WO2017170493A1 - Conductive paste - Google Patents
Conductive paste Download PDFInfo
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- WO2017170493A1 WO2017170493A1 PCT/JP2017/012548 JP2017012548W WO2017170493A1 WO 2017170493 A1 WO2017170493 A1 WO 2017170493A1 JP 2017012548 W JP2017012548 W JP 2017012548W WO 2017170493 A1 WO2017170493 A1 WO 2017170493A1
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- conductive paste
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- DPTGFYXXFXSRIR-UHFFFAOYSA-N C=CC(OCC1CC2OC2CC1)=O Chemical compound C=CC(OCC1CC2OC2CC1)=O DPTGFYXXFXSRIR-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
- C08K2003/0806—Silver
Definitions
- the present invention relates to a conductive paste containing a specific polymerization initiator.
- Photolithography is known as a method for forming a conductive pattern on a substrate such as glass, ceramic, or silicon wafer.
- a substrate such as glass, ceramic, or silicon wafer.
- mobile electronic devices such as smartphones and touch panels are required to be smaller and have higher definition. .
- Patent Documents 1 to 4 disclose various conductive pastes, but satisfactory resolution has not been obtained.
- the problem to be solved is that there has never been a conductive paste having good sensitivity, resolution and adhesion and low resistance.
- an object of the present invention is to provide a conductive paste having good sensitivity, resolution and adhesion and low resistance.
- the present invention includes a polymerization initiator (A) containing at least one oxime ester compound represented by the following general formula (I), a binder resin (B), an ethylenically unsaturated compound (C), and conductive particles (D). And the said objective is achieved by providing the electrically conductive paste containing a solvent (E).
- R 1 and R 2 each independently represent R 11 , OR 11 , COR 11 , SR 11 , CONR 12 R 13 or CN;
- R 11 , R 12 and R 13 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a carbon atom.
- R 21 , R 22 and R 23 are further R 21 , OR 21 , COR 21 , SR 21 , NR 22 R 23 , CONR 22 R 23 , —NR 22 —OR 23 , —NCOR 22 -OCOR 23 , NR 22 COR 21 , OCOR 21 , COOR 21 , SCOR 21 , OCSR 21 , COSR 21 , CSOR 21 , hydroxyl group, nitro group, CN, amino group, halogen atom or COOR 21 may be substituted , R 21 , R 22 and R 23 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a carbon atom.
- R 21 , R 22 and R 23 may be further substituted with a hydroxyl group, a nitro group, CN, a halogen atom, a hydroxyl group or a carboxyl group
- R 24 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atom
- R 11 , R 12 , R 13 , R 21 , R 22 , R 23 and R 24 When the group represented by R 11 , R 12 , R 13 , R 21 , R 22 , R 23 and R 24 has an alkyl moiety, the alkyl moiety may have a branched side chain and is a cyclic alkyl.
- R 3 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.
- the hydrogen atom of the group represented by R 3 is further represented by R 21 , OR 21 , COR 21 , SR 21 , NR 22 R 23 , CONR 22 R 23 , —NR 22 —OR 23 , —NCOR 22 —OCOR 23 , NR 22 COR 21 , OCOR 21 , COOR 21 , SCOR 21 , OCSR 21 , COSR 21 , CSOR 21 , hydroxyl group, nitro group, CN, halogen atom or COOR 21 may be substituted, R 4 , R 5 , R 6 and R 7 are each independently R 11 , OR 11 , SR 11 , COR 14 , CONR 15 R 16 , NR 12 COR 11 , OCOR 11 , COOR 14 , SCOR 11 , OCSR 11 , COSR 14 , CSOR 21 , hydroxyl group, nitro group, CN, halogen atom or COOR 21 may be substituted, R 4 , R 5 , R 6
- the present invention also provides a conductive pattern made of the above conductive paste.
- the present invention provides a method for forming a conductive pattern comprising a step of applying the conductive paste on a substrate, a step of drying, a step of exposing using a mask, a step of developing, and a step of baking at 100 to 300 ° C. Is to provide.
- the present invention also provides a touch panel provided with the above conductive pattern.
- the conductive paste of the present invention includes a polymerization initiator (A) containing at least one oxime ester compound represented by the general formula (I), a binder resin (B), an ethylenically unsaturated compound (C), and conductive particles. (D) and a solvent (E) are contained.
- A polymerization initiator
- B binder resin
- C ethylenically unsaturated compound
- E a solvent
- the polymerization initiator (A) used in the present invention contains one or more oxime ester compounds represented by the above general formula (I).
- the oxime ester compound represented by the general formula (I) has geometric isomers due to oxime double bonds, but these are not distinguished. That is, in this specification, the oxime ester compound represented by the above general formula (I) and the exemplified compound thereof represent a mixture of both or one of them when a geometric isomer is present in the compound. It is not limited to one geometric isomer specified in the specification.
- the number of carbon atoms represented by R 3 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 21 , R 22 , R 23 and R 24 is 1 to Examples of the alkyl group of 20 include, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, amyl, isoamyl, t-amyl, hexyl, heptyl, octyl, isooctyl, 2-ethylhexyl, t -Octyl, nonyl, isononyl, decyl, isodecyl, undecyl, dodecyl, tetradecyl, hexadecyl, octadecyl, icosyl, cyclopentyl, cycl
- Examples of the aryl group having 6 to 30 carbon atoms represented by R 3 , R 11 , R 12 , R 13 , R 21 , R 22 , R 23 and R 24 in the general formula (I) include: Phenyl, tolyl, xylyl, ethylphenyl, naphthyl, anthryl, phenanthrenyl, phenyl, biphenylyl, naphthyl, anthryl substituted with one or more of the above alkyl groups.
- Examples of the arylalkyl group having 7 to 30 carbon atoms represented by R 3 , R 11 , R 12 , R 13 , R 21 , R 22 , R 23 and R 24 in the general formula (I) include , Benzyl, ⁇ -methylbenzyl, ⁇ , ⁇ -dimethylbenzyl, phenylethyl and the like.
- Examples of the heterocyclic group having 2 to 20 carbon atoms represented by R 3 , R 11 , R 12 , R 13 , R 21 , R 22 , R 23 , and R 24 in the general formula (I) include For example, pyridyl, pyrimidyl, furyl, thienyl, tetrahydrofuryl, dioxolanyl, benzoxazol-2-yl, tetrahydropyranyl, pyrrolidyl, imidazolidyl, pyrazolidyl, thiazolidyl, isothiazolidyl, oxazolidyl, isoxazolidyl, piperidyl, piperazyl, morpholinyl, etc. And a group in which a 5- to 7-membered heterocyclic ring and a methylene chain are combined.
- R 3 and R 7 , R 3 and R 8 , R 4 and R 5 , R 5 and R 6, or R 6 and R 7 can be combined to form a ring.
- Preferred examples include 5- to 7-membered rings such as cyclopentane ring, cyclohexane ring, cyclopentene ring, benzene ring, piperidine ring, morpholine ring, lactone ring and lactam ring.
- R 4 , R 5 , R 6 , R 7 and R 8 in the general formula (I), and R 3 , R 11 , R 12 , R 13 , R 21 in the general formula (I). , R 22 and R 23 may be substituted with fluorine, chlorine, bromine and iodine.
- the methylene groups in the groups represented by R 11 , R 12 , R 13 , R 21 , R 22 and R 23 are —O—, —S—, —COO—, — 1 under the condition that oxygen atoms are not adjacent to each other by OCO—, —NR 22 —, —NR 22 CO—, —NR 22 COO—, —OCONR 22 —, —SCO—, —COS—, —OCS— or —CSO—.
- the bonding group to be replaced at this time may be one kind or two or more kinds. In the case of a group which can be continuously replaced, two or more groups may be continuously replaced.
- Moiety may have a branched side chain or may be a cyclic alkyl.
- cyclic alkyl include cyclic alkyl having 4 to 8 carbon atoms such as cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl and the like.
- groups in which the alkyl moiety of the group represented by R 3 , R 11 , R 12 , R 13 , R 21 , R 22 and R 23 is a cyclic alkyl include cyclobutylmethyl, cyclobutylethyl, cyclobutyl Carbon atoms such as propyl, cyclobutylbutyl, cyclopentylmethyl, cyclopentylethyl, cyclopentylpropyl, cyclopentylbutyl, cyclohexylmethyl, cyclohexylethyl, cyclohexylpropyl, cyclohexylbutyl, cycloheptylmethyl, cycloheptylethyl, cycloheptylpropyl, cycloheptylbutyl, etc. Examples thereof include 5 to 12 cycloalkyl groups.
- preferred specific examples of the compound represented by the above general formula (I) include the following compound Nos. 1-No. 30.
- the present invention is not limited by the following compounds.
- R 1 is preferably a linear alkyl group having 1 to 12 carbon atoms and a cycloalkylalkyl group having 5 to 12 carbon atoms
- R 2 is preferably a linear alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms (particularly a phenyl group)
- R 3 is a linear alkyl group having 1 to 6 carbon atoms
- COR 21 [R 21 is an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 10 carbon atoms (particularly a phenyl group)], A hydroxyl group, a nitro group, CN, a halogen atom or an amino group, or an unsubstituted phenyl group or an arylalkyl group having 7 to 10 carbon atoms (particularly a benzyl group) is preferable.
- R 4 , R 5 , R 6 or R 7 is a hydrogen atom, a cyano group
- OR 11 [R 11 is a substituted or unsubstituted alkyl group having 1 to 6 carbon atoms substituted with a hydroxyl group or a carboxyl group] And particularly preferably R 5 is a cyano group
- R 8 is preferably a hydrogen atom or a linear alkyl group having 1 to 6 carbon atoms.
- the total content of the oxime ester compound represented by the general formula (I) in the polymerization initiator (A) is preferably 30 to 100% by mass, more preferably 50 to 100% by mass.
- the polymerization initiator (A) can be used in combination with a known polymerization initiator other than the oxime ester compound represented by the general formula (I).
- Preferred examples of the known polymerization initiator include acetophenone compounds, benzyl compounds, benzophenone compounds, thioxanthone compounds, bisimidazole compounds, acridine compounds, acylphosphine compounds, and the like.
- acetophenone compound examples include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4′-isopropyl-2-hydroxy-2-methylpropiophenone, 2-hydroxymethyl- 2-methylpropiophenone, 2,2-dimethoxy-1,2-diphenylethane-1-one, p-dimethylaminoacetophenone, p-tertiarybutyldichloroacetophenone, p-tertiarybutyltrichloroacetophenone, p-azidoben Salacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropanone-1, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) ) -Butanone-1, Be Zoin, benzoin methyl ether, benzoin ethyl ether, benzoin is
- benzylic compound examples include benzyl.
- benzophenone compounds include benzophenone, methyl o-benzoylbenzoate, Michler's ketone, 4,4′-bisdiethylaminobenzophenone, 4,4′-dichlorobenzophenone, 4-benzoyl-4′-methyldiphenyl sulfide, and the like. It is done.
- thioxanthone compound examples include thioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, and 2,4-diethylthioxanthone.
- hexaarylbisimidazole (HABI, dimer of triaryl-imidazole) can be used.
- HABI hexaarylbisimidazole
- acridine compounds include acridine, 9-phenylacridine, 9- (p-methylphenyl) acridine, 9- (p-ethylphenyl) acridine, 9- (p-iso-propylphenyl) acridine, 9- (p -N-butylphenyl) acridine, 9- (p-tert-butylphenyl) acridine, 9- (p-methoxyphenyl) acridine, 9- (p-ethoxyphenyl) acridine, 9- (p-acetylphenyl) acridine 9- (p-dimethylaminophenyl) acridine, 9- (p-cyanophenylphenyl) acridine, 9- (p-chlorophenyl) acridine, 9- (p-bromophenyl) acridine, 9--
- acylphosphine compounds examples include 2,4,6-trimethylbenzoyldiphenylphosphine oxide (Lucirin TPO; manufactured by BASF), isobutyryl-methylphosphinic acid methyl ester, isobutyryl-phenylphosphinic acid methyl ester, and pivaloyl-phenylphosphinic acid methyl.
- Lucirin TPO 2,4,6-trimethylbenzoyldiphenylphosphine oxide
- isobutyryl-methylphosphinic acid methyl ester isobutyryl-phenylphosphinic acid methyl ester
- pivaloyl-phenylphosphinic acid methyl examples include 2,4,6-trimethylbenzoyldiphenylphosphine oxide (Lucirin TPO; manufactured by BASF), isobutyryl-methylphosphinic acid methyl ester, isobutyryl-phenylphosphinic acid methyl ester, and pivaloyl-phen
- the content of the polymerization initiator (A) is preferably 0.1 to 10 parts by mass and preferably 0.5 to 5 parts by mass with respect to 100 parts by mass of the solid content of the conductive paste of the present invention. Is preferred.
- solid content means the component except a solvent among a certain component. The same applies to the following description.
- Binder resin examples include polyolefin polymers such as polyethylene, polypropylene and polyisobutylene; diene polymers such as polybutadiene and polyisoprene; polymers having a conjugated polyene structure such as polyacetylene polymers and polyphenylene polymers; polyvinyl chloride and polystyrene.
- the weight average molecular weight (Mw) of the binder resin (B) is that converted into polystyrene by gel permeation chromatography (GPC), preferably 1,000 to 500,000, more preferably 2,000 to 200,000. Most preferably, it is 3,000 to 100,000. If the Mw of the binder resin is less than 1,000, the heat resistance of the film tends to decrease, whereas if it exceeds 500,000, the developability and coating property of the film tend to decrease.
- the acid value of the binder resin (B) is preferably 30 to 300 mgKOH / g. If the acid value is less than 30 mgKOH / g, the developability may be deteriorated, and if the acid value is more than 300 mgKOH / g, the resin may be deteriorated.
- An esterified product with a product is preferable because of its high sensitivity and resolution.
- M is a direct bond, an alkylene group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms, an aryl group having 6 to 12 carbon atoms, O, S, SO 2 , SS, SO, CO, OCO or a group represented by the following general formula (II-1), (II-2) or (II-3) is represented, and R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 and R 108 each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms or a halogen atom, and s is a number from 0 to 10 Represents.) ( R109 , R110 , R111 , R112 , R113 , R114 , R115 , R116 , R117 , R118 , R119 , R120 , R121
- * means
- examples of the alkylene group having 1 to 4 carbon atoms include those represented by — (CH 2 ) 1-4 — as the linear alkylene
- examples of branched alkylene include 1-methylmethane-1,1-diyl, 1-ethylmethane-1,1-diyl, 1-propylmethane-1,1-diyl, 1-methylethane-1,2-diyl, 1- Examples include ethylethane-1,2-diyl, 1-methylpropane-1,3-diyl and the like.
- Examples of the alicyclic hydrocarbon group having 3 to 30 carbon atoms in the general formula (II) include cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecanyl, 1-adamantyl, 2-adamantyl, noradamantyl, and 2-methyl.
- an alkoxy group having 1 to 10 carbon atoms represented by R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 and R 108 , II-1), (II-2) or (II-3), R 109 , R 110 , R 111 , R 112 , R 113 , R 114 , R 115 , R 116 , R 117 , R 118 , R 119 , R 120 , R 121 , R 122 , R 123 , R 124 , R 125 , R 126 , R 127 , R 128 , R 129 , R 130 , R 131, and R 132 and 1 to 10 carbon atoms
- the alkoxy group include methyloxy, ethyloxy, propy
- Amyloxy isoamyloxy, tert-amyloxy, hexyloxy, cyclohexyloxy, heptyloxy, isoheptyloxy, tert-heptyloxy, n-octyloxy, isooctyloxy, tert-octyloxy, 2-ethylhexyloxy, nonyloxy, decyloxy Etc.
- R 126 , R 127 , R 128 , R 129 , R 130 , R 131, or R 132 , R 3 and R 7 , R 3 and R 8 in the above general formula (I) can be used.
