WO2018036301A1 - 触控屏、显示装置及触控屏的制备方法 - Google Patents

触控屏、显示装置及触控屏的制备方法 Download PDF

Info

Publication number
WO2018036301A1
WO2018036301A1 PCT/CN2017/092972 CN2017092972W WO2018036301A1 WO 2018036301 A1 WO2018036301 A1 WO 2018036301A1 CN 2017092972 W CN2017092972 W CN 2017092972W WO 2018036301 A1 WO2018036301 A1 WO 2018036301A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
ground line
electrode layer
touch
layer
Prior art date
Application number
PCT/CN2017/092972
Other languages
English (en)
French (fr)
Inventor
徐佳伟
张雷
郭总杰
王庆浦
贺晓悦
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司, 合肥鑫晟光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/742,774 priority Critical patent/US10429975B2/en
Publication of WO2018036301A1 publication Critical patent/WO2018036301A1/zh
Priority to US16/547,848 priority patent/US10915193B2/en

Links

Images

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • Embodiments of the present disclosure relate to a touch screen, a display device, and a method of fabricating the touch screen.
  • the touch screen is an external input device with more and more applications. It can realize input through the touch of a finger, making the human-computer interaction process more direct, simple, fast, and humanized.
  • Embodiments of the present disclosure provide a touch screen, a display device, and a method of manufacturing the touch screen.
  • a touch screen includes: a first electrode layer and a second electrode layer configured to be touch-sensed, located at the first electrode layer and the second An insulating layer between the electrode layers;
  • the first ground line or the second ground line is electrically connected to the ground end; and the insulating layer is provided with a ground via, and the first ground line and the second ground line pass through the ground line The holes are electrically connected.
  • the touch screen includes a display area and a black matrix area surrounding the display area; the first electrode layer and the second electrode layer are located in the display area; the first ground line and the second ground line Set along the black matrix area.
  • the first electrode layer includes a lateral touch electrode and a vertical touch electrode; and the second electrode layer includes an electrode configured to realize a crossover design of the lateral touch electrode and the vertical touch electrode at the intersection. Bridge point.
  • the touch screen further includes a metal trace disposed on a side of the insulating layer facing the first electrode layer and configured to electrically connect the lateral touch electrode and the vertical touch electrode to the driving chip.
  • the first ground line is disposed in the same layer as the metal trace, and the material of the first ground line is the same as the material of the metal trace.
  • the second ground line is disposed in the same layer as the second electrode layer, and the material of the second ground line is the same as the material of the second electrode layer.
  • the material of the first electrode layer is ITO; the material of the second electrode layer is ITO.
  • the first electrode layer includes the lateral touch electrode; and the second electrode layer includes the vertical touch electrode.
  • the material of the first ground line is the same as the material of the first electrode layer, and the first ground line is disposed in the same layer as the first electrode layer.
  • the material of the second ground line is the same as the material of the second electrode layer, and the second ground line is disposed in the same layer as the second electrode layer.
  • a display device including any of the touch screens.
  • a method for preparing a touch screen including:
  • the insulating layer is provided with a ground via
  • a second electrode layer and a second ground line are formed on the insulating layer.
  • the first ground line or the second ground line is electrically connected to the ground end; the first ground line and the second ground line are electrically connected through a ground via of the insulating layer.
  • the substrate includes a display area and a black matrix area surrounding the display area; the first electrode layer and the second electrode layer are formed in the display area; the first ground line and the first The two ground lines are formed in the black matrix area.
  • the first electrode layer includes a lateral touch electrode and a vertical touch electrode; and the second electrode layer includes an electrode bridge for achieving a crossover design of the lateral touch electrode and the vertical touch electrode at the intersection.
  • the preparation method further includes: depositing a transparent electrode layer on the substrate, forming a pattern of the lateral touch electrode and the vertical touch electrode by a patterning process; and depositing gold on the substrate.
  • the genus layer forms a pattern of the first ground line and the metal trace by a patterning process.
  • the metal trace electrically connects the lateral touch electrode and the vertical touch electrode to the driving chip.
  • the method further includes depositing a transparent electrode layer on the insulating layer, and forming a pattern of the electrode bridge point and the second ground line by a patterning process.
  • the second electrode layer includes a lateral touch electrode and a vertical touch electrode; and the first electrode layer includes an electrode bridge for realizing a crossover design of the lateral touch electrode and the vertical touch electrode at the intersection.
  • the preparation method further includes depositing a transparent electrode layer on the substrate, and forming a pattern of the electrode bridge point and the first ground line by a patterning process.
  • the method further includes: depositing a transparent electrode layer on the insulating layer, forming a pattern of the lateral touch electrode and the vertical touch electrode by a patterning process; depositing a metal layer on the insulating layer, by patterning The process forms a pattern of the second ground and metal traces.
  • the metal trace electrically connects the lateral touch electrode and the vertical touch electrode to the driving chip.
  • the first electrode layer includes a lateral touch electrode; and the second electrode layer includes a vertical touch electrode.
  • the preparation method further includes depositing a first electrode layer on the substrate, and forming a pattern of the lateral touch electrode and the first ground line by a patterning process.
  • the preparation method further includes depositing a second electrode layer on the insulating layer, and forming a pattern of the vertical touch electrode and the second ground line by a patterning process.
  • FIG. 1 is a schematic structural diagram of a touch screen according to an embodiment of the present disclosure
  • FIG. 2 is a schematic structural diagram of a partial cut surface of a touch screen according to an embodiment of the present disclosure
  • FIG. 3 is a schematic structural diagram of a partial cut surface of a touch screen according to another embodiment of the present disclosure.
  • FIG. 4 is a schematic structural diagram of a partial cut surface of a touch screen according to another embodiment of the present disclosure.
  • FIG. 5 is a flowchart of a method for preparing a touch screen according to an embodiment of the present disclosure.
  • the inventors have noticed that with the expansion of touch screen applications and the popularity of large-size touch screens, the problem of touch screens being affected by static electricity (ESD) has become more and more prominent.
  • ESD static electricity
  • the structure of the sensing electrode and the metal trace in the touch screen is liable to cause electrostatic induction failure
  • the light-shielding structure of the black matrix region of the touch screen is composed of a resin layer encapsulating carbon, when the metal trace or the sensing electrode channel of the black matrix region generates an electrostatic induction current, the resin layer of the light-shielding structure is easily electrically broken, so that The light-shielding structure forms a conductive path, causing problems such as an electrical edge analog-to-digital converter (ADC) being high and a short circuit between the transmitting electrode and the receiving electrode (Tx&Rx short).
  • ADC electrical edge analog-to-digital converter
