WO2018176786A1 - 显示面板保护玻璃及其制备方法、显示面板和显示装置 - Google Patents

显示面板保护玻璃及其制备方法、显示面板和显示装置 Download PDF

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Publication number
WO2018176786A1
WO2018176786A1 PCT/CN2017/105319 CN2017105319W WO2018176786A1 WO 2018176786 A1 WO2018176786 A1 WO 2018176786A1 CN 2017105319 W CN2017105319 W CN 2017105319W WO 2018176786 A1 WO2018176786 A1 WO 2018176786A1
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WIPO (PCT)
Prior art keywords
layer
glass substrate
display panel
black matrix
white photoresist
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PCT/CN2017/105319
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English (en)
French (fr)
Inventor
范文金
李保然
李必生
张雷
王胜男
黄晶
张卫
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Priority to US15/775,662 priority Critical patent/US11112630B2/en
Publication of WO2018176786A1 publication Critical patent/WO2018176786A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133331—Cover glasses
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • Embodiments of the present disclosure relate to the field of display technologies, and in particular, to a display panel protective glass, a method for fabricating the same, a display panel, and a display device.
  • OGS One Glass Solution
  • the white border OGS products developed by the manufacturers have gradually moved from the experimental stage to the small batch mass production stage.
  • the existing white border OGS product generally has a white photoresist layer and a black matrix layer structure to avoid the metal wire in the frame from seeing out; however, In this type of OGS product, the white color of the frame area is often not pure enough, the color deviation is serious, and the user's visual experience is poor.
  • At least one embodiment of the present disclosure provides a liquid crystal display device, including:
  • the white photoresist layer being disposed along a frame region of the glass substrate;
  • the black matrix layer being disposed along a bezel area of the glass substrate.
  • the isolation layer comprises an inorganic insulating layer and/or an organic layer.
  • the isolation layer comprises a silicon dioxide film layer.
  • the isolation layer is a whole layer structure covering the entire glass substrate.
  • the isolation layer is disposed along a frame region of the glass substrate, and a projection of the isolation layer on the glass substrate covers the white photoresist layer and the black matrix layer is Projection on the glass substrate.
  • the display panel protection glass further includes a touch structure on the glass substrate.
  • At least one embodiment of the present disclosure provides a display panel comprising the display panel cover glass of any of the foregoing technical solutions.
  • At least one embodiment of the present disclosure provides a display device including the display panel of any of the foregoing technical solutions.
  • At least one embodiment of the present disclosure provides a method for preparing a display panel protective glass, including:
  • the white photoresist film layer and the black matrix film layer are disposed along a frame region of the glass substrate by at least one patterning process to form a white photoresist layer pattern and a black matrix layer pattern, respectively.
  • the isolation layer comprises an inorganic insulating layer and/or an organic layer.
  • the isolation layer comprises a silicon dioxide film layer.
  • the preparation method specifically includes the following steps:
  • a black matrix film layer is formed on the isolation layer, and a black matrix layer pattern is formed by a second patterning process.
  • the preparation method specifically includes the following steps:
  • the method further includes:
  • a touch structure is formed on the glass substrate.
  • FIG. 1 is a schematic structural diagram of a cover glass of a display panel according to an embodiment of the present disclosure
  • FIG. 2 is a schematic structural view of a cut surface of a cover glass of a display panel according to an embodiment of the present disclosure
  • FIG. 3 is a schematic structural view of a cut surface of a cover glass of a display panel according to another embodiment of the present disclosure
  • FIG. 4 is a flow chart of a method for preparing a display panel protective glass according to an embodiment of the present disclosure
  • FIG. 5 is a flow chart of a method for preparing a display panel protective glass according to another embodiment of the present disclosure.
  • a display panel protection glass includes:
  • a glass substrate 1 comprising a display area A and a frame area B surrounding the display area A;
  • the white photoresist layer 2 and the black matrix layer 4 are sequentially disposed on the frame region B of the glass substrate 1. Therefore, the display panel protective glass can be displayed as a white border and the frame shading effect is higher. Moreover, since the isolation layer 3 is disposed between the white photoresist layer 2 and the black matrix layer 4, the influence of the black matrix layer 4 on the white photoresist layer 2 and the color interference can be avoided, and further, the above display panel protection
  • the white border of the glass is pure in color, high in color purity, small in color, and good in user experience.