- the unsaturated monobasic acid that acts on the epoxy compound represented by the general formula (II) includes acrylic acid, methacrylic acid, crotonic acid, cinnamic acid, sorbic acid, hydroxyethyl methacrylate / malate, hydroxyethyl acrylate / malate. , Hydroxypropyl methacrylate / malate, hydroxypropyl acrylate / malate, dicyclopentadiene / malate and the like, and acrylic acid and methacrylic acid are particularly preferable.
- the polybasic acid anhydride to be acted after the unsaturated monobasic acid is allowed to act is biphenyltetracarboxylic dianhydride, tetrahydrophthalic anhydride, succinic anhydride, biphthalic anhydride, maleic anhydride, Trimellitic anhydride, pyromellitic anhydride, 2,2'-3,3'-benzophenone tetracarboxylic anhydride, ethylene glycol bisanhydro trimellitate, glycerol tris anhydro trimellitate, hexahydrophthalic anhydride , Methyltetrahydrophthalic anhydride, nadic anhydride, methylnadic anhydride, trialkyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, 5- (2,5-dioxotetrahydrofuryl) -3-methyl-3-cyclohexene -1,2-dicarboxylic an
- the reaction molar ratio of the epoxy compound, the unsaturated monobasic acid and the polybasic acid anhydride is preferably as follows. That is, the epoxy addition compound has a ratio of 0.1 to 1.0 carboxyl groups of the unsaturated monobasic acid to one epoxy group of the epoxy compound, particularly 0.4 to 1.0.
- the ethylenically unsaturated compound is preferably added such that the acid anhydride structure of the polybasic acid anhydride is 0.1 to 1.0 with respect to one hydroxyl group of the epoxy adduct. It is preferable that the ratio is one, particularly 0.4 to 1.0. Reaction of the said epoxy compound, the said unsaturated monobasic acid, and the said polybasic acid anhydride can be performed in accordance with a conventional method.
- the binder resin (B) is preferably 1 to 50 parts by mass, more preferably 10 to 30 parts by mass in terms of solid content with respect to 100 parts by mass of the conductive paste of the present invention.
- solid content conversion means converting except a solvent. The same applies to the following description.
- the ethylenically unsaturated compound (C) means a compound having an ethylenically unsaturated bond in the structure.
- Examples of such a compound include ethylene, propylene, butylene, isobutylene, vinyl chloride, vinylidene chloride, fluorine.
- Unsaturated aliphatic hydrocarbons such as vinylidene fluoride and tetrafluoroethylene; (meth) acrylic acid, ⁇ -chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, fumaric acid, hymic acid, crotonic acid, isocrotonic acid, vinylacetic acid Allyl acetate, cinnamic acid, sorbic acid, mesaconic acid, succinic acid mono [2-acryloyloxyethyl], phthalic acid mono [2-acryloyloxyethyl], ⁇ -carboxypolycaprolactone monoacrylate, etc.
- Monoacrylate and succinic acid monoacrylate of polymer having hydroxyl group and hydroxyl group Monoacrylate or methacrylate of a polymer having a carboxyl group and a hydroxyl group at both ends, such as [2-methacryloyloxyethyl], mono [2-methacryloyloxyethyl] phthalate, and ⁇ -carboxypolycaprolactone monomethacrylate; Acrylate malate, hydroxypropyl acrylate malate, dicyclopentadiene malate or polyfunctional acrylate having one carboxyl group and two or more acryloyl groups, hydroxyethyl methacrylate malate, hydroxypropyl methacrylate malate, dicyclopentadiene .
- Unsaturated polybasic acids such as malate or polyfunctional methacrylate having one carboxyl group and two or more methacryloyl groups; acrylic acid-2-hydroxyethyl , Acrylic acid 2-hydroxypropyl, glycid
- A1-No. A4 methyl acrylate, butyl acrylate, isobutyl acrylate, tert-butyl acrylate, cyclohexyl acrylate, n-octyl acrylate, isooctyl acrylate, isononyl acrylate, stearyl acrylate, lauryl acrylate, methoxy acrylate Ethyl, dimethylaminomethyl acrylate, dimethylaminoethyl acrylate, aminopropyl acrylate, dimethylaminopropyl acrylate, ethoxyethyl acrylate, poly (ethoxy) ethyl acrylate, butoxyethoxyethyl acrylate, ethylhexyl acrylate, acrylic acid Phenoxyethyl, tetrahydrofuryl acrylate, vinyl acrylate, allyl acrylate, benzyl acrylate, ethylene glycol diacrylate
- Macromonomers having a monomethacryloyl group at the end of the polymer molecular chain such as limethyl methacrylate, poly-n-butyl methacrylate and polysiloxane; vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate, triallyl phosphate , Triallyl isocyanurate, vinyl thioether, vinyl imidazole, vinyl oxazoline, vinyl carbazole, vinyl pyrrolidone, vinyl pyridine, vinyl urethane compound of hydroxyl group-containing vinyl monomer and polyisocyanate compound, vinyl epoxy compound of hydroxyl group-containing vinyl monomer and polyepoxy compound Is mentioned.
- vinyl chloride vinylidene chloride, divinyl succinate, diallyl phthalate, triallyl phosphate , Triallyl isocyanurate, vinyl thioether, vinyl imidazole, vinyl oxazoline, vinyl carbazole, vinyl pyrrolidon
- the said ethylenically unsaturated compound (C) can be used individually or in mixture of 2 or more types.
- a monoacrylate or methacrylate of a polymer having a carboxyl group and a hydroxyl group at both ends a polyfunctional acrylate or polyfunctional methacrylate having one carboxyl group and two or more acryloyl groups or methacryloyl groups, unsaturated one Basic acids and esters of polyhydric alcohols or polyhydric phenols are preferred from the viewpoints of curability and chromaticity characteristics.
- the content of the ethylenically unsaturated compound (C) is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the solid content of the conductive paste of the present invention. More preferred is part by mass.
- conductive particles (D) powders of various metals and alloys, or oxides thereof can be used.
- a spherical shape As the shape of the conductive particles (D), a spherical shape, a plate shape, a lump shape, a conical shape, a needle shape, a rod shape, a flake shape, and a dentlite shape can be used. Is preferable.
- the conductive particles (D) have an average particle size of 0.05 to 10 ⁇ m, preferably 0.1 to 5 ⁇ m.
- an average particle diameter is calculated
- the content of the conductive particles (D) is preferably 30 to 90 parts by mass, more preferably 50 to 85 parts by mass with respect to 100 parts by mass of the solid content of the conductive paste of the present invention. It is.
- each of the above components a polymerization initiator (A) containing one or more oxime ester compounds represented by the above general formula (I), a binder resin (B), ethylene as required
- a solvent capable of dissolving or dispersing the unsaturated compound (C), conductive particles (D), etc. such as methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone, cyclohexanone, 2-heptanone Ketones such as ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane, dipropylene glycol dimethyl ether, etc .; methyl acetate, ethyl acetate, acetic acid-n-propyl, acetic acid I
- Alcohol solvents ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol-1-monomethyl ether-2-acetate, dipropylene glycol monomethyl ether acetate, 3-methoxybutyl ether acetate, ethoxyethyl ether propionate, etc.
- Ether ester solvents such as benzene, toluene, xylene; hexane, heptane, octane, cyclohexa Aliphatic hydrocarbon solvents such as terpene oils, terpene hydrocarbon oils such as terpine oil, D-limonene, pinene, etc .; paraffins such as mineral spirits, Swazol # 310 (Cosmo Matsuyama Petroleum), Solvesso # 100 (Exxon Chemical) Solvent: Halogenated aliphatic hydrocarbon solvent such as carbon tetrachloride, chloroform, trichloroethylene, methylene chloride, 1,2-dichloroethane; Halogenated aromatic hydrocarbon solvent such as chlorobenzene; Carbitol solvent; Aniline; Triethylamine; Pyridine, acetic acid, acetonitrile, carbon disulfide, N, N-dimethylformamide, N, N-d
- the content of the solvent (E) is preferably 50 to 1000 parts by mass, more preferably 80 to 150 parts by mass with respect to 100 parts by mass of the solid content of the conductive paste of the present invention. .
- the conductive paste of the present invention can further contain an inorganic compound other than the conductive particles (D).
- the inorganic compound include metal oxides such as nickel oxide, iron oxide, iridium oxide, titanium oxide, zinc oxide, magnesium oxide, calcium oxide, potassium oxide, silica, and alumina; graphite, layered clay mineral, miloli blue, carbonic acid Calcium, magnesium carbonate, cobalt, manganese, glass powder (especially glass frit), mica, talc, kaolin, ferrocyanide, various metal sulfates, sulfides, selenides, aluminum silicate, calcium silicate, aluminum hydroxide, Examples include platinum, gold, silver, and copper. These inorganic compounds can use 1 type (s) or 2 or more types.
- the content of the inorganic compound is preferably 5 to 1000 parts by mass, preferably 50 to 100 parts by mass with respect to 100 parts by mass of the solid content of the conductive paste of the present invention.
- inorganic compounds are used, for example, as fillers, antireflection agents, conductive agents, stabilizers, flame retardants, mechanical strength improvers, special wavelength absorbers, ink repellents, and the like.
- a dispersant for dispersing the conductive particles (D) and / or inorganic compounds can be added.
- the dispersing agent is not limited as long as it can disperse and stabilize the conductive particles (D) or the inorganic compound, and a commercially available dispersing agent, for example, BYK series manufactured by BYK Chemie Corporation can be used.
- a polymer dispersant comprising a polyester, polyether, or polyurethane having a basic functional group, a nitrogen atom as the basic functional group, and the functional group having a nitrogen atom is an amine and / or a quaternary salt thereof. And those having an amine value of 1 to 100 mgKOH / g are preferably used.
- thermal polymerization inhibitors such as p-anisole, hydroquinone, pyrocatechol, t-butylcatechol, phenothiazine; transferability imparting agent; thermal polymerization initiator; colorant; Plasticizer; Adhesion promoter; Filler; Defoamer; Leveling agent; Surface conditioner; Antioxidant; Ultraviolet absorber; Stabilizer; Dispersion aid; Anti-agglomeration agent; Catalyst; Effect promoter; A conventional additive such as a sticking agent; a release agent can be added.
- the amount of optional components other than (D) is appropriately selected according to the purpose of use and is not particularly limited, but is preferably solid of the conductive paste of the present invention.
- the total amount is 50 parts by mass or less per 100 parts by mass.
- the properties of the cured product can be improved by using another organic polymer together with the binder resin (B) in the conductive paste of the present invention.
- the organic polymer include polystyrene, polymethyl methacrylate, methyl methacrylate-ethyl acrylate copolymer, polyacrylic acid, polymethacrylic acid, styrene-acrylic acid copolymer, styrene-methacrylic acid copolymer, acrylic acid.
- -Methyl methacrylate copolymer methacrylic acid-methyl methacrylic acid copolymer, ethylene-vinyl chloride copolymer, ethylene-vinyl copolymer, polyvinyl chloride resin, ABS resin, nylon 6, nylon 66, nylon 12, urethane Resin, polycarbonate polyvinyl butyral, cellulose ester, polyacrylamide, saturated polyester, phenol resin, phenoxy resin, polyamideimide resin, polyamic acid resin, epoxy resin, etc., among these, polystyrene Acrylate - methyl methacrylate copolymer, methacrylic acid - methyl methacrylate copolymers, and epoxy resins.
- a chain transfer agent a sensitizer, a surfactant, a silane coupling agent, melamine and the like can be used in combination with the conductive paste of the present invention.
- a sulfur atom-containing compound is generally used.
- Alkyl compounds trimethylolpropane tris (3-mercaptoisobutyrate), butanediol bis (3-mercaptoisobutyrate), hexanedithiol, decanedithiol, 1,4- Methyl mercaptobenzene, butanediol bisthiopropionate, butanediol bisthioglycolate, ethylene glycol bisthioglycolate, trimethylolpropane tristhioglycolate, butanediol bisthiopropionate, trimethylolpropane tristhiopropionate , Trimethylolpropane tristhioglycolate, pentaerythritol tetrakisthiopropionate, pentaerythritol tetrakisthioglycolate, trishydroxyethyltristhiopropionate, diethylthioxanthone, diisopropyl
- the surfactant examples include fluorine surfactants such as perfluoroalkyl phosphates and perfluoroalkyl carboxylates; anionic surfactants such as higher fatty acid alkali salts, alkyl sulfonates, and alkyl sulfates; higher amines Cationic surfactants such as halogenates and quaternary ammonium salts; Nonionic surfactants such as polyethylene glycol alkyl ethers, polyethylene glycol fatty acid esters, sorbitan fatty acid esters, and fatty acid monoglycerides; amphoteric surfactants; silicone surfactants Surfactants such as agents can be used, and these may be used in combination.
- fluorine surfactants such as perfluoroalkyl phosphates and perfluoroalkyl carboxylates
- anionic surfactants such as higher fatty acid alkali salts, alkyl sulfonates, and alkyl sulfates
- silane coupling agent for example, a silane coupling agent manufactured by Shin-Etsu Chemical Co., Ltd. can be used. Among them, an isocyanate group, a methacryloyl group or an epoxy group such as KBE-9007, KBM-502, KBE-403, etc. A silane coupling agent is preferably used.
- Examples of the melamine compound include all or part of active methylol groups (CH 2 OH groups) in nitrogen compounds such as (poly) methylol melamine, (poly) methylol glycoluril, (poly) methylol benzoguanamine, and (poly) methylol urea.
- nitrogen compounds such as (poly) methylol melamine, (poly) methylol glycoluril, (poly) methylol benzoguanamine, and (poly) methylol urea.
- Examples include compounds in which (at least two) are alkyl etherified.
- examples of the alkyl group constituting the alkyl ether include a methyl group, an ethyl group, and a butyl group, which may be the same as or different from each other.
- the methylol group which is not alkyletherified may be self-condensed within one molecule, or may be condensed between two molecules, and as a result, an oligomer component may be formed.
- an oligomer component may be formed.
- hexamethoxymethyl melamine, hexabutoxymethyl melamine, tetramethoxymethyl glycoluril, tetrabutoxymethyl glycoluril and the like can be used.
- alkyl etherified melamines such as hexamethoxymethyl melamine and hexabutoxymethyl melamine are preferable.
- the conductive pattern of the present invention comprises (1) a step of applying the conductive paste of the present invention onto a substrate and forming a coating film on the substrate, (2) a step of drying the coating film, and (3) the dried A step of irradiating and curing radiation (energy rays) through a mask having a predetermined pattern shape, (4) a step of developing the cured coating layer, and (5) baking the coating layer after development. It is preferably formed by the process of performing. Hereinafter, each process is demonstrated in order.
- the step (1) is a step of applying the prepared conductive paste of the present invention to a target substrate and forming a coating film on the substrate.
- the target substrate include soda glass, quartz glass, semiconductor substrate, metal, paper, and plastic.
- the coating method is not particularly limited, and known means such as a spin coater, roll coater, bar coater, die coater, blade coater, curtain coater, various printing and dipping can be employed.
- the formation of the coating film of the conductive paste of the present invention on a substrate can be transferred to another substrate after the coating film of the conductive paste of the present invention is once formed on a substrate such as a film.
- the step (2) is a step for drying (pre-baking) the coating film formed on the substrate and removing the solvent (E) from the coating film.
- the pre-baked coating film is hardly soluble in an alkaline solution, and a portion irradiated with energy rays (hereinafter sometimes referred to as an exposed portion) is irradiated with energy rays in the next exposure step to be alkali-soluble. .
- the pre-baking temperature varies depending on the type of the solvent (E) used, but if the temperature is too low, the residual amount of the solvent (E) increases, which may cause a reduction in exposure sensitivity and resolution. If the temperature is too high, the entire coating is cured by pre-baking, and the solubility in the alkaline developer of the part irradiated with the energy rays is reduced, and as a result, the exposure sensitivity and resolution may be reduced. 80 to 150 ° C is preferable, and 90 to 120 ° C is more preferable.