  • a touch screen provided by the embodiment of the present disclosure includes a first electrode layer 1 and a second electrode layer 2 for touch sensing, and is located at the first electrode layer 1 and the second electrode.
  • the touch screen further includes a first ground line 4 disposed on a side of the insulating layer 3 facing the first electrode layer 1 and a second ground line 5 disposed on a side of the insulating layer 3 facing the second electrode layer 2.
  • the first ground wire 4 is electrically connected to the ground terminal, and/or the second ground wire 5 is electrically connected to the ground terminal.
  • the insulating layer 3 is provided with a ground via 31, and the first ground 4 and the second ground 5 are electrically connected through the ground via 31.
  • the first ground line 4 and the second ground line 5 are respectively disposed in the structure of the two electrode layers (the first electrode layer 1 and the second electrode layer 2) for performing touch sensing, and the The first ground wire 4 and/or the second ground wire 5 are electrically connected to the ground terminal.
  • the first ground line 4 and the second ground line 5 can function as an electrostatic shield for the two layers of electrode layers to avoid interference of external charges; on the other hand, the first ground line 4 and the second ground The line 5 can discharge the static electricity generated in the above two electrode layers in time to avoid static electricity accumulation and release, resulting in poor touch sensing. Therefore, the above touch screen can avoid the occurrence of defects caused by static electricity (ESD).
  • ESD static electricity
  • the touch screen may include a display area and a black matrix area surrounding the display area.
  • the first electrode layer 1 and the second electrode layer 2 are located in the display region.
  • the first ground line 4 and the second ground line 5 described above are disposed along the black matrix area.
  • the first ground line 4 and the second ground line 5 described above may be strip-like structures extending along the black matrix region.
  • the first ground line 4 and the second ground line 5 extend along the black matrix region, that is, the first ground line 4 and the second ground line 5 are surrounded by the first electrode layer 1 and the second electrode layer 2, so that the first ground The line 4 and the second ground line 5 can form a significant effective shielding effect on the first electrode layer 1 and the second electrode layer 2, in such a manner that external charges can be effectively avoided for the first electrode layer 1 and the second electrode layer 2
  • the first ground line 4 and the second ground line 5 can discharge the static electricity generated around the first electrode layer 1 and the second electrode layer 2 in time, effectively avoiding static electricity accumulation, thereby effectively preventing static electricity.
  • the touch sensing failure caused by the release is poor; in addition, the first ground line 4 and the second ground line 5 are disposed along the black matrix region, and therefore, it is not easy to make a short contact with the first electrode layer 1 and the second electrode layer 2, and It has the effect of blocking the display area.
  • the touch screen may be an OGS (One glass solution) structure.
  • the first electrode layer 1 may include a horizontal touch electrode 11 .
  • the vertical touch electrode 12; the second electrode layer 2 may include an electrode bridge 21 for implementing the lateral touch electrode 11 and the vertical touch electrode 12 at the intersection.
  • the electrode bridge 12 can be a bridge structure for connecting the vertical touch electrodes 12 at the intersection.
  • the materials of the first electrode layer 1 and the second electrode layer 2 are all transparent electrode materials, for example, the first electrode layer 1 and the second electrode layer. 2 are all indium tin oxide (ITO) materials.
  • ITO indium tin oxide
  • the touch screen may further include a side of the insulating layer 3 facing the first electrode layer 1 for driving the lateral touch electrode 11 and the vertical touch electrode 12 with the driving chip. 7 electrically connected metal traces 6.
  • the first ground line 4 may be disposed in the same layer as the metal trace 6, and the material of the first ground line 4 may be the same as the material of the metal trace 6.
  • the first ground line 4 and the metal trace 6 can be prepared by the same patterning process, thereby simplifying the manufacturing process of the touch screen.
  • the first ground line 4 can be electrically connected to the driving chip 7 to achieve electrical connection with the ground.
  • the second ground line 5 may be disposed in the same layer as the second electrode layer 2, and the material of the second ground line 5 may also be the same as the material of the second electrode layer 2.
  • the second ground line 5 and the second electrode layer 2 can be prepared by the same patterning process, thereby simplifying the manufacturing process of the touch screen.
  • Embodiment 2 as shown in FIG. 4, in the touch screen of this embodiment,
  • the first electrode layer 1 may include a lateral touch electrode 11;
  • the second electrode layer 2 may include a vertical touch electrode 12.
  • the touch screen may be a metal mesh structure.
  • the materials of the first electrode layer 1 and the second electrode layer 2 are all metal, and the lateral touch electrodes 11 and the vertical touch electrodes 12 are metal mesh electrodes.
  • the material of the first ground line 4 may be the same as the material of the first electrode layer 1, and the first ground line 4 may be disposed in the same layer as the first electrode layer 1.
  • the first ground line 4 and the first electrode layer 1 can be prepared by the same patterning process, thereby simplifying the manufacturing process of the touch screen.
  • the material of the second ground line 5 may be the same as the material of the second electrode layer 2, and the second ground line 5 may be disposed in the same layer as the second electrode layer 2.
  • the second ground line 5 and the second electrode layer 2 can be prepared by the same patterning process, thereby simplifying the manufacturing process of the touch screen.
  • the materials of the first electrode layer 1 and the second electrode layer 2 may both be transparent electrode materials.
  • the lateral touch electrodes 11 and the vertical touch electrodes 12 may both be ITO electrodes.
  • the material of the first ground wire 4 may be the same as the metal trace material of the lateral touch electrode 11 and disposed in the same layer.
  • the material of the second ground wire 5 may be the same as the metal trace material of the vertical touch electrode and disposed in the same layer.
  • the horizontal touch electrodes 11 may be the emitter electrodes, and the vertical touch electrodes 12 may be the sensing electrodes; or the lateral touch electrodes 11 may be inductive.
  • the electrode, the vertical touch electrode 12 is an emitter electrode.
  • An embodiment of the present disclosure further provides a display device including the touch screen in any of the above embodiments.
  • the touch screen in the display device in the embodiment of the present disclosure can avoid the occurrence of defects caused by static electricity (ESD). Therefore, the display device in the embodiment of the present disclosure has better touch sensing performance and higher reliability.
  • the embodiment of the present disclosure further provides a method for preparing a touch screen. As shown in FIG. 5 and in conjunction with FIG. 1 to FIG. 4, the method for preparing the touch screen includes the following steps:
  • Step S101 forming a first electrode layer 1 and a first ground line 4 on the substrate 10;
  • Step S102 forming an insulating layer 3 on the first electrode layer 1 and the first ground line 4, the insulating layer 3 is provided with a ground via 31;
  • step S103 the second electrode layer 2 and the second ground line 5 are formed on the insulating layer 3.
  • the first ground wire 4 is electrically connected to the ground terminal; or the second ground wire 4 is electrically connected to the ground terminal;
  • the first ground line 4 and the second ground line 5 are electrically connected through the ground via 31 of the insulating layer 3.
