性とも言う。)を示すことが報告されている(特許文献5~特許文献7を参照。)。 In the formation of alignment materials using the photo-alignment method, acrylic resins and polyimide resins having photodimerization sites such as cinnamoyl groups and chalcone groups in the side chain are known as usable photo-alignment materials. These resins have been reported to exhibit the ability to control the alignment of liquid crystals (hereinafter also referred to as liquid crystal alignment) when irradiated with polarized UV light (see Patent Documents 5 to 7).
 また、配向層には、液晶配向能の他、耐溶剤性が要求される。例えば、配向層が、位相差材の製造過程にて熱や溶剤にさらさる場合がある。配向層が溶剤にさらされると、液晶配向能が著しく低下するおそれがある。 Also, the alignment layer is required to have solvent resistance in addition to the liquid crystal alignment ability. For example, the alignment layer may be exposed to heat or a solvent in the manufacturing process of the retardation material. When the alignment layer is exposed to a solvent, the liquid crystal alignment ability may be significantly reduced.
 そこで、例えば特許文献8には、安定した液晶配向能を得るために、光により架橋反応の可能な構造と熱によって架橋する構造とを有する重合体成分を含有する液晶配向剤、および、光により架橋反応の可能な構造を有する重合体成分と熱によって架橋する構造を有する化合物とを含有する液晶配向剤が提案されている。 Therefore, for example, in Patent Document 8, in order to obtain stable liquid crystal alignment ability, a liquid crystal aligning agent containing a polymer component having a structure capable of crosslinking reaction by light and a structure crosslinked by heat, and light. A liquid crystal aligning agent containing a polymer component having a structure capable of crosslinking reaction and a compound having a structure crosslinked by heat has been proposed.
特開2005-49865号公報JP 2005-49865 A 特開平10-68816号公報Japanese Patent Laid-Open No. 10-68816 米国特許第8119026号明細書U.S. Pat. No. 8,119,026 特開2009-179563号公報JP 2009-179563 A 特許第3611342号公報Japanese Patent No. 3611342 特開2009-058584号公報JP 2009-058584 A 特表2001-517719号公報JP-T-2001-517719 特許第4207430号公報Japanese Patent No. 4207430
 以上のように、位相差材は、配向材である光配向膜の上に、硬化された重合性液晶の層を積層して構成される。そのため、優れた液晶配向性と耐溶剤性を両立することができる配向材の開発が必要とされている。 As described above, the retardation material is formed by laminating a cured polymerizable liquid crystal layer on a photo-alignment film that is an alignment material. Therefore, it is necessary to develop an alignment material that can achieve both excellent liquid crystal alignment and solvent resistance.
 しかしながら、本発明者の検討によれば、側鎖にシンナモイル基およびカルコン基等の光二量化部位を有するアクリル樹脂は、位相差材の形成に適用した場合に充分な特性が得られないことが見出された。特に、これらの樹脂に偏光UVを照射して配向材を形成し、その配向材を用いて重合性液晶からなる位相差材を作製するためには、多くの偏光UV露光量が必要となる。その偏光UV露光量は、通常の液晶パネル用の液晶を配向させるのに十分な偏光UV露光量(例えば、30mJ/cm2程度。)より格段に多くなる。 However, according to the study of the present inventor, it has been found that an acrylic resin having a photodimerization site such as a cinnamoyl group and a chalcone group in the side chain cannot obtain sufficient characteristics when applied to the formation of a retardation material. It was issued. In particular, in order to form an alignment material by irradiating polarized UV to these resins and to produce a retardation material composed of a polymerizable liquid crystal using the alignment material, a large amount of polarized UV exposure is required. The polarized UV exposure amount is much larger than the polarized UV exposure amount (for example, about 30 mJ / cm 2) sufficient to align the liquid crystal for a normal liquid crystal panel.
 偏光UV露光量が多くなる理由としては、位相差材形成の場合、液晶パネル用の液晶と異なり、重合性液晶が溶液の状態で用いられ、配向材の上に塗布されることが挙げられている。 The reason for increasing the amount of polarized UV exposure is that, in the case of retardation material formation, unlike liquid crystals for liquid crystal panels, polymerizable liquid crystals are used in the state of solution and applied onto the alignment material. Yes.
 側鎖にシンナモイル基等の光二量化部位を有するアクリル樹脂等を用いて配向材を形成し、重合性液晶を配向させようとする場合、そのアクリル樹脂等においては、光二量化反応による光架橋を行う。そして、重合性液晶溶液に対する耐性が発現するまで、多くの露光量の偏光照射を行う必要がある。液晶パネルの液晶を配向させるためには、通常、光配向性の配向材の表面のみを二量化反応すればよい。しかし、上述のアクリル樹脂等の従来材料を用いて配向材に溶剤耐性を発現させようとすると、配向材の内部まで反応をさせる必要があり、より多くの露光量が必要となる。その結果、従来材料の配向感度は非常に小さくなってしまうという問題があった。 When an alignment material is formed using an acrylic resin having a photodimerization site such as a cinnamoyl group in the side chain, and the polymerizable liquid crystal is to be aligned, the acrylic resin is subjected to photocrosslinking by a photodimerization reaction. . And it is necessary to irradiate polarized light with many exposure amounts until resistance to the polymerizable liquid crystal solution is developed. In order to align the liquid crystal of the liquid crystal panel, it is usually only necessary to dimerize only the surface of the photo-alignment alignment material. However, if a conventional material such as the above-mentioned acrylic resin is used to cause the alignment material to exhibit solvent resistance, it is necessary to cause the alignment material to react, and a larger amount of exposure is required. As a result, there is a problem that the orientation sensitivity of the conventional material becomes very small.
 また、上述の従来材料である樹脂にこのような溶剤耐性を発現させるため、架橋剤を添加する技術が知られている。しかし、架橋剤による熱硬化反応を行った後、形成される塗膜の内部には3次元構造が形成され、光反応性は低下するという問題が生じる。すなわち、配向感度が大きく低下してしまい、従来材料に架橋剤を添加して使用しても、所望とする効果は得られていない。 In addition, a technique of adding a crosslinking agent in order to develop such solvent resistance in the above-described conventional resin is known. However, after the thermosetting reaction with the crosslinking agent, a three-dimensional structure is formed inside the formed coating film, and the photoreactivity is lowered. That is, the orientation sensitivity is greatly reduced, and the desired effect is not obtained even when a conventional material is added with a crosslinking agent.
 以上より、配向材の配向感度を向上させ、偏光UV露光量を低減できる光配向技術と、その配向材の形成に用いられる光配向用液晶配向剤として用いることができる硬化膜形成組成物が求められている。そして、高効率に位相差材を提供することができる技術が求められている。 From the above, a photo-alignment technique that can improve the alignment sensitivity of the alignment material and reduce the polarized UV exposure amount, and a cured film forming composition that can be used as a liquid crystal aligning agent for photo-alignment used in the formation of the alignment material It has been. And the technique which can provide a phase difference material with high efficiency is calculated | required.
 本発明の目的は、以上の知見や検討結果に基づいてなされたものである。すなわち、本発明の目的は、優れた耐溶剤性を有し、高感度で重合性液晶を配向させることができる配向材を提供するための光配向用液晶配向剤として用いることができる硬化膜形成組成物を提供することである。 The object of the present invention has been made based on the above knowledge and examination results. That is, an object of the present invention is to form a cured film that can be used as a liquid crystal aligning agent for photo-alignment for providing an alignment material that has excellent solvent resistance and can align a polymerizable liquid crystal with high sensitivity. It is to provide a composition.
 本発明の他の目的および利点は、以下の記載から明らかとなるであろう。 Other objects and advantages of the present invention will become apparent from the following description.
 本発明者らは上記目的を達成するため、鋭意検討を重ねた結果、(A)エポキシ基を有するモノマーと特定の桂皮酸誘導体との反応生成物、(B)架橋剤をベースとする硬化膜形成組成物を選択することにより、優れた耐溶剤性を有し、高感度で重合性液晶を配向させることができる硬化膜(配向材)を形成できることを見出し、本発明を完成させた。 As a result of intensive studies to achieve the above object, the present inventors have (A) a reaction product of a monomer having an epoxy group and a specific cinnamic acid derivative, and (B) a cured film based on a crosslinking agent. By selecting a forming composition, it was found that a cured film (alignment material) having excellent solvent resistance and capable of aligning a polymerizable liquid crystal with high sensitivity could be formed, and the present invention was completed.
 すなわち、本発明は第1観点として、
(A)エポキシ基を有するモノマーと下記式(1)で表される桂皮酸誘導体との反応生成物であるモノマーを用いて得られる重合体、
Figure JPOXMLDOC01-appb-C000002
(式(1)中、AとAはそれぞれ独立に、水素原子またはメチル基を表し、Rは水素原子、ハロゲン原子、炭素原子数1~6のアルキル基、炭素原子数1~6のハロアルキル基、炭素原子数1~6のアルコキシ基、炭素原子数1~6のハロアルコキシ基、炭素原子数3~8のシクロアルキル基、炭素原子数3~8のハロシクロアルキル基炭素、炭素原子数2~6のアルケニル基、炭素原子数2~6のハロアルケニル基、炭素原子数3~8のシクロアルケニル基、炭素原子数3~8のハロシクロアルケニル基、炭素原子数2~6のアルキニル基、炭素原子数2~6のハロアルキニル基、炭素原子数1~6のアルコキシ基、炭素原子数1~6のハロアルコキシ基、(炭素原子数1~6のアルキル)カルボニル基、(炭素原子数1~6のハロアルキル)カルボニル基、(炭素原子数1~6のアルコキシ)カルボニル基、(炭素原子数1~6のハロアルコキシ)カルボニル基、(炭素原子数1~6のアルキルアミノ)カルボニル基、(炭素原子数1~6のハロアルキル)アミノカルボニル基、ジ(炭素原子数1~6のアルキル)アミノカルボニル基、シアノ基およびニトロ基からなる群から選ばれる置換基を表し、Rは2価の芳香族基、2価の脂環族基、2価の複素環式基または2価の縮合環式基を表し、Rは単結合、酸素原子、-COO-または-OCO-を表し、R~Rはそれぞれ独立に水素原子、ハロゲン原子、炭素原子数1~6のアルキル基、炭素原子数1~6のハロアルキル基、炭素原子数1~6のアルコキシ基、炭素原子数1~6のハロアルコキシ基、シアノ基、およびニトロ基からなる群から選ばれる置換基を表し、nは0~3の整数である。)
(B)架橋剤
を含有する硬化膜形成組成物。
 第2観点として、(B)成分の架橋剤がメチロール基またはアルコキシメチル基を有する架橋剤である、第1観点に記載の硬化膜形成組成物に関する。
 第3観点として、(C)ヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基からなる群から選ばれる少なくとも1つの基を有するポリマーをさらに含有する第1観点または第2観点に記載の硬化膜形成組成物に関する。
 第4観点として、(D)架橋触媒をさらに含有する第1観点乃至第3観点のうち何れか一項に記載の硬化膜形成組成物に関する。
 第5観点として、(E)1つ以上の重合性基と、ヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基からなる群から選ばれる少なくとも1つの基Aまたは該基Aと反応する少なくとも1つの基とを有する化合物を含有する第1観点乃至第4観点のうち何れか一項に記載の硬化膜形成組成物に関する。
 第6観点として、(A)成分100質量部に基づいて、1質量部~500質量部の(B)成分を含有する第1観点乃至第5観点のうち何れか一項に記載の硬化膜形成組成物に関する。
 第7観点として、(A)成分および(B)成分の架橋剤の合計量の100質量部に対して1質量部~400質量部の(C)成分を含有する第3観点乃至第6観点のいずれか一項に記載の硬化膜形成組成物に関する。
 第8観点として、(A)成分および(B)成分の架橋剤の合計量の100質量部に対して0.01質量部~20質量部の(D)成分を含有する第4観点乃至第7観点のいずれか一項に記載の硬化膜形成組成物に関する。
 第9観点として、(A)成分および(B)成分の架橋剤の合計量の100質量部に対して1質量部~100質量部の(E)成分を含有する第4観点乃至第8観点のいずれか一項に記載の硬化膜形成組成物に関する。
 第10観点として、第1観点乃至第9観点のうち何れか一項に記載の硬化膜形成組成物を硬化させて得られることを特徴とする硬化膜に関する。
 第11観点として、第1観点乃至第9観点のうち何れか一項に記載の硬化膜形成組成物を硬化させて得られることを特徴とする配向材に関する。
 第12観点として、第1観点乃至第9観点のうち何れか一項に記載の硬化膜形成組成物から得られる硬化膜を使用して形成されることを特徴とする位相差材に関する。
That is, the present invention as a first aspect,
(A) a polymer obtained by using a monomer that is a reaction product of a monomer having an epoxy group and a cinnamic acid derivative represented by the following formula (1):
Figure JPOXMLDOC01-appb-C000002
(In Formula (1), A 1 and A 2 each independently represent a hydrogen atom or a methyl group, R 1 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, or 1 to 6 carbon atoms. Haloalkyl groups, alkoxy groups having 1 to 6 carbon atoms, haloalkoxy groups having 1 to 6 carbon atoms, cycloalkyl groups having 3 to 8 carbon atoms, halocycloalkyl groups having 3 to 8 carbon atoms, carbon, carbon An alkenyl group having 2 to 6 atoms, a haloalkenyl group having 2 to 6 carbon atoms, a cycloalkenyl group having 3 to 8 carbon atoms, a halocycloalkenyl group having 3 to 8 carbon atoms, and 2 to 6 carbon atoms Alkynyl group, haloalkynyl group having 2 to 6 carbon atoms, alkoxy group having 1 to 6 carbon atoms, haloalkoxy group having 1 to 6 carbon atoms, (alkyl having 1 to 6 carbon atoms) carbonyl group, (carbon C with 1-6 atoms (Alkyl) carbonyl group, (alkoxy having 1 to 6 carbon atoms) carbonyl group, (haloalkoxy having 1 to 6 carbon atoms) carbonyl group, (alkylamino having 1 to 6 carbon atoms) carbonyl group, (number of carbon atoms) 1 to 6 haloalkyl) aminocarbonyl group, di (alkyl having 1 to 6 carbon atoms) aminocarbonyl group, a substituent selected from the group consisting of cyano group and nitro group, R 2 is a divalent aromatic group R 2 represents a divalent alicyclic group, a divalent heterocyclic group or a divalent condensed cyclic group, R 3 represents a single bond, an oxygen atom, —COO— or —OCO—, and R 4 to R 7 are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or a haloalkoxy group having 1 to 6 carbon atoms. Group, cyano , And it represents a substituent selected from the group consisting of nitro group, n is an integer of 0-3.)
(B) A cured film forming composition containing a crosslinking agent.
As a 2nd viewpoint, it is related with the cured film formation composition as described in a 1st viewpoint whose crosslinking agent of (B) component is a crosslinking agent which has a methylol group or an alkoxymethyl group.
As a third aspect, (C) described in the first aspect or the second aspect further containing a polymer having at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group. The present invention relates to a cured film forming composition.
As a 4th viewpoint, it is related with the cured film formation composition as described in any one of the 1st viewpoint thru | or the 3rd viewpoint which further contains (D) a crosslinking catalyst.
As a fifth aspect, (E) reaction with one or more polymerizable groups and at least one group A selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or the group A It relates to the cured film forming composition as described in any one of the 1st viewpoint thru | or a 4th viewpoint containing the compound which has at least 1 group to do.
As a sixth aspect, the cured film formation according to any one of the first aspect to the fifth aspect containing 1 part by mass to 500 parts by mass of the component (B) based on 100 parts by mass of the component (A) Relates to the composition.
As a seventh aspect, from the third aspect to the sixth aspect, containing 1 part by mass to 400 parts by mass of the component (C) with respect to 100 parts by mass of the total amount of the crosslinking agent of the component (A) and the component (B). It is related with the cured film formation composition as described in any one.
As an eighth aspect, the fourth aspect to the seventh aspect contain the component (D) in an amount of 0.01 to 20 parts by mass with respect to 100 parts by mass of the total amount of the crosslinking agents of the components (A) and (B) The cured film forming composition according to any one of the aspects.
As a ninth aspect, the fourth aspect to the eighth aspect containing the component (E) in an amount of 1 part by mass to 100 parts by mass with respect to 100 parts by mass of the total amount of the crosslinking agent of the component (A) and the component (B) It is related with the cured film formation composition as described in any one.
As a tenth aspect, the present invention relates to a cured film obtained by curing the cured film-forming composition according to any one of the first to ninth aspects.
An eleventh aspect relates to an alignment material obtained by curing the cured film forming composition according to any one of the first to ninth aspects.
As a twelfth aspect, the present invention relates to a retardation material characterized by being formed using a cured film obtained from the cured film forming composition according to any one of the first aspect to the ninth aspect.
 本発明によれば、優れた耐溶剤性を有し、高感度で重合性液晶を配向させることができる硬化膜と、その形成に好適な硬化膜形成組成物を提供することができる。
 本発明によれば、液晶配向性と光透過性に優れた配向材および高精度な光学パターニングが可能な位相差材を提供することができる。
ADVANTAGE OF THE INVENTION According to this invention, it can provide the cured film which has the outstanding solvent resistance, can align a polymerizable liquid crystal with high sensitivity, and a cured film formation composition suitable for the formation.
ADVANTAGE OF THE INVENTION According to this invention, the phase difference material in which the orientation material excellent in liquid crystal orientation and light transmittance and high-precision optical patterning are possible can be provided.
<硬化膜形成組成物>
 本発明の硬化膜形成組成物は、(A)エポキシ基を有するモノマーと上記式(1)で表される桂皮酸誘導体との反応生成物であるモノマーを用いて得られる重合体、および(B)架橋剤を含有する。本発明の硬化膜形成組成物は、上記(A)成分および(B)成分に加えて、さらに、(C)成分としてヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基からなる群から選ばれる少なくとも1つの基を有するポリマーを含有することもできる。さらに、(D)成分として架橋触媒をも含有することができる。さらに(E)成分として1つ以上の重合性基と、ヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基からなる群から選ばれる少なくとも1つの基Aまたは該基Aと反応する少なくとも1つの基とを有する化合物を含有することができる。そして、本発明の効果を損なわない限りにおいて、その他の添加剤を含有することができる。
 以下、各成分の詳細を説明する。   
<Curing film forming composition>
The cured film forming composition of the present invention comprises (A) a polymer obtained by using a monomer that is a reaction product of a monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1), and (B ) Contains a crosslinking agent. In addition to the components (A) and (B), the cured film forming composition of the present invention further comprises a group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group as the component (C). It is also possible to contain a polymer having at least one group selected from Furthermore, a crosslinking catalyst can also be contained as (D) component. Furthermore, as the component (E), at least one group A selected from the group consisting of one or more polymerizable groups, a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or at least reacts with the group A Compounds having one group can be contained. And as long as the effect of this invention is not impaired, another additive can be contained.
Hereinafter, details of each component will be described.
<(A)成分>
 本発明の硬化膜形成組成物に含有される(A)成分は、エポキシ基を有するモノマーと上記式(1)で表される桂皮酸誘導体との反応生成物であるモノマーを用いて得られる重合体である。
<(A) component>
The component (A) contained in the cured film forming composition of the present invention is obtained by using a monomer that is a reaction product of a monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1). It is a coalescence.
<エポキシ基を有するモノマー>
 本発明において上記式(1)で表される桂皮酸誘導体と反応させるのに用いるエポキシ基を有する重合性不飽和化合物(モノマー)の具体例としては、例えばアクリル酸グリシジル、メタクリル酸グリシジル、α-エチルアクリル酸グリシジル、α-n-プロピルアクリル酸グリシジル、α-n-ブチルアクリル酸グリシジル、アクリル酸-3,4-エポキシブチル、メタクリル酸-3,4-エポキシブチル、アクリル酸-6,7-エポキシヘプチル、メタクリル酸-6,7-エポキシヘプチル、α-エチルアクリル酸-6,7-エポキシヘプチル、o-ビニルベンジルグリシジルエーテル、m-ビニルベンジルグリシジルエーテル、p-ビニルベンジルグリシジルエーテル等を挙げることができる。
<Monomer having an epoxy group>
Specific examples of the polymerizable unsaturated compound (monomer) having an epoxy group used for the reaction with the cinnamic acid derivative represented by the above formula (1) in the present invention include, for example, glycidyl acrylate, glycidyl methacrylate, α- Glycidyl ethyl acrylate, glycidyl α-n-propyl acrylate, glycidyl α-n-butyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, -6,7-acrylic acid Mention of epoxyheptyl, methacrylic acid-6,7-epoxyheptyl, α-ethylacrylic acid-6,7-epoxyheptyl, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, etc. Can do.
<カルボキシル基を有する桂皮酸誘導体>
 上記カルボキシル基を有する桂皮酸誘導体としては、上記式(1)で表される化合物を挙げることができる。
<Cinnamic acid derivative having a carboxyl group>
Examples of the cinnamic acid derivative having a carboxyl group include compounds represented by the above formula (1).
 上記式(1)におけるハロゲン原子としては、フッ素原子、塩素原子、臭素原子およびヨウ素原子が挙げられる。尚、本明細書中「ハロ」の表記もこれらのハロゲン原子を表す。 Examples of the halogen atom in the above formula (1) include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. In the present specification, the notation “halo” also represents these halogen atoms.
 上記式(1)における炭素原子数a~bのアルキル基の表記は、炭素原子数がa~b個よりなる直鎖状または分岐鎖状の炭化水素基を表し、例えばメチル基、エチル基、n-プロピル基、i-プロピル基、n-ブチル基、i-ブチル基、s-ブチル基、t-ブチル基、n-ペンチル基、1-メチルブチル基、2-メチルブチル基、3-メチルブチル基、1-エチルプロピル基、1,1-ジメチルプロピル基、1,2-ジメチルプロピル基、2,2-ジメチルプロピル基、n-ヘキシル基、1-メチルペンチル基、2-メチルペンチル基、1,1-ジメチルブチル基、および1,3-ジメチルブチル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 The notation of an alkyl group having carbon atoms a to b in the above formula (1) represents a linear or branched hydrocarbon group having carbon atoms of a to b, such as a methyl group, an ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group, t-butyl group, n-pentyl group, 1-methylbutyl group, 2-methylbutyl group, 3-methylbutyl group, 1-ethylpropyl group, 1,1-dimethylpropyl group, 1,2-dimethylpropyl group, 2,2-dimethylpropyl group, n-hexyl group, 1-methylpentyl group, 2-methylpentyl group, 1,1 Specific examples include dimethylbutyl group, 1,3-dimethylbutyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, etc. Be-option.