- the prebaking time varies depending on the kind of the solvent (E) used and the prebaking temperature, but is preferably 30 seconds to 10 minutes, and more preferably 1 to 5 minutes.
- the step (3) is a step of curing the coating film of the conductive paste of the present invention by irradiating the dried coating film with radiation (energy rays) through a mask having a predetermined pattern shape.
- the energy ray light source used for curing the coating film of the conductive paste of the present invention includes an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a medium pressure mercury lamp, a low pressure mercury lamp, a mercury vapor arc lamp, a xenon arc lamp, carbon High energy such as electromagnetic wave energy, electron beam, X-ray, radiation, etc.
- arc lamp having a wavelength of 2000 angstrom to 7000 angstrom obtained from arc lamp, metal halide lamp, fluorescent lamp, tungsten lamp, excimer lamp, germicidal lamp, light emitting diode, CRT light source, etc.
- An ultra high pressure mercury lamp, a mercury vapor arc lamp, a carbon arc lamp, a xenon arc lamp, and the like that emit light having a wavelength of 300 to 450 nm are preferable.
- an image is directly formed from digital information such as a computer without using a mask by using a laser beam as an exposure light source.
- the laser direct writing method is useful because it can improve not only productivity but also resolution and positional accuracy.
- the laser light light having a wavelength of 340 to 430 nm is preferably used.
- Lasers that emit light in the visible to infrared region such as excimer laser, nitrogen laser, argon ion laser, helium cadmium laser, helium neon laser, krypton ion laser, various semiconductor lasers, and YAG laser are also used.
- a sensitizing dye that absorbs the region from visible to infrared is added.
- a negative type mask or a positive type mask can be used in accordance with the components to be used.
- a multi-tone mask such as a halftone mask or a gray scale mask is used. It can also be used.
- the step (4) is a step of forming a predetermined pattern by removing a portion of the coating film after the exposure whose alkali solubility has been improved by irradiation light using a developer.
- any method such as a liquid filling method, a dipping method, a shower method, or a spray method can be used.
- the developer used in the development step is not particularly limited as long as the exposed portion can be removed by dissolving or dispersing in the solution.
- sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium silicate Inorganic alkalis such as ammonia
- primary amines such as ethylamine and n-propylamine
- secondary amines such as diethylamine and di-n-propylamine
- tertiary amines such as trimethylamine, methyldiethylamine, dimethylethylamine and triethylamine
- Tertiary alkanolamines such as dimethylethanolamine, methyldiethanolamine, triethanolamine
- pyrrole piperidine, N-methylpiperidine, N-methylpyrrolidine, 1,8-diazabicyclo [5.4.0] -7-undecene 1,5-diazabicik [4.3.0]
- Cyclic tertiary amines such as 5-nonen
- the exposed portion After removing the exposed portion with a developer, it is preferably rinsed with running water or water with a shower, and may be dehydrated and dried at 50 to 120 ° C. if necessary.
- the step (5) is a step of baking (post-baking) the coated film after development.
- post-baking By baking the coating film in this step, curing shrinkage of the binder resin occurs and the conductive particles come into contact with each other to obtain sufficient conductivity, and chemical resistance is also improved.
- the post-bake is preferably performed in an atmosphere of an inert gas such as nitrogen, helium or argon at 100 to 300 ° C. for 10 to 60 minutes.
- the conductive pattern formed by the steps (1) to (5) preferably has a thickness of 3 to 5 ⁇ m and a conductor width of 5 to 20 ⁇ m because a good pattern can be obtained with low resistance.
- the conductive pattern of the present invention can be used for applications such as touch panels, touch sensors, and three-dimensional mounting.
- components other than B-1, B-2 and B-3 and E-1 which is a solvent do not contain a solvent and have a solid content of 100%.
- the conductive paste of the present invention is useful as a conductive pattern because it is excellent in sensitivity, resolution and adhesion and has a low specific resistance value.
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Abstract
Description
R11、R12及びR13は、それぞれ独立に、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
R11、R12及びR13で表わされる基の水素原子は、更にR21、OR21、COR21、SR21、NR22R23、CONR22R23、-NR22-OR23、-NCOR22-OCOR23、NR22COR21、OCOR21、COOR21、SCOR21、OCSR21、COSR21、CSOR21、水酸基、ニトロ基、CN、アミノ基、ハロゲン原子又はCOOR21で置換されている場合もあり、
R21、R22及びR23は、それぞれ独立に、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
R21、R22及びR23で表される基の水素原子は、更に水酸基、ニトロ基、CN、ハロゲン原子、水酸基又はカルボキシル基で置換されている場合もあり、
R11、R12、R13、R21、R22及びR23で表される基中のメチレン基は、-O-、-S-、-COO-、-OCO-、-NR24-、-NR24COO-、-OCONR24-、-SCO-、-COS-、-OCS-又は-CSO-により酸素原子が隣り合わない条件で1~5回置き換えられている場合もあり、
R24は、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
R11、R12、R13、R21、R22、R23及びR24で表される基がアルキル部分を有する場合、該アルキル部分は、分岐側鎖を有する場合もあり、環状アルキルである場合もあり、
R3は、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、R3で表される基がアルキル部分を有する場合、該アルキル部分は、分岐側鎖を有する場合もあり、環状アルキルである場合もあり、
R3で表わされる基の水素原子は、更にR21、OR21、COR21、SR21、NR22R23、CONR22R23、-NR22-OR23、-NCOR22-OCOR23、NR22COR21、OCOR21、COOR21、SCOR21、OCSR21、COSR21、CSOR21、水酸基、ニトロ基、CN、ハロゲン原子又はCOOR21で置換されている場合もあり、
R4、R5、R6及びR7は、それぞれ独立に、R11、OR11、SR11、COR14、CONR15R16、NR12COR11、OCOR11、COOR14、SCOR11、OCSR11、COSR14、CSOR11、水酸基、CN又はハロゲン原子を表し、
また、R3とR7、R3とR8、R4とR5、R5とR6又はR6とR7はそれぞれ一緒になって環を形成している場合もあり、
R14、R15及びR16は、水素原子又は炭素原子数1~20のアルキル基を表し、
R8は、R11、OR11、SR11、COR11、CONR12R13、NR12COR11、OCOR11、COOR11、SCOR11、OCSR11、COSR11、CSOR11、水酸基、CN又はハロゲン原子を表し、
nは、0又は1を表す。)
R 11 , R 12 and R 13 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a carbon atom. Represents a heterocyclic-containing group of formula 2 to 20,
The hydrogen atoms of the groups represented by R 11 , R 12 and R 13 are further R 21 , OR 21 , COR 21 , SR 21 , NR 22 R 23 , CONR 22 R 23 , —NR 22 —OR 23 , —NCOR 22 -OCOR 23 , NR 22 COR 21 , OCOR 21 , COOR 21 , SCOR 21 , OCSR 21 , COSR 21 , CSOR 21 , hydroxyl group, nitro group, CN, amino group, halogen atom or COOR 21 may be substituted ,
R 21 , R 22 and R 23 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a carbon atom. Represents a heterocyclic-containing group of formula 2 to 20,
The hydrogen atom of the group represented by R 21 , R 22 and R 23 may be further substituted with a hydroxyl group, a nitro group, CN, a halogen atom, a hydroxyl group or a carboxyl group,
The methylene groups in the groups represented by R 11 , R 12 , R 13 , R 21 , R 22 and R 23 are —O—, —S—, —COO—, —OCO—, —NR 24 —, — NR 24 COO—, —OCONR 24 —, —SCO—, —COS—, —OCS— or —CSO— may be substituted 1 to 5 times under the condition that the oxygen atoms are not adjacent to each other,
R 24 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. Represent,
When the group represented by R 11 , R 12 , R 13 , R 21 , R 22 , R 23 and R 24 has an alkyl moiety, the alkyl moiety may have a branched side chain and is a cyclic alkyl. In some cases,
R 3 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. And when the group represented by R 3 has an alkyl moiety, the alkyl moiety may have a branched side chain or a cyclic alkyl,
The hydrogen atom of the group represented by R 3 is further represented by R 21 , OR 21 , COR 21 , SR 21 , NR 22 R 23 , CONR 22 R 23 , —NR 22 —OR 23 , —NCOR 22 —OCOR 23 , NR 22 COR 21 , OCOR 21 , COOR 21 , SCOR 21 , OCSR 21 , COSR 21 , CSOR 21 , hydroxyl group, nitro group, CN, halogen atom or COOR 21 may be substituted,
R 4 , R 5 , R 6 and R 7 are each independently R 11 , OR 11 , SR 11 , COR 14 , CONR 15 R 16 , NR 12 COR 11 , OCOR 11 , COOR 14 , SCOR 11 , OCSR 11 , COSR 14 , CSOR 11 , a hydroxyl group, CN or a halogen atom,
R 3 and R 7 , R 3 and R 8 , R 4 and R 5 , R 5 and R 6 or R 6 and R 7 may be combined to form a ring,
R 14 , R 15 and R 16 represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms,
R 8 is R 11 , OR 11 , SR 11 , COR 11 , CONR 12 R 13 , NR 12 COR 11 , OCOR 11 , COOR 11 , SCOR 11 , OCSR 11 , COSR 11 , CSOR 11 , hydroxyl group, CN or halogen atom Represents
n represents 0 or 1. )
本発明で用いられる重合開始剤(A)は、上記一般式(I)で表されるオキシムエステル化合物の一種以上を含有する。
上記一般式(I)で表わされるオキシムエステル化合物には、オキシムの二重結合による幾何異性体が存在するが、これらを区別するものではない。
即ち、本明細書において、上記一般式(I)で表わされるオキシムエステル化合物及びその例示化合物は、その化合物に幾何異性体が存在する場合、両方の混合物又はどちらか一方を表すものであり、本明細書中に明示した一方の幾何異性体に限定されるものではない。 <Polymerization initiator (A)>
The polymerization initiator (A) used in the present invention contains one or more oxime ester compounds represented by the above general formula (I).
The oxime ester compound represented by the general formula (I) has geometric isomers due to oxime double bonds, but these are not distinguished.
That is, in this specification, the oxime ester compound represented by the above general formula (I) and the exemplified compound thereof represent a mixture of both or one of them when a geometric isomer is present in the compound. It is not limited to one geometric isomer specified in the specification.
また、上記一般式(I)中の、R3、R11、R12、R13、R21、R22及びR23で表される基がアルキル(アルキレン)部分を有する場合、このアルキル(アルキレン)部分は、分岐側鎖を有する場合もあり、環状アルキルである場合もある。環状アルキルとしては、シクロブチル、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチル等の炭素原子数4~8の環状アルキル挙げられる。例えば、R3、R11、R12、R13、R21、R22及びR23で表される基のアルキル部分が、環状アルキルである基としては、シクロブチルメチル、シクロブチルエチル、シクロブチルプロピル、シクロブチルブチル、シクロペンチルメチル、シクロペンチルエチル、シクロペンチルプロピル、シクロペンチルブチル、シクロヘキシルメチル、シクロヘキシルエチル、シクロヘキシルプロピル、シクロヘキシルブチル、シクロヘプチルメチル、シクロヘプチルエチル、シクロヘプチルプロピル、シクロヘプチルブチル等の炭素原子数5~12のシクロアルキル基等が挙げられる。 In the general formula (I), the methylene groups in the groups represented by R 11 , R 12 , R 13 , R 21 , R 22 and R 23 are —O—, —S—, —COO—, — 1 under the condition that oxygen atoms are not adjacent to each other by OCO—, —NR 22 —, —NR 22 CO—, —NR 22 COO—, —OCONR 22 —, —SCO—, —COS—, —OCS— or —CSO—. The bonding group to be replaced at this time may be one kind or two or more kinds. In the case of a group which can be continuously replaced, two or more groups may be continuously replaced.
In addition, when the group represented by R 3 , R 11 , R 12 , R 13 , R 21 , R 22 and R 23 in the general formula (I) has an alkyl (alkylene) moiety, ) Moiety may have a branched side chain or may be a cyclic alkyl. Examples of the cyclic alkyl include cyclic alkyl having 4 to 8 carbon atoms such as cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl and the like. For example, groups in which the alkyl moiety of the group represented by R 3 , R 11 , R 12 , R 13 , R 21 , R 22 and R 23 is a cyclic alkyl include cyclobutylmethyl, cyclobutylethyl, cyclobutyl Carbon atoms such as propyl, cyclobutylbutyl, cyclopentylmethyl, cyclopentylethyl, cyclopentylpropyl, cyclopentylbutyl, cyclohexylmethyl, cyclohexylethyl, cyclohexylpropyl, cyclohexylbutyl, cycloheptylmethyl, cycloheptylethyl, cycloheptylpropyl, cycloheptylbutyl, etc. Examples thereof include 5 to 12 cycloalkyl groups.
R1が、炭素原子数1~12の直鎖のアルキル基、炭素原子数5~12のシクロアルキルアルキル基であるものが好ましく、
R2が、炭素原子数1~6の直鎖のアルキル基、炭素原子数6~10のアリール基(特に、フェニル基)であるものが好ましく、
R3が、炭素原子数1~6の直鎖のアルキル基、COR21〔R21は、炭素原子数1~6のアルキル基又は炭素原子数6~10のアリール基(特にフェニル基)〕、水酸基、ニトロ基、CN、ハロゲン原子若しくはアミノ基で置換されている又は無置換のフェニル基、炭素原子数7~10のアリールアルキル基(特にベンジル基)であるものが好ましく、
R4、R5、R6又はR7が、水素原子、シアノ基、OR11〔R11は、水酸基若しくはカルボキシル基で置換されている又は無置換の炭素原子数1~6のアルキル基〕であるもの、特にR5がシアノ基、OR11〔R11は、水酸基若しくはカルボキシル基で置換されている又は無置換の炭素原子数1~6のアルキル基〕であるものが好ましく、
R8が、水素原子、炭素原子数1~6の直鎖のアルキル基であるものが好ましい。 As the compound represented by the general formula (I),
R 1 is preferably a linear alkyl group having 1 to 12 carbon atoms and a cycloalkylalkyl group having 5 to 12 carbon atoms,
R 2 is preferably a linear alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms (particularly a phenyl group),
R 3 is a linear alkyl group having 1 to 6 carbon atoms, COR 21 [R 21 is an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 10 carbon atoms (particularly a phenyl group)], A hydroxyl group, a nitro group, CN, a halogen atom or an amino group, or an unsubstituted phenyl group or an arylalkyl group having 7 to 10 carbon atoms (particularly a benzyl group) is preferable.
R 4 , R 5 , R 6 or R 7 is a hydrogen atom, a cyano group, OR 11 [R 11 is a substituted or unsubstituted alkyl group having 1 to 6 carbon atoms substituted with a hydroxyl group or a carboxyl group] And particularly preferably R 5 is a cyano group, OR 11 [R 11 is a hydroxyl group or carboxyl group-substituted or unsubstituted alkyl group having 1 to 6 carbon atoms]
R 8 is preferably a hydrogen atom or a linear alkyl group having 1 to 6 carbon atoms.
