WO2018043709A1 - 加速器、加速器の運転方法および加速器を用いた半導体の製造方法 - Google Patents

加速器、加速器の運転方法および加速器を用いた半導体の製造方法 Download PDF

Info

Publication number
WO2018043709A1
WO2018043709A1 PCT/JP2017/031582 JP2017031582W WO2018043709A1 WO 2018043709 A1 WO2018043709 A1 WO 2018043709A1 JP 2017031582 W JP2017031582 W JP 2017031582W WO 2018043709 A1 WO2018043709 A1 WO 2018043709A1
Authority
WO
WIPO (PCT)
Prior art keywords
output
frequency
unit
charged particle
particle beam
Prior art date
Application number
PCT/JP2017/031582
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
泰介 川崎
浩志 松宮
晴夫 宮寺
宮本　篤
Original Assignee
株式会社東芝
東芝エネルギーシステムズ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社東芝, 東芝エネルギーシステムズ株式会社 filed Critical 株式会社東芝
Priority to JP2018537437A priority Critical patent/JP6649495B2/ja
Publication of WO2018043709A1 publication Critical patent/WO2018043709A1/ja

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H13/00—Magnetic resonance accelerators; Cyclotrons
    • H05H13/04—Synchrotrons
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/14—Vacuum chambers
    • H05H7/18—Cavities; Resonators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H9/00—Linear accelerators

