WO2018072579A1 - 一种透明导电膜及电容触控传感器及触控显示装置 - Google Patents
一种透明导电膜及电容触控传感器及触控显示装置 Download PDFInfo
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
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- the invention relates to a transparent conductive film, in particular to a transparent conductive film, a capacitive touch sensor and a touch display device.
- the circuit design of the existing touch screen is usually a cross structure formed at a certain angle, and the intersection is a corresponding touch point.
- the application of this structure design in the yellow etching process such as ITO is very extensive.
- the ITO lines are very uniform, and the width and thickness of the traces are very uniform.
- the metal mesh is designed according to a similar design, the internal ITO circuit is replaced by a plurality of intersecting grids to form a metal mesh circuit loop for electrical conduction and touch.
- each grid intersection has a node, and the nodes are formed by the intersection of the line grooves, and the width of the groove is wider, so that the conductive material of the node at the time of filling is more easily taken out by the digging effect of the scraper, and at the same time It is easy to bring out conductive materials when cleaning, which results in low electrical yield, poor stability, and poor antistatic ability.
- the grid-like filling method of the metal mesh results in less conductive material filling the nodes, so if the filling is not good, it is more likely to be broken by static electricity, resulting in breakdown of the entire production process.
- the object of the present invention is that the grid design in the background art causes the node aspect ratio to be too small in the integral molding process, and the conductive material is not filled or insufficiently filled when filling the conductive material, thereby resulting in low process yield and poor stability.
- the invention discloses a transparent conductive film, the transparent conductive film comprises a grid structure, the grid structure comprises a plurality of groove units, a cross structure is formed between adjacent groove units, and a conductive material is filled in the groove A conductive mesh is formed therein, and the intersecting structure has a T shape.
- the grid structure is a regular row-column intersection structure, and the grid structure is in a Cartesian coordinate system, and the angle between the row/column and the X-axis/Y-axis is Said
- the transparent conductive film is placed on the liquid crystal module, and the transparent conductive film is rotated at an angle after the liquid crystal module is lit to view the moiré, and the rotation angle when no moiré is generated is
- the mesh grooves of the emission layer and the receiving layer are in a Cartesian coordinate system, and the angle between the row/column and the X-axis/Y-axis is Said To: place the emissive layer or the receiving layer on the desired liquid crystal module, illuminate the liquid crystal module, and then rotate the emissive layer or the receiving layer to observe the moiré; the rotation angle when no moiré is generated is
- the row width of the same column grid structure is S
- the adjacent row width of the network structure is L
- L S.
- the line width of the grid structure is w
- the adjacent column width of the same row of the grid structure is L
- the corresponding columns of adjacent rows of the grid structure are staggered from each other by a length d, satisfying 2w ⁇ d ⁇ L.
- the invention also discloses a capacitive touch sensor, the touch sensor comprising an emission layer and The receiving layer, at least one of the emitting layer and the receiving layer includes the transparent conductive film disclosed in the present invention.
- the emissive layer and the receiving layer are respectively located on two separate substrates or on both sides of the same substrate.
- the transparent conductive film comprises a plurality of conductive channels and a plurality of non-conductive channels, and the plurality of conductive channels are staggered with the plurality of non-conductive channels.
- the invention also discloses a touch display device comprising the transparent conductive film disclosed in the invention.
- the transparent conductive film of the invention has a simple structure, can improve the electrical yield, stability and antistatic ability of the process, and reduces defects caused by static electricity. Therefore, not only can the cost be reduced, but also the quality can be improved.
- Figure 1 is a schematic view showing the macro structure of a T-shaped design of a receiving layer of the present invention.
- FIG. 2 is a schematic view showing the microstructure of the T-shaped design of the receiving layer of the present invention, wherein d1 is the width of the second non-conductive channel;
- FIG. 3 is a schematic view showing the microstructure of the T-shaped design of the emissive layer of the present invention, wherein d2 is the width of the first non-conductive channel;
- FIG. 4 is a longitudinal cross-sectional view of the T-shaped structure of the present invention after filling the conductive material, where w is the line width of the groove structure at the non-node.
- d is a T-shaped grid structure in which adjacent columns of adjacent rows are staggered from each other, and L is an adjacent column width of the same row of the T-shaped grid structure.