  • the isolation layer 3 may be an inorganic insulating layer such as silicon oxide or silicon nitride, or may be a resin, an ultraviolet curing adhesive (UV adhesive), a silica gel, or an acrylic.
  • the organic film layer such as glue or various polyterephthalic plastics (PET) may also be a multilayer structure including both an inorganic film layer and an organic film layer.
  • the isolation layer 3 is made of the above various materials, and does not cause problems such as electrostatic induction or signal interference.
  • the isolation layer 3 may be a silicon dioxide film layer; the silicon dioxide film layer has better compactness and can be formed. Good isolation.
  • the isolation layer 3 may be a whole layer structure covering the entire glass substrate 1.
  • the isolation layer 3 can be formed only by the coating process, and the patterning process such as photolithography is not required. Therefore, the process steps of preparing the isolation layer 3 are relatively simple; with this arrangement, the isolation layer 3 needs to select a light transmittance. High material preparation to increase the transmittance of the display area A of the display panel protective glass.
  • the isolation layer 3 may be disposed along the frame region B of the glass substrate 1; specifically, the projection of the isolation layer 3 on the glass substrate 1 covers the white photoresist layer 2 and black.
  • the projection of the matrix layer 4 on the glass substrate 1, i.e. the area of the spacer layer 3, is sufficient to completely isolate the white photoresist layer 2 from the black matrix layer 4.
  • the isolation layer 3 is disposed only on the frame region B of the glass substrate 1 to avoid the interference effect of the black matrix layer 4 on the white photoresist layer 2, thereby improving the color purity of the white frame without affecting the display panel protective glass display.
  • the transmittance of the area A, and the selection requirements of the isolation layer 3 are also relatively loose.
  • the display panel protection glass may further include a touch structure on the glass substrate 1 to thereby display the display surface.
  • the touch panel structure may include a touch electrode 5 and an insulating layer 6
  • the touch electrode 5 may further include a transmitting electrode 51 and a receiving electrode 52 .
  • the embodiment of the present disclosure further provides a display panel including the display panel cover glass in any of the above embodiments.
  • the embodiment of the present disclosure further provides a display device including the display panel in the above embodiment.
  • the display panel and the display device are both protected by the display panel in the embodiment of the present disclosure, they are all white borders, and the white color of the frame is high in purity and small in color.
  • the display panel protective glass of the above embodiment of the present disclosure further provides a method for preparing a display panel protective glass, the method comprising:
  • the white photoresist film layer and the black matrix film layer are disposed along the frame region of the glass substrate by at least one patterning process to form a white photoresist layer pattern and a black matrix layer pattern, respectively.
  • a method for preparing a display panel protective glass may specifically include the following steps:
  • Step S101 forming a white photoresist film on the glass substrate 1, forming a white photoresist layer 2 pattern by a patterning process, the white photoresist layer 2 being disposed along the frame region B of the glass substrate 1;
  • Step S102 forming an isolation layer 3 on the white photoresist layer 2;
  • step S103 a black matrix film layer is formed on the isolation layer 3, and a black matrix layer 4 pattern is formed by a patterning process, and the black matrix layer 4 is disposed along the frame region B of the glass substrate 1.
  • a method for preparing a display panel protective glass may specifically include the following steps:
  • Step S201 forming a white photoresist film layer on the glass substrate 1;
  • Step S202 forming an isolation layer on the white photoresist film layer
  • Step S203 forming a black matrix film layer on the isolation film layer
  • Step S204 simultaneously forming a white photoresist layer 2 pattern, a spacer layer 3 pattern, and a black matrix layer 4 pattern by using a patterning process, wherein the white photoresist layer 2, the isolation layer 3, and the black matrix layer 4 are along the border of the glass substrate 1.
  • the embodiment shown in Figures 3 and 5 uses only one patterning process to reduce the number of patterning processes. Improve production efficiency and reduce costs.
  • the isolation layer 3 may be an inorganic insulating layer such as silicon oxide or silicon nitride, or may be rubber, resin or
  • the organic film layer such as UV glue may also be a multilayer structure including both an inorganic film layer and an organic film layer.
  • the isolation layer 3 is made of the above various materials, and does not cause problems such as electrostatic induction or signal interference.
  • the isolation layer 3 may be a silicon dioxide film layer.
  • the silica film layer has a good compactness and can form a better isolation effect.
