WO2017096647A1 - 光刻胶组合物及彩色滤光片的制作方法 - Google Patents

光刻胶组合物及彩色滤光片的制作方法 Download PDF

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WO2017096647A1
WO2017096647A1 PCT/CN2015/098863 CN2015098863W WO2017096647A1 WO 2017096647 A1 WO2017096647 A1 WO 2017096647A1 CN 2015098863 W CN2015098863 W CN 2015098863W WO 2017096647 A1 WO2017096647 A1 WO 2017096647A1
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Prior art keywords
solvent
photoresist composition
photoinitiator
color filter
solubility
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English (en)
French (fr)
Inventor
张岳妍
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/902,586 priority Critical patent/US9880465B2/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Definitions

  • the present invention relates to the field of production of display panels, and more particularly to a method for fabricating a photoresist composition and a color filter.
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • RGB color layer As a color filter, one of the important components of the liquid crystal display, the color filter is mainly realized by the filtering of the RGB color layer.
  • the traditional manufacturing process of color filters mainly includes coating film, prebaking, exposure, development, high temperature post-baking, etc.
  • the basic principle is to apply the photoresist composition on a transparent substrate. The photoresist is then irradiated with a light similar to ultraviolet light to cure the photoresist composition to form a colored film layer.
  • the photoresist composition mainly comprises a pigment, a monomer, a polymer, a photoinitiator, an additive, a solvent, etc., wherein the photoinitiator is activated under illumination, thereby initiating the crosslinking of the monomer.
  • the copolymerization reaction causes the photoresist composition to cure to form a colored film layer.
  • the photoresist film 100 has a certain thickness after the film is applied, and when exposed, light needs to pass through the surface layer of the photoresist film to reach the bottom portion, thus reaching The light at the bottom will be less than that of the surface layer, and the ratio of photoinitiator 110 in the bottom of the photoresist film is low, so that the bottom curing rate is low, and the film layer is baked after high temperature due to the difference in curing rate between the surface and the bottom.
  • the surface is easily shrunk, causing wrinkles on the surface; the generation of wrinkles affects the production of color filters and has a large effect on the post-process.
  • the present invention provides a photoresist composition
  • a photoresist composition comprising a first solvent, a second solvent, a photoinitiator, a monomer, a polymer, an additive, and a dye;
  • the first solvent and the second solvent are phase separated.
  • the first solvent is located in the upper layer of the second solvent; the photoinitiator, monomer At least one of the polymer, the additive, and the solubility in the second solvent is higher than the solubility in the first solvent.
  • the first solvent consists of one or more solvent materials.
  • the second solvent consists of one or more solvent materials.
  • the photoinitiator has a higher solubility in the second solvent than in the first solvent.
  • the photoresist composition is used to make a color filter.
  • the invention also provides a method for manufacturing a color filter, comprising the following steps:
  • Step 1 providing a photoresist composition, the photoresist combination comprising a first solvent, a second solvent, a photoinitiator, a monomer, a polymer, an additive, and a dye;
  • Step 2 pre-baking the photoresist composition, in the prebaking process, the first solvent in the photoresist composition is phase separated from the second solvent, after phase separation, the first a solvent is located in the upper layer, and the second solvent is located in the lower layer; at least one of the photoinitiator, monomer, polymer, and additive has higher solubility in the second solvent than in the first solvent Solubility
  • Step 3 Exposing the photoresist composition that has undergone phase separation, and the photoinitiator in the photoresist composition initiates polymerization of the monomer to be cured under illumination, due to photoinitiator, monomer, and polymerization. At least one of the substance and the additive is higher in the lower layer than the concentration in the upper layer, so that the degree of curing of the upper and lower layers is the same;
  • Step 4 Developing the exposed photoresist composition and a high temperature post-baking process to obtain a color filter.
  • the first solvent is composed of one or more solvent materials.
  • the second solvent is composed of one or more solvent materials.
  • the photoinitiator has a higher solubility in the second solvent than in the first solvent.
  • the photoresist composition is exposed to ultraviolet light.
