WO2017169584A1 - Composition, cured film, color filter, light-blocking film, solid-state imaging element and image display device - Google Patents

Composition, cured film, color filter, light-blocking film, solid-state imaging element and image display device Download PDF

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Publication number
WO2017169584A1
WO2017169584A1 PCT/JP2017/009177 JP2017009177W WO2017169584A1 WO 2017169584 A1 WO2017169584 A1 WO 2017169584A1 JP 2017009177 W JP2017009177 W JP 2017009177W WO 2017169584 A1 WO2017169584 A1 WO 2017169584A1
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group
titanium nitride
containing particles
composition
mass
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PCT/JP2017/009177
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French (fr)
Japanese (ja)
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久保田 誠
浜田 大輔
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富士フイルム株式会社
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Priority to CN201780020774.2A priority Critical patent/CN109073799B/en
Priority to KR1020187027311A priority patent/KR102160018B1/en
Priority to JP2018508890A priority patent/JP6698820B2/en
Publication of WO2017169584A1 publication Critical patent/WO2017169584A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/28Nitrogen-containing compounds
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/06Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/076Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with titanium or zirconium or hafnium
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/002Physical properties
    • C08K2201/006Additives being defined by their surface area
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/011Nanostructured additives

Definitions

  • the present invention relates to a composition, a cured film, a color filter, a light shielding film, a solid-state imaging device, and an image display device.
  • a solid-state imaging device is a photographic lens and a solid-state imaging device (hereinafter referred to as an “image sensor”) such as a CCD (charge coupled device) and a CMOS (complementary metal oxide semiconductor) disposed behind the photographic lens. And a circuit board on which the solid-state imaging device is mounted.
  • This solid-state imaging device is mounted on a digital camera, a mobile phone with a camera, a smartphone, and the like.
  • a predetermined light shielding film can be provided in the solid-state imaging device for the purpose of suppressing noise generation.
  • a black composition containing a black pigment such as titanium black is used.
  • color filters disposed in a solid-state imaging device, a liquid crystal image device, and the like have R (red), G (green), and B (in order to improve contrast by preventing color mixing between colored pixels.
  • a black matrix may be formed between each blue pixel.
  • an image sensor peripheral light-shielding film (frame light-shielding film) is formed in the frame region of the color filter for the purpose of preventing light leakage from the light receiving portion of the solid-state imaging device.
  • a black composition containing a black pigment such as titanium black is also used in the composition for forming the black matrix.
  • Patent Document 1 states that “a black resin composition for a resin black matrix containing at least a light shielding material, a resin and a solvent, and containing at least titanium nitride particles as a light shielding material, and using CuK ⁇ rays as an X-ray source.
  • a black resin composition for a resin black matrix having a diffraction angle 2 ⁇ of a peak derived from the (200) plane of the titanium nitride particles of 42.5 ° or more and 42.8 ° or less is disclosed. 1).
  • the cured film of the black composition containing titanium nitride particles (titanium nitride-containing particles) as described above is, for example, as a light shielding film of a constituent member of a solid-state imaging device, a black matrix of a color filter, or an image sensor peripheral light shielding film. When used, it may be used by being laminated on a substrate on which electrodes such as electrode patterns are arranged.
  • the inventors of the present invention produced a black composition containing titanium nitride particles (titanium nitride-containing particles) described in Patent Document 1, and used this to form an electrode on a substrate on which the electrode was placed. A cured film was formed so as to be coated and evaluated.
  • the present inventors have found that the above problems can be solved by adjusting the content of chlorine atoms in the titanium nitride-containing particles to a predetermined numerical range. Completed. That is, it has been found that the above object can be achieved by the following configuration.
  • the diffraction angle 2 ⁇ of the peak derived from the (200) plane of the titanium nitride-containing particles is 42.8 ° or more and 43.5 ° or less when CuK ⁇ ray is used as the X-ray source. ).
  • (11) The composition according to any one of (1) to (10), wherein the solid content in the composition is 10 to 40% by mass.
  • it contains water, The composition according to any one of (1) to (12), wherein the water content is 0.1 to 1% by mass relative to the total mass of the composition.
  • a dispersant is contained, The composition according to any one of (1) to (13), wherein the dispersant has at least one structure selected from the group consisting of polycaprolactone, polyvalerolactone, polymethyl acrylate, and polymethyl methacrylate. object.
  • a cured film obtained using the composition according to any one of (1) to (14).
  • a color filter having the cured film according to (15).
  • a light shielding film having the cured film according to (15).
  • a solid-state imaging device having the cured film according to (15).
  • An image display device having the cured film according to (15).
  • the present invention it is possible to provide a composition capable of producing a cured film having excellent anticorrosive properties of electrodes and excellent patterning properties.
  • the present invention can provide a cured film, a color filter, a light shielding film, a solid-state imaging device, and an image display device.
  • a numerical range expressed using “to” means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
  • the description which does not describe substitution and non-substitution includes what does not have a substituent and what has a substituent.
  • the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • Actinic light means, for example, an emission line spectrum of a mercury lamp, far ultraviolet rays represented by an excimer laser, extreme ultraviolet rays (EUV light), X-rays, and electron beams. .
  • light means actinic rays or radiation.
  • exposure in the present specification includes not only exposure with a mercury lamp emission line spectrum, an excimer laser represented by far ultraviolet rays, X-rays, and EUV light, but also electron beams, ion beams, and the like. The exposure with the particle beam is also included in the exposure.
  • (meth) acrylate represents acrylate and methacrylate
  • (meth) acryl represents acrylic and methacryl
  • (meth) acryloyl represents acryloyl and methacryloyl
  • (meth) ) Acrylamide refers to acrylamide and methacrylamide.
  • “monomer” and “monomer” are synonymous.
  • the monomer in the present invention is distinguished from an oligomer and a polymer and refers to a compound having a weight average molecular weight of 2,000 or less.
  • the polymerizable compound means a compound having a polymerizable group, and may be a monomer or a polymer.
  • the polymerizable group refers to a group that participates in a polymerization reaction.
  • composition of the present invention contains titanium nitride-containing particles containing chlorine atoms, and the content of the chlorine atoms in the titanium nitride-containing particles is 0.001 to 0.3% by mass. According to the composition of this invention, the cured film excellent in the anticorrosion property of the electrode and excellent in patterning property can be produced. As a result of intensive studies, the inventors of the present invention used a black composition containing, as a pigment component, titanium nitride-containing particles having a chlorine atom content exceeding 0.3% by mass on a substrate on which an electrode is disposed.
  • a gas phase reaction method is usually used, and specific examples include an electric furnace method and a thermal plasma method.
  • the thermal plasma method is preferred because it is less contaminated with impurities, has a uniform particle diameter, and has high productivity.
  • the method for generating thermal plasma include direct current arc discharge, multiphase arc discharge, radio frequency (RF) plasma, and hybrid plasma, and high frequency plasma in which impurities from the electrode are less mixed is preferable.
  • titanium powder is evaporated by high-frequency thermal plasma, nitrogen is introduced into the apparatus as a carrier gas, and titanium powder is nitrided in the cooling process. And a method of synthesizing titanium nitride-containing particles.
  • the thermal plasma method is not limited to the above.
  • the titanium nitride-containing particles are obtained by using a thermal plasma method, whereby a peak diffraction angle 2 ⁇ (details will be described later) derived from the (200) plane when CuK ⁇ rays are used as an X-ray source, It becomes easy to adjust to the range of 42.8 ° or more and 43.5 ° or less.
  • the method for causing the titanium nitride-containing particles to contain chlorine atoms is not particularly limited.
  • a method of synthesizing titanium nitride-containing particles containing chlorine atoms by using titanium tetrachloride together with titanium powder and flowing ammonia gas as a carrier gas in the thermal plasma method described above can be given.
  • the particles are, for example, 100 to 300 ° C. (preferably 120 to 280 ° C., more preferably 120 to 250 ° C.) and 5 It is desirable to carry out heat treatment for minutes to 72 hours (preferably 3 to 48 hours, more preferably 3 to 36 hours). Through the heat treatment, the content of chlorine atoms contained in the titanium nitride-containing particles can be reduced and adjusted to a predetermined amount.
  • the titanium powder material (titanium particles) and titanium tetrachloride used for the production of titanium nitride-containing particles are preferably of high purity.
  • the titanium powder material and titanium tetrachloride are not particularly limited, but those having a purity of titanium element of 99.99% or more are preferable, and those of 99.999% or more are more preferably used.
  • the titanium powder material (titanium particles) and titanium tetrachloride used for the production of titanium nitride-containing particles may contain atoms other than titanium atoms.
  • examples of other atoms that can be contained in the titanium powder material include Fe atoms and Si atoms.
  • the content of Fe atoms is preferably more than 0.001% by mass with respect to the total mass of the titanium powder material and titanium tetrachloride. Thereby, the patterning property of a cured film is more excellent.
  • the content of Fe atoms is preferably less than 0.4 mass% with respect to the total amount of the titanium powder material and titanium tetrachloride. .
  • the corrosion resistance of the electrode by a cured film is more excellent (it can suppress more that a cured film corrodes an electrode). That is, the Fe powder contained in the titanium powder material and titanium tetrachloride used for the production of titanium nitride-containing particles is within the above range (over 0.001 mass, less than 0.4 mass%). The effect can be obtained more remarkably.
  • the Si atom content is preferably more than 0.002% by mass and less than 0.3% by mass with respect to the total mass of the titanium powder material. More preferably, the content is 0.01 to 0.15% by mass, and further preferably 0.02 to 0.1% by mass. When the content of Si atoms is more than 0.002% by mass, the patterning property of the cured film is further improved.
  • the content of Si atoms is less than 0.3% by mass, the polarity of the outermost layer of the obtained titanium nitride-containing particles is stabilized, and the titanium nitride-containing particles when the titanium nitride-containing particles are dispersed It is considered that the adsorbing property of the dispersant on the surface is improved, and the undispersed material of the titanium nitride-containing particles is reduced, thereby suppressing the generation of particles. That is, the effect of the present invention can be obtained more remarkably when the Si atom contained in the titanium powder material and titanium tetrachloride used for the production of titanium nitride-containing particles is within the above range.
  • the titanium powder material (titanium particles) and titanium tetrachloride used in the production of titanium nitride-containing particles preferably have a water content of less than 1% by mass with respect to the total mass of the titanium powder material. More preferably, it is less than 1 mass%, and it is still more preferable not to contain substantially.
  • the effect of this invention can be acquired more notably because the water
  • the content of titanium atoms (Ti atoms) in the titanium nitride-containing particles is preferably 50 to 85% by mass and preferably 50 to 80% by mass with respect to the total mass of the titanium nitride-containing particles. More preferred is 50 to 75% by mass.
  • the content of Ti atoms in the titanium nitride-containing particles can be analyzed by ICP (High Frequency Inductively Coupled Plasma) emission spectroscopy.
  • the content of nitrogen atoms (N atoms) in the titanium nitride-containing particles is preferably 20 to 50% by mass and preferably 20 to 45% by mass with respect to the total mass of the titanium nitride-containing particles. More preferred is 20 to 40% by mass.
  • the nitrogen atom content can be analyzed by an inert gas melting-thermal conductivity method.
  • the content of oxygen atoms in the titanium nitride-containing particles is preferably 12% by mass or less, and more preferably 8% by mass or less, based on the total mass of the titanium nitride-containing particles.
  • the oxygen atom content can be analyzed by an inert gas melting-infrared absorption method.
  • the content of chlorine atoms in the titanium nitride-containing particles is 0.001 to 0.3% by mass with respect to the total mass of the titanium nitride-containing particles.
  • the content is preferably 0.005 to 0.3% by mass, more preferably 0.01 to 0.3% by mass, still more preferably 0.1 to 0.3% by mass, From 0.15% by weight is particularly preferred.
  • the chlorine atom content is 0.001% by mass or more, the patterning property of the cured film is excellent.
  • the content of chlorine atoms is 0.3% by mass or less, the patterning property of the cured film is excellent, and the corrosion resistance of the electrode by the cured film is excellent.
  • the content of chlorine atoms in the titanium nitride-containing particles is measured by ICP emission spectroscopy.
  • the titanium nitride-containing particles may have a diffraction angle 2 ⁇ of a peak derived from the (200) plane of 42.8 ° or more and 43.5 ° or less when an X-ray diffraction spectrum is measured using CuK ⁇ ray as an X-ray source.
  • a cured film eg, a black matrix obtained using a composition containing titanium nitride-containing particles having such characteristics has an appropriate OD value and is excellent in patterning properties (resolution).
  • the diffraction angle 2 ⁇ of the peak derived from the (200) plane of the titanium nitride-containing particles is preferably more than 42.8 ° and not more than 43.5 ° as described above, and is 42.85 to 43.3 °. Is more preferably 42.9 to 43.2 °.
  • Titanium nitride-containing particles contain titanium nitride (TiN) as a main component and are usually noticeable when oxygen is mixed during the synthesis and when the particle diameter is small, but due to oxidation of the particle surface, etc. A part of oxygen atoms may be contained. However, a smaller amount of oxygen contained in the titanium nitride-containing particles is preferable because a higher OD value (optical density) can be obtained.
  • the titanium nitride-containing particles preferably contains no TiO 2 as an auxiliary component.
  • TiO 2 is white and causes a reduction in the light shielding properties of the black matrix, it is preferably reduced to such an extent that it is not observed as a peak.
  • the crystallite size constituting the titanium nitride-containing particles can be determined from the half width of the X-ray diffraction peak, and is calculated using Scherrer's formula.
  • the crystallite size is preferably 20 nm or more, more preferably 20 to 50 nm.
  • a black matrix is formed using titanium nitride-containing particles having a crystallite size of 20 nm or more, the transmitted light of the cured film exhibits a blue to blue violet color having a peak wavelength of 475 nm or less, and has high light shielding properties and ultraviolet light.
  • a black matrix having both sensitivity can be obtained.
  • the specific surface area of the titanium nitride-containing particles can be determined by the BET method and is preferably 40 to 60 m 2 / g, more preferably 40 to 58 m 2 / g, and 42 to 55 m 2 / g. More preferably.
  • the specific surface area of the titanium nitride-containing particles By setting the specific surface area of the titanium nitride-containing particles to 40 to 60 m 2 / g, the resulting cured film has an OD (optical density) value in a more appropriate range and is superior in patterning properties (resolution). Excellent filterability of things.
  • the average primary particle diameter of the titanium nitride-containing particles is preferably 10 to 30 nm, more preferably 10 to 28 nm, further preferably 10 to 25 nm, and further preferably 10 to 20 nm. .
  • the obtained cured film has an OD (optical density) value in an appropriate range.
  • the average primary particle diameter of the titanium nitride-containing particles is preferably 10 nm or more.
  • the average primary particle diameter of the titanium nitride-containing particles is obtained by observing the particles with a transmission electron microscope (for example, an apparatus according to JEM-2100F type field emission transmission electron microscope manufactured by JEOL). It can be determined from the photograph taken and refers to the number average particle size of primary particles.
  • a dispersion containing titanium nitride-containing particles is prepared by the method described in the examples, diluted with the same solvent as the dispersion so that the solid content is about 1% by mass, and dispersed on the carbon foil.
  • a transmission electron microscope image of the titanium nitride-containing particles present on the carbon foil after dropping and drying the liquid is observed.
  • the projected area of the primary particles of titanium nitride-containing particles is determined by the above apparatus, and the equivalent circle diameter is determined therefrom.
  • the arithmetic average of the obtained equivalent circle diameter was defined as the primary particle diameter. More specifically, after measuring the primary particle size of 100 particles randomly selected to determine the average primary particle size, 80 particles excluding the maximum 10 particles and the minimum 10 particles are excluded. It is calculated
  • the obtained cured film has an OD (optical density) value in an appropriate range and is excellent in patterning properties (resolution). Moreover, 60% or more of the titanium nitride-containing particles to be used are spherical, so that the filterability and viscosity aging stability of the composition are excellent.
  • the term “spherical” means that the particles are not necessarily true spheres. For example, the particles are substantially spherical (the ratio of the minor axis / major axis in the two-dimensional figure when projected is 0.7 to 1). Degree) or a spheroid.
  • the content of titanium nitride-containing particles is preferably 30 to 70% by mass, more preferably 40 to 68% by mass, and 42 to 65% by mass with respect to the total solid content of the composition. More preferably.
  • content of the titanium nitride-containing particles is in the above numerical range, in addition to excellent spectral properties (good OD value), patterning properties (resolution) and anticorrosion properties of the electrodes are also excellent.
  • solid content intends the component which comprises the cured film formed with a composition, and a solvent is not contained. For example, since the polymerizable compound described later is a component constituting the cured film, even a liquid (liquid) is included in the solid content.
  • the composition of the present invention preferably contains a dispersant.
  • a dispersing agent contributes to the improvement of dispersibility of pigments, such as a titanium nitride content particle mentioned above.
  • a dispersing agent and the binder resin mentioned later are different components.
  • the dispersant for example, a known pigment dispersant can be appropriately selected and used. Of these, polymer compounds are preferable.
  • dispersant examples include polymer dispersants [for example, polyamidoamine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meth) acrylate, (meth) acrylic type Copolymer, naphthalenesulfonic acid formalin condensate], polyoxyethylene alkyl phosphate ester, polyoxyethylene alkyl amine, and pigment derivatives.
  • the polymer compounds can be further classified into linear polymers, terminal-modified polymers, graft polymers, and block polymers based on their structures.
  • the polymer compound is adsorbed on the surface of the dispersion such as titanium nitride-containing particles and optionally used pigments, and acts to prevent re-aggregation of the dispersion. Therefore, a terminal-modified polymer, a graft polymer, and a block polymer having an anchor site to the pigment surface are preferable. On the other hand, by modifying the surface of the titanium nitride-containing particles, the adsorptivity of the polymer compound can be promoted.
  • the polymer compound preferably has a structural unit having a graft chain.
  • structural unit is synonymous with “repeating unit”. Since the polymer compound having a structural unit having such a graft chain has an affinity for a solvent by the graft chain, the dispersibility of pigments such as titanium nitride-containing particles and the dispersion stability after aging are improved. It is excellent. Further, due to the presence of the graft chain, the polymer compound having a structural unit having a graft chain has an affinity with a polymerizable compound or other resin that can be used in combination. As a result, it becomes difficult to produce a residue by alkali development.
  • the graft chain When the graft chain becomes longer, the steric repulsion effect becomes higher and the dispersibility of the pigment and the like is improved. On the other hand, if the graft chain is too long, the adsorptive power to the pigment such as titanium nitride-containing particles decreases, and the dispersibility of the pigment or the like tends to decrease.
  • the graft chain preferably has 40 to 10,000 atoms excluding hydrogen atoms, more preferably 50 to 2000 atoms excluding hydrogen atoms, and the number of atoms excluding hydrogen atoms. More preferred is 60-500.
  • the graft chain means from the base of the main chain of the copolymer (the atom bonded to the main chain in a group branched from the main chain) to the end of the group branched from the main chain.
  • the graft chain preferably has a polymer structure.
  • a polymer structure include a poly (meth) acrylate structure (for example, a poly (meth) acrylic structure), a polyester structure, a polyurethane structure, a polyurea structure, and a polyamide structure. And a polyether structure.
  • the graft chain is made of at least one selected from the group consisting of a polyester structure, a polyether structure and a poly (meth) acrylate structure. It is preferably a graft chain having, and more preferably a graft chain having at least one of a polyester structure and a polyether structure.
  • the macromonomer having such a graft chain is not particularly limited, but a macromonomer having a reactive double bond group can be preferably used.
  • AA-6 trade name, Toa Gosei Co., Ltd.
  • AA-10 Product name, manufactured by Toa Gosei Co., Ltd.
  • AB-6 trade name, manufactured by Toa Gosei Co., Ltd.
  • AS-6 trade name, produced by Toa Gosei Co., Ltd.
  • AN-6 trade name, manufactured by Toa Gosei Co., Ltd.
  • Co., Ltd. AW-6 (trade name, manufactured by Toa Gosei Co., Ltd.), AA-714 (trade name, manufactured by Toa Gosei Co., Ltd.), AY-707 (trade name, manufactured by Toa Gosei Co., Ltd.), AY-714 (trade name, manufactured by Toa Gosei Co., Ltd.), AK-5 (trade name, manufactured by Toa Gosei Co., Ltd.
  • AA-6 (trade name, manufactured by Toa Gosei Co., Ltd.), AA-10 (trade name, manufactured by Toa Gosei Co., Ltd.), AB-6 (trade name, manufactured by Toa Gosei Co., Ltd.) AS-6 (trade name, manufactured by Toa Gosei Co., Ltd.), AN-6 (trade name, manufactured by Toa Gosei Co., Ltd.), Blemmer PME-4000 (trade name, manufactured by NOF Corporation), etc. It is done.
  • the dispersant preferably has at least one structure selected from the group consisting of polycaprolactone, polyvalerolactone, polymethyl acrylate and polymethyl methacrylate. Furthermore, it is more preferable to use two or more of these structures in combination.
  • the polycaprolactone structure means a structure having a ring-opened structure of ⁇ -caprolactone as a repeating unit.
  • the polyvalerolactone structure means a structure having a ring-opened structure of ⁇ -valerolactone as a repeating unit.
  • Specific examples of the dispersant having a polycaprolactone structure include those in which j and k are 5 in the following formula (1) and the following formula (2).
  • dispersant having a polyvalerolactone structure examples include those in which j and k in the following formula (1) and the following formula (2) are 4.
  • Specific examples of the dispersant having a polymethyl acrylate structure include those in which X 5 in the following formula (4) is a hydrogen atom and R 4 is a methyl group.
  • specific examples of the dispersant having a polymethyl methacrylate structure include those in which X 5 in the following formula (4) is a methyl group and R 4 is a methyl group.
  • the polymer compound preferably includes a structural unit represented by any one of the following formulas (1) to (4) as a structural unit having a graft chain, and includes the following formula (1A), the following formula (2A), It is more preferable to include a structural unit represented by any of the following formula (3A), the following formula (3B), and the following (4).
  • W 1 , W 2 , W 3 , and W 4 each independently represent an oxygen atom or NH.
  • W 1 , W 2 , W 3 , and W 4 are preferably oxygen atoms.
  • X 1 , X 2 , X 3 , X 4 , and X 5 each independently represent a hydrogen atom or a monovalent organic group.
  • X 1 , X 2 , X 3 , X 4 , and X 5 are each independently a hydrogen atom or an alkyl group having 1 to 12 carbon atoms (the number of carbon atoms) from the viewpoint of synthesis restrictions.
  • Y 1 , Y 2 , Y 3 , and Y 4 each independently represent a divalent linking group, and the linking group is not particularly limited in structure.
  • Specific examples of the divalent linking group represented by Y 1 , Y 2 , Y 3 , and Y 4 include the following (Y-1) to (Y-21) linking groups.
  • a and B mean binding sites with the left end group and the right end group in formulas (1) to (4), respectively. Of the structures shown below, (Y-2) or (Y-13) is more preferable from the viewpoint of ease of synthesis.
  • Z 1 , Z 2 , Z 3 , and Z 4 each independently represent a monovalent organic group.
  • the structure of the organic group is not particularly limited, and specific examples include an alkyl group, a hydroxyl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthioether group, an arylthioether group, a heteroarylthioether group, and an amino group. Is mentioned.
  • the organic group represented by Z 1 , Z 2 , Z 3 , and Z 4 those having a steric repulsion effect are particularly preferable from the viewpoint of improving dispersibility, and each independently has 5 to 24 carbon atoms.
  • a branched alkyl group having 5 to 24 carbon atoms, a cyclic alkyl group having 5 to 24 carbon atoms, or an alkoxy group having 5 to 24 carbon atoms is particularly preferable.
  • the alkyl group contained in the alkoxy group may be linear, branched, or cyclic.
  • n, m, p, and q are each independently an integer of 1 to 500.
  • j and k each independently represent an integer of 2 to 8.
  • J and k in the formulas (1) and (2) are preferably integers of 4 to 6, and more preferably 5, from the viewpoint of dispersion stability and developability of the composition.
  • R 3 represents a branched or straight chain alkylene group, preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 2 or 3 carbon atoms. When p is 2 to 500, a plurality of R 3 may be the same or different from each other.
  • R 4 represents a hydrogen atom or a monovalent organic group, and the monovalent organic group is not particularly limited in terms of structure.
  • R 4 preferably includes a hydrogen atom, an alkyl group, an aryl group, and a heteroaryl group, and more preferably a hydrogen atom or an alkyl group.
  • the alkyl group is preferably a linear alkyl group having 1 to 20 carbon atoms, a branched alkyl group having 3 to 20 carbon atoms, or a cyclic alkyl group having 5 to 20 carbon atoms, A linear alkyl group having 1 to 20 carbon atoms is more preferable, and a linear alkyl group having 1 to 6 carbon atoms is more preferable.
  • a plurality of X 5 and R 4 present in the graft copolymer may be the same or different from each other.
  • the polymer compound may have a structural unit having a graft chain, which has two or more different structures. That is, the polymer compound molecule may contain structural units represented by formulas (1) to (4) having different structures, and n, m in formulas (1) to (4). , P, and q each represents an integer of 2 or more, in Formula (1) and Formula (2), j and k may contain structures different from each other in the side chain. In the formula (4), a plurality of R 3 , R 4 and X 5 present in the molecule may be the same or different from each other.
  • the structural unit represented by the formula (1) is more preferably a structural unit represented by the following formula (1A) from the viewpoint of dispersion stability and developability of the composition.
  • the structural unit represented by the formula (2) is more preferably a structural unit represented by the following formula (2A) from the viewpoint of dispersion stability and developability of the composition.
  • X 1, Y 1, Z 1 and n are the same as X 1, Y 1, Z 1 and n in Formula (1), and preferred ranges are also the same.
  • X 2, Y 2, Z 2 and m are as defined X 2, Y 2, Z 2 and m in the formula (2), and preferred ranges are also the same.
  • the structural unit represented by formula (3) is more preferably a structural unit represented by the following formula (3A) or formula (3B) from the viewpoint of dispersion stability and developability of the composition. .
  • X 3, Y 3, Z 3 and p are as defined X 3, Y 3, Z 3 and p in formula (3), and preferred ranges are also the same.
  • the polymer compound has a structural unit represented by the formula (1A) as a structural unit having a graft chain.
  • the structural unit having a graft chain (for example, the structural unit represented by the above formulas (1) to (4)) is 2 to 90% of the total mass of the polymer compound in terms of mass. It is preferably included in a range, and more preferably in a range of 5 to 30%.
  • the structural unit having a graft chain is contained within this range, the dispersibility of the titanium nitride-containing particles is high, and the developability when forming a cured film is good.
  • the polymer compound preferably has a hydrophobic structural unit different from the structural unit having a graft chain (that is, not corresponding to the structural unit having a graft chain).
  • the hydrophobic structural unit is a structural unit having no acid group (for example, carboxylic acid group, sulfonic acid group, phosphoric acid group, phenolic hydroxyl group, etc.).
  • the hydrophobic structural unit is preferably a structural unit derived from (corresponding to) a compound (monomer) having a ClogP value of 1.2 or more, more preferably derived from a compound having a ClogP value of 1.2 to 8. A structural unit. Thereby, the effect of this invention can be expressed more reliably.
  • ClogP values are available from Daylight Chemical Information System, Inc. It is a value calculated by the program “CLOGP” available from This program provides the value of “computation logP” calculated by Hansch, Leo's fragment approach (see below). The fragment approach is based on the chemical structure of a compound, which divides the chemical structure into substructures (fragments) and estimates the logP value of the compound by summing the logP contributions assigned to that fragment. Details thereof are described in the following documents. In the present invention, the ClogP value calculated by the program CLOGP v4.82 is used. A. J. et al. Leo, Comprehensive Medicinal Chemistry, Vol. 4, C.I. Hansch, P.A. G. Sammunens, J. et al. B.
  • log P means the common logarithm of the partition coefficient P (Partition Coefficient), and quantitatively determines how an organic compound is distributed in the equilibrium of a two-phase system of oil (generally 1-octanol) and water. It is a physical property value expressed as a numerical value, and is represented by the following formula.
  • logP log (Coil / Cwater)
  • Coil represents the molar concentration of the compound in the oil phase
  • Cwater represents the molar concentration of the compound in the aqueous phase.
  • the polymer compound preferably has one or more structural units selected from structural units derived from monomers represented by the following general formulas (i) to (iii) as hydrophobic structural units.
  • R 1 , R 2 , and R 3 are each independently a hydrogen atom, a halogen atom (for example, fluorine, chlorine, bromine, etc.), or a carbon number of 1 to 6
  • An alkyl group (for example, a methyl group, an ethyl group, a propyl group, etc.) is represented.
  • R 1 , R 2 , and R 3 are preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably a hydrogen atom or a methyl group.
  • R 2 and R 3 are particularly preferably a hydrogen atom.
  • X represents an oxygen atom (—O—) or an imino group (—NH—), and is preferably an oxygen atom.
  • L is a single bond or a divalent linking group.
  • a divalent aliphatic group for example, alkylene group, substituted alkylene group, alkenylene group, substituted alkenylene group, alkynylene group, substituted alkynylene group
  • divalent aromatic group for example, arylene group
  • Substituted arylene group divalent heterocyclic group, oxygen atom (—O—), sulfur atom (—S—), imino group (—NH—), substituted imino group (—NR 31 —, where R 31 Includes an aliphatic group, an aromatic group or a heterocyclic group), a carbonyl group (—CO—), and combinations thereof.
  • the divalent aliphatic group may have a cyclic structure or a branched structure.
  • the aliphatic group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 10 carbon atoms.
  • the aliphatic group may be an unsaturated aliphatic group or a saturated aliphatic group, but is preferably a saturated aliphatic group.
  • the aliphatic group may have a substituent. Examples of the substituent include a halogen atom, an aromatic group and a heterocyclic group.
  • the carbon number of the divalent aromatic group is preferably 6 to 20, more preferably 6 to 15, and still more preferably 6 to 10.
  • the aromatic group may have a substituent. Examples of the substituent include a halogen atom, an aliphatic group, an aromatic group, and a heterocyclic group.
  • the divalent heterocyclic group preferably has a 5-membered or 6-membered ring as the heterocycle.
  • the heterocycle may be condensed with another heterocycle, aliphatic ring or aromatic ring.
  • the heterocyclic group may have a substituent. Examples of substituents include halogen atoms, hydroxy groups, oxo groups ( ⁇ O), thioxo groups ( ⁇ S), imino groups ( ⁇ NH), substituted imino groups ( ⁇ N—R 32 , where R 32 is a fatty acid Aromatic group, aromatic group or heterocyclic group), aliphatic group, aromatic group, and heterocyclic group.
  • L is preferably a single bond, an alkylene group or a divalent linking group containing an oxyalkylene structure.
  • the oxyalkylene structure is more preferably an oxyethylene structure or an oxypropylene structure.
  • L may contain a polyoxyalkylene structure containing two or more oxyalkylene structures.
  • the polyoxyalkylene structure is preferably a polyoxyethylene structure or a polyoxypropylene structure.
  • the polyoxyethylene structure is represented by — (OCH 2 CH 2 ) n—, where n is preferably an integer of 2 or more, and more preferably an integer of 2 to 10.
  • Z is an aliphatic group (eg, alkyl group, substituted alkyl group, unsaturated alkyl group, substituted unsaturated alkyl group), aromatic group (eg, aryl group, substituted aryl group, arylene group, substituted arylene group). , Heterocyclic groups, and combinations thereof. These groups include an oxygen atom (—O—), a sulfur atom (—S—), an imino group (—NH—), a substituted imino group (—NR 31 —, wherein R 31 is an aliphatic group, an aromatic group Group or heterocyclic group) or a carbonyl group (—CO—) may be contained.
  • the aliphatic group may have a cyclic structure or a branched structure.
  • the aliphatic group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 10 carbon atoms.
  • the aliphatic group further includes a ring assembly hydrocarbon group and a bridged cyclic hydrocarbon group. Examples of the ring assembly hydrocarbon group include a bicyclohexyl group, a perhydronaphthalenyl group, a biphenyl group, and 4 -A cyclohexylphenyl group and the like are included.
  • bridged cyclic hydrocarbon ring examples include 2 such as pinane, bornane, norpinane, norbornane, and bicyclooctane ring (bicyclo [2.2.2] octane ring, bicyclo [3.2.1] octane ring, etc.).
  • Tricyclic hydrocarbon rings such as cyclic hydrocarbon rings, homobredan, adamantane, tricyclo [5.2.1.0 2,6 ] decane, and tricyclo [4.3.1.1 2,5 ] undecane rings , Tetracyclo [4.4.0.1 2,5 .
  • the bridged cyclic hydrocarbon ring also includes a condensed cyclic hydrocarbon ring such as perhydronaphthalene (decalin), perhydroanthracene, perhydrophenanthrene, perhydroacenaphthene, perhydrofluorene, perhydroindene, and A condensed ring formed by condensing a plurality of 5- to 8-membered cycloalkane rings such as a perhydrophenalene ring is also included.
  • the aliphatic group is preferably a saturated aliphatic group rather than an unsaturated aliphatic group. Further, the aliphatic group may have a substituent. Examples of the substituent include a halogen atom, an aromatic group, and a heterocyclic group. However, the aliphatic group does not have an acid group as a substituent.
  • the carbon number of the aromatic group is preferably 6 to 20, more preferably 6 to 15, and further preferably 6 to 10.
  • the aromatic group may have a substituent.
  • the substituent include a halogen atom, an aliphatic group, an aromatic group, and a heterocyclic group.
  • the aromatic group does not have an acid group as a substituent.
  • the heterocyclic group preferably has a 5-membered or 6-membered ring as the heterocycle.
  • the heterocycle may be condensed with another heterocycle, aliphatic ring or aromatic ring.
  • the heterocyclic group may have a substituent. Examples of substituents include halogen atoms, hydroxy groups, oxo groups ( ⁇ O), thioxo groups ( ⁇ S), imino groups ( ⁇ NH), substituted imino groups ( ⁇ N—R 32 , where R 32 is a fatty acid Aromatic group, aromatic group or heterocyclic group), aliphatic group, aromatic group and heterocyclic group.
  • the heterocyclic group does not have an acid group as a substituent.
  • R 4 , R 5 , and R 6 are each independently a hydrogen atom, a halogen atom (eg, fluorine, chlorine, bromine, etc.), an alkyl group having 1 to 6 carbon atoms (eg, Methyl group, ethyl group, propyl group, etc.), Z, or LZ.
  • L and Z are as defined above.
  • R 4 , R 5 and R 6 are preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably a hydrogen atom.
  • R 1 , R 2 , and R 3 are a hydrogen atom or a methyl group, and L is a single bond, an alkylene group, or an oxyalkylene structure.
  • a compound in which X is an oxygen atom or an imino group and Z is an aliphatic group, a heterocyclic group or an aromatic group is preferable.
  • R 1 is a hydrogen atom or a methyl group
  • L is an alkylene group
  • Z is an aliphatic group, a heterocyclic group or an aromatic group. Is preferred.
  • R 4 , R 5 , and R 6 are a hydrogen atom or a methyl group, and Z is an aliphatic group, a heterocyclic group, or an aromatic group. Certain compounds are preferred.
  • Examples of typical compounds represented by formulas (i) to (iii) include radically polymerizable compounds selected from acrylic acid esters, methacrylic acid esters, styrenes, and the like.
  • Examples of typical compounds represented by formulas (i) to (iii) compounds described in paragraphs 0089 to 0093 of JP2013-249417A can be referred to, and the contents thereof are described in the present specification. Incorporated into.
  • the hydrophobic structural unit is preferably contained in a range of 10 to 90%, more preferably in a range of 20 to 80% with respect to the total mass of the polymer compound in terms of mass. When the content is in the above range, sufficient pattern formation can be obtained.
  • the polymer compound can introduce a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles.
  • the polymer compound preferably further has a structural unit having a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles.
  • the functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles include an acid group, a basic group, a coordinating group, and a reactive functional group.
  • the polymer compound has an acid group, a basic group, a coordinating group, or a reactive functional group, the structural unit having an acid group, the structural unit having a basic group, or a coordinating group, respectively.
  • the polymer compound further has an alkali-soluble group such as a carboxylic acid group as the acid group, it is possible to impart developability for pattern formation by alkali development to the polymer compound. That is, by introducing an alkali-soluble group into the polymer compound, the composition of the present invention has a polymer compound as a dispersant that contributes to dispersion of pigments such as titanium nitride-containing particles having alkali solubility. .
  • a composition containing such a polymer compound has excellent light-shielding properties in the exposed area, and the alkali developability in the unexposed area is improved.
  • a high molecular compound has a structural unit which has an acid group
  • the acid group in the structural unit having an acid group easily interacts with the pigment such as titanium nitride-containing particles, and the polymer compound stably disperses the pigment such as titanium nitride-containing particles, and the titanium nitride
  • the viscosity of the polymer compound in which the pigment such as the contained particles is dispersed is low, and the polymer compound itself is easily dispersed stably.
  • the structural unit having an alkali-soluble group as an acid group may be the same structural unit as the above-described structural unit having a graft chain or a different structural unit. Is a structural unit different from the hydrophobic structural unit described above (that is, does not correspond to the hydrophobic structural unit described above).
  • Examples of the acid group that is a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles include a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, or a phenolic hydroxyl group. At least one of a carboxylic acid group, a sulfonic acid group, and a phosphoric acid group, and particularly preferable ones have good adsorption power to pigments such as titanium nitride-containing particles and have high pigment dispersibility. In terms, it is a carboxylic acid group. That is, the polymer compound preferably further has a structural unit having at least one of a carboxylic acid group, a sulfonic acid group, and a phosphoric acid group.
  • the polymer compound may have one or more structural units having an acid group.
  • the polymer compound may or may not contain a structural unit having an acid group.
  • the content of the structural unit having an acid group is based on the total mass of the polymer compound in terms of mass. Preferably, it is 5 to 80%, and more preferably 10 to 60% from the viewpoint of suppressing damage of image strength due to alkali development.
  • Examples of the basic group which is a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles include a primary amino group, a secondary amino group, a tertiary amino group, and a hetero group including an N atom. There are a ring, an amide group, and the like, and a preferable one is a tertiary amino group from the viewpoint of good adsorption power to pigments such as titanium nitride-containing particles and high dispersibility of the pigments.
  • the polymer compound can have one or more of these basic groups.
  • the polymer compound may or may not contain a structural unit having a basic group, but when it is contained, the content of the structural unit having a basic group is calculated by mass conversion to the total mass of the polymer compound. On the other hand, it is preferably 0.01% or more and 50% or less, and more preferably 0.01% or more and 30% or less from the viewpoint of suppression of developability inhibition.
  • Examples of the coordinating group which is a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles, and the reactive functional group include acetylacetoxy group, trialkoxysilyl group, isocyanate group, and acid anhydride And acid chlorides.
  • Preferable one is an acetylacetoxy group in that the adsorbing power to the pigment such as titanium nitride-containing particles is good and the dispersibility of the pigment is high.
  • the polymer compound may have one or more of these groups.
  • the polymer compound may or may not contain a structural unit having a coordinating group or a structural unit having a reactive functional group, but when it is contained, the content of these structural units is: In terms of mass, it is preferably 10% or more and 80% or less, and more preferably 20% or more and 60% or less from the viewpoint of inhibition of developability inhibition with respect to the total mass of the polymer compound.
  • the polymer compound in the present invention has a functional group capable of interacting with a pigment such as titanium nitride-containing particles in addition to the graft chain, the pigments such as various titanium nitride-containing particles as described above, It is only necessary to contain functional groups capable of forming an interaction, and how these functional groups are introduced is not particularly limited, but the polymer compounds are represented by the following general formulas (iv) to (vi). It is preferable to have one or more structural units selected from structural units derived from the monomer represented by:
  • R 11 , R 12 , and R 13 each independently represent a hydrogen atom, a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.), or a carbon number Represents an alkyl group of 1 to 6 (for example, methyl group, ethyl group, propyl group, etc.).
  • R 11 , R 12 , and R 13 are preferably each independently a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably Each independently represents a hydrogen atom or a methyl group.
  • R 12 and R 13 are each particularly preferably a hydrogen atom.
  • X 1 in the general formula (iv) represents an oxygen atom (—O—) or an imino group (—NH—), and is preferably an oxygen atom.
  • Y in the general formula (v) represents a methine group or a nitrogen atom.
  • L 1 represents a single bond or a divalent linking group.
  • the divalent linking group include a divalent aliphatic group (for example, an alkylene group, a substituted alkylene group, an alkenylene group, a substituted alkenylene group, an alkynylene group, and a substituted alkynylene group), a divalent aromatic group (for example, , Arylene groups, and substituted arylene groups), divalent heterocyclic groups, oxygen atoms (—O—), sulfur atoms (—S—), imino groups (—NH—), substituted imino bonds (—NR 31 ′ —
  • R 31 ′ includes an aliphatic group, an aromatic group or a heterocyclic group), a carbonyl bond (—CO—), and combinations thereof.
  • the divalent aliphatic group may have a cyclic structure or a branched structure.
  • the aliphatic group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 10 carbon atoms.
  • the aliphatic group is preferably a saturated aliphatic group rather than an unsaturated aliphatic group.
  • the aliphatic group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, an aromatic group, and a heterocyclic group.
  • the number of carbon atoms of the divalent aromatic group is preferably 6 to 20, more preferably 6 to 15, and most preferably 6 to 10.
  • the aromatic group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, an aliphatic group, an aromatic group, and a heterocyclic group.
  • the divalent heterocyclic group preferably has a 5-membered or 6-membered ring as the heterocycle.
  • One or more heterocycles, aliphatic rings or aromatic rings may be condensed with the heterocycle.
  • the heterocyclic group may have a substituent. Examples of substituents include halogen atoms, hydroxy groups, oxo groups ( ⁇ O), thioxo groups ( ⁇ S), imino groups ( ⁇ NH), substituted imino groups ( ⁇ N—R 32 , where R 32 is a fatty acid Aromatic group, aromatic group or heterocyclic group), aliphatic group, aromatic group and heterocyclic group.
  • L 1 is preferably a single bond, an alkylene group or a divalent linking group containing an oxyalkylene structure.
  • the oxyalkylene structure is more preferably an oxyethylene structure or an oxypropylene structure.
  • L 1 may contain a polyoxyalkylene structure containing two or more oxyalkylene structures.
  • the polyoxyalkylene structure is preferably a polyoxyethylene structure or a polyoxypropylene structure.
  • the polyoxyethylene structure is represented by — (OCH 2 CH 2 ) n—, where n is preferably an integer of 2 or more, and more preferably an integer of 2 to 10.
  • Z 1 represents a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles in addition to the graft chain, and includes a carboxylic acid group and a tertiary group.
  • An amino group is preferred, and a carboxylic acid group is more preferred.
  • R 14 , R 15 , and R 16 are each independently a hydrogen atom, a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.), or an alkyl group having 1 to 6 carbon atoms. (e.g., methyl group, ethyl group, propyl group, etc.), - represents a Z 1 or L 1 -Z 1,. Wherein L 1 and Z 1 has the same meaning as L 1 and Z 1 in the above, are the preferable examples.
  • R 14 , R 15 and R 16 are each independently preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably a hydrogen atom.
  • R 11 , R 12 , and R 13 are each independently a hydrogen atom or a methyl group, and L 1 is an alkylene group or an oxyalkylene structure.
  • a compound in which X 1 is an oxygen atom or an imino group and Z 1 is a carboxylic acid group is preferable.
  • R 11 is a hydrogen atom or a methyl group
  • L 1 is an alkylene group
  • Z 1 is a carboxylic acid group
  • Y is methine. Compounds that are groups are preferred.
  • R 14 , R 15 , and R 16 are each independently a hydrogen atom or a methyl group, and L 1 is a single bond or an alkylene group, A compound in which Z is a carboxylic acid group is preferred.
  • monomers represented by general formula (iv) to general formula (vi).
  • monomers include methacrylic acid, crotonic acid, isocrotonic acid, a reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule (for example, 2-hydroxyethyl methacrylate) and succinic anhydride.
  • a reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule and a phthalic anhydride a reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule and a tetrahydroxyphthalic anhydride , A reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule and trimellitic anhydride, a reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule and pyromellitic anhydride, Acrylic acid, acrylic acid dimer, acrylic acid oligomer, maleic acid, itaconic acid, fumaric acid, 4-vinylbenzoic acid, vinylphenol, and - hydroxyphenyl methacrylamide.
  • the content of structural units having functional groups capable of interacting with pigments such as titanium nitride-containing particles, the interaction with pigments such as titanium nitride-containing particles, dispersion stability, and permeability to developer From this viewpoint, it is preferably 0.05% by mass to 90% by mass, more preferably 1.0% by mass to 80% by mass, and still more preferably 10% by mass to 70% by mass with respect to the total mass of the polymer compound.
  • the polymer compound is a structural unit having a graft chain, a hydrophobic structural unit, a titanium nitride-containing particle, etc., as long as the effects of the present invention are not impaired.
  • other structural unit having various functions for example, a structural unit having a functional group having affinity with the dispersion medium used in the dispersion
  • examples of such other structural units include structural units derived from radically polymerizable compounds selected from acrylonitriles, methacrylonitriles, and the like.
  • the polymer compound may use one or more of these other structural units, and the content thereof is preferably 0% or more and 80% or less in terms of mass with respect to the total mass of the polymer compound. Especially preferably, it is 10% or more and 60% or less. When the content is in the above range, sufficient pattern formability is maintained.
  • the acid value of the polymer compound is preferably in the range of 0 mgKOH / g to 160 mgKOH / g, more preferably in the range of 10 mgKOH / g to 140 mgKOH / g, and still more preferably in the range of 20 mgKOH / g to 120 mgKOH / g.
  • the range is as follows. When the acid value of the polymer compound is 160 mgKOH / g or less, pattern peeling during development when forming a cured film is more effectively suppressed. Moreover, if the acid value of a high molecular compound is 10 mgKOH / g or more, alkali developability will become more favorable.
  • the acid value of the polymer compound is 20 mgKOH / g or more, precipitation of pigments such as titanium nitride-containing particles can be further suppressed, the number of coarse particles can be reduced, and the stability of the composition over time can be reduced. It can be improved.
  • the acid value of the polymer compound can be calculated, for example, from the average content of acid groups in the polymer compound.
  • the resin which has a desired acid value can be obtained by changing content of the structural unit containing the acid group which is a structural component of a high molecular compound.
  • the weight average molecular weight of the polymer compound in the present invention is 4,000 as a polystyrene conversion value by a GPC (gel permeation chromatography) method from the viewpoint of pattern peeling inhibition during development and developability when forming a cured film. It is preferably 300 or more and 300 or less, more preferably 5,000 or more and 200,000 or less, further preferably 6,000 or more and 100,000 or less, and 10,000 or more and 50,000 or less. It is particularly preferred.
  • the GPC method uses HLC-8020GPC (manufactured by Tosoh Corporation), TSKgel SuperHZM-H, TSKgel SuperHZ4000, TSKgel SuperHZ2000 (manufactured by Tosoh Corporation, 4.6 mm ID ⁇ 15 cm) as columns and THF (tetrahydrofuran) as an eluent. ).
  • the polymer compound can be synthesized based on a known method, and examples of the solvent used when synthesizing the polymer compound include ethylene dichloride, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, propanol, butanol, and ethylene glycol monomethyl.
  • Ether ethylene glycol monoethyl ether, 2-methoxyethyl acetate, 1-methoxy-2-propanol, 1-methoxy-2-propyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, toluene,
  • Examples include ethyl acetate, methyl lactate, and ethyl lactate. These solvents may be used alone or in combination of two or more.
  • Acrybase FFS-6752, Acrybase FFS-187, Acrycure-RD-F8, and Cyclomer P can also be used.
  • Commercially available amphoteric resins include, for example, DISPERBYK-130, DISPERBYK-140, DISPERBYK-142, DISPERBYK-145, DISPERBYK-180, DISPERBYK-187, DISPERBYK-191, DISPERBYK-2001, DISPERB manufactured by BYK Chemie.
  • polymer compound As specific examples of the polymer compound, the polymer compounds described in paragraphs 0127 to 0129 of JP2013-249417A can be referred to, and the contents thereof are incorporated in the present specification.
  • graft copolymers described in JP-A 2010-106268, paragraphs 0037 to 0115 corresponding to paragraphs 0075 to 0133 in US2011 / 0124824.
  • it has a side chain structure in which acidic groups in paragraphs 0028 to 0084 (corresponding to columns 0075 to 0133 of US 2011/0279759) of JP 2011-153283 A are bonded via a linking group.
  • Polymeric compounds containing constituents can be used, the contents of which can be incorporated and incorporated herein.
  • the content of the dispersant is preferably from 0.1 to 50% by mass, more preferably from 0.5 to 30% by mass, based on the total solid content of the composition.
  • a dispersing agent may be used individually by 1 type, and may be used together 2 or more types. When using 2 or more types together, it is preferable that a total amount becomes the said range.
  • the composition of the present invention preferably contains a binder resin.
  • a binder resin a linear organic polymer is preferably used.
  • a linear organic polymer a well-known thing can be used arbitrarily.
  • a linear organic polymer that is soluble or swellable in water or weak alkaline water is selected in order to enable water development or weak alkaline water development.
  • an alkali-soluble resin a resin having a group that promotes alkali-solubility
  • the binder resin is a linear organic polymer that promotes at least one alkali solubility in a molecule (preferably a molecule having a (meth) acrylic copolymer or a styrene copolymer as the main chain). It can be suitably selected from alkali-soluble resins having a group to be used.
  • polyhydroxystyrene resins, polysiloxane resins, (meth) acrylic resins, (meth) acrylamide resins, (meth) acrylic / (meth) acrylamide copolymer resins are preferred, and developability From the viewpoint of control, (meth) acrylic resins, (meth) acrylamide resins, and (meth) acryl / (meth) acrylamide copolymer resins are preferred.
  • the group that promotes alkali solubility hereinafter also referred to as an acid group
  • examples of the group that promotes alkali solubility include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group.
  • an alkali-soluble resin having a structural unit derived from (meth) acrylic acid is more preferable.
  • These acid groups may be used alone or in combination of two or more.
  • binder resin examples include radical polymers having a carboxylic acid group in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, JP-B-54-25957, Those described in Kaikai 54-92723, JP-A-59-53836, and JP-A-59-71048, ie, resins or acid anhydrides obtained by homopolymerizing or copolymerizing monomers having a carboxyl group Resins in which an acid anhydride unit is hydrolyzed, half-esterified or half-amidated by homopolymerizing a monomer having a monomer, and epoxy acrylate obtained by modifying an epoxy resin with an unsaturated monocarboxylic acid and an acid anhydride Can be mentioned.
  • radical polymers having a carboxylic acid group in the side chain such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, JP-
  • Examples of monomers having a carboxyl group include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, and 4-carboxyl styrene.
  • Examples of monomers having an acid anhydride include And maleic anhydride.
  • an acidic cellulose derivative having a carboxylic acid group in the side chain is also exemplified.
  • a polymer obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group is useful.
  • 2001-318463 has film strength and developability. It is excellent in balance and is suitable.
  • polyvinyl pyrrolidone, polyethylene oxide, and the like are useful as the water-soluble linear organic polymer.
  • alcohol-soluble nylon and polyether which is a reaction product of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin are also useful.
  • a known radical polymerization method can be applied for the production of the binder resin.
  • Those skilled in the art can easily set polymerization conditions such as temperature, pressure, the type and amount of the radical initiator, and the type of the solvent when producing the alkali-soluble resin by the radical polymerization method.
  • a polymer having a structural unit having a graft chain and a structural unit having an acid group (alkali-soluble group) as the binder resin.
  • the definition of the structural unit which has a graft chain is synonymous with the structural unit which has the graft chain which the dispersing agent mentioned above has, and its suitable range is also the same.
  • the acid group include a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, or a phenolic hydroxyl group.
  • the acid group is at least one of a carboxylic acid group, a sulfonic acid group, and a phosphoric acid group. More preferred is a carboxylic acid group.
  • the structural unit having an acid group preferably has one or more structural units selected from structural units derived from monomers represented by the following general formulas (vii) to (ix).
  • R 21 , R 22 , and R 23 are each independently a hydrogen atom, a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.), or a carbon number Represents an alkyl group of 1 to 6 (for example, methyl group, ethyl group, propyl group, etc.).
  • R 21 , R 22 and R 23 are preferably each independently a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably Each independently represents a hydrogen atom or a methyl group.
  • R 21 and R 23 are each particularly preferably a hydrogen atom.
  • X 2 in the general formula (vii) represents an oxygen atom (—O—) or an imino group (—NH—), and is preferably an oxygen atom.
  • Y in the general formula (viii) represents a methine group or a nitrogen atom.
  • L 2 represents a single bond or a divalent linking group.
  • the divalent linking group include a divalent aliphatic group (for example, an alkylene group, a substituted alkylene group, an alkenylene group, a substituted alkenylene group, an alkynylene group, and a substituted alkynylene group), a divalent aromatic group (for example, , Arylene groups, and substituted arylene groups), divalent heterocyclic groups, oxygen atoms (—O—), sulfur atoms (—S—), imino groups (—NH—), substituted imino bonds (—NR 41 ′ —
  • R 41 ′ includes an aliphatic group, an aromatic group or a heterocyclic group), a carbonyl bond (—CO—), and combinations thereof.
  • the divalent aliphatic group may have a cyclic structure or a branched structure.
  • the aliphatic group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 10 carbon atoms.
  • the aliphatic group is preferably a saturated aliphatic group rather than an unsaturated aliphatic group.
  • the aliphatic group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, an aromatic group, and a heterocyclic group.
  • the carbon number of the divalent aromatic group is preferably 6 to 20, more preferably 6 to 15, and still more preferably 6 to 10.
  • the aromatic group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, an aliphatic group, an aromatic group, and a heterocyclic group.
  • the divalent heterocyclic group preferably has a 5-membered or 6-membered ring as the heterocycle.
  • One or more heterocycles, aliphatic rings or aromatic rings may be condensed with the heterocycle.
  • the heterocyclic group may have a substituent. Examples of substituents include halogen atoms, hydroxy groups, oxo groups ( ⁇ O), thioxo groups ( ⁇ S), imino groups ( ⁇ NH), substituted imino groups ( ⁇ N—R 42 , where R 42 represents a fatty acid Aromatic group, aromatic group or heterocyclic group), aliphatic group, aromatic group and heterocyclic group.
  • L 2 is preferably a single bond, an alkylene group or a divalent linking group containing an oxyalkylene structure.
  • the oxyalkylene structure is more preferably an oxyethylene structure or an oxypropylene structure.
  • L 2 may contain a polyoxyalkylene structure containing two or more oxyalkylene structures.
  • the polyoxyalkylene structure is preferably a polyoxyethylene structure or a polyoxypropylene structure.
  • the polyoxyethylene structure is represented by — (OCH 2 CH 2 ) n—, where n is preferably an integer of 2 or more, and more preferably an integer of 2 to 10.
  • Z 2 is an acid group, preferably a carboxylic acid group.
  • R 24 , R 25 , and R 26 are each independently a hydrogen atom, a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.), or an alkyl group having 1 to 6 carbon atoms. (e.g., methyl group, ethyl group, propyl group, etc.), - represents a Z 2 or L 2 -Z 2,.
  • L 2 and Z 2 has the same meaning as L 2 and Z 2 in the above, and preferred examples are also the same.
  • R 24 , R 25 , and R 26 are each independently preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and more preferably a hydrogen atom.
  • R 21 , R 22 , and R 23 are each independently a hydrogen atom or a methyl group, and L 2 is an alkylene group or an oxyalkylene structure.
  • a compound in which X 2 is an oxygen atom or an imino group and Z 2 is a carboxylic acid group is preferable.
  • R 21 is a hydrogen atom or a methyl group
  • L 2 is an alkylene group
  • Z 2 is a carboxylic acid group
  • Y is methine.
  • Compounds that are groups are preferred.
  • a compound in which R 24 , R 25 , and R 26 are each independently a hydrogen atom or a methyl group and Z 2 is a carboxylic acid group is preferable.
  • the binder resin can be synthesized by the same method as the dispersant having a structural unit having a graft chain described above, and the preferred acid value and weight average molecular weight are the same.
  • the binder resin may have one or more structural units having an acid group.
  • the content of the structural unit having an acid group is preferably 5 to 95%, in terms of mass, with respect to the total mass of the binder resin, and more preferably from the viewpoint of suppressing damage to the image strength due to alkali development. 10 to 90%.
  • the content of the binder resin in the composition of the present invention is preferably 0.1 to 30% by mass and more preferably 0.3 to 25% by mass with respect to the total solid content of the composition.
  • Binder resin may be used individually by 1 type, and may be used together 2 or more types. When using 2 or more types together, it is preferable that a total amount becomes the said range.
  • the content ratio of the dispersant to the titanium nitride-containing particles is 0.3 or less. Is preferable, 0.05 to 0.3 is more preferable, and 0.1 to 0.3 is more preferable.
  • D / P is in the above range, the performance reproducibility of the dispersion is excellent, and the patterning property (resolution) of the cured film is also excellent.
  • the composition of the present invention preferably contains a polymerizable compound.
  • the polymerizable compound is preferably a compound having one or more groups having an ethylenically unsaturated bond, more preferably a compound having 2 or more, further preferably 3 or more, and particularly preferably 5 or more.
  • the upper limit is 15 or less, for example.
  • Examples of the group having an ethylenically unsaturated bond include a vinyl group, a (meth) allyl group, and a (meth) acryloyl group.
  • the polymerizable compound may be in any of chemical forms such as a monomer, a prepolymer, an oligomer, a mixture thereof, and a multimer thereof, and is preferably a monomer.
  • the molecular weight of the polymerizable compound is preferably 100 to 3000, and more preferably 250 to 1500.
  • the polymerizable compound is preferably a 3 to 15 functional (meth) acrylate compound, more preferably a 3 to 6 functional (meth) acrylate compound.
  • monomers and prepolymers include unsaturated carboxylic acids (eg, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters, amides, and multimers thereof.
  • esters of unsaturated carboxylic acids and aliphatic polyhydric alcohol compounds are esters of unsaturated carboxylic acids and aliphatic polyhydric alcohol compounds, amides of unsaturated carboxylic acids and aliphatic polyvalent amine compounds, and multimers thereof.
  • a dehydration condensation reaction product of an ester or amide and a monofunctional or polyfunctional carboxylic acid is also preferably used.
  • reaction products of unsaturated carboxylic acid esters or amides having electrophilic substituents such as isocyanate groups and epoxy groups with monofunctional or polyfunctional alcohols, amines, thiols, halogen groups, tosyloxy groups
  • a reaction product of an unsaturated carboxylic acid ester or amide having a leaving substituent such as monofunctional or polyfunctional alcohols, amines or thiols is also suitable.
  • the compounds described in paragraphs [0095] to [0108] of JP-A-2009-288705 can also be suitably used in the present invention.
  • the polymerizable compound is also preferably a compound having at least one group having an ethylenically unsaturated bond and having a boiling point of 100 ° C. or higher under normal pressure.
  • the compounds described in paragraph 0227 of JP2013-29760A and paragraphs 0254 to 0257 of JP2008-292970A can be referred to, the contents of which are incorporated herein.
  • the polymerizable compounds are dipentaerythritol triacrylate (KAYARAD D-330 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (KAYARAD D-320 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.).
  • Dipentaerythritol penta (meth) acrylate (as a commercial product, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (as a commercial product, manufactured as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.) A-DPH-12E (manufactured by Shin-Nakamura Chemical Co., Ltd.), and structures in which these (meth) acryloyl groups are mediated by ethylene glycol or propylene glycol residues (eg, commercially available from Sartomer, SR454, SR499) ) Is preferred.
  • oligomer types can also be used.
  • NK ester A-TMMT penentaerythritol tetraacrylate, manufactured by Shin-Nakamura Chemical Co., Ltd.
  • KAYARAD RP-1040 manufactured by Nippon Kayaku Co., Ltd.
  • Preferred embodiments of the polymerizable compound are shown below.
  • the polymerizable compound may have an acid group such as a carboxyl group, a sulfonic acid group, and a phosphoric acid group.
  • an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid is preferable, and a non-aromatic carboxylic acid anhydride is reacted with an unreacted hydroxyl group of the aliphatic polyhydroxy compound.
  • a polymerizable compound having a group is more preferable, and in this ester, the aliphatic polyhydroxy compound is pentaerythritol and / or dipentaerythritol. Examples of commercially available products include Aronix TO-2349, M-305, M-510, and M-520 manufactured by Toagosei Co., Ltd.
  • the preferred acid value of the polymerizable compound having an acid group is 0.1 to 40 mgKOH / g, more preferably 5 to 30 mgKOH / g. If the acid value of the polymerizable compound is 0.1 mgKOH / g or more, the development and dissolution characteristics are good, and if it is 40 mgKOH / g or less, it is advantageous in production and handling. Furthermore, the photopolymerization performance is good and the curability is excellent.
  • the polymerizable compound is also preferably a compound having a caprolactone structure.
  • the compound having a caprolactone structure is not particularly limited as long as it has a caprolactone structure in the molecule.
  • compounds having a caprolactone structure represented by the following general formula (Z-1) are preferred.
  • R 1 represents a hydrogen atom or a methyl group
  • m represents a number of 1 or 2
  • “*” represents a bond
  • R 1 represents a hydrogen atom or a methyl group
  • “*” represents a bond
  • polymerizable compound a compound represented by the following general formula (Z-4) or (Z-5) can also be used.
  • each E independently represents — ((CH 2 ) y CH 2 O) — or — ((CH 2 ) y CH (CH 3 ) O).
  • Each independently represents an integer of 0 to 10
  • each X independently represents a (meth) acryloyl group, a hydrogen atom, or a carboxyl group.
  • the total number of (meth) acryloyl groups is 3 or 4
  • each m independently represents an integer of 0 to 10
  • the total of each m is an integer of 0 to 40 .
  • the total number of (meth) acryloyl groups is 5 or 6
  • each n independently represents an integer of 0 to 10
  • the total of each n is an integer of 0 to 60 .
  • m is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
  • the total of each m is preferably an integer of 2 to 40, more preferably an integer of 2 to 16, and further preferably an integer of 4 to 8.
