WO2017156842A1 - 产生掩膜图案的系统和方法以及曝光系统 - Google Patents
产生掩膜图案的系统和方法以及曝光系统 Download PDFInfo
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- WO2017156842A1 WO2017156842A1 PCT/CN2016/081258 CN2016081258W WO2017156842A1 WO 2017156842 A1 WO2017156842 A1 WO 2017156842A1 CN 2016081258 W CN2016081258 W CN 2016081258W WO 2017156842 A1 WO2017156842 A1 WO 2017156842A1
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- Prior art keywords
- mask pattern
- signal
- network
- information
- mask
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70541—Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers
Definitions
- the present application relates to the field of mask exposure, and more particularly to a system for generating a mask pattern, a method for generating a mask pattern, and an exposure system.
- the Internet of Things uses information sensing devices such as radio frequency identification (RFID), infrared sensors, and global positioning systems to connect any item to the Internet in accordance with agreed protocols for information exchange and communication, thereby enabling intelligent identification, location, and tracking. , monitoring and management.
- RFID radio frequency identification
- RFID infrared sensors
- global positioning systems to connect any item to the Internet in accordance with agreed protocols for information exchange and communication, thereby enabling intelligent identification, location, and tracking. , monitoring and management.
- embodiments of the present invention provide a system for generating a mask pattern, and a method for generating a mask pattern.
- the mask pattern generating device in the exposure system needs to store a large number of mask patterns, each time It takes a lot of time for the manufacturer to perform mask confirmation during production. At the same time, the equipment needs to frequently call different masks during production, which causes a lot of manpower, material resources and wasted time.
- a system for generating a mask pattern comprising:
- a mask pattern providing device configured to provide a mask pattern signal through a wired or wireless network
- a mask pattern transfer device configured to process a mask pattern signal provided by the mask pattern providing device to generate mask pattern information, and transmit the generated mask pattern information by a radio frequency identification "RFID" signal;
- the mask pattern generating device is configured to generate and display a mask pattern corresponding to the mask pattern information based on the mask pattern information.
- the mask pattern providing device is a local PC or a mobile device.
- the wired network is at least one of an Internet, a local area network, a wide area network, and a telecommunication network.
- the wireless network is at least one of a 3G network, a 4G network, an LTE network, a WiFi network, a Bluetooth network, and an NFC network.
- the mask pattern conveying device comprises:
- a cloud and/or a gateway configured to process a mask pattern signal provided by the mask pattern providing device
- An RFID controller configured to transmit the RFID signal to the mask pattern generating device to supply power to the mask pattern generating device and to transmit mask pattern information.
- the RFID signal includes mask pattern information and a power signal for supplying power to the mask pattern generating device.
- the mask pattern generating device comprises:
- a radio frequency module configured to read an RFID signal sent by the RFID controller
- An energy storage module configured to store a power signal in the RFID signal
- An information processing module configured to parse mask pattern information in the RFID signal into mask pattern data
- a storage module configured to store and update a mask pattern corresponding to the mask pattern data
- a display module configured to display a mask pattern updated by the storage module.
- the mask pattern data is a binary number, an octal number or a hexadecimal number.
- the energy storage module stores electrical energy capable of updating a mask pattern displayed by the display module.
- the energy storage module is further configured to supply power to the information processing module, the storage module, and the display module by using the power signal.
- the display module is an electronic ink screen.
- an intelligent exposure system comprising the mask pattern generating apparatus of any of the preceding claims.
- a method for generating a mask pattern including:
- the mask pattern information transmitting device Processing, by the mask pattern information transmitting device, the mask pattern signal provided by the mask pattern providing device to generate mask pattern information, and transmitting the mask pattern information by the radio frequency identification "RFID" signal;
- the mask pattern generating device generates a mask pattern corresponding to the mask pattern based on the mask pattern information and displays it.
- the interaction between the mask pattern providing device (local PC or mobile device) and the mask pattern generating device is realized by using the Internet of Things technology, so that the mask pattern generating device displays a plurality of different masks through the electronic ink screen.
- the film pattern enables a fast, low-cost exposure. It is avoided that the mask pattern generating device needs to store a large number of mask patterns, and each time the production requires an engineer to spend a large amount of time for mask confirmation, and at the same time, the device needs to frequently call different masks during production, thereby generating a large amount of manpower and material resources. And the problem of wasted time.