  • forming the isolation layer on the white photoresist layer may specifically include: forming a silicon dioxide film layer on the white photoresist layer 2 by a sputtering coating process.
  • the processing method in FIG. 4 may be adopted, that is, the silicon dioxide film layer is directly used as the isolation layer 3.
  • the structure of the display panel protective glass is as shown in FIG. 2; the processing method in FIG. 5 may also be adopted. That is, the silicon dioxide film layer is further patterned by a patterning process to finally form the isolation layer 3 disposed along the frame region B of the glass substrate 1.
  • the structure of the display panel protective glass is as shown in FIG. Specifically, the projection of the isolation layer 3 on the glass substrate 1 covers the projection of the white photoresist layer 2 and the black matrix layer 4 on the glass substrate 1, that is, the area of the isolation layer 3 is sufficient to the white photoresist layer 2 and the black matrix layer 4 Completely isolated.
  • the preparation method may further include the following steps:
  • a touch structure is formed on the glass substrate 1, as shown in FIGS. 2 and 3.
  • forming a touch structure on the glass substrate 1 may include the following steps:
  • a second insulating layer is formed on the metal bridge 7, and a second insulating layer pattern is formed by a patterning process.
  • the insulating layer 6 labeled in FIG. 2 and FIG. 3 includes two insulating layers of a first insulating layer and a second insulating layer which are sequentially formed.
  • touch structure is only one specific embodiment of the present disclosure.
  • the touch structure in the cover glass of the present disclosure is not limited to the touch structure in the above embodiment.

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  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
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Abstract

