WO2018139631A1 - Resin sealing device and resin sealing method - Google Patents

Resin sealing device and resin sealing method Download PDF

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Publication number
WO2018139631A1
WO2018139631A1 PCT/JP2018/002656 JP2018002656W WO2018139631A1 WO 2018139631 A1 WO2018139631 A1 WO 2018139631A1 JP 2018002656 W JP2018002656 W JP 2018002656W WO 2018139631 A1 WO2018139631 A1 WO 2018139631A1
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WO
WIPO (PCT)
Prior art keywords
mold
cavity
resin
uncured resin
plunger
Prior art date
Application number
PCT/JP2018/002656
Other languages
French (fr)
Japanese (ja)
Inventor
義和 大谷
寛治 森
光 高橋
Original Assignee
信越エンジニアリング株式会社
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Filing date
Publication date
Application filed by 信越エンジニアリング株式会社 filed Critical 信越エンジニアリング株式会社
Publication of WO2018139631A1 publication Critical patent/WO2018139631A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/18Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles incorporating preformed parts or layers, e.g. compression moulding around inserts or for coating articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32Component parts, details or accessories; Auxiliary operations
    • B29C43/34Feeding the material to the mould or the compression means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32Component parts, details or accessories; Auxiliary operations
    • B29C43/36Moulds for making articles of definite length, i.e. discrete articles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings

Definitions

  • the present invention relates to a resin sealing apparatus used for manufacturing a molded product in which a workpiece on which a semiconductor element is mounted is manufactured in order to create a package such as a semiconductor package, and a resin sealing for manufacturing the package. It relates to the stopping method.
  • an upper mold having a holding mechanism for holding a substrate on the lower surface, and a lower mold having a cavity located below the upper mold, on which a semiconductor chip is mounted.
  • a compression molding device that holds the upper mold and clamps the lower mold and the upper mold by lowering the upper mold with respect to the lower mold after the resin is supplied to the cavity (see, for example, Patent Document 1). .
  • molding is performed by heating and pressing the resin, and a sealing body made of the resin is formed on the lower surface side of the substrate.
  • the substrate is transported to the lower surface of the upper mold by the carry-in transport unit, and the substrate is vacuum-sucked and held by the holding mechanism.
  • the resin is an epoxy resin powder resin.
  • the lower mold After being supplied to the cavity by the powder resin metering unit and the powder resin supply unit, the resin is melted by heating.
  • the lower mold includes a pair of flow cavities formed of depressions positioned on the outside of a pair of long sides in a rectangular cavity, a plurality of flow gates formed of grooves communicating with the cavity and the flow cavities, and a pair of short sides on the cavity. And an air vent composed of a continuous groove. Resin melted by clamping the lower mold and the upper mold flows into the pair of flow cavities, and the air remaining in the cavities is discharged out of the cavities by the air vent.
  • the upper mold is provided with two (flow cavity) plungers facing the pair of flow cavities of the lower mold. After clamping the lower mold and the upper mold, the two plungers enter the pair of flow cavities.
  • the melted resin in the pair of flow cavities is pressurized by the intrusion of the two plungers, so that the pressure of the resin in the cavities by mold clamping and the pressure of the resin in the pair of flow cavities are reduced. It is set to be the same. As a result, since the resin in the entire cavity is cured under an appropriate pressure, generation of bubbles (voids) inside the sealing body is suppressed. After that, the sealing body is taken out by releasing the lower mold and the upper mold.
  • mold molding that forms a sealed body includes an epoxy resin that is thermally decomposed and melted by heating, increases in viscosity with time from the melted state, and is thermoset and solidified in a relatively short time. Used.
  • the resin that has entered the gap between the hole and the plunger is an epoxy resin
  • the resin hardens and solidifies in a short time, so that the smooth movement of the plunger is hindered, causing malfunction and causing failure.
  • the yield decreases. Since the resin that has entered the gap between the hole and the plunger and solidified adheres to the gap, even if the lower mold and upper mold are released, the molded molded body cannot be taken out smoothly, requiring a long tact time As a result, the productivity was inferior. Therefore, in order to solve such problems, it is conceivable to remove the solidified resin that has entered the gap by disassembly and cleaning of the upper mold and the plunger.
  • the powder resin is melted after being supplied to the cavity as a resin, it is very difficult to supply the powder resin with a uniform thickness over the entire surface of the cavity, and the powder resin is concentrated and concentrated in a part of the cavity. Sometimes it was supplied. In this case, since the molten resin flows over a wide area toward the entire cavity, unevenness in the resin due to non-uniform flow friction (flow spots) occurs, or from the cavity due to mold clamping to the two flow cavities. There is a problem that a difference occurs in the amount of inflow of the resin or a cause of quality deterioration.
  • the structure of the entire apparatus is as much as the substrate carry-in transfer unit, the powder resin weighing unit and the powder resin supply unit are necessary. There was also a problem that it was complicated and maintenance was troublesome.
  • a resin sealing device is a resin sealing device that manufactures a molded product in which a workpiece on which a semiconductor element is mounted is resin-sealed.
  • a first mold having a pressing portion of the workpiece, and a second mold having a cavity that is provided opposite to a mounting surface on which the semiconductor element of the workpiece is mounted and is supplied with uncured resin,
  • An openable / closable sealed chamber formed between the first mold and the second mold, and either one or both of the first mold and the second mold are the first mold and the second mold.
  • a drive unit that moves relatively close to the opposing direction of the second mold, a pressurizing mechanism that includes a plunger that pressurizes the uncured resin in the cavity in the sealed chamber, and controls the operation of the drive unit and the plunger.
  • Control unit The pressurizing mechanism is provided with the uncured resin overflow channel provided continuously to the cavity in the second mold in the sealed chamber, and the second mold toward the overflow channel.
  • the first mold is provided to face the cavity, and the second mold is provided to face the overflow channel.
  • the part is a relative approaching movement of the first mold and the second mold by the drive unit, and the placement surface of the workpiece and the semiconductor element are immersed in the uncured resin in the cavity, With this immersion, the uncured resin in the cavity is While flowing out the flow path, characterized in that the plunger is controlled to protrude to move to the overflow path towards the third tegmentum site.
  • the resin sealing method according to the present invention is a resin sealing method for manufacturing a molded product in which a workpiece on which a semiconductor element is mounted is resin-sealed, in the direction opposite to the first molding die and the second molding die.
  • a sealing chamber is formed between the molding dies, a mounting surface on which the semiconductor element of the workpiece is mounted, and an immersion step of immersing the semiconductor element in the uncured resin in the cavity; Continuously with the cavity
  • the compression process of the uncured resin that pressurizes the uncured resin that has flowed into the overflow channel provided in the second mold by the protruding movement of the plunger provided in the second mold, and
  • FIG. 1 is a longitudinal sectional view taken along line (1)-(1) in FIG.
  • the resin sealing apparatus A includes a plurality of or a single semiconductor element C mounted on a work W in a semiconductor assembly process, and a substrate terminal and a semiconductor of the work W.
  • This is an apparatus for manufacturing a molded product M in which a product in which the element C is connected by a connecting member C1 such as a wire is cured by being pressure sealed with an uncured resin R around the connecting member C1. Accordingly, the molded product M can protect the semiconductor element C and the connection member C1 of the product from factors such as impact, temperature, and humidity.
  • Examples of the workpiece W include a substrate made of silicon wafer, glass, metal sheet, glass cloth, BT resin, or the like, or a similar one.
  • Examples of the semiconductor element C include chip-shaped electronic components such as semiconductor chips.
  • the connection member C1 include bumps and wires.
  • the uncured resin R a sheet, powder, granule, gel or the like is used.
  • Examples of the material of the uncured resin R include thermosetting resins such as epoxy resins.
  • the molded product M manufactured by the resin sealing device A is generally subjected to a dividing process such as dicing to complete a package such as a semiconductor package as a final product.
  • the resin sealing device A is provided with the first mold 1 having the pressing portion 11 of the workpiece W and the mounting surface W1 of the workpiece W so as to face the cavity 21.
  • the second mold 2, the openable / closable sealed chamber 31 formed between the first mold 1 and the second mold 2, and either the first mold 1 or the second mold 2, or A drive unit 4 for raising and lowering both of them relatively close to each other in the opposing direction of the first mold 1 and the second mold 2 to clamp the mold is provided as a main component. Further, if necessary, the internal pressure of the sealed chamber 31 formed between the first mold 1 and the second mold 2 by relative approaching movement is changed from the atmospheric atmosphere AP to the reduced-pressure atmosphere DP having a predetermined degree of vacuum.
  • the release sheet S is a film made of a heat-resistant material having excellent elasticity such as fluororesin such as Aflex (registered trademark) or ETFE or silicone, and is formed to have a size larger than that of the workpiece W or the cavity 21, The thickness is set to about 20 ⁇ m to 150 ⁇ m. Further, by pressurizing and compressing the uncured resin R in the cavity 21, it is possible to create a mold that does not generate bubbles (voids) inside the resin-sealed molded product M.
  • the resin sealing device A is configured to adjust the pressure in the sealed chamber 31 by exhausting or supplying air to the sealed chamber 31 and the external space O, and the cavity 21.
  • a positioning part 6 for the release sheet S (first release sheet S1) and a pressurizing mechanism 7 for compressing the uncured resin R are provided.
  • the pressure adjusting unit 5, the positioning unit 6, the pressurizing mechanism 7, etc. are electrically communicated with the control unit 8 and are controlled by the control unit 8.
  • the first mold 1 and the second mold 2 are usually arranged so as to face each other in the vertical direction as shown in FIGS. 1 to 9, and the upper first mold 1 and the lower second mold 2 are arranged.
  • Z direction The direction in which the mold 2 approaches or isolates is hereinafter referred to as “Z direction”.
  • XY direction A direction along the workpiece W that intersects the Z direction is hereinafter referred to as an “XY direction”.
  • a disk-shaped silicon wafer is used as the workpiece W.
  • a substrate made of glass, a metal sheet, a glass cloth, a BT resin, or the like or a similar one is held (suspended),
  • the outer shape can be changed to a rectangular shape (a quadrilateral having a right angle including a rectangle and a square).
  • the first mold 1 is formed in a flat plate shape having a thickness that does not deform (bend) with a rigid body such as metal, and on the surface thereof, the non-mounting surface W2 and Z opposite to the mounting surface W1 of the workpiece W are formed. It has the press part 11 which opposes to a direction. The pressing portion 11 of the first mold 1 comes into contact with the non-mounting surface W2 of the work W at a predetermined timing, and the mounting surface W1 of the work W and the semiconductor element C are cavities 21 of the second mold 2 described later.
  • the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the uncured resin R in the cavity 21, and the mold clamping is performed to press the workpiece W and the uncured resin R.
  • the pressing portion 11 of the first mold 1 is opposed to a cavity 21 described later and a first covered portion 11f provided in the Z direction, and an overflow channel 71 of the pressurizing mechanism 7 described later is opposed to the Z direction.
  • a second covered portion 11t provided opposite to a plunger 72 of the pressurizing mechanism 7 to be described later in the Z direction.
  • the second lid portion 11s and the third lid portion 11t are formed in an annular shape or a frame shape on the outside of the first lid portion 11f, respectively.
  • the first covered part 11f, the second covered part 11s, and the third covered part 11t are continuously formed without mutual boundaries.
  • the first mold 1 is an upper mold arranged on the substrate side of the molding.
  • a smooth pressing portion 11 is formed in the central portion or the entire inner surface of the upper mold so as to come into contact with the non-mounting surface W2 of the workpiece W.
  • the pressing portion 11 is used in the pressure reducing process described later in FIG. 3A from the initial state of FIGS. Is kept away from the non-mounting surface W2 of the workpiece W so that they are not in contact with each other.
  • the pressing portion 11 is in contact with the non-mounting surface W2 of the workpiece W.
  • a release sheet S (second release sheet S2) between the pressing portion 11 and the non-mounting surface W2 of the workpiece W.
  • the cavity of the second mold 2 to be described later with the workpiece W and the second release sheet S2 placed on the workpiece W. It is carried toward 21 and set on the uncured resin R in the cavity 21.
  • the workpiece W and the second release sheet S2 are sequentially loaded into the cavity 21 of the second mold 2 and set on the uncured resin R in the cavity 21, respectively. It can be changed.
  • the second molding die 2 is formed as a flat plate having a thickness that does not deform (bend) with a rigid body such as metal, and is opposed to the mounting surface W1 of the workpiece W on which the semiconductor element C is mounted in the Z direction.
  • the surface of 2 has a cavity 21 to which the uncured resin R is supplied.
  • the cavity 21 is formed in a concave shape having a volume that allows at least all of the semiconductor elements C mounted on the mounting surface W1 of the workpiece W to enter and has a depth that allows the mounting to the mounting surface W1 of the workpiece W.
  • At least the second mold 2 is provided with a heater (not shown) for heating the cavity 21 and its periphery. A heater for heating can also be provided in the first mold 1.
  • the second mold 2 is a lower mold disposed on the resin side of the molding.
  • a circular concave cavity 21 into which the uncured resin R, all the semiconductor elements C, and the connection member C1 enter is integrally formed at the central portion of the inner surface of the lower mold.
  • a circular concave portion into which the entire work W is inserted is formed integrally with the cavity 21.
  • the shape of the cavity 21 is changed to a rectangular concave shape corresponding to the outer shape of the workpiece W, or only the cavity 21 is formed without forming the concave portion into which the entire workpiece W enters. It is possible to change what to do.
  • Uncured resin R is supplied into the cavity 21.
  • the structure of the cavity 21 is such that the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the uncured resin R in the cavity 21 so that the uncured resin R overflows from the cavity 21 and will be described later. It is comprised so that it may flow into the overflow channel 71. That is, the uncured resin R in the cavity 21 overflows from the cavity 21 and flows out to the overflow channel 71 by the volume of the mounting surface W1 and the semiconductor element C immersed therein.
  • the supply amount of the thermosetting resin R ⁇ b> 1 to the cavity 21 is set to be larger than the mounting surface W ⁇ b> 1 of the workpiece W and the immersion capacity of the semiconductor element C with respect to the uncured resin R in the cavity 21.
  • the volume of the cavity 21 is set to about 101 to 120% with respect to the volume obtained by subtracting the mounting surface W1 of the workpiece W and the immersion volume of the semiconductor element C. Is preferred. This prevents the occurrence of molding defects due to insufficient supply of the thermosetting resin R1 and the generation of bubbles in the resin-sealed molded product M, and overflow due to excessive supply of the thermosetting resin R1. It is possible to prevent overflow from the road 71 at the same time.
  • a sheet-like thermosetting resin R 1 having an outer shape corresponding to the shape and size of the cavity 21 is supplied into the cavity 21. It is melted with a heater for heating.
  • a powdered or granular thermosetting resin R2 is supplied into the cavity 21 and melted with a heater for heating, or FIG.
  • the fiber-containing resin substrate R3 in which the uncured resin layer R31 is impregnated in the resin-impregnated fiber base R32 is supplied into the cavity 21 as shown in FIG.
  • the powdered or granular thermosetting resin R ⁇ b> 2 easily adjusts the capacity of the uncured resin R more easily than the sheet-like thermosetting resin R ⁇ b> 1 or the fiber-containing resin substrate R ⁇ b> 3.
  • the fiber-containing resin substrate R3 shown in FIG. 7 is a resin-impregnated fiber base made of carbon fiber, glass fiber, quartz glass fiber or the like whose linear expansion coefficient in the XY direction is smaller than 3 ppm, as described in Japanese Patent No. 5934078.
  • a material R32 and an uncured resin layer R31 made of an uncured epoxy resin or the like formed on one surface of the resin-impregnated fiber substrate R32 are provided.
  • the shrinkage stress when the uncured resin layer R31 is cured can be suppressed.
  • the workpiece W (wafer or substrate) warps, the workpiece W (wafer)
  • the separation of the semiconductor element C from the substrate and the substrate and the damage of the workpiece W (wafer or substrate) can be suppressed, and the mounting surface W1 of the workpiece W (wafer or substrate) on which the semiconductor element C is mounted or the semiconductor element C is formed.
  • the mounting surface W1 of the workpiece W (wafer or substrate) can be collectively sealed at the level of the workpiece W (wafer or substrate) and the sealing performance such as heat resistance and moisture resistance is excellent after sealing.
  • the second mold 2 is preferably divided into a central portion 22 constituting the bottom surface portion of the cavity 21 and an outer portion 23 serving as a side surface portion of the cavity 21. It is preferable to form a suction slit 61 between the central portion 22 and the outer portion 23 as the positioning portion 6 of the release sheet S (first release sheet S1).
  • the suction slit 61 communicates with an air suction device 62 such as a vacuum pump so that the release sheet S (first release sheet S1) having excellent stretchability is bent along the shape of the bottom surface and the side surface of the cavity 21. Position and hold so as to deform.
  • the outer portion 23 includes a driven portion 23a that is in contact with the first mold 1 regardless of the presence or absence of the release sheet S (first release sheet S1, second release sheet S2), and the first mold 1 and the driven portion 23a.
  • a stopper 23b that restricts the movement of the follower in the Z direction and an elastic member 23c that constantly biases the driven portion 23a toward the first mold 1 are provided.
  • the driven portion 23a is supported so as to be capable of reciprocating in the Z direction, and the bottom surface of the cavity 21 from the pressing portion 11 of the first mold 1 with the first mold 1 in contact with the stopper 23b via the driven portion 23a.
  • the distance to the part is set to be the same as the thickness of the molded product M including the workpiece W.
  • the second mold 2 is integrally formed without being divided into the central portion 22 and the outer portion 23, and the shape and structure of the outer portion 23 are changed to shapes and structures other than those shown in the drawing. It is also possible to change it.
  • the pressurizing mechanism 7 for the uncured resin R includes an overflow channel 71 that is continuously formed outside the cavity 21, a plunger 72 that is provided so as to protrude toward the overflow channel 71, and an unfilled channel in the overflow channel 71. And a deformable separation portion 73 provided between the cured resin R and the plunger 72.
  • the overflow channel 71 is preferably formed with a plurality of overflow channels 71 around the cavity 21 at predetermined intervals.
  • a plurality of plungers 72 are respectively provided in the plurality of overflow channels 71, and the plurality of overflow channels 71 and the plurality of plungers 72 are preferably arranged symmetrically with respect to the shape of the cavity 21.
  • a plurality of overflow channels 71 are respectively arranged at predetermined intervals in the circumferential direction on the outer periphery of the circular concave cavity 21.
  • a plurality of plungers 72 are arranged at predetermined intervals in the circumferential direction at the top end of the bottom surface of each overflow channel 71 in a radial manner in the XY direction.
  • the first covered portion 11 f facing the cavity 21 in the Z direction corresponds to the same circular portion as the cavity 21, and the second portion facing the overflow channel 71 in the Z direction.
  • the covered portion 11s and the third covered portion 11t facing the plunger 72 in the Z direction correspond to an annular (annular) portion along the outer edge of the circular first covered portion 11f.
  • all of the first lid portion 11f, the second lid portion 11s, and the third lid portion 11t are continuously formed in a smooth shape.
