Classifications

• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
  • G02B1/14—Protective coatings, e.g. hard coatings
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
  • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
  • B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
  • C03C17/225—Nitrides
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
  • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
  • C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
  • G02B1/11—Anti-reflection coatings
  • G02B1/113—Anti-reflection coatings using inorganic layer materials only
  • G02B1/115—Multilayers
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B2307/00—Properties of the layers or laminate
  • B32B2307/40—Properties of the layers or laminate having particular optical properties
  • B32B2307/412—Transparent
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B2307/00—Properties of the layers or laminate
  • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
  • B32B2307/536—Hardness
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B2307/00—Properties of the layers or laminate
  • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
  • B32B2307/584—Scratch resistance
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/28—Other inorganic materials
  • C03C2217/281—Nitrides
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/29—Mixtures
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/73—Anti-reflective coatings with specific characteristics
  • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/73—Anti-reflective coatings with specific characteristics
  • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/154—Deposition methods from the vapour phase by sputtering
  • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
  • C08G2261/50—Physical properties
  • C08G2261/57—Physical properties photorefractive, e.g. change of refractive index

Definitions

• the color shift is defined by ((a* ar ticie ) 2 + (b* art i c ie ) 2 ).
• the color shift is defined by V((a* art i C ie+2 ) 2 + (b* art i C ie +2) 2 ).
• the color shift is defined by V((a* ar ti C i e - a* SU b S trate) 2 +
• the substrate comprises a Young's modulus of about 60 GPa or greater.
• the substrate may include an amorphous substrate or a crystalline substrate.
• Exemplary amorphous substrates include glasses such as soda lime glass, alkali aluminosilicate glass, alkali containing borosilicate glass and alkali aluminoborosilicate glass.
• the substrate is a strengthened glass comprising a compressive stress (CS) layer with a surface CS of at least 200 MPa extending from a surface of the strengthened glass to a depth of compression of about 10 ⁇ or greater.
• CS compressive stress
• the composition of the optically transparent material may include some amount of aluminum.
• the composition comprises aluminum in a range from about 25 atomic% to about 45 atomic%, from about 26 atomic% to about 45 atomic%, from about 28 atomic% to about 45 atomic%, from about 30 atomic% to about 45 atomic%, from about 32 atomic% to about 45 atomic%, from about 34 atomic% to about 45 atomic%, from about 36 atomic% to about 45 atomic%, from about 38 atomic% to about 45 atomic%, from about 40 atomic% to about 45 atomic%, from about 25 atomic% to about 44 atomic%, from about 25 atomic% to about 42 atomic%, from about 25 atomic% to about 40 atomic%, from about 25 atomic% to about 38 atomic%, from about 25 atomic% to about 36 atomic%, from about 25 atomic% to about 34 atomic%, from about 32 atomic% to about 44 atomic%, or from about 33 atomic
• the composition of the optically transparent material may include some amount of nitrogen.
• the composition comprises nitrogen in a range from about 35 atomic% to about 50 atomic%, from about 36 atomic% to about 50 atomic%, from about 38 atomic% to about 50 atomic%, from about 40 atomic% to about 50 atomic%, from about 42 atomic% to about 50 atomic%, from about 44 atomic% to about 50 atomic%, from about 46 atomic% to about 50 atomic%, from about 35 atomic% to about 48 atomic%, from about 35 atomic% to about 46 atomic%, from about 35 atomic% to about 44 atomic%, from about 35 atomic% to about 50 atomic%, from about 35 atomic% to about 50 atomic%, from about 35 atomic% to about 50 atomic%, from about 35 atomic% to about 50 atomic%, from about 35 atomic% to about 50 atomic%, or from about 35 atomic% to about 50 atomic%
• the optically transparent material exhibits an average transmittance of about 82% or greater, about 84% or greater, about 86% or greater, about 88% or greater, about 90% or greater, about 92% or greater, about 94% or greater, about 95% or greater, or about 96% or greater, all over the Optical Wavelength Regime and measured with respect to a thickness of 1 micrometer.