Definitions

  • Embodiments of the present invention relate to an accelerator including a high-frequency cavity.
  • Conventional accelerators have a high-frequency cavity that can change the speed of the incident charged particle beam.
  • a fundamental wave having a predetermined frequency is generated inside a high-frequency cavity using a high-frequency source, and a charged particle beam is caused to enter the inside of the high-frequency cavity at a period of 1 / integer of the frequency of the fundamental wave. The incident is repeated.
  • a higher-order mode having a higher frequency than the fundamental wave frequency used for changing the speed of the charged particle beam may occur.
  • This higher-order mode is generated because the electromagnetic wave generated by the charged particle beam resonates inside the high-frequency cavity. If this higher-order mode coincides with the incident period of the charged particle beam, electromagnetic waves that become noise accumulate inside the high-frequency cavity, causing a problem that the high-frequency cavity generates heat.
  • the embodiment of the present invention has been made in view of such circumstances, and an object thereof is to provide an accelerator technique capable of suppressing heat generation in a high-frequency cavity.
  • An accelerator includes a high-frequency cavity through which a charged particle beam can pass, a high-frequency source that inputs an electromagnetic wave having a fundamental frequency into the high-frequency cavity, a laser output unit that outputs laser light, and the laser light
  • a target unit that generates charged particles by irradiation
  • a beam extraction unit that extracts a charged particle beam by accelerating the charged particles in one direction, and a specific one of the timings corresponding to the period of the fundamental frequency
  • an output control unit that performs control to output the charged particle beam toward the high-frequency cavity at a timing.
  • An accelerator operation method includes a high frequency input step of inputting an electromagnetic wave having a fundamental frequency from a high frequency source to a high frequency cavity, a laser output step of outputting laser light from a laser output unit, and the laser light as a target.
  • an accelerator technology capable of suppressing heat generation in the high-frequency cavity is provided.
  • Reference numeral 1 in FIG. 1 denotes an accelerator for accelerating the charged particle beam B.
  • this accelerator 1 has illustrated the linear accelerator which accelerates the charged particle beam B on a straight line.
  • the accelerator 1 generates a high-frequency cavity 2 through which the charged particle beam B can pass, a high-frequency source 3 that inputs a radio frequency (RF) that is an electromagnetic wave having a fundamental frequency into the high-frequency cavity 2, and a charged particle beam B. And a main control unit 5 that controls the high-frequency source 3 and the beam generator 4.
  • RF radio frequency
  • FIG. 1 a simplified configuration is shown to help understanding, but devices other than these devices may be included in the accelerator 1.
  • the high frequency cavity 2 includes a plurality of cavity chambers 6 each having a shape in which a sphere is flattened. These hollow chambers 6 are arranged side by side along the traveling direction of the charged particle beam B. Further, the central portion of the cavity chamber 6 is penetrated, and a path through which the charged particle beam B can pass is formed linearly.
  • the high frequency incident on the inside of the high frequency cavity 2 is repeatedly reflected according to the internal shape of the cavity chamber 6.
  • a fundamental wave (standing wave) is generated inside the high-frequency cavity 2.
  • a high frequency source 3 is connected to the end of the high frequency cavity 2 via an RF input unit 7.
  • the high frequency source 3 inputs an electromagnetic wave K having a fundamental frequency (high frequency K) into the high frequency cavity 2.
  • the high frequency source 3 includes a high frequency controller 8 that controls the high frequency K input to the high frequency cavity 2.
  • the high frequency control unit 8 includes a frequency setting unit 9 that sets a basic frequency. As will be described later, the frequency setting unit 9 performs a setting for increasing the fundamental frequency in accordance with the rate at which the pulses of the laser light L are selected within a predetermined period.
  • the high frequency cavity 2 receives a high frequency K from the high frequency source 3 to generate a fundamental wave (standing wave) therein.
  • the frequency of the fundamental wave generated inside the high frequency cavity 2 is controlled by the frequency of the high frequency K input from the high frequency source 3.
  • the beam generator 4 repeatedly enters the charged particle beam B into the high frequency cavity 2 with a period of 1 / integer of the frequency of the fundamental wave.
  • the speed of the incident charged particle beam B is accelerated by appropriately changing the timing of incidence of the charged particle beam B with respect to the standing wave of the high frequency cavity 2 or the phase of the high frequency K with respect to the incident timing of the charged particle beam B. You can slow down or slow down.
  • the high-frequency cavity 2 since the high frequency cavity 2 generates heat when a fundamental wave is generated, a metal material having high thermal conductivity and low electrical resistance is suitable.
  • the high-frequency cavity 2 is made of a superconducting material such as a niobium material.
  • the niobium material includes niobium alone, an alloy of niobium and another metal (such as copper).
  • the high-frequency cavity 2 is cooled to a very low temperature (about 2K) by a cooling device (not shown). In this way, the cooled high-frequency cavity 2 is transferred to a superconducting state in which the electric resistance becomes zero as much as possible. By changing the high frequency cavity 2 to the superconducting state, the speed of the charged particle beam B can be changed with high efficiency.
  • the beam generation device 4 accelerates the charged particles generated in the target 11 in one direction, the laser output unit 10 that outputs the laser light L, the target 11 that generates charged particles when irradiated with the laser light L, and the target 11.
  • the extraction electrode 12 for extracting the charged particle beam B, the DC power source 13 connected to the target 11 and the extraction electrode 12, the laser output unit 10 and the target 11 are provided with the laser light L.
  • the light modulation part 14 which can be interrupted
  • the extraction electrode 12 is a beam extraction portion.
  • the laser beam L output from the laser output unit 10 is applied to the target 11. Then, charged particles are generated at the target 11. The generated charged particles are accelerated in one direction by the extraction electrode 12 and become a charged particle beam B and enter the high-frequency cavity 2.
