WO2018000475A1 - 彩膜基板及显示装置 - Google Patents

彩膜基板及显示装置 Download PDF

Info

Publication number
WO2018000475A1
WO2018000475A1 PCT/CN2016/090580 CN2016090580W WO2018000475A1 WO 2018000475 A1 WO2018000475 A1 WO 2018000475A1 CN 2016090580 W CN2016090580 W CN 2016090580W WO 2018000475 A1 WO2018000475 A1 WO 2018000475A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
support layer
color
porous support
size
Prior art date
Application number
PCT/CN2016/090580
Other languages
English (en)
French (fr)
Inventor
潘彪
Original Assignee
武汉华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 武汉华星光电技术有限公司 filed Critical 武汉华星光电技术有限公司
Priority to US15/122,419 priority Critical patent/US10108043B2/en
Publication of WO2018000475A1 publication Critical patent/WO2018000475A1/zh

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a color film substrate and a display device.
  • LCDs liquid crystal displays
  • Various consumer electronic products such as digital assistants, digital cameras, notebook computers, and desktop computers have become mainstream in display devices.
  • liquid crystal displays which include a liquid crystal display panel and a backlight module.
  • the working principle of the liquid crystal display panel is to place liquid crystal molecules in two parallel glass substrates. There are many vertical and horizontal small wires between the two glass substrates, and the liquid crystal molecules are controlled to change direction by energizing or not, and the light of the backlight module is changed. Refracted to produce a picture.
  • a liquid crystal display panel comprises a CF (Color Filter) substrate, a thin film transistor (TFT) substrate, a liquid crystal (LC) sandwiched between the color filter substrate and the thin film transistor substrate, and a sealant frame ( Sealant) composition.
  • CF Color Filter
  • TFT thin film transistor
  • LC liquid crystal
  • Sealant sealant frame
  • a color filter substrate composed of red (R), green (G), and blue (B) color filters is an important component of a TFT-LCD, as shown in FIG.
  • the sheet 200 includes a plurality of red photoresist blocks 210, a plurality of green photoresist blocks 220, and a plurality of blue photoresist blocks 230 separated by a black matrix 300.
  • the display characteristics of the TFT-LCD determine that the color filter 200 should have high transmittance and color purity, large screen, full color, high contrast, low reflectance, high flatness, good tolerance, and the like.
  • methods for preparing color block are pigment dispersion method, dyeing method, reverse printing method, thermal multilayer technique, and inkjet printing method. Because of its advantages in color characteristics, quality, and operability, the pigment dispersion method has been widely used internationally and has become a mainstream production method. The process flow of the pigment dispersion method according to different display modes is different.
  • the color block is prepared by the pigment dispersion method
  • some additives such as a dispersant and a resin to promote the infiltration and dispersion of the pigment. Due to the addition of the dispersant, the proportion of the pigment in the color resist material will be relatively reduced, The powder does not contribute to the filtering, so the thickness of the color film is increased in order to obtain a sufficiently high color purity.
  • the light transmittance of the entire display device is lowered, which in turn increases the power consumption of the panel, which is not conducive to energy saving and environmental protection.
  • Another object of the present invention is to provide a display device comprising the above color film substrate, which has the advantages of wide color gamut, thin thickness, and high brightness.
  • the present invention firstly provides a color filter substrate comprising a base substrate, a black matrix disposed on the base substrate, and a plurality of black matrixes disposed on the base substrate and spaced apart by a black matrix.
  • a color block comprising a porous support layer and a color resist material dispersed in the porous support layer; the color resist material comprises pigment molecules; and the porous support layer is provided with a plurality of pores, the pores The size is larger than the size of the pigment molecules.
  • the porous support layer includes a substrate and a plurality of retaining walls disposed on the substrate, the plurality of retaining walls enclosing a plurality of grooves on the substrate, the plurality of grooves serving as the porous supporting layer a plurality of pores in the size of the grooves being larger than the size of the pigment molecules.
  • the material of the substrate and the plurality of retaining walls is a metal material or an organic material.
  • the shape of the groove is a rectangular parallelepiped, and the groove has a length and a width of 50 to 500 nm and a depth of 100 to 1000 nm, respectively.
  • the porous support layer includes a plurality of graphene layers arranged in a space perpendicular to the substrate substrate, and a plurality of spacer regions between the plurality of graphene layers serve as a plurality of pores in the porous support layer,
  • the size of the spacer region is larger than the size of the pigment molecules.