• a 1 -micrometer thick layer of the material is disposed on a substrate and the curvature of that underlying substrate is measured, using a profilometer, before and after the layer is formed.
• the layer is formed using a vacuum deposition technique.
• the substrate on which the optically transparent material is disposed has a thickness of about 1 mm and length and width dimensions of 5 cm by 5 cm.
• the optical film 120 and the article 100 may be described in terms of a hardness measured by the Berkovich Indenter Hardness Test.
• the measured hardness may appear to increase initially due to development of the plastic zone at shallow indentation depths and then increases and reaches a maximum value or plateau at deeper indentation depths. Thereafter, hardness begins to decrease at even deeper indentation depths due to the effect of the underlying substrate.
• a substrate having an increased hardness compared to the film is utilized, the same effect can be seen; however, the hardness increases at deeper indentation depths due to the effect of the underlying substrate.
• the substrate influence on hardness occurs at deeper indentation depths (i.e., typically at depths greater than about 10% of the optical film structure or layer thickness).
• a further complication is that the hardness response requires a certain minimum load to develop full plasticity during the indentation process. Prior to that certain minimum load, the hardness shows a generally increasing trend.
• the article 100 including the optical film 120 and any additional coatings, as described herein, exhibit a hardness of about 5 GPa or greater, about 8 GPa or greater, about 10 GPa or greater or about 12 GPa or greater (e.g., 14 GPa or greater, 16 GPa or greater, 18 GPa or greater, 20 GPa or greater), as measured on the coated surface 122, by a Berkovitch Indenter Hardness Test.
• One aspect of this disclosure pertains to an article that exhibits colorlessness in reflectance and/or transmittance even when viewed at different incident illumination angles under an illuminant.
• the article exhibits an angular color shift in reflectance and/or transmittance of about 5 or less or about 2 or less between a reference illumination angle and any incidental illumination angles in the ranges provided herein.
• color shift angular or reference point
• the phrase "color shift" refers to the change in both a* and b*, under the CIE L*, a*, b* colorimetry system in reflectance and/or transmittance.
• the angular color shift may be about 0.
• the illuminant can include standard illuminants as determined by the CIE, including A illuminants (representing tungsten- filament lighting), B illuminants (daylight simulating illuminants), C illuminants (daylight simulating illuminants), D series illuminants (representing natural daylight), and F series illuminants (representing various types of fluorescent lighting).
• the article exhibits a color in the CIE L*, a*, b* colorimetry system in reflectance and/or transmittance such that the distance or reference point color shift between the transmittance color or reflectance coordinates from a reference point is less than about 5 or less than about 2 under an illuminant (which can include standard illuminants as determined by the CIE, including A illuminants (representing tungsten- filament lighting), B illuminants (daylight simulating illuminants), C illuminants (daylight simulating illuminants), D series illuminants (representing natural daylight), and F series illuminants (representing various types of fluorescent lighting)).
• illuminant which can include standard illuminants as determined by the CIE, including A illuminants (representing tungsten- filament lighting), B illuminants (daylight simulating illuminants), C illuminants
• the articles exhibit a color shift in reflectance and/or transmittance of about 2 or less when viewed at incident illumination angle from the reference illumination angle under a CIE F2, F10, Fl l, F12 or D65 illuminant or more specifically under a CIE F2 illuminant.
• the article may exhibit a transmittance color (or transmittance color coordinates) and/or a reflectance color (or reflectance color coordinates) measured at the coated surface 122 having a reference point color shift of less than about 2 from a reference point, as defined herein.
• the L* coordinate of the articles described herein are the same as the reference point and do not influence color shift.
• the transmittance color coordinates of the article are compared to the transmittance color coordinates of the substrate and the reflectance color coordinates of the article are compared to the reflectance color coordinates of the substrate.