- FIG. 1 is a block diagram of a system for generating a mask pattern in accordance with an embodiment of the present invention
- FIG. 2 is a block diagram of a mask pattern generating apparatus according to an embodiment of the present invention.
- 3A-3C are schematic diagrams of examples of mask patterns generated by a mask pattern generating device according to an embodiment of the present invention.
- FIG. 4 is a flow chart of a mask pattern generating method in accordance with an embodiment of the present invention.
- FIG. 1 shows a block diagram of a system 100 for generating a mask pattern in accordance with an embodiment of the present invention.
- a display device adjusting device 100 may include a mask pattern providing device 101, a mask pattern transmitting device 102, and a mask pattern generating device 103.
- the mask pattern providing device 101 is configured to provide a mask pattern signal through a wired or wireless network.
- the mask pattern providing device may be a local personal computer (PC), such as a tablet PC, a desktop PC, a laptop PC, a netbook, etc., or may be a mobile device, such as a mobile phone, a smart phone, a video phone. , e-book readers, personal digital assistants (PDAs), etc.
- PC personal computer
- a user or an engineer can download or save a large number of different mask patterns in the mask pattern providing device 101, and transmit the mask patterns in the form of electrical signals through a wired or wireless network.
- mask pattern information is transferred to a semiconductor substrate through an exposure process, thereby manufacturing different semiconductor products.
- 3A-3C show examples of several mask patterns, for example, the mask pattern may be vertical stripes, horizontal stripes, diagonal stripes, dot matrix, and the like. Those skilled in the art can understand that the mask pattern is not limited to the above pattern examples.
- the wired network may be the Internet, a local area network (LAN), a wide area network (WAN), a telecommunications network, etc., and is not limited to a particular network.
- the wireless network may be a short-range wireless communication network, such as a wireless fidelity (Wi-Fi) direct connection network, a Wi-Fi network, a Bluetooth network, a near field communication (NFC) network, a device-to-device (DTD) network, etc., or It is a cellular network, a satellite network, etc., such as a 3G/4G/Long Term Evolution (LTE) network, and is not limited to a specific network.
- Wi-Fi wireless fidelity
- Wi-Fi wireless fidelity
- Bluetooth Bluetooth
- NFC near field communication
- DTD device-to-device
- LTE Long Term Evolution
- the mask pattern transfer device 102 is configured to process the mask pattern signal provided by the mask pattern providing device 101 to generate mask pattern information, and to transmit the generated mask pattern information by radio frequency identification "RFID" signal.
- RFID radio frequency identification
- the mask pattern transmitting device 102 can implement processing of a large number of mask pattern signals by accessing the cloud or the gateway, and realize wireless power supply and information transmission through the RFID technology.
- the cloud is a software platform that allows users to install and download various processing software. Various processing (for example, filtering, enhancement, sharpening, binarization, etc.) can be performed using the cloud mask pattern signal to generate information related to the mask pattern.
- the mask pattern transfer device 102 includes: a cloud and/or a gateway configured to process a mask pattern signal provided by the mask pattern providing device 101; and an RFID controller configured to generate the mask pattern
- the device 103 transmits an RFID signal to supply power to the mask pattern generating device 103 and to transmit mask pattern information.
- the RFID signal includes mask pattern information and a power signal that supplies power to the mask pattern generating device 103.
- the mask pattern transfer device 102 implements both the power supply function and the transfer information function. Therefore, the mask pattern generating device 103 operates only when the mask pattern transmitting device 102 supplies the RFID signal thereto, thereby realizing a fast, convenient, and low-cost mask pattern generating method.
- the mask pattern generating device 103 is configured to generate and display a mask pattern corresponding to the mask pattern information based on the mask pattern information transmitted by the mask pattern transfer device 102.
- the interaction between the mask pattern providing device 101 (for example, a local PC or a mobile device) and the mask pattern generating device 103 is realized by the Internet of Things technology, so that various mask patterns can be displayed. Further, the processing of a large amount of data is realized by accessing the cloud or the gateway, and wireless power supply (ie, power supply from the RFID controller) and information transmission are realized by the RFID technology. Thereby reducing power consumption, cost, and saving a lot of manpower, material resources and machine waste.
