WO2017052557A1 - Techniques de formation de dispositif soi sur un substrat virtuel, et configurations associées - Google Patents

Techniques de formation de dispositif soi sur un substrat virtuel, et configurations associées Download PDF

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Publication number
WO2017052557A1
WO2017052557A1 PCT/US2015/051994 US2015051994W WO2017052557A1 WO 2017052557 A1 WO2017052557 A1 WO 2017052557A1 US 2015051994 W US2015051994 W US 2015051994W WO 2017052557 A1 WO2017052557 A1 WO 2017052557A1
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WIPO (PCT)
Prior art keywords
wafer
layer
bonding
device stack
thin film
Prior art date
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PCT/US2015/051994
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English (en)
Inventor
Kimin JUN
Seiyon Kim
Paul B. Fischer
Il-Seok Son
Patrick Morrow
Original Assignee
Intel Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Intel Corporation filed Critical Intel Corporation
Priority to PCT/US2015/051994 priority Critical patent/WO2017052557A1/fr
Priority to TW105124791A priority patent/TWI697109B/zh
Publication of WO2017052557A1 publication Critical patent/WO2017052557A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI

Definitions

  • Embodiments of the present disclosure generally relate to the field of integrated circuits, and more particularly, to techniques for silicon-on-insulator (SOI) device formation in an integrated circuit device and associated
  • SOI silicon-on-insulator
  • a SOI structure provides advantages over traditional devices made from bulk silicon such as reduced under-device leakage.
  • Current SOI structures are typically made from a SOI wafer.
  • processing conditions are very sensitive to incoming materials.
  • dedicated SOI flow processes must be developed and used which are different than bulk wafer flows. Since not all applications necessitate a SOI structure, this may result in a duplicated process development for SOI structure and bulk structure, adding development time and cost.
  • FIG. 1 schematically illustrates a top view of an example die in wafer form and in singulated form, in accordance with some embodiments.
  • FIG. 2 schematically illustrates a cross-section side view of an integrated circuit (IC) assembly, in accordance with some embodiments.
  • FIG. 3 is a flow diagram that illustrates a process for fabricating a silicon-on-insulator (SOI) structure of an IC device, in accordance with some embodiments.
  • SOI silicon-on-insulator
  • FIGS. 4A-4F schematically illustrate a cross-section side view of an IC device during various stages of fabricating the SOI structure of FIG. 3, in accordance with some embodiments.
  • FIG. 5 is a flow diagram that illustrates a process for fabricating a SOI structure of an IC device with a template substrate that includes a thin film epitaxial material layer, in accordance with some embodiments.
  • FIGS. 6A-6F schematically illustrate a cross-section side view of an IC device during various stages of fabricating the SOI structure of FIG. 5, in accordance with some embodiments.
  • FIG. 7 schematically illustrates an example system that may include an IC device as described herein, in accordance with some embodiments.
  • Embodiments of the present disclosure describe techniques for SOI device formation on a virtual substrate and associated configurations.
  • a method of fabricating an SOI structure may include forming a device stack for an IC device on a bulk wafer, removing the bulk wafer from a first side of the device stack, and bonding the first side of the device stack with an insulator layer on a carrier wafer.
  • phrase “A and/or B” means (A), (B), or (A and B).
  • phrase “A, B, and/or C” means (A), (B), (C), (A and B), (A and C), (B and C), or (A, B and C).
  • Coupled may mean one or more of the following. “Coupled” may mean that two or more elements are in direct physical or electrical contact. However, “coupled” may also mean that two or more elements indirectly contact each other, but yet still cooperate or interact with each other, and may mean that one or more other elements are coupled or connected between the elements that are said to be coupled with each other.
  • directly coupled may mean that two or more elements are in direct contact.
  • the phrase "a first feature formed, deposited, or otherwise disposed on a second feature” may mean that the first feature is formed, deposited, or disposed over the second feature, and at least a part of the first feature may be in direct contact (e.g., direct physical and/or electrical contact) or indirect contact (e.g., having one or more other features between the first feature and the second feature) with at least a part of the second feature.
  • direct contact e.g., direct physical and/or electrical contact
  • indirect contact e.g., having one or more other features between the first feature and the second feature
  • module may refer to, be part of, or include an Application Specific Integrated Circuit (ASIC), an electronic circuit, a processor (shared, dedicated, or group) and/or memory (shared, dedicated, or group) that execute one or more software or firmware programs, a combinational logic circuit, and/or other suitable components that provide the described functionality.