  • the spacer region has a width of 50 to 500 nm, a length of 50 to 1000 nm, and a height of the graphene layer of 100 to 1000 nm.
  • the porous support layer includes a plurality of carbon nanotubes arranged perpendicular to the base substrate, and the plurality of carbon nanotubes are arranged in a manner of enclosing a plurality of spaced spaces on the base substrate, the plurality of spaced spaces Acting as a plurality of pores in the porous support layer, the spacing space is larger than the size of the pigment molecules.
  • the carbon nanotubes are single-walled carbon nanotubes or multi-walled carbon nanotubes.
  • the shape of the space is a rectangular parallelepiped, and the space has a length and a width of 50 to 500 nm and a height of 100 to 1000 nm, respectively.
  • the invention also provides a display device comprising the above color film substrate.
  • a color film substrate comprising a base substrate, a black matrix disposed on the base substrate, And a plurality of color blocking blocks disposed on the substrate and spaced apart by a black matrix, the color block comprising a porous supporting layer and a color resist material dispersed in the porous supporting layer; the color resist material comprises a pigment a plurality of pores in the porous support layer, the pores having a size larger than a size of the pigment molecules;
  • the porous support layer comprises a substrate and a plurality of retaining walls disposed on the substrate, the plurality of retaining walls enclosing a plurality of grooves on the substrate, the plurality of grooves serving as the porous a plurality of pores in the support layer, the grooves having a size larger than a size of the pigment molecules;
  • the material of the substrate and the plurality of retaining walls is a metal material or an organic material
  • the shape of the groove is a rectangular parallelepiped, and the groove has a length and a width of 50 to 500 nm and a depth of 100 to 1000 nm, respectively.
  • the invention provides a color film substrate, wherein the color block comprises a porous support layer and a color resist material dispersed in the porous support layer, and the porous support layer can effectively realize dispersion and support of pigment molecules. Therefore, the content of the non-pigment component such as the dispersant and the resin in the color resist material is reduced, the content of the pigment component is increased, and the filter capacity of the unit thickness of the color block is increased, which is advantageous for realizing the thinning of the color filter substrate and obtaining Higher pixel density.
  • the invention provides a display device comprising the above color film substrate, which has the advantages of wide color gamut, thin thickness and high brightness.
  • 1 is a schematic structural view of a conventional color filter substrate
  • FIG. 2 is a schematic structural view of a color filter substrate of the present invention
  • FIG. 3 is a top plan view showing a first embodiment of a porous support layer in a color filter substrate of the present invention
  • FIG. 4 is a top plan view showing a second embodiment of a porous support layer in the color filter substrate of the present invention.
  • Figure 5 is a top plan view showing a third embodiment of the porous support layer in the color filter substrate of the present invention.
  • FIG. 6 is a schematic view showing the color gamut of the color film substrate of the present invention and a conventional color film substrate.
  • the present invention provides a color filter substrate, including a substrate 10 , a black matrix 20 disposed on the substrate 10 , and a substrate 10 disposed on the substrate 10 .
  • the porous support layer 40 is provided with a plurality of pores having a size slightly larger than the size of the pigment molecules.
  • the color resist material further includes other components such as a dispersant and a resin, and components such as a dispersant and a resin are used to disperse the pigment.
  • the present invention disperses and supports the color resist material by using the porous support layer 40, so that the pigment molecules can be well dispersed in the plurality of pores of the porous support layer 40, thereby improving the dispersion effect of the pigment molecules and ensuring the same color purity. Then, the content of the non-pigment component such as the dispersant and the resin in the color resist material can be reduced, and the content of the pigment component can be increased, thereby increasing the filter capacity of the unit thickness of the color block 30.
  • the porous support layer 40 absorbs little light and does not change the polarization state of the light.
  • the pigment molecules have a diameter of 30 to 200 nm.
  • the porous support layer 40 of the present invention comprises a substrate 41 and a substrate 41 disposed on the substrate 41. a plurality of retaining walls 42 that enclose a plurality of grooves 43 in the substrate 41, the plurality of grooves 43 serving as a plurality of apertures in the porous support layer 40, the recesses
  • the size of the groove 43 is larger than the size of the pigment molecules.
  • the material of the substrate 41 and the plurality of retaining walls 42 is a metal material or an organic material.