  • the invention also provides a photoresist composition
  • a photoresist composition comprising a first solvent, a second solvent, and a light start Agents, monomers, polymers, additives, and dyes;
  • the first solvent and the second solvent are phase separated. After phase separation, the first solvent is located in the upper layer of the second solvent; the photoinitiator, monomer At least one of the polymer, the additive, and the solubility in the second solvent is higher than the solubility in the first solvent;
  • the first solvent consists of one or more solvent materials
  • the second solvent is composed of one or more solvent materials
  • solubility of the photoinitiator in the second solvent is higher than in the first solvent.
  • the present invention provides a photoresist composition and a method of fabricating a color filter; the photoresist composition of the present invention, comprising a first solvent, a second solvent, a photoinitiator, and a single a body, a polymer, an additive, and a dye, wherein after heating, the first solvent and the second solvent are phase separated.
  • the first solvent is located in an upper layer of the second solvent, and the light starts At least one of the agent, the monomer, the polymer, and the additive has a higher solubility in the second solvent than in the first solvent, thereby being capable of improving lithography during color filter fabrication
  • the problem of wrinkles formed by uneven degree of curing of the upper and lower layers of the glue the method for producing the color filter of the present invention, the photoresist composition used is phase-separated in the pre-baking process, and the composition concentration is different
  • the two layers make the photoresist composition have the same degree of curing of the upper and lower layers during the exposure process, thereby solving the wrinkle problem in the color filter manufacturing process.
  • Figure 1 is a schematic view showing the degree of curing of the photoresist film due to the difference in illumination received by the surface layer and the bottom portion;
  • FIG. 2 is a schematic view showing the solvent layering of the photoresist composition of the present invention after heating
  • FIG. 3 is a schematic flow chart of a method of fabricating a color filter of the present invention.
  • the present invention firstly provides a photoresist composition
  • a photoresist composition comprising a first solvent 21, a second solvent 22, a photoinitiator 10, a monomer, a polymer, an additive, and a dye;
  • the first solvent 21 and the second solvent 22 are phase separated. After phase separation, the first solvent 21 is located in the upper layer of the second solvent 22; The solubility of at least one of the initiator 10, the monomer, the polymer, and the additive in the second solvent 22 is higher than the solubility in the first solvent 21.
  • the first solvent 21 is composed of one or more solvent materials
  • the second solvent 22 is composed of one or more solvent materials.
  • the photoinitiator 10 has a higher solubility in the second solvent 22 than in the first solvent 21.
  • the photoresist composition of the invention is used for preparing a color filter, wherein the first and second solvents 21, 22 are compatible with temperature increase and pressure during the prebaking process. Sexually deteriorated and layered, that is, phase separation occurs, the first solution 21 is located in the upper layer, the second solvent 22 is located in the lower layer, and at least one of the photoinitiator 10, monomer, polymer, and additive is present.
  • the solubility in the second solvent 22 is higher than the solubility in the first solvent 21, such as the photoinitiator 10, then during the exposure, although the light reaching the bottom of the photoresist composition is less than the surface, However, since there are more photoinitiators 10 in the lower second solvent 22, the reaction rate of the upper and lower layers of the photoresist composition is equalized, so that the upper and lower layers of the photoresist composition are cured to the same extent, thereby avoiding wrinkles.
  • the solubility of the monomer, or the additive in the second solvent 22 is higher than the solubility in the first solvent 21, and can also be used to solve the problem that the photoresist layer is caused by uneven reaction. The product is abnormal.
  • the present invention further provides a method for fabricating a color filter, comprising the following steps:
  • Step 1 Providing a photoresist composition comprising a first solvent 21, a second solvent 22, a photoinitiator 10, a monomer, a polymer, an additive, and a dye;
  • the first solvent 21 is composed of one or more solvent materials
  • the second solvent 22 is composed of one or more solvent materials.
  • Step 2 pre-baking the photoresist composition, in the prebaking process, the first solvent 21 in the photoresist composition is phase separated from the second solvent 22, after phase separation, The first solvent 21 is located in the upper layer, and the second solvent 22 is located in the lower layer; the solubility of at least one of the photoinitiator 10, monomer, polymer, and additive in the second solvent 22 is higher than Solubility in the first solvent 21;
  • the photoresist composition before the pre-baking process of the photoresist composition, the photoresist composition may be subjected to vacuum drying (VCD) processing, thereby before the pre-baking process. Most of the solvent in the photoresist composition is removed to speed up the film formation of the photoresist composition.