一种显示面板保护玻璃及其制备方法、显示面板和显示装置。显示面板保护玻璃包括：玻璃基板（1）；位于玻璃基板（1）上的白色光阻层（2），白色光阻层（2）沿玻璃基板（1）的边框区域（B）设置；位于白色光阻层（2）上的隔离层（3）；位于隔离层（3）上的黑色矩阵层（4），黑色矩阵层（4）沿玻璃基板（1）的边框区域（B）设置。

Description

显示面板保护玻璃及其制备方法、显示面板和显示装置
本申请要求在2017年03月27日提交中国专利局、申请号为201710188500.6、发明名称为“显示面板保护玻璃及其制备方法、显示面板和显示装置”的中国专利申请的优先权，该申请的全部内容通过引用结合在本申请中。
技术领域
本公开实施例涉及显示技术领域，特别涉及一种显示面板保护玻璃及其制备方法、显示面板和显示装置。
背景技术
目前电容触摸屏已成为很普遍的电子产品，而OGS(One Glass Solution)为其中一种主流产品，由于消费者的个性化追求，目前，传统的黑色边框OGS产品已不能满足大众消费需求，部分触摸屏厂商研发的白色边框OGS产品已逐渐从试验阶段走向小批量量产阶段。
由于白色光阻材料的遮光性较差，因此，现有的白色边框OGS产品，其边框一般都包括白色光阻层和黑色矩阵层两层结构，以避免边框内的金属线透视出来；然而，该类OGS产品，其边框区域的白色往往不够纯正，色偏较严重，用户视觉体验效果较差。
发明内容
本公开至少一实施例提供了一种液晶显示装置，包括：
玻璃基板；
位于所述玻璃基板上的白色光阻层，所述白色光阻层沿所述玻璃基板的边框区域设置；
位于所述白色光阻层上的隔离层；
位于所述隔离层上的黑色矩阵层，所述黑色矩阵层沿所述玻璃基板的边框区域设置。
本公开的某一实施例中，所述隔离层包括无机绝缘层和/或有机层。
本公开的某一实施例中，所述隔离层包括二氧化硅膜层。
本公开的某一实施例中，所述隔离层为覆盖整个所述玻璃基板的整层结构。
本公开的某一实施例中，所述隔离层沿所述玻璃基板的边框区域设置，且所述隔离层在所述玻璃基板上的投影覆盖所述白色光阻层以及所述黑色矩阵层在所述玻璃基板上的投影。
本公开的某一实施例中，所述的显示面板保护玻璃还包括位于所述玻璃基板上触控结构。
本公开至少一实施例提供了一种显示面板，包括前述任一技术方案所述的显示面板保护玻璃。
本公开至少一实施例提供了一种显示装置，包括前述任一技术方案所述的显示面板。
本公开至少一实施例提供了一种显示面板保护玻璃的制备方法，包括：
在玻璃基板上形成白色光阻膜层；
在所述白色光阻膜层上形成隔离层；
在所述隔离层上形成黑色矩阵膜层；
通过至少一次构图工艺使所述白色光阻膜层和所述黑色矩阵膜层沿所述玻璃基板的边框区域设置，以分别形成白色光阻层图案和黑色矩阵层图案。
本公开的某一实施例中，所述隔离层包括无机绝缘层和/或有机层。
本公开的某一实施例中，所述隔离层包括二氧化硅膜层。
本公开的某一实施例中，所述的制备方法具体包括以下步骤：
在玻璃基板上形成白色光阻膜层，采用第一次构图工艺形成白色光阻层图案；
在所述白色光阻层上形成隔离层；
在所述隔离层上形成黑色矩阵膜层，采用第二次构图工艺形成黑色矩阵层图案。
本公开的某一实施例中，所述的制备方法具体包括以下步骤：
在玻璃基板上形成白色光阻膜层；
在所述白色光阻膜层上形成隔离层；
在所述隔离层上形成黑色矩阵膜层；
采用一次构图工艺同时形成白色光阻层图案、隔离层图案和黑色矩阵层图案，所述白色光阻层、隔离层和黑色矩阵层沿所述玻璃基板的边框区域设 置。
本公开的某一实施例中，所述的制备方法在采用构图工艺形成黑色矩阵层图案之后，还包括：
在所述玻璃基板上形成触控结构。
附图说明
为了更清楚地说明本公开实施例或相关技术中的技术方案，下面将对实施例或相关技术描述中所需要使用的附图作一简单地介绍，显而易见地，下面描述中的附图是本公开的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本公开实施例提供的一种显示面板保护玻璃的结构示意图；
图2为本公开实施例提供的一种显示面板保护玻璃的切面结构示意图；
图3为本公开另一实施例提供的一种显示面板保护玻璃的切面结构示意图；
图4为本公开实施例提供的一种显示面板保护玻璃的制备方法流程图；
图5为本公开另一实施例提供的一种显示面板保护玻璃的制备方法流程图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例中的附图，对本公开实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于本公开中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本公开保护的范围。
如图1～图3所示，本公开实施例提供的一种显示面板保护玻璃，包括：