 上記式(1)における炭素原子数a~bのハロアルキル基の表記は、炭素原子に結合した水素原子が、ハロゲン原子によって任意に置換された、炭素原子数がa~b個よりなる直鎖状または分岐鎖状の炭化水素基を表し、このとき、2個以上のハロゲン原子によって置換されている場合、それらのハロゲン原子は互いに同一でも、または互いに相異なっていてもよい。例えばフルオロメチル基、クロロメチル基、ブロモメチル基、ヨードメチル基、ジフルオロメチル基、クロロフルオロメチル基、ジクロロメチル基、ブロモフルオロメチル基、トリフルオロメチル基、クロロジフルオロメチル基、ジクロロフルオロメチル基、トリクロロメチル基、ブロモジフルオロメチル基、ブロモクロロフルオロメチル基、ジブロモフルオロメチル基、2-フルオロエチル基、2-クロロエチル基、2-ブロモエチル基、2,2-ジフルオロエチル基、2-クロロ-2-フルオロエチル基、2,2-ジクロロエチル基、2-ブロモ-2-フルオロエチル基、2,2,2-トリフルオロエチル基、2-クロロ-2,2-ジフルオロエチル基、2,2-ジクロロ-2-フルオロエチル基、2,2,2-トリクロロエチル基、2-ブロモ-2,2-ジフルオロエチル基、2-ブロモ-2-クロロ-2-フルオロエチル基、2-ブロモ-2,2-ジクロロエチル基、1,1,2,2-テトラフルオロエチル基、ペンタフルオロエチル基、1-クロロ-1,2,2,2-テトラフルオロエチル基、2-クロロ-1,1,2,2-テトラフルオロエチル基、1,2-ジクロロ-1,2,2-トリフルオロエチル基、2-ブロモ-1,1,2,2-テトラフルオロエチル基、2-フルオロプロピル基、2-クロロプロピル基、2-ブロモプロピル基、2-クロロ-2-フルオロプロピル基、2,3-ジクロロプロピル基、2-ブロモ-3-フルオロプロピル基、3-ブロモ-2-クロロプロピル基、2,3-ジブロモプロピル基、3,3,3-トリフルオロプロピル基、3-ブロモ-3,3-ジフルオロプロピル基、2,2,3,3-テトラフルオロプロピル基、2-クロロ-3,3,3-トリフルオロプロピル基、2,2,3,3,3-ペンタフルオロプロピル基、1,1,2,3,3,3-ヘキサフルオロプロピル基、ヘプタフルオロプロピル基、2,3-ジクロロ-1,1,2,3,3-ペンタフルオロプロピル基、2-フルオロ-1-メチルエチル基、2-クロロ-1-メチルエチル基、2-ブロモ-1-メチルエチル基、2,2,2-トリフルオロ-1-(トリフルオロメチル)エチル基、1,2,2,2-テトラフルオロ-1-(トリフルオロメチル)エチル基、2,2,3,3,4,4-ヘキサフルオロブチル基、2,2,3,4,4,4-ヘキサフルオロブチル基、2,2,3,3,4,4,4-ヘプタフルオロブチル基、1,1,2,2,3,3,4,4-オクタフルオロブチル基、ノナフルオロブチル基、4-クロロ-1,1,2,2,3,3,4,4-オクタフルオロブチル基、2-フルオロ-2-メチルプロピル基、2-クロロ-1,1-ジメチルエチル基、2-ブロモ-1,1-ジメチルエチル基、5-クロロ-2,2,3,4,4,5,5-ヘプタフルオロペンチル基、トリデカフルオロヘキシル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 The notation of the haloalkyl group having carbon atoms a to b in the above formula (1) is a straight chain comprising a to b carbon atoms, in which a hydrogen atom bonded to a carbon atom is arbitrarily substituted with a halogen atom. Alternatively, it represents a branched hydrocarbon group, and when substituted with two or more halogen atoms, these halogen atoms may be the same as or different from each other. For example, fluoromethyl group, chloromethyl group, bromomethyl group, iodomethyl group, difluoromethyl group, chlorofluoromethyl group, dichloromethyl group, bromofluoromethyl group, trifluoromethyl group, chlorodifluoromethyl group, dichlorofluoromethyl group, trichloromethyl Group, bromodifluoromethyl group, bromochlorofluoromethyl group, dibromofluoromethyl group, 2-fluoroethyl group, 2-chloroethyl group, 2-bromoethyl group, 2,2-difluoroethyl group, 2-chloro-2-fluoroethyl Group, 2,2-dichloroethyl group, 2-bromo-2-fluoroethyl group, 2,2,2-trifluoroethyl group, 2-chloro-2,2-difluoroethyl group, 2,2-dichloro-2 -Fluoroethyl group, 2,2,2-trichloroethyl group, 2 Bromo-2,2-difluoroethyl group, 2-bromo-2-chloro-2-fluoroethyl group, 2-bromo-2,2-dichloroethyl group, 1,1,2,2-tetrafluoroethyl group, penta Fluoroethyl group, 1-chloro-1,2,2,2-tetrafluoroethyl group, 2-chloro-1,1,2,2-tetrafluoroethyl group, 1,2-dichloro-1,2,2- Trifluoroethyl group, 2-bromo-1,1,2,2-tetrafluoroethyl group, 2-fluoropropyl group, 2-chloropropyl group, 2-bromopropyl group, 2-chloro-2-fluoropropyl group, 2,3-dichloropropyl group, 2-bromo-3-fluoropropyl group, 3-bromo-2-chloropropyl group, 2,3-dibromopropyl group, 3,3,3-trifluoropropyl group, 3-butyl Mo-3,3-difluoropropyl group, 2,2,3,3-tetrafluoropropyl group, 2-chloro-3,3,3-trifluoropropyl group, 2,2,3,3,3-pentafluoro Propyl group, 1,1,2,3,3,3-hexafluoropropyl group, heptafluoropropyl group, 2,3-dichloro-1,1,2,3,3-pentafluoropropyl group, 2-fluoro- 1-methylethyl group, 2-chloro-1-methylethyl group, 2-bromo-1-methylethyl group, 2,2,2-trifluoro-1- (trifluoromethyl) ethyl group, 1,2,2 , 2-tetrafluoro-1- (trifluoromethyl) ethyl group, 2,2,3,3,4,4-hexafluorobutyl group, 2,2,3,4,4,4-hexafluorobutyl group, 2,2,3,3,4,4,4-hep Tafluorobutyl group, 1,1,2,2,3,3,4,4-octafluorobutyl group, nonafluorobutyl group, 4-chloro-1,1,2,2,3,3,4,4 -Octafluorobutyl group, 2-fluoro-2-methylpropyl group, 2-chloro-1,1-dimethylethyl group, 2-bromo-1,1-dimethylethyl group, 5-chloro-2,2,3, Specific examples include a 4,4,5,5-heptafluoropentyl group, a tridecafluorohexyl group, and the like, and each is selected within the range of the designated number of carbon atoms.
 上記式(1)における炭素原子数a~bのシクロアルキル基の表記は、炭素原子数がa~b個よりなる環状の炭化水素基を表し、3員環から6員環までの単環または複合環構造を形成することが出来る。また、各々の環は指定の炭素原子数の範囲でアルキル基によって任意に置換されていてもよい。例えばシクロプロピル基、1-メチルシクロプロピル基、2-メチルシクロプロピル基、2,2-ジメチルシクロプロピル基、2,2,3,3-テトラメチルシクロプロピル基、シクロブチル基、シクロペンチル基、2-メチルシクロペンチル基、3-メチルシクロペンチル基、シクロヘキシル基、2-メチルシクロヘキシル基、3-メチルシクロヘキシル基、4-メチルシクロヘキシル基、ビシクロ[2.2.1]ヘプタン-2-イル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 The notation of the cycloalkyl group having a carbon number of a to b in the above formula (1) represents a cyclic hydrocarbon group having a carbon number of a to b, a monocyclic ring having 3 to 6 members, A complex ring structure can be formed. Each ring may be optionally substituted with an alkyl group within the range of the specified number of carbon atoms. For example, cyclopropyl group, 1-methylcyclopropyl group, 2-methylcyclopropyl group, 2,2-dimethylcyclopropyl group, 2,2,3,3-tetramethylcyclopropyl group, cyclobutyl group, cyclopentyl group, 2- Specific examples include methylcyclopentyl group, 3-methylcyclopentyl group, cyclohexyl group, 2-methylcyclohexyl group, 3-methylcyclohexyl group, 4-methylcyclohexyl group, bicyclo [2.2.1] heptan-2-yl group, and the like. Each of which is selected for each specified number of carbon atoms.
 上記式(1)における炭素原子数a~bのハロシクロアルキル基の表記は、炭素原子に結合した水素原子が、ハロゲン原子によって任意に置換された、炭素原子数がa~b個よりなる環状の炭化水素基を表し、3員環から6員環までの単環または複合環構造を形成することが出来る。また、各々の環は指定の炭素原子数の範囲でアルキル基によって任意に置換されていてもよく、ハロゲン原子による置換は環構造部分であっても、側鎖部分であっても、或いはそれらの両方であってもよく、さらに、2個以上のハロゲン原子によって置換されている場合、それらのハロゲン原子は互いに同一でも、または互いに相異なっていてもよい。例えば2,2-ジフルオロシクロプロピル基、2,2-ジクロロシクロプロピル基、2,2-ジブロモシクロプロピル基、2,2-ジフルオロ-1-メチルシクロプロピル基、2,2-ジクロロ-1-メチルシクロプロピル基、2,2-ジブロモ-1-メチルシクロプロピル基、2,2,3,3-テトラフルオロシクロブチル基、2-(トリフルオロメチル)シクロヘキシル基、3-(トリフルオロメチル)シクロヘキシル基、4-(トリフルオロメチル)シクロヘキシル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the description of the halocycloalkyl group having a carbon number of a to b is a cyclic group in which the hydrogen atom bonded to the carbon atom is optionally substituted with a halogen atom and having a carbon number of a to b. And can form a monocyclic or complex ring structure of 3 to 6 membered rings. Each ring may be optionally substituted with an alkyl group within the range of the specified number of carbon atoms, and the substitution with a halogen atom may be a ring structure part, a side chain part, They may be both, and when they are substituted by two or more halogen atoms, the halogen atoms may be the same as or different from each other. For example, 2,2-difluorocyclopropyl group, 2,2-dichlorocyclopropyl group, 2,2-dibromocyclopropyl group, 2,2-difluoro-1-methylcyclopropyl group, 2,2-dichloro-1-methyl Cyclopropyl group, 2,2-dibromo-1-methylcyclopropyl group, 2,2,3,3-tetrafluorocyclobutyl group, 2- (trifluoromethyl) cyclohexyl group, 3- (trifluoromethyl) cyclohexyl group , 4- (trifluoromethyl) cyclohexyl group and the like are listed as specific examples, and each is selected within the range of the designated number of carbon atoms.
 上記式(1)における炭素原子数a~bのアルケニル基の表記は、炭素原子数がa~b個よりなる直鎖状または分岐鎖状で、且つ分子内に1個または2個以上の二重結合を有する不飽和炭化水素基を表し、例えばビニル基、1-プロペニル基、2-プロペニル基、1-メチルエテニル基、2-ブテニル基、1-メチル-2-プロペニル基、2-メチル-2-プロペニル基、2-ペンテニル基、2-メチル-2-ブテニル基、3-メチル-2-ブテニル基、2-エチル-2-プロペニル基、1,1-ジメチル-2-プロペニル基、2-ヘキセニル基、2-メチル-2-ペンテニル基、2,4-ジメチル-2,6-ヘプタジエニル基、3,7-ジメチル-2,6-オクタジエニル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the alkenyl group having a carbon number of a to b is linear or branched having a carbon number of a to b, and one or two or more carbon atoms in the molecule. Represents an unsaturated hydrocarbon group having a heavy bond, for example, vinyl group, 1-propenyl group, 2-propenyl group, 1-methylethenyl group, 2-butenyl group, 1-methyl-2-propenyl group, 2-methyl-2 -Propenyl group, 2-pentenyl group, 2-methyl-2-butenyl group, 3-methyl-2-butenyl group, 2-ethyl-2-propenyl group, 1,1-dimethyl-2-propenyl group, 2-hexenyl Group, 2-methyl-2-pentenyl group, 2,4-dimethyl-2,6-heptadienyl group, 3,7-dimethyl-2,6-octadienyl group, etc. In a range of numbers Be-option.
 上記式(1)における炭素原子数a~bのハロアルケニル基の表記は、炭素原子に結合した水素原子が、ハロゲン原子によって任意に置換された、炭素原子数がa~b個よりなる直鎖状または分岐鎖状で、且つ分子内に1個または2個以上の二重結合を有する不飽和炭化水素基を表す。このとき、2個以上のハロゲン原子によって置換されている場合、それらのハロゲン原子は互いに同一でも、または互いに相異なっていてもよい。例えば2,2-ジクロロビニル基、2-フルオロ-2-プロペニル基、2-クロロ-2-プロペニル基、3-クロロ-2-プロペニル基、2-ブロモ-2-プロペニル基、3-ブロモ-2-プロペニル基、3,3-ジフルオロ-2-プロペニル基、2,3-ジクロロ-2-プロペニル基、3,3-ジクロロ-2-プロペニル基、2,3-ジブロモ-2-プロペニル基、2,3,3-トリフルオロ-2-プロペニル基、2,3,3-トリクロロ-2-プロペニル基、1-(トリフルオロメチル)エテニル基、3-クロロ-2-ブテニル基、3-ブロモ-2-ブテニル基、4,4-ジフルオロ-3-ブテニル基、3,4,4-トリフルオロ-3-ブテニル基、3-クロロ-4,4,4-トリフルオロ-2-ブテニル基、3-ブロモ-2-メチル-2-プロペニル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the haloalkenyl group having a carbon number of a to b is a straight chain composed of a to b carbon atoms in which a hydrogen atom bonded to a carbon atom is optionally substituted with a halogen atom. Represents an unsaturated hydrocarbon group which is in the form of a chain or a branched chain and has one or more double bonds in the molecule. At this time, when substituted with two or more halogen atoms, the halogen atoms may be the same as or different from each other. For example, 2,2-dichlorovinyl group, 2-fluoro-2-propenyl group, 2-chloro-2-propenyl group, 3-chloro-2-propenyl group, 2-bromo-2-propenyl group, 3-bromo-2 -Propenyl group, 3,3-difluoro-2-propenyl group, 2,3-dichloro-2-propenyl group, 3,3-dichloro-2-propenyl group, 2,3-dibromo-2-propenyl group, 2, 3,3-trifluoro-2-propenyl group, 2,3,3-trichloro-2-propenyl group, 1- (trifluoromethyl) ethenyl group, 3-chloro-2-butenyl group, 3-bromo-2- Butenyl group, 4,4-difluoro-3-butenyl group, 3,4,4-trifluoro-3-butenyl group, 3-chloro-4,4,4-trifluoro-2-butenyl group, 3-bromo- 2-methyl- - propenyl group, etc. As a specific example, it may be selected from the range of the specified number of carbon atoms.
 上記式(1)における炭素原子数a~bのシクロアルケニル基の表記は、炭素原子数がa~b個よりなる環状の、且つ1個または2個以上の二重結合を有する不飽和炭化水素基を表し、3員環から6員環までの単環または複合環構造を形成することが出来る。また、各々の環は指定の炭素原子数の範囲でアルキル基によって任意に置換されていてもよく、さらに、二重結合はendo-またはexo-のどちらの形式であってもよい。例えば2-シクロペンテン-1-イル基、3-シクロペンテン-1-イル基、2-シクロヘキセン-1-イル基、3-シクロヘキセン-1-イル基、ビシクロ[2.2.1]-5-ヘプテン-2-イル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the description of the cycloalkenyl group having a carbon number of a to b is a cyclic unsaturated hydrocarbon having 1 to 2 carbon atoms and having one or more double bonds. Represents a group and can form a monocyclic or complex ring structure from 3 to 6-membered rings. Each ring may be optionally substituted with an alkyl group within a range of the specified number of carbon atoms, and the double bond may be in an endo- or exo- form. For example, 2-cyclopenten-1-yl group, 3-cyclopenten-1-yl group, 2-cyclohexen-1-yl group, 3-cyclohexen-1-yl group, bicyclo [2.2.1] -5-heptene- A 2-yl group or the like is given as a specific example, and is selected within the range of each designated number of carbon atoms.
 上記式(1)における炭素原子数a~bのハロシクロアルケニル基の表記は、炭素原子に結合した水素原子が、ハロゲン原子によって任意に置換された、炭素原子数がa~b個よりなる環状の、且つ1個または2個以上の二重結合を有する不飽和炭化水素基を表し、3員環から6員環までの単環または複合環構造を形成することが出来る。また、各々の環は指定の炭素原子数の範囲でアルキル基によって任意に置換されていてもよく、さらに、二重結合はendo-またはexo-のどちらの形式であってもよい。また、ハロゲン原子による置換は環構造部分であっても、側鎖部分であっても、或いはそれらの両方であってもよく、2個以上のハロゲン原子によって置換されている場合、それらのハロゲン原子は互いに同一でも、または互いに相異なっていても良い。例えば2-クロロビシクロ[2.2.1]-5-ヘプテン-2-イル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 The notation of a halocycloalkenyl group having a carbon number of a to b in the above formula (1) is a cyclic structure having a carbon number of a to b, wherein a hydrogen atom bonded to the carbon atom is optionally substituted with a halogen atom And an unsaturated hydrocarbon group having one or two or more double bonds, and can form a monocyclic or complex ring structure having 3 to 6 members. Each ring may be optionally substituted with an alkyl group within a range of the specified number of carbon atoms, and the double bond may be in an endo- or exo- form. In addition, the substitution by a halogen atom may be a ring structure part, a side chain part or both of them, and when substituted by two or more halogen atoms, those halogen atoms May be the same as or different from each other. For example, a 2-chlorobicyclo [2.2.1] -5-hepten-2-yl group and the like can be mentioned as specific examples, and each group is selected within the range of the designated number of carbon atoms.
 上記式(1)における炭素原子数a~bのアルキニル基の表記は、炭素原子数がa~b個よりなる直鎖状または分岐鎖状で、且つ分子内に1個または2個以上の三重結合を有する不飽和炭化水素基を表し、例えばエチニル基、1-プロピニル基、2-プロピニル基、2-ブチニル基、1-メチル-2-プロピニル基、2-ペンチニル基、1-メチル-2-ブチニル基、1,1-ジメチル-2-プロピニル基、2-ヘキシニル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the alkynyl group having a carbon number of a to b is linear or branched having a carbon number of a to b and one or more triples in the molecule. Represents an unsaturated hydrocarbon group having a bond, such as ethynyl, 1-propynyl, 2-propynyl, 2-butynyl, 1-methyl-2-propynyl, 2-pentynyl, 1-methyl-2- Specific examples include butynyl group, 1,1-dimethyl-2-propynyl group, 2-hexynyl group and the like, and each is selected within the range of the designated number of carbon atoms.
 上記式(1)における炭素原子数a~bのハロアルキニル基の表記は、炭素原子に結合した水素原子が、ハロゲン原子によって任意に置換された、炭素原子数がa~b個よりなる直鎖状または分岐鎖状で、且つ分子内に1個または2個以上の三重結合を有する不飽和炭化水素基を表す。このとき、2個以上のハロゲン原子によって置換されている場合、それらのハロゲン原子は互いに同一でも、または互いに相異なっていても良い。例えば2-クロロエチニル基、2-ブロモエチニル基、2-ヨードエチニル基、3-クロロ-2-プロピニル基、3-ブロモ-2-プロピニル基、3-ヨード-2-プロピニル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), a haloalkynyl group having a carbon number of a to b is a straight chain composed of a to b carbon atoms in which a hydrogen atom bonded to the carbon atom is arbitrarily substituted with a halogen atom. Represents an unsaturated hydrocarbon group which is in the form of a chain or a branched chain and has one or more triple bonds in the molecule. At this time, when substituted by two or more halogen atoms, the halogen atoms may be the same as or different from each other. Specific examples include 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3-chloro-2-propynyl group, 3-bromo-2-propynyl group, 3-iodo-2-propynyl group and the like. Each of which is selected for each specified number of carbon atoms.
 上記式(1)における炭素原子数a~bのアルコキシ基の表記は、炭素原子数がa~b個よりなる前記の意味であるアルキル-O-基を表し、例えばメトキシ基、エトキシ基、n-プロピルオキシ基、i-プロピルオキシ基、n-ブチルオキシ基、i-ブチルオキシ基、s-ブチルオキシ基、t-ブチルオキシ基、n-ペンチルオキシ基、n-ヘキシルオキシ基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the notation of an alkoxy group having carbon atoms a to b represents an alkyl-O— group having the above-mentioned meaning consisting of a to b carbon atoms, such as methoxy group, ethoxy group, n Specific examples include -propyloxy group, i-propyloxy group, n-butyloxy group, i-butyloxy group, s-butyloxy group, t-butyloxy group, n-pentyloxy group, n-hexyloxy group, and the like. Each selected range of carbon atoms is selected.
 上記式(1)における炭素原子数a~bのハロアルコキシ基の表記は、炭素原子数がa~b個よりなる前記の意味であるハロアルキル-O-基を表し、例えばジフルオロメトキシ基、トリフルオロメトキシ基、クロロジフルオロメトキシ基、ブロモジフルオロメトキシ基、2-フルオロエトキシ基、2-クロロエトキシ基、2,2,2-トリフルオロエトキシ基、1,1,2,2,-テトラフルオロエトキシ基、2-クロロ-1,1,2-トリフルオロエトキシ基、2-ブロモ-1,1,2-トリフルオロエトキシ基、ペンタフルオロエトキシ基、2,2-ジクロロ-1,1,2-トリフルオロエトキシ基、2,2,2-トリクロロ-1,1-ジフルオロエトキシ基、2-ブロモ-1,1,2,2-テトラフルオロエトキシ基、2,2,3,3-テトラフルオロプロピルオキシ基、1,1,2,3,3,3-ヘキサフルオロプロピルオキシ基、2,2,2-トリフルオロ-1-(トリフルオロメチル)エトキシ基、ヘプタフルオロプロピルオキシ基、2-ブロモ-1,1,2,3,3,3-ヘキサフルオロプロピルオキシ基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 The notation of a haloalkoxy group having carbon atoms a to b in the above formula (1) represents a haloalkyl-O— group having the above-mentioned meaning consisting of a to b carbon atoms, such as a difluoromethoxy group, trifluoro Methoxy group, chlorodifluoromethoxy group, bromodifluoromethoxy group, 2-fluoroethoxy group, 2-chloroethoxy group, 2,2,2-trifluoroethoxy group, 1,1,2,2, -tetrafluoroethoxy group, 2-chloro-1,1,2-trifluoroethoxy group, 2-bromo-1,1,2-trifluoroethoxy group, pentafluoroethoxy group, 2,2-dichloro-1,1,2-trifluoroethoxy group 2,2,2-trichloro-1,1-difluoroethoxy group, 2-bromo-1,1,2,2-tetrafluoroethoxy group, 2,2,3 3-tetrafluoropropyloxy group, 1,1,2,3,3,3-hexafluoropropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) ethoxy group, heptafluoropropyloxy group Specific examples include 2-bromo-1,1,2,3,3,3-hexafluoropropyloxy group and the like, and each is selected within the range of the designated number of carbon atoms.
 上記式(1)における(炭素原子数a~bのアルキル)カルボニル基の表記は、炭素原子数がa~b個よりなる前記の意味であるアルキル-C(O)-基を表し、例えばアセチル基、プロピオニル基、ブチリル基、イソブチリル基、バレリル基、イソバレリル基、2-メチルブタノイル基、ピバロイル基、ヘキサノイル基、ヘプタノイル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the notation of (alkyl of carbon atoms a to b) carbonyl group represents an alkyl-C (O) -group having the above meaning consisting of a to b carbon atoms, for example acetyl Specific examples include a group, propionyl group, butyryl group, isobutyryl group, valeryl group, isovaleryl group, 2-methylbutanoyl group, pivaloyl group, hexanoyl group, heptanoyl group, etc. Selected.
 上記式(1)における(炭素原子数a~bのハロアルキル)カルボニル基の表記は、炭素原子数がa~b個よりなる前記の意味であるハロアルキル-C(O)-基を表し、例えばフルオロアセチル基、クロロアセチル基、ジフルオロアセチル基、ジクロロアセチル基、トリフルオロアセチル基、クロロジフルオロアセチル基、ブロモジフルオロアセチル基、トリクロロアセチル基、ペンタフルオロプロピオニル基、ヘプタフルオロブタノイル基、3-クロロ-2,2-ジメチルプロパノイル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the notation of (haloalkyl having a carbon number of a to b) carbonyl group represents a haloalkyl-C (O) -group having the above-mentioned meaning consisting of a to b carbon atoms. Acetyl group, chloroacetyl group, difluoroacetyl group, dichloroacetyl group, trifluoroacetyl group, chlorodifluoroacetyl group, bromodifluoroacetyl group, trichloroacetyl group, pentafluoropropionyl group, heptafluorobutanoyl group, 3-chloro-2 Specific examples include, 2-dimethylpropanoyl group, and the like, and each is selected within the range of the designated number of carbon atoms.
 上記式(1)における(炭素原子数a~bのアルコキシ)カルボニル基の表記は、炭素原子数がa~b個よりなる前記の意味であるアルキル-O-C(O)-基を表し、例えばメトキシカルボニル基、エトキシカルボニル基、 n-プロピルオキシカルボニル基、i-プロピルオキシカルボニル基、n-ブトキシカルボニル基、i-ブトキシカルボニル基、t-ブトキシカルボニル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 The notation of (alkoxy having carbon atoms a to b) carbonyl group in the above formula (1) represents an alkyl-O—C (O) — group having the above-mentioned meaning consisting of a to b carbon atoms, Specific examples include methoxycarbonyl group, ethoxycarbonyl group, n-propyloxycarbonyl group, i-propyloxycarbonyl group, n-butoxycarbonyl group, i-butoxycarbonyl group, t-butoxycarbonyl group and the like. Selected within the specified number of carbon atoms.