  • the metal material comprises one or more of gold (Au), copper (Cu), and aluminum (Al).
  • the organic material comprises polymethyl methacrylate (PMMA).
  • the substrate 41 and the plurality of retaining walls 42 disposed on the substrate 41 are integrally formed by nanoimprinting.
  • the shape of the groove 43 is a rectangular parallelepiped, the length and width of the groove 43 are 50-500 nm, respectively, and the depth of the groove 43 is 100-1000 nm.
  • the substrate 41 has a thickness of 5 to 20 nm, and by providing the substrate 41 to have a relatively thin thickness, the porous support layer 40 can be ensured to have sufficient light transmittance.
  • the porous support layer 40 is arranged perpendicular to the base substrate 10 and spaced apart. a plurality of graphene layers 45, a plurality of spacer regions 46 between the plurality of graphene layers 45 acting as a plurality of pores in the porous support layer 40, the spacer regions 46 having a size larger than a size of the pigment molecules .
  • the graphene layer 45 may be a single layer of graphene or a plurality of layers of graphene.
  • the single layer graphene has a thickness of about 0.335 nm
  • the multilayer graphene has a thickness of about 0.335 to 3.35 nm.
  • the multilayer graphene layers 45 are arranged on the base substrate 10 in parallel with each other.
  • the spacer region 46 has a width of 50 to 500 nm, a length of 50 to 1000 nm, and the graphene layer 45 has a height of 100 to 1000 nm.
  • the porous support layer 40 includes a plurality of carbons arranged perpendicular to the base substrate 10. a nanotube 47, the plurality of carbon nanotubes 47 are arranged in a manner of enclosing a plurality of spaced spaces 48 on the base substrate 10, the plurality of spaced spaces 48 serving as a plurality of the porous support layers 40
  • the pores have a size that is larger than the size of the pigment molecules.
  • the carbon nanotubes 47 may be single-walled carbon nanotubes or multi-walled carbon nanotubes.
  • the single-walled carbon nanotubes have a diameter of 0.6 to 2 nm, and the multi-walled carbon nanotubes have a diameter of 2 to 100 nm.
  • the shape of the spacing space 48 may be a cylindrical shape, a square cylinder shape, or an irregular cylindrical shape.
  • the shape of the space 48 is a rectangular parallelepiped, and the space 48 has a length and a width of 50 to 500 nm and a height of 100 to 1000 nm, respectively.
  • the plurality of color resist blocks 30 include a plurality of red photoresist blocks, a plurality of green photoresist blocks, and a plurality of blue photoresist blocks.
  • the plurality of color block blocks 30 have the same area.
  • the color filter substrate further includes a flat layer 50 disposed on the black matrix 20 and the plurality of color resist blocks 30.
  • the material of the flat layer 50 is a transparent organic material.
  • the base substrate 10 is a transparent substrate, preferably a glass substrate.
  • the color filter substrate of the present invention adopts a porous support layer 40 for dispersing a color resist material, and the porous support layer 40 is provided with a plurality of pores, the pores having a size slightly larger than the size of the pigment molecules, so that the pigment molecules can be well Dispersed in the porous support layer 40, since the porous support layer 40 can function to disperse pigment molecules, it is equivalent to replacing a part of the dispersant and the resin, thereby reducing non-pigment components such as dispersant and resin in the color resist material.
  • the content of the pigment component in the color resist material is increased, so that the thickness of the color block 30 required to obtain the same color purity will decrease, and the thickness of the black matrix 20 will be reduced while the thickness of the color block 30 is lowered.
  • FIG. 6 is a color film substrate of the present invention and a conventional color film substrate A gamut comparison diagram, as seen in Fig. 6, the color film substrate of the present invention has a wider color gamut than a conventional color film substrate.
  • the present invention further provides a display device comprising the above color film substrate, which has the advantages of wide color gamut, thin thickness, and high brightness.
  • the color film substrate will not be repeatedly described herein.
  • the present invention provides a color film substrate and a display device.
  • the color block comprises a porous support layer and a color resist material dispersed in the porous support layer, and the porous support layer can effectively realize dispersion and support of pigment molecules, thereby reducing dispersant in the color resist material.
  • the content of the non-pigment component such as the resin, the content of the pigment component, and the filter capacity of the unit thickness of the color block are increased, thereby facilitating the thinning of the color filter substrate and obtaining a higher pixel density.
  • the display device of the present invention includes the above-mentioned color film substrate, and has the advantages of wide color gamut, thin thickness, and high brightness.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)