  • n is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
  • the total of each n is preferably an integer of 3 to 60, more preferably an integer of 3 to 24, and even more preferably an integer of 6 to 12.
  • — ((CH 2 ) y CH 2 O) — or — ((CH 2 ) y CH (CH 3 ) O) — in general formula (Z-4) or general formula (Z-5) is oxygen A form in which the end on the atom side is bonded to X is preferred.
  • the compounds represented by formula (Z-4) or formula (Z-5) may be used alone or in combination of two or more.
  • a form in which all six Xs are acryloyl groups in the general formula (Z-5), a compound in which all six Xs are acryloyl groups, Among these, an embodiment in which at least one is a mixture with a compound having a hydrogen atom is preferable. With such a configuration, the developability can be further improved.
  • the total content of the compound represented by the general formula (Z-4) or the general formula (Z-5) in the polymerizable compound is preferably 20% by mass or more, and more preferably 50% by mass or more.
  • the compound represented by the general formula (Z-4) or (Z-5) is a ring-opening addition of ethylene oxide or propylene oxide to pentaerythritol or dipentaerythritol, which is a conventionally known process. It can be synthesized from a step of bonding a ring-opening skeleton by reaction and a step of introducing a (meth) acryloyl group by reacting, for example, (meth) acryloyl chloride with a terminal hydroxyl group of the ring-opening skeleton. Each step is a well-known step, and a person skilled in the art can easily synthesize a compound represented by the general formula (Z-4) or (Z-5).
  • pentaerythritol derivatives and / or dipentaerythritol derivatives are more preferable.
  • Specific examples include compounds represented by the following formulas (a) to (f), and among them, exemplary compounds (a), (b), (e), and (f) are preferable.
  • Examples of commercially available polymerizable compounds represented by the general formulas (Z-4) and (Z-5) include SR-494, a tetrafunctional acrylate having four ethyleneoxy chains manufactured by Sartomer, Nippon Kayaku Examples thereof include DPCA-60, which is a hexafunctional acrylate having six pentyleneoxy chains, and TPA-330, which is a trifunctional acrylate having three isobutyleneoxy chains.
  • Examples of the polymerizable compound include urethane acrylates as described in JP-B-48-41708, JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765.
  • Urethane compounds having an ethylene oxide skeleton described in JP-B-58-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418 are also suitable. is there.
  • addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238 are disclosed.
  • urethane oligomers UAS-10, UAB-140 (manufactured by Sanyo Kokusaku Pulp Co., Ltd.), UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA- 306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha) and the like.
  • the polymerizable compound used in the present invention has an SP (solubility parameter) value of preferably 9.50 or more, more preferably 10.40 or more, and even more preferably 10.60 or more.
  • SP value is determined by the Hoy method unless otherwise specified (HL Hoy Journal of Paining, 1970, Vol. 42, 76-118). The SP value is shown with the unit omitted, but the unit is cal 1/2 cm ⁇ 3/2 .
  • the composition also preferably has a polymerizable compound having a cardo skeleton from the viewpoint of reducing development residue.
  • a polymerizable compound having a cardo skeleton a polymerizable compound having a 9,9-bisarylfluorene skeleton is preferable, and a compound represented by the following formula (Q3) is more preferable.
  • Ar 11 to Ar 14 each independently represents an aryl group containing a benzene ring surrounded by a broken line.
  • X 1 to X 4 each independently represents a substituent having a polymerizable group, and the carbon atom in the substituent may be substituted with a hetero atom.
  • a and b each independently represents an integer of 1 to 5, and c and d each independently represents an integer of 0 to 4.
  • R 1 to R 4 each independently represents a substituent, e, f, g and h each independently represent an integer of 0 or more, and the upper limit values of e, f, g and h are Ar 11 to Ar 14 respectively.
  • X 1 to X 4 and R 1 to R 4 are each It may be independently substituted with a benzene ring surrounded by a broken line, or may be substituted with a ring other than the benzene ring surrounded by a broken line.
  • the aryl group containing a benzene ring surrounded by a broken line represented by Ar 11 to Ar 14 is preferably an aryl group having 6 to 14 carbon atoms, and an aryl group having 6 to 10 carbon atoms (For example, a phenyl group or a naphthyl group) is more preferable, and a phenyl group (only a benzene ring surrounded by a broken line) is further preferable.
  • X 1 to X 4 each independently represents a substituent having a polymerizable group, and the carbon atom in the substituent may be substituted with a hetero atom.
  • the substituent having a polymerizable group represented by X 1 to X 4 is not particularly limited, but is preferably an aliphatic group having a polymerizable group.
  • the aliphatic group having a polymerizable group represented by X 1 to X 4 is not particularly limited, but is preferably an alkylene group having 1 to 12 carbon atoms other than the polymerizable group, and having 2 to 10 carbon atoms. An alkylene group is more preferable, and an alkylene group having 2 to 5 carbon atoms is more preferable.
  • aliphatic group having a polymerizable group represented by X 1 to X 4 when the aliphatic group is substituted with a hetero atom, —NR— (R is a substituent), an oxygen atom, or a sulfur atom
  • R is a substituent
  • the non-adjacent —CH 2 — in the aliphatic group is preferably substituted with an oxygen atom or a sulfur atom, and the non-adjacent —CH 2 in the aliphatic group is preferred. More preferably,-is substituted with an oxygen atom.
  • the aliphatic group having a polymerizable group represented by X 1 to X 4 is preferably substituted at one or two sites by a hetero atom, more preferably substituted at one site by a hetero atom, Ar 11 to Ar More preferably, one position adjacent to the aryl group containing a benzene ring surrounded by a broken line represented by 14 is substituted with a heteroatom.
  • a polymerizable group capable of radical polymerization or cationic polymerization hereinafter, also referred to as a radical polymerizable group and a cationic polymerizable group, respectively
  • radical polymerizable group a generally known radical polymerizable group can be used, and a polymerizable group having an ethylenically unsaturated bond capable of radical polymerization can be mentioned as a preferred one.
  • examples thereof include a vinyl group and a (meth) acryloyloxy group.
  • a (meth) acryloyloxy group is preferable, and an acryloyloxy group is more preferable.
  • cationic polymerizable group a generally known cationic polymerizable group can be used.
  • an alicyclic ether group, a cyclic acetal group, a cyclic lactone group, a cyclic thioether group, a spiro orthoester group, And a vinyloxy group etc. can be mentioned.
  • an alicyclic ether group or a vinyloxy group is preferable, and an epoxy group, an oxetanyl group, or a vinyloxy group is particularly preferable.
  • the polymerizable group contained in the substituent contained in Ar 1 to Ar 4 is preferably a radical polymerizable group.
  • Two or more of Ar 1 ⁇ Ar 4 includes a substituent having a polymerizable group, preferably contains a substituent 2-4 of Ar 1 ⁇ Ar 4 has a polymerizable group, Ar 1 ⁇ Ar More preferably, 2 or 3 out of 4 contain a substituent having a polymerizable group, and more preferably 2 out of Ar 1 to Ar 4 contain a substituent having a polymerizable group.
  • X 1 to X 4 are each independently benzene surrounded by a broken line Even if it is substituted with a ring, it may be substituted with a ring other than the benzene ring surrounded by a broken line.
  • a and b each independently represent an integer of 1 to 5, preferably 1 or 2, and more preferably a and b are all 1.
  • c and d each independently represents an integer of 0 to 5, preferably 0 or 1, and more preferably c and d are both 0.
  • R 1 to R 4 each independently represents a substituent.
  • the substituent represented by R 1 to R 4 is not particularly limited, and examples thereof include halogen atoms, halogenated alkyl groups, alkyl groups, alkenyl groups, acyl groups, hydroxyl groups, hydroxyalkyl groups, alkoxy groups, aryl groups, hetero groups An aryl group, an alicyclic group, etc. can be mentioned.
  • the substituent represented by R 1 to R 4 is preferably an alkyl group, an alkoxy group or an aryl group, more preferably an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms or a phenyl group.
  • R 1 to R 4 are each It may be independently substituted with a benzene ring surrounded by a broken line, or may be substituted with a ring other than the benzene ring surrounded by a broken line.
  • e, f, g, and h each independently represent an integer of 0 or more, and the upper limit values of e, f, g, and h can each be a substituent that Ar 11 to Ar 14 can have.
  • the value obtained by subtracting a, b, c, or d from the number of. e, f, g and h are each independently preferably 0 to 8, more preferably 0 to 2, and still more preferably 0.
  • Ar 11 to Ar 14 are each independently a polycyclic aromatic hydrocarbon group containing a benzene ring surrounded by a broken line as one of the condensed rings, e, f, g and h are preferably 0 or 1 , 0 is more preferable.
  • Examples of the compound represented by the formula (Q3) include 9,9-bis [4- (2-acryloyloxyethoxy) phenyl] fluorene.
  • Examples of the polymerizable compound having a 9,9-bisarylfluorene skeleton compounds described in JP 2010-254732 A can also be suitably used.
  • the content of the polymerizable compound is preferably 0.1 to 40% by mass with respect to the total solid content of the composition.
  • the lower limit is more preferably 0.5% by mass or more, and further preferably 1% by mass or more.
  • the upper limit is more preferably 30% by mass or less, and further preferably 20% by mass or less.
  • One type of polymerizable compound may be used alone, or two or more types may be used in combination. When using 2 or more types together, it is preferable that a total amount becomes the said range.
  • the composition of the present invention preferably contains a polymerization initiator.
  • a polymerization initiator There is no restriction
  • the composition of the present invention contains a photopolymerization initiator and the above-described polymerizable compound in addition to the titanium nitride-containing particles, the composition is cured by irradiation with actinic rays or radiation. Sometimes called.
  • the photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of a polymerizable compound, and can be appropriately selected from known photopolymerization initiators. For example, those having photosensitivity to visible light from the ultraviolet region are preferable. Further, it may be an activator that generates some action with a photoexcited sensitizer and generates an active radical, or may be an initiator that initiates cationic polymerization according to the type of monomer.
  • the photopolymerization initiator preferably contains at least one compound having a molar extinction coefficient of at least about 50 within a range of about 300 nm to 800 nm (more preferably 330 nm to 500 nm).
  • the photopolymerization initiator examples include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.), acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime derivatives. Oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, hydroxyacetophenones, and the like.
  • the halogenated hydrocarbon compound having a triazine skeleton examples include those described in Wakabayashi et al., Bull. Chem. Soc.
  • trihalomethyltriazine compounds trihalomethyltriazine compounds, benzyldimethylketal compounds, ⁇ -hydroxyketone compounds, ⁇ -aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triallylimidazole dimers, oniums
  • a compound selected from the group consisting of a compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound and a derivative thereof, a cyclopentadiene-benzene-iron complex and a salt thereof, a halomethyloxadiazole compound, and a 3-aryl-substituted coumarin compound preferable.
  • trihalomethyltriazine compound More preferred are trihalomethyltriazine compound, ⁇ -aminoketone compound, acylphosphine compound, phosphine oxide compound, oxime compound, triallylimidazole dimer, onium compound, benzophenone compound, acetophenone compound, trihalomethyltriazine compound, ⁇ -aminoketone
  • composition of the present invention when used for the production of a light-shielding film of a solid-state imaging device, it is necessary to form a fine pattern with a sharp shape, so that development is possible with no residue in the unexposed area. It is important that From such a viewpoint, it is particularly preferable to use an oxime compound as the photopolymerization initiator.
  • an oxime compound as the photopolymerization initiator.
  • stepper exposure is used for curing exposure, but this exposure machine may be damaged by halogen, and the amount of photopolymerization initiator added must be kept low.
  • an oxime compound as a photopolymerization initiator for forming a fine pattern such as a solid-state imaging device. Further, the use of an oxime compound can improve the color transfer.
  • the photopolymerization initiator for example, paragraphs 0265 to 0268 of JP2013-29760A can be referred to, and the contents thereof are incorporated in the present specification.
  • hydroxyacetophenone compounds As the photopolymerization initiator, hydroxyacetophenone compounds, aminoacetophenone compounds, and acylphosphine compounds can also be suitably used. More specifically, for example, an aminoacetophenone initiator described in JP-A-10-291969 and an acylphosphine initiator described in Japanese Patent No. 4225898 can also be used.
  • hydroxyacetophenone initiator IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (trade names: all manufactured by BASF) can be used.
  • aminoacetophenone-based initiator commercially available products IRGACURE-907, IRGACURE-369, and IRGACURE-379EG (trade names: all manufactured by BASF) can be used.
  • aminoacetophenone-based initiator a compound described in JP-A-2009-191179 in which an absorption wavelength is matched with a long wave light source such as 365 nm or 405 nm can also be used.
  • acylphosphine-based initiator commercially available products IRGACURE-819 and DAROCUR-TPO (trade names: both manufactured by BASF) can be used.
  • the photopolymerization initiator include oxime compounds.
  • an oxime initiator is preferable because it has high sensitivity and high polymerization efficiency, can be cured regardless of the color material concentration, and can be easily designed with a high color material concentration.
  • the oxime compound a compound described in JP-A-2001-233842, a compound described in JP-A-2000-80068, and a compound described in JP-A-2006-342166 can be used.
  • Examples of the oxime compound that can be suitably used in the present invention include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3- (4-toluenesulfonyloxy) iminobutane Examples include -2-one and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one.
  • J.H. C. S. Perkin II (1979) pp. 1653-1660) J.M.
  • TR-PBG-304 manufactured by Changzhou Powerful Electronic New Materials Co., Ltd.
  • Adeka Arkles NCI-831 and Adeka Arkles NCI-930 made by ADEKA
  • N-1919 manufactured by ADEKA
  • oxime compounds other than those described above compounds described in JP-A-2009-519904 in which an oxime is linked to the carbazole N-position, compounds described in US Pat. No. 7,626,957 in which a hetero substituent is introduced into the benzophenone moiety, Compounds described in Japanese Patent Application Laid-Open No. 2010-15025 and US Patent Publication No. 2009-292039 in which a nitro group is introduced at the dye moiety, ketoxime compounds described in International Patent Publication No. 2009-131189, the triazine skeleton and the oxime skeleton are the same molecule The compounds described in US Pat. No.
  • the oxime compound is preferably a compound represented by the following formula (OX-1).
  • the oxime N—O bond may be an (E) oxime compound, a (Z) oxime compound, or a mixture of (E) and (Z) isomers. .
  • R and B each independently represent a monovalent substituent
  • A represents a divalent organic group
  • Ar represents an aryl group.
  • the monovalent substituent represented by R is preferably a monovalent nonmetallic atomic group.
  • the monovalent nonmetallic atomic group include an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic group, an alkylthiocarbonyl group, and an arylthiocarbonyl group.
  • these groups may have one or more substituents.
  • the substituent mentioned above may be further substituted by another substituent.
  • the substituent examples include a halogen atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, an acyloxy group, an acyl group, an alkyl group, and an aryl group.
  • the monovalent substituent represented by B is preferably an aryl group, a heterocyclic group, an arylcarbonyl group, or a heterocyclic carbonyl group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents.
  • the divalent organic group represented by A is preferably an alkylene group having 1 to 12 carbon atoms, a cycloalkylene group, or an alkynylene group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents.
  • an oxime compound having a fluorine atom can also be used as a photopolymerization initiator.
  • Specific examples of the oxime compound having a fluorine atom include compounds described in JP 2010-262028 A, compounds 24 and 36 to 40 described in JP-A-2014-500852, and JP-A 2013-164471. Examples thereof include compound (C-3). This content is incorporated herein.
  • a compound represented by the following general formula (1) or (2) can also be used as a photopolymerization initiator.
  • R 1 and R 2 are each independently an alkyl group having 1 to 20 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or When R 1 and R 2 are phenyl groups, the phenyl groups may be bonded to each other to form a fluorene group, and R 3 and R 4 are each independently Represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a heterocyclic group having 4 to 20 carbon atoms, and X is a single bond or carbonyl group Indicates a group.
  • R 1, R 2, R 3 and R 4 have the same meanings as R 1, R 2, R 3 and R 4 in the formula (1)
  • R 5 is -R 6, -OR 6 , —SR 6 , —COR 6 , —CONR 6 R 6 , —NR 6 COR 6 , —OCOR 6 , —COOR 6 , —SCOR 6 , —OCSR 6 , —COSR 6 , —CSOR 6 , —CN
  • halogen R 6 represents an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a heterocyclic group having 4 to 20 carbon atoms
  • X represents a single bond or a carbonyl group, and a represents an integer of 0 to 4.
  • R 1 and R 2 are preferably each independently a methyl group, ethyl group, n-propyl group, isopropyl, cyclohexyl group or phenyl group.
  • R 3 is preferably a methyl group, an ethyl group, a phenyl group, a tolyl group or a xylyl group.
  • R 4 is preferably an alkyl group having 1 to 6 carbon atoms or a phenyl group.
  • R 5 is preferably a methyl group, an ethyl group, a phenyl group, a tolyl group or a naphthyl group.
  • X is preferably a single bond.
  • Specific examples of the compounds represented by formula (1) and formula (2) include, for example, compounds described in paragraph numbers 0076 to 0079 of JP-A No. 2014-137466. This content is incorporated herein.
  • oxime compounds that are preferably used in the present invention are shown below, but the present invention is not limited thereto.
  • an oxime compound having a benzofuran skeleton can also be used as a photopolymerization initiator.
  • Specific examples include OE-01 to OE-75 described in WO2015 / 036910.
  • polymerization initiators are not particularly limited, but IRGACURE OXE 01 (1.2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime) manufactured by BASF Japan Ltd.
  • IRGACURE OXE 02 ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (O-acetyloxime)), 2- (acetyl Oxyiminomethyl) thioxanthen-9-one, O-acyloxime compounds (for example, Adekaoptomer N-1919, Adeka Arcles NCI-831, manufactured by ADEKA), Adeka Arcles NCI-930, IRGACURE-OXE03, IRGACURE -OXE04 etc. are mentioned, and these contents are It is incorporated in the book.
  • the oxime compound preferably has a maximum absorption wavelength in the wavelength region of 350 nm to 500 nm, more preferably has a maximum absorption wavelength in the wavelength region of 360 nm to 480 nm, and particularly preferably has a high absorbance at 365 nm and 405 nm.
  • the molar extinction coefficient at 365 nm or 405 nm of the oxime compound is preferably from 1,000 to 300,000, more preferably from 2,000 to 300,000, more preferably from 5,000 to 200, from the viewpoint of sensitivity. More preferably, it is 1,000.
  • a known method can be used for the molar extinction coefficient of the compound.
  • an ethyl acetate solvent is used at a concentration of 0.01 g / L. It is preferable to measure. You may use the photoinitiator used for this invention in combination of 2 or more type as needed.
  • the content of the polymerization initiator is preferably 0.1 to 30% by mass relative to the total solid content in the composition, and is preferably 1 to 25% by mass. %, More preferably 1 to 10% by mass.
  • the composition of the present invention may contain only one kind of polymerization initiator, or may contain two or more kinds. When two or more types are included, the total amount is preferably within the above range.
  • the composition of the present invention preferably contains a solvent, and more preferably contains an organic solvent.
  • organic solvents include, for example, acetone, methyl ethyl ketone, cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether.
  • the composition of the present invention may contain one kind of organic solvent or two or more kinds of organic solvents, but the titanium nitride-containing particles of the composition of the present invention may be prepared during the preparation of the composition of the present invention. It is preferable to contain two or more kinds of organic solvents from the viewpoint that the particle size fluctuation can be suppressed.
  • the content of the organic solvent is preferably 10 to 90% by mass and more preferably 60 to 90% by mass with respect to the total mass of the composition. preferable.
  • the total amount is preferably within the above range.
  • the composition of the present invention may contain water. Water may be intentionally added, or may be inevitably contained in the composition by adding each component contained in the composition of the present invention.
  • the water content is preferably 0.1 to 1% by mass, more preferably 0.1 to 0.8% by mass, and more preferably 0.1 to 0.4% by mass with respect to the total mass of the composition. More preferably, it is mass%.
  • the patterning property (resolution) when a cured film is produced is excellent, and the corrosion resistance of the electrode material is also excellent.
  • the amount of particles in the composition can be further reduced, and the viscosity aging stability of the composition is also excellent. .
  • silane coupling agent is a compound having a hydrolyzable group and other functional groups in the molecule.
  • a hydrolyzable group such as an alkoxy group is bonded to a silicon atom.
  • the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can form a siloxane bond by a hydrolysis reaction and / or a condensation reaction.
  • Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group, and an alkenyloxy group.
  • the hydrolyzable group has a carbon atom, the number of carbon atoms is preferably 6 or less, and more preferably 4 or less.
  • the silane coupling agent preferably does not contain a fluorine atom and a silicon atom (excluding a silicon atom to which a hydrolyzable group is bonded). Includes silicon atoms (excluding silicon atoms to which hydrolyzable groups are bonded), alkylene groups substituted with silicon atoms, straight chain alkyl groups having 8 or more carbon atoms, and branched alkyl groups having 3 or more carbon atoms Desirably not.
  • the silane coupling agent preferably has a group represented by the following formula (Z). * Represents a bonding position.
  • R Z1 represents a hydrolyzable group, and the definition thereof is as described above.
  • the silane coupling agent preferably has one or more curable functional groups selected from the group consisting of a (meth) acryloyloxy group, an epoxy group, and an oxetanyl group.
  • the curable functional group may be directly bonded to the silicon atom, or may be bonded to the silicon atom via a linking group.
  • a radically polymerizable group is also mentioned as a suitable aspect of the curable functional group contained in the said silane coupling agent.
  • the molecular weight of the silane coupling agent is not particularly limited, and is often 100 to 1000 from the viewpoint of handleability, and is preferably 270 or more and more preferably 270 to 1000 from the viewpoint that the effect of the present invention is more excellent.
  • silane coupling agent X represented by the formula (W).
  • R z1 represents a hydrolyzable group, and the definition is as described above.
  • R z2 represents a curable functional group, the definition is as described above, and the preferred range is also as described above.
  • Lz represents a single bond or a divalent linking group.
  • examples of the divalent linking group include an alkylene group which may be substituted with a halogen atom, an arylene group which may be substituted with a halogen atom, —NR 12 —, —CONR 12 -, - CO -, - CO 2 -, SO 2 NR 12 -, - O -, - S -, - SO 2 -, and combinations thereof.
  • a group consisting of a combination with one kind of group is preferable, an alkylene group which may be substituted by a halogen atom having 2 to 10 carbon atoms, —CO 2 —, —O—, —CO—, —CONR 12 —, or A group consisting of a combination of these groups is more preferred.
  • R 12 represents a hydrogen atom or a methyl group.
  • N- ⁇ -aminoethyl- ⁇ -aminopropyl-methyldimethoxysilane (trade name KBM-602 manufactured by Shin-Etsu Chemical Co., Ltd.), N- ⁇ -aminoethyl- ⁇ -aminopropyl-trimethoxy Silane (trade name KBM-603 manufactured by Shin-Etsu Chemical Co., Ltd.), N- ⁇ -aminoethyl- ⁇ -aminopropyl-triethoxysilane (trade name KBE-602 manufactured by Shin-Etsu Chemical Co., Ltd.), ⁇ -aminopropyl-trimethoxysilane (Trade name KBM-903 manufactured by Shin-Etsu Chemical Co., Ltd.), ⁇ -aminopropyl-triethoxysilane (trade name KBE-903 manufactured by Shin-Etsu Chemical Co., Ltd.), 3-methacryloxypropyltrimethoxysilane (trade name KBM-602 manufactured by Shin
  • a silane coupling agent Y having at least a silicon atom, a nitrogen atom and a curable functional group in the molecule and having a hydrolyzable group bonded to the silicon atom is provided.
  • the silane coupling agent Y only needs to have at least one silicon atom in the molecule, and the silicon atom can be bonded to the following atoms and substituents. They may be the same atom, substituent or different.
  • Atoms and substituents that can be bonded are a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 20 carbon atoms, an alkenyl group, an alkynyl group, an aryl group, an alkyl group, and / or an amino group that can be substituted with an aryl group, silyl Group, an alkoxy group having 1 to 20 carbon atoms, an aryloxy group, and the like.
  • substituents further include an amino group, a halogen atom, a sulfonamide group, a silyl group, an alkenyl group, an alkynyl group, an aryl group, an alkoxy group, an aryloxy group, a thioalkoxy group, an alkyl group and / or an aryl group. It may be substituted with an alkoxycarbonyl group, an amide group, a urea group, an ammonium group, an alkylammonium group, a carboxyl group, a salt thereof, a sulfo group, or a salt thereof.
  • at least one hydrolyzable group is bonded to the silicon atom.
  • the definition of the hydrolyzable group is as described above.
  • the silane coupling agent Y may contain a group represented by the formula (Z).
  • the silane coupling agent Y has at least one nitrogen atom in the molecule, and the nitrogen atom is preferably present in the form of a secondary amino group or a tertiary amino group, that is, the nitrogen atom is used as a substituent. It preferably has at least one organic group.
  • the amino group structure may be present in the molecule in the form of a partial structure of a nitrogen-containing heterocycle, or may be present as a substituted amino group such as aniline.
  • examples of the organic group include an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a combination thereof.
  • substituents may further have a substituent
  • substituents that can be introduced include a silyl group, an alkenyl group, an alkynyl group, an aryl group, an alkoxy group, an aryloxy group, a thioalkoxy group, an amino group, a halogen atom, and a sulfonamide.
  • the nitrogen atom is couple
  • Preferred examples of the organic linking group include the above-described nitrogen atom and a substituent that can be introduced into the organic group bonded thereto.
  • the definition of the curable functional group contained in the silane coupling agent Y is as described above, and the preferred range is also as described above.
  • the silane coupling agent Y only needs to have at least one curable functional group in one molecule, but it is also possible to adopt an embodiment having two or more curable functional groups, sensitivity, stability. From this viewpoint, it is preferable to have 2 to 20 curable functional groups, more preferably 4 to 15, and most preferably 6 to 10 curable functional groups in the molecule.
  • the molecular weights of the silane coupling agent X and the silane coupling agent Y are not particularly limited, but include the above-described ranges (preferably 270 or more).
  • the content of the silane coupling agent in the composition of the present invention is preferably 0.1 to 10% by mass, more preferably 0.5 to 8% by mass, based on the total solid content in the composition. More preferably, it is 0 to 6% by mass.
  • composition of the present invention may contain one silane coupling agent or two or more silane coupling agents.
  • silane coupling agents When a composition contains 2 or more types of silane coupling agents, the sum should just be in the said range.
  • the composition of the present invention may contain an ultraviolet absorber. Thereby, the shape of a pattern can be made more excellent (fine).
  • an ultraviolet absorber salicylate-based, benzophenone-based, benzotriazole-based, substituted acrylonitrile-based, and triazine-based ultraviolet absorbers can be used.
  • compounds of paragraphs 0137 to 0142 corresponding to paragraphs 0251 to 0254 of US2012 / 0068292) of JP2012-068418A can be used, and the contents thereof can be incorporated and incorporated in the present specification. .
  • a diethylamino-phenylsulfonyl ultraviolet absorber (manufactured by Daito Chemical Co., Ltd., trade name: UV-503) and the like are also preferably used.
  • the ultraviolet absorber include compounds exemplified in paragraphs 0134 to 0148 of JP2012-32556A.
  • the composition of the present invention may or may not contain an ultraviolet absorber, but when it is included, the content of the ultraviolet absorber is preferably 0.001 to 15% by mass relative to the total solid content of the composition. 0.01 to 10% by mass is more preferable, and 0.1 to 5% by mass is more preferable.
  • the composition of the present invention may contain various surfactants from the viewpoint of further improving applicability.
  • various surfactants such as a fluorosurfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone surfactant can be used.
  • liquid properties (particularly fluidity) when prepared as a coating liquid are further improved, and uniformity of coating thickness and liquid-saving properties are further improved. be able to. That is, in the case of forming a film using a coating liquid to which a composition containing a fluorosurfactant is applied, the interfacial tension between the coated surface and the coating liquid decreases, and the wettability to the coated surface is reduced. It improves and the applicability
  • the fluorine content in the fluorosurfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass.
  • a fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of coating film thickness and liquid-saving properties, and has good solubility in the composition.
  • fluorosurfactant examples include Megafac F171, F172, F173, F176, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, RS-72-K (above DIC Corporation), Florard FC430, FC431, FC171 (above, Sumitomo 3M Limited), Surflon S-382, SC -101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (above, manufactured by Asahi Glass Co., Ltd.) ), PF636, PF656, PF6320, PF6520, and PF7002 (manufactured by OMNOVA).
  • fluorine-based surfactant compounds described in paragraphs 0015 to 0158 of JP-A No. 2015-117327 can also be used.
  • a block polymer can also be used as the fluorosurfactant, and specific examples thereof include compounds described in JP-A-2011-89090.
  • the fluorine-based surfactant has a repeating unit derived from a (meth) acrylate compound having a fluorine atom and 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy group or propyleneoxy group) (meth).
  • a fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used, and the following compounds are also exemplified as the fluorine-based surfactant used in the present invention.
  • the weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000.
  • the fluoropolymer which has an ethylenically unsaturated group in a side chain can also be used as a fluorine-type surfactant.
  • Specific examples thereof include compounds described in JP-A 2010-164965, paragraphs 0050 to 0090 and 0289 to 0295, such as MegaFac RS-101, RS-102, RS-718K, and RS- 72-K and the like.
  • nonionic surfactant examples include glycerol, trimethylolpropane, trimethylolethane and ethoxylates and propoxylates thereof (for example, glycerol propoxylate, glycerin ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene Stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester (Pluronic L10, L31, L61, L62 manufactured by BASF, 10R5, 17R2, 25R2, Tetronic 304, 701, 704, 901, 904, 150R1 And Solsperse 20000 include (Nippon Lubrizol Co. tetrazole Co.) and the like. Further, Wako Pure Chemical Industries Ltd., NCW-101, NCW-1001 and, may also
  • cationic surfactant examples include phthalocyanine derivatives (trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.), organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 (manufactured by Kyoeisha Chemical Co., Ltd.) and W001 (manufactured by Yusho Co., Ltd.).
  • phthalocyanine derivatives trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.
  • organosiloxane polymer KP341 manufactured by Shin-Etsu Chemical Co., Ltd.
  • (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 manufactured by Kyoeisha Chemical Co., Ltd.
  • W001 manufactured by Yusho Co., Ltd.
  • anionic surfactants include W004, W005, W017 (manufactured by Yusho Co., Ltd.), Sandet BL (manufactured by Sanyo Chemical Co., Ltd.), and the like.
  • silicone-based surfactants include Torre Silicone DC3PA, Torre Silicone SH7PA, Torre Silicone DC11PA, Torresilicone SH21PA, Torree Silicone SH28PA, Torree Silicone SH29PA, Torree Silicone SH30PA, Torree Silicone SH8400 (above, Toray Dow Corning Co., Ltd.) )), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4442 (above, manufactured by Momentive Performance Materials), KP341, KF6001, KF6002 (above, manufactured by Shin-Etsu Silicone Co., Ltd.) , BYK307, BYK323, and BYK330 (above, manufactured by BYK Chemie).
  • the content of the surfactant is preferably from 0.001 to 2.0% by mass, more preferably from 0.005 to 1.0% by mass, based on the total solid content of the composition of the present invention.
  • the following components may be further added to the composition of the present invention.
  • Examples include sensitizers, co-sensitizers, cross-linking agents, curing accelerators, fillers, thermosetting accelerators, polymerization inhibitors, plasticizers, diluents, and oil sensitizers, and adhesion to the substrate surface.
  • Accelerators and other auxiliaries for example, conductive particles, fillers, antifoaming agents, flame retardants, leveling agents, peeling accelerators, antioxidants, fragrances, surface tension modifiers, chain transfer agents, etc.
  • You may add well-known additives, such as, as needed.
  • paragraph numbers 0183 to 0228 of JP2012-003225A (corresponding ⁇ 0237> to ⁇ 0309> of US Patent Application Publication No. 2013/0034812) and JP2008-250074.
  • Paragraph numbers 0101 to 0102, paragraph numbers 0103 to 0104, paragraph numbers 0107 to 0109, paragraph numbers 0159 to 0184 in JP 2013-195480 A, and the like can be referred to, and the contents thereof are incorporated in this specification. .
  • a colorant other than the titanium nitride-containing particles described above (hereinafter also simply referred to as “colorant”) can be used.
  • the colorant is used, for example, for adjusting the chromaticity of the composition, and part of the titanium nitride can be replaced with the colorant as long as the OD value does not decrease.
  • examples of such a colorant include pigments (organic pigments of black organic pigments and chromatic organic pigments, and inorganic pigments) and dyes.
  • a pigment as the colorant. Thereby, it is easy to manufacture a film having a small standard deviation of transmittance in the wavelength range of 400 to 700 nm.
  • a black pigment a black organic pigment and a black inorganic pigment
  • Examples of the pigment include various conventionally known pigments.
  • Examples of chromatic organic pigments include the following. However, the present invention is not limited to these.
  • a zinc halide phthalocyanine pigment having an average number of halogen atoms in the molecule of 10 to 14, bromine atoms on average 8 to 12, and chlorine atoms on average 2 to 5 should be used. Is also possible. Specific examples include the compounds described in International Publication No. 2015/118720. These organic pigments can be used alone or in various combinations in order to increase color purity.
  • black pigments can be used as the black pigment.
  • examples thereof include carbon black and the following black metal-containing inorganic pigments.
  • a metal oxide or metal containing one or more metal elements selected from the group consisting of Co, Cr, Cu, Mn, Ru, Fe, Ni, Sn, Ti, and Ag Nitrogen can be mentioned. These may be used alone or as a mixture of two or more. Moreover, you may prepare so that it may have desired light-shielding property by using in combination with the inorganic pigment of another hue further to a black pigment.
  • inorganic pigments examples include, for example, zinc white, lead white, lithopone, titanium oxide, chromium oxide, iron oxide, precipitated barium sulfate and barite powder, red lead, iron oxide red, yellow lead , Zinc yellow (1 type of zinc yellow, 2 types of zinc yellow), ultramarine blue, prussian blue (potassium ferrocyanide) zircon gray, praseodymium yellow, chrome titanium yellow, chrome green, peacock, victoria green, bitumen blue (Prussian blue) ), Vanadium zirconium blue, chrome tin pink, pottery red, salmon pink and the like.
  • these black pigments and other inorganic pigments having other hues are used not only independently but also in combination with a plurality of types of pigments for the purpose of expressing light-shielding properties in a wide wavelength range from ultraviolet to infrared. Is possible.
  • the black pigment is preferably carbon black or titanium black, and titanium black is particularly preferable from the viewpoint of light-shielding properties in a wide wavelength range from ultraviolet to infrared.
  • Titanium black is black particles having titanium atoms. Preferred are low-order titanium oxide and titanium oxynitride.
  • titanium oxynitride includes titanium oxynitride such as International Publication No. 2008/123097, JP-A 2009-58946, JP-A 2010-14848, JP-A 2010-97210, and JP-A 2011-2274670. Further, a mixture of titanium oxynitride and titanium carbide as disclosed in JP 2010-95716 can be used.
  • titanium black particles can be modified as necessary for the purpose of improving dispersibility and suppressing aggregation. It can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, zirconium oxide, and can also be treated with a water-repellent substance as disclosed in JP-A-2007-302836.
  • Titanium black is a composite oxide such as Cu, Fe, Mn, V, Ni, etc., and one or more black pigments such as cobalt oxide, iron oxide, and carbon black for the purpose of adjusting dispersibility and colorability. You may contain in combination.
  • Titanium black can be produced by heating a mixture of titanium dioxide and titanium metal in a reducing atmosphere for reduction (Japanese Patent Laid-Open No. 49-5432), or ultrafine dioxide obtained by high-temperature hydrolysis of titanium tetrachloride.
  • a method of reducing titanium in a reducing atmosphere containing hydrogen Japanese Patent Laid-Open No. 57-205322
  • a method of reducing titanium dioxide or titanium hydroxide at high temperature in the presence of ammonia Japanese Patent Laid-Open No. 60-65069, Japanese Patent Laid-Open No.
  • JP-A-61-201610 JP-A-61-201610
  • a method in which a vanadium compound is attached to titanium dioxide or titanium hydroxide and reduced at high temperature in the presence of ammonia JP-A-61-201610
  • the present invention is not limited to these.
  • titanium black is not particularly limited, BET (Brunauer, Emmett, Teller ) is preferably measured value is less than 5 m 2 / g or more 150 meters 2 / g by method, 20 m 2 / g or more 120 m 2 / More preferably, it is g or less.
  • Examples of commercially available titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R, 13R-N, 13M-T (trade name: manufactured by Mitsubishi Materials Corporation), Tilack D (trade name: manufactured by Ako Kasei Co., Ltd.) and the like.
  • the above-mentioned black pigment preferably has an average primary particle diameter of 5 nm or more, and preferably 10 nm or more. From the same viewpoint, the upper limit is preferably 10 ⁇ m or less, more preferably 1 ⁇ m or less, and even more preferably 100 nm or less.
  • the average primary particle diameter of the black pigment is a value measured by the following method. A mixed liquid containing a black pigment is diluted 80 times with propylene glycol monomethyl ether acetate, and the obtained diluted liquid is measured using a dynamic light scattering method. This measurement is an average particle diameter obtained by using Microtrack (trade name) UPA-EX150 manufactured by Nikkiso Co., Ltd.
  • titanium black is contained as a dispersion in the composition, and the content ratio (Si / Ti) of Si atoms and Ti atoms in the dispersion is 0.05 or more in terms of mass. Is preferable, 0.05 to 0.5 is more preferable, and 0.07 to 0.4 is still more preferable.
  • the to-be-dispersed bodies include both those in which titanium black is in the state of primary particles and those in the state of aggregates (secondary particles). In order to change the Si / Ti of the object to be dispersed (for example, 0.05 or more), the following means can be used.
  • a dispersion is obtained by dispersing titanium oxide and silica particles using a disperser, and the dispersion is subjected to reduction treatment at a high temperature (for example, 850 to 1000 ° C.), whereby titanium black particles are mainly formed.
  • a dispersed material containing Si and Ti as components can be obtained.
  • the reduction treatment can also be performed in an atmosphere of a reducing gas such as ammonia.
  • titanium oxide include TTO-51N (trade name: manufactured by Ishihara Sangyo). Titanium oxide prepared by the plasma method can be suitably used because its particle size is smaller than commercially available titanium oxide fine particles (see the Journal of the Japan Institute of Metals Vol. 63 No. 1 (1999) 74-81) .
  • silica particles examples include AEROSIL (registered trademark) 90, 130, 150, 200, 255, 300, 380 (trade name: manufactured by Evonik).
  • a dispersing agent may be used for the dispersion of titanium oxide and silica particles.
  • examples of the dispersant include those described in the above-mentioned column of the dispersant.
  • the dispersion may be performed in a solvent.
  • examples of the solvent include water and organic solvents. What was demonstrated in the column of the above-mentioned organic solvent is mentioned.
  • Titanium black in which Si / Ti is adjusted to 0.05 or more, for example, can be obtained by, for example, the methods described in paragraph numbers [0005] and paragraph numbers [0016] to [0021] of JP-A-2008-266045. Can be produced.
  • the composition containing this dispersion by adjusting the content ratio (Si / Ti) of Si atoms and Ti atoms in the dispersion containing titanium black and Si atoms to a suitable range (for example, 0.05 or more).
  • a suitable range for example, 0.05 or more.
  • a residue contains the component derived from compositions, such as a titanium black particle and a resin component. The reason why the residue is reduced is not yet clear, but the above-mentioned dispersed material tends to have a small particle size (for example, the particle size is 30 nm or less).
  • the adsorptivity of the entire film with the underlying layer is reduced, and this is presumed to contribute to the improvement of the development removal property of the uncured composition (particularly titanium black) in the formation of the light-shielding film.
  • titanium black is excellent in light-shielding property for light in a wide wavelength range from ultraviolet light to infrared light. Therefore, the above-described dispersion containing titanium black and Si atoms (preferably Si / Ti is converted into mass)
  • the light-shielding film formed by using a material having a thickness of 0.05 or more exhibits excellent light-shielding properties.
  • the content ratio (Si / Ti) of Si atoms to Ti atoms in the dispersion is, for example, the method (1-1) or the method (1-2) described in paragraph 0033 of JP2013-249417A ). Whether or not the content ratio (Si / Ti) of Si atoms and Ti atoms in the dispersion is 0.05 or more for the dispersion to be contained in the light-shielding film obtained by curing the composition Is determined using the method (2) described in paragraph 0035 of JP2013-249417A.
  • the above-described titanium black can be used.
  • complex oxides such as Cu, Fe, Mn, V, Ni, cobalt oxide, iron oxide, carbon black, aniline
  • a Si-containing material such as silica
  • silica examples include precipitated silica, fumed silica, colloidal silica, and synthetic silica. These may be appropriately selected and used.
  • fine particle type silica examples include silica described in paragraph 0039 of JP2013-249417A, and the contents thereof are incorporated in the present specification.
  • a tungsten compound and a metal boride can also be used.
  • Tungsten compounds and metal borides have high absorption for infrared rays (light having a wavelength of about 800 to 1200 nm) (that is, they have high light shielding properties (shielding properties) for infrared rays) and absorption for visible light. It is a low infrared shielding material.
  • the photosensitive composition of this invention can form a pattern with high light-shielding property in an infrared region, and high translucency in a visible light region by containing a tungsten compound and / or a metal boride.
  • the tungsten compound and the metal boride have a small absorption even for light having a wavelength shorter than the visible range used for exposure of a high-pressure mercury lamp, KrF, ArF, or the like used for image formation.
  • tungsten compound examples include a tungsten oxide compound, a tungsten boride compound, a tungsten sulfide compound, and the like, and a tungsten oxide compound represented by the following general formula (composition formula) (I) is preferable.
  • composition formula) (I) M x W y O z (I) M represents a metal, W represents tungsten, and O represents oxygen. 0.001 ⁇ x / y ⁇ 1.1 2.2 ⁇ z / y ⁇ 3.0
  • alkali metal for example, alkali metal, alkaline earth metal, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Sn, Pb, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, and the like can be mentioned, and an alkali metal is preferable. 1 type or 2 types or more may be sufficient as the metal of M.
  • M is preferably an alkali metal, more preferably Rb or Cs, and even more preferably Cs.
  • infrared rays can be sufficiently shielded, and when it is 1.1 or less, generation of an impurity phase in the tungsten compound can be more reliably avoided. it can.
  • z / y is 2.2 or more, chemical stability as a material can be further improved, and when it is 3.0 or less, infrared rays can be sufficiently shielded.
  • tungsten oxide compound represented by the general formula (I) examples include Cs 0.33 WO 3 , Rb 0.33 WO 3 , K 0.33 WO 3 , Ba 0.33 WO 3 and the like. Cs 0.33 WO 3 or Rb 0.33 WO 3 is preferable, and Cs 0.33 WO 3 is more preferable.
  • the tungsten compound is preferably fine particles.
  • the average primary particle diameter of the tungsten fine particles is preferably 800 nm or less, more preferably 400 nm or less, and further preferably 200 nm or less.
  • the average primary particle diameter is in such a range, it becomes difficult for the tungsten fine particles to block visible light by light scattering, and thus the translucency in the visible light region can be further ensured.
  • the average primary particle size is preferably as small as possible. However, for reasons such as ease of handling during production, the average primary particle size of the tungsten fine particles is usually 1 nm or more.
  • two or more tungsten compounds can be used.
  • Tungsten compounds are commercially available, but when the tungsten compound is, for example, a tungsten oxide compound, the tungsten oxide compound is obtained by a method of heat-treating the tungsten compound in an inert gas atmosphere or a reducing gas atmosphere. (See Japanese Patent No. 4096205). Further, the tungsten oxide compound is also available as a dispersion of tungsten fine particles such as YMF-02 manufactured by Sumitomo Metal Mining Co., Ltd.
  • lanthanum boride LaB 6
  • PrB 6 praseodymium boride
  • NdB 6 cerium boride
  • CeB 6 cerium boride
  • YB 6 yttrium boride
  • boride Titanium TiB 2
  • zirconium boride ZrB 2
  • hafnium boride HfB 2
  • vanadium boride VB 2
  • tantalum boride TaB 2
  • CrB 2 chromium boride
  • boride One type or two or more types of molybdenum (MoB 2 , Mo 2 B 5 , MoB), tungsten boride (W 2 B 5 ) and the like can be mentioned, and lanthanum boride (LaB 6 ) is preferable.
  • the metal boride is preferably fine particles.
  • the average primary particle diameter of the metal boride fine particles is preferably 800 nm or less, more preferably 300 nm or less, and further preferably 100 nm or less.
  • the average primary particle size is preferably as small as possible.
  • the average primary particle size of the metal boride fine particles is usually 1 nm or more.
  • two or more metal borides can be used.
  • the metal boride is available as a commercial product, for example, as a dispersion of metal boride fine particles such as KHF-07AH manufactured by Sumitomo Metal Mining Co., Ltd.
  • Examples of the dye include, for example, JP-A No. 64-90403, JP-A No. 64-91102, JP-A No. 1-94301, JP-A No. 6-11614, No. 2592207, and US Pat. No. 4,808,501.
  • dye currently disclosed by 194828 gazette etc. can be used.
  • pyrazole azo compounds When classified as chemical structure, pyrazole azo compounds, pyromethene compounds, anilinoazo compounds, triphenylmethane compounds, anthraquinone compounds, benzylidene compounds, oxonol compounds, pyrazolotriazole azo compounds, pyridone azo compounds, cyanine compounds, phenothiazine compounds, pyrrolopyrazole azomethine compounds, etc. Can be used.
  • a dye multimer may be used as the dye. Examples of the dye multimer include compounds described in JP2011-213925A and JP2013-041097A.
  • the composition of the present invention may contain extender pigments as necessary in addition to the colorant.
  • extender pigments include barium sulfate, barium carbonate, calcium carbonate, silica, basic magnesium carbonate, alumina white, gloss white, titanium white, and hydrotalcite. These extender pigments can be used alone or in admixture of two or more.
  • the amount of extender used is usually 0 to 100 parts by weight, preferably 5 to 50 parts by weight, and more preferably 10 to 40 parts by weight with respect to 100 parts by weight of the colorant.
  • the colorant and extender can be used with their surface modified with a polymer in some cases.
  • Coloring agents may be used alone or in combination of two or more.
  • a coloring agent you may contain colored organic pigments, such as red, blue, yellow, green, and purple.
  • a light-shielding pigment specifically, titanium nitride-containing particles
  • a colored organic pigment it is preferable to use the colored organic pigment in an amount of 1 to 40% by mass based on the light-shielding pigment.
  • a red pigment and a light-shielding pigment in combination.
  • Pigment Red 254 is preferable as the red pigment, although not particularly limited.
  • the content of the colorant is preferably 20 to 80% by mass, more preferably 30 to 70% by mass, based on the total solid content of the composition, 35 More preferred is ⁇ 60% by mass.
  • the composition of the present invention may contain a pigment derivative.
  • the pigment derivative include a compound having a structure in which a part of an organic pigment is substituted with an acidic group, a basic group, or a phthalimidomethyl group.
  • organic pigment for constituting the pigment derivative examples include diketopyrrolopyrrole pigments, azo pigments, phthalocyanine pigments, anthraquinone pigments, quinacridone pigments, dioxazine pigments, perinone pigments, perylene pigments, thioindigo pigments , Isoindoline pigments, isoindolinone pigments, quinophthalone pigments, selenium pigments, metal complex pigments, and the like.
  • a sulfonic acid group As an acidic group which a pigment derivative has, a sulfonic acid group, a carboxylic acid group, and its quaternary ammonium base are preferable, a carboxylic acid group and a sulfonic acid group are more preferable, and a sulfonic acid group is especially preferable.
  • the basic group possessed by the pigment derivative is preferably an amino group, particularly preferably a tertiary amino group.
  • Specific examples of the pigment derivative include the following compounds.
  • the descriptions in paragraphs 0162 to 0183 of JP2011-252065 A can be referred to, and the contents thereof are incorporated in this specification.
  • the content of the pigment derivative is preferably 1 to 30% by mass and more preferably 3 to 20% by mass with respect to the total mass of the colorant.
  • the composition of the present invention may contain only one type of pigment derivative or two or more types of pigment derivatives. When two or more types are included, the total amount is preferably within the above range.
  • the composition of the present invention can be prepared by mixing the above-described various components by a known mixing method (for example, a stirrer, a homogenizer, a high-pressure emulsifier, a wet pulverizer, a wet disperser).
  • the composition of the present invention is preferably filtered with a filter for the purpose of removing foreign substances or reducing defects. Any filter can be used without particular limitation as long as it has been conventionally used for filtration.
  • a filter made of fluorine resin such as PTFE (polytetrafluoroethylene), polyamide resin such as nylon, polyolefin resin (including high density and ultra high molecular weight) such as polyethylene and polypropylene (PP), and the like can be given.
  • polypropylene (including high density polypropylene) and nylon are preferable.
  • the pore size of the filter is suitably about 0.1 to 7.0 ⁇ m, preferably about 0.2 to 2.5 ⁇ m, more preferably about 0.2 to 1.5 ⁇ m, and still more preferably 0.3 to 0.0 ⁇ m. 7 ⁇ m.
  • the filtering by the first filter may be performed only once or may be performed twice or more.
  • the second and subsequent pore diameters are the same or larger than the pore diameter of the first filtering.
  • the pore diameter here can refer to the nominal value of the filter manufacturer.
  • a commercially available filter for example, it can be selected from various filters provided by Nippon Pole Co., Ltd., Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd. (formerly Japan Microlith Co., Ltd.) or KITZ Micro Filter Co., Ltd. .
  • the second filter a filter formed of the same material as the first filter described above can be used.
  • the pore size of the second filter is suitably about 0.2 to 10.0 ⁇ m, preferably about 0.2 to 7.0 ⁇ m, more preferably about 0.3 to 6.0 ⁇ m.
  • the solid content of the composition of the present invention is preferably 10 to 40% by mass, and more preferably 12 to 35% by mass.
  • the light shielding property of a cured film improves more because the solid content of a composition is 10 mass% or more.
  • the solid content of the composition is 40% by mass or less, the viscosity stability over time of the composition becomes better.
  • the cured film of this invention is obtained using the composition mentioned above.
  • the cured film preferably has a surface uneven structure. By doing so, the reflectance of the light shielding film or the light shielding layer having the light shielding film can be reduced. Even if the uneven structure has an uneven structure on the surface of the light shielding film itself, another structure may be provided on the light shielding film to provide the uneven structure.
  • the shape of the surface concavo-convex structure is not particularly limited, but the surface roughness is preferably in the range of 0.55 ⁇ m to 1.5 ⁇ m.
  • the reflectance of the light shielding film is preferably 5% or less, more preferably 3% or less, and particularly preferably 2% or less.
  • the method for producing the surface concavo-convex structure is not particularly limited, but the light shielding film or other layers include an organic filler or an inorganic filler, a lithography method using exposure and development, etching, sputtering, nanoimprint method, etc. A method of roughening the surface of the light shielding film or other layers may also be used.
  • the method of reducing the reflectance of the cured film includes a method of providing a low refractive index layer on the light shielding film, and a method of providing a plurality of layers having different refractive indexes (for example, high refractive index layers).
  • the cured film of the present invention mainly contains the titanium nitride-containing particles described above.
  • the cured film of the present invention is suitably used as a light-shielding film, and specifically, suitably used as a light-shielding film (frame light-shielding film) around an image sensor such as a CCD image sensor or a CMOS image sensor.
  • a light-shielding film frame light-shielding film
  • an image sensor peripheral light-shielding film is formed on the color filter, and this is applied to a CCD image sensor or a CMOS image sensor. That is, the above-described cured film can be formed in a region that abuts on a frame region such as a color filter CCD image sensor or CMOS image sensor.
  • the color filter having the image sensor peripheral light-shielding film of the present invention is formed using the above-described composition (particularly, the above-described photosensitive composition).
  • the image sensor peripheral light-shielding film obtained by using the composition of the present invention is excellent in patterning property and electrode corrosion resistance.
  • the thickness of the light shielding film is not particularly limited, but from the viewpoint of obtaining the effect of the present invention more effectively, the film thickness after drying is 0.2 ⁇ m or more and 50 ⁇ m or less. Is preferably 0.5 ⁇ m or more and 30 ⁇ m or less, and more preferably 0.7 ⁇ m or more and 20 ⁇ m or less. Further, the size (length of one side) of the light shielding film is preferably 0.001 mm or more and 5 mm or less, more preferably 0.05 mm or more and 4 mm or less, from the viewpoint of obtaining the effect of the present invention more effectively. 1 mm or more and 3.5 mm or less are more preferable.
  • the manufacturing method of the cured film (light-shielding film) of the present invention is not particularly limited, and a known method can be adopted.
  • a method for producing a patterned cured film will be described in detail.
  • the method for producing a patterned cured film of the present invention is a process of applying a composition of the present invention on a substrate to form a composition layer (coating film) (hereinafter abbreviated as “composition layer forming process” as appropriate). And a step of exposing the composition layer through a mask (hereinafter abbreviated as “exposure step” as appropriate), and developing the exposed composition layer to form a patterned cured film. (Hereinafter, abbreviated as “development step” as appropriate).
  • composition layer forming step a composition layer
  • exposure process irradiated with light
  • development process developing with a developer
  • composition layer forming step In the composition layer forming step, the composition of the present invention is applied on a substrate to form a composition layer (coating film).
  • the substrate examples include alkali-free glass, soda glass, Pyrex (registered trademark) glass, quartz glass used for liquid crystal display devices and the like, and those obtained by attaching a transparent conductive film to them, photoelectric sensors used for solid-state imaging devices, and the like.
  • Examples include a conversion element substrate (for example, a silicon substrate), a CCD (Charge Coupled Device) substrate, and a CMOS (Complementary Metal-Oxide Semiconductor) substrate.
  • an undercoat layer may be provided on these substrates in order to improve adhesion with the upper layer, prevent diffusion of substances, or planarize the substrate surface.
  • various coating methods such as slit coating, ink jet method, spin coating, cast coating, roll coating, screen printing method and the like can be applied.
  • the coating thickness of the composition is preferably 0.35 ⁇ m or more and 2.0 ⁇ m or less from the viewpoint of resolution and developability, and 0.40 ⁇ m or more and 1. 5 ⁇ m or less is more preferable.
  • composition coated on the substrate is usually dried at 70 ° C. or higher and 110 ° C. or lower for 2 minutes or longer and 4 minutes or shorter. Thereby, a composition layer can be formed.
  • the composition layer (coating film) formed in the composition layer forming step is exposed through a mask, and only the coating film portion irradiated with light is cured.
  • the exposure is preferably performed by irradiation with actinic rays or radiation.
  • actinic rays or radiation In particular, ultraviolet rays such as g-line, h-line and i-line are preferably used, and a high-pressure mercury lamp is more preferable.
  • the irradiation intensity 5 ⁇ 1500mJ / cm 2 is more preferably preferably 10 ⁇ 1000mJ / cm 2.
  • an alkali development treatment (development step) is performed, and the light non-irradiated part in the exposure step is eluted in an alkaline aqueous solution. Thereby, only the photocured part (the coating film part irradiated with light) remains.
  • the developer when producing a color filter having a light shielding film around the image sensor, an organic alkali developer that does not cause damage to the underlying circuit or the like is desirable.
  • the development temperature is usually 20 to 30 ° C., and the development time is 20 to 90 seconds.
  • Examples of the alkaline aqueous solution include an inorganic developer and an organic developer.
  • As the inorganic developer sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate, sodium oxalate, sodium metasuccinate having a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass. %, An alkaline aqueous solution dissolved so as to be%.
  • Examples of the organic developer include aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo- [5.4.0] -7.
  • An alkaline aqueous solution in which an alkaline compound such as undecene is dissolved so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass.
  • An appropriate amount of a water-soluble organic solvent such as methanol and ethanol and / or a surfactant can be added to the alkaline aqueous solution.
  • a developer composed of such an alkaline aqueous solution it is generally washed (rinsed) with pure water after development.
  • the developing method for example, a paddle developing method and a shower developing method can be used.
  • the formed cured film is heated and / or if necessary.
  • a curing step of curing by exposure may be included.
  • the cured film formed using the composition of the present invention is a pixel black matrix of a color filter or an image sensor peripheral light shielding film (frame light shielding film) as described above, or in an image display device or sensor module described later. It can be preferably used as a light-shielding film applied to various members.
  • the color filter can be suitably used for a solid-state imaging device such as a CCD (Charge Coupled Device) or a CMOS (Complementary Metal Oxide Semiconductor), and is particularly suitable for a high-resolution CCD or CMOS that exceeds 1 million pixels. It is.
  • the color filter can be used by being disposed, for example, between a light receiving portion of each pixel constituting a CCD or CMOS and a microlens for collecting light.
  • the color filter may have a structure in which a cured film that forms each color pixel is embedded in a space partitioned by a partition, for example, in a lattice shape.
  • the partition in this case preferably has a low refractive index for each color pixel.
  • Examples of the image pickup device having such a structure include apparatuses described in JP 2012-227478 A and JP 2014-179577 A.
  • the color filter of this invention has the said cured film, the form will not be specifically limited.
  • the cured film can be suitably used, for example, as a pixel black matrix of the color filter or an image sensor peripheral light shielding film (frame light shielding film) as described above.
  • the light shielding film is formed and used on various members in an image display device or a sensor module (for example, an infrared light cut filter, an outer peripheral portion of a solid-state imaging device, an outer peripheral portion of a wafer level lens, a back surface of a solid-state imaging device, etc.). it can. Moreover, it is good also as an infrared light cut filter with a light shielding film by forming a light shielding film in at least one part on the surface of an infrared light cut filter.
  • the thickness of the light shielding film is not particularly limited, but is preferably 0.2 to 25 ⁇ m, more preferably 1.0 to 10 ⁇ m.
  • the thickness is an average thickness, and is a value obtained by measuring the thickness of any five or more points of the light shielding film and arithmetically averaging them.
  • the reflectance of the light shielding film is preferably 10% or less, more preferably 8% or less, further preferably 6% or less, and particularly preferably 4% or less.
  • the reflectance of the light shielding film is a value obtained by making the light of 400 to 700 nm incident on the light shielding film at an incident angle of 5 ° and measuring the reflectance with a spectrometer UV4100 (trade name) manufactured by Hitachi High Technology.
  • the solid-state imaging device of the present invention includes the cured film (color filter, light shielding film, etc.).
  • the configuration of the solid-state imaging device of the present invention is not particularly limited as long as the solid-state imaging device includes the cured film and functions as a solid-state imaging device.
  • the substrate has a plurality of photodiodes that constitute a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) and transfer electrodes made of polysilicon, etc., and the photodiodes receive light on the transfer electrodes.
  • the light source has a condensing means (for example, a microlens, etc., the same shall apply hereinafter) on the device protection layer and below the color filter (on the side close to the substrate), and a constitution having a light condensing means on the color filter.
  • the color filter may have a structure in which a cured film that forms each color pixel is embedded in a space partitioned by a partition, for example, in a lattice shape.
  • the partition in this case preferably has a low refractive index for each color pixel. Examples of the image pickup apparatus having such a structure include apparatuses described in JP 2012-227478 A and JP 2014-179577 A.
  • the cured film (color filter, light-shielding film, etc.) of the present invention can be used for an image display device such as a liquid crystal display device or an organic electroluminescence display device.
  • display devices For the definition of display devices and details of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, Kogyo Kenkyukai, 1990)”, “Display Device (Junsho Ibuki, Industrial Books Co., Ltd.) Issued in the first year).
  • the liquid crystal display device is described, for example, in “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, Industrial Research Co., Ltd., published in 1994)”.
  • the liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
  • the form is not particularly limited.
  • the color filter of the present invention may be used in a color TFT (Thin Film Transistor) type liquid crystal display device.
  • the color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”.
  • the color filter of the present invention is a liquid crystal display device with a wide viewing angle, such as a horizontal electric field driving method such as IPS (In Plane Switching), a pixel division method such as MVA (Multi-domain Vertical Alignment), and a STN (Super).
  • IPS In Plane Switching
  • MVA Multi-domain Vertical Alignment
  • STN Super
  • -Twist Nematic TN (Twisted Nematic)
  • VA Very Alignment
  • OCS on-chip spacer
  • FFS far-chip spacer
  • R-OCB Reflective Opt
  • the color filter in the present invention can be used for a bright and high-definition COA (Color-filter On Array) system.
  • the required characteristics for the color filter require the required characteristics for the interlayer insulating film, that is, the low dielectric constant and the resistance to the peeling liquid, in addition to the normal required characteristics as described above.
  • the color filter of the present invention is excellent in light resistance and the like, a COA type liquid crystal display device having high resolution and excellent long-term durability can be provided.
  • a resin film may be provided on the color filter layer.
  • the liquid crystal display device of the present invention includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film in addition to the color filter of the present invention.
  • the color filter of the present invention can be applied to a liquid crystal display device composed of these known members.
  • these components for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market (Kentaro Shima CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” Fuji Chimera Research Institute, Ltd., published in 2003) ”.
  • backlighting SID meeting Digest 1380 (2005) (A. Konno et.al), Monthly Display December 2005, pages 18-24 (Yasuhiro Shima), pages 25-30 (Yukiaki Yagi), etc. Are listed.
  • the cured film of the present invention is a portable device such as a personal computer, a tablet, a mobile phone, a smartphone, or a digital camera; an office automation (OA) device such as a multifunction printer or a scanner; a monitoring camera, a barcode reader, a cash automatic Industrial equipment such as personal identification using ATMs, high-speed cameras, or face image authentication; in-vehicle camera equipment; medical camera equipment such as endoscopes, capsule endoscopes, or catheters; Optics used in space equipment such as sensors, biosensors, military reconnaissance cameras, 3D map cameras, weather or ocean observation cameras, land resource exploration cameras, or exploration cameras for space astronomy or deep space targets Light shielding member or light shielding layer of filter or module It can be used. Furthermore, the cured film of the present invention can be used for an antireflection member or an antireflection layer of the optical filter or module.