  • ASIC Application Specific Integrated Circuit
  • processor shared, dedicated, or group
  • memory shared, dedicated, or group
  • FIG. 1 schematically illustrates a top view of an example die 102 in wafer form 10 and in singulated form 100, in accordance with some embodiments.
  • the die 102 may be one of a plurality of dies (e.g., dies 102, 103a, 103b) of a wafer 1 1 composed of semiconductor material such as, for example, silicon or other suitable material.
  • the plurality of dies may be formed on a surface of the wafer 1 1 .
  • Each of the dies may be a repeating unit of a
  • semiconductor product that includes one or more IC devices that may include circuit structure 400 described with respect to FIGS. 4A-4F and/or circuit structure 600 described with respect to FIGS. 6A-6F.
  • the die 102 may include circuitry having transistor structures 104 such as, for example, one or more channel bodies (e.g., fin structures, nanowires, planar bodies, etc.) that provide a channel pathway for mobile charge carriers of one or more transistor devices or source/drain regions.
  • Electrical interconnect structures such as, for example, transistor electrode assemblies (e.g., terminal contacts) may be formed on and coupled with the one or more transistor structures 104 to route electrical energy to or from the transistor structures 104.
  • terminal contacts may be electrically coupled with a channel body to provide a gate electrode for delivery of a threshold voltage and/or a source/drain current to provide mobile charge carriers for operation of a transistor device.
  • transistor structures 104 are depicted in rows that traverse a substantial portion of the die 102 in FIG. 1 for the sake of simplicity, it is to be understood that the transistor structures 104 may be configured in any of a wide variety of other suitable arrangements on the die 102 in other embodiments, including, for example, vertical and horizontal features having much smaller dimensions than depicted.
  • the wafer 1 1 may undergo a singulation process in which each of the dies (e.g., die 102) is separated from one another to provide discrete "chips" of the semiconductor product.
  • the wafer 1 1 may be any of a variety of sizes. In some embodiments, the wafer 1 1 may have a diameter ranging from about 25.4 mm to about 450 mm. The wafer 1 1 may include other sizes and/or other shapes in other embodiments.
  • the transistor structures 104 may be disposed on a semiconductor substrate in wafer form 10 or singulated form 100. The transistor structures 104 described herein may be incorporated in a die 102 for logic or memory, or combinations thereof. In some embodiments, the transistor structures 104 may be part of a system-on-chip (SoC) assembly.
  • SoC system-on-chip
  • FIG. 2 schematically illustrates an example cross-section side view of an IC package assembly 200, in accordance with some embodiments.
  • the IC package assembly 200 represents one example configuration of a die 202, according to various embodiments.
  • the die 202 may correspond to the die 102 of FIG. 1 .
  • the die 202 may include a first side S1 and a second side S2 opposite the first side S1 .
  • the second side S2 may be referred to as a "front side" of the die 202
  • the first side S1 may be referred to as a "backside” of the die 202, although in other embodiments the second side S2 may be the backside and the first side S1 may be the front side.
  • the backside of the die 202 may be the side of the die 202 on which an insulator layer on a semiconductor carrier substrate is disposed during fabrication of the die 202.
  • the die 202 may generally include one or more device layers (hereinafter “device layer 204b"), one or more interconnect layers (hereinafter “interconnect layer 204a”) disposed on the second side S2 of the die 202, and a carrier substrate layer 204c disposed on the first side S1 of the die 202.
  • An insulator layer 204d may be disposed between the carrier substrate layer 204c and the device layer 204b.
  • the device layer 204b may represent a region where active devices such as transistor devices are formed on the semiconductor substrate.
  • the device layer 204b may include, for example, transistor structures such as channel bodies and/or source/drain regions of transistor devices.
  • the interconnect layer 204a may include interconnect structures (e.g., electrode terminals) that are configured to route electrical signals to or from the active devices in the device layer 204b.
  • the interconnect layer 204a may include interconnect structures (e.g., electrode terminals) that are configured to route electrical signals to or from the active devices in the device
  • interconnect layer 204a may include horizontal lines (e.g., trenches) and/or vertical plugs (e.g., vias) or other suitable features to provide electrical routing and/or contacts.
  • the interconnect layer 204a may additionally or alternatively include one or more through vias (sometimes referred to as through-silicon vias (TSVs) in devices that include a silicon substrate) that extend from the second side S2 to the first side S1 of the die 202 to route signals between another die (not shown) that may be present in some configurations such as a stacked die configuration, and the package substrate 210.
