EP3279003A1 - Élément de sécurité et procédé de fabrication d'un élément de sécurité - Google Patents

Élément de sécurité et procédé de fabrication d'un élément de sécurité Download PDF

Info

Publication number
EP3279003A1
EP3279003A1 EP17001323.9A EP17001323A EP3279003A1 EP 3279003 A1 EP3279003 A1 EP 3279003A1 EP 17001323 A EP17001323 A EP 17001323A EP 3279003 A1 EP3279003 A1 EP 3279003A1
Authority
EP
European Patent Office
Prior art keywords
reflector layer
layer
microstructure
pattern
reflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP17001323.9A
Other languages
German (de)
English (en)
Other versions
EP3279003B1 (fr
Inventor
Patrick Renner
André Gregarek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Giesecke and Devrient Currency Technology GmbH
Original Assignee
Giesecke and Devrient Currency Technology GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Giesecke and Devrient Currency Technology GmbH filed Critical Giesecke and Devrient Currency Technology GmbH
Publication of EP3279003A1 publication Critical patent/EP3279003A1/fr
Application granted granted Critical
Publication of EP3279003B1 publication Critical patent/EP3279003B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/43—Marking by removal of material
    • B42D25/435—Marking by removal of material using electromagnetic radiation, e.g. laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/346—Perforations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/355—Security threads