- Figure 6 is a cell structure of a T-shaped structure, where L is the adjacent column width of the same row of the T-shaped grid structure, and S is the row width of the T-shaped grid structure.
- Figure 7 is a microscopic schematic diagram of the rotation of the T-shaped grid structure, the rotation angle is
- Fig. 8 is a schematic view showing the structure of the product after the T-shaped filling.
- embodiment 1 a transparent conductive film, the transparent conductive film includes a mesh structure 6, the mesh structure 6 includes a plurality of groove units 8, adjacent groove units 8 A cross structure 5 is formed, and a conductive material 7 (preferably made of a material such as pure silver, silver-copper composition, pure copper or nickel) is filled in the groove to form a conductive mesh, and the intersecting structure 5 has a T-shape.
- a conductive material 7 preferably made of a material such as pure silver, silver-copper composition, pure copper or nickel
- Embodiment 3 is a transparent conductive film as described in Embodiment 1, wherein the mesh structure 6 is a regular row-column cross structure, and the grid structure 6 is in a Cartesian coordinate system, and its row/column The angle with the X axis / Y axis is Said
- the transparent conductive film is placed on the liquid crystal module, and the transparent conductive film is rotated at an angle after the liquid crystal module is lit to view the moiré, and the rotation angle when no moiré is generated is Preferably, the moiré effect is viewed once every 1° of rotation.
- Embodiment 4 a transparent conductive film as described in Embodiment 3, the grid structure 6 (filled with a conductive material 7 therein) has a line width of w, a grid The adjacent column width of the same row of the structure 6 is L, and the corresponding columns of the adjacent rows of the grid structure 6 are shifted from each other by a length d, which satisfies 2w ⁇ d ⁇ L.
- the row and column are defined for convenience of description, and other structures obtained by rotating the conductive layer also fall within the protection scope of the present application.
- Embodiment 5 A transparent conductive film as described in Embodiment 4,
- Embodiment 6 is a capacitive touch sensor, which includes an emission layer 2 and a receiving layer 1. At least one of the emission layer 2 and the receiving layer 1 includes the present invention. A transparent conductive film as described.
- Embodiment 7 A capacitive touch sensor according to Embodiment 6, wherein the emission layer 2 and the receiving layer 1 are respectively located on two separate substrates or on both sides of the same substrate.
- Embodiment 8 is the capacitive touch sensor of Embodiment 6,
- the emission layer 2 includes a plurality of first conductive channels and a plurality of first non-conductive channels 4, and the first conductive channels are The first non-conductive channels 4 are staggered;
- the receiving layer 1 includes a plurality of second conductive channels and a plurality of second non-conductive channels 3, and the second conductive channels and the second non-conductive channels 3 are staggered.
- the grid structure 6 of the first conductive channel and the second conductive channel is filled with a conductive material, and the grid structure 6 of the first non-conductive channel 4 and the second non-conductive channel 3 has no conductive material.
- Embodiment 9 A capacitive touch sensor as described in Embodiment 8, wherein the width d2 of the first non-conductive channel 4 is equal to the width d1 of the second non-conductive channel 3.
- Embodiment 10 A touch display device comprising the transparent conductive film of the present invention.
- the transparent conductive film of the invention has a simple structure, and by such a T-shaped structure design, the groove aspect ratio at the intersection of the mesh is increased, so that the conductive material can be fully incorporated into the mesh groove. It can greatly improve the yield, stability and antistatic performance of the process and reduce costs.