  • TSVs through-silicon vias
  • the die 202 may represent a discrete product made from a semiconductor material (e.g., silicon) using semiconductor fabrication techniques such as thin film deposition, lithography, etching and the like used in connection with forming complementary metal-oxide-semiconductor (CMOS) devices.
  • the die 202 may be, include, or be a part of a processor, memory, system-on-chip (SoC) or application-specific IC (ASIC).
  • an electrically insulative material such as, for example, molding compound or underfill material (not shown) may encapsulate at least a portion of the die 202 and/or a plurality of die-level interconnect structures 206.
  • the die 202 may include a processor or memory.
  • the die 202 may be configured to perform other functions in other embodiments.
  • the die 202 may be configured to perform other functions in other embodiments.
  • the die 202 may be
  • ASIC application specific integrated circuit
  • the die 202 is coupled with the package substrate 210 in a flip-chip configuration.
  • the IC package assembly 200 is not limited to the configuration depicted in FIG. 2 and may include a wide variety of other suitable configurations in other embodiments. For example, in some embodiments additional dies may be stacked on the die 202 and/or the die 202 may be coupled with a component other than the package substrate 210.
  • the IC package assembly 200 may include, for example, combinations of flip-chip and wire-bonding techniques, interposers, multi-chip package configurations including SoC and/or package-on-package (PoP) configurations to route electrical signals in some embodiments.
  • the IC package assembly 200 may include package interconnects 212 configured to route electrical signals between the die 202 and other electrical components external to the IC package assembly 200 including, for example, a circuit board such as a motherboard (e.g., motherboard 702 of FIG. 7).
  • the package substrate 210 may be composed of a polymer, ceramic, glass, or semiconductor material having electrical routing features formed therein to electrically couple the die-level interconnects 206 and the package interconnects 212.
  • the electrical routing features may include, for example, pads or traces (not shown) disposed on one or more surfaces of the package substrate 210 and/or internal routing features (not shown) such as, for example, trenches, vias or other interconnect structures to route electrical signals through the package substrate 210.
  • the package substrate 210 may include electrical routing features such as pads (not shown) configured to receive the respective die-level interconnects 206 of the die 202.
  • the interconnects 206, 212 may include any of a wide variety of suitable structures and/or materials including, for example, bumps, pillars or balls formed using metals, alloys, solderable material, or combinations thereof.
  • the interconnects 206, 212 may include other suitable structures and/or materials in other embodiments.
  • the interconnects 206 may be electrically coupled with the interconnect layer 204a to route electrical signals between the die 202 and other electrical devices (e.g., via the package substrate 210).
  • the electrical signals may include, for example, input/output (I/O) signals and/or power/ground signals that are used in connection with operation of the die 202.
  • FIG. 3 is an illustrative flow diagram of a process 300 for fabricating a SOI structure of an IC device, in accordance with various embodiments. In some embodiments, some or all of the process 300 may be performed on a
  • semiconductor wafer that includes a plurality of IC devices disposed thereon.
  • FIGS. 4A, 4B, 4C, 4D, 4E, and 4F schematically illustrate a cross- sectional side view of a circuit structure 400 at various stages of the process 300, in accordance with various embodiments. Accordingly, the process 300 will be described below with reference to FIGS. 4A-4F.
  • the circuit structure 400 may correspond to an IC device on a die such as the die 202, with other circuit structures, IC devices and/or dies that may be also be formed on a wafer along with the circuit structure 400 not shown for clarity.
  • the circuit structure 400 may include a device stack 402 that is formed on a substrate 404.
  • the device stack 402 may include a first side coupled with the substrate 404.
  • the substrate 404 may be a
  • the substrate 404 may be a bulk semiconductor material such as, for example, silicon in some embodiments. Alternatively, or additionally, the substrate 404 may be composed of other materials.
  • the device stack 402 may include a device layer 406 that corresponds to a region where active devices such as transistor structures 408 are formed on the substrate 404.
  • the device layer 406 may include, for example, transistor structures such as channel bodies and/or gate/source/drain regions of transistor devices. Alternatively, or additionally, the device layer 406 may include other components in various embodiments.
  • the process 300 may include forming a device stack such as the device stack 402, for an IC device that may include a circuit structure having a plurality of transistors, on a bulk substrate such as the bulk substrate 404.