  • the main control unit 5 is connected to the high frequency control unit 8 and the output control unit 15 to control the high frequency source 3 and the beam generator 4.
  • the main control unit 5, the output control unit 15, and the high-frequency control unit 8 have hardware resources such as a processor and a memory, and the CPU executes various programs, so that information processing by software uses the hardware resources. It is comprised with the computer implement
  • the charged particle beam B incident on the high-frequency cavity 2 from the beam generator 4 is a pulse train beam (pulse wave). Further, the output control unit 15 controls the timing of the output of the charged particle beam B by controlling the timing at which the target 11 is irradiated with the laser light L. In the present embodiment, the charged particle beam B is output at a timing corresponding to the period of the fundamental frequency of the fundamental wave generated inside the high frequency cavity 2.
  • the higher order mode (HOM: Higher Order Mode) generated inside the high frequency cavity 2 will be described in detail.
  • the frequency component of the high frequency (fundamental wave) existing inside the high frequency cavity 2 is ideally only the frequency of the high frequency K input from the high frequency source 3.
  • acceleration / deceleration of the charged particle beam B is realized by transferring high-frequency energy stored in the high-frequency cavity 2 between the high-frequency cavity 2 and the charged particle beam B. Therefore, when the charged particle beam B is accelerated or decelerated, the high frequency inside the high frequency cavity 2 is disturbed.
  • a frequency component different from the high frequency K input from the high frequency source 3 may be generated in the high frequency cavity 2.
  • the time change of the current of the pulse train of the charged particle beam B can be regarded as a periodic ⁇ function.
  • This has a frequency component that is an integral multiple of the fundamental frequency when Fourier transform is performed.
  • This is a frequency component of the disturbance that the high frequency stored in the high frequency cavity 2 receives.
  • the only high-frequency frequencies that can resonate inside are the fundamental wave and its integral multiples.
  • the actual internal shape of the high-frequency cavity 2 has a three-dimensional shape, it has various resonance frequencies in addition to the fundamental frequency.
  • the frequency component of the electromagnetic field generated inside the high-frequency cavity 2 is called a higher-order mode.
  • the beam incident on the high-frequency cavity 2 has a frequency that is 1 / integer of the fundamental frequency.
  • the acceleration or deceleration of the charged particle beam B is the transfer of energy with the high-frequency cavity 2. Since this transferred energy has a frequency due to the charged particle beam B, the higher-order mode of the high-frequency cavity 2 may coincide with one of the frequency components of the charged particle beam B.
  • electromagnetic waves that become noise accumulate inside the high-frequency cavity 2 and the high-frequency cavity 2 may generate heat. This heat generation may cause a deformation of the high-frequency cavity 2 and a cause of a superconducting state break (quenching).
  • the charged particle beam B to be accelerated next is disturbed by electromagnetic waves that become noise, and may be adversely affected such as not being normally accelerated or the shape of the charged particle beam B being destroyed.
  • the frequency component of the charged particle beam B is dispersed or attenuated by selecting (randomly thinning out) the pulse train of the charged particle beam B incident on the high frequency cavity 2 at non-constant intervals. Like that. In this way, generation of higher order modes can be suppressed, and heat generation in the high frequency cavity 2 can be suppressed.
  • the beam generator 4 outputs the charged particle beam B toward the high-frequency cavity 2 at a selected specific timing out of a fixed interval corresponding to the period of the fundamental frequency.
  • the pulse train of the charged particle beam B is selected by selecting the pulse train of the laser light L using the light modulator 14. That is, the selection of the laser beam L and the selection of the charged particle beam B are synonymous.
  • the output control unit 15 of the beam generating device 4 has a ratio setting unit 16 that sets a ratio at which a pulse of the laser light L is selected within a predetermined period, and a constant interval period (tuning timing) that is tuned to the period of the fundamental frequency.
  • the tuning unit 17 that outputs the tuning signal U, the signal output unit 18 that outputs the trigger signal G that triggers the laser output unit 10 to output the laser light L, and a random number with a periodic interval that is tuned to the cycle of the fundamental frequency
  • the random number output part 19 which outputs R, and the selection part 20 which outputs the selection signal S which controls the optical modulation part 14 are provided.
  • the optical modulation unit 14 of the first embodiment is configured by an optical switch.
  • An optical switch is a device that can switch light passage (ON) or blocking (OFF).
  • an EO modulator is used as the optical switch.
  • the EO modulator is a device that controls the deflection of light by electrical control and changes the intensity of light by combining an electro-optic crystal and a polarizer.
  • a MEMS optical switch, a mechanical optical switch, or the like may be used as another embodiment.
  • the light modulator 14 switches between passing (ON) and blocking (OFF) of the laser light L traveling toward the target 11.
  • the optical path between the laser output unit 10 and the target 11 may be constituted by an optical fiber or the like. In this manner, the output timing of the charged particle beam B is controlled by controlling the irradiation timing of the laser beam L to the target 11.
  • the signal output unit 18 controls the output of the trigger signal G according to the tuning signal U (tuning timing) output from the tuning unit 17. Furthermore, the selection unit 20 controls the output of the selection signal S according to the tuning signal U output from the tuning unit 17 and the random number R output from the random number output unit 19.
  • the period of the constant interval that is tuned to the period of the fundamental frequency may be the same period as the fundamental frequency or may be a period of an integral number of the fundamental frequency.
  • the output timing of the tuning signal U output from the tuning unit 17 is the same as the period of the fundamental frequency.