• the article may exhibit a b* value in reflectance (as measured at the coated surface only) in the range from about -5 to about 1, from about -5 to about 0, from about -4 to about 1, or from about -4 to about 0, in the CIE L*, a*, b* colorimetry system at all incidence illumination angles in the range from about 0 to about 60 degrees (or from about 0 degrees to about 40 degrees or from about 0 degrees to about 30 degrees).
• the article may exhibit a b* value in transmittance (as measured at the coated surface and the opposite bare surface of the article) of less than about 2 (or about 1.8 or less, about 1.6 or less, 1.5 or less, 1.4 or less, 1.2 or less, or about 1 or less) in the CIE L*, a*, b* colorimetry system at all incidence illumination angles in the range from about 0 to about 60 degrees (or from about 0 degrees to about 40 degrees or from about 0 degrees to about 30 degrees).
• the lower limit of the b* value in transmittance may be about -5.
• the article exhibits low average reflectance.
• the article may exhibit an average reflectance of about 15% or less over the Optical Wavelength Regime (e.g., about 20% or less, about 18% or less, about 16% or less, about 15% or less, about 14% or less, about 12% or less, about 10% or less, about 8% or less, about 6% or less, about 5% or less, about 4% or less, about 3% or less, about 2% or less, about 1 % or less, or about 0.5% or less).
• Optical Wavelength Regime e.g., about 20% or less, about 18% or less, about 16% or less, about 15% or less, about 14% or less, about 12% or less, about 10% or less, about 8% or less, about 6% or less, about 5% or less, about 4% or less, about 3% or less, about 2% or less, about 1 % or less, or about 0.5% or less.
• the substrate 110 may include an inorganic material and may include an amorphous substrate, a crystalline substrate or a combination thereof.
• the substrate 1 10 may be formed from man-made materials and/or naturally occurring materials (e.g., quartz and polymers).
• the substrate 110 may be characterized as organic and may specifically be polymeric.
• the substrate 110 may specifically exclude polymeric, plastic and/or metal substrates.
• the substrate may be characterized as alkali-including substrates (i.e., the substrate includes one or more alkalis).
• the substrate exhibits a refractive index in the range from about 1.45 to about 1.55.
• Suitable substrates 110 may exhibit an elastic modulus (or Young's modulus) in the range from about 30 GPa to about 120 GPa.
• the elastic modulus of the substrate may be in the range from about 30 GPa to about 110 GPa, from about 30 GPa to about 100 GPa, from about 30 GPa to about 90 GPa, from about 30 GPa to about 80 GPa, from about 30 GPa to about 70 GPa, from about 40 GPa to about 120 GPa, from about 50 GPa to about 120 GPa, from about 60 GPa to about 120 GPa, from about 70 GPa to about 120 GPa, and all ranges and sub-ranges therebetween.
• the amorphous substrate may include glass, which may be strengthened or non-strengthened.
• suitable glass include soda lime glass, alkali aluminosilicate glass, alkali containing borosilicate glass and alkali aluminoborosilicate glass.
• the glass may be free of lithia.
• the substrate 110 may include crystalline substrates such as glass ceramic substrates (which may be strengthened or non-strengthened) or may include a single crystal structure, such as sapphire.
• the substrate 110 includes an amorphous base (e.g., glass) and a crystalline cladding (e.g., sapphire layer, a
• polycrystalline alumina layer and/or or a spinel (MgAl204) layer are examples of polycrystalline alumina layer and/or or a spinel (MgAl204) layer.
• these light reflectance and transmittance values may be a total reflectance or total transmittance (taking into account reflectance or transmittance on both major surfaces of the substrate) or may be observed on a single side of the substrate (i.e., on the anti-reflective surface 122 only, without taking into account the opposite surface).
• the average reflectance or transmittance is measured at an incident illumination angle of 0 degrees (however, such measurements may be provided at incident illumination angles of 45 degrees or 60 degrees).
• the substrate 1 10 may optionally exhibit a color, such as white, black, red, blue, green, yellow, orange etc.
• the degree of strengthening may be quantified based on the parameters of central tension (CT), surface compressive stress (CS), and depth of compression (DOC).