Definitions

  • the invention relates to a method for producing a security element, in which a first microstructure is produced on a front side and a reflector layer is applied over it.
  • the invention relates to a security element which comprises a first structurable layer, which is applied on a front side, a first microstructure in a surface of the first structurable layer and a first reflector layer on the first microstructure.
  • Such structures are known for reflective holograms. They use micro-optical effects for security elements and are usually produced by embossing a metal layer or by embossing and subsequent vapor deposition (PVD) of a metal layer on the embossed structure.
  • the metal layer can be subsequently structured by laser ablation.
  • the object of the invention is to provide a method for producing a security element and a security element, so that manufacturability, security against imitation and visual appearance are improved.
  • the method for producing a security element comprises the following steps: providing a first structurable layer, producing a first microstructure in a front side of the first structurable layer, applying a first reflector layer to the first microstructure in a first pattern, which can be seen from the front side ,
  • the first reflector layer is applied by printing in the first pattern with a homogeneous thickness.
  • the first reflector layer is removed by means of laser ablation, wherein a second pattern, which can be seen in plan view of the front side, is produced in the first reflector layer.
  • a first authenticating feature is the reflector layer in the first pattern.
  • the first pattern preferably relates to an outline of the reflector layer, through which, for example, a geometric shape or a contour of a person or an object can be seen in plan view.
  • the second authenticity feature is created by the removal of the first reflector layer to produce the second pattern, which can be seen in plan view.
  • the second pattern may be a representation of the object or a geometry.
  • the first pattern and the second pattern can complement each other to a total pattern.
  • both authenticity features can be recognized by the naked eye for a viewer.
  • Another advantage is the fact that the reflector layer thus has two optically effective (identically) microstructured surfaces. The microstructuring is effective as an authenticity feature in supervision from the front and also usable as an authenticity feature in supervision of the back.
  • microstructures ie also the first microstructure, adapting pigment is designed to be so thin or flexible that it follows the contour of the microstructure.
  • Such nanoparticles or contour-matching pigments are known, for example EP 1689586 B1 .
  • WO 2010/069823 A1 and WO 2013/090983 A1 are known, for example EP 1689586 B1 .
  • the microstructure is preferably produced by embossing.
  • the first patternable layer is provided on a substrate.
  • the structurable layer may alternatively itself be a substrate. These steps of the procedure need not be performed in the order given. It is also possible in further developments to produce the microstructure in a structurable layer and further optionally to transfer the thus structured layer onto the substrate.
  • a substrate such as paper
  • a substrate such as a foil
  • a substrate such as paper
  • a substrate such as a foil
  • the security element may be a data carrier, such as a security thread, a label, a transfer element or a security print.
  • the substrate may be configured as any thin-surface element suitable for supporting the first patternable layer and the first reflector layer.
  • the substrate may be a paper, in particular a cotton paper, or a film of polyethylene (PE), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN), polypropylene (PP) or polyamide (PA).
  • the paper can be one Proportion x artificial polymer material in the range of 0 ⁇ x ⁇ 100 wt .-% included.
  • the paper may also contain a proportion of other polymer material in the range of 0 ⁇ x ⁇ 100% by weight or consist entirely of synthetic polymer fibers, eg Tyvek®.
  • the film may be monoaxially or biaxially stretched. It may also contain different polymer types, be coextruded and / or thermolaminated. Among other things, the stretching of the film leads to it obtaining polarizing properties which can be used as a further authenticity feature. For the utilization of these properties required tools, such. As polarizing filters are known in the art.
  • the substrate can be a paper-foil composite or a film composite in which the substrate, the structurable layer and the reflector layer are embedded between two film layers.
  • a front side of the patternable layer corresponds to a front side of the security element.
  • the front side (or the back side) of the security element is to be understood in each case also in a plan view.
  • This structurable layer then optionally comprises an embossing lacquer, for example a UV embossing lacquer.
  • the patternable layer may also comprise any other material which is formable by temperature, pressure, printing, laser treatment or other types of treatment such that a microstructure can be produced therein.
  • the structurable Layer can be transparent / translucent or opaque. It may also have a color which optionally does not interact with the laser radiation for laser ablation.
  • the patternable layer is applied to the front side of the substrate, where the front side can be any side of the substrate and, alternatively, can also be referred to as a first side.
  • the microstructure is optionally a hologram structure for generating a holographic image of an object or a person.
  • the holographic image represents a further authenticity feature.
  • a hologram for example a pictorial representation of an object or a person, can be seen in plan view.
  • the microstructure may also be a microlens, micromirrors, or any other micron or nanometer scale structure.
  • the microstructure may be, for example, by means of printing or laser ablation on the substrate, for. In the structurable layer. By applying the reflector layer to the microstructure, the latter is better in plan view or optically effective (eg in the case of a hologram).
  • a second or third microstructure may also each be a structure with microlenses, micromirrors or any other structure that has an order of magnitude in the micrometer or nanometer range.
  • the reflector layer may be greater than the microstructure in its surface extent in a preferred embodiment, so that the microstructure in a portion of the reflector layer is effective.
  • the outline of the reflector layer is predetermined in the first pattern, which for example has a certain geometric shape or represents an object / person in cross-section.
  • the first reflector layer is printed, taking care that their thickness is always the same, so that therefore results in a homogeneous thickness.
  • the thickness is z. Along the local surface normal of the microstructure or along a normal to the plane in which the microstructure resides (eg, it may be an upper surface of the substrate).
  • the surface structure of the security element is identical before the application of the first reflector layer and after the application of the first reflector layer, since the surface structure of the microstructure is retained by the first reflector layer due to its constant thickness.
  • the microstructure is not equalized or filled by the printing. Due to this, the first microstructure can be seen from both sides of the reflector layer, i. H. in plan view of a front side of the security element and in view through a transparent portion through the substrate to the first microstructure and the first reflector layer.
  • a metallic ink can be printed on the first microstructure by conventional printing methods, for example using known printing presses.
  • the metallic ink may include metallic pigment particles and a binder.
  • the metallic particles may be microstructured metallic flat pigments (flakes) comprising, for example, aluminum, stainless steel, gold, silver, platinum or copper.