  • Forming the device stack may include forming the device layer, forming routing layers, forming dielectric layers, forming vias, forming metal layers, and/or forming any other suitable layers.
  • the process 300 may include depositing a bonding layer on a second side of the device stack opposite the first side of the device stack. This is illustrated in FIG. 4B, where a bonding layer 410 is shown deposited on a second side of the device stack 402.
  • the bonding layer 410 may be formed of silicon oxide or a polymer material.
  • the bonding layer 410 may be formed of other materials in some embodiments.
  • the bonding layer may be planarized such that it will be smooth enough to bond to another temporary layer.
  • the entire stack, including the device stack 402, the bonding layer 410, and the substrate 404 may then be flipped.
  • the process 300 may include bonding the bonding layer to a temporary wafer.
  • FIG. 4C illustrates the circuit structure 400 after the bonding layer 410 has been bonded with a temporary carrier wafer 412.
  • the bonding layer 410 may be bonded with the temporary carrier wafer 412 by oxide fusion bonding, metallic bonding, adhesive bonding, or another bonding method.
  • the temporary carrier wafer 412 may be any suitable material, such as silicon, glass, and/or another material.
  • the process 300 may include removing the bulk wafer from the first side (e.g., backside) of the device stack.
  • FIG. 4D illustrates the circuit structure 400 after the substrate 404 has been at least partially removed. In various embodiments, the substrate 404 may be completely removed to expose the first side of the device stack.
  • Removing the substrate 404 may include thinning the substrate 404 by a mix of micromachining processes such as dry etch, wet etch, wafer grinding, and chemical-mechanical planarization (CMP) in various embodiments.
  • the thinning process may proceed all the way down to a shallow trench isolation (STI) level of the device stack 402 to isolate individual devices and/or may proceed to sufficiently thin the substrate 404 such that the device channel is sufficiently thinned to fully deplete the channel of charge carriers.
  • the thinning may include planarization of the thinned surface to prepare for bonding to an insulator layer on a carrier wafer.
  • the circuit structure 400 may be flipped before bonding to the insulator layer on the carrier wafer.
  • the process 300 may include bonding the first side of the device stack with an insulator layer on a carrier wafer. Oxide fusion bonding and/or another suitable bonding method may be used to bond the first side of the device stack with the insulator layer in various embodiments. In some
  • a bonding layer may be deposited on the first side of the device stack before bonding to the insulator layer on the carrier wafer.
  • the carrier wafer may itself be an insulator such that a separate insulator layer on the carrier wafer may not be present.
  • FIG. 4E illustrates the circuit structure 400 after the first side of the device stack 402 has been bonded with an insulator layer 414 on a carrier wafer 416.
  • the transistor structures 408 may be fully depleted devices that are sitting on the insulator layer 414.
  • the insulator layer 414 may be silicon dioxide.
  • the insulator layer 414 may be formed of another material such as sapphire.
  • the carrier wafer 416 may be formed of a material such as silicon, quartz, glass, or sapphire.
  • the carrier wafer 416 may be formed of another material such as a ceramic that may be porous, or a relatively low temperature material that cannot withstand typical device fabrication temperatures such as a plastic polymer material, metal, or glass.
  • the insulator layer 414 may be structured as a buried oxide (BOX) layer in various embodiments.
  • the process 300 may include removing the temporary wafer.
  • FIG. 4F illustrates the circuit structure 400 after the temporary carrier wafer 412 has been removed.
  • the temporary carrier wafer 412 may be removed by a mix of micromachining processes such as dry etch, wet etch, wafer grinding, and CMP.
  • the temporary carrier wafer 412 may be removed by another method, such as peeling, in other embodiments.
  • the circuit structure 400 may be a SOI-like structure.
  • the device layer 406 may correspond to the device layer 204b
  • the carrier wafer 416 may correspond to the carrier substrate layer 204c
  • the insulator layer 414 may correspond to the insulator layer 214d of FIG. 2.
  • FIG. 5 is an illustrative flow diagram of a process 500 for fabricating a SOI structure of an IC device with a template substrate that includes a thin film epitaxial material layer, in accordance with various embodiments. In some embodiments, some or all of the process 500 may be performed on a
  • FIGS. 6A, 6B, 6C, 6D, 6E, and 6F schematically illustrate a cross- sectional side view of a circuit structure 600 at various stages of the process 500, in accordance with various embodiments. Accordingly, the process 500 will be described below with reference to FIGS. 6A-6F.