  • the shape of the cavity 21 can be changed to a rectangular concave shape or a polygonal concave shape, or the size of the cavity 21 can be changed to a size other than the illustrated example.
  • a plurality of overflow channels 71 are arranged at predetermined intervals on each side or each corner of the cavity 21. It is possible to change not only the arrangement, number and shape of the plunger 72 but also the arrangement, number and shape of the plunger 72 other than the illustrated example.
  • the plunger 72 is supported so as to reciprocate in the Z direction with respect to the driven portion 23 a of the outer portion 23 and the like in order to vary the volume of the overflow channel 71.
  • the pressure applied to the uncured resin R by the plunger 72 may be set such that the pressure per unit area of pressing back from the plunger 72 is about 200 to 400% with respect to the pressure per unit area of the press at the time of clamping. preferable. Thereby, generation
  • the flow of the uncured resin R pushed back from the overflow channel 71 toward the cavity 21 causes an adverse effect such as deformation of the connecting member C1 such as a wire connecting the substrate terminal of the workpiece W and the semiconductor element C. Prevention can also be achieved. Examples of adverse effects caused by deformation of the connection member C1 include positional displacement of the semiconductor element C with respect to the substrate of the workpiece W, disconnection of the connection member C1, damage to the semiconductor element C, and the like.
  • torque of a servo motor or the like serving as the drive source 72a of the plunger 72 is detected, and when the uncured resin R is pushed back from the overflow channel 71 toward the cavity 21 by the plunger 72.
  • the separation portion 73 is preferably formed integrally with the outer peripheral portion of the release sheet S (first release sheet S1) supplied along the cavity 21.
  • the first release sheet S ⁇ b> 1 is preferably disposed across the cavity 21 and the overflow channel 71, and the part of the first release sheet S ⁇ b> 1 along the overflow channel 71 and the covering portion of the plunger 72 is preferably the separation part 73.
  • the sealed chamber 31 is preferably formed inside the vacuum device 3 including a vacuum chamber and the like, and it is preferable that gas is exhausted (evacuated and evacuated) from the sealed chamber 31 by the operation of the pressure adjusting unit 5 such as a vacuum pump.
  • the sealed chamber 31 is configured to be capable of adjusting the transformation from the atmospheric atmosphere AP to the reduced-pressure atmosphere DP having a predetermined degree of vacuum.
  • the vacuum device 3 is configured to be openable and closable in whole or in part so that the workpiece W, the uncured resin R, the release sheet S, the molded product M, and the like can be taken in and out of the sealed chamber 31.
  • Automation can be achieved by providing a transfer mechanism (not shown) such as a transfer robot across the sealed chamber 31 in the vacuum apparatus 3 and the external space O of the vacuum apparatus 3. More specifically, when the sealed chamber 31 is the atmospheric atmosphere AP, the workpiece W, the uncured resin R, and the release sheet S are carried into the sealed chamber 31 by the transport mechanism. Molding is performed after the sealed chamber 31 is in a reduced pressure atmosphere DP having a predetermined degree of vacuum. After the molding is completed, the molded product M is returned from the sealed chamber 31 to the external space O by returning to the atmospheric atmosphere AP.
  • a transfer mechanism such as a transfer robot across the sealed chamber 31 in the vacuum apparatus 3 and the external space O of the vacuum apparatus 3. More specifically, when the sealed chamber 31 is the atmospheric atmosphere AP, the workpiece W, the uncured resin R, and the release sheet S are carried into the sealed chamber 31 by the transport mechanism. Molding is performed after the sealed chamber 31 is in a reduced pressure atmosphere DP having a predetermined degree of vacuum. After the molding is completed, the molded product
  • the peripheral wall portion 32 constitutes the lower side of the vacuum device 3 on the outer periphery of the first mold 1 constituting the upper side of the vacuum device 3. It is provided so as to be detachable and intimately attached to the outer periphery of the second mold 2.
  • the peripheral wall portion 32 has a seal portion 32a that is in close contact with the outer peripheral portion of the second mold 2 in the Z direction, and a stretchable portion 32b that is elastically deformable in the Z direction.
  • a peripheral wall portion may be provided on the outer periphery of the second mold 2, or the first mold 1 and the second mold 2. A change such as providing a peripheral wall portion separable in the Z direction on the outer periphery is possible.
  • the drive unit 4 for raising and lowering is configured by an actuator or the like that reciprocates either the first mold 1 or the second mold 2 or both the first mold 1 and the second mold 2 in the Z direction.
  • the operation is controlled by the control unit 8 described later.
  • control of the drive unit 4 for raising and lowering by the control unit 8 at the time of carrying in the workpiece W and the uncured resin R shown by the solid line in FIG. 1 and at least carrying out the molded product M shown in FIG. Sometimes, the first mold 1 and the second mold 2 are relatively moved apart in the Z direction.
  • the first molding die 1 and the second molding die 2 move further closer to pressurize the workpiece W and the uncured resin R.
  • either the first molding die 1 or the second molding die 2 is relatively moved away from the other in the Z direction by the elevating drive unit 4 at the time of carry-in or carry-out, or the first Both the mold 1 and the second mold 2 are moved relatively apart from each other in the Z direction.
  • either the first mold 1 or the second mold 2 is moved relatively close to the Z direction toward the other, or both the first mold 1 and the second mold 2 are moved to each other. Move relatively close to the Z direction. In the case of the example shown in FIG.
  • the lifting drive unit 4 only the first mold 1 is linked to the lifting drive unit 4, and the first mold 1 side is second molded. It is moved close to the mold 2 side in the Z direction.
  • the second mold 2 is linked to the drive unit 4 for raising and lowering, and the second mold 2 side is relatively close to the first mold 1 side in the Z direction.
  • the first molding die 1 and the second molding die 2 are respectively linked to the raising / lowering drive unit 4 to move the first molding die 1 side and the second molding die 2 side simultaneously in the Z direction. It is possible to change things.
  • the control unit 8 includes not only the drive unit 4 for raising and lowering but also the pressure adjusting unit 5, the intake device 62 of the positioning unit 6, the drive source 72 a of the plunger 72 of the pressurizing mechanism 7, the workpiece W, the uncured resin R, and the mold release. It is a controller that is electrically connected to the transport mechanism of the sheet S and the like. The controller serving as the controller 8 sequentially controls the operation at a preset timing in accordance with a preset program in its control circuit (not shown).
  • FIG. 1 In the resin sealing method according to the embodiment of the present invention, the work W, the uncured resin R, and the release sheet S are carried into the opened sealed chamber 31, the mounting surface W 1 of the work W, and the semiconductor element C.
  • the main process includes a curing process in which resin sealing is performed and an unloading process in which the sealed chamber 31 is opened and the molded product M is taken out.
  • a depressurizing process for depressurizing the sealed chamber 31 from the atmospheric atmosphere AP to the depressurized atmosphere DP having a predetermined degree of vacuum.
  • the first mold 1 and the second mold 2 are relatively moved apart in the Z direction and directed toward the cavity 21 of the second mold 2 in the atmospheric atmosphere AP.
  • the release sheet S (first release sheet S1) and the uncured resin R are supplied by the transport mechanism. Thereby, the uncured resin R is set at a predetermined position of the cavity 21 via the first release sheet S1.
  • the work W and the release sheet S (second release sheet S21) are supplied by the transport mechanism and set at a predetermined position above the uncured resin R.
  • the decompression step as shown in FIG.
  • either one or both of the first mold 1 and the second mold 2 are moved relatively close to each other in the Z direction by the drive unit 4 for raising and lowering.
  • a sealed chamber 31 is formed between the first mold 1 and the second mold 2.
  • the pressure adjusting unit 5 discharges the gas in the sealed chamber 31 to the external space O (evacuation and evacuation) to reduce the pressure from the atmospheric atmosphere AP.
  • the uncured resin R in the cavity 21 is melted by a heater for heating. After that, as shown in FIG.
  • the plunger 72 projects and moves into the overflow channel 71 toward the third covered portion 11 t of the first mold 1. At this time, the plunger 72 projects and moves toward the overflow channel 71 through the covering portion of the plunger 72 that becomes the separation portion 73 in the release sheet S (first release sheet S1). As a result, the uncured resin R of a volume that protrudes the separating portion 73 into the overflow channel 71 is pushed back to the overflow channel 71 without flowing into the plunger 72, and the uncured resin in the cavity 21. R is pressurized and the uncured resin R is further compressed.
  • the operation of the plunger 72 is controlled in the initial state before the uncured resin R overflows the overflow channel 71 (before the dipping step shown in FIG. 3B). It moves in the opposite direction to the projecting movement direction toward 71 and stands by.
  • the plunger 72 protrudes toward the overflow channel 71 to stand by, and the plunger 72 is reversed by its weight as the uncured resin R overflows into the overflow channel 71. It is also possible to control the operation so as to move the direction.
  • the uncured resin R in the cavity 21 and the overflow channel 71 is cured together by heating with a heater or the passage of time, and the work surface W1 and the semiconductor element C are placed between the two.
  • the gap C2 excluding the connection member C1 is integrally resin-sealed.
  • the pressure adjusting unit 5 supplies air from the external space O to the sealed chamber 31 and returns it to the air atmosphere AP.
  • the plunger 72 moves backward to return to the initial state.
  • the first mold 1 and the second mold 2 are moved apart by the drive unit 4 for raising and lowering, and the non-mounting surface W2 of the workpiece W is peeled from the pressing part 11 of the first mold 1. .
  • the subsequent unloading process as shown in FIG.
  • the resin sealing is completed.
  • the molded product M and the release sheet S are carried out from the sealed chamber 31 to the external space O by the transport mechanism.
  • the molded product M and the release sheet S (first release sheet S1, second release sheet S2) are separated in the sealed chamber 31 or in the external space O.
  • a holding chuck is provided as a pressing portion 11 on the surface of the first mold 1, and a workpiece is placed at a predetermined position on the surface of the first mold 1 by this holding chuck.
  • a non-mounting surface W2 of W is detachably held (suspended).
  • the work W carried in by a transport mechanism such as a transport robot is received by the holding chuck, and the work W is dropped along the surface of the first mold 1. It is suspended impossible. Thereby, the pressing part 11 is made to contact the non-mounting surface W2 of the workpiece
  • An adhesive chuck 12 is preferably used as the holding chuck provided in the pressing portion 11.
  • the workpiece W is directly adhered and held by the adhesive chuck 12 without sandwiching the release sheet S (second release sheet S2) between the pressing portion 11 and the non-mounting surface W2 of the workpiece W.
  • the entire or part of the adhesive chuck 12 is made of, for example, an adhesive material such as fluorine rubber, elastomer, butyl rubber, photosensitive resin, acrylic or silicon, and is opposed to the non-mounting surface W2 of the workpiece W in the Z direction. It has a surface 12a. In the case of the example shown in FIG.
  • a plurality of adhesive surfaces 12 a formed in a sheet shape are respectively distributed and arranged on the pressing portions 11 of the first mold 1.
  • the adhesive surface 12a is protruded from the pressing portion 11 of the first mold 1 toward the sealed chamber 31 described later so as to be elastically deformable.
  • the non-mounting surface W2 of the workpiece W is held (suspended) by the pressing portion 11 of the first mold 1, the mounting surface W1 of the workpiece W and the semiconductor element C in the decompression step (not shown)
  • the gas in the sealed chamber 31 is discharged to the external space O with a predetermined gap (gap) between the release sheet S (first release sheet S1) and the uncured resin R in the cavity 21. (Evacuation, evacuation) becomes possible. Thereby, the surface of the uncured resin R is sufficiently exposed to the vacuum in the sealed chamber 31, and the defoaming of the uncured resin R is promoted. For this reason, in the decompression step shown in FIG.
  • the placement surface W1 of the workpiece W, the semiconductor element C, the release sheet S (second release sheet S2), and the cavity 21 The entire gap C2 excluding the mounting surface W1 of the workpiece W and the connecting member C1 of the semiconductor element C, compared to the inner release sheet S (first release sheet S1) and the one having a narrow gap with the uncured resin R. Therefore, it is possible to stably produce a mold which is excellent in the invasion property of the uncured resin R with respect to the surface and in which bubbles (voids) are not generated.
  • the non-mounting surface W ⁇ b> 2 of the workpiece W is moved toward the pressure-sensitive adhesive surface 12 a of the pressure-sensitive adhesive chuck 12 and forcedly brought into contact with the pressing portion 11 of the first mold 1. It is preferable to provide the abutting part 13 and a peeling part (not shown) for peeling the non-mounting surface W2 of the workpiece W from the adhesive surface 12a of the adhesive chuck 12.
  • the pressing force of the workpiece W by the abutting portion 13 is obtained by crushing the adhesive surface 12a of the adhesive chuck 12 slightly protruding from the pressing portion 11 of the first molding die 1 with the non-mounting surface W2 of the workpiece W, thereby performing the first molding.
  • the suction hole 13 a is opened in the pressing portion 11 of the first mold 1, and the size of the suction hole 13 a is approximately the size of the concave groove portion 11 a.
  • the same setting is used for multiple distributed arrangements.
  • Each suction hole 13a communicates with an actuator (not shown) such as a compressor for vacuum suction or gas injection.
  • the non-mounting surface W2 of the workpiece W is drawn toward the adhesive chuck 12, and the non-mounting surface W2 is pressed against the adhesive surface 12a.
  • a push pin provided so as to be reciprocally movable in the Z direction with respect to the first mold 1 is used, and the tip of the push pin pushes the non-mounting surface W2 of the workpiece W from the adhesive surface 12a. Peeling is preferable.
  • the non-mounting surface W2 of the workpiece W can be pushed off from the adhesive surface 12a by injecting compressed gas from the suction hole 13a.
  • an electrostatic chuck is used in place of the suction hole 13a as the abutting portion 13 of the work W, and the non-mounting surface W2 of the work W is adhered to the adhesive chuck by electromagnetic attraction by the electrostatic chuck.
  • it is possible to make a change such as pulling it toward the surface 12 and pressing it, or pressing and peeling the non-mounting surface W2 of the workpiece W from the adhesive surface 12a with an electric repulsive force.
  • a push pin as the peeling portion and a jet of compressed gas from the suction hole 13a in combination.
  • the sheet-like thermosetting resin R1 as the uncured resin R may be replaced with the powdery or granular thermosetting resin R2 shown in FIG. 6, or the uncured resin layer R31 shown in FIG. Can be changed such as replacing the fiber-containing resin substrate R3 impregnated with the resin-impregnated fiber base R32.
  • the uncured resin R is supplied inside the cavity 21 with the plate-like spacer P interposed therebetween, and is clamped in the same manner as in the first embodiment described above.
  • the configuration for manufacturing the molded product M that is molded is different from the first embodiment and the second embodiment described above, and other configurations are the same as those in the first embodiment and the second embodiment.
  • a plurality of types of spacers P having different thicknesses are prepared, and a spacer P having a thickness suitable for the thickness of the molded product M is used. Therefore, in the third embodiment, in the initial state shown in FIG.
  • the spacer P is set inside the cavity 21, and the release sheet S (first release sheet S ⁇ b> 1) is sandwiched between the uncured resin. R is supplied. Thereafter, the operation of the third embodiment is controlled in the same manner as in FIGS. 3 (a), 3 (b) to 5 (a), (b) of the first embodiment.
  • the pressing portion 11 of the first mold 1 as in the first embodiment shown in FIG. 1 is initially in contact with the non-mounting surface W2 of the workpiece W. In the state, one spacer P is set inside the cavity 21.
  • thermosetting resin R1 as the uncured resin R may be replaced with the powdery or granular thermosetting resin R2 shown in FIG. 6, or the uncured resin layer R31 shown in FIG. Can be changed such as replacing the fiber-containing resin substrate R3 impregnated with the resin-impregnated fiber base R32.
  • the second mold 2 has the molded product M to be resin-sealed.
  • Actuators such as a cavity 21 that has an outer shape and a plunger 72 that pushes back the uncured resin R that has flowed out of the cavity 21 into the overflow channel 71 to the cavity 21 are collectively arranged.
  • the first mold 1 includes a first covered portion 11 f that faces the cavity 21, a second covered portion 11 s that faces the overflow channel 71, and a third covered portion 11 t that faces the plunger 72. It is continuously formed without mutual boundaries.
  • the second type of mold M can be changed when the product type is changed.
  • the first mold 1 can be shared only by exchanging the mold 2. Therefore, it is possible to deal with various types of molded products M by changing the second mold 2 alone. As a result, it is not necessary to replace the first mold 1 when changing the type of the molded product M, compared to the conventional type in which the lower mold is provided with a cavity and the upper mold is provided with a plunger. This is not only easy, but also shortens the downtime and improves the operating rate.
  • the working time can be significantly shortened by replacing only the second mold 2 so that the operating rate can be significantly improved.
  • the structure of the first mold 1 serving as the upper mold can be simplified and the weight can be reduced. Since the drive unit 4 of the mold 1 can also be reduced in size, not only can the entire apparatus be made compact, but it is not necessary to remove the upper mold after removing the lower mold from the apparatus. Cost can be reduced.
  • the plunger 72 is covered with the release sheet S: the first release sheet S1) between the cavity 21 and the uncured resin R and between the uncured resin R and the plunger 72 in the overflow channel 71. It is preferable to provide it. In this case, after the uncured resin R overflows the overflow channel 71 as the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the uncured resin R in the cavity 21, the release sheet S is discharged. In (first release sheet S ⁇ b> 1), the covered portion of the plunger 72 projects and moves into the overflow channel 71 by the operation of the plunger 72.
  • the release sheet S (first release sheet S1)
  • the uncured resin R in the cavity 21 is pressurized by being pushed back to the path 71, and the uncured resin R is compressed. Therefore, the covering member of the plunger 72 can be integrated with the release sheet S (first release sheet S1) that prevents the cavity 21 and the uncured resin R from adhering.
  • the release sheet S (between the uncured resin R in the overflow passage 71 and the plunger 72 is compared with the conventional one in which the uncured resin enters the plunger moving gap by pressurization of the plunger and solidifies. Since a part of the first release sheet S1) is sandwiched, the molded product M can be easily taken out. Thereby, the tact time for peeling the molded product M can be shortened, and the productivity is excellent.
  • a plurality of overflow channels 71 are formed around the cavity 21 at predetermined intervals, and a plurality of plungers 72 are provided in the plurality of overflow channels 71.
  • the plurality of overflow channels 71 and the plurality of plungers 72 are preferably arranged equally, such as symmetrically arranged with respect to the shape of the cavity 21. In this case, as the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the uncured resin R in the cavity 21, the uncured resin R flows evenly into the plurality of overflow channels 71 and overflows. .
  • the uncured resin R is an outer sheet-shaped resin R1 corresponding to the shape and size of the cavity 21, and the second mold 2 has a heater for heating the sheet-shaped resin R1.
  • the sheet-shaped resin R1 approaches the overflow channel 71 with a uniform thickness over the entire surface of the cavity 21. Even if the sheet-like resin R1 is melted by the heater for heating, it hardly flows in the cavity 21. Therefore, a set amount of the uncured resin R can be supplied over the entire surface of the cavity 21 with a simple structure.
