WO2017088964A2 - Procédé d'estampage de microstructures ou de nanostructures - Google Patents

Procédé d'estampage de microstructures ou de nanostructures Download PDF

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Publication number
WO2017088964A2
WO2017088964A2 PCT/EP2016/001922 EP2016001922W WO2017088964A2 WO 2017088964 A2 WO2017088964 A2 WO 2017088964A2 EP 2016001922 W EP2016001922 W EP 2016001922W WO 2017088964 A2 WO2017088964 A2 WO 2017088964A2
Authority
WO
WIPO (PCT)
Prior art keywords
lacquer layer
embossing
film web
structures
lacquer
Prior art date
Application number
PCT/EP2016/001922
Other languages
German (de)
English (en)
Other versions
WO2017088964A3 (fr
Inventor
Andreas Rauch
Frank Sievers
Georg Kiefersauer
Birgit Seiß
Christian Fuhse
Andreas Pretsch
Michael Rahm
Manfred Heim
Winfried HOFFMÜLLER
Herbert ZASCHKA
Original Assignee
Giesecke & Devrient Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Giesecke & Devrient Gmbh filed Critical Giesecke & Devrient Gmbh
Priority to CN201680079437.6A priority Critical patent/CN108472981B/zh
Priority to EP16798626.4A priority patent/EP3380334B1/fr
Priority to EP20020437.8A priority patent/EP3792073B1/fr
Priority to EP20020436.0A priority patent/EP3792072A1/fr
Publication of WO2017088964A2 publication Critical patent/WO2017088964A2/fr
Publication of WO2017088964A3 publication Critical patent/WO2017088964A3/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/355—Security threads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
    • B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
    • B44B5/02—Dies; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
    • B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
    • B44B5/02—Dies; Accessories
    • B44B5/024—Work piece loading or discharging arrangements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
    • B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
    • B44B5/02—Dies; Accessories
    • B44B5/026—Dies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/16—Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like
    • B44C1/165—Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like for decalcomanias; sheet material therefor
    • B44C1/17—Dry transfer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/24—Pressing or stamping ornamental designs on surfaces