 上記式(1)における(炭素原子数a~bのハロアルコキシ)カルボニル基の表記は、炭素原子数がa~b個よりなる前記の意味であるハロアルキル-O-C(O)-基を表し、例えば2-クロロエトキシカルボニル基、2,2-ジフルオロエトキシカルボニル基、2,2,2-トリフルオロエトキシカルボニル基、2,2,2-トリクロロエトキシカルボニル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the expression of (haloalkoxy having a carbon number of a to b) carbonyl group represents a haloalkyl-O—C (O) — group having the above meaning consisting of a carbon number of a to b. Specific examples include 2-chloroethoxycarbonyl group, 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, 2,2,2-trichloroethoxycarbonyl group, etc. Selected within the specified number of carbon atoms.
 上記式(1)における(炭素原子数a~bのアルキルアミノ)カルボニル基の表記は、水素原子の一方が炭素原子数がa~b個よりなる前記の意味であるアルキル基によって置換されたカルバモイル基を表し、例えばメチルカルバモイル基、エチルカルバモイル基、n-プロピルカルバモイル基、i-プロピルカルバモイル基、n-ブチルカルバモイル基、i-ブチルカルバモイル基、s-ブチルカルバモイル基、t-ブチルカルバモイル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the notation of (alkylamino having a carbon number of a to b) carbonyl group is carbamoyl substituted with an alkyl group as defined above, wherein one of the hydrogen atoms is composed of a to b carbon atoms. For example, methylcarbamoyl group, ethylcarbamoyl group, n-propylcarbamoyl group, i-propylcarbamoyl group, n-butylcarbamoyl group, i-butylcarbamoyl group, s-butylcarbamoyl group, t-butylcarbamoyl group, etc. Specific examples are given, each selected in the range of the specified number of carbon atoms.
 上記式(1)における(炭素原子数a~bのハロアルキルアミノ)カルボニル基の表記は、水素原子の一方が炭素原子数a~b個よりなる前記の意味であるハロアルキル基によって置換されたカルバモイル基を表し、例えば2-フルオロエチルカルバモイル基、2-クロロエチルカルバモイル基、2,2-ジフルオロエチルカルバモイル基、2,2,2-トリフルオロエチルカルバモイル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 The notation of (haloalkylamino of carbon atoms a to b) carbonyl group in the above formula (1) is a carbamoyl group substituted by a haloalkyl group as defined above, wherein one of the hydrogen atoms is composed of a carbon atom of a to b Specific examples include 2-fluoroethylcarbamoyl group, 2-chloroethylcarbamoyl group, 2,2-difluoroethylcarbamoyl group, 2,2,2-trifluoroethylcarbamoyl group, and the like. Selected in the range of the number of carbon atoms.
 上記式(1)におけるジ(炭素原子数a~bのアルキル)アミノカルボニル基の表記は、水素原子が両方とも、それぞれ同一でもまたは互いに相異なっていてもよい炭素原子数がa~b個よりなる前記の意味であるアルキル基によって置換されたカルバモイル基を表し、例えばN,N-ジメチルカルバモイル基、N-エチル-N-メチルカルバモイル基、N,N-ジエチルカルバモイル基、N,N-ジ-n-プロピルカルバモイル基、N,N-ジ-n-ブチルカルバモイル基等が具体例として挙げられ、各々の指定の炭素原子数の範囲で選択される。 In the above formula (1), the notation of di (alkyl having a carbon number of ab) aminocarbonyl group is such that both hydrogen atoms may be the same or different from each other from ab. A carbamoyl group substituted by an alkyl group as defined above, for example, N, N-dimethylcarbamoyl group, N-ethyl-N-methylcarbamoyl group, N, N-diethylcarbamoyl group, N, N-di- Specific examples include n-propylcarbamoyl group, N, N-di-n-butylcarbamoyl group and the like, and each is selected within the range of the designated number of carbon atoms.
 式(1)で表される桂皮酸誘導体の置換基R、R、R、RおよびRとしては、中でも、それぞれ独立に水素原子、ハロゲン原子、炭素原子数1~6のアルキル基、炭素原子数1~6のハロアルキル基、炭素原子数1~6のアルコキシ基、炭素原子数1~6のハロアルコキシ基、シアノ基およびニトロ基からなる群から選ばれる置換基であることが好ましい。 The substituents R 1 , R 4 , R 5 , R 6 and R 7 of the cinnamic acid derivative represented by the formula (1) are each independently a hydrogen atom, a halogen atom, or an alkyl having 1 to 6 carbon atoms. A substituent selected from the group consisting of a group, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, and a nitro group. preferable.
 また、置換基Rとしては上記定義の中で水素原子以外の置換基であることが、配向感度の点から好ましく、ハロゲン原子、炭素原子数1~6のアルキル基、炭素原子数1~6のハロアルキル基、炭素原子数1~6のアルコキシ基、炭素原子数1~6のハロアルコキシ基、シアノ基およびニトロ基からなる群から選ばれる置換基がさらに好ましい。 In addition, the substituent R 1 is preferably a substituent other than a hydrogen atom in the above definition from the viewpoint of orientation sensitivity, and is preferably a halogen atom, an alkyl group having 1 to 6 carbon atoms, or 1 to 6 carbon atoms. And more preferably a substituent selected from the group consisting of a haloalkyl group, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, and a nitro group.
 置換基Rの2価の芳香族基としては、例えば1,4-フェニレン基、2-フルオロ-1,4-フェニレン基、3-フルオロ-1,4-フェニレン基、2,3,5,6-テトラフルオロ-1,4-フェニレン基等を;Rの2価の脂環族基としては、例えば1,2-シクロプロピレン基、1,3-シクロブチレン基、1,4-シクロヘキシレン基等を;Rの2価の複素環式基としては、例えば1,4-ピリジレン基、2,5-ピリジレン基、1,4-フラニレン基等を;Rの2価の縮合環式基としては、例えば2,6-ナフチレン基等を、それぞれ挙げることができる。Rとしては1,4-フェニレン基が好ましい。 Examples of the divalent aromatic group of the substituent R 2 include 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 2,3,5, 6-tetrafluoro-1,4-phenylene group and the like; as the divalent alicyclic group for R 2 , for example, 1,2-cyclopropylene group, 1,3-cyclobutylene group, 1,4-cyclohexylene The divalent heterocyclic group represented by R 2 includes, for example, a 1,4-pyridylene group, a 2,5-pyridylene group, a 1,4-furylene group, and the like; a divalent condensed cyclic group represented by R 2 Examples of the group include a 2,6-naphthylene group. R 2 is preferably a 1,4-phenylene group.
 上記式(1)で表される化合物の好ましい例としては、例えば下記式(1-1)~(1-5)
Figure JPOXMLDOC01-appb-C000003
(上式中、Rは、それぞれ、上記式(1)におけるRと同義である。)のそれぞれで表される桂皮酸誘導体等を挙げることができる。
Preferred examples of the compound represented by the above formula (1) include, for example, the following formulas (1-1) to (1-5):
Figure JPOXMLDOC01-appb-C000003
(In the above formulas, R 1 are each the same meaning as R 1 in the formula (1).) Of can be mentioned cinnamic acid derivatives represented by each.
 上記式(1)で表される桂皮酸誘導体は、有機化学の定法を適宜に組み合わせて合成することができる。 The cinnamic acid derivative represented by the above formula (1) can be synthesized by appropriately combining organic chemistry methods.
<エポキシ基を有するモノマーと特定の桂皮酸誘導体との反応>
 本発明の(A)成分である重合体の調製に用いられる、エポキシ基を有するモノマーと特定の桂皮酸誘導体との反応生成物(モノマー)は、上記の如きエポキシ基を有するモノマーと特定の桂皮酸誘導体とを、好ましくは触媒の存在下、好ましくは適当な有機溶媒中で反応させることにより合成することができる。
 反応に際して使用される桂皮酸誘導体の使用割合は、エポキシ基を有するモノマーに含まれるエポキシ基1モルに対して、好ましくは0.01~1.5モルであり、より好ましくは0.05~1.3モルであり、さらに好ましくは0.1~1.1モルである。
 ここで使用することのできる有機触媒としては、有機塩基またはエポキシ化合物と酸無水物との反応を促進するいわゆる硬化促進剤として公知の化合物を用いることができる。
<Reaction of monomer having epoxy group and specific cinnamic acid derivative>
The reaction product (monomer) of the monomer having an epoxy group and the specific cinnamic acid derivative used for the preparation of the polymer as the component (A) of the present invention is the monomer having the epoxy group as described above and the specific cinnamic It can be synthesized by reacting an acid derivative, preferably in the presence of a catalyst, preferably in a suitable organic solvent.
The use ratio of the cinnamic acid derivative used in the reaction is preferably 0.01 to 1.5 mol, more preferably 0.05 to 1 with respect to 1 mol of the epoxy group contained in the monomer having an epoxy group. .3 mole, more preferably 0.1 to 1.1 mole.
As the organic catalyst that can be used here, a compound known as a so-called curing accelerator that accelerates the reaction between an organic base or an epoxy compound and an acid anhydride can be used.
 上記有機塩基としては、例えばエチルアミン、ジエチルアミン、ピペラジン、ピペリジン、ピロリジン、ピロール等の1~2級有機アミン;トリエチルアミン、トリ-n-プロピルアミン、トリ-n-ブチルアミン、ピリジン、4-ジメチルアミノピリジン、ジアザビシクロウンデセン等の3級の有機アミン;テトラメチルアンモニウムヒドロキシド等の4級の有機アミン等を挙げることができる。これらの有機塩基のうち、トリエチルアミン、トリ-n-プロピルアミン、トリ-n-ブチルアミン、ピリジン、4-ジメチルアミノピリジン等の3級の有機アミン;テトラメチルアンモニウムヒドロキシド等の4級の有機アミンが好ましい。 Examples of the organic base include primary and secondary organic amines such as ethylamine, diethylamine, piperazine, piperidine, pyrrolidine, and pyrrole; triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, 4-dimethylaminopyridine, And tertiary organic amines such as diazabicycloundecene; quaternary organic amines such as tetramethylammonium hydroxide. Among these organic bases, tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine and 4-dimethylaminopyridine; quaternary organic amines such as tetramethylammonium hydroxide preferable.
 上記硬化促進剤としては、例えばベンジルジメチルアミン、2,4,6-トリス(ジメチルアミノメチル)フェノール、シクロヘキシルジメチルアミン、トリエタノールアミン等の3級アミン;2-メチルイミダゾール、2-n-ヘプチルイミダゾール、2-n-ウンデシルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール、1-ベンジル-2-メチルイミダゾール、1-ベンジル-2-フェニルイミダゾール、1,2-ジメチルイミダゾール、2-エチル-4-メチルイミダゾール、1-(2-シアノエチル)-2-メチルイミダゾール、1-(2-シアノエチル)-2-n-ウンデシルイミダゾール、1-(2-シアノエチル)-2-フェニルイミダゾール、1-(2-シアノエチル)-2-エチル-4-メチルイミダゾール、2-フェニル-4-メチル-5-ヒドロキシメチルイミダゾール、2-フェニル-4,5-ジ(ヒドロキシメチル)イミダゾール、1-(2-シアノエチル)-2-フェニル-4,5-ジ〔(2’-シアノエトキシ)メチル〕イミダゾール、1-(2-シアノエチル)-2-n-ウンデシルイミダゾリウムトリメリテート、1-(2-シアノエチル)-2-フェニルイミダゾリウムトリメリテート、1-(2-シアノエチル)-2-エチル-4-メチルイミダゾリウムトリメリテート、2,4-ジアミノ-6-〔2’-メチルイミダゾリル-(1’)〕エチル-s-トリアジン、2,4-ジアミノ-6-(2’-n-ウンデシルイミダゾリル)エチル-s-トリアジン、2,4-ジアミノ-6-〔2’-エチル-4’-メチルイミダゾリル-(1’)〕エチル-s-トリアジン、2-メチルイミダゾールのイソシアヌル酸付加物、2-フェニルイミダゾールのイソシアヌル酸付加物、2,4-ジアミノ-6-〔2’-メチルイミダゾリル-(1’)〕エチル-s-トリアジンのイソシアヌル酸付加物等のイミダゾール化合物;ジフェニルフォスフィン、トリフェニルフォスフィン、亜リン酸トリフェニル等の有機リン化合物; Examples of the curing accelerator include tertiary amines such as benzyldimethylamine, 2,4,6-tris (dimethylaminomethyl) phenol, cyclohexyldimethylamine, and triethanolamine; 2-methylimidazole, 2-n-heptylimidazole 2-n-undecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1,2-dimethylimidazole, 2- Ethyl-4-methylimidazole, 1- (2-cyanoethyl) -2-methylimidazole, 1- (2-cyanoethyl) -2-n-undecylimidazole, 1- (2-cyanoethyl) -2-phenylimidazole, 1 -(2-Cyanoethyl) -2-ethyl 4-methylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2-phenyl-4,5-di (hydroxymethyl) imidazole, 1- (2-cyanoethyl) -2-phenyl-4,5- Di [(2′-cyanoethoxy) methyl] imidazole, 1- (2-cyanoethyl) -2-n-undecylimidazolium trimellitate, 1- (2-cyanoethyl) -2-phenylimidazolium trimellitate, 1- (2-cyanoethyl) -2-ethyl-4-methylimidazolium trimellitate, 2,4-diamino-6- [2′-methylimidazolyl- (1 ′)] ethyl-s-triazine, 2,4 -Diamino-6- (2'-n-undecylimidazolyl) ethyl-s-triazine, 2,4-diamino-6- [2'-ethyl- '-Methylimidazolyl- (1')] ethyl-s-triazine, 2-methylimidazole isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct, 2,4-diamino-6- [2'-methylimidazolyl] -(1 ')] Imidazole compounds such as isocyanuric acid adducts of ethyl-s-triazine; organophosphorus compounds such as diphenylphosphine, triphenylphosphine, triphenyl phosphite;
 ベンジルトリフェニルフォスフォニウムクロライド、テトラ-n-ブチルフォスフォニウムブロマイド、メチルトリフェニルフォスフォニウムブロマイド、エチルトリフェニルフォスフォニウムブロマイド、n-ブチルトリフェニルフォスフォニウムブロマイド、テトラフェニルフォスフォニウムブロマイド、エチルトリフェニルフォスフォニウムヨーダイド、エチルトリフェニルフォスフォニウムアセテート、テトラ-n-ブチルフォスフォニウムo,o-ジエチルフォスフォロジチオネート、テトラ-n-ブチルフォスフォニウムベンゾトリアゾレート、テトラ-n-ブチルフォスフォニウムテトラフルオロボレート、テトラ-n-ブチルフォスフォニウムテトラフェニルボレート、テトラフェニルフォスフォニウムテトラフェニルボレート等の4級フォスフォニウム塩;1,8-ジアザビシクロ[5.4.0]ウンデセン-7やその有機酸塩等のジアザビシクロアルケン;オクチル酸亜鉛、オクチル酸錫、アルミニウムアセチルアセトン錯体等の有機金属化合物;テトラエチルアンモニウムブロマイド、テトラ-n-ブチルアンモニウムブロマイド、テトラエチルアンモニウムクロライド、テトラ-n-ブチルアンモニウムクロライド等の4級アンモニウム塩;三フッ化ホウ素、ホウ酸トリフェニル等のホウ素化合物;塩化亜鉛、塩化第二錫等の金属ハロゲン化合物;ジシアンジアミドやアミンとエポキシ樹脂との付加物等のアミン付加型促進剤等の高融点分散型潜在性硬化促進剤;前記イミダゾール化合物、有機リン化合物や4級フォスフォニウム塩等の硬化促進剤の表面をポリマーで被覆したマイクロカプセル型潜在性硬化促進剤;アミン塩型潜在性硬化剤促進剤;ルイス酸塩、ブレンステッド酸塩等の高温解離型の熱カチオン重合型潜在性硬化促進剤等の潜在性硬化促進剤等を挙げることができる。 Benzyltriphenylphosphonium chloride, tetra-n-butylphosphonium bromide, methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, n-butyltriphenylphosphonium bromide, tetraphenylphosphonium bromide , Ethyltriphenylphosphonium iodide, ethyltriphenylphosphonium acetate, tetra-n-butylphosphonium o, o-diethylphosphorodithionate, tetra-n-butylphosphonium benzotriazolate, tetra -N-butylphosphonium tetrafluoroborate, tetra-n-butylphosphonium tetraphenylborate, tetraphenylphosphonium tetraphenylborate Quaternary phosphonium salts such as salts; Diazabicycloalkenes such as 1,8-diazabicyclo [5.4.0] undecene-7 and organic acid salts thereof; zinc octylate, tin octylate, aluminum acetylacetone complex, etc. Organic metal compounds; tetraethylammonium bromide, tetra-n-butylammonium bromide, quaternary ammonium salts such as tetraethylammonium chloride, tetra-n-butylammonium chloride; boron compounds such as boron trifluoride and triphenylborate; Metal halide compounds such as zinc and stannic chloride; high melting point dispersion type latent curing accelerators such as amine addition accelerators such as dicyandiamide and adducts of amine and epoxy resin; imidazole compounds, organophosphorus compounds and 4 Table of curing accelerators such as grade phosphonium salts Microcapsule-type latent curing accelerator coated with polymer; amine salt-type latent curing accelerator; high-temperature dissociation type thermal cationic polymerization type latent curing accelerator such as Lewis acid salt and Bronsted acid salt Can be mentioned.
 これらのうち、好ましくはテトラエチルアンモニウムブロマイド、テトラ-n-ブチルアンモニウムブロマイド、テトラエチルアンモニウムクロライド、テトラ-n-ブチルアンモニウムクロライド等の4級アンモニウム塩である。 Of these, quaternary ammonium salts such as tetraethylammonium bromide, tetra-n-butylammonium bromide, tetraethylammonium chloride, and tetra-n-butylammonium chloride are preferable.
 触媒の使用割合としては、エポキシ基を有するモノマー100質量部に対して、好ましくは100質量部以下であり、より好ましくは0.01~100質量部、さらに好ましくは0.1~20質量部である。 The ratio of the catalyst used is preferably 100 parts by mass or less, more preferably 0.01 to 100 parts by mass, and further preferably 0.1 to 20 parts by mass with respect to 100 parts by mass of the monomer having an epoxy group. is there.
 上記有機溶媒としては、例えば炭化水素化合物、エーテル化合物、エステル化合物、ケトン化合物、アミド化合物、アルコール化合物等を挙げることができる。これらのうち、エーテル化合物、エステル化合物、ケトン化合物、アルコール化合物が原料および生成物の溶解性ならびに生成物の精製のし易さの観点から好ましい。溶媒は、固形分濃度(反応溶液中の溶媒以外の成分の質量が溶液の全質量に占める割合)が、好ましくは0.1質量%以上、より好ましくは5~50質量%となる量で使用される。
 反応温度は、好ましくは0~200℃であり、より好ましくは50~150℃である。反応時間は、好ましくは0.1~50時間であり、より好ましくは0.5~20時間である。
Examples of the organic solvent include hydrocarbon compounds, ether compounds, ester compounds, ketone compounds, amide compounds, alcohol compounds, and the like. Of these, ether compounds, ester compounds, ketone compounds, and alcohol compounds are preferred from the viewpoints of solubility of raw materials and products and ease of purification of the products. The solvent is used in such an amount that the solid content concentration (the ratio of the mass of components other than the solvent in the reaction solution to the total mass of the solution) is preferably 0.1% by mass or more, more preferably 5 to 50% by mass. Is done.
The reaction temperature is preferably 0 to 200 ° C, more preferably 50 to 150 ° C. The reaction time is preferably 0.1 to 50 hours, more preferably 0.5 to 20 hours.
 このようにして、上記エポキシ基を有するモノマーと上記式(1)で表される桂皮酸誘導体との反応生成物であるモノマーを含有する溶液が得られる。この溶液はそのまま(A)成分である重合体の調製に供してもよく、溶液中に含まれるモノマーを単離したうえで(A)成分である重合体の調製に供してもよく、または単離したモノマーを精製したうえで(A)成分である重合体の調製に供してもよい。 Thus, a solution containing a monomer which is a reaction product of the monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1) is obtained. This solution may be used as it is for the preparation of the polymer as the component (A), may be used for the preparation of the polymer as the component (A) after isolating the monomer contained in the solution. The separated monomer may be purified and then used for the preparation of the polymer as component (A).
<(A)成分の重合体>
 本発明に用いる(A)成分である重合体は、上記エポキシ基を有するモノマーと上記式(1)で表される桂皮酸誘導体との反応生成物であるモノマーを重合させて得られるポリマーである。(A)成分の重合体は、上記エポキシ基を有するモノマーと上記式(1)で表される桂皮酸誘導体との反応生成物であるモノマーとその他の重合性不飽和化合物との共重合体であることができる。
<Polymer of component (A)>
The polymer which is the component (A) used in the present invention is a polymer obtained by polymerizing a monomer which is a reaction product of the monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1). . The polymer of the component (A) is a copolymer of a monomer that is a reaction product of the monomer having an epoxy group and a cinnamic acid derivative represented by the above formula (1) and another polymerizable unsaturated compound. Can be.
 その他の重合性不飽和化合物としては、(メタ)アクリル酸アルキルエステル、(メタ)アクリル酸環状アルキルエステル、メタクリル酸アリールエステル、アクリル酸アリールエステル、不飽和ジカルボン酸ジエステル、ビシクロ不飽和化合物類、マレイミド化合物類、不飽和芳香族化合物、共役ジエン系化合物、不飽和モノカルボン酸、不飽和ジカルボン酸、不飽和ジカルボン酸無水物、これら以外の重合性不飽和化合物を挙げることができる。 Other polymerizable unsaturated compounds include (meth) acrylic acid alkyl ester, (meth) acrylic acid cyclic alkyl ester, methacrylic acid aryl ester, acrylic acid aryl ester, unsaturated dicarboxylic acid diester, bicyclounsaturated compounds, maleimide Examples include compounds, unsaturated aromatic compounds, conjugated diene compounds, unsaturated monocarboxylic acids, unsaturated dicarboxylic acids, unsaturated dicarboxylic acid anhydrides, and other polymerizable unsaturated compounds.