  • the melted uncured resin in the cavity compared to the conventional resin in which the resin flows in a wide range toward the entirety of the cavity by melting the powder resin that is concentrated and supplied to a part of the cavity.
  • the flow of R becomes slight, and the resin internal spots (flow spots) due to non-uniform flow friction of the molten uncured resin R can be suppressed.
  • the molten uncured resin R smoothly flows from the cavity 21 to the overflow channel 71 without a time lag with respect to the mounting surface W1 of the workpiece W and the semiconductor element C, and the uncured resin R by the subsequent mold clamping Even when pressure is applied or when the uncured resin R is pushed back into the cavity 21 from the overflow channel 71 by the plunger 72, connection of a wire or the like connecting the substrate terminal of the workpiece W and the semiconductor element C by the flow of the uncured resin R Generation of adverse effects such as deformation of the member C1 can be prevented.
  • connection member C1 Examples of adverse effects caused by deformation of the connection member C1 include positional displacement of the semiconductor element C with respect to the substrate of the workpiece W, disconnection of the connection member C1, damage to the semiconductor element C, and the like. As a result, a high-quality molded product M having a more stable shape and quality can be produced.
  • the overall structure of the device can be simplified and the work piece can be simplified at least as much as the weighing unit is not required. It is also possible to share the loading of W and the supply of the sheet-like resin R1, and the maintenance can be simplified.
  • the first mold 1 is an upper mold disposed on the mold substrate side
  • the second mold 2 is the resin side of the mold.
  • the present invention is not limited to this, and the first mold 1 is a lower mold disposed on the resin side of molding, and the second mold 2 is disposed on the substrate side of molding. It may be an upper mold.
  • a Resin sealing device 1 1st shaping

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Abstract

In order to accommodate various molded article type changes by merely exchanging a second molding die, the present invention is equipped with: a first molding die having a pressing section for a workpiece having a semiconductor element mounted thereon; a second molding die having a cavity to which an uncured resin is supplied and provided so as to face the workpiece mounting surface on which the semiconductor element is mounted; an openable/closable sealing chamber formed between the first molding die and the second molding die; a drive unit for moving the first molding die and/or the second molding die in a manner such that the first and second molding dies become closer relative to one another in the direction in which the dies face one another; a pressurization mechanism having a plunger for applying pressure to the uncured resin inside the cavity in the sealed chamber; and a control unit for controlling the operation of the drive unit and the plunger. Therein, the pressurization mechanism has an uncured resin overflow channel provided in the second molding die inside the sealed chamber so as to be continuous with the cavity, and a plunger provided in the second molding die so as to be capable of moving and projecting toward the overflow channel. The first molding die has a first covering section provided so as to face the cavity, a second covering section provided so as to face the overflow channel, and a third covering section provided so as to face the plunger. The first covering section, the second covering section, and the third covering section are continuously formed with one another. The control unit controls the drive unit so as to immerse the workpiece mounting surface and the semiconductor element in the uncured resin inside the cavity, by moving the first and second molding dies so as to approach one another, and while in a state where the uncured resin inside the cavity has flowed into the overflow channel in response to the immersion, causes the plunger to move and project into the overflow channel toward the third covering section.

Description

樹脂封止装置及び樹脂封止方法Resin sealing device and resin sealing method
 本発明は、半導体パッケージなどのパッケージを作成するため、半導体素子が搭載されるワークを樹脂封止した成形品を製造する際に用いられる樹脂封止装置、及び、パッケージを製造するための樹脂封止方法に関する。 The present invention relates to a resin sealing apparatus used for manufacturing a molded product in which a workpiece on which a semiconductor element is mounted is manufactured in order to create a package such as a semiconductor package, and a resin sealing for manufacturing the package. It relates to the stopping method.
 従来、この種の樹脂封止装置として、下面に基板を保持する保持機構を有する上型と、上型の下方に位置し、キャビティを有する下型とを有し、半導体チップが搭載された基板を上型に保持させ、かつ樹脂がキャビティに供給された後、下型に対する上型の降下で下型と上型をクランプ(型締め)する圧縮成形装置がある(例えば、特許文献1参照)。
 これにより、樹脂を加熱加圧してモールドが行われ、基板の下面側に樹脂からなる封止体を形成している。基板は、搬入搬送部により上型の下面に搬送され、保持機構で基板を真空吸着保持している。樹脂は、エポキシ樹脂のパウダレジンであり、パウダレジン計量ユニット及びパウダレジン供給部でキャビティに供給された後、加熱により樹脂を溶かしている。
 下型には、長方形のキャビティにおいて一対の長辺外側に位置する窪みからなる一対のフローキャビティと、キャビティとフローキャビティを連通する溝からなる複数のフローゲートと、キャビティにおいて一対の短辺側に連なる溝からなるエアーベントと、が設けられている。下型と上型の型締めにより溶けた樹脂が一対のフローキャビティ内に流入し、エアーベントによってキャビティ内に残存するエアーをキャビティ外へ排出している。
 上型には、下型の一対のフローキャビティに対面して2本の(フローキャビティ)プランジャが設けられ、下型と上型の型締め後に、2本のプランジャを一対のフローキャビティ内に突入制御させている。
 これにより、一対のフローキャビティ内の溶けた樹脂は、2本のプランジャの突入によって加圧されるため、型締めによるキャビティ内の樹脂の加圧力と、一対のフローキャビティの樹脂の加圧力とが同じなるように設定されている。この結果、キャビティ内全体の樹脂が適切な圧力下で硬化することから、封止体の内部の気泡(ボイド)の発生を抑止している。
 その後は、下型と上型を離型動作して封止体が取り出される。
Conventionally, as this type of resin sealing device, there is provided an upper mold having a holding mechanism for holding a substrate on the lower surface, and a lower mold having a cavity located below the upper mold, on which a semiconductor chip is mounted. There is a compression molding device that holds the upper mold and clamps the lower mold and the upper mold by lowering the upper mold with respect to the lower mold after the resin is supplied to the cavity (see, for example, Patent Document 1). .
Thus, molding is performed by heating and pressing the resin, and a sealing body made of the resin is formed on the lower surface side of the substrate. The substrate is transported to the lower surface of the upper mold by the carry-in transport unit, and the substrate is vacuum-sucked and held by the holding mechanism. The resin is an epoxy resin powder resin. After being supplied to the cavity by the powder resin metering unit and the powder resin supply unit, the resin is melted by heating.
The lower mold includes a pair of flow cavities formed of depressions positioned on the outside of a pair of long sides in a rectangular cavity, a plurality of flow gates formed of grooves communicating with the cavity and the flow cavities, and a pair of short sides on the cavity. And an air vent composed of a continuous groove. Resin melted by clamping the lower mold and the upper mold flows into the pair of flow cavities, and the air remaining in the cavities is discharged out of the cavities by the air vent.
The upper mold is provided with two (flow cavity) plungers facing the pair of flow cavities of the lower mold. After clamping the lower mold and the upper mold, the two plungers enter the pair of flow cavities. I am in control.
As a result, the melted resin in the pair of flow cavities is pressurized by the intrusion of the two plungers, so that the pressure of the resin in the cavities by mold clamping and the pressure of the resin in the pair of flow cavities are reduced. It is set to be the same. As a result, since the resin in the entire cavity is cured under an appropriate pressure, generation of bubbles (voids) inside the sealing body is suppressed.
After that, the sealing body is taken out by releasing the lower mold and the upper mold.
国際公開第2006/100765号International Publication No. 2006/100765
 ところで、半導体パッケージなどの作成に用いられる半導体素子が搭載されたワークを樹脂封止した成形品は、半導体素子やワークの種類が多種類あるだけでなく、外形状やサイズの異なる多様な品種がある。樹脂封止装置において、外形状やサイズの異なる成形品に品種変更が生じた場合には、キャビティの形状やサイズとプランジャの配置や数を変更する必要がある。
 しかし乍ら、特許文献1に記載された圧縮成形装置では、下型にキャビティが設けられ、上型にプランジャが設けられるため、成形品の品種変更時には下型と上型を共に交換しなければ、成形品の品種変更に応じてキャビティの形状やサイズとプランジャの配置や数を変更できない。
 これにより、成形品の品種変更時には下型及び上型の交換作業に手間と時間を要し、面倒であるだけでなく運転停止時間が長くなって稼働率が低下するという問題があった。成形品の品種変更を頻繁に行う必要がある場合には、下型及び上型の交換作業に伴う運転停止が頻繁に生じて稼働率が著しく低下するという問題があった。
 さらに、上型にはプランジャだけでなくプランジャの駆動源を設ける必要があるため、上型が重くなってしまう。これにより、下型に対して上型を降下させる駆動部も大きくなるから、装置全体が大型化してコスト高になるという問題があった。プランジャのメンテナンスは、装置から下型を取り外した後に上型を取り外さないと作業できす、プランジャのメンテナンス作業に手間と時間を要して面倒であるという問題もあった。
 また、このような従来の樹脂封止装置では、フローキャビティ内の溶けた樹脂中にフローキャビティプランジャを突入させて樹脂が加圧される構造であるため、加圧した樹脂がプランジャの移動用隙間に流入してしまう。
 特に、上型の下面に保持機構で基板を真空吸着保持する場合には、上型の下面と基板との間に樹脂シートなどを挿入できないため、上型に開設されるプランジャ移動用の孔とプランジャとの隙間から加圧状態の樹脂が侵入してしまう。
 一般的に封止体を形成するモールド成形には、加熱により熱分解して溶融し、溶融状態から時間経過に伴って粘度が高まり、比較的に短時間で熱硬化して固化するエポキシ樹脂が用いられる。
 このため、孔とプランジャとの隙間に侵入した樹脂がエポキシ樹脂であると、短時間で熱硬化して固化するため、プランジャのスムーズな移動が妨げられ作動不良を起して故障の原因となるだけでなく、安定したモールド成形が作製できず、歩留まりが低下するという問題があった。
 孔とプランジャとの隙間に侵入して固化した樹脂が隙間に付着するため、下型と上型を離型動作させても、モールド成形した封止体がスムーズに取り出せず、タクトタイムが長く必要になって生産性に劣るという問題があった。
 そこで、このような問題点を解決するために上型及びプランジャの分解洗浄で隙間に侵入し固化した樹脂を取り除くことが考えられる。しかし、隙間に侵入固化した樹脂による悪影響を防ぐには上型及びプランジャの分解洗浄を頻繁に行う必要がある。このため、分解洗浄の度に装置全体を運転停止させなければならず、稼働率が低下するという問題もあった。
 また、長方形のキャビティにおいて一対の長辺側のみに一対のフローキャビティが設けられ、2本のプランジャを一対のフローキャビティ内に突入させることで、キャビティ内において一対の長辺側の樹脂から加圧している。このため、キャビティ内の樹脂の圧力分布に偏りが発生し易く、製作したパッケージの形状や品質が不安定になり易いという問題があった。
 さらに、樹脂としてパウダレジンをキャビティに供給してから溶融するが、キャビティの全面に亘ってパウダレジンを均一な厚みで供給することは非常に困難であり、キャビティの一部にパウダレジンが偏って集中的に供給されることもあった。この場合には、溶融した樹脂がキャビティ内の全体に向けて広範囲に流動するため、流動摩擦の不均一による樹脂内斑(流動斑)が生じたり、型締めに伴うキャビティから二つのフローキャビティへの樹脂の流入量に差が生じたり、品質低下の原因となるという問題があった。
 これに加え、基板の搬入搬送とは別個に、樹脂としてパウダレジンを計量してからキャビティに供給するため、基板の搬入搬送部やパウダレジン計量ユニット及びパウダレジン供給部が必要なる分だけ装置全体の構造が複雑化して、メンテナンスも面倒になるという問題もあった。
By the way, there are not only many types of semiconductor elements and workpieces, but also various types of products with different external shapes and sizes. is there. In a resin sealing device, when a product type change occurs in molded products having different outer shapes and sizes, it is necessary to change the shape and size of the cavity and the arrangement and number of plungers.
However, in the compression molding apparatus described in Patent Document 1, since the cavity is provided in the lower mold and the plunger is provided in the upper mold, the lower mold and the upper mold must be exchanged when changing the type of the molded product. The shape and size of the cavity and the arrangement and number of plungers cannot be changed in accordance with the change in the type of the molded product.
As a result, when changing the type of the molded product, it takes time and labor to replace the lower mold and the upper mold, which is not only cumbersome, but also has a problem that the operation stoppage becomes longer due to longer operation stop time. When it is necessary to frequently change the type of the molded product, there has been a problem that the operation rate is remarkably lowered due to frequent operation stoppage accompanying the replacement work of the lower mold and the upper mold.
Furthermore, since it is necessary to provide not only the plunger but also a driving source for the plunger, the upper die becomes heavy. As a result, the drive unit for lowering the upper mold relative to the lower mold also becomes larger, so that there is a problem that the entire apparatus is increased in size and cost. There is also a problem that the maintenance of the plunger can be performed without removing the upper mold after removing the lower mold from the apparatus.
Also, in such a conventional resin sealing device, the resin is pressurized by inserting the flow cavity plunger into the melted resin in the flow cavity. Will flow into.
In particular, when holding the substrate by vacuum holding with the holding mechanism on the lower surface of the upper mold, a resin sheet or the like cannot be inserted between the lower surface of the upper mold and the substrate. Pressurized resin enters from the gap with the plunger.
In general, mold molding that forms a sealed body includes an epoxy resin that is thermally decomposed and melted by heating, increases in viscosity with time from the melted state, and is thermoset and solidified in a relatively short time. Used.
For this reason, if the resin that has entered the gap between the hole and the plunger is an epoxy resin, the resin hardens and solidifies in a short time, so that the smooth movement of the plunger is hindered, causing malfunction and causing failure. In addition, there is a problem that stable molding cannot be produced, and the yield decreases.
Since the resin that has entered the gap between the hole and the plunger and solidified adheres to the gap, even if the lower mold and upper mold are released, the molded molded body cannot be taken out smoothly, requiring a long tact time As a result, the productivity was inferior.
Therefore, in order to solve such problems, it is conceivable to remove the solidified resin that has entered the gap by disassembly and cleaning of the upper mold and the plunger. However, it is necessary to frequently disassemble and clean the upper mold and the plunger in order to prevent the adverse effects of the resin that has entered and solidified into the gap. For this reason, the entire apparatus has to be stopped for every disassembly and cleaning, resulting in a problem that the operation rate is lowered.
In addition, a pair of flow cavities are provided only on the pair of long sides in a rectangular cavity, and two plungers are inserted into the pair of flow cavities to pressurize from the pair of long side resins in the cavity. ing. For this reason, there is a problem that the pressure distribution of the resin in the cavity is easily biased, and the shape and quality of the manufactured package are likely to be unstable.
Furthermore, although the powder resin is melted after being supplied to the cavity as a resin, it is very difficult to supply the powder resin with a uniform thickness over the entire surface of the cavity, and the powder resin is concentrated and concentrated in a part of the cavity. Sometimes it was supplied. In this case, since the molten resin flows over a wide area toward the entire cavity, unevenness in the resin due to non-uniform flow friction (flow spots) occurs, or from the cavity due to mold clamping to the two flow cavities. There is a problem that a difference occurs in the amount of inflow of the resin or a cause of quality deterioration.
In addition to this, since the powder resin is weighed as a resin and supplied to the cavity separately from the carry-in and transfer of the substrate, the structure of the entire apparatus is as much as the substrate carry-in transfer unit, the powder resin weighing unit and the powder resin supply unit are necessary. There was also a problem that it was complicated and maintenance was troublesome.
 このような課題を達成するために本発明に係る樹脂封止装置は、半導体素子を搭載したワークが樹脂封止される成形品を製造する樹脂封止装置であって、前記半導体素子が搭載された前記ワークの押圧部を有する第一成形型と、前記ワークの前記半導体素子が搭載される載置面と対向状に設けられて未硬化樹脂が供給されるキャビティを有する第二成形型と、前記第一成形型及び前記第二成形型の間に形成される開閉自在な密閉室と、前記第一成形型又は前記第二成形型のいずれか一方か若しくは両方を前記第一成形型及び前記第二成形型の対向方向へ相対的に接近移動させる駆動部と、前記密閉室において前記キャビティ内の前記未硬化樹脂を加圧するプランジャを有する加圧機構と、前記駆動部及び前記プランジャを作動制御する制御部と、を備え、前記加圧機構は、前記密閉室内で前記第二成形型に前記キャビティと連続して設けられる前記未硬化樹脂の越流路と、前記第二成形型に前記越流路へ向けて突出移動自在に設けられる前記プランジャと、を有し、前記第一成形型は、前記キャビティと対向して設けられる第一被蓋部位と、前記越流路と対向して設けられる第二被蓋部位と、前記プランジャと対向して設けられる第三被蓋部位と、を有し、前記第一被蓋部位,前記第二被蓋部位及び前記第三被蓋部位が連続形成され、前記制御部は、前記駆動部による前記第一成形型及び前記第二成形型の相対的な接近移動で、前記ワークの前記載置面及び前記半導体素子が前記キャビティ内の前記未硬化樹脂に浸漬され、この浸漬に伴い前記キャビティ内の前記未硬化樹脂が前記越流路に流出した状態で、前記プランジャが前記第三被蓋部位へ向けて前記越流路内に突出移動するように制御することを特徴とする。
 また本発明に係る樹脂封止装方法は、半導体素子を搭載したワークが樹脂封止される成形品を製造する樹脂封止方法であって、第一成形型及び第二成形型の対向方向へ相対的に離隔移動した前記第二成形型のキャビティ内に未硬化樹脂を供給し、前記未硬化樹脂と対向して前記半導体素子が搭載された前記ワークを搬入する搬入工程と、前記第一成形型又は前記第二成形型のいずれか一方か若しくは両方を駆動部により前記第一成形型及び前記第二成形型の対向方向へ相対的に接近移動して、前記第一成形型と前記第二成形型の間に密閉室を形成するとともに、前記ワークの前記半導体素子が搭載される載置面及び前記半導体素子を前記キャビティ内の前記未硬化樹脂に浸漬させる浸漬工程と、前記密閉室において前記キャビティと連続して前記第二成形型に設けられる越流路に流出した前記未硬化樹脂を、前記第二成形型に設けられたプランジャの突出移動により加圧する前記未硬化樹脂の圧縮工程と、前記未硬化樹脂が硬化して前記ワークの前記載置面及び前記半導体素子を樹脂封止する硬化工程と、前記第一成形型と前記第二成形型を前記駆動部により離隔移動させる搬出工程と、を含み、前記浸漬工程では、前記キャビティと対向する第一被蓋部位,前記越流路と対向する第二被蓋部位及び前記プランジャと対向する第三被蓋部位が連続形成される前記第一成形型と、前記第二成形型と、の相対的な接近移動により、前記キャビティ内の前記未硬化樹脂に対して前記ワークの前記載置面及び前記半導体素子が浸漬されるとともに、前記ワーク及び前記未硬化樹脂をプレスする型締めが行われ、前記圧縮工程では、前記プランジャが前記第三被蓋部位へ向けて前記越流路内に突出移動することを特徴とする。
In order to achieve such a problem, a resin sealing device according to the present invention is a resin sealing device that manufactures a molded product in which a workpiece on which a semiconductor element is mounted is resin-sealed. A first mold having a pressing portion of the workpiece, and a second mold having a cavity that is provided opposite to a mounting surface on which the semiconductor element of the workpiece is mounted and is supplied with uncured resin, An openable / closable sealed chamber formed between the first mold and the second mold, and either one or both of the first mold and the second mold are the first mold and the second mold. A drive unit that moves relatively close to the opposing direction of the second mold, a pressurizing mechanism that includes a plunger that pressurizes the uncured resin in the cavity in the sealed chamber, and controls the operation of the drive unit and the plunger. Control unit The pressurizing mechanism is provided with the uncured resin overflow channel provided continuously to the cavity in the second mold in the sealed chamber, and the second mold toward the overflow channel. The first mold is provided to face the cavity, and the second mold is provided to face the overflow channel. A lid part and a third covered part provided opposite to the plunger, wherein the first covered part, the second covered part and the third covered part are continuously formed, and the control The part is a relative approaching movement of the first mold and the second mold by the drive unit, and the placement surface of the workpiece and the semiconductor element are immersed in the uncured resin in the cavity, With this immersion, the uncured resin in the cavity is While flowing out the flow path, characterized in that the plunger is controlled to protrude to move to the overflow path towards the third tegmentum site.