  • the cured film of this invention can be used also for uses, such as micro LED (Light Emitting Diode) and micro OLED (Organic Light Emitting Diode).
  • micro LED Light Emitting Diode
  • micro OLED Organic Light Emitting Diode
  • the optical filter or optical film used for micro LED or micro OLED it is used suitably with respect to the member which provides a light-shielding function or an antireflection function.
  • the micro LED and the micro OLED include those described in JP-T-2015-500562 and JP-T-2014-533890.
  • the cured film of this invention can be used also for uses, such as a quantum dot display.
  • a quantum dot display In addition to the optical filter and optical film which are used for a quantum dot display, it uses suitably with respect to the member which provides a light-shielding function and an antireflection function.
  • quantum dot displays include U.S. Patent Application Publication No. 2013/0335677, U.S. Patent Application Publication No. 2014/0036536, U.S. Patent Application Publication No. 2014/0036203, and U.S. Patent Application Publication No. 2014/0035960. Those described are mentioned.
  • composition Hereinafter, in preparing the compositions of Examples and Comparative Examples, each component contained in the composition will be described first.
  • titanium nitride-containing particles TiN-1 to TiN-19 produced as follows were used.
  • TiN-1 (Titanium nitride-containing particles TiN-1)
  • the titanium nitride-containing particles TiN-1 were produced using an apparatus according to the black composite fine particle production apparatus described in FIG. 1 of International Publication No. 2010/147098.
  • a high frequency voltage of about 4 MHz and about 80 kVA is applied to the high frequency oscillation coil of the plasma torch, and the plasma gas supply source mixes argon gas 50 L / min and nitrogen 50 L / min as plasma gas.
  • a gas was supplied to generate an argon-nitrogen thermal plasma flame in the plasma torch.
  • 10 L / min carrier gas was supplied from the spray gas supply source of the material supply apparatus.
  • Ti powder particles (manufactured by Toho Tech Co., “TC-200”) as the particle raw material 3 are carrier gases.
  • argon gas it was supplied into a thermal plasma flame in a plasma torch, evaporated in the thermal plasma flame, and highly dispersed in a gas phase.
  • the flow rate ratio (volume ratio) of each of the particle raw materials 1 to 3 is as shown in Table 1.
  • nitrogen was used as a gas supplied into the chamber by the gas supply device. The flow rate in the chamber at this time was 5 m / sec, and the supply amount was 1000 L / min.
  • the pressure in the cyclone was 50 kPa, and the supply speed of titanium particles from the chamber to the cyclone was 10 m / s (average value).
  • heat treatment was performed on the particles using a labo kiln L / K manufactured by Narabashi Corporation as a firing furnace. Specifically, heat treatment was performed at 240 ° C. for 0.2 hours while supplying nitrogen as an atmosphere gas to the baking furnace at 100 mL / min. In this way, titanium nitride-containing particles TiN-1 were obtained.
  • the obtained titanium nitride-containing particles TiN-1 were measured for the content of titanium (Ti) atoms and chlorine (Cl) atoms by ICP emission spectroscopy.
  • ICP emission spectroscopic analysis an ICP emission spectroscopic analyzer “SPS3000” (trade name) manufactured by Seiko Instruments Inc. was used.
  • the nitrogen atom content was measured using an oxygen / nitrogen analyzer “EMGA-620W / C” (trade name) manufactured by Horiba, Ltd., and calculated by an inert gas melting-thermal conductivity method. The results are shown in Table 1.
  • the contents of Ti atoms, Cl atoms, and nitrogen atoms were measured in the same manner as the titanium nitride-containing particles TiN-1.
  • the remaining amount in each particle is an impurity such as oxygen or metal element derived from an oxide present in the particle.
  • the results are shown in Tables 1 and 2.
  • X-ray diffraction of titanium nitride-containing particles TiN-1 was measured by a wide-angle X-ray diffraction method (trade name “RU-200R” manufactured by Rigaku Corporation) with a powder sample placed in an aluminum standard sample holder.
  • the X-ray source is CuK ⁇ ray
  • the output is 50 kV / 200 mA
  • the slit system is 1 ° -1 ° -0.15 mm-0.45 mm
  • the measurement step (2 ⁇ ) is 0.02 °
  • the scan speed is It was 2 ° / min.
  • the diffraction angle (2 (theta)) of the peak originating in this TiN (200) surface was measured.
  • the crystallite size constituting the particles was determined from the half width of this peak using Scherrer's equation. The results are shown in Table 1. For the following titanium nitride-containing particles TiN-2 to TiN-19, the diffraction angle 2 ⁇ and the crystallite size were measured in the same manner as the titanium nitride-containing particles TiN-1. The results are shown in Tables 1 and 2.
  • the average primary particle size of the titanium nitride-containing particles TiN-1 was measured using a transmission electron microscope (TEM) according to the method described above.
  • TEM transmission electron microscope
  • 60 or more of the 100 titanium nitride-containing particles to be observed were spherical.
  • the cube is not limited to the one visually recognized as a cube, and the polyhedron whose corners are visually recognized was measured as a cube.
  • the average primary particle diameter was measured and the shape was observed by the same method as for titanium nitride-containing particles TiN-1. The results are shown in Tables 1 and 2.
  • the specific surface area of the titanium nitride-containing particles TiN-1 uses a Nippon Bell Co., Ltd. precision fully automatic gas adsorption apparatus ( "BELSORP" 36), after vacuum degassing at 100 ° C., the temperature of liquid nitrogen of the N 2 gas The adsorption isotherm at (77K) was measured, and this isotherm was analyzed by the BET method to determine the specific surface area.
  • Table 1 The specific surface areas of the following titanium nitride-containing particles TiN-2 to TiN-19 were also determined in the same manner as the titanium nitride-containing particles TiN-1. The results are shown in Tables 1 and 2.
  • Titanium nitride-containing particles TiN-2 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-2 were produced.
  • Titanium nitride-containing particles TiN-3 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-3 were produced.
  • Titanium nitride-containing particles TiN-4 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-4 were produced.
  • Titanium nitride-containing particles TiN-5 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-5 were produced.
  • Titanium nitride-containing particles TiN-6 Titanium nitride-containing particles TiN-1 except that the particle raw materials 1 to 3 used in the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, the heat treatment conditions, and the flow rate in the chamber are as shown in Table 1. In the same manner as in Example 1, titanium nitride-containing particles TiN-6 were produced.
  • Titanium nitride-containing particles TiN-7 were produced in the same manner as titanium nitride-containing particles TiN-6 except that the flow rate in the chamber was changed as shown in Table 1.
  • Titanium nitride-containing particles TiN-8 Titanium nitride-containing particles TiN-1 except that the particle raw materials 1 to 3 used in the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, the heat treatment conditions, and the flow rate in the chamber are as shown in Table 1. In the same manner as in Example 1, titanium nitride-containing particles TiN-8 were produced.
  • Titanium nitride-containing particles TiN-9 were produced in the same manner as titanium nitride-containing particles TiN-8 except that the flow rate in the chamber was changed as shown in Table 1.
  • Titanium nitride-containing particles TiN-10 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-10 were produced.
  • TiN-11 titanium nitride-containing particles TiN-11
  • TiN-12 titanium nitride-containing particles TiN-12
  • Titanium nitride-containing particles TiN-13 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-13 were produced. The heat treatment temperature of the titanium nitride-containing particles TiN-13 was 250 ° C.
  • Titanium nitride-containing particles TiN-14 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-14 were produced.
  • Titanium nitride-containing particles TiN-15 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-15 were produced.
  • Titanium nitride-containing particles TiN-16 were produced in the same manner as titanium nitride-containing particles TiN-15 except that the heat treatment conditions were as shown in Table 2.
  • Titanium nitride-containing particles TiN-17 Titanium nitride containing titanium nitride containing particles TiN-1 particles were produced in the same manner as titanium nitride containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the TiN-1 particles and the flow ratios thereof were as shown in Table 2. Material-containing particles TiN-17 were produced.
  • Titanium nitride-containing particles TiN-18 Titanium nitride containing titanium nitride containing particles TiN-1 particles were produced in the same manner as titanium nitride containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the TiN-1 particles and the flow ratios thereof were as shown in Table 2. Material-containing particles TiN-18 were produced.
  • Titanium nitride-containing particles TiN-19 The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-19 were produced.
  • the production conditions and physical properties of the titanium nitride-containing particles TiN-1 to titanium nitride-containing particles TiN-19 are shown in Tables 1 and 2 below.
  • the heat treatment temperature is 240 ° C.
  • Dispersants A to E having the following structures were used as the dispersants.
  • the numerical value described in each structural unit intends the mass% of each structural unit with respect to all the structural units.
  • the numerical values (a to e) described in each structural unit intend the molar ratio of each structural unit to all structural units, and x and y intend the number of linkages.
  • the numerical value described in the linking group linked to Z is intended to be the number linked to Z.
  • Binder resin A ACRYCURE RD-F8, made by Nippon Shokubai, see the structure below
  • -Binder resin B Cyclomer P (ACA) 230AA manufactured by Daicel
  • PET-30 penentaerythritol triacrylate, manufactured by Nippon Kayaku Co., Ltd.
  • OXE-02 Irgacure OXE02 (trade name, manufactured by BASF Japan)
  • OXE-03 Irgacure OXE03 (trade name, manufactured by BASF Japan)
  • ⁇ N-1919 Trade name, manufactured by ADEKA ⁇ IRGACURE-907: Trade name, manufactured by BASF Japan
  • the frame for color filters was produced using each composition of an Example and a comparative example. Specifically, the compositions of Examples and Comparative Examples were spin-coated on a semiconductor substrate configured with an 8-inch substrate assuming an image sensor so that the film thickness after pre-baking was 1.5 ⁇ m. A coating film was formed. Subsequently, a binary mask capable of forming a light-shielding film having a width of 250 ⁇ m and a length of 200 ⁇ m is arranged on the outer periphery of a width of 720 ⁇ m and a length of 520 ⁇ m, and exposure (exposure) is performed using an i-line exposure apparatus (FPA-3000 + i5, manufactured by Canon).
  • FPA-3000 + i5 manufactured by Canon
  • the obtained semiconductor substrate having a plurality of frames for the color filter is cut out to a size of 10 mm ⁇ 10 mm, and the amount of Cl in the outgas is detected by temperature programmed desorption gas analysis (TDS), and evaluated according to the following criteria. went.
  • TDS temperature programmed desorption gas analysis
  • the count intensity ratio of the peak position derived from Cl in the total outgas amount (detected total ion current value) from mass number 1 to 199 when the count derived from atmospheric components contained in the background is canceled is evaluated according to the following criteria. Went.
  • the degree of vacuum during the measurement was 1 ⁇ 10 ⁇ 7 Torr or less.
  • ⁇ Number of particles> A sample solution in which the above composition was diluted 500 times with PGMEA was prepared, and the number of particles having a size of 10 ⁇ m or more contained in 10 ml of this sample solution was determined by a flow type particle image analyzer (trade name “FPIA-3000”, Malvern). ).
  • a film was formed by spin-coating the compositions of Examples and Comparative Examples on a 0.7 mm thick, 10 cm square glass plate (EagleXG, Corning) at a rotation speed of 1.0 ⁇ m. A dry film was obtained by heat treatment at 100 ° C. for 2 min on the plate. The obtained substrate was measured for OD with a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies), the lowest OD value was measured in the wavelength region from 400 nm to 1200 nm, and evaluation was performed according to the following criteria. “A”: Minimum OD is 4.2 or more “B”: Minimum OD is 3.8 or more and less than 4.2 “C”: Minimum OD is 3.5 or more and less than 3.8 “D”: Minimum OD is 3. Less than 5
  • CM aging stability (CM aging stability)> The compositions of Examples and Comparative Examples were stored at 23 ° C. for 30 days and then stored at 7 ° C. for 9 months. Thereafter, the viscosity of each composition before and after storage was measured using an E-type viscometer (trade name “R85 type viscometer” manufactured by Toki Sangyo Co., Ltd.) under the conditions of 10 rpm and 23 ° C. The viscosity increase rate was calculated.
  • E-type viscometer trade name “R85 type viscometer” manufactured by Toki Sangyo Co., Ltd.
  • Thickening rate (viscosity after aging)-(viscosity immediately after preparation) / (viscosity immediately after preparation) “A”: Thickening rate less than 3% “B”: Thickening rate of 3% or more and less than 5% “C”: Thickening rate of 5% or more and less than 10% “D”: Thickening rate of 10% or more
  • a coating film was formed on the image sensor device substrate with a spin coater. Next, the obtained coating film was pre-baked at 100 ° C. for 2 minutes on a hot plate. Subsequently, the coating film that has been subjected to the pre-baking process is exposed using an i-line exposure apparatus (FPA, manufactured by Canon Inc.), and further developed to cover the outer periphery of the light receiving part on the substrate except for the dicing line and the electrode part. Simultaneously with the formation of the light shielding film, 20 alignment marks having a line width of 20 ⁇ m were formed on the substrate. The resolution was evaluated by observing the number of alignment marks formed using an optical microscope. “A”: 20 marks were formed. “B”: 19 marks were formed. “C”: 18 marks were formed. “D”: There were 17 or fewer marks.
  • a coating film was formed on the image sensor device substrate with a spin coater. Next, the obtained device substrate after the coating film formation was prebaked at 100 ° C. for 2 minutes on a hot plate. Subsequently, by using the i-line exposure apparatus (FPA-3000 + i5, manufactured by Canon), the coating film that has been subjected to the above pre-baking treatment is exposed and further developed, so that a portion other than the dicing line and the electrode portion is formed on the outer periphery of the light receiving portion on the substrate. A light shielding film to be coated was formed. Furthermore, the obtained light-shielding film was subjected to heat treatment at 220 ° C.
  • FPA-3000 + i5 manufactured by Canon
  • the wafer having the obtained light-shielding film is stored for 3 days in an environment of 110 ° C. and 90% RH (HAST tester EHS-411M manufactured by Espec Corp.), and then the rust generation state of the electrode pattern is formed on the wafer.
  • the 300 electrode pads were observed with an optical microscope (manufactured by Olympus, trade name “LEXT OLS4500”), and the corrosion resistance of the electrodes was evaluated according to the following criteria. “A”: No change is observed “B”: Electrode rusting is 2 or less “C”: Electrode rusting is more than 2 and 10 or less “D”: Electrode rusting is more than 10
  • Example 33 the mixing ratio of M1 and PET-30 is 5: 5 by mass ratio.
  • the content of chlorine atoms in the titanium nitride-containing particles is within the range of 0.001 to 0.3 mass% (in other words, 10 mass ppm to 3000 mass ppm).
  • a cured film excellent in the anticorrosive property of the electrode and excellent in patterning property (resolution) can be produced (Example).
  • the content of chlorine atoms in the titanium nitride-containing particles exceeds 0.3% by mass (in other words, 3000 ppm by mass), it indicates that the patterning property (resolution) and the anticorrosion property of the electrode are inferior.
  • the water content is 0.1 to 1% by mass (preferably 0.1 to 0.8% by mass, more preferably 0.1% by mass based on the total mass of the composition). It was confirmed that the cured film was excellent in patterning property (resolution) and anticorrosion property of the electrode material. Moreover, by setting the water content to 0.1 to 1% by mass with respect to the total mass of the composition, the amount of particles in the composition can be further reduced, and the viscosity aging stability of the composition is also excellent. It was confirmed. Further, by comparing Example 26 and Example 27, it was confirmed that when D / P was 0.3 or less, the cured film was more excellent in patternability (resolution).
  • the viscosity stability of the composition is excellent. Further, by comparing Example 12 and Example 16, when the ratio of the spherical shape is 60% by mass or more in the shape of the primary particles using a transmission electron microscope of the titanium nitride-containing particles, the spectral properties (good) OD value) and patterning properties (resolution) were confirmed to be excellent. It was also confirmed that the composition was excellent in filterability and viscosity aging stability.
  • Example 1 Evaluation was conducted in the same manner as in Example 1 except that the surfactant F-1 was not used. As a result of the evaluation, it was found that the same result as in Example 1 was obtained.
  • Carbon black dispersion (trade name “Color Black S170”, manufactured by Degussa, average primary particle diameter of 17 nm, BET specific surface area of 200 m 2 / g, gas black method, instead of titanium nitride-containing particles, was used.
  • a carbon black dispersion was obtained by the same method except that carbon black produced by the above method was used.
  • titanium nitride-containing particles TiN-1 are contained in place of the pigment dispersion added to contain 19% by mass of titanium nitride-containing particles TiN-1 in the composition.
  • the total content of titanium nitride-containing particles TiN-1 and carbon black in the composition is 19% by mass.
  • the composition was prepared in the same manner except that was used, and evaluated using this composition. As a result of the evaluation, it was found that the same light shielding property as in Example 1 was obtained.
  • titanium nitride-containing particles TiN-1 are contained in place of the pigment dispersion added to contain 19% by mass of titanium nitride-containing particles TiN-1 in the composition.
  • the total content of titanium nitride-containing particles TiN-1 and Pigment Yellow 150 in the composition is 19% by mass.
  • the composition was prepared in the same manner except that was used, and evaluated using this composition. As a result of the evaluation, it was found that the same light shielding property as in Example 1 was obtained, and a darker film was obtained.

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Abstract

Provided is a composition which is capable of forming a cured film that has excellent patterning properties, while exhibiting excellent anti-corrosion properties for electrodes. Also provided are a cured film, a color filter, a light-blocking film, a solid-state imaging element and an image display device. This composition contains titanium nitride-containing particles, which contain chlorine atoms; and the content of the chlorine atoms in the titanium nitride-containing particles is 0.001-0.3% by mass.

Description

組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置Composition, cured film, color filter, light-shielding film, solid-state imaging device, and image display device
 本発明は、組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置に関する。 The present invention relates to a composition, a cured film, a color filter, a light shielding film, a solid-state imaging device, and an image display device.
 固体撮像装置は、撮影レンズと、この撮影レンズの背後に配されるCCD(電荷結合素子)およびCMOS(相補性金属酸化膜半導体)等の固体撮像素子(以下、固体撮像素子を「イメージセンサー」ともいう。)と、この固体撮像素子が実装される回路基板とを備える。この固体撮像装置は、デジタルカメラ、カメラ付き携帯電話、および、スマートフォン等に搭載される。
 固体撮像装置においては、可視光の反射によるノイズが発生する場合がある。したがって、ノイズの発生の抑制を図る目的で、固体撮像装置内に所定の遮光膜を設けられる。遮光膜を形成するための組成物としては、チタンブラック等の黒色顔料を含有する黒色組成物が使用されている。
A solid-state imaging device is a photographic lens and a solid-state imaging device (hereinafter referred to as an “image sensor”) such as a CCD (charge coupled device) and a CMOS (complementary metal oxide semiconductor) disposed behind the photographic lens. And a circuit board on which the solid-state imaging device is mounted. This solid-state imaging device is mounted on a digital camera, a mobile phone with a camera, a smartphone, and the like.
In a solid-state imaging device, noise due to reflection of visible light may occur. Therefore, a predetermined light shielding film can be provided in the solid-state imaging device for the purpose of suppressing noise generation. As a composition for forming the light shielding film, a black composition containing a black pigment such as titanium black is used.
 一方、固体撮像素子および液晶画像装置等に配置されるカラーフィルタには、着色画素間の光の混色を防止してコントラストを向上させる等の目的でR(レッド)、G(グリーン)、B(ブルー)の各画素間にブラックマトリクスが形成されていることがある。ほかにも、カラーフィルタには、固体撮像素子の受光部の光漏れを防止する目的で、その額縁領域にイメージセンサー周辺遮光膜(額縁遮光膜)が形成されている。
 上述のブラックマトリクスを形成するための組成物にも、チタンブラック等の黒色顔料を含有する黒色組成物が使用されている。例えば特許文献1には、「少なくとも遮光材、樹脂および溶媒を含み、遮光材として少なくともチタン窒化物粒子を含有する樹脂ブラックマトリクス用黒色樹脂組成物であって、CuKα線をX線源とした場合の上記チタン窒化物粒子の(200)面に由来するピークの回折角2θが42.5°以上42.8°以下である樹脂ブラックマトリクス用黒色樹脂組成物。」が開示されている(請求項1)。
On the other hand, color filters disposed in a solid-state imaging device, a liquid crystal image device, and the like have R (red), G (green), and B (in order to improve contrast by preventing color mixing between colored pixels. A black matrix may be formed between each blue pixel. In addition, an image sensor peripheral light-shielding film (frame light-shielding film) is formed in the frame region of the color filter for the purpose of preventing light leakage from the light receiving portion of the solid-state imaging device.
A black composition containing a black pigment such as titanium black is also used in the composition for forming the black matrix. For example, Patent Document 1 states that “a black resin composition for a resin black matrix containing at least a light shielding material, a resin and a solvent, and containing at least titanium nitride particles as a light shielding material, and using CuKα rays as an X-ray source. A black resin composition for a resin black matrix having a diffraction angle 2θ of a peak derived from the (200) plane of the titanium nitride particles of 42.5 ° or more and 42.8 ° or less is disclosed. 1).
特許第5136139号公報Japanese Patent No. 5136139
 上記のようなチタン窒化物粒子(チタン窒化物含有粒子)を含有する黒色組成物の硬化膜は、例えば、固体撮像装置の構成部材の遮光膜またはカラーフィルタのブラックマトリクスもしくはイメージセンサー周辺遮光膜として用いられる際に、電極パターン等の電極が配置された基板上に積層されて用いられることがある。
 本発明者らは、特許文献1に記載されたチタン窒化物粒子(チタン窒化物含有粒子)を含有する黒色組成物を作製し、これを用いて、電極が配置された基板上に、電極を被覆するように硬化膜を形成してその評価を実施した。この結果、チタン窒化物粒子(チタン窒化物含有粒子)の種類によっては、上記電極の遮光膜と接触する領域に錆び等が発生し、すなわち電極が腐食する場合があることが分かった。また、同様に、上記黒色組成物を用いてパターン形状の硬化膜を形成する際には、パターンの解像性(パターニング性)が所望の要求を満足しないことがあることを明らかとした。
The cured film of the black composition containing titanium nitride particles (titanium nitride-containing particles) as described above is, for example, as a light shielding film of a constituent member of a solid-state imaging device, a black matrix of a color filter, or an image sensor peripheral light shielding film. When used, it may be used by being laminated on a substrate on which electrodes such as electrode patterns are arranged.
The inventors of the present invention produced a black composition containing titanium nitride particles (titanium nitride-containing particles) described in Patent Document 1, and used this to form an electrode on a substrate on which the electrode was placed. A cured film was formed so as to be coated and evaluated. As a result, it has been found that depending on the type of titanium nitride particles (titanium nitride-containing particles), rust or the like may occur in the region of the electrode that contacts the light-shielding film, that is, the electrode may corrode. Similarly, when forming a pattern-shaped cured film using the black composition, it has been clarified that the pattern resolution (patterning property) may not satisfy the desired requirements.
 そこで、本発明は、電極の防食性に優れ、且つ、パターニング性に優れた硬化膜を作製できる組成物を提供することを目的とする。また、本発明は、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置を提供することも目的とする。 Therefore, an object of the present invention is to provide a composition capable of producing a cured film having excellent electrode corrosion resistance and excellent patterning properties. Another object of the present invention is to provide a cured film, a color filter, a light shielding film, a solid-state imaging device, and an image display device.
 本発明者らは、上記課題を達成すべく鋭意検討した結果、チタン窒化物含有粒子中の塩素原子の含有量を所定の数値範囲に調整することで上記課題を解決できることを見出し、本発明を完成させた。
 すなわち、以下の構成により上記目的を達成することができることを見出した。
As a result of intensive studies to achieve the above problems, the present inventors have found that the above problems can be solved by adjusting the content of chlorine atoms in the titanium nitride-containing particles to a predetermined numerical range. Completed.
That is, it has been found that the above object can be achieved by the following configuration.
 (1) 塩素原子を含むチタン窒化物含有粒子を含有し、
 上記チタン窒化物含有粒子中における上記塩素原子の含有量が、0.001~0.3質量%である、組成物。
 (2) 上記チタン窒化物含有粒子の(200)面に由来するピークの回折角2θが、CuKα線をX線源とした場合において、42.8°超43.5°以下である、(1)に記載の組成物。
 (3) 上記チタン窒化物含有粒子のBET法により求められた比表面積が、40~60m/gである、(1)または(2)に記載の組成物。
 (4) 上記チタン窒化物含有粒子の平均一次粒子径が10~30nmである、(1)~(3)のいずれかに記載の組成物。
 (5) 透過型電子顕微鏡を用いた、前記チタン窒化物含有粒子の一次粒子像の写真観察において、
観察対象の100個のうち60個以上が球形である、(1)~(4)のいずれかに記載の組成物。
 (6) さらに、2種以上の溶剤を含有する、(1)~(5)のいずれかに記載の組成物。
 (7) さらに、分散剤を含有する、(1)~(6)のいずれかに記載の組成物。
 (8) 上記チタン窒化物含有粒子に対する上記分散剤の含有割合が、質量比で0.3以下である、(7)に記載の組成物。
 (9) さらに、重合性化合物を含有する、(1)~(8)のいずれかに記載の組成物。
 (10) さらに、重合開始剤を含有する、(1)~(9)のいずれかに記載の組成物。
 (11) 上記組成物中の固形分が10~40質量%である、(1)~(10)のいずれかに記載の組成物。
 (12) 上記チタン窒化物含有粒子の含有量が、上記組成物の全固形分に対して、30~70質量%である、(1)~(11)のいずれかに記載の組成物。
 (13) さらに、水を含有し、
 上記水の含有量が、上記組成物全質量に対して、0.1~1質量%である、(1)~(12)のいずれかに記載の組成物。
 (14) さらに、分散剤を含有し、
 上記分散剤が、ポリカプロラクトン、ポリバレロラクトン、ポリアクリル酸メチルおよびポリメタクリル酸メチルからなる群より選択される少なくとも1種の構造を有する、(1)~(13)のいずれかに記載の組成物。
 (15) (1)~(14)のいずれかに記載の組成物を用いて得られる、硬化膜。
 (16) (15)に記載の硬化膜を有する、カラーフィルタ。
 (17) (15)に記載の硬化膜を有する、遮光膜。
 (18) (15)に記載の硬化膜を有する、固体撮像素子。
 (19) (15)に記載の硬化膜を有する、画像表示装置。
(1) containing titanium nitride-containing particles containing chlorine atoms,
A composition in which the content of the chlorine atom in the titanium nitride-containing particles is 0.001 to 0.3% by mass.
(2) The diffraction angle 2θ of the peak derived from the (200) plane of the titanium nitride-containing particles is 42.8 ° or more and 43.5 ° or less when CuKα ray is used as the X-ray source. ).
(3) The composition according to (1) or (2), wherein the titanium nitride-containing particles have a specific surface area determined by the BET method of 40 to 60 m 2 / g.
(4) The composition according to any one of (1) to (3), wherein the titanium nitride-containing particles have an average primary particle size of 10 to 30 nm.
(5) In observation of a photograph of the primary particle image of the titanium nitride-containing particles using a transmission electron microscope,
The composition according to any one of (1) to (4), wherein 60 or more of 100 observation objects are spherical.
(6) The composition according to any one of (1) to (5), further comprising two or more solvents.
(7) The composition according to any one of (1) to (6), further comprising a dispersant.
(8) The composition according to (7), wherein a content ratio of the dispersant to the titanium nitride-containing particles is 0.3 or less by mass ratio.
(9) The composition according to any one of (1) to (8), further comprising a polymerizable compound.
(10) The composition according to any one of (1) to (9), further comprising a polymerization initiator.
(11) The composition according to any one of (1) to (10), wherein the solid content in the composition is 10 to 40% by mass.
(12) The composition according to any one of (1) to (11), wherein the content of the titanium nitride-containing particles is 30 to 70% by mass with respect to the total solid content of the composition.
(13) Furthermore, it contains water,
The composition according to any one of (1) to (12), wherein the water content is 0.1 to 1% by mass relative to the total mass of the composition.
(14) Furthermore, a dispersant is contained,
The composition according to any one of (1) to (13), wherein the dispersant has at least one structure selected from the group consisting of polycaprolactone, polyvalerolactone, polymethyl acrylate, and polymethyl methacrylate. object.
(15) A cured film obtained using the composition according to any one of (1) to (14).
(16) A color filter having the cured film according to (15).
(17) A light shielding film having the cured film according to (15).
(18) A solid-state imaging device having the cured film according to (15).
(19) An image display device having the cured film according to (15).
 本発明によれば、電極の防食性に優れ、且つ、パターニング性に優れた硬化膜を作製できる組成物を提供することができる。また、本発明は、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置を提供することができる。 According to the present invention, it is possible to provide a composition capable of producing a cured film having excellent anticorrosive properties of electrodes and excellent patterning properties. In addition, the present invention can provide a cured film, a color filter, a light shielding film, a solid-state imaging device, and an image display device.
 以下に、本発明について説明する。
 本明細書において「~」を用いて表される数値範囲は、「~」の前後に記載される数値を下限値および上限値として含む範囲を意味する。
 本明細書における基(原子団)の表記において、置換および無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば、「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含する。
 本明細書中における「活性光線」または「放射線」とは、例えば、水銀灯の輝線スペクトル、エキシマレーザーに代表される遠紫外線、極紫外線(EUV光)、X線、および、電子線等を意味する。また本発明において光とは、活性光線または放射線を意味する。本明細書中における「露光」とは、特に断らない限り、水銀灯の輝線スペクトル、エキシマレーザーに代表される遠紫外線、X線、および、EUV光等による露光のみならず、電子線およびイオンビーム等の粒子線による描画も露光に含める。
 本明細書において、“(メタ)アクリレート”はアクリレートおよびメタアクリレートを表し、“(メタ)アクリル”はアクリルおよびメタアクリルを表し、“(メタ)アクリロイル”は、アクリロイルおよびメタクリロイルを表し、“(メタ)アクリルアミド”は、アクリルアミドおよびメタアクリルアミドを表す。また、本明細書中において、“単量体”と“モノマー”とは同義である。本発明における単量体は、オリゴマーおよびポリマーと区別され、重量平均分子量が2,000以下の化合物をいう。本明細書中において、重合性化合物とは、重合性基を有する化合物のことをいい、単量体であっても、ポリマーであってもよい。重合性基とは、重合反応に関与する基をいう。
The present invention will be described below.
In this specification, a numerical range expressed using “to” means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
In the description of the group (atomic group) in this specification, the description which does not describe substitution and non-substitution includes what does not have a substituent and what has a substituent. For example, the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
“Actinic light” or “radiation” in the present specification means, for example, an emission line spectrum of a mercury lamp, far ultraviolet rays represented by an excimer laser, extreme ultraviolet rays (EUV light), X-rays, and electron beams. . In the present invention, light means actinic rays or radiation. Unless otherwise specified, “exposure” in the present specification includes not only exposure with a mercury lamp emission line spectrum, an excimer laser represented by far ultraviolet rays, X-rays, and EUV light, but also electron beams, ion beams, and the like. The exposure with the particle beam is also included in the exposure.
In the present specification, “(meth) acrylate” represents acrylate and methacrylate, “(meth) acryl” represents acrylic and methacryl, “(meth) acryloyl” represents acryloyl and methacryloyl, and “(meth) ) Acrylamide "refers to acrylamide and methacrylamide. In the present specification, “monomer” and “monomer” are synonymous. The monomer in the present invention is distinguished from an oligomer and a polymer and refers to a compound having a weight average molecular weight of 2,000 or less. In the present specification, the polymerizable compound means a compound having a polymerizable group, and may be a monomer or a polymer. The polymerizable group refers to a group that participates in a polymerization reaction.
[組成物]
 本発明の組成物は、塩素原子を含むチタン窒化物含有粒子を含有し、上記チタン窒化物含有粒子中における上記塩素原子の含有量が、0.001~0.3質量%である。
 本発明の組成物によれば、電極の防食性に優れ、且つ、パターニング性に優れた硬化膜を作製できる。
 本発明者らは、鋭意検討の結果、塩素原子の含有量が0.3質量%を超えたチタン窒化物含有粒子を顔料成分として含む黒色の組成物を用い、電極が配置された基板上に遮光膜を形成した際に、使用環境条件によっては上記塩素原子が空気中の水分等と反応することで塩酸を生成し、これにより電極部材の劣化が引き起こされることがあることを確認した。
 一方、塩素原子の含有量が0.001質量%未満であるチタン窒化物含有粒子を顔料成分として含む組成物を用いた場合、得られる塗膜の光学濃度(OD)が高くなり、パターニング性が低下する傾向があることを知見している。
 上記の観点から、組成物が含有するチタン窒化物含有粒子中の塩素原子の含有量を0.001~0.3質量%とすることで、電極の防食性に優れ、且つ、パターニング性に優れた硬化膜を形成することができる。
[Composition]
The composition of the present invention contains titanium nitride-containing particles containing chlorine atoms, and the content of the chlorine atoms in the titanium nitride-containing particles is 0.001 to 0.3% by mass.
According to the composition of this invention, the cured film excellent in the anticorrosion property of the electrode and excellent in patterning property can be produced.
As a result of intensive studies, the inventors of the present invention used a black composition containing, as a pigment component, titanium nitride-containing particles having a chlorine atom content exceeding 0.3% by mass on a substrate on which an electrode is disposed. It was confirmed that when the light-shielding film was formed, hydrochloric acid was generated by the reaction of the chlorine atoms with moisture in the air depending on the use environment conditions, thereby causing deterioration of the electrode member.
On the other hand, when a composition containing titanium nitride-containing particles having a chlorine atom content of less than 0.001% by mass as a pigment component is used, the optical density (OD) of the resulting coating film is increased, and the patterning property is improved. We know that there is a tendency to decrease.
From the above viewpoint, by making the content of chlorine atoms in the titanium nitride-containing particles contained in the composition 0.001 to 0.3% by mass, the electrode has excellent anticorrosion properties and excellent patterning properties. A cured film can be formed.
 <塩素原子を含むチタン窒化物含有粒子>
 チタン窒化物含有粒子の製造には、通常、気相反応法が用いられ、具体的には電気炉法および熱プラズマ法等が挙げられる。これらの製法の中でも、不純物の混入が少ない点、粒子径が揃いやすい点、および、生産性が高い点等の理由から、熱プラズマ法が好ましい。
 熱プラズマの発生方法としては、直流アーク放電、多相アーク放電、高周波(RF)プラズマ、および、ハイブリッドプラズマ等が挙げられ、電極からの不純物の混入が少ない高周波プラズマが好ましい。熱プラズマ法によるチタン窒化物含有粒子の具体的な製造方法としては、例えば、チタン粉末を高周波熱プラズマにより蒸発させ、窒素をキャリアガスとして装置内に導入し、冷却過程にてチタン粉末を窒化させ、チタン窒化物含有粒子を合成する方法等が挙げられる。なお、熱プラズマ法は、上記に限定されるものではない。
 また、チタン窒化物含有粒子は、熱プラズマ法を用いて得られることにより、CuKα線をX線源とした場合の(200)面に由来するピークの回折角2θ(詳細は後述する)を、42.8°超43.5°以下の範囲に調整することが容易になる。
<Titanium nitride-containing particles containing chlorine atoms>
For production of titanium nitride-containing particles, a gas phase reaction method is usually used, and specific examples include an electric furnace method and a thermal plasma method. Among these production methods, the thermal plasma method is preferred because it is less contaminated with impurities, has a uniform particle diameter, and has high productivity.
Examples of the method for generating thermal plasma include direct current arc discharge, multiphase arc discharge, radio frequency (RF) plasma, and hybrid plasma, and high frequency plasma in which impurities from the electrode are less mixed is preferable. As a specific method for producing titanium nitride-containing particles by the thermal plasma method, for example, titanium powder is evaporated by high-frequency thermal plasma, nitrogen is introduced into the apparatus as a carrier gas, and titanium powder is nitrided in the cooling process. And a method of synthesizing titanium nitride-containing particles. The thermal plasma method is not limited to the above.
Further, the titanium nitride-containing particles are obtained by using a thermal plasma method, whereby a peak diffraction angle 2θ (details will be described later) derived from the (200) plane when CuKα rays are used as an X-ray source, It becomes easy to adjust to the range of 42.8 ° or more and 43.5 ° or less.
 ここで、チタン窒化物含有粒子に塩素原子を含有させる方法としては、特に限定されない。上述の熱プラズマ法において、チタン粉末とともに四塩化チタンを用い、さらにキャリアガスとしてアンモニアガスを流すことにより、塩素原子を含むチタン窒化物含有粒子を合成する方法が一例として挙げられる。
 また、チタン窒化物含有粒子中の塩素原子の含有量が所定量以上である場合には、粒子を、例えば100~300℃(好ましくは120~280℃、より好ましくは120~250℃)で5分~72時間(好ましくは3~48時間、より好ましくは3~36時間)加熱処理することが望ましい。加熱処理を経ることで、チタン窒化物含有粒子中に含まれる塩素原子の含有量を低減し所定量に調整することができる。
Here, the method for causing the titanium nitride-containing particles to contain chlorine atoms is not particularly limited. As an example, a method of synthesizing titanium nitride-containing particles containing chlorine atoms by using titanium tetrachloride together with titanium powder and flowing ammonia gas as a carrier gas in the thermal plasma method described above can be given.
Further, when the content of chlorine atoms in the titanium nitride-containing particles is a predetermined amount or more, the particles are, for example, 100 to 300 ° C. (preferably 120 to 280 ° C., more preferably 120 to 250 ° C.) and 5 It is desirable to carry out heat treatment for minutes to 72 hours (preferably 3 to 48 hours, more preferably 3 to 36 hours). Through the heat treatment, the content of chlorine atoms contained in the titanium nitride-containing particles can be reduced and adjusted to a predetermined amount.
 チタン窒化物含有粒子の製造に使用するチタン粉末材料(チタン粒子)、および四塩化チタンは、高純度のものであることが好ましい。チタン粉末材料、および四塩化チタンは、特に限定されないが、チタン元素の純度が99.99%以上であるものが好ましく、99.999%以上のものがより好ましく用いられる。 The titanium powder material (titanium particles) and titanium tetrachloride used for the production of titanium nitride-containing particles are preferably of high purity. The titanium powder material and titanium tetrachloride are not particularly limited, but those having a purity of titanium element of 99.99% or more are preferable, and those of 99.999% or more are more preferably used.
 チタン窒化物含有粒子の製造に使用するチタン粉末材料(チタン粒子)および四塩化チタンは、チタン原子以外の原子を含有する場合がある。チタン粉末材料に含まれ得る他の原子としては、例えばFe原子およびSi原子等が挙げられる。
 チタン粉末材料および四塩化チタンがFe原子を含有する場合には、Fe原子の含有量は、チタン粉末材料および四塩化チタンの全質量に対して、0.001質量%超であることが好ましい。これにより、硬化膜のパターニング性がより優れる。また、チタン粉末材料および四塩化チタンがFe原子を含有する場合には、Fe原子の含有量は、チタン粉末材料および四塩化チタンの全量に対して、0.4質量%未満であることが好ましい。これにより、硬化膜による電極の防食性がより優れる(硬化膜が電極を腐食することをより抑制できる)。すなわち、チタン窒化物含有粒子の製造に使用するチタン粉末材料および四塩化チタンに含まれるFe原子が上記範囲内(0.001質量超、0.4質量%未満)にあることで、本発明の効果をより顕著に得ることができる。
 チタン粉末材料および四塩化チタンがSi原子を含有する場合には、Si原子の含有量が、チタン粉末材料全質量に対して、0.002質量%超0.3質量%未満であることが好ましく、0.01~0.15質量%であることがより好ましく、0.02~0.1質量%であることがさらに好ましい。Si原子の含有量が0.002質量%超であることで、硬化膜のパターニング性がより向上する。また、Si原子の含有量が0.3質量%未満であることで、得られるチタン窒化物含有粒子の最表層の極性が安定し、チタン窒化物含有粒子を分散させる際におけるチタン窒化物含有粒子への分散剤の吸着性が良化して、チタン窒化物含有粒子の未分散物が低減することで、パーティクル発生を抑制する効果があると考えられる。すなわち、チタン窒化物含有粒子の製造に使用するチタン粉末材料および四塩化チタンに含まれるSi原子が上記範囲内であることで、本発明の効果がより顕著に得ることができる。
 また、チタン窒化物含有粒子の製造に使用するチタン粉末材料(チタン粒子)および四塩化チタンは中の水分は、チタン粉末材料の全質量に対して、1質量%未満であることが好ましく、0.1質量%未満であることがより好ましく、実質的に含まないことがさらに好ましい。チタン窒化物含有粒子の製造に使用するチタン粉末材料および四塩化チタン中の水分が上記範囲にあることで、本発明の効果がより顕著に得ることができる。
The titanium powder material (titanium particles) and titanium tetrachloride used for the production of titanium nitride-containing particles may contain atoms other than titanium atoms. Examples of other atoms that can be contained in the titanium powder material include Fe atoms and Si atoms.
When the titanium powder material and titanium tetrachloride contain Fe atoms, the content of Fe atoms is preferably more than 0.001% by mass with respect to the total mass of the titanium powder material and titanium tetrachloride. Thereby, the patterning property of a cured film is more excellent. Further, when the titanium powder material and titanium tetrachloride contain Fe atoms, the content of Fe atoms is preferably less than 0.4 mass% with respect to the total amount of the titanium powder material and titanium tetrachloride. . Thereby, the corrosion resistance of the electrode by a cured film is more excellent (it can suppress more that a cured film corrodes an electrode). That is, the Fe powder contained in the titanium powder material and titanium tetrachloride used for the production of titanium nitride-containing particles is within the above range (over 0.001 mass, less than 0.4 mass%). The effect can be obtained more remarkably.
When the titanium powder material and titanium tetrachloride contain Si atoms, the Si atom content is preferably more than 0.002% by mass and less than 0.3% by mass with respect to the total mass of the titanium powder material. More preferably, the content is 0.01 to 0.15% by mass, and further preferably 0.02 to 0.1% by mass. When the content of Si atoms is more than 0.002% by mass, the patterning property of the cured film is further improved. Further, when the content of Si atoms is less than 0.3% by mass, the polarity of the outermost layer of the obtained titanium nitride-containing particles is stabilized, and the titanium nitride-containing particles when the titanium nitride-containing particles are dispersed It is considered that the adsorbing property of the dispersant on the surface is improved, and the undispersed material of the titanium nitride-containing particles is reduced, thereby suppressing the generation of particles. That is, the effect of the present invention can be obtained more remarkably when the Si atom contained in the titanium powder material and titanium tetrachloride used for the production of titanium nitride-containing particles is within the above range.
The titanium powder material (titanium particles) and titanium tetrachloride used in the production of titanium nitride-containing particles preferably have a water content of less than 1% by mass with respect to the total mass of the titanium powder material. More preferably, it is less than 1 mass%, and it is still more preferable not to contain substantially. The effect of this invention can be acquired more notably because the water | moisture content in the titanium powder material and titanium tetrachloride used for manufacture of titanium nitride containing particle | grains exists in the said range.
 チタン窒化物含有粒子中のチタン原子(Ti原子)の含有量は、チタン窒化物含有粒子の全質量に対して、50~85質量%であることが好ましく、50~80質量%であることがより好ましく、50~75質量%であることがさらに好ましい。チタン窒化物含有粒子中のTi原子の含有量は、ICP(高周波誘導結合プラズマ)発光分光分析法により分析できる。
 チタン窒化物含有粒子中の窒素原子(N原子)の含有量は、チタン窒化物含有粒子の全質量に対して、20~50質量%であることが好ましく、20~45質量%であることがより好ましく、20~40質量%であることがさらに好ましい。窒素原子の含有量は不活性ガス融解-熱伝導度法により分析することができる。
 チタン窒化物含有粒子中の酸素原子の含有量は、チタン窒化物含有粒子全質量に対して、12質量%以下であることが好ましく、8質量%以下であることがより好ましい。酸素原子の含有量は、不活性ガス融解-赤外線吸収法により分析することができる。
The content of titanium atoms (Ti atoms) in the titanium nitride-containing particles is preferably 50 to 85% by mass and preferably 50 to 80% by mass with respect to the total mass of the titanium nitride-containing particles. More preferred is 50 to 75% by mass. The content of Ti atoms in the titanium nitride-containing particles can be analyzed by ICP (High Frequency Inductively Coupled Plasma) emission spectroscopy.
The content of nitrogen atoms (N atoms) in the titanium nitride-containing particles is preferably 20 to 50% by mass and preferably 20 to 45% by mass with respect to the total mass of the titanium nitride-containing particles. More preferred is 20 to 40% by mass. The nitrogen atom content can be analyzed by an inert gas melting-thermal conductivity method.
The content of oxygen atoms in the titanium nitride-containing particles is preferably 12% by mass or less, and more preferably 8% by mass or less, based on the total mass of the titanium nitride-containing particles. The oxygen atom content can be analyzed by an inert gas melting-infrared absorption method.
 チタン窒化物含有粒子中における塩素原子の含有量は、チタン窒化物含有粒子全質量に対して、0.001~0.3質量%である。なかでも、0.005~0.3質量%であることが好ましく、0.01~0.3質量%がより好ましく、0.1~0.3質量%であることが更に好ましく、0.1~0.15質量%が特に好ましい。塩素原子の含有量が0.001質量%以上であることで、硬化膜のパターニング性が優れる。塩素原子の含有量が0.3質量%以下であることで、硬化膜のパターニング性に優れ、また、硬化膜による電極の防食性が優れる。
 ここで、チタン窒化物含有粒子中における塩素原子の含有量は、ICP発光分光分析法により測定される。
The content of chlorine atoms in the titanium nitride-containing particles is 0.001 to 0.3% by mass with respect to the total mass of the titanium nitride-containing particles. Among these, the content is preferably 0.005 to 0.3% by mass, more preferably 0.01 to 0.3% by mass, still more preferably 0.1 to 0.3% by mass, From 0.15% by weight is particularly preferred. When the chlorine atom content is 0.001% by mass or more, the patterning property of the cured film is excellent. When the content of chlorine atoms is 0.3% by mass or less, the patterning property of the cured film is excellent, and the corrosion resistance of the electrode by the cured film is excellent.
Here, the content of chlorine atoms in the titanium nitride-containing particles is measured by ICP emission spectroscopy.
 チタン窒化物含有粒子は、CuKα線をX線源としてX線回折スペクトルを測定した場合の(200)面に由来するピークの回折角2θが42.8°超43.5°以下であることが好ましい。このような特徴をもつチタン窒化物含有粒子を含有する組成物を用いて得られる硬化膜(例えば、ブラックマトリクス等)は、OD値が適切な数値となり、パターニング性(解像性)により優れる。 The titanium nitride-containing particles may have a diffraction angle 2θ of a peak derived from the (200) plane of 42.8 ° or more and 43.5 ° or less when an X-ray diffraction spectrum is measured using CuKα ray as an X-ray source. preferable. A cured film (eg, a black matrix) obtained using a composition containing titanium nitride-containing particles having such characteristics has an appropriate OD value and is excellent in patterning properties (resolution).
 チタン窒化物含有粒子の(200)面に由来するピークの回折角2θは、上述の如く42.8°超43.5°以下であることが好ましく、42.85~43.3°であることがより好ましく、42.9~43.2°であることが更に好ましい。
 チタン窒化物含有粒子は主成分としてチタン窒化物(TiN)を含み、通常、その合成時に酸素が混入する場合、および、粒子径が小さい場合等に顕著になるが、粒子表面の酸化等により、一部酸素原子を含有してもよい。
 ただし、チタン窒化物含有粒子に含まれる酸素量が少ない方がより高いOD値(光学濃度)が得られるため好ましい。また、チタン窒化物含有粒子は、副成分としてTiOを含有しないことが好ましい。副成分として酸化チタンTiOをチタン窒化物含有粒子が含有する場合、最も強度の強いピークとしてアナターゼ型TiO(101)に由来するピークが2θ=25.3°近傍に、ルチル型TiO(110)に由来するピークが2θ=27.4°近傍に見られる。しかし、TiOは白色でありブラックマトリクスの遮光性を低下させる要因となるため、ピークとして観察されない程度に低減されていることが好ましい。
The diffraction angle 2θ of the peak derived from the (200) plane of the titanium nitride-containing particles is preferably more than 42.8 ° and not more than 43.5 ° as described above, and is 42.85 to 43.3 °. Is more preferably 42.9 to 43.2 °.
Titanium nitride-containing particles contain titanium nitride (TiN) as a main component and are usually noticeable when oxygen is mixed during the synthesis and when the particle diameter is small, but due to oxidation of the particle surface, etc. A part of oxygen atoms may be contained.
However, a smaller amount of oxygen contained in the titanium nitride-containing particles is preferable because a higher OD value (optical density) can be obtained. Further, the titanium nitride-containing particles, preferably contains no TiO 2 as an auxiliary component. When the titanium nitride-containing particles contain titanium oxide TiO 2 as an accessory component, the peak derived from anatase TiO 2 (101) as the strongest peak is in the vicinity of 2θ = 25.3 °, the rutile TiO 2 ( 110) is observed in the vicinity of 2θ = 27.4 °. However, since TiO 2 is white and causes a reduction in the light shielding properties of the black matrix, it is preferably reduced to such an extent that it is not observed as a peak.
 X線回折ピークの半値幅よりチタン窒化物含有粒子を構成する結晶子サイズを求めることができ、シェラーの式を用いて算出される。 The crystallite size constituting the titanium nitride-containing particles can be determined from the half width of the X-ray diffraction peak, and is calculated using Scherrer's formula.
 結晶子サイズとしては、20nm以上であることが好ましく、20~50nmであることがより好ましい。結晶子サイズが20nm以上のチタン窒化物含有粒子を用いてブラックマトリクスを形成した場合、硬化膜の透過光はそのピーク波長が475nm以下であるような青色から青紫色を呈し、高い遮光性と紫外線感度を併せ持つブラックマトリクスを得ることができる。 The crystallite size is preferably 20 nm or more, more preferably 20 to 50 nm. When a black matrix is formed using titanium nitride-containing particles having a crystallite size of 20 nm or more, the transmitted light of the cured film exhibits a blue to blue violet color having a peak wavelength of 475 nm or less, and has high light shielding properties and ultraviolet light. A black matrix having both sensitivity can be obtained.
 チタン窒化物含有粒子の比表面積はBET法により求めることができ、40~60m/gであることが好ましく、40~58m/gであることがより好ましく、42~55m/gであることがさらに好ましい。チタン窒化物含有粒子の比表面積を40~60m/gとすることで、得られる硬化膜はOD(光学濃度)値がより適切な範囲となり、パターニング性(解像性)により優れるほか、組成物のろ過性にも優れる。 The specific surface area of the titanium nitride-containing particles can be determined by the BET method and is preferably 40 to 60 m 2 / g, more preferably 40 to 58 m 2 / g, and 42 to 55 m 2 / g. More preferably. By setting the specific surface area of the titanium nitride-containing particles to 40 to 60 m 2 / g, the resulting cured film has an OD (optical density) value in a more appropriate range and is superior in patterning properties (resolution). Excellent filterability of things.
 チタン窒化物含有粒子の平均一次粒子径は、10~30nmであることが好ましく、10~28nmであることがより好ましく、10~25nmであることが更に好ましく、10~20nmであることがさらに好ましい。チタン窒化物含有粒子の平均一次粒子径を10~30nmとすることで、得られる硬化膜はOD(光学濃度)値が適切な範囲となる。また、組成物の粘度経時安定性の観点からは、チタン窒化物含有粒子の平均一次粒子径が10nm以上であることが好ましい。
 なお、本発明において、チタン窒化物含有粒子の平均一次粒子径とは、粒子を透過型電子顕微鏡(例えば、日本電子製 JEM―2100F型 電界放射型透過電子顕微鏡に準ずる装置)により観察し、得られた写真から求めることができ、一次粒子の数平均粒子径のことをいう。具体的には、実施例記載の手法によりチタン窒化物含有粒子を含む分散液を調製してその固形分が1質量%程度になるように分散液と同じ溶媒により希釈し、カーボンフォイル上に分散液を滴下、乾燥した後のカーボンフォイル上に存在するチタン窒化物含有粒子の透過型電子顕微鏡像を観察する。上記装置によりチタン窒化物含有粒子の一次粒子の投影面積を求め、そこから円相当径を求める。求めた円相当径の算術平均を一次粒子径とした。より具体的には、平均一次粒子径を求めるために無作為に選んだ100個の粒子について一次粒子径を測定した後、最大側10個と最小側10個とを除いた、80個の粒子の一次粒子径を算術平均することで求められる。
 また、チタン窒化物含有粒子は、上述の透過型電子顕微鏡を用いた一次粒子像の写真観察において、観察対象の100個のうち60個以上(いい換えると、60%以上)が球形であることが好ましい。用いるチタン窒化物含有粒子の60%以上が球形であることで、得られる硬化膜はOD(光学濃度)値が適切な範囲となり、パターニング性(解像性)により優れる。また、用いるチタン窒化物含有粒子の60%以上が球形であることで、組成物のろ過性および粘度経時安定性にも優れる。
 なお、本発明において粒子が「球形」であるとは、必ずしも真球である必要はなく、例えば、略球状のもの(投影したときの二次元図形における短径/長径比が0.7~1程度)、回転楕円体であってもよい。
The average primary particle diameter of the titanium nitride-containing particles is preferably 10 to 30 nm, more preferably 10 to 28 nm, further preferably 10 to 25 nm, and further preferably 10 to 20 nm. . By setting the average primary particle diameter of the titanium nitride-containing particles to 10 to 30 nm, the obtained cured film has an OD (optical density) value in an appropriate range. In addition, from the viewpoint of viscosity stability over time of the composition, the average primary particle diameter of the titanium nitride-containing particles is preferably 10 nm or more.
In the present invention, the average primary particle diameter of the titanium nitride-containing particles is obtained by observing the particles with a transmission electron microscope (for example, an apparatus according to JEM-2100F type field emission transmission electron microscope manufactured by JEOL). It can be determined from the photograph taken and refers to the number average particle size of primary particles. Specifically, a dispersion containing titanium nitride-containing particles is prepared by the method described in the examples, diluted with the same solvent as the dispersion so that the solid content is about 1% by mass, and dispersed on the carbon foil. A transmission electron microscope image of the titanium nitride-containing particles present on the carbon foil after dropping and drying the liquid is observed. The projected area of the primary particles of titanium nitride-containing particles is determined by the above apparatus, and the equivalent circle diameter is determined therefrom. The arithmetic average of the obtained equivalent circle diameter was defined as the primary particle diameter. More specifically, after measuring the primary particle size of 100 particles randomly selected to determine the average primary particle size, 80 particles excluding the maximum 10 particles and the minimum 10 particles are excluded. It is calculated | required by arithmetically averaging the primary particle diameter.
Further, in the photographic observation of the primary particle image using the transmission electron microscope described above, 60 or more (in other words, 60% or more) of titanium nitride-containing particles are spherical. Is preferred. When 60% or more of the titanium nitride-containing particles to be used are spherical, the obtained cured film has an OD (optical density) value in an appropriate range and is excellent in patterning properties (resolution). Moreover, 60% or more of the titanium nitride-containing particles to be used are spherical, so that the filterability and viscosity aging stability of the composition are excellent.
In the present invention, the term “spherical” means that the particles are not necessarily true spheres. For example, the particles are substantially spherical (the ratio of the minor axis / major axis in the two-dimensional figure when projected is 0.7 to 1). Degree) or a spheroid.
 チタン窒化物含有粒子の含有量は、組成物の全固形分に対して、30~70質量%であることが好ましく、40~68質量%であることがより好ましく、42~65質量%であることがさらに好ましい。チタン窒化物含有粒子の含有量が上記数値範囲にあることで、分光性(良好なOD値)に優れるほか、パターニング性(解像性)および電極の防食性にも優れる。
 なお、本明細書において、固形分とは、組成物により形成される硬化膜を構成する成分を意図し、溶媒は含まれない。例えば、後述する重合性化合物は硬化膜を構成する成分であるため、液体(液状)であっても固形分に含まれる。
The content of titanium nitride-containing particles is preferably 30 to 70% by mass, more preferably 40 to 68% by mass, and 42 to 65% by mass with respect to the total solid content of the composition. More preferably. When the content of the titanium nitride-containing particles is in the above numerical range, in addition to excellent spectral properties (good OD value), patterning properties (resolution) and anticorrosion properties of the electrodes are also excellent.
In addition, in this specification, solid content intends the component which comprises the cured film formed with a composition, and a solvent is not contained. For example, since the polymerizable compound described later is a component constituting the cured film, even a liquid (liquid) is included in the solid content.
 <分散剤>
 本発明の組成物は、分散剤を含有することが好ましい。分散剤は、上述したチタン窒化物含有粒子等の顔料の分散性向上に寄与する。本発明において、分散剤と、後述するバインダー樹脂とは、異なる成分である。
 分散剤としては、例えば、公知の顔料分散剤を適宜選択して用いることができる。なかでも、高分子化合物が好ましい。
 分散剤としては、高分子分散剤〔例えば、ポリアミドアミンとその塩、ポリカルボン酸とその塩、高分子量不飽和酸エステル、変性ポリウレタン、変性ポリエステル、変性ポリ(メタ)アクリレート、(メタ)アクリル系共重合体、ナフタレンスルホン酸ホルマリン縮合物〕、ポリオキシエチレンアルキルリン酸エステル、ポリオキシエチレンアルキルアミン、および、顔料誘導体等を挙げることができる。
 高分子化合物は、その構造からさらに直鎖状高分子、末端変性型高分子、グラフト型高分子、およびブロック型高分子に分類することができる。
<Dispersant>
The composition of the present invention preferably contains a dispersant. A dispersing agent contributes to the improvement of dispersibility of pigments, such as a titanium nitride content particle mentioned above. In this invention, a dispersing agent and the binder resin mentioned later are different components.
As the dispersant, for example, a known pigment dispersant can be appropriately selected and used. Of these, polymer compounds are preferable.
Examples of the dispersant include polymer dispersants [for example, polyamidoamine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meth) acrylate, (meth) acrylic type Copolymer, naphthalenesulfonic acid formalin condensate], polyoxyethylene alkyl phosphate ester, polyoxyethylene alkyl amine, and pigment derivatives.
The polymer compounds can be further classified into linear polymers, terminal-modified polymers, graft polymers, and block polymers based on their structures.
 高分子化合物は、チタン窒化物含有粒子および所望により併用する顔料等の被分散体の表面に吸着し、被分散体の再凝集を防止するように作用する。そのため、顔料表面へのアンカー部位を有する、末端変性型高分子、グラフト型高分子、および、ブロック型高分子が好ましい。
 一方で、チタン窒化物含有粒子の表面を改質することにより、これに対する高分子化合物の吸着性を促進させることもできる。
The polymer compound is adsorbed on the surface of the dispersion such as titanium nitride-containing particles and optionally used pigments, and acts to prevent re-aggregation of the dispersion. Therefore, a terminal-modified polymer, a graft polymer, and a block polymer having an anchor site to the pigment surface are preferable.
On the other hand, by modifying the surface of the titanium nitride-containing particles, the adsorptivity of the polymer compound can be promoted.
 高分子化合物は、グラフト鎖を有する構造単位を有することが好ましい。なお、本明細書において、「構造単位」とは「繰り返し単位」と同義である。
 このようなグラフト鎖を有する構造単位を有する高分子化合物は、グラフト鎖によって溶剤との親和性を有するために、チタン窒化物含有粒子等の顔料の分散性、および、経時後の分散安定性に優れるものである。また、グラフト鎖の存在により、グラフト鎖を有する構造単位を有する高分子化合物は重合性化合物またはその他の併用可能な樹脂等との親和性を有する。結果として、アルカリ現像で残渣を生じにくくなる。
 グラフト鎖が長くなると立体反発効果が高くなり顔料等の分散性は向上する。一方、グラフト鎖が長すぎるとチタン窒化物含有粒子等の顔料への吸着力が低下して、顔料等の分散性は低下する傾向となる。このため、グラフト鎖は、水素原子を除いた原子数が40~10000であるものが好ましく、水素原子を除いた原子数が50~2000であるものがより好ましく、水素原子を除いた原子数が60~500であるものがさらに好ましい。
 ここで、グラフト鎖とは、共重合体の主鎖の根元(主鎖から枝分かれしている基において主鎖に結合する原子)から、主鎖から枝分かれしている基の末端までを示す。
The polymer compound preferably has a structural unit having a graft chain. In this specification, “structural unit” is synonymous with “repeating unit”.
Since the polymer compound having a structural unit having such a graft chain has an affinity for a solvent by the graft chain, the dispersibility of pigments such as titanium nitride-containing particles and the dispersion stability after aging are improved. It is excellent. Further, due to the presence of the graft chain, the polymer compound having a structural unit having a graft chain has an affinity with a polymerizable compound or other resin that can be used in combination. As a result, it becomes difficult to produce a residue by alkali development.
When the graft chain becomes longer, the steric repulsion effect becomes higher and the dispersibility of the pigment and the like is improved. On the other hand, if the graft chain is too long, the adsorptive power to the pigment such as titanium nitride-containing particles decreases, and the dispersibility of the pigment or the like tends to decrease. For this reason, the graft chain preferably has 40 to 10,000 atoms excluding hydrogen atoms, more preferably 50 to 2000 atoms excluding hydrogen atoms, and the number of atoms excluding hydrogen atoms. More preferred is 60-500.
Here, the graft chain means from the base of the main chain of the copolymer (the atom bonded to the main chain in a group branched from the main chain) to the end of the group branched from the main chain.
 グラフト鎖は、ポリマー構造を有することが好ましく、このようなポリマー構造としては、例えば、ポリ(メタ)アクリレート構造(例えば、ポリ(メタ)アクリル構造)、ポリエステル構造、ポリウレタン構造、ポリウレア構造、ポリアミド構造、および、ポリエーテル構造等を挙げることができる。
 グラフト鎖と溶剤との相互作用性を向上させ、それにより分散性を高めるために、グラフト鎖は、ポリエステル構造、ポリエーテル構造およびポリ(メタ)アクリレート構造からなる群から選ばれた少なくとも1種を有するグラフト鎖であることが好ましく、ポリエステル構造およびポリエーテル構造の少なくともいずれかを有するグラフト鎖であることがより好ましい。
The graft chain preferably has a polymer structure. Examples of such a polymer structure include a poly (meth) acrylate structure (for example, a poly (meth) acrylic structure), a polyester structure, a polyurethane structure, a polyurea structure, and a polyamide structure. And a polyether structure.