Abstract

一种彩膜基板及显示装置，该彩膜基板包括衬底基板（10）、设于所述衬底基板（10）上的黑色矩阵（20）、以及设于所述衬底基板（10）上且被黑色矩阵（20）间隔开的数个色阻块（30），所述色阻块（30）包括多孔支撑层（40）及分散于多孔支撑层（40）中的色阻材料；所述色阻材料包括颜料分子；所述多孔支撑层（40）中设有多个孔隙，所述孔隙的尺寸略大于所述颜料分子的尺寸，可以实现颜料分子的分散和支撑。该显示装置包括上述彩膜基板，具有色域广、厚度薄、亮度高的优点。

Description

彩膜基板及显示装置 技术领域
本发明涉及显示技术领域，尤其涉及一种彩膜基板及显示装置。
背景技术
随着显示技术的发展，液晶显示器(Liquid Crystal Display，LCD)等平面显示装置因具有高画质、省电、机身薄及应用范围广等优点，而被广泛的应用于手机、电视、个人数字助理、数字相机、笔记本电脑、台式计算机等各种消费性电子产品，成为显示装置中的主流。
现有市场上的液晶显示器大部分为背光型液晶显示器，其包括液晶显示面板及背光模组(backlight module)。液晶显示面板的工作原理是在两片平行的玻璃基板当中放置液晶分子，两片玻璃基板中间有许多垂直和水平的细小电线，通过通电与否来控制液晶分子改变方向，将背光模组的光线折射出来产生画面。
通常液晶显示面板由彩膜(CF，Color Filter)基板、薄膜晶体管(TFT，Thin Film Transistor)基板、夹于彩膜基板与薄膜晶体管基板之间的液晶(LC，Liquid Crystal)及密封胶框(Sealant)组成。
由红(R)、绿(G)、蓝(B)三种颜色的彩色滤光片所组成的彩膜基板是TFT-LCD的重要组成部分，如图1所示，现有的彩膜基板通常包括衬底基板100、设于所述衬底基板100上的彩色滤光片200与黑色矩阵300、及设于所述黑色矩阵300上的数个间隔物400，其中，所述彩色滤光片200包括被黑色矩阵300间隔开的数个红色光阻块210、数个绿色光阻块220、及数个蓝色光阻块230。TFT-LCD的显示特性决定了彩色滤光片200应具备高透过率和色纯度、大画面、全色彩、高对比度、低反射率、高平整度、良好的耐受性等品质及性能。
目前，制备色阻块时采用的方法有颜料分散法、染色法、反转印刷法、热多层技术、及喷墨打印法等。因在颜色特性、质量、及可操作度等方面均占有优势，颜料分散法被国际上广泛使用，成为主流制作方式，依据不同显示模式颜料分散法的工艺流程有所区别。
但是在采用颜料分散法制备色阻块时，色阻材料中除添加对滤光起到作用的颜料之外，还需要添加一些分散剂和树脂等附属物来促进颜料的浸润和分散。由于分散剂的加入，色阻材料中颜料的比例会相对地降低，分 散剂对于滤光没有贡献，因此为了获得足够高的色纯度就要提高彩膜的厚度。而彩膜厚度的增加除了会带来成本的增加之外，还会使整个显示装置的光透过率降低，进而会带来面板功耗的增加，不利于节能环保。
发明内容
本发明的目的在于提供一种彩膜基板，与传统的彩膜基板相比，厚度较薄，同时具有较高的色纯度、光透过率、及像素密度。
本发明的目的还在于提供一种显示装置，含有上述彩膜基板，具有色域广、厚度薄、及亮度高等优点。
为实现上述目的，本发明首先提供一种彩膜基板，包括衬底基板、设于所述衬底基板上的黑色矩阵、以及设于所述衬底基板上且被黑色矩阵间隔开的数个色阻块，所述色阻块包括多孔支撑层及分散于多孔支撑层中的色阻材料；所述色阻材料包括颜料分子；所述多孔支撑层中设有多个孔隙，所述孔隙的尺寸大于所述颜料分子的尺寸。
所述多孔支撑层包括基底及设于所述基底上的数道挡墙，所述数道挡墙在所述基底上围出数个凹槽，所述数个凹槽充当所述多孔支撑层中的多个孔隙，所述凹槽的尺寸大于所述颜料分子的尺寸。
所述基底及数道挡墙的材料为金属材料或有机材料。
所述凹槽的形状为长方体，所述凹槽的长度和宽度分别为50～500nm，深度为100～1000nm。