  • VCD vacuum drying
  • the photoinitiator 10 has a higher solubility in the second solvent 22 than in the first solvent 21.
  • Step 3 Exposing the photoresist composition that has undergone phase separation by ultraviolet light. Under the illumination, the photoinitiator 10 in the photoresist composition initiates polymerization of the monomer to cure, due to the photoinitiator 10 At least one of the monomer, the polymer, and the additive has a higher concentration in the lower layer than in the upper layer, so that the degree of curing of the upper and lower layers is the same;
  • the photoresist composition As shown in FIG. 3, in this step, although the ultraviolet light reaching the bottom of the photoresist composition is less than the surface, since the photoinitiator 10 in the lower second solvent 22 is more, the photoresist is balanced.
  • the reaction rate of the upper and lower layers of the composition causes the upper and lower layers of the photoresist composition to be cured to the same extent, thereby avoiding the occurrence of wrinkles.
  • the solubility of the monomer, the polymer, or the additive in the second solvent 22 is higher than that in the first solvent 21, and can also be used to solve the problem that the photoresist layer is uneven due to the reaction.
  • the various products are abnormal.
  • Step 4 Developing the exposed photoresist composition and a high temperature post-baking process to obtain a color filter.
  • the photoresist composition of the present invention comprises a first solvent, a second solvent, a photoinitiator, a monomer, a polymer, an additive, and a dye, and after heating, the first solvent and The second solvent may undergo phase separation. After phase separation, the first solvent is located in an upper layer of the second solvent, and at least one of the photoinitiator, monomer, polymer, and additive is in the second solvent.
  • the solubility is higher than the solubility in the first solvent, so that it can be used to improve the wrinkle problem formed by the uneven degree of curing of the upper and lower layers of the photoresist during the color filter manufacturing process; the color filter of the present invention