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Abstract
一种透明导电膜及电容触控传感器及触控显示装置,所述透明导电膜包括网格结构(6),所述网格结构(6)包括多个凹槽单元(8),相邻的凹槽单元(8)之间形成交叉结构(5),导电材料(7)填充在凹槽内形成导电网格,所述交叉结构(5)呈T字形。透明导电膜结构简单,通过这种类T字形结构设计,网格交叉点处的槽深宽比提高,从而导电材料(7)可以充分纳入网格凹槽内。能够大幅度提升制程的良率、稳定性及抗静电性能,降低成本。
Description
本申请要求了申请日为2016年10月19日,申请号为201610907776.0,发明名称为“一种透明导电膜及电容触控传感器及触控显示装置”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。
本发明涉及一种透明导电膜,尤其涉及一种透明导电膜及电容触控传感器及触控显示装置。
目前,现有触摸屏的电路设计通常都是按照一定的角度形成的十字交叉结构,交叉点为对应的触控点,这种结构设计在ITO等黄光蚀刻工艺中的应用是非常广泛的。ITO线路是非常均匀的,其走线的宽度,厚度都是非常的一致的。由于metal mesh是按照类似的设计进行设计的,内部由许多交叉的网格代替了ITO中由ITO组成的线路,从而形成metal mesh电路回路,实现导电及触控。
但是由于网格交叉结构,每个网格交叉点都有节点,节点是由线槽交叉形成,其槽体宽度更宽,导致填充时节点的导电物质更容易被刮刀的挖掘效应带出,同时在清洁的时候也容易带出导电材料,因此导致产品的电性良率低,稳定性差,抗静电能力差。
触摸屏在生产中,由于PET等基材很容易带静电的原因,导致生产过程中经常出现导电膜线路被静电击穿。通过分析观察发现,被静电击穿的地方都是线路比较细的地方。静电流流经线路时经过这些比较细的地方由于尖端放电的原因,瞬间电压很大,产生较大的热量,从而将线路烧坏。
Metal mesh这种网格状的填充方式,导致了节点填导电材料较少,因此如果填充的不好,就更容易被静电击穿,导致整个生产流程都存在被击穿的情况。
发明内容
本发明的目的是针对背景技术中的网格设计在一体成型工艺上导致节点深宽比太小,在填充导电材料时导电材料填充不上或者填充不足,从而导致产品工艺良率低,稳定性差,抗静电能力差的问题,而提出的一种新型的网格设计结构。
本发明公开了一种透明导电膜,所述透明导电膜包括网格结构,所述网格结构包括多个凹槽单元,相邻的凹槽单元之间形成交叉结构,导电材料填充在凹槽内形成导电网格,所述交叉结构呈T字形。
优选的,所述网格结构为规则的行列交叉结构,所述网格结构在直角坐标系中,其行/列与X轴/Y轴的夹角为所述为:将所述透明导电膜放置在液晶模组上,点亮液晶模组后对所述透明导电膜进行角度旋转,查看摩尔纹,无摩尔纹产生时的旋转角度即为
优选的,所述发射层和接收层的网格凹槽在直角坐标系中,其行/列与X轴/Y轴的夹角为所述为:将发射层或接收层放置在所需求液晶模组上,点亮液晶模组后对发射层或接收层进行角度旋转,查看摩尔纹;无摩尔纹产生时的旋转角度即为
优选的,同一列网格结构的行宽度为S,网络结构同一行相邻利宽度为L,L=S。优选的,网格结构的线宽为w,网格结构同一行的相邻列宽度为L,网格结构相邻行的对应列彼此错开长度为d,满足2w<d<L。
本发明还公开了一种电容触控传感器,所述触控传感器包括发射层和
接收层,所述发射层和所述接收层至少之一包括本发明公开的透明导电膜。
优选的,所述发射层和所述接收层分别位于两层独立的基材上,或者位于同一基材的两侧。
优选的,所述透明导电膜包含多个导电通道和多个非导电通道,所述多个导电通道与所述多个非导电通道交错排列。
本发明还公开了一种触控显示装置,包括本发明公开的透明导电膜。
本实用新型的有益效果
本发明的透明导电膜结构简单,能够提升制程的电性良率、稳定性、抗静电能力,降低由于静电而产生的不良。因此,不但可以降低成本,同时还可以提升品质。
图1是本发明接收层的T字型设计的宏观结构示意图。
图2是本发明接收层的T字型设计的微观结构示意图,其中d1为第二非导电通道的宽度;
图3是本发明发射层的T字型设计的微观结构示意图,其中d2为第一非导电通道的宽度;