- FIG. 2 shows a block diagram of a mask pattern generating device 103 in accordance with an embodiment of the present invention.
- the mask pattern generating device 103 includes a radio frequency module 201, an energy storage module 202, an information processing module 203, a storage module 204, and a display module 205.
- the radio frequency module 201 is configured to read an RFID signal transmitted by the RFID controller, such as an electromagnetic wave signal, and then transmit the power signal and the pattern information in the RFID signal to the energy storage module 202 and the information processing module 203, respectively.
- the energy storage module 202 is configured to convert the portion of the RFID signal used to power the mask pattern generating device 103 into a power signal and temporarily store the information, and use the power signal to the information processing module 203, the storage module 204, and The display module 205 is powered.
- the energy storage module 204 may take the form of a coil, such as may be a supercapacitor. Therefore, the mask pattern generating device 103 itself is not equipped with a power source, and the power supplied thereto is derived from the RFID signal transmitted from the RFID controller. Therefore, the mask pattern generating device 103 does not operate without updating the mask pattern, thereby reducing the power consumption of the device itself, while reducing the device cost since a separate power source is not required.
- the information processing module 203 is configured to parse the mask pattern information in the RFID signal into mask pattern data.
- the mask pattern data may be a binary number, an octal number, or a hexadecimal number, but is not limited to a specific value.
- the storage module 204 is configured to store a mask pattern corresponding to the mask pattern data, and to update a conventional mask pattern stored previously, that is, to update a mask pattern corresponding to the pattern mask data.
- the display module 205 is configured to display the mask pattern updated by the storage module 204 upon detecting an update in the storage module 204.
- the energy storage module 202 stores sufficient electrical energy that is required to cause the display module 205 to update the display screen.
- display module 205 is an electronic ink screen.
- the electronic ink screen is a screen using electronic ink, and is a new method and technology for information display. Like most traditional inks, electronic inks and lines that change their color can be printed on a variety of surfaces, such as curved plastic, polyester film, paper or cloth. The difference from conventional paper is that the electronic ink changes color when it is powered on, and can display a changed image.
- an image signal is provided by a local PC or a mobile device, and a selective transparent area appears on the electronic ink screen, thereby realizing display of the mask pattern and performing exposure processing.
- the electronic ink screen consumes very little power during static display, and only needs to consume energy when updating the screen.
- the mask pattern generating apparatus does not need to store a large number of mask patterns and uses electric power from the outside as well as a low-power electronic ink screen, thereby realizing a quick, convenient, low-cost exposure processing.
- FIG. 400 A flowchart of a method 400 for generating a mask pattern in accordance with an embodiment of the present invention is next described with reference to FIG.
- a mask pattern signal is provided by a mask pattern providing signal through a wired or wireless network.
- the mask pattern information provided by the mask pattern providing device is processed by the mask pattern information transfer device to generate mask pattern information, and the mask pattern information is transmitted by the radio frequency identification "RFID" signal.
- a mask pattern generating device generates a mask pattern corresponding to the mask pattern information based on the mask pattern information and displays it.
- the interaction between the mask pattern providing device (for example, a local PC or a mobile device) and the mask pattern generating device is realized by the Internet of Things technology, so that various mask patterns can be displayed.
- the processing of a large amount of data is realized by accessing the cloud or the gateway, and wireless power supply (ie, power supply from the RFID controller) and information transmission are realized by the RFID technology. Thereby reducing power consumption, cost, and saving a lot of manpower, material resources and machine waste.
- an intelligent exposure system comprising the mask pattern generating apparatus in the embodiment as described above.
- the intelligent exposure system invokes a mask pattern generated by the mask pattern generating device to expose the photoresist-coated substrate to fabricate semiconductor substrates having different patterns.
- the intelligent exposure system is capable of interacting with a mask pattern providing device (for example, a local PC or a mobile device) through the Internet of Things, so that a large number of different masks are called by RFID when exposing different substrates. Patterns without having to store these large number of mask patterns inside the intelligent exposure system. Therefore, the conventional exposure system is required to require a large amount of manpower, material resources and machine waste caused by the engineers frequently calling different mask patterns stored in the exposure system and confirming them.