  • the photoresist composition used is phase-separated in the prebaking process, and the upper and lower layers having different component concentrations are formed, so that the photoresist composition has the same degree of curing in the upper and lower layers during the exposure process, thereby Solved the wrinkle problem in the color filter manufacturing process.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Nonlinear Science (AREA)
  • Materials For Photolithography (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)

Abstract

一种光刻胶组合物及彩色滤光片的制作方法。光刻胶组合物包括第一溶剂（21）、第二溶剂（22）、光起始剂（10）、单体、多聚物、添加剂、及染料，在加热后，其中的第一溶剂（21）与第二溶剂（22）会发生相分离，相分离后，所述第一溶剂（21）位于第二溶剂（22）的上层，所述光起始剂（10）、单体、多聚物、添加剂中至少一种在所述第二溶剂（22）中的溶解度高于在所述第一溶剂（21）中的溶解度，从而能够用于改善彩色滤光片制作过程中因光刻胶上下层固化程度不均而形成的褶皱问题。

Description

光刻胶组合物及彩色滤光片的制作方法 技术领域
本发明涉及显示面板的生产领域，尤其涉及一种光刻胶组合物及彩色滤光片的制作方法。
背景技术
薄膜晶体管液晶显示器(Thin Film Transistor Liquid Crystal Display，TFT-LCD)由于色彩度高、体积小、功耗低等优势，在目前平板显示领域占主流地位。作为液晶显示器重要组件之一的彩色滤光片(Color filter)，主要通过RGB彩色层的滤光实现显色。彩色滤光片的传统的制作工艺，主要包括涂膜、预烘烤、曝光、显影、高温后烘烤等制程，其基本原理是将光刻胶组合物涂覆在透明的衬底基板上，而后以紫外线灯类似光线进行照射，使光刻胶组合物固化形成彩色膜层。光刻胶组合物主要包含有颜料、单体(Monomer)、多聚物(polymer)、光起始剂、添加剂和溶剂等，其中光起始剂在光照下被激活，从而引发单体发生交联聚合反应，使光刻胶组合物固化而形成彩色膜层。
然而在彩色滤光片的制作过程中，如图1所示，涂膜后光刻胶膜100会有一定的厚度，在曝光时，光需要透过光刻胶膜的表层到达底部，这样到达底部的光将会比表层的少，光刻胶膜底部内光起始剂110被光激发的比率低，从而使得底部固化率低，由于表、底固化率的差异，高温后烘后膜层表面很容易收缩，从而使表面产生褶皱；褶皱的产生会影响彩色滤光片的生产，同时对后制程有很大影响。
因此，为解决上述问题，有必要提出一种新的光刻胶组合物及彩色滤光片的制作方法。
发明内容
本发明的目的在于提供一种光刻胶组合物，在加热情况下会发生相分离，而形成组分浓度不同的上下两层，从而能够用于改善彩色滤光片制作过程中因光刻胶上下层固化程度不均而形成的褶皱问题。
本发明的目的还在于提供一种彩色滤光片的制作方法，所采用的光刻胶组合物在预烘烤制程中发生相分离，而形成组分浓度不同的上下两层，能够改善彩色滤光片制作过程中因光刻胶上下层固化程度不均而形成的褶 皱问题。
为实现上述目的，本发明提供了一种光刻胶组合物，包括第一溶剂、第二溶剂、光起始剂、单体、多聚物、添加剂、及染料；
所述光刻胶组合物在加热后，其中的第一溶剂与第二溶剂会发生相分离，相分离后，所述第一溶剂位于第二溶剂的上层；所述光起始剂、单体、多聚物、添加剂中至少一种在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度。
所述第一溶剂由一种或多种溶剂材料所组成。
所述第二溶剂由一种或多种溶剂材料所组成。
所述光起始剂在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度。
所述光刻胶组合物用于制作彩色滤光片。
本发明还提供一种彩色滤光片的制作方法，包括如下步骤：
步骤1、提供光刻胶组合物，所述光刻胶组合包括第一溶剂、第二溶剂、光起始剂、单体、多聚物、添加剂、及染料；
将所述光刻胶组合物涂布于衬底基板上，此时，光刻胶组合物内的各组分混合均匀；
步骤2、对所述光刻胶组合物进行预烘烤，在预烘烤过程中，所述光刻胶组合物中的第一溶剂与第二溶剂发生相分离，相分离后，所述第一溶剂位于上层，所述第二溶剂位于下层；所述光起始剂、单体、多聚物、添加剂中至少一种在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度；