  • the first ground line 4 and the second ground are respectively disposed in the two electrode layers (the first electrode layer 1 and the second electrode layer 2) for performing touch sensing.
  • Line 5, and the first ground line 4 and the second ground line 5 are both electrically connected to the ground end; in this way, on the one hand, the first ground line 4 and the second ground line 5 can be used for the two layers of the electrode layer
  • the first ground wire 4 and the second ground wire 5 can discharge the static electricity generated in the above two electrode layers in time to avoid static electricity accumulation and release This leads to poor touch sensing. Therefore, the above touch screen can avoid the occurrence of defects caused by static electricity (ESD).
  • ESD static electricity
  • the touch screen may include a display area and a black matrix area surrounding the display area; the first electrode layer 1 and the second electrode layer 2 are located in the display area; the first ground line 4 is And the second ground line 5 is disposed along the black matrix area.
  • the first ground line 4 and the second ground line 5 described above may be strip-like structures extending along the black matrix region.
  • the first ground line 4 and the second ground line 5 extend along the black matrix region, that is, the first ground line 4 and the second ground line 5 surround the first electrode layer 1 and the second electrode layer 2, in this manner,
  • the first ground line 4 and the second ground line 5 can form a significant effective shielding effect on the first electrode layer 1 and the second electrode layer 2, and can effectively avoid external charges on the first electrode layer 1 and the second electrode layer 2
  • the first ground line 4 and the second ground line 5 can discharge the static electricity generated around the first electrode layer 1 and the second electrode layer 2 in time, effectively avoiding static electricity accumulation, thereby effectively preventing static electricity.
  • the touch sensing failure caused by the release is unsatisfactory; in addition, the first ground line 4 and the second ground line 5 are disposed along the black matrix region, so that it is not easily short-circuited with the first electrode layer 1 and the second electrode layer 2, and It has the effect of blocking the display area.
  • the first electrode layer 1 includes a lateral touch electrode 11 and a vertical touch electrode 12; the second electrode layer is formed in the touch screen prepared by the preparation method of the embodiment.
  • FIG. 1 and FIG. 2 includes an electrode bridge 21 for implementing a lateral touch electrode 11 and a vertical touch electrode 12 at the intersection.
  • the electrode bridge 12 can be a bridge structure that is mounted at the intersection and is used to connect the vertical touch electrodes 12.
  • FIG. 1 , FIG. 2 and FIG. 5 in an example, in a method for preparing a touch screen,
  • Step S101 that is, the step of forming the first electrode layer 1 and the first ground line 4 on the substrate 10, for example, may include:
  • a transparent electrode layer such as an ITO layer
  • a metal layer is deposited on the substrate 10, and a pattern of the first ground line 4 and the metal trace 6 is formed by a patterning process.
  • the metal traces 6 electrically connect the lateral touch electrodes 11 and the vertical touch electrodes 12 to the driving chip 7, respectively.
  • the first ground line 4 is electrically connected to the driving chip 7, thereby achieving electrical connection with the ground.
  • Step S102 that is, the step of forming the second electrode layer 2 and the second ground line 5 on the insulating layer 10, for example, may include:
  • a transparent electrode layer such as an ITO layer, is deposited on the insulating layer 3, and a pattern of the electrode bridge 21 and the second ground line 5 is formed by a patterning process.
  • the first ground line 4 and the metal traces 6 of the sensing electrodes are prepared by the same patterning process, and the second ground line 5 is prepared. It is prepared by the same patterning process as the second electrode layer 2. In this way, the preparation process of the first ground line 4 and the second ground line 5 does not require an additional process step, and therefore, the manufacturing process of the touch screen preparation method is simple.
  • the second electrode layer 2 includes a lateral touch electrode 11 and a vertical touch electrode 12;
  • the first electrode layer 1 includes an electrode bridge 21 for implementing a lateral touch electrode 11 and a vertical touch electrode 12 at the intersection.
  • Step S101 that is, the step of forming the first electrode layer 1 and the first ground line 4 on the substrate 10, for example, may include:
  • a transparent electrode layer such as an ITO layer, is deposited on the substrate 10, and a pattern of the electrode bridge 21 and the first ground line 4 is formed by a patterning process.
  • Step S102 that is, the step of forming the second electrode layer 2 and the second ground line 5 on the insulating layer 3, for example, may include:
  • a transparent electrode layer such as an ITO layer
  • a metal layer is deposited on the insulating layer 3, and a pattern of the second ground line 5 and the metal trace 6 is formed by a patterning process.
  • the metal trace 6 electrically connects the lateral touch electrode 11 and the vertical touch electrode 12 to the driving chip 7.
  • the second ground line 5 is electrically connected to the driving chip 7, thereby achieving electrical connection with the ground.
  • the transparent electrode layer is patterned to form the patterns of the lateral touch electrodes 11 and the vertical touch electrodes 12, and the lap portions 13 on the ground vias 31 of the insulating layer 3 may be simultaneously formed.
  • the lap portion 13 is electrically connected to the first ground line 4 through the ground via 31. In this way, an electrical connection to the first ground 4 can be achieved by connecting the second ground 5 on the insulating layer 3 to the lap 13.
  • the first ground line 4 and the first electrode layer 1 are prepared by the same patterning process, and the second ground line 5 and the sensing electrodes (the lateral touch electrodes 11 and the vertical touch electrodes 12)
  • the metal traces 6 are prepared by the same patterning process. Therefore, the preparation process of the first ground line 4 and the second ground line 5 does not require additional process steps, and further, the manufacturing process of the touch screen preparation method is simplified. .
  • the first electrode layer 1 includes a lateral touch electrode 11; and the second electrode layer 2 includes a vertical touch electrode. 12.
  • Step S101 that is, the step of forming the first electrode layer 1 and the first ground line 4 on the substrate 10, for example, may include:
  • the electrode layer is deposited on the substrate 10, and a pattern of the lateral touch electrode 11 and the first ground line 4 is formed by a patterning process.
  • the electrode layer can be a metal layer.
  • the lateral touch electrode 11 is a metal mesh electrode.
  • the electrode layer may also be a transparent electrode layer.
  • the lateral touch electrode 11 may be an ITO electrode.
  • Step S102 that is, the step of forming the second electrode layer 2 and the second ground line 5 on the insulating layer 3, for example, may include:
  • the electrode layer is deposited on the insulating layer 3, and a pattern of the vertical touch electrode 12 and the second ground line 5 is formed by a patterning process.
  • the electrode layer can be a metal layer.
  • the vertical touch electrode 12 is metal Mesh electrode.
  • the electrode layer may be a transparent electrode layer.
  • the vertical touch electrode 12 can be an ITO electrode.
  • the above embodiment is only an example of the method for preparing the touch screen of the embodiment of the present disclosure, and the method for preparing the touch screen of the embodiment of the present disclosure is not limited to the above embodiment.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Position Input By Displaying (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种触控屏、显示装置及触控屏的制备方法。所述触控屏包括：用于触控感应的第一电极层（1）和第二电极层（2）；位于所述第一电极层（1）和所述第二电极层（2）之间的绝缘层（3）；设置于所述绝缘层（3）朝向所述第一电极层（1）一侧的第一地线（4）；以及设置于所述绝缘层（3）朝向所述第二电极层（2）一侧的第二地线（5）。所述第一地线（4）或所述第二地线（5）与接地端电连接。所述绝缘层（3）设有地线过孔（31），所述第一地线（4）与所述第二地线（5）通过所述地线过孔（31）电连接。