Definitions

  • the invention relates to a method for embossing structures with dimensions in the range of micrometers or nanometers in a lacquer layer of a lacquer, wherein the lacquer layer is applied to one side of a film web and curable by means of ultraviolet radiation.
  • the film web is first pressed in the conveying direction with the side on which the not yet cured lacquer layer is located, by a impression roller to an embossing cylinder, on the surface of which the structures to be embossed are in the micro or nanometer range.
  • the structures in the micrometer or nanometer range are formed into the lacquer layer.
  • the resist layer is cured by ultraviolet radiation from a source of ultraviolet radiation.
  • the structures in the micron or nanometer range are thus embossed into an unevenly distributed lacquer layer, wherein even after the embossing and subsequent curing of the lacquer layer by means of UV radiation, an uneven thickness and in the horizontal direction, based on each the film web, unevenly distributed lacquer layer with embossed structures in the micro or nanometer range results.
  • the invention is therefore the object of developing a generic method such that the disadvantages of the prior art are eliminated.
  • the film web is guided from above or at least obliquely from above to the embossing cylinder. It has surprisingly been found that the part of the lacquer of the not yet hardened lacquer layer, which accumulates in the conveying direction immediately before the point at which the lacquer layer touches the embossing cylinder, leads to a larger wetted surface on the surface of the embossing cylinder.
  • the paint wedge of the method according to the invention is not distributed unevenly in contrast to the paint wedge of the method of the prior art and its geometric shape and distribution are not stochastically pronounced.
  • Another advantage of the invention is that due to the larger wetted surface on the surface of the embossing cylinder, the time for the escape of air from the embossing structures on the surface of the embossing cylinder increases, so that the paint layer at a higher speed of the film web and the same number of air bubbles in the embossed lacquer layer or alternatively at the same speed of the film web, but reduced number of air bubbles can be embossed in the embossed lacquer layer.
  • the impression roller is pressed against the embossing cylinder with a high mechanical pressure, so that a clearly recognizable amount of lacquer of the lacquer layer is squeezed.
  • the width of the lacquer layer after embossing is no longer identical to the width of the lacquer layer before the embossing cylinder, but wider.
  • the width of the paint before embossing is 620 mm and after embossing 720 mm.
  • a further object of the invention is to enable a higher speed of the film web with a constant number of air bubbles in the embossed lacquer layer or an equal or higher speed of the film web with a reduced number of air bubbles in the embossed lacquer layer, a so-called "bubble-free" embossing.
  • the invention thus relates to a further method according to the preamble of the main claim, wherein for a rapid air bubble-free embossing the paint of the paint layer in the region of the embossing cylinder and / or in the paint wedge has a low viscosity. A reduction in the viscosity of the paint can be achieved by heating the paint.
  • a particular paint can be embossed free of air bubbles at a temperature of the paint of 20 ° C with a speed of the film web of 20 m / min and at a temperature of the paint of 60 ° C at a speed of the film web of 45 m / min.
  • a heating of the paint thus particularly preferably leads to a speed of the film web that is more than twice as fast, and thus to an increase in the economic efficiency of the embossing process.
  • the inventive method for air bubble-free embossing by reducing the viscosity or heating of the paint can be done regardless of the direction of feeding the film web to the embossing cylinder, ie both in an inventive feeding the film web from above or at least from obliquely above the embossing cylinder and at a known from the prior art feeding the film web from below or at least from obliquely down to the embossing cylinder.
  • An influence on the width of the lacquer layer after the embossing process can be taken by the speed of the film web, the viscosity or temperature of the lacquer of the lacquer layer, the amount of lacquer applied to the film web and the impression pressure.
  • Bubble-free embossing has only a very small range of variation for a change in the parameters of temperature and speed of the film web, ie even small changes in these parameters have a large influence the width of the lacquer layer after embossing.
  • the width of the paint before embossing is 620 mm and should be 720 mm after embossing.
  • Even a change in the web speed of 1 m / min has a significant influence on the width of the paint layer after embossing.
  • a significantly too low web speed of 5 m / min to 10 m / min causes the paint is squeezed beyond the edge of the film web, a slightly too high speed by about
  • the width of the lacquer layer after embossing can be kept constant at a predetermined value via a change in the speed of the film web. If the width of the lacquer layer increases beyond a predetermined value after embossing, the web speed must be increased and vice versa.
  • a further object of the invention is to control the width of the lacquer layer on the film web after embossing or adhering to a predetermined value of this width.
  • the invention thus relates to a further method according to the preamble of the main claim, wherein in the surface of the Velin Schemes at the edge of the embossing cylinder, in which there are no structures to be embossed in the micron or nanometer range for the embossed end products, at least partially, preferably over the entire surface additional structures or Microstructures are introduced.
  • the vellum area is no longer transferred faultlessly into the lacquer layer on the film web, the part of the film web embossed by the vellum area is in any case scrap and is cut off and disposed of, so that structures or microstructures in this area have no influence on the final end products.
  • the additional structures or microstructures have a higher paint requirement due to their larger surface area, so that the fluctuation range of the width of the paint layer after embossing is reduced. Furthermore, the additional structures or microstructures make the inherently unrecognizable lacquer edge of the transparent lacquer discernible, that is to say the edge of the lacquer layer on the foil web at the outer left or right edge of the lacquer layer, by increasing the scattering or absorption or a recognizable change the reflection of the light incident on the lacquer layer lead.
  • the additional structure may be configured in the form of a checkerboard pattern with a dimension of the individual fields of 10 ⁇ m each, which optically leads to a matting of the paint compared to an unstructured, smooth surface.
  • the additional structures can also consist of micromirrors or diffractive structures, which lead to a matting of the surface of the paint or a direction-dependent reflection of the incident light.
  • the control according to the invention of the width of the lacquer layer on the film web after embossing or adhering to a predetermined value of this width can be effected independently of the direction of feeding the film web to the embossing cylinder, ie both when the film web is fed from above or at least from obliquely up to the embossing cylinder as well as in a known from the prior art feeding the film web from below or at least from obliquely down to the embossing cylinder.
  • the position of the paint edge on the film web after the embossing is determined according to a preferred embodiment via an optical system.
  • an optical system which consists, for example, of at least one light barrier or a camera system.
  • a light barrier is arranged above the lacquer layer of the film web in the conveying direction of the film web after the embossing cylinder, the light barrier being arranged above the lacquer layer of the film web in such a way that it monitors the area outside or beyond the lacquer edge, in which no lacquer layer on the lacquer layer Film web should be arranged.