• the strengthened substrate specifically includes a CS layer (with a surface CS value) that extends from one or both the first maj or surface 112 and the second maj or surface 114 to a DOC.
• a CT layer or region extends from DOC to the central portion of the substrate.
• DOC refers to the depth at which the stress within the substrate changes compressive to tensile. At the DOC, the stress crosses from a positive (compressive) stress to a negative (tensile) stress and thus exhibits a stress value of zero.
• the strengthened substrate may have a DOC of ⁇ or greater, 15 ⁇ or greater, 20 ⁇ or greater (e.g., 25 ⁇ , 30 ⁇ , 35 ⁇ , 40 ⁇ , 45 ⁇ , 50 ⁇ or greater) and/or a CT of 10 MPa or greater, 20 MPa or greater, 30 MPa or greater, 40 MPa or greater (e.g., 42 MPa, 45 MPa, or 50 MPa or greater) but less than 100 MPa (e.g., 95, 90, 85, 80, 75, 70, 65, 60, 55 MPa or less).
• Suitable glass compositions in some embodiments, further comprise at least one of K 2 0, MgO, and CaO.
• the glass compositions used in the substrate can comprise 61-75 mol.% Si02; 7-15 mol.% A1 2 0 3 ; 0-12 mol.% B 2 0 3 ; 9-21 mol.% Na 2 0; 0-4 mol.% K 2 0; 0-7 mol.% MgO; and 0-3 mol.% CaO.
• a further example glass composition suitable for the substrate comprises: 60-70 mol.% Si0 2 ; 6-14 mol.% A1 2 0 3 ; 0-15 mol.% B 2 0 3 ; 0-15 mol.% Li 2 0; 0-20 mol.% Na 2 0; 0- 10 mol.% K 2 0; 0-8 mol.% MgO; 0-10 mol.% CaO; 0-5 mol.% Zr0 2 ; 0-1 mol.% Sn0 2 ; 0-1 mol.% Ce0 2 ; less than 50 ppm As 2 0 3 ; and less than 50 ppm Sb 2 0 3 ; where 12 mol.% ⁇ (Li 2 0 + Na 2 0 + K 2 0) ⁇ 20 mol.% and 0 mol.% ⁇ (MgO + CaO) ⁇ 10 mol.%.
• the substrate 110 may include a single crystal, which may include A1 2 0 3 .
• Such single crystal substrates are referred to as sapphire.
• Other suitable materials for a crystalline substrate include polycrystalline alumina layer and/or spinel (MgAl 2 0 4 ).
• the crystalline substrate 110 may include a glass ceramic substrate, which may be strengthened or non-strengthened.
• suitable glass ceramics may include Li 2 0-Al 2 0 3 -Si0 2 system (i.e. LAS-System) glass ceramics, MgO-Al 2 0 3 -Si0 2 system (i.e. MAS-System) glass ceramics, and/or glass ceramics that include a predominant crystal phase including ⁇ -quartz solid solution, ⁇ -spodumene ss, cordierite, and lithium disilicate.
• the glass ceramic substrates may be strengthened using the chemical strengthening processes disclosed herein.
• MAS-System glass ceramic substrates may be strengthened in Li 2 S0 4 molten salt, whereby an exchange of 2Li + for Mg 2+ can occur.
• an electronic device 1000 may include an article 100 according to one or more embodiments described herein.
• the device 1000 includes a housing 1020 having front 1040, back 1060, and side surfaces 1080; electrical components (not shown) that are at least partially inside or entirely within the housing and including at least a controller, a memory, and a display 1 120 at or adjacent to the front surface of the housing.
• the article 100 is shown as a cover disposed at or over the front surface of the housing such that it is over the display 1 120. In some embodiments, the article may be used as a back cover.
• Table 6 Deposition conditions for Examples 28-43. (seconds) (RF) (DC) (RF)
• composition comprising silicon, aluminum, and nitrogen
• Embodiment 2 The optically transparent material of Embodiment 1 , wherein the composition further comprises oxygen.