2,7-ビス(α-フェニルアミノカルボニルオキシ-3,4-ジメチルベンジル)-9-(3,4-ジメチルフェニル)アクリジン及び2,7-ビス(3,5-ジメチル-4-ヒドロキシ-4′-フルオロジフェニルメチル)-9-(4-フルオロフェニル)アクリジン、9,10-ジヒドロアクリジン、1-メチルアクリジン、4-メチルアクリジン、2,3-ジメチルアクリジン、1-フェニルアクリジン、4-フェニルアクリジン、1-ベンジルアクリジン、4-ベンジルアクリジン、1-クロロアクリジン、2,3-ジクロロアクリジン、10-ブチル-2-クロロアクリジン-9(10H)-オン、10-プロピル-2-クロロアクリジン-9(10H)-オン、10-ブチル-2-クロロアクリジン-9(10H)-オン1,2-ビス(9-アクリジニル)エタン、1,3-ビス(9-アクリジニル)プロパン、1,4-ビス(9-アクリジニル)ブタン、1,6-ビス(9-アクリジニル)ヘキサン、1,7-ビス(9-アクリジニル)ヘプタン、1,8-ビス(9-アクリジニル)オクタン、1,9-ビス(9-アクリジニル)ノナン、1,10-ビス(9-アクリジニル)デカン、1,11-ビス(9-アクリジニル)ウンデカン、1,12-ビス(9-アクリジニル)ドデカン、1,14-ビス(9-アクリジニル)テトラデカン、1,16-ビス(9-アクリジニル)ヘキサデカン、1,18-ビス(9-アクリジニル)オクタデカン、1,20-ビス(9-アクリジニル)エイコサン、1,3-ビス(9-アクリジニル)-2-チアプロパン、1,5-ビス(9-アクリジニル)-3-チアペンタン、
7-メチル-ベンゾ〔c〕アクリジン、7-エチル-ベンゾ〔c〕アクリジン、7-プロピル-ベンゾ〔c〕アクリジン、7-ブチル-ベンゾ〔c〕アクリジン、7-ペンチル-ベンゾ〔c〕アクリジン、7-ヘキシル-ベンゾ〔c〕アクリジン、7-ヘプチル-ベンゾ〔c〕アクリジン、7-オクチル-ベンゾ〔c〕アクリジン、7-ノニル-ベンゾ〔c〕アクリジン、7-デシル-ベンゾ〔c〕アクリジン、7-ウンデシル-ベンゾ〔c〕アクリジン、7-ドデシル-ベンゾ〔c〕アクリジン、7-トリデシル-ベンゾ〔c〕アクリジン、7-テトラデシル-ベンゾ〔c〕アクリジン、7-ペンタデシル-ベンゾ〔c〕アクリジン、7-ヘキサデシル-ベンゾ〔c〕アクリジン、7-ヘプタデシル-ベンゾ〔c〕アクリジン、7-オクタデシル-ベンゾ〔c〕アクリジン、7-ノナデシル-ベンゾ〔c〕アクリジン、1,1-ビス(7-ベンゾ〔c〕アクリジニル)メタン、1,2-ビス(7-ベンゾ〔c〕アクリジニル)エタン、1,3-ビス(7-ベンゾ〔c〕アクリジニル)プロパン、1,4-ビス(7-ベンゾ〔c〕アクリジニル)ブタン、1,5-ビス(7-ベンゾ〔c〕アクリジニル)ペンタン、1,6-ビス(7-ベンゾ〔c〕アクリジニル)ヘキサン、1,7-ビス(7-ベンゾ〔c〕アクリジニル)ヘプタン、1,8-ビス(7-ベンゾ〔c〕アクリジニル)オクタン、1,9-ビス(7-ベンゾ〔c〕アクリジニル)ノナン、1,10-ビス(7-ベンゾ〔c〕アクリジニル)デカン、1,11-ビス(7-ベンゾ〔c〕アクリジニル)ウンデカン、1,12-ビス(7-ベンゾ〔c〕アクリジニル)ドデカン、1,13-ビス(7-ベンゾ〔c〕アクリジニル)トリデカン、1,14-ビス(7-ベンゾ〔c〕アクリジニル)テトラデカン、1,15-ビス(7-ベンゾ〔c〕アクリジニル)ペンタデカン、1,16-ビス(7-ベンゾ〔c〕アクリジニル)ヘキサデカン、1,17-ビス(7-ベンゾ〔c〕アクリジニル)ヘプタデカン、1,18-ビス(7-ベンゾ〔c〕アクリジニル)オクタデカン、1,19-ビス(7-ベンゾ〔c〕アクリジニル)ノナデカン、1,20-ビス(7-ベンゾ〔c〕アクリジニル)エイコサン、7-フェニル-ベンゾ〔c〕アクリジン、7-(2-クロルフェニル)-ベンゾ〔c〕アクリジン、7-(4-メチルフェニル)-ベンゾ〔c〕アクリジン、7-(4-ニトロフェニル)-ベンゾ〔c〕アクリジン、1,3-ビス(7-ベンゾ〔c〕アクリジニル)ベンゼン、1,4-ビス(7-ベンゾ〔c〕アクリジニル)ベンゼン、7-〔1-プロペン-3-イル(ベンゾ〔c〕アクリジン)〕、7-〔1-エチルペンチル-(ベンゾ〔c〕アクリジン)〕、7-〔8-ヘプタデセニル-(ベンゾ〔c〕アクリジン)〕、7,8-ジフェニル-1,14-ビス(7-ベンゾ〔c〕アクリジニル)テトラデカン、1,2-ビス(7-ベンゾ〔c〕アクリジニル)エチレン、1-メチル-1,2-ビス(7-ベンゾ〔c〕アクリジニル)エチレン、7-スチリル-ベンゾ〔c〕アクリジン、7-(1-プロペニル)-ベンゾ〔c〕アクリジン、7-(1-ペンテニル)-ベンゾ〔c〕アクリジン、9-(2-ピリジル)アクリジン,9-(3-ピリジル)アクリジン,9-(4-ピリジル)アクリジン,9-(4-ピリミジニル)アクリジン,9-(2-ピラジニル)アクリジン,9(5-メチル-2-ピラジニル)アクリジン,9-(2-キノリニル)アクリジン,9-(2-ピリジル)-2-メチル-アクリジン,9-(2-ピリジル)-2-エチルアクリジン,9-(3-ピリジル)-2-メチル-アクリジン,9-(3-ピリジル)-2,4-ジエチル-アクリジン、3,6-ジアミノ-アクリジンスルフォン酸塩、3,6-ビス-(ジメチルアミノ)-アクリジンスルフォン酸塩、3,6-ジアミノ-10-メチル-アクリジニウムクロライド、9-アクリジンカルボン酸等が挙げられる。 Examples of the acridine compounds include acridine, 9-phenylacridine, 9- (p-methylphenyl) acridine, 9- (p-ethylphenyl) acridine, 9- (p-iso-propylphenyl) acridine, 9- (p -N-butylphenyl) acridine, 9- (p-tert-butylphenyl) acridine, 9- (p-methoxyphenyl) acridine, 9- (p-ethoxyphenyl) acridine, 9- (p-acetylphenyl) acridine 9- (p-dimethylaminophenyl) acridine, 9- (p-cyanophenylphenyl) acridine, 9- (p-chlorophenyl) acridine, 9- (p-bromophenyl) acridine, 9- (m-methyl) Phenyl) acridine, 9- (mn-propylphenyl) acridine, 9- (mi o-propylphenyl) acridine, 9- (mn-butylphenyl) acridine, 9- (m-tert-butylphenyl) acridine, 9- (m-methoxyphenyl) acridine, 9- (m-ethoxyphenyl) Acridine, 9- (m-acetylphenyl) acridine, 9- (m-dimethylaminophenyl) acridine, 9- (m-diethylaminophenyl) acridine, 9- (cyanophenyl) acridine, 9- (m-chlorophenyl) acridine 9- (m-bromophenyl) acridine, 9-methylacridine, 9-ethylacridine, 9-n-propylacridine, 9-iso-propylacridine, 9-cyanoethylacridine, 9-hydroxyethylacridine, 9-chloroethyl Acridine, 9-bromoacridine, 9- Droxyacridine, 9-nitroacridine, 9-aminoacridine, 9-methoxyacridine, 9-ethoxyacridine, 9-n-propoxyacridine, 9-iso-propoxyacridine, 9-chloroethoxyacridine, 4,6-bis ( Dimethylamino) acridine, 10-acetic acid acridine, 10-methylacetacridine, 3,6-dimethylacridine, 7,13-dimethylacridine, 7,13-bis (dimethylamino) acridine, 3,6-dimethyl-10-acetic acid Acridine, 3,5-dimethyl-10-methyl acetate acridine, 7,13-dimethyl-10-acetate acridine, 7,13-dimethyl-10-methyl acetate acridine, 1,7-bis (9-acridinyl) heptane, 1 , 5-Bis (9-acridinyl ) Pentane, 1,3-bis (9-acridinyl) propane, 2,7-dibenzoyl-9-phenylacridine, 2,7-bis (α-hydroxybenzyl) -9-phenylacridine, 2,7-bis (α -Acetoxybenzyl) -9-phenylacridine, 2,7-dimethyl-9- (4-methylphenyl) acridine, 2,7-dimethyl-9-phenylacridine, 2,7-bis (3,4-dimethyl-benzoyl) ) -9- (3,4-dimethylphenyl) acridine, 2,7-bis (α-acetoxy-4-tert-butylbenzyl) -9- (4-tert-butylphenyl) acridine, 2,7-dimethyl- 9- (3,4-dichlorophenyl) acridine, 2,7-dimethyl-9- (4-benzoylphenyl) acridine, 2,7-bis (2-c Lobenzoyl) -9- (2-chlorophenyl) acridine, 2- (α-hydroxy-3-bromobenzyl) -6-methyl-9- (3-bromophenyl) acridine, 2,5-bis (4-tert- Butylbenzoyl) -9- (4-tert-butylphenyl) acridine, 1,4-bis (2,7-dimethyl-9-acridinyl) benzene,
2,7-bis (α-phenylaminocarbonyloxy-3,4-dimethylbenzyl) -9- (3,4-dimethylphenyl) acridine and 2,7-bis (3,5-dimethyl-4-hydroxy-4) '-Fluorodiphenylmethyl) -9- (4-fluorophenyl) acridine, 9,10-dihydroacridine, 1-methylacridine, 4-methylacridine, 2,3-dimethylacridine, 1-phenylacridine, 4-phenylacridine 1-benzylacridine, 4-benzylacridine, 1-chloroacridine, 2,3-dichloroacridine, 10-butyl-2-chloroacridine-9 (10H) -one, 10-propyl-2-chloroacridine-9 ( 10H) -one, 10-butyl-2-chloroacridine-9 (10H) -one 1, -Bis (9-acridinyl) ethane, 1,3-bis (9-acridinyl) propane, 1,4-bis (9-acridinyl) butane, 1,6-bis (9-acridinyl) hexane, 1,7-bis (9-acridinyl) heptane, 1,8-bis (9-acridinyl) octane, 1,9-bis (9-acridinyl) nonane, 1,10-bis (9-acridinyl) decane, 1,11-bis (9 -Acridinyl) undecane, 1,12-bis (9-acridinyl) dodecane, 1,14-bis (9-acridinyl) tetradecane, 1,16-bis (9-acridinyl) hexadecane, 1,18-bis (9-acridinyl) ) Octadecane, 1,20-bis (9-acridinyl) eicosane, 1,3-bis (9-acridinyl) -2-thiapropane, 1,5-bi (9-acridinyl) -3-thiapentane,
7-methyl-benzo [c] acridine, 7-ethyl-benzo [c] acridine, 7-propyl-benzo [c] acridine, 7-butyl-benzo [c] acridine, 7-pentyl-benzo [c] acridine, 7-hexyl-benzo [c] acridine, 7-heptyl-benzo [c] acridine, 7-octyl-benzo [c] acridine, 7-nonyl-benzo [c] acridine, 7-decyl-benzo [c] acridine, 7-undecyl-benzo [c] acridine, 7-dodecyl-benzo [c] acridine, 7-tridecyl-benzo [c] acridine, 7-tetradecyl-benzo [c] acridine, 7-pentadecyl-benzo [c] acridine, 7-hexadecyl-benzo [c] acridine, 7-heptadecyl-benzo [c] acridine, 7-octa Sil-benzo [c] acridine, 7-nonadecyl-benzo [c] acridine, 1,1-bis (7-benzo [c] acridinyl) methane, 1,2-bis (7-benzo [c] acridinyl) ethane, 1,3-bis (7-benzo [c] acridinyl) propane, 1,4-bis (7-benzo [c] acridinyl) butane, 1,5-bis (7-benzo [c] acridinyl) pentane, 6-bis (7-benzo [c] acridinyl) hexane, 1,7-bis (7-benzo [c] acridinyl) heptane, 1,8-bis (7-benzo [c] acridinyl) octane, 1,9- Bis (7-benzo [c] acridinyl) nonane, 1,10-bis (7-benzo [c] acridinyl) decane, 1,11-bis (7-benzo [c] acridinyl) undecane, 2-bis (7-benzo [c] acridinyl) dodecane, 1,13-bis (7-benzo [c] acridinyl) tridecane, 1,14-bis (7-benzo [c] acridinyl) tetradecane, 1,15- Bis (7-benzo [c] acridinyl) pentadecane, 1,16-bis (7-benzo [c] acridinyl) hexadecane, 1,17-bis (7-benzo [c] acridinyl) heptadecane, 1,18-bis ( 7-benzo [c] acridinyl) octadecane, 1,19-bis (7-benzo [c] acridinyl) nonadecane, 1,20-bis (7-benzo [c] acridinyl) eicosane, 7-phenyl-benzo [c] Acridine, 7- (2-chlorophenyl) -benzo [c] acridine, 7- (4-methylphenyl) -benzo [c] acridine, 7- (4-Nitrophenyl) -benzo [c] acridine, 1,3-bis (7-benzo [c] acridinyl) benzene, 1,4-bis (7-benzo [c] acridinyl) benzene, 7- [ 1-propen-3-yl (benzo [c] acridine)], 7- [1-ethylpentyl- (benzo [c] acridine)], 7- [8-heptadecenyl- (benzo [c] acridine)], 7 , 8-Diphenyl-1,14-bis (7-benzo [c] acridinyl) tetradecane, 1,2-bis (7-benzo [c] acridinyl) ethylene, 1-methyl-1,2-bis (7-benzo [C] acridinyl) ethylene, 7-styryl-benzo [c] acridine, 7- (1-propenyl) -benzo [c] acridine, 7- (1-pentenyl) -benzo [c] acridine, 9 (2-pyridyl) acridine, 9- (3-pyridyl) acridine, 9- (4-pyridyl) acridine, 9- (4-pyrimidinyl) acridine, 9- (2-pyrazinyl) acridine, 9 (5-methyl-2 -Pyrazinyl) acridine, 9- (2-quinolinyl) acridine, 9- (2-pyridyl) -2-methyl-acridine, 9- (2-pyridyl) -2-ethylacridine, 9- (3-pyridyl) -2 -Methyl-acridine, 9- (3-pyridyl) -2,4-diethyl-acridine, 3,6-diamino-acridine sulfonate, 3,6-bis- (dimethylamino) -acridine sulfonate, 3, Examples include 6-diamino-10-methyl-acridinium chloride and 9-acridine carboxylic acid.