In order to improve the interaction between the graft chain and the solvent and thereby improve the dispersibility, the graft chain is made of at least one selected from the group consisting of a polyester structure, a polyether structure and a poly (meth) acrylate structure. It is preferably a graft chain having, and more preferably a graft chain having at least one of a polyester structure and a polyether structure.
 このようなグラフト鎖を有するマクロモノマーとしては、特に限定されないが、反応性二重結合性基を有するマクロモノマーを好適に使用することができる。 The macromonomer having such a graft chain is not particularly limited, but a macromonomer having a reactive double bond group can be preferably used.
 高分子化合物が有するグラフト鎖を有する構造単位に対応し、高分子化合物の合成に好適に用いられる市販のマクロモノマーとしては、AA-6(商品名、東亜合成(株))、AA-10(商品名、東亜合成(株)製)、AB-6(商品名、東亜合成(株)製)、AS-6(商品名、東亜合成(株))、AN-6(商品名、東亜合成(株)製)、AW-6(商品名、東亜合成(株)製)、AA-714(商品名、東亜合成(株)製)、AY-707(商品名、東亜合成(株)製)、AY-714(商品名、東亜合成(株)製)、AK-5(商品名、東亜合成(株)製)、AK-30(商品名、東亜合成(株)製)、AK-32(商品名、東亜合成(株)製)、ブレンマーPP-100(商品名、日油(株)製)、ブレンマーPP-500(商品名、日油(株)製)、ブレンマーPP-800(商品名、日油(株)製)、ブレンマーPP-1000(商品名、日油(株)製)、ブレンマー55-PET-800(商品名、日油(株)製)、ブレンマーPME-4000(商品名、日油(株)製)、ブレンマーPSE-400(商品名、日油(株)製)、ブレンマーPSE-1300(商品名、日油(株)製)、ブレンマー43PAPE-600B(商品名、日油(株)製)等が用いられる。このなかでも、好ましくは、AA-6(商品名、東亜合成(株)製)、AA-10(商品名、東亜合成(株))、AB-6(商品名、東亜合成(株)製)、AS-6(商品名、東亜合成(株))、AN-6(商品名、東亜合成(株)製)、および、ブレンマーPME-4000(商品名、日油(株)製)等が用いられる。 Corresponding to the structural unit having a graft chain of the polymer compound, commercially available macromonomers suitably used for the synthesis of the polymer compound include AA-6 (trade name, Toa Gosei Co., Ltd.), AA-10 ( Product name, manufactured by Toa Gosei Co., Ltd.), AB-6 (trade name, manufactured by Toa Gosei Co., Ltd.), AS-6 (trade name, produced by Toa Gosei Co., Ltd.), AN-6 (trade name, manufactured by Toa Gosei Co., Ltd.) Co., Ltd.), AW-6 (trade name, manufactured by Toa Gosei Co., Ltd.), AA-714 (trade name, manufactured by Toa Gosei Co., Ltd.), AY-707 (trade name, manufactured by Toa Gosei Co., Ltd.), AY-714 (trade name, manufactured by Toa Gosei Co., Ltd.), AK-5 (trade name, manufactured by Toa Gosei Co., Ltd.), AK-30 (trade name, manufactured by Toa Gosei Co., Ltd.), AK-32 (product) Name, manufactured by Toa Gosei Co., Ltd.), Blemmer PP-100 (trade name, manufactured by NOF Corporation), Blemmer PP-500 ( Product name, NOF Corporation), BLEMMER PP-800 (trade name, NOF Corporation), BLEMMER PP-1000 (trade name, NOF Corporation), BLEMMER 55-PET-800 (product) Name, manufactured by NOF Corporation), BREMMER PME-4000 (trade name, manufactured by NOF Corporation), BREMMER PSE-400 (trade name, manufactured by NOF Corporation), Blemmer PSE-1300 (trade name, NOF Corporation, Bremer 43PAPE-600B (trade name, manufactured by NOF Corporation) and the like are used. Of these, AA-6 (trade name, manufactured by Toa Gosei Co., Ltd.), AA-10 (trade name, manufactured by Toa Gosei Co., Ltd.), AB-6 (trade name, manufactured by Toa Gosei Co., Ltd.) AS-6 (trade name, manufactured by Toa Gosei Co., Ltd.), AN-6 (trade name, manufactured by Toa Gosei Co., Ltd.), Blemmer PME-4000 (trade name, manufactured by NOF Corporation), etc. It is done.
 分散剤は、ポリカプロラクトン、ポリバレロラクトン、ポリアクリル酸メチルおよびポリメタクリル酸メチルからなる群より選択される少なくとも1種の構造を有することが好ましい。さらに、これら構造は2種以上を併用することがより好ましい。
 ここで、ポリカプロラクトン構造とは、ε-カプロラクトンを開環した構造を繰り返し単位として有するものをいう。ポリバレロラクトン構造とは、δ-バレロラクトンを開環した構造を繰り返し単位として有するものをいう。
 ポリカプロラクトン構造を有する分散剤の具体例としては、下記式(1)および下記式(2)におけるjおよびkが5であるものが挙げられる。また、ポリバレロラクトン構造を有する分散剤の具体例としては、下記式(1)および下記式(2)におけるjおよびkが4であるものが挙げられる。
 ポリアクリル酸メチル構造を有する分散剤の具体例としては、下記式(4)におけるXが水素原子であり、Rがメチル基であるものが挙げられる。また、ポリメタクリル酸メチル構造を有する分散剤の具体例としては、下記式(4)におけるXがメチル基であり、Rがメチル基であるものが挙げられる。
The dispersant preferably has at least one structure selected from the group consisting of polycaprolactone, polyvalerolactone, polymethyl acrylate and polymethyl methacrylate. Furthermore, it is more preferable to use two or more of these structures in combination.
Here, the polycaprolactone structure means a structure having a ring-opened structure of ε-caprolactone as a repeating unit. The polyvalerolactone structure means a structure having a ring-opened structure of δ-valerolactone as a repeating unit.
Specific examples of the dispersant having a polycaprolactone structure include those in which j and k are 5 in the following formula (1) and the following formula (2). Specific examples of the dispersant having a polyvalerolactone structure include those in which j and k in the following formula (1) and the following formula (2) are 4.
Specific examples of the dispersant having a polymethyl acrylate structure include those in which X 5 in the following formula (4) is a hydrogen atom and R 4 is a methyl group. Further, specific examples of the dispersant having a polymethyl methacrylate structure include those in which X 5 in the following formula (4) is a methyl group and R 4 is a methyl group.
 高分子化合物は、グラフト鎖を有する構造単位として、下記式(1)~式(4)のいずれかで表される構造単位を含むことが好ましく、下記式(1A)、下記式(2A)、下記式(3A)、下記式(3B)、および下記(4)のいずれかで表される構造単位を含むことがより好ましい。 The polymer compound preferably includes a structural unit represented by any one of the following formulas (1) to (4) as a structural unit having a graft chain, and includes the following formula (1A), the following formula (2A), It is more preferable to include a structural unit represented by any of the following formula (3A), the following formula (3B), and the following (4).
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
 式(1)~式(4)において、W、W、W、およびWはそれぞれ独立に酸素原子またはNHを表す。W、W、W、およびWは酸素原子であることが好ましい。
 式(1)~式(4)において、X、X、X、X、およびXは、それぞれ独立に、水素原子または1価の有機基を表す。X、X、X、X、およびXとしては、合成上の制約の観点からは、それぞれ独立に、水素原子または炭素数(炭素原子数)1~12のアルキル基であることが好ましく、それぞれ独立に、水素原子またはメチル基であることがより好ましく、メチル基がさらに好ましい。
In the formulas (1) to (4), W 1 , W 2 , W 3 , and W 4 each independently represent an oxygen atom or NH. W 1 , W 2 , W 3 , and W 4 are preferably oxygen atoms.
In the formulas (1) to (4), X 1 , X 2 , X 3 , X 4 , and X 5 each independently represent a hydrogen atom or a monovalent organic group. X 1 , X 2 , X 3 , X 4 , and X 5 are each independently a hydrogen atom or an alkyl group having 1 to 12 carbon atoms (the number of carbon atoms) from the viewpoint of synthesis restrictions. Are preferably each independently a hydrogen atom or a methyl group, more preferably a methyl group.
 式(1)~式(4)において、Y、Y、Y、およびYは、それぞれ独立に、2価の連結基を表し、連結基は特に構造上制約されない。Y、Y、Y、およびYで表される2価の連結基として、具体的には、下記の(Y-1)~(Y-21)の連結基等が例として挙げられる。下記に示した構造において、A、Bはそれぞれ、式(1)~式(4)における左末端基、右末端基との結合部位を意味する。下記に示した構造のうち、合成の簡便性から、(Y-2)または(Y-13)であることがより好ましい。 In the formulas (1) to (4), Y 1 , Y 2 , Y 3 , and Y 4 each independently represent a divalent linking group, and the linking group is not particularly limited in structure. Specific examples of the divalent linking group represented by Y 1 , Y 2 , Y 3 , and Y 4 include the following (Y-1) to (Y-21) linking groups. . In the structures shown below, A and B mean binding sites with the left end group and the right end group in formulas (1) to (4), respectively. Of the structures shown below, (Y-2) or (Y-13) is more preferable from the viewpoint of ease of synthesis.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
 式(1)~式(4)において、Z、Z、Z、およびZは、それぞれ独立に1価の有機基を表す。有機基の構造は、特に限定されないが、具体的には、アルキル基、水酸基、アルコキシ基、アリールオキシ基、ヘテロアリールオキシ基、アルキルチオエーテル基、アリールチオエーテル基、ヘテロアリールチオエーテル基、およびアミノ基等が挙げられる。これらの中でも、Z、Z、Z、およびZで表される有機基としては、特に分散性向上の観点から、立体反発効果を有するものが好ましく、各々独立に炭素数5から24のアルキル基またはアルコキシ基が好ましく、その中でも、特に各々独立に炭素数5から24の分岐アルキル基、炭素数5から24の環状アルキル基、または、炭素数5から24のアルコキシ基が好ましい。なお、アルコキシ基中に含まれるアルキル基は、直鎖状、分岐鎖状、および、環状のいずれでもよい。 In the formulas (1) to (4), Z 1 , Z 2 , Z 3 , and Z 4 each independently represent a monovalent organic group. The structure of the organic group is not particularly limited, and specific examples include an alkyl group, a hydroxyl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthioether group, an arylthioether group, a heteroarylthioether group, and an amino group. Is mentioned. Among these, as the organic group represented by Z 1 , Z 2 , Z 3 , and Z 4 , those having a steric repulsion effect are particularly preferable from the viewpoint of improving dispersibility, and each independently has 5 to 24 carbon atoms. Of these, a branched alkyl group having 5 to 24 carbon atoms, a cyclic alkyl group having 5 to 24 carbon atoms, or an alkoxy group having 5 to 24 carbon atoms is particularly preferable. The alkyl group contained in the alkoxy group may be linear, branched, or cyclic.
 式(1)~式(4)において、n、m、p、およびqは、それぞれ独立に、1から500の整数である。
 また、式(1)および式(2)において、jおよびkは、それぞれ独立に、2~8の整数を表す。式(1)および式(2)におけるjおよびkは、組成物の分散安定性および現像性の観点から、4~6の整数が好ましく、5がより好ましい。
In the formulas (1) to (4), n, m, p, and q are each independently an integer of 1 to 500.
In the formulas (1) and (2), j and k each independently represent an integer of 2 to 8. J and k in the formulas (1) and (2) are preferably integers of 4 to 6, and more preferably 5, from the viewpoint of dispersion stability and developability of the composition.
 式(3)中、Rは分岐または直鎖のアルキレン基を表し、炭素数1~10のアルキレン基が好ましく、炭素数2または3のアルキレン基がより好ましい。pが2~500のとき、複数存在するRは互いに同じであっても異なっていてもよい。
 式(4)中、Rは水素原子または1価の有機基を表し、この1価の有機基としては特に構造上限定はされない。Rとして好ましくは、水素原子、アルキル基、アリール基、およびヘテロアリール基が挙げられ、より好ましくは、水素原子、またはアルキル基である。Rがアルキル基である場合、アルキル基としては、炭素数1~20の直鎖状アルキル基、炭素数3~20の分岐状アルキル基、または炭素数5~20の環状アルキル基が好ましく、炭素数1~20の直鎖状アルキル基がより好ましく、炭素数1~6の直鎖状アルキル基がさらに好ましい。式(4)において、qが2~500のとき、グラフト共重合体中に複数存在するXおよびRは互いに同じであっても異なっていてもよい。
In the formula (3), R 3 represents a branched or straight chain alkylene group, preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 2 or 3 carbon atoms. When p is 2 to 500, a plurality of R 3 may be the same or different from each other.
In the formula (4), R 4 represents a hydrogen atom or a monovalent organic group, and the monovalent organic group is not particularly limited in terms of structure. R 4 preferably includes a hydrogen atom, an alkyl group, an aryl group, and a heteroaryl group, and more preferably a hydrogen atom or an alkyl group. When R 4 is an alkyl group, the alkyl group is preferably a linear alkyl group having 1 to 20 carbon atoms, a branched alkyl group having 3 to 20 carbon atoms, or a cyclic alkyl group having 5 to 20 carbon atoms, A linear alkyl group having 1 to 20 carbon atoms is more preferable, and a linear alkyl group having 1 to 6 carbon atoms is more preferable. In the formula (4), when q is 2 to 500, a plurality of X 5 and R 4 present in the graft copolymer may be the same or different from each other.
 また、高分子化合物は、2種以上の構造が異なる、グラフト鎖を有する構造単位を有することができる。即ち、高分子化合物の分子中に、互いに構造の異なる式(1)~式(4)で示される構造単位を含んでいてもよく、また、式(1)~式(4)においてn、m、p、およびqがそれぞれ2以上の整数を表す場合、式(1)および式(2)においては、側鎖中にjおよびkが互いに異なる構造を含んでいてもよく、式(3)および式(4)においては、分子内に複数存在するR、RおよびXは互いに同じであっても異なっていてもよい。 In addition, the polymer compound may have a structural unit having a graft chain, which has two or more different structures. That is, the polymer compound molecule may contain structural units represented by formulas (1) to (4) having different structures, and n, m in formulas (1) to (4). , P, and q each represents an integer of 2 or more, in Formula (1) and Formula (2), j and k may contain structures different from each other in the side chain. In the formula (4), a plurality of R 3 , R 4 and X 5 present in the molecule may be the same or different from each other.
 式(1)で表される構造単位としては、組成物の分散安定性および現像性の観点から、下記式(1A)で表される構造単位であることがより好ましい。
 また、式(2)で表される構造単位としては、組成物の分散安定性および現像性の観点から、下記式(2A)で表される構造単位であることがより好ましい。
The structural unit represented by the formula (1) is more preferably a structural unit represented by the following formula (1A) from the viewpoint of dispersion stability and developability of the composition.
The structural unit represented by the formula (2) is more preferably a structural unit represented by the following formula (2A) from the viewpoint of dispersion stability and developability of the composition.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 式(1A)中、X、Y、Zおよびnは、式(1)におけるX、Y、Zおよびnと同義であり、好ましい範囲も同様である。式(2A)中、X、Y、Zおよびmは、式(2)におけるX、Y、Zおよびmと同義であり、好ましい範囲も同様である。 Wherein (1A), X 1, Y 1, Z 1 and n are the same as X 1, Y 1, Z 1 and n in Formula (1), and preferred ranges are also the same. Wherein (2A), X 2, Y 2, Z 2 and m are as defined X 2, Y 2, Z 2 and m in the formula (2), and preferred ranges are also the same.
 また、式(3)で表される構造単位としては、組成物の分散安定性および現像性の観点から、下記式(3A)または式(3B)で表される構造単位であることがより好ましい。 The structural unit represented by formula (3) is more preferably a structural unit represented by the following formula (3A) or formula (3B) from the viewpoint of dispersion stability and developability of the composition. .
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
 式(3A)または(3B)中、X、Y、Zおよびpは、式(3)におけるX、Y、Zおよびpと同義であり、好ましい範囲も同様である。 Wherein (3A) or (3B), X 3, Y 3, Z 3 and p are as defined X 3, Y 3, Z 3 and p in formula (3), and preferred ranges are also the same.
 高分子化合物は、グラフト鎖を有する構造単位として、式(1A)で表される構造単位を有することがより好ましい。 More preferably, the polymer compound has a structural unit represented by the formula (1A) as a structural unit having a graft chain.
 高分子化合物において、グラフト鎖を有する構造単位(例えば、上記式(1)~式(4)で表される構造単位)は、質量換算で、高分子化合物の総質量に対し2~90%の範囲で含まれることが好ましく、5~30%の範囲で含まれることがより好ましい。グラフト鎖を有する構造単位が、この範囲内で含まれるとチタン窒化物含有粒子の分散性が高く、硬化膜を形成する際の現像性が良好である。 In the polymer compound, the structural unit having a graft chain (for example, the structural unit represented by the above formulas (1) to (4)) is 2 to 90% of the total mass of the polymer compound in terms of mass. It is preferably included in a range, and more preferably in a range of 5 to 30%. When the structural unit having a graft chain is contained within this range, the dispersibility of the titanium nitride-containing particles is high, and the developability when forming a cured film is good.
 また、高分子化合物は、グラフト鎖を有する構造単位とは異なる(すなわち、グラフト鎖を有する構造単位には相当しない)疎水性構造単位を有することが好ましい。ただし、本発明において、疎水性構造単位は、酸基(例えば、カルボン酸基、スルホン酸基、リン酸基、フェノール性水酸基等)を有さない構造単位である。 Further, the polymer compound preferably has a hydrophobic structural unit different from the structural unit having a graft chain (that is, not corresponding to the structural unit having a graft chain). However, in the present invention, the hydrophobic structural unit is a structural unit having no acid group (for example, carboxylic acid group, sulfonic acid group, phosphoric acid group, phenolic hydroxyl group, etc.).
 疎水性構造単位は、好ましくは、ClogP値が1.2以上の化合物(モノマー)に由来する(対応する)構造単位であり、より好ましくは、ClogP値が1.2~8の化合物に由来する構造単位である。これにより、本発明の効果をより確実に発現することができる。 The hydrophobic structural unit is preferably a structural unit derived from (corresponding to) a compound (monomer) having a ClogP value of 1.2 or more, more preferably derived from a compound having a ClogP value of 1.2 to 8. A structural unit. Thereby, the effect of this invention can be expressed more reliably.
 ClogP値は、Daylight Chemical Information System, Inc.から入手できるプログラム“CLOGP”で計算された値である。このプログラムは、Hansch, Leoのフラグメントアプローチ(下記文献参照)により算出される“計算logP”の値を提供する。フラグメントアプローチは化合物の化学構造に基づいており、化学構造を部分構造(フラグメント)に分割し、そのフラグメントに対して割り当てられたlogP寄与分を合計することにより化合物のlogP値を推算している。その詳細は以下の文献に記載されている。本発明では、プログラムCLOGP v4.82により計算したClogP値を用いる。
 A. J. Leo, Comprehensive Medicinal Chemistry, Vol.4, C. Hansch, P. G. Sammnens, J. B. Taylor and C. A. Ramsden, Eds., p.295, Pergamon Press, 1990 C. Hansch & A. J. Leo. Substituent Constants For Correlation Analysis in Chemistry and Biology. John Wiley & Sons. A.J. Leo. Calculating logPoct from structure. Chem. Rev., 93, 1281-1306, 1993.
ClogP values are available from Daylight Chemical Information System, Inc. It is a value calculated by the program “CLOGP” available from This program provides the value of “computation logP” calculated by Hansch, Leo's fragment approach (see below). The fragment approach is based on the chemical structure of a compound, which divides the chemical structure into substructures (fragments) and estimates the logP value of the compound by summing the logP contributions assigned to that fragment. Details thereof are described in the following documents. In the present invention, the ClogP value calculated by the program CLOGP v4.82 is used.
A. J. et al. Leo, Comprehensive Medicinal Chemistry, Vol. 4, C.I. Hansch, P.A. G. Sammunens, J. et al. B. Taylor and C.M. A. Ramsden, Eds. , P. 295, Pergamon Press, 1990 C.I. Hansch & A. J. et al. Leo. Substituent Constants For Correlation Analysis in Chemistry and Biology. John Wiley & Sons. A. J. et al. Leo. Calculating logPoch from structure. Chem. Rev. , 93, 1281-1306, 1993.
 logPは、分配係数P(Partition Coefficient)の常用対数を意味し、ある有機化合物が油(一般的には1-オクタノール)と水の2相系の平衡でどのように分配されるかを定量的な数値として表す物性値であり、以下の式で示される。
  logP=log(Coil/Cwater)
 式中、Coilは油相中の化合物のモル濃度を、Cwaterは水相中の化合物のモル濃度を表す。
 logPの値が0をはさんでプラスに大きくなると油溶性が増し、マイナスで絶対値が大きくなると水溶性が増すことを意味し、有機化合物の水溶性と負の相関があり、有機化合物の親疎水性を見積るパラメータとして広く利用されている。
log P means the common logarithm of the partition coefficient P (Partition Coefficient), and quantitatively determines how an organic compound is distributed in the equilibrium of a two-phase system of oil (generally 1-octanol) and water. It is a physical property value expressed as a numerical value, and is represented by the following formula.
logP = log (Coil / Cwater)
In the formula, Coil represents the molar concentration of the compound in the oil phase, and Cwater represents the molar concentration of the compound in the aqueous phase.
When the logP value increases to a positive value across 0, the oil solubility increases. When the logP value increases to a negative value, the water solubility increases. There is a negative correlation with the water solubility of the organic compound. It is widely used as a parameter for estimating aqueous properties.
 高分子化合物は、疎水性構造単位として、下記一般式(i)~(iii)で表される単量体に由来の構造単位から選択された1種以上の構造単位を有することが好ましい。 The polymer compound preferably has one or more structural units selected from structural units derived from monomers represented by the following general formulas (i) to (iii) as hydrophobic structural units.
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 上記式(i)~(iii)中、R、R、およびRは、それぞれ独立に、水素原子、ハロゲン原子(例えば、フッ素、塩素、臭素等)、または炭素数が1~6のアルキル基(例えば、メチル基、エチル基、プロピル基等)を表す。
 R、R、およびRは、好ましくは水素原子、または炭素数が1~3のアルキル基であり、より好ましくは水素原子またはメチル基である。RおよびRは、水素原子であることが特に好ましい。
 Xは、酸素原子(-O-)またはイミノ基(-NH-)を表し、酸素原子であることが好ましい。
In the above formulas (i) to (iii), R 1 , R 2 , and R 3 are each independently a hydrogen atom, a halogen atom (for example, fluorine, chlorine, bromine, etc.), or a carbon number of 1 to 6 An alkyl group (for example, a methyl group, an ethyl group, a propyl group, etc.) is represented.
R 1 , R 2 , and R 3 are preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably a hydrogen atom or a methyl group. R 2 and R 3 are particularly preferably a hydrogen atom.
X represents an oxygen atom (—O—) or an imino group (—NH—), and is preferably an oxygen atom.
 Lは、単結合または2価の連結基である。2価の連結基としては、2価の脂肪族基(例えば、アルキレン基、置換アルキレン基、アルケニレン基、置換アルケニレン基、アルキニレン基、置換アルキニレン基)、2価の芳香族基(例えば、アリーレン基、置換アリーレン基)、2価の複素環基、酸素原子(-O-)、硫黄原子(-S-)、イミノ基(-NH-)、置換イミノ基(-NR31-、ここでR31は脂肪族基、芳香族基または複素環基)、カルボニル基(-CO-)、および、これらの組合せ等が挙げられる。 L is a single bond or a divalent linking group. As the divalent linking group, a divalent aliphatic group (for example, alkylene group, substituted alkylene group, alkenylene group, substituted alkenylene group, alkynylene group, substituted alkynylene group), divalent aromatic group (for example, arylene group) , Substituted arylene group), divalent heterocyclic group, oxygen atom (—O—), sulfur atom (—S—), imino group (—NH—), substituted imino group (—NR 31 —, where R 31 Includes an aliphatic group, an aromatic group or a heterocyclic group), a carbonyl group (—CO—), and combinations thereof.
 2価の脂肪族基は、環状構造または分岐構造を有していてもよい。脂肪族基の炭素数は、1~20が好ましく、1~15がより好ましく、1~10がさらに好ましい。脂肪族基は不飽和脂肪族基であっても飽和脂肪族基であってもよいが、飽和脂肪族基であることが好ましい。また、脂肪族基は、置換基を有していてもよい。置換基の例は、ハロゲン原子、芳香族基および複素環基等が挙げられる。 The divalent aliphatic group may have a cyclic structure or a branched structure. The aliphatic group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 10 carbon atoms. The aliphatic group may be an unsaturated aliphatic group or a saturated aliphatic group, but is preferably a saturated aliphatic group. Further, the aliphatic group may have a substituent. Examples of the substituent include a halogen atom, an aromatic group and a heterocyclic group.
 2価の芳香族基の炭素数は、6~20が好ましく、6~15がより好ましく、6~10がさらに好ましい。また、芳香族基は置換基を有していてもよい。置換基の例は、ハロゲン原子、脂肪族基、芳香族基および複素環基等が挙げられる。 The carbon number of the divalent aromatic group is preferably 6 to 20, more preferably 6 to 15, and still more preferably 6 to 10. The aromatic group may have a substituent. Examples of the substituent include a halogen atom, an aliphatic group, an aromatic group, and a heterocyclic group.
 2価の複素環基は、複素環として5員環または6員環を有することが好ましい。複素環に他の複素環、脂肪族環または芳香族環が縮合していてもよい。また、複素環基は置換基を有していてもよい。置換基の例としては、ハロゲン原子、ヒドロキシ基、オキソ基(=O)、チオキソ基(=S)、イミノ基(=NH)、置換イミノ基(=N-R32、ここでR32は脂肪族基、芳香族基または複素環基)、脂肪族基、芳香族基、および、複素環基が挙げられる。 The divalent heterocyclic group preferably has a 5-membered or 6-membered ring as the heterocycle. The heterocycle may be condensed with another heterocycle, aliphatic ring or aromatic ring. Further, the heterocyclic group may have a substituent. Examples of substituents include halogen atoms, hydroxy groups, oxo groups (═O), thioxo groups (═S), imino groups (═NH), substituted imino groups (═N—R 32 , where R 32 is a fatty acid Aromatic group, aromatic group or heterocyclic group), aliphatic group, aromatic group, and heterocyclic group.
 Lは、単結合、アルキレン基またはオキシアルキレン構造を含む2価の連結基であることが好ましい。オキシアルキレン構造は、オキシエチレン構造またはオキシプロピレン構造であることがより好ましい。また、Lは、オキシアルキレン構造を2以上繰り返して含むポリオキシアルキレン構造を含んでいてもよい。ポリオキシアルキレン構造としては、ポリオキシエチレン構造またはポリオキシプロピレン構造が好ましい。ポリオキシエチレン構造は、-(OCHCH)n-で表され、nは、2以上の整数が好ましく、2~10の整数であることがより好ましい。 L is preferably a single bond, an alkylene group or a divalent linking group containing an oxyalkylene structure. The oxyalkylene structure is more preferably an oxyethylene structure or an oxypropylene structure. L may contain a polyoxyalkylene structure containing two or more oxyalkylene structures. The polyoxyalkylene structure is preferably a polyoxyethylene structure or a polyoxypropylene structure. The polyoxyethylene structure is represented by — (OCH 2 CH 2 ) n—, where n is preferably an integer of 2 or more, and more preferably an integer of 2 to 10.
 Zとしては、脂肪族基(例えば、アルキル基、置換アルキル基、不飽和アルキル基、置換不飽和アルキル基、)、芳香族基(例えば、アリール基、置換アリール基、アリーレン基、置換アリーレン基)、複素環基、および、これらの組み合わせが挙げられる。これらの基には、酸素原子(-O-)、硫黄原子(-S-)、イミノ基(-NH-)、置換イミノ基(-NR31-、ここでR31は脂肪族基、芳香族基または複素環基)、または、カルボニル基(-CO-)が含まれていてもよい。 Z is an aliphatic group (eg, alkyl group, substituted alkyl group, unsaturated alkyl group, substituted unsaturated alkyl group), aromatic group (eg, aryl group, substituted aryl group, arylene group, substituted arylene group). , Heterocyclic groups, and combinations thereof. These groups include an oxygen atom (—O—), a sulfur atom (—S—), an imino group (—NH—), a substituted imino group (—NR 31 —, wherein R 31 is an aliphatic group, an aromatic group Group or heterocyclic group) or a carbonyl group (—CO—) may be contained.
 脂肪族基は、環状構造または分岐構造を有していてもよい。脂肪族基の炭素数は、1~20が好ましく、1~15がより好ましく、1~10がさらに好ましい。脂肪族基には、さらに環集合炭化水素基、架橋環式炭化水素基が含まれ、環集合炭化水素基の例としては、ビシクロヘキシル基、パーヒドロナフタレニル基、ビフェニル基、および、4-シクロヘキシルフェニル基等が含まれる。架橋環式炭化水素環として、例えば、ピナン、ボルナン、ノルピナン、ノルボルナン、および、ビシクロオクタン環(ビシクロ[2.2.2]オクタン環、ビシクロ[3.2.1]オクタン環等)等の2環式炭化水素環、ホモブレダン、アダマンタン、トリシクロ[5.2.1.02,6]デカン、および、トリシクロ[4.3.1.12,5]ウンデカン環等の3環式炭化水素環、テトラシクロ[4.4.0.12,5.17,10]ドデカン、および、パーヒドロ-1,4-メタノ-5,8-メタノナフタレン環等の4環式炭化水素環等が挙げられる。また、架橋環式炭化水素環には、縮合環式炭化水素環、例えば、パーヒドロナフタレン(デカリン)、パーヒドロアントラセン、パーヒドロフェナントレン、パーヒドロアセナフテン、パーヒドロフルオレン、パーヒドロインデン、および、パーヒドロフェナレン環等の5~8員シクロアルカン環が複数個縮合した縮合環も含まれる。
 脂肪族基は不飽和脂肪族基よりも飽和脂肪族基の方が好ましい。また、脂肪族基は、置換基を有していてもよい。置換基の例は、ハロゲン原子、芳香族基および複素環基が挙げられる。ただし、脂肪族基は、置換基として酸基を有さない。
The aliphatic group may have a cyclic structure or a branched structure. The aliphatic group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 10 carbon atoms. The aliphatic group further includes a ring assembly hydrocarbon group and a bridged cyclic hydrocarbon group. Examples of the ring assembly hydrocarbon group include a bicyclohexyl group, a perhydronaphthalenyl group, a biphenyl group, and 4 -A cyclohexylphenyl group and the like are included. Examples of the bridged cyclic hydrocarbon ring include 2 such as pinane, bornane, norpinane, norbornane, and bicyclooctane ring (bicyclo [2.2.2] octane ring, bicyclo [3.2.1] octane ring, etc.). Tricyclic hydrocarbon rings such as cyclic hydrocarbon rings, homobredan, adamantane, tricyclo [5.2.1.0 2,6 ] decane, and tricyclo [4.3.1.1 2,5 ] undecane rings , Tetracyclo [4.4.0.1 2,5 . 1 7,10 ] dodecane, and tetracyclic hydrocarbon rings such as perhydro-1,4-methano-5,8-methanonaphthalene ring. The bridged cyclic hydrocarbon ring also includes a condensed cyclic hydrocarbon ring such as perhydronaphthalene (decalin), perhydroanthracene, perhydrophenanthrene, perhydroacenaphthene, perhydrofluorene, perhydroindene, and A condensed ring formed by condensing a plurality of 5- to 8-membered cycloalkane rings such as a perhydrophenalene ring is also included.
The aliphatic group is preferably a saturated aliphatic group rather than an unsaturated aliphatic group. Further, the aliphatic group may have a substituent. Examples of the substituent include a halogen atom, an aromatic group, and a heterocyclic group. However, the aliphatic group does not have an acid group as a substituent.
 芳香族基の炭素数は、6~20が好ましく、6~15がより好ましく、6~10がさらに好ましい。また、芳香族基は置換基を有していてもよい。置換基の例は、ハロゲン原子、脂肪族基、芳香族基および複素環基が挙げられる。ただし、芳香族基は、置換基として酸基を有さない。 The carbon number of the aromatic group is preferably 6 to 20, more preferably 6 to 15, and further preferably 6 to 10. The aromatic group may have a substituent. Examples of the substituent include a halogen atom, an aliphatic group, an aromatic group, and a heterocyclic group. However, the aromatic group does not have an acid group as a substituent.
 複素環基は、複素環として5員環または6員環を有することが好ましい。複素環に他の複素環、脂肪族環または芳香族環が縮合していてもよい。また、複素環基は置換基を有していてもよい。置換基の例としては、ハロゲン原子、ヒドロキシ基、オキソ基(=O)、チオキソ基(=S)、イミノ基(=NH)、置換イミノ基(=N-R32、ここでR32は脂肪族基、芳香族基または複素環基)、脂肪族基、芳香族基および複素環基が挙げられる。ただし、複素環基は、置換基として酸基を有さない。 The heterocyclic group preferably has a 5-membered or 6-membered ring as the heterocycle. The heterocycle may be condensed with another heterocycle, aliphatic ring or aromatic ring. Further, the heterocyclic group may have a substituent. Examples of substituents include halogen atoms, hydroxy groups, oxo groups (═O), thioxo groups (═S), imino groups (═NH), substituted imino groups (═N—R 32 , where R 32 is a fatty acid Aromatic group, aromatic group or heterocyclic group), aliphatic group, aromatic group and heterocyclic group. However, the heterocyclic group does not have an acid group as a substituent.
 上記式(iii)中、R、R、およびRは、それぞれ独立に、水素原子、ハロゲン原子(例えば、フッ素、塩素、臭素等)、炭素数が1~6のアルキル基(例えば、メチル基、エチル基、プロピル基等)、Z、またはL-Zを表す。ここでLおよびZは、上記におけるものと同義である。R、R、およびRとしては、水素原子、または炭素数が1~3のアルキル基が好ましく、水素原子がより好ましい。 In the above formula (iii), R 4 , R 5 , and R 6 are each independently a hydrogen atom, a halogen atom (eg, fluorine, chlorine, bromine, etc.), an alkyl group having 1 to 6 carbon atoms (eg, Methyl group, ethyl group, propyl group, etc.), Z, or LZ. Here, L and Z are as defined above. R 4 , R 5 and R 6 are preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably a hydrogen atom.
 本発明においては、上記一般式(i)で表される単量体として、R、R、およびRが水素原子またはメチル基であって、Lが単結合またはアルキレン基もしくはオキシアルキレン構造を含む2価の連結基であって、Xが酸素原子またはイミノ基であって、Zが脂肪族基、複素環基または芳香族基である化合物が好ましい。
 また、上記一般式(ii)で表される単量体として、Rが水素原子またはメチル基であって、Lがアルキレン基であって、Zが脂肪族基、複素環基または芳香族基である化合物が好ましい。また、上記一般式(iii)で表される単量体として、R、R、およびRが水素原子またはメチル基であって、Zが脂肪族基、複素環基または芳香族基である化合物が好ましい。
In the present invention, as the monomer represented by the general formula (i), R 1 , R 2 , and R 3 are a hydrogen atom or a methyl group, and L is a single bond, an alkylene group, or an oxyalkylene structure. A compound in which X is an oxygen atom or an imino group and Z is an aliphatic group, a heterocyclic group or an aromatic group is preferable.
Further, as the monomer represented by the general formula (ii), R 1 is a hydrogen atom or a methyl group, L is an alkylene group, and Z is an aliphatic group, a heterocyclic group or an aromatic group. Is preferred. As the monomer represented by the general formula (iii), R 4 , R 5 , and R 6 are a hydrogen atom or a methyl group, and Z is an aliphatic group, a heterocyclic group, or an aromatic group. Certain compounds are preferred.
 式(i)~(iii)で表される代表的な化合物の例としては、アクリル酸エステル類、メタクリル酸エステル類、および、スチレン類等から選ばれるラジカル重合性化合物が挙げられる。
 なお、式(i)~(iii)で表される代表的な化合物の例としては、特開2013-249417号公報の段落0089~0093に記載の化合物を参照でき、これらの内容は本明細書に組み込まれる。
Examples of typical compounds represented by formulas (i) to (iii) include radically polymerizable compounds selected from acrylic acid esters, methacrylic acid esters, styrenes, and the like.
As examples of typical compounds represented by formulas (i) to (iii), compounds described in paragraphs 0089 to 0093 of JP2013-249417A can be referred to, and the contents thereof are described in the present specification. Incorporated into.
 高分子化合物において、疎水性構造単位は、質量換算で、高分子化合物の総質量に対し10~90%の範囲で含まれることが好ましく、20~80%の範囲で含まれることがより好ましい。含有量が上記範囲において十分なパターン形成が得られる。 In the polymer compound, the hydrophobic structural unit is preferably contained in a range of 10 to 90%, more preferably in a range of 20 to 80% with respect to the total mass of the polymer compound in terms of mass. When the content is in the above range, sufficient pattern formation can be obtained.
 高分子化合物は、チタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基を導入することができる。ここで、高分子化合物は、チタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基を有する構造単位をさらに有することが好ましい。
 このチタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基としては、例えば、酸基、塩基性基、配位性基、および、反応性を有する官能基等が挙げられる。
 高分子化合物が、酸基、塩基性基、配位性基、または、反応性を有する官能基を有する場合、それぞれ、酸基を有する構造単位、塩基性基を有する構造単位、配位性基を有する構造単位、または、反応性を有する構造単位を有することが好ましい。
 特に、高分子化合物が、さらに、酸基として、カルボン酸基等のアルカリ可溶性基を有することで、高分子化合物に、アルカリ現像によるパターン形成のための現像性を付与することができる。
 すなわち、高分子化合物にアルカリ可溶性基を導入することで、本発明の組成物は、チタン窒化物含有粒子等の顔料の分散に寄与する分散剤としての高分子化合物がアルカリ可溶性を有することになる。このような高分子化合物を含有する組成物は、露光部の遮光性に優れたものとなり、且つ、未露光部のアルカリ現像性が向上される。
 また、高分子化合物が酸基を有する構造単位を有することにより、高分子化合物が溶剤となじみやすくなり、塗布性も向上する傾向となる。
 これは、酸基を有する構造単位における酸基がチタン窒化物含有粒子等の顔料と相互作用しやすく、高分子化合物がチタン窒化物含有粒子等の顔料を安定的に分散すると共に、チタン窒化物含有粒子等の顔料を分散する高分子化合物の粘度が低くなっており、高分子化合物自体も安定的に分散されやすいためであると推測される。
The polymer compound can introduce a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles. Here, the polymer compound preferably further has a structural unit having a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles.
Examples of the functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles include an acid group, a basic group, a coordinating group, and a reactive functional group.
When the polymer compound has an acid group, a basic group, a coordinating group, or a reactive functional group, the structural unit having an acid group, the structural unit having a basic group, or a coordinating group, respectively. It is preferable to have a structural unit having or a reactive structural unit.
In particular, when the polymer compound further has an alkali-soluble group such as a carboxylic acid group as the acid group, it is possible to impart developability for pattern formation by alkali development to the polymer compound.
That is, by introducing an alkali-soluble group into the polymer compound, the composition of the present invention has a polymer compound as a dispersant that contributes to dispersion of pigments such as titanium nitride-containing particles having alkali solubility. . A composition containing such a polymer compound has excellent light-shielding properties in the exposed area, and the alkali developability in the unexposed area is improved.
Moreover, when a high molecular compound has a structural unit which has an acid group, it becomes easy for a high molecular compound to become compatible with a solvent, and it exists in the tendency for applicability | paintability to improve.
This is because the acid group in the structural unit having an acid group easily interacts with the pigment such as titanium nitride-containing particles, and the polymer compound stably disperses the pigment such as titanium nitride-containing particles, and the titanium nitride This is presumably because the viscosity of the polymer compound in which the pigment such as the contained particles is dispersed is low, and the polymer compound itself is easily dispersed stably.
 ただし、酸基としてのアルカリ可溶性基を有する構造単位は、上記したグラフト鎖を有する構造単位と同一の構造単位であっても、異なる構造単位であってもよいが、酸基としてのアルカリ可溶性基を有する構造単位は、上記した疎水性構造単位とは異なる構造単位である(すなわち、上記した疎水性構造単位には相当しない)。 However, the structural unit having an alkali-soluble group as an acid group may be the same structural unit as the above-described structural unit having a graft chain or a different structural unit. Is a structural unit different from the hydrophobic structural unit described above (that is, does not correspond to the hydrophobic structural unit described above).
 チタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基である酸基としては、例えば、カルボン酸基、スルホン酸基、リン酸基、または、フェノール性水酸基等があり、好ましくは、カルボン酸基、スルホン酸基、および、リン酸基のうち少なくとも1種であり、特に好ましいものは、チタン窒化物含有粒子等の顔料への吸着力が良好で、且つ、顔料の分散性が高い点で、カルボン酸基である。
 すなわち、高分子化合物は、カルボン酸基、スルホン酸基、および、リン酸基のうち少なくとも1種を有する構造単位をさらに有することが好ましい。
Examples of the acid group that is a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles include a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, or a phenolic hydroxyl group. At least one of a carboxylic acid group, a sulfonic acid group, and a phosphoric acid group, and particularly preferable ones have good adsorption power to pigments such as titanium nitride-containing particles and have high pigment dispersibility. In terms, it is a carboxylic acid group.
That is, the polymer compound preferably further has a structural unit having at least one of a carboxylic acid group, a sulfonic acid group, and a phosphoric acid group.
 高分子化合物は、酸基を有する構造単位を1種または2種以上有してもよい。
 高分子化合物は、酸基を有する構造単位を含有してもしなくてもよいが、含有する場合、酸基を有する構造単位の含有量は、質量換算で、高分子化合物の総質量に対して、好ましくは5~80%であり、より好ましくは、アルカリ現像による画像強度のダメージ抑制という観点から、10~60%である。
The polymer compound may have one or more structural units having an acid group.
The polymer compound may or may not contain a structural unit having an acid group. However, when it is contained, the content of the structural unit having an acid group is based on the total mass of the polymer compound in terms of mass. Preferably, it is 5 to 80%, and more preferably 10 to 60% from the viewpoint of suppressing damage of image strength due to alkali development.
 チタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基である塩基性基としては、例えば、第1級アミノ基、第2級アミノ基、第3級アミノ基、N原子を含むヘテロ環、および、アミド基等があり、好ましいものは、チタン窒化物含有粒子等の顔料への吸着力が良好で、且つ、顔料の分散性が高い点で、第3級アミノ基である。高分子化合物は、これらの塩基性基を1種或いは2種以上、有することができる。
 高分子化合物は、塩基性基を有する構造単位を含有してもしなくてもよいが、含有する場合、塩基性基を有する構造単位の含有量は、質量換算で、高分子化合物の総質量に対して、好ましくは0.01%以上50%以下であり、より好ましくは、現像性阻害抑制という観点から、0.01%以上30%以下である。
Examples of the basic group which is a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles include a primary amino group, a secondary amino group, a tertiary amino group, and a hetero group including an N atom. There are a ring, an amide group, and the like, and a preferable one is a tertiary amino group from the viewpoint of good adsorption power to pigments such as titanium nitride-containing particles and high dispersibility of the pigments. The polymer compound can have one or more of these basic groups.
The polymer compound may or may not contain a structural unit having a basic group, but when it is contained, the content of the structural unit having a basic group is calculated by mass conversion to the total mass of the polymer compound. On the other hand, it is preferably 0.01% or more and 50% or less, and more preferably 0.01% or more and 30% or less from the viewpoint of suppression of developability inhibition.
 チタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基である配位性基、および反応性を有する官能基としては、例えば、アセチルアセトキシ基、トリアルコキシシリル基、イソシアネート基、酸無水物、および、酸塩化物等が挙げられる。好ましいものは、チタン窒化物含有粒子等の顔料への吸着力が良好で、顔料の分散性が高い点で、アセチルアセトキシ基である。高分子化合物は、これらの基を1種または2種以上有してもよい。
 高分子化合物は、配位性基を有する構造単位、または、反応性を有する官能基を有する構造単位を含有してもしなくてもよいが、含有する場合、これらの構造単位の含有量は、質量換算で、高分子化合物の総質量に対して、好ましくは10%以上80%以下であり、より好ましくは、現像性阻害抑制という観点から、20%以上60%以下である。
Examples of the coordinating group, which is a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles, and the reactive functional group include acetylacetoxy group, trialkoxysilyl group, isocyanate group, and acid anhydride And acid chlorides. Preferable one is an acetylacetoxy group in that the adsorbing power to the pigment such as titanium nitride-containing particles is good and the dispersibility of the pigment is high. The polymer compound may have one or more of these groups.
The polymer compound may or may not contain a structural unit having a coordinating group or a structural unit having a reactive functional group, but when it is contained, the content of these structural units is: In terms of mass, it is preferably 10% or more and 80% or less, and more preferably 20% or more and 60% or less from the viewpoint of inhibition of developability inhibition with respect to the total mass of the polymer compound.
 本発明における高分子化合物が、グラフト鎖以外に、チタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基を有する場合、上述したような、各種のチタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基を含有していればよく、これらの官能基がどのように導入されているかは特に限定はされないが、高分子化合物は、下記一般式(iv)~(vi)で表される単量体に由来の構造単位から選択された1種以上の構造単位を有することが好ましい。 When the polymer compound in the present invention has a functional group capable of interacting with a pigment such as titanium nitride-containing particles in addition to the graft chain, the pigments such as various titanium nitride-containing particles as described above, It is only necessary to contain functional groups capable of forming an interaction, and how these functional groups are introduced is not particularly limited, but the polymer compounds are represented by the following general formulas (iv) to (vi). It is preferable to have one or more structural units selected from structural units derived from the monomer represented by:
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 一般式(iv)~一般式(vi)中、R11、R12、およびR13は、それぞれ独立に、水素原子、ハロゲン原子(例えば、フッ素原子、塩素原子、臭素原子等)、または炭素数が1~6のアルキル基(例えば、メチル基、エチル基、プロピル基等)を表す。
 一般式(iv)~一般式(vi)中、R11、R12、およびR13は、好ましくは、それぞれ独立に水素原子、または炭素数が1~3のアルキル基であり、より好ましくは、それぞれ独立に水素原子またはメチル基である。一般式(iv)中、R12およびR13は、それぞれ水素原子であることが特に好ましい。
In general formula (iv) to general formula (vi), R 11 , R 12 , and R 13 each independently represent a hydrogen atom, a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.), or a carbon number Represents an alkyl group of 1 to 6 (for example, methyl group, ethyl group, propyl group, etc.).
In general formula (iv) to general formula (vi), R 11 , R 12 , and R 13 are preferably each independently a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably Each independently represents a hydrogen atom or a methyl group. In general formula (iv), R 12 and R 13 are each particularly preferably a hydrogen atom.
 一般式(iv)中のXは、酸素原子(-O-)またはイミノ基(-NH-)を表し、酸素原子であることが好ましい。
 また、一般式(v)中のYは、メチン基または窒素原子を表す。
X 1 in the general formula (iv) represents an oxygen atom (—O—) or an imino group (—NH—), and is preferably an oxygen atom.
Y in the general formula (v) represents a methine group or a nitrogen atom.
 また、一般式(iv)~一般式(v)中のLは、単結合または2価の連結基を表す。2価の連結基の例としては、2価の脂肪族基(例えば、アルキレン基、置換アルキレン基、アルケニレン基、置換アルケニレン基、アルキニレン基、および置換アルキニレン基)、2価の芳香族基(例えば、アリーレン基、および置換アリーレン基)、2価の複素環基、酸素原子(-O-)、硫黄原子(-S-)、イミノ基(-NH-)、置換イミノ結合(-NR31’-、ここでR31’は脂肪族基、芳香族基または複素環基)、カルボニル結合(-CO-)、および、これらの組合せ等が挙げられる。 In the general formulas (iv) to (v), L 1 represents a single bond or a divalent linking group. Examples of the divalent linking group include a divalent aliphatic group (for example, an alkylene group, a substituted alkylene group, an alkenylene group, a substituted alkenylene group, an alkynylene group, and a substituted alkynylene group), a divalent aromatic group (for example, , Arylene groups, and substituted arylene groups), divalent heterocyclic groups, oxygen atoms (—O—), sulfur atoms (—S—), imino groups (—NH—), substituted imino bonds (—NR 31 ′ — Here, R 31 ′ includes an aliphatic group, an aromatic group or a heterocyclic group), a carbonyl bond (—CO—), and combinations thereof.
 2価の脂肪族基は、環状構造または分岐構造を有していてもよい。脂肪族基の炭素数は、1~20が好ましく、1~15がより好ましく、1~10がさらに好ましい。脂肪族基は不飽和脂肪族基よりも飽和脂肪族基の方が好ましい。また、脂肪族基は、置換基を有していてもよい。置換基の例としては、ハロゲン原子、ヒドロキシル基、芳香族基および複素環基が挙げられる。 The divalent aliphatic group may have a cyclic structure or a branched structure. The aliphatic group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 10 carbon atoms. The aliphatic group is preferably a saturated aliphatic group rather than an unsaturated aliphatic group. Further, the aliphatic group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, an aromatic group, and a heterocyclic group.
 2価の芳香族基の炭素数は、6~20が好ましく、6~15がさらに好ましく、6~10が最も好ましい。また、芳香族基は置換基を有していてもよい。置換基の例は、ハロゲン原子、ヒドロキシル基、脂肪族基、芳香族基および複素環基が挙げられる。 The number of carbon atoms of the divalent aromatic group is preferably 6 to 20, more preferably 6 to 15, and most preferably 6 to 10. The aromatic group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, an aliphatic group, an aromatic group, and a heterocyclic group.
 2価の複素環基は、複素環として5員環または6員環を有することが好ましい。複素環に他の複素環、脂肪族環または芳香族環のうち1つ以上が縮合していてもよい。また、複素環基は置換基を有していてもよい。置換基の例としては、ハロゲン原子、ヒドロキシ基、オキソ基(=O)、チオキソ基(=S)、イミノ基(=NH)、置換イミノ基(=N-R32、ここでR32は脂肪族基、芳香族基または複素環基)、脂肪族基、芳香族基および複素環基が挙げられる。 The divalent heterocyclic group preferably has a 5-membered or 6-membered ring as the heterocycle. One or more heterocycles, aliphatic rings or aromatic rings may be condensed with the heterocycle. Further, the heterocyclic group may have a substituent. Examples of substituents include halogen atoms, hydroxy groups, oxo groups (═O), thioxo groups (═S), imino groups (═NH), substituted imino groups (═N—R 32 , where R 32 is a fatty acid Aromatic group, aromatic group or heterocyclic group), aliphatic group, aromatic group and heterocyclic group.
 Lは、単結合、アルキレン基またはオキシアルキレン構造を含む2価の連結基であることが好ましい。オキシアルキレン構造は、オキシエチレン構造またはオキシプロピレン構造であることがより好ましい。また、Lは、オキシアルキレン構造を2以上繰り返して含むポリオキシアルキレン構造を含んでいてもよい。ポリオキシアルキレン構造としては、ポリオキシエチレン構造またはポリオキシプロピレン構造が好ましい。ポリオキシエチレン構造は、-(OCHCH)n-で表され、nは、2以上の整数が好ましく、2~10の整数であることがより好ましい。 L 1 is preferably a single bond, an alkylene group or a divalent linking group containing an oxyalkylene structure. The oxyalkylene structure is more preferably an oxyethylene structure or an oxypropylene structure. L 1 may contain a polyoxyalkylene structure containing two or more oxyalkylene structures. The polyoxyalkylene structure is preferably a polyoxyethylene structure or a polyoxypropylene structure. The polyoxyethylene structure is represented by — (OCH 2 CH 2 ) n—, where n is preferably an integer of 2 or more, and more preferably an integer of 2 to 10.
 一般式(iv)~一般式(vi)中、Zは、グラフト鎖以外にチタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基を表し、カルボン酸基、および、第三級アミノ基であることが好ましく、カルボン酸基であることがより好ましい。 In the general formula (iv) to general formula (vi), Z 1 represents a functional group capable of forming an interaction with a pigment such as titanium nitride-containing particles in addition to the graft chain, and includes a carboxylic acid group and a tertiary group. An amino group is preferred, and a carboxylic acid group is more preferred.
 一般式(vi)中、R14、R15、およびR16は、それぞれ独立に、水素原子、ハロゲン原子(例えば、フッ素原子、塩素原子、臭素原子等)、炭素数が1~6のアルキル基(例えば、メチル基、エチル基、プロピル基等)、-Z、またはL-Zを表す。ここでLおよびZは、上記におけるLおよびZと同義であり、好ましい例も同様である。R14、R15、およびR16としては、それぞれ独立に水素原子、または炭素数が1~3のアルキル基が好ましく、水素原子がより好ましい。 In general formula (vi), R 14 , R 15 , and R 16 are each independently a hydrogen atom, a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.), or an alkyl group having 1 to 6 carbon atoms. (e.g., methyl group, ethyl group, propyl group, etc.), - represents a Z 1 or L 1 -Z 1,. Wherein L 1 and Z 1 has the same meaning as L 1 and Z 1 in the above, are the preferable examples. R 14 , R 15 and R 16 are each independently preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably a hydrogen atom.
 本発明においては、一般式(iv)で表される単量体として、R11、R12、およびR13がそれぞれ独立に水素原子またはメチル基であって、Lがアルキレン基またはオキシアルキレン構造を含む2価の連結基であって、Xが酸素原子またはイミノ基であって、Zがカルボン酸基である化合物が好ましい。
 また、一般式(v)で表される単量体として、R11が水素原子またはメチル基であって、Lがアルキレン基であって、Zがカルボン酸基であって、Yがメチン基である化合物が好ましい。
 さらに、一般式(vi)で表される単量体として、R14、R15、およびR16がそれぞれ独立に水素原子またはメチル基であって、Lが単結合またはアルキレン基であって、Zがカルボン酸基である化合物が好ましい。
In the present invention, as the monomer represented by the general formula (iv), R 11 , R 12 , and R 13 are each independently a hydrogen atom or a methyl group, and L 1 is an alkylene group or an oxyalkylene structure. A compound in which X 1 is an oxygen atom or an imino group and Z 1 is a carboxylic acid group is preferable.
In addition, as a monomer represented by the general formula (v), R 11 is a hydrogen atom or a methyl group, L 1 is an alkylene group, Z 1 is a carboxylic acid group, and Y is methine. Compounds that are groups are preferred.
Furthermore, as the monomer represented by the general formula (vi), R 14 , R 15 , and R 16 are each independently a hydrogen atom or a methyl group, and L 1 is a single bond or an alkylene group, A compound in which Z is a carboxylic acid group is preferred.
 以下に、一般式(iv)~一般式(vi)で表される単量体(化合物)の代表的な例を示す。
 単量体の例としては、メタクリル酸、クロトン酸、イソクロトン酸、分子内に付加重合性二重結合および水酸基を有する化合物(例えば、メタクリル酸2-ヒドロキシエチル)とコハク酸無水物との反応物、分子内に付加重合性二重結合および水酸基を有する化合物とフタル酸無水物との反応物、分子内に付加重合性二重結合および水酸基を有する化合物とテトラヒドロキシフタル酸無水物との反応物、分子内に付加重合性二重結合および水酸基を有する化合物と無水トリメリット酸との反応物、分子内に付加重合性二重結合および水酸基を有する化合物とピロメリット酸無水物との反応物、アクリル酸、アクリル酸ダイマー、アクリル酸オリゴマー、マレイン酸、イタコン酸、フマル酸、4-ビニル安息香酸、ビニルフェノール、および、4-ヒドロキシフェニルメタクリルアミド等が挙げられる。
The following are typical examples of monomers (compounds) represented by general formula (iv) to general formula (vi).
Examples of monomers include methacrylic acid, crotonic acid, isocrotonic acid, a reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule (for example, 2-hydroxyethyl methacrylate) and succinic anhydride. , A reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule and a phthalic anhydride, a reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule and a tetrahydroxyphthalic anhydride , A reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule and trimellitic anhydride, a reaction product of a compound having an addition polymerizable double bond and a hydroxyl group in the molecule and pyromellitic anhydride, Acrylic acid, acrylic acid dimer, acrylic acid oligomer, maleic acid, itaconic acid, fumaric acid, 4-vinylbenzoic acid, vinylphenol, and - hydroxyphenyl methacrylamide.
 チタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基を有する構造単位の含有量は、チタン窒化物含有粒子等の顔料との相互作用、分散安定性、および現像液への浸透性の観点から、高分子化合物の全質量に対して、0.05質量%~90質量%が好ましく、1.0質量%~80質量%がより好ましく、10質量%~70質量%がさらに好ましい。 The content of structural units having functional groups capable of interacting with pigments such as titanium nitride-containing particles, the interaction with pigments such as titanium nitride-containing particles, dispersion stability, and permeability to developer From this viewpoint, it is preferably 0.05% by mass to 90% by mass, more preferably 1.0% by mass to 80% by mass, and still more preferably 10% by mass to 70% by mass with respect to the total mass of the polymer compound.
 さらに、高分子化合物は、画像強度等の諸性能を向上する目的で、本発明の効果を損なわない限りにおいて、グラフト鎖を有する構造単位、疎水性構造単位、および、チタン窒化物含有粒子等の顔料と相互作用を形成しうる官能基を有する構造単位とは異なる、種々の機能を有する他の構造単位(例えば、分散物に用いられる分散媒との親和性を有する官能基等を有する構造単位)をさらに有していてもよい。
 このような、他の構造単位としては、例えば、アクリロニトリル類、および、メタクリロニトリル類等から選ばれるラジカル重合性化合物に由来の構造単位が挙げられる。
 高分子化合物は、これらの他の構造単位を1種或いは2種以上用いることができ、その含有量は、質量換算で、高分子化合物の総質量に対して、好ましくは0%以上80%以下であり、特に好ましくは、10%以上60%以下である。含有量が上記範囲において、十分なパターン形成性が維持される。
Furthermore, for the purpose of improving various performances such as image strength, the polymer compound is a structural unit having a graft chain, a hydrophobic structural unit, a titanium nitride-containing particle, etc., as long as the effects of the present invention are not impaired. Different from the structural unit having a functional group capable of interacting with the pigment, other structural unit having various functions (for example, a structural unit having a functional group having affinity with the dispersion medium used in the dispersion) ) May further be included.
Examples of such other structural units include structural units derived from radically polymerizable compounds selected from acrylonitriles, methacrylonitriles, and the like.
The polymer compound may use one or more of these other structural units, and the content thereof is preferably 0% or more and 80% or less in terms of mass with respect to the total mass of the polymer compound. Especially preferably, it is 10% or more and 60% or less. When the content is in the above range, sufficient pattern formability is maintained.
 高分子化合物の酸価は、0mgKOH/g以上160mgKOH/g以下の範囲であることが好ましく、より好ましくは10mgKOH/g以上140mgKOH/g以下の範囲であり、さらに好ましくは20mgKOH/g以上120mgKOH/g以下の範囲である。
 高分子化合物の酸価が160mgKOH/g以下であれば、硬化膜を形成する際の現像時におけるパターン剥離がより効果的に抑えられる。また、高分子化合物の酸価が10mgKOH/g以上であればアルカリ現像性がより良好となる。また、高分子化合物の酸価が20mgKOH/g以上であれば、チタン窒化物含有粒子等の顔料の沈降をより抑制でき、粗大粒子数をより少なくすることができ、組成物の経時安定性をより向上できる。
The acid value of the polymer compound is preferably in the range of 0 mgKOH / g to 160 mgKOH / g, more preferably in the range of 10 mgKOH / g to 140 mgKOH / g, and still more preferably in the range of 20 mgKOH / g to 120 mgKOH / g. The range is as follows.
When the acid value of the polymer compound is 160 mgKOH / g or less, pattern peeling during development when forming a cured film is more effectively suppressed. Moreover, if the acid value of a high molecular compound is 10 mgKOH / g or more, alkali developability will become more favorable. Further, if the acid value of the polymer compound is 20 mgKOH / g or more, precipitation of pigments such as titanium nitride-containing particles can be further suppressed, the number of coarse particles can be reduced, and the stability of the composition over time can be reduced. It can be improved.
 本発明において、高分子化合物の酸価は、例えば、高分子化合物中における酸基の平均含有量から算出することができる。また、高分子化合物の構成成分である酸基を含有する構造単位の含有量を変化させることで所望の酸価を有する樹脂を得ることができる。 In the present invention, the acid value of the polymer compound can be calculated, for example, from the average content of acid groups in the polymer compound. Moreover, the resin which has a desired acid value can be obtained by changing content of the structural unit containing the acid group which is a structural component of a high molecular compound.
 本発明における高分子化合物の重量平均分子量は、硬化膜を形成する際において、現像時のパターン剥離抑制と現像性の観点から、GPC(ゲル浸透クロマトグラフィー)法によるポリスチレン換算値として、4,000以上300,000以下であることが好ましく、5,000以上200,000以下であることがより好ましく、6,000以上100,000以下であることがさらに好ましく、10,000以上50,000以下であることが特に好ましい。
 GPC法は、HLC-8020GPC(東ソー(株)製)を用い、カラムとしてTSKgel SuperHZM-H、TSKgel SuperHZ4000、TSKgel SuperHZ2000(東ソー(株)製、4.6mmID×15cm)を、溶離液としてTHF(テトラヒドロフラン)を用いる方法に基づく。
The weight average molecular weight of the polymer compound in the present invention is 4,000 as a polystyrene conversion value by a GPC (gel permeation chromatography) method from the viewpoint of pattern peeling inhibition during development and developability when forming a cured film. It is preferably 300 or more and 300 or less, more preferably 5,000 or more and 200,000 or less, further preferably 6,000 or more and 100,000 or less, and 10,000 or more and 50,000 or less. It is particularly preferred.