The resin sealing method according to the present invention is a resin sealing method for manufacturing a molded product in which a workpiece on which a semiconductor element is mounted is resin-sealed, in the direction opposite to the first molding die and the second molding die. A loading step of supplying uncured resin into the cavity of the second mold that has moved relatively apart, and loading the workpiece on which the semiconductor element is mounted facing the uncured resin; and the first molding Either or both of the mold and the second mold are moved relatively close to each other in the opposing direction of the first mold and the second mold by the drive unit, and the first mold and the second mold A sealing chamber is formed between the molding dies, a mounting surface on which the semiconductor element of the workpiece is mounted, and an immersion step of immersing the semiconductor element in the uncured resin in the cavity; Continuously with the cavity The compression process of the uncured resin that pressurizes the uncured resin that has flowed into the overflow channel provided in the second mold by the protruding movement of the plunger provided in the second mold, and the uncured resin A curing step of resin-sealing the placement surface of the workpiece and the semiconductor element, and a unloading step of moving the first molding die and the second molding die apart by the drive unit, In the dipping step, the first mold part in which a first cover part facing the cavity, a second cover part facing the overflow channel, and a third cover part facing the plunger are continuously formed, The placement surface of the workpiece and the semiconductor element are immersed in the uncured resin in the cavity by relative movement with the second mold, and the workpiece and the uncured resin Press Clamping is performed, the the compression step, characterized in that the plunger protrudes moves to the third the overflow path towards tegmentum site.
本発明の実施形態(第一実施形態)に係る樹脂封止装置の全体構成を示す説明図で、初期状態(搬入工程)の縦断正面図である。It is explanatory drawing which shows the whole structure of the resin sealing apparatus which concerns on embodiment (1st embodiment) of this invention, and is a vertical front view of an initial state (carrying-in process). 同平面図及び断面図で、(a)がワークや未硬化樹脂や離型シートを省略した縮小横断平面図、(b)が図2(a)の(2B)-(2B)線に沿える縦断側面図である。なお、図1は、図2(a)の(1)-(1)線に沿える縦断面図である。In the same plan view and cross-sectional view, (a) is a reduced cross-sectional plan view in which a workpiece, uncured resin, and a release sheet are omitted, and (b) is along line (2B)-(2B) in FIG. 2 (a). It is a vertical side view. FIG. 1 is a longitudinal sectional view taken along line (1)-(1) in FIG. 本発明の実施形態に係る樹脂封止方法の作動過程を示す説明図で、(a)が減圧開始時の縦断正面図、(b)が型接近移動中の縦断正面図である。It is explanatory drawing which shows the operation | movement process of the resin sealing method which concerns on embodiment of this invention, (a) is a longitudinal front view at the time of a pressure reduction start, (b) is a longitudinal front view during mold | die approaching movement. その後の作動過程を示し、(a)が浸漬工程の縦断正面図、(b)が圧縮工程及び硬化工程の縦断正面図である。The subsequent operation | movement process is shown, (a) is a vertical front view of an immersion process, (b) is a vertical front view of a compression process and a hardening process. その後の作動過程を示し、(a)が大気開放工程の縦断正面図、(b)が搬出工程の縦断正面図である。A subsequent operation process is shown, (a) is a longitudinal front view of the air release process, and (b) is a longitudinal front view of the unloading process. 本発明の実施形態に係る樹脂封止装置の変形例を示す説明図で、初期状態(搬入工程)の縦断正面図である。It is explanatory drawing which shows the modification of the resin sealing apparatus which concerns on embodiment of this invention, and is a vertical front view of an initial state (carrying-in process). 本発明の実施形態に係る樹脂封止装置の変形例を示す説明図で、初期状態(搬入工程)の縦断正面図である。It is explanatory drawing which shows the modification of the resin sealing apparatus which concerns on embodiment of this invention, and is a vertical front view of an initial state (carrying-in process). 本発明の第二実施形態に係る樹脂封止装置を示す説明図で、初期状態搬入工程)の縦断正面図である。It is explanatory drawing which shows the resin sealing apparatus which concerns on 2nd embodiment of this invention, and is a vertical front view of an initial state carrying-in process). 本発明の第三実施形態に係る樹脂封止装置を示す説明図で、初期状態(搬入工程)の縦断正面図である。It is explanatory drawing which shows the resin sealing apparatus which concerns on 3rd embodiment of this invention, and is a vertical front view of an initial state (carrying-in process).
 以下、本発明の実施形態を図面に基づいて詳細に説明する。
 本発明の実施形態に係る樹脂封止装置Aは、図1~図9に示すように、半導体組立プロセスでワークWに複数又は単数の半導体素子Cが搭載され、且つワークWの基板端子と半導体素子Cがワイヤーなどの接続部材C1で接続した製品を、接続部材C1の周囲が未硬化樹脂Rで加圧封止されて硬化させる成形品Mの製造装置である。これにより、成形品Mは、製品の半導体素子C及び接続部材C1を衝撃、温度、湿度などの要因から守ることが可能になる。このような樹脂による成形を半導体業界では、「モールド成形(樹脂封止、樹脂成形)」などと呼んでいる。
 ワークWとしては、シリコンウエハ、ガラス、金属シート、ガラスクロス、BTレジンなどからなる基板やそれに類似するものが挙げられる。
 半導体素子Cとしては、半導体チップなどのチップ状の電子部品が挙げられ、ワークWとしてシリコンウエハの載置面W1に搭載される場合には、複数の半導体素子Cが列状又は格子状に搭載される。接続部材C1としては、バンプやワイヤなどが挙げられる。
 未硬化樹脂Rとしては、シート状、粉末状、顆粒状、ゲル状などのものが用いられる。未硬化樹脂Rの材料としては、エポキシ系樹脂などの熱硬化性樹脂などが挙げられる。エポキシ系樹脂の場合は、加熱を開始して所定時間で熱分解し、溶融状態から時間経過に伴って粘度が高まり、比較的に短時間で熱硬化して固化するため、モールド成形に適している。
 このように樹脂封止装置Aで製造された成形品Mは、一般的にダイシングなどの分割工程を経て、最終製品である半導体パッケージなどのパッケージを完成させる。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
As shown in FIGS. 1 to 9, the resin sealing apparatus A according to the embodiment of the present invention includes a plurality of or a single semiconductor element C mounted on a work W in a semiconductor assembly process, and a substrate terminal and a semiconductor of the work W. This is an apparatus for manufacturing a molded product M in which a product in which the element C is connected by a connecting member C1 such as a wire is cured by being pressure sealed with an uncured resin R around the connecting member C1. Accordingly, the molded product M can protect the semiconductor element C and the connection member C1 of the product from factors such as impact, temperature, and humidity. In the semiconductor industry, such resin molding is called “mold molding (resin sealing, resin molding)”.
Examples of the workpiece W include a substrate made of silicon wafer, glass, metal sheet, glass cloth, BT resin, or the like, or a similar one.
Examples of the semiconductor element C include chip-shaped electronic components such as semiconductor chips. When the work W is mounted on the mounting surface W1 of the silicon wafer, a plurality of semiconductor elements C are mounted in rows or grids. Is done. Examples of the connection member C1 include bumps and wires.
As the uncured resin R, a sheet, powder, granule, gel or the like is used. Examples of the material of the uncured resin R include thermosetting resins such as epoxy resins. In the case of an epoxy resin, heating is started and pyrolyzed in a predetermined time, and the viscosity increases with the passage of time from the melted state, and is cured and solidified in a relatively short time. Yes.
As described above, the molded product M manufactured by the resin sealing device A is generally subjected to a dividing process such as dicing to complete a package such as a semiconductor package as a final product.
 詳しく説明すると、本発明の実施形態に係る樹脂封止装置Aは、ワークWの押圧部11を有する第一成形型1と、ワークWの載置面W1と対向状に設けられてキャビティ21を有する第二成形型2と、第一成形型1及び第二成形型2の間に形成される開閉自在な密閉室31と、第一成形型1又は第二成形型2のいずれか一方か若しくは両方を第一成形型1及び第二成形型2の対向方向へ相対的に接近移動して型締めする昇降用の駆動部4と、を主要な構成要素として備えている。
 さらに必要に応じて、第一成形型1及び第二成形型2の相対的な接近移動により両者間に形成される密閉室31の内部圧力を、大気雰囲気APから所定真空度の減圧雰囲気DPまで内圧調整することが好ましい。
 少なくともキャビティ21と未硬化樹脂Rの間には、これら両者間に挟み込まれるように変形可能な離型シートS(第一離型シートS1)を設けることが好ましい。離型シートSは、例えばアフレックス(登録商標)やETFEなどのフッ素樹脂又はシリコーンなどの伸縮性に優れた耐熱材料からなるフィルムであり、そのサイズをワークWやキャビティ21よりも大きく形成し、厚みを約20um~150umに設定している。
 また、キャビティ21内の未硬化樹脂Rを加圧して圧縮変形させることにより、樹脂封止された成形品Mの内部に気泡(ボイド)が発生しないモールド成形を作成可能にしている。
More specifically, the resin sealing device A according to the embodiment of the present invention is provided with the first mold 1 having the pressing portion 11 of the workpiece W and the mounting surface W1 of the workpiece W so as to face the cavity 21. The second mold 2, the openable / closable sealed chamber 31 formed between the first mold 1 and the second mold 2, and either the first mold 1 or the second mold 2, or A drive unit 4 for raising and lowering both of them relatively close to each other in the opposing direction of the first mold 1 and the second mold 2 to clamp the mold is provided as a main component.
Further, if necessary, the internal pressure of the sealed chamber 31 formed between the first mold 1 and the second mold 2 by relative approaching movement is changed from the atmospheric atmosphere AP to the reduced-pressure atmosphere DP having a predetermined degree of vacuum. It is preferable to adjust the internal pressure.
At least between the cavity 21 and the uncured resin R, it is preferable to provide a release sheet S (first release sheet S1) that can be deformed so as to be sandwiched therebetween. The release sheet S is a film made of a heat-resistant material having excellent elasticity such as fluororesin such as Aflex (registered trademark) or ETFE or silicone, and is formed to have a size larger than that of the workpiece W or the cavity 21, The thickness is set to about 20 μm to 150 μm.
Further, by pressurizing and compressing the uncured resin R in the cavity 21, it is possible to create a mold that does not generate bubbles (voids) inside the resin-sealed molded product M.
 このため、本発明の実施形態に係る樹脂封止装置Aは、密閉室31及び外部空間Oに亘り排気又は給気して密閉室31内の圧力を調整する調圧部5と、キャビティ21に対する離型シートS(第一離型シートS1)の位置決め部6と、未硬化樹脂Rを圧縮する加圧機構7と、を備えている。
 昇降用の駆動部4に加えて、調圧部5や位置決め部6や加圧機構7などは、制御部8と電気的に連通し、制御部8でそれぞれ作動制御される。
 なお、第一成形型1及び第二成形型2は、図1~図9に示されるように通常、上下方向へ対向するように配置され、上側の第一成形型1と下側の第二成形型2が接近又は隔離する方向を以下「Z方向」という。Z方向と交差するワークWに沿った方向を以下「XY方向」という。
 図1~図9に示される例では、ワークWとして円板状のシリコンウエハが用いられている。
 また、その他の例として図示しないが、ワークWとしてシリコンウエハに代え、ガラス、金属シート、ガラスクロス、BTレジンなどからなる基板やそれに類似するものを保持(吊持)することや、ワークWの外形状を矩形(長方形及び正方形を含む角が直角の四辺形)状などに変更することが可能である。
For this reason, the resin sealing device A according to the embodiment of the present invention is configured to adjust the pressure in the sealed chamber 31 by exhausting or supplying air to the sealed chamber 31 and the external space O, and the cavity 21. A positioning part 6 for the release sheet S (first release sheet S1) and a pressurizing mechanism 7 for compressing the uncured resin R are provided.
In addition to the drive unit 4 for raising and lowering, the pressure adjusting unit 5, the positioning unit 6, the pressurizing mechanism 7, etc. are electrically communicated with the control unit 8 and are controlled by the control unit 8.
The first mold 1 and the second mold 2 are usually arranged so as to face each other in the vertical direction as shown in FIGS. 1 to 9, and the upper first mold 1 and the lower second mold 2 are arranged. The direction in which the mold 2 approaches or isolates is hereinafter referred to as “Z direction”. A direction along the workpiece W that intersects the Z direction is hereinafter referred to as an “XY direction”.
In the example shown in FIGS. 1 to 9, a disk-shaped silicon wafer is used as the workpiece W.
In addition, although not shown as another example, instead of a silicon wafer as the workpiece W, a substrate made of glass, a metal sheet, a glass cloth, a BT resin, or the like or a similar one is held (suspended), The outer shape can be changed to a rectangular shape (a quadrilateral having a right angle including a rectangle and a square).
 第一成形型1は、金属などの剛体で歪み(撓み)変形しない厚さの平板状に形成され、その表面には、ワークWの載置面W1と逆側の非載置面W2とZ方向へ対向する押圧部11を有している。
 第一成形型1の押圧部11は、所定のタイミングでワークWの非載置面W2と接触して、ワークWの載置面W1及び半導体素子Cを後述する第二成形型2のキャビティ21に向け押し付けるものである。これにより、キャビティ21内の未硬化樹脂Rに対してワークWの載置面W1及び半導体素子Cが浸漬されるとともに、ワークW及び未硬化樹脂Rをプレスする型締めが行われる。
 また、第一成形型1の押圧部11は、後述するキャビティ21とZ方向へ対向して設けられる第一被蓋部位11fと、後述する加圧機構7の越流路71とZ方向へ対向して設けられる第二被蓋部位11sと、後述する加圧機構7のプランジャ72とZ方向へ対向して設けられる第三被蓋部位11tと、を有している。第二被蓋部位11sと第三被蓋部位11tは、第一被蓋部位11fの外側にそれぞれ環状又は枠状に形成される。
 第一被蓋部位11f,第二被蓋部位11s及び第三被蓋部位11tは、それぞれ相互の境目がなく連続して形成される。
The first mold 1 is formed in a flat plate shape having a thickness that does not deform (bend) with a rigid body such as metal, and on the surface thereof, the non-mounting surface W2 and Z opposite to the mounting surface W1 of the workpiece W are formed. It has the press part 11 which opposes to a direction.
The pressing portion 11 of the first mold 1 comes into contact with the non-mounting surface W2 of the work W at a predetermined timing, and the mounting surface W1 of the work W and the semiconductor element C are cavities 21 of the second mold 2 described later. It pushes it toward Thereby, the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the uncured resin R in the cavity 21, and the mold clamping is performed to press the workpiece W and the uncured resin R.
Further, the pressing portion 11 of the first mold 1 is opposed to a cavity 21 described later and a first covered portion 11f provided in the Z direction, and an overflow channel 71 of the pressurizing mechanism 7 described later is opposed to the Z direction. And a second covered portion 11t provided opposite to a plunger 72 of the pressurizing mechanism 7 to be described later in the Z direction. The second lid portion 11s and the third lid portion 11t are formed in an annular shape or a frame shape on the outside of the first lid portion 11f, respectively.
The first covered part 11f, the second covered part 11s, and the third covered part 11t are continuously formed without mutual boundaries.
 第一成形型1の具体例として図1~図9に示される例の場合には、第一成形型1がモールド成形の基板側に配置される上型である。この上型の内側面の中央部又は全体には、平滑な押圧部11が、ワークWの非載置面W2と接触するように形成される。
 さらに、図1~図7に示される本発明の第一実施形態に係る樹脂封止装置Aでは、図1及び図2の初期状態から図3(a)の後述する減圧工程において、押圧部11をワークWの非載置面W2と離隔させて両者が不接触な状態に維持される。しかし、少なくとも図3(b)の後述する浸漬工程から図4(b)の後述する硬化工程までは、押圧部11をワークWの非載置面W2に接触させている。
 押圧部11とワークWの非載置面W2との間には、図1~図9に示されるように、離型シートS(第二離型シートS2)を挟み込むことが好ましい。
 図1及び図2に示される初期状態では、ワークWと第二離型シートS2をワークWの上に第二離型シートS2が載置された状態で、後述する第二成形型2のキャビティ21に向け搬入し、キャビティ21内の未硬化樹脂Rの上にセットしている。また、その他の搬入方法としては、ワークWと第二離型シートS2を第二成形型2のキャビティ21に向け順次搬入して、キャビティ21内の未硬化樹脂Rの上にそれぞれセットするように変更可能である。
In the case of the example shown in FIGS. 1 to 9 as a specific example of the first mold 1, the first mold 1 is an upper mold arranged on the substrate side of the molding. A smooth pressing portion 11 is formed in the central portion or the entire inner surface of the upper mold so as to come into contact with the non-mounting surface W2 of the workpiece W.
Further, in the resin sealing device A according to the first embodiment of the present invention shown in FIGS. 1 to 7, the pressing portion 11 is used in the pressure reducing process described later in FIG. 3A from the initial state of FIGS. Is kept away from the non-mounting surface W2 of the workpiece W so that they are not in contact with each other. However, at least from the dipping process described later in FIG. 3B to the curing process described later in FIG. 4B, the pressing portion 11 is in contact with the non-mounting surface W2 of the workpiece W.
As shown in FIGS. 1 to 9, it is preferable to sandwich a release sheet S (second release sheet S2) between the pressing portion 11 and the non-mounting surface W2 of the workpiece W.
In the initial state shown in FIG. 1 and FIG. 2, the cavity of the second mold 2 to be described later with the workpiece W and the second release sheet S2 placed on the workpiece W. It is carried toward 21 and set on the uncured resin R in the cavity 21. As another loading method, the workpiece W and the second release sheet S2 are sequentially loaded into the cavity 21 of the second mold 2 and set on the uncured resin R in the cavity 21, respectively. It can be changed.