  • the binder of the metallic ink can be microcellulose, Vinyl chloride, vinyl acetate copolymers or vinyl included. Further, as metal particles for the metallic ink, silver nanoparticles, aluminum nanoparticles or titanium nanoparticles may be used.
  • the second pattern is produced by partially or completely removing the thickness of the first reflector layer.
  • the aim of this ablation is to increase the transmission of light in the ablated area compared to the rest of the first reflector layer, so that the second pattern can be seen in plan view and / or in review.
  • the microstructure is not altered, i. H. not removed, so that the effectiveness of the microstructure and also the stability of the security element are retained.
  • the first reflector layer has a homogeneous thickness and thus the intensity of the laser radiation can be adjusted so that only the first reflector layer is removed and the underlying microstructure or other layers are not damaged. Due to the fact that the first reflector layer has a constant thickness, the same laser power can always be used for the uniform removal of the first reflector layer. Furthermore, the microstructure may be opaque because, even if the laser ablation is operated with constant intensity, due to the homogeneous thickness of the first reflector layer, no damage to the microstructure is to be expected.
  • the laser beam for laser ablation 2 laser having a wavelength of about 10.6 microns or Nd, for example, with an infrared laser, a CO: YAG laser with a wavelength of 1.064 microns are produced.
  • the security element may be provided in the security element, such as an adhesive layer for securing a layer composite to the substrate, for example of a PU adhesive, or an intermediate layer, for example of a PET film.
  • an adhesive layer for securing a layer composite to the substrate for example of a PU adhesive
  • an intermediate layer for example of a PET film.
  • the reflector layer can be covered with a cover layer of an optically transparent color or a transparent layer.
  • the second pattern is optionally applied in such a way that it can be seen through.
  • the substrate has a transparent or translucent section which is arranged below the structurable layer, wherein the first reflector layer is removed over the section, so that the second pattern can be seen through the section.
  • the removed area of the reflector layer which can represent a recess in the first reflector layer, is illuminated in a transparent manner so that the second pattern is then particularly clearly visible. It also stands in perfect Passer to the first pattern.
  • the first microstructure can be seen not only in supervision, but also in transparency.
  • the transparent or translucent portion may be, for example, a window, an area in an opaque substrate in which a transparent or translucent portion is provided, or may be part of the transparent or translucent substrate.
  • any portion of a transparent sheet may be considered the portion.
  • opaque in the sense of the application is understood to mean a material which transmits a maximum of 5%, in particular a maximum of 2%, of the visible light.
  • transparent or translucent in the sense of the application it is understood that a relevant material transmits between 50%, in particular 90%, and 100% of the visible light.
  • a transparent and translucent material differs in that an image can be recognized through the transparent material - the image information remains after passing through the transparent material - this is not the case with a translucent material - the image information is lost through the translucent material.
  • the section can also be made translucent in that, although the substrate is opaque, it is made so thin in the region of the section that light can translucently pass through the section.
  • the section may be part of a watermark.
  • a similar composite structure as on the front side is preferably applied to a rear side of the security element.
  • the following steps are preferably carried out: generating a second microstructure on a back side of the substrate under a transparent or translucent section and printing a second reflector layer on the second microstructure of homogeneous thickness in a third pattern, which can be seen in plan view on the back, wherein laser ablation simultaneously removes the second reflector layer by passing the laser radiation through the section during laser ablation. Because the first reflector layer and the second reflector layer are removed by the same laser irradiation, the patterns in the first reflector layer and in the second reflector layer are exactly in register with one another.
  • the third pattern in which the second reflector layer is applied, may be identical to the first pattern, so that a similar outline of the respective reflector layer can be seen on the front side and the rear side. However, it is also possible that the third pattern differs from the first pattern, so that different outlines of the respective reflector layer can be seen on the front and back.
  • the material of the first reflector layer may be identical to that of the second reflector layer, but it is preferred that different materials are used for the first reflector layer and the second reflector layer, so that preferably different optical impressions result from the first and second reflector layer.
  • the second microstructure may also be incorporated into a patternable layer, which is optionally applied to the backside of the substrate over the portion.
  • the portion and / or structurable layers are / are made transparent such that during laser ablation, the first reflector layer and the second reflector layer are ablated by the same laser irradiation step by passing the laser radiation through the section.
  • the laser radiation impinges perpendicular to the substrate, but it is also possible that the laser radiation is incident on the substrate at a different angle, in particular between ⁇ 30 ° and ⁇ 60 ° to the normal, so that the second pattern is viewed at an angle , which corresponds to the angle of incidence of the laser radiation during laser ablation, is visible.
  • the first reflector layer and / or the second reflector layer be applied in such a way that the first reflector layer in the first pattern and / or the second reflector layer in the third pattern at least one recess / has. Since the section is transparent and / or translucent, in principle the first microstructure would be visible from the rear side due to its homogeneous thickness, and the second microstructure would also be visible from the front in a top view. However, since the reflector layers are opaque, this is not possible.
  • the recesses are therefore provided in the first reflector layer and / or in the second reflector layer, so that the first microstructure can be seen through the recess in the second reflector layer in a plan view of the rear side and / or the second microstructure is viewed through the recess in plan view of the front side to recognize in the first reflector layer.
  • a second hologram of the second microstructure can be seen in the first microstructure that can be seen on the front side.
  • a hologram in the hologram can thus be seen in plan view.
  • the application of the at least one recess in the first reflector layer and / or in the second reflector layer can take place during printing itself or subsequently by laser ablation. It is preferred that the first reflector layer and / or the second reflector layer is already printed with the recesses on the first structurable layer or the second structurable layer.
  • a substrate with a transparent section As far as proceeding from or in the following, a substrate with a transparent section is assumed, the further elements and embodiments can be provided analogously for a transparent substrate.
  • a transparent section can also be understood as meaning a section of the transparent substrate which is not covered by opaque layers.
  • the second reflector layer generates in reflection one of the first reflector layer different optical impression.
  • the color of the radiation reflected by the respective reflector layer may be different.
  • different materials for the first and second reflector layer are printed.