The GPC method uses HLC-8020GPC (manufactured by Tosoh Corporation), TSKgel SuperHZM-H, TSKgel SuperHZ4000, TSKgel SuperHZ2000 (manufactured by Tosoh Corporation, 4.6 mm ID × 15 cm) as columns and THF (tetrahydrofuran) as an eluent. ).
 高分子化合物は、公知の方法に基づいて合成でき、高分子化合物を合成する際に用いられる溶剤としては、例えば、エチレンジクロリド、シクロヘキサノン、メチルエチルケトン、アセトン、メタノール、エタノール、プロパノール、ブタノール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、2-メトキシエチルアセテート、1-メトキシ-2-プロパノール、1-メトキシ-2-プロピルアセテート、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、ジメチルスルホキシド、トルエン、酢酸エチル、乳酸メチル、および、乳酸エチル等が挙げられる。これらの溶剤は単独で用いても2種以上混合して用いてもよい。 The polymer compound can be synthesized based on a known method, and examples of the solvent used when synthesizing the polymer compound include ethylene dichloride, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, propanol, butanol, and ethylene glycol monomethyl. Ether, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, 1-methoxy-2-propanol, 1-methoxy-2-propyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, toluene, Examples include ethyl acetate, methyl lactate, and ethyl lactate. These solvents may be used alone or in combination of two or more.
 本発明に用いうる高分子化合物の具体例としては、楠木化成株式会社製「DA-7301」、BYKChemie社製「Disperbyk-101(ポリアミドアミン燐酸塩)、107(カルボン酸エステル)、110(酸基を含む共重合物)、111(リン酸系分散剤)、130(ポリアミド)、161、162、163、164、165、166、170、190(高分子共重合物)」、「BYK-P104、P105(高分子量不飽和ポリカルボン酸)」、EFKA社製「EFKA4047、4050~4010~4165(ポリウレタン系)、EFKA4330~4340(ブロック共重合体)、4400~4402(変性ポリアクリレート)、5010(ポリエステルアミド)、5765(高分子量ポリカルボン酸塩)、6220(脂肪酸ポリエステル)、6745(フタロシアニン誘導体)、6750(アゾ顔料誘導体)」、味の素ファインテクノ社製「アジスパーPB821、PB822、PB880、PB881」、共栄社化学社製「フローレンTG-710(ウレタンオリゴマー)」、「ポリフローNo.50E、No.300(アクリル系共重合体)」、楠本化成社製「ディスパロンKS-860、873SN、874、#2150(脂肪族多価カルボン酸)、#7004(ポリエーテルエステル)、DA-703-50、DA-705、DA-725」、花王社製「デモールRN、N(ナフタレンスルホン酸ホルマリン重縮合物)、MS、C、SN-B(芳香族スルホン酸ホルマリン重縮合物)」、「ホモゲノールL-18(高分子ポリカルボン酸)」、「エマルゲン920、930、935、985(ポリオキシエチレンノニルフェニルエーテル)」、「アセタミン86(ステアリルアミンアセテート)」、日本ルーブリゾール(株)製「ソルスパース5000(フタロシアニン誘導体)、22000(アゾ顔料誘導体)、13240(ポリエステルアミン)、3000、12000、17000、20000、27000(末端部に機能部を有する高分子)、24000、28000、32000、38500(グラフト共重合体)」、日光ケミカルズ社製「ニッコールT106(ポリオキシエチレンソルビタンモノオレート)、MYS-IEX(ポリオキシエチレンモノステアレート)」、川研ファインケミカル(株)製 ヒノアクトT-8000E等、信越化学工業(株)製、オルガノシロキサンポリマーKP341、裕商(株)製「W001:カチオン系界面活性剤」、ポリオキシエチレンラウリルエーテル、ポリオキシエチレンステアリルエーテル、ポリオキシエチレンオレイルエーテル、ポリオキシエチレンオクチルフェニルエーテル、ポリオキシエチレンノニルフェニルエーテル、ポリエチレングリコールジラウレート、ポリエチレングリコールジステアレート、ソルビタン脂肪酸エステル等のノニオン系界面活性剤、「W004、W005、W017」等のアニオン系界面活性剤、森下産業(株)製「EFKA-46、EFKA-47、EFKA-47EA、EFKAポリマー100、EFKAポリマー400、EFKAポリマー401、EFKAポリマー450」、サンノプコ(株)製「ディスパースエイド6、ディスパースエイド8、ディスパースエイド15、ディスパースエイド9100」等の高分子分散剤、(株)ADEKA製「アデカプルロニックL31、F38、L42、L44、L61、L64、F68、L72、P95、F77、P84、F87、P94、L101、P103、F108、L121、P-123」、および三洋化成(株)製「イオネット(商品名)S-20」等が挙げられる。また、アクリベースFFS-6752、アクリベースFFS-187、アクリキュア-RD-F8、および、サイクロマーPを用いることもできる。
 また、両性樹脂の市販品としては、例えば、ビックケミー社製のDISPERBYK-130、DISPERBYK-140、DISPERBYK-142、DISPERBYK-145、DISPERBYK-180、DISPERBYK-187、DISPERBYK-191、DISPERBYK-2001、DISPERBYK-2010、DISPERBYK-2012、DISPERBYK-2025、BYK-9076、味の素ファインテクノ社製のアジスパーPB821、アジスパーPB822、および、アジスパーPB881等が挙げられる。
 これらの高分子化合物は、単独で使用してもよく、2種以上を組み合わせて使用してもよい。
Specific examples of the polymer compound that can be used in the present invention include “DA-7301” manufactured by Kashiwagi Kasei Co., Ltd., “Disperbyk-101 (polyamideamine phosphate)” manufactured by BYK Chemie, 107 (carboxylic acid ester), and 110 (acid group). ), 111 (phosphate dispersing agent), 130 (polyamide), 161, 162, 163, 164, 165, 166, 170, 190 (polymer copolymer) ”,“ BYK-P104, P105 (high molecular weight unsaturated polycarboxylic acid) ”,“ EFKA 4047, 4050 to 4010 to 4165 (polyurethane type), EFKA 4330 to 4340 (block copolymer), 4400 to 4402 (modified polyacrylate), 5010 (polyester) manufactured by EFKA Amide), 5765 (high molecular weight polycarboxylate), 622 (Fatty acid polyester), 6745 (phthalocyanine derivative), 6750 (azo pigment derivative) ”,“ Ajisper PB821, PB822, PB880, PB881 ”manufactured by Ajinomoto Fine Techno Co.,“ Floren TG-710 (urethane oligomer) ”manufactured by Kyoeisha Chemical Co., Ltd. “Polyflow No. 50E, No. 300 (acrylic copolymer)”, “Disparon KS-860, 873SN, 874, # 2150 (aliphatic polycarboxylic acid), # 7004 (polyetherester)” manufactured by Enomoto Kasei Co., Ltd. , DA-703-50, DA-705, DA-725 ”,“ Demol RN, N (Naphthalenesulfonic acid formalin polycondensate), MS, C, SN-B (aromatic sulfonic acid formalin polycondensate) manufactured by Kao Corporation ) "," Homogenol L-18 (polymeric polycarboxylic acid) ", "Emulgen 920, 930, 935, 985 (polyoxyethylene nonylphenyl ether)", "Acetamine 86 (stearylamine acetate)", "Solsperse 5000 (phthalocyanine derivative), 22000 (azo pigment derivative)" manufactured by Nippon Lubrizol Co., Ltd. 13240 (polyesteramine), 3000, 12000, 17000, 20000, 27000 (polymer having a functional part at the end), 24000, 28000, 32000, 38500 (graft copolymer) ”,“ Nikkor T106 (Nikkor Chemicals) ” Polyoxyethylene sorbitan monooleate), MYS-IEX (polyoxyethylene monostearate) ”, Kawano Fine Chemical Co., Ltd. Hinoact T-8000E, etc., Shin-Etsu Chemical Co., Ltd., Organosi Xan polymer KP341, “W001: cationic surfactant” manufactured by Yusho Co., Ltd., polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl Nonionic surfactants such as ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, anionic surfactants such as “W004, W005, W017”, “EFKA-46, EFKA manufactured by Morishita Sangyo Co., Ltd.” -47, EFKA-47EA, EFKA polymer 100, EFKA polymer 400, EFKA polymer 401, EFKA polymer 450 "," Disperse Aid 6, D Polymer dispersing agents such as “Sparse Aid 8, Disperse Aid 15, Disperse Aid 9100”, “Adeka Pluronic L31, F38, L42, L44, L61, L64, F68, L72, P95, F77, P84 manufactured by ADEKA Corporation F87, P94, L101, P103, F108, L121, P-123 ”,“ Ionet (trade name) S-20 ”manufactured by Sanyo Kasei Co., Ltd., and the like. Further, Acrybase FFS-6752, Acrybase FFS-187, Acrycure-RD-F8, and Cyclomer P can also be used.
Commercially available amphoteric resins include, for example, DISPERBYK-130, DISPERBYK-140, DISPERBYK-142, DISPERBYK-145, DISPERBYK-180, DISPERBYK-187, DISPERBYK-191, DISPERBYK-2001, DISPERB manufactured by BYK Chemie. 2010, DISPERBYK-2012, DISPERBYK-2025, BYK-9976, Ajisper PB821, Azisper PB822, and Azisper PB881 manufactured by Ajinomoto Fine-Techno Co., Ltd.
These polymer compounds may be used alone or in combination of two or more.
 なお、高分子化合物の具体例の例としては、特開2013-249417号公報の段落0127~0129に記載の高分子化合物を参照でき、これらの内容は本明細書に組み込まれる。 As specific examples of the polymer compound, the polymer compounds described in paragraphs 0127 to 0129 of JP2013-249417A can be referred to, and the contents thereof are incorporated in the present specification.
 また、分散剤としては、上述した高分子化合物以外に、特開2010-106268号公報の段落0037~0115(対応するUS2011/0124824の段落0075~0133欄)のグラフト共重合体が使用でき、これらの内容は援用でき、本明細書に組み込まれる。
 また、上記以外にも、特開2011-153283号公報の段落0028~0084(対応するUS2011/0279759の段落0075~0133欄)の酸性基が連結基を介して結合してなる側鎖構造を有する構成成分を含む高分子化合物が使用でき、これらの内容は援用でき、本明細書に組み込まれる。
As the dispersant, in addition to the above-described polymer compound, graft copolymers described in JP-A 2010-106268, paragraphs 0037 to 0115 (corresponding to paragraphs 0075 to 0133 in US2011 / 0124824) can be used. Is incorporated herein by reference.
In addition to the above, it has a side chain structure in which acidic groups in paragraphs 0028 to 0084 (corresponding to columns 0075 to 0133 of US 2011/0279759) of JP 2011-153283 A are bonded via a linking group. Polymeric compounds containing constituents can be used, the contents of which can be incorporated and incorporated herein.
 組成物が分散剤を含有する場合において、分散剤の含有量は、組成物の全固形分に対して、0.1~50質量%が好ましく、0.5~30質量%がより好ましい。
 分散剤は、1種単独で用いてもよいし、2種以上併用してもよい。2種以上を併用する場合は、合計量が上記範囲となることが好ましい。
In the case where the composition contains a dispersant, the content of the dispersant is preferably from 0.1 to 50% by mass, more preferably from 0.5 to 30% by mass, based on the total solid content of the composition.
A dispersing agent may be used individually by 1 type, and may be used together 2 or more types. When using 2 or more types together, it is preferable that a total amount becomes the said range.
 <バインダー樹脂>
 本発明の組成物は、バインダー樹脂を含有することが好ましい。
 バインダー樹脂としては、線状有機ポリマーを用いることが好ましい。このような線状有機ポリマーとしては、公知のものを任意に使用することができる。好ましくは、水現像または弱アルカリ水現像を可能とするために、水または弱アルカリ水に可溶性または膨潤性である線状有機ポリマーが選択される。なかでも、バインダー樹脂としては、アルカリ可溶性樹脂(アルカリ可溶性を促進する基を有する樹脂)が特に好ましい。
 バインダー樹脂としては、線状有機ポリマーであって、分子(好ましくは、(メタ)アクリル系共重合体、または、スチレン系共重合体を主鎖とする分子)中に少なくとも1つのアルカリ可溶性を促進する基を有するアルカリ可溶性樹脂の中から適宜選択することができる。耐熱性の観点からは、ポリヒドロキシスチレン系樹脂、ポリシロキサン系樹脂、(メタ)アクリル系樹脂、(メタ)アクリルアミド系樹脂、(メタ)アクリル/(メタ)アクリルアミド共重合体樹脂が好ましく、現像性制御の観点からは、(メタ)アクリル系樹脂、(メタ)アクリルアミド系樹脂、(メタ)アクリル/(メタ)アクリルアミド共重合体樹脂が好ましい。
 アルカリ可溶性を促進する基(以下、酸基ともいう)としては、例えば、カルボキシル基、リン酸基、スルホン酸基、および、フェノール性水酸基等が挙げられる。なかでも、有機溶剤に可溶で弱アルカリ水溶液により現像可能なものが好ましく、(メタ)アクリル酸由来の構造単位を有するアルカリ可溶性樹脂がより好ましいものとして挙げられる。これら酸基は、1種のみであってもよいし、2種以上であってもよい。
<Binder resin>
The composition of the present invention preferably contains a binder resin.
As the binder resin, a linear organic polymer is preferably used. As such a linear organic polymer, a well-known thing can be used arbitrarily. Preferably, a linear organic polymer that is soluble or swellable in water or weak alkaline water is selected in order to enable water development or weak alkaline water development. Among these, as the binder resin, an alkali-soluble resin (a resin having a group that promotes alkali-solubility) is particularly preferable.
The binder resin is a linear organic polymer that promotes at least one alkali solubility in a molecule (preferably a molecule having a (meth) acrylic copolymer or a styrene copolymer as the main chain). It can be suitably selected from alkali-soluble resins having a group to be used. From the viewpoint of heat resistance, polyhydroxystyrene resins, polysiloxane resins, (meth) acrylic resins, (meth) acrylamide resins, (meth) acrylic / (meth) acrylamide copolymer resins are preferred, and developability From the viewpoint of control, (meth) acrylic resins, (meth) acrylamide resins, and (meth) acryl / (meth) acrylamide copolymer resins are preferred.
Examples of the group that promotes alkali solubility (hereinafter also referred to as an acid group) include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group. Especially, what is soluble in an organic solvent and can be developed with a weak alkaline aqueous solution is preferable, and an alkali-soluble resin having a structural unit derived from (meth) acrylic acid is more preferable. These acid groups may be used alone or in combination of two or more.
 バインダー樹脂としては、例えば、側鎖にカルボン酸基を有するラジカル重合体、例えば特開昭59-44615号、特公昭54-34327号、特公昭58-12577号、特公昭54-25957号、特開昭54-92723号、特開昭59-53836号、および、特開昭59-71048号に記載されているもの、すなわち、カルボキシル基を有するモノマーを単独或いは共重合させた樹脂、酸無水物を有するモノマーを単独或いは共重合させ酸無水物ユニットを加水分解もしくはハーフエステル化もしくはハーフアミド化させた樹脂、および、エポキシ樹脂を不飽和モノカルボン酸および酸無水物で変性させたエポキシアクリレート等が挙げられる。カルボキシル基を有するモノマーの例としては、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、マレイン酸、フマル酸、および、4-カルボキシルスチレン等が挙げられ、酸無水物を有するモノマーの例としては、無水マレイン酸等が挙げられる。また、同様に側鎖にカルボン酸基を有する酸性セルロース誘導体も例として挙げられる。この他に水酸基を有する重合体に環状酸無水物を付加させたもの等が有用である。
 また、欧州特許第993966号、欧州特許第1204000号、および、特開2001-318463号等の各公報に記載の酸基を有するアセタール変性ポリビニルアルコール系バインダー樹脂は、膜強度、および、現像性のバランスに優れており、好適である。
 さらに、この他に水溶性線状有機ポリマーとして、ポリビニルピロリドンやポリエチレンオキサイド等が有用である。また、硬化皮膜の強度を上げるために、アルコール可溶性ナイロン、および、2,2-ビス-(4-ヒドロキシフェニル)-プロパンとエピクロロヒドリンとの反応物であるポリエーテル等も有用である。
Examples of the binder resin include radical polymers having a carboxylic acid group in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, JP-B-54-25957, Those described in Kaikai 54-92723, JP-A-59-53836, and JP-A-59-71048, ie, resins or acid anhydrides obtained by homopolymerizing or copolymerizing monomers having a carboxyl group Resins in which an acid anhydride unit is hydrolyzed, half-esterified or half-amidated by homopolymerizing a monomer having a monomer, and epoxy acrylate obtained by modifying an epoxy resin with an unsaturated monocarboxylic acid and an acid anhydride Can be mentioned. Examples of monomers having a carboxyl group include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, and 4-carboxyl styrene. Examples of monomers having an acid anhydride include And maleic anhydride. Similarly, an acidic cellulose derivative having a carboxylic acid group in the side chain is also exemplified. In addition, a polymer obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group is useful.
Further, the acetal-modified polyvinyl alcohol-based binder resin having an acid group described in European Patent No. 993966, European Patent No. 1204000, and Japanese Patent Application Laid-Open No. 2001-318463 has film strength and developability. It is excellent in balance and is suitable.
In addition, polyvinyl pyrrolidone, polyethylene oxide, and the like are useful as the water-soluble linear organic polymer. In order to increase the strength of the cured film, alcohol-soluble nylon and polyether which is a reaction product of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin are also useful.
 特に、これらの中でも、〔ベンジル(メタ)アクリレート/(メタ)アクリル酸/必要に応じてその他の付加重合性ビニルモノマー〕共重合体、および〔アリル(メタ)アクリレート/(メタ)アクリル酸/必要に応じてその他の付加重合性ビニルモノマー〕共重合体は、膜強度、感度、および、現像性のバランスに優れており、好適である。
 市販品としては、例えばアクリベースFF-187、FF-426(藤倉化成社製)、アクリキュア-RD-F8(日本触媒(株))、および、ダイセルオルネクス(株)製サイクロマーP(ACA)230AA等が挙げられる。
In particular, among these, [benzyl (meth) acrylate / (meth) acrylic acid / other addition polymerizable vinyl monomer as required] copolymer, and [allyl (meth) acrylate / (meth) acrylic acid / necessary The other addition polymerizable vinyl monomer] copolymer is suitable because it is excellent in the balance of film strength, sensitivity, and developability.
Commercially available products include, for example, Acrybase FF-187, FF-426 (manufactured by Fujikura Kasei Co., Ltd.), Acrycure-RD-F8 (Nippon Shokubai Co., Ltd.), and Cyclomer P (ACA) manufactured by Daicel Ornex Co., Ltd. 230AA etc. are mentioned.
 バインダー樹脂の製造には、例えば、公知のラジカル重合法による方法を適用することができる。ラジカル重合法でアルカリ可溶性樹脂を製造する際の温度、圧力、ラジカル開始剤の種類およびその量、ならびに、溶剤の種類等々の重合条件は、当業者において容易に設定可能である。 For the production of the binder resin, for example, a known radical polymerization method can be applied. Those skilled in the art can easily set polymerization conditions such as temperature, pressure, the type and amount of the radical initiator, and the type of the solvent when producing the alkali-soluble resin by the radical polymerization method.
 また、バインダー樹脂として、グラフト鎖を有する構造単位と、酸基(アルカリ可溶性基)を有する構造単位と、を有するポリマーを使用することも好ましい。
 グラフト鎖を有する構造単位の定義は、上述した分散剤が有するグラフト鎖を有する構造単位と同義であり、また好適範囲も同様である。
 酸基としては、例えば、カルボン酸基、スルホン酸基、リン酸基、または、フェノール性水酸基等があり、好ましくは、カルボン酸基、スルホン酸基、および、リン酸基のうち少なくとも1種であり、より好ましいものは、カルボン酸基である。
Moreover, it is also preferable to use a polymer having a structural unit having a graft chain and a structural unit having an acid group (alkali-soluble group) as the binder resin.
The definition of the structural unit which has a graft chain is synonymous with the structural unit which has the graft chain which the dispersing agent mentioned above has, and its suitable range is also the same.
Examples of the acid group include a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, or a phenolic hydroxyl group. Preferably, the acid group is at least one of a carboxylic acid group, a sulfonic acid group, and a phosphoric acid group. More preferred is a carboxylic acid group.
 酸基を有する構造単位としては、下記一般式(vii)~一般式(ix)で表さる単量体に由来の構造単位から選択された1種以上の構造単位を有することが好ましい。 The structural unit having an acid group preferably has one or more structural units selected from structural units derived from monomers represented by the following general formulas (vii) to (ix).
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 一般式(vii)~一般式(ix)中、R21、R22、およびR23は、それぞれ独立に、水素原子、ハロゲン原子(例えば、フッ素原子、塩素原子、臭素原子等)、または炭素数が1~6のアルキル基(例えば、メチル基、エチル基、プロピル基等)を表す。
 一般式(vii)~一般式(ix)中、R21、R22、およびR23は、好ましくは、それぞれ独立に水素原子、または炭素数が1~3のアルキル基であり、より好ましくは、それぞれ独立に水素原子またはメチル基である。一般式(vii)中、R21およびR23は、それぞれ水素原子であることが特に好ましい。
In the general formulas (vii) to (ix), R 21 , R 22 , and R 23 are each independently a hydrogen atom, a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.), or a carbon number Represents an alkyl group of 1 to 6 (for example, methyl group, ethyl group, propyl group, etc.).
In the general formula (vii) to the general formula (ix), R 21 , R 22 and R 23 are preferably each independently a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably Each independently represents a hydrogen atom or a methyl group. In general formula (vii), R 21 and R 23 are each particularly preferably a hydrogen atom.
 一般式(vii)中のXは、酸素原子(-O-)またはイミノ基(-NH-)を表し、酸素原子であることが好ましい。
 また、一般式(viii)中のYは、メチン基または窒素原子を表す。
X 2 in the general formula (vii) represents an oxygen atom (—O—) or an imino group (—NH—), and is preferably an oxygen atom.
Y in the general formula (viii) represents a methine group or a nitrogen atom.
 また、一般式(vii)~一般式(ix)中のLは、単結合または2価の連結基を表す。2価の連結基の例としては、2価の脂肪族基(例えば、アルキレン基、置換アルキレン基、アルケニレン基、置換アルケニレン基、アルキニレン基、および置換アルキニレン基)、2価の芳香族基(例えば、アリーレン基、および置換アリーレン基)、2価の複素環基、酸素原子(-O-)、硫黄原子(-S-)、イミノ基(-NH-)、置換イミノ結合(-NR41’-、ここでR41’は脂肪族基、芳香族基または複素環基)、カルボニル結合(-CO-)、および、これらの組合せ等が挙げられる。 In the general formulas (vii) to (ix), L 2 represents a single bond or a divalent linking group. Examples of the divalent linking group include a divalent aliphatic group (for example, an alkylene group, a substituted alkylene group, an alkenylene group, a substituted alkenylene group, an alkynylene group, and a substituted alkynylene group), a divalent aromatic group (for example, , Arylene groups, and substituted arylene groups), divalent heterocyclic groups, oxygen atoms (—O—), sulfur atoms (—S—), imino groups (—NH—), substituted imino bonds (—NR 41 ′ — Here, R 41 ′ includes an aliphatic group, an aromatic group or a heterocyclic group), a carbonyl bond (—CO—), and combinations thereof.
 2価の脂肪族基は、環状構造または分岐構造を有していてもよい。脂肪族基の炭素数は、1~20が好ましく、1~15がより好ましく、1~10がさらに好ましい。脂肪族基は不飽和脂肪族基よりも飽和脂肪族基の方が好ましい。また、脂肪族基は、置換基を有していてもよい。置換基の例としては、ハロゲン原子、ヒドロキシル基、芳香族基および複素環基が挙げられる。 The divalent aliphatic group may have a cyclic structure or a branched structure. The aliphatic group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 10 carbon atoms. The aliphatic group is preferably a saturated aliphatic group rather than an unsaturated aliphatic group. Further, the aliphatic group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, an aromatic group, and a heterocyclic group.
 2価の芳香族基の炭素数は、6~20が好ましく、6~15がより好ましく、6~10がさらに好ましい。また、芳香族基は置換基を有していてもよい。置換基の例は、ハロゲン原子、ヒドロキシル基、脂肪族基、芳香族基および複素環基が挙げられる。 The carbon number of the divalent aromatic group is preferably 6 to 20, more preferably 6 to 15, and still more preferably 6 to 10. The aromatic group may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, an aliphatic group, an aromatic group, and a heterocyclic group.
 2価の複素環基は、複素環として5員環または6員環を有することが好ましい。複素環に他の複素環、脂肪族環または芳香族環のうち1つ以上が縮合していてもよい。また、複素環基は置換基を有していてもよい。置換基の例としては、ハロゲン原子、ヒドロキシ基、オキソ基(=O)、チオキソ基(=S)、イミノ基(=NH)、置換イミノ基(=N-R42、ここでR42は脂肪族基、芳香族基または複素環基)、脂肪族基、芳香族基および複素環基が挙げられる。 The divalent heterocyclic group preferably has a 5-membered or 6-membered ring as the heterocycle. One or more heterocycles, aliphatic rings or aromatic rings may be condensed with the heterocycle. Further, the heterocyclic group may have a substituent. Examples of substituents include halogen atoms, hydroxy groups, oxo groups (═O), thioxo groups (═S), imino groups (═NH), substituted imino groups (═N—R 42 , where R 42 represents a fatty acid Aromatic group, aromatic group or heterocyclic group), aliphatic group, aromatic group and heterocyclic group.
 Lは、単結合、アルキレン基またはオキシアルキレン構造を含む2価の連結基であることが好ましい。オキシアルキレン構造は、オキシエチレン構造またはオキシプロピレン構造であることがより好ましい。また、Lは、オキシアルキレン構造を2以上繰り返して含むポリオキシアルキレン構造を含んでいてもよい。ポリオキシアルキレン構造としては、ポリオキシエチレン構造またはポリオキシプロピレン構造が好ましい。ポリオキシエチレン構造は、-(OCHCH)n-で表され、nは、2以上の整数が好ましく、2~10の整数であることがより好ましい。 L 2 is preferably a single bond, an alkylene group or a divalent linking group containing an oxyalkylene structure. The oxyalkylene structure is more preferably an oxyethylene structure or an oxypropylene structure. L 2 may contain a polyoxyalkylene structure containing two or more oxyalkylene structures. The polyoxyalkylene structure is preferably a polyoxyethylene structure or a polyoxypropylene structure. The polyoxyethylene structure is represented by — (OCH 2 CH 2 ) n—, where n is preferably an integer of 2 or more, and more preferably an integer of 2 to 10.
 一般式(vii)~一般式(ix)中、Zは、酸基であり、カルボン酸基であることが好ましい。 In the general formulas (vii) to (ix), Z 2 is an acid group, preferably a carboxylic acid group.
 一般式(ix)中、R24、R25、およびR26は、それぞれ独立に、水素原子、ハロゲン原子(例えば、フッ素原子、塩素原子、臭素原子等)、炭素数が1~6のアルキル基(例えば、メチル基、エチル基、プロピル基等)、-Z、またはL-Zを表す。ここでLおよびZは、上記におけるLおよびZと同義であり、好ましい例も同様である。R24、R25、およびR26としては、それぞれ独立に水素原子、または炭素数が1~3のアルキル基が好ましく、水素原子がより好ましい。 In general formula (ix), R 24 , R 25 , and R 26 are each independently a hydrogen atom, a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.), or an alkyl group having 1 to 6 carbon atoms. (e.g., methyl group, ethyl group, propyl group, etc.), - represents a Z 2 or L 2 -Z 2,. Here L 2 and Z 2 has the same meaning as L 2 and Z 2 in the above, and preferred examples are also the same. R 24 , R 25 , and R 26 are each independently preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and more preferably a hydrogen atom.
 本発明においては、一般式(vii)で表される単量体として、R21、R22、およびR23がそれぞれ独立に水素原子またはメチル基であって、Lがアルキレン基またはオキシアルキレン構造を含む2価の連結基であって、Xが酸素原子またはイミノ基であって、Zがカルボン酸基である化合物が好ましい。
 また、一般式(vii)で表される単量体として、R21が水素原子またはメチル基であって、Lがアルキレン基であって、Zがカルボン酸基であって、Yがメチン基である化合物が好ましい。
 さらに、一般式(ix)で表される単量体として、R24、R25、およびR26がそれぞれ独立に水素原子またはメチル基であって、Zがカルボン酸基である化合物が好ましい。
In the present invention, as the monomer represented by the general formula (vii), R 21 , R 22 , and R 23 are each independently a hydrogen atom or a methyl group, and L 2 is an alkylene group or an oxyalkylene structure. A compound in which X 2 is an oxygen atom or an imino group and Z 2 is a carboxylic acid group is preferable.
Further, as the monomer represented by the general formula (vii), R 21 is a hydrogen atom or a methyl group, L 2 is an alkylene group, Z 2 is a carboxylic acid group, and Y is methine. Compounds that are groups are preferred.
Furthermore, as the monomer represented by the general formula (ix), a compound in which R 24 , R 25 , and R 26 are each independently a hydrogen atom or a methyl group and Z 2 is a carboxylic acid group is preferable.
 上記バインダー樹脂は、上述したグラフト鎖を有する構造単位を有する分散剤と同様の方法により合成することができ、また、その好ましい酸価、重量平均分子量も同じである。 The binder resin can be synthesized by the same method as the dispersant having a structural unit having a graft chain described above, and the preferred acid value and weight average molecular weight are the same.
 上記バインダー樹脂は、酸基を有する構造単位を1種または2種以上有してもよい。
 酸基を有する構造単位の含有量は、質量換算で、上記バインダー樹脂の総質量に対して、好ましくは5~95%であり、より好ましくは、アルカリ現像による画像強度のダメージ抑制という観点から、10~90%である。
The binder resin may have one or more structural units having an acid group.
The content of the structural unit having an acid group is preferably 5 to 95%, in terms of mass, with respect to the total mass of the binder resin, and more preferably from the viewpoint of suppressing damage to the image strength due to alkali development. 10 to 90%.
 本発明の組成物におけるバインダー樹脂の含有量は、組成物の全固形分に対して、0.1~30質量%であることが好ましく、0.3~25質量%であることがより好ましい。
 バインダー樹脂は、1種単独で用いてもよいし、2種以上併用してもよい。2種以上を併用する場合は、合計量が上記範囲となることが好ましい。
The content of the binder resin in the composition of the present invention is preferably 0.1 to 30% by mass and more preferably 0.3 to 25% by mass with respect to the total solid content of the composition.
Binder resin may be used individually by 1 type, and may be used together 2 or more types. When using 2 or more types together, it is preferable that a total amount becomes the said range.
 本発明の組成物において、上記チタン窒化物含有粒子に対する上記分散剤の含有割合(分散剤/チタン窒化物含有粒子(以下、「D/P」ともいう。)質量比)は、0.3以下であることが好ましく、0.05~0.3であることがより好ましく、0.1~0.3であることがさらに好ましい。含有比D/Pが上記範囲内にあることで、分散液の性能再現性に優れるほか、硬化膜のパターニング性(解像性)にも優れる。 In the composition of the present invention, the content ratio of the dispersant to the titanium nitride-containing particles (dispersant / titanium nitride-containing particles (hereinafter also referred to as “D / P”) mass ratio) is 0.3 or less. Is preferable, 0.05 to 0.3 is more preferable, and 0.1 to 0.3 is more preferable. When the content ratio D / P is in the above range, the performance reproducibility of the dispersion is excellent, and the patterning property (resolution) of the cured film is also excellent.
 <重合性化合物>
 本発明の組成物は、重合性化合物を含有することが好ましい。
 重合性化合物は、エチレン性不飽和結合を有する基を1個以上有する化合物が好ましく、2個以上有する化合物がより好ましく、3個以上有することがさらに好ましく、5個以上有することが特に好ましい。上限は、たとえば、15個以下である。エチレン性不飽和結合を有する基としては、例えば、ビニル基、(メタ)アリル基、および、(メタ)アクリロイル基等が挙げられる。
<Polymerizable compound>
The composition of the present invention preferably contains a polymerizable compound.
The polymerizable compound is preferably a compound having one or more groups having an ethylenically unsaturated bond, more preferably a compound having 2 or more, further preferably 3 or more, and particularly preferably 5 or more. The upper limit is 15 or less, for example. Examples of the group having an ethylenically unsaturated bond include a vinyl group, a (meth) allyl group, and a (meth) acryloyl group.
 重合性化合物は、例えば、モノマー、プレポリマー、オリゴマー、および、これらの混合物、ならびに、これらの多量体等の化学的形態のいずれであってもよく、モノマーが好ましい。
 重合性化合物の分子量は、100~3000が好ましく、250~1500がより好ましい。
 重合性化合物は、3~15官能の(メタ)アクリレート化合物であることが好ましく、3~6官能の(メタ)アクリレート化合物であることがより好ましい。
 モノマー、プレポリマーの例としては、不飽和カルボン酸(例えば、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、イソクロトン酸、マレイン酸等)やそのエステル類、アミド類、ならびにこれらの多量体が挙げられ、好ましくは、不飽和カルボン酸と脂肪族多価アルコール化合物とのエステル、および不飽和カルボン酸と脂肪族多価アミン化合物とのアミド類、ならびにこれらの多量体である。また、ヒドロキシル基、アミノ基、メルカプト基等の求核性置換基を有する不飽和カルボン酸エステル或いはアミド類と、単官能もしくは多官能イソシアネート類或いはエポキシ類との付加反応物、上記不飽和カルボン酸エステル或いはアミド類と、単官能もしくは多官能のカルボン酸との脱水縮合反応物等も好適に使用される。また、イソシアネート基、エポキシ基等の親電子性置換基を有する不飽和カルボン酸エステル或いはアミド類と、単官能もしくは多官能のアルコール類、アミン類、チオール類との反応物、ハロゲン基、トシルオキシ基等の脱離性置換基を有する不飽和カルボン酸エステル或いはアミド類と、単官能もしくは多官能のアルコール類、アミン類、チオール類との反応物も好適である。また、上記の不飽和カルボン酸の代わりに、不飽和ホスホン酸、スチレン等のビニルベンゼン誘導体、ビニルエーテル、アリルエーテル等に置き換えた化合物群を使用することも可能である。
 これらの具体的な化合物としては、特開2009-288705号公報の段落〔0095〕~〔0108〕に記載されている化合物を本発明においても好適に用いることができる。
The polymerizable compound may be in any of chemical forms such as a monomer, a prepolymer, an oligomer, a mixture thereof, and a multimer thereof, and is preferably a monomer.
The molecular weight of the polymerizable compound is preferably 100 to 3000, and more preferably 250 to 1500.
The polymerizable compound is preferably a 3 to 15 functional (meth) acrylate compound, more preferably a 3 to 6 functional (meth) acrylate compound.
Examples of monomers and prepolymers include unsaturated carboxylic acids (eg, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters, amides, and multimers thereof. Preferred are esters of unsaturated carboxylic acids and aliphatic polyhydric alcohol compounds, amides of unsaturated carboxylic acids and aliphatic polyvalent amine compounds, and multimers thereof. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as hydroxyl group, amino group, mercapto group and the like with a monofunctional or polyfunctional isocyanate or epoxy, the above unsaturated carboxylic acid A dehydration condensation reaction product of an ester or amide and a monofunctional or polyfunctional carboxylic acid is also preferably used. Reaction products of unsaturated carboxylic acid esters or amides having electrophilic substituents such as isocyanate groups and epoxy groups with monofunctional or polyfunctional alcohols, amines, thiols, halogen groups, tosyloxy groups A reaction product of an unsaturated carboxylic acid ester or amide having a leaving substituent such as monofunctional or polyfunctional alcohols, amines or thiols is also suitable. Moreover, it is also possible to use a compound group in which the unsaturated carboxylic acid is replaced with an unsaturated phosphonic acid, a vinylbenzene derivative such as styrene, vinyl ether, allyl ether or the like.
As these specific compounds, the compounds described in paragraphs [0095] to [0108] of JP-A-2009-288705 can also be suitably used in the present invention.
 本発明において、重合性化合物としては、エチレン性不飽和結合を有する基を1個以上有する、常圧下で100℃以上の沸点を持つ化合物も好ましい。その例としては、例えば、特開2013-29760号公報の段落0227、特開2008-292970号公報の段落0254~0257に記載の化合物を参酌でき、この内容は本明細書に組み込まれる。 In the present invention, the polymerizable compound is also preferably a compound having at least one group having an ethylenically unsaturated bond and having a boiling point of 100 ° C. or higher under normal pressure. As examples thereof, for example, the compounds described in paragraph 0227 of JP2013-29760A and paragraphs 0254 to 0257 of JP2008-292970A can be referred to, the contents of which are incorporated herein.
 重合性化合物は、ジペンタエリスリトールトリアクリレート(市販品としてはKAYARAD D-330;日本化薬株式会社製)、ジペンタエリスリトールテトラアクリレート(市販品としてはKAYARAD D-320;日本化薬株式会社製)、ジペンタエリスリトールペンタ(メタ)アクリレート(市販品としてはKAYARAD D-310;日本化薬株式会社製)、ジペンタエリスリトールヘキサ(メタ)アクリレート(市販品としてはKAYARAD DPHA;日本化薬株式会社製、A-DPH-12E;新中村化学社製)、およびこれらの(メタ)アクリロイル基がエチレングリコール残基またはプロピレングリコール残基を介している構造(例えば、サートマー社から市販されている、SR454、SR499)が好ましい。これらのオリゴマータイプも使用できる。また、NKエステルA-TMMT(ペンタエリスリトールテトラアクリレート、新中村化学(株)製)、および、KAYARAD RP-1040(日本化薬株式会社製)等を使用することもできる。
 以下に好ましい重合性化合物の態様を示す。
The polymerizable compounds are dipentaerythritol triacrylate (KAYARAD D-330 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (KAYARAD D-320 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.). Dipentaerythritol penta (meth) acrylate (as a commercial product, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (as a commercial product, manufactured as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.) A-DPH-12E (manufactured by Shin-Nakamura Chemical Co., Ltd.), and structures in which these (meth) acryloyl groups are mediated by ethylene glycol or propylene glycol residues (eg, commercially available from Sartomer, SR454, SR499) ) Is preferred. These oligomer types can also be used. NK ester A-TMMT (pentaerythritol tetraacrylate, manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), and the like can also be used.
Preferred embodiments of the polymerizable compound are shown below.
 重合性化合物は、カルボキシル基、スルホン酸基、および、リン酸基等の酸基を有していてもよい。酸基を有する重合性化合物としては、脂肪族ポリヒドロキシ化合物と不飽和カルボン酸とのエステルが好ましく、脂肪族ポリヒドロキシ化合物の未反応のヒドロキシル基に非芳香族カルボン酸無水物を反応させて酸基を持たせた重合性化合物がより好ましく、さらに好ましくは、このエステルにおいて、脂肪族ポリヒドロキシ化合物がペンタエリスリトールおよび/またはジペンタエリスリトールであるものである。市販品としては、例えば、東亞合成株式会社製の、アロニックスTO-2349、M-305、M-510、および、M-520等が挙げられる。 The polymerizable compound may have an acid group such as a carboxyl group, a sulfonic acid group, and a phosphoric acid group. As the polymerizable compound having an acid group, an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid is preferable, and a non-aromatic carboxylic acid anhydride is reacted with an unreacted hydroxyl group of the aliphatic polyhydroxy compound. A polymerizable compound having a group is more preferable, and in this ester, the aliphatic polyhydroxy compound is pentaerythritol and / or dipentaerythritol. Examples of commercially available products include Aronix TO-2349, M-305, M-510, and M-520 manufactured by Toagosei Co., Ltd.
 酸基を有する重合性化合物の好ましい酸価としては、0.1~40mgKOH/gであり、より好ましくは5~30mgKOH/gである。重合性化合物の酸価が0.1mgKOH/g以上であれば、現像溶解特性が良好であり、40mgKOH/g以下であれば、製造や取扱い上、有利である。さらには、光重合性能が良好で、硬化性に優れる。 The preferred acid value of the polymerizable compound having an acid group is 0.1 to 40 mgKOH / g, more preferably 5 to 30 mgKOH / g. If the acid value of the polymerizable compound is 0.1 mgKOH / g or more, the development and dissolution characteristics are good, and if it is 40 mgKOH / g or less, it is advantageous in production and handling. Furthermore, the photopolymerization performance is good and the curability is excellent.
 重合性化合物は、カプロラクトン構造を有する化合物も好ましい態様である。
 カプロラクトン構造を有する化合物としては、分子内にカプロラクトン構造を有する限り特に限定されるものではないが、例えば、トリメチロールエタン、ジトリメチロールエタン、トリメチロールプロパン、ジトリメチロールプロパン、ペンタエリスリトール、ジペンタエリスリトール、トリペンタエリスリトール、グリセリン、ジグリセロール、トリメチロールメラミン等の多価アルコールと、(メタ)アクリル酸およびε-カプロラクトンとをエステル化することにより得られる、ε-カプロラクトン変性多官能(メタ)アクリレートを挙げることができる。なかでも下記一般式(Z-1)で表されるカプロラクトン構造を有する化合物が好ましい。
The polymerizable compound is also preferably a compound having a caprolactone structure.
The compound having a caprolactone structure is not particularly limited as long as it has a caprolactone structure in the molecule.For example, trimethylolethane, ditrimethylolethane, trimethylolpropane, ditrimethylolpropane, pentaerythritol, dipentaerythritol, Ε-caprolactone-modified polyfunctional (meth) acrylate obtained by esterifying polyhydric alcohol such as tripentaerythritol, glycerin, diglycerol, trimethylolmelamine, (meth) acrylic acid and ε-caprolactone be able to. Of these, compounds having a caprolactone structure represented by the following general formula (Z-1) are preferred.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 一般式(Z-1)中、6個のRは全てが下記一般式(Z-2)で表される基であるか、または6個のRのうち1~5個が下記一般式(Z-2)で表される基であり、残余が下記一般式(Z-3)で表される基である。 In the general formula (Z-1), all six R are groups represented by the following general formula (Z-2), or 1 to 5 of the six R are represented by the following general formula (Z -2), and the remainder is a group represented by the following general formula (Z-3).
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 一般式(Z-2)中、R1は水素原子またはメチル基を示し、mは1または2の数を示し、「*」は結合手であることを示す。 In general formula (Z-2), R 1 represents a hydrogen atom or a methyl group, m represents a number of 1 or 2, and “*” represents a bond.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 一般式(Z-3)中、R1は水素原子またはメチル基を示し、「*」は結合手であることを示す。 In general formula (Z-3), R 1 represents a hydrogen atom or a methyl group, and “*” represents a bond.
 カプロラクトン構造を有する重合性化合物は、例えば、日本化薬(株)からKAYARAD DPCAシリーズとして市販されており、DPCA-20(上記式(Z-1)~(Z-3)においてm=1、式(Z-2)で表される基の数=2、R1が全て水素原子である化合物)、DPCA-30(同式、m=1、式(Z-2)で表される基の数=3、R1が全て水素原子である化合物)、DPCA-60(同式、m=1、式(Z-2)で表される基の数=6、R1が全て水素原子である化合物)、および、DPCA-120(同式においてm=2、式(Z-2)で表される基の数=6、R1が全て水素原子である化合物)
等が挙げられる。
Polymerizable compounds having a caprolactone structure are commercially available, for example, from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series, and DPCA-20 (m = 1 in the above formulas (Z-1) to (Z-3), Number of groups represented by (Z-2) = 2, a compound in which R 1 is all hydrogen atoms), DPCA-30 (formula, m = 1, number of groups represented by formula (Z-2)) = 3, a compound in which R 1 is all hydrogen atoms), DPCA-60 (same formula, m = 1, number of groups represented by formula (Z-2) = 6, a compound in which R 1 is all hydrogen atoms) ), And DPCA-120 (a compound in which m = 2, the number of groups represented by formula (Z-2) = 6, and all R 1 are hydrogen atoms)
Etc.
 重合性化合物は、下記一般式(Z-4)または(Z-5)で表される化合物を用いることもできる。 As the polymerizable compound, a compound represented by the following general formula (Z-4) or (Z-5) can also be used.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 一般式(Z-4)および(Z-5)中、Eは、各々独立に、-((CH2yCH2O)-、または-((CH2yCH(CH3)O)-を表し、yは、各々独立に0~10の整数を表し、Xは、各々独立に、(メタ)アクリロイル基、水素原子、またはカルボキシル基を表す。
 一般式(Z-4)中、(メタ)アクリロイル基の合計は3個または4個であり、mは各々独立に0~10の整数を表し、各mの合計は0~40の整数である。
 一般式(Z-5)中、(メタ)アクリロイル基の合計は5個または6個であり、nは各々独立に0~10の整数を表し、各nの合計は0~60の整数である。
In general formulas (Z-4) and (Z-5), each E independently represents — ((CH 2 ) y CH 2 O) — or — ((CH 2 ) y CH (CH 3 ) O). —, Each independently represents an integer of 0 to 10, and each X independently represents a (meth) acryloyl group, a hydrogen atom, or a carboxyl group.
In general formula (Z-4), the total number of (meth) acryloyl groups is 3 or 4, each m independently represents an integer of 0 to 10, and the total of each m is an integer of 0 to 40 .
In general formula (Z-5), the total number of (meth) acryloyl groups is 5 or 6, each n independently represents an integer of 0 to 10, and the total of each n is an integer of 0 to 60 .
 一般式(Z-4)中、mは、0~6の整数が好ましく、0~4の整数がより好ましい。
 また、各mの合計は、2~40の整数が好ましく、2~16の整数がより好ましく、4~8の整数がさらに好ましい。
 一般式(Z-5)中、nは、0~6の整数が好ましく、0~4の整数がより好ましい。
 また、各nの合計は、3~60の整数が好ましく、3~24の整数がより好ましく、6~12の整数がさらに好ましい。
 また、一般式(Z-4)または一般式(Z-5)中の-((CH2yCH2O)-または-((CH2yCH(CH3)O)-は、酸素原子側の末端がXに結合する形態が好ましい。
In general formula (Z-4), m is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
The total of each m is preferably an integer of 2 to 40, more preferably an integer of 2 to 16, and further preferably an integer of 4 to 8.
In general formula (Z-5), n is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
The total of each n is preferably an integer of 3 to 60, more preferably an integer of 3 to 24, and even more preferably an integer of 6 to 12.
In addition, — ((CH 2 ) y CH 2 O) — or — ((CH 2 ) y CH (CH 3 ) O) — in general formula (Z-4) or general formula (Z-5) is oxygen A form in which the end on the atom side is bonded to X is preferred.
 一般式(Z-4)または一般式(Z-5)で表される化合物は1種単独で用いてもよいし、2種以上併用してもよい。特に、一般式(Z-5)において、6個のX全てがアクリロイル基である形態、一般式(Z-5)において、6個のX全てがアクリロイル基である化合物と、6個のXのうち、少なくとも1個が水素原子ある化合物との混合物である態様が好ましい。このような構成とすることにより、現像性をより向上できる。 The compounds represented by formula (Z-4) or formula (Z-5) may be used alone or in combination of two or more. In particular, in the general formula (Z-5), a form in which all six Xs are acryloyl groups, in the general formula (Z-5), a compound in which all six Xs are acryloyl groups, Among these, an embodiment in which at least one is a mixture with a compound having a hydrogen atom is preferable. With such a configuration, the developability can be further improved.
 また、一般式(Z-4)または一般式(Z-5)で表される化合物の重合性化合物中における全含有量としては、20質量%以上が好ましく、50質量%以上がより好ましい。 The total content of the compound represented by the general formula (Z-4) or the general formula (Z-5) in the polymerizable compound is preferably 20% by mass or more, and more preferably 50% by mass or more.
 一般式(Z-4)または一般式(Z-5)で表される化合物は、従来公知の工程である、ペンタエリスリト-ルまたはジペンタエリスリト-ルにエチレンオキシドまたはプロピレンオキシドを開環付加反応により開環骨格を結合する工程と、開環骨格の末端ヒドロキシル基に、例えば(メタ)アクリロイルクロライドを反応させて(メタ)アクリロイル基を導入する工程と、から合成することができる。各工程はよく知られた工程であり、当業者は容易に一般式(Z-4)または(Z-5)で表される化合物を合成することができる。 The compound represented by the general formula (Z-4) or (Z-5) is a ring-opening addition of ethylene oxide or propylene oxide to pentaerythritol or dipentaerythritol, which is a conventionally known process. It can be synthesized from a step of bonding a ring-opening skeleton by reaction and a step of introducing a (meth) acryloyl group by reacting, for example, (meth) acryloyl chloride with a terminal hydroxyl group of the ring-opening skeleton. Each step is a well-known step, and a person skilled in the art can easily synthesize a compound represented by the general formula (Z-4) or (Z-5).
 一般式(Z-4)または一般式(Z-5)で表される化合物の中でも、ペンタエリスリトール誘導体および/またはジペンタエリスリトール誘導体がより好ましい。
 具体的には、下記式(a)~(f)で表される化合物が挙げられ、中でも、例示化合物(a)、(b)、(e)、(f)が好ましい。
Among the compounds represented by the general formula (Z-4) or the general formula (Z-5), pentaerythritol derivatives and / or dipentaerythritol derivatives are more preferable.
Specific examples include compounds represented by the following formulas (a) to (f), and among them, exemplary compounds (a), (b), (e), and (f) are preferable.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 一般式(Z-4)、(Z-5)で表される重合性化合物の市販品としては、例えばサートマー社製のエチレンオキシ鎖を4個有する4官能アクリレートであるSR-494、日本化薬株式会社製のペンチレンオキシ鎖を6個有する6官能アクリレートであるDPCA-60、および、イソブチレンオキシ鎖を3個有する3官能アクリレートであるTPA-330等が挙げられる。 Examples of commercially available polymerizable compounds represented by the general formulas (Z-4) and (Z-5) include SR-494, a tetrafunctional acrylate having four ethyleneoxy chains manufactured by Sartomer, Nippon Kayaku Examples thereof include DPCA-60, which is a hexafunctional acrylate having six pentyleneoxy chains, and TPA-330, which is a trifunctional acrylate having three isobutyleneoxy chains.
 重合性化合物としては、特公昭48-41708号公報、特開昭51-37193号公報、特公平2-32293号公報、および、特公平2-16765号公報に記載されているようなウレタンアクリレート類や、特公昭58-49860号公報、特公昭56-17654号公報、特公昭62-39417号公報、および、特公昭62-39418号公報に記載のエチレンオキサイド系骨格を有するウレタン化合物類も好適である。また、特開昭63-277653号公報、特開昭63-260909号公報、および、特開平1-105238号公報に記載される、分子内にアミノ構造やスルフィド構造を有する付加重合性化合物類を用いることによって、非常に感光スピードに優れた組成物を得ることができる。
 市販品としては、ウレタンオリゴマーUAS-10、UAB-140(山陽国策パルプ社製)、UA-7200(新中村化学社製)、DPHA-40H(日本化薬社製)、UA-306H、UA-306T、UA-306I、AH-600、T-600、および、AI-600(共栄社製)等が挙げられる。
Examples of the polymerizable compound include urethane acrylates as described in JP-B-48-41708, JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765. Urethane compounds having an ethylene oxide skeleton described in JP-B-58-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418 are also suitable. is there. Further, addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238 are disclosed. By using it, it is possible to obtain a composition excellent in the photosensitive speed.
Commercially available products include urethane oligomers UAS-10, UAB-140 (manufactured by Sanyo Kokusaku Pulp Co., Ltd.), UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA- 306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha) and the like.
 また、本発明に使用される重合性化合物は、SP(溶解パラメータ)値が、9.50以上であることが好ましく、10.40以上であることがより好ましく、10.60以上がさらに好ましい。
 なお、本明細書においてSP値は、特に断らない限り、Hoy法によって求める(H.L.Hoy Journal of Painting,1970,Vol.42,76-118)。また、SP値については単位を省略して示しているが、その単位はcal1/2cm-3/2である。
The polymerizable compound used in the present invention has an SP (solubility parameter) value of preferably 9.50 or more, more preferably 10.40 or more, and even more preferably 10.60 or more.
In this specification, the SP value is determined by the Hoy method unless otherwise specified (HL Hoy Journal of Paining, 1970, Vol. 42, 76-118). The SP value is shown with the unit omitted, but the unit is cal 1/2 cm −3/2 .
 また、組成物は、現像残渣低減の観点から、カルド骨格を有する重合性化合物を有することも好ましい。
 カルド骨格を有する重合性化合物としては、9,9-ビスアリールフルオレン骨格を有する重合性化合物が好ましく、下記式(Q3)で表される化合物がより好ましい。
The composition also preferably has a polymerizable compound having a cardo skeleton from the viewpoint of reducing development residue.
As the polymerizable compound having a cardo skeleton, a polymerizable compound having a 9,9-bisarylfluorene skeleton is preferable, and a compound represented by the following formula (Q3) is more preferable.
一般式(Q3)
Figure JPOXMLDOC01-appb-C000014
General formula (Q3)
Figure JPOXMLDOC01-appb-C000014
 上記一般式(Q3)中、Ar11~Ar14はそれぞれ独立に破線で囲まれたベンゼン環を含むアリール基を表す。X~Xはそれぞれ独立に重合性基を有する置換基を表し、上記置換基中の炭素原子はヘテロ原子によって置換されていてもよい。aおよびbはそれぞれ独立に1~5の整数を表し、cおよびdはそれぞれ独立に0~4の整数を表す。R~Rはそれぞれ独立に置換基を表し、e、f、gおよびhはそれぞれ独立に0以上の整数を表し、e、f、gおよびhの上限値はそれぞれAr11~Ar14が有することができる置換基の数からa、b、cまたはdを減じた値である。但し、Ar11~Ar14がそれぞれ独立に破線で囲まれたベンゼン環を縮合環のひとつとして含む多環芳香族炭化水素基である場合は、X~XおよびR~Rはそれぞれ独立に破線で囲まれたベンゼン環に置換していても、破線で囲まれたベンゼン環以外の環に置換していてもよい。 In the general formula (Q3), Ar 11 to Ar 14 each independently represents an aryl group containing a benzene ring surrounded by a broken line. X 1 to X 4 each independently represents a substituent having a polymerizable group, and the carbon atom in the substituent may be substituted with a hetero atom. a and b each independently represents an integer of 1 to 5, and c and d each independently represents an integer of 0 to 4. R 1 to R 4 each independently represents a substituent, e, f, g and h each independently represent an integer of 0 or more, and the upper limit values of e, f, g and h are Ar 11 to Ar 14 respectively. It is a value obtained by subtracting a, b, c or d from the number of substituents which can be possessed. However, when Ar 11 to Ar 14 are each independently a polycyclic aromatic hydrocarbon group containing a benzene ring surrounded by a broken line as one of the condensed rings, X 1 to X 4 and R 1 to R 4 are each It may be independently substituted with a benzene ring surrounded by a broken line, or may be substituted with a ring other than the benzene ring surrounded by a broken line.
 上記一般式(Q3)中、Ar11~Ar14が表す破線で囲まれたベンゼン環を含むアリール基は、炭素数6~14のアリール基であることが好ましく、炭素数6~10のアリール基(例えば、フェニル基、ナフチル基)であることがより好ましく、フェニル基(破線で囲まれたベンゼン環のみ)であることがさらに好ましい。 In the general formula (Q3), the aryl group containing a benzene ring surrounded by a broken line represented by Ar 11 to Ar 14 is preferably an aryl group having 6 to 14 carbon atoms, and an aryl group having 6 to 10 carbon atoms (For example, a phenyl group or a naphthyl group) is more preferable, and a phenyl group (only a benzene ring surrounded by a broken line) is further preferable.
 上記一般式(Q3)中、X~Xはそれぞれ独立に重合性基を有する置換基を表し、上記置換基中の炭素原子はヘテロ原子によって置換されていてもよい。X~Xが表す重合性基を有する置換基としては特に制限はないが、重合性基を有する脂肪族基であることが好ましい。
 X~Xが表す重合性基を有する脂肪族基としては、特に制限はないが、重合性基以外における炭素数が1~12のアルキレン基であることが好ましく、炭素数2~10のアルキレン基であることがより好ましく、炭素数2~5のアルキレン基であることがさらに好ましい。
 また、X~Xが表す重合性基を有する脂肪族基において、上記脂肪族基がヘテロ原子によって置換される場合は、-NR-(Rは置換基)、酸素原子、または、硫黄原子によって置換されていることが好ましく、上記脂肪族基中の隣り合わない-CH-が酸素原子または硫黄原子で置換されていることがより好ましく、上記脂肪族基中の隣り合わない-CH-が酸素原子で置換されていることがさらに好ましい。X~Xが表す重合性基を有する脂肪族基は、ヘテロ原子によって1~2箇所置換されていることが好ましく、ヘテロ原子によって1箇所置換されていることがより好ましく、Ar11~Ar14が表す破線で囲まれたベンゼン環を含むアリール基に隣接する1箇所がヘテロ原子によって置換されていることがさらに好ましい。
 X~Xが表す重合性基を有する脂肪族基に含まれる重合性基としては、ラジカル重合またはカチオン重合可能な重合性基(以下、それぞれラジカル重合性基およびカチオン重合性基とも言う)が好ましい。
 ラジカル重合性基としては、一般に知られているラジカル重合性基を用いることができ、好適なものとしてラジカル重合可能なエチレン性不飽和結合を有する重合性基を挙げることができ、具体的にはビニル基、(メタ)アクリロイルオキシ基等を挙げることができる。中でも、(メタ)アクリロイルオキシ基が好ましく、アクリロイルオキシ基がより好ましい。
 カチオン重合性基としては、一般に知られているカチオン重合性基を用いることができ、具体的には、脂環式エーテル基、環状アセタール基、環状ラクトン基、環状チオエーテル基、スピロオルソエステル基、および、ビニルオキシ基等を挙げることができる。中でも、脂環式エーテル基またはビニルオキシ基が好適であり、エポキシ基、オキセタニル基、または、ビニルオキシ基が特に好ましい。
 Ar~Arが含む置換基が有する上記重合性基は、ラジカル重合性基であることが好ましい。
 Ar~Arのうち2つ以上は重合性基を有する置換基を含み、Ar~Arのうち2~4個が重合性基を有する置換基を含むことが好ましく、Ar~Arのうち2または3個が重合性基を有する置換基を含むことがより好ましく、Ar~Arのうち2個が重合性基を有する置換基を含むことがさらに好ましい。
 Ar11~Ar14がそれぞれ独立に破線で囲まれたベンゼン環を縮合環のひとつとして含む多環芳香族炭化水素基である場合は、X~Xはそれぞれ独立に破線で囲まれたベンゼン環に置換していても、破線で囲まれたベンゼン環以外の環に置換していてもよい。
In the general formula (Q3), X 1 to X 4 each independently represents a substituent having a polymerizable group, and the carbon atom in the substituent may be substituted with a hetero atom. The substituent having a polymerizable group represented by X 1 to X 4 is not particularly limited, but is preferably an aliphatic group having a polymerizable group.
The aliphatic group having a polymerizable group represented by X 1 to X 4 is not particularly limited, but is preferably an alkylene group having 1 to 12 carbon atoms other than the polymerizable group, and having 2 to 10 carbon atoms. An alkylene group is more preferable, and an alkylene group having 2 to 5 carbon atoms is more preferable.
In the aliphatic group having a polymerizable group represented by X 1 to X 4 , when the aliphatic group is substituted with a hetero atom, —NR— (R is a substituent), an oxygen atom, or a sulfur atom The non-adjacent —CH 2 — in the aliphatic group is preferably substituted with an oxygen atom or a sulfur atom, and the non-adjacent —CH 2 in the aliphatic group is preferred. More preferably,-is substituted with an oxygen atom. The aliphatic group having a polymerizable group represented by X 1 to X 4 is preferably substituted at one or two sites by a hetero atom, more preferably substituted at one site by a hetero atom, Ar 11 to Ar More preferably, one position adjacent to the aryl group containing a benzene ring surrounded by a broken line represented by 14 is substituted with a heteroatom.
As the polymerizable group contained in the aliphatic group having a polymerizable group represented by X 1 to X 4 , a polymerizable group capable of radical polymerization or cationic polymerization (hereinafter, also referred to as a radical polymerizable group and a cationic polymerizable group, respectively) Is preferred.
As the radical polymerizable group, a generally known radical polymerizable group can be used, and a polymerizable group having an ethylenically unsaturated bond capable of radical polymerization can be mentioned as a preferred one. Specifically, Examples thereof include a vinyl group and a (meth) acryloyloxy group. Among these, a (meth) acryloyloxy group is preferable, and an acryloyloxy group is more preferable.
As the cationic polymerizable group, a generally known cationic polymerizable group can be used. Specifically, an alicyclic ether group, a cyclic acetal group, a cyclic lactone group, a cyclic thioether group, a spiro orthoester group, And a vinyloxy group etc. can be mentioned. Among these, an alicyclic ether group or a vinyloxy group is preferable, and an epoxy group, an oxetanyl group, or a vinyloxy group is particularly preferable.
The polymerizable group contained in the substituent contained in Ar 1 to Ar 4 is preferably a radical polymerizable group.
Two or more of Ar 1 ~ Ar 4 includes a substituent having a polymerizable group, preferably contains a substituent 2-4 of Ar 1 ~ Ar 4 has a polymerizable group, Ar 1 ~ Ar More preferably, 2 or 3 out of 4 contain a substituent having a polymerizable group, and more preferably 2 out of Ar 1 to Ar 4 contain a substituent having a polymerizable group.
When Ar 11 to Ar 14 are each independently a polycyclic aromatic hydrocarbon group containing a benzene ring surrounded by a broken line as one of the condensed rings, X 1 to X 4 are each independently benzene surrounded by a broken line Even if it is substituted with a ring, it may be substituted with a ring other than the benzene ring surrounded by a broken line.
 上記一般式(Q3)中、aおよびbはそれぞれ独立に1~5の整数を表し、1または2であることが好ましく、aおよびbがいずれも1であることがより好ましい。
 上記一般式(Q3)中、cおよびdはそれぞれ独立に0~5の整数を表し、0または1であることが好ましく、cおよびdがいずれも0であることがより好ましい。
In the general formula (Q3), a and b each independently represent an integer of 1 to 5, preferably 1 or 2, and more preferably a and b are all 1.