图4是本发明T字型结构填充导电材料之后的纵切面图,其中w为非节点处的凹槽结构的线宽。
图5是本发明T字型设计的微观结构示意图,其中d为T字型网格结构相邻行的对应列彼此错开长度,L为T字型网格结构同一行的相邻列宽度。
图6为T字型结构的单元结构,其中L为T字型网格结构同一行的相邻列宽度,S为T字型网格结构的行宽度。
图8为T字型填充后的产品结构示意图。
下面结合实施例对本发明作进一步说明,但本发明的保护范围不限于此:
结合图1-图8,实施例1:一种透明导电膜,所述透明导电膜包括网格结构6,所述网格结构6包括多个凹槽单元8,相邻的凹槽单元8之间形成交叉结构5,导电材料7(优选的,由纯银、银铜组合物、纯铜或镍等材料制成)填充在凹槽内形成导电网格,所述交叉结构5呈T字形。
结合图6,实施例2:如实施例1所述的一种透明导电膜,同一列网格结构6的行宽度为S,网格结构6同一行的相邻列宽度为L,L=S。
结合图7,实施例3:如实施例1所述的一种透明导电膜,所述网格结构6为规则的行列交叉结构,所述网格结构6在直角坐标系中,其行/列与X轴/Y轴的夹角为所述为:将所述透明导电膜放置在液晶模组上,点亮液晶模组后对所述透明导电膜进行角度旋转,查看摩尔纹,无摩尔纹产生时的旋转角度即为优选的,每旋转1°,查看一次摩尔纹效应。
结合图1、图4和图5,实施例4:如实施例3所述的一种透明导电膜,所述网格结构6(其内填充有导电材料7)的线宽为w,网格结构6同一行的相邻列宽度为L,网格结构6相邻行的对应列彼此错开长度为d,满足2w<d<L。其中:所述行列为方便描述所定义,对导电层进行旋转所得到的其它结构也落入本申请的保护范围。
结合图1-图3,实施例6:一种电容触控传感器,所述触控传感器包括发射层2和接收层1,所述发射层2和所述接收层1至少之一包括本发明所述的透明导电膜。
实施例7:根据实施例6所述的一种电容触控传感器,所述发射层2和所述接收层1分别位于两层独立的基材上,或者位于同一基材的两侧。
结合图2和图3,实施例8:根据实施例6所述的一种电容触控传感器,发射层2包含多个第一导电通道和多个第一非导电通道4,第一导电通道与第一非导电通道4交错排列;接收层1包含多个第二导电通道和多个第二非导电通道3,第二导电通道与第二非导电通道3交错排列。其中:第一导电通道和第二导电通道的网格结构6内填充有导电材料,第一非导电通道4和第二非导电通道3的网格结构6内没有导电材料。
实施例9:如实施例8所述的一种电容触控传感器,第一非导电通道4的宽度d2等于第二非导电通道3的宽度d1。
实施例10:一种触控显示装置,包括本发明所述的透明导电膜。
本发明的透明导电膜结构简单,通过这种类T字形结构设计,网格交叉点处的槽深宽比提高,从而导电材料可以充分纳入网格凹槽内。能够大幅度提升制程的良率、稳定性及抗静电性能,降低成本。
本发明未涉及部分均与现有技术相同或可采用现有技术加以实现。
本文中所描述的具体实施例仅仅是对本发明精神做举例说明。本发明所属技术领域的技术人员可以对所描述的具体实施例做各种各样的修改或补充或采用类似的方式替代,但并不会偏离本发明的精神或者超越所附权利要求书所定义的范围。
Claims (9)
- 一种透明导电膜,所述透明导电膜包括网格结构,所述网格结构包括多个凹槽单元,相邻的凹槽单元之间形成交叉结构,导电材料填充在凹槽内形成导电网格,其特征在于,所述交叉结构呈T字形。
- 根据权利要求2所述的透明导电膜,其特征在于同一列网格结构的行宽度为S,网络结构同一行相邻利宽度为L,L=S。
- 根据权利要求2所述的透明导电膜,其特征在于网格结构的线宽为w,网格结构同一行的相邻列宽度为L,网格结构相邻行的对应列彼此错开长度为d,满足2w<d<L。
- 一种电容触控传感器,所述触控传感器包括发射层和接收层,其特征在于,所述发射层和所述接收层至少之一包括权利要求1-5中任一项所述的透明导电膜。
- 根据权利要求6所述的电容触控传感器,其特征在于,所述发射层和所述接收层分别位于两层独立的基材上,或者位于同一基材的两侧。
- 根据权利要求6所述的电容触控传感器,其特征在于,所述透明导电膜包含多个导电通道和多个非导电通道,所述多个导电通道与所述多个非导电通道交错排列。
- 一种触控显示装置,其特征在于,包括权利要求1-5中任一项所述的透明导电膜。
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