 これらの具体例としては、メタクリル酸アルキルエステルとして、例えばヒドロキシメチルメタクリレート、2-ヒドロキシエチルメタクリレート、3-ヒドロキシプロピルメタクリレート、4-ヒドロキシブチルメタクリレート、ジエチレングリコールモノメタクリレート、2,3-ジヒドロキシプロピルメタクリレート、2-メタクリロキシエチルグリコサイド、4-ヒドロキシフェニルメタクリレート、メチルメタクリレート、エチルメタクリレート、n-ブチルメタクリレート、sec-ブチルメタクリレート、2-エチルヘキシルメタクリレート、イソデシルメタクリレート、n-ラウリルメタクリレート、トリデシルメタクリレート、n-ステアリルメタクリレート等;アクリル酸アルキルエステルとして、例えばメチルアクリレート、イソプロピルアクリレート等;メタクリル酸環状アルキルエステルとして、例えばシクロヘキシルメタクリレート、2-メチルシクロヘキシルメタクリレート、トリシクロ[5.2.1.02,6]デカン-8-イルメタクリレート、トリシクロ[5.2.1.02,6]デカン-8-イルオキシエチルメタクリレート、イソボロニルメタクリレート、コレスタニルメタクリレート等;アクリル酸環状アルキルエステルとして、例えばシクロヘキシルアクリレート、2-メチルシクロヘキシルアクリレート、トリシクロ[5.2.1.02,6]デカン-8-イルアクリレート、トリシクロ[5.2.1.02,6]デカン-8-イルオキシエチルアクリレート、イソボロニルアクリレート、コレスタニルアクリレート等;メタクリル酸アリールエステルとして、フェニルメタクリレート、ベンジルメタクリレート等;アクリル酸アリールエステルとして、例えばフェニルアクリレート、ベンジルアクリレート等;不飽和ジカルボン酸ジエステルとして、例えばマレイン酸ジエチル、フマル酸ジエチル、イタコン酸ジエチル等; Specific examples thereof include methacrylic acid alkyl esters such as hydroxymethyl methacrylate, 2-hydroxyethyl methacrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate, diethylene glycol monomethacrylate, 2,3-dihydroxypropyl methacrylate, 2- Methacryloxyethylglycoside, 4-hydroxyphenyl methacrylate, methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, sec-butyl methacrylate, 2-ethylhexyl methacrylate, isodecyl methacrylate, n-lauryl methacrylate, tridecyl methacrylate, n-stearyl methacrylate Etc .; alkyl acrylate esters such as methyl acrylate Over DOO, isopropyl acrylate and the like; as methacrylic acid cyclic alkyl esters such as cyclohexyl methacrylate, 2-methylcyclohexyl methacrylate, tricyclo [5.2.1.0 2,6] decan-8-yl methacrylate, tricyclo [5.2. 1.0 2,6 ] decan-8-yloxyethyl methacrylate, isobornyl methacrylate, cholestanyl methacrylate and the like; acrylic acid cyclic alkyl ester such as cyclohexyl acrylate, 2-methylcyclohexyl acrylate, tricyclo [5.2.1] .0 2,6] decan-8-yl acrylate, tricyclo [5.2.1.0 2,6] decan-8-yl oxy ethyl acrylate, isobornyl acrylate, Kore stannyl acrylate; meta As aryl acrylate, phenyl methacrylate, benzyl methacrylate and the like; As acrylate aryl ester, for example, phenyl acrylate, benzyl acrylate, etc .; As unsaturated dicarboxylic acid diester, for example, diethyl maleate, diethyl fumarate, diethyl itaconate, etc .;
 ビシクロ不飽和化合物類として、例えばビシクロ[2.2.1]ヘプト-2-エン、5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-メトキシビシクロ[2.2.1]ヘプト-2-エン、5-エトキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジメトキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジエトキシビシクロ[2.2.1]ヘプト-2-エン、5-(2’-ヒドロキシエチル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ジヒドロキシビシクロ[2.2.1]ヘプト-2-エン、5,6-ジ(ヒドロキシメチル)ビシクロ[2.2.1]ヘプト-2-エン、5,6-ジ(2’-ヒドロキシエチル)ビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシ-5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシ-5-エチルビシクロ[2.2.1]ヘプト-2-エン、5-ヒドロキシメチル-5-メチルビシクロ[2.2.1]ヘプト-2-エン等;マレイミド化合物類として、例えばフェニルマレイミド、シクロヘキシルマレイミド、ベンジルマレイミド、N-スクシンイミジル-3-マレイミドベンゾエート、N-スクシンイミジル-4-マレイミドブチレート、N-スクシンイミジル-6-マレイミドカプロエート、N-スクシンイミジル-3-マレイミドプロピオネート、N-(9-アクリジニル)マレイミド等;不飽和芳香族化合物として、例えばスチレン、α-メチルスチレン、m-メチルスチレン、p-メチルスチレン、ビニルトルエン、p-メトキシスチレン等;共役ジエン系化合物として、1,3-ブタジエン、イソプレン、2,3-ジメチル-1,3-ブタジエン等;不飽和モノカルボン酸として、例えばアクリル酸、メタクリル酸、クロトン酸等;不飽和ジカルボン酸として、マレイン酸、フマル酸、シトラコン酸、メサコン酸、イタコン酸等;不飽和ジカルボン酸無水物として、上記不飽和ジカルボン酸の各無水物;上記以外の重合性不飽和化合物として、例えばアクリロニトリル、メタクリロニトリル、塩化ビニル、塩化ビニリデン、アクリルアミド、メタクリルアミド、酢酸ビニル等をそれぞれ挙げることができる。 Examples of bicyclo unsaturated compounds include bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2.2.1]. Hept-2-ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxybicyclo [2.2.1] hept-2-ene, 5,6-dimethoxybicyclo [2.2 .1] Hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept-2-ene, 5- (2′-hydroxyethyl) bicyclo [2.2.1] hept-2- Ene, 5,6-dihydroxybicyclo [2.2.1] hept-2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept-2-ene, 5,6-di ( 2'-hydroxyethyl) bicyclo [2.2.1] hept-2 Ene, 5-hydroxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-hydroxymethyl-5 -Methylbicyclo [2.2.1] hept-2-ene and the like; as maleimide compounds, for example, phenylmaleimide, cyclohexylmaleimide, benzylmaleimide, N-succinimidyl-3-maleimidobenzoate, N-succinimidyl-4-maleimidobutyrate N-succinimidyl-6-maleimidocaproate, N-succinimidyl-3-maleimide propionate, N- (9-acridinyl) maleimide, etc .; unsaturated aromatic compounds such as styrene, α-methylstyrene, m- Methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, etc .; conjugated diene compounds such as 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene; unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, etc. As unsaturated dicarboxylic acid, maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, etc .; as unsaturated dicarboxylic acid anhydride, each unsaturated dicarboxylic acid anhydride; as polymerizable unsaturated compound other than the above Examples thereof include acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate and the like.
 (A)成分である重合体における上記エポキシ基を有するモノマーと上記式(1)で表される桂皮酸誘導体との反応生成物であるモノマーの共重合割合は、好ましくは30モル%以上であり、より好ましくは50モル%以上である。配向感度の点からは、70モル%以上であるのがさらに好ましい。 The copolymerization ratio of the monomer which is a reaction product of the monomer having an epoxy group and the cinnamic acid derivative represented by the above formula (1) in the polymer as the component (A) is preferably 30 mol% or more. More preferably, it is 50 mol% or more. From the viewpoint of orientation sensitivity, it is more preferably 70 mol% or more.
 (A)成分である重合体の合成は、好ましくは溶媒中、適当な重合開始剤の存在下における公知のラジカル重合法により行うことができる。 The synthesis of the polymer as component (A) can be carried out by a known radical polymerization method, preferably in a solvent and in the presence of a suitable polymerization initiator.
 このようにして、(A)成分である重合体を含有する溶液が得られる。この溶液はそのまま液晶配向剤の調製に供してもよく、溶液中に含まれる重合体を単離したうえで液晶配向剤の調製に供してもよく、または単離した重合体を精製したうえで液晶配向剤の調製に供してもよい。 Thus, a solution containing the polymer as the component (A) is obtained. This solution may be used as it is for the preparation of the liquid crystal aligning agent, may be used for the preparation of the liquid crystal aligning agent after isolating the polymer contained in the solution, or after the isolated polymer is purified. You may use for preparation of a liquid crystal aligning agent.
<(B)成分>
 本発明の硬化膜形成組成物における(B)成分は、架橋剤である。
 (B)成分である架橋剤として、前記(A)成分の熱架橋可能な官能基と架橋を形成する基を2個以上有する化合物が好ましく、例えばメチロール基またはアルコキシメチル基を2個以上有する架橋剤であることが好ましい。これらの基を有する化合物としては、例えば、アルコキシメチル化グリコールウリル、アルコキシメチル化ベンゾグアナミンおよびアルコキシメチル化メラミン等のメチロール化合物が挙げられる。
<(B) component>
Component (B) in the cured film forming composition of the present invention is a crosslinking agent.
As the crosslinking agent as component (B), a compound having at least two groups capable of forming a crosslink with the thermally crosslinkable functional group of component (A) is preferable. For example, a crosslinking having at least two methylol groups or alkoxymethyl groups. It is preferable that it is an agent. Examples of the compound having these groups include methylol compounds such as alkoxymethylated glycoluril, alkoxymethylated benzoguanamine, and alkoxymethylated melamine.
 アルコキシメチル化グリコールウリルの具体例としては、例えば、1,3,4,6-テトラキス(メトキシメチル)グリコールウリル、1,3,4,6-テトラキス(ブトキシメチル)グリコールウリル、1,3,4,6-テトラキス(ヒドロキシメチル)グリコールウリル、1,3-ビス(ヒドロキシメチル)尿素、1,1,3,3-テトラキス(ブトキシメチル)尿素、1,1,3,3-テトラキス(メトキシメチル)尿素、1,3-ビス(ヒドロキシメチル)-4,5-ジヒドロキシ-2-イミダゾリノン、および1,3-ビス(メトキシメチル)-4,5-ジメトキシ-2-イミダゾリノン等が挙げられる。市販品として、日本サイテック・インダストリーズ(株)(旧 三井サイテック(株))製グリコールウリル化合物(商品名:サイメル(登録商標)1170、パウダーリンク(登録商標)1174)等の化合物、メチル化尿素樹脂(商品名:UFR(登録商標)65)、ブチル化尿素樹脂(商品名:UFR(登録商標)300、U-VAN10S60、U-VAN10R、U-VAN11HV)、DIC(株)(旧 大日本インキ化学工業(株))製尿素/ホルムアルデヒド系樹脂(高縮合型、商品名:ベッカミン(登録商標)J-300S、同P-955、同N)等が挙げられる。 Specific examples of the alkoxymethylated glycoluril include, for example, 1,3,4,6-tetrakis (methoxymethyl) glycoluril, 1,3,4,6-tetrakis (butoxymethyl) glycoluril, 1,3,4 , 6-tetrakis (hydroxymethyl) glycoluril, 1,3-bis (hydroxymethyl) urea, 1,1,3,3-tetrakis (butoxymethyl) urea, 1,1,3,3-tetrakis (methoxymethyl) Examples include urea, 1,3-bis (hydroxymethyl) -4,5-dihydroxy-2-imidazolinone, and 1,3-bis (methoxymethyl) -4,5-dimethoxy-2-imidazolinone. Commercially available compounds such as glycoluril compounds (trade names: Cymel (registered trademark) 1170, Powderlink (registered trademark) 1174) manufactured by Nippon Cytec Industries Co., Ltd. (former Mitsui Cytec Co., Ltd.), methylated urea resins (Trade name: UFR (registered trademark) 65), butylated urea resin (trade names: UFR (registered trademark) 300, U-VAN10S60, U-VAN10R, U-VAN11HV), DIC Corporation (formerly Dainippon Ink Chemical Co., Ltd.) Urea / formaldehyde resin (high condensation type, trade name: Beccamin (registered trademark) J-300S, P-955, N) manufactured by Kogyo Co., Ltd.).
 アルコキシメチル化ベンゾグアナミンの具体例としてはテトラメトキシメチルベンゾグアナミン等が挙げられる。市販品として、日本サイテック・インダストリーズ(株)(旧 三井サイテック(株))製(商品名:サイメル(登録商標)1123)、(株)三和ケミカル製(商品名:ニカラック(登録商標)BX-4000、同BX-37、同BL-60、同BX-55H)等が挙げられる。 Specific examples of alkoxymethylated benzoguanamine include tetramethoxymethylbenzoguanamine. Commercially available products are made by Nippon Cytec Industries Co., Ltd. (formerly Mitsui Cytec Co., Ltd.) (trade name: Cymel (registered trademark) 1123), manufactured by Sanwa Chemical Co., Ltd. (product name: Nicarak (registered trademark) BX-) 4000, BX-37, BL-60, BX-55H) and the like.
 アルコキシメチル化メラミンの具体例としては、例えば、ヘキサメトキシメチルメラミン等が挙げられる。市販品として、日本サイテック・インダストリーズ(株)(旧 三井サイテック(株))製メトキシメチルタイプメラミン化合物(商品名:サイメル(登録商標)300、同301、同303、同350)、ブトキシメチルタイプメラミン化合物(商品名:マイコート(登録商標)506、同508)、(株)三和ケミカル製メトキシメチルタイプメラミン化合物(商品名:ニカラック(登録商標)MW-30、同MW-22、同MW-11、同MS-001、同MX-002、同MX-730、同MX-750、同MX-035)、ブトキシメチルタイプメラミン化合物(商品名:ニカラック(登録商標)MX-45、同MX-410、同MX-302)等が挙げられる。 Specific examples of alkoxymethylated melamine include, for example, hexamethoxymethylmelamine. As commercially available products, methoxymethyl type melamine compounds (trade names: Cymel (registered trademark) 300, 301, 303, 350) manufactured by Nippon Cytec Industries Co., Ltd. (former Mitsui Cytec Co., Ltd.), butoxymethyl type melamine Compound (trade name: My Coat (registered trademark) 506, 508), methoxymethyl type melamine compound (trade name: Nicalac (registered trademark) MW-30, MW-22, MW-) manufactured by Sanwa Chemical Co., Ltd. 11, MS-001, MX-002, MX-730, MX-750, MX-035), butoxymethyl type melamine compound (trade name: Nicalac (registered trademark) MX-45, MX-410) , MX-302).
 また、架橋剤として、アミノ基の水素原子がメチロール基またはアルコキシメチル基で置換されたメラミン化合物、尿素化合物、グリコールウリル化合物およびベンゾグアナミン化合物を縮合させて得られる化合物であってもよい。例えば、米国特許第6323310号に記載されているメラミン化合物およびベンゾグアナミン化合物から製造される高分子量の化合物が挙げられる。前記メラミン化合物の市販品としては、商品名:サイメル(登録商標)303等が挙げられ、前記ベンゾグアナミン化合物の市販品としては、商品名:サイメル(登録商標)1123(以上、日本サイテック・インダストリーズ(株)(旧 三井サイテック(株))製)等が挙げられる。 Further, as a crosslinking agent, a compound obtained by condensing a melamine compound, urea compound, glycoluril compound and benzoguanamine compound in which a hydrogen atom of an amino group is substituted with a methylol group or an alkoxymethyl group may be used. For example, the high molecular weight compound manufactured from the melamine compound and the benzoguanamine compound which are described in US Patent 6,323,310 is mentioned. Examples of commercially available products of the melamine compound include trade name: Cymel (registered trademark) 303 and the like. Examples of commercially available products of the benzoguanamine compound include product name: Cymel (registered trademark) 1123 (Nippon Cytec Industries, Ltd.). ) (Formerly Mitsui Cytec Co., Ltd.).
 さらに、(B)成分の架橋剤として、N-ヒドロキシメチルアクリルアミド、N-メトキシメチルメタクリルアミド、N-エトキシメチルアクリルアミド、N-ブトキシメチルメタクリルアミド等のヒドロキシメチル基(すなわちメチロール基)またはアルコキシメチル基で置換されたアクリルアミド化合物またはメタクリルアミド化合物を使用して製造されるポリマーも用いることができる。 Further, as a crosslinking agent for the component (B), hydroxymethyl groups (that is, methylol groups) or alkoxymethyl groups such as N-hydroxymethylacrylamide, N-methoxymethylmethacrylamide, N-ethoxymethylacrylamide, N-butoxymethylmethacrylamide, etc. Polymers produced using an acrylamide compound or a methacrylamide compound substituted with a can also be used.
 そのようなポリマーとしては、例えば、ポリ(N-ブトキシメチルアクリルアミド)、N-ブトキシメチルアクリルアミドとスチレンとの共重合体、N-ヒドロキシメチルメタクリルアミドとメチルメタクリレートとの共重合体、N-エトキシメチルメタクリルアミドとベンジルメタクリレートとの共重合体、およびN-ブトキシメチルアクリルアミドとベンジルメタクリレートと2-ヒドロキシプロピルメタクリレートとの共重合体等が挙げられる。 Examples of such a polymer include poly (N-butoxymethylacrylamide), a copolymer of N-butoxymethylacrylamide and styrene, a copolymer of N-hydroxymethylmethacrylamide and methylmethacrylate, and N-ethoxymethyl. And a copolymer of methacrylamide and benzyl methacrylate, a copolymer of N-butoxymethylacrylamide, benzyl methacrylate and 2-hydroxypropyl methacrylate.
 また、そのようなポリマーとして、N-アルコキシメチル基とC=C二重結合とを含む重合性基とを有する重合体を用いることも出来る。 As such a polymer, a polymer having an N-alkoxymethyl group and a polymerizable group containing a C═C double bond can also be used.
 C=C二重結合を含む重合性基としては、アクリル基、メタクリル基、ビニル基、アリル基、マレイミド基等が挙げられる。 Examples of the polymerizable group containing a C═C double bond include an acryl group, a methacryl group, a vinyl group, an allyl group, and a maleimide group.
 上記のようなポリマーを得る方法は、特に限定されない。一例を挙げれば、予めラジカル重合などの重合方法によって、特定官能基を有するアクリル重合体を生成する。次いで、アクリル重合体の有する特定官能基と、末端に不飽和結合を有する化合物(以下、特定化合物と称す。)とを反応させることにより、(B)成分であるポリマーにC=C二重結合を含む重合性基を導入することができる。 The method for obtaining the polymer as described above is not particularly limited. For example, an acrylic polymer having a specific functional group is generated in advance by a polymerization method such as radical polymerization. Next, by reacting a specific functional group of the acrylic polymer with a compound having an unsaturated bond at the terminal (hereinafter referred to as a specific compound), the polymer as the component (B) is reacted with a C = C double bond. A polymerizable group containing can be introduced.
 ここで、アクリル重合体の有する特定官能基とは、カルボキシル基、グリシジル基、ヒドロキシ基、活性水素を有するアミノ基、フェノール性ヒドロキシ基若しくはイソシアネート基などの官能基、またはこれらから選ばれる複数種の官能基を言う。 Here, the specific functional group possessed by the acrylic polymer is a functional group such as a carboxyl group, a glycidyl group, a hydroxy group, an amino group having active hydrogen, a phenolic hydroxy group or an isocyanate group, or a plurality of types selected from these functional groups. Say functional group.
 上述した反応において、アクリル重合体の有する特定官能基と、特定化合物が有する官能基であって反応に関与する基との好ましい組み合わせは、カルボキシル基とエポキシ基、ヒドロキシ基とイソシアネート基、フェノール性ヒドロキシ基とエポキシ基、カルボキシル基とイソシアネート基、アミノ基とイソシアネート基、または、ヒドロキシ基と酸クロリド-基などである。さらに、より好ましい組み合わせは、カルボキシル基とグリシジルメタクリレート中のエポキシ基、または、ヒドロキシ基とイソシアネートエチルメタクリレート中のイソシアネート基である。 In the above-described reaction, the preferred combination of the specific functional group possessed by the acrylic polymer and the functional group possessed by the specific compound and involved in the reaction is a carboxyl group and an epoxy group, a hydroxy group and an isocyanate group, or a phenolic hydroxy group. Groups and epoxy groups, carboxyl groups and isocyanate groups, amino groups and isocyanate groups, or hydroxy groups and acid chloride groups. Furthermore, a more preferable combination is an epoxy group in a carboxy group and glycidyl methacrylate, or an isocyanate group in a hydroxy group and isocyanate ethyl methacrylate.
 このようなポリマーの重量平均分子量(ポリスチレン換算値)は、1,000~500,000であり、好ましくは、2,000~200,000であり、より好ましくは3,000~150,000であり、更に好ましくは3,000~50,000である。 The weight average molecular weight (polystyrene equivalent value) of such a polymer is 1,000 to 500,000, preferably 2,000 to 200,000, more preferably 3,000 to 150,000. More preferably, it is 3,000 to 50,000.
 これらの架橋剤は、単独でまたは2種以上を組み合わせて使用することができる。 These cross-linking agents can be used alone or in combination of two or more.
 本発明の硬化膜形成組成物における(B)成分の架橋剤の含有量は、(A)成分であるポリマー100質量部に基づいて1質量部~500質量部であることが好ましく、より好ましくは5質量部~400質量部である。架橋剤の含有量が過小である場合には、硬化膜形成組成物から得られる硬化膜の溶剤耐性が低下し、液晶配向性が低下する。他方、含有量が過大である場合には液晶配向性および保存安定性が低下することがある。 The content of the crosslinking agent as the component (B) in the cured film forming composition of the present invention is preferably 1 part by mass to 500 parts by mass, more preferably based on 100 parts by mass of the polymer as the component (A). 5 parts by mass to 400 parts by mass. When content of a crosslinking agent is too small, the solvent tolerance of the cured film obtained from a cured film formation composition will fall, and liquid crystal orientation will fall. On the other hand, when the content is excessive, the liquid crystal orientation and storage stability may be lowered.
<(C)成分>
 本発明の硬化膜形成組成物は、(C)成分として、ヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基からなる群から選ばれる少なくとも1つの基を有するポリマーを含有しても良い。
<(C) component>
The cured film forming composition of the present invention may contain a polymer having at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group as the component (C). good.
 (C)成分であるポリマーとしては、例えば、アクリル重合体、ポリアミック酸、ポリイミド、ポリビニルアルコール、ポリエステル、ポリエステルポリカルボン酸、ポリエーテルポリオール、ポリエステルポリオール、ポリカーボネートポリオール、ポリカプロラクトンポリオール、ポリアルキレンイミン、ポリアリルアミン、セルロース類(セルロースまたはその誘導体)、フェノールノボラック樹脂およびメラミンホルムアルデヒド樹脂等の直鎖構造または分岐構造を有するポリマー、並びにシクロデキストリン類等の環状ポリマー等が挙げられる。 Examples of the polymer as the component (C) include acrylic polymer, polyamic acid, polyimide, polyvinyl alcohol, polyester, polyester polycarboxylic acid, polyether polyol, polyester polyol, polycarbonate polyol, polycaprolactone polyol, polyalkyleneimine, poly Examples include allylamines, celluloses (cellulose or derivatives thereof), polymers having a linear or branched structure such as phenol novolac resins and melamine formaldehyde resins, and cyclic polymers such as cyclodextrins.
 (C)成分であるポリマーとしては、好ましくは、アクリル重合体、ヒドロキシアルキルシクロデキストリン類、セルロース類、ポリエーテルポリオール、ポリエステルポリオール、ポリカーボネートポリオール並びにポリカプロラクトンポリオールが挙げられる。 The polymer as the component (C) preferably includes acrylic polymers, hydroxyalkylcyclodextrins, celluloses, polyether polyols, polyester polyols, polycarbonate polyols, and polycaprolactone polyols.
 (C)成分のポリマーの好ましい一例であるアクリル重合体としては、アクリル酸、メタクリル酸、スチレン、ビニル化合物等の不飽和二重結合を有するモノマーを重合して得られる重合体であって、特定官能基を有するモノマーを含むモノマーまたはその混合物を重合させることにより得られる重合体であればよく、アクリル重合体を構成する高分子の主鎖の骨格および側鎖の種類などについて特に限定されない。 The acrylic polymer which is a preferred example of the polymer of component (C) is a polymer obtained by polymerizing a monomer having an unsaturated double bond such as acrylic acid, methacrylic acid, styrene, vinyl compound, etc. It may be a polymer obtained by polymerizing a monomer containing a monomer having a functional group or a mixture thereof, and is not particularly limited with respect to the skeleton of the main chain of the polymer constituting the acrylic polymer and the type of side chain.
 特定官能基を有するモノマーとしては、ポリエチレングリコールエステル基を有するモノマー、炭素原子数2~5のヒドロキシアルキルエステル基を有するモノマー、フェノール性ヒドロキシ基を有するモノマー、カルボキシル基を有するモノマー、アミノ基を有するモノマー、アルコキシシリル基を有するモノマー、及び下記式(2)
Figure JPOXMLDOC01-appb-C000004
(式中、R62は炭素原子数1~12のアルキル基、炭素原子数1~12のアルコキシ基又はフェニル基を表す。)で表される基を有するモノマーが挙げられる。
The monomer having a specific functional group includes a monomer having a polyethylene glycol ester group, a monomer having a hydroxyalkyl ester group having 2 to 5 carbon atoms, a monomer having a phenolic hydroxy group, a monomer having a carboxyl group, and an amino group. A monomer, a monomer having an alkoxysilyl group, and the following formula (2):
Figure JPOXMLDOC01-appb-C000004
(Wherein R 62 represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or a phenyl group), and a monomer having a group represented by the formula:
 上述したポリエチレングリコールエステル基を有するモノマーとしては、H-(OCHCH-OHのモノアクリレートまたはモノメタクリレートが挙げられる。そのnの値は2~50であり、好ましくは2~10である。 Examples of the monomer having a polyethylene glycol ester group described above include monoacrylate or monomethacrylate of H— (OCH 2 CH 2 ) n —OH. The value of n is 2 to 50, preferably 2 to 10.
 上述した炭素原子数2~5のヒドロキシアルキルエステル基を有するモノマーとしては、例えば、2-ヒドロキシエチルメタクリレート、2-ヒドロキシエチルアクリレート、2-ヒドロキシプロピルメタクリレート、2-ヒドロキシプロピルアクリレート、4-ヒドロキシブチルアクリレート、4-ヒドロキシブチルメタクリレートが挙げられる。 Examples of the monomer having a hydroxyalkyl ester group having 2 to 5 carbon atoms include 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl methacrylate, 2-hydroxypropyl acrylate, and 4-hydroxybutyl acrylate. 4-hydroxybutyl methacrylate.
 上述したフェノール性ヒドロキシ基を有するモノマーとしては、例えば、p-ヒドロキシスチレン、m-ヒドロキシスチレン、o-ヒドロキシスチレンが挙げられる。 Examples of the above-mentioned monomer having a phenolic hydroxy group include p-hydroxystyrene, m-hydroxystyrene, and o-hydroxystyrene.