步骤3、对已经发生相分离的光刻胶组合物进行曝光，光照下，光刻胶组合物内光起始剂引发单体发生聚合反应而固化，由于光起始剂、单体、多聚物、添加剂中至少一种在下层内的浓度高于其在上层的浓度，从而使得上下层的固化程度相同；
步骤4、对经过曝光的光刻胶组合物进行显影、及高温后烘烤制程，得到彩色滤光片。
所述光刻胶组合物中，所述第一溶剂由一种或多种溶剂材料所组成。
所述光刻胶组合物中，所述第二溶剂由一种或多种溶剂材料所组成。
所述光起始剂在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度。
所述步骤3中，采用紫外光对所述光刻胶组合物进行曝光。
本发明还提供一种光刻胶组合物，包括第一溶剂、第二溶剂、光起始 剂、单体、多聚物、添加剂、及染料；
所述光刻胶组合物在加热后，其中的第一溶剂与第二溶剂会发生相分离，相分离后，所述第一溶剂位于第二溶剂的上层；所述光起始剂、单体、多聚物、添加剂中至少一种在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度；
其中，所述第一溶剂由一种或多种溶剂材料所组成；
其中，所述第二溶剂由一种或多种溶剂材料所组成；
其中，所述光起始剂在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度。
本发明的有益效果：本发明提供了一种光刻胶组合物及彩色滤光片的制作方法；本发明的光刻胶组合物，包括第一溶剂、第二溶剂、光起始剂、单体、多聚物、添加剂、及染料，在加热后，其中的第一溶剂与第二溶剂会发生相分离，相分离后，所述第一溶剂位于第二溶剂的上层，所述光起始剂、单体、多聚物、添加剂中至少一种在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度，从而能够用于改善彩色滤光片制作过程中因光刻胶上下层固化程度不均而形成的褶皱问题；本发明的彩色滤光片的制作方法，所采用的光刻胶组合物在预烘烤制程中发生相分离，而形成组分浓度不同的上下两层，使得光刻胶组合物在曝光过程中上下层的固化程度相同，从而解决了彩色滤光片制作过程中的褶皱问题。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为光刻胶膜因表层与底部接受的光照不同而导致固化程度不同的示意图；
图2为本发明的光刻胶组合物在加热后溶剂分层的示意图；
图3为本发明的彩色滤光片的制作方法的流程示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明 的优选实施例及其附图进行详细描述。
请参阅图2，本发明首先提供一种光刻胶组合物，包括第一溶剂21、第二溶剂22、光起始剂10、单体、多聚物、添加剂、及染料；
所述光刻胶组合物在加热后，其中的第一溶剂21、与第二溶剂22会发生相分离，相分离后，所述第一溶剂21位于第二溶剂22的上层；所述光起始剂10、单体、多聚物、添加剂中至少一种在所述第二溶剂22中的溶解度高于在所述第一溶剂21中的溶解度。
具体的，所述第一溶剂21由一种或多种溶剂材料所组成；所述第二溶剂22由一种或多种溶剂材料所组成。
优选的，所述光起始剂10在所述第二溶剂22中的溶解度高于在所述第一溶剂21中的溶解度。
本发明的光刻胶组合物用于制作彩色滤光片，所述光刻胶组合物在预烘烤过程中，其中的第一、第二溶剂21、22随温度增高、压力变化，相容性变差而分层，即产生相分离，所述第一溶21位于上层，所述第二溶剂22位于下层，所述光起始剂10、单体、多聚物、添加剂中至少一种在所述第二溶剂22中的溶解度高于在所述第一溶剂21中的溶解度，例如光起始剂10，那么在曝光过程中，虽然到达光刻胶组合物底部的光比表面少，但由于下层的第二溶剂22内光起始剂10较多，从而均衡了光刻胶组合物的上下层的反应速率而使光刻胶组合物上下层固化程度相同，从而避免了褶皱的产生；同理，单体、、或添加剂在所述第二溶剂22中的溶解度高于在所述第一溶剂21中的溶解度，也可以用于解决光刻胶层因反应不均而造成的各种产品异常。
请参阅图3，本发明还提供一种彩色滤光片的制作方法，包括如下步骤：
步骤1、提供光刻胶组合物，所述光刻胶组合包括第一溶剂21、第二溶剂22、光起始剂10、单体、多聚物、添加剂、及染料；
将所述光刻胶组合物涂布于衬底基板上，此时，光刻胶组合物内的各组分混合均匀；
具体的，所述光刻胶组合物中，第一溶剂21由一种或多种溶剂材料所组成，所述第二溶剂22由一种或多种溶剂材料所组成。
步骤2、对所述光刻胶组合物进行预烘烤，在预烘烤过程中，所述光刻胶组合物中的第一溶剂21与第二溶剂22发生相分离，相分离后，所述第一溶剂21位于上层，所述第二溶剂22位于下层；所述光起始剂10、单体、多聚物、添加剂中至少一种在所述第二溶剂22中的溶解度高于在所述第一溶剂21中的溶解度；
具体的，所述步骤2中，在对所述光刻胶组合物进行预烘烤制程之前，还可以对所述光刻胶组合物进行真空干燥(VCD)处理，从而在预烘烤制程之前移除光刻胶组合物中大部分的溶剂，加快光刻胶组合物的成膜速度。
优选的，所述光起始剂10在所述第二溶剂22中的溶解度高于在所述第一溶剂21中的溶解度。