 第二成形型2は、金属などの剛体で歪み(撓み)変形しない厚さの平板状に形成され、半導体素子Cを搭載したワークWの載置面W1とZ方向へ対向する第二成形型2の表面は、未硬化樹脂Rが供給されるキャビティ21を有する。
 キャビティ21は、少なくともワークWの載置面W1に搭載されたすべての半導体素子Cが入る大きさで且つワークWの載置面W1まで入る深さを有する容積の凹状に形成される。
 少なくとも第二成形型2には、キャビティ21及びその周囲を加熱するためのヒータ(図示しない)が設けられる。加熱用のヒータは第一成形型1に設けることも可能である。
 第二成形型2の具体例として図1~図9に示される例の場合には、第二成形型2がモールド成形の樹脂側に配置される下型である。この下型の内側面の中央部には、未硬化樹脂Rとすべての半導体素子C及び接続部材C1が入る円形凹状のキャビティ21を一体的に形成している。さらに、キャビティ21と連続して、ワークWの全体が入る円形状の凹部を一体的に形成している。
 また、その他の例として図示しないが、キャビティ21の形状は、ワークWの外形状に対応して矩形凹状などに変更することや、ワークWの全体が入る凹部を形成せずキャビティ21のみを形成することなどの変更が可能である。
The second molding die 2 is formed as a flat plate having a thickness that does not deform (bend) with a rigid body such as metal, and is opposed to the mounting surface W1 of the workpiece W on which the semiconductor element C is mounted in the Z direction. The surface of 2 has a cavity 21 to which the uncured resin R is supplied.
The cavity 21 is formed in a concave shape having a volume that allows at least all of the semiconductor elements C mounted on the mounting surface W1 of the workpiece W to enter and has a depth that allows the mounting to the mounting surface W1 of the workpiece W.
At least the second mold 2 is provided with a heater (not shown) for heating the cavity 21 and its periphery. A heater for heating can also be provided in the first mold 1.
In the case of the example shown in FIGS. 1 to 9 as a specific example of the second mold 2, the second mold 2 is a lower mold disposed on the resin side of the molding. A circular concave cavity 21 into which the uncured resin R, all the semiconductor elements C, and the connection member C1 enter is integrally formed at the central portion of the inner surface of the lower mold. Further, a circular concave portion into which the entire work W is inserted is formed integrally with the cavity 21.
Further, although not shown as another example, the shape of the cavity 21 is changed to a rectangular concave shape corresponding to the outer shape of the workpiece W, or only the cavity 21 is formed without forming the concave portion into which the entire workpiece W enters. It is possible to change what to do.
 キャビティ21の内部には、未硬化樹脂Rが供給される。キャビティ21の構造は、キャビティ21内の未硬化樹脂Rに対してワークWの載置面W1及び半導体素子Cを浸漬させることにより、キャビティ21から未硬化樹脂Rが溢れて後述する加圧機構7の越流路71に流れるように構成される。
 すなわち、キャビティ21内の未硬化樹脂Rは、載置面W1及び半導体素子Cが浸漬した容積分だけ、キャビティ21から溢れて越流路71に流れ出る。
 キャビティ21に対する熱硬化性樹脂R1の供給量は、キャビティ21内の未硬化樹脂Rに対するワークWの載置面W1及び半導体素子Cの浸漬容量よりも多く設定される。
 熱硬化性樹脂R1の供給量の具体例としては、キャビティ21の容積からワークWの載置面W1及び半導体素子Cの浸漬容積を引いた容積に対して約101~120%程度に設定することが好ましい。
 これにより、熱硬化性樹脂R1の供給不足に伴うモールド成形の成形不良や樹脂封止された成形品M内の気泡(ボイド)の発生防止と、熱硬化性樹脂R1の供給過多に伴う越流路71からの溢れ出し防止を同時に達成可能になる。
Uncured resin R is supplied into the cavity 21. The structure of the cavity 21 is such that the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the uncured resin R in the cavity 21 so that the uncured resin R overflows from the cavity 21 and will be described later. It is comprised so that it may flow into the overflow channel 71.
That is, the uncured resin R in the cavity 21 overflows from the cavity 21 and flows out to the overflow channel 71 by the volume of the mounting surface W1 and the semiconductor element C immersed therein.
The supply amount of the thermosetting resin R <b> 1 to the cavity 21 is set to be larger than the mounting surface W <b> 1 of the workpiece W and the immersion capacity of the semiconductor element C with respect to the uncured resin R in the cavity 21.
As a specific example of the supply amount of the thermosetting resin R1, the volume of the cavity 21 is set to about 101 to 120% with respect to the volume obtained by subtracting the mounting surface W1 of the workpiece W and the immersion volume of the semiconductor element C. Is preferred.
This prevents the occurrence of molding defects due to insufficient supply of the thermosetting resin R1 and the generation of bubbles in the resin-sealed molded product M, and overflow due to excessive supply of the thermosetting resin R1. It is possible to prevent overflow from the road 71 at the same time.
 未硬化樹脂Rの具体例として図1~図5に示される例の場合には、キャビティ21の形状及びサイズに対応した外形状のシート状の熱硬化性樹脂R1が、キャビティ21内に供給され、加熱用のヒータで溶融している。
 また、未硬化樹脂Rの他の例として、図6に示されるように粉末状又は顆粒状の熱硬化性樹脂R2をキャビティ21内に供給して加熱用のヒータで溶融することや、図7に示されるように未硬化樹脂層R31が樹脂含浸繊維基材R32に含浸された繊維含有樹脂基板R3をキャビティ21内に供給することなどの変更が可能である。それ以外に図示しないがゲル状の未硬化樹脂をキャビティ21内に供給することも可能である。
 図6に示されるように粉末状又は顆粒状の熱硬化性樹脂R2は、シート状の熱硬化性樹脂R1や繊維含有樹脂基板R3に比べて、未硬化樹脂Rの微妙な容量調整を容易に行えて作業性に優れるという利点がある。
 図7に示される繊維含有樹脂基板R3は、特許第5934078号公報に記載されるように、XY方向の線膨張係数が3ppmより小さい炭素繊維、ガラス繊維、石英ガラス繊維などからなる樹脂含浸繊維基材R32と、樹脂含浸繊維基材R32の片面上に形成された未硬化のエポキシ系樹脂などからなる未硬化樹脂層R31と、を有している。
 図7に示される変形例では、未硬化樹脂層R31を硬化させた時の収縮応力が抑制可能となる。このため、ワークWとして大口径ウエハや金属等の大口径基板を封止した場合、特には薄いものを封止する場合であっても、ワークW(ウエハや基板)の反り、ワークW(ウエハや基板)からの半導体素子Cの剥離、ワークW(ウエハや基板)の破損を抑制でき、半導体素子Cを搭載したワークW(ウエハや基板)の載置面W1、又は半導体素子Cを形成したワークW(ウエハや基板)の載置面W1をワークW(ウエハや基板)のレベルで一括封止でき、かつ封止後には耐熱性や耐湿性等の封止性能に優れるという利点がある。
In the case of the example shown in FIGS. 1 to 5 as a specific example of the uncured resin R, a sheet-like thermosetting resin R 1 having an outer shape corresponding to the shape and size of the cavity 21 is supplied into the cavity 21. It is melted with a heater for heating.
Further, as another example of the uncured resin R, as shown in FIG. 6, a powdered or granular thermosetting resin R2 is supplied into the cavity 21 and melted with a heater for heating, or FIG. The fiber-containing resin substrate R3 in which the uncured resin layer R31 is impregnated in the resin-impregnated fiber base R32 is supplied into the cavity 21 as shown in FIG. Other than that, although not shown, it is also possible to supply gel-like uncured resin into the cavity 21.
As shown in FIG. 6, the powdered or granular thermosetting resin R <b> 2 easily adjusts the capacity of the uncured resin R more easily than the sheet-like thermosetting resin R <b> 1 or the fiber-containing resin substrate R <b> 3. There is an advantage that it can be performed and is excellent in workability.
The fiber-containing resin substrate R3 shown in FIG. 7 is a resin-impregnated fiber base made of carbon fiber, glass fiber, quartz glass fiber or the like whose linear expansion coefficient in the XY direction is smaller than 3 ppm, as described in Japanese Patent No. 5934078. A material R32 and an uncured resin layer R31 made of an uncured epoxy resin or the like formed on one surface of the resin-impregnated fiber substrate R32 are provided.
In the modification shown in FIG. 7, the shrinkage stress when the uncured resin layer R31 is cured can be suppressed. For this reason, when a large-diameter wafer or a large-diameter substrate such as metal is sealed as the workpiece W, even when a thin substrate is sealed, the workpiece W (wafer or substrate) warps, the workpiece W (wafer) The separation of the semiconductor element C from the substrate and the substrate and the damage of the workpiece W (wafer or substrate) can be suppressed, and the mounting surface W1 of the workpiece W (wafer or substrate) on which the semiconductor element C is mounted or the semiconductor element C is formed. There is an advantage that the mounting surface W1 of the workpiece W (wafer or substrate) can be collectively sealed at the level of the workpiece W (wafer or substrate) and the sealing performance such as heat resistance and moisture resistance is excellent after sealing.
 さらに、第二成形型2は、キャビティ21の底面部を構成する中央部位22と、キャビティ21の側面部となる外側部位23とに分割することが好ましい。
 中央部位22及び外側部位23の間には、離型シートS(第一離型シートS1)の位置決め部6として吸着用スリット61を形成することが好ましい。吸着用スリット61は、真空ポンプなどの吸気装置62と連通して、伸縮性に優れた離型シートS(第一離型シートS1)がキャビティ21の底面部及び側面部の形状に沿って屈曲変形するように位置決め保持する。
 外側部位23は、離型シートS(第一離型シートS1、第二離型シートS2)の有無と関係なく第一成形型1と接する従動部23aと、第一成形型1及び従動部23aのZ方向への移動を規制するストッパ23bと、従動部23aを第一成形型1に向けて常時付勢する弾性部材23cと、を有している。
 従動部23aは、Z方向へ往復動自在に支持され、第一成形型1が従動部23aを介してストッパ23bと当接した状態で、第一成形型1の押圧部11からキャビティ21の底面部までの間隔が、ワークWを含めた成形品Mの厚みと同じになるように設定されている。
 また、その他の例として図示しないが、第二成形型2を中央部位22と外側部位23に分割せずに一体形成することや、外側部位23との形状及び構造を図示以外の形状及び構造に変更することなども可能である。
Further, the second mold 2 is preferably divided into a central portion 22 constituting the bottom surface portion of the cavity 21 and an outer portion 23 serving as a side surface portion of the cavity 21.
It is preferable to form a suction slit 61 between the central portion 22 and the outer portion 23 as the positioning portion 6 of the release sheet S (first release sheet S1). The suction slit 61 communicates with an air suction device 62 such as a vacuum pump so that the release sheet S (first release sheet S1) having excellent stretchability is bent along the shape of the bottom surface and the side surface of the cavity 21. Position and hold so as to deform.
The outer portion 23 includes a driven portion 23a that is in contact with the first mold 1 regardless of the presence or absence of the release sheet S (first release sheet S1, second release sheet S2), and the first mold 1 and the driven portion 23a. A stopper 23b that restricts the movement of the follower in the Z direction and an elastic member 23c that constantly biases the driven portion 23a toward the first mold 1 are provided.
The driven portion 23a is supported so as to be capable of reciprocating in the Z direction, and the bottom surface of the cavity 21 from the pressing portion 11 of the first mold 1 with the first mold 1 in contact with the stopper 23b via the driven portion 23a. The distance to the part is set to be the same as the thickness of the molded product M including the workpiece W.
Although not shown as other examples, the second mold 2 is integrally formed without being divided into the central portion 22 and the outer portion 23, and the shape and structure of the outer portion 23 are changed to shapes and structures other than those shown in the drawing. It is also possible to change it.
 これに加えて第二成形型2の外側部位23には、未硬化樹脂Rの加圧機構7を設けることが好ましい。
 未硬化樹脂Rの加圧機構7は、キャビティ21の外側に連続して形成される越流路71と、越流路71へ向け突出自在に設けられるプランジャ72と、越流路71内の未硬化樹脂R及びプランジャ72の間に設けられる変形可能な分離部73と、を有している。
 越流路71は、図2に示されるように、キャビティ21の周囲に複数の越流路71をそれぞれ所定間隔毎に形成することが好ましい。複数の越流路71には、複数のプランジャ72がそれぞれ設けられ、複数の越流路71及び複数のプランジャ72をキャビティ21の形状に対して対称的な配置とすることが好ましい。
 キャビティ21及び越流路71の具体例として図1~図9に示される例の場合には、円形凹状のキャビティ21の外周に複数の越流路71をそれぞれ周方向へ所定間隔毎でかつ且つXY方向へ放射状に配置し、各越流路71の底面先端に複数のプランジャ72をそれぞれ周方向へ所定間隔毎に配置している。
 これに対し、第一成形型1においてキャビティ21とZ方向へ対向する第一被蓋部位11fは、キャビティ21と同じ円形状の部分に相当し、越流路71とZ方向へ対向する第二被蓋部位11sと、プランジャ72とZ方向へ対向する第三被蓋部位11tは、円形状の第一被蓋部位11fの外縁に沿った環状(円環状)の部分に相当する。図示例では、第一被蓋部位11f,第二被蓋部位11s及び第三被蓋部位11tの全てが平滑状に連続形成されている。
 また、その他の例として図示しないが、キャビティ21の形状を矩形凹状や多角形凹状などに変更することや、キャビティ21のサイズを図示例以外の大きさに変更することが可能である。キャビティ21の形状が矩形凹状や多角形凹状などに変更された場合には、キャビティ21の各辺や各角部に、複数の越流路71を所定間隔毎に配置するなど、越流路71の配置や数や形状だけでなく、プランジャ72の配置や数や形状を図示例以外に変更することも可能である。
In addition to this, it is preferable to provide a pressurizing mechanism 7 for the uncured resin R in the outer portion 23 of the second mold 2.
The pressurizing mechanism 7 for the uncured resin R includes an overflow channel 71 that is continuously formed outside the cavity 21, a plunger 72 that is provided so as to protrude toward the overflow channel 71, and an unfilled channel in the overflow channel 71. And a deformable separation portion 73 provided between the cured resin R and the plunger 72.
As shown in FIG. 2, the overflow channel 71 is preferably formed with a plurality of overflow channels 71 around the cavity 21 at predetermined intervals. A plurality of plungers 72 are respectively provided in the plurality of overflow channels 71, and the plurality of overflow channels 71 and the plurality of plungers 72 are preferably arranged symmetrically with respect to the shape of the cavity 21.
In the case of the example shown in FIG. 1 to FIG. 9 as specific examples of the cavity 21 and the overflow channel 71, a plurality of overflow channels 71 are respectively arranged at predetermined intervals in the circumferential direction on the outer periphery of the circular concave cavity 21. A plurality of plungers 72 are arranged at predetermined intervals in the circumferential direction at the top end of the bottom surface of each overflow channel 71 in a radial manner in the XY direction.
On the other hand, in the first mold 1, the first covered portion 11 f facing the cavity 21 in the Z direction corresponds to the same circular portion as the cavity 21, and the second portion facing the overflow channel 71 in the Z direction. The covered portion 11s and the third covered portion 11t facing the plunger 72 in the Z direction correspond to an annular (annular) portion along the outer edge of the circular first covered portion 11f. In the illustrated example, all of the first lid portion 11f, the second lid portion 11s, and the third lid portion 11t are continuously formed in a smooth shape.
Although not shown as another example, the shape of the cavity 21 can be changed to a rectangular concave shape or a polygonal concave shape, or the size of the cavity 21 can be changed to a size other than the illustrated example. When the shape of the cavity 21 is changed to a rectangular concave shape, a polygonal concave shape, or the like, a plurality of overflow channels 71 are arranged at predetermined intervals on each side or each corner of the cavity 21. It is possible to change not only the arrangement, number and shape of the plunger 72 but also the arrangement, number and shape of the plunger 72 other than the illustrated example.
 プランジャ72は、越流路71の容積を可変させるために外側部位23の従動部23aなどに対してZ方向へ往復動自在に支持される。プランジャ72を越流路71に向け突出移動させることにより、越流路71内の未硬化樹脂Rが加圧されてキャビティ21側に押し返すように構成されている。
 プランジャ72による未硬化樹脂Rの加圧力は、型締め時におけるプレスの単位面積当たりの圧力に対して、プランジャ72からの押し返しの単位面積辺りの圧力が約200~400%程度に設定することが好ましい。
 これにより、樹脂封止された成形品M内の気泡(ボイド)の発生防止が達成可能になる。これと同時に越流路71からキャビティ21側に押し返された未硬化樹脂Rの流勢により、ワークWの基板端子と半導体素子Cをつなぐワイヤーなどの接続部材C1が変形するなどの悪影響の発生防止も達成可能になる。接続部材C1の変形などによる悪影響としては、ワークWの基板に対する半導体素子Cの位置ズレ、接続部材C1の断線、半導体素子Cの破損などが挙げられる。
 プランジャ72の加圧力の具体的な設定方法としては、プランジャ72の駆動源72aとなるサーボモータなどのトルクを検出し、プランジャ72により越流路71からキャビティ21側に未硬化樹脂Rを押し返す際に、トルクが設定範囲内に収まるように制御する。トルクが設定範囲を超えた時には、プランジャ72の作動を停止させるように制御する。
 分離部73は、キャビティ21に沿って供給された離型シートS(第一離型シートS1)の外周部に一体形成することが好ましい。第一離型シートS1は、キャビティ21及び越流路71に亘って配置され、その越流路71に沿った箇所で且つプランジャ72の被覆部位を分離部73とすることが好ましい。
The plunger 72 is supported so as to reciprocate in the Z direction with respect to the driven portion 23 a of the outer portion 23 and the like in order to vary the volume of the overflow channel 71. By causing the plunger 72 to project and move toward the overflow channel 71, the uncured resin R in the overflow channel 71 is pressurized and pushed back to the cavity 21 side.
The pressure applied to the uncured resin R by the plunger 72 may be set such that the pressure per unit area of pressing back from the plunger 72 is about 200 to 400% with respect to the pressure per unit area of the press at the time of clamping. preferable.
Thereby, generation | occurrence | production prevention of the bubble (void) in the molded product M sealed with resin can be achieved. At the same time, the flow of the uncured resin R pushed back from the overflow channel 71 toward the cavity 21 causes an adverse effect such as deformation of the connecting member C1 such as a wire connecting the substrate terminal of the workpiece W and the semiconductor element C. Prevention can also be achieved. Examples of adverse effects caused by deformation of the connection member C1 include positional displacement of the semiconductor element C with respect to the substrate of the workpiece W, disconnection of the connection member C1, damage to the semiconductor element C, and the like.