Description

触控屏、显示装置及触控屏的制备方法
相关申请的交叉引用
本申请要求于2016年08月25日向SIPO提交的名称为“触控屏、显示装置及触控屏的制备方法”的中国专利申请No.201610725053.9的优先权，其全文通过引用合并于本文。
技术领域
本公开的实施例涉及一种触控屏、显示装置及触控屏的制备方法。
背景技术
触控屏是一种应用越来越广泛的外部输入设备，其通过手指轻触即可以实现输入，使人机交互过程更为直接，具有简单、快捷、人性化等特点。
公开内容
本公开的实施例提供了一种触控屏、显示装置及触控屏的制备方法。
根据本公开的至少一个实施例，提供一种触控屏，该触控屏包括：配置来触控感应的第一电极层和第二电极层、位于所述第一电极层和所述第二电极层之间的绝缘层；
设置于所述绝缘层朝向所述第一电极层一侧的第一地线，
设置于所述绝缘层朝向所述第二电极层一侧的第二地线；其中，
所述第一地线或所述第二地线与接地端电连接；以及所述绝缘层设有地线过孔，所述第一地线与所述第二地线通过所述地线过孔电连接。
例如，所述触控屏包括显示区域和包围所述显示区域的黑矩阵区域；所述第一电极层和第二电极层位于所述显示区域内；所述第一地线和第二地线沿黑矩阵区域设置。
例如，所述第一电极层包括横向触控电极和纵向触控电极；所述第二电极层包括配置来实现横向触控电极和纵向触控电极在交叉处跨接设计的电极 桥点。
例如，所述触控屏还包括设置于所述绝缘层朝向所述第一电极层一侧并且配置来将所述横向触控电极和所述纵向触控电极与驱动芯片电连接的金属走线；所述第一地线与所述金属走线同层设置，所述第一地线的材料与所述金属走线的材料相同。
例如，所述第二地线与所述第二电极层同层设置，以及所述第二地线的材料与所述第二电极层的材料相同。
例如，所述第一电极层的材料为ITO；所述第二电极层的材料为ITO。
例如，所述第一电极层包括所述横向触控电极；所述第二电极层包括所述纵向触控电极。
例如，所述第一地线的材料与所述第一电极层的材料相同、且所述第一地线与所述第一电极层同层设置。
例如，所述第二地线的材料与所述第二电极层的材料相同、且所述第二地线与所述第二电极层同层设置。
根据本公开的实施例，还提供一种显示装置，包括任一所述触控屏。
根据本公开的实施例，还提供一种触控屏的制备方法，包括：
在基板上形成第一电极层和第一地线；
在所述第一电极层和所述第一地线上形成绝缘层，所述绝缘层设有地线过孔；
在所述绝缘层上形成第二电极层和第二地线。
所述第一地线或所述第二地线与接地端电连接；所述第一地线与所述第二地线通过所述绝缘层的地线过孔电连接。
例如，所述基板包括显示区域和包围所述显示区域的黑矩阵区域；所述第一电极层和所述第二电极层形成于所述显示区域内；所述第一地线和所述第二地线形成于黑矩阵区域。
例如，所述第一电极层包括横向触控电极和纵向触控电极；所述第二电极层包括用于实现横向触控电极和纵向触控电极在交叉处跨接设计的电极桥点。所述制备方法还包括：在所述基板上沉积透明电极层，通过构图工艺形成所述横向触控电极和所述纵向触控电极的图形；以及在所述基板上沉积金 属层，通过构图工艺形成所述第一地线和金属走线的图形。所述金属走线将所述横向触控电极以及所述纵向触控电极与驱动芯片电连接。所述方法还包括：在所述绝缘层上沉积透明电极层，通过构图工艺形成所述电极桥点和第二地线的图形。
例如，所述第二电极层包括横向触控电极和纵向触控电极；所述第一电极层包括用于实现横向触控电极和纵向触控电极在交叉处跨接设计的电极桥点。所述制备方法还包括：在所述基板上沉积透明电极层，通过构图工艺形成所述电极桥点和第一地线的图形。所述制备方法还包括：在所述绝缘层上沉积透明电极层，通过构图工艺形成所述横向触控电极和所述纵向触控电极的图形；在所述绝缘层上沉积金属层，通过构图工艺形成所述第二地线和金属走线的图形。所述金属走线将所述横向触控电极以及纵向触控电极与驱动芯片电连接。
例如，所述第一电极层包括横向触控电极；所述第二电极层包括纵向触控电极。所述制备方法还包括：在所述基板上沉积第一电极层，通过构图工艺形成所述横向触控电极和第一地线的图形。所述制备方法还包括：在所述绝缘层上沉积第二电极层，通过构图工艺形成所述纵向触控电极和第二地线的图形。
附图说明
以下将结合附图对本公开的实施例进行更详细的说明，以使本领域普通技术人员更加清楚地理解本公开的实施例，其中：
图1为本公开的一实施例提供的一种触控屏的结构示意图；
图2为本公开的一实施例提供的一种触控屏的部分切面结构示意图；
图3为本公开的另一实施例提供的一种触控屏的部分切面结构示意图；
图4为本公开的另一实施例提供的一种触控屏的部分切面结构示意图；
图5为本公开的一实施例提供的一种触控屏的制备方法流程图。
具体实施方式
下面将结合本公开实施例中的附图，对本公开实施例中的技术方案进行 清楚、完整地描述，显然，所描述的实施例仅仅是本公开的一部分实施例，而不是全部的实施例。基于本公开中的实施例，本领域普通技术人员在无需做出创造性劳动前提下所获得的所有其他实施例，都应属于本公开保护的范围。
发明人注意到，随着触控屏应用领域的扩展以及大尺寸触控屏的普及，触控屏受静电(ESD)影响的问题越来越凸显。例如，由于目前的触控屏对于制程中感应静电的产生以及静电积聚的释放，均没有有效的防护机制，使得触控屏中的感应电极和金属走线等结构很容易产生静电感应不良；并且，由于目前触控屏黑矩阵区域的遮光结构由树脂层包裹碳组成，因此，当黑矩阵区域的金属走线或者感应电极通道产生静电感应电流时，很容易造成遮光结构的树脂层电击穿，使得遮光结构形成导电通道，造成电测边缘模数转换器(ADC)偏高以及发射电极与接收电极短路(Tx&Rx short)等问题。