• Embodiment 3 The optically transparent material of Embodiment 1 or
• Embodiment 8 The optically transparent material of Embodiment 7, wherein the composition comprises silicon in an amount in a range from about 5 atomic% to about 25 atomic%, aluminum in an amount in a range from about 25 atomic% to about 45 atomic%, oxygen in an amount in a range from about 0 atomic% to about 15 atomic%, and nitrogen in an amount in a range from about 35 atomic% to about 50 atomic%.
• the material comprises a compressive stress in the range from about -1000 MPa to about 100 MPa, when disposed on a substrate.
• the material comprises a refractive index of about 2.0 or greater, as measured at a wavelength of 550 nm.
• Embodiment 14 The optically transparent material of any one of Embodiments 7-
• the material comprises a roughness (Ra) of less than 1.5 nm as measured by atomic force microscopy on the major surface along an imagining area having dimensions of 2 micrometers by 2 micrometers.
• Embodiment 15 An article comprising:
• an optical film having a thickness in a range from about 200 nm to about 3 micrometers disposed on the major surface forming a coated surface, the optical film comprising an optically transparent material comprising silicon, aluminum, and nitrogen, and wherein the article exhibits a maximum hardness of about 12 GPa or greater as measured on the coated surface by a Berkovich Indenter Hardness Test along an indentation depth of about 100 nm or greater;
• the color shift is defined by V((a* art i C ie - a* subs trate) 2 + (b* art icle - b* subs trate) 2 )-
• Embodiment 17 The article of Embodiment 15 or Embodiment 16, wherein the optically transparent material comprises a compressive stress in the range from about -1000 MPa to about 100 MPa.
• Embodiment 18 The article of any one of Embodiments 15-17, wherein the optically transparent material comprises a first layer and the optical film further comprises a second layer.
• Embodiment 19 The article of Embodiment 18, wherein the first layer is disposed on the major surface of the substrate and the second layer is disposed on the first layer.
• Embodiment 20 The article of Embodiment 18, wherein the second layer is disposed on the major surface of the substrate and the first layer is disposed on the second layer.
• Embodiment 21 The article of Embodiment 18, wherein the transparent material comprises a refractive index greater than a refractive index of the second layer and wherein the optical film comprises a plurality of first layers and second layers that alternate.
• Embodiment 22 The article of any one of Embodiments 15-21, wherein the single side average photopic reflectance of the article is about 2% or less over the optical wavelength regime at a viewing angle in the range from about 6 degrees to about 40 degrees.
• Embodiment 25 The article of Embodiment any one of Embodiments 15-24, wherein the amorphous substrate comprises a glass selected from the group consisting of soda lime glass, alkali aluminosilicate glass, alkali containing borosilicate glass and alkali aluminoborosilicate glass.
• Embodiment 27 The article of any one of Embodiments 15-26, wherein the first layer comprises a thickness in the range from about 0.4 micrometer to about 3 micrometers.
• Embodiment 28 A device comprising:

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• Surface Treatment Of Glass (AREA)

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• 2017
  • 2017-06-13 EP EP17731995.1A patent/EP3468931B1/en active Active
  • 2017-06-13 KR KR1020197000841A patent/KR102423776B1/ko active Active
  • 2017-06-13 KR KR1020227024692A patent/KR102589971B1/ko active Active
  • 2017-06-13 TW TW106119599A patent/TWI783937B/zh active
  • 2017-06-13 JP JP2019517195A patent/JP2019520303A/ja active Pending
  • 2017-06-13 WO PCT/US2017/037120 patent/WO2017218452A1/en not_active Ceased
  • 2017-06-13 CN CN201780036912.6A patent/CN109311738A/zh active Pending
  • 2017-06-13 US US15/621,170 patent/US10603870B2/en active Active
• 2020
  • 2020-02-18 US US16/793,644 patent/US11203179B2/en active Active

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