  • the respective holograms then show different colors in supervision, so that they are particularly clearly recognizable. By using different colors, a bimetal effect can be generated in the hologram in the hologram.
  • the security against forgery of the security element can be further increased by carrying out the following steps: producing a third microstructure on the front side of the substrate over the section and printing a third reflector layer on the third microstructure with a homogeneous thickness in a fourth pattern, which is in a top view the front side is recognizable, wherein the laser ablation simultaneously removes the third reflector layer and wherein the first reflector layer and / or the third reflector layer is / is applied such that the first reflector layer in the first pattern and / or the second reflector layer in the fourth pattern at least one Have recess / has.
  • the fourth pattern may be identical to the first pattern and / or the third pattern, however, it is preferred that the fourth pattern be different from the first pattern and / or the third pattern.
  • the fourth pattern can serve as another authenticity feature.
  • the recess in the first reflector layer and / or the third reflector layer, as described above, also generates a hologram in the hologram.
  • the first reflector layer (together with the first structurable layer) is disposed between the third reflector layer (together with the third structurable layer) and the substrate.
  • a hologram of the first microstructure is visible in the hologram of the third microstructure.
  • a hologram of the third microstructure can be recognized due to the recesses in the first reflector layer in the hologram of the first microstructure.
  • a particularly simple arrangement of the first reflector layer and the third reflector layer results when the first reflector layer is arranged between the first and the third microstructure.
  • the first reflector layer is in direct contact with the first and the third microstructure. This results in a preferred construction of the security element, in which the first microstructure lies under the first reflector layer, which in turn is arranged under the third macrostructure, which in turn is arranged under the third reflector layer.
  • the carrier layer can be, for example, a film, in particular a PET film, which for example has a thickness of 6 ⁇ m.
  • the microstructures are attached to the carrier layer, wherein the respective reflector layers are in turn applied to the microstructures. The first reflector layer is thus facing the back and the third reflector layer of the front.
  • a fourth reflector layer which generates in reflection one of the first reflector layer, the second reflector layer and / or the third reflector layer different optical impression, in regions over the first reflector layer, the second reflector layer and / or the third reflector layer is printed with a homogeneous thickness, wherein optionally during laser ablation, the fourth reflector layer is removed simultaneously.
  • the fourth reflector layer can be printed on the first, the second, or the third reflector layer or on all reflector layers. Since the fourth reflector layer and the respective underlying reflector layer each have a homogeneous thickness, the surface of the fourth reflector layer has the same structure as the underlying microstructure. The microstructure can therefore be seen even when the fourth reflector layer is printed on top.
  • the fourth reflector layer differs in reflection in each case from the reflector layer on which it is applied, in their optical impression.
  • the fourth reflector layer differs from the reflector layer on which it is applied in its colored perception, so that bimetallic effects can be generated.
  • the fourth reflector layer and / or in the first, second or third reflector layer are also provided at least one recesses, which can be introduced as described above. Depending on the reflector layer in which the recess is made, the bimetallic effect is visible in supervision from the front or the back.
  • a further authenticity feature can preferably be produced by providing a laser-radiation-sensitive layer, which changes the color upon laser radiation, and is changed in terms of color by the laser ablation.
  • the laser-radiation-sensitive layer may comprise, for example, laser-modifiable effect pigments or else pigment-free laser-modifiable marking substances. Examples of suitable markers and the manner in which they are applied and / or introduced onto the substrate are described in the document WO 2010/072329 A1 described in more detail, the disclosure of which is included in the present application in this respect.
  • the laser-radiation-sensitive layer can be applied under the microstructure or over the reflector layer.
  • the laser-radiation-sensitive layer changes its color due to the laser radiation of the laser ablation.
  • the laser-radiation-sensitive layer may be blue before the application of the laser radiation and red after the application.
  • the laser radiation-sensitive layer was transparent before being exposed to the laser ablation radiation and becomes colored upon interaction with the laser ablation radiation. Since the color change of the laser radiation sensitive layer is performed by the laser ablation, the area of the laser radiation sensitive layer whose color is changed is in exact registration with the second pattern.
  • a security element which has a substrate, a first patternable layer which is applied on a front side of the substrate over the section, a first microstructure in a surface of the first structurable layer and a first reflector layer which is applied to the first Microstructure is printed with a homogeneous thickness includes.
  • the first reflector layer is structured in a first pattern, which can be seen in a plan view of the front side.
  • the first reflector layer has, above the cutout, a recess in the form of a second pattern, which can be seen in a view through the section.
  • a security element 10, as in various embodiments in the Fig. 1 to 8 may be part of a value document or an entire value document, such as a banknote, an identity card or the like.
  • the security element 10 has a substrate 12 which can extend over the entire value document or can be connected to the value document.
  • a first reflector layer 14 can be seen, which can be printed in particular as metallic, for example, with metallic effect pigments.
  • the first reflector layer 14 has a homogeneous thickness d, ie the thickness d constant everywhere.
  • the thickness D can z. B. measured along a normal to an area of the first microstructure 16, as particularly well in Fig. 3 is recognizable.
  • the first reflector layer 14 is applied with an outline in the form of a first pattern; in Fig. 1
  • the first pattern is a curved star, but it is also possible for the first pattern to use other geometric shapes or the contour of a person, object or animal or the like.
  • the first reflector layer 14 with the first pattern represents an authenticity feature of the security element 10.
  • a first microstructure 16 can be seen in plan view of the security element 10, which in Fig. 1 symbolized as a triangle.
  • the first microstructure 16 can have any shape and holographically represents objects, a person or an animal, thereby increasing the security against forgery of the security element 10.
  • the first microstructure 16 may be formed as a hologram structure; the hologram of the first microstructure 16 is another authenticity feature of the security element 10. Since the first reflector layer 14 has the constant thickness d, the first reflector layer 14 has a surface structure identical to that of the first microstructure 16, as shown in FIG Fig. 3 is shown as an example. The first microstructure 16 is therefore recognizable in principle in supervision and in review.
  • a recess 18 is incorporated in the form of a second pattern, which in Fig. 1 is shown as a half ring.
  • the recess 18 and thus the second pattern can be seen in review.
  • the second pattern can be configured as desired and represents another authenticity feature of the security element 10.
  • substrate 12 is made of an opaque material, for example paper, especially cotton paper, and for example, has a basis weight of 68 g / m 2.