  • the period of the fundamental frequency of the high frequency K input from the high frequency source 3 to the high frequency cavity 2 is T1 to T20.
  • the tuning unit 17 of the output control unit 15 outputs the tuning signal U at a timing that coincides with the fundamental frequency periods T1 to T20.
  • the signal output unit 18 outputs a trigger signal G according to the tuning signal U.
  • the pulse train of the laser light L at the time when the laser output unit 10 outputs coincides with the fundamental frequency periods T1 to T20.
  • the tuning signal U is also input to the selection unit 20.
  • the random number R output from the random number output unit 19 is input to the selection unit 20.
  • the random number R is a random (irregular) value of a binary number.
  • a predetermined random number sequence is generated by a random number generator.
  • the random number output unit 19 randomly outputs a numerical value “0” or “1”. A random value in decimal or hexadecimal may be output, and the output value may be converted to “0” or “1” to output a random number sequence.
  • the random number R output from the random number output unit 19 is output corresponding to the tuning signal U (periods T1 to T20 of the fundamental frequency).
  • the selection unit 20 controls the output of the selection signal S according to the tuning signal U and the random number R. Based on the selection signal S, the light modulator 14 controls the passage (ON) and blocking (OFF) of the laser light L. For example, when the tuning signal U is input and the random number R corresponding to the tuning signal U is “0”, the selection unit 20 uses the light modulation unit 14 to block the laser light L. On the other hand, when the random number R corresponding to the tuning signal U is “1”, the selection unit 20 does not block the laser light L using the light modulation unit 14 and allows the laser light L to pass therethrough.
  • the laser beam L blocked by the light modulation unit 14 is not irradiated to the target 11.
  • the laser light L not blocked by the light modulation unit 14 is irradiated onto the target 11 to generate a charged particle beam B, and this charged particle beam B is incident on the high-frequency cavity 2.
  • the irradiation timing of the laser beam L is the irradiation timing of the laser beam L, and the output timing of the charged particle beam B is controlled by the random number R of the random number output unit 19. Since the irradiation timing of the laser light L is determined according to the random number R, the pulse train of the charged particle beam B incident on the high frequency cavity 2 can be selected at non-constant intervals. In this way, since the charged particle beam B is output at non-constant intervals, it is possible to prevent the generation of higher-order modes inside the high-frequency cavity 2.
  • the interval between the irradiation timing of one laser beam L and the irradiation timing of the next laser beam L is not constant, and is appropriately changed according to the random number R. That is, in the present embodiment, the interval between the timing at which one charged particle beam B is output and the timing at which the next charged particle beam B is output can be changed. In this way, the timing at which the repeated charged particle beam B is output is shifted, so that the resonance phenomenon inside the high-frequency cavity 2 can be prevented.
  • the ratio setting unit 16 sets in advance a ratio at which the irradiation timing of the laser light L is selected within a predetermined period.
  • the random number output unit 19 sets the appearance mode of the random number R in accordance with the selection ratio set by the ratio setting unit 16. For example, when 50% of the irradiation timing of the laser light L is selected, the appearance probability of “0” in the random number R output from the random number output unit 19 may be set to 50%. Note that the ratio of selecting the irradiation timing of the laser light L within a predetermined period may be changed as appropriate.
  • the average current (average energy) of the charged particle beam B decreases. Therefore, in order to obtain the target average current, it is necessary to increase the fundamental frequency by an amount that takes into account the proportion selected beforehand.
  • the current component of the pulse train of the charged particle beam B incident on the high-frequency cavity 2 at a specific repetition frequency has a frequency component concentrated on an integral multiple of this frequency. From the Wiener Hinchin's theorem, the spectrum of the modulation received by the charged particle beam B is expressed by the following Equation 1.
  • C (t) is an expected value of the autocorrelation function when the beam current is a signal sequence.
  • the signal sequence P (t) is expressed by the following Equation 2.
  • Equation 3 the expected value of autocorrelation is expressed by Equation 3 below.
  • Equation 4 Equation 4 below.
  • the frequency component becomes smaller than the frequency f0 when the present invention is not applied.
  • the frequency of f1 is 1.3 GHz
  • the frequency of f0 is 650 MHz, which is a half frequency of f1.
  • the frequency components of f0 are 650 MHz, 1.3 GHz, 1.95 GHz, 2.6 GHz, 3.25 GHz, 3.9 GHz, and so on.
  • the frequency components of f1 are 1.3 GHz, 2.6 GHz, 3.9 GHz,.
  • f1 has fewer frequency components than f0. Therefore, by increasing the fundamental frequency f1, the possibility (probability) that a resonance phenomenon occurs inside the high-frequency cavity 2 can be reduced.
  • the output control unit 15 sets the selection rate W of the irradiation timing of the laser light L by the rate setting unit 16 in accordance with the control information C input from the main control unit 5. Further, the ratio setting unit 16 outputs the set selection ratio W to the frequency setting unit 9 of the high frequency control unit 8. The selection ratio is also output to the random number output unit 19. Furthermore, the frequency setting unit 9 sets a basic frequency according to the selection ratio W.
  • the high frequency control unit 8 performs control by outputting a control signal N to the high frequency source 3 based on the set fundamental frequency.
  • the frequency setting unit 9 outputs the frequency information F of the set basic frequency to the ratio setting unit 16. Further, the ratio setting unit 16 outputs the frequency information F to the tuning unit 17 and the random number output unit 19. Then, the tuning unit 17 and the random number output unit 19 output a tuning signal U and a random number R based on the frequency information F.
  • the output control unit 15 can select these timings at random by selecting the irradiation timing of the laser light L based on the random number R output from the random number output unit 19.
  • the frequency setting unit 9 performs setting to increase the fundamental frequency in accordance with the ratio at which the irradiation timing of the laser light L is selected within a predetermined period, so that the average energy of the charged particle beam B output from the high-frequency cavity 2 Can be prevented from being reduced.