  • the light emitted by the light barrier should thus strike the smooth, reflecting surface of the film web without lacquer layer if the web speed is set correctly so that the detector of the light barrier indicates a first value.
  • the web speed is set too low, after embossing the width of the lacquer layer increases beyond the predetermined level and the lacquer edge shifts in the direction of the outer edge of the film web.
  • the light emitted by the light barrier then strikes the surface of the lacquer layer which is embossed and, for example, matted by the additional structures or microstructures.
  • the detector of the light barrier displays a second value which is different from the first value. This second value is the signal for the control to increase the web speed until the detector of the light barrier again displays the first value.
  • a second light barrier can be arranged such that it monitors the area within or on this side of the paint edge in which the paint layer is to be arranged on the film web.
  • the detector of this light barrier should thus have the second value of that embossed by the additional structures or microstructures and, for example Show matted surface of the paint layer. If it indicates the first value of the smooth, reflecting surface of the film web without lacquer layer, the width of the lacquer layer is too small and the web speed must be reduced until the detector of this light barrier again displays the second value.
  • detection along a line perpendicular to the edge of the paint can also take place. This is done, for example, by means of a camera system that evaluates the image along the line perpendicular to the edge of the paint. Such an evaluation also advantageously allows the evaluation of trends and thus enables a predictive intervention.
  • the sensor or the camera system must be triggered, for example by means of the signal of an additional double wedge mark or by means of a rotary encoder on the embossing cylinder.
  • a film web consists for example of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polypropylene (PP) or polycarbonate (PC) with a thickness for security threads or security films of preferably 8 ⁇ to 36 ⁇ , banknotes made of polymer or composite film banknotes to 100 ⁇ or for card body up to 200 ⁇ .
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • PP polypropylene
  • PC polycarbonate
  • the thickness of the lacquer layer is preferably 0.5 ⁇ to 20 ⁇ , more preferably 4 ⁇ to 15 ⁇ and most preferably from 4 ⁇ to 8 ⁇ .
  • the lacquer layer is preferably applied to the film web by means of a flexographic printing process.
  • the film web is deflected by a deflecting roller and applied to the embossing cylinder. leads, wherein the guide roller is arranged in the conveying direction in front of the press. By a second guide roller, the film web can be led away again from the embossing cylinder. By the first and optionally second deflection roller is achieved that the lacquer layer wraps around the embossing cylinder over a larger peripheral surface.
  • From the top in the sense of this invention means that the film is fed perpendicularly or at least almost perpendicularly from above or in the direction of the weight force or almost in the direction of the weight force on the embossing cylinder.
  • At least obliquely from above in the sense of this invention means that the film is fed at an angle in a range from more than horizontal to almost perpendicular from above onto the embossing cylinder, wherein the film is in particular not supplied horizontally to the embossing cylinder.
  • Such structures with dimensions in the range of micrometers or nanometers are used in particular for increasing the protection against counterfeiting of value documents, in particular banknotes, stocks, bonds, certificates, vouchers, checks, high-quality admission tickets, but also other counterfeit-endangered documents, such as passports and other identity documents - Mente, as well as cards, such as credit or debit cards, and also product security elements, such as labels, seals, packaging and the like.
  • the structures with dimensions in the range of microns or nanometers are, for example, diffractive structures, micromirrors, matt structures or moth-eye structures.
  • FIG. 3 shows in plan view the edge region of a lacquer layer on a film web after embossing for a detection of the lacquer edge by two
  • Photocells the object of Fig. 3 in side view, 5 shows a top view of the edge region of a lacquer layer on a film web after embossing for a detection of the lacquer edge by a camera system.
  • Fig. 1 shows a side view of a known from the prior art embossing method.
  • a lacquer layer 6 On a film web 5 is a lacquer layer 6, wherein the film web is fed in the direction of movement 7 obliquely from below to an embossing device.
  • the embossing device consists in this case of a stamping cylinder 1, in the surface to be embossed structures are introduced with dimensions in the range of microns or nanometers, a roller-shaped designed impression roller 2, a source 4 for ultraviolet radiation and two guide rollers 3.
  • the film web 5 is through the first deflecting roller 3 deflected such that the lacquer layer 6 comes into contact with the embossing cylinder.
  • the film web 5 together with lacquer layer 6 is pressed by the impression roller 2 against the embossing cylinder 1 and the structures with dimensions in Area of micro or nanometers molded into the lacquer layer 6. Thereafter, the lacquer layer 6 is cured by electromagnetic radiation in the ultraviolet wavelength range of the source 4 and guided by a second guide roller 3 from the embossing cylinder 1 and fed to subsequent processing steps.
  • Fig. 2 shows a side view of the embossing method according to the invention, in which, in contrast to the embossing method of Fig. 1, the film web 5 is fed from obliquely above the embossing device.
  • the film web 5 is deflected by the first guide roller 3 such that the lacquer layer 6 comes into contact with the embossing cylinder.
  • a part of the not yet cured lacquer layer accumulates
  • the film web 5 together with the lacquer layer 6 is pressed by the impression roller 2 against the embossing cylinder 1 and the structures with dimensions in the range of micrometers or nanometers are molded into the lacquer layer 6.
  • FIG. 3 shows in plan view the edge region of a lacquer layer on a film web after embossing for a detection of the lacquer edge by means of two light barriers.
  • FIG. 4 shows the article from FIG. 3 in a side view along the sectional plane LL.
  • a first light barrier 18, consisting of a light source 18.1 and a detector 18.2, is arranged over the lacquer layer 6 of the film web 5 in the conveying direction of the film web 5 after the embossing cylinder 1, so that they along a line 16 the area 13 outside or beyond the paint edge 15 monitors, in which no lacquer layer on the film web 5 should be arranged.
  • the light emitted by the light source 18.1 thus hits the smooth, reflecting surface of the film web without lacquer layer, when the web speed is set correctly, so that the detector 18.2 indicates a first value.
  • a second light barrier 19, consisting of a light source 19.1 and a detector 19.2, is arranged such that it monitors along a line 17 the area 14 within or on this side of the paint edge 15, in which the paint layer 6 is to be arranged on the film web 5.
  • the additional structures or microstructures are in the vein area of the embossing cylinder, which are embossed only in the area 14 in the lacquer layer 6.
  • the detector 19.2 displays the second value by the additional structures or microstructures embossed and, for example, matted surface 14 of the lacquer layer 6, which is different from the first value.
  • FIG. 5 shows in plan view the edge region of a lacquer layer on a film web after embossing for a detection of the lacquer edge by a camera system.
  • detection takes place along a line 20 perpendicular to the coating edge 15. This detection takes place, for example, by means of a camera system which evaluates the image along the line 20 by determining the gloss values of the corresponding surfaces.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