  • the substrate 12 has a transparent or translucent section 20 made of a plastic, in particular a plastic film such as polyethylene (PE). Moreover, it is also possible for the section 20 to be a window in the substrate 12.
  • the substrate 12 is made entirely of a transparent or translucent material, for example plastic, in particular a plastic film such as polyethylene (PE) or a film bank note substrate made of stretched polypropylene film (BOPP) with a basis weight of 70 g / m 2 .
  • the portion 20 forms part of the substrate 12 in this embodiment.
  • a first structurable layer 22 is applied directly to the front side of the substrate 12, and a second structurable layer 28 is applied to an opposite rear side, which optionally can also be omitted.
  • the layers it is also possible for the layers to be applied to the substrate 12 by means of adhesive and further layers, as will be explained below by way of example.
  • the first structurable layer 22 is designed in such a way that that incorporated therein the first microstructure 16, z. B. imprinted, is.
  • the first layer 22 is made from a UV embossing lacquer having a basis weight of 5.0 g / m 2 .
  • the first layer 22 is transparent in the region above the portion 20 in this embodiment.
  • a second reflector layer 24 and a second microstructure 26 are also provided in a second structurable layer 28.
  • the second reflector layer 24 has an outline in the form of a third pattern, which represents a further authenticity feature of the security element 10.
  • the thickness d of the second reflector layer 24 is constant, so that the second reflector layer 24 has a surface structure which is identical to the second underlying microstructure 26, analogous to that in FIG Fig. 3 shown exemplary representation.
  • the second microstructure 26 may be formed as a hologram structure; The hologram of the second microstructure 26 also serves as an authenticity feature and may be identical or different from that of the first microstructure 16.
  • the second reflector layer 24 may be made of the same materials as the first reflector layer 14.
  • the third pattern of the second reflector layer 24 may be identical to the first pattern of the first reflector layer 14, however, it is also possible that the first pattern and the third pattern differ.
  • a recess 18 is likewise provided, which is identical to the recess 18 in the first reflector layer 14. Since the transparent or translucent portion 20 is provided between the recesses 18, the second pattern of the recess 18 can be seen in the form of an authenticity feature.
  • the second layer 28 is preferably configured analogously to the first layer 22.
  • the security element 10 of Fig. 2a and 2b is made by providing the substrate 12 with the transparent or translucent portion 20. At least on the section 20, the first structurable layer 22 is applied on the front side, in the surface of which the first microstructure 16 is provided. Subsequently, on the first patternable layer 22, the first reflector layer 14 is printed with an outline in the form of the first pattern, as shown for example in the EP 1689586 A1 , of the WO 2013/090983 A1 and the WO 2011/064152 A2 is described. Furthermore, on the rear side of the security element 10, the second structurable layer 28 is embossed at least over the section 20 and the second microstructure 26 is embossed in its surface.
  • the second reflector layer 24 is printed with an outline in the form of the third pattern, as shown for example in the EP 1689586 A1 , of the WO 2013/090983 A1 and the WO 2011/064152 A2 is described.
  • the first reflector layer 14 and the second reflector layer 24 are removed. This is done by using for ablation the arrows indicated by Fig. 2a and 2b illustrated laser radiation is passed through the section 20, so that the first reflector layer 14 and the second reflector layer 24 are removed simultaneously.
  • the laser beam for the ablation 2 laser having a wavelength of about 10.6 microns or Nd, for example, with an infrared laser such as a CO: YAG laser with a wavelength of 1.064 microns are produced.
  • Fig. 3 shown embodiment of the security element 10 is consistent with in Fig. 2a and 2b shown embodiment of the security element 10 except for the following differences.
  • the security element 10 according to Fig. 3 does not have a second patternable layer 28, no second one Microstructure 26 and no second reflector layer 24 on. Further, no transparent portion 20 is provided in the substrate 12. In addition, the substrate 12 is opaque. The recess 18 in the form of the second pattern can thus not be recognized in a transparent manner.
  • the first patternable layer 22 may also be opaque.
  • Damage to the first patternable layer 22 by the laser ablation to produce the recess 18 can be minimized even with constant energy input laser ablation, since the first reflector layer 14 has a constant thickness d, so that when the power for the laser ablation is set once correctly, over the extent of the first reflector layer 14, the first reflector layer 14 is removed only in the area of the second pattern, but no interaction with the first structurable layer 22 takes place.
  • Fig. 4 shown embodiment of the security element 10 is similar to that in Fig. 2a and 2b shown embodiment, so that will be discussed below only the differences.
  • the second layer 28 with the second microstructure 26 and the second reflector layer 24 are in accordance with the security element 10 Fig. 4 not provided, but can be analogous to that in the Fig. 2a and 2b be provided embodiment shown, or, as discussed in the following first layer 22, be configured with the first microstructure 16 and the first reflector layer 14.
  • the first layer 22 is colored in the region of the first reflector layer 14, so that the recess 18 can be seen in phantom in color.
  • the first layer 22 can also be colored in the entire area.
  • the first reflector layer 14 is in the security element 10 according to Fig.
  • a fourth reflector layer 30 is provided with a homogeneous thickness d, so that the fourth reflector layer 30 has a surface structure which is identical to that of the first microstructure 16.
  • the first reflector layer 14 and the fourth reflector layer 30 are designed differently, so that they produce a different visual impression in reflection at an observer.
  • the reflector layers 14,30 may be made of different materials.
  • the fourth reflector layer 30 may be applied in a different or the same pattern in the first pattern.
  • Recesses 32 are provided in the first reflector layer 14 and / or the fourth reflector layer 30. These recesses 32 generate a bimetallic effect in plan view.
  • the production of the security element according to Fig. 4 is analogous to the production of the security element in Fig. 2a and 2b , Moreover, in the step of applying the first layer 22, the first layer 22 in the region of the first reflector layer 14 is colored, for example by introducing a colored pigment into the first layer 22.
  • the recesses 32 are provided.
  • this is achieved by printing the recesses 32, that is to say the recesses 32 are pressure recesses when the first reflector layer 14 is imprinted.
  • the recesses 32 it is possible for the recesses 32 to be produced by ablation.
  • the printing of the fourth reflector layer 30 is analogous to the application of the first reflector layer 14.
  • the first reflector layer 14 and the fourth reflector layer 30 are removed by means of ablation. Since the ablation in the two reflector layers 14, 30 takes place simultaneously, the recesses 18 are in the first reflector layer 14 and in the fourth reflector layer 30 in perfect registration with each other.
  • FIG Fig. 5 Another embodiment of the security element 10 is shown in FIG Fig. 5 shown. This embodiment is similar to that in FIG Fig. 2a or 2b shown.
  • the first layer 22 is colored in the area of the first reflector layer 14.
  • the first reflector layer 14 is further provided with the recess 18 and the recess 32.
  • the second layer 28 and the second reflector layer 24 are configured.
  • the security element 10 has an adhesive layer 34, an intermediate layer 36 and a cover layer 38 on the front and back, respectively.