  • a pulse of a specific laser beam L can be selected by appropriately blocking the laser beam L output at a constant interval by the light modulator 14. Furthermore, by using the light modulation unit 14, the timing at which the charged particle beam B is output can be selected with a simple configuration.
  • the beam generator 4 may be an electron gun that outputs an electron beam in a beam shape.
  • the target 11 is a photocathode part and the extraction electrode 12 is an anode part. Then, photoelectrons as charged particles are generated by the photoelectric effect generated by irradiating the target 11 (cathode unit) with the laser beam L output from the laser output unit 10. By appropriately selecting the generation timing of the photoelectrons as described above, an electron gun that can suppress the heat generation of the high-frequency cavity 2 can be obtained.
  • the beam generator 4 may be an ion source that outputs positive ions in a beam shape.
  • the target 11 is an ion target part
  • the extraction electrode 12 is a cathode part. Then, positive ions as charged particles are generated by the ablation plasma generated by irradiating the target 11 (ion target unit) with the laser light L output from the laser output unit 10.
  • an ion source that can suppress the heat generation of the high-frequency cavity 2 can be obtained.
  • Step S11 a portion described as “Step S11” is abbreviated as “S11”.
  • the frequency setting unit 9 of the high frequency control unit 8 sets the basic frequency based on the selection ratio W input from the ratio setting unit 16 of the output control unit 15 (S11).
  • the high frequency controller 8 controls the high frequency source 3 to input the high frequency K (electromagnetic wave K) of the fundamental frequency into the high frequency cavity 2 (S12: high frequency input step).
  • the tuning unit 17 and the random number output unit 19 of the output control unit 15 perform tuning timing (period of the basic frequency) for causing the laser light L to enter the high frequency cavity 2 based on the basic frequency set by the frequency setting unit 9. Is acquired (S13).
  • the tuning unit 17 outputs the tuning signal U to the signal output unit 18 at a timing that matches the tuning timing.
  • the signal output unit 18 to which the tuning signal U is input outputs the trigger signal G to the laser output unit 10 at the tuning timing (S14).
  • the laser output unit 10 to which the trigger signal G is input outputs the laser light L at the tuning timing (S15: laser output step).
  • the selection unit 20 acquires a random number R corresponding to the tuning timing from the random number output unit 19 (S16).
  • the selection unit 20 controls the light modulation unit 14 based on the acquired random number R, and selects a pulse of the laser beam L at a specific timing among the tuning timings corresponding to the period of the fundamental frequency (S17: Output control step).
  • charged particles are generated by irradiating the target 11 with the laser beam L at a specific timing (S18: particle generation step).
  • the extraction electrode 12 extracts the charged particle beam B by accelerating the charged particles in one direction, and the charged particle beam B is output from the beam generator 4 (S19: beam extraction step).
  • the charged particle beam B passes through the high-frequency cavity 2 (S20: passage step).
  • an output high-frequency cavity 21 is provided instead of the extraction electrode 12 of the first embodiment.
  • the output high-frequency cavity 21 is a beam extraction portion.
  • the light modulator 14 selects the pulse of the laser light L.
  • the pulse of the laser light L is selected depending on whether or not the trigger signal G is output.
  • the output high-frequency cavity 21 is provided at a position close to the target 11.
  • a high frequency source 23 is connected to an end of the output high frequency cavity 21 via an RF input unit 22.
  • the output high-frequency cavity 21 extracts the charged particle beam B by accelerating the charged particles generated on the target 11 in one direction.
  • the charged particle beam B drawn out by the output high-frequency cavity 21 is incident on the main high-frequency cavity 2.
  • the output high-frequency cavity 21 is controlled by a control signal N output from the output high-frequency controller 24. Further, the ratio setting unit 16 of the output control unit 15A outputs the frequency information F to the tuning unit 17 and the random number output unit 19, and also outputs the frequency information F to the frequency setting unit 25 of the output high-frequency control unit 24.
  • the frequency setting unit 25 sets a fundamental frequency based on the frequency information F. Then, the output high frequency controller 24 inputs the high frequency K from the high frequency source 23 to the high frequency cavity 2 based on the set fundamental frequency.
  • the selection unit 20 of the output control unit 15A of the second embodiment inputs the selection signal S to the signal output unit 18.
  • the signal output unit 18 outputs the trigger signal G at a specific timing according to the selection signal S output from the selection unit 20. That is, the selection unit 20 selects the output timing of the trigger signal G at non-constant intervals. Then, the laser light L is output from the laser output unit 10 at a specific timing of the tuning timing that is a constant interval period that is tuned to the period of the fundamental frequency.
  • the period of the fundamental frequency of the high frequency K input from the high frequency source 3 to the high frequency cavity 2 is T1 to T20.
  • the tuning unit 17 of the output control unit 15A outputs the tuning signal U to the signal output unit 18 and the selection unit 20 at a timing that coincides with the fundamental frequency periods T1 to T20.
  • the random number R output from the random number output unit 19 is output corresponding to the tuning signal U (periods T1 to T20 of the fundamental frequency).
  • the random number R is input to the selection unit 20.
  • the selection unit 20 outputs a selection signal S to the signal output unit 18 according to the tuning signal U and the random number R. For example, when the tuning signal U is input and the random number R corresponding to the tuning signal U is “0”, the selection unit 20 outputs a selection signal S indicating that the trigger signal G is not output to the signal output unit 18. Output to. On the other hand, when the random number R corresponding to the tuning signal U is “1”, the selection signal S for outputting the trigger signal G is output to the signal output unit 18.
  • the signal output unit 18 controls whether the trigger signal G is output according to the tuning signal U input from the tuning unit 17 and the selection signal S input from the selection unit 20.