バインダー樹脂としては、例えば、ポリエチレン、ポリプロピレン、ポリイソブチレン等のポリオレフィン系ポリマー;ポリブタジエン、ポリイソプレン等のジエン系ポリマー;ポリアセチレン系ポリマー、ポリフェニレン系ポリマー等の共役ポリエン構造を有するポリマー;ポリ塩化ビニル、ポリスチレン、酢酸ビニル、ポリビニルアルコール、ポリアクリル酸、ポリアクリル酸エステル、ポリアクリルアミド、ポリアクリロニトリル、ポリビニルフェノール等のビニルポリマー;ポリフェニレンエーテル、ポリオキシラン、ポリオキセタン、ポリテトラヒドロフラン、ポリエーテルケトン、ポリエーテルエーテルケトン、ポリアセタール等のポリエーテル;ノボラック樹脂、レゾール樹脂等のフェノール樹脂;ポリエチレンテレフタレート、ポリフェノールフタレインテレフタレート、ポリカーボネート、アルキッド樹脂、不飽和ポリエステル樹脂等のポリエステル;ナイロン-6、ナイロン66、水溶性ナイロン、ポリフェニレンアミド等のポリアミド;ゼラチン、カゼイン等のポリペプチド;ノボラックエポキシ樹脂、ビスフェノールエポキシ樹脂、ノボラックエポキシアクリレート及び酸無水物により変性樹脂等のエポキシ樹脂及びその変性物;ポリウレタン、ポリイミド、メラミン樹脂、尿素樹脂、ポリイミダゾール、ポリオキサゾール、ポリピロール、ポリアニリン、ポリスルフィド、ポリスルホン、セルロース類等が挙げられる。
前記バインダー樹脂(B)の重量平均分子量(Mw)は、ゲルパーミエーションクロマトグラフィー(GPC)によりポリスチレン換算したもので、好ましくは1,000~500,000、より好ましくは2,000~200,000、最も好ましくは3,000~100,000である。バインダー樹脂のMwが1,000未満では、膜の耐熱性が低下する傾向があり、一方500,000を越えると、膜の現像性や塗布性が低下する傾向がある。また、前記バインダー樹脂(B)の酸価は、好ましくは30~300mgKOH/gである。酸価の値が30mgKOH/g未満であると、現像性が悪くなる恐れがあり、酸価の値が300mgKOH/g超であると、樹脂の劣化が進行する恐れがある。 <Binder resin (B)>
Examples of the binder resin include polyolefin polymers such as polyethylene, polypropylene and polyisobutylene; diene polymers such as polybutadiene and polyisoprene; polymers having a conjugated polyene structure such as polyacetylene polymers and polyphenylene polymers; polyvinyl chloride and polystyrene. , Vinyl acetate, polyvinyl alcohol, polyacrylic acid, polyacrylic acid ester, polyacrylamide, polyacrylonitrile, polyvinylphenol, and other vinyl polymers; polyphenylene ether, polyoxirane, polyoxetane, polytetrahydrofuran, polyetherketone, polyetheretherketone, Polyethers such as polyacetals; phenolic resins such as novolak resins and resol resins; polyethylene terephthalates Polyesters such as polyphenolphthalein terephthalate, polycarbonate, alkyd resin, unsaturated polyester resin; polyamides such as nylon-6, nylon 66, water-soluble nylon, polyphenyleneamide; polypeptides such as gelatin and casein; novolac epoxy resin, bisphenol epoxy Resins, epoxy resins such as modified resins with novolac epoxy acrylate and acid anhydrides and modified products thereof; polyurethane, polyimide, melamine resin, urea resin, polyimidazole, polyoxazole, polypyrrole, polyaniline, polysulfide, polysulfone, celluloses, etc. It is done.
The weight average molecular weight (Mw) of the binder resin (B) is that converted into polystyrene by gel permeation chromatography (GPC), preferably 1,000 to 500,000, more preferably 2,000 to 200,000. Most preferably, it is 3,000 to 100,000. If the Mw of the binder resin is less than 1,000, the heat resistance of the film tends to decrease, whereas if it exceeds 500,000, the developability and coating property of the film tend to decrease. The acid value of the binder resin (B) is preferably 30 to 300 mgKOH / g. If the acid value is less than 30 mgKOH / g, the developability may be deteriorated, and if the acid value is more than 300 mgKOH / g, the resin may be deteriorated.
(式中、Mは、直接結合、炭素原子数1~4のアルキレン基、炭素原子3~30の脂環式炭化水素基、炭素原子数6~12のアリール基、O、S、SO2、SS、SO、CO、OCO又は下記一般式(II-1)、(II-2)若しくは(II-3)で表される基を表し、R101、R102、R103、R104、R105、R106、R107及びR108は、それぞれ独立に、水素原子、炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子を表し、sは0~10の数を表す。)
(R109、R110、R111、R112、R113、R114、R115、R116、R117、R118、R119、R120、R121、R122、R123、R124、R125、R126、R127、R128、R129、R130、R131及びR132は、それぞれ独立に、水素原子、炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基、又はハロゲン原子を表し、上記アルキル基及びアリールアルキル基中のメチレン基は、不飽和結合、-O-又は-S-により酸素原子が隣り合わない条件で置き換えられている場合もあり、R109、R110、R111、R112、R117、R118、R119、R120、R125、R126、R127、R128、R129、R130、R131及びR132は、隣接するR109、R110、R111、R112、R117、R118、R119、R120、R125、R126、R127、R128、R129、R130、R131又はR132同士で環を形成している場合もある。*は、*部分で、隣接する基と結合することを意味する。)
(In the formula, M is a direct bond, an alkylene group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms, an aryl group having 6 to 12 carbon atoms, O, S, SO 2 , SS, SO, CO, OCO or a group represented by the following general formula (II-1), (II-2) or (II-3) is represented, and R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 and R 108 each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms or a halogen atom, and s is a number from 0 to 10 Represents.)
( R109 , R110 , R111 , R112 , R113 , R114 , R115 , R116 , R117 , R118 , R119 , R120 , R121 , R122 , R123 , R124 , R 125 , R 126 , R 127 , R 128 , R 129 , R 130 , R 131 and R 132 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms. Represents an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocycle-containing group having 2 to 20 carbon atoms, or a halogen atom, and methylene in the above alkyl group and arylalkyl group groups, unsaturated bonds, by -O- or -S- sometimes oxygen atoms are replaced by conditions that are not adjacent, R 109, R 110 R 111, R 112, R 117 , R 118, R 119, R 120, R 125, R 126, R 127, R 128, R 129, R 130, R 131 and R 132 are adjacent R 109, R 110 , R 111 , R 112 , R 117 , R 118 , R 119 , R 120 , R 125 , R 126 , R 127 , R 128 , R 129 , R 130 , R 131, or R 132 form a ring. In some cases, * means that it is bonded to an adjacent group at the * part.)
分岐のアルキレンとしては、1-メチルメタン-1,1-ジイル、1-エチルメタン-1,1-ジイル、1-プロピルメタン-1,1-ジイル、1-メチルエタン-1,2-ジイル、1-エチルエタン-1,2-ジイル、1-メチルプロパン-1,3-ジイル等が挙げられる。
上記一般式(II)中の、炭素原子3~30の脂環式炭化水素基としては、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチル、シクロデカニル、1-アダマンチル、2-アダマンチル、ノルアダマンチル、2-メチルアダマンチル、ノルボルニル、イソノルボルニル、パーヒドロナフチル、パーヒドロアントラセニル、ビシクロ[1.1.0]ブチル、ビシクロ[1.1.1]ペンチル、ビシクロ[2.1.0]ペンチル、ビシクロ[3.1.0]ヘキシル、ビシクロ[2.1.1]ヘキシル、ビシクロ[2.2.0]ヘキシル、ビシクロ[4.1.0]ヘプチル、ビシクロ[3.2.0]ヘプチル、ビシクロ[3.1.1]ヘプチル、ビシクロ[2.2.1]ヘプチル、ビシクロ[5.1.0]オクチル、ビシクロ[4.2.0]オクチル、ビシクロ[4.1.1]オクチル、ビシクロ[3.3.0]オクチル、ビシクロ[3.2.1]オクチル、ビシクロ[2.2.2]オクチル、スピロ〔4,4〕ノナニル、スピロ〔4,5〕デカニル、デカリン、トリシクロデカニル、テトラシクロドデカニル、セドロール、シクロドデカニル等が挙げられる。
上記一般式(II)中の、R101、R102、R103、R104、R105、R106、R107及びR108で表される炭素原子数1~10のアルキル基、Mで表される炭素原子数6~12のアリール基、上記一般式(II-1)、(II-2)又は(II-3)中の、R109、R110、R111、R112、R113、R114、R115、R116、R117、R118、R119、R120、R121、R122、R123、R124、R125、R126、R127、R128、R129、R130、R131及びR132で表される炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基及び炭素原子数2~20の複素環含有基としては、それぞれ上記一般式(I)の炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基の説明のところで例示した基のうち、所定の炭素原子数を満たす基が挙げられる。
上記一般式(II)中の、R101、R102、R103、R104、R105、R106、R107及びR108で表される炭素原子数1~10のアルコキシ基、上記一般式(II-1)、(II-2)又は(II-3)中の、R109、R110、R111、R112、R113、R114、R115、R116、R117、R118、R119、R120、R121、R122、R123、R124、R125、R126、R127、R128、R129、R130、R131及びR132で表される炭素原子数1~10のアルコキシ基としては、メチルオキシ、エチルオキシ、プロピルオキシ、イソプロピルオキシ、ブチルオキシ、第二ブチルオキシ、第三ブチルオキシ、イソブチルオキシ、アミルオキシ、イソアミルオキシ、第三アミルオキシ、ヘキシルオキシ、シクロヘキシルオキシ、ヘプチルオキシ、イソヘプチルオキシ、第三ヘプチルオキシ、n-オクチルオキシ、イソオクチルオキシ、第三オクチルオキシ、2-エチルヘキシルオキシ、ノニルオキシ、デシルオキシ等が挙げられる。
上記一般式(II-1)、(II-2)又は(II-3)中の、R109、R110、R111、R112、R117、R118、R119、R120、R125、R126、R127、R128、R129、R130、R131及びR132は、隣接するR109、R110、R111、R112、R117、R118、R119、R120、R125、R126、R127、R128、R129、R130、R131又はR132同士で形成し得る環としては、上記一般式(I)中の、R3とR7、R3とR8、R4とR5、R5とR6又はR6とR7がそれぞれ一緒になって形成し得る環と同様の環が挙げられる。 In the general formula (II), examples of the alkylene group having 1 to 4 carbon atoms include those represented by — (CH 2 ) 1-4 — as the linear alkylene,
Examples of branched alkylene include 1-methylmethane-1,1-diyl, 1-ethylmethane-1,1-diyl, 1-propylmethane-1,1-diyl, 1-methylethane-1,2-diyl, 1- Examples include ethylethane-1,2-diyl, 1-methylpropane-1,3-diyl and the like.
Examples of the alicyclic hydrocarbon group having 3 to 30 carbon atoms in the general formula (II) include cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecanyl, 1-adamantyl, 2-adamantyl, noradamantyl, and 2-methyl. Adamantyl, norbornyl, isonorbornyl, perhydronaphthyl, perhydroanthracenyl, bicyclo [1.1.0] butyl, bicyclo [1.1.1] pentyl, bicyclo [2.1.0] pentyl, bicyclo [3. 1.0] hexyl, bicyclo [2.1.1] hexyl, bicyclo [2.2.0] hexyl, bicyclo [4.1.0] heptyl, bicyclo [3.2.0] heptyl, bicyclo [3. 1.1] heptyl, bicyclo [2.2.1] heptyl, bicyclo [5.1.0] octyl, bicyclo [4 2.0] octyl, bicyclo [4.1.1] octyl, bicyclo [3.3.0] octyl, bicyclo [3.2.1] octyl, bicyclo [2.2.2] octyl, spiro [4 4] Nonanyl, spiro [4,5] decanyl, decalin, tricyclodecanyl, tetracyclododecanyl, cedrol, cyclododecanyl and the like.
An alkyl group having 1 to 10 carbon atoms represented by R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 and R 108 in the general formula (II), represented by M; An aryl group having 6 to 12 carbon atoms, R 109 , R 110 , R 111 , R 112 , R 113 , R in the above general formula (II-1), (II-2) or (II-3) 114 , R 115 , R 116 , R 117 , R 118 , R 119 , R 120 , R 121 , R 122 , R 123 , R 124 , R 125 , R 126 , R 127 , R 128 , R 129 , R 130 , alkyl group having 1 to 10 carbon atoms represented by R 131 and R 132, an aryl group having 6 to 20 carbon atoms, the double of the arylalkyl group and the carbon atom number of 2 to 20 carbon atoms 7-20 Examples of the ring-containing group include an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, and 2 to 2 carbon atoms. Of the groups exemplified in the description of the 20 heterocycle-containing groups, groups satisfying a predetermined number of carbon atoms can be mentioned.
In the general formula (II), an alkoxy group having 1 to 10 carbon atoms represented by R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 and R 108 , II-1), (II-2) or (II-3), R 109 , R 110 , R 111 , R 112 , R 113 , R 114 , R 115 , R 116 , R 117 , R 118 , R 119 , R 120 , R 121 , R 122 , R 123 , R 124 , R 125 , R 126 , R 127 , R 128 , R 129 , R 130 , R 131, and R 132 and 1 to 10 carbon atoms Examples of the alkoxy group include methyloxy, ethyloxy, propyloxy, isopropyloxy, butyloxy, sec-butyloxy, tert-butyloxy, isobutyloxy. , Amyloxy, isoamyloxy, tert-amyloxy, hexyloxy, cyclohexyloxy, heptyloxy, isoheptyloxy, tert-heptyloxy, n-octyloxy, isooctyloxy, tert-octyloxy, 2-ethylhexyloxy, nonyloxy, decyloxy Etc.
R 109 , R 110 , R 111 , R 112 , R 117 , R 118 , R 119 , R 120 , R 125 in the general formula (II-1), (II-2) or (II-3) R 126 , R 127 , R 128 , R 129 , R 130 , R 131 and R 132 are adjacent to R 109 , R 110 , R 111 , R 112 , R 117 , R 118 , R 119 , R 120 , R 125. , R 126 , R 127 , R 128 , R 129 , R 130 , R 131, or R 132 , R 3 and R 7 , R 3 and R 8 in the above general formula (I) can be used. , R 4 and R 5 , R 5 and R 6, or a ring similar to the ring that R 6 and R 7 can form together.
Mが、上記一般式(II-1)~(II-3)で表される基である化合物、
R101、R102、R103、R104、R105、R106、R107又はR108が水素原子である化合物が好ましい。 As an epoxy compound represented by the general formula (II),
A compound in which M is a group represented by the general formulas (II-1) to (II-3);
A compound in which R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 or R 108 is a hydrogen atom is preferred.
即ち、上記エポキシ付加化合物は、上記エポキシ化合物のエポキシ基1個に対し、上記不飽和一塩基酸のカルボキシル基が0.1~1.0個の比率、特に0.4~1.0個の比率となるように付加させるのが好ましく、また上記エチレン性不飽和化合物は、上記エポキシ付加物の水酸基1個に対し、上記多塩基酸無水物の酸無水物構造が0.1~1.0個となる比率、特に0.4~1.0個の比率となるようにするのが好ましい。
上記エポキシ化合物、上記不飽和一塩基酸及び上記多塩基酸無水物の反応は、常法に従って行なうことができる。 The reaction molar ratio of the epoxy compound, the unsaturated monobasic acid and the polybasic acid anhydride is preferably as follows.
That is, the epoxy addition compound has a ratio of 0.1 to 1.0 carboxyl groups of the unsaturated monobasic acid to one epoxy group of the epoxy compound, particularly 0.4 to 1.0. The ethylenically unsaturated compound is preferably added such that the acid anhydride structure of the polybasic acid anhydride is 0.1 to 1.0 with respect to one hydroxyl group of the epoxy adduct. It is preferable that the ratio is one, particularly 0.4 to 1.0.
Reaction of the said epoxy compound, the said unsaturated monobasic acid, and the said polybasic acid anhydride can be performed in accordance with a conventional method.