As a specific method for setting the pressure applied to the plunger 72, torque of a servo motor or the like serving as the drive source 72a of the plunger 72 is detected, and when the uncured resin R is pushed back from the overflow channel 71 toward the cavity 21 by the plunger 72. In addition, control is performed so that the torque falls within the set range. When the torque exceeds the set range, the operation of the plunger 72 is controlled to be stopped.
The separation portion 73 is preferably formed integrally with the outer peripheral portion of the release sheet S (first release sheet S1) supplied along the cavity 21. The first release sheet S <b> 1 is preferably disposed across the cavity 21 and the overflow channel 71, and the part of the first release sheet S <b> 1 along the overflow channel 71 and the covering portion of the plunger 72 is preferably the separation part 73.
 密閉室31は、真空チャンバーなどからなる真空装置3の内部に形成され、真空ポンプなどの調圧部5の作動で密閉室31から気体を排出(真空排気、真空引き)することが好ましい。これにより、密閉室31は、大気雰囲気APから所定真空度の減圧雰囲気DPまで変圧調整可能に構成される。
 真空装置3は、密閉室31にワークW,未硬化樹脂R,離型シートS及び成形品Mなどを出し入れするためにその全体又は一部が開閉自在に構成される。真空装置3内の密閉室31と真空装置3の外部空間Oに亘って、例えば搬送ロボットなどの搬送機構(図示しない)を設けることで自動化が図れる。
 詳しく説明すると、密閉室31が大気雰囲気APである時に、ワークW,未硬化樹脂R及び離型シートSを搬送機構により密閉室31へそれぞれ搬入する。密閉室31が所定真空度の減圧雰囲気DPになってから、モールド成形を行う。モールド成形が完了した後は、大気雰囲気APに戻して成形品Mを密閉室31から外部空間Oへ搬出する。
 真空装置3の具体例として図1~図9に示される例の場合には、真空装置3の上側を構成する第一成形型1の外周に周壁部32が、真空装置3の下側を構成する第二成形型2の外周部と着脱自在に密接するように設けられている。周壁部32は、第二成形型2の外周部とZ方向へ密着するシール部位32aと、Z方向へ弾性変形可能な伸縮部位32bと、を有している。
 また、その他の例として図示しないが、第一成形型1の周壁部32に代えて、第二成形型2の外周に周壁部を設けることや、第一成形型1及び第二成形型2の外周にZ方向へ分離可能な周壁部を設けることなどの変更が可能である。
The sealed chamber 31 is preferably formed inside the vacuum device 3 including a vacuum chamber and the like, and it is preferable that gas is exhausted (evacuated and evacuated) from the sealed chamber 31 by the operation of the pressure adjusting unit 5 such as a vacuum pump. Thereby, the sealed chamber 31 is configured to be capable of adjusting the transformation from the atmospheric atmosphere AP to the reduced-pressure atmosphere DP having a predetermined degree of vacuum.
The vacuum device 3 is configured to be openable and closable in whole or in part so that the workpiece W, the uncured resin R, the release sheet S, the molded product M, and the like can be taken in and out of the sealed chamber 31. Automation can be achieved by providing a transfer mechanism (not shown) such as a transfer robot across the sealed chamber 31 in the vacuum apparatus 3 and the external space O of the vacuum apparatus 3.
More specifically, when the sealed chamber 31 is the atmospheric atmosphere AP, the workpiece W, the uncured resin R, and the release sheet S are carried into the sealed chamber 31 by the transport mechanism. Molding is performed after the sealed chamber 31 is in a reduced pressure atmosphere DP having a predetermined degree of vacuum. After the molding is completed, the molded product M is returned from the sealed chamber 31 to the external space O by returning to the atmospheric atmosphere AP.
In the case of the example shown in FIGS. 1 to 9 as a specific example of the vacuum device 3, the peripheral wall portion 32 constitutes the lower side of the vacuum device 3 on the outer periphery of the first mold 1 constituting the upper side of the vacuum device 3. It is provided so as to be detachable and intimately attached to the outer periphery of the second mold 2. The peripheral wall portion 32 has a seal portion 32a that is in close contact with the outer peripheral portion of the second mold 2 in the Z direction, and a stretchable portion 32b that is elastically deformable in the Z direction.
Although not shown as other examples, instead of the peripheral wall portion 32 of the first mold 1, a peripheral wall portion may be provided on the outer periphery of the second mold 2, or the first mold 1 and the second mold 2. A change such as providing a peripheral wall portion separable in the Z direction on the outer periphery is possible.
 昇降用の駆動部4は、第一成形型1又は第二成形型2のいずれか一方か若しくは第一成形型1及び第二成形型2の両方をZ方向へ往復動させるアクチュエーターなどで構成され、後述する制御部8により作動制御している。
 制御部8による昇降用の駆動部4の制御例としては、図1の実線に示されるワークWや未硬化樹脂Rなどの搬入時と、少なくとも図5(b)に示される成形品Mの搬出時には、第一成形型1と第二成形型2をZ方向へ相対的に離隔移動させる。それ以外は、図3(a)(b)及び図4(a)(b)に示されるように、第一成形型1と第二成形型2をZ方向へ相対的に接近移動させる。特に必要がある場合には、第一成形型1と第二成形型2が更に接近移動してワークWや未硬化樹脂Rを加圧する。
 詳しく説明すると、昇降用の駆動部4によって、搬入時や搬出時には、第一成形型1又は第二成形型2のいずれか一方を他方からZ方向へ相対的に離隔移動させるか、若しくは第一成形型1及び第二成形型2の両方を互いにZ方向へ相対的に離隔移動させる。それ以外は、第一成形型1又は第二成形型2のいずれか一方を他方へ向けZ方向へ相対的に接近移動させるか、若しくは第一成形型1及び第二成形型2の両方を互いにZ方向へ相対的に接近移動させる。
 昇降用の駆動部4の具体例として、図1に示される例の場合には、第一成形型1のみを昇降用の駆動部4と連係させて、第一成形型1側を第二成形型2側に向けてZ方向へ接近移動させている。
 また、その他の例として図示しないが、第二成形型2のみを昇降用の駆動部4と連係させて、第二成形型2側を第一成形型1側に向けZ方向へ相対的に接近移動させることや、第一成形型1及び第二成形型2をそれぞれ昇降用の駆動部4と連係させて、第一成形型1側と第二成形型2側を同時にZ方向へ接近移動させることなどの変更も可能である。
The drive unit 4 for raising and lowering is configured by an actuator or the like that reciprocates either the first mold 1 or the second mold 2 or both the first mold 1 and the second mold 2 in the Z direction. The operation is controlled by the control unit 8 described later.
As an example of control of the drive unit 4 for raising and lowering by the control unit 8, at the time of carrying in the workpiece W and the uncured resin R shown by the solid line in FIG. 1 and at least carrying out the molded product M shown in FIG. Sometimes, the first mold 1 and the second mold 2 are relatively moved apart in the Z direction. Other than that, as FIG.3 (a) (b) and FIG.4 (a) (b) show, the 1st shaping | molding die 1 and the 2nd shaping | molding die 2 are moved relatively close to a Z direction. When particularly necessary, the first molding die 1 and the second molding die 2 move further closer to pressurize the workpiece W and the uncured resin R.
Explaining in detail, either the first molding die 1 or the second molding die 2 is relatively moved away from the other in the Z direction by the elevating drive unit 4 at the time of carry-in or carry-out, or the first Both the mold 1 and the second mold 2 are moved relatively apart from each other in the Z direction. Otherwise, either the first mold 1 or the second mold 2 is moved relatively close to the Z direction toward the other, or both the first mold 1 and the second mold 2 are moved to each other. Move relatively close to the Z direction.
In the case of the example shown in FIG. 1, as a specific example of the lifting drive unit 4, only the first mold 1 is linked to the lifting drive unit 4, and the first mold 1 side is second molded. It is moved close to the mold 2 side in the Z direction.
Although not shown in the drawings as another example, only the second mold 2 is linked to the drive unit 4 for raising and lowering, and the second mold 2 side is relatively close to the first mold 1 side in the Z direction. The first molding die 1 and the second molding die 2 are respectively linked to the raising / lowering drive unit 4 to move the first molding die 1 side and the second molding die 2 side simultaneously in the Z direction. It is possible to change things.
 制御部8は、昇降用の駆動部4だけでなく、調圧部5、位置決め部6の吸気装置62、加圧機構7のプランジャ72の駆動源72a、ワークW,未硬化樹脂R及び離型シートSの搬送機構などにも電気的に接続するコントローラーである。
 制御部8となるコントローラーは、その制御回路(図示しない)に予め設定されたプログラムに従って、予め設定されたタイミングで順次それぞれ作動制御している。
The control unit 8 includes not only the drive unit 4 for raising and lowering but also the pressure adjusting unit 5, the intake device 62 of the positioning unit 6, the drive source 72 a of the plunger 72 of the pressurizing mechanism 7, the workpiece W, the uncured resin R, and the mold release. It is a controller that is electrically connected to the transport mechanism of the sheet S and the like.
The controller serving as the controller 8 sequentially controls the operation at a preset timing in accordance with a preset program in its control circuit (not shown).
 そして、制御部8の制御回路に設定されたプログラムを、成形品Mを生産するための樹脂封止方法として説明する。
 本発明の実施形態に係る樹脂封止方法は、開口した密閉室31へワークW,未硬化樹脂R及び離型シートSを搬入する搬入工程と、ワークWの載置面W1及び半導体素子Cをキャビティ21内の未硬化樹脂Rに浸漬させる浸漬工程と、越流路71に流出した未硬化樹脂Rをプランジャ72の突出移動により加圧する未硬化樹脂Rの圧縮工程と、未硬化樹脂Rの硬化により樹脂封止する硬化工程と、密閉室31を開口させて成形品Mを取り出す搬出工程と、を主要な工程として含んでいる。
 特に、搬入工程と浸漬工程の間には、密閉室31を大気雰囲気APから所定真空度の減圧雰囲気DPまで減圧させる減圧工程が含まれ、所定真空度の減圧雰囲気DPで浸漬工程を行うことが好ましい。
 さらに、硬化工程と搬出工程の間には、密閉室31を減圧雰囲気DPから大気雰囲気APに戻す大気開放工程を含むことが好ましい。
And the program set to the control circuit of the control part 8 is demonstrated as a resin sealing method for producing the molded article M. FIG.
In the resin sealing method according to the embodiment of the present invention, the work W, the uncured resin R, and the release sheet S are carried into the opened sealed chamber 31, the mounting surface W 1 of the work W, and the semiconductor element C. Immersion step of immersing in the uncured resin R in the cavity 21, compression step of the uncured resin R that pressurizes the uncured resin R that has flowed out into the overflow channel 71 by the protruding movement of the plunger 72, and curing of the uncured resin R The main process includes a curing process in which resin sealing is performed and an unloading process in which the sealed chamber 31 is opened and the molded product M is taken out.
In particular, between the carrying-in process and the dipping process, there is included a depressurizing process for depressurizing the sealed chamber 31 from the atmospheric atmosphere AP to the depressurized atmosphere DP having a predetermined degree of vacuum. preferable.
Furthermore, it is preferable to include an air release step for returning the sealed chamber 31 from the reduced pressure atmosphere DP to the air atmosphere AP between the curing step and the carry-out step.
 搬入工程では、図1及び図2に示すように、第一成形型1と第二成形型2がZ方向へ相対的に離隔移動され、大気雰囲気APで第二成形型2のキャビティ21に向け搬送機構により離型シートS(第一離型シートS1)及び未硬化樹脂Rを供給する。これにより、キャビティ21の所定位置に第一離型シートS1を介して未硬化樹脂Rがセットされる。未硬化樹脂Rの上方には、搬送機構によりワークW及び離型シートS(第二離型シートS21)を供給され、未硬化樹脂Rの上方の所定位置にセットされる。
 減圧工程では、図3(a)に示すように、第一成形型1又は第二成形型2のいずれか一方か若しくは両方を昇降用の駆動部4でZ方向へ相対的に接近移動して、第一成形型1と第二成形型2の間に亘り密閉室31を形成する。これに続いて、調圧部5で密閉室31内の気体を外部空間Oへ排出(真空排気、真空引き)して大気雰囲気APから減圧させている。この頃には、キャビティ21内の未硬化樹脂Rが加熱用のヒータで溶融されている。
 その後も図3(b)に示すように、第一成形型1と第二成形型2が相対的に接近移動し、密閉室31が約100Pa以下の高真空になった頃には、溶融状態の未硬化樹脂RにワークWの載置面W1及び半導体素子Cが押し込まれる。
 浸漬工程では、図4(a)に示すように、第一成形型1と接した外側部位23の従動部23aが、ストッパ23bに突き当たるまでZ方向へ接近移動して型締めを行い、未硬化樹脂Rが加圧される。これにより、溶融状態の未硬化樹脂Rに対してワークWの載置面W1及び半導体素子Cを浸漬した容積分だけ、未硬化樹脂Rが越流路71に流れて溢れ出る。
 圧縮工程では、図4(b)に示すように、プランジャ72が第一成形型1の第三被蓋部位11tへ向けて越流路71内に突出移動する。この際に、プランジャ72は、離型シートS(第一離型シートS1)において分離部73となるプランジャ72の被覆部位を介して越流路71へ向け突出移動する。これにより、分離部73を越流路71内に突出させた容積分の未硬化樹脂Rが、プランジャ72側へ流入することなく越流路71に押し返されて、キャビティ21内の未硬化樹脂Rを加圧し、未硬化樹脂Rが更に圧縮する。
 なお、図示例の場合においてプランジャ72の作動制御は、未硬化樹脂Rが越流路71に溢れ出る前の初期状態(図3(b)に示される浸漬工程よりも前)で、越流路71に向かう突出移動方向とは逆向き移動して待機させている。また、その他の制御例として、初期状態でプランジャ72を越流路71に向け突出移動して待機させ、未硬化樹脂Rが越流路71に溢れ出ることに伴ってその重量でプランジャ72を逆向き移動させるように作動制御することも可能である。
 その後の硬化工程では、ヒータによる加熱や時間経過などにより、キャビティ21及び越流路71内の未硬化樹脂Rが共に硬化して、ワークWの載置面W1及び半導体素子Cと、両者間の接続部材C1を除く隙間C2と、が一体的に樹脂封止される。
 未硬化樹脂Rの硬化後の大気開放工程では、図5(a)に示すように、調圧部5で外部空間Oから密閉室31へ給気して大気雰囲気APに戻す。これと同時に、プランジャ72が逆移動して初期状態に戻す。この際、第一成形型1と第二成形型2が昇降用の駆動部4により離隔移動して、第一成形型1の押圧部11からワークWの非載置面W2を剥離している。
 その後の搬出工程では、図5(b)に示すように、第一成形型1と第二成形型2が更に離隔移動して、真空装置3が完全に開口したところで、樹脂封止が完了した成形品M及び離型シートSを搬送機構により密閉室31から外部空間Oへ搬出する。成形品Mと離型シートS(第一離型シートS1、第二離型シートS2)は、密閉室31内又は外部空間Oにおいて分離される。
In the carrying-in process, as shown in FIGS. 1 and 2, the first mold 1 and the second mold 2 are relatively moved apart in the Z direction and directed toward the cavity 21 of the second mold 2 in the atmospheric atmosphere AP. The release sheet S (first release sheet S1) and the uncured resin R are supplied by the transport mechanism. Thereby, the uncured resin R is set at a predetermined position of the cavity 21 via the first release sheet S1. Above the uncured resin R, the work W and the release sheet S (second release sheet S21) are supplied by the transport mechanism and set at a predetermined position above the uncured resin R.
In the decompression step, as shown in FIG. 3A, either one or both of the first mold 1 and the second mold 2 are moved relatively close to each other in the Z direction by the drive unit 4 for raising and lowering. A sealed chamber 31 is formed between the first mold 1 and the second mold 2. Following this, the pressure adjusting unit 5 discharges the gas in the sealed chamber 31 to the external space O (evacuation and evacuation) to reduce the pressure from the atmospheric atmosphere AP. At this time, the uncured resin R in the cavity 21 is melted by a heater for heating.
After that, as shown in FIG. 3B, when the first mold 1 and the second mold 2 move relatively close to each other and the sealed chamber 31 is in a high vacuum of about 100 Pa or less, the molten state The mounting surface W1 of the workpiece W and the semiconductor element C are pushed into the uncured resin R.
In the dipping process, as shown in FIG. 4 (a), the driven portion 23a of the outer portion 23 in contact with the first mold 1 moves closer in the Z direction until it abuts against the stopper 23b, and the mold is clamped. Resin R is pressurized. As a result, the uncured resin R flows into the overflow channel 71 and overflows as much as the volume in which the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the melted uncured resin R.
In the compression step, as shown in FIG. 4B, the plunger 72 projects and moves into the overflow channel 71 toward the third covered portion 11 t of the first mold 1. At this time, the plunger 72 projects and moves toward the overflow channel 71 through the covering portion of the plunger 72 that becomes the separation portion 73 in the release sheet S (first release sheet S1). As a result, the uncured resin R of a volume that protrudes the separating portion 73 into the overflow channel 71 is pushed back to the overflow channel 71 without flowing into the plunger 72, and the uncured resin in the cavity 21. R is pressurized and the uncured resin R is further compressed.
In the illustrated example, the operation of the plunger 72 is controlled in the initial state before the uncured resin R overflows the overflow channel 71 (before the dipping step shown in FIG. 3B). It moves in the opposite direction to the projecting movement direction toward 71 and stands by. As another control example, in the initial state, the plunger 72 protrudes toward the overflow channel 71 to stand by, and the plunger 72 is reversed by its weight as the uncured resin R overflows into the overflow channel 71. It is also possible to control the operation so as to move the direction.
In the subsequent curing process, the uncured resin R in the cavity 21 and the overflow channel 71 is cured together by heating with a heater or the passage of time, and the work surface W1 and the semiconductor element C are placed between the two. The gap C2 excluding the connection member C1 is integrally resin-sealed.
In the air release step after curing of the uncured resin R, as shown in FIG. 5A, the pressure adjusting unit 5 supplies air from the external space O to the sealed chamber 31 and returns it to the air atmosphere AP. At the same time, the plunger 72 moves backward to return to the initial state. At this time, the first mold 1 and the second mold 2 are moved apart by the drive unit 4 for raising and lowering, and the non-mounting surface W2 of the workpiece W is peeled from the pressing part 11 of the first mold 1. .
In the subsequent unloading process, as shown in FIG. 5 (b), when the first mold 1 and the second mold 2 are further moved away from each other and the vacuum device 3 is completely opened, the resin sealing is completed. The molded product M and the release sheet S are carried out from the sealed chamber 31 to the external space O by the transport mechanism. The molded product M and the release sheet S (first release sheet S1, second release sheet S2) are separated in the sealed chamber 31 or in the external space O.