  • the laser output unit 10 outputs a laser beam L according to the trigger signal G output from the signal output unit 18.
  • the laser beam L output from the laser output unit 10 is irradiated onto the target 11 to generate a charged particle beam B, and the charged particle beam B is incident on the high-frequency cavity 2.
  • the output timing of the laser beam L and the output timing of the charged particle beam B are controlled by the random number R of the random number output unit 19. Since the output timing of the laser beam L is determined according to the random number R, the pulse train of the charged particle beam B incident on the high frequency cavity 2 can be selected at non-constant intervals. In this way, since the charged particle beam B is output at non-constant intervals, it is possible to prevent the generation of higher-order modes inside the high-frequency cavity 2.
  • the timing at which the charged particle beam B is output can be selected with a simple configuration.
  • the beam generator 4A of the second embodiment may be an electron gun having the target 11 as a photocathode part or an ion source having the target 11 as an ion target part.
  • the frequency setting unit 9 of the high frequency control unit 8 sets the basic frequency based on the selection ratio W input from the ratio setting unit 16 of the output control unit 15A (S21).
  • the high frequency control unit 8 controls the high frequency source 3 to input the high frequency K (electromagnetic wave K) of the fundamental frequency into the high frequency cavity 2 (S22: high frequency input step).
  • the tuning unit 17 and the random number output unit 19 of the output control unit 15A have tuning timing (period of the basic frequency) for causing the laser light L to enter the high frequency cavity 2 based on the basic frequency set by the frequency setting unit 9. Is acquired (S23).
  • the selection unit 20 acquires a random number R corresponding to the tuning timing from the random number output unit 19 (S24). Then, the selection unit 20 outputs a selection signal S to the signal output unit 18 in accordance with the tuning signal U and the random number R.
  • the signal output unit 18 selects a pulse of the trigger signal G at a specific timing among the tuning timings corresponding to the period of the fundamental frequency based on the selection signal S input from the selection unit 20 (S25: Output control step).
  • the signal output unit 18 outputs the trigger signal G to the laser output unit 10 at a specific timing (S26).
  • the laser output unit 10 to which the trigger signal G is input outputs the laser light L at a specific timing (S27: laser output step).
  • charged particles are generated by irradiating the target 11 with the laser beam L at a specific timing (S28: Particle generation step).
  • the output high-frequency cavity 21 extracts the charged particle beam B by accelerating the charged particles in one direction, and the charged particle beam B is output from the beam generator 4A (S29: beam extraction step).
  • the charged particle beam B passes through the high frequency cavity 2 (S30: passage step).
  • the configuration applied in any one of the embodiments may be applied to other embodiments, or each embodiment.
  • the configurations applied in may be combined.
  • the extraction electrode 12 of the first embodiment may be applied to the beam generator 4A of the second embodiment
  • the output high-frequency cavity 21 of the second embodiment is applied to the beam generator 4 of the first embodiment. You may do it.
  • a linear accelerator is illustrated as an accelerator to which the present invention is applied.
  • the present invention may be applied to a circular accelerator such as a cyclotron or a synchrotron.
  • a circular accelerator such as a cyclotron or a synchrotron.
  • a circular accelerator is an accelerator that uses this to accelerate charged particles while drawing a circular start-up.
  • the accelerator 1 (1A) of the present embodiment can be used for a semiconductor manufacturing apparatus (an ion implantation apparatus for manufacturing a semiconductor).
  • the semiconductor manufacturing method using the accelerator of the present embodiment includes an irradiation step of irradiating a predetermined substrate (semiconductor) with the charged particle beam B after the above-described passing step of S20 or S30.
  • the substrate By irradiating the substrate with the charged particle beam B (ions) that has passed through the high-frequency cavity 2, the ions are implanted into the substrate.
  • an element such as boron, phosphorus or arsenic is ionized, and the ions are accelerated by an accelerator and implanted into a substrate such as silicon, gallium arsenide, silicon carbide, or a polysilicon thin film on the surface of a glass plate.
  • a substrate such as silicon, gallium arsenide, silicon carbide, or a polysilicon thin film on the surface of a glass plate.
  • the accelerator 1 (1A) of the present embodiment can be used in a semiconductor manufacturing apparatus (semiconductor manufacturing lithography).
  • the charged particle beam B (electrons) is irradiated with a predetermined undulator (N poles and S poles alternately arranged) after the passing step of S20 or S30 described above.
  • a predetermined undulator N poles and S poles alternately arranged
  • a lithography step for performing lithography of the semiconductor circuit with the generated light.
  • a high-power light can be generated from the charged particle beam B (electrons) with a high current that has passed through the high-frequency cavity 2.
  • the light generation by the undulator can freely select the wavelength. Therefore, EUV (Extreme Ultraviolet Lithography) lithography using a shorter wavelength light, for example, 13.5 nm extreme ultraviolet light can be performed, and a semiconductor circuit having a finer circuit line width can be manufactured. Become.
  • the output control unit that performs control to output the charged particle beam toward the high-frequency cavity at a specific timing corresponding to the period of the fundamental frequency, heat generation of the high-frequency cavity is achieved. Can be suppressed.
  • DESCRIPTION OF SYMBOLS 1 (1A) ... Accelerator, 2 ... High frequency cavity, 3 ... High frequency source, 4 (4A) ... Beam generator, 5 ... Main control part, 6 ... Cavity room, 7 ... RF input part, 8 ... High frequency control part, 9 DESCRIPTION OF SYMBOLS ... Frequency setting part, 10 ... Laser output part, 11 ... Target part, 12 ... Extraction electrode, 13 ... DC power supply, 14 ... Light modulation part, 15 (15A) ... Output control part, 16 ... Ratio setting part, 17 ... Tuning , 18 ... signal output unit, 19 ... random number output unit, 20 ... selection unit, 21 ... high frequency cavity for output, 22 ... RF input unit, 23 ... high frequency source, 24 ... high frequency control unit for output, 25 ... frequency setting unit .