  • the adhesive layer 34 may be, for example, a PU adhesive having a weight of 4.5 g / m 2 .
  • the adhesive layers 34 are used to attach the first layer 22 and the second layer 28 to the substrate 12.
  • the intermediate layer 36 is provided, which may be, for example, a PET film having a thickness of 6 microns.
  • the cover layer 38 is applied to the first reflector layer 14 and the second reflector layer 24 and serves to reduce damage and soiling of the reflector layers 14 and 24.
  • the cover layer 38 may be, for example, an optically transparent ink layer.
  • the adhesive layer 34 and the intermediate layer 36 are also made transparent.
  • the hologram of the first microstructure 16 is visible through the recess 32 in the second reflector layer 24.
  • the hologram of the second microstructure 26 can be seen through the recess 32 in the first reflector layer 14.
  • a hologram in hologram can be seen from both sides in supervision, which represents another authenticity feature.
  • the hologram the first microstructure 16 and through the recess 32 that of the second microstructure 26 recognizable.
  • the hologram of the second microstructure 26 and through the recess 32 in the second reflector layer 24 that of the first microstructure 16 can be seen.
  • first reflector layer 14 and the second reflector layer 24 made of different materials, such as in Fig. 4 the first reflector layer 14 and the fourth reflector layer 30, bimetallic effects can also be produced by means of the recesses 32.
  • the holograms are recognizable from both sides because the respective reflector layers 14, 24 have a homogeneous thickness d
  • the production of the security element 10 according to Fig. 5 is similar to those in Fig. 2a, 2b and 4 described production method. Therefore, only the differences will be discussed below.
  • the adhesive layers 34 are first applied to the front and back sides of the substrate 12.
  • the respective intermediate layers 36 are arranged.
  • the first layer 22 is printed on the front side and the second layer 28 on the back over the cutout 20 and colored in the region of the respective reflector layers 14 and 24.
  • the first reflector layer 14 and the second reflector layer 24 is applied with the recesses 32, and finally covered with the cover layer 38.
  • the recesses 18 are introduced by ablation, as described above, so that they are in exact registration.
  • a third patternable layer 40 in the surface of a third microstructure 42 is introduced, is provided.
  • the third layer 40 is covered with a third reflector layer 44 printed with an outline in the form of a fourth pattern of homogeneous thickness d.
  • the fourth pattern may be analogous to or different from the first pattern.
  • the third layer 40 may be configured like the first layer 22 or the second layer 28; Also, the third reflector layer 14 may be made of the material of the first reflector layer 14 or the second reflector layer 24.
  • the recesses 18 and the recesses 32 are provided.
  • the recess 32 in the third reflector layer 44 allows the hologram of the first microstructure 16 to be seen in a plan view of the front side.
  • the recess 32 in the first reflector layer 14 makes it possible to see from above the hologram of the third microstructure 42 in a top view.
  • structure of the security element 10 as a further authenticity feature again be a hologram in the hologram for the observer recognizable.
  • the first reflector layer 14 and the third reflector layer 44 are made of different materials, bimetallic effects can again be produced in cooperation with the recesses 32, which can be seen in a plan view of the front side and the rear side.
  • the method of manufacturing the security element 10 according to Fig. 6 is similar to the previously described methods of preparation. Thus, only the differences are discussed.
  • the third patternable layer 40 applied.
  • the third microstructure 42 is introduced into the surface of the third layer 40 and arranged thereon the third reflector layer 44 with the recesses 32.
  • the recesses 32 in the first reflector layer 14 and the third reflector layer 44 may be pressure reliefs or be made by ablation.
  • the first reflector layer 14 and the third reflector layer 44 are ablated simultaneously by means of ablation, so that the recesses 18 produced therewith are in perfect registration with one another.
  • the security element 10 has analogous to in Fig. 6 1, a first reflector layer 14 on the first layer 22 with the first microstructure 16 mounted therein and the third layer 40 with the third microstructure 42 as well as the third reflector layer 44 on.
  • the security element 10 has a carrier layer 46, which may be a transparent PET film, for example with a thickness of approximately 6 ⁇ m. On the carrier layer 46, the first layer 22 and the third layer 40 are applied. This means that the first layer 22 and the third layer 40 are mounted on different sides of the carrier layer 46.
  • the respective microstructures 16 and 42 are provided on the respective layers 22, 40 in their surfaces facing away from the carrier layer 46.
  • the reflector layers 14 and 44 are applied on the side facing away from the carrier layer 46.
  • the first reflector layer 14 is therefore facing the front side of the substrate 12, while the third reflector layer 44 faces away from the front side of the substrate 12.
  • the fixation of the composite Carrier layer 46, first layer 22, first reflector layer 14, third layer 40 and third reflector layer 44 on the substrate 12 is achieved by the adhesive layer 34.
  • the third reflector layer 44 is covered with the cover layer 38 to reduce soiling and damage.
  • the manner of manufacturing the security element 10 according to Fig. 7 is as follows: First, the support layer 46 is provided, on one side of the first layer 22 is provided. In its surface, the first microstructure 16 is provided and the first reflector layer 14 is applied with an outline in the form of the first pattern. On the other side of the carrier layer 46, the third layer 40 is applied. In the surface of the third layer 40, the third microstructure 42 is introduced and the third reflector layer 44 is applied. On the third reflector layer 44, the cover layer 38 is now applied.
  • the composite produced in this way is arranged with the aid of the adhesive layer 34 on the substrate 12 such that the recess 18 is arranged above the section 20. The provision of the recess 18 can be carried out before or after the application to the substrate 12.
  • This security element 10 furthermore has a laser-radiation-sensitive layer 48, which is optionally arranged between the first layer 22 and the intermediate layer 36.
  • the laser-radiation-sensitive layer 48 is transparent to a certain intensity before being exposed to laser radiation. After the laser radiation-sensitive layer 48 has been exposed to the laser radiation for ablation, the laser-radiation-sensitive layer 48 is colored in the region of the application of the laser radiation.
  • the laser-radiation-sensitive layer 48 may be laser-modifiable effect pigments or pigment-free laser-modifiable pigments Contain markers. Examples of the laser radiation-sensitive layer 48 are in the document WO 2010/072329 A1 described.
  • the production of the security element 10 according to the Fig. 8a and 8b is similar to the previously described procedures.
  • the adhesive layer 34 and the intermediate film 36 are applied to the substrate 12.
  • the laser radiation-sensitive layer 48 is applied to the intermediate layer 36.
  • the laser radiation sensitive layer 48 is in this state as in FIG Fig. 8a shown, transparent.
  • the first layer 22 with the first microstructure 16 arranged thereon is applied to the laser-radiation-sensitive layer 48.
  • the first reflector layer 14 is applied with the outline in the form of the first pattern.
  • the recess 18 is provided in the second pattern in the first reflector layer 14.
  • the laser radiation during ablation induces a color change in the laser-radiation-sensitive layer 48.
  • the colored area of the laser radiation sensitive layer 48 is in perfect registration with the recess 18 in the second pattern. This means that the colored area of the laser-radiation-sensitive layer 48 also has the second pattern.