玻璃基板1，该玻璃基板1包括显示区域A以及包围显示区域A的边框区域B；
位于玻璃基板1上的白色光阻层2，该白色光阻层2沿玻璃基板1的边框区域B设置；
位于白色光阻层2上的隔离层3；
位于隔离层3上的黑色矩阵层4，该黑色矩阵层4沿玻璃基板1的边框区 域B设置。
上述显示面板保护玻璃中，玻璃基板1的边框区域B上依次设置有白色光阻层2和黑色矩阵层4两层结构，因此，该显示面板保护玻璃可以显示为白色边框且其边框遮光效果较好；并且，由于白色光阻层2和黑色矩阵层4之间设置有隔离层3，从而可以避免黑色矩阵层4对白色光阻层2的渗透作用和颜色干扰影响，进而，上述显示面板保护玻璃的白色边框颜色纯正、色纯度较高、色偏较小，用户体验较好。
如图2和图3所示，一种具体的实施例中，隔离层3可以为氧化硅或氮化硅等无机绝缘层，也可以为树脂、紫外光固化胶(UV胶)、硅胶、亚克力胶或者各种聚对苯二甲酸类塑料(PET)等有机膜层，还可以为既包括无机膜层又包括有机膜层的多层结构。
如图1所示，由于显示面板保护玻璃的边框区域B一般会设置金属走线8，因此，隔离层3选用上述各种材料，不会导致静电感应或信号干扰等问题。
如图2和图3所示，在上述实施例的基础上，一种具体的实施例中，隔离层3可以为二氧化硅膜层；二氧化硅膜层的致密性较好，可以形成更好的隔离效果。
在上述各实施例的基础上，如图2所示，一种具体的实施例中，隔离层3可以为覆盖整个玻璃基板1的整层结构。此时，只需通过镀膜工艺即可形成隔离层3，无需进行光刻等构图工艺，因此，制备隔离层3的工艺步骤较简单；采用此种设置方式，隔离层3需要选择透光率较高的材料制备，以提高显示面板保护玻璃的显示区域A的透过率。
如图3所示，另一种具体的实施例中，隔离层3可以沿玻璃基板1的边框区域B设置；具体地，隔离层3在玻璃基板1上的投影覆盖白色光阻层2以及黑色矩阵层4在玻璃基板1上的投影，即隔离层3的面积足以将白色光阻层2和黑色矩阵层4完全隔离。
隔离层3仅设置于玻璃基板1的边框区域B上，既可以避免黑色矩阵层4对白色光阻层2的渗透干扰影响、从而提高白色边框的色纯度，又不会影响显示面板保护玻璃显示区域A的透过率，并且，隔离层3的选材要求也相对较宽松。
如图2和图3所示，在上述各实施例的基础上，一种具体的实施例中，显示面板保护玻璃还可以包括位于玻璃基板1上触控结构，从而使该显示面 板保护玻璃形成OGS触控面板；具体地，该触控结构可以包括触控电极5和绝缘层6等结构，其中，触控电极5又可包括发射电极51和接收电极52。
本公开实施例还提供了一种显示面板，该显示面板包括上述任一实施例中的显示面板保护玻璃。
本公开实施例还提供了一种显示装置，该显示装置包括上述实施例中的显示面板。
由于上述显示面板和显示装置都采用本公开实施例中的显示面板保护玻璃，因此，其都为白色边框，且边框的白色色纯度较高、色偏较小。
基于本公开上述实施例的显示面板保护玻璃，本公开实施例还提供了一种显示面板保护玻璃的制备方法，该方法包括：
在玻璃基板上形成白色光阻膜层；
在白色光阻膜层上形成隔离层；
在隔离层上形成黑色矩阵膜层；
通过至少一次构图工艺使白色光阻膜层和黑色矩阵膜层沿玻璃基板的边框区域设置，以分别形成白色光阻层图案和黑色矩阵层图案。
如图2和图4所示，在本公开的一具体实施例中，显示面板保护玻璃的制备方法，具体可以包括以下步骤：
步骤S101，在玻璃基板1上形成白色光阻膜层，采用构图工艺形成白色光阻层2图案，该白色光阻层2沿玻璃基板1的边框区域B设置；
步骤S102，在白色光阻层2上形成隔离层3；
步骤S103，在隔离层3上形成黑色矩阵膜层，采用构图工艺形成黑色矩阵层4图案，该黑色矩阵层4沿玻璃基板1的边框区域B设置。
如图3和图5所示，在本公开的另一具体实施例中，显示面板保护玻璃的制备方法，具体可以包括以下步骤：
步骤S201，在玻璃基板1上形成白色光阻膜层；
步骤S202，在白色光阻膜层上形成隔离层；
步骤S203，在隔离膜层上形成黑色矩阵膜层；
步骤S204，采用一次构图工艺同时形成白色光阻层2图案、隔离层3图案和黑色矩阵层4图案，其中，该白色光阻层2、隔离层3和黑色矩阵层4沿玻璃基板1的边框区域B叠层设置。
图3和图5所示的实施例只采用一次构图工艺，能够减少构图工艺次数， 提高生产效率、降低成本。
如图2和图3所示，在上述两个实施例的基础上，一种具体的实施例中，隔离层3可以为氧化硅或氮化硅等无机绝缘层，也可以为橡胶、树脂或者UV胶等有机膜层，还可以为既包括无机膜层又包括有机膜层的多层结构。如图1所示，由于显示面板保护玻璃的边框区域B一般会设置金属走线8，因此，隔离层3选用上述各种材料，不会导致静电感应或信号干扰等问题。
如图2和图3所示，在上述实施例的基础上，一种具体的实施例中，隔离层3可以为二氧化硅膜层。二氧化硅膜层的致密性较好，可以形成更好的隔离效果。