  • the circuit structure 600 may correspond to an IC device on a die such as the die 202, with other circuit structures, IC devices and/or dies that may be also be formed on a wafer along with the circuit structure 600 not shown for clarity.
  • the circuit structure 600 may include a device stack 602 that is completed on a template substrate 604 having an epitaxial thin film material layer 605.
  • the device stack 602 may include a first side coupled with the epitaxial thin film material layer 605.
  • the epitaxial thin film material layer 605 may be any suitable material, such as a group lll-V semiconductor, a group Ill-nitride semiconductor, germanium (Ge), or silicon carbide (SiC).
  • the epitaxial thin film material layer 605 may have a thickness of a few hundreds of nanometers (e.g., about 200 nanometers to about 600
  • the epitaxial thin film material layer 605 may be thicker or thinner in some embodiments.
  • the epitaxial thin film material layer 605 may include a buffer and/or transition layer associated with an epitaxial process in some embodiments.
  • the template substrate 604 may be a
  • the template substrate 604 may be a bulk semiconductor material such as, for example, silicon in some embodiments.
  • the template substrate 604 may be composed of other materials in various embodiments.
  • the device stack 602 may include a device layer 606 that corresponds to a region where active devices such as transistor structures 608 are formed at least in part by the epitaxial thin film material layer 605.
  • the device layer 606 may correspond to a region where active devices such as transistor devices are formed on the epitaxial thin film material layer 605.
  • the device layer 606 may include, for example, transistor structures such as channel bodies and/or gate/source/drain regions of transistor devices. Alternatively, or additionally, the device layer 606 may include other components in various embodiments.
  • the process 500 may include forming a device stack such as the device stack 502, for an IC device that may include a circuit structure having a plurality of transistors, on a wafer having a template substrate layer and an epitaxial thin film material layer such as the template substrate 604 and the epitaxial thin film material layer 605.
  • Forming the device stack may include forming the device layer, forming routing layers, forming dielectric layers, forming vias, forming metal layers, and/or forming any other suitable layers.
  • the process 500 may include depositing a bonding layer on a second side of the device stack opposite the first side of the device stack. This is illustrated in FIG. 6B, where a bonding layer 610 is shown deposited on a second side of the device stack 602.
  • the bonding layer 610 may be formed of silicon oxide or a polymer material.
  • the bonding layer 610 may be formed of other materials in some embodiments.
  • the bonding layer may be planarized such that it will be smooth enough to bond to another temporary layer (e.g., a temporary carrier wafer, as further described below).
  • the entire stack, including the device stack 602, the bonding layer 610, the template substrate 604, and the epitaxial thin film material layer 605 may then be flipped.
  • the process 500 may include bonding the bonding layer to a temporary wafer.
  • FIG. 6C illustrates the circuit structure 600 after the bonding layer 610 has been bonded with a temporary carrier wafer 612.
  • the bonding layer 610 may be bonded with the temporary carrier wafer 612 by oxide fusion bonding, metallic bonding, adhesive bonding, or another bonding method.
  • the temporary carrier wafer 612 may be silicon or glass in various embodiments.
  • the temporary carrier wafer 612 may be formed of another material in some embodiments.
  • the process 500 may include removing the template substrate layer and at least a portion of the epitaxial thin film material layer to reveal a first surface of the epitaxial thin film material layer or device stack.
  • FIG. 6D illustrates the circuit structure 600 after the template substrate 604 and at least a portion of the epitaxial thin film material layer 605 have been removed to reveal a first surface 613 of the device stack 602.
  • a portion of the epitaxial thin film material layer 605 may remain (not shown) such that the first surface 613 may be a surface of the epitaxial thin film material layer 605.
  • the transistor structures 608 are formed at least in part from the epitaxial thin film material layer 605, and the transistor structures 608 remain after the epitaxial thin film material layer 605 has been partially or completely removed. In various embodiments, the epitaxial thin film material layer 605 may be completely removed.
  • Removing the template substrate 604 and at least a portion of the epitaxial thin film material layer 605 may include thinning the template substrate 604 and the epitaxial thin film material layer 605 by a mix of micromachining processes such as dry etch, wet etch, wafer grinding, and chemical-mechanical planarization (CMP) in various embodiments.
  • the thinning process may proceed all the way down to a shallow trench isolation (STI) level to isolate individual devices and/or may proceed to sufficiently thin the epitaxial thin film material layer 605 such that the device channel is fully depleted.