如图1～图4所示，本公开实施例提供的一种触控屏，包括用于触控感应的第一电极层1和第二电极层2、位于第一电极层1和第二电极层2之间的绝缘层3。触控屏还包括：设置于绝缘层3朝向第一电极层1一侧的第一地线4，设置于绝缘层3朝向第二电极层2一侧的第二地线5。第一地线4与接地端电连接，和/或，第二地线5与接地端电连接。绝缘层3设有地线过孔31，第一地线4与第二地线5通过地线过孔31电连接。
上述触控屏中，在用于进行触控感应的两层电极层(第一电极层1和第二电极层2)结构中分别设置了第一地线4和第二地线5，且该第一地线4和/或第二地线5与接地端电连接。一方面，该第一地线4和第二地线5可以对上述两层电极层起到静电屏蔽的作用、以避免外部电荷的干扰；另一方面，该第一地线4和第二地线5可以将上述两层电极层中产生的静电及时地导出，以避免静电积累和释放而导致触控感应不良。因此，上述触控屏可以避免受静电(ESD)影响产生不良。
如图1所示，在一示例的实施例中，触控屏可以包括显示区域和包围显示区域的黑矩阵区域。上述第一电极层1和第二电极层2位于显示区域内。上述第一地线4和第二地线5沿黑矩阵区域设置。例如，上述第一地线4和第二地线5可以为沿黑矩阵区域延伸的条状结构。
第一地线4和第二地线5沿黑矩阵区域延伸，即第一地线4和第二地线5对第一电极层1和第二电极层2呈包围状，使得该第一地线4和第二地线5可以对第一电极层1和第二电极层2形成显著有效地屏蔽作用，以此方式可以有效地避免外部电荷对第一电极层1和第二电极层2的干扰；而且，该第一地线4和第二地线5可以及时地将第一电极层1和第二电极层2周边产生的静电导出，有效地避免静电积累，从而，可以有效地避免静电释放导致的触控感应不良；另外，第一地线4和第二地线5沿黑矩阵区域设置，因此，不容易与第一电极层1和第二电极层2发生接触短路，也不会对显示区域产生遮光等影响。
实施例一，如图1和图2所示，触控屏可以为OGS(One glass solution)结构，例如，在本实施例的触控屏中，第一电极层1可以包括横向触控电极11和纵向触控电极12；第二电极层2可以包括用于实现横向触控电极11和纵向触控电极12在交叉处跨接设计的电极桥点21。如图1所示，该电极桥点12可以为架设在交叉处、用于连接纵向触控电极12的桥接结构。
如图1和图2所示，在一示例中，触控屏中，第一电极层1和第二电极层2的材料都为透明电极材料，例如，第一电极层1和第二电极层2都为氧化铟锡(ITO)材料。
如图1和图2所示，在一示例中触控屏还可以包括设置于绝缘层3朝向第一电极层1一侧、用于将横向触控电极11和纵向触控电极12与驱动芯片7电连接的金属走线6。
如图2所示，例如，第一地线4可以与该金属走线6同层设置，且第一地线4的材料可以与该金属走线6的材料相同。第一地线4与金属走线6可以通过同一次构图工艺制备，从而可以简化触控屏的制作工艺。
如图1所示，例如，第一地线4可以与驱动芯片7电连接，以实现与接地端的电连接。
如图2所示，在一示例中，第二地线5可以与第二电极层2同层设置，且第二地线5的材料也可以与第二电极层2的材料相同。第二地线5与第二电极层2可以通过同一次构图工艺制备，从而可以简化触控屏的制作工艺。
实施例二，如图4所示，本实施例的触控屏中，
第一电极层1可以包括横向触控电极11；
第二电极层2可以包括纵向触控电极12。
如图4所示，在一示例中，触控屏可以为金属网状触控(metal mesh)结构。例如，第一电极层1和第二电极层2的材料都为金属，横向触控电极11和纵向触控电极12为金属网状电极。
如图4所示，在一示例中，第一地线4的材料可以与第一电极层1的材料相同、且第一地线4可以与第一电极层1同层设置。第一地线4与第一电极层1可以通过同一次构图工艺制备，从而可以简化触控屏的制作工艺。
例如，第二地线5的材料可以与第二电极层2的材料相同、且第二地线5可以与第二电极层2同层设置。第二地线5与第二电极层2可以通过同一次构图工艺制备，从而可以简化触控屏的制作工艺。
如图4所示，另一示例中，第一电极层1和第二电极层2的材料可以都为透明电极材料。例如，横向触控电极11和纵向触控电极12可以都为ITO电极。
如图4所示，在一示例中，第一地线4的材料可以与横向触控电极11的金属走线材料相同且同层设置。第二地线5的材料可以与竖向触控电极的金属走线材料相同且同层设置。
例如，上述各实施例中的横向触控电极11和纵向触控电极12中，可以是横向触控电极11为发射电极、纵向触控电极12为感应电极；或者，横向触控电极11为感应电极，纵向触控电极12为发射电极。
本公开的实施例还提供了一种显示装置，该显示装置包括上述任一实施例中的触控屏。本公开实施例中的显示装置中的触控屏可以避免受静电(ESD)影响产生不良，因此，本公开实施例中的显示装置的触控感应性能较好，可靠性较高。
本公开实施例还提供了一种触控屏的制备方法，如图5并结合图1～图4所示，该触控屏的制备方法包括以下步骤：
步骤S101，在基板10上形成第一电极层1和第一地线4；
步骤S102，在第一电极层1和第一地线4上形成绝缘层3，该绝缘层3设有地线过孔31；以及
步骤S103，在绝缘层3上形成第二电极层2和第二地线5。
第一地线4与接地端电连接；或者，第二地线4与接地端电连接；
第一地线4与第二地线5通过绝缘层3的地线过孔31电连接。