步骤3、采用紫外光对已经发生相分离的光刻胶组合物进行曝光，光照下，光刻胶组合物内的光起始剂10引发单体发生聚合反应而固化，由于光起始剂10、单体、多聚物、添加剂中至少一种在下层内的浓度高于其在上层的浓度，从而使得上下层的固化程度相同；
如图3所示，在该步骤中，虽然到达光刻胶组合物底部的紫外光比表面少，但由于下层的第二溶剂22内的光起始剂10较多，从而均衡了光刻胶组合物的上下层的反应速率而使光刻胶组合物上下层固化程度相同，从而避免了褶皱的产生。同理，单体、多聚物、或添加剂在所述第二溶剂22中的溶解度高于在所述第一溶剂21中的溶解度，也可以用于解决光刻胶层因反应不均而造成的各种产品异常。
步骤4、对经过曝光的光刻胶组合物进行显影、及高温后烘烤制程，得到彩色滤光片。
综上所述，本发明的光刻胶组合物，包括第一溶剂、第二溶剂、光起始剂、单体、多聚物、添加剂、及染料，在加热后，其中的第一溶剂与第二溶剂会发生相分离，相分离后，所述第一溶剂位于第二溶剂的上层，所述光起始剂、单体、多聚物、添加剂中至少一种在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度，从而能够用于改善彩色滤光片制作过程中因光刻胶上下层固化程度不均而形成的褶皱问题；本发明的彩色滤光片的制作方法，所采用的光刻胶组合物在预烘烤制程中发生相分离，而形成组分浓度不同的上下两层，使得光刻胶组合物在曝光过程中上下层的固化程度相同，从而解决了彩色滤光片制作过程中的褶皱问题。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (12)

  1. 一种光刻胶组合物，包括第一溶剂、第二溶剂、光起始剂、单体、多聚物、添加剂、及染料；
    所述光刻胶组合物在加热后，其中的第一溶剂与第二溶剂会发生相分离，相分离后，所述第一溶剂位于第二溶剂的上层；所述光起始剂、单体、多聚物、添加剂中至少一种在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度。
  2. 如权利要求1所述的光刻胶组合物，其中，所述第一溶剂由一种或多种溶剂材料所组成。
  3. 如权利要求1所述的光刻胶组合物，其中，所述第二溶剂由一种或多种溶剂材料所组成。
  4. 如权利要求1所述的光刻胶组合物，其中，所述光起始剂在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度。
  5. 如权利要求1所述的光刻胶组合物，其中，所述光刻胶组合物用于制作彩色滤光片。
  6. 一种彩色滤光片的制作方法，包括如下步骤：
    步骤1、提供光刻胶组合物，所述光刻胶组合包括第一溶剂、第二溶剂、光起始剂、单体、多聚物、添加剂、及染料；
    将所述光刻胶组合物涂布于衬底基板上，此时，光刻胶组合物内的各组分混合均匀；
    步骤2、对所述光刻胶组合物进行预烘烤，在预烘烤过程中，所述光刻胶组合物中的第一溶剂与第二溶剂发生相分离，相分离后，所述第一溶剂位于上层，所述第二溶剂位于下层；所述光起始剂、单体、多聚物、添加剂中至少一种在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度；
    步骤3、对已经发生相分离的光刻胶组合物进行曝光，光照下，光刻胶组合物内的光起始剂引发单体发生聚合反应而固化，由于光起始剂、单体、多聚物、添加剂中至少一种在下层内的浓度高于其在上层的浓度，从而使得上下层的固化程度相同；
    步骤4、对经过曝光的光刻胶组合物进行显影、及高温后烘烤制程，得到彩色滤光片。
  7. 如权利要求6所述的彩色滤光片的制作方法，其中，所述光刻胶组 合物中，所述第一溶剂由一种或多种溶剂材料所组成。
  8. 如权利要求6所述的彩色滤光片的制作方法，其中，所述光刻胶组合物中，所述第二溶剂由一种或多种溶剂材料所组成。
  9. 如权利要求6所述的彩色滤光片的制作方法，其中，所述光起始剂在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度。
  10. 如权利要求6所述的彩色滤光片的制作方法，其中，所述步骤3中，采用紫外光对所述光刻胶组合物进行曝光。
  11. 一种光刻胶组合物，包括第一溶剂、第二溶剂、光起始剂、单体、多聚物、添加剂、及染料；
    所述光刻胶组合物在加热后，其中的第一溶剂与第二溶剂会发生相分离，相分离后，所述第一溶剂位于第二溶剂的上层；所述光起始剂、单体、多聚物、添加剂中至少一种在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度；
    其中，所述第一溶剂由一种或多种溶剂材料所组成；
    其中，所述第二溶剂由一种或多种溶剂材料所组成；
    其中，所述光起始剂在所述第二溶剂中的溶解度高于在所述第一溶剂中的溶解度。
  12. 如权利要求11所述的光刻胶组合物，其中，所述光刻胶组合物用于制作彩色滤光片。
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