  • a final step of the thinning may be planarization of the thinned surface to prepare for bonding to an insulator layer on a carrier wafer.
  • the circuit structure 600 may be flipped before bonding to the insulator layer on the carrier wafer.
  • the process 500 may include bonding the first surface with an insulator layer on a carrier wafer.
  • Oxide fusion bonding may be used to bond the first surface with the insulator layer in various embodiments. In some embodiments a different bonding method may be used.
  • a bonding layer may be deposited on the first surface before bonding to the insulator layer on the carrier wafer.
  • the carrier wafer may itself be an insulator such that a separate insulator layer on the carrier wafer may not be present.
  • FIG. 6E illustrates the circuit structure 600 after the first surface 613 has been bonded with an insulator layer 614 on a carrier wafer 616.
  • the transistor structures 608 may be fully depleted devices that are sitting on the insulator layer 614.
  • the insulator layer 614 may be silicon dioxide. In some embodiments, the insulator layer 614 may be silicon dioxide. In some
  • the insulator layer 614 may be formed of another material such as sapphire.
  • the carrier wafer 616 may be formed of a material such as silicon, quartz, glass, or sapphire.
  • the carrier wafer 616 may be formed of another material such as a ceramic that may be porous, or a relatively low temperature material that cannot withstand typical device fabrication temperatures such as a plastic polymer material, metal, or glass.
  • the insulator layer 614 may be structured as a BOX layer in various embodiments.
  • the process 500 may include removing the temporary wafer from the circuit structure.
  • FIG. 6F illustrates the circuit structure 600 after the temporary carrier wafer 612 has been removed.
  • the temporary carrier wafer 612 may be removed by a mix of micromachining processes such as dry etch, wet etch, wafer grinding, and CMP. The temporary carrier wafer 612 may be removed by another method, such as peeling, in other embodiments.
  • the circuit structure 600 may be a SOI-like structure.
  • the circuit structure 600 may include materials such as group ll l-V semiconductors or group Ill-nitride semiconductors that are not commercially available for use in a standard SOI device fabrication process or are difficult to prepare for use in a standard SOI device fabrication process.
  • the device layer 606 may correspond to the device layer 204b
  • the carrier wafer 616 may correspond to the carrier substrate layer 204c
  • the insulator layer 614 may correspond to the insulator layer 214d of FIG. 2.
  • an IC device that may include a die such as the die 202 and/or the circuit structure 400 or the circuit structure 600 may include one or more fins, one or more transistor structures, and/or and isolation oxide.
  • the IC device may be a radio frequency (RF) or an analog device on a high resistivity carrier, a high performance device on a flexible carrier, or another type of device in various embodiments.
  • RF radio frequency
  • the isolation oxide may be any suitable oxide, such as silicon oxide (Si0 2 ), silicon oxynitride (SiO x N y ), silicon nitride (Si x N y ) aluminum oxide (AI 2 O 3 ), hafnium oxide (Hf0 2 ), hafnium aluminum oxide (HfAl x O y ), hafnium silicon oxide (HfSi x O y ), zirconium oxide (Zr0 2 ), zirconium silicon oxide (ZrSi x Oy), lanthanum oxide (La 2 03), yttrium oxide (Y 2 O 3 ), lanthanum aluminum oxide (LaAl x Oy), tantalum oxide (Ta 2 Os), titanium oxide (Ti0 2 ), barium strontium titanium oxide (BaSrTi x O y ), barium titanium oxide (BaTi x O y ), strontium titanium oxide (SrTi x Oy), lead scandium tanta
  • the transistor structures may include a plurality of transistor layers that form one or more transistors with the fins.
  • the fins may form a channel region of the transistors, and the transistor structures may form another portion of the channel region and/or gate/source/drain regions of the transistors.
  • the transistor structures may include any suitable material layers to form the transistors with the fins.
  • the transistor structures may include one or more semiconductor layers, oxide layers, dielectric layers, insulator layers, and/or metal layers.
  • the isolation oxide may substantially surround the transistor structures.
  • One or more vias may be disposed in the isolation oxide to electrically connect one or more of the transistor structures to other components.
  • one or more interconnect layers may be formed on the IC device.
  • FIG. 7 schematically illustrates an example system (e.g., computing device 700) that may include an IC device (e.g., an IC device including the die 202, the circuit structure 400 and/or the circuit structure 600) as described herein, in accordance with some embodiments.