 次に、本発明の第二実施形態に係る樹脂封止装置Aを図8に基づいて説明する。
 本発明の第二実施形態に係る樹脂封止装置Aでは、第一成形型1の表面に押圧部11として保持チャックが設けられ、この保持チャックで第一成形型1の表面の所定位置にワークWの非載置面W2を着脱自在に保持(吊持)している。第一成形型1の押圧部11にワークWが吊持された状態で、前述した第一実施形態と同様に型締めして、モールド成形した成形品Mを製造する構成が、前述した第一実施形態とは異なり、それ以外の構成は第一実施形態と同じものである。
 このため、第二実施形態では、図8に示される初期状態において、搬送ロボットなどの搬送機構によって搬入されたワークWを保持チャックで受け取り、第一成形型1の表面に沿ってワークWが脱落不能に吊持される。これにより、図8の初期状態から押圧部11をワークWの非載置面W2に接触させている。
 それ以降は、第二実施形態も前述した第一実施形態の図3(a)(b)~図5(a)(b)と同様に作動制御している。
Next, the resin sealing apparatus A which concerns on 2nd embodiment of this invention is demonstrated based on FIG.
In the resin sealing device A according to the second embodiment of the present invention, a holding chuck is provided as a pressing portion 11 on the surface of the first mold 1, and a workpiece is placed at a predetermined position on the surface of the first mold 1 by this holding chuck. A non-mounting surface W2 of W is detachably held (suspended). In the state in which the workpiece W is suspended from the pressing portion 11 of the first mold 1, the configuration in which the mold M is manufactured by clamping the mold in the same manner as in the first embodiment described above is the first described above. Unlike the embodiment, the other configurations are the same as those of the first embodiment.
Therefore, in the second embodiment, in the initial state shown in FIG. 8, the work W carried in by a transport mechanism such as a transport robot is received by the holding chuck, and the work W is dropped along the surface of the first mold 1. It is suspended impossible. Thereby, the pressing part 11 is made to contact the non-mounting surface W2 of the workpiece | work W from the initial state of FIG.
Thereafter, the operation of the second embodiment is controlled in the same manner as in FIGS. 3A, 3B, 5A, and 5B of the first embodiment described above.
 押圧部11に設けられる保持チャックとしては、粘着チャック12を用いることが好ましい。この場合には、押圧部11とワークWの非載置面W2との間に離型シートS(第二離型シートS2)を挟み込むことなく粘着チャック12でワークWが直接的に粘着保持される。
 粘着チャック12は、その全体又は一部が例えばフッ素ゴムやエラストマー、ブチルゴム、感光性樹脂、アクリル系やシリコン系などの粘着材料からなり、ワークWの非載置面W2とZ方向へ対向する粘着面12aを有している。
 粘着チャック12の具体例として図8に示される例の場合には、シート状に形成された複数の粘着面12aをそれぞれ第一成形型1の押圧部11に分散して配置する。ワークWを保持する前の初期状態では、第一成形型1の押圧部11から粘着面12aを後述する密閉室31に向けて弾性変形可能に突出させることが好ましい。
 これにより、密閉室31が所定真空度の減圧雰囲気DPになってもワークWが落下不能になる。その結果、減圧された密閉室31内で未硬化樹脂Rが発泡しても、調圧部5でガスを減圧室31の外部に効率よく排気可能となると同時に、ワークWの載置面W1及び半導体素子Cの隙間C2から確実に排気可能となる。このため、樹脂封止の内部に気泡となって残存せず、ボイドの発生を防止でき、高精度に樹脂封止されたパッケージを実現できて、品質の向上が図れる。
 さらに、第一成形型1の押圧部11にワークWの非載置面W2が保持(吊持)されるため、その減圧工程(図示しない)においてワークWの載置面W1及び半導体素子Cと、キャビティ21内の離型シートS(第一離型シートS1)や未硬化樹脂Rとの間に所定のギャップ(間隙)を空けた状態で、密閉室31内の気体が外部空間Oへ排出(真空排気、真空引き)することが可能になる。これにより、密閉室31の中で未硬化樹脂Rの表面が十分に真空暴露され、未硬化樹脂Rの脱泡が促進される。
 このため、第一実施形態のような図3(a)に示される減圧工程において、ワークWの載置面W1及び半導体素子Cや離型シートS(第二離型シートS2)と、キャビティ21内の離型シートS(第一離型シートS1)や未硬化樹脂Rとの間隙が狭くなるものに比べ、ワークWの載置面W1と半導体素子Cの接続部材C1を除く隙間C2の全体に対する未硬化樹脂Rの進入性に優れ、内部に気泡(ボイド)がより発生しないモールド成形を安定して製作することができる。
 なお、その他の例として図示しないが、ワークWの保持チャックとして粘着チャック12に代え静電チャックを用いることや、粘着チャック12に加えて吸着チャックや静電チャックを併用することなどの変更が可能である。
An adhesive chuck 12 is preferably used as the holding chuck provided in the pressing portion 11. In this case, the workpiece W is directly adhered and held by the adhesive chuck 12 without sandwiching the release sheet S (second release sheet S2) between the pressing portion 11 and the non-mounting surface W2 of the workpiece W. The
The entire or part of the adhesive chuck 12 is made of, for example, an adhesive material such as fluorine rubber, elastomer, butyl rubber, photosensitive resin, acrylic or silicon, and is opposed to the non-mounting surface W2 of the workpiece W in the Z direction. It has a surface 12a.
In the case of the example shown in FIG. 8 as a specific example of the adhesive chuck 12, a plurality of adhesive surfaces 12 a formed in a sheet shape are respectively distributed and arranged on the pressing portions 11 of the first mold 1. In the initial state before holding the workpiece W, it is preferable that the adhesive surface 12a is protruded from the pressing portion 11 of the first mold 1 toward the sealed chamber 31 described later so as to be elastically deformable.
Thereby, even if the sealed chamber 31 is in a reduced pressure atmosphere DP having a predetermined degree of vacuum, the workpiece W cannot be dropped. As a result, even if the uncured resin R is foamed in the decompressed sealed chamber 31, gas can be efficiently exhausted to the outside of the decompression chamber 31 by the pressure adjusting unit 5, and at the same time, the mounting surface W 1 of the workpiece W and Exhaust can be reliably performed from the gap C2 of the semiconductor element C. For this reason, bubbles do not remain inside the resin seal, voids can be prevented, and a resin-sealed package can be realized with high accuracy, thereby improving quality.
Furthermore, since the non-mounting surface W2 of the workpiece W is held (suspended) by the pressing portion 11 of the first mold 1, the mounting surface W1 of the workpiece W and the semiconductor element C in the decompression step (not shown) The gas in the sealed chamber 31 is discharged to the external space O with a predetermined gap (gap) between the release sheet S (first release sheet S1) and the uncured resin R in the cavity 21. (Evacuation, evacuation) becomes possible. Thereby, the surface of the uncured resin R is sufficiently exposed to the vacuum in the sealed chamber 31, and the defoaming of the uncured resin R is promoted.
For this reason, in the decompression step shown in FIG. 3A as in the first embodiment, the placement surface W1 of the workpiece W, the semiconductor element C, the release sheet S (second release sheet S2), and the cavity 21 The entire gap C2 excluding the mounting surface W1 of the workpiece W and the connecting member C1 of the semiconductor element C, compared to the inner release sheet S (first release sheet S1) and the one having a narrow gap with the uncured resin R. Therefore, it is possible to stably produce a mold which is excellent in the invasion property of the uncured resin R with respect to the surface and in which bubbles (voids) are not generated.
Although not shown in the drawings as other examples, it is possible to use an electrostatic chuck instead of the adhesive chuck 12 as a holding chuck for the workpiece W, or to use an adsorption chuck or an electrostatic chuck in addition to the adhesive chuck 12. It is.
 さらに、図8に示される例の場合には、第一成形型1の押圧部11に、ワークWの非載置面W2を粘着チャック12の粘着面12aに向け移動して強制的に接触させる突き当て部13と、粘着チャック12の粘着面12aからワークWの非載置面W2を剥がす剥離部(図示しない)と、を設けることが好ましい。
 突き当て部13によるワークWの押し付け力は、第一成形型1の押圧部11から僅かに突出する粘着チャック12の粘着面12aをワークWの非載置面W2で押し潰して、第一成形型1の押圧部11とワークWの非載置面W2とが密接し、両者間に未硬化樹脂Rが入り込む間隙を生じさせないように設定することが好ましい。
 図8に示される突き当て部13の具体例として図示例の場合には、第一成形型1の押圧部11に吸着孔13aが開設され、吸着孔13aのサイズを凹溝部11aのサイズと略同等に設定して複数分散配置している。各吸着孔13aは、真空吸引又は気体噴射するコンプレッサなどのアクチュエータ(図示しない)と連通している。アクチュエータの作動で吸着孔13aから真空吸引することにより、ワークWの非載置面W2が粘着チャック12に向け引き寄せられて非載置面W2を粘着面12aに押し付ける。
 剥離部としては、図示しないが第一成形型1に対してZ方向へ往復動自在に設けられる押しピンを用い、この押しピンの先端でワークWの非載置面W2を粘着面12aから押し剥がすことが好ましい。剥離部の他の例として、吸着孔13aから圧縮気体を噴射することにより、粘着面12aからワークWの非載置面W2を押し剥がすことも可能である。
 また、その他の例として図示しないが、ワークWの突き当て部13として吸着孔13aに代えて静電チャックを用い、静電チャックによる電磁的な引力でワークWの非載置面W2を粘着チャック12に向け引き寄せて押し付けることや、電気的な斥力で粘着面12aからワークWの非載置面W2を押し剥がすことなどの変更が可能である。剥離部として押しピンと、吸着孔13aからの圧縮気体の噴射を併用することも可能である。これに加え、未硬化樹脂Rとしてシート状の熱硬化性樹脂R1を、図6に示される粉末状又は顆粒状の熱硬化性樹脂R2に代えることや、図7に示される未硬化樹脂層R31が樹脂含浸繊維基材R32に含浸された繊維含有樹脂基板R3に代えるなどの変更が可能である。
Further, in the case of the example shown in FIG. 8, the non-mounting surface W <b> 2 of the workpiece W is moved toward the pressure-sensitive adhesive surface 12 a of the pressure-sensitive adhesive chuck 12 and forcedly brought into contact with the pressing portion 11 of the first mold 1. It is preferable to provide the abutting part 13 and a peeling part (not shown) for peeling the non-mounting surface W2 of the workpiece W from the adhesive surface 12a of the adhesive chuck 12.
The pressing force of the workpiece W by the abutting portion 13 is obtained by crushing the adhesive surface 12a of the adhesive chuck 12 slightly protruding from the pressing portion 11 of the first molding die 1 with the non-mounting surface W2 of the workpiece W, thereby performing the first molding. It is preferable to set so that the pressing portion 11 of the mold 1 and the non-mounting surface W2 of the workpiece W are in close contact with each other and no gap for the uncured resin R to enter between them is generated.
In the case of the illustrated example as a specific example of the abutting portion 13 shown in FIG. 8, the suction hole 13 a is opened in the pressing portion 11 of the first mold 1, and the size of the suction hole 13 a is approximately the size of the concave groove portion 11 a. The same setting is used for multiple distributed arrangements. Each suction hole 13a communicates with an actuator (not shown) such as a compressor for vacuum suction or gas injection. By vacuum suction from the suction hole 13a by the operation of the actuator, the non-mounting surface W2 of the workpiece W is drawn toward the adhesive chuck 12, and the non-mounting surface W2 is pressed against the adhesive surface 12a.
As the peeling portion, although not shown, a push pin provided so as to be reciprocally movable in the Z direction with respect to the first mold 1 is used, and the tip of the push pin pushes the non-mounting surface W2 of the workpiece W from the adhesive surface 12a. Peeling is preferable. As another example of the peeling portion, the non-mounting surface W2 of the workpiece W can be pushed off from the adhesive surface 12a by injecting compressed gas from the suction hole 13a.
Although not shown as another example, an electrostatic chuck is used in place of the suction hole 13a as the abutting portion 13 of the work W, and the non-mounting surface W2 of the work W is adhered to the adhesive chuck by electromagnetic attraction by the electrostatic chuck. For example, it is possible to make a change such as pulling it toward the surface 12 and pressing it, or pressing and peeling the non-mounting surface W2 of the workpiece W from the adhesive surface 12a with an electric repulsive force. It is also possible to use a push pin as the peeling portion and a jet of compressed gas from the suction hole 13a in combination. In addition to this, the sheet-like thermosetting resin R1 as the uncured resin R may be replaced with the powdery or granular thermosetting resin R2 shown in FIG. 6, or the uncured resin layer R31 shown in FIG. Can be changed such as replacing the fiber-containing resin substrate R3 impregnated with the resin-impregnated fiber base R32.
 その次に、本発明の第三実施形態に係る樹脂封止装置Aを図9に基づいて説明する。
 本発明の第三実施形態に係る樹脂封止装置Aでは、キャビティ21の内部に板状のスペーサPを挟んで未硬化樹脂Rが供給され、前述した第一実施形態と同様に型締めして、モールド成形された成形品Mを製造するする構成が、前述した第一実施形態や第二実施形態とは異なり、それ以外の構成は第一実施形態や第二実施形態と同じものである。
 スペーサPは、その厚みが異なるものを複数種類用意しておき、成形品Mの厚みに応じて適した厚みのスペーサPが用いられる。
 このため、第三実施形態では、図9に示される初期状態において、キャビティ21の内部にスペーサPがセットされ、その上に離型シートS(第一離型シートS1)を挟んで未硬化樹脂Rが供給される。それ以降は、第三実施形態も前述した第一実施形態の図3(a)(b)~図5(a)(b)と同様に作動制御している。
 スペーサPの具体例として図9に示される場合には、図1に示される第一実施形態のような第一成形型1の押圧部11がワークWの非載置面W2と不接触な初期状態において、キャビティ21の内部に一枚のスペーサPをセットしている。
 また、その他の例として図示しないが、複数枚のスペーサPを組み合わせてセットすることや、図8に示される第二実施形態のような第一成形型1の押圧部11がワークWの非載置面W2と接触する初期状態において、キャビティ21の内部にスペーサPをセットすることなどの変更が可能である。これに加え、未硬化樹脂Rとしてシート状の熱硬化性樹脂R1を、図6に示される粉末状又は顆粒状の熱硬化性樹脂R2に代えることや、図7に示される未硬化樹脂層R31が樹脂含浸繊維基材R32に含浸された繊維含有樹脂基板R3に代えるなどの変更が可能である。
 これにより、スペーサPの厚み分だけ成形品Mの厚みが薄くなるため、キャビティ21の深さが一定であっても厚みが異なる複数種類の成形品Mが容易に製造可能になる。
Next, a resin sealing device A according to a third embodiment of the present invention will be described with reference to FIG.
In the resin sealing device A according to the third embodiment of the present invention, the uncured resin R is supplied inside the cavity 21 with the plate-like spacer P interposed therebetween, and is clamped in the same manner as in the first embodiment described above. The configuration for manufacturing the molded product M that is molded is different from the first embodiment and the second embodiment described above, and other configurations are the same as those in the first embodiment and the second embodiment.
A plurality of types of spacers P having different thicknesses are prepared, and a spacer P having a thickness suitable for the thickness of the molded product M is used.
Therefore, in the third embodiment, in the initial state shown in FIG. 9, the spacer P is set inside the cavity 21, and the release sheet S (first release sheet S <b> 1) is sandwiched between the uncured resin. R is supplied. Thereafter, the operation of the third embodiment is controlled in the same manner as in FIGS. 3 (a), 3 (b) to 5 (a), (b) of the first embodiment.
In the case shown in FIG. 9 as a specific example of the spacer P, the pressing portion 11 of the first mold 1 as in the first embodiment shown in FIG. 1 is initially in contact with the non-mounting surface W2 of the workpiece W. In the state, one spacer P is set inside the cavity 21.
Although not shown in the drawings as another example, a combination of a plurality of spacers P is set, or the pressing portion 11 of the first mold 1 as in the second embodiment shown in FIG. In the initial state of contact with the placement surface W2, it is possible to change such as setting the spacer P inside the cavity 21. In addition to this, the sheet-like thermosetting resin R1 as the uncured resin R may be replaced with the powdery or granular thermosetting resin R2 shown in FIG. 6, or the uncured resin layer R31 shown in FIG. Can be changed such as replacing the fiber-containing resin substrate R3 impregnated with the resin-impregnated fiber base R32.
Thereby, since the thickness of the molded product M is reduced by the thickness of the spacer P, a plurality of types of molded products M having different thicknesses can be easily manufactured even when the depth of the cavity 21 is constant.
 このような本発明の実施形態(第一実施形態~第三実施形態)に係る樹脂封止装置A及び樹脂封止方法によると、第二成形型2には、樹脂封止する成形品Mの外形状となるキャビティ21や、キャビティ21内から越流路71に流出した未硬化樹脂Rをキャビティ21に押し返すプランジャ72などの作動部が集約して配置される。第一成形型1には、キャビティ21と対向する第一被蓋部位11fと、越流路71と対向する第二被蓋部位11sと、プランジャ72と対向する第三被蓋部位11tと、が相互の境目なく連続形成される。
 予め多様な成形品Mの品種に応じて、キャビティ21の形状やサイズとプランジャ72の配置や数が異なる複数種類の第二成形型2を準備することにより、成形品Mの品種変更時には第二成形型2を交換するのみで、第一成形型1の共通化が可能になる。
 したがって、多様な成形品Mの品種変更に対して第二成形型2の交換だけで対応することができる。
 その結果、下型にキャビティが設けられて上型にプランジャが設けられる従来のものに比べ、成形品Mの品種変更時には第一成形型1を交換する必要がないから、交換作業の手間と時間が半減し、簡単であるだけでなく運転停止時間を短縮化できて稼働率の向上が図れる。成形品Mの品種変更を頻繁に行う必要がある場合でも、第二成形型2だけの交換で作業時間を大幅に短縮できるから著しい稼働率の向上が図れる。
 特に、第一成形型1が上型であり、第二成形型2が下型である場合には、上型となる第一成形型1の構造を簡素化できて軽量化が図れ、第一成形型1の駆動部4も小型化できるため、装置全体のコンパクト化が図れるだけでなく、装置から下型を取り外した後に上型を取り外す必要がないから、プランジャ72などのメンテナンス作業も容易でコストの低減化が図れる。
According to the resin sealing device A and the resin sealing method according to the embodiments (first embodiment to third embodiment) of the present invention, the second mold 2 has the molded product M to be resin-sealed. Actuators such as a cavity 21 that has an outer shape and a plunger 72 that pushes back the uncured resin R that has flowed out of the cavity 21 into the overflow channel 71 to the cavity 21 are collectively arranged. The first mold 1 includes a first covered portion 11 f that faces the cavity 21, a second covered portion 11 s that faces the overflow channel 71, and a third covered portion 11 t that faces the plunger 72. It is continuously formed without mutual boundaries.
By preparing a plurality of types of second molds 2 having different shapes and sizes of the cavities 21 and different arrangements and numbers of plungers 72 in accordance with various types of molded products M in advance, the second type of mold M can be changed when the product type is changed. The first mold 1 can be shared only by exchanging the mold 2.
Therefore, it is possible to deal with various types of molded products M by changing the second mold 2 alone.