通过上述制备方法制备形成的触控屏中，用于进行触控感应的两层电极层(第一电极层1和第二电极层2)结构中分别设置了第一地线4和第二地线5，且该第一地线4和第二地线5都与接地端电连接；以此方式，一方面，该第一地线4和第二地线5可以对上述两层电极层起到静电屏蔽的作用、以避免外部电荷的干扰；另一方面，该第一地线4和第二地线5可以将上述两层电极层中产生的静电及时地导出，以避免静电积累和释放而导致触控感应不良。因此，上述触控屏可以避免受静电(ESD)影响产生不良。
参考图1所示，在一示例中，触控屏可以包括显示区域和包围显示区域的黑矩阵区域；上述第一电极层1和第二电极层2位于显示区域内；上述第一地线4和第二地线5沿黑矩阵区域设置。例如，上述第一地线4和第二地线5可以为沿黑矩阵区域延伸的条状结构。
第一地线4和第二地线5沿黑矩阵区域延伸，即第一地线4和第二地线5对第一电极层1和第二电极层2呈包围状，以此方式，该第一地线4和第二地线5可以对第一电极层1和第二电极层2形成显著有效地屏蔽作用，可以有效地避免外部电荷对第一电极层1和第二电极层2的干扰；而且，该第一地线4和第二地线5可以及时地将第一电极层1和第二电极层2周边产生的静电导出，有效地避免静电积累，从而，可以有效地避免静电释放导致的触控感应不良；另外，第一地线4和第二地线5沿黑矩阵区域设置，则其不容易与第一电极层1和第二电极层2发生接触短路，而且不会对显示区域产生遮光等影响。
实施例一，参考图1和图2所示，本实施例的制备方法所制备形成的触控屏中，第一电极层1包括横向触控电极11和纵向触控电极12；第二电极层2包括用于实现横向触控电极11和纵向触控电极12在交叉处跨接设计的电极桥点21。如图1所示，该电极桥点12可以为架设在交叉处并且用于连接纵向触控电极12的桥接结构。
如图1、图2和图5所示，在一示例中，触控屏的制备方法中，
步骤S101，即在基板10上形成第一电极层1和第一地线4的步骤，例如，可以包括：
在基板10上沉积透明电极层，如ITO层，通过构图工艺形成横向触控电极11和纵向触控电极12的图形；
在基板10上沉积金属层，通过构图工艺形成第一地线4和金属走线6的图形。金属走线6分别将横向触控电极11以及纵向触控电极12与驱动芯片7电连接。
例如，第一地线4与驱动芯片7电连接，进而实现与接地端的电连接。
步骤S102，即在绝缘层10上形成第二电极层2和第二地线5的步骤，例如，可以包括：
在绝缘层3上沉积透明电极层，如ITO层，通过构图工艺形成电极桥点21和第二地线5的图形。
本实施例的触控屏的制备方法中，第一地线4与感应电极(横向触控电极11和纵向触控电极12)的金属走线6通过同一次构图工艺制备，第二地线5与第二电极层2通过同一次构图工艺制备。以此方式，第一地线4和第二地线5的制备过程无需增加额外的工艺步骤，因此，该触控屏制备方法的制作工艺得以简单。
实施例二，参考图1和图3所示，本实施例的制备方法所制备形成的触控屏中，第二电极层2包括横向触控电极11和纵向触控电极12；第一电极层1包括用于实现横向触控电极11和纵向触控电极12在交叉处跨接设计的电极桥点21。
如图1、图3和图5所示，在一示例中，本实施例的触控屏的制备方法中，
步骤S101，即在基板10上形成第一电极层1和第一地线4的步骤，例如，可以包括：
在基板10上沉积透明电极层，如ITO层，通过构图工艺形成电极桥点21和第一地线4的图形。
步骤S102，即在绝缘层3上形成第二电极层2和第二地线5的步骤，例如，可以包括：
在绝缘层3上沉积透明电极层，如ITO层，通过构图工艺形成横向触控 电极11和纵向触控电极12的图形；
在绝缘层3上沉积金属层，通过构图工艺形成第二地线5和金属走线6的图形。金属走线6将横向触控电极11以及纵向触控电极12与驱动芯片7电连接。
例如，第二地线5与驱动芯片7电连接，进而实现与接地端的电连接。
例如，如图3所示，对透明电极层进行构图形成横向触控电极11和纵向触控电极12图形的过程，也可以同时形成位于绝缘层3的地线过孔31上的搭接部13。该搭接部13通过地线过孔31与第一地线4电连接。以此方式，通过位于绝缘层3上的第二地线5与该搭接部13相连可以实现与第一地线4的电连接。
本实施例的触控屏的制备方法中，第一地线4与第一电极层1通过同一次构图工艺制备，第二地线5与感应电极(横向触控电极11和纵向触控电极12)的金属走线6通过同一次构图工艺制备，因此，第一地线4和第二地线5的制备过程无需增加额外的工艺步骤，进而，该触控屏制备方法的制作工艺的以简化。
实施例三，如图4和图5所示，本实施例的制备方法所制备形成的触控屏中，第一电极层1包括横向触控电极11；第二电极层2包括纵向触控电极12。
如图4和图5所示，在一示例中，触控屏的制备方法中，
步骤S101，即在基板10上形成第一电极层1和第一地线4的步骤，例如，可以包括：
在基板10上沉积电极层，通过构图工艺形成横向触控电极11和第一地线4的图形。例如，该电极层可以为金属层。例如，横向触控电极11为金属网状电极。另外，该电极层也可以为透明电极层。例如，横向触控电极11可以为ITO电极。
步骤S102，即在绝缘层3上形成第二电极层2和第二地线5的步骤，例如，可以包括：
在绝缘层3上沉积电极层，通过构图工艺形成纵向触控电极12和第二地线5的图形。例如，该电极层可以为金属层。例如，竖向触控电极12为金属 网状电极。另外，该电极层可以为透明电极层。例如，竖向触控电极12可以为ITO电极。
需要说明的是，上述实施例只是对本公开实施例的触控屏制备方法的举例说明，本公开的实施例的触控屏的制备方法并不限于上述实施例。
以上所述，仅为本公开的示例性实施例，但本公开的保护范围并不局限于此，任何熟悉本技术领域的普通技术人员在本公开揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本公开的保护范围之内。