  • Components of the computing device 700 may be housed in an enclosure (e.g., housing 708).
  • a motherboard 702 may include a number of components, including but not limited to a processor 704 and at least one communication chip 706.
  • the processor 704 may be physically and electrically coupled to the motherboard 702.
  • the at least one communication chip 706 may also be physically and electrically coupled to the motherboard 702.
  • the communication chip 606 may be part of the processor 704.
  • computing device 700 may include other components that may or may not be physically and electrically coupled to the motherboard 702. These other components may include, but are not limited to, volatile memory (e.g., DRAM), non-volatile memory (e.g., ROM), flash memory, a graphics processor, a digital signal processor, a crypto processor, a chipset, an antenna, a display, a touchscreen display, a touchscreen controller, a battery, an audio codec, a video codec, a power amplifier, a global positioning system (GPS) device, a compass, a Geiger counter, an accelerometer, a gyroscope, a speaker, a camera, and a mass storage device (such as hard disk drive, compact disk (CD), digital versatile disk (DVD), and so forth).
  • volatile memory e.g., DRAM
  • non-volatile memory e.g., ROM
  • flash memory e.g., a graphics processor, a digital signal processor, a crypto processor, a chipse
  • the communication chip 706 may enable wireless communications for the transfer of data to and from the computing device 700.
  • the term "wireless” and its derivatives may be used to describe circuits, devices, systems, methods, techniques, communications channels, etc., that may communicate data through the use of modulated electromagnetic radiation through a non-solid medium. The term does not imply that the associated devices do not contain any wires, although in some embodiments they might not.
  • the communication chip 706 may implement any of a number of wireless standards or protocols, including but not limited to Institute for Electrical and Electronic Engineers (IEEE) standards including Wi-Fi (IEEE 802.1 1 family), IEEE 802.16 standards (e.g., IEEE 802.16- 2005 Amendment), Long-Term Evolution (LTE) project along with any
  • IEEE 802.16 compatible broadband wireless access (BWA) networks are generally referred to as WiMAX networks, an acronym that stands for Worldwide Interoperability for Microwave Access, which is a certification mark for products that pass conformity and interoperability tests for the IEEE 802.16 standards.
  • the communication chip 606 may operate in accordance with a Global System for Mobile Communication (GSM), General Packet Radio Service (GPRS), Universal Mobile
  • the communication chip 606 may operate in accordance with Enhanced Data for GSM Evolution (EDGE), GSM EDGE Radio Access Network (GERAN), Universal Terrestrial Radio Access
  • EDGE Enhanced Data for GSM Evolution
  • GERAN GSM EDGE Radio Access Network
  • the communication chip 706 may operate in accordance with Code Division Multiple Access (CDMA), Time Division Multiple Access (TDMA), Digital Enhanced Cordless Telecommunications (DECT), Evolution-Data Optimized (EV-DO), derivatives thereof, as well as any other wireless protocols that are designated as 3G, 4G, 5G, and beyond.
  • CDMA Code Division Multiple Access
  • TDMA Time Division Multiple Access
  • DECT Digital Enhanced Cordless Telecommunications
  • EV-DO Evolution-Data Optimized
  • derivatives thereof as well as any other wireless protocols that are designated as 3G, 4G, 5G, and beyond.
  • the communication chip 706 may operate in accordance with other wireless protocols in other embodiments.
  • the computing device 700 may include a plurality of communication chips 706.
  • a first communication chip 706 may be dedicated to shorter range wireless communications such as Wi-Fi and Bluetooth and a second communication chip 706 may be dedicated to longer range wireless
  • communications such as GPS, EDGE, GPRS, CDMA, WiMAX, LTE, EV-DO, and others.
  • the processor 704 of the computing device 700 may include a die
  • the die 202 of FIG. 2 may be mounted in a package assembly (e.g., package assembly 200) that is mounted on a circuit board such as the motherboard 702.
  • the term "processor" may refer to any device or portion of a device that processes electronic data from registers and/or memory to transform that electronic data into other electronic data that may be stored in registers and/or memory.
  • the computing device 700 may be a mobile computing device, a laptop, a netbook, a notebook, an ultrabook, a smartphone, a tablet, a personal digital assistant (PDA), an ultra mobile PC, a mobile phone, a desktop computer, a server, a printer, a scanner, a monitor, a set-top box, an entertainment control unit, a digital camera, a portable music player, or a digital video recorder.