 上述したカルボキシル基を有するモノマーとしては、例えば、アクリル酸、メタクリル酸、ビニル安息香酸が挙げられる。 Examples of the above-mentioned monomer having a carboxyl group include acrylic acid, methacrylic acid, and vinyl benzoic acid.
 上述したアミノ基を有するモノマーとしては、例えば、2-アミノエチルアクリレート、2-アミノエチルメタクリレート、アミノプロピルアクリレートおよびアミノプロピルメタクリレートが挙げられる。 Examples of the monomer having an amino group described above include 2-aminoethyl acrylate, 2-aminoethyl methacrylate, aminopropyl acrylate, and aminopropyl methacrylate.
 上述したアルコキシシリル基を有するモノマーとしては、例えば、3-アクリロキシプロピルトリメトキシシラン、3-アクリロキシプロピルトリエトキシシラン、3-メタクリロキシプロピルトリメトキシシラン、3-メタクリロキシプロピルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、アリルトリメトキシシランおよびアリルトリエトキシシラン等が挙げられる。 Examples of the monomer having an alkoxysilyl group include 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, vinyl, and the like. Examples include trimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, and allyltriethoxysilane.
 上記式(2)中、R62における炭素原子数1~12のアルキル基及び炭素原子数1~12のアルコキシ基としては、上記に例示したアルキル基又はアルコキシ基のうち該当する炭素原子数の基が挙げられる。
 上述した式(2)で表される基を有するモノマーとしては、例えば以下の式[2-1]乃至[2-5]で表される基を有するモノマー等が挙げられる。
Figure JPOXMLDOC01-appb-C000005
In the above formula (2), the alkyl group having 1 to 12 carbon atoms and the alkoxy group having 1 to 12 carbon atoms in R 62 are groups having the corresponding number of carbon atoms among the alkyl groups and alkoxy groups exemplified above. Is mentioned.
Examples of the monomer having a group represented by the above formula (2) include monomers having groups represented by the following formulas [2-1] to [2-5].
Figure JPOXMLDOC01-appb-C000005
 また、本実施形態においては、(C)成分の例であるアクリル重合体を合成するに際し、本発明の効果を損なわない限り、ヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基で表される基のいずれも有さないモノマーを併用することができる。 Moreover, in this embodiment, when synthesizing an acrylic polymer which is an example of the component (C), a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group are used as long as the effects of the present invention are not impaired. Monomers that do not have any of the groups represented can be used in combination.
 そのようなモノマーの具体例としては、アクリル酸エステル化合物、メタクリル酸エステル化合物、マレイミド化合物、アクリロニトリル、マレイン酸無水物、スチレン化合物およびビニル化合物等が挙げられる。 Specific examples of such monomers include acrylic ester compounds, methacrylic ester compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds and vinyl compounds.
 アクリル酸エステル化合物としては、例えば、メチルアクリレート、エチルアクリレート、イソプロピルアクリレート、ベンジルアクリレート、ナフチルアクリレート、アントリルアクリレート、アントリルメチルアクリレート、フェニルアクリレート、2,2,2-トリフルオロエチルアクリレート、tert-ブチルアクリレート、シクロヘキシルアクリレート、イソボルニルアクリレート、2-メトキシエチルアクリレート、メトキシトリエチレングリコールアクリレート、2-エトキシエチルアクリレート、テトラヒドロフルフリルアクリレート、3-メトキシブチルアクリレート、2-メチル-2-アダマンチルアクリレート、2-プロピル-2-アダマンチルアクリレート、8-メチル-8-トリシクロデシルアクリレート、および8-エチル-8-トリシクロデシルアクリレート等が挙げられる。 Examples of the acrylic ester compound include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthryl methyl acrylate, phenyl acrylate, 2,2,2-trifluoroethyl acrylate, tert-butyl. Acrylate, cyclohexyl acrylate, isobornyl acrylate, 2-methoxyethyl acrylate, methoxytriethylene glycol acrylate, 2-ethoxyethyl acrylate, tetrahydrofurfuryl acrylate, 3-methoxybutyl acrylate, 2-methyl-2-adamantyl acrylate, 2- Propyl-2-adamantyl acrylate, 8-methyl-8-tricyclodecyl acrylate, Preliminary 8-ethyl-8-tricyclodecyl acrylate.
 メタクリル酸エステル化合物としては、例えば、メチルメタクリレート、エチルメタクリレート、イソプロピルメタクリレート、ベンジルメタクリレート、ナフチルメタクリレート、アントリルメタクリレート、アントリルメチルメタクリレート、フェニルメタクリレート、2,2,2-トリフルオロエチルメタクリレート、tert-ブチルメタクリレート、シクロヘキシルメタクリレート、イソボルニルメタクリレート、2-メトキシエチルメタクリレート、メトキシトリエチレングリコールメタクリレート、2-エトキシエチルメタクリレート、テトラヒドロフルフリルメタクリレート、3-メトキシブチルメタクリレート、2-メチル-2-アダマンチルメタクリレート、2-プロピル-2-アダマンチルメタクリレート、8-メチル-8-トリシクロデシルメタクリレート、および8-エチル-8-トリシクロデシルメタクリレート等が挙げられる。 Examples of the methacrylic acid ester compound include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthryl methyl methacrylate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate, tert-butyl. Methacrylate, cyclohexyl methacrylate, isobornyl methacrylate, 2-methoxyethyl methacrylate, methoxytriethylene glycol methacrylate, 2-ethoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 3-methoxybutyl methacrylate, 2-methyl-2-adamantyl methacrylate, 2- Propyl-2-adamantyl methacrylate, 8-me Le -8- tricyclodecyl methacrylate, and 8-ethyl-8-tricyclodecyl methacrylate.
 マレイミド化合物としては、例えば、マレイミド、N-メチルマレイミド、N-フェニルマレイミド、およびN-シクロヘキシルマレイミド等が挙げられる。 Examples of maleimide compounds include maleimide, N-methylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide.
 スチレン化合物としては、例えば、スチレン、メチルスチレン、クロロスチレン、およびブロモスチレン等が挙げられる。 Examples of the styrene compound include styrene, methylstyrene, chlorostyrene, and bromostyrene.
 ビニル化合物としては、例えば、ビニルエーテル、メチルビニルエーテル、ベンジルビニルエーテル、2-ヒドロキシエチルビニルエーテル、フェニルビニルエーテル、および、プロピルビニルエーテル等が挙げられる。 Examples of the vinyl compound include vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether.
 (C)成分の例であるアクリル重合体を得るために用いる特定官能基を有するモノマーの使用量は、(C)成分であるアクリル重合体を得るために用いる全モノマーの合計量に基づいて、2モル%以上であることが好ましい。特定官能基を有するモノマーが過小の場合は、得られる硬化膜の耐溶剤性が不充分となり易い。 (C) The usage-amount of the monomer which has a specific functional group used in order to obtain the acrylic polymer which is an example of a component is based on the total amount of all the monomers used in order to obtain the acrylic polymer which is (C) component, It is preferable that it is 2 mol% or more. If the monomer having a specific functional group is too small, the solvent resistance of the resulting cured film tends to be insufficient.
 (C)成分の例であるアクリル重合体を得る方法は特に限定されないが、例えば、特定官能基を有するモノマーを含むモノマーと、所望により特定官能基を有さないモノマーと、重合開始剤等とを共存させた溶剤中において、50℃~110℃の温度下で重合反応により得られる。その際、用いられる溶剤は、特定官能基を有するモノマーと、所望により用いられる特定官能基を有さないモノマーおよび重合開始剤等を溶解するものであれば特に限定されない。具体例としては、後述する[溶剤]の項に記載する。 (C) Although the method to obtain the acrylic polymer which is an example of a component is not specifically limited, For example, the monomer containing the monomer which has a specific functional group, the monomer which does not have a specific functional group depending on necessity, a polymerization initiator, etc. Can be obtained by a polymerization reaction at a temperature of 50 ° C. to 110 ° C. in a solvent coexisting with. In that case, the solvent used will not be specifically limited if it dissolves the monomer which has a specific functional group, the monomer which does not have the specific functional group used depending on necessity, a polymerization initiator, etc. Specific examples are described in the section of [Solvent] described later.
 以上の方法により得られる(C)成分の例であるアクリル重合体は、通常、溶剤に溶解した溶液の状態である。 The acrylic polymer which is an example of the component (C) obtained by the above method is usually in a solution state dissolved in a solvent.
 また、上記方法で得られた(C)成分の例であるアクリル重合体の溶液を、攪拌下のジエチルエーテルや水等に投入して再沈殿させ、生成した沈殿物を濾過・洗浄した後に、常圧または減圧下で、常温乾燥または加熱乾燥し、(C)成分の例であるアクリル重合体の粉体とすることができる。上述の操作により、(C)成分の例であるアクリル重合体と共存する重合開始剤および未反応のモノマーを除去することができ、その結果、精製した(C)成分の例であるアクリル重合体の粉体が得られる。一度の操作で充分に精製できない場合は、得られた粉体を溶剤に再溶解させ、上述の操作を繰り返し行えば良い。 In addition, the acrylic polymer solution, which is an example of the component (C) obtained by the above method, is poured into diethyl ether or water under stirring to cause reprecipitation, and the generated precipitate is filtered and washed. Under normal or reduced pressure, it can be dried at room temperature or by heating to obtain an acrylic polymer powder as an example of the component (C). By the above-mentioned operation, the polymerization initiator and unreacted monomer coexisting with the acrylic polymer which is an example of the component (C) can be removed, and as a result, the acrylic polymer which is an example of the purified component (C) Of powder is obtained. If sufficient purification cannot be achieved by a single operation, the obtained powder may be redissolved in a solvent and the above operation may be repeated.
 (C)成分の好ましい例であるアクリル重合体は、重量平均分子量が3000~200000であることが好ましく、4000~150000であることがより好ましく、5000~100000であることがさらに好ましい。重量平均分子量が200000を超えて過大なものであると、溶剤に対する溶解性が低下しハンドリング性が低下する場合があり、重量平均分子量が3000未満で過小なものであると、熱硬化時に硬化不足になり溶剤耐性が低下する場合がある。尚、重量平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)により、標準資料としてポリスチレンを用いて得られる値である。以下、本明細書においても同様とする。 The acrylic polymer which is a preferred example of the component (C) has a weight average molecular weight of preferably 3000 to 200000, more preferably 4000 to 150,000, and further preferably 5000 to 100,000. If the weight average molecular weight exceeds 200,000, the solvent solubility may decrease and handling may decrease. If the weight average molecular weight is less than 3,000, the curing may be insufficient during thermal curing. And solvent resistance may be reduced. The weight average molecular weight is a value obtained by using gel as a standard material by gel permeation chromatography (GPC). Hereinafter, the same applies to this specification.
 次に、(C)成分のポリマーの好ましい一例であるポリエーテルポリオールとしては、ポリエチレングリコール、ポリプロピレングリコール、プロピレングリコールやビスフェノールA、トリエチレングリコール、ソルビトール等の多価アルコールにプロピレンオキサイドやポリエチレングリコール、ポリプロピレングリコール等を付加したものが挙げられる。ポリエーテルポリオールの具体例としてはADEKA製アデカポリエーテルPシリーズ、Gシリーズ、EDPシリーズ、BPXシリーズ、FCシリーズ、CMシリーズ、日油製ユニオックス(登録商標)HC-40、HC-60、ST-30E、ST-40E、G-450、G-750、ユニオール(登録商標)TG-330、TG-1000、TG-3000、TG-4000、HS-1600D、DA-400、DA-700、DB-400、ノニオン(登録商標)LT-221、ST-221、OT-221等が挙げられる。 Next, as a polyether polyol which is a preferable example of the polymer of component (C), polyethylene glycol, polypropylene glycol, propylene glycol, bisphenol A, triethylene glycol, polyhydric alcohol such as sorbitol, propylene oxide, polyethylene glycol, polypropylene The thing which added glycol etc. is mentioned. Specific examples of polyether polyols include ADEKA Adeka Polyether P Series, G Series, EDP Series, BPX Series, FC Series, CM Series, NOF UNIOX (registered trademark) HC-40, HC-60, ST- 30E, ST-40E, G-450, G-750, Uniol (registered trademark) TG-330, TG-1000, TG-3000, TG-4000, HS-1600D, DA-400, DA-700, DB-400 Nonion (registered trademark) LT-221, ST-221, OT-221 and the like.
 (C)成分のポリマーの好ましい一例であるポリエステルポリオールとしては、アジピン酸、セバシン酸、イソフタル酸等の多価カルボン酸にエチレングリコール、プロピレングリコール、ブチレングリコール、ポリエチレングリコール、ポリプロピレングリコール等のジオールを反応させたものが挙げられる。ポリエステルポリオールの具体例としてはDIC製ポリライト(登録商標)OD-X-286、OD-X-102、OD-X-355、OD-X-2330、OD-X-240、OD-X-668、OD-X-2108、OD-X-2376、OD-X-2044、OD-X-688、OD-X-2068、OD-X-2547、OD-X-2420、OD-X-2523、OD-X-2555、OD-X-2560、クラレ製ポリオールP-510、P-1010、P-2010、P-3010、P-4010、P-5010、P-6010、F-510、F-1010、F-2010、F-3010、P-1011、P-2011、P-2013、P-2030、N-2010、PNNA-2016等が挙げられる。 As a polyester polyol which is a preferred example of the polymer of component (C), a diol such as ethylene glycol, propylene glycol, butylene glycol, polyethylene glycol or polypropylene glycol is reacted with a polyvalent carboxylic acid such as adipic acid, sebacic acid or isophthalic acid. Can be mentioned. Specific examples of the polyester polyol include DIC polylite (registered trademark) OD-X-286, OD-X-102, OD-X-355, OD-X-2330, OD-X-240, OD-X-668, OD-X-2108, OD-X-2376, OD-X-2044, OD-X-688, OD-X-2068, OD-X-2547, OD-X-2420, OD-X-2523, OD- X-2555, OD-X-2560, Kuraray polyols P-510, P-1010, P-2010, P-3010, P-4010, P-5010, P-6010, F-510, F-1010, F -2010, F-3010, P-1011, P-2011, P-2013, P-2030, N-2010, PNNA-2016 and the like.
 (C)成分のポリマーの好ましい一例であるポリカプロラクトンポリオールとしては、トリメチロールプロパンやエチレングリコール等の多価アルコールを開始剤としてε-カプロラクトンを開環重合させたものが挙げられる。ポリカプロラクトンポリオールの具体例としてはDIC製ポリライト(登録商標)OD-X-2155、OD-X-640、OD-X-2568、ダイセル製プラクセル(登録商標)205、L205AL、205U、208、210、212、L212AL、220、230、240、303、305、308、312、320等が挙げられる。 The polycaprolactone polyol, which is a preferred example of the polymer of component (C), includes those obtained by ring-opening polymerization of ε-caprolactone using a polyhydric alcohol such as trimethylolpropane or ethylene glycol as an initiator. Specific examples of the polycaprolactone polyol include DIC polylite (registered trademark) OD-X-2155, OD-X-640, OD-X-2568, Daicel Plaxel (registered trademark) 205, L205AL, 205U, 208, 210, 212, L212AL, 220, 230, 240, 303, 305, 308, 312, 320, and the like.
 (C)成分のポリマーの好ましい一例であるポリカーボネートポリオールとしては、トリメチロールプロパンやエチレングリコール等の多価アルコールと炭酸ジエチル、炭酸ジフェニル、エチレンカーボネート等を反応させたものが挙げられる。ポリカーボネートポリオールの具体例としてはダイセル製プラクセル(登録商標)CD205、CD205PL、CD210、CD220、クラレ製のC-590、C-1050、C-2050、C-2090、C-3090等が挙げられる。 Examples of the polycarbonate polyol which is a preferable example of the polymer of component (C) include those obtained by reacting a polyhydric alcohol such as trimethylolpropane or ethylene glycol with diethyl carbonate, diphenyl carbonate, ethylene carbonate or the like. Specific examples of the polycarbonate polyol include Placel (registered trademark) CD205, CD205PL, CD210, CD220 manufactured by Daicel, C-590, C-1050, C-2050, C-2090, C-3090 manufactured by Kuraray, and the like.
 (C)成分のポリマーの好ましい一例であるセルロースとしては、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロース等のヒドロキシアルキルセルロース類、ヒドロキシエチルメチルセルロース、ヒドロキシプロピルメチルセルロース、ヒドロキシエチルエチルセルロース等のヒドロキシアルキルアルキルセルロース類およびセルロース等が挙げられ、例えば、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロース等のヒドロキシアルキルセルロース類が好ましい。 Examples of cellulose that is a preferred example of the polymer of component (C) include hydroxyalkyl celluloses such as hydroxyethyl cellulose and hydroxypropyl cellulose, hydroxyalkylalkyl celluloses such as hydroxyethyl methyl cellulose, hydroxypropyl methyl cellulose, hydroxyethyl ethyl cellulose, and cellulose. For example, hydroxyalkyl celluloses such as hydroxyethyl cellulose and hydroxypropyl cellulose are preferable.
 (C)成分のポリマーの好ましい一例であるシクロデキストリンとしては、α-シクロデキストリン、β-シクロデキストリンおよびγシクロデキストリン等のシクロデキストリン、メチル-α-シクロデキストリン、メチル-β-シクロデキストリンならびにメチル-γ-シクロデキストリン等のメチル化シクロデキストリン、ヒドロキシメチル-α-シクロデキストリン、ヒドロキシメチル-β-シクロデキストリン、ヒドロキシメチル-γ-シクロデキストリン、2-ヒドロキシエチル-α-シクロデキストリン、2-ヒドロキシエチル-β-シクロデキストリン、2-ヒドロキシエチル-γ-シクロデキストリン、2-ヒドロキシプロピル-α-シクロデキストリン、2-ヒドロキシプロピル-β-シクロデキストリン、2-ヒドロキシプロピル-γ-シクロデキストリン、3-ヒドロキシプロピル-α-シクロデキストリン、3-ヒドロキシプロピル-β-シクロデキストリン、3-ヒドロキシプロピル-γ-シクロデキストリン、2,3-ジヒドロキシプロピル-α-シクロデキストリン、2,3-ジヒドロキシプロピル-β-シクロデキストリン、2,3-ジヒドロキシプロピル-γ-シクロデキストリン等のヒドロキシアルキルシクロデキストリン等が挙げられる。 The cyclodextrin which is a preferred example of the polymer of component (C) includes cyclodextrins such as α-cyclodextrin, β-cyclodextrin and γ-cyclodextrin, methyl-α-cyclodextrin, methyl-β-cyclodextrin and methyl- methylated cyclodextrins such as γ-cyclodextrin, hydroxymethyl-α-cyclodextrin, hydroxymethyl-β-cyclodextrin, hydroxymethyl-γ-cyclodextrin, 2-hydroxyethyl-α-cyclodextrin, 2-hydroxyethyl- β-cyclodextrin, 2-hydroxyethyl-γ-cyclodextrin, 2-hydroxypropyl-α-cyclodextrin, 2-hydroxypropyl-β-cyclodextrin, 2-hydroxypro Pill-γ-cyclodextrin, 3-hydroxypropyl-α-cyclodextrin, 3-hydroxypropyl-β-cyclodextrin, 3-hydroxypropyl-γ-cyclodextrin, 2,3-dihydroxypropyl-α-cyclodextrin, 2 , 3-dihydroxypropyl-β-cyclodextrin, 2,3-dihydroxypropyl-γ-cyclodextrin, and the like.
 (C)成分のポリマーの好ましい一例であるメラミンホルムアルデヒド樹脂としては、メラミンとホルムアルデヒドとを重縮合して得られる樹脂が挙げられる。 As a preferred example of the polymer of component (C), a melamine formaldehyde resin includes a resin obtained by polycondensation of melamine and formaldehyde.
 (C)成分のメラミンホルムアルデヒド樹脂は、保存安定性の観点からメラミンとホルムアルデヒドの重縮合の際に生成したメチロール基がアルキル化されていることが好ましい。メラミンホルムアルデヒド樹脂としては、例えば下記式で表される単位構造を有する樹脂が挙げられる。 In the melamine formaldehyde resin as the component (C), it is preferable that the methylol group generated during the polycondensation of melamine and formaldehyde is alkylated from the viewpoint of storage stability. Examples of the melamine formaldehyde resin include a resin having a unit structure represented by the following formula.
Figure JPOXMLDOC01-appb-C000006
 上記式中、R21は水素原子または炭素原子数1~4のアルキル基を表し、nは繰り返し単位の数を表す自然数である。
Figure JPOXMLDOC01-appb-C000006
In the above formula, R 21 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and n is a natural number representing the number of repeating units.
 (C)成分のメラミンホルムアルデヒド樹脂を得る方法は特には限定されないが、一般的にメラミンとホルムアルデヒドを混合し、炭酸ナトリウムやアンモニア等を用いて弱アルカリ性にした後60℃~100℃にて加熱することにより合成される。さらにアルコールと反応させることでメチロール基をアルコキシ化することができる。 The method for obtaining the melamine formaldehyde resin as component (C) is not particularly limited, but in general, melamine and formaldehyde are mixed, made weakly alkaline using sodium carbonate, ammonia, etc., and then heated at 60 ° C. to 100 ° C. Is synthesized. Further, the methylol group can be alkoxylated by reacting with alcohol.
 (C)成分のメラミンホルムアルデヒド樹脂は、重量平均分子量が250~5000であることが好ましく、300~4000であることがより好ましく、350~3500であることがさらに好ましい。重量平均分子量が5000を超えて過大なものであると、溶剤に対する溶解性が低下しハンドリング性が低下する場合があり、重量平均分子量が250未満で過小なものであると、熱硬化時に硬化不足になり溶剤耐性の向上効果が十分に現れない場合がある。 The (C) component melamine formaldehyde resin preferably has a weight average molecular weight of 250 to 5000, more preferably 300 to 4000, and even more preferably 350 to 3500. If the weight average molecular weight exceeds 5,000, the solubility in the solvent may decrease and handling may decrease. If the weight average molecular weight is less than 250, the curing may be insufficient during thermal curing. In some cases, the effect of improving the solvent resistance is not sufficiently exhibited.
 本発明の実施形態においては、(C)成分のメラミンホルムアルデヒド樹脂は液体形態で、あるいは精製した液体を後述する溶剤に再溶解した溶液形態で用いてもよい。 In the embodiment of the present invention, the melamine formaldehyde resin as the component (C) may be used in a liquid form or a solution form in which a purified liquid is redissolved in a solvent described later.
 (C)成分の特定重合体の好ましい一例であるフェノールノボラック樹脂としては、例えば、フェノール-ホルムアルデヒド重縮合物などが挙げられる。 Examples of the phenol novolak resin that is a preferred example of the specific polymer of the component (C) include phenol-formaldehyde polycondensate.
 本実施形態の硬化膜形成組成物において、(C)成分のポリマーは、粉体形態で、または精製した粉末を後述する溶剤に再溶解した溶液形態で用いてもよい。 In the cured film forming composition of the present embodiment, the polymer of component (C) may be used in the form of a powder or in the form of a solution obtained by re-dissolving the purified powder in a solvent described later.
 また、本実施の形態の硬化膜形成組成物において、(C)成分は、(C)成分として例示されたポリマーの複数種の混合物であってもよい。 In the cured film forming composition of the present embodiment, the component (C) may be a mixture of a plurality of types of polymers exemplified as the component (C).
 本発明の硬化膜形成組成物における(C)成分の含有量は、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して、好ましくは400質量部以下、より好ましくは10質量部~380質量部、更に好ましくは40質量部~360質量部である。(C)成分の含有量が過大の場合は液晶配向性が低下し易い。 The content of the component (C) in the cured film forming composition of the present invention is preferably 400 parts by mass or less with respect to 100 parts by mass of the total amount of the polymer as the component (A) and the crosslinking agent of the component (B). More preferably, it is 10 to 380 parts by mass, and still more preferably 40 to 360 parts by mass. When the content of the component (C) is excessive, the liquid crystal orientation tends to be lowered.
<(D)成分>
 本発明の硬化膜形成組成物は、前記(A)成分および(B)成分に加えて、さらに(D)成分として架橋触媒を含有することができる。
 (D)成分である架橋触媒としては、例えば、酸または熱酸発生剤を好適に使用できる。この(D)成分は、本発明の硬化膜形成組成物の熱硬化反応を促進させることにおいて有効である。
 (D)成分は、具体的には、上記酸としてスルホン酸基含有化合物、塩酸またはその塩が挙げられる。そして上記熱酸発生剤としては、加熱処理時に熱分解して酸を発生する化合物、すなわち温度80℃から250℃で熱分解して酸を発生する化合物であれば、特に限定されるものではない。
<(D) component>
The cured film forming composition of the present invention can further contain a crosslinking catalyst as the component (D) in addition to the components (A) and (B).