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
PCT/JP2017/031582 2016-09-02 2017-09-01 加速器、加速器の運転方法および加速器を用いた半導体の製造方法 WO2018043709A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2018537437A JP6649495B2 (ja) 2016-09-02 2017-09-01 加速器、加速器の運転方法および加速器を用いた半導体の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-171452 2016-09-02
JP2016171452 2016-09-02

Publications (1)

Publication Number Publication Date
WO2018043709A1 true WO2018043709A1 (ja) 2018-03-08

Family

ID=61301053

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/031582 WO2018043709A1 (ja) 2016-09-02 2017-09-01 加速器、加速器の運転方法および加速器を用いた半導体の製造方法

Country Status (3)

Country Link
JP (1) JP6649495B2 (zh)
TW (1) TW201826648A (zh)
WO (1) WO2018043709A1 (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019206967A1 (en) 2018-04-25 2019-10-31 Adam S.A. A variable-energy proton linear accelerator system and a method of operating a proton beam suitable for irradiating tissue
JP2021018989A (ja) * 2019-07-16 2021-02-15 清華大学Ｔｓｉｎｇｈｕａ Ｕｎｉｖｅｒｓｉｔｙ マルチ線源加速器及び検査方法
US11406847B2 (en) 2018-04-25 2022-08-09 Adam S.A. Proton linear accelerator system for irradiating tissue with two or more RF sources