L'invention concerne un procédé d'estampage de structures de dimensions de l'ordre du micromètre ou du nanomètre dans une couche de laque composée d'une laque, la couche de laque étant appliquée sur une face d'une bande de film et pouvant être durcie par un rayonnement ultraviolet. La bande de film est tout d'abord pressée par la face sur laquelle la couche de laque durcie n'est pas encore présente par un presseur sur un cylindre d'estampage, qui porte sur sa surface les structures à estamper de l'ordre du micromètre ou du nanomètre. On forme ainsi dans la couche de laque les structures de l'ordre du micromètre ou du nanomètre. La couche de laque est immédiatement après durcie par un rayonnement ultraviolet d'une source de rayonnement ultraviolet. Selon l'invention, la bande de film est guidée par le haut ou au moins obliquement en haut par rapport au cylindre d'estampage.
PCT/EP2016/001922 2015-11-27 2016-11-18 Procédé d'estampage de microstructures ou de nanostructures WO2017088964A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201680079437.6A CN108472981B (zh) 2015-11-27 2016-11-18 用于压印微结构或者纳米结构的压印方法
EP16798626.4A EP3380334B1 (fr) 2015-11-27 2016-11-18 Procédé d'estampage de microstructures ou de nanostructures
EP20020437.8A EP3792073B1 (fr) 2015-11-27 2016-11-18 Procédé d'estampage permettant d'estamper des micro- ou nanostructures
EP20020436.0A EP3792072A1 (fr) 2015-11-27 2016-11-18 Procédé d'estampage permettant d'estamper de micro- ou nanostructures