所述多孔支撑层包括垂直于衬底基板排列且间隔设置的多层石墨烯层，所述多层石墨烯层之间的多个间隔区域充当所述多孔支撑层中的多个孔隙，所述间隔区域的尺寸大于所述颜料分子的尺寸。
所述间隔区域的宽度为50～500nm，长度为50～1000nm，所述石墨烯层的高度为100～1000nm。
所述多孔支撑层包括垂直于衬底基板排列的多根碳纳米管，所述多根碳纳米管按照在所述衬底基板上围出多个间隔空间的方式排列，所述多个间隔空间充当所述多孔支撑层中的多个孔隙，所述间隔空间的尺寸大于所述颜料分子的尺寸。
所述碳纳米管为单壁碳纳米管或者多壁碳纳米管。
所述间隔空间的形状为长方体，所述间隔空间的长度和宽度分别为50～500nm，高度为100～1000nm。
本发明还提供一种显示装置，包括上述彩膜基板。
一种彩膜基板，包括衬底基板、设于所述衬底基板上的黑色矩阵、以 及设于所述衬底基板上且被黑色矩阵间隔开的数个色阻块，所述色阻块包括多孔支撑层及分散于多孔支撑层中的色阻材料；所述色阻材料包括颜料分子；所述多孔支撑层中设有多个孔隙，所述孔隙的尺寸大于所述颜料分子的尺寸；
其中，所述多孔支撑层包括基底及设于所述基底上的数道挡墙，所述数道挡墙在所述基底上围出数个凹槽，所述数个凹槽充当所述多孔支撑层中的多个孔隙，所述凹槽的尺寸大于所述颜料分子的尺寸；
其中，所述基底及数道挡墙的材料为金属材料或有机材料；
其中，所述凹槽的形状为长方体，所述凹槽的长度和宽度分别为50～500nm，深度为100～1000nm。
本发明的有益效果：本发明提供的一种彩膜基板，其色阻块包括多孔支撑层及分散于多孔支撑层中的色阻材料，所述多孔支撑层可以有效实现颜料分子的分散和支撑，从而减少色阻材料中分散剂和树脂等非颜料组分的含量，提高颜料组分的含量，增大色阻块单位膜厚的滤光能力，有利于实现彩膜基板的薄型化并获得更高的像素密度。本发明提供的一种显示装置，包括上述彩膜基板，具有色域广、厚度薄、及亮度高等优点。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为现有的彩膜基板的结构示意图；
图2为本发明的彩膜基板的结构示意图；
图3为本发明的彩膜基板中的多孔支撑层的第一实施例的俯视示意图；
图4为本发明的彩膜基板中的多孔支撑层的第二实施例的俯视示意图；
图5为本发明的彩膜基板中的多孔支撑层的第三实施例的俯视示意图；
图6为本发明的彩膜基板与传统的彩膜基板的色域比较示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图2，同时参阅图3-5，本发明提供一种彩膜基板，包括衬底基板10、设于所述衬底基板10上的黑色矩阵20、以及设于所述衬底基板10上且被黑色矩阵20间隔开的数个色阻块30，所述色阻块30包括多孔支撑层40及分散于多孔支撑层40中的色阻材料；所述色阻材料包括颜料分子；所述多孔支撑层40中设有多个孔隙，所述孔隙的尺寸略大于所述颜料分子的尺寸。
除颜料分子外，所述色阻材料还包括分散剂和树脂等其它组分，所述分散剂和树脂等组分用于对颜料进行分散。本发明通过采用多孔支撑层40对色阻材料进行分散和支撑，使得颜料分子能够很好地分散在多孔支撑层40的多个孔隙中，提高颜料分子的分散效果，在保证相同色纯度的情况下，可以减少色阻材料中分散剂和树脂等非颜料组分的含量，提高颜料组分的含量，从而增大色阻块30单位膜厚的滤光能力。所述多孔支撑层40对光的吸收很少，且不改变光的偏振状态。
具体的，所述颜料分子的直径为30～200nm。
如图3所示，为本发明的彩膜基板的多孔支撑层40的第一实施例，在该第一实施例中，所述多孔支撑层40包括基底41及设于所述基底41上的数道挡墙42，所述数道挡墙42在所述基底41上围出数个凹槽43，所述数个凹槽43充当所述多孔支撑层40中的多个孔隙，所述凹槽43的尺寸大于所述颜料分子的尺寸。
具体的，所述基底41及数道挡墙42的材料为金属材料或有机材料。
优选的，所述金属材料包括金(Au)、铜(Cu)、及铝(Al)中的一种或多种。