As a result, it is not necessary to replace the first mold 1 when changing the type of the molded product M, compared to the conventional type in which the lower mold is provided with a cavity and the upper mold is provided with a plunger. This is not only easy, but also shortens the downtime and improves the operating rate. Even when it is necessary to frequently change the product type of the molded product M, the working time can be significantly shortened by replacing only the second mold 2 so that the operating rate can be significantly improved.
In particular, when the first mold 1 is an upper mold and the second mold 2 is a lower mold, the structure of the first mold 1 serving as the upper mold can be simplified and the weight can be reduced. Since the drive unit 4 of the mold 1 can also be reduced in size, not only can the entire apparatus be made compact, but it is not necessary to remove the upper mold after removing the lower mold from the apparatus. Cost can be reduced.
 さらに、キャビティ21と未硬化樹脂Rの間から、越流路71内の未硬化樹脂Rとプランジャ72の間に亘って、離型シートS:第一離型シートS1)をプランジャ72が被覆されるうに設けることが好ましい。
 この場合には、キャビティ21内の未硬化樹脂Rに対するワークWの載置面W1及び半導体素子Cの浸漬に伴って、未硬化樹脂Rが越流路71に溢れ出た後、離型シートS(第一離型シートS1)においてプランジャ72の被覆部位が、プランジャ72の作動で越流路71内に突出移動する。
 これにより、離型シートS(第一離型シートS1)においてプランジャ72の被覆部位を越流路71内に突出させた容積分の未硬化樹脂Rが、プランジャ72側へ流入することなく越流路71に押し戻されて、キャビティ21内の未硬化樹脂Rを加圧し、未硬化樹脂Rが圧縮する。
 したがって、キャビティ21と未硬化樹脂Rの付着を防止する離型シートS(第一離型シートS1)に、プランジャ72の被覆部材を一体化することができる。
 その結果、プランジャの加圧でプランジャの移動用隙間に未硬化樹脂が侵入して固化する従来のものに比べ、越流路71内の未硬化樹脂Rとプランジャ72の間に離型シートS(第一離型シートS1)の一部が挟み込まれるため、成形品Mを容易に取り出すことができる。
 これにより、成形品Mを剥離するためのタクトタイムの短縮化が図れて生産性に優れる。
Further, the plunger 72 is covered with the release sheet S: the first release sheet S1) between the cavity 21 and the uncured resin R and between the uncured resin R and the plunger 72 in the overflow channel 71. It is preferable to provide it.
In this case, after the uncured resin R overflows the overflow channel 71 as the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the uncured resin R in the cavity 21, the release sheet S is discharged. In (first release sheet S <b> 1), the covered portion of the plunger 72 projects and moves into the overflow channel 71 by the operation of the plunger 72.
Thereby, in the release sheet S (first release sheet S1), the uncured resin R corresponding to the volume in which the covering portion of the plunger 72 protrudes into the overflow channel 71 flows without flowing into the plunger 72 side. The uncured resin R in the cavity 21 is pressurized by being pushed back to the path 71, and the uncured resin R is compressed.
Therefore, the covering member of the plunger 72 can be integrated with the release sheet S (first release sheet S1) that prevents the cavity 21 and the uncured resin R from adhering.
As a result, the release sheet S (between the uncured resin R in the overflow passage 71 and the plunger 72 is compared with the conventional one in which the uncured resin enters the plunger moving gap by pressurization of the plunger and solidifies. Since a part of the first release sheet S1) is sandwiched, the molded product M can be easily taken out.
Thereby, the tact time for peeling the molded product M can be shortened, and the productivity is excellent.
 また、キャビティ21の周囲に複数の越流路71がそれぞれ所定間隔毎に形成され、複数の越流路71にプランジャ72をそれぞれ複数設けることが好ましい。複数の越流路71及び複数のプランジャ72は、キャビティ21の形状に対して対称的な配置など、均等配置することが好ましい。
 この場合には、キャビティ21内の未硬化樹脂Rに対するワークWの載置面W1及び半導体素子Cの浸漬に伴って、未硬化樹脂Rが複数の越流路71へそれぞれ均等に流れて溢れ出る。
 この流出状態で、複数のプランジャ72を複数の越流路71に向けて突出移動させることにより、複数の越流路71からそれぞれ均等量の未硬化樹脂Rがキャビティ21の対称的な位置に押し返される。
 このため、キャビティ21内の未硬化樹脂Rが全体的に均一に加圧される。
 したがって、キャビティ21内の未硬化樹脂Rを均等な圧力分布で加圧することができる。
 その結果、長方形のキャビティにおいて一対の長辺側の樹脂だけをプランジャで加圧する従来のものに比べ、キャビティ21内の未硬化樹脂Rの圧力分布に偏りが発生せず、形状が安定した高品質な成形品Mを作製できる。
It is preferable that a plurality of overflow channels 71 are formed around the cavity 21 at predetermined intervals, and a plurality of plungers 72 are provided in the plurality of overflow channels 71. The plurality of overflow channels 71 and the plurality of plungers 72 are preferably arranged equally, such as symmetrically arranged with respect to the shape of the cavity 21.
In this case, as the mounting surface W1 of the workpiece W and the semiconductor element C are immersed in the uncured resin R in the cavity 21, the uncured resin R flows evenly into the plurality of overflow channels 71 and overflows. .
In this outflow state, by moving the plurality of plungers 72 projecting toward the plurality of overflow channels 71, an equal amount of uncured resin R is pushed from the plurality of overflow channels 71 to the symmetrical positions of the cavities 21. returned.
For this reason, the uncured resin R in the cavity 21 is uniformly pressurized as a whole.
Therefore, the uncured resin R in the cavity 21 can be pressurized with a uniform pressure distribution.
As a result, the pressure distribution of the uncured resin R in the cavity 21 is not biased and the shape is stable compared to the conventional one in which only a pair of long side resin is pressurized with a plunger in a rectangular cavity. A molded product M can be produced.
 またさらに、未硬化樹脂Rが、キャビティ21の形状及びサイズに対応した外形状のシート状樹脂R1であり、第二成形型2がシート状樹脂R1の加熱用ヒータを有することが好ましい。
 この場合には、未硬化樹脂Rとして設定サイズのシート状樹脂R1をキャビティ21に供給することにより、キャビティ21の全面に亘ってシート状樹脂R1が均一な厚みで越流路71と接近して配置され、加熱用ヒータでシート状樹脂R1を溶融しても、キャビティ21内でほとんど流動しない。
 したがって、簡単な構造で設定量の未硬化樹脂Rをキャビティ21の全面に亘って供給することができる。
 その結果、キャビティの一部に偏って集中的に供給されたパウダレジンを溶融することで、樹脂がキャビティ内の全体に向けて広範囲に流動する従来のものに比べ、キャビティ内における溶融した未硬化樹脂Rの流動は僅かとなり、溶融した未硬化樹脂Rの流動摩擦の不均一による樹脂内斑(流動斑)を抑制できる。さらに、ワークWの載置面W1及び半導体素子Cの浸漬に対して、溶融した未硬化樹脂Rがキャビティ21から越流路71へ時間差なくスムーズに流れ、その後の型締めによる未硬化樹脂Rの加圧時や、プランジャ72による越流路71からキャビティ21内への未硬化樹脂Rの押し返し時でも、未硬化樹脂Rの流勢によりワークWの基板端子と半導体素子Cをつなぐワイヤーなどの接続部材C1が変形するなどの悪影響の発生を防止することができる。接続部材C1の変形などによる悪影響としては、ワークWの基板に対する半導体素子Cの位置ズレ、接続部材C1の断線、半導体素子Cの破損などが挙げられる。これにより、形状や品質が更に安定した高品質な成形品Mを作製できる。
 これに加え、基板の搬入搬送とは別個に、樹脂としてパウダレジンを計量してからキャビティに供給する従来のものに比べ、少なくとも計量ユニットが必要ない分だけ装置全体の構造を簡素化できるとともに、ワークWの搬入とシート状樹脂R1の供給を共通化することも可能となり、メンテナンスの簡素化も図れる。
Furthermore, it is preferable that the uncured resin R is an outer sheet-shaped resin R1 corresponding to the shape and size of the cavity 21, and the second mold 2 has a heater for heating the sheet-shaped resin R1.
In this case, by supplying a sheet-shaped resin R1 of a set size as an uncured resin R to the cavity 21, the sheet-shaped resin R1 approaches the overflow channel 71 with a uniform thickness over the entire surface of the cavity 21. Even if the sheet-like resin R1 is melted by the heater for heating, it hardly flows in the cavity 21.
Therefore, a set amount of the uncured resin R can be supplied over the entire surface of the cavity 21 with a simple structure.
As a result, the melted uncured resin in the cavity compared to the conventional resin in which the resin flows in a wide range toward the entirety of the cavity by melting the powder resin that is concentrated and supplied to a part of the cavity. The flow of R becomes slight, and the resin internal spots (flow spots) due to non-uniform flow friction of the molten uncured resin R can be suppressed. Furthermore, the molten uncured resin R smoothly flows from the cavity 21 to the overflow channel 71 without a time lag with respect to the mounting surface W1 of the workpiece W and the semiconductor element C, and the uncured resin R by the subsequent mold clamping Even when pressure is applied or when the uncured resin R is pushed back into the cavity 21 from the overflow channel 71 by the plunger 72, connection of a wire or the like connecting the substrate terminal of the workpiece W and the semiconductor element C by the flow of the uncured resin R Generation of adverse effects such as deformation of the member C1 can be prevented. Examples of adverse effects caused by deformation of the connection member C1 include positional displacement of the semiconductor element C with respect to the substrate of the workpiece W, disconnection of the connection member C1, damage to the semiconductor element C, and the like. As a result, a high-quality molded product M having a more stable shape and quality can be produced.
In addition to this, the overall structure of the device can be simplified and the work piece can be simplified at least as much as the weighing unit is not required. It is also possible to share the loading of W and the supply of the sheet-like resin R1, and the maintenance can be simplified.
 なお、前示の第一実施形態~第三実施形態において図示例では、第一成形型1がモールド成形の基板側に配置される上型であり、第二成形型2がモールド成形の樹脂側に配置される下型であるが、これに限定されず、第一成形型1がモールド成形の樹脂側に配置される下型であり、第二成形型2がモールド成形の基板側に配置される上型であってもよい。 In the illustrated examples in the first embodiment to the third embodiment, the first mold 1 is an upper mold disposed on the mold substrate side, and the second mold 2 is the resin side of the mold. However, the present invention is not limited to this, and the first mold 1 is a lower mold disposed on the resin side of molding, and the second mold 2 is disposed on the substrate side of molding. It may be an upper mold.
 A 樹脂封止装置           1 第一成形型
 11 押圧部             11f 第一被蓋部位
 11s 第二被蓋部位         11t 第三被蓋部位
 2 第二成形型            21 キャビティ
 31 密閉室             4 駆動部
 7 加圧機構             71 越流路
 72 プランジャ           8 制御部
 C 半導体素子            S 離型シート(S1:第一離型シート)
 R 未硬化樹脂            R1 シート状樹脂
 W ワーク              W1 載置面
 W2 非載置面
A Resin sealing device 1 1st shaping | molding die 11 Press part 11f 1st lid | cover part 11s 2nd lid | cover part 11t 3rd lid | cover part 2 2nd shaping | molding die 21 Cavity 31 Sealing chamber 4 Drive part 7 Pressurization mechanism 71 Going over Flow path 72 Plunger 8 Control unit C Semiconductor element S Release sheet (S1: First release sheet)
R Uncured resin R1 Sheet resin W Work W1 Placement surface W2 Non-placement surface

Claims (5)

  1.  半導体素子を搭載したワークが樹脂封止される成形品を製造する樹脂封止装置であって、
     前記半導体素子が搭載された前記ワークの押圧部を有する第一成形型と、
     前記ワークの前記半導体素子が搭載される載置面と対向状に設けられて未硬化樹脂が供給されるキャビティを有する第二成形型と、
     前記第一成形型及び前記第二成形型の間に形成される開閉自在な密閉室と、
     前記第一成形型又は前記第二成形型のいずれか一方か若しくは両方を前記第一成形型及び前記第二成形型の対向方向へ相対的に接近移動させる駆動部と、
     前記密閉室において前記キャビティ内の前記未硬化樹脂を加圧するプランジャを有する加圧機構と、
     前記駆動部及び前記プランジャを作動制御する制御部と、を備え、
     前記加圧機構は、前記密閉室内で前記第二成形型に前記キャビティと連続して設けられる前記未硬化樹脂の越流路と、前記第二成形型に前記越流路へ向けて突出移動自在に設けられる前記プランジャと、を有し、
     前記第一成形型は、前記キャビティと対向して設けられる第一被蓋部位と、前記越流路と対向して設けられる第二被蓋部位と、前記プランジャと対向して設けられる第三被蓋部位と、を有し、前記第一被蓋部位,前記第二被蓋部位及び前記第三被蓋部位が連続形成され、
     前記制御部は、前記駆動部による前記第一成形型及び前記第二成形型の相対的な接近移動で、前記ワークの前記載置面及び前記半導体素子が前記キャビティ内の前記未硬化樹脂に浸漬され、この浸漬に伴い前記キャビティ内の前記未硬化樹脂が前記越流路に流出した状態で、前記プランジャが前記第三被蓋部位へ向けて前記越流路内に突出移動するように制御することを特徴とする樹脂封止装置。
    A resin sealing device for manufacturing a molded product in which a workpiece on which a semiconductor element is mounted is resin-sealed,
    A first mold having a pressing portion of the workpiece on which the semiconductor element is mounted;
    A second mold having a cavity that is provided opposite to a mounting surface on which the semiconductor element of the workpiece is mounted and is supplied with uncured resin;
    An openable / closable sealed chamber formed between the first mold and the second mold;
    A drive unit that relatively moves one or both of the first mold and the second mold in the opposing direction of the first mold and the second mold; and
    A pressurizing mechanism having a plunger for pressurizing the uncured resin in the cavity in the sealed chamber;
    A control unit for controlling the operation of the drive unit and the plunger,
    The pressurizing mechanism includes an overflow channel of the uncured resin provided continuously to the cavity in the second mold in the sealed chamber, and a projecting movement toward the overflow channel in the second mold. And the plunger provided in
    The first mold includes a first covered portion provided to face the cavity, a second covered portion provided to face the overflow channel, and a third covered portion provided to face the plunger. A lid part, and the first covered part, the second covered part and the third covered part are continuously formed,
    The control unit is configured such that the placement surface of the workpiece and the semiconductor element are immersed in the uncured resin in the cavity by relative movement of the first mold and the second mold by the drive unit. With this immersion, the plunger is controlled to project and move into the overflow path toward the third covered region in a state where the uncured resin in the cavity flows out into the overflow path. A resin sealing device characterized by that.
  2.  前記キャビティと前記未硬化樹脂の間から、前記越流路内の前記未硬化樹脂と前記プランジャの間に亘って、離型シートが前記プランジャを被覆するように設けられることを特徴とする請求項1記載の樹脂封止装置。 The release sheet is provided so as to cover the plunger from between the cavity and the uncured resin and between the uncured resin and the plunger in the overflow channel. 1. The resin sealing device according to 1.
  3.  前記キャビティの周囲に複数の前記越流路がそれぞれ所定間隔毎に形成され、前記複数の越流路に前記プランジャをそれぞれ複数設けることを特徴とする請求項1又は2記載の樹脂封止装置。 3. The resin sealing device according to claim 1, wherein a plurality of overflow channels are formed around the cavity at predetermined intervals, and a plurality of plungers are provided in the plurality of overflow channels.
  4.  前記未硬化樹脂が、前記キャビティの形状及びサイズに対応した外形状のシート状樹脂であり、前記第二成形型が前記シート状樹脂の加熱用ヒータを有することを特徴とする請求項1、2又は3記載の樹脂封止装置。 The uncured resin is a sheet-like resin having an outer shape corresponding to the shape and size of the cavity, and the second mold has a heater for heating the sheet-like resin. Or the resin sealing apparatus of 3.
  5.  半導体素子を搭載したワークが樹脂封止される成形品を製造する樹脂封止方法であって、
     第一成形型及び第二成形型の対向方向へ相対的に離隔移動した前記第二成形型のキャビティ内に未硬化樹脂を供給し、前記未硬化樹脂と対向して前記半導体素子が搭載された前記ワークを搬入する搬入工程と、
     前記第一成形型又は前記第二成形型のいずれか一方か若しくは両方を駆動部により前記第一成形型及び前記第二成形型の対向方向へ相対的に接近移動して、前記第一成形型と前記第二成形型の間に密閉室を形成するとともに、前記ワークの前記半導体素子が搭載される載置面及び前記半導体素子を前記キャビティ内の前記未硬化樹脂に浸漬させる浸漬工程と、
     前記密閉室において前記キャビティと連続して前記第二成形型に設けられる越流路に流出した前記未硬化樹脂を、前記第二成形型に設けられたプランジャの突出移動により加圧する前記未硬化樹脂の圧縮工程と、
     前記未硬化樹脂が硬化して前記ワークの前記載置面及び前記半導体素子を樹脂封止する硬化工程と、
     前記第一成形型と前記第二成形型を前記駆動部により離隔移動させる搬出工程と、を含み、
     前記浸漬工程では、前記キャビティと対向する第一被蓋部位,前記越流路と対向する第二被蓋部位及び前記プランジャと対向する第三被蓋部位が連続形成される前記第一成形型と、前記第二成形型と、の相対的な接近移動により、前記キャビティ内の前記未硬化樹脂に対して前記ワークの前記載置面及び前記半導体素子が浸漬されるとともに、前記ワーク及び前記未硬化樹脂をプレスする型締めが行われ、
     前記圧縮工程では、前記プランジャが前記第三被蓋部位へ向けて前記越流路内に突出移動することを特徴とする樹脂封止方法。
    A resin sealing method for manufacturing a molded product in which a workpiece on which a semiconductor element is mounted is resin-sealed,
    The uncured resin is supplied into the cavity of the second mold that is relatively moved in the facing direction of the first mold and the second mold, and the semiconductor element is mounted facing the uncured resin. A loading step for loading the workpiece;
    Either or both of the first mold and the second mold are moved relatively close to each other in the opposing direction of the first mold and the second mold by the drive unit, and the first mold And a dipping step of immersing the mounting surface of the workpiece on which the semiconductor element is mounted and the semiconductor element in the uncured resin in the cavity;
    The uncured resin that pressurizes the uncured resin that has flowed out into the overflow channel provided in the second mold in the sealed chamber by the protruding movement of the plunger provided in the second mold. The compression process of
    A curing step in which the uncured resin is cured and the placement surface of the workpiece and the semiconductor element are resin-sealed;
    An unloading step of moving the first mold and the second mold apart by the drive unit,
    In the dipping process, the first mold part in which a first cover part facing the cavity, a second cover part facing the overflow channel, and a third cover part facing the plunger are continuously formed; The placement surface of the workpiece and the semiconductor element are immersed in the uncured resin in the cavity by relative movement with the second mold, and the workpiece and the uncured The mold is pressed to press the resin,
    In the compression step, the plunger is projected and moved into the overflow channel toward the third covered region.
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