在上述实施例的基础上，一种具体的实施例中，在白色光阻层上形成隔离层，具体可以包括：采用溅射镀膜工艺在白色光阻层2上形成二氧化硅膜层。
进一步地，可以采用图4中的处理方法，即将上述二氧化硅膜层直接作为隔离层3，此时，显示面板保护玻璃的结构如图2所示；也可以采用图5中的处理方法，即进一步利用构图工艺对上述二氧化硅膜层进行构图，以最终形成沿玻璃基板1的边框区域B设置的隔离层3，此时，显示面板保护玻璃的结构如图3所示。具体地，隔离层3在玻璃基板1上的投影覆盖白色光阻层2和黑色矩阵层4在玻璃基板1上的投影，即隔离层3的面积足以将白色光阻层2和黑色矩阵层4完全隔离。
在上述各实施例的基础上，一种具体的实施例中，在通过至少一次构图工艺形成白色光阻层图案和黑色矩阵层图案之后，即形成了沿玻璃基板1的边框区域B设置的白色光阻层2和黑色矩阵层4之后，制备方法还可以包括以下步骤：
在玻璃基板1上形成触控结构，如图2和图3所示。
具体地，在玻璃基板1上形成触控结构，可以包括以下步骤：
在玻璃基板1上形成ITO层，采用构图工艺形成包括发射电极51和接收电极52的触控电极5的图案，如图1～图3所示；
在触控电极5上形成第一绝缘层，采用构图工艺形成第一绝缘层图案；
在第一绝缘层上形成金属层，采用构图工艺形成金属桥7图案，如图1～图3所示；
在金属桥7上形成第二绝缘层，采用构图工艺形成第二绝缘层图案。
需要说明的是，图2和图3中标注的绝缘层6包括依次形成的第一绝缘层和第二绝缘层两层绝缘层结构。
另外，上述触控结构只是本公开的一个具体实施例，本公开显示面板保护玻璃中的触控结构并不限于上述实施例中的触控结构。
最后应说明的是：以上实施例仅用以说明本公开的技术方案，而非对其限制；尽管参照前述实施例对本公开进行了详细的说明，本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本公开各实施例技术方案的精神和范围。

Claims (14)

  1. 一种显示面板保护玻璃，包括：
    玻璃基板；
    位于所述玻璃基板上的白色光阻层，所述白色光阻层沿所述玻璃基板的边框区域设置；
    位于所述白色光阻层上的隔离层；
    位于所述隔离层上的黑色矩阵层，所述黑色矩阵层沿所述玻璃基板的边框区域设置。
  2. 根据权利要求1所述的显示面板保护玻璃，其中，所述隔离层包括无机绝缘层和/或有机层。
  3. 根据权利要求1所述的显示面板保护玻璃，其中，所述隔离层包括二氧化硅膜层。
  4. 根据权利要求1所述的显示面板保护玻璃，其中，所述隔离层为覆盖整个所述玻璃基板的整层结构。
  5. 根据权利要求1所述的显示面板保护玻璃，其中，所述隔离层沿所述玻璃基板的边框区域设置，且所述隔离层在所述玻璃基板上的投影覆盖所述白色光阻层以及所述黑色矩阵层在所述玻璃基板上的投影。
  6. 根据权利要求1～5任一项所述的显示面板保护玻璃，还包括位于所述玻璃基板上触控结构。
  7. 一种显示面板，包括根据权利要求1～6任一项所述的显示面板保护玻璃。
  8. 一种显示装置，包括根据权利要求7所述的显示面板。
  9. 一种显示面板保护玻璃的制备方法，包括：
    在玻璃基板上形成白色光阻膜层；
    在所述白色光阻膜层上形成隔离层；
    在所述隔离层上形成黑色矩阵膜层；
    通过至少一次构图工艺使所述白色光阻膜层和所述黑色矩阵膜层沿所述玻璃基板的边框区域设置，以分别形成白色光阻层图案和黑色矩阵层图案。
  10. 根据权利要求9所述的制备方法，其中，所述隔离层包括无机绝缘层和/或有机层。
  11. 根据权利要求9所述的制备方法，其中，所述隔离层包括二氧化硅 膜层。
  12. 根据权利要求9所述的制备方法，具体包括以下步骤：
    在玻璃基板上形成白色光阻膜层，采用第一次构图工艺形成白色光阻层图案；
    在所述白色光阻层上形成隔离层；
    在所述隔离层上形成黑色矩阵膜层，采用第二次构图工艺形成黑色矩阵层图案。
  13. 根据权利要求9所述的制备方法，具体包括以下步骤：
    在玻璃基板上形成白色光阻膜层；
    在所述白色光阻膜层上形成隔离层；
    在所述隔离层上形成黑色矩阵膜层；
    采用一次构图工艺同时形成白色光阻层图案、隔离层图案和黑色矩阵层图案，所述白色光阻层、隔离层和黑色矩阵层沿所述玻璃基板的边框区域设置。
  14. 根据权利要求9～13任一项所述的制备方法，其中，在采用构图工艺形成黑色矩阵层图案之后，还包括：
    在所述玻璃基板上形成触控结构。
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