Claims (15)

  1. 一种触控屏，包括：
    配置来触控感应的第一电极层和第二电极层、位于所述第一电极层和所述第二电极层之间的绝缘层；
    设置于所述绝缘层朝向所述第一电极层一侧的第一地线，
    设置于所述绝缘层朝向所述第二电极层一侧的第二地线；其中，
    所述第一地线或者所述第二地线与接地端电连接；以及所述绝缘层设有地线过孔，所述第一地线与所述第二地线通过所述地线过孔电连接。
  2. 根据权利要求1所述的触控屏，还包括：显示区域和包围所述显示区域的黑矩阵区域；
    所述第一电极层和所述第二电极层位于所述显示区域内；
    所述第一地线和所述第二地线沿所述黑矩阵区域设置。
  3. 根据权利要求1或2所述的触控屏，其中，
    所述第一电极层包括横向触控电极和纵向触控电极；以及
    所述第二电极层包括配置来实现所述横向触控电极和所述纵向触控电极在交叉处跨接设计的电极桥点。
  4. 根据权利要求3所述的触控屏，还包括：设置于所述绝缘层朝向第一电极层一侧并且配置来将所述横向触控电极和所述纵向触控电极与驱动芯片电连接的金属走线；
    其中所述第一地线与所述金属走线同层设置，所述第一地线的材料与所述金属走线的材料相同。
  5. 根据权利要求3或4所述的触控屏，其中，所述第二地线与所述第二电极层同层设置，以及所述第二地线的材料与所述第二电极层的材料相同。
  6. 根据权利要求1～4任一项所述的触控屏，其中，所述第一电极层的材料为氧化铟锡；以及所述第二电极层的材料为氧化铟锡。
  7. 根据权利要求2所述的触控屏，其中，
    所述第一电极层包括横向触控电极；以及
    所述第二电极层包括纵向触控电极。
  8. 根据权利要求7所述的触控屏，其中，所述第一地线的材料与所述第一电极层的材料相同、且所述第一地线与所述第一电极层同层设置。
  9. 根据权利要求7或8所述的触控屏，其中，所述第二地线的材料与所述第二电极层的材料相同、且所述第二地线与所述第二电极层同层设置。
  10. 一种显示装置，包括权利要求1～9任一项所述的触控屏。
  11. 一种触控屏的制备方法，包括：
    在基板上形成第一电极层和第一地线；
    在所述第一电极层和所述第一地线上形成绝缘层，所述绝缘层设有地线过孔；以及
    在所述绝缘层上形成第二电极层和第二地线；其中，
    所述第一地线或所述第二地线与接地端电连接；以及所述第一地线与所述第二地线通过所述绝缘层的地线过孔电连接。
  12. 根据权利要求11所述的触控屏的制备方法，其中，所述基板包括显示区域和包围所述显示区域的黑矩阵区域；
    所述第一电极层和第二电极层形成于所述显示区域内；以及
    所述第一地线和第二地线形成于所述黑矩阵区域。
  13. 根据权利要求12所述的触控屏的制备方法，其中，所述第一电极层包括横向触控电极和纵向触控电极；所述第二电极层包括用于实现所述横向触控电极和所述纵向触控电极在交叉处跨接设计的电极桥点；
    所述制备方法还包括：
    在所述基板上沉积透明电极层，通过构图工艺形成所述横向触控电极和所述纵向触控电极的图形；
    在所述基板上沉积金属层，通过构图工艺形成所述第一地线和金属走线的图形，其中，所述金属走线将所述横向触控电极以及所述纵向触控电极与驱动芯片电连接；以及
    在所述绝缘层上沉积透明电极层，通过构图工艺形成所述电极桥点和第二地线的图形。
  14. 根据权利要求12所述的触控屏的制备方法，其中，所述第二电极层 包括横向触控电极和纵向触控电极；所述第一电极层包括用于实现横向触控电极和纵向触控电极在交叉处跨接设计的电极桥点；
    所述制备方法还包括：
    在所述基板上沉积透明电极层，通过构图工艺形成所述电极桥点和第一地线的图形；以及
    在所述绝缘层上沉积透明电极层，通过构图工艺形成所述横向触控电极和所述纵向触控电极的图形；以及
    在所述绝缘层上沉积金属层，通过构图工艺形成所述第二地线和金属走线的图形，其中，所述金属走线将所述横向触控电极以及纵向触控电极与驱动芯片电连接。
  15. 根据权利要求12所述的触控屏的制备方法，其中，所述第一电极层包括横向触控电极，以及所述第二电极层包括纵向触控电极；
    所述制备方法还包括：
    在所述基板上沉积第一电极层，通过构图工艺形成所述横向触控电极和第一地线的图形；以及
    在所述绝缘层上沉积第二电极层，通过构图工艺形成所述纵向触控电极和第二地线的图形。
PCT/CN2017/092972 2016-08-25 2017-07-14 触控屏、显示装置及触控屏的制备方法 WO2018036301A1 (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US15/742,774 US10429975B2 (en) 2016-08-25 2017-07-14 Touch panel, display device and manufacturing method of touch panel
US16/547,848 US10915193B2 (en) 2016-08-25 2019-08-22 Touch panel, display device and manufacturing method of touch panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201610725053.9 2016-08-25
CN201610725053.9A CN106325601B (zh) 2016-08-25 2016-08-25 触控屏、显示装置及触控屏的制备方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US15/742,774 A-371-Of-International US10429975B2 (en) 2016-08-25 2017-07-14 Touch panel, display device and manufacturing method of touch panel
US16/547,848 Continuation-In-Part US10915193B2 (en) 2016-08-25 2019-08-22 Touch panel, display device and manufacturing method of touch panel