In the general formula (Q3), c and d each independently represents an integer of 0 to 5, preferably 0 or 1, and more preferably c and d are both 0.
 上記一般式(Q3)中、R~Rはそれぞれ独立に置換基を表す。R~Rが表す置換基としては特に制限はないが、例えば、ハロゲン原子、ハロゲン化アルキル基、アルキル基、アルケニル基、アシル基、ヒドロキシル基、ヒドロキシアルキル基、アルコキシ基、アリール基、ヘテロアリール基、および、脂環基等を挙げることができる。R~Rが表す置換基はアルキル基、アルコキシ基またはアリール基であることが好ましく、炭素数1~5のアルキル基、炭素数1~5のアルコキシ基またはフェニル基であることがより好ましく、メチル基、メトキシ基またはフェニル基であることがさらに好ましい。
 上記一般式(Q3)中、Ar11~Ar14がそれぞれ独立に破線で囲まれたベンゼン環を縮合環のひとつとして含む多環芳香族炭化水素基である場合は、R~Rはそれぞれ独立に破線で囲まれたベンゼン環に置換していても、破線で囲まれたベンゼン環以外の環に置換していてもよい。
In the general formula (Q3), R 1 to R 4 each independently represents a substituent. The substituent represented by R 1 to R 4 is not particularly limited, and examples thereof include halogen atoms, halogenated alkyl groups, alkyl groups, alkenyl groups, acyl groups, hydroxyl groups, hydroxyalkyl groups, alkoxy groups, aryl groups, hetero groups An aryl group, an alicyclic group, etc. can be mentioned. The substituent represented by R 1 to R 4 is preferably an alkyl group, an alkoxy group or an aryl group, more preferably an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms or a phenyl group. And more preferably a methyl group, a methoxy group or a phenyl group.
In the general formula (Q3), when Ar 11 to Ar 14 are each independently a polycyclic aromatic hydrocarbon group containing a benzene ring surrounded by a broken line as one of the condensed rings, R 1 to R 4 are each It may be independently substituted with a benzene ring surrounded by a broken line, or may be substituted with a ring other than the benzene ring surrounded by a broken line.
 上記一般式(Q3)中、e、f、gおよびhはそれぞれ独立に0以上の整数を表し、e、f、gおよびhの上限値はそれぞれAr11~Ar14が有することができる置換基の数からa、b、cまたはdを減じた値である。
 e、f、gおよびhはそれぞれ独立に0~8であることが好ましく、0~2であることがより好ましく、0であることがさらに好ましい。
 Ar11~Ar14がそれぞれ独立に破線で囲まれたベンゼン環を縮合環のひとつとして含む多環芳香族炭化水素基である場合、e、f、gおよびhは0または1であることが好ましく、0であることがより好ましい。
In the general formula (Q3), e, f, g, and h each independently represent an integer of 0 or more, and the upper limit values of e, f, g, and h can each be a substituent that Ar 11 to Ar 14 can have. The value obtained by subtracting a, b, c, or d from the number of.
e, f, g and h are each independently preferably 0 to 8, more preferably 0 to 2, and still more preferably 0.
When Ar 11 to Ar 14 are each independently a polycyclic aromatic hydrocarbon group containing a benzene ring surrounded by a broken line as one of the condensed rings, e, f, g and h are preferably 0 or 1 , 0 is more preferable.
 上記式(Q3)で表される化合物としては、例えば、9,9-ビス[4-(2-アクリロイルオキシエトキシ)フェニル]フルオレン等が挙げられる。9,9-ビスアリールフルオレン骨格を有する重合性化合物としては、特開2010-254732号公報記載の化合物類も好適に用いることができる。 Examples of the compound represented by the formula (Q3) include 9,9-bis [4- (2-acryloyloxyethoxy) phenyl] fluorene. As the polymerizable compound having a 9,9-bisarylfluorene skeleton, compounds described in JP 2010-254732 A can also be suitably used.
 本発明の組成物が重合性化合物を含有する場合において、重合性化合物の含有量は、組成物の全固形分に対し、0.1~40質量%が好ましい。下限は、例えば0.5質量%以上がより好ましく、1質量%以上がさらに好ましい。上限は、例えば、30質量%以下がより好ましく、20質量%以下がさらに好ましい。
 重合性化合物は、1種単独であってもよいし、2種以上を併用してもよい。2種以上を併用する場合は、合計量が上記範囲となることが好ましい。
When the composition of the present invention contains a polymerizable compound, the content of the polymerizable compound is preferably 0.1 to 40% by mass with respect to the total solid content of the composition. For example, the lower limit is more preferably 0.5% by mass or more, and further preferably 1% by mass or more. For example, the upper limit is more preferably 30% by mass or less, and further preferably 20% by mass or less.
One type of polymerizable compound may be used alone, or two or more types may be used in combination. When using 2 or more types together, it is preferable that a total amount becomes the said range.
<重合開始剤>
 本発明の組成物は、重合開始剤を含有することが好ましい。
 重合開始剤としては特に制限はなく、公知の重合開始剤の中から適宜選択することができ、例えば、感光性を有するもの(いわゆる、光重合開始剤)が好ましい。
 本発明の組成物は、チタン窒化物含有粒子の他に、光重合開始剤および上述した重合性化合物を含有する場合には、活性光線または放射線の照射により硬化することから、「感光性組成物」と呼ばれることがある。
 光重合開始剤としては、重合性化合物の重合を開始する能力を有する限り、特に制限はなく、公知の光重合開始剤の中から適宜選択することができる。例えば、紫外線領域から可視の光線に対して感光性を有するものが好ましい。また、光励起された増感剤と何らかの作用を生じ、活性ラジカルを生成する活性剤であってもよく、モノマーの種類に応じてカチオン重合を開始させるような開始剤であってもよい。
 また、光重合開始剤は、約300nm~800nm(330nm~500nmがより好ましい。)の範囲内に少なくとも約50のモル吸光係数を有する化合物を、少なくとも1種含有していることが好ましい。
<Polymerization initiator>
The composition of the present invention preferably contains a polymerization initiator.
There is no restriction | limiting in particular as a polymerization initiator, It can select suitably from well-known polymerization initiators, For example, what has photosensitivity (what is called a photoinitiator) is preferable.
When the composition of the present invention contains a photopolymerization initiator and the above-described polymerizable compound in addition to the titanium nitride-containing particles, the composition is cured by irradiation with actinic rays or radiation. Sometimes called.
The photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of a polymerizable compound, and can be appropriately selected from known photopolymerization initiators. For example, those having photosensitivity to visible light from the ultraviolet region are preferable. Further, it may be an activator that generates some action with a photoexcited sensitizer and generates an active radical, or may be an initiator that initiates cationic polymerization according to the type of monomer.
The photopolymerization initiator preferably contains at least one compound having a molar extinction coefficient of at least about 50 within a range of about 300 nm to 800 nm (more preferably 330 nm to 500 nm).
 光重合開始剤としては、例えば、ハロゲン化炭化水素誘導体(例えば、トリアジン骨格を有するもの、オキサジアゾール骨格を有するもの、等)、アシルホスフィンオキサイド等のアシルホスフィン化合物、ヘキサアリールビイミダゾール、オキシム誘導体等のオキシム化合物、有機過酸化物、チオ化合物、ケトン化合物、芳香族オニウム塩、ケトオキシムエーテル、アミノアセトフェノン化合物、および、ヒドロキシアセトフェノン等が挙げられる。上記トリアジン骨格を有するハロゲン化炭化水素化合物としては、例えば、若林ら著、Bull.Chem.Soc.Japan,42、2924(1969)記載の化合物、英国特許1388492号明細書記載の化合物、特開昭53-133428号公報記載の化合物、独国特許3337024号明細書記載の化合物、F.C.Schaefer等によるJ.Org.Chem.;29、1527(1964)記載の化合物、特開昭62-58241号公報記載の化合物、特開平5-281728号公報記載の化合物、特開平5-34920号公報記載化合物、および、米国特許第4212976号明細書に記載されている化合物等が挙げられる。 Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.), acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime derivatives. Oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, hydroxyacetophenones, and the like. Examples of the halogenated hydrocarbon compound having a triazine skeleton include those described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), a compound described in British Patent No. 1388492, a compound described in JP-A-53-133428, a compound described in German Patent No. 3337024, F.I. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), a compound described in JP-A-62-258241, a compound described in JP-A-5-281728, a compound described in JP-A-5-34920, and U.S. Pat. No. 4,221,976. And the compounds described in the specification.
 また、露光感度の観点から、トリハロメチルトリアジン化合物、ベンジルジメチルケタール化合物、α-ヒドロキシケトン化合物、α-アミノケトン化合物、アシルホスフィン化合物、フォスフィンオキサイド化合物、メタロセン化合物、オキシム化合物、トリアリルイミダゾールダイマー、オニウム化合物、ベンゾチアゾール化合物、ベンゾフェノン化合物、アセトフェノン化合物およびその誘導体、シクロペンタジエン-ベンゼン-鉄錯体およびその塩、ハロメチルオキサジアゾール化合物、ならびに、3-アリール置換クマリン化合物からなる群より選択される化合物が好ましい。 From the viewpoint of exposure sensitivity, trihalomethyltriazine compounds, benzyldimethylketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triallylimidazole dimers, oniums A compound selected from the group consisting of a compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound and a derivative thereof, a cyclopentadiene-benzene-iron complex and a salt thereof, a halomethyloxadiazole compound, and a 3-aryl-substituted coumarin compound preferable.
 さらに好ましくは、トリハロメチルトリアジン化合物、α-アミノケトン化合物、アシルホスフィン化合物、フォスフィンオキサイド化合物、オキシム化合物、トリアリルイミダゾールダイマー、オニウム化合物、ベンゾフェノン化合物、アセトフェノン化合物であり、トリハロメチルトリアジン化合物、α-アミノケトン化合物、オキシム化合物、トリアリルイミダゾールダイマー、ベンゾフェノン化合物からなる群より選ばれる少なくとも一種の化合物が特に好ましい。 More preferred are trihalomethyltriazine compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, oxime compound, triallylimidazole dimer, onium compound, benzophenone compound, acetophenone compound, trihalomethyltriazine compound, α-aminoketone Particularly preferred is at least one compound selected from the group consisting of compounds, oxime compounds, triallylimidazole dimer, and benzophenone compounds.
 特に、本発明の組成物を固体撮像素子の遮光膜の作製に使用する場合には、微細なパターンをシャープな形状で形成する必要があるために、硬化性と共に未露光部に残渣がなく現像されることが重要である。このような観点からは、光重合開始剤としてはオキシム化合物を使用することが特に好ましい。特に、固体撮像素子において微細なパターンを形成する場合、硬化用露光にステッパー露光を用いるが、この露光機はハロゲンにより損傷される場合があり、光重合開始剤の添加量も低く抑える必要があるため、これらの点を考慮すれば、固体撮像素子の如き微細パターンを形成するには光重合開始剤としては、オキシム化合物を用いるのが特に好ましい。また、オキシム化合物を用いることにより、色移り性をより良化できる。
 光重合開始剤の具体例としては、例えば、特開2013-29760号公報の段落0265~0268を参酌することができ、この内容は本明細書に組み込まれる。
In particular, when the composition of the present invention is used for the production of a light-shielding film of a solid-state imaging device, it is necessary to form a fine pattern with a sharp shape, so that development is possible with no residue in the unexposed area. It is important that From such a viewpoint, it is particularly preferable to use an oxime compound as the photopolymerization initiator. In particular, when a fine pattern is formed in a solid-state imaging device, stepper exposure is used for curing exposure, but this exposure machine may be damaged by halogen, and the amount of photopolymerization initiator added must be kept low. Therefore, in view of these points, it is particularly preferable to use an oxime compound as a photopolymerization initiator for forming a fine pattern such as a solid-state imaging device. Further, the use of an oxime compound can improve the color transfer.
As specific examples of the photopolymerization initiator, for example, paragraphs 0265 to 0268 of JP2013-29760A can be referred to, and the contents thereof are incorporated in the present specification.
 光重合開始剤としては、ヒドロキシアセトフェノン化合物、アミノアセトフェノン化合物、および、アシルホスフィン化合物も好適に用いることができる。より具体的には、例えば、特開平10-291969号公報に記載のアミノアセトフェノン系開始剤、特許第4225898号公報に記載のアシルホスフィン系開始剤も用いることができる。
 ヒドロキシアセトフェノン系開始剤としては、IRGACURE-184、DAROCUR-1173、IRGACURE-500、IRGACURE-2959、および、IRGACURE-127(商品名:いずれもBASF社製)を用いることができる。
 アミノアセトフェノン系開始剤としては、市販品であるIRGACURE-907、IRGACURE-369、および、IRGACURE-379EG(商品名:いずれもBASF社製)を用いることができる。アミノアセトフェノン系開始剤は、365nmまたは405nm等の長波光源に吸収波長がマッチングされた特開2009-191179公報に記載の化合物も用いることができる。
 アシルホスフィン系開始剤としては、市販品であるIRGACURE-819およびDAROCUR-TPO(商品名:いずれもBASF社製)を用いることができる。
As the photopolymerization initiator, hydroxyacetophenone compounds, aminoacetophenone compounds, and acylphosphine compounds can also be suitably used. More specifically, for example, an aminoacetophenone initiator described in JP-A-10-291969 and an acylphosphine initiator described in Japanese Patent No. 4225898 can also be used.
As the hydroxyacetophenone initiator, IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (trade names: all manufactured by BASF) can be used.
As the aminoacetophenone-based initiator, commercially available products IRGACURE-907, IRGACURE-369, and IRGACURE-379EG (trade names: all manufactured by BASF) can be used. As the aminoacetophenone-based initiator, a compound described in JP-A-2009-191179 in which an absorption wavelength is matched with a long wave light source such as 365 nm or 405 nm can also be used.
As the acylphosphine-based initiator, commercially available products IRGACURE-819 and DAROCUR-TPO (trade names: both manufactured by BASF) can be used.
 光重合開始剤として、より好ましくはオキシム化合物が挙げられる。特にオキシム系開始剤は高感度で重合効率が高く、色材濃度によらず硬化でき、色材の濃度を高く設計しやすいため好ましい。
 オキシム化合物の具体例としては、特開2001-233842号公報記載の化合物、特開2000-80068号公報記載の化合物、および、特開2006-342166号公報記載の化合物を用いることができる。
 本発明において、好適に用いることのできるオキシム化合物としては、例えば、3-ベンゾイロキシイミノブタン-2-オン、3-アセトキシイミノブタン-2-オン、3-プロピオニルオキシイミノブタン-2-オン、2-アセトキシイミノペンタン-3-オン、2-アセトキシイミノ-1-フェニルプロパン-1-オン、2-ベンゾイロキシイミノ-1-フェニルプロパン-1-オン、3-(4-トルエンスルホニルオキシ)イミノブタン-2-オン、および2-エトキシカルボニルオキシイミノ-1-フェニルプロパン-1-オン等が挙げられる。
 また、J.C.S.Perkin II(1979年)pp.1653-1660)、J.C.S.Perkin II(1979年)pp.156-162、Journal of Photopolymer Science and Technology(1995年)pp.202-232、特開2000-66385号公報記載の化合物、特開2000-80068号公報、特表2004-534797号公報、および、特開2006-342166号公報の各公報に記載の化合物等も挙げられる。
 市販品ではIRGACURE-OXE01(BASF社製)、IRGACURE-OXE02(BASF社製)も好適に用いられる。また、TR-PBG-304(常州強力電子新材料有限公司社製)、アデカアークルズNCI-831およびアデカアークルズNCI-930(ADEKA社製)も用いることができる。また、N-1919(ADEKA社製)も使用することができる。
More preferred examples of the photopolymerization initiator include oxime compounds. In particular, an oxime initiator is preferable because it has high sensitivity and high polymerization efficiency, can be cured regardless of the color material concentration, and can be easily designed with a high color material concentration.
As specific examples of the oxime compound, a compound described in JP-A-2001-233842, a compound described in JP-A-2000-80068, and a compound described in JP-A-2006-342166 can be used.
Examples of the oxime compound that can be suitably used in the present invention include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3- (4-toluenesulfonyloxy) iminobutane Examples include -2-one and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one.
In addition, J.H. C. S. Perkin II (1979) pp. 1653-1660), J.M. C. S. Perkin II (1979) pp. 156-162, Journal of Photopolymer Science and Technology (1995) pp. Examples include compounds described in 202-232, JP-A No. 2000-66385, JP-A No. 2000-80068, JP-T 2004-534797, and JP-A No. 2006-342166. It is done.
As commercially available products, IRGACURE-OXE01 (manufactured by BASF) and IRGACURE-OXE02 (manufactured by BASF) are also preferably used. Also, TR-PBG-304 (manufactured by Changzhou Powerful Electronic New Materials Co., Ltd.), Adeka Arkles NCI-831 and Adeka Arkles NCI-930 (made by ADEKA) can be used. N-1919 (manufactured by ADEKA) can also be used.
 また上記記載以外のオキシム化合物として、カルバゾールN位にオキシムが連結した特表2009-519904号公報に記載の化合物、ベンゾフェノン部位にヘテロ置換基が導入された米国特許第7626957号公報に記載の化合物、色素部位にニトロ基が導入された特開2010-15025号公報および米国特許公開2009-292039号記載の化合物、国際公開特許2009-131189号公報に記載のケトオキシム化合物、トリアジン骨格とオキシム骨格を同一分子内に含有する米国特許7556910号公報に記載の化合物、および、405nmに吸収極大を有しg線光源に対して良好な感度を有する特開2009-221114号公報記載の化合物等を用いてもよい。
 好ましくは、例えば、特開2013-29760号公報の段落0274~0275を参酌することができ、この内容は本明細書に組み込まれる。
 具体的には、オキシム化合物としては、下記式(OX-1)で表される化合物が好ましい。なお、オキシムのN-O結合が(E)体のオキシム化合物であっても、(Z)体のオキシム化合物であっても、(E)体と(Z)体との混合物であってもよい。
Further, as oxime compounds other than those described above, compounds described in JP-A-2009-519904 in which an oxime is linked to the carbazole N-position, compounds described in US Pat. No. 7,626,957 in which a hetero substituent is introduced into the benzophenone moiety, Compounds described in Japanese Patent Application Laid-Open No. 2010-15025 and US Patent Publication No. 2009-292039 in which a nitro group is introduced at the dye moiety, ketoxime compounds described in International Patent Publication No. 2009-131189, the triazine skeleton and the oxime skeleton are the same molecule The compounds described in US Pat. No. 7,556,910 and the compounds described in JP-A-2009-221114 having an absorption maximum at 405 nm and good sensitivity to a g-ray light source may be used. .
Preferably, for example, paragraphs 0274 to 0275 of JP 2013-29760 A can be referred to, the contents of which are incorporated herein.
Specifically, the oxime compound is preferably a compound represented by the following formula (OX-1). The oxime N—O bond may be an (E) oxime compound, a (Z) oxime compound, or a mixture of (E) and (Z) isomers. .
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 一般式(OX-1)中、RおよびBは各々独立に一価の置換基を表し、Aは二価の有機基を表し、Arはアリール基を表す。
 一般式(OX-1)中、Rで表される一価の置換基としては、一価の非金属原子団であることが好ましい。
 一価の非金属原子団としては、アルキル基、アリール基、アシル基、アルコキシカルボニル基、アリールオキシカルボニル基、複素環基、アルキルチオカルボニル基、および、アリールチオカルボニル基等が挙げられる。また、これらの基は、1以上の置換基を有していてもよい。また、前述した置換基は、さらに他の置換基で置換されていてもよい。
 置換基としてはハロゲン原子、アリールオキシ基、アルコキシカルボニル基またはアリールオキシカルボニル基、アシルオキシ基、アシル基、アルキル基、および、アリール基等が挙げられる。
 一般式(OX-1)中、Bで表される一価の置換基としては、アリール基、複素環基、アリールカルボニル基、または、複素環カルボニル基が好ましい。これらの基は1以上の置換基を有していてもよい。置換基としては、前述した置換基が例示できる。
 一般式(OX-1)中、Aで表される二価の有機基としては、炭素数1~12のアルキレン基、シクロアルキレン基、または、アルキニレン基が好ましい。これらの基は1以上の置換基を有していてもよい。置換基としては、前述した置換基が例示できる。
In general formula (OX-1), R and B each independently represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group.
In the general formula (OX-1), the monovalent substituent represented by R is preferably a monovalent nonmetallic atomic group.
Examples of the monovalent nonmetallic atomic group include an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic group, an alkylthiocarbonyl group, and an arylthiocarbonyl group. Moreover, these groups may have one or more substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
Examples of the substituent include a halogen atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, an acyloxy group, an acyl group, an alkyl group, and an aryl group.
In general formula (OX-1), the monovalent substituent represented by B is preferably an aryl group, a heterocyclic group, an arylcarbonyl group, or a heterocyclic carbonyl group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents.
In the general formula (OX-1), the divalent organic group represented by A is preferably an alkylene group having 1 to 12 carbon atoms, a cycloalkylene group, or an alkynylene group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents.
 本発明は、光重合開始剤として、フッ素原子を有するオキシム化合物を用いることもできる。フッ素原子を有するオキシム化合物の具体例としては、特開2010-262028号公報記載の化合物、特表2014-500852号公報記載の化合物24、36~40、および、特開2013-164471号公報記載の化合物(C-3)等が挙げられる。この内容は本明細書に組み込まれることとする。 In the present invention, an oxime compound having a fluorine atom can also be used as a photopolymerization initiator. Specific examples of the oxime compound having a fluorine atom include compounds described in JP 2010-262028 A, compounds 24 and 36 to 40 described in JP-A-2014-500852, and JP-A 2013-164471. Examples thereof include compound (C-3). This content is incorporated herein.
 本発明は、光重合開始剤として、下記一般式(1)または(2)で表される化合物を用いることもできる。 In the present invention, a compound represented by the following general formula (1) or (2) can also be used as a photopolymerization initiator.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 式(1)において、RおよびRは、それぞれ独立に、炭素数1~20のアルキル基、炭素数4~20の脂環式炭化水素基、炭素数6~30のアリール基、または、炭素数7~30のアリールアルキル基を表し、RおよびRがフェニル基の場合、フェニル基同士が結合してフルオレン基を形成してもよく、RおよびRは、それぞれ独立に、水素原子、炭素数1~20のアルキル基、炭素数6~30のアリール基、炭素数7~30のアリールアルキル基または炭素数4~20の複素環基を表し、Xは、単結合またはカルボニル基を示す。 In the formula (1), R 1 and R 2 are each independently an alkyl group having 1 to 20 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or When R 1 and R 2 are phenyl groups, the phenyl groups may be bonded to each other to form a fluorene group, and R 3 and R 4 are each independently Represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a heterocyclic group having 4 to 20 carbon atoms, and X is a single bond or carbonyl group Indicates a group.
 式(2)において、R、R、RおよびRは、式(1)におけるR、R、RおよびRと同義であり、Rは、-R、-OR、-SR、-COR、-CONR、-NRCOR、-OCOR、-COOR、-SCOR、-OCSR、-COSR、-CSOR、-CN、ハロゲン原子または水酸基を表し、Rは、炭素数1~20のアルキル基、炭素数6~30のアリール基、炭素数7~30のアリールアルキル基または炭素数4~20の複素環基を表し、Xは、単結合またはカルボニル基を表し、aは0~4の整数を表す。 In the formula (2), R 1, R 2, R 3 and R 4 have the same meanings as R 1, R 2, R 3 and R 4 in the formula (1), R 5 is -R 6, -OR 6 , —SR 6 , —COR 6 , —CONR 6 R 6 , —NR 6 COR 6 , —OCOR 6 , —COOR 6 , —SCOR 6 , —OCSR 6 , —COSR 6 , —CSOR 6 , —CN, halogen R 6 represents an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a heterocyclic group having 4 to 20 carbon atoms; X represents a single bond or a carbonyl group, and a represents an integer of 0 to 4.
 上記式(1)および式(2)において、RおよびRは、それぞれ独立に、メチル基、エチル基、n-プロピル基、イソプロピル、シクロヘキシル基またはフェニル基が好ましい。Rはメチル基、エチル基、フェニル基、トリル基またはキシリル基が好ましい。Rは炭素数1~6のアルキル基またはフェニル基が好ましい。Rはメチル基、エチル基、フェニル基、トリル基またはナフチル基が好ましい。Xは単結合が好ましい。
 式(1)および式(2)で表される化合物の具体例としては、例えば、特開2014-137466号公報の段落番号0076~0079に記載された化合物が挙げられる。この内容は本明細書に組み込まれることとする。
In the above formulas (1) and (2), R 1 and R 2 are preferably each independently a methyl group, ethyl group, n-propyl group, isopropyl, cyclohexyl group or phenyl group. R 3 is preferably a methyl group, an ethyl group, a phenyl group, a tolyl group or a xylyl group. R 4 is preferably an alkyl group having 1 to 6 carbon atoms or a phenyl group. R 5 is preferably a methyl group, an ethyl group, a phenyl group, a tolyl group or a naphthyl group. X is preferably a single bond.
Specific examples of the compounds represented by formula (1) and formula (2) include, for example, compounds described in paragraph numbers 0076 to 0079 of JP-A No. 2014-137466. This content is incorporated herein.
 本発明において好ましく使用されるオキシム化合物の具体例を以下に示すが、本発明はこれらに限定されるものではない。 Specific examples of oxime compounds that are preferably used in the present invention are shown below, but the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 本発明は、光重合開始剤として、ベンゾフラン骨格を有するオキシム化合物を用いることもできる。
 具体例としては、WO2015/036910公報に記載されるOE-01~OE-75が挙げられる。
In the present invention, an oxime compound having a benzofuran skeleton can also be used as a photopolymerization initiator.
Specific examples include OE-01 to OE-75 described in WO2015 / 036910.
 また、市販されている重合開始剤としては、特に限定はされないが、BASFジャパン社製 IRGACURE OXE 01(1.2-オクタンジオン,1-[4-(フェニルチオ)-,2-(O-ベンゾイルオキシム)])、IRGACURE OXE 02(エタノン,1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-,1-(O-アセチルオキシム))、2-(アセチルオキシイミノメチル)チオキサンテン-9-オン、O-アシルオキシム系化合物(例えば、ADEKA社製 アデカオプトマー N-1919、アデカアークルズ NCI-831)、アデカアークルズNCI-930、IRGACURE-OXE03、IRGACURE-OXE04等も挙げられ、これらの内容は本明細書に組み込まれる。 Commercially available polymerization initiators are not particularly limited, but IRGACURE OXE 01 (1.2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime) manufactured by BASF Japan Ltd. )]), IRGACURE OXE 02 (ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (O-acetyloxime)), 2- (acetyl Oxyiminomethyl) thioxanthen-9-one, O-acyloxime compounds (for example, Adekaoptomer N-1919, Adeka Arcles NCI-831, manufactured by ADEKA), Adeka Arcles NCI-930, IRGACURE-OXE03, IRGACURE -OXE04 etc. are mentioned, and these contents are It is incorporated in the book.
 オキシム化合物は、350nm~500nmの波長領域に極大吸収波長を有するものが好ましく、360nm~480nmの波長領域に極大吸収波長を有するものがより好ましく、365nmおよび405nmの吸光度が高いものが特に好ましい。
 オキシム化合物は、365nmまたは405nmにおけるモル吸光係数は、感度の観点から、1,000~300,000であることが好ましく、2,000~300,000であることがより好ましく、5,000~200,000であることがさらに好ましい。
 化合物のモル吸光係数は、公知の方法を用いることができるが、例えば、紫外可視分光光度計(Varian社製Cary-5 spctrophotometer)にて、酢酸エチル溶媒を用い、0.01g/Lの濃度で測定することが好ましい。
 本発明に用いられる光重合開始剤は、必要に応じて2種以上を組み合わせて使用してもよい。
The oxime compound preferably has a maximum absorption wavelength in the wavelength region of 350 nm to 500 nm, more preferably has a maximum absorption wavelength in the wavelength region of 360 nm to 480 nm, and particularly preferably has a high absorbance at 365 nm and 405 nm.
The molar extinction coefficient at 365 nm or 405 nm of the oxime compound is preferably from 1,000 to 300,000, more preferably from 2,000 to 300,000, more preferably from 5,000 to 200, from the viewpoint of sensitivity. More preferably, it is 1,000.
For the molar extinction coefficient of the compound, a known method can be used. For example, in a UV-visible spectrophotometer (Cary-5 spctrophotometer manufactured by Varian), an ethyl acetate solvent is used at a concentration of 0.01 g / L. It is preferable to measure.
You may use the photoinitiator used for this invention in combination of 2 or more type as needed.
 本発明の組成物が重合開始剤を含有する場合、重合開始剤の含有量は、組成物中の全固形分に対して、0.1~30質量%であることが好ましく、1~25質量%であることがより好ましく、1~10質量%であることがさらに好ましい。本発明の組成物は、重合開始剤を、1種類のみを含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。 When the composition of the present invention contains a polymerization initiator, the content of the polymerization initiator is preferably 0.1 to 30% by mass relative to the total solid content in the composition, and is preferably 1 to 25% by mass. %, More preferably 1 to 10% by mass. The composition of the present invention may contain only one kind of polymerization initiator, or may contain two or more kinds. When two or more types are included, the total amount is preferably within the above range.
<溶剤>
 本発明の組成物は、溶剤を含有することが好ましく、有機溶剤を含有することがより好ましい。
 有機溶剤の例としては、例えば、アセトン、メチルエチルケトン、シクロヘキサン、酢酸エチル、エチレンジクロライド、テトラヒドロフラン、トルエン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、アセチルアセトン、シクロヘキサノン、シクロペンタノン、ジアセトンアルコール、エチレングリコールモノメチルエーテルアセテート、エチレングリコールエチルエーテルアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテルアセテート、3-メトキシプロパノール、メトキシメトキシエタノール、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、エチル3-エトキシプロピオネート、3-メトキシプロピルアセテート、N,N-ジメチルホルムアミド、ジメチルスルホキシド、γ-ブチロラクトン、酢酸エチル、酢酸ブチル、乳酸メチル、および、乳酸エチル等が挙げられるが、これらに限定されない。
<Solvent>
The composition of the present invention preferably contains a solvent, and more preferably contains an organic solvent.
Examples of organic solvents include, for example, acetone, methyl ethyl ketone, cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether. , Acetylacetone, cyclohexanone, cyclopentanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 3-methoxypropanol, methoxymethoxyethanol, diethylene glycol Nomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethyl 3-ethoxypropionate, 3-methoxypropyl acetate, N, N-dimethylformamide, Examples include, but are not limited to, dimethyl sulfoxide, γ-butyrolactone, ethyl acetate, butyl acetate, methyl lactate, and ethyl lactate.
 本発明の組成物は、有機溶剤を1種含有していてもよいし、2種以上の有機溶剤を含有していてもよいが、本発明の組成物の調液時にチタン窒化物含有粒子の粒径変動を抑制できるという点から、2種以上の有機溶剤を含有することが好ましい。
 2種以上の有機溶剤を含有する場合には、上記の3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エチルセロソルブアセテート、乳酸エチル、ジエチレングリコールジメチルエーテル、酢酸ブチル、3-メトキシプロピオン酸メチル、2-ヘプタノン、シクロヘキサノン、シクロペンタノン、エチルカルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテル、エチル3-エトキシプロピオネートおよびプロピレングリコールモノメチルエーテルアセテートからなる群から選択される2種以上で構成されることが好ましい。
The composition of the present invention may contain one kind of organic solvent or two or more kinds of organic solvents, but the titanium nitride-containing particles of the composition of the present invention may be prepared during the preparation of the composition of the present invention. It is preferable to contain two or more kinds of organic solvents from the viewpoint that the particle size fluctuation can be suppressed.
When two or more organic solvents are contained, the above-mentioned methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, -Consists of two or more selected from the group consisting of heptanone, cyclohexanone, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, ethyl 3-ethoxypropionate and propylene glycol monomethyl ether acetate It is preferable.
 本発明の組成物が有機溶剤を含有する場合、有機溶剤の含有量としては、組成物の全質量に対し、10~90質量%であることが好ましく、60~90質量%であることがより好ましい。有機溶剤を2種類以上含む場合は、その合計量が上記範囲となることが好ましい。 When the composition of the present invention contains an organic solvent, the content of the organic solvent is preferably 10 to 90% by mass and more preferably 60 to 90% by mass with respect to the total mass of the composition. preferable. When two or more types of organic solvents are included, the total amount is preferably within the above range.
<水>
 本発明の組成物は、水を含有してもよい。水は、意図的に添加されるものであってもよいし、本発明の組成物に含まれる各成分を添加することで不可避的に組成物中に含有されるものであってもよい。
 水の含有量は、組成物全質量に対して、0.1~1質量%であることが好ましく、0.1~0.8質量%であることがより好ましく、0.1~0.4質量%であることがさらに好ましい。水の含有量が上記範囲内にあることで、硬化膜を作製したときのパターニング性(解像性)に優れ、電極材料の防食性にも優れる。また、水の含有量を、組成物全質量に対して0.1~1質量%とすることで、組成物中のパーティクル量をより低減できるほか、組成物の粘度経時安定性にもより優れる。
<Water>
The composition of the present invention may contain water. Water may be intentionally added, or may be inevitably contained in the composition by adding each component contained in the composition of the present invention.
The water content is preferably 0.1 to 1% by mass, more preferably 0.1 to 0.8% by mass, and more preferably 0.1 to 0.4% by mass with respect to the total mass of the composition. More preferably, it is mass%. When the water content is within the above range, the patterning property (resolution) when a cured film is produced is excellent, and the corrosion resistance of the electrode material is also excellent. Moreover, by setting the water content to 0.1 to 1% by mass with respect to the total mass of the composition, the amount of particles in the composition can be further reduced, and the viscosity aging stability of the composition is also excellent. .
<他の成分>
 本発明の組成物中には、上述した成分以外の他の成分が含まれていてもよい。
 以下、各成分について詳述する。
<Other ingredients>
In the composition of this invention, other components other than the component mentioned above may be contained.
Hereinafter, each component will be described in detail.
(シランカップリング剤)
 シランカップリング剤とは、分子中に加水分解性基とそれ以外の官能基を有する化合物である。なお、アルコキシ基等の加水分解性基は、珪素原子に結合している。
 加水分解性基とは、珪素原子に直結し、加水分解反応および/または縮合反応によってシロキサン結合を生じ得る置換基をいう。加水分解性基としては、例えば、ハロゲン原子、アルコキシ基、アシルオキシ基、および、アルケニルオキシ基が挙げられる。加水分解性基が炭素原子を有する場合、その炭素数は6以下であることが好ましく、4以下であることがより好ましい。特に、炭素数4以下のアルコキシ基または炭素数4以下のアルケニルオキシ基が好ましい。
 また、シランカップリング剤は基板と硬化膜間の密着性を向上させるため、フッ素原子および珪素原子(ただし、加水分解性基が結合した珪素原子は除く)を含まないことが好ましく、フッ素原子、珪素原子(ただし、加水分解性基が結合した珪素原子は除く)、珪素原子で置換されたアルキレン基、炭素数8以上の直鎖アルキル基、および、炭素数3以上の分鎖アルキル基は含まないことが望ましい。
(Silane coupling agent)
A silane coupling agent is a compound having a hydrolyzable group and other functional groups in the molecule. Note that a hydrolyzable group such as an alkoxy group is bonded to a silicon atom.
The hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can form a siloxane bond by a hydrolysis reaction and / or a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group, and an alkenyloxy group. When the hydrolyzable group has a carbon atom, the number of carbon atoms is preferably 6 or less, and more preferably 4 or less. In particular, an alkoxy group having 4 or less carbon atoms or an alkenyloxy group having 4 or less carbon atoms is preferable.
In order to improve the adhesion between the substrate and the cured film, the silane coupling agent preferably does not contain a fluorine atom and a silicon atom (excluding a silicon atom to which a hydrolyzable group is bonded). Includes silicon atoms (excluding silicon atoms to which hydrolyzable groups are bonded), alkylene groups substituted with silicon atoms, straight chain alkyl groups having 8 or more carbon atoms, and branched alkyl groups having 3 or more carbon atoms Desirably not.
 シランカップリング剤は、以下の式(Z)で表される基を有することが好ましい。*は結合位置を表す。
 式(Z) *-Si-(RZ1
 式(Z)中、RZ1は加水分解性基を表し、その定義は上述の通りである。
The silane coupling agent preferably has a group represented by the following formula (Z). * Represents a bonding position.
Formula (Z) * -Si- (R Z1 ) 3
In the formula (Z), R Z1 represents a hydrolyzable group, and the definition thereof is as described above.
 シランカップリング剤は、(メタ)アクリロイルオキシ基、エポキシ基、および、オキセタニル基からなる群から選択される1種以上の硬化性官能基を有することが好ましい。硬化性官能基は、直接、珪素原子に結合してもよく、連結基を介して珪素原子に結合していてもよい。
 なお、上記シランカップリング剤に含まれる硬化性官能基の好適態様としては、ラジカル重合性基も挙げられる。
The silane coupling agent preferably has one or more curable functional groups selected from the group consisting of a (meth) acryloyloxy group, an epoxy group, and an oxetanyl group. The curable functional group may be directly bonded to the silicon atom, or may be bonded to the silicon atom via a linking group.
In addition, a radically polymerizable group is also mentioned as a suitable aspect of the curable functional group contained in the said silane coupling agent.
 シランカップリング剤の分子量は特に制限されず、取り扱い性の点から、100~1000の場合が多く、本発明の効果がより優れる点で、270以上が好ましく、270~1000がより好ましい。 The molecular weight of the silane coupling agent is not particularly limited, and is often 100 to 1000 from the viewpoint of handleability, and is preferably 270 or more and more preferably 270 to 1000 from the viewpoint that the effect of the present invention is more excellent.
 シランカップリング剤の好適態様の一つとしては、式(W)で表されるシランカップリング剤Xが挙げられる。
 式(W)   RZ2-Lz-Si-(RZ1
 Rz1は、加水分解性基を表し、定義は上述の通りである。
 Rz2は、硬化性官能基を表し、定義は上述のとおりであり、好適範囲も上述の通りである。
 Lzは、単結合または2価の連結基を表す。Lzが2価の連結基を表す場合、2価の連結基としては、ハロゲン原子が置換していてもよいアルキレン基、ハロゲン原子が置換していてもよいアリーレン基、-NR12-、-CONR12-、-CO-、-CO-、SONR12-、-O-、-S-、-SO-、および、これらの組み合わせが挙げられる。なかでも、炭素数2~10のハロゲン原子が置換していてもよいアルキレン基および炭素数6~12のハロゲン原子が置換していてもよいアリーレン基からなる群から選択される少なくとも1種、または、これらの基と-NR12-、-CONR12-、-CO-、-CO-、SONR12-、-O-、-S-、およびSO-からなる群から選択される少なくとも1種の基との組み合わせからなる基が好ましく、炭素数2~10のハロゲン原子が置換していてもよいアルキレン基、-CO-、-O-、-CO-、-CONR12-、または、これらの基の組み合わせからなる基がより好ましい。ここで、上記R12は、水素原子またはメチル基を表す。
One preferred embodiment of the silane coupling agent is a silane coupling agent X represented by the formula (W).
Formula (W) R Z2 -Lz-Si- (R Z1 ) 3
R z1 represents a hydrolyzable group, and the definition is as described above.
R z2 represents a curable functional group, the definition is as described above, and the preferred range is also as described above.
Lz represents a single bond or a divalent linking group. When Lz represents a divalent linking group, examples of the divalent linking group include an alkylene group which may be substituted with a halogen atom, an arylene group which may be substituted with a halogen atom, —NR 12 —, —CONR 12 -, - CO -, - CO 2 -, SO 2 NR 12 -, - O -, - S -, - SO 2 -, and combinations thereof. Among them, at least one selected from the group consisting of an alkylene group which may be substituted with a halogen atom having 2 to 10 carbon atoms and an arylene group which may be substituted with a halogen atom having 6 to 12 carbon atoms, or At least selected from the group consisting of these groups and —NR 12 —, —CONR 12 —, —CO—, —CO 2 —, SO 2 NR 12 —, —O—, —S—, and SO 2 —. A group consisting of a combination with one kind of group is preferable, an alkylene group which may be substituted by a halogen atom having 2 to 10 carbon atoms, —CO 2 —, —O—, —CO—, —CONR 12 —, or A group consisting of a combination of these groups is more preferred. Here, R 12 represents a hydrogen atom or a methyl group.
 シランカップリング剤Xとしては、N-β-アミノエチル-γ-アミノプロピル-メチルジメトキシシラン(信越化学工業社製商品名 KBM-602)、N-β-アミノエチル-γ-アミノプロピル-トリメトキシシラン(信越化学工業社製商品名 KBM-603)、N-β-アミノエチル-γ-アミノプロピル-トリエトキシシラン(信越化学工業社製商品名 KBE-602)、γ-アミノプロピル-トリメトキシシラン(信越化学工業社製商品名 KBM-903)、γ-アミノプロピル-トリエトキシシラン(信越化学工業社製商品名 KBE-903)、3-メタクリロキシプロピルトリメトキシシラン(信越化学工業社製商品名 KBM-503)、グリシドキシオクチルトリメトキシシラン(信越化学工業社製商品名 KBM-4803)等が挙げられる。 As the silane coupling agent X, N-β-aminoethyl-γ-aminopropyl-methyldimethoxysilane (trade name KBM-602 manufactured by Shin-Etsu Chemical Co., Ltd.), N-β-aminoethyl-γ-aminopropyl-trimethoxy Silane (trade name KBM-603 manufactured by Shin-Etsu Chemical Co., Ltd.), N-β-aminoethyl-γ-aminopropyl-triethoxysilane (trade name KBE-602 manufactured by Shin-Etsu Chemical Co., Ltd.), γ-aminopropyl-trimethoxysilane (Trade name KBM-903 manufactured by Shin-Etsu Chemical Co., Ltd.), γ-aminopropyl-triethoxysilane (trade name KBE-903 manufactured by Shin-Etsu Chemical Co., Ltd.), 3-methacryloxypropyltrimethoxysilane (trade name manufactured by Shin-Etsu Chemical Co., Ltd.) KBM-503), glycidoxyoctyltrimethoxysilane (trade name KBM manufactured by Shin-Etsu Chemical Co., Ltd.) -4803).
 シランカップリング剤の他の好適態様としては、分子内に少なくとも珪素原子と窒素原子と硬化性官能基とを有し、かつ、珪素原子に結合した加水分解性基を有するシランカップリング剤Yが挙げられる。
 このシランカップリング剤Yは、分子内に少なくとも1つの珪素原子を有すればよく、珪素原子は、以下の原子、置換基と結合できる。それらは同じ原子、置換基であっても異なっていてもよい。結合しうる原子、置換基は、水素原子、ハロゲン原子、水酸基、炭素数1から20のアルキル基、アルケニル基、アルキニル基、アリール基、アルキル基および/またはアリール基で置換可能なアミノ基、シリル基、炭素数1から20のアルコキシ基、ならびに、アリーロキシ基等が挙げられる。これらの置換基はさらに、シリル基、アルケニル基、アルキニル基、アリール基、アルコキシ基、アリーロキシ基、チオアルコキシ基、アルキル基および/またはアリール基で置換可能なアミノ基、ハロゲン原子、スルホンアミド基、アルコキシカルボニル基、アミド基、ウレア基、アンモニウム基、アルキルアンモニウム基、カルボキシル基、またはその塩、スルホ基、またはその塩等で置換されていてもよい。
 なお、珪素原子には少なくとも一つの加水分解性基が結合している。加水分解性基の定義は、上述の通りである。
 シランカップリング剤Yには、式(Z)で表される基が含まれていてもよい。
As another preferred embodiment of the silane coupling agent, a silane coupling agent Y having at least a silicon atom, a nitrogen atom and a curable functional group in the molecule and having a hydrolyzable group bonded to the silicon atom is provided. Can be mentioned.
The silane coupling agent Y only needs to have at least one silicon atom in the molecule, and the silicon atom can be bonded to the following atoms and substituents. They may be the same atom, substituent or different. Atoms and substituents that can be bonded are a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 20 carbon atoms, an alkenyl group, an alkynyl group, an aryl group, an alkyl group, and / or an amino group that can be substituted with an aryl group, silyl Group, an alkoxy group having 1 to 20 carbon atoms, an aryloxy group, and the like. These substituents further include an amino group, a halogen atom, a sulfonamide group, a silyl group, an alkenyl group, an alkynyl group, an aryl group, an alkoxy group, an aryloxy group, a thioalkoxy group, an alkyl group and / or an aryl group. It may be substituted with an alkoxycarbonyl group, an amide group, a urea group, an ammonium group, an alkylammonium group, a carboxyl group, a salt thereof, a sulfo group, or a salt thereof.
Note that at least one hydrolyzable group is bonded to the silicon atom. The definition of the hydrolyzable group is as described above.
The silane coupling agent Y may contain a group represented by the formula (Z).
 シランカップリング剤Yは、分子内に窒素原子を少なくとも1つ以上有し、窒素原子は、2級アミノ基或いは3級アミノ基の形態で存在することが好ましく、即ち、窒素原子は置換基として少なくとも1つの有機基を有することが好ましい。なお、アミノ基の構造としては、含窒素ヘテロ環の部分構造の形態で分子内に存在してもよく、アニリン等置換アミノ基として存在していてもよい。
 ここで、有機基としては、アルキル基、アルケニル基、アルキニル基、アリール基、または、これらの組み合わせ等が挙げられる。これらはさらに置換基を有してもよく、導入可能な置換基としては、シリル基、アルケニル基、アルキニル基、アリール基、アルコキシ基、アリーロキシ基、チオアルコキシ基、アミノ基、ハロゲン原子、スルホンアミド基、アルコキシカルボニル基、カルボニルオキシ基、アミド基、ウレア基、アルキレンオキシ基アンモニウム基、アルキルアンモニウム基、カルボキシル基、またはその塩、スルホ基等が挙げられる。
 また、窒素原子は、任意の有機連結基を介して硬化性官能基と結合していることが好ましい。好ましい有機連結基としては、上述の窒素原子およびそれに結合する有機基に導入可能な置換基を挙げることができる。
The silane coupling agent Y has at least one nitrogen atom in the molecule, and the nitrogen atom is preferably present in the form of a secondary amino group or a tertiary amino group, that is, the nitrogen atom is used as a substituent. It preferably has at least one organic group. The amino group structure may be present in the molecule in the form of a partial structure of a nitrogen-containing heterocycle, or may be present as a substituted amino group such as aniline.
Here, examples of the organic group include an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a combination thereof. These may further have a substituent, and examples of the substituent that can be introduced include a silyl group, an alkenyl group, an alkynyl group, an aryl group, an alkoxy group, an aryloxy group, a thioalkoxy group, an amino group, a halogen atom, and a sulfonamide. Group, alkoxycarbonyl group, carbonyloxy group, amide group, urea group, alkyleneoxy group ammonium group, alkylammonium group, carboxyl group, or a salt thereof, sulfo group and the like.
Moreover, it is preferable that the nitrogen atom is couple | bonded with the curable functional group through arbitrary organic coupling groups. Preferred examples of the organic linking group include the above-described nitrogen atom and a substituent that can be introduced into the organic group bonded thereto.
 シランカップリング剤Yに含まれる硬化性官能基の定義は、上述の通りであり、好適範囲も上述の通りである。
 シランカップリング剤Yには、硬化性官能基は一分子中に少なくとも一つ以上有していればよいが、硬化性官能基を2以上有する態様をとることも可能であり、感度、安定性の観点からは、硬化性官能基を2~20有することが好ましく、4~15有することがさらに好ましく、最も好ましくは分子内に硬化性官能基を6~10有する態様である。
The definition of the curable functional group contained in the silane coupling agent Y is as described above, and the preferred range is also as described above.
The silane coupling agent Y only needs to have at least one curable functional group in one molecule, but it is also possible to adopt an embodiment having two or more curable functional groups, sensitivity, stability. From this viewpoint, it is preferable to have 2 to 20 curable functional groups, more preferably 4 to 15, and most preferably 6 to 10 curable functional groups in the molecule.
 シランカップリング剤Xおよびシランカップリング剤Yの分子量は特に制限されないが、上述した範囲(270以上が好ましい)が挙げられる。 The molecular weights of the silane coupling agent X and the silane coupling agent Y are not particularly limited, but include the above-described ranges (preferably 270 or more).
 本発明の組成物中におけるシランカップリング剤の含有量は、組成物中の全固形分に対して、0.1~10質量%が好ましく、0.5~8質量%がより好ましく、1.0~6質量%がさらに好ましい。 The content of the silane coupling agent in the composition of the present invention is preferably 0.1 to 10% by mass, more preferably 0.5 to 8% by mass, based on the total solid content in the composition. More preferably, it is 0 to 6% by mass.
 本発明の組成物は、シランカップリング剤を1種単独で含んでいてもよく、2種以上を含んでいてもよい。組成物がシランカップリング剤を2種以上含む場合は、その合計が上記範囲内であればよい。 The composition of the present invention may contain one silane coupling agent or two or more silane coupling agents. When a composition contains 2 or more types of silane coupling agents, the sum should just be in the said range.
(紫外線吸収剤)
 本発明の組成物には、紫外線吸収剤が含まれていてもよい。これにより、パターンの形状をより優れた(精細な)ものにすることができる。
 紫外線吸収剤としては、サリシレート系、ベンゾフェノン系、ベンゾトリアゾール系、置換アクリロニトリル系、トリアジン系の紫外線吸収剤を使用することができる。これらの具体例としては、特開2012-068418号公報の段落0137~0142(対応するUS2012/0068292の段落0251~0254)の化合物が使用でき、これらの内容が援用でき、本明細書に組み込まれる。
 他にジエチルアミノ-フェニルスルホニル系紫外線吸収剤(大東化学製、商品名:UV-503)等も好適に用いられる。
 紫外線吸収剤としては、特開2012-32556号公報の段落0134~0148に例示される化合物が挙げられる。
 本発明の組成物は、紫外線吸収剤を含んでも含まなくてもよいが、含む場合、紫外線吸収剤の含有量は、組成物の全固形分に対して、0.001~15質量%が好ましく、0.01~10質量%がより好ましく、0.1~5質量%がさらに好ましい。
(UV absorber)
The composition of the present invention may contain an ultraviolet absorber. Thereby, the shape of a pattern can be made more excellent (fine).
As the ultraviolet absorber, salicylate-based, benzophenone-based, benzotriazole-based, substituted acrylonitrile-based, and triazine-based ultraviolet absorbers can be used. As specific examples thereof, compounds of paragraphs 0137 to 0142 (corresponding to paragraphs 0251 to 0254 of US2012 / 0068292) of JP2012-068418A can be used, and the contents thereof can be incorporated and incorporated in the present specification. .
In addition, a diethylamino-phenylsulfonyl ultraviolet absorber (manufactured by Daito Chemical Co., Ltd., trade name: UV-503) and the like are also preferably used.
Examples of the ultraviolet absorber include compounds exemplified in paragraphs 0134 to 0148 of JP2012-32556A.
The composition of the present invention may or may not contain an ultraviolet absorber, but when it is included, the content of the ultraviolet absorber is preferably 0.001 to 15% by mass relative to the total solid content of the composition. 0.01 to 10% by mass is more preferable, and 0.1 to 5% by mass is more preferable.
(界面活性剤)
 本発明の組成物は、塗布性をより向上させる観点から、各種の界面活性剤を含有させてもよい。界面活性剤としては、フッ素系界面活性剤、ノニオン系界面活性剤、カチオン系界面活性剤、アニオン系界面活性剤、および、シリコーン系界面活性剤等の各種界面活性剤を使用できる。
(Surfactant)
The composition of the present invention may contain various surfactants from the viewpoint of further improving applicability. As the surfactant, various surfactants such as a fluorosurfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone surfactant can be used.
 本発明の組成物にフッ素系界面活性剤を含有させることで、塗布液として調製したときの液特性(特に、流動性)がより向上し、塗布厚の均一性や省液性をより改善することができる。即ち、フッ素系界面活性剤を含有する組成物を適用した塗布液を用いて膜形成する場合においては、被塗布面と塗布液との界面張力が低下して、被塗布面への濡れ性が改善され、被塗布面への塗布性が向上する。このため、厚みムラの小さい均一厚の膜形成をより好適に行うことができる。 By including a fluorosurfactant in the composition of the present invention, liquid properties (particularly fluidity) when prepared as a coating liquid are further improved, and uniformity of coating thickness and liquid-saving properties are further improved. be able to. That is, in the case of forming a film using a coating liquid to which a composition containing a fluorosurfactant is applied, the interfacial tension between the coated surface and the coating liquid decreases, and the wettability to the coated surface is reduced. It improves and the applicability | paintability to a to-be-coated surface improves. For this reason, it is possible to more suitably form a film having a uniform thickness with small thickness unevenness.
 フッ素系界面活性剤中のフッ素含有率は、3~40質量%が好適であり、より好ましくは5~30質量%であり、特に好ましくは7~25質量%である。フッ素含有率がこの範囲内であるフッ素系界面活性剤は、塗布膜の厚さの均一性や省液性の点で効果的であり、組成物中における溶解性も良好である。 The fluorine content in the fluorosurfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. A fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of coating film thickness and liquid-saving properties, and has good solubility in the composition.
 フッ素系界面活性剤としては、例えば、メガファックF171、同F172、同F173、同F176、同F177、同F141、同F142、同F143、同F144、同R30、同F437、同F475、同F479、同F482、同F554、同F780、RS-72-K(以上、DIC(株)製)、フロラードFC430、同FC431、同FC171(以上、住友スリーエム(株)製)、サーフロンS-382、同SC-101、同SC-103、同SC-104、同SC-105、同SC-1068、同SC-381、同SC-383、同S-393、同KH-40(以上、旭硝子(株)製)、PF636、PF656、PF6320、PF6520、および、PF7002(OMNOVA社製)等が挙げられる。フッ素系界面活性剤は、特開2015-117327号公報の段落0015~0158に記載の化合物を用いることもできる。フッ素系界面活性剤としてブロックポリマーを用いることもでき、具体例としては、例えば特開2011-89090号公報に記載された化合物が挙げられる。
 フッ素系界面活性剤は、フッ素原子を有する(メタ)アクリレート化合物に由来する繰り返し単位と、アルキレンオキシ基(好ましくはエチレンオキシ基、プロピレンオキシ基)を2以上(好ましくは5以上)有する(メタ)アクリレート化合物に由来する繰り返し単位と、を含む含フッ素高分子化合物も好ましく用いることができ、下記化合物も本発明で用いられるフッ素系界面活性剤として例示される。
Examples of the fluorosurfactant include Megafac F171, F172, F173, F176, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, RS-72-K (above DIC Corporation), Florard FC430, FC431, FC171 (above, Sumitomo 3M Limited), Surflon S-382, SC -101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (above, manufactured by Asahi Glass Co., Ltd.) ), PF636, PF656, PF6320, PF6520, and PF7002 (manufactured by OMNOVA). As the fluorine-based surfactant, compounds described in paragraphs 0015 to 0158 of JP-A No. 2015-117327 can also be used. A block polymer can also be used as the fluorosurfactant, and specific examples thereof include compounds described in JP-A-2011-89090.
The fluorine-based surfactant has a repeating unit derived from a (meth) acrylate compound having a fluorine atom and 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy group or propyleneoxy group) (meth). A fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used, and the following compounds are also exemplified as the fluorine-based surfactant used in the present invention.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 上記の化合物の重量平均分子量は、好ましくは3,000~50,000であり、例えば、14,000である。
 また、エチレン性不飽和基を側鎖に有する含フッ素重合体をフッ素系界面活性剤として用いることもできる。具体例としては、特開2010-164965号公報0050~0090段落および0289~0295段落に記載された化合物、例えばDIC社製のメガファックRS-101、RS-102、RS-718K、および、RS-72-K等が挙げられる。
The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000.
Moreover, the fluoropolymer which has an ethylenically unsaturated group in a side chain can also be used as a fluorine-type surfactant. Specific examples thereof include compounds described in JP-A 2010-164965, paragraphs 0050 to 0090 and 0289 to 0295, such as MegaFac RS-101, RS-102, RS-718K, and RS- 72-K and the like.
 ノニオン系界面活性剤として具体的には、グリセロール、トリメチロールプロパン、トリメチロールエタンならびにそれらのエトキシレートおよびプロポキシレート(例えば、グリセロールプロポキシレート、グリセリンエトキシレート等)、ポリオキシエチレンラウリルエーテル、ポリオキシエチレンステアリルエーテル、ポリオキシエチレンオレイルエーテル、ポリオキシエチレンオクチルフェニルエーテル、ポリオキシエチレンノニルフェニルエーテル、ポリエチレングリコールジラウレート、ポリエチレングリコールジステアレート、ソルビタン脂肪酸エステル(BASF社製のプルロニックL10、L31、L61、L62、10R5、17R2、25R2、テトロニック304、701、704、901、904、150R1、および、ソルスパース20000(日本ルーブリゾール(株)製)等が挙げられる。また、和光純薬工業社製の、NCW-101、NCW-1001、および、NCW-1002を使用することもできる。 Specific examples of the nonionic surfactant include glycerol, trimethylolpropane, trimethylolethane and ethoxylates and propoxylates thereof (for example, glycerol propoxylate, glycerin ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene Stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester (Pluronic L10, L31, L61, L62 manufactured by BASF, 10R5, 17R2, 25R2, Tetronic 304, 701, 704, 901, 904, 150R1 And Solsperse 20000 include (Nippon Lubrizol Co. tetrazole Co.) and the like. Further, Wako Pure Chemical Industries Ltd., NCW-101, NCW-1001 and, may also be used NCW-1002.
 カチオン系界面活性剤として具体的には、フタロシアニン誘導体(商品名:EFKA-745、森下産業(株)製)、オルガノシロキサンポリマーKP341(信越化学工業(株)製)、(メタ)アクリル酸系(共)重合体ポリフローNo.75、No.90、No.95(共栄社化学(株)製)、および、W001(裕商(株)製)等が挙げられる。 Specific examples of the cationic surfactant include phthalocyanine derivatives (trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.), organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 (manufactured by Kyoeisha Chemical Co., Ltd.) and W001 (manufactured by Yusho Co., Ltd.).
 アニオン系界面活性剤として具体的には、W004、W005、W017(裕商(株)社製)、および、サンデットBL(三洋化成(株)社製)等が挙げられる。 Specific examples of anionic surfactants include W004, W005, W017 (manufactured by Yusho Co., Ltd.), Sandet BL (manufactured by Sanyo Chemical Co., Ltd.), and the like.
 シリコーン系界面活性剤としては、例えば、トーレシリコーンDC3PA、トーレシリコーンSH7PA、トーレシリコーンDC11PA、トーレシリコーンSH21PA、トーレシリコーンSH28PA、トーレシリコーンSH29PA、トーレシリコーンSH30PA、トーレシリコーンSH8400(以上、東レ・ダウコーニング(株)製)、TSF-4440、TSF-4300、TSF-4445、TSF-4460、TSF-4452(以上、モメンティブ・パフォーマンス・マテリアルズ社製)、KP341、KF6001、KF6002(以上、信越シリコーン株式会社製)、BYK307、BYK323、および、BYK330(以上、ビックケミー社製)等が挙げられる。 Examples of silicone-based surfactants include Torre Silicone DC3PA, Torre Silicone SH7PA, Torre Silicone DC11PA, Torresilicone SH21PA, Torree Silicone SH28PA, Torree Silicone SH29PA, Torree Silicone SH30PA, Torree Silicone SH8400 (above, Toray Dow Corning Co., Ltd.) )), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4442 (above, manufactured by Momentive Performance Materials), KP341, KF6001, KF6002 (above, manufactured by Shin-Etsu Silicone Co., Ltd.) , BYK307, BYK323, and BYK330 (above, manufactured by BYK Chemie).
 界面活性剤は、1種のみを用いてもよいし、2種類以上を組み合わせてもよい。界面活性剤の含有量は、本発明の組成物の全固形分に対して、0.001~2.0質量%が好ましく、0.005~1.0質量%がより好ましい。 Only one type of surfactant may be used, or two or more types may be combined. The content of the surfactant is preferably from 0.001 to 2.0% by mass, more preferably from 0.005 to 1.0% by mass, based on the total solid content of the composition of the present invention.
 上記成分以外にも、本発明の組成物には、以下の成分をさらに添加してもよい。例えば、増感剤、共増感剤、架橋剤、硬化促進剤、フィラー、熱硬化促進剤、重合禁止剤、可塑剤、希釈剤、感脂化剤が挙げられ、さらに、基板表面への密着促進剤およびその他の助剤類(例えば、導電性粒子、充填剤、消泡剤、難燃剤、レベリング剤、剥離促進剤、酸化防止剤、香料、表面張力調整剤、および、連鎖移動剤等)等の公知の添加剤を必要に応じて加えてもよい。
 これらの成分は、例えば、特開2012-003225号公報の段落番号0183~0228(対応する米国特許出願公開第2013/0034812号明細書の<0237>~<0309>)、特開2008-250074号公報の段落番号0101~0102、段落番号0103~0104、段落番号0107~0109、特開2013-195480号公報の段落番号0159~0184等の記載を参酌でき、これらの内容は本明細書に組み込まれる。
In addition to the above components, the following components may be further added to the composition of the present invention. Examples include sensitizers, co-sensitizers, cross-linking agents, curing accelerators, fillers, thermosetting accelerators, polymerization inhibitors, plasticizers, diluents, and oil sensitizers, and adhesion to the substrate surface. Accelerators and other auxiliaries (for example, conductive particles, fillers, antifoaming agents, flame retardants, leveling agents, peeling accelerators, antioxidants, fragrances, surface tension modifiers, chain transfer agents, etc.) You may add well-known additives, such as, as needed.