优选的，所述有机材料包括聚甲基丙烯酸甲酯(PMMA)。
具体的，所述基底41及设于所述基底41上的数道挡墙42采用纳米压印的方法一体成型。
优选的，所述凹槽43的形状为长方体，所述凹槽43的长度和宽度分别为50～500nm，所述凹槽43的深度为100～1000nm。
优选的，所述基底41的厚度为5～20nm，通过将基底41设置为具有较薄的厚度，可保证多孔支撑层40具有足够的透光度。
如图4所示，为本发明的彩膜基板的多孔支撑层40的第二实施例，在该第二实施例中，所述多孔支撑层40包括垂直于衬底基板10排列且间隔设置的多层石墨烯层45，所述多层石墨烯层45之间的多个间隔区域46充当所述多孔支撑层40中的多个孔隙，所述间隔区域46的尺寸大于所述颜料分子的尺寸。
具体的，所述石墨烯层45可以为单层石墨烯或者多层石墨烯。所述单层石墨烯的厚度约为0.335nm，所述多层石墨烯的厚度约为0.335～3.35nm。
优选的，所述多层石墨烯层45在所述衬底基板10上按照相互平行的方式排列。
具体的，所述间隔区域46的宽度为50～500nm，长度为50～1000nm，所述石墨烯层45的高度为100～1000nm。
如图5所示，为本发明的彩膜基板的多孔支撑层40的第三实施例，在该第三实施例中，所述多孔支撑层40包括垂直于衬底基板10排列的多根碳纳米管47，所述多根碳纳米管47按照在所述衬底基板10上围出多个间隔空间48的方式排列，所述多个间隔空间48充当所述多孔支撑层40中的多个孔隙，所述间隔空间48的尺寸大于所述颜料分子的尺寸。
具体的，所述碳纳米管47可以为单壁碳纳米管或者多壁碳纳米管。所述单壁碳纳米管的直径为0.6～2nm，所述多壁碳纳米管的直径为2～100nm。
具体的，所述间隔空间48的形状可以为圆柱形、方柱形、或者不规则柱形。
优选的，所述间隔空间48的形状为长方体，所述间隔空间48的长度和宽度分别为50～500nm，高度为100～1000nm。
具体的，所述数个色阻块30包括数个红色光阻块、数个绿色光阻块、及数个蓝色光阻块。
优选的，所述数个色阻块30的面积相等。
优选的，所述彩膜基板还包括设于所述黑色矩阵20及数个色阻块30上方的平坦层50。具体的，所述平坦层50的材料为透明有机材料。
具体的，所述衬底基板10为透明基板，优选为玻璃基板。
本发明的彩膜基板，采用多孔支撑层40来分散色阻材料，所述多孔支撑层40中设有多个孔隙，所述孔隙的尺寸略大于颜料分子的尺寸，使颜料分子能够很好地分散在多孔支撑层40中，由于所述多孔支撑层40可以起到分散颜料分子的作用，相当于取代了一部分分散剂和树脂，从而可以降低色阻材料中分散剂和树脂等非颜料组分的含量，提升色阻材料中的颜料组分含量，因此为了获得相同的色纯度所需要的色阻块30的厚度将下降，在色阻块30厚度降低的同时，黑色矩阵20的厚度也会随之降低，有利于实现彩膜基板的薄型化，同时提升彩膜基板的透过率，使含有该彩膜基板的显示装置获得更高的亮度。若保持色阻块30的厚度不变，由于色阻材料中的颜料含量相对提升，色阻块30和黑色矩阵20的宽度都可以相对减少，从而获得更高的像素密度。图6为本发明的彩膜基板与传统的彩膜基板的 色域比较示意图，从图6中可见，本发明的彩膜基板相对于传统的彩膜基板具有更广的色域。
具体的，本发明还提供一种显示装置，包括上述彩膜基板，该显示装置具有色域广、厚度薄、及亮度高等优点。在此不再对彩膜基板进行重复描述。
综上所述，本发明提供一种彩膜基板及显示装置。本发明的彩膜基板，其色阻块包括多孔支撑层及分散于多孔支撑层中的色阻材料，所述多孔支撑层可以有效实现颜料分子的分散和支撑，从而减少色阻材料中分散剂和树脂等非颜料组分的含量，提高颜料组分的含量，增大色阻块单位膜厚的滤光能力，有利于实现彩膜基板的薄型化并获得更高的像素密度。本发明的显示装置，包括上述彩膜基板，具有色域广、厚度薄、及亮度高等优点。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (11)

