WO2017164508A1 - Dispositif de génération de plasma linéaire à haut degré de sélectivité spatiale - Google Patents
Dispositif de génération de plasma linéaire à haut degré de sélectivité spatiale Download PDFInfo
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- WO2017164508A1 WO2017164508A1 PCT/KR2017/001061 KR2017001061W WO2017164508A1 WO 2017164508 A1 WO2017164508 A1 WO 2017164508A1 KR 2017001061 W KR2017001061 W KR 2017001061W WO 2017164508 A1 WO2017164508 A1 WO 2017164508A1
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- electrode
- ground electrode
- power electrode
- gas
- dielectric barrier
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2441—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32366—Localised processing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/40—Separators; Membranes; Diaphragms; Spacing elements inside cells
- H01M50/403—Manufacturing processes of separators, membranes or diaphragms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/40—Separators; Membranes; Diaphragms; Spacing elements inside cells
- H01M50/471—Spacing elements inside cells other than separators, membranes or diaphragms; Manufacturing processes thereof
- H01M50/474—Spacing elements inside cells other than separators, membranes or diaphragms; Manufacturing processes thereof characterised by their position inside the cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/40—Separators; Membranes; Diaphragms; Spacing elements inside cells
- H01M50/471—Spacing elements inside cells other than separators, membranes or diaphragms; Manufacturing processes thereof
- H01M50/48—Spacing elements inside cells other than separators, membranes or diaphragms; Manufacturing processes thereof characterised by the material
- H01M50/486—Organic material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Plasma Technology (AREA)
Abstract
Selon un mode de réalisation, la présente invention concerne un dispositif de génération de plasma à décharge à barrière diélectrique qui comprend : une électrode d'alimentation comprenant une partie apparente pour une décharge à barrière diélectrique ; une électrode mise à la masse en regard de l'électrode d'alimentation ; et une partie barrière diélectrique agencée sur l'électrode d'alimentation. Le dispositif de génération de plasma à décharge à barrière diélectrique comprend : une partie masque comprenant au moins une ouverture principale et au moins une ouverture auxiliaire agencée pour être espacée de cette dernière dans une première direction, la partie masque s'étendant dans la première direction et étant agencée dans une première zone, dans laquelle un objet à traiter et la partie apparente de l'électrode d'alimentation se font face, de façon à générer un plasma à travers l'ouverture principale de manière que l'objet à traiter soit sélectivement soumis à un traitement par plasma en fonction de sa position dans la première direction ; une partie de distribution de gaz principale enfouie dans l'électrode mise à la masse de façon à apporter uniformément un premier gaz à la partie apparente de l'électrode d'alimentation le long de la première direction ; et une partie de distribution de gaz auxiliaire enfouie dans l'électrode mise à la masse de façon à apporter un second gaz à travers l'ouverture auxiliaire, ce qui permet de réguler la pression le long de la première direction.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2016-0035073 | 2016-03-24 | ||
| KR1020160035073A KR101804561B1 (ko) | 2016-03-24 | 2016-03-24 | 높은 공간 선택성을 가지는 선형 플라즈마 발생 장치 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2017164508A1 true WO2017164508A1 (fr) | 2017-09-28 |
Family
ID=59899627
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/KR2017/001061 WO2017164508A1 (fr) | 2016-03-24 | 2017-02-01 | Dispositif de génération de plasma linéaire à haut degré de sélectivité spatiale |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR101804561B1 (fr) |
| WO (1) | WO2017164508A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110035594A (zh) * | 2019-03-18 | 2019-07-19 | 西安交通大学 | 基于介质阻挡放电等离子体的材料改性装置、系统及方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101950414B1 (ko) * | 2018-08-28 | 2019-02-20 | 한국기초과학지원연구원 | 저온 플라즈마 수처리 발생 장치 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002018276A (ja) * | 2000-07-10 | 2002-01-22 | Pearl Kogyo Kk | 大気圧プラズマ処理装置 |
| KR20060010798A (ko) * | 2003-05-14 | 2006-02-02 | 세키스이가가쿠 고교가부시키가이샤 | 플라스마 처리 장치 및 그 제조 방법 |
| JP2008521170A (ja) * | 2004-11-16 | 2008-06-19 | ハイパーサーム インコーポレイテッド | 内部流路付き電極を有するプラズマアークトーチ |
| KR20080072558A (ko) * | 2007-02-02 | 2008-08-06 | 강방권 | 균일한 상압 플라즈마 발생장치 |
| KR101030712B1 (ko) * | 2009-08-25 | 2011-04-26 | 글로벌텍 주식회사 | 플라즈마 처리 장치 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4579522B2 (ja) | 2003-09-29 | 2010-11-10 | 株式会社イー・スクエア | プラズマ表面処理装置 |
| US9161427B2 (en) | 2010-02-17 | 2015-10-13 | Vision Dynamics Holding B.V. | Device and method for generating a plasma discharge for patterning the surface of a substrate |
| JP2012216318A (ja) | 2011-03-31 | 2012-11-08 | Sekisui Chem Co Ltd | プラズマ処理装置 |
-
2016
- 2016-03-24 KR KR1020160035073A patent/KR101804561B1/ko active IP Right Grant
-
2017
- 2017-02-01 WO PCT/KR2017/001061 patent/WO2017164508A1/fr active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002018276A (ja) * | 2000-07-10 | 2002-01-22 | Pearl Kogyo Kk | 大気圧プラズマ処理装置 |
| KR20060010798A (ko) * | 2003-05-14 | 2006-02-02 | 세키스이가가쿠 고교가부시키가이샤 | 플라스마 처리 장치 및 그 제조 방법 |
| JP2008521170A (ja) * | 2004-11-16 | 2008-06-19 | ハイパーサーム インコーポレイテッド | 内部流路付き電極を有するプラズマアークトーチ |
| KR20080072558A (ko) * | 2007-02-02 | 2008-08-06 | 강방권 | 균일한 상압 플라즈마 발생장치 |
| KR101030712B1 (ko) * | 2009-08-25 | 2011-04-26 | 글로벌텍 주식회사 | 플라즈마 처리 장치 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110035594A (zh) * | 2019-03-18 | 2019-07-19 | 西安交通大学 | 基于介质阻挡放电等离子体的材料改性装置、系统及方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20170113722A (ko) | 2017-10-13 |
| KR101804561B1 (ko) | 2017-12-06 |
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