  • the computing device 700 may be any other electronic device that processes data.
  • Example 1 may include a method of fabricating a silicon-on-insulator
  • Example 2 may include the subject matter of Example 1 , wherein the insulator layer is formed of silicon dioxide or sapphire.
  • Example 3 may include the subject matter of Example 1 , further comprising bonding the device stack with a temporary wafer before removing the bulk wafer.
  • Example 5 may include the subject matter of Example 3, further comprising removing the temporary wafer after bonding the first side of the device stack with the insulator layer.
  • Example 6 may include the subject matter of any one of Examples 1 -5, wherein removing the bulk wafer includes thinning the bulk wafer to a shallow trench isolation of the device stack.
  • Example 10 may include the subject matter of any one of Examples 1 -5, wherein the carrier wafer is formed of glass.
  • Example 1 1 may include the subject matter of any one of Examples
  • Example 12 may include a method of fabricating a silicon-on- insulator (SOI) structure comprising: forming a device stack for an integrated circuit device on a wafer, the wafer having a template substrate layer and an epitaxial thin film material layer, and the device stack having a first side coupled to the epitaxial thin film material layer; removing the template substrate layer and at least a portion of the epitaxial thin film material layer to reveal a first surface of the epitaxial thin film material layer or device stack; and bonding the first surface with an insulator layer that is disposed on a carrier wafer.
  • Example 13 may include the subject matter of Example 12, wherein the epitaxial thin film material layer is formed of Geranium (Ge), Silicon Carbide (SiC), a group lll-V semiconductor, or a Ill-nitride compound semiconductor.
  • the epitaxial thin film material layer is formed of Geranium (Ge), Silicon Carbide (SiC), a group lll-V semiconductor, or a Ill
  • Example 14 may include the subject matter of Example 12, further comprising bonding the device stack with a temporary wafer before removing the template substrate layer and at least a portion of the epitaxial thin film material layer.
  • Example 16 may include the subject matter of Example 14, further comprising removing the temporary wafer after bonding the first surface with the insulator layer.
  • Example 17 may include the subject matter of any one of Examples
  • Example 18 may include the subject matter of any one of Examples
  • Example 20 may include the subject matter of any one of Examples 12-16, wherein the carrier wafer is formed of ceramic, metal, or a polymer material.
  • Example 22 may include the subject matter of Example 21 , wherein the insulator layer is formed of silicon dioxide or sapphire.
  • Example 23 may include the subject matter of any one of Examples 21 -22, wherein the carrier substrate is formed of silicon.
  • Example 24 may include the subject matter of any one of Examples 21 -22, wherein the carrier substrate is formed of glass.
  • the carrier substrate is formed of ceramic, metal, or a polymer material.
  • Various embodiments may include any suitable combination of the above-described embodiments including alternative (or) embodiments of embodiments that are described in conjunctive form (and) above (e.g., the "and” may be “and/or”).
  • some embodiments may include one or more articles of manufacture (e.g., non-transitory computer-readable media) having instructions, stored thereon, that when executed result in actions of any of the above-described embodiments.
  • some embodiments may include apparatuses or systems having any suitable means for carrying out the various operations of the above-described embodiments.

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

La présente invention concerne, selon divers modes de réalisation, des techniques de formation de dispositif silicium sur isolant (SOI) dans un dispositif à circuit intégré (CI), et des configurations associées. Un procédé de fabrication d'une structure SOI peut comprendre la formation d'un empilement de dispositif pour un dispositif CI sur une tranche massive, l'élimination de la tranche massive d'un premier côté de l'empilement de dispositif, et le collage du premier côté de l'empilement de dispositif à une couche isolante sur une tranche de support. D'autres modes de réalisation peuvent être décrits et/ou revendiqués.
PCT/US2015/051994 2015-09-24 2015-09-24 Techniques de formation de dispositif soi sur un substrat virtuel, et configurations associées WO2017052557A1 (fr)

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TW105124791A TWI697109B (zh) 2015-09-24 2016-08-04 在虛擬基板上形成絕緣體上矽（ｓｏｉ）裝置的技術以及關聯的結構

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KR100257068B1 (ko) * 1997-05-30 2000-05-15 김영환 반도체소자및그의제조방법
JP2000077548A (ja) * 1998-08-28 2000-03-14 Toshiba Corp 半導体装置及びその製造方法
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