エチレン性不飽和化合物(C)とは、構造中にエチレン性不飽和結合を有する化合物を意味し、このような化合物としては、例えば、エチレン、プロピレン、ブチレン、イソブチレン、塩化ビニル、塩化ビニリデン、フッ化ビニリデン、テトラフルオロエチレン等の不飽和脂肪族炭化水素;(メタ)アクリル酸、α―クロルアクリル酸、イタコン酸、マレイン酸、シトラコン酸、フマル酸、ハイミック酸、クロトン酸、イソクロトン酸、ビニル酢酸、アリル酢酸、桂皮酸、ソルビン酸、メサコン酸、コハク酸モノ[2-アクリロイロキシエチル]、フタル酸モノ[2-アクリロイロキシエチル]、ω-カルボキシポリカプロラクトンモノアクリレート等の両末端にカルボキシル基と水酸基とを有するポリマーのモノアクリレート、コハク酸モノ[2-メタクリロイロキシエチル]、フタル酸モノ[2-メタクリロイロキシエチル]、ω-カルボキシポリカプロラクトンモノメタクリレート等の、両末端にカルボキシル基と水酸基とを有するポリマーのモノアクリレート又はメタクリレート;ヒドロキシエチルアクリレート・マレート、ヒドロキシプロピルアクリレート・マレート、ジシクロペンタジエン・マレート或いは1個のカルボキシル基と2個以上のアクリロイル基とを有する多官能アクリレート、ヒドロキシエチルメタクリレート・マレート、ヒドロキシプロピルメタクリレート・マレート、ジシクロペンタジエン・マレート或いは1個のカルボキシル基と2個以上のメタクリロイル基とを有する多官能メタクリレート等の不飽和多塩基酸;アクリル酸-2-ヒドロキシエチル、アクリル酸-2-ヒドロキシプロピル、アクリル酸グリシジル、メタクリル酸-2-ヒドロキシエチル、メタクリル酸-2-ヒドロキシプロピル、メタクリル酸グリシジル、下記化合物No.A1~No.A4、アクリル酸メチル、アクリル酸ブチル、アクリル酸イソブチル、アクリル酸-t-ブチル、アクリル酸シクロヘキシル、アクリル酸n-オクチル、アクリル酸イソオクチル、アクリル酸イソノニル、アクリル酸ステアリル、アクリル酸ラウリル、アクリル酸メトキシエチル、アクリル酸ジメチルアミノメチル、アクリル酸ジメチルアミノエチル、アクリル酸アミノプロピル、アクリル酸ジメチルアミノプロピル、アクリル酸エトキシエチル、アクリル酸ポリ(エトキシ)エチル、アクリル酸ブトキシエトキシエチル、アクリル酸エチルヘキシル、アクリル酸フェノキシエチル、アクリル酸テトラヒドロフリル、アクリル酸ビニル、アクリル酸アリル、アクリル酸ベンジル、エチレングリコールジアクリレート、ジエチレングリコールジアクリレート、トリエチレングリコールジアクリレート、ポリエチレングリコールジアクリレート、プロピレングリコールジアクリレート、1,4-ブタンジオールジアクリレート、1,6-ヘキサンジオールジアクリレート、トリメチロールエタントリアクリレート、トリメチロールプロパントリアクリレート、ジペンタエリスリトールヘキサアクリレート、ジペンタエリスリトールペンタアクリレート、ペンタエリスリトールテトラアクリレート、ペンタエリスリトールトリアクリレート、トリシクロデカンジメチロールジアクリレート、トリ[アクリロイルエチル]イソシアヌレート、ポリエステルアクリレートオリゴマー、メタクリル酸メチル、メタクリル酸ブチル、メタクリル酸イソブチル、メタクリル酸-t-ブチル、メタクリル酸シクロヘキシル、メタクリル酸n-オクチル、メタクリル酸イソオクチル、メタクリル酸イソノニル、メタクリル酸ステアリル、メタクリル酸ラウリル、メタクリル酸メトキシエチル、メタクリル酸ジメチルアミノメチル、メタクリル酸ジメチルアミノエチル、メタクリル酸アミノプロピル、メタクリル酸ジメチルアミノプロピル、メタクリル酸エトキシエチル、メタクリル酸ポリ(エトキシ)エチル、メタクリル酸ブトキシエトキシエチル、メタクリル酸エチルヘキシル、メタクリル酸フェノキシエチル、メタクリル酸テトラヒドロフリル、メタクリル酸ビニル、メタクリル酸アリル、メタクリル酸ベンジル、エチレングリコールジメタクリレート、ジエチレングリコールジメタクリレート、トリエチレングリコールジメタクリレート、ポリエチレングリコールジメタクリレート、プロピレングリコールジメタクリレート、1,4-ブタンジオールジメタクリレート、1,6-ヘキサンジオールジメタクリレート、トリメチロールエタントリメタクリレート、トリメチロールプロパントリメタクリレート、ジペンタエリスリトールヘキサメタクリレート、ジペンタエリスリトールペンタメタクリレート、ペンタエリスリトールテトラメタクリレート、ペンタエリスリトールトリメタクリレート、トリシクロデカンジメチロールジメタクリレート、トリ[メタクリロイルエチル]イソシアヌレート、ポリエステルメタクリレートオリゴマー等の不飽和一塩基酸及び多価アルコール又は多価フェノールのエステル;アクリル酸亜鉛、アクリル酸マグネシウム、メタクリル酸亜鉛、メタクリル酸マグネシウム等の不飽和多塩基酸の金属塩;マレイン酸無水物、イタコン酸無水物、シトラコン酸無水物、メチルテトラヒドロ無水フタル酸、テトラヒドロ無水フタル酸、トリアルキルテトラヒドロ無水フタル酸、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸無水物、トリアルキルテトラヒドロ無水フタル酸-無水マレイン酸付加物、ドデセニル無水コハク酸、無水メチルハイミック酸等の不飽和多塩基酸の酸無水物;アクリルアミド、メチレンビス-アクリルアミド、ジエチレントリアミントリスアクリルアミド、キシリレンビスアクリルアミド、α-クロロアクリルアミド、N-2-ヒドロキシエチルアクリルアミド、メタクリルアミド、メチレンビス-メタクリルアミド、ジエチレントリアミントリスメタクリルアミド、キシリレンビスメタクリルアミド、α-クロロアクリルアミド、N-2-ヒドロキシエチルメタクリルアミド等の不飽和一塩基酸及び多価アミンのアミド;アクロレイン等の不飽和アルデヒド;アクリロニトリル、メタクリロニトリル、α-クロロアクリロニトリル、シアン化ビニリデン、シアン化アリル等の不飽和ニトリル;スチレン、4-メチルスチレン、4-エチルスチレン、4-メトキシスチレン、4-ヒドロキシスチレン、4-クロロスチレン、ジビニルベンゼン、ビニルトルエン、ビニル安息香酸、ビニルフェノール、ビニルスルホン酸、4-ビニルベンゼンスルホン酸、ビニルベンジルメチルエーテル、ビニルベンジルグリシジルエーテル等の不飽和芳香族化合物;メチルビニルケトン等の不飽和ケトン;ビニルアミン、アリルアミン、N-ビニルピロリドン、ビニルピペリジン等の不飽和アミン化合物;アリルアルコール、クロチルアルコール等のビニルアルコール;ビニルメチルエーテル、ビニルエチルエーテル、n-ブチルビニルエーテル、イソブチルビニルエーテル、アリルグリシジルエーテル等のビニルエーテル;マレイミド、N-フェニルマレイミド、N-シクロヘキシルマレイミド等の不飽和イミド類;インデン、1-メチルインデン等のインデン類;1,3-ブタジエン、イソプレン、クロロプレン等の脂肪族共役ジエン類;ポリスチレン、ポリメチルアクリレート、ポリ-n-ブチルアクリレート、ポリシロキサン等の重合体分子鎖の末端にモノアクリロイル基を有するマクロモノマー類、ポリメチルメタクリレート、ポリ-n-ブチルメタクリレート、ポリシロキサン等の重合体分子鎖の末端にモノメタクリロイル基を有するマクロモノマー類;ビニルクロリド、ビニリデンクロリド、ジビニルスクシナート、ジアリルフタラート、トリアリルホスファート、トリアリルイソシアヌラート、ビニルチオエーテル、ビニルイミダゾール、ビニルオキサゾリン、ビニルカルバゾール、ビニルピロリドン、ビニルピリジン、水酸基含有ビニルモノマー及びポリイソシアネート化合物のビニルウレタン化合物、水酸基含有ビニルモノマー及びポリエポキシ化合物のビニルエポキシ化合物が挙げられる。上記エチレン性不飽和化合物(C)は、単独で又は2種以上を混合して使用することができる。
これらの中でも、両末端にカルボキシル基と水酸基とを有するポリマーのモノアクリレート又はメタクリレート、1個のカルボキシル基と2個以上のアクリロイル基又はメタクリロイル基とを有する多官能アクリレート又は多官能メタクリレート、不飽和一塩基酸及び多価アルコール又は多価フェノールのエステルが、硬化性、色度特性の観点から好ましい。 <Ethylenic unsaturated compound (C)>
The ethylenically unsaturated compound (C) means a compound having an ethylenically unsaturated bond in the structure. Examples of such a compound include ethylene, propylene, butylene, isobutylene, vinyl chloride, vinylidene chloride, fluorine. Unsaturated aliphatic hydrocarbons such as vinylidene fluoride and tetrafluoroethylene; (meth) acrylic acid, α-chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, fumaric acid, hymic acid, crotonic acid, isocrotonic acid, vinylacetic acid Allyl acetate, cinnamic acid, sorbic acid, mesaconic acid, succinic acid mono [2-acryloyloxyethyl], phthalic acid mono [2-acryloyloxyethyl], ω-carboxypolycaprolactone monoacrylate, etc. Monoacrylate and succinic acid monoacrylate of polymer having hydroxyl group and hydroxyl group Monoacrylate or methacrylate of a polymer having a carboxyl group and a hydroxyl group at both ends, such as [2-methacryloyloxyethyl], mono [2-methacryloyloxyethyl] phthalate, and ω-carboxypolycaprolactone monomethacrylate; Acrylate malate, hydroxypropyl acrylate malate, dicyclopentadiene malate or polyfunctional acrylate having one carboxyl group and two or more acryloyl groups, hydroxyethyl methacrylate malate, hydroxypropyl methacrylate malate, dicyclopentadiene .Unsaturated polybasic acids such as malate or polyfunctional methacrylate having one carboxyl group and two or more methacryloyl groups; acrylic acid-2-hydroxyethyl , Acrylic acid 2-hydroxypropyl, glycidyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl, glycidyl methacrylate, the following compound No. A1-No. A4, methyl acrylate, butyl acrylate, isobutyl acrylate, tert-butyl acrylate, cyclohexyl acrylate, n-octyl acrylate, isooctyl acrylate, isononyl acrylate, stearyl acrylate, lauryl acrylate, methoxy acrylate Ethyl, dimethylaminomethyl acrylate, dimethylaminoethyl acrylate, aminopropyl acrylate, dimethylaminopropyl acrylate, ethoxyethyl acrylate, poly (ethoxy) ethyl acrylate, butoxyethoxyethyl acrylate, ethylhexyl acrylate, acrylic acid Phenoxyethyl, tetrahydrofuryl acrylate, vinyl acrylate, allyl acrylate, benzyl acrylate, ethylene glycol diacrylate, diethylene glycol di Acrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, propylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, dipenta Erythritol hexaacrylate, dipentaerythritol pentaacrylate, pentaerythritol tetraacrylate, pentaerythritol triacrylate, tricyclodecane dimethylol diacrylate, tri [acryloylethyl] isocyanurate, polyester acrylate oligomer, methyl methacrylate, butyl methacrylate, methacrylic acid Isobutyl, methacrylate-t-butyl, methacrylate Cyclohexyl acid, n-octyl methacrylate, isooctyl methacrylate, isononyl methacrylate, stearyl methacrylate, lauryl methacrylate, methoxyethyl methacrylate, dimethylaminomethyl methacrylate, dimethylaminoethyl methacrylate, aminopropyl methacrylate, dimethyl methacrylate Aminopropyl, ethoxyethyl methacrylate, poly (ethoxy) ethyl methacrylate, butoxyethoxyethyl methacrylate, ethyl hexyl methacrylate, phenoxyethyl methacrylate, tetrahydrofuryl methacrylate, vinyl methacrylate, allyl methacrylate, benzyl methacrylate, ethylene glycol Dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, Polyethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanediol dimethacrylate, trimethylolethane trimethacrylate, trimethylolpropane trimethacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol penta Unsaturated monobasic acids such as methacrylate, pentaerythritol tetramethacrylate, pentaerythritol trimethacrylate, tricyclodecane dimethylol dimethacrylate, tri [methacryloylethyl] isocyanurate, polyester methacrylate oligomers, and esters of polyhydric alcohols or polyphenols; acrylics Zinc oxide, magnesium acrylate, zinc methacrylate, Metal salts of unsaturated polybasic acids such as magnesium crylate; maleic anhydride, itaconic anhydride, citraconic anhydride, methyltetrahydrophthalic anhydride, tetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, 5- ( 2,5-dioxotetrahydrofuryl) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, dodecenyl succinic anhydride, methyl hymic anhydride Unsaturated polybasic acid anhydrides such as acrylamide, methylene bis-acrylamide, diethylenetriamine trisacrylamide, xylylene bisacrylamide, α-chloroacrylamide, N-2-hydroxyethylacrylamide, methacrylamide, methylene bis-methacryl Amides of unsaturated monobasic acids and polyvalent amines such as amide, diethylenetriamine trismethacrylamide, xylylene bismethacrylamide, α-chloroacrylamide, N-2-hydroxyethylmethacrylamide; unsaturated aldehydes such as acrolein; acrylonitrile, methacrylate Unsaturated nitriles such as nitrile, α-chloroacrylonitrile, vinylidene cyanide, allyl cyanide; styrene, 4-methylstyrene, 4-ethylstyrene, 4-methoxystyrene, 4-hydroxystyrene, 4-chlorostyrene, divinylbenzene Unsaturated aromatic compounds such as vinyl toluene, vinyl benzoic acid, vinyl phenol, vinyl sulfonic acid, 4-vinyl benzene sulfonic acid, vinyl benzyl methyl ether, vinyl benzyl glycidyl ether; Unsaturated ketones such as ru vinyl ketone; Unsaturated amine compounds such as vinyl amine, allyl amine, N-vinyl pyrrolidone and vinyl piperidine; Vinyl alcohols such as allyl alcohol and crotyl alcohol; Vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether, isobutyl Vinyl ethers such as vinyl ether and allyl glycidyl ether; unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; indenes such as indene and 1-methylindene; fats such as 1,3-butadiene, isoprene and chloroprene Group conjugated dienes; macromonomers having a monoacryloyl group at the end of the polymer molecular chain, such as polystyrene, polymethyl acrylate, poly-n-butyl acrylate, polysiloxane, etc. Macromonomers having a monomethacryloyl group at the end of the polymer molecular chain such as limethyl methacrylate, poly-n-butyl methacrylate and polysiloxane; vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate, triallyl phosphate , Triallyl isocyanurate, vinyl thioether, vinyl imidazole, vinyl oxazoline, vinyl carbazole, vinyl pyrrolidone, vinyl pyridine, vinyl urethane compound of hydroxyl group-containing vinyl monomer and polyisocyanate compound, vinyl epoxy compound of hydroxyl group-containing vinyl monomer and polyepoxy compound Is mentioned. The said ethylenically unsaturated compound (C) can be used individually or in mixture of 2 or more types.
Among these, a monoacrylate or methacrylate of a polymer having a carboxyl group and a hydroxyl group at both ends, a polyfunctional acrylate or polyfunctional methacrylate having one carboxyl group and two or more acryloyl groups or methacryloyl groups, unsaturated one Basic acids and esters of polyhydric alcohols or polyhydric phenols are preferred from the viewpoints of curability and chromaticity characteristics.