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • General Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Credit Cards Or The Like (AREA)
EP17001323.9A 2016-08-03 2017-08-01 Élément de sécurité et procédé de fabrication d'un élément de sécurité Active EP3279003B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102016009437.0A DE102016009437A1 (de) 2016-08-03 2016-08-03 Sicherheitselement und Verfahren zur Herstellung eines Sicherheitselements

Publications (2)

Publication Number Publication Date
EP3279003A1 true EP3279003A1 (fr) 2018-02-07
EP3279003B1 EP3279003B1 (fr) 2019-12-18

Family

ID=59522903

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17001323.9A Active EP3279003B1 (fr) 2016-08-03 2017-08-01 Élément de sécurité et procédé de fabrication d'un élément de sécurité

Country Status (2)

Country Link
EP (1) EP3279003B1 (fr)
DE (1) DE102016009437A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3828000A1 (fr) * 2019-11-29 2021-06-02 IDEMIA France Document sécurisé et procédé de fabrication d'un document, concernant un'image personnalisée formée à partir d'un hologramme métallique
RU2811489C1 (ru) * 2019-11-29 2024-01-12 ИДЕМИА Франс Защищенный документ с персонализированным изображением, выполненным при помощи металлической голограммы, и способ его изготовления

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005108109A1 (fr) * 2004-05-05 2005-11-17 Giesecke & Devrient Gmbh Document de valeur
EP1689586A2 (fr) 2003-11-14 2006-08-16 Printetch Limited Impression de securite utilisant un reseau de diffraction
WO2010069823A1 (fr) 2008-12-19 2010-06-24 Basf Se Flocons d'aluminium minces
WO2010072329A1 (fr) 2008-12-22 2010-07-01 Giesecke & Devrient Gmbh Support de données à zone transparente
WO2011064152A1 (fr) 2009-11-26 2011-06-03 Universität Bern Verwaltungsdirektion Inhibiteurs de topoisomérase 1 pour le traitement de maladies auto-immunes
DE102010053052A1 (de) 2010-12-01 2012-06-06 Giesecke & Devrient Gmbh Datenträger mit Kennzeichnung
WO2013090983A1 (fr) 2011-12-22 2013-06-27 Innovia Security Pty Ltd Dispositif de sécurité optique avec encre à nanoparticules
EP2889152A1 (fr) * 2013-12-20 2015-07-01 Giesecke & Devrient GmbH Élément de sécurité destiné à représenter au moins une information variable optiquement

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101557945B (zh) * 2006-09-15 2011-11-16 证券票据国际私人有限公司 用于安全文件的辐射可固化压印油墨安全标识
DE102008006533A1 (de) * 2008-01-29 2009-07-30 Giesecke & Devrient Gmbh Sicherheitselement mit Polarisationsmerkmal
AU2010323218B2 (en) * 2009-11-27 2014-07-31 Basf Se Coating compositions for security elements and holograms
GB201003136D0 (en) * 2010-02-24 2010-04-14 Rue De Int Ltd Optically variable security device comprising a coloured cast cured hologram