  1. 一种彩膜基板，包括衬底基板、设于所述衬底基板上的黑色矩阵、以及设于所述衬底基板上且被黑色矩阵间隔开的数个色阻块，所述色阻块包括多孔支撑层及分散于多孔支撑层中的色阻材料；所述色阻材料包括颜料分子；所述多孔支撑层中设有多个孔隙，所述孔隙的尺寸大于所述颜料分子的尺寸。
  2. 如权利要求1所述的彩膜基板，其中，所述多孔支撑层包括基底及设于所述基底上的数道挡墙，所述数道挡墙在所述基底上围出数个凹槽，所述数个凹槽充当所述多孔支撑层中的多个孔隙，所述凹槽的尺寸大于所述颜料分子的尺寸。
  3. 如权利要求2所述的彩膜基板，其中，所述基底及数道挡墙的材料为金属材料或有机材料。
  4. 如权利要求2所述的彩膜基板，其中，所述凹槽的形状为长方体，所述凹槽的长度和宽度分别为50～500nm，深度为100～1000nm。
  5. 如权利要求1所述的彩膜基板，其中，所述多孔支撑层包括垂直于衬底基板排列且间隔设置的多层石墨烯层，所述多层石墨烯层之间的多个间隔区域充当所述多孔支撑层中的多个孔隙，所述间隔区域的尺寸大于所述颜料分子的尺寸。
  6. 如权利要求5所述的彩膜基板，其中，所述间隔区域的宽度为50～500nm，长度为50～1000nm，所述石墨烯层的高度为100～1000nm。
  7. 如权利要求1所述的彩膜基板，其中，所述多孔支撑层包括垂直于衬底基板排列的多根碳纳米管，所述多根碳纳米管按照在所述衬底基板上围出多个间隔空间的方式排列，所述多个间隔空间充当所述多孔支撑层中的多个孔隙，所述间隔空间的尺寸大于所述颜料分子的尺寸。
  8. 如权利要求7所述的彩膜基板，其中，所述碳纳米管为单壁碳纳米管或者多壁碳纳米管。
  9. 如权利要求7所述的彩膜基板，其中，所述间隔空间的形状为长方体，所述间隔空间的长度和宽度分别为50～500nm，高度为100～1000nm。
  10. 一种显示装置，包括如权利要求1所述的彩膜基板。
  11. 一种彩膜基板，包括衬底基板、设于所述衬底基板上的黑色矩阵、以及设于所述衬底基板上且被黑色矩阵间隔开的数个色阻块，所述色阻块包括多孔支撑层及分散于多孔支撑层中的色阻材料；所述色阻材料包括颜 料分子；所述多孔支撑层中设有多个孔隙，所述孔隙的尺寸大于所述颜料分子的尺寸；
    其中，所述多孔支撑层包括基底及设于所述基底上的数道挡墙，所述数道挡墙在所述基底上围出数个凹槽，所述数个凹槽充当所述多孔支撑层中的多个孔隙，所述凹槽的尺寸大于所述颜料分子的尺寸；
    其中，所述基底及数道挡墙的材料为金属材料或有机材料；
    其中，所述凹槽的形状为长方体，所述凹槽的长度和宽度分别为50～500nm，深度为100～1000nm。
PCT/CN2016/090580 2016-06-29 2016-07-20 彩膜基板及显示装置 WO2018000475A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/122,419 US10108043B2 (en) 2016-06-29 2016-07-20 Color filter substrate and display device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201610499421.2A CN105892143A (zh) 2016-06-29 2016-06-29 彩膜基板及显示装置
CN201610499421.2 2016-06-29