As the crosslinking catalyst as component (D), for example, an acid or a thermal acid generator can be preferably used. This component (D) is effective in promoting the thermosetting reaction of the cured film forming composition of the present invention.
Specific examples of the component (D) include sulfonic acid group-containing compounds, hydrochloric acid or salts thereof as the acid. The thermal acid generator is not particularly limited as long as it is a compound that thermally decomposes during heat treatment to generate an acid, that is, a compound that thermally decomposes at a temperature of 80 ° C. to 250 ° C. to generate an acid. .
 上記酸の具体例としては、例えば、塩酸またはその塩;メタンスルホン酸、エタンスルホン酸、プロパンスルホン酸、ブタンスルホン酸、ペンタンスルホン酸、オクタンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸、カンファースルホン酸、トリフルオロメタンスルホン酸、p-フェノールスルホン酸、2-ナフタレンスルホン酸、メシチレンスルホン酸、p-キシレン-2-スルホン酸、m-キシレン-2-スルホン酸、4-エチルベンゼンスルホン酸、1H,1H,2H,2H-パーフルオロオクタンスルホン酸、パーフルオロ(2-エトキシエタン)スルホン酸、ペンタフルオロエタンスルホン酸、ノナフルオロブタン-1-スルホン酸、ドデシルベンゼンスルホン酸等のスルホン酸基含有化合物またはその水和物や塩等が挙げられる。 Specific examples of the acid include, for example, hydrochloric acid or a salt thereof; methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, butanesulfonic acid, pentanesulfonic acid, octanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, camphor Sulfonic acid, trifluoromethanesulfonic acid, p-phenolsulfonic acid, 2-naphthalenesulfonic acid, mesitylenesulfonic acid, p-xylene-2-sulfonic acid, m-xylene-2-sulfonic acid, 4-ethylbenzenesulfonic acid, 1H, 1H, 2H, 2H-perfluorooctanesulfonic acid, perfluoro (2-ethoxyethane) sulfonic acid, pentafluoroethanesulfonic acid, nonafluorobutane-1-sulfonic acid, sulfonic acid group-containing compounds such as dodecylbenzenesulfonic acid, Its hydrates and Etc. The.
 また熱により酸を発生する化合物としては、例えば、ビス(トシルオキシ)エタン、ビス(トシルオキシ)プロパン、ビス(トシルオキシ)ブタン、p-ニトロベンジルトシレート、o-ニトロベンジルトシレート、1,2,3-フェニレントリス(メチルスルホネート)、p-トルエンスルホン酸ピリジニウム塩、p-トルエンスルホン酸モルホニウム塩、p-トルエンスルホン酸エチルエステル、p-トルエンスルホン酸プロピルエステル、p-トルエンスルホン酸ブチルエステル、p-トルエンスルホン酸イソブチルエステル、p-トルエンスルホン酸メチルエステル、p-トルエンスルホン酸フェネチルエステル、シアノメチルp-トルエンスルホネート、2,2,2-トリフルオロエチルp-トルエンスルホネート、2-ヒドロキシブチルp-トルエンスルホネート、N-エチル-p-トルエンスルホンアミド、さらに下記式で表される化合物: Examples of the compound that generates an acid by heat include, for example, bis (tosyloxy) ethane, bis (tosyloxy) propane, bis (tosyloxy) butane, p-nitrobenzyl tosylate, o-nitrobenzyl tosylate, 1,2,3 -Phenylenetris (methyl sulfonate), p-toluenesulfonic acid pyridinium salt, p-toluenesulfonic acid morphonium salt, p-toluenesulfonic acid ethyl ester, p-toluenesulfonic acid propyl ester, p-toluenesulfonic acid butyl ester, p- Toluenesulfonic acid isobutyl ester, p-toluenesulfonic acid methyl ester, p-toluenesulfonic acid phenethyl ester, cyanomethyl p-toluenesulfonate, 2,2,2-trifluoroethyl p-toluenesulfonate, 2-hydro Shibuchiru p- toluenesulfonate, N- ethyl -p- toluenesulfonamide, further represented by the following compound:
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000012
等が挙げられる。
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000012
Etc.
 本発明の硬化膜形成組成物における(D)成分の含有量は、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して、好ましくは0.01質量部~20質量部、より好ましくは0.1質量部~15質量部、更に好ましくは0.5質量部~10質量部である。(D)成分の含有量を0.01質量部以上とすることで、充分な熱硬化性および溶剤耐性を付与することができる。しかし、20質量部より多い場合、組成物の保存安定性が低下する場合がある。 The content of the component (D) in the cured film forming composition of the present invention is preferably 0.01 mass with respect to 100 mass parts of the total amount of the polymer as the component (A) and the crosslinking agent of the component (B). Part to 20 parts by weight, more preferably 0.1 part by weight to 15 parts by weight, still more preferably 0.5 part by weight to 10 parts by weight. By setting the content of the component (D) to 0.01 parts by mass or more, sufficient thermosetting and solvent resistance can be imparted. However, when it is more than 20 parts by mass, the storage stability of the composition may be lowered.
<(E)成分>
 本発明は(E)成分として、形成される硬化膜の接着性を向上させる成分(以下、密着向上成分とも言う。)を含有することもできる。
<(E) component>
This invention can also contain the component (henceforth an adhesion improvement component) which improves the adhesiveness of the cured film formed as (E) component.
 (E)成分を含有する本実施形態の硬化膜形成組成物から形成される硬化膜を配向材として用いる場合、配向材と重合性液晶の層との密着性が向上するよう、重合性液晶の重合性官能基と配向材の架橋反応部位を共有結合によりリンクさせることができる。その結果、本実施形態の配向材上に硬化した重合性液晶を積層してなる本実施形態の位相差材は、高温高湿の条件下でも、強い密着性を維持することができ、剥離等に対する高い耐久性を示すことができる。 (E) When using the cured film formed from the cured film forming composition of this embodiment containing a component as an alignment material, the polymerizable liquid crystal of the polymerizable liquid crystal is improved so that the adhesion between the alignment material and the polymerizable liquid crystal layer is improved. The polymerizable functional group and the crosslinking reaction site of the alignment material can be linked by a covalent bond. As a result, the retardation material of this embodiment formed by laminating a cured polymerizable liquid crystal on the alignment material of this embodiment can maintain strong adhesion even under conditions of high temperature and high humidity , such as peeling. High durability can be exhibited.
 (E)成分としては、1つ以上の重合性基と、ヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基からなる群から選ばれる少なくとも1つの基Aまたは該基Aと反応する少なくとも1つの基とを有する化合物を使用できる。
 (E)成分としては、ヒドロキシ基およびN-アルコキシメチル基から選ばれる基と、重合性基とを有するモノマーおよびポリマーが好ましい。
 このような(E)成分としては、ヒドロキシ基と(メタ)アクリル基とを有する化合物、N-アルコキシメチル基と(メタ)アクリル基とを有する化合物、N-アルコキシメチル基と(メタ)アクリル基を有するポリマー等が挙げられる。以下、それぞれ具体例を示す。
The component (E) reacts with one or more polymerizable groups and at least one group A selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or the group A. Compounds having at least one group can be used.
As the component (E), monomers and polymers having a group selected from a hydroxy group and an N-alkoxymethyl group and a polymerizable group are preferred.
Such (E) component includes a compound having a hydroxy group and a (meth) acryl group, a compound having an N-alkoxymethyl group and a (meth) acryl group, an N-alkoxymethyl group and a (meth) acryl group. The polymer etc. which have are mentioned. Specific examples are shown below.
 (E)成分の一例として、ヒドロキシ基を含有した多官能アクリレート(以下、ヒドロキシ基含有多官能アクリレートとも言う。)を挙げることができる。
 (E)成分の例であるヒドロキシ基含有多官能アクリレートとしては、例えば、ペンタエリスリトールトリアクリレートおよびジペンタエリトリトールペンタアクリレート等を挙げることができる。
(E) As an example of a component, the polyfunctional acrylate containing a hydroxyl group (henceforth a hydroxy group containing polyfunctional acrylate) can be mentioned.
Examples of the hydroxy group-containing polyfunctional acrylate that is an example of the component (E) include pentaerythritol triacrylate and dipentaerythritol pentaacrylate.
 (E)成分の一例として、1つの(メタ)アクリル基と、1つ以上のヒドロキシ基とを有する化合物も挙げられる。このような、1つの(メタ)アクリル基と、1つ以上のヒドロキシ基とを有する化合物の好ましい例を挙げる。尚、(E)成分の化合物は、以下の化合物例に限定されるものではない。 (E) As an example of a component, the compound which has one (meth) acryl group and one or more hydroxy groups is also mentioned. Preferred examples of such a compound having one (meth) acryl group and one or more hydroxy groups are given below. In addition, the compound of (E) component is not limited to the following compound examples.
Figure JPOXMLDOC01-appb-C000013
(上記式中、R11は水素原子またはメチル基を表し、mは1~10の整数を表す。)
Figure JPOXMLDOC01-appb-C000013
(In the above formula, R 11 represents a hydrogen atom or a methyl group, and m represents an integer of 1 to 10.)
 また、(E)成分の化合物としては、1分子中にC=C二重結合を含む重合性基を少なくとも1つと、N-アルコキシメチル基を少なくとも1つ有する化合物が挙げられる。 The compound of component (E) includes a compound having at least one polymerizable group containing a C═C double bond and at least one N-alkoxymethyl group in one molecule.
 C=C二重結合を含む重合性基としては、アクリル基、メタクリル基、ビニル基、アリル基、マレイミド基等が挙げられる。 Examples of the polymerizable group containing a C═C double bond include an acryl group, a methacryl group, a vinyl group, an allyl group, and a maleimide group.
 N-アルコキシメチル基のN、すなわち窒素原子としては、アミドの窒素原子、チオアミドの窒素原子、ウレアの窒素原子、チオウレアの窒素原子、ウレタンの窒素原子、含窒素へテロ環の窒素原子の隣接位に結合した窒素原子等が挙げられる。従って、N-アルコキシメチル基としては、アミドの窒素原子、チオアミドの窒素原子、ウレアの窒素原子、チオウレアの窒素原子、ウレタンの窒素原子、含窒素へテロ環の窒素原子の隣接位に結合した窒素原子等から選ばれる窒素原子にアルコキシメチル基が結合した構造が挙げられる。 N of N-alkoxymethyl group, that is, nitrogen atom is adjacent to amide nitrogen atom, thioamide nitrogen atom, urea nitrogen atom, thiourea nitrogen atom, urethane nitrogen atom, nitrogen atom of nitrogen-containing heterocycle And a nitrogen atom bonded to. Therefore, the N-alkoxymethyl group includes an amide nitrogen atom, a thioamide nitrogen atom, a urea nitrogen atom, a thiourea nitrogen atom, a urethane nitrogen atom, and a nitrogen bonded to the adjacent position of the nitrogen atom of the nitrogen-containing heterocyclic ring. Examples include a structure in which an alkoxymethyl group is bonded to a nitrogen atom selected from atoms and the like.
 (E)成分としては、上記の基を有するものであればよいが、好ましくは、例えば下記の式(X1)で表される化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000014
(式中、R31は水素原子またはメチル基を表し、R32は水素原子、または直鎖若しくは分岐の炭素原子数1乃至10のアルキル基を表す)
As the component (E), any compound having the above-described group may be used, and a compound represented by the following formula (X1) is preferable.
Figure JPOXMLDOC01-appb-C000014
(Wherein R 31 represents a hydrogen atom or a methyl group, and R 32 represents a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms)
 上記アルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、n-ペンチル基、1-メチル-n-ブチル基、2-メチル-n-ブチル基、3-メチル-n-ブチル基、1,1-ジメチル-n-プロピル基、1,2-ジメチル-n-プロピル基、2,2-ジメチル-n-プロピル基、1-エチル-n-プロピル基、n-ヘキシル基、1-メチル-n-ペンチル基、2-メチル-n-ペンチル基、3-メチル-n-ペンチル基、4-メチル-n-ペンチル基、1,1-ジメチル-n-ブチル基、1,2-ジメチル-n-ブチル基、1,3-ジメチル-n-ブチル基、2,2-ジメチル-n-ブチル基、2,3-ジメチル-n-ブチル基、3,3-ジメチル-n-ブチル基、1-エチル-n-ブチル基、2-エチル-n-ブチル基、1,1,2-トリメチル-n-プロピル基、1,2,2-トリメチル-n-プロピル基、1-エチル-1-メチル-n-プロピル基、1-エチル-2-メチル-n-プロピル基、n-ヘプチル基、1-メチル-n-ヘキシル基、2-メチル-n-ヘキシル基、3-メチル-n-ヘキシル基、1,1-ジメチル-n-ペンチル基、1,2-ジメチル-n-ペンチル基、1,3-ジメチル-n-ペンチル基、2,2-ジメチル-n-ペンチル基、2,3-ジメチル-n-ペンチル基、3,3-ジメチル-n-ペンチル基、1-エチル-n-ペンチル基、2-エチル-n-ペンチル基、3-エチル-n-ペンチル基、1-メチル-1-エチル-n-ブチル基、1-メチル-2-エチル-n-ブチル基、1-エチル-2-メチル-n-ブチル基、2-メチル-2-エチル-n-ブチル基、2-エチル-3-メチル-n-ブチル基、n-オクチル基、1-メチル-n-ヘプチル基、2-メチル-n-ヘプチル基、3-メチル-n-ヘプチル基、1,1-ジメチル-n-ヘキシル基、1,2-ジメチル-n-ヘキシル基、1,3-ジメチル-n-ヘキシル基、2,2-ジメチル-n-ヘキシル基、2,3-ジメチル-n-ヘキシル基、3,3-ジメチル-n-ヘキシル基、1-エチル-n-ヘキシル基、2-エチル-n-ヘキシル基、3-エチル-n-ヘキシル基、1-メチル-1-エチル-n-ペンチル基、1-メチル-2-エチル-n-ペンチル基、1-メチル-3-エチル-n-ペンチル基、2-メチル-2-エチル-n-ペンチル基、2-メチル-3-エチル-n-ペンチル基、3-メチル-3-エチル-n-ペンチル基、n-ノニル基、n-デシル基等が挙げられる。 Examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, and 1-methyl-n. -Butyl group, 2-methyl-n-butyl group, 3-methyl-n-butyl group, 1,1-dimethyl-n-propyl group, 1,2-dimethyl-n-propyl group, 2,2-dimethyl- n-propyl group, 1-ethyl-n-propyl group, n-hexyl group, 1-methyl-n-pentyl group, 2-methyl-n-pentyl group, 3-methyl-n-pentyl group, 4-methyl- n-pentyl group, 1,1-dimethyl-n-butyl group, 1,2-dimethyl-n-butyl group, 1,3-dimethyl-n-butyl group, 2,2-dimethyl-n-butyl group, 2 , 3-Dimethyl-n-butyl group, 3 3-dimethyl-n-butyl group, 1-ethyl-n-butyl group, 2-ethyl-n-butyl group, 1,1,2-trimethyl-n-propyl group, 1,2,2-trimethyl-n- Propyl group, 1-ethyl-1-methyl-n-propyl group, 1-ethyl-2-methyl-n-propyl group, n-heptyl group, 1-methyl-n-hexyl group, 2-methyl-n-hexyl Group, 3-methyl-n-hexyl group, 1,1-dimethyl-n-pentyl group, 1,2-dimethyl-n-pentyl group, 1,3-dimethyl-n-pentyl group, 2,2-dimethyl- n-pentyl group, 2,3-dimethyl-n-pentyl group, 3,3-dimethyl-n-pentyl group, 1-ethyl-n-pentyl group, 2-ethyl-n-pentyl group, 3-ethyl-n -Pentyl group, 1-methyl-1-ethyl-n-butyl group 1-methyl-2-ethyl-n-butyl group, 1-ethyl-2-methyl-n-butyl group, 2-methyl-2-ethyl-n-butyl group, 2-ethyl-3-methyl-n-butyl group Group, n-octyl group, 1-methyl-n-heptyl group, 2-methyl-n-heptyl group, 3-methyl-n-heptyl group, 1,1-dimethyl-n-hexyl group, 1,2-dimethyl group -N-hexyl group, 1,3-dimethyl-n-hexyl group, 2,2-dimethyl-n-hexyl group, 2,3-dimethyl-n-hexyl group, 3,3-dimethyl-n-hexyl group, 1-ethyl-n-hexyl group, 2-ethyl-n-hexyl group, 3-ethyl-n-hexyl group, 1-methyl-1-ethyl-n-pentyl group, 1-methyl-2-ethyl-n- Pentyl group, 1-methyl-3-ethyl-n-pentyl group, 2-methyl And til-2-ethyl-n-pentyl group, 2-methyl-3-ethyl-n-pentyl group, 3-methyl-3-ethyl-n-pentyl group, n-nonyl group, n-decyl group and the like. .
 上記式(X1)で表される化合物の具体例としては、N-ヒドロキシメチル(メタ)アクリルアミド、N-メトキシメチル(メタ)アクリルアミド、N-エトキシメチル(メタ)アクリルアミド、N-ブトキシメチル(メタ)アクリルアミド等のヒドロキシメチル基またはアルコキシメチル基で置換されたアクリルアミド化合物またはメタクリルアミド化合物が挙げられる。なお(メタ)アクリルアミドとはメタクリルアミドとアクリルアミドの双方を意味する。 Specific examples of the compound represented by the formula (X1) include N-hydroxymethyl (meth) acrylamide, N-methoxymethyl (meth) acrylamide, N-ethoxymethyl (meth) acrylamide, and N-butoxymethyl (meth). Examples thereof include acrylamide compounds and methacrylamide compounds substituted with a hydroxymethyl group such as acrylamide or an alkoxymethyl group. (Meth) acrylamide means both methacrylamide and acrylamide.
 (E)成分のC=C二重結合を含む重合性基とN-アルコキシメチル基を有する化合物の別の態様としては、好ましくは、例えば下記の式(X2)で表される化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000015
 式中、R51は水素原子またはメチル基を表す。
 R52は炭素原子数2乃至20のアルキル基、炭素原子数5乃至6の1価の脂肪族環基、若しくは炭素原子数5乃至6の脂肪族環を含む1価の脂肪族基を表し、構造中にエーテル結合を含んでいてもよい。
 R53は直鎖または分枝鎖の炭素原子数2乃至20のアルキレン基、炭素原子数5乃至6の2価の脂肪族環基、若しくは炭素原子数5乃至6の脂肪族環を含む2価の脂肪族基を表し、構造中にエーテル結合を含んでいてもよい。
 R54は直鎖または分枝鎖の炭素原子数1乃至20の2価乃至9価の脂肪族基、炭素原子数5乃至6の2価乃至9価の脂肪族環基、若しくは炭素原子数5乃至6の脂肪族環を含む2価乃至9価の脂肪族基を表し、これらの基の一つのメチレン基または隣り合わない複数のメチレン基がエーテル結合に置き換わっていてもよい。
 Zは>NCOO-、または-OCON<(ここで「-」は結合手が1つであることを示す。また、「>」「<」は結合手が2つであることを示し、かつ、どちらか1つの結合手にアルコキシメチル基(即ち-OR52基)が結合していることを示す。)を表す。
 rは2以上9以下の自然数である。
Another embodiment of the compound having a polymerizable group containing a C═C double bond and an N-alkoxymethyl group as component (E) is preferably a compound represented by the following formula (X2), for example. .
Figure JPOXMLDOC01-appb-C000015
In the formula, R 51 represents a hydrogen atom or a methyl group.
R 52 represents an alkyl group having 2 to 20 carbon atoms, a monovalent aliphatic cyclic group having 5 to 6 carbon atoms, or a monovalent aliphatic group containing an aliphatic ring having 5 to 6 carbon atoms, An ether bond may be included in the structure.
R 53 is a divalent group containing a linear or branched alkylene group having 2 to 20 carbon atoms, a divalent aliphatic ring group having 5 to 6 carbon atoms, or an aliphatic ring having 5 to 6 carbon atoms. And an ether bond may be included in the structure.
R 54 is a linear or branched divalent to 9-valent aliphatic group having 1 to 20 carbon atoms, a divalent to 9-valent aliphatic cyclic group having 5 to 6 carbon atoms, or a carbon number of 5 It represents a divalent to a 9-valent aliphatic group containing 6 to 6 aliphatic rings, and one methylene group or a plurality of non-adjacent methylene groups in these groups may be replaced with an ether bond.
Z is> NCOO-, or -OCON <(where "-" indicates that there is one bond, and ">" and "<" indicate that there are two bonds, and It represents an alkoxymethyl group (that is, —OR 52 group) is bonded to any one of the bonds.)
r is a natural number of 2 or more and 9 or less.
 R53の定義における炭素原子数2乃至20のアルキレン基の具体例としては、炭素原子数2乃至20のアルキル基から、さらに1個の水素原子を取り去った2価の基が挙げられる。
 またR54の定義における炭素原子数1乃至20の2価乃至9価の脂肪族基の具体例としては、炭素原子数1乃至20のアルキル基から、さらに1乃至8個の水素原子を取り去った2価乃至9価の基が挙げられる。
Specific examples of the alkylene group having 2 to 20 carbon atoms in the definition of R 53 include a divalent group obtained by further removing one hydrogen atom from an alkyl group having 2 to 20 carbon atoms.
Further, specific examples of the divalent to 9-valent aliphatic group having 1 to 20 carbon atoms in the definition of R 54 include further removing 1 to 8 hydrogen atoms from the alkyl group having 1 to 20 carbon atoms. Examples thereof include divalent to 9-valent groups.
 炭素原子数1のアルキル基はメチル基であり、また炭素原子数2乃至20のアルキル基の具体例としては、エチル基、n-プロピル基、i-プロピル基、n-ブチル基、i-ブチル基、s-ブチル基、t-ブチル基、n-ペンチル基、1-メチル-n-ブチル基、2-メチル-n-ブチル基、3-メチル-n-ブチル基、1,1-ジメチル-n-プロピル基、n-ヘキシル基、1-メチル-n-ペンチル基、2-メチル-n-ペンチル基、1,1-ジメチル-n-ブチル基、1-エチル-n-ブチル基、1,1,2-トリメチル-n-プロピル基、n-ヘプチル基、n-オクチル基、n-ノニル基、n-デシル基、n-ウンデシル基、n-ドデシル基、n-トリデシル基、n-テトラデシル基、n-ペンタデシル基、n-ヘキサデシル基、n-ヘプタデシル基、n-オクタデシル基、n-ノナデシル基、n-エイコシル基、シクロペンチル基、シクロヘキシル基、それらの一種または複数種が炭素原子数20までの範囲で結合した基と、これらの基の一つのメチレンまたは隣り合わない複数のメチレン基がエーテル結合に置き換わった基等が一例として挙げられる。 The alkyl group having 1 carbon atom is a methyl group, and specific examples of the alkyl group having 2 to 20 carbon atoms include an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, and an i-butyl group. Group, s-butyl group, t-butyl group, n-pentyl group, 1-methyl-n-butyl group, 2-methyl-n-butyl group, 3-methyl-n-butyl group, 1,1-dimethyl- n-propyl group, n-hexyl group, 1-methyl-n-pentyl group, 2-methyl-n-pentyl group, 1,1-dimethyl-n-butyl group, 1-ethyl-n-butyl group, 1, 1,2-trimethyl-n-propyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, n-tridecyl group, n-tetradecyl group N-pentadecyl group, n-hexadecyl group, A heptadecyl group, an n-octadecyl group, an n-nonadecyl group, an n-eicosyl group, a cyclopentyl group, a cyclohexyl group, a group in which one or more of them are bonded in a range of up to 20 carbon atoms, and one of these groups An example is a group in which one methylene group or a plurality of methylene groups not adjacent to each other is replaced with an ether bond.
 これらのうち、炭素原子数2乃至10のアルキレン基が好ましく、R53がエチレン基であり、R54がヘキシレン基であるのが原料の入手性等の点から特に好ましい。 Among these, an alkylene group having 2 to 10 carbon atoms is preferable, R 53 is an ethylene group, and R 54 is a hexylene group, from the viewpoint of availability of raw materials.