導電性粒子(D)としては、各種金属や合金の粉末、或いはその酸化物を用いることができ、例えば、金、銀、白金、イリジウム、ロジウム、タングステン、モリブデン、ルテニウム、アルミニウム、銅、ニッケル、パラジウム、亜鉛、アルミニウム等の金属粒子;銀-パラジウム、銀-銅等の合金粒子;前記金属粒子或いは合金粒子をコア又は被覆層とする多層体;酸化錫、酸価インジウム、ITO、酸化アルミニウム、酸化ホウ素、シリカ、酸化チタン、酸化ジルコニア、酸化マグネシウム、酸化カルシウム、酸化ストロンチウム、酸化バリウム等の金属酸化物;炭酸カルシウム等が挙げられる。中でも銀が、導電性がよいので好ましい。 <Conductive particles (D)>
As the conductive particles (D), powders of various metals and alloys, or oxides thereof can be used. For example, gold, silver, platinum, iridium, rhodium, tungsten, molybdenum, ruthenium, aluminum, copper, nickel, Metal particles such as palladium, zinc, aluminum, etc .; alloy particles such as silver-palladium, silver-copper, etc .; multilayer bodies having the metal particles or alloy particles as a core or coating layer; tin oxide, acid value indium, ITO, aluminum oxide, Examples thereof include metal oxides such as boron oxide, silica, titanium oxide, zirconia oxide, magnesium oxide, calcium oxide, strontium oxide, and barium oxide; calcium carbonate and the like. Of these, silver is preferable because of its good conductivity.
尚、平均粒径は、SEM(走査型電子顕微鏡)を用いて観察したランダムな10個の導電性粒子(D)を測定した平均を算出することにより求められる。 The conductive particles (D) have an average particle size of 0.05 to 10 μm, preferably 0.1 to 5 μm.
In addition, an average particle diameter is calculated | required by calculating the average which measured 10 random electroconductive particles (D) observed using SEM (scanning electron microscope).
溶媒(E)としては、通常、必要に応じて上記の各成分(上記一般式(I)で表されるオキシムエステル化合物の一種以上を含む重合開始剤(A)、バインダー樹脂(B)、エチレン性不飽和化合物(C)、導電性粒子(D)等)を溶解又は分散しえる溶媒、例えば、メチルエチルケトン、メチルアミルケトン、ジエチルケトン、アセトン、メチルイソプロピルケトン、メチルイソブチルケトン、シクロヘキサノン、2-ヘプタノン等のケトン類;エチルエーテル、ジオキサン、テトラヒドロフラン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、ジプロピレングリコールジメチルエーテル等のエーテル系溶媒;酢酸メチル、酢酸エチル、酢酸-n-プロピル、酢酸イソプロピル、酢酸n-ブチル、酢酸シクロヘキシル、乳酸エチル、コハク酸ジメチル、テキサノール等のエステル系溶媒;エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル等のセロソルブ系溶媒;メタノール、エタノール、イソ-又はn-プロパノール、イソ-又はn-ブタノール、アミルアルコール等のアルコール系溶媒;エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、プロピレングリコール-1-モノメチルエーテル-2-アセテート、ジプロピレングリコールモノメチルエーテルアセテート、3-メトキシブチルエーテルアセテート、エトキシエチルエーテルプロピオネート等のエーテルエステル系溶媒;ベンゼン、トルエン、キシレン等のBTX系溶媒;ヘキサン、ヘプタン、オクタン、シクロヘキサン等の脂肪族炭化水素系溶媒;テレピン油、D-リモネン、ピネン等のテルペン系炭化水素油;ミネラルスピリット、スワゾール#310(コスモ松山石油社)、ソルベッソ#100(エクソン化学社)等のパラフィン系溶媒;四塩化炭素、クロロホルム、トリクロロエチレン、塩化メチレン、1,2-ジクロロエタン等のハロゲン化脂肪族炭化水素系溶媒;クロロベンゼン等のハロゲン化芳香族炭化水素系溶媒;カルビトール系溶媒;アニリン;トリエチルアミン;ピリジン;酢酸;アセトニトリル;二硫化炭素;N,N-ジメチルホルムアミド;N,N-ジメチルアセトアミド;N-メチルピロリドン;ジメチルスルホキシド;水等が挙げられ、これらの溶媒は1種又は2種以上の混合溶媒として使用することができる。
これらの中でも、ケトン類、エーテルエステル系溶媒等、特にプロピレングリコール-1-モノメチルエーテル-2-アセテート、シクロヘキサノン等が、上記の各成分との相溶性がよいので好ましい。
本発明の導電ペーストにおいて、上記溶媒(E)の含有量は、本発明の導電ペーストの固形分100質量部に対して、好ましくは50~1000質量部、より好ましくは80~150質量部である。 <Solvent (E)>
As the solvent (E), usually, each of the above components (a polymerization initiator (A) containing one or more oxime ester compounds represented by the above general formula (I), a binder resin (B), ethylene as required) A solvent capable of dissolving or dispersing the unsaturated compound (C), conductive particles (D), etc., such as methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone, cyclohexanone, 2-heptanone Ketones such as ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane, dipropylene glycol dimethyl ether, etc .; methyl acetate, ethyl acetate, acetic acid-n-propyl, acetic acid Isopropyl, n-butyl acetate, cyclohexyl acetate, ethyl lactate Ester solvents such as dimethyl succinate and texanol; cellosolve solvents such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; methanol, ethanol, iso- or n-propanol, iso- or n-butanol, amyl alcohol, etc. Alcohol solvents: ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol-1-monomethyl ether-2-acetate, dipropylene glycol monomethyl ether acetate, 3-methoxybutyl ether acetate, ethoxyethyl ether propionate, etc. Ether ester solvents; BTX solvents such as benzene, toluene, xylene; hexane, heptane, octane, cyclohexa Aliphatic hydrocarbon solvents such as terpene oils, terpene hydrocarbon oils such as terpine oil, D-limonene, pinene, etc .; paraffins such as mineral spirits, Swazol # 310 (Cosmo Matsuyama Petroleum), Solvesso # 100 (Exxon Chemical) Solvent: Halogenated aliphatic hydrocarbon solvent such as carbon tetrachloride, chloroform, trichloroethylene, methylene chloride, 1,2-dichloroethane; Halogenated aromatic hydrocarbon solvent such as chlorobenzene; Carbitol solvent; Aniline; Triethylamine; Pyridine, acetic acid, acetonitrile, carbon disulfide, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, water, and the like. These solvents may be used alone or as a mixture of two or more. It can be used as a solvent.
Among these, ketones, ether ester solvents, etc., particularly propylene glycol-1-monomethyl ether-2-acetate, cyclohexanone, and the like are preferable because of their good compatibility with the above components.
In the conductive paste of the present invention, the content of the solvent (E) is preferably 50 to 1000 parts by mass, more preferably 80 to 150 parts by mass with respect to 100 parts by mass of the solid content of the conductive paste of the present invention. .
これらの中でも、ガラスフリット、酸化チタン、シリカ、層状粘土鉱物、銀等が好ましい。
本発明の導電ペーストにおいて、上記無機化合物の含有量は、本発明の導電ペーストの固形分100質量部に対して、好ましくは5~1000質量部、好ましくは50~100質量部である。 The conductive paste of the present invention can further contain an inorganic compound other than the conductive particles (D). Examples of the inorganic compound include metal oxides such as nickel oxide, iron oxide, iridium oxide, titanium oxide, zinc oxide, magnesium oxide, calcium oxide, potassium oxide, silica, and alumina; graphite, layered clay mineral, miloli blue, carbonic acid Calcium, magnesium carbonate, cobalt, manganese, glass powder (especially glass frit), mica, talc, kaolin, ferrocyanide, various metal sulfates, sulfides, selenides, aluminum silicate, calcium silicate, aluminum hydroxide, Examples include platinum, gold, silver, and copper. These inorganic compounds can use 1 type (s) or 2 or more types.
Among these, glass frit, titanium oxide, silica, layered clay mineral, silver and the like are preferable.
In the conductive paste of the present invention, the content of the inorganic compound is preferably 5 to 1000 parts by mass, preferably 50 to 100 parts by mass with respect to 100 parts by mass of the solid content of the conductive paste of the present invention.
ここで、アルキルエーテルを構成するアルキル基としては、メチル基、エチル基又はブチル基が挙げられ、互いに同一であってもよいし、異なっていてもよい。また、アルキルエーテル化されていないメチロール基は、一分子内で自己縮合していてもよく、二分子間で縮合して、その結果オリゴマー成分が形成されていてもよい。
具体的には、ヘキサメトキシメチルメラミン、ヘキサブトキシメチルメラミン、テトラメトキシメチルグリコールウリル、テトラブトキシメチルグリコールウリル等を用いることができる。
これらの中でも、ヘキサメトキシメチルメラミン、ヘキサブトキシメチルメラミン等のアルキルエーテル化されたメラミンが好ましい。 Examples of the melamine compound include all or part of active methylol groups (CH 2 OH groups) in nitrogen compounds such as (poly) methylol melamine, (poly) methylol glycoluril, (poly) methylol benzoguanamine, and (poly) methylol urea. Examples include compounds in which (at least two) are alkyl etherified.
Here, examples of the alkyl group constituting the alkyl ether include a methyl group, an ethyl group, and a butyl group, which may be the same as or different from each other. Moreover, the methylol group which is not alkyletherified may be self-condensed within one molecule, or may be condensed between two molecules, and as a result, an oligomer component may be formed.
Specifically, hexamethoxymethyl melamine, hexabutoxymethyl melamine, tetramethoxymethyl glycoluril, tetrabutoxymethyl glycoluril and the like can be used.
Among these, alkyl etherified melamines such as hexamethoxymethyl melamine and hexabutoxymethyl melamine are preferable.
また、基板上への本発明の導電ペーストの塗膜の形成は、本発明の導電ペーストの塗膜を一旦フィルム等の基板上に形成した後、他の基板上に転写することもでき、その形成方法に制限はない。 The step (1) is a step of applying the prepared conductive paste of the present invention to a target substrate and forming a coating film on the substrate. Examples of the target substrate include soda glass, quartz glass, semiconductor substrate, metal, paper, and plastic. Moreover, you may use the substrate which surface-treated. The coating method is not particularly limited, and known means such as a spin coater, roll coater, bar coater, die coater, blade coater, curtain coater, various printing and dipping can be employed.
Moreover, the formation of the coating film of the conductive paste of the present invention on a substrate can be transferred to another substrate after the coating film of the conductive paste of the present invention is once formed on a substrate such as a film. There is no restriction | limiting in the formation method.
上記マスクとしては、使用する成分に合わせて、ネガ型用マスク及びポジ型用のマスクの何れも使用することができる、上記マスクとしては、ハーフトーンマスク又はグレースケールマスク等の多階調マスクを用いることもできる。 As an energy ray light source used for curing the coating film of the conductive paste of the present invention, an image is directly formed from digital information such as a computer without using a mask by using a laser beam as an exposure light source. The laser direct writing method is useful because it can improve not only productivity but also resolution and positional accuracy. As the laser light, light having a wavelength of 340 to 430 nm is preferably used. Lasers that emit light in the visible to infrared region such as excimer laser, nitrogen laser, argon ion laser, helium cadmium laser, helium neon laser, krypton ion laser, various semiconductor lasers, and YAG laser are also used. When these lasers are used, a sensitizing dye that absorbs the region from visible to infrared is added.
As the mask, either a negative type mask or a positive type mask can be used in accordance with the components to be used. As the mask, a multi-tone mask such as a halftone mask or a gray scale mask is used. It can also be used.
この工程において該塗膜を焼成することによりバインダー樹脂の硬化収縮が起こって導電性粒子同士が接触して十分な導電性が得られるとともに、耐薬品性も向上する。
ポストベークは、好ましくは、窒素、ヘリウム、アルゴン等の不活性ガス雰囲気下に、100~300℃で10~60分の時間内で行うことが好ましい。 The step (5) is a step of baking (post-baking) the coated film after development.
By baking the coating film in this step, curing shrinkage of the binder resin occurs and the conductive particles come into contact with each other to obtain sufficient conductivity, and chemical resistance is also improved.
The post-bake is preferably performed in an atmosphere of an inert gas such as nitrogen, helium or argon at 100 to 300 ° C. for 10 to 60 minutes.
1,1-ビス〔4-(2,3-エポキシプロピルオキシ)フェニル〕インダンの184g、アクリル酸58g、2,6-ジ-tert-ブチル-p-クレゾール0.26g、テトラ-n-ブチルアンモニウムブロミド0.11g及びPGMEA105gを仕込み、120℃で16時間撹拌した。反応液を室温まで冷却し、PGMEA160g、ビフタル酸無水物59g及びテトラ-n-ブチルアンモニウムブロミド0.24gを加えて、120℃で4時間撹拌した。更に、テトラヒドロ無水フタル酸20gを加え、120℃で4時間、100℃で3時間、80℃で4時間、60℃で6時間、40℃で11時間撹拌した後、PGMEA128gを加えて、PGMEA溶液としてバインダー樹脂B-1を得た(Mw=5000、固形分44.0%、酸価=100mgKOH/g)。 [Production Example 1] Preparation of binder resin B-1 184 g of 1,1-bis [4- (2,3-epoxypropyloxy) phenyl] indane, 58 g of acrylic acid, 2,6-di-tert-butyl-p -Cresol 0.26 g, tetra-n-butylammonium bromide 0.11 g and PGMEA 105 g were charged and stirred at 120 ° C for 16 hours. The reaction solution was cooled to room temperature, 160 g of PGMEA, 59 g of biphthalic anhydride and 0.24 g of tetra-n-butylammonium bromide were added, and the mixture was stirred at 120 ° C. for 4 hours. Further, 20 g of tetrahydrophthalic anhydride was added, and after stirring at 120 ° C. for 4 hours, at 100 ° C. for 3 hours, at 80 ° C. for 4 hours, at 60 ° C. for 6 hours, and at 40 ° C. for 11 hours, 128 g of PGMEA was added, As a result, binder resin B-1 was obtained (Mw = 5000, solid content 44.0%, acid value = 100 mgKOH / g).
ビス〔4-(2,3-エポキシプロポキシ)フェニル〕-4-ビフェニリル(シクロヘキシル)メタン89.9g、アクリル酸23.5g、2,6-ジ-tert-ブチル-p-クレゾール0.457g、ベンジルトリエチルアンモニウムクロリド0.534g及びPGMEA75.6gを仕込み、120℃で16時間撹拌した。室温まで冷却し、2,4-ペンタンジオン12.0g、トリエチルアミン1.0gを仕込み、92℃で17時間撹拌した。室温まで冷却し、無水コハク酸25.6g、テトラ-n-ブチルアンモニウムブロマイド1.39g、PGMEA40.42gを加えて100℃で5時間撹拌した。室温まで冷却し、PGMEA46.7gを加えて、PGMEA溶液としてバインダー樹脂B-2を得た(Mw=3500、固形分44.0%、酸価90mgKOH/g)。 [Production Example 2] Preparation of binder resin B-2 Bis [4- (2,3-epoxypropoxy) phenyl] -4-biphenylyl (cyclohexyl) methane 89.9 g, acrylic acid 23.5 g, 2,6-di- 0.457 g of tert-butyl-p-cresol, 0.534 g of benzyltriethylammonium chloride and 75.6 g of PGMEA were charged and stirred at 120 ° C. for 16 hours. The mixture was cooled to room temperature, charged with 12.0 g of 2,4-pentanedione and 1.0 g of triethylamine, and stirred at 92 ° C. for 17 hours. After cooling to room temperature, 25.6 g of succinic anhydride, 1.39 g of tetra-n-butylammonium bromide and 40.42 g of PGMEA were added and stirred at 100 ° C. for 5 hours. After cooling to room temperature, 46.7 g of PGMEA was added to obtain a binder resin B-2 as a PGMEA solution (Mw = 3500, solid content 44.0%, acid value 90 mgKOH / g).
[表1]の配合に従って各成分を混合し、導電ペーストNo.1~3及び比較導電ペーストNo.1~3を得た。尚、数字は質量部を表す。 [Examples 1 to 3 and Comparative Examples 1 to 3] Conductive paste No. 1 1 to 3 and comparative conductive paste No. 1 Preparation of 1 to 3 Each component was mixed according to the formulation of [Table 1]. 1 to 3 and comparative conductive paste No. 1 1-3 were obtained. In addition, a number represents a mass part.