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015015407.9 2015-11-27
DE102015015407.9A DE102015015407A1 (de) 2015-11-27 2015-11-27 Prägeverfahren zum Prägen von Mikro- oder Nanostrukturen

Publications (2)

Publication Number Publication Date
WO2017088964A2 true WO2017088964A2 (fr) 2017-06-01
WO2017088964A3 WO2017088964A3 (fr) 2017-07-20

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2016/001922 WO2017088964A2 (fr) 2015-11-27 2016-11-18 Procédé d'estampage de microstructures ou de nanostructures

Country Status (4)

Country Link
EP (3) EP3792072A1 (fr)
CN (2) CN111497492B (fr)
DE (1) DE102015015407A1 (fr)
WO (1) WO2017088964A2 (fr)

Citations (1)

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Publication number Priority date Publication date Assignee Title
WO2003095175A2 (fr) 2002-05-13 2003-11-20 Zbd Displays Ltd Procede et appareil de gaufrage

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CA2244324A1 (fr) * 1997-08-04 1999-02-04 Hsm Holographic Systems Munchen Gmbh Methode et appareil de fabrication d'une structure de surface sur un substrat, particulierement une surface holographique
DE19802585A1 (de) * 1997-08-04 1999-03-25 Hsm Gmbh Verfahren und Vorrichtung zur Erzeugung einer Oberflächenstruktur, insbesondere einer holographischen Oberflächenstruktur, auf einem Substrat
EP1580015A1 (fr) * 2004-03-24 2005-09-28 Kba-Giori S.A. Procédé et appareil permettant d'effectuer un marquage d'identité sur documents de sécurité
EP1720079A1 (fr) * 2005-05-06 2006-11-08 Neopack, Sl Composition colorée comprenant un hologramme et procédé de fabrication
CA2881441C (fr) * 2006-09-15 2016-08-30 Innovia Security Pty Ltd Ameliorations apportees a des documents de securite
DE112009002538A5 (de) * 2008-10-17 2011-09-08 Securency International Pty Ltd. Passerverfahren und Vorrichtung für geprägte und gedruckte Merkmale
KR20100113918A (ko) * 2009-04-14 2010-10-22 이용근 한지공예품의 양각문양형성방법 및 이를 이용하여 제조된 양각문양이 형성된 한지공예품
JP5627684B2 (ja) 2009-08-21 2014-11-19 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 超顕微鏡的及び光学的可変像を有するデバイスのための装置及び方法
DE102011009135A1 (de) * 2011-01-21 2012-07-26 Heidelberger Druckmaschinen Ag Druckmaschine
WO2013186167A2 (fr) * 2012-06-14 2013-12-19 Basf Se Procédé destiné à fabriquer des éléments de sécurité et des hologrammes
DE102013017797A1 (de) * 2013-10-25 2015-04-30 Giesecke & Devrient Gmbh Verfahren und Vorrichtung zum Herstellen eines Sicherheitselementes
US10752044B2 (en) * 2014-05-15 2020-08-25 Ccl Secure Pty Ltd In line manufacturing of documents with security elements

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003095175A2 (fr) 2002-05-13 2003-11-20 Zbd Displays Ltd Procede et appareil de gaufrage

Also Published As

Publication number Publication date
DE102015015407A1 (de) 2017-06-01
EP3792073A1 (fr) 2021-03-17
CN111497492B (zh) 2022-03-08
WO2017088964A3 (fr) 2017-07-20
CN108472981A (zh) 2018-08-31
EP3792072A1 (fr) 2021-03-17
EP3380334A2 (fr) 2018-10-03
EP3380334B1 (fr) 2022-07-27
EP3792073B1 (fr) 2024-05-15
CN111497492A (zh) 2020-08-07
CN108472981B (zh) 2020-05-19

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