 R52の定義における炭素原子数1乃至20のアルキル基の具体例としては、R53の定義における炭素原子数2乃至20のアルキル基の具体例およびメチル基が挙げられる。これらのうち、炭素原子数1乃至6のアルキル基が好ましく、メチル基、エチル基、n-プロピル基またはn-ブチル基が特に好ましい。 Specific examples of the alkyl group having 1 to 20 carbon atoms in the definition of R 52 include a specific example of an alkyl group having 2 to 20 carbon atoms in the definition of R 53 and a methyl group. Of these, an alkyl group having 1 to 6 carbon atoms is preferable, and a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is particularly preferable.
 rとしては、2以上9以下の自然数が挙げられるが、中でも、2乃至6の自然数が好ましい。 R may be a natural number of 2 to 9, but a natural number of 2 to 6 is preferable.
 本発明の実施形態の硬化膜形成組成物における(E)成分の含有量は、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して、好ましくは1質量部~100質量部であり、更に好ましくは5質量部~70質量部である。(E)成分の含有量を1質量部以上とすることで、形成される硬化膜に充分な密着性を付与することができる。しかし、100質量部より多い場合、液晶配向性が低下し易い。 The content of the component (E) in the cured film forming composition of the embodiment of the present invention is preferably 1 with respect to 100 parts by mass of the total amount of the polymer as the component (A) and the crosslinking agent of the component (B). The amount is from 100 parts by weight to 100 parts by weight, and more preferably from 5 parts by weight to 70 parts by weight. (E) By making content of a component into 1 mass part or more, sufficient adhesiveness can be provided to the cured film formed. However, when the amount is more than 100 parts by mass, the liquid crystal orientation tends to decrease.
 また、本実施形態の硬化膜形成組成物において、(E)成分は、(E)成分の化合物の複数種の混合物であってもよい。 In the cured film forming composition of the present embodiment, the component (E) may be a mixture of a plurality of compounds of the component (E).
<溶剤>
 本発明の硬化膜形成組成物は、主として溶剤に溶解した溶液状態で用いられる。その際に使用する溶剤は、(A)成分、(B)成分および必要に応じて(C)成分、(D)成分、(E)成分および/または後述するその他添加剤を溶解できればよく、その種類および構造などは特に限定されるものでない。
<Solvent>
The cured film forming composition of the present invention is mainly used in a solution state dissolved in a solvent. The solvent used in that case is only required to be able to dissolve the component (A), the component (B) and, if necessary, the component (C), the component (D), the component (E) and / or other additives described below. Kinds and structures are not particularly limited.
 溶剤の具体例としては、例えば、メタノール、エタノール、n-プロパノール、イソプロパノール、n-ブタノール、イソブタノール、2-メチル-1-ブタノール、n-ペンタノール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、メチルセロソルブアセテート、エチルセロソルブアセテート、ジエチレングリコール、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、プロピレングリコール、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテル、プロピレングリコールプロピルエーテル、プロピレングリコールプロピルエーテルアセテート、トルエン、キシレン、メチルエチルケトン、イソブチルメチルケトン、シクロペンタノン、シクロヘキサノン、2-ブタノン、3-メチル-2-ペンタノン、2-ペンタノン、2-ヘプタノン、γ-ブチロラクトン、2-ヒドロキシプロピオン酸エチル、2-ヒドロキシ-2-メチルプロピオン酸エチル、エトキシ酢酸エチル、ヒドロキシ酢酸エチル、2-ヒドロキシ-3-メチルブタン酸メチル、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、ピルビン酸メチル、ピルビン酸エチル、酢酸エチル、酢酸ブチル、乳酸エチル、乳酸ブチル、シクロペンチルメチルエーテル、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、およびN-メチル-2-ピロリドン等が挙げられる。 Specific examples of the solvent include, for example, methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, 2-methyl-1-butanol, n-pentanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, Methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether, propylene glycol propyl ether, propylene glycol propyl ether acetate, Toluene, xylene, methyl Ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, 2-butanone, 3-methyl-2-pentanone, 2-pentanone, 2-heptanone, γ-butyrolactone, ethyl 2-hydroxypropionate, 2-hydroxy-2-methyl Ethyl propionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, Methyl pyruvate, ethyl pyruvate, ethyl acetate, butyl acetate, ethyl lactate, butyl lactate, cyclopentyl methyl ether, N, N-dimethylformamide, N, N-dimethylacetamide, and N-methyl-2-pyrrolidone Etc.
 本発明の硬化膜形成組成物を用い、樹脂フィルム上に硬化膜を形成して配向材を製造する場合は、メタノール、エタノール、n-プロパノール、イソプロパノール、n-ブタノール、2-メチル-1-ブタノール、2-ヘプタノン、イソブチルメチルケトン、ジエチレングリコール、プロピレングリコール、プロピレングリコールモノメチルエーテル、シクロペンチルメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、酢酸エチル、酢酸ブチル等が、樹脂フィルムが耐性を示す溶剤であるという点から好ましい。 When the cured film-forming composition of the present invention is used to produce an alignment material by forming a cured film on a resin film, methanol, ethanol, n-propanol, isopropanol, n-butanol, 2-methyl-1-butanol 2-heptanone, isobutyl methyl ketone, diethylene glycol, propylene glycol, propylene glycol monomethyl ether, cyclopentyl methyl ether, propylene glycol monomethyl ether acetate, ethyl acetate, butyl acetate and the like are preferable from the viewpoint that the resin film is resistant. .
 これらの溶剤は、1種単独でまたは2種以上の組合せで使用することができる。 These solvents can be used alone or in combination of two or more.
<その他添加剤>
 さらに、本発明の硬化膜形成組成物は、本発明の効果を損なわない限りにおいて、必要に応じて、密着向上剤、シランカップリング剤、界面活性剤、レオロジー調整剤、顔料、染料、保存安定剤、消泡剤、酸化防止剤等を含有することができる。
<Other additives>
Furthermore, the cured film-forming composition of the present invention is, as necessary, an adhesion improver, a silane coupling agent, a surfactant, a rheology modifier, a pigment, a dye, a storage stability, as long as the effects of the present invention are not impaired. Agents, antifoaming agents, antioxidants, and the like.
<硬化膜形成組成物の調製>
 本発明の硬化膜形成組成物は、(A)成分のポリマーおよび(B)成分の架橋剤を含有し、所望により(C)成分のポリマー、(D)成分の架橋触媒および(E)成分密着促進剤、そして更に本発明の効果を損なわない限りにおいてその他の添加剤を含有することができる組成物である。そして通常は、それらが溶剤に溶解した溶液の形態として用いられる。
<Preparation of cured film forming composition>
The cured film forming composition of the present invention contains (A) component polymer and (B) component cross-linking agent, and (C) component polymer, (D) cross-linking catalyst, and (E) component adhesion as desired. It is a composition that can contain an accelerator and further other additives as long as the effects of the present invention are not impaired. Usually, they are used in the form of a solution in which they are dissolved in a solvent.
 本発明の硬化膜形成組成物の好ましい例は、以下のとおりである。
 [1]:(A)成分、(A)成分100質量部に基づいて、1質量部~500質量部の(B)成分を含有する硬化膜形成組成物。
 [2]:(A)成分、(A)成分100質量部に基づいて、1質量部~500質量部の(B)成分、並びに、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して1~400質量部の(C)成分を含有する硬化膜形成組成物。
 [3]:(A)成分、(A)成分100質量部に基づいて、1質量部~500質量部の(B)成分、並びに、溶剤を含有する硬化膜形成組成物。
 [4]:(A)成分、(A)成分100質量部に基づいて、1質量部~500質量部の(B)成分、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して1~400質量部の(C)成分、並びに、溶剤を含有する硬化膜形成組成物。
 [5]:(A)成分、(A)成分100質量部に基づいて、1質量部~500質量部の(B)成分、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して1~400質量部の(C)成分、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して0.01質量部~20質量部の(D)成分、溶剤を含有する硬化膜形成組成物。
 [6]:(A)成分、(A)成分100質量部に基づいて、1質量部~500質量部の(B)成分、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して1~400質量部の(C)成分、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して0.01質量部~20質量部の(D)成分、(A)成分であるポリマーおよび(B)成分の架橋剤の合計量の100質量部に対して1質量部~100質量部の(E)成分、並びに、溶剤を含有する硬化膜形成組成物。
Preferred examples of the cured film forming composition of the present invention are as follows.
[1]: A cured film forming composition containing 1 part by mass to 500 parts by mass of the component (B) based on 100 parts by mass of the component (A) and the component (A).
[2]: Based on 100 parts by weight of component (A), component (A), 1 part by weight to 500 parts by weight of component (B), polymer (A) and crosslinking agent for component (B) A cured film forming composition containing 1 to 400 parts by mass of component (C) with respect to 100 parts by mass of the total amount of
[3]: A cured film forming composition containing 1 part by weight to 500 parts by weight of the component (B) based on 100 parts by weight of the component (A) and the component (A), and a solvent.
[4]: (A) component, based on 100 parts by mass of component (A), 1 part by mass to 500 parts by mass of component (B), polymer of component (A) and crosslinking agent of component (B) A cured film forming composition containing 1 to 400 parts by mass of component (C) and a solvent with respect to 100 parts by mass of the amount.
[5]: (A) component, based on 100 parts by mass of component (A), 1 part by mass to 500 parts by mass of component (B), the polymer as component (A) and the crosslinking agent for component (B) 1 to 400 parts by mass of component (C), 100 parts by mass of the polymer as component (A) and 100 parts by mass of the crosslinking agent of component (B) A cured film forming composition containing 20 parts by mass of component (D) and a solvent.
[6]: (A) component, based on 100 parts by mass of component (A), 1 part by mass to 500 parts by mass of component (B), (A) component polymer and (B) component cross-linking agent 1 to 400 parts by mass of component (C), 100 parts by mass of the polymer as component (A) and 100 parts by mass of the crosslinking agent of component (B) 20 parts by mass of component (D), 1 part by mass to 100 parts by mass of component (E) with respect to 100 parts by mass of the total amount of the polymer as component (A) and the crosslinking agent of component (B), and solvent A cured film-forming composition comprising:
 本発明の硬化膜形成組成物を溶液として用いる場合の配合割合、調製方法等を以下に詳述する。
 本発明の硬化膜形成組成物における固形分の割合は、各成分が均一に溶剤に溶解している限り、特に限定されるものではないが、1質量%~60質量%であり、好ましくは2質量%~50質量%であり、より好ましくは2質量%~20質量%である。ここで、固形分とは、硬化膜形成組成物の全成分から溶剤を除いたものをいう。
The blending ratio, preparation method, and the like when the cured film forming composition of the present invention is used as a solution are described in detail below.
The ratio of the solid content in the cured film-forming composition of the present invention is not particularly limited as long as each component is uniformly dissolved in the solvent, but is 1% by mass to 60% by mass, preferably 2%. The mass is from 50% by mass to 50% by mass, and more preferably from 2% by mass to 20% by mass. Here, solid content means what remove | excluded the solvent from all the components of the cured film formation composition.
 本発明の硬化膜形成組成物の調製方法は、特に限定されない。調製法としては、例えば、溶剤に溶解した(A)成分の溶液に(B)成分、さらには(C)成分、(D)成分、(E)成分等を所定の割合で混合し、均一な溶液とする方法、或いは、この調製法の適当な段階において、必要に応じてその他添加剤をさらに添加して混合する方法が挙げられる。 The method for preparing the cured film forming composition of the present invention is not particularly limited. As a preparation method, for example, a component (B), a component (C), a component (D), a component (E), and the like are mixed in a predetermined ratio in a solution of the component (A) dissolved in a solvent, and uniform. Examples thereof include a solution method, and a method in which other additives are further added and mixed as necessary at an appropriate stage of the preparation method.
 本発明の硬化膜形成組成物の調製においては、溶剤中の重合反応によって得られる特定共重合体(ポリマー)の溶液をそのまま使用することができる。この場合、例えば、(A)成分の溶液に前記と同様に(B)成分、さらには(C)成分、(D)成分、(E)成分等を入れて均一な溶液とする。この際に、濃度調整を目的としてさらに溶剤を追加投入してもよい。このとき、(A)成分の生成過程で用いられる溶剤と、硬化膜形成組成物の濃度調整に用いられる溶剤とは同一であってもよく、また異なってもよい。 In the preparation of the cured film forming composition of the present invention, a solution of a specific copolymer (polymer) obtained by a polymerization reaction in a solvent can be used as it is. In this case, for example, the (B) component, (C) component, (D) component, (E) component, etc. are added to the (A) component solution in the same manner as described above to obtain a uniform solution. At this time, a solvent may be further added for the purpose of adjusting the concentration. At this time, the solvent used in the production process of the component (A) and the solvent used for adjusting the concentration of the cured film forming composition may be the same or different.
 また、調製された硬化膜形成組成物の溶液は、孔径が0.2μm程度のフィルタなどを用いて濾過した後、使用することが好ましい。 The prepared cured film-forming composition solution is preferably used after being filtered using a filter having a pore size of about 0.2 μm.
<硬化膜、配向材および位相差材>
 本発明の硬化膜形成組成物の溶液を基板(例えば、シリコン/二酸化シリコン被覆基板、シリコンナイトライド基板、金属、例えば、アルミニウム、モリブデン、クロムなどが被覆された基板、ガラス基板、石英基板、ITO基板等)やフィルム基板(例えば、トリアセチルセルロース(TAC)フィルム、ポリカーボネート(PC)フィルム、シクロオレフィンポリマー(COP)フィルム、シクロオレフィンコポリマー(COC)フィルム、ポリエチレンテレフタレート(PET)フィルム、アクリルフィルム、ポリエチレンフィルム等の樹脂フィルム)等の上に、バーコート、回転塗布、流し塗布、ロール塗布、スリット塗布、スリットに続いた回転塗布、インクジェット塗布、印刷などによって塗布して塗膜を形成し、その後、ホットプレートまたはオーブン等で加熱乾燥することにより、硬化膜を形成することができる。該硬化膜はそのまま配向材として適用できる。
<Hardened film, alignment material and retardation material>
A solution of the cured film forming composition of the present invention is applied to a substrate (for example, a silicon / silicon dioxide-coated substrate, a silicon nitride substrate, a substrate coated with a metal such as aluminum, molybdenum, or chromium, a glass substrate, a quartz substrate, or ITO. Substrates) and film substrates (eg, triacetyl cellulose (TAC) film, polycarbonate (PC) film, cycloolefin polymer (COP) film, cycloolefin copolymer (COC) film, polyethylene terephthalate (PET) film, acrylic film, polyethylene) On a resin film such as a film, etc., a bar coating, spin coating, flow coating, roll coating, slit coating, spin coating following slits, ink jet coating, printing, etc. to form a coating film, Relieved Dried by heating with a plate or an oven or the like, it is possible to form a cured film. The cured film can be used as an alignment material as it is.
 加熱乾燥の条件としては、硬化膜(配向材)の成分が、その上に塗布される重合性液晶溶液に溶出しない程度に、架橋剤による架橋反応が進行すればよく、例えば、温度60℃~200℃、時間0.4分間~60分間の範囲の中から適宜選択された加熱温度および加熱時間が採用される。加熱温度および加熱時間は、好ましくは70℃~160℃、0.5分間~10分間である。 The heating and drying conditions may be such that the crosslinking reaction with the crosslinking agent proceeds to such an extent that the components of the cured film (alignment material) do not elute into the polymerizable liquid crystal solution applied thereon. A heating temperature and a heating time appropriately selected from the range of 200 ° C. and a time of 0.4 minutes to 60 minutes are adopted. The heating temperature and the heating time are preferably 70 to 160 ° C. and 0.5 to 10 minutes.
 本発明の硬化性組成物を用いて形成される硬化膜(配向材)の膜厚は、例えば、0.05μm~5μmであり、使用する基板の段差や光学的、電気的性質を考慮し適宜選択することができる。 The thickness of the cured film (alignment material) formed using the curable composition of the present invention is, for example, 0.05 μm to 5 μm, and is appropriately determined in consideration of the level difference of the substrate to be used and optical and electrical properties. You can choose.
 本発明の硬化膜組成物から形成された配向材は耐溶剤性および耐熱性を有しているため、この配向材上に、垂直配向性を有する重合性液晶溶液などの位相差材料を塗布し、配向材上で配向させることができる。そして、配向状態となった位相差材料をそのまま硬化させることにより、光学異方性を有する層として位相差材を形成することができる。そして、配向材を形成する基板がフィルムである場合には、位相差フィルムとして有用となる。 Since the alignment material formed from the cured film composition of the present invention has solvent resistance and heat resistance, a phase difference material such as a polymerizable liquid crystal solution having vertical alignment property is applied onto the alignment material. Can be oriented on the orientation material. And the phase difference material can be formed as a layer which has optical anisotropy by hardening the phase difference material which became the orientation state as it is. And when the board | substrate which forms an orientation material is a film, it becomes useful as a phase difference film.
 また、上記のようにして形成された、本発明の配向材を有する2枚の基板を用い、スペーサを介して両基板上の配向材が互いに向かい合うように張り合わせた後、それらの基板の間に液晶を注入して、液晶が配向した液晶表示素子とすることもできる。
 このように本発明の硬化膜形成組成物は、各種位相差材(位相差フィルム)や液晶表示素子等の製造に好適に用いることができる。
In addition, after using the two substrates having the alignment material of the present invention formed as described above, the alignment materials on both substrates are bonded to each other via a spacer, and then between the substrates. A liquid crystal display element in which liquid crystal is injected to align the liquid crystal may be used.
Thus, the cured film forming composition of this invention can be used suitably for manufacture of various retardation materials (retardation film), a liquid crystal display element, etc.
 以下、本発明の実施例を挙げて、本発明を具体的に説明するが、本発明はこれらに限定して解釈されるものではない。
[実施例で用いる略記号]
 以下の実施例で用いる略記号の意味は、次のとおりである。
<原料>
GMA:グリシジルメタクリレート
M100:3,4-エポキシシクロヘキシルメチルメタクリレート
4MCA:4-メトキシ桂皮酸
HEMA:2-ヒドロキシエチルメタクリレート
MMA:メタクリル酸メチル
AIBN:α,α’-アゾビスイソブチロニトリル
BMAA:N-ブトキシメチルアクリルアミド
CIN1
Figure JPOXMLDOC01-appb-C000016
CIN2(下記異性体の混合物)
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
CIN3
Figure JPOXMLDOC01-appb-C000019
CIN4
Figure JPOXMLDOC01-appb-C000020
<B成分>
HMM:下記の構造式で表されるメラミン架橋剤[サイメル(CYMEL)(登録商標)303(三井サイテック(株)製)]
Figure JPOXMLDOC01-appb-C000021
<D成分>
PTSA:p-トルエンスルホン酸・一水和物
<E成分>
E-1:下記の構造式で示されるヒドロキシ基およびアクリル基を有する化合物
Figure JPOXMLDOC01-appb-C000022
E-2:下記の構造式で示されるN-アルコキシメチル基およびアクリル基を有する化合物
Figure JPOXMLDOC01-appb-C000023
<溶剤>
 溶剤として、プロピレングリコールモノメチルエーテル(PM)、シクロヘキサノン(CH)、シクロペンタノン(CP)、メチルイソブチルケトン(MIBK)を用いた。
EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples of the present invention, but the present invention is not construed as being limited thereto.
[Abbreviations used in Examples]
The meanings of the abbreviations used in the following examples are as follows.
<Raw material>
GMA: glycidyl methacrylate M100: 3,4-epoxycyclohexylmethyl methacrylate 4MCA: 4-methoxycinnamic acid HEMA: 2-hydroxyethyl methacrylate MMA: methyl methacrylate AIBN: α, α'-azobisisobutyronitrile BMAA: N- Butoxymethylacrylamide CIN1
Figure JPOXMLDOC01-appb-C000016
CIN2 (mixture of the following isomers)
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
CIN3
Figure JPOXMLDOC01-appb-C000019
CIN4
Figure JPOXMLDOC01-appb-C000020
<B component>
HMM: Melamine crosslinking agent represented by the following structural formula [CYMEL (registered trademark) 303 (Mitsui Cytec Co., Ltd.)]
Figure JPOXMLDOC01-appb-C000021
<D component>
PTSA: p-toluenesulfonic acid monohydrate <E component>
E-1: Compound having a hydroxy group and an acrylic group represented by the following structural formula
Figure JPOXMLDOC01-appb-C000022
E-2: Compound having an N-alkoxymethyl group and an acrylic group represented by the following structural formula
Figure JPOXMLDOC01-appb-C000023
<Solvent>
As the solvent, propylene glycol monomethyl ether (PM), cyclohexanone (CH), cyclopentanone (CP), and methyl isobutyl ketone (MIBK) were used.
<重合体の分子量の測定>
 重合例におけるアクリル共重合体の分子量は、(株)Shodex社製常温ゲル浸透クロマトグラフィー(GPC)装置(GPC-101)、Shodex社製カラム(KD―803、KD-805)を用い以下のようにして測定した。
 なお、下記の数平均分子量(以下、Mnと称す。)および重量平均分子量(以下、Mwと称す。)は、ポリスチレン換算値にて表した。
カラム温度:40℃
溶離液:テトラヒドロフラン
流速:1.0mL/分
検量線作成用標準サンプル:昭和電工社製 標準ポリスチレン(分子量 約197,000、55,100、12,800、3,950、1,260、580)。
<Measurement of molecular weight of polymer>
The molecular weight of the acrylic copolymer in the polymerization example was as follows using a room temperature gel permeation chromatography (GPC) apparatus (GPC-101) manufactured by Shodex Co., Ltd. and columns (KD-803, KD-805) manufactured by Shodex Co. And measured.
The following number average molecular weight (hereinafter referred to as Mn) and weight average molecular weight (hereinafter referred to as Mw) were expressed in terms of polystyrene.
Column temperature: 40 ° C
Eluent: Tetrahydrofuran Flow rate: 1.0 mL / min Standard sample for preparing calibration curve: Standard polystyrene (Molecular weight: about 197,000, 55,100, 12,800, 3,950, 1,260, 580).
<参考例1> CIN1の合成
 GMA 8.3g(58.4mmol)、4-メトキシ桂皮酸 20.7g(116.2mmol)、ジブチルヒドロキシトルエン 0.2g、トリフェニルエチルホスホニウムブロミド 0.3g、ジオキサン 80mLを混合し、90℃で3日間加熱した。反応終了後、ジオキサンを減圧留去後、酢酸エチル 150mLを加えて不溶物を濾別後、重曹水100mLを加えて3回洗浄して過剰のメトキシ桂皮酸を除去した。酢酸エチルを減圧留去して、目的物のCIN1 16.5gを得た(得率:88%)。
Reference Example 1 Synthesis of CIN1 GMA 8.3 g (58.4 mmol), 4-methoxycinnamic acid 20.7 g (116.2 mmol), dibutylhydroxytoluene 0.2 g, triphenylethylphosphonium bromide 0.3 g, dioxane 80 mL And heated at 90 ° C. for 3 days. After completion of the reaction, dioxane was distilled off under reduced pressure, 150 mL of ethyl acetate was added and insoluble matter was filtered off, and 100 mL of sodium bicarbonate water was added and washed three times to remove excess methoxycinnamic acid. Ethyl acetate was distilled off under reduced pressure to obtain 16.5 g of the desired product, CIN1 (yield: 88%).
<参考例2> CIN2の合成
 M100 4.9g(25.0mmol)、4-メトキシ桂皮酸 8.9(50.0mmol)、ジブチルヒドロキシトルエン 0.1g、トリフェニルエチルホスホニウムブロミド 0.18g、ジオキサン 40mLを90℃で3日間加熱した。反応終了後、ジオキサンを減圧留去後、酢酸エチル 100mLを加えて不溶物を濾別後、重曹水 100mLを加えて3回洗浄した。酢酸エチルを減圧留去して、目的物6.3gを得た。(得率:74%)。
Reference Example 2 Synthesis of CIN2 M100 4.9 g (25.0 mmol), 4-methoxycinnamic acid 8.9 (50.0 mmol), dibutylhydroxytoluene 0.1 g, triphenylethylphosphonium bromide 0.18 g, dioxane 40 mL Was heated at 90 ° C. for 3 days. After completion of the reaction, dioxane was distilled off under reduced pressure, 100 mL of ethyl acetate was added, insoluble matter was filtered off, and 100 mL of sodium bicarbonate water was added, followed by washing three times. Ethyl acetate was distilled off under reduced pressure to obtain 6.3 g of the desired product. (Yield: 74%).
<参考例3> CIN3の合成
 特表2013-514449に記載の合成方法に従い、CIN3を合成した。
Reference Example 3 Synthesis of CIN3 CIN3 was synthesized according to the synthesis method described in JP-T-2013-514449.