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0676990A (ja) * 1992-08-25 1994-03-18 Hamamatsu Photonics Kk 光制御加速器システム
JPH11176595A (ja) * 1997-12-08 1999-07-02 Mitsubishi Heavy Ind Ltd 電子加速装置
JP2005228489A (ja) * 2004-02-10 2005-08-25 Japan Atom Energy Res Inst 大強度狭帯域の軌道放射光を同時に複数のビームラインで利用可能にする方法
JP2008243375A (ja) * 2007-03-23 2008-10-09 Ihi Corp 荷電粒子ビーム減速装置および方法とこれを用いたｘ線発生装置
WO2012043475A1 (ja) * 2010-09-27 2012-04-05 大学共同利用機関法人高エネルギー加速器研究機構 光陰極高周波電子銃空洞装置
JP2014164855A (ja) * 2013-02-22 2014-09-08 Toshiba Corp イオン加速装置及び医療用装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5294293B2 (ja) * 2006-07-10 2013-09-18 株式会社 エックスネット 電子線照射装置
JP5409428B2 (ja) * 2009-03-31 2014-02-05 株式会社日立製作所 荷電粒子照射システム及び照射計画装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0676990A (ja) * 1992-08-25 1994-03-18 Hamamatsu Photonics Kk 光制御加速器システム
JPH11176595A (ja) * 1997-12-08 1999-07-02 Mitsubishi Heavy Ind Ltd 電子加速装置
JP2005228489A (ja) * 2004-02-10 2005-08-25 Japan Atom Energy Res Inst 大強度狭帯域の軌道放射光を同時に複数のビームラインで利用可能にする方法
JP2008243375A (ja) * 2007-03-23 2008-10-09 Ihi Corp 荷電粒子ビーム減速装置および方法とこれを用いたｘ線発生装置
WO2012043475A1 (ja) * 2010-09-27 2012-04-05 大学共同利用機関法人高エネルギー加速器研究機構 光陰極高周波電子銃空洞装置
JP2014164855A (ja) * 2013-02-22 2014-09-08 Toshiba Corp イオン加速装置及び医療用装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019206967A1 (en) 2018-04-25 2019-10-31 Adam S.A. A variable-energy proton linear accelerator system and a method of operating a proton beam suitable for irradiating tissue
CN110393864A (zh) * 2018-04-25 2019-11-01 先进肿瘤治疗公开有限公司 可变能量质子直线加速器系统和质子束的操作方法
US20210243878A1 (en) * 2018-04-25 2021-08-05 Adam S.A. A variable-energy proton linear accelerator system and a method of operating a proton beam suitable for irradiating tissue
US11406847B2 (en) 2018-04-25 2022-08-09 Adam S.A. Proton linear accelerator system for irradiating tissue with two or more RF sources
JP2021018989A (ja) * 2019-07-16 2021-02-15 清華大学Ｔｓｉｎｇｈｕａ Ｕｎｉｖｅｒｓｉｔｙ マルチ線源加速器及び検査方法
JP7038167B2 (ja) 2019-07-16 2022-03-17 清華大学 マルチ線源加速器及び検査方法

Also Published As

Publication number Publication date
JP6649495B2 (ja) 2020-02-19
TW201826648A (zh) 2018-07-16
JPWO2018043709A1 (ja) 2019-06-24

Similar Documents

Publication Publication Date Title
Bacal et al. Negative hydrogen ion production mechanisms
EP2452545B1 (en) Interleaving multi-energy x-ray energy operation of a standing wave linear accelerator using electronic switches
US9053833B2 (en) DC high-voltage super-radiant free-electron based EUV source
TWI673575B (zh) 輻射源
WO2018043709A1 (ja) 加速器、加速器の運転方法および加速器を用いた半導体の製造方法
Khan Free-electron lasers
Fan et al. Experimental demonstration of a tunable load-limited magnetically insulated transmission line oscillator
KR20020003802A (ko) 광자 발생기
RU2010127452A (ru) Способ генерации тормозного излучения с поимпульсным переключением энергии и источник излучения для его осуществления
Chen Excitation of large amplitude plasma waves
JP2005228489A (ja) 大強度狭帯域の軌道放射光を同時に複数のビームラインで利用可能にする方法
Loza et al. Increase in the average radiation power of a plasma relativistic microwave generator
JP4756283B2 (ja) 電子ビーム発生装置、ｘ線発生装置及びｘ線利用装置
Liu et al. Design of a C-Band High-Efficiency Multi-Beam Klystron
RU2760284C1 (ru) Источник рентгеновского излучения с циклотронным авторезонансом
DK2339899T3 (en) Compact source of generation of charged particles
Illy et al. Investigation on misalignment tolerances of 240-GHz DEMO gyrotrons
US12002646B2 (en) Ion generation device, ion generation method, and ion generation program
US8989334B2 (en) Aneutronic magnetron energy generator
RU2625458C1 (ru) Релятивистский СВЧ-генератор
US20210383996A1 (en) Ion generation device, ion generation method, and ion generation program
Wright et al. Design and construction of a table top microwave free electron maser for industrial applications
JP2001052896A (ja) 粒子加速・蓄積装置
Militsyn et al. First lasing of the Dutch fusion-FEM in the long-pulse configuration
NL2017991A (en) Apparatus and Method for Producing a Beam of Electron Bunches

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17846712

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2018537437

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17846712

Country of ref document: EP

Kind code of ref document: A1