Publications (1)

Publication Number Publication Date
WO2018000475A1 true WO2018000475A1 (zh) 2018-01-04

Family

ID=56718468

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2016/090580 WO2018000475A1 (zh) 2016-06-29 2016-07-20 彩膜基板及显示装置

Country Status (3)

Country Link
US (1) US10108043B2 (zh)
CN (1) CN105892143A (zh)
WO (1) WO2018000475A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106444143B (zh) 2016-12-27 2018-10-30 武汉华星光电技术有限公司 液晶显示装置及其彩膜基板
CN107884980B (zh) * 2017-10-31 2021-01-19 合肥智杰精密设备有限公司 一种用于液晶显示屏的透明导电基板
CN113675315B (zh) * 2020-05-14 2023-05-09 成都辰显光电有限公司 显示面板及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1592516A (zh) * 2003-08-28 2005-03-09 三星Sdi株式会社 具有多孔材料层的有机电致发光显示器
US20100134729A1 (en) * 2008-11-28 2010-06-03 Seiko Epson Corporation Color filter ink, color filter ink manufacturing method, color filter ink set, color filter, image display device, and electronic device
JP2012144702A (ja) * 2010-12-21 2012-08-02 Kao Corp 非水系顔料分散体の製造方法
CN102645691A (zh) * 2011-07-12 2012-08-22 京东方科技集团股份有限公司 一种彩色滤光片及其制造方法
CN104777663A (zh) * 2015-04-28 2015-07-15 深圳市华星光电技术有限公司 彩膜基板及液晶显示面板

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10228938A1 (de) * 2002-06-28 2004-01-15 Philips Intellectual Property & Standards Gmbh Elektrolumineszierende Vorrichtung mit Farbfilter
CN102135634B (zh) * 2010-01-22 2014-10-29 京东方科技集团股份有限公司 彩色滤光片及其制造方法
CN103576371A (zh) * 2012-07-23 2014-02-12 天津富纳源创科技有限公司 液晶面板
CN104317118A (zh) * 2014-10-24 2015-01-28 华中科技大学 一种石墨烯基电控液晶光汇聚微透镜阵列芯片
CN105204104B (zh) * 2015-10-30 2018-05-25 京东方科技集团股份有限公司 滤光片及其制作方法、显示基板及显示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1592516A (zh) * 2003-08-28 2005-03-09 三星Sdi株式会社 具有多孔材料层的有机电致发光显示器
US20100134729A1 (en) * 2008-11-28 2010-06-03 Seiko Epson Corporation Color filter ink, color filter ink manufacturing method, color filter ink set, color filter, image display device, and electronic device
JP2012144702A (ja) * 2010-12-21 2012-08-02 Kao Corp 非水系顔料分散体の製造方法
CN102645691A (zh) * 2011-07-12 2012-08-22 京东方科技集团股份有限公司 一种彩色滤光片及其制造方法
CN104777663A (zh) * 2015-04-28 2015-07-15 深圳市华星光电技术有限公司 彩膜基板及液晶显示面板

Also Published As

Publication number Publication date
CN105892143A (zh) 2016-08-24
US10108043B2 (en) 2018-10-23
US20180203289A1 (en) 2018-07-19

Similar Documents

Publication Publication Date Title
US9897882B1 (en) Methods of fabricating COA type liquid crystal display panels and COA type liquid crystal display panels
WO2017075879A1 (zh) 量子点彩膜基板及其制作方法与液晶显示装置
WO2017024613A1 (zh) 显示面板及其制作方法
WO2016155091A1 (zh) 液晶显示器
WO2016173106A1 (zh) 彩膜基板及液晶显示面板
US11719983B2 (en) Display panel, manufacturing method thereof and display device
US20140022465A1 (en) Color filter substrate, touch display panel and touch display device
CN102650823A (zh) 具有偏振能力的彩色滤光片及其制作方法
WO2015081732A1 (zh) 彩膜基板及其制作方法、显示装置
WO2018000475A1 (zh) 彩膜基板及显示装置
CN103645584A (zh) 彩膜基板及显示装置
US11480834B2 (en) Display panel and display device
CN102866543B (zh) 像素单元、阵列基板以及液晶显示装置
CN106526975A (zh) 一种显示面板及显示设备
CN107621734A (zh) 画素结构
CN211786513U (zh) 双液晶盒显示面板及显示装置
JP2007286590A (ja) 液晶表示装置用カラーフィルター基板及びその製造方法
CN1632666A (zh) 液晶显示面板及其制造方法
US20210041743A1 (en) Display panel, method for manufacturing same, and display device
KR100671101B1 (ko) 컬러 필터를 갖는 분산 콜레스테릭 액정 디스플레이
KR20110032656A (ko) 액정 표시 장치
Braganza et al. 30.2: Single Layer Full Color Cholesteric Display
JP2009037098A5 (zh)
WO2017206532A1 (zh) 显示面板及显示装置
CN204758970U (zh) 一种计算机液晶显示器

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 15122419

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 16906873

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 16906873

Country of ref document: EP

Kind code of ref document: A1