A-1 化合物No.6
A’-1 IRGACURE-907(重合開始剤;BASF社製)
A’-2 OXE-02(重合開始剤;BASF社製)
B-1 上記製造例1で得られたもの
B-2 上記製造例2で得られたもの
B-3 SPC-1000(Mw=32000、固形分29.0%、酸価110mgKOH/g、アクリレート;昭和電工社製)
C-1 カヤラッドDPHA(多官能アクリレート;日本化薬社製)
D-1 FA-333(バインダー樹脂+導電性粒子;藤倉化成社製)
E-1 プロピレングリコール-1-モノメチルエーテル-2-アセテート
F-1 F-554(レべリング剤;DIC社製) Among the following components, components other than B-1, B-2 and B-3 and E-1 which is a solvent do not contain a solvent and have a solid content of 100%.
A-1 Compound No. 6
A'-1 IRGACURE-907 (polymerization initiator; manufactured by BASF)
A'-2 OXE-02 (polymerization initiator; manufactured by BASF)
B-1 Obtained in Production Example 1 B-2 Obtained in Production Example 2 B-3 SPC-1000 (Mw = 32000, solid content 29.0%, acid value 110 mgKOH / g, acrylate; Showa Denko)
C-1 Kayalad DPHA (multifunctional acrylate; manufactured by Nippon Kayaku Co., Ltd.)
D-1 FA-333 (binder resin + conductive particles; manufactured by Fujikura Kasei Co., Ltd.)
E-1 Propylene glycol-1-monomethyl ether-2-acetate F-1 F-554 (leveling agent; manufactured by DIC)
スピンコーターでウェハー上に導電ペーストNo.1~3及び比較導電ペーストNo.1~3をそれぞれ塗布後、乾燥した。フォトマスクを用いて、露光した。次いで0.4%炭酸ナトリウム現像液を用いて現像、リンスを行い、パターンを得た。その後キュア炉にてキュアを行い、下記感度、解像度及びオーバーハング量を評価した。
(感度)
30μmの線幅が剥がれなく解像されている露光量をもって感度とした。
(解像度)
線幅が30μmのとき線間が何μmまで解像されているかを測定した。
(オーバーハング量)
SEM(走査型電子顕微鏡)でパターンの断面を見たとき、パターンの表面側と基板側のパターン幅の差を測定した。
(密着性)
スピンコーターでウェハー上に導電ペーストNo.1~3及び比較導電ペーストNo.1~3をそれぞれ塗布後、乾燥した。続いて、超高圧水銀ランプで300mJ/cm2のエネルギーを照射し、サンプルを作製した。作製したサンプルの粘着テープピーリングを行い、パターンの剥離がないかどうかで評価した。評価基準は以下のとおりである。
○:パターン剥離無し
△:パターンの一部に剥離有り
×:パターン剥離有り
(比抵抗値)
スピンコーターでウェハー上に導電ペーストNo.1~3及び比較導電ペーストNo.1~3をそれぞれ塗布後、乾燥した。続いて、超高圧水銀ランプで300mJ/cm2のエネルギーを照射し、サンプルを作製した。作製したサンプルをロレスタHP〔ダイヤインスルメンツ製:商品名〕により4端針法にて比抵抗値を測定した。 [Evaluation methods]
Conductive paste No. on the wafer with a spin coater. 1 to 3 and comparative conductive paste No. 1 Each of 1 to 3 was applied and then dried. It exposed using the photomask. Next, development and rinsing were performed using a 0.4% sodium carbonate developer to obtain a pattern. Thereafter, curing was performed in a curing furnace, and the following sensitivity, resolution, and overhang amount were evaluated.
(sensitivity)
Sensitivity was defined as the exposure amount at which a line width of 30 μm was resolved without peeling.
(resolution)
When the line width was 30 μm, it was measured how many μm the space between the lines was resolved.
(Overhang amount)
When the cross section of the pattern was viewed with an SEM (scanning electron microscope), the difference in pattern width between the surface side of the pattern and the substrate side was measured.
(Adhesion)
Conductive paste No. on the wafer with a spin coater. 1 to 3 and comparative conductive paste No. 1 Each of 1 to 3 was applied and then dried. Subsequently, an energy of 300 mJ / cm 2 was irradiated with an ultrahigh pressure mercury lamp to prepare a sample. The produced sample was peeled off with an adhesive tape and evaluated by checking whether there was any peeling of the pattern. The evaluation criteria are as follows.
○: No pattern peeling △: Peeling part of the pattern ×: Pattern peeling (specific resistance value)
Conductive paste No. on the wafer with a spin coater. 1 to 3 and comparative conductive paste No. 1 Each of 1 to 3 was applied and then dried. Subsequently, an energy of 300 mJ / cm 2 was irradiated with an ultrahigh pressure mercury lamp to prepare a sample. The specific resistance value of the prepared sample was measured by a four-end needle method using Loresta HP (manufactured by Dia Instruments: trade name).
Claims (6)
- 下記一般式(I)で表されるオキシムエステル化合物の一種以上を含む重合開始剤(A)、バインダー樹脂(B)、エチレン性不飽和化合物(C)、導電性粒子(D)及び溶媒(E)を含有する導電ペースト。
(式中、R1及びR2は、それぞれ独立に、R11、OR11、COR11、SR11、CONR12R13又はCNを表し、
R11、R12及びR13は、それぞれ独立に、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
R11、R12及びR13で表わされる基の水素原子は、更にR21、OR21、COR21、SR21、NR22R23、CONR22R23、-NR22-OR23、-NCOR22-OCOR23、NR22COR21、OCOR21、COOR21、SCOR21、OCSR21、COSR21、CSOR21、水酸基、ニトロ基、CN、アミノ基、ハロゲン原子又はCOOR21で置換されている場合もあり、
R21、R22及びR23は、それぞれ独立に、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
R21、R22及びR23で表される基の水素原子は、更に水酸基、ニトロ基、CN、ハロゲン原子、水酸基又はカルボキシル基で置換されている場合もあり、
R11、R12、R13、R21、R22及びR23で表される基中のメチレン基は、-O-、-S-、-COO-、-OCO-、-NR24-、-NR24COO-、-OCONR24-、-SCO-、-COS-、-OCS-又は-CSO-により酸素原子が隣り合わない条件で1~5回置き換えられている場合もあり、
R24は、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
R11、R12、R13、R21、R22、R23及びR24で表される基がアルキル部分を有する場合、該アルキル部分は、分岐側鎖を有する場合もあり、環状アルキルである場合もあり、
R3は、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、R3で表される基がアルキル部分を有する場合、該アルキル部分は、分岐側鎖を有する場合もあり、環状アルキルである場合もあり、
R3で表わされる基の水素原子は、更にR21、OR21、COR21、SR21、NR22R23、CONR22R23、-NR22-OR23、-NCOR22-OCOR23、NR22COR21、OCOR21、COOR21、SCOR21、OCSR21、COSR21、CSOR21、水酸基、ニトロ基、CN、ハロゲン原子又はCOOR21で置換されている場合もあり、
R4、R5、R6及びR7は、それぞれ独立に、R11、OR11、SR11、COR14、CONR15R16、NR12COR11、OCOR11、COOR14、SCOR11、OCSR11、COSR14、CSOR11、水酸基、CN又はハロゲン原子を表し、
また、R3とR7、R3とR8、R4とR5、R5とR6又はR6とR7はそれぞれ一緒になって環を形成している場合もあり、
R14、R15及びR16は、水素原子又は炭素原子数1~20のアルキル基を表し、
R8は、R11、OR11、SR11、COR11、CONR12R13、NR12COR11、OCOR11、COOR11、SCOR11、OCSR11、COSR11、CSOR11、水酸基、CN又はハロゲン原子を表し、
nは、0又は1を表す。) Polymerization initiator (A) containing at least one oxime ester compound represented by the following general formula (I), binder resin (B), ethylenically unsaturated compound (C), conductive particles (D) and solvent (E ) Containing conductive paste.
(Wherein R 1 and R 2 each independently represent R 11 , OR 11 , COR 11 , SR 11 , CONR 12 R 13 or CN;
R 11 , R 12 and R 13 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a carbon atom. Represents a heterocyclic-containing group of formula 2 to 20,
The hydrogen atoms of the groups represented by R 11 , R 12 and R 13 are further R 21 , OR 21 , COR 21 , SR 21 , NR 22 R 23 , CONR 22 R 23 , —NR 22 —OR 23 , —NCOR 22 -OCOR 23 , NR 22 COR 21 , OCOR 21 , COOR 21 , SCOR 21 , OCSR 21 , COSR 21 , CSOR 21 , hydroxyl group, nitro group, CN, amino group, halogen atom or COOR 21 may be substituted ,
R 21 , R 22 and R 23 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a carbon atom. Represents a heterocyclic-containing group of formula 2 to 20,
The hydrogen atom of the group represented by R 21 , R 22 and R 23 may be further substituted with a hydroxyl group, a nitro group, CN, a halogen atom, a hydroxyl group or a carboxyl group,
The methylene groups in the groups represented by R 11 , R 12 , R 13 , R 21 , R 22 and R 23 are —O—, —S—, —COO—, —OCO—, —NR 24 —, — NR 24 COO—, —OCONR 24 —, —SCO—, —COS—, —OCS— or —CSO— may be substituted 1 to 5 times under the condition that the oxygen atoms are not adjacent to each other,
R 24 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. Represent,
When the group represented by R 11 , R 12 , R 13 , R 21 , R 22 , R 23 and R 24 has an alkyl moiety, the alkyl moiety may have a branched side chain and is a cyclic alkyl. In some cases,
R 3 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. And when the group represented by R 3 has an alkyl moiety, the alkyl moiety may have a branched side chain or a cyclic alkyl,
The hydrogen atom of the group represented by R 3 is further represented by R 21 , OR 21 , COR 21 , SR 21 , NR 22 R 23 , CONR 22 R 23 , —NR 22 —OR 23 , —NCOR 22 —OCOR 23 , NR 22 COR 21 , OCOR 21 , COOR 21 , SCOR 21 , OCSR 21 , COSR 21 , CSOR 21 , hydroxyl group, nitro group, CN, halogen atom or COOR 21 may be substituted,
R 4 , R 5 , R 6 and R 7 are each independently R 11 , OR 11 , SR 11 , COR 14 , CONR 15 R 16 , NR 12 COR 11 , OCOR 11 , COOR 14 , SCOR 11 , OCSR 11 , COSR 14 , CSOR 11 , a hydroxyl group, CN or a halogen atom,
R 3 and R 7 , R 3 and R 8 , R 4 and R 5 , R 5 and R 6 or R 6 and R 7 may be combined to form a ring,
R 14 , R 15 and R 16 represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms,
R 8 is R 11 , OR 11 , SR 11 , COR 11 , CONR 12 R 13 , NR 12 COR 11 , OCOR 11 , COOR 11 , SCOR 11 , OCSR 11 , COSR 11 , CSOR 11 , hydroxyl group, CN or halogen atom Represents
n represents 0 or 1. ) - 上記バインダー樹脂(B)が、酸価30~300mgKOH/gであり、重量平均分子量(Mw)1,000~500,000であることを特徴とする請求項1に記載の導電ペースト。 The conductive paste according to claim 1, wherein the binder resin (B) has an acid value of 30 to 300 mgKOH / g and a weight average molecular weight (Mw) of 1,000 to 500,000.
- 上記バインダー樹脂(B)が、下記一般式(II)で表されるエポキシ化合物に、不飽和一塩基酸を付加させた構造を有するエポキシ付加化合物、又は、該エポキシ付加化合物と多塩基酸無水物とのエステル化物であることを特徴とする請求項1又は2に記載の導電ペースト。
(式中、Mは、直接結合、炭素原子数1~4のアルキレン基、炭素原子3~30の脂環式炭化水素基、炭素原子数6~12のアリール基、O、S、SO2、SS、SO、CO、OCO又は下記一般式(II-1)、(II-2)若しくは(II-3)で表される基を表し、R101、R102、R103、R104、R105、R106、R107及びR108は、それぞれ独立に、水素原子、炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基又はハロゲン原子を表し、sは0~10の数を表す。)
(R109、R110、R111、R112、R113、R114、R115、R116、R117、R118、R119、R120、R121、R122、R123、R124、R125、R126、R127、R128、R129、R130、R131及びR132は、それぞれ独立に、水素原子、炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基、又はハロゲン原子を表し、上記アルキル基及びアリールアルキル基中のメチレン基は、不飽和結合、-O-又は-S-により酸素原子が隣り合わない条件で置き換えられている場合もあり、R109、R110、R111、R112、R117、R118、R119、R120、R125、R126、R127、R128、R129、R130、R131及びR132は、隣接するR109、R110、R111、R112、R117、R118、R119、R120、R125、R126、R127、R128、R129、R130、R131又はR132同士で環を形成している場合もある。*は、*部分で、隣接する基と結合することを意味する。) The binder resin (B) is an epoxy addition compound having a structure in which an unsaturated monobasic acid is added to an epoxy compound represented by the following general formula (II), or the epoxy addition compound and a polybasic acid anhydride The conductive paste according to claim 1, wherein the conductive paste is an esterified product.
(In the formula, M is a direct bond, an alkylene group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms, an aryl group having 6 to 12 carbon atoms, O, S, SO 2 , SS, SO, CO, OCO or a group represented by the following general formula (II-1), (II-2) or (II-3) is represented, and R 101 , R 102 , R 103 , R 104 , R 105 , R 106 , R 107 and R 108 each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms or a halogen atom, and s is a number from 0 to 10 Represents.)
( R109 , R110 , R111 , R112 , R113 , R114 , R115 , R116 , R117 , R118 , R119 , R120 , R121 , R122 , R123 , R124 , R 125 , R 126 , R 127 , R 128 , R 129 , R 130 , R 131 and R 132 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms. Represents an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocycle-containing group having 2 to 20 carbon atoms, or a halogen atom, and methylene in the above alkyl group and arylalkyl group groups, unsaturated bonds, by -O- or -S- sometimes oxygen atoms are replaced by conditions that are not adjacent, R 109, R 110 R 111, R 112, R 117 , R 118, R 119, R 120, R 125, R 126, R 127, R 128, R 129, R 130, R 131 and R 132 are adjacent R 109, R 110 , R 111 , R 112 , R 117 , R 118 , R 119 , R 120 , R 125 , R 126 , R 127 , R 128 , R 129 , R 130 , R 131, or R 132 form a ring. In some cases, * means that it is bonded to an adjacent group at the * part.) - 請求項1~3の何れか一項に記載の導電ペーストからなる導電パターン。 A conductive pattern comprising the conductive paste according to any one of claims 1 to 3.
- 請求項1~3の何れか一項に記載の導電ペーストを、基板上へ塗布する工程、乾燥する工程、マスクを用いて露光する工程、現像する工程、100~300℃で焼成を行う工程を含む導電パターンの形成方法。 A step of applying the conductive paste according to any one of claims 1 to 3 on a substrate, a step of drying, a step of exposing using a mask, a step of developing, and a step of baking at 100 to 300 ° C. A method for forming a conductive pattern.
- 請求項4に記載の導電パターンを備えるタッチパネル。
A touch panel provided with the conductive pattern according to claim 4.
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KR1020227007624A KR102426654B1 (en) | 2016-03-31 | 2017-03-28 | Conductive paste |
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JP2013101861A (en) | 2011-11-09 | 2013-05-23 | Toppan Printing Co Ltd | Photosensitive conductive paste, conductive circuit pattern, touch panel sensor, and display device |
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JP2016031503A (en) * | 2014-07-30 | 2016-03-07 | 日立化成株式会社 | Method for forming conductive pattern, conductive pattern substrate, and touch panel sensor |
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WO2015151892A1 (en) * | 2014-03-31 | 2015-10-08 | 東洋紡株式会社 | Photosensitive conductive paste, conductive thin film, electrical circuit and touch panel |
JP2015193709A (en) * | 2014-03-31 | 2015-11-05 | 太陽インキ製造株式会社 | Conductive resin composition and conductive circuit |
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