<参考例4> CIN4の合成
 Polymer Internatiоnal 43(1997)317に記載の合成方法に従い、CIN4を合成した。
Reference Example 4 Synthesis of CIN4 CIN4 was synthesized according to the synthesis method described in Polymer International 43 (1997) 317.
<A成分の合成>
<重合例1>
 CIN1 15.0g、HEMA 1.5g、重合触媒としてAIBN 0.5gをPM 122.4g、CH 30.6に溶解し、加熱還流下にて20時間反応させることによりアクリル共重合体(PA-1)を10質量%含有する溶液を得た。得られたアクリル共重合体のMnは12,000、Mwは32,000であった。
<Synthesis of component A>
<Polymerization example 1>
CIN1 15.0 g, HEMA 1.5 g, and AIBN 0.5 g as a polymerization catalyst were dissolved in PM 122.4 g and CH 30.6, and reacted for 20 hours under heating to reflux to produce an acrylic copolymer (PA-1 ) Was obtained. Mn of the obtained acrylic copolymer was 12,000 and Mw was 32,000.
<重合例2> 
 CIN1 15.0g、重合触媒としてAIBN 0.4gをPM 110.4g、CH 27.6に溶解し、加熱還流下にて20時間反応させることによりアクリル共重合体(PA-2)を10質量%含有する溶液を得た。得られたアクリル共重合体のMnは8,100、Mwは23,000であった。
<Polymerization example 2>
CIN1 15.0 g, AIBN 0.4 g as a polymerization catalyst was dissolved in PM 110.4 g, CH 27.6, and reacted for 20 hours under reflux with heating, whereby 10% by mass of acrylic copolymer (PA-2) was obtained. A solution containing was obtained. Mn of the obtained acrylic copolymer was 8,100 and Mw was 23,000.
<重合例3>
 CIN2 15.0g、HEMA 1.3g、重合触媒としてAIBN 0.4gをPM 120.0g、CH 30.0に溶解し、加熱還流下にて20時間反応させることによりアクリル共重合体(PA-3)を10質量%含有する溶液を得た。得られたアクリル共重合体のMnは12,000、Mwは41,000であった。
<Polymerization Example 3>
CIN2 15.0 g, HEMA 1.3 g, and AIBN 0.4 g as a polymerization catalyst were dissolved in PM 120.0 g and CH 30.0, and reacted for 20 hours under heating to reflux to produce an acrylic copolymer (PA-3 ) Was obtained. Mn of the obtained acrylic copolymer was 12,000 and Mw was 41,000.
<重合例4>
 CIN1 15.0g、MMA 1.5g、重合触媒としてAIBN 0.5gをPM 122.4g、CH 30.6に溶解し、加熱還流下にて20時間反応させることによりアクリル共重合体(PA-4)を10質量%含有する溶液を得た。得られたアクリル共重合体のMnは11,000、Mwは38,000であった。
<Polymerization example 4>
CIN1 15.0 g, MMA 1.5 g, and AIBN 0.5 g as a polymerization catalyst were dissolved in PM 122.4 g and CH 30.6, and reacted for 20 hours under heating to reflux to produce an acrylic copolymer (PA-4 ) Was obtained. Mn of the obtained acrylic copolymer was 11,000 and Mw was 38,000.
<重合例5>
 CIN3 15.0g、HEMA 1.4g、重合触媒としてAIBN 0.4gをPM 121.6g、CH 30.4に溶解し、加熱還流下にて20時間反応させることによりアクリル共重合体(PA-5)を10質量%含有する溶液を得た。得られたアクリル共重合体のMnは9,000、Mwは22,000であった。
<Polymerization example 5>
An acrylic copolymer (PA-5) was prepared by dissolving 15.0 g of CIN3, 1.4 g of HEMA, and 0.4 g of AIBN as a polymerization catalyst in 121.6 g of PM and CH 30.4 and reacting them under heating under reflux for 20 hours. ) Was obtained. Mn of the obtained acrylic copolymer was 9,000 and Mw was 22,000.
<重合例6>
 CIN4 15.0g、HEMA 1.7g、重合触媒としてAIBN 0.5gをPM 124.0g、CH 31.0に溶解し、加熱還流下にて20時間反応させることによりアクリル共重合体(PA-6)を10質量%含有する溶液を得た。得られたアクリル共重合体のMnは10,000、Mwは33,000であった。
<Polymerization Example 6>
CIN4 15.0 g, HEMA 1.7 g, and AIBN 0.5 g as a polymerization catalyst were dissolved in 124.0 g of PM and CH 31.0, and reacted for 20 hours under reflux with heating to prepare an acrylic copolymer (PA-6). ) Was obtained. Mn of the obtained acrylic copolymer was 10,000 and Mw was 33,000.
<重合例9>
 CIN1 10.0g、HEMA 2.7g、重合触媒としてAIBN 0.4gをPM 118.2gに溶解し、加熱還流下にて20時間反応させることによりアクリル共重合体(PA-7)を10質量%含有する溶液を得た。得られたアクリル共重合体のMnは22,000、Mwは41,000であった。
<Polymerization example 9>
CIN1 10.0 g, HEMA 2.7 g, and AIBN 0.4 g as a polymerization catalyst were dissolved in 118.2 g of PM, and reacted for 20 hours under reflux with heating to give 10% by mass of an acrylic copolymer (PA-7). A solution containing was obtained. Mn of the obtained acrylic copolymer was 22,000 and Mw was 41,000.
<B成分の合成>
<重合例7>
 BMAA 100.0g、重合触媒としてAIBN 4.2gをPM 193.5gに溶解し、90℃にて20時間反応させることによりアクリル重合体溶液を得た。得られたアクリル重合体のMnは2,700、Mwは3,900であった。アクリル重合体溶液をヘキサン2000.0gに徐々に滴下して固体を析出させ、ろ過および減圧乾燥することで、重合体(PB-1)を得た。
<Synthesis of B component>
<Polymerization Example 7>
BMAA 100.0 g and AIBN 4.2 g as a polymerization catalyst were dissolved in PM 193.5 g and reacted at 90 ° C. for 20 hours to obtain an acrylic polymer solution. Mn of the obtained acrylic polymer was 2,700 and Mw was 3,900. The acrylic polymer solution was gradually added dropwise to 2000.0 g of hexane to precipitate a solid, which was filtered and dried under reduced pressure to obtain a polymer (PB-1).
<C成分の合成>
<重合例8> 
 MMA 30.0g、HEMA 3.0g、重合触媒としてAIBN 0.3gをPM 146.0gに溶解し、80℃にて20時間反応させることによりアクリル共重合体溶液を得た。アクリル共重合体溶液をヘキサン 1000.0gに徐々に滴下して固体を析出させ、ろ過および減圧乾燥することでアクリル共重合体(PC-1)を得た。得られたアクリル共重合体のMnは18,000、Mwは32,800であった。
<Synthesis of component C>
<Polymerization Example 8>
30.0 g of MMA, 3.0 g of HEMA, and 0.3 g of AIBN as a polymerization catalyst were dissolved in 146.0 g of PM and reacted at 80 ° C. for 20 hours to obtain an acrylic copolymer solution. The acrylic copolymer solution was gradually added dropwise to 1000.0 g of hexane to precipitate a solid, which was filtered and dried under reduced pressure to obtain an acrylic copolymer (PC-1). Mn of the obtained acrylic copolymer was 18,000 and Mw was 32,800.
<重合性液晶溶液の調製>
<調製例1>
 重合性液晶LC242(BASF社製)29.0g、重合開始剤としてイルガキュア907(BASF社製)0.9g、レベリング剤としてBYK-361N(BYK社製)0.2g、溶媒としてのMIBKを加えて固形分濃度が30質量%の重合性液晶溶液(RM-1)を得た。
<Preparation of polymerizable liquid crystal solution>
<Preparation Example 1>
Polymeric liquid crystal LC242 (manufactured by BASF) 29.0g, Irgacure 907 (manufactured by BASF) 0.9g as a polymerization initiator, BYK-361N (manufactured by BYK) 0.2g as a leveling agent, and MIBK as a solvent were added. A polymerizable liquid crystal solution (RM-1) having a solid content concentration of 30% by mass was obtained.
<調製例2>
 重合性液晶LC242(BASF社製)29.0g、重合開始剤としてイルガキュア907(BASF社製)0.9g、レベリング剤としてBYK-361N(BYK社製)0.2g、溶媒としてのCPを加えて固形分濃度が30質量%の重合性液晶溶液(RM-2)を得た。
<Preparation Example 2>
29.0 g of polymerizable liquid crystal LC242 (manufactured by BASF), 0.9 g of Irgacure 907 (manufactured by BASF) as a polymerization initiator, 0.2 g of BYK-361N (manufactured by BYK) as a leveling agent, and CP as a solvent were added. A polymerizable liquid crystal solution (RM-2) having a solid content concentration of 30% by mass was obtained.
<実施例1>
 (A)成分として上記重合例1で得たアクリル共重合体(PA-1)を10質量%含有する溶液のアクリル共重合体(PA-1)に換算して100質量部に相当する量、(B)成分としてHMM 30質量部、(D)成分としてPTSA 3質量部を混合し、これにPMおよびCHを加え、溶媒組成がPM:CH=80:20(質量比)、固形分濃度が5.0質量%の配向材形成組成物(A-1)を調製した。
<Example 1>
(A) an amount corresponding to 100 parts by mass in terms of an acrylic copolymer (PA-1) in a solution containing 10% by mass of the acrylic copolymer (PA-1) obtained in Polymerization Example 1 as a component, (B) 30 parts by mass of HMM as the component, 3 parts by mass of PTSA as the (D) component, PM and CH are added thereto, the solvent composition is PM: CH = 80: 20 (mass ratio), and the solid content concentration is A 5.0 mass% alignment material-forming composition (A-1) was prepared.
<実施例2~9および比較例1~3>
 各成分の種類と量を、それぞれ表1に記載のとおりとしたほかは、実施例1と同様に実施し、配向材形成組成物A-2~A-12を、それぞれ調製した。
<Examples 2 to 9 and Comparative Examples 1 to 3>
Alignment material forming compositions A-2 to A-12 were respectively prepared in the same manner as in Example 1 except that the types and amounts of the respective components were as shown in Table 1.
Figure JPOXMLDOC01-appb-T000024
Figure JPOXMLDOC01-appb-T000024
<実施例10~18および比較例4~6>
[配向性の評価]
 実施例1~9および比較例1~3の各配向剤用組成物を、TACフィルム上にバーコーターを用いてWet膜厚4μmにて塗布した。それぞれ温度110℃で60秒間、熱循環式オーブン中で加熱乾燥を行い、TACフィルム上にそれぞれ硬化膜を形成した。この各硬化膜に313nmの直線偏光を20mJ/cmの露光量で垂直に照射し、配向材を形成した。TACフィルム上の配向材の上に、重合性液晶溶液(RM-1)もしくは(RM-2)を、バーコーターを用いてWet膜厚6μmにて塗布した。この塗膜を温度90℃のホットプレート上で60秒間乾燥後、300mJ/cmで露光し、位相差材を作製した。作製した基板上の位相差材を一対の偏光板で挟み込み、位相差材における位相差特性の発現状況を観察し、位相差が欠陥なく発現しているものを○、位相差が発現していないものを×として「配向性」の欄に記載した。評価結果は、後に表2にまとめて示す。
<Examples 10 to 18 and Comparative Examples 4 to 6>
[Evaluation of orientation]
The alignment agent compositions of Examples 1 to 9 and Comparative Examples 1 to 3 were applied on a TAC film at a wet film thickness of 4 μm using a bar coater. Each was heated and dried in a heat circulation oven at a temperature of 110 ° C. for 60 seconds to form a cured film on the TAC film. Each cured film was irradiated vertically with 313 nm linearly polarized light at an exposure amount of 20 mJ / cm 2 to form an alignment material. On the alignment material on the TAC film, a polymerizable liquid crystal solution (RM-1) or (RM-2) was applied with a wet film thickness of 6 μm using a bar coater. This coating film was dried on a hot plate at a temperature of 90 ° C. for 60 seconds and then exposed at 300 mJ / cm 2 to produce a retardation material. The phase difference material on the prepared substrate is sandwiched between a pair of polarizing plates, the state of the phase difference characteristic in the phase difference material is observed, ○ if the phase difference is expressed without defects, and no phase difference is expressed The thing was described as "x" in the column of "orientation". The evaluation results are summarized in Table 2 later.
Figure JPOXMLDOC01-appb-T000025
Figure JPOXMLDOC01-appb-T000025
 表2に示すように、実施例10~18では重合性液晶溶液RM-1およびRM-2のどちらを用いても、得られた位相差材は良好な配向性を示した。 As shown in Table 2, in Examples 10 to 18, the obtained retardation material showed good alignment even when any of the polymerizable liquid crystal solutions RM-1 and RM-2 was used.
 それに対して、比較例4~5ではRM-1を用いて得られた位相差材は良好な配向性を示したが、RM-2を用いて得られた位相差材は良好な配向性が得られなかった。 On the other hand, in Comparative Examples 4 to 5, the retardation material obtained using RM-1 showed good orientation, but the retardation material obtained using RM-2 had good orientation. It was not obtained.
 また、比較例6ではRM-1およびRM-2のどちらを用いても、位相差材は良好な配向性が得られなかった。 Further, in Comparative Example 6, the phase difference material did not have good orientation even when either RM-1 or RM-2 was used.
<実施例19>
 (A)成分として上記重合例9で得たアクリル共重合体(PA-7)を10質量%含有する溶液のアクリル共重合体(PA-7)に換算して100質量部に相当する量、(B)成分としてHMM 30質量部、(D)成分としてPTSA 3質量部を混合し、これにPMおよびCHを加え、溶媒組成がPM:CH=80:20(質量比)、固形分濃度が5.0質量%の配向材形成組成物(A-13)を調製した。
<Example 19>
An amount corresponding to 100 parts by mass in terms of an acrylic copolymer (PA-7) in a solution containing 10% by mass of the acrylic copolymer (PA-7) obtained in Polymerization Example 9 as the component (A), (B) 30 parts by mass of HMM as the component, 3 parts by mass of PTSA as the (D) component, PM and CH are added thereto, the solvent composition is PM: CH = 80: 20 (mass ratio), and the solid content concentration is A 5.0% by mass alignment material-forming composition (A-13) was prepared.
<実施例20~22>
[配向性の評価]
 実施例1~2および19の各配向剤用組成物を、TACフィルム上にバーコーターを用いてWet膜厚4μmにて塗布した。それぞれ温度90℃で60秒間、熱循環式オーブン中で加熱乾燥を行い、TACフィルム上にそれぞれ硬化膜を形成した。この各硬化膜に313nmの直線偏光を5mJ/cmもしくは20mJ/cmの露光量で垂直に照射し、配向材を形成した。TACフィルム上の配向材の上に、重合性液晶溶液(RM-1)を、バーコーターを用いてWet膜厚6μmにて塗布した。この塗膜を温度90℃のホットプレート上で60秒間乾燥後、300mJ/cmで露光し、位相差材を作製した。作製した基板上の位相差材を一対の偏光板で挟み込み、位相差材における位相差特性の発現状況を観察し、位相差が欠陥なく発現しているものを○、位相差が発現していないものを×として「配向性」の欄に記載した。評価結果は、後に表3にまとめて示す。
<Examples 20 to 22>
[Evaluation of orientation]
The alignment agent compositions of Examples 1 to 2 and 19 were applied on a TAC film at a wet film thickness of 4 μm using a bar coater. Each was heated and dried in a thermal circulation oven at a temperature of 90 ° C. for 60 seconds to form a cured film on the TAC film. The linearly polarized light of 313nm in the cured film was irradiated perpendicularly with an exposure amount of 5 mJ / cm 2 or 20 mJ / cm 2, to form an alignment material. On the alignment material on the TAC film, a polymerizable liquid crystal solution (RM-1) was applied with a wet film thickness of 6 μm using a bar coater. 60 seconds after drying this coating temperature 90 ° C. on a hot plate, exposed with 300 mJ / cm 2, to produce a phase difference member. The phase difference material on the prepared substrate is sandwiched between a pair of polarizing plates, the state of the phase difference characteristic in the phase difference material is observed, ○ if the phase difference is expressed without defects, and no phase difference is expressed The thing was described as "x" in the column of "orientation". The evaluation results are summarized in Table 3 later.
Figure JPOXMLDOC01-appb-T000026
Figure JPOXMLDOC01-appb-T000026
 本発明による硬化膜形成組成物は、液晶表示素子の液晶配向膜や、液晶表示素子に内部や外部に設けられる光学異方性フィルムを形成するための配向材を形成する材料として非常に有用であり、特に、IPS-LCDや有機ELディスプレイの反射防止膜として使用される円偏光板の位相差材向け材料として好適である。 The cured film forming composition according to the present invention is very useful as a material for forming a liquid crystal alignment film of a liquid crystal display element and an alignment material for forming an optically anisotropic film provided inside or outside the liquid crystal display element. In particular, it is suitable as a material for a phase difference material of a circularly polarizing plate used as an antireflection film for an IPS-LCD or an organic EL display.

Claims (12)

  1. (A)エポキシ基を有するモノマーと下記式(1)で表される桂皮酸誘導体との反応生成物であるモノマーを用いて得られる重合体、並びに
    (B)架橋剤
    を含有する硬化膜形成組成物。
    Figure JPOXMLDOC01-appb-C000001
    (式(1)中、AとAはそれぞれ独立に、水素原子またはメチル基を表し、Rは水素原子、ハロゲン原子、炭素原子数1~6のアルキル基、炭素原子数1~6のハロアルキル基、炭素原子数3~8のシクロアルキル基、炭素原子数3~8のハロシクロアルキル基、炭素原子数2~6のアルケニル基、炭素原子数2~6のハロアルケニル基、炭素原子数3~8のシクロアルケニル基、炭素原子数3~8のハロシクロアルケニル基、炭素原子数2~6のアルキニル基、炭素原子数2~6のハロアルキニル基、炭素原子数1~6のアルコキシ基、炭素原子数1~6のハロアルコキシ基、(炭素原子数1~6のアルキル)カルボニル基、(炭素原子数1~6のハロアルキル)カルボニル基、(炭素原子数1~6のアルコキシ)カルボニル基、(炭素原子数1~6のハロアルコキシ)カルボニル基、(炭素原子数1~6のアルキルアミノ)カルボニル基、(炭素原子数1~6のハロアルキル)アミノカルボニル基、ジ(炭素原子数1~6のアルキル)アミノカルボニル基、シアノ基およびニトロ基からなる群から選ばれる置換基を表し、Rは2価の芳香族基、2価の脂環族基、2価の複素環式基または2価の縮合環式基を表し、Rは単結合、酸素原子、-COO-または-OCO-を表し、R~Rはそれぞれ独立に水素原子、ハロゲン原子、炭素原子数1~6のアルキル基、炭素原子数1~6のハロアルキル基、炭素原子数1~6のアルコキシ基、炭素原子数1~6のハロアルコキシ基、シアノ基、およびニトロ基からなる群から選ばれる置換基を表し、nは0~3の整数である。)
    (A) a polymer obtained by using a monomer which is a reaction product of a monomer having an epoxy group and a cinnamic acid derivative represented by the following formula (1), and (B) a cured film forming composition containing a crosslinking agent object.
    Figure JPOXMLDOC01-appb-C000001
    (In Formula (1), A 1 and A 2 each independently represent a hydrogen atom or a methyl group, R 1 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, or 1 to 6 carbon atoms. Haloalkyl group, cycloalkyl group having 3 to 8 carbon atoms, halocycloalkyl group having 3 to 8 carbon atoms, alkenyl group having 2 to 6 carbon atoms, haloalkenyl group having 2 to 6 carbon atoms, carbon atom A cycloalkenyl group having 3 to 8 carbon atoms, a halocycloalkenyl group having 3 to 8 carbon atoms, an alkynyl group having 2 to 6 carbon atoms, a haloalkynyl group having 2 to 6 carbon atoms, and an alkoxy having 1 to 6 carbon atoms Group, haloalkoxy group having 1 to 6 carbon atoms, (alkyl having 1 to 6 carbon atoms) carbonyl group, (haloalkyl having 1 to 6 carbon atoms) carbonyl group, (alkoxy having 1 to 6 carbon atoms) carbonyl Group, Haloalkoxy having 1 to 6 carbon atoms) carbonyl group, (alkylamino having 1 to 6 carbon atoms) carbonyl group, (haloalkyl having 1 to 6 carbon atoms) aminocarbonyl group, di (having 1 to 6 carbon atoms) Alkyl) aminocarbonyl group, a substituent selected from the group consisting of a cyano group and a nitro group, R 2 is a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group or a divalent group. R 3 represents a single bond, an oxygen atom, —COO— or —OCO—, and R 4 to R 7 each independently represents a hydrogen atom, a halogen atom, or an alkyl having 1 to 6 carbon atoms. A substituent selected from the group consisting of a group, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, and a nitro group; n is an integer from 0 to 3 )
  2. (B)架橋剤が、メチロール基またはアルコキシメチル基を有する架橋剤である、請求項1に記載の硬化膜形成組成物。 (B) The cured film forming composition of Claim 1 whose crosslinking agent is a crosslinking agent which has a methylol group or an alkoxymethyl group.
  3. (C)ヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基からなる群から選ばれる少なくとも1つの基を有するポリマーをさらに含有する請求項1または2に記載の硬化膜形成組成物。 The cured film forming composition according to claim 1 or 2, further comprising (C) a polymer having at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group.
  4. (D)架橋触媒をさらに含有する請求項1乃至3のうち何れか一項に記載の硬化膜形成組成物。 (D) The cured film formation composition as described in any one of Claims 1 thru | or 3 which further contains a crosslinking catalyst.
  5. (E)1つ以上の重合性基と、ヒドロキシ基、カルボキシル基、アミド基、アミノ基、およびアルコキシシリル基からなる群から選ばれる少なくとも1つの基Aまたは該基Aと反応する少なくとも1つの基とを有する化合物を含有する請求項1乃至4のうち何れか一項に記載の硬化膜形成組成物。 (E) one or more polymerizable groups and at least one group A selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or at least one group that reacts with the group A The cured film forming composition as described in any one of Claims 1 thru | or 4 containing the compound which has these.
  6. (A)成分100質量部に基づいて、1質量部~500質量部の(B)成分を含有する請求項1乃至4のうち何れか一項に記載の硬化膜形成組成物に関する。 The cured film forming composition according to any one of claims 1 to 4, comprising 1 part by mass to 500 parts by mass of the component (B) based on 100 parts by mass of the component (A).
  7. (A)成分および(B)成分の架橋剤の合計量の100質量部に対して1質量部~400質量部の(C)成分を含有する請求項3乃至6の何れか一項に記載の硬化膜形成組成物。 The component (C) according to any one of claims 3 to 6, comprising 1 part by mass to 400 parts by mass of the component (C) with respect to 100 parts by mass of the total amount of the crosslinking agent of the component (A) and the component (B). Cured film forming composition.
  8. (A)成分および(B)成分の架橋剤の合計量の100質量部に対して0.01質量部~20質量部の(D)成分を含有する請求項4乃至7の何れか一項に記載の硬化膜形成組成物。 The component (D) according to any one of claims 4 to 7, comprising 0.01 to 20 parts by mass of the component (D) with respect to 100 parts by mass of the total amount of the crosslinking agent of the component (A) and the component (B). The cured film forming composition as described.
  9. (A)成分および(B)成分の架橋剤の合計量の100質量部に対して1質量部~100質量部の(E)成分を含有する請求項5乃至8の何れか一項に記載の硬化膜形成組成物。 The component (E) according to any one of claims 5 to 8, comprising 1 part by mass to 100 parts by mass of the component (E) with respect to 100 parts by mass of the total amount of the crosslinking agent of the component (A) and the component (B). Cured film forming composition.
  10. 請求項1乃至9記載の硬化膜形成組成物を硬化させて得られる硬化膜。 A cured film obtained by curing the cured film-forming composition according to claim 1.
  11. 請求項1乃至9の何れか一項に記載の硬化膜形成組成物を硬化させて形成される配向材。 An alignment material formed by curing the cured film forming composition according to any one of claims 1 to 9.
  12. 請求項1乃至9の何れか一項に記載の硬化膜形成組成物を硬化させて得られる硬化膜を有する位相差材。 A phase difference material having a cured film obtained by curing the cured film forming composition according to claim 1.
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