Publications (1)

Publication Number Publication Date
WO2018036301A1 true WO2018036301A1 (zh) 2018-03-01

Family

ID=57791654

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/092972 WO2018036301A1 (zh) 2016-08-25 2017-07-14 触控屏、显示装置及触控屏的制备方法

Country Status (3)

Country Link
US (1) US10429975B2 (zh)
CN (1) CN106325601B (zh)
WO (1) WO2018036301A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10915193B2 (en) 2016-08-25 2021-02-09 Hefei Xinsheng Optoelectronics Technology Co., Ltd. Touch panel, display device and manufacturing method of touch panel
CN106325601B (zh) * 2016-08-25 2023-11-28 合肥鑫晟光电科技有限公司 触控屏、显示装置及触控屏的制备方法
US10606388B2 (en) 2017-09-30 2020-03-31 Wuhan China Star Optoelectronics Technology Co., Ltd. Array substrate, manufacturing method thereof and touch display panel
CN107589576B (zh) * 2017-09-30 2020-11-06 武汉华星光电技术有限公司 阵列基板及其制作方法、触控显示面板
CN107992236A (zh) * 2018-01-19 2018-05-04 昆山国显光电有限公司 触控屏及其制备方法及触控显示装置
CN108508665A (zh) * 2018-03-29 2018-09-07 武汉华星光电技术有限公司 阵列基板及液晶显示面板
CN108874236B (zh) * 2018-08-29 2020-11-24 武汉华星光电技术有限公司 触控面板及显示触控装置
CN112445360B (zh) * 2019-08-30 2024-01-23 京东方科技集团股份有限公司 触摸屏及显示装置
CN112817469A (zh) 2019-11-15 2021-05-18 京东方科技集团股份有限公司 触控基板及其制作方法、触控显示基板以及触控显示装置
CN111367426B (zh) * 2019-12-24 2023-10-20 重庆莱宝科技有限公司 一种触控屏与触控显示屏

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103677461A (zh) * 2012-09-11 2014-03-26 乐金显示有限公司 用于显示装置的触摸屏面板
US20140368755A1 (en) * 2013-06-13 2014-12-18 Wintek Corporation Touch panel
CN104391389A (zh) * 2014-12-01 2015-03-04 厦门天马微电子有限公司 一种基板及显示面板、显示装置
CN204270269U (zh) * 2014-12-02 2015-04-15 昆山国显光电有限公司 触控面板以及触控式显示面板
CN105824461A (zh) * 2016-03-10 2016-08-03 京东方科技集团股份有限公司 一种触控装置及触控显示装置
CN106325601A (zh) * 2016-08-25 2017-01-11 合肥鑫晟光电科技有限公司 触控屏、显示装置及触控屏的制备方法
CN206133506U (zh) * 2016-08-25 2017-04-26 合肥鑫晟光电科技有限公司 一种触控屏及显示装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102446012B (zh) * 2010-09-30 2015-04-08 联胜（中国）科技有限公司 电容式触控面板结构及触控显示面板
CN103186287B (zh) * 2013-03-28 2015-12-23 合肥京东方光电科技有限公司 一种触控显示屏及触控显示装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103677461A (zh) * 2012-09-11 2014-03-26 乐金显示有限公司 用于显示装置的触摸屏面板
US20140368755A1 (en) * 2013-06-13 2014-12-18 Wintek Corporation Touch panel
CN104391389A (zh) * 2014-12-01 2015-03-04 厦门天马微电子有限公司 一种基板及显示面板、显示装置
CN204270269U (zh) * 2014-12-02 2015-04-15 昆山国显光电有限公司 触控面板以及触控式显示面板
CN105824461A (zh) * 2016-03-10 2016-08-03 京东方科技集团股份有限公司 一种触控装置及触控显示装置
CN106325601A (zh) * 2016-08-25 2017-01-11 合肥鑫晟光电科技有限公司 触控屏、显示装置及触控屏的制备方法
CN206133506U (zh) * 2016-08-25 2017-04-26 合肥鑫晟光电科技有限公司 一种触控屏及显示装置

Also Published As

Publication number Publication date
US10429975B2 (en) 2019-10-01
CN106325601B (zh) 2023-11-28
CN106325601A (zh) 2017-01-11
US20180373369A1 (en) 2018-12-27

Similar Documents

Publication Publication Date Title
WO2018036301A1 (zh) 触控屏、显示装置及触控屏的制备方法
WO2018099174A1 (zh) 触摸屏及其制作方法、触控显示装置
EP3229111B1 (en) Touch substrate, touch panel and display device
TWI652607B (zh) 觸控面板及應用其的觸控顯示裝置
WO2018099404A1 (zh) 触控基板及其制备方法、触控显示装置
CN106020562B (zh) 一种触控屏及其制作方法、外挂式触摸屏
TWM429930U (en) Touch panel
TW201508568A (zh) 觸控顯示裝置
TWI566153B (zh) 觸控面板及其製作方法與觸控顯示面板
TW201316232A (zh) 觸控裝置及其製造方法
WO2016169367A1 (zh) 触摸基板及其制造方法、显示装置
WO2017004975A1 (zh) 电容触摸屏及其制备方法、触控装置
WO2016065781A1 (zh) 电容触摸屏及其制造方法
WO2018001033A1 (zh) 触控基板及其制作方法、触控屏
US10437398B2 (en) Touch substrate and method for manufacturing the same and touch screen
TW201530381A (zh) 觸控面板
WO2016101581A1 (zh) 触摸屏及其制作方法、及触摸显示装置
US10915193B2 (en) Touch panel, display device and manufacturing method of touch panel
CN110347275A (zh) 一种金属网格结构与触控屏
CN203825591U (zh) 一种触控面板防静电结构
TWI498783B (zh) 觸控面板
CN206133506U (zh) 一种触控屏及显示装置
WO2018126767A1 (zh) 触控面板及其制作方法、显示装置
TWM478870U (zh) 觸控面板
TW201525817A (zh) 觸控面板

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17842724

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 110719)

122 Ep: pct application non-entry in european phase

Ref document number: 17842724

Country of ref document: EP

Kind code of ref document: A1