- some implementations may be in the form of hardware for operation on, for example, a device or combination of devices, while other embodiments may be in the form of software and/or firmware.
- some embodiments may include one or more items, such as a storage medium or storage medium.
- a storage medium such as a CD-ROM, a computer disk, a flash memory, or the like, on which instructions can be stored, which, when executed by a system such as a computer system, computing platform, or other system, can cause the processor to be based on the claimed subject matter. Executing, for example, one of the above embodiments.
- the computing platform can include one or more processing units or processors, one or more input/output devices (eg, display, keyboard, and/or mouse), and one or more memories (eg, static random access memory) , dynamic random access memory, flash memory, and/or hard drive).
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- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
Claims (12)
- 一种用于产生掩膜图案的系统,包括:掩膜图案提供设备,配置为通过有线或无线网络提供掩膜图案信号;掩膜图案传送设备,配置为对所述掩膜图案提供设备提供的所述掩膜图案信号进行处理,以产生掩膜图案信息,并且通过射频标识“RFID”信号传送产生的掩膜图案信息;以及掩膜图案产生设备,配置为基于所述掩膜图案信息,产生与所述掩膜图案信息对应的掩膜图案并显示。
- 根据权利要求1所述的系统,其中,所述掩膜图案提供设备是本地PC或移动设备。
- 根据权利要求1所述的系统,其中,所述有线网络是互联网、局域网、广域网、电信网络中的至少一个。
- 根据权利要求1所述的系统,其中,所述无线网络是3G网络、4G网络、LTE网络、WiFi网络、蓝牙网络和NFC网络中的至少一个。
- 根据权利要求1所述的系统,其中,所述掩膜图案传送设备包括:云端和/或网关,配置为对所述掩膜图案提供设备提供的所述掩膜图案信号进行处理;以及RFID控制器,配置为向所述掩膜图案产生设备发送所述RFID信号,以向所述掩膜图案产生设备供电并传送所述掩膜图案信息,其中所述RFID信号包括所述掩膜图案信息和用于对所述掩膜图案产生设备供电的电能信号。
- 根据权利要求5所述的系统,其中,所述掩膜图案产生设备包括:射频模块,配置为读取所述RFID控制器发送的所述RFID信号;储能模块,配置为存储所述RFID信号中的电能信号;信息处理模块,配置为将所述RFID信号中的所述掩膜图案信息解析成掩膜图案数据;存储模块,配置为存储并更新与所述掩膜图案数据相对应的掩膜图案;以及显示模块,用于显示由所述存储模块更新后的掩膜图案。
- 根据权利要求6所述的系统,其中,所述掩膜图案数据是二进制数、八进制数或十六进制数。
- 根据权利要求6所述的系统,其中,所述储能模块存储能够更新所述显示模块显示的掩膜图案的电能。
- 根据权利要求6所述的系统,其中,所述储能模块还配置为利用所述电能信号,对所述信息处理模块、所述存储模块以及所述显示模块供电。
- 根据权利要求6所述的系统,其中,所述显示模块是电子墨水屏。
- 一种智能曝光系统,包括前述权利要求中任一项所述的掩膜图案产生设备。
- 一种用于产生掩膜图案的方法,包括:由掩膜图案提供设备,通过有线或无线网络提供掩膜图案信号;由掩膜图案信息传送设备,对掩膜图案提供设备提供的掩膜图案信号进行处理,以产生掩膜图案信息,并且通过射频标识“RFID”信号传送掩膜图案信息;以及由掩膜图案产生设备,基于掩膜图案信息,产生与所述掩膜图案信息对应的掩膜图案并显示。
Priority Applications (1)
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US15/501,497 US10324371B2 (en) | 2016-03-18 | 2016-05-06 | System and method for generating mask pattern and exposure system |
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CN201610158206.6A CN105607413B (zh) | 2016-03-18 | 2016-03-18 | 产生掩膜图案的系统和方法以及曝光系统 |
CN201610158206.6 | 2016-03-18 |
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US20180088460A1 (en) | 2018-03-29 |
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CN105607413B (zh) | 2019-11-01 |
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