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1689586A2 (fr) 2003-11-14 2006-08-16 Printetch Limited Impression de securite utilisant un reseau de diffraction
EP1689586B1 (fr) 2003-11-14 2014-01-15 Basf Se Impression de securite utilisant un reseau de diffraction
WO2005108109A1 (fr) * 2004-05-05 2005-11-17 Giesecke & Devrient Gmbh Document de valeur
WO2010069823A1 (fr) 2008-12-19 2010-06-24 Basf Se Flocons d'aluminium minces
WO2010072329A1 (fr) 2008-12-22 2010-07-01 Giesecke & Devrient Gmbh Support de données à zone transparente
WO2011064152A1 (fr) 2009-11-26 2011-06-03 Universität Bern Verwaltungsdirektion Inhibiteurs de topoisomérase 1 pour le traitement de maladies auto-immunes
DE102010053052A1 (de) 2010-12-01 2012-06-06 Giesecke & Devrient Gmbh Datenträger mit Kennzeichnung
WO2013090983A1 (fr) 2011-12-22 2013-06-27 Innovia Security Pty Ltd Dispositif de sécurité optique avec encre à nanoparticules
EP2889152A1 (fr) * 2013-12-20 2015-07-01 Giesecke & Devrient GmbH Élément de sécurité destiné à représenter au moins une information variable optiquement

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3828000A1 (fr) * 2019-11-29 2021-06-02 IDEMIA France Document sécurisé et procédé de fabrication d'un document, concernant un'image personnalisée formée à partir d'un hologramme métallique
WO2021105582A1 (fr) * 2019-11-29 2021-06-03 Idemia France Un document sécurisé avec une image personnalisee formee a partir d'un hologramme metallique et son procede de fabrication
FR3103736A1 (fr) * 2019-11-29 2021-06-04 Idemia France Image personnalisée formée à partir d’un hologramme métallique
CN114728531A (zh) * 2019-11-29 2022-07-08 法国埃迪米亚公司 具有由金属全息图形成的个性化图像的安全文件及其产生方法
CN114728531B (zh) * 2019-11-29 2023-06-23 法国埃迪米亚公司 具有由金属全息图形成的个性化图像的安全文件及其产生方法
RU2811489C1 (ru) * 2019-11-29 2024-01-12 ИДЕМИА Франс Защищенный документ с персонализированным изображением, выполненным при помощи металлической голограммы, и способ его изготовления
JP7481443B2 (ja) 2019-11-29 2024-05-10 アイデミア フランス 金属ホログラムから形成される個人化画像を有するセキュリティ文書及びその製作方法

Also Published As

Publication number Publication date
DE102016009437A1 (de) 2018-02-08
EP3279003B1 (fr) 2019-12-18

Similar Documents

Publication Publication Date Title
EP2991837B1 (fr) Élément de sécurité optiquement variable
EP2459387B1 (fr) Element de securite pour un objet a proteger, ainsi qu'objet a proteger dote d'un tel element de securite
EP2646256B1 (fr) Support de données à marquage
WO2017097430A1 (fr) Élément de sécurité muni d'une image lenticulaire
WO2012097463A1 (fr) Procédé de fabrication d'un support de données multicouche et support de données fabriqué selon ledit procédé
EP0210619A2 (fr) Feuille multicouche déformable par estampage à chaud et son procédé de fabrication
EP3342602B1 (fr) Substrat pour documents de valeurs multicouche
WO2013156149A1 (fr) Élément de sécurité optiquement variable
EP1972463A2 (fr) Elément de sécurité
EP3820715A1 (fr) Élément de sécurité optiquement variable à zone de surface réfléchissante
EP3215371A1 (fr) Support de données comprenant un élément de sécurité transparent
EP2035230B1 (fr) Procédé pour fabriquer un composite stratifié laminé, composite stratifié laminé et utilisation dudit composite
DE102007005416B4 (de) Prägefolie und damit gebildeter Sicherheitsaufkleber
EP0477535B1 (fr) Support de données multicouche et méthode de sa fabrication
EP4112325B1 (fr) Substrat de sécurité et document de valeur produit à partir de celui-ci
EP1599344B1 (fr) Element de securite
DE3906695C2 (fr)
EP2768660B1 (fr) Procédé de réalisation de micro-miroirs creux
EP3279003B1 (fr) Élément de sécurité et procédé de fabrication d'un élément de sécurité
DE102015207268A1 (de) Sicherheitselement und Verfahren zur Herstellung eines Sicherheitselements
DE102018005697A1 (de) Sicherheitselement mit Linsenrasterbild
DE102018127628A1 (de) Sicherheitselement mit einander räumlich zugeordneten Strukturelementen in verschiedenen Schichten
EP3486092B1 (fr) Procédé de fabrication d'un élément de sécurité
DE102020005912A1 (de) Verfahren zum Herstellen eines optisch variablen Sicherheitselements
DE102012025264A1 (de) Verfahren zur Herstellung eines Sicherheitselementes

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20180807

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20181123

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20190719

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: GERMAN

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 502017003141

Country of ref document: DE

REG Reference to a national code

Ref country code: CH

Ref legal event code: NV

Representative=s name: PATENTANWAELTE SCHAAD, BALASS, MENZL AND PARTN, CH

Ref country code: AT

Ref legal event code: REF

Ref document number: 1214153

Country of ref document: AT

Kind code of ref document: T

Effective date: 20200115

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20191218

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200318

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200318

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200319

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200513

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200418

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 502017003141

Country of ref document: DE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

26N No opposition filed

Effective date: 20200921

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200801

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20200831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200801

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20191218

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230520

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20230831

Year of fee payment: 7

Ref country code: CH

Payment date: 20230902

Year of fee payment: 7

Ref country code: AT

Payment date: 20230818

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20240831

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20240822

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20240823

Year of fee payment: 8