These components include, for example, paragraph numbers 0183 to 0228 of JP2012-003225A (corresponding <0237> to <0309> of US Patent Application Publication No. 2013/0034812) and JP2008-250074. Paragraph numbers 0101 to 0102, paragraph numbers 0103 to 0104, paragraph numbers 0107 to 0109, paragraph numbers 0159 to 0184 in JP 2013-195480 A, and the like can be referred to, and the contents thereof are incorporated in this specification. .
(着色剤)
 本発明の組成物は、上述したチタン窒化物含有粒子以外の着色剤(以下、単に「着色剤」ともいう。)を用いることもできる。着色剤は、例えば、組成物の色度調整のために用いられ、OD値が低下しない範囲で、チタン窒化物の一部を着色剤に置き換えることが可能である。このような着色剤としては、顔料(黒色有機顔料および有彩色の有機顔料の有機顔料、ならびに、無機顔料)および染料などが挙げられる。
(Coloring agent)
In the composition of the present invention, a colorant other than the titanium nitride-containing particles described above (hereinafter also simply referred to as “colorant”) can be used. The colorant is used, for example, for adjusting the chromaticity of the composition, and part of the titanium nitride can be replaced with the colorant as long as the OD value does not decrease. Examples of such a colorant include pigments (organic pigments of black organic pigments and chromatic organic pigments, and inorganic pigments) and dyes.
 着色剤としては、顔料を用いることが好ましい。これにより、波長400~700nmの範囲における透過率の標準偏差の小さい膜を製造しやすい。特に、顔料として黒色顔料(黒色有機顔料および黒色無機顔料)を用いた場合、上記範囲における透過率の標準偏差が10%以下の膜を製造しやすい。 It is preferable to use a pigment as the colorant. Thereby, it is easy to manufacture a film having a small standard deviation of transmittance in the wavelength range of 400 to 700 nm. In particular, when a black pigment (a black organic pigment and a black inorganic pigment) is used as the pigment, it is easy to produce a film having a standard deviation of transmittance within the above range of 10% or less.
((顔料))
 顔料としては、従来公知の種々の顔料を挙げることができる。
 有彩色の有機顔料として、以下のものを挙げることができる。但し本発明は、これらに限定されるものではない。
 カラーインデックス(C.I.)ピグメントイエロー1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34,35,35:1,36,36:1,37,37:1,40,42,43,53,55,60,61,62,63,65,73,74,77,81,83,86,93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214等、
 C.I.ピグメントオレンジ 2,5,13,16,17:1,31,34,36,38,43,46,48,49,51,52,55,59,60,61,62,64,71,73等、
 C.I.ピグメントレッド 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,53:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,270,272,279等、
 C.I.ピグメントグリーン 7,10,36,37,58,59等
 C.I.ピグメントバイオレット 1,19,23,27,32,37,42等
 C.I.ピグメントブルー 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,60,64,66,79,80等
((Pigment))
Examples of the pigment include various conventionally known pigments.
Examples of chromatic organic pigments include the following. However, the present invention is not limited to these.
Color Index (CI) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 72,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214, etc.,
C. I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. ,
C. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48: 1, 48: 2, 48: 3, 48: 4 49, 49: 1, 49: 2, 52: 1, 52: 2, 53: 1, 57: 1, 60: 1, 63: 1, 66, 67, 81: 1, 81: 2, 81: 3 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 270, 272, 279, etc.
C. I. Pigment Green 7, 10, 36, 37, 58, 59, etc. C.I. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, etc. C.I. I. Pigment Blue 1, 2, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 66, 79, 80, etc.
 また、緑色顔料として、分子中のハロゲン原子数が平均10~14個であり、臭素原子が平均8~12個であり、塩素原子が平均2~5個であるハロゲン化亜鉛フタロシアニン顔料を用いることも可能である。具体例としては、国際公開第2015/118720号に記載の化合物が挙げられる。
 これら有機顔料は、単独若しくは色純度を上げるため種々組合せて用いることができる。
Further, as the green pigment, a zinc halide phthalocyanine pigment having an average number of halogen atoms in the molecule of 10 to 14, bromine atoms on average 8 to 12, and chlorine atoms on average 2 to 5 should be used. Is also possible. Specific examples include the compounds described in International Publication No. 2015/118720.
These organic pigments can be used alone or in various combinations in order to increase color purity.
 黒色顔料は、各種公知の黒色顔料を用いることができる。たとえば、カーボンブラックや以下に示す黒色金属含有無機顔料が挙げられる。黒色金属含有無機顔料としては、Co、Cr、Cu、Mn,Ru、Fe、Ni、Sn、Ti及びAgからなる群より選ばれた1種又は2種以上の金属元素を含む金属酸化物、金属窒素物が挙げられる。これらは1種のみを用いてもよく、また、2種以上の混合物として用いることもできる。また、黒色顔料に、さらに、他の色相の無機顔料を組み合わせて用いることで、所望の遮光性を有するように、調製してもよい。組みあわせて用いうる具体的な無機顔料の例として、例えば、亜鉛華、鉛白、リトポン、酸化チタン、酸化クロム、酸化鉄、沈降性硫酸バリウムおよびバライト粉、鉛丹、酸化鉄赤、黄鉛、亜鉛黄(亜鉛黄1種、亜鉛黄2種)、ウルトラマリン青、プロシア青(フェロシアン化鉄カリ)ジルコングレー、プラセオジムイエロー、クロムチタンイエロー、クロムグリーン、ピーコック、ビクトリアグリーン、紺青(プルシアンブルーとは無関係)、バナジウムジルコニウム青、クロム錫ピンク、陶試紅、サーモンピンク等が挙げられる。特に、紫外から赤外までの広い波長域での遮光性を発現する目的で、これら黒色顔料や他の色相を有する無機顔料を、単独のみならず、複数種の顔料を混合し、使用することが可能である。 Various known black pigments can be used as the black pigment. Examples thereof include carbon black and the following black metal-containing inorganic pigments. As the black metal-containing inorganic pigment, a metal oxide or metal containing one or more metal elements selected from the group consisting of Co, Cr, Cu, Mn, Ru, Fe, Ni, Sn, Ti, and Ag Nitrogen can be mentioned. These may be used alone or as a mixture of two or more. Moreover, you may prepare so that it may have desired light-shielding property by using in combination with the inorganic pigment of another hue further to a black pigment. Examples of specific inorganic pigments that can be used in combination include, for example, zinc white, lead white, lithopone, titanium oxide, chromium oxide, iron oxide, precipitated barium sulfate and barite powder, red lead, iron oxide red, yellow lead , Zinc yellow (1 type of zinc yellow, 2 types of zinc yellow), ultramarine blue, prussian blue (potassium ferrocyanide) zircon gray, praseodymium yellow, chrome titanium yellow, chrome green, peacock, victoria green, bitumen blue (Prussian blue) ), Vanadium zirconium blue, chrome tin pink, pottery red, salmon pink and the like. In particular, these black pigments and other inorganic pigments having other hues are used not only independently but also in combination with a plurality of types of pigments for the purpose of expressing light-shielding properties in a wide wavelength range from ultraviolet to infrared. Is possible.
 黒色顔料は、カーボンブラック、チタンブラックが好ましく、紫外から赤外までの広い波長域の遮光性を有するという観点からチタンブラックが特に好ましい。チタンブラックとは、チタン原子を有する黒色粒子である。好ましくは低次酸化チタンや酸窒化チタン等である。特に限定されないが、酸窒化チタンとしては、国際公開2008/123097号公報、特開2009-58946、特開2010-14848、特開2010-97210および特開2011-2274670などのような酸窒化チタン、また、特開2010-95716のような酸窒化チタンと炭化チタンの混合物などが使用できる。チタンブラック粒子は、分散性向上、凝集性抑制などの目的で必要に応じ、表面を修飾することが可能である。酸化ケイ素、酸化チタン、酸化ゲルマニウム、酸化アルミニウム、酸化マグネシウム、酸化ジルコニウムで被覆することが可能であり、また、特開2007-302836号公報に示されるような撥水性物質での処理も可能である。チタンブラックは、分散性、着色性等を調整する目的でCu、Fe、Mn、V、Ni等の複合酸化物、酸化コバルト、酸化鉄、カーボンブラック等の黒色顔料を1種あるいは2種以上の組み合わせで含有してもよい。 The black pigment is preferably carbon black or titanium black, and titanium black is particularly preferable from the viewpoint of light-shielding properties in a wide wavelength range from ultraviolet to infrared. Titanium black is black particles having titanium atoms. Preferred are low-order titanium oxide and titanium oxynitride. Although not particularly limited, titanium oxynitride includes titanium oxynitride such as International Publication No. 2008/123097, JP-A 2009-58946, JP-A 2010-14848, JP-A 2010-97210, and JP-A 2011-2274670. Further, a mixture of titanium oxynitride and titanium carbide as disclosed in JP 2010-95716 can be used. The surface of titanium black particles can be modified as necessary for the purpose of improving dispersibility and suppressing aggregation. It can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, zirconium oxide, and can also be treated with a water-repellent substance as disclosed in JP-A-2007-302836. . Titanium black is a composite oxide such as Cu, Fe, Mn, V, Ni, etc., and one or more black pigments such as cobalt oxide, iron oxide, and carbon black for the purpose of adjusting dispersibility and colorability. You may contain in combination.
 チタンブラックの製造方法としては、二酸化チタンと金属チタンの混合体を還元雰囲気で加熱し還元する方法(特開昭49-5432号公報)、四塩化チタンの高温加水分解で得られた超微細二酸化チタンを水素を含む還元雰囲気中で還元する方法(特開昭57-205322号公報)、二酸化チタンまたは水酸化チタンをアンモニア存在下で高温還元する方法(特開昭60-65069号公報、特開昭61-201610号公報)、二酸化チタンまたは水酸化チタンにバナジウム化合物を付着させ、アンモニア存在下で高温還元する方法(特開昭61-201610号公報)などがある。ただし、本発明がこれらに限定されるものではない。 Titanium black can be produced by heating a mixture of titanium dioxide and titanium metal in a reducing atmosphere for reduction (Japanese Patent Laid-Open No. 49-5432), or ultrafine dioxide obtained by high-temperature hydrolysis of titanium tetrachloride. A method of reducing titanium in a reducing atmosphere containing hydrogen (Japanese Patent Laid-Open No. 57-205322), a method of reducing titanium dioxide or titanium hydroxide at high temperature in the presence of ammonia (Japanese Patent Laid-Open No. 60-65069, Japanese Patent Laid-Open No. JP-A-61-201610), and a method in which a vanadium compound is attached to titanium dioxide or titanium hydroxide and reduced at high temperature in the presence of ammonia (JP-A-61-201610). However, the present invention is not limited to these.
 チタンブラックの比表面積は特に制限されないが、BET(Brunauer, Emmett, Teller)法にて測定した値が5m/g以上150m/g以下であることが好ましく、20m/g以上120m/g以下であることがより好ましい。
 チタンブラックの市販品の例としては、チタンブラック10S、12S、13R、13M、13M-C、13R、13R-N、13M-T(商品名:三菱マテリアル(株)製)、ティラック(Tilack)D(商品名:赤穂化成(株)製)などが挙げられる。
Although the specific surface area of titanium black is not particularly limited, BET (Brunauer, Emmett, Teller ) is preferably measured value is less than 5 m 2 / g or more 150 meters 2 / g by method, 20 m 2 / g or more 120 m 2 / More preferably, it is g or less.
Examples of commercially available titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R, 13R-N, 13M-T (trade name: manufactured by Mitsubishi Materials Corporation), Tilack D (trade name: manufactured by Ako Kasei Co., Ltd.) and the like.
 上記の黒色顔料は、平均一次粒子径が5nm以上であることが好ましく、10nm以上であることが好ましい。同様の観点から、上限としては10μm以下であることが好ましく、1μm以下であることがより好ましく、100nm以下であることがさらに好ましい。黒色顔料の平均一次粒子径は、次の方法で測定した値とする。黒色顔料を含む混合液を、プロピレングリコールモノメチルエーテルアセテートで80倍に希釈し、得られた希釈液について動的光散乱法を用いて測定した値とする。この測定は、日機装株式会社製マイクロトラック(商品名)UPA-EX150を用いて行って得られた平均粒径のこととする。 The above-mentioned black pigment preferably has an average primary particle diameter of 5 nm or more, and preferably 10 nm or more. From the same viewpoint, the upper limit is preferably 10 μm or less, more preferably 1 μm or less, and even more preferably 100 nm or less. The average primary particle diameter of the black pigment is a value measured by the following method. A mixed liquid containing a black pigment is diluted 80 times with propylene glycol monomethyl ether acetate, and the obtained diluted liquid is measured using a dynamic light scattering method. This measurement is an average particle diameter obtained by using Microtrack (trade name) UPA-EX150 manufactured by Nikkiso Co., Ltd.
 さらに、チタンブラックを、チタンブラックおよびSi原子を含む被分散体として含有することも好ましい。
 この形態において、チタンブラックは、組成物中において被分散体として含有されるものであり、被分散体中のSi原子とTi原子との含有比(Si/Ti)が質量換算で0.05以上が好ましく、0.05~0.5がより好ましく、0.07~0.4がさらに好ましい。
 ここで、上記被分散体は、チタンブラックが一次粒子の状態であるもの、凝集体(二次粒子)の状態であるものの双方を包含する。
 被分散体のSi/Tiを変更する(例えば、0.05以上とする)ためには、以下のような手段を用いることができる。
 先ず、酸化チタンとシリカ粒子とを分散機を用いて分散することにより分散物を得て、この分散物を高温(例えば、850~1000℃)にて還元処理することにより、チタンブラック粒子を主成分とし、SiとTiとを含有する被分散体を得ることができる。上記還元処理は、アンモニアなどの還元性ガスの雰囲気下で行うこともできる。
 酸化チタンとしては、TTO-51N(商品名:石原産業製)などが挙げられる。
 プラズマ法によって作成された酸化チタンは、その粒径が市販の酸化チタン微粒子よりも小さいことから好適に使用できる(日本金属学会誌第63巻第1号(1999)74-81の記載を参照)。
 シリカ粒子の市販品としては、AEROSIL(登録商標)90、130、150、200、255、300、380(商品名:エボニック製)などが挙げられる。
 酸化チタンとシリカ粒子との分散は、分散剤を用いてもよい。分散剤としては、前述の分散剤の欄で説明したものが挙げられる。
 上記の分散は溶剤中で行ってもよい。溶剤としては、水、有機溶剤が挙げられる。前述の有機溶剤の欄で説明したものが挙げられる。
 Si/Tiが、例えば、0.05以上等に調整されたチタンブラックは、例えば、特開2008-266045号公報の段落番号〔0005〕および段落番号〔0016〕~〔0021〕に記載の方法により作製することができる。
Furthermore, it is also preferable to contain titanium black as a dispersion containing titanium black and Si atoms.
In this embodiment, titanium black is contained as a dispersion in the composition, and the content ratio (Si / Ti) of Si atoms and Ti atoms in the dispersion is 0.05 or more in terms of mass. Is preferable, 0.05 to 0.5 is more preferable, and 0.07 to 0.4 is still more preferable.
Here, the to-be-dispersed bodies include both those in which titanium black is in the state of primary particles and those in the state of aggregates (secondary particles).
In order to change the Si / Ti of the object to be dispersed (for example, 0.05 or more), the following means can be used.
First, a dispersion is obtained by dispersing titanium oxide and silica particles using a disperser, and the dispersion is subjected to reduction treatment at a high temperature (for example, 850 to 1000 ° C.), whereby titanium black particles are mainly formed. A dispersed material containing Si and Ti as components can be obtained. The reduction treatment can also be performed in an atmosphere of a reducing gas such as ammonia.
Examples of titanium oxide include TTO-51N (trade name: manufactured by Ishihara Sangyo).
Titanium oxide prepared by the plasma method can be suitably used because its particle size is smaller than commercially available titanium oxide fine particles (see the Journal of the Japan Institute of Metals Vol. 63 No. 1 (1999) 74-81) .
Examples of commercially available silica particles include AEROSIL (registered trademark) 90, 130, 150, 200, 255, 300, 380 (trade name: manufactured by Evonik).
A dispersing agent may be used for the dispersion of titanium oxide and silica particles. Examples of the dispersant include those described in the above-mentioned column of the dispersant.
The dispersion may be performed in a solvent. Examples of the solvent include water and organic solvents. What was demonstrated in the column of the above-mentioned organic solvent is mentioned.
Titanium black in which Si / Ti is adjusted to 0.05 or more, for example, can be obtained by, for example, the methods described in paragraph numbers [0005] and paragraph numbers [0016] to [0021] of JP-A-2008-266045. Can be produced.
 チタンブラックおよびSi原子を含む被分散体中のSi原子とTi原子との含有比(Si/Ti)を好適な範囲(例えば0.05以上)に調整することで、この被分散体を含む組成物を用いて遮光膜を形成した際に、遮光膜の形成領域外における組成物由来の残渣物が低減される。なお、残渣物は、チタンブラック粒子、樹脂成分等の組成物に由来する成分を含むものである。
 残渣物が低減される理由は未だ明確ではないが、上記のような被分散体は小粒径となる傾向があり(例えば、粒径が30nm以下)、さらに、この被分散体のSi原子が含まれる成分が増すことにより、膜全体の下地との吸着性が低減され、これが、遮光膜の形成における未硬化の組成物(特に、チタンブラック)の現像除去性の向上に寄与すると推測している。
 また、チタンブラックは、紫外光から赤外光までの広範囲に亘る波長領域の光に対する遮光性に優れることから、上記したチタンブラックおよびSi原子を含む被分散体(好ましくはSi/Tiが質量換算で0.05以上であるもの)を用いて形成された遮光膜は優れた遮光性を発揮する。
 なお、被分散体中のSi原子とTi原子との含有比(Si/Ti)は、例えば、特開2013-249417号公報の段落0033に記載の方法(1-1)または方法(1-2)を用いて測定できる。
 また、組成物を硬化して得られた遮光膜に含有される被分散体について、その被分散体中のSi原子とTi原子との含有比(Si/Ti)が0.05以上か否かを判断するには、特開2013-249417号公報の段落0035に記載の方法(2)を用いる。
The composition containing this dispersion by adjusting the content ratio (Si / Ti) of Si atoms and Ti atoms in the dispersion containing titanium black and Si atoms to a suitable range (for example, 0.05 or more). When a light shielding film is formed using an object, the residue derived from the composition outside the region where the light shielding film is formed is reduced. In addition, a residue contains the component derived from compositions, such as a titanium black particle and a resin component.
The reason why the residue is reduced is not yet clear, but the above-mentioned dispersed material tends to have a small particle size (for example, the particle size is 30 nm or less). By increasing the amount of components contained, the adsorptivity of the entire film with the underlying layer is reduced, and this is presumed to contribute to the improvement of the development removal property of the uncured composition (particularly titanium black) in the formation of the light-shielding film. Yes.
In addition, titanium black is excellent in light-shielding property for light in a wide wavelength range from ultraviolet light to infrared light. Therefore, the above-described dispersion containing titanium black and Si atoms (preferably Si / Ti is converted into mass) The light-shielding film formed by using a material having a thickness of 0.05 or more exhibits excellent light-shielding properties.
The content ratio (Si / Ti) of Si atoms to Ti atoms in the dispersion is, for example, the method (1-1) or the method (1-2) described in paragraph 0033 of JP2013-249417A ).
Whether or not the content ratio (Si / Ti) of Si atoms and Ti atoms in the dispersion is 0.05 or more for the dispersion to be contained in the light-shielding film obtained by curing the composition Is determined using the method (2) described in paragraph 0035 of JP2013-249417A.
 チタンブラックおよびSi原子を含む被分散体において、チタンブラックは、上記したものを使用できる。
 また、この被分散体においては、チタンブラックと共に、分散性、着色性等を調整する目的で、Cu、Fe、Mn、V、Ni等の複合酸化物、酸化コバルト、酸化鉄、カーボンブラック、アニリンブラック等からなる黒色顔料を、1種または2種以上を組み合わせて、被分散体として併用してもよい。
 この場合、全被分散体中の50質量%以上をチタンブラックからなる被分散体が占めることが好ましい。
 また、この被分散体においては、遮光性の調整等を目的として、本発明の効果を損なわない限りにおいて、チタンブラックと共に、他の着色剤(有機顔料や染料など)を所望により併用してもよい。
 以下、被分散体にSi原子を導入する際に用いられる材料について述べる。被分散体にSi原子を導入する際には、シリカなどのSi含有物質を用いればよい。
 用いうるシリカとしては、沈降シリカ、フュームドシリカ、コロイダルシリカ、合成シリカなどを挙げることができ、これらを適宜選択して使用すればよい。
 さらに、シリカ粒子の粒径が遮光膜を形成した際に膜厚よりも小さい粒径であると遮光性がより優れるため、シリカ粒子として微粒子タイプのシリカを用いることが好ましい。なお、微粒子タイプのシリカの例としては、例えば、特開2013-249417号公報の段落0039に記載のシリカが挙げられ、これらの内容は本明細書に組み込まれる。
In the dispersion containing titanium black and Si atoms, the above-described titanium black can be used.
Further, in this dispersion, in addition to titanium black, for the purpose of adjusting dispersibility, colorability, etc., complex oxides such as Cu, Fe, Mn, V, Ni, cobalt oxide, iron oxide, carbon black, aniline You may use together the black pigment which consists of black etc. as a to-be-dispersed body, combining 1 type (s) or 2 or more types.
In this case, it is preferable that 50% by mass or more of the total dispersion is occupied by the dispersion made of titanium black.
In addition, in this dispersion, for the purpose of adjusting the light shielding property, other colorants (such as organic pigments and dyes) may be used in combination with titanium black as long as the effects of the present invention are not impaired. Good.
Hereinafter, materials used for introducing Si atoms into the dispersion will be described. When Si atoms are introduced into the dispersion, a Si-containing material such as silica may be used.
Examples of silica that can be used include precipitated silica, fumed silica, colloidal silica, and synthetic silica. These may be appropriately selected and used.
Furthermore, if the particle size of the silica particles is smaller than the film thickness when the light-shielding film is formed, the light-shielding property is more excellent. Therefore, it is preferable to use fine particle type silica as the silica particles. Examples of the fine particle type silica include silica described in paragraph 0039 of JP2013-249417A, and the contents thereof are incorporated in the present specification.
 また、顔料としては、タングステン化合物および金属ホウ化物も使用できる。
 タングステン化合物、および金属ホウ化物は、赤外線(波長が約800~1200nmの光)に対しては吸収が高く(すなわち、赤外線に対する遮光性(遮蔽性)が高く)、可視光に対しては吸収が低い赤外線遮蔽材である。このため、本発明の感光性組成物は、タングステン化合物、および/または金属ホウ化物を含有することで、赤外領域における遮光性が高く、可視光領域における透光性が高いパターンを形成できる。
 また、タングステン化合物、および金属ホウ化物は、画像形成に用いられる、高圧水銀灯、KrFおよびArFなどの露光に用いられる可視域より短波の光に対しても吸収が小さい。
Further, as the pigment, a tungsten compound and a metal boride can also be used.
Tungsten compounds and metal borides have high absorption for infrared rays (light having a wavelength of about 800 to 1200 nm) (that is, they have high light shielding properties (shielding properties) for infrared rays) and absorption for visible light. It is a low infrared shielding material. For this reason, the photosensitive composition of this invention can form a pattern with high light-shielding property in an infrared region, and high translucency in a visible light region by containing a tungsten compound and / or a metal boride.
In addition, the tungsten compound and the metal boride have a small absorption even for light having a wavelength shorter than the visible range used for exposure of a high-pressure mercury lamp, KrF, ArF, or the like used for image formation.
 タングステン化合物としては、酸化タングステン系化合物、ホウ化タングステン系化合物、硫化タングステン系化合物などを挙げることができ、下記一般式(組成式)(I)で表される酸化タングステン系化合物が好ましい。
 M・・・(I)
 Mは金属、Wはタングステン、Oは酸素を表す。
 0.001≦x/y≦1.1
 2.2≦z/y≦3.0
Examples of the tungsten compound include a tungsten oxide compound, a tungsten boride compound, a tungsten sulfide compound, and the like, and a tungsten oxide compound represented by the following general formula (composition formula) (I) is preferable.
M x W y O z (I)
M represents a metal, W represents tungsten, and O represents oxygen.
0.001 ≦ x / y ≦ 1.1
2.2 ≦ z / y ≦ 3.0
 Mの金属としては、例えば、アルカリ金属、アルカリ土類金属、Mg、Zr、Cr、Mn、Fe、Ru、Co、Rh、Ir、Ni、Pd、Pt、Cu、Ag、Au、Zn、Cd、Al、Ga、In、Tl、Sn、Pb、Ti、Nb、V、Mo、Ta、Re、Be、Hf、Os、Biなどが挙げられるが、アルカリ金属であることが好ましい。Mの金属は1種でも2種以上でもよい。 As the metal of M, for example, alkali metal, alkaline earth metal, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Sn, Pb, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, and the like can be mentioned, and an alkali metal is preferable. 1 type or 2 types or more may be sufficient as the metal of M.
 Mはアルカリ金属であることが好ましく、RbまたはCsであることがより好ましく、Csであることがさらに好ましい。 M is preferably an alkali metal, more preferably Rb or Cs, and even more preferably Cs.
 x/yが0.001以上であることにより、赤外線を十分に遮蔽することができ、1.1以下であることにより、タングステン化合物中に不純物相が生成されることをより確実に回避することできる。
 z/yが2.2以上であることにより、材料としての化学的安定性をより向上させることができ、3.0以下であることにより赤外線を十分に遮蔽することができる。
When x / y is 0.001 or more, infrared rays can be sufficiently shielded, and when it is 1.1 or less, generation of an impurity phase in the tungsten compound can be more reliably avoided. it can.
When z / y is 2.2 or more, chemical stability as a material can be further improved, and when it is 3.0 or less, infrared rays can be sufficiently shielded.
 上記一般式(I)で表される酸化タングステン系化合物の具体例としては、Cs0.33WO、Rb0.33WO、K0.33WO、Ba0.33WOなどを挙げることができ、Cs0.33WOまたはRb0.33WOであることが好ましく、Cs0.33WOであることがより好ましい。 Specific examples of the tungsten oxide compound represented by the general formula (I) include Cs 0.33 WO 3 , Rb 0.33 WO 3 , K 0.33 WO 3 , Ba 0.33 WO 3 and the like. Cs 0.33 WO 3 or Rb 0.33 WO 3 is preferable, and Cs 0.33 WO 3 is more preferable.
 タングステン化合物は微粒子であることが好ましい。タングステン微粒子の平均一次粒子径は、800nm以下であることが好ましく、400nm以下であることがより好ましく、200nm以下であることがさらに好ましい。平均一次粒子径がこのような範囲であることによって、タングステン微粒子が光散乱によって可視光を遮断しにくくなることから、可視光領域における透光性をより確実にすることができる。光散乱を回避する観点からは、平均一次粒子径は小さいほど好ましいが、製造時における取り扱い容易性などの理由から、タングステン微粒子の平均一次粒子径は、通常、1nm以上である。 The tungsten compound is preferably fine particles. The average primary particle diameter of the tungsten fine particles is preferably 800 nm or less, more preferably 400 nm or less, and further preferably 200 nm or less. When the average primary particle diameter is in such a range, it becomes difficult for the tungsten fine particles to block visible light by light scattering, and thus the translucency in the visible light region can be further ensured. From the viewpoint of avoiding light scattering, the average primary particle size is preferably as small as possible. However, for reasons such as ease of handling during production, the average primary particle size of the tungsten fine particles is usually 1 nm or more.
 また、タングステン化合物は2種以上を使用することが可能である。 Also, two or more tungsten compounds can be used.
 タングステン化合物は市販品として入手可能であるが、タングステン化合物が、例えば酸化タングステン系化合物である場合、酸化タングステン系化合物は、タングステン化合物を不活性ガス雰囲気または還元性ガス雰囲気中で熱処理する方法により得ることができる(特許第4096205号公報を参照)。
 また、酸化タングステン系化合物は、例えば、住友金属鉱山株式会社製のYMF-02などのタングステン微粒子の分散物としても、入手可能である。
Tungsten compounds are commercially available, but when the tungsten compound is, for example, a tungsten oxide compound, the tungsten oxide compound is obtained by a method of heat-treating the tungsten compound in an inert gas atmosphere or a reducing gas atmosphere. (See Japanese Patent No. 4096205).
Further, the tungsten oxide compound is also available as a dispersion of tungsten fine particles such as YMF-02 manufactured by Sumitomo Metal Mining Co., Ltd.
 また、金属ホウ化物としては、ホウ化ランタン(LaB)、ホウ化プラセオジウム(PrB)、ホウ化ネオジウム(NdB)、ホウ化セリウム(CeB)、ホウ化イットリウム(YB)、ホウ化チタン(TiB)、ホウ化ジルコニウム(ZrB)、ホウ化ハフニウム(HfB)、ホウ化バナジウム(VB)、ホウ化タンタル(TaB)、ホウ化クロム(CrB、CrB)、ホウ化モリブデン(MoB、Mo、MoB)、ホウ化タングステン(W)などの1種または2種以上を挙げることができ、ホウ化ランタン(LaB)であることが好ましい。 In addition, as the metal boride, lanthanum boride (LaB 6 ), praseodymium boride (PrB 6 ), neodymium boride (NdB 6 ), cerium boride (CeB 6 ), yttrium boride (YB 6 ), boride Titanium (TiB 2 ), zirconium boride (ZrB 2 ), hafnium boride (HfB 2 ), vanadium boride (VB 2 ), tantalum boride (TaB 2 ), chromium boride (CrB, CrB 2 ), boride One type or two or more types of molybdenum (MoB 2 , Mo 2 B 5 , MoB), tungsten boride (W 2 B 5 ) and the like can be mentioned, and lanthanum boride (LaB 6 ) is preferable.
 金属ホウ化物は微粒子であることが好ましい。金属ホウ化物微粒子の平均一次粒子径は、800nm以下であることが好ましく、300nm以下であることがより好ましく、100nm以下であることがさらに好ましい。平均粒子径がこのような範囲であることによって、金属ホウ化物微粒子が光散乱によって可視光を遮断しにくくなることから、可視光領域における透光性をより確実にすることができる。光散乱を回避する観点からは、平均一次粒子径は小さいほど好ましいが、製造時における取り扱い容易性などの理由から、金属ホウ化物微粒子の平均一次粒子径は、通常、1nm以上である。 The metal boride is preferably fine particles. The average primary particle diameter of the metal boride fine particles is preferably 800 nm or less, more preferably 300 nm or less, and further preferably 100 nm or less. When the average particle diameter is in such a range, it becomes difficult for the metal boride fine particles to block visible light by light scattering, and thus the translucency in the visible light region can be further ensured. From the viewpoint of avoiding light scattering, the average primary particle size is preferably as small as possible. However, for reasons such as ease of handling during production, the average primary particle size of the metal boride fine particles is usually 1 nm or more.
 また、金属ホウ化物は2種以上を使用することが可能である。 Also, two or more metal borides can be used.
 金属ホウ化物は市販品として入手可能であり、例えば、住友金属鉱山株式会社製のKHF-07AH等の金属ホウ化物微粒子の分散物としても、入手可能である。 The metal boride is available as a commercial product, for example, as a dispersion of metal boride fine particles such as KHF-07AH manufactured by Sumitomo Metal Mining Co., Ltd.
((染料))
 染料としては、例えば特開昭64-90403号公報、特開昭64-91102号公報、特開平1-94301号公報、特開平6-11614号公報、特登2592207号、米国特許4808501号明細書、米国特許5667920号明細書、米国特許505950号明細書、米国特許5667920号明細書、特開平5-333207号公報、特開平6-35183号公報、特開平6-51115号公報、特開平6-194828号公報等に開示されている色素を使用できる。化学構造として区分すると、ピラゾールアゾ化合物、ピロメテン化合物、アニリノアゾ化合物、トリフェニルメタン化合物、アントラキノン化合物、ベンジリデン化合物、オキソノール化合物、ピラゾロトリアゾールアゾ化合物、ピリドンアゾ化合物、シアニン化合物、フェノチアジン化合物、ピロロピラゾールアゾメチン化合物等を使用できる。また、染料としては色素多量体を用いてもよい。色素多量体としては、特開2011-213925号公報、特開2013-041097号公報に記載されている化合物が挙げられる。
((dye))
Examples of the dye include, for example, JP-A No. 64-90403, JP-A No. 64-91102, JP-A No. 1-94301, JP-A No. 6-11614, No. 2592207, and US Pat. No. 4,808,501. US Pat. No. 5,667,920, US Pat. No. 505950, US Pat. No. 5,667,920, JP-A-5-333207, JP-A-6-35183, JP-A-6-51115, and JP-A-6- The pigment | dye currently disclosed by 194828 gazette etc. can be used. When classified as chemical structure, pyrazole azo compounds, pyromethene compounds, anilinoazo compounds, triphenylmethane compounds, anthraquinone compounds, benzylidene compounds, oxonol compounds, pyrazolotriazole azo compounds, pyridone azo compounds, cyanine compounds, phenothiazine compounds, pyrrolopyrazole azomethine compounds, etc. Can be used. A dye multimer may be used as the dye. Examples of the dye multimer include compounds described in JP2011-213925A and JP2013-041097A.
 本発明の組成物は、着色剤に加えて、必要に応じて体質顔料を含んでいてもよい。このような体質顔料としては、例えば、硫酸バリウム、炭酸バリウム、炭酸カルシウム、シリカ、塩基性炭酸マグネシウム、アルミナ白、グロス白、チタンホワイト、および、ハイドロタルサイト等を挙げることができる。これらの体質顔料は、単独でまたは2種以上を混合して使用することができる。体質顔料の使用量は、着色剤100質量部に対して、通常、0~100質量部、好ましくは5~50質量部、より好ましくは10~40質量部である。本発明において、着色剤および体質顔料は、場合により、それらの表面をポリマーで改質して使用することができる。 The composition of the present invention may contain extender pigments as necessary in addition to the colorant. Examples of such extender pigments include barium sulfate, barium carbonate, calcium carbonate, silica, basic magnesium carbonate, alumina white, gloss white, titanium white, and hydrotalcite. These extender pigments can be used alone or in admixture of two or more. The amount of extender used is usually 0 to 100 parts by weight, preferably 5 to 50 parts by weight, and more preferably 10 to 40 parts by weight with respect to 100 parts by weight of the colorant. In the present invention, the colorant and extender can be used with their surface modified with a polymer in some cases.
 着色剤は1種を単独で用いても、2種以上を併用してもよい。着色剤としては、赤色、青色、黄色、緑色、および、紫色等の着色有機顔料を含有してもよい。遮光性顔料(具体的には、チタン窒化物含有粒子)と着色有機顔料とを併用する場合には、着色有機顔料を遮光性顔料に対して1~40質量%用いることが好ましい。色味を調整する観点から赤色顔料と遮光性顔料とを併用することが好ましく、特に限定はされないが赤色顔料としてはピグメントレッド254であることが好ましい。また、遮光性を高める観点から黄色顔料と遮光性顔料とを併用することが好ましく、特に限定はされないが黄色顔料としてはピグメントイエロー150であることが好ましい。 Coloring agents may be used alone or in combination of two or more. As a coloring agent, you may contain colored organic pigments, such as red, blue, yellow, green, and purple. When a light-shielding pigment (specifically, titanium nitride-containing particles) and a colored organic pigment are used in combination, it is preferable to use the colored organic pigment in an amount of 1 to 40% by mass based on the light-shielding pigment. From the viewpoint of adjusting the color, it is preferable to use a red pigment and a light-shielding pigment in combination. Pigment Red 254 is preferable as the red pigment, although not particularly limited. Moreover, it is preferable to use a yellow pigment and a light-shielding pigment in combination from the viewpoint of enhancing the light-shielding property, and although it is not particularly limited, Pigment Yellow 150 is preferable as the yellow pigment.
 本発明の組成物が着色剤を含有する場合には、着色剤の含有量は、組成物の全固形分に対して、20~80質量%が好ましく、30~70質量%がより好ましく、35~60質量%がさらに好ましい。 When the composition of the present invention contains a colorant, the content of the colorant is preferably 20 to 80% by mass, more preferably 30 to 70% by mass, based on the total solid content of the composition, 35 More preferred is ˜60% by mass.
(顔料誘導体)
 本発明の組成物は、顔料誘導体を含有することができる。顔料誘導体としては、例えば、有機顔料の一部分を、酸性基、塩基性基又はフタルイミドメチル基で置換した構造を有する化合物が挙げられる。
 顔料誘導体を構成するための有機顔料としては、ジケトピロロピロール系顔料、アゾ系顔料、フタロシアニン系顔料、アントラキノン系顔料、キナクリドン系顔料、ジオキサジン系顔料、ペリノン系顔料、ペリレン系顔料、チオインジゴ系顔料、イソインドリン系顔料、イソインドリノン系顔料、キノフタロン系顔料、スレン系顔料、金属錯体系顔料等が挙げられる。
 また、顔料誘導体が有する酸性基としては、スルホン酸基、カルボン酸基及びその4級アンモニウム塩基が好ましく、カルボン酸基及びスルホン酸基がさらに好ましく、スルホン酸基が特に好ましい。顔料誘導体が有する塩基性基としては、アミノ基が好ましく、特に三級アミノ基が好ましい。
 顔料誘導体の具体例としては、例えば下記化合物が挙げられる。また、特開2011-252065号公報の段落0162~0183の記載を参酌でき、この内容は本明細書に組み込まれる。
(Pigment derivative)
The composition of the present invention may contain a pigment derivative. Examples of the pigment derivative include a compound having a structure in which a part of an organic pigment is substituted with an acidic group, a basic group, or a phthalimidomethyl group.
Examples of the organic pigment for constituting the pigment derivative include diketopyrrolopyrrole pigments, azo pigments, phthalocyanine pigments, anthraquinone pigments, quinacridone pigments, dioxazine pigments, perinone pigments, perylene pigments, thioindigo pigments , Isoindoline pigments, isoindolinone pigments, quinophthalone pigments, selenium pigments, metal complex pigments, and the like.
Moreover, as an acidic group which a pigment derivative has, a sulfonic acid group, a carboxylic acid group, and its quaternary ammonium base are preferable, a carboxylic acid group and a sulfonic acid group are more preferable, and a sulfonic acid group is especially preferable. The basic group possessed by the pigment derivative is preferably an amino group, particularly preferably a tertiary amino group.
Specific examples of the pigment derivative include the following compounds. In addition, the descriptions in paragraphs 0162 to 0183 of JP2011-252065 A can be referred to, and the contents thereof are incorporated in this specification.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 本発明の組成物が顔料誘導体を含有する場合、顔料誘導体の含有量は、着色剤の全質量に対し、1~30質量%が好ましく、3~20質量%がさらに好ましい。本発明の組成物は、顔料誘導体を、1種類のみを含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。 When the composition of the present invention contains a pigment derivative, the content of the pigment derivative is preferably 1 to 30% by mass and more preferably 3 to 20% by mass with respect to the total mass of the colorant. The composition of the present invention may contain only one type of pigment derivative or two or more types of pigment derivatives. When two or more types are included, the total amount is preferably within the above range.
<組成物の調製方法>
 本発明の組成物は、上述した各種成分を公知の混合方法(例えば、攪拌機、ホモジナイザー、高圧乳化装置、湿式粉砕機、湿式分散機)により混合して調製することができる。
 本発明の組成物は、異物の除去や欠陥の低減等の目的で、フィルタでろ過することが好ましい。フィルタとしては、従来からろ過用途等に用いられているものであれば特に限定されることなく用いることができる。例えば、PTFE(ポリテトラフルオロエチレン)等のフッ素樹脂、ナイロン等のポリアミド系樹脂、ポリエチレン、ポリプロピレン(PP)等のポリオレフィン樹脂(高密度、超高分子量を含む)等によるフィルタが挙げられる。これら素材の中でもポリプロピレン(高密度ポリプロピレンを含む)、ナイロンが好ましい。
 フィルタの孔径は、0.1~7.0μm程度が適しており、好ましくは0.2~2.5μm程度、より好ましくは0.2~1.5μm程度、さらに好ましくは0.3~0.7μmである。この範囲とすることにより、顔料のろ過詰まりを抑えつつ、顔料に含まれる不純物や凝集物等、微細な異物を確実に除去することが可能となる。
 フィルタを使用する際、異なるフィルタを組み合わせてもよい。その際、第1のフィルタでのフィルタリングは、1回のみでもよいし、2回以上行ってもよい。異なるフィルタを組み合わせて2回以上フィルタリングを行う場合は1回目のフィルタリングの孔径より2回目以降の孔径が同じ、または、大きい方が好ましい。また、上述した範囲内で異なる孔径の第1のフィルタを組み合わせてもよい。ここでの孔径は、フィルタメーカーの公称値を参照することができる。市販のフィルタとしては、例えば、日本ポール株式会社、アドバンテック東洋株式会社、日本インテグリス株式会社(旧日本マイクロリス株式会社)または株式会社キッツマイクロフィルタ等が提供する各種フィルタの中から選択することができる。
 第2のフィルタは、上述した第1のフィルタと同様の材料等で形成されたものを使用することができる。第2のフィルタの孔径は、0.2~10.0μm程度が適しており、好ましくは0.2~7.0μm程度、さらに好ましくは0.3~6.0μm程度である。
<Method for preparing composition>
The composition of the present invention can be prepared by mixing the above-described various components by a known mixing method (for example, a stirrer, a homogenizer, a high-pressure emulsifier, a wet pulverizer, a wet disperser).
The composition of the present invention is preferably filtered with a filter for the purpose of removing foreign substances or reducing defects. Any filter can be used without particular limitation as long as it has been conventionally used for filtration. For example, a filter made of fluorine resin such as PTFE (polytetrafluoroethylene), polyamide resin such as nylon, polyolefin resin (including high density and ultra high molecular weight) such as polyethylene and polypropylene (PP), and the like can be given. Among these materials, polypropylene (including high density polypropylene) and nylon are preferable.
The pore size of the filter is suitably about 0.1 to 7.0 μm, preferably about 0.2 to 2.5 μm, more preferably about 0.2 to 1.5 μm, and still more preferably 0.3 to 0.0 μm. 7 μm. By setting it within this range, it is possible to reliably remove fine foreign matters such as impurities and aggregates contained in the pigment while suppressing filtration clogging of the pigment.
When using filters, different filters may be combined. At that time, the filtering by the first filter may be performed only once or may be performed twice or more. When filtering two or more times by combining different filters, it is preferable that the second and subsequent pore diameters are the same or larger than the pore diameter of the first filtering. Moreover, you may combine the 1st filter of a different hole diameter within the range mentioned above. The pore diameter here can refer to the nominal value of the filter manufacturer. As a commercially available filter, for example, it can be selected from various filters provided by Nippon Pole Co., Ltd., Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd. (formerly Japan Microlith Co., Ltd.) or KITZ Micro Filter Co., Ltd. .
As the second filter, a filter formed of the same material as the first filter described above can be used. The pore size of the second filter is suitably about 0.2 to 10.0 μm, preferably about 0.2 to 7.0 μm, more preferably about 0.3 to 6.0 μm.
 本発明の組成物の固形分は、10~40質量%であることが好ましく、12~35質量%であることがより好ましい。組成物の固形分が10質量%以上であることで、硬化膜の遮光性がより向上する。また、組成物の固形分が40質量%以下であることで、組成物の経時粘度安定性がより良好となる。 The solid content of the composition of the present invention is preferably 10 to 40% by mass, and more preferably 12 to 35% by mass. The light shielding property of a cured film improves more because the solid content of a composition is 10 mass% or more. Moreover, when the solid content of the composition is 40% by mass or less, the viscosity stability over time of the composition becomes better.
[硬化膜(遮光膜)]
 本発明の硬化膜は、上述した組成物を用いて得られる。
上記硬化膜は、表面凹凸構造を有することが好ましい。そうすることで、遮光膜もしくは遮光膜を有する遮光層の反射率を低減することができる。前記凹凸構造は、遮光膜そのものの表面に凹凸構造を有するものであっても、遮光膜上に別の層を設けて凹凸構造を付与しても良い。表面凹凸構造の形状は特に限定されないが、表面粗さが0.55μm以上1.5μm以下の範囲であることが好ましい。
遮光膜の反射率は、5%以下であることが好ましく、3%以下であることがより好ましく、2%以下であることが特に好ましい。
表面凹凸構造を作製する方法は特に限定されないが、遮光膜または、それ以外の層に、有機フィラーや無機フィラーを含む方法や、露光現像を利用したリソグラフィー法や、エッチングやスパッタ、ナノインプリント法などで遮光膜またはそれ以外の層の表面を粗面化する方法であっても良い。
また、上記硬化膜の反射率を低減させる方法としては、上記以外に、遮光膜上に低屈折率層を設ける方法や、さらに屈折率の異なる層(例えば、高屈折率層)を複数設ける方法や、例えば特開2015-1654号公報に記載の、低光学濃度層と、高光学濃度層とを形成する方法が挙げられる。
本発明の硬化膜には、上述したチタン窒化物含有粒子が主に含まれる。本発明の硬化膜は、遮光膜として好適に用いられ、具体的にはCCDイメージセンサー又はCMOSイメージセンサー等のイメージセンサー周辺遮光膜(額縁遮光膜)として好適に用いられる。
 以下、硬化膜がイメージセンサー周辺遮光膜として使用された場合を一例として説明する。硬化膜をイメージセンサー周辺遮光膜として用いる場合には、カラーフィルタにイメージセンサー周辺遮光膜を形成し、これをCCDイメージセンサーまたはCMOSイメージセンサーに適用する形態が挙げられる。つまり、カラーフィルタのCCDイメージセンサーまたはCMOSイメージセンサー等の額縁領域に当接する領域に上述の硬化膜を構成することができる。
 本発明のイメージセンサー周辺遮光膜を有するカラーフィルタは、上述した組成物(特に、上述した感光性組成物)を用いて形成されたものである。本発明の組成物を用いて得られるイメージセンサー周辺遮光膜は、パターニング性および電極の防食性に優れる。
[Curing film (light-shielding film)]
The cured film of this invention is obtained using the composition mentioned above.
The cured film preferably has a surface uneven structure. By doing so, the reflectance of the light shielding film or the light shielding layer having the light shielding film can be reduced. Even if the uneven structure has an uneven structure on the surface of the light shielding film itself, another structure may be provided on the light shielding film to provide the uneven structure. The shape of the surface concavo-convex structure is not particularly limited, but the surface roughness is preferably in the range of 0.55 μm to 1.5 μm.
The reflectance of the light shielding film is preferably 5% or less, more preferably 3% or less, and particularly preferably 2% or less.
The method for producing the surface concavo-convex structure is not particularly limited, but the light shielding film or other layers include an organic filler or an inorganic filler, a lithography method using exposure and development, etching, sputtering, nanoimprint method, etc. A method of roughening the surface of the light shielding film or other layers may also be used.
In addition to the above, the method of reducing the reflectance of the cured film includes a method of providing a low refractive index layer on the light shielding film, and a method of providing a plurality of layers having different refractive indexes (for example, high refractive index layers). Alternatively, for example, a method for forming a low optical density layer and a high optical density layer described in JP-A-2015-1654 can be mentioned.
The cured film of the present invention mainly contains the titanium nitride-containing particles described above. The cured film of the present invention is suitably used as a light-shielding film, and specifically, suitably used as a light-shielding film (frame light-shielding film) around an image sensor such as a CCD image sensor or a CMOS image sensor.
Hereinafter, a case where the cured film is used as a light shielding film around the image sensor will be described as an example. When the cured film is used as the image sensor peripheral light-shielding film, an image sensor peripheral light-shielding film is formed on the color filter, and this is applied to a CCD image sensor or a CMOS image sensor. That is, the above-described cured film can be formed in a region that abuts on a frame region such as a color filter CCD image sensor or CMOS image sensor.
The color filter having the image sensor peripheral light-shielding film of the present invention is formed using the above-described composition (particularly, the above-described photosensitive composition). The image sensor peripheral light-shielding film obtained by using the composition of the present invention is excellent in patterning property and electrode corrosion resistance.
 イメージセンサー周辺遮光膜として用いられる場合、遮光膜の膜厚としては特に限定はないが、本発明による効果をより効果的に得る観点からは、乾燥後の膜厚で、0.2μm以上50μm以下が好ましく、0.5μm以上30μm以下がより好ましく、0.7μm以上20μm以下がさらに好ましい。また、遮光膜のサイズ(一辺の長さ)としては、本発明による効果をより効果的に得る観点からは、0.001mm以上5mm以下が好ましく、0.05mm以上4mm以下がより好ましく、0.1mm以上3.5mm以下がさらに好ましい。 When used as a light shielding film around the image sensor, the thickness of the light shielding film is not particularly limited, but from the viewpoint of obtaining the effect of the present invention more effectively, the film thickness after drying is 0.2 μm or more and 50 μm or less. Is preferably 0.5 μm or more and 30 μm or less, and more preferably 0.7 μm or more and 20 μm or less. Further, the size (length of one side) of the light shielding film is preferably 0.001 mm or more and 5 mm or less, more preferably 0.05 mm or more and 4 mm or less, from the viewpoint of obtaining the effect of the present invention more effectively. 1 mm or more and 3.5 mm or less are more preferable.
<硬化膜の製造方法>
 次に、本発明の硬化膜(遮光膜)の製造方法は特に制限されず、公知の方法を採用できる。以下、代表例として、パターン状の硬化膜を製造する方法について詳述する。
<Method for producing cured film>
Next, the manufacturing method of the cured film (light-shielding film) of the present invention is not particularly limited, and a known method can be adopted. Hereinafter, as a representative example, a method for producing a patterned cured film will be described in detail.
 本発明のパターン状の硬化膜の製造方法は、基板上に、本発明の組成物を塗布して組成物層(塗布膜)を形成する工程(以下、適宜「組成物層形成工程」と略称する。)と、上記組成物層を、マスクを介して露光する工程(以下、適宜「露光工程」と略称する。)と、露光後の組成物層を現像してパターン状の硬化膜を形成する工程(以下、適宜「現像工程」と略称する。)と、を含むことを特徴とする。 The method for producing a patterned cured film of the present invention is a process of applying a composition of the present invention on a substrate to form a composition layer (coating film) (hereinafter abbreviated as “composition layer forming process” as appropriate). And a step of exposing the composition layer through a mask (hereinafter abbreviated as “exposure step” as appropriate), and developing the exposed composition layer to form a patterned cured film. (Hereinafter, abbreviated as “development step” as appropriate).
 具体的には、本発明の組成物を、直接または他の層を介して基板上に塗布して、組成物層を形成し(組成物層形成工程)、所定のマスクパターンを介して露光し、光照射された組成物層部分だけを硬化させ(露光工程)、現像液で現像することによって(現像工程)、画素からなるパターン状の硬化膜を形成することができる。
 以下、各工程について説明する。
Specifically, the composition of the present invention is applied on a substrate directly or via another layer to form a composition layer (composition layer forming step), and exposed through a predetermined mask pattern. By curing only the composition layer portion irradiated with light (exposure process) and developing with a developer (development process), a patterned cured film composed of pixels can be formed.
Hereinafter, each step will be described.
(組成物層形成工程)
 組成物層形成工程では、基板上に、本発明の組成物を塗布して組成物層(塗布膜)を形成する。
(Composition layer forming step)
In the composition layer forming step, the composition of the present invention is applied on a substrate to form a composition layer (coating film).
 基板としては、例えば、液晶表示装置等に用いられる無アルカリガラス、ソーダガラス、パイレックス(登録商標)ガラス、石英ガラス、およびこれらに透明導電膜を付着させたもの、固体撮像素子等に用いられる光電変換素子基板(例えば、シリコン基板等)、CCD(Charge Coupled Device)基板、ならびに、CMOS(Complementary Metal-Oxide Semiconductor)基板等が挙げられる。
 また、これらの基板上には、必要により、上部の層との密着改良、物質の拡散防止或いは基板表面の平坦化のために下塗り層を設けてもよい。
Examples of the substrate include alkali-free glass, soda glass, Pyrex (registered trademark) glass, quartz glass used for liquid crystal display devices and the like, and those obtained by attaching a transparent conductive film to them, photoelectric sensors used for solid-state imaging devices, and the like. Examples include a conversion element substrate (for example, a silicon substrate), a CCD (Charge Coupled Device) substrate, and a CMOS (Complementary Metal-Oxide Semiconductor) substrate.
Further, if necessary, an undercoat layer may be provided on these substrates in order to improve adhesion with the upper layer, prevent diffusion of substances, or planarize the substrate surface.
 基板上への本発明の組成物の塗布方法としては、スリット塗布、インクジェット法、回転塗布、流延塗布、ロール塗布、スクリーン印刷法等の各種の塗布方法を適用することができる。 As the coating method of the composition of the present invention on the substrate, various coating methods such as slit coating, ink jet method, spin coating, cast coating, roll coating, screen printing method and the like can be applied.
 イメージセンサー周辺遮光膜を有するカラーフィルタを製造する際には、組成物の塗布膜厚としては、解像度と現像性の観点から、0.35μm以上2.0μm以下が好ましく、0.40μm以上1.5μm以下がより好ましい。 In producing a color filter having a light shielding film around the image sensor, the coating thickness of the composition is preferably 0.35 μm or more and 2.0 μm or less from the viewpoint of resolution and developability, and 0.40 μm or more and 1. 5 μm or less is more preferable.
 基板上に塗布された組成物は、通常、70℃以上110℃以下で2分以上4分以下程度の条件下で乾燥する。これにより、組成物層を形成できる。 The composition coated on the substrate is usually dried at 70 ° C. or higher and 110 ° C. or lower for 2 minutes or longer and 4 minutes or shorter. Thereby, a composition layer can be formed.
(露光工程)
 露光工程では、組成物層形成工程において形成された組成物層(塗布膜)を、マスクを介して露光し、光照射された塗布膜部分だけを硬化させる。
 露光は、活性光線または放射線の照射により行うことが好ましく、特に、g線、h線、i線等の紫外線が好ましく用いられ、高圧水銀灯がより好まれる。照射強度は5~1500mJ/cmが好ましく10~1000mJ/cmがより好ましい。
(Exposure process)
In the exposure step, the composition layer (coating film) formed in the composition layer forming step is exposed through a mask, and only the coating film portion irradiated with light is cured.
The exposure is preferably performed by irradiation with actinic rays or radiation. In particular, ultraviolet rays such as g-line, h-line and i-line are preferably used, and a high-pressure mercury lamp is more preferable. The irradiation intensity 5 ~ 1500mJ / cm 2 is more preferably preferably 10 ~ 1000mJ / cm 2.
(現像工程)
 露光工程に次いで、アルカリ現像処理(現像工程)を行い、露光工程における光未照射部分をアルカリ水溶液に溶出させる。これにより、光硬化した部分(光照射された塗布膜部分)だけが残る。
 現像液としては、イメージセンサー周辺遮光膜を有するカラーフィルタを作製する場合には、下地の回路等にダメージを起さない、有機アルカリ現像液が望ましい。現像温度としては通常20~30℃であり、現像時間は20~90秒である。
(Development process)
Subsequent to the exposure step, an alkali development treatment (development step) is performed, and the light non-irradiated part in the exposure step is eluted in an alkaline aqueous solution. Thereby, only the photocured part (the coating film part irradiated with light) remains.
As the developer, when producing a color filter having a light shielding film around the image sensor, an organic alkali developer that does not cause damage to the underlying circuit or the like is desirable. The development temperature is usually 20 to 30 ° C., and the development time is 20 to 90 seconds.
 アルカリ性の水溶液としては、例えば、無機系現像液および有機系現像液が挙げられる。無機系現像液としては、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸水素ナトリウム、硅酸ナトリウム、メタ硅酸ナトリウムを、濃度が0.001~10質量%、好ましくは0.01~1質量%となるように溶解したアルカリ性水溶液が挙げられる。有機系現像液としては、アンモニア水、エチルアミン、ジエチルアミン、ジメチルエタノールアミン、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、コリン、ピロール、ピペリジン、1,8-ジアザビシクロ-[5.4.0]-7-ウンデセン等のアルカリ性化合物を、濃度が0.001~10質量%、好ましくは0.01~1質量%となるように溶解したアルカリ性水溶液が挙げられる。アルカリ性水溶液には、例えばメタノール、エタノール等の水溶性有機溶剤および/または界面活性剤等を適量添加することもできる。なお、このようなアルカリ性水溶液からなる現像液を使用した場合には、一般に現像後純水で洗浄(リンス)する。 Examples of the alkaline aqueous solution include an inorganic developer and an organic developer. As the inorganic developer, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate, sodium oxalate, sodium metasuccinate having a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass. %, An alkaline aqueous solution dissolved so as to be%. Examples of the organic developer include aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo- [5.4.0] -7. An alkaline aqueous solution in which an alkaline compound such as undecene is dissolved so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass. An appropriate amount of a water-soluble organic solvent such as methanol and ethanol and / or a surfactant can be added to the alkaline aqueous solution. In the case where a developer composed of such an alkaline aqueous solution is used, it is generally washed (rinsed) with pure water after development.
 現像方法としては、例えば、パドル現像方法およびシャワー現像方法等を用いることができる。 As the developing method, for example, a paddle developing method and a shower developing method can be used.
 なお、本発明の硬化膜を有するカラーフィルタの製造方法においては、上述した、組成物層形成工程、露光工程、および現像工程を行った後に、必要により、形成された硬化膜を加熱および/または露光により硬化する硬化工程を含んでいてもよい。 In the method for producing a color filter having a cured film of the present invention, after the above-described composition layer forming step, exposure step, and developing step, the formed cured film is heated and / or if necessary. A curing step of curing by exposure may be included.
〔カラーフィルタ、遮光膜〕
 本発明の組成物を用いて形成された硬化膜は、カラーフィルタの画素ブラックマトリクスもしくは上述したようなイメージセンサー周辺遮光膜(額縁遮光膜)として、または、後述する画像表示装置やセンサモジュール内の各種部材に適用する遮光膜として好ましく用いることができる。
[Color filter, light shielding film]
The cured film formed using the composition of the present invention is a pixel black matrix of a color filter or an image sensor peripheral light shielding film (frame light shielding film) as described above, or in an image display device or sensor module described later. It can be preferably used as a light-shielding film applied to various members.
(カラーフィルタ)
 カラーフィルタは、CCD(電荷結合素子)やCMOS(相補性金属酸化膜半導体)等の固体撮像素子に好適に用いることができ、特に100万画素を超えるような高解像度のCCDやCMOS等に好適である。カラーフィルタは、例えば、CCDまたはCMOSを構成する各画素の受光部と、集光するためのマイクロレンズと、の間に配置して用いることができる。また、カラーフィルタは、隔壁により例えば格子状に仕切られた空間に、各色画素を形成する硬化膜が埋め込まれた構造を有していてもよい。この場合の隔壁は各色画素に対して低屈折率であることが好ましい。このような構造を有する撮像素子の例としては、特開2012-227478号公報、特開2014-179577号公報に記載の装置が挙げられる。
 本発明のカラーフィルタは、上記硬化膜を有していれば特にその形態は限定されない。
 カラーフィルタにおいて、上記硬化膜は、例えば、カラーフィルタの画素ブラックマトリクスもしくは上述したようなイメージセンサー周辺遮光膜(額縁遮光膜)として好適に用いることができる。
(Color filter)
The color filter can be suitably used for a solid-state imaging device such as a CCD (Charge Coupled Device) or a CMOS (Complementary Metal Oxide Semiconductor), and is particularly suitable for a high-resolution CCD or CMOS that exceeds 1 million pixels. It is. The color filter can be used by being disposed, for example, between a light receiving portion of each pixel constituting a CCD or CMOS and a microlens for collecting light. In addition, the color filter may have a structure in which a cured film that forms each color pixel is embedded in a space partitioned by a partition, for example, in a lattice shape. The partition in this case preferably has a low refractive index for each color pixel. Examples of the image pickup device having such a structure include apparatuses described in JP 2012-227478 A and JP 2014-179577 A.
If the color filter of this invention has the said cured film, the form will not be specifically limited.
In the color filter, the cured film can be suitably used, for example, as a pixel black matrix of the color filter or an image sensor peripheral light shielding film (frame light shielding film) as described above.
(遮光膜)
 遮光膜は、画像表示装置やセンサモジュール内の各種部材(例えば、赤外光カットフィルタ、固体撮像素子の外周部、ウェハーレベルレンズ外周部、固体撮像素子裏面等)等に形成して用いることができる。
 また、赤外光カットフィルタの表面上の少なくとも一部に、遮光膜を形成して、遮光膜付き赤外光カットフィルタとしてもよい。
 遮光膜の厚さは特に制限されないが、0.2~25μmが好ましく、1.0~10μmがより好ましい。上記厚さは平均厚さであり、遮光膜の任意の5点以上の厚さを測定し、それらを算術平均した値である。
 遮光膜の反射率は、10%以下が好ましく、8%以下がより好ましく、6%以下がさらに好ましく、4%以下が特に好ましい。なお、遮光膜の反射率は、遮光膜に、入射角度5°で400~700nmの光を入射し、その反射率を日立ハイテクノロジー製分光器UV4100(商品名)により測定した値である。
(Light shielding film)
The light shielding film is formed and used on various members in an image display device or a sensor module (for example, an infrared light cut filter, an outer peripheral portion of a solid-state imaging device, an outer peripheral portion of a wafer level lens, a back surface of a solid-state imaging device, etc.). it can.
Moreover, it is good also as an infrared light cut filter with a light shielding film by forming a light shielding film in at least one part on the surface of an infrared light cut filter.
The thickness of the light shielding film is not particularly limited, but is preferably 0.2 to 25 μm, more preferably 1.0 to 10 μm. The thickness is an average thickness, and is a value obtained by measuring the thickness of any five or more points of the light shielding film and arithmetically averaging them.
The reflectance of the light shielding film is preferably 10% or less, more preferably 8% or less, further preferably 6% or less, and particularly preferably 4% or less. The reflectance of the light shielding film is a value obtained by making the light of 400 to 700 nm incident on the light shielding film at an incident angle of 5 ° and measuring the reflectance with a spectrometer UV4100 (trade name) manufactured by Hitachi High Technology.
〔固体撮像素子〕
 本発明の固体撮像素子は、上記硬化膜(カラーフィルタ、遮光膜等)を備える。本発明の固体撮像素子の構成としては、上記硬化膜を備え、固体撮像素子として機能する構成であれば特に限定はないが、例えば、以下のような構成が挙げられる。
[Solid-state image sensor]
The solid-state imaging device of the present invention includes the cured film (color filter, light shielding film, etc.). The configuration of the solid-state imaging device of the present invention is not particularly limited as long as the solid-state imaging device includes the cured film and functions as a solid-state imaging device.
 基板上に、固体撮像素子(CCDイメージセンサー、CMOSイメージセンサー等)の受光エリアを構成する複数のフォトダイオードおよびポリシリコン等からなる転送電極を有し、フォトダイオードおよび転送電極上にフォトダイオードの受光部のみ開口した遮光膜を有し、遮光膜上に遮光膜全面およびフォトダイオード受光部を覆うように形成された窒化シリコン等からなるデバイス保護膜を有し、デバイス保護膜上に、カラーフィルタを有する構成である。
 さらに、デバイス保護層上であってカラーフィルタの下(基板に近い側)に集光手段(例えば、マイクロレンズ等。以下同じ)を有する構成、カラーフィルタ上に集光手段を有する構成等であってもよい。また、カラーフィルタは、隔壁により例えば格子状に仕切られた空間に、各色画素を形成する硬化膜が埋め込まれた構造を有していてもよい。この場合の隔壁は各色画素に対して低屈折率であることが好ましい。このような構造を有する撮像装置の例としては、特開2012-227478号公報、特開2014-179577号公報に記載の装置が挙げられる。
The substrate has a plurality of photodiodes that constitute a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) and transfer electrodes made of polysilicon, etc., and the photodiodes receive light on the transfer electrodes. A light-shielding film having an opening only in the part, a device protective film made of silicon nitride or the like formed on the light-shielding film so as to cover the entire surface of the light-shielding film and the photodiode light-receiving part, and a color filter on the device protective film It is the composition which has.
Further, the light source has a condensing means (for example, a microlens, etc., the same shall apply hereinafter) on the device protection layer and below the color filter (on the side close to the substrate), and a constitution having a light condensing means on the color filter. May be. In addition, the color filter may have a structure in which a cured film that forms each color pixel is embedded in a space partitioned by a partition, for example, in a lattice shape. The partition in this case preferably has a low refractive index for each color pixel. Examples of the image pickup apparatus having such a structure include apparatuses described in JP 2012-227478 A and JP 2014-179577 A.
〔画像表示装置〕
 本発明の硬化膜(カラーフィルタ、遮光膜等)は、液晶表示装置や有機エレクトロルミネッセンス表示装置等の、画像表示装置に用いることができる。
(Image display device)
The cured film (color filter, light-shielding film, etc.) of the present invention can be used for an image display device such as a liquid crystal display device or an organic electroluminescence display device.
 表示装置の定義や各表示装置の詳細については、例えば「電子ディスプレイデバイス(佐々木 昭夫著、(株)工業調査会 1990年発行)」、「ディスプレイデバイス(伊吹 順章著、産業図書(株)平成元年発行)」等に記載されている。また、液晶表示装置については、例えば「次世代液晶ディスプレイ技術(内田 龍男編集、(株)工業調査会 1994年発行)」に記載されている。本発明が適用できる液晶表示装置に特に制限はなく、例えば、上記の「次世代液晶ディスプレイ技術」に記載されている色々な方式の液晶表示装置に適用できる。 For the definition of display devices and details of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, Kogyo Kenkyukai, 1990)”, “Display Device (Junsho Ibuki, Industrial Books Co., Ltd.) Issued in the first year). The liquid crystal display device is described, for example, in “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, Industrial Research Co., Ltd., published in 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
 本発明におけるカラーフィルタを液晶表示装置に適用する場合は、その形態は特に限定されない。
 以下に、本発明のカラーフィルタを液晶表示装置に適用する場合の態様について詳述する。
 本発明のカラーフィルタは、カラーTFT(Thin Film Transistor)方式の液晶表示装置に用いてもよい。カラーTFT方式の液晶表示装置については、例えば「カラーTFT液晶ディスプレイ(共立出版(株)1996年発行)」に記載されている。さらに、本発明のカラーフィルタはIPS(In Plane Switching)等の横電界駆動方式、MVA(Multi-domain Vertical Alignment)等の画素分割方式等の視野角が拡大された液晶表示装置や、STN(Super-Twist Nematic)、TN(Twisted Nematic)、VA(Vertical Alignment)、OCS(on-chip spacer)、FFS(fringe field switching)、および、R-OCB(Reflective Optically Compensated Bend)等にも適用できる。
 また、本発明におけるカラーフィルタは、明るく高精細なCOA(Color-filter On Array)方式にも供することが可能である。COA方式の液晶表示装置にあっては、カラーフィルタに対する要求特性は、前述のような通常の要求特性に加えて、層間絶縁膜に対する要求特性、すなわち低誘電率および剥離液耐性が必要とされることがある。本発明のカラーフィルタは、耐光性等に優れるので、解像度が高く長期耐久性に優れたCOA方式の液晶表示装置を提供することができる。なお、低誘電率の要求特性を満足するためには、カラーフィルタ層の上に樹脂被膜を設けてもよい。
 これらの画像表示方式については、例えば、「EL、PDP、LCDディスプレイ-技術と市場の最新動向-(東レリサーチセンター調査研究部門 2001年発行)」の43ページ等に記載されている。
When the color filter of the present invention is applied to a liquid crystal display device, the form is not particularly limited.
Below, the aspect in the case of applying the color filter of this invention to a liquid crystal display device is explained in full detail.
The color filter of the present invention may be used in a color TFT (Thin Film Transistor) type liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Further, the color filter of the present invention is a liquid crystal display device with a wide viewing angle, such as a horizontal electric field driving method such as IPS (In Plane Switching), a pixel division method such as MVA (Multi-domain Vertical Alignment), and a STN (Super). -Twist Nematic), TN (Twisted Nematic), VA (Vertical Alignment), OCS (on-chip spacer), FFS (fringe field switching), and R-OCB (Reflective Opt).
In addition, the color filter in the present invention can be used for a bright and high-definition COA (Color-filter On Array) system. In the COA type liquid crystal display device, the required characteristics for the color filter require the required characteristics for the interlayer insulating film, that is, the low dielectric constant and the resistance to the peeling liquid, in addition to the normal required characteristics as described above. Sometimes. Since the color filter of the present invention is excellent in light resistance and the like, a COA type liquid crystal display device having high resolution and excellent long-term durability can be provided. In order to satisfy the required characteristics of a low dielectric constant, a resin film may be provided on the color filter layer.
These image display methods are described, for example, on page 43 of "EL, PDP, LCD display-technology and latest trends in the market-(issued in 2001 by Toray Research Center Research Division)".
 本発明の液晶表示装置は、本発明におけるカラーフィルタ以外に、電極基板、偏光フィルム、位相差フィルム、バックライト、スペーサ、または視野角保障フィルム等様々な部材から構成される。本発明のカラーフィルタは、これらの公知の部材で構成される液晶表示装置に適用することができる。これらの部材については、例えば、「'94液晶ディスプレイ周辺材料・ケミカルズの市場(島 健太郎 (株)シーエムシー 1994年発行)」、「2003液晶関連市場の現状と将来展望(下巻)(表良吉(株)富士キメラ総研、2003年発行)」に記載されている。
 バックライトに関しては、SID meeting Digest 1380(2005)(A.Konno et.al)や、月刊ディスプレイ 2005年12月号の18~24ページ(島 康裕)、同25~30ページ(八木隆明)等に記載されている。
The liquid crystal display device of the present invention includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film in addition to the color filter of the present invention. The color filter of the present invention can be applied to a liquid crystal display device composed of these known members. Regarding these components, for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market (Kentaro Shima CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” Fuji Chimera Research Institute, Ltd., published in 2003) ”.
Regarding backlighting, SID meeting Digest 1380 (2005) (A. Konno et.al), Monthly Display December 2005, pages 18-24 (Yasuhiro Shima), pages 25-30 (Yukiaki Yagi), etc. Are listed.
 また、本発明の硬化膜は、パーソナルコンピュータ、タブレット、携帯電話、スマートフォン、またはデジタルカメラ等のポータブル機器;プリンタ複合機またはスキャナ等のOA(Office Automation)機器;監視カメラ、バーコードリーダ、現金自動預け払い機(ATM)、ハイスピードカメラ、または顔画像認証を使用した本人認証等の産業用機器;車載用カメラ機器;内視鏡、カプセル内視鏡、またはカテーテル等の医療用カメラ機器;生体センサー、バイオセンサー、軍事偵察用カメラ、立体地図用カメラ、気象もしくは海洋観測カメラ、陸地資源探査カメラ、または、宇宙の天文もしくは深宇宙ターゲット用の探査カメラ等の宇宙用機器等に使用される光学フィルタまたはモジュールの遮光部材或いは遮光層に用いることができる。さらには、本発明の硬化膜は、上記光学フィルタまたはモジュールの反射防止部材または反射防止層に用いることができる。 The cured film of the present invention is a portable device such as a personal computer, a tablet, a mobile phone, a smartphone, or a digital camera; an office automation (OA) device such as a multifunction printer or a scanner; a monitoring camera, a barcode reader, a cash automatic Industrial equipment such as personal identification using ATMs, high-speed cameras, or face image authentication; in-vehicle camera equipment; medical camera equipment such as endoscopes, capsule endoscopes, or catheters; Optics used in space equipment such as sensors, biosensors, military reconnaissance cameras, 3D map cameras, weather or ocean observation cameras, land resource exploration cameras, or exploration cameras for space astronomy or deep space targets Light shielding member or light shielding layer of filter or module It can be used. Furthermore, the cured film of the present invention can be used for an antireflection member or an antireflection layer of the optical filter or module.
 また、本発明の硬化膜は、マイクロLED(Light Emitting Diode)やマイクロOLED(Organic Light Emitting Diode)等の用途にも用いることができる。特に限定されないが、マイクロLEDまたはマイクロOLEDに使用される光学フィルタまたは光学フィルムのほか、遮光機能または反射防止機能を付与する部材に対して好適に用いられる。
 マイクロLEDおよびマイクロOLEDの例としては、特表2015-500562号公報および特表2014-533890号公報に記載のものが挙げられる。
Moreover, the cured film of this invention can be used also for uses, such as micro LED (Light Emitting Diode) and micro OLED (Organic Light Emitting Diode). Although it does not specifically limit, In addition to the optical filter or optical film used for micro LED or micro OLED, it is used suitably with respect to the member which provides a light-shielding function or an antireflection function.
Examples of the micro LED and the micro OLED include those described in JP-T-2015-500562 and JP-T-2014-533890.
 また、本発明の硬化膜は、量子ドットディスプレイ等の用途にも用いることができる。特に限定されないが、量子ドットディスプレイに使用される光学フィルターおよび光学フィルムのほか、遮光機能および反射防止機能を付与する部材に対して好適に用いられる。
 量子ドットディスプレイの例としては、米国特許出願公開第2013/0335677号、米国特許出願公開第2014/0036536号、米国特許出願公開第2014/0036203号、および、米国特許出願公開第2014/0035960号に記載のものが挙げられる。
Moreover, the cured film of this invention can be used also for uses, such as a quantum dot display. Although it does not specifically limit, In addition to the optical filter and optical film which are used for a quantum dot display, it uses suitably with respect to the member which provides a light-shielding function and an antireflection function.
Examples of quantum dot displays include U.S. Patent Application Publication No. 2013/0335677, U.S. Patent Application Publication No. 2014/0036536, U.S. Patent Application Publication No. 2014/0036203, and U.S. Patent Application Publication No. 2014/0035960. Those described are mentioned.
 以下に実施例に基づいて本発明をさらに詳細に説明する。以下の実施例に示す材料、使用量、割合、処理内容、処理手順等は、本発明の趣旨を逸脱しない限り適宜変更することができる。したがって、本発明の範囲は以下に示す実施例により限定的に解釈されるべきものではない。 Hereinafter, the present invention will be described in more detail based on examples. The materials, amounts used, ratios, processing details, processing procedures, and the like shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. Therefore, the scope of the present invention should not be construed as being limited by the following examples.
 以下、実施例を用いて、本発明について詳細に説明する。ただし、本発明はこれに限定されるものではない。なお、特に断りのない限り、「部」、「%」は、質量基準である。 Hereinafter, the present invention will be described in detail using examples. However, the present invention is not limited to this. Unless otherwise specified, “part” and “%” are based on mass.
[組成物]
 以下、実施例および比較例の組成物の調製にあたって、まず組成物に含まれる各成分について説明する。
[Composition]
Hereinafter, in preparing the compositions of Examples and Comparative Examples, each component contained in the composition will be described first.
<チタン窒化物含有粒子>
 チタン窒化物含有粒子として、次のようにして製造したチタン窒化物含有粒子TiN-1~TiN-19を用いた。
<Titanium nitride-containing particles>
As titanium nitride-containing particles, titanium nitride-containing particles TiN-1 to TiN-19 produced as follows were used.
(チタン窒化物含有粒子TiN-1)
 チタン窒化物含有粒子TiN-1は、国際公開第2010/147098の図1に記載の黒色複合微粒子製造装置に準ずる装置を用いて製造した。
 黒色複合微粒子製造装置において、プラズマトーチの高周波発振用コイルには、約4MHzおよび約80kVAの高周波電圧を印加し、プラズマガス供給源からはプラズマガスとしてアルゴンガス50L/minおよび窒素50L/minの混合ガスを供給し、プラズマトーチ内にアルゴン-窒素熱プラズマ炎を発生させた。また、材料供給装置の噴霧ガス供給源からは10L/minのキャリアガスを供給した。
 そして、粒子原料1として四塩化チタン(液体)、粒子原料2として液体アンモニア(宇部興産製)、粒子原料3としてTi粉末粒子(トーホーテック社製、「TC―200」)を、キャリアガスであるアルゴンガスと共に、プラズマトーチ内の熱プラズマ炎中に供給し、熱プラズマ炎中で蒸発させ、気相状態で高度に分散させた。なお、粒子原料1~3の各々の流量比率(体積比率)は第1表に示すとおりである。
 また、気体供給装置によって、チャンバ内に供給される気体としては、窒素を使用した。このときのチャンバ内の流速は5m/secとして、供給量は1000L/minとした。また、サイクロン内の圧力は50kPaとし、また、チャンバからサイクロンへのチタン粒子の供給速度は、10m/s(平均値)とした。
 次いで、焼成炉として株式会社奈良橋製作所製ラボキルンL/Kを用いて、粒子に対して熱処理を実施した。具体的には、焼成炉に雰囲気ガスとして窒素を100mL/minで供給しながら240℃にて0.2時間熱処理した。
 このようにして、チタン窒化物含有粒子TiN-1を得た。
(Titanium nitride-containing particles TiN-1)
The titanium nitride-containing particles TiN-1 were produced using an apparatus according to the black composite fine particle production apparatus described in FIG. 1 of International Publication No. 2010/147098.
In the black composite fine particle manufacturing apparatus, a high frequency voltage of about 4 MHz and about 80 kVA is applied to the high frequency oscillation coil of the plasma torch, and the plasma gas supply source mixes argon gas 50 L / min and nitrogen 50 L / min as plasma gas. A gas was supplied to generate an argon-nitrogen thermal plasma flame in the plasma torch. Moreover, 10 L / min carrier gas was supplied from the spray gas supply source of the material supply apparatus.
Further, titanium tetrachloride (liquid) as the particle raw material 1, liquid ammonia (manufactured by Ube Industries) as the particle raw material 2, and Ti powder particles (manufactured by Toho Tech Co., “TC-200”) as the particle raw material 3 are carrier gases. Along with argon gas, it was supplied into a thermal plasma flame in a plasma torch, evaporated in the thermal plasma flame, and highly dispersed in a gas phase. The flow rate ratio (volume ratio) of each of the particle raw materials 1 to 3 is as shown in Table 1.
Further, nitrogen was used as a gas supplied into the chamber by the gas supply device. The flow rate in the chamber at this time was 5 m / sec, and the supply amount was 1000 L / min. The pressure in the cyclone was 50 kPa, and the supply speed of titanium particles from the chamber to the cyclone was 10 m / s (average value).
Next, heat treatment was performed on the particles using a labo kiln L / K manufactured by Narabashi Corporation as a firing furnace. Specifically, heat treatment was performed at 240 ° C. for 0.2 hours while supplying nitrogen as an atmosphere gas to the baking furnace at 100 mL / min.
In this way, titanium nitride-containing particles TiN-1 were obtained.
 得られたチタン窒化物含有粒子TiN-1について、ICP発光分光分析法によって、チタン(Ti)原子、塩素(Cl)原子の含有量を測定した。なお、ICP発光分光分析法には、セイコーインスツルメンツ社製のICP発光分光分析装置「SPS3000」(商品名)を用いた。
 また、窒素原子の含有量については、堀場製作所製の酸素・窒素分析装置「EMGA-620W/C」(商品名)を用いて測定し、不活性ガス融解-熱伝導度法により算出した。結果を第1表に示す。
 また、後述するチタン窒化物含有粒子TiN-2~TiN-19についても、チタン窒化物含有粒子TiN-1と同様の方法によって、Ti原子、Cl原子、窒素原子の含有量を測定した。なお、各粒子における残量は、粒子中に存在する酸化物由来の酸素、金属元素等の不純物である。
 結果を第1表および第2表に示す。
The obtained titanium nitride-containing particles TiN-1 were measured for the content of titanium (Ti) atoms and chlorine (Cl) atoms by ICP emission spectroscopy. For the ICP emission spectroscopic analysis, an ICP emission spectroscopic analyzer “SPS3000” (trade name) manufactured by Seiko Instruments Inc. was used.
The nitrogen atom content was measured using an oxygen / nitrogen analyzer “EMGA-620W / C” (trade name) manufactured by Horiba, Ltd., and calculated by an inert gas melting-thermal conductivity method. The results are shown in Table 1.
For the titanium nitride-containing particles TiN-2 to TiN-19 described later, the contents of Ti atoms, Cl atoms, and nitrogen atoms were measured in the same manner as the titanium nitride-containing particles TiN-1. The remaining amount in each particle is an impurity such as oxygen or metal element derived from an oxide present in the particle.
The results are shown in Tables 1 and 2.
 チタン窒化物含有粒子TiN-1のX線回折は、粉末試料をアルミ製標準試料ホルダーに詰め、広角X線回折法(理学電機社製、商品名「RU-200R」)により測定した。測定条件としては、X線源はCuKα線とし、出力は50kV/200mA、スリット系は1°-1°-0.15mm-0.45mm、測定ステップ(2θ)は0.02°、スキャン速度は2°/分とした。
 そして、このTiN(200)面に由来するピークの回折角(2θ)を測定した。またこのピークの半値幅より、シェラーの式を用いて粒子を構成する結晶子サイズを求めた。結果を第1表に示す。
 なお、以下のチタン窒化物含有粒子TiN-2~TiN-19についても、チタン窒化物含有粒子TiN-1と同様の方法によって、回折角2θおよび結晶子サイズを測定した。結果を第1表および第2表に示す。
X-ray diffraction of titanium nitride-containing particles TiN-1 was measured by a wide-angle X-ray diffraction method (trade name “RU-200R” manufactured by Rigaku Corporation) with a powder sample placed in an aluminum standard sample holder. As measurement conditions, the X-ray source is CuKα ray, the output is 50 kV / 200 mA, the slit system is 1 ° -1 ° -0.15 mm-0.45 mm, the measurement step (2θ) is 0.02 °, and the scan speed is It was 2 ° / min.
And the diffraction angle (2 (theta)) of the peak originating in this TiN (200) surface was measured. The crystallite size constituting the particles was determined from the half width of this peak using Scherrer's equation. The results are shown in Table 1.
For the following titanium nitride-containing particles TiN-2 to TiN-19, the diffraction angle 2θ and the crystallite size were measured in the same manner as the titanium nitride-containing particles TiN-1. The results are shown in Tables 1 and 2.
 チタン窒化物含有粒子TiN-1の平均一次粒子径の測定は、上述した方法に準じ、透過型電子顕微鏡(Transmission Electron Microscope;TEM)を用いて行った。また、上記の測定と同時に、粒子の形状観察を実施したところ、観察対象のチタン窒化物含有粒子100個のうちの60個以上が球形であることが確認された。これらの結果を第1表に示す。なお、粒子の形状観察評価については、測定対象の60%以上が球形である場合、表中では「球形」として示した。球形の粒子の数が測定対象の60%未満である場合には、表中において「球形が60%未満」として示した。また、表中において「立方体」と記載されている場合は、立方体の粒子の数が測定対象の60%以上である場合を示した。尚、立方体とは、立方体と視認されるものに限らず、角の視認される多面体も立方体として測定をした。
 なお、以下のチタン窒化物含有粒子TiN-2~TiN-19についても、チタン窒化物含有粒子TiN-1と同様の方法によって、平均一次粒子径を測定し、さらに形状観察を行った。結果を第1表および第2表に示す。
The average primary particle size of the titanium nitride-containing particles TiN-1 was measured using a transmission electron microscope (TEM) according to the method described above. In addition, when the shape of the particles was observed simultaneously with the above measurement, it was confirmed that 60 or more of the 100 titanium nitride-containing particles to be observed were spherical. These results are shown in Table 1. In addition, regarding the particle shape observation evaluation, when 60% or more of the measurement target is spherical, it is indicated as “spherical” in the table. When the number of spherical particles was less than 60% of the measurement target, it was indicated in the table as “spherical less than 60%”. In the table, “cube” indicates that the number of cubic particles is 60% or more of the measurement target. Note that the cube is not limited to the one visually recognized as a cube, and the polyhedron whose corners are visually recognized was measured as a cube.
For the following titanium nitride-containing particles TiN-2 to TiN-19, the average primary particle diameter was measured and the shape was observed by the same method as for titanium nitride-containing particles TiN-1. The results are shown in Tables 1 and 2.
 チタン窒化物含有粒子TiN-1の比表面積は、日本ベル(株)製高精度全自動ガス吸着装置(“BELSORP”36)を用い、100℃で真空脱気後、Nガスの液体窒素温度(77K)における吸着等温線を測定し、この等温線をBET法で解析して比表面積を求めた。結果を第1表に示す。
 なお、以下のチタン窒化物含有粒子TiN-2~TiN-19についても、チタン窒化物含有粒子TiN-1と同様の方法によって、比表面積を求めた。
 結果を第1表および第2表に示す。
The specific surface area of the titanium nitride-containing particles TiN-1 uses a Nippon Bell Co., Ltd. precision fully automatic gas adsorption apparatus ( "BELSORP" 36), after vacuum degassing at 100 ° C., the temperature of liquid nitrogen of the N 2 gas The adsorption isotherm at (77K) was measured, and this isotherm was analyzed by the BET method to determine the specific surface area. The results are shown in Table 1.
The specific surface areas of the following titanium nitride-containing particles TiN-2 to TiN-19 were also determined in the same manner as the titanium nitride-containing particles TiN-1.
The results are shown in Tables 1 and 2.
(チタン窒化物含有粒子TiN-2)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-2を製造した。
(Titanium nitride-containing particles TiN-2)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-2 were produced.
(チタン窒化物含有粒子TiN-3)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-3を製造した。
(Titanium nitride-containing particles TiN-3)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-3 were produced.
(チタン窒化物含有粒子TiN-4)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-4を製造した。
(Titanium nitride-containing particles TiN-4)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-4 were produced.
(チタン窒化物含有粒子TiN-5)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-5を製造した。
(Titanium nitride-containing particles TiN-5)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-5 were produced.
(チタン窒化物含有粒子TiN-6)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件、チャンバ内の流速を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-6を製造した。
(Titanium nitride-containing particles TiN-6)
Titanium nitride-containing particles TiN-1 except that the particle raw materials 1 to 3 used in the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, the heat treatment conditions, and the flow rate in the chamber are as shown in Table 1. In the same manner as in Example 1, titanium nitride-containing particles TiN-6 were produced.
(チタン窒化物含有粒子TiN-7)
 チャンバ内の流速を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-6と同様にして、チタン窒化物含有粒子TiN-7を製造した。
(Titanium nitride-containing particles TiN-7)
Titanium nitride-containing particles TiN-7 were produced in the same manner as titanium nitride-containing particles TiN-6 except that the flow rate in the chamber was changed as shown in Table 1.
(チタン窒化物含有粒子TiN-8)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件、チャンバ内の流速を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-8を製造した。
(Titanium nitride-containing particles TiN-8)
Titanium nitride-containing particles TiN-1 except that the particle raw materials 1 to 3 used in the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, the heat treatment conditions, and the flow rate in the chamber are as shown in Table 1. In the same manner as in Example 1, titanium nitride-containing particles TiN-8 were produced.
(チタン窒化物含有粒子TiN-9)
 チャンバ内の流速を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-8と同様にして、チタン窒化物含有粒子TiN-9を製造した。
(Titanium nitride-containing particles TiN-9)
Titanium nitride-containing particles TiN-9 were produced in the same manner as titanium nitride-containing particles TiN-8 except that the flow rate in the chamber was changed as shown in Table 1.
(チタン窒化物含有粒子TiN-10)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第1表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-10を製造した。
(Titanium nitride-containing particles TiN-10)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio, and the heat treatment conditions were as shown in Table 1. Titanium nitride-containing particles TiN-10 were produced.
(チタン窒化物含有粒子TiN-11)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-11を製造した。なお、TiN-11において粒子原料3は使用しなかった。
(Titanium nitride-containing particles TiN-11)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-11 were produced. Note that the particle raw material 3 was not used in TiN-11.
(チタン窒化物含有粒子TiN-12)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-12を製造した。なお、TiN-12において粒子原料1及び2は使用しなかった。
(Titanium nitride-containing particles TiN-12)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-12 were produced. In addition, the particle raw materials 1 and 2 were not used in TiN-12.
(チタン窒化物含有粒子TiN-13)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-13を製造した。なお、チタン窒化物含有粒子TiN-13の熱処理温度は250℃とした。
(Titanium nitride-containing particles TiN-13)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-13 were produced. The heat treatment temperature of the titanium nitride-containing particles TiN-13 was 250 ° C.
(チタン窒化物含有粒子TiN-14)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-14を製造した。
(Titanium nitride-containing particles TiN-14)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-14 were produced.
(チタン窒化物含有粒子TiN-15)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-15を製造した。
(Titanium nitride-containing particles TiN-15)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-15 were produced.
(チタン窒化物含有粒子TiN-16)
 熱処理条件を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-15と同様にして、チタン窒化物含有粒子TiN-16を製造した。
(Titanium nitride-containing particles TiN-16)
Titanium nitride-containing particles TiN-16 were produced in the same manner as titanium nitride-containing particles TiN-15 except that the heat treatment conditions were as shown in Table 2.
(チタン窒化物含有粒子TiN-17)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-17を製造した。
(Titanium nitride-containing particles TiN-17)
Titanium nitride containing titanium nitride containing particles TiN-1 particles were produced in the same manner as titanium nitride containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the TiN-1 particles and the flow ratios thereof were as shown in Table 2. Material-containing particles TiN-17 were produced.
(チタン窒化物含有粒子TiN-18)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-18を製造した。
(Titanium nitride-containing particles TiN-18)
Titanium nitride containing titanium nitride containing particles TiN-1 particles were produced in the same manner as titanium nitride containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the TiN-1 particles and the flow ratios thereof were as shown in Table 2. Material-containing particles TiN-18 were produced.
(チタン窒化物含有粒子TiN-19)
 チタン窒化物含有粒子TiN-1粒子の製造に使用した粒子原料1~3およびその流量比率並びに熱処理条件を第2表に示す通りにした以外は、チタン窒化物含有粒子TiN-1と同様にして、チタン窒化物含有粒子TiN-19を製造した。
(Titanium nitride-containing particles TiN-19)
The same as the titanium nitride-containing particles TiN-1, except that the particle raw materials 1 to 3 used for the production of the titanium nitride-containing particles TiN-1 particles, the flow rate ratio thereof, and the heat treatment conditions were as shown in Table 2. Titanium nitride-containing particles TiN-19 were produced.
 上記チタン窒化物含有粒子TiN-1~チタン窒化物含有粒子TiN-19の製造条件および物性を下記の第1表および第2表に示す。
 なお、表中、チタン窒化物含有粒子TiN-11、TiN-12、TiN-13およびTiN-14以外は、いずれも熱処理温度240℃である。
The production conditions and physical properties of the titanium nitride-containing particles TiN-1 to titanium nitride-containing particles TiN-19 are shown in Tables 1 and 2 below.
In the table, except for the titanium nitride-containing particles TiN-11, TiN-12, TiN-13, and TiN-14, the heat treatment temperature is 240 ° C.
(第1表)
Figure JPOXMLDOC01-appb-T000020
(Table 1)
Figure JPOXMLDOC01-appb-T000020
(第2表)
Figure JPOXMLDOC01-appb-T000021
(Table 2)
Figure JPOXMLDOC01-appb-T000021
<分散剤>
 分散剤として、以下の構造の分散剤A~Eを用いた。分散剤A、B、Dにおいて、各構造単位に記載の数値は、全構造単位に対する、各構造単位の質量%を意図する。また、分散剤Cにおいて、各構造単位に記載の数値(a~e)は、全構造単位に対する、各構造単位のモル比を意図し、xおよびyは連結数を意図する。また、分散剤Eにおいては、Zに連結した連結基に記載の数値は、Zに連結した数を意図する。
<Dispersant>
Dispersants A to E having the following structures were used as the dispersants. In the dispersants A, B, and D, the numerical value described in each structural unit intends the mass% of each structural unit with respect to all the structural units. In the dispersant C, the numerical values (a to e) described in each structural unit intend the molar ratio of each structural unit to all structural units, and x and y intend the number of linkages. Further, in the dispersant E, the numerical value described in the linking group linked to Z is intended to be the number linked to Z.
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-I000023
Figure JPOXMLDOC01-appb-I000024
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-I000023
Figure JPOXMLDOC01-appb-I000024
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
<バインダー樹脂>
 バインダー樹脂として、以下のバインダー樹脂AおよびBを用いた。
 ・バインダー樹脂A(アクリキュア RD-F8 日本触媒製、下記構造参照)
 ・バインダー樹脂B(サイクロマーP(ACA)230AA ダイセル製)
<Binder resin>
The following binder resins A and B were used as the binder resin.
・ Binder resin A (ACRYCURE RD-F8, made by Nippon Shokubai, see the structure below)
-Binder resin B (Cyclomer P (ACA) 230AA manufactured by Daicel)
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
<重合性化合物>
・重合性化合物M1(日本化薬社製、商品名「KAYARAD」、下記構造参照)
<Polymerizable compound>
Polymerizable compound M1 (manufactured by Nippon Kayaku Co., Ltd., trade name “KAYARAD”, see structure below)
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 PET-30(ペンタエリスリトールトリアクリレート、日本化薬社製) PET-30 (pentaerythritol triacrylate, manufactured by Nippon Kayaku Co., Ltd.)
<重合開始剤>
・OXE-02:Irgacure OXE02(商品名、BASFジャパン社製)
・OXE-03:Irgacure OXE03(商品名、BASFジャパン社製)
・N-1919:商品名、ADEKA社製
・IRGACURE-907:商品名、BASFジャパン社製
<Polymerization initiator>
OXE-02: Irgacure OXE02 (trade name, manufactured by BASF Japan)
OXE-03: Irgacure OXE03 (trade name, manufactured by BASF Japan)
・ N-1919: Trade name, manufactured by ADEKA ・ IRGACURE-907: Trade name, manufactured by BASF Japan
<溶剤>
・PGMEA:プロピレングリコールモノメチルエーテルアセテート
・シクロペンタノン
・酢酸ブチル
・エチル3-エトキシプロピオネート
・蒸留酢酸ブチル
・蒸留シクロペンタノン
 なお、上記蒸留酢酸ブチルおよび蒸留シクロペンタノンとしては、市販の酢酸ブチルおよびシクロペンタノンを蒸留精製したものを用いた。
<Solvent>
-PGMEA: Propylene glycol monomethyl ether acetate-Cyclopentanone-Butyl acetate-Ethyl 3-ethoxypropionate-Distilled butyl acetate-Distilled cyclopentanone The above-mentioned distilled butyl acetate and distilled cyclopentanone are commercially available butyl acetate And what distilled and refine | purified cyclopentanone was used.
<重合禁止剤>
・p-メトキシフェノール
<Polymerization inhibitor>
・ P-Methoxyphenol
<界面活性剤>
 F-1:下記混合物(重量平均分子量(Mw)=14000)
<Surfactant>
F-1: the following mixture (weight average molecular weight (Mw) = 14000)
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
<顔料分散物の調製>
 まず、チタン窒化物含有粒子、分散剤および溶剤を、攪拌機(IKA社製EUROSTAR)によって15分間混合し、分散物を得た。次に、得られた分散物に対して、(株)シンマルエンタープライゼス製のNPM-Pilotを使用して下記条件にて分散処理を行い、顔料分散液を得た。
(分散条件)
・ビーズ径:φ0.05mm、(ニッカトー製YTZ)
・ビーズ充填率:65体積%
・ミル周速:10m/sec
・セパレータ周速:13m/s
・分散処理する混合液量:15kg
・循環流量(ポンプ供給量):90kg/hour
・処理液温度:19~21℃
・冷却水:水
・処理時間:22時間
<Preparation of pigment dispersion>
First, titanium nitride-containing particles, a dispersant, and a solvent were mixed for 15 minutes with a stirrer (EUROSTAR manufactured by IKA) to obtain a dispersion. Next, the obtained dispersion was subjected to a dispersion treatment under the following conditions using NPM-Pilot manufactured by Shinmaru Enterprises Co., Ltd. to obtain a pigment dispersion.
(Distribution condition)
・ Bead diameter: 0.05mm, (YTZ manufactured by Nikkato)
・ Bead filling rate: 65% by volume
・ Mill peripheral speed: 10m / sec
・ Separator peripheral speed: 13m / s
・ Amount of liquid mixture to be dispersed: 15kg
・ Circulating flow rate (pump supply amount): 90 kg / hour
・ Processing liquid temperature: 19-21 ℃
・ Cooling water: Water ・ Processing time: 22 hours
<組成物の調製>
 次に、上記顔料分散液、バインダー樹脂、重合性化合物、重合開始剤および溶剤を混合、攪拌して、下記第3表~第5表に示す実施例および比較例の各組成物を得た。実施例および比較例の各組成物に含まれる各成分の含有量(質量%)を、第3表~第5表に示す。
 なお、チタン窒化物含有粒子に対する分散剤の比率((質量比)D/P)、組成物中の固形分濃度(質量%)、組成物中の水分量(質量%、以下に測定方法を示す。)、固形分中の顔料濃度(質量%)が第3表~第5表の各実施例および比較例に示す割合になるように各組成物を調製した。
<Preparation of composition>
Next, the pigment dispersion, binder resin, polymerizable compound, polymerization initiator and solvent were mixed and stirred to obtain the compositions of Examples and Comparative Examples shown in Tables 3 to 5 below. Tables 3 to 5 show the contents (% by mass) of the respective components contained in the compositions of Examples and Comparative Examples.
In addition, the ratio of the dispersant to the titanium nitride-containing particles ((mass ratio) D / P), the solid content concentration (mass%) in the composition, the moisture content in the composition (mass%, the measurement method is shown below. Each composition was prepared so that the pigment concentration (% by mass) in the solid content would be the ratio shown in each Example and Comparative Example in Tables 3-5.
(組成物中の水分量の測定)
 実施例および比較例の各組成物の水分量について、カールフィッシャー法を測定原理とするMKV-710(商品名、京都電子工業(株)社製)により測定した。結果を第3表~第5表に示す。
(Measurement of water content in composition)
The water content of each of the compositions of Examples and Comparative Examples was measured by MKV-710 (trade name, manufactured by Kyoto Electronics Industry Co., Ltd.) using the Karl Fischer method as a measurement principle. The results are shown in Tables 3-5.
[評価試験]
 実施例および比較例の各組成物について、以下の各評価試験を行った。
[Evaluation test]
The following evaluation tests were performed for the compositions of the examples and comparative examples.
<アウトガス>
 実施例および比較例の各組成物を用いてカラーフィルタ用の額縁を作製した。
 具体的には、8インチ基板でイメージセンサーを想定して構成されている半導体基板上に、プリベーク後の膜厚が1.5μmとなるように実施例および比較例の組成物をスピンコートして塗膜を形成した。続いて、横720μm、縦520μmの外周に横幅250μm、縦幅200μmの遮光膜が形成できるようなバイナリマスクを配置して、i線露光装置(FPA-3000+i5、キヤノン製)を用いて露光(露光量500mJ/cm)を行った後、さらに現像した。
 得られたカラーフィルタ用の額縁を複数有する半導体基板について、10mm×10mmのサイズに切り出し、昇温脱離ガス分析法(TDS)により、アウトガス中のCl量を検出し、以下の基準により評価を行った。バックグラウンドに含まれる大気成分由来のカウントをキャンセルしたときの質量数1から199までの全アウトガス量(検出全イオン電流値)におけるCl由来のピーク位置のカウント強度比を測定し、下記基準により評価を行った。測定時の真空度は1×10-7Torr以下とした。
 「A」:  アウトガス1L中、Cl量が10ppm以下
 「B」:  アウトガス1L中、Cl量が10ppm超50ppm以下
 「C」:  アウトガス1L中、Cl量が50ppm超100ppm以下
 「D」:  アウトガス1L中、Cl量が100ppm超
<Outgas>
The frame for color filters was produced using each composition of an Example and a comparative example.
Specifically, the compositions of Examples and Comparative Examples were spin-coated on a semiconductor substrate configured with an 8-inch substrate assuming an image sensor so that the film thickness after pre-baking was 1.5 μm. A coating film was formed. Subsequently, a binary mask capable of forming a light-shielding film having a width of 250 μm and a length of 200 μm is arranged on the outer periphery of a width of 720 μm and a length of 520 μm, and exposure (exposure) is performed using an i-line exposure apparatus (FPA-3000 + i5, manufactured by Canon). Further development was carried out after a quantity of 500 mJ / cm 2 ).
The obtained semiconductor substrate having a plurality of frames for the color filter is cut out to a size of 10 mm × 10 mm, and the amount of Cl in the outgas is detected by temperature programmed desorption gas analysis (TDS), and evaluated according to the following criteria. went. The count intensity ratio of the peak position derived from Cl in the total outgas amount (detected total ion current value) from mass number 1 to 199 when the count derived from atmospheric components contained in the background is canceled is evaluated according to the following criteria. Went. The degree of vacuum during the measurement was 1 × 10 −7 Torr or less.
“A”: In 1 L of outgas, Cl amount is 10 ppm or less “B”: In 1 L of outgas, Cl amount is more than 10 ppm and 50 ppm or less “C”: In 1 L of outgas, Cl amount is more than 50 ppm and 100 ppm or less “D”: In 1 L of outgas , Cl content exceeds 100ppm
<パーティクルの個数>
 PGMEAによって上記組成物を500倍に希釈した試料溶液を調製し、この試料溶液10ml中に含まれる10μm以上のサイズのパーティクルの数をフロー式粒子像分析装置(商品名「FPIA-3000」、マルバーン社製)によって測定した。
<Number of particles>
A sample solution in which the above composition was diluted 500 times with PGMEA was prepared, and the number of particles having a size of 10 μm or more contained in 10 ml of this sample solution was determined by a flow type particle image analyzer (trade name “FPIA-3000”, Malvern). ).
<OD値>
 厚さ0.7mm,10cm角のガラス板(EagleXG、Corning社製)上に膜厚1.0μmとなる回転数にて実施例および比較例の組成物をスピンコートして膜を形成し、ホットプレート上100℃、2minの熱処理により乾燥膜を得た。得られた基板に対し、分光光度計U-4100(日立ハイテクノロジーズ製)によりODを測定し、波長領域400nmから1200nmまでにおいて最低となるOD値を測定し、以下の基準により評価を行った。
 「A」:  最低ODが4.2以上
 「B」:  最低ODが3.8以上4.2未満
 「C」:  最低ODが3.5以上3.8未満
 「D」:  最低ODが3.5未満
<OD value>
A film was formed by spin-coating the compositions of Examples and Comparative Examples on a 0.7 mm thick, 10 cm square glass plate (EagleXG, Corning) at a rotation speed of 1.0 μm. A dry film was obtained by heat treatment at 100 ° C. for 2 min on the plate. The obtained substrate was measured for OD with a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies), the lowest OD value was measured in the wavelength region from 400 nm to 1200 nm, and evaluation was performed according to the following criteria.
“A”: Minimum OD is 4.2 or more “B”: Minimum OD is 3.8 or more and less than 4.2 “C”: Minimum OD is 3.5 or more and less than 3.8 “D”: Minimum OD is 3. Less than 5
<ろ過性>
 実施例および比較例の組成物について、カプセルフィルターDFA(日本ポール社製、ナイロン孔径0.45μm、2inch)を用いて、ろ過性の評価を行った。なお、組成物16kgを流量 400ml/minの条件でろ過して、以下の基準により評価を行った。
 「A」:  16kgすべてろ過された。
 「B」:  12kg以上16kg未満までろ過された後、流量が400mL/min未満となった。
 「C」:  8kg以上12kg未満までろ過された後、流量が400mL/min未満となった。
 「D」:  8kg未満までろ過された後、流量が400mL/min未満となった。
<Filterability>
About the composition of an Example and a comparative example, filterability evaluation was performed using the capsule filter DFA (Nippon Pole company make, nylon hole diameter 0.45 micrometer, 2 inches). In addition, 16 kg of the composition was filtered under the condition of a flow rate of 400 ml / min, and evaluated according to the following criteria.
“A”: All 16 kg was filtered.
“B”: After being filtered to 12 kg or more and less than 16 kg, the flow rate was less than 400 mL / min.
“C”: After being filtered to 8 kg or more and less than 12 kg, the flow rate was less than 400 mL / min.
“D”: After filtration to less than 8 kg, the flow rate was less than 400 mL / min.
<組成物経時粘度安定性(CM経時安定)>
 実施例および比較例の組成物を23℃において30日間保存した後、7℃において9ヶ月間保存した。その後、保存前後の各組成物の粘度を、E型粘度計(東機産業社製、商品名「R85形粘度計」)を用いて回転数10rpm、23℃の条件にて測定し、下記式より増粘率を算出した。評価基準は以下の通りである。
 (増粘率)=(経時後の粘度)-(調液直後の粘度)/(調液直後の粘度)
 「A」:  増粘率3%未満
 「B」:  増粘率3%以上5%未満
 「C」:  増粘率5%以上10%未満
 「D」:  増粘率10%以上
<Composition aging viscosity stability (CM aging stability)>
The compositions of Examples and Comparative Examples were stored at 23 ° C. for 30 days and then stored at 7 ° C. for 9 months. Thereafter, the viscosity of each composition before and after storage was measured using an E-type viscometer (trade name “R85 type viscometer” manufactured by Toki Sangyo Co., Ltd.) under the conditions of 10 rpm and 23 ° C. The viscosity increase rate was calculated. The evaluation criteria are as follows.
(Thickening rate) = (viscosity after aging)-(viscosity immediately after preparation) / (viscosity immediately after preparation)
“A”: Thickening rate less than 3% “B”: Thickening rate of 3% or more and less than 5% “C”: Thickening rate of 5% or more and less than 10% “D”: Thickening rate of 10% or more
<パターニング性(解像性)>
 実施例および比較例の組成物を用いて、スピンコーターにより、イメージセンサーデバイス基板上に塗膜を形成した。次いで、得られた塗膜に対して、ホットプレート上で100℃、2minのプリベーク処理を行った。続いて、i線露光装置(FPA、キヤノン製)を用いて上記プリベーク処理を経た塗膜を露光し、さらに現像することにより、基板上の受光部外周部分にダイシングラインおよび電極部以外を被覆する遮光膜を形成すると同時に、基板上に20μmの線幅を有するアライメントマークを20個形成した。
 光学顕微鏡を用い、形成したアライメントマークの個数を観察することで、解像性の評価を行った。
 「A」:  マークが20個形成できた。
 「B」:  マークが19個形成できた。
 「C」:  マークが18個形成できた。
 「D」:  マークが17個以下だった。
<Patternability (resolution)>
Using the compositions of Examples and Comparative Examples, a coating film was formed on the image sensor device substrate with a spin coater. Next, the obtained coating film was pre-baked at 100 ° C. for 2 minutes on a hot plate. Subsequently, the coating film that has been subjected to the pre-baking process is exposed using an i-line exposure apparatus (FPA, manufactured by Canon Inc.), and further developed to cover the outer periphery of the light receiving part on the substrate except for the dicing line and the electrode part. Simultaneously with the formation of the light shielding film, 20 alignment marks having a line width of 20 μm were formed on the substrate.
The resolution was evaluated by observing the number of alignment marks formed using an optical microscope.
“A”: 20 marks were formed.
“B”: 19 marks were formed.
“C”: 18 marks were formed.
“D”: There were 17 or fewer marks.
<電極の防食性>
 実施例および比較例の組成物を用いて、スピンコーターにより、イメージセンサーデバイス基板上に塗膜を形成した。次いで、得られた塗膜形成後のデバイス基板に対して、ホットプレート上で100℃、2minのプリベーク処理を行った。続いて、i線露光装置(FPA-3000+i5、キヤノン製)を用いて上記プリベーク処理を経た塗膜を露光し、さらに現像することにより、基板上の受光部外周部分にダイシングラインおよび電極部以外を被覆する遮光膜を形成した。さらに、得られた遮光膜に対して、ホットプレートを用いて220℃、5minの加熱処理を行った(ポストベーク工程)。
 得られた遮光膜を有するウエハを温度110℃、湿度90%RHの環境下(エスペック社製HAST試験機EHS-411M)で3日間保存した後、電極パターンの錆の発生状態をウエハ上に形成された電極パッド300個について光学顕微鏡(オリンパス社製、商品名「LEXT OLS4500」)により観察して、電極の防食性の評価を以下の基準により行った。
 「A」:  変化が観察されない
 「B」:  電極の錆びつきが2個以下
 「C」:  電極の錆びつきが2個超10個以下
 「D」:  電極の錆びつきが10個超
<Anticorrosion of electrode>
Using the compositions of Examples and Comparative Examples, a coating film was formed on the image sensor device substrate with a spin coater. Next, the obtained device substrate after the coating film formation was prebaked at 100 ° C. for 2 minutes on a hot plate. Subsequently, by using the i-line exposure apparatus (FPA-3000 + i5, manufactured by Canon), the coating film that has been subjected to the above pre-baking treatment is exposed and further developed, so that a portion other than the dicing line and the electrode portion is formed on the outer periphery of the light receiving portion on the substrate. A light shielding film to be coated was formed. Furthermore, the obtained light-shielding film was subjected to heat treatment at 220 ° C. for 5 minutes using a hot plate (post-baking step).
The wafer having the obtained light-shielding film is stored for 3 days in an environment of 110 ° C. and 90% RH (HAST tester EHS-411M manufactured by Espec Corp.), and then the rust generation state of the electrode pattern is formed on the wafer. The 300 electrode pads were observed with an optical microscope (manufactured by Olympus, trade name “LEXT OLS4500”), and the corrosion resistance of the electrodes was evaluated according to the following criteria.
“A”: No change is observed “B”: Electrode rusting is 2 or less “C”: Electrode rusting is more than 2 and 10 or less “D”: Electrode rusting is more than 10
 以上の評価試験の評価結果を、第3表~第5表に示す。
 なお、実施例33において、M1とPET-30との混合比率は、質量比で5:5である。
The evaluation results of the above evaluation tests are shown in Tables 3 to 5.
In Example 33, the mixing ratio of M1 and PET-30 is 5: 5 by mass ratio.
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000031
 第3表~第5表に示すように、チタン窒化物含有粒子中における塩素原子の含有量が0.001~0.3質量%(言い換えると、10質量ppm~3000質量ppm)の範囲内にあることで、電極の防食性に優れ、且つ、パターニング性(解像性)に優れた硬化膜を作製できることが示された(実施例)。
 また、チタン窒化物含有粒子中における塩素原子の含有量が0.3質量%(言い換えると、3000質量ppm)を超えると、パターニング性(解像性)および電極の防食性に劣ることが示された(比較例1、比較例2)。
 また、チタン窒化物含有粒子中における塩素原子の含有量が0.001質量%未満(言い換えると、10質量ppm未満)であると、パターニング性(解像性)に劣ることが示された(比較例3、比較例4)。
As shown in Tables 3 to 5, the content of chlorine atoms in the titanium nitride-containing particles is within the range of 0.001 to 0.3 mass% (in other words, 10 mass ppm to 3000 mass ppm). As a result, it was shown that a cured film excellent in the anticorrosive property of the electrode and excellent in patterning property (resolution) can be produced (Example).
In addition, when the content of chlorine atoms in the titanium nitride-containing particles exceeds 0.3% by mass (in other words, 3000 ppm by mass), it indicates that the patterning property (resolution) and the anticorrosion property of the electrode are inferior. (Comparative Example 1 and Comparative Example 2).
Moreover, when the content of chlorine atoms in the titanium nitride-containing particles was less than 0.001% by mass (in other words, less than 10 ppm by mass), it was shown that the patterning property (resolution) was inferior (comparison). Example 3 and Comparative Example 4).
 また、実施例17~21との対比により、水の含有量は、組成物全質量に対して0.1~1質量%(好ましくは0.1~0.8質量%、より好ましく0.1~0.4質量%)である場合、硬化膜のパターニング性(解像性)と電極材料の防食性により優れることが確認された。また、水の含有量を、組成物全質量に対して0.1~1質量%とすることで、組成物中のパーティクル量をより低減できるほか、組成物の粘度経時安定性にもより優れることが確認された。
 また、実施例26と実施例27との対比により、D/Pが0.3以下である場合に、硬化膜のパターニング性(解像性)により優れることが確認された。
 実施例26、31および32の対比により、チタン窒化物含有粒子の含有量が、組成物の全固形分に対して、30~70質量%である場合に、分光性(良好なOD値)、パターニング性(解像性)および電極の防食性により優れることが確認された。
 また、実施例6~9の対比により、チタン窒化物含有粒子のBET法により求められた比表面積が40~60m/gである場合に、分光性(良好なOD値)およびパターニング性(解像性)により優れることが確認された。また、ろ過性にも優れていることが確認された。
 また、実施例10~14の対比により、チタン窒化物含有粒子の(200)面に由来するピークの回折角2θが、CuKα線をX線源とした場合において、42.8°超43.5°以下である場合に、分光性(良好なOD値)およびパターニング性(解像性)により優れることが確認された。
 また、実施例12~15の対比により、チタン窒化物含有粒子の平均一次粒子径が10~30nmである場合に、分光性(良好なOD値)により優れることが確認された。また、組成物の粘度経時安定性にも優れることが確認された。また、チタン窒化物含有粒子の平均一次粒子径が10nm以上である場合には組成物の粘度経時安定性に優れることが確認された。
 また、実施例12と実施例16との対比により、チタン窒化物含有粒子の透過型電子顕微鏡を用いた一次粒子の形状において、球形の割合が60質量%以上である場合に、分光性(良好なOD値)およびパターニング性(解像性)により優れることが確認された。また、組成物のろ過性および粘度経時安定性にも優れることが確認された。
Further, by comparison with Examples 17 to 21, the water content is 0.1 to 1% by mass (preferably 0.1 to 0.8% by mass, more preferably 0.1% by mass based on the total mass of the composition). It was confirmed that the cured film was excellent in patterning property (resolution) and anticorrosion property of the electrode material. Moreover, by setting the water content to 0.1 to 1% by mass with respect to the total mass of the composition, the amount of particles in the composition can be further reduced, and the viscosity aging stability of the composition is also excellent. It was confirmed.
Further, by comparing Example 26 and Example 27, it was confirmed that when D / P was 0.3 or less, the cured film was more excellent in patternability (resolution).
By comparison with Examples 26, 31 and 32, when the content of titanium nitride-containing particles is 30 to 70% by mass with respect to the total solid content of the composition, spectral properties (good OD value), It was confirmed that the patterning property (resolution) and the corrosion resistance of the electrode were excellent.
Further, in comparison with Examples 6 to 9, when the specific surface area of the titanium nitride-containing particles determined by the BET method is 40 to 60 m 2 / g, the spectral property (good OD value) and the patterning property (solution) It was confirmed that the image quality was superior. Moreover, it was confirmed that the filterability is also excellent.
Further, in comparison with Examples 10 to 14, when the diffraction angle 2θ of the peak derived from the (200) plane of the titanium nitride-containing particles is CuKα ray as an X-ray source, it exceeds 42.8 ° and 43.5 °. It was confirmed that the film was excellent in spectroscopic property (good OD value) and patterning property (resolution) when the temperature was not more than 0 °.
Further, by comparison with Examples 12 to 15, it was confirmed that when the average primary particle diameter of the titanium nitride-containing particles was 10 to 30 nm, the spectral properties (good OD value) were excellent. It was also confirmed that the composition was excellent in viscosity aging stability. Moreover, it was confirmed that when the average primary particle diameter of the titanium nitride-containing particles is 10 nm or more, the viscosity stability of the composition is excellent.
Further, by comparing Example 12 and Example 16, when the ratio of the spherical shape is 60% by mass or more in the shape of the primary particles using a transmission electron microscope of the titanium nitride-containing particles, the spectral properties (good) OD value) and patterning properties (resolution) were confirmed to be excellent. It was also confirmed that the composition was excellent in filterability and viscosity aging stability.
 実施例1において、界面活性剤F-1を用いなかったほかは同様にして評価を行なった。評価の結果、実施例1と同様の結果が得られることが分かった。 Evaluation was conducted in the same manner as in Example 1 except that the surfactant F-1 was not used. As a result of the evaluation, it was found that the same result as in Example 1 was obtained.
<カーボンブラック分散物(CB分散液)の調製>
 上記の顔料分散物の調製において、チタン窒化物含有粒子に代えて、カーボンブラック(商品名「カラーブラック S170」、デグサ社製、平均一次粒子径17nm、BET比表面積200m2/g、ガスブラック方式により製造されたカーボンブラック)を使用した以外は同様の方法により、分散物を作製し、カーボンブラック分散物を得た。
<Preparation of carbon black dispersion (CB dispersion)>
In the preparation of the pigment dispersion, carbon black (trade name “Color Black S170”, manufactured by Degussa, average primary particle diameter of 17 nm, BET specific surface area of 200 m 2 / g, gas black method, instead of titanium nitride-containing particles, was used. A carbon black dispersion was obtained by the same method except that carbon black produced by the above method was used.
 実施例1の組成物の調製において、組成物中でチタン窒化物含有粒子TiN-1を19質量%含有するように添加した顔料分散液に代えて、チタン窒化物含有粒子TiN-1を含有する顔料分散液と、上記のCB分散液と、の混合物[組成物中のチタン窒化物含有粒子TiN-1:組成物のカーボンブラック=15:4(質量比)。組成物中のチタン窒化物含有粒子TiN-1とカーボンブラックとの合計含有量は19質量%である。]を用いた他は同様にして組成物を調製し、これを用いて評価を行なった。評価の結果、実施例1と同様の遮光性が得られることが分かった。 In the preparation of the composition of Example 1, titanium nitride-containing particles TiN-1 are contained in place of the pigment dispersion added to contain 19% by mass of titanium nitride-containing particles TiN-1 in the composition. Mixture of pigment dispersion and CB dispersion described above [titanium nitride-containing particles TiN-1 in composition: carbon black of composition = 15: 4 (mass ratio). The total content of titanium nitride-containing particles TiN-1 and carbon black in the composition is 19% by mass. The composition was prepared in the same manner except that was used, and evaluated using this composition. As a result of the evaluation, it was found that the same light shielding property as in Example 1 was obtained.
<有彩色顔料分散物(PY分散液)の調製>
 上記の顔料分散物の調製において、チタン窒化物含有粒子に代えて、ピグメントイエロー150(Hangzhou Star-up Pigment Co., Ltd.製、商品名6150顔料黄5GN)を使用した以外は同様の方法により、分散物を作製し、有彩色顔料分散物(PY分散液)を得た。
<Preparation of chromatic pigment dispersion (PY dispersion)>
In the preparation of the above pigment dispersion, the same method was used except that Pigment Yellow 150 (manufactured by Hangzhou Star-up Pigment Co., Ltd., trade name 6150 Pigment Yellow 5GN) was used instead of titanium nitride-containing particles. A dispersion was prepared to obtain a chromatic pigment dispersion (PY dispersion).
 実施例1の組成物の調製において、組成物中でチタン窒化物含有粒子TiN-1を19質量%含有するように添加した顔料分散液に代えて、チタン窒化物含有粒子TiN-1を含有する顔料分散液と、上記のPY分散液と、の混合物[組成物中のチタン窒化物含有粒子TiN-1:組成中のピグメントイエロー150=17:2(質量比)。組成物中のチタン窒化物含有粒子TiN-1とピグメントイエロー150との合計含有量は19質量%である。]を用いた他は同様にして組成物を調製し、これを用いて評価を行なった。評価の結果、実施例1と同様の遮光性が得られ、さらに黒味の濃い膜が得られることが分かった。 In the preparation of the composition of Example 1, titanium nitride-containing particles TiN-1 are contained in place of the pigment dispersion added to contain 19% by mass of titanium nitride-containing particles TiN-1 in the composition. Mixture of pigment dispersion and the above PY dispersion [titanium nitride-containing particles TiN-1 in the composition: Pigment Yellow 150 in the composition = 17: 2 (mass ratio). The total content of titanium nitride-containing particles TiN-1 and Pigment Yellow 150 in the composition is 19% by mass. The composition was prepared in the same manner except that was used, and evaluated using this composition. As a result of the evaluation, it was found that the same light shielding property as in Example 1 was obtained, and a darker film was obtained.

Claims (19)

  1.  塩素原子を含むチタン窒化物含有粒子を含有し、
     前記チタン窒化物含有粒子中における前記塩素原子の含有量が、0.001~0.3質量%である、組成物。
    Containing titanium nitride-containing particles containing chlorine atoms,
    A composition in which the content of the chlorine atom in the titanium nitride-containing particles is 0.001 to 0.3% by mass.
  2.  前記チタン窒化物含有粒子の(200)面に由来するピークの回折角2θが、CuKα線をX線源とした場合において、42.8°超43.5°以下である、請求項1に記載の組成物。 2. The peak diffraction angle 2θ derived from the (200) plane of the titanium nitride-containing particles is greater than 42.8 ° and 43.5 ° or less when CuKα rays are used as an X-ray source. Composition.
  3.  前記チタン窒化物含有粒子のBET法により求められた比表面積が、40~60m/gである、請求項1または請求項2に記載の組成物。 The composition according to claim 1 or 2, wherein the titanium nitride-containing particles have a specific surface area determined by a BET method of 40 to 60 m 2 / g.
  4.  前記チタン窒化物含有粒子の平均一次粒子径が10~30nmである、請求項1~3のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 3, wherein the titanium nitride-containing particles have an average primary particle diameter of 10 to 30 nm.
  5.  透過型電子顕微鏡を用いた、前記チタン窒化物含有粒子の一次粒子像の写真観察において、観察対象の100個のうち60個以上が球形である、請求項1~4のいずれか1項に記載の組成物。 5. In photographic observation of a primary particle image of the titanium nitride-containing particles using a transmission electron microscope, 60 or more of 100 observation objects are spherical. Composition.
  6.  さらに、2種以上の溶剤を含有する、請求項1~5のいずれか1項に記載の組成物。 Furthermore, the composition according to any one of claims 1 to 5, further comprising two or more solvents.
  7.  さらに、分散剤を含有する、請求項1~6のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 6, further comprising a dispersant.
  8.  前記チタン窒化物含有粒子に対する前記分散剤の含有割合が、質量比で0.3以下である、請求項7に記載の組成物。 The composition according to claim 7, wherein a content ratio of the dispersant to the titanium nitride-containing particles is 0.3 or less by mass ratio.
  9.  さらに、重合性化合物を含有する、請求項1~8のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 8, further comprising a polymerizable compound.
  10.  さらに、重合開始剤を含有する、請求項1~9のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 9, further comprising a polymerization initiator.
  11.  前記組成物中の固形分が10~40質量%である、請求項1~10のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 10, wherein a solid content in the composition is 10 to 40% by mass.
  12.  前記チタン窒化物含有粒子の含有量が、前記組成物の全固形分に対して、30~70質量%である、請求項1~11のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 11, wherein a content of the titanium nitride-containing particles is 30 to 70 mass% with respect to a total solid content of the composition.
  13.  さらに、水を含有し、
     前記水の含有量が、前記組成物全質量に対して、0.1~1質量%である、請求項1~12のいずれか1項に記載の組成物。
    In addition, it contains water
    The composition according to any one of claims 1 to 12, wherein a content of the water is 0.1 to 1% by mass with respect to a total mass of the composition.
  14.  さらに、分散剤を含有し、
     前記分散剤が、ポリカプロラクトン、ポリバレロラクトン、ポリアクリル酸メチルおよびポリメタクリル酸メチルからなる群より選択される少なくとも1種の構造を有する、請求項1~13のいずれか1項に記載の組成物。
    In addition, it contains a dispersant,
    The composition according to any one of claims 1 to 13, wherein the dispersant has at least one structure selected from the group consisting of polycaprolactone, polyvalerolactone, polymethyl acrylate, and polymethyl methacrylate. object.
  15.  請求項1~14のいずれか1項に記載の組成物を用いて得られる、硬化膜。 A cured film obtained using the composition according to any one of claims 1 to 14.
  16.  請求項15に記載の硬化膜を有する、カラーフィルタ。 A color filter having the cured film according to claim 15.
  17.  請求項15に記載の硬化膜を有する、遮光膜。 A light-shielding film having the cured film according to claim 15.
  18.  請求項15に記載の硬化膜を有する、固体撮像素子。 A solid-state imaging device having the cured film according to claim 15.
  19.  請求項15に記載の硬化膜を有する、画像表示装置。
     
    An image display device comprising the cured film according to claim 15.
PCT/JP2017/009177 2016-03-31 2017-03-08 Composition, cured film, color filter, light-blocking film, solid-state imaging element and image display